TW201435512A - Scanned type UV-LED exposure device - Google Patents

Scanned type UV-LED exposure device Download PDF

Info

Publication number
TW201435512A
TW201435512A TW102107410A TW102107410A TW201435512A TW 201435512 A TW201435512 A TW 201435512A TW 102107410 A TW102107410 A TW 102107410A TW 102107410 A TW102107410 A TW 102107410A TW 201435512 A TW201435512 A TW 201435512A
Authority
TW
Taiwan
Prior art keywords
led
cycle
exposure
light
scanning
Prior art date
Application number
TW102107410A
Other languages
Chinese (zh)
Other versions
TWI529500B (en
Inventor
qi-feng Chen
Original Assignee
Univ Nat Central
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Univ Nat Central filed Critical Univ Nat Central
Priority to TW102107410A priority Critical patent/TWI529500B/en
Publication of TW201435512A publication Critical patent/TW201435512A/en
Application granted granted Critical
Publication of TWI529500B publication Critical patent/TWI529500B/en

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

A scanned type ultraviolet light emitting diode (UV-LED) exposure device is disclosed, which exposes a large object area by using a periodic UV-LED exposure light source with a fixed rate in an exposure task without requirement of stopping movement of device, so as to periodically repeat a use of an exposure light source to increase use efficiency of an energy source. Further, by means of alternatively arranged LEDs, uniformity of radiant illumination of an LED light source is improved, such that uniformity of exposure is improved and thus resulting in an improved yield. In addition, according to a structure design of upper and lower exposure stations and a periodic moving ring assembly of the present invention, the volume of the device is reduced, a production space and energy consumption is saved thereby reducing production cost. By means of utilizing the periodic moving ring assembly to drive the LED light source, a workpiece sufficiently employs an available space between the upper and lower exposure stations and the periodic moving ring assembly, so as to perform exposure of both the upper and lower exposure stations at the same time, thereby saving energy consumption as well as effectively and relatively increasing a production rate and therefore raising production efficiency.

Description

掃描式UV-LED曝光裝置Scanning UV-LED exposure device

本發明係有關於一種掃描式UV-LED曝光裝置,尤指涉及一種具有大面積分割區域曝光功能之LED曝光機,特別係指以一固定速率做週期循環之UV-LED曝光光源,對大面積目標區域進行掃描曝光製程時不需停止移動,達到可將曝光光源不斷循環重複利用而增加能量使用效率,俾以增加曝光均勻性之目的者。
The invention relates to a scanning UV-LED exposure device, in particular to an LED exposure machine with a large area divided area exposure function, in particular to a UV-LED exposure light source with a periodic cycle at a fixed rate, for a large area. The target area does not need to stop moving during the scanning exposure process, and the purpose of increasing the energy use efficiency by increasing the exposure efficiency of the exposure light source to increase the uniformity of exposure is achieved.

以往非UV-LED系統之曝光機台大,所佔生產空間也大,導致投資成本相對也增加;而目前使用紫外線(UV)進行曝光之機台,其曝光製程在未作特殊改良之情況下,曝光光源對於曝光目標區域採分割區域曝光,當光源在不同分割區域移動時,由於須重複進行移動光源→煞車→移動光源之動作,因此容易造成因掃描速度不規律,導致UV光源不穩定,而此種針對某一個LED曝光位置之方式,亦容易使其輻射照度不夠而產生曝光均勻性不足之問題,進而拉低產品良率;此外,習知技術進行曝光製程時,其光源需要一直開啟,故其UV光源壽命短,且在每一次中斷後之啟動前,皆需要進行暖燈預備動作,以至於光源開/關(ON/OFF)亦不易控制。
鑑於習知技術中光源重疊照明區域之均勻型不足之問題,故,ㄧ般習用者係無法符合使用者於實際使用時達到增加曝光均勻性而提升能量使用效率目的之所需。
In the past, the exposure machine of non-UV-LED system was large, and the production space was also large, which led to an increase in investment cost. However, the exposure process using ultraviolet (UV) is not particularly improved. The exposure light source exposes the divided area for the exposure target area. When the light source moves in different divided areas, the movement of the light source → braking → moving the light source must be repeated, so that the scanning speed is irregular and the UV light source is unstable. Such a method for exposing a certain LED position is also easy to cause insufficient irradiance and insufficient exposure uniformity, thereby lowering the yield of the product; in addition, when the prior art performs the exposure process, the light source needs to be always turned on. Therefore, the life of the UV light source is short, and the warm-light preparation operation is required before the start of each interruption, so that the light source ON/OFF is also difficult to control.
In view of the problem of the lack of uniformity of the overlapping illumination areas of the light source in the prior art, the conventional user cannot meet the needs of the user to achieve the purpose of increasing the uniformity of exposure and improving the efficiency of energy use in actual use.

