TW201507982A - Float glass production device and float glass production method using same - Google Patents

Float glass production device and float glass production method using same Download PDF

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Publication number
TW201507982A
TW201507982A TW103119264A TW103119264A TW201507982A TW 201507982 A TW201507982 A TW 201507982A TW 103119264 A TW103119264 A TW 103119264A TW 103119264 A TW103119264 A TW 103119264A TW 201507982 A TW201507982 A TW 201507982A
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Taiwan
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wall
glass
glass ribbon
space
temperature space
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TW103119264A
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Chinese (zh)
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Tetsushi Takiguchi
Tokuhiro Kagami
Kazuaki Sumida
Masanobu SHIRAI
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Asahi Glass Co Ltd
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Publication of TW201507982A publication Critical patent/TW201507982A/en

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    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B18/00Shaping glass in contact with the surface of a liquid
    • C03B18/02Forming sheets
    • C03B18/20Composition of the atmosphere above the float bath; Treating or purifying the atmosphere above the float bath
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B18/00Shaping glass in contact with the surface of a liquid
    • C03B18/02Forming sheets
    • C03B18/16Construction of the float tank; Use of material for the float tank; Coating or protection of the tank wall
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P40/00Technologies relating to the processing of minerals
    • Y02P40/50Glass production, e.g. reusing waste heat during processing or shaping
    • Y02P40/57Improving the yield, e-g- reduction of reject rates

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Glass Compositions (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)

Abstract

A float glass production device provided with: a bath containing a molten metal; a ceiling situated above the bath and extending from an entrance wall to an exit wall; a plurality of top rolls provided so as to be spaced along the flow direction of a glass ribbon flowing above the liquid level of the molten metal, rotating by themselves and pressing the widthwise extremities of the glass ribbon having traversed the space between the liquid level and the entrance wall; a dividing wall whereby a forming space enclosed by the ceiling, the bath, the entrance wall, and the exit wall is divided into a high-temperature space on the upstream side and a low-temperature space on the downstream side; and an exhaust path wherefrom a gas in the high-temperature space is exhausted to the exterior of the forming space. The dividing wall is arranged more to the downstream side than the entrance wall and upstream from the top roll on the most upstream-side among the plurality of top rolls.

Description

浮式玻璃製造裝置及使用其之浮式玻璃製造方法 Floating glass manufacturing device and floating glass manufacturing method using same

本發明係關於一種浮式玻璃製造裝置及使用其之浮式玻璃製造方法。 The present invention relates to a floating glass manufacturing apparatus and a floating glass manufacturing method using the same.

浮式玻璃製造方法包括如下成形步驟,即使玻璃帶流動於浴槽內之熔融金屬(例如熔融錫)之液面上而使之成形為板狀(例如,參照專利文獻1)。浴槽與頂壁之間之成形空間可以還原性氣體填滿以抑制熔融金屬之氧化。成形空間包含少量由熔融金屬蒸發之氣體。該氣體以單體及化合物中之至少任一種形態含有由熔融金屬蒸發之金屬元素。作為化合物,可列舉:金屬氧化物、金屬硫化物等。 The method for producing a float glass includes a forming step of forming a sheet shape even if a glass ribbon flows on a liquid surface of a molten metal (for example, molten tin) in a bath (for example, refer to Patent Document 1). The forming space between the bath and the top wall may be filled with a reducing gas to suppress oxidation of the molten metal. The forming space contains a small amount of gas evaporated by the molten metal. The gas contains a metal element evaporated from the molten metal in the form of at least one of a monomer and a compound. The compound may, for example, be a metal oxide or a metal sulfide.

[先前技術文獻] [Previous Technical Literature] [專利文獻] [Patent Literature]

[專利文獻1]日本專利特開昭50-3414號公報 [Patent Document 1] Japanese Patent Laid-Open No. 50-3414

先前,有由熔融金屬蒸發之氣體冷卻而形成液滴或粒子等異物,該異物掉落至玻璃帶之上表面,而產生較多缺陷的問題。 Previously, there was a problem that foreign matter such as droplets or particles were formed by cooling of a molten metal vapor, and the foreign matter fell to the upper surface of the glass ribbon, resulting in more defects.

本發明係鑒於上述課題而完成者,其主要目的在於提供一種減少了缺陷數量之浮式玻璃製造裝置。 The present invention has been made in view of the above problems, and a main object thereof is to provide a floating glass manufacturing apparatus which reduces the number of defects.

為解決上述課題,根據本發明之一態樣,提供一種浮式玻璃製造 裝置,其包括:浴槽,其收容熔融金屬;入口壁,其位於上述浴槽之上游部之上方;出口壁,其位於上述浴槽之下游部之上方;頂壁,其配設於上述浴槽之上方且自上述入口壁延伸至上述出口壁;複數根上輥,其等沿著於上述熔融金屬之液面上流動之玻璃帶之流動方向隔開間隔而設置,並且壓住通過上述液面與上述入口壁之間之上述玻璃帶之寬度方向端部且本身旋轉;分隔壁,其將由上述頂壁、上述浴槽、上述入口壁及上述出口壁包圍之成形空間分隔成上游側之高溫空間與下游側之低溫空間;及排氣通路,其將上述高溫空間內之氣體排出至上述成形空間之外部;且上述分隔壁係配設於較上述入口壁更下游側,且配設於較上述複數根上輥中最上游側之上輥更上游。 In order to solve the above problems, according to an aspect of the present invention, a floating glass manufacturing is provided. The device comprises: a bath for containing molten metal; an inlet wall above the upstream portion of the bath; an outlet wall above the downstream portion of the bath; and a top wall disposed above the bath and Extending from the inlet wall to the outlet wall; a plurality of upper rolls disposed at intervals along a flow direction of the glass ribbon flowing on the liquid surface of the molten metal, and pressed through the liquid surface and the inlet wall a width direction end portion of the glass ribbon and rotating itself; the partition wall partitioning the forming space surrounded by the top wall, the bath, the inlet wall and the outlet wall into a high temperature space on the upstream side and a low temperature on the downstream side a space; and an exhaust passage that discharges the gas in the high temperature space to the outside of the forming space; and the partition wall is disposed on a downstream side of the inlet wall, and is disposed in the uppermost one of the plurality of upper rolls The upper roller on the upstream side is further upstream.

根據本發明之一態樣,提供一種減少了缺陷數量之浮式玻璃製造裝置。 According to one aspect of the present invention, a floating glass manufacturing apparatus that reduces the number of defects is provided.

