TW201529588A - Near infrared absorptive composition, near infrared cut filter and method for manufacturing near infrared cut filter, and camera module and method for manufacturing camera module - Google Patents

Near infrared absorptive composition, near infrared cut filter and method for manufacturing near infrared cut filter, and camera module and method for manufacturing camera module Download PDF

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TW201529588A
TW201529588A TW104101269A TW104101269A TW201529588A TW 201529588 A TW201529588 A TW 201529588A TW 104101269 A TW104101269 A TW 104101269A TW 104101269 A TW104101269 A TW 104101269A TW 201529588 A TW201529588 A TW 201529588A
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Takashi Kawashima
Seiichi Hitomi
Kouitsu Sasaki
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Fujifilm Corp
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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/76Esters of carboxylic acids having a carboxyl group bound to a carbon atom of a six-membered aromatic ring
    • C07C69/84Esters of carboxylic acids having a carboxyl group bound to a carbon atom of a six-membered aromatic ring of monocyclic hydroxy carboxylic acids, the hydroxy groups and the carboxyl groups of which are bound to carbon atoms of a six-membered aromatic ring
    • C07C69/92Esters of carboxylic acids having a carboxyl group bound to a carbon atom of a six-membered aromatic ring of monocyclic hydroxy carboxylic acids, the hydroxy groups and the carboxyl groups of which are bound to carbon atoms of a six-membered aromatic ring with etherified hydroxyl groups
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/52Esters of acyclic unsaturated carboxylic acids having the esterified carboxyl group bound to an acyclic carbon atom
    • C07C69/533Monocarboxylic acid esters having only one carbon-to-carbon double bond
    • C07C69/54Acrylic acid esters; Methacrylic acid esters
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/66Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety
    • C07C69/67Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety of saturated acids
    • C07C69/708Ethers
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • G02B5/208Filters for use with infrared or ultraviolet radiation, e.g. for separating visible light from infrared and/or ultraviolet radiation
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • G02B5/22Absorbing filters
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03BAPPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B11/00Filters or other obturators specially adapted for photographic purposes

Abstract

The invention provides a near infrared absorptive composition, a near infrared cut filter and a method for manufacturing the near infrared cut filter, and a camera module and a method for manufacturing the camera module. The near infrared absorptive composition has high transmittance in a visible light region and high shielding performance in a near infrared region when made into a cured film. The near infrared absorptive composition of the invention includes a copper complex. The copper complex is fromed by reacting a compound (A) with a copper component. The compound (A) has a coordination portion coordinating by an anion, and a coordination atom coordinating by an unshared electron pair.

Description

近紅外線吸收性組成物、近紅外線截止濾波器及其 製造方法以及照相機模組及其製造方法 Near-infrared absorbing composition, near-infrared cut filter and Manufacturing method and camera module and method of manufacturing same

本發明是有關於一種近紅外線吸收性組成物、近紅外線截止濾波器及其製造方法以及照相機模組及其製造方法。 The present invention relates to a near-infrared absorbing composition, a near-infrared cut filter, a method of manufacturing the same, and a camera module and a method of manufacturing the same.

於攝影機(video camera)、數位靜態照相機(digital still camera)、帶有照相機功能的行動電話等中,一直使用作為彩色圖像的固體攝像元件的電荷耦合元件(Charge-Coupled Device,CCD)或互補金屬氧化物半導體(Complementary Metal-Oxide-Semiconductor,CMOS)。該些固體攝像元件於其受光部中使用對近紅外線具有感度的矽光二極體(silicon photodiode),故必須進行可見度(visibility)修正,大多情況下使用近紅外線截止濾波器。 In a video camera, a digital still camera, a camera-equipped mobile phone, etc., a charge-coupled device (CCD) or a complementary image of a solid-state imaging device as a color image is used. Metal oxide semiconductor (Complementary Metal-Oxide-Semiconductor, CMOS). Since these solid-state imaging devices use a silicon photodiode having sensitivity to near-infrared rays in the light receiving portion, it is necessary to perform visibility correction, and a near-infrared cut filter is often used.

作為用以形成此種近紅外線截止濾波器的材料,例如已知有使用磷酸酯銅錯合物的近紅外線吸收性組成物(專利文獻1~專利文獻3)。 As a material for forming such a near-infrared cut filter, for example, a near-infrared absorbing composition using a copper phosphate complex is known (Patent Documents 1 to 3).

[現有技術文獻] [Prior Art Literature] [專利文獻] [Patent Literature]

[專利文獻1]日本專利特開2002-69305號公報 [Patent Document 1] Japanese Patent Laid-Open Publication No. 2002-69305

[專利文獻2]日本專利特開平11-52127號公報 [Patent Document 2] Japanese Patent Laid-Open No. Hei 11-52127

[專利文獻3]日本專利特開2011-63814號公報 [Patent Document 3] Japanese Patent Laid-Open Publication No. 2011-63814

此處,於使用專利文獻1及專利文獻2所記載的銅錯合物的紅外線截止濾波器(infrared-cut filter)中可知:於製成硬化膜時可見光透射性與近紅外線範圍內的遮蔽性不充分。本發明的目的在於解决所述問題,並提供一種於製成硬化膜時可見光範圍內的透射性高、近紅外線範圍內的遮蔽性高的近紅外線吸收性組成物。 In the infrared-cut filter using the copper complex described in Patent Document 1 and Patent Document 2, it is understood that the visible light transmittance and the shielding property in the near-infrared range are obtained when the cured film is formed. insufficient. An object of the present invention is to solve the above problems, and to provide a near-infrared absorbing composition having high transmittance in a visible light range and high shielding property in a near-infrared range when a cured film is formed.

本發明者根據所述狀況進行了努力研究,結果發現,藉由特定的銅錯合物可解决所述課題。 The inventors of the present invention conducted diligent research based on the above conditions, and as a result, found that the problem can be solved by a specific copper complex.

具體而言,藉由以下的手段<1>、較佳為手段<2>~手段<26>解决了所述課題。 Specifically, the above problem is solved by the following means <1>, preferably means <2>~ means <26>.

<1>一種近紅外線吸收性組成物,其含有銅錯合物,所述銅錯合物是使具有以陰離子進行配位的配位部位與以非共價電子對進行配位的配位原子的化合物(A)與銅成分反應而成。 <1> A near-infrared absorbing composition containing a copper complex which is a coordination atom having a coordination site coordinated by an anion and a coordination atom having a non-covalent electron pair The compound (A) is formed by reacting with a copper component.

<2>一種近紅外線吸收性組成物,其含有銅錯合物,所述銅錯合物是將銅作為中心金屬、且將具有以陰離子進行配位的配 位部位與以非共價電子對進行配位的配位原子的化合物(A)作為配位體。 <2> A near-infrared absorbing composition containing a copper complex which has copper as a central metal and which has a coordination with an anion The compound (A) having a coordinating atom coordinated to a non-covalent electron pair serves as a ligand.

<3>如<1>或<2>所記載的近紅外線吸收性組成物,其中銅錯合物是藉由銅與所述化合物(A)而形成5員環及/或6員環。 <3> The near-infrared absorbing composition according to <1> or <2>, wherein the copper complex is a 5-membered ring and/or a 6-membered ring formed by copper and the compound (A).

<4>如<1>至<3>中任一項所記載的近紅外線吸收性組成物,其中化合物(A)中陰離子為氧陰離子、氮陰離子或硫陰離子,且以非共價電子對進行配位的配位原子為氧原子、氮原子、硫原子或磷原子。 The near-infrared absorbing composition according to any one of <1> to <3> wherein the anion in the compound (A) is an oxyanion, a nitrogen anion or a sulfur anion, and is carried out by a non-covalent electron pair. The coordinating atom of the coordination is an oxygen atom, a nitrogen atom, a sulfur atom or a phosphorus atom.

<5>如<1>至<4>中任一項所記載的近紅外線吸收性組成物,其中將陰離子與以非共價電子對進行配位的配位原子連結的原子數為1~3。 The near-infrared absorbing composition according to any one of <1> to <4> wherein the number of atoms linking an anion to a coordinating atom coordinated by a non-covalent electron pair is 1 to 3 .

<6>如<1>至<5>中任一項所記載的近紅外線吸收性組成物,其中化合物(A)的分子量為50~1000。 The near-infrared absorbing composition according to any one of <1> to <5> wherein the compound (A) has a molecular weight of 50 to 1,000.

<7>如<1>至<6>中任一項所記載的近紅外線吸收性組成物,其中化合物(A)為含有5員環或6員環的化合物,且以非共價電子對進行配位的配位原子為構成5員環或6員環的原子。 The near-infrared absorbing composition according to any one of <1> to <6> wherein the compound (A) is a compound containing a 5-membered ring or a 6-membered ring, and is carried out by a non-covalent electron pair. The coordinating atom of the coordination is an atom constituting a 5-membered ring or a 6-membered ring.

<8>如<1>至<7>中任一項所記載的近紅外線吸收性組成物,其中以非共價電子對進行配位的配位原子為氮原子。 The near-infrared absorbing composition according to any one of <1> to <7> wherein the coordinating atom coordinated by the non-covalent electron pair is a nitrogen atom.

<9>如<8>所記載的近紅外線吸收性組成物,其中鄰接於氮原子的原子為碳原子,且碳原子具有取代基。 <9> The near-infrared absorbing composition according to <8>, wherein the atom adjacent to the nitrogen atom is a carbon atom, and the carbon atom has a substituent.

<10>如<1>至<7>中任一項所記載的近紅外線吸收性 組成物,其中化合物(A)是由式(I)所表示; The near-infrared absorbing composition as described in any one of <1> to <7>, wherein the compound (A) is represented by the formula (I);

式(I)中,X1表示含有以陰離子進行配位的配位部位的基團;Y1表示氮原子或磷原子,與鄰接的碳原子一起構成4員環~7員環;RX1表示取代基,n1表示0~6的整數。 In the formula (I), X 1 represents a group containing a coordination site coordinated by an anion; Y 1 represents a nitrogen atom or a phosphorus atom, and together with adjacent carbon atoms constitutes a 4-membered ring to a 7-membered ring; R X1 represents The substituent, n1 represents an integer from 0 to 6.

<11>如<10>所記載的近紅外線吸收性組成物,其中式(I)中,Y1與鄰接的碳原子一起形成的環為芳香族環。 <11> The near-infrared absorbing composition according to <10>, wherein in the formula (I), a ring formed by Y 1 together with an adjacent carbon atom is an aromatic ring.

<12>如<1>至<6>中任一項所記載的近紅外線吸收性組成物,其中以陰離子進行配位的配位部位為選自以下組群(AN)中的至少一種,組群(AN) The near-infrared absorbing composition according to any one of the above-mentioned group, wherein the coordination site coordinated by the anion is at least one selected from the group consisting of the following groups (AN), the group Group (AN)

以非共價電子對進行配位的配位原子含有於環中,或含有於選自以下組群(UE)中的至少一種部分結構中,組群(UE) A coordinating atom coordinated with a non-covalent electron pair is contained in a ring or is contained in at least one partial structure selected from the group consisting of (UE), a group (UE)

波浪線為與構成化合物(A)的原子團的鍵結位置, The wavy line is a bonding position with the atomic group constituting the compound (A),

X表示N或CR,R及R1分別獨立地表示氫原子、烷基、烯基、炔基、芳基或雜芳基,R2分別獨立地表示氫原子、烷基、烯基、炔基、芳基、雜芳基、烷氧基、芳氧基、雜芳氧基、烷硫基、芳硫基、雜芳硫基、胺基或醯基。 X represents N or CR, and R and R 1 each independently represent a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group or a heteroaryl group, and R 2 each independently represents a hydrogen atom, an alkyl group, an alkenyl group or an alkynyl group. , aryl, heteroaryl, alkoxy, aryloxy, heteroaryloxy, alkylthio, arylthio, heteroarylthio, amine or fluorenyl.

<12-1>如<12>所記載的近紅外線吸收性組成物,其中以陰離子進行配位的配位部位為選自以下組群(AN-11)中的至少一種;X及R與組群(AN)的X及R為相同含意,組群(AN-11) <12-1> The near-infrared absorbing composition according to <12>, wherein the coordination site coordinated by the anion is at least one selected from the group consisting of AN-11; X and R and the group The X and R of the group (AN) have the same meaning, group (AN-11)

<13>如<1>至<6>中任一項所記載的近紅外線吸收性組成物,其中化合物(A)是由以下通式(IV)所表示;X1-L1-Y1 通式(IV) The near-infrared absorbing composition according to any one of <1> to <6> wherein the compound (A) is represented by the following formula (IV); X 1 -L 1 -Y 1 is passed Formula (IV)

通式(IV)中,X1表示選自以下組群(AN)中的至少一種以陰離子進行配位的配位部位,組群(AN) In the formula (IV), X 1 represents a coordination site selected from at least one of the following groups (AN), which is coordinated by an anion, and the group (AN)

Y1表示含有以非共價電子對進行配位的配位原子的環,或選自以下組群(UE)中的至少一種含有以非共價電子對進行配位的配位原子的部分結構,組群(UE) Y 1 represents a ring containing a coordinating atom coordinated by a non-covalent electron pair, or a partial structure containing at least one coordinating atom coordinated by a non-covalent electron pair selected from the following group (UE) Group (UE)

波浪線為與構成化合物(A)的原子團的鍵結位置,X表示N或CR,R及R1分別獨立地表示氫原子、烷基、烯基、炔基、芳基或雜芳基,R2分別獨立地表示氫原子、烷基、烯 基、炔基、芳基、雜芳基、烷氧基、芳氧基、雜芳氧基、烷硫基、芳硫基、雜芳硫基、胺基或醯基,L1表示單鍵或二價連結基。 The wavy line is a bonding position with the atomic group constituting the compound (A), X represents N or CR, and R and R 1 each independently represent a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group or a heteroaryl group, R 2 independently represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group, a heteroaryl group, an alkoxy group, an aryloxy group, a heteroaryloxy group, an alkylthio group, an arylthio group, a heteroarylthio group, Amine or a thiol group, and L 1 represents a single bond or a divalent linking group.

<13-1>如<13>所記載的近紅外線吸收性組成物,其中X1為選自以下組群(AN-11)中的至少一種;X及R與組群(AN)的X及R為相同含意,組群(AN-11) <13> The near-infrared absorbing composition according to <13>, wherein X 1 is at least one selected from the group consisting of (AN-11); X and R and X of the group (AN) R is the same meaning, group (AN-11)

<14>如<1>至<13>中任一項所記載的近紅外線吸收性組成物,其更含有硬化性化合物及溶劑。 The near-infrared absorbing composition according to any one of <1> to <13> further comprising a curable compound and a solvent.

<15>一種近紅外線截止濾波器,其是使如<1>至<14>中任一項所記載的近紅外線吸收性組成物硬化而成。 <15> A near-infrared ray-cutting filter which is obtained by hardening the near-infrared absorbing composition according to any one of <1> to <14>.

<16>一種近紅外線截止濾波器的製造方法,其包括:於固體攝像元件的受光側,塗佈如<1>至<14>中任一項所記載的近 紅外線吸收性組成物,藉此形成膜的步驟。 <16> A method of manufacturing a near-infrared cut filter, comprising: coating the light-receiving side of the solid-state image sensor with a coating as described in any one of <1> to <14> An infrared absorbing composition, whereby a film is formed.

<17>一種照相機模組,其具有固體攝像元件、及配置於固體攝像元件的受光側的近紅外線截止濾波器,並且近紅外線截止濾波器為使如<1>至<14>中任一項所記載的近紅外線吸收性組成物硬化而成的近紅外線截止濾波器。 <17> A camera module having a solid-state image sensor and a near-infrared cut filter disposed on a light receiving side of the solid-state image sensor, and a near-infrared cut filter for causing any one of <1> to <14> The near-infrared cut filter in which the near-infrared absorbing composition described above is cured.

<18>一種照相機模組的製造方法,其製造具有固體攝像元件、及配置於固體攝像元件的受光側的近紅外線截止濾波器的照相機模組,並且所述照相機模組的製造方法包括:於固體攝像元件的受光側,塗佈如<1>至<14>中任一項所記載的近紅外線吸收性組成物,藉此形成近紅外線截止濾波器的步驟。 <18> A method of manufacturing a camera module, comprising: a camera module having a solid-state image sensor and a near-infrared cut filter disposed on a light receiving side of the solid-state image sensor; and the method of manufacturing the camera module includes: In the light-receiving side of the solid-state image sensor, the near-infrared ray absorbing composition described in any one of <1> to <14> is applied to form a near-infrared cut filter.

<19>如<1>所記載的近紅外線吸收性組成物,其中化合物(A)是由式(1)所表示; <19> The near-infrared absorbing composition according to <1>, wherein the compound (A) is represented by the formula (1);

式(1)中,R1表示烴基;R2及R3分別獨立地表示氫原子、鹵素原子或1價有機基;R1與R2或R3亦可相互鍵結而形成環。 In the formula (1), R 1 represents a hydrocarbon group; and R 2 and R 3 each independently represent a hydrogen atom, a halogen atom or a monovalent organic group; and R 1 and R 2 or R 3 may be bonded to each other to form a ring.

<20>如<19>所記載的近紅外線吸收性組成物,其中式(1)中的R1表示烷基或芳基。 <20> The near-infrared absorbing composition according to <19>, wherein R 1 in the formula (1) represents an alkyl group or an aryl group.

<21>如<19>或<20>所記載的近紅外線吸收性組成物,其中式(1)中的R1表示烷基,R2及R3分別獨立地表示氫原 子、鹵素原子、甲基、乙基或丙基。 <21> The near-infrared absorbing composition according to <19> or <20>, wherein R 1 in the formula (1) represents an alkyl group, and R 2 and R 3 each independently represent a hydrogen atom, a halogen atom, or a Base, ethyl or propyl.

<22>如<19>或<20>所記載的近紅外線吸收性組成物,其中式(1)中的R1與R2相互鍵結而形成含有氧原子的5員環或6員環,且R3為氫原子。 <22> The near-infrared absorbing composition according to <19>, wherein R 1 and R 2 in the formula (1) are bonded to each other to form a 5-membered ring or a 6-membered ring containing an oxygen atom. And R 3 is a hydrogen atom.

<23>如<19>或<20>所記載的近紅外線吸收性組成物,其中由式(1)所表示的化合物是由式(2)所表示; <23> The near-infrared absorbing composition according to <19> or <20>, wherein the compound represented by the formula (1) is represented by the formula (2);

式(2)中,R12及R13分別獨立地表示氫原子、鹵素原子或1價有機基;L表示n價烴基、或包含烴基與-O-的組合的n價基團;n表示2~6的整數。 In the formula (2), R 12 and R 13 each independently represent a hydrogen atom, a halogen atom or a monovalent organic group; L represents an n-valent hydrocarbon group, or an n-valent group containing a combination of a hydrocarbon group and -O-; n represents 2 An integer of ~6.

<24>如<19>至<21>中任一項所記載的近紅外線吸收性組成物,其中式(1)中的R2及R3的至少一者表示鹵素原子或1價有機基。 The near-infrared absorbing composition of any one of the above-mentioned <1>, wherein at least one of R 2 and R 3 in the formula (1) represents a halogen atom or a monovalent organic group.

<25>一種使用方法,其將銅錯合物用作紅外線吸收劑,所述銅錯合物是使式(1)所表示的化合物(A)與銅成分反應而成; <25> A method of using a copper complex as an infrared absorbing agent, wherein the copper complex is obtained by reacting a compound (A) represented by the formula (1) with a copper component;

式(1)中,R1表示烴基;R2及R3分別獨立地表示氫原子、鹵素原子或1價有機基;R1與R2或R3亦可相互鍵結而形成環。 In the formula (1), R 1 represents a hydrocarbon group; and R 2 and R 3 each independently represent a hydrogen atom, a halogen atom or a monovalent organic group; and R 1 and R 2 or R 3 may be bonded to each other to form a ring.

根據本發明,可提供一種於製成硬化膜時可見光範圍內的透射性及近紅外線範圍內的遮蔽性高的近紅外線吸收性組成物。 According to the present invention, it is possible to provide a near-infrared absorbing composition having high transmittance in the visible light range and high hiding property in the near-infrared range when the cured film is formed.

10‧‧‧照相機模組 10‧‧‧ camera module

11‧‧‧固體攝像元件 11‧‧‧ Solid-state imaging components

12‧‧‧平坦化層 12‧‧ ‧ flattening layer

13‧‧‧近紅外線截止濾波器 13‧‧‧Near-infrared cut-off filter

14‧‧‧攝像透鏡 14‧‧‧ camera lens

15‧‧‧透鏡固持器 15‧‧‧Lens Holder

16‧‧‧攝像元件部 16‧‧‧Photographic Components Division

17‧‧‧彩色濾波器 17‧‧‧Color Filter

18‧‧‧微透鏡 18‧‧‧Microlens

19‧‧‧紫外.紅外光反射膜 19‧‧‧UV. Infrared light reflecting film

20‧‧‧透明基材 20‧‧‧Transparent substrate

21‧‧‧近紅外線吸收層 21‧‧‧Near infrared absorption layer

22‧‧‧抗反射層 22‧‧‧Anti-reflective layer

圖1為表示本發明的實施形態的具有近紅外線截止濾波器的照相機模組的構成的概略剖面圖。 1 is a schematic cross-sectional view showing a configuration of a camera module having a near-infrared cut filter according to an embodiment of the present invention.

圖2為表示照相機模組中的近紅外線截止濾波器周邊部分的一例的概略剖面圖。 2 is a schematic cross-sectional view showing an example of a peripheral portion of a near-infrared cut filter in a camera module.

圖3為表示照相機模組中的近紅外線截止濾波器周邊部分的一例的概略剖面圖。 3 is a schematic cross-sectional view showing an example of a peripheral portion of a near-infrared cut filter in a camera module.

圖4為表示照相機模組中的近紅外線截止濾波器周邊部分的一例的概略剖面圖。 4 is a schematic cross-sectional view showing an example of a peripheral portion of a near-infrared cut filter in a camera module.

以下,對本發明的內容加以詳細說明。 Hereinafter, the contents of the present invention will be described in detail.

於本說明書中,「~」是以包含其前後所記載的數值作為下限值及上限值的含意使用。 In the present specification, "~" is used in the sense that the numerical values described before and after are included as the lower limit and the upper limit.

本說明書的基團(原子團)的表述中,未記載經取代及未經 取代的表述包含不具有取代基的基團(原子團),並且亦包含具有取代基的基團(原子團)。例如所謂「烷基」,不僅包含不具有取代基的烷基(未經取代的烷基),而且亦包含具有取代基的烷基(經取代的烷基)。 In the expression of the group (atomic group) of the present specification, no substitution or The expression of the substitution includes a group having no substituent (atomic group), and also a group having a substituent (atomic group). For example, the "alkyl group" includes not only an alkyl group having no substituent (unsubstituted alkyl group) but also an alkyl group having a substituent (substituted alkyl group).

於本說明書中,「(甲基)丙烯酸酯」表示丙烯酸酯及甲基丙烯酸酯,「(甲基)丙烯酸」表示丙烯酸及甲基丙烯酸,「(甲基)丙烯醯基」表示丙烯醯基及甲基丙烯醯基。 In the present specification, "(meth)acrylate" means acrylate and methacrylate, "(meth)acrylic" means acrylic acid and methacrylic acid, and "(meth)acryloyl group" means acrylonitrile group and Methyl methacrylate.

另外,於本說明書中,「單量體」與「單體(monomer)」為相同含意。單量體是指有別於寡聚物及聚合物、重量平均分子量為2,000以下的化合物。 In addition, in this specification, "single quantity" and "monomer" have the same meaning. The singly is a compound which is different from the oligomer and the polymer and has a weight average molecular weight of 2,000 or less.

於本說明書中,所謂聚合性化合物,是指具有聚合性官能基的化合物,可為單量體,亦可為聚合物。所謂聚合性官能基,是指參與聚合反應的基團。 In the present specification, the polymerizable compound means a compound having a polymerizable functional group, and may be a monomer or a polymer. The polymerizable functional group refers to a group that participates in a polymerization reaction.

關於本發明中所用的化合物的重量平均分子量及數量平均分子量的測定方法,可藉由凝膠滲透層析法(Gel Permeation Chromatography,GPC)來測定,將所述分子量定義為由GPC的測定所得的聚苯乙烯換算值。例如可藉由以下方式求出:使用HLC-8220(東曹(股)製造),使用TSKgel Super AWM-H(東曹(股)製造,6.0mm ID×15.0cm)作為管柱,且使用10mmol/L的溴化鋰的N-甲基吡咯啶酮(N-methyl pyrrolidinone,NMP)溶液作為溶離液。 The method for measuring the weight average molecular weight and the number average molecular weight of the compound used in the present invention can be determined by gel permeation chromatography (GPC), and the molecular weight is defined as the measurement by GPC. Polystyrene converted value. For example, it can be obtained by using HLC-8220 (manufactured by Tosoh Corporation), using TSKgel Super AWM-H (manufactured by Tosoh Corporation, 6.0 mm ID × 15.0 cm) as a column, and using 10 mmol. /L lithium bromide N-methyl pyrrolidinone (NMP) solution as a solution.

所謂近紅外線,是指最大吸收波長範圍為700nm~2500nm 的光(電磁波)。 The so-called near infrared, the maximum absorption wavelength range is 700nm ~ 2500nm Light (electromagnetic waves).

於本說明書中,所謂總固體成分,是指自組成物的總組成中去掉溶劑所得的成分的總質量。本發明中的固體成分是指25℃下的固體成分。 In the present specification, the term "total solid content" means the total mass of the components obtained by removing the solvent from the total composition of the composition. The solid content in the present invention means a solid component at 25 °C.

<近紅外線吸收性組成物> <Near infrared absorbing composition>

本發明的近紅外線吸收性組成物(以下亦稱為本發明的組成物)含有銅錯合物,該銅錯合物是使分別具有至少各1個以陰離子進行配位的配位部位與以非共價電子對進行配位的配位原子的化合物(A)與銅成分反應而成。而且,本發明的組成物亦可含有如下的銅錯合物:將銅作為中心金屬、且將分別具有至少各1個以陰離子進行配位的配位部位與以非共價電子對進行配位的配位原子的化合物(A)(以下亦稱為化合物(A))作為配位體的銅錯合物。 The near-infrared absorbing composition of the present invention (hereinafter also referred to as the composition of the present invention) contains a copper complex which has at least one coordination site each having an anion coordinated The compound (A) in which the coordinating atom of the coordination is coordinated with a non-covalent electron pair is formed by reacting with a copper component. Further, the composition of the present invention may further contain a copper complex compound in which copper is used as a central metal and each of which has at least one coordination site coordinated by an anion and is coordinated with a non-covalent electron pair. The compound (A) of the coordinating atom (hereinafter also referred to as the compound (A)) serves as a copper complex of the ligand.

根據本發明的組成物,可獲得於可見範圍內透射率高、 且可實現高的近紅外線遮蔽性的近紅外線截止濾波器。另外,根據本發明,可使近紅外線截止濾波器的膜厚變薄,有助於照相機模組的薄型化。 According to the composition of the present invention, it is possible to obtain a high transmittance in the visible range, A near-infrared cut filter with high near-infrared shielding properties can be realized. Further, according to the present invention, the film thickness of the near-infrared cut filter can be made thin, which contributes to downsizing of the camera module.

獲得此種本申請案發明的效果的理由雖不確定,但可推測如下。關於銅成分與分別具有至少各1個以陰離子進行配位的配位部位與以非共價電子對進行配位的配位原子的化合物(A),相對於銅成分而化合物(A)作為螯合配位體發揮作用。即,認為化合物(A)所具有的以陰離子進行配位的配位部位及以非共價電子對 進行配位的配位原子與銅成分中的銅進行螯合配位,藉此銅錯合物的結構歪斜,可獲得可見光範圍內的高透射性,提高近紅外線的吸光能力,色值亦增大。 The reason for obtaining the effect of the invention of the present application is not certain, but it can be presumed as follows. The compound (A) having a copper component and a coordinating site each having at least one anion-coordinating ligand and a coordinating atom coordinated by a non-covalent electron pair, the compound (A) is used as a chelate with respect to the copper component. The complexing body functions. That is, it is considered that the coordination site of the compound (A) coordinated by an anion and the non-covalent electron pair The coordinating coordination atom and the copper in the copper component are chelate-coordinated, whereby the structure of the copper complex is skewed, high transmittance in the visible light range is obtained, the light absorption capability of the near infrared ray is improved, and the color value is also increased. Big.

本發明中所用的銅錯合物成為化合物(A)所具有的以 非共價電子對進行配位的配位原子與以陰離子進行配位的配位部位進行螯合配位而成的銅錯合物(銅化合物)的形態。本發明中所用的銅錯合物中的銅通常為二價銅,例如可使化合物(A)與銅成分(銅或含有銅的化合物)混合並進行反應等而獲得。 The copper complex compound used in the present invention has the compound (A) A form of a copper complex (copper compound) in which a coordinating atom coordinated by a non-covalent electron pair is chelate-coordinated with a coordination site coordinated by an anion. The copper in the copper complex used in the present invention is usually divalent copper, and can be obtained, for example, by mixing and reacting the compound (A) with a copper component (copper or a compound containing copper).

另外,本發明中所用的銅錯合物可例示:4配位、5配位及6配位,更佳為4配位及5配位。 Further, the copper complex compound used in the present invention may be exemplified by 4 coordination, 5 coordination, and 6 coordination, more preferably 4 coordination and 5 coordination.

此處,若可自本發明的組成物中檢測出銅與化合物(A)的結構,則可謂於本發明的組成物中形成了以化合物(A)作為配位體的銅錯合物。自本發明的組成物中檢測銅與化合物(A)的方法例如可列舉感應耦合電漿(Inductively Coupled Plasma,ICP)發光分析。 Here, when the structure of copper and the compound (A) can be detected from the composition of the present invention, a copper complex compound containing the compound (A) as a ligand can be formed in the composition of the present invention. The method for detecting copper and the compound (A) from the composition of the present invention is, for example, an inductively coupled plasma (ICP) luminescence analysis.

本發明中所用的銅錯合物較佳為於近紅外線波長範圍 700nm~2500nm內具有最大吸收波長(λmax),更佳為於720nm~890nm內具有最大吸收波長,進而佳為於730nm~880nm內具有最大吸收波長。最大吸收波長例如可使用卡里(Cary)5000紫外-可見-近紅外(Ultraviolet-visible-near infrared,UV-Vis-NIR)(分光光度計,安捷倫科技(Agilent Technologies)股份有限公司製造)來測定。 The copper complex used in the present invention preferably has a maximum absorption wavelength (λ max ) in the near-infrared wavelength range of 700 nm to 2500 nm, more preferably a maximum absorption wavelength in the range of 720 nm to 890 nm, and more preferably from 730 nm to 880 nm. It has the largest absorption wavelength inside. The maximum absorption wavelength can be measured, for example, using a Cary 5000 Ultra-Vibration-Near-Infrared (UV-Vis-NIR) (spectrophotometer, manufactured by Agilent Technologies, Inc.). .

<<分別具有至少各1個以陰離子進行配位的配位部位與以非共價電子對進行配位的配位原子的化合物(A)>> <<Compound (A) having at least one coordination site coordinated by an anion and a coordination atom coordinated by a non-covalent electron pair, respectively>>

化合物(A)可於1分子內具有至少1個以陰離子進行配位的配位部位,亦可具有2個。化合物(A)中若1分子內中的以陰離子進行配位的配位部位與以非共價電子對進行配位的配位原子的合計值為2個以上即可,亦可為3個,亦可為4個。 The compound (A) may have at least one coordination site coordinated by an anion in one molecule, or may have two. In the compound (A), the total number of the coordination sites coordinated by the anions in one molecule and the coordination atoms coordinated by the non-covalent electron pair may be two or more, or three. It can also be four.

作為以陰離子進行配位的配位部位與以非共價電子對進行配位的配位原子的合計值為3個的形態,可列舉:具有2個以陰離子進行配位的配位部位與1個以非共價電子對進行配位的配位原子的情形、具有1個以陰離子進行配位的配位部位與2個以非共價電子對進行配位的配位原子的情形。 The total value of the coordination site coordinated by the anion and the coordination atom coordinated by the non-covalent electron pair is three, and there are two coordination sites having an anion coordination and one In the case of a coordinating atom coordinated by a non-covalent electron pair, there is a case where one coordinating site coordinated by an anion and two coordinating atoms coordinated by a non-covalent electron pair.

作為以陰離子進行配位的配位部位與以非共價電子對進行配位的配位原子的合計值為4個的形態,可列舉:具有2個以陰離子進行配位的配位部位與2個以非共價電子對進行配位的配位原子的情形、具有1個以陰離子進行配位的配位部位與3個以非共價電子對進行配位的配位原子的情形。 The total value of the coordination site coordinated by the anion and the coordination atom coordinated by the non-covalent electron pair is four, and there are two coordination sites having two anions coordinated. In the case of a coordinating atom coordinated by a non-covalent electron pair, there is a case where one coordinating site coordinated by an anion and three coordinating atoms coordinated by a non-covalent electron pair.

化合物(A)的最大吸收波長(λmax)較佳為420nm以下,更佳為400nm以下,進而佳為350nm以下。且,化合物(A)的最大吸收波長較佳為10nm以上,更佳為50nm以上。另外,化合物(A)的最大吸收波長較佳為於430nm以上不存在。 The maximum absorption wavelength (λ max ) of the compound (A) is preferably 420 nm or less, more preferably 400 nm or less, and still more preferably 350 nm or less. Further, the maximum absorption wavelength of the compound (A) is preferably 10 nm or more, more preferably 50 nm or more. Further, the maximum absorption wavelength of the compound (A) is preferably not present at 430 nm or more.

化合物(A)可使用一種或者將兩種以上組合使用。 The compound (A) may be used alone or in combination of two or more.

化合物(A)中,將陰離子與以非共價電子對進行配位 的配位原子連結的原子數較佳為1~6,更佳為1~3。藉由設定為此種構成,銅錯合物的結構更容易歪斜,故可進一步增大色值。 In compound (A), anion is coordinated with a pair of non-covalent electrons The number of atoms to which the coordination atom is bonded is preferably from 1 to 6, more preferably from 1 to 3. By setting such a configuration, the structure of the copper complex is more likely to be skewed, so that the color value can be further increased.

將陰離子與以非共價電子對進行配位的配位原子連結的原子亦可為一種或兩種以上。將陰離子與以非共價電子對進行配位的配位原子連結的原子較佳為碳原子。 The atom to which the anion is bonded to the coordinating atom coordinated by the non-covalent electron pair may be one type or two or more types. The atom linking the anion to the coordinating atom coordinated by the non-covalent electron pair is preferably a carbon atom.

於以下的例示化合物中,陰離子為氧陰離子,以非共價電子對進行配位的配位原子為氮原子,將陰離子與以非共價電子對進行配位的配位原子連結的原子為碳原子。另外,將陰離子與以非共價電子對進行配位的配位原子連結的原子數為2。 In the following exemplified compounds, the anion is an oxyanion, the coordinating atom coordinated by a non-covalent electron pair is a nitrogen atom, and the atom linking the anion to a coordinating atom coordinated by a non-covalent electron pair is carbon. atom. Further, the number of atoms linking an anion to a coordinating atom coordinated by a non-covalent electron pair is two.

化合物(A)的分子量較佳為50~1000,更佳為50~600。 The molecular weight of the compound (A) is preferably from 50 to 1,000, more preferably from 50 to 600.

於化合物(A)中,陰離子只要可配位於銅成分中的銅原子上即可,較佳為氧陰離子、氮陰離子或硫陰離子。 In the compound (A), the anion may be provided on the copper atom in the copper component, and is preferably an oxyanion, a nitrogen anion or a sulfur anion.

以陰離子進行配位的配位部位較佳為選自以下組群(AN)中的至少一種。再者,以下結構式中的波浪線為與構成化合物(A)的原子團的鍵結位置。 The coordination site coordinated by the anion is preferably at least one selected from the group consisting of the following groups (AN). Further, the wavy line in the following structural formula is a bonding position with the atomic group constituting the compound (A).

組群(AN) Group (AN)

另外,以陰離子進行配位的配位部位亦較佳為以下的組群(AN-11)。再者,以下結構式中的波浪線為與構成化合物(A)的原子團的鍵結位置。 Further, the coordination site coordinated by an anion is also preferably the following group (AN-11). Further, the wavy line in the following structural formula is a bonding position with the atomic group constituting the compound (A).

組群(AN-11) Group (AN-11)

所述以陰離子進行配位的配位部位中,X表示N或CR, R較佳為分別獨立地表示氫原子、烷基、烯基、炔基、芳基或雜芳基。 In the coordination site coordinated by an anion, X represents N or CR, R preferably each independently represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group or a heteroaryl group.

烷基可為直鏈狀、分支狀或環狀,較佳為直鏈狀。烷基的碳數較佳為1~10,更佳為1~6,進而佳為1~4。烷基的例子可列舉甲基。烷基亦可具有取代基,取代基可列舉鹵素原子、羧基、雜環基。作為取代基的雜環基可為單環亦可為多環,另外,可為芳香族亦可為非芳香族。構成雜環的雜原子的個數較佳為1~3,較佳為1或2。構成雜環的雜原子較佳為氮原子。於烷基具有取代基的情形時,亦可更具有取代基。 The alkyl group may be linear, branched or cyclic, and is preferably linear. The carbon number of the alkyl group is preferably from 1 to 10, more preferably from 1 to 6, more preferably from 1 to 4. An example of the alkyl group is a methyl group. The alkyl group may have a substituent, and examples of the substituent include a halogen atom, a carboxyl group, and a heterocyclic group. The heterocyclic group as a substituent may be a monocyclic ring or a polycyclic ring, and may be aromatic or non-aromatic. The number of the hetero atoms constituting the hetero ring is preferably from 1 to 3, preferably from 1 or 2. The hetero atom constituting the hetero ring is preferably a nitrogen atom. In the case where the alkyl group has a substituent, it may have a more substituent.

烯基的碳數較佳為1~10,更佳為1~6。 The number of carbon atoms of the alkenyl group is preferably from 1 to 10, more preferably from 1 to 6.

炔基的碳數較佳為1~10,更佳為1~6。 The alkynyl group preferably has a carbon number of from 1 to 10, more preferably from 1 to 6.

芳基可為單環亦可為多環,較佳為單環。芳基的碳數較佳為6~18,更佳為6~12,進而佳為6。 The aryl group may be a single ring or a polycyclic ring, preferably a single ring. The carbon number of the aryl group is preferably from 6 to 18, more preferably from 6 to 12, and still more preferably 6.

雜芳基可為單環亦可為多環。構成雜芳基的雜原子的個數較佳為1~3。構成雜芳基的雜原子較佳為氮原子、硫原子、氧原子。雜芳基的碳數較佳為6~18,更佳為6~12。 The heteroaryl group may be a single ring or a polycyclic ring. The number of the hetero atoms constituting the heteroaryl group is preferably from 1 to 3. The hetero atom constituting the heteroaryl group is preferably a nitrogen atom, a sulfur atom or an oxygen atom. The carbon number of the heteroaryl group is preferably from 6 to 18, more preferably from 6 to 12.

於化合物(A)中,以非共價電子對進行配位的配位原子較佳為氧原子、氮原子、硫原子或磷原子,更佳為氧原子、氮原子或硫原子,進而佳為氮原子。於以非共價電子對進行配位的配位原子為氮原子的情形時,較佳為鄰接於氮原子的原子為碳原子,且所述碳原子具有取代基。 In the compound (A), the coordinating atom coordinated by the non-covalent electron pair is preferably an oxygen atom, a nitrogen atom, a sulfur atom or a phosphorus atom, more preferably an oxygen atom, a nitrogen atom or a sulfur atom, and further preferably Nitrogen atom. In the case where the coordinating atom coordinated by the non-covalent electron pair is a nitrogen atom, it is preferred that the atom adjacent to the nitrogen atom is a carbon atom, and the carbon atom has a substituent.

以非共價電子對進行配位的配位原子較佳為含有於環 中,或含有於選自以下組群(UE)中的至少一種部分結構中。再者,以下結構式中的波浪線為與構成化合物(A)的原子團的鍵結位置。 Coordination atoms coordinated by non-covalent electron pairs are preferably contained in the ring Or in at least one partial structure selected from the group consisting of (UE). Further, the wavy line in the following structural formula is a bonding position with the atomic group constituting the compound (A).

組群(UE) Group (UE)

組群(UE)中,R1表示氫原子、烷基、烯基、炔基、芳基或雜芳基,R2表示氫原子、烷基、烯基、炔基、芳基、雜芳基、烷氧基、芳氧基、雜芳氧基、烷硫基、芳硫基、雜芳硫基、胺基或醯基。 In the group (UE), R 1 represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group or a heteroaryl group, and R 2 represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group or a heteroaryl group. Alkoxy, aryloxy, heteroaryloxy, alkylthio, arylthio, heteroarylthio, amine or fluorenyl.

於以非共價電子對進行配位的配位原子含有於環中的情形時,含有以非共價電子對進行配位的配位原子的環可為單環亦可為多環,另外,可為芳香族亦可為非芳香族。含有以非共價電子對進行配位的配位原子的環較佳為5員環~12員環,更佳為5員環~7員環。 In the case where a coordinating atom coordinated by a non-covalent electron pair is contained in a ring, the ring containing a coordinating atom coordinated by a non-covalent electron pair may be a single ring or a polycyclic ring, and It can be aromatic or non-aromatic. The ring containing a coordinating atom coordinated by a non-covalent electron pair is preferably a 5-membered ring to a 12-membered ring, more preferably a 5-membered ring to a 7-membered ring.

含有以非共價電子對進行配位的配位原子的環亦可具有取代基,取代基可列舉:烴基(例如:碳數1~30(較佳為碳數1~10) 的直鏈狀、分支狀或環狀的烷基,碳數6~30(較佳為碳數6~12)的芳基)、鹵素原子、矽原子、碳數1~12的烷氧基、碳數2~12的醯基、碳數1~12的烷硫基、羧基等。於取代基為烴基的情形時,亦較佳為包含烴基與-O-的組合的基團。 The ring containing a coordinating atom coordinated by a non-covalent electron pair may have a substituent, and the substituent may be a hydrocarbon group (for example, a carbon number of 1 to 30 (preferably, a carbon number of 1 to 10). a linear, branched or cyclic alkyl group, an aryl group having 6 to 30 carbon atoms (preferably 6 to 12 carbon atoms), a halogen atom, a halogen atom, an alkoxy group having 1 to 12 carbon atoms, A fluorenyl group having 2 to 12 carbon atoms, an alkylthio group having 1 to 12 carbon atoms, and a carboxyl group. In the case where the substituent is a hydrocarbon group, a group containing a combination of a hydrocarbon group and -O- is also preferred.

於含有以非共價電子對進行配位的配位原子的環具有取代基的情形時,亦可更具有取代基,可列舉:包含含有以非共價電子對進行配位的配位原子的環的基團、包含選自所述組群(UE)中的至少一種部分結構的基團、碳數1~12的烷基、碳數2~12的醯基、羥基。 In the case where the ring containing a coordinating atom coordinated by a non-covalent electron pair has a substituent, it may have a more substituent, and may include a coordinating atom containing a coordinate group coordinated by a non-covalent electron. a group of a ring, a group containing at least one partial structure selected from the group (UE), an alkyl group having 1 to 12 carbon atoms, a fluorenyl group having 2 to 12 carbon atoms, and a hydroxyl group.

於含有以非共價電子對進行配位的配位原子的環具有取代基的情形時,較佳為取代基鍵結於以非共價電子對進行配位的配位原子所鍵結的原子。 In the case where the ring containing a coordinating atom coordinated by a non-covalent electron pair has a substituent, it is preferred that the substituent is bonded to an atom bonded to a coordinating atom coordinated by a non-covalent electron pair. .

於以非共價電子對進行配位的配位原子含有於組群(UE)所表示的部分結構中的情形時,表示氫原子、烷基、烯基、炔基、芳基或雜芳基,R2表示氫原子、烷基、烯基、炔基、芳基、雜芳基、烷氧基、芳氧基、雜芳氧基、烷硫基、芳硫基、雜芳硫基、胺基或醯基。 When a coordinating atom coordinated by a non-covalent electron pair is contained in a partial structure represented by a group (UE), it represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group or a heteroaryl group. R 2 represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group, a heteroaryl group, an alkoxy group, an aryloxy group, a heteroaryloxy group, an alkylthio group, an arylthio group, a heteroarylthio group, an amine. Base or thiol.

烷基、烯基、炔基、芳基及雜芳基與所述以陰離子進行配位的配位部位中說明的烷基、炔基、芳基及雜芳基為相同含意,較佳範圍亦相同。 The alkyl group, the alkenyl group, the alkynyl group, the aryl group and the heteroaryl group have the same meanings as the alkyl group, alkynyl group, aryl group and heteroaryl group described in the coordination site where the anion is coordinated, and the preferred range is also the same.

烷氧基的碳數較佳為1~12,更佳為3~9。 The alkoxy group preferably has 1 to 12 carbon atoms, more preferably 3 to 9 carbon atoms.

芳氧基的碳數較佳為6~18,更佳為6~12。 The carbon number of the aryloxy group is preferably from 6 to 18, more preferably from 6 to 12.

