TW201408381A - Pyrolysis curtain-style supersonic spray coating system - Google Patents

Pyrolysis curtain-style supersonic spray coating system Download PDF

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TW201408381A
TW201408381A TW101131676A TW101131676A TW201408381A TW 201408381 A TW201408381 A TW 201408381A TW 101131676 A TW101131676 A TW 101131676A TW 101131676 A TW101131676 A TW 101131676A TW 201408381 A TW201408381 A TW 201408381A
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slurry
substrate
spraying
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curtain type
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TW101131676A
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Lien-Shen Huang
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Infina Technology Co Ltd
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Abstract

A Pyrolysis curtain-style supersonic spray coating system is provided. The spray system includes a heating device for a usage of heating the surface of substrate, a sizing provider for not only store but also provide sizing, a curtain-style supersonic spray device, which nebulizes coating sizing while spraying, a maternal air floating board for making substrate float, a chain-displacement device for moving and replacing substrate, and a air recycle device, which recycle the air during the spay process.

Description

熱裂解超音波簾幕式噴塗系統 Thermal cracking ultrasonic curtain spray system

本發明係關於薄膜基板之生產製程系統,特別是使用簾幕式超音波霧化噴塗裝置,以熱裂解製程於非真空環境形成太陽能電池薄膜之系統與方法。 The present invention relates to a production process system for a film substrate, and more particularly to a system and method for forming a solar cell film in a non-vacuum environment by a thermal cracking process using a curtain type ultrasonic atomizing spray device.

矽晶太陽能電池發展趨勢為降低成本與提升效率,其中藉節省矽原料之使用以降低成本,各種設備均朝向薄型化矽晶片來開發,而薄型化趨勢將造成矽晶片破片之問題也越趨嚴重,因此製程設備在未來的發展趨勢也將走向整線式。如何提升矽晶太陽電池的效率與降低製造成本等課題,更是未來技術發展的重心。發展具有效率超過20%的矽晶太陽電池技術,也是迫切需求之關鍵技術。 The development trend of silicon solar cells is to reduce costs and improve efficiency. In order to reduce the cost by using the use of raw materials, various devices are developed toward thin silicon wafers, and the trend of thinning will cause the problem of chip fragmentation to become more serious. Therefore, the future development trend of process equipment will also move toward the whole line. How to improve the efficiency of twin crystal solar cells and reduce manufacturing costs is the focus of future technological development. The development of twin crystal solar cell technology with an efficiency of more than 20% is also a key technology for urgent needs.

高效率矽晶太陽能電池結構關鍵技術包括正向集光倒金字塔結構、選擇性射極、雙層抗反射層、背面鈍化膜和背面點電極等都是以昂貴的黃光製程與真空製程製作,造成量產的困難性,因此業界均致力於降低其生產成本並導入量產化。 Key technologies for high-efficiency twinned solar cell structures, including forward-collecting inverted pyramid structures, selective emitters, double-layer anti-reflective layers, backside passivation films, and backside electrodes are all produced in expensive yellow-light processes and vacuum processes. As a result of the difficulty of mass production, the industry is committed to reducing its production costs and introducing mass production.

目前公認最佳鈍化膜材料為氧化鋁薄膜,氧化鋁鍍膜設備普遍使用ALD和PECVD等設備,均需要在真空環境進行鍍膜製程,並使用昂貴原料甲基鋁,因此整體設備昂貴且鍍膜速率過慢造成量產困難,因此開發非真空之熱裂解噴塗氧化鋁設備將擁有低設備成本與低材料成本之兩大優勢,擁有強大競爭力。超音波噴塗設備,因可有效利用振盪使漿料溶合後均勻塗佈於基板,且可噴塗的面積尺寸愈來愈大,除鈍化薄膜鍍膜外,CIGS、透明導電薄膜和抗反射薄膜均可應用。 At present, the best passivation film material is recognized as aluminum oxide film. Alumina coating equipment generally uses equipment such as ALD and PECVD. Both of them need to be coated in a vacuum environment, and the expensive raw material methyl aluminum is used, so the overall equipment is expensive and the coating rate is too slow. The mass production is difficult, so the development of non-vacuum thermal cracking spray alumina equipment will have two advantages of low equipment cost and low material cost, and has strong competitiveness. Ultrasonic spraying equipment, because it can effectively use the oscillation to make the slurry evenly coated on the substrate, and the area of the sprayable area is getting larger and larger. In addition to the passivation film coating, CIGS, transparent conductive film and anti-reflective film can be used. application.