10‧‧‧成形裝置 10‧‧‧Forming device

11‧‧‧熔融金屬 11‧‧‧ molten metal

12‧‧‧熔融玻璃 12‧‧‧ molten glass

14‧‧‧玻璃帶 14‧‧‧glass ribbon

20‧‧‧浴槽 20‧‧‧ bath

22‧‧‧斜槽口 22‧‧‧ chute

23‧‧‧流道控制閘板 23‧‧‧Flow channel control gate

24‧‧‧限流磚 24‧‧‧Limited bricks

25‧‧‧限流磚 25‧‧‧Limited bricks

26‧‧‧入口壁 26‧‧‧ entrance wall

27‧‧‧斜槽空間 27‧‧‧ chute space

28‧‧‧出口壁 28‧‧‧Exit wall

30‧‧‧頂壁 30‧‧‧ top wall

31‧‧‧頂壁外殼 31‧‧‧Top wall housing

32‧‧‧上部側壁 32‧‧‧ upper side wall

33‧‧‧上部側壁 33‧‧‧ upper side wall

34‧‧‧供氣通路 34‧‧‧ gas supply path

36‧‧‧加熱器 36‧‧‧heater

40‧‧‧上輥 40‧‧‧Upper roll

42‧‧‧分隔壁 42‧‧‧ partition wall

44‧‧‧排氣通路 44‧‧‧Exhaust passage

46‧‧‧連結桿 46‧‧‧ Connecting rod

47‧‧‧螺帽 47‧‧‧ Nuts

50‧‧‧成形空間 50‧‧‧Forming space

51‧‧‧高溫空間 51‧‧‧High temperature space

52‧‧‧低溫空間 52‧‧‧low temperature space

53‧‧‧預熱空間 53‧‧‧Preheating space

H1‧‧‧高度 H1‧‧‧ Height

H2‧‧‧高度 H2‧‧‧ Height

L1‧‧‧距離 L1‧‧‧ distance

L2‧‧‧距離 L2‧‧‧ distance

X‧‧‧方向 X‧‧‧ direction

Y‧‧‧方向 Y‧‧‧ direction

Z‧‧‧範圍 Z‧‧‧ range

圖1係表示本發明之一實施形態之浮式玻璃製造裝置之成形裝置的剖面圖。 Fig. 1 is a cross-sectional view showing a molding apparatus for a floating glass manufacturing apparatus according to an embodiment of the present invention.

圖2係沿著圖1之II-II線之剖面圖。 Figure 2 is a cross-sectional view taken along line II-II of Figure 1.

圖3係沿著圖1之III-III線之剖面圖。 Figure 3 is a cross-sectional view taken along line III-III of Figure 1.

以下,參照圖式對用以實施本發明之形態進行說明。再者,於各圖式中,對相同或對應之構成要素標附相同或對應之符號並省略說 明。於本說明書中,所謂「寬度方向」,意指與成形步驟中之玻璃帶之流動方向正交之方向。 Hereinafter, embodiments for carrying out the invention will be described with reference to the drawings. In the drawings, the same or corresponding components are attached to the same or corresponding elements, and the description is omitted. Bright. In the present specification, the "width direction" means a direction orthogonal to the flow direction of the glass ribbon in the forming step.

圖1係表示本發明之一實施形態之浮式玻璃製造裝置之成形裝置的剖面圖。圖2係沿著圖1之II-II線之剖面圖。圖2中,為了便於觀察圖式,而省略加熱器及上部側壁之圖示。圖3係沿著圖1之III-III線之剖面圖。 Fig. 1 is a cross-sectional view showing a molding apparatus for a floating glass manufacturing apparatus according to an embodiment of the present invention. Figure 2 is a cross-sectional view taken along line II-II of Figure 1. In Fig. 2, the heater and the upper side wall are omitted for convenience of viewing the drawings. Figure 3 is a cross-sectional view taken along line III-III of Figure 1.

浮式玻璃製造裝置包括成形裝置10。成形裝置10係使玻璃帶14流動於浴槽20內之熔融金屬11之液面上而使之成形為板狀。玻璃帶14於浴槽20之下游區域自熔融金屬11被提拉,並自形成於浴槽20與出口壁28之間之出口被送至緩冷爐。藉由將緩冷爐內經緩冷之玻璃帶14切斷而可獲得板狀之浮式玻璃。 The float glass manufacturing apparatus includes a forming apparatus 10. In the molding apparatus 10, the glass ribbon 14 is caused to flow on the liquid surface of the molten metal 11 in the bath 20 to be formed into a plate shape. The glass ribbon 14 is pulled from the molten metal 11 in the downstream region of the bath 20 and sent to the slow cooling furnace from the outlet formed between the bath 20 and the outlet wall 28. A plate-shaped floating glass can be obtained by cutting the slow-cooled glass ribbon 14 in the slow cooling furnace.

成形裝置10如例如圖1~3所示般包括:浴槽20、斜槽口(spout lip)22、流道控制閘板(tweel)23、限流磚(restrictor tile)24、25、入口壁26、出口壁28、頂壁30、上部側壁32、33、供氣通路34、加熱器36、上輥40、分隔壁42、及排氣通路44等。 The forming apparatus 10 includes, as shown, for example, in FIGS. 1 to 3, a bath 20, a spout lip 22, a flow control gate (tweel) 23, restrictor tiles 24, 25, and an inlet wall 26. The outlet wall 28, the top wall 30, the upper side walls 32, 33, the air supply passage 34, the heater 36, the upper roller 40, the partition wall 42, and the exhaust passage 44, and the like.

浴槽20係如圖1~3所示般收容熔融金屬11。作為熔融金屬11,例如可使用熔融錫或熔融錫合金,只要為可使玻璃帶14浮起者即可。 The bath 20 accommodates the molten metal 11 as shown in Figs. As the molten metal 11, for example, molten tin or a molten tin alloy can be used as long as the glass ribbon 14 can be floated.

斜槽口22係如圖1所示般向熔融金屬11之液面上連續地供給熔融玻璃12。熔融玻璃12係通過斜槽口22與流道控制閘板23之間被供給至熔融金屬11之液面上而成為玻璃帶14。 The chute 22 is continuously supplied with the molten glass 12 to the liquid surface of the molten metal 11 as shown in FIG. The molten glass 12 is supplied to the liquid surface of the molten metal 11 between the chute port 22 and the flow path control shutter 23 to become the glass ribbon 14.

