TW201441486A - Cryopump and vacuum pumping method - Google Patents

Cryopump and vacuum pumping method Download PDF

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Publication number
TW201441486A
TW201441486A TW103110674A TW103110674A TW201441486A TW 201441486 A TW201441486 A TW 201441486A TW 103110674 A TW103110674 A TW 103110674A TW 103110674 A TW103110674 A TW 103110674A TW 201441486 A TW201441486 A TW 201441486A
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Taiwan
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cryopanel
gap
cryopump
gas
mask
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TW103110674A
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Chinese (zh)
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TWI580865B (en
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Ken Oikawa
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Sumitomo Heavy Industries
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Priority claimed from JP2013125819A external-priority patent/JP6076843B2/en
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Publication of TWI580865B publication Critical patent/TWI580865B/en

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    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04BPOSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B37/00Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00
    • F04B37/06Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for evacuating by thermal means
    • F04B37/08Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for evacuating by thermal means by condensing or freezing, e.g. cryogenic pumps

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Compressors, Vaccum Pumps And Other Relevant Systems (AREA)

Abstract

A cryopump includes a first cryopanel including a radiation shield and a plate member across a shield opening and a second cryopanel enclosed by the first cryopanel and cooled to a lower temperature than that of the first cryopanel. The plate member includes a plate main portion and a plate peripheral portion adapted to attach the plate main portion to the radiation shield. The plate main portion includes a gas passing region having a multitude of pores through which gases pass to be condensed on the second cryopanel and a gas shielding region formed at a different position in the plate main portion from that of the gas passing region.

Description

低溫泵 Cryopump

本發明係有關一種低溫泵。 The present invention relates to a cryopump.

低溫泵一般具備溫度不同的兩種低溫板。氣體冷凝在低溫的低溫板上。隨著低溫泵的使用,在低溫低溫板上冷凝層逐漸成長,不久可能會與高溫的低溫板接觸。如此一來,在高溫低溫板與冷凝層的接觸部位,氣體再次氣化而向周圍釋放。以後,低溫泵將無法充份發揮原來的作用。因此,此時的氣體的存儲量賦予低溫泵的最大存儲量。 Cryopumps generally have two cryopanels with different temperatures. The gas is condensed on a low temperature cryostat. With the use of cryopumps, the condensed layer gradually grows on the low temperature and low temperature plates, and may soon come into contact with the high temperature cryopanel. As a result, at the contact portion between the high temperature and low temperature plate and the condensation layer, the gas is vaporized again and released to the surroundings. In the future, the cryopump will not be able to fully play its original role. Therefore, the amount of gas stored at this time is given to the maximum storage amount of the cryopump.

(先前技術文獻) (previous technical literature) (專利文獻) (Patent Literature)

專利文獻1:日本特開2009-275672號公報 Patent Document 1: Japanese Laid-Open Patent Publication No. 2009-275672

本發明的一態樣的例示性目的之一為提高低溫泵的氣體存儲量。 One of the exemplary purposes of one aspect of the present invention is to increase the amount of gas stored in a cryopump.

本發明的一態樣的低溫泵,具備:冷凍機,具備第1冷卻台及被冷卻成溫度低於前述第1冷卻台的第2冷卻台;第1低溫板,具備有主開口之放射遮罩及配設在前述主開口之入口低溫板,且與前述第1冷卻台熱連接;以及第2低溫板,被前述第1低溫板包圍,且與前述第2冷卻台熱連接。前述放射遮罩具備:安裝座,位於前述第2低溫板的側方,且用於將前述冷凍機安裝於前述放射遮罩上;以及遮罩部份,與前述安裝座相鄰且包圍前述第2低溫板。在前述第2低溫板與前述安裝座之間形成有側方間隙,在前述第2低溫板與前述遮罩部份之間形成有與前述側方間隙連續之間隙部,前述第2低溫板的形狀或配置被調整為使前述側方間隙的寬度與前述間隙部的寬度一致。 A cryopump according to an aspect of the present invention includes: a refrigerator including a first cooling stage and a second cooling stage cooled to a temperature lower than the first cooling stage; and the first cryopanel having a radiation shielding of the main opening The cover and the inlet cryopanel disposed in the main opening are thermally connected to the first cooling stage; and the second cryopanel is surrounded by the first cryopanel and thermally connected to the second cooling stage. The radiation mask includes a mounting seat located on a side of the second cryopanel and configured to mount the refrigerator on the radiation mask, and a mask portion adjacent to the mount and surrounding the foregoing 2 low temperature plate. A side gap is formed between the second cryopanel and the mount, and a gap portion continuous with the side gap is formed between the second cryopanel and the mask portion, and the second cryopanel is formed The shape or arrangement is adjusted such that the width of the aforementioned side gap coincides with the width of the aforementioned gap portion.

另外,將本發明的構成要件或表現形式在方法、裝置及系統等之間相互替換之技術亦可有效作為本發明的態樣。 Further, a technique of replacing the constituent elements or expressions of the present invention with each other among methods, apparatuses, systems, and the like can also be effectively employed as an aspect of the present invention.

依本發明,能夠提高低溫泵的氣體存儲量。 According to the present invention, the amount of gas stored in the cryopump can be increased.

10‧‧‧低溫泵 10‧‧‧Cryogenic pump

16‧‧‧冷凍機 16‧‧‧Freezer

18‧‧‧第1低溫板 18‧‧‧1st cryogenic plate

20‧‧‧第2低溫板 20‧‧‧2nd cryogenic plate

22‧‧‧第1冷卻台 22‧‧‧1st cooling station

24‧‧‧第2冷卻台 24‧‧‧2nd cooling station

26‧‧‧遮罩開口 26‧‧‧Mask opening

30‧‧‧放射遮罩 30‧‧‧radiation mask

32‧‧‧板構件 32‧‧‧ Board components

36‧‧‧遮罩側部 36‧‧‧Mask side

37‧‧‧安裝座 37‧‧‧ Mounting

41‧‧‧開環狀部份 41‧‧‧Open ring section

42‧‧‧安裝孔 42‧‧‧Mounting holes

43‧‧‧側方間隙 43‧‧‧ side clearance

44‧‧‧間隙部 44‧‧‧Gap section

46‧‧‧上方間隙 46‧‧‧Over the gap

48‧‧‧下方間隙 48‧‧‧The gap below

50‧‧‧板主體部 50‧‧‧ board main body

52‧‧‧板外緣部 52‧‧‧The outer edge of the board

54‧‧‧小孔 54‧‧‧Small hole

56‧‧‧氣體通過區域 56‧‧‧Gas passage area

58‧‧‧氣體隔離區域 58‧‧‧Gas isolation zone

61‧‧‧頂板前表面 61‧‧‧ Top surface of the top plate

62‧‧‧中心區域 62‧‧‧Central area

63‧‧‧外側區域 63‧‧‧Outer area

74‧‧‧缺口部 74‧‧‧Gap section

第1圖係模式表示本發明的第1實施形態之低溫泵的主要部份之側剖面圖。 Fig. 1 is a side cross-sectional view showing a main part of a cryopump according to a first embodiment of the present invention.

第2圖係模式表示本發明的第1實施形態之頂板之俯 視圖。 Fig. 2 is a diagram showing the top plate of the first embodiment of the present invention. view.

第3圖係模式表示本發明的第1實施形態之板構件之俯視圖。 Fig. 3 is a plan view showing a plate member according to a first embodiment of the present invention.

第4圖係模式表示本發明的第1實施形態之排氣運轉中的低溫泵之圖。 Fig. 4 is a view showing a cryopump in an exhausting operation according to the first embodiment of the present invention.

第5圖係模式表示本發明的第2實施形態之低溫泵的主要部份之側剖面圖。 Fig. 5 is a side cross-sectional view showing a main part of a cryopump according to a second embodiment of the present invention.

第6圖係模式表示本發明的第3實施形態之低溫泵的主要部份之側剖面圖。 Fig. 6 is a side cross-sectional view showing a main part of a cryopump according to a third embodiment of the present invention.

第1圖係模式表示本發明的第1實施形態之低溫泵10的主要部份之側剖面圖。低溫泵10例如安裝於離子植入裝置或濺射裝置等的真空腔室,用於將真空腔室內部的真空度提高至所希望的過程要求之位準為止。低溫泵10具有用於接收氣體之吸氣口12。應被排出之氣體從安裝有低溫泵10之真空腔室通過吸氣口12進入低溫泵10的內部空間14。第1圖表示包含低溫泵10的內部空間14的中心軸A在內之剖面。 Fig. 1 is a side cross-sectional view showing the main part of the cryopump 10 according to the first embodiment of the present invention. The cryopump 10 is mounted, for example, in a vacuum chamber such as an ion implantation apparatus or a sputtering apparatus for raising the degree of vacuum inside the vacuum chamber to a desired level of process requirements. The cryopump 10 has an intake port 12 for receiving a gas. The gas to be discharged enters the internal space 14 of the cryopump 10 from the vacuum chamber in which the cryopump 10 is installed through the suction port 12. The first figure shows a cross section including the central axis A of the internal space 14 of the cryopump 10.

另外,以下為了便於理解以表示低溫泵10的構成要件的位置關係,有時使用“軸向”、“放射方向”等用語。軸向表示穿過吸氣口12之方向(第1圖中沿一點虛線A之方向),放射方向表示沿吸氣口12之方向(與一點虛線A垂直之方向)。為方便起見,有時將在軸向上相 對靠近吸氣口12一側稱作“上”,相對遠離一側稱作“下”。亦即,有時將相對遠離低溫泵10的底部一側稱作“上”,相對靠近一側稱作“下”。在放射方向上,有時將靠近吸氣口12之中心(第1圖中為中心軸A)一側稱作“內”,將靠近吸氣口12之周緣一側稱作“外”。放射方向亦可以稱為徑向。另外,該種表現與低溫泵10安裝於真空腔室時的配置無關。例如,低溫泵10也可以沿垂直方向使吸氣口12朝下來安裝於真空腔室。 In addition, in the following, in order to facilitate understanding, the positional relationship of the components of the cryopump 10 is indicated, and terms such as "axial direction" and "radiation direction" may be used. The axial direction indicates the direction passing through the intake port 12 (the direction along the dotted line A in Fig. 1), and the radial direction indicates the direction along the intake port 12 (the direction perpendicular to the dotted line A). For convenience, sometimes it will be in the axial direction The side close to the suction port 12 is referred to as "upper" and the side farther away from the side is referred to as "lower". That is, the side closer to the bottom of the cryopump 10 is sometimes referred to as "upper" and the side closer to the lower side is referred to as "lower". In the radial direction, the side near the center of the intake port 12 (the central axis A in Fig. 1) may be referred to as "inner", and the side close to the periphery of the intake port 12 may be referred to as "outer". The direction of radiation can also be referred to as radial. In addition, this kind of performance is independent of the configuration when the cryopump 10 is installed in the vacuum chamber. For example, the cryopump 10 can also mount the suction port 12 downward in the vertical direction in the vacuum chamber.

