CN104074716B - Cryopump and evacuation method - Google Patents
Cryopump and evacuation method Download PDFInfo
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- CN104074716B CN104074716B CN201410112112.6A CN201410112112A CN104074716B CN 104074716 B CN104074716 B CN 104074716B CN 201410112112 A CN201410112112 A CN 201410112112A CN 104074716 B CN104074716 B CN 104074716B
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- cryopanel
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
- F04B37/00—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00
- F04B37/06—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for evacuating by thermal means
- F04B37/08—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for evacuating by thermal means by condensing or freezing, e.g. cryogenic pumps
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- General Engineering & Computer Science (AREA)
- Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
Abstract
The present invention provides the cryopump of a kind of gas hold-up improving cryopump.The cryopump (10) of the present invention possesses: refrigeration machine (16)；1st cryopanel (18), possesses radiation barrier part (30)；And the 2nd cryopanel (20), surrounded by the 1st cryopanel (18), and be cooled to the temperature less than the 1st cryopanel (18).Radiation barrier part (30) possesses: mounting seat (37), is positioned at the lateral of the 2nd cryopanel (20), and for refrigeration machine (16) is installed on radiation barrier part (30)；And shielding part part, and encirclement 2nd cryopanel (20) adjacent with mounting seat (37).It is formed with sideshake (43) between the 2nd cryopanel (20) and mounting seat (37), being formed between the 2nd cryopanel (20) and shielding part part and sideshake (43) continuous print clearance portion (44), it is consistent with the width of clearance portion (44) that the shape of the 2nd cryopanel (20) or configuration are adjusted to the width making sideshake (43).
Description
The application advocates based on Japanese patent application filed in 25 days March in 2013 the 2013-062560th
And the priority of Japanese patent application filed in 14 days June in 2013 the 2013-125819th.These
The full content of Japanese patent application is by with reference to being applied in this specification.
Technical field
The present invention relates to a kind of cryopump.
Background technology
Cryopump typically is provided with two kinds of cryopanels that temperature is different.Gas is condensate on the cryopanel of low temperature.With
The use of cryopump, on low temperature plate, condensate layer gradually grows up, soon may be with the low temperature of high temperature
Plate contacts.Consequently, it is possible in the contact site of high temperature cryopanel Yu condensate layer, gas gasified and again to week
Enclose release.Hereafter, cryopump will be unable to give full play to original effect.Therefore, the occlusion of gas now
Amount becomes the maximum hold-up of cryopump.
Patent documentation 1: Japanese Unexamined Patent Publication 2009-275672 publication
Summary of the invention
One of exemplary purpose of one embodiment of the present invention is to improve the gas hold-up of cryopump.
The cryopump of one embodiment of the present invention, it possesses: refrigeration machine, possesses the 1st cooling stage and quilt
It is cooled to the temperature the 2nd cooling stage less than described 1st cooling stage；1st cryopanel, possesses and has main opening
Radiation barrier part and be disposed in the entrance cryopanel of described main opening, and with described 1st cooling stage heat even
Connect；And the 2nd cryopanel, surrounded by described 1st cryopanel, and with described 2nd cooling stage thermally coupled.
Described radiation barrier part possesses: mounting seat, is positioned at the lateral of described 2nd cryopanel, and for by described system
Cold is installed on described radiation barrier part；And shielding part part, and encirclement institute adjacent with described mounting seat
State the 2nd cryopanel.It is formed with sideshake, described between described 2nd cryopanel and described mounting seat
It is formed between 2nd cryopanel and described shielding part part and described sideshake continuous print clearance portion, described
The shape of the 2nd cryopanel or configuration are adjusted to the width of width and the described clearance portion making described sideshake
Unanimously.
It addition, constitutive requirements or the form of expression of the present invention are mutually replaced between method, Apparatus and system etc.
The mode that the technology changed also serves as the present invention is effective.
In accordance with the invention it is possible to improve the gas hold-up of cryopump.
Accompanying drawing explanation
Fig. 1 is the side-looking of the major part of the cryopump involved by the 1st embodiment schematically illustrating the present invention
Sectional view.
Fig. 2 is the top view of the top board involved by the 1st embodiment schematically illustrating the present invention.
Fig. 3 is the top view of the plate member involved by the 1st embodiment schematically illustrating the present invention.
Fig. 4 is the operating cryopump of aerofluxus involved by the 1st embodiment schematically illustrating the present invention
Figure.
Fig. 5 is the side-looking of the major part of the cryopump involved by the 2nd embodiment schematically illustrating the present invention
Sectional view.
Fig. 6 is the side-looking of the major part of the cryopump involved by the 3rd embodiment schematically illustrating the present invention
Sectional view.
In figure: 10-cryopump, 16-refrigeration machine, 18-the 1st cryopanel, 20-the 2nd cryopanel, 22-the 1st
Cooling stage, 24-the 2nd cooling stage, 26-shielding part opening, 30-radiation barrier part, 32-plate member, 36-
Shielding part sidepiece, 37-mounting seat, 41-opens annulus, 42-installing hole, and 43-sideshake, between 44-
Gap portion, gap above 46-, gap below 48-, 50-plate main part, 52-plate outer edge, 54-aperture,
56-gas passes through region, and 58-gas shield region, 61-top board front surface, 62-central area, outside 63-
Side region, 74-notch part.
Detailed description of the invention
Fig. 1 is the major part of the cryopump 10 involved by the 1st embodiment schematically illustrating the present invention
Side view cutaway drawing.Cryopump 10 is such as installed on the vacuum chamber of ion implantation apparatus or sputter equipment etc.,
For the vacuum within vacuum chamber is improved to the level required by desired technique.Cryopump
10 have the air entry 12 for receiving gas.The gas that should be discharged is from the vacuum being provided with cryopump 10
Chamber enters the inner space 14 of cryopump 10 by air entry 12.Fig. 1 illustrates and comprises cryopump 10
The cross section of the central shaft A of inner space 14.