為了使熔融玻璃12之流量可變,而將流道控制閘板23設為相對於斜槽口22於上下方向上自由移動。斜槽口22與流道控制閘板23之間隔越大,熔融玻璃12之流量越多。 In order to change the flow rate of the molten glass 12, the flow path control shutter 23 is freely movable in the vertical direction with respect to the chute port 22. The greater the separation between the chute 22 and the flow control shutter 23, the greater the flow rate of the molten glass 12.

限流磚24、25係如圖2所示般與玻璃帶14接觸而限制玻璃帶14之寬度。限流磚24、25係向下游擴展。因此,於限流磚24、25之間,玻璃帶14一面向下游流動一面擴大寬度。於較限流磚24、25更下游側, 玻璃帶14係與浴槽20之側壁隔開間隔而流動,可於浴槽20之側壁彼此之間自由地改變寬度。 The restricting bricks 24, 25 are in contact with the glass ribbon 14 as shown in Fig. 2 to limit the width of the glass ribbon 14. The restricting bricks 24, 25 are extended downstream. Therefore, between the flow restricting bricks 24, 25, the glass ribbon 14 is flowed downstream to expand the width. On the downstream side of the more limited flow bricks 24, 25, The glass ribbon 14 is spaced apart from the side walls of the bath 20 to freely change the width between the side walls of the bath 20.

入口壁26係如圖1所示般位於浴槽20之上游部之上方。例如入口壁26係配設於較斜槽口22更下游側,且配設於限流磚24、25之上方。如圖2所示般於較入口壁26更上游側,熔融金屬11之液面之全部被玻璃帶14覆蓋。另一方面,於較入口壁26更下游側,熔融金屬11之液面之大部分被玻璃帶14覆蓋,但熔融金屬11之液面之一部分未被玻璃帶14覆蓋。 The inlet wall 26 is located above the upstream portion of the bath 20 as shown in FIG. For example, the inlet wall 26 is disposed on the downstream side of the inclined slot 22 and is disposed above the restricting bricks 24, 25. As shown in FIG. 2, on the upstream side of the inlet wall 26, all of the liquid surface of the molten metal 11 is covered by the glass ribbon 14. On the other hand, on the downstream side of the inlet wall 26, most of the liquid surface of the molten metal 11 is covered by the glass ribbon 14, but a part of the liquid surface of the molten metal 11 is not covered by the glass ribbon 14.

出口壁28係如圖1所示般位於浴槽20之下游部之上方。 The outlet wall 28 is located above the downstream portion of the bath 20 as shown in FIG.

頂壁30係如圖1所示般設置於浴槽20之上方且自入口壁26延伸至出口壁28。被浴槽20、頂壁30、入口壁26及出口壁28包圍之成形空間50可以還原性氣體填滿以抑制熔融金屬11之液面中未被玻璃帶14覆蓋之露出部分之氧化。為了減少外部氣體之混入,成形空間50之氣壓亦可高於大氣壓。 The top wall 30 is disposed above the bath 20 as shown in FIG. 1 and extends from the inlet wall 26 to the outlet wall 28. The forming space 50 surrounded by the bath 20, the top wall 30, the inlet wall 26, and the outlet wall 28 can be filled with a reducing gas to suppress oxidation of the exposed portion of the liquid surface of the molten metal 11 which is not covered by the glass ribbon 14. In order to reduce the incorporation of external gases, the gas pressure in the forming space 50 may also be higher than atmospheric pressure.

上部側壁32、33係如圖3所示般堵住浴槽20之側壁與頂壁30之間之間隙,而抑制外部氣體之混入。上部側壁32、33係自入口壁26延伸至出口壁28。於上部側壁32、33形成有供上輥40之旋轉軸插通之貫通孔、及排氣通路44之端部等。 The upper side walls 32, 33 block the gap between the side wall of the bathtub 20 and the top wall 30 as shown in Fig. 3, and suppress the incorporation of external air. The upper side walls 32, 33 extend from the inlet wall 26 to the outlet wall 28. The upper side walls 32 and 33 are formed with a through hole through which the rotating shaft of the upper roller 40 is inserted, an end portion of the exhaust passage 44, and the like.

加熱器36係如圖1所示般插通於頂壁30之供氣通路34,加熱器36之發熱部係配設於成形空間50中。加熱器36係對熔融金屬11及玻璃帶14自上方進行加熱。加熱器36係於玻璃帶14之流動方向(X方向)及寬度方向(Y方向)上隔開間隔而設置有複數個。以越下游側,玻璃帶14之溫度變得越低之方式控制加熱器36之輸出。 The heater 36 is inserted into the air supply passage 34 of the top wall 30 as shown in FIG. 1, and the heat generating portion of the heater 36 is disposed in the forming space 50. The heater 36 heats the molten metal 11 and the glass ribbon 14 from above. The heater 36 is provided in plural in the flow direction (X direction) and the width direction (Y direction) of the glass ribbon 14 at intervals. The downstream of the downstream side, the lower the temperature of the glass ribbon 14 is, the more the output of the heater 36 is controlled.

上輥40係如圖2所示般成對使用,且壓住玻璃帶14之寬度方向端部,針對玻璃帶14對其寬度方向施加張力。複數對上輥40係沿著玻璃帶14之流動方向隔開間隔而配設。 The upper roller 40 is used in pairs as shown in Fig. 2, and presses the end portion in the width direction of the glass ribbon 14, and applies tension to the width direction of the glass ribbon 14. The plurality of upper rollers 40 are disposed at intervals along the flow direction of the glass ribbon 14.

上輥40係於前端部具有與玻璃帶14接觸之旋轉構件。於旋轉構件旋轉而使複數對上輥40對玻璃帶14施加張力之期間,玻璃帶14一面向下游方向流動,一面緩慢地冷卻而變硬。 The upper roller 40 has a rotating member that is in contact with the glass ribbon 14 at the front end portion. While the rotating member is rotated to apply tension to the glass ribbon 14 by the plurality of upper rollers 40, the glass ribbon 14 flows toward the downstream direction and gradually cools and hardens.

為了抑制由熱引起之劣化,上輥40可於內部具有冷媒流路。於冷媒流路流動之水等冷媒將上輥40之熱吸收並運送至外部,藉此對上輥40進行冷卻。 In order to suppress deterioration caused by heat, the upper roller 40 may have a refrigerant flow path inside. The refrigerant such as water flowing through the refrigerant flow path absorbs and transports the heat of the upper roll 40 to the outside, thereby cooling the upper roll 40.

