TW201528331A - C-shaped yoke coil mass analyzer apparatus for separating desired ion species from unwanted ion species in ribbon ion beams of arbitrary breadth - Google Patents

C-shaped yoke coil mass analyzer apparatus for separating desired ion species from unwanted ion species in ribbon ion beams of arbitrary breadth Download PDF

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TW201528331A
TW201528331A TW103142192A TW103142192A TW201528331A TW 201528331 A TW201528331 A TW 201528331A TW 103142192 A TW103142192 A TW 103142192A TW 103142192 A TW103142192 A TW 103142192A TW 201528331 A TW201528331 A TW 201528331A
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yoke
ion beam
tunnel
magnetic field
moving
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Nicholas R White
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Nicholas R White
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/05Electron or ion-optical arrangements for separating electrons or ions according to their energy or mass
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3171Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/05Arrangements for energy or mass analysis
    • H01J2237/055Arrangements for energy or mass analysis magnetic
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/05Arrangements for energy or mass analysis
    • H01J2237/057Energy or mass filtering

Abstract

The present invention is a C-shaped yoke-coil assembly which operates as a markedly improved mass analyzer device; and is able to achieve at least one identifiable modification (such as an effective separation of dissimilar charged ion species) in an adjacent traveling ribbon-shaped beam. The C-shaped yoke coil assembly offers a commercially useful resolving power; is far easier and less expensive to manufacture; and is quickly positioned, aligned, and operated in comparison to conventionally known mass analyzer devices.

Description

用來從帶狀離子射束的任意幅寬的所不想要的離子種類中分離出想要的離子種類的C型軛線圈質量分析器設備 C-type yoke coil mass analyzer device for separating desired ion species from unwanted ion species of any width of a ribbon ion beam 〔相關申請案〕 [related application]

本發明最早於2013年12月20日向美國專利局提申為美國暫時申請案第61/963,986號,並在本文中主張此先申請的法律上利益。 The present invention was first filed on December 20, 2013 with the U.S. Patent Office as U.S. Provisional Application No. 61/963,986, and the legal benefit of this prior application is claimed herein.

本發明是2012年2月27日提申,名稱為“Mass Analyzer Apparatus And Systems Operative For Focusing Ribbon Ion Beams And For Separating Desired Ion Species From Unwanted Ion Species In Ribbon Ion Beams”的美國非暫時申請案第13/385,618號的部分接續案,此較早申請的專利申請案的所有法律上的好處及利益在本文中明確地主張。 The present invention is filed on Feb. 27, 2012, entitled "Mass Analyzer Apparatus And Systems Operative For Focusing Ribbon Ion Beams And For Separating Desired Ion Species From Unwanted Ion Species In Ribbon Ion Beams", US Non-Temporary Application No. 13/ Part of the continuation of 385,618, all of the legal benefits and benefits of this earlier patent application are expressly claimed in this document.

本發明係有關於一種磁性質量分析器,其被 用來將各種系統及應用中的高電流帶狀離子射束分流(streaming)。相比於以圓柱形射束被使用於傳質譜分析系統中的射束而言,帶狀射束對分析磁鐵設計者造成獨特的問題。所有這些質量分析器裝置經常被用來從不想要的離子射束中分離出想要的離子射束,然後呈現在該帶狀離子射束內,且將該移動的離子射束的彈道路徑(trajectory pathways)偏斜並改變且提供該移動的離子射束內的離子的一焦點,在所有例子中,該偏斜及聚焦係取決於質量、能量、及離子的電荷。 The present invention relates to a magnetic mass analyzer that is Used to stream high current ribbon ion beams in various systems and applications. The ribbon beam poses a unique problem for the analysis magnet designer compared to a beam that is used in a mass spectrometry system with a cylindrical beam. All of these mass analyzer devices are often used to separate a desired ion beam from an unwanted ion beam, then present within the ribbon ion beam, and the ballistic path of the moving ion beam ( The trajectory pathways) deflect and change and provide a focus of the ions within the moving ion beam. In all cases, the skew and focus are dependent on mass, energy, and charge of the ions.

帶狀射束的首次分析是在用於曼哈坦計畫(Manhattan project)的鈾同位素分離的Calutron系統中。該離子源被浸在一均勻的磁場中,其將該被擷取出來的帶狀離子射束偏斜180度,將它彎折於它的窄的(寬度)尺度(dimension)的平面內,該磁場和它的寬的尺度對齊。後續的系統(它們的離子源被移離開分析磁鐵一段距離)運用了不同的設計方式。 The first analysis of the ribbon beam was in the Calutron system for uranium isotope separation in the Manhattan project. The ion source is immersed in a uniform magnetic field that deflects the extracted ribbon beam 180 degrees and bends it into its narrow (width) dimension plane. The magnetic field is aligned with its wide dimension. Subsequent systems (their ion sources are moved away from the analysis magnet for a distance) use different designs.

