TW201351473A - Mass analyzer apparatus and systems operative for focusing ribbon ion beams and for separating desired ion species from unwanted ion species in ribbon ion beams - Google Patents

Abstract

The present invention is an apparatus and multi-unit assembly which is able to achieve two different and highly desirable functions: A focusing of a charged particle beam; and a mass separation of desired ion species from unwanted ion species in traveling ion beams. The apparatus is a simply organized and easily manufactured article; is relatively light-weight and less expensive to make; and is easier to install, align, and operate than conventionally available devices.

Description

A mass analyzer device and system for focusing a ribbon ion beam and for separating a desired ion species in a ribbon ion beam from a superfluous ion species Priority claim

The present invention is US Provisional Patent Application Serial No. 61/465,303, filed on March 17, 2011. It is hereby expressly stated the priority date and legal rights of the first application.

The present invention relates to a magnetic lens which is a ribbon ion beam applied to an ion implantation apparatus and system for mass selection of desired ions and focusing. In such systems, the ribbon ion beam and lens will ideally have planar symmetry with a constant cross-section of width dimension that spans many times greater than the narrow beam size.

Thinking about related facts and history

The use of a magnetic lens for the focusing system is well known and well known; and The use of offset magnetic quadrupole lenses to separate particles of poor stiffness (e.g., different charge states in cascaded van derrick accelerators) is well known in the art.

It is desirable to purify a large ribbon ion beam by mass selection for the purpose of ion implantation into a large substrate such as a flat panel display and a solar cell. A desirable feature of a magnetic device that can be extended and extended to any size is that the generated magnetic field should not have a portion of this length extending dimension. Otherwise, as the device extends over this length dimension, the required number of ampere turns to produce the desired field increases, there is a tendency for flux leakage to flow from the device, and the size and weight of the device grows inconveniently. The occurrence of either or both of these events is undesirable; however, these unfavorable factors continue to recur and must be routinely compensated - as in fact, it is currently known to use these extended-displaced magnetic fields for mass separation.

On the other hand, the magnetic field lying flat in the plane of movement of the ion travel trajectory does not directly direct any useful deflection or dispersion in this plane. The focus of the plasma travel path will typically occur when the field gradient is presented; and an important example is the well-known condition of the focus between the oblique entrance and the exit magnetic pole of the dipole magnet, where the focus is produced in the fringe field [eg Enge in several publications) This is illustrated by Septier and his editor, Focusing on Charged Particles, Volume 2, Chapter 4.2, page 203, AP (1967); and APBanford's Transport of Charged Particle Beams (Spon, 1966).

Facts about relevant know-how

1. By the color difference of an analog glass lens, as described by Sir Isaac Newton in "Opticks., Fourth Edition, London, 1730" The color difference in ion and electron lenses is identified and defined as the change in the focus or deflection strength of the lens as a function of the ion property known as "magnetic stiffness" and is defined as the ratio of momentum to charge. The ion deflection in the magnetic field is inversely proportional to the magnetic stiffness.

To assist in the proper understanding of the prior art, the prior art Figure 1a shows a conventional magnetic quadrupole lens; and the prior art Figure 1b shows a triplet of such lenses through which the ion beam passes off center. The ion beam of differential magnetic stiffness exits the lens in different directions with respect to the fact that the different color beams pass off-center through the alternating focus and defocusing lenses. In this case, it is desirable that the beam is undeflected but in fact undergoes several useful focusing. Eastham, Joy, and Tait disclosed the use of this device in 1973 ["Nuclear Instruments and Methods", Vol. 117, pp. 495-500, 1974] to separate ions of the same momentum, but with differential charges. Thus, the use of an offset quadrupole magnetic lens for selecting a particular mass of ions (mass selection) from a beam containing other ion species is clearly an extension of this technique.

In addition, Aitken revealed in 2002 that a focusing device with chromatic aberration was applied to separate the ribbon ion beam [detailed Aitken, 14th International Conference on Ion Implantation Technology, pp. 448-451, IEEE, 2002]. Attention is directed to the prior art Figure 2a, which depicts the device first shearing the ribbon ion beam in one direction, followed by the other direction (Aitken, 2002). The side view shown in Figure 2b of the prior art depicts a strong focus accompanying such shearing effects, and is also depicted using a beam on the midplane to intercept unwanted ion species. Note also points to the prior art Figure 2c, which shows the travel path of an ion beam having different magnetic stiffnesses, thereby exhibiting potentially useful mass separation properties.

2. Furthermore, it is known that microwave ion sources typically utilize a cylindrically symmetric helical magnetic field. Thus, for example, in the "Eaton Nova NV200" oxygen ion implanter (commercially available in 1987), an additional solenoid is used to focus the cylindrical ion beam. In 1990, the slotted aperture was used in a newer version of the IBIS Technologies ion source and appeared as a commercially available "IBIS 1000" ion implanter. The amount of shear of the ion beam caused by the modification of the solenoid to plane symmetry is then evaluated and correctly determined.

This effect is illustrated by the Busch theorem, which states that the amount of angular momentum transmitted to a charged particle beam passing through two continuous planes is proportional to the change in the magnetic flux through the cross section of the beam of the reference plane. However, if the traveling particle beam is not cylindrically symmetric, this angular momentum appears as a shearing effect. Assuming that the ion beam system is used at an energy of about 50 keV or more, it is found that the shear in the IBIS 1000 ion implanter is significant but tolerable, but at a lower energy it will have an adverse effect.

Modifying the focus properties based on the traveling ribbon ion beam and based on the combination of the corresponding magnetic component with plane symmetry (relative to those with cylindrical symmetry)--shearing, the resulting skewed trajectory, and the passage of ions through the axial field . Focusing is produced by a combination of ions passing through the fringe field path (which causes skew) and subsequent interaction of the ions with the spiral field. Thus, useful focus can sometimes be displayed as a shear after the ribbon ion beam is traveled under appropriate set and maintained operating conditions.

It should also be noted here that the use of a relative spiral field (a common method of avoiding image rotation in an electron lens) may be used to reduce the shear of the traveling ribbon beam. In the 1990-1991 technical aspect, this possible capability seems to Not worth adding to the complexity of ribbon ion beam applications. However, based on the development of the past 20 years, the use of ribbon ion beams and lower energy is common (if not a true industry standard); and the diversification of the basic 1990-1991 system concept has many practical applications and significant developments.

Today's real technology needs and outlook

In today's technology, most of the interest has been directed to methods for separating desired ion species from unwanted or contaminant ion species in a deliberately prepared ribbon ion beam; at the same time, along with the desired axial dimension in the ribbon beams And the increase in current will take advantage of new applications of the plasma injection system (such as doped flat panel displays and the manufacture of large area solar cells). An example of an analyzer device for purifying a ribbon ion beam has included a conventional analytical magnet that bends a traveling ion beam in a plane of its major dimensions [see, for example, U.S. Patent No. 5,350,925]; and a modified magnet The ion beam is curved in a plane of smaller size [see, for example, U.S. Patent No. 7,112,789].

A. Several recent developments in the analysis of large ribbon ion beams include: Sato sash magnet assemblies comprising two pairs of coils orthogonally disposed within a window yoke [US Patent Publication No. 2008/0078956; U.S. Patent No. The White & Chen ribbon ion beam system described in U.S. Patent No. 7,326,941 and U.S. Patent No. 7,902,527, the entire disclosure of which is incorporated herein by reference.

As described in U.S. Patent No. 7,528,390, the Sato device uses a sash magnet combined with two pairs of coils, each of which can be separately activated to control The deflection of the two orthogonal directions. If the apparatus is enlarged to allow the passage to be substantially larger than the ribbon beam, the desired number of ampoules will grow in proportion to the major transverse dimension of the bundle - a violation of the stated objectives of the present invention. As a result, Sato equipment cannot or does not meet the demand.