PERL(Passivated Emitter,Rear Locally-diffused)結構太陽能電池關鍵之製程之一是背面鈍化層,其中氧化鋁薄膜是目前公認背面鈍化膜之最佳材料,而目前氧化鋁鈍化膜鍍製以ALD(Atomic layer deposition)和PECVD(Plasma enhanced chemical vapor depostion)設備為主,ALD鍍製之氧化鋁薄膜雖然其應用在背面鈍化層,其品質與功效已被證實,但由於每次鍍膜循環僅鍍製一原子層約0.5nm之膜厚,因此鍍率緩慢限制其在太陽能電池上之應用,而PECVD設備雖有較佳鍍膜速率,但高真空與電漿系統增加了設備成本及無法大量生產,在降低生產成本的考量下,目前太陽電池產業界對其應用仍有疑慮。 One of the key processes for PERL (Passivated Emitter, Rear Locally-diffused) structured solar cells is the back passivation layer, in which the aluminum oxide film is currently the best material for the back passivation film, and the current alumina passivation film is plated with ALD (Atomic). Layer deposition) and PECVD (Plasma enhanced Chemical vapor depostion), although the ALD-plated aluminum oxide film has been applied to the back passivation layer, its quality and efficacy have been confirmed, but since only one atomic layer is coated with a film thickness of about 0.5 nm per coating cycle, Therefore, the plating rate is slow to limit its application on solar cells. Although PECVD equipment has a better coating rate, high vacuum and plasma systems increase equipment costs and cannot be mass-produced. Under the consideration of reducing production costs, current solar cells The industry still has doubts about its application.

本發明之主要目的在於有效解決一般噴塗加上後熱處理兩道處理程序所引起之多孔性(Porosity)與微裂隙(Micro crack)等困擾,導致薄膜品質遠不及真空製程的產品。 The main object of the present invention is to effectively solve the problems of porosity and micro crack caused by two processes of general spraying and post-heat treatment, resulting in a film quality far less than that of a vacuum process.

本發明之熱裂解噴塗系統能促使漿料更精準、更均勻噴塗。可以在非真空環境下工作,相較於ALD或是PECVD,不僅成本低而且可以有效提高產能。其中霧化技術,能有效的將液體崩裂為微小的液滴而集中噴塗在局部區塊,提高塗膜之均勻度及品質,使不同漿料都能有效均勻混合,經由基板上的高溫條件進而完成熱裂解與化學反應形成為所需之Al2O3鈍化層。另外溫度也會限制塗膜之薄膜品質與均勻性,故需設置冷卻與加熱控制系統,以解決噴塗所遇之困擾。 The thermal cracking spray system of the present invention promotes a more precise and uniform spray of the slurry. It can work in a non-vacuum environment. Compared to ALD or PECVD, it is not only low cost but also effective in increasing productivity. The atomization technology can effectively crack the liquid into tiny droplets and concentrate on spraying in local blocks to improve the uniformity and quality of the coating film, so that different slurry can be effectively and uniformly mixed, and then through the high temperature conditions on the substrate. The thermal cracking and chemical reaction are completed to form the desired Al 2 O 3 passivation layer. In addition, the temperature also limits the film quality and uniformity of the film, so a cooling and heating control system is required to solve the problem of spraying.

