TW201403234A - Colored photosensitive resin composition - Google Patents

Colored photosensitive resin composition Download PDF

Info

Publication number
TW201403234A
TW201403234A TW102120268A TW102120268A TW201403234A TW 201403234 A TW201403234 A TW 201403234A TW 102120268 A TW102120268 A TW 102120268A TW 102120268 A TW102120268 A TW 102120268A TW 201403234 A TW201403234 A TW 201403234A
Authority
TW
Taiwan
Prior art keywords
group
compound
formula
carbon atoms
resin composition
Prior art date
Application number
TW102120268A
Other languages
Chinese (zh)
Other versions
TWI602021B (en
Inventor
Kimiyuki Shirouchi
Original Assignee
Sumitomo Chemical Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2012131591A external-priority patent/JP6015150B2/en
Priority claimed from JP2012131592A external-priority patent/JP6015151B2/en
Application filed by Sumitomo Chemical Co filed Critical Sumitomo Chemical Co
Publication of TW201403234A publication Critical patent/TW201403234A/en
Application granted granted Critical
Publication of TWI602021B publication Critical patent/TWI602021B/en

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/0045Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/0047Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • G03F7/2002Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nonlinear Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)

Abstract

The present invention provides a colored photosensitive resin composition comprising a colorant, a resin, a polymerizable compound, a polymerization initiator and a thiol compound, wherein the colorant comprising a xanthene dye and a pigment, and the polymerization initiator comprising a biimidazole compound or an O-acyloxime compound.

Description

著色光敏性樹脂組成物 Colored photosensitive resin composition

本發明是有關著色光敏性樹脂組成物。 The present invention relates to a coloring photosensitive resin composition.

著色光敏性樹脂組成物可用於製造使用在液晶顯示裝置、電致發光顯示裝置及電漿顯示器等顯示裝置之彩色濾光片。作為如此之著色光敏性樹脂組成物,已知含有酞青素(phthalocyanine)染料的著色光敏性樹脂組成物(JP2011-28236-A)。 The colored photosensitive resin composition can be used for producing a color filter used in a display device such as a liquid crystal display device, an electroluminescence display device, and a plasma display device. As such a colored photosensitive resin composition, a colored photosensitive resin composition containing a phthalocyanine dye (JP2011-28236-A) is known.

藉由光微影法形成著色圖案時,顯影中, 若基板上的著色光敏性樹脂組成物層以剝離之方式被除去至對顯影液時,會有該剝離片作為著色圖案上之異物雜質而付著,或是會堵塞排出顯影後的顯影液之配管。一直以來,以往已知之上述的著色光敏性樹脂組成物誠如上述,會有上述顯影性並非必定可充分令人滿足的情形。 When a colored pattern is formed by photolithography, during development, When the colored photosensitive resin composition layer on the substrate is removed to the developing solution by peeling, the release sheet may be applied as a foreign matter impurity on the colored pattern, or may block the development of the developed developer. Piping. Conventionally, the above-described colored photosensitive resin composition is as described above, and the above-described developability is not always sufficient.

本發明包含以下的發明。 The present invention includes the following inventions.

[1]一種著色光敏性樹脂組成物,其係含有著色劑、樹脂、聚合性化合物、聚合起始劑及硫醇化合物者,著色劑是含有氧雜蒽染料(Xanthene dye)與顏料的著 色劑,聚合起始劑含有聯咪唑化合物或是O-醯基肟(O-acyloxime)化合物。 [1] A colored photosensitive resin composition containing a colorant, a resin, a polymerizable compound, a polymerization initiator, and a thiol compound, and the colorant is a xanthene dye and a pigment. The toner, the polymerization initiator contains a biimidazole compound or an O-acyloxime compound.

[2]如[1]所述之著色光敏性樹脂組成物,其中,氧雜蒽染料為含有式(1a)所示之化合物的染料。 [2] The colored photosensitive resin composition according to [1], wherein the xanthene dye is a dye containing a compound represented by the formula (1a).

[式(1a)中,R1至R4是各自獨立,表示氫原子、可具有取代基之碳數1至20的1價飽和烴基或是可具有取代基之碳數6至10的1價芳香族烴基,在該飽和烴基中所含之-CH2-亦可經-O-、-CO-或-NR11-置換。R1及R2亦可與鄰接之氮原子一同形成環,R3及R4亦可與鄰接之氮原子一同形成環。 [In the formula (1a), R 1 to R 4 are each independently, represent a hydrogen atom, a substituent having a carbon number of 1 to 20 monovalent saturated hydrocarbon group or may have a substituent group of carbon number 6 to 10 is a monovalent The aromatic hydrocarbon group may be substituted by -O-, -CO- or -NR 11 - in the -CH 2 - contained in the saturated hydrocarbon group. R 1 and R 2 may also form a ring together with an adjacent nitrogen atom, and R 3 and R 4 may form a ring together with an adjacent nitrogen atom.

R5表示-OH、-SO3 -、-SO3H、-SO3 -Z+、-CO2H、-CO2 -Z+、-CO2R8、-SO3R8或是-SO2NR9R10R 5 represents -OH, -SO 3 - , -SO 3 H, -SO 3 - Z + , -CO 2 H, -CO 2 - Z + , -CO 2 R 8 , -SO 3 R 8 or -SO 2 NR 9 R 10 .

R6及R7是各自獨立,表示氫原子、碳數1至6的烷基。 R 6 and R 7 are each independently a hydrogen atom and an alkyl group having 1 to 6 carbon atoms.

m表示0至5的整數。m是2以上時,複數個R5可以是相同也可以是相異。 m represents an integer from 0 to 5. When m is 2 or more, a plurality of R 5 may be the same or different.

a表示0或是1的整數。 a represents an integer of 0 or 1.

X表示鹵原子。 X represents a halogen atom.

Z+表示+N(R11)4、Na+或是K+,4個R11可以是相同也可 以是相異。 Z + represents + N(R 11 ) 4 , Na + or K + , and 4 R 11 may be the same or different.

R8表示碳數1至20的1價飽和烴基,在該飽和烴基中含有之氫原子亦可經鹵原子取代。 R 8 is a C 1-20 monovalent saturated hydrocarbon group comprising a hydrogen atom of the saturated hydrocarbon group may be substituted with a halogen atom.

R9及R10是各自獨立,表示氫原子或可具有取代基之碳數1至20的1價飽和烴基,在該飽和脂肪族烴基中含有之-CH2-亦可經-O-、-CO-、-NH-或是-NR8-置換。R9及R10也可以與鍵結之鄰接氮原子一同形成3至10員之含氮雜環。 R 9 and R 10 are each independently a hydrogen atom or a monovalent saturated hydrocarbon group having 1 to 20 carbon atoms which may have a substituent, and the -CH 2 - contained in the saturated aliphatic hydrocarbon group may also be -O-, - CO-, -NH- or -NR 8 - substitution. R 9 and R 10 may also form a nitrogen-containing heterocyclic ring of 3 to 10 members together with the adjacent nitrogen atom of the bond.

R11表示氫原子、碳數1至20的1價飽和烴基、或是碳數7至10之芳烷基]。 R 11 represents a hydrogen atom, a monovalent saturated hydrocarbon group having 1 to 20 carbon atoms, or an aralkyl group having 7 to 10 carbon atoms.

[3]如[1]或是[2]所述之著色光敏性樹脂組成物,其中,聚合起始劑含有聯咪唑化合物。 [3] The colored photosensitive resin composition according to [1], wherein the polymerization initiator contains a biimidazole compound.

[4]如[1]或是[2]所述之著色光敏性樹脂組成物,其中,聚合起始劑含有O-醯基肟化合物。 [4] The colored photosensitive resin composition according to [1], wherein the polymerization initiator contains an O-indenyl ruthenium compound.

[5]一種彩色濾光片,係由如[1]至[4]中任一項所述之著色光敏性樹脂組成物所形成。 [5] A color filter formed of the colored photosensitive resin composition according to any one of [1] to [4].

[6]一種顯示裝置,係含有如[5]所述之彩色濾光片。 [6] A display device comprising the color filter according to [5].

依據本發明之著色光敏性樹脂組成物,在顯影後的顯影液中,產生自著色光敏性樹脂組成物的剝離片會較少。 According to the colored photosensitive resin composition of the present invention, in the developing solution after development, the release sheet which is produced from the coloring photosensitive resin composition is less.

本發明的著色光敏性樹脂組成物,係含有:著色劑(A)、樹脂(B)、聚合性化合物(C)、聚合起始劑 (D)及硫醇化合物(T)。 The colored photosensitive resin composition of the present invention contains a coloring agent (A), a resin (B), a polymerizable compound (C), and a polymerization initiator. (D) and a thiol compound (T).

本發明的著色光敏性樹脂組成物,以又含有溶劑(E)及/或調平劑(F)為佳。 The colored photosensitive resin composition of the present invention preferably further contains a solvent (E) and/or a leveling agent (F).

本發明的著色光敏性樹脂組成物,也可以含有聚合起始助劑(D1)。 The colored photosensitive resin composition of the present invention may contain a polymerization initiation aid (D1).

本說明書中,作為各成分而例示的化合物,只要沒有特別論述限制,即可以單獨使用,也可以組合複數種而使用。 In the present specification, the compounds exemplified as the respective components may be used singly or in combination of plural kinds unless otherwise specified.

〈著色劑(A)〉 <Colorant (A)>

著色劑(A)含有氧雜蒽染料(A1)與顏料(A2),也可以又含有氧雜蒽染料(A1)以外之染料。 The colorant (A) contains the xanthene dye (A1) and the pigment (A2), and may further contain a dye other than the xanthene dye (A1).

氧雜蒽染料(A1)是在分子內含有氧雜蒽骨架的化合物之染料。作為氧雜蒽染料(A1),例如可以列舉:C.I.酸性紅(C.I.Acid Red)51(以下,省略C.I.酸性紅的記號,只記載號碼。其他亦同。)、52、87、92、94、289、388;C.I.酸性紫9、30、102;C.I.鹼性紅(C.I.Basic Red)1(玫紅6G(Rhodamine 6G))、2、3、4、8;C.I.鹼性紅10(玫紅B)、11;C.I.鹼性紫10、11、25;C.I.溶劑紅218;C.I.媒介紅(C.I.Mordant Red)27、C.I.反應紅(C.I.Reactive Red)36(孟加拉玫紅B(Rose bengal B))、磺基玫紅G(Sulforhodamine G)、在JP2010-32999-A中記載的氧雜蒽染料、在JP4492760-B中記載的氧雜蒽染料等。以溶解在有機溶劑中者為佳。 The xanthene dye (A1) is a dye of a compound containing a xanthene skeleton in the molecule. Examples of the xanthene dye (A1) include CI Acid Red 51 (hereinafter, the symbol of CI acid red is omitted, only the number is described. Others are the same), 52, 87, 92, 94, 289, 388; CI acid violet 9, 30, 102; CI basic red (CIBasic Red) 1 (Rhodamine 6G), 2, 3, 4, 8; CI alkaline red 10 (rose red B ); 11; CI alkaline violet 10, 11, 25; CI solvent red 218; CI media red (CI Mordant Red) 27, CI reactive red 36 (Rose bengal B), Sulforhodamine G, a xanthene dye described in JP2010-32999-A, a xanthene dye described in JP4492760-B, and the like. It is preferred to dissolve in an organic solvent.

此等之中,作為氧雜蒽染料(A1),以含有式(1a)所示之化合物(以下,有稱為「化合物(1a)」的情形)的 染料為佳。化合物(1a),也可以是其之互變異構物。使用化合物(1a)時,氧雜蒽染料(A1)中化合物(1a)的含量,較佳是50質量%以上,更佳是70質量%以上,又更佳是90質量%以上。尤其,作為氧雜蒽染料(A1),以只使用化合物(1a)者為佳。 In the above, the oxanthene dye (A1) contains a compound represented by the formula (1a) (hereinafter, referred to as "the compound (1a)"). Dyes are preferred. The compound (1a) may also be a tautomer thereof. When the compound (1a) is used, the content of the compound (1a) in the xanthene dye (A1) is preferably 50% by mass or more, more preferably 70% by mass or more, and still more preferably 90% by mass or more. In particular, as the xanthene dye (A1), it is preferred to use only the compound (1a).

式(1a)中,-SO3 -存在時,其數目為1個。 In the formula (1a), when -SO 3 - is present, the number thereof is one.

作為R1至R4中碳數6至10的1價芳香族烴基,例如可以列舉:苯基、甲苯甲醯基(toluyl)、二甲苯基(xylyl)、2,4,6-三甲苯基(mesityl)、丙基苯基、丁基苯基等。 Examples of the monovalent aromatic hydrocarbon group having 6 to 10 carbon atoms in R 1 to R 4 include a phenyl group, a toluyl group, a xylyl group, and a 2,4,6-trimethylphenyl group. (mesityl), propylphenyl, butylphenyl and the like.

作為該芳香族烴基可具有的取代基,可列舉:鹵原子、-R8、-OH、-OR8、-SO3 -、-SO3H、-SO3 -Z+、-CO2H、-CO2R8、-SR8、-SO2R8、-SO3R8或是-SO2NR9R10。其中,作為取代基,又以-SO3 -、-SO3H、-SO3 -Z+及-SO2NR9R10為佳,以-SO3 -Z+及-SO2NR9R10為更佳。此時,作為-SO3 -Z+,是以-SO3 -+N(R11)4為佳。R1至R4為此等基時,可由含有化合物(1a)的本發明之著色光敏性樹脂組成物來形成產生的雜質少,且耐熱性優之彩色濾光片。 Examples of the substituent which the aromatic hydrocarbon group may have include a halogen atom, -R 8 , -OH, -OR 8 , -SO 3 - , -SO 3 H, -SO 3 - Z + , -CO 2 H, -CO 2 R 8 , -SR 8 , -SO 2 R 8 , -SO 3 R 8 or -SO 2 NR 9 R 10 . Wherein the substituent again -SO 3 -, -SO 3 H, -SO 3 - Z + and -SO 2 NR 9 R 10 preferred, and -SO 3 - Z + and -SO 2 NR 9 R 10 For better. In this case, as -SO 3 - Z + , -SO 3 -+ N(R 11 ) 4 is preferred. Less impurities present invention the colored photosensitive resin composition of R 1 to R 4 group, etc. For this reason, by containing the compound (1a) to form generated, and excellent heat resistance of the color filter.

在R1至R4及R8至R11中,作為碳數1至20的1價飽和烴基,例如可以列舉:甲基、乙基、丙基、丁基、戊基、己基、庚基、辛基、壬基、癸基、十二基、十六基、二十基等直鏈狀烷基;異丙基、異丁基、異戊基、新戊基、2-乙基己基等分枝鏈狀烷基;環丙基、環戊基、環己基、環庚基、環辛基、三環癸基等碳數3至20的脂環 式飽和烴基。 In the case of R 1 to R 4 and R 8 to R 11 , examples of the monovalent saturated hydrocarbon group having 1 to 20 carbon atoms include a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, and a heptyl group. Octyl, fluorenyl, fluorenyl, dodecyl, hexadecanyl, eicosyl and other linear alkyl groups; isopropyl, isobutyl, isopentyl, neopentyl, 2-ethylhexyl A branched alkyl group; a cyclopropyl saturated hydrocarbon group having 3 to 20 carbon atoms such as a cyclopropyl group, a cyclopentyl group, a cyclohexyl group, a cycloheptyl group, a cyclooctyl group or a tricyclodecyl group.

R1至R4中該飽和烴基含有之氫原子,例如亦可經碳數6至10的芳香族烴基或是鹵原子取代。 The hydrogen atom contained in the saturated hydrocarbon group in R 1 to R 4 may be substituted, for example, by an aromatic hydrocarbon group having 6 to 10 carbon atoms or a halogen atom.

R8及R10中,該飽和烴基含有之氫原子,例如亦可經羥基或是鹵原子取代。 In R 8 and R 10 , the hydrogen atom contained in the saturated hydrocarbon group may be substituted, for example, by a hydroxyl group or a halogen atom.

作為R1及R2與鄰接之氮原子一同形成的環、以及R3及R4與鄰接之氮原子一同形成的環,例如可以列舉以下者。 Examples of the ring formed by R 1 and R 2 together with the adjacent nitrogen atom and the ring formed by R 3 and R 4 together with the adjacent nitrogen atom include the following.

作為-OR8,例如可以列舉:甲氧基、乙氧基、丙氧基、丁氧基、戊氧基、己氧基、庚氧基、辛氧基、2-乙基己氧基、二十基氧(icosyloxy)基等。 Examples of -OR 8 include a methoxy group, an ethoxy group, a propoxy group, a butoxy group, a pentyloxy group, a hexyloxy group, a heptyloxy group, an octyloxy group, a 2-ethylhexyloxy group, and the like. An icosyloxy group or the like.

作為-CO2R8,例如可以列舉:甲氧基羰基、乙氧基羰基、丙氧基羰基、三級丁氧基羰基、己氧基羰基、二十基氧基羰基等。 Examples of the -CO 2 R 8 include a methoxycarbonyl group, an ethoxycarbonyl group, a propoxycarbonyl group, a tertiary butoxycarbonyl group, a hexyloxycarbonyl group, and a hexyloxycarbonyl group.

作為-SR8,例如可以列舉:甲基硫基、乙基硫基、丁基硫基、己基硫基、癸基硫基、二十基硫基等。 As -SR 8, for example, may include: a methyl group, an ethyl group, a butyl group, a hexyl group, a decyl group, a twenty-ylthio and the like.

作為-SO2R8,例如可以列舉:甲基磺醯基、乙基磺醯基、丁基磺醯基、己基磺醯基、癸基磺醯基、二十基磺醯基等。 Examples of -SO 2 R 8 include a methylsulfonyl group, an ethylsulfonyl group, a butylsulfonyl group, a hexylsulfonyl group, a decylsulfonyl group, and a decylsulfonyl group.

作為-SO3R8,例如可以列舉:甲氧基磺醯基、乙氧基磺醯基、丙氧基磺醯基、三級丁氧基磺醯基、己氧基磺醯基、二十基氧基磺醯基等。 Examples of -SO 3 R 8 include a methoxysulfonyl group, an ethoxysulfonyl group, a propoxysulfonyl group, a tertiary butoxysulfonyl group, a hexyloxysulfonyl group, and 20 Alkoxysulfonyl and the like.

作為-SO2NR9R10,例如可以列舉:胺磺醯(sulfamoyl)基;N-甲基胺磺醯基、N-乙基胺磺醯基、N-丙基胺磺醯基、N-異丙基胺磺醯基、N-丁基胺磺醯基、N-異丁基胺磺醯基、N-二級丁基胺磺醯基、N-三級丁基胺磺醯基、N-戊基胺磺醯基、N-(1-乙基丙基)胺磺醯基、N-(1,1-二甲基丙基)胺磺醯基、N-(1,2-二甲基丙基)胺磺醯基、N-(2,2-二甲基丙基)胺磺醯基、N-(1-甲基丁基)胺磺醯基、N-(2-甲基丁基)胺磺醯基、N-(3-甲基丁基)胺磺醯基、N-環戊基胺磺醯基、N-己基胺磺醯基、N-(1,3-二甲基丁基)胺磺醯基、N-(3,3-二甲基丁基)胺磺醯基、N-庚基胺磺醯基、N-(1-甲基己基)胺磺醯基、N-(1,4-二甲基戊基)胺磺醯基、N-辛基胺磺醯基、N-(2-乙基己基)胺磺醯基、N-(1,5-二甲基)己基胺磺醯基、N-(1,1,2,2-四甲基丁基)胺磺醯基等N-1取代胺磺醯基;N.N-二甲基胺磺醯基、N,N-乙基甲基胺磺醯基、N,N-二乙基胺磺醯基、N,N-丙基甲基胺磺醯基、N,N-異丙基甲基胺磺醯基、N,N-三級丁基甲基胺磺醯基、N,N-丁基乙基胺磺醯基、N,N-雙(1-甲基丙基)胺磺醯基、N,N-庚基甲基胺磺醯基等N,N-2取代胺磺醯基等。 As -SO 2 NR 9 R 10 , for example, a sulfamoyl group; N-methylamine sulfonyl group, N-ethylamine sulfonyl group, N-propylamine sulfonyl group, N- Isopropylamine sulfonyl, N-butylamine sulfonyl, N-isobutylamine sulfonyl, N-tertiary butylamine sulfonyl, N-tert-butylamine sulfonyl, N - amylamine sulfonyl, N-(1-ethylpropyl)amine sulfonyl, N-(1,1-dimethylpropyl)amine sulfonyl, N-(1,2-dimethyl Propyl sulfonyl, N-(2,2-dimethylpropyl)amine sulfonyl, N-(1-methylbutyl)amine sulfonyl, N-(2-methylbutyl Aminesulfonyl, N-(3-methylbutyl)aminesulfonyl, N-cyclopentylaminesulfonyl, N-hexylaminesulfonyl, N-(1,3-dimethyl Butyl)aminesulfonyl, N-(3,3-dimethylbutyl)aminesulfonyl, N-heptylaminesulfonyl, N-(1-methylhexyl)aminesulfonyl, N -(1,4-Dimethylpentyl)amine sulfonyl, N-octylamine sulfonyl, N-(2-ethylhexyl)amine sulfonyl, N-(1,5-dimethyl N-1 substituted amine sulfonyl group such as hexylamine sulfonyl group, N-(1,1,2,2-tetramethylbutyl)amine sulfonyl group; NN-dimethylamine sulfonyl group, N, N-ethylmethylamine sulfonyl, N,N-diethylamine sulfonate N,N-propylmethylamine sulfonyl, N,N-isopropylmethylamine sulfonyl, N,N-tertiary butylmethylamine sulfonyl, N,N-butylethyl An N,N-2 substituted amine sulfonyl group such as an aminesulfonyl group, an N,N-bis(1-methylpropyl)aminesulfonyl group or an N,N-heptylmethylaminesulfonyl group.

R5是以-CO2H、-CO2 -Z+、-CO2R8、-SO3 -、-SO3 -Z+、-SO3H、或是-SO2NHR9為佳,以-SO3 -、-SO3 -Z+、-SO3H、或是-SO2NHR9為更佳。 R 5 is preferably -CO 2 H, -CO 2 - Z + , -CO 2 R 8 , -SO 3 - , -SO 3 - Z + , -SO 3 H, or -SO 2 NHR 9 -SO 3 - , -SO 3 - Z + , -SO 3 H, or -SO 2 NHR 9 is more preferred.

m是以1至4為佳,以1或2為更佳。 m is preferably from 1 to 4, more preferably from 1 or 2.

作為R6及R7中碳數1至6的烷基,可列舉 上述列舉之烷基中碳數1至6者。 Examples of the alkyl group having 1 to 6 carbon atoms in R 6 and R 7 include those having 1 to 6 carbon atoms in the above-exemplified alkyl groups.

作為R11中碳數7至10的芳烷基,可列舉:苯甲基、苯基乙基、苯基丁基等。 Examples of the aralkyl group having 7 to 10 carbon atoms in R 11 include a benzyl group, a phenylethyl group, and a phenylbutyl group.

Z++N(R11)4、Na+或是K+,而以+N(R11)4為佳。 Z + is + N(R 11 ) 4 , Na + or K + , and + N(R 11 ) 4 is preferred.

作為前述+N(R11)4,4個R11之中,以至少2個是碳數5至20的1價飽和烴基為佳。又,4個R11之合計碳數是以20至80為佳,以20至60為更佳。在化合物(1a)中,當存在+N(R11)4的情形下,R11是此等之基時,可以由含有化合物(1a)的本發明之著色光敏性樹脂組成物形成雜質少的彩色濾光片。 As the above + N(R 11 ) 4 , among the four R 11 , at least two monovalent saturated hydrocarbon groups having 5 to 20 carbon atoms are preferred. Further, the total carbon number of the four R 11 is preferably from 20 to 80, more preferably from 20 to 60. In the case of the compound (1a), when R 11 is such a group in the presence of + N(R 11 ) 4 , the colored photosensitive resin composition of the present invention containing the compound (1a) can form less impurities. Color filter.