Similarly, the apparatus described by White & Chen in U.S. Patent No. 7,326,941 and U.S. Patent No. 7,902,527, which utilizes the form of the magnets described in U.S. Patent No. 7,112,789, suffers from the same disadvantage: any beam size increase needs to be proportional Increase the ampere. This does increase the power demand, and the weight of the equipment will grow at a faster rate because the increased steel cross section needs to include the deviating magnetic field generated by the larger device.

All of these devices in which the primary magnetic field component is aligned with the major lateral dimensions of the ion beam must exhibit the dual disadvantages of increasing the amperage in proportion to the beam size and deviating from the magnetic field.

Other magnetic devices used in Chen & White equipment (according to U.S. Patent Nos. 7,105,839; No. 7,078,713; and No. 8,035,087, which are used to focus and control the uniformity and direction of the ion beam) can be amplified for larger size ion beams, Because the magnetic field is not aligned with the main lateral direction of the beam - it does not separate beams of different masses, or provides scalable one-dimensional focusing in the lateral direction of the ribbon ion beam without providing an overwhelming excess defocusing effect along the major dimensions. This is not its intended use and exceeds its structural and functional capabilities.

B. Alternative work in this area of the art has used alternative models for focusing and controlling the uniformity and direction of the traveling ion beam. Depicting and representing only a few other attempts to achieve this goal: Aitken method [ion implantation technique The 14th International Conference, pp. 448-451, IEEE, 2002] presents a conceptual model for the fabrication of such devices from six-pole magnets; and the Benveniste et al. conceptual model (US Patent Publication No. 2010/0116983) , which causes the structural design and requirements of the closed frame of the plurality of solenoid coils that are sleeved together. An overview of each of these alternative models is presented below.

(i) The Aitken method has been described in detail above and is depicted by the prior art figures 2a, 2b, and 2c, respectively. As explained by Enge and Banford (mentioned above), Aitken utilizes the focus available in the rising and falling transverse magnetic fields while shearing the ribbon ion beam with the greatest possible amount without returning the beam (detail 2a); The abrupt internal focus, which itself reduces the quality of the bundle. Moreover, it should be noted that the Aitken plot exaggerates the narrow size, and the Aitken original map only indicates the ability to accept the bundle by a full angle of about 1 degree.

On the basis of this fact, and especially since the Aitken device is operating on the edge that is completely turned around the beam, third-order aberrations will seriously degrade the beam transmission quality if a more realistic beam angle is considered - the true actual beam angle is typical The ground is a full angle of 4 degrees along the narrow dimension of the beam. Thus, although the Aitken method can be extended in the lateral direction to any degree without increasing the amperage requirement, the model system operates in a manner that requires very small beam size and beam angle expansion; is substantially more complex and large in construction; Coils and power supply.

(ii) The Benveniste et al. method and model system transmits an ion beam through a solenoid coil pair; and a steel yoke is used to concentrate the magnetic flux to the beam Inside. It is worth noting that the solenoid coil itself is not circular; rather, the solenoid coil is elongated to match the shape of the ribbon beam.

Solenoid coils have long been used to focus electron beams and are well known in cathode ray tubes and electron microscopes. Furthermore, it is well known to use a pair of opposing solenoids to achieve focus without rotating the beam - in fact, this pairing is critical in achieving high resolution. However, the application of solenoid coils to high aspect ratio ribbon ion beams is the most recent; and as described earlier in the context of the IBIS ion implanter, the rotation of the beam becomes a shearing effect. Therefore, it is invariable that the angular momentum must be induced to the beam according to the Busch theorem; therefore, the Benveniste et al. method and model system use a relative solenoid pair to restore the unrotated state to the traveling ion beam.

Benveniste et al. invented the need to process several of the bundles identified above, but the disclosed method and model system are substantially different in many of the main features and are unable to address a need or a real need. The most significant of these differences and deficiencies are as follows:

(a) The Benveniste et al. method requires the ion beam to be transmitted by maintaining the spatial volume of the aperture of each solenoid coil in the aligned solenoid coil pair. Specifically, Benveniste et al. stated that "...each solenoid coil has a runway configuration that defines the ion beam travel space...".

(b) Because each solenoid coil pair must be completely surrounded by the ion beam in a Benveniste et al. device, and the vacuum chamber must contain and contain the traveling ion beam, it is not possible to disassemble the Benveniste et al.

(c) The Benveniste et al system cannot easily interact with other Device combinations, such as devices for controlling the uniformity of the ion beam, because the paired solenoid coil configuration eliminates the introduction of other multipole windings applying the same field to the same volume as the ion beam travels.

(d) The Benveniste et al. system does not include and does not allow the use of permanent magnets to generate magnetic fields.

As a result, in today's technology, it is highly desirable to find an effective mechanism for separating various unwanted ion species from a traveling ribbon ion beam, wherein the size of the travel path along the main dimension of the beam can be extended to any degree; The magnetic field of the size alignment. This can be increased: ease of disassembly and service; ability to combine uniformity tuning (as described in the White and Chen patents mentioned) with focus and quality selection functions; and the ability to use permanent magnets to reduce power requirements.

The invention has several aspects.

A first aspect is an apparatus for focusing a traveling charged particle beam that will laterally pass adjacent the device, the beam direction being substantially z-direction in a Cartesian coordinate system, the device comprising: A substantially E-shaped square pedestal formed of a ferromagnetic material, the exposed surface of which presents a plurality of discrete and spatially spaced parallel ridges and a plurality of parallel and spaced apart parallel recesses, wherein the E-shaped magnetic squares ( The α) dimension extends in the x-axis direction by a distance greater than the x-axis dimension of the traveling charged particle beam that will pass through the proximity distance, and (β) the spatially separated parallel ridges and the insertion and spatial separation a parallel recess is laid perpendicular to the direction of travel of the charged particle beam; and a magnetic field generating mechanism that laterally fits into the structure of the E-shaped square base and is disposed in an xz plane, the magnetic field generated by the mechanism being in the y direction Extending vertically from the exposed face of the E-shaped block base.

A second aspect provides an assembly for focusing a traveling charged particle beam that will laterally pass through the assembly, the assembly comprising: a matching pair of pre-formed focusing objects that are disposed and aligned relative to each other, the spatial settings being spaced apart from each other by a fixed gap distance And wherein the traveling charged particle beam will laterally pass through the spatial volume of the fixed gap distance between the matching pairs of the opposing arrangement members in the z-direction, wherein each of the matching pairs comprises a ferromagnetic material a substantially E-shaped square pedestal, and wherein the exposed square faces exhibit at least three discrete and spatially spaced parallel ridges and at least two interposed and spatially spaced parallel louvers, and wherein the E-shaped square pedestal (α) The dimension extends in the x-axis direction by a distance greater than the x-axis dimension of the traveling charged particle beam that will pass through the upper zx plane thereof, and (β) the three spatially separated parallel ridges and the two insertions and spatial separations a parallel recess is placed perpendicular to the direction of travel of the charged particle beam; and a magnetic field generating mechanism that laterally fits into the structure of the E-shaped base and is disposed in an xz plane, by which the mechanism produces The magnetic field in the y-direction of the base of the E-shaped box extending from the exposed surface vertical; and a mechanism for directing the charged particle beam travels through transversely with respect to the present The fixed gap distance between the exposed faces of each E-shaped block base of the pair of configuration objects.