在離子佈植系統及方法中使用磁性質量分析器裝置來改變帶狀離子射束(其亦被稱為‘片狀射束’或‘皮帶狀射束’)的特性及特徵已變得很常見且是例行工作,且因而是特別習知的。在相關技藝中的傳統實務上很顯而易見的是,為了此目的而被使用的較佳的已知磁性裝置係被揭露及描述於以下所列的個別構造:美國專利第 4,578,589號(Aitken);第5,126,575號(White);第5,350,926號(White et al.);第5,834,786號(White et al.);第6,162,262號(Aoki);第6,498,348號(Aitken);第7,112,789號(White);第8,263,941號(Benveniste);第8,723,135號(Glavish);美國專利公開案第20120235053號(White)-這些專利案的個別內容藉此參照而被併於本文中。 The use of magnetic mass analyzer devices in ion implantation systems and methods to alter the characteristics and characteristics of ribbon ion beams (also referred to as 'sheet beams' or 'belt beams') has become very It is common and routine, and is therefore particularly well known. It is apparent from the conventional practice in the related art that the preferred known magnetic devices used for this purpose are disclosed and described in the individual configurations listed below: U.S. Patent No. 4,578,589 (Aitken); 5,126,575 (White); 5,350,926 (White et al.); 5,834,786 (White et al.); 6,162,262 (Aoki); 6,498,348 (Aitken); 7,112,789 (White); No. 8, 263, 941 (Benveniste); No. 8, 723, 135 (Glavish); U.S. Patent Publication No. 20120235053 (White) - the entire contents of each of which are hereby incorporated by reference.

技術考量 Technical considerations

為了將離子佈植於大型基板中(譬如,平板顯示器及太陽能面板中)的目的,藉由質量挑選來淨化寬帶形離子射束是業界亟需要的。在這些系統應用的環境下,用於選擇質量分析器的最重要的特徵是在尺度大小上增加的能力;尤其是,從在射束幅寬(breadth)尺度上的線性延伸變至任何被任意地選則之可量測的尺度的能力。此裝置的另一非常重要的特徵是在無須任何和該射束的主要橫向尺度(即,幅寬尺度)對齊的磁性構件下能夠實施它的高解析度(resolution)質量分離功能。 In order to implant ions in large substrates (such as flat panel displays and solar panels), it is desirable in the industry to purify broadband ion beams by mass selection. In the context of these system applications, the most important feature for selecting a mass analyzer is the ability to increase in size; in particular, from linear extension on the breadth scale to any arbitrary The ability to choose the scale that can be measured. Another very important feature of this device is its ability to perform its high resolution resolution separation function without any magnetic components aligned with the major lateral dimensions of the beam (i.e., the width dimension).

下面中提供的只是為了資訊參考及比較分辨的目的:一低強度磁場傳統地是在約0至0.05T的範圍內;一中度強度磁場典型地是在約0.05T至0.5T的範圍內;及一高強度磁場是傳統上是在約0.5T至1.2T的範圍內;及更高的磁場則是超出本本文內容,因為可獲得的 鐵磁材料在1.8T即飽和,這提供一極限,超過此極限則複雜度及成本會過度地升高。 The following is provided for informational and comparative resolution purposes only: a low intensity magnetic field is conventionally in the range of about 0 to 0.05 T; a moderate intensity magnetic field is typically in the range of about 0.05 T to 0.5 T; And a high-intensity magnetic field is traditionally in the range of about 0.5T to 1.2T; and higher magnetic fields are beyond the scope of this article because of the available Ferromagnetic materials are saturated at 1.8T, which provides a limit beyond which complexity and cost can be excessively increased.

對於具有介於約5keV至100keV之間的能量的離子射束實施質量分析是很典型的,即使是在最終所想要的離子能量高於或低於此範圍時亦然。實施此工作所需的磁場和電荷及半徑係成反比,且和離子的質量及能量的平方根成正比。在該電磁鐵繞組中的安培-匝數則和距離(其係在垂直於建立此磁場的離子的運動及偏斜平面的方向上測得的距離)成正比。此距離必須大於該射束的尺度。典型地,一習知的鐵磁軛被用來將此安培-匝數要求最小化,用以控制該磁場的形狀,並藉以精確地控制磁場的聚焦品質,及將雜散磁場(stray magnetic field)最小化。 Mass spectrometry is typically performed for ion beams having energies between about 5 keV and 100 keV, even when the final desired ion energy is above or below this range. The magnetic field required to perform this work is inversely proportional to the charge and radius and is proportional to the mass of the ion and the square root of the energy. The ampere-turns in the electromagnet winding are proportional to the distance (which is measured in a direction perpendicular to the direction of the movement of the ions that establish the magnetic field and the direction of the skew plane). This distance must be greater than the dimensions of the beam. Typically, a conventional ferromagnetic yoke is used to minimize this ampere-turn number requirement for controlling the shape of the magnetic field and thereby accurately controlling the focus quality of the magnetic field and stray magnetic field )minimize.