作為化合物(1a),以式(2a)所示之化合物(以下,有稱為「化合物(2a)」的情形)為佳。化合物(2a)也可以是其之互變異構物。 The compound (1a) is preferably a compound represented by the formula (2a) (hereinafter, referred to as "compound (2a)"). Compound (2a) may also be a tautomer thereof.

[式(2a)中,R21至R24是各自獨立,表示氫原子、-R26或是可具有取代基之碳數6至10的1價芳香族烴基。R21及R22也可以與鄰接的氮原子一同形成環,R23及R24也可以與鄰接的氮原子一同形成環。 In the formula (2a), R 21 to R 24 are each independently a hydrogen atom, -R 26 or a monovalent aromatic hydrocarbon group having 6 to 10 carbon atoms which may have a substituent. R 21 and R 22 may form a ring together with an adjacent nitrogen atom, and R 23 and R 24 may form a ring together with an adjacent nitrogen atom.

R25表示-SO3 -、-SO3H、-SO3 -Z1+或是-SO2NHR26R 25 represents -SO 3 - , -SO 3 H, -SO 3 - Z1 + or -SO 2 NHR 26 .

m1表示0至5的整數。m1是2以上時,複數個R25是相同也可以是相異。 M1 represents an integer from 0 to 5. When m1 is 2 or more, a plurality of R 25 are the same or different.

a1表示0或是1的整數。 A1 represents an integer of 0 or 1.

X1表示鹵原子。 X1 represents a halogen atom.

R26表示碳數1至20的1價飽和烴基。 R 26 represents a monovalent saturated hydrocarbon group having 1 to 20 carbon atoms.

Z1+表示+N(R27)4、Na+或是K+,4個R27可以相同也可以相異。 Represents Z1 + + N (R 27) 4, Na + or K +, 4 th R 27 may be the same or different.

R27表示碳數1至20的1價飽和烴基,或是苯甲基]。 R 27 represents a monovalent saturated hydrocarbon group having 1 to 20 carbon atoms, or a benzyl group].

作為R21至R24中碳數6至10的1價芳香族烴基,可以列舉與前述列舉作為R1至R4的芳香族烴基者相同之基。該芳香族烴基中含有之氫原子亦可經-SO3 -、-SO3H、-SO3 -Z1+、-SO3R28或是-SO2NHR28取代。 The monovalent aromatic hydrocarbon group having 6 to 10 carbon atoms in R 21 to R 24 may be the same as those exemplified as the aromatic hydrocarbon group of R 1 to R 4 described above. The hydrogen atom contained in the aromatic hydrocarbon group may be substituted by -SO 3 - , -SO 3 H, -SO 3 - Z1 + , -SO 3 R 28 or -SO 2 NHR 28 .

作為R21至R24的組合,R21及R23是氫原子,R22及R24是碳數6至10的1價芳香族烴基,該芳香族烴基含有之氫原子,是以-SO3 -、-SO3H、-SO3 -Z1+、-SO3R28或是-SO2NHR28取代者為佳。更佳的組合是R21及R23是氫原子,R22及R24是碳數6至10的1價芳香族烴基,該芳香族烴基含有之氫原子,是以-SO3 -Z1+、或是-SO2NHR28取代者。 As a combination of R 21 to R 24 , R 21 and R 23 are a hydrogen atom, and R 22 and R 24 are a monovalent aromatic hydrocarbon group having 6 to 10 carbon atoms, and the aromatic hydrocarbon group contains a hydrogen atom, which is -SO 3 - , -SO 3 H, -SO 3 - Z1 + , -SO 3 R 28 or -SO 2 NHR 28 is preferred. More preferably, R 21 and R 23 are a hydrogen atom, and R 22 and R 24 are a monovalent aromatic hydrocarbon group having 6 to 10 carbon atoms, and the hydrogen atom of the aromatic hydrocarbon group is -SO 3 - Z1 + , Or -SO 2 NHR 28 replacement.

R21至R24為該等基時,可以由含有化合物(2a)的本發明之著色光敏性樹脂組成物形成耐熱性更優異的彩色濾光片。 When R 21 to R 24 are these groups, a color filter which is more excellent in heat resistance can be formed from the colored photosensitive resin composition of the present invention containing the compound (2a).

作為R21及R22與鄰接之氮原子一同形成的環以及R23及R24與鄰接之氮原子一同形成的環,可以列舉 與R1及R2與鄰接之氮原子一同形成的環相同者。其中,尤以脂肪族雜環為佳。作為該脂肪族雜環,例如可以列舉下述者。 The ring formed by R 21 and R 22 together with the adjacent nitrogen atom and the ring formed by R 23 and R 24 together with the adjacent nitrogen atom may be the same as those formed by R 1 and R 2 together with the adjacent nitrogen atom. . Among them, aliphatic heterocyclic rings are preferred. Examples of the aliphatic heterocyclic ring include the following.

作為R26及R27中碳數1至20的1價飽和烴基,可以列舉與R8至R11列舉作為飽和烴基者相同之基。 Examples of the monovalent saturated hydrocarbon group having 1 to 20 carbon atoms in R 26 and R 27 include the same groups as those in the case of R 8 to R 11 as a saturated hydrocarbon group.

R21至R24為-R26時,-R26是各自獨立,而以甲基或乙基為佳。又,作為在-SO3R26及-SO2NHR26中之R26,是以碳數3至20的分枝鏈狀烷基為較佳,以碳數6至12的分枝鏈狀烷基為更佳,以2-乙基己基為又更佳。R26為該等基時,可由含有化合物(2a)的本發明之著色光敏性樹脂組成物形成產生更少雜質之彩色濾光片。 When R 21 to R 24 are -R 26 , -R 26 is each independently, and a methyl group or an ethyl group is preferred. Further, as -SO 3 R 26, and in the -SO 2 NHR 26 R 26, is a branched chain alkyl group having a carbon number of 3 to 20 is preferred to branched chain alkyl of 6 to 12 carbon atoms, The base is more preferred, and 2-ethylhexyl is more preferred. When R 26 is such a group, a color filter which produces less impurities can be formed from the colored photosensitive resin composition of the present invention containing the compound (2a).

Z1++N(R27)4、Na+或是K+,較佳是+N(R27)4。作為前述+N(R27)4,是以4個R27中之至少2個是碳數5至20的1價飽和烴基為較佳。又,4個的R27之合計碳數是以20至80為較佳,以20至60為更佳。在化合物(2a)中存在有+N(R27)4時,R27有此等之基時,可由含有化合物(2a)的本發明之著色光敏性樹脂組成物形成產生更少雜質的彩色濾光片。 Z1 + is + N(R 27 ) 4 , Na + or K + , preferably + N(R 27 ) 4 . As the above + N(R 27 ) 4 , it is preferred that at least two of the four R 27 are a monovalent saturated hydrocarbon group having 5 to 20 carbon atoms. In addition, four of R 27 is the total number of carbon atoms is preferably 20 to 80, more preferably 20 to 60 is a. When + N(R 27 ) 4 is present in the compound (2a), when R 27 has such a group, a color filter which produces less impurities can be formed from the colored photosensitive resin composition of the present invention containing the compound (2a). Light film.

m1是以1至4為佳,以1或是2為更佳。 M1 is preferably 1 to 4, more preferably 1 or 2.

又,作為化合物(1a),式(3a)所示之化合物(以下,有稱為「化合物(3a)」的情形)亦為佳。化合物(3a)也可以是其互變異構物。 Further, as the compound (1a), a compound represented by the formula (3a) (hereinafter referred to as "the compound (3a)") is also preferable. Compound (3a) may also be a tautomer thereof.

[式(3a)中,R31及R32是各自獨立,表示碳數1至10的1價飽和烴基,該飽和烴基中含有之氫原子也可被碳數6至10的芳香族烴基或是鹵原子取代,該芳香族烴基中含有之氫原子也可被碳數1至3的烷氧基取代,前述飽和烴基中含有之-CH2-亦可經-O-、-CO-或-NR11-取代。 [In the formula (3a), R 31 and R 32 are each independently and represent a monovalent saturated hydrocarbon group having 1 to 10 carbon atoms, and the hydrogen atom contained in the saturated hydrocarbon group may be an aromatic hydrocarbon group having 6 to 10 carbon atoms or The halogen atom may be substituted, and the hydrogen atom contained in the aromatic hydrocarbon group may be substituted by an alkoxy group having 1 to 3 carbon atoms, and the -CH 2 - contained in the saturated hydrocarbon group may also be -O-, -CO- or -NR 11 - replaced.

R33及R34是各自獨立,表示碳數1至4之烷基、碳數1至4之烷硫基或是碳數1至4之烷磺醯基。 R 33 and R 34 are each independently and represent an alkyl group having 1 to 4 carbon atoms, an alkylthio group having 1 to 4 carbon atoms or an alkanesulfonyl group having 1 to 4 carbon atoms.

R31及R33也可以與鄰接之氮原子一同形成環,R32及R34也可以與鄰接之氮原子一同形成環。 R 31 and R 33 may form a ring together with an adjacent nitrogen atom, and R 32 and R 34 may form a ring together with an adjacent nitrogen atom.

p及q是互相獨立地表示0至5的整數。p為2以上時,複數個R33可以相同也可以相異,q為2以上時,複數個R34可以相同也可以相異。 p and q are integers representing 0 to 5 independently of each other. When p is 2 or more, a plurality of R 33 may be the same or different, and when q is 2 or more, a plurality of R 34 may be the same or different.

R11表示與上述相同意思]。 R 11 represents the same meaning as above].

作為R31及R33中碳數1至10的1價飽和烴基,可以列舉R8中碳數1至10的基。 Examples of the monovalent saturated hydrocarbon group having 1 to 10 carbon atoms in R 31 and R 33 include a group having 1 to 10 carbon atoms in R 8 .

作為可具有取代基之碳數6至10的芳香族烴基,可以列舉與R1所列舉者相同之基。 Examples of the aromatic hydrocarbon group having 6 to 10 carbon atoms which may have a substituent include the same groups as those exemplified for R 1 .

作為碳數1至3之烷氧基,例如可以列舉:甲氧基、乙氧基、丙氧基等。 Examples of the alkoxy group having 1 to 3 carbon atoms include a methoxy group, an ethoxy group, a propoxy group and the like.

R31及R33是互相獨立地以碳數1至3的1價飽和烴基為佳。 R 31 and R 33 are each independently a monovalent saturated hydrocarbon group having 1 to 3 carbon atoms.

作為R33及R34中碳數1至4之烷基,例如可以列舉:甲基、乙基、丙基、丁基、異丙基、異丁基、二級丁基、三級丁基等。 Examples of the alkyl group having 1 to 4 carbon atoms in R 33 and R 34 include a methyl group, an ethyl group, a propyl group, a butyl group, an isopropyl group, an isobutyl group, a secondary butyl group, and a tertiary butyl group. .

作為R33及R34中碳數1至4之烷基硫基,例如可以列舉:甲基硫基、乙基硫基、丙基硫基、丁基硫基、異丙基硫基等。 Examples of the alkylthio group having 1 to 4 carbon atoms in R 33 and R 34 include a methylthio group, an ethylthio group, a propylthio group, a butylthio group, and an isopropylthio group.

作為R33及R34中碳數1至4之烷基磺醯基,例如可以列舉:甲基磺醯基、乙基磺醯基、丙基磺醯基、丁基磺醯基、異丙基磺醯基等。 Examples of the alkylsulfonyl group having 1 to 4 carbon atoms in R 33 and R 34 include a methylsulfonyl group, an ethylsulfonyl group, a propylsulfonyl group, a butylsulfonyl group, and an isopropyl group. Sulfonyl and the like.

R33及R34是以碳數1至4之烷基為佳,以甲基為更佳。 R 33 and R 34 are preferably an alkyl group having 1 to 4 carbon atoms, more preferably a methyl group.

p及q是以0至2為較佳,以0或1為更佳。 Preferably, p and q are 0 to 2, and more preferably 0 or 1.

作為化合物(1a),例如可以列舉:式(1-1)至式(1-43)所示之化合物。又,式中,R40表示碳數1至20的1價飽和烴基,較佳是碳數6至12的分枝鏈狀烷基,更佳是2-乙基己基。 The compound (1a) may, for example, be a compound represented by the formula (1-1) to the formula (1-43). Further, in the formula, R 40 represents a monovalent saturated hydrocarbon group having 1 to 20 carbon atoms, preferably a branched chain alkyl group having 6 to 12 carbon atoms, more preferably 2-ethylhexyl group.

上述化合物之中,式(1-1)至式(1-23)及式(1-37)至式(1-43)所示之化合物是相當於化合物(2a),式(1-24)至式(1-36)所示之化合物是相當於化合物(3a)。 Among the above compounds, the compound represented by the formula (1-1) to the formula (1-23) and the formula (1-37) to the formula (1-43) is equivalent to the compound (2a), the formula (1-24). The compound represented by the formula (1-36) corresponds to the compound (3a).

此等之中,尤以C.I.酸性紅289的磺醯胺化合物、C.I.酸性紅289的4級銨鹽、C.I.酸性紫102的磺醯胺化合物或C.I.酸性紫102的4級銨鹽為佳。作為如此之化合物,例如可以列舉:式(1-1)至式(1-8)、式(1-11)、式(1-12)所示之化合物等。 Among these, a sulfonamide compound of C.I. Acid Red 289, a grade 4 ammonium salt of C.I. Acid Red 289, a sulfonamide compound of C.I. Acid Violet 102, or a quaternary ammonium salt of C.I. Acid Violet 102 is preferred. Examples of such a compound include a compound represented by the formula (1-1) to the formula (1-8), the formula (1-11), and the formula (1-12).

又,就對有機溶劑之溶解性優良之點而言,是以式(1-24)至式(1-33)中任一者所示之化合物為佳。 Further, the point of the solubility in the organic solvent is preferably a compound represented by any one of the formulae (1-24) to (1-33).

氧雜蒽染料(A1)可以使用市售之氧雜蒽染料(例如,中外化成股份有限公司製的「Chugai Aminol Fast Pink R-H/C」,田岡化學工業股份有限公司製的「Rhodamin 6G」)。又,亦可將市售之氧雜蒽染料作為出發原料,參考JP2010-32999-A而合成。 As the xanthene dye (A1), a commercially available xanthene dye (for example, "Chugai Aminol Fast Pink R-H/C" manufactured by Nakato Chemical Co., Ltd., "Rhodamin 6G" manufactured by Tajika Chemical Industry Co., Ltd.) can be used. Further, a commercially available xanthene dye can be used as a starting material, and it can be synthesized by referring to JP2010-32999-A.

相對於著色劑(A)的總量,氧雜蒽染料(A1)的含量較佳是0.5至50質量%,更佳是0.5至40質量%,又更佳的是0.5至30質量%。 The content of the xanthene dye (A1) is preferably from 0.5 to 50% by mass, more preferably from 0.5 to 40% by mass, still more preferably from 0.5 to 30% by mass, based on the total amount of the coloring agent (A).

顏料(A2)並無特別之限定,可以使用公知的顏料,例如可以列舉:在顏色指數(COLOR INDEX)(The Society of Dyers and Colourists出版)中分類為色料(pigment)的顏料。 The pigment (A2) is not particularly limited, and a known pigment can be used. For example, a pigment classified as a pigment in a color index (COLOR INDEX) (published by The Society of Dyers and Colourists) can be cited.

作為顏料,例如可以列舉:C.I.顏料黃(pigment yellow)1、3、12、13、14、15、16、17、20、24、31、53、83、86、93、94、109、110、117、125、128、137、138、139、147、148、150、153、154、166、173、194、214等黃色顏料;C.I.顏料橙13、31、36、38、40、42、、43、51、53、59、61、64、65、71、73等橙色顏料;C.I.顏料紅9、97、105、122、123、144、149、166、168、176、177、180、192、209、215、216、224、242、254、255、264、265等紅色顏料;C.I.顏料藍15、15:3、15:4、15:6、60等藍色顏料;C.I.顏料紫1、19、23、29、32、36、38等紫色顏料;C.I.顏料綠7、36、58等綠色顏料;C.I.顏料褐23、25等褐色顏料;C.I.顏料黑1、7等黑色顏料等。 As the pigment, for example, CI pigment yellow 1, 3, 12, 13, 14, 15, 16, 17, 20, 24, 31, 53, 83, 86, 93, 94, 109, 110, Yellow pigments such as 117, 125, 128, 137, 138, 139, 147, 148, 150, 153, 154, 166, 173, 194, 214; CI Pigment Orange 13, 31, 36, 38, 40, 42, 43 , 51, 53, 59, 61, 64, 65, 71, 73 and other orange pigments; CI Pigment Red 9, 97, 105, 122, 123, 144, 149, 166, 168, 176, 177, 180, 192, 209 , red pigments such as 215, 216, 224, 242, 254, 255, 264, 265; blue pigments such as CI Pigment Blue 15, 15:3, 15:4, 15:6, 60; CI Pigment Violet 1, 19, 23, 29, 32, 36, 38 and other purple pigments; CI pigment green 7, 36, 58 and other green pigments; CI pigment brown 23, 25 and other brown pigments; CI pigment black 1, 7 and other black pigments.

作為顏料者,較佳為C.I.顏料藍15、15:3、15:4、15:6、60等藍色顏料,C.I.顏料紫1、19、23、29、 32、36、38等紫色顏料;更佳為C.I.顏料藍15:3、15:6及C.I.顏料紫23;又更佳為C.I.顏料藍15:6。藉由含有前述顏料,穿透光光譜變成容易最佳化,彩色濾光片的耐光性及化學抗性會變得更良好。 As the pigment, C.I. Pigment Blue 15, 15:3, 15:4, 15:6, 60 and other blue pigments, C.I. Pigment Violet 1, 19, 23, 29, Purple pigments such as 32, 36, 38; more preferably C.I. Pigment Blue 15:3, 15:6 and C.I. Pigment Violet 23; and more preferably C.I. Pigment Blue 15:6. By containing the above-mentioned pigment, the spectrum of the transmitted light becomes easy to be optimized, and the light resistance and chemical resistance of the color filter become better.

顏料,亦可視所需而實施:松脂處理、使用導入酸性基或鹼性基之顏料衍生物等之表面處理、藉由高分子化合物等對顏料表面之接枝處理、藉由硫酸微粒化法等之微粒化處理、或是為了除去雜質而藉由有機溶劑或水等之洗淨處理、將離子性雜質藉由離子交換法等除去之處理等。 The pigment may be carried out as needed: rosin treatment, surface treatment using a pigment derivative introduced with an acidic group or a basic group, graft treatment of a pigment surface by a polymer compound, etc., by a sulfuric acid micronization method, or the like The micronization treatment or the treatment of removing the impurities by an organic solvent or water, or the removal of the ionic impurities by an ion exchange method or the like.

顏料以粒徑均一為佳。藉由含有顏料分散劑而進行分散處理,可以得到在溶液中之顏料呈均勻分散的狀態之顏料分散液。 The pigment is preferably uniform in particle size. By performing a dispersion treatment by containing a pigment dispersant, a pigment dispersion liquid in which the pigment in the solution is uniformly dispersed can be obtained.

作為前述顏料分散劑,例如可以列舉:陽離子系、陰離子系、非離子系、兩性離子系、聚酯系、聚胺系、丙烯酸系等之顏料分散劑等。該等顏料分散劑,是可以單獨使用、也可以組合2種以上來使用。作為顏料分散劑,以商品名,可以列舉:KP(信越化學工業股份有限公司製)、Flowlen(共榮公司化學股份有限公司製)、Solsperse(Zeneca股份有限公司製)、EFKA(CIBA公司製)、AJISPER(Ajinomoto Fine-Techno股份有限公司製)、Disperbyk(BYK化學公司製)等。 Examples of the pigment dispersant include pigment dispersants such as cationic, anionic, nonionic, zwitterionic, polyester, polyamine, and acrylic. These pigment dispersing agents may be used singly or in combination of two or more. As a pigment dispersing agent, KP (made by Shin-Etsu Chemical Co., Ltd.), Flowlen (made by Kyoei Chemical Co., Ltd.), Solsperse (made by Zeneca Co., Ltd.), and EFKA (made by CIBA) are mentioned. AJISPER (manufactured by Ajinomoto Fine-Techno Co., Ltd.), Disperbyk (manufactured by BYK Chemical Co., Ltd.), and the like.

使用顏料分散劑時,相對於顏料(A2)之總量,其使用量較佳是1質量%以上100質量%以下,更佳是5質量%以 上50質量%以下。顏料分散劑的使用量在前述範圍內時,有得到均勻分散狀態的顏料分散液之傾向。 When the pigment dispersant is used, the amount thereof is preferably from 1% by mass to 100% by mass, more preferably 5% by mass, based on the total amount of the pigment (A2). Above 50% by mass. When the amount of the pigment dispersant used is within the above range, there is a tendency to obtain a pigment dispersion liquid in a uniformly dispersed state.

相對於著色劑(A)的總量,顏料(A2)的含量較佳是50至99.5質量%,更佳是60至99.5質量%,又更佳是70至99.5質量%。 The content of the pigment (A2) is preferably from 50 to 99.5% by mass, more preferably from 60 to 99.5% by mass, still more preferably from 70 to 99.5% by mass, based on the total amount of the coloring agent (A).

氧雜蒽染料(A1)以外之染料(以下,有稱為「染料(A3)」的情形),只要是與氧雜蒽染料(A1)不同者即無特別限定,可以使用公知的染料,例如可以列舉:偶氮染料、花青(cyanine)染料、三苯基甲烷染料、酞青素染料、蒽醌染料、萘醌染料、醌亞胺染料、次甲基(methine)染料、偶氮次甲基染料、方酸菁(squarylium)染料、吖啶染料(acridine dye)、苯乙烯基染料、香豆素染料、喹啉染料、及硝基染料等。此等之中,是以有機溶劑可溶性染料為佳。 A dye other than the xanthene dye (A1) (hereinafter referred to as "dye (A3)") is not particularly limited as long as it is different from the xanthene dye (A1), and a known dye can be used, for example. Usa: azo dye, cyanine dye, triphenylmethane dye, anthraquinone dye, anthraquinone dye, naphthoquinone dye, quinone imine dye, methine dye, azo Base dyes, squarylium dyes, acridinine dyes, styryl dyes, coumarin dyes, quinoline dyes, and nitro dyes. Among these, organic solvent-soluble dyes are preferred.

其中,以酞青素染料為較佳,以式(4)所示之化合物為更佳。 Among them, an anthraquinone dye is preferred, and a compound represented by the formula (4) is more preferred.

[式(4)中,G1表示碳數2至12的烷烴二基(alkanediyl),該烷烴二基中含有的氫原子亦可經碳數1至4的烷基取代,在該烷烴二基中含有的-CH2-亦可經-O-置換。 [In the formula (4), G 1 represents an alkanediyl having 2 to 12 carbon atoms, and a hydrogen atom contained in the alkanediyl group may also be substituted with an alkyl group having 1 to 4 carbon atoms, in the alkanediyl group. The -CH 2 - contained in the group may also be replaced by -O-.

J1表示氫原子、-NRaRb或是-NRaRbH+Q-J 1 represents a hydrogen atom, -NR a R b or -NR a R b H + Q - .

Ra及Rb各自獨立地表示氫原子或是碳數1至8的烷基。 R a and R b each independently represent a hydrogen atom or an alkyl group having 1 to 8 carbon atoms.

Q-表示鹵化物離子、BF4 -、PF6 -、ClO4 -、X-CO2 -或是Y-SO3 -Q - represents a halide ion, BF 4 - , PF 6 - , ClO 4 - , X-CO 2 - or Y-SO 3 - .

X及Y各自獨立地表示1價的有機基。 X and Y each independently represent a monovalent organic group.

p表示1至4的整數]。 p represents an integer of 1 to 4].