並且,有時將圍繞軸向之方向稱作“周方向”。周方向為沿吸氣口12之第2方向,且為與徑向正交之切線方向。 Further, the direction around the axial direction is sometimes referred to as "circumferential direction". The circumferential direction is along the second direction of the intake port 12 and is a tangential direction orthogonal to the radial direction.

低溫泵10具備冷凍機16。冷凍機16例如為吉福德-麥克馬洪式冷凍機(所謂之GM冷凍機)等的極低溫冷凍機。冷凍機16為具備第1冷卻台22及第2冷卻台24之二段式冷凍機。冷凍機16被構成為將第1冷卻台22冷卻成第1溫度位準,將第2冷卻台24冷卻成第2溫度位準。第2溫度位準的溫度低於第1溫度位準。例如,第1冷卻台22被冷卻成65K~120K左右,被冷卻成80K~100K為較佳,第2冷卻台24被冷卻成10K~20K左右。 The cryopump 10 is provided with a refrigerator 16 . The refrigerator 16 is, for example, a cryogenic refrigerator such as a Gifford-McMahon type refrigerator (so-called GM refrigerator). The refrigerator 16 is a two-stage refrigerator including a first cooling stage 22 and a second cooling stage 24. The refrigerator 16 is configured to cool the first cooling stage 22 to the first temperature level and to cool the second cooling stage 24 to the second temperature level. The temperature at the second temperature level is lower than the first temperature level. For example, the first cooling stage 22 is cooled to about 65K to 120K, and is preferably cooled to 80K to 100K, and the second cooling stage 24 is cooled to about 10K to 20K.

並且,冷凍機16具備第1壓缸23及第2壓缸25。第1壓缸23將冷凍機16的室溫部連接於第1冷卻台22。第2壓缸25為將第1冷卻台22連接於第2冷卻台24之連接部份。 Further, the refrigerator 16 includes a first cylinder 23 and a second cylinder 25. The first cylinder 23 connects the room temperature portion of the refrigerator 16 to the first cooling stage 22. The second cylinder 25 is a connecting portion that connects the first cooling stage 22 to the second cooling stage 24.

圖示之低溫泵10為所謂臥式低溫泵。臥式低溫泵一 般是指冷凍機16配設成與低溫泵10的內部空間14的中心軸A交叉(通常為正交)之低溫泵。 The cryopump 10 shown is a so-called horizontal cryopump. Horizontal cryopump Generally, the refrigerator 16 is disposed as a cryopump that intersects (usually orthogonal to) the central axis A of the internal space 14 of the cryopump 10.

低溫泵10具備第1低溫板18以及被冷卻成溫度低於第1低溫板18的第2低溫板20。詳細內容將後述,第1低溫板18具備放射遮罩30和板構件32,且包圍第2低溫板20。在板構件32與第2低溫板20之間形成冷凝層的主容納空間21。 The cryopump 10 includes a first cryopanel 18 and a second cryopanel 20 that is cooled to a temperature lower than the first cryopanel 18 . As will be described in detail later, the first cryopanel 18 includes the radiation mask 30 and the plate member 32 and surrounds the second cryopanel 20 . A main accommodating space 21 of a condensing layer is formed between the plate member 32 and the second cryopanel 20.

首先,對第2低溫板20進行說明。第2低溫板20設置於低溫泵10的內部空間14的中心部。第2低溫板20以包圍第2冷卻台24之方式安裝於第2冷卻台24。因此,第2低溫板20與第2冷卻台24熱連接,從而第2低溫板20被冷卻成第2溫度位準。 First, the second cryopanel 20 will be described. The second cryopanel 20 is provided at a central portion of the internal space 14 of the cryopump 10 . The second cryopanel 20 is attached to the second cooling stage 24 so as to surround the second cooling stage 24 . Therefore, the second cryopanel 20 is thermally connected to the second cooling stage 24, and the second cryopanel 20 is cooled to the second temperature level.

第2低溫板20具備頂板60。頂板60直接安裝於冷凍機16的第2冷卻台24的上表面上,第2冷卻台24位於低溫泵10的內部空間14的中心部。如此,冷凝層的主容納空間21佔內部空間14的上半部份。 The second cryopanel 20 includes a top plate 60. The top plate 60 is directly attached to the upper surface of the second cooling stage 24 of the refrigerator 16 , and the second cooling stage 24 is located at the center of the internal space 14 of the cryopump 10 . Thus, the main accommodating space 21 of the condensing layer occupies the upper half of the internal space 14.

頂板60係為了使氣體冷凝在其表面上而設置。頂板60為在第2低溫板20中最靠近板構件32之部份,具備與板構件32對向之頂板前表面61。頂板前表面61具備中心區域62以及包圍中心區域62之外側區域63。 The top plate 60 is provided to condense gas on its surface. The top plate 60 is a portion closest to the plate member 32 in the second cryopanel 20, and has a top plate front surface 61 opposed to the plate member 32. The top front surface 61 is provided with a central area 62 and an outer side area 63 surrounding the central area 62.

頂板60為與軸向垂直配置之大致平板的低溫板。頂板60在中心區域62固定於第2冷卻台24。中心區域62具有凹部,在該凹部中頂板60使用適當的固定構件64(例如螺栓)固定於第2冷卻台24(參閱第2圖及第3 圖)。在凹部的周圍形成有朝向上方之台階部65。台階部65的高度被設定成將固定構件64容納在凹部中。外側區域63從台階部65朝徑向向外延伸。外側區域63的徑向末端向下方彎曲,且形成有頂板60的外周端部66。如第2圖所示,頂板60為大致圓板狀的板。 The top plate 60 is a substantially flat plated cryopanel that is disposed perpendicular to the axial direction. The top plate 60 is fixed to the second cooling stage 24 in the center area 62. The central region 62 has a recess in which the top plate 60 is fixed to the second cooling stage 24 using a suitable fixing member 64 (for example, a bolt) (see FIGS. 2 and 3). Figure). A step portion 65 that faces upward is formed around the recess. The height of the step portion 65 is set to accommodate the fixing member 64 in the recess. The outer side region 63 extends radially outward from the step portion 65. The radial end of the outer side region 63 is bent downward, and the outer peripheral end portion 66 of the top plate 60 is formed. As shown in Fig. 2, the top plate 60 is a substantially disk-shaped plate.

另外,頂板60亦可以不具有容納固定構件64之中心區域62的凹部。此時,頂板前表面61可以為不具有台階部65之平坦面。並且,本實施形態中,頂板60不具備吸附劑,但亦可例如在其背面設置有吸附劑。 Additionally, the top plate 60 may not have a recess that receives the central region 62 of the stationary member 64. At this time, the top plate front surface 61 may be a flat surface having no step portion 65. Further, in the present embodiment, the top plate 60 does not have an adsorbent, but an adsorbent may be provided on the back surface, for example.

第2圖係模式表示本發明的第1實施形態之頂板60之俯視圖。第2低溫板20的形狀被調整為使側方間隙43的寬度W1與間隙部44的寬度W2一致。亦即,側方間隙43的寬度W1與間隙部44的寬度W2實質上相等。為此,頂板60具有使側方間隙43的寬度擴大之缺口部74。該缺口部74具有弓形的形狀。另外,關於下方的常規板67(參閱第1圖),同樣亦可以具有缺口部。 Fig. 2 is a plan view showing a top plate 60 according to the first embodiment of the present invention. The shape of the second cryopanel 20 is adjusted such that the width W1 of the side gap 43 coincides with the width W2 of the gap portion 44. That is, the width W1 of the side gap 43 is substantially equal to the width W2 of the gap portion 44. For this reason, the top plate 60 has a notch portion 74 that enlarges the width of the side gap 43. The notch portion 74 has an arcuate shape. Further, regarding the lower conventional plate 67 (see Fig. 1), it is also possible to have a notch portion.

並且,第2低溫板20包含1個或複數個常規板67。常規板67係為了使氣體冷凝或吸附在其表面上而設置。常規板67排列在頂板60的下方。常規板67的形狀與頂板60不同。常規板67例如分別具有圓錐梯形側面的形狀,所謂之傘狀的形狀。在各常規板67上設置有活性炭等的吸附劑68。吸附劑例如黏接在常規板67的背面。目的為將常規板67的前表面作為冷凝面、將背面作為吸附面發揮作用。 Further, the second cryopanel 20 includes one or a plurality of conventional plates 67. The conventional plate 67 is provided to condense or adsorb gas on its surface. The conventional plates 67 are arranged below the top plate 60. The shape of the conventional board 67 is different from that of the top board 60. The conventional plates 67 each have, for example, a shape of a conical trapezoidal side surface, a so-called umbrella shape. An adsorbent 68 such as activated carbon is provided on each of the conventional plates 67. The adsorbent is adhered, for example, to the back of the conventional plate 67. The purpose is to use the front surface of the conventional plate 67 as a condensation surface and the back surface as an adsorption surface.

第1低溫板18是為了保護第2低溫板20免受來自低溫泵10的外部或低溫泵容器38之輻射熱而設置之低溫板。第1低溫板18與第1冷卻台22熱連接。因此,第1低溫板18被冷卻成第1溫度位準。第1低溫板18在與第2低溫板20之間具有間隙,第1低溫板18不與第2低溫板20接觸。 The first cryopanel 18 is a cryopanel provided to protect the second cryopanel 20 from radiant heat from the outside of the cryopump 10 or the cryopump housing 38. The first cryopanel 18 is thermally connected to the first cooling stage 22 . Therefore, the first cryopanel 18 is cooled to the first temperature level. The first cryopanel 18 has a gap with the second cryopanel 20, and the first cryopanel 18 does not come into contact with the second cryopanel 20.