本發明揭露之熱裂解噴塗系統包括一加熱裝置,用於加熱基板,一漿料供應裝置,用於儲存及供給噴塗基板所需之漿料,一簾幕式超音波霧化噴塗裝置,用於霧化漿料並使漿料以簾幕狀噴出,使霧化之漿料裂解後再反應並於基板上形成薄膜,一入料氣浮機構,一出料氣浮機構,用於使基板漂浮,一鏈條帶動之移位裝置,用於可調速、定速移動及定位基板,一氣體回收裝置,用於回收噴塗過程散逸之氣體;其中簾幕式超音波噴塗裝置包含一振盪器裝置、一振盪器恆溫裝置、一霧化槽體、一霧化氣體儲存槽、一風刀及一風刀恆溫裝置,振盪器裝置固定於基座上。該霧化槽體具有一漿料注入口、一漿料出口、一流體注入口及一流體出口。霧化槽體下層存放交連流體,上層存放漿料,上下層之間以隔層隔離,噴塗所需之漿料由漿料注入口注入霧化槽體,霧化所需之交連流體由流體注入口注入,該流體注入口、流體出口與振盪器恆溫裝置形成一循環迴路,提供振盪器振盪最佳工作溫度。霧化槽體上方配置一霧化氣體儲存槽,該霧化氣體儲存槽具有一進氣口用於輸入氣體,氣源 進入該霧化氣體儲存槽後藉由風刀將霧化漿料帶出噴塗。 The pyrolysis spraying system disclosed in the present invention comprises a heating device for heating a substrate, a slurry supply device for storing and supplying the slurry required for spraying the substrate, and a curtain type ultrasonic atomizing spraying device for The slurry is atomized and the slurry is sprayed in a curtain shape, and the atomized slurry is cracked and then reacted to form a film on the substrate. A feed air floating mechanism and an air flotation mechanism are used to float the substrate. a chain-driven shifting device for adjustable speed, fixed-speed movement and positioning of the substrate, a gas recovery device for recovering the gas dissipated during the spraying process; wherein the curtain-type ultrasonic spraying device comprises an oscillator device, An oscillator thermostat, an atomization tank, an atomizing gas storage tank, an air knife and a wind knife thermostat, the oscillator device is fixed on the base. The atomization tank body has a slurry injection port, a slurry outlet, a fluid injection port and a fluid outlet. The lower layer of the atomization tank stores the cross-linking fluid, the upper layer stores the slurry, and the upper and lower layers are separated by a partition layer. The slurry required for spraying is injected into the atomization tank body through the slurry injection port, and the cross-linking fluid required for atomization is injected by the fluid. The inlet injection, the fluid injection port, the fluid outlet and the oscillator thermostat form a circulation loop that provides an optimal operating temperature for the oscillator oscillation. An atomizing gas storage tank is disposed above the atomizing tank body, and the atomizing gas storage tank has an air inlet for inputting gas and a gas source After entering the atomizing gas storage tank, the atomized slurry is taken out of the spray by an air knife.

風刀具有一流體注入口、一流體出口及一風刀恆溫裝置,該流體注入口、流體出口與風刀恆溫裝置形成一循環迴路,用於保持風刀溫度。 The wind cutter has a fluid injection port, a fluid outlet and a wind knife thermostat. The fluid injection port, the fluid outlet and the air knife thermostat form a circulation loop for maintaining the air knife temperature.

氣體回收裝置具有上、下霧氣收集器,用於回收噴塗過程散逸之霧氣並將有毒之氣體過濾冷卻再由氣體排出裝置排出回收。 The gas recovery device has an upper and a lower mist collector for recovering the mist which is dissipated during the spraying process, and filtering and cooling the toxic gas and discharging it by the gas discharge device.

漿料供應裝置包含一漿料儲存槽,該漿料儲存槽具有一漿料補充口、一漿料輸出口、一漿料回收注入口,該漿料輸出口透過管路,經由幫浦輸送漿料至簾幕式超音波噴塗裝置,該漿料輸出口、漿料回收注入口與霧化槽體形成一漿料循環迴路,用於使漿料在漿料儲存槽與噴塗裝置之間循環,連續定量補料。 The slurry supply device comprises a slurry storage tank having a slurry replenishing port, a slurry output port, and a slurry recovery injection port, wherein the slurry output port passes through the pipeline and delivers the slurry through the pump Feeding to the curtain type ultrasonic spraying device, the slurry output port, the slurry recovery injection port and the atomization tank body form a slurry circulation loop for circulating the slurry between the slurry storage tank and the spraying device. Continuous dosing.

氣浮機構具有底面氣體入口及表面噴出口,該氣浮機構使上方之基板浮起,與氣浮機構不相接觸,氣浮機構包含一入料氣浮機構,用於加熱及浮升基板,一出料氣浮機構,用於冷卻及浮升基板。 The air floating mechanism has a bottom gas inlet and a surface spray outlet, wherein the air floating mechanism floats the upper substrate and is not in contact with the air floating mechanism, and the air floating mechanism includes a feed air floating mechanism for heating and lifting the substrate. A discharge air float mechanism for cooling and lifting the substrate.

加熱裝置包含複數個可設定溫度之精密IR加熱模組,配置於基板入口上方,可分段定溫加熱,使基板由低溫漸次加熱到所需溫度,使基板達到設計溫度。 The heating device comprises a plurality of precision IR heating modules capable of setting the temperature, and is arranged above the inlet of the substrate, and can be heated by the stepwise heating, so that the substrate is gradually heated from the low temperature to the required temperature, so that the substrate reaches the design temperature.

移位裝置用於運送基板,使基板依序經過入料氣浮機構、加熱裝置、簾幕式超音波噴塗裝置及出料氣浮機構。 The shifting device is configured to transport the substrate, and the substrate is sequentially passed through the feeding air floating mechanism, the heating device, the curtain type ultrasonic spraying device and the discharging air floating mechanism.