使用此一鐵磁軛須要至少80000安培-匝數來在一介於兩磁極之間的100mm的距離上產生1特斯拉(Tesla)的磁場。此磁場足以將一半徑大致為300mm的路徑中商業上有興趣的離子物種及能量偏斜。因此,產生高強度磁場橫跨大的間隙及空間距離(譬如,1至2公尺)須要有足夠的電能及冷卻,可能要大於1百萬安培匝數。 The use of this ferromagnetic yoke requires at least 80,000 amps-turns to produce a Tesla magnetic field at a distance of 100 mm between the two poles. This magnetic field is sufficient to deflect a commercially interesting ionic species and energy in a path having a radius of approximately 300 mm. Therefore, generating a high-intensity magnetic field across a large gap and spatial distance (for example, 1 to 2 meters) requires sufficient power and cooling, which may be greater than 1 million amps.

因此,如在已刊出的技術文章中被明確地記載的:當質量分析器裝置的尺寸被加大以容納更大的任意射束幅寬尺度且該磁場的方向仍維持和該射束的幅寬方向對齊(其有利於高分辨能力(resolving power)及該帶狀 射束的高深寬比)時,在該裝置內用來產生所想要的磁場強度之必要的電子線圈中的安培匝數的數目會顯著地增加,該裝置在三個尺度上都變大,且有磁性從該裝置進一步漏出的趨勢;及該裝置的整體尺寸及重量這兩者大幅地增加且變成極不方便的大,達到不僅是運輸困難的程度;而且運輸完整的組件變成是不可能的事。例如,參見下列文獻:Alexeff,IEEE Transactions on Plasma Science 07,1983;Banford,Transport of Charged Particles,Spon,1966;Livingood,Optics of Dipole Magnets,AP,1969;Septier and Septier,ed.Focusing of Charged particles,AP,1967;and Stanley Humphries Jr.,Charged Particle Beams,Wiley,1990。 Thus, as clearly stated in the published technical article: when the mass analyzer device is sized to accommodate a larger arbitrary beam width dimension and the direction of the magnetic field remains and the beam Alignment in the width direction (which facilitates high resolution power and the band When the beam has a high aspect ratio, the number of ampere turns in the electronic coil necessary to generate the desired magnetic field strength in the device is significantly increased, and the device becomes larger on three scales, And there is a tendency for magnetic flux to leak further from the device; and both the overall size and weight of the device are greatly increased and become extremely inconvenient, to the extent that it is not only difficult to transport; and it is impossible to transport complete components. Things. See, for example, Alexeff, IEEE Transactions on Plasma Science 07, 1983; Banford, Transport of Charged Particles, Spon, 1966; Livingood, Optics of Dipole Magnets, AP, 1969; Septier and Septier, ed. Focusing of Charged particles, AP, 1967; and Stanley Humphries Jr., Charged Particle Beams, Wiley, 1990.

發生這些事件的任何一種都是極度所不想要的且應儘可能地予以避免。然而,在許多質量分析器裝置中,絕大多數(如果不是全部的話)的這些不利的事情或所不想要的事件都常態地且重復地出現,因此對於質量分離出在大尺寸的移動的帶狀射束內的不同離子物種仍存在著需求。 Any of these events are extremely undesirable and should be avoided as much as possible. However, in many mass analyzer devices, most, if not all, of these unfavorable or unwanted events occur normally and repeatedly, thus separating the masses in large sizes for mass separation. There is still a need for different ionic species within the beam.

已有成功商品化的系統,其磁場和窄的帶狀射束尺度對齊(參見美國專利第5,350,926號及第5,834,786號),它們降低安培-匝數要求且可分別被延伸至300mm及800mm的射束幅寬。在這兩個例子的第一者中,須要有兩個磁鐵,用以產生一具有約80的分辨能力的300mm寬的射束,及在第二者中,則用單一個磁鐵產 生800mm寬的射束,但分辨能力只有5。 A system that has been successfully commercialized, with a magnetic field and a narrow band beam alignment (see U.S. Patent Nos. 5,350,926 and 5,834,786), which reduce the ampere-turn requirements and can be extended to 300 mm and 800 mm, respectively. The width is wide. In the first of these two examples, two magnets are required to produce a 300 mm wide beam with a resolution of about 80, and in the second, a single magnet is used. The 800mm wide beam, but the resolution is only 5.

另一技術資訊點亦應在本文中被提出來的是:離子彈道路徑的聚焦通常發生在磁場梯度被施加以產生帶電粒子的時候。此結果的一個重要的先前技術例子是聚焦的習知例子,其發生在一雙極磁鐵的斜的入口磁極和出口磁極之間,即該聚焦發生在邊緣磁場(fringe field)中。此聚焦效應被Enge詳細地描述在數個出版刊物的技術文章中[例如參見Septier and Septier eds.,Focusing of Charged Particles,Chapter 4.2,Vol 2 p.203,A.P.(1967)];and also by A.P.Banford,[see for example,Transport of Charged Particle Beams(Spon,1966)]。 Another technical information point should also be proposed herein: the focusing of the ion ballistic path typically occurs when a magnetic field gradient is applied to produce charged particles. An important prior art example of this result is a conventional example of focusing that occurs between the oblique entrance and exit magnetic poles of a bipolar magnet, i.e., the focus occurs in a fringe field. This focusing effect is described in detail by Enge in technical articles in several publications [see, for example, Septier and Septier eds., Facusing of Charged Particles, Chapter 4.2, Vol 2 p. 203, AP (1967)]; and also by AP Banford, [see for example, Transport of Charged Particle Beams (Spon, 1966)].

