TW201406913A - Dicing sheet - Google Patents

Dicing sheet Download PDF

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TW201406913A
TW201406913A TW102117704A TW102117704A TW201406913A TW 201406913 A TW201406913 A TW 201406913A TW 102117704 A TW102117704 A TW 102117704A TW 102117704 A TW102117704 A TW 102117704A TW 201406913 A TW201406913 A TW 201406913A
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Taiwan
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dicing sheet
adhesive layer
mass
resin
energy ray
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TW102117704A
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Chinese (zh)
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TWI580755B (en
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Takuo Nishida
Michio Kanai
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Lintec Corp
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6835Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L21/6836Wafer tapes, e.g. grinding or dicing support tapes
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    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L93/00Compositions of natural resins; Compositions of derivatives thereof
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    • C09J11/00Features of adhesives not provided for in group C09J9/00, e.g. additives
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    • C09J133/00Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
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    • C09J133/00Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
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    • C09J4/00Adhesives based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; adhesives, based on monomers of macromolecular compounds of groups C09J183/00 - C09J183/16
    • C09J4/06Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09J159/00 - C09J187/00
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    • C09J7/00Adhesives in the form of films or foils
    • C09J7/30Adhesives in the form of films or foils characterised by the adhesive composition
    • C09J7/38Pressure-sensitive adhesives [PSA]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
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    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
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    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
    • H01L21/56Encapsulations, e.g. encapsulation layers, coatings
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    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L2205/00Polymer mixtures characterised by other features
    • C08L2205/03Polymer mixtures characterised by other features containing three or more polymers in a blend
    • C08L2205/035Polymer mixtures characterised by other features containing three or more polymers in a blend containing four or more polymers in a blend
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    • C09J2203/00Applications of adhesives in processes or use of adhesives in the form of films or foils
    • C09J2203/326Applications of adhesives in processes or use of adhesives in the form of films or foils for bonding electronic components such as wafers, chips or semiconductors
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    • C09J2301/00Additional features of adhesives in the form of films or foils
    • C09J2301/30Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier
    • C09J2301/312Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier parameters being the characterizing feature
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    • C09J2493/00Presence of natural resin
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/68327Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
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    • H01L2221/683Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
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    • H01L2221/68327Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
    • H01L2221/68336Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding involving stretching of the auxiliary support post dicing
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    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
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Abstract

A dicing sheet in which the possibility of the occurrence of defects can be reduced in all of a dicing step, an expanding step and a pick-up step. As such a dicing sheet, a dicing sheet (1) is provided, which comprises a base (2) and an adhesive agent layer (3) laminated on at least one surface of the base (2), wherein the adhesive agent layer is formed from an adhesive agent composition comprising an acrylic polymer (A) that is an acrylic polymer-based component, an energy-ray-polymerizable compound (B) and an adhesiveness-imparting resin (C), the adhesiveness-imparting resin (C) contains a polymerized rosin ester (C1) and also contains a disproportionated rosin ester (C2) and/or a petroleum-derived resin (C3), the content ratio of the polymerized rosin ester (C1) contained in the adhesive agent composition is 5 parts by mass relative to 100 parts by mass of the acrylic polymer (A), and the ratio of an adhesion force of the dicing sheet as measured after the irradiation with an energy ray to that as measured before the irradiation with the energy ray is 3 or more wherein each of the adhesion forces is measured by carrying out a 180 DEG peeling test in accordance with JIS Z0237:2000 employing an exposed surface of the adhesive agent layer which is opposed to a side of the adhesive agent layer which faces the base as a surface to be measured and a resin-sealed surface of a semiconductor package as a surface which is to be adhered to the adhesive agent layer.

Description

切割片 Cutting piece

本發明係關於用在切割樹脂封裝複數半導體晶片而成之半導體構裝時之切割片。 The present invention relates to a dicing sheet for use in a semiconductor package in which a resin is packaged to encapsulate a plurality of semiconductor wafers.

半導體晶片被樹脂封裝之半導體零件(在於本說明書稱為「封膠晶片」。),通常如下製作。首先,將半導體晶片搭載於,TAB帶等之連接複數基台而成之集合體之各基台,將該等半導體晶片一起樹脂封裝得到電子零件集合體(在於本說明書,稱為「半導體構裝」。)。其次,藉由在於半導體構裝之一方的面,黏貼包括基材與黏著劑層之黏著片(於本說明書稱為「切割片」。)將半導體構裝固定於切割片。將固定於該切割片之半導體構裝切斷分離(切割)個片化,製作複數的封膠晶片近接配置於切割片上之構件(切割步驟)。通常,切割片之黏著劑層,係設計成可藉由特定的刺激使黏著劑層之黏著性降低,特定的刺激,例如採用,能量線照射。然後,在進行以下的步驟之前,包含對切割片照射能量線,使黏著劑層之黏著性降低之步驟。接著,將在於該構件之切割片擴展(向主面內方向伸長),擴大配置於切割片上之封膠晶片之間隔(擴展步驟)。將如此地將在於切割片上以互相離間的狀態之封膠晶片,個別拾取由切割片分離(拾取步驟)移送致下一步驟。此時, 藉由包含使上述黏著劑層之黏著性降低的步驟,可使拾取步驟容易化。 A semiconductor component in which a semiconductor wafer is encapsulated by a resin (referred to as a "sealing chip" in this specification) is usually produced as follows. First, the semiconductor wafer is mounted on each of the aggregates in which the plurality of bases are connected by a TAB tape or the like, and the semiconductor wafers are resin-sealed together to obtain an electronic component assembly (in the present specification, it is referred to as "semiconductor assembly". ".). Next, an adhesive sheet including a substrate and an adhesive layer (referred to as a "cut sheet" in the present specification) is attached to one side of the semiconductor package to fix the semiconductor structure to the dicing sheet. The semiconductor structure fixed to the dicing sheet is cut (separated) and sliced, and a plurality of members are disposed in the vicinity of the dicing sheet (cutting step). Typically, the adhesive layer of the dicing sheet is designed to reduce the adhesion of the adhesive layer by specific stimuli, specific stimuli such as, for example, energy line illumination. Then, before the following steps are performed, the step of irradiating the dicing sheet with an energy ray to lower the adhesion of the adhesive layer is included. Next, the dicing sheet of the member is expanded (elongated in the main surface direction) to enlarge the interval of the sealing wafer disposed on the dicing sheet (expansion step). The encapsulating wafer in a state in which the dicing sheets are separated from each other in this manner is individually transferred by the dicing sheet separation (pickup step) to the next step. at this time, The picking step can be facilitated by including a step of lowering the adhesiveness of the above adhesive layer.

這該一連串的步驟之中,於切割步驟的其後之擴展步驟,半導體構裝及其被切割而成之封膠晶片,要求可維持固定在切割片的狀態。由達成該目的的觀點,切割片的黏著劑層,對該半導體構裝及封膠晶片的能量線照射前之黏著性(於本說明書,若無提及「黏著性」係指能量線照射前之黏著性。)高為佳。在此切割片之被著體為半導體構裝及封膠晶片時,相較於以半導體晶片作為被著體時,被著面的凹凸有變大的趨勢。因此,將以半導體晶片作為被著體之切割片,轉用於使用在對半導體構裝之上述步驟之切割片,則對被著體之黏著性變得不充分,於切割步驟之切斷半導體構裝之中,有個片化之封膠晶片由切割片發生剝離飛散,或在於擴展步驟使切割片伸展時封膠晶片剝離飛散等之異常。以下,將在於切割步驟或擴展步驟所發生之該等異常總稱為「封膠晶片飛散」。以減少發生該封膠晶片飛散的可能性為目的,例如好引用文獻1所記載,進行於切割片之黏著劑層含有賦予黏著性之樹脂材料(於本說明書,稱為「黏著賦予樹脂」。)。 Among the series of steps, in the subsequent expansion step of the cutting step, the semiconductor package and the encapsulated wafer are required to be maintained in a state of being fixed to the dicing sheet. From the viewpoint of achieving the object, the adhesive layer of the dicing sheet is adhered to the semiconductor component and the energy ray of the sealing wafer (in the present specification, the term "adhesiveness" means before the energy ray irradiation. Adhesion.) High is better. When the object of the dicing sheet is a semiconductor package and a packaged wafer, the unevenness of the surface to be faced tends to be larger than when the semiconductor wafer is used as a substrate. Therefore, when the dicing sheet using the semiconductor wafer as the object is used for the dicing sheet used in the above-described step of mounting the semiconductor, the adhesion to the object is insufficient, and the semiconductor is cut in the dicing step. In the configuration, a chipping of the sealing film is caused by peeling and scattering of the dicing sheet, or an abnormality such as peeling and scattering of the sealing film when the dicing sheet is stretched in the expanding step. Hereinafter, such abnormalities occurring in the cutting step or the expanding step are collectively referred to as "sealing wafer scattering". For the purpose of reducing the possibility of scattering of the sealant wafer, for example, as described in the literature 1, the adhesive layer applied to the dicing sheet contains a resin material that imparts adhesiveness (referred to as "adhesion-imparting resin" in the present specification. ).

[先前技術文獻] [Previous Technical Literature] [專利文獻] [Patent Literature]

[專利文獻1]日本特開2005-229040號公報 [Patent Document 1] Japanese Patent Laid-Open Publication No. 2005-229040

作為黏著賦予樹脂,一般的松香系材料由提升黏著劑層之黏著性的觀點為良好的材料。但是,本發明者們詳細研究的結果,松香系的黏著賦予樹脂,若不適切地控制其種類或含量,則在於黏著劑層之黏著性發生離散,或雖可確保黏著劑層之黏著性但無法適切地進行拾取步驟之情形。具體而言,在於拾取步驟,有發生無法拾取封膠晶片之異常之情形。以下,將該等異常總稱為「拾取不良」。 As the adhesion-imparting resin, a general rosin-based material is a good material from the viewpoint of improving the adhesion of the adhesive layer. However, as a result of detailed study by the present inventors, the rosin-based adhesive imparting resin, if the type or content is unduly controlled, the adhesion of the adhesive layer is dispersed, or the adhesion of the adhesive layer is ensured. The picking step cannot be performed properly. Specifically, in the pickup step, there is a case where an abnormality in which the sealant wafer cannot be picked up occurs. Hereinafter, these abnormalities are collectively referred to as "pickup failure".

本發明之課題係在於提供,關於切割步驟、擴展步驟及拾取步驟之任一步驟,均可減少發生異常的可能性之切割片,及使用該切割片之封膠晶片之製造方法。 An object of the present invention is to provide a dicing sheet which can reduce the possibility of occurrence of abnormality in any of the cutting step, the expanding step and the picking step, and a method of manufacturing the sealing wafer using the dicing sheet.

為達成上述目的,本發明者們研究的結果,得到藉由使含於切割片所包括之黏著劑層之黏著賦予樹脂,係由:聚合松香酯;不均化松香酯及石油系樹脂之至少一方所組成者,該等黏著賦予樹脂之中,使聚合松香酯之含量為既定量以上的同時,藉由使能量線照射前後的黏著力之比例(前/後)為3以上,關於切割步驟、擴展步驟及拾取步驟之任一步驟,均可減少發生異常的可能性之見識。 In order to achieve the above object, the inventors have found that the adhesion of the adhesive layer included in the dicing sheet is imparted to the resin by polymerized rosin ester; at least unequalized rosin ester and petroleum resin. In the adhesion-imparting resin, the content of the polymerized rosin ester is equal to or greater than the predetermined amount, and the ratio (pre/post) of the adhesion force before and after the irradiation of the energy ray is 3 or more. Any of the steps of the expansion step and the pick-up step can reduce the likelihood of an abnormality occurring.

基於該見識所完成之本發明,於第1提供,一種切割片,其係包括:基材及層積於上述基材之至少一方的面之黏著劑層之切割片,其特徵在於:上述黏著劑層,係由含有丙烯酸系聚合物(A)、能量線聚合性化合物(B)及黏著賦予樹脂(C)之黏著劑所組成物者,上述黏著賦予樹脂(C)含有聚合松香酯(C1)的同時,含有不均化松香酯(C2)及石油系樹脂(C3)之至少 一方,含於上述黏著劑組成物之上述聚合松香酯(C1)之含量,對上述丙烯酸系聚合物(A)100質量部,為5質量部以上,上述切割片,係以在於上述黏著劑層之與上述基材相對之側之相反側之露出面作為測定對象面,以半導體構裝的樹指封裝面作為被著面,遵照JIS Z0237:2000進行180°拉剝試驗時所測定之黏著力,在於能量線照射前的狀態之黏著力對能量線照射後的狀態之黏著力之比為3以上(發明1)。 According to the present invention, the dicing sheet of the present invention provides a dicing sheet comprising: a substrate and a dicing sheet of an adhesive layer laminated on at least one of the surfaces of the substrate, wherein the adhesive sheet The agent layer is composed of an adhesive containing an acrylic polymer (A), an energy ray polymerizable compound (B), and an adhesion-imparting resin (C), and the adhesion-imparting resin (C) contains a polymerized rosin ester (C1). At the same time, containing at least unequalized rosin ester (C2) and petroleum resin (C3) The content of the polymerized rosin ester (C1) contained in the above-mentioned adhesive composition is 5 parts by mass or more for 100 parts by mass of the acrylic polymer (A), and the dicing sheet is in the above adhesive layer. The exposed surface on the opposite side to the side opposite to the above-mentioned substrate is used as the measurement target surface, and the adhesion is measured in accordance with JIS Z0237:2000 in the 180° peeling test in accordance with JIS Z0237:2000. The ratio of the adhesive force in the state before the irradiation of the energy ray to the state after the irradiation of the energy ray is 3 or more (Invention 1).

該切割片,適切地含有黏著賦予樹脂(C),由於黏著力比為3以上,不容易發生封膠晶片之飛散或拾取不良等的異常。 The dicing sheet contains the adhesion-imparting resin (C) as appropriate, and since the adhesive force ratio is 3 or more, abnormalities such as scattering of the sealing wafer or pickup failure are less likely to occur.

在於上述發明(發明1),其中包含於上述黏著劑組成物之上述聚合松香酯(C1)的含量,對上述丙烯酸系聚合物(A)100質量部,以5質量部以上20質量部以下為佳(發明2)。藉由使之在於該範圍,可減低發生黏著性的離散或黏著力比之降低的可能性,此外,可容易得到提升黏著劑層之黏著性之黏著劑層。 In the above invention (Invention 1), the content of the polymerized rosin ester (C1) contained in the adhesive composition is not less than 5 parts by mass and not more than 20 parts by mass based on 100 parts by mass of the acrylic polymer (A). Good (Invention 2). By making it in this range, it is possible to reduce the possibility of occurrence of a decrease in the adhesion or adhesion ratio of adhesion, and it is also possible to easily obtain an adhesive layer which improves the adhesion of the adhesive layer.

在於上述發明(發明1、2),其中包含於上述黏著劑組成物之不均化松香酯(C2)之含量及石油系樹脂(C3)之含量之總和,對上述丙烯酸系聚合物(A)100質量部,以50質量部以上為佳(發明3)。不均化松香酯(C2)之含量及石油系樹脂(C3)加上作為黏著賦予樹脂之功能,亦具有提升松香酯(C1)與丙烯酸系聚合物(A)之相溶性的功能,藉由滿足上述含量的範圍,可更穩定地發揮提升如此之相溶性的功能。 In the above invention (Inventions 1 and 2), the total content of the content of the uneven rosin ester (C2) and the content of the petroleum resin (C3) contained in the above adhesive composition is the same as the above acrylic polymer (A). It is preferable that the mass portion is 100 mass parts or more (invention 3). The content of the heterogeneous rosin ester (C2) and the petroleum resin (C3) plus the function as an adhesion-imparting resin also have the function of improving the compatibility of the rosin ester (C1) with the acrylic polymer (A). When the above content is satisfied, the function of enhancing such compatibility can be exhibited more stably.

在於上述發明(發明1至3),其中能量線聚合性化 合物(B),以包含具有重量平均分子量(Mw)為100以上30,000以下之能量線聚合性基之低分子量化合物(B1)為佳(發明4)。該低分子量化合物(B1),係由選自由具有能量線聚合性基之單官能單體及多官能單體以及該等單體之寡聚物所組成之群之一種或二種以上所組成者,藉由含有該低分子量化合物(B1)可減低黏著劑層之組成穩定性下降的可能性,且由於上述低分子量化合物(B1)可具有與黏著賦予樹脂(C)同樣的功能,更容易提高黏著劑層之黏著性。 In the above invention (Inventions 1 to 3), in which energy ray polymerization is achieved The compound (B) is preferably a low molecular weight compound (B1) containing an energy ray polymerizable group having a weight average molecular weight (Mw) of 100 or more and 30,000 or less (Invention 4). The low molecular weight compound (B1) is one or more selected from the group consisting of a monofunctional monomer having an energy ray polymerizable group, a polyfunctional monomer, and an oligomer of the monomers. By containing the low molecular weight compound (B1), the possibility of lowering the stability of the composition of the adhesive layer can be reduced, and since the low molecular weight compound (B1) can have the same function as the adhesion imparting resin (C), it is easier to improve. Adhesion of the adhesive layer.

在於上述發明(發明4),其中含於上述黏著劑組成物之能量線聚合性基之低分子化合物(B1)之含量,對上述丙烯酸系聚合物(A)100質量部,以50質量部以上150質量部以下為佳(發明5)。藉由使具有能量線聚合性基之低分子化合物(B1)之含量在於上述範圍內,可藉由照射能量線使黏著劑層之黏著性適切地降低的同時,使黏著劑層可塑化,可更顯著地發揮該黏著性提升的效果。此外,可防止發生起因於黏著劑層之各成分之相溶性降低之異常。 According to the invention (Invention 4), the content of the low molecular weight compound (B1) contained in the energy ray polymerizable group of the above-mentioned adhesive composition is 50 parts by mass or more for 100 parts by mass of the acrylic polymer (A). 150 mass parts or less is preferable (Invention 5). By setting the content of the low molecular compound (B1) having an energy ray polymerizable group within the above range, the adhesive layer can be plasticized by irradiating the energy ray, and the adhesive layer can be plasticized. The effect of the adhesion enhancement is more prominently exerted. Further, it is possible to prevent an abnormality due to a decrease in the compatibility of the respective components of the adhesive layer.

在於上述發明(發明1至5),其中上述黏著劑組成物,含有可與上述丙烯酸系聚合物做架橋反應之架橋劑為佳(發明6)。此時,在由黏著劑組成物形成之黏著劑層,在於具有應與丙烯酸系聚合物(A)做架橋劑反應之官能基(於本說明書,將可與架橋劑反應之官能基亦稱為「反應性官能基」。)含有可與架橋劑做架橋反應之架橋物,藉由調整該架橋物所具有架橋構造(由反應性官能基-架橋劑-反應性官能基構成。),於黏著劑層內的存在密度(於本說明書亦稱為「架橋密度」。),可 控制黏著劑層之能量線照射前之黏著性等的特性。 In the above invention (Inventions 1 to 5), it is preferred that the above-mentioned adhesive composition contains a bridging agent which can bridge the reaction with the above acrylic polymer (Invention 6). At this time, the adhesive layer formed of the adhesive composition has a functional group which should react with the acrylic polymer (A) as a bridging agent (in the present specification, a functional group which can react with the bridging agent is also referred to as "Reactive functional group". Contains a bridge that can be bridged with a bridging agent. By adjusting the bridging structure of the bridging structure (consisting of reactive functional groups - bridging agent - reactive functional groups), adhesion The presence density in the agent layer (also referred to as "bridge bridging density" in this specification), The characteristics of the adhesiveness before the energy ray of the adhesive layer are controlled.

在於上述發明(發明1至6),其中上述黏著劑層之厚度以5μm以上35μm以下為佳(發明7)。藉由使該厚度在該範圍內,可減低黏著劑層之黏著性的離散會變大,難以使黏著力在上述範圍,而在拾取時黏著劑層在內部發生破壞團聚等的問題之可能性。 In the above invention (Inventions 1 to 6), the thickness of the above-mentioned adhesive layer is preferably 5 μm or more and 35 μm or less (Invention 7). When the thickness is within this range, the dispersion of the adhesiveness of the adhesive layer can be reduced, and the adhesion is difficult to be in the above range, and the possibility that the adhesive layer is broken inside during the pickup is likely to occur. .

在於上述發明(發明1至7),其中於上述基材的上述黏著劑層側之面,存在具有選自由羧基、以及由其離子及鹽所組成之群之一種或二種以上的成分為佳(發明8)。藉由該成分與關於黏著劑層之成分之化學性相互作用,可減低基材與黏著劑層之間發生剝離的可能性。 In the above invention (Inventions 1 to 7), it is preferred that the surface of the base material on the side of the pressure-sensitive adhesive layer has one or more components selected from the group consisting of a carboxyl group and a group of ions and salts thereof. (Invention 8). By the chemical interaction of the component with the component of the adhesive layer, the possibility of peeling between the substrate and the adhesive layer can be reduced.

上述黏著劑層之與上述基材相反側之面,黏貼於樹脂封裝半導體晶片之半導體構裝之樹脂封裝面為佳(發明9)。藉由使黏著劑層之與基材之反對側之面黏貼於上述被著面,可實現作為切割片之適切的功能。 The surface of the adhesive layer opposite to the substrate is preferably adhered to the resin package surface of the semiconductor package of the resin-molded semiconductor wafer (Invention 9). By adhering the surface of the adhesive layer to the opposite side of the substrate to the above-mentioned surface, a suitable function as a dicing sheet can be achieved.

本發明,係於第2,提供一種封膠晶片之製造方法,其係將上述發明(發明1至9)之任一項之切割片之上述黏著劑層側之面,黏貼於半導體構裝之樹脂封裝面,將上述切割片上的上述半導體構裝切斷而個片化,得到複數封膠晶片(發明10)。 According to a second aspect of the present invention, in a method of producing a sealant wafer, the surface of the dicing sheet of any one of the inventions (Inventions 1 to 9) is adhered to a semiconductor package. On the resin package surface, the semiconductor package on the dicing sheet is cut and sliced to obtain a plurality of encapsulated wafers (Invention 10).

該製造方法,由於在其過程不容易發生封膠晶片之飛散及拾取不良,故可製造品質優良且有利於成本之封膠晶片。 In this manufacturing method, since the sealing of the sealing wafer and the pickup failure are less likely to occur in the process, it is possible to manufacture a high-quality and cost-effective sealing film.

根據本發明,可提供在於切割步驟、擴展步驟及拾取步驟之任一步驟均可減少發生異常的可能性之切割片。此外,藉由使用該切割片,可製造品質優良且有利於成本之封膠晶片。 According to the present invention, it is possible to provide a cutting piece which can reduce the possibility of occurrence of an abnormality in any of the cutting step, the expanding step and the picking step. Further, by using the dicing sheet, it is possible to manufacture a high-quality and cost-effective gelatinized wafer.

1‧‧‧切割片 1‧‧‧ cutting piece

2‧‧‧基材 2‧‧‧Substrate

3‧‧‧黏著劑層 3‧‧‧Adhesive layer

第1圖係本發明之一實施形態之切割片之示意剖面圖 Figure 1 is a schematic cross-sectional view of a cutting piece according to an embodiment of the present invention

以下,說明本發明之實施形態。 Hereinafter, embodiments of the present invention will be described.

如第1圖所示,關於本發明之一實施形態之切割片1,包括:基材2;及黏著劑層3。 As shown in Fig. 1, a dicing sheet 1 according to an embodiment of the present invention includes a base material 2 and an adhesive layer 3.

1.基材 Substrate

關於本實施形態之切割片1之基材2,只要在於擴展步驟或拾取步驟不會破斷,其構成材料並無特別限定,通常係以樹脂系的材料作為主材之薄膜所構成。該薄膜之具體例,可舉低密度聚乙烯(LDPE)薄膜、直鏈低密度聚乙烯(LLDPE)薄膜、高密度聚乙烯(HDPE)薄膜等之聚乙烯薄膜、聚丙烯薄膜、聚丁烯薄膜、聚丁二烯薄膜、聚甲基戊烯薄膜、乙烯-降冰片烯共聚物薄膜、降冰片烯樹脂薄膜等的聚烯烴系薄膜;聚氯乙烯薄膜、氯乙烯共聚物薄膜等的聚氯乙烯系薄膜;聚對苯二甲酸乙二醇酯薄膜、聚對苯二甲酸丁二醇酯薄膜等的聚酯系薄膜;聚氨酯薄膜;聚醯亞胺薄膜;離聚物樹脂薄膜、乙烯-醋酸乙烯酯共聚物薄膜、乙烯-(甲基)丙烯酸共聚物薄膜、乙烯-(甲基)丙烯酸酯共聚物薄膜等之乙烯系共聚合薄膜;聚苯乙烯薄膜; 聚碳酸酯薄膜;氟樹脂薄膜;以及該等樹脂之加氫物及變性物作為主材之薄膜。此外,亦可使用該等的架橋薄膜、共聚物薄膜。上述基材2可以1種單獨,亦可為進一步組合2種以上之層積薄膜。再者,在於本說明書之「(甲基)丙烯酸」,係指丙烯酸及甲基丙烯酸之雙方之意思。關於其他類似的用語亦相同。 The base material 2 of the dicing sheet 1 of the present embodiment is not particularly limited as long as the expansion step or the pick-up step is not broken, and is usually composed of a film made of a resin-based material as a main material. Specific examples of the film include a polyethylene film, a polypropylene film, and a polybutylene film of a low density polyethylene (LDPE) film, a linear low density polyethylene (LLDPE) film, a high density polyethylene (HDPE) film, and the like. a polyolefin film such as a polybutadiene film, a polymethylpentene film, an ethylene-norbornene copolymer film, a norbornene resin film, or a polyvinyl chloride film or a vinyl chloride copolymer film. Film; polyester film such as polyethylene terephthalate film or polybutylene terephthalate film; polyurethane film; polyimine film; ionomer resin film, ethylene-vinyl acetate a copolymer film of an ester, an ethylene-(meth)acrylic copolymer film, an ethylene-based (meth)acrylate copolymer film, or the like; a polystyrene film; A polycarbonate film; a fluororesin film; and a film of a hydrogenated product and a denatured product of the resins as a main material. Further, such bridge film or copolymer film can also be used. The base material 2 may be used alone or in combination of two or more layers. In addition, the term "(meth)acrylic acid" as used herein means both of acrylic acid and methacrylic acid. The same is true for other similar terms.

基材2,亦可於上述樹脂系材料作為主材之薄膜內,含有顏料、難燃劑、可塑劑、帶電防止劑、潤滑劑、填充劑等的各種添加劑。顏料,可舉例如,二氧化鈦、碳黑等。此外,填充劑,可例示例如三聚氰胺樹脂等之有機系材料,如氣相法二氧化矽等之無機系材料及鎳粒子等之金屬系材料。如此之添加劑之含量,並無特別限定,應保留在基材2可發揮所期望的功能,不失去平滑性及柔軟性的範圍。 The base material 2 may contain various additives such as a pigment, a flame retardant, a plasticizer, a charge preventing agent, a lubricant, a filler, and the like in the film of the resin material as a main material. The pigment may, for example, be titanium dioxide, carbon black or the like. Further, the filler may, for example, be an organic material such as a melamine resin, an inorganic material such as a vapor phase cerium oxide or a metal material such as nickel particles. The content of such an additive is not particularly limited, and should be retained in a range in which the substrate 2 can exhibit a desired function without losing smoothness and flexibility.

使用紫外線作為使黏著劑層3硬化所照射之能量線時,基材2對紫外線具有穿透性為佳。再者,使用電子線作為能量線時,基材2具有電子線穿透性為佳。 When ultraviolet rays are used as the energy ray for curing the adhesive layer 3, the substrate 2 preferably has transparency to ultraviolet rays. Further, when an electron beam is used as the energy ray, the substrate 2 preferably has electron beam penetration.

此外,基材2之黏著劑層3側之面(以下,亦稱為「基材被著面」。),存在有選自由羧基、以及其離子及鹽所組成之群之1種或2種以上的成分為佳。在於基材2之該成分與關於黏著劑層3之成分(可例示構成黏著劑層3之成分及架橋劑等形成黏著劑層3時使用之成分。),藉由化學性的相互作用,可降低該等之間發生剝離的可能性。為在基材被著面存在如此之成分之具體手法,並無特別限定。例如,可使基材2本身,係例如以成為乙烯-(甲基)丙烯酸共聚物薄膜、離聚物樹脂薄膜等的材料之樹脂之構成單體,具有羧基、以及其離子及鹽 者。於基材被著面發生上述成分之其他手法,基材2亦可例如係聚烯烴系薄膜,對基材被著面施以電暈處理,或設置底漆層。此外,於基材2之與基材被著面之相反側的面,亦可設有各種塗膜。 Further, the surface of the base material 2 on the side of the adhesive layer 3 (hereinafter also referred to as "the base material is surfaced") has one or two kinds selected from the group consisting of a carboxyl group and its ions and salts. The above ingredients are preferred. This component of the substrate 2 and the component of the adhesive layer 3 (which may be used as a component constituting the adhesive layer 3 and a bridging agent to form the adhesive layer 3) may be chemically interacted. Reduce the likelihood of peeling between these. There is no particular limitation on the specific method in which such a component is present on the substrate. For example, the substrate 2 itself may be a constituent monomer of a resin which is a material of an ethylene-(meth)acrylic copolymer film or an ionomer resin film, and has a carboxyl group, and an ion thereof and a salt thereof. By. The substrate 2 may be, for example, a polyolefin-based film, and the substrate may be subjected to a corona treatment or a primer layer. Further, various coating films may be provided on the surface of the substrate 2 opposite to the surface on which the substrate is placed.

基材2之厚度只要是切割片1可在上述各步驟適當地作用,並無限定。以20~450μm為佳,以25~200μm更佳,以50~150μm的範圍特別佳。 The thickness of the substrate 2 is not limited as long as it can function properly in the above steps as long as the dicing sheet 1 is used. It is preferably 20 to 450 μm, more preferably 25 to 200 μm, and particularly preferably in the range of 50 to 150 μm.

在於本實施形態之基材2之破斷伸度,於23℃、相對濕度50%所測定之值,以100%以上為佳,以200%以上特別佳,以1000%以下為佳。上述破斷伸度為100%以上之基材2,於擴展步驟時不容易破斷,容易將切斷裝置相關構件所形成之裝置晶片離間者。再者,破斷伸度,係遵照JIS K7161:1994之拉伸試驗,試驗片破斷時之試驗片之長度對原來的長度之伸長率。 The breaking elongation of the substrate 2 of the present embodiment is preferably 100% or more at 23 ° C and a relative humidity of 50%, particularly preferably 200% or more, and preferably 1000% or less. The base material 2 having a breaking elongation of 100% or more is not easily broken during the expansion step, and it is easy to separate the device wafer formed by the member related to the cutting device. Further, the breaking elongation is in accordance with the tensile test of JIS K7161:1994, and the elongation of the length of the test piece at the time of breaking of the test piece to the original length.

此外,在於本實施形態之基材2之遵照JIS K7161:1994之試驗所測定之25%變形時之拉伸應力以5N/10mm以上15N/10mm以下為佳,最大拉伸應力以15MPa以上50MPa以下為佳。25%變形時之拉伸應力未滿5N/10mm,或最大拉伸應力未滿15MPa,則將半導體構裝黏貼於切割片1之後,固定於環形框等時,有因基材2柔軟而發生鬆弛,而成為輸送錯誤之原因。另一方面,25%變形時之拉伸應力超過15N/10mm,或最大拉伸應力未滿50MPa,則有於擴展步驟時施加的荷重變大,有發生切割片1本身由環形框剝落等的問題之虞。在於本發明之破斷伸度、25%變形時之拉伸應力、最大 拉伸應力係對基材的長條方向測定之值。 Further, the tensile stress at the 25% deformation measured by the test according to JIS K7161:1994 of the substrate 2 of the present embodiment is preferably 5 N/10 mm or more and 15 N/10 mm or less, and the maximum tensile stress is 15 MPa or more and 50 MPa or less. It is better. When the tensile stress at 25% deformation is less than 5 N/10 mm, or the maximum tensile stress is less than 15 MPa, the semiconductor structure is adhered to the dicing sheet 1, and when it is fixed to a ring frame or the like, it is caused by the softness of the substrate 2 Slack, which is the cause of the transmission error. On the other hand, when the tensile stress at 25% deformation exceeds 15 N/10 mm, or the maximum tensile stress is less than 50 MPa, the load applied during the expansion step becomes large, and the cut piece 1 itself is peeled off by the annular frame. The problem. It is the breaking elongation of the present invention, the tensile stress at 25% deformation, and the maximum The tensile stress is a value measured for the long direction of the substrate.

2.黏著劑層 2. Adhesive layer

關於本實施形態之切割片1所包括之黏著劑層3,係由含有如下所說明之丙烯酸系聚合物(A)及能量線聚合性化合物(B)及黏著賦予樹脂(C)等之黏著劑組成物所形成者。 The adhesive layer 3 included in the dicing sheet 1 of the present embodiment is an adhesive containing an acrylic polymer (A), an energy ray polymerizable compound (B), and an adhesive resin (C) as described below. The composition of the composition.

(1)丙烯酸系聚合物(A) (1) Acrylic polymer (A)

形成關於本實施形態之黏著劑層3之黏著劑組成物,含有丙烯酸系聚合物(A)。在由該黏著劑組成物形成之黏著劑層3,丙烯酸系聚合物(A)亦有含有至少其一部分與後述之架橋劑進行架橋反應之架橋物之情形。於本說明書,將可與架橋劑進行架橋反應之官能基亦稱為「反應性官能基」。丙烯酸系聚合物(A)雖並不必須具有反應性官能基,惟丙烯酸系聚合物(A)具有反應性官能基時,由於可如上所述可與架橋劑形成架橋物而佳。再者,反應性官能基的種類,只要按照架橋劑的種類設定即可。 The adhesive composition of the adhesive layer 3 of this embodiment is formed, and the acrylic polymer (A) is contained. In the adhesive layer 3 formed of the adhesive composition, the acrylic polymer (A) may also contain a bridge having at least a part of a bridging reaction with a bridging agent to be described later. In the present specification, a functional group capable of bridging a bridging agent is also referred to as a "reactive functional group". The acrylic polymer (A) does not necessarily have to have a reactive functional group. However, when the acrylic polymer (A) has a reactive functional group, it is preferable to form a bridging agent with the bridging agent as described above. Further, the type of the reactive functional group may be set according to the type of the bridging agent.

丙烯酸系聚合物(A),可使用先前習知之丙烯酸系聚合物。丙烯酸系聚合物(A)之重量平均分子量(Mw),以1萬以上200萬以下為佳,以10萬以上150萬以下更佳。此外,丙烯酸系聚合物(A)之玻璃轉移溫度Tg,以-70℃以上30℃以下為佳,以-60℃以上20℃以下的範圍更佳。 As the acrylic polymer (A), a conventionally known acrylic polymer can be used. The weight average molecular weight (Mw) of the acrylic polymer (A) is preferably 10,000 or more and 2,000,000 or less, more preferably 100,000 or more and 1.5 million or less. Further, the glass transition temperature Tg of the acrylic polymer (A) is preferably -70 ° C or more and 30 ° C or less, more preferably -60 ° C or more and 20 ° C or less.

上述丙烯酸系聚合物(A),可為1種丙烯酸系單體所形成之單獨聚合物,亦可為複數種丙烯酸系單體所形成之共聚物,亦可為1種或複數種丙烯酸系單體與丙烯酸系單體以外的單體所形成之共聚物。成為丙烯酸系單體之化合物之具體種 類並無特別限定,具體例可舉,(甲基)丙烯酸、(甲基)丙烯酸酯、其衍生物(丙烯腈等)。關於(甲基)丙烯酸酯,進一步表示具體例,則可舉(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸丙酯、(甲基)丙烯酸丁酯、(甲基)丙烯酸2-乙基己酯等的具有鏈狀骨架之(甲基)丙烯酸酯;(甲基)丙烯酸環烷酯、(甲基)丙烯酸苄酯、(甲基)丙烯酸異冰片酯、(甲基)丙烯酸二環戊酯、(甲基)丙烯酸二環戊烯酯、(甲基)丙烯酸二環戊烯氧酯、(甲基)丙烯酸四氫糠酯、醯亞胺丙烯酸酯等的環狀骨架之(甲基)丙烯酸酯;(甲基)丙烯酸2-羥基乙酯、(甲基)丙烯酸2-羥基丙酯等的具有羥基之丙烯酸酯等的(甲基)丙烯酸酯;(甲基)丙烯酸縮水甘油酯、(甲基)丙烯酸N-甲基胺基乙酯等的具有羥基以外的反應性官能基之(甲基)丙烯酸酯。此外,丙烯酸系單體以外的單體,可例示乙烯、降冰片烯等的烯烴、醋酸乙烯酯、苯乙烯等。再者,丙烯酸系單體為(甲基)丙烯酸烷基酯時,該烷基之碳數以1~18的範圍為佳。 The acrylic polymer (A) may be a single polymer composed of one type of acrylic monomer, or may be a copolymer of a plurality of acrylic monomers, or may be one or more acrylic monomers. a copolymer of a monomer and a monomer other than the acrylic monomer. Specific species of compounds that become acrylic monomers The class is not particularly limited, and specific examples thereof include (meth)acrylic acid, (meth)acrylic acid ester, and a derivative thereof (acrylonitrile or the like). Further, specific examples of the (meth) acrylate include methyl (meth)acrylate, ethyl (meth)acrylate, propyl (meth)acrylate, and butyl (meth)acrylate. (meth) acrylate having a chain skeleton such as 2-ethylhexyl acrylate; cycloalkyl (meth) acrylate, benzyl (meth) acrylate, isobornyl (meth) acrylate, ( Rings of dicyclopentanyl (meth)acrylate, dicyclopentenyl (meth)acrylate, dicyclopentenyl (meth)acrylate, tetrahydrofurfuryl (meth)acrylate, quinone acrylate, etc. a (meth) acrylate having a hydroxyl group such as 2-hydroxyethyl (meth)acrylate or 2-hydroxypropyl (meth)acrylate; A (meth) acrylate having a reactive functional group other than a hydroxyl group such as glycidyl acrylate or N-methylaminoethyl (meth)acrylate. Further, examples of the monomer other than the acrylic monomer include an olefin such as ethylene or norbornene, vinyl acetate, and styrene. Further, when the acrylic monomer is an alkyl (meth)acrylate, the carbon number of the alkyl group is preferably in the range of 1 to 18.

形成關於本實施形態之黏著劑層3之黏著劑組成物,如後所述地含有可將丙烯酸系聚合物(A)架橋之架橋劑時,丙烯酸系聚合物(A)所具有的反應性官能基之種類並無特別限定,基於架橋劑的種類等適宜決定即可。例如,架橋劑為聚異氰酸酯化合物時,丙烯酸系聚合物(A)所具有的反應性官能基,可例示羥基、羧基、胺基等。該等極性的官能基,與架橋劑反應之功能之外,亦具有提升丙烯酸系聚合物(A)與黏著賦予樹脂(C)之相溶性的效果。該等之中,架橋劑係聚異氰酸酯化合物時,採用與異氰酸酯基的反應性高的羥基作為反應性 官能基為佳。於丙烯酸系聚合物(A)導入羥基作為反應性官能基之方法並無特別限定。作為一例,可舉丙烯酸系聚合物(A)於骨架含有基於(甲基)丙烯酸2-羥基乙酯等的具有羥基之丙烯酸酯之構成單位之情形。 The adhesive composition of the adhesive layer 3 of the present embodiment is a reactive functional group of the acrylic polymer (A) when the bridging agent capable of bridging the acrylic polymer (A) is contained as will be described later. The type of the base is not particularly limited, and may be appropriately determined based on the type of the bridging agent. For example, when the bridging agent is a polyisocyanate compound, the reactive functional group which the acrylic polymer (A) has may be a hydroxyl group, a carboxyl group, an amine group or the like. The functional groups having such polarities have an effect of improving the compatibility of the acrylic polymer (A) and the adhesion-imparting resin (C) in addition to the function of reacting with the bridging agent. Among these, when the bridging agent is a polyisocyanate compound, a hydroxyl group having high reactivity with an isocyanate group is used as a reactivity. The functional group is preferred. The method of introducing a hydroxyl group into the acrylic polymer (A) as a reactive functional group is not particularly limited. For example, the acrylic polymer (A) may contain a constituent unit of a hydroxy group having a hydroxyl group such as 2-hydroxyethyl (meth)acrylate in the skeleton.

(2)能量線聚合性化合物(B) (2) Energy ray polymerizable compound (B)

形成關於本實施形態之黏著劑層3之黏著劑組成物所含有之能量線聚合性化合物(B),只要是具有能量線聚合性基,可受紫外線、電子線等的能量線的照射而聚合反應,具體的構成並無特別限定。藉由聚合能量線聚合性化合物(B),使黏著劑層3之黏著性降低,可提升拾取步驟之工作性。 The energy ray polymerizable compound (B) which is contained in the adhesive composition of the pressure-sensitive adhesive layer 3 of the present embodiment can be polymerized by irradiation with energy rays such as ultraviolet rays or electron beams as long as it has an energy ray polymerizable group. The specific configuration of the reaction is not particularly limited. By polymerizing the energy ray polymerizable compound (B), the adhesiveness of the adhesive layer 3 is lowered, and the workability of the picking step can be improved.

能量線聚合性基的種類並無特別限定。其具體例,可舉乙烯基、(甲基)丙烯醯基等的乙烯性不飽和鍵結之官能基等。由聚合反應性優良的觀點,能量線聚合性基以具有乙烯性不飽和鍵結之官能基為佳,其中,由照射能量線時之反應性高的觀點,以(甲基)丙烯醯基更佳。 The type of the energy ray polymerizable group is not particularly limited. Specific examples thereof include a functional group such as a vinyl group or an ethylenically unsaturated bond such as a (meth)acryl fluorenyl group. From the viewpoint of excellent polymerization reactivity, the energy ray polymerizable group is preferably a functional group having an ethylenically unsaturated bond, and the (meth) acrylonitrile group is more preferable from the viewpoint of high reactivity when irradiating the energy ray. good.

能量線聚合性化合物(B),可大致區分為具有能量線聚合性基之低分子量化合物(在於本說明書,簡稱為「低分子量化合物」。)(B1),及於主鏈或側鏈具有由能量線聚合性基之高分子所構成之能量線硬化型聚合物(B2)。關於本實施形態之黏著劑層3,可使用該等的任一,或並用。 The energy ray polymerizable compound (B) can be roughly classified into a low molecular weight compound having an energy ray polymerizable group (in the present specification, simply referred to as "low molecular weight compound") (B1), and has a main chain or a side chain. An energy ray-curable polymer (B2) composed of a polymer having an energy ray polymerizable group. Regarding the adhesive layer 3 of the present embodiment, any of these may be used or used in combination.

i)低分子量化合物(B1) i) Low molecular weight compound (B1)

能量線聚合物(B)含有低分子量化合物(B1)時,由於低分子量化合物(B1)可與後述之黏著賦予樹脂(C)同樣地,使黏著劑層3可塑化,故可容易提升黏著劑層3之黏著性。低分子量化合物 (B1),可由1種化合物構成,亦可由複數種化合物構成。低分子量化合物(B1)以分子當量所具有的能量線聚合性基數可為1個(單官能),亦可為複數(多官能)。此外,低分子量化合物(B1)亦可具有被稱為所謂寡聚物(具有10至100個來自單體的構成單位之化合物)之程度之分子量,其分子量以100以上30,000以下為佳。低分子量化合物(B1)分子量過小時,有在製造過程揮發之虞,此時會降低黏著劑層3之穩定性。另一方面,低分子量化合物(B1)之分子量過大時,有難以得到使黏著劑層3可塑化之功能之虞。使在於製造過程減低揮發的可能性與提高使黏著劑層3可塑化的功能穩定地並存的觀點,低分子量化合物(B1)之分子量,以重量平均分子量(Mw)以200以上20,000以下為佳,以300以上10000以下更佳,以300以上4,000以下特別佳。 When the energy ray polymer (B) contains the low molecular weight compound (B1), the low molecular weight compound (B1) can plasticize the adhesive layer 3 in the same manner as the adhesion imparting resin (C) described later, so that the adhesive can be easily lifted. Adhesion of layer 3. Low molecular weight compound (B1) may be composed of one type of compound or a plurality of types of compounds. The low molecular weight compound (B1) may have one (monofunctional) or one (multifunctional) energy ray polymerizable group in molecular equivalents. Further, the low molecular weight compound (B1) may have a molecular weight called a so-called oligomer (a compound having 10 to 100 constituent units derived from a monomer), and the molecular weight thereof is preferably 100 or more and 30,000 or less. When the molecular weight of the low molecular weight compound (B1) is too small, it is volatilized during the production process, and the stability of the adhesive layer 3 is lowered. On the other hand, when the molecular weight of the low molecular weight compound (B1) is too large, it is difficult to obtain a function of plasticizing the adhesive layer 3. The molecular weight of the low molecular weight compound (B1) is preferably 200 or more and 20,000 or less in terms of weight average molecular weight (Mw), from the viewpoint that the possibility of reducing the volatilization in the production process and the function of improving the plasticization of the adhesive layer 3 are stably performed. It is more preferably 300 or more and 10,000 or less, and particularly preferably 300 or more and 4,000 or less.

上述低分子量化合物(B1)之具體的組成並無特別限定。具體例,可舉三羥甲基丙烷三(甲基)丙烯酸酯、四羥甲基甲烷四(甲基)丙烯酸酯、三(甲基)丙烯酸異戊四醇酯、五(甲基)丙烯酸二異戊四醇基單羥基酯、六(甲基)丙烯酸二異戊四醇酯、二(甲基)丙烯酸1,4-丁二醇酯、二(甲基)丙烯酸1,6-己二醇酯等的具有鏈狀骨架之(甲基)丙烯酸烷基酯;二環戊二烯基二甲氧基二(甲基)丙烯酸酯、異冰片基(甲基)丙烯酸酯等的具有環狀骨架之(甲基)丙烯酸烷基酯;聚乙二醇二(甲基)丙烯酸酯、寡聚酯(甲基)丙烯酸酯、尿烷(甲基)丙烯酸酯寡聚物、環氧基變性(甲基)丙烯酸酯、聚醚(甲基)丙烯酸酯等的丙烯酸酯系化合物等。該等之中,丙烯酸酯系化合物由於對丙烯酸系聚 合物(A)之相溶性高而佳。 The specific composition of the above low molecular weight compound (B1) is not particularly limited. Specific examples thereof include trimethylolpropane tri(meth)acrylate, tetramethylolmethanetetra(meth)acrylate, pentaerythritol tris(meth)acrylate, and penta(meth)acrylic acid. Pentaerythritol monohydroxy ester, diisopentyl hexa(meth)acrylate, 1,4-butanediol di(meth)acrylate, 1,6-hexanediol di(meth)acrylate An alkyl (meth)acrylate having a chain skeleton such as an ester; a cyclic skeleton having dicyclopentadienyl dimethoxy di(meth)acrylate or isobornyl (meth)acrylate; Alkyl (meth)acrylate; polyethylene glycol di(meth)acrylate, oligoester (meth)acrylate, urethane (meth)acrylate oligomer, epoxy degeneration (A An acrylate-based compound such as an acrylate or a polyether (meth) acrylate. Among these, the acrylate-based compound is polymerized by acrylic acid. The compatibility of the compound (A) is high and preferably.

低分子量化合物(B1),以於一分子中具有3個以上的能量線聚合性基者為佳。本發明之黏著劑層3,係含有如後所述之聚合松香酯(C1)者,惟由於聚合松香酯(C1)具有不飽和碳-碳雙鍵鍵結,故有阻礙低分子量化合物(B1)之能量線聚合性基之聚合之情形。但是,低分子量化合物(B1),於一分子中所具有的能量線聚合性基在如上所述之範圍,則可有效地進行聚合,容易將後述之切割片1之黏著力比調整於較佳的範圍。特別是,低分子量化合物(B1),於一分子中所具有的能量線聚合性基為5個以上,則即使低分子量化合物(B1)之調合量並非過大的量,亦可使聚合有效地進行而更佳。 The low molecular weight compound (B1) is preferably one having three or more energy ray polymerizable groups in one molecule. The adhesive layer 3 of the present invention contains a polymerized rosin ester (C1) as described later, but since the polymerized rosin ester (C1) has an unsaturated carbon-carbon double bond bond, it hinders the low molecular weight compound (B1). The case of polymerization of energy-line polymerizable groups. However, the low molecular weight compound (B1) has an energy ray polymerizable group in one molecule as described above, and can be efficiently polymerized, and it is easy to adjust the adhesion ratio of the dicing sheet 1 to be described later. The scope. In particular, when the low molecular weight compound (B1) has five or more energy ray polymerizable groups in one molecule, even if the blending amount of the low molecular weight compound (B1) is not excessively large, the polymerization can be efficiently carried out. And better.

此外,使低分子量化合物(B1)於一分子中所具有的能量線聚合性基之數量為n,低分子量化合物(B1)之重量平均分子量為M,將n以M商除之值n/M以1×10-4以上為佳。n/M在如上所述之範圍者,則即使黏著劑層3含有聚合松香酯(C1),亦可有效地進行聚合,容易將後述之切割片1之黏著力比調整於較佳的範圍。特別是n/M為1×10-3以上,則由於即使低分子量化合物(B1)之調合量並不過大的量,亦可有效率地使聚合進行而更佳。抑制黏著劑層3在於保管中的硬化等的操作上的觀點,n/M之較佳的範圍之上限為5×10-2程度。 Further, the number of the energy ray polymerizable groups of the low molecular weight compound (B1) in one molecule is n, the weight average molecular weight of the low molecular weight compound (B1) is M, and n is divided by the value of M by n/M. It is preferably 1 × 10 -4 or more. When the n/M is in the range as described above, even if the adhesive layer 3 contains the polymerized rosin ester (C1), the polymerization can be carried out efficiently, and the adhesion ratio of the dicing sheet 1 to be described later can be easily adjusted to a preferable range. In particular, when n/M is 1 × 10 -3 or more, even if the amount of the low molecular weight compound (B1) is not excessively large, the polymerization can be carried out efficiently and more preferably. The pressure-sensitive adhesive layer 3 is controlled in terms of handling during storage, and the upper limit of the preferable range of n/M is about 5 × 10 -2 .

形成關於本實施形態之黏著劑層3之黏著劑組成物之低分子量化合物(B1)之含量,對丙烯酸系聚合物(A)100質量部,以50質量部分以上300質量部以下為佳,以75質量部分以上150質量部以下更佳。再者,在於本說明書,表示各成 分之含量之「質量部」係固形分的量的意思。藉由使低分子量化合物(B1)之含量為如此之範圍,可使能量線聚合性基在黏著劑層3之存在密度適當,可藉由照射能量線使黏著劑層3的黏著性適切地降低,藉由本成分使黏著劑層3可塑化,更顯著地發揮提升其黏著性之的效果。另一方面,不容易發生丙烯酸系聚合物(A)及後述之黏著賦予樹脂(C)之相溶性下降之異常。結果,可防止黏著劑層3之黏著性發生離散,或於黏著劑層3與被著體之界面附近,局部性地產生能量線聚合性化合物(B)之濃度低的部分,使後述之切割片1之黏著力無法充分上升。再者,上述n/M亦納入考慮,則用於形成關於本實施形態之黏著劑層3之黏著劑組成物之低分子量化合物(B1)之含量,對丙烯酸系聚合物(A)100質量部之含量與上述n/M之積之值,以成為1.0×10-1以上15以下的含量為佳,以成為1.5×10-1以上5以下的含量更佳,以成為3.0×10-1以上1.0以下的含量特別佳。 The content of the low molecular weight compound (B1) of the adhesive composition of the adhesive layer 3 of the present embodiment is preferably 50 parts by mass or more and 300 parts by mass or less based on 100 parts by mass of the acrylic polymer (A). More than 75 mass parts and more than 150 mass parts are better. In addition, in the present specification, the meaning of the "mass portion" of the content of each component is the amount of the solid component. By setting the content of the low molecular weight compound (B1) in such a range, the density of the energy ray polymerizable group in the adhesive layer 3 can be appropriately set, and the adhesiveness of the adhesive layer 3 can be appropriately lowered by irradiating the energy ray. By using this component, the adhesive layer 3 can be plasticized, and the effect of improving the adhesion is more prominently exhibited. On the other hand, an abnormality in the decrease in the compatibility of the acrylic polymer (A) and the adhesion-providing resin (C) to be described later is less likely to occur. As a result, it is possible to prevent the adhesion of the adhesive layer 3 from being dispersed, or to locally generate a portion having a low concentration of the energy ray polymerizable compound (B) in the vicinity of the interface between the adhesive layer 3 and the object, and to cut the later-described portion. The adhesion of the sheet 1 cannot be sufficiently raised. Further, the above n/M is also considered to be a content of the low molecular weight compound (B1) for forming the adhesive composition of the adhesive layer 3 of the present embodiment, and 100 parts by mass for the acrylic polymer (A). The content of the product of the above-mentioned n/M is preferably 1.0 × 10 -1 or more and 15 or less, and more preferably 1.5 × 10 -1 or more and 5 or less, and more preferably 3.0 × 10 -1 or more. The content below 1.0 is particularly good.

ii)能量線硬化型聚合物(B2) Ii) energy line hardening polymer (B2)

能量線硬化型聚合物(B2)之具體構造,並無限定,以丙烯酸系聚合物,於主鏈或側鏈具有能量線聚合性基之構成單位時,具有作為丙烯酸系聚合物(A)之性質。因此,可簡化黏著劑層3之製造步驟,具有容易控制在於黏著劑層3之能量線聚合性基之存在密度等的優點。此外,此時,亦可另外含有丙烯酸系聚合物(A)。再者,如此之能量線硬化型聚合物(B2)具有丙烯酸系聚合物(A)之性質時,用於特定上述低分子量化合物(B1)或後述之黏著賦予樹脂(C)等,含於形成黏著劑層3之黏著劑組合物之丙烯酸系聚合物(A)以外的成分之含量於合適範圍 時之所為「丙烯酸系聚合物(A)100質量部」,係指丙烯酸系聚合物(A)之含量及具有作為丙烯酸系聚合物(A)之性質之能量線硬化型聚合物(B2)之總計含量為100質量部。再者,能量線硬化型聚合物(B2)具有作為丙烯酸系聚合物(A)之性質時,丙烯酸系聚合物(A)之全量亦可為能量線硬化型聚合物(B2)。此時,能量線硬化型聚合物(B2)加上能量線聚合性基亦可具有反應性官能基。能量線硬化型聚合物(B2)所具有之反應性官能基之至少一部分,亦可與架橋劑架橋反應。 The specific structure of the energy ray-curable polymer (B2) is not limited, and the acrylic polymer has an acrylic polymer (A) when it has a constituent unit of an energy ray-polymerizable group in a main chain or a side chain. nature. Therefore, the manufacturing steps of the adhesive layer 3 can be simplified, and there is an advantage that it is easy to control the existence density of the energy ray polymerizable group of the adhesive layer 3 and the like. Further, in this case, an acrylic polymer (A) may be additionally contained. In addition, when the energy ray-curable polymer (B2) has the properties of the acrylic polymer (A), it is used to specify the low molecular weight compound (B1) or an adhesion-providing resin (C) to be described later, and the like. The content of the components other than the acrylic polymer (A) of the adhesive composition of the adhesive layer 3 is in an appropriate range In the meantime, the "acrylic polymer (A) 100 parts by mass" means the content of the acrylic polymer (A) and the energy ray-curable polymer (B2) having the properties as the acrylic polymer (A). The total content is 100 parts by mass. When the energy ray-curable polymer (B2) has properties as the acrylic polymer (A), the total amount of the acrylic polymer (A) may be an energy ray-curable polymer (B2). At this time, the energy ray-curable polymer (B2) and the energy ray polymerizable group may have a reactive functional group. At least a portion of the reactive functional groups possessed by the energy ray-curable polymer (B2) may also be bridged with a bridging agent.

能量線硬化型聚合物(B2)係具有能量線聚合性基之聚合物,重量平均分子量(Mw)較30,000大。該能量線硬化型聚合物(B2),係與丙烯酸系聚合物(A)同樣地產生維持作為黏著劑主劑之一般功能之黏著劑層之團聚性的效果者,如此之效果分子量越高,可更加發揮。另一方面,能量線硬化型聚合物(B2)之分子量過大時,發生製造黏著劑層3時難以薄層化等的問題的可能性會變高。因此,能量線硬化型聚合物(B2)之重量平均分子量,以10萬以上200萬以下左右為佳,以15萬以上150萬以下左右更佳。 The energy ray-curable polymer (B2) is a polymer having an energy ray-polymerizable group, and has a weight average molecular weight (Mw) of more than 30,000. In the same manner as the acrylic polymer (A), the energy ray-curable polymer (B2) has an effect of maintaining the agglomeration property of the adhesive layer which is a general function of the adhesive main component, and the effect is higher in molecular weight. Can be more played. On the other hand, when the molecular weight of the energy ray-curable polymer (B2) is too large, there is a possibility that the problem that it is difficult to form a thin layer when the pressure-sensitive adhesive layer 3 is produced becomes high. Therefore, the weight average molecular weight of the energy ray-curable polymer (B2) is preferably from 100,000 to 2,000,000, and more preferably from about 150,000 to about 1.5 million.

能量線硬化型聚合物(B2)具有基於(甲基)丙烯酸酯之構成單位者時,例如可以如下方法調製。含有羥基、羧基、胺基、取代胺基、環氧基等的官能基於(甲基)丙烯酸酯之構成單位及含有基於(甲基)丙烯酸烷基酯之構成單位而成之共聚物之丙烯酸系聚合物,將可與上述官能基反應之取代基及能量線聚合性基(例如具有乙烯性雙鍵鍵結之基)於每1分子具有1~5個化合物,可對上述丙烯酸系聚合物加成能量線聚合性基。 When the energy ray-curable polymer (B2) has a constituent unit based on (meth) acrylate, it can be prepared, for example, by the following method. A functional group containing a hydroxyl group, a carboxyl group, an amine group, a substituted amino group, an epoxy group or the like, and a copolymer of a (meth) acrylate-based constituent unit and a copolymer containing a constituent unit based on an alkyl (meth) acrylate. a polymer having a substituent reactive with the above functional group and an energy ray-polymerizable group (for example, a group having an ethylenic double bond) having 1 to 5 compounds per molecule, which can be added to the above acrylic polymer An energy line polymerizable group.

使能量線聚合性化合物(B)硬化之能量線,可舉電離輻射線、X射線、紫外線、電子線等。該等之中,以比較容易導入之照射裝置之紫外線為佳。 The energy rays for curing the energy ray polymerizable compound (B) include ionizing radiation, X-rays, ultraviolet rays, and electron beams. Among these, it is preferable to use ultraviolet rays of an irradiation device which is relatively easy to introduce.

使用紫外線作為電離輻射線時,由操作的容易度使用包含波長200~380nm程度之紫外線之近紫外線即可。紫外線量,只要按照能量線聚合性化合物(B)之種類或黏著劑層3之厚度適宜選擇即可,通常為50~500mJ/cm2左右,以100~450mJ/cm2為佳,以200~400mJ/cm2更佳。此外,紫外線照度,通常為50~500mW/cm2左右,以100~450mW/cm2為佳,以200~400mW/cm2更佳。紫外線源,並無特別限制,可使用例如高壓水銀燈、金屬鹵素燈等。 When ultraviolet rays are used as the ionizing radiation, it is sufficient to use near-ultraviolet rays including ultraviolet rays having a wavelength of about 200 to 380 nm from the ease of handling. Amount of ultraviolet light, according to the kind as long as energy ray-polymerizable compound (B), or the thickness of the adhesive agent layer 3 is appropriately selected, generally 50 ~ 500mJ / cm 2 or so, to 100 ~ 450mJ / cm 2 preferably, 200 to 400 mJ/cm 2 is more preferable. Further, the intensity of ultraviolet, generally 50 ~ 500mW / cm 2, and at 100 ~ 450mW / cm 2 preferably, to 200 ~ 400mW / cm 2 more preferably. The ultraviolet source is not particularly limited, and for example, a high pressure mercury lamp, a metal halide lamp, or the like can be used.

使用電子線作為電離輻射線時,關於其加速電壓,只要按照能量線聚合性化合物(B)之種類或黏著劑層3之厚度適宜選定即可,通常加速電壓以10~1000kV程度為佳。此外,照射劑量,只要設定於能量線聚合性化合物(B)適當地硬化之範圍即可,通常於10~1000krad的範圍選定。電子線源並無特別限制,例如柯克考羅夫特-華登(Cockcroft-Walton)型、范德格拉夫(Van-de-Graaff)型、共振變壓器型、絕緣芯變壓器型或直線型、Dynamitron型、高頻波型等的各種電子線加速器。 When an electron beam is used as the ionizing radiation, the acceleration voltage is preferably selected in accordance with the type of the energy ray polymerizable compound (B) or the thickness of the adhesive layer 3, and the acceleration voltage is usually preferably from 10 to 1000 kV. In addition, the irradiation dose may be set in a range in which the energy ray polymerizable compound (B) is appropriately cured, and is usually selected in the range of 10 to 1000 krad. There are no special restrictions on the source of the electron, such as the Cockcroft-Walton type, the Van-de-Graaff type, the resonant transformer type, the insulated core transformer type or the linear type. Various electron line accelerators such as Dynamitron type and high frequency wave type.

(3)黏著賦予樹脂(C) (3) Adhesion-imparting resin (C)

形成關於本實施形態之黏著劑層3之黏著劑組成物,亦可含有聚合松香酯(C1)作為黏著賦予樹脂(C)的同時,含有不均化松香酯(C2)及石油系樹脂(C3)之至少一方。藉由含有分子量由數百至數千左右的寡聚物所組成之黏著賦予樹脂(C),黏著劑 層3之黏著性會增加。 The adhesive composition for the adhesive layer 3 of the present embodiment may contain a polymerized rosin ester (C1) as the adhesion-imparting resin (C), and may contain a heterogeneous rosin ester (C2) and a petroleum resin (C3). At least one of them. Adhesive imparting resin (C) composed of an oligomer containing a molecular weight of several hundreds to several thousands, an adhesive The adhesion of layer 3 will increase.

形成關於本實施形態之黏著劑層3之黏著劑組合物之黏著賦予樹脂(C)之含量,可按照要求黏著劑層3之黏著性等適宜設定。基本的趨勢,係黏著賦予樹脂(C)之含量過少時,難以提高黏著性,相反地含量過多時,與丙烯酸系聚合物(A)或能量線聚合性化合物(B)之相溶性下降,而於黏著劑層之黏著性發生離散,或提高切割片1之黏著力比下降等的異常的可能性。使黏著性容易在適當的範圍的觀點,形成黏著劑層3之黏著劑組成物之黏著賦予樹脂(C)之含量,對丙烯酸系聚合物(A)100質量部,以55質量部分以上200質量部以下為佳,以100質量部分以上175質量部以下更佳。 The content of the adhesion-imparting resin (C) of the adhesive composition of the adhesive layer 3 of the present embodiment can be appropriately set according to the adhesiveness of the adhesive layer 3 or the like. In the basic tendency, when the content of the adhesion-imparting resin (C) is too small, it is difficult to improve the adhesion, and when the content is too large, the compatibility with the acrylic polymer (A) or the energy ray-polymerizable compound (B) is lowered. The adhesion to the adhesive layer is dispersed, or the possibility of an abnormality such as a decrease in the adhesive force ratio of the dicing sheet 1 is increased. The content of the adhesion-imparting resin (C) of the adhesive composition of the adhesive layer 3 is formed so that the adhesiveness is easily in an appropriate range, and the mass of the acrylic polymer (A) is 100 mass parts, and the mass is 55 mass parts or more. The following is preferred, and it is better to have a mass of 100 or more and 175 mass or less.

聚合松香酯(C1)之具體的種類,並無特別限定。只要是使松脂酸與以其異構物之混合物為主成分之松香聚合(二聚化),藉由使羧基的部分酯化使其化學穩定化者,酯化的醇的種類(可例示甘油、異戊四醇等。)等為任意。聚合松香酯(C1)之具體例,可舉荒川化學工業公司製「PENSEL D125」、「PENSEL D135」、「PENSEL D160」等。 The specific type of the polymerized rosin ester (C1) is not particularly limited. As long as it is a rosin polymerization (dimerization) in which a mixture of rosin acid and a mixture thereof is a main component, and chemically stabilized by partial esterification of a carboxyl group, the type of the esterified alcohol (exemplified by glycerin) , isopentaerythritol, etc.) etc. are arbitrary. Specific examples of the polymerized rosin ester (C1) include "PENSEL D125", "PENSEL D135", and "PENSEL D160" manufactured by Arakawa Chemical Industries Co., Ltd.

由穩定地增加基於含有黏著賦予樹脂(C)之黏著劑層之黏著性之增加的觀點,形成關於本實施形態之黏著劑層3之黏著劑組成物之聚合松香酯(C1)的含量,對丙烯酸系聚合物(A)100質量部,為5質量部以上。該含量未滿5質量部時,有難以得到基於含有聚合松香酯(C1)之黏著性之提升效果之虞。另一方面,聚合松香酯(C1)之含量過多時,有聚合松香酯(C1)與丙烯酸系聚合物(A)之相溶性變得容易下降,於黏著劑 層3之黏著性發生離散,或切割片1之黏著力比容易下降之虞。因此,形成關於本實施形態的黏著劑層3之黏著劑組成物之聚合松香酯(C1)之含量,對丙烯酸系聚合物(A)100質量部,以20質量部以下為佳。由可減低黏著性發生離散的可能性及可更穩定地實現黏著性的提升的觀點,形成黏著劑層3之黏著劑組成物之聚合松香酯(C1)之含量,對丙烯酸系聚合物(A)100質量部,以8質量部分以上18質量部以下更佳,以10質量部分以上15質量部以下特別佳。 The content of the polymerized rosin ester (C1) of the adhesive composition of the adhesive layer 3 of the present embodiment is formed from the viewpoint of stably increasing the adhesion of the adhesive layer containing the adhesion-imparting resin (C). The acrylic polymer (A) has a mass portion of 100 parts by mass or more. When the content is less than 5 parts by mass, it is difficult to obtain an effect of improving the adhesion based on the polymerized rosin ester (C1). On the other hand, when the content of the polymerized rosin ester (C1) is too large, the compatibility between the polymerized rosin ester (C1) and the acrylic polymer (A) is likely to be lowered, and the adhesive is added. The adhesion of the layer 3 is discrete, or the adhesion of the dicing sheet 1 is liable to decrease. Therefore, the content of the polymerized rosin ester (C1) of the adhesive composition of the adhesive layer 3 of the present embodiment is preferably 20 parts by mass or less for 100 parts by mass of the acrylic polymer (A). The content of the polymerized rosin ester (C1) of the adhesive composition of the adhesive layer 3 is formed by the possibility of reducing the possibility of dispersion of adhesion and the improvement of adhesion more stably, and the acrylic polymer (A) The mass portion is preferably 8 parts by mass or more and 18 parts by mass or less, and more preferably 10 parts by mass or more and 15 parts by mass or less.

不均化松香酯(C2)及石油系樹脂(C3)均加上作為黏著賦予樹脂之功能,亦具有提高聚合松香酯(C1)與丙烯酸系聚合物(A)之相溶性之功能。因此,丙烯酸系聚合物(A)與聚合松香酯(C1)之SP值之差很大時,含有不均化松香酯(C2)及石油系樹脂(C3)之雙方,在使黏著劑層3之黏著性的離散少,且提高切割片1之黏著力比之觀點而佳。 Both the heterogeneous rosin ester (C2) and the petroleum resin (C3) have a function as an adhesion-imparting resin, and also have a function of improving the compatibility of the polymerized rosin ester (C1) with the acrylic polymer (A). Therefore, when the difference between the SP values of the acrylic polymer (A) and the polymerized rosin ester (C1) is large, both of the uneven rosin ester (C2) and the petroleum resin (C3) are contained, and the adhesive layer 3 is provided. The adhesion of the adhesive sheet is small, and the adhesion of the dicing sheet 1 is improved.

由可更穩定地發揮上述功能的觀點,含於形成黏著劑層3之黏著劑組成物之不均化松香酯(C2)之含量及石油系樹脂(C3)之含量之總和,對丙烯酸系聚合物(A)100質量部,以50質量部以上為佳,以80質量部以上更佳,以100質量部以上特別佳。含於形成黏著劑層3之黏著劑組成物之不均化松香酯(C2)之含量及石油系樹脂(C3)之含量之總和之上限,係基於應滿足黏著性等的黏著劑層3之其他的事項所決定者,通常,對丙烯酸系聚合物(A)100質量部,以200質量部以下為佳,以170質量部以下為佳。形成黏著劑層3之黏著劑組成物之不均化松香酯(C2)及石油系樹脂(C3)之各個含量的範圍並無特別限 定,於任一對丙烯酸系統聚合物(A)100質量部,以25質量部以上140質量部以下有較佳之情形。 The acrylic polymer is polymerized by the sum of the content of the uneven rosin ester (C2) and the content of the petroleum resin (C3) contained in the adhesive composition forming the adhesive layer 3 from the viewpoint of more stably exhibiting the above functions. The mass of the object (A) is preferably 50 parts by mass or more, more preferably 80 parts by mass or more, and particularly preferably 100 parts by mass or more. The upper limit of the sum of the content of the uneven rosin ester (C2) and the content of the petroleum resin (C3) contained in the adhesive composition for forming the adhesive layer 3 is based on the adhesive layer 3 which should satisfy the adhesiveness or the like. In the case where the amount of the acrylic polymer (A) is 100 parts by mass, it is preferably 200 parts by mass or less, and more preferably 170 parts by mass or less. The range of the content of the uneven rosin ester (C2) and the petroleum resin (C3) which form the adhesive composition of the adhesive layer 3 is not particularly limited. In any one of the 100 parts of the acrylic system polymer (A), it is preferably 25 parts by mass or more and 140 parts by mass or less.

不均化松香酯(C2)之具體的組成等,並無特別限定。其具體例,可舉荒川化學工業公司製「Super Ester A100」、「KE656」等。另一方面,石油系樹脂(C3)之具體的種類,亦無特別限定,C5系石油樹脂、C9系石油樹脂、C5/C9系石油樹脂及該等之加氫樹脂等。此外,作為具體例,三井化學公司製「FTR6100」、「FTR7100」、「FTR8100」等。 The specific composition and the like of the heterogeneous rosin ester (C2) are not particularly limited. Specific examples thereof include "Super Ester A100" and "KE656" manufactured by Arakawa Chemical Industries Co., Ltd. On the other hand, the specific type of the petroleum-based resin (C3) is not particularly limited, and is a C 5 -based petroleum resin, a C 9 -based petroleum resin, a C 5 /C 9 -based petroleum resin, and the like. Further, as a specific example, Mitsui Chemicals Co., Ltd. manufactures "FTR6100", "FTR7100", and "FTR8100".

形成黏著劑層3之黏著劑組成物,包含具有能量線聚合性基之低分子量化合物(B1)時,由於在由其黏著劑組成物形成之黏著劑層3,該化合物可發揮與黏著賦予樹脂同樣的功能(黏著劑層3之可塑化)之情形,故使具有能量線聚合性基之低分子量化合物(B1)之含量與黏著賦予樹脂(C)之含量之總和,對丙烯酸系聚合物(A)100質量部,包含165質量部以上400質量部以下為佳,以190質量部以上300質量部以下更佳,以200質量部以上275質量部以下更佳。 When the adhesive composition of the adhesive layer 3 is formed, including the low molecular weight compound (B1) having an energy ray polymerizable group, the compound can exhibit adhesion and adhesion to the resin due to the adhesive layer 3 formed of the adhesive composition. In the case of the same function (plasticization of the adhesive layer 3), the sum of the content of the low molecular weight compound (B1) having the energy ray polymerizable group and the content of the adhesion imparting resin (C), and the acrylic polymer (for the acrylic polymer ( A) The mass portion of 100 parts is preferably 165 parts by mass or more and 400 parts by mass or less, more preferably 190 parts by mass or more and 300 parts by mass or less, and more preferably 200 parts by mass or more and 275 parts by mass or less.

(4)架橋劑 (4) bridging agent

形成關於本實施形態之黏著劑層3之黏著劑組成物,亦可如上所述地含有可與丙烯酸系聚合物(A)反應之架橋劑。此時,關於本實施形態之黏著劑層3,含有丙烯酸系聚合物(A)與架橋劑之架橋反應所得之架橋物。作為架橋劑,可舉例如,環氧系化合物、異氰酸酯系化合物、金屬螯合物系化合物、氮丙啶系化合物等的聚醯亞胺化合物、三聚氰胺樹脂、尿素樹脂、二醛類、羥甲基聚合物、金屬烷氧化合物、金屬鹽等。該 等之中,由容易控制架橋反應等的理由,架橋劑以聚異氰酸酯化合物為佳。 The adhesive composition for forming the adhesive layer 3 of the present embodiment may contain a bridging agent reactive with the acrylic polymer (A) as described above. At this time, the adhesive layer 3 of the present embodiment contains a bridge material obtained by bridging the acrylic polymer (A) and the bridging agent. Examples of the bridging agent include a polyethylenimine compound such as an epoxy compound, an isocyanate compound, a metal chelate compound, or an aziridine compound, a melamine resin, a urea resin, a dialdehyde, and a methylol group. A polymer, a metal alkoxide, a metal salt or the like. The Among them, the bridging agent is preferably a polyisocyanate compound for the reason that the bridging reaction or the like is easily controlled.

在此,稍微詳細地說明關於聚異氰酸酯化合物。聚異氰酸酯化合物係於1分子具有2個異氰酸酯基之化合物,可舉例如甲苯基二異氰酸酯、二苯基二異氰酸酯、二甲苯基二異氰酸酯等的芳香族聚異氰酸酯;二環己基甲烷-4,4'-二異氰酸酯、二環庚烷三異氰酸酯、亞環戊基二異氰酸酯、亞環己烯二異氰酸酯、甲基亞環己基二異氰酸酯、加氫亞二甲苯基二異氰酸酯等的脂環式異氰酸酯化合物;六亞甲基二異氰酸酯、三甲基六亞甲基二異氰酸酯、賴氨酸二異氰酸酯等的具有鏈狀骨架之異氰酸酯。 Here, the polyisocyanate compound will be described in some detail. The polyisocyanate compound is a compound having two isocyanate groups per molecule, and examples thereof include aromatic polyisocyanates such as tolyl diisocyanate, diphenyl diisocyanate, and xylyl diisocyanate; and dicyclohexylmethane-4, 4' - an alicyclic isocyanate compound such as diisocyanate, dicycloheptane triisocyanate, cyclopentylene diisocyanate, cyclohexene diisocyanate, methyl cyclohexylene diisocyanate or hydrogenated xylylene diisocyanate; An isocyanate having a chain skeleton such as methylene diisocyanate, trimethylhexamethylene diisocyanate or lysine diisocyanate.

此外,亦可使用該等化合物之雙縮脲體、異氰脲酸酯體,或該等的化合物,與乙二醇、三甲醇基丙烷、蓖麻油等的非芳香族性低分子活性氫含有化合物之反應物之加成物等的變性體。上述聚異氰酸酯化合物,可以1種,亦可以複數種。 Further, a biuret or isocyanurate of these compounds or a compound thereof may be used, and a non-aromatic low molecular active hydrogen such as ethylene glycol, trimethylolpropane or castor oil may be contained. A denatured product such as an adduct of a reactant of a compound. The polyisocyanate compound may be used singly or in combination of plural kinds.

關於本實施形態之黏著劑層3,具有基於丙烯酸系聚合物(A)與架橋劑之架橋物時,可藉由調整架橋密度,控制黏著劑層3之能量線照射前黏著性等的特性。因此,該架橋密度,亦可按照要求黏著劑層3之特性適宜設定。再者,用於形成關於本實施形態的黏著劑層3之黏著劑組成物含有架橋劑時,按照該架橋劑之種類,含有適當的架橋促進劑為佳。例如,架橋劑為聚異氰酸酯化合物時,用於形成黏著劑層3之黏著劑組成物含有有機錫化合物等的有機金屬化合物系之架橋促進 劑為佳。 When the adhesive layer 3 of the present embodiment has a bridging material based on the acrylic polymer (A) and the bridging agent, it is possible to control the adhesiveness of the adhesive layer 3 before the irradiation of the energy ray by adjusting the bridging density. Therefore, the bridging density can be appropriately set according to the characteristics of the adhesive layer 3 as required. Further, when the adhesive composition for forming the adhesive layer 3 of the present embodiment contains a bridging agent, it is preferred to contain an appropriate bridging promoter depending on the type of the bridging agent. For example, when the bridging agent is a polyisocyanate compound, the adhesive composition for forming the adhesive layer 3 contains an organometallic compound such as an organometallic compound. The agent is better.

(5)其他的成分 (5) Other ingredients

用於形成包括關於本實施形態之切割片1所包括之黏著劑層3之黏著劑組成物,加上上述成分,亦可含有光聚合起始劑、染料或顏料等的著色材料、難燃劑、填充劑等的各種添加劑。 The adhesive composition for forming the adhesive layer 3 included in the dicing sheet 1 of the present embodiment, and the above-mentioned components may also contain a coloring material such as a photopolymerization initiator, a dye or a pigment, and a flame retardant. Various additives such as fillers.

在此,關於光聚合起始劑稍微詳細地說明。光聚合起始劑,可舉安息香化合物、苯乙酮化合物、醯基膦氧化物化合物、二茂鈦化合物、噻吨酮化合物、過氧化物化合物等的光起始劑、胺或醌等的光增感劑等,具體而言,可例示1-羥基環己基苯酮、安息香、安息香甲醚、安息香乙醚、安息香異丙醚、苄基二苯基硫醚、四甲基秋蘭姆單硫化物、苯偶醯異丁腈、二苄基、聯乙醯、β-氯蒽醌、2,4,6-三甲基苯甲醯基二苯基氧化膦等。使用紫外線作為能量線時,藉由調合光聚合起始劑,可減少照射時間,照射量。 Here, the photopolymerization initiator is explained in some detail. The photopolymerization initiator may, for example, be a photoinitiator such as a benzoin compound, an acetophenone compound, a mercaptophosphine oxide compound, a titanocene compound, a thioxanthone compound or a peroxide compound, or an amine or an anthracene. A sensitizer or the like, specifically, 1-hydroxycyclohexyl benzophenone, benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzyl diphenyl sulfide, tetramethyl thiuram monosulfide Benzene oxime isobutyronitrile, dibenzyl, hydrazine, β-chloropurine, 2,4,6-trimethylbenzimidyldiphenylphosphine oxide, and the like. When ultraviolet rays are used as the energy ray, the irradiation time and the amount of irradiation can be reduced by blending the photopolymerization initiator.

(6)物性、形狀等 (6) physical properties, shape, etc.

i)黏著力比 i) adhesion ratio

在於本說明書,所謂黏著力比,係將關於本實施形態之切割片1所包括之黏著劑層3之與基材2相對之側之相反側之露出面作為測定對象面,以半導體構裝的樹脂封裝面作為被著面,遵照JIS Z0237:2000以180°進行拉剝試驗時所測定之切割片1之黏著力,能量線照射前之狀態的黏著力(以下,亦稱為「照射前黏著力」。)對能量線照射後之狀態之黏著力(以下,亦稱為「照射後黏著力」。)之比(前/後)之意思。關於本實施形態之切割片1之黏著力比為3以上。藉由使黏著力比在於該範 圍,可實現減低封膠晶片在於切割步驟或擴展步驟發生飛散的可能性,且可減低在於拾取步驟發生拾取不良的可能性。黏著力比未滿3時,有因難以維持照射前之高黏著力,故有封膠晶片變得容易發生飛散,或因難以維持照射後之低黏著力,而容易發生拾取不良。由可更穩定地減低封膠晶片之飛散及/或發生拾取不良的可能性之觀點,黏著力比以4.5以上為佳,以8.0以上更佳。黏著力比之上限並無特別設定,黏著劑層3藉由能量線照射之硬化時所產生的體積收縮的程度,由於與黏著力比有正相關的關係,故黏著力比過高時,有封膠晶片在黏著劑層3之硬化時發生移動之異常之虞。因此,通常,黏著力比以20以下為佳,以13以下更佳,以10以下特別佳。 In the present specification, the adhesive force ratio is a semiconductor-mounted surface in which the exposed surface on the opposite side to the side facing the substrate 2 of the adhesive layer 3 included in the dicing sheet 1 of the present embodiment is used as a measurement target surface. The adhesive surface of the resin packaged surface is the adhesion of the dicing sheet 1 measured by the peeling test at 180° in accordance with JIS Z0237:2000, and the adhesion force before the energy ray irradiation (hereinafter, also referred to as "adhesion before irradiation" """) The ratio of the adhesion (hereinafter, also referred to as "adhesion after irradiation") to the state after the irradiation of the energy ray (previous/post). The adhesive force ratio of the dicing sheet 1 of the present embodiment is 3 or more. By making the adhesion ratio in the van In addition, it is possible to reduce the possibility that the sealing film is scattered in the cutting step or the expanding step, and the possibility of picking up in the picking step may be reduced. When the adhesion is less than 3, it is difficult to maintain the high adhesion force before the irradiation, so that the sealing film is likely to be scattered, or it is difficult to maintain the low adhesion after the irradiation, and the pickup failure is likely to occur. From the viewpoint of more stably reducing the scattering of the sealant wafer and/or the possibility of picking up defects, the adhesive force ratio is preferably 4.5 or more, more preferably 8.0 or more. The adhesive force is not particularly set, and the degree of volume shrinkage of the adhesive layer 3 by hardening by the energy ray is positively correlated with the adhesive force ratio, so when the adhesive force ratio is too high, The abnormality of the movement of the sealant wafer during the hardening of the adhesive layer 3 occurs. Therefore, in general, the adhesive force is preferably 20 or less, more preferably 13 or less, and particularly preferably 10 or less.

再者,照射前黏著力及照射後黏著力之合適範圍,應按照切割步驟、擴展步驟及拾取步驟之具體條件,被著體之半導體構裝之材質或表面狀態(凹凸的程度等)適宜設定。通常,照射前黏著力,以2000mN/25mm以上為佳,以2500mN/25mm以上更佳。此外,照射後黏著力,以600mN/25mm以下為佳,以400mN/25mm以下更佳,以300mN/25mm以下特別佳。 Furthermore, the appropriate range of adhesion before irradiation and adhesion after irradiation should be appropriately set according to the material of the semiconductor structure or the surface state (degree of unevenness, etc.) according to the specific conditions of the cutting step, the expanding step and the picking step. . Generally, the adhesion before irradiation is preferably 2000 mN/25 mm or more, more preferably 2500 mN/25 mm or more. Further, the adhesion after the irradiation is preferably 600 mN/25 mm or less, more preferably 400 mN/25 mm or less, and particularly preferably 300 mN/25 mm or less.

ii)厚度 Ii) thickness

關於本實施形態之切割片1所包括之黏著劑層3之厚度,並無特別限定。過薄時,有發生黏著劑層之黏著性之離散性變大之問題之虞,於過厚時,黏著性過高而難以將切割片1之黏著力比控制於上述範圍,或於拾取時在黏著劑層3內部發生團聚破壞的可能性變高,而黏著劑殘留率(其定義等之細節將後 述於實施例。)變高之虞。由穩定地減低發生如此之問題之可能性之觀點,黏著劑層3之厚度,以2μm以上50μm以下為佳,以5μm以上35μm以下更佳,以5μm以上20μm以下更佳,以5μm以上15μm以下特別佳。黏著劑層3之厚度成20μm以下,則可使黏著劑殘留率特別低,黏著劑層3之厚度成15μm以下,則可使黏著劑留下率為20%以下。 The thickness of the adhesive layer 3 included in the dicing sheet 1 of the present embodiment is not particularly limited. When it is too thin, there is a problem that the dispersion of the adhesiveness of the adhesive layer becomes large. When the thickness is too thick, the adhesion is too high, and it is difficult to control the adhesion ratio of the dicing sheet 1 to the above range, or at the time of picking up. The possibility of agglomeration failure inside the adhesive layer 3 becomes high, and the adhesive residue rate (the definition of the definition etc. will be It is described in the examples. ) become higher. The thickness of the adhesive layer 3 is preferably 2 μm or more and 50 μm or less, more preferably 5 μm or more and 35 μm or less, more preferably 5 μm or more and 20 μm or less, and more preferably 5 μm or more and 15 μm or less from the viewpoint of stably reducing the possibility of such a problem. Especially good. When the thickness of the adhesive layer 3 is 20 μm or less, the adhesive residue ratio can be made particularly low, and when the thickness of the adhesive layer 3 is 15 μm or less, the adhesive retention rate can be made 20% or less.

iii)剝離片 Iii) peeling sheet

關於本實施形態之切割片1,在直到將黏著劑3黏貼於被著體之半導體構裝之前之間,以保護黏著劑層3為目的,亦可於黏著劑層3與基板相對之側之相反側的面,黏貼剝離片之剝離面。剝離片之構成為任意,可例示將塑膠薄膜以剝離劑等塗布者。塑膠薄膜之具體例,可舉聚對苯二甲酸乙二醇酯、聚對苯二甲酸丁二醇酯、聚萘二甲酸乙二醇酯等的聚酯薄膜,或聚乙烯或聚丙烯等的聚烯烴薄膜。剝離劑,使用矽酮系、氟系、長鏈烷基系等,該等之中,以可得廉價而穩定的性能之矽酮系為佳。代替上述剝離片之塑膠膜,亦可使用玻璃紙、塗層紙、優質紙等的紙基材或於紙基材層壓聚乙烯等的熱塑性樹脂之層壓紙。剝離片的厚度,並無特別限制,通常為20μm以上250μm以下的程度。 The dicing sheet 1 of the present embodiment may be applied to the side opposite to the substrate with the adhesive layer 3 for the purpose of protecting the adhesive layer 3 until the adhesive 3 is adhered to the semiconductor package of the object. The opposite side of the face, adhered to the peeling surface of the release sheet. The configuration of the release sheet is arbitrary, and a case where the plastic film is applied as a release agent or the like can be exemplified. Specific examples of the plastic film include a polyester film such as polyethylene terephthalate, polybutylene terephthalate or polyethylene naphthalate, or polyethylene or polypropylene. Polyolefin film. As the release agent, an anthrone, a fluorine-based or a long-chain alkyl group is used, and among these, an anthrone which is inexpensive and stable can be preferably used. Instead of the plastic film of the release sheet, a paper substrate such as cellophane, coated paper, or high-quality paper may be used, or a laminated paper of a thermoplastic resin such as polyethylene may be laminated on the paper substrate. The thickness of the release sheet is not particularly limited, but is usually about 20 μm or more and 250 μm or less.

3.切割片之製造方法 3. Manufacturing method of cutting piece

切割片1的製造方法,只要是可將由上述黏著劑組成物形成之黏著劑層3層積於基材2一面,詳細的方法並無特別限定。舉一例,則調製含有上述黏著劑組成物、及根據所期望進一步含有溶劑之塗層液,於基材2的一面上,藉由模具塗佈機、 淋幕塗佈機、噴霧塗佈機、狹縫塗佈機、刮刀塗佈機等將該塗層液塗佈形成塗膜,藉由使該一面上的塗膜乾燥,形成黏著劑層3。塗層液,只要可進行塗佈,其性狀並無特別限定,有將用於形成黏著劑層3之成分作為溶質含有之情形,亦有作為分散質含有之情形。 The method for producing the dicing sheet 1 is not particularly limited as long as the adhesive layer 3 formed of the above-described adhesive composition can be laminated on the substrate 2. As an example, a coating liquid containing the above-described adhesive composition and further containing a solvent as desired is prepared on one side of the substrate 2 by a die coater, The coating liquid is applied to form a coating film by a curtain coater, a spray coater, a slit coater, a knife coater, etc., and the coating film on the one side is dried to form the adhesive layer 3. The coating liquid is not particularly limited as long as it can be applied, and the component for forming the adhesive layer 3 may be contained as a solute, or may be contained as a dispersoid.

黏著劑組成物含有架橋劑時,藉由改變上述乾燥條件(溫度、時間等),或者另外設置其他架橋用的加熱處理,使塗膜內的丙烯酸系聚合物(A)與架橋劑進行架橋反應,於黏著劑層3內以所期望的存在密度形成架橋構造即可。為使該架橋反應充分進行,亦可藉由上述方法等將黏著劑層3層積於基材2之後,將所得切割片1,進行例如於23℃、相對濕度50%之環境靜置數日之熟成。 When the adhesive composition contains a bridging agent, the acrylic polymer (A) in the coating film is bridged with the bridging agent by changing the drying conditions (temperature, time, etc.) or by additionally providing heat treatment for bridging. The bridging structure may be formed in the adhesive layer 3 at a desired density of existence. In order to sufficiently carry out the bridging reaction, the adhesive sheet 3 may be laminated on the substrate 2 by the above method, and the obtained dicing sheet 1 may be allowed to stand for several days, for example, at 23 ° C and a relative humidity of 50%. Mature.

或者,亦可將塗層液塗佈於上述剝離片之剝離面上形成塗膜,將此乾燥形成黏著劑層3與剝離片所組成之層積體,將在於該層積體之黏著劑層3與剝離片相對之側之相反側之面黏貼於基材2之基材被著面,得到切割片1與剝離片之層積體。在於該層積體之剝離片可作為步驟材剝離,亦可直到黏貼於半導體構裝之間保護黏著劑層3。 Alternatively, the coating liquid may be applied to the release surface of the release sheet to form a coating film, which is dried to form a laminate composed of the adhesive layer 3 and the release sheet, and the adhesive layer of the laminate is placed. 3 The substrate adhered to the substrate 2 on the side opposite to the side opposite to the release sheet was faced, and a laminate of the dicing sheet 1 and the release sheet was obtained. The release sheet in the laminate may be peeled off as a step material or may be adhered to the adhesive layer 3 until it is adhered to the semiconductor package.

4.封膠晶片之製造方法 4. Method for manufacturing gelatinized wafer

將使用關於本實施形態之切割片1由半導體構裝製造封膠晶片之方法說明如下。 A method of manufacturing a sealant wafer from a semiconductor package using the dicing sheet 1 of the present embodiment will be described below.

半導體構裝,係如上所述於基台的集合體之各基台上搭載半導體晶片,將該等半導體晶片一起以樹脂封裝的電子零件的集合體,而通常具有基板面與樹脂封裝面,其厚度為 200~2000μm程度。於樹脂封裝面之表面之算術平均粗糙度Ra為0.5~10μm程度而粗糙,此外,為容易地由封裝裝置之模具取出,封裝材料有含有脫模成分之情形。因此,將黏著片黏貼於樹脂封裝面時,有無法充分發揮固定性能之傾向。關於本實施形態之切割片1,在於使用時,將黏著劑層3側之面(即,黏著劑層3之與基材2相反側之面)黏貼於半導體構裝樹脂封裝面。再者,於切割片1之黏著劑層3側之面黏貼有剝離片時,將該剝離片剝離使黏著劑層3側之面露出,將該面黏貼於半導體構裝之樹脂封裝面即可。切割片1之周緣部,通常係藉由設於該部分之黏著劑層3,黏貼於稱為環形框之輸送或用於固定在裝置之環狀夾具。黏著劑層3,由於以適當的量含有黏著賦予樹脂(C),故照射前黏著力充分的高。因此,即使將黏貼於切割片1之半導體構裝供於切割步驟,可減低將半導體構裝個片化而得之封膠晶片在加工中飛散的可能性。再者,藉由切割步驟所形成之封膠晶片的尺寸,通常為5mm×5mm以下,近年亦有作成1mm×1mm程度之情形,惟關於本實施形態之切割片1之黏著劑層3由於照射前具有優良的黏著性,對如此之細微間距之切割亦可充分對應。 In the semiconductor package, a semiconductor wafer is mounted on each of the bases of the base assembly as described above, and the semiconductor wafers are collectively made of resin-packed electronic components, and generally have a substrate surface and a resin package surface. Thickness is 200~2000μm degree. The arithmetic mean roughness Ra of the surface of the resin package surface is as rough as about 0.5 to 10 μm, and in addition, it is easy to be taken out from the mold of the packaging device, and the sealing material contains a mold release component. Therefore, when the adhesive sheet is adhered to the resin package surface, the fixing performance tends not to be sufficiently exhibited. The dicing sheet 1 of the present embodiment is used by adhering the surface on the side of the adhesive layer 3 (that is, the surface of the adhesive layer 3 opposite to the substrate 2) to the semiconductor package resin package surface. When the release sheet is adhered to the surface of the dicing sheet 1 on the side of the adhesive layer 3, the release sheet is peeled off to expose the surface on the side of the adhesive layer 3, and the surface can be adhered to the resin package surface of the semiconductor package. . The peripheral portion of the dicing sheet 1 is usually adhered to a ring-shaped jig called a ring frame for transporting or for fixing to the device by the adhesive layer 3 provided in the portion. Since the adhesive layer 3 contains the adhesive-imparting resin (C) in an appropriate amount, the adhesive force before irradiation is sufficiently high. Therefore, even if the semiconductor package adhered to the dicing sheet 1 is supplied to the dicing step, the possibility that the encapsulating wafer obtained by laminating the semiconductor structure is scattered during processing can be reduced. Further, the size of the sealant wafer formed by the dicing step is usually 5 mm × 5 mm or less, and in recent years, it is also about 1 mm × 1 mm, but the adhesive layer 3 of the dicing sheet 1 of the present embodiment is irradiated. It has excellent adhesion before, and it can also fully correspond to the cutting of such fine pitch.

藉由實施以上的切割步驟,可由半導體構裝得到複數的封膠晶片。切割步驟結束後,為容易拾取近接配置於切割片1上之複數封膠晶片,進行將切割片1向主面內方向伸長之擴展步驟。該伸長的程度,考慮鄰接之封膠晶片應具有的間隔、基材2之拉伸強度等適宜設定即可。 By performing the above cutting steps, a plurality of encapsulated wafers can be obtained from a semiconductor package. After the dicing step is completed, in order to easily pick up a plurality of sealant wafers disposed adjacent to the dicing sheet 1, an expansion step of elongating the dicing sheet 1 in the main surface direction is performed. The degree of elongation may be appropriately set in consideration of the interval which the adjacent sealing wafer should have, the tensile strength of the substrate 2, and the like.

藉由實施擴展步驟,使鄰接配置之封膠晶片互相 適當地離間,則藉由真空夾頭等的泛用手段,進行黏著劑層3上的封膠晶片之拾取。拾取之封膠晶片,將供於輸送步驟等下一步驟。 By implementing an expansion step, the adjacently disposed encapsulated wafers are mutually When properly separated, the sealing of the sealing wafer on the adhesive layer 3 is performed by a general means such as a vacuum chuck. The glued wafer that is picked up will be supplied to the next step such as the transport step.

切割步驟結束後,到開始拾取步驟,藉由對關於本實施形態之切割片1,由基材2側進行能量線照射,使切割片1所包括之黏著劑層3內部,含於此之能量線聚合性化合物(B)進行聚合反應,使照射後黏著力變成照射前黏著力之1/3以下。因此,不容易發生拾取不良。該能量線照射之實施時期,只要在結束切割步驟之後,開始拾取步驟之前,並無特別限定。由減低封膠晶片在擴展步驟時飛散的可能性的觀點,於擴展步驟之後實施為佳,但由於隨著黏著劑層3藉由能量線照射硬化,而該層會稍微收縮,故基於該收縮的位移將成問題時等,亦可將能量線照射在實施擴展步驟前實施。 After the completion of the dicing step, the dicing sheet 1 of the present embodiment is subjected to energy ray irradiation from the side of the substrate 2 to cause the inside of the adhesive layer 3 included in the dicing sheet 1 to be contained therein. The linear polymerizable compound (B) is subjected to a polymerization reaction so that the adhesion after the irradiation becomes 1/3 or less of the adhesion force before the irradiation. Therefore, it is not easy to pick up badly. The implementation period of the energy ray irradiation is not particularly limited as long as the pickup step is started after the end of the dicing step. From the viewpoint of reducing the possibility of scattering of the sealant wafer at the expansion step, it is preferably carried out after the expansion step, but since the layer is slightly shrunk as the adhesive layer 3 is hardened by the energy ray irradiation, based on the shrinkage The displacement will be a problem, etc., and the energy line illumination may be performed before the implementation of the expansion step.

如上所述,關於本實施形態之封膠晶片之製造方法,不容易發生封膠晶片的飛散,在於之後的步驟,亦不容易發生拾取不良。因此,將半導體構裝經由分割成複數的封膠晶片之切割步驟、擴展步驟及拾取步驟到下一步驟之一連串步驟,不容易降低良率。因此,使用關於本實施形態之切割片1之本實施形態之製造方法所得之封膠晶片,容易在成本上較有利。此外,封膠晶片的飛散或拾取不良,於直接關聯於該等異常之封膠晶片之外,因晶片撞擊等,而有使同批次所製造的其他封膠晶片發生缺陷等的問題之情形。因此,關於本實施形態之封膠晶片之製造方法所製造之封膠晶片,減低具有如此之問題的可能性,而品質優良。 As described above, in the method for producing a sealing wafer of the present embodiment, scattering of the sealing wafer is less likely to occur, and in the subsequent steps, picking failure is less likely to occur. Therefore, it is not easy to reduce the yield by dividing the semiconductor package through a plurality of steps of cutting, expanding, and picking up the plurality of encapsulated wafers to the next step. Therefore, the use of the sealant wafer obtained by the production method of the present embodiment of the dicing sheet 1 of the present embodiment is advantageous in terms of cost. In addition, the scattering or pick-up of the sealant wafer is not directly related to the abnormality of the sealant wafer, and there is a problem that the other sealant wafers produced in the same batch are defective due to wafer impact or the like. . Therefore, the sealant wafer manufactured by the method for producing a sealant wafer of the present embodiment has a possibility of reducing such a problem and is excellent in quality.

以上所說明之實施形態,係為容易理解本發明而記載者,並非限定本發明而記載者。因此揭示於上述實施形態之各要素,係包含屬於本發明之技術性範圍之所有設計變更或均等物者之主旨。 The embodiments described above are described for easy understanding of the present invention, and are not intended to limit the present invention. Therefore, the various elements of the above-described embodiments are intended to encompass all design changes or equivalents of the technical scope of the invention.

[實施例] [Examples]

以下,藉由實施例等進一步具體說明本發明,惟本發明之範圍並非限定於該等實施例等。 Hereinafter, the present invention will be specifically described by way of Examples and the like, but the scope of the present invention is not limited to the Examples and the like.

〔實施例1〕 [Example 1]

(1)塗層液之調製 (1) Modulation of coating liquid

調製具有如下組成之塗層液。 A coating liquid having the following composition was prepared.

i)作為丙烯酸系聚合物(A),將100質量部丙烯酸丁基、2質量部丙烯酸及0.5質量部丙烯酸2-羥基乙酯共聚合而得之共聚物(重量平均分子量60萬,固體分濃度40質量%),以固形分100質量部;ii)作為能量線聚合性化合物(B),由6官能尿烷丙烯酸酯寡聚物(大日精化工業公司製SEIKABEAM 14-29B,重量平均分子量2000,固體分濃度80質量%、n/M=3×10-3)所組成之丙烯酸酯化合物,以固形分100重量部;iii)作為黏著賦予樹脂(C)之聚合松香酯(C1),荒川化學工業公司製PENSEL D125(固體分濃度100質量%),以固形分12.5質量部;iv)作為黏著賦予樹脂(C)之不均化松香酯(C2),荒川化學工業公司製SUPERESTER A100(固體分濃度100質量%),以固形分62.5質量部; v)作為黏著賦予樹脂(C)之中石油系樹脂(C3),三井化學公司製FTR6100(固體分濃度100質量%),以固形分62.5質量部;vi)與丙烯酸系聚合物(A)反應之架橋劑,由日本聚氨酯公司製CORONATE L組成之聚異氰酸酯化合物(甲苯基二異氰酸酯之三羥甲基丙烷加成物,1分子中的異氰酸酯基數3個,固體分濃度75質量%),以固形分9質量部;及vii)作為光聚合起始劑,IRGACURE184(Ciba.Speciality.Chemicals公司製、固體分濃度100質量%),以固形分7.5質量部。 i) a copolymer obtained by copolymerizing 100 parts by mass of butyl acrylate, 2 parts by mass of acrylic acid and 0.5 part by mass of 2-hydroxyethyl acrylate as the acrylic polymer (A) (weight average molecular weight 600,000, solid concentration) 40% by mass), 100 parts by mass of solid content; ii) As an energy ray polymerizable compound (B), a 6-functional urethane acrylate oligomer (SEIKABEAM 14-29B, manufactured by Daisei Seiki Co., Ltd., weight average molecular weight 2000) , an acrylate compound having a solid concentration of 80% by mass, n/M = 3 × 10 -3 ), a solid content of 100 parts by weight; iii) a polymerized rosin ester (C1) as an adhesion-imparting resin (C), Arakawa Chemical Industry Co., Ltd. made PENSEL D125 (solid concentration: 100% by mass), with a solid content of 12.5 parts by mass; iv) as an adhesion-imparting resin (C), a heterogeneous rosin ester (C2), and Arakawa Chemical Industry Co., Ltd. SUPERESTER A100 (solid The concentration is 100% by mass), and the solid content is 62.5 parts by mass; v) the petroleum resin (C3) as the adhesion-imparting resin (C), FTR6100 (solid concentration: 100% by mass) manufactured by Mitsui Chemicals Co., Ltd., and the solid content is 62.5 mass. Department; vi) a bridging agent that reacts with the acrylic polymer (A), A polyisocyanate compound composed of CORONATE L manufactured by Nippon Polyurethane Co., Ltd. (trimethylolpropane adduct of tolyl diisocyanate, 3 isocyanate groups in 1 molecule, solid concentration: 75% by mass), and 9 parts by mass And vii) as a photopolymerization initiator, IRGACURE 184 (manufactured by Ciba. Specialty. Chemicals, solid concentration: 100% by mass), and has a solid content of 7.5 mass parts.

(2)切割片的製作 (2) Production of cutting sheets

準備於厚度38μm之聚對苯二甲酸乙二醇酯製基材薄膜之一方的主面上形成矽酮系剝離劑層而成之剝離片(LINTEC公司製:SP-PET381031)。於該剝離片之剝離面上,以刮刀塗佈機,使最終所得之黏著劑層之厚度為10μm地塗佈上述塗層液。將所得塗膜,每剝離片在80℃的環境下經過1分鐘使塗膜乾燥並進行架橋反應,得到由剝離片與黏著劑層(厚度:10μm)之層積體。 A release sheet (SP-PET 381031 manufactured by LINTEC Co., Ltd.) obtained by forming an oxime-based release agent layer on one of the main surfaces of a polyethylene terephthalate base film having a thickness of 38 μm was prepared. On the release surface of the release sheet, the coating liquid was applied by a knife coater so that the thickness of the finally obtained adhesive layer was 10 μm. The obtained coating film was dried for 1 minute in an environment of 80 ° C for each of the release sheets, and subjected to a bridging reaction to obtain a laminate of a release sheet and an adhesive layer (thickness: 10 μm).

以厚度140μm之乙烯-甲基丙烯酸共聚物(EMAA)薄膜(25%變形時拉伸應力:10.8N/10mm、最大拉伸應力:25.5MPa、破斷伸度:525%)所組成之基材之一方的面作為基材被著面,於該面,黏貼上述層積體之黏著劑層側之面,得到將由第1圖所示之基材與黏著劑層所組成之切割片,進一步於黏著劑層之表層積剝離片的狀態。 A substrate composed of an ethylene-methacrylic acid copolymer (EMAA) film having a thickness of 140 μm (tensile stress at 2% deformation: 10.8 N/10 mm, maximum tensile stress: 25.5 MPa, breaking elongation: 525%) One of the faces is covered as a substrate, and the surface of the laminate on the side of the adhesive layer is adhered to the surface, and a dicing sheet composed of the substrate and the adhesive layer shown in Fig. 1 is obtained. The surface of the adhesive layer is laminated to the state of the release sheet.

〔實施例2〕 [Example 2]

在於實施例1,將塗層液所含有之丙烯酸系聚合物(A),變更為共聚合塗層液所含有的100質量部的丙烯酸丁酯、5質量部的丙烯酸及0.2質量部的丙烯酸2-羥基乙酯之聚合物(重量平均分子量60萬,固體分濃度40質量%)以外,進行與實施例1同樣的操作,得到切割片。 In the first embodiment, the acrylic polymer (A) contained in the coating liquid was changed to 100 parts by mass of butyl acrylate, 5 parts by mass of acrylic acid, and 0.2 part by mass of acrylic acid 2 contained in the copolymerization coating liquid. A dicing sheet was obtained in the same manner as in Example 1 except that the polymer of hydroxyethyl ester (weight average molecular weight: 600,000, solid content concentration: 40% by mass) was used.

〔實施例3〕 [Example 3]

在於實施例1,將塗層液所含有之黏著賦予樹脂(C)之中,進行使不均化松香酯(C2)之含量以固形分為125質量部,石油系樹脂(C3)之含量以固形分為50質量部之變更,將作為黏著賦予樹脂(C)之含量由實施例1之137.5質量部變更為182.5質量部以外,進行與實施例1同樣的操作,得到切割片。 In the first embodiment, the adhesion of the coating liquid is applied to the resin (C), and the content of the uneven rosin ester (C2) is divided into 125 parts by solid content, and the content of the petroleum resin (C3) is The solid content was changed to 50 parts by mass, and the content of the adhesion-imparting resin (C) was changed from 137.5 mass parts of the first embodiment to 182.5 mass parts, and the same operation as in the first example was carried out to obtain a dicing sheet.

〔實施例4〕 [Example 4]

在於實施例1,將黏著劑層之厚度由10μm變更為15μm以外,進行與實施例1同樣的操作,得到切割片。 In the same manner as in Example 1, except that the thickness of the pressure-sensitive adhesive layer was changed from 10 μm to 15 μm, the dicing sheet was obtained.

〔實施例5〕 [Example 5]

在於實施例1,將黏著劑層之厚度由10μm變更為30μm以外,進行與實施例1同樣的操作,得到切割片。 In the same manner as in Example 1, except that the thickness of the pressure-sensitive adhesive layer was changed from 10 μm to 30 μm in the first embodiment, a dicing sheet was obtained.

〔實施例6〕 [Example 6]

在於實施例1,塗層液所含有的黏著賦予樹脂(C)之中,不含石油系樹脂(C3),使黏著賦予樹脂(C)以固形分之含量由實施例1之137.5質量部變更為75質量部以外,進行與實施例1同樣的操作,得到切割片。 In the first embodiment, the adhesion-imparting resin (C) contained in the coating liquid does not contain the petroleum-based resin (C3), and the content of the adhesion-imparting resin (C) in the solid content is changed from the 137.5 mass portion of the first embodiment. A dicing sheet was obtained in the same manner as in Example 1 except that the mass portion was 75 mass parts.

〔實施例7〕 [Example 7]

在於實施例1,塗層液所含有的黏著賦予樹脂(C)之中,不 含不均化松香酯(C2),使石油系樹脂(C3)之含量以固形分為75質量部,黏著賦予樹脂(C)以固形分之含量由實施例1之137.5質量部變更為87.5質量部以外,進行與實施例1同樣的操作,得到切割片。 In the first embodiment, the adhesion of the coating liquid to the resin (C) is not The content of the petroleum-based resin (C3) is 75 parts by mass, and the content of the solid content of the adhesion-imparting resin (C) is changed from 137.5 parts of the first embodiment to 87.5 mass of the first embodiment. A dicing sheet was obtained in the same manner as in Example 1 except for the portion.

〔實施例8〕 [Example 8]

在於實施例1,將塗層液所含有的能量線聚合性化合物(B)之種類,由6官能尿烷丙烯酸酯變更為3官能尿烷丙烯酸酯寡聚物(大日精化工業公司製SEIKABEAM EXL-810TL,重量平均分子量5000,固形分濃度60質量%,n/M=6×10-4),將含量變更為250質量部以外,進行與實施例1同樣的操作,得到切割片。 In the first embodiment, the type of the energy ray polymerizable compound (B) contained in the coating liquid was changed from a 6-functional urethane acrylate to a trifunctional urethane acrylate oligomer (SEIKABEAM EXL manufactured by Daisei Seiki Co., Ltd.) -810TL, weight average molecular weight: 5000, solid content concentration: 60 mass%, n/M = 6 × 10 -4 ), and the content was changed to 250 mass parts, and the same operation as in Example 1 was carried out to obtain a dicing sheet.

〔比較例1〕 [Comparative Example 1]

在於實施例1,將塗層液所含有之黏著賦予樹脂(C)之中,不含聚合松香酯(C1),黏著賦予樹脂(C)以固形分之含量由實施例1之137.5質量部變更為125質量部以外,進行與實施例1同樣的操作,得到切割片。 In the first embodiment, the adhesive layer contained in the coating liquid is supplied to the resin (C), and the polymerized rosin ester (C1) is not contained, and the content of the solid content of the adhesion-imparting resin (C) is changed from the 137.5 mass portion of the first embodiment. A dicing sheet was obtained in the same manner as in Example 1 except that the amount was 125 parts by mass.

〔比較例2〕 [Comparative Example 2]

在於實施例1,將塗層液所含有之黏著賦予樹脂(C)之中,不含聚合松香酯(C1)及不均化松香酯(C2)之雙方,黏著賦予樹脂(C)以固形分之含量由實施例1之137.5質量部變更為62.5質量部以外,進行與實施例1同樣的操作,得到切割片。 In the first embodiment, the adhesion of the coating liquid to the resin (C) is contained, and both of the polymerized rosin ester (C1) and the uneven rosin ester (C2) are not contained, and the adhesion imparting resin (C) is solid. The content was changed from 137.5 mass parts of the first embodiment to 62.5 mass parts, and the same operation as in the first example was carried out to obtain a dicing sheet.

〔比較例3〕 [Comparative Example 3]

在於實施例1,將塗層液所含有之黏著賦予樹脂(C)之中,關於聚合松香酯(C1)、不均化松香酯(C2)及石油系樹脂(C3)之 任一均將含量以固形分為125質量部,黏著賦予樹脂(C)以固形分之含量由實施例1之137.5質量部變更為375質量部以外,進行與實施例1同樣的操作,得到切割片。 In the first embodiment, the adhesion of the coating liquid is imparted to the resin (C), and the polymerized rosin ester (C1), the heterogeneous rosin ester (C2), and the petroleum resin (C3) are used. In any case, the content of the adhesive-imparting resin (C) was changed to 135% by mass from the 137.5 mass portion of the first embodiment, and the content of the solid content was changed to 375 mass portions in the first embodiment, and the same operation as in the first embodiment was carried out to obtain a cut. sheet.

〔比較例4〕 [Comparative Example 4]

在於實施例1,於塗層液不含有能量線聚合性化合物(B)及光聚合起始劑之雙方以外,進行與實施例1同樣的操作,得到切割片。 In the same manner as in Example 1, except that both the energy ray-polymerizable compound (B) and the photopolymerization initiator were not contained in the coating liquid, a dicing sheet was obtained.

〔比較例5〕 [Comparative Example 5]

在於實施例1,使塗層液所含有之黏著賦予樹脂(C)之含量如下,黏著賦予樹脂(C)以固形分之含量由實施例1之137.5質量部變更為52.5質量部以外,進行與實施例1同樣的操作,得到切割片。 In the first embodiment, the content of the adhesion-imparting resin (C) contained in the coating liquid is as follows, and the content of the solid content of the adhesion-imparting resin (C) is changed from 137.5 mass parts of the first embodiment to 52.5 mass parts, and In the same manner as in Example 1, a cut piece was obtained.

聚合松香酯(C1):以固形分2.5質量部、 不均化松香酯(C2):以固形分25質量部、及 石油系樹脂(C3):以固形分25質量部。 Polymerized rosin ester (C1): 2.5 parts by mass, Uneven rosin ester (C2): 25 parts by mass, and Petroleum resin (C3): 25 parts by mass.

〔比較例6〕 [Comparative Example 6]

在於實施例1,使塗層液所含有之黏著賦予樹脂(C)之中,使聚合松香酯(C1)之含量以固形分為50質量部、石油系樹脂(C3)之含量以固形分為75質量部,黏著賦予樹脂(C)以固形分之含量由實施例1之137.5質量部變更為187.5質量部以外,進行與實施例1同樣的操作,得到切割片。 In the first embodiment, the adhesive contained in the coating liquid is applied to the resin (C), and the content of the polymerized rosin ester (C1) is divided into 50 parts by mass and the content of petroleum resin (C3) by solid content. The dicing sheet was obtained in the same manner as in Example 1 except that the content of the solid content of the adhesion-imparting resin (C) was changed from 137.5 mass parts of the first embodiment to 187.5 mass parts.

〔比較例7〕 [Comparative Example 7]

在於實施例1,使塗層液所含有之黏著賦予樹脂(C)之中,使聚合松香酯(C1)之含量以固形分為50質量部、不含有不均 化松香酯(C2)及石油系樹脂(C3)之雙方,黏著賦予樹脂(C)以固形分之含量由實施例1之137.5質量部變更為50質量部。除該等變更以外,進行與實施例1同樣的操作,得到切割片。 In the first embodiment, the adhesive contained in the coating liquid is applied to the resin (C), and the content of the polymerized rosin ester (C1) is divided into 50 parts by solid content, and does not contain unevenness. Both the rosin ester (C2) and the petroleum resin (C3) were changed from the 137.5 mass portion of the first embodiment to the 50 mass portion in terms of the solid content of the adhesive imparting resin (C). Except for the above changes, the same operation as in Example 1 was carried out to obtain a dicing sheet.

〔比較例8〕 [Comparative Example 8]

在於實施例1,將塗層液所含有之能量線聚合性化合物(B)之種類,由6官能尿烷丙烯酸酯變更為3官能尿烷丙烯酸酯寡聚物(大日精化工業公司製SEIKABEAM EXL-810TL,重量平均分子量5000,固體分濃度60質量%,n/M=6×10-4)以外,進行與實施例1同樣的操作,得到切割片。 In the first embodiment, the type of the energy ray polymerizable compound (B) contained in the coating liquid was changed from a 6-functional urethane acrylate to a trifunctional urethane acrylate oligomer (SEIKABEAM EXL manufactured by Daisei Seiki Co., Ltd.) A dicing sheet was obtained in the same manner as in Example 1 except that -810TL, a weight average molecular weight of 5,000, a solid concentration of 60% by mass, and n/M = 6 × 10 -4 .

將用於製造關於以上的實施例及比較例之切割片而調製之塗層液之組成等及所得切割片的厚度,整理表示於第1表。再者,關於實施例及比較例之塗層液所含有之能量線聚合性化合物(B)均為尿烷丙烯酸酯寡聚物,故於第1表關於能量線聚合性化合物(B)之種類之欄,表示官能基數。 The composition of the coating liquid prepared by the production of the dicing sheets of the above examples and comparative examples and the thickness of the obtained dicing sheet were collectively shown in Table 1. In addition, the energy ray polymerizable compound (B) contained in the coating liquid of the examples and the comparative examples is a urethane acrylate oligomer, and therefore, the type of the energy ray polymerizable compound (B) in Table 1 Column, indicating the number of functional groups.

[第1表] [Table 1]

〔試驗例1〕<黏著力比的測定> [Test Example 1] <Measurement of adhesion ratio>

將上述實施例及比較例所製造之切割片,裁切得到寬度25mm之黏著力測定用片。使用半導體構裝用樹脂(KYOCERA CHEMICALS公司製KE-G1250),製造厚度600μm,一方的主面之算術平均粗糙度Ra為2μm之片狀構件。於該片狀構件之上述一方的主面黏貼黏著力測定用片之黏著劑層側之表面,得到由片狀構件與黏著力測定用片所組成之層積體。將所得層積體,於23℃、相對濕度50%之氣氛下放置20分鐘。對放置後之層積體,使用萬能拉伸試驗機(ORIENTEC公司製,TENSILON/UTM-4-100),遵照JIS Z0237:2000進行180°拉剝試驗(拉剝黏著力測定用片側之構件。),測定照射前之黏著力(單位:mN/25mm)。 The dicing sheet produced in the above examples and comparative examples was cut to obtain a sheet for measuring the adhesion force having a width of 25 mm. A sheet-like member having a thickness of 600 μm and an arithmetic mean roughness Ra of one main surface of 2 μm was produced using a resin for semiconductor assembly (KE-G1250, manufactured by KYOCERA CHEMICALS Co., Ltd.). The surface of the one side of the adhesive force measuring sheet was adhered to the main surface of the sheet-like member, and a laminate composed of the sheet member and the sheet for measuring adhesion was obtained. The obtained laminate was allowed to stand in an atmosphere of 23 ° C and a relative humidity of 50% for 20 minutes. A laminate tensile tester (TENSILON/UTM-4-100, manufactured by ORIENTEC Co., Ltd.) was used, and a 180° peeling test (a member on the sheet side for peeling adhesion measurement) was carried out in accordance with JIS Z0237:2000. ), the adhesion before irradiation (unit: mN / 25 mm) was measured.

再製作一個由上述片狀構件與黏著力測定用片組成之層積體,於23℃、相對濕度50%的氣氛下放置20分鐘。之後,使用紫外線照射裝置(LINTEC公司製,RAD-2000m/12),於氮氣氣氛下由切割片側照射紫外線(照度230mW/cm2,紫外輻射劑量190mJ/cm2),使在於上述層積體之黏著劑層所含有之能量線聚合性化合物(B)聚合。對該紫外線照射之後的層積體,以與測定上述照射前黏著力之拉剝試驗相同的條件進行拉剝試驗,測定照射後之黏著力(單位:mN/25mm)。 Further, a laminate composed of the above-mentioned sheet member and the sheet for measuring adhesion was prepared, and allowed to stand in an atmosphere of 23 ° C and a relative humidity of 50% for 20 minutes. Thereafter, the ultraviolet irradiation device (of LINTEC Corporation, RAD-2000m / 12), under nitrogen atmosphere, the dicing sheet is irradiated with ultraviolet rays (illuminance of 230mW / cm 2, UV radiation dose of 190mJ / cm 2), so that said laminate of The energy ray polymerizable compound (B) contained in the adhesive layer is polymerized. The laminate after the ultraviolet ray irradiation was subjected to a peeling test under the same conditions as the peeling test for measuring the adhesion before the irradiation, and the adhesion after irradiation (unit: mN/25 mm) was measured.

由如此所得之照射前的黏著力及照射後的黏著力,求黏著力比。將該等的結果示於第2表。 From the adhesion force before irradiation and the adhesion after irradiation, the adhesion ratio was determined. The results of these are shown in the second table.

〔試驗例2〕<在於切割步驟之封膠晶片飛散率之 測定> [Test Example 2] <The dissolution rate of the encapsulated wafer in the cutting step Measurement>

使用半導體構裝用樹脂(KYOCERA CHEMICALS公司製KE-G1250),製作50mm×50mm,厚度600μm,一方的主面之算術平均粗糙度Ra為2μm之模擬半導體構裝。將以上述實施例及比較例所製造之切割片裁切成直徑207mm之圓形,將所得圓形之切割片之黏著劑層側之面,使用貼膜機(LINTEC公司製Adwill RAD2500),將上述所製作之模擬半導體構裝黏貼於上述之一方的面。將如此所得之切割片與模擬半導體構裝之層積體,安裝於環形框(DISCO公司製2-6-1),使用切割裝置(株式會社DISCO公司製DFD651),進行由模擬半導體構裝側切割之切割步驟,分割成1mm×1mm大小之封膠晶片(分割數2500)。再者,切割條件如下所示。 Using a resin for semiconductor assembly (KE-G1250, manufactured by KYOCERA CHEMICALS Co., Ltd.), an analog semiconductor package having a 50 mm × 50 mm thickness and a thickness of 600 μm and an arithmetic mean roughness Ra of one main surface of 2 μm was produced. The dicing sheet produced by the above examples and comparative examples was cut into a circular shape having a diameter of 207 mm, and the surface of the obtained circular dicing sheet on the side of the adhesive layer was applied by a filming machine (Adwill RAD 2500 manufactured by LINTEC Co., Ltd.). The fabricated analog semiconductor structure is adhered to one of the above faces. The laminate of the dicing sheet and the analog semiconductor package thus obtained was attached to a ring frame (2-6-1, manufactured by DISCO Corporation), and the scissors (DFD651, manufactured by DISCO Corporation) were used to carry out the side of the analog semiconductor package. The cutting step of cutting is divided into a sealing wafer of 1 mm × 1 mm size (division number 2500). Furthermore, the cutting conditions are as follows.

切割刀片:株式會社DISCO公司製ZBT-5074(Z1110LS3) Cutting blade: ZBT-5074 (Z1110LS3) manufactured by DISCO Corporation

刀片厚度:0.17mm Blade thickness: 0.17mm

刀尖露出量:3.3mm Tip exposure: 3.3mm

刀片旋轉數:30000rpm Number of blade rotations: 30000rpm

切割速度:50mm/分 Cutting speed: 50mm / min

切割片對基材之切入深度:50μm Cutting depth of the cutting piece to the substrate: 50μm

切削水量:1.0L/min Cutting water volume: 1.0L/min

切削水溫度:20℃ Cutting water temperature: 20 ° C

以目視觀察切割步驟所得,封膠晶片附著在切割片之黏著劑層側之面而成之構件,數在於切割步驟中由切割片脫落之封膠晶片之個數,將該個數以切割步驟之分割數2500商除,求封膠晶片之飛散率(單位:%)。將結果示於第2表。 Obtaining the member obtained by the cutting step, the sealing film is attached to the side of the adhesive layer side of the dicing sheet, and the number is the number of the sealing wafer which is detached from the dicing sheet in the cutting step, and the number is cut by the cutting step. The number of divisions is divided by 2,500, and the scattering rate of the encapsulated wafer is obtained (unit: %). The results are shown in the second table.

〔試驗例3〕<拾取試驗> [Test Example 3] <Pickup Test>

使用半導體構裝用樹脂(KYOCERA CHEMICALS公司製KE-G1250)製作50mm×50mm,厚度600μm,一方的主面之算術平均粗糙度Ra為2μm之模擬半導體構裝。將由上述實施例及比較例所製造的切割片,裁切成直徑207mm,將所得切割片之黏著劑層側之面,使用貼膜機(Lintec公司製:Adwi11 RAD-2500m),黏貼於上述所製作之模擬半導體構裝之上述一方的面。將如此所得之切割片與模擬半導體構裝之層積體安裝於切割用環形框(DISCO公司製2-6-1),使用切割裝置(株式會社DISCO公司製DFD651),進行由模擬半導體構裝側切斷之切割步驟,分割成1mm×1mm大小之封膠晶片(分割數2500)。再者,切割條件,與試驗例3之切割條件相同。 A semiconductor package resin (KE-G1250 manufactured by KYOCERA CHEMICALS Co., Ltd.) was used to produce an analog semiconductor package having a 50 mm × 50 mm thickness and a thickness of 600 μm and an arithmetic mean roughness Ra of one main surface of 2 μm. The dicing sheet produced in the above-mentioned Examples and Comparative Examples was cut into a diameter of 207 mm, and the surface of the obtained dicing sheet on the side of the adhesive layer was adhered to the above by using a film coater (Adwi11 RAD-2500m manufactured by Lintec Co., Ltd.). The surface of the above one of the semiconductor structures is simulated. The laminate of the dicing sheet and the analog semiconductor package thus obtained was attached to a dicing ring frame (2-6-1, manufactured by DISCO Corporation), and was molded by an analog semiconductor using a dicing device (DFD651, manufactured by DISCO Corporation). The cutting step of the side cutting was divided into a sealing wafer of 1 mm × 1 mm size (division number 2500). Further, the cutting conditions were the same as those of Test Example 3.

將藉由切割步驟所得,於切割片之黏著劑層側之面附著封膠晶片而成之構件之切割片,使用擴展裝置(JAM公司製ME-300B型),以速度300mm/分實施使該片於主面方向伸展20mm之擴展步驟。 The dicing sheet of the member obtained by attaching the sealing wafer to the surface of the adhesive layer side of the dicing sheet by the dicing step was carried out at a speed of 300 mm/min using an expansion device (ME-300B model manufactured by JAM Corporation). The sheet is extended by 20 mm in the direction of the main surface.

對擴展步驟之後之上述構件,使用紫外線照射裝置(LINTEC公司製RAD-2000m/12),於氮氣氣氛下由切割片側照射紫外線(照度230mW/cm2,紫外線量190mJ/cm2),使切割片所具有的黏著劑層所含有之能量線聚合性化合物(B)聚合。 Of said member after the expanding step, using an ultraviolet irradiation device (of LINTEC Corporation RAD-2000m g / 12), under nitrogen atmosphere, the dicing sheet is irradiated with ultraviolet rays (illuminance of 230mW / cm 2, the amount of ultraviolet 190mJ / cm 2), the dicing sheet The energy ray polymerizable compound (B) contained in the adhesive layer is polymerized.

接著,對位於切割片的主面之中心附近之100個封膠晶片進行拾取試驗。即,將在於切割片接於拾取對象之封膠晶片之部分,由基材側以針舉起1.5mm,使突出之封膠晶片之與切割片相對之側之相反側之面附著於真空夾頭,將附著於 真空夾頭之封膠晶片舉起。此時,測定以真空夾頭拾取之封膠晶片的個數,以其試驗個數(100)商除求得拾取率(單位:%)。將結果示於第2表。 Next, a pick-up test was performed on 100 sealant wafers located near the center of the main face of the dicing sheet. That is, the dicing sheet is attached to the portion of the encapsulating wafer to be picked up, and the substrate is lifted by 1.5 mm from the substrate side, and the surface opposite to the side opposite to the dicing sheet of the protruding sealing wafer is attached to the vacuum nip. Head, will be attached to The sealing wafer of the vacuum chuck is lifted. At this time, the number of the seal wafers picked up by the vacuum chuck was measured, and the pick-up ratio (unit: %) was determined by dividing the number of tests (100). The results are shown in the second table.

此外,以光學顯微鏡觀察在於拾取之封膠晶片與切割片相對側之面,確認是否有殘留構成黏著劑層之材料,將有殘留之封膠晶片的個數,以試驗個數(100)商除求得黏著劑殘留率(單位:%)。將結果示於第2表。 In addition, the surface of the opposite side of the encapsulating film and the dicing sheet are observed by an optical microscope, and it is confirmed whether or not there is a material constituting the adhesive layer remaining, and the number of remaining sealing dies is determined by the number of tests (100). In addition to the adhesive residue rate (unit: %). The results are shown in the second table.

由第2表可知滿足本發明之條件之實施例之切割片,不容易在切割步驟、擴展步驟及拾取步驟之任一發生異常。 It is apparent from the second table that the dicing sheet of the embodiment satisfying the conditions of the present invention is less likely to cause an abnormality in any of the cutting step, the expanding step, and the picking step.

【產業上的可利性】 [Industry profitability]

關於本發明之切割片,可良好地使用於被著面之凹凸大的半導體構裝之切割片。 The dicing sheet of the present invention can be suitably used for a dicing sheet which is coated with a semiconductor having a large unevenness.

1‧‧‧切割片 1‧‧‧ cutting piece

2‧‧‧基材 2‧‧‧Substrate

3‧‧‧黏著劑層 3‧‧‧Adhesive layer

Claims (10)

一種切割片,包括:基材及層積於上述基材之至少一方的面之黏著劑層,其特徵在於:上述黏著劑層,係由含有丙烯酸系聚合物(A)、能量線聚合性化合物(B)及黏著賦予樹脂(C)之黏著劑所組成物者,上述黏著賦予樹脂(C)含有聚合松香酯(C1)的同時,含有均化松香酯(C2)及石油系樹脂(C3)之至少一方,含於上述黏著劑組成物之上述聚合松香酯(C1)之含量,對上述丙烯酸系聚合物(A)100質量部,為5質量部以上,上述切割片,係以在於上述黏著劑之與上述基材相對之側之相反側之露出面作為測定對象面,以半導體構裝的樹脂封裝面作為被著面,遵照JIS Z0237:2000進行180°拉剝試驗時所測定之黏著力,在於能量線照射前的狀態之黏著力對能量線照射後的狀態之黏著力之比為3以上。 A dicing sheet comprising: a substrate and an adhesive layer laminated on at least one of the surfaces of the substrate, wherein the adhesive layer contains an acrylic polymer (A) and an energy ray polymerizable compound (B) and the adhesive composition of the resin (C), the adhesive-imparting resin (C) contains a polymerized rosin ester (C1) and contains a homogenized rosin ester (C2) and a petroleum resin (C3). The content of the polymerized rosin ester (C1) contained in the adhesive composition is at least 5 parts by mass for 100 parts by mass of the acrylic polymer (A), and the dicing sheet is bonded thereto. The exposed surface of the agent on the side opposite to the side opposite to the substrate is used as the measurement target surface, and the resin package surface of the semiconductor package is used as the surface to be coated, and the adhesion measured by the 180° peeling test in accordance with JIS Z0237:2000 is performed. The ratio of the adhesion force in the state before the irradiation of the energy ray to the state after the irradiation of the energy ray is 3 or more. 根據申請專利範圍第1項之切割片,其中包含於上述黏著劑組成物之上述聚合松香酯(C1)的含量,對上述丙烯酸系聚合物(A)100質量部,係5質量部以上20質量部以下。 The dicing sheet according to the first aspect of the invention, wherein the content of the polymerized rosin ester (C1) contained in the adhesive composition is 100 mass parts or more and 20 mass parts to the acrylic polymer (A). Below. 根據申請專利範圍第1項之切割片,其中包含於上述黏著劑組成物之不均化松香酯(C2)之含量及石油系樹脂(C3)之含量之總和,對上述丙烯酸系聚合物(A)100質量部,係50質量部以上。 The dicing sheet according to the first aspect of the patent application, which comprises the sum of the content of the uneven rosin ester (C2) and the content of the petroleum resin (C3) in the above adhesive composition, and the acrylic polymer (A) ) 100 mass parts, more than 50 mass parts. 根據申請專利範圍第1項之切割片,其中能量線聚合性化合物(B),包含具有重量平均分子量(Mw)為100以上30,000 以下之能量線聚合性基之低分子量化合物(B1) The dicing sheet according to the first aspect of the invention, wherein the energy ray polymerizable compound (B) comprises a weight average molecular weight (Mw) of 100 or more and 30,000. The following energy ray polymerizable group of low molecular weight compounds (B1) 根據申請專利範圍第4項之切割片,其中含於上述黏著劑組成物之能量線聚合性基之低分子化合物(B1)之含量,對上述丙烯酸系聚合物(A)100質量部,係50質量部分以上300質量部以下。 The dicing sheet according to the fourth aspect of the invention, wherein the content of the low molecular compound (B1) contained in the energy ray polymerizable group of the above adhesive composition is 100 parts by mass of the acrylic polymer (A). More than 300 parts by mass of the mass. 根據申請專利範圍第1項之切割片,其中上述黏著劑組成物,含有可與上述丙烯酸系聚合物做架橋反應之架橋劑。 The dicing sheet according to the first aspect of the invention, wherein the adhesive composition comprises a bridging agent capable of bridging reaction with the acrylic polymer. 根據申請專利範圍第1項之切割片,其中上述黏著劑層之厚度係5μm以上35μm以下。 The dicing sheet according to the first aspect of the invention, wherein the thickness of the adhesive layer is 5 μm or more and 35 μm or less. 根據申請專利範圍第1項之切割片,其中於上述基材的上述黏著劑層側之面,存在具有選自由羧基、以及由其離子及鹽所組成之群之一種或二種以上的成分。 The dicing sheet according to the first aspect of the invention, wherein the surface of the substrate on the side of the adhesive layer has one or more components selected from the group consisting of a carboxyl group and a group of ions and salts thereof. 根據申請專利範圍第1項之切割片,其中將上述黏著劑層之與上述基材相反側之面,黏貼於樹脂封裝半導體晶片之半導體構裝之樹脂封裝面。 The dicing sheet according to the first aspect of the invention, wherein the surface of the adhesive layer opposite to the substrate is adhered to a resin package surface of a semiconductor package of a resin-encapsulated semiconductor wafer. 一種封膠晶片之製造方法,將申請專利範圍第1至9項中任一項之切割片之上述黏著劑層側之面,黏貼於半導體構裝之樹脂封裝面,將上述切割片上的上述半導體構裝切斷而個片化,得到複數封膠晶片。 A method for producing a sealant wafer, the surface of the adhesive layer side of the dicing sheet according to any one of claims 1 to 9 is adhered to a resin package surface of a semiconductor package, and the semiconductor on the dicing sheet is attached The structure is cut and sliced to obtain a plurality of encapsulated wafers.
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