It addition, following for the ease of understanding the position relationship of the constitutive requirements of cryopump 10, sometimes use
The term such as " axially ", " radiation direction ".Axially represent (edge in Fig. 1, direction through air entry 12
The direction of single dotted broken line A), radiation direction represents that the direction along air entry 12 is (vertical with single dotted broken line A
Direction).For convenience, sometimes the direction of the most relatively close air entry 12 is referred to as
On " ", the direction being relatively distant from is referred to as D score.I.e., sometimes, the bottom of cryopump 10 will be relatively distant from
Direction be referred to as " on ", relatively close direction is referred to as D score.In radiation direction, sometimes will be close to
The direction at the center (axle A centered by Fig. 1) of air entry 12 is referred to as " interior ", will be close to air entry 12
Periphery direction be referred to as " outward ".Radiation direction is referred to as radially.It addition, this form of expression with
Configuration when cryopump 10 is installed on vacuum chamber is unrelated.Such as, cryopump 10 can vertically make
Air entry 12 is installed on vacuum chamber towards getting off.
Further, sometimes will be around axially direction and be referred to as " circumferential ".Circumference is the 2 along air entry 12
Direction, and be and the most orthogonal tangential direction.
Cryopump 10 possesses refrigeration machine 16.Refrigeration machine 16 for example, Ji Fude-McMahon formula refrigeration machine
Ultra-low temperature refrigerating devices such as (so-called GM refrigeration machines).Refrigeration machine 16 is for possessing the 1st cooling stage 22 and the 2nd
The two-stage type refrigeration machine of cooling stage 24.Refrigeration machine 16 is configured to the 1st cooling stage 22 is cooled to the 1st
Temperature levels, is cooled to the 2nd temperature levels by the 2nd cooling stage 24.The temperature of the 2nd temperature levels is less than
1st temperature levels.Such as, the 1st cooling stage 22 is cooled to about 65K～120K, the most cooled
To 80K～100K, the 2nd cooling stage 24 is cooled to about 10K～20K.
Further, refrigeration machine 16 possesses the 1st cylinder body the 23 and the 2nd cylinder body 25.1st cylinder body 23 is by refrigeration machine
The room temperature portion of 16 is connected to the 1st cooling stage 22.2nd cylinder body 25 is for be connected to the 2nd by the 1st cooling stage 22
The coupling part of cooling stage 24.
The cryopump 10 of diagram is so-called horizontal low temperature pump.Horizontal low temperature pump generally refers to refrigeration machine 16 and joins
The central shaft A being set as the inner space 14 with cryopump 10 intersects the cryopump of (the most orthogonal).
Cryopump 10 possesses the 1st cryopanel 18 and is cooled into temperature less than the 2nd of the 1st cryopanel 18
Cryopanel 20.Detailed content is by aftermentioned, and the 1st cryopanel 18 possesses radiation barrier part 30 and plate member
32, and surround the 2nd cryopanel 20.The master of condensate layer is formed between plate member the 32 and the 2nd cryopanel 20
Accommodate space 21.
First, the 2nd cryopanel 20 is illustrated.2nd cryopanel 20 is arranged at the interior of cryopump 10
The central part in space, portion 14.2nd cryopanel 20 is installed on the 2nd in the way of surrounding the 2nd cooling stage 24
Cooling stage 24.Therefore, the 2nd cryopanel the 20 and the 2nd cooling stage 24 thermally coupled, thus the 2nd cryopanel
20 are cooled to the 2nd temperature levels.
2nd cryopanel 20 possesses top board 60.Top board 60 is directly mounted at the 2nd cooling stage of refrigeration machine 16
On the upper surface of 24, the 2nd cooling stage 24 is positioned at the central part of the inner space 14 of cryopump 10.As
This, the main receiving space 21 of condensate layer accounts for the top half of inner space 14.
Top board 60 is arranged in its surface in order to make gas condensation.Top board 60 is at the 2nd cryopanel
Near the part of plate member 32 in 20, possess the top board front surface 61 opposed with plate member 32.Top board
Front surface 61 possesses central area 62 and surrounds the exterior lateral area 63 of central area 62.
Top board 60 is and the cryopanel of axially vertical the substantially planar configured.Top board 60 is in central area
62 are fixed on the 2nd cooling stage 24.Central area 62 has recess, and top board 60 uses suitable in this recess
When fixed component 64(such as bolt) be fixed on the 2nd cooling stage 24(with reference to Fig. 2 and Fig. 3).Recessed
The stage portion 65 being formed around upward in portion.The height of stage portion 65 is configured to fixed component
64 are contained in recess.Exterior lateral area 63 extends towards radial outside from stage portion 65.Exterior lateral area 63
Radial extremity bends downwards, forms the peripheral end 66 of top board 60.As in figure 2 it is shown, top board 60 is big
Cause discoideus plate.
It addition, top board 60 can not also have the recess of the central area 62 accommodating fixed component 64.This
Time, top board front surface 61 can be the tabular surface without stage portion 65.Further, in present embodiment,
Top board 60 does not possess adsorbent but it also may such as its back side is provided with adsorbent.
Fig. 2 is the top view of the top board 60 involved by the 1st embodiment schematically illustrating the present invention.2nd
The shape of cryopanel 20 is adjusted to the width W2 mono-of width W1 and the clearance portion 44 making sideshake 43
Cause.That is, the width W1 of sideshake 43 is substantially identical with the width W2 of clearance portion 44.To this end, top
Plate 60 has the notch part 74 of the width expansion making sideshake 43.This notch part 74 has the shape of arch
Shape.It addition, about conventional plate 67(reference Fig. 1 of lower section), can also have notch part equally.
Further, the 2nd cryopanel 20 comprises one or more conventional plate 67.Conventional plate 67 is to make gas
Condensation or absorption are arranged in its surface.Conventional plate 67 is arranged in the lower section of top board 60.Conventional plate 67
Shape different from top board 60.Conventional plate 67 is such as respectively provided with the shape of frustum of a cone side, the most so-called
The shape of umbrella.Each conventional plate 67 is provided with the adsorbents such as activated carbon 68.Adsorbent is bonded in such as
The back side of conventional plate 67.Purpose be using the front surface of conventional plate 67 as cryosurface, using the back side as suction
Attached face plays a role.
