TW201521922A - Electrode structure for electrochemical processing and electrochemical processing device - Google Patents

Electrode structure for electrochemical processing and electrochemical processing device Download PDF

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TW201521922A
TW201521922A TW102144731A TW102144731A TW201521922A TW 201521922 A TW201521922 A TW 201521922A TW 102144731 A TW102144731 A TW 102144731A TW 102144731 A TW102144731 A TW 102144731A TW 201521922 A TW201521922 A TW 201521922A
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Taiwan
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electrode structure
electrode
workpiece
processing
electrochemical
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TW102144731A
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Chinese (zh)
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Shi-Chang Lian
Da-Yu Lin
qin-wei Liu
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Metal Ind Res & Dev Ct
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Abstract

This invention is to provide an electrode structure for electrochemical processing and an electrochemical processing device. The electrode structure comprises of an electrode body and a turbulent flow structure which is disposed on the surface of the electrode body. The electrolyte enters the space between the electrode structure and a workpiece while electrochemical processing is performed to the workpiece by the electrode structure, and the turbulent flow structure makes the electrolyte disturbed to change the flow field of the electrolyte, so as to effectively increase the processing efficiency of electrochemical process.

Description

電化學加工之電極結構及電化學加工裝置Electrochemical processing electrode structure and electrochemical processing device

本發明係有關於一種電極結構及加工裝置,其尤指一種用於電化學加工並可讓電解液擾動之電極結構及電化學加工裝置。
The invention relates to an electrode structure and a processing device, in particular to an electrode structure and an electrochemical processing device for electrochemical processing and disturbing an electrolyte.

電化學加工為非傳統加工之重要製程,其藉由陽極溶解原理在一工件上形成一預定加工結構,而且電化學加工之加工速度不受工件之材料硬度、強度及韌性的影響,仍可以離子態方式進行材料移除,所以電化學加工可用以對為難加工材料之工件進行加工,或者用以於工件上形成複雜形狀或難加工形狀。Electrochemical machining is an important process for non-traditional processing. It forms a predetermined processing structure on a workpiece by the principle of anodic dissolution, and the processing speed of electrochemical machining is not affected by the hardness, strength and toughness of the material of the workpiece. The material is removed, so electrochemical machining can be used to machine workpieces that are difficult to machine, or to form complex or difficult-to-machine shapes on the workpiece.

在電化學加工中,電極設計是重要工作之一,因電極設計關係到電化學加工之加工電場分佈及電解液流場分佈,而加工電場及電解液流場之分布皆會影響電化學加工之形狀精度,雖可以藉由調整加工參數解決部分加工電場及電解液流場之分布問題,但其效果不彰。所以,如在電化學加工前能針對預定加工之工件及預定形成於工件之加工形狀及效果而對電極進一步設計,以改變電化學加工之加工電場及電解液流場之分布,將對電化學加工之加工效果及效率有所提升。In electrochemical machining, electrode design is one of the important tasks. Because electrode design is related to the processing electric field distribution of electrochemical machining and the flow field distribution of electrolyte, the distribution of processing electric field and electrolyte flow field will affect electrochemical processing. Shape accuracy, although it is possible to solve the problem of partial processing electric field and electrolyte flow field distribution by adjusting processing parameters, but the effect is not good. Therefore, if the workpiece can be further designed for the predetermined processing workpiece and the shape and effect of the workpiece formed before the electrochemical machining, in order to change the processing electric field of the electrochemical processing and the distribution of the electrolyte flow field, the electrochemical The processing effect and efficiency of processing have been improved.

一般電化學加工之電極於電化學加工過程中藉由離子交換而移除工件之材料,所以在電化學加工過程中會產生許多電解生成物,而且當電解液以層流方式於流道中流動,將會因此降低新鮮電解液與工件表面反應機會,導致電化學加工之加工精度或加工效率無法提升。Generally, an electrode for electrochemical processing removes a material of a workpiece by ion exchange during electrochemical processing, so that many electrolytic products are generated during electrochemical processing, and when the electrolyte flows in a flow path in a laminar flow, This will reduce the chance of reaction between the fresh electrolyte and the surface of the workpiece, resulting in an inability to improve the machining accuracy or processing efficiency of electrochemical machining.