1‧‧‧E-shaped square base

2, 32a, 32b, 32c...‧‧‧ long round coil

3‧‧‧flat ferromagnetic plate

5‧‧‧Striped ion beam

6a, 6b‧‧‧linear side section

7a, 7b‧‧‧ curved end section

8 ‧ ‧ barrier

10‧‧‧E square coil combination

12, 14 ‧ ‧ canals

13, 15, 17‧ ‧ ridge

22‧‧‧ fine tuning coil

32‧‧‧Supply coil

The present invention will be more readily understood and better understood in conjunction with the drawings in which: FIG. 1a shows a conventional magnetic quadrupole lens; and FIG. 1b shows a triplet of such lenses, which comprise a plurality of types of ions The beam passes off-center; conventional art Figure 2a depicts an Aitken 2002 device that first shears the ribbon ion beam in one direction and then in the other; conventional art Figure 2b depicts a side view of strong focus, with conventional knowledge The shearing effect shown in Figure 2a; Figure 2c shows the travel path of an ion beam having different magnetic stiffness; Figure 3 shows the article identified as containing device version 1 of the present invention; Figure 4a shows the identification as containing E The beam quality analyzer assembly of the device version 2 of the square coil combination, the boundary plate, the beam and the analytical aperture; Figure 4b shows the same device of Figure 4a with the added coil pair to allow accurate adjustment of the x-deflection to zero; Figure 5 Displaying a beam quality analyzer assembly identified as comprising a pair of E-coil object, bundle, and analytical aperture version 3; Figure 6a shows the magnetic flux line in the section of device version 4; Figure 6b shows The magnetic flux line in the cross section of this 5, which is permanently used Figure 7a is a perspective view of a section of the beam passing through the embodiment of the apparatus version 4; Figure 7b is an orthographic view of the stack directly adjacent to the ion track along the z-axis and showing the projection of the deflection in the field; Figure 8 shows A line diagram of the z-portion of the magnetic field along the z-axis; Figure 9a shows a cross-section of an embodiment of the device version 3 as a focusing device; Figure 9b shows an embodiment of the device version 4 as a mass selection device; Figure 10 shows the trajectory of the 3 momentum Numerical model, display quality, resolution; and Figure 11 shows a device version 6 embodiment in which an orthogonal complex coil is wound around each E-square coil unit.

The present invention is an apparatus and multi-unit assembly that achieves two different and highly desirable functions: (i) focusing of a charged particle beam; and (ii) separating a desired ion species from the mass of excess ion species in the traveling ion beam. The device is a simple organization and easy to manufacture item; it is relatively light weight and less expensive to manufacture; and is easier to install, align, service, and operate than conventionally available devices. Moreover, it is easy to combine the focus and mass separation capabilities of the present invention with additional magnetic functions, such as by increasing the uniformity of beam uniformity of the quadrature coils.

Note the fact that in certain specific commercial applications, the ion implanter's operating system is required to separate up to 50 keV P ⁺ from unwanted P ⁺⁺ and P ₂ ⁺ ions and from some other ionic contaminant; I never desired B ^++, F ^+, F ⁺⁺ ion separation and B ^+. The final job requirements are usually the most urgent for any ion implantation system. As a result, the efficient coupling of such unique mass analyzer devices to high current planar ion sources provides the significant benefits and major advantages of ion implantation with large substrates, such as flat panel displays and solar cells - especially providing control beam uniformity in the same space. Extra features.

Equipment and its operating environment

By considering a conventional ion implantation system in which the ribbon ion beam travels in the z-axis direction in a vacuum chamber (or other vacuum environment), it is best understood that any of the embodiments and alternative formats of the present invention are unpredictable. Features and unique differences.

In these conventional operating environments, the main transverse dimension of the ribbon beam is along the x-axis and its smallest dimension is along the y-axis. In addition, the traveling ribbon-shaped charged particle beam contains at least one desired species of ions, accelerated to a desired energy, and various types of excess ionic impurities.

Also in this prior art operating system, at least one structural device or multi-unit assembly is desirably presented to focus the traveling ion beam and/or to separate the desired ion species from the excess ion species in the charged particle beam. To achieve either or both of these desired objectives, an exemplary embodiment of a necessary E-coil apparatus incorporating the present invention is depicted by FIG.

E-square coil combination unit

As seen in Figure 3, the fabricated structural article (which only requires a conventional power source) is an E-square coil assembly 10 comprising a substantially E-shaped square base 1 and an oblong closed coil 2. Each of these structural components is illustrated in the following detailed description.

However, initially this letter helps to identify the more unusual job attributes and unique features that are presented by the overall E-square coil combination.

The (α) working unit is not a solenoid coil device - that is, it does not surround the volume desired to generate and apply a magnetic field. There is no solenoid coil in any embodiment or format of the E-square coil combination.

(β) the overall E-square coil combination exhibits an exposed surface that produces an orthogonal extension of a finite width and an adjustable magnetic field; a finite-width orthogonally extending magnetic field is a collective result of a series of adjacent magnetic fields of spatial alternating magnetic; and by changing the coil The current in the current will change the intensity of the orthogonal magnetic field of the alternating magnetic field.

(δ) The traveling charged particle beam undergoing focusing or ion separation does not pass through any coil structure at any time, or any multi-coil configuration that can be presented in any embodiment or format of the E-square coil combination. Conversely, the path of travel of the charged particle beam is always transverse to the exposed face of the E-square coil combination and lies flat against the z-x plane pair adjacent and parallel but clearly separated from the exposed face (and thus the entire outer surface of the E-square combination).

E square base

Specifically, the E-square base 1: (i) is a discrete article having an exposed square face as its forward aspect and a flat outer surface as a pre-determined dimension of its backward aspect; (ii) is made of a ferromagnetic material - ie iron or any other magnet or metal alloy mixture; (iii) having a cross-sectional form and an exposed square face, the frontal appearance of which is substantially similar to the letter "E", wherein the two recessed spatial channels 12, 14 are laid flat in parallel and are separated by three different and spatially separated bar members or ridges 13, 15 and 17, which are also laid parallel to each other to define their volume and channel size; and (iv) is a pre-formed construction that extends in the x-axis direction across a linear distance greater than the x-size range of the traveling charged particle beam The traveling charged particle beam is generally such that the sheet passes through the exposed face (and the outer surface) of the E-square base in the z-direction.

Oblong closed coil

As also shown in FIG. 3, the oblong coil 2 is a single substantially racetrack-shaped winding made of a continuous length of electrically conductive material; and appears to be a closed loop-like entity comprising two parallel linear length sections, each linear length section being larger than charged The x-axis size range of the particle beam, and the two curved ends, each curved through 180 degrees.

As used herein, the word "long circle" correctly identifies and appropriately describes the desired shape of the closed coil 2; and the term "long circle" as used herein is defined as a closed geometric configuration with a fixed circumference having parallel straight sides. [such as respective linear side sections 6a and 6b in Fig. 3] and substantially semicircular ends [such as respective curved end sections 7a and 7b in Fig. 3]. Thus the typical format is a fixed configuration formed by two semicircles connected by parallel lines tangential to its endpoints. An important feature of this configuration is that the circumference of the oblong structure clearly has parallel side sections; however, there is no strict requirement for the end section and therefore a true semicircle. Thus, for example, the two coil ends of the oblong configuration may each be formed by two circular quadrants and short straight sections, or any other topology similarly constructed, curved through 180 degrees and structurally combined with two parallel parallel side sections to form a closed loop. Shaped circumference.

Furthermore, it will be recognized and appreciated that the particular shape of the closed coil is expected and is expected to be slightly modified to conform to individual manufacturing standards and/or individual use environments. However, the primary goal is to exclude any significant change in the strength or shape of the magnetic field as a function of the x-coordinate in the range of the ion beam.

