TW201418507A - Deposition apparatus and method for manufacturing organic light emitting diode display using the same - Google Patents

Deposition apparatus and method for manufacturing organic light emitting diode display using the same Download PDF

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Publication number
TW201418507A
TW201418507A TW102137060A TW102137060A TW201418507A TW 201418507 A TW201418507 A TW 201418507A TW 102137060 A TW102137060 A TW 102137060A TW 102137060 A TW102137060 A TW 102137060A TW 201418507 A TW201418507 A TW 201418507A
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deposition
substrate
deposition source
degrees
along
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TW102137060A
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Chinese (zh)
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TWI625415B (en
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Dae-Won Baek
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Samsung Display Co Ltd
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    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00Electroluminescent light sources
    • H05B33/10Apparatus or processes specially adapted to the manufacture of electroluminescent light sources

Abstract

A deposition apparatus includes a deposition source that receives a deposition material, in which the deposition source is divided into a center area and outer areas at opposite ends of the center area, respectively, along a first direction, a plurality of spray nozzles that are arranged in the first direction at one side of the deposition source and that spray the deposition material to a substrate, and a nozzle tip detachably attached to one of the plurality of spray nozzles arranged in one of the outer areas. The nozzle tip has an end cross-section that sprays the deposition material toward an outer direction of the deposition source and has an inclination angle with a surface of the substrate.

Description

沉積設備及使用其製造有機發光二極體顯示器之方法Deposition apparatus and method of manufacturing an organic light emitting diode display therewith 【0001】【0001】

在顯示裝置中,有機發光顯示器係具有廣視角、優良對比度、以及高反應速度,因此其作為下一代的顯示裝置而受到關注。Among the display devices, the organic light-emitting display has a wide viewing angle, excellent contrast, and high reaction speed, and thus has attracted attention as a next-generation display device.

【0002】【0002】

本發明係關於一種沉積設備及使用其製造有機發光二極體顯示器的方法。The present invention relates to a deposition apparatus and a method of manufacturing an organic light emitting diode display using the same.

【0003】[0003]

透過提供沉積設備可實現實施例,沉積設備 包含沉積源,用以接收沉積材料;複數個噴射噴嘴,沿著第一方向排列於沉積源的一側上並將沉積材料噴出至基板上,沉積源被沿著第一方向而分別地分成中心區域及中心區域的相對兩側的外側區域;以及噴嘴尖端,其係形成以安裝於或拆卸於排列在一外側區域中的噴射噴嘴,且當其噴嘴尖端的末端截面相對於基板的表面形成傾斜角時,其係朝向沉積源的外側方向而噴出沉積材料。Embodiments may be implemented by providing a deposition apparatus including a deposition source for receiving a deposition material; a plurality of ejection nozzles arranged along a first direction on one side of the deposition source and ejecting the deposition material onto the substrate, the deposition source An outer region that is respectively divided into a central region and opposite sides of the central region along the first direction; and a nozzle tip that is formed to be attached or detached to the ejection nozzles arranged in an outer region, and when the nozzle thereof When the tip end section forms an oblique angle with respect to the surface of the substrate, it ejects the deposition material toward the outer side of the deposition source.

【0004】[0004]

第一方向上的基板之中點可對準於第一方向上的沉積源之中點,並且沉積源的中心區域沿著第一方向可具有滿足下列條件之長度:The midpoint of the substrate in the first direction may be aligned to a midpoint of the deposition source in the first direction, and the central region of the deposition source may have a length along the first direction that satisfies the following conditions:

【0005】[0005]

在此,L1係為第一方向的中心區域之長度、L2係為第一方向的基板之沉積區域長度、T係為基板到噴射噴嘴的末端之距離、以及θ係為傾斜角。Here, L 1 is the length of the central region in the first direction, L 2 is the length of the deposition region of the substrate in the first direction, T is the distance from the substrate to the end of the ejection nozzle, and θ is the inclination angle.

【0006】[0006]

第一傾斜角可形成以包含於約43度至約53度之範圍中。第一傾斜角可形成以相對於預設角度包含於約25度至約35度之範圍中。安裝於噴射噴嘴的噴嘴尖端可沿著第一方向對稱於沉積源之中點而安裝。The first angle of inclination may be formed to be included in a range from about 43 degrees to about 53 degrees. The first angle of inclination may be formed to be included in a range from about 25 degrees to about 35 degrees with respect to the predetermined angle. The nozzle tip mounted to the spray nozzle can be mounted symmetrically about the midpoint of the deposition source along the first direction.

【0007】【0007】

實施例可藉由提供一種製造有機發光二極體(OLED)顯示器之方法而實現,包含提供沉積設備,其包含沉積源,用以接收沉積材料、及複數個噴射噴嘴,沿著第一方向排列於沉積源的一側上並將沉積材料噴出至基板上;置放基板以面對該噴射噴嘴;以及當沉積源沿著相交於第一方向的第二方向而移動時,透過噴射噴嘴朝向基板噴出沉積材料。沉積源係被個別地於第一方向而分成中心區域以及位於中心區域的相對兩側的外側區域,並且噴嘴尖端係形成以安裝於或拆卸於排列在一外側區域中的噴射噴嘴,且當於基板的表面形成傾斜角時,具有朝向沉積源的外側方向而噴出沉積材料之末端截面。Embodiments can be achieved by providing a method of fabricating an organic light emitting diode (OLED) display, comprising providing a deposition apparatus including a deposition source for receiving a deposition material, and a plurality of spray nozzles arranged in a first direction And spraying the deposition material onto the substrate; placing the substrate to face the ejection nozzle; and facing the substrate through the ejection nozzle when the deposition source moves in a second direction intersecting the first direction The deposited material is ejected. The deposition source is separately divided into a central region and an outer region on opposite sides of the central region in a first direction, and the nozzle tips are formed to be mounted or detached to the ejection nozzles arranged in an outer region, and When the surface of the substrate forms an oblique angle, it has an end section which ejects the deposition material toward the outer side of the deposition source.

【0008】[0008]

沿著第一方向上的基板之中點可準確對準於沿著第一方向上的沉積源之中點,並且沉積源的中心區域沿著該第一方向具有一長度,滿足下列條件:A point in the substrate along the first direction may be accurately aligned with a midpoint of the deposition source along the first direction, and the central region of the deposition source has a length along the first direction, satisfying the following conditions:

【0009】【0009】

在此,L1係為沿著第一方向的中心區域之長度、L2係為沿著第一方向的基板之沉積區域長度、T係為基板到噴射噴嘴的末端之距離、以及θ係為傾斜角。Here, L 1 is the length of the central region along the first direction, L 2 is the length of the deposition region of the substrate along the first direction, T is the distance from the substrate to the end of the ejection nozzle, and θ is Tilt angle.