有鑑於上述問題,本發明提供一種電化學加工之電極結構及電化學加工裝置,電極結構於進行電化學加工時可讓電解液產生擾動,以改變電解液流場方向。

In view of the above problems, the present invention provides an electrode structure and an electrochemical processing device for electrochemical processing, wherein the electrode structure can cause disturbance of the electrolyte during electrochemical processing to change the flow direction of the electrolyte.

本發明之目的,係提供一種電化學加工之電極結構及電化學加工裝置,電極結構具有一擾流結構,電極結構於進行電化學加工之過程中,擾流結構可讓電解液擾動,而改變電解液之流場方向。The object of the present invention is to provide an electrode structure and an electrochemical processing device for electrochemical processing, wherein the electrode structure has a spoiler structure, and the electrode structure is in the process of electrochemical processing, and the spoiler structure can disturb the electrolyte and change The flow field direction of the electrolyte.

為了達到上述所指稱之各目的與功效,本發明係揭示一種電化學加工之電極結構,其用於對一工件進行電化學加工,該電極結構包含:一電極本體,其具有一加工區;以及一擾流結構,其設置於該電極本體之表面。In order to achieve the above-mentioned various purposes and effects, the present invention discloses an electrochemically processed electrode structure for electrochemically processing a workpiece, the electrode structure comprising: an electrode body having a processing region; A spoiler structure is disposed on a surface of the electrode body.

本發明另揭示一種電化學加工裝置,其包含:一流道模組,其連接一工件,並位於該工件之上方;以及一電極結構,其設置於該流道模組,該電極結構之一加工區對應該工件,並對該工件進行電化學加工;其中該電極結構係包含:一電極本體,其具有該加工區;以及一擾流結構,其設置於該電極本體之表面。

The invention further discloses an electrochemical processing device, comprising: a first-class track module connected to a workpiece and located above the workpiece; and an electrode structure disposed on the flow channel module, the electrode structure being processed The region corresponds to the workpiece and electrochemically processes the workpiece; wherein the electrode structure comprises: an electrode body having the processing region; and a spoiler structure disposed on the surface of the electrode body.

1‧‧‧電極結構
10‧‧‧電極本體
101‧‧‧第一端
102‧‧‧軸向表面
103‧‧‧第二端
1031‧‧‧端面
104‧‧‧加工區
105‧‧‧流道
106‧‧‧圖紋加工區
12‧‧‧擾流結構
121‧‧‧絕緣體
1210‧‧‧軸向表面
1211‧‧‧第一端
1213‧‧‧第二端
1215‧‧‧圖紋溝槽
122‧‧‧紋路
2‧‧‧工件
21‧‧‧預定加工區域
211‧‧‧孔洞
3‧‧‧流道模組
31‧‧‧流道本體
311‧‧‧第一穿孔
32‧‧‧電解液輸入流道
4‧‧‧電源供應單元
41‧‧‧陽極
42‧‧‧陰極
5‧‧‧電解液
d、d1、d2、d3、d4‧‧‧節距
1‧‧‧Electrode structure
10‧‧‧electrode body
101‧‧‧ first end
102‧‧‧Axial surface
103‧‧‧ second end
1031‧‧‧ end face
104‧‧‧Processing area
105‧‧‧ flow path
106‧‧‧ pattern processing area
12‧‧‧ spoiler structure
121‧‧‧Insulator
1210‧‧‧Axial surface
1211‧‧‧ first end
1213‧‧‧ second end
1215‧‧‧ pattern groove
122‧‧‧ lines
2‧‧‧Workpiece
21‧‧‧Predetermined processing area
211‧‧‧ hole
3‧‧‧Flow channel module
31‧‧‧Channel body
311‧‧‧First perforation
32‧‧‧Electrolyte input flow channel
4‧‧‧Power supply unit
41‧‧‧Anode
42‧‧‧ cathode
5‧‧‧ electrolyte
d, d1, d2, d3, d4‧‧ ‧ pitch