本發明之主要目的係在於,克服習知技藝所遭遇之上述問題並提供一種以固定速率做週期循環之UV-LED曝光光源,對大面積目標區域進行掃描曝光製程時不需停止移動,達到可將曝光光源不斷循環重複利用而增加能量使用效率,俾以增加曝光均勻性目的之掃描式UV-LED曝光裝置。
本發明之次要目的係在於,提供一種可使裝置體積縮小,節省生產空間與能源消耗、降低生產成本並提高生產效能之掃描式UV-LED曝光裝置。
為達以上之目的,本發明係一種掃描式UV-LED曝光裝置,係包括:一曝光單元,包含一組彼此間隔之上曝光台與下曝光台,其相對應之兩平面用以置放塗佈有光阻層之基板,該光阻層係由光敏材料組成形成於該基板之上,並以置放該基板之兩平面作為線性目標曝光區域;一UV-LED照明單元,係由二維方向佈置之發光二極體陣列組成,且該發光二極體陣列係由複數個彼此平行排列之UV-LED線型燈條構成,而該些UV-LED線型燈條彼此間相互區隔,每一UV-LED線型燈條包含複數顆直線排列於燈條之縱向區域之發光二極體,且每一UV-LED線型燈條之縱向係與該上、下曝光台之線性目標曝光區域之縱向軸線相互垂直;以及一循環週期移動環,係設置於該曝光單元中該上曝光台及該下曝光台間隔之中央位置,且其外側設置以間隔舖設該UV-LED線型燈條所組成之發光二極體陣列光源,該循環週期移動環於進行曝光製程時無需停止,係以一固定速率旋轉,移動環外側該UV-LED線型燈條所組成之發光二極體陣列光源,以利該發光二極體陣列光源以循環掃描之方式進行該上、下曝光台之線性目標曝光區域之曝光。
上述掃描式UV-LED曝光裝置於一具體實施例中,該循環週期移動環係包括:一主動輪,係設置於該循環週期移動環之一端,用以驅動該循環週期移動環之旋轉;一托帶輪群,係設置於該循環週期移動環之內側,包含複數個托帶輪,用以承載該循環週期移動環以及該循環週期移動環外側UV-LED線型燈條之重量,並輔助該循環週期移動環旋轉順暢;一誘導輪,係設置於該循環週期移動環並相對該主動輪之另一端,用以輔助該循環週期移動環之旋轉;以及一主動散熱元件,係設置於該循環週期移動環內部,用以對該循環週期移動環進行主動散熱。
上述掃描式UV-LED曝光裝置於前述實施例中,該循環週期移動環係由該主動輪與該誘導輪而形成上下兩層之水平循環週期移動結構。
上述掃描式UV-LED曝光裝置於前述實施例中,該些托帶輪係彼此間隔設置於該循環週期移動環之內側,並與該主動輪及該誘導輪之間具有間距區隔。
上述掃描式UV-LED曝光裝置於前述實施例中,該主動散熱元件係可為一水冷式散熱元件或一氣冷式散熱元件。
上述掃描式UV-LED曝光裝置於一具體實施例中,該發光二極體係包含一二次光學元件以及一發光二極體光源所組成。
上述掃描式UV-LED曝光裝置於前述實施例中,該二次光學元件係可為透鏡或反射鏡。
上述掃描式UV-LED曝光裝置於一具體實施例中,該UV-LED線型燈條係可為透鏡式線型燈條或反射鏡式線型燈條。
上述掃描式UV-LED曝光裝置於一具體實施例中,該發光二極體陣列上方係可進一步設有一擴散板,該擴散板係覆蓋於各發光二極體之上方。
上述掃描式UV-LED曝光裝置於前述實施例中,該擴散板係以一整片結構覆蓋於各發光二極體之上方。
上述掃描式UV-LED曝光裝置於前述實施例中,該擴散板係以一肋狀結構覆蓋於各發光二極體之上方。
上述掃描式UV-LED曝光裝置於前述實施例中,該擴散板係以複數個條狀結構覆蓋於各發光二極體之上方。
上述掃描式UV-LED曝光裝置於前述實施例中,該擴散板係為耐UV透光材,並可為石英或玻璃。
上述掃描式UV-LED曝光裝置於一具體實施例中,該循環週期移動環於兩端點進行向上旋轉及向下旋轉時,其外側UV-LED線型燈條在向上旋轉處及向下旋轉處之各發光二極體係可進一步控制為關閉狀態。
上述掃描式UV-LED曝光裝置於一具體實施例中,該些UV-LED線型燈條係以平行該線性目標曝光區域之縱向軸線之方向排列。
上述掃描式UV-LED曝光裝置於一具體實施例中,該些UV-LED線型燈條中相鄰之列內之發光二極體係錯位排列。
The main object of the present invention is to overcome the above problems encountered in the prior art and to provide a UV-LED exposure light source that performs periodic cycle at a fixed rate, and does not need to stop moving when scanning a large-area target area. A scanning UV-LED exposure apparatus that continuously recycles an exposure light source to increase energy use efficiency and increases exposure uniformity.
A secondary object of the present invention is to provide a scanning UV-LED exposure apparatus that can reduce the size of the apparatus, save production space and energy consumption, reduce production costs, and improve production efficiency.
For the purpose of the above, the present invention is a scanning UV-LED exposure apparatus comprising: an exposure unit comprising a set of exposure stations and a lower exposure stage spaced apart from each other, the corresponding two planes for placing the coating a substrate having a photoresist layer formed on the substrate by a photosensitive material, and two planes for placing the substrate are used as linear target exposure regions; a UV-LED illumination unit is two-dimensional a directional array of LED arrays, and the LED array is composed of a plurality of UV-LED linear strips arranged in parallel with each other, and the UV-LED strips are separated from each other, each The UV-LED linear light bar comprises a plurality of light emitting diodes linearly arranged in a longitudinal region of the light bar, and a longitudinal axis of each UV-LED linear light bar and a longitudinal axis of the linear target exposure region of the upper and lower exposure stations And a cycle of the moving ring is disposed at a central position of the upper exposure stage and the lower exposure stage in the exposure unit, and an outer side of the exposure unit is provided with a light-emitting diode composed of the UV-LED linear light strip Polar array Source, the cycle moving ring does not need to stop during the exposure process, rotates at a fixed rate, and moves the LED array light source composed of the UV-LED linear light bar outside the ring to facilitate the LED array The light source performs exposure of the linear target exposure areas of the upper and lower exposure stages in a cyclic scan manner.
In a specific embodiment, the cycle-type moving ring system includes: a driving wheel disposed at one end of the circulating cycle of the cycle to drive the rotation of the cycle of the cycle; The carrier pulley group is disposed on the inner side of the cycle period moving ring, and includes a plurality of carrier pulleys for carrying the cycle period moving ring and the weight of the UV-LED linear type light bar outside the cycle of the cycle, and assisting the The cycle of the cycle moves smoothly; an inducer is disposed in the cycle and moves relative to the other end of the drive wheel to assist the rotation of the cycle; and an active heat dissipation component is disposed in the cycle The inside of the cycle moves the ring to actively dissipate the moving ring of the cycle.
In the above embodiment, the scanning type UV-LED exposure apparatus is configured to form a horizontal cycle periodic moving structure of the upper and lower layers by the driving wheel and the induction wheel.
In the foregoing embodiment, the scanning type UV-LED exposure apparatus is disposed at an inner side of the circulation cycle moving ring and spaced apart from the driving wheel and the induction wheel.
In the foregoing embodiment, the active heat dissipating component may be a water-cooled heat dissipating component or an air-cooling heat dissipating component.
In the above embodiment, the scanning UV-LED exposure apparatus comprises a secondary optical component and a light-emitting diode light source.
The above scanning type UV-LED exposure apparatus is in the foregoing embodiment, and the secondary optical element may be a lens or a mirror.
In the above embodiment, the UV-LED linear light strip can be a lens type linear light strip or a mirror type linear light strip.
In a specific embodiment, the scanning UV-LED exposure device is further provided with a diffusion plate over the LED array, and the diffusion plate covers the LEDs.
In the above embodiment, the diffusion type UV-LED exposure apparatus covers the light-emitting diodes in a one-piece structure.
In the above embodiment, the diffusion type UV-LED exposure apparatus covers the light-emitting diodes with a rib structure.
In the above embodiment, the diffusion type UV-LED exposure apparatus covers the light-emitting diodes in a plurality of strip structures.
In the above embodiment, the diffusion type UV-LED exposure apparatus is a UV-resistant material, and may be quartz or glass.
In the above embodiment, the scanning UV-LED exposure device is in the upward rotation and downward rotation of the outer UV-LED linear light bar when the cycle is moved upward and downward at the two end points. Each of the light emitting diode systems can be further controlled to be in a closed state.
In the above embodiment, the UV-LED linear light strips are arranged in a direction parallel to the longitudinal axis of the linear target exposure area.
In a specific embodiment, the scanning UV-LED exposure device is arranged in a misaligned manner in the adjacent two columns of the UV-LED linear light strips.