式(4)是表示式(4-0)所示之化合物中含有的p個氫原子以-SO2NH-G1-J1取代者。p是2以上時,複數個-SO2NH-G1-J1可以互相相同,也可以互相相異。 The formula (4) is a group in which p hydrogen atoms contained in the compound represented by the formula (4-0) are substituted with -SO 2 NH-G 1 -J 1 . When p is 2 or more, a plurality of -SO 2 NH-G 1 -J 1 may be the same as each other or may be different from each other.

作為碳數2至12的烷烴二基,可以列舉:亞甲基、伸乙基、丙二基(propanediyl)、丁二基等。 Examples of the alkanediyl group having 2 to 12 carbon atoms include a methylene group, an exoethyl group, a propanediyl group, and a butyl group.

作為-CH2-被-O-置換的碳數2至12之烷烴二基,可以列舉式(G-1)所示之基及式(G-2)所示之基。 The alkanediyl group having 2 to 12 carbon atoms which is substituted by -O 2 - is a group represented by the formula (G-1) and a group represented by the formula (G-2).

[式(G-1)及式(G-2)中,G2至G5各自獨立地表示碳數1至8的烷烴二基。 In the formulae (G-1) and (G-2), G 2 to G 5 each independently represent an alkanediyl group having 1 to 8 carbon atoms.

n1表示1至3的整數。 n 1 represents an integer of 1 to 3.

n2表示0至3的整數。 n 2 represents an integer of 0 to 3.

但是,式(G-1)所示之基中含有的碳原子及氧原子的合計數目是3至12,式(G-2)所示之基中含有的碳原子及氧原子的合計數目是2至12。 However, the total number of carbon atoms and oxygen atoms contained in the group represented by the formula (G-1) is 3 to 12, and the total number of carbon atoms and oxygen atoms contained in the group represented by the formula (G-2) is 2 to 12.

*是表示與-NH-的結合鍵。] * is a bond indicating a bond with -NH-. ]

作為碳數1至4的烷基,可以列舉:甲基、乙基、丙基、丁基等。 Examples of the alkyl group having 1 to 4 carbon atoms include a methyl group, an ethyl group, a propyl group, a butyl group and the like.

作為-SO2-NH-G1-J1,例如可以列舉下述式所示之基。 Examples of -SO 2 -NH-G 1 -J 1 include a group represented by the following formula.

G1為式(G-1)所示之基時,作為-SO2-NH-G1-J1,例如可以列舉下述式所示之基。 When G 1 is a group represented by the formula (G-1), examples of the -SO 2 -NH-G 1 -J 1 include a group represented by the following formula.

G1為式(G-2)所示之基時,作為-SO2-NH-G1-J1,例如可以列舉下述式所示之基。 When G 1 is the formula (G-2) the group shown as -SO 2 -NH-G 1 -J 1 , for example, include a group represented by the following formula.

J1為-NRaRb時,作為-SO2-NH-G1-J1,例如可以列舉下述式所示之基。 When J 1 is -NR a R b , examples of -SO 2 -NH-G 1 -J 1 include a group represented by the following formula.

J1為-NRaRbH+Q-時,作為-SO2-NH-G1-NRaRbH+者,例如可以列舉下述式所示之基。 When J 1 is -NR a R b H + Q - , examples of -SO 2 -NH-G 1 -NR a R b H + include a group represented by the following formula.

Q-是表示鹵化物離子、BF4 -、PF6 -、ClO4 -、X-CO2 -或是Y-SO3 -Q - represents a halide ion, BF 4 - , PF 6 - , ClO 4 - , X-CO 2 - or Y-SO 3 - .

X及Y是表示1價的有機基。作為1價有機基,例如可以列舉:碳數1至20的烷基、碳數3至20的環烷基、 碳數6至20的芳基、及該等所組合之基等。 X and Y are organic groups representing a monovalent group. Examples of the monovalent organic group include an alkyl group having 1 to 20 carbon atoms and a cycloalkyl group having 3 to 20 carbon atoms. An aryl group having 6 to 20 carbon atoms, a group in which these groups are combined, and the like.

作為碳數1至20的烷基,可以列舉:甲基、乙基、丙基、丁基、己基、癸基等。 Examples of the alkyl group having 1 to 20 carbon atoms include a methyl group, an ethyl group, a propyl group, a butyl group, a hexyl group, a decyl group and the like.

作為碳數3至20的環烷基,可以列舉:環丙基、環丁基、環戊基、環己基、環癸基等。 Examples of the cycloalkyl group having 3 to 20 carbon atoms include a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group, and a cyclodecyl group.

作為碳數6至20的芳基,可以列舉:苯基、萘基、蒽基等。 Examples of the aryl group having 6 to 20 carbon atoms include a phenyl group, a naphthyl group, an anthracenyl group and the like.

X-CO2 -是含有CO2 -基的有機物陰離子,Y-SO3 -是含有SO3 -基的有機物陰離子,例如可以列舉:式(Q-1)至式(Q-4)所示陰離子。 X-CO 2 - is an organic anion containing a CO 2 - group, and Y-SO 3 - is an organic anion containing a SO 3 - group, and examples thereof include an anion represented by the formula (Q-1) to the formula (Q-4) .

[Ry表示碳數1至20的烷基。 [R y represents an alkyl group having 1 to 20 carbon atoms.

m表示0至5的整數]。 m represents an integer from 0 to 5.].

作為Q-者,是以X-CO2 -及Y-SO3 -為佳,式(Q-4)所示陰離子為更佳。為該等陰離子時,式(2)所示之化合物對溶劑的溶解性有變高之傾向。 As Q - who, based on X-CO 2 - and Y-SO 3 - preferably, of formula (Q-4) is more preferably an anion shown. In the case of these anions, the solubility of the compound represented by the formula (2) in a solvent tends to be high.

作為式(4)所示之化合物,例如可以列舉:式(2-1)至式(2-92)所示之化合物。式(2-1)至式(2-92)所示之化合物之中,na為2以上的整數時,較佳為複數個-SO2-NH-G1-J1是分別鍵結在不同之苯環。 Examples of the compound represented by the formula (4) include compounds represented by the formula (2-1) to the formula (2-92). In the compound represented by the formula (2-1) to the formula (2-92), when n a is an integer of 2 or more, it is preferred that a plurality of -SO 2 —NH—G 1 —J 1 are bonded to each other. Different benzene rings.

例如,式(2-24)所示之化合物更為具體之 例,可以列舉:式(2-24-1)及式(2-24-2)所示之化合物。 For example, the compound represented by formula (2-24) is more specific Examples thereof include compounds represented by the formula (2-24-1) and the formula (2-24-2).

著色劑(A)含有染料(A3)時,相對於著色劑(A)的總量,染料(A3)的含量是以0.5質量%以上40質量%以下為佳,以0.5質量%以上30質量%以下為更佳。 When the colorant (A) contains the dye (A3), the content of the dye (A3) is preferably 0.5% by mass or more and 40% by mass or less, and preferably 0.5% by mass or more and 30% by mass or less based on the total amount of the coloring agent (A). The following is better.

著色劑(A)是包含氧雜蒽染料(A1)與顏料(A2)的著色劑時,相對於著色劑(A)的總量,此等之含量較佳分別為氧雜蒽染料(A1):0.5質量%以上50質量%以下顏料(A2):50質量%以上99.5質量%以下,更佳為氧雜蒽染料(A1):0.5質量%以上40質量%以下顏料(A2):60質量%以上99.5質量%以下。 When the colorant (A) is a coloring agent containing the xanthene dye (A1) and the pigment (A2), the content of the coloring agent (A) is preferably a xanthene dye (A1), respectively, based on the total amount of the coloring agent (A). 0.5% by mass or more and 50% by mass or less of the pigment (A2): 50% by mass or more and 99.5% by mass or less, more preferably xanthene dye (A1): 0.5% by mass or more and 40% by mass or less of the pigment (A2): 60% by mass The above 99.5 mass% or less.

著色劑(A)是包含氧雜蒽染料(A1)、顏料(A2)及染料(A3)的著色劑時,相對於著色劑(A)的總量,此等之含量較佳分別為氧雜蒽染料(A1):0.5質量%以上50質量%以下顏料(A2):49.5質量%以上99質量%以下染料(A3):0.5質量%以上40質量%以下,更佳為氧雜蒽染料(A1):0.5質量%以上40質量%以下 顏料(A2):59.5質量%以上99質量%以下染料(A3):0.5質量%以上30質量%以下。 When the coloring agent (A) is a coloring agent containing the xanthene dye (A1), the pigment (A2), and the dye (A3), the content of the coloring agent (A) is preferably oxygen mixed with respect to the total amount of the coloring agent (A). Anthraquinone dye (A1): 0.5% by mass or more and 50% by mass or less of pigment (A2): 49.5 mass% or more and 99% by mass or less of dye (A3): 0.5% by mass or more and 40% by mass or less, more preferably xanthene dye (A1) ): 0.5% by mass or more and 40% by mass or less Pigment (A2): 59.5 mass% or more and 99 mass% or less of dye (A3): 0.5 mass% or more and 30 mass% or less.

相對於固形分的總量,著色劑(A)之含量較佳是5至60質量%,更佳是8至55質量%,又更佳是10至50質量%。著色劑(A)之含量在前述範圍內時,作成彩色濾光片時的色濃度充分,而且,因為可使組成物中含有必要量之樹脂(B)或聚合性化合物(C),故可形成機械強度充分的圖案。在此,本說明書中之「固形分的總量」,是指由著色光敏性樹脂組成物的總量除去溶劑的含量之量。固形分的總量及相對於此之各成-分的含量,例如,可以用液體層析法或是氣體層析法等公知的分析手法來測定。 The content of the colorant (A) is preferably from 5 to 60% by mass, more preferably from 8 to 55% by mass, still more preferably from 10 to 50% by mass, based on the total amount of the solid content. When the content of the coloring agent (A) is within the above range, the color density when the color filter is formed is sufficient, and since the necessary amount of the resin (B) or the polymerizable compound (C) can be contained in the composition, A pattern having sufficient mechanical strength is formed. Here, the "total amount of solid content" in the present specification means the amount of the solvent removed by the total amount of the colored photosensitive resin composition. The total amount of the solid fraction and the content of each of the fractions formed thereon can be measured, for example, by a known analytical method such as liquid chromatography or gas chromatography.

〈樹脂(B)〉 <Resin (B)>

樹脂(B)雖無特別限定,但是以鹼可溶性樹脂為佳。作為樹脂(B),例如可以列舉:樹脂[K1]至[K6]。 The resin (B) is not particularly limited, but an alkali-soluble resin is preferred. Examples of the resin (B) include resins [K1] to [K6].

樹脂[K1]:係選自不飽和羧酸及不飽和羧酸酐所成群組中之至少一種(a)(以下有稱為(a)的情形),與具有碳數2至4的環狀醚結構與乙烯性不飽和鍵之單體(b)(以下有稱為(b)的情形)的共聚物;樹脂[K2]:(a)、(b)、與可與(a)共聚合之單體(c)(但是(a)及(b)是相異)(以下有稱為(c)的情形)的共聚物;樹脂[K3]:(a)與(c)的共聚物;樹脂[K4]:使(a)與(c)的共聚物與(b)反應而得之樹脂;樹脂[K5]:使(b)與(c)的共聚物與(a)反應而得之樹脂;樹脂[K6]:使(b)與(c)的共聚物與(a)反應,再與羧酸酐 反應而得之樹脂。 Resin [K1]: at least one selected from the group consisting of unsaturated carboxylic acids and unsaturated carboxylic anhydrides (a) (hereinafter referred to as (a)), and a ring having a carbon number of 2 to 4. a copolymer of an ether structure and a monomer having an ethylenically unsaturated bond (b) (hereinafter referred to as a case of (b)); a resin [K2]: (a), (b), and copolymerizable with (a) a monomer (c) (but (a) and (b) are different) (hereinafter referred to as the case of (c)); a resin [K3]: a copolymer of (a) and (c); Resin [K4]: a resin obtained by reacting the copolymer of (a) and (c) with (b); resin [K5]: reacting the copolymer of (b) and (c) with (a) Resin; resin [K6]: reacting the copolymer of (b) and (c) with (a), and then with carboxylic anhydride The resin obtained by the reaction.

作為(a),具體上,例如可以列舉:丙烯酸、甲基丙烯酸、巴豆酸、鄰-、間-、對-乙烯基苯甲酸等不飽和單羧酸類;馬來酸、富馬酸、檸康酸、中康酸、依康酸、3-乙烯基苯二甲酸、4-乙烯基苯二甲酸、3,4,5,6-四氫苯二甲酸、1,2,3,6-四氫苯二甲酸、二甲基四氫苯二甲酸、1,4-環己烯二羧酸等不飽和羧酸類;甲基-5-降冰片烯-2,3-二羧酸、5-羧基雙環[2.2,1]庚-2-烯、5,6-二羧基雙環[2.2,1]庚-2-烯、5-羧基-5-甲基雙環[2.2,1]庚-2-烯、5-羧基-5-乙基雙環[2.2,1]庚-2-烯、5-羧基-6-甲基雙環[2.2,1]庚-2-烯、5-羧基-6-乙基雙環[2.2,1]庚-2-烯等含有羧基之雙環不飽和化合物類;馬來酸酐、檸康酸酐、依康酸酐、3-乙烯基苯二甲酸酐、4-乙烯基苯二甲酸酐、3,4,5,6-四氫苯二甲酸酐、1,2,3,6-四氫苯二甲酸酐、二甲基四氫苯二甲酸酐、5,6-二羧基雙環[2.2,1]庚-2-烯無水物等不飽和羧酸酐類;琥珀酸單[2-(甲基)丙烯醯氧乙酯]、苯二甲酸單[2-(甲基)丙烯醯氧乙酯]等2價以上的多元羧酸之不飽和單[(甲基)丙烯醯氧烷基]酯類;如α-(羥基甲基)丙烯酸酯之在同一分子中含有羥基及羧基之不飽和丙烯酸酯類。 Specific examples of (a) include unsaturated monocarboxylic acids such as acrylic acid, methacrylic acid, crotonic acid, o-, m-, p-vinylbenzoic acid; maleic acid, fumaric acid, and citrine Acid, mesaconic acid, isoconic acid, 3-vinyl phthalic acid, 4-vinyl phthalic acid, 3,4,5,6-tetrahydrophthalic acid, 1,2,3,6-tetrahydrogen Unsaturated carboxylic acids such as phthalic acid, dimethyltetrahydrophthalic acid, and 1,4-cyclohexene dicarboxylic acid; methyl-5-norbornene-2,3-dicarboxylic acid, 5-carboxybicyclo [2.2,1]hept-2-ene, 5,6-dicarboxybicyclo[2.2,1]hept-2-ene, 5-carboxy-5-methylbicyclo[2.2,1]hept-2-ene, 5 -carboxy-5-ethylbicyclo[2.2,1]hept-2-ene, 5-carboxy-6-methylbicyclo[2.2,1]hept-2-ene, 5-carboxy-6-ethylbicyclo[2.2 , 1] a bicyclic unsaturated compound containing a carboxyl group such as hept-2-ene; maleic anhydride, citraconic anhydride, isaconic anhydride, 3-vinyl phthalic anhydride, 4-vinyl phthalic anhydride, 3, 4,5,6-tetrahydrophthalic anhydride, 1,2,3,6-tetrahydrophthalic anhydride, dimethyltetrahydrophthalic anhydride, 5,6-dicarboxybicyclo[2.2,1] Unsaturated carboxylic anhydrides such as hept-2-ene anhydrate; succinic acid Unsaturated mono[(methyl) propylene oxime of a divalent or higher polycarboxylic acid such as [2-(methyl) propylene oxime) or phthalic acid mono [2-(methyl) propylene oxime] An oxyalkyl]ester; such as an α-(hydroxymethyl) acrylate having an unsaturated acrylate having a hydroxyl group and a carboxyl group in the same molecule.

其中,就共聚合反應性之點或得到之樹脂對鹼水溶液的溶解性之點而言,以丙烯酸、甲基丙烯酸、馬來酸酐等 為佳。 Among them, acrylic acid, methacrylic acid, maleic anhydride, etc., in terms of the point of copolymerization reactivity or the solubility of the obtained resin in an aqueous alkali solution It is better.

(b)是指例如具有碳數2至4的環狀醚結構(例如:選自氧雜環丙烷環、氧雜環丁烷環及四氫呋喃環所成群組中至少一種)與乙烯性不飽和鍵的聚合性化合物。(b)以具有碳數2至4的環狀醚與(甲基)丙烯醯氧基之單體為佳。 (b) means, for example, a cyclic ether structure having a carbon number of 2 to 4 (for example, at least one selected from the group consisting of an oxirane ring, an oxetane ring, and a tetrahydrofuran ring) and ethylenic unsaturation A polymerizable compound of a bond. (b) It is preferred to use a monomer having a cyclic ether having 2 to 4 carbon atoms and a (meth)acryloxy group.

又,本說明書中,「(甲基)丙烯酸」是表示選自丙烯酸及甲基丙烯酸所成群組中之至少一種。「(甲基)丙烯醯基」及「(甲基)丙烯酸酯」等之表示方式也有相同意思。 In the present specification, "(meth)acrylic acid" means at least one selected from the group consisting of acrylic acid and methacrylic acid. The expressions of "(meth)acrylonitrile" and "(meth)acrylate" have the same meaning.

作為(b),例如可以列舉:有氧雜環丙烷基與乙烯性不飽和鍵的單體(b1)(以下有稱為「(b1)」的情形)、有氧雜環丁烷基與乙烯性不飽和鍵的單體(b2)(以下有稱為「(b2)」的情形)、有四氫呋喃基與乙烯性不飽和鍵的單體(b3)(以下有稱為「(b3)」的情形)等。 (b), for example, a monomer (b1) having an oxirane group and an ethylenically unsaturated bond (hereinafter referred to as "(b1)"), an oxetane group and ethylene a monomer (b2) having an unsaturated bond (hereinafter referred to as "(b2)"), a monomer having a tetrahydrofuranyl group and an ethylenically unsaturated bond (b3) (hereinafter referred to as "(b3)") Situation) and so on.

作為(b1),例如可以列舉:具有「直鏈狀或分枝鏈狀的脂肪族不飽和烴被環氧化的結構」之單體(b1-1)(以下有稱為「(b1-1)」的情形)、具有「脂環式不飽和烴被環氧化的結構」之單體(b1-2)(以下有稱為「(b1-2)」的情形)。 (b1), for example, a monomer (b1-1) having a structure in which a linear or branched chain aliphatic unsaturated hydrocarbon is epoxidized (hereinafter referred to as "(b1-1)" In the case of the case, the monomer (b1-2) having a structure in which the alicyclic unsaturated hydrocarbon is epoxidized (hereinafter referred to as "(b1-2)").

作為(b1-1),例如可以列舉:(甲基)丙烯酸縮水甘油酯、(甲基)丙烯酸β-甲基縮水甘油酯、(甲基)丙烯酸β-乙基縮水甘油酯、縮水甘油基乙烯基醚、鄰乙烯基苯甲基縮水甘油基醚、間乙烯基苯甲基縮水甘油基醚、對乙烯基苯甲基縮水甘油基醚、α-甲基-鄰乙烯基苯 甲基縮水甘油基醚、α-甲基-間乙烯基苯甲基縮水甘油基醚、α-甲基-對乙烯基苯甲基縮水甘油基醚、2,3-雙(縮水甘油基氧甲基)苯乙烯、2,4-雙(縮水甘油基氧甲基)苯乙烯、2,5-雙(縮水甘油基氧甲基)苯乙烯、2,6-雙(縮水甘油基氧甲基)苯乙烯、2,3,4-參(縮水甘油基氧甲基)苯乙烯、2,3,5-參(縮水甘油基氧甲基)苯乙烯、2,3,6-參(縮水甘油基氧甲基)苯乙烯、3,4,5-參(縮水甘油基氧甲基)苯乙烯、2,4,6-參(縮水甘油基氧甲基)苯乙烯等。 Examples of (b1-1) include glycidyl (meth)acrylate, β-methylglycidyl (meth)acrylate, β-ethylglycidyl (meth)acrylate, and glycidylethylene. Ether, o-vinylbenzyl glycidyl ether, m-vinylbenzyl glycidyl ether, p-vinylbenzyl glycidyl ether, α-methyl-o-vinylbenzene Methyl glycidyl ether, α-methyl-m-vinylbenzyl glycidyl ether, α-methyl-p-vinylbenzyl glycidyl ether, 2,3-bis(glycidyloxy) Styrene, 2,4-bis(glycidyloxymethyl)styrene, 2,5-bis(glycidyloxymethyl)styrene, 2,6-bis(glycidyloxymethyl) Styrene, 2,3,4-glycol (glycidyloxymethyl)styrene, 2,3,5-gin (glycidyloxymethyl)styrene, 2,3,6-gin (glycidyl) Oxymethyl)styrene, 3,4,5-gin (glycidyloxymethyl)styrene, 2,4,6-gin (glycidyloxymethyl)styrene, and the like.

作為(b1-2),例如可以列舉:乙烯基環己烯單氧化物、1,2-環氧基-4-乙烯基環己烷(例如,CELLOXIDE 2000;Daicel股份有限公司製)、3,4-環氧基環己基甲基(甲基)丙烯酸酯(例如,CYCLOMER A-400;Daicel股份有限公司製)、3,4-環氧基環己基甲基(甲基)丙烯酸酯(例如,CYCLOMER M-100;Daicel股份有限公司製)、式(I)所示之化合物、式(II)所示之化合物等。 (b1-2), for example, vinylcyclohexene monooxide, 1,2-epoxy-4-vinylcyclohexane (for example, CELLOXIDE 2000; manufactured by Daicel Co., Ltd.), 3, 4-epoxycyclohexylmethyl (meth) acrylate (for example, CYCLOMER A-400; manufactured by Daicel Co., Ltd.), 3,4-epoxycyclohexylmethyl (meth) acrylate (for example, CYCLOMER M-100; manufactured by Daicel Co., Ltd.), a compound represented by the formula (I), a compound represented by the formula (II), and the like.

[式(I)及(II)中,Ra及Rb表示氫原子、或是碳數1至4的烷基,在該烷基中含有之氫原子亦可經羥基取代。 In the formulae (I) and (II), R a and R b each represent a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, and a hydrogen atom contained in the alkyl group may be substituted with a hydroxyl group.

Xa及Xb表示是單鍵、-RC-、*-RC-O-、*-RC-S-、或是*-RC-NH-。 X a and X b represents a single bond, -R C -, * - R C -O -, * - R C -S-, or * -R C -NH-.

RC表示碳數1至6的烷烴二基。 R C represents an alkanediyl group having 1 to 6 carbon atoms.

*表示與O的結合鍵]。 * indicates a bond with O].

作為碳數1至4的烷基,可以列舉:甲基、乙基、正丙基、異丙基、正丁基、二級丁基、三級丁基等。 Examples of the alkyl group having 1 to 4 carbon atoms include a methyl group, an ethyl group, a n-propyl group, an isopropyl group, a n-butyl group, a secondary butyl group, and a tertiary butyl group.

作為氫原子被羥基取代的烷基,可以列舉:羥基甲基、1-羥基乙基、2-羥基乙基、1-羥基丙基、2-羥基丙基、3-羥基丙基、1-羥基-1-甲基乙基、2-羥基-1-甲基乙基、1-羥基丁基、2-羥基丁基、3-羥基丁基、4-羥基丁基等。 Examples of the alkyl group in which the hydrogen atom is substituted by a hydroxyl group include a hydroxymethyl group, a 1-hydroxyethyl group, a 2-hydroxyethyl group, a 1-hydroxypropyl group, a 2-hydroxypropyl group, a 3-hydroxypropyl group, and a 1-hydroxy group. 1-methylethyl, 2-hydroxy-1-methylethyl, 1-hydroxybutyl, 2-hydroxybutyl, 3-hydroxybutyl, 4-hydroxybutyl, and the like.