氣體排出裝置配置於加熱裝置上方,包含一排風扇、一散熱機構、一排風口,該氣體排出裝置係將熱氣冷卻排出至排風管,過濾收集。 The gas discharge device is disposed above the heating device, and comprises a row of fans, a heat dissipating mechanism, and a venting port. The gas discharging device cools the hot air to the exhaust pipe and collects by filtration.

本發明之噴塗系統包括一加熱裝置,用於加熱基板,一漿料供應裝置,用於儲存及供給噴塗基板所需之漿料,一簾幕式超音波霧化噴塗裝置,用於霧化漿料並使漿料以簾幕狀噴出,使霧化之漿料裂解後再反應並於基板上形成薄膜,一入料氣浮機構,一出料氣浮機構,用於使基板漂浮,一鏈條帶動之移位裝置,用於可調速、定速移動及定位基板,一氣體回收裝置,用於回收噴塗過程散逸之氣體。 The spraying system of the invention comprises a heating device for heating the substrate, a slurry supply device for storing and supplying the slurry required for spraying the substrate, and a curtain type ultrasonic atomizing spraying device for atomizing the slurry And spraying the slurry in the form of a curtain, so that the atomized slurry is cracked and then reacted to form a film on the substrate, a feed air floating mechanism, and an air flotation mechanism for floating the substrate, a chain The displacement device is used for adjustable speed, constant speed movement and positioning of the substrate, and a gas recovery device for recovering the gas which is dissipated during the spraying process.

第1圖係顯示熱裂解超音波簾幕式噴塗系統之主要結構(1),包含簾幕式超音波霧化噴塗裝置(2)、漿料供應裝置(3)、氣體回收裝置(4)、氣浮機構(5)、加熱裝置(6)、移位裝置(7)、氣體排出裝置(8)、基板(9)及簾幕狀霧化之漿料(10)。 Figure 1 shows the main structure (1) of the pyrolysis ultrasonic curtain spray system, including a curtain type ultrasonic atomizing spray device (2), a slurry supply device (3), a gas recovery device (4), Air floatation mechanism (5), heating device (6), displacement device (7), gas discharge device (8), substrate (9) and curtain-like atomized slurry (10).

第2圖係說明本發明之熱裂解超音波簾幕式噴塗裝置(2),其包含一基座(21)、一振盪器裝置(22)、一霧化槽體(23)、一隔膜(24)、一第一道隔膜壓板(25)、一第二道隔膜壓板(26)、一霧化氣體儲存槽(27)以及一風刀(28),振盪器裝置固定於基座上,該霧化槽體具有一漿料注入口(23a)、一漿料出口(23b)、一流體注入口(23c)及一流體出口(23d)。霧化槽體下層儲存交連流體,上層存放漿料,上下層之間以膜層隔離,噴塗所需之漿料由漿料注入口(23a)注入霧化槽體,霧化所需之交連流體由流體注入口(23c)注入,該流體注入口(23c)、流體出口(23d)與振盪器恆溫裝置(23e)形成一循環迴路,提供振盪器振盪最佳工作溫度。透過振盪器裝置(22)振動交連流體,使漿料於霧化槽體內霧化,霧化槽體上方配置隔膜(24)用以防止霧化之漿料散逸,隔膜上方配置第一道隔膜壓板(25)及第二道隔膜壓板(26),用於固定隔膜及防止霧化氣體洩漏。霧化之漿料儲存於霧化氣體儲存槽(27),風刀(28)所需之氣源由進氣口(27a)進入,藉由風刀(28)將霧化之漿料噴出。風刀具有一流體注入口(28a)、一流 體出口(28b)及一風刀恆溫裝置(28c),該流體注入口、流體出口與風刀恆溫裝置形成一循環迴路,用於保持風刀溫度。 2 is a view showing a pyrolysis ultrasonic curtain type spraying device (2) of the present invention, which comprises a base (21), an oscillator device (22), an atomization tank body (23), and a diaphragm ( 24) a first diaphragm pressing plate (25), a second diaphragm pressing plate (26), an atomizing gas storage tank (27) and a wind knife (28), wherein the oscillator device is fixed on the base, The atomization tank has a slurry injection port (23a), a slurry outlet (23b), a fluid injection port (23c) and a fluid outlet (23d). The lower layer of the atomization tank stores the cross-linking fluid, the upper layer stores the slurry, and the upper and lower layers are separated by a membrane layer, and the slurry required for spraying is injected into the atomization tank body through the slurry injection port (23a), and the interconnecting fluid required for atomization is atomized. Injected by the fluid injection port (23c), the fluid injection port (23c) and the fluid outlet (23d) form a circulation loop with the oscillator thermostat (23e) to provide an optimal operating temperature for the oscillator oscillation. Vibrating the fluid through the oscillator device (22) to atomize the slurry in the atomization tank. A diaphragm (24) is disposed above the atomization tank to prevent the atomized slurry from being dissipated, and the first diaphragm plate is disposed above the diaphragm. (25) and a second diaphragm platen (26) for fixing the diaphragm and preventing leakage of the atomizing gas. The atomized slurry is stored in the atomizing gas storage tank (27), and the air source required for the air knife (28) is entered by the air inlet (27a), and the atomized slurry is ejected by the air knife (28). The wind cutter has a fluid injection port (28a), first-class The body outlet (28b) and a wind knife thermostat (28c), the fluid injection port, the fluid outlet and the air knife thermostat form a circulation loop for maintaining the air knife temperature.