100...掃描式UV-LED曝光裝置100. . . Scanning UV-LED exposure device

10...曝光單元10. . . Exposure unit

11...上曝光台11. . . Upper exposure station

12...下曝光台12. . . Lower exposure station

13...線性目標曝光區域13. . . Linear target exposure area

20...UV-LED照明單元20. . . UV-LED lighting unit

21...發光二極體陣列光源twenty one. . . LED array light source

22...UV-LED線型燈條twenty two. . . UV-LED line light strip

23...發光二極體twenty three. . . Light-emitting diode

24...擴散板twenty four. . . Diffuser

231...二次光學元件231. . . Secondary optics

232...發光二極體光源232. . . Light-emitting diode source

30...循環週期移動環30. . . Cycle cycle

31...主動輪31. . . Driving wheel

32...托帶輪群32. . . Pulley wheel group

321...托帶輪321. . . Pulley wheel

33...誘導輪33. . . Induction wheel

34...主動散熱元件34. . . Active heat sink

第1圖,係本發明之結構示意圖。
第2圖,係本發明一具體實施例之UV-LED照明單元之俯視示意圖。
第3圖,係本發明另一具體實施例之UV-LED照明單元之俯視示意圖。

Fig. 1 is a schematic view showing the structure of the present invention.
2 is a top plan view of a UV-LED lighting unit in accordance with an embodiment of the present invention.
Figure 3 is a top plan view of a UV-LED lighting unit in accordance with another embodiment of the present invention.