1st cryopanel 18 is to protect the 2nd cryopanel 20 from the outside or low from cryopump 10
The temperature radiant heat of pump receptacle 38 and the cryopanel that arranges.1st cryopanel the 18 and the 1st cooling stage 22 heat is even
Connect.Therefore, the 1st cryopanel 18 is cooled to the 1st temperature levels.1st cryopanel the 18 and the 2nd low temperature
Having gap between plate 20, the 1st cryopanel 18 does not contacts with the 2nd cryopanel 20.
Radiation barrier part 30 is to protect the 2nd cryopanel 20 from the radiation from cryopump container 38
Heat and arrange.Radiation barrier part 30 is between cryopump container the 38 and the 2nd cryopanel 20, and bag
Enclose the 2nd cryopanel 20.Radiation barrier part 30 possesses: delimit the screen of the shielding part opening 26 as main opening
Bottom the shielding part that shield front end 28 is opposed with shielding part opening 26 34 and from shielding part front end 28
The 34 shielding part sidepiece 36 extended bottom shielding part.Shielding part opening 26 is positioned at air entry 12.Radiation
Shielding part 30 has the shape of 34 tubulars being closed (such as cylinder) bottom shielding part, and is formed as cup
Shape.
Radiation barrier part 30 possesses the mounting seat 37 of refrigeration machine 16.Mounting seat 37 is from radiation barrier part 30
When outside is observed, depression, is formed for refrigeration machine 16 is installed on radiation barrier part at shielding part sidepiece 36
Flat on 30.Mounting seat 37 is positioned at the lateral of the 2nd cryopanel 20.As it has been described above, at refrigeration machine
Being mounted directly top board 60 on the upper surface of the 2nd cooling stage 24 of 16, therefore top board 60 is positioned at cold with the 2nd
But, on the height that platform 24 is identical, therefore mounting seat 37 is positioned at the lateral of top board 60.
Shielding part sidepiece 36 forms the annulus of integrally closed.Shielding part sidepiece 36 possesses mounting seat 37
With open annulus 41(with reference to Fig. 2).Open the shielding that annulus 41 is C-shaped circumferentially
Part part is adjacent with mounting seat 37 in the circumferential.Open annulus 41 and together surround the 2nd with mounting seat 37
Cryopanel 20, and form the annulus closed.It is formed between the 2nd cryopanel 20 and mounting seat 37
Sideshake 43, is formed with the clearance portion of C-shaped at the 2nd cryopanel 20 and opening between annulus 41
44.Clearance portion 44 forms the annular gap of closing continuously with sideshake 43.Clearance portion 44 is in circumference
On there is certain width.
As it is shown in figure 1, have the installing hole 42 of refrigeration machine 16, the 2nd of refrigeration machine 16 in mounting seat 37
Cooling stage the 24 and the 2nd cylinder body 25 is inserted into radiation barrier part 30 from this installing hole 42.Refrigeration machine 16
The 1st cooling stage 22 be configured at the outside of radiation barrier part 30.Radiation barrier part 30 is via heat transfer component
45 and be connected to the 1st cooling stage 22.Heat transfer component 45 is fixed on installing hole 42 by the flange of its one end
Peripheral part, be fixed on the 1st cooling stage 22 by the flange of the other end.Heat transfer component 45 for example, in
Empty short cylinder, its along the central shaft of refrigeration machine 16 between radiation barrier part the 30 and the 1st cooling stage 22
Extend.So, radiation barrier part the 30 and the 1st cooling stage 22 thermally coupled.It addition, radiation barrier part 30
The 1st cooling stage 22 can also be directly mounted at.
Between the 2nd cylinder body 25 and installing hole 42, above shielding part opening 26 side is formed
Gap 46, is being formed with gap 48, lower section away from shielding part opening 26 side.Owing to refrigeration machine 16 is inserted
Entering the center to installing hole 42, therefore the width in gap 46, top is equal with the width in gap, lower section 48.
In the present embodiment, radiation barrier part 30 is configured to the tubular of one as depicted.As replacing
For mode, radiation barrier part 30 can also be formed as overall in cylindrical shape by multiple parts.These are many
Individual part can also mutually keep gap to arrange.Such as, radiation barrier part 30 can be divided in the axial direction
It is slit into 2 parts.Now, the top of radiation barrier part 30 is the cylinder of both ends open, and it possesses shielding part
Front end 28 and the part 1 of shielding part sidepiece 36.Then upper end, the bottom of radiation barrier part 30 open and under
End seal is closed, bottom it part 2 possessing shielding part sidepiece 36 and shielding part 34.At shielding part sidepiece 36
Part 1 and part 2 between be formed with gap circumferentially.The installing hole 42 of refrigeration machine 16
Top half be formed at the part 1 of shielding part sidepiece 36, the latter half is formed at shielding part sidepiece 36
Part 2.
Cryopump 10 is provided with the refrigeration hood 70 of the 2nd cylinder body 25 surrounding refrigeration machine 16.Refrigeration
Hood 70 is formed as the diameter drum less times greater than the 2nd cylinder body 25, and one end is installed on the 2nd cooling stage
24, the installing hole 42 through radiation barrier part 30 extends towards the 1st cooling stage 22.At refrigeration hood 70
And be provided with gap between radiation barrier part 30, refrigeration hood 70 and radiation barrier part 30 not in contact with.
Refrigeration hood the 70 and the 2nd cooling stage 24 thermally coupled, thus it is cooled to identical with the 2nd cooling stage 24
Temperature.Therefore, refrigeration hood 70 can also regard a part for the 2nd cryopanel 20 as.
Plate member 32 is to protect the 2nd cryopanel 20 from the spoke of the external heat source from cryopump 10
Penetrate heat and be arranged at air entry 12(or shielding part opening 26, the most identical) entrance cryopanel.Low temperature
The external heat source of pump 10 for example, installs the thermal source in the vacuum chamber of cryopump 10.Not only limit radiant heat
Entrance, but also limit the entrance of gas molecule.Plate member 32 occupies the aperture area of air entry 12
A part, in order to the gas that internally space 14 flows into by air entry 12 is constrained to desired amount.
Plate member 32 covers a greater part of of air entry 12.Further, condensation under the chilling temperature of plate member 32
Gas (such as moisture) captures its surface.