作為Ra及Rb者,較佳者是可以列舉:氫原子、甲基、羥基甲基、1-羥基乙基及2-羥基乙基,更佳者可以列舉:氫原子及甲基。 Examples of R a and R b include a hydrogen atom, a methyl group, a hydroxymethyl group, a 1-hydroxyethyl group and a 2-hydroxyethyl group, and more preferred examples thereof include a hydrogen atom and a methyl group.

作為烷烴二基,可以列舉:亞甲基、伸乙基、丙烷-1,2-二基、丙烷-1,3-二基、丁烷-1,4-二基、伸戊烷-1,5-二基、伸己烷-1,6-二基等。 Examples of the alkanediyl group include a methylene group, an ethylidene group, a propane-1,2-diyl group, a propane-1,3-diyl group, a butane-1,4-diyl group, and a pentane-1. 5-diyl, hexane-1,6-diyl, and the like.

作為Xa及Xb者,較佳者可以列舉:單鍵、亞甲基、伸乙基、*-CH2-O-、及*-CH2CH2-O-,更佳者可以列舉:單鍵、*-CH2CH2-O-(*表示與O的結合鍵)。 As X a and X b are, may preferably include: a single bond, methylene, ethyl stretch, * - CH 2 -O-, and * -CH 2 CH 2 -O-, more preferably may include: Single bond, *-CH 2 CH 2 -O- (* indicates a bond with O).

作為式(1)所示之化合物,可以列舉:式(I-1)至(I-15)之任一者所示之化合物等。其中,以式(I-1)、式(I-3)、式(I-5)、式(I-7)、式(I-9)或式(I-11)至式(I-15)所示之化合物為較佳,以式(I-1)、式(I-7)、式(I-9)、或式(I-15)所示之化合物為更佳。 The compound represented by the formula (1) may, for example, be a compound represented by any one of the formulae (I-1) to (I-15). Wherein, the formula (I-1), the formula (I-3), the formula (I-5), the formula (I-7), the formula (I-9) or the formula (I-11) to the formula (I-15) The compound shown is preferably a compound represented by the formula (I-1), the formula (I-7), the formula (I-9), or the formula (I-15).

作為式(II)所示之化合物,可以列舉:式(II-1)至(II-15)之任一者所示之化合物。其中,以式(II-1)、式(II-3)、式(II-5)、式(II-7)、式(II-9)或式(II-11)至式(II-15)所示之化合物為佳,以式(II-1)、式(II-7)、式(II-9)、或式(II-15)所示之化合物為更佳。 The compound represented by the formula (II) may, for example, be a compound represented by any one of the formulae (II-1) to (II-15). Wherein, using formula (II-1), formula (II-3), formula (II-5), formula (II-7), formula (II-9) or formula (II-11) to formula (II-15) The compound shown is preferably a compound represented by the formula (II-1), the formula (II-7), the formula (II-9), or the formula (II-15).

式(I)所示之化合物及式(II)所示之化合物,可以分別單獨使用,也可以併用2種以上。併用式(I)所示之化合物及式(II)所示之化合物時,以莫耳基準計,該等之含有比率[式(I)所示之化合物:式(II)所示之化合物]較佳是5:95至95:5,更佳是20:80至80:20。 The compound represented by the formula (I) and the compound represented by the formula (II) may be used alone or in combination of two or more. When a compound represented by the formula (I) and a compound represented by the formula (II) are used in combination, the content ratio of the compound [the compound represented by the formula (I): the compound represented by the formula (II)] is based on the molar basis. It is preferably 5:95 to 95:5, more preferably 20:80 to 80:20.

作為(b2),以具有氧雜環丁烷基與(甲基)丙 烯醯氧基的單體為較佳。作為(b2),可以列舉:3-甲基-3-甲基丙烯醯氧基甲基氧雜環丁烷、3-甲基-3-丙烯醯氧基甲基氧雜環丁烷、3-乙基-3-甲基丙烯醯氧基甲基氧雜環丁烷、3-乙基-3-丙烯醯氧基甲基氧雜環丁烷、3-甲基-3-甲基丙烯醯氧基乙基氧雜環丁烷、3-甲基-3-丙烯醯氧基乙基氧雜環丁烷、3-乙基-3-甲基丙烯醯氧基乙基氧雜環丁烷、3-乙基-3-丙烯醯氧基乙基氧雜環丁烷等。 As (b2), with oxetane and (methyl) propyl A monomer having an oxiranyloxy group is preferred. Examples of (b2) include 3-methyl-3-methylpropenyloxymethyloxetane, 3-methyl-3-propenyloxymethyloxetane, and 3- Ethyl-3-methylpropenyloxymethyloxetane, 3-ethyl-3-propenyloxymethyloxetane, 3-methyl-3-methylpropene oxime Ethyloxyoxetane, 3-methyl-3-propenyloxyethyloxetane, 3-ethyl-3-methylpropenyloxyethyloxetane, 3 Ethyl-3-propenyloxyethyloxetane and the like.

作為(b3),以具有四氫呋喃基與(甲基)丙烯醯氧基的單體為較佳。作為(b3),具體可以列舉:丙烯酸四氫呋喃酯(例如,Biscoat v#150,大阪有機化學工業股份有限公司製),丙烯酸四氫呋喃基甲酯等。 As (b3), a monomer having a tetrahydrofuranyl group and a (meth)acryloxy group is preferred. Specific examples of (b3) include tetrahydrofuran acrylate (for example, Biscoat v #150, manufactured by Osaka Organic Chemical Industry Co., Ltd.), tetrahydrofuranylmethyl acrylate, and the like.

就得到彩色濾光片的耐熱性、化學抗性等的可信度可更提高之點而言,(b)係以(b1)為佳。又,就著色光敏性樹脂組成物的保存安定性優良之點而言,係以(b1-2)為佳。 In view of the fact that the reliability of heat resistance and chemical resistance of the color filter can be further improved, (b) is preferably (b1). Further, in terms of excellent storage stability of the colored photosensitive resin composition, (b1-2) is preferred.

作為(c),例如可以列舉:(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸正丁酯、(甲基)丙烯酸二級丁酯、(甲基)丙烯酸三級丁酯、(甲基)丙烯酸2-乙基己酯、(甲基)丙烯酸癸酯、(甲基)丙烯酸月桂酯、(甲基)丙烯酸硬脂酯、(甲基)丙烯酸環戊酯、(甲基)丙烯酸環己酯、(甲基)丙烯酸2-甲基環己酯、三環[5.2.1.02.6]癸烷-8-基(甲基)丙烯酸酯(該技術領域之慣用名,有稱為「(甲基)丙烯酸二環戊酯」,或有稱為「(甲基)丙烯酸三環癸酯」的情形)、(甲基)丙烯酸三環[5.2.1.02.6]癸烯-8-基酯(該技術領 域之慣用名,係稱為「(甲基)丙烯酸二環戊酯」)、(甲基)丙烯酸二環戊基氧基乙酯、(甲基)丙烯酸異冰片酯、(甲基)丙烯酸金剛烷酯、(甲基)丙烯酸烯丙酯、(甲基)丙烯酸炔丙酯、(甲基)丙烯酸苯酯、(甲基)丙烯酸萘酯、(甲基)丙烯酸基酯等(甲基)丙烯酸酯類;(甲基)丙烯酸2-羥基乙酯、(甲基)丙烯酸2-羥基丙酯等含羥基之(甲基)丙烯酸酯類;馬來酸二乙酯、富馬酸二乙酯、衣康酸二乙酯等二羧酸二酯;雙環[2.2.1]庚-2-烯、5-甲基雙環[2.2.1]庚-2-烯、5-乙基雙環[2.2.1]庚-2-烯、5-羥基雙環[2.2.1]庚-2-烯、5-羥基甲基雙環[2.2.1]庚-2-烯、5-(2'-羥基乙基)雙環[2.2.1]庚-2-烯、5-甲氧基雙環[2.2.1]庚-2-烯、5-乙氧基雙環[2.2.1]庚-2-烯、5,6-二羥基雙環[2.2.1]庚-2-烯、5,6-二(羥基甲基)雙環[2.2.1]庚-2-烯、5,6-二(2'-羥基乙基)雙環[2.2.1]庚-2-烯、5,6-二甲氧基羥雙環[2.2.1]庚-2-烯、5,6-二乙氧基雙環[2.2.1]庚-2-烯、5-羥基-5-甲基雙環[2.2.1]庚-2-烯、5-羥基-5-乙基雙環[2.2.1]庚-2-烯、5-羥基甲基-5-甲基雙環[2.2.1]庚-2-烯、5-三級丁氧基羰基雙環[2.2.1]庚-2-烯、5-環己基氧基羰基雙環[2.2.1]庚-2-烯、5-苯氧基羰基雙環[2.2.1]庚-2-烯、5,6-雙(三級丁氧基羰基)雙環[2.2.1]庚-2-烯、5,6-雙(環己氧基羰基)雙環[2.2.1]庚-2-烯等雙環不飽和化合物類;N-苯基馬來醯亞胺、N-環己基馬來醯亞胺、N-苯甲基馬來醯亞胺、N-琥珀醯亞胺基-3-馬來醯亞胺苯甲酸酯、N- 琥珀醯亞胺基-4-馬來醯亞胺丁酸酯、N-琥珀醯亞胺基-6-馬來醯亞胺己酸酯、N-琥珀醯亞胺基-3-馬來醯亞胺丙酸酯、N-(9-吖啶基)馬來醯亞胺(N-(9-Acridinyl)maleimide)等二羰基醯亞胺衍生物類;苯乙烯、α-甲基苯乙烯、間甲基苯乙烯、對甲基苯乙烯、乙烯基甲苯、對甲氧基苯乙烯、丙烯腈、甲基丙烯腈、氯化乙烯、氯化亞乙烯、丙烯醯胺、甲基丙烯醯胺、乙酸乙烯酯、1,3-丁二烯、異戊二烯、2,3-二甲基-1,3-丁二烯等。 Examples of (c) include methyl (meth)acrylate, ethyl (meth)acrylate, n-butyl (meth)acrylate, n-butyl (meth)acrylate, and (meth)acrylic acid III. Butyl methacrylate, 2-ethylhexyl (meth) acrylate, decyl (meth) acrylate, lauryl (meth) acrylate, stearyl (meth) acrylate, cyclopentyl (meth) acrylate, Cyclohexyl (meth) acrylate, 2-methylcyclohexyl (meth) acrylate, tricyclo [5.2.1.0 2.6 ] decane-8-yl (meth) acrylate (a common name in the art, There is a case called "dicyclopentanyl (meth)acrylate", or a case called "tricyclodecyl (meth)acrylate), tricyclo[methyl]acrylic acid [5.2.1.0 2.6 ]nonene- 8-Base ester (a commonly used name in the art is referred to as "dicyclopentyl (meth)acrylate)", dicyclopentyloxyethyl (meth)acrylate, isobornyl (meth)acrylate , adamantyl (meth) acrylate, allyl (meth) acrylate, propargyl (meth) acrylate, phenyl (meth) acrylate, naphthyl (meth) acrylate, (meth) acrylate (meth)acrylates such as esters; (meth)acrylic acid 2 a hydroxyl group-containing (meth) acrylate such as hydroxyethyl ester or 2-hydroxypropyl (meth)acrylate; dicarboxylate such as diethyl maleate, diethyl fumarate or diethyl itaconate; Acid diester; bicyclo[2.2.1]hept-2-ene, 5-methylbicyclo[2.2.1]hept-2-ene, 5-ethylbicyclo[2.2.1]hept-2-ene, 5- Hydroxybicyclo[2.2.1]hept-2-ene, 5-hydroxymethylbicyclo[2.2.1]hept-2-ene, 5-(2'-hydroxyethyl)bicyclo[2.2.1]hept-2- Alkene, 5-methoxybicyclo[2.2.1]hept-2-ene, 5-ethoxybicyclo[2.2.1]hept-2-ene, 5,6-dihydroxybicyclo[2.2.1]heptane- 2-ene, 5,6-di(hydroxymethyl)bicyclo[2.2.1]hept-2-ene, 5,6-bis(2'-hydroxyethyl)bicyclo[2.2.1]hept-2-ene , 5,6-dimethoxyhydroxybicyclo[2.2.1]hept-2-ene, 5,6-diethoxybicyclo[2.2.1]hept-2-ene, 5-hydroxy-5-methyl Bicyclo[2.2.1]hept-2-ene, 5-hydroxy-5-ethylbicyclo[2.2.1]hept-2-ene, 5-hydroxymethyl-5-methylbicyclo[2.2.1]heptane- 2-ene, 5-tris-butoxycarbonylbicyclo[2.2.1]hept-2-ene, 5-cyclohexyloxycarbonylbicyclo[2.2.1]hept-2-ene, 5-phenoxycarbonylbicyclo [2.2.1] Hept-2-ene, 5,6-bis(tertiary butoxycarbonyl)bicyclo[2.2.1]hept-2-ene, 5,6-bis ( Bicyclic unsaturated compounds such as hexyloxycarbonyl)bicyclo[2.2.1]hept-2-ene; N-phenylmaleimide, N-cyclohexylmaleimide, N-benzylmaline Yttrium imine, N-succinimide-3-maleimide benzoate, N-amber succinimide-4-maleimide butyrate, N-succinimide -6-maleimide caproate, N-succinimide-3-maleimide propionate, N-(9-acridinyl)maleimide (N-(9) -Acridinyl)maleimide) and other dicarbonyl ruthenium derivatives; styrene, α-methylstyrene, m-methylstyrene, p-methylstyrene, vinyltoluene, p-methoxystyrene, acrylonitrile , methacrylonitrile, ethylene chloride, vinylidene chloride, acrylamide, methacrylamide, vinyl acetate, 1,3-butadiene, isoprene, 2,3-dimethyl- 1,3-butadiene and the like.

此等之中,就共聚合反應性及耐熱性之點而言,以苯乙烯、乙烯基甲苯、N-苯基馬來醯亞胺、N-環己基馬來醯亞胺、N-苯甲基馬來醯亞胺、雙環[2.2.1]庚-2-烯等為佳。 Among these, in terms of copolymerization reactivity and heat resistance, styrene, vinyl toluene, N-phenyl maleimide, N-cyclohexylmaleimide, N-benzoic acid are used. Preferably, carbamazepine, bicyclo[2.2.1]hept-2-ene, and the like.

就樹脂[K1]而言,在構成樹脂[K1]的全結構單元中,各來源之結構單元的比率,較佳為源自(a)的結構單元:2至60莫耳%源自(b)的結構單元:40至98莫耳%,而更佳為源自(a)的結構單元:10至50莫耳%源自(b)的結構單元:50至90莫耳%。 In the case of the resin [K1], in the total structural unit constituting the resin [K1], the ratio of the structural unit of each source is preferably a structural unit derived from (a): 2 to 60 mol% derived from (b) The structural unit: 40 to 98 mol%, and more preferably the structural unit derived from (a): 10 to 50 mol% of the structural unit derived from (b): 50 to 90 mol%.

樹脂[K1]的結構單元比率在上述範圍時,著色光敏性樹脂組成物的保存安定性、形成著色圖案時的顯影性、及所得到之彩色濾光片的耐溶劑性有優良的傾向。 When the structural unit ratio of the resin [K1] is in the above range, the storage stability of the colored photosensitive resin composition, the developability in forming a colored pattern, and the solvent resistance of the obtained color filter tend to be excellent.

樹脂[K1],例如,可以參考在文獻「高分子合成的實驗法」(大津隆行著發行處化學同人股份有限公司第1版第1刷1972年3月1日發行)中記載的方法及該文獻中記載之引用文獻而製造。 Resin [K1], for example, can be referred to the method described in the "Experimental Method for Polymer Synthesis" (Otsuya Ryokan, Chemicals Co., Ltd., 1st Edition, 1st, 1st, 1972, March 1st). Manufactured by references cited in the literature.

具體而言,係將預定量的(a)及(b)、聚合起始劑及溶劑等放入反應容器中,例如可以列舉:藉由以氮氣取代氧氣而設成脫氧氣體環境,且一面攪拌、一面加熱保溫的方法。又,在此所使用的聚合起始劑及溶劑等並無特別限定,可以使用該技術領域通常使用者。例如,作為聚合起始劑,可以列舉:偶氮化合物(2,2'-偶氮雙異丁腈、2,2'-偶氮雙(2,4-二甲基戊腈)等)或有機過氧化物(過氧化苯甲醯等),作為溶劑,只要是可以溶解各單體者即可,作為本發明之著色光敏性樹脂組成物的溶劑(E),可以列舉後述之溶劑等。 Specifically, a predetermined amount of (a) and (b), a polymerization initiator, a solvent, and the like are placed in a reaction vessel, and for example, a deoxidizing gas atmosphere is set by substituting nitrogen gas for oxygen, and stirring is performed while stirring. One method of heating and keeping warm. Moreover, the polymerization initiator, the solvent, and the like used herein are not particularly limited, and those skilled in the art can be used. For example, examples of the polymerization initiator include an azo compound (2,2'-azobisisobutyronitrile, 2,2'-azobis(2,4-dimethylvaleronitrile), etc.) or organic. The solvent (E) which is a composition of the colored photosensitive resin of the present invention is a solvent (E), and a solvent to be described later.

又,得到之共聚物係可以直接使用此反應後的溶液,亦可使用經過濃縮或稀釋的溶液,也可以使用經過以再沉澱等方法取出成為固體(粉體)者。尤其,因為在此聚合時之溶劑,是使用本發明之著色光敏性樹脂組成物中所含有的溶劑,藉此可將反應後的溶液直接用於調製本發明之著色光敏性樹脂組成物,故可以簡略本發明之著色光敏性樹脂組成物的製造步驟。 Further, the copolymer obtained may be used as it is, or a solution obtained by concentration or dilution may be used, or a solid (powder) may be taken out by reprecipitation or the like. In particular, since the solvent used in the polymerization is a solvent contained in the composition of the colored photosensitive resin of the present invention, the solution after the reaction can be directly used for preparing the colored photosensitive resin composition of the present invention. The manufacturing steps of the colored photosensitive resin composition of the present invention can be simplified.

樹脂[K2]中,在構成樹脂[K2]的全部結構單元中,各來源之結構單元的比率,較佳為源自(a)的結構單元:2至45莫耳%源自(b)的結構單元:2至95莫耳%源自(c)的結構單元:1至65莫耳%,更佳為源自(a)的結構單元:5至40莫耳%源自(b)的結構單元:5至80莫耳% 源自(c)的結構單元:5至60莫耳%。 In the resin [K2], in all the structural units constituting the resin [K2], the ratio of the structural units of each source is preferably a structural unit derived from (a): 2 to 45 mol% derived from (b) Structural unit: 2 to 95 mol% of structural unit derived from (c): 1 to 65 mol%, more preferably structural unit derived from (a): 5 to 40 mol% derived from the structure of (b) Unit: 5 to 80 mol% The structural unit derived from (c): 5 to 60 mol%.

樹脂[K2]的結構單元之比率在上述範圍內時,著色光敏性樹脂組成物的保存安定性、形成著色圖案時的顯影性、以及得到之彩色濾光片的耐溶劑性、耐熱性及機械強度有優良的傾向。 When the ratio of the structural unit of the resin [K2] is within the above range, the storage stability of the colored photosensitive resin composition, the developability when forming a colored pattern, and the solvent resistance, heat resistance and mechanical properties of the obtained color filter The strength has an excellent tendency.

樹脂[K2],例如,可以用與作為樹脂[K1]的製造方法而記載之方法相同之方式製造。 The resin [K2] can be produced, for example, in the same manner as the method described in the production method of the resin [K1].

樹脂[K3]中,在構成樹脂[K3]的全部結構單元中,各來源之結構單元的比率,較佳為源自(a)的結構單元:2至60莫耳%源自(c)的結構單元:40至98莫耳%,而更佳為源自(a)的結構單元:10至50莫耳%源自(c)的結構單元:50至90莫耳%。 In the resin [K3], in all the structural units constituting the resin [K3], the ratio of the structural units of each source is preferably a structural unit derived from (a): 2 to 60 mol% derived from (c) The structural unit: 40 to 98 mol%, and more preferably the structural unit derived from (a): 10 to 50 mol% of the structural unit derived from (c): 50 to 90 mol%.

樹脂[K3],例如,可以用與作為樹脂[K1]的製造方法而記載之方法相同之方式製造。 The resin [K3] can be produced, for example, in the same manner as the method described in the production method of the resin [K1].

樹脂[K4],於得到(a)與(c)的共聚物後,藉由使(a)所具有之羧酸及/或羧酸酐加成至具有碳數2至4的環狀醚之(b)即可而製造。 Resin [K4], after obtaining the copolymer of (a) and (c), by adding the carboxylic acid and/or carboxylic anhydride having (a) to a cyclic ether having a carbon number of 2 to 4 ( b) can be manufactured.

首先,使用與製造樹脂[K1]的方法所記載之同樣方法製造(a)與(c)的共聚物。此時,各來源之結構單元的比率,以與樹脂[K3]所列舉的比率相同的比率為佳。 First, the copolymers of (a) and (c) were produced in the same manner as described in the method for producing the resin [K1]. At this time, the ratio of the structural units of each source is preferably the same ratio as the ratio exemplified by the resin [K3].

其次,使(b)之具有碳數2至4的環狀醚與前述共聚物中之源自(a)的羧酸及/或羧酸酐之一部份反應。 Next, the cyclic ether having a carbon number of 2 to 4 in (b) is reacted with a part of the carboxylic acid and/or carboxylic anhydride derived from (a) in the above copolymer.

在製造(a)與(c)的共聚物之後,將燒瓶內之氣體環境由 氮氣取代成空氣,將(b)、羧酸或是羧酸酐與環狀醚之反應觸媒(例如參(二甲基胺基甲基)酚(phenol)等)及聚合抑制劑(例如氫醌等)等放入燒瓶內,例如藉由在60至130℃反應1至10小時,即可以製造樹脂[K4]。 After the copolymer of (a) and (c) is produced, the gas atmosphere in the flask is Substituting nitrogen for air, reacting (b), a carboxylic acid or a reaction agent of a carboxylic anhydride with a cyclic ether (for example, phenol (phenol), etc.) and a polymerization inhibitor (such as hydroquinone) The resin [K4] can be produced by, for example, being placed in a flask, for example, by reacting at 60 to 130 ° C for 1 to 10 hours.

相對於(a)100莫耳,(b)的使用量是以5至80莫耳為佳,更佳的是10至75莫耳。藉由設為該範圍,著色光敏性樹脂組成物的保存安定性、形成圖案之際的顯影性、以及所得到之圖案的耐溶劑性、耐熱性、機械強度及靈敏度的平衡有變良好的傾向。由於環狀醚的反應性高,未反應的(b)不易殘存,故樹脂[K4]中所使用的(b),是以(b1)為佳,以(b1-1)為更佳。 The amount of (b) used is preferably from 5 to 80 moles, more preferably from 10 to 75 moles, relative to (a) 100 moles. By setting it as the range, the storage stability of the colored photosensitive resin composition, the developability at the time of pattern formation, and the balance of solvent resistance, heat resistance, mechanical strength, and sensitivity of the obtained pattern tend to be improved. . Since the reactivity of the cyclic ether is high and the unreacted (b) does not easily remain, the (b) used in the resin [K4] is preferably (b1), more preferably (b1-1).

相對於(a)、(b)及(c)的合計量100質量份,前述反應觸媒的使用量是以0.001至5質量份為佳。相對於(a)、(b)及(c)的合計100質量份,前述聚合抑制劑的使用量是以0.001至5質量份為佳。 The amount of the above-mentioned reaction catalyst used is preferably 0.001 to 5 parts by mass based on 100 parts by mass of the total of (a), (b) and (c). The amount of the polymerization inhibitor to be used is preferably 0.001 to 5 parts by mass based on 100 parts by mass of the total of (a), (b) and (c).

