TW201416648A - Spectrometer and optical module thereof - Google Patents

Spectrometer and optical module thereof Download PDF

Info

Publication number
TW201416648A
TW201416648A TW101138242A TW101138242A TW201416648A TW 201416648 A TW201416648 A TW 201416648A TW 101138242 A TW101138242 A TW 101138242A TW 101138242 A TW101138242 A TW 101138242A TW 201416648 A TW201416648 A TW 201416648A
Authority
TW
Taiwan
Prior art keywords
light
optical waveguide
spectrometer
plane
disposed
Prior art date
Application number
TW101138242A
Other languages
Chinese (zh)
Other versions
TWI457549B (en
Inventor
Shih-Hung Chien
Jyh-Jau Chen
Meng-Hua Wang
Original Assignee
Oto Photonics Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oto Photonics Inc filed Critical Oto Photonics Inc
Priority to TW101138242A priority Critical patent/TWI457549B/en
Publication of TW201416648A publication Critical patent/TW201416648A/en
Application granted granted Critical
Publication of TWI457549B publication Critical patent/TWI457549B/en

Links

Abstract

A spectrometer includes an optical module and a photo sensor. The optical module includes a base, a first waveguide, a second waveguide, and a diffraction grating. The base includes a carrying part and a plurality of spacing parts connected to the carrying part. The carrying part has a bearing surface. The spacing parts are located around the carrying part. The first waveguide is disposed between the second waveguide and the bearing surface, and the spacing parts support the second waveguide to form a gap passage for transporting a signal light. The diffraction grating is located above the bear surface and disperses the signal light. The photo sensor receives spectrum light.

Description

光譜儀及其光機 Spectrometer and its optical machine

本發明有關於一種光學設備,且特別是有關於一種光譜儀及其光機。 This invention relates to an optical device, and more particularly to a spectrometer and its optomechanical machine.

光譜儀(spectrometer)是一種能將光線分光(disperse)的科學儀器,而目前有些光譜儀包括二塊能反射光線的光波導(waveguide)以及具備分光功能的光柵(grating)。當待測的訊號光進入光譜儀之後,訊號光會在這些光波導之間反射,並且傳遞至光柵,以使光柵能將訊號光分光。 A spectrometer is a scientific instrument that can disperse light. Currently, some spectrometers include two optical waveguides that reflect light and a grating with spectroscopic function. After the signal light to be measured enters the spectrometer, the signal light is reflected between the optical waveguides and transmitted to the grating so that the grating can split the signal light.

圖1為習知一種光譜儀的剖面示意圖。請參閱圖1,習知的光譜儀100包括一對光波導140、160、多根螺絲110以及多片螺絲墊片130。這些光波導140與160透過這些螺絲110而組裝在一起,而這些螺絲墊片130配置在這些光波導140與160之間,並且分別被這些螺絲110所穿透。 1 is a schematic cross-sectional view of a conventional spectrometer. Referring to FIG. 1, a conventional spectrometer 100 includes a pair of optical waveguides 140, 160, a plurality of screws 110, and a plurality of screw spacers 130. These optical waveguides 140 and 160 are assembled by these screws 110, and these screw spacers 130 are disposed between the optical waveguides 140 and 160 and are respectively penetrated by the screws 110.

這些螺絲墊片130支撐上方的光波導160,以在這些光波導140與160之間形成一條狹縫150。光波導140與160分別具有反射平面140a與160a,其中反射平面140a與160a能反射光線,並且彼此面對面,而狹縫150則形成在反射平面140a與160a之間。如此,反射平面140a與160a能反射訊號光以及分光後的譜線光,以使訊號光與譜線光能在狹縫150中傳遞。 These screw spacers 130 support the upper optical waveguide 160 to form a slit 150 between these optical waveguides 140 and 160. The optical waveguides 140 and 160 have reflective planes 140a and 160a, respectively, wherein the reflective planes 140a and 160a are capable of reflecting light and face each other, and the slits 150 are formed between the reflective planes 140a and 160a. In this way, the reflection planes 140a and 160a can reflect the signal light and the spectral line light after the splitting, so that the signal light and the spectral line light can be transmitted in the slit 150.

理想上,這些螺絲墊片130具有相同的厚度,但在實際情況中,受限於製造流程中無法避免的變數的影響,以至於這些螺絲墊片130的真實厚度並不相同。這可能會增加狹縫150寬度G1的不均勻程度,即可能增加寬度G1的最大值與最小值的差距,造成光譜儀的解析度降低。 Ideally, these screw shim 130 have the same thickness, but in practice, they are limited by the inevitable variables in the manufacturing process, so that the true thickness of these screw shim 130 is not the same. This may increase the degree of unevenness of the width G1 of the slit 150, that is, it may increase the difference between the maximum value and the minimum value of the width G1, resulting in a decrease in the resolution of the spectrometer.

此外,當利用這些螺絲110來組裝這些光波導140、160時,也可能會因為錯誤組裝方式,造成寬度G1的不均勻程度增加。例如,施於螺絲110的扭力偏大,以至於螺絲墊片130可能發生形變,從而也可能增加寬度G1的最大值與最小值的差距。如此,增加狹縫150寬度G1的不均勻程度。 Further, when these optical waveguides 140, 160 are assembled by these screws 110, the degree of unevenness of the width G1 may increase due to an erroneous assembly method. For example, the torque applied to the screw 110 is so large that the screw washer 130 may be deformed, so that it is also possible to increase the difference between the maximum value and the minimum value of the width G1. Thus, the degree of unevenness of the width G1 of the slit 150 is increased.

本發明提供一種光譜儀的光機,其利用基座來支撐其中一塊光波導,並使二塊光波導之間形成供光線傳遞的間隙通道。 The invention provides an optical machine of a spectrometer, which uses a pedestal to support one of the optical waveguides, and forms a gap channel between the two optical waveguides for transmitting light.

本發明另提供一種光譜儀,其包括上述光機。 The invention further provides a spectrometer comprising the above described optical machine.

本發明提出一種光譜儀,其包括一光機以及一光感測元件。光機包括一基座、一第一光波導、一第二光波導以及一繞射光柵。基座包括一載台以及至少一個支撐部。載台具有一承載面,而上述支撐部連接載台,並位在承載面的周圍,其中承載面位在上述支撐部的其中至少二者之間。第一光波導具有一第一反射平面,而第二光波導具有一第二反射平面,其中第一光波導配置在第二光波導與承載面之間,且第一反射平面與第二反射平面彼此面對面。上述支撐部凸出於承載面與第一反射平面,並支撐第二光波導,以使第一反射平面與第二反射平面之間形成一間隙通道,而間隙通道用於傳遞一訊號光。繞射光柵配置在承載面上方,並用於將間隙通道內傳遞的訊號光分光,以形成多道譜線光。光感測元件接收這些譜線光。 The invention provides a spectrometer comprising a light machine and a light sensing element. The optical machine includes a base, a first optical waveguide, a second optical waveguide, and a diffraction grating. The base includes a stage and at least one support. The stage has a bearing surface, and the supporting portion is connected to the loading platform and positioned around the bearing surface, wherein the bearing surface is located between at least two of the supporting portions. The first optical waveguide has a first reflective plane, and the second optical waveguide has a second reflective plane, wherein the first optical waveguide is disposed between the second optical waveguide and the bearing surface, and the first reflective plane and the second reflective plane Face to face with each other. The support portion protrudes from the bearing surface and the first reflective plane, and supports the second optical waveguide such that a gap channel is formed between the first reflective plane and the second reflective plane, and the gap channel is used for transmitting a signal light. The diffraction grating is disposed above the carrying surface and is used to split the signal light transmitted in the gap channel to form multi-line light. The light sensing element receives these spectral lines.

在一實施例中,上述光感測元件配置於上述譜線光的聚焦範圍。 In one embodiment, the light sensing element is disposed in a focus range of the line light.

本發明另提出一種光譜儀的光機,其包括一基座、一第一光波導以及一第二光波導。基座包括一載台以及至少一個支撐部。載台具有一承載面,而上述支撐部連接載台。第一光波導具有一 第一反射平面。第二光波導具有一第二反射平面,其中第一光波導配置在第二光波導與承載面之間,且第一反射平面與第二反射平面彼此面對面。上述支撐部凸出於承載面與第一反射平面,並支撐第二光波導,以使第一反射平面與第二反射平面之間形成一間隙通道,其中間隙通道用於傳遞一訊號光與多道譜線光。 The invention further provides an optical machine of a spectrometer comprising a base, a first optical waveguide and a second optical waveguide. The base includes a stage and at least one support. The stage has a bearing surface, and the support portion is connected to the stage. The first optical waveguide has a The first reflecting plane. The second optical waveguide has a second reflective plane, wherein the first optical waveguide is disposed between the second optical waveguide and the bearing surface, and the first reflective plane and the second reflective plane face each other. The support portion protrudes from the bearing surface and the first reflecting plane, and supports the second optical waveguide to form a gap channel between the first reflecting plane and the second reflecting plane, wherein the gap channel is used to transmit a signal light and more Road line light.

在一實施例中,上述支撐部位在上述承載面的周圍,而上述承載面位在上述支撐部的其中至少二者之間。在另一實施例中,上述支撐部具有一支撐面以及一與上述支撐面相連的導光斜面,上述第二光波導配置在上述支撐面之上。上述載台更具有至少一凹槽,而上述凹槽具有一底面以及一側壁斜面,上述側壁斜面相連上述底面、上述承載面以及上述導光斜面,上述承載面與上述底面不重疊。上述凹槽的數量為多個,而上述承載面位在其中二個凹槽之間。在又一實施例中,上述第一光波導凸出於上述側壁斜面的一邊緣。 In an embodiment, the support portion is around the bearing surface, and the bearing surface is located between at least two of the support portions. In another embodiment, the support portion has a support surface and a light guiding slope connected to the support surface, and the second optical waveguide is disposed on the support surface. The loading platform further has at least one groove, and the groove has a bottom surface and a side wall inclined surface. The side wall inclined surface is connected to the bottom surface, the bearing surface and the light guiding inclined surface, and the bearing surface does not overlap the bottom surface. The number of the grooves is plural, and the bearing surface is located between the two grooves. In still another embodiment, the first optical waveguide protrudes from an edge of the slope of the sidewall.