There is between shielding part front end 28 and plate member 32 small gap vertically.In order to cover between this
Gap limits gas flowing, and plate member 32 possesses skirt section 33.Skirt section 33 is for surrounding the short of plate member 32
Cylinder.Skirt section 33 and plate member 32 are together formed plate member 32 as the one of the round tray shape of bottom surface
Structure.This round tray structure is configured to cover on radiation barrier part 30.Therefore, skirt section 33 is from plate
Parts 32 to the most prominent, and with shielding part front end 28 radially adjoining extend.Skirt section 33 and screen
The dimensional tolerance of the e.g., about radiation barrier part 30 of the radial distance between shield front end 28.
Gap between shielding part front end 28 and plate member 32 likely becomes because of the error on manufacturing
Dynamic.This error can be reduced by the processing of precise part and assembling, but considers consequent manufacture
The rising of cost is the most unrealistic.Error causes the individual diversity of cryopump 10.When assuming not have skirt section 33,
In radiation barrier part 30, the gas influx of side inflow changes according to the size in gap.The stream of gas
Enter amount directly related with the exhaust velocity of cryopump 10.No matter excesssive gap or too small, actual aerofluxus speed
Degree also can performance in off-design.By with skirt section 33 cover shielding part front end 28 and plate member 32 it
Between gap, limit and flowed by the gas in gap, and reduce individual diversity.Its result, additionally it is possible to reduce low
Temperature pump exhaust velocity is relative to the individual diversity of design performance.
Shielding part front end 28 and plate member 32 are configured at beyond the air entry flange 40 of cryopump container 38
Axially top.So, radiation barrier part 30 extends towards the vacuum chamber installing cryopump 10.By making
Radiation barrier part 30 extends upward, it is possible to expand main receiving space 21 axial space of condensate layer.Its
In, the axial length of this extension be configured to not with vacuum chamber (or vacuum chamber and cryopump 10
Between gate valve) disturb.
Cryopump container 38 is for accommodating the 1st cryopanel the 18, the 2nd cryopanel 20 and the low temperature of refrigeration machine 16
The framework of pump 10, and it is configured to keep the Dewar vessel of the vacuum-tightness of inner space 14.Pass through low temperature
Air entry 12 delimited in the front end 39 of pump receptacle 38.Cryopump container 38 possesses and is radially oriented from front end 39
The air entry flange 40 that outside extends.Air entry flange 40 is arranged throughout the complete cycle of cryopump container 38.
Use air entry flange 40 that cryopump 10 is installed on vacuum chamber.
Fig. 3 is the top view of the plate member 32 involved by the 1st embodiment schematically illustrating the present invention.?
In Fig. 3, the representational constitutive requirements that are positioned at plate member 32 below are represented by dashed line.
Plate member 32 possesses the one flat plate (such as plectane) across shielding part opening 26.Plate member 32
The consistent size of size (such as diameter) and shielding part opening 26.Plate member 32 is divided into plate main body
Portion 50 and plate outer edge 52.Plate outer edge 52 is for for being installed on radiation barrier part 30 by plate main part 50
On edge part.
Plate member 32 is installed on the plate installation portion 29 of shielding part front end 28.Plate installation portion 29 is from shielding part
The protuberance that front end 28 is prominent to radially inner side, is formed (such as every 90 °) the most at equal intervals.Plate
Parts 32 are fixed on plate installation portion 29 by suitable method.Such as, plate installation portion 29 and plate outer edge
52 have bolt hole (not shown), and plate outer edge 52 is fastened by bolts in plate installation portion 29.
Plate member 32 is formed the multiple apertures 54 allowing that gas flows.Aperture 54 is for being formed at plate master
Body 50 and the through hole of plate outer edge 52.Therefore, it is possible to it is main to make to be condensate in the 2nd cryopanel 20(
Top board 60) on gas enter the main appearance between plate member the 32 and the 2nd cryopanel 20 by aperture 54
Receive in space 21.It addition, near the plate installation portion 29 that is not formed in plate outer edge 52 of aperture 54.
Aperture 54 arranges regularly.In the present embodiment, aperture 54 is respectively at two orthogonal straight lines
The grid forming aperture 54 is set on direction at equal intervals.Instead scheme, aperture 54 can also be distinguished
Radially and arranging at equal intervals in circumference.
The shape of aperture 54 is the most circular, but is not limited to this, aperture 54 can also for have rectangle etc. its
The opening of his shape, the slit extended with linearity or curve-like or the periphery that is formed at plate member 32
Breach.The size of aperture 54 is significantly less than shielding part opening 26.
Plate main part 50 possesses: have the gas of multiple aperture 54 by region 56 and at plate main part
The gas shield region 58 passing through different position, region 56 from gas it is formed on 50.Therefore, plate main body
Portion 50 is divided into gas by region 56 and gas shaded areas 58.Gas passes through region 56 and gas
Shaded areas 58 is adjacent one another are.Therefore, the plate member 32 part on its surface has multiple aperture 54,
It is consequently formed gas by region 56.Further, plate member 32 is partially formed with gas shield region
58。
In figure 3, represent that gas passes through the border in region 56 and gas shield region 58 with single dotted broken line.
In the present embodiment, gas is positioned at top board 60 by the border in region 56 with gas shield region 58
The inner side on the border (i.e. stage portion 65) of exterior lateral area 63 and central area 62.Consequently, it is possible to gas leads to
Cross region 56 opposed with the exterior lateral area 63 of top board 60, gas shield region 58 and the center of top board 60
Region 62 is opposed.
As be described hereinafter, gas is to control before top board by the border in region 56 with gas shield region 58
The condensate layer 72(grown up on surface 61 is with reference to Fig. 4) shape and set.Therefore, in order to make condensation
Layer 72 grows into desired shape, and gas is permissible with the border in gas shield region 58 by region 56
Different from diagram.This border can be with the border one of the exterior lateral area 63 of top board 60 with central area 62
Cause, it is also possible to be positioned at outside it or intersect with it.Further, gas is by region 56 and gas shield district
The shape on the border in territory 58 is not limited to circle, can be other arbitrary shapes.
Gas shield region 58 is to remove at least 1 aperture from the regular arrangement of aperture 54 to be formed.