第一圖:其為本發明之第一實施例之電極結構之示意圖;
第二圖:其為本發明之第一實施例之電極結構之剖面圖;
第三圖:其為本發明之第二實施例之電極結構之示意圖;
第四A至四B圖:其為本發明之第二實施例之電極結構之使用狀態圖;
第五圖:其為本發明之第三實施例之電極結構之示意圖;
第六圖:其為本發明之第三實施例之電極結構之使用狀態圖;以及
第七圖:其為本發明之第四實施例之電極結構之剖面圖。


First drawing: a schematic view of an electrode structure according to a first embodiment of the present invention;
Figure 2 is a cross-sectional view showing an electrode structure of a first embodiment of the present invention;
Third drawing: a schematic view of an electrode structure of a second embodiment of the present invention;
4A to 4B: a state of use of the electrode structure of the second embodiment of the present invention;
Figure 5 is a schematic view showing an electrode structure of a third embodiment of the present invention;
Fig. 6 is a view showing a state of use of an electrode structure of a third embodiment of the present invention; and a seventh view showing a cross-sectional view of an electrode structure of a fourth embodiment of the present invention.

為使本發明之特徵及所達成之功效有更進一步之瞭解與認識,謹佐以實施例及配合詳細之說明,說明如後:In order to further understand and understand the features of the present invention and the effects achieved, the following examples and the detailed descriptions are provided to illustrate the following:

請參閱第一圖及第二圖,其為本發明之第一實施例之電極結構之示意圖及剖面圖;如圖所示,本實施例之用於電化學加工的電極結構1包含一電極本體10及一擾流結構12。電極本體10為一圓柱,並為一導體。電極本體10具有一第一端101、一軸向表面102及一第二端103。電極本體10之第一端101的端面為一加工區104。電極本體10更具有一流道105,流道105從電極本體10之第二端103的端面1031貫穿至電極本體10之第一端101的加工區104。Referring to the first and second figures, which are schematic and cross-sectional views of an electrode structure according to a first embodiment of the present invention; as shown, the electrode structure 1 for electrochemical processing of the present embodiment includes an electrode body. 10 and a spoiler structure 12. The electrode body 10 is a cylinder and is a conductor. The electrode body 10 has a first end 101, an axial surface 102 and a second end 103. The end face of the first end 101 of the electrode body 10 is a processing zone 104. The electrode body 10 further has a flow path 105 that extends from the end surface 1031 of the second end 103 of the electrode body 10 to the processing region 104 of the first end 101 of the electrode body 10.

擾流結構12為絕緣材,其設置於電極本體10之軸向表面102,即未設置於加工區104上。擾流結構12係包含一絕緣體121及一螺旋紋路122,絕緣體121是形成於電極本體10之軸向表面102的一絕緣層,然螺旋紋路122形成於絕緣體121之一軸向表面1210,並從絕緣體121之第二端1213環繞延伸至其第一端1211,也就是螺旋紋路122從電極本體10之第二端103延伸至其第一端101。當然,絕緣體121也可為具有螺旋紋路102之一殼體,並套設於電極本體10,如此即位於電極本體10之軸向表面102。然,本實施例之螺旋紋路122為連續的溝紋,而且螺旋紋路122之複數節距d均相同,即為等節距式之螺旋紋路122。然,螺旋紋路122也可為連續之凸紋,如第三圖所示,甚至螺旋紋路122為間斷之複數溝紋或凸紋,當然紋路122可以為非螺旋狀,可為其他型態。The spoiler structure 12 is an insulating material disposed on the axial surface 102 of the electrode body 10, that is, not disposed on the processing region 104. The spoiler structure 12 includes an insulator 121 and a spiral pattern 122. The insulator 121 is an insulating layer formed on the axial surface 102 of the electrode body 10. The spiral pattern 122 is formed on one of the axial surfaces 1210 of the insulator 121. The second end 1213 of the insulator 121 extends around its first end 1211, that is, the spiral path 122 extends from the second end 103 of the electrode body 10 to its first end 101. Of course, the insulator 121 can also be a housing having a spiral pattern 102 and sleeved on the electrode body 10 such that it is located on the axial surface 102 of the electrode body 10. However, the spiral groove 122 of the embodiment is a continuous groove, and the plurality of pitches d of the spiral groove 122 are the same, that is, the spiral pattern 122 of the equal pitch type. However, the spiral pattern 122 can also be a continuous ridge. As shown in the third figure, even the spiral pattern 122 is a discontinuous plurality of grooves or ridges. Of course, the pattern 122 can be non-helical, and can be other types.