【0010】[0010]

末端截面的傾斜角可形成以包含於約43度至約53度之範圍。末端截面的傾斜角可形成以包含於約25度至約35度之範圍。安裝於噴射噴嘴的噴嘴尖端可沿著第一方向對稱於沉積源之中點而安裝。The angle of inclination of the end section can be formed to encompass a range of from about 43 degrees to about 53 degrees. The angle of inclination of the end section can be formed to be included in the range of from about 25 degrees to about 35 degrees. The nozzle tip mounted to the spray nozzle can be mounted symmetrically about the midpoint of the deposition source along the first direction.

100...沉積源100. . . Sedimentary source

102...中心區域102. . . Central region

104a...外側區域104a. . . Outer area

104b...外側區域104b. . . Outer area

112...噴射噴嘴112. . . Spray nozzle

114a...噴射噴嘴114a. . . Spray nozzle

114b...噴射噴嘴114b. . . Spray nozzle

124a...噴嘴尖端124a. . . Nozzle tip

124b...噴嘴尖端124b. . . Nozzle tip

130a...噴嘴尖端130a. . . Nozzle tip

130b...噴嘴尖端130b. . . Nozzle tip

130c...噴嘴尖端130c. . . Nozzle tip

130d...噴嘴尖端130d. . . Nozzle tip

200...基板固定單元200. . . Substrate fixing unit

210...基板210. . . Substrate

220...沉積遮罩220. . . Deposition mask

DM...沉積材料DM. . . Deposition material

A...噴出區域A. . . Spout area

B...噴出區域B. . . Spout area

L1...中心區域長度L 1 . . . Center area length

L2...沉積區域長度L 2 . . . Deposition area length

T...距離T. . . distance

M...交點M. . . Intersection

N1...沉積區域的最外側位置N1. . . The outermost position of the deposition area

N2...沉積區域的最外側位置N2. . . The outermost position of the deposition area

P1...中心區域的最外側位置P1. . . The outermost position of the center area

P2...中心區域的最外側位置P2. . . The outermost position of the center area

t1...距離t 1 . . . distance

t2...距離t 2 . . . distance

θ...入射角θ. . . Incident angle

θ'...入射角θ'. . . Incident angle

θ"...入射角θ"...inclination angle

Φ...傾斜角Φ. . . Tilt angle

λ...角度λ. . . angle

【0011】[0011]

透過詳細地描述並參照附圖將使本發明的特徵對於所屬領域具有通常知識者細顯而易見的,其中:The features of the present invention will become apparent to those of ordinary skill in the art in the <RTIgt;

【0012】[0012]

第1圖係根據例示性實施例之沉積設備的透視圖。Figure 1 is a perspective view of a deposition apparatus in accordance with an exemplary embodiment.

【0013】[0013]

第2圖和第3圖係根據例示性實施例之沉積設備的噴射噴嘴所噴出的沉積材料之分布的示意圖。2 and 3 are schematic views showing the distribution of deposition materials ejected by the ejection nozzles of the deposition apparatus according to the exemplary embodiment.

【0014】[0014]

第4圖係根據例示性實施例之入射至基板上的沉積材料的入射角和沉積設備的噴射噴嘴之間的位置之關聯性的示意圖。4 is a schematic diagram of the correlation between the incident angle of the deposition material incident on the substrate and the position between the ejection nozzles of the deposition apparatus according to an exemplary embodiment.

【0015】[0015]

第5圖係根據例示性實施例之沉積設備之決定中心區域和外側區域的方法之示意圖。Figure 5 is a schematic illustration of a method of determining a central region and an outer region of a deposition apparatus in accordance with an exemplary embodiment.

【0016】[0016]

第6A圖至第6D圖係根據例示性實施例之沉積設備的噴嘴尖端的例示性變化。6A through 6D are exemplary variations of the nozzle tip of the deposition apparatus in accordance with an exemplary embodiment.

【0017】[0017]

在下文中,將根據例示性實施例並參照附圖說明有機發光二極體(OLED)顯示器的沉積設備及其製造方法。如本領域中具有通常知識者將意識到的,所述的實施例可以各種不同的方式修改而不背離本實施例的精神及範圍。相反地,提供本文引用之例示性實施例以使揭露的內容透徹及完整並足以將發明精神傳達給所屬領域中具通常知識者。全文中,相似參考符號標示相似元件。Hereinafter, a deposition apparatus of an organic light emitting diode (OLED) display and a method of fabricating the same will be described in accordance with an exemplary embodiment and with reference to the accompanying drawings. As will be appreciated by those skilled in the art, the described embodiments may be modified in various different ways without departing from the spirit and scope of the embodiments. Rather, the exemplary embodiments cited herein are provided to provide a thorough and complete disclosure of the invention. Throughout the text, like reference characters indicate similar elements.

【0018】[0018]

此外,除非明確地說明反例,詞彙“包含(comprise)”及其變化如“包含(comprises)”或“包含(comprising)”將理解為意指包含所述元件但不排除任何其它元件。另外,整篇說明書中,詞彙“在…上(on)”將理解為意指在目標位置上方或下方,而不必需被理解為係位於以重力位置方向為基礎的上方。In addition, the word "comprise" and variations thereof, such as "comprises" or "comprising", are to be understood to include the elements, but do not exclude any other elements. In addition, throughout the specification, the word "on" will be understood to mean above or below the target position, and need not be understood to be above the direction of the gravity position.

【0019】[0019]

第1圖係根據例示性實施例之沉積設備的透視圖。Figure 1 is a perspective view of a deposition apparatus in accordance with an exemplary embodiment.

【0020】[0020]

為了便於描述,雖然各圖式中並未顯示腔室,第1圖中之所有組成元件皆設置於真空腔室中並適當地維持腔室中的真空程度。真空腔室可根據處理的基板之形狀而具有各種形狀。舉例而言,在處理的基板具有圓形的情況下,整體的真空腔室可為圓柱狀。在處理的基板具有矩形的情況下,整體的真空腔室可為立方體。此外,在真空腔室中可進一步包含可抽出真空腔室內部氣體以降低真空腔室內部壓力的真空泵(未示出於附圖中)、將氣體注入真空腔室中以提高真空腔室內部壓力的通氣裝置(未示出於附圖中)、以及其相似裝置。For convenience of description, although the chambers are not shown in the drawings, all of the constituent elements in Fig. 1 are disposed in the vacuum chamber and appropriately maintain the degree of vacuum in the chamber. The vacuum chamber can have various shapes depending on the shape of the substrate to be processed. For example, where the treated substrate has a circular shape, the integral vacuum chamber may be cylindrical. Where the treated substrate has a rectangular shape, the overall vacuum chamber can be a cube. In addition, a vacuum pump (not shown in the drawing) that can extract the gas inside the vacuum chamber to reduce the pressure inside the vacuum chamber, and inject the gas into the vacuum chamber to increase the pressure inside the vacuum chamber may be further included in the vacuum chamber. Aeration device (not shown in the drawings), and similar devices.