As it is shown on figure 3, gas shield region 58 is to comprise to assume according to gas by the aperture 54 in region 56
Regular arrangement time 4 apertures (the central part doublet at plate main part 50 represents) of being formed
Region.Owing to being not provided with aperture in gas shield region 58, therefore gas shield region 58 does not make gas
Pass through.
At least 1 aperture can be provided with in gas shield region 58.For example, it is possible to use dotted line in the drawings
The position of the imaginary aperture represented is formed without the aperture of all quantity (that is, with gas by region 56
Regular arrangement is compared, and reduces the quantity of aperture 54), it is consequently formed gas shield region 58.Or,
The hole of the aperture 54 passing through region 56 less than gas can be formed in the position of imagination aperture.This small open
Mouth can be arranged to that quantity is identical with the little hole number of the position of imaginary aperture or less than the position of this imaginary aperture
Little hole number.So, compared with passing through region 56 with gas, it is also possible to limit in gas shield region 58
Gas flowing.
Therefore, it can form aperture, in gas shield region with the 1st distribution in gas is by region 56
It is formed without aperture in 58 or forms aperture with the 2nd distribution different from the 1st distribution.2nd distribution such as sets
Surely the aperture area becoming the per unit in gas shield region 58 passes through in region 56 less than gas
The aperture area of per unit.Here, aperture area refers to the area sum of aperture.Further, the 1st
Distribution can not have systematicness.Therefore, gas can be arranged brokenly by the aperture 54 in region 56
Row.
It addition, in design, such as can require that performance comes decision plate parts 32 institute according to exhaust velocity etc.
The area sum of the opening having.Therefore, remove to set gas shield region 58 or reduce aperture
Time, preferably make up the minimizing of consequent aperture area.To this end, can be chased after by region 56 at gas
Add new aperture 54, it is also possible to amplify existing aperture 54.The position of existing aperture 54 can also be changed
Put.
The action of following description cryopump based on said structure 10.When cryopump 10 works, first,
Such as about 1Pa will be slightly evacuated to inside vacuum chamber with other suitable roughing vacuum pumps before it is started working.It
After, make cryopump 10 work.The driving by refrigeration machine 16 of 1st cooling stage the 22 and the 2nd cooling stage 24
And be cooled, also it is cooled with they hot linked 1st cryopanel the 18, the 2nd cryopanels 20.1st is low
Temperature plate the 18 and the 2nd cryopanel 20 is cooled to the 1st temperature and the 2nd temperature less than the 1st temperature respectively
Degree.
Plate member 32 cools down from vacuum chamber towards the internal sudden gas molecule of cryopump 10, makes at this cold
But the gas (such as moisture etc.) that at a temperature of, steam fully reduces is condensate in surface and aerofluxus.In plate member
Under the chilling temperature of 32, the gas of the insufficient reduction of steam enters main receiving space by multiple apertures 54
21.Or, a part of gas is reflected by the gas shield region 58 of plate member 32 and is not entered main receiving sky
Between 21.
The gas that in the gas molecule entered, steam fully reduces under the chilling temperature of the 2nd cryopanel 20
(such as argon etc.) are condensate in the surface (mainly top board front surface 61) of the 2nd cryopanel 20 and aerofluxus.
The gas (such as hydrogen etc.) of the most insufficient reduction of steam under this chilling temperature is adhered to the 2nd cryopanel
Surface and the cooled adsorbent 68 of 20 adsorb and aerofluxus.Consequently, it is possible to cryopump 10 can make very
The vacuum of plenum chamber reaches desired level.
Fig. 4 is the figure schematically illustrating the operating cryopump of aerofluxus 10.As shown in Figure 4, at cryopump 10
Top board 60 on pile up have the ice or frost formed by the gas condensed.The main constituent of this condensate layer 72 is for example,
Argon.This ice sheet runs the time along with aerofluxus and grows up, thus thickness is gradually increased.It addition, in the diagram,
In order to simple and clear, omit the condensate layer that diagram is deposited on conventional plate 67 and refrigeration hood 70.
When plate member 32 does not have gas shield region 58, (that is, plate member 32 has shown in Fig. 3
During the aperture of doublet), as shown in phantom in figure 4, dome type or mushroom-shaped condensate layer are at top board 60
Upper growth.When multiple apertures 54 are evenly distributed in plate member 32, gas easily flows into main receiving sky
Between 21 central part.Therefore, as it can be seen, be easily caused condensation to concentrate on central part.Further, in order to
The installation of plate member 32 and reduce the quantity of the aperture 54 of plate outer edge 52 it could also be possible that condensation concentrates on
One of reason of central part.
If the condensate layer of dome type is grown up the most further, then the peripheral part of condensate layer likely with shielding part
Sidepiece 36 contacts.If the gap between mounting seat 37 and top board 60 is narrow and small, then condensate layer first with peace
Dress seat 37 contacts.On contact site, gas again gasifies and is discharged into main receiving space 21 and cryopump 10
Outside.Therefore, after, cryopump 10 cannot provide the exhaust performance in design.Therefore, now
The hold-up of gas becomes the maximum hold-up of cryopump 10.(now, mounting seat 37, local of condensate layer
Near condensate layer) determine cryopump 10 the gas occlusion limit.
Cryopump is typically designed to axial symmetry.But, in horizontal low temperature pump 10, refrigeration machine 16 is laterally joined
Put, the most necessarily there is non-symmetrical portion (such as mounting seat 37).In the present embodiment, top board is made
The shape of 60 gap that make top board 60 and radiation barrier part 30 between corresponding with such non-symmetrical portion
Width is the most consistent.It can be avoided that the condensate layer radially grown up on top board 60 only has specific part
(now for the condensate layer near mounting seat 37) first contacts with radiation barrier part 30.Its result, according to this
Embodiment, it is possible to increase the gas hold-up of cryopump 10.
Further, if the condensate layer of dome type is grown up the most further, then the condensate layer top near central shaft A
Portion's likely lower surface with plate member 32 contacts.The hold-up of gas now becomes cryopump 10
Big hold-up.The local (now, the condensate layer top near central shaft A) of condensate layer determines cryopump 10
The gas occlusion limit.