雜芳氧基可為單環亦可為多環。構成雜芳氧基的雜芳基與所述以陰離子進行配位的配位部位中說明的雜芳基為相同含意,較佳範圍亦相同。 The heteroaryloxy group may be a single ring or a polycyclic ring. The heteroaryl group constituting the heteroaryloxy group has the same meaning as the heteroaryl group described in the coordination site where the anion is coordinated, and the preferred range is also the same.

烷硫基的碳數較佳為1~12,更佳為1~9。 The carbon number of the alkylthio group is preferably from 1 to 12, more preferably from 1 to 9.

芳硫基的碳數較佳為6~18,更佳為6~12。 The carbon number of the arylthio group is preferably from 6 to 18, more preferably from 6 to 12.

雜芳硫基可為單環亦可為多環。構成雜芳硫基的雜芳基與所述以陰離子進行配位的配位部位中說明的雜芳基為相同含意,較佳範圍亦相同。 The heteroarylthio group may be a single ring or a polycyclic ring. The heteroaryl group constituting the heteroarylthio group has the same meaning as the heteroaryl group described in the coordination site where the anion is coordinated, and the preferred range is also the same.

醯基的碳數較佳為2~12,更佳為2~9。 The carbon number of the fluorenyl group is preferably from 2 to 12, more preferably from 2 to 9.

化合物(A)亦較佳為由下述通式(IV)所表示。 The compound (A) is also preferably represented by the following formula (IV).

X1-L1-Y1 通式(IV) X 1 -L 1 -Y 1 Formula (IV)

通式(IV)中,X1表示由組群(AN)或所述組群(AN-11)所表示的配位部位。Y1表示含有以非共價電子對進行配位的配位原子的環、或組群(UE)所表示的部分結構。L1表示單鍵或二價連結基。 In the general formula (IV), X 1 represents a coordination site represented by a group (AN) or the group (AN-11). Y 1 represents a ring containing a coordinating atom coordinated by a non-covalent electron pair, or a partial structure represented by a group (UE). L 1 represents a single bond or a divalent linking group.

通式(IV)中,X1與所述以陰離子進行配位的配位部位為相同含意,較佳範圍亦相同。 In the general formula (IV), X 1 has the same meaning as the coordination site coordinated by the anion, and the preferred range is also the same.

通式(IV)中,Y1與所述含有以非共價電子對進行配位的配位原子的環、或所述含有以非共價電子對進行配位的配位原子的部分結構為相同含意,較佳範圍亦相同。 In the formula (IV), the partial structure of Y 1 with the ring containing a coordinating atom coordinated by a non-covalent electron pair or the coordinate atom containing a coordinating atom with a non-covalent electron pair is The same meaning, the preferred range is also the same.

於通式(IV)中,於L1表示二價連結基的情形時,較佳為碳數1~12的伸烷基、碳數6~12的伸芳基、-SO、、-O-、-SO2-或包含該等的組合的基團,較佳為碳數1~3的伸烷基、伸苯基或-SO2-。 In the general formula (IV), when L 1 represents a divalent linking group, an alkylene group having 1 to 12 carbon atoms, an extended aryl group having 6 to 12 carbon atoms, -SO, and -O- are preferred. And -SO 2 - or a group containing the combination of these, preferably an alkylene group having a carbon number of 1 to 3, a phenyl group or a -SO 2 - group.

化合物(A)的更詳細的例子亦可列舉下述通式(IV-1)~通式(IV-8)所表示的化合物。 More specific examples of the compound (A) include the compounds represented by the following formula (IV-1) to formula (IV-8).

通式(IV-1)~通式(IV-8)中,X2~X4、X8、X9分別獨立地表示選自所述組群(AN)或所述組群(AN-11)中的至少一種。另外,X5、X7、X10~X12分別獨立地為選自以下組群(AN-1)或組群(AN-12)中的至少一種。組群(AN-1)、組群(AN-12)中的X表示N或CR,R與所述組群(AN)中的CR所說明的R為相同含意。波浪線為與構成化合物(A)的原子團的鍵結位置。 In the general formulae (IV-1) to (IV-8), X 2 to X 4 , X 8 and X 9 each independently represent a group selected from the group (AN) or the group (AN-11). At least one of them. Further, X 5 , X 7 , and X 10 to X 12 are each independently at least one selected from the group consisting of the following group (AN-1) or group (AN-12). X in the group (AN-1) and the group (AN-12) represents N or CR, and R has the same meaning as R described by CR in the group (AN). The wavy line is a bonding position with the atomic group constituting the compound (A).

組群(AN-1) Group (AN-1)

組群(AN-12) Group (AN-12)

通式(IV-1)~通式(IV-8)中,Y3、Y5~Y7、Y12~Y15 分別獨立地表示含有以非共價電子對進行配位的配位原子的環、或選自所述組群(UE)中的至少一種部分結構。另外,Y2、Y4、Y8~Y11、Y16分別獨立地為含有以非共價電子對進行配位的配位原子的環、或選自以下組群(UE-1)中的至少一種。組群(UE-1)中的R與以非共價電子對進行配位的配位原子含有於所述組群(UE)所表示的部分結構中的情形的R為相同含意。波浪線為與構成化合物(A)的原子團的鍵結位置。 In the general formulae (IV-1) to (IV-8), Y 3 , Y 5 to Y 7 , and Y 12 to Y 15 each independently represent a coordinating atom coordinated by a non-covalent electron pair. A ring, or at least one partial structure selected from the group (UE). Further, Y 2 , Y 4 , Y 8 to Y 11 , and Y 16 are each independently a ring containing a coordinating atom coordinated by a non-covalent electron pair, or selected from the following group (UE-1) At least one. R in the group (UE-1) is identical to R in the case where the coordinating atom coordinated by the non-covalent electron pair is contained in the partial structure represented by the group (UE). The wavy line is a bonding position with the atomic group constituting the compound (A).

組群(UE-1) Group (UE-1)

通式(IV-1)~通式(IV-8)中,L2~L20分別獨立地表示單鍵或二價連結基。二價連結基與通式(IV)中的L1表示二價連結基的情形為相同含意,較佳範圍亦相同。 In the general formulae (IV-1) to (IV-8), L 2 to L 20 each independently represent a single bond or a divalent linking group. The divalent linking group has the same meaning as the case where L 1 in the formula (IV) represents a divalent linking group, and the preferred range is also the same.

化合物(A)亦較佳為以下通式(IV-11)~通式(IV-20)所表示的化合物。 The compound (A) is also preferably a compound represented by the following formula (IV-11) to formula (IV-20).

通式(IV-11)~通式(IV-20)中,Z1~Z34、Z101~Z108、 Z201~Z203分別獨立地表示配位部位,L11~L25分別獨立地表示單鍵或二價連結基,L26~L32分別獨立地表示三價連結基,L33~L34分別獨立地表示四價連結基。 In the general formulae (IV-11) to (IV-20), Z 1 to Z 34 , Z 101 to Z 108 , and Z 201 to Z 203 each independently represent a coordination site, and L 11 to L 25 are independently independently The single bond or the divalent linking group is represented, and L 26 to L 32 each independently represent a trivalent linking group, and L 33 to L 34 each independently represent a tetravalent linking group.

Z1~Z34較佳為分別獨立地表示包含含有以非共價電子對進行配位的配位原子的環的基團、選自所述組群(AN-11)或組群(UE)中的至少一種。 Z 1 to Z 34 preferably each independently represent a group comprising a ring containing a coordinating atom coordinated by a non-covalent electron pair, and is selected from the group (AN-11) or group (UE). At least one of them.

Z101~Z108較佳為分別獨立地表示包含含有以非共價電子對進行配位的配位原子的環的基團、選自所述組群(AN-12)或組群(UE-1)中的至少一種。 Z 101 to Z 108 preferably each independently represent a group comprising a ring containing a coordinating atom coordinated by a non-covalent electron pair, selected from the group (AN-12) or a group (UE- At least one of 1).

Z201~Z203較佳為分別獨立地表示選自下述組群(UE-2)中的至少一種。 Z 201 to Z 203 preferably each independently represent at least one selected from the group consisting of UE-2.

L11~L25分別獨立地表示單鍵或二價連結基。作為二價連結基,較佳為碳數1~12的伸烷基、碳數6~12的伸芳基、-SO-、-O-、-SO2-或包含該等的組合的基團,更佳為碳數1~3的伸烷基、伸苯基、-SO2-或包含該等的組合的基團。 L 11 to L 25 each independently represent a single bond or a divalent linking group. The divalent linking group is preferably an alkylene group having 1 to 12 carbon atoms, an extended aryl group having 6 to 12 carbon atoms, -SO-, -O-, -SO 2 - or a group containing the combination thereof. More preferably, it is an alkyl group having 1 to 3 carbon atoms, a phenyl group, a -SO 2 - group or a group containing the combination.

L26~L32分別獨立地表示三價連結基。作為三價連結基,可列舉自所述二價連結基中去掉一個氫原子所得的基團。 L 26 to L 32 each independently represent a trivalent linking group. Examples of the trivalent linking group include a group obtained by removing one hydrogen atom from the divalent linking group.

L33~L34分別獨立地表示四價連結基。作為四價連結基,可列舉自所述二價連結基中去掉二個氫原子所得的基團。 L 33 to L 34 each independently represent a tetravalent linking group. Examples of the tetravalent linking group include a group obtained by removing two hydrogen atoms from the divalent linking group.

組群(UE-2) Group (UE-2)

再者,為了提高可見光透射性,化合物(A)較佳為並非芳香族等的π共軛系連續而多個鍵結。 Further, in order to improve the visible light transmittance, the compound (A) is preferably a continuous π-conjugated system other than an aromatic group and a plurality of bonds.

化合物(A)亦較佳為含有5員環或6員環的化合物, 且以共價電子對進行配位的配位原子亦較佳為構成5員環或6員環。 The compound (A) is also preferably a compound having a 5-membered ring or a 6-membered ring. Further, the coordinating atom coordinated by the covalent electron pair preferably also constitutes a 5-membered ring or a 6-membered ring.

化合物(A)所具有的以非共價電子對進行配位的配位原子亦較佳為氮原子。另外,亦較佳為與化合物(A)所具有的作為以非共價電子對進行配位的配位原子的氮原子鄰接的原子為碳原子,且所述碳原子具有取代基。藉由設定為此種構成,銅錯合物的結構更容易歪斜,故可進一步增大色值。取代基與所述含有以非共價電子對進行配位的配位原子的環亦可具有的取代基為相同含意,較佳為碳數1~30的烴基(例如:碳數1~30的烷基(較佳為碳數1~12的烷基)、碳數6~30的芳基(較佳為碳數6~12的芳基))、羧基、碳數1~12的烷氧基、碳數1~12的醯基、碳數1~12的烷硫基、鹵素原子。尤佳為烷基、芳基、羧基、鹵素原子。 The coordinating atom which the compound (A) has coordinated with a non-covalent electron pair is also preferably a nitrogen atom. Further, it is also preferred that the atom adjacent to the nitrogen atom of the coordinating atom coordinated by the non-covalent electron pair of the compound (A) is a carbon atom, and the carbon atom has a substituent. By setting such a configuration, the structure of the copper complex is more likely to be skewed, so that the color value can be further increased. The substituent may have the same meaning as the substituent having a coordinating atom coordinated by a non-covalent electron pair, and is preferably a hydrocarbon group having 1 to 30 carbon atoms (for example, a carbon number of 1 to 30) An alkyl group (preferably an alkyl group having 1 to 12 carbon atoms), an aryl group having 6 to 30 carbon atoms (preferably an aryl group having 6 to 12 carbon atoms), a carboxyl group, and an alkoxy group having 1 to 12 carbon atoms. A fluorenyl group having 1 to 12 carbon atoms, an alkylthio group having 1 to 12 carbon atoms, and a halogen atom. More preferably, it is an alkyl group, an aryl group, a carboxyl group, or a halogen atom.

化合物(A)亦較佳為由式(II)或式(III)所表示。 The compound (A) is also preferably represented by the formula (II) or the formula (III).

式(II)中,X2表示含有以陰離子進行配位的配位部位的基團。Y2表示氧原子、氮原子、硫原子或磷原子。A1及A5分別獨立地表示碳原子、氮原子或磷原子。A2~A4分別獨立地表示碳原子、氧原子、氮原子、硫原子或磷原子。R1表示取代基。RX2表示取代基。n2表示0~3的整數。式(III)中,X3表示含有所述以陰離子進行配位的配位部位的基團。Y3表示氧原子、氮原子、硫原子或磷原子。A6及A9分別獨立地表示碳原子、氮原子或磷原子。A7及A8分別獨立地表示碳原子、氧原子、氮原子、硫原子或磷原子。R2表示取代基。RX3表示取代基。n3表示0~2的整數。 In the formula (II), X 2 represents a group containing a coordination site coordinated by an anion. Y 2 represents an oxygen atom, a nitrogen atom, a sulfur atom or a phosphorus atom. A 1 and A 5 each independently represent a carbon atom, a nitrogen atom or a phosphorus atom. A 2 to A 4 each independently represent a carbon atom, an oxygen atom, a nitrogen atom, a sulfur atom or a phosphorus atom. R 1 represents a substituent. R X2 represents a substituent. N2 represents an integer from 0 to 3. In the formula (III), X 3 represents a group containing the coordination site coordinated by the anion. Y 3 represents an oxygen atom, a nitrogen atom, a sulfur atom or a phosphorus atom. A 6 and A 9 each independently represent a carbon atom, a nitrogen atom or a phosphorus atom. A 7 and A 8 each independently represent a carbon atom, an oxygen atom, a nitrogen atom, a sulfur atom or a phosphorus atom. R 2 represents a substituent. R X3 represents a substituent. N3 represents an integer from 0 to 2.

式(II)中,X2例如可僅包含所述含有以陰離子進行配位的配位部位的基團,亦可使所述含有以陰離子進行配位的配位部位的基團具有取代基。含有以陰離子進行配位的配位部位的基團可具有的取代基可列舉鹵素原子、羧基、雜環基。作為取代基的雜環基可為單環亦可為多環,另外,可為芳香族亦可為非芳香族。構成雜環的雜原子的個數較佳為1~3,較佳為1或2。構成雜環的雜原子較佳為氮原子。 In the formula (II), X 2 may include, for example, only a group containing a coordination site coordinated by an anion, or a group having a coordination site coordinated by an anion may have a substituent. Examples of the substituent which the group having a coordination site coordinated by an anion may have a halogen atom, a carboxyl group, or a heterocyclic group. The heterocyclic group as a substituent may be a monocyclic ring or a polycyclic ring, and may be aromatic or non-aromatic. The number of the hetero atoms constituting the hetero ring is preferably from 1 to 3, preferably from 1 or 2. The hetero atom constituting the hetero ring is preferably a nitrogen atom.

式(II)中,Y2表示氧原子、氮原子、硫原子或磷原子,較佳為氧原子、氮原子或硫原子,更佳為氧原子或氮原子,進而佳 為氮原子。 In the formula (II), Y 2 represents an oxygen atom, a nitrogen atom, a sulfur atom or a phosphorus atom, preferably an oxygen atom, a nitrogen atom or a sulfur atom, more preferably an oxygen atom or a nitrogen atom, and further preferably a nitrogen atom.

式(II)中,A1及A5分別獨立地表示碳原子、氮原子或磷原子,較佳為碳原子。 In the formula (II), A 1 and A 5 each independently represent a carbon atom, a nitrogen atom or a phosphorus atom, and preferably a carbon atom.

式(II)中,A2~A4分別獨立地表示碳原子、氧原子、氮原子、硫原子或磷原子。A2及A3較佳為表示碳原子。A4較佳為表示碳原子或氮原子。 In the formula (II), A 2 to A 4 each independently represent a carbon atom, an oxygen atom, a nitrogen atom, a sulfur atom or a phosphorus atom. A 2 and A 3 preferably represent a carbon atom. A 4 preferably represents a carbon atom or a nitrogen atom.

式(II)中,R1表示取代基,於所述化合物(A)所具有的作為以非共價電子對進行配位的配位原子的氮原子的鄰接原子為碳原子的情形時,與所述碳原子所具有的取代基為相同含意,較佳範圍亦相同。再者,就吸水性的觀點而言,R1亦較佳為疏水性的取代基,更佳為亦可具有取代基的碳數1~30的烴基,進而佳為碳數1~30的烷基或碳數6~30的芳基,尤佳為碳數1~10的烷基。於R1表示烷基的情形時,較佳為一級烷基或二級烷基,更佳為一級烷基。 In the formula (II), R 1 represents a substituent, and when the adjacent atom of the nitrogen atom which is a coordinating atom coordinated by the non-covalent electron pair of the compound (A) is a carbon atom, The substituents possessed by the carbon atoms have the same meanings, and the preferred ranges are also the same. Further, from the viewpoint of water absorbability, R 1 is also preferably a hydrophobic substituent, more preferably a hydrocarbon group having 1 to 30 carbon atoms which may have a substituent, and more preferably an alkyl group having 1 to 30 carbon atoms. The aryl group having a carbon number of 6 to 30 is particularly preferably an alkyl group having 1 to 10 carbon atoms. In the case where R 1 represents an alkyl group, it is preferably a primary alkyl group or a secondary alkyl group, more preferably a primary alkyl group.

式(II)中,RX2表示取代基,與所述含有以非共價電子對進行配位的配位原子的環可具有的取代基為相同含意,較佳範圍亦相同。RX2較佳為式(II)中的A2~A4的任一個取代基,另外,Y2上較佳為未經取代。 In the formula (II), R X2 represents a substituent, and the substituent which the ring containing a coordinating atom coordinated by a non-covalent electron pair may have the same meaning, and the preferred range is also the same. R X2 is preferably any one of A 2 to A 4 in the formula (II), and further preferably unsubstituted on Y 2 .

式(II)中,n2表示0~3的整數,較佳為0或1,更佳為0。 In the formula (II), n2 represents an integer of 0 to 3, preferably 0 or 1, more preferably 0.

於化合物(A)由式(II)所表示的情形時,含有式(II)中的Y2的雜環亦可為單環結構,亦可為多環結構。於含有Y2的雜環為單環結構的情形的具體例可列舉:吡啶環、噠嗪環、嘧啶環、 吡嗪環、三嗪環、吡喃環等。於含有Y2的雜環為多環結構的情形的具體例可列舉:喹啉環、異喹啉環、喹噁啉環、吖啶環等。 When the compound (A) is represented by the formula (II), the hetero ring containing Y 2 in the formula (II) may have a monocyclic structure or a polycyclic structure. Specific examples of the case where the hetero ring containing Y 2 has a monocyclic structure include a pyridine ring, a pyridazine ring, a pyrimidine ring, a pyrazine ring, a triazine ring, a pyran ring, and the like. Specific examples of the case where the hetero ring containing Y 2 has a polycyclic structure include a quinoline ring, an isoquinoline ring, a quinoxaline ring, an acridine ring and the like.

於化合物(A)為含有吡啶環的化合物且在吡啶環的6位上具有一級烷基或二級烷基的情形時,可使可見光範圍內的透射性更良好。本申請案說明書中,所謂化合物(A)為含有吡啶環的化合物的情形的吡啶環的6位,是指所述式(II)中的Y2表示氮原子、A1~A5表示碳原子的情形的R1的取代位置。於化合物(A)在吡啶環的6位上具有一級烷基或二級烷基的情形的烷基的碳數較佳為1~10,更佳為1~6,進而佳為1~3。於化合物(A)在吡啶環的6位上具有一級烷基或二級烷基的情形的烷基亦較佳為包含與-O-的組合的基團。化合物(A)在吡啶環的6位上具有的烷基較佳為一級烷基。 When the compound (A) is a pyridine ring-containing compound and has a primary alkyl group or a secondary alkyl group at the 6-position of the pyridine ring, the transmittance in the visible light range can be further improved. In the specification of the present application, the compound 6 (A) is a 6-position of a pyridine ring in the case of a compound containing a pyridine ring, and means that Y 2 in the formula (II) represents a nitrogen atom, and A 1 to A 5 represent a carbon atom. The position of R 1 in place of substitution. The alkyl group in the case where the compound (A) has a primary alkyl group or a secondary alkyl group at the 6-position of the pyridine ring has a carbon number of preferably 1 to 10, more preferably 1 to 6, more preferably 1 to 3. The alkyl group in the case where the compound (A) has a primary alkyl group or a secondary alkyl group at the 6-position of the pyridine ring is also preferably a group containing a combination with -O-. The alkyl group of the compound (A) at the 6-position of the pyridine ring is preferably a primary alkyl group.

式(III)中,X3表示含有以陰離子進行配位的配位部位的基團,與式(II)中的X2為相同含意,較佳範圍亦相同。 In the formula (III), X 3 represents a group containing a coordination site coordinated by an anion, and has the same meaning as X 2 in the formula (II), and the preferred range is also the same.

式(III)中,Y3表示氧原子、氮原子、硫原子或磷原子,較佳為氧原子、氮原子或硫原子,更佳為氧原子或氮原子。 In the formula (III), Y 3 represents an oxygen atom, a nitrogen atom, a sulfur atom or a phosphorus atom, preferably an oxygen atom, a nitrogen atom or a sulfur atom, more preferably an oxygen atom or a nitrogen atom.

式(III)中,A6及A9分別獨立地表示碳原子、氮原子或磷原子。A6較佳為碳原子或氮原子。A9較佳為碳原子。 In the formula (III), A 6 and A 9 each independently represent a carbon atom, a nitrogen atom or a phosphorus atom. A 6 is preferably a carbon atom or a nitrogen atom. A 9 is preferably a carbon atom.

式(III)中,A7及A8分別獨立地表示碳原子、氧原子、氮原子、硫原子或磷原子。A7較佳為碳原子。A8較佳為碳原子、氮原子或硫原子。 In the formula (III), A 7 and A 8 each independently represent a carbon atom, an oxygen atom, a nitrogen atom, a sulfur atom or a phosphorus atom. A 7 is preferably a carbon atom. A 8 is preferably a carbon atom, a nitrogen atom or a sulfur atom.

式(III)中,R2表示取代基,與式(II)中的R1為相同含意。 再者,就吸水性的觀點而言,R2較佳為疏水性的取代基,更佳為碳數1~30的烴基,進而佳為碳數3~30的烷基、碳數6~30的芳基,尤佳為碳數3~15的烷基。於R2表示烷基的情形時,較佳為二級烷基或三級烷基。 In the formula (III), R 2 represents a substituent and has the same meaning as R 1 in the formula (II). Further, from the viewpoint of water absorbability, R 2 is preferably a hydrophobic substituent, more preferably a hydrocarbon group having 1 to 30 carbon atoms, more preferably an alkyl group having 3 to 30 carbon atoms, and a carbon number of 6 to 30. The aryl group is particularly preferably an alkyl group having 3 to 15 carbon atoms. In the case where R 2 represents an alkyl group, a secondary alkyl group or a tertiary alkyl group is preferred.

式(III)中,RX3表示取代基,與式(II)中的RX2為相同含意,較佳範圍亦相同。 In the formula (III), R X3 represents a substituent, and has the same meaning as R X2 in the formula (II), and the preferred range is also the same.

式(III)中,n3表示0~2的整數,較佳為0或1,更佳為0。 In the formula (III), n3 represents an integer of 0 to 2, preferably 0 or 1, more preferably 0.

再者,為了提高可見光透射性,RX1及RX2較佳為並非π共軛系連續而多個鍵結的取代基。 Further, in order to improve the visible light transmittance, R X1 and R X2 are preferably a substituent which is not a π-conjugated system but a plurality of bonds.

於化合物(A)由式(III)所表示的情形時,含有式(III)中的Y3的雜環亦可為單環結構,亦可為多環結構。於含有Y3的雜環為單環結構的情形的具體例可列舉:吡唑環、咪唑環、三唑環、噁唑環、噻唑環、異噻唑環等。於含有Y3的雜環為多環結構的情形的具體例可列舉:吲哚環、異吲哚環、苯并呋喃環、異苯并呋喃環等。 When the compound (A) is represented by the formula (III), the hetero ring containing Y 3 in the formula (III) may have a single ring structure or a polycyclic structure. Specific examples of the case where the hetero ring containing Y 3 has a monocyclic structure include a pyrazole ring, an imidazole ring, a triazole ring, an oxazole ring, a thiazole ring, and an isothiazole ring. Specific examples of the case where the hetero ring containing Y 3 has a polycyclic structure include an anthracene ring, an isoindole ring, a benzofuran ring, an isobenzofuran ring and the like.

於化合物(A)為含有吡唑環的化合物且在吡唑環的5位上具有二級烷基或三級烷基的情形時,可使可見光範圍內的透射性更良好。本申請案說明書中,所謂化合物(A)為含有吡唑環的化合物的情形的吡唑環的5位,是指所述式(III)中的Y3及A6表示氮原子、A7~A9表示碳原子的情形的R2的取代位置。於化合物(A)在吡唑環的5位上具有二級烷基或三級烷基的情形的烷基的碳數較佳為3~15,更佳為3~12。 When the compound (A) is a compound containing a pyrazole ring and has a secondary alkyl group or a tertiary alkyl group at the 5-position of the pyrazole ring, the transmittance in the visible light range can be further improved. In the specification of the present application, the compound 5 (A) is a 5-position of a pyrazole ring in the case of a pyrazole ring-containing compound, and means that Y 3 and A 6 in the formula (III) represent a nitrogen atom and A 7 ~. A 9 represents the substitution position of R 2 in the case of a carbon atom. The alkyl group in the case where the compound (A) has a secondary alkyl group or a tertiary alkyl group at the 5-position of the pyrazole ring has a carbon number of preferably 3 to 15, more preferably 3 to 12.

化合物(A)亦較佳為由下述式(I)所表示。藉由設定為此種構成,可進一步提高耐熱性。 The compound (A) is also preferably represented by the following formula (I). By setting such a configuration, heat resistance can be further improved.

式(I)中,X1表示含有以陰離子進行配位的配位部位的基團。Y1表示氮原子或磷原子,與鄰接的碳原子一起構成4員環~7員環。RX1表示取代基,n1表示0~6的整數。 In the formula (I), X 1 represents a group containing a coordination site coordinated by an anion. Y 1 represents a nitrogen atom or a phosphorus atom, and together with adjacent carbon atoms constitutes a 4-membered ring to a 7-membered ring. R X1 represents a substituent, and n1 represents an integer of 0-6.

式(I)中,X1表示含有以陰離子進行配位的配位部位的基團,與式(II)中的X2為相同含意,較佳範圍亦相同。 In the formula (I), X 1 represents a group containing a coordination site coordinated by an anion, and has the same meaning as X 2 in the formula (II), and the preferred range is also the same.

式(I)中,Y1表示氮原子或磷原子,與鄰接的碳原子一起構成4員環~7員環。尤佳為式(I)中的Y1表示氮原子,與鄰接的碳原子一起構成5員環或6員環。式(I)中,RX1表示取代基,與所述以非共價電子對進行配位的配位原子含有於環中的情形可具有的取代基為相同含意,較佳範圍亦相同。 In the formula (I), Y 1 represents a nitrogen atom or a phosphorus atom, and together with adjacent carbon atoms constitutes a 4-membered ring to a 7-membered ring. More preferably, Y 1 in the formula (I) represents a nitrogen atom and constitutes a 5-membered ring or a 6-membered ring together with an adjacent carbon atom. In the formula (I), R X1 represents a substituent, and the substituent which may be contained in the ring in the case where the coordination atom coordinated by the non-covalent electron pair is contained in the ring has the same meaning, and the preferred range is also the same.

再者,為了提高可見光透射性,RX1較佳為並非π共軛系連續而多個鍵結的取代基。 Further, in order to improve the visible light transmittance, R X1 is preferably a substituent which is not continuous with a π-conjugated system but a plurality of bonds.

式(I)中,n1表示0~6的整數,較佳為0~2,更佳為0或1。 In the formula (I), n1 represents an integer of 0 to 6, preferably 0 to 2, more preferably 0 or 1.

另外,化合物(A)亦較佳為由式(1)所表示。 Further, the compound (A) is also preferably represented by the formula (1).

式(1)中,R1表示烴基。R2及R3分別獨立地表示氫原子、鹵素原子或一價有機基。R1與R2或R3亦可相互鍵結而形成環。 In the formula (1), R 1 represents a hydrocarbon group. R 2 and R 3 each independently represent a hydrogen atom, a halogen atom or a monovalent organic group. R 1 and R 2 or R 3 may also be bonded to each other to form a ring.

藉由使用本發明的組成物,可於製成硬化膜時降低可見光範圍內的透射性,另外,亦可提高近紅外線遮蔽性。 By using the composition of the present invention, the transmittance in the visible light range can be reduced when the cured film is formed, and the near-infrared shielding property can be improved.

式(1)中,R1表示烴基,較佳為表示烷基或芳基。 In the formula (1), R 1 represents a hydrocarbon group, preferably an alkyl group or an aryl group.

於式(1)中的R1表示烷基的情形時,烷基可為直鏈狀、分支狀或環狀的任一種。烷基的碳數較佳為1~12,更佳為1~10,進而佳為1~5。具體而言,烷基較佳為甲基、乙基或丙基。於式(1)中的R1表示烷基的情形時,亦可更具有取代基。烷基可具有的取代基可列舉:烷氧基、烷基羰基、醯基、烷氧基羰基、鹵素原子(例如氟原子)、雜環基(例如氧雜環戊烷(oxolane)環、噁烷環、二氧雜環戊烷環、呋喃環、二噁烷環、吡喃環)、聚合性基(例如乙烯基、(甲基)丙烯醯基)等。具有取代基的烷基亦可更具有取代基。 In the case where R 1 in the formula (1) represents an alkyl group, the alkyl group may be any of a linear chain, a branched chain or a cyclic chain. The carbon number of the alkyl group is preferably from 1 to 12, more preferably from 1 to 10, and still more preferably from 1 to 5. Specifically, the alkyl group is preferably a methyl group, an ethyl group or a propyl group. When R 1 in the formula (1) represents an alkyl group, it may have a more substituent. The substituent which the alkyl group may have is exemplified by an alkoxy group, an alkylcarbonyl group, a fluorenyl group, an alkoxycarbonyl group, a halogen atom (for example, a fluorine atom), a heterocyclic group (for example, an oxolane ring, an evil). An alkane ring, a dioxolane ring, a furan ring, a dioxane ring, a pyran ring), a polymerizable group (for example, a vinyl group, a (meth)acryl fluorenyl group), or the like. The alkyl group having a substituent may also have a substituent.

於式(1)中的R1表示芳基的情形時,芳基的碳數較佳為6~18,更佳為6~12。芳基較佳為苯基。於式(1)中的R1表示芳基的情形時,亦可更具有取代基。烷基可具有的取代基與式(1)中的R1表示烷基的情形為相同含意。 In the case where R 1 in the formula (1) represents an aryl group, the carbon number of the aryl group is preferably from 6 to 18, more preferably from 6 to 12. The aryl group is preferably a phenyl group. In the case where R 1 in the formula (1) represents an aryl group, it may have a more substituent. The substituent which the alkyl group may have has the same meaning as the case where R 1 in the formula (1) represents an alkyl group.

式(1)中,R2及R3分別獨立地表示氫原子、鹵素原子或一價有機基。 In the formula (1), R 2 and R 3 each independently represent a hydrogen atom, a halogen atom or a monovalent organic group.

本發明的實施形態的第一態樣為式(1)中R2及R3兩者為氫原子的態樣,本發明的實施形態的第二態樣為式(1)中R2及R3的至少一個表示鹵素原子或一價有機基的態樣,均較佳。 A first aspect of the embodiment of the present invention is a mode in which both R 2 and R 3 in the formula (1) are hydrogen atoms, and the second aspect of the embodiment of the present invention is R 2 and R in the formula (1). At least one of 3 represents a halogen atom or a monovalent organic group, and is preferred.

於式(1)中的R2及R3表示鹵素原子的情形時,較佳為氟原子。 When R 2 and R 3 in the formula (1) represent a halogen atom, a fluorine atom is preferred.

於式(1)中的R2及R3表示一價有機基的情形時,較佳為烷基或芳基,更佳為烷基。烷基可為直鏈狀、分支狀或環狀的任一種,較佳為直鏈狀或分支狀。烷基的碳數較佳為1~8,更佳為1~5。尤其烷基較佳為甲基、乙基或丙基。芳基的碳數較佳為6~18,更佳為6~12。芳基較佳為苯基。 In the case where R 2 and R 3 in the formula (1) represent a monovalent organic group, an alkyl group or an aryl group is preferred, and an alkyl group is more preferred. The alkyl group may be linear, branched or cyclic, and is preferably linear or branched. The carbon number of the alkyl group is preferably from 1 to 8, more preferably from 1 to 5. Particularly, the alkyl group is preferably a methyl group, an ethyl group or a propyl group. The carbon number of the aryl group is preferably from 6 to 18, more preferably from 6 to 12. The aryl group is preferably a phenyl group.

式(1)中,亦較佳為R1與R2相互鍵結而形成含有氧原子的5員環或6員環,且R3為氫原子。 In the formula (1), it is also preferred that R 1 and R 2 are bonded to each other to form a 5-membered or 6-membered ring containing an oxygen atom, and R 3 is a hydrogen atom.

含有氧原子的5員環或6員環可為芳香環亦可為非芳香環,較佳為非芳香環。構成含有氧原子的5員環或6員環的原子較佳為氧原子及碳原子。含有氧原子的5員環或6員環中的氧原子的個數較佳為1~3,更佳為1或2,進而佳為1。含有氧原子的5員環或6員環中的碳原子的個數較佳為1~5,更佳為4或5。含有氧原子的5員環或6員環具體可列舉:氧雜環戊烷環、噁烷環、二氧雜環戊烷環、呋喃環、二噁烷環、吡喃環等。 The 5-membered or 6-membered ring containing an oxygen atom may be an aromatic ring or a non-aromatic ring, preferably a non-aromatic ring. The atom constituting the 5-membered ring or the 6-membered ring containing an oxygen atom is preferably an oxygen atom and a carbon atom. The number of oxygen atoms in the 5-membered ring or the 6-membered ring containing an oxygen atom is preferably from 1 to 3, more preferably 1 or 2, and still more preferably 1. The number of carbon atoms in the 5-membered or 6-membered ring containing an oxygen atom is preferably from 1 to 5, more preferably 4 or 5. Specific examples of the 5-membered or 6-membered ring containing an oxygen atom include an oxolane ring, an oxane ring, a dioxolane ring, a furan ring, a dioxane ring, and a pyran ring.

式(1)所表示的化合物亦較佳為由式(2)所表示。 The compound represented by the formula (1) is also preferably represented by the formula (2).

式(2) Formula (2)

式(2)中,R12及R13分別獨立地表示氫原子、鹵素原子或一價有機基。L表示n價烴基、或包含烴基與-O-的組合的n價基團。n表示2~6的整數。 In the formula (2), R 12 and R 13 each independently represent a hydrogen atom, a halogen atom or a monovalent organic group. L represents an n-valent hydrocarbon group or an n-valent group containing a combination of a hydrocarbon group and -O-. n represents an integer from 2 to 6.

式(2)中,R12及R13與式(1)中的R2及R3為相同含意,較佳為均表示氫原子。 In the formula (2), R 12 and R 13 have the same meanings as R 2 and R 3 in the formula (1), and preferably all represent a hydrogen atom.

式(2)中,L表示n價烴基、或包含烴基與-O-的組合的n價基團。烴基可為直鏈狀、分支狀或環狀的任一種。烴基為直鏈狀的情形的碳數較佳為2~12,更佳為2~5。烴基為分支狀的情形的碳數較佳為3~12,更佳為6~10。烴基為環狀的情形的碳數較佳為3~12,更佳為6~12,進而佳為6。於烴基為環狀的情形時,可為芳香環亦可為非芳香環,較佳為非芳香環。 In the formula (2), L represents an n-valent hydrocarbon group or an n-valent group containing a combination of a hydrocarbon group and -O-. The hydrocarbon group may be any of a linear chain, a branched chain or a cyclic chain. When the hydrocarbon group is linear, the carbon number is preferably from 2 to 12, more preferably from 2 to 5. The carbon number in the case where the hydrocarbon group is branched is preferably from 3 to 12, more preferably from 6 to 10. The carbon number in the case where the hydrocarbon group is cyclic is preferably from 3 to 12, more preferably from 6 to 12, and still more preferably 6. When the hydrocarbon group is cyclic, it may be an aromatic ring or a non-aromatic ring, preferably a non-aromatic ring.

式(2)中,n表示2~6的整數,較佳為2~4的整數,更佳為2或3,進而佳為2。 In the formula (2), n represents an integer of 2 to 6, preferably an integer of 2 to 4, more preferably 2 or 3, and still more preferably 2.

式(1)所表示的化合物的羧基當量較佳為1~3,更佳為1~2。 The compound represented by the formula (1) preferably has a carboxyl group equivalent of from 1 to 3, more preferably from 1 to 2.

化合物(A)的具體例可列舉以下化合物及以下化合物的鹽(例如鈉等金屬鹽(鹼金屬鹽)),但不限定於該些化合物。 Specific examples of the compound (A) include the following compounds and salts of the following compounds (for example, metal salts (alkali metal salts) such as sodium), but are not limited thereto.

<<單牙配位體>> <<Single tooth ligand>>

本發明中所用的銅錯合物亦可具有以陰離子或非共價 電子對進行配位的單牙配位體。以陰離子進行配位的配位體可列舉:鹵化物陰離子、氫氧化物陰離子、烷氧化物陰離子、苯氧化物陰離子、醯胺陰離子(包含經醯基或磺醯基取代的醯胺)、醯亞胺陰離子(包含經醯基或磺醯基取代的醯亞胺)、苯胺化物陰離子(包含經醯基或磺醯基取代的苯胺化物)、硫醇鹽陰離子、碳酸氫根陰離子、羧酸根陰離子、硫代羧酸根陰離子、二硫代羧酸根陰離子、硫酸氫根陰離子、磺酸根陰離子、磷酸二氫根陰離子、磷酸二酯陰離子、膦酸單酯陰離子、膦酸氫根陰離子、次膦酸根陰離子、含氮雜環陰離子、硝酸根陰離子、次氯酸根陰離子、氰化 物陰離子、氰酸鹽陰離子、異氰酸鹽陰離子、硫氰酸鹽陰離子、異硫氰酸鹽陰離子、叠氮化物陰離子等。以非共價電子對進行配位的單牙配位體可列舉:水、醇、酚、醚、胺、苯胺、醯胺、醯亞胺、亞胺、腈、異腈、硫醇、硫醚、羰基化合物、硫代羰基化合物、亞碸、雜環或碳酸、羧酸、硫酸、磺酸、磷酸、膦酸、次膦酸、硝酸、或其酯。單牙配位體的種類及個數可根據配位於銅錯合物的化合物(A)而適當選擇。作為單牙配位體的具體例可列舉如下,但不限定於該些具體例。 The copper complex used in the present invention may also have an anionic or non-covalent A single tooth ligand that coordinates the electron pair. Examples of the ligand coordinated by an anion include a halide anion, a hydroxide anion, an alkoxide anion, a phenoxide anion, a guanamine anion (a guanamine substituted with a mercapto group or a sulfonyl group), and an anthracene. Imine anion (containing fluorenyl or sulfonyl substituted quinone), aniline anion (containing sulfhydryl or sulfonyl substituted anilide), thiolate anion, bicarbonate anion, carboxylate anion , thiocarboxylate anion, dithiocarboxylate anion, hydrogen sulfate anion, sulfonate anion, dihydrogen phosphate anion, phosphodiester anion, phosphonate monoester anion, phosphonate anion, phosphinate anion , nitrogen-containing heterocyclic anion, nitrate anion, hypochlorite anion, cyanidation Anion, cyanate anion, isocyanate anion, thiocyanate anion, isothiocyanate anion, azide anion, and the like. The monodentate ligands coordinated by non-covalent electron pairs include water, alcohol, phenol, ether, amine, aniline, decylamine, quinone imine, imine, nitrile, isonitrile, thiol, thioether. A carbonyl compound, a thiocarbonyl compound, an anthracene, a heterocyclic ring or a carbonic acid, a carboxylic acid, a sulfuric acid, a sulfonic acid, a phosphoric acid, a phosphonic acid, a phosphinic acid, nitric acid, or an ester thereof. The type and the number of the monodentate ligands can be appropriately selected depending on the compound (A) to be placed in the copper complex. Specific examples of the single-dental ligand include the following, but are not limited to these specific examples.

本發明中所用的銅錯合物對應於以陰離子進行配位的配位部位的個數,除了不帶電荷的中性錯合物以外,有時亦成為陽離子錯合物、陰離子錯合物。於該情形時,視需要存在有抗衡離子以中和銅錯合物的電荷。 The copper complex used in the present invention corresponds to the number of coordination sites coordinated by an anion, and may be a cation complex or an anion complex in addition to a neutral complex which is not charged. In this case, a counter ion is present as needed to neutralize the charge of the copper complex.

於抗衡離子為負的抗衡離子的情形時,例如可為無機陰離 子,亦可為有機陰離子。作為具體例,可列舉:氫氧化物離子、鹵素陰離子(例如氟化物離子、氯化物離子、溴化物離子、碘化物離子等)、經取代或未經取代的烷基羧酸根離子(乙酸根離子、三氟乙酸等)、經取代或未經取代的芳基羧酸根離子(苯甲酸根離子等)、經取代或未經取代的烷基磺酸根離子(甲磺酸、三氟甲磺酸根離子等)、經取代或未經取代的芳基磺酸根離子(例如對甲苯磺酸根離子、對氯苯磺酸根離子等)、芳基二磺酸根離子(例如1,3-苯二磺酸根離子、1,5-萘二磺酸根離子、2,6-萘二磺酸根離子等)、烷基硫酸根離子(例如甲基硫酸根離子等)、硫酸根離子、硫氰酸根離子、硝酸根離子、過氯酸根離子、四氟硼酸根離子、四芳基硼酸根離子、六氟磷酸鹽離子、苦味酸根離子、醯胺離子(包含經醯基或磺醯基取代的醯胺)、甲基化物離子(包含經醯基或磺醯基取代的甲基化物),較佳為鹵素陰離子、經取代或未經取代的烷基羧酸根離子、硫酸根離子、硝酸根離子、四氟硼酸根離子、四芳基硼酸根離子、六氟磷酸鹽離子、醯胺離子(包含經醯基或磺醯基取代的醯胺)、甲基化物離子(包含經醯基或磺醯基取代的甲基化物)。 In the case where the counter ion is a negative counter ion, for example, it may be inorganic anion It can also be an organic anion. Specific examples thereof include hydroxide ions, halogen anions (for example, fluoride ions, chloride ions, bromide ions, iodide ions, etc.), substituted or unsubstituted alkyl carboxylate ions (acetate ions). , trifluoroacetic acid, etc.), substituted or unsubstituted aryl carboxylate ion (benzoate ion, etc.), substituted or unsubstituted alkylsulfonate ion (methanesulfonic acid, trifluoromethanesulfonate ion Etc., substituted or unsubstituted aryl sulfonate ion (eg p-toluenesulfonate ion, p-chlorobenzenesulfonate ion, etc.), aryl disulfonate ion (eg 1,3-benzenedisulfonate ion, 1,5-naphthalene disulfonate ion, 2,6-naphthalene disulfonate ion, etc.), alkylsulfate ion (for example, methylsulfate ion, etc.), sulfate ion, thiocyanate ion, nitrate ion, Perchlorate ion, tetrafluoroborate ion, tetraarylborate ion, hexafluorophosphate ion, picrate ion, guanamine ion (containing decyl or sulfonyl substituted guanamine), methylate ion (comprising a methyl group substituted with a mercapto or sulfonyl group), preferably Halogen anion, substituted or unsubstituted alkyl carboxylate ion, sulfate ion, nitrate ion, tetrafluoroborate ion, tetraarylborate ion, hexafluorophosphate ion, guanamine ion (including warp a sulfonyl-substituted indoleamine), a methide ion (containing a thiol- or sulfonyl-substituted methylate).

於抗衡離子為正的抗衡離子的情形時,例如可列舉:無機或有機的銨離子(例如四丁基銨離子等四烷基銨離子、三乙基苄基銨離子、吡啶鎓離子等)、鏻離子(例如四丁基鏻離子等四烷基鏻離子、烷基三苯基鏻離子、三乙基苯基鏻離子等)、鹼金屬離子或質子。 In the case where the counter ion is a positive counter ion, for example, an inorganic or organic ammonium ion (for example, a tetraalkylammonium ion such as a tetrabutylammonium ion, a triethylbenzylammonium ion, a pyridinium ion or the like), Helium ions (for example, tetraalkylphosphonium ions such as tetrabutylphosphonium ions, alkyltriphenylphosphonium ions, triethylphenylphosphonium ions, etc.), alkali metal ions or protons.

另外,抗衡離子亦可為金屬錯合物離子,尤其抗衡離子亦可為銅錯合物、即陽離子性銅錯合物與陰離子性銅錯合物的鹽。 Further, the counter ion may be a metal complex ion, and particularly the counter ion may be a copper complex, that is, a salt of a cationic copper complex and an anionic copper complex.