第3圖係漿料供應裝置,漿料由漿料補充口(33)充填進入儲存槽(34)內,漿料輸出口(31)透過管路,經由幫浦輸送漿料至簾幕式超音波噴塗裝置(2)。霧化槽體(23)下層存放交連流體,上層存放漿料,上下層之間以膜層隔離,噴塗所需之漿料由漿料注入口(23a)注入霧化槽體。該漿料輸出口(31)、漿料回收注入口(32)與霧化槽體(23)形成一漿料循環迴路,用於使漿料在漿料儲存槽與噴塗裝置之間循環,連續定量補料。 Figure 3 is a slurry supply device. The slurry is filled into the storage tank (34) by the slurry replenishing port (33), and the slurry output port (31) is passed through the pipeline to transport the slurry through the pump to the curtain type super Sound wave spraying device (2). The lower layer of the atomization tank body (23) stores the cross fluid, the upper layer stores the slurry, and the upper and lower layers are separated by a membrane layer, and the slurry required for spraying is injected into the atomization tank body from the slurry injection port (23a). The slurry output port (31), the slurry recovery injection port (32) and the atomization tank body (23) form a slurry circulation loop for circulating the slurry between the slurry storage tank and the spraying device. Quantitative feeding.

第4圖係說明本發明所揭露之氣浮機構(5),為了避免基板(9)於噴塗過程受到機械組件刮傷,利用氣浮機構產生向上噴發之氣流,使基板呈漂浮之狀態進行噴塗製程,氣浮機構包含入料氣浮機構(51)與出料氣浮機構(52),入料氣浮機構配置於噴塗裝置之前,入料氣浮機構內設置加熱模組(53)用於使氣體溫度升高。氣浮機構另包含出料氣浮機構,出料氣浮機構配置於噴塗裝置之後。 Figure 4 is a view showing the air floating mechanism (5) disclosed in the present invention. In order to prevent the substrate (9) from being scratched by the mechanical component during the spraying process, the air-floating mechanism is used to generate an upwardly ejected airflow to spray the substrate in a floating state. The process, the air floatation mechanism comprises a feed air float mechanism (51) and a discharge air float mechanism (52), the feed air float mechanism is arranged before the spray device, and a heating module (53) is arranged in the feed air float mechanism for Increase the temperature of the gas. The air floatation mechanism further comprises a discharge air float mechanism, and the discharge air float mechanism is disposed behind the spray device.

第5圖係說明本發明所揭露之加熱裝置(6),加熱裝置包含複數個可設定溫度之精密IR加熱模組(61),配置於基板入口上方,接近基板入口之加熱器溫度設定最低,其餘加熱器設定之溫度漸次升高,使基板溫度可漸次升高至500℃。 Figure 5 is a diagram showing a heating device (6) according to the present invention. The heating device comprises a plurality of temperature-programmable precision IR heating modules (61) disposed above the substrate inlet, and the heater temperature setting near the substrate inlet is the lowest. The temperature set by the remaining heaters is gradually increased, so that the substrate temperature can be gradually increased to 500 °C.

第6圖係說明本發明所揭露之移位裝置(7),移位裝置包含驅動馬達(71)及鏈條(72),鏈條上間隔配置複數個牽引單元(73),鏈條移動時,由牽引單元牽動基板移動。 Figure 6 is a view showing a displacement device (7) according to the present invention. The displacement device includes a drive motor (71) and a chain (72), and a plurality of traction units (73) are arranged on the chain, and the chain is moved by the traction. The unit moves the substrate to move.