When plate member 32 has gas shield region 58, (that is, plate member 32 does not have shown in Fig. 3
During the aperture of doublet), shown in solid such as Fig. 4, the condensate layer 72 of column type becomes on top board 60
Long.Limit gas by gas shield region 58 and be flowed into the central part in main receiving space 21, the most permissible
Relax condensation and concentrate on central part.Its result, as shown in arrow D in figure, the condensate layer 72 of column type
The height of the condensate layer near central shaft A becomes less than the condensate layer of dome type.On the other hand, such as arrow in figure
Shown in head E, the condensate layer height of peripheral part goes above the condensate layer of dome type.
Consequently, it is possible to according to present embodiment, it is possible to make on the condensate layer grown up on top board front surface 61
The height on surface is evenly distributed.Improve by the shape that makes condensate layer 72 is corresponding with main receiving space 21
The receiving rate of the condensate layer 72 in main receiving space 21.So, it is possible to improve the gas of cryopump 10
Hold-up.
Fig. 5 is the major part of the cryopump 10 involved by the 2nd embodiment schematically illustrating the present invention
Side view cutaway drawing.In cryopump 10 involved by 2nd embodiment, the 2nd cryopanel 20 has and the 1st
The configuration that embodiment is different.About other parts, the 2nd embodiment and the 1st embodiment are identical.With
In lower explanation, identical position is suitably omitted the description in order to avoid repeating.
As it is shown in figure 5, the configuration of the 2nd cryopanel 20 is adjusted to make width and the gap of sideshake 43
The width in portion 44 is consistent.As shown in arrow F in figure, the 2nd cryopanel 20 is configured to the 2nd cryopanel 20
Center deviation central shaft A so that the 2nd cryopanel 20 spaces out with mounting seat 37.2nd cryopanel
20 is eccentric from centrage A in the way of the high temperature side away from refrigeration machine 16.So, sideshake 43 is made to expand
Greatly, and relative to central shaft A clearance portion 44 is made to narrow in opposition side.In the 2nd embodiment, top board
60 do not have notch part 74.So, in a same manner as in the first embodiment, it is also possible to make to be enclosed in top board 60
The even width in the gap of the condensate layer side of upper growth.It addition, in one embodiment, top board 60
Can also have notch part 74, and the eccentric configuration of the 2nd cryopanel 20.
Fig. 6 is the major part of the cryopump 10 involved by the 3rd embodiment schematically illustrating the present invention
Side view cutaway drawing.In cryopump 10 involved by 3rd embodiment, refrigeration machine 16 has and has described
The configuration that embodiment is different.About other parts, the 3rd embodiment and the embodiment phase described
With.In following description, identical position is suitably omitted the description in order to avoid repeating.
As shown in Figure 6, refrigeration machine 16 is configured to wide than lower section gap 48 of width G 1 in gap 46, top
Degree G2 width.Thereby, it is possible to the space expanded between refrigeration hood 70 and radiation barrier part 30.By expanding
The big gap, top 46 near main receiving space 21, it is possible to accommodate more condensate layer.Further, due to
2 cryopanel 20 entirety move downwards, therefore compared with the embodiment described, additionally it is possible in the axial direction
Expand main receiving space 21.So, it is possible to improve the gas hold-up of cryopump 10.
As described above, according to the embodiment of the present invention, the shape of top board 60 or configuration are configured to make
Gap between radiation barrier part 30 and top board 60 is the most uniform.Thereby, it is possible to suppression is being stacked into top
On condensate layer on plate 60, condensation concentrates on specific part.Thereby, it is possible to improve in main receiving space 21
The receiving efficiency of condensate layer, and the gas hold-up of cryopump 10 can be improved.
Above, describe the present invention according to embodiment.But the invention is not restricted to above-mentioned embodiment,
It will be appreciated by those skilled in the art that and can implement various design alteration, and various variation can be implemented, and
And this variation is also contained in the scope of the present invention.
Such as, additionally it is possible to by the structure of any embodiment explanation in the 1st embodiment to the 3rd embodiment
The structural grouping illustrated with another embodiment in the 1st embodiment to the 3rd embodiment constitutes low temperature
Pump 10.
Further, cryopump 10 can possess the entrance cryopanel being disposed in shielding part opening 26 to replace plate portion
Part 32.Entrance cryopanel such as can possess 1 piece or the plate of polylith flat board (such as plectane) type, it is also possible to
Possess and be formed as concentric circles or grid-like shutter or chevron shape thing.Can by adjust shutter or
The shape of the blade of chevron shape thing, configure or be spaced, form gas at shielding part opening 26 and pass through district
Territory 56 and gas shield region 58.
In the above-described embodiment, plate member 32 is divided into two kinds of regions, i.e. gas by region 56
And gas shield region 58.But plate member 32 can have the region of more than three kinds.In plate member 32,
The region being easier to pass the gas through compared with passing through region 56 with gas can be formed, also as the 3rd region
The region being less susceptible to pass the gas through compared with gas shield region 58 can be formed.
Embodiments of the present invention can also show as follows.
1. a cryopump, it possesses:
Refrigeration machine, possesses the 1st cooling stage and is cooled into the temperature the 2nd cooling less than described 1st cooling stage
Platform；
1st cryopanel, possesses and has the radiation barrier part of main opening and across the plate member of described main opening,
And with described 1st cooling stage thermally coupled；And
2nd cryopanel, is surrounded by described 1st cryopanel, and with described 2nd cooling stage thermally coupled,
Described plate member possesses plate main part and for described plate main part is installed on described radiation barrier part
Outer edge,
Described plate main part possesses: gas passes through region, has for making condensation in described 2nd cryopanel
Multiple apertures that gas passes through；And gas shield region, it is formed at and described gas in described plate main part
By the position that region is different.
2. according to the cryopump described in embodiment 1, wherein,
Described 2nd cryopanel possesses the front surface opposed with described plate main part, and described front surface possesses center
Region and the exterior lateral area of the described central area of encirclement,
Described gas is opposed with described exterior lateral area by region, described gas shield region and described center
Territory is opposed.
3. according to the cryopump described in embodiment 1 or 2, wherein,
Described radiation barrier part possesses the sidepiece surrounding described 2nd cryopanel, at described sidepiece and the described 2nd
The gap with narrow it is formed with between cryopanel,
Described gas shield region is formed at the position corresponding with described narrow.