相關先前技術裝置之簡短的歷史概述 A brief historical overview of related prior art devices

在磁場射束彎摺或聚焦裝置中,帶電離子的偏斜和離子的電荷值成正比,且和離子動量成反比。 In magnetic field beam bending or focusing devices, the deflection of charged ions is proportional to the charge value of the ions and inversely proportional to the ion momentum.

先前技術圖1(其取自於美國專利第5,126,575號)顯示一帶狀射束是如何(藉由一特殊的離子源形狀而)被聚焦,使得它的主要尺度(其在本文中被稱為它的幅寬)被聚焦,用以在一彎摺及分析磁鐵的間隙的中間有一最小的尺寸;然後,接著再次被發散,用以提供一大尺度高深寬比之經過分析的帶狀射束。很不幸地,已被知道的是,在該分析磁鐵的中心處的該非常高的電流密度是主要射束不穩定性的來源,如在下面的例子中被進一步描述者。 Prior art Figure 1 (which is taken from U.S. Patent No. 5,126,575) shows how a strip beam (by a particular ion source shape) is focused such that its major dimension (which is referred to herein as Its width is focused to have a minimum dimension in the middle of the gap between the bend and the analysis magnet; then, it is then diverged again to provide a large-scale, high aspect ratio analyzed beam beam . Unfortunately, it is known that this very high current density at the center of the analytical magnet is a source of major beam instability, as further described in the examples below.

先前技術圖2(其係取自美國專利第5,350,926號)顯示一帶狀射束是如何被發送,使得它的幅寬尺度和該磁極的寬度平行;因此,在磁極之間的間隙可以是該射束的寬幅的四分之一或更小。然而,所需之該射束的大的深寬比只藉由後續將此射束通過一第二大的磁鐵來恢復,該第二大的磁鐵主要的功能是將該擴張的帶狀射束聚焦成平行。此’926號專利討論為什麼所想要的是在強磁場中有低電流密度以避免電漿不穩定,這可將該最大電流密度限制至一大致的最大值。應指出的是,在介於該等磁鐵之間的焦點處的電流密度可以比在該等磁鐵的中心的電流密度大200至1000倍-但最差的射束劣化可發生在該等磁鐵內。此系統已被商業上地大量製造,一部分是因為它在避免此電流限制方面的成功;然而,即使是一300mm的射束,磁鐵的重量則重達10噸,且該系統不容易擴大至更大的射束。 Prior art Figure 2 (which is taken from U.S. Patent No. 5,350,926) shows how a strip beam is transmitted such that its width dimension is parallel to the width of the pole; therefore, the gap between the poles can be The width of the beam is a quarter or less. However, the large aspect ratio of the desired beam is recovered only by subsequently passing the beam through a second largest magnet whose primary function is to expand the expanded beam beam. Focus in parallel. This '926 patent discusses why it is desirable to have a low current density in a strong magnetic field to avoid plasma instability, which limits the maximum current density to a substantial maximum. It should be noted that the current density at the focal point between the magnets may be 200 to 1000 times greater than the current density at the center of the magnets - but the worst beam degradation may occur within the magnets. . This system has been commercially mass-produced, in part because of its success in avoiding this current limitation; however, even for a 300mm beam, the weight of the magnet weighs 10 tons and the system does not easily expand to larger The beam.

先前技術圖3(其係取自於美國專利第7,112,789號)顯示一帶狀射束如何被編轉於它的窄尺度的方向上,同時仍擴張於它的寬尺度方向上;且達到高的分辨能力。在此例子中,(因為大的磁極間隙的關係)需要具有複雜的三維度形狀之非常大的線圈,用以在磁鐵的入口及出口處繞在該高大的離子射束周圍。此方式到目前為止已在射束幅寬達1.2m的例子中獲得成功,但進一步擴大規模即變得非常重且非常昂貴。此外,美國專利第6,162,262號描述一種以類似方式被使用的‘窗框式’磁 鐵;但它遭遇到更大的雜散磁場的問題,其在軛中須要重非常多的鐵磁材料。 Prior art Figure 3 (which is taken from U.S. Patent No. 7,112,789) shows how a ribbon beam is encoded in its narrow-scale direction while still expanding in its wide-scale direction; Resolving power. In this example, a very large coil with a complex three-dimensional shape is required (because of the large magnetic pole gap) to wrap around the tall ion beam at the entrance and exit of the magnet. This approach has so far been successful in the case of a beam width of up to 1.2 m, but further expansion has become very heavy and very expensive. In addition, U.S. Patent No. 6,162,262 describes a "window frame" magnet that is used in a similar manner. Iron; but it suffers from the problem of larger stray magnetic fields, which require a lot of ferromagnetic material in the yoke.