分隔壁42係如圖1所示般將成形空間50分隔成上游側之高溫空間51與下游側之低溫空間52,而限制氣體自高溫空間51向低溫空間52流出。分隔壁42可如圖3所示般自一上部側壁32延伸至另一上部側壁33,可橫穿成形空間50。 The partition wall 42 divides the forming space 50 into the high temperature space 51 on the upstream side and the low temperature space 52 on the downstream side as shown in FIG. 1, and restricts the flow of gas from the high temperature space 51 to the low temperature space 52. The partition wall 42 may extend from an upper side wall 32 to the other upper side wall 33 as shown in FIG. 3, and may traverse the forming space 50.

高溫空間51與低溫空間52相比成為高溫,因此含有大量由浴槽20內之熔融金屬11蒸發之氣體。該氣體以單體及化合物中之至少任一種形態含有由熔融金屬11蒸發之金屬元素。作為化合物,可列舉:金屬氧化物、金屬硫化物等。以下,將該氣體稱為含有金屬之氣體。 Since the high temperature space 51 has a high temperature as compared with the low temperature space 52, it contains a large amount of gas evaporated by the molten metal 11 in the bath 20. The gas contains a metal element evaporated from the molten metal 11 in the form of at least one of a monomer and a compound. The compound may, for example, be a metal oxide or a metal sulfide. Hereinafter, this gas is referred to as a metal-containing gas.

分隔壁42係限制含有金屬之氣體自高溫空間51向低溫空間52流出。可減少低溫空間52中可因含有金屬之氣體之冷卻而形成之液滴或粒子等異物之數量。其結果,可減少因異物掉落在玻璃帶14之表面而產生之缺陷之數量。 The partition wall 42 restricts the flow of the metal-containing gas from the high temperature space 51 to the low temperature space 52. The amount of foreign matter such as droplets or particles which can be formed by cooling of the metal-containing gas in the low temperature space 52 can be reduced. As a result, the number of defects generated by the foreign matter falling on the surface of the glass ribbon 14 can be reduced.

對高溫空間51及低溫空間52,自成形裝置10之外部經由形成於各自之頂壁之供氣通路34而供給氣體。為了限制熔融金屬11之液面之露出部分之氧化,該氣體可為還原性氣體。還原性氣體例如包含1~15體積%之氫氣、85~99體積%之氮氣。還原性氣體可於被頂壁外殼(roof casing)31及頂壁30包圍之預熱空間53中經預熱後,經由供氣通路34被供給至高溫空間51及低溫空間52。再者,預熱空間53內之氣體不僅經由供氣通路34,亦經由形成頂壁30之磚之接縫等而流入至成形空間50內。 The high temperature space 51 and the low temperature space 52 are supplied with gas from the outside of the forming apparatus 10 via the air supply passages 34 formed in the respective top walls. In order to restrict oxidation of the exposed portion of the liquid surface of the molten metal 11, the gas may be a reducing gas. The reducing gas contains, for example, 1 to 15% by volume of hydrogen and 85 to 99% by volume of nitrogen. The reducing gas is preheated in the preheating space 53 surrounded by the roof casing 31 and the top wall 30, and then supplied to the high temperature space 51 and the low temperature space 52 via the air supply passage 34. Further, the gas in the preheating space 53 flows into the forming space 50 not only through the air supply passage 34 but also through the joint of the brick forming the top wall 30 or the like.

再者,對本實施形態之高溫空間51及低溫空間52,經由形成於各自之頂壁之供氣通路34而供給相同種類之氣體,但亦可供給不同種類之氣體。 Further, in the high temperature space 51 and the low temperature space 52 of the present embodiment, the same type of gas is supplied through the air supply passages 34 formed in the respective top walls, but different types of gases may be supplied.

對高溫空間51,除形成於其頂壁之供氣通路34外,亦可經由形成於流道控制閘板23與入口壁26之間之斜槽空間27而自成形裝置10之外部供給氣體。 The high temperature space 51 may be supplied with gas from the outside of the forming apparatus 10 via a chute space 27 formed between the flow path control shutter 23 and the inlet wall 26 in addition to the air supply passage 34 formed in the top wall thereof.

對斜槽空間27,可自上方及側方中之至少一個方向供給氣體。該氣體可為惰性氣體、還原性氣體中之任一種。斜槽空間27上未連接有排氣通路,供給至斜槽空間27之氣體之大部分係通過入口壁26之下方而供給至高溫空間51。 For the chute space 27, gas may be supplied from at least one of the upper side and the side. The gas may be any one of an inert gas and a reducing gas. An exhaust passage is not connected to the chute space 27, and most of the gas supplied to the chute space 27 is supplied to the high temperature space 51 through the lower side of the inlet wall 26.

於高溫空間51之側壁(即,上部側壁32、33)形成有排氣通路44。排氣通路44係將高溫空間51之氣體排出至成形裝置10之外部。所謂成形裝置10之外部,以下亦可改稱為成形空間50之外部。排氣通路44可利用高溫空間51與成形裝置10之外部之氣壓差而將氣體排出,亦可利用泵等之抽吸力而將氣體排出。再者,排氣通路44不僅可形成於高溫空間51之側壁,亦可形成於低溫空間52之側壁。 An exhaust passage 44 is formed in a side wall of the high temperature space 51 (ie, the upper side walls 32, 33). The exhaust passage 44 discharges the gas of the high temperature space 51 to the outside of the forming apparatus 10. The outside of the molding apparatus 10 may be hereinafter referred to as the outside of the molding space 50. The exhaust passage 44 can discharge the gas by using a difference in air pressure between the high temperature space 51 and the outside of the molding apparatus 10, or can discharge the gas by a suction force such as a pump. Further, the exhaust passage 44 may be formed not only on the side wall of the high temperature space 51 but also on the side wall of the low temperature space 52.

繼而,再次參照圖1~3對使用上述構成之浮式玻璃裝置之浮式玻璃製造方法進行說明。 Next, a method of manufacturing a floating glass using the floating glass apparatus having the above configuration will be described with reference to FIGS. 1 to 3 again.