請參閱『第1圖~第3圖』所示,係分別為本發明之結構示意圖、本發明一具體實施例之UV-LED照明單元之俯視示意圖、及本發明另一具體實施例之UV-LED照明單元之俯視示意圖。如圖所示:本發明係一種掃描式UV-LED曝光裝置,係具有大面積分割區域曝光功能之LED曝光機,可使光源照射之照明光通過光罩所得到之透射光,對應於工件之目標曝光區域做投影照射。該掃描式UV-LED曝光裝置100至少包括一曝光單元10、一UV-LED照明單元20以及一循環週期移動環30所構成。
上述所提之曝光單元10包含一組彼此間隔之上曝光台11與下曝光台12,其相對應之兩平面用以置放塗佈有光阻層之基板(圖中未示),該光阻層係由光敏材料組成形成於該基板之上,並以置放該基板之兩平面作為線性目標曝光區域13。
上述所提之UV-LED照明單元20係由二維方向佈置之發光二極體陣列光源21組成,且該發光二極體陣列光源21係由複數個彼此平行排列之UV-LED線型燈條22構成,而該些UV-LED線型燈條22彼此間相互區隔,每一UV-LED線型燈條22包含複數顆直線排列於燈條之縱向區域之發光二極體23,且每一UV-LED線型燈條22之縱向係與該上曝光台11及該下曝光台12之線性目標曝光區域13之縱向軸線相互垂直。
上述所提之循環週期移動環30係設置於該曝光單元10中該上曝光台11及該下曝光台12間隔之中央位置,且其外側設置以間隔舖設該UV-LED線型燈條22所組成之發光二極體陣列光源21。
上述UV-LED線型燈條22係以平行該線性目標曝光區域13之縱向軸線之方向排列,且該些UV-LED線型燈條22中相鄰之列內之發光二極體23係錯位排列,如第2圖所示,能有效疊加各UV-LED線型燈條22之輻射能。
上述發光二極體23係包含一二次光學元件231以及一發光二極體光源232所組成,其中,當該二次光學元件231為透鏡時,該UV-LED線型燈條22係為透鏡式線型燈條,如第2圖所示;當該二次光學元件231為反射鏡時,該UV-LED線型燈條22係為反射鏡式線型燈條,如第3圖所示。
上述循環週期移動環30係包括一主動輪31、一托帶輪群32、一誘導輪33以及一主動散熱元件34所組成,該循環週期移動環30係由該主動輪31與該誘導輪33而形成上下兩層之水平循環週期移動結構。其中,該主動輪31係設置於該循環週期移動環30之一端,用以驅動該循環週期移動環30之旋轉;該托帶輪群32係包含複數個托帶輪321,該些托帶輪321係彼此間隔設置於該循環週期移動環30之內側,並與該主動輪31及該誘導輪33之間具有一適當間距區隔,用以承載該循環週期移動環30以及該循環週期移動環30外側UV-LED線型燈條22之重量,並輔助該循環週期移動環30旋轉順暢;該誘導輪33係設置於該循環週期移動環30並相對該主動輪31之另一端,用以輔助該循環週期移動環30之旋轉;以及該主動散熱元件34係設置於該循環週期移動環30內部,用以對該循環週期移動環30進行主動散熱,於其中,該主動散熱元件34係可為一水冷式散熱元件或一氣冷式散熱元件。
上述發光二極體陣列光源21上方係可進一步設有一擴散板24,該擴散板24係覆蓋於各發光二極體23之上方,且該擴散板24係為耐UV透光材,並可為石英或玻璃。於一具體施例中,該擴散板24係以一整片結構覆蓋於各發光二極體23之上方,如第1圖所示;於另一具體施例中,該擴散板24係以一肋狀結構覆蓋於各發光二極體23之上方;於再一具體施例中,該擴散板24係以複數個條狀結構覆蓋於各發光二極體23之上方。
以上所述,係構成一全新之掃描式UV-LED曝光裝置100。
當運用時,該循環週期移動環30於進行曝光製程時無需停止,其旋轉主要由該主動輪31驅動,再搭配該誘導輪33輔助,以一固定速率旋轉,移動環外側該UV-LED線型燈條22所組成之發光二極體陣列光源21,以利該發光二極體陣列光源21以循環掃描之方式進行該上曝光台11及該下曝光台12之線性目標曝光區域13之曝光。並且,當該循環週期移動環30於兩端點進行向上旋轉及向下旋轉時,其外側UV-LED線型燈條在向上旋轉處及向下旋轉處之各發光二極體23係可進一步控制為關閉狀態,藉此延長光源壽命之同時更能進一步達到節省能源消耗之功效。
藉此,本發明之掃描式UV-LED曝光裝置,係運用一以固定速率做週期循環之UV-LED曝光光源,對大面積目標區域進行掃描曝光製程時不需停止移動,達到可將曝光光源不斷循環重複利用而增加能量使用效率之目的,並以錯位排列增加發光二極體陣列光源對於線性目標曝光區域之輻射照度之均勻性,俾以增加曝光均勻性,進而有效提高產品良率;此外,本發明透過上下曝光台與循環週期移動環之結構設計,可使裝置體積縮小,節省生產空間與能源消耗而降低生產成本,利用循環週期移動環帶動發光二極體陣列光源,使工件在上下曝光台與循環週期移動環之間充分利用空間而可同時進行上下曝光台之曝光,達到節省能源之消耗並能有效地相對增加產速,以達到提高生產效能。
綜上所述,本發明係一種掃描式UV-LED曝光裝置,可有效改善習用之種種缺點,係運用一以固定速率做週期循環之UV-LED曝光光源,對大面積目標區域進行掃描曝光製程時不需停止移動,達到可將曝光光源不斷循環重複利用而增加能量使用效率之目的,可以增加曝光均勻性,並可縮小裝置體積,節省生產空間與能源消耗、降低生產成本並提高生產效能,進而使本發明之産生能更進步、更實用、更符合使用者之所須,確已符合發明專利申請之要件,爰依法提出專利申請。
惟以上所述者,僅為本發明之較佳實施例而已,當不能以此限定本發明實施之範圍;故,凡依本發明申請專利範圍及發明說明書內容所作之簡單的等效變化與修飾,皆應仍屬本發明專利涵蓋之範圍內。
Please refer to FIG. 1 to FIG. 3, which are schematic views of the structure of the present invention, a schematic view of a UV-LED illumination unit according to an embodiment of the present invention, and a UV-in another embodiment of the present invention. A schematic view of the LED lighting unit. As shown in the figure: the invention is a scanning UV-LED exposure device, which is an LED exposure machine with a large-area divided area exposure function, which can transmit the illumination light received by the light source through the reticle, corresponding to the workpiece. The target exposure area is projected to be illuminated. The scanning UV-LED exposure apparatus 100 includes at least an exposure unit 10, a UV-LED illumination unit 20, and a cyclic period moving ring 30.
The exposure unit 10 mentioned above comprises a set of exposure stations 11 and a lower exposure stage 12 spaced apart from each other, and the corresponding two planes are used for placing a substrate coated with a photoresist layer (not shown). The resist layer is formed of a photosensitive material formed on the substrate, and the two planes on which the substrate is placed are used as the linear target exposure region 13.
The above-mentioned UV-LED illumination unit 20 is composed of a two-dimensionally arranged light-emitting diode array light source 21, and the light-emitting diode array light source 21 is composed of a plurality of UV-LED linear light strips 22 arranged in parallel with each other. The UV-LED linear light strips 22 are mutually separated from each other, and each of the UV-LED linear light strips 22 includes a plurality of light-emitting diodes 23 arranged linearly in a longitudinal region of the light strip, and each UV- The longitudinal direction of the LED linear strips 22 is perpendicular to the longitudinal axes of the linear exposure regions 13 of the upper exposure stage 11 and the lower exposure stage 12.
The cyclic cycle moving ring 30 mentioned above is disposed at a central position of the upper exposure stage 11 and the lower exposure stage 12 in the exposure unit 10, and is disposed on the outer side thereof to form the UV-LED linear type light bar 22 at intervals. The light emitting diode array light source 21.
The UV-LED linear light strips 22 are arranged in parallel with the longitudinal axis of the linear target exposure area 13, and the light-emitting diodes 23 in the adjacent columns of the UV-LED linear light strips 22 are arranged in a misaligned manner. As shown in Fig. 2, the radiant energy of each of the UV-LED linear strips 22 can be effectively superimposed.
The light-emitting diode 23 includes a secondary optical element 231 and a light-emitting diode light source 232. When the secondary optical element 231 is a lens, the UV-LED linear light strip 22 is a lens type. The linear light bar is as shown in Fig. 2; when the secondary optical element 231 is a mirror, the UV-LED linear light bar 22 is a mirror type linear light bar, as shown in Fig. 3.