在一實施例中,上述第一光波導具有一對缺口,而其中上述支撐部延伸至上述缺口中。在另一實施例中,上述第一光波導配置在上述承載面上。在又一實施例中,上述第一反射平面具有一光柵配置區,而上述繞射光柵配置在上述第一反射平面上,並位在上述光柵配置區內。在更一實施例中,上述基座更包括一連接上述載台的光柵承載部,上述光柵承載部位在上述承載面的周圍,並且凸出於上述承載面與上述第一反射平面,而上述光柵承載部位在上述第二光波導的下方,上述繞射光柵配置在上述光柵承載部上。上述光柵承載部具有一支撐面以及一與上述支撐面相連的導光斜面,上述繞射光柵配置在上述支撐面上,上述導光斜面面對上述第一光波導,上述承載面與上述支撐面由同一道製程所形成。 In an embodiment, the first optical waveguide has a pair of notches, and wherein the support portion extends into the notch. In another embodiment, the first optical waveguide is disposed on the bearing surface. In still another embodiment, the first reflective plane has a grating arrangement area, and the diffraction grating is disposed on the first reflection plane and is located in the grating arrangement area. In a further embodiment, the pedestal further includes a grating carrying portion connecting the loading platform, the grating bearing portion is around the bearing surface, and protrudes from the bearing surface and the first reflecting plane, and the grating The bearing portion is below the second optical waveguide, and the diffraction grating is disposed on the grating carrying portion. The grating carrying portion has a supporting surface and a light guiding inclined surface connected to the supporting surface, wherein the diffraction grating is disposed on the supporting surface, and the light guiding inclined surface faces the first optical waveguide, the bearing surface and the supporting surface Formed by the same process.

在一實施例中,上述間隙通道具有一入光口以及一出光口, 上述訊號光從上述入光口進入上述間隙通道,而上述繞射光柵將從上述入光口來的上述訊號光分光,以形成上述譜線光,上述譜線光從上述繞射光柵朝向上述出光口傳遞,上述支撐部不位在上述訊號光的傳遞路徑上與上述譜線光的傳遞路徑上。光譜儀更包括一入光元件,上述入光元件位在上述入光口處,而上述訊號光依序通過上述入光元件與上述入光口。入光元件包括一連接頭以及一狹縫件。上述連接頭配置在上述基座上。上述狹縫件配置在上述連接頭與上述入光口之間。 In an embodiment, the gap channel has an optical entrance and an optical outlet. The signal light enters the gap channel from the light entrance port, and the diffraction grating splits the signal light from the light entrance port to form the line light, and the line light is directed from the diffraction grating toward the light exiting The port is transferred, and the support portion is not located on the transmission path of the signal light and the transmission path of the spectral line light. The spectrometer further includes an light incident component, wherein the light incident component is located at the light entrance port, and the signal light passes through the light incident component and the light entrance port in sequence. The light incident component includes a connector and a slit member. The connector is disposed on the base. The slit member is disposed between the connecting head and the light entrance opening.

在一實施例中,上述入光口與上述出光口形成在上述第一反射平面與上述第二反射平面之間。在另一實施例中,上述支撐部具有一支撐面,上述承載面與上述支撐面由同一道製程所形成。 In an embodiment, the light entrance opening and the light exit opening are formed between the first reflective plane and the second reflective plane. In another embodiment, the support portion has a support surface, and the bearing surface and the support surface are formed by the same process.

由於上述支撐部凸出於載台的承載面與第一反射平面,並支撐第二光波導,因此第一光波導與第二光波導之間形成可以傳遞光線的間隙通道。 Since the support portion protrudes from the bearing surface of the stage and the first reflection plane and supports the second optical waveguide, a gap passage capable of transmitting light is formed between the first optical waveguide and the second optical waveguide.

為使能更進一步瞭解本發明的特徵及技術內容,請參閱以下有關實施例的詳細說明與附圖,但是此等說明與圖式僅用來說明本發明,而非對本發明的權利範圍作任何的限制。 For a better understanding of the features and technical aspects of the present invention, reference should be made to the accompanying claims limits.

圖2A為本發明一實施例之光譜儀的外觀立體示意圖,而圖2B為圖2A中光譜儀的內部結構的立體示意圖。請參閱圖2A與圖2B,光譜儀20包括一光機22,而光機22包括一基座200、一第一光波導240、一第二光波導260以及一繞射光柵270,其中第一光波導240配置在基座200上,而第二光波導260配置在第一光波導240的上方。所以,第一光波導240位在第二光波導260與基座200之間。繞射光柵270則可配置在第一光波導240上。 2A is a perspective view showing the appearance of a spectrometer according to an embodiment of the present invention, and FIG. 2B is a perspective view showing the internal structure of the spectrometer of FIG. 2A. Referring to FIG. 2A and FIG. 2B, the spectrometer 20 includes a light machine 22, and the light machine 22 includes a base 200, a first optical waveguide 240, a second optical waveguide 260, and a diffraction grating 270, wherein the first light The waveguide 240 is disposed on the susceptor 200, and the second optical waveguide 260 is disposed above the first optical waveguide 240. Therefore, the first optical waveguide 240 is located between the second optical waveguide 260 and the susceptor 200. The diffraction grating 270 can then be disposed on the first optical waveguide 240.

光譜儀20可接受訊號光L1,而訊號光L1能在第一光波導240 與第二光波導260之間傳遞,並且入射至繞射光柵270。當訊號光L1傳遞至繞射光柵270時,根據繞射(diffraction)的原理,繞射光柵270能將訊號光L1分光,以形成多道譜線光L1a。 The spectrometer 20 can receive the signal light L1, and the signal light L1 can be in the first optical waveguide 240. It is transmitted between the second optical waveguide 260 and is incident on the diffraction grating 270. When the signal light L1 is transmitted to the diffraction grating 270, the diffraction grating 270 can split the signal light L1 to form the multi-line light L1a according to the principle of diffraction.

光譜儀20可更包括一光感測元件290,其例如是電荷偶合元件(Charge-Coupled Device,CCD)或互補金氧半導體感測元件(CMOS Image Sensor,CIS)。光感測元件290可配置在基座200上,並能接收這些譜線光L1a,以進行光譜分析。更詳細地說,光感測元件290可配置在上述譜線光L1a的聚焦範圍。具體而言,光感測元件290能將這些譜線光L1a轉換成電訊號,並將電訊號傳遞至光譜分析設備,而光譜分析設備能對此電訊號進行訊號處理(signal processing)。如此,這些譜線光L1a得以被進行光譜分析。 The spectrometer 20 can further include a photo-sensing element 290, such as a Charge-Coupled Device (CCD) or a CMOS Image Sensor (CIS). The light sensing element 290 can be disposed on the susceptor 200 and can receive the spectral line light L1a for spectral analysis. In more detail, the light sensing element 290 can be disposed in the focus range of the above-described spectral line light L1a. Specifically, the light sensing component 290 can convert the spectral line light L1a into an electrical signal and transmit the electrical signal to the spectral analysis device, and the spectral analysis device can perform signal processing on the electrical signal. Thus, these spectral line lights L1a are subjected to spectral analysis.

光譜儀20可以更包括至少一條傳輸線206,而傳輸線206能電性連接光感測元件290與光譜分析設備,以使電訊號能從光感測元件290傳遞至光譜分析設備。上述光譜分析設備例如是電腦、微處理器、或運算單元,在本實施例以電腦為例進行說明。傳輸線206可具有連接埠(port)專用的接頭(plug),其中此連接埠例如是通用串列匯流排(Universal Serial Bus,USB),在其他實施例也可以採用其他傳輸界面。 The spectrometer 20 can further include at least one transmission line 206, and the transmission line 206 can be electrically coupled to the photo sensing element 290 and the spectroscopic analysis device to enable electrical signals to be transmitted from the photo sensing element 290 to the spectroscopic analysis device. The above-described spectral analysis device is, for example, a computer, a microprocessor, or an arithmetic unit. In the present embodiment, a computer is taken as an example for description. The transmission line 206 can have a port-specific plug, wherein the port is, for example, a Universal Serial Bus (USB), and other transmission interfaces can be used in other embodiments.

須說明的是,根據使用者對光譜儀20的需求,光感測元件290也可具備光譜分析功能,因而不需要再電性連接光譜分析設備。例如,光感測元件290可具備簡易的光譜分析功能,以滿足一些對光譜儀20只要求基本光譜分析功能的消費者。因此,光感測元件290可不必額外連接光譜分析設備,而光譜儀20也可不包括傳輸線206。所以,圖2A與圖2B中的傳輸線206僅供舉例說明。 It should be noted that, depending on the user's demand for the spectrometer 20, the light sensing element 290 can also have a spectral analysis function, so that it is not necessary to electrically connect the spectral analysis device. For example, light sensing element 290 can be provided with a simple spectral analysis function to satisfy some consumers who require only basic spectral analysis functions for spectrometer 20. Therefore, the light sensing element 290 may not necessarily have to be additionally connected to the spectral analysis device, and the spectrometer 20 may not include the transmission line 206. Therefore, the transmission line 206 in Figures 2A and 2B is for illustrative purposes only.

光譜儀20可以更包括濾光片280。濾光片280配置於基座200上,並位在第一光波導240與光感測元件290之間,其中這些譜 線光L1a穿透濾光片280。濾光片280能讓波長在特定範圍內的光線通過,並吸收或反射波長在上述特定範圍外的光線,因此濾光片280能根據譜線光L1a的波長來過濾譜線光L1a中被視為雜散光的光線,例如是二階以上的光線。 Spectrometer 20 can further include a filter 280. The filter 280 is disposed on the susceptor 200 and is located between the first optical waveguide 240 and the photo sensing element 290, wherein the spectra The line light L1a penetrates the filter 280. The filter 280 can pass light having a wavelength within a specific range and absorb or reflect light having a wavelength outside the above specific range, so that the filter 280 can filter the line light L1a according to the wavelength of the line light L1a. The light that is stray light is, for example, a light of a second order or more.

訊號光L1是利用反射的方式在第一光波導240與第二光波導260之間傳遞。詳細而言,第一光波導240具有一第一反射平面240a,而第二光波導260具有一第二反射平面260a,其中第一反射平面240a與第二反射平面260a能反射光線,而且第一反射平面240a與第二反射平面260a彼此面對面。 The signal light L1 is transmitted between the first optical waveguide 240 and the second optical waveguide 260 by means of reflection. In detail, the first optical waveguide 240 has a first reflective plane 240a, and the second optical waveguide 260 has a second reflective plane 260a, wherein the first reflective plane 240a and the second reflective plane 260a can reflect light, and the first The reflective plane 240a and the second reflective plane 260a face each other.