Note that the orientation is also specifically directed to the oblong closed coil 2 - which is always and invariably laterally and flatly placed in the x-z plane of the E-square base of the predetermined y-coordinate - and its configuration is thus unique. The appropriately positioned closed coil 2 is laterally fitted into adjacent and surrounding center ridges 15, and the remainder is entirely within the volume of space provided by the pairs of parallel channels 12, 14 in the E-block base 1. The closed coils 2 are laterally fitted and arranged, and the remaining portion surrounds the center ridges 15 in the zx plane of the E-square base while occupying the space volume of the recesses 12, 14; and the closed coils are respectively provided by the two outermost layers The rod members or ridges 13 and 17 are supported to be laterally parallel to the zx plane.

Moreover, in the particular embodiment illustrated by Figure 3, the laterally disposed closed coil 2 completely occupies parallel recesses in the E-square base The entire available channel space and volume provided by the channels 12, 14 pairs. However, this full occupancy is not always true; under certain format conditions, as depicted by the alternative embodiment shown in Figure 4b, more than one oblong closed coil can simultaneously occupy the base in the E-square The available channel space and volume provided by the pair of parallel channels 12, 14 are provided.

Orthogonally extended magnetic field

A variable current is supplied by any conventional and controllable mechanism and transmitted to the E-square coil assembly 10 via the oblong coil 2, thereby creating an orthogonally extending magnetic field that not only surrounds the conductive material of the coil but also has three different and spatial The ferromagnetic compositions of the separated ridges 13, 15 and 17 are formed; and are concentrated in a space generally close to the exposed surface of the straight section of the closed coil 2. The different parts of the ferromagnetic structure in the E-base 1 become "North" and "South" poles, depending on the current direction.

Thus, in the direction of the current, the exposed face of the center ridge 15 becomes magnetized to the south pole (S), and the outermost layers of the ridges 13 and 17 are each magnetized to the north pole (N). In this way, the exposed faces of the E-square coil combination appear to present the "N-S-N" series of discrete magnetic poles as a whole. However, based on the current flowing in other directions, the poles are flipped, and the exposed faces of the E-square coil combination appear to exhibit the inverted series "S-N-S" magnetic poles as a whole.

Assuming that the electrical energy flows of the appropriate current, each of the three adjacent positioning and the electromagnetically polarizing poles independently produces an orthogonally extending magnetic field of finite width; the complex adjacent magnetic fields of the finite width are integrated to form a magnetic field of alternating magnetic; The orthogonality of alternating polarities extends the strength of the adjacent magnetic field by The current is changed to change to produce an adjustable and controllable magnetic field on the exposed surface of the E-square coil assembly.

Optional alternative structure format

It will be further understood that with regard to the alternative and replacement of the use of the closed coil 2 as shown in Figure 3, a permanent magnet or a plurality of permanent magnets can be introduced into the E-square base structure - typically formed by substituting portions Ferromagnetic metal or alloy material.

In these alternative formats, one of the simplest procedures is to replace the intermediate ridge of the E-square base or the centrally disposed rod-shaped member with a similarly shaped ridge formed of a permanent magnet material that will lay flat and its magnetization direction. The y-axis is designed along the E-block structure. Thus, as in the true closed coil format shown in Figure 3, the permanent magnets (or multiple permanent magnets) are laterally integrated into the E-square base structure; and similarly laterally placed in a bar-shaped member with respect to the two outermost layers. (in the zx plane of the ridges 13 and 17 [in Figure 3], respectively).

It will also be appreciated that when replaced with such permanent magnets, they produce equal N-S-N or S-N-S pole magnetization, with a wide variety of different lateral configurations and possible orientations.

Ampere's law H.d1=nI, where the integral of the magnetic field "H" is taken on any closed path around the n conductors carrying the current "I". Considering the magnetic probe that maps the magnetic field, the probe travels through the field of the invention along the path of the beam ions moving in the z-axis, and then through the entire path of the ions, the probe completes the circulation path outside the magnetic field of the device and returns to the starting point. If the magnetic field along the path of the beam is integrated, using this conceptual approach, the most desirable field of integration is zero because this would indicate zero net shear of the ion beam passing through the device. The Busch theorem causes the normative angular momentum transmitted to the ion beam to be related to changes in the axial magnetic field. Thus, zero net shear of the bundle can also be ensured by ensuring that the axial magnetic field integration through the working area of the device is zero. Therefore, if current is not allowed to surround the beam, the device transmits zero net shear and zero net angular momentum to the ion beam.

It is therefore believed that the use of permanent magnets in these alternative structural formats is possible because it is desirable to have a value of zero for the integrated magnetic field along the z-axis defined by the E-square pedestal, which allows for compliance with the requirement of ʃH.d1=0. In general, it is impossible to produce an equal magnetic field using a permanent magnet compared to a magnetic field from a solenoid - because it is based on a solenoid, taken along that axis H.d1=nI is always non-zero. However, in sharp contrast in the present invention, the value of the integrated field along the travel axis of the beam is always zero. It should also be noted that in any case, there is a local field along the z-axis; but based on the present invention, the local field symmetry is integrated into zero in the complete transmission along the z-axis.

As a result, unusual presence and the use of permanent magnets in these alternative structural formats - and the configuration and use of oblong closed coils, which fit laterally into and lie flat in the zx plane of the E-square base - constitute different forms of magnetic field generation The mechanism, which is laterally configured and becomes an integral part of the overall structure of the horizontal plane configuration across the analyzer device.

Alternative embodiments of the invention

The invention can be prepared for a range of different assemblies and The same as the construction of the embodiment. As explained below, the scope and types of these embodiments are only represented by device versions 1-6, respectively.

Device version 1

The E-square coil combination 10 comprising the E-square base 1 and the closed oblong coil 2 as described in detail above and illustrated by Figure 3 is in fact a device version 1 of the present invention. Most notably, this embodiment constitutes the most basic unit of the present invention and the simplest operational mass analyzer unit. Accordingly, all other versions and embodiments of the quality analyzer device utilize and construct the necessary features and specific construction of device version 1.

Furthermore, with regard to the proper intended use of the device version 1 of the present invention, it is important to recognize and understand that the E-square coil assembly 10 as explained above is always carefully and deliberately placed in the zx plane, the zx plane being parallel and adjacent to The path of travel of the ribbon ion beam 5 that will pass. Thus, the E-square coil assembly 10 will not completely wrap around at any time - and thus likewise cannot completely wrap around - to travel the ribbon ion beam.

Thus, when current (known size) is constructed 10 through the E-square coil combination, the path of travel of the ion beam is limited and controlled such that the ions of the beam extend laterally through the magnetic field region and then from the magnetized pole of the E-square coil assembly 10. The linear coil section of the E-square coil combination is laid flat in the z-x plane of the predetermined y-coordinate, and the z-axis of the beam of the entire distance of the traveling path is unobstructed. This job configuration is clearly indicated by the marching arrows appearing in Figure 3.

Thus, based on closing a long circular coil in a particular direction The current (having a polarity), the traveling ion beam will deflect through the small angle in the +x-direction of the proximity device and deflect in the -x direction through the center of the device; and will again deflect away from the +x direction of the mass analyzer device .

The net deflection in the x direction is small and can be configured to add up to zero. However, it has also been found that there is a net deflection away from the y-direction of the coil - the greater the distance of the particular beam trajectory from the coil, the weaker the deflection becomes. The reason for this deflection is discussed below.

The deflection in the y direction is less than the deflection in the x-direction. The magnitude of this y-direction deflection is proportional to the square of the current in the coil. It is always facing away from the coil, and the result is different from the x-deflection, which does not add up to zero as the beam passes through the device but still exists.

For these reasons, the beam is only focused in the y direction and is not focused in the x direction. It is configurable that there is no net deflection in the x direction; details are provided below.