The cyclic cycle moving ring 30 includes a driving wheel 31, a carrier pulley group 32, an induction wheel 33, and an active heat dissipating component 34. The circulating cycle moving ring 30 is composed of the driving wheel 31 and the induction wheel 33. The horizontal loop period moving structure of the upper and lower layers is formed. The driving wheel 31 is disposed at one end of the circulating cycle moving ring 30 for driving the rotation of the circulating cycle 30; the carrier wheel group 32 includes a plurality of carrier pulleys 321 The 321 series are disposed at an inner side of the circulating cycle moving ring 30, and are spaced apart from the driving wheel 31 and the induction wheel 33 by an appropriate spacing for carrying the cycle period moving ring 30 and the cycle moving ring. 30 The weight of the outer UV-LED linear light bar 22, and assists the rotation of the moving ring 30 in the cycle; the induction wheel 33 is disposed in the cycle of the moving ring 30 and opposite to the other end of the driving wheel 31, to assist the Rotating the rotation of the ring 30; and the active heat dissipating component 34 is disposed inside the cycle of the moving ring 30 for actively dissipating the cycle ring 30, wherein the active heat dissipating component 34 can be a Water-cooled heat sink or an air-cooled heat sink.
The diffusing plate 24 is further disposed on the upper surface of each of the light emitting diodes 23, and the diffusing plate 24 is made of a UV transparent material. Quartz or glass. In a specific embodiment, the diffusion plate 24 is covered with a whole structure over the LEDs 23, as shown in FIG. 1; in another specific embodiment, the diffusion plate 24 is a The rib structure covers the LEDs 23; in still another embodiment, the diffusion plate 24 covers the LEDs 23 in a plurality of strip structures.
As described above, a new scanning UV-LED exposure apparatus 100 is constructed.
When in use, the cycle moving ring 30 does not need to stop during the exposure process, and its rotation is mainly driven by the driving wheel 31, and is assisted by the induction wheel 33 to rotate at a fixed rate, and the UV-LED line type is moved outside the ring. The light-emitting diode array light source 21 is composed of the light bar 22, so that the light-emitting diode array light source 21 performs exposure of the linear exposure target area 13 of the upper exposure stage 11 and the lower exposure stage 12 in a cyclic scan manner. Moreover, when the cycle period moving ring 30 is rotated upward and downward at the two end points, the outer UV-LED line type light bar can be further controlled at each of the light-emitting diodes 23 at the upward rotation and the downward rotation. In order to close the state, the life of the light source can be extended to further save energy consumption.
Therefore, the scanning UV-LED exposure apparatus of the present invention uses a UV-LED exposure light source which performs periodic cycle at a fixed rate, and does not need to stop moving when scanning a large-area target area is performed, and the exposure light source can be obtained. Continuously recycling and increasing the efficiency of energy use, and increasing the uniformity of the illuminance of the light-emitting diode array light source to the linear target exposure area by misalignment, thereby increasing the uniformity of exposure, thereby effectively improving the yield of the product; The invention adopts the structural design of the upper and lower exposure stage and the circulation cycle moving ring, which can reduce the volume of the device, save production space and energy consumption, and reduce the production cost, and use the cycle to move the ring to drive the light-emitting diode array light source to make the workpiece up and down. The space between the exposure stage and the cycle-period moving ring can make full use of the space to simultaneously expose the upper and lower exposure stages, thereby saving energy consumption and effectively increasing the production speed to achieve higher production efficiency.
In summary, the present invention is a scanning UV-LED exposure device, which can effectively improve various shortcomings of the conventional use, and uses a UV-LED exposure light source with a periodic cycle at a fixed rate to perform a scanning exposure process on a large-area target area. When the movement is not required, the exposure light source can be continuously recycled and reused to increase the energy use efficiency, the exposure uniformity can be increased, the device volume can be reduced, the production space and energy consumption can be saved, the production cost can be reduced, and the production efficiency can be improved. In turn, the invention can be made more progressive, more practical, and more in line with the needs of the user. It has indeed met the requirements of the invention patent application, and has filed a patent application according to law.
However, the above is only the preferred embodiment of the present invention, and the scope of the present invention is not limited thereto; therefore, the simple equivalent changes and modifications made in accordance with the scope of the present invention and the contents of the invention are modified. All should remain within the scope of the invention patent.