<<銅成分>> <<Bronze ingredients>>

本發明中所用的銅成分可使用銅或含有銅的化合物。含有銅的化合物例如可使用氧化銅或銅鹽。銅鹽較佳為一價銅或二價銅,更佳為二價銅。銅鹽更佳為乙酸銅、氯化銅、甲酸銅、氫氧化銅、硬脂酸銅、苯甲酸銅、乙基乙醯乙酸銅、焦磷酸銅、環烷酸銅、檸檬酸銅、硝酸銅、硫酸銅、碳酸銅、氯酸銅、(甲基)丙烯酸銅、過氯酸銅,進而佳為乙酸銅、氯化銅、硫酸銅、氫氧化銅、苯甲酸銅、(甲基)丙烯酸銅。 As the copper component used in the present invention, copper or a compound containing copper can be used. As the copper-containing compound, for example, copper oxide or a copper salt can be used. The copper salt is preferably monovalent copper or divalent copper, more preferably divalent copper. The copper salt is more preferably copper acetate, copper chloride, copper formate, copper hydroxide, copper stearate, copper benzoate, copper ethyl acetate, copper pyrophosphate, copper naphthenate, copper citrate, copper nitrate. , copper sulfate, copper carbonate, copper chlorate, copper (meth)acrylate, copper perchlorate, and thus preferably copper acetate, copper chloride, copper sulfate, copper hydroxide, copper benzoate, copper (meth)acrylate .

關於與化合物(A)反應的銅成分的量,以莫耳比率(化合物(A):銅成分)計較佳為設定為1:0.5~1:8,更佳為設定為1:0.5~1:4。 The amount of the copper component to be reacted with the compound (A) is preferably from 1:0.5 to 1:8, more preferably from 1:0.5 to 1: in terms of the molar ratio (compound (A): copper component). 4.

另外,使銅成分與化合物(A)反應時的反應條件例如較佳為設定為於20℃~50℃下反應0.5小時以上。 Further, for example, the reaction conditions when the copper component is reacted with the compound (A) are preferably set to be reacted at 20 ° C to 50 ° C for 0.5 hour or longer.

作為銅錯合物的具體例可列舉下述表所示的例子,但不限定於該些。另外,表中的化合物(A)表示所述及以下所示的化合物。再者,表中的單牙配位體表示所述者。 Specific examples of the copper complex compound include the examples shown in the following tables, but are not limited thereto. Further, the compound (A) in the table represents the compounds described above and below. Furthermore, the monodentate ligands in the table represent the above.

再者,關於本發明中所用的銅錯合物,本發明的組成物的銅錯合物以外的成分(溶劑、各種添加劑等)可進一步配位,且亦可以將銅錯合物的配位體的一部分替換為銅錯合物以外的成分而成的狀態存在。所述情況對於具有易變的d9電子配置的銅(II) 錯合物來說為一般性質。 Further, in the copper complex compound used in the present invention, components other than the copper complex of the composition of the present invention (solvent, various additives, etc.) may be further coordinated, and the coordination of the copper complex may also be used. A part of the body is replaced with a component other than the copper complex. For the case of d 9 having variable copper (II) complexes of the electronic configuration is general in nature.

[表2] [Table 2]

相對於本發明的組成物(亦包含溶劑),本發明的組成 物中的銅錯合物的含量(使化合物(A)與銅成分反應而成的銅錯合物亦同樣)較佳為1質量%以上,更佳為5質量%以上。另外,相對於本發明的組成物(亦包含溶劑),本發明的組成物中的銅錯合物的含量較佳為1質量%~60質量%,更佳為5質量%~40質量%,進而佳為5質量%~20質量%。 Composition of the present invention relative to the composition of the present invention (also including a solvent) The content of the copper complex (the same as the copper complex obtained by reacting the compound (A) with the copper component) is preferably 1% by mass or more, and more preferably 5% by mass or more. Further, the content of the copper complex in the composition of the present invention is preferably from 1% by mass to 60% by mass, more preferably from 5% by mass to 40% by mass, based on the composition of the present invention (including a solvent). Further preferably, it is 5 mass% to 20 mass%.

相對於本發明的組成物的總固體成分,本發明的組成物中的銅錯合物的含量較佳為15質量%以上,更佳為20質量%以上,進而佳為25質量%以上。另外,相對於本發明的組成物的總固體成分,本發明的組成物中的銅錯合物的含量較佳為15質量%~60質量%,更佳為20質量%~50質量%,進而佳為25質量%~45質量%。 The content of the copper complex in the composition of the present invention is preferably 15% by mass or more, more preferably 20% by mass or more, and still more preferably 25% by mass or more based on the total solid content of the composition of the present invention. Further, the content of the copper complex in the composition of the present invention is preferably 15% by mass to 60% by mass, more preferably 20% by mass to 50% by mass, based on the total solid content of the composition of the present invention, and further Good is 25% by mass to 45% by mass.

相對於本發明的組成物,本發明的組成物中的所述銅錯合物 以外的其他銅錯合物(近紅外線吸收性物質)的含量較佳為0質量%~20質量%,更佳為0質量%~10質量%,進而佳為0質量%~5質量%。 The copper complex in the composition of the present invention relative to the composition of the present invention The content of the other copper complex (near-infrared absorbing material) other than that is preferably from 0% by mass to 20% by mass, more preferably from 0% by mass to 10% by mass, even more preferably from 0% by mass to 5% by mass.

本發明的組成物中所含的近紅外線吸收性物質中,使化合物(A)與銅成分反應而成的化合物的比例較佳為80質量%以上,更佳為90質量%以上,進而佳為95質量%以上。 In the near-infrared absorbing material contained in the composition of the present invention, the ratio of the compound obtained by reacting the compound (A) with the copper component is preferably 80% by mass or more, more preferably 90% by mass or more, and further preferably 95% by mass or more.

相對於組成物的總固體成分,本發明的組成物中的銅的含量較佳為0.1質量%以上,更佳為1質量%以上,進而佳為5質量%以上。關於上限,較佳為30質量%以下,更佳為20質量%以下,進而佳為15質量%以下。 The content of copper in the composition of the present invention is preferably 0.1% by mass or more, more preferably 1% by mass or more, and still more preferably 5% by mass or more based on the total solid content of the composition. The upper limit is preferably 30% by mass or less, more preferably 20% by mass or less, and still more preferably 15% by mass or less.

相對於組成物,本發明的近紅外線吸收性組成物的總固體成分較佳為1質量%以上,更佳為10質量%以上。另外,相對於組成物,本發明的近紅外線吸收性組成物的總固體成分較佳為1質量%~50質量%,更佳為1質量%~40質量%,進而佳為10質量%~35質量%。 The total solid content of the near-infrared absorbing composition of the present invention is preferably 1% by mass or more, and more preferably 10% by mass or more based on the composition. Further, the total solid content of the near-infrared absorbing composition of the present invention is preferably from 1% by mass to 50% by mass, more preferably from 1% by mass to 40% by mass, even more preferably from 10% by mass to 35% by mass based on the composition. quality%.

本發明的組成物可單獨使用一種所述本發明中所用的銅錯合物,亦可併用兩種以上。於使用兩種以上的所述本發明中所用的銅錯合物的情形時,其合計量較佳為在所述範圍內。 The composition of the present invention may be used alone or in combination of two or more kinds of the copper complexes used in the present invention. In the case where two or more of the copper complexes used in the present invention are used, the total amount thereof is preferably within the above range.

本發明的近紅外線吸收性組成物只要含有所述銅錯合物即可,視需要亦可調配其他近紅外線吸收性化合物、溶劑、硬化性化合物、黏合聚合物、界面活性劑、聚合起始劑、其他成分。 The near-infrared absorbing composition of the present invention may contain any of the copper complex compounds, and may further blend other near-infrared absorbing compounds, solvents, curable compounds, binder polymers, surfactants, and polymerization initiators as needed. And other ingredients.

<<其他近紅外線吸收性化合物>> <<Other near infrared absorption compounds>>

本發明中可使用的其他近紅外線吸收性化合物可使用:由低分子(例如分子量為1000以下)的含有配位部位的化合物與銅成分的反應所得的銅化合物、或由含有配位部位的聚合體與銅成分的反應所得的銅化合物。作為配位部位,可列舉:以酸基或酸基的鹽等的陰離子進行配位的配位部位、或以非共價電子對進行配位的配位原子。 As the other near-infrared absorbing compound which can be used in the present invention, a copper compound obtained by reacting a compound having a coordination site with a copper component having a low molecular weight (for example, a molecular weight of 1,000 or less) or a polymerization containing a coordination site can be used. A copper compound obtained by the reaction of a body with a copper component. Examples of the coordination site include a coordination site coordinated by an anion such as an acid group or an acid group salt, or a coordination atom coordinated by a non-covalent electron pair.

於本發明的組成物含有其他近紅外線吸收性化合物的情形時,相對於本發明的組成物的總固體成分,其他近紅外線吸收性化合物的含量較佳為0.01質量%以上,更佳為1質量%以上,進而佳為5質量%以上。關於上限值,較佳為60質量%以下,更佳為40質量%以下,進而佳為20質量%以下。再者,本發明亦可設為不含有其他近紅外線吸收性化合物的組成。 When the composition of the present invention contains another near-infrared absorbing compound, the content of the other near-infrared absorbing compound is preferably 0.01% by mass or more, more preferably 1%, based on the total solid content of the composition of the present invention. % or more, and further preferably 5% by mass or more. The upper limit is preferably 60% by mass or less, more preferably 40% by mass or less, and still more preferably 20% by mass or less. Furthermore, the present invention may also be a composition which does not contain other near-infrared absorbing compounds.

(低分子型) (low molecular type)

作為本發明中可使用的且藉由含有配位部位的化合物與銅成分的反應所得的化合物,可使用下式(i)所表示的銅錯合物。 As the compound which can be used in the present invention and which is obtained by reacting a compound containing a coordination site with a copper component, a copper complex represented by the following formula (i) can be used.

Cu(L)n1.(X)n2 式(i) Cu(L) n1 . (X) n2 (i)

所述式(i)中,L表示配位於銅上的配位體,X不存在或表示鹵素原子、H2O、NO3、ClO4、SO4、CN、SCN、BF4、PF6、BPh4(Ph表示苯基)或醇。n1、n2分別獨立地表示1~4的整數。 In the formula (i), L represents a ligand coordinated to copper, and X does not exist or represents a halogen atom, H 2 O, NO 3 , ClO 4 , SO 4 , CN, SCN, BF 4 , PF 6 , BPh 4 (Ph represents phenyl) or alcohol. N1 and n2 each independently represent an integer of 1 to 4.

配位體L具有含有C、N、O、S作為可配位於銅上的原子的 取代基,更佳為具有具備N或O、S等的孤立電子對的基團。可配位的基團於分子內不限定於一種,亦可含有兩種以上,可解離亦可非解離。於非解離的情形時,X不存在。 Ligand L has C, N, O, S as atoms that can be coordinated to copper. The substituent is more preferably a group having an isolated electron pair having N or O, S or the like. The group which can be coordinated is not limited to one type in the molecule, and may contain two or more types, and may be dissociated or non-dissociated. In the case of non-dissociation, X does not exist.

所述銅錯合物為配位體配位於中心金屬的銅上的銅化合物,銅通常為二價銅。例如可使成為配位體的化合物或其鹽與銅成分混合並進行反應等而獲得所述銅錯合物。 The copper complex is a copper compound in which the ligand is coordinated to the copper of the central metal, and the copper is usually divalent copper. For example, the copper complex can be obtained by mixing a compound which is a ligand or a salt thereof with a copper component, and performing a reaction or the like.

所述成為配位體的化合物或其鹽並無特別限定,例如可列舉含有選自所述組群(AN)中的至少一種的化合物,且可較佳地列舉有機酸化合物(例如磺酸化合物、羧酸化合物、磷酸化合物)或其鹽等。 The compound to be a ligand or a salt thereof is not particularly limited, and examples thereof include a compound containing at least one selected from the group (AN), and preferably an organic acid compound (for example, a sulfonic acid compound) A carboxylic acid compound, a phosphoric acid compound) or a salt thereof.

所述成為配位體的化合物或其鹽可列舉下述通式(ii)所表示者。 The compound to be a ligand or a salt thereof can be represented by the following formula (ii).

(通式(ii)中,R1表示n價有機基,X1表示酸基,n3表示1~6的整數) (In the formula (ii), R 1 represents an n-valent organic group, X 1 represents an acid group, and n3 represents an integer of 1 to 6)

通式(ii)中,n價有機基較佳為烴基或氧伸烷基,更佳為脂肪族烴基或芳香族烴基。烴基亦可具有取代基,取代基可列舉鹵素原子(較佳為氟原子)、(甲基)丙烯醯基、具有不飽和雙鍵的基 團。另外,取代基亦可列舉:烷基、聚合性基(例如乙烯基、環氧基、氧雜環丁烷基等)、磺酸基、羧酸基、含磷原子的酸基、羧酸酯基(例如-CO2CH3)、羥基、烷氧基(例如甲氧基)、胺基、胺甲醯基、胺甲醯氧基、鹵化烷基(例如氟烷基、氯烷基)等。於烴基具有取代基的情形時,亦可更具有取代基,取代基可列舉烷基、所述聚合性基、鹵素原子等。 In the formula (ii), the n-valent organic group is preferably a hydrocarbon group or an oxygen alkyl group, more preferably an aliphatic hydrocarbon group or an aromatic hydrocarbon group. The hydrocarbon group may have a substituent, and examples of the substituent include a halogen atom (preferably a fluorine atom), a (meth) acrylonitrile group, and a group having an unsaturated double bond. Further, examples of the substituent include an alkyl group, a polymerizable group (e.g., a vinyl group, an epoxy group, an oxetanyl group, etc.), a sulfonic acid group, a carboxylic acid group, an acid group containing a phosphorus atom, and a carboxylate. a group (e.g., -CO 2 CH 3 ), a hydroxyl group, an alkoxy group (e.g., a methoxy group), an amine group, an amine carbaryl group, an amine methyl methoxy group, a halogenated alkyl group (e.g., a fluoroalkyl group, a chloroalkyl group), etc. . When the hydrocarbon group has a substituent, the substituent may be further substituted, and examples of the substituent include an alkyl group, the polymerizable group, and a halogen atom.

於所述烴基為一價的情形時,較佳為烷基或芳基,更佳為芳基。另外,於所述烴基為一價的情形時,亦可為烯基。於烴基為二價的情形時,較佳為伸烷基、伸芳基、氧伸烷基,更佳為伸芳基。另外,於烴基為三價以上的情形時,較佳為與所述一價烴基或二價烴基相對應的基團。 In the case where the hydrocarbon group is monovalent, it is preferably an alkyl group or an aryl group, more preferably an aryl group. Further, when the hydrocarbon group is monovalent, it may be an alkenyl group. In the case where the hydrocarbon group is divalent, it is preferably an alkyl group, an aryl group, an alkyl group, and more preferably an aryl group. Further, when the hydrocarbon group is trivalent or higher, a group corresponding to the monovalent hydrocarbon group or the divalent hydrocarbon group is preferred.

所述烷基及伸烷基的碳數較佳為1~20,更佳為1~10。烷基及伸烷基可為直鏈狀、分支狀或環狀的任一種。直鏈狀的烷基及伸烷基的碳數較佳為1~20,更佳為1~12,進而佳為1~8。分支狀的烷基及伸烷基的碳數較佳為3~20,更佳為3~12,進而佳為3~8。環狀的烷基及伸烷基可為單環、多環的任一種。環狀的烷基及伸烷基的碳數較佳為3~20,更佳為4~10,進而佳為6~10。 The carbon number of the alkyl group and the alkylene group is preferably from 1 to 20, more preferably from 1 to 10. The alkyl group and the alkylene group may be any of a linear chain, a branched chain or a cyclic chain. The carbon number of the linear alkyl group and the alkyl group is preferably from 1 to 20, more preferably from 1 to 12, and still more preferably from 1 to 8. The carbon number of the branched alkyl group and the alkylene group is preferably from 3 to 20, more preferably from 3 to 12, and still more preferably from 3 to 8. The cyclic alkyl group and the alkylene group may be either a single ring or a polycyclic ring. The carbon number of the cyclic alkyl group and the alkylene group is preferably from 3 to 20, more preferably from 4 to 10, and still more preferably from 6 to 10.

烯基的碳數較佳為2~10,更佳為2~8,進而佳為2~4。 The number of carbon atoms of the alkenyl group is preferably from 2 to 10, more preferably from 2 to 8, more preferably from 2 to 4.

所述芳基及伸芳基的碳數較佳為6~18,更佳為6~14,進而佳為6~12,尤佳為6~10。 The carbon number of the aryl group and the aryl group is preferably from 6 to 18, more preferably from 6 to 14, more preferably from 6 to 12, and particularly preferably from 6 to 10.

通式(ii)中,X1例如可列舉:含磷原子的酸基(磷酸二酯基、膦酸單酯基、次膦酸基等)、磺基、羧基、羥基等。X1可為單獨一 種亦可為兩種以上,較佳為兩種以上,且較佳為具有磺基及羧基。 In the general formula (ii), X 1 may, for example, be an acid group (phosphoric acid diester group, phosphonic acid monoester group or phosphinic acid group) containing a phosphorus atom, a sulfo group, a carboxyl group or a hydroxyl group. X 1 may be used alone or in combination of two or more, preferably two or more, and preferably has a sulfo group and a carboxyl group.

通式(ii)中,n3較佳為1~3,更佳為2或3,進而佳為3。 In the formula (ii), n3 is preferably from 1 to 3, more preferably 2 or 3, and still more preferably 3.

所述成為配位體的化合物或其鹽(含有酸基或其鹽的化合物)的分子量較佳為1000以下,較佳為80~750,更佳為80~600。 The molecular weight of the compound to be ligand or a salt thereof (compound containing an acid group or a salt thereof) is preferably 1,000 or less, preferably 80 to 750, more preferably 80 to 600.

作為由低分子的含有酸基或其鹽的化合物與銅成分的反應所得的銅化合物的一例,亦可使用具有2處單陰離子性配位部位的化合物或具有其鹽的化合物與銅成分反應而成者。此處,所謂單陰離子性配位部位,表示於與銅原子的配位時,經由一個具有負電荷的官能基而與銅原子配位的部位。具有此種單陰離子性配位部位的結構例如可列舉所述通式(i)中的X1所說明的結構。 As an example of a copper compound obtained by a reaction of a low molecular weight compound containing a acid group or a salt thereof with a copper component, a compound having two monoanionic coordination sites or a compound having a salt thereof may be reacted with a copper component. Adult. Here, the monoanionic coordination site is a site that is coordinated to a copper atom via a functional group having a negative charge when coordinated to a copper atom. The structure having such a monoanionic coordination site may, for example, be a structure described by X 1 in the above formula (i).

具有單陰離子性配位部位的結構例如可列舉包含選自所述組群(AN)中的至少一種的結構。例如具有單陰離子性配位部位的結構如以下所示般與銅原子配位,藉此形成銅錯合物。例如形成羧基-銅錯合物、磷酸二酯基-銅錯合物、膦酸單酯基-銅錯合物、次膦酸基-銅錯合物、磺基-銅錯合物、羥基-銅錯合物。 The structure having a monoanionic coordination site may, for example, be a structure containing at least one selected from the group (AN). For example, a structure having a monoanionic coordination site is coordinated to a copper atom as shown below, thereby forming a copper complex. For example, a carboxyl-copper complex, a phosphodiester-copper complex, a phosphonate mono-copper complex, a phosphinic acid-copper complex, a sulfo-copper complex, a hydroxyl group are formed. Copper complex.

具有2處單陰離子性配位部位的化合物可列舉由下述通式(10)所表示的化合物。 The compound having two monoanionic coordination sites is exemplified by the compound represented by the following formula (10).

X1-L1-X2 通式(10) X 1 -L 1 -X 2 Formula (10)

(通式(10)中,X1及X2分別獨立地表示所述單陰離子性配位部位,L1表示伸烷基、伸烯基、伸芳基、雜環基、-O-、-S-、-NRN1-、-CO-、-CS-、-SO2-或包含該等的組合的二價連結基。此處,RN1表示氫原子、烷基、芳基或芳烷基) (In the formula (10), X 1 and X 2 each independently represent the monoanionic coordination site, and L 1 represents an alkylene group, an alkenyl group, an extended aryl group, a heterocyclic group, -O-, - S-, -NR N1 -, -CO-, -CS-, -SO 2 - or a divalent linking group comprising the combination of the above. Here, R N1 represents a hydrogen atom, an alkyl group, an aryl group or an aralkyl group. )

所述通式(10)中,L1表示伸烷基、伸烯基、伸芳基、雜環基、-O-、-S-、-NRN1-、-CO-、-CS-、-SO2-或包含該等的組合的二價連結基。此處,NRN1表示氫原子、烷基、芳基或芳烷基。 In the above formula (10), L 1 represents an alkylene group, an alkenyl group, an extended aryl group, a heterocyclic group, -O-, -S-, -NR N1 -, -CO-, -CS-, - SO 2 - or a divalent linking group comprising the combination. Here, NR N1 represents a hydrogen atom, an alkyl group, an aryl group or an aralkyl group.

伸烷基可列舉:經取代或未經取代的碳數1~20的直鏈狀或分支狀的伸烷基、經取代或未經取代的碳數3~20的環狀的伸烷基等。 The alkylene group may, for example, be a substituted or unsubstituted linear or branched alkyl group having 1 to 20 carbon atoms, a substituted or unsubstituted carbon alkyl group having 3 to 20 carbon atoms, and the like. .

伸烯基較佳為經取代或未經取代的碳數2~10的伸烯基,更佳為經取代或未經取代的碳數2~8的伸烯基。 The alkenyl group is preferably a substituted or unsubstituted alkenyl group having 2 to 10 carbon atoms, more preferably a substituted or unsubstituted alkenyl group having 2 to 8 carbon atoms.

伸芳基較佳為經取代或未經取代的碳數6~18的伸芳基,更佳為經取代或未經取代的碳數6~14的伸芳基。另外,伸芳基為單環或縮合環,較佳為單環或縮合數為2~8的縮合環,更佳為單環或縮合數為2~4的縮合環。具體可例示伸苯基、伸萘基等。 The aryl group is preferably a substituted or unsubstituted aryl group having 6 to 18 carbon atoms, more preferably a substituted or unsubstituted aryl group having 6 to 14 carbon atoms. Further, the aryl group is a monocyclic ring or a condensed ring, preferably a monocyclic ring or a condensed ring having a condensation number of 2 to 8, more preferably a single ring or a condensed ring having a condensation number of 2 to 4. Specific examples thereof include a phenylene group, a naphthyl group, and the like.

雜環基可列舉於脂環基中具有雜原子的基團或芳香族雜環基。雜環基較佳為5員環或6員環。另外,雜環基為單環或縮合環,較佳為單環或縮合數為2~8的縮合環,更佳為單環或縮合數為2~4的縮合環。具體可列舉:由含有氮、氧、硫原子的至少一 個的單環或多環芳香族環所衍生的伸雜芳基等。雜環的例子例如可列舉:氧雜環戊烷(oxolane)環、噁烷環、硫雜環戊烷(thiolane)環、噁唑環、噻吩環、噻蒽(thianthrene)環、呋喃環、吡喃環、異苯并呋喃環、苯并哌喃(chromene)環、呫噸(xanthene)環、啡噁嗪(phenoxazine)環、吡咯環、吡唑環、異噻唑環、異噁唑環、吡嗪環、嘧啶環、噠嗪環、吲哚嗪環、異吲哚嗪環、吲哚環、吲唑環、嘌呤環、喹嗪環、異喹啉環、酞嗪(phthalazine)環、萘啶(naphthyridine)環、喹唑啉環、噌啉(cinnoline)環、喋啶(pteridine)環、咔唑環、咔啉(carboline)環、菲(phenanthrene)環、吖啶環、呸啶(perimidine)環、啡啉(phenanthroline)環、酞嗪環、吩吡嗪(phenarsazine)環、啡噁嗪環、呋呫(furazan)環等。 The heterocyclic group may be a group having a hetero atom or an aromatic heterocyclic group in the alicyclic group. The heterocyclic group is preferably a 5-membered ring or a 6-membered ring. Further, the heterocyclic group is a monocyclic ring or a condensed ring, preferably a monocyclic ring or a condensed ring having a condensation number of 2 to 8, more preferably a monocyclic ring or a condensed ring having a condensation number of 2 to 4. Specifically, it can be exemplified by at least one containing nitrogen, oxygen and sulfur atoms. a heterocyclic aryl group derived from a monocyclic or polycyclic aromatic ring. Examples of the heterocyclic ring include an oxolane ring, an oxane ring, a thiolane ring, an oxazole ring, a thiophene ring, a thianthrene ring, a furan ring, and a pyridyl group. Anthracene, isobenzofuran ring, chromene ring, xanthene ring, phenoxazine ring, pyrrole ring, pyrazole ring, isothiazole ring, isoxazole ring, pyridyl Azine ring, pyrimidine ring, pyridazine ring, pyridazine ring, isooxazine ring, anthracene ring, indazole ring, anthracene ring, quinazoline ring, isoquinoline ring, phthalazine ring, naphthyridine (naphthyridine) ring, quinazoline ring, cinnoline ring, pteridine ring, indazole ring, carboline ring, phenanthrene ring, acridine ring, perimidine Ring, phenanthroline ring, pyridazine ring, phenarsazine ring, phenoxazine ring, furazan ring, and the like.

於-NRN1-中,RN1表示氫原子、烷基、芳基或芳烷基。 In -NR N1 -, R N1 represents a hydrogen atom, an alkyl group, an aryl group or an aralkyl group.

RN1的烷基可為鏈狀、分支狀、環狀的任一種。直鏈狀或分支狀的烷基較佳為經取代或未經取代的碳數1~20的烷基,更佳為經取代或未經取代的碳數1~12的烷基。環狀的烷基可為單環、多環的任一種。環狀的烷基較佳為經取代或未經取代的碳數3~20的環烷基,更佳為經取代或未經取代的碳數4~14的環烷基。 The alkyl group of R N1 may be in the form of a chain, a branch or a ring. The linear or branched alkyl group is preferably a substituted or unsubstituted alkyl group having 1 to 20 carbon atoms, more preferably a substituted or unsubstituted alkyl group having 1 to 12 carbon atoms. The cyclic alkyl group may be either a single ring or a polycyclic ring. The cyclic alkyl group is preferably a substituted or unsubstituted cycloalkyl group having 3 to 20 carbon atoms, more preferably a substituted or unsubstituted cycloalkyl group having 4 to 14 carbon atoms.

RN1的芳基較佳為經取代或未經取代的碳數6~18的芳基,更佳為經取代或未經取代的碳數6~14的芳基,進而佳為未經取代的碳數6~14的芳基。具體可例示苯基、萘基等。 The aryl group of R N1 is preferably a substituted or unsubstituted aryl group having 6 to 18 carbon atoms, more preferably a substituted or unsubstituted aryl group having 6 to 14 carbon atoms, and thus preferably unsubstituted. An aryl group having 6 to 14 carbon atoms. Specifically, a phenyl group, a naphthyl group, etc. are illustrated.

RN1的芳烷基較佳為經取代或未經取代的碳數7~20的芳烷 基,更佳為未經取代的碳數7~15的芳烷基。 The aralkyl group of R N1 is preferably a substituted or unsubstituted aralkyl group having 7 to 20 carbon atoms, more preferably an unsubstituted aralkyl group having 7 to 15 carbon atoms.

所述基團可具有的取代基可例示:聚合性基(較佳為含 有碳-碳雙鍵的聚合性基)、鹵素原子(氟原子、氯原子、溴原子、碘原子)、烷基、羧酸酯基、鹵化烷基、烷氧基、甲基丙烯醯氧基、丙烯醯氧基、醚基、磺醯基、硫醚基、醯胺基、醯基、羥基、羧基、芳烷基、-Si-(ORN22)3等。 The substituent which the group may have is exemplified by a polymerizable group (preferably a polymerizable group containing a carbon-carbon double bond), a halogen atom (a fluorine atom, a chlorine atom, a bromine atom, an iodine atom), an alkyl group, Carboxylic acid ester group, halogenated alkyl group, alkoxy group, methacryloxy group, acryloxy group, ether group, sulfonyl group, thioether group, decylamino group, fluorenyl group, hydroxyl group, carboxyl group, aralkyl group , -Si-(OR N22 ) 3 and the like.

另外,所述基團可具有的取代基亦可為包含所述取代基的至少任一種與-O-、-CO-、-COO-及-COOR'的至少一個的組合的基團。此處,R'較佳為碳數為1~10的直鏈烷基、碳數為3~10的分支烷基或碳數為3~10的環狀烷基。 Further, the substituent which the group may have may be a group containing at least one of the substituents in combination with at least one of -O-, -CO-, -COO-, and -COOR'. Here, R' is preferably a linear alkyl group having 1 to 10 carbon atoms, a branched alkyl group having 3 to 10 carbon atoms or a cyclic alkyl group having 3 to 10 carbon atoms.

聚合性基例如可列舉:含有碳-碳雙鍵的聚合性基(較佳為乙烯基、(甲基)丙烯醯氧基)、(甲基)丙烯醯基、環氧基、氮丙啶基(aziridinyl)等。 Examples of the polymerizable group include a polymerizable group containing a carbon-carbon double bond (preferably a vinyl group, a (meth) propylene fluorenyl group), a (meth) acryl fluorenyl group, an epoxy group, or an aziridine group. (aziridinyl) and so on.

烷基可為鏈狀、分支狀、環狀的任一種。直鏈狀或分支狀的烷基較佳為碳數1~10的烷基,更佳為碳數1~8的烷基,更佳為碳數1~4的烷基。環狀烷基可為單環、多環的任一種。環狀烷基較佳為碳數3~20的環烷基,更佳為碳數4~10的環烷基。 The alkyl group may be any of a chain, a branch, and a ring. The linear or branched alkyl group is preferably an alkyl group having 1 to 10 carbon atoms, more preferably an alkyl group having 1 to 8 carbon atoms, more preferably an alkyl group having 1 to 4 carbon atoms. The cyclic alkyl group may be either a single ring or a polycyclic ring. The cyclic alkyl group is preferably a cycloalkyl group having 3 to 20 carbon atoms, more preferably a cycloalkyl group having 4 to 10 carbon atoms.

鹵化烷基較佳為經氟原子取代的烷基。尤其較佳為具有2個以上的氟原子的碳數為1~10的烷基,可為直鏈狀、分支鏈狀及環狀的任一種,較佳為直鏈狀或分支鏈狀的基團。經氟原子取代的烷基的碳數進而佳為1~10,更佳為1~5,進而佳為1~3。經氟原子取代的烷基較佳為末端的結構為(-CF3)。經氟原子取代的烷 基較佳為氟原子的取代率為50%~100%,更佳為80%~100%。此處,所謂氟原子的取代率,是指經氟原子取代的烷基中,氫原子經氟原子取代的比率(%)。 The halogenated alkyl group is preferably an alkyl group substituted with a fluorine atom. In particular, an alkyl group having 2 or more carbon atoms and having 1 to 10 carbon atoms is preferable, and may be any of a linear chain, a branched chain, and a cyclic group, and is preferably a linear or branched chain group. group. The carbon number of the alkyl group substituted with a fluorine atom is more preferably from 1 to 10, still more preferably from 1 to 5, still more preferably from 1 to 3. The alkyl group substituted with a fluorine atom preferably has a terminal structure of (-CF 3 ). The alkyl group substituted with a fluorine atom preferably has a substitution ratio of a fluorine atom of 50% to 100%, more preferably 80% to 100%. Here, the substitution ratio of a fluorine atom means the ratio (%) of the hydrogen atom substituted by a fluorine atom in the alkyl group substituted by a fluorine atom.

尤其鹵化烷基更佳為全氟烷基,進而佳為碳數1~10的全氟烷基。 Particularly, the halogenated alkyl group is more preferably a perfluoroalkyl group, and more preferably a perfluoroalkyl group having 1 to 10 carbon atoms.

於-Si-(ORN22)3中,RN22為碳數1~3的烷基或苯基,n為1~3的整數。 In -Si-(OR N22 ) 3 , R N22 is an alkyl group having 1 to 3 carbon atoms or a phenyl group, and n is an integer of 1 to 3.

具體而言,於所述通式(10)中,L1為包含伸芳基與-O-的組合的基團的情形時,伸芳基可具有的取代基較佳為烷基。 Specifically, in the case of the above formula (10), when L 1 is a group containing a combination of an exoaryl group and -O-, the substituent which the exoaryl group may have is preferably an alkyl group.

於所述通式(10)中的L1所表示的結構的具體例中,較佳為下述結構。 In the specific example of the structure represented by L 1 in the above formula (10), the following structure is preferred.

所述通式(10)中,X1及X2表示所述單陰離子性配位 部位,更具體可列舉羧基、磷酸二酯基、膦酸單酯基、次膦酸基、磺基及羥基等。 In the above formula (10), X 1 and X 2 represent the monoanionic coordination site, and more specifically, a carboxyl group, a phosphodiester group, a phosphonic acid monoester group, a phosphinic acid group, a sulfo group, and a hydroxyl group Wait.

所述通式(10)中,X1及X2可具有彼此相同的單陰離子性配位部位,亦可具有互不相同的單陰離子性配位部位。 In the above formula (10), X 1 and X 2 may have the same monoanionic coordination sites as each other, or may have mutually different monoanionic coordination sites.

所述通式(10)中,X1及X2較佳為下述通式(12)、通 式(13)或通式(13A)所表示的結構。 In the above formula (10), X 1 and X 2 are preferably a structure represented by the following formula (12), formula (13) or formula (13A).

(通式(12)中,R1表示烷基、烯基、芳基、芳烷基。A1及A2分別獨立地表示氧原子、硫原子或單鍵。通式(12)、通式(13)及通式(13A)中,*表示與所述L1的連結部) (In the formula (12), R 1 represents an alkyl group, an alkenyl group, an aryl group or an aralkyl group. A 1 and A 2 each independently represent an oxygen atom, a sulfur atom or a single bond. Formula (12), general formula (13) and (13A), * indicates a connection portion with the L 1 )

通式(12)中,R1表示烷基、烯基、芳基、芳烷基。 In the general formula (12), R 1 represents an alkyl group, an alkenyl group, an aryl group, an aralkyl group.

烷基可為鏈狀、分支狀、環狀的任一種。直鏈狀或分支狀的烷基較佳為經取代或未經取代的碳數1~20的烷基,更佳為經取代或未經取代的碳數1~15的烷基,更佳為經取代或未經取代的碳數1~6的烷基。環狀的烷基可為單環、多環的任一種。環狀的烷基較佳為經取代或未經取代的碳數3~20的環烷基,更佳為經取代或未經取代的碳數4~10的環烷基,尤佳為未經取代的碳數4~8的環烷基。 The alkyl group may be any of a chain, a branch, and a ring. The linear or branched alkyl group is preferably a substituted or unsubstituted alkyl group having 1 to 20 carbon atoms, more preferably a substituted or unsubstituted alkyl group having 1 to 15 carbon atoms, more preferably A substituted or unsubstituted alkyl group having 1 to 6 carbon atoms. The cyclic alkyl group may be either a single ring or a polycyclic ring. The cyclic alkyl group is preferably a substituted or unsubstituted cycloalkyl group having 3 to 20 carbon atoms, more preferably a substituted or unsubstituted cycloalkyl group having 4 to 10 carbon atoms, particularly preferably Substituted cycloalkyl having 4 to 8 carbon atoms.

烯基較佳為經取代或未經取代的碳數2~10的烯基,更佳為經取代或未經取代的碳數2~8的烯基。 The alkenyl group is preferably a substituted or unsubstituted alkenyl group having 2 to 10 carbon atoms, more preferably a substituted or unsubstituted alkenyl group having 2 to 8 carbon atoms.

芳基較佳為經取代或未經取代的碳數6~18的芳基,更佳為經取代或未經取代的碳數6~14的芳基。具體可例示苯基、萘基等。 The aryl group is preferably a substituted or unsubstituted aryl group having 6 to 18 carbon atoms, more preferably a substituted or unsubstituted aryl group having 6 to 14 carbon atoms. Specifically, a phenyl group, a naphthyl group, etc. are illustrated.

芳烷基較佳為經取代或未經取代的碳數7~20的芳烷基,更佳為經取代或未經取代的碳數7~16的芳烷基。 The aralkyl group is preferably a substituted or unsubstituted aralkyl group having 7 to 20 carbon atoms, more preferably a substituted or unsubstituted aralkyl group having 7 to 16 carbon atoms.

所述通式(12)中的R1可具有的取代基與所述通式(10)中的L1可具有的取代基為相同含意,較佳為烷基、芳基、醚基、-Si-(ORN22)3等。 R 1 in the above formula (12) may have the same substituent as the substituent which L 1 in the formula (10) may have, and is preferably an alkyl group, an aryl group, an ether group, or Si-(OR N22 ) 3 and the like.

所述通式(12)中,A1及A2分別獨立地表示氧原子、硫原子或單鍵。尤其就進一步提高本發明的組成物的耐熱性的觀點而言,A1及A2較佳為單鍵。 In the above formula (12), A 1 and A 2 each independently represent an oxygen atom, a sulfur atom or a single bond. In particular, it further improved heat resistance of the composition of the present invention is concerned, A 1 and A 2 is preferably a single bond.

於所述通式(12)中的R1所表示的結構的具體例中,較佳為下述結構。 In the specific example of the structure represented by R 1 in the above formula (12), the following structure is preferred.

(高分子型) (polymer type)

由含有配位部位的聚合體與銅成分的反應所得的銅化合物例如可列舉含有如下聚合體與銅離子的聚合物型的銅化合物,所述聚合體具有選自以酸基或酸基的鹽等的陰離子進行配位的配位部位及以非共價電子對進行配位的配位原子中的一種以上。較佳為含有含作為酸基或酸基的鹽的酸基離子部位的聚合體及銅離子的聚合物型的銅化合物,更佳態樣為以聚合體中的酸基離子部位作為配位體的聚合物型的銅化合物。該聚合物型的銅化合物通常於聚合體的側鏈中具有酸基離子部位等配位部位,酸基離子部位等配位部位鍵結於銅上(例如形成配位鍵),以銅作為起點而於側鏈間形成交聯結構。聚合物型的銅錯合物可列舉:於主鏈具有碳-碳鍵的聚合體的銅錯合物、於主鏈具有碳-碳鍵的聚合體的銅錯合物且為含有氟原子的銅錯合物、於主鏈具有芳香族烴基及/或芳香族雜環基的聚合體(以下稱為含芳香族基的聚合體)的銅錯合物等。 The copper compound obtained by the reaction of the polymer containing the coordination site and the copper component is, for example, a polymer type copper compound containing a polymer and a copper ion, and the polymer has a salt selected from an acid group or an acid group. One or more of the coordination sites in which the anion of the same is coordinated and the coordination atom coordinated by the non-covalent electron pair. Preferably, it is a polymer type copper compound containing a polymer-based ion group as a salt of an acid group or an acid group and a copper ion, and more preferably, the acid-based ion site in the polymer is used as a ligand. A polymeric copper compound. The copper compound of the polymer type usually has a coordination site such as an acid group ion site in a side chain of the polymer, and a coordination site such as an acid group ion site is bonded to copper (for example, a coordination bond is formed), and copper is used as a starting point. A crosslinked structure is formed between the side chains. The polymer type copper complex compound may be a copper complex of a polymer having a carbon-carbon bond in the main chain, a copper complex of a polymer having a carbon-carbon bond in the main chain, and a fluorine atom-containing compound. A copper complex or a copper complex of a polymer having an aromatic hydrocarbon group and/or an aromatic heterocyclic group in the main chain (hereinafter referred to as an aromatic group-containing polymer).

銅成分較佳為含有二價銅的化合物。銅成分中的銅含量較佳為2質量%~40質量%,更佳為5質量%~40質量%。銅成分可使用僅一種,亦可使用兩種以上。含有銅的化合物例如可使用氧化銅或銅鹽。銅鹽更佳為二價銅。銅鹽尤佳為氫氧化銅、乙酸銅及硫酸銅。 The copper component is preferably a compound containing divalent copper. The copper content in the copper component is preferably from 2% by mass to 40% by mass, more preferably from 5% by mass to 40% by mass. The copper component may be used alone or in combination of two or more. As the copper-containing compound, for example, copper oxide or a copper salt can be used. The copper salt is more preferably divalent copper. Copper salts are particularly preferably copper hydroxide, copper acetate and copper sulfate.

酸基只要可與所述銅成分反應,則並無特別限定,較佳為與銅成分形成配位鍵。具體可列舉酸解離常數(pKa)為12以下的酸基,較佳為磺酸基、羧酸基、磷酸基、膦酸基、次膦酸基、醯 亞胺酸基等。聚合體所具有的酸基可僅為一種,亦可為兩種以上。 The acid group is not particularly limited as long as it can react with the copper component, and it is preferred to form a coordinate bond with the copper component. Specific examples thereof include an acid group having an acid dissociation constant (pKa) of 12 or less, preferably a sulfonic acid group, a carboxylic acid group, a phosphoric acid group, a phosphonic acid group, a phosphinic acid group, and an anthracene group. An imidate group or the like. The polymer may have only one type of acid group or two or more types.

構成本發明中所用的酸基的鹽的原子或原子團可列舉:鈉等金屬原子(特別是鹼金屬原子)、四丁基銨等般的原子團。另外,於含有酸基或其鹽的聚合體中,酸基或其鹽只要含有於其主鏈及側鏈的至少一者中即可,較佳為至少含有於側鏈中。 The atom or the atomic group constituting the salt of the acid group used in the present invention may be an atomic group such as a metal atom such as sodium (particularly an alkali metal atom) or tetrabutylammonium. Further, in the polymer containing an acid group or a salt thereof, the acid group or a salt thereof may be contained in at least one of the main chain and the side chain, and is preferably contained in at least one side chain.

含有酸基或其鹽的聚合體較佳為含有羧酸基或其鹽、及/或磺酸基或其鹽的聚合體,更佳為含有磺酸基或其鹽的聚合體。 The polymer containing an acid group or a salt thereof is preferably a polymer containing a carboxylic acid group or a salt thereof and/or a sulfonic acid group or a salt thereof, more preferably a polymer containing a sulfonic acid group or a salt thereof.

以陰離子進行配位的配位部位可列舉所述化合物(A)中所說明的配位部位。 The coordination site to which the anion is coordinated can be exemplified by the coordination site described in the above compound (A).

<<<第1含有酸基或其鹽的聚合體>>> <<<The first polymer containing an acid group or a salt thereof>>

含有酸基或其鹽的聚合體的較佳一例為主鏈具有碳-碳鍵的結構,較佳為含有下述式(A1-1)所表示的構成單元。 A preferred example of the polymer containing an acid group or a salt thereof has a structure in which a main chain has a carbon-carbon bond, and preferably contains a structural unit represented by the following formula (A1-1).

(式(A1-1)中,R1表示氫原子或甲基,L1表示單鍵或二價連結基,M1表示氫原子、或與磺酸基構成鹽的原子或原子團) (In the formula (A1-1), R 1 represents a hydrogen atom or a methyl group, L 1 represents a single bond or a divalent linking group, and M 1 represents a hydrogen atom or an atom or a group which forms a salt with a sulfonic acid group)

所述式(A1-1)中,R1較佳為氫原子。 In the formula (A1-1), R 1 is preferably a hydrogen atom.

所述式(A1-1)中,於L1表示二價連結基的情形時,二價連結基並無特別限定,例如可列舉:二價烴基、伸雜芳基、-O-、-S-、 -CO-、-COO-、-OCO-、-SO2-、-NX-(X表示氫原子或烷基,較佳為氫原子)、或包含該等的組合的基團。 In the case of the formula (A1-1), when L 1 represents a divalent linking group, the divalent linking group is not particularly limited, and examples thereof include a divalent hydrocarbon group, a heteroaryl group, and -O-, -S. -, -CO-, -COO-, -OCO-, -SO 2 -, -NX- (X represents a hydrogen atom or an alkyl group, preferably a hydrogen atom), or a group comprising such a combination.

二價烴基可列舉直鏈狀、分支狀或環狀的伸烷基或伸芳基。烴基亦可具有取代基,較佳為未經取代。 The divalent hydrocarbon group may, for example, be a linear or branched or cyclic alkyl group or an extended aryl group. The hydrocarbon group may also have a substituent, preferably unsubstituted.

直鏈狀的伸烷基的碳數較佳為1~30,更佳為1~15,進而佳為1~6。另外,分支狀的伸烷基的碳數較佳為3~30,更佳為3~15,進而佳為3~6。 The carbon number of the linear alkyl group is preferably from 1 to 30, more preferably from 1 to 15, more preferably from 1 to 6. Further, the carbon number of the branched alkyl group is preferably from 3 to 30, more preferably from 3 to 15, more preferably from 3 to 6.

環狀的伸烷基可為單環、多環的任一種。環狀的伸烷基的碳數較佳為3~20,更佳為4~10,進而佳為6~10。 The cyclic alkyl group may be either a single ring or a polycyclic ring. The carbon number of the cyclic alkyl group is preferably from 3 to 20, more preferably from 4 to 10, and still more preferably from 6 to 10.

伸芳基的碳數較佳為6~18,更佳為6~14,進而佳為6~10,尤佳為伸苯基。 The carbon number of the aryl group is preferably from 6 to 18, more preferably from 6 to 14, more preferably from 6 to 10, and particularly preferably a phenyl group.