先前技術圖4(其係取自於美國專利第8,723,135號)在射束的端部上方及之上具有類似的線圈彎曲的使用;具有一大的彎曲半徑,其為該射束高度的三至四倍;且已被使用在較大的尺寸上。但它的重量對大型的商業尺寸而言超過100噸,這產生相當大的困難度;而分辨能力則比10小很多。 Prior art Figure 4 (which is taken from U.S. Patent No. 8,723,135) has similar coil bending above and above the ends of the beam; has a large bend radius which is three to the beam height Four times; and has been used in larger sizes. But its weight exceeds 100 tons for large commercial sizes, which creates considerable difficulty; and the resolution is much smaller than 10.

在美國專利申請案第13/385,618號(美國專利公開案第20120235053號)中,數種其它方式被檢視,它們通常使用磁性鏡片的像差(射束在鏡片中被偏心地傳送)來分離不同的離子種類。這些方式達成低的分辨能力;但具有小尺寸的優點。 In U.S. Patent Application Serial No. 13/385,618 (U.S. Patent Publication No. 20120235053), several other methods are inspected, which generally use the aberrations of the magnetic lens (the beam is eccentrically transmitted in the lens) to separate the differences. Type of ion. These methods achieve low resolution; but have the advantage of small size.

許多這些先前技術裝置已被成功地使用達到某些尺寸。然而,隨著射束尺寸已成長,很明確的事實是,所須要的功率增加得比射束尺寸的線性比率更快;像差(aberration)係以射束尺寸的平方在增長;且重量增長得比該射束尺寸的平方更快,在某些情況中係以射束尺寸的立方在增長,而所達成的分辨能力在多數的情況中係被降低。 Many of these prior art devices have been successfully used to reach certain sizes. However, as the beam size has grown, it is clear that the required power is increased faster than the linear ratio of the beam size; the aberration is increasing by the square of the beam size; and the weight is increasing It is faster than the square of the beam size, in some cases the cube of the beam size is increasing, and the resolving power achieved is reduced in most cases.

現今的展望及需求 Current outlook and needs

因此,在現今的技術中,對於能夠在一移動的帶狀離子射束的可測量的幅寬尺寸(即,它的主要橫向 尺度)被任意地延伸至任何所想要的有用的大小(即,一現今變動於約150mm至3000mm或更大的尺度大小)的時候從該離子射束中分離出不想要的離子種類並將其去除掉之使用一可操作的磁性分析器裝置仍存在著極高的需求。 Thus, in today's technology, for a measurable width dimension capable of a moving ribbon beam (ie, its main lateral direction) The scale) is arbitrarily extended to any desired useful size (ie, a current size variation of about 150 mm to 3000 mm or more) to separate unwanted ion species from the ion beam and There is still a high demand for the use of an operable magnetic analyzer device that is removed.

因此,在現今的技術中,對於一種能夠從一幅寬大於約1公尺的帶狀離子射束中的所想要的摻雜物或其它處理離子種類的射束中分離出不想要的離子種類的裝置仍存在著未被滿足的需求,其用足夠的分辨能力來例如將P+從BF+中分離出來且沒有使用比100000A-t更大的功率,且該射束系統的覆蓋區域(footprint)為1至2平方公尺,而不是10至20平方公尺,總重量小於約10噸,使得使用傳統的起重工具的運輸及安裝很簡單容易。 Thus, in today's technology, an unwanted ion can be separated from a desired dopant or other treated ion species beam in a ribbon ion beam having a width greater than about 1 meter. There is still an unmet need for a variety of devices that utilize sufficient resolution to, for example, separate P + from BF + without using more power than 100000A-t, and the coverage area of the beam system ( The footprint) is 1 to 2 square meters instead of 10 to 20 square meters, and the total weight is less than about 10 tons, making transportation and installation using traditional lifting tools simple and easy.

此外,對於一種磁場產生裝置有持續性的需求,其磁場輪廓在沿著該幅寬尺寸被擴張的尺度方向沒有變動,即在射束聚焦或偏斜期間,沿著射束的主要橫貫尺度沒有系統性變化;且很少(如果有的話)有導因於操作設備所產生的人造物之變易(inconsistency)或誤差被導入。 Furthermore, there is a continuing need for a magnetic field generating device whose magnetic field profile does not change in the direction of the dimension that is expanded along the width dimension, i.e., during beam focusing or skewing, along the main transverse dimension of the beam. Systematic changes; and few, if any, inincacencies or errors introduced by artifacts produced by the operating device are introduced.

無論如何,直到目前為止所知道的,這些重要的目標及所想要的結果沒有任何一者被現今的質量分析器裝置成功地達到。 In any case, as far as is known, none of these important goals and desired results have been successfully achieved by today's mass analyzer devices.