放入方法、反應溫度及時間等反應條件,係可考慮製造設備或聚合所造成的發熱量等而適當調整。又,可與聚合條件同樣地考慮到製造設備或聚合所造成的發熱量等,而適當調整放入方法和反應溫度。 The reaction conditions such as the method, the reaction temperature, and the time can be appropriately adjusted in consideration of the amount of heat generated by the production equipment or the polymerization. Moreover, the charging method and the reaction temperature can be appropriately adjusted in consideration of the heat generation amount by the production equipment or the polymerization in the same manner as the polymerization conditions.

樹脂[K5],第一階段係進行與上述之樹脂[K1]的製造方法相同的操作,得到(b)與(c)的共聚物。可與上述相同,得到的共聚物,可以直接使用反應後的溶液,亦可使用經過濃縮或稀釋的溶液,也可以使用以再沉澱等方法所取出之固體(粉體)。 In the first step of the resin [K5], the same operation as the above-described method for producing the resin [K1] was carried out to obtain a copolymer of (b) and (c). In the same manner as described above, the obtained copolymer may be used as it is, or a concentrated or diluted solution may be used, or a solid (powder) taken out by a method such as reprecipitation may be used.

相對於構成前述之共聚物的全部結構單元的合計莫耳數,源自(b)及(c)的結構單元之比率,較佳是分別為源自(b)的結構單元:5至95莫耳%源自(c)的結構單元:5至95莫耳%,而以源自(b)的結構單元:10至90莫耳%源自(c)的結構單元:10至90莫耳%為更佳。 The ratio of the structural units derived from (b) and (c) with respect to the total number of moles of all the structural units constituting the aforementioned copolymer is preferably a structural unit derived from (b): 5 to 95 The ear % is derived from the structural unit of (c): 5 to 95 mol%, and the structural unit derived from (b): 10 to 90 mol% of the structural unit derived from (c): 10 to 90 mol% For better.

又,以與樹脂[K4]的製造方法相同的條件,可藉由使(b)與(c)共聚物所具有的源自(b)之環狀醚與(a)所具有之羧酸或羧酸酐反應,而得到樹脂[K5]。 Further, under the same conditions as the method for producing the resin [K4], the cyclic ether derived from (b) and the carboxylic acid (a) possessed by the copolymers (b) and (c) may be used. The carboxylic anhydride is reacted to obtain a resin [K5].

相對於(b)100莫耳,與前述共聚物反應之(a)的使用量是以5至80莫耳為佳。因為環狀醚之反應性高,不易殘存未反應的(b),故使用在樹脂[K5]的(b),是以(b1)為較佳,以(b1-1)為更佳。 The amount of (a) to be reacted with the aforementioned copolymer is preferably from 5 to 80 moles relative to (b) 100 moles. Since the cyclic ether has high reactivity and does not easily remain unreacted (b), (b) used in the resin [K5] is preferably (b1), more preferably (b1-1).

樹脂[K6],是進一步使羧酸酐對樹脂[K5]反應的樹脂。 The resin [K6] is a resin which further reacts the carboxylic anhydride with the resin [K5].

使藉由環狀醚與羧酸或羧酸酐的反應而產生的羥基與羧酸酐反應。 The hydroxyl group produced by the reaction of a cyclic ether with a carboxylic acid or a carboxylic anhydride is reacted with a carboxylic acid anhydride.

作為羧酸酐,可以列舉:馬來酸酐、檸康酸酐、衣康酸酐、3-乙烯基苯二甲酸酐、4-乙烯基苯二甲酸酐、3,4,5,6-四氫苯二甲酸酐、1,2,3,6-四氫苯二甲酸酐、二甲基四氫苯二甲酸酐、5,6-二羰基雙環[2.2.1]庚-2-烯無水物等。相對於(a)的使用量1莫耳,羧酸酐的使用量是以0.5至1莫耳為佳。 Examples of the carboxylic anhydride include maleic anhydride, citraconic anhydride, itaconic anhydride, 3-vinylphthalic anhydride, 4-vinylphthalic anhydride, and 3,4,5,6-tetrahydrophthalic acid. Anhydride, 1,2,3,6-tetrahydrophthalic anhydride, dimethyltetrahydrophthalic anhydride, 5,6-dicarbonylbicyclo[2.2.1]hept-2-ene anhydrate, and the like. The amount of the carboxylic anhydride used is preferably from 0.5 to 1 mol per mol of the amount of (a) used.

作為樹脂(B)者,具體而言可以列舉:(甲基) 丙烯酸3,4-環氧基環己基甲酯/(甲基)丙烯酸共聚物、丙烯酸3,4-環氧基三環[5.2.1.02.6]癸酯/(甲基)丙烯酸共聚物等的樹脂[K1];(甲基)丙烯酸縮水甘油酯/(甲基)丙烯酸苯甲酯/(甲基)丙烯酸共聚物、(甲基)丙烯酸縮水甘油酯/苯乙烯/(甲基)丙烯酸共聚物、丙烯酸3,4-環氧基三環[5.2.1.02.6]癸酯/(甲基)丙烯酸/N-環己基馬來醯亞胺共聚物、3-甲基-3-(甲基)丙烯醯氧基甲基氧雜環丁烷/(甲基)丙烯酸/苯乙烯共聚物等的樹脂[K2];(甲基)丙烯酸苯甲酯/(甲基)丙烯酸共聚物、苯乙烯/(甲基)丙烯酸共聚物等的樹脂[K3];在(甲基)丙烯酸苯甲酯/(甲基)丙烯酸共聚物加成(甲基)丙烯酸縮水甘油酯的樹脂、在(甲基)丙烯酸三環癸酯/苯乙烯/(甲基)丙烯酸共聚物中加成(甲基)丙烯酸縮水甘油酯的樹脂、在(甲基)丙烯酸三環癸酯/(甲基)丙烯酸苯甲酯/(甲基)丙烯酸共聚物中加成(甲基)丙烯酸縮水甘油酯之樹脂等的樹脂[K4];使(甲基)丙烯酸對(甲基)丙烯酸三環癸酯/(甲基)丙烯酸縮水甘油酯的共聚物反應的樹脂、使(甲基)丙烯酸對(甲基)丙烯酸三環癸酯/苯乙烯/(甲基)丙烯酸縮水甘油酯之共聚物反應之樹脂等的樹脂[K5];使(甲基)丙烯酸對(甲基)丙烯酸三環癸酯/(甲基)丙烯酸縮水甘油酯的共聚物反應的樹脂,再與四氫苯二甲酸酐反應之樹脂等的樹脂[K6]等。 Specific examples of the resin (B) include (meth)acrylic acid 3,4-epoxycyclohexylmethyl ester/(meth)acrylic acid copolymer, and acrylic 3,4-epoxytricyclo[5.2. .1.0 2.6 ] Resin of oxime ester/(meth)acrylic acid copolymer [K1]; glycidyl (meth)acrylate / benzyl (meth)acrylate / (meth)acrylic acid copolymer, (methyl Glycidyl acrylate/styrene/(meth)acrylic acid copolymer, 3,4-epoxytricyclo[5.2.1.0 2.6 ]decyl acrylate/(meth)acrylic acid/N-cyclohexylmalazone Amine copolymer, resin such as 3-methyl-3-(meth)acryloxymethyloxybutane/(meth)acrylic acid/styrene copolymer [K2]; benzene (meth)acrylate a resin such as a methyl ester/(meth)acrylic acid copolymer or a styrene/(meth)acrylic acid copolymer [K3]; a copolymer of benzyl (meth)acrylate/(meth)acrylic acid (methyl) a resin of glycidyl acrylate, a resin obtained by adding glycidyl (meth)acrylate to a tricyclodecyl (meth) acrylate/styrene/(meth)acrylic acid copolymer, in (meth)acrylic acid Cyclodecyl ester / benzyl (meth) acrylate / (A a resin obtained by adding a resin such as glycidyl (meth)acrylate to an acrylic copolymer [K4]; a (meth)acrylic acid to tricyclodecyl (meth)acrylate/glycidyl (meth)acrylate a resin which reacts with a copolymer, a resin which reacts a copolymer of (meth)acrylic acid with tricyclodecyl (meth)acrylate/styrene/glycidyl (meth)acrylate, and the like [K5]; A resin obtained by reacting a copolymer of acrylic acid with tricyclodecyl (meth)acrylate/glycidyl (meth)acrylate, a resin such as a resin which is reacted with tetrahydrophthalic anhydride, or the like [K6].

其中,樹脂(B)較佳為含有下述結構單元之的共聚物:源自選自不飽和羧酸及不飽和羧酸酐所成群組中之至少一種之結構單元,與源自具有碳數2至4的環狀 醚結構與乙烯性不飽和鍵的單體之結構單元;亦即,以樹脂[K1]及樹脂[K2]為佳。 Among them, the resin (B) is preferably a copolymer containing a structural unit derived from at least one selected from the group consisting of an unsaturated carboxylic acid and an unsaturated carboxylic anhydride, and derived from a carbon number. 2 to 4 ring A structural unit of a monomer having an ether structure and an ethylenically unsaturated bond; that is, a resin [K1] and a resin [K2] are preferred.

樹脂(B)的聚苯乙烯換算重量平均分子量,較佳是3,000至100,000,更佳的是5,000至50,000,又更佳的是5,000至30,000,特佳的是5,000至12,000。分子量在前述範圍內時,彩色濾光片的硬度提高,對未曝光部的顯影液之溶解性良好,在顯影後的顯影液中,源自著色光敏性樹脂組成物的剝離片的產生有變少的傾向。 The polystyrene-equivalent weight average molecular weight of the resin (B) is preferably from 3,000 to 100,000, more preferably from 5,000 to 50,000, still more preferably from 5,000 to 30,000, particularly preferably from 5,000 to 12,000. When the molecular weight is within the above range, the hardness of the color filter is improved, and the solubility in the developer in the unexposed portion is good, and in the developer after development, the generation of the release sheet derived from the colored photosensitive resin composition is changed. Less tendency.

樹脂(B)的分子量分布[重量平均分子量(Mw)/數量平均分子量(Mn)],較佳是1.1至6,更佳的是1.2至4。 The molecular weight distribution [weight average molecular weight (Mw) / number average molecular weight (Mn)] of the resin (B) is preferably from 1.1 to 6, more preferably from 1.2 to 4.

樹脂(B)的酸價,較佳是50至170mg-KOH/g,更佳是60至150mg-KOH/g,又更佳是70至135mg-KOH/g。在此,酸價是測定中和1g樹脂(B)所需的氫氧化鉀量(mg)之值,例如可藉由使用氫氧化鉀水溶液進行滴定而求得。 The acid value of the resin (B) is preferably from 50 to 170 mg-KOH/g, more preferably from 60 to 150 mg-KOH/g, still more preferably from 70 to 135 mg-KOH/g. Here, the acid value is a value for measuring the amount (mg) of potassium hydroxide required to neutralize 1 g of the resin (B), and can be obtained, for example, by titration with an aqueous potassium hydroxide solution.

相對於固體分的總量,樹脂(B)的含量較佳是7至65質量%,更佳是13至60質量%,又更佳是17至55質量%。樹脂(B)的含量在前述的範圍內時,可以形成著色圖案,而且著色圖案的解析度及殘膜率有提高的傾向。 The content of the resin (B) is preferably from 7 to 65 mass%, more preferably from 13 to 60 mass%, still more preferably from 17 to 55 mass%, based on the total amount of the solids. When the content of the resin (B) is within the above range, a colored pattern can be formed, and the resolution of the colored pattern and the residual film ratio tend to be improved.

〈聚合性化合物(C)〉 <Polymerizable compound (C)>

聚合性化合物(C),是可藉由聚合起始劑(D)產生的活性自由基及/或是氧而進行聚合的化合物,例如可以列舉:具有聚合性之乙烯性不飽和鍵的化合物等,較佳是(甲基)丙烯酸酯化合物。 The polymerizable compound (C) is a compound which can be polymerized by living radicals and/or oxygen generated by the polymerization initiator (D), and examples thereof include a compound having a polymerizable ethylenically unsaturated bond. Preferably, it is a (meth) acrylate compound.

其中,聚合性化合物(C)以具有3個以上的乙烯性不飽和鍵之聚合性化合物為較佳。作為如此之聚合性化合物,例如可以列舉:三羥甲基丙烷三(甲基)丙烯酸酯、新戊四醇三(甲基)丙烯酸酯、新戊四醇四(甲基)丙烯酸酯、二新戊四醇五(甲基)丙烯酸酯、二新戊四醇六(甲基)丙烯酸酯、三新戊四醇八(甲基)丙烯酸酯、三新戊四醇七(甲基)丙烯酸酯、四新戊四醇十(甲基)丙烯酸酯、四新戊四醇九(甲基)丙烯酸酯、參(2-(甲基)丙烯醯氧基乙基)異氰酸酯、乙二醇改質新戊四醇四(甲基)丙烯酸酯、乙二醇改質二新戊四醇六(甲基)丙烯酸酯、丙二醇改質新戊四醇四(甲基)丙烯酸酯、丙二醇改質二新戊四醇六(甲基)丙烯酸酯、己內酯改質新戊四醇四(甲基)丙烯酸酯、己內酯改質二新戊四醇六(甲基)丙烯酸酯等。 Among them, the polymerizable compound (C) is preferably a polymerizable compound having three or more ethylenically unsaturated bonds. Examples of such a polymerizable compound include trimethylolpropane tri(meth)acrylate, pentaerythritol tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, and dinoxin. Pentaerythritol penta (meth) acrylate, dipentaerythritol hexa (meth) acrylate, tripentenol octa (meth) acrylate, tripentanisitol hepta (meth) acrylate, Tetrakis pentaerythritol deca (meth) acrylate, tetrapentaerythritol 九 (meth) acrylate, ginseng (2-(methyl) propylene methoxyethyl) isocyanate, ethylene glycol modified pentylene Tetraol tetra(meth)acrylate, ethylene glycol modified dipentaerythritol hexa(meth) acrylate, propylene glycol modified pentaerythritol tetra(meth) acrylate, propylene glycol modified dipentaerythritol Alcohol hexa (meth) acrylate, caprolactone modified pentaerythritol tetra (meth) acrylate, caprolactone modified dine pentaerythritol hexa (meth) acrylate, and the like.

其中,以二新戊四醇五(甲基)丙烯酸酯及二新戊四醇六(甲基)丙烯酸酯為佳。 Among them, dipentaerythritol penta (meth) acrylate and dine pentaerythritol hexa (meth) acrylate are preferred.

聚合性化合物(C)的重量平均分子量,較佳是150以上2,900以下,更佳是250至1,500以下。 The weight average molecular weight of the polymerizable compound (C) is preferably 150 or more and 2,900 or less, more preferably 250 to 1,500 or less.

相對於固形分的總量,聚合性化合物(C)的含量較佳是7至65質量%,更佳是13至60質量%,又更佳是17至55質量%。聚合性化合物(C)的含量在前述的範圍內時,形成著色圖案時的殘膜率及彩色濾光片的化學耐性有提高的傾向。 The content of the polymerizable compound (C) is preferably from 7 to 65 mass%, more preferably from 13 to 60 mass%, still more preferably from 17 to 55 mass%, based on the total amount of the solid component. When the content of the polymerizable compound (C) is within the above range, the residual film ratio at the time of forming the colored pattern and the chemical resistance of the color filter tend to be improved.

〈聚合起始劑(D)〉 <Polymerization initiator (D)>

聚合起始劑(D),是藉由光或熱的作用產生活性自由 基、氧等而使聚合開始的化合物,聚合起始劑(D)含有聯咪唑化合物或O-醯基肟化合物。 The polymerization initiator (D) is free to generate activity by the action of light or heat. The compound which starts polymerization by a base, oxygen, etc., and the polymerization initiator (D) contains a biimidazole compound or an O-indenyl hydrazine compound.

前述聯咪唑化合物,是咪唑化合物的二聚物,是以式(d6)所示之化合物為較佳。 The biimidazole compound is a dimer of an imidazole compound, and a compound represented by the formula (d6) is preferred.

[式(d6)中,R3至R8表示可具有取代基之碳數6至10的芳香基]。 [In the formula (d6), R 3 to R 8 represents a substituent having a carbon number of the aromatic group having 6 to 10].

作為碳數6至10的芳香基,例如可以列舉:苯基、甲苯甲醯基、二甲苯基、乙基苯基及萘基等,較佳是苯基。 Examples of the aromatic group having 6 to 10 carbon atoms include a phenyl group, a tolylmethyl group, a xylyl group, an ethylphenyl group, and a naphthyl group, and a phenyl group is preferred.

作為取代基,例如可以列舉:鹵原子、碳數1至4的烷氧基。作為鹵原子,例如可以列舉:氟原子、氯原子、溴原子、碘原子等,較佳是氯原子。作為碳數1至4的烷氧基,例如可以列舉:甲氧基、乙氧基、丙氧基、丁氧基等,較佳是甲氧基。 Examples of the substituent include a halogen atom and an alkoxy group having 1 to 4 carbon atoms. The halogen atom may, for example, be a fluorine atom, a chlorine atom, a bromine atom or an iodine atom, and is preferably a chlorine atom. Examples of the alkoxy group having 1 to 4 carbon atoms include a methoxy group, an ethoxy group, a propoxy group, a butoxy group and the like, and a methoxy group is preferred.

作為前述聯咪唑化合物者,例如可以列舉:2,2'-雙(2-氯苯基)-4,4',5,5'-四苯基聯咪唑、2,2'-雙(2,3-二氯苯基)-4,4',5,5'-四苯基聯咪唑(例如參照JPH06-75372-A、JPH06-75373-A等)、2,2'-雙(2-氯苯基)-4,4',5,5'-四苯基聯咪唑、2,2'-雙(2-氯苯基)-4,4',5,5'-四(烷氧基苯基)聯咪唑、2,2'-雙(2-氯苯基)-4,4',5,5'-四(二烷氧 基苯基)聯咪唑、2,2'-雙(2-氯苯基)-4,4',5,5'-四(三烷氧基苯基)聯咪唑(例如參照JPS 48-38403-B、JPS62-174204-A等)、4,4',5,5'-位的苯基經烷氧羰基所取代之咪唑化合物(例如參照JPH07-10913-A等)等。其中,以下述式所示之化合物或等之混合物為較佳。 As the biimidazole compound, for example, 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetraphenylbiimidazole, 2,2'-bis (2, 3-dichlorophenyl)-4,4',5,5'-tetraphenylbiimidazole (for example, refer to JPH06-75372-A, JPH06-75373-A, etc.), 2,2'-bis(2-chloro Phenyl)-4,4',5,5'-tetraphenylbiimidazole, 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetra(alkoxybenzene) Bismuthimide, 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetra(dialkyloxy) Phenyl)biimidazole, 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetrakis(trialkoxyphenyl)biimidazole (for example, see JPS 48-38403- B, JPS62-174204-A, etc.), an imidazole compound in which a phenyl group at the 4,4', 5, 5'-position is substituted with an alkoxycarbonyl group (for example, refer to JPH07-10913-A, etc.) and the like. Among them, a compound represented by the following formula or a mixture of the above is preferred.

前述O-醯基肟化合物,是具有式(d1)所示的部分結構之化合物,較佳是式(d2)所示的化合物。 The above O-indenyl ruthenium compound is a compound having a partial structure represented by the formula (d1), and is preferably a compound represented by the formula (d2).

[式(d1)中,*表示結合鍵]。 [In the formula (d1), * represents a bond].

[式(d2)中,Rd1表示碳數1至12的飽和烴基。 [In the formula (d2), R d1 represents a saturated hydrocarbon group having 1 to 12 carbon atoms.

Rd2,表示甲基、苯基或是苯甲基。 R d2 represents a methyl group, a phenyl group or a benzyl group.

Ld1,表示單鍵或是-CO-。 L d1 , indicating a single bond or -CO-.

Rd3,表示可具有取代基之苯硫基苯基、或是可具有取代基之咔唑基]。 R d3 represents a phenylthiophenyl group which may have a substituent, or a carbazolyl group which may have a substituent.

作為飽和烴基,可以列舉:烷基、脂環式飽和烴基及該等所組合之基。 The saturated hydrocarbon group may, for example, be an alkyl group, an alicyclic saturated hydrocarbon group or a combination thereof.

作為烷基,例如可以列舉:甲基、乙基、丙基、丁基、戊基、己基、庚基、辛基、壬基、癸基、十二基等直鏈狀烷基;異丙基、異丁基、異戊基、新戊基、2-乙基己基等分枝鏈狀烷基。 Examples of the alkyl group include a linear alkyl group such as a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, a heptyl group, an octyl group, a decyl group, a decyl group or a dodecyl group; and an isopropyl group; a branched chain alkyl group such as isobutyl, isopentyl, neopentyl or 2-ethylhexyl.

作為脂環式飽和烴基,例如可以列舉:環丙基、環戊基、環己基、環庚基、環辛基、三環癸基、金剛烷基等。 Examples of the alicyclic saturated hydrocarbon group include a cyclopropyl group, a cyclopentyl group, a cyclohexyl group, a cycloheptyl group, a cyclooctyl group, a tricyclodecyl group, an adamantyl group and the like.

作為該等所組合之基,例如可以列舉:環戊基甲基、環戊基乙基、環己基甲基、環己基乙基、甲基環己基等。 Examples of the group to be combined include a cyclopentylmethyl group, a cyclopentylethyl group, a cyclohexylmethyl group, a cyclohexylethyl group, a methylcyclohexyl group, and the like.

作為可具有苯基硫基苯基及咔唑基之取代基,例如可以列舉:碳數1至6的烷基、可具有碳數1至10之飽和烴基的苯甲醯基,該烷基及該飽和烴基中含有的氫原子亦可經羥基取代,該烷基及該飽和烴基中含有的亞甲基亦可經氧原子取代。 Examples of the substituent which may have a phenylthiophenyl group and a carbazolyl group include an alkyl group having 1 to 6 carbon atoms, a benzamyl group having a saturated hydrocarbon group having 1 to 10 carbon atoms, and the alkyl group and The hydrogen atom contained in the saturated hydrocarbon group may also be substituted with a hydroxyl group, and the alkyl group and the methylene group contained in the saturated hydrocarbon group may be substituted with an oxygen atom.

烷基及飽和烴基可以列舉與上述相同者。 The alkyl group and the saturated hydrocarbon group may be the same as described above.

作為如此之取代基,可以列舉:上述之烷基;2-羥基乙基、2-羥基乙氧基、乙氧基乙基;苯甲醯基、2-甲基苯甲醯基、(3,3-二甲基-2,4-二氧雜環戊基甲基氧基)苯甲醯基等。 As such a substituent, the above alkyl group; 2-hydroxyethyl group, 2-hydroxyethoxy group, ethoxyethyl group; benzylidene group, 2-methylbenzylidene group, (3, 3-Dimethyl-2,4-dioxolylmethyloxy)benzhydryl group and the like.

式(d2)所示的化合物,較佳是式(d3)或是式(d4)所示的化合物,更佳的是式(d3)所示的化合物。 The compound represented by the formula (d2) is preferably a compound represented by the formula (d3) or the formula (d4), more preferably a compound represented by the formula (d3).

[式(d3)及式(d4)中,Rd1及Rd2表示與上述相同意思。 In the formulae (d3) and (d4), R d1 and R d2 have the same meanings as described above.

Rd4表示是氫原子或是碳數1至6的烷基,該烷基中所含的氫原子亦可經羥基取代,該烷基中所含的亞甲基亦可經氧原子置換。 R d4 represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms, the hydrogen atoms contained in the alkyl group may also be substituted by a hydroxyl group, the alkyl group may contain a methylene replaced by an oxygen atom.

Rd5表示可具有碳數1至10之飽和烴基的苯甲醯基、氫原子或是碳數1至6的烷基,在該烷基及該飽和烴基中所含的氫原子亦可經羥基取代,該烷基及該飽和烴基中所含的亞甲基亦可經氧原子置換。 R d5 represents a benzamyl group which may have a saturated hydrocarbon group of 1 to 10 carbon atoms, a hydrogen atom or an alkyl group having 1 to 6 carbon atoms, and a hydrogen atom contained in the alkyl group and the saturated hydrocarbon group may also pass through a hydroxyl group. Alternatively, the alkyl group and the methylene group contained in the saturated hydrocarbon group may be substituted with an oxygen atom.