以下說明本發明熱裂解超音波簾幕式基板噴塗之方法。基板首先放置於入料氣浮機構前端,藉由入料氣浮機構浮升及浮動基板,再由移位裝置導引基板進入加熱裝置下方,依序經過複數個可設定溫度之加熱器,使基板溫度漸次升高至裂解所需 溫度,基板加熱後進行噴塗,設置一超音波簾幕式噴塗裝置於基板下方,該超音波簾幕式噴塗裝置霧化漿料並將霧化之漿料自基板下方向上噴塗,使霧化之漿料裂解後再反應並於基板下表面上形成薄膜,成膜之基板由移位裝置移出,經由出料氣浮機構冷卻,最後將基板移出噴塗系統。依據本發明揭露之方法,霧化之漿料由基板下方,向上噴塗,有利於在非真空高溫狀態下,加熱裝置產生之熱梯度所形成之氣流方向與噴塗方向一致。 The method of spraying the thermally cracked ultrasonic curtain substrate of the present invention will now be described. The substrate is first placed at the front end of the feed air floating mechanism, and the substrate is floated and floated by the feed air floating mechanism, and then the substrate is guided by the shifting device to enter the heating device, and sequentially passes through a plurality of heaters capable of setting the temperature. The substrate temperature is gradually increased to the required cracking Temperature, the substrate is heated and sprayed, and an ultrasonic curtain type spraying device is disposed under the substrate, the ultrasonic curtain type spraying device atomizes the slurry and sprays the atomized slurry upward from the bottom of the substrate to make the atomization After the slurry is lysed, it is reacted and a film is formed on the lower surface of the substrate. The film-formed substrate is removed by the displacement device, cooled by the discharge air-floating mechanism, and finally the substrate is removed from the spray system. According to the method disclosed by the invention, the atomized slurry is sprayed upward from the bottom of the substrate, which is favorable for the direction of the airflow formed by the thermal gradient generated by the heating device in the non-vacuum high temperature state to be consistent with the spraying direction.

1‧‧‧熱裂解噴塗設備之系統結構 1‧‧‧System structure of thermal cracking equipment

2‧‧‧簾幕式超音波霧化噴塗裝置 2‧‧‧ Curtain type ultrasonic atomizing spraying device

21‧‧‧基座 21‧‧‧Base

22‧‧‧振盪器裝置 22‧‧‧Oscillator

23‧‧‧霧化槽體 23‧‧‧Atomization tank

23a‧‧‧漿料注入口 23a‧‧‧ slurry injection port

23b‧‧‧漿料出口 23b‧‧‧Slurry exports

23c‧‧‧流體注入口 23c‧‧‧ fluid injection port

23d‧‧‧流體出口 23d‧‧‧Fluid outlet

23e‧‧‧振盪器恆溫裝置 23e‧‧‧Oscillator thermostat

24‧‧‧隔膜 24‧‧‧Separator

25‧‧‧第一道隔膜壓板 25‧‧‧First diaphragm platen

26‧‧‧第二道隔膜壓板 26‧‧‧Second diaphragm presser

27‧‧‧霧化氣體儲存槽 27‧‧‧Atomizing gas storage tank

27a‧‧‧進氣口 27a‧‧‧air inlet

28‧‧‧風刀 28‧‧‧Air knife

28a‧‧‧流體注入口 28a‧‧‧Fluid injection port

28b‧‧‧流體出口 28b‧‧‧Fluid export

28c‧‧‧風刀恆溫裝置 28c‧‧‧Air knife thermostat

3‧‧‧漿料供應裝置 3‧‧‧Slurry supply unit

31‧‧‧漿料輸出口 31‧‧‧Slurry outlet

32‧‧‧漿料回收注入口 32‧‧‧Slurry recovery injection port

33‧‧‧漿料補充口 33‧‧‧Slurry refill

34‧‧‧儲存槽 34‧‧‧ Storage tank

5‧‧‧氣浮機構 5‧‧‧Air floatation mechanism

51‧‧‧入料氣浮機構 51‧‧‧Incoming air flotation mechanism

52‧‧‧出料氣浮機構 52‧‧‧Outlet air floatation mechanism

53‧‧‧加熱模組 53‧‧‧heating module

54‧‧‧氣體入口 54‧‧‧ gas inlet

55‧‧‧氣體出口 55‧‧‧ gas export

6‧‧‧加熱裝置 6‧‧‧ heating device

61‧‧‧精密IR加熱模組 61‧‧‧Precision IR heating module

62‧‧‧固定板 62‧‧‧ fixed plate

7‧‧‧移位裝置 7‧‧‧Shift device

71‧‧‧驅動馬達 71‧‧‧Drive motor

72‧‧‧鏈條 72‧‧‧Chain

73‧‧‧牽引單元 73‧‧‧ traction unit

74‧‧‧基板進入位置 74‧‧‧Substrate entry position

75‧‧‧基板輸出位置 75‧‧‧Substrate output position

9‧‧‧基板 9‧‧‧Substrate

10‧‧‧簾幕狀霧化之漿料 10‧‧‧ Curtain-like atomized slurry

圖1係熱裂解超音波簾幕式噴塗系統之主要結構 Figure 1 shows the main structure of a pyrolysis ultrasonic curtain spray system