【0021】[0021]

沉積源100係用於噴出沉積材料使其沉積於基板210上,並包含存放空間(未示出)用以存放沉積材料於其中,如有機材料。沉積材料的存放空間可以具有良好的熱輻射性之陶瓷材料製成,如三氧化二鋁(Al2O3)及氮化鋁,但不限於此,並且係可以具有良好之熱輻射性及熱阻抗之各種材料製成。配置以接觸並圍繞外表面的加熱器(未示出)可提供於沉積材料的存放空間之外表面,並用以加熱並蒸發被存放的沉積材料。The deposition source 100 is for ejecting a deposition material to be deposited on the substrate 210, and includes a storage space (not shown) for storing a deposition material therein, such as an organic material. The storage space of the deposited material may be made of a ceramic material having good heat radiation properties, such as aluminum oxide (Al 2 O 3 ) and aluminum nitride, but is not limited thereto, and may have good heat radiation and heat. The impedance is made of various materials. A heater (not shown) configured to contact and surround the outer surface may be provided on the outer surface of the storage space of the deposition material and used to heat and evaporate the deposited deposition material.

【0022】[0022]

沉積源100係以基板210之第一方向(y軸方向)上的一長度而延伸於第一方向。沉積源100係分為中心區域102及沿著第一方向於中心區域102兩側之外側區域104a及104b。舉例而言,外側區域104a、中心區域102、以及外側區域104b可沿著第一方向依順序排列。中心區域102的噴射噴嘴112及外側區域104a和104b的噴射噴嘴114a和114b之噴出角度,可個別決定為彼此不同,並將在後面描述之。The deposition source 100 extends in the first direction with a length in the first direction (y-axis direction) of the substrate 210. The deposition source 100 is divided into a central region 102 and outer side regions 104a and 104b on both sides of the central region 102 along the first direction. For example, the outer region 104a, the central region 102, and the outer region 104b may be sequentially arranged along the first direction. The ejection angles of the ejection nozzles 112 of the central region 102 and the ejection nozzles 114a and 114b of the outer regions 104a and 104b may be individually determined to be different from each other, and will be described later.

【0023】[0023]

噴出沉積材料的噴射噴嘴112、114a、以及114b係形成於面對基板210的沉積源100之一側上。噴射噴嘴112、114a、以及114b係以圓管狀形狀形成,並連接至沉積源100之內部空間。因此,在沉積源100的內部空間中被蒸發或昇華的沉積材料,係被噴射噴嘴112、114a、以及114b噴出至基板210上。The ejection nozzles 112, 114a, and 114b that eject the deposition material are formed on one side of the deposition source 100 facing the substrate 210. The injection nozzles 112, 114a, and 114b are formed in a circular tubular shape and connected to the internal space of the deposition source 100. Therefore, the deposition material evaporated or sublimated in the internal space of the deposition source 100 is ejected onto the substrate 210 by the ejection nozzles 112, 114a, and 114b.

【0024】[0024]

可提供及可排列複數個噴射噴嘴112、114a、以及114b於根據沿著第一方向延伸之沉積源100於一直線上。用於沉積材料的基板210可以矩形的平板形狀形成,並且在此情況下,複數個噴射噴嘴112、114a、以及114b係沿著第一方向而線性排列以平行於基板210之一邊緣。如第1圖中所示,噴射噴嘴112、114a、以及114b可排列於直線上,但不限於此。噴射噴嘴112、114a、以及114b可排列於兩個或多個直線上。A plurality of spray nozzles 112, 114a, and 114b may be provided and arranged in a line along the deposition source 100 extending along the first direction. The substrate 210 for depositing a material may be formed in a rectangular flat plate shape, and in this case, the plurality of ejection nozzles 112, 114a, and 114b are linearly arranged along the first direction to be parallel to one edge of the substrate 210. As shown in Fig. 1, the ejection nozzles 112, 114a, and 114b may be arranged on a straight line, but are not limited thereto. The spray nozzles 112, 114a, and 114b may be arranged on two or more straight lines.

【0025】[0025]

基板210係藉由基板固定單元200而固定並面對沉積源100。由於基板固定單元200穩定地固定基板210,當形成薄層於基板210上並且在完成製程後傳送基板210時,基板固定單元200具有能夠輕易地與基板210附接或拆卸的結構。基板210可沿著沉積遮罩220而固定於基板固定單元200。沉積遮罩220可用以在基板210上形成有機層之圖樣,並形成開口於有機材料的遮蔽部分之間,以使有機材料可經由開口而沉積於基板210上。由於基板固定單元200的配置可實質上與用於一般沉積設備的配置相同,其詳細描述在此省略。沿著第一方向之基板210的中心,可排列並設置以對應於沿著第一方向之沉積源100的中心。The substrate 210 is fixed by the substrate fixing unit 200 and faces the deposition source 100. Since the substrate fixing unit 200 stably fixes the substrate 210, when the thin layer is formed on the substrate 210 and the substrate 210 is transferred after the process is completed, the substrate fixing unit 200 has a structure that can be easily attached or detached from the substrate 210. The substrate 210 may be fixed to the substrate fixing unit 200 along the deposition mask 220. The deposition mask 220 may be used to form a pattern of the organic layer on the substrate 210 and to form an opening between the shielding portions of the organic material such that the organic material may be deposited on the substrate 210 via the opening. Since the configuration of the substrate fixing unit 200 can be substantially the same as that for the general deposition apparatus, a detailed description thereof will be omitted herein. The center of the substrate 210 along the first direction may be arranged and arranged to correspond to the center of the deposition source 100 along the first direction.