請參閱第三圖,其為本發明之第二實施例之電極結構的示意圖;如圖所示,本實施例之電極結構1與上述實施例之電極結構1不同在於,本實施例之螺旋紋路122為連續之凸紋,而且螺旋紋路122間之複數節距d1、d2、d3、d4均不同,該些節距d1、d2、d3、d4係從絕緣體121之第二端1213往絕緣體121之第一端1211遞減,也就是從電極本體10之第二端103往電極本體10之第一端101遞減,即節距d1>節距d2>節距d3>節距d4。請一併參閱第四A至四B圖,其為本發明之第二實施例之電極結構的使用狀態圖;如圖所示,本實施例之電極結構1用於一電化學加工裝置,電化學加工裝置更包含一流道模組3,當電極結構1對工件2進行電化學加工時,先連接流道模組3於工件2,流道模組3位於工件2之上方。流道模組3具有一流道本體31,流道本體31之中心具有一第一穿孔311,第一穿孔311貫穿流道本體31。流道本體31之兩側分別具有一電解液輸入流道32,電解液輸入流道32往流道本體31內延伸,並與第一穿孔311相連通。當流道模組3連接工件2時,流道本體31設置於工件2之表面,第一穿孔311對應工件2之一預定加工區域21。Referring to the third drawing, which is a schematic view of an electrode structure according to a second embodiment of the present invention; as shown in the figure, the electrode structure 1 of the present embodiment is different from the electrode structure 1 of the above embodiment in the spiral pattern of the embodiment. 122 is a continuous ridge, and the plurality of pitches d1, d2, d3, and d4 between the spiral lines 122 are different. The pitches d1, d2, d3, and d4 are from the second end 1213 of the insulator 121 to the insulator 121. The first end 1211 is decremented, that is, from the second end 103 of the electrode body 10 toward the first end 101 of the electrode body 10, that is, the pitch d1 > the pitch d2 > the pitch d3 > the pitch d4. Please refer to FIG. 4A to FIG. 4B, which are diagrams showing the state of use of the electrode structure according to the second embodiment of the present invention; as shown, the electrode structure 1 of the present embodiment is used for an electrochemical processing device, and is electrochemicalized. The processing device further includes a first-class track module 3. When the electrode structure 1 electrochemically processes the workpiece 2, the flow channel module 3 is first connected to the workpiece 2, and the flow channel module 3 is located above the workpiece 2. The flow channel module 3 has a first-class channel body 31. The center of the channel body 31 has a first through hole 311, and the first hole 311 extends through the channel body 31. Each of the two sides of the flow path body 31 has an electrolyte input flow path 32. The electrolyte input flow path 32 extends into the flow path body 31 and communicates with the first through hole 311. When the flow path module 3 is connected to the workpiece 2, the flow path body 31 is disposed on the surface of the workpiece 2, and the first through hole 311 corresponds to a predetermined processing area 21 of the workpiece 2.