圖2係簾幕式超音波霧化噴塗裝置 Figure 2 is a curtain type ultrasonic atomizing spray device

圖3係漿料供應裝置 Figure 3 is a slurry supply device

圖4係氣浮機構 Figure 4 is an air flotation mechanism

圖5係加熱裝置 Figure 5 is a heating device

圖6係移位裝置 Figure 6 is a shifting device

1‧‧‧熱裂解超音波簾幕式噴塗系統 1‧‧‧Thermal cracking ultrasonic curtain spray system

2‧‧‧簾幕式超音波霧化噴塗裝置 2‧‧‧ Curtain type ultrasonic atomizing spraying device

3‧‧‧漿料供應裝置 3‧‧‧Slurry supply unit

4‧‧‧氣體回收裝置 4‧‧‧ gas recovery unit

5‧‧‧氣浮機構 5‧‧‧Air floatation mechanism

51‧‧‧入料氣浮機構 51‧‧‧Incoming air flotation mechanism

52‧‧‧出料氣浮機構 52‧‧‧Outlet air floatation mechanism

6‧‧‧加熱裝置 6‧‧‧ heating device

7‧‧‧移位裝置 7‧‧‧Shift device

8‧‧‧氣體排出裝置 8‧‧‧ gas discharge device

9‧‧‧基板 9‧‧‧Substrate

10‧‧‧簾幕狀霧化之漿料 10‧‧‧ Curtain-like atomized slurry

Claims (9)