Because of the magnetic field, the amount of deflection is proportional to the charge of the ions and inversely proportional to the mass of the ions in the beam and the square root of the energy. However, the focusing effect is proportional to the product of the deflection and the force on the ions and is therefore inversely proportional to the mass.

Depending on the basic principles and structure, one or more additional ion species (contaminants) can be meaningfully separated from the desired or desired ion species if the arrangement is adjacent to the desired beam path. However, it is particularly important in these environments to block the ion path by an excessive distance from the closed coil and the ferromagnetic E-square base, where the field becomes weak and the y-deflection and focus are thus reduced.

Device version 2

A second embodiment of the work assembly is shown by Figure 4a, which combines the flat ferromagnetic plate 3 with the basic equipment described above. The ferromagnetic plate 3 lies flat and similarly defines the z-x plane of coordinates y=0.

In the present embodiment, the separation of the exposed face of the E-square coil combination of the coordinates set at y=y ₁ from the exposed face of the flat ferromagnetic plate 3 has a fixed gap distance of a predetermined size; and the traveling charged particle beam laterally By fixing the length of the gap distance and the extended magnetic field presented therethrough.

The extended magnetic field (produced by the E-square coil combination) effectively terminates in the ferromagnetic plate 3 at the correct angle relative to its internally exposed surface or face. In the plane y = 0, there is substantially no magnetic field portion in the x-direction or the z-direction. However, at non-zero y coordinates, these parts will appear.

As described above, the traveling ion beam will deflect through the small angle in the +x-direction of the proximity device; and will deflect in the -x direction through the center of the device; and will again deflect away from the +x direction of the mass analyzer device (or vice versa) . Therefore, the y-deflection generated by the portion V _x from the ion movement in the x direction mentioned above is caused.

Further, in the region where the magnetic field of the z-direction magnetic field portion B _{z which} is proportional to the y-coordinate exists, the B _z system is generated because the magnetic field is changed based on the z-coordinate. By ionic charge multiplied by V _x B _z, and provided along the (negative) power y-direction, the y- generating deflection.

In the fixed gap bordered by the exposed faces of the ferromagnetic plate 3 and the E-base base 1, 0 < y < y ₁ , the y-deflection of the ions is proportional to the distance from the ferromagnetic plate. Figure 4a shows the configuration of the bundle 4 and the aperture comprising the barrier 8 so configured to transport only certain ion species.

Furthermore, as shown in Figure 4b, the device version 2 is structurally allowed to optionally include one of the small cross-sectional dimensions or a plurality of additional oblong closed coils 22 that will laterally configure (in the zx plane) around the E-square base. Each of the two outermost rod members or ridges 13 and 17. As can be seen therein, each of the additional oblong closed coils 22 is laterally disposed in the available channel space provided by the pairs of parallel dimples 12, 14 in the E-square base of the E-square base with the oblong closed coil 2 And within the volume, and share the space and volume of the channel. Thus, in a plurality of closed coil configurations, the horizontally disposed central closed coil 2 and each of the outermost layers disposed laterally and disposed in the additional closed coil 22 simultaneously occupy the parallel recesses 12, 14 of the E-square base 1 Channel space and volume.

It will be understood that the outermost pair of laterally disposed and disposed additional sealing coils 22 optionally assume a structural mechanism whereby a zero value net deflection in the x direction is created (and/or maintained) (by adjusting the coil 22) Current intensity and direction), which is the positive deflection at the inlet and outlet plus the net addition from the negative deflection of the central pole. It is recognized that the net deflection may have a non-zero value unless the magnetic field in the central region of the device uses the additional oblong closed coils 22 or accurately compensates for a single thin large rectangle such as surrounding items 1 and 2 by allowing a net x-deflection. The other equivalent configuration of the coil is well balanced.

Device version 3

The third alternative assembly comprises two discrete and identically constructed E-square coil combinations, as shown in Figure 5, which are placed in parallel and The series are placed relatively flat relative to each other such that the traveling ion beam path passes laterally therethrough. The two individual coils 2 are each fixed in their own E-block base in the assembly and are excited in the same direction with the same current such that the magnetic field extends from the magnetized pole of one E-square base to the opposite pole of the other E-square base.

It is of interest that the assembly of device version 3 will operate regardless of whether the poles have the same or relative polarity; but for purposes of illustration, it is assumed that the opposite poles will have relative polarities - which require currents in the two coils to flow around the y-axis in the same direction. However, the derivative effect will be different for current versus conditions.

This device version 3 construction can be used to approach a single traveling beam of a coil/block structure; or by two separate and nearly parallel traveling ribbon beams, one beam passing through each of the adjacent and adjacent coil-to-block structures. The two E-coil combinations - although never in physical or direct contact - are mutually magnetically attracted across the gap distance, through which the traveling beam passes.

Please also note that if device version 3 is constructed for focusing (as shown in Figure 9a), then bundles are not required. On the other hand, if the construction is to be used for quality selection [as shown in Figure 9b, but regardless of the direction of current flow in the coil - as explained below], it is necessary to block the path through the center at a certain point in time, such as by 5 in the bundle 阑 3 and / or 4 shown. It is allowed to experience almost no y-directed deflection by ions close to the mid-plane, and for this plasma, it will therefore not be possible to separate from the contaminants.

It will also be appreciated that the shape of the magnetic field provided by version 2 of the apparatus described above is substantially the same as the shape of the magnetic field present in one of the half assemblies of the device version 3, as seen by symmetry. Magnetic field lines can be perpendicular to the ferromagnetic plate The surface enters or leaves the free space (unless it is near saturation); thus, the plate provides a boundary equal to the plane of symmetry of device version 3. Furthermore, the additional fine tuning coil 22 can also be usefully added to device version 3.

Device version 4

The fourth embodiment of the present invention is very similar to the device version 3 described above except that the current in one coil is reversed, and thus the individual currents in the two discrete coils are relative charge/polarity. Therefore, in this device version 4, the most notable feature is that the two discrete E-square coil combinations are relatively magnetized and mutually exclusive.

In the evidence of this feature, Figure 6 depicts the field lines in this geometry; and the external field is minimized in this geometry. This configuration is better in terms of performance and ease of analysis; and for the linear length of the conductor, it is configured such that it is concentrated in the vertices of the rectangle in the cross section. In contrast to the different current flows shown in Figure 9a, the direction of the current alternates, as shown in Figure 9b, as moving around a rectangle.

In this configuration, there are also differences in the origin of y-focus. In version 2, respectively, and the device 3, in the plane of symmetry, z- part of the field of zero, V _x lateral portion of the ion motion is substantially constant across the entire thickness of a particular beam z- coordinates.

However, the release device 4, the case of changing: V _x y- coordinates change with motion now, and substantially uniform across the beam width of a particular part of the field in the z- z- coordinate of (but it is not so). However, the effect is very similar in y motion.

Most importantly and uniquely, in any of these structural assemblies and alternative configurations, the ion beam does not pass through the coil. Conventional construction and events - the passage of the ion beam through the coil - are not part of any embodiment of the invention and have never occurred. Thus, no embodiment, format, or configuration of the invention is constructed or employed as a spiral device.

Device version 5

A fifth embodiment of the apparatus optionally omits the coil from construction and replaces a portion of the steel or other ferromagnetic material in the E-square base with a permanent magnet. However, with such changes in the structural mechanism, the magnetic stiffness selected by the device can no longer be quickly adjusted. The adjustment of the travel beam must now be implemented by changing the component spacing across the narrow range.

This alternative version works best based on the field orientation described above for device version 4. Device version 3 is also possible, but without additional coils 22 it is difficult to control the net y deflection; and the coils are added to deny the advantage of the permanent magnet. Moreover, for large size bundles, the cost of the power supply coil can be extremely significant - so if there is an application requiring a single beam type, the permanent magnet version can be significantly more advantageous.