100...掃描式UV-LED曝光裝置100. . . Scanning UV-LED exposure device

10...曝光單元10. . . Exposure unit

11...上曝光台11. . . Upper exposure station

12...下曝光台12. . . Lower exposure station

13...線性目標曝光區域13. . . Linear target exposure area

20...UV-LED照明單元20. . . UV-LED lighting unit

22...UV-LED線型燈條twenty two. . . UV-LED line light strip

23...發光二極體twenty three. . . Light-emitting diode

24...擴散板twenty four. . . Diffuser

30...循環週期移動環30. . . Cycle cycle

31...主動輪31. . . Driving wheel

32...托帶輪群32. . . Pulley wheel group

321...托帶輪321. . . Pulley wheel

33...誘導輪33. . . Induction wheel

34...主動散熱元件34. . . Active heat sink

Claims (16)

一種掃描式UV-LED曝光裝置,係包括:
    一曝光單元,包含一組彼此間隔之上曝光台與下曝光台,其相對應之兩平面用以置放塗佈有光阻層之基板,該光阻層係由光敏材料組成形成於該基板之上,並以置放該基板之兩平面作為線性目標曝光區域;
    一UV-LED照明單元,係由二維方向佈置之發光二極體陣列光源組成,且該發光二極體陣列光源係由複數個彼此平行排列之UV-LED線型燈條構成,而該些UV-LED線型燈條彼此間相互區隔,每一UV-LED線型燈條包含複數顆直線排列於燈條之縱向區域之發光二極體,且每一UV-LED線型燈條之縱向係與該上、下曝光台之線性目標曝光區域之縱向軸線相互垂直;以及
    一循環週期移動環,係設置於該曝光單元中該上曝光台及該下曝光台間隔之中央位置,且其外側設置以間隔舖設該UV-LED線型燈條所組成之發光二極體陣列光源,該循環週期移動環於進行曝光製程時無需停止,係以一固定速率旋轉,移動環外側該UV-LED線型燈條所組成之發光二極體陣列光源,以利該發光二極體陣列光源以循環掃描之方式進行該上、下曝光台之線性目標曝光區域之曝光。
A scanning UV-LED exposure apparatus includes:
An exposure unit comprising a plurality of upper and lower exposure stages spaced apart from each other, wherein the corresponding two planes are used for placing a substrate coated with a photoresist layer formed of a photosensitive material on the substrate Above, and placing the two planes of the substrate as linear target exposure areas;
A UV-LED illumination unit is composed of a light-emitting diode array light source arranged in a two-dimensional direction, and the light-emitting diode array light source is composed of a plurality of UV-LED linear light strips arranged in parallel with each other, and the UVs - LED linear light strips are mutually separated from each other, each UV-LED linear light strip comprises a plurality of light emitting diodes arranged linearly in a longitudinal region of the light strip, and the longitudinal direction of each UV-LED linear light strip is The longitudinal axes of the linear target exposure areas of the upper and lower exposure stages are perpendicular to each other; and a cycle-period moving ring is disposed at a central position of the upper exposure stage and the lower exposure stage interval in the exposure unit, and is disposed at an outer interval thereof Laying the light-emitting diode array light source composed of the UV-LED linear light strip, the cycle moving ring does not need to stop when performing the exposure process, and rotates at a fixed rate, and the UV-LED linear light strip on the outer side of the moving ring is formed. The LED array light source is used to expose the linear target exposure area of the upper and lower exposure stages in a cyclic scan manner.
依申請專利範圍第1項所述之掃描式UV-LED曝光裝置,其中,該循環週期移動環係包括:
    一主動輪,係設置於該循環週期移動環之一端,用以驅動該循環週期移動環之旋轉;
    一托帶輪群,係設置於該循環週期移動環之內側,包含複數個托帶輪,用以承載該循環週期移動環以及該循環週期移動環外側UV-LED線型燈條之重量,並輔助該循環週期移動環旋轉順暢;
    一誘導輪,係設置於該循環週期移動環並相對該主動輪之另一端,用以輔助該循環週期移動環之旋轉;以及
    一主動散熱元件,係設置於該循環週期移動環內部,用以對該循環週期移動環進行主動散熱。
The scanning type UV-LED exposure apparatus according to claim 1, wherein the cyclic period moving ring system comprises:
a driving wheel is disposed at one end of the moving ring of the cycle to drive the rotation of the moving ring of the cycle;
A support pulley group is disposed on the inner side of the cycle period moving ring, and includes a plurality of carrier pulleys for carrying the cycle cycle moving ring and the weight of the UV-LED linear type light bar outside the cycle of the cycle, and assisting The cycle of the moving ring rotates smoothly;
An inducer wheel is disposed on the cycle of the cycle and is opposite to the other end of the drive wheel for assisting rotation of the cycle of the cycle; and an active heat dissipating component is disposed inside the cycle of the cycle ring for Active cooling of the moving ring of the cycle.