一種熱裂解簾幕式超音波基板噴塗系統,包括一簾幕式超音波霧化噴塗裝置,用於霧化漿料並使漿料以簾幕狀噴出,一加熱裝置,用於加熱基板,該加熱裝置配置於基板上方,該簾幕式超音波霧化噴塗裝置配置於基板下方,使霧化之漿料裂解後再反應並於基板表面形成薄膜。 A thermal cracking curtain type ultrasonic substrate spraying system, comprising a curtain type ultrasonic atomizing spraying device for atomizing a slurry and spraying the slurry in a curtain shape, and a heating device for heating the substrate, The heating device is disposed above the substrate, and the curtain type ultrasonic atomizing spraying device is disposed under the substrate, and the atomized slurry is cracked and then reacted to form a film on the surface of the substrate. 如申請專利範圍第1項之熱裂解簾幕式超音波噴塗系統,更包含一漿料供應裝置,用於儲存及供給噴塗基板所需之漿料,一氣體回收單元,用於回收噴塗過程散逸之霧化氣體,一入料氣浮機構,用於浮升基板,一出料氣浮機構,用於浮升基板,一基板移位裝置,用於定速噴塗及定位基板。 For example, the pyrolysis curtain type ultrasonic spraying system of claim 1 further comprises a slurry supply device for storing and supplying the slurry required for spraying the substrate, and a gas recovery unit for recycling the spraying process. The atomizing gas, an incoming air floating mechanism, is used for floating the substrate, an discharging air floating mechanism, for lifting the substrate, and a substrate shifting device for the fixed speed spraying and positioning of the substrate. 如申請專利範圍第2項之熱裂解簾幕式超音波噴塗系統,其中之簾幕式超音波噴塗裝置包含一振盪器、一振盪器恆溫裝置、一霧化槽體、一霧化氣體儲存槽、一風刀及一風刀恆溫裝置,振盪器固定於基座上,該霧化槽體具有一漿料注入口、一漿料出口、一流體注入口及一流體出口,霧化槽體下層存放交連流體,上層存放漿料,上下層之間以膜層隔離,噴塗所需之漿料由漿料注入口注入霧化槽體,霧化所需之交連流體由流體注入口注入,該流體注入口、流體出口與振盪器恆溫裝置形成一循環迴路,提供振盪器振盪最佳工作溫度。霧化槽體上方配置一霧化氣體儲存槽,該霧化氣體儲存槽具有一進氣口用於輸入潔淨氣體,氣源進入該霧化氣體儲存槽後藉由風刀將霧化漿料帶出噴塗。 For example, in the thermal cracking curtain type ultrasonic spraying system of claim 2, the curtain type ultrasonic spraying device comprises an oscillator, an oscillator thermostat, an atomizing tank body, and an atomizing gas storage tank. a wind knife and a wind knife thermostat device, the oscillator is fixed on the base, the atomization tank body has a slurry injection port, a slurry outlet, a fluid injection port and a fluid outlet, and the atomization tank body lower layer The fluid is stored in the upper layer, the upper layer stores the slurry, and the upper and lower layers are separated by a membrane layer. The slurry required for spraying is injected into the atomization tank from the slurry injection port, and the fluid to be atomized is injected from the fluid injection port. The inlet, fluid outlet and oscillator thermostat form a loop that provides optimum operating temperature for oscillator oscillation. An atomizing gas storage tank is disposed above the atomizing tank body, the atomizing gas storage tank has an air inlet for inputting clean gas, and the gas source enters the atomizing gas storage tank, and the atomized slurry is taken by the air knife Spray out. 如申請專利範圍第3項之熱裂解簾幕式超音波噴塗系統,其中之漿料供應裝置包含一漿料儲存槽,該漿料儲存槽具有一漿料補充口、一漿料輸出口、一漿料回收注入口,該漿料輸出口透過管路經由幫浦輸送漿料至簾幕式超音波噴塗裝置,該漿料輸出口、漿料回收注入口與霧化槽體形成一漿料循環迴路,用於使漿料在漿料儲存槽與噴塗裝置之間循環,連續定量補料。 The thermal cracking curtain type ultrasonic spraying system of claim 3, wherein the slurry supply device comprises a slurry storage tank having a slurry replenishing port, a slurry output port, and a The slurry recovery injection port, the slurry output port transmits the slurry through the pipeline through the pump to the curtain type ultrasonic spraying device, and the slurry output port, the slurry recovery injection port and the atomization tank body form a slurry cycle A circuit for circulating the slurry between the slurry storage tank and the spraying device for continuous dosing. 如申請專利範圍第4項之熱裂解簾幕式超音波噴塗系統,其中之加熱裝置包含複數個可設定溫度之精密IR加熱模組,配置於基板入口上方,可分段定溫加熱,使基板由低溫漸次加熱到所需溫度,確保基板完整移動。 For example, in the thermal cracking curtain type ultrasonic spraying system of claim 4, the heating device comprises a plurality of precision IR heating modules capable of setting the temperature, and is arranged above the substrate inlet, and can be heated by the section temperature to make the substrate low temperature. Gradually heat to the desired temperature to ensure complete substrate movement. 如申請專利範圍第5項之熱裂解簾幕式超音波噴塗系統,其中之氣浮機構具有一氣體入口及複數個氣體出口,用於使基板浮升。 For example, in the pyrolysis curtain type ultrasonic spraying system of claim 5, the air floating mechanism has a gas inlet and a plurality of gas outlets for lifting the substrate. 如申請專利範圍第6項之熱裂解簾幕式超音波噴塗系統,其中之基板移位裝置,用於運送基板,使基板進入噴塗系統定速噴塗,依序經過入料氣浮機構、加熱裝置、簾幕式超音波噴塗裝置及出料氣浮機構。 For example, in the thermal cracking curtain type ultrasonic spraying system of claim 6, wherein the substrate shifting device is used for transporting the substrate, and the substrate is sprayed into the spraying system at a constant speed, and sequentially passes through the feeding air floating mechanism and the heating device. , curtain type ultrasonic spraying device and discharging air floating mechanism. 如申請專利範圍第7項之熱裂解簾幕式超音波噴塗系統,其中之氣體回收單元具有上、下霧氣收集器,過濾回收之噴塗氣體。 For example, in the thermal cracking curtain type ultrasonic spraying system of claim 7, wherein the gas recovery unit has an upper and a lower mist collector, and the recovered spraying gas is filtered. 一種基板噴塗方法,包括:配置一加熱裝置於基板上方,加熱基板,使基板溫度可升溫至500℃,配置一簾幕式超音波噴塗裝置於基板下方,將霧化之漿料以簾幕狀噴塗於基板表面,使霧化之漿料裂解後再反應於基板表面形成薄膜。 A substrate spraying method comprises: disposing a heating device on a substrate, heating the substrate, heating the substrate to a temperature of 500 ° C, and arranging a curtain type ultrasonic spraying device under the substrate to form the atomized slurry in a curtain shape Sprayed on the surface of the substrate to lyse the atomized slurry and then react on the surface of the substrate to form a film.
TW101131676A 2012-08-31 2012-08-31 Pyrolysis curtain-style supersonic spray coating system TW201408381A (en)

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