4. according to the cryopump described in any one embodiment in embodiment 1 to 3, wherein,
Described radiation barrier part possesses: mounting seat, is positioned at the lateral of described 2nd cryopanel, and for by institute
State refrigeration machine to be installed on described radiation barrier part；And annulus, and encirclement institute adjacent with described mounting seat
State the 2nd cryopanel,
It is formed with sideshake, at described 2nd cryopanel between described 2nd cryopanel and described mounting seat
And it is formed between described annulus and described sideshake continuous print annular gap,
It is ring-type with described that the shape of described 2nd cryopanel or configuration are adjusted to the width making described sideshake
The width in gap is consistent.
5. according to the cryopump described in embodiment 4, wherein,
Described 2nd cryopanel has the notch part making described sideshake width expansion.
6. according to the cryopump described in embodiment 4 or 5, wherein,
Described 2nd cryopanel is configured to the center deviation axle through described main opening of described 2nd cryopanel
Line, so that described 2nd cryopanel spaces out with described mounting seat.
7. according to the cryopump described in any one embodiment in embodiment 1 to 6, wherein,
Described radiation barrier part is formed the installing hole for installing described refrigeration machine,
Described refrigeration machine possesses described 1st cooling stage of connection and the coupling part of described 2nd cooling stage, described
Coupling part is inserted in described installing hole,
Between described coupling part and described installing hole, between above described main opening side is formed
Gap, is being formed with gap, lower section away from described main opening side, lower section described in the width ratio in gap, described top
The width width in gap.
8. an evacuation method, it uses cryopump, wherein:
Described cryopump possesses: across plate member and 2nd low temperature opposed with described plate member of main opening
Plate,
Described method for exhausting possesses following steps:
Plate member and the 2nd cryopanel are cooled to respectively the 1st temperature and the 2nd temperature less than the 1st temperature；
By the multiple apertures being formed in the part on the surface of described plate member, gas is received described
Between plate member and described 2nd cryopanel；And
Described gas is made to be condensate on described 2nd cryopanel.
9. a cryopump, it possesses:
1st cryopanel, possesses and has the radiation barrier part of main opening and across the plate member of described main opening；
And
2nd cryopanel, possesses the front surface opposed with described plate member, and is cooled into temperature less than described
1st cryopanel,
Described front surface possesses central area and surrounds the exterior lateral area of described central area,
Described plate member possesses: gas passes through region, has for making condensation in the gas of described 2nd cryopanel
Multiple apertures that body passes through, and opposed with described exterior lateral area；And gas shield region, with described center
Territory is opposed.
10. a cryopump, it possesses:
1st cryopanel, possess there is the radiation barrier part of main opening and be disposed in the entrance of described main opening low
Temperature plate；And
2nd cryopanel, is surrounded by described 1st cryopanel, and is cooled into temperature less than described 1st low temperature
Plate,
Described radiation barrier part possesses the sidepiece surrounding described 2nd cryopanel, at described sidepiece and the described 2nd
The gap with narrow it is formed with between cryopanel,
Described entrance cryopanel possesses gas shield region in the position corresponding with described narrow.
11. 1 kinds of cryopumps, it possesses:
Refrigeration machine, possesses the 1st cooling stage and is cooled into the temperature the 2nd cooling less than described 1st cooling stage
Platform；
1st cryopanel, possess there is the radiation barrier part of main opening and be disposed in the entrance of described main opening low
Temperature plate, and with described 1st cooling stage thermally coupled；And
2nd cryopanel, is surrounded by described 1st cryopanel, and with described 2nd cooling stage thermally coupled,
Described radiation barrier part possesses: mounting seat, is positioned at the lateral of described 2nd cryopanel, and for by institute
State refrigeration machine to be installed on described radiation barrier part；And shielding part part, and encirclement adjacent with described mounting seat
Described 2nd cryopanel,
It is formed with sideshake, at described 2nd cryopanel between described 2nd cryopanel and described mounting seat
And it is formed between described shielding part part and described sideshake continuous print clearance portion,
The shape of described 2nd cryopanel or configuration are adjusted to the width making described sideshake and described gap
The width in portion is consistent.
12. according to the cryopump described in embodiment 11, wherein,
Described 2nd cryopanel has the notch part making described sideshake width expansion.
13. according to the cryopump described in embodiment 11 or 12, wherein,
Described 2nd cryopanel is configured to the center deviation axle through described main opening of described 2nd cryopanel
Line, so that described 2nd cryopanel spaces out with described mounting seat.
14. according to the cryopump described in any one embodiment in embodiment 11 to 13, wherein,
Described 2nd cryopanel possesses the front surface opposed with described entrance cryopanel, during described front surface possesses
Heart region and the exterior lateral area of the described central area of encirclement,
Described entrance cryopanel possesses and passes through for the gas making condensation pass through in the gas of described 2nd cryopanel
Region and gas shield region, described gas is opposed with described exterior lateral area by region, described gas shield
Region is opposed with described central area.
15. according to the cryopump described in embodiment 14, wherein,
Described gas possesses plate part by region, and this plate part has multiple aperture.
16. according to the cryopump described in any one embodiment in embodiment 11 to 15, wherein,
Described radiation barrier part is formed the installing hole for installing described refrigeration machine,
Described refrigeration machine possesses described 1st cooling stage of connection and the coupling part of described 2nd cooling stage, described
Coupling part is inserted in described installing hole,
Between described coupling part and described installing hole, between above described main opening side is formed
Gap, is being formed with gap, lower section away from described main opening side, lower section described in the width ratio in gap, described top
The width width in gap.