伸雜芳基並無特別限定,較佳為5員環或6員環。另外,伸雜芳基可為單環亦可為縮合環,較佳為單環或縮合數為2~8的縮合環,更佳為單環或縮合數為2~4的縮合環。 The heteroaryl group is not particularly limited, and is preferably a 5-membered ring or a 6-membered ring. Further, the heteroaryl group may be a monocyclic ring or a condensed ring, preferably a monocyclic ring or a condensed ring having a condensation number of 2 to 8, more preferably a single ring or a condensed ring having a condensation number of 2 to 4.

所述式(A1-1)中,M1所表示的與磺酸基構成鹽的原子或原子團與所述構成酸基的鹽的原子或原子團為相同含意,較佳為氫原子或鹼金屬原子。 In the formula (A1-1), an atom or a group of a salt constituting a salt of a sulfonic acid group represented by M 1 and the atom or a group of the salt constituting the acid group have the same meaning, preferably a hydrogen atom or an alkali metal atom. .

式(A1-1)所表示的構成單元以外的其他構成單元可參 考日本專利特開2010-106268號公報的段落編號0068~段落編號0075(對應的美國專利申請公開第2011/0124824號說明書的[0112]~[0118])中揭示的共聚合成分的記載,將該些內容併入至本申請案說明書中。 Other constituent units other than the constituent unit represented by the formula (A1-1) can be referred to The description of the copolymerization component disclosed in paragraphs 0068 to 0015 of the specification of the corresponding Japanese Patent Application Laid-Open No. 2011/0124824, which is incorporated herein by reference. This content is incorporated into the specification of the present application.

較佳的其他構成單元可列舉下述式(A1-2)所表示的構成單元。 The other constituent unit which is preferable is a structural unit represented by the following formula (A1-2).

式(A1-2)中,R3表示氫原子或甲基,較佳為氫原子。 In the formula (A1-2), R 3 represents a hydrogen atom or a methyl group, preferably a hydrogen atom.

Y2表示單鍵或二價連結基,二價連結基與上文所述的所述式(A1-1)的二價連結基為相同含意。尤其Y2較佳為-COO-、-CO-、-NH-、直鏈狀或分支狀的伸烷基、或包含該等的組合的基團、或單鍵。 Y 2 represents a single bond or a divalent linking group, and the divalent linking group has the same meaning as the divalent linking group of the above formula (A1-1). In particular, Y 2 is preferably -COO-, -CO-, -NH-, a linear or branched alkyl group, or a group containing the combination, or a single bond.

式(A1-2)中,X2表示-PO3H、-PO3H2、-OH或-COOH,較佳為-COOH。 In the formula (A1-2), X 2 represents -PO 3 H, -PO 3 H 2 , -OH or -COOH, preferably -COOH.

於含有所述式(A1-1)所表示的構成單元的聚合體含有其他構成單元(較佳為所述式(A1-2)所表示的構成單元)的情形時,所述式(A1-1)所表示的構成單元與所述式(A1-2)所表示的構成單元的莫耳比較佳為95:5~20:80,更佳為90:10~40:60。 When the polymer containing the constituent unit represented by the formula (A1-1) contains another constituent unit (preferably, the constituent unit represented by the formula (A1-2)), the formula (A1) 1) Preferably, the constituent unit represented by the formula (A1-2) is 95:5 to 20:80, more preferably 90:10 to 40:60.

<<<第2含有酸基或其鹽的聚合體>>> <<<The second polymer containing an acid group or a salt thereof>>

本發明中可使用的銅化合物亦可使用:由具有酸基或其鹽且於主鏈中具有芳香族烴基及/或芳香族雜環基的聚合體(以下稱為含芳香族基的聚合體)、與銅成分的反應所得的聚合物型的銅化合 物。含芳香族基的聚合體只要於主鏈中具有芳香族烴基及芳香族雜環基中的至少一種即可,亦可具有兩種以上。關於酸基或其鹽及銅成分,與由所述含有酸基或其鹽的聚合體與銅成分的反應所得的銅化合物為相同含意,較佳範圍亦相同。 The copper compound which can be used in the present invention can also be used: a polymer having an acid group or a salt thereof and having an aromatic hydrocarbon group and/or an aromatic heterocyclic group in the main chain (hereinafter referred to as an aromatic group-containing polymer) ), the copper type of the polymer type obtained by the reaction with the copper component Things. The aromatic group-containing polymer may have at least one of an aromatic hydrocarbon group and an aromatic heterocyclic group in the main chain, and may have two or more types. The acid group or a salt thereof and the copper component are the same as those of the copper compound obtained by the reaction of the polymer containing the acid group or the salt thereof with the copper component, and the preferred range is also the same.

芳香族烴基例如較佳為芳基。芳基的碳數較佳為6~20,更佳為6~15,進而佳為6~12。尤佳為苯基、萘基或聯苯基。芳香族烴基可為單環或多環,較佳為單環。 The aromatic hydrocarbon group is preferably, for example, an aryl group. The carbon number of the aryl group is preferably from 6 to 20, more preferably from 6 to 15, and more preferably from 6 to 12. More preferably, it is a phenyl group, a naphthyl group or a biphenyl group. The aromatic hydrocarbon group may be monocyclic or polycyclic, preferably monocyclic.

芳香族雜環基例如可使用碳數2~30的芳香族雜環基。芳香族雜環基較佳為5員環或6員環。另外,芳香族雜環基為單環或縮合環,可例示單環或縮合數為2~8的縮合環。雜環所含的雜原子可例示氮、氧、硫原子,較佳為氮或氧。 As the aromatic heterocyclic group, for example, an aromatic heterocyclic group having 2 to 30 carbon atoms can be used. The aromatic heterocyclic group is preferably a 5-membered ring or a 6-membered ring. Further, the aromatic heterocyclic group is a monocyclic ring or a condensed ring, and examples thereof include a monocyclic ring or a condensed ring having a condensation number of 2 to 8. The hetero atom contained in the hetero ring may be a nitrogen, an oxygen or a sulfur atom, preferably nitrogen or oxygen.

於芳香族烴基及/或芳香族雜環基具有取代基T的情形時,取代基T例如可例示:烷基、聚合性基(較佳為含有碳-碳雙鍵的聚合性基)、鹵素原子(氟原子、氯原子、溴原子、碘原子)、羧酸酯基、鹵化烷基、烷氧基、甲基丙烯醯氧基、丙烯醯氧基、醚基、磺醯基、硫醚基、醯胺基、醯基、羥基、羧基、芳烷基等,較佳為烷基(特別是碳數1~3的烷基)。 When the aromatic hydrocarbon group and/or the aromatic heterocyclic group has a substituent T, the substituent T may, for example, be an alkyl group or a polymerizable group (preferably a polymerizable group containing a carbon-carbon double bond) or a halogen. Atom (a fluorine atom, a chlorine atom, a bromine atom, an iodine atom), a carboxylate group, a halogenated alkyl group, an alkoxy group, a methacryloxy group, an acryloxy group, an ether group, a sulfonyl group, a thioether group Amidino group, mercapto group, hydroxyl group, carboxyl group, aralkyl group or the like is preferably an alkyl group (particularly an alkyl group having 1 to 3 carbon atoms).

尤其含芳香族基的聚合體較佳為選自以下聚合體中的至少一種聚合體:聚醚碸系聚合體、聚碸系聚合體、聚醚酮系聚合體、聚苯醚系聚合體、聚醯亞胺系聚合體、聚苯并咪唑系聚合體、聚苯系聚合體、酚樹脂系聚合體、聚碳酸酯系聚合體、聚醯胺系聚合體及聚酯系聚合體。以下示出各聚合體的例子。 In particular, the aromatic group-containing polymer is preferably at least one polymer selected from the group consisting of a polyether oxime polymer, a polyfluorene polymer, a polyether ketone polymer, and a polyphenylene ether polymer. Polyimide-based polymer, polybenzimidazole-based polymer, polyphenyl-based polymer, phenol resin-based polymer, polycarbonate-based polymer, polyamine-based polymer, and polyester-based polymer. Examples of the respective polymers are shown below.

聚醚碸系聚合體:具有(-O-Ph-SO2-Ph-)所表示的主鏈結構(Ph表示伸苯基,以下相同)的聚合體 Polyether oxime polymer: a polymer having a main chain structure represented by (-O-Ph-SO 2 -Ph-) (Ph represents a phenyl group, the same applies hereinafter)

聚碸系聚合體:具有(-O-Ph-Ph-O-Ph-SO2-Ph-)所表示的主鏈結構的聚合體 Polyfluorene polymer: a polymer having a main chain structure represented by (-O-Ph-Ph-O-Ph-SO 2 -Ph-)

聚醚酮系聚合體:具有(-O-Ph-O-Ph-C(=O)-Ph-)所表示的主鏈結構的聚合體 Polyether ketone polymer: a polymer having a main chain structure represented by (-O-Ph-O-Ph-C(=O)-Ph-)

聚苯醚系聚合體:具有(-Ph-O-、-Ph-S-)所表示的主鏈結構的聚合體 Polyphenylene ether polymer: a polymer having a main chain structure represented by (-Ph-O-, -Ph-S-)

聚苯系聚合體:具有(-Ph-)所表示的主鏈結構的聚合體 Polyphenylene polymer: a polymer having a main chain structure represented by (-Ph-)

酚樹脂系聚合體:具有(-Ph(OH)-CH2-)所表示的主鏈結構的聚合體 Phenolic resin-based polymer: a polymer having a main chain structure represented by (-Ph(OH)-CH 2 -)

聚碳酸酯系聚合體:具有(-Ph-O-C(=O)-O-)所表示的主鏈結構的聚合體 Polycarbonate-based polymer: a polymer having a main chain structure represented by (-Ph-O-C(=O)-O-)

聚醯胺系聚合體例如為具有(-Ph-C(=O)-NH-)所表示的主鏈結構的聚合體 The polyamine-based polymer is, for example, a polymer having a main chain structure represented by (-Ph-C(=O)-NH-)

聚酯系聚合體例如為具有(-Ph-C(=O)O-)所表示的主鏈結構的聚合體 The polyester-based polymer is, for example, a polymer having a main chain structure represented by (-Ph-C(=O)O-)

聚醚碸系聚合體、聚碸系聚合體及聚醚酮系聚合體例如可參考日本專利特開2006-310068號公報的段落0022及日本專利特開2008-27890號公報的段落0028中記載的主鏈結構,將該些內容併入至本申請案說明書中。 For example, the polyether oxime polymer, the polyfluorene polymer, and the polyether ketone polymer can be referred to, for example, in paragraph 0022 of JP-A-2006-310068 and paragraph 0028 of JP-A-2008-27890. The main chain structure, which is incorporated into the specification of the present application.

聚醯亞胺系聚合體可參考日本專利特開2002-367627號公報 的段落0047~段落0058的記載及日本專利特開2004--35891號公報的段落0018~段落0019中記載的主鏈結構,將該些內容併入至本申請案說明書中。 The polyimine-based polymer can be referred to Japanese Patent Laid-Open Publication No. 2002-367627 The main chain structure described in paragraphs 0047 to 0058 of the paragraphs and paragraphs 0018 to 0019 of JP-A-2004-35891, the contents of which are incorporated herein by reference.

含芳香族基的聚合體的較佳一例較佳為含有下述式(A1-3)所表示的構成單元。 A preferred example of the aromatic group-containing polymer preferably contains a structural unit represented by the following formula (A1-3).

(式(A1-3)中,Ar1表示芳香族烴基及/或芳香族雜環基,Y1表示單鍵或二價連結基,X1表示酸基或其鹽) (In the formula (A1-3), Ar 1 represents an aromatic hydrocarbon group and/or an aromatic heterocyclic group, Y 1 represents a single bond or a divalent linking group, and X 1 represents an acid group or a salt thereof)

式(A1-3)中,於Ar1表示芳香族烴基的情形時,與所述芳香族烴基為相同含意,較佳範圍亦相同。於Ar1表示芳香族雜環基的情形時,與所述芳香族雜環基為相同含意,較佳範圍亦相同。 In the case of the formula (A1-3), when Ar 1 represents an aromatic hydrocarbon group, the same meaning as the above-mentioned aromatic hydrocarbon group is used, and the preferred range is also the same. When Ar 1 represents an aromatic heterocyclic group, it has the same meaning as the above aromatic heterocyclic group, and the preferred range is also the same.

Ar1除了所述式(A1-3)中的-Y1-X1以外亦可具有取代基。於Ar1具有取代基的情形時,取代基與所述取代基T為相同含意,較佳範圍亦相同。 Ar 1 may have a substituent in addition to -Y 1 -X 1 in the formula (A1-3). In the case where Ar 1 has a substituent, the substituent has the same meaning as the substituent T, and the preferred range is also the same.

式(A1-3)中,Y1較佳為單鍵。於Y1表示二價連結基的情形時,二價連結基例如可列舉:烴基、芳香族雜環基、-O-、-S-、-SO2-、-CO-、-C(=O)-O-、-O-C(=O)-O-、-SO2-、-NX-(X表示氫原子或烷基,較佳為氫原子)、-C(RY1)(RY2)-、或包含該等的 組合的基團。此處,RY1及RY2分別獨立地表示氫原子、氟原子或烷基。 In the formula (A1-3), Y 1 is preferably a single bond. In the case where Y 1 represents a divalent linking group, examples of the divalent linking group include a hydrocarbon group, an aromatic heterocyclic group, -O-, -S-, -SO 2 -, -CO-, -C(=O). -O-, -OC(=O)-O-, -SO 2 -, -NX- (X represents a hydrogen atom or an alkyl group, preferably a hydrogen atom), -C(R Y1 )(R Y2 )- Or a group comprising such combinations. Here, R Y1 and R Y2 each independently represent a hydrogen atom, a fluorine atom or an alkyl group.

烴基例如可列舉:直鏈狀、分支狀或環狀的伸烷基或伸芳基。 直鏈狀的伸烷基的碳數較佳為1~20,更佳為1~10,進而佳為1~6。分支狀的伸烷基的碳數較佳為3~20,更佳為3~10,進而佳為3~6。環狀的伸烷基可為單環、多環的任一種。環狀的伸烷基的碳數較佳為3~20,更佳為4~10,進而佳為6~10。該些直鏈狀、分支狀或環狀的伸烷基中,伸烷基中的氫原子可經氟原子取代。 Examples of the hydrocarbon group include a linear alkyl group, a branched chain or a cyclic alkyl group or an extended aryl group. The carbon number of the linear alkyl group is preferably from 1 to 20, more preferably from 1 to 10, and even more preferably from 1 to 6. The carbon number of the branched alkyl group is preferably from 3 to 20, more preferably from 3 to 10, and still more preferably from 3 to 6. The cyclic alkyl group may be either a single ring or a polycyclic ring. The carbon number of the cyclic alkyl group is preferably from 3 to 20, more preferably from 4 to 10, and still more preferably from 6 to 10. In the linear, branched or cyclic alkyl groups, the hydrogen atom in the alkyl group may be substituted by a fluorine atom.

伸芳基與所述式(A1-1)的二價連結基為伸芳基的情形為相同含意。 The aryl group has the same meaning as the case where the divalent linking group of the formula (A1-1) is an exoaryl group.

芳香族雜環基並無特別限定,較佳為5員環或6員環。另外,芳香族雜環基可為單環亦可為縮合環,較佳為單環或縮合數為2~8的縮合環,更佳為單環或縮合數為2~4的縮合環。 The aromatic heterocyclic group is not particularly limited, and is preferably a 5-membered ring or a 6-membered ring. Further, the aromatic heterocyclic group may be a monocyclic ring or a condensed ring, and is preferably a monocyclic ring or a condensed ring having a condensation number of 2 to 8, more preferably a monocyclic ring or a condensed ring having a condensation number of 2 to 4.

式(A1-3)中,X1所表示的酸基或其鹽與所述酸基或其鹽為相同含意,較佳範圍亦相同。 In the formula (A1-3), the acid group represented by X 1 or a salt thereof has the same meaning as the acid group or a salt thereof, and the preferred range is also the same.

含有式(A1-1)、式(A1-2)或式(A1-3)所表示的構成單元的聚合體的重量平均分子量較佳為1000以上,更佳為1000~1000萬,進而佳為3000~100萬,尤佳為4000~40萬。 The weight average molecular weight of the polymer containing the constituent unit represented by the formula (A1-1), the formula (A1-2) or the formula (A1-3) is preferably 1,000 or more, more preferably from 1,000 to 10,000,000, and further preferably 3000~1 million, especially 4,000~400,000.

含有所述式(A1-1)、式(A1-2)或式(A1-3)所表示 的構成單元的聚合體的具體例可列舉下述所記載的化合物及下述化合物的鹽,但不限定於該些化合物。 Containing the formula (A1-1), formula (A1-2) or formula (A1-3) Specific examples of the polymer of the constituent unit include the following compounds and salts of the following compounds, but are not limited thereto.

(無機微粒子) (inorganic particles)

本發明的組成物為了獲得目標近紅外線遮蔽性,亦可含有無機微粒子。無機微粒子可僅使用一種,亦可使用兩種以上。 The composition of the present invention may contain inorganic fine particles in order to obtain a target near-infrared shielding property. The inorganic fine particles may be used singly or in combination of two or more.

無機微粒子為主要發揮將紅外線遮光(吸收)的作用的粒子。就紅外線遮光性更優異的方面而言,無機微粒子較佳為選自由金屬氧化物粒子及金屬粒子所組成的組群中的至少一種。 The inorganic fine particles are particles which mainly function to block (absorb) infrared rays. In terms of more excellent infrared ray opacity, the inorganic fine particles are preferably at least one selected from the group consisting of metal oxide particles and metal particles.

無機微粒子例如可列舉:氧化銦錫(Indium Tin Oxide,ITO)粒子、氧化銻錫(Antimony Tin Oxide,ATO)粒子、亦可經鋁摻雜的氧化鋅(亦可經Al摻雜的ZnO)粒子、摻氟二氧化錫(摻F的SnO2)粒子、或摻鈮二氧化鈦(摻Nb的TiO2)粒子等金屬氧化物粒子,或銀(Ag)粒子、金(Au)粒子、銅(Cu)粒子或鎳(Ni)粒子等金屬粒子。再者,為了兼具紅外線遮光性與光微影性,理想的是曝光波長(365nm~405nm)的透射率高,較佳為氧化銦錫(ITO)粒子或氧化銻錫(ATO)粒子。 Examples of the inorganic fine particles include indium tin oxide (ITO) particles, antimony tin Oxide (ATO) particles, and aluminum-doped zinc oxide (Al-doped ZnO) particles. Metal oxide particles such as fluorine-doped tin dioxide (F-doped SnO 2 ) particles or erbium-doped titanium dioxide (Nb-doped TiO 2 ) particles, or silver (Ag) particles, gold (Au) particles, copper (Cu) Metal particles such as particles or nickel (Ni) particles. Further, in order to have both infrared ray blocking property and photo lithography, it is preferable that the transmittance at the exposure wavelength (365 nm to 405 nm) is high, and indium tin oxide (ITO) particles or strontium tin oxide (ATO) particles are preferable.

無機微粒子的形狀並無特別限制,當然可為球狀、非球狀,亦可為片狀、線狀、管狀。 The shape of the inorganic fine particles is not particularly limited, and may of course be spherical or non-spherical, and may be in the form of a sheet, a wire or a tube.

另外,無機微粒子可使用氧化鎢系化合物,具體而言,更佳為下述通式(組成式)(I)所表示的氧化鎢系化合物。 In addition, a tungsten oxide-based compound can be used as the inorganic fine particles, and specifically, a tungsten oxide-based compound represented by the following general formula (composition formula) (I) is more preferable.

MxWyOz…(I) M x W y O z ...(I)

M表示金屬,W表示鎢,O表示氧。 M represents a metal, W represents tungsten, and O represents oxygen.

0.001≦x/y≦1.1 0.001≦x/y≦1.1

2.2≦z/y≦3.0 2.2≦z/y≦3.0

M的金屬可列舉:鹼金屬、鹼土金屬、鎂(Mg)、鋯(Zr)、鉻(Cr)、錳(Mn)、鐵(Fe)、釕(Ru)、鈷(Co)、銠(Rh)、銥 Examples of the metal of M include alkali metal, alkaline earth metal, magnesium (Mg), zirconium (Zr), chromium (Cr), manganese (Mn), iron (Fe), ruthenium (Ru), cobalt (Co), and rhodium (Rh). ),iridium

(Ir)、鎳(Ni)、鈀(Pd)、鉑(Pt)、銅(Cu)、銀(Ag)、金(Au)、鋅(Zn)、鎘(Cd)、鋁(Al)、鎵(Ga)、銦(In)、鉈(Tl)、錫(Sn)、鉛(Pb)、鈦(Ti)、鈮(Nb)、釩(V)、鉬(Mo)、鉭(Ta)、錸(Re)、鈹(Be)、鉿(Hf)、鋨(Os)、鉍(Bi),較佳為鹼金屬,且較佳為Rb或Cs,更佳為Cs。M的金屬可為一種亦可為兩種以上。 (Ir), nickel (Ni), palladium (Pd), platinum (Pt), copper (Cu), silver (Ag), gold (Au), zinc (Zn), cadmium (Cd), aluminum (Al), gallium (Ga), indium (In), tantalum (Tl), tin (Sn), lead (Pb), titanium (Ti), niobium (Nb), vanadium (V), molybdenum (Mo), tantalum (Ta), tantalum (Re), beryllium (Be), hafnium (Hf), osmium (Os), bismuth (Bi), preferably an alkali metal, and preferably Rb or Cs, more preferably Cs. The metal of M may be one type or two or more types.

藉由x/y為0.001以上,可充分遮蔽紅外線,藉由x/y為1.1以下,能更可靠地避免於氧化鎢系化合物中生成雜質相的情況。 When x/y is 0.001 or more, infrared rays can be sufficiently shielded, and when x/y is 1.1 or less, it is possible to more reliably prevent the formation of an impurity phase in the tungsten oxide-based compound.

藉由z/y為2.2以上,可進一步提高作為材料的化學穩定性,藉由z/y為3.0以下,可充分遮蔽紅外線。 By having z/y of 2.2 or more, the chemical stability of the material can be further improved, and by z/y being 3.0 or less, infrared rays can be sufficiently shielded.

金屬氧化物較佳為氧化鎢銫。 The metal oxide is preferably tungsten oxide.

所述通式(I)所表示的氧化鎢系化合物的具體例可列舉Cs0.33WO3、Rb0.33WO3、K0.33WO3、Ba0.33WO3等,較佳為Cs0.33WO3或Rb0.33WO3,更佳為Cs0.33WO3Specific examples of the tungsten oxide-based compound represented by the above formula (I) include Cs 0.33 WO 3 , Rb 0.33 WO 3 , K 0.33 WO 3 , Ba 0.33 WO 3 , etc., preferably Cs 0.33 WO 3 or Rb 0.33. WO 3 is more preferably Cs 0.33 WO 3 .

金屬氧化物較佳為微粒子。金屬氧化物的平均粒徑較佳為800nm以下,更佳為400nm以下,進而佳為200nm以下。藉由平均粒徑為此種範圍,金屬氧化物不易因光散射而阻斷可見光,故能使可見光範圍內的透光性更可靠。就避免光酸亂的觀點而言,平均粒徑越小越佳,但就製造時的操作容易性等理由而言,金屬氧化物的平均粒徑通常為1nm以上。 The metal oxide is preferably a microparticle. The average particle diameter of the metal oxide is preferably 800 nm or less, more preferably 400 nm or less, and still more preferably 200 nm or less. Since the average particle diameter is in such a range, the metal oxide is less likely to block visible light by light scattering, so that light transmittance in the visible light range can be made more reliable. In view of avoiding photo-acidity, the average particle diameter is preferably as small as possible, but the average particle diameter of the metal oxide is usually 1 nm or more for reasons such as ease of handling during production.

氧化鎢系化合物例如可作為住友金屬礦山股份有限公司製造的YMF-02、YMF-02A、YMS-01A-2、YMF-10A-1等鎢微粒子的 分散物而獲取。 The tungsten oxide-based compound can be, for example, a tungsten fine particle such as YMF-02, YMF-02A, YMS-01A-2, or YMF-10A-1 manufactured by Sumitomo Metal Mining Co., Ltd. Obtained from the dispersion.

相對於含有金屬氧化物的組成物的總固體成分質量,金屬氧化物的含量較佳為0.01質量%~30質量%,更佳為0.1質量%~20質量%,進而佳為1質量%~10質量%。 The content of the metal oxide is preferably from 0.01% by mass to 30% by mass, more preferably from 0.1% by mass to 20% by mass, even more preferably from 1% by mass to 10% by mass based on the total solid content of the metal oxide-containing composition. quality%.

本發明的組成物亦可使用日本專利特開2013-195480號 公報的段落0013~段落0029中記載的酞菁化合物作為其他近紅外線吸收性化合物,將其內容併入至本申請案說明書中。 The composition of the present invention can also be used in Japanese Patent Laid-Open No. 2013-195480 The phthalocyanine compound described in paragraphs 0013 to 0029 of the gazette is used as another near-infrared absorbing compound, and the content thereof is incorporated into the specification of the present application.

<溶劑> <solvent>

本發明的組成物亦可含有溶劑。 The composition of the present invention may also contain a solvent.

本發明中所用的溶劑並無特別限制,只要可將本發明的組成物的各成分均勻地溶解或分散,則可根據目的而適當選擇,例如可使用水、有機溶劑。本發明的組成物使用所述化合物(A),故於使用有機溶劑作為溶劑的情形時,亦可減少對分光特性的影響。 The solvent to be used in the present invention is not particularly limited as long as the components of the composition of the present invention can be uniformly dissolved or dispersed, and can be appropriately selected according to the purpose. For example, water or an organic solvent can be used. Since the compound (A) is used as the composition of the present invention, when an organic solvent is used as the solvent, the influence on the spectral characteristics can be reduced.

溶劑例如可較佳地列舉:醇類、酮類、酯類、芳香族烴類、鹵化烴類、及二甲基甲醯胺、二甲基乙醯胺、二甲基亞碸、環丁碸等。該些可單獨使用一種,亦可併用兩種以上。於該情形時,尤佳為由選自以下溶劑中的兩種以上所構成的混合溶液:所述3-乙氧基丙酸甲酯、3-乙氧基丙酸乙酯、乙基溶纖劑乙酸酯、乳酸乙酯、二乙二醇二甲醚、乙酸丁酯、3-甲氧基丙酸甲酯、2-庚酮、環己酮、乙基卡必醇乙酸酯、丁基卡必醇乙酸酯、乙二醇單丁醚乙酸酯、丙二醇單甲醚及丙二醇單甲醚乙酸酯。 The solvent is, for example, preferably exemplified by alcohols, ketones, esters, aromatic hydrocarbons, halogenated hydrocarbons, and dimethylformamide, dimethylacetamide, dimethyl hydrazine, and cyclobutyl hydrazine. Wait. These may be used alone or in combination of two or more. In this case, a mixed solution composed of two or more selected from the group consisting of methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, and ethyl cellosolve is particularly preferred. Acetate, ethyl lactate, diethylene glycol dimethyl ether, butyl acetate, methyl 3-methoxypropionate, 2-heptanone, cyclohexanone, ethyl carbitol acetate, butyl Kikabi alcohol acetate, ethylene glycol monobutyl ether acetate, propylene glycol monomethyl ether and propylene glycol monomethyl ether acetate.

醇類、芳香族烴類、鹵化烴類的具體例可列舉日本專利特開 2012-194534號公報段落0136等中記載者,將其內容併入至本申請案說明書中。另外,酯類、酮類、醚類的具體例可列舉日本專利特開2012-208494號公報段落0497(對應的美國專利申請公開第2012/0235099號說明書的[0609])中記載者,進而可列舉:乙酸正戊酯、丙酸乙酯、鄰苯二甲酸二甲酯、苯甲酸乙酯、硫酸甲酯、丙酮、甲基異丁基酮、二乙醚、乙二醇單丁醚乙酸酯等。 Specific examples of the alcohol, the aromatic hydrocarbon, and the halogenated hydrocarbon include Japanese Patent Laid-Open The contents described in paragraph 0136 of the Japanese Patent Publication No. 2012-194534, the contents of which are incorporated herein by reference. Further, specific examples of the esters, the ketones, and the ethers can be described in paragraph 0497 of the Japanese Patent Application Laid-Open No. 2012-208494 (the corresponding Japanese Patent Application Publication No. 2012/0235099 [0609]). Listed: n-amyl acetate, ethyl propionate, dimethyl phthalate, ethyl benzoate, methyl sulfate, acetone, methyl isobutyl ketone, diethyl ether, ethylene glycol monobutyl ether acetate Wait.

相對於本發明的組成物,溶劑的含量較佳為10質量%以上,更佳為20質量%以上,進而佳為30質量%以上,進而更佳為40質量%以上。另外,相對於本發明的組成物,溶劑的含量較佳為以10質量%~90質量%的比例含有,更佳為含有20質量%~80質量%的溶劑,尤佳為含有30質量%~70質量%的溶劑。溶劑可僅為一種,亦可為兩種以上,於為兩種以上的情形時,合計量成為所述範圍。 The content of the solvent is preferably 10% by mass or more, more preferably 20% by mass or more, still more preferably 30% by mass or more, and still more preferably 40% by mass or more based on the composition of the present invention. Further, the content of the solvent is preferably contained in a proportion of 10% by mass to 90% by mass, more preferably 20% by mass to 80% by mass based on the composition of the present invention, and particularly preferably 30% by mass or more. 70% by mass of solvent. The solvent may be one type or two or more types. In the case of two or more types, the total amount is in the above range.

<硬化性化合物> <hardening compound>

本發明的組成物亦可含有硬化性化合物。硬化性化合物可為聚合性化合物,亦可為黏合劑等非聚合性化合物。另外,硬化性化合物可為熱硬化性化合物,亦可為光硬化性化合物,熱硬化性組成物的情況下因反應率高故較佳。 The composition of the present invention may also contain a curable compound. The curable compound may be a polymerizable compound or a non-polymerizable compound such as a binder. Further, the curable compound may be a thermosetting compound or a photocurable compound, and in the case of a thermosetting composition, it is preferred because the reaction rate is high.

<具有聚合性基的化合物> <Compound having a polymerizable group>

硬化性組成物較佳為含有具有聚合性基的化合物(以下有時稱為「聚合性化合物」)。此種化合物組群於該產業領域中廣為人知,本發明可無特別限定地使用該些化合物。該些化合物例如可 為單體、寡聚物、預聚物、聚合物等化學形態的任一種。 The curable composition preferably contains a compound having a polymerizable group (hereinafter sometimes referred to as "polymerizable compound"). Such a compound group is widely known in the industrial field, and the present invention can be used without any particular limitation. These compounds can be, for example It is any of chemical forms such as monomers, oligomers, prepolymers, and polymers.

聚合性化合物可為單官能亦可為多官能,較佳為多官能。藉由含有多官能化合物,可進一步提高近紅外線遮蔽性及耐熱性。官能基的個數並無特別限定,較佳為2官能~8官能,更佳為3官能~6官能。 The polymerizable compound may be monofunctional or polyfunctional, preferably polyfunctional. By containing a polyfunctional compound, near-infrared shielding properties and heat resistance can be further improved. The number of functional groups is not particularly limited, but is preferably a bifunctional to an octafunctional, more preferably a trifunctional to a hexafunctional.

於本發明的組成物中含有所述銅錯合物並且含有硬化性化合物的情形時,硬化性化合物的較佳形態可列舉下述化合物。本發明不限定於以下形態。硬化性化合物可列舉:單官能的(甲基)丙烯酸酯、多官能的(甲基)丙烯酸酯(較佳為3官能~6官能的(甲基)丙烯酸酯)、多元酸改質丙烯酸系寡聚物、環氧樹脂、或多官能的環氧樹脂。 In the case where the copper complex is contained in the composition of the present invention and the curable compound is contained, preferred examples of the curable compound include the following compounds. The present invention is not limited to the following aspects. Examples of the curable compound include a monofunctional (meth) acrylate, a polyfunctional (meth) acrylate (preferably a trifunctional to hexafunctional (meth) acrylate), and a polybasic acid-modified acrylic oligo. Polymer, epoxy resin, or polyfunctional epoxy resin.

<<聚合性單體及聚合性寡聚物>> <<Polymerizable monomer and polymerizable oligomer>>

本發明的組成物的第一較佳實施態樣含有具有聚合性基的單體(聚合性單體)或具有聚合性基的寡聚物(聚合性寡聚物)(以下有時將聚合性單體與聚合性寡聚物一併稱為「聚合性單體等」)作為聚合性化合物。 The first preferred embodiment of the composition of the present invention contains a monomer having a polymerizable group (polymerizable monomer) or an oligomer having a polymerizable group (polymerizable oligomer) (hereinafter, polymerizability is sometimes used) The monomer and the polymerizable oligomer are collectively referred to as a "polymerizable monomer or the like" as a polymerizable compound.

聚合性單體等的例子可列舉不飽和羧酸(例如丙烯酸、甲基丙烯酸、衣康酸、丁烯酸、異丁烯酸、馬來酸等)或其酯類、醯胺類,較佳為不飽和羧酸與脂肪族多元醇化合物的酯、及不飽和羧酸與脂肪族多元胺化合物的醯胺類。另外,亦可較佳地使用以下反應物:具有羥基或胺基、巰基等親核性取代基的不飽和羧酸酯或醯胺類與單官能或多官能異氰酸酯類或環氧類的加成反應 物,或者與單官能或多官能的羧酸的脫水縮合反應物等。另外,以下反應物亦較佳:具有異氰酸酯基或環氧基等親電子性取代基的不飽和羧酸酯或醯胺類與單官能或多官能的醇類、胺類、硫醇類的加成反應物,進而具有鹵素基或甲苯磺醯氧基等脫離性取代基的不飽和羧酸酯或醯胺類與單官能或多官能的醇類、胺類、硫醇類的取代反應物。另外,作為其他例,亦可使用代替所述不飽和羧酸而替換成不飽和膦酸、苯乙烯等乙烯基苯衍生物、乙烯醚、烯丙醚等而成的化合物組群。 Examples of the polymerizable monomer and the like include unsaturated carboxylic acids (for example, acrylic acid, methacrylic acid, itaconic acid, crotonic acid, methacrylic acid, maleic acid, etc.) or esters thereof, guanamines, and preferably no. An ester of a saturated carboxylic acid and an aliphatic polyol compound, and an amide of an unsaturated carboxylic acid and an aliphatic polyamine compound. Further, it is also preferred to use the following reactants: an unsaturated carboxylic acid ester having a nucleophilic substituent such as a hydroxyl group, an amine group or a fluorenyl group, or an addition of a monofunctional or polyfunctional isocyanate or epoxy group. reaction Or a dehydration condensation reaction with a monofunctional or polyfunctional carboxylic acid, and the like. Further, the following reactants are also preferred: an unsaturated carboxylic acid ester or a guanamine having an electrophilic substituent such as an isocyanate group or an epoxy group, and a monofunctional or polyfunctional alcohol, an amine or a thiol. The reactants further include a substituted carboxylic acid ester of a detachable substituent such as a halogen group or a tosyloxy group, or a substituted reactant of a monofunctional or polyfunctional alcohol, an amine or a thiol. Further, as another example, a compound group of a vinylbenzene derivative such as an unsaturated phosphonic acid or styrene, a vinyl ether or an allyl ether may be used instead of the unsaturated carboxylic acid.

關於該等的具體化合物,亦可將日本專利特開2009-288705號公報的段落編號0095~段落編號0108中記載的化合物較佳地用於本發明中。 For the specific compound, the compound described in Paragraph No. 0095 to Paragraph No. 0108 of JP-A-2009-288705 is preferably used in the present invention.

另外,所述聚合性單體等亦較佳為具有至少一個可進行 加成聚合的乙烯基、且於常壓下具有100℃以上的沸點的具有乙烯性不飽和基的化合物,且較佳為單官能(甲基)丙烯酸酯、二官能(甲基)丙烯酸酯、三官能以上的(甲基)丙烯酸酯(例如3官能~6官能的(甲基)丙烯酸酯)。 In addition, the polymerizable monomer or the like is also preferably one having at least one An ethylenically unsaturated group-containing compound having an added vinyl group and a boiling point of 100 ° C or higher at normal pressure, and preferably a monofunctional (meth) acrylate or a difunctional (meth) acrylate. A trifunctional or higher (meth) acrylate (for example, a trifunctional-6 functional (meth) acrylate).

其例子可列舉:聚乙二醇單(甲基)丙烯酸酯、聚丙二醇單(甲基)丙烯酸酯、(甲基)丙烯酸苯氧基乙酯等單官能的丙烯酸酯或甲基丙烯酸酯;聚乙二醇二(甲基)丙烯酸酯、三羥甲基乙烷三(甲基)丙烯酸酯、新戊二醇二(甲基)丙烯酸酯、季戊四醇三(甲基)丙烯酸酯、季戊四醇四(甲基)丙烯酸酯、二季戊四醇五(甲基)丙烯酸酯、二季戊 四醇六(甲基)丙烯酸酯、己二醇(甲基)丙烯酸酯、三羥甲基丙烷三(丙烯醯氧基丙基)醚、異三聚氰酸三(丙烯醯氧基乙基)酯、於甘油或三羥甲基乙烷等多官能醇上加成環氧乙烷或環氧丙烷後加以(甲基)丙烯酸酯化而成者;日本專利特公昭48-41708號、日本專利特公昭50-6034號、日本專利特開昭51-37193號各公報中記載般的(甲基)丙烯酸胺基甲酸酯類,日本專利特開昭48-64183號、日本專利特公昭49-43191號、日本專利特公昭52-30490號各公報中記載的聚酯丙烯酸酯類,作為環氧聚合物與(甲基)丙烯酸的反應產物的環氧丙烯酸酯類等多官能的丙烯酸酯或甲基丙烯酸酯及該等的混合物。 Examples thereof include monofunctional acrylates or methacrylates such as polyethylene glycol mono(meth)acrylate, polypropylene glycol mono(meth)acrylate, and phenoxyethyl (meth)acrylate; Ethylene glycol di(meth)acrylate, trimethylolethane tri(meth)acrylate, neopentyl glycol di(meth)acrylate, pentaerythritol tri(meth)acrylate, pentaerythritol tetra(a) Acrylate, dipentaerythritol penta (meth) acrylate, dipenta Tetraol hexa(meth) acrylate, hexane diol (meth) acrylate, trimethylolpropane tris(propylene methoxy propyl) ether, isomeric cyanuric acid tris(propylene oxy oxyethyl) An ester, a polyfunctional alcohol such as glycerin or trimethylolethane, which is added with ethylene oxide or propylene oxide and then (meth)acrylated; Japanese Patent Publication No. Sho 48-41708, Japanese Patent (Meth)acrylic acid urethanes as described in each of the Japanese Patent Laid-Open Publication No. SHO-51-37193, Japanese Patent Laid-Open Publication No. SHO-48-64183, Japanese Patent Publication No. Sho 49-43191 A polyester acrylate described in each of Japanese Patent Publication No. Sho 52-30490, a polyfunctional acrylate or methyl group such as an epoxy acrylate which is a reaction product of an epoxy polymer and (meth)acrylic acid. Acrylate and mixtures of these.

其中,聚合性化合物較佳為伸乙氧基改質季戊四醇四丙烯酸酯(市售品為NK酯(NK Ester)ATM-35E;新中村化學公司製造)、二季戊四醇三丙烯酸酯(市售品為卡亞拉得(KAYARAD)D-330;日本化藥股份有限公司製造)、二季戊四醇四丙烯酸酯(市售品為卡亞拉得(KAYARAD)D-320;日本化藥股份有限公司製造)、二季戊四醇五(甲基)丙烯酸酯(市售品為卡亞拉得(KAYARAD)D-310;日本化藥股份有限公司製造)、二季戊四醇六(甲基)丙烯酸酯(市售品為卡亞拉得(KAYARAD)DPHA;日本化藥股份有限公司製造)、及該等的(甲基)丙烯醯基介隔乙二醇殘基、丙二醇殘基的結構。另外,亦可使用該等的寡聚物型。 Among them, the polymerizable compound is preferably an ethoxylated modified pentaerythritol tetraacrylate (commercially available as NK Ester ATM-35E; manufactured by Shin-Nakamura Chemical Co., Ltd.) and dipentaerythritol triacrylate (commercially available) KAYARAD D-330; manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol tetraacrylate (commercially available as KAYARAD D-320; manufactured by Nippon Kayaku Co., Ltd.), Dipentaerythritol penta (meth) acrylate (commercial product is KAYARAD D-310; manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol hexa(meth) acrylate (commercial product is Kaya) KAYARAD DPHA; manufactured by Nippon Kayaku Co., Ltd., and the structure of these (meth)acryloyl group-separated ethylene glycol residues and propylene glycol residues. In addition, these oligomer types can also be used.

聚合性化合物亦可列舉多官能(甲基)丙烯酸酯等,所述多官能(甲基)丙烯酸酯是使(甲基)丙烯酸縮水甘油酯等具有環狀醚基及 乙烯性不飽和基的化合物與多官能羧酸反應而獲得。 Examples of the polymerizable compound include a polyfunctional (meth) acrylate having a cyclic ether group such as glycidyl (meth)acrylate and the like. A compound of an ethylenically unsaturated group is obtained by reacting with a polyfunctional carboxylic acid.

另外,其他較佳的聚合性單體等亦可使用:日本專利特開2010-160418、日本專利特開2010-129825、日本專利4364216等中記載的具有茀環且具有二官能以上的乙烯性聚合性基的化合物,卡多(cardo)聚合物。 In addition, other preferred polymerizable monomers and the like may be used in an ethylene polymerization having an anthracene ring and having a difunctional or higher content as described in JP-A-2010-160418, JP-A-2010-129825, and Japanese Patent No. 4,364,216. A compound based on a cardo polymer.

另外,於常壓下具有100℃以上的沸點、且具有至少一個可進行加成聚合的乙烯性不飽和基的化合物亦較佳為日本專利特開2008-292970號公報的段落編號[0254]~段落編號[0257]中記載的化合物。 Further, a compound having a boiling point of 100 ° C or higher and having at least one ethylenically unsaturated group capable of undergoing addition polymerization under normal pressure is also preferably a paragraph number [0254] of JP-A-2008-292970. The compound described in paragraph No. [0257].

另外,日本專利特開平10-62986號公報中作為通式(1)及通式(2)而與其具體例一併記載的於所述多官能醇上加成環氧乙烷或環氧丙烷後加以(甲基)丙烯酸酯化而成的化合物亦可用作聚合性單體。 In addition, in the case of adding an ethylene oxide or a propylene oxide to the polyfunctional alcohol described in the general formula (1) and the general formula (2) together with the specific examples, Japanese Patent Publication No. Hei 10-62986 A compound obtained by esterifying (meth) acrylate can also be used as a polymerizable monomer.

本發明中所用的聚合性單體更佳為下述通式(MO-1)~通式(MO-6)所表示的聚合性單體。 The polymerizable monomer used in the present invention is more preferably a polymerizable monomer represented by the following formula (MO-1) to formula (MO-6).

(式中,n分別為0~14,m分別為1~8。於一分子內存在多個的R、T及Z可分別相同,亦可不同。於T為氧伸烷基的情形時,碳原子側的末端鍵結於R。R中的至少一個為聚合性基) (wherein, n is 0~14, respectively, and m is 1~8. A plurality of R, T, and Z in one molecule may be the same or different. When T is an oxygen-extended alkyl group, The end of the carbon atom side is bonded to R. At least one of R is a polymerizable group)

n較佳為0~5,更佳為1~3。 n is preferably 0 to 5, more preferably 1 to 3.

m較佳為1~5,更佳為1~3。 m is preferably from 1 to 5, more preferably from 1 to 3.

R較佳為以下四個結構。 R is preferably the following four structures.

R較佳為所述四個結構中的以下兩個結構。 R is preferably the following two of the four structures.

關於所述通式(MO-1)~通式(MO-6)所表示的自由基聚合性單體的具體例,亦可將日本專利特開2007-269779號公報的段落編號0248~段落編號0251中記載的化合物較佳地用於本發明中。 Specific examples of the radical polymerizable monomer represented by the above formula (MO-1) to (MO-6) may be given in paragraph number 0248 to paragraph number of JP-A-2007-269779. The compound described in 0251 is preferably used in the present invention.

其中,聚合性單體等可列舉日本專利特開2012-208494 號公報段落0477(對應的美國專利申請公開第2012/0235099號說明書的[0585])中記載的聚合性單體等,將該些內容併入至本申請案說明書中。另外,較佳為二甘油環氧乙烷(Ethylene Oxide,EO)改質(甲基)丙烯酸酯(市售品為M-460;東亞合成製造)。亦較佳為季戊四醇四丙烯酸酯(新中村化學製造,A-TMMT)、1,6-己二醇二丙烯酸酯(日本化藥公司製造,卡亞拉得(KAYARAD)HDDA)。亦可使用該等的寡聚物型。 Among them, polymerizable monomers and the like can be cited as Japanese Patent Laid-Open No. 2012-208494 Polymerizable monomers and the like described in Paragraph 0477 (corresponding to U.S. Patent Application Publication No. 2012/0235099, the entire disclosure of which is incorporated herein by reference). Further, Ethylene Oxide (EO) modified (meth) acrylate (commercially available as M-460; manufactured by Toago Seisakusho Co., Ltd.) is preferred. Also preferred is pentaerythritol tetraacrylate (manufactured by Shin-Nakamura Chemical Co., Ltd., A-TMMT), 1,6-hexanediol diacrylate (manufactured by Nippon Kayaku Co., Ltd., KAYARAD HDDA). These oligomer types can also be used.