放射遮罩30係為了保護第2低溫板20免受來自低溫泵容器38之輻射熱而設置。放射遮罩30位於低溫泵容器38與第2低溫板20之間,且包圍第2低溫板20。放射遮罩30具備分隔作為主開口之遮罩開口26之遮罩前端28、與遮罩開口26對向之遮罩底部34、以及從遮罩前端28向遮罩底部34延伸之遮罩側部36。遮罩開口26位於吸氣口12。放射遮罩30具有封閉遮罩底部34之筒形(例如圓筒)的形狀,並形成為杯狀。 The radiation mask 30 is provided to protect the second cryopanel 20 from radiant heat from the cryopump housing 38. The radiation mask 30 is located between the cryopump housing 38 and the second cryopanel 20 and surrounds the second cryopanel 20 . The radiation mask 30 includes a mask front end 28 that partitions the mask opening 26 as a main opening, a mask bottom portion 34 that faces the mask opening 26, and a mask side portion that extends from the mask front end 28 toward the mask bottom portion 34. 36. The mask opening 26 is located at the suction port 12. The radiation mask 30 has a cylindrical shape (e.g., a cylinder) that closes the bottom portion 34 of the mask and is formed in a cup shape.

放射遮罩30具備冷凍機16的安裝座37。安裝座37從放射遮罩30的外側觀察時凹陷,在遮罩側部36形成有用於將冷凍機16安裝於放射遮罩30之平坦部份。安裝座37位於第2低溫板20的側方。如上所述,在冷凍機16的第2冷卻台24的上表面直接安裝頂板60,因此頂板60置於與第2冷卻台24相同的高度上,因此安裝座37位於頂板60的側方。 The radiation mask 30 is provided with a mount 37 of the refrigerator 16 . The mount 37 is recessed when viewed from the outside of the radiation mask 30, and a flat portion for attaching the refrigerator 16 to the radiation mask 30 is formed on the mask side portion 36. The mount 37 is located on the side of the second cryopanel 20. As described above, since the top plate 60 is directly attached to the upper surface of the second cooling stage 24 of the refrigerator 16, the top plate 60 is placed at the same height as the second cooling stage 24, and therefore the mounting seat 37 is located on the side of the top plate 60.

遮罩側部36形成整體封閉之環狀部份。遮罩側部36具備安裝座37和開環狀部份41(參閱第2圖)。開環狀部份41為沿周方向延伸之C字狀的遮罩部份,與安裝座 37周方向相鄰。開環狀部份41與安裝座37一同包圍第2低溫板20,且形成封閉之環狀部份。在第2低溫板20與安裝座37之間形成有側方間隙43,在第2低溫板20與開環狀部份41之間形成有C字狀的間隙部44。間隙部44與側方間隙43連續而形成封閉之環狀間隙。間隙部44在周方向具有一定的寬度。 The mask side portion 36 forms an integrally closed annular portion. The mask side portion 36 is provided with a mount 37 and an open loop portion 41 (see Fig. 2). The open annular portion 41 is a C-shaped mask portion extending in the circumferential direction, and the mount Adjacent to 37 weeks. The open annular portion 41 surrounds the second cryopanel 20 together with the mount 37 and forms a closed annular portion. A side gap 43 is formed between the second cryopanel 20 and the mount 37, and a C-shaped gap portion 44 is formed between the second cryopanel 20 and the open loop portion 41. The gap portion 44 and the side gap 43 are continuous to form a closed annular gap. The gap portion 44 has a certain width in the circumferential direction.

如第1圖所示,在安裝座37有冷凍機16的安裝孔42,冷凍機16的第2冷卻台24及第2壓缸25從該安裝孔42被插入到放射遮罩30中。冷凍機16的第1冷卻台22配置於放射遮罩30的外部。放射遮罩30經由傳熱構件45而連接於第1冷卻台22。傳熱構件45藉由其一端的凸緣而固定於安裝孔42的外周部,並藉由另一端的凸緣固定於第1冷卻台22。傳熱構件45例如為中空的短筒,沿著冷凍機16的中心軸在放射遮罩30與第1冷卻台22之間延伸。如此,放射遮罩30與第1冷卻台22熱連接。另外,放射遮罩30亦可以直接安裝於第1冷卻台22。 As shown in Fig. 1, the mounting hole 37 has a mounting hole 42 for the refrigerator 16, and the second cooling stage 24 and the second cylinder 25 of the refrigerator 16 are inserted into the radiation mask 30 from the mounting hole 42. The first cooling stage 22 of the refrigerator 16 is disposed outside the radiation mask 30. The radiation mask 30 is connected to the first cooling stage 22 via the heat transfer member 45. The heat transfer member 45 is fixed to the outer peripheral portion of the attachment hole 42 by a flange at one end thereof, and is fixed to the first cooling stage 22 by a flange at the other end. The heat transfer member 45 is, for example, a hollow short cylinder that extends between the radiation mask 30 and the first cooling stage 22 along the central axis of the refrigerator 16 . In this manner, the radiation mask 30 is thermally connected to the first cooling stage 22. Further, the radiation mask 30 may be directly attached to the first cooling stage 22.

第2壓缸25與安裝孔42之間,在靠近遮罩開口26一側形成有上方間隙46,在遠離遮罩開口26一側形成有下方間隙48。冷凍機16被插入到安裝孔42的中心,因此上方間隙46的寬度與下方間隙48的寬度相等。 An upper gap 46 is formed between the second cylinder 25 and the attachment hole 42 on the side close to the mask opening 26, and a lower gap 48 is formed on the side away from the mask opening 26. The freezer 16 is inserted into the center of the mounting hole 42, so that the width of the upper gap 46 is equal to the width of the lower gap 48.

在本實施形態中,放射遮罩30構成為如圖示之一體的筒狀。代替此,放射遮罩30亦可以構成為藉複數個零件而整體呈筒狀的形狀。該等複數個零件亦可以相互保持 間隙而配設。例如,放射遮罩30在軸向上可以分割成2個部份。此時,放射遮罩30的上部為兩端開放的筒,具備遮罩前端28和遮罩側部36的第1部份。放射遮罩30的下部為上端開放且下端封閉,具備遮罩側部36的第2部份和遮罩底部34。在遮罩側部36的第1部份與第2部份之間形成有沿周方向延伸之間隙。冷凍機16的安裝孔42其上半部份形成於遮罩側部36的第1部份,下半部份形成於遮罩側部36的第1部份。 In the present embodiment, the radiation mask 30 is configured in a cylindrical shape as shown in one figure. Instead of this, the radiation mask 30 may be configured to have a cylindrical shape as a whole by a plurality of parts. These multiple parts can also be kept with each other It is equipped with a gap. For example, the radiation mask 30 can be divided into two parts in the axial direction. At this time, the upper portion of the radiation mask 30 is a tube whose both ends are open, and includes a first portion of the mask front end 28 and the mask side portion 36. The lower portion of the radiation mask 30 is open at the upper end and closed at the lower end, and has a second portion of the mask side portion 36 and a mask bottom portion 34. A gap extending in the circumferential direction is formed between the first portion and the second portion of the mask side portion 36. The mounting hole 42 of the refrigerator 16 has an upper portion formed in the first portion of the mask side portion 36, and a lower portion formed in the first portion of the mask side portion 36.

在低溫泵10上設置有包圍冷凍機16的第2壓缸25之冷凍機罩70。冷凍機罩70形成為直徑稍微大於第2壓缸25的圓筒形狀,一端安裝於第2冷卻台24,穿過放射遮罩30的安裝孔42朝向第1冷卻台22延伸。在冷凍機罩70與放射遮罩30之間設置有間隙,冷凍機罩70與放射遮罩30並不接觸。冷凍機罩70與第2冷卻台24熱連接,從而被冷卻成與第2冷卻台24相同的溫度。因此,冷凍機罩70還可以視為第2低溫板20的一部份。 The cryopump 10 is provided with a refrigerator cover 70 that surrounds the second cylinder 25 of the refrigerator 16 . The refrigerator cover 70 is formed in a cylindrical shape having a diameter slightly larger than that of the second cylinder 25, and one end is attached to the second cooling stage 24, and extends through the mounting hole 42 of the radiation mask 30 toward the first cooling stage 22. A gap is provided between the refrigerator cover 70 and the radiation mask 30, and the refrigerator cover 70 is not in contact with the radiation mask 30. The refrigerator cover 70 is thermally connected to the second cooling stage 24, and is cooled to the same temperature as the second cooling stage 24. Therefore, the refrigerator cover 70 can also be regarded as a part of the second cryopanel 20.

板構件32是為了保護第2低溫板20免受來自低溫泵10的外部熱源之輻射熱而設置於吸氣口12(或遮罩開口26,以下相同)之入口低溫板。低溫泵10的外部熱源,例如為安裝低溫泵10之真空腔室內的熱源。不僅限制輻射熱的進入,而且還限制氣體分子的進入。板構件32佔據吸氣口12的開口面積的一部份,以便將通過吸氣口12之向內部空間14之氣體流入限制在所希望的量。板構件32覆蓋吸氣口12的一大半。並且,在板構件32的冷卻 溫度下冷凝之氣體(例如水分)捕捉到其表面。 The plate member 32 is an inlet cryopanel that is provided to the intake port 12 (or the cover opening 26, hereinafter the same) in order to protect the second cryopanel 20 from the radiant heat from the external heat source of the cryopump 10. The external heat source of the cryopump 10 is, for example, a heat source within the vacuum chamber in which the cryopump 10 is mounted. It not only limits the entry of radiant heat, but also limits the entry of gas molecules. The plate member 32 occupies a portion of the open area of the suction port 12 to limit the inflow of gas through the suction port 12 to the internal space 14 to a desired amount. The plate member 32 covers a large portion of the suction port 12. And, cooling of the plate member 32 The condensed gas (such as moisture) at the temperature captures its surface.