完成流道模組3之設置後,電極結構1設置於流道模組3之第一穿孔311,電極結構1之加工區104對應工件2之預定加工區域21。此外,一電源供應單元4之一陽極41連接工件2,電源供應單元4之一陰極42連接至電極結構1之電極本體10。然後,啟動電源供應單元4,而供應電源至電極本體10與工件2。此外,一電解液5從流道模組3之該些電解液輸入流道32流至第一穿孔311,電解液5接觸電極結構1之擾流結構12的螺旋紋路122,電解液5沿著螺旋紋路122往加工區104與預定加工區域21間流動。其中電解液5沿著螺旋紋路122流動,也就改變電解液5之流動方向,即改變電解液5之流場,使電解液5呈紊流狀態。當電解液5流動至加工區104與預定加工區域21之間,且電源供應單元4供應電源時,電極結構1之加工區104對工件2之預定加工區域21進行電化學加工。然,因電極本體10為圓柱,所以加工區104為圓形,以於預定加工區域21上形成一圓形孔洞211。After the arrangement of the flow channel module 3 is completed, the electrode structure 1 is disposed on the first through hole 311 of the flow path module 3, and the processing area 104 of the electrode structure 1 corresponds to the predetermined processing area 21 of the workpiece 2. Further, an anode 41 of one power supply unit 4 is connected to the workpiece 2, and a cathode 42 of the power supply unit 4 is connected to the electrode body 10 of the electrode structure 1. Then, the power supply unit 4 is activated, and power is supplied to the electrode body 10 and the workpiece 2. In addition, an electrolyte 5 flows from the electrolyte input channels 32 of the flow channel module 3 to the first perforations 311, and the electrolyte 5 contacts the spiral path 122 of the spoiler structure 12 of the electrode structure 1, and the electrolyte 5 follows The spiral path 122 flows between the processing zone 104 and the predetermined processing zone 21. The electrolyte 5 flows along the spiral groove 122, and changes the flow direction of the electrolyte 5, that is, changes the flow field of the electrolyte 5, so that the electrolyte 5 is in a turbulent state. When the electrolyte 5 flows between the processing zone 104 and the predetermined processing zone 21, and the power supply unit 4 supplies power, the processing zone 104 of the electrode structure 1 electrochemically processes the predetermined processing zone 21 of the workpiece 2. However, since the electrode body 10 is a cylinder, the processing region 104 is circular to form a circular hole 211 in the predetermined processing region 21.

隨著新鮮的電解液5不斷從流道模組3之該些電解液輸入流道32輸入至第一穿孔311內,原本位於第一穿孔311及電極結構1與工件2間之電解液5會因受到工件2的預定加工區域21與電極結構1之底端的壓迫,而被驅往電極結構1之流道105流動,進而從流道105流至外部的電解液回收槽(圖未示),而讓電解液循環。然,於電極結構1與工件2進行電化學加工之過程中會產生許多電解生成物,而電解生成物將隨著電解液5從流道105排出,如此可不斷更新加工區104與預定工件區域21間之電解液5,以有效提升電化學加工之加工效率。As the fresh electrolyte 5 is continuously input into the first perforations 311 from the electrolyte input channels 32 of the flow channel module 3, the electrolyte 5 originally located between the first perforations 311 and the electrode structure 1 and the workpiece 2 will Due to the compression of the predetermined processing region 21 of the workpiece 2 and the bottom end of the electrode structure 1, the flow path 105 that is driven to the electrode structure 1 flows, and then flows from the flow channel 105 to the external electrolyte recovery tank (not shown). Let the electrolyte circulate. However, during the electrochemical processing of the electrode structure 1 and the workpiece 2, a large number of electrolytic products are generated, and the electrolytic product will be discharged from the flow channel 105 with the electrolyte 5, so that the processing region 104 and the predetermined workpiece region can be continuously updated. 21 electrolytes 5 to effectively improve the processing efficiency of electrochemical machining.