Rd5表示碳數1至6的烷基]。 R d5 represents an alkyl group having 1 to 6 carbon atoms].

烷基及飽和烴基,可列舉與上述相同者。 The alkyl group and the saturated hydrocarbon group are the same as those described above.

作為前述O-醯基肟化合物,例如可以列舉:N-苯甲醯氧基-1-(4-苯基硫基苯基)丁烷-1-酮-2-亞胺、N-苯甲醯氧基-1-(4-苯基硫基苯基)辛烷-1-酮-2-亞胺、N-苯甲醯氧基-1-(4-苯基硫基苯基)-3-環戊基丙烷-1-酮-2-亞胺、N-乙醯氧基-1-[9-乙基-6-(2-甲基苯甲醯基)-9H-咔唑-3-基]乙烷-1-亞胺、N-乙醯氧基-1-[9-乙基-6-{2-甲基-4-(3,3-二甲基-2,4-二氧雜環戊烷基甲氧基)苯甲醯基}-9H-咔唑-3-基]乙烷-1-亞胺、N-乙醯氧基-1-[9-乙基-6-(2-甲基苯甲醯基)-9H-咔唑-3-基]-3-環戊基丙烷-1-亞胺、N-苯甲醯氧基-1-[9-乙基-6-(2-甲基苯甲醯基)-9H-咔唑-3-基]-3-環戊基丙 烷-1-酮-2-亞胺等;在JP2001-233842-A、JP2004-534797-A、或是JP2011-132215-A中記載的O-醯基肟化合物等。也可以使用Irgacure OXE 01、OXE02(以上為BASF公司製)、N-1919(ADEKA公司製)等市售品。其中,O-醯基肟化合物是以選自N-苯甲醯氧基-1-(4-苯基硫基苯基)丁烷-1-酮-2-亞胺、N-苯甲醯氧基-1-(4-苯基硫基苯基)辛烷-1-酮-2-亞胺及N-苯甲醯氧基-1-(4-苯基硫基苯基)-3-環戊基丙烷-1-酮-2-亞胺所成群組中至少一種為佳,以N-苯甲醯氧基-1-(4-苯基硫基苯基)辛烷-1-酮-2-亞胺為更佳。 Examples of the O-indenyl ruthenium compound include N-benzylideneoxy-1-(4-phenylthiophenyl)butan-1-one-2-imide and N-benzamide. Oxy-1-(4-phenylthiophenyl)octane-1-one-2-imine, N-benzylideneoxy-1-(4-phenylthiophenyl)-3- Cyclopentylpropan-1-one-2-imine, N-acetoxy-1-[9-ethyl-6-(2-methylbenzylidene)-9H-indazol-3-yl Ethyl-1-imine, N-acetoxy-1-[9-ethyl-6-{2-methyl-4-(3,3-dimethyl-2,4-dioxa) Cyclopentyl methoxy)benzylidene}-9H-indazol-3-yl]ethane-1-imine, N-ethyloxy-1-[9-ethyl-6-(2 -Methylbenzylidene)-9H-indazol-3-yl]-3-cyclopentylpropane-1-imine, N-benzylideneoxy-1-[9-ethyl-6-( 2-methylbenzhydryl)-9H-indazol-3-yl]-3-cyclopentylpropane An alkane-1-one-2-imine or the like; an O-mercaptopurine compound or the like described in JP2001-233842-A, JP2004-534797-A, or JP2011-132215-A. Commercial products such as Irgacure OXE 01, OXE02 (above, BASF) and N-1919 (made by Adeka) can also be used. Wherein the O-indenyl hydrazine compound is selected from the group consisting of N-benzylideneoxy-1-(4-phenylthiophenyl)butan-1-one-2-imine, N-benzyl hydrazine 1-(4-phenylthiophenyl)octane-1-one-2-imine and N-benzylideneoxy-1-(4-phenylthiophenyl)-3-cyclo Preferably, at least one of the group of pentylpropan-1-one-2-imine is N-benzylideneoxy-1-(4-phenylthiophenyl)octane-1-one- 2-Amine is more preferred.

聚合起始劑(D),亦可視所需而含有聯咪唑化合物或O-醯基肟化合物以外的聚合起始劑。又,亦可視所需而將增敏劑與聚合起始劑(D)同時使用。 The polymerization initiator (D) may also contain a polymerization initiator other than the biimidazole compound or the O-mercaptopurine compound, as needed. Further, the sensitizer may be used together with the polymerization initiator (D) as needed.

相對於樹脂(B)及聚合性化合物(C)的合計量100質量份,聚合起始劑(D)的含量較佳是0.1至30質量份,更佳的是1至20質量份。聚合起始劑(D)的含量在前述範圍內時,著色圖案形成後的顯影液中剝離片的產生少。 The content of the polymerization initiator (D) is preferably from 0.1 to 30 parts by mass, more preferably from 1 to 20 parts by mass, per 100 parts by mass of the total of the resin (B) and the polymerizable compound (C). When the content of the polymerization initiator (D) is within the above range, the generation of the release sheet in the developer after the formation of the colored pattern is small.

〈硫醇化合物(T)〉 <thiol compound (T)>

硫醇化合物(T)是分子內具有-SH的化合物。 The thiol compound (T) is a compound having -SH in the molecule.

作為分子內具有1個-SH的化合物,例如可以列舉:2-巰基唑、2-巰基噻唑、2-巰基苯并咪唑、2-巰基苯并噻唑、2-巰基苯并唑、2-巰基菸鹼酸、2-巰基吡啶、2-巰基吡啶-3-醇、2-巰基吡啶-N-氧化物、4-胺基-6-羥基-2-巰基嘧啶、4-胺基-6-羥基-2-巰基嘧啶、4-胺基-6-羥基-2-巰基嘧啶、4-胺基-2-巰基嘧啶、6-胺基-5-亞硝基-2- 硫脲嘧啶、4,5-二胺基-6-羥基-2-巰基嘧啶、4,6-二胺基-2-巰基嘧啶、2,4-二胺基-6-巰基嘧啶、4,6-二羥基-2-巰基嘧啶、4,6-二甲基-2-巰基嘧啶、4-羥基-2-巰基-6-甲基嘧啶、4-羥基-2-巰基-6-丙基嘧啶、2-巰基-4-甲基嘧啶、2-巰基嘧啶、2-硫脲嘧啶、3,4,5,6-四氫嘧啶-2-硫醇、4,5-二苯基咪唑-2-硫醇、2-巰基咪唑、2-巰基-1-甲基咪唑、4-胺基-3-肼基-5-巰基-1,2,4-三唑、3-胺基-5-巰基-1,2,4-三唑、2-甲基-4H-1,2,4-三唑-3-硫醇、4-甲基-4H-1,2,4-三唑-3-硫醇、3-巰基-1H-1,2,4-三唑-3-硫醇、2-胺基-5-巰基-1,3,4-噻二唑、5-胺基-1,3,4-噻二唑-2-硫醇、2,5-二巰基-1,3,4-噻二唑、(呋喃-2-基)甲烷硫醇、2-巰基-5-噻唑酮、2-巰基噻唑啉、2-巰基-4(3H)-喹唑啉酮、1-苯基-1H-四唑-5-硫醇、2-喹啉硫醇、2-巰基-5-甲基苯并咪唑、2-巰基-5-硝基苯并咪唑、6-胺基-2-巰基苯并噻唑、5-氯-2-巰基苯并噻唑、6-乙氧基-2-巰基苯并噻唑、6-硝基-2-巰基苯并噻唑、2-巰基萘并咪唑、2-巰基萘并唑、3-巰基-1,2,4-三唑、4-胺基-6-巰基吡唑并[2,4-d]吡啶、2-胺基-6-嘌呤硫醇、6-巰基嘌呤、4-巰基-1H-吡唑[2,4-d]嘧啶等。 Examples of the compound having one -SH in the molecule include, for example, a 2-fluorenyl group. Oxazole, 2-mercaptothiazole, 2-mercaptobenzimidazole, 2-mercaptobenzothiazole, 2-mercaptobenzoene Azole, 2-mercaptonicotinic acid, 2-mercaptopyridine, 2-mercaptopyridine-3-ol, 2-mercaptopyridine-N-oxide, 4-amino-6-hydroxy-2-mercaptopyrimidine, 4-amine 6-hydroxy-2-mercaptopyrimidine, 4-amino-6-hydroxy-2-mercaptopyrimidine, 4-amino-2-mercaptopyrimidine, 6-amino-5-nitroso-2-thiourea Pyrimidine, 4,5-diamino-6-hydroxy-2-mercaptopyrimidine, 4,6-diamino-2-mercaptopyrimidine, 2,4-diamino-6-mercaptopyrimidine, 4,6-di Hydroxy-2-mercaptopyrimidine, 4,6-dimethyl-2-mercaptopyrimidine, 4-hydroxy-2-indolyl-6-methylpyrimidine, 4-hydroxy-2-indolyl-6-propylpyrimidine, 2- Mercapto-4-methylpyrimidine, 2-mercaptopyrimidine, 2-thiouracil, 3,4,5,6-tetrahydropyrimidin-2-thiol, 4,5-diphenylimidazole-2-thiol, 2-mercaptoimidazole, 2-mercapto-1-methylimidazole, 4-amino-3-indolyl-5-mercapto-1,2,4-triazole, 3-amino-5-mercapto-1,2 , 4-triazole, 2-methyl-4H-1,2,4-triazole-3-thiol, 4-methyl-4H-1,2,4-triazole-3-thiol, 3- Mercapto-1H-1,2,4-triazole-3-thiol, 2-amino-5-mercapto-1,3,4-thiadiazole, 5-amino-1,3,4-thiadi Oxazole-2-thiol, 2,5-dimercapto-1,3,4-thiadiazole, (furan-2-yl)methanethiol, 2-mercapto-5-thiazole , 2-mercaptothiazoline, 2-mercapto-4(3H)-quinazolinone, 1-phenyl-1H-tetrazole-5-thiol, 2-quinolinyl mercaptan, 2-mercapto-5-methyl Benzimidazole, 2-mercapto-5-nitrobenzimidazole, 6-amino-2-mercaptobenzothiazole, 5-chloro-2-mercaptobenzothiazole, 6-ethoxy-2-mercaptobenzene Thiazole, 6-nitro-2-mercaptobenzothiazole, 2-mercaptophthalimidazole, 2-nonylnaphthyl Oxazole, 3-mercapto-1,2,4-triazole, 4-amino-6-mercaptopyrazolo[2,4-d]pyridine, 2-amino-6-anthracenethiol, 6-mercaptopurine , 4-mercapto-1H-pyrazole [2,4-d]pyrimidine, and the like.

作為在分子內有2個以上-SH的化合物,可以列舉:己烷二硫醇、癸烷二硫醇、1,4-雙(甲基巰基)苯、丁二醇雙(3-巰基丙酸酯)、丁二醇雙(3-巰基乙酸酯)、乙二醇雙(3-巰基乙酸酯)、三羥甲基丙烷參(3-巰基乙酸酯)、丁二醇雙(3-巰基丙酸酯)、三羥甲基丙烷參(3-巰基丙酸酯)、三羥甲基丙烷參(3-巰基乙酸酯)、新戊四醇肆(3-巰基丙酸 酯)、新戊四醇肆(3-巰基乙酸酯)、參羥基乙基參(3-巰基丙酸酯)、新戊四醇肆(3-巰基丁酸酯)、1,4-雙(3-巰基丁氧基)丁烷等。 Examples of the compound having two or more -SH in the molecule include hexanedithiol, decanedithiol, 1,4-bis(methylindenyl)benzene, and butanediol bis(3-mercaptopropionic acid). Ester), butanediol bis(3-mercaptoacetate), ethylene glycol bis(3-mercaptoacetate), trimethylolpropane ginseng (3-mercaptoacetate), butanediol bis (3) - mercaptopropionate), trimethylolpropane ginseng (3-mercaptopropionate), trimethylolpropane ginseng (3-mercaptoacetate), pentaerythritol bismuth (3-mercaptopropionic acid) Ester), neopentyl quinone oxime (3-mercaptoacetate), hydroxyethyl ginseng (3-mercaptopropionate), neopentyl quinone oxime (3-mercaptobutyrate), 1,4-double (3-mercaptobutoxy)butane and the like.

作為硫醇化合物(T)者,是以在分子內具有1個-SH的化合物為佳。 As the thiol compound (T), a compound having one -SH in the molecule is preferred.

相對於聚合起始劑(D)100質量份,硫醇化合物(T)的含量較佳是1至150質量份,更佳是5至100質量份,又更佳是8至70質量份。硫醇化合物(T)的含量在該範圍內時,會有靈敏度變高,而且顯影性變良好的傾向。 The content of the thiol compound (T) is preferably from 1 to 150 parts by mass, more preferably from 5 to 100 parts by mass, still more preferably from 8 to 70 parts by mass, per 100 parts by mass of the polymerization initiator (D). When the content of the thiol compound (T) is within this range, the sensitivity is high and the developability tends to be good.

〈溶劑(E)〉 <Solvent (E)>

溶劑(E)並無特別的限定,可以使用該技術領域通常使用的溶劑。例如可以列舉:酯溶劑(在分子內含有-COO-,不含-O-的溶劑)、醚溶劑(在分子內含有-O-,不含-COO-的溶劑)、醚酯溶劑(在分子內含有-COO-與-O-的溶劑)、酮溶劑(在分子內含有-CO-,不含-COO-的溶劑)、醇溶劑(在分子內含有OH,不含-O-、-CO-及-COO-的溶劑)、芳香族烴溶劑、醯胺溶劑、二甲基亞碸等。 The solvent (E) is not particularly limited, and a solvent generally used in the art can be used. For example, an ester solvent (a solvent containing -COO- in the molecule and a solvent containing no -O-), an ether solvent (a solvent containing -O- in the molecule, and a solvent containing no -COO-), an ether ester solvent (in the molecule) a solvent containing -COO- and -O-), a ketone solvent (a solvent containing -CO- in the molecule, a solvent containing no -COO-), an alcohol solvent (containing OH in the molecule, and containing no -O-, -CO) - and -COO-solvent), aromatic hydrocarbon solvent, guanamine solvent, dimethyl hydrazine, and the like.

作為酯溶劑,可以列舉:乳酸甲酯、乳酸乙酯、乳酸丁酯、2-羥基異丁酸甲酯、乙酸乙酯、乙酸正丁酯、乙酸異丁酯、甲酸戊酯、乙酸異戊酯、丙酸丁酯、丁酸異丙酯、丁酸乙酯、丁酸丁酯、丙酮酸甲酯、丙酮酸乙酯、丙酮酸丙酯、乙醯乙酸甲酯、乙醯乙酸乙酯、環己醇乙酸酯及γ-丁內酯等。 Examples of the ester solvent include methyl lactate, ethyl lactate, butyl lactate, methyl 2-hydroxyisobutyrate, ethyl acetate, n-butyl acetate, isobutyl acetate, amyl formate, and isoamyl acetate. , butyl propionate, isopropyl butyrate, ethyl butyrate, butyl butyrate, methyl pyruvate, ethyl pyruvate, propyl pyruvate, methyl acetate, ethyl acetate, ring Hexanol acetate and γ-butyrolactone.

作為醚溶劑,可以列舉:乙二醇單甲基醚、 乙二醇單乙基醚、乙二醇單丙基醚、乙二醇單丁基醚、二乙二醇單甲基醚、二乙二醇單乙基醚、二乙二醇單丁基醚、丙二醇單甲基醚、丙二醇單乙基醚、丙二醇單丙基醚、丙二醇單丁基醚、3-甲氧基-1-丁醇、3-甲氧基-3-甲基丁醇、四氫呋喃、四氫吡喃、1,4-二烷、二乙二醇二甲基醚、二乙二醇二乙基醚、二乙二醇甲基乙基醚、二乙二醇二丙基醚、二乙二醇二丁基醚、苯甲醚(anisole)、苯乙醚(phenetole)及甲基苯甲醚等。 Examples of the ether solvent include ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, ethylene glycol monobutyl ether, diethylene glycol monomethyl ether, and diethyl ether. Glycol monoethyl ether, diethylene glycol monobutyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monopropyl ether, propylene glycol monobutyl ether, 3-methoxy-1-butanol , 3-methoxy-3-methylbutanol, tetrahydrofuran, tetrahydropyran, 1,4-two Alkane, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol methyl ethyl ether, diethylene glycol dipropyl ether, diethylene glycol dibutyl ether, benzo Anisole, phenetole and methylanisole.

作為醚酯溶劑,可以列舉:甲氧基乙酸甲酯、甲氧基乙酸乙酯、甲氧基乙酸丁酯、乙氧基乙酸甲酯、乙氧基乙酸乙酯、3-甲氧基丙酸甲酯、3-甲氧基丙酸乙酯、3-乙氧基丙酸甲酯、3-乙氧基丙酸乙酯、2-甲氧基丙酸甲酯、2-甲氧基丙酸乙酯、2-甲氧基丙酸丙酯、2-乙氧基丙酸甲酯、2-乙氧基丙酸乙酯、2-甲氧基-2-甲基丙酸甲酯、2-乙氧基-2-甲基丙酸甲酯、3-甲氧基丁基乙酸酯、3-甲基-3-甲氧基丁基乙酸酯、丙二醇單甲基醚乙酸酯、丙二醇單乙基醚乙酸酯、丙二醇單丙基醚乙酸酯、乙二醇單甲基醚乙酸酯、乙二醇單乙基醚乙酸酯、二乙二醇單乙基醚乙酸酯及二乙二醇單丁基醚乙酸酯等。 Examples of the ether ester solvent include methyl methoxyacetate, ethyl methoxyacetate, butyl methoxyacetate, methyl ethoxyacetate, ethyl ethoxyacetate, and 3-methoxypropionic acid. Methyl ester, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, methyl 2-methoxypropionate, 2-methoxypropionic acid Ethyl ester, propyl 2-methoxypropionate, methyl 2-ethoxypropionate, ethyl 2-ethoxypropionate, methyl 2-methoxy-2-methylpropionate, 2- Methyl ethoxy-2-methylpropanoate, 3-methoxybutyl acetate, 3-methyl-3-methoxybutyl acetate, propylene glycol monomethyl ether acetate, propylene glycol Monoethyl ether acetate, propylene glycol monopropyl ether acetate, ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, diethylene glycol monoethyl ether acetate And diethylene glycol monobutyl ether acetate and the like.

作為酮溶劑,可以列舉:4-羥基-4-甲基-2-戊酮、丙酮、2-丁酮、2-庚酮、3-庚酮、4-庚酮、4-甲基-2-庚酮、環庚酮、環己酮、及異佛酮等。 Examples of the ketone solvent include 4-hydroxy-4-methyl-2-pentanone, acetone, 2-butanone, 2-heptanone, 3-heptanone, 4-heptanone, and 4-methyl-2- Heptone, cycloheptanone, cyclohexanone, and isophorone.

作為醇溶劑,可以列舉:甲醇、乙醇、丙醇、丁醇、己醇、環己醇、乙二醇、丙二醇及甘油等。 Examples of the alcohol solvent include methanol, ethanol, propanol, butanol, hexanol, cyclohexanol, ethylene glycol, propylene glycol, and glycerin.

作為芳香烴溶劑,可以列舉:苯、甲苯、二甲苯、及均三甲苯(mesitylene)等。 Examples of the aromatic hydrocarbon solvent include benzene, toluene, xylene, and mesitylene.

作為醯胺溶劑,可以列舉:N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、N,N-甲基吡咯啶酮等。 Examples of the guanamine solvent include N,N-dimethylformamide, N,N-dimethylacetamide, and N,N-methylpyrrolidone.

上述溶劑中,就塗佈性、乾燥性之點而言,是以1atm的沸點在120℃以上180℃以下之有機溶劑為佳。作為溶劑,是以丙二醇單甲基醚乙酸酯、乳酸乙酯、丙二醇單甲基醚、3-乙氧基丙酸乙酯、乙二醇單甲基醚、二乙二醇單甲基醚、二乙二醇單乙基醚、環己酮、4-羥基-4-甲基-2-戊酮及N,N-二甲基甲醯胺為佳,以丙二醇單甲基醚乙酸酯、丙二醇單甲基醚、乳酸乙酯及3-乙氧基丙酸乙酯為更佳。 Among the above solvents, in terms of coatability and dryness, an organic solvent having a boiling point of 1 atm of 120 ° C or more and 180 ° C or less is preferred. As a solvent, propylene glycol monomethyl ether acetate, ethyl lactate, propylene glycol monomethyl ether, ethyl 3-ethoxypropionate, ethylene glycol monomethyl ether, diethylene glycol monomethyl ether Diethylene glycol monoethyl ether, cyclohexanone, 4-hydroxy-4-methyl-2-pentanone and N,N-dimethylformamide are preferred as propylene glycol monomethyl ether acetate Further, propylene glycol monomethyl ether, ethyl lactate and ethyl 3-ethoxypropionate are more preferred.

相對於本發明的著色光敏性樹脂組成物的總量,溶劑(E)的含量較佳是70至95質量%,更佳是75至92質量%。換言之,著色光敏性樹脂組成物的固形分總量,較佳是5至30質量%,更佳的是8至25質量%。溶劑(E)的含量在前述範圍時,塗佈時的平坦性會變良好,而且形成彩色濾光片時由於色濃度不會不足,故顯示特性有變良好之傾向。 The content of the solvent (E) is preferably from 70 to 95% by mass, more preferably from 75 to 92% by mass, based on the total amount of the colored photosensitive resin composition of the present invention. In other words, the total amount of the solid content of the colored photosensitive resin composition is preferably from 5 to 30% by mass, more preferably from 8 to 25% by mass. When the content of the solvent (E) is in the above range, the flatness at the time of coating is improved, and the color density is not insufficient when the color filter is formed, so that the display characteristics tend to be good.

〈調平劑(F)〉 <Leveling agent (F)>

作為調平劑(F),可以列舉:聚矽氧(silicone)系界面活性劑、氟系界面活性劑及具有氟原子之聚矽氧系界面活性劑等。該等也可以在側鏈具有聚合性基。 Examples of the leveling agent (F) include a silicone-based surfactant, a fluorine-based surfactant, and a polyfluorene-based surfactant having a fluorine atom. These may also have a polymerizable group in the side chain.

作為聚矽氧系界面活性劑,可以列舉在分子中具有矽 氧烷鍵之界面活性劑等。具體而言,可以列舉:Toray Silicone DC3PA、同系列之SH7PA、同系列之DC11PA、同系列之SH21PA、同系列之SH28PA、同系列之SH29PA、同系列之SH30PA、同系列之SH8400(商品名:東麗.道康寧股份有限公司製);KP321、KP322、KP323、KP324、KP326、KP340、KP341(信越化學工業股份有限公司製);TSF400、TSF401、TSF410、TSF4300、TSF4440、TSF4445、TSF4446、TSF4452及TSF4460(Momentive Performance Materials Japan合同公司製)等。 As a polyoxo-based surfactant, it can be mentioned that it has a ruthenium in a molecule. Surfactant such as oxyalkylene bond. Specifically, Toray Silicone DC3PA, the same series of SH7PA, the same series of DC11PA, the same series of SH21PA, the same series of SH28PA, the same series of SH29PA, the same series of SH30PA, the same series of SH8400 (trade name: East KL321, KP322, KP323, KP324, KP326, KP340, KP341 (manufactured by Shin-Etsu Chemical Co., Ltd.); TSF400, TSF401, TSF410, TSF4300, TSF4440, TSF4445, TSF4446, TSF4452 and TSF4460 ( Momentive Performance Materials Japan contract company) and so on.