例如可列舉RP-1040(日本化藥股份有限公司製造)等。 For example, RP-1040 (made by Nippon Kayaku Co., Ltd.) or the like can be mentioned.

聚合性單體等亦可為多官能單體,且亦可具有羧基、磺 酸基、磷酸基等酸基。因此,乙烯性化合物只要如上文所述為混合物的情形般具有未反應的羧基,則可直接利用,視需要亦可使非芳香族羧酸酐與所述乙烯性化合物的羥基反應而導入酸基。於該情形時,所使用的非芳香族羧酸酐的具體例可列舉:四氫鄰苯二甲酸酐、烷基化四氫鄰苯二甲酸酐、六氫鄰苯二甲酸酐、烷基化六氫鄰苯二甲酸酐、琥珀酸酐、馬來酸酐。 The polymerizable monomer or the like may also be a polyfunctional monomer, and may also have a carboxyl group or a sulfonate. An acid group such as an acid group or a phosphoric acid group. Therefore, the ethylene compound may be used as it is in the case of a mixture as described above, and may be used as it is, and if necessary, a non-aromatic carboxylic anhydride may be reacted with a hydroxyl group of the ethylenic compound to introduce an acid group. In this case, specific examples of the non-aromatic carboxylic anhydride to be used include tetrahydrophthalic anhydride, alkylated tetrahydrophthalic anhydride, hexahydrophthalic anhydride, and alkylated six. Hydrogen phthalic anhydride, succinic anhydride, maleic anhydride.

於本發明中,具有酸基的單體為脂肪族多羥基化合物與 不飽和羧酸的酯,較佳為使非芳香族羧酸酐與脂肪族多羥基化合物的未反應的羥基反應而具有酸基的多官能單體,尤佳為於其酯中,脂肪族多羥基化合物為季戊四醇及/或二季戊四醇。市售品例如可列舉:東亞合成股份有限公司製造的作為多元酸改質丙烯酸系寡聚物的亞羅尼斯(Aronix)系列的M-305、M-510、M-520等。 In the present invention, the monomer having an acid group is an aliphatic polyhydroxy compound and The ester of an unsaturated carboxylic acid is preferably a polyfunctional monomer having an acid group by reacting a non-aromatic carboxylic anhydride with an unreacted hydroxyl group of an aliphatic polyhydroxy compound, and particularly preferably an aliphatic polyhydroxy group in the ester thereof. The compound is pentaerythritol and/or dipentaerythritol. For example, M-305, M-510, M-520, etc. of the Aronix series which are polybasic acid-modified acrylic oligomer manufactured by the East Asia Synthetic Co., Ltd. are mentioned.

具有酸基的多官能單體的較佳酸值為0.1mg-KOH/g~40mg-KOH/g,尤佳為5mg-KOH/g~30mg-KOH/g。於併用兩種以上的酸基不同的多官能單體的情形、或併用不具有酸基的多官能單體的情形時,較佳為以多官能單體總體的酸值在所述範圍內的方式製備。 The preferred acid value of the polyfunctional monomer having an acid group is from 0.1 mg-KOH/g to 40 mg-KOH/g, and more preferably from 5 mg-KOH/g to 30 mg-KOH/g. In the case where a polyfunctional monomer having two or more acid groups is used in combination, or a combination of a polyfunctional monomer having no acid group, it is preferred that the acid value of the entire polyfunctional monomer is within the range Method of preparation.

另外,較佳為含有具有己內酯改質結構的多官能性單量體作為聚合性單體等。 Further, a polyfunctional monolith having a modified structure of caprolactone is preferably used as a polymerizable monomer or the like.

具有己內酯改質結構的多官能性單量體只要於其分子內具有己內酯改質結構,則並無特別限定。例如具有己內酯改質結構的多官能性單量體可列舉ε-己內酯改質多官能(甲基)丙烯酸酯,該ε- 己內酯改質多官能(甲基)丙烯酸酯是藉由將三羥甲基乙烷、二-三羥甲基乙烷、三羥甲基丙烷、二-三羥甲基丙烷、季戊四醇、二季戊四醇、三季戊四醇、甘油(glycerine)、二甘油(diglycerol)、三羥甲基三聚氰胺等多元醇與(甲基)丙烯酸及ε-己內酯加以酯化而獲得。其中,較佳為下述式(20)所表示的具有己內酯改質結構的多官能性單量體。 The polyfunctional monomer having a modified structure of caprolactone is not particularly limited as long as it has a caprolactone-modified structure in its molecule. For example, a polyfunctional monolith having a modified structure of caprolactone may be exemplified by ε-caprolactone-modified polyfunctional (meth) acrylate, which ε- Caprolactone modified polyfunctional (meth) acrylate by trimethylolethane, di-trimethylolethane, trimethylolpropane, di-trimethylolpropane, pentaerythritol, two Polyols such as pentaerythritol, tripentaerythritol, glycerine, diglycerol, and trimethylol melamine are obtained by esterification with (meth)acrylic acid and ε-caprolactone. Among them, a polyfunctional mono-weight having a caprolactone modified structure represented by the following formula (20) is preferred.

(式中,6個R全部為下述式(21)所表示的基團,或6個R中的1個~5個為下述式(21)所表示的基團,其餘為下述式(22)所表示的基團) (In the formula, all of the six R groups are groups represented by the following formula (21), or one to five of the six R groups are groups represented by the following formula (21), and the rest are the following formulas; (22) the group indicated)

(式中,R1表示氫原子或甲基,m表示1或2的數,「*」表示結合鍵) (wherein R 1 represents a hydrogen atom or a methyl group, m represents a number of 1 or 2, and "*" represents a bond)

(式中,R1表示氫原子或甲基,「*」表示結合鍵) (wherein R 1 represents a hydrogen atom or a methyl group, and "*" represents a bond)

此種具有己內酯改質結構的多官能性單量體例如是由日本化藥(股)作為卡亞拉得(KAYARAD)DPCA系列而市售,可列舉:DPCA-20(所述式(20)~式(22)中m=1、式(21)所表示的基團的個數=2、R1全部為氫原子的化合物)、DPCA-30(所述式(20)~式(22)中m=1、式(21)所表示的基團的個數=3、R1全部為氫原子的化合物)、DPCA-60(所述式(20)~式(22)中m=1、式(21)所表示的基團的個數=6、R1全部為氫原子的化合物)、DPCA-120(所述式(20)~式(22)中m=2、式(21)所表示的基團的個數=6、R1全部為氫原子的化合物)等。 Such a polyfunctional monolith having a modified structure of caprolactone is commercially available, for example, as a KAYARAD DPCA series from Nippon Kayaku Co., Ltd., and may be exemplified by DPCA-20 (the formula ( 20), where m = 1 in the formula (22), the number of groups represented by the formula (21) = 2, and all compounds in which R 1 is a hydrogen atom), DPCA-30 (the formula (20) to the formula (20) 22) m = 1, the number of groups represented by the formula (21) = 3, a compound in which all R 1 are a hydrogen atom), DPCA-60 (m = in the formula (20) to the formula (22) 1. The number of groups represented by the formula (21) = 6, the compound in which all of R 1 is a hydrogen atom), DPCA-120 (m=2 in the formula (20) to the formula (22), and the formula (21) The number of groups represented by the formula = 6 and the compound in which all of R 1 is a hydrogen atom).

於本發明中,具有己內酯改質結構的多官能性單量體可單獨使用或混合使用兩種以上。 In the present invention, the polyfunctional monothomer having a modified structure of caprolactone may be used alone or in combination of two or more.

聚合性單體等市售品例如可列舉:沙多瑪(Sartomer)公司製造的具有4個伸乙氧基鏈的四官能丙烯酸酯SR-494,日本化藥股份有限公司製造的具有6個伸戊氧基鏈的六官能丙烯酸酯DPCA-60、具有3個伸異丁氧基鏈的三官能丙烯酸酯TPA-330等。 A commercially available product such as a polymerizable monomer is, for example, a tetrafunctional acrylate SR-494 having four ethylene glycol chains manufactured by Sartomer Co., Ltd., and six extensions manufactured by Nippon Kayaku Co., Ltd. A pentyloxy chain hexafunctional acrylate DPCA-60, a trifunctional acrylate TPA-330 having three isobutoxy chain extensions, and the like.

<<具有環氧基或氧雜環丁基的化合物>> <<Compounds having an epoxy group or an oxetanyl group>>

本發明的第三較佳態樣為含有具有環氧基或氧雜環丁基的化合物作為聚合性化合物的態樣。具有環氧基或氧雜環丁基的化合物具體而言有於側鏈中具有環氧基的聚合物、及分子內具有2個以上的環氧基的聚合性單體或寡聚物,可列舉:雙酚A型環氧樹脂、雙酚F型環氧樹脂、苯酚酚醛清漆型環氧樹脂、甲酚酚醛清漆型環氧樹脂、脂肪族環氧樹脂等。另外,亦可列舉單官能或多官能縮水甘油醚化合物,較佳為多官能脂肪族縮水甘油醚化合物。 A third preferred embodiment of the present invention is a form containing a compound having an epoxy group or an oxetanyl group as a polymerizable compound. The compound having an epoxy group or an oxetanyl group specifically has a polymer having an epoxy group in a side chain and a polymerizable monomer or oligomer having two or more epoxy groups in the molecule. Listed: bisphenol A type epoxy resin, bisphenol F type epoxy resin, phenol novolak type epoxy resin, cresol novolak type epoxy resin, aliphatic epoxy resin, and the like. Further, a monofunctional or polyfunctional glycidyl ether compound is preferred, and a polyfunctional aliphatic glycidyl ether compound is preferred.

該些化合物可使用市售品,亦可藉由對聚合物的側鏈導入環氧基而獲得。 These compounds can be used as a commercial product, and can also be obtained by introducing an epoxy group to a side chain of a polymer.

市售品例如可參考日本專利特開2012-155288號公報段落0191等的記載,將該些內容併入至本申請案說明書中。 For the commercial product, for example, the description of Japanese Patent Laid-Open Publication No. 2012-155288, paragraph 0191, and the like can be incorporated into the specification of the present application.

另外,市售品可列舉:代那考爾(Denacol)EX-212L、代那考爾(Denacol)EX-214L、代那考爾(Denacol)EX-216L、代那考爾(Denacol)EX-321L、代那考爾(Denacol)EX-850L(以上為長瀨化成(Nagase Chemtex)(股)製造)等多官能脂肪族縮水甘油醚化合物。該些化合物為低氯品,亦可同樣地使用並非低氯品的代那考爾(Denacol)EX-212、代那考爾(Denacol)EX-214、代那考爾(Denacol)EX-216、代那考爾(Denacol)EX-321、代那考爾(Denacol)EX-850等。 Further, commercially available products include: Denacol EX-212L, Denacol EX-214L, Denacol EX-216L, and Denacol EX- 321L, a polyfunctional aliphatic glycidyl ether compound such as Denacol EX-850L (above, manufactured by Nagase Chemtex). These compounds are low-chlorine products, and Denacol EX-212, Denacol EX-214, and Denacol EX-216 which are not low-chlorine products can be similarly used. , Denacol EX-321, Denacol EX-850, etc.

除此以外,亦可列舉:艾迪科樹脂(ADEKA RESIN)EP-4000S、艾迪科樹脂(ADEKA RESIN)EP-4003S、艾迪科樹脂(ADEKA RESIN)EP-4010S、艾迪科樹脂(ADEKA RESIN) EP-4011S(以上為艾迪科(ADEKA)(股)製造)、NC-2000、NC-3000、NC-7300、XD-1000、EPPN-501、EPPN-502(以上為艾迪科(ADEKA)(股)製造)、JER1031S等。 In addition, ADEKA RESIN EP-4000S, ADEKA RESIN EP-4003S, ADEKA RESIN EP-4010S, Adeco resin (ADEKA) RESIN) EP-4011S (above is made by ADEKA), NC-2000, NC-3000, NC-7300, XD-1000, EPPN-501, EPPN-502 (above ADEKA) (share) manufacturing), JER1031S, etc.

進而,苯酚酚醛清漆型環氧樹脂的市售品可列舉JER-157S65、JER-152、JER-154、JER-157S70(以上為三菱化學(股)製造)等。 Further, commercially available products of the phenol novolac type epoxy resin include JER-157S65, JER-152, JER-154, and JER-157S70 (the above are manufactured by Mitsubishi Chemical Corporation).

於側鏈中具有氧雜環丁基的聚合物、及所述分子內具有 2個以上的氧雜環丁基的聚合性單體或寡聚物的具體例可使用:亞龍氧雜環丁烷(Aron Oxetane)OXT-121、亞龍氧雜環丁烷(Aron Oxetane)OXT-221、亞龍氧雜環丁烷(Aron Oxetane)OX-SQ、亞龍氧雜環丁烷(Aron Oxetane)PNOX(以上為東亞合成(股)製造)。 a polymer having an oxetanyl group in a side chain, and having the intramolecular Specific examples of the polymerizable monomer or oligomer of two or more oxetanyl groups can be used: Aron Oxetane OXT-121, Aron Oxetane OXT-221, Aron Oxetane OX-SQ, Aron Oxetane PNOX (above manufactured by East Asia Synthetic Co., Ltd.).

分子量以重量平均計而為500~5000000,更佳為1000~500000的範圍。 The molecular weight is from 500 to 5,000,000, more preferably from 1,000 to 500,000 on a weight basis.

環氧不飽和化合物亦可使用(甲基)丙烯酸縮水甘油酯或烯丙基縮水甘油醚等具有縮水甘油基作為環氧基的化合物,較佳為具有脂環式環氧基的不飽和化合物。此種化合物例如可參考日本專利特開2009-265518號公報段落0045等的記載,將該些內容併入至本申請案說明書中。 As the epoxy unsaturated compound, a compound having a glycidyl group as an epoxy group such as glycidyl (meth)acrylate or allyl glycidyl ether may be used, and an unsaturated compound having an alicyclic epoxy group is preferred. Such a compound can be referred to, for example, the description of Japanese Patent Laid-Open Publication No. 2009-265518, paragraph 0045, and the like.

本發明的組成物亦可含有具有不飽和雙鍵、環氧基或氧雜環丁基等交聯基的聚合體。具體可列舉含有下述重複單元的聚合體(共聚體)。含有下述重複單元的聚合體較佳為具有環氧基的 聚合體。 The composition of the present invention may also contain a polymer having a crosslinking group such as an unsaturated double bond, an epoxy group or an oxetanyl group. Specifically, a polymer (interpolymer) containing the following repeating unit can be mentioned. The polymer having the following repeating unit is preferably an epoxy group. Polymer.

<<具有式(30)所表示的部分結構的化合物>> <<Compound having partial structure represented by formula (30)>>

本發明中所用的硬化性化合物亦可具有下述式(30)所表示的部分結構。該硬化性化合物亦可具有不飽和雙鍵、環氧基或氧雜環丁基等交聯基。 The curable compound used in the present invention may have a partial structure represented by the following formula (30). The curable compound may have a crosslinking group such as an unsaturated double bond, an epoxy group or an oxetanyl group.

(式(30)中,R1表示氫原子或有機基) (In the formula (30), R 1 represents a hydrogen atom or an organic group)

式(30)中,R1表示氫原子或有機基。有機基可列舉烴基、具體而言為烷基或芳基,較佳為碳數為1~20的烷基、碳數為6~20的芳基、或包含該些基團與二價連結基的組合的基團。 In the formula (30), R 1 represents a hydrogen atom or an organic group. The organic group may, for example, be a hydrocarbon group, specifically an alkyl group or an aryl group, preferably an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 20 carbon atoms, or a group containing the divalent linking group. The group of the combination.

此種有機基的具體例較佳為-OR'、-SR'、或包含該些基團與-(CH2)m-(m為1~10的整數)、碳數5~10的環狀的伸烷基、-O-、-CO-、-COO-及-NH-的至少一個的組合的基團。此處,R'較佳為氫原子、碳數為1~10的直鏈、碳數為3~10的分支或環狀的烷基(較佳為碳數1~7的直鏈的烷基、碳數3~7的分支或環狀的烷基)、碳數為6~10的芳基、或包含碳數為6~10的芳基與碳數為1~10的伸烷基的組合的基團。 Specific examples of such an organic group are preferably -OR', -SR', or a ring containing the group and -(CH 2 ) m - (m is an integer of 1 to 10) and having a carbon number of 5 to 10. a group of a combination of at least one of an alkyl group, -O-, -CO-, -COO-, and -NH-. Here, R' is preferably a hydrogen atom, a linear chain having a carbon number of 1 to 10, a branched or cyclic alkyl group having 3 to 10 carbon atoms (preferably a linear alkyl group having 1 to 7 carbon atoms). a combination of a branched or cyclic alkyl group having 3 to 7 carbon atoms, an aryl group having 6 to 10 carbon atoms, or an alkyl group having 6 to 10 carbon atoms and an alkylene group having 1 to 10 carbon atoms Group.

另外,所述式(30)中,R1與C亦可鍵結而形成環結構(雜環結構)。雜環結構中的雜原子為所述式(30)中的氮原子。雜環結構較佳為5員環或6員環結構,更佳為5員環結構。雜環結構亦可為縮合環,較佳為單環。 Further, in the formula (30), R 1 and C may be bonded to each other to form a ring structure (heterocyclic structure). The hetero atom in the heterocyclic structure is the nitrogen atom in the formula (30). The heterocyclic structure is preferably a 5-membered ring or a 6-membered ring structure, more preferably a 5-membered ring structure. The heterocyclic structure may also be a condensed ring, preferably a single ring.

尤佳的R1的具體例可列舉:氫原子、碳數1~3的烷基、包含-OR'(R'為碳數為1~5的直鏈烷基)與-(CH2)m-(m為1~10的整數,較佳為m為1~5的整數)的組合的基團、所述式(30)中的R1與C鍵結而形成雜環結構(較佳為5員環結構)的基團。 Specific examples of the preferable R 1 include a hydrogen atom, an alkyl group having 1 to 3 carbon atoms, and -OR'(R' is a linear alkyl group having 1 to 5 carbon atoms) and -(CH 2 ) m a group in which (m is an integer of 1 to 10, preferably m is an integer of 1 to 5), and R 1 and C in the formula (30) are bonded to each other to form a heterocyclic ring structure (preferably a 5-membered ring structure).

具有所述式(30)所表示的部分結構的化合物較佳為由(聚合體的主鏈結構-所述(30)的部分結構-R1)所表示,或由(A-所述(30)的部分結構-B)所表示。此處,A為碳數為1~10的 直鏈烷基、碳數為3~10的分支烷基或碳數為3~10的環狀烷基。另外,B為包含-(CH2)m-(m為1~10的整數,較佳為m為1~5的整數)、所述(30)的部分結構及聚合性基的組合的基團。 The compound having the partial structure represented by the formula (30) is preferably represented by (the main chain structure of the polymer - the partial structure of the (30) - R 1 ), or by (A-the (30) Part of the structure - B). Here, A is a linear alkyl group having 1 to 10 carbon atoms, a branched alkyl group having 3 to 10 carbon atoms, or a cyclic alkyl group having 3 to 10 carbon atoms. Further, B is a group containing -(CH 2 ) m - (m is an integer of 1 to 10, preferably m is an integer of 1 to 5), a combination of the partial structure (30) and a polymerizable group. .

另外,具有所述式(30)所表示的部分結構的化合物可列舉下述式(1-1)~式(1-5)的任一個所表示的結構。 In addition, the compound having a partial structure represented by the above formula (30) may have a structure represented by any one of the following formulas (1-1) to (1-5).

(式(1-1)中,R4表示氫原子或甲基,R5及R6分別獨立地表示氫原子或有機基。式(1-2)中,R7表示氫原子或甲基。式(1-3)中,L1表示二價連結基,R8表示氫原子或有機基。式(1-4)中,L2及L3分別獨立地表示二價連結基,R9及R10分別獨立地表示氫原子或有機基。式(1-5)中,L4表示二價連結基,R11~R14分別獨立地表示氫原子或有機基) (In the formula (1-1), R 4 represents a hydrogen atom or a methyl group, and R 5 and R 6 each independently represent a hydrogen atom or an organic group. In the formula (1-2), R 7 represents a hydrogen atom or a methyl group. In the formula (1-3), L 1 represents a divalent linking group, and R 8 represents a hydrogen atom or an organic group. In the formula (1-4), L 2 and L 3 each independently represent a divalent linking group, and R 9 and R 10 each independently represents a hydrogen atom or an organic group. In the formula (1-5), L 4 represents a divalent linking group, and R 11 to R 14 each independently represent a hydrogen atom or an organic group)

所述式(1-1)中,R5及R6分別獨立地表示氫原子或有機基。有機基與所述式(30)中的R1為相同含意,較佳範圍亦相同。 In the formula (1-1), R 5 and R 6 each independently represent a hydrogen atom or an organic group. The organic group has the same meaning as R 1 in the formula (30), and the preferred range is also the same.

所述式(1-3)~式(1-5)中,L1~L4表示二價連結基。二價 連結基較佳為包含-(CH2)m-(m為1~10的整數)、碳數5~10的環狀的伸烷基與-O-、-CO-、-COO-及-NH-的至少一個的組合的基團,更佳為-(CH2)m-(m為1~8的整數)。 In the formulae (1-3) to (1-5), L 1 to L 4 represent a divalent linking group. The divalent linking group preferably comprises -(CH 2 ) m - (m is an integer of 1 to 10), a cyclic alkyl group having 5 to 10 carbon atoms, and -O-, -CO-, -COO- and A combination group of at least one of -NH- is more preferably -(CH 2 ) m - (m is an integer of from 1 to 8).

所述式(1-3)~式(1-5)中,R8~R14分別獨立地表示氫原子或有機基。有機基較佳為烴基,具體而言為烷基或烯基。 In the formulae (1-3) to (1-5), R 8 to R 14 each independently represent a hydrogen atom or an organic group. The organic group is preferably a hydrocarbon group, specifically an alkyl group or an alkenyl group.

烷基亦可經取代。另外,烷基可為鏈狀、分支狀、環狀的任一種,較佳為直鏈狀或環狀的烷基。烷基較佳為碳數1~10的烷基,更佳為碳數1~8的烷基,更佳為碳數1~6的烷基。 Alkyl groups can also be substituted. Further, the alkyl group may be in the form of a chain, a branch or a ring, and is preferably a linear or cyclic alkyl group. The alkyl group is preferably an alkyl group having 1 to 10 carbon atoms, more preferably an alkyl group having 1 to 8 carbon atoms, more preferably an alkyl group having 1 to 6 carbon atoms.

烯基亦可經取代。烯基較佳為碳數1~10的烯基,更佳為碳數1~4的烯基,尤佳為乙烯基。 Alkenyl groups can also be substituted. The alkenyl group is preferably an alkenyl group having 1 to 10 carbon atoms, more preferably an alkenyl group having 1 to 4 carbon atoms, and particularly preferably a vinyl group.

取代基例如可例示:聚合性基、鹵素原子、烷基、羧酸酯基、鹵化烷基、烷氧基、甲基丙烯醯氧基、丙烯醯氧基、醚基、磺醯基、硫醚基、醯胺基、醯基、羥基、羧基等。該些取代基中,較佳為聚合性基(例如乙烯基、(甲基)丙烯醯氧基)、(甲基)丙烯醯基、環氧基、氮丙啶基等,更佳為乙烯基。 The substituent may, for example, be a polymerizable group, a halogen atom, an alkyl group, a carboxylate group, a halogenated alkyl group, an alkoxy group, a methacryloxy group, an acryloxy group, an ether group, a sulfonyl group, a thioether. Base, guanamine, sulfhydryl, hydroxy, carboxyl, and the like. Among these substituents, a polymerizable group (e.g., a vinyl group, a (meth) propylene fluorenyloxy group), a (meth) acryl fluorenyl group, an epoxy group, an aziridine group or the like is preferable, and a vinyl group is more preferable. .

另外,具有所述式(30)所表示的部分結構的化合物可 為單體亦可為聚合物,較佳為聚合物。即,具有所述式(30)所表示的部分結構的化合物較佳為所述式(1-1)或所述式(1-2)所表示的化合物。 In addition, the compound having the partial structure represented by the formula (30) may The monomer may also be a polymer, preferably a polymer. That is, the compound having the partial structure represented by the formula (30) is preferably a compound represented by the above formula (1-1) or the formula (1-2).

另外,於具有所述式(30)所表示的部分結構的化合物為聚合物的情形時,較佳為於聚合物的側鏈中含有所述部分結構。 Further, in the case where the compound having the partial structure represented by the formula (30) is a polymer, it is preferred to contain the partial structure in the side chain of the polymer.

具有所述式(30)所表示的部分結構的化合物的分子量 較佳為50~1000000,更佳為500~500000。藉由設定為此種分子量,可更有效地達成本發明的效果。 Molecular weight of a compound having a partial structure represented by the formula (30) It is preferably 50 to 1,000,000, more preferably 500 to 500,000. By setting such a molecular weight, the effects of the present invention can be more effectively achieved.

於本發明的組成物中,具有所述(30)所表示的部分結構的化合物的含量較佳為5質量%~80質量%,更佳為10質量%~60質量%。 In the composition of the present invention, the content of the compound having the partial structure represented by the above (30) is preferably from 5% by mass to 80% by mass, more preferably from 10% by mass to 60% by mass.

具有所述式(30)所表示的部分結構的化合物的具體例 可列舉具有下述結構的化合物或下述例示化合物,但不限定於該些化合物。本發明中,尤佳為具有所述式(30)所表示的部分結構的化合物為聚丙烯醯胺。 Specific examples of the compound having the partial structure represented by the formula (30) The compound having the following structure or the following exemplified compound may be mentioned, but it is not limited to these compounds. In the present invention, a compound having a partial structure represented by the above formula (30) is preferably a polyacrylamide.

另外,具有所述式(30)所表示的部分結構的化合物的 具體例可列舉水溶性聚合物,較佳的主鏈結構可列舉:聚乙烯基吡咯啶酮、聚(甲基)丙烯醯胺、聚醯胺、聚乙烯基吡咯啶酮、聚胺 基甲酸酯、聚脲。水溶性聚合物亦可為共聚體,共聚體亦可為無規共聚體。 Further, a compound having a partial structure represented by the formula (30) Specific examples thereof include water-soluble polymers, and preferred main chain structures include polyvinylpyrrolidone, poly(meth)acrylamide, polyamine, polyvinylpyrrolidone, and polyamine. Carbamate, polyurea. The water soluble polymer may also be a copolymer, and the interpolymer may also be a random interpolymer.

聚乙烯基吡咯啶酮可使用商品名K-30、K-85、K-90、K-30W、K-85W、K-90W(日本觸媒公司製造)。 As the polyvinylpyrrolidone, trade names K-30, K-85, K-90, K-30W, K-85W, and K-90W (manufactured by Nippon Shokubai Co., Ltd.) can be used.

聚(甲基)丙烯醯胺可列舉(甲基)丙烯醯胺的聚合體、共 聚體。丙烯醯胺的具體例可列舉:丙烯醯胺、N-甲基丙烯醯胺、N-乙基丙烯醯胺、N-丙基丙烯醯胺、N-丁基丙烯醯胺、N-苄基丙烯醯胺、N-羥基乙基丙烯醯胺、N-苯基丙烯醯胺、N-甲苯基丙烯醯胺、N-(羥基苯基)丙烯醯胺、N-(胺磺醯基苯基)丙烯醯胺、N-(苯基磺醯基)丙烯醯胺、N-(甲苯基磺醯基)丙烯醯胺、N,N-二甲基丙烯醯胺、N-甲基-N-苯基丙烯醯胺、N-羥基乙基-N-甲基丙烯醯胺等。另外,亦可同樣地使用與該些化合物相對應的甲基丙烯醯胺。 The poly(meth) acrylamide may, for example, be a polymer of (meth) acrylamide. Polymer. Specific examples of the acrylamide include acrylamide, N-methyl acrylamide, N-ethyl acrylamide, N-propyl acrylamide, N-butyl acrylamide, N-benzyl propylene. Indoleamine, N-hydroxyethyl acrylamide, N-phenyl acrylamide, N-tolyl acrylamide, N-(hydroxyphenyl) acrylamide, N-(amine sulfonylphenyl) propylene Indoleamine, N-(phenylsulfonyl) acrylamide, N-(methylsulfonyl) acrylamide, N,N-dimethyl decylamine, N-methyl-N-phenyl propylene Indoleamine, N-hydroxyethyl-N-methylpropenylamine, and the like. Further, methacrylamide corresponding to these compounds can also be used in the same manner.

水溶性聚醯胺樹脂尤其可列舉聚醯胺樹脂與親水性化 合物共聚合而成的化合物。所謂水溶性聚醯胺樹脂的衍生物,例如是指以水溶性聚醯胺樹脂作為原料、且醯胺鍵(-CONH-)的氫原子經甲氧基甲基(-CH2OCH3)取代的化合物般,藉由水溶性聚醯胺樹脂分子中的原子經取代或進行加成反應,而醯胺鍵的結構變化而成的化合物。 The water-soluble polyamine resin may, for example, be a compound obtained by copolymerizing a polyamine resin with a hydrophilic compound. The derivative of the water-soluble polyamine resin means, for example, a water-soluble polyamine resin as a raw material, and a hydrogen atom of a guanamine bond (-CONH-) is substituted by a methoxymethyl group (-CH 2 OCH 3 ). A compound obtained by changing the structure of a guanamine bond by substitution or addition reaction of an atom in a water-soluble polyamine resin molecule.

聚醯胺樹脂例如可列舉:由ω胺基酸的聚合所合成的所謂「n-尼龍」或由二胺與二羧酸的共聚合所合成的所謂「n,m-尼龍」。其中,就賦予親水性的觀點而言,較佳為二胺與二羧酸的共聚體,更佳為ε-己內醯胺與二羧酸的反應產物。 The polyamine resin may, for example, be a so-called "n-nylon" synthesized by polymerization of an ω-amino acid or a so-called "n, m-nylon" synthesized by copolymerization of a diamine and a dicarboxylic acid. Among them, from the viewpoint of imparting hydrophilicity, a copolymer of a diamine and a dicarboxylic acid is preferred, and a reaction product of ε-caprolactam and a dicarboxylic acid is more preferred.

親水性化合物可列舉親水性含氮環狀化合物、聚伸烷基二醇等。 Examples of the hydrophilic compound include a hydrophilic nitrogen-containing cyclic compound, a polyalkylene glycol, and the like.

此處,所謂親水性含氮環狀化合物,是指於側鏈或主鏈中具有三級胺成分的化合物,且例如可列舉:胺基乙基哌嗪、雙胺基丙基哌嗪、α-二甲基胺基-ε-己內醯胺等。 Here, the hydrophilic nitrogen-containing cyclic compound means a compound having a tertiary amine component in a side chain or a main chain, and examples thereof include an aminoethyl piperazine, a bisaminopropyl piperazine, and α. -Dimethylamino-ε-caprolactam and the like.

另一方面,聚醯胺樹脂與親水性化合物進行共聚合而成的化合物中,因於聚醯胺樹脂的主鏈上例如共聚合有選自由親水性含氮環狀化合物及聚伸烷基二醇所組成的組群中的至少一種,故聚醯胺樹脂的醯胺鍵部的氫鍵結能力大於N-甲氧基甲基化尼龍。 On the other hand, in the compound obtained by copolymerizing a polyamine resin with a hydrophilic compound, for example, a copolymerization of a polyamine-containing resin has a hydrophilic nitrogen-containing cyclic compound and a polyalkylene group. At least one of the groups consisting of alcohols, the hydrogen bond ability of the guanamine bond of the polyamide resin is greater than that of the N-methoxymethylated nylon.

於聚醯胺樹脂與親水性化合物進行共聚合而成的化合物中,較佳為1)ε-己內醯胺與親水性含氮環狀化合物與二羧酸的反應產物、及2)ε-己內醯胺與聚伸烷基二醇與二羧酸的反應產物。 Among the compounds obtained by copolymerizing a polyamine resin with a hydrophilic compound, 1) is a reaction product of ε-caprolactam with a hydrophilic nitrogen-containing cyclic compound and a dicarboxylic acid, and 2) ε- The reaction product of caprolactam and a polyalkylene glycol with a dicarboxylic acid.

該些化合物例如是由東麗精密技術(Toray Finetech)(股)以「AQ尼龍」的商標而市售。ε-己內醯胺與親水性含氮環狀化合物與二羧酸的反應產物可作為東麗精密技術(Toray Finetech)(股)製造的AQ尼龍A-90而獲取,ε-己內醯胺與聚伸烷基二醇與二羧酸的反應產物可作為東麗精密技術(Toray Finetech)(股)製造的AQ尼龍P-70而獲取。可使用AQ尼龍A-90、AQ尼龍P-70、AQ尼龍P-95、AQ尼龍T-70(東麗公司製造)。 These compounds are commercially available, for example, from Toray Finetech Co., Ltd. under the trademark "AQ Nylon". The reaction product of ε-caprolactam and a hydrophilic nitrogen-containing cyclic compound and a dicarboxylic acid can be obtained as AQ nylon A-90 manufactured by Toray Finetech Co., Ltd., ε-caprolactam The reaction product with the polyalkylene glycol and the dicarboxylic acid can be obtained as AQ nylon P-70 manufactured by Toray Finetech Co., Ltd. AQ nylon A-90, AQ nylon P-70, AQ nylon P-95, and AQ nylon T-70 (manufactured by Toray Industries, Inc.) can be used.

含有具有所述式(30)所表示的部分結構的重複單元與具有環氧基的重複單元的聚合體的莫耳比較佳為10/90~90/10,更佳為30/70~70/30。所述共聚體的重量平均分子量較佳為3,000 ~1,000,000,更佳為5,000~200,000。 The molar containing the repeating unit having the partial structure represented by the formula (30) and the repeating unit having an epoxy group is preferably from 10/90 to 90/10, more preferably from 30/70 to 70/. 30. The weight average molecular weight of the copolymer is preferably 3,000. ~1,000,000, more preferably 5,000~200,000.

相對於除了溶劑以外的總固體成分,本發明的組成物中的聚合性化合物的含量較佳為1質量%~90質量%,更佳為15質量%~80質量%,尤佳為40質量%~75質量%。 The content of the polymerizable compound in the composition of the present invention is preferably from 1% by mass to 90% by mass, more preferably from 15% by mass to 80% by mass, even more preferably 40% by mass, based on the total solid content other than the solvent. ~75% by mass.

另外,於使用含有具有交聯基的重複單元的聚合體作為聚合性化合物的情形時,較佳為相對於除了溶劑以外的本發明的組成物的總固體成分而為10質量%~75質量%,更佳為20質量%~65質量%,尤佳為20質量%~60質量%。 In the case where a polymer containing a repeating unit having a crosslinking group is used as the polymerizable compound, it is preferably 10% by mass to 75% by mass based on the total solid content of the composition of the present invention other than the solvent. More preferably, it is 20% by mass to 65% by mass, and particularly preferably 20% by mass to 60% by mass.

聚合性化合物可僅為一種,亦可為兩種以上,於為兩種以上的情形時,合計量成為所述範圍。 The number of the polymerizable compounds may be one or two or more. When two or more types are used, the total amount is in the above range.

<黏合聚合物> <adhesive polymer>

於本發明的組成物中,為了提高皮膜特性等,視需要除了所述聚合性化合物以外可更含有黏合聚合物。黏合聚合物可較佳地使用鹼可溶性樹脂。藉由含有鹼可溶性樹脂,於耐熱性等的提高或塗佈適正的微調整方面有效。 In order to improve film properties and the like, the composition of the present invention may further contain a binder polymer in addition to the polymerizable compound. As the binder polymer, an alkali-soluble resin can be preferably used. By containing an alkali-soluble resin, it is effective in the improvement of heat resistance, etc., or the fine adjustment of a coating.

鹼可溶性樹脂可參考日本專利特開2012-208494號公報的段落0558~段落0571(對應的美國專利申請公開第2012/0235099號說明書的[0685]~[0700])以後的記載,將該些內容併入至本申請案說明書中。 The content of the alkali-soluble resin can be referred to in the following paragraphs 0558 to 5571 of the Japanese Patent Application Laid-Open No. 2012-208494 (corresponding to U.S. Patent Application Publication No. 2012/0235099; Incorporated into the specification of the present application.

於本發明的組成物含有黏合聚合物的情形時,相對於組成物的總固體成分,黏合聚合物的含量較佳為1質量%~80質量%,更佳為5質量%~50質量%,進而佳為7質量%~30質量%。 When the composition of the present invention contains a binder polymer, the content of the binder polymer is preferably from 1% by mass to 80% by mass, more preferably from 5% by mass to 50% by mass, based on the total solid content of the composition. Further preferably, it is 7 mass% to 30 mass%.

<界面活性劑> <Surfactant>

本發明的組成物亦可含有界面活性劑。界面活性劑可僅使用一種,亦可組合兩種以上。相對於本發明的組成物的固體成分,界面活性劑的添加量較佳為0.0001質量%~2質量%,更佳為0.005質量%~1.0質量%,進而佳為0.01質量%~0.1質量%。 The composition of the present invention may also contain a surfactant. The surfactant may be used alone or in combination of two or more. The amount of the surfactant added is preferably 0.0001% by mass to 2% by mass, more preferably 0.005% by mass to 1.0% by mass, even more preferably 0.01% by mass to 0.1% by mass based on the solid content of the composition of the present invention.

界面活性劑可使用:氟系界面活性劑、非離子系界面活性劑、陽離子系界面活性劑、陰離子系界面活性劑、矽酮系界面活性劑等各種界面活性劑。 As the surfactant, various surfactants such as a fluorine-based surfactant, a nonionic surfactant, a cationic surfactant, an anionic surfactant, and an anthrone-based surfactant can be used.

尤其本發明的組成物藉由含有氟系界面活性劑及矽酮 系界面活性劑的至少任一種,於製備成塗佈液時的溶液特性(特別是流動性)進一步提高。藉此進一步改善塗佈厚度的均勻性或省液性。 In particular, the composition of the present invention contains a fluorine-based surfactant and an anthrone. At least one of the surfactants is further improved in solution characteristics (particularly fluidity) when it is prepared as a coating liquid. Thereby, the uniformity of the coating thickness or the liquid-saving property is further improved.

即,於使用應用含有氟系界面活性劑及矽酮系界面活性劑的至少任一種的組成物的塗佈液來進行膜形成的情形時,藉由使被塗佈面與塗佈液的界面張力減小,對被塗佈面的濡濕性得到改善,對被塗佈面的塗佈性提高。因此,即便於以少量的液量來形成幾微米(μm)左右的薄膜的情形時,亦可更佳地進行厚度不均小的均勻厚度的膜形成,就此方面而言有效。 In other words, when a film is formed by using a coating liquid containing a composition containing at least one of a fluorine-based surfactant and an anthrone-based surfactant, the interface between the surface to be coated and the coating liquid is used. The tension is reduced, the wettability to the surface to be coated is improved, and the coatability to the surface to be coated is improved. Therefore, even when a film having a thickness of about several micrometers (μm) is formed with a small amount of liquid, it is possible to more preferably form a film having a uniform thickness having a small thickness unevenness, which is effective in this respect.

氟系界面活性劑中的氟含有率較佳為3質量%~40質量 %,更佳為5質量%~30質量%,尤佳為7質量%~25質量%。氟含有率為該範圍內的氟系界面活性劑於塗佈膜的厚度的均勻性或省液性的方面有效,於著色感光性組成物中的溶解性亦良好。 The fluorine content in the fluorine-based surfactant is preferably from 3% by mass to 40% by mass. % is more preferably 5% by mass to 30% by mass, particularly preferably 7% by mass to 25% by mass. The fluorine-containing surfactant is effective in the uniformity of the thickness of the coating film or the liquid-saving property in the fluorine-based surfactant, and the solubility in the colored photosensitive composition is also good.

氟系界面活性劑具體可列舉日本專利特開2012-208494號公報段落0552(對應的美國專利申請公開第2012/0235099號說明書的[0678])等中記載的界面活性劑,將該些內容併入至本申請案說明書中。 Specific examples of the fluorine-based surfactant include those described in JP-A-2012-208494, paragraph 0552 (corresponding to U.S. Patent Application Publication No. 2012/0235099, the disclosure of Enter the specification of this application.

非離子系界面活性劑可列舉:聚氧伸乙基烷基醚、聚氧伸乙基烷基烯丙醚、聚氧伸乙基脂肪酸酯、山梨醇酐脂肪酸酯、聚氧伸乙基山梨醇酐脂肪酸酯、聚氧伸乙基烷基胺、甘油脂肪酸酯、氧伸乙氧基伸丙基嵌段共聚物、乙炔二醇系界面活性劑、乙炔系聚氧環氧乙烷等。該些非離子系界面活性劑可單獨使用或使用兩種以上。 Examples of the nonionic surfactant include polyoxyethylene ethyl ether, polyoxyethylene ethyl allylate, polyoxyethyl alcohol ester, sorbitan fatty acid ester, and polyoxyethyl ether. Sorbitan fatty acid ester, polyoxyethylene ethylamine, glycerin fatty acid ester, oxygen ethoxylated propyl block copolymer, acetylene glycol surfactant, acetylene polyoxyethylene oxide, etc. . These nonionic surfactants may be used alone or in combination of two or more.

具體的商品名可列舉:蘇菲諾(Surfynol)61、蘇菲諾(Surfynol)82、蘇菲諾(Surfynol)104、蘇菲諾(Surfynol)104E、蘇菲諾(Surfynol)104H、蘇菲諾(Surfynol)104A、蘇菲諾(Surfynol)104BC、蘇菲諾(Surfynol)104DPM、蘇菲諾(Surfynol)104PA、蘇菲諾(Surfynol)104PG-50、蘇菲諾(Surfynol)104S、蘇菲諾(Surfynol)420、蘇菲諾(Surfynol)440、蘇菲諾(Surfynol)465、蘇菲諾(Surfynol)485、蘇菲諾(Surfynol)504、蘇菲諾(Surfynol)CT-111、蘇菲諾(Surfynol)CT-121、蘇菲諾(Surfynol)CT-131、蘇菲諾(Surfynol)CT-136、蘇菲諾(Surfynol)CT-141、蘇菲諾(Surfynol)CT-151、蘇菲諾(Surfynol)CT-171、蘇菲諾(Surfynol)CT-324、蘇菲諾(Surfynol)DF-37、蘇菲諾(Surfynol)DF-58、蘇菲諾(Surfynol)DF-75、蘇菲諾(Surfynol)DF-110D、蘇菲諾 (Surfynol)DF-210、蘇菲諾(Surfynol)GA、蘇菲諾(Surfynol)OP-340、蘇菲諾(Surfynol)PSA-204、蘇菲諾(Surfynol)PSA-216、蘇菲諾(Surfynol)PSA-336、蘇菲諾(Surfynol)SE、蘇菲諾(Surfynol)SE-F、蘇菲諾(Surfynol)TG、蘇菲諾(Surfynol)GA、戴諾(Dynol)604(以上為日信化學(股)及空氣化工產品(Air Products & Chemicals)公司),奧路菲(Olfine)A、奧路菲(Olfine)B、奧路菲(Olfine)AK-02、奧路菲(Olfine)CT-151W、奧路菲(Olfine)E1004、奧路菲(Olfine)E1010、奧路菲(Olfine)P、奧路菲(Olfine)SPC、奧路菲(Olfine)STG、奧路菲(Olfine)Y、奧路菲(Olfine)32W、奧路菲(Olfine)PD-001、奧路菲(Olfine)PD-002W、奧路菲(Olfine)PD-003、奧路菲(Olfine)PD-004、奧路菲(Olfine)EXP.4001、奧路菲(Olfine)EXP.4036、奧路菲(Olfine)EXP.4051、奧路菲(Olfine)AF-103、奧路菲(Olfine)AF-104、奧路菲(Olfine)SK-14、奧路菲(Olfine)AE-3(以上為日信化學(股)),阿塞迪諾(Acetylenol)E00、阿塞迪諾(Acetylenol)E13T、阿塞迪諾(Acetylenol)E40、阿塞迪諾(Acetylenol)E60、阿塞迪諾(Acetylenol)E81、阿塞迪諾(Acetylenol)E100、阿塞迪諾(Acetylenol)E200(以上全部為商品名,川研精化(股)公司製造)等。其中,較佳為奧路菲(Olfine)E1010。 Specific trade names can be listed as: Surfynol 61, Surfynol 82, Surfynol 104, Surfynol 104E, Surfynol 104H, Sophino (Surfynol) 104A, Surfynol 104BC, Surfynol 104DPM, Surfynol 104PA, Surfynol 104PG-50, Surfynol 104S, Suffolk (Surfynol) 420, Surfynol 440, Surfynol 465, Surfynol 485, Surfynol 504, Surfynol CT-111, Sophino (Surfynol) CT-121, Surfynol CT-131, Surfynol CT-136, Surfynol CT-141, Surfynol CT-151, Suffolk (Surfynol) CT-171, Surfynol CT-324, Surfynol DF-37, Surfynol DF-58, Surfynol DF-75, Suffino (Surfynol) DF-110D, Sofino (Surfynol) DF-210, Surfynol GA, Surfynol OP-340, Surfynol PSA-204, Surfynol PSA-216, Surfynol ) PSA-336, Surfynol SE, Surfynol SE-F, Surfynol TG, Surfynol GA, Dynol 604 (above) Chemicals and Air Products & Chemicals), Olfine A, Olfine B, Olfine AK-02, Olfine CT -151W, Olfine E1004, Olfine E1010, Olfine P, Olfine SPC, Olfine STG, Olfine Y , Olfine 32W, Olfine PD-001, Olfine PD-002W, Olfine PD-003, Olfine PD-004, Austria Olfine EXP.4001, Olfine EXP.4036, Olfine EXP. 4051, Olfine AF-103, Olfine AF-104, Austria Olfine SK-14, Olfine AE-3 (above is Nisshin Chemical Co., Ltd.), Acetylenol E00, Acetylenol E13T, Arcedi (Acetylenol) E40, Acetylenol E60, Acetylenol E81, Acetylenol E100, Acetylenol E200 (all above are trade names, Chuanyanjing (manufactured by the company) and so on. Among them, Olfine E1010 is preferred.