在遮罩前端28與板構件32之間沿軸向具有微小的間隙。為了覆蓋該間隙來限制氣體流動,板構件32具備裙部33。裙部33為圍繞板構件32之短筒。裙部33與板構件32一同形成以板構件32為底面之圓形托盤狀的一體構造。該圓形托盤構造被配置成覆蓋在放射遮罩30上。因此,裙部33從板構件32向軸向下方突出,且與遮罩前端28徑向相鄰地延伸。裙部33與遮罩前端28的徑向距離例如為放射遮罩30的尺寸公差左右。 There is a slight gap in the axial direction between the mask front end 28 and the plate member 32. In order to cover the gap to restrict gas flow, the plate member 32 is provided with a skirt portion 33. The skirt 33 is a short cylinder that surrounds the plate member 32. The skirt portion 33 is formed integrally with the plate member 32 in a circular tray shape having the plate member 32 as a bottom surface. The circular tray configuration is configured to cover the radiation mask 30. Therefore, the skirt portion 33 projects downward from the plate member 32 in the axial direction and extends radially adjacent to the mask front end 28. The radial distance of the skirt 33 from the front end 28 of the mask is, for example, about the dimensional tolerance of the radiation mask 30.

遮罩前端28與板構件32的間隙有可能因製造上的誤差而發生變動。該種誤差可以藉由精密構件的加工及組裝來降低,但考慮藉此產生之製造成本的上升則未必可行。誤差涉及到低溫泵10的個體差。假設沒有裙部33時,向放射遮罩30內側流入之氣體流入量依據間隙的大小發生變化。氣體的流入量與低溫泵10的排氣速度直接相關。無論間隙過大或過小,實際的排氣速度皆與設計上的性能偏離。裙部33覆蓋遮罩前端28與板構件32的間隙,藉此限制通過間隙之氣體流動,並降低個體差。其結果,還能夠減小低溫泵排氣速度相對於設計性能之個體差。 The gap between the mask front end 28 and the plate member 32 may vary due to manufacturing errors. Such errors can be reduced by the processing and assembly of precision components, but it is not necessarily feasible to consider the increase in manufacturing costs thereby. The error relates to the individual difference of the cryopump 10. When the skirt portion 33 is absent, the amount of gas flowing into the inside of the radiation mask 30 changes depending on the size of the gap. The inflow amount of the gas is directly related to the exhaust speed of the cryopump 10. Regardless of whether the gap is too large or too small, the actual exhaust velocity deviates from the design performance. The skirt 33 covers the gap between the front end 28 of the mask and the plate member 32, thereby restricting the flow of gas through the gap and reducing the individual difference. As a result, it is also possible to reduce the individual difference of the cryopump exhaust speed with respect to the design performance.

遮罩前端28及板構件32超出低溫泵容器38的吸氣口凸緣40配置於軸向上方。如此,放射遮罩30朝向安裝低溫泵10的真空腔室延伸。藉由使放射遮罩30向上方延伸,能夠使冷凝層的主容納空間21沿著軸向擴大。其中,該延伸部份的軸向長度被設定成不與真空腔室(或真 空腔室與低溫泵10之間的閘閥)發生干擾。 The mask front end 28 and the plate member 32 are disposed above the suction port flange 40 of the cryopump housing 38 in the axial direction. As such, the radiation shield 30 extends toward the vacuum chamber in which the cryopump 10 is mounted. By extending the radiation mask 30 upward, the main accommodating space 21 of the condensing layer can be enlarged in the axial direction. Wherein the axial length of the extended portion is set to not be with the vacuum chamber (or true The gate valve between the cavity and the cryopump 10 interferes.

低溫泵容器38為容納第1低溫板18、第2低溫板20及冷凍機16之低溫泵10的框體,且構成為保持內部空間14的真空氣密之真空容器。藉由低溫泵容器38的前端39分隔吸氣口12。低溫泵容器38具備從前端39朝徑向外側延伸之吸氣口凸緣40。吸氣口凸緣40遍及低溫泵容器38的整周而設置。使用吸氣口凸緣40將低溫泵10安裝於真空腔室。 The cryopump housing 38 is a housing that houses the first cryopanel 18, the second cryopanel 20, and the cryopump 10 of the refrigerator 16, and is configured as a vacuum-tight vacuum container that holds the internal space 14. The suction port 12 is separated by the front end 39 of the cryopump housing 38. The cryopump housing 38 has an intake port flange 40 that extends radially outward from the front end 39. The suction port flange 40 is provided over the entire circumference of the cryopump housing 38. The cryopump 10 is mounted to the vacuum chamber using the suction port flange 40.

第3圖係模式表示本發明的第1實施形態之板構件32之俯視圖。在第3圖中,用虛線表示置於板構件32下方之代表性的構成要件。 Fig. 3 is a plan view showing a plate member 32 according to the first embodiment of the present invention. In Fig. 3, representative constituent elements placed under the plate member 32 are indicated by broken lines.

板構件32具備橫剖遮罩開口26之一塊平板(例如圓板)。板構件32的尺寸(例如直徑)與遮罩開口26的尺寸一致。板構件32被劃分為板主體部50和板外緣部52。板外緣部52為用於將板主體部50安裝於放射遮罩30之邊緣部。 The plate member 32 is provided with a flat plate (for example, a circular plate) that crosses the mask opening 26. The size (e.g., diameter) of the plate member 32 conforms to the size of the shroud opening 26. The plate member 32 is divided into a plate main body portion 50 and a plate outer edge portion 52. The outer edge portion 52 is for attaching the plate main body portion 50 to the edge portion of the radiation mask 30.

板構件32安裝於遮罩前端28的板安裝部29。板安裝部29為從遮罩前端28朝徑向內側突出之凸部,在周方向上等間隔(例如每隔90°)形成。板構件32藉由適當的方法固定於板安裝部29。例如,板安裝部29及板外緣部52具有螺孔(未圖示),板外緣部52藉螺栓緊固於板安裝部29。 The plate member 32 is attached to the board mounting portion 29 of the mask front end 28. The plate attachment portion 29 is a convex portion that protrudes inward in the radial direction from the mask distal end 28, and is formed at equal intervals in the circumferential direction (for example, every 90 degrees). The plate member 32 is fixed to the board mounting portion 29 by an appropriate method. For example, the board mounting portion 29 and the board outer edge portion 52 have screw holes (not shown), and the board outer edge portion 52 is fastened to the board mounting portion 29 by bolts.

在板構件32上形成有容許氣體流動之複數個小孔54。小孔54為形成於板主體部50及板外緣部52之貫穿 孔。因此,能夠使應冷凝在第2低溫板20(主要是頂板60)上之氣體通過小孔54接收在板構件32與第2低溫板20之間的主容納空間21中。另外,在板外緣部52中的板安裝部29附近未形成小孔54。 A plurality of small holes 54 that allow gas to flow are formed on the plate member 32. The small hole 54 is formed through the plate main body portion 50 and the outer edge portion 52 of the plate. hole. Therefore, the gas to be condensed on the second cryopanel 20 (mainly the top plate 60) can be received in the main accommodating space 21 between the plate member 32 and the second cryopanel 20 through the small holes 54. Further, a small hole 54 is not formed in the vicinity of the board mounting portion 29 in the outer edge portion 52 of the board.

小孔54規則地排列。在本實施形態中,小孔54分別在正交之兩個直線方向上等間隔設置來形成小孔54的格子。作為代替方案,小孔54亦可以分別在徑向及周方向上等間隔設置。 The apertures 54 are regularly arranged. In the present embodiment, the small holes 54 are formed at equal intervals in the two orthogonal directions to form the lattice of the small holes 54. Alternatively, the small holes 54 may be equally spaced in the radial direction and the circumferential direction, respectively.

小孔54的形狀例如為圓形,但不限於此,小孔54亦可以為具有矩形等其他形狀的開口、以直線狀或曲線狀延伸之狹縫或者形成於板構件32的外周之缺口。小孔54的大小明顯小於遮罩開口26。 The shape of the small hole 54 is, for example, a circular shape, but is not limited thereto, and the small hole 54 may be an opening having a rectangular shape or the like, a slit extending in a straight line or a curved shape, or a notch formed on the outer circumference of the plate member 32. The aperture 54 is significantly smaller in size than the mask opening 26.

板主體部50具備:具有複數個小孔54之氣體通過區域56、以及在板主體部50形成在與氣體通過區域56不同的位置之氣體隔離區域58。因此,板主體部50被劃分為氣體通過區域56和氣體隔離區域58。氣體通過區域56與氣體隔離區域58彼此相鄰。因此,板構件32在其表面的一部份具有複數個小孔54,藉此形成氣體通過區域56。並且,在板構件32局部形成有氣體隔離區域58。 The plate main body portion 50 includes a gas passage region 56 having a plurality of small holes 54 and a gas isolation region 58 formed at a position different from the gas passage region 56 in the plate main body portion 50. Therefore, the board main body portion 50 is divided into a gas passage region 56 and a gas separation region 58. The gas passage region 56 and the gas isolation region 58 are adjacent to each other. Thus, the plate member 32 has a plurality of apertures 54 in a portion of its surface thereby forming a gas passage region 56. Further, a gas isolation region 58 is partially formed in the plate member 32.

在第3圖中,用一點虛線表示氣體通過區域56與氣體隔離區域58的邊界。在本實施形態中,氣體通過區域56與氣體隔離區域58的邊界置於頂板60的外側區域63與中心區域62的邊界(亦即台階部65)的內側。如此一來,氣體通過區域56與頂板60的外側區域63對向,氣 體隔離區域58與頂板60的中心區域62對向。 In Fig. 3, the boundary between the gas passage region 56 and the gas isolation region 58 is indicated by a dashed line. In the present embodiment, the boundary between the gas passage region 56 and the gas separation region 58 is placed inside the boundary between the outer region 63 of the top plate 60 and the central region 62 (i.e., the step portion 65). As a result, the gas passage region 56 faces the outer region 63 of the top plate 60, and the gas The body isolation region 58 is opposite the central region 62 of the top plate 60.