因此,訊號光L1可以被第一反射平面240a與第二反射平面260a反射,並且能以反射的方式在第一光波導240與第二光波導260之間傳遞。此外,第一光波導240與第二光波導260二者可為質地堅硬的剛性板材,例如是塗有反光材料的金屬板或玻璃板,其中此金屬板例如是不鏽鋼板或鋁合金板,以使第一光波導240與第二光波導260不易受到外力的施加而發生形變。 Therefore, the signal light L1 can be reflected by the first reflective plane 240a and the second reflective plane 260a, and can be transmitted between the first optical waveguide 240 and the second optical waveguide 260 in a reflective manner. In addition, both the first optical waveguide 240 and the second optical waveguide 260 may be rigid rigid plates, such as a metal plate or a glass plate coated with a reflective material, such as a stainless steel plate or an aluminum alloy plate, The first optical waveguide 240 and the second optical waveguide 260 are less susceptible to deformation by application of an external force.

由於訊號光L1與L1a是利用第一反射平面240a與第二反射平面260a二者反射的方式來傳遞,因此第一反射平面240a與第二反射平面260a二者的表面必須相當平滑,以減少訊號光L1與L1a發生散射(scatter)的情形,其中第一反射平面240a與第二反射平面260a二者的平整度可在50奈米(nm)以下,而這裡所述的平整度乃是指平面上的最高處與最低處之間的差距。所以,第一反射平面240a上的最高處與最低處之間的差距,以及第二反射平面260a上的最高處與最低處之間的差距在50奈米以下。 Since the signal light L1 and L1a are transmitted by the reflection of both the first reflective plane 240a and the second reflective plane 260a, the surfaces of both the first reflective plane 240a and the second reflective plane 260a must be relatively smooth to reduce the signal. The case where the light L1 and L1a are scattered, wherein the flatness of both the first reflective plane 240a and the second reflective plane 260a may be below 50 nanometers (nm), and the flatness described herein refers to a plane. The difference between the highest and lowest points. Therefore, the difference between the highest and lowest points on the first reflecting plane 240a and the difference between the highest and lowest points on the second reflecting plane 260a are below 50 nm.

另外,光譜儀20可以包括一配置在基座200上的入光元件208,而入光元件208能引導訊號光L1進入至第一光波導240與第二光波導260之間的區域。在本實施例中,訊號光L1可以從光纖或其他光學元件而來,而入光元件208可以包括一連接頭208a 與一狹縫件208b,其中狹縫件208b具有至少一條狹縫,而連接頭208a可以供上述光纖或其他光學元件裝設,並且能將訊號光L1光耦合(coupling to)於狹縫件208b的狹縫。所以,光譜儀20可以與光纖等光學元件連接。 In addition, the spectrometer 20 can include a light incident component 208 disposed on the susceptor 200, and the light incident component 208 can direct the signal light L1 into a region between the first optical waveguide 240 and the second optical waveguide 260. In this embodiment, the signal light L1 may come from an optical fiber or other optical component, and the light incident component 208 may include a connector 208a. And a slit member 208b, wherein the slit member 208b has at least one slit, and the connector 208a can be provided for the optical fiber or other optical component, and can optically couple the signal light L1 to the slit member 208b. The slit. Therefore, the spectrometer 20 can be connected to an optical component such as an optical fiber.

訊號光L1能穿透連接頭208a與狹縫件208,以使訊號光L1能經由入光元件208而進入至第一光波導240與第二光波導260之間的區域。此外,狹縫件208b配置在第一光波導240與連接頭208a之間。當訊號光L1進入入光元件208時,訊號光L1會依序通過連接頭208a與狹縫件208b的狹縫而進入至第一光波導240與第二光波導260之間的區域,如圖2B所示。 The signal light L1 can penetrate the connector 208a and the slit member 208 to enable the signal light L1 to enter the region between the first optical waveguide 240 and the second optical waveguide 260 via the light incident element 208. Further, the slit member 208b is disposed between the first optical waveguide 240 and the connector 208a. When the signal light L1 enters the light entering element 208, the signal light L1 sequentially enters the area between the first optical waveguide 240 and the second optical waveguide 260 through the slits of the connecting head 208a and the slit member 208b, as shown in the figure. 2B is shown.

值得一提的是,光譜儀20可以更包括一上蓋202,而上蓋202可以固定於基座200上方,且上蓋202可為塑膠蓋或金屬蓋,其中此金屬蓋可由質地堅硬的剛性材料所製成,例如是由不鏽鋼或鋁合金所製成。上蓋202可完全罩蓋位在基座200上的多個元件,其可包括第一光波導240、第二光波導260、繞射光柵270與光感測元件290。如此,上蓋202能保護這些元件免於遭到外物撞擊。 It should be noted that the spectrometer 20 may further include an upper cover 202, and the upper cover 202 may be fixed above the base 200, and the upper cover 202 may be a plastic cover or a metal cover, wherein the metal cover may be made of a rigid material with a rigid texture. For example, it is made of stainless steel or aluminum alloy. The upper cover 202 can completely cover a plurality of components on the susceptor 200, which can include a first optical waveguide 240, a second optical waveguide 260, a diffraction grating 270, and a light sensing element 290. As such, the upper cover 202 protects these components from foreign objects.

其次,上蓋202也可減少掉落到這些元件的灰塵,以避免因訊號光L1與譜線光L1a受灰塵的影響而使光譜儀20的解析度變差。此外,上蓋202的內側面顏色可以是深色系的顏色,例如暗藍色或黑色,以使上蓋202具有吸收雜散光的功能。此外,上蓋202還可以做為光譜儀20的外觀件,即上蓋202會呈現光譜儀20的整體外觀。 Secondly, the upper cover 202 can also reduce the dust dropped to these elements to prevent the resolution of the spectrometer 20 from being deteriorated by the influence of the signal light L1 and the spectral line light L1a. Further, the inner side color of the upper cover 202 may be a dark color, such as dark blue or black, so that the upper cover 202 has a function of absorbing stray light. In addition, the upper cover 202 can also serve as an exterior member of the spectrometer 20, i.e., the upper cover 202 will exhibit the overall appearance of the spectrometer 20.

光譜儀20可以更包括至少一個固定件204。例如,在本實施例中,光譜儀20所包括的固定件204的數量為八個,但是在其他實施例中,光譜儀20所包括的固定件204的數量可以僅為一個。上蓋202可利用這些固定件204來與基座200結合,以使上蓋202能固定於基座200上方。 The spectrometer 20 can further include at least one fixture 204. For example, in the present embodiment, the number of the fixing members 204 included in the spectrometer 20 is eight, but in other embodiments, the number of the fixing members 204 included in the spectrometer 20 may be only one. The upper cover 202 can be coupled to the base 200 by the fixing members 204 to enable the upper cover 202 to be fixed above the base 200.

在本實施例中,固定件204可以是鎖固件,例如是螺絲,所以上蓋202可以是用螺絲鎖固的方式來與基座200結合。然而,在其他實施例中,上蓋202也可以採用卡合或膠黏等其他方式來與基座200結合。所以,圖2A所示的固定件204僅供舉例說明。 In the present embodiment, the fixing member 204 may be a fastener such as a screw, so the upper cover 202 may be screwed to the base 200. However, in other embodiments, the upper cover 202 may also be combined with the base 200 by other means such as snapping or gluing. Therefore, the fixing member 204 shown in Fig. 2A is for illustrative purposes only.

圖2C為圖2B中基座的立體示意圖。請參閱圖2B與圖2C,基座200包括一載台210以及至少一個支撐部220。在本實施例中,以多個支撐部220為例進行說明。但在其他實施例中也可以透過單一支撐部來實施,例如可透過大面積的環形支撐部來實施。載台210具有一承載面212,而這些支撐部220連接載台210,並且位於承載面212的周圍,其中支撐部220可以與載台210一體成型,即支撐部220可與載台210直接連接,或是支撐部220可透過膠水、螺絲或其他連接元件來與載台210間接連接。承載面212可位於這些支撐部220的其中至少二者之間,而這些支撐部220凸出於承載面212,並支撐第二光波導260。 2C is a perspective view of the base of FIG. 2B. Referring to FIGS. 2B and 2C , the base 200 includes a stage 210 and at least one support portion 220 . In the present embodiment, a plurality of support portions 220 will be described as an example. However, in other embodiments, it can also be implemented by a single support portion, for example, through a large-area annular support portion. The loading platform 210 has a bearing surface 212, and the supporting portions 220 are connected to the loading platform 210 and are located around the bearing surface 212. The supporting portion 220 can be integrally formed with the loading platform 210, that is, the supporting portion 220 can be directly connected to the loading platform 210. Or the support portion 220 can be indirectly connected to the stage 210 through glue, screws or other connecting elements. The bearing surface 212 may be located between at least two of the support portions 220, and the support portions 220 protrude from the bearing surface 212 and support the second optical waveguide 260.

第二光波導260配置在這些支撐部220上,而第一光波導240配置在承載面212上,並配置在第二光波導260與承載面212之間,其中第二光波導260更可以固定在這些支撐部220上,而第一光波導240更可以固定在承載面212上。舉例而言,利用膠材或螺絲,第二光波導260能固定在這些支撐部220上,而第一光波導240能固定在承載面212上。當第一光波導240與第二光波導260是利用膠材而分別黏合固定在承載面212與這些支撐部220上時,可以防止第一光波導240與第二光波導260轉動。 The second optical waveguide 260 is disposed on the support portion 220, and the first optical waveguide 240 is disposed on the bearing surface 212 and disposed between the second optical waveguide 260 and the bearing surface 212. The second optical waveguide 260 can be fixed. On these support portions 220, the first optical waveguide 240 can be fixed to the bearing surface 212. For example, the second optical waveguide 260 can be fixed to the support portions 220 by using a glue or a screw, and the first optical waveguide 240 can be fixed to the bearing surface 212. When the first optical waveguide 240 and the second optical waveguide 260 are respectively bonded and fixed to the supporting surface 212 and the supporting portions 220 by using a rubber material, the first optical waveguide 240 and the second optical waveguide 260 can be prevented from rotating.