此外,非離子系界面活性劑具體可列舉日本專利特開2012-208494號公報的段落0553(對應的美國專利申請公開第 2012/0235099號說明書的[0679])等中記載的非離子系界面活性劑,將該些內容併入至本申請案說明書中。 Further, the nonionic surfactant may specifically be described in paragraph 0553 of Japanese Patent Laid-Open Publication No. 2012-208494 (corresponding U.S. Patent Application Publication No. The nonionic surfactant described in [0679] of the specification of 2012/0235099, etc., is incorporated in the specification of the present application.

陽離子系界面活性劑具體可列舉日本專利特開2012-208494號公報的段落0554(對應的美國專利申請公開第2012/0235099號說明書的[0680])中記載的陽離子系界面活性劑,將該些內容併入至本申請案說明書中。 Specific examples of the cation-based surfactant include the cationic surfactant described in paragraph 0554 of the Japanese Patent Application Laid-Open No. 2012-208494 (the corresponding US Patent Application Publication No. 2012/0235099 [0680]). The content is incorporated into the specification of the present application.

陰離子系界面活性劑具體可列舉W004、W005、W017(裕商(股)公司製造)等。 Specific examples of the anionic surfactant include W004, W005, and W017 (manufactured by Yusei Co., Ltd.).

矽酮系界面活性劑例如可列舉日本專利特開 2012-208494號公報的段落0556(對應的美國專利申請公開第2012/0235099號說明書的[0682])等中記載的矽酮系界面活性劑,將該些內容併入至本申請案說明書中。另外,亦可例示:東麗.道康寧(Toray-Dow corning)(股)製造的「東麗矽酮(Toray Silicone)SF8410」、「東麗矽酮(Toray Silicone)SF8427」、「東麗矽酮(Toray Silicone)SH8400」、「東麗矽酮(Toray Silicone)ST80PA」、「東麗矽酮(Toray Silicone)ST83PA」、「東麗矽酮(Toray Silicone)ST86PA」,邁圖高新材料(Momentive Performance Materials)公司製造的「TSF-400」、「TSF-401」、「TSF-410」、「TSF-4446」,信越矽酮股份有限公司製造的「KP321」、「KP323」、「KP324」、「KP340」等。 Examples of the anthrone-based surfactants include Japanese Patent Laid-Open The anthrone-based surfactant described in paragraph 0556 of the Japanese Patent Application Laid-Open No. 2012/0235099, the entire disclosure of which is incorporated herein by reference. In addition, it can also be illustrated: Toray. "Toray Silicone SF8410", "Toray Silicone SF8427", "Toray Silicone SH8400", "East" manufactured by Toray-Dow Corning Co., Ltd. Toray Silicone ST80PA, Toray Silicone ST83PA, Toray Silicone ST86PA, and TSF-400 manufactured by Momentive Performance Materials ""TSF-401", "TSF-410", "TSF-4446", "KP321", "KP323", "KP324", "KP340" manufactured by Shin-Etsu Chemical Co., Ltd., etc.

<聚合起始劑> <Polymerization initiator>

本發明的組成物亦可含有聚合起始劑。聚合起始劑只要具有 藉由光、熱的任一者或其兩者來引發聚合性化合物的聚合的能力,則並無特別限制,可根據目的而適當選擇,較佳為光聚合性化合物。於利用光來引發聚合的情形時,較佳為對紫外線範圍至可見光線具有感光性者。 The composition of the present invention may also contain a polymerization initiator. The polymerization initiator has only The ability to initiate polymerization of the polymerizable compound by either light or heat or both is not particularly limited, and may be appropriately selected depending on the intended purpose, and is preferably a photopolymerizable compound. In the case where light is used to initiate polymerization, it is preferred to have a sensitivity to ultraviolet light to visible light.

另外,於利用熱來引發聚合的情形時,較佳為於150℃~250℃下分解的聚合起始劑。 Further, in the case where polymerization is initiated by heat, a polymerization initiator which decomposes at 150 ° C to 250 ° C is preferred.

本發明中可使用的聚合起始劑較佳為至少具有芳香族 基的化合物,例如可列舉:醯基膦化合物、苯乙酮系化合物、α-胺基酮化合物、二苯甲酮系化合物、安息香醚系化合物、縮酮衍生物化合物、噻噸酮化合物、肟化合物、六芳基聯咪唑化合物、三鹵甲基化合物、偶氮化合物、有機過氧化物、重氮化合物、錪化合物、鋶化合物、吖嗪鎓化合物、安息香醚系化合物、縮酮衍生物化合物、茂金屬化合物等鎓鹽化合物、有機硼鹽化合物、二碸化合物、硫醇化合物等。 The polymerization initiator which can be used in the present invention preferably has at least an aromatic Examples of the compound of the group include a mercaptophosphine compound, an acetophenone compound, an α-aminoketone compound, a benzophenone compound, a benzoin ether compound, a ketal derivative compound, a thioxanthone compound, and an anthracene. a compound, a hexaarylbiimidazole compound, a trihalomethyl compound, an azo compound, an organic peroxide, a diazo compound, an anthraquinone compound, an anthraquinone compound, an oxazine compound, a benzoin ether compound, a ketal derivative compound, An onium salt compound such as a metallocene compound, an organic boron salt compound, a diterpene compound, a thiol compound, or the like.

苯乙酮系化合物、三鹵甲基化合物、六芳基聯咪唑化合物、肟化合物具體可參考日本專利特開2012-208494號公報的段落0506~段落0510(對應的美國專利申請公開第2012/0235099號說明書的[0622~0628])等的記載,將該些內容併入至本申請案說明書中。 The acetophenone-based compound, the trihalomethyl compound, the hexaarylbiimidazole compound, and the hydrazine compound can be specifically referred to the paragraph 0506 to paragraph 0510 of the Japanese Patent Laid-Open Publication No. 2012-208494 (corresponding U.S. Patent Application Publication No. 2012/0235099 The contents of the specification [0622 to 0628] and the like are incorporated in the specification of the present application.

另外,亦可較佳地使用日本專利特開2007-231000公報(對應的美國專利申請公開第2011/0123929號說明書)、及日本專利特開2007-322744公報中記載的環狀肟化合物。 In addition, a cyclic ruthenium compound described in Japanese Patent Laid-Open Publication No. 2007-231000 (the corresponding U.S. Patent Application Publication No. 2011/0123929) and the Japanese Patent Publication No. 2007-322744.

除此以外,亦可列舉日本專利特開2007-269779公報(對應的美國專利申請公開第2010/0104976號說明書)中所示的具有特定取代基的肟化合物、或日本專利特開2009-191061公報(對應的美國專利申請公開第2009/023085號說明書)中所示的具有硫代芳基的肟化合物。 In addition, an antimony compound having a specific substituent as shown in Japanese Patent Laid-Open Publication No. Hei. No. 2007-269779 (corresponding U.S. Patent Application Publication No. 2010/0104976), or Japanese Patent Laid-Open Publication No. 2009-191061 An antimony compound having a thioaryl group as shown in the corresponding U.S. Patent Application Publication No. 2009/023085.

可參考日本專利特開2012-208494號公報的段落0513(對應的美國專利申請公開第2012/235099號說明書的[0632])以後的式(OX-1)、式(OX-2)或式(OX-3)所表示的化合物的說明,將該些內容併入至本申請案說明書中。 Reference may be made to the formula (OX-1), the formula (OX-2) or the formula (After the [0632] of the specification of the corresponding US Patent Application Publication No. 2012/235099) of JP-A-2012-208494. The description of the compounds represented by OX-3) is incorporated into the specification of the present application.

另外,較佳地使用的肟化合物的具體例可參考日本專利特開2009-191061公報的段落0090~段落0106(對應的美國專利申請公開第2009/023085號說明書的段落0393)、日本專利特開2012-032556號公報的段落0054、日本專利特開2012-122045號公報的段落0054等的記載,將該些內容併入至本申請案說明書中。 Further, a specific example of the ruthenium compound which is preferably used can be referred to paragraph 0090 to paragraph 0106 of the Japanese Patent Laid-Open Publication No. 2009-191061 (paragraph 0039 of the specification of the corresponding US Patent Application Publication No. 2009/023085), Japanese Patent Laid-Open The description of paragraph 0054 of JP-A-2012-032556, paragraph 0054 of JP-A-2012-122045, and the like is incorporated herein by reference.

光聚合起始劑較佳為肟化合物、苯乙酮系化合物或醯基膦化合物。更具體而言,例如亦可使用日本專利特開平10-291969號公報中記載的胺基苯乙酮系起始劑、日本專利第4225898號公報中記載的醯基膦氧化物系起始劑、及所述肟系起始劑,進而肟系起始劑亦可使用日本專利特開2001-233842號公報中記載的化合物。 The photopolymerization initiator is preferably an anthracene compound, an acetophenone-based compound or a mercaptophosphine compound. More specifically, for example, an amino acetophenone-based initiator described in JP-A-10-291969, and a mercaptophosphine oxide-based initiator described in Japanese Patent No. 4,258,899 can be used. Further, the oxime-based initiator and the oxime-based initiator may be those described in JP-A-2001-233842.

肟化合物可使用作為市售品的易璐佳(IRGACURE)-OXE 01(巴斯夫(BASF)公司製造)、易璐佳(IRGACURE)-OXE 02(巴 斯夫(BASF)公司製造)。苯乙酮系起始劑可使用作為市售品的易璐佳(IRGACURE)-907、易璐佳(IRGACURE)-369及易璐佳(IRGACURE)-379(商品名,均為日本巴斯夫(BASF Japan)公司製造)。另外,醯基膦系起始劑可使用作為市售品的易璐佳(IRGACURE)-819或達羅卡(DAROCUR)-TPO(商品名,均為日本巴斯夫(BASF Japan)公司製造)。 The hydrazine compound can be used as a commercially available product (IRGACURE)-OXE 01 (manufactured by BASF), IRGACURE-OXE 02 (bar) Made by BASF). As the acetophenone-based initiator, IRGACURE-907, IRGACURE-369, and IRGACURE-379 (trade names, all of which are BASF Japan) can be used as a commercial product. Japan) manufactured by the company). Further, as the mercaptophosphine-based initiator, IRGACURE-819 or DAROCUR-TPO (trade name, all manufactured by BASF Japan Co., Ltd.) can be used as a commercial product.

相對於本發明的組成物的固體成分,聚合起始劑的含量較佳為0.01質量%~30質量%,更佳為0.1質量%~20質量%,尤佳為0.1質量%~15質量%。聚合起始劑可僅為一種,亦可為兩種以上,於為兩種以上的情形時,合計量成為所述範圍。 The content of the polymerization initiator is preferably 0.01% by mass to 30% by mass, more preferably 0.1% by mass to 20% by mass, even more preferably 0.1% by mass to 15% by mass based on the solid content of the composition of the present invention. The polymerization initiator may be used alone or in combination of two or more. In the case of two or more types, the total amount is in the above range.

<其他成分> <Other ingredients>

本發明的組成物中可併用的其他成分例如可列舉:分散劑、增感劑、交聯劑、硬化促進劑、填料、熱硬化促進劑、熱聚合抑制劑、塑化劑等,進而亦可併用對基材表面的密接促進劑及其他助劑類(例如導電性粒子、填充劑、消泡劑、阻燃劑、勻平劑、剝離促進劑、抗氧化劑、香料、表面張力調整劑、鏈轉移劑等)。 Examples of other components which can be used in combination in the composition of the present invention include a dispersant, a sensitizer, a crosslinking agent, a curing accelerator, a filler, a thermosetting accelerator, a thermal polymerization inhibitor, a plasticizer, and the like. And use the adhesion promoter on the surface of the substrate and other additives (such as conductive particles, fillers, defoamers, flame retardants, leveling agents, peeling accelerators, antioxidants, perfumes, surface tension modifiers, chains Transfer agent, etc.).

藉由適當含有該些成分,可調整目標近紅外線吸收濾波器的穩定性、膜物性等性質。 By appropriately containing these components, properties such as stability of the target near-infrared absorption filter and film physical properties can be adjusted.

該些成分例如可參考日本專利特開2012-003225號公報(對應的美國專利申請公開第2013/0034812)的段落編號0183~、日本專利特開2008-250074號公報的段落編號0101~段落編號0102、段落編號0103~段落編號0104及段落編號0107~段落編 號0109、日本專利特開2013-195480號公報的段落編號0159~段落編號0184等的記載,將該些內容併入至本申請案說明書中。 For the components, for example, paragraph number 0183~ of Japanese Patent Laid-Open Publication No. 2012-003225 (corresponding U.S. Patent Application Publication No. 2013/0034812), paragraph number 0101 to paragraph number 0102 of Japanese Patent Laid-Open Publication No. 2008-250074 , paragraph number 0103 ~ paragraph number 0104 and paragraph number 0107 ~ paragraph The description of paragraph number 0159 to paragraph number 0184 of Japanese Patent Laid-Open No. Hei. No. 2013-195480 is incorporated herein by reference.

<近紅外線吸收性組成物的製備、用途> <Preparation and use of near-infrared absorbing composition>

本發明的近紅外線吸收性組成物可將所述各成分混合而製備。 The near-infrared absorbing composition of the present invention can be prepared by mixing the above components.

於製備組成物時,可將構成組成物的各成分一次性調配,亦可將各成分溶解於有機溶劑並進行分散後逐次調配。另外,調配時的投入順序或作業條件不特別受限制。 In the preparation of the composition, the components constituting the composition may be formulated at once, or the components may be dissolved in an organic solvent and dispersed to be successively formulated. In addition, the order of input or the working conditions at the time of preparation are not particularly limited.

本發明中較佳為利用過濾器進行過濾來去除異物或減少缺陷等。只要為先前以來用於過濾用途等中者,則可無特別限定地使用過濾器。例如可列舉:聚四氟乙烯(Poly tetrafluoroethylene,PTFE)等氟樹脂、尼龍-6、尼龍-6,6等聚醯胺系樹脂、聚乙烯、聚丙烯(Poly Propylene,PP)等聚烯烴樹脂(包含高密度、超高分子量)等的過濾器。該些原材料中,較佳為聚丙烯(包含高密度聚丙烯)及尼龍。 In the present invention, it is preferred to perform filtration using a filter to remove foreign matter or to reduce defects and the like. The filter can be used without particular limitation as long as it has been used for filtration purposes or the like. For example, a fluororesin such as polytetrafluoroethylene (PTFE), a polyamine resin such as nylon-6 or nylon-6,6, or a polyolefin resin such as polyethylene or polypropylene (PP) may be mentioned ( A filter containing high density, ultra high molecular weight, etc. Among these raw materials, polypropylene (including high density polypropylene) and nylon are preferred.

過濾器的孔徑較佳為0.1μm~7.0μm,更佳為0.2μm~2.5μm,進而佳為0.2μm~1.5μm,進而更佳為0.3μm~0.7μm。藉由設定為該範圍,可抑制過濾堵塞且可將組成物中所含的雜質或凝聚物等微細的異物可靠地去除。 The pore diameter of the filter is preferably from 0.1 μm to 7.0 μm, more preferably from 0.2 μm to 2.5 μm, still more preferably from 0.2 μm to 1.5 μm, still more preferably from 0.3 μm to 0.7 μm. By setting it as this range, it is possible to suppress clogging of the filter, and it is possible to reliably remove fine foreign matter such as impurities or aggregates contained in the composition.

於使用過濾器時,亦可將不同的過濾器組合。此時,利用第1過濾器的過濾可僅進行1次,亦可進行2次以上。於將不同的過濾器組合而進行2次以上的過濾的情形時,較佳為第2次過濾以 後的孔徑與第1次過濾的孔徑相等,或大於第1次過濾的孔徑。 另外,亦可將於所述範圍內孔徑不同的第1過濾器組合。此處的孔徑可參照過濾器廠商(filter maker)的標稱值。市售的過濾器例如可自日本頗爾(Pall)股份有限公司、愛多邦得科東洋(Advantec Toyo)股份有限公司、日本英特格(Entegris)股份有限公司(原日本麥克麗思(Mykrolis)股份有限公司)或北澤微濾器(KITZ Micro Filter)股份有限公司等所提供的各種過濾器中選擇。 Different filters can also be combined when using filters. At this time, the filtration by the first filter may be performed only once or twice or more. In the case where two or more filters are combined by using different filters, it is preferred that the second filter is The subsequent pore size is equal to the pore size of the first filtration or larger than the pore diameter of the first filtration. Further, it is also possible to combine the first filters having different pore diameters within the above range. The aperture here can be referred to the nominal value of the filter maker. Commercially available filters are available, for example, from Pall Co., Ltd., Advantec Toyo Co., Ltd., and Entegris Co., Ltd. (formerly Japan's Mykrolis). )))) or various filters provided by KITZ Micro Filter Co., Ltd., etc.

第2過濾器可使用由與所述第1過濾器相同的材料等所形成者。第2過濾器的孔徑較佳為0.2μm~10.0μm,更佳為0.2μm~7.0μm,進而佳為0.3μm~6.0μm。藉由設定為該範圍,可於殘存組成物中所含有的成分粒子的狀態下去除異物。 The second filter can be formed of the same material or the like as the first filter. The pore diameter of the second filter is preferably 0.2 μm to 10.0 μm, more preferably 0.2 μm to 7.0 μm, still more preferably 0.3 μm to 6.0 μm. By setting it as this range, a foreign material can be removed in the state of the component particle contained in the residual composition.

本發明的近紅外線吸收性組成物的用途並無特別限 定,可列舉固體攝像元件的受光側的近紅外線截止濾波器(例如對晶圓級透鏡(wafer level lens)的近紅外線截止濾波器)、固體攝像元件的背面側(與受光側為相反側)的近紅外線截止濾波器等,較佳為固體攝像元件的受光側的近紅外線截止濾波器。另外,較佳為將本發明的近紅外線吸收性組成物直接塗佈於固體攝像元件上而形成塗膜。 The use of the near-infrared absorbing composition of the present invention is not particularly limited The near-infrared cut filter (for example, a near-infrared cut filter for a wafer level lens) on the light receiving side of the solid-state image sensor, and the back side of the solid-state image sensor (opposite to the light receiving side) The near-infrared cut filter or the like is preferably a near-infrared cut filter on the light receiving side of the solid-state image sensor. Further, it is preferred that the near-infrared absorbing composition of the present invention is directly applied onto a solid-state image sensor to form a coating film.

於藉由塗佈來形成紅外線截止層的情形時,本發明的近紅外線吸收性組成物的黏度較佳為在1mPa.s以上、3000mPa.s以下的範圍內,更佳為10mPa.s以上、2000mPa.s以下的範圍,進而佳 為100mPa.s以上、1500mPa.s以下的範圍。 When the infrared cut-off layer is formed by coating, the viscosity of the near-infrared absorbing composition of the present invention is preferably 1 mPa. Above s, 3000mPa. Within the range of s below, more preferably 10mPa. Above s, 2000mPa. s below the range, and thus better It is 100mPa. Above s, 1500mPa. s the following range.

本發明的組成物能以可塗佈的狀態供給,故可容易地於固體攝像元件的所需構件或位置上形成近紅外線截止濾波器。 Since the composition of the present invention can be supplied in a coatable state, a near-infrared cut filter can be easily formed on a desired member or position of the solid-state image sensor.

使用本發明的組成物所得的近紅外線截止濾波器較佳為光透射率滿足以下(1)~(9)中的至少一個條件,更佳為滿足以下的(1)~(8)的所有條件,進而佳為滿足(1)~(9)的所有條件。 The near-infrared cut filter obtained by using the composition of the present invention preferably has a light transmittance satisfying at least one of the following (1) to (9), and more preferably satisfying all of the following conditions (1) to (8). And then it satisfies all the conditions of (1)~(9).

(1)波長400nm下的光透射率較佳為80%以上,更佳為90%以上,進而佳為92%以上,尤佳為95%以上。 (1) The light transmittance at a wavelength of 400 nm is preferably 80% or more, more preferably 90% or more, further preferably 92% or more, and particularly preferably 95% or more.

(2)波長450nm下的光透射率較佳為80%以上,更佳為90%以上,進而佳為92%以上,尤佳為95%以上。 (2) The light transmittance at a wavelength of 450 nm is preferably 80% or more, more preferably 90% or more, further preferably 92% or more, and particularly preferably 95% or more.

(3)波長500nm下的光透射率較佳為80%以上,更佳為90%以上,進而佳為92%以上,尤佳為95%以上。 (3) The light transmittance at a wavelength of 500 nm is preferably 80% or more, more preferably 90% or more, further preferably 92% or more, and particularly preferably 95% or more.

(4)波長550nm下的光透射率較佳為80%以上,更佳為90%以上,進而佳為92%以上,尤佳為95%以上。 (4) The light transmittance at a wavelength of 550 nm is preferably 80% or more, more preferably 90% or more, further preferably 92% or more, and particularly preferably 95% or more.

(5)波長700nm下的光透射率較佳為20%以下,更佳為15%以下,進而佳為10%以下,尤佳為5%以下。 (5) The light transmittance at a wavelength of 700 nm is preferably 20% or less, more preferably 15% or less, further preferably 10% or less, and particularly preferably 5% or less.

(6)波長750nm下的光透射率較佳為20%以下,更佳為15%以下,進而佳為10%以下,尤佳為5%以下。 (6) The light transmittance at a wavelength of 750 nm is preferably 20% or less, more preferably 15% or less, further preferably 10% or less, and particularly preferably 5% or less.

(7)波長800nm下的光透射率較佳為20%以下,更佳為15%以下,進而佳為10%以下,尤佳為5%以下。 (7) The light transmittance at a wavelength of 800 nm is preferably 20% or less, more preferably 15% or less, further preferably 10% or less, and particularly preferably 5% or less.

(8)波長850nm下的光透射率較佳為20%以下,更佳為15% 以下,進而佳為10%以下,尤佳為5%以下。 (8) The light transmittance at a wavelength of 850 nm is preferably 20% or less, more preferably 15%. Hereinafter, it is preferably 10% or less, and particularly preferably 5% or less.

(9)波長900nm下的光透射率較佳為20%以下,更佳為15%以下,進而佳為10%以下,尤佳為5%以下。 (9) The light transmittance at a wavelength of 900 nm is preferably 20% or less, more preferably 15% or less, further preferably 10% or less, and particularly preferably 5% or less.

另外,近紅外線截止濾波器的光透射率較佳為波長450nm~500nm的整個範圍內的光透射率為95%以上。 Further, the light transmittance of the near-infrared cut filter is preferably 95% or more in the entire range of wavelengths of 450 nm to 500 nm.

近紅外線截止濾波器可根據目的而適當選擇,較佳為將膜厚設定為300μm以下,更佳為設定為250μm以下,進而佳為設定為200μm以下,尤佳為設定為100μm以下。膜厚的下限例如較佳為1μm以上,更佳為5μm以上,更佳為20μm以上。根據本發明的組成物,因具有高的近紅外線遮蔽性,故可使近紅外線截止濾波器的膜厚變薄。 The near-infrared cut filter can be appropriately selected depending on the purpose, and is preferably set to have a film thickness of 300 μm or less, more preferably set to 250 μm or less, further preferably set to 200 μm or less, and more preferably set to 100 μm or less. The lower limit of the film thickness is, for example, preferably 1 μm or more, more preferably 5 μm or more, and still more preferably 20 μm or more. According to the composition of the present invention, since the near-infrared shielding property is high, the film thickness of the near-infrared cut filter can be made thin.

近紅外線截止濾波器較佳為膜厚300μm以下、且波長400nm~550nm的整個範圍內的光透射率為85%以上,更佳為90%以上。另外,較佳為波長700nm~800nm的範圍的至少一波長下的光透射率為20%以下,進而佳為波長700nm~800nm的整個範圍內的光透射率為20%以下。根據本發明,可確保高透射率的可見光範圍廣,可提供一種具有高的近紅外線遮蔽性的近紅外線截止濾波器。 The near-infrared cut filter preferably has a light transmittance of 85% or more, and more preferably 90% or more in the entire range of a film thickness of 300 μm or less and a wavelength of 400 nm to 550 nm. Further, it is preferable that the light transmittance at at least one wavelength in the range of 700 nm to 800 nm is 20% or less, and preferably the light transmittance in the entire range of 700 nm to 800 nm is 20% or less. According to the present invention, it is possible to ensure a wide range of visible light with high transmittance, and it is possible to provide a near-infrared cut filter having high near-infrared shielding properties.

近紅外線截止濾波器可用於具有吸收.截止近紅外線的功能的透鏡(數位照相機或行動電話或車載照相機等照相機用透鏡、f-θ透鏡、拾取器透鏡(pick-up lens)等光學透鏡)及半導體受光元件用的光學濾波器、用於節能的阻斷熱線的近紅外線吸收濾波器 或近紅外線吸收板、以選擇性地利用太陽光為目的之農業用塗佈劑、利用近紅外線的吸收熱的記錄媒體、電子設備用或照片用近紅外線濾波器、防護眼鏡(safety goggles)、太陽鏡、熱線阻斷膜、光學文字讀取記錄、機密文件防影印用、電子照片感光體、雷射焊接等。另外,作為CCD照相機用雜訊截止濾波器、CMOS影像感測器用濾波器亦有用。 A near-infrared cut-off filter can be used to have absorption. A lens that cuts off the function of near-infrared rays (a digital camera, a camera lens such as a mobile phone or a car camera, an optical lens such as an f-θ lens or a pickup-up lens), and an optical filter for a semiconductor light-receiving element. Near-infrared absorption filter for energy-saving blocking hot line Or a near-infrared absorbing plate, an agricultural coating agent for selectively utilizing sunlight, a recording medium that absorbs heat by using near-infrared rays, a near-infrared filter for electronic equipment or photos, and safety goggles. Sunglasses, hot wire blocking film, optical text reading and recording, confidential document anti-photocopying, electronic photoreceptor, laser welding, etc. In addition, it is also useful as a noise cut filter for CCD cameras and a filter for CMOS image sensors.

本發明亦是有關於一種近紅外線截止濾波器的製造方 法,包括以下步驟:於固體攝像元件的受光側,應用(較佳為滴加法、塗佈或印刷)本發明的近紅外線吸收性組成物,藉此形成膜的步驟;以及進行乾燥的步驟。關於膜厚、積層結構等,可根據目的而適當選擇。 The invention also relates to a manufacturer of a near-infrared cut filter The method comprises the steps of: applying (preferably dropping, coating or printing) the near-infrared absorbing composition of the present invention to the light-receiving side of the solid-state image sensor, thereby forming a film; and performing a drying step. The film thickness, the laminate structure, and the like can be appropriately selected depending on the purpose.

應用本發明的組成物的支撐體可為包含玻璃等的透明基板,亦可為固體攝像元件,亦可為設置於固體攝像元件的受光側的其他基板,亦可為設置於固體攝像元件的受光側的平坦化層等層。 The support to which the composition of the present invention is applied may be a transparent substrate including glass or the like, or may be a solid-state image sensor, or may be another substrate provided on the light-receiving side of the solid-state image sensor, or may be received by a solid-state image sensor. A layer of a flattening layer on the side.

形成近紅外線截止濾波器的方法例如可藉由使用滴加法(滴鑄(drop cast))、旋塗機、狹縫旋塗機、狹縫塗佈機、網版印刷、敷料器塗佈等來實施。滴加法(滴鑄)的情況下,較佳為以既定的膜厚獲得均勻的膜的方式,於玻璃基板上形成以光阻劑為隔離壁的近紅外線吸收性組成物的滴加區域。再者,關於膜厚,可調整組成物的滴加量及固體成分濃度、滴加區域的面積。 The method of forming the near-infrared cut filter can be performed, for example, by using a drop method (drop cast), a spin coater, a slit spin coater, a slit coater, screen printing, applicator coating, or the like. Implementation. In the case of a dropping method (drop casting), it is preferred to form a dropping region of a near-infrared absorbing composition having a barrier as a partition wall on a glass substrate so as to obtain a uniform film with a predetermined film thickness. Further, regarding the film thickness, the amount of the composition to be dropped, the solid content concentration, and the area of the dropping region can be adjusted.

另外,塗膜的乾燥條件亦視各成分、溶劑的種類、使用比例等而不同,通常於60℃~150℃的溫度下乾燥30秒鐘~15分鐘左 右。 In addition, the drying conditions of the coating film vary depending on the components, the type of the solvent, the ratio of use, etc., and are usually dried at a temperature of 60 ° C to 150 ° C for 30 seconds to 15 minutes. right.

使用本發明的近紅外線吸收性組成物來形成近紅外線 截止濾波器的方法亦可包括其他步驟。其他步驟並無特別限制,可根據目的而適當選擇,例如可列舉基材的表面處理步驟、前加熱步驟(預烘烤步驟)、硬化處理步驟、後加熱步驟(後烘烤步驟)等。 Using the near-infrared absorbing composition of the present invention to form near infrared rays The method of cutting off the filter can also include other steps. The other steps are not particularly limited and may be appropriately selected depending on the purpose, and examples thereof include a surface treatment step of a substrate, a pre-heating step (pre-baking step), a hardening treatment step, a post-heating step (post-baking step), and the like.

<前加熱步驟.後加熱步驟> <Preheating step. Post heating step >

前加熱步驟及後加熱步驟中的加熱溫度通常為80℃~200℃,較佳為90℃~150℃。前加熱步驟及後加熱步驟中的加熱時間通常為30秒鐘~240秒鐘,較佳為60秒鐘~180秒鐘。 The heating temperature in the pre-heating step and the post-heating step is usually from 80 ° C to 200 ° C, preferably from 90 ° C to 150 ° C. The heating time in the pre-heating step and the post-heating step is usually from 30 seconds to 240 seconds, preferably from 60 seconds to 180 seconds.

<硬化處理步驟> <hardening treatment step>

硬化處理步驟為視需要對所形成的所述膜進行硬化處理的步驟,藉由進行該處理,近紅外線截止濾波器的機械強度提高。 The hardening treatment step is a step of hardening the formed film as needed, and by performing this treatment, the mechanical strength of the near-infrared cut filter is improved.

所述硬化處理步驟並無特別限制,可根據目的而適當選擇,例如可較佳地列舉整面曝光處理、整面加熱處理等。此處,本發明中所謂「曝光」是以如下含意使用:不僅包含各種波長的光,亦包含電子束、X射線等放射線的照射。 The hardening treatment step is not particularly limited and may be appropriately selected depending on the purpose. For example, a full-surface exposure treatment, a full-surface heat treatment, or the like can be preferably exemplified. Here, the "exposure" in the present invention is intended to include not only light of various wavelengths but also irradiation of radiation such as electron beams and X-rays.

曝光較佳為藉由放射線的照射來進行,曝光時可使用的放射線尤其可較佳地使用電子束、KrF、ArF、g射線、h射線、i射線等紫外線或可見光。 The exposure is preferably performed by irradiation of radiation, and ultraviolet rays or visible light such as an electron beam, KrF, ArF, g-ray, h-ray, or i-ray may be preferably used, particularly for radiation that can be used for exposure.

曝光方式可列舉步進機曝光或利用高壓水銀燈的曝光等。 The exposure method may be, for example, a stepper exposure or an exposure using a high pressure mercury lamp.

曝光量較佳為5mJ/cm2~3000mJ/cm2,更佳為10mJ/cm2~ 2000mJ/cm2,尤佳為50mJ/cm2~1000mJ/cm2The exposure amount is preferably 5 mJ/cm 2 to 3000 mJ/cm 2 , more preferably 10 mJ/cm 2 to 2000 mJ/cm 2 , and particularly preferably 50 mJ/cm 2 to 1000 mJ/cm 2 .

整面曝光處理的方法例如可列舉對所形成的所述膜的整個面進行曝光的方法。於近紅外線吸收性組成物含有聚合性化合物的情形時,藉由整面曝光,由所述組成物所形成的膜中的聚合成分的硬化受到促進,所述膜的硬化進一步進行,機械強度、耐久性得到改良。 The method of the entire surface exposure treatment may, for example, be a method of exposing the entire surface of the formed film. When the near-infrared absorbing composition contains a polymerizable compound, the curing of the polymer component in the film formed by the composition is promoted by the entire surface exposure, and the hardening of the film proceeds further, mechanical strength, Durability is improved.

進行所述整面曝光的裝置並無特別限制,可根據目的而適當選擇,例如可較佳地列舉超高壓水銀燈等UV曝光機。 The apparatus for performing the entire surface exposure is not particularly limited and may be appropriately selected depending on the purpose. For example, a UV exposure machine such as an ultrahigh pressure mercury lamp can be preferably used.

另外,整面加熱處理的方法可列舉對所形成的所述膜的整個面進行加熱的方法。藉由整面加熱,可提高圖案的膜強度。 Further, the method of heat treatment of the entire surface may be a method of heating the entire surface of the formed film. The film strength of the pattern can be increased by heating over the entire surface.

整面加熱的加熱溫度較佳為120℃~250℃,更佳為160℃~220℃。若加熱溫度為120℃以上,則藉由加熱處理而膜強度提高,若為250℃以下,則可防止所述膜中的成分發生分解而膜質變得又弱又脆的情況。 The heating temperature for the entire surface heating is preferably from 120 ° C to 250 ° C, more preferably from 160 ° C to 220 ° C. When the heating temperature is 120° C. or more, the film strength is improved by heat treatment, and when it is 250° C. or lower, the components in the film are prevented from being decomposed and the film quality is weak and brittle.

整面加熱的加熱時間較佳為3分鐘~180分鐘,更佳為5分鐘~120分鐘。 The heating time for the entire surface heating is preferably from 3 minutes to 180 minutes, more preferably from 5 minutes to 120 minutes.

進行整面加熱的裝置並無特別限制,可自公知的裝置中根據目的而適當選擇,例如可列舉乾式烘箱(dry oven)、加熱板(hot plate)、紅外線(Infrared,IR)加熱器等。 The apparatus for heating the entire surface is not particularly limited, and may be appropriately selected according to the purpose from known apparatuses, and examples thereof include a dry oven, a hot plate, and an infrared (IR) heater.

本發明的照相機模組具有固體攝像元件、及配置於固體 攝像元件的受光側的近紅外線截止濾波器,且近紅外線截止濾波器為上文所述的近紅外線截止濾波器。 The camera module of the present invention has a solid-state imaging element and is disposed on a solid A near-infrared cut filter on the light receiving side of the image pickup element, and a near infrared cut filter is the near infrared cut filter described above.

另外,本發明的照相機模組的製造方法製造具有固體攝像元件、及配置於固體攝像元件的受光側的近紅外線截止濾波器的照相機模組,並且所述照相機模組的製造方法包括以下步驟:於固體攝像元件的受光側塗佈所述本發明的近紅外線吸收性組成物,藉此形成膜。 Further, in the method of manufacturing a camera module of the present invention, a camera module having a solid-state image sensor and a near-infrared cut filter disposed on a light receiving side of the solid-state image sensor is manufactured, and the method of manufacturing the camera module includes the following steps: The near-infrared absorbing composition of the present invention is applied to the light-receiving side of the solid-state image sensor to form a film.

圖1為表示本發明的實施形態的具有近紅外線截止濾波器的照相機模組的構成的概略剖面圖。 1 is a schematic cross-sectional view showing a configuration of a camera module having a near-infrared cut filter according to an embodiment of the present invention.

照相機模組10例如具備固體攝像元件11、設置於固體攝像元件11上的平坦化層12、近紅外線截止濾波器13、及配置於近紅外線截止濾波器的上方且於內部空間中具有攝像透鏡14的透鏡固持器15。 The camera module 10 includes, for example, a solid-state imaging device 11 , a planarization layer 12 provided on the solid-state imaging device 11 , a near-infrared cut filter 13 , and an upper portion of the near-infrared cut filter, and an imaging lens 14 in the internal space. Lens holder 15.

照相機模組10中,來自外部的入射光hν依序透射攝像透鏡14、近紅外線截止濾波器13、平坦化層12後,到達固體攝像元件11的攝像元件部16。 In the camera module 10, the incident light hν from the outside is sequentially transmitted through the imaging lens 14, the near-infrared cut filter 13, and the planarization layer 12, and then reaches the imaging element portion 16 of the solid-state imaging device 11.

固體攝像元件11例如於作為基體的矽基板的主面上依序具備攝像元件部16、層間絕緣膜(未圖示)、基質層(未圖示)、彩色濾波器17、外塗層(未圖示)、微透鏡18。彩色濾波器17(紅色的彩色濾波器、綠色的彩色濾波器、藍色的彩色濾波器)或微透鏡18是以與攝像元件部16相對應的方式分別配置。 The solid-state imaging device 11 includes, for example, an imaging element portion 16, an interlayer insulating film (not shown), a substrate layer (not shown), a color filter 17, and an overcoat layer on the main surface of the ruthenium substrate as a substrate. Shown), microlens 18. The color filter 17 (a red color filter, a green color filter, a blue color filter) or the microlens 18 is disposed so as to correspond to the imaging element unit 16 .

另外,亦可為以下形態:代替於平坦化層12的表面上設置近紅外線截止濾波器13,而於微透鏡18的表面、基質層與彩色濾波器17之間、或彩色濾波器17與外塗層之間,設置近紅外線截止 濾波器13。例如,近紅外線截止濾波器13亦可設置於距微透鏡表面2mm以內(更佳為1mm以內)的位置。若設置於該位置,則形成近紅外線截止濾波器的步驟可簡化,可充分截止對微透鏡的不需要的近紅外線,故可進一步提高近紅外線遮蔽性。 Alternatively, the near-infrared cut filter 13 may be provided instead of the surface of the planarization layer 12, between the surface of the microlens 18, the matrix layer and the color filter 17, or the color filter 17 and the outside. Near-infrared cutoff between coatings Filter 13. For example, the near-infrared cut filter 13 may be disposed at a position within 2 mm (more preferably within 1 mm) from the surface of the microlens. When it is installed in this position, the step of forming the near-infrared cut filter can be simplified, and the unnecessary near-infrared rays to the microlens can be sufficiently cut off, so that the near-infrared shielding property can be further improved.

本發明的近紅外線截止濾波器可供於回焊(reflow solder)步驟。藉由利用回焊步驟來製造照相機模組,可實現必須進行焊接的電子零件安裝基板等的自動安裝化,與不使用回焊步驟的情形相比較,可格外地提高生產性。進而,由於可自動進行,故亦可實現低成本化。於供於回焊步驟的情形時,要暴露於250℃~270℃左右的溫度下,故紅外線截止濾波器較佳為具有可耐受回焊步驟的耐熱性(以下亦稱為「耐回焊性」)。 The near-infrared cut filter of the present invention is available for a reflow soldering step. By manufacturing the camera module by the reflow step, it is possible to automatically mount the electronic component mounting board or the like which must be soldered, and it is possible to particularly improve productivity without using the reflow step. Further, since it can be automatically performed, cost reduction can be achieved. In the case of the reflow step, it is exposed to a temperature of about 250 ° C to 270 ° C, so the infrared cut filter preferably has heat resistance that can withstand the reflow step (hereinafter also referred to as "reflow-resistant soldering" Sex").

於本申請案說明書中,所謂「具有耐回焊性」,是指於在200℃下進行10分鐘加熱的前後保持作為紅外線截止濾波器的特性。更佳為於230℃下進行10分鐘加熱的前後保持特性。進而佳為於250℃下進行3分鐘加熱的前後保持特性。於不具有耐回焊性的情形時,有時在所述條件下保持時紅外線截止濾波器的紅外線吸收能力降低,或作為膜的功能變得不充分。 In the specification of the present application, "having resistance to reflow resistance" means maintaining the characteristics as an infrared cut filter before and after heating at 200 ° C for 10 minutes. More preferably, the characteristics are maintained before and after heating at 230 ° C for 10 minutes. Further, it is preferable to maintain the characteristics before and after heating at 250 ° C for 3 minutes. In the case where the reflow resistance is not exhibited, the infrared ray absorbing ability of the infrared cut filter may be lowered or the function as a film may be insufficient when held under the above conditions.

另外,本發明亦是有關於一種包括進行回流焊(reflow)處理的步驟的照相機模組的製造方法。本發明的近紅外線截止濾波器即便具有回流焊步驟,亦維持近紅外線吸收能力,故不會損及經小型輕量.高性能化的照相機模組的特性。 Further, the present invention is also directed to a method of manufacturing a camera module including the steps of performing a reflow process. The near-infrared cut filter of the present invention maintains the near-infrared absorption capability even if it has a reflow step, so that it does not damage the small size and light weight. The characteristics of a high-performance camera module.

圖2~圖4為表示照相機模組的近紅外線截止濾波器周 邊部分的一例的概略剖面圖。 Figures 2 to 4 show the near-infrared cut-off filter week of the camera module. A schematic cross-sectional view of an example of a side portion.

如圖2所示,照相機模組依序具有固體攝像元件11、平坦化層12、紫外.紅外光反射膜19、透明基材20、近紅外線吸收層21及抗反射層22。 As shown in FIG. 2, the camera module sequentially has a solid-state imaging element 11, a planarization layer 12, and ultraviolet light. The infrared light reflecting film 19, the transparent substrate 20, the near infrared ray absorbing layer 21, and the antireflection layer 22.

紫外.紅外光反射膜19具有賦予或提高近紅外線截止濾波器的功能的效果,例如可參考日本專利特開2013-68688號公報的段落0033~段落0039,將其內容併入至本申請案說明書中。 UV. The infrared light reflecting film 19 has an effect of imparting or improving the function of the near-infrared cut filter. For example, the paragraphs 0033 to 0039 of Japanese Patent Laid-Open Publication No. 2013-68688, the contents of which are incorporated herein by reference.

透明基材20透射可見範圍的波長的光,例如可參考日本專利特開2013-68688號公報的段落0026~段落0032,將其內容併入至本申請案說明書中。 The transparent substrate 20 transmits light of a wavelength in the visible range. For example, reference is made to paragraph 0026 to paragraph 0032 of JP-A-2013-68688, the contents of which are incorporated herein by reference.

近紅外線吸收層21可藉由塗佈所述本發明的近紅外線吸收性組成物而形成。 The near-infrared absorbing layer 21 can be formed by coating the near-infrared absorbing composition of the present invention.

抗反射層22具有以下功能:防止入射至近紅外線截止濾波器中的光的反射,藉此提高透射率,高效地利用入射光,例如可參考日本專利特開2013-68688號公報的段落0040,將其內容併入至本申請案說明書中。 The anti-reflection layer 22 has a function of preventing reflection of light incident into the near-infrared cut filter, thereby increasing transmittance and efficiently utilizing incident light, for example, refer to paragraph 0040 of Japanese Patent Laid-Open Publication No. 2013-68688, The content thereof is incorporated into the specification of the present application.

如圖3所示,照相機模組亦可依序具有固體攝像元件11、近紅外線吸收層21、抗反射層22、平坦化層12、抗反射層22、透明基材20及紫外.紅外光反射膜19。 As shown in FIG. 3, the camera module may also have a solid-state imaging element 11, a near-infrared absorbing layer 21, an anti-reflection layer 22, a planarization layer 12, an anti-reflection layer 22, a transparent substrate 20, and ultraviolet light. Infrared light reflecting film 19.

如圖4所示,照相機模組亦可依序具有固體攝像元件11、近紅外線吸收層21、紫外.紅外光反射膜19、平坦化層12、抗反射層22、透明基材20及抗反射層22。 As shown in FIG. 4, the camera module may also have a solid-state imaging element 11, a near-infrared absorbing layer 21, and an ultraviolet ray in sequence. The infrared light reflecting film 19, the planarizing layer 12, the antireflection layer 22, the transparent substrate 20, and the antireflection layer 22.

另外,固體攝像元件亦可設為國際公開WO14/061188號手冊的0049欄以後所記載的第1實施形態~第14實施形態中的攝像元件的構成。 In addition, the solid-state imaging device may be configured as the imaging element in the first to fourteenth embodiments described in the 0049 column of the International Publication No. WO14/061188.

[實施例] [Examples]

以下列舉實施例對本發明加以更具體說明。以下實施例中所示的材料、使用量、比例、處理內容、處理順序等只要不偏離本發明的主旨,則可適當變更。因此,本發明的範圍不限定於以下所示的具體例。再者,只要無特別說明,則「%」及「份」為質量基準。 The invention is more specifically illustrated by the following examples. The materials, the amounts used, the ratios, the processing contents, the processing order, and the like shown in the following examples can be appropriately changed as long as they do not deviate from the gist of the present invention. Therefore, the scope of the present invention is not limited to the specific examples shown below. In addition, "%" and "parts" are quality standards unless otherwise specified.