作為前述氟系界面活性劑,可以列舉在分子中具有氟碳鍵之界面活性劑等。具體而言,可以列舉:Fluorad(註冊商標)FC430、同系列之FC431(住友3M股份有限公司製);Megafac(註冊商標)F142D、同系列之F171、同系列之F172、同系列之F173、同系列之F177、同系列之F183、同系列之F554、同系列之R30、同系列之RS-718-K(DIC股份有限公司製);Eftop(註冊商標)EF301、同系列之EF303、同系列之EF351、同系列之EF352(三菱材料電子化成股份有限公司製);Surflon(註冊商標)S381、同系列之S382、同系列之SC101、同系列之SC105(旭玻璃股份有限公司製);及E5844(Daikin Fine Chemical研究所股份有限公司製)等。 The fluorine-based surfactant may, for example, be a surfactant having a fluorocarbon bond in a molecule. Specifically, Fluorad (registered trademark) FC430, FC431 of the same series (manufactured by Sumitomo 3M Co., Ltd.), Megafac (registered trademark) F142D, F171 of the same series, F172 of the same series, F173 of the same series, and the same Series F177, F183 of the same series, F554 of the same series, R30 of the same series, RS-718-K of the same series (made by DIC Corporation); Eftop (registered trademark) EF301, EF303 of the same series, the same series EF351, the same series of EF352 (Mitsubishi Materials Electronics Co., Ltd.); Surflon (registered trademark) S381, the same series of S382, the same series of SC101, the same series of SC105 (made by Asahi Glass Co., Ltd.); and E5844 ( Daikin Fine Chemical Research Institute Co., Ltd.) and the like.

作為前述具有氟原子之聚矽氧系界面活性劑,可以列舉在分子中有矽氧烷鍵及有氟碳鍵之界面活性劑等。具體而言,可以列舉:Megafac(註冊商標)R08、同 系列之BL20、同系列之F475、同系列之F477及同系列之443(DIC股份有限公司製)等。 Examples of the polyfluorene-based surfactant having a fluorine atom include a surfactant having a decane bond and a fluorocarbon bond in the molecule. Specifically, it can be enumerated: Megafac (registered trademark) R08, the same Series BL20, F475 of the same series, F477 of the same series, and 443 of the same series (made by DIC Corporation).

相對於著色光敏性樹脂組成物的總量,調平劑(F)之含量較佳是0.001質量%以上0.2質量%以下,更佳是0.002質量%以上0.1質量%以下,又更佳是0.01質量%以上0.05質量%以下。又,此含量中不包含前述顏料分散劑的含量。調平劑(F)之含量在前述範圍時,彩色濾光片之平坦性可為良好。 The content of the leveling agent (F) is preferably 0.001% by mass or more and 0.2% by mass or less, more preferably 0.002% by mass or more and 0.1% by mass or less, and still more preferably 0.01% by mass based on the total amount of the coloring photosensitive resin composition. % or more and 0.05% by mass or less. Further, the content of the above-mentioned pigment dispersant is not included in this content. When the content of the leveling agent (F) is within the above range, the flatness of the color filter can be good.

〈其他的成分〉 <Other ingredients>

本發明的著色光敏性樹脂組成物,亦可視所需而含有充填劑、其他高分子化合物、密合促進劑、抗氧化劑、光安定劑、鏈轉移劑等,在該技術領域為公知的添加劑。 The colored photosensitive resin composition of the present invention may contain a filler, another polymer compound, an adhesion promoter, an antioxidant, a photosetter, a chain transfer agent, etc., as needed, and is a well-known additive in this technical field.

〈著色光敏性樹脂組成物的製造方法〉 <Method for Producing Colored Photosensitive Resin Composition>

本發明的著色光敏性樹脂組成物,例如可以藉由混合著色劑(A)、樹脂(B)、聚合性化合物(C)、聚合起始劑(D)以及視所需而使用的溶劑(E)、調平劑(F)、聚合起始劑(D1)及其他之成分而調製。 The colored photosensitive resin composition of the present invention can be, for example, a mixed coloring agent (A), a resin (B), a polymerizable compound (C), a polymerization initiator (D), and a solvent (E) which are used as needed. , a leveling agent (F), a polymerization initiator (D1), and other components are prepared.

氧雜蒽染料(A1)與染料(A3)也可以預先分別溶解在溶劑(E)的一部分或是全部中而調製溶液。較佳為將該溶液以孔徑0.01至1μm左右的過濾器進行過濾為佳。 The xanthene dye (A1) and the dye (A3) may be dissolved in a part or all of the solvent (E) in advance to prepare a solution. Preferably, the solution is preferably filtered through a filter having a pore diameter of about 0.01 to 1 μm.

顏料(A2),較佳是將之預先與溶劑(E)之一部分或是全部混合,並使用珠磨機等使其分散至顏料的平均粒徑成為0.2μm以下左右為止。此時,亦可視所需而調配前述顏料分散劑、樹脂(B)之一部分或是全部。在以此方式得到之顏 料分散液中,將其餘的成分以成為所定濃度之方式混合,藉此可以調製目的的著色光敏性樹脂組成物。 The pigment (A2) is preferably partially or wholly mixed with one of the solvent (E) and dispersed in a bead mill or the like until the average particle diameter of the pigment is about 0.2 μm or less. At this time, part or all of the above-mentioned pigment dispersant and resin (B) may be blended as needed. In this way In the dispersion liquid, the remaining components are mixed so as to have a predetermined concentration, whereby the intended color-sensitive photosensitive resin composition can be prepared.

較佳為將混合後的著色光敏性樹脂組成物以孔徑0.01至10μm左右的過濾器進行過濾為佳。 It is preferred to filter the mixed color-sensitive photosensitive resin composition with a filter having a pore diameter of about 0.01 to 10 μm.

〈彩色濾光片的製造方法〉 <Method of Manufacturing Color Filter>

作為由本發明的著色光敏性樹脂組成物來製造著色圖案的方法,可以列舉:光蝕刻法(photolithography)、噴霧法、印刷法等。其中,以光蝕刻法為佳。光蝕刻法,係在基板上塗佈前述著色光敏性樹脂組成物,使其乾燥後形成著色組成物層,並經由光罩曝光該著色組成物層,而進行顯影的方法。在光蝕刻法中,藉由在曝光時不使用光罩,及/或是不進行顯影,即可形成上述著色組成物層硬化物的著色塗膜。以此方式形成的著色圖案或著色塗膜即本發明之彩色濾光片。 Examples of the method for producing a colored pattern from the colored photosensitive resin composition of the present invention include photolithography, a spray method, a printing method, and the like. Among them, photolithography is preferred. The photolithography method is a method in which the colored photosensitive resin composition is applied onto a substrate, dried to form a colored composition layer, and the colored composition layer is exposed through a photomask to develop the composition. In the photolithography method, the colored coating film of the cured product of the colored composition layer can be formed without using a photomask during exposure and/or without development. The colored pattern or colored coating film formed in this manner is the color filter of the present invention.

製作的彩色濾光片之膜厚並無特別限定,可因應目的及用途適當的調整,例如為0.1至30μm,較佳是0.1至20μm,更佳是0.5至6μm。 The film thickness of the produced color filter is not particularly limited, and can be appropriately adjusted depending on the purpose and use, and is, for example, 0.1 to 30 μm, preferably 0.1 to 20 μm, and more preferably 0.5 to 6 μm.

作為基板,可以使用:石英玻璃、硼矽酸玻璃、鋁矽酸鹽玻璃、表面以矽塗佈之鹼玻璃等的玻璃板;或是聚碳酸酯、聚甲基丙烯酸甲酯、聚對苯二甲酸乙二酯等之樹脂板;矽、在前述基板上形成有鋁、銀、銀/銅/鈀合金薄膜等者。在該等基板上,也可以形成其他的彩色濾光層、樹脂層、電晶體(transistor)、電路等。 As the substrate, a glass plate such as quartz glass, borosilicate glass, aluminosilicate glass, or alkali glass coated with ruthenium may be used; or polycarbonate, polymethyl methacrylate or polyparaphenylene A resin plate such as ethylene formate; a film of aluminum, silver, a silver/copper/palladium alloy, or the like formed on the substrate. Other color filter layers, resin layers, transistors, circuits, and the like may be formed on the substrates.

藉由光蝕刻法之各色畫素的形成,可以用 公知或慣用的裝置和條件來進行,例如可以以下述方式來製作。 By the formation of various color pixels by photolithography, it can be used Known or customary devices and conditions can be made, for example, in the following manner.

首先,在基板上塗佈著色光敏性樹脂組成物,並藉由加熱乾燥(預烘烤)及/或是減壓乾燥來除去溶劑等揮發成分並使其乾燥,得到平滑的著色樹脂組成物層。 First, a colored photosensitive resin composition is applied onto a substrate, and dried by heating (prebaking) and/or drying under reduced pressure to remove volatile components such as a solvent and drying them to obtain a smooth colored resin composition layer. .

作為塗佈的方法,可以列舉:旋轉塗佈法、狹縫塗佈法、狹縫與旋轉塗佈法等。 Examples of the coating method include a spin coating method, a slit coating method, a slit and a spin coating method, and the like.

進行加熱乾燥時的溫度,是以30至120℃為較佳,以50至110℃為更佳。又,加熱時間是以10秒鐘至60分鐘為佳,以30秒鐘至30分鐘為更佳。 The temperature at the time of heat drying is preferably 30 to 120 ° C, more preferably 50 to 110 ° C. Further, the heating time is preferably from 10 seconds to 60 minutes, more preferably from 30 seconds to 30 minutes.

進行減壓乾燥的情形,是以在50至150Pa的壓力下,20至25℃的溫度範圍中進行為佳。 The case where the drying under reduced pressure is carried out is preferably carried out at a temperature of from 20 to 25 ° C under a pressure of 50 to 150 Pa.

著色組成物層的膜厚並無特別限定,只要對應目的的彩色濾光器之膜厚而適當選擇即可。 The film thickness of the coloring composition layer is not particularly limited, and may be appropriately selected in accordance with the film thickness of the intended color filter.

其次,著色組成物層係為了形成目的之著色圖案而經由光罩曝光。該光罩上的圖案並無特別限定,使用對應作為目的用途之圖案。 Next, the colored composition layer is exposed through the photomask in order to form the intended color pattern. The pattern on the photomask is not particularly limited, and a pattern corresponding to the intended use is used.

作為曝光所使用的光源,是以產生波長250至450nm的光之光源為佳。例如,將未達350nm的光使用阻斷此波長帶的濾光片進行阻斷,也可以使用將436nm附近、408nm附近、365nm附近的波長帶的光釋出之帶通濾光片,將該等波長帶的光選擇性地釋出。具體而言,可以列舉:水銀燈、發光二極體、金屬鹵素燈、鹵素燈等。 The light source used for the exposure is preferably a light source that generates light having a wavelength of 250 to 450 nm. For example, light having a wavelength of less than 350 nm is blocked by a filter that blocks the wavelength band, and a band pass filter that emits light in a wavelength band of around 436 nm, around 408 nm, and around 365 nm may be used. Light of the same wavelength band is selectively released. Specifically, a mercury lamp, a light-emitting diode, a metal halide lamp, a halogen lamp, etc. are mentioned.

因為可對曝光面全體均勻地照射平行光線,且可使光 罩與形成著色組成物層的基板正確地進行對位,因此,以使用光罩對準機(mask-aligner)及步進機(stepper)等曝光裝置為較佳。 Because the entire surface of the exposure surface can be uniformly illuminated with parallel rays, and the light can be made Since the cover and the substrate on which the colored composition layer are formed are correctly aligned, it is preferable to use an exposure apparatus such as a mask-aligner and a stepper.

藉由使曝光後的著色組成物層與顯影液接觸並顯影,在基板上形成著色圖案。藉由顯影,著色組成物層的未曝光部溶解在顯影液中,並被除去。 A colored pattern is formed on the substrate by bringing the exposed coloring composition layer into contact with the developing solution and developing it. By development, the unexposed portion of the colored composition layer is dissolved in the developer and removed.

作為顯影液,較佳是例如,氫氧化鉀、碳酸氫鈉、碳酸鈉、氫氧化四甲基銨等鹼性化合物的水溶液。此等鹼性化合物在水溶液中的濃度,是以0.01至10質量%為佳,以0.03至5質量%為更佳。又,顯影液也可以含有界面活性劑。 As the developer, for example, an aqueous solution of a basic compound such as potassium hydroxide, sodium hydrogencarbonate, sodium carbonate or tetramethylammonium hydroxide is preferred. The concentration of these basic compounds in the aqueous solution is preferably from 0.01 to 10% by mass, more preferably from 0.03 to 5% by mass. Further, the developer may contain a surfactant.

顯影方法,也可以是旋覆浸沒(Paddle)法、浸漬法、及噴霧法等的任何一種方法。而且,在顯影時也可以將基板傾斜為任意的角度。 The developing method may be any one of a paddle immersion method, a dipping method, and a spray method. Moreover, the substrate can be tilted at an arbitrary angle during development.

顯影後,以進行水洗為佳。 After development, it is preferred to perform water washing.

又,以對得到的著色圖案進行後烘烤為佳。後烘烤的溫度是以150至250℃為佳,以160至235℃為更佳。後烘烤的時間是以1至120分鐘為佳,以10至60分鐘為更佳。 Further, it is preferred to perform post-baking on the obtained colored pattern. The post-baking temperature is preferably 150 to 250 ° C, more preferably 160 to 235 ° C. The post-baking time is preferably from 1 to 120 minutes, more preferably from 10 to 60 minutes.

依據本發明的著色光敏性樹脂組成物,由於特別是在製造彩色濾光片方面可以有高良率,故該彩色濾光片是有用於作為顯示裝置(例如,液晶顯示裝置、有機EL裝置、電子書等)及固體攝影元件中所用的彩色濾光片。 According to the colored photosensitive resin composition of the present invention, since the color filter can have a high yield particularly in the production of a color filter, the color filter is used as a display device (for example, a liquid crystal display device, an organic EL device, or an electron). Books, etc.) and color filters used in solid-state imaging devices.

(實施例) (Example)

以下,根據實施例更詳細地說明本發明的著色光敏性樹脂組成物。 Hereinafter, the colored photosensitive resin composition of the present invention will be described in more detail based on examples.

例中的「%」及「份」若無特別限定,即是質量%及質量份。 In the example, "%" and "parts" are mass% and mass parts unless otherwise specified.

以下之合成例中,化合物是以質量分析(LC:Agilent製1200型,Mass;Agilent製LC/MSD型)來鑑定。 In the following synthesis examples, the compounds were identified by mass analysis (LC: Model 1200, manufactured by Agilent, Mass; LC/MSD type manufactured by Agilent).

[合成例1] [Synthesis Example 1]

將式(1x)所示之化合物20份與N-乙基-鄰甲苯胺(和光純藥工業股份有限公司製)200份在遮光條件下混合,並將得到的溶液在110℃攪拌6小時。將得到的反應液冷卻到室溫後,添加到水800份、35%鹽酸50份的混合液中,在室溫下攪拌1小時,即析出結晶。將析出的結晶當作吸引過濾的殘渣取得後加以乾燥,得到24份式(1-24)所示的化合物。收率為80%。 20 parts of the compound of the formula (1x) and 200 parts of N-ethyl-o-toluidine (manufactured by Wako Pure Chemical Industries, Ltd.) were mixed under light-shielding conditions, and the resulting solution was stirred at 110 ° C for 6 hours. After cooling the obtained reaction liquid to room temperature, it was added to a mixed liquid of 800 parts of water and 50 parts of 35% hydrochloric acid, and the mixture was stirred at room temperature for 1 hour to precipitate crystals. The precipitated crystal was taken as a residue for suction filtration, and dried to obtain 24 parts of the compound represented by the formula (1-24). The yield was 80%.

式(1-24)所示之化合物的同定:(質量分析)離子化模式=ESI+:m/z=[M+H]+603.4 The same formula of the compound represented by formula (1-24): (mass analysis) ionization mode = ESI +: m / z = [M + H] + 603.4

精確質量(Exact Mass):602.2 Exact Mass: 602.2

[合成例2] [Synthesis Example 2]

除了使用N-丙基-2,6-二甲基苯胺以取代N-乙基-鄰甲 苯胺之外,其餘進行與合成例1相同操作,可以得到式(1-32)所示的化合物。 In addition to using N-propyl-2,6-dimethylaniline instead of N-ethyl-ne-methyl Except for aniline, the same operation as in Synthesis Example 1 was carried out to obtain a compound represented by the formula (1-32).

式(1-32)所示之化合物的鑑定:(質量分析)離子化模式=ESI+:m/z=[M+H]+659.9 Identification of the compound of formula (1-32): (mass analysis) ionization mode = ESI +: m / z = [M + H] + 659.9

精確質量:658.9 Exact quality: 658.9

[合成例3] [Synthesis Example 3]

在備有冷卻管及攪拌裝置的燒瓶中,投入式(A0-1)所示之化合物及式(A0-2)所示之化合物之混合物(商品名Chugai Aminol Fast Pink R;中外化成製)15份、氯仿150份及N,N-二乙基甲醯胺8.9份,一面在攪拌下維持20℃以下,一面將亞硫醯氯10.9份滴下加入。滴下結束後,昇溫到50℃,並在同溫度中維持5小時使反應,之後冷卻到20℃。將冷卻後的反應溶液一面攪拌並維持在20℃以下,一面將2-乙基己基胺12.5份及三乙基胺22.1份之混合液滴下加入。之後,在同溫度中攪拌5小時以使其反應。之後,將得到的反應混合物以旋轉蒸發器餾去溶劑後,加入少量甲醇並激烈攪拌。將此混合物在一面攪拌下,一面加入到離子交換水375份的混合液中,使結晶析出。過濾析出之結晶,以離子交換水充分洗淨,並在60℃進行減壓乾燥,得到11.3份的氧雜蒽染料1[式(Aa-1-1)至式(Aa-1-8)所示之 化合物的混合物]。 In a flask equipped with a cooling tube and a stirring device, a mixture of a compound represented by the formula (A0-1) and a compound represented by the formula (A0-2) (trade name: Chugai Aminol Fast Pink R; manufactured by a Chinese company) 15 A portion, chloroform (150 parts) and N,N-diethylformamide (8.9 parts) were added dropwise to a solution of 10.9 parts of sulfinium chloride while maintaining the temperature at 20 ° C or lower while stirring. After the completion of the dropwise addition, the temperature was raised to 50 ° C, and the reaction was maintained at the same temperature for 5 hours, followed by cooling to 20 ° C. The cooled reaction solution was stirred and maintained at 20 ° C or lower, and a mixture of 12.5 parts of 2-ethylhexylamine and 22.1 parts of triethylamine was added dropwise. Thereafter, the mixture was stirred at the same temperature for 5 hours to cause a reaction. Thereafter, the obtained reaction mixture was distilled off with a rotary evaporator, and then a small amount of methanol was added and stirred vigorously. This mixture was added to a mixed liquid of 375 parts of ion-exchanged water while stirring to precipitate crystals. The precipitated crystal was filtered, washed thoroughly with ion-exchanged water, and dried under reduced pressure at 60 ° C to obtain 11.3 parts of xanthene dye 1 [formula (Aa-1-1) to formula (Aa-1-8) Show a mixture of compounds].

[合成例4] [Synthesis Example 4]

在備有回流冷卻器、滴下漏斗及攪拌機的燒瓶內適量流入氮,以取代成氮氣環境,投入丙二醇單甲基醚乙酸酯371份,一面攪拌一面加熱到85℃為止。其次,將丙烯酸54份、丙烯酸3,4-環氧基三環[5.2.1.02.6]癸-8-基酯及丙烯酸3,4-環氧基三環[5.2.1.02.6]癸-9-基酯的混合物(含有莫耳比為50:50)225份,並且,花費4小時將在丙二醇單甲基醚乙酸酯80份中溶解有乙烯基甲苯(異構物混合物)81份所調製的混合溶液滴下到燒瓶內。 In a flask equipped with a reflux condenser, a dropping funnel, and a stirrer, nitrogen was introduced in an appropriate amount to replace nitrogen gas, and 371 parts of propylene glycol monomethyl ether acetate was added, and the mixture was heated to 85 ° C while stirring. Next, 54 parts of acrylic acid, 3,4-epoxytricyclo[5.2.1.0 2.6 ]癸-8-yl acrylate and 3,4-epoxytricyclo[?.1.0 2.6 ]癸-9- a mixture of base esters (containing a molar ratio of 50:50) of 225 parts, and it takes 4 hours to prepare a solution of 81 parts of vinyl toluene (isomer mixture) dissolved in 80 parts of propylene glycol monomethyl ether acetate. The mixed solution was dropped into the flask.

另一方面,花費5小時將在丙二醇單甲基醚乙酸酯160份中溶解有聚合起始劑2,2-偶氮雙(2,4-二甲基戊腈)30份的溶液滴下。聚合起始劑溶液滴下結束後,在85℃中保持4小時後,冷卻到室溫,得到樹脂B1(共聚合物)溶液。樹脂B1溶液的固形分是37.5%,以B型黏度計(23℃)測定的黏度是246mPa.s。樹脂B1的重量平均分子量是1.06×104,分子量分布是2.01,固形分換算的酸價是115mg-KOH/g。樹脂B1具有以下的結構單元。 On the other hand, a solution in which 30 parts of the polymerization initiator 2,2-azobis(2,4-dimethylvaleronitrile) was dissolved in 160 parts of propylene glycol monomethyl ether acetate was dropped over 5 hours. After completion of the dropwise addition of the polymerization initiator solution, the mixture was kept at 85 ° C for 4 hours, and then cooled to room temperature to obtain a resin B1 (copolymer) solution. The solid content of the resin B1 solution was 37.5%, and the viscosity measured by the B type viscosity meter (23 ° C) was 246 mPa. s. The weight average molecular weight of the resin B1 was 1.06 × 10 4 , the molecular weight distribution was 2.01, and the acid value in terms of solid content was 115 mg-KOH/g. The resin B1 has the following structural unit.

[合成例5] [Synthesis Example 5]

在備有回流冷卻器、滴下漏斗及攪拌機的燒瓶內,將氮以0.02L/分鐘流入,以取代成氮氣環境,投入3-甲氧基 -1-丁醇200份及乙酸3-甲氧基丁基酯105份,一面攪拌一面加熱到70℃。其次,將在3-甲氧基丁基乙酸酯140份中溶解有甲基丙烯酸60份,以及丙烯酸3,4-環氧基三環[5.2.1.02.6]癸酯,即丙烯酸3,4-環氧基三環[5.2.1.02.6]癸烷-8-基酯及丙烯酸3,4-環氧基三環[5.2.1.02.6]癸烷-9-基酯的混合物(含有莫耳比50:50)240份,,以調製成溶液,並將該溶液使用滴下漏斗花費4小時滴下到保溫在70℃的燒瓶內。 In a flask equipped with a reflux condenser, a dropping funnel and a stirrer, nitrogen was introduced at 0.02 L/min to replace the nitrogen atmosphere, and 200 parts of 3-methoxy-1-butanol and 3-methoxyacetic acid were charged. 105 parts of butyl ester was heated to 70 ° C while stirring. Next, 60 parts of methacrylic acid and 3,4-epoxytricyclo[5.2.1.0 2.6 ]decyl acrylate, ie, acrylic acid 3, 4, are dissolved in 140 parts of 3-methoxybutyl acetate. a mixture of epoxycyclotricyclo[5.2.1.0 2.6 ]decane-8-yl ester and 3,4-epoxytricyclo[5.2.1.0 2.6 ]decane-9-yl acrylate (containing molar ratio) 50:50) 240 parts, to prepare a solution, and the solution was dropped into a flask kept at 70 ° C for 4 hours using a dropping funnel.