【0026】[0026]

當沉積源100和基板200兩者彼此相對移動時,可執行沉積。在基板210被固定的情況下,沉積源100可沿著與第一方向相交的第二方向(x軸方向)移動,以使沉積源100自基板210移動一段預設距離。當沉積源100被配置以沿垂直方向而噴出沉積材料時,基板210可被配置以平行於沉積源100,而當沉積源100被配置以沿水平方向而噴出沉積材料時,基板210可被配置以垂直於沉積源100。在例示性實施例中,當基板210係被水平配置於真空腔室中時,沉積源100係被配置於真空腔室的底表面,然而實施例係不限於此。When both the deposition source 100 and the substrate 200 are moved relative to each other, deposition can be performed. In the case where the substrate 210 is fixed, the deposition source 100 may move in a second direction (x-axis direction) intersecting the first direction to move the deposition source 100 from the substrate 210 by a predetermined distance. When the deposition source 100 is configured to eject the deposition material in the vertical direction, the substrate 210 may be configured to be parallel to the deposition source 100, and when the deposition source 100 is configured to eject the deposition material in the horizontal direction, the substrate 210 may be configured To be perpendicular to the deposition source 100. In an exemplary embodiment, when the substrate 210 is horizontally disposed in the vacuum chamber, the deposition source 100 is disposed on the bottom surface of the vacuum chamber, however the embodiment is not limited thereto.

【0027】[0027]

噴射噴嘴114a和114b係配置於各外側區域104a和104b中並包含噴嘴尖端124a和124b以個別控制沉積材料的噴出方向。噴嘴尖端124a和124b係形成以個別安裝於或拆卸於噴射噴嘴114a和114b,例如,噴嘴尖端124a和124b係可拆卸地個別附接至噴射噴嘴114a和114b。當噴嘴尖端124a和124b係配置與在第一方向上之基板210的表面形成傾斜角時,其末端截面係朝向沉積源100的外側方向延伸而噴出沉積材料。舉例而言,傾斜角可形成以相對於平行基板210之表面的平面。Spray nozzles 114a and 114b are disposed in each of the outer regions 104a and 104b and include nozzle tips 124a and 124b to individually control the discharge direction of the deposited material. Nozzle tips 124a and 124b are formed to be individually mounted or detached to the spray nozzles 114a and 114b, for example, the nozzle tips 124a and 124b are detachably individually attached to the spray nozzles 114a and 114b. When the nozzle tips 124a and 124b are disposed to form an oblique angle with the surface of the substrate 210 in the first direction, the end section thereof extends toward the outer side of the deposition source 100 to eject the deposition material. For example, the tilt angle may be formed in a plane relative to the surface of the parallel substrate 210.

【0028】[0028]

在說明噴射噴嘴的噴出方向之前,將說明從噴射噴嘴噴出的沉積材料的分布。Before explaining the ejection direction of the ejection nozzle, the distribution of the deposition material ejected from the ejection nozzle will be explained.

【0029】[0029]

第2圖和第3圖係根據例示性實施例之沉積設備的噴射噴嘴噴出沉積材料之分布的示意圖。為了方便和清楚地說明,將省略基板210附近的沉積遮罩220。2 and 3 are schematic views showing the distribution of the deposition material of the ejection nozzle of the deposition apparatus according to the exemplary embodiment. The deposition mask 220 in the vicinity of the substrate 210 will be omitted for convenience and clarity of explanation.

【0030】[0030]

沉積材料DM從噴射噴嘴112、114a、以及114b噴出於真空中,因此,如第2圖中所示,沉積材料DM以相對於噴射噴嘴112、114a、以及114b的末端截面約0度至90度的角度而分布於非特定的方向,亦即,前側的所有方向。舉例而言,如第2圖中所示,沉積材料DM可不分區域地以約0度至90度之角度從具有末端截面之末端形狀之噴射噴嘴而噴出。舉例而言,末端截面可實質上平行於基板210而不具有相對於基板210的傾斜角。The deposition material DM is ejected from the ejection nozzles 112, 114a, and 114b into the vacuum, and therefore, as shown in Fig. 2, the deposition material DM is about 0 to 90 degrees with respect to the end sections of the ejection nozzles 112, 114a, and 114b. The angles are distributed in a non-specific direction, that is, all directions of the front side. For example, as shown in FIG. 2, the deposition material DM may be ejected from the ejection nozzle having the end shape of the end section at an angle of about 0 to 90 degrees, without division. For example, the end section can be substantially parallel to the substrate 210 without having an angle of inclination relative to the substrate 210.

【0031】[0031]

因此,在噴射噴嘴112、114a、以及114b的形成過程中,可考量噴射噴嘴112、114a、以及114b的末端截面之角度。若沉積材料DM所噴出的噴出區域係根據沉積材料DM的噴出角度和分布比例而分成噴出區域A和噴出區域B,則提供表1如下。Therefore, in the formation of the injection nozzles 112, 114a, and 114b, the angles of the end sections of the injection nozzles 112, 114a, and 114b can be considered. If the discharge area ejected by the deposition material DM is divided into the ejection area A and the ejection area B in accordance with the ejection angle and distribution ratio of the deposition material DM, Table 1 is provided as follows.

【0032】[0032]

表1Table 1

【0033】[0033]

當噴出角度從0度開始增加,沉積材料的沉積量也隨之增加,且當噴出角度係90度時,沉積量係為最大值。噴出角度約為18度時沉積材料係急遽增加,例如,朝向基板210的沉積材料量於噴射角度約為18度時係大於噴射角度小於18度時。噴出區域A係具有相對於噴射噴嘴112、114a、以及114b的末端截面的噴出角度為0度至18度的區域,而噴出區域B係具有噴出角度為18度至90度的區域。When the ejection angle increases from 0 degrees, the deposition amount of the deposition material also increases, and when the ejection angle is 90 degrees, the deposition amount is the maximum value. The deposition material is rapidly increased at a discharge angle of about 18 degrees, for example, the amount of deposition material toward the substrate 210 is greater than the ejection angle of less than 18 degrees at an ejection angle of about 18 degrees. The discharge area A has a discharge angle of 0 to 18 degrees with respect to the end cross section of the injection nozzles 112, 114a, and 114b, and the discharge area B has a discharge angle of 18 to 90 degrees.

【0034】[0034]

分布在噴出區域A中的沉積材料DM對應於從噴射噴嘴112、114a、114b噴出的沉積材料DM的比例,係為0.054%。在此情況下,沉積材料DM所具有對應噴出區域A的噴出角度所造成的影響對基板210而言係相對小的。The ratio of the deposition material DM distributed in the ejection area A to the deposition material DM ejected from the ejection nozzles 112, 114a, 114b is 0.054%. In this case, the influence of the deposition material DM having a discharge angle corresponding to the discharge area A is relatively small for the substrate 210.

【0035】[0035]

另一方面,具有對應噴出區域B的噴出角度的沉積材料DM係主要沉積於基板210上,使得具有18度至90度為噴出角度所對應的噴出區域B係被定義為有效噴出區域。有效噴出區域並不限於此,並可根據沉積材料的種類而改變。透過考量對應噴出區域A的角度λ,決定用於基板210的噴射噴嘴112、114a、114b的末端截面之角度將在後面敘述 。On the other hand, the deposition material DM having the discharge angle corresponding to the discharge area B is mainly deposited on the substrate 210 such that the discharge area B corresponding to the discharge angle of 18 to 90 degrees is defined as the effective discharge area. The effective ejection area is not limited thereto and may vary depending on the kind of the deposition material. The angle of the end cross section of the injection nozzles 112, 114a, and 114b for the substrate 210 is determined by considering the angle λ corresponding to the discharge area A, which will be described later.