<合成例> <Synthesis Example>

化合物A1-1~化合物A1-3、化合物A1-6、化合物A1-7、化合物A1-9、化合物A1-15、化合物A1-26及化合物A2-1、化合物A2-33、化合物A2-35、化合物A2-37作為試劑而由東京化成、和光純藥或奧德里奇(Aldrich)市售,且不進行進一步的純化而直接使用。 Compound A1-1~Compound A1-3, Compound A1-6, Compound A1-7, Compound A1-9, Compound A1-15, Compound A1-26 and Compound A2-1, Compound A2-33, Compound A2-35, Compound A2-37 was commercially available as a reagent from Tokyo Chemical Co., Ltd., Wako Pure Chemical Industries, or Aldrich, and was used without further purification.

化合物A1-4的合成例 Synthesis example of compound A1-4

於三口燒瓶中,於氮氣環境下導入2,6-二溴吡啶14.24g、碘 化銅(I)0.61g、四氫呋喃(市售脫水溶劑)180mL,冷卻至0℃。 於其中滴加氯化第三丁基鎂的1.0M四氫呋喃溶液70mL,於室溫下攪拌1小時。添加飽和氯化銨水溶液100mL、乙酸乙酯100mL,將藉由萃取.分液所得的有機層濃縮,利用矽膠管柱層析法(溶劑:己烷)將所得的粗產物純化,藉此獲得10g的2-溴-6-第三丁基吡啶。 Introduced 2,6-dibromopyridine 14.24g, iodine in a three-necked flask under nitrogen atmosphere Copper (I) 0.61 g, tetrahydrofuran (commercially available dehydration solvent) 180 mL, and cooled to 0 °C. 70 mL of a 1.0 M tetrahydrofuran solution of tributylmagnesium chloride was added dropwise thereto, and the mixture was stirred at room temperature for 1 hour. Add 100 mL of saturated ammonium chloride aqueous solution and 100 mL of ethyl acetate by extraction. The organic layer obtained by liquid separation was concentrated, and the obtained crude product was purified by silica gel column chromatography (solvent: hexane) to obtain 10 g of 2-bromo-6-t-butylpyridine.

繼而,於三口燒瓶中,於氮氣環境下導入上文中合成的2-溴-6-第三丁基吡啶3.65g、四氫呋喃(市售脫水溶劑)50mL,冷卻至-78℃。於其中滴加正丁基鋰的1.6M己烷溶液10.0mL,於-78℃下攪拌30分鐘。於其中緩慢添加大過剩量的經粉碎的乾冰,於室溫下攪拌2小時。添加水100mL、乙酸乙酯50mL,藉由萃取.分液來回收水層(將pH值調整為11)。對該水層逐次少量添加濃鹽酸而將pH值調整為2,利用乙酸乙酯50mL進行3次萃取,將所得的有機層濃縮,藉此獲得2g的化合物A1-4。 Then, in a three-necked flask, 3.65 g of 2-bromo-6-tert-butylpyridine synthesized above and 50 mL of tetrahydrofuran (a commercially available dehydrating solvent) were introduced under a nitrogen atmosphere, and the mixture was cooled to -78 °C. 10.0 mL of a 1.6 M hexane solution of n-butyllithium was added dropwise thereto, and the mixture was stirred at -78 ° C for 30 minutes. A large excess amount of the pulverized dry ice was slowly added thereto, and stirred at room temperature for 2 hours. Add 100 mL of water and 50 mL of ethyl acetate by extraction. The liquid layer was separated by liquid separation (the pH was adjusted to 11). The aqueous layer was gradually added with a small amount of concentrated hydrochloric acid to adjust the pH to 2, and extracted three times with 50 mL of ethyl acetate. The obtained organic layer was concentrated to obtain 2 g of Compound A1-4.

化合物A1-5的合成例 Synthesis Example of Compound A1-5

使用溴化2-乙基己基鎂代替氯化第三丁基鎂,利用與化合物A1-4相同的方法進行合成。 Instead of chlorinated tert-butylmagnesium chloride, 2-ethylhexylmagnesium bromide was used, and the synthesis was carried out in the same manner as in the compound A1-4.

化合物A1-8的合成例 Synthesis Example of Compound A1-8

於燒瓶中添加2-氰基嘧啶0.10g、12質量%氫氧化鈉水溶液13mL,於70℃下進行30分鐘攪拌。逐次少量添加1N稀鹽酸而將pH值調整為3,利用乙酸乙酯10mL進行3次萃取,將所得的有機層濃縮,藉此獲得0.10g的化合物A1-8。 0.10 g of 2-cyanopyrimidine and 13 mL of a 12% by mass aqueous sodium hydroxide solution were added to the flask, and the mixture was stirred at 70 ° C for 30 minutes. 1N dilute hydrochloric acid was added in small portions, and the pH was adjusted to 3, and extraction was performed three times with 10 mL of ethyl acetate, and the obtained organic layer was concentrated, whereby 0.10 g of Compound A1-8 was obtained.

化合物A1-10的合成例 Synthesis Example of Compound A1-10

於三口燒瓶中,於氮氣環境下導入噻唑8.5g、四氫呋喃(市售脫水溶劑)150mL,冷卻至-78℃。於其中滴加正丁基鋰的1.6M己烷溶液60mL,於-78℃下攪拌30分鐘。於其中緩慢添加大過剩量的經粉碎的乾冰,於室溫下攪拌2小時。添加水100mL、乙酸乙酯50mL,藉由萃取.分液來回收水層(將pH值調整為11)。對該水層一面逐次少量添加濃鹽酸而將pH值調整為2,利用乙酸乙酯50mL進行3次萃取,將所得的有機層濃縮,藉此獲得12g的化合物A1-10。 In a three-necked flask, 8.5 g of thiazole and 150 mL of tetrahydrofuran (a commercially available dehydrating solvent) were introduced under a nitrogen atmosphere, and the mixture was cooled to -78 °C. 60 mL of a 1.6 M hexane solution of n-butyllithium was added dropwise thereto, and the mixture was stirred at -78 ° C for 30 minutes. A large excess amount of the pulverized dry ice was slowly added thereto, and stirred at room temperature for 2 hours. Add 100 mL of water and 50 mL of ethyl acetate by extraction. The liquid layer was separated by liquid separation (the pH was adjusted to 11). To the aqueous layer, concentrated hydrochloric acid was added in small portions to adjust the pH to 2, and extracted three times with 50 mL of ethyl acetate, and the obtained organic layer was concentrated to obtain 12 g of Compound A1-10.

化合物A1-11的合成例 Synthesis Example of Compound A1-11

於三口燒瓶中,於氮氣環境下添加吡唑-3-羧酸乙酯3.0g、碘 化鉀3.55g、碳酸鉀4.44g、1-溴丁烷4.40g、丙酮48mL,加熱回流10小時。冷卻至室溫後,藉由過濾將不溶物去除,將濾液濃縮,利用矽膠管柱層析法(溶劑:己烷/乙酸乙酯)將所得的粗產物純化,藉此獲得2.8g的1-丁基吡唑-3-羧酸乙酯。 In a three-necked flask, 3.0 g of pyrazole-3-carboxylic acid ethyl ester and iodine were added under a nitrogen atmosphere. 3.55 g of potassium, 4.44 g of potassium carbonate, 4.40 g of 1-bromobutane, and 48 mL of acetone were heated under reflux for 10 hours. After cooling to room temperature, the insoluble matter was removed by filtration, the filtrate was concentrated, and the obtained crude product was purified by silica gel column chromatography (solvent: hexane / ethyl acetate) to thereby obtain 2.8 g of 1- Ethyl butyl pyrazole-3-carboxylate.

於燒瓶中添加所述產物0.39g、乙醇3mL,一面於室溫下攪拌一面添加水0.05g、第三丁氧基鉀0.22g後,於70℃下攪拌30分鐘。將其減壓濃縮所得的固體為對應的羧酸鉀,將其直接用於銅錯合物化。 0.39 g of the product and 3 mL of ethanol were added to the flask, and 0.05 g of water and 0.22 g of potassium t-butoxide were added thereto while stirring at room temperature, followed by stirring at 70 ° C for 30 minutes. The solid obtained by concentration under reduced pressure was the corresponding potassium carboxylate, which was directly used for copper complexation.

化合物A1-12的合成例 Synthesis example of compound A1-12

於三口燒瓶中,於氮氣環境下添加吡唑-3-羧酸乙酯3.0g、2-溴-2-甲基丙烷4.40g、二甲基甲醯胺48mL,加熱回流72小時。冷卻至室溫後,藉由過濾將不溶物去除,將濾液濃縮,利用矽膠管柱層析法(溶劑:己烷/乙酸乙酯)將所得的粗產物純化,藉此獲得0.8g的1-第三丁基-吡唑-3-羧酸乙酯。 In a three-necked flask, 3.0 g of pyrazole-3-carboxylic acid ethyl ester, 2.40 g of 2-bromo-2-methylpropane, and 48 mL of dimethylformamide were added under a nitrogen atmosphere, and the mixture was heated under reflux for 72 hours. After cooling to room temperature, the insoluble matter was removed by filtration, and the filtrate was concentrated, and the obtained crude product was purified by silica gel column chromatography (solvent: hexane / ethyl acetate) to obtain 0.8 g of 1- Ethyl tert-butyl-pyrazole-3-carboxylate.

藉由與化合物A1-11相同的方法將酯水解,獲得化合物A1-12。 The ester was hydrolyzed by the same method as the compound A1-11 to give the compound A1-12.

化合物A1-13的合成例 Synthesis Example of Compound A1-13

於三口燒瓶中,於氮氣環境下添加吡唑-3-羧酸5.5g、1-金剛烷醇7.5g、磷酸100mL、乙酸25mL,於60℃下攪拌7.5小時。冷卻至室溫後,添加水200mL,藉由過濾來回收所析出的白色固體。於該白色固體中添加水300mL、乙酸乙酯100mL,一面於室溫下攪拌,一面添加50質量%氫氧化鈉水溶液直至pH值成為12為止。藉由萃取.分液來回收水層,利用乙酸乙酯100mL進行4次清洗。若對該水層逐次少量添加濃鹽酸而將pH值調整為2,則白色固體析出,將該白色固體過濾,以水進行清洗,藉此獲得3.9g的1-(1-金剛烷基)吡唑-3-羧酸。 In a three-necked flask, 5.5 g of pyrazole-3-carboxylic acid, 7.5 g of 1-adamantanol, 100 mL of phosphoric acid, and 25 mL of acetic acid were added under a nitrogen atmosphere, and the mixture was stirred at 60 ° C for 7.5 hours. After cooling to room temperature, 200 mL of water was added, and the precipitated white solid was collected by filtration. To the white solid, 300 mL of water and 100 mL of ethyl acetate were added, and while stirring at room temperature, a 50% by mass aqueous sodium hydroxide solution was added until the pH became 12. By extraction. The aqueous layer was separated by liquid separation, and washed with 100 mL of ethyl acetate for 4 times. When a small amount of concentrated hydrochloric acid was added to the aqueous layer in a small amount to adjust the pH to 2, a white solid precipitated, and the white solid was filtered and washed with water to obtain 3.9 g of 1-(1-adamantyl)pyridinium. Oxazole-3-carboxylic acid.

化合物A1-14的合成例 Synthesis Example of Compound A1-14

於三口燒瓶中,於氮氣環境下添加丙酮酸4.4g、環戊基甲醚10mL,於室溫下攪拌。於其中滴加苯胺4.7g,進行10分鐘攪拌後,冷卻至0℃,藉由過濾來回收所析出的固體,藉此獲得3.6g 的化合物A1-14。 In a three-necked flask, 4.4 g of pyruvic acid and 10 mL of cyclopentyl methyl ether were added under a nitrogen atmosphere, and the mixture was stirred at room temperature. 4.7 g of aniline was added dropwise thereto, and the mixture was stirred for 10 minutes, and then cooled to 0 ° C, and the precipitated solid was collected by filtration to obtain 3.6 g. Compound A1-14.

化合物A1-16的合成例 Synthesis Example of Compound A1-16

於三口燒瓶中,於氮氣環境下導入2,6-二乙醯基吡啶16.3g、四氫呋喃(市售脫水溶劑)160mL,冷卻至0℃。於其中滴加甲基溴化鎂正丁基鋰的3M二乙醚溶液33mL,於室溫下攪拌3小時。添加飽和氯化銨水溶液100mL、乙酸乙酯100mL,將藉由萃取.分液所得的有機層濃縮,藉此獲得19.5g的化合物A1-16。 Into a three-necked flask, 16.3 g of 2,6-diethylpyridinium and 160 mL of tetrahydrofuran (a commercially available dehydrating solvent) were introduced under a nitrogen atmosphere, and the mixture was cooled to 0 °C. 33 mL of a 3 M diethyl ether solution of methyl magnesium bromide n-butyllithium was added dropwise thereto, and the mixture was stirred at room temperature for 3 hours. Add 100 mL of saturated ammonium chloride aqueous solution and 100 mL of ethyl acetate by extraction. The organic layer obtained by liquid separation was concentrated, whereby 19.5 g of Compound A1-16 was obtained.

化合物A1-17的合成例 Synthesis Example of Compound A1-17

於三口燒瓶中,於氮氣環境下添加吡啶甲酸2.46g、三氟甲磺醯胺3.0g、N,N-二甲基胺基吡啶(DMAP)3.66g、二甲基甲醯胺150mL,於室溫下攪拌。於其中添加1-乙基-3-(3-二甲基胺基丙基)碳二醯亞胺鹽酸鹽(EDCI)5.73g,於室溫下攪拌4小時。添加水100mL、乙酸乙酯100mL,藉由萃取.分液來回收水層,於其中逐次少量添加濃鹽酸而將pH值調整為2。添加乙酸乙酯100 mL,將藉由萃取.分液所得的有機層濃縮,藉此獲得1.56g的化合物A1-17。 In a three-necked flask, 2.46 g of picolinic acid, 3.0 g of trifluoromethanesulfonamide, 3.66 g of N,N-dimethylaminopyridine (DMAP), and 150 mL of dimethylformamide were added in a nitrogen atmosphere. Stir under temperature. Thereto was added 5.73 g of 1-ethyl-3-(3-dimethylaminopropyl)carbodiimide hydrochloride (EDCI), and the mixture was stirred at room temperature for 4 hours. Add 100 mL of water and 100 mL of ethyl acetate by extraction. The aqueous layer was separated by liquid separation, and concentrated hydrochloric acid was added thereto in small portions to adjust the pH to 2. Add ethyl acetate 100 mL, will be extracted by extraction. The organic layer obtained by liquid separation was concentrated, whereby 1.56 g of Compound A1-17 was obtained.

化合物A1-18的合成例 Synthesis example of compound A1-18

於三口燒瓶中,於氮氣環境下添加第三丁氧基鉀11.20g、甲苯100mL,冷卻至0℃。於其中滴加乙酸乙酯5.30g後,導入二吡啶甲酸二甲酯9.75g,於室溫下攪拌2小時。添加飽和氯化銨水溶液200mL,將藉由萃取.分液所得的有機層濃縮,添加2N稀鹽酸50mL,於80℃下攪拌2小時。添加乙酸乙酯50mL,將藉由萃取.分液所得的有機層濃縮,利用熱水對所得的粗產物進行2次再結晶,藉此獲得10g的化合物A1-18。 In a three-necked flask, 11.20 g of potassium t-butoxide and 100 mL of toluene were added under a nitrogen atmosphere, and the mixture was cooled to 0 °C. After 5.30 g of ethyl acetate was added dropwise thereto, 9.75 g of dimethyl dipicolinate was introduced, and the mixture was stirred at room temperature for 2 hours. Add 200 mL of saturated ammonium chloride solution, which will be extracted by extraction. The organic layer obtained by liquid separation was concentrated, and 50 mL of 2N diluted hydrochloric acid was added, and the mixture was stirred at 80 ° C for 2 hours. Add ethyl acetate 50mL, which will be extracted by extraction. The organic layer obtained by liquid separation was concentrated, and the obtained crude product was recrystallized twice with hot water, whereby 10 g of compound A1-18 was obtained.

化合物A1-19的合成例 Synthesis Example of Compound A1-19

於三口燒瓶中,於氮氣環境下導入利用WO2006098505號手冊中記載的方法所合成的2,2-雙(6-溴-2-吡啶基)丙烷5.6g、四氫 呋喃(市售脫水溶劑)150mL,冷卻至-78℃。於其中滴加正丁基鋰的1.6M己烷溶液20mL,於-78℃下攪拌30分鐘。於其中緩慢添加大過剩量的經粉碎的乾冰,於室溫下攪拌2小時。添加水100mL、乙酸乙酯50mL,藉由萃取.分液來回收水層(將pH值調整為11)。對該水層逐次少量添加濃鹽酸而將pH值調整為2,利用乙酸乙酯50mL進行3次萃取,將所得的有機層濃縮,藉此獲得4.2g的化合物A1-19。 In a three-necked flask, 5.6 g of 2,2-bis(6-bromo-2-pyridyl)propane synthesized by the method described in WO2006098505, tetrahydrogen was introduced under a nitrogen atmosphere. Furan (a commercially available dehydration solvent) 150 mL, cooled to -78 °C. 20 mL of a 1.6 M hexane solution of n-butyllithium was added dropwise thereto, and the mixture was stirred at -78 ° C for 30 minutes. A large excess amount of the pulverized dry ice was slowly added thereto, and stirred at room temperature for 2 hours. Add 100 mL of water and 50 mL of ethyl acetate by extraction. The liquid layer was separated by liquid separation (the pH was adjusted to 11). To the aqueous layer, concentrated hydrochloric acid was added in small portions, and the pH was adjusted to 2, and extracted three times with ethyl acetate (50 mL), and the obtained organic layer was concentrated to obtain 4.2 g of Compound A1-19.

化合物A1-20的合成例 Synthesis Example of Compound A1-20

利用「有機化學期刊(J.Org.Chem.)」(1970,35,4114)中記載的方法來進行合成。 The synthesis was carried out by the method described in "J. Org. Chem." (1970, 35, 4114).

化合物A1-21的合成例 Synthesis Example of Compound A1-21

使用利用「四面體(Tetrahedron)」(1999,55,14791)中記載的方法所合成的吡唑-3-膦酸二乙酯代替吡唑-3-羧酸乙酯,且使用對甲苯磺酸甲酯代替1-溴丁烷,利用與化合物A1-14相同的方法進行合成。 Instead of pyrazole-3-carboxylic acid ethyl ester, diethyl pyrazole-3-carboxylate synthesized by the method described in "Tetrahedron" (1999, 55, 14791), and p-toluenesulfonic acid was used. The methyl ester was replaced by 1-bromobutane, and the synthesis was carried out in the same manner as in the compound A1-14.

化合物A1-22的合成例 Synthesis example of compound A1-22

使用3-溴戊烷代替1-溴丁烷,使用碳酸銫代替碳酸鉀,利用與化合物A1-11相同的方法進行合成。 3-bromopentane was used instead of 1-bromobutane, and cesium carbonate was used instead of potassium carbonate, and the synthesis was carried out in the same manner as in the compound A1-11.

化合物A1-23的合成例 Synthesis Example of Compound A1-23

於三口燒瓶中,於氮氣環境下導入2,6-二甲基-4-庚醇20g、吡啶50mL,於室溫下攪拌。於其中導入對甲苯磺醯氯55g,於室溫下整夜攪拌。添加2當量的稀鹽酸100mL、乙酸乙酯100mL,進行萃取.分液。進而,於水相中添加乙酸乙酯100mL,進行2次萃取.分液的操作,並將藉由共計3次的分液操作所得的有機相合併,於其中添加2當量的稀鹽酸100mL而進行2次萃取.分液的操作。進而,於有機相中添加飽和氯化鈉水溶液100mL,將藉由萃取.分液所得的有機相濃縮,藉此獲得42g對應的甲苯磺酸鹽。 In a three-necked flask, 20 g of 2,6-dimethyl-4-heptanol and 50 mL of pyridine were introduced under a nitrogen atmosphere, and the mixture was stirred at room temperature. 55 g of p-toluenesulfonyl chloride was introduced thereinto, and stirred at room temperature overnight. Add 2 equivalents of dilute hydrochloric acid 100 mL, ethyl acetate 100 mL, and extract. Liquid separation. Further, 100 mL of ethyl acetate was added to the aqueous phase, and extraction was carried out twice. The liquid separation operation was carried out, and the organic phases obtained by the liquid separation operation for a total of 3 times were combined, and 2 equivalents of dilute hydrochloric acid 100 mL was added thereto for 2 extractions. The operation of liquid separation. Further, 100 mL of a saturated aqueous solution of sodium chloride is added to the organic phase, which is extracted by extraction. The organic phase obtained by liquid separation was concentrated, whereby 42 g of the corresponding tosylate salt was obtained.

使用該甲苯磺酸鹽代替3-溴戊烷,藉此利用與化合物A1-22相同的方法來合成化合物A1-23。 This tosylate was used instead of 3-bromopentane, whereby Compound A1-23 was synthesized by the same method as Compound A1-22.

化合物A1-24的合成例 Synthesis Example of Compound A1-24

使用2,6,8-三甲基-4-壬醇代替2,6-二甲基-4-庚醇,利用與化合物A1-23相同的方法進行合成。 The synthesis was carried out in the same manner as in the compound A1-23, using 2,6,8-trimethyl-4-nonanol instead of 2,6-dimethyl-4-heptanol.

化合物A1-27的合成例 Synthesis Example of Compound A1-27

使用4,5-二甲基噻唑代替噻唑,利用與化合物A1-10相同的方法進行合成。 The synthesis was carried out in the same manner as in the compound A1-10 using 4,5-dimethylthiazole in place of the thiazole.

化合物A1-28的合成例 Synthesis Example of Compound A1-28

於三口燒瓶中,於氮氣環境下導入苯硼酸1.00g、6-溴吡啶-2-羧酸1.00g、碳酸鉀1.38g、四氫呋喃與水的5:1的混合溶劑50mL,於室溫下冷卻。於其中導入四(三苯基膦)鈀0.55g,進行4小時加熱回流。冷卻至室溫後,導入水40mL、乙酸乙酯40mL,於藉由萃取.分液所得的水相中導入乙酸乙酯20mL,進行萃取、分液。於所得的水相(pH值為11)中導入稀鹽酸直至pH值成為4為止。藉由過濾來回收所析出的固體,藉此獲得0.07g的化合物A1-28。 Into a three-necked flask, 1.00 g of phenylboronic acid, 1.00 g of 6-bromopyridine-2-carboxylic acid, 1.38 g of potassium carbonate, and a mixed solvent of 5:1 of tetrahydrofuran and water were introduced under a nitrogen atmosphere, and the mixture was cooled at room temperature. 0.55 g of tetrakis(triphenylphosphine)palladium was introduced thereinto, and the mixture was heated under reflux for 4 hours. After cooling to room temperature, 40 mL of water and 40 mL of ethyl acetate were introduced by extraction. 20 mL of ethyl acetate was introduced into the aqueous phase obtained by liquid separation, and extraction and liquid separation were carried out. Dilute hydrochloric acid was introduced into the obtained aqueous phase (pH 11) until the pH became 4. The precipitated solid was recovered by filtration, whereby 0.07 g of Compound A1-28 was obtained.

化合物A1-29的合成例 Synthesis Example of Compound A1-29

於三口燒瓶中,於氮氣環境下導入2,6-二甲基苯硼酸0.90g、6-溴吡啶-2-羧酸甲酯0.92g、磷酸鉀1.92g、甲苯30mL,於室溫下冷卻。於其中導入三環己基膦0.13g、乙酸鈀0.10g,於100度下整夜攪拌。冷卻至室溫後,導入飽和氯化銨水溶液30mL、乙酸乙酯40mL,進行萃取.分液。藉此將所得的有機相濃縮,利用矽膠管柱層析法(溶劑:己烷/乙酸乙酯)將所得的粗產物純化,由此獲得0.45g的化合物A1-29的甲酯體。 In a three-necked flask, 0.90 g of 2,6-dimethylphenylboronic acid, 0.92 g of methyl 6-bromopyridine-2-carboxylate, 1.92 g of potassium phosphate, and 30 mL of toluene were introduced under a nitrogen atmosphere, and the mixture was cooled at room temperature. 0.13 g of tricyclohexylphosphine and 0.10 g of palladium acetate were introduced thereto, and stirred at 100 °C overnight. After cooling to room temperature, 30 mL of a saturated aqueous ammonium chloride solution and 40 mL of ethyl acetate were introduced and extracted. Liquid separation. The organic phase thus obtained was concentrated, and the obtained crude product was purified by silica gel column chromatography (solvent: hexane / ethyl acetate) to thereby obtain 0.45 g of the methyl ester of compound A1-29.

利用與化合物A1-11相同的方法將該酯水解,獲得化合物 A1-29。 The ester was hydrolyzed in the same manner as in the compound A1-11 to obtain a compound. A1-29.

化合物A1-30的合成例 Synthesis Example of Compound A1-30

於三口燒瓶中,於氮氣環境下導入二異丙基胺13.2g、四氫呋喃(市售脫水溶劑)200mL,冷卻至-78℃。於其中滴加正丁基鋰的1.6M己烷溶液64.0mL,於-78℃下攪拌10分鐘。於其中滴加2-溴-6-甲基吡啶6.0g,於-78℃下攪拌30分鐘。於其中滴加碘乙烷15.97g後,緩慢昇溫至室溫。於室溫下攪拌1小時後,導入飽和氯化銨水溶液100mL,進行萃取.分液。於水相中導入乙酸乙酯100mL並進行2次萃取.分液的操作,合併藉由將最初的分液合計在內的3次分液操作所得的有機相並進行濃縮,利用矽膠管柱層析法(溶劑:己烷/乙酸乙酯)將所得的粗產物純化,藉此獲得7.2g的2-溴-6-(3-戊基)吡啶。利用與化合物A1-4的合成法相同的方法,將該化合物轉換為化合物A1-30。 Into a three-necked flask, 13.2 g of diisopropylamine and 200 mL of tetrahydrofuran (a commercially available dehydrating solvent) were introduced under a nitrogen atmosphere, and the mixture was cooled to -78 °C. 64.0 mL of a 1.6 M hexane solution of n-butyllithium was added dropwise thereto, and the mixture was stirred at -78 ° C for 10 minutes. 6.0 g of 2-bromo-6-methylpyridine was added dropwise thereto, and the mixture was stirred at -78 ° C for 30 minutes. After 15.97 g of ethyl iodide was added dropwise thereto, the temperature was slowly raised to room temperature. After stirring at room temperature for 1 hour, 100 mL of a saturated aqueous solution of ammonium chloride was introduced and extracted. Liquid separation. 100 mL of ethyl acetate was introduced into the aqueous phase and extracted twice. For the liquid separation operation, the organic phase obtained by the three-time liquid separation operation including the initial liquid separation is combined and concentrated, and the obtained product is obtained by a silica gel column chromatography (solvent: hexane/ethyl acetate). The crude product was purified, whereby 7.2 g of 2-bromo-6-(3-pentyl)pyridine was obtained. This compound was converted into the compound A1-30 by the same method as the synthesis of the compound A1-4.

化合物A1-31的合成例 Synthesis Example of Compound A1-31

於三口燒瓶中,於氮氣環境下導入二異丙基胺13.0g、四氫呋喃(市售脫水溶劑)200mL,冷卻至-78℃。於其中滴加正丁基鋰的1.6M己烷溶液80.0mL,於-78℃下攪拌15分鐘。於其中滴加2-溴-6-甲基吡啶20g,於-78℃下攪拌30分鐘。於其中滴加1-溴-2-甲基丙烷17.7g後,緩慢昇溫至室溫。於室溫下攪拌1小時後,導入飽和氯化銨水溶液100mL,進行萃取.分液。於水相中導入乙酸乙酯150mL並進行萃取.分液。將藉由合計2次的分液操作所得的有機相合併並進行濃縮,利用矽膠管柱層析法(溶劑:己烷/乙酸乙酯)將所得的粗產物純化,藉此獲得18.8g的2-溴-6-(3-甲基丁基)吡啶。利用與化合物A1-4的合成法相同的方法,將該化合物轉換為化合物A1-31。 Into a three-necked flask, 13.0 g of diisopropylamine and 200 mL of tetrahydrofuran (a commercially available dehydrating solvent) were introduced under a nitrogen atmosphere, and the mixture was cooled to -78 °C. 80.0 mL of a 1.6 M hexane solution of n-butyllithium was added dropwise thereto, and the mixture was stirred at -78 ° C for 15 minutes. 20 g of 2-bromo-6-methylpyridine was added dropwise thereto, and the mixture was stirred at -78 ° C for 30 minutes. After 17.7 g of 1-bromo-2-methylpropane was added dropwise thereto, the temperature was slowly raised to room temperature. After stirring at room temperature for 1 hour, 100 mL of a saturated aqueous solution of ammonium chloride was introduced and extracted. Liquid separation. 150 mL of ethyl acetate was introduced into the aqueous phase and extracted. Liquid separation. The organic phase obtained by the liquid separation operation of the total of 2 times was combined and concentrated, and the obtained crude product was purified by a silica gel column chromatography (solvent: hexane / ethyl acetate), whereby 18.8 g of 2 was obtained. -Bromo-6-(3-methylbutyl)pyridine. This compound was converted into the compound A1-31 by the same method as the synthesis of the compound A1-4.

化合物A1-32的合成例 Synthesis Example of Compound A1-32

藉由國際公開WO第2007/148738號手册所記載的方法來合成2,6-二溴-4-三氟甲基吡啶。將該化合物1.73g導入至三口燒瓶中,於氮氣環境下,導入氯化鐵(III)0.40g、四氫呋喃30mL,於室溫下攪拌。於其中滴加甲基溴化鎂的3M二乙醚溶液2mL,於室溫下攪拌1.5小時。添加飽和氯化銨水溶液30mL、乙酸乙酯 30mL,將藉由萃取.分液所得的有機層濃縮,利用矽膠管柱層析法(溶劑:己烷)將所得的粗產物純化,藉此獲得0.18g的2-溴-6-甲基-4-三氟甲基吡啶。利用與化合物A1-4的合成法相同的方法,將該化合物轉換為化合物A1-32。 2,6-Dibromo-4-trifluoromethylpyridine was synthesized by the method described in International Publication WO 2007/148738. 1.73 g of this compound was introduced into a three-necked flask, and 0.40 g of iron(III) chloride and 30 mL of tetrahydrofuran were introduced under a nitrogen atmosphere, and the mixture was stirred at room temperature. 2 mL of a 3 M diethyl ether solution of methylmagnesium bromide was added dropwise thereto, and the mixture was stirred at room temperature for 1.5 hours. Add saturated aqueous ammonium chloride solution 30mL, ethyl acetate 30mL, will be extracted by. The organic layer obtained by liquid separation was concentrated, and the obtained crude product was purified by silica gel column chromatography (solvent: hexane) to obtain 0.18 g of 2-bromo-6-methyl-4-trifluoromethylpyridine. . This compound was converted into the compound A1-32 by the same method as the synthesis of the compound A1-4.

化合物A1-33的合成例 Synthesis Example of Compound A1-33

於三口燒瓶中,於氮氣環境下導入化合物A1-31 1.44g、三氟甲磺醯胺1.11g、4-二甲基胺基吡啶1.37g、二甲基甲醯胺20mL,於室溫下整夜攪拌。於其中導入水100mL,一面於室溫下攪拌,一面添加濃鹽酸直至pH值成為1為止。藉由過濾來回收所析出的固體,將其利用甲醇進行再結晶,藉此獲得1.5g的化合物A1-33。 In a three-necked flask, 1.44 g of compound A1-31, 1.11 g of trifluoromethanesulfonamide, 1.37 g of 4-dimethylaminopyridine, and 20 mL of dimethylformamide were introduced under a nitrogen atmosphere at room temperature. Stir in the night. 100 mL of water was introduced thereto, and while stirring at room temperature, concentrated hydrochloric acid was added until the pH became 1. The precipitated solid was recovered by filtration, and recrystallized from methanol, whereby 1.5 g of Compound A1-33 was obtained.

化合物A1-34的合成例 Synthesis Example of Compound A1-34

根據所述流程,利用與化合物A1-33相同的方法進行合成。 According to the procedure, the synthesis was carried out in the same manner as in the compound A1-33.

化合物A1-35的合成例 Synthesis Example of Compound A1-35

使用藉由「歐洲醫藥化學期刊(Eur.J.Med.Chem.)」(2010,45,1225)的文獻記載的方法所合成的全氟丁磺醯胺,根據所述流程,利用與化合物A1-33相同的方法進行合成。 Perfluorobutsulfonamide synthesized by the method described in the literature of "Eur. J. Med. Chem." (2010, 45, 1225), using the compound A1 according to the procedure -33 The same method was used for the synthesis.

化合物A1-36的合成例 Synthesis Example of Compound A1-36

使用化合物A1-30代替化合物A1-31,利用與化合物A1-33相同的方法進行合成。 The compound A1-30 was used instead of the compound A1-31, and the synthesis was carried out in the same manner as the compound A1-33.

化合物A1-37的合成例 Synthesis Example of Compound A1-37

使用化合物A1-11代替化合物A1-31,利用與化合物A1-33相同的方法進行合成。 The compound A1-11 was used instead of the compound A1-31, and the synthesis was carried out in the same manner as the compound A1-33.

化合物A1-38的合成例 Synthesis Example of Compound A1-38

使用化合物A1-22代替化合物A1-31,利用與化合物A1-33相同的方法進行合成。 The compound A1-22 was used instead of the compound A1-31, and the synthesis was carried out in the same manner as the compound A1-33.

化合物A1-39的合成例 Synthesis Example of Compound A1-39

使用化合物A1-12代替化合物A1-31,利用與化合物A1-33相同的方法進行合成。 The compound A1-12 was used instead of the compound A1-31, and the synthesis was carried out in the same manner as in the compound A1-33.

化合物A1-40的合成例 Synthesis Example of Compound A1-40

使用甲磺醯胺代替三氟甲磺醯胺,利用與化合物A1-38相同 的方法進行合成。 Use mesalamine instead of trifluoromethanesulfonamide, using the same as compound A1-38 The method of synthesis.

化合物A1-41的合成例 Synthesis Example of Compound A1-41

使用鄰甲苯磺醯胺代替三氟甲磺醯胺,利用與化合物A1-38相同的方法進行合成。 The synthesis was carried out in the same manner as in the compound A1-38, using o-toluenesulfonamide instead of trifluoromethanesulfonamide.

化合物A1-42的合成例 Synthesis Example of Compound A1-42

使用化合物A1-27代替化合物A1-31,利用與化合物A1-33相同的方法進行合成。 The compound A1-27 was used instead of the compound A1-31, and the synthesis was carried out in the same manner as in the compound A1-33.

化合物A2-3的合成例 Synthesis example of compound A2-3

於三口燒瓶中,於氮氣環境下導入2-乙基己醇13.0g、四氫呋喃(市售脫水溶劑)200mL,冷卻至0℃。於其中導入氫化鈉(60%分散液)4.0g,於0℃下攪拌30分鐘。於其中滴加溴乙酸15.0g,於室溫下攪拌5小時。添加飽和氯化銨200mL、乙酸乙酯100mL,將萃取.分液所得的有機層濃縮,藉此獲得18.4g的化合物A2-3。 In a three-necked flask, 13.0 g of 2-ethylhexanol and 200 mL of tetrahydrofuran (a commercially available dehydrating solvent) were introduced under a nitrogen atmosphere, and the mixture was cooled to 0 °C. 4.0 g of sodium hydride (60% dispersion) was introduced thereto, and stirred at 0 ° C for 30 minutes. 15.0 g of bromoacetic acid was added dropwise thereto, and the mixture was stirred at room temperature for 5 hours. Add 200 mL of saturated ammonium chloride and 100 mL of ethyl acetate to extract. The organic layer obtained by liquid separation was concentrated, whereby 18.4 g of Compound A2-3 was obtained.

化合物A2-4的合成例 Synthesis example of compound A2-4

使用第三丁醇代替2-乙基己醇,利用與化合物A2-3相同的方法進行合成。 The synthesis was carried out in the same manner as in the compound A2-3 using a third butanol instead of 2-ethylhexanol.

化合物A2-7的合成例 Synthesis example of compound A2-7

使用二乙二醇單乙醚代替2-乙基己醇,利用與化合物A2-3相同的方法進行合成。 The synthesis was carried out in the same manner as in the compound A2-3 using diethylene glycol monoethyl ether instead of 2-ethylhexanol.

化合物A2-10的合成例 Synthesis example of compound A2-10

使用利用「有機化學期刊(J.Org.Chem.)」(1989,54,3625)中記載的方法合成的2-(2-甲基-1,3-二噁烷-2-基)乙醇,利用與化合物A2-3相同的方法與溴乙酸反應,使所得的產物於濃鹽酸中於80℃下加熱回流2小時,藉此進行縮醛脫保護。將脫保護反應液滴加至飽和碳酸氫鈉水溶液中進行中和,利用乙酸乙酯進行萃取.分液,將所得的有機層濃縮,藉此獲得化合物A2-10。 2-(2-methyl-1,3-dioxan-2-yl)ethanol synthesized by the method described in J. Org. Chem. (1989, 54, 3625), The obtained product was reacted with bromoacetic acid in the same manner as in the compound A2-3, and the obtained product was heated under reflux at 80 ° C for 2 hours in concentrated hydrochloric acid, whereby acetal deprotection was carried out. The deprotection reaction solution was added to a saturated aqueous solution of sodium hydrogencarbonate for neutralization, and extracted with ethyl acetate. The liquid layer was separated, and the obtained organic layer was concentrated, whereby Compound A2-10 was obtained.

化合物A2-12的合成例 Synthesis example of compound A2-12

於三口燒瓶中導入β-丙內酯7.2g、甲醇100mL,一面於室溫下攪拌,一面滴加甲氧化鈉(28%甲醇溶液)19.3g,於50℃下進行2小時加熱回流。冷卻至室溫後,滴化溴乙酸13.9g,進行5小時加熱回流。添加飽和氯化銨200mL、乙酸乙酯100mL,將萃取.分液所得的有機層濃縮,藉此獲得12.4g的化合物A2-12。 Into a three-necked flask, 7.2 g of β-propiolactone and 100 mL of methanol were introduced, and while stirring at room temperature, 19.3 g of sodium methoxide (28% methanol solution) was added dropwise thereto, and the mixture was heated under reflux at 50° C. for 2 hours. After cooling to room temperature, 13.9 g of bromoacetic acid was added dropwise, and the mixture was heated under reflux for 5 hours. Add 200 mL of saturated ammonium chloride and 100 mL of ethyl acetate to extract. The organic layer obtained by liquid separation was concentrated, whereby 12.4 g of Compound A2-12 was obtained.

化合物A2-13的合成例 Synthesis example of compound A2-13

使用2,2,2-三氟乙醇代替2-乙基己醇,利用與化合物A2-3相 同的方法進行合成。 Use 2,2,2-trifluoroethanol instead of 2-ethylhexanol, using phase with compound A2-3 The same method is used for the synthesis.

化合物A2-18的合成例 Synthesis example of compound A2-18

使用水楊酸甲酯代替2-乙基己醇,利用與化合物A2-3相同的方法進行合成。 The synthesis was carried out in the same manner as in the compound A2-3 using methyl salicylate instead of 2-ethylhexanol.

化合物A2-19的合成例 Synthesis example of compound A2-19

使用四氫吡喃-2-甲醇代替2-乙基己醇,利用與化合物A2-3相同的方法進行合成。 The synthesis was carried out in the same manner as in the compound A2-3 using tetrahydropyran-2-methanol instead of 2-ethylhexanol.

化合物A2-21的合成例 Synthesis example of compound A2-21

使用四氫糠醇代替2-乙基己醇,利用與化合物A2-3相同的方法進行合成。 The synthesis was carried out in the same manner as in the compound A2-3 using tetrahydrofurfuryl alcohol instead of 2-ethylhexanol.

化合物A2-22的合成例 Synthesis example of compound A2-22

使用糠醇代替2-乙基己醇,利用與化合物A2-3相同的方法進行合成。 The synthesis was carried out in the same manner as in the compound A2-3 using decyl alcohol instead of 2-ethylhexanol.

化合物A2-23的合成例 Synthesis example of compound A2-23

利用「聚合物(Polymer)」(2013,54,2924)中記載的方法進行合成。 The synthesis was carried out by the method described in "Polymer" (2013, 54, 2924).

化合物A2-24的合成例 Synthesis example of compound A2-24

使用3-丁烯-1-醇代替2-乙基己醇,利用與化合物A2-3相同的方法進行合成。 The synthesis was carried out in the same manner as in the compound A2-3 using 3-buten-1-ol in place of 2-ethylhexanol.

化合物A2-28的合成例 Synthesis Example of Compound A2-28

使用1,6-庚二烯-4-醇代替2-乙基己醇,利用與化合物A2-3相同的方法進行合成。 The synthesis was carried out in the same manner as in the compound A2-3 using 1,6-heptadien-4-ol in place of 2-ethylhexanol.

化合物A2-29的合成例 Synthesis example of compound A2-29

於三口燒瓶中導入2-溴丙酸15.3g、甲醇100mL,一面於室溫下攪拌,一面滴加甲氧化鈉(28%甲醇溶液)19.3g,於50℃下加熱回流12小時。將反應液減壓濃縮,添加1N稀鹽酸100mL、乙酸乙酯100mL,將萃取.分液所得的有機層濃縮,藉此獲得10.4g的化合物A2-12。 Into a three-necked flask, 15.3 g of 2-bromopropionic acid and 100 mL of methanol were introduced, and while stirring at room temperature, 19.3 g of sodium methoxide (28% methanol solution) was added dropwise thereto, and the mixture was heated under reflux at 50 ° C for 12 hours. The reaction solution was concentrated under reduced pressure, and then 1N diluted hydrochloric acid (100 mL) and ethyl acetate (100 mL) were added to extract. The organic layer obtained by liquid separation was concentrated, whereby 10.4 g of Compound A2-12 was obtained.

化合物A2-31的合成例 Synthesis Example of Compound A2-31

利用「美國化學會期刊(J.Am.Chem.Soc.)」(1948,70,1157)中記載的方法進行合成。 The synthesis was carried out by the method described in "J. Am. Chem. Soc." (1948, 70, 1157).

化合物A2-34的合成例 Synthesis example of compound A2-34

使用利用「有機化學期刊(J.Org.Chem.)」(1957,23,1785.)中記載的方法合成的溴氟乙酸代替2-溴丙酸,利用與化合物A2-29相同的方法進行合成。 The synthesis was carried out in the same manner as in the compound A2-29 by using bromofluoroacetic acid synthesized by the method described in J. Org. Chem. (1957, 23, 1785.) instead of 2-bromopropionic acid. .

化合物A2-36的合成例 Synthesis example of compound A2-36

於三口燒瓶中,於氮氣環境下導入四氫吡喃-2-甲醇25.0g、乙腈375g,一面於室溫下攪拌,一面依序導入2,2,6,6-四甲基哌 啶-1-氧基(TEMPO)2.4g、pH值為6.8的磷酸緩衝液375g、亞氯酸鈉38.9g。於其中緩慢滴加次氯酸鈉的4質量%水溶液200.3g後,於40℃下攪拌6小時。冷卻至室溫後,導入飽和碳酸氫鈉水溶液700mL、亞硫酸鈉68g。利用乙酸乙酯進行3次清洗(400mL、300mL、300mL),緩慢添加濃鹽酸直至pH值調整為2為止。 利用乙酸乙酯進行3次萃取.分液(300mL×3),對所得的有機層以水300mL、繼而以飽和氯化鈉水溶液300mL進行清洗,加以減壓濃縮,藉此獲得22.3g的化合物2-36。 In a three-necked flask, 25.0 g of tetrahydropyran-2-methanol and 375 g of acetonitrile were introduced under a nitrogen atmosphere, and while stirring at room temperature, 2,2,6,6-tetramethylperazine was sequentially introduced. There were 2.4 g of pyridine-1-oxyl (TEMPO), 375 g of a phosphate buffer having a pH of 6.8, and 38.9 g of sodium chlorite. After 200.3 g of a 4% by mass aqueous solution of sodium hypochlorite was slowly added dropwise thereto, the mixture was stirred at 40 ° C for 6 hours. After cooling to room temperature, 700 mL of a saturated aqueous sodium hydrogencarbonate solution and 68 g of sodium sulfite were introduced. The mixture was washed three times with ethyl acetate (400 mL, 300 mL, 300 mL), and concentrated hydrochloric acid was slowly added until the pH was adjusted to 2. 3 extractions with ethyl acetate. The obtained organic layer was washed with 300 mL of water, followed by 300 mL of a saturated aqueous sodium chloride solution, and concentrated under reduced pressure to obtain 22.3 g of Compound 2-36.