另一方面,將3-甲氧基丁基乙酸酯225份中溶解有聚合起始劑2,2’-偶氮雙(2,4-二甲基戊腈)30份的溶液,使用其他的漏斗花費4小時滴下到燒瓶內。聚合起始劑之溶液滴下結束後,在70℃保持4小時,然後冷卻到室溫,得到固形分33質量%的樹脂B2(共聚物)溶液。樹脂B2的重量平均分子量是1.3×104,分子量的分布是2.5,固形分換算的酸價是103mg-KOH/g。樹脂B2具有以下的結構單元。 On the other hand, a solution of 30 parts of a polymerization initiator 2,2'-azobis(2,4-dimethylvaleronitrile) was dissolved in 225 parts of 3-methoxybutyl acetate, and other solutions were used. The funnel took 4 hours to drip into the flask. After completion of the dropwise addition of the solution of the polymerization initiator, the mixture was kept at 70 ° C for 4 hours, and then cooled to room temperature to obtain a resin B 2 (copolymer) solution having a solid content of 33% by mass. The weight average molecular weight of the resin B2 was 1.3 × 10 4 , the molecular weight distribution was 2.5, and the acid value in terms of solid content was 103 mg-KOH/g. The resin B2 has the following structural unit.

合成例得到的樹脂重量平均分子量(Mw)及數量平均分子量(Mn)的測定,是使用GPC法,用以下的條件進行。 The measurement of the weight average molecular weight (Mw) and the number average molecular weight (Mn) of the resin obtained in the synthesis example was carried out under the following conditions using a GPC method.

裝置:K2479(島津製作所股份有限公司製) Device: K2479 (made by Shimadzu Corporation)

管柱:SHIMADZU Shim-pack GPC-80M Column: SHIMADZU Shim-pack GPC-80M

管柱溫度:40℃ Column temperature: 40 ° C

溶劑:THF(四氫呋喃) Solvent: THF (tetrahydrofuran)

流速:1.0mL/分鐘 Flow rate: 1.0 mL/min

檢出器:RI Detector: RI

校正用標準物質:TSK STANDARD POLYSTYRENE F-40、F-4、F-288、A-2500、A-500(TOSOH股份有限公司製) Standard materials for calibration: TSK STANDARD POLYSTYRENE F-40, F-4, F-288, A-2500, A-500 (manufactured by TOSOH Co., Ltd.)

將上述得到的換算聚苯乙烯之重量平均分子量及數量平均分子量的比(Mw/Mn)作為分子量分布。 The ratio (Mw/Mn) of the weight average molecular weight and the number average molecular weight of the converted polystyrene obtained above was defined as a molecular weight distribution.

實施例1至8及比較例1 Examples 1 to 8 and Comparative Example 1

(著色光敏性樹脂組成物之調製) (Modulation of coloring photosensitive resin composition)

以成為在表1及表2中所示組成之方式,將各成分混合,可得到著色光敏性樹脂組成物。 The components of the composition shown in Tables 1 and 2 were mixed to obtain a colored photosensitive resin composition.

表1及表2中,「A2-1」是使用將丙烯酸系顏料分散劑及「E-12)」欄記載量之丙二醇單甲基醚乙酸酯及「E-22)」欄記載量之丙二醇單甲基醚混合並預先分散者。 In Tables 1 and 2, "A2-1" is described in the column of "propylene glycol monomethyl ether acetate and "E-2 2) " in the column of "acrylic pigment dispersant and "E-1 2) ". The amount of propylene glycol monomethyl ether is mixed and pre-dispersed.

「E-11)」欄表示丙二醇單甲基醚乙酸酯含有量的合計,「E-21)」欄表示丙二醇單甲基醚含有量的合計。 The column "E-1 1) " indicates the total content of propylene glycol monomethyl ether acetate, and the column "E-2 1) indicates the total amount of propylene glycol monomethyl ether.

表1及表2中,各成分是表示以下者。樹脂(B)是表示固形分換算之含有量(份)。 In Tables 1 and 2, each component represents the following. The resin (B) is a content (parts) indicating a solid content conversion.

著色劑(A):A1-1;式(1-32)所示之化合物 Colorant (A): A1-1; a compound represented by formula (1-32)

著色劑(A):A1-2;氧雜蒽染料1 Colorant (A): A1-2; xanthene dye 1

著色劑(A):A2-1;C.I.顏料藍15:6(顏料) Colorant (A): A2-1; C.I. Pigment Blue 15:6 (pigment)

著色劑(A):A3-1;C.I.直接藍(C.I.direct blue)264與十二基苯磺酸之鹽(Orient化學工業股份有限公司製)(酞青素染料) Coloring agent (A): A3-1; C.I. direct blue (C.I. direct blue) 264 and dodecylbenzenesulfonic acid salt (Orient Chemical Industry Co., Ltd.) (anthraquinone dye)

樹脂(B):B-1;樹脂B1 Resin (B): B-1; Resin B1

樹脂(B):B-2;樹脂B2 Resin (B): B-2; Resin B2

聚合性化合物(C):二新戊四醇六丙烯酸酯(日本化藥股份有限公司製;KAYARAD(註冊商標)DPHA) Polymerizable compound (C): dipentaerythritol hexaacrylate (manufactured by Nippon Kayaku Co., Ltd.; KAYARAD (registered trademark) DPHA)

聚合起始劑(D):D-1;下述式所示之化合物的混合物(CHEMCURE-TCDM;Cambridge公司製;聯咪唑化合物) Polymerization initiator (D): D-1; a mixture of compounds represented by the following formula (CHEMCURE-TCDM; manufactured by Cambridge; biimidazole compound)

聚合起始劑(D):D-2;N-苯甲醯氧基-1-(4-苯基巰基苯基)辛烷-1-酮-2-亞胺(IRGACURE(註冊商標)OXE01;BASF公司製) Polymerization initiator (D): D-2; N-benzylideneoxy-1-(4-phenylmercaptophenyl)octane-1-one-2-imine (IRGACURE (registered trademark) OXE01; BASF company)

硫醇化合物(T):2-巰基苯并噻唑 (Sanceler(註冊商標)M;三新化學工業股份有限公司製) Thiol compound (T): 2-mercaptobenzothiazole (Sanceler (registered trademark) M; Sanshin Chemical Industry Co., Ltd.)

溶劑(E):E-1;丙二醇單甲基醚乙酸酯 Solvent (E): E-1; propylene glycol monomethyl ether acetate

溶劑(E):E-2;丙二醇單甲基醚 Solvent (E): E-2; propylene glycol monomethyl ether

溶劑(E):E-3;乳酸乙酯 Solvent (E): E-3; ethyl lactate

溶劑(E):E-4;3-甲氧基-1-丁醇 Solvent (E): E-4; 3-methoxy-1-butanol

溶劑(E):E-5;乙酸3-甲氧基丁基酯 Solvent (E): E-5; 3-methoxybutyl acetate

調平劑(F):聚醚改質聚矽氧油(Toray Silicone SH8400;東麗.道康寧股份有限公司製) Leveling agent (F): Polyether modified polyoxygenated oil (Toray Silicone SH8400; manufactured by Toray Dow Corning Co., Ltd.)

〈著色圖案的製作〉 <Production of Coloring Patterns>

在5公分見方的玻璃基板(Eagle 2000;康寧公司製)上,以旋轉塗佈法塗佈著色光敏性樹脂組成物之後,在100℃預烘烤3分鐘,形成著色組成物層。放冷後,將形成有著色組成物層的基板與石英玻璃製光罩之間隔設成100μm,並使用曝光機(TME-150RSK;Topcone股份有限公司製),在大氣環境下,以60mJ/cm2的曝光量(365nm基準)進行照光。作為光罩者,是使用形成有100μm的線與間隙之圖案(line and space pattern)者。將光照射後的著色組成物層,在含有非離子系界面活性劑0.12%與氫氧化鉀0.04%的水系顯影液中,於26℃浸漬60秒,使其顯影,並在水洗後,在烘烤箱中以230℃進行後烘烤20分鐘,可得到著色圖案。 The colored photosensitive resin composition was applied by a spin coating method on a glass substrate (Eagle 2000; manufactured by Corning Incorporated) of 5 cm square, and then prebaked at 100 ° C for 3 minutes to form a colored composition layer. After cooling, the distance between the substrate on which the colored composition layer was formed and the mask made of quartz glass was set to 100 μm, and an exposure machine (TME-150RSK; manufactured by Topcone Co., Ltd.) was used, and in an atmosphere, 60 mJ/cm. The exposure amount of 2 (365 nm reference) was illuminated. As the reticle, a line and space pattern in which 100 μm is formed is used. The colored composition layer after the light irradiation was immersed in an aqueous developing solution containing 0.12% of a nonionic surfactant and 0.04% of potassium hydroxide at 26 ° C for 60 seconds to be developed, and after washing with water, it was baked. Post-baking at 230 ° C for 20 minutes in the oven gave a colored pattern.

〈膜厚評估〉 <Thickness evaluation>

有關得到之著色圖案,膜厚的測定是使用膜厚測定裝置(DEKTAK 3;日本真空技術股份有限公司製)來進行。 The film thickness of the obtained coloring pattern was measured using a film thickness measuring device (DEKTAK 3; manufactured by Nippon Vacuum Technology Co., Ltd.).

〈色度評估〉 <Color Evaluation>

有關得到之著色圖案,分光是使用測色機(OSP-SP-200;奧林巴斯股份有限公司製)來測定,使用C光源的特性係數測定CIE的XYZ表色系中之xy色度坐標(x、y)與三刺激值Y。Y的值愈大表示亮度愈高。將結果在表2中表示。 Regarding the obtained color pattern, the spectroscopic measurement was performed using a color measuring machine (OSP-SP-200; manufactured by Olympus Co., Ltd.), and the xy chromaticity coordinate in the XYZ color system of CIE was measured using the characteristic coefficient of the C light source. (x, y) and tristimulus value Y. The larger the value of Y, the higher the brightness. The results are shown in Table 2.

〈剝離片的觀察〉 <Observation of peeling sheet>

對於製作的著色圖案,以目視觀察顯影後的顯影液。將在顯影液中,源自著色光敏性樹脂組成物的剝離片,以確認不出的情形當作○,確認有剝離片的情形當作X。當確認到顯影液中有源自著色光敏性樹脂組成物的剝離片時,則由於在圖案上附著的雜質有成為圖案不良的原因之虞,故為不佳。將結果在表3中表示。 The developed developer was visually observed for the colored pattern produced. In the developing solution, the peeling sheet derived from the coloring photosensitive resin composition was confirmed to be ○ when it was not confirmed, and the case where the peeling sheet was confirmed was regarded as X. When it is confirmed that the release sheet derived from the coloring photosensitive resin composition is present in the developer, the impurities adhering to the pattern may cause defects in the pattern, which is not preferable. The results are shown in Table 3.

實施例9 Example 9

除了使用式(1-24)所示之化合物以取代式(1-32)所示之化合物之外,其餘進行與實施例1相同操作而得到著色光敏性樹脂組成物,進行與上述相同的操作,可得到在顯影液中不會發生剝離片,高亮度的著色圖案。 The same procedure as in Example 1 was carried out except that the compound of the formula (1-24) was used instead of the compound of the formula (1-3) to obtain a colored photosensitive resin composition, and the same operation as above was carried out. It is possible to obtain a high-brightness coloring pattern in which a peeling sheet does not occur in the developer.

實施例10 Example 10

除了使用式(1-24)所示之化合物以取代式(1-32)所示之化合物之外,其餘進行與實施例6相同的操作,可以得到著色光敏性樹脂組成物,進行與上述相同之操作,在顯影液中不會產生剝離片,可得到高亮度的著色圖案。 The same procedure as in Example 6 was carried out except that the compound of the formula (1-24) was used instead of the compound of the formula (1-3), and a colored photosensitive resin composition was obtained, which was carried out in the same manner as above. In the operation, a release sheet is not generated in the developer, and a high-brightness coloring pattern can be obtained.

由上述結果可知,依據本發明的著色光敏性樹脂組成物的話,在顯影後的顯影液中,確認不出有剝離片。又,可以確認由本發明的著色光敏性樹脂組成物製造的著色圖案之亮度高。由此,若依據本發明的著色光敏性樹脂組成物,即可以高良率製造亮度優異的彩色濾光片。 From the above results, it is understood that, in the case of the colored photosensitive resin composition of the present invention, it is confirmed that the release sheet is not formed in the developer after development. Moreover, it was confirmed that the color pattern produced by the colored photosensitive resin composition of the present invention has high brightness. Thus, according to the colored photosensitive resin composition of the present invention, a color filter excellent in brightness can be produced at a high yield.

依據本發明的著色光敏性樹脂組成物的話,在顯影後的顯影液中,較少產生源自著色光敏性樹脂組成物的剝離片。 According to the colored photosensitive resin composition of the present invention, a release sheet derived from the colored photosensitive resin composition is less likely to be produced in the developer after development.

Claims (6)

一種著色光敏性樹脂組成物,其係含有著色劑、樹脂、聚合性化合物、聚合起始劑及硫醇化合物;著色劑含有氧雜蒽(Xanthene)染料與顏料,聚合起始劑含有聯咪唑化合物或是O-醯基肟化合物。 A colored photosensitive resin composition containing a colorant, a resin, a polymerizable compound, a polymerization initiator, and a thiol compound; the colorant contains a xanthene dye and a pigment, and the polymerization initiator contains a biimidazole compound Or an O-indenyl compound. 如申請專利範圍第1項所述之著色光敏性樹脂組成物,其中,氧雜蒽染料含有式(1a)所示之化合物, [式(1a)中,R1至R4是各自獨立,表示氫原子、可具有取代基之碳數1至20的1價飽和烴基、或是可具有取代基之碳數6至10的1價芳香族烴基,該飽和烴基中含有之-CH2-亦可經-O-、-CO-或-NR11-置換;R1及R2也可以與鄰接之氮原子一同形成環,且R3及R4也可以與鄰接之氮原子一同形成環,R5表示-OH、-SO3 -、-SO3H、-SO3 -Z+、-CO2H、-CO2 -Z+、-CO2R8、-SO3R8、或是-SO2NR9R10;R6及R7是各自獨立,表示氫原子、或是碳數1至6的烷基;m表示0至5的整數,m是2以上時,複數個R5 可以相同也可以相異,a表示0或是1的整數,X表示鹵原子,Z+表示+N(R11)4、Na+或是K+,4個R11可以相同也可以是相異;R8表示碳數1至20的1價飽和烴基,在該飽和烴基中含有之氫原子亦可經鹵原子取代;R9及R10是各自獨立,表示氫原子或是可具有取代基之碳數1至20的1價飽和烴基,在該飽和脂肪族烴基中含有之-CH2-亦可經-O-、-CO-、-NH-或是-NR8-置換;R9及R10也可以與鍵結之鄰接氮原子一同形成3至10員之含氮雜環;R11表示氫原子、碳數1至20的1價飽和烴基、或是碳數7至10之芳烷基]。 The colored photosensitive resin composition according to claim 1, wherein the xanthene dye contains a compound represented by the formula (1a), [In the formula (1a), R 1 to R 4 are each independently a hydrogen atom, a monovalent saturated hydrocarbon group having 1 to 20 carbon atoms which may have a substituent, or a carbon number 6 to 10 which may have a substituent. a valent aromatic hydrocarbon group, the -CH 2 - contained in the saturated hydrocarbon group may also be substituted by -O-, -CO- or -NR 11 -; R 1 and R 2 may also form a ring together with the adjacent nitrogen atom, and R 3 and R 4 may form a ring together with an adjacent nitrogen atom, and R 5 represents -OH, -SO 3 - , -SO 3 H, -SO 3 - Z + , -CO 2 H, -CO 2 - Z + , -CO 2 R 8 , -SO 3 R 8 or -SO 2 NR 9 R 10 ; R 6 and R 7 are each independently a hydrogen atom or an alkyl group having 1 to 6 carbon atoms; m represents 0 to An integer of 5, when m is 2 or more, a plurality of R 5 may be the same or different, a represents an integer of 0 or 1, X represents a halogen atom, and Z + represents + N(R 11 ) 4 , Na + or K + , 4 R 11 may be the same or different; R 8 represents a monovalent saturated hydrocarbon group having 1 to 20 carbon atoms, and a hydrogen atom contained in the saturated hydrocarbon group may be substituted by a halogen atom; R 9 and R 10 Is a self-independent, representing a hydrogen atom or a monovalent saturated hydrocarbon group having 1 to 20 carbon atoms which may have a substituent, The -CH 2 - contained in the saturated aliphatic hydrocarbon group may also be substituted by -O-, -CO-, -NH- or -NR 8 -; R 9 and R 10 may also form together with the bonded adjacent nitrogen atom. A nitrogen-containing heterocyclic ring to 10 members; R 11 represents a hydrogen atom, a monovalent saturated hydrocarbon group having 1 to 20 carbon atoms, or an aralkyl group having 7 to 10 carbon atoms. 如申請專利範圍第1或2項所述之著色光敏性樹脂組成物,其中,聚合起始劑含有聯咪唑化合物。 The colored photosensitive resin composition according to claim 1 or 2, wherein the polymerization initiator contains a biimidazole compound. 如申請專利範圍第1或2項所述之著色光敏性樹脂組成物,其中,聚合起始劑含有O-醯基肟化合物。 The colored photosensitive resin composition according to claim 1 or 2, wherein the polymerization initiator contains an O-mercaptopurine compound. 一種彩色濾光片,其係由申請專利範圍第1至4項中任一項所述之著色光敏性樹脂組成物所形成。 A color filter formed of the colored photosensitive resin composition according to any one of claims 1 to 4. 一種顯示裝置,其係含有申請專利範圍第5項所述之彩色濾光片。 A display device comprising the color filter of claim 5 of the patent application.
TW102120268A 2012-06-11 2013-06-07 Colored photosensitive resin composition, color filter and display device TWI602021B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2012131591A JP6015150B2 (en) 2012-06-11 2012-06-11 Colored photosensitive resin composition
JP2012131592A JP6015151B2 (en) 2012-06-11 2012-06-11 Colored photosensitive resin composition

Publications (2)

Publication Number Publication Date
TW201403234A true TW201403234A (en) 2014-01-16
TWI602021B TWI602021B (en) 2017-10-11

Family

ID=49828378

Family Applications (2)

Application Number Title Priority Date Filing Date
TW102120268A TWI602021B (en) 2012-06-11 2013-06-07 Colored photosensitive resin composition, color filter and display device
TW106115969A TWI617886B (en) 2012-06-11 2013-06-07 Colored photosensitive resin composition, color filter and display device

Family Applications After (1)

Application Number Title Priority Date Filing Date
TW106115969A TWI617886B (en) 2012-06-11 2013-06-07 Colored photosensitive resin composition, color filter and display device

Country Status (3)

Country Link
KR (1) KR102066287B1 (en)
CN (1) CN103488050A (en)
TW (2) TWI602021B (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI748137B (en) * 2017-11-10 2021-12-01 南韓商東友精細化工有限公司 Colored curable resin composition, color filter and display device
KR102355812B1 (en) * 2017-12-05 2022-01-26 동우 화인켐 주식회사 Colored Photosensitive Resin Composition, Color Filter and Display Device
CN109991808A (en) * 2018-01-02 2019-07-09 东友精细化工有限公司 Green photonasty resin composition, colored filter and image display device
KR102441365B1 (en) * 2018-02-14 2022-09-06 동우 화인켐 주식회사 A green photosensitive resin composition, color filter and display device comprising the same
KR102268234B1 (en) * 2018-09-18 2021-06-22 주식회사 엘지화학 Compound, colorant composition, photosensitive resin composition, photoresist, color filter, and display device
KR20210127982A (en) * 2019-02-18 2021-10-25 스미또모 가가꾸 가부시키가이샤 Colored curable resin composition, color filter and display device

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101093355B (en) * 2006-06-23 2013-07-10 富士胶片株式会社 Compound, photosensitive combination, solidified combination, solidified combination for filter, color filter and manufacturing method thereof
JP4935565B2 (en) * 2007-08-01 2012-05-23 住友化学株式会社 Photosensitive resin composition
JP5305704B2 (en) * 2008-03-24 2013-10-02 富士フイルム株式会社 Novel compound, photopolymerizable composition, photopolymerizable composition for color filter, color filter and method for producing the same, solid-state imaging device, and lithographic printing plate precursor
TWI455984B (en) * 2008-05-30 2014-10-11 Sumitomo Chemical Co Colored hardening composite
CN101625525B (en) * 2008-07-11 2013-06-12 住友化学株式会社 Light-sensitive resin composition
TWI512397B (en) * 2009-06-24 2015-12-11 Sumitomo Chemical Co Coloring the fake composition
CN102472849B (en) * 2009-08-12 2014-12-03 住友化学株式会社 Display device
JP5620774B2 (en) * 2009-10-15 2014-11-05 住友化学株式会社 Resin composition
JP2011118369A (en) * 2009-10-28 2011-06-16 Sumitomo Chemical Co Ltd Colored photosensitive resin composition
KR20120021752A (en) * 2010-08-16 2012-03-09 동우 화인켐 주식회사 A colored photosensitive resin composition, color filter and liquid crystal display device having the same
JP5957905B2 (en) * 2011-02-25 2016-07-27 Jsr株式会社 Pixel pattern forming method, color filter, display element, and colored radiation-sensitive composition
JP5962042B2 (en) * 2011-02-28 2016-08-03 住友化学株式会社 Colored curable resin composition
JP5696091B2 (en) * 2011-04-25 2015-04-08 富士フイルム株式会社 Photosensitive resin composition, color filter, protective film, photospacer, substrate for liquid crystal display device, liquid crystal display device and solid-state imaging device
TWI546574B (en) * 2011-06-01 2016-08-21 Jsr股份有限公司 Coloring composition, color filter and display element
JP5539429B2 (en) * 2012-03-19 2014-07-02 富士フイルム株式会社 Colored photosensitive composition, color filter, method for producing color filter, and liquid crystal display device
JP2013205820A (en) * 2012-03-29 2013-10-07 Fujifilm Corp Colored curable composition, color filter, manufacturing method of color filter, liquid crystal display device, organic el display device, and solid state imaging element
JP5770672B2 (en) * 2012-03-30 2015-08-26 富士フイルム株式会社 Colored curable composition, color filter, method for producing color filter, and display device

Also Published As

Publication number Publication date
KR20130138680A (en) 2013-12-19
TW201730676A (en) 2017-09-01
TWI602021B (en) 2017-10-11
TWI617886B (en) 2018-03-11
KR102066287B1 (en) 2020-01-14
CN103488050A (en) 2014-01-01

Similar Documents

Publication Publication Date Title
TWI582174B (en) Colored photosensitive resin composition
TWI534209B (en) Salt and colored curable composition
TWI544035B (en) Colored curable resin composition
TWI764863B (en) Colored curable resin composition
TWI550347B (en) Colored photosensitive resin composition
TWI733945B (en) Colored curable resin composition, color filter formed from the colored curable resin composition and display device including the color filter
TWI578105B (en) Coloring the photosensitive resin composition
TWI602021B (en) Colored photosensitive resin composition, color filter and display device
TWI591435B (en) Colored photosensitive resin composition
TW201631390A (en) Colored curable resin composition
TWI565759B (en) Colored curable resin composition
TW201623482A (en) Colored curable resin composition
TW201821416A (en) Compound and colored curable resin composition
JP6672725B2 (en) Colored curable resin composition
TWI770053B (en) Colored curable resin composition, color filter, and display device
JP7075724B2 (en) Compounds, coloring compositions, textile materials, color filters, and display devices
TWI748947B (en) Coloring curable resin composition
TWI615680B (en) Colored photosensitive resin composition
TWI570507B (en) Colored photosensitive resin composition
JP6015151B2 (en) Colored photosensitive resin composition
TWI746612B (en) Compound, coloring composition, fiber material, color filter and display device
JP6015150B2 (en) Colored photosensitive resin composition
JPWO2020170944A1 (en) Color curable resin composition, color filter and display device
TWI815989B (en) Colored curable resin compositions, color filters, display elements and solid-state imaging elements
JP6168183B2 (en) Colored photosensitive resin composition