【0036】[0036]

第4圖係為說明根據例示性實施例之入射到基板上的沉積材料的入射角和沉積設備中噴射噴嘴的位置之間的關聯性的示意圖。4 is a schematic diagram illustrating the correlation between the incident angle of the deposition material incident on the substrate and the position of the ejection nozzle in the deposition apparatus according to an exemplary embodiment.

【0037】[0037]

當沉積材料係沉積於基板210上時,沉積材料係被射入而形成預設角度(θ)(例如,預設的最小角度)於基板210,例如,參照於第一方向。在此情況下,沉積材料的最小入射角係考量,例如,基板210和沉積源100之間的距離、基板210的尺寸、以及沉積量而決定。舉例而言,最小入射角的角度係可被決定在約43度至53度的範圍中。When the deposition material is deposited on the substrate 210, the deposition material is incident to form a predetermined angle (θ) (eg, a predetermined minimum angle) to the substrate 210, for example, with reference to the first direction. In this case, the minimum incident angle of the deposited material is determined, for example, the distance between the substrate 210 and the deposition source 100, the size of the substrate 210, and the amount of deposition. For example, the angle of the minimum angle of incidence can be determined to be in the range of about 43 degrees to 53 degrees.

【0038】[0038]

當沉積材料的最小入射角係大於或等於約43度時,可避免沉積材料滲透於沉積遮罩220和基板210之間的陰影現象。當最小角度小於或等於約53度時,其係具有足夠多射入的沉積材料量以使沉積效率可提升及/或維持。除非另有特別聲明,入射角度及與此有關的角度係參照第一方向而決定。When the minimum incident angle of the deposited material is greater than or equal to about 43 degrees, the phenomenon of shadowing of the deposited material between the deposition mask 220 and the substrate 210 can be avoided. When the minimum angle is less than or equal to about 53 degrees, it has a sufficient amount of deposited material to increase and/or maintain deposition efficiency. Unless otherwise stated, the angle of incidence and the angle associated therewith are determined with reference to the first direction.

【0039】[0039]

當具有沉積材料以預定厚度沉積於基板210上的區域被稱作為沉積區域時,沉積區域在第一方向(y軸方向)具有最外側位置N1和N2,如第4圖中所示。若沉積材料的最小入射角被稱作為θ,當具有相對於最小入射角的傾斜角θ的任意線延伸於位置N1時,任意線與沉積源100相交於位置P2。並且,同理於位置N2,當具有傾斜角θ之任意線延伸時,任意線與沉積源100相交於位置P1。位置P1和P2之間的區域稱作為中心區域102,並且確定於位置P1外側之區域和確定於位置P2外側之區域稱作為外側區域104a和104b。When a region having a deposition material deposited on the substrate 210 with a predetermined thickness is referred to as a deposition region, the deposition region has outermost positions N1 and N2 in the first direction (y-axis direction) as shown in FIG. If the minimum incident angle of the deposited material is referred to as θ, when any line having an inclination angle θ with respect to the minimum incident angle extends at the position N1, any line intersects the deposition source 100 at the position P2. And, similarly to the position N2, when any line having the inclination angle θ extends, the arbitrary line intersects the deposition source 100 at the position P1. The area between the positions P1 and P2 is referred to as the center area 102, and the area determined outside the position P1 and the area determined outside the position P2 are referred to as the outer areas 104a and 104b.

【0040】[0040]

形成於中心區域102的噴射噴嘴112可噴出沉積材料的入射角度係大於或等於位置N1和N2之間的沉積區域之任何位置的最小入射角θ。換言之,形成於外側區域104a和104b的噴射噴嘴114a和114b被決定而在位置P1和P2的外側而具有入射角θ’和θ”,其係小於預設的最小入射角θ,如第4圖中所示。The injection nozzle 112 formed in the central region 102 can eject a minimum angle of incidence θ of the deposition material at an incident angle that is greater than or equal to any position of the deposition region between the positions N1 and N2. In other words, the ejection nozzles 114a and 114b formed in the outer regions 104a and 104b are determined to have the incident angles θ' and θ" outside the positions P1 and P2, which are smaller than the preset minimum incident angle θ, as shown in FIG. Shown in .

【0041】[0041]

因此,可控制從配置在外側區域104a和104b中的噴射噴嘴114a和114b所噴出的沉積材料的入射角。如上所述,由於沉積材料在末端截面之前側的所有方向噴出,如第3圖所示,在噴射噴嘴的末端截面和基板210之間的傾斜角(Φ)成為沉積材料入射至基板210上的入射角(θ)。因此,設置於外側區域104a和104b的噴射噴嘴114a和114b係設置以具有朝向沉積源100的外側方向的末端截面。Therefore, the incident angle of the deposition material ejected from the ejection nozzles 114a and 114b disposed in the outer regions 104a and 104b can be controlled. As described above, since the deposition material is ejected in all directions on the side before the end section, as shown in Fig. 3, the inclination angle (Φ) between the end section of the ejection nozzle and the substrate 210 becomes incident on the substrate 210 on the deposition material. Incidence angle (θ). Therefore, the ejection nozzles 114a and 114b provided to the outer regions 104a and 104b are disposed to have an end section toward the outer side of the deposition source 100.

【0042】[0042]

例如,當被決定的入射角(θ)被包含在約43度至約53度的範圍內時,噴射噴嘴的末端截面可與基板210的表面形成傾斜角(Φ)(例如,平行於基板210之表面的平面)而被包含在約43度至約53度的範圍內。同時,若考量對應於噴出區域A的18度之角度(λ),噴射噴嘴的末端截面與基板210的表面可形成的傾斜角被包含於範圍約25度至35度。For example, when the determined incident angle (θ) is included in the range of about 43 degrees to about 53 degrees, the end section of the ejection nozzle may form an oblique angle (Φ) with the surface of the substrate 210 (eg, parallel to the substrate 210). The plane of the surface is included in the range of about 43 degrees to about 53 degrees. Meanwhile, if an angle (λ) corresponding to 18 degrees of the ejection area A is considered, the inclination angle at which the end section of the ejection nozzle and the surface of the substrate 210 can be formed is included in the range of about 25 to 35 degrees.