如後述,氣體通過區域56與氣體隔離區域58的邊界係為了控制在頂板前表面61成長之冷凝層72(參閱第4圖)的形狀而設定。因此,為了使冷凝層72成長為所希望的形狀,氣體通過區域56與氣體隔離區域58的邊界可以與圖示不同。該邊界可以和頂板60的外側區域63與中心區域62的邊界一致,亦可以置於其外側或者相交叉。並且,氣體通過區域56與氣體隔離區域58的邊界的形狀不限於圓形,可以為其他任意形狀。 As will be described later, the boundary between the gas passage region 56 and the gas separation region 58 is set to control the shape of the condensation layer 72 (see FIG. 4) which is grown on the top surface 61 of the top plate. Therefore, in order to grow the condensation layer 72 to a desired shape, the boundary of the gas passage region 56 and the gas isolation region 58 may be different from the illustration. The boundary may coincide with the boundary between the outer region 63 of the top plate 60 and the central region 62, or may be placed on the outside or intersected. Further, the shape of the boundary between the gas passage region 56 and the gas separation region 58 is not limited to a circular shape, and may be any other shape.

氣體隔離區域58是藉由從小孔54的有規則排列中去掉至少1個小孔來形成。如第3圖所示,氣體隔離區域58為包含假設順著氣體通過區域56中之小孔54的有規則排列所形成之4個小孔(在板主體部50的中心部用雙重虛線表示)之區域。由於在氣體隔離區域58未設置小孔,因此氣體隔離區域58不使氣體通過。 The gas isolation region 58 is formed by removing at least one small hole from the regular arrangement of the small holes 54. As shown in Fig. 3, the gas isolation region 58 is four small holes including a predetermined arrangement which is assumed to follow the small holes 54 in the gas passage region 56 (indicated by double dashed lines at the center of the plate main body portion 50) The area. Since no pores are provided in the gas isolation region 58, the gas isolation region 58 does not allow gas to pass.

在氣體隔離區域58可以設置至少1個小孔。例如,在圖中用虛線表示之假想小孔的所有的位置不形成小孔(亦即,與氣體通過區域56中之有規則排列相比,減少小孔54的數量),藉此形成氣體隔離區域58。或者,可以在假想小孔的位置形成小於氣體通過區域56的小孔54的孔。該種微小開口可以設置與假想小孔的位置相同數量或少於其的數量。即便如此,與氣體通過區域56相比,亦能夠限制氣體隔離區域58中之氣體流動。 At least one small hole may be provided in the gas isolation region 58. For example, all positions of the imaginary apertures indicated by dashed lines in the figure do not form apertures (i.e., the number of apertures 54 is reduced as compared to the regular arrangement in the gas passage region 56), thereby forming a gas barrier. Area 58. Alternatively, a hole smaller than the small hole 54 of the gas passage region 56 may be formed at the position of the imaginary orifice. The minute opening can be set to be the same number or less than the position of the imaginary aperture. Even so, the gas flow in the gas isolation region 58 can be limited as compared to the gas passage region 56.

因此,可以在氣體通過區域56中以第1分佈形成小 孔,在氣體隔離區域58中不形成小孔或者以和第1分佈不同的第2分佈形成小孔。第2分佈例如設定成氣體隔離區域58中之每單位面積的開口面積小於氣體通過區域56中之每單位面積的開口面積。在此,開口面積是指小孔的總計面積。並且,第1分佈可以不具有規則性。因此,氣體通過區域56的小孔54可以不規則地排列。 Therefore, it is possible to form a small distribution in the gas passage region 56 with the first distribution. The holes do not form small holes in the gas isolation region 58 or form small holes in the second distribution different from the first distribution. The second distribution is set, for example, such that the opening area per unit area in the gas isolation region 58 is smaller than the opening area per unit area in the gas passage region 56. Here, the opening area refers to the total area of the small holes. Also, the first distribution may not have regularity. Therefore, the small holes 54 of the gas passage region 56 may be irregularly arranged.

另外,板構件32所具有之開口的總計面積例如按照排氣速度等的要求性能在設計上決定。因此,每當為了設定氣體隔離區域58而去掉或縮小小孔時,以彌補因此產生之開口面積的減少為佳。為此,可以在氣體通過區域56追加新的小孔54,亦可以放大現有的小孔54。還可以改變現有的小孔54的位置。 Further, the total area of the openings of the plate member 32 is determined in design, for example, in accordance with the required performance such as the exhaust speed. Therefore, whenever the small holes are removed or reduced in order to set the gas isolation region 58, it is preferable to compensate for the reduction in the area of the opening thus produced. For this purpose, a new small hole 54 may be added to the gas passage region 56, or the existing small hole 54 may be enlarged. It is also possible to change the position of the existing aperture 54.

以下說明由上述構成的低溫泵10進行的動作。在低溫泵10動作時,首先,在其動作前用其他適當的粗抽泵將真空腔室內部粗抽至例如1Pa左右。之後,使低溫泵10動作。第1冷卻台22及第2冷卻台24藉冷凍機16的驅動而被冷卻,與該等熱連接之第1低溫板18、第2低溫板20亦被冷卻。第1低溫板18及第2低溫板20分別被冷卻成第1溫度及低於其的第2溫度。 The operation performed by the cryopump 10 having the above configuration will be described below. When the cryopump 10 is operated, first, the inside of the vacuum chamber is roughly drawn to, for example, about 1 Pa by another appropriate rough pump before the operation. Thereafter, the cryopump 10 is operated. The first cooling stage 22 and the second cooling stage 24 are cooled by the driving of the refrigerator 16, and the first low temperature plate 18 and the second low temperature plate 20 that are thermally connected are also cooled. Each of the first cryopanel 18 and the second cryopanel 20 is cooled to a first temperature and a second temperature lower than the first temperature.

板構件32冷卻從真空腔室朝低溫泵10內部飛來之氣體分子,使在該冷卻溫度下蒸氣圧充份降低之氣體(例如水分等)冷凝在表面而排氣。在板構件32的冷卻溫度下蒸氣圧未被充份降低之氣體通過複數個小孔54進入主容納空間21。或者,一部份氣體被板構件32的氣體隔離區 域58反射而未進入主容納空間21。 The plate member 32 cools the gas molecules that have flown from the vacuum chamber toward the inside of the cryopump 10, and condenses a gas (for example, moisture or the like) whose vapor enthalpy is sufficiently reduced at the cooling temperature to condense on the surface to be exhausted. The gas whose vapor enthalpy is not sufficiently reduced at the cooling temperature of the plate member 32 enters the main accommodating space 21 through the plurality of small holes 54. Alternatively, a portion of the gas is trapped by the gas barrier of the plate member 32. The field 58 reflects but does not enter the main accommodation space 21.

進入之氣體分子中在第2低溫板20的冷卻溫度下蒸氣圧充份降低之氣體(例如氬等)冷凝在第2低溫板20的表面(主要是頂板前表面61)而排氣。即使在該冷卻溫度下蒸氣圧仍未充份降低之氣體(例如氫等)藉黏接於第2低溫板20的表面且已被冷卻之吸附劑68吸附而排氣。如此一來,低溫泵10能夠使真空腔室的真空度達到所希望的位準。 A gas (for example, argon or the like) whose vapor enthalpy is sufficiently reduced at the cooling temperature of the second cryopanel 20 in the gas molecules that have entered is condensed on the surface of the second cryopanel 20 (mainly the top surface 61 of the top plate) to be exhausted. Even if the vapor enthalpy is not sufficiently reduced at the cooling temperature (for example, hydrogen or the like), it is adhered to the surface of the second cryopanel 20 and adsorbed by the cooled adsorbent 68 to be exhausted. In this way, the cryopump 10 is capable of bringing the vacuum of the vacuum chamber to a desired level.

第4圖係模式表示排氣運轉中的低溫泵10之圖。如第4圖所示,在低溫泵10的頂板60上堆積由冷凝之氣體形成之冰或霜。該冷凝層72的主成份例如為氬。該冰層隨著排氣運轉時間而成長,從而厚度逐漸增加。另外,在第4圖中,為了簡單明瞭,省略圖示堆積在常規板67及冷凍機罩70之冷凝層。 Fig. 4 is a view showing the cryopump 10 during the exhaust operation. As shown in Fig. 4, ice or frost formed by the condensed gas is deposited on the top plate 60 of the cryopump 10. The main component of the condensation layer 72 is, for example, argon. The ice layer grows with the exhaust gas running time, so that the thickness gradually increases. In addition, in FIG. 4, for the sake of simplicity, the condensation layer deposited on the conventional plate 67 and the refrigerating machine cover 70 is omitted.

當板構件32不具有氣體隔離區域58時(亦即,板構件32具有第3圖所示之雙重虛線的小孔時),如第4圖中的虛線所示,圓頂型或蘑菇型的冷凝層在頂板60上成長。當使複數個小孔54均勻分佈在板構件32上時,氣體容易流入到主容納空間21的中心部。因此,如圖示,容易引起冷凝集中在中心部。並且,為了板構件32的安裝而減少板外緣部52的小孔54的數量,這亦有可能是冷凝集中在中心部的原因之一。 When the plate member 32 does not have the gas isolation region 58 (that is, when the plate member 32 has the double-dotted hole shown in FIG. 3), as shown by the broken line in FIG. 4, the dome type or the mushroom type The condensation layer grows on the top plate 60. When a plurality of small holes 54 are evenly distributed on the plate member 32, the gas easily flows into the central portion of the main accommodation space 21. Therefore, as shown in the figure, it is easy to cause condensation to concentrate on the center portion. Further, in order to reduce the number of the small holes 54 of the outer edge portion 52 of the plate for the mounting of the plate member 32, it is also possible that condensation is concentrated at the center portion.