Device version 6

The sixth embodiment is an assembly, as shown in FIG. 11, as it includes a plurality of complementary long circular coils 32a, b, c, ... wound orthogonally to the coil 2 and disposed in each of the ferromagnetic E-shaped bases 1 External surface. The supplemental coils 32 can be excited individually or in pairs by current (according to the x-coordinate Clustering). The relative supplemental coil sets will typically be excited in opposite directions. The supplemental coils can be added to each of the E-shaped bases, respectively, in any device version 1-5; however, for clarity, the instructions for adding and presenting the supplemental coils to device version 4 are limited.

The supplemental coil has no effect on the previously described function because it lies flat on the orthogonal plane; but by changing the current in the supplemental coil, the ability to modulate the current uniformity of the ion beam is superimposed on those functions previously described. This particular function is the same as that described in U.S. Patent No. 7,078,713, the disclosure of which is incorporated herein by reference. There is thus a significant economics of weight, space, and functionality - as this embodiment of the present invention can provide a combination of focus, quality selection, and control of uniformity in a single device.

Summary of various alternative embodiments

Summary comparisons and substantive reviews are provided below, which appear to provide a multi-point correlation and material information about the industry of the present invention. The nature and quantity of the details are presented herein to identify and understand the true advantages of the invention.

1. With respect to the present invention, the y-deflection capability and the y-focus property are produced in the following manner: because at all points that are not close to the curved end of the closed oblong coil, the magnetic field lies flat parallel to the yz plane; and the magnetic fields are impossible Any y-guides are deflected to the charged particles and then travel in the yz plane. However, even though the input ribbon ion beam may only contain charged particles traveling parallel to the y-z plane, as the particles begin to traverse the magnetic field, the y- portion of the magnetic field deflects the charged particles in a (positive or negative) x direction.

It should also be noted that the x-guide portion of the ion motion in the zone with the z-guide portion of the magnetic field will produce a y-directed deflection.

Thus, in the device version 1, 2 or 3 of the invention described above, the x-deflection amount is almost independent of the y-coordinate of the ion; otherwise, in device version 4 (where the current in a closed coil is flipped, and The charge/polarity of the individual currents in the discrete closed coils is relative, and the x-deflection depends on the y-coordinate of the ions and falls to zero in the central plane of symmetry.

Figure 7a shows a perspective view of the ions of the device constituting the device version 4 of the transit. Figure 7b presents an ion beam gazing laterally through the mass analyzer device that constitutes device version 4 of the present invention along the z-axis and showing the ion using a curved path as a result of the y-guide deflection.

In all of these alternative embodiments, the amount of the z-portion of the magnetic field depends on the y-coordinate. This is because according to the Maxwell curl equation: And Bz=0 at y=0

From this Taylor launch

(higher term)

2. In the five different and alternative embodiments of the invention described above, device version 4 is optimal for general use. The reason for this preference is clear:

(i) In individual device versions 1, 2, and 3, the net deflection in the x direction (depending on the direction of current) is the sum of the positive deflections at the inlet and outlet, plus the negative deflection from the center pole. This can be non-zero unless the magnetic field in the central zone is present at the entrance and exit (in the opposite direction) It is well balanced, and as shown in Figure 4b, it may be necessary to use an additional closed coil (or an additional closed coil pair).

However, in the embodiment of device version 4, the net all x-deflection is invalid because B _y =0 at _y =0, providing zero x-deflection; and in the off-axis position, all symmetry means in the upper half of the device The x-deflection obtained in the flip is reversed in the lower half. This device also provides better control of off-flux.

(ii) The operational effect of the opposite coil with opposite direction currents (Fig. 9b) compared to the relative coil operation with the same direction current (Fig. 9a): • Eliminate all net x-manipulation of the beam; The amount leaked to the outside; ‧ slightly improved focus quality; and ‧ for more than 40% of the current demand for a specific y-focus amount.

In summary, the device version 4 embodiment with relative coil current is the best.

(iii) Permanent magnet simulation of equipment version 5, where the N pole of the E-square base surface - the N pole on the E-square base and the S pole on the E-square base surface - the opposite E-square base The S pole on the top is best suited for a single mass-energy combination.

3. In apparatus versions 4 and 5 of the present invention, the primary step is to generate a two discrete region of the symmetrical magnetic field within the ion beam. In one zone, the magnetic field is aligned with the ion beam travel; in the second zone, the magnetic field is flipped.

Moreover, the tip is formed in which the two magnetic field regions coincide and oppose each other. This tip extends in a lateral direction along the major dimension of the ribbon ion beam. in Near this tip, the magnetic field is in the form of a quadrupole. To satisfy the Maxwell equation, the flux lines enter and exit from the side of the beam.

In addition, because of the plane symmetry, the flux lines do not need or exit from the sides of the main lateral direction of the bundle. The field system is produced purely by a mechanism external to either side of the beam; there is no need for the coil to surround the beam, nor does it require any magnetic device to contain the beam.

Furthermore, since the magnetic field is integrated to zero along the beam path, the magnetic field can be provided by using a permanent magnet without any current; or the coil can be used as explained above. The current variable coils are allowed to be adjusted by varying the magnitude and direction of the current; although the permanent magnets are only allowed to be used for slight adjustment of the focus condition, by varying the mechanical positioning of the components, or by providing a shunt of several magnetic fluxes by a movable shunting mechanism (It is generally known and used conventionally by the industry in the technical field).

4. The advantages of considering device version 4 here are further helpful (compare alternative embodiments). As described above, the conductor structure such as a rectangular flat on the xy sectional shape seen in cartridge vertices; and Panofsky by analogy with the conventional quadrupole lens is generated by the central magnetic field just like the quadrupole assembly, such that B _z = kz And B _y =-ky, Bx=0. However, the symmetry check also reveals that there is local symmetry in the plane z = +/- z ₀ /2, and the B _z size on either side of the planes is reduced; thus in these planes .

As a result, only the local behavior of the quadrupole field; and a magnetic field can be analyzed as a whole about the opinion wherein B _z having carried out in the form shown in FIG. 8 xz Maxwell equation of the plane.

In either device version 3 or 4, the y-deflection amount is The distance from the center of the device is linear; or linear with the distance from the flat ferromagnetic plate in device version 2.

Also note that in device version 1, the changes are far non-linear. Linear variations produce good focus with few aberrations; however, in all cases, the aberrations are extremely significant.

5. Device version 4 can also be used in particular as a focusing device. E-square coil combinations of device version 4 in pairs and relative configurations - without any beam or aperture - can be used to provide a lens that focuses in the x direction but does not cause y-direction focusing. Reference is made to Figure 9a for depicting this capability and effect.

One of this particular optional capabilities may apply a ribbon beam that will match from the ion source into another active device (eg, a deceleration structure) that tends to convey unwanted focus or cause defocusing of the ion beam. Under these optional conditions of use, the application version 4 embodiment will allow for x-offset adjustment and control without affecting y-offset.

Another optional use would be to transport the beam from the deceleration structure (which deviates strongly from current and energy) into the processing station, in the processing station without destroying the x-direction beam in the y-direction focusing capability and device version 6 uniformity The combination of sexual controls will be extremely effective.

6. The invention as a whole can be used for mass separation and selection. In general, mass separation requires a quality-dependent configuration ("dispersion" as a term commonly used in the commercial industry), combined with a focus on good control. The aperture configuration is defined around the desired beam in the desired beam; it will also be recalled that the magnetic deflection is quality dependent.

Therefore, in these mass separation applications, the ion beam is Configuring an exit slot of the ion source and correspondingly extracting an electrode that is close to (but preferably slightly offset from) the xz plane; and the ion beam is directed away from the midplane at a small angle between about 5 and 10 degrees so as to pass close to E - Core base, as shown in Figure 9b.