浮式玻璃製造方法包括如下成形步驟,即使玻璃帶14流動於浴槽20內之熔融金屬11之液面上而使之成形為板狀。於成形步驟中,藉由上輥40壓住通過熔融金屬11之液面與入口壁26之間之玻璃帶14之寬度方向端部,該上輥40旋轉而使玻璃帶14向下游方向流動。 The floating glass manufacturing method includes a forming step of forming the glass ribbon 14 into a plate shape even if it flows on the liquid surface of the molten metal 11 in the bath 20. In the forming step, the upper roller 40 presses the end portion in the width direction of the glass ribbon 14 passing between the liquid surface of the molten metal 11 and the inlet wall 26, and the upper roller 40 rotates to cause the glass ribbon 14 to flow in the downstream direction.

然而,如圖2所示般,於較入口壁26更上游側,熔融金屬11之液面之全部被玻璃帶14覆蓋,因此含有金屬之氣體之量較少。另一方面,於較入口壁26更下游側,熔融金屬11之液面之一部分未被玻璃帶14覆蓋,因此含有金屬之氣體之量較多。因此,分隔壁42係配設於較入口 壁26更下游側。較分隔壁42更上游側之高溫空間51可捕獲大量含有金屬之氣體。 However, as shown in FIG. 2, on the upstream side of the inlet wall 26, the entire liquid surface of the molten metal 11 is covered by the glass ribbon 14, so that the amount of the metal-containing gas is small. On the other hand, on the downstream side of the inlet wall 26, a part of the liquid surface of the molten metal 11 is not covered by the glass ribbon 14, and therefore the amount of the metal-containing gas is large. Therefore, the partition wall 42 is disposed at the entrance The wall 26 is further downstream. The high temperature space 51 on the upstream side of the partition wall 42 can capture a large amount of metal-containing gas.

又,於上輥40附近,氣流容易變得不穩定。作為氣流變得不穩定之原因,例如可列舉較冷之外部氣體自上部側壁32上供上輥40之旋轉軸插通之貫通孔之混入、及藉由冷媒冷卻之上輥40與其周邊之溫度差等。因此,分隔壁42係配設於較玻璃帶14之流動方向上隔開間隔而排列之複數根上輥40中配設於最上游側之上輥40(以下,稱為「最上游之上輥40」)更上游側。可使分隔壁42附近之氣流穩定化,而可抑制高溫空間51所捕獲之含有金屬之氣體向低溫空間52流出。 Further, in the vicinity of the upper roller 40, the airflow is liable to become unstable. The reason why the airflow becomes unstable is, for example, the incorporation of the cold external air from the through hole of the upper side wall 32 through which the rotating shaft of the upper roller 40 is inserted, and the temperature of the upper roller 40 and its periphery by the cooling of the refrigerant. Poor and so on. Therefore, the partition wall 42 is disposed on the most upstream upper roller 40 among the plurality of upper rollers 40 arranged at intervals in the flow direction of the glass ribbon 14 (hereinafter, referred to as "the most upstream roller 40" ") on the upstream side. The gas flow in the vicinity of the partition wall 42 can be stabilized, and the metal-containing gas trapped in the high temperature space 51 can be suppressed from flowing out to the low temperature space 52.

如上所述,分隔壁42係配設於較入口壁26更下游側,且配設於較最上游之上輥40更上游側。藉此,較分隔壁42更上游側之高溫空間51可捕獲大量含有金屬之氣體,且可抑制高溫空間51所捕獲之含有金屬之氣體向低溫空間52流出。 As described above, the partition wall 42 is disposed on the downstream side of the inlet wall 26 and disposed on the upstream side of the uppermost upstream roller 40. Thereby, the high temperature space 51 on the upstream side of the partition wall 42 can capture a large amount of metal-containing gas, and can suppress the metal-containing gas trapped in the high temperature space 51 from flowing out to the low temperature space 52.

又,分隔壁42可如圖2所示般配設於玻璃帶14之流動方向上玻璃帶14之黏度為104.9~105.6dPa‧s的範圍Z。若於上述範圍Z配設分隔壁42,則可將分隔壁42配設於充分遠離最上游之上輥40之上游側之位置,因此分隔壁42附近之氣流容易穩定化。尤其是於浮式玻璃之板厚為2mm以下、較佳為1mm以下、進而較佳為0.7mm以下之情形時,就可使氣流穩定化之方面而言有效。浮式玻璃之板厚變得越薄,為了將玻璃帶14拉伸為較薄,所使用之上輥40之數量變得越多。於此種情形時,若於上述範圍Z配設分隔壁42,則可將分隔壁42配設於充分遠離最上游之上輥40之上游側之位置,因此容易使分隔壁42附近之氣流安定化。又,若於上述範圍Z配設分隔壁42,則可將分隔壁42配設於充分遠離入口壁26之下游側之位置,因此上游側之高溫空間51可捕獲大量含有金屬之氣體。分隔壁42較佳為配設於玻璃帶14之流動方向上玻璃帶14之黏度為104.9~105.5dPa‧s的範圍,更佳為配設於玻璃帶14之黏度 為105.0~105.4dPa‧s的範圍。 Further, the partition wall 42 may be disposed in the range Z of the viscosity of the glass ribbon 14 in the flow direction of the glass ribbon 14 as shown in Fig. 2 of 10 4.9 to 10 5.6 dPa ‧ s. When the partition wall 42 is disposed in the above range Z, the partition wall 42 can be disposed at a position sufficiently far from the upstream side of the most upstream upper roller 40, so that the airflow in the vicinity of the partition wall 42 can be easily stabilized. In particular, when the thickness of the floating glass is 2 mm or less, preferably 1 mm or less, and more preferably 0.7 mm or less, it is effective in terms of stabilizing the gas flow. The thinner the thickness of the floating glass becomes, the more the number of upper rolls 40 used becomes to stretch the glass ribbon 14 to be thinner. In this case, if the partition wall 42 is disposed in the above range Z, the partition wall 42 can be disposed at a position sufficiently far from the upstream side of the most upstream upper roller 40, so that the airflow in the vicinity of the partition wall 42 is easily stabilized. Chemical. Further, when the partition wall 42 is disposed in the above range Z, the partition wall 42 can be disposed at a position sufficiently far from the downstream side of the inlet wall 26, so that the high temperature space 51 on the upstream side can capture a large amount of gas containing metal. Preferably, the partition wall 42 has a viscosity of 10 4.9 to 10 5.5 dPa ‧ in the flow direction of the glass ribbon 14 , and more preferably 10 5.0 to 10 5.4 in the glass ribbon 14 . The scope of dPa‧s.