【0043】[0043]

現在將描述決定中心區域102和外側區域104a和104b的沉積源100的大小的方法。第5圖係在根據例示性實施例的沉積設備中,決定其中心區域和外側區域的方法之示意圖。A method of determining the size of the deposition source 100 of the central region 102 and the outer regions 104a and 104b will now be described. Fig. 5 is a schematic view showing a method of determining a central region and an outer region in a deposition apparatus according to an exemplary embodiment.

【0044】[0044]

基板210和沉積源100被定位為在第一方向上的基板210之中點和在第一方向上的沉積源100之中點係被對準。此外,當在第一方向上的中心區域102的長度被稱為L1、在第一方向上的基板210的預設沉積區域的長度被稱為L2、基板210和噴射噴嘴的末端之間的距離被稱為T、預設的入射角被稱為θ、線段N2P1和線段N1P2的交點被稱為M(或可對應於從具有傾斜角(Φ)的噴射噴嘴之末端截面延伸的線段之交點)、交點M和噴射噴嘴的末端之間的距離被稱為為t1、以及交點M和基板210之間的距離被稱為t2時、其中的關係式可表示如下。The substrate 210 and the deposition source 100 are positioned such that a point in the substrate 210 in the first direction and a point in the deposition source 100 in the first direction are aligned. Further, when the length of the central region 102 in the first direction is referred to as L 1 , the length of the predetermined deposition region of the substrate 210 in the first direction is referred to as L 2 , the substrate 210, and the end of the ejection nozzle The distance called T, the preset incident angle is called θ, the intersection of the line segment N2P1 and the line segment N1P2 is called M (or may correspond to a line segment extending from the end section of the injection nozzle having the inclination angle (Φ) The distance between the intersection point, the intersection M, and the end of the ejection nozzle is referred to as t 1 , and the distance between the intersection M and the substrate 210 is referred to as t 2 , and the relationship therein can be expressed as follows.

【0045】[0045]

(方程式1)(Equation 1)

【0046】[0046]

由於t1+ t2= T,若t1= T- t2並代入至方程式1,方程式2可表示如下。Since t 1 + t 2 = T, if t 1 = T - t 2 and substituted into Equation 1, Equation 2 can be expressed as follows.

【0047】[0047]

(方程式2)(Equation 2)

【0048】[0048]

參考第5圖式,t2可由方程式13而表示之。Referring to Figure 5, t 2 can be represented by Equation 13.

【0049】[0049]

(方程式3)(Equation 3)

【0050】[0050]

若將方程式3代入至方程式2,方程式4可表示如下。If Equation 3 is substituted into Equation 2, Equation 4 can be expressed as follows.

【0051】[0051]

(方程式4)(Equation 4)

【0052】[0052]

其係,在第一方向上的中心區域102的長度L1可以相關於預設之傾斜角(θ)、基板210和噴射噴嘴112、114a、以及114b之間的距離(T)、以及基板210的沉積區域長度L 2 的關係方程式而表示之。The length L 1 of the central region 102 in the first direction may be related to a predetermined tilt angle (θ), a distance (T) between the substrate 210 and the ejection nozzles 112, 114a, and 114b, and the substrate 210 The relationship between the deposition zone length L 2 and the equation is expressed.

【0053】[0053]

對應於長度L1部分的剩餘部分,在中心區域102的相對兩側上,在第一方向上的沉積源100個別變成外側區域104a和104b。L 1 corresponding to the remaining portion of the length of the portion, on opposite sides of the central region 102, the deposition source 100 in a first direction into an outer region 104a and individual 104b.

【0054】[0054]

第6A圖至第6D圖係根據例示性實施例之沉積設備的例示性變化之噴嘴尖端的視圖。例如,第6A圖至第6D圖中的噴嘴尖端係可拆卸地附接至噴射噴嘴114a和114b中的其一。第6A圖至第6D圖中的噴嘴尖端可被排除於噴射噴嘴112上,例如,其可包含實質上平行於第一方向的末端截面。6A through 6D are views of nozzle tips of an exemplary variation of a deposition apparatus in accordance with an exemplary embodiment. For example, the nozzle tips in FIGS. 6A to 6D are detachably attached to one of the spray nozzles 114a and 114b. The nozzle tip in Figures 6A-6D can be excluded from the spray nozzle 112, for example, it can comprise an end section that is substantially parallel to the first direction.

【0055】[0055]

如第6A圖中所示,對於噴嘴尖端130a而言,噴出沉積材料的末端截面可與基板210之表面具有傾斜角(θ)(相對於第一方向)。如第6B圖中所示,噴嘴尖端130b可不對稱地阻擋噴射噴嘴的一部分且可具有一個表面以形成垂直於末端截面。 如第6C圖中所示,噴嘴尖端130c可包圍噴射孔的一部分使其末端的形狀可不對稱地形成。對於在第6B圖和第6C圖中所示的噴嘴尖端130b和130c而言,在第一方向上延伸假想線接觸於末端端點,並且其假想線可與基板210之表面具有傾斜角(θ)。另外,如第6D圖中所示,噴嘴尖端130d可與基板210之表面具有傾斜角(θ),同時減少在噴出方向的末端截面。 噴嘴尖端並不限於這些實施例,並且即使噴嘴尖端的形狀係不同的,若噴嘴尖端的末端截面之角度係在第一方向上係傾斜,噴嘴尖端可以各種方式改變並實現。As shown in FIG. 6A, for the nozzle tip 130a, the end section of the discharge deposition material may have an inclination angle (θ) (relative to the first direction) from the surface of the substrate 210. As shown in FIG. 6B, the nozzle tip 130b can asymmetrically block a portion of the spray nozzle and can have a surface to form a cross section perpendicular to the end. As shown in Fig. 6C, the nozzle tip 130c may surround a portion of the injection hole such that the shape of the end thereof may be asymmetrically formed. For the nozzle tips 130b and 130c shown in FIGS. 6B and 6C, the imaginary line extending in the first direction is in contact with the end point, and the imaginary line may have an oblique angle with the surface of the substrate 210 (θ ). Further, as shown in FIG. 6D, the nozzle tip 130d may have an inclination angle (θ) with the surface of the substrate 210 while reducing the end section in the ejection direction. The nozzle tip is not limited to these embodiments, and even if the shape of the nozzle tip is different, if the angle of the end section of the nozzle tip is inclined in the first direction, the nozzle tip can be changed and realized in various ways.

【0056】[0056]

接著,參照附圖,將進行說明根據例示性實施例之沉積設備的操作和有機發光二極體(OLED)顯示器的製造方法。Next, an operation of a deposition apparatus and a method of manufacturing an organic light emitting diode (OLED) display according to an exemplary embodiment will be made with reference to the accompanying drawings.