The bundle 3 is configured to block any ion trajectory by excessively approaching the x-z plane. An additional bundle 阑 4 (possibly the extension of the first raft) is placed downstream of the E-core assembly. It is also possible to provide an aperture comprising a barrier 8 close to the extra beam so as to provide a two-slot path for the beam ions, one on each side of the x-z plane. Figures 4a and 9b show each of these structural features, respectively.

Based on the ion beam (or beam pair) containing the desired species accelerated to the selected energy, the current in the E-core assembly is now adjusted until the desired ion species is focused through the aperture, as depicted in FIG. It will now be found that the mass difference of the ion species exceeds a certain portion, thereby blocking the desired ions and not transmitting. A quality difference of typically +/- 20% or less is sufficient to reject.

Again, in this device, the dispersion is proportional to the distance from either the midplane (device versions 3, 4, and 5) or the flat boundary panel (device version 2). However, the dispersion is slightly more difficult to define device version 1 because it does not linearly fall to zero. The path by dispersing the undersized zone must be blocked; then based on the analytical aperture placed in position, and the coil current is adjusted to pass the desired beam species through the slot, the desired beam can be separated from the contaminant.

The analytical power is not high, expressed as M/ΔM FWHM; and Figure 10 shows an example where the analytical power is >5. Analyze the power and the width of the beam that can be transmitted in the y direction (which is determined by the deviation of the actual condition from the ion source) There is a mutually beneficial relationship between them.

7. Apparatus version 3, 4 or 5 of the present invention can be used to purify and combine two discrete ribbon ion beams generated from an ion source or synchronously from adjacent extraction slits of an ion source pair. The requirement is that any range of two-band ion beams along the x-direction originate within one or two centimeters of each other - each having a full deviation of about 4 degrees, and having no significant beam current between the two bundles having an 8 to 12 degree region .

The two divergent ion beams can be accepted by a pair/double E-square coil combination and refocused on the target while the beam simultaneously blocks the excess species with different masses or energies, as shown in FIG. A typical plasma extraction electrode system produces an ion beam with a few degrees of total angular spread, rarely less than 4 degrees; and 4 degrees have been assumed in the plot depiction.

The ion source can be provided by two parallel slits, whereby the extracted dual ion beams differ from each other by about 10 and 20 degrees and are symmetric about the x-z plane. Thus, each bundle passes through one of the two facing E-core assemblies. Details of the extraction electrode are not shown (the use of which is well constructed and known).

Note that the ion source illustrated by Westner and Dudnikov [Rev Sci Inst, Vol. 73, p. 2, 2002] essentially produces a two parallel ribbon beam and can therefore be used directly as shown in FIG.

The following steps can be used efficiently to produce a desired type of mass analyzed ion beam: Step 1: providing an ion source having two parallel extraction slits, thereby extracting ribbon ion beam pairs that are nearly parallel but divergent from each other at a small angle to form Each of the ion beams comprises a desired pure ion species and an excess contaminant ion species; Step 2: transmitting the pair of ion beams through a focusing device having a color difference, wherein a beam passes through each side of the plane of symmetry of the focusing device; and step 3: adjusting the focusing intensity of the focusing device to direct the two band beams to pass simultaneously a single aperture symmetrically disposed on the plane of symmetry downstream of the focusing device; step 4: providing at least one bundle of blocking jaws to intercept excess ions traveling too close to the plane of symmetry of the focusing device, and at least one bundle of blocking jaws to intercept deviation And any ions that are excessively far from the plane of symmetry of the focusing device; and step 5: causing the desired pure ion species in the pair of ion beams to be separated from the excess contaminant ion species, wherein the separation is based on having a mass selected from the group consisting of At least one characteristic of the group of differences in energy, and magnetic stiffness is implemented with a desired ion of a different physical property.

In practicing the separation technique, the devices described above as device version 3, 4, or 5, respectively, can provide a desired property that is focused on a single size and can be extended to include a ribbon beam as desired and exhibiting a strong chromatic aberration.

The invention is not limited in form, and is not limited to the intended scope of the appended claims:

1‧‧‧E-shaped square base

2‧‧‧long coil

5‧‧‧Striped ion beam

6a, 6b‧‧‧linear side section

7a, 7b‧‧‧ curved end section

10‧‧‧E square coil combination

Claims (19)