本發明有多個面向。 The invention has several aspects.

第一種面向是一種質量分析器設備,其適合將一所想要的離子的帶狀射束(其具有一範圍在約5至80keV之間的能量值)從不同磁剛性的不想要的離子(亦即,具有有意義的不同質量及/或能量及/或電荷狀態的離子)中分離出來,其中該移動的帶狀射束通過鄰接的該設備,該質量分析器設備包含:一實質C型軛線圈組件,其將被設置成和該帶狀離子射束的移動路徑相鄰並藉此跨越該鄰接的離子射束的幅寬尺度,該實質C型軛線圈組件包含:一形態及尺度被設定的隧道形軛,其(α)具有C型截面,其圍繞大於180度且典型地190至210度,且其環繞在一隧道形凹穴的三個側邊上及其在一直線上均一地延伸至兩個分開的端部的每一端部,(β)具有兩個可識別的實心壁臂件作為隧道側面及一實心的中心橋接段,(γ)提供兩個分開的臂件面表面,其具有一範圍在約150至175度之間的夾角(included angle),及(δ)是用至少一磁性金屬材料製造;及至少一纏繞的線圈,其設置在該隧道形軛上,其中每一該被設置的纏繞的線圈(i)是一跑道型長圓形(obround)迴圈,其由多匝導電體纏繞而成且包含兩個導體繞組的平行直線長度區段 以及兩個分開的彎曲端,其中每一直線長度區段的長度大於該移動的帶狀射束的幅寬尺度,及每一彎曲端彎繞180度且和該等直線長度區段相銜接,(ii)延伸環繞並包圍該軛,(iii)被設置成使得兩個直線長度區段的一者位在該軛的隧道空間內,且另一直線長度區段位在該軛的外面,(iv)可產生一隨選式(on-demand)磁場,其由該軛的表面直角地散發出來,多個磁場被定向的空間區域藉此被產生且以連續串聯的方式被設置,該等多個磁場被定向的空間區域的體積、磁場強度、及方向效應整體上係足以達成該鄰接的移動的離子射束的實質改變。 The first aspect is a mass analyzer device adapted to apply a wanted beam of a desired beam of ions (having an energy value ranging between about 5 and 80 keV) from unwanted magnetic ions of different magnetic rigidity. (ie, ions having meaningfully different masses and/or energy and/or state of charge) separated by the moving ribbon beam passing through the adjacent device, the mass analyzer device comprising: a substantially C-type a yoke coil assembly that is disposed adjacent to a path of movement of the ribbon beam and thereby spans a width dimension of the adjacent ion beam, the substantial C-yoke coil assembly comprising: a form and scale a tunnel-shaped yoke having (a) having a C-shaped cross-section that surrounds more than 180 degrees and typically 190 to 210 degrees, and which surrounds three sides of a tunnel-shaped recess and is uniform on a straight line Extending to each end of the two separate ends, (β) has two identifiable solid wall arm members as tunnel side faces and a solid central bridge segment, (γ) providing two separate arm face surfaces, It has a clip ranging between about 150 and 175 degrees (included angle), and (δ) are made of at least one magnetic metal material; and at least one wound coil disposed on the tunnel yoke, wherein each of the wound coils (i) provided is a runway An obround loop that is wound by a multi-turn conductor and includes parallel straight length sections of two conductor windings And two separate curved ends, wherein each of the linear length segments has a length greater than a width dimension of the moving ribbon beam, and each curved end is bent 180 degrees and is engaged with the linear length segments, Ii) extending around and surrounding the yoke, (iii) being arranged such that one of the two linear length segments is located within the tunnel space of the yoke, and the other linear length segment is located outside the yoke, (iv) Generating an on-demand magnetic field that is emitted at right angles from the surface of the yoke, the spatial regions in which the plurality of magnetic fields are directed are thereby generated and arranged in a continuous series, the plurality of magnetic fields being The volume, magnetic field strength, and directional effects of the oriented spatial regions are generally sufficient to achieve substantial changes in the adjacent moving ion beam.