復參閱第三圖,本實施例之電極結構1的擾流結構12之螺旋紋路122的該些節距d1、d2、d3、d4均不同,而且越靠近電極本體10之第一端101的節距d2、d3、d4越小,如此當電解液5往電極本體10之第一端101流動時,電解液5之流動速度會隨著螺旋紋路122之該些節距d1、d2、d3、d4遞減而增加,即使電解液5之原本的流動速度漸進地被加速。當電解液5初接觸節距較大之螺旋紋路122(擾流結構)時,螺旋紋路122對電解液5之阻力降低,以避免降低電解液5之流動速度,進而避免電解液5為層流狀態。本實施例之擾流結構12之螺旋紋路122的該些節距d1、d2、d3、d4也是隨電解液5的流動路徑朝加工區104遞減。由上述可知,本實施例之電極結構1的擾流結構12不需被轉動即可讓電解液5產生擾動,而改變電解液5之流場,即使電解液作正向及側向沖流,以使電解液5為紊流態,另能加快電解液5之流動速度,有效提升電化學加工之離子反應速率及加工速率。Referring to the third figure, the pitches d1, d2, d3, and d4 of the spiral pattern 122 of the spoiler structure 12 of the electrode structure 1 of the present embodiment are different, and the closer to the first end 101 of the electrode body 10, the section The smaller the distance d2, d3, and d4, the flow rate of the electrolyte 5 will follow the pitches d1, d2, d3, and d4 of the spiral path 122 when the electrolyte 5 flows toward the first end 101 of the electrode body 10. The decrease is increased, even if the original flow velocity of the electrolyte 5 is gradually accelerated. When the electrolyte 5 initially contacts the spiral groove 122 (spoiler structure) having a large pitch, the resistance of the spiral groove 122 to the electrolyte 5 is lowered to avoid reducing the flow velocity of the electrolyte 5, thereby preventing the electrolyte 5 from laminar flow. status. The pitches d1, d2, d3, and d4 of the spiral groove 122 of the spoiler structure 12 of the present embodiment are also decreased toward the processing region 104 with the flow path of the electrolyte 5. It can be seen from the above that the spoiler structure 12 of the electrode structure 1 of the present embodiment can cause the electrolyte 5 to be disturbed without being rotated, and change the flow field of the electrolyte 5 even if the electrolyte is subjected to forward and lateral flow. In order to make the electrolyte 5 turbulent, the flow rate of the electrolyte 5 can be accelerated, and the ion reaction rate and processing rate of the electrochemical process can be effectively improved.

請參閱第五圖,其為本發明之第三實施例之電極結構的示意圖;如圖所示,本實施例之電極結構1與上述實施例之電極結構1不同在於電極本體10之形狀,上述實施例之電極結構1之電極本體10為圓柱,而電極結構1之電極本體10也可為一多邊形角柱,就如本實施例之電極本體10為六邊形角柱。請一併參閱第六圖,其為本發明之第三實施例之電極結構的使用狀態圖;如圖所示,當本實施例之電極結構1對工件2進行電化學加工時,電極結構1係往工件2作進給,其對工件2進行電化學加工的過程中無須旋轉電極結構1,然因電極本體10為六邊形角柱,所以加工區104為六邊形,因此可於工件2上形成一六邊形孔洞211。由此可知,本發明之電極結構1除了可加工出圓形孔洞之外,也可以加工出多邊形孔洞。Referring to FIG. 5, it is a schematic diagram of an electrode structure according to a third embodiment of the present invention; as shown in the figure, the electrode structure 1 of the present embodiment is different from the electrode structure 1 of the above embodiment in the shape of the electrode body 10, The electrode body 10 of the electrode structure 1 of the embodiment is a cylinder, and the electrode body 10 of the electrode structure 1 can also be a polygonal corner column, just as the electrode body 10 of the embodiment is a hexagonal corner column. Please refer to the sixth drawing, which is a use state diagram of the electrode structure of the third embodiment of the present invention; as shown in the figure, when the electrode structure 1 of the embodiment performs electrochemical processing on the workpiece 2, the electrode structure 1 The workpiece 2 is fed, and the electrode structure 1 is not required to be rotated during the electrochemical processing of the workpiece 2. However, since the electrode body 10 is a hexagonal corner column, the processing region 104 is hexagonal, so that the workpiece 2 can be used. A hexagonal hole 211 is formed in the upper portion. From this, it can be seen that the electrode structure 1 of the present invention can process polygonal holes in addition to circular holes.