於分隔壁42與入口壁26之間,熔融金屬11之液面中未被玻璃帶14覆蓋之露出部分之比率可為10~40%。若露出部分之比率為10%以上,則形成於分隔壁42與入口壁26之間之高溫空間51可充分捕獲含有金屬之氣體。又,若露出部分之比率為40%以下,則可抑制由含有金屬之氣體引起之加熱器36之劣化。於分隔壁42與入口壁26之間,熔融金屬11之露出部分占熔融金屬11之液面之比率較佳為10~35%,更佳為10~20%。 Between the partition wall 42 and the inlet wall 26, the ratio of the exposed portion of the molten metal 11 that is not covered by the glass ribbon 14 may be 10 to 40%. If the ratio of the exposed portion is 10% or more, the high-temperature space 51 formed between the partition wall 42 and the inlet wall 26 can sufficiently capture the metal-containing gas. Further, when the ratio of the exposed portion is 40% or less, deterioration of the heater 36 caused by the metal-containing gas can be suppressed. Between the partition wall 42 and the inlet wall 26, the ratio of the exposed portion of the molten metal 11 to the liquid surface of the molten metal 11 is preferably from 10 to 35%, more preferably from 10 to 20%.

又,分隔壁42可如圖1所示般配設於入口壁26之上游端與分隔壁42之上游端之間的水平方向距離(X方向距離)L1成為入口壁26之上游端與出口壁28之上游端之間的X方向距離L2之5~20%的位置。若距離L1為距離L2之5%以上,則形成於分隔壁42與入口壁26之間之高溫空間51可充分捕獲含有金屬之氣體。又,若距離L1為距離L2之20%以下,則可將分隔壁42配設於充分遠離最上游之上輥40之上游側之位置。距離L1較佳為距離L2之5~15%,更佳為距離L2之5~10%。 Further, the partition wall 42 may be disposed in the horizontal direction (X-direction distance) L1 between the upstream end of the inlet wall 26 and the upstream end of the partition wall 42 as the upstream end and the outlet wall 28 of the inlet wall 26 as shown in FIG. The X direction between the upstream ends is 5 to 20% of the distance L2. If the distance L1 is 5% or more of the distance L2, the high-temperature space 51 formed between the partition wall 42 and the inlet wall 26 can sufficiently capture the metal-containing gas. Moreover, when the distance L1 is 20% or less of the distance L2, the partition wall 42 can be disposed at a position sufficiently far from the upstream side of the most upstream upper roller 40. The distance L1 is preferably 5 to 15% of the distance L2, more preferably 5 to 10% of the distance L2.

分隔壁42係自頂壁30向下方突出。以熔融金屬11之液面之露出部分為基準,分隔壁42之下端之高度H1(參照圖3)為例如頂壁30之下方之高度H2(參照圖1)之10~40%。若分隔壁42之下端之高度H1為頂壁30之下方之高度H2的10%以上,則可自成形空間50之最上游監視較分隔壁42更下游之玻璃帶。又,若分隔壁42之下端之高度H1為頂壁30之下方之高度H2的40%以下,則可使含有金屬之氣體留在高溫空間51內,從而可減少含有金屬之氣體自高溫空間51向低溫空間52流出。分隔壁42之下端之高度H1較佳為頂壁30之下方之高度H2的10~35%,更佳為頂壁30之下方之高度H2的10~20%。 The partition wall 42 protrudes downward from the top wall 30. The height H1 (see FIG. 3) of the lower end of the partition wall 42 is, for example, 10 to 40% of the height H2 (see FIG. 1) below the top wall 30, based on the exposed portion of the liquid surface of the molten metal 11. If the height H1 of the lower end of the partition wall 42 is 10% or more of the height H2 below the top wall 30, the glass ribbon downstream of the partition wall 42 can be monitored from the most upstream of the forming space 50. Further, if the height H1 of the lower end of the partition wall 42 is 40% or less of the height H2 below the top wall 30, the metal-containing gas can be left in the high temperature space 51, so that the metal-containing gas can be reduced from the high temperature space 51. It flows out to the low temperature space 52. The height H1 of the lower end of the partition wall 42 is preferably 10 to 35% of the height H2 below the top wall 30, and more preferably 10 to 20% of the height H2 below the top wall 30.

為了使高度H1可變,可使分隔壁42能夠相對於頂壁30於上下方向上移動。如例如圖1及圖3所示般,分隔壁42上連結有連結桿46,頂壁 外殼31上保持螺帽47自由旋轉。若使螺帽47旋轉,則與螺帽47螺合之連結桿46於上下方向上移動,其結果分隔壁42於上下方向上移動。 In order to make the height H1 variable, the partition wall 42 can be moved in the up and down direction with respect to the top wall 30. As shown in FIG. 1 and FIG. 3, for example, a connecting rod 46 is coupled to the partition wall 42 and the top wall is The nut 47 is kept free to rotate on the outer casing 31. When the nut 47 is rotated, the connecting rod 46 screwed to the nut 47 moves in the vertical direction, and as a result, the partition wall 42 moves in the vertical direction.

高溫空間51中,氣體向成形裝置10之外部之排出量Qout較佳為氣體自成形裝置10之外部之供給量Qin的100%以上,更佳為供給量Qin之170%以上,進而較佳為供給量之230%以上。 In the high-temperature space 51, the discharge amount Qout of the gas to the outside of the molding apparatus 10 is preferably 100% or more of the supply amount Qin of the gas from the outside of the molding apparatus 10, more preferably 170% or more of the supply amount Qin, and further preferably More than 230% of the supply.

此處,Qin意指自上方、側方、及上游中之至少任一方向(本實施形態中自上方及上游)向高溫空間51供給之氣體的正常流量(Nm3/hr)。 Qin並不包括氣體自下游之供給量。Qin包括氣體自上游(即,斜槽空間27)之供給量之原因在於,自成形裝置10之外部向斜槽空間27供給之氣體之大部分直接供給至高溫空間51。再者,於自側方向高溫空間51供給氣體之情形時,可於上部側壁32、33設置供氣通路。 Here, "Qin" means a normal flow rate (Nm 3 /hr) of gas supplied to the high temperature space 51 from at least one of the upper side, the side, and the upstream (in the present embodiment from the upper side and the upstream side). Qin does not include the supply of gas from the downstream. The reason why Qin includes the supply amount of gas from the upstream (i.e., the chute space 27) is that most of the gas supplied from the outside of the forming device 10 to the chute space 27 is directly supplied to the high temperature space 51. Further, when gas is supplied from the side direction high temperature space 51, an air supply passage can be provided in the upper side walls 32, 33.