此外,這些支撐部220還能將第一光波導24與第二光波導260組裝定位的功能,以幫助第一光波導24與第二光波導260能組裝在正確的位置上。第一光波導240與第二光波導260的尺寸可以彼此不同,而且第一光波導240與第二光波導260可用彼此錯位的方式組裝於基座200。 In addition, the support portions 220 can also function to position the first optical waveguide 24 and the second optical waveguide 260 to help the first optical waveguide 24 and the second optical waveguide 260 can be assembled in the correct position. The sizes of the first optical waveguide 240 and the second optical waveguide 260 may be different from each other, and the first optical waveguide 240 and the second optical waveguide 260 may be assembled to the susceptor 200 in such a manner as to be misaligned with each other.

繞射光柵270配置在承載面212上方,並可配置在第一反射平面240a上,其中第一反射平面240a可具有一光柵配置區240b,而繞射光柵270位在光柵配置區240b內。此外,第二光波導260更具有一對應光柵配置區240b的缺口260b。當第二光波導260配置在支撐部220上,並覆蓋第一反射平面240a時,繞射光柵270位在缺口260b中,而不被第二光波導260所遮蓋。 The diffraction grating 270 is disposed above the carrier surface 212 and can be disposed on the first reflective plane 240a, wherein the first reflective plane 240a can have a grating arrangement area 240b and the diffraction grating 270 is positioned within the grating arrangement area 240b. In addition, the second optical waveguide 260 further has a notch 260b corresponding to the grating arrangement area 240b. When the second optical waveguide 260 is disposed on the support portion 220 and covers the first reflective plane 240a, the diffraction grating 270 is positioned in the notch 260b without being covered by the second optical waveguide 260.

必須說明的是,雖然在本實施例中,繞射光柵270配置在第一反射平面240a上,但在其他實施例中,繞射光柵270也可以配置在其中一個支撐部220上,或是配置在載台210的其他位置上。所以,圖2B所示的繞射光柵270的配置位置僅供舉例說明。 It should be noted that although in the present embodiment, the diffraction grating 270 is disposed on the first reflective plane 240a, in other embodiments, the diffraction grating 270 may be disposed on one of the support portions 220, or may be configured. At other locations on the stage 210. Therefore, the arrangement position of the diffraction grating 270 shown in FIG. 2B is for illustrative purposes only.

基座200可以更包括至少二個支撐部226,其中第一光波導240位在這些支撐部226之間。支撐部226不僅具有支撐第二光波導260的功能,而且還能限制第一光波導240的移動。詳細而言,當光譜儀20因搬移或晃動而造成第一光波導240移動時,這些支撐部226能阻擋第一光波導240的移動,以減少訊號光L1與譜線光L1a二者傳遞路徑發生改變的情形,進而維持或提高光譜儀20的解析度。 The susceptor 200 may further include at least two support portions 226, wherein the first optical waveguide 240 is located between the support portions 226. The support portion 226 not only has a function of supporting the second optical waveguide 260, but also limits the movement of the first optical waveguide 240. In detail, when the first optical waveguide 240 is moved by the spectrometer 20 due to moving or shaking, the supporting portions 226 can block the movement of the first optical waveguide 240 to reduce the transmission path of the signal light L1 and the spectral line light L1a. The situation of the change, in turn, maintains or increases the resolution of the spectrometer 20.

第一光波導240可具有一對缺口242,而這些支撐部226分別延伸至這些缺口242中。支撐部226具有偏低的反射率,且支撐部226的顏色可為低亮度的顏色,例如黑色或深藍色。當訊號光L1從入光元件208進入第一光波導240與第二光波導260之間的區域時,這些支撐部226能遮蔽部分訊號光L1,以盡量讓訊號光L1沿著預定的路徑入射至繞射光柵270,以減少雜散光(stray light)的形成。 The first optical waveguide 240 can have a pair of notches 242 that extend into the notches 242, respectively. The support portion 226 has a low reflectance, and the color of the support portion 226 may be a low-brightness color such as black or dark blue. When the signal light L1 enters the region between the first optical waveguide 240 and the second optical waveguide 260 from the light entering element 208, the supporting portions 226 can shield part of the signal light L1 to make the signal light L1 enter the predetermined path as much as possible. The diffraction grating 270 is passed to reduce the formation of stray light.

不過,仍然要強調的是,雖然在圖2B所示的實施例中,基座200包括支撐部226,但是在圖2B以外的其他實施例中,基座200也可以不包括支撐部226,而第一光波導240也可以不具有缺口 242。所以,圖2B所示的支撐部226僅供舉例說明。 However, it is still emphasized that although in the embodiment shown in FIG. 2B, the base 200 includes the support portion 226, in other embodiments than FIG. 2B, the base 200 may not include the support portion 226. The first optical waveguide 240 may also have no gap 242. Therefore, the support portion 226 shown in Fig. 2B is for illustrative purposes only.

另外,特別一提的是,第二光波導260可具有將繞射光柵270、入光元件208與第二光波導260等光學元件定位基準的功能,而這些光學元件的尺寸與位置可以整合在第二光波導260上,也就是說,光譜儀20的整個光路精準度只要控制好第二光波導260的公差及加工精度,即可確保這些光學元件的組裝位置無誤。 In addition, in particular, the second optical waveguide 260 may have a function of positioning the optical elements such as the diffraction grating 270, the light incident element 208, and the second optical waveguide 260, and the size and position of the optical components may be integrated in On the second optical waveguide 260, that is, the entire optical path accuracy of the spectrometer 20, as long as the tolerance and processing accuracy of the second optical waveguide 260 are controlled, the assembly position of these optical components can be ensured.

圖2D為圖2C中沿著B-B剖面所繪示的剖面示意圖。請參閱圖2C與圖2D,載台210更具有至少一個凹槽230。例如,在圖2C所示的實施例中,載台210所具有的凹槽230的數量為多個,但在其他實施例中,凹槽230的數量可以僅為一個。所以,圖2C所示的凹槽230的數量僅供舉例說明。此外,承載面212可以位在其中二個凹槽230之間,如圖2C所示。 2D is a schematic cross-sectional view taken along line B-B of FIG. 2C. Referring to FIG. 2C and FIG. 2D, the stage 210 further has at least one groove 230. For example, in the embodiment illustrated in FIG. 2C, the stage 210 has a plurality of grooves 230, but in other embodiments, the number of grooves 230 may be only one. Therefore, the number of grooves 230 shown in FIG. 2C is for illustrative purposes only. Additionally, the bearing surface 212 can be positioned between two of the grooves 230, as shown in Figure 2C.

各個凹槽230具有一底面232與一側壁斜面234,而側壁斜面234與底面232相連。凹槽230的寬度整體上是從底面232往上遞增。所以,在同一凹槽230中,底面232的面積小於凹槽230開口的截面面積,且側壁斜面234與底面232之間的夾角θ3大於90度,所以承載面212與底面232不重疊。也就是說,承載面212不會在底面232的正上方,即底面232也不在承載面212的正下方,如圖2D所示。此外,有的凹槽230的側壁斜面234的形狀可為環形,如圖2C所示。 Each groove 230 has a bottom surface 232 and a side wall slope 234, and the side wall slope 234 is connected to the bottom surface 232. The width of the groove 230 as a whole is increased from the bottom surface 232. Therefore, in the same groove 230, the area of the bottom surface 232 is smaller than the cross-sectional area of the opening of the groove 230, and the angle θ3 between the side wall slope 234 and the bottom surface 232 is greater than 90 degrees, so the bearing surface 212 and the bottom surface 232 do not overlap. That is, the bearing surface 212 does not lie directly above the bottom surface 232, i.e., the bottom surface 232 is not directly below the bearing surface 212, as shown in Figure 2D. In addition, the sidewall slope 234 of the recess 230 may have a ring shape as shown in FIG. 2C.

這些支撐部220與226具有支撐面222,而第二光波導260配置在這些支撐面222之上。詳細而言,在本實施例中,第二光波導260可以配置在這些支撐面222上,並接觸這些支撐面222。不過,在其他實施例中,也可以在支撐面222與第二光波導260之間配置膠材或緩衝墊等材料,以至於第二光波導260位在這些支撐面222的上方而不接觸這些支撐面222。 These support portions 220 and 226 have support faces 222, and second optical waveguides 260 are disposed above these support faces 222. In detail, in the embodiment, the second optical waveguide 260 may be disposed on the support surfaces 222 and contact the support surfaces 222. However, in other embodiments, a material such as a glue or a cushion may be disposed between the support surface 222 and the second optical waveguide 260 such that the second optical waveguide 260 is positioned above the support surfaces 222 without contacting these. Support surface 222.

這些支撐部220的其中至少一者可以更具有一面導光斜面 224,其中導光斜面224相連支撐面222與凹槽230的側壁斜面234。所以,支撐部220可位在凹槽230的周圍,如圖2D所示。此外,從圖2D可看出,支撐部220在導光斜面224與支撐面222之間的角度θ1小於90度,例如角度θ1可以小於或等於45度,即角度θ1為銳角。 At least one of the support portions 220 may have a light guiding bevel 224, wherein the light guiding slope 224 is connected to the supporting surface 222 and the sidewall slope 234 of the groove 230. Therefore, the support portion 220 can be positioned around the groove 230 as shown in FIG. 2D. In addition, as can be seen from FIG. 2D, the angle θ1 of the support portion 220 between the light guiding slope 224 and the support surface 222 is less than 90 degrees, for example, the angle θ1 may be less than or equal to 45 degrees, that is, the angle θ1 is an acute angle.

值得一提的是,雖然這些凹槽230的外型並不完全相同,且這些支撐部220的外型也不完全相同,但是這些凹槽230的結構實質上卻是彼此相同,而這些支撐部220的結構實質上也是彼此相同。此外,這些凹槽230與支撐部220可用相同的製造方法來形成。舉例而言,這些凹槽230與支撐部220可以是藉由同一道加工製程而形成,其中加工製程例如是銑床(milling)、沖壓(punching)、射出成型(injection molding)、或電鑄(electroforming)...等。如此,可以有效地控制凹槽230與支撐部220的公差,以使凹槽230與支撐部220的尺寸更為準確。 It should be noted that although the shapes of the grooves 230 are not identical, and the shapes of the support portions 220 are not identical, the structures of the grooves 230 are substantially identical to each other, and the support portions are substantially identical to each other. The structures of 220 are also substantially identical to each other. Further, these grooves 230 and the support portion 220 can be formed by the same manufacturing method. For example, the grooves 230 and the support portion 220 may be formed by the same processing process, wherein the processing process is, for example, milling, punching, injection molding, or electroforming. )...Wait. In this way, the tolerance of the groove 230 and the support portion 220 can be effectively controlled to make the size of the groove 230 and the support portion 220 more accurate.