本發明的第二面向提供一種操作系統,其適合改變一幅寬被任意地選取之鄰接的移動的帶狀離子射束的方向及收斂,該操作系統包含:一移動的帶狀射束,其包含至少一種所想要的離子種類及至少一種所不想要的離子種類,其中該離子射束的幅寬尺度被預先選定且尺寸被固定為小於100mm至大於3000mm,該離子射束的厚度尺度被預先選定且尺寸被固定為從約1mm至10mm,且該離子射束的厚度只發散約±2°或更多;一被建構成一實質C型軛線圈組件的質量分析器設備,其和該帶狀離子射束的移動路徑相鄰且藉此橫跨該鄰接的移動中的離子射束的幅寬尺度,該實質C型軛線圈組件包含: 一形態及尺度被設定的隧道形軛,其(α)具有C型截面,其圍繞大於180度且典型地190至210度,且其環繞在一隧道形凹穴的三個側邊上及其在一直線上均一地延伸至兩個分開的端部的每一端部,(β)具有兩個可識別的實心壁臂件作為隧道側面及一實心的中心橋接段,(γ)提供兩個分開的臂件面表面,其具有一範圍在約150至175度之間的夾角,及(δ)是用至少一磁性金屬材料製造;及至少一纏繞的線圈,其設置在該隧道形軛上,其中每一該被設置的纏繞的線圈(i)是一跑道型長圓形(obround)迴圈,其由多匝導電體纏繞而成且包含兩個導體繞組的平行直線長度區段以及兩個分開的彎曲端,其中每一直線長度區段的長度大於該移動的帶狀射束的幅寬尺度,及每一彎曲端彎繞180度且和該等直線長度區段相銜接,(ii)延伸環繞並包圍該軛,(iii)被設置成使得兩個直線長度區段的一者位在該軛的隧道空間內,且另一直線長度區段位在該軛的外面,(iv)可產生一隨選式(on-demand)磁場,其由該軛的表面直角地散發出來,多個磁場被定向的空間區域藉此被產生且以連續串聯的方式被設置,該等多個磁場被定向的磁場的空間區域的體積、磁場強度、及方向效應整體 上係足以達成該鄰接的移動的離子射束的實質改變,及一電流源,其和該長圓形線圈成隨選式電聯通。 A second aspect of the present invention provides an operating system adapted to change the direction and convergence of a contiguous moving strip of ion beam selected arbitrarily, the operating system comprising: a moving strip beam, Included in at least one desired ion species and at least one unwanted ion species, wherein the ion beam has a width dimension pre-selected and the size is fixed from less than 100 mm to greater than 3000 mm, the thickness dimension of the ion beam being Preselected and dimensioned from about 1 mm to 10 mm, and the thickness of the ion beam is only divergent by about ±2° or more; a mass analyzer device constructed to form a substantially C-yoke coil assembly, and The moving path of the ribbon ion beam is adjacent and thereby spans the width dimension of the adjacent moving ion beam, the substantial C-yoke coil assembly comprising: a tunnel-shaped yoke having a shape and a dimension, the (α) having a C-shaped cross section that surrounds more than 180 degrees and typically 190 to 210 degrees, and which surrounds three sides of a tunnel-shaped recess and Uniformly extending in a straight line to each end of the two separate ends, (β) has two identifiable solid wall arm members as tunnel sides and a solid central bridge segment, (γ) providing two separate An arm face surface having an included angle ranging from about 150 to 175 degrees, and (δ) being made of at least one magnetic metal material; and at least one wound coil disposed on the tunnel yoke, wherein Each of the wound coils (i) to be disposed is a racetrack-type obround loop which is wound by a multi-turn conductor and includes parallel straight length sections of two conductor windings and two separate loops. a curved end, wherein each of the linear length segments has a length greater than a width dimension of the moving strip beam, and each curved end is bent 180 degrees and engaged with the linear length segments, (ii) extending around And surrounding the yoke, (iii) is set such that two straight length sections One is located in the tunnel space of the yoke, and the other straight length section is located outside the yoke, (iv) can generate an on-demand magnetic field, which is emitted from the surface of the yoke at right angles, A spatial region in which a plurality of magnetic fields are directed is thereby generated and arranged in a continuous series, the volume, magnetic field strength, and directional effect of the spatial region of the magnetic field being oriented The upper system is sufficient to achieve substantial changes in the adjacent moving ion beam, and a current source that is in electrical communication with the oblong coil.