請參閱第七圖,其為本發明之第四實施例之電極結構的剖面圖;如圖所示,本實施例之電極結構1與上述實施例之電極結構1不同在於,本實施例之擾流結構12的絕緣體121更具有至少一圖紋溝槽1215,對應至少一圖紋溝槽1215之電極本體10裸露於圖紋溝槽1215,而為至少一圖紋加工區106。當本實施例之電極結構1對工件進行電化學加工時,電極結構1之加工區104於工件形成孔洞,而至少一圖紋加工區106可對孔洞之內表面形成對應圖紋加工區106之形狀的至少一圖紋。Referring to FIG. 7, which is a cross-sectional view of an electrode structure according to a fourth embodiment of the present invention; as shown in the figure, the electrode structure 1 of the present embodiment is different from the electrode structure 1 of the above embodiment in that the interference of the embodiment The insulator 121 of the flow structure 12 further has at least one pattern groove 1215. The electrode body 10 corresponding to at least one of the pattern grooves 1215 is exposed to the pattern groove 1215 to be at least one pattern processing region 106. When the electrode structure 1 of the embodiment performs electrochemical processing on the workpiece, the processing region 104 of the electrode structure 1 forms a hole in the workpiece, and at least one pattern processing region 106 can form a corresponding pattern processing region 106 on the inner surface of the hole. At least one pattern of the shape.

綜上所述,本發明提供一種電化學加工之電極結構及電化學加工裝置,電極結構具有擾流結構,當電極結構對工件進行電化學加工時,擾流結構可讓擾動電解液擾動,而改變電解液之流場方向,然擾流結構更可加速電解液之流動速度,使提升電解液之紊流狀態,不斷地使新鮮的電解液與工件表面產生反應,進而提升電化學加工之加工速率。In summary, the present invention provides an electrode structure and an electrochemical processing device for electrochemical processing. The electrode structure has a spoiler structure. When the electrode structure electrochemically processes the workpiece, the spoiler structure can disturb the electrolyte, and Changing the flow direction of the electrolyte, the spoiler structure can accelerate the flow velocity of the electrolyte, improve the turbulent state of the electrolyte, and continuously react the fresh electrolyte with the surface of the workpiece, thereby improving the processing of electrochemical machining. rate.

惟以上所述者,僅為本發明之實施例而已,並非用來限定本發明實施之範圍,舉凡依本發明申請專利範圍所述之形狀、構造、特徵及精神所為之均等變化與修飾,均應包括於本發明之申請專利範圍內。

The above is only the embodiment of the present invention, and is not intended to limit the scope of the present invention, and the variations, modifications, and modifications of the shapes, structures, features, and spirits described in the claims of the present invention are It should be included in the scope of the patent application of the present invention.

 

1‧‧‧電極結構 1‧‧‧Electrode structure

10‧‧‧電極本體 10‧‧‧electrode body

101‧‧‧第一端 101‧‧‧ first end

105‧‧‧流道 105‧‧‧ flow path

12‧‧‧擾流結構 12‧‧‧ spoiler structure

121‧‧‧絕緣體 121‧‧‧Insulator

122‧‧‧紋路 122‧‧‧ lines

d‧‧‧節距 D‧‧‧ pitch

Claims (10)