圖2E為圖2B中沿著A-A剖面所繪示的剖面示意圖。請參閱圖2B與圖2E,這些支撐部220不僅凸出於承載面212,且也凸出於第一反射平面240a,以使第一反射平面240a與第二反射平面260a之間的區域形成間隙通道250,所以第一光波導240不接觸第二光波導260。間隙通道250的寬度T2可介於100微米(μm)至150微米之間,而間隙通道250用於傳遞訊號光L1。在其他實施例中,也可以利用同樣方式形成不同寬度T2的間隙通道250。 2E is a schematic cross-sectional view taken along line A-A of FIG. 2B. Referring to FIG. 2B and FIG. 2E, the support portions 220 protrude not only from the bearing surface 212 but also from the first reflective plane 240a to form a gap between the first reflective plane 240a and the second reflective plane 260a. Channel 250, so first optical waveguide 240 does not contact second optical waveguide 260. The width T2 of the gap channel 250 may be between 100 micrometers (μm) and 150 micrometers, and the gap channel 250 is used to transmit the signal light L1. In other embodiments, the gap channels 250 of different widths T2 can also be formed in the same manner.

間隙通道250具有一入光口250a以及一出光口250b,其中入光口250a與出光口250b形成在第一反射平面240a與第二反射平面260a之間。入光元件208位在入光口250a處,而光感測元件290位在出光口250b處。狹縫件208b配置在連接頭208a與入光口250a之間,而訊號光L1依序通過入光元件208與入光口250a,並從入光口250a進入間隙通道250,如圖2B所示。繞射光柵270 能將從入光口250a來的訊號光L1分光,以形成這些譜線光L1a,而這些譜線光L1a從繞射光柵270朝向出光口250b傳遞。 The gap channel 250 has a light entrance 250a and a light exit 250b, wherein the light entrance 250a and the light exit 250b are formed between the first reflective plane 240a and the second reflective plane 260a. The light incident element 208 is located at the light entrance 250a, and the light sensing element 290 is located at the light exit 250b. The slit member 208b is disposed between the connector 208a and the light entrance 250a, and the signal light L1 sequentially passes through the light entering component 208 and the light inlet 250a, and enters the gap channel 250 from the light inlet 250a, as shown in FIG. 2B. . Diffraction grating 270 The signal light L1 from the light entrance port 250a can be split to form the line light L1a, and the line light L1a is transmitted from the diffraction grating 270 toward the light exit port 250b.

特別一提的是,這些支撐部220沒有位在訊號光L1的傳遞路徑上與這些譜線光L1a的傳遞路徑上。因此,光感測元件290基本上所接收到的譜線光L1a不會被支撐部220反射或散射,以減少支撐部220對譜線光L1a所造成的不良影響,從而維持或提高光譜儀20的解析度與感度。 In particular, the support portions 220 are not located on the transmission path of the signal light L1 and the transmission paths of the spectral line lights L1a. Therefore, the substantially received line light L1a of the light sensing element 290 is not reflected or scattered by the support portion 220 to reduce the adverse effect of the support portion 220 on the line light L1a, thereby maintaining or improving the spectrometer 20. Resolution and sensitivity.

另外,當訊號光L1被繞射光柵270分光而形成這些譜線光L1a時,難免會形成一些雜散光L2,如圖2B與圖2E所示。當這些雜散光L2第一次從間隙通道250離開時,這些雜散光L2大多是從出光口250b以外的地方離開間隙通道250,而有些剛從間隙通道250離開的雜散光L2會進入這些凹槽230,如圖2E所示。 Further, when the signal light L1 is split by the diffraction grating 270 to form the line light L1a, some stray light L2 is inevitably formed as shown in Figs. 2B and 2E. When the stray light L2 leaves the gap channel 250 for the first time, the stray light L2 mostly leaves the gap channel 250 from the place other than the light exit port 250b, and some stray light L2 that has just left the gap channel 250 enters the groove. 230, as shown in Figure 2E.

請參閱圖2E,支撐部220的導光斜面224面對第一光波導240,且支撐部220在導光斜面224與支撐面222之間的角度θ1小於90度。因此,當雜散光L2進入凹槽230時,雜散光L2通常會先入射至導光斜面224,並且被導光斜面224反射。之後,導光斜面224會將雜散光L2反射至凹槽230的底面232或側壁斜面234。一旦雜散光L2被導光斜面224反射至凹槽230中,雜散光L2會在凹槽230中來回反射,而難以再次進入間隙通道250。雜散光L2經過多次反射就會衰減而消失。需一提的是,的導光斜面224面對第一光波導240僅是一種選擇實施例。在其他實施例中,導光斜面224也可將雜散光導向其他地方,並可配合光衰減(light attenuation)結構或光捕捉(light trapping)結構,以改善雜散光射回光波導的問題。 Referring to FIG. 2E , the light guiding slope 224 of the supporting portion 220 faces the first optical waveguide 240 , and the angle θ1 of the supporting portion 220 between the light guiding inclined surface 224 and the supporting surface 222 is less than 90 degrees. Therefore, when the stray light L2 enters the groove 230, the stray light L2 is usually incident on the light guiding slope 224 first and is reflected by the light guiding slope 224. Thereafter, the light guiding ramp 224 reflects the stray light L2 to the bottom surface 232 or the sidewall slope 234 of the recess 230. Once the stray light L2 is reflected by the light guiding ramp 224 into the recess 230, the stray light L2 will reflect back and forth in the recess 230, making it difficult to re-enter the gap channel 250. The stray light L2 decays and disappears after multiple reflections. It should be noted that the light guiding ramp 224 facing the first optical waveguide 240 is only an alternative embodiment. In other embodiments, the light guiding ramp 224 can also direct stray light elsewhere, and can be combined with a light attenuation structure or a light trapping structure to improve the problem of stray light returning to the optical waveguide.

此外,在圖2E所示的實施例中,第一光波導240可以凸出於側壁斜面234的邊緣234e,以使第一反射平面240a與凹槽230的底面232部分重疊。在雜散光L2進入凹槽230之後,雜散光L2 會被底面232或側壁斜面234反射而能進入位於第一光波導240及其下方的側壁斜面234之間的空間。之後,雜散光L2會在此空間與凹槽230中來回反射。 Moreover, in the embodiment illustrated in FIG. 2E, the first optical waveguide 240 may protrude from the edge 234e of the sidewall bevel 234 such that the first reflective plane 240a partially overlaps the bottom surface 232 of the recess 230. After the stray light L2 enters the groove 230, the stray light L2 It will be reflected by the bottom surface 232 or the sidewall slope 234 to enter the space between the first optical waveguide 240 and the sidewall slope 234 below it. After that, the stray light L2 will be reflected back and forth in this space and the groove 230.

由此可知,導光斜面224可以將雜散光L2引導到下方的凹槽230中,以使凹槽230能將雜散光L2補捉(trapping)。如此,可以減少發生雜散光L2重返間隙通道250的機率,而且也能減少光感測元件290所接收到的雜散光L2,從而提升光譜儀20的解析度。 It can be seen that the light guiding slope 224 can guide the stray light L2 into the lower groove 230 so that the groove 230 can trap the stray light L2. In this way, the probability of occurrence of the stray light L2 returning to the gap channel 250 can be reduced, and the stray light L2 received by the light sensing element 290 can also be reduced, thereby improving the resolution of the spectrometer 20.

圖2F為圖2B中繞射光柵的立體示意圖,而圖2G為圖2F中繞射光柵的仰視示意圖。請參閱圖2F與圖2G,繞射光柵有多種實施態樣,而圖2F與圖2G所示的繞射光柵270為上述多種實施態樣的其中一種。因此,在此事先聲明,圖2F與圖2G所示的繞射光柵270僅供舉例說明。在本實施例中,繞射光柵270以反射式繞射光柵為例進行說明。在其他實施例中,本領域技術者也可依照其需求,而改用穿透式繞射光柵來實施。 2F is a perspective view of the diffraction grating of FIG. 2B, and FIG. 2G is a bottom view of the diffraction grating of FIG. 2F. Referring to Figures 2F and 2G, the diffraction grating has various embodiments, and the diffraction grating 270 shown in Figures 2F and 2G is one of the various embodiments described above. Therefore, it is previously stated that the diffraction grating 270 shown in FIGS. 2F and 2G is for illustrative purposes only. In the present embodiment, the diffraction grating 270 is described by taking a reflective diffraction grating as an example. In other embodiments, those skilled in the art can also implement the transmissive diffraction grating according to their needs.

繞射光柵270具有一側平面272、一裸露於側平面272的凹陷274以及多個位於凹陷274內的繞射結構276,其中凹陷274具有一與側平面272相連的壁面278,而這些繞射結構276延伸至壁面278(如圖2F所示)。此外,這些繞射結構276是沿著一曲面270a而分布在凹陷274內,且曲面270a可為任意曲面,例如是非球面的自由曲面。 The diffraction grating 270 has a side plane 272, a recess 274 exposed to the side plane 272, and a plurality of diffractive structures 276 located within the recess 274, wherein the recess 274 has a wall 278 connected to the side plane 272, and these diffractions Structure 276 extends to wall 278 (shown in Figure 2F). Moreover, the diffractive structures 276 are distributed within the recesses 274 along a curved surface 270a, and the curved surface 270a can be any curved surface, such as an aspherical free curved surface.

承上述,這些沿著曲面270a而分布的繞射結構276不僅能將訊號光L1分成多道譜線光L1a,而且還可以將譜線光L1a聚焦於光感測元件290上。所以,利用這些繞射結構276沿著曲面270a分布的設計,可以減少光譜儀20所使用的光學元件(例如準直鏡或聚焦鏡)的數量,以簡化光譜儀20的光學設計。 As described above, the diffraction structures 276 distributed along the curved surface 270a can not only divide the signal light L1 into a plurality of spectral line lights L1a, but also focus the spectral line light L1a on the light sensing element 290. Therefore, with the design of the distribution of these diffractive structures 276 along the curved surface 270a, the number of optical components (e.g., collimating or focusing mirrors) used by the spectrometer 20 can be reduced to simplify the optical design of the spectrometer 20.