若圓頂型的冷凝層沿徑向進一步成長,則冷凝層的外周部有可能與遮罩側部36接觸。假如安裝座37與頂板 60之間的間隙狹小,則冷凝層首先與安裝座37接觸。在接觸部位上氣體再次被氣化而釋放到主容納空間21及低溫泵10的外部。因此,以後,低溫泵10無法提供設計上的排氣性能。因此,此時的氣體的存儲量賦予低溫泵10的最大存儲量。冷凝層的局部(此時,安裝座37附近的冷凝層)決定低溫泵10的氣體存儲極限。 If the dome-shaped condensation layer is further grown in the radial direction, the outer peripheral portion of the condensation layer may come into contact with the mask side portion 36. If the mount 37 and the top plate The gap between 60 is narrow and the condensation layer first comes into contact with the mount 37. At the contact portion, the gas is again vaporized and released to the outside of the main accommodating space 21 and the cryopump 10. Therefore, in the future, the cryopump 10 cannot provide design exhaust performance. Therefore, the amount of gas stored at this time is given to the maximum storage amount of the cryopump 10. Part of the condensation layer (at this time, the condensation layer near the mount 37) determines the gas storage limit of the cryopump 10.

低溫泵一般被設計成軸對稱。但是,臥式低溫泵10為橫向配置冷凍機16,因此必然具有非對稱部份(例如安裝座37)。在本實施形態中,使頂板60的形狀與此非對稱部份配合在周方向來對齊頂板60與放射遮罩30的間隙的寬度。能夠避免在頂板60上徑向成長之冷凝層只有特定部位(此時為安裝座37附近的冷凝層)先與放射遮罩30接觸。其結果,依本實施形態,能夠提高低溫泵10的氣體存儲量。 Cryopumps are generally designed to be axisymmetric. However, the horizontal cryopump 10 is a horizontally disposed freezer 16 and therefore necessarily has an asymmetrical portion (e.g., mount 37). In the present embodiment, the shape of the top plate 60 and the asymmetrical portion are fitted in the circumferential direction to align the width of the gap between the top plate 60 and the radiation mask 30. It is possible to prevent the condensation layer which is radially grown on the top plate 60 from contacting only the specific portion (in this case, the condensation layer in the vicinity of the mount 37) with the radiation mask 30. As a result, according to this embodiment, the amount of gas stored in the cryopump 10 can be increased.

並且,若圓頂型的冷凝層沿軸向進一步成長,則中心軸A附近的冷凝層頂上部有可能與板構件32的下表面接觸。此時的氣體的存儲量賦予低溫泵10的最大存儲量。冷凝層的局部(此時,中心軸A附近的冷凝層頂上部)決定低溫泵10的氣體存儲極限。 Further, if the dome-shaped condensing layer is further grown in the axial direction, the top portion of the condensing layer near the center axis A may come into contact with the lower surface of the plate member 32. The amount of gas stored at this time is given to the maximum storage amount of the cryopump 10. The portion of the condensing layer (at this time, the top of the condensing layer near the central axis A) determines the gas storage limit of the cryopump 10.

當板構件32具有氣體隔離區域58時(亦即,板構件32不具有第2圖所示之雙重虛線的小孔時),如第4圖的實線所示,圓柱型的冷凝層72在頂板60上成長。藉氣體隔離區域58限制氣體流入到主容納空間21的中心部,因此可以緩和冷凝集中在中心部。其結果,如圖中箭頭D 所示,圓柱型的冷凝層72為中心軸A附近的冷凝層的高度變得小於圓頂型的冷凝層。另一方面,如圖中箭頭E所示,外周部的冷凝層高度變得大於圓頂型的冷凝層。 When the plate member 32 has the gas isolation region 58 (that is, when the plate member 32 does not have the double-dotted hole shown in FIG. 2), as shown by the solid line in FIG. 4, the cylindrical condensation layer 72 is The top plate 60 grows. The gas isolation region 58 restricts the flow of gas into the central portion of the main accommodating space 21, so that the condensation can be concentrated at the center portion. The result, as shown by the arrow D in the figure As shown, the cylindrical condensation layer 72 has a height at which the condensation layer near the central axis A becomes smaller than the dome-shaped condensation layer. On the other hand, as indicated by an arrow E in the figure, the height of the condensation layer in the outer peripheral portion becomes larger than that in the dome-shaped condensation layer.

如此一來,依本實施形態,能夠使在頂板前表面61成長之冷凝層上表面的高度分佈均勻。藉由使冷凝層72的形狀與主容納空間21一致來提高主容納空間21中之冷凝層72的容納効率。如此,能夠提高低溫泵10的氣體存儲量。 As described above, according to the present embodiment, the height distribution of the upper surface of the condensation layer which is grown on the top surface 61 of the top plate can be made uniform. The accommodation efficiency of the condensation layer 72 in the main accommodation space 21 is improved by making the shape of the condensation layer 72 coincide with the main accommodation space 21. In this way, the amount of gas stored in the cryopump 10 can be increased.

第5圖係模式表示本發明的第2實施形態之低溫泵10的主要部份之側剖面圖。第2實施形態之低溫泵10是關於第2低溫板20具有和第1實施形態不同的配置。關於其他部份,第2實施形態與第1實施形態相同。以下說明中,對於相同的部位為了避免冗長而適當省略說明。 Fig. 5 is a side cross-sectional view showing the main part of the cryopump 10 according to the second embodiment of the present invention. The cryopump 10 of the second embodiment has an arrangement different from that of the first embodiment in the second cryopanel 20 . Regarding the other parts, the second embodiment is the same as the first embodiment. In the following description, the same portions are appropriately omitted in order to avoid redundancy.

如第5圖所示,第2低溫板20的配置被調整為使側方間隙43的寬度與間隙部44的寬度一致。如圖中箭頭F所示,第2低溫板20配置成從中心軸A偏離第2低溫板20的中心,以使第2低溫板20與安裝座37分開。第2低溫板20以遠離冷凍機16的高溫側之方式從中心線A偏心。如此,使側方間隙43擴大,且隔著中心軸A在相反側使間隙部44縮窄。在第2實施形態中,頂板60不具有缺口部74。即便如此,與第1實施形態同樣地,亦能夠使包圍在頂板60成長之冷凝層側面之間隙的寬度均勻。另外,在一實施形態中,頂板60亦可以具有缺口部74,並且第2低溫板20為偏心配置。 As shown in FIG. 5, the arrangement of the second cryopanel 20 is adjusted such that the width of the side gap 43 coincides with the width of the gap portion 44. As indicated by an arrow F in the figure, the second cryopanel 20 is disposed to be displaced from the central axis A by the center of the second cryopanel 20 so that the second cryopanel 20 is separated from the mount 37. The second cryopanel 20 is eccentric from the center line A so as to be away from the high temperature side of the refrigerator 16. In this manner, the side gap 43 is enlarged, and the gap portion 44 is narrowed on the opposite side via the central axis A. In the second embodiment, the top plate 60 does not have the notch portion 74. Even in the same manner as in the first embodiment, the width of the gap surrounding the side surface of the condensation layer in which the top plate 60 grows can be made uniform. Further, in an embodiment, the top plate 60 may have a notch portion 74, and the second cryopanel 20 may be eccentrically disposed.

第6圖係模式表示本發明的第3實施形態之低溫泵10的主要部份之側剖面圖。第3實施形態之低溫泵10是關於冷凍機16具有和已敘述之實施形態不同的配置。關於其他部份,第3實施形態和已敘述之實施形態相同。以下說明中,對於相同的部位為了避免冗長而適當省略說明。 Fig. 6 is a side cross-sectional view showing the main part of the cryopump 10 according to the third embodiment of the present invention. The cryopump 10 of the third embodiment has an arrangement in which the refrigerator 16 has a different embodiment from the above-described embodiment. Regarding the other parts, the third embodiment is the same as the embodiment described above. In the following description, the same portions are appropriately omitted in order to avoid redundancy.

如第6圖所示,冷凍機16配置使上方間隙46的寬度G1比下方間隙48的寬度G2寬。藉此,能夠擴大冷凍機罩70與放射遮罩30之間的空間。藉由擴大靠近主容納空間21之上方間隙46,能夠容納更多的冷凝層。並且,第2低溫板20整體被向下方移動,因此和已敘述之實施形態相比,還能夠在軸向上擴大主容納空間21。如此,能夠提高低溫泵10的氣體存儲量。 As shown in Fig. 6, the refrigerator 16 is disposed such that the width G1 of the upper gap 46 is wider than the width G2 of the lower gap 48. Thereby, the space between the refrigerator cover 70 and the radiation mask 30 can be enlarged. By enlarging the upper gap 46 close to the main accommodation space 21, more condensation layers can be accommodated. Further, since the entire second cryopanel 20 is moved downward, the main accommodating space 21 can be enlarged in the axial direction as compared with the above-described embodiment. In this way, the amount of gas stored in the cryopump 10 can be increased.

如以上說明,依本發明的實施形態,頂板60的形狀或配置被設定成使放射遮罩30與頂板60之間的間隙實質上均勻。藉此,能夠抑制堆積在頂板60之冷凝層上冷凝集中於特定部位。藉此,能夠改善主容納空間21中之冷凝層的容納效率,且能夠提高低溫泵10的氣體存儲量。 As described above, according to the embodiment of the present invention, the shape or arrangement of the top plate 60 is set such that the gap between the radiation mask 30 and the top plate 60 is substantially uniform. Thereby, it is possible to suppress condensation on the condensation layer deposited on the top plate 60 to concentrate on a specific portion. Thereby, the accommodation efficiency of the condensation layer in the main accommodation space 21 can be improved, and the gas storage amount of the cryopump 10 can be improved.

以上,依據實施例對本發明進行了說明。但本發明不限於上述實施形態,本領域技術人員可以理解能夠實施各種設計變更,且能夠實施各種變形例,並且該種變形例亦包含在本發明的範圍內。 Hereinabove, the present invention has been described based on the embodiments. However, the present invention is not limited to the above-described embodiments, and those skilled in the art can understand that various design changes can be made and various modifications can be made, and such modifications are also included in the scope of the present invention.

例如,還能夠將關於第1實施形態至第3實施形態中任一實施形態說明之構成和關於第1實施形態至第3實施 形態中之另一實施形態說明之構成組合來構成低溫泵10。 For example, the configuration described in any one of the first embodiment to the third embodiment and the first to third embodiments can be performed. The cryopump 10 is configured by a combination of the configurations described in the other embodiments.