化合物A2-40的合成例 Synthesis example of compound A2-40

於三口燒瓶中,於氮氣環境下導入乙二醇12.4g、四氫呋喃(市售脫水溶劑)200mL,冷卻至0℃。於其中導入氫化鈉(60%分散液)16.0g,於0℃下攪拌30分鐘。於其中滴加溴乙酸55.6g,於室溫下攪拌5小時。添加飽和氯化銨200mL、乙酸乙酯100mL,將萃取.分液所得的有機層濃縮,藉此獲得32.4g的化合物A2-3。 Into a three-necked flask, 12.4 g of ethylene glycol and 200 mL of tetrahydrofuran (a commercially available dehydrating solvent) were introduced under a nitrogen atmosphere, and the mixture was cooled to 0 °C. 16.0 g of sodium hydride (60% dispersion) was introduced thereinto, and the mixture was stirred at 0 ° C for 30 minutes. 55.6 g of bromoacetic acid was added dropwise thereto, and the mixture was stirred at room temperature for 5 hours. Add 200 mL of saturated ammonium chloride and 100 mL of ethyl acetate to extract. The organic layer obtained by liquid separation was concentrated, whereby 32.4 g of Compound A2-3 was obtained.

化合物A2-41的合成例 Synthesis Example of Compound A2-41

使用二乙二醇代替乙二醇,利用與化合物A2-40相同的方法進行合成。 The synthesis was carried out in the same manner as in the case of the compound A2-40, using diethylene glycol instead of ethylene glycol.

化合物A2-42的合成例 Synthesis Example of Compound A2-42

使用2,2-二乙基-1,3-丙二醇代替乙二醇,利用與化合物A2-40相同的方法進行合成。 The synthesis was carried out in the same manner as in the compound A2-40 using 2,2-diethyl-1,3-propanediol in place of ethylene glycol.

化合物A2-44的合成例 Synthesis example of compound A2-44

使用順式-1,2-環己二醇代替乙二醇,利用與化合物A2-40相同的方法進行合成。 The synthesis was carried out in the same manner as in the compound A2-40, using cis-1,2-cyclohexanediol instead of ethylene glycol.

於本實施例中,採用以下簡稱。 In the present embodiment, the following abbreviation is employed.

<化合物(A)> <compound (A)>

化合物A1-1~化合物A1-42:表示所述化合物A1-1~化合物A1-42。 Compound A1-1 to Compound A1-42: represents the compound A1-1 to the compound A1-42.

化合物A2-1~化合物A2-44:表示下述化合物。 Compound A2-1 to Compound A2-44: represent the following compounds.

<硬化性化合物> <hardening compound>

卡亞拉得(KAYARAD)DPHA:(日本化藥公司製造,二季戊四醇五丙烯酸酯與二季戊四醇六丙烯酸酯的混合物) KAYARAD DPHA: (a mixture of dipentaerythritol pentaacrylate and dipentaerythritol hexaacrylate manufactured by Nippon Kayaku Co., Ltd.)

JER157S65:(三菱化學公司製造,特殊酚醛清漆型環氧樹脂) JER157S65: (manufactured by Mitsubishi Chemical Corporation, special novolak type epoxy resin)

卡亞拉得(KAYARAD)D-320:(日本化藥公司製造,二季戊四醇四丙烯酸酯) KAYARAD D-320: (manufactured by Nippon Kayaku Co., Ltd., dipentaerythritol tetraacrylate)

M-510:(東亞合成公司製造,多元酸改質丙烯酸系寡聚物) M-510: (manufactured by Toagosei Co., Ltd., polyacid-modified acrylic oligomer)

M-520:(東亞合成公司製造,多元酸改質丙烯酸系寡聚物) M-520: (manufactured by Toagosei Co., Ltd., polyacid-modified acrylic oligomer)

DPCA-60:(日本化藥公司製造,具有6個伸戊氧基鏈的六官能丙烯酸酯) DPCA-60: (manufactured by Nippon Kagaku Co., Ltd., hexafunctional acrylate with 6 pentyloxy chains)

<溶劑> <solvent>

PGMEA:丙二醇單甲醚乙酸酯 PGMEA: propylene glycol monomethyl ether acetate

<銅錯合物的合成> <Synthesis of copper complexes> <銅錯合物1-1的合成> <Synthesis of Copper Complex 1-1>

將化合物A1-1的鈉鹽(814mg,2.97mmol)溶解於水50ml中。使該溶液昇溫至50℃後,滴加硫酸銅五水合物(739mg,2.97mmol)的水溶液(50ml),於50℃下反應2小時。反應結束後,冷卻至室溫,藉由過濾來回收所析出的固體,藉此獲得銅錯合物1-1(1.00g)。 The sodium salt of Compound A1-1 (814 mg, 2.97 mmol) was dissolved in 50 ml of water. After the solution was heated to 50 ° C, an aqueous solution (50 ml) of copper sulfate pentahydrate (739 mg, 2.97 mmol) was added dropwise, and the mixture was reacted at 50 ° C for 2 hours. After completion of the reaction, the mixture was cooled to room temperature, and the precipitated solid was recovered by filtration, whereby copper complex 1-1 (1.00 g) was obtained.

(銅錯合物1-2~銅錯合物1-55的合成) (Synthesis of copper complex 1-2~copper complex 1-55)

銅錯合物1-2~銅錯合物1-55是利用依據所述銅錯合物1-1的合成法的方法而獲得。 The copper complex 1-2 to copper complex 1-55 was obtained by a method according to the synthesis method of the copper complex 1-1.

(銅錯合物2-1的合成) (Synthesis of Copper Complex 2-1)

將化合物A2-1(886mg,9.84mmol)溶解於甲醇20ml中。使該溶液昇溫至50℃後,滴加氫氧化銅(449mg、4.60mmol)的甲醇溶液(160ml),於50℃下反應2小時。反應結束後,利用蒸發器將所產生的水及溶劑蒸餾去除,藉此獲得銅錯合物2-1(1.00g)。 Compound A2-1 (886 mg, 9.84 mmol) was dissolved in 20 mL of methanol. After the temperature of the solution was raised to 50 ° C, a solution of copper hydroxide (449 mg, 4.60 mmol) in methanol (160 ml) was added dropwise, and the mixture was reacted at 50 ° C for 2 hours. After completion of the reaction, the produced water and solvent were distilled off by an evaporator, whereby copper complex 2-1 (1.00 g) was obtained.

(銅錯合物2-2~銅錯合物2-26的合成) (Synthesis of Copper Complex 2-2~ Copper Complex 2-26)

銅錯合物2-2~銅錯合物2-26是利用依據所述銅錯合物2-1 的合成法的方法而獲得。 Copper complex 2-2~copper complex 2-26 is utilized according to the copper complex 2-1 Obtained by the method of synthesis.

(銅錯合物2-27的合成) (Synthesis of copper complex 2-27)

將化合物A2-3的鈉鹽(1.00g,4.76mmol)溶解於甲醇20ml中,加熱至50℃後,滴加硫酸銅五水合物(0.73g,2.92mmol)的甲醇溶液(20ml)。於50℃下加熱1小時後,於冰水浴中將反應液冷卻至5℃,將反應液過濾。利用蒸發器將濾液濃縮,藉此獲得銅錯合物2-27(1.14g)。 The sodium salt of the compound A2-3 (1.00 g, 4.76 mmol) was dissolved in 20 ml of methanol, and the mixture was heated to 50 ° C, and then a solution of copper sulfate pentahydrate (0.73 g, 2.92 mmol) in methanol (20 ml) was added dropwise. After heating at 50 ° C for 1 hour, the reaction solution was cooled to 5 ° C in an ice water bath, and the reaction mixture was filtered. The filtrate was concentrated using an evaporator, whereby copper complex 2-27 (1.14 g) was obtained.

(銅錯合物Cu4-36a的合成例) (Synthesis Example of Copper Complex Cu4-36a)

於100mL的燒瓶中導入乙酸銅(II)一水合物(和光純藥製造)1.99g、化合物A3-59(和光純藥製造)1.67g、甲醇20mL,進行10分鐘加熱回流。於其中添加化合物AA2-15(東京化成製造)1.84g,進而進行10分鐘加熱回流。將溶劑減壓濃縮至5mL左右,藉由添加水20mL而將析出的固體過濾,藉此進行修改,並以藍色固體的形式獲得銅錯合物Cu4-36a。 Into a 100 mL flask, 1.99 g of copper (II) acetate monohydrate (manufactured by Wako Pure Chemical Industries, Ltd.), 1.67 g of a compound A3-59 (manufactured by Wako Pure Chemical Industries, Ltd.), and 20 mL of methanol were introduced, and the mixture was heated under reflux for 10 minutes. 1.84 g of a compound AA2-15 (manufactured by Tokyo Chemical Industry Co., Ltd.) was added thereto, and further heated under reflux for 10 minutes. The solvent was concentrated under reduced pressure to about 5 mL, and the precipitated solid was filtered by adding 20 mL of water, thereby being modified, and the copper complex Cu4-36a was obtained as a blue solid.

(銅錯合物Cu4-39a的合成例) (Synthesis Example of Copper Complex Cu4-39a)

於200mL的燒瓶中添加4-甲基噻唑(東京化成製造)5.0g、乙酸銅(無水)(和光純藥製造)1.83g、甲苯100mL,進行12小時加熱回流。冷卻至室溫後添加水而對析出物進行過濾分離,然後添加乙酸乙酯對濾液進行分液.萃取。利用無水硫酸鎂對所得的有機相進行預乾燥並利用甲醇對減壓濃縮所得的褐色的粗產物(含有微量的原料)進行再結晶,藉此以淡黃色固體的形式獲得化合物AA2-22。使用該化合物,利用與銅錯合物Cu4-36a相同的方法加以錯合物化。 To a 200 mL flask, 5.0 g of 4-methylthiazole (manufactured by Tokyo Chemical Industry Co., Ltd.), 1.83 g of copper acetate (anhydrous) (manufactured by Wako Pure Chemical Industries, Ltd.), and 100 mL of toluene were added, and the mixture was heated under reflux for 12 hours. After cooling to room temperature, water was added and the precipitate was separated by filtration, and then the filtrate was separated by adding ethyl acetate. extraction. The obtained organic phase was pre-dried with anhydrous magnesium sulfate, and the crude brown product (containing a trace amount of the material) obtained by concentration under reduced pressure with methanol was recrystallized, whereby Compound AA-2-22 was obtained as a pale yellow solid. This compound was used for the complexation by the same method as the copper complex Cu4-36a.

(銅錯合物Cu4-45a的合成例) (Synthesis Example of Copper Complex Cu4-45a)

於500mL的三口燒瓶中,於氮氣環境下添加3,5-二甲基吡唑(東京化成製造)10g、二甲基亞碸60mL並進行攪拌。於其中逐次少量添加氫氧化鉀(和光純藥製造)23.3g,於60度下攪拌1小時。於其中滴加已溶解於二甲基亞碸40mL中的二溴甲烷(和光純藥製造)9g,於60度下攪拌4小時。冷卻至室溫後,滴加水 200mL,利用氯仿進行萃取後,將利用水、飽和食鹽水進行清洗所得的有機相減壓濃縮,藉此以白色固體的形式獲得化合物AA2-32。使用該化合物,利用與銅錯合物Cu4-36a相同的方法加以錯合物化。 In a 500 mL three-necked flask, 10 g of 3,5-dimethylpyrazole (manufactured by Tokyo Chemical Industry Co., Ltd.) and 60 mL of dimethyl hydrazine were added and stirred under a nitrogen atmosphere. 23.3 g of potassium hydroxide (manufactured by Wako Pure Chemical Industries, Ltd.) was added in small portions, and the mixture was stirred at 60 ° C for 1 hour. 9 g of dibromomethane (manufactured by Wako Pure Chemical Industries, Ltd.) dissolved in 40 mL of dimethyl hydrazine was added dropwise thereto, and the mixture was stirred at 60 ° C for 4 hours. After cooling to room temperature, add water After extracting with chloroform, 200 mL of the organic phase obtained by washing with water and saturated brine was concentrated under reduced pressure to obtain Compound AA2-32 as a white solid. This compound was used for the complexation by the same method as the copper complex Cu4-36a.

(銅錯合物Cu4-49a的合成例) (Synthesis Example of Copper Complex Cu4-49a)

於100mL的燒瓶中添加化合物AA2-32 0.20g、乙酸銅(II)一水合物(和光純藥製造)0.19g、甲醇10mL,一面攪拌一面自室溫昇溫至40度,攪拌30分鐘。於慢慢溶解而成為藍色溶液後,滴加溶解有化合物A3-96(東京化成製造)0.15g與50重量%氫氧化鈉水溶液0.16g的甲醇溶液10mL。藉由將緩慢析出的藍白色固體過濾而回收,獲得0.16g的銅錯合物Cu4-49a。 To a 100 mL flask, 0.20 g of compound AA2-32, 0.19 g of copper (II) acetate monohydrate (manufactured by Wako Pure Chemical Industries, Ltd.), and 10 mL of methanol were added, and the mixture was heated from room temperature to 40 °C while stirring, and stirred for 30 minutes. After slowly dissolving and forming a blue solution, 10 mL of a methanol solution in which 0.15 g of a compound A3-96 (manufactured by Tokyo Chemical Industry Co., Ltd.) and 0.16 g of a 50% by weight aqueous sodium hydroxide solution were dissolved was added dropwise. It was recovered by filtering a slowly precipitated blue-white solid to obtain 0.16 g of a copper complex Cu4-49a.

(銅錯合物Cu4-52a的合成例) (Synthesis Example of Copper Complex Cu4-52a)

使用由東京化成作為白屈菜胺酸(chelidamic acid)一水合物而市售的化合物A3-103,利用與銅錯合物Cu4-49a相同的方法進行合成。 The synthesis was carried out by the same method as the copper complex Cu4-49a using a compound A3-103 commercially available from Tokyo Chemical Co., Ltd. as a chelatemic acid monohydrate.

<近紅外線吸收性組成物的評價> <Evaluation of Near Infrared Absorbing Composition> <<近紅外線吸收性組成物的製備>> <<Preparation of near-infrared absorbing composition>> (實施例1-1) (Example 1-1)

將下述化合物混合,製備實施例1-1的近紅外線吸收性組成物。 The near-infrared absorbing composition of Example 1-1 was prepared by mixing the following compounds.

除了將銅錯合物1-1變更為銅錯合物1-2~銅錯合物1-55以外,設定為與實施例1-1相同的組成,藉此製備各實施例的近紅外線吸收性組成物。 The near-infrared absorption of each of the examples was prepared except that the copper complex 1-1 was changed to the copper complex 1-2 to the copper complex 1-55, and the same composition as in Example 1-1 was set. Sexual composition.

(實施例2-1) (Example 2-1)

將下述化合物混合,製備實施例2-1的近紅外線吸收性組成物。 The near-infrared absorbing composition of Example 2-1 was prepared by mixing the following compounds.

除了將銅錯合物2-1變更為銅錯合物2-2~銅錯合物2-27或乙酸銅以外,設定為與實施例2-1相同的組成,藉此製備各實施例及比較例的近紅外線吸收性組成物。 The examples were prepared in the same manner as in Example 2-1 except that the copper complex 2-1 was changed to the copper complex 2-2 to the copper complex 2-27 or copper acetate. The near-infrared absorbing composition of the comparative example.

<<近紅外線截止濾波器的製作>> <<Making of near infrared cutoff filter>>

於玻璃基板上塗佈光阻劑,藉由微影進行圖案化而形成光阻劑的隔離壁,從而形成近紅外線吸收性組成物的滴加區域。分別滴加實施例及比較例中製備的近紅外線吸收性組成物3ml。將該帶有塗佈膜的基板於室溫下放置24小時,藉此使其乾燥後,評價塗佈膜厚,結果膜厚為192μm。 A photoresist is applied onto the glass substrate, and patterned by lithography to form a partition wall of the photoresist, thereby forming a dropping region of the near-infrared absorbing composition. 3 ml of the near-infrared absorbing composition prepared in the examples and the comparative examples were added dropwise. The substrate with the coating film was allowed to stand at room temperature for 24 hours, and after drying, the coating film thickness was evaluated, and as a result, the film thickness was 192 μm.

<<近紅外線遮蔽性評價>> <<Near infrared shielding evaluation>>

使用分光光度計U-4100(日立高新技術(Hitachi High-technologies)公司製造),對所得的近紅外線截止濾波器的波長800nm的透射率進行測定。按照以下基準來評價近紅外線遮蔽性。 The transmittance of the obtained near-infrared cut filter at a wavelength of 800 nm was measured using a spectrophotometer U-4100 (manufactured by Hitachi High-Technologies Co., Ltd.). The near-infrared shielding property was evaluated in accordance with the following criteria.

A:800nm的透射率≦5% A: Transmittance at 800 nm ≦5%

B:5%<800nm的透射率≦7% B: 5% <800 nm transmittance ≦7%

C:7%<800nm的透射率≦10% C: transmittance of 7% < 800 nm ≦ 10%

D:10%<800nm的透射率 D: transmittance of 10% < 800 nm

<<耐熱性評價>> <<Heat resistance evaluation>>

將所得的近紅外線截止濾波器於200℃下放置5分鐘。於耐熱性試驗前與耐熱性試驗後,分別使用分光光度計U-4100(日立高新技術(Hitachi High-technologies)公司製造),測定近紅外線截止濾波器的波長700nm~1400nm下的最大吸光度(Absλmax)、及波長400nm~700nm下的最小吸光度(Absλmin),求出「Absλmax/Absλmin」所表示的吸光度比。 The obtained near-infrared cut filter was allowed to stand at 200 ° C for 5 minutes. Before the heat resistance test and the heat resistance test, the maximum absorbance at a wavelength of 700 nm to 1400 nm of the near-infrared cut filter (Absλmax) was measured using a spectrophotometer U-4100 (manufactured by Hitachi High-technologies Co., Ltd.). And the minimum absorbance (Absλmin) at a wavelength of 400 nm to 700 nm, and the absorbance ratio expressed by "Absλmax/Absλmin" is obtained.

按照以下基準來評價|((試驗前的吸光度比-試驗後的吸光 度比)/試驗前的吸光度比)×100|(%)所表示的吸光度比變化率。將結果示於以下的表中。 Evaluation according to the following criteria|((absorbance ratio before test - absorbance after test) The ratio of the absorbance ratio expressed by the ratio of absorbance before the test to the ratio of ×100|(%). The results are shown in the table below.

A:吸光度比變化率≦2% A: Absorbance ratio change rate ≦2%

B:2%<吸光度比變化率≦4% B: 2% < absorbance ratio change rate ≦ 4%

C:4%<吸光度比變化率≦7% C: 4% < absorbance ratio change rate ≦ 7%

D:7%<吸光度比變化率 D: 7% < absorbance ratio change rate

由所述表明確得知,實施例的近紅外線吸收性組成物於 製成硬化膜時,亦可提高近紅外線範圍內的遮蔽性。進而得知,實施例的近紅外線截止濾波器均是波長550nm的光透射率為80%以上,可提高可見光範圍內的透射性及近紅外線範圍內的遮蔽性。另外亦可確認到,實施例的近紅外線截止濾波器於波長450nm~550nm的範圍內的光透射率為85%以上,波長800nm~900nm的範圍內的光透射率為20%以下。另外亦得知,實施例的近紅外線截止濾波器可確保高透射率的可見光範圍廣,分光特性優異。 It is clear from the table that the near-infrared absorbing composition of the examples is When the cured film is formed, the shielding property in the near-infrared range can also be improved. Further, it is understood that the near-infrared cut-off filters of the examples have a light transmittance of 80% or more at a wavelength of 550 nm, and can improve transmittance in the visible light range and shielding properties in the near-infrared range. Further, it was also confirmed that the near-infrared cut filter of the example has a light transmittance of 85% or more in a wavelength range of 450 nm to 550 nm and a light transmittance of 20% or less in a wavelength range of 800 nm to 900 nm. Further, it is also known that the near-infrared cut filter of the embodiment can ensure a wide visible light range with high transmittance and excellent spectral characteristics.

實施例1-1、實施例1-2、實施例1-12、實施例1-13、實施例1-22~實施例1-24、實施例1-26、實施例1-30、實施例1-31、實施例1-35、實施例1-36及實施例1-38中,溶液狀態下的可見光範圍內的透射性特別良好。 Example 1-1, Example 1-2, Example 1-12, Example 1-13, Example 1-22 to Example 1-24, Example 1-26, Example 1-30, Example In Examples 1-31, Examples 1-35, Examples 1-36, and Examples 1-38, the transmittance in the visible light range in a solution state was particularly good.

可知:實施例1-1、實施例1-2、實施例1-12、實施例1-13、實施例1-22~實施例1-24、實施例1-26、實施例1-30、實施例1-31、實施例1-35、實施例1-36及實施例1-38的近紅外線吸收性組成物的400nm~500nm下的光透射性特別優異,光透射率為90%以上。 It can be seen that the embodiment 1-1, the embodiment 1-2, the embodiment 1-12, the embodiment 1-13, the embodiment 1-22 to the embodiment 1-24, the embodiment 1-26, the embodiment 1-30, The near-infrared absorbing composition of Example 1-31, Example 1-35, Example 1-36, and Example 1-38 was particularly excellent in light transmittance at 400 nm to 500 nm, and the light transmittance was 90% or more.

可知:使用實施例1-13、實施例1-22及實施例1-23的近紅外線吸收性組成物所得的近紅外線截止濾波器於可見光範圍內的透射性特別良好。 It was found that the near-infrared cut filter obtained by using the near-infrared absorbing compositions of Examples 1-13, 1-22 and 1-23 was particularly excellent in transmittance in the visible light range.

另一方面得知,比較例的近紅外線吸收性組成物與實施例相比較,於製成硬化膜時難以兼具可見光範圍內的透射性及近紅外線範圍內的遮蔽性。 On the other hand, it is found that the near-infrared absorbing composition of the comparative example is less likely to have both the transmittance in the visible light range and the shielding property in the near-infrared range when the cured film is formed as compared with the examples.

另外,於實施例1-1~實施例1-55及實施例2-1~實施 例2-27的近紅外線吸收性組成物中,將聚合性化合物(卡亞拉得(KAYARAD)DPHA)20質量份變更為等量的卡亞拉得(KAYARAD)D-320、卡亞拉得(KAYARAD)M-510、卡亞拉得(KAYARAD)M-520或卡亞拉得(KAYARAD)DPCA-60,除此以外,可與該些實施例同樣地獲得近紅外線截止濾波器。該些近紅外線截止濾波器亦可提高於製成硬化膜時的可見光範圍內的透 射性及近紅外線範圍內的遮蔽性。 In addition, in Examples 1-1 to 1-55 and Example 2-1~ In the near-infrared absorbing composition of Example 2-27, 20 parts by mass of a polymerizable compound (KAYARAD DPHA) was changed to an equivalent amount of KAYARAD D-320, Kayad A near-infrared cut filter can be obtained in the same manner as in the above embodiments except for M-510, KAYARAD M-520 or KAYARAD DPCA-60. The near-infrared cut-off filters can also be improved in the visible light range when the cured film is formed. Shedding in the range of irradiance and near infrared.

另外,於實施例1-1~實施例1-55及實施例2-1~實施 例2-27的近紅外線吸收性組成物中,將聚合性化合物(卡亞拉得(KAYARAD)DPHA)20質量份變更為等量的卡亞拉得(KAYARAD)D-310、卡亞拉得(KAYARAD)D-330、卡亞拉得(KAYARAD)DPCA-20、卡亞拉得(KAYARAD)DPCA-30、卡亞拉得(KAYARAD)DPCA-120(以上為日本化藥股份有限公司製造)、M-305、M-460(東亞合成製造)、A-TMMT(新中村化學製造)、SR-494(沙多瑪(Sartomer)公司製造)、代那考爾(Denacol)EX-212L(長瀨化成(Nagase Chemtex)(股)製造)或JER-157S65(三菱化學(股)製造),除此以外,可與該些實施例同樣地獲得近紅外線截止濾波器。該些近紅外線截止濾波器亦與實施例2-1的近紅外線截止濾波器同樣地可獲得優異的效果。 In addition, in Examples 1-1 to 1-55 and Example 2-1~ In the near-infrared absorbing composition of Example 2-27, 20 parts by mass of a polymerizable compound (KAYARAD DPHA) was changed to an equivalent amount of KAYARAD D-310, Kayad (KAYARAD) D-330, KAYARAD DPCA-20, KAYARAD DPCA-30, KAYARAD DPCA-120 (above manufactured by Nippon Kayaku Co., Ltd.) , M-305, M-460 (made in East Asia), A-TMMT (manufactured by Shin-Nakamura Chemical Co., Ltd.), SR-494 (manufactured by Sartomer), and Denacol EX-212L (long A near-infrared cut filter can be obtained in the same manner as in the above examples, except that Nagase Chemtex (manufactured by Nagase Chemtex) or JER-157S65 (manufactured by Mitsubishi Chemical Corporation). These near-infrared cut filters also have excellent effects similarly to the near-infrared cut filter of the embodiment 2-1.

另外,即便於實施例1-1~實施例1-55及實施例2-1~實施例2-27的近紅外線吸收性組成物中,將銅錯合物相對於組成物的總固體成分的含量設定為15質量%、20質量%、30質量%或40質量%的情形時,亦與該些實施例同樣地可獲得優異的近紅外線遮光能力。 Further, even in the near-infrared absorbing compositions of Examples 1-1 to 1-55 and Examples 2-1 to 2-27, the copper complex was added to the total solid content of the composition. When the content is set to 15% by mass, 20% by mass, 30% by mass or 40% by mass, excellent near-infrared light-shielding ability can be obtained in the same manner as in the above examples.

另外,即便於實施例1-1~實施例1-55及實施例2-1~實施例2-27的近紅外線吸收性組成物中,將溶劑(PGMEA)的含量設定為10質量%、20質量%、30質量%或40質量%的情形時,亦與該些近紅外線吸收性組成物同樣地可獲得優異的塗佈性。 Further, even in the near-infrared absorbing compositions of Examples 1-1 to 1-55 and Examples 2-1 to 2-27, the content of the solvent (PGMEA) was set to 10% by mass and 20%. In the case of % by mass, 30% by mass or 40% by mass, excellent coating properties can be obtained similarly to the near-infrared absorbing compositions.

另外,於實施例1-1~實施例1-55及實施例2-1~實施例2-27的近紅外線吸收性組成物中,於製備各組成物後使用日本頗爾製造的DFA421NXEY(0.45μm尼龍過濾器)進行過濾的情形時,亦可獲得相同的效果。 Further, in the near-infrared absorbing compositions of Examples 1-1 to 1-55 and Examples 2-1 to 2-27, DFA421NXEY (0.45 manufactured by Pall Japan) was used after preparing each composition. When the μm nylon filter is used for filtration, the same effect can be obtained.

(實施例3-1) (Example 3-1)

將下述化合物混合,製備實施例3-1的近紅外線吸收性組成物。 The near-infrared absorbing composition of Example 3-1 was prepared by mixing the following compounds.

除了將銅錯合物Cu4-36a變更為銅錯合物Cu4-39a、銅錯合物Cu4-45a、銅錯合物Cu4-49a、銅錯合物Cu4-52a以外,設定為與實施例3-1相同的組成,藉此製備各實施例的近紅外線吸收性組成物。 Except that the copper complex Cu4-36a was changed to the copper complex Cu4-39a, the copper complex Cu4-45a, the copper complex Cu4-49a, and the copper complex Cu4-52a, it was set as in Example 3. The same composition of -1 was used, whereby the near-infrared absorbing composition of each example was prepared.

<近紅外線截止濾波器的製作> <Production of near-infrared cut filter>

使用所述近紅外線吸收性組成物來製作近紅外線截止濾波器。 A near-infrared cut filter is fabricated using the near-infrared absorbing composition.

於玻璃基板上塗佈光阻劑,藉由微影進行圖案化而形成光阻劑的隔離壁,從而形成近紅外線吸收性組成物的滴加區域。於玻璃基板上的滴加區域內滴加各近紅外線吸收性組成物3ml,於室溫下放置24小時,藉此使其乾燥。評價乾燥後的塗佈膜的膜厚, 結果膜厚為100μm。 A photoresist is applied onto the glass substrate, and patterned by lithography to form a partition wall of the photoresist, thereby forming a dropping region of the near-infrared absorbing composition. 3 ml of each near-infrared absorbing composition was dropped on the dropping area on the glass substrate, and left at room temperature for 24 hours to be dried. Evaluation of the film thickness of the coated film after drying, As a result, the film thickness was 100 μm.

<銅錯合物的最大吸收波長、莫耳吸光係數及克吸光係數的測定> <Measurement of Maximum Absorption Wavelength, Molar Absorption Coefficient, and Gram Absorption Coefficient of Copper Complexes>

將各種銅錯合物溶解於表中記載的溶劑中而製備濃度為1g/L的溶液。接著,使用島津製作所製造的UV-1800測定溶解有銅錯合物的溶液的吸收光譜,並測定最大吸收波長、最大吸收波長下的莫耳吸光係數及克吸光係數、800nm下的莫耳吸光係數及克吸光係數。再者,表中,DMF表示N,N-二甲基甲醯胺,MFG表示丙二醇單甲醚。 A solution having a concentration of 1 g/L was prepared by dissolving various copper complexes in the solvent described in the table. Next, the absorption spectrum of the solution in which the copper complex was dissolved was measured using UV-1800 manufactured by Shimadzu Corporation, and the maximum absorption wavelength, the molar absorption coefficient at the maximum absorption wavelength, the gram absorption coefficient, and the molar absorption coefficient at 800 nm were measured. And gram absorption coefficient. Further, in the table, DMF represents N,N-dimethylformamide, and MFG represents propylene glycol monomethyl ether.

<<近紅外線遮蔽性評價>> <<Near infrared shielding evaluation>>

使用分光光度計U-4100(日立高新技術(Hitachi High-technologies)公司製造),對如上述般獲得的近紅外線截止濾波器的波長800nm的透射率進行測定。按照以下基準來評價近紅外線遮蔽性。將結果示於以下的表中。 The transmittance of the near-infrared cut filter obtained as described above at a wavelength of 800 nm was measured using a spectrophotometer U-4100 (manufactured by Hitachi High-Technologies Co., Ltd.). The near-infrared shielding property was evaluated in accordance with the following criteria. The results are shown in the table below.

A:800nm的透射率≦5% A: Transmittance at 800 nm ≦5%

B:5%<800nm的透射率≦25% B: 5% <800 nm transmittance ≦ 25%

C:25%<800nm的透射率 C: transmittance of 25% <800 nm

<<可見光透射性評價>> <<visible light transmittance evaluation>>

使用分光光度計U-4100(日立高新技術(Hitachi High-technologies)公司製造),對如上述般獲得的近紅外線截止濾波器的波長550nm的透射率進行測定。按照以下基準來評價可見光透射性。將結果示於以下的表中。 The transmittance of the near-infrared cut filter obtained as described above at a wavelength of 550 nm was measured using a spectrophotometer U-4100 (manufactured by Hitachi High-Technologies Co., Ltd.). The visible light transmittance was evaluated in accordance with the following criteria. The results are shown in the table below.

A:85%≦波長550nm的透射率 A: 85% 透射 wavelength 550nm transmittance

B:45%≦波長550nm的透射率<85% B: 45% ≦ wavelength 550nm transmittance <85%

C:波長550nm的透射率<45% C: transmittance at a wavelength of 550 nm <45%

如所述表所示,由所述表明確得知,實施例的近紅外線吸收性組成物於製成硬化膜時亦可提高近紅外線範圍內的遮蔽性。進而可見光透射性亦良好。 As is apparent from the above table, the near-infrared absorbing composition of the example can also improve the shielding property in the near-infrared range when the cured film is formed. Further, the visible light transmittance is also good.

另外,於實施例3-1~實施例3-5的近紅外線吸收性組成物中,將聚合性化合物(卡亞拉得(KAYARAD)DPHA)20質量份變更為等量的卡亞拉得(KAYARAD)D-320、卡亞拉得(KAYARAD)M-510、卡亞拉得(KAYARAD)M-520或卡亞拉得(KAYARAD)DPCA-60,除此以外,可與該些實施例同樣地獲得近紅外線截止濾波器。該些近紅外線截止濾波器亦可提高於製成硬化膜時的可見光範圍內的透射性及近紅外線範圍內的遮蔽性。 Further, in the near-infrared absorbing composition of Example 3-1 to Example 3-5, 20 parts by mass of a polymerizable compound (KAYARAD DPHA) was changed to an equivalent amount of Kayarad ( KAYARAD) D-320, KAYARAD M-510, KAYARAD M-520 or KAYARAD DPCA-60, except for these embodiments A near-infrared cut filter is obtained. These near-infrared cut filters can also improve the transmittance in the visible light range and the shielding property in the near-infrared range when the cured film is formed.

另外,於實施例3-1~實施例3-5的近紅外線吸收性組成物中,將聚合性化合物(卡亞拉得(KAYARAD)DPHA)20質量份變更為等量的卡亞拉得(KAYARAD)D-310、卡亞拉得(KAYARAD)D-330、卡亞拉得(KAYARAD)DPCA-20、卡亞拉得(KAYARAD)DPCA-30、卡亞拉得(KAYARAD)DPCA-120(以上為日本化藥股份有限公司製造)、M-305、M-460(東亞合成製造)、A-TMMT(新中村化學製造)、SR-494(沙多瑪(Sartomer)公司製造)、代那考爾(Denacol)EX-212L(長瀨化成(Nagase Chemtex)(股)製造)或JER-157S65(三菱化學(股)製造),除此以外,可與該些實施例同樣地獲得近紅外線截止濾波器。 Further, in the near-infrared absorbing composition of Example 3-1 to Example 3-5, 20 parts by mass of a polymerizable compound (KAYARAD DPHA) was changed to an equivalent amount of Kayarad ( KAYARAD) D-310, KAYARAD D-330, KAYARAD DPCA-20, KAYARAD DPCA-30, KAYARAD DPCA-120 ( The above is manufactured by Nippon Kayaku Co., Ltd.), M-305, M-460 (made in East Asia), A-TMMT (manufactured by Shin-Nakamura Chemical Co., Ltd.), SR-494 (manufactured by Sartomer Co., Ltd.), Daina In addition to the above, the near-infrared cutoff can be obtained in the same manner as the above examples, except that Denacol EX-212L (manufactured by Nagase Chemtex Co., Ltd.) or JER-157S65 (manufactured by Mitsubishi Chemical Corporation). filter.

另外,即便於實施例3-1~實施例3-5的近紅外線吸收性組成物中,將銅錯合物相對於組成物的總固體成分的含量設定為15質量%、20質量%、30質量%或40質量%的情形時,亦與該些實施例同樣地可獲得優異的近紅外線遮光能力。 Further, even in the near-infrared absorbing composition of Examples 3-1 to 3-5, the content of the copper complex with respect to the total solid content of the composition was set to 15% by mass, 20% by mass, and 30%. In the case of % by mass or 40% by mass, excellent near-infrared light-shielding ability can be obtained in the same manner as in the above embodiments.

另外,即便於實施例3-1~實施例3-5的近紅外線吸收性組成物中,將溶劑(PGMEA)的含量設定為10質量%、20質量%、30質量%或40質量%的情形時,亦與該些近紅外線吸收性組成物同樣地可獲得優異的塗佈性。 Further, even in the near-infrared absorbing composition of Examples 3-1 to 3-5, the content of the solvent (PGMEA) was set to 10% by mass, 20% by mass, 30% by mass or 40% by mass. In the same manner, excellent coating properties can be obtained similarly to the near-infrared absorbing compositions.

另外,於實施例3-1~實施例3-5的近紅外線吸收性組成物中,於製備各組成物後使用日本頗爾製造的DFA421NXEY(0.45μm尼龍過濾器)進行過濾的情形時,亦可獲得相同的效果。 Further, in the near-infrared absorbing composition of Examples 3-1 to 3-5, when each composition was prepared and then filtered using DFA421NXEY (0.45 μm nylon filter) manufactured by Pall Japan, The same effect can be obtained.

Claims (18)

一種近紅外線吸收性組成物,其含有銅錯合物,所述銅錯合物是使具有以陰離子進行配位的配位部位與以非共價電子對進行配位的配位原子的化合物(A)與銅成分反應而成。 A near-infrared absorbing composition containing a copper complex which is a compound having a coordination site coordinated by an anion and a coordination atom coordinated by a non-covalent electron pair ( A) It is formed by reacting with copper components. 一種近紅外線吸收性組成物,其含有銅錯合物,所述銅錯合物是將銅作為中心金屬、且將具有以陰離子進行配位的配位部位與以非共價電子對進行配位的配位原子的化合物(A)作為配位體。 A near-infrared absorbing composition containing a copper complex which has copper as a central metal and has a coordination site coordinated by an anion and coordinated with a non-covalent electron pair The compound (A) of the coordinating atom serves as a ligand. 如申請專利範圍第1項或第2項所述的近紅外線吸收性組成物,其中所述銅錯合物是藉由銅與所述化合物(A)而形成5員環及/或6員環。 The near-infrared absorbing composition according to claim 1 or 2, wherein the copper complex is formed by copper and the compound (A) to form a 5-membered ring and/or a 6-membered ring. . 如申請專利範圍第1項或第2項所述的近紅外線吸收性組成物,其中所述化合物(A)中所述陰離子為氧陰離子、氮陰離子或硫陰離子,且所述以非共價電子對進行配位的配位原子為氧原子、氮原子、硫原子或磷原子。 The near-infrared absorbing composition according to claim 1 or 2, wherein the anion in the compound (A) is an oxyanion, a nitrogen anion or a sulfur anion, and the non-covalent electron The coordinating atom to be coordinated is an oxygen atom, a nitrogen atom, a sulfur atom or a phosphorus atom. 如申請專利範圍第1項或第2項所述的近紅外線吸收性組成物,其中將所述陰離子與所述以非共價電子對進行配位的配位原子連結的原子數為1~3。 The near-infrared absorbing composition according to claim 1 or 2, wherein the number of atoms linking the anion to the coordinating atom coordinated by the non-covalent electron pair is 1 to 3 . 如申請專利範圍第1項或第2項所述的近紅外線吸收性組成物,其中所述化合物(A)的分子量為50~1000。 The near-infrared absorbing composition according to the first or second aspect of the invention, wherein the compound (A) has a molecular weight of 50 to 1,000. 如申請專利範圍第1項或第2項所述的近紅外線吸收性組成物,其中所述化合物(A)為含有5員環或6員環的化合物,且 所述以非共價電子對進行配位的配位原子為構成5員環或6員環的原子。 The near-infrared absorbing composition according to claim 1 or 2, wherein the compound (A) is a compound having a 5-membered ring or a 6-membered ring, and The coordinating atom coordinated by a non-covalent electron pair is an atom constituting a 5-membered ring or a 6-membered ring. 如申請專利範圍第1項或第2項所述的近紅外線吸收性組成物,其中所述以非共價電子對進行配位的配位原子為氮原子。 The near-infrared absorbing composition according to claim 1 or 2, wherein the coordinating atom coordinated by the non-covalent electron pair is a nitrogen atom. 如申請專利範圍第8項所述的近紅外線吸收性組成物,其中鄰接於所述氮原子的原子為碳原子,且所述碳原子具有取代基。 The near-infrared absorbing composition according to claim 8, wherein an atom adjacent to the nitrogen atom is a carbon atom, and the carbon atom has a substituent. 如申請專利範圍第1項或第2項所述的近紅外線吸收性組成物,其中所述化合物(A)是由式(I)所表示; 式(I)中,X1表示含有所述以陰離子進行配位的配位部位的基團;Y1表示氮原子或磷原子,與鄰接的碳原子一起構成4員環~7員環;RX1表示取代基,n1表示0~6的整數。 The near-infrared absorbing composition according to claim 1 or 2, wherein the compound (A) is represented by the formula (I); In the formula (I), X 1 represents a group containing the coordination site coordinated by an anion; Y 1 represents a nitrogen atom or a phosphorus atom, and together with adjacent carbon atoms constitutes a 4-membered ring to a 7-membered ring; X1 represents a substituent, and n1 represents an integer of 0-6. 如申請專利範圍第10項所述的近紅外線吸收性組成物,其中所述式(I)中,Y1與鄰接的碳原子一起形成的環為芳香族環。 The near-infrared absorbing composition according to claim 10, wherein in the formula (I), a ring formed by Y 1 together with an adjacent carbon atom is an aromatic ring. 如申請專利範圍第1項或第2項所述的近紅外線吸收性組成物,其中所述以陰離子進行配位的配位部位為選自以下組群(AN)中的至少一種,組群(AN) 所述以非共價電子對進行配位的配位原子含有於環中,或含有於選自以下組群(UE)中的至少一種部分結構中,組群(UE) 波浪線為與構成所述化合物(A)的原子團的鍵結位置,X表示N或CR,R及R1分別獨立地表示氫原子、烷基、烯基、炔基、芳基或雜芳基,R2分別獨立地表示氫原子、烷基、烯基、炔基、芳基、雜芳基、烷氧基、芳氧基、雜芳氧基、烷硫基、 芳硫基、雜芳硫基、胺基或醯基。 The near-infrared absorbing composition according to claim 1 or 2, wherein the coordination site coordinated by the anion is at least one selected from the group consisting of (AN), a group ( AN) The coordinating atom coordinated by a non-covalent electron pair is contained in a ring or contained in at least one partial structure selected from the group consisting of (UE), group (UE) The wavy line is a bonding position with the atomic group constituting the compound (A), X represents N or CR, and R and R 1 each independently represent a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group or a heteroaryl group. R 2 independently represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group, a heteroaryl group, an alkoxy group, an aryloxy group, a heteroaryloxy group, an alkylthio group, an arylthio group or a heteroaromatic sulfur. Base, amine or sulfhydryl. 如申請專利範圍第1項或第2項所述的近紅外線吸收性組成物,其中所述化合物(A)是由以下通式(IV)所表示;X1-L1-Y1 通式(IV)通式(IV)中,X1表示選自以下組群(AN)中的至少一種以陰離子進行配位的配位部位,組群(AN) Y1表示含有所述以非共價電子對進行配位的配位原子的環,或選自以下組群(UE)中的至少一種含有以非共價電子對進行配位的配位原子的部分結構,組群(UE) 波浪線為與構成所述化合物(A)的原子團的鍵結位置,X表示N或CR,R及R1分別獨立地表示氫原子、烷基、烯基、炔基、芳基或雜芳基,R2分別獨立地表示氫原子、烷基、烯基、炔基、芳基、雜芳基、烷氧基、芳氧基、雜芳氧基、烷硫基、芳硫基、雜芳硫基、胺基或醯基,L1表示單鍵或二價連結基。 The near-infrared absorbing composition according to claim 1 or 2, wherein the compound (A) is represented by the following general formula (IV); and the X 1 -L 1 -Y 1 formula ( IV) In the general formula (IV), X 1 represents a coordination site selected from at least one of the following groups (AN), which is coordinated by an anion, group (AN) Y 1 represents a ring containing the coordinating atom coordinated by a non-covalent electron pair, or at least one selected from the group consisting of a coordinating atom coordinated by a non-covalent electron pair Partial structure, group (UE) The wavy line is a bonding position with the atomic group constituting the compound (A), X represents N or CR, and R and R 1 each independently represent a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group or a heteroaryl group. R 2 independently represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group, a heteroaryl group, an alkoxy group, an aryloxy group, a heteroaryloxy group, an alkylthio group, an arylthio group or a heteroaromatic sulfur. A group, an amine group or a thiol group, and L 1 represents a single bond or a divalent linking group. 如申請專利範圍第1項或第2項所述的近紅外線吸收性組成物,其更含有硬化性化合物及溶劑。 The near-infrared absorbing composition according to the first or second aspect of the invention, further comprising a curable compound and a solvent. 一種近紅外線截止濾波器,其是使如申請專利範圍第1項至第14項中任一項所述的近紅外線吸收性組成物硬化而成。 A near-infrared ray-cutting filter which is obtained by hardening a near-infrared absorbing composition according to any one of claims 1 to 14. 一種近紅外線截止濾波器的製造方法,其包括:於固體攝像元件的受光側,塗佈如申請專利範圍第1項至第14項中任一項所述的近紅外線吸收性組成物,藉此形成膜的步驟。 A method of manufacturing a near-infrared ray-cut filter, comprising: coating a near-infrared absorbing composition according to any one of claims 1 to 14 on the light-receiving side of the solid-state imaging device, whereby The step of forming a film. 一種照相機模組,其具有固體攝像元件、及配置於所述固體攝像元件的受光側的近紅外線截止濾波器,並且所述近紅外線 截止濾波器為使如申請專利範圍第1項至第14項中任一項所述的近紅外線吸收性組成物硬化而成的近紅外線截止濾波器。 A camera module having a solid-state imaging element and a near-infrared cut filter disposed on a light receiving side of the solid-state imaging element, and the near infrared ray The cut-off filter is a near-infrared cut filter obtained by hardening the near-infrared absorbing composition according to any one of the first to fourteenth aspects of the invention. 一種照相機模組的製造方法,其製造具有固體攝像元件、及配置於所述固體攝像元件的受光側的近紅外線截止濾波器的照相機模組,並且所述照相機模組的製造方法包括:於所述固體攝像元件的受光側,塗佈如申請專利範圍第1項至第14項中任一項所述的近紅外線吸收性組成物,藉此形成所述近紅外線截止濾波器的步驟。 A method of manufacturing a camera module, comprising: a solid-state image sensor; and a camera module disposed on a light-receiving side near-infrared cut filter of the solid-state image sensor; and the method of manufacturing the camera module includes: The step of forming the near-infrared cut filter by applying the near-infrared absorbing composition according to any one of claims 1 to 14 to the light-receiving side of the solid-state image sensor.
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