此外,這些繞射結構276可以是經由微機電製程 (Micro-Electromechanical System Process,MENS Process)而形成。例如,構成繞射光柵270的材料可以是矽,而形成這些繞射結構276的方法可以是對矽材料進行微影(photo lithography)與蝕刻,其中此矽材料例如是矽晶圓。另外,在其他實施例中,繞射結構也可以是經由電鑄(electroforming)、全像術(Holography)或機械加工...等製程而形成,上述機械加工例如是刀具切割。 Moreover, these diffractive structures 276 may be via a microelectromechanical process Formed by (Micro-Electromechanical System Process, MENS Process). For example, the material constituting the diffraction grating 270 may be tantalum, and the method of forming the diffraction structures 276 may be photolithography and etching of the tantalum material, such as a tantalum wafer. In addition, in other embodiments, the diffraction structure may also be formed by processes such as electroforming, Holography, or machining, such as tool cutting.

值得說明的是,當這些繞射結構276是對矽材料進行微影與蝕刻而形成時,在結構的輪廓方面,繞射結構276在遠離壁面278的一端會優於接近壁面278的一端,而在圖2F的這些繞射結構276中,繞射結構276的輪廓愈佳,能提供愈佳的分光功能。 It should be noted that when the diffraction structures 276 are formed by lithography and etching of the germanium material, the diffraction structure 276 is superior to the end of the wall surface 278 at the end away from the wall surface 278 in terms of the contour of the structure. In the diffractive structures 276 of Figure 2F, the better the contour of the diffractive structure 276, the better the spectral splitting function.

圖2H為圖2A中光譜儀在繞射光柵處的剖面示意圖。請參閱圖2H,其中圖2H繪示出繞射光柵270相對於第一光波導240以及第二光波導260的配置。繞射光柵270可以配置在第一反射平面240a的光柵配置區240b內,而且第二光波導260的一端可抵靠在繞射光柵270的側平面272上,如圖2H所示。 2H is a schematic cross-sectional view of the spectrometer of FIG. 2A at a diffraction grating. Please refer to FIG. 2H, in which FIG. 2H illustrates the configuration of the diffraction grating 270 with respect to the first optical waveguide 240 and the second optical waveguide 260. The diffraction grating 270 can be disposed within the grating arrangement region 240b of the first reflective plane 240a, and one end of the second optical waveguide 260 can abut against the side plane 272 of the diffraction grating 270, as shown in Figure 2H.

此外,間隙通道250的寬度T2大於繞射結構276的高度T1。在本實施例中,繞射結構276的高度T1可在25微米以上,例如是50微米,而間隙通道250的寬度T2可介於100微米至150微米之間。所以,第二光波導260不會凸出繞射光柵270的壁面278。 Further, the width T2 of the gap passage 250 is greater than the height T1 of the diffraction structure 276. In the present embodiment, the height T1 of the diffractive structure 276 may be above 25 microns, such as 50 microns, and the width T2 of the gap channel 250 may be between 100 microns and 150 microns. Therefore, the second optical waveguide 260 does not protrude from the wall surface 278 of the diffraction grating 270.

圖3為本發明另一實施例之光譜儀在繞射光柵處的剖面示意圖。請參閱圖3,本實施例的光譜儀30與前一實施例的光譜儀20兩者結構大致相同,惟光譜儀20與30二者的主要差異是在於:光譜儀20與30二者繞射光柵270的配置位置有所不同。由於光譜儀20與30兩者結構大致相同,因此以下僅介紹上述主要差異。至於光譜儀20與30二者相同特徵,原則上不再重複贅述。 3 is a schematic cross-sectional view of a spectrometer at a diffraction grating according to another embodiment of the present invention. Referring to FIG. 3, the spectrometer 30 of the present embodiment is substantially identical in structure to the spectrometer 20 of the previous embodiment, except that the main difference between the spectrometers 20 and 30 is that the spectrometers 20 and 30 are arranged in a diffraction grating 270. The location is different. Since the spectrometers 20 and 30 are substantially identical in structure, only the main differences described above will be described below. As for the same features of the spectrometers 20 and 30, the description will not be repeated in principle.

具體而言,除了繞射光柵270之外,光譜儀30還包括一基座300、一第一光波導340以及一第二光波導360,其中繞射光柵270 配置在基座300上。詳細而言,基座300包括多個支撐部220(圖3未繪示)、一載台210以及一連接載台210的光柵承載部320,而光柵承載部320位在載台210的承載面212的周圍,並且凸出於承載面212以及第一光波導340的第一反射平面340a。 Specifically, in addition to the diffraction grating 270, the spectrometer 30 further includes a susceptor 300, a first optical waveguide 340, and a second optical waveguide 360, wherein the diffraction grating 270 It is disposed on the base 300. In detail, the susceptor 300 includes a plurality of supporting portions 220 (not shown in FIG. 3 ), a loading stage 210 and a grating carrying portion 320 connecting the stages 210 , and the grating carrying portion 320 is located on the bearing surface of the stage 210 . Surrounding 212, and protruding from the bearing surface 212 and the first reflective plane 340a of the first optical waveguide 340.

承上述,繞射光柵270配置在光柵承載部320上,而光柵承載部320具有一支撐面322以及一與支撐面322相連的導光斜面324,其中繞射光柵270配置在支撐面322上。導光斜面324面對第一光波導340,而光柵承載部320在導光斜面324與支撐面322之間的角度θ5小於90度,如圖3所示。 In the above, the diffraction grating 270 is disposed on the grating carrying portion 320, and the grating carrying portion 320 has a supporting surface 322 and a light guiding inclined surface 324 connected to the supporting surface 322, wherein the diffraction grating 270 is disposed on the supporting surface 322. The light guiding ramp 324 faces the first optical waveguide 340, and the angle θ5 of the grating carrying portion 320 between the light guiding slope 324 and the supporting surface 322 is less than 90 degrees, as shown in FIG.

繞射光柵270的壁面278與第一反射平面340a之間的距離T3可以大於第一反射平面340a與第二光波導360的第二反射平面360a之間的距離T4,其中距離T4相當於第一反射平面340a與第二反射平面360a之間所形成的間隙通道的寬度,且距離T4可以等於前述實施例中的間隙通道250寬度T2。在其他實施例中,繞射光柵270的壁面278與第一反射平面340a之間的距離T3也可以小於第一反射平面340a與第二光波導360的第二反射平面360a之間的距離T4。 The distance T3 between the wall surface 278 of the diffraction grating 270 and the first reflection plane 340a may be greater than the distance T4 between the first reflection plane 340a and the second reflection plane 360a of the second optical waveguide 360, wherein the distance T4 is equivalent to the first The width of the gap channel formed between the reflective plane 340a and the second reflective plane 360a, and the distance T4 may be equal to the width T2 of the gap channel 250 in the previous embodiment. In other embodiments, the distance T3 between the wall surface 278 of the diffraction grating 270 and the first reflective plane 340a may also be less than the distance T4 between the first reflective plane 340a and the second reflective plane 360a of the second optical waveguide 360.

由此可知,從圖3可以看出,在繞射光柵270中,繞射結構276的底端部位會位在第一反射平面340a的上方。當這些繞射結構276是對矽材料進行微影與蝕刻而形成時,由繞射結構276的底端部位具有優良的結構,因此,當繞射結構276的底端部位在第一反射平面340a的上方時,大部分的訊號光L1可入射至繞射結構276的底端部位。如此,繞射光柵270能提供良好的分光功能,以提高光譜儀30的解析度與感度。 It can be seen from FIG. 3 that in the diffraction grating 270, the bottom end portion of the diffraction structure 276 is positioned above the first reflection plane 340a. When these diffraction structures 276 are formed by lithography and etching of the germanium material, the bottom end portion of the diffraction structure 276 has an excellent structure, and therefore, when the bottom end portion of the diffraction structure 276 is at the first reflection plane 340a When it is above, most of the signal light L1 can be incident on the bottom end portion of the diffraction structure 276. As such, the diffraction grating 270 can provide a good splitting function to increase the resolution and sensitivity of the spectrometer 30.

此外,光柵承載部320可以位在載台210的凹槽230的周圍,其中導光斜面324相連支撐面322與凹槽230的側壁斜面234,如圖3所示。由此可知,光柵承載部320的結構實質上與支撐部220 的結構相同,而導光斜面324也能將雜散光L2引導到下方的凹槽230中,以使凹槽230能將雜散光L2捕捉,以避免影響光譜儀20的解析度。 In addition, the grating carrier 320 can be positioned around the recess 230 of the stage 210, wherein the light guiding ramp 324 connects the support surface 322 with the sidewall slope 234 of the recess 230, as shown in FIG. It can be seen that the structure of the grating carrying portion 320 is substantially opposite to the supporting portion 220. The structure is the same, and the light guiding slope 324 can also guide the stray light L2 into the lower groove 230 so that the groove 230 can capture the stray light L2 to avoid affecting the resolution of the spectrometer 20.

另外,受到繞射光柵270配置的影響,第一光波導340、240二者外型彼此不同,而第二光波導360、260二者外型彼此不同。例如,第一光波導340不具有光柵配置區240b,而第二光波導260不具有缺口260b。不過,儘管外型有所不同,第一光波導340與第二光波導360二者的材料、功能以及實質結構與前述實施例中的第一光波導240及第二光波導260相同,故不再重複贅述。 In addition, due to the configuration of the diffraction grating 270, the first optical waveguides 340, 240 are different in appearance from each other, and the second optical waveguides 360, 260 are different in appearance from each other. For example, the first optical waveguide 340 does not have the grating arrangement area 240b, and the second optical waveguide 260 does not have the gap 260b. However, although the appearance is different, the materials, functions, and substantial structures of the first optical waveguide 340 and the second optical waveguide 360 are the same as those of the first optical waveguide 240 and the second optical waveguide 260 in the foregoing embodiment, and thus Repeat it again.