另一方面,Qout意指自高溫空間51向上方及側方中之至少任一方向(本實施形態中向側方)排出之氣體的正常流量(Nm3/hr)。Qout並不包括氣體向下游及上游之排出量。再者,氣體向上游(即,斜槽空間27)之排出量為微量。其原因在於,斜槽空間27上未連接有排氣通路。再者,於自高溫空間51向上方排出氣體之情形時,可於頂壁30設置排氣通路。 On the other hand, Qout means a normal flow rate (Nm 3 /hr) of the gas discharged from at least one of the upper side and the side (the side in the present embodiment) from the high temperature space 51. Qout does not include the amount of gas discharged downstream and upstream. Furthermore, the amount of gas discharged upstream (i.e., the chute space 27) is a small amount. The reason for this is that an exhaust passage is not connected to the chute space 27. Further, when the gas is discharged upward from the high temperature space 51, an exhaust passage may be provided in the top wall 30.

若排出量與供給量同等,則幾乎無高溫空間51與低溫空間52之間之氣體之出入,從而幾乎無含有金屬之氣體自高溫空間51向低溫空間52之流出。 When the discharge amount is equal to the supply amount, there is almost no gas entering and leaving between the high temperature space 51 and the low temperature space 52, and almost no metal-containing gas flows out from the high temperature space 51 to the low temperature space 52.

又,若排出量多於供給量,則自低溫空間52向高溫空間51供給氣體。因此,形成自低溫空間52向高溫空間51之氣流,該氣流可抑制含有金屬之氣體自高溫空間51向低溫空間52流出。 Moreover, when the discharge amount is more than the supply amount, the gas is supplied from the low temperature space 52 to the high temperature space 51. Therefore, a gas flow from the low temperature space 52 to the high temperature space 51 is formed, which suppresses the outflow of the metal-containing gas from the high temperature space 51 to the low temperature space 52.

所製造之浮式玻璃例如可為無鹼玻璃。無鹼玻璃係實質上不含有鹼金屬氧化物(Na2O、K2O、Li2O等)之玻璃。無鹼玻璃中鹼金屬氧化物之含量之合計量可為0.1質量%以下。 The float glass produced can be, for example, an alkali-free glass. The alkali-free glass is substantially free of glass of an alkali metal oxide (Na 2 O, K 2 O, Li 2 O, etc.). The total amount of the alkali metal oxide in the alkali-free glass may be 0.1% by mass or less.

無鹼玻璃例如以氧化物基準之質量%表示而含有SiO2:50~73%、Al2O3:10.5~24%、B2O3:0~12%、MgO:0~8%、CaO:0~14.5%、SrO:0~24%、BaO:0~13.5%、ZrO2:0~5%、MgO+CaO+SrO+BaO:8~29.5%。 The alkali-free glass is, for example, represented by mass % of oxide, and contains SiO 2 : 50 to 73%, Al 2 O 3 : 10.5 to 24%, B 2 O 3 : 0 to 12%, MgO: 0 to 8%, and CaO. : 0 to 14.5%, SrO: 0 to 24%, BaO: 0 to 13.5%, ZrO 2 : 0 to 5%, and MgO + CaO + SrO + BaO: 8 to 29.5%.

於兼顧較高之應變點與較高之溶解性之情形時,無鹼玻璃較佳為以氧化物基準之質量%表示而含有SiO2:58~66%、Al2O3:15~22%、B2O3:5~12%、MgO:0~8%、CaO:0~9%、SrO:3~12.5%、BaO:0~2%、MgO+CaO+SrO+BaO:9~18%。 In the case of taking into account a higher strain point and a higher solubility, the alkali-free glass is preferably represented by mass % of oxide and contains SiO 2 : 58 to 66%, and Al 2 O 3 : 15 to 22%. , B 2 O 3 : 5~12%, MgO: 0~8%, CaO: 0~9%, SrO: 3~12.5%, BaO: 0~2%, MgO+CaO+SrO+BaO: 9~18 %.

尤其是於欲獲得較高之應變點之情形時,無鹼玻璃較佳為以氧化物基準之質量%表示而含有SiO2:54~73%、Al2O3:10.5~22.5%、B2O3:0~5.5%、MgO:0~8%、CaO:0~9%、SrO:0~16%、BaO:0~2.5%、MgO+CaO+SrO+BaO:8~26%。 In particular, in the case where a higher strain point is to be obtained, the alkali-free glass is preferably represented by mass % of the oxide and contains SiO 2 : 54 to 73%, Al 2 O 3 : 10.5 to 22.5%, and B 2 . O 3 : 0 to 5.5%, MgO: 0 to 8%, CaO: 0 to 9%, SrO: 0 to 16%, BaO: 0 to 2.5%, and MgO + CaO + SrO + BaO: 8 to 26%.

該等無鹼玻璃之成形溫度比通常之鈉鈣玻璃之成形溫度高100℃以上。因此,由熔融金屬11蒸發之含有金屬之氣體之量較多,從而分隔壁42抑制含有金屬之氣體自高溫空間51向低溫空間52流出之意義較大。 The forming temperature of the alkali-free glass is higher than the molding temperature of the usual soda lime glass by 100 ° C or more. Therefore, the amount of the metal-containing gas evaporated by the molten metal 11 is large, and the partition wall 42 suppresses the flow of the metal-containing gas from the high temperature space 51 to the low temperature space 52.

以上,對浮式玻璃製造方法及浮式玻璃製造裝置之實施形態進行了說明,但本發明並不限定於上述實施形態等,於申請專利範圍所記載之本發明之主旨之範圍內,可進行各種變化、改良。 In the above, the embodiment of the floating glass manufacturing method and the floating glass manufacturing apparatus has been described. However, the present invention is not limited to the above-described embodiment and the like, and can be carried out within the scope of the gist of the present invention described in the claims. Various changes and improvements.

本申請案係主張基於2013年8月22日向日本專利廳提出申請之日本專利特願2013-171982號之優選權者,且將日本專利特願2013-171982號之全部內容引用於本申請案中。 The present application claims the priority of Japanese Patent Application No. 2013-171982, filed on Jan. 22, 2013, to the Japanese Patent Office, the entire contents of .