Claims (6)
1. a cryopump, it is characterised in that possess:
Refrigeration machine, possesses the 1st cooling stage and is cooled into the temperature the 2nd cooling less than described 1st cooling stage
Platform；
1st cryopanel, possess there is the radiation barrier part of main opening and be disposed in the entrance of described main opening low
Temperature plate, and described 1st cryopanel and described 1st cooling stage thermally coupled；And
2nd cryopanel, is surrounded by described 1st cryopanel, and with described 2nd cooling stage thermally coupled,
Described radiation barrier part possesses: mounting seat, is positioned at the lateral of described 2nd cryopanel, and for by institute
State refrigeration machine to be installed on described radiation barrier part；And shielding part part, and bag adjacent with described mounting seat
Enclose described 2nd cryopanel,
It is formed with sideshake, at described 2nd cryopanel between described 2nd cryopanel and described mounting seat
And it is formed between described shielding part part and described sideshake continuous print clearance portion,
The shape of described 2nd cryopanel or configuration are adjusted to the width making described sideshake and described gap
The width in portion is consistent.
Cryopump the most according to claim 1, it is characterised in that
Described 2nd cryopanel has the notch part making described sideshake width expansion.
Cryopump the most according to claim 1 and 2, it is characterised in that
Described 2nd cryopanel is configured to the center deviation axle through described main opening of described 2nd cryopanel
Line, so that described 2nd cryopanel spaces out with described mounting seat.
Cryopump the most according to claim 1 and 2, it is characterised in that
Described 2nd cryopanel possesses the front surface opposed with described entrance cryopanel, during described front surface possesses
Heart region and the exterior lateral area of the described central area of encirclement,
Described entrance cryopanel possesses and passes through for the gas making condensation pass through in the gas of described 2nd cryopanel
Region and gas shaded areas, described gas is opposed with described exterior lateral area by region, described gas shield
Region is opposed with described central area.
Cryopump the most according to claim 4, it is characterised in that
Described gas possesses plate part by region, and this plate part has multiple aperture.
Cryopump the most according to claim 1 and 2, it is characterised in that
The installing hole for installing described refrigeration machine it is formed with on described radiation barrier part,
Described refrigeration machine possesses described 1st cooling stage of connection and the coupling part of described 2nd cooling stage, described
Coupling part is inserted in described installing hole,
Between described coupling part and described installing hole, between above described main opening side is formed
Gap, is being formed with gap, lower section away from described main opening side, lower section described in the width ratio in gap, described top
The width width in gap.
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013062560 | 2013-03-25 | ||
| JP2013-062560 | 2013-03-25 | ||
| JP2013-125819 | 2013-06-14 | ||
| JP2013125819A JP6076843B2 (en) | 2013-06-14 | 2013-06-14 | Cryopump |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN104074716A CN104074716A (en) | 2014-10-01 |
| CN104074716B true CN104074716B (en) | 2016-08-17 |
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| CN201410112112.6A Active CN104074716B (en) | 2013-03-25 | 2014-03-24 | Cryopump and evacuation method |
Country Status (3)
| Country | Link |
|---|---|
| KR (1) | KR101530926B1 (en) |
| CN (1) | CN104074716B (en) |
| TW (1) | TWI580865B (en) |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6415230B2 (en) * | 2014-10-07 | 2018-10-31 | 住友重機械工業株式会社 | Cryopump |
| CN106014917B (en) * | 2015-03-31 | 2018-07-17 | 住友重机械工业株式会社 | Cryogenic pump |
| JP6534358B2 (en) * | 2016-03-22 | 2019-06-26 | 住友重機械工業株式会社 | Cryopump, cryopump control apparatus and cryopump control method |
| JP2022117029A (en) * | 2021-01-29 | 2022-08-10 | アルバック・クライオ株式会社 | cryopump |
| CN116066323A (en) * | 2022-12-16 | 2023-05-05 | 安徽万瑞冷电科技有限公司 | Cryogenic pump |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62502276A (en) * | 1985-03-01 | 1987-09-03 | ヘリックス・テクノロジ−・コ−ポレ−ション | Cryogenic pump regeneration method and device |
| EP0921311A2 (en) * | 1994-04-28 | 1999-06-09 | Ebara Corporation | Cryopump |
| CN101094710A (en) * | 2005-02-08 | 2007-12-26 | 住友重机械工业株式会社 | Improved cryopump |
| JP2009275672A (en) * | 2008-05-16 | 2009-11-26 | Sumitomo Heavy Ind Ltd | Cryopump |
| WO2012109304A2 (en) * | 2011-02-09 | 2012-08-16 | Brooks Automation, Inc. | Cryopump |
| CN102686880A (en) * | 2009-11-09 | 2012-09-19 | 住友重机械工业株式会社 | Cryopump and vacuum pumping method |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4277951A (en) * | 1980-04-10 | 1981-07-14 | Air Products And Chemicals, Inc. | Cryopumping apparatus |
| US4791791A (en) * | 1988-01-20 | 1988-12-20 | Varian Associates, Inc. | Cryosorption surface for a cryopump |
| KR100871822B1 (en) * | 2007-06-28 | 2008-12-03 | 스미도모쥬기가이고교 가부시키가이샤 | Improved cryopump |
-
2014
- 2014-03-21 TW TW103110674A patent/TWI580865B/en active
- 2014-03-24 CN CN201410112112.6A patent/CN104074716B/en active Active
- 2014-03-25 KR KR1020140034544A patent/KR101530926B1/en active IP Right Grant
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62502276A (en) * | 1985-03-01 | 1987-09-03 | ヘリックス・テクノロジ−・コ−ポレ−ション | Cryogenic pump regeneration method and device |
| EP0921311A2 (en) * | 1994-04-28 | 1999-06-09 | Ebara Corporation | Cryopump |
| CN101094710A (en) * | 2005-02-08 | 2007-12-26 | 住友重机械工业株式会社 | Improved cryopump |
| JP2009275672A (en) * | 2008-05-16 | 2009-11-26 | Sumitomo Heavy Ind Ltd | Cryopump |
| CN102686880A (en) * | 2009-11-09 | 2012-09-19 | 住友重机械工业株式会社 | Cryopump and vacuum pumping method |
| WO2012109304A2 (en) * | 2011-02-09 | 2012-08-16 | Brooks Automation, Inc. | Cryopump |
Also Published As
| Publication number | Publication date |
|---|---|
| CN104074716A (en) | 2014-10-01 |
| KR20140116824A (en) | 2014-10-06 |
| TWI580865B (en) | 2017-05-01 |
| KR101530926B1 (en) | 2015-07-06 |
| TW201441486A (en) | 2014-11-01 |
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