綜上所述,在上述實施例的光譜儀中,由於這些支撐部凸出於載台的承載面與第一光波導的第一反射平面,並支撐第二光波導,因此第一光波導與第二光波導之間形成可以傳遞光線的間隙通道。相較於習知技術而言,上述實施例的間隙通道的寬度不會受到這些螺絲墊片的不同厚度或形變所影響,也不會有螺絲扭曲的問題,從而具有較低的不均勻程度。如此,光譜儀的解析度得以維持或提升。 In summary, in the spectrometer of the above embodiment, since the support portions protrude from the bearing surface of the stage and the first reflection plane of the first optical waveguide, and support the second optical waveguide, the first optical waveguide and the first optical waveguide A gap channel is formed between the two optical waveguides to transmit light. Compared with the prior art, the width of the gap passage of the above embodiment is not affected by the different thicknesses or deformations of the screw washers, and there is no problem of screw twisting, thereby having a low degree of unevenness. In this way, the resolution of the spectrometer is maintained or increased.

其次,繞射光柵的多個繞射結構可沿著曲面而分佈,以減少光學元件的數量,進而達到簡化光學設計的功效。此外,上述支撐部還可具有將第一光波導與第二光波導組裝定位的功能,以幫助第一光波導與第二光波導組裝在正確的位置上,而第二光波導還可具有將繞射光柵、入光元件與第二光波導等光學元件定位基準的功能,以使光學元件的尺寸與位置整合在第二光波導上。由此可知,上述實施例的光譜儀還具備組裝工序簡化的優點。 Secondly, a plurality of diffraction structures of the diffraction grating can be distributed along the curved surface to reduce the number of optical components, thereby achieving the effect of simplifying the optical design. In addition, the support portion may further have a function of assembling and positioning the first optical waveguide and the second optical waveguide to help the first optical waveguide and the second optical waveguide are assembled at the correct position, and the second optical waveguide may further have The functions of the optical element positioning reference such as the diffraction grating, the light incident element and the second optical waveguide are such that the size and position of the optical element are integrated on the second optical waveguide. From this, it is understood that the spectrometer of the above embodiment also has the advantage of simplifying the assembly process.

以上所述僅為本發明的實施例,任何熟習相像技藝者,在不脫離本發明的精神與範圍內,所作的更動及潤飾的等效替換,仍為本發明的專利保護範圍內。 The above is only the embodiment of the present invention, and it is still within the scope of patent protection of the present invention to make the equivalent replacement of the modification and retouching without departing from the spirit and scope of the present invention.

20、30、100‧‧‧光譜儀 20, 30, 100‧ ‧ spectrometer

22‧‧‧光機 22‧‧‧Optical machine

110‧‧‧螺絲 110‧‧‧ screws

130‧‧‧螺絲墊片 130‧‧‧Screw gasket

140、160‧‧‧光波導 140, 160‧‧‧ optical waveguide

140a、160a‧‧‧反射平面 140a, 160a‧‧‧reflection plane

150‧‧‧狹縫 150‧‧‧slit

200、300‧‧‧基座 200, 300‧‧‧ base

202‧‧‧上蓋 202‧‧‧上盖

204‧‧‧固定件 204‧‧‧Fixed parts

206‧‧‧傳輸線 206‧‧‧ transmission line

208‧‧‧入光元件 208‧‧‧ light-in components

208a‧‧‧連接頭 208a‧‧‧Connecting head

208b‧‧‧狹縫件 208b‧‧‧slit parts

210‧‧‧載台 210‧‧‧Package

212‧‧‧承載面 212‧‧‧ bearing surface

220、226‧‧‧支撐部 220, 226‧‧ ‧ support

222、322‧‧‧支撐面 222, 322‧‧‧ support surface

224、324‧‧‧導光斜面 224, 324‧‧‧Light guiding bevel

230‧‧‧凹槽 230‧‧‧ Groove

232‧‧‧底面 232‧‧‧ bottom

234‧‧‧側壁斜面 234‧‧‧ sidewall bevel

234e‧‧‧邊緣 234e‧‧‧ edge

240、340‧‧‧第一光波導 240, 340‧‧‧First optical waveguide

240a、340a‧‧‧第一反射平面 240a, 340a‧‧‧ first reflection plane

240b‧‧‧光柵配置區 240b‧‧‧Grating configuration area

242、260b‧‧‧缺口 242, 260b‧‧ ‧ gap

250‧‧‧間隙通道 250‧‧‧ clearance channel

250a‧‧‧入光口 250a‧‧‧Into the light port

250b‧‧‧出光口 250b‧‧‧Light outlet

260、360‧‧‧第二光波導 260, 360‧‧‧Second optical waveguide

260a、360a‧‧‧第二反射平面 260a, 360a‧‧‧second reflection plane

270‧‧‧繞射光柵 270‧‧‧Diffraction grating

270a‧‧‧曲面 270a‧‧‧ surface

272‧‧‧側平面 272‧‧‧Side plane

274‧‧‧凹陷 274‧‧‧ dent

276‧‧‧繞射結構 276‧‧‧Diffraction structure

278‧‧‧壁面 278‧‧‧ wall

280‧‧‧濾光片 280‧‧‧Filter

290‧‧‧光感測元件 290‧‧‧Light sensing components

320‧‧‧光柵承載部 320‧‧‧Grating carrier

θ1、θ5‧‧‧角度 Θ1, θ5‧‧‧ angle

θ3‧‧‧夾角 Θ3‧‧‧ angle

G1、T2‧‧‧寬度 G1, T2‧‧‧ width

L1‧‧‧訊號光 L1‧‧‧ Signal Light

L1a‧‧‧譜線光 L1a‧‧‧ line light

L2‧‧‧雜散光 L2‧‧‧ stray light

T1‧‧‧高度 T1‧‧‧ height

T3、T4‧‧‧距離 T3, T4‧‧‧ distance

圖1為習知一種光譜儀的剖面示意圖。 1 is a schematic cross-sectional view of a conventional spectrometer.

圖2A為本發明一實施例之光譜儀的外觀立體示意圖。 2A is a perspective view showing the appearance of a spectrometer according to an embodiment of the present invention.

圖2B為圖2A中光譜儀的內部結構的立體示意圖。 2B is a perspective view showing the internal structure of the spectrometer of FIG. 2A.

圖2C為圖2B中基座的立體示意圖。 2C is a perspective view of the base of FIG. 2B.

圖2D為圖2C中沿著B-B剖面所繪示的剖面示意圖。 2D is a schematic cross-sectional view taken along line B-B of FIG. 2C.

圖2E為圖2B中沿著A-A剖面所繪示的剖面示意圖。 2E is a schematic cross-sectional view taken along line A-A of FIG. 2B.

圖2F為圖2B中繞射光柵的立體示意圖。 2F is a perspective view of the diffraction grating of FIG. 2B.

圖2G為圖2F中繞射光柵的仰視示意圖。 2G is a bottom view of the diffraction grating of FIG. 2F.

圖2H為圖2A中光譜儀在繞射光柵處的剖面示意圖。 2H is a schematic cross-sectional view of the spectrometer of FIG. 2A at a diffraction grating.

圖3為本發明另一實施例之光譜儀在繞射光柵處的剖面示意圖。 3 is a schematic cross-sectional view of a spectrometer at a diffraction grating according to another embodiment of the present invention.

20‧‧‧光譜儀 20‧‧‧ Spectrometer

22‧‧‧光機 22‧‧‧Optical machine

200‧‧‧基座 200‧‧‧Base

206‧‧‧傳輸線 206‧‧‧ transmission line

208‧‧‧入光元件 208‧‧‧ light-in components

208a‧‧‧連接頭 208a‧‧‧Connecting head

208b‧‧‧狹縫件 208b‧‧‧slit parts

210‧‧‧載台 210‧‧‧Package

220、226‧‧‧支撐部 220, 226‧‧ ‧ support

230‧‧‧凹槽 230‧‧‧ Groove

240‧‧‧第一光波導 240‧‧‧First optical waveguide

240a‧‧‧第一反射平面 240a‧‧‧First reflection plane

240b‧‧‧光柵配置區 240b‧‧‧Grating configuration area

242、260b‧‧‧缺口 242, 260b‧‧ ‧ gap

250a‧‧‧入光口 250a‧‧‧Into the light port

250b‧‧‧出光口 250b‧‧‧Light outlet

260‧‧‧第二光波導 260‧‧‧Second optical waveguide

260a‧‧‧第二反射平面 260a‧‧‧second reflection plane

270‧‧‧繞射光柵 270‧‧‧Diffraction grating

280‧‧‧濾光片 280‧‧‧Filter

290‧‧‧光感測元件 290‧‧‧Light sensing components

L1‧‧‧訊號光 L1‧‧‧ Signal Light

L1a‧‧‧譜線光 L1a‧‧‧ line light

L2‧‧‧雜散光 L2‧‧‧ stray light

Claims (18)