An apparatus for focusing a traveling charged particle beam laterally passing adjacent to the apparatus, the particle beam traveling in a substantially z direction in a Cartesian coordinate system, the apparatus comprising: formed of a ferromagnetic material The substantially E-shaped square base has an exposed square surface of a plurality of discrete and spatially separated parallel ridges and a plurality of parallel and spaced apart parallel recesses, wherein the E-shaped magnetic squares (α) are The x-axis direction extends a greater distance than the x-axis dimension of the traveling charged particle beam that will pass at a close distance, and (β) the spatially separated parallel ridges and the intervening and spatially spaced parallel wells lie vertically The direction of travel of the charged particle beam; and a magnetic field generating mechanism that laterally fits into the structure of the E-shaped block base and is disposed in an xz plane, and the magnetic field generated by the mechanism is from the E-shaped square in the y direction The exposed square surface of the seat extends vertically. The apparatus of claim 1, wherein the magnetic field generating mechanism comprises an oblong closed coil wound from at least one electrically conductive material and exhibiting a length of two parallel straight lines greater than a range of the x-axis dimension of the traveling charged particle beam, and The two curved ends are each bent through 180 degrees, the closed coil is laterally fitted and the remaining portion is completely within the volume of space provided by the two parallel recesses on the face of the E-shaped square base; and for conveying current to The mechanism of the closed coil, whereby the three spatially separated parallel ridges on the exposed surface of the E-shaped block base form alternating magnetic discrete magnets. The apparatus of claim 1, wherein the magnetic field generating mechanism comprises at least one permanent magnet that is laterally fitted into and electrically coupled to the parallel ridges of the three spaces on the face of the E-shaped block base. The space disposed on the face of the E-shaped block base forms an alternating magnetic pole from the ridge. The apparatus of claim 1, further comprising: a flat ferromagnetic plate disposed in parallel and disposed at a fixed gap distance from the exposed face of the E-shaped block base, and wherein the traveling charged particle beam passes laterally through the E The volume of the space between the ferromagnetic plate of the shaped block base and the fixed gap distance between the exposed faces. The apparatus of claim 1, further comprising: a plurality of orthogonal winding supplemental coils surrounding an outer surface of the E-shaped square base, wherein each of the supplemental coils is a wound wire; and an active current source And communicating with the plurality of orthogonal winding supplemental coils. An assembly for focusing a traveling charged particle beam that will pass laterally through the assembly, the direction of travel of the particle beam being substantially z-direction in a rectangular coordinate system, the assembly comprising: a pre-formed focus of relative arrangement and alignment a matching pair of objects, the spatial settings being spaced apart from each other by a fixed gap distance, and wherein the traveling charged particle beam will laterally pass through the spatial volume of the fixed gap distance between the matching pairs of the oppositely disposed objects in the z direction, wherein the matching Each of the objects includes a substantially E-shaped square base formed of a ferromagnetic material, and The exposed square faces exhibit at least three discrete and spatially separated parallel ridges and at least two interposed and spatially spaced parallel louvers, and wherein the E-shaped square pedestal (α) extends in the x-axis direction by more than The distance through the x-axis dimension of the traveling charged particle beam near its upper zx plane, and (β) the three spatially separated parallel ridges and the two interposed and spatially spaced parallel wells are laid perpendicular to the a direction of travel of the charged particle beam; and a magnetic field generating mechanism that laterally fits into the structure of the E-shaped block base and is disposed in an xz plane, the magnetic field generated by the mechanism being y-direction from the E-shaped square base The exposed square faces extend vertically; and a mechanism for directing the traveling charged particle beam laterally through the fixed gap distance between the exposed faces of each of the E-shaped block bases of the pair of opposing configuration objects. The assembly of claim 6, wherein the magnetic field generating mechanism is one selected from the group consisting of: (i) at least one permanent magnet laterally mated with the E-shaped square base The three spatially spaced parallel ridges are combined on the face, whereby the space disposed on the face of the E-shaped block base is separated from the ridge to form an alternating magnetic discrete pole, and (ii) an elongated circle The closed coil is wound from at least one conductive material and exhibits a length of two parallel straight lines larger than the range of the x-axis dimension of the traveling charged particle beam, and each of the two curved ends is bent through 180 degrees, the closed coil is laterally fitted and the remaining portion Completely on the face of the E-shaped square base a space provided by the two parallel recesses, and a mechanism for transmitting current to the closed coil, whereby the three spatially separated parallel ridges on the exposed surface of the E-shaped square base form an alternating magnetic separation magnetic pole. The assembly of claim 6, wherein the matching arrangement of the pre-formed focusing objects of the relative arrangement and alignment is magnetically repulsive to each other. The assembly of claim 6, further comprising: at least one bundle disposed centrally within the volume of the fixed gap distance between the pair of oppositely disposed focusing articles such that at least the gap is formed within the gap distance An off-center channel whereby the beam avoids straight-through travel of the charged particle beam, but allows the off-center route of the charged particle beam to pass through the off-center channel between the beam and the pair of oppositely disposed focusing objects. The assembly of claim 9 further comprising: a pre-formed aperture barrier comprising a plane downstream of and concentrated on the pair of pre-formed focusing elements of the pair of opposite configurations and alignments, the aperture barrier being allowed to pass via The portions of the traveling charged particle beam that are offset from the center channel are adjusted. The assembly of claim 10, wherein the adjustment is performed by changing the strength of the magnetic field to at least one selected from the group consisting of a difference in ion mass, a difference in ion charge, a difference in beam energy, and a difference in magnetic stiffness. The physical properties select ions and are achieved. The assembly of claim 6 further includes: a plurality of orthogonal winding supplemental coils surrounding each of the E-shaped square bases The outer surface, wherein each of the supplemental coils is a wrap wire; and an on-demand current source is in communication with the plurality of orthogonal wrap supplemental coils. An assembly for focusing and separating a desired ion of a narrow magnetic stiffness and rejecting other unwanted ions and then presenting it on at least one traveling charged particle beam, the direction of travel of the particle beam being substantially z-direction in a rectangular coordinate system, The assembly comprises: (α) a vacuum chamber, a path of travel around a known volume of space through which the charged particle beam will pass; (β) a pair of oppositely disposed and aligned pre-formed objects, located in the vacuum chamber Within the volume of space, the matching of the objects is spatially set apart from each other by a fixed gap distance, and wherein the traveling charged particle beam will laterally pass through the spatial volume of the fixed gap distance between the matching pairs of the oppositely disposed objects in the z-direction, And wherein each of the matching pairs comprises a substantially E-shaped square pedestal formed of a ferromagnetic material, and wherein the exposed square faces exhibit at least three discrete and spatially separated parallel ridges and at least two insertions and spaces a parallel parallel dimple, and wherein the E-shaped square base (i) extends in size in the x-axis direction to be larger than the traveling charged particle beam that will pass through the upper zx plane thereof The distance of the x-axis dimension, and (ii) the three spatially spaced parallel ridges and the two interposed and spatially spaced parallel flues are laid perpendicular to the direction of travel of the charged particle beam, and the magnetic field generation mechanism , the lateral structure fits into the structure of the E-shaped square base and is arranged in an xz plane, and the magnetic field generated by the mechanism is in the y square Extending vertically from the exposed square surface of the E-shaped square base; a (γ) mechanism for directing the traveling charged particle beam laterally through the exposed surface of each E-shaped square base of the pair of oppositely disposed objects The fixed gap distance; (δ) at least one bundle is concentrated in the spatial volume of the fixed gap distance existing between the pair of oppositely disposed focusing objects such that at least one off-center channel is formed within the gap distance Thereby, the bundle avoids straight-through travel of the charged particle beam, but allows the off-center route of the charged particle beam to pass through the bundle and the off-center channel existing between the pair of oppositely disposed objects; and (ε) pre-formed An aperture barrier is disposed downstream of and concentrated on a plane of the pair of oppositely disposed and aligned pre-formed focusing objects, the aperture barrier being adapted to allow passage of the portions of the traveling charged particle beam through the off-center channel via a limited angle Range deflection; thereby performing ion focusing and desired ion separation with a predetermined mass range and energy properties, free of other unwanted ions being present in the Electrical particle beam. The assembly of claim 13, wherein the magnetic field extending perpendicularly from the exposed square of the E-shaped square base is adjusted for pre-selected ion mass. The assembly of claim 13 further comprising: a discrete ribbon ion beam pair traveling simultaneously through the vacuum chamber, the pair of ribbon beam trajectories being nearly parallel, but diverging from each other by a small angle, the pair of discrete ion beams Each of them contains the desired ion species and the excess ion species. A method of focusing a traveling ribbon ion beam, comprising the steps of: generating a multi-zone symmetric magnetic field via a matching pair of pre-formed objects that are oppositely arranged and aligned, the matching pair spatially setting a fixed gap distance from each other, the pair of relative configurations The object can generate a symmetrical magnetic field extending vertically across the fixed gap distance, wherein (i) the orientation of the first region of the generated magnetic field is the direction in which the ions in the ion beam travel, and (ii) the magnetic field generated The orientation of the second zone is relative to the direction of the first zone in the magnetic field; and causing the traveling ribbon ion beam to laterally pass through the spatial volume of the fixed gap distance between the matching pairs of the oppositely disposed objects The resulting multi-zone symmetric magnetic field. The method of claim 16, further comprising the step of mass analyzing the traveling ribbon ion beam by blocking ions directly passing through the first region and the second region of the generated multi-region symmetric magnetic field, and At least two limiting channels arranging a motion path of the traveling beam, wherein the limiting channel is non-linearly aligned, and only directing the deflection within a predetermined angle range by the effects of the first region and the second region of the symmetric magnetic field Ions enter one of the restricted channels. The method of claim 16, further comprising the step of inverting the polarity of the first region and the second region of the symmetric magnetic field. A method for simultaneously generating a mass analysis pair of discrete ion beams The method wherein each ion beam comprises a desired ion species and a superfluous ion species, the method comprising the steps of: providing an ion source having two parallel extraction slits, thereby extracting discrete ion beam pairs, the trajectories are almost parallel, but the mutual differences are small An angle, each of the pair of extracted ion beams comprising a desired ion species and at least one excess ion species; causing the pair of extracted ion beams to pass through a focusing device having a color difference, wherein one of the ion beams passes through the focusing device Each side of the plane of symmetry; adjusting the focus intensity of the focusing device to direct the two tracks of the ion beam simultaneously through a single aperture barrier disposed on the plane of symmetry downstream of the focusing device; providing at least one bundle of blocking ports to intercept Offwardly approaching the ions of the plane of symmetry of the focusing device; providing at least one bundle of blocking jaws to intercept any ions that are offset away from the plane of symmetry of the focusing device; and causing the desired ions in the pair of traveling ion beams The species is separated from the excess ion species, wherein the ion species is separated by an ion mass selected from Composed of at least one physical attribute of the differences, differences in ionic charge, beam energy differences, and differences in the magnetic stiffness and the group embodiment.