依申請專利範圍第2項所述之掃描式UV-LED曝光裝置,其中,該循環週期移動環係由該主動輪與該誘導輪而形成上下兩層之水平循環週期移動結構。The scanning type UV-LED exposure apparatus according to claim 2, wherein the cycle-period moving ring is formed by the driving wheel and the inducer to form a horizontal circulation period moving structure of the upper and lower layers. 依申請專利範圍第2項所述之掃描式UV-LED曝光裝置,其中,該些托帶輪係彼此間隔設置於該循環週期移動環之內側,並與該主動輪及該誘導輪之間具有間距區隔。The scanning type UV-LED exposure apparatus according to claim 2, wherein the plurality of carrier pulleys are spaced apart from each other inside the circulation cycle moving ring, and have a relationship between the driving wheel and the induction wheel The spacing is separated. 依申請專利範圍第2項所述之掃描式UV-LED曝光裝置,其中,該主動散熱元件係可為一水冷式散熱元件或一氣冷式散熱元件。The scanning UV-LED exposure apparatus according to claim 2, wherein the active heat dissipating component is a water-cooling heat dissipating component or an air-cooling heat dissipating component. 依申請專利範圍第1項所述之掃描式UV-LED曝光裝置,其中,該發光二極體係包含一二次光學元件以及一發光二極體光源所組成。The scanning UV-LED exposure apparatus according to claim 1, wherein the light emitting diode system comprises a secondary optical component and a light emitting diode light source. 依申請專利範圍第6項所述之掃描式UV-LED曝光裝置,其中,該二次光學元件係可為透鏡或反射鏡。The scanning UV-LED exposure apparatus of claim 6, wherein the secondary optical component is a lens or a mirror. 依申請專利範圍第1項所述之掃描式UV-LED曝光裝置,其中,該UV-LED線型燈條係可為透鏡式線型燈條或反射鏡式線型燈條。The scanning UV-LED exposure apparatus according to claim 1, wherein the UV-LED linear light strip can be a lens type linear light strip or a mirror type linear light strip. 依申請專利範圍第1項所述之掃描式UV-LED曝光裝置,其中,該發光二極體陣列光源上方係可進一步設有一擴散板,該擴散板係覆蓋於各發光二極體之上方。The scanning UV-LED exposure apparatus according to the first aspect of the invention, wherein the light-emitting diode array light source is further provided with a diffusion plate, and the diffusion plate covers the light-emitting diodes. 依申請專利範圍第9項所述之掃描式UV-LED曝光裝置,其中,該擴散板係以一整片結構覆蓋於各發光二極體之上方。The scanning type UV-LED exposure apparatus according to claim 9, wherein the diffusion plate covers the respective light-emitting diodes in a one-piece structure. 依申請專利範圍第9項所述之掃描式UV-LED曝光裝置,其中,該擴散板係以一肋狀結構覆蓋於各發光二極體之上方。The scanning type UV-LED exposure apparatus according to claim 9, wherein the diffusion plate is covered with a rib structure over the respective light emitting diodes. 依申請專利範圍第9項所述之掃描式UV-LED曝光裝置,其中,該擴散板係以複數個條狀結構覆蓋於各發光二極體之上方。The scanning UV-LED exposure apparatus according to claim 9, wherein the diffusion plate covers a plurality of strips over the respective LEDs. 依申請專利範圍第9項所述之掃描式UV-LED曝光裝置,其中,該擴散板係為耐UV透光材,並可為石英或玻璃。The scanning UV-LED exposure apparatus according to claim 9, wherein the diffusion plate is a UV-resistant material and may be quartz or glass. 依申請專利範圍第1項所述之掃描式UV-LED曝光裝置,其中,該循環週期移動環於兩端點進行向上旋轉及向下旋轉時,其外側UV-LED線型燈條在向上旋轉處及向下旋轉處之各發光二極體係可進一步控制為關閉狀態。The scanning type UV-LED exposure apparatus according to claim 1, wherein the outer cycle of the UV-LED linear light bar is rotated upward when the cycle is moved upward and downward at both ends. And each of the light-emitting diode systems at the downward rotation can be further controlled to be in a closed state. 依申請專利範圍第1項所述之掃描式UV-LED曝光裝置,其中,該些UV-LED線型燈條係以平行該線性目標曝光區域之縱向軸線之方向排列。The scanning UV-LED exposure apparatus of claim 1, wherein the UV-LED linear strips are arranged in a direction parallel to a longitudinal axis of the linear target exposure area. 依申請專利範圍第1項所述之掃描式UV-LED曝光裝置,其中,該些UV-LED線型燈條中相鄰之列內之發光二極體係錯位排列。The scanning UV-LED exposure apparatus according to claim 1, wherein the light-emitting diode systems in adjacent ones of the UV-LED linear light strips are misaligned.
TW102107410A 2013-03-01 2013-03-01 Scanning UV-LED exposure device TWI529500B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW102107410A TWI529500B (en) 2013-03-01 2013-03-01 Scanning UV-LED exposure device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW102107410A TWI529500B (en) 2013-03-01 2013-03-01 Scanning UV-LED exposure device