【0057】[0057]

首先,基板210係被插入至真空腔室中(未示出),且基板210係被配置以相對於噴出沉積材料的沉積源100。此時,沉積源100和基板210之間的距離係控制了沉積材料的預設入射角(θ)。基板210可被配置以滿足方程式4。First, the substrate 210 is inserted into a vacuum chamber (not shown), and the substrate 210 is configured to be opposite to the deposition source 100 that ejects the deposition material. At this time, the distance between the deposition source 100 and the substrate 210 controls the preset incident angle (θ) of the deposition material. The substrate 210 can be configured to satisfy Equation 4.

【0058】[0058]

通過噴射噴嘴112、114a、以及114b而噴出沉積材料,同時沉積源100係沿著相交第一方向的第二方向(x軸方向)而移動。噴射噴嘴114a和114b排列於外側區域並以傾斜角θ沿著第一方向而噴出沉積材料,如第5圖中所示,並且沉積材料可以大於或等於傾斜角的入射角θ而附著至基板210。The deposition material is ejected by the ejection nozzles 112, 114a, and 114b while the deposition source 100 moves in the second direction (x-axis direction) intersecting the first direction. The ejection nozzles 114a and 114b are arranged in the outer region and eject the deposition material along the first direction at the inclination angle θ as shown in FIG. 5, and the deposition material may be attached to the substrate 210 at an incident angle θ greater than or equal to the inclination angle. .

【0059】[0059]

這種沉積材料可係有機發光二極體(OLED)顯示器中的有機發射層,例如,有機材料形成子像素呈現R(紅)、G(綠)、以及B(藍)。Such a deposition material may be an organic emission layer in an organic light emitting diode (OLED) display, for example, an organic material forming sub-pixel exhibiting R (red), G (green), and B (blue).

【0060】[0060]

透過總結和檢討,有機發光顯示器可具有一種結構,其中發射層插入陽極和陰極之間並從發光層中的陽極和陰極而發射的電子和電洞的重新組合而產生發光之理論以實現顏色。然而,此結構無法獲得高效率的發光,因此中間層諸如電子注入層(EIL)、電子運輸層(ETL)、電洞運輸層(HTL)、以及/或電洞注入層(HIL)可選擇性地附加而插入各電極和發射層之間。By summarizing and reviewing, an organic light emitting display can have a structure in which an emissive layer is inserted between an anode and a cathode and recombined with electrons and holes emitted from an anode and a cathode in the light emitting layer to produce a theory of luminescence to achieve color. However, this structure cannot obtain high-efficiency luminescence, and thus an intermediate layer such as an electron injection layer (EIL), an electron transport layer (ETL), a hole transport layer (HTL), and/or a hole injection layer (HIL) can be selectively selected. It is additionally inserted between each electrode and the emission layer.

【0061】[0061]

在平板顯示器中,諸如有機發光二極體(OLED)顯示器,係使用真空沉積法以沉積各種層。因此,藉由在真空環境中沉積相應的材料,用作有機材料或電極的材料形成薄膜於平板上。根據真空沉積法,具有機薄膜形成於其上的基板係設置在真空腔室中,具有與形成的薄膜之圖案相同的圖案的精密金屬遮罩(FMM)附著其上,並利用沉積源單元使有機材料被蒸發或昇華從而沉積於基板上。In flat panel displays, such as organic light emitting diode (OLED) displays, vacuum deposition is used to deposit various layers. Therefore, a film is formed on the flat plate by using a material used as an organic material or an electrode by depositing a corresponding material in a vacuum environment. According to the vacuum deposition method, a substrate having a machine film formed thereon is disposed in a vacuum chamber, and a precision metal mask (FMM) having the same pattern as that of the formed film is attached thereto, and is deposited by a deposition source unit The organic material is evaporated or sublimed to be deposited on the substrate.

【0062】[0062]

然而,當沉積材料被噴出並接觸至基板,可能因有機材料滲透於沉積遮罩和基板之間而產生陰影現象。However, when the deposited material is ejected and contacts the substrate, a shadow phenomenon may occur due to the penetration of the organic material between the deposition mask and the substrate.

【0063】[0063]

相反地,實施例係相關一種沉積設備,以及使用其製造有機發光二極體顯示器的方法,其中噴出沉積材料的角度係被控制以減少陰影現象的發生率和/或避免之。實施例係相關於一種沉積設備,其增加沉積材料入射到基板上的入射角。此外,實施例係相關於一種有機發光二極體(OLED)顯示器的製造方法,其係增加沉積均勻性和沉積效率。Rather, embodiments are related to a deposition apparatus, and a method of using the same to fabricate an organic light emitting diode display, wherein the angle at which the deposited material is ejected is controlled to reduce the incidence of shadowing and/or to avoid it. Embodiments are related to a deposition apparatus that increases the angle of incidence of a deposited material onto a substrate. Further, the embodiments relate to a method of fabricating an organic light emitting diode (OLED) display, which increases deposition uniformity and deposition efficiency.

【0064】[0064]

根據例示性實施例,透過增加沉積材料入射到基板上的入射角,可抑制沉積材料滲透於沉積遮罩和基板之間而產生的陰影現象,可減少沉積餘量(margin),並且可增加沉積均勻性和沉積效率。因此,可容易地實現高解析度的有機發光二極體(OLED)顯示器。According to an exemplary embodiment, by increasing an incident angle of the deposition material incident on the substrate, a shadow phenomenon generated by the deposition material interposing between the deposition mask and the substrate can be suppressed, the deposition margin can be reduced, and deposition can be increased. Uniformity and deposition efficiency. Therefore, a high-resolution organic light-emitting diode (OLED) display can be easily realized.

【0065】[0065]

雖然本公開已描述了目前被認為係可實行的例示性實施例,但應理解實施例並不限於本公開之例示性實施例,但與之相反地,其意在涵蓋包含餘所附申請專利範圍中之精神和範圍之各式修改和等效設置。Although the present disclosure has been described as illustrative embodiments that are currently considered to be practicable, it is understood that the embodiments are not limited to the illustrative embodiments of the present disclosure, but are instead intended to cover Various modifications and equivalent settings of the spirit and scope of the scope.