10‧‧‧成形裝置 10‧‧‧Forming device

11‧‧‧熔融金屬 11‧‧‧ molten metal

12‧‧‧熔融玻璃 12‧‧‧ molten glass

14‧‧‧玻璃帶 14‧‧‧glass ribbon

20‧‧‧浴槽 20‧‧‧ bath

22‧‧‧斜槽口 22‧‧‧ chute

23‧‧‧流道控制閘板 23‧‧‧Flow channel control gate

24‧‧‧限流磚 24‧‧‧Limited bricks

26‧‧‧入口壁 26‧‧‧ entrance wall

27‧‧‧斜槽空間 27‧‧‧ chute space

28‧‧‧出口壁 28‧‧‧Exit wall

30‧‧‧頂壁 30‧‧‧ top wall

31‧‧‧頂壁外殼 31‧‧‧Top wall housing

34‧‧‧供氣通路 34‧‧‧ gas supply path

36‧‧‧加熱器 36‧‧‧heater

40‧‧‧上輥 40‧‧‧Upper roll

42‧‧‧分隔壁 42‧‧‧ partition wall

46‧‧‧連結桿 46‧‧‧ Connecting rod

47‧‧‧螺帽 47‧‧‧ Nuts

50‧‧‧成形空間 50‧‧‧Forming space

51‧‧‧高溫空間 51‧‧‧High temperature space

52‧‧‧低溫空間 52‧‧‧low temperature space

53‧‧‧預熱空間 53‧‧‧Preheating space

H2‧‧‧高度 H2‧‧‧ Height

L1‧‧‧距離 L1‧‧‧ distance

L2‧‧‧距離 L2‧‧‧ distance

X‧‧‧方向 X‧‧‧ direction

Claims (9)

一種浮式玻璃製造裝置,其包括:浴槽,其收容熔融金屬;入口壁,其位於上述浴槽之上游部之上方;出口壁,其位於上述浴槽之下游部之上方;頂壁,其配設於上述浴槽之上方且自上述入口壁延伸至上述出口壁;複數根上輥,其等沿著於上述熔融金屬之液面上流動之玻璃帶之流動方向隔開間隔而設置,並且壓住通過上述液面與上述入口壁之間之上述玻璃帶之寬度方向端部且本身旋轉;分隔壁,其將由上述頂壁、上述浴槽、上述入口壁及上述出口壁包圍之成形空間分隔成上游側之高溫空間與下游側之低溫空間;及排氣通路,其將上述高溫空間內之氣體排出至上述成形空間之外部;且上述分隔壁係配設於較上述入口壁更下游側,且配設於較上述複數根上輥中最上游側之上輥更上游。 A floating glass manufacturing apparatus comprising: a bath for containing molten metal; an inlet wall located above an upstream portion of the bath; an outlet wall located above a downstream portion of the bath; and a top wall configured to Above the bath and extending from the inlet wall to the outlet wall; a plurality of upper rolls are disposed at intervals along a flow direction of the glass ribbon flowing on the liquid surface of the molten metal, and are pressed through the liquid a widthwise end of the glass ribbon between the surface and the inlet wall and rotating by itself; a partition wall separating the forming space surrounded by the top wall, the bath, the inlet wall and the outlet wall into a high temperature space on the upstream side a low-temperature space on the downstream side; and an exhaust passage that discharges the gas in the high-temperature space to the outside of the forming space; and the partition wall is disposed on a downstream side of the inlet wall, and is disposed on the side The uppermost roller on the uppermost roller of the plurality of upper rollers is further upstream. 如請求項1之浮式玻璃製造裝置,其中上述分隔壁係配設於上述玻璃帶之流動方向上之上述玻璃帶之黏度為104.9~105.6dPa‧s的範圍。 The floating glass manufacturing apparatus according to claim 1, wherein the partition wall is disposed in a range in which the glass ribbon has a viscosity of 10 4.9 to 10 5.6 dPa ‧ in a flow direction of the glass ribbon. 如請求項1或2之浮式玻璃製造裝置,其中於上述分隔壁與上述入口壁之間,上述熔融金屬之液面中未被上述玻璃帶覆蓋之露出部分之比率為10~40%。 The floating glass manufacturing apparatus according to claim 1 or 2, wherein a ratio of an exposed portion of the molten metal surface which is not covered by the glass ribbon is 10 to 40% between the partition wall and the inlet wall. 如請求項1至3中任一項之浮式玻璃製造裝置,其中上述分隔壁自上述頂壁向下方突出,且 以上述熔融金屬之液面之露出部分為基準,上述分隔壁之下端之高度為上述頂壁之下方之高度的10~40%。 The floating glass manufacturing apparatus according to any one of claims 1 to 3, wherein the partition wall protrudes downward from the top wall, and The height of the lower end of the partition wall is 10 to 40% of the height below the top wall based on the exposed portion of the liquid surface of the molten metal. 如請求項1至4中任一項之浮式玻璃製造裝置,其中所製造之浮式玻璃為無鹼玻璃。 The floating glass manufacturing apparatus according to any one of claims 1 to 4, wherein the floating glass produced is an alkali-free glass. 一種浮式玻璃製造方法,其特徵在於:使用如請求項1至5中任一項之浮式玻璃製造裝置,將上述高溫空間內之氣體經由上述排氣通路而排出至上述成形空間之外部。 A method for producing a floating glass, characterized in that the gas in the high-temperature space is discharged to the outside of the forming space via the exhaust passage by using the floating glass manufacturing apparatus according to any one of claims 1 to 5. 一種浮式玻璃製造方法,其使用如請求項1之浮式玻璃製造裝置,且於上述玻璃帶之流動方向上之上述玻璃帶之黏度為104.9~105.6dPa‧s的範圍配設上述分隔壁。 A floating glass manufacturing method using the floating glass manufacturing apparatus of claim 1, wherein the viscosity of the glass ribbon in the flow direction of the glass ribbon is in a range of 10 4.9 to 10 5.6 dPa ‧ next door. 一種浮式玻璃製造方法,其使用如請求項1之浮式玻璃製造裝置,且上述熔融金屬之液面中未被上述玻璃帶覆蓋之露出部分之比率於上述分隔壁與上述入口壁之間為10~40%。 A floating glass manufacturing method using the floating glass manufacturing apparatus of claim 1, wherein a ratio of an exposed portion of the molten metal surface that is not covered by the glass ribbon is between the partition wall and the inlet wall 10~40%. 一種浮式玻璃製造方法,其使用如請求項1之浮式玻璃製造裝置,且所製造之浮式玻璃為無鹼玻璃。 A method of manufacturing a floating glass using the floating glass manufacturing apparatus of claim 1, and the manufactured floating glass is an alkali-free glass.
TW103119264A 2013-08-22 2014-06-03 Float glass production device and float glass production method using same TW201507982A (en)

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