Publications (2)

Publication Number Publication Date
TW201435512A true TW201435512A (en) 2014-09-16
TWI529500B TWI529500B (en) 2016-04-11

Family

ID=51943344

Family Applications (1)

Application Number Title Priority Date Filing Date
TW102107410A TWI529500B (en) 2013-03-01 2013-03-01 Scanning UV-LED exposure device

Country Status (1)

Country Link
TW (1) TWI529500B (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108535970A (en) * 2018-06-06 2018-09-14 广州嘉禾盛信息科技有限公司 A kind of scan-type UV exposure light source systems of dynamic calibration
TWI647542B (en) * 2015-01-30 2019-01-11 國立中央大學 Scanning exposure device
CN114257746A (en) * 2021-12-23 2022-03-29 深圳市先地图像科技有限公司 Method for exposing image by laser direct imaging equipment and related equipment

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI647542B (en) * 2015-01-30 2019-01-11 國立中央大學 Scanning exposure device
CN108535970A (en) * 2018-06-06 2018-09-14 广州嘉禾盛信息科技有限公司 A kind of scan-type UV exposure light source systems of dynamic calibration
CN114257746A (en) * 2021-12-23 2022-03-29 深圳市先地图像科技有限公司 Method for exposing image by laser direct imaging equipment and related equipment

Also Published As

Publication number Publication date
TWI529500B (en) 2016-04-11

Similar Documents

Publication Publication Date Title
CN106773549B (en) High-uniformity LED parallel light ultraviolet exposure machine light source system
TWI529500B (en) Scanning UV-LED exposure device
TW201642381A (en) Substrate handling and heating system
US11097308B2 (en) LED-UV curing dryer
CN204155062U (en) A kind of coating developing machine with exposure function
TW200947516A (en) Light irradiation apparatus
TW201502424A (en) Photoirradiation device
WO2016011689A1 (en) Ultraviolet led light source and curing packaging apparatus and method of oled device
CN102289155A (en) Photoetching machine based on ultraviolet LED (Light Emitting Diode) light source
KR101374863B1 (en) Optical for ultra violet curing machine
CN202189229U (en) Lithography machine based on ultraviolet LED light source
CN206573849U (en) UV LED/light sources, system and parallel exposing machine
CN202794849U (en) Even surface light source device for exposure machine
CN206848690U (en) A kind of high uniformity LED parallel exposing machine light-source systems
JP4946190B2 (en) LED UV irradiation device
US8809813B1 (en) Scanned UV-LED exposure device
CN101937173A (en) Exposure method of exposure machine
KR20130137378A (en) Ultra violet cure apparatus using a led
JP2010118456A (en) Ultraviolet irradiation apparatus using ultraviolet light-emitting diode
CN104076610B (en) Scan-type UV-LED exposure device
KR101460018B1 (en) Uv curing apparatus
JP2010212384A (en) Light irradiation apparatus and light irradiation method
TW201341979A (en) Exposure method
KR101595564B1 (en) Ultra violet cure apparatus using leds
CN210155510U (en) LED matrix arrangement light source that equalizes

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees