TW201404491A - Rolled copper foil, method for producing same, and laminate plate - Google Patents

Rolled copper foil, method for producing same, and laminate plate Download PDF

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TW201404491A
TW201404491A TW102122065A TW102122065A TW201404491A TW 201404491 A TW201404491 A TW 201404491A TW 102122065 A TW102122065 A TW 102122065A TW 102122065 A TW102122065 A TW 102122065A TW 201404491 A TW201404491 A TW 201404491A
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copper foil
rolling
rolled copper
less
formula
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TW102122065A
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Chinese (zh)
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TWI601583B (en
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Kaichiro Nakamuro
Takuma Yoshikawa
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Jx Nippon Mining & Metals Corp
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00Layered products comprising a layer of metal
    • B32B15/04Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B15/08Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00Layered products comprising a layer of metal
    • B32B15/20Layered products comprising a layer of metal comprising aluminium or copper
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/09Use of materials for the conductive, e.g. metallic pattern
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B21MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21BROLLING OF METAL
    • B21B1/00Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations
    • B21B1/40Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations for rolling foils which present special problems, e.g. because of thinness
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/40Properties of the layers or laminate having particular optical properties
    • B32B2307/406Bright, glossy, shiny surface
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/40Properties of the layers or laminate having particular optical properties
    • B32B2307/412Transparent
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2457/00Electrical equipment
    • B32B2457/08PCBs, i.e. printed circuit boards
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0393Flexible materials
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/03Conductive materials
    • H05K2201/0332Structure of the conductor
    • H05K2201/0335Layered conductors or foils
    • H05K2201/0355Metal foils
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/02Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/022Processes for manufacturing precursors of printed circuits, i.e. copper-clad substrates

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  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Metal Rolling (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Parts Printed On Printed Circuit Boards (AREA)
  • Laminated Bodies (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)

Abstract

Provided are: a rolled copper foil that favorably adheres to resin, and is such that the resin transparency is excellent after the copper foil is removed by etching; a method for producing the rolled copper foil; and a laminate plate. The rolled copper foil is in a region bounded by the following formulae (1-4) in a graph having the 60 DEG glossiness (G) in a direction parallel to rolling on the x axis and the arithmetic mean obliquity (Deltaa) in a direction parallel to rolling on the y axis: G = 400 (formula 1); Deltaa = 0 (formula 2); Deltaa = (6.710-5)G + 0.025 (formula 3); and G = 800 (formula 4).

Description

壓延銅箔及其製造方法、以及積層板 Rolled copper foil, method of manufacturing the same, and laminated board

本發明係關於一種壓延銅箔及其製造方法、以及積層板,尤其是關於一種適於要求在蝕刻銅箔後之剩餘部分的樹脂之透明性此領域之壓延銅箔及其製造方法、以及積層板。 The present invention relates to a rolled copper foil, a method of manufacturing the same, and a laminated board, and more particularly to a rolled copper foil suitable for the resin which is required to be subjected to the remaining portion after etching the copper foil, a method for producing the same, and a laminated method thereof board.

近年來,隨著電子機器之高功能化,訊號之高頻化不斷進步,伴隨於此,逐漸要求用作訊號配線之可撓性印刷配線板(以下,稱為FPC)亦可因應高頻。若訊號高頻化,則訊號電流於配線之表面附近傳導,故若用作FPC之配線構件的銅箔之表面粗糙,則訊號損失增加。因此,要求因應高頻之銅箔需具有表面平滑性。 In recent years, with the increase in the functionality of electronic devices, the high frequency of signals has been increasing. With this, flexible printed wiring boards (hereinafter referred to as FPCs), which are required to be used as signal wiring, can also be used in response to high frequencies. When the signal is high-frequency, the signal current is conducted near the surface of the wiring, so that if the surface of the copper foil used as the wiring member of the FPC is rough, the signal loss increases. Therefore, it is required to have surface smoothness in response to high frequency copper foil.

另外,將FPC與LCD及ACF接合時,隔著作為FPC之基底之樹脂層(例如,聚醯亞胺),利用CCD照相機確認標記位置而對準接合位置。因此,若樹脂層之透明度較低,則無法對準位置。 Further, when the FPC is bonded to the LCD and the ACF, the resin layer (for example, polyimide) which is the base of the FPC is used, and the mark position is confirmed by the CCD camera to be aligned with the bonding position. Therefore, if the transparency of the resin layer is low, the position cannot be aligned.

關於FPC之樹脂層,將銅箔與樹脂層接合後,藉由蝕刻而去除銅層。因此,樹脂層表面成為轉印有銅箔表面之凹凸的複製品。亦即,若銅箔表面粗糙,則樹脂層表面亦變得粗糙,使光產生漫反射,故透明度降低。因此,為改善樹脂層之透光性,必須使銅箔之與樹脂層接著之面平滑。 Regarding the resin layer of the FPC, after the copper foil and the resin layer are bonded, the copper layer is removed by etching. Therefore, the surface of the resin layer becomes a replica in which the unevenness of the surface of the copper foil is transferred. That is, if the surface of the copper foil is rough, the surface of the resin layer is also roughened, and the light is diffusely reflected, so that the transparency is lowered. Therefore, in order to improve the light transmittance of the resin layer, it is necessary to smooth the surface of the copper foil and the resin layer.

通常對銅箔之與樹脂層接著之面實施粗化鍍敷處理,以增大接著強度。由於粗化處理之鍍敷粒子大於銅箔之表面粗糙度,故而作為使銅箔表面平 滑之方法,迄今為止主要是改良鍍敷條件。 The roughening plating treatment is usually performed on the copper foil and the surface of the resin layer to increase the bonding strength. Since the plated particles of the roughening treatment are larger than the surface roughness of the copper foil, the surface of the copper foil is flattened The method of sliding has been mainly to improve the plating conditions so far.

作為此種技術例如專利文獻1中示出於銅箔表面具有附著層之銅箔,該附著層係由鉻及鋅之離子或氧化物形成,且使用含有至少0.5%之矽烷的水溶液加以處理。 As such a technique, for example, Patent Document 1 discloses a copper foil having an adhesion layer on the surface of a copper foil, which is formed of an ion or an oxide of chromium and zinc, and is treated with an aqueous solution containing at least 0.5% of decane.

[專利文獻1]日本特開2012-39126號公報 [Patent Document 1] Japanese Patent Laid-Open Publication No. 2012-39126

然而,專利文獻1所揭示之實證樣品的密合強度與作為比較樣品之粗糙銅箔相比,接著強度停滯於較低之值。如此,若使粗化粒子過度微細化,則與樹脂層之密合強度下降,故而藉由改良粗化鍍敷而達成之平滑化有其極限。因此,要同時實現確保樹脂層與銅箔之密合強度、及提升樹脂層視認性較為困難。 However, the adhesion strength of the empirical sample disclosed in Patent Document 1 is inferior to the lower value in comparison with the rough copper foil as a comparative sample. As described above, when the roughened particles are excessively refined, the adhesion strength to the resin layer is lowered. Therefore, there is a limit to smoothing by roughening plating. Therefore, it is difficult to simultaneously ensure the adhesion strength between the resin layer and the copper foil and to improve the visibility of the resin layer.

本發明之課題在於提供一種即便實施與習知相同之粗化鍍敷亦具有平滑之表面,可與樹脂良好地接著,且藉由蝕刻去除銅箔後樹脂之透明性優異的壓延銅箔及其製造方法、以及積層板。 An object of the present invention is to provide a rolled copper foil which is excellent in transparency of a resin after being subjected to etching and removal of a copper foil, and which has a smooth surface as compared with the conventional rough plating, and which can be satisfactorily adhered to the resin. Manufacturing method, and laminate.

本發明人反覆潛心研究之結果發現,藉由使用利用既定之手段使作為粗化鍍敷之母材的壓延銅箔之表面平滑化,對光澤度及算術平均傾斜度加以控制的壓延銅箔,則可與樹脂良好地接著,且藉由蝕刻去除銅箔後樹脂之透明性良好。 As a result of the intensive research, the present inventors have found that the rolled copper foil which controls the glossiness and the arithmetic mean inclination by smoothing the surface of the rolled copper foil which is a base material of the rough plating by a predetermined means is used. Then, the resin can be satisfactorily adhered to, and the transparency of the resin after the copper foil is removed by etching is good.

以上述見解為基礎而完成的本發明於一態樣中,係一種壓延銅箔,於將X軸設為壓延平行方向之60度光澤度G,將Y軸設為壓延平行方向之算術平均傾斜度△a的圖中,位於以下述式1~4包圍之區域中。 The present invention based on the above findings is a rolled copper foil in which the X-axis is set to a 60-degree gloss G in a rolling parallel direction, and the Y-axis is set to an arithmetic mean tilt of a rolling parallel direction. In the graph of the degree Δa, it is located in a region surrounded by the following formulas 1 to 4.

式1:G=400 Equation 1: G=400

式2:△a=0 Equation 2: △a=0

式3:△a=(6.7×10-5)×G+0.025 Equation 3: Δa = (6.7 × 10 -5 ) × G + 0.025

式4:G=800 Equation 4: G=800

於本發明之壓延銅箔之一實施形態中,上述式3為△a=0.05。 In one embodiment of the rolled copper foil of the present invention, the above formula 3 is Δa = 0.05.

於本發明之壓延銅箔之另一實施形態中,上述式1為G=500。 In another embodiment of the rolled copper foil of the present invention, the above formula 1 is G = 500.

於本發明之壓延銅箔之再另一實施形態中對將上述銅箔與膜厚25μm之聚醯亞胺膜於300℃利用1小時之熱壓進行壓接積層而成的寬度3mm以上5mm以下之單面覆銅積層板試樣,進行以上述聚醯亞胺膜面為內側之180°密合彎曲時,至上述銅箔斷裂為止的彎曲次數為3次以上。 In still another embodiment of the rolled copper foil of the present invention, the copper foil and the polyimide film having a thickness of 25 μm are laminated at 300 ° C for 1 hour by hot pressing, and have a width of 3 mm or more and 5 mm or less. When the single-sided copper-clad laminate sample was subjected to 180° adhesion and bending on the inner side of the polyimide film surface, the number of times of bending until the copper foil was broken was three or more.

於本發明之壓延銅箔之再另一實施形態中,至上述銅箔斷裂為止的彎曲次數為5次以上。 In still another embodiment of the rolled copper foil of the present invention, the number of times of bending until the copper foil is broken is five or more.

本發明於另一態樣中,係一種壓延銅箔之製造方法,將最後冷軋步驟之最後壓延道次中的油膜當量設為17000以下,將最後壓延道次之前一壓延道次中的油膜當量設為15000以下,將再前一壓延道次中的油膜當量設為10000以下,且於最後冷軋步驟中,在即將進行最後壓延道次前調整為壓延平行方向之60度光澤度為400以上且△a為0.1以下後,進行最後壓延道次。 In another aspect of the invention, a method for producing a rolled copper foil, wherein the oil film equivalent in the final rolling pass of the final cold rolling step is set to be 17,000 or less, and the oil film in a rolling pass before the final rolling pass is performed. The equivalent is set to 15000 or less, and the oil film equivalent in the previous calendering pass is set to 10000 or less, and in the final cold rolling step, the gloss of 60 degrees is adjusted to 400 in the parallel direction of rolling immediately before the final calendering pass. After the above and Δa is 0.1 or less, the final rolling pass is performed.

本發明之壓延銅箔之製造方法於一實施形態中,使用壓延輥進行壓延,該壓延輥於與輥之旋轉軸平行之方向測定時的平均粗糙度Ra為0.1μm以下。 In one embodiment, the method for producing a rolled copper foil according to the present invention is carried out by rolling using a calender roll having an average roughness Ra of 0.1 μm or less when measured in a direction parallel to the rotation axis of the roll.

本發明於再另一態樣,係一種積層板,其係將本發明之壓延銅箔與樹脂基板積層而構成。 According to still another aspect of the invention, there is provided a laminated board comprising a laminated copper foil of the present invention and a resin substrate.

根據本發明,可提供一種可與樹脂良好地接著,且藉由蝕刻去除銅箔後樹脂之透明性優異的壓延銅箔及其製造方法、以及積層板。 According to the present invention, it is possible to provide a rolled copper foil which is excellent in transparency after resin removal by a resin and which is excellent in transparency after removal of a copper foil by etching, a method for producing the same, and a laminated sheet.

圖1係將X軸設為壓延平行方向之60度光澤度G,將Y軸設為算術平均傾斜度△a的圖中以下述式1~4包圍之區域,與實施例及比較例之各評價結果之位置的對比圖。 1 is a region in which the X-axis is a 60-degree gloss G in a rolling parallel direction, and the Y-axis is an arithmetic mean gradient Δa surrounded by the following formulas 1 to 4, and each of the examples and the comparative examples. A comparison of the locations of the evaluation results.

[壓延銅箔之形態及製造方法] [Formation and Manufacturing Method of Rolled Copper Foil]

本發明中所使用之壓延銅箔可用作用於與樹脂基板接著而製作積層體,並藉由蝕刻而將銅箔部分地去除之壓延銅箔。 The rolled copper foil used in the present invention can be used as a rolled copper foil for forming a laminate with a resin substrate and partially removing the copper foil by etching.

通常,對銅箔之與樹脂基板接著之面、即粗化面,以提高積層後之銅箔之剝離強度為目的而實施粗化處理,亦即對脫脂後之銅箔表面進行結瘤狀之電沈積。該粗化處理可藉由銅-鈷-鎳合金鍍敷或銅-鎳-磷合金鍍敷等而進行。 In general, the roughening treatment is performed on the surface of the copper foil adjacent to the resin substrate, that is, the roughened surface, so as to improve the peeling strength of the copper foil after lamination, that is, the surface of the copper foil after degreasing is nodulated. Electrodeposition. This roughening treatment can be carried out by copper-cobalt-nickel alloy plating or copper-nickel-phosphorus alloy plating or the like.

本發明之壓延銅箔亦包含含有Ag、Sn、In、Ti、Zn、Zr、Fe、P、Ni、Si、Te、Cr、Nb、V等元素中之一種以上的元素之銅合金箔。例如,包含含有10~2000ppm上述元素之銅合金,較佳為含有10~500ppm上述元素之銅合金。若上述元素之濃度增高(例如合計為10質量%以上),則有導電率下降之情形。壓延銅箔之導電率較佳為50%IACS以上,更佳為60%IACS以 上,進而更佳為80%IACS以上。又,銅箔厚度並無特別限定,較佳為5~50μm,更佳為5~35μm。 The rolled copper foil of the present invention also contains a copper alloy foil containing one or more elements selected from the group consisting of Ag, Sn, In, Ti, Zn, Zr, Fe, P, Ni, Si, Te, Cr, Nb, and V. For example, it includes a copper alloy containing 10 to 2000 ppm of the above elements, preferably a copper alloy containing 10 to 500 ppm of the above elements. When the concentration of the above elements is increased (for example, 10% by mass or more in total), there is a case where the electrical conductivity is lowered. The electrical conductivity of the rolled copper foil is preferably 50% IACS or more, more preferably 60% IACS. More preferably, it is 80% IACS or more. Further, the thickness of the copper foil is not particularly limited, but is preferably 5 to 50 μm, more preferably 5 to 35 μm.

本發明之壓延銅箔於將X軸設為壓延平行方向之60度光澤度G,將Y軸設為壓延平行方向之算術平均傾斜度△a的圖中,位於以下述式1~4包圍之區域中。 In the rolled copper foil of the present invention, the X-axis is set to a 60-degree gloss G in the direction parallel to the rolling, and the Y-axis is set as the arithmetic mean gradient Δa in the rolling parallel direction, and is surrounded by the following formulas 1 to 4. In the area.

式1:G=400 Equation 1: G=400

式2:△a=0 Equation 2: △a=0

式3:△a=(6.7×10-5)×G+0.025 Equation 3: Δa = (6.7 × 10 -5 ) × G + 0.025

式4:G=800 Equation 4: G=800

此處,「算術平均傾斜度△a」係JIS B0601-1994中所定義之值,係以固定間隔△X劃分曲線,求出各區間內連結測定曲線之起止點之線段的斜度之絕對值,且將該值平均所得者。 Here, the "arithmetic mean inclination Δa" is a value defined in JIS B0601-1994, and the curve is divided at a fixed interval ΔX, and the absolute value of the slope of the line segment connecting the start and end points of the measurement curve in each section is obtained. And average the value.

如此,關於本發明之壓延銅箔,首先,壓延平行方向之60度光澤度G係位於式1:G=400與式4:G=800間的區域內。因此,表面之平滑性良好,將本發明之壓延銅箔接著於樹脂層且去除後樹脂層之視認性良好。 As described above, in the rolled copper foil of the present invention, first, the 60 degree gloss G of the rolling parallel direction is located in a region between the formula 1: G=400 and the formula 4: G=800. Therefore, the smoothness of the surface is good, and the rolled copper foil of the present invention is adhered to the resin layer and the resin layer after removal is excellent in visibility.

另外,於儘管銅箔表面平滑但存在尖銳之凹凸的情形時,粗化鍍敷會過度地電沈積於凹凸之邊緣部,故而粗化後之粗糙度變得不均勻,該樹脂層之視認性不佳。若為了防止於凹凸邊緣部過度電沈積而減少粗化鍍敷之電沈積,則與樹脂層之接著性變得不佳。因此,本發明之壓延銅箔位於式1與式4間的區域中,且於由關於算術平均傾斜度△a之式2:△a=0與式3:△a=(6.7×10-5)×G+0.025包圍的區域中,故而可將成為於銅箔表面進行鍍敷處理時之異常電沈積之起點的材料表面之尖銳凹凸控制為良好,並且 可確保與樹脂之密合性。亦即,習知於銅箔表面之油坑(oil pit)等凹凸周邊,在粗化處理時頂端電流發揮作用而容易過度形成粗化粒子,產生異常電沈積,對樹脂層之視認性造成不良影響。另一方面,若僅重新考慮粗化處理之電流條件以抑制粗化粒子過度形成,則粗化粒子之量亦減少,與樹脂層之密合性變差。針對於該等問題,本發明中藉由控制壓延平行方向之60度光澤度G,且將銅箔表面之算術平均傾斜度△a控制於上述範圍內,可不使粗化處理時之粗化粒子量減少,且亦將異常電沈積抑制為良好。 Further, in the case where the surface of the copper foil is smooth but there are sharp irregularities, the rough plating is excessively electrodeposited on the edge portion of the unevenness, so that the roughness after the roughening becomes uneven, and the visibility of the resin layer Not good. If the electrodeposition of the rough plating is reduced in order to prevent excessive electrodeposition on the uneven edge portion, the adhesion to the resin layer becomes poor. Therefore, the rolled copper foil of the present invention is located in the region between Equations 1 and 4, and is expressed by Equation 2 regarding the arithmetic mean inclination Δa: Δa = 0 and Equation 3: Δa = (6.7 × 10 -5 In the region surrounded by ×G+0.025, it is possible to control the sharp concavities and convexities of the surface of the material which is the starting point of the abnormal electrodeposition at the time of performing the plating treatment on the surface of the copper foil, and to ensure adhesion to the resin. In other words, in the periphery of the unevenness such as an oil pit on the surface of the copper foil, the tip current acts to excessively form rough particles during the roughening treatment, and abnormal electrodeposition occurs, which causes deterioration of the visibility of the resin layer. influences. On the other hand, if only the current conditions of the roughening treatment are reconsidered to suppress excessive formation of the roughened particles, the amount of the roughened particles is also reduced, and the adhesion to the resin layer is deteriorated. In order to solve such problems, in the present invention, by controlling the 60-degree gloss G in the parallel direction of the rolling, and controlling the arithmetic mean inclination Δa of the surface of the copper foil within the above range, the roughening particles in the roughening treatment can be prevented. The amount is reduced, and abnormal electrodeposition is also suppressed to be good.

另外,式3較佳為△a=0.05,更佳為△a=0.04。 Further, Formula 3 preferably has Δa = 0.05, more preferably Δa = 0.04.

進而,式1較佳為G=450,式1更佳為G=500。 Further, Formula 1 preferably has G = 450, and Formula 1 is more preferably G = 500.

另外,若考慮生產性等,則式2較佳為△a=0.001,較佳為△a=0.002,更佳為△a=0.003。 Further, in consideration of productivity, etc., Formula 2 is preferably Δa = 0.001, preferably Δa = 0.002, more preferably Δa = 0.003.

本發明之壓延銅箔較佳為,對將銅箔與膜厚25μm之聚醯亞胺膜於300℃利用1小時之熱壓進行壓接積層而成的寬度3mm以上5mm以下之單面覆銅積層板試樣,進行以聚醯亞胺膜面為內側之180°密合彎曲時,至銅箔斷裂為止之彎曲次數為3次以上,更佳為5次以上。若撓曲性如滿足上述條件般地良好,則可較佳地用作LCD模組用FPC。 The rolled copper foil of the present invention is preferably a single-sided copper-clad having a width of 3 mm or more and 5 mm or less which is obtained by pressure-bonding a copper foil and a polyimide film having a thickness of 25 μm at 300 ° C for 1 hour. When the laminate sample is subjected to 180° adhesion and bending on the inner side of the polyimide film surface, the number of times of bending until the copper foil is broken is three or more, and more preferably five or more. If the flexibility is as good as the above conditions, it can be preferably used as an FPC for an LCD module.

作為本發明之壓延銅箔之製造方法,首先將原料於熔解爐中熔解,獲得所欲組成之熔融液。繼而,將該熔融液鑄造成鑄錠。之後,適宜進行熱軋、冷軋、及退火,加工成具有既定厚度之箔。熱處理後,可對表面進行酸洗或研磨等,以將熱處理時所生成之表面氧化膜去除。於最後冷軋中,使熱處理後之材料於壓延機中反覆通過(pass),藉此加工成既定厚度。本發明之壓延銅箔之製造方法中,重要的是將最後冷軋步驟之最後 壓延道次中的油膜當量設為17000以下,將最後壓延道次之前一壓延道次中的油膜當量設為15000以下,將再前一壓延道次中之油膜當量設為10000以下,且於最後冷軋步驟中,於即將進行最後壓延道次前調整為壓延平行方向之60度光澤度為400以上且△a為0.1以下後,進行最後壓延道次。 As a method for producing a rolled copper foil according to the present invention, first, a raw material is melted in a melting furnace to obtain a molten liquid having a desired composition. The melt is then cast into an ingot. Thereafter, it is suitably subjected to hot rolling, cold rolling, and annealing to form a foil having a predetermined thickness. After the heat treatment, the surface may be pickled, polished, or the like to remove the surface oxide film formed during the heat treatment. In the final cold rolling, the heat-treated material is passed through a calender to thereby form a predetermined thickness. In the method for producing a rolled copper foil of the present invention, it is important to finalize the final cold rolling step. The oil film equivalent in the rolling pass is set to 17,000 or less, the oil film equivalent in one rolling pass before the last rolling pass is set to 15000 or less, and the oil film equivalent in the previous rolling pass is set to 10000 or less, and finally In the cold rolling step, the final calendering pass is performed after the final calendering pass is adjusted to 60 degrees of gloss in the direction parallel to the rolling, and the gloss is 400 or more and Δa is 0.1 or less.

此處,油膜當量係由下述式規定。 Here, the oil film equivalent is defined by the following formula.

油膜當量={(壓延油黏度[cSt])×(通過速度[mpm]+輥周速度[mpm])}/{(輥之齧入角[rad])×(材料之降伏應力[kg/mm2])} Oil film equivalent={(calendering oil viscosity [cSt])×(passing speed [mpm]+rolling speed [mpm])}/{(rolling angle of the roller [rad])×(material's lodging stress [kg/mm] 2 ])}

壓延油黏度[cSt]為40℃下之動態黏度。 The rolling oil viscosity [cSt] is the dynamic viscosity at 40 °C.

為了控制油膜當量,只要採用使用低黏度之壓延油,或減緩通過速度等公知之方法即可。 In order to control the oil film equivalent, a known method such as using a low-viscosity rolling oil or slowing the passage speed may be employed.

藉由控制油膜當量,可利用輥約束材料表面之變形,可抑制與壓延所引起之厚度變化相伴的表面粗糙度之增加。另外,藉由於即將進行最後壓延道次前使光澤度提高且使△a減小,可將最後道次後之光澤度及△a控制於所期望之範圍內。若於即將進行最後道次前光澤度較低,或者△a較大,則即便於最後道次中使材料表面變得平滑,亦會殘留至上一道次為止所形成的較深之凹凸,故無法獲得所期望之表面形狀。 By controlling the oil film equivalent, it is possible to use the roll to restrain the deformation of the surface of the material, and it is possible to suppress an increase in the surface roughness accompanying the thickness variation caused by the rolling. Further, the glossiness and Δa after the last pass can be controlled within a desired range by increasing the gloss and reducing Δa immediately before the final rolling pass. If the gloss is low immediately before the last pass, or if Δa is large, even if the surface of the material is smoothed in the last pass, the deep unevenness formed until the last time will remain. Obtain the desired surface shape.

另外,於油膜當量較小之情形時,壓延所使用之壓延輥表面之凹凸容易轉印至材料表面,故而較佳為壓延輥表面亦平滑。因此,本發明之壓延銅箔之製造方法中所使用之壓延輥較佳為,對與輥之旋轉軸平行之方向測定時平均粗糙度Ra為0.1μm以下。 Further, when the oil film equivalent is small, the unevenness of the surface of the calender roll used for calendering is easily transferred to the surface of the material, and therefore the surface of the calender roll is preferably smooth. Therefore, it is preferable that the calender roll used in the method for producing a rolled copper foil of the present invention has an average roughness Ra of 0.1 μm or less when measured in a direction parallel to the rotation axis of the roll.

可將本發明之壓延銅箔自粗化處理面側貼合於樹脂基板而製造積層體。樹脂基板只要具有可適用於印刷配線板等之特性則並不受特 別限制,例如可使用聚對酞酸乙二酯(PET)等之聚酯膜或聚醯亞胺膜、液晶聚合物(LCP)膜等。 The rolled copper foil of the present invention can be bonded to the resin substrate from the side of the roughened surface to produce a laminated body. The resin substrate is not particularly suitable as long as it has characteristics suitable for a printed wiring board or the like. Further, for example, a polyester film such as polyethylene terephthalate (PET) or a polyimide film, a liquid crystal polymer (LCP) film, or the like can be used.

作為貼合方法,可於聚醯亞胺膜等基材,經由接著劑或不使用接著劑而於高溫高壓下積層接著壓延銅箔,或者於壓延銅箔塗布聚醯亞胺前驅物且乾燥、硬化等,藉此製造積層板。 As a bonding method, a copper foil may be laminated on a base material such as a polyimide film by using an adhesive or without using an adhesive under high temperature and high pressure, or the polyimide film may be coated on a rolled copper foil and dried. Hardening or the like, thereby producing a laminate.

[實施例] [Examples]

以如下所述之方式準備各壓延銅箔,作為實施例1~15及比較例1~9。 Each of the rolled copper foils was prepared as described below as Examples 1 to 15 and Comparative Examples 1 to 9.

首先,製造表1所記載之組成之銅錠,進行熱軋後,將冷軋與溫度設定為300~800℃之退火爐中之退火反覆進行一次以上後,進行冷軋,獲得1~2mm厚之壓延板。於溫度設定為300~800℃之退火爐中將該壓延板退火而使之再結晶,進行最後冷軋直至表1所記載之厚度為止。此時,實施例1~15於最後冷軋步驟中,係以使最後壓延道次中油膜當量為17000以下,最後壓延道次之前一壓延道次中之油膜當量為15000以下再前一壓延道次中之油膜當量為10000以下之方式調整壓延條件,且以使得於即將進行最後壓延道次之前,壓延平行方向之60度光澤度及△a為表1所記載之值之方式調整壓延條件而進行。表1中,將最後壓延道次中之油膜當量記載為「最後道次油膜當量」,最後壓延道次之前一壓延道次中之油膜當量記載為「最後1道次前油膜當量」,再前一壓延道次中之油膜當量記載為「最後2道次前油膜當量」。 First, a copper ingot having the composition shown in Table 1 is produced, and after hot rolling, the annealing in the annealing furnace in which the cold rolling is performed at a temperature of 300 to 800 ° C is repeated one or more times, and then cold rolling is performed to obtain a thickness of 1 to 2 mm. Calendered sheet. The rolled sheet was annealed in an annealing furnace set at a temperature of 300 to 800 ° C to be recrystallized, and finally cold rolled until the thickness shown in Table 1 was obtained. In this case, in the final cold rolling step, the first embodiment has the oil film equivalent of 17,000 or less in the final calendering pass, and the oil film equivalent in a calendering pass before the final calendering pass is 15000 or less and the previous calendering pass. The rolling conditions are adjusted so that the oil film equivalent of the second time is 10000 or less, and the rolling conditions are adjusted so that the 60 degree glossiness and the Δa in the parallel direction of rolling are the values described in Table 1 immediately before the final rolling pass. get on. In Table 1, the oil film equivalent in the last calendering pass is described as "last pass oil film equivalent", and the oil film equivalent in one calendering pass before the final calendering pass is described as "the last pass before the oil film equivalent", before The oil film equivalent in a calendering pass is described as "the last two passes of the oil film equivalent".

另外,比較例1~9係於表1所記載之條件下進行最後冷軋。 Further, Comparative Examples 1 to 9 were subjected to final cold rolling under the conditions described in Table 1.

另外,此時所使用之壓延輥係對與輥之旋轉軸平行之方向測定時平均 粗糙度Ra為0.08μm者。 In addition, the calender roll used at this time is averaged in the direction parallel to the rotation axis of the roll. The roughness Ra is 0.08 μm.

將粗化處理之條件設定為如下所述。粗化處理之條件係採用可獲得實用上充分之剝離強度的FPC用途中通常使用之條件。 The conditions of the roughening treatment were set as described below. The conditions for the roughening treatment are those generally used in FPC applications in which practically sufficient peel strength can be obtained.

.鍍敷浴組成:Cu 15g/L、Co 8.5g/L、Ni 8.6g/L . Plating bath composition: Cu 15g/L, Co 8.5g/L, Ni 8.6g/L

.處理液pH值:2.5 . Treatment pH: 2.5

.處理溫度:38℃ . Processing temperature: 38 ° C

.電流密度:20A/dm2 . Current density: 20A/dm 2

.鍍敷時間:2.0秒 . Plating time: 2.0 seconds

對以上述方式所製作的實施例及比較例之各樣品如下所述般地進行各種評價。 Each of the samples of the examples and the comparative examples produced in the above manner was subjected to various evaluations as described below.

.光澤度: . Gloss:

使用依據JIS Z8741的日本電色工業股份有限公司製造之光澤度計Handy Gloss Meter PG-1,以壓延方向之60度入射角求出表面處理前銅箔光澤度。 The gloss of the copper foil before surface treatment was determined using a gloss meter Handy Gloss Meter PG-1 manufactured by Nippon Denshoku Industries Co., Ltd. according to JIS Z8741 at an incident angle of 60 degrees in the rolling direction.

.算術平均傾斜度△a . Arithmetic mean slope △a

使用依據JIS B0601-1994的小阪研究所股份有限公司之表面粗糙度測定器Surfcorder SE-3400,求出壓延平行方向之算術平均傾斜度△a。 The arithmetic mean inclination Δa of the rolling parallel direction was obtained using the surface roughness measuring device Surfcorder SE-3400 of Kosaka Research Co., Ltd. according to JIS B0601-1994.

.透光性(樹脂透明性): . Transparency (resin transparency):

對各樣品銅箔之一表面,於以下條件下進行鍍敷處理作為粗化處理。 One surface of each sample copper foil was subjected to a plating treatment under the following conditions as a roughening treatment.

.鍍敷浴組成:Cu 15g/L、Co 8.5g/L、Ni 8.6g/L . Plating bath composition: Cu 15g/L, Co 8.5g/L, Ni 8.6g/L

.處理液pH值:2.5 . Treatment pH: 2.5

.處理溫度:38℃ . Processing temperature: 38 ° C

.電流密度:20A/dm2 . Current density: 20A/dm 2

.鍍敷時間:2.0秒 . Plating time: 2.0 seconds

其次,於附有層壓用熱硬化性接著劑之聚醯亞胺膜(厚度50μm,宇部興產製造之UPILEX)之兩面,貼合粗化處理銅箔之粗化面側,藉由蝕刻(氯化鐵水溶液)去除銅箔,製成樣品膜。於所獲得之樹脂層之一面黏貼印刷物(直徑6cm之黑色圓),自相反面隔著樹脂層判定印刷物之透光性。將印刷物之黑色圓的輪廓於圓周之90%以上之長度均清晰者評價為「◎」,黑色圓之輪廓於圓周之80%以上且未達90%之長度清晰者評價為「○」,黑色圓之輪廓於圓周之60%以上且未達80%之長度清晰者評價為「△」(以上均合格),將黑色圓之輪廓於未達圓周之0~60%之長度清晰者及輪廓走樣者評價為「×」(不合格)。 Next, on both sides of a polyimide film (thickness 50 μm, UPILEX manufactured by Ube Industries, Ltd.) with a thermosetting adhesive for lamination, the roughened side of the roughened copper foil was bonded and etched ( The copper chloride solution was removed to form a sample film. A printed matter (black circle having a diameter of 6 cm) was adhered to one surface of the obtained resin layer, and the light transmittance of the printed matter was judged from the opposite surface via a resin layer. When the length of the black circle of the printed matter is more than 90% of the circumference, the length is clearly "◎", and the outline of the black circle is 80% or more of the circumference and the length of less than 90% is clearly defined as "○", black The contour of the circle is more than 60% of the circumference and less than 80% of the length is clearly judged as "△" (all above are qualified), and the contour of the black circle is 0 to 60% of the length of the circle is not clear and the contour is out of shape. The evaluation is "X" (failed).

.剝離強度(接著強度): . Peel strength (follow strength):

依據PC-TM-650,使用拉伸試驗機Autograph 100測定常態剝離強度,將上述常態剝離強度為0.7N/mm以上者評價為可用於積層基板用途者。 According to PC-TM-650, the normal peel strength was measured using a tensile tester Autograph 100, and those having a normal peel strength of 0.7 N/mm or more were evaluated as those which can be used for laminated substrates.

.彎曲性 . Flexibility

製作將各銅箔與膜厚25μm之聚醯亞胺膜於300℃利用1小時之熱壓進行壓接積層而成的寬度3mm以上5mm以下之單面覆銅積層板試樣,進行以聚醯亞胺膜面為內側之180°密合彎曲時,測定至銅箔斷裂為止之彎曲次數。 A single-sided copper-clad laminate sample having a width of 3 mm or more and 5 mm or less, which was obtained by pressure-bonding each copper foil and a polyimide film having a thickness of 25 μm at 300 ° C for 1 hour, was used for the polymerization. When the imide film surface was 180° in close contact with the inner side, the number of bends until the copper foil was broken was measured.

.異常電沈積 . Abnormal electrodeposition

使用掃描式電子顯微鏡(SEM:Scanning Electron Microscope),對在粗化處理面之10μm見方之視野中隨機選擇的3個以上之部位進行觀察,將粗化粒子之長徑超過1μm的電沈積粒之個數為平均1個/100μm2以下之 情況評價為無異常電沈積「○」,將超過1個且3個以下/100μm2之情形評價為異常電沈積「△」,將超過3個/100μm2之情形評價為有異常電沈積「×」。 Using a scanning electron microscope (SEM: Scanning Electron Microscope), three or more portions randomly selected from the field of 10 μm square of the roughened surface were observed, and the electrodeposited particles having a long diameter of more than 1 μm of the roughened particles were observed. When the number of the average is one/100 μm 2 or less, it is evaluated as "0" without abnormal electrodeposition, and when more than one and three or less/100 μm 2 are evaluated, the abnormal electrodeposition "△" is evaluated, and it is more than three /100 μm. The case of 2 was evaluated as having an abnormal electrodeposition "X".

將上述各試驗之條件及評價示於表1。 The conditions and evaluation of each test described above are shown in Table 1.

(評價結果) (Evaluation results)

圖1中表示「將X軸設為壓延平行方向之60度光澤度G,將Y軸設為算術平均傾斜度△a的圖中以下述式1~4包圍之區域」與「實施例1~15及比較例1~9之各評價結果之位置」的對比。 In Fig. 1, "the X-axis is a 60-degree gloss G in a rolling parallel direction, and the Y-axis is an area surrounded by the following formulas 1 to 4 in the graph of the arithmetic mean inclination Δa" and "Example 1~ Comparison of the position of each of the evaluation results of 15 and Comparative Examples 1 to 9.

式1:G=400 Equation 1: G=400

式2:△a=0 Equation 2: △a=0

式3:△a=(6.7×10-5)×G+0.025 Equation 3: Δa = (6.7 × 10 -5 ) × G + 0.025

式4:G=800 Equation 4: G=800

實施例1~15於將X軸設為壓延平行方向之60度光澤度G,將Y軸設為算術平均傾斜度△a的圖中,均位於以上述式1~4包圍之區域內,與樹脂之密合性、樹脂之視認性及彎曲性良好。算術平均傾斜度△a大於0.05的實施例5、6及9中異常電沈積與其他實施例相比較多,樹脂之透光性降低。尤其是於光澤度較低之實施例5中,透光性為△。 In the first to fifteenth embodiments, the X-axis is set to the 60-degree gloss G in the rolling parallel direction, and the Y-axis is set to the arithmetic mean inclination Δa, and both are located in the region surrounded by the above formulas 1 to 4, and The adhesiveness of the resin, the visibility of the resin, and the flexibility are good. In Examples 5, 6 and 9 in which the arithmetic mean inclination Δa was larger than 0.05, the abnormal electrodeposition was more than that in the other examples, and the light transmittance of the resin was lowered. In particular, in Example 5 in which the gloss was low, the light transmittance was Δ.

比較例1~9於將X軸設為壓延平行方向之60度光澤度G,將Y軸設為算術平均傾斜度△a的圖中,均位於以上述式1~4包圍之區域外,樹脂之視認性不佳。另外,亦有與樹脂之密合性、彎曲性不佳者。 In Comparative Examples 1 to 9, in the graph in which the X-axis is a 60-degree gloss G in the rolling parallel direction and the Y-axis is an arithmetic mean gradient Δa, both are located outside the region surrounded by the above formulas 1 to 4, and the resin The visibility is not good. In addition, there are also adhesions to resins and poor bendability.

比較例1中,最後道次、最後1道次前、及最後2道次前之油膜當量均較大,光澤度降低,△a變大。比較例2、4及8中,最後道次中之油膜當量較大,故而光澤度降低。比較例5及6中,最後2道次前之油膜當量較大,△a變大。比較例3中,最後2道次前、最後1道次前之油膜當量較大,△a變大。比較例7及9中,最後2道次前及最後道次之油膜當量較大,光澤度降低。另外,比較例9中,進而△a亦變得相對較大。 In Comparative Example 1, the oil film equivalents before the last pass, the last pass, and the last two passes were large, the gloss was lowered, and Δa was increased. In Comparative Examples 2, 4 and 8, the oil film equivalent in the last pass was large, and thus the gloss was lowered. In Comparative Examples 5 and 6, the oil film equivalent before the last two passes was large, and Δa became large. In Comparative Example 3, the oil film equivalent before the last two passes and the last one pass was large, and Δa became large. In Comparative Examples 7 and 9, the oil film equivalent of the last two passes and the last pass was large, and the gloss was lowered. Further, in Comparative Example 9, further Δa also became relatively large.

Claims (8)

一種壓延銅箔,於將X軸設為壓延平行方向之60度光澤度G,將Y軸設為壓延平行方向之算術平均傾斜度△a的圖中,位於以下述式1~4包圍之區域中:式1:G=400 式2:△a=0 式3:△a=(6.7×10-5)×G+0.025 式4:G=800。 A rolled copper foil having a 60-degree gloss G in a rolling parallel direction and a Y-axis as an arithmetic mean gradient Δa in a rolling parallel direction, and is located in an area surrounded by the following formulas 1 to 4. Medium: Formula 1: G=400 Formula 2: Δa=0 Equation 3: Δa = (6.7 × 10 -5 ) × G + 0.025 Formula 4: G = 800. 如申請專利範圍第1項之壓延銅箔,其中,該式3為△a=0.05。 The rolled copper foil according to claim 1, wherein the formula 3 is Δa=0.05. 如申請專利範圍第1項之壓延銅箔,其中,該式1為G=500。 The rolled copper foil of claim 1, wherein the formula 1 is G=500. 如申請專利範圍第1項之壓延銅箔,其中,對將該銅箔與膜厚25μm之聚醯亞胺膜於300℃利用1小時之熱壓進行壓接積層而成的寬度3mm以上5mm以下之單面覆銅積層板試樣,進行以該聚醯亞胺膜面為內側之180°密合彎曲時,至該銅箔斷裂為止的彎曲次數為3次以上。 The rolled copper foil according to the first aspect of the invention, wherein the copper foil and the polyimide film having a thickness of 25 μm are laminated at 300 ° C for 1 hour by hot pressing, and have a width of 3 mm or more and 5 mm or less. When the single-sided copper-clad laminate sample was subjected to 180° adhesion and bending on the inner side of the polyimide film surface, the number of times of bending until the copper foil was broken was three or more. 如申請專利範圍第4項之壓延銅箔,其中,至該銅箔斷裂為止的彎曲次數為5次以上。 The rolled copper foil according to item 4 of the patent application, wherein the number of times of bending until the copper foil is broken is five or more times. 一種壓延銅箔之製造方法,將最後冷軋步驟之最後壓延道次中的油膜當量設為17000以下,將最後壓延道次之前一壓延道次中的油膜當量設為15000以下,將再前一壓延道次中的油膜當量設為10000以下,且於最後冷軋步驟中,在即將進行最後壓延道次前調整為壓延平行方向之60度光澤度為400以上且△a為0.1以下後,進行最後壓延道次。 A method for producing a rolled copper foil, wherein the oil film equivalent in the final rolling pass of the final cold rolling step is 17,000 or less, and the oil film equivalent in a rolling pass before the final rolling pass is set to 15000 or less, which is further The oil film equivalent in the rolling pass is set to 10000 or less, and in the final cold rolling step, after the final calendering pass is adjusted to 60 degrees of gloss in the parallel direction of rolling, the glossiness is 400 or more and Δa is 0.1 or less. Finally, the pass is delayed. 如申請專利範圍第6項之壓延銅箔之製造方法,其中,使用壓延輥進 行壓延,該壓延輥於與輥之旋轉軸平行之方向測定時的平均粗糙度Ra為0.1μm以下。 A method for producing a rolled copper foil according to item 6 of the patent application, wherein a calender roll is used The average roughness Ra when the calender roll is measured in a direction parallel to the rotation axis of the roll is 0.1 μm or less. 一種積層板,係將申請專利範圍第1至5項中任一項之壓延銅箔與樹脂基板積層而構成。 A laminated board comprising a rolled copper foil according to any one of claims 1 to 5 and a resin substrate.
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