一種光譜儀,包括:一光機,包括:一基座,包括一載台以及至少一個支撐部,該載台具有一承載面,而上述支撐部連接該載台;一第一光波導,具有一第一反射平面;一第二光波導,具有一第二反射平面,其中該第一光波導配置在該第二光波導與該承載面之間,且該第一反射平面與該第二反射平面彼此面對面,上述支撐部凸出於該承載面與該第一反射平面,並支撐該第二光波導,以使該第一反射平面與該第二反射平面之間形成一間隙通道;以及一繞射光柵,配置在該承載面上方,並用於將該間隙通道內傳遞的一訊號光分光,以形成多道譜線光;以及一光感測元件,接收該些譜線光。 A spectrometer comprising: a light machine comprising: a base comprising a stage and at least one support portion, the stage having a bearing surface, wherein the support portion is coupled to the stage; a first optical waveguide having a a first reflective plane; a second optical waveguide having a second reflective plane, wherein the first optical waveguide is disposed between the second optical waveguide and the carrying surface, and the first reflective plane and the second reflective plane Facing face to face, the support portion protrudes from the bearing surface and the first reflection plane, and supports the second optical waveguide to form a gap channel between the first reflection plane and the second reflection plane; and a winding A grating is disposed above the carrying surface and configured to split a signal light transmitted in the gap channel to form a plurality of spectral lines of light; and a light sensing component to receive the spectral lines. 如申請專利範圍第1項所述之光譜儀,其中上述支撐部位在該承載面的周圍,而該承載面位在該些支撐部的其中至少二者之間。 The spectrometer of claim 1, wherein the support portion is around the bearing surface, and the bearing surface is located between at least two of the support portions. 如申請專利範圍第1項所述之光譜儀,其中上述支撐部具有一支撐面以及一與該支撐面相連的導光斜面,該第二光波導配置在上述支撐面之上。 The spectrometer of claim 1, wherein the support portion has a support surface and a light guiding slope connected to the support surface, and the second optical waveguide is disposed on the support surface. 如申請專利範圍第3項所述之光譜儀,其中該載台更具有至少一凹槽,而該凹槽具有一底面以及一側壁斜面,該側壁斜面相連該底面、該承載面以及該導光斜面,該承載面與該底面不重疊。 The spectrometer of claim 3, wherein the stage further has at least one groove, and the groove has a bottom surface and a side wall inclined surface, the side wall inclined surface connecting the bottom surface, the bearing surface and the light guiding slope The bearing surface does not overlap the bottom surface. 如申請專利範圍第4項所述之光譜儀,其中該凹槽的數量為多個,而該承載面位在其中二個凹槽之間。 The spectrometer of claim 4, wherein the number of the grooves is plural, and the bearing surface is located between the two grooves. 如申請專利範圍第4項所述之光譜儀,其中該第一光波導凸出於該側壁斜面的一邊緣。 The spectrometer of claim 4, wherein the first optical waveguide protrudes from an edge of the bevel of the sidewall. 如申請專利範圍第1項所述之光譜儀,其中該第一光波導具有一對缺口,而其中上述支撐部延伸至該些缺口中。 The spectrometer of claim 1, wherein the first optical waveguide has a pair of notches, and wherein the support portion extends into the notches. 如申請專利範圍第1項所述之光譜儀,其中該第一光波導配置在該承載面上。 The spectrometer of claim 1, wherein the first optical waveguide is disposed on the carrying surface. 如申請專利範圍第1項所述之光譜儀,其中該第一反射平面具有一光柵配置區,而該繞射光柵配置在該第一反射平面上,並位在該光柵配置區內。 The spectrometer of claim 1, wherein the first reflecting plane has a grating arrangement area, and the diffraction grating is disposed on the first reflection plane and is located in the grating arrangement area. 如申請專利範圍第1項所述之光譜儀,其中該基座更包括一連接該載台的光柵承載部,該光柵承載部位在該承載面的周圍,並且凸出於該承載面與該第一反射平面,而該光柵承載部位在該第二光波導的下方,該繞射光柵配置在該光柵承載部上。 The spectrometer of claim 1, wherein the base further comprises a grating carrying portion connecting the loading platform, the grating carrying portion is around the carrying surface, and protrudes from the carrying surface and the first a plane of reflection, and the grating carrying portion is below the second optical waveguide, and the diffraction grating is disposed on the grating carrying portion. 如申請專利範圍第10項所述之光譜儀,其中該光柵承載部具有一支撐面以及一與該支撐面相連的導光斜面,該繞射光柵配置在該支撐面上,該導光斜面面對該第一光波導,該承載面與該支撐面由同一道製程所形成。 The spectrometer of claim 10, wherein the grating carrying portion has a supporting surface and a light guiding inclined surface connected to the supporting surface, the diffraction grating is disposed on the supporting surface, and the light guiding inclined surface faces In the first optical waveguide, the bearing surface and the supporting surface are formed by the same process. 如申請專利範圍第1項所述之光譜儀,其中該間隙通道具有一入光口以及一出光口,該訊號光從該入光口進入該間隙通道,而該繞射光柵將從該入光口來的該訊號光分光,以形成該些譜線光,該些譜線光從該繞射光柵朝向該出光口傳遞,上述支撐部不位在該訊號光的傳遞路徑上與該些譜線光的傳遞路徑上。 The spectrometer of claim 1, wherein the gap channel has an light entrance port and an light exit port, and the signal light enters the gap channel from the light entrance port, and the diffraction grating will be from the light entrance port The signal light is split to form the line light, and the line light is transmitted from the diffraction grating toward the light exit port, and the support portion is not located on the signal path of the signal light and the line light On the delivery path. 如申請專利範圍第12項所述之光譜儀,更包括一入光元件,該入光元件位在該入光口處,而該訊號光依序通過該入光元件與該入光口。 The spectrometer of claim 12, further comprising an optical component, wherein the optical component is located at the optical port, and the signal light sequentially passes through the optical component and the optical port. 如申請專利範圍第13項所述之光譜儀,其中該入光元件包括: 一連接頭,配置在該基座上;以及一狹縫件,配置在該連接頭與該入光口之間。 The spectrometer of claim 13, wherein the light-receiving element comprises: a connector disposed on the base; and a slit member disposed between the connector and the light entrance. 如申請專利範圍第12項所述之光譜儀,其中該入光口與該出光口形成在該第一反射平面與該第二反射平面之間。 The spectrometer of claim 12, wherein the light entrance and the light exit are formed between the first reflective plane and the second reflective plane. 如申請專利範圍第1項所述之光譜儀,其中上述支撐部具有一支撐面,該承載面與該支撐面由同一道製程所形成。 The spectrometer of claim 1, wherein the support portion has a support surface, and the support surface and the support surface are formed by the same process. 如申請專利範圍第1項所述之光譜儀,其中上述光感測元件配置於上述譜線光的聚焦範圍。 The spectrometer of claim 1, wherein the photo sensing element is disposed in a focus range of the line light. 一種光譜儀的光機,包括:一基座,包括一載台以及至少一個支撐部,該載台具有一承載面,而上述支撐部連接該載台;一第一光波導,具有一第一反射平面;以及一第二光波導,具有一第二反射平面,其中該第一光波導配置在該第二光波導與該承載面之間,且該第一反射平面與該第二反射平面彼此面對面,上述支撐部凸出於該承載面與該第一反射平面,並支撐該第二光波導,以使該第一反射平面與該第二反射平面之間形成一間隙通道,其中該間隙通道用於傳遞一訊號光與多道譜線光。 An optical machine of a spectrometer comprising: a base comprising a stage and at least one support portion, the stage having a bearing surface, wherein the support portion is coupled to the stage; a first optical waveguide having a first reflection And a second optical waveguide having a second reflective plane, wherein the first optical waveguide is disposed between the second optical waveguide and the carrying surface, and the first reflective plane and the second reflective plane face each other The support portion protrudes from the bearing surface and the first reflection plane, and supports the second optical waveguide to form a gap channel between the first reflection plane and the second reflection plane, wherein the gap channel is used Passing a signal light and multiple lines of light.
TW101138242A 2012-10-17 2012-10-17 Spectrometer and optical module thereof TWI457549B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW101138242A TWI457549B (en) 2012-10-17 2012-10-17 Spectrometer and optical module thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW101138242A TWI457549B (en) 2012-10-17 2012-10-17 Spectrometer and optical module thereof

Publications (2)

Publication Number Publication Date
TW201416648A true TW201416648A (en) 2014-05-01
TWI457549B TWI457549B (en) 2014-10-21

Family

ID=51293747

Family Applications (1)

Application Number Title Priority Date Filing Date
TW101138242A TWI457549B (en) 2012-10-17 2012-10-17 Spectrometer and optical module thereof

Country Status (1)

Country Link
TW (1) TWI457549B (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2016115720A1 (en) * 2015-01-23 2016-07-28 台湾超微光学股份有限公司 Spectrometer and optical input portion thereof
TWI778526B (en) * 2021-02-05 2022-09-21 鴻海精密工業股份有限公司 Design method of an imaging spectrometer having a single freeform concave grating

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN2784916Y (en) * 2005-04-27 2006-05-31 中国科学院长春光学精密机械与物理研究所 Structure of minisize optical fiber spectrometer
CN100434884C (en) * 2005-04-27 2008-11-19 中国科学院长春光学精密机械与物理研究所 Structure of miniature fibre-optical spectrograph and its making method of slit
TW201137328A (en) * 2010-04-19 2011-11-01 Oto Science Inc Optical mechanism of miniaturized optical spectrometer
TWI473981B (en) * 2010-04-20 2015-02-21 Oto Photonics Inc Optical module of micro spectrometer with tapered slit and slit structure thereof

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2016115720A1 (en) * 2015-01-23 2016-07-28 台湾超微光学股份有限公司 Spectrometer and optical input portion thereof
CN107003181A (en) * 2015-01-23 2017-08-01 台湾超微光学股份有限公司 Spectrometer and its light input unit
US10436639B2 (en) 2015-01-23 2019-10-08 Oto Photonics Inc. Spectrometer and optical input portion thereof
CN112362160A (en) * 2015-01-23 2021-02-12 台湾超微光学股份有限公司 Spectrometer and light input part thereof
TWI778526B (en) * 2021-02-05 2022-09-21 鴻海精密工業股份有限公司 Design method of an imaging spectrometer having a single freeform concave grating

Also Published As

Publication number Publication date
TWI457549B (en) 2014-10-21

Similar Documents

Publication Publication Date Title
EP1776567B1 (en) Spectrometer
US7081955B2 (en) Photodetector and spectrometer using the same
KR101774186B1 (en) Spectral module
KR20110008155A (en) Spectral module and method for manufacturing spectral module
KR20110125603A (en) Spectrometry apparatus, detection apparatus, and method for manufacturing spectrometry apparatus
US20200363323A1 (en) Spectrometer
CN201464039U (en) Miniature cylindrical mirror multi-grating spectrum analysis instrument
KR20120044909A (en) Spectral colorimetric apparatus and image forming apparatus including the same
JPH06229829A (en) Photoreceptor element array
TWI457549B (en) Spectrometer and optical module thereof
WO2011024590A1 (en) Optical unit
EP3400428B1 (en) High resolution broadband monolithic spectrometer and method
JP2009121986A (en) Spectral apparatus
US10436639B2 (en) Spectrometer and optical input portion thereof
JP2009058948A (en) Spectroscopy device, spectroscopy apparatus and spectroscopy method
US9273997B2 (en) Spectrometer, assembling method thereof, and assembling system
TWI519767B (en) Spectrometer and light input part thereof
JP2010008706A (en) Diffraction grating and spectrometer
KR101466385B1 (en) spectral module and method of manufacturing the same
JPWO2018070469A1 (en) Spectroscope and microscope equipped with the same
JP6306339B2 (en) Spectrometer
WO2023228451A1 (en) Optical detector and spectroscopic measurement device
US20230408335A1 (en) Spectrometer
TW201416647A (en) Optical head for receiving light and optical system using the same
TWI721210B (en) A design change spectrometer and a method of manufacturing the design change spectrometer

Legal Events

Date Code Title Description
GD4A Issue of patent certificate for granted invention patent
MM4A Annulment or lapse of patent due to non-payment of fees