一種電化學加工之電極結構,其用於對一工件進行電化學加工,該電極結構包含:
一電極本體,其具有一加工區;以及
一擾流結構,其設置於該電極本體之表面。
An electrochemically processed electrode structure for electrochemical processing a workpiece, the electrode structure comprising:
An electrode body having a processing region; and a spoiler structure disposed on a surface of the electrode body.
如申請專利範圍第1項所述之電化學加工之電極結構,其中該擾流結構係包含:
一絕緣體,其設置於該電極本體之軸向表面;以及
至少一紋路,其設置於該絕緣體之軸向表面。
The electrode structure for electrochemical processing according to claim 1, wherein the spoiler structure comprises:
An insulator disposed on an axial surface of the electrode body; and at least one grain disposed on an axial surface of the insulator.
如申請專利範圍第2項所述之電化學加工之電極結構,其中該至少一紋路為至少一凸紋或至少一溝紋。The electrode structure for electrochemical processing according to claim 2, wherein the at least one grain is at least one ridge or at least one groove. 如申請專利範圍第2項所述之電化學加工之電極結構,其中該絕緣體具有至少一圖紋溝槽,對應該至少一圖紋溝槽之該電極本體裸露於該至少一圖紋溝槽,而為該加工區。The electrode structure of the electrochemical process of claim 2, wherein the insulator has at least one groove, and the electrode body corresponding to at least one groove is exposed to the at least one groove. And for the processing area. 如申請專利範圍第2項所述之電化學加工之電極結構,其中該至少一紋路為一螺旋紋路,並從該絕緣體之一第二端延伸至該絕緣體之一第一端。The electrochemically processed electrode structure of claim 2, wherein the at least one grain is a spiral pattern and extends from a second end of the insulator to a first end of the insulator. 如申請專利範圍第5項所述之電化學加工之電極結構,其中該螺旋紋路具有複數節距,該些節距係從該絕緣體之該第二端往該絕緣體之該第一端遞減。The electrochemically fabricated electrode structure of claim 5, wherein the spiral track has a plurality of pitches that decrease from the second end of the insulator toward the first end of the insulator. 如申請專利範圍第5項所述之電化學加工之電極結構,其中該螺旋紋路具有複數節距,該些節距隨該電化學加工之一電解液的流動路徑朝該加工區而遞減。The electrode structure for electrochemical processing according to claim 5, wherein the spiral track has a plurality of pitches which decrease toward the processing zone along with a flow path of one of the electrochemically processed electrolytes. 如申請專利範圍第1項所述之電化學加工之電極結構,其中該加工區位於該電極本體之一端。The electrode structure for electrochemical processing according to claim 1, wherein the processing region is located at one end of the electrode body. 如申請專利範圍第1項所述之電化學加工之電極結構,其中該電極本體具有一流道,該流道貫穿該電極本體。The electrode structure for electrochemical processing according to claim 1, wherein the electrode body has a first-class track, and the flow path penetrates the electrode body. 一種電化學加工裝置,其包含:
一流道模組,其連接一工件,並位於該工件之上方;以及
一電極結構,其設置於該流道模組,該電極結構之一加工區對應該工件,並對該工件進行電化學加工;
其中該電極結構係包含:
一電極本體,其具有該加工區;以及
一擾流結構,其設置於該電極本體之表面。
An electrochemical processing apparatus comprising:
a first-class track module connected to a workpiece and located above the workpiece; and an electrode structure disposed on the flow channel module, wherein a processing area of the electrode structure corresponds to the workpiece, and the workpiece is electrochemically processed ;
Wherein the electrode structure comprises:
An electrode body having the processing region; and a spoiler structure disposed on a surface of the electrode body.
TW102144731A 2013-12-06 2013-12-06 Electrode structure for electrochemical processing and electrochemical processing device TW201521922A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112059343A (en) * 2020-08-31 2020-12-11 西安工业大学 Cathode tool for machining variable-diameter round hole in conductor material and machining method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112059343A (en) * 2020-08-31 2020-12-11 西安工业大学 Cathode tool for machining variable-diameter round hole in conductor material and machining method
CN112059343B (en) * 2020-08-31 2022-07-08 西安工业大学 Cathode tool for machining variable-diameter round hole in conductor material and machining method

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