並且,低溫泵10可以具備配設於遮罩開口26之入口低溫板來代替板構件32。入口低溫板例如可以具備1塊或複數塊平板(例如圓板)型的板,亦可以具備形成為同心圓狀或格子狀的百葉窗或鋸齒形狀。可以藉由調整百葉窗或鋸齒形狀的百葉窗板的形狀、配置或間隔,來將氣體通過區域56及氣體隔離區域58形成於遮罩開口26。 Further, the cryopump 10 may include an inlet cryopanel disposed in the mask opening 26 instead of the plate member 32. The inlet cryopanel may have, for example, one or a plurality of flat plates (for example, a circular plate) type plate, or may have a louver or a zigzag shape formed in a concentric or lattice shape. The gas passage region 56 and the gas isolation region 58 may be formed in the mask opening 26 by adjusting the shape, arrangement or spacing of the louver or sawtooth shaped louver.

在上述的實施形態中,板構件32被劃分為兩種區域,亦即氣體通過區域56及氣體隔離區域58。但板構件32可以具有三種以上的區域。在板構件32上,作為第3區域,可以形成比氣體通過區域56更容易使氣體通過之區域,亦可以形成比氣體隔離區域58更不易使氣體通過之區域。 In the above embodiment, the plate member 32 is divided into two regions, that is, a gas passage region 56 and a gas isolation region 58. However, the plate member 32 may have three or more regions. In the plate member 32, as the third region, a region through which the gas can pass more easily than the gas passage region 56 can be formed, and a region in which the gas is less likely to pass through the gas isolation region 58 can be formed.

本發明的實施形態還能夠如下表現。 Embodiments of the present invention can also be expressed as follows.

1.一種低溫泵,其特徵為,具備:冷凍機,具備第1冷卻台及被冷卻成溫度低於前述第1冷卻台的第2冷卻台;第1低溫板,具備有主開口之放射遮罩及橫剖前述主開口之板構件,且與前述第1冷卻台熱連接;及第2低溫板,被前述第1低溫板包圍,且與前述第2冷卻台熱連接,前述板構件具備板主體部及用於將前述板主體部安裝於前述放射遮罩之外緣部, 前述板主體部具備:氣體通過區域,具有用於使冷凝在前述第2低溫板之氣體通過之複數個小孔;及氣體隔離區域,在前述板主體部中形成在與前述氣體通過區域不同的位置。 A cryopump comprising: a first cooling stage; and a second cooling stage cooled to a temperature lower than the first cooling stage; and the first cryopanel having a radiation shielding of the main opening a cover member and a plate member transversely intersecting the main opening, and being thermally connected to the first cooling stage; and a second low temperature plate surrounded by the first low temperature plate and thermally connected to the second cooling stage, wherein the plate member is provided with a plate a main body portion for mounting the plate main body portion on an outer edge portion of the radiation mask, The plate main body portion includes a gas passage region having a plurality of small holes through which the gas condensed in the second low temperature plate passes, and a gas isolation region formed in the plate main body portion different from the gas passage region position.

2.如實施形態1記載之低溫泵,其中,前述第2低溫板具備與前述板主體部對向之前表面,前述前表面具備中心區域和包圍前述中心區域之外側區域,前述氣體通過區域與前述外側區域對向,前述氣體隔離區域與前述中心區域對向。 2. The cryopump according to the first aspect, wherein the second cryopanel has a front surface facing the plate main body portion, the front surface includes a central region, and an outer region surrounding the central region, the gas passage region and the The outer regions are opposed to each other, and the gas isolation regions are opposed to the central regions.

3.如實施形態1或2記載之低溫泵,其中,前述放射遮罩具備包圍前述第2低溫板之側部,在前述側部與前述第2低溫板之間形成具有狹窄部之間隙,前述氣體隔離區域形成在與前述狹窄部對應之位置。 3. The cryopump according to the first or second aspect, wherein the radiation mask includes a side portion surrounding the second cryopanel, and a gap having a narrow portion is formed between the side portion and the second cryopanel, The gas isolation region is formed at a position corresponding to the narrow portion.

4.如實施形態1至3中任一實施形態記載之低溫泵,其中,前述放射遮罩具備:安裝座,位於前述第2低溫板的側方,且用於將前述冷凍機安裝於前述放射遮罩;及環狀部份,與前述安裝座相鄰且包圍前述第2低溫板,在前述第2低溫板與前述安裝座之間形成有側方間隙,在前述第2低溫板與前述環狀部份之間形成有和前述側方間隙連續之環狀間隙,前述第2低溫板的形狀或配置被調整為使前述側方間隙的寬度與前述環狀間隙的寬度一致。 4. The cryopump according to any one of the first to third aspect, wherein the radiation mask includes a mounting seat located on a side of the second cryopanel and configured to mount the refrigerator to the radiation a mask; and an annular portion adjacent to the mounting seat and surrounding the second cryopanel, wherein a side gap is formed between the second cryopanel and the mount, and the second cryopanel and the ring are formed An annular gap continuous with the side gap is formed between the portions, and the shape or arrangement of the second cryopanel is adjusted such that the width of the side gap matches the width of the annular gap.

5.如實施形態4記載之低溫泵,其中,前述第2低溫板具有使前述側方間隙寬度擴大之缺口部。 5. The cryopump according to the fourth aspect, wherein the second cryopanel has a notch portion that expands a width of the side gap.

6.如實施形態4或5記載之低溫泵,其中,前述第2低溫板被配置成從穿過前述主開口之軸線偏離前述第2低溫板的中心,以使前述第2低溫板與前述安裝座分開。 6. The cryopump according to the fourth or fifth aspect, wherein the second cryopanel is disposed to be offset from a center of the second cryopanel from an axis passing through the main opening, so that the second cryopanel and the mounting are performed Separate.

7.如實施形態1至6中任一實施形態記載之低溫泵,其中,在前述放射遮罩形成有用於前述冷凍機之安裝孔,前述冷凍機具備連接前述第1冷卻台和前述第2冷卻台之連接部份,前述連接部份被插入到前述安裝孔中,前述連接部份與前述安裝孔之間,在靠近前述主開口一側形成有上方間隙,在遠離前述主開口一側形成有下方間隙,前述上方間隙的寬度比前述下方間隙的寬度寬。 The cryopump according to any one of the first to sixth aspect, wherein the radiation mask is provided with a mounting hole for the refrigerator, and the refrigerator includes a first cooling stage and the second cooling. a connecting portion of the table, the connecting portion is inserted into the mounting hole, and an upper gap is formed between the connecting portion and the mounting hole on a side close to the main opening, and a side away from the main opening is formed In the lower gap, the width of the aforementioned upper gap is wider than the width of the lower gap.

8.一種真空排氣方法,使用低溫泵,前述方法具備以下步驟:將板構件及第2低溫板分別冷卻成第1溫度及低於其的第2溫度;通過形成於前述板構件的表面的一部份之複數個小孔,將氣體接收在前述板構件與前述第2低溫板之間;及使前述氣體冷凝在前述第2低溫板上,前述低溫泵具備橫剖主開口之前述板構件和與前述板構件對向之前述第2低溫板。 A vacuum evacuation method using a cryopump, the method comprising the steps of: cooling a plate member and a second cryopanel to a first temperature and a second temperature lower than the second temperature; and forming the surface of the plate member a plurality of small holes for receiving gas between the plate member and the second cryopanel; and condensing the gas on the second cryopanel, the cryopump having the plate member having a main opening transversely And the second low temperature plate facing the plate member.

9.一種低溫泵,具備:第1低溫板,具備有主開口之放射遮罩及橫剖前述主開口之板構件;及第2低溫板,具備與前述板構件對向之前表面,且被冷卻成溫度低於前述第1低溫板,前述前表面具備中心區域及包圍前述中心區域之外側區域,前述板構件具備:氣體通過區域,具有用於使冷凝在前述第2低溫板之氣體通過之複數個小孔,且與前述外側區域對向;及氣體隔離區域,與前述中心區域對向。 A cryopump comprising: a first cryopanel having a radiation mask having a main opening; and a plate member transversely intersecting the main opening; and a second cryopanel having a front surface facing the plate member and being cooled The forming temperature is lower than the first low temperature plate, and the front surface includes a central region and an outer region surrounding the central region, and the plate member includes a gas passage region and has a plurality of gases for condensing the gas in the second cryopanel a small hole and facing the outer region; and a gas isolation region facing the central region.

10.一種低溫泵,具備:第1低溫板,具備有主開口之放射遮罩及配設於前述主開口之入口低溫板;及第2低溫板,被前述第1低溫板包圍,且被冷卻成溫度低於前述第1低溫板,前述放射遮罩具備包圍前述第2低溫板之側部,在前述側部與前述第2低溫板之間形成具有狹窄部之間隙,前述入口低溫板在與前述狹窄部對應之位置具備氣體隔離區域。 A cryopump comprising: a first cryopanel having a radiation mask having a main opening; and an inlet cryopanel disposed in the main opening; and a second cryopanel surrounded by the first cryopanel and cooled The temperature is lower than the first low temperature plate, and the radiation mask includes a side portion surrounding the second low temperature plate, and a gap having a narrow portion is formed between the side portion and the second low temperature plate, and the inlet cryopanel is The position corresponding to the narrow portion has a gas isolation region.

11.一種低溫泵,具備:冷凍機,具備第1冷卻台及被冷卻成溫度低於前述第1冷卻台的第2冷卻台;第1低溫板,具備有主開口之放射遮罩及配設於前述主開口之入口低溫板,且與前述第1冷卻台熱連接;及 第2低溫板,被前述第1低溫板包圍,且與前述第2冷卻台熱連接,前述放射遮罩具備:安裝座,位於前述第2低溫板的側方,且用於將前述冷凍機安裝於前述放射遮罩上;及遮罩部份,與前述安裝座相鄰且包圍前述第2低溫板,在前述第2低溫板與前述安裝座之間形成有側方間隙,在前述第2低溫板與前述遮罩部份之間形成有和前述側方間隙連續之間隙部,前述第2低溫板的形狀或配置被調整為使前述側方間隙的寬度與前述間隙部的寬度一致。 A cryopump comprising: a first cooling stage; and a second cooling stage cooled to a temperature lower than the first cooling stage; and a first cryopanel having a radiation mask and a main opening An inlet cryopanel of the main opening, and is thermally connected to the first cooling stage; and The second cryopanel is surrounded by the first cryopanel and is thermally connected to the second cooling stage. The radiation mask includes a mounting seat located on a side of the second cryopanel and is used to mount the refrigerator. And the mask portion is adjacent to the mounting seat and surrounding the second cryopanel, and a side gap is formed between the second cryopanel and the mount, and the second low temperature is formed A gap portion continuous with the side gap is formed between the plate and the mask portion, and the shape or arrangement of the second low temperature plate is adjusted such that the width of the side gap matches the width of the gap portion.