100...沉積源100. . . Sedimentary source

102...中心區域102. . . Central region

104a...外側區域104a. . . Outer area

104b...外側區域104b. . . Outer area

112...噴射噴嘴112. . . Spray nozzle

114a...噴射噴嘴114a. . . Spray nozzle

114b...噴射噴嘴114b. . . Spray nozzle

124a...噴嘴尖端124a. . . Nozzle tip

124b...噴嘴尖端124b. . . Nozzle tip

200...基板固定單元200. . . Substrate fixing unit

210...基板210. . . Substrate

220...沉積遮罩220. . . Deposition mask

Claims (10)

【第1項】[Item 1] 一種沉積設備,其包含:
一沉積源,用以接收一沉積材料,該沉積源被沿著一第一方向而分別地分成一中心區域以及位於該中心區域的相對兩側之二外側區域;
複數個噴射噴嘴,沿著該第一方向排列於該沉積源的一側上並將該沉積材料噴出至一基板上;以及
一噴嘴尖端,其係可拆卸地安裝至排列於該外側區域其中之一中的該複數個噴射噴嘴之其中之一上,該噴嘴尖端的末端截面係朝向該沉積源的外側方向並噴出該沉積材料且其具有相對於該基板的表面的一傾斜角。
A deposition apparatus comprising:
a deposition source for receiving a deposition material, the deposition source being separately divided into a central region along a first direction and two outer regions on opposite sides of the central region;
a plurality of spray nozzles arranged on one side of the deposition source along the first direction and ejecting the deposition material onto a substrate; and a nozzle tip detachably mounted to the outer region In one of the plurality of spray nozzles, the tip end of the nozzle tip is oriented toward the outside of the deposition source and ejects the deposition material and has an oblique angle with respect to the surface of the substrate.
【第2項】[Item 2] 如申請專利範圍第1項所述之沉積設備,其中:
於該第一方向上的該基板之中點係對準於該第一方向上的該沉積源之中點,以及
該沉積源的該中心區域沿著該第一方向具有滿足下列條件之長度:

其中L1係為沿著該第一方向的該中心區域之長度、L2係為沿著該第一方向的該基板之沉積區域長度、T係為該基板到該複數個噴射噴嘴的末端之距離、以及θ係為該傾斜角。
The deposition apparatus of claim 1, wherein:
A point in the substrate in the first direction is aligned with a midpoint of the deposition source in the first direction, and the central region of the deposition source has a length along the first direction that satisfies the following conditions:

Wherein L 1 is the length of the central region along the first direction, L 2 is the length of the deposition region of the substrate along the first direction, and T is the end of the substrate to the plurality of ejection nozzles. The distance and the θ system are the inclination angles.
【第3項】[Item 3] 如申請專利範圍第1項所述之沉積設備,其中該傾斜角係形成以包含於約43度至約53度之範圍。The deposition apparatus of claim 1, wherein the tilt angle is formed to be included in a range from about 43 degrees to about 53 degrees. 【第4項】[Item 4] 如申請專利範圍第1項所述之沉積設備,其中該傾斜角係形成以包含於相對於一預設角度之約25度至約35度的範圍中。The deposition apparatus of claim 1, wherein the tilt angle is formed to be included in a range of about 25 degrees to about 35 degrees with respect to a predetermined angle. 【第5項】[Item 5] 如申請專利範圍第1項所述之沉積設備,其中該噴嘴尖端係安裝該複數個噴射噴嘴之其中之一上以沿著該第一方向而對稱於該沉積源之中點 。The deposition apparatus of claim 1, wherein the nozzle tip is mounted on one of the plurality of injection nozzles to be symmetric with respect to a midpoint of the deposition source along the first direction. 【第6項】[Item 6] 一種製造有機發光二極體(OLED)顯示器的方法,該方法包含:
提供一沉積設備,該沉積設備包含用以接收一沉積材料之一沉積源、以及複數個噴射噴嘴,其係沿著一第一方向排列於該沉積源的一側上並將該沉積材料噴出至一基板上;
置放該基板以面對該複數個噴射噴嘴;以及
當沿著相交於該第一方向的一第二方向而移動該沉積源時,透過該複數個噴射噴嘴噴出該沉積材料,其中:
該沉積源係被個別地分成一中心區域以及位於該中心區域的相對兩側之二外側區域,以及
一噴嘴尖端係可拆卸地安裝至排列於該外側區域之其中之一中的該複數個噴射噴嘴之其中之一上,該噴嘴尖端的末端截面係朝向該沉積源的外側方向並噴出該沉積材料,且其具有相對於該基板的表面之一傾斜角。
A method of fabricating an organic light emitting diode (OLED) display, the method comprising:
Providing a deposition apparatus including a deposition source for receiving a deposition material, and a plurality of ejection nozzles arranged on a side of the deposition source along a first direction and ejecting the deposition material to On a substrate;
Positioning the substrate to face the plurality of ejection nozzles; and ejecting the deposition material through the plurality of ejection nozzles when moving the deposition source along a second direction intersecting the first direction, wherein:
The deposition source is individually divided into a central region and two outer regions on opposite sides of the central region, and a nozzle tip is detachably mounted to the plurality of jets arranged in one of the outer regions On one of the nozzles, the tip end of the nozzle tip is oriented toward the outside of the deposition source and ejects the deposition material, and it has an inclination angle with respect to one of the surfaces of the substrate.
【第7項】[Item 7] 如申請專利範圍第6項所述之方法,其中:
該第一方向上的該基板之中點係對準於該第一方向上的該沉積源之中點、以及
該沉積源的該中心區域於該第一方向具有滿足下列條件之長度:


其中L1係為沿著該第一方向的該中心區域之長度、L2係為沿著該第一方向的該基板之沉積區域長度、T係為該基板到該複數個噴射噴嘴的末端之距離、以及θ係為該傾斜角。
The method of claim 6, wherein:
A point in the substrate in the first direction is aligned with a midpoint of the deposition source in the first direction, and the central region of the deposition source has a length in the first direction that satisfies the following conditions:


Wherein L 1 is the length of the central region along the first direction, L 2 is the length of the deposition region of the substrate along the first direction, and T is the end of the substrate to the plurality of ejection nozzles. The distance and the θ system are the inclination angles.
【第8項】[Item 8] 如申請專利範圍第6項所述之方法,其中該傾斜角係形成以包含於約43度至約53度之範圍。The method of claim 6, wherein the tilt angle is formed to be included in a range from about 43 degrees to about 53 degrees. 【第9項】[Item 9] 如申請專利範圍第6項所述之方法,其中該傾斜角係形成以包含於相對於一預設角度之約25度至約35度的範圍中。The method of claim 6, wherein the tilt angle is formed to be included in a range from about 25 degrees to about 35 degrees with respect to a predetermined angle. 【第10項】[Item 10] 如申請專利範圍第6項所述之方法,其中該噴嘴尖端係安裝至該複數個噴射噴嘴之其一上以沿著該第一方向而對稱於該沉積源之中點 。The method of claim 6, wherein the nozzle tip is mounted to one of the plurality of spray nozzles to be symmetric with respect to a midpoint of the deposition source along the first direction.
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