1‧‧‧橋接區段 1‧‧‧Bridge section

13‧‧‧面表面 13‧‧‧ surface

7a‧‧‧臂件 7a‧‧‧arms

7b‧‧‧臂件 7b‧‧‧arms

15‧‧‧面表面 15‧‧‧ surface

2‧‧‧電磁線圈 2‧‧‧Electromagnetic coil

52a‧‧‧直線長度區段 52a‧‧‧Line length section

52b‧‧‧直線長度區段 52b‧‧‧Line length section

2a‧‧‧電磁線圈 2a‧‧‧Electromagnetic coil

2b‧‧‧電磁線圈 2b‧‧‧Electromagnetic coil

10‧‧‧C型軛線圈組件 10‧‧‧C type yoke coil assembly

113‧‧‧空間區域 113‧‧‧ Space area

115‧‧‧空間區域 115‧‧‧ Space area

112‧‧‧中間的空間區域 112‧‧‧Intermediate space area

3a‧‧‧棒 3a‧‧‧ stick

3b‧‧‧棒 3b‧‧‧ stick

4‧‧‧棒 4‧‧‧ stick

50‧‧‧被橫貫地安裝的線圈 50‧‧‧ traversely mounted coils

112b‧‧‧中間的體積區域 112b‧‧‧ middle volume area

113b‧‧‧端部空間區域 113b‧‧‧End Space Area

當與附圖相配合時,本發明可更容易被瞭解及更認識,其中:先前技術圖1顯示一種被提出且被捨棄的系統,其使用一收斂的帶狀射束,其在一分析磁鐵的場區域的中心有一最小的幅寬,擴張以產生一高深寬比的寬帶射束;先前技術圖2例示一傳統上習知的使用兩個磁鐵的設備,該等磁鐵的第一個磁鐵藉由將該帶狀射束偏斜於其幅寬的平面上來分析該帶狀射束,該等磁鐵的第二個磁鐵允許該帶狀射束在聚焦之前先擴張,用以變成一高深寬比的平行帶狀射束;先前技術圖3顯示一傳統上習知的White and Chen磁性分析器,其使用‘床架(bedstead)’線圈及一非必要的擴張輪廓,用以分析一高深寬比的高電流帶狀射束;先前技術圖4顯示傳統上習知之用於非常高的帶狀離子射束的Glavish磁鐵分析器;圖5a顯示本發明的該實質C型軛線圈組件的側視圖及圖5b顯示其立體圖;圖6a及6b顯示具有一鄰接的移動的離子射束的該隧道形軛的側視圖;圖6c顯示該具有一鄰接的移動的離子射束的該隧道 形軛的剖面圖,其例示該軛線圈組件將一鄰接的離子射束的移動彈道偏斜及再聚焦的能力;圖7顯示一被本發明改變、偏斜、及聚焦的帶狀移動的離子射束的被模塑形狀的數個立體圖;圖8顯示被橫貫地安裝在該具有輔助磁場塑形棒的實質C型軛線圈組件內的電線圈的詳細的立體圖,其中一離子射束通過該軛和該等輔助棒之間;圖9a顯示該實質C型軛線圈組件的剖面,其中磁通量線被示出,且整體磁場方位的不同區域被示出;圖9b顯示和三個輔助磁場塑形棒相結合的該實質C型軛線圈組件的一較佳的實施例,其顯示在該射束可橫貫的三個連續的區域內的磁場濃度;圖10是一圖表,其顯示磁場沿著一離子在Y-Z平面上的投影路徑的Y方向分量及Z方向分量的線圖,其中來自圖9a及9b的磁場區域被標示出來;及圖11顯示該C型軛線圈分析器的一實施例,在此分析器中該線圈被延伸至真空。 The present invention may be more readily understood and appreciated when in conjunction with the accompanying drawings, wherein: prior art Figure 1 shows a proposed and discarded system that uses a convergent strip beam with an analytical magnet The center of the field region has a minimum width that expands to produce a high aspect ratio broadband beam; prior art Figure 2 illustrates a conventionally known device using two magnets, the first magnet of which is borrowed The strip beam is analyzed by deflecting the strip beam onto a plane of its width, the second magnet of the magnets allowing the strip beam to expand prior to focusing to become a high aspect ratio Parallel strip beam; prior art Figure 3 shows a conventionally known White and Chen magnetic analyzer that uses a 'bedstead' coil and an optional expansion profile to analyze a high aspect ratio High current strip beam; prior art Figure 4 shows a conventionally known Glavish magnet analyzer for very high ribbon ion beams; Figure 5a shows a side view of the substantially C-yoke coil assembly of the present invention and Figure 5b shows a perspective view thereof; Figures 6a and 6b show side views of the tunnel yoke with an adjacent moving ion beam; Figure 6c shows the tunnel with an adjacent moving ion beam A cross-sectional view of a yoke illustrating the ability of the yoke coil assembly to deflect and refocus a moving trajectory of an adjacent ion beam; Figure 7 shows a band-shaped moving ion that is altered, deflected, and focused by the present invention. a plurality of perspective views of the molded shape of the beam; FIG. 8 shows a detailed perspective view of the electrical coil traversed within the substantially C-yoke coil assembly having the auxiliary magnetic field shaping bar, wherein an ion beam passes through Between the yoke and the auxiliary bars; Figure 9a shows a cross section of the substantially C-yoke coil assembly, wherein the magnetic flux lines are shown and different regions of the overall magnetic field orientation are shown; Figure 9b shows and three auxiliary magnetic fields shaping A preferred embodiment of the substantially C-yoke coil assembly incorporating the rods exhibits magnetic field concentrations in three consecutive regions through which the beam can traverse; FIG. 10 is a graph showing the magnetic field along a a line diagram of the Y-direction component and the Z-direction component of the projection path of ions on the YZ plane, wherein the magnetic field regions from Figures 9a and 9b are labeled; and Figure 11 shows an embodiment of the C-yoke coil analyzer, In this parser It is extended to the vacuum ring.

本發明是一種能夠在任何被任意地選取的固定幅寬尺度的一鄰接的移動動帶狀射束中達成至少一種所想要的改變(譬如,帶電離子質量的有效分離)的實質C型軛線圈組件。該實質C型軛線圈組件是一質量分析器設備,它比相同能力的以前的裝置輕很多;可藉由延伸在該 射束幅寬方向上而更容易且更便宜被製造及被放大,用以處理非常寬廣但痕薄的帶狀射束;及可以比傳統習知的裝置更快速地被安裝、對齊及操作。 The present