12.如實施形態11記載之低溫泵,其中,前述第2低溫板具有使前述側方間隙寬度擴大之缺口部。 12. The cryopump according to the eleventh aspect, wherein the second cryopanel has a notch portion that expands a width of the side gap.

13.如實施形態11或12記載之低溫泵,其中,前述第2低溫板被配置成從穿過前述主開口之軸線偏離前述第2低溫板的中心,以使前述第2低溫板與前述安裝座分開。 The cryopump according to the eleventh or 12th aspect, wherein the second cryopanel is disposed to be offset from a center of the second cryopanel from an axis passing through the main opening to allow the second cryopanel to be mounted Separate.

14.如實施形態11至13中任一實施形態記載之低溫泵,其中,前述第2低溫板具備與前述入口低溫板對向之前表面,前述前表面具備中心區域和包圍前述中心區域之外側區域,前述入口低溫板具備用於使冷凝在前述第2低溫板之氣體通過的氣體通過區域及氣體隔離區域,前述氣體通過 區域與前述外側區域對向,前述氣體隔離區域與前述中心區域對向。 The cryopump according to any one of the embodiments of the present invention, wherein the second cryopanel has a front surface facing the inlet cryopanel, and the front surface includes a central region and an outer region surrounding the central region The inlet cryopanel is provided with a gas passage region and a gas isolation region for allowing a gas condensed in the second cryopanel to pass therethrough, and the gas passes through The region faces the outer region, and the gas isolation region faces the center region.

15.如實施形態14記載之低溫泵,其中,前述氣體通過區域具備有複數個小孔之板部份。 15. The cryopump according to the fourteenth aspect, wherein the gas passage region is provided with a plate portion having a plurality of small holes.

16.如實施形態11至15中任一實施形態記載之低溫泵,其中,在前述放射遮罩形成有用於前述冷凍機之安裝孔,前述冷凍機具備連接前述第1冷卻台和前述第2冷卻台之連接部份,前述連接部份被插入到前述安裝孔中,在前述連接部份與前述安裝孔之間,在靠近前述主開口一側形成有上方間隙,在遠離前述主開口一側形成有下方間隙,前述上方間隙的寬度比前述下方間隙的寬度寬。 The cryopump according to any one of the embodiments of the present invention, wherein the radiation mask is provided with a mounting hole for the refrigerator, and the refrigerator includes a first cooling stage and the second cooling a connecting portion of the table, the connecting portion is inserted into the mounting hole, and an upper gap is formed between the connecting portion and the mounting hole on a side close to the main opening, and is formed away from the main opening side There is a lower gap, and the width of the aforementioned upper gap is wider than the width of the aforementioned lower gap.

10‧‧‧低溫泵 10‧‧‧Cryogenic pump

12‧‧‧吸氣口 12‧‧‧ suction port

14‧‧‧內部空間 14‧‧‧Internal space

16‧‧‧冷凍機 16‧‧‧Freezer

18‧‧‧第1低溫板 18‧‧‧1st cryogenic plate

20‧‧‧第2低溫板 20‧‧‧2nd cryogenic plate

21‧‧‧主容納空間 21‧‧‧Main accommodation space

22‧‧‧第1冷卻台 22‧‧‧1st cooling station

23‧‧‧第1壓缸 23‧‧‧1st cylinder

24‧‧‧第2冷卻台 24‧‧‧2nd cooling station

25‧‧‧第2壓缸 25‧‧‧2nd cylinder

26‧‧‧遮罩開口 26‧‧‧Mask opening

28‧‧‧遮罩前端 28‧‧‧mask front end

30‧‧‧放射遮罩 30‧‧‧radiation mask

32‧‧‧板構件 32‧‧‧ Board components

33‧‧‧裙部 33‧‧‧ skirt

34‧‧‧遮罩底部 34‧‧‧Bottom of the mask

36‧‧‧遮罩側部 36‧‧‧Mask side

37‧‧‧安裝座 37‧‧‧ Mounting

38‧‧‧低溫泵容器 38‧‧‧Cryogenic pump container

39‧‧‧前端 39‧‧‧ front end

40‧‧‧吸氣口凸緣 40‧‧‧ suction port flange

42‧‧‧安裝孔 42‧‧‧Mounting holes

43‧‧‧側方間隙 43‧‧‧ side clearance

44‧‧‧間隙部 44‧‧‧Gap section

45‧‧‧傳熱構件 45‧‧‧heat transfer member

46‧‧‧上方間隙 46‧‧‧Over the gap

48‧‧‧下方間隙 48‧‧‧The gap below

50‧‧‧板主體部 50‧‧‧ board main body

56‧‧‧氣體通過區域 56‧‧‧Gas passage area

58‧‧‧氣體隔離區域 58‧‧‧Gas isolation zone

60‧‧‧頂板 60‧‧‧ top board

61‧‧‧頂板前表面 61‧‧‧ Top surface of the top plate

62‧‧‧中心區域 62‧‧‧Central area

63‧‧‧外側區域 63‧‧‧Outer area

64‧‧‧固定構件 64‧‧‧Fixed components

65‧‧‧台階部 65‧‧‧Steps

66‧‧‧外周端部 66‧‧‧ peripheral end

67‧‧‧常規板 67‧‧‧General Board

68‧‧‧吸附劑 68‧‧‧Adsorbent

70‧‧‧冷凍機罩 70‧‧‧Freezer cover

A‧‧‧中心軸 A‧‧‧ center axis

Claims (6)

一種低溫泵,其特徵為,具備:冷凍機,具備第1冷卻台及被冷卻成溫度低於前述第1冷卻台的第2冷卻台;第1低溫板,具備有主開口之放射遮罩及配設在前述主開口之入口低溫板,且與前述第1冷卻台熱連接;以及第2低溫板,被前述第1低溫板包圍,且與前述第2冷卻台熱連接,前述放射遮罩具備:安裝座,位於前述第2低溫板的側方,且用於將前述冷凍機安裝於前述放射遮罩;以及遮罩部份,與前述安裝座相鄰且包圍前述第2低溫板,在前述第2低溫板與前述安裝座之間形成有側方間隙,在前述第2低溫板與前述遮罩部份之間形成有和前述側方間隙連續之間隙部,前述第2低溫板的形狀或配置被調整為使前述側方間隙的寬度與前述間隙部的寬度一致。 A cryopump including a first cooling stage and a second cooling stage cooled to a temperature lower than the first cooling stage, and a first cryopanel having a radiation mask having a main opening and An inlet low temperature plate disposed in the main opening and thermally connected to the first cooling stage; and a second low temperature plate surrounded by the first low temperature plate and thermally connected to the second cooling stage, wherein the radiation mask is provided a mounting seat located on a side of the second cryopanel and configured to mount the refrigerator to the radiation mask; and a mask portion adjacent to the mounting seat and surrounding the second cryopanel, A side gap is formed between the second cryopanel and the mounting seat, and a gap portion continuous with the side gap is formed between the second cryopanel and the mask portion, and the shape of the second cryopanel or The arrangement is adjusted such that the width of the aforementioned side gap coincides with the width of the aforementioned gap portion. 如申請專利範圍第1項記載之低溫泵,其中,前述第2低溫板具有使前述側方間隙寬度擴大的缺口部。 The cryopump according to the first aspect of the invention, wherein the second cryopanel has a notch portion that widens the lateral gap width. 如申請專利範圍第1或2項記載之低溫泵,其中,前述第2低溫板被配置成從穿過前述主開口之軸線偏離前述第2低溫板的中心,以使前述第2低溫板與前述安裝座分開。 The cryopump according to the first or second aspect of the invention, wherein the second cryopanel is disposed to be offset from a center of the second cryopanel from an axis passing through the main opening so that the second cryopanel is The mounts are separated. 如申請專利範圍第1或2項記載之低溫泵,其中,前述第2低溫板具備與前述入口低溫板對向之前表面,前述前表面具備中心區域和包圍前述中心區域之外側區域,前述入口低溫板具備用於使冷凝在前述第2低溫板上之氣體通過之氣體通過區域和氣體隔離區域,前述氣體通過區域與前述外側區域對向,前述氣體隔離區域與前述中心區域對向。 The cryopump according to claim 1 or 2, wherein the second cryopanel has a front surface facing the inlet cryopanel, and the front surface includes a central region and an outer region surrounding the central region, and the inlet is low. The plate includes a gas passage region for passing the gas condensed on the second cryopanel and a gas separation region, the gas passage region facing the outer region, and the gas isolation region facing the center region. 如申請專利範圍第4項記載之低溫泵,其中,前述氣體通過區域具備有複數個小孔之板部份。 The cryopump according to the fourth aspect of the invention, wherein the gas passage region has a plate portion having a plurality of small holes. 如申請專利範圍第1或2項記載之低溫泵,其中,前述放射遮罩上形成有用於前述冷凍機之安裝孔,前述冷凍機具備連接前述第1冷卻台和前述第2冷卻台之連接部份,前述連接部份被插入到前述安裝孔中,前述連接部份與前述安裝孔之間,在靠近前述主開口一側形成有上方間隙,在遠離前述主開口一側形成有下方間隙,前述上方間隙的寬度比前述下方間隙的寬度寬。 The cryopump according to the first or second aspect of the invention, wherein the radiation mask is provided with a mounting hole for the refrigerator, and the refrigerator includes a connecting portion that connects the first cooling stage and the second cooling stage. The connecting portion is inserted into the mounting hole, and an upper gap is formed between the connecting portion and the mounting hole on a side closer to the main opening, and a lower gap is formed on a side away from the main opening. The width of the upper gap is wider than the width of the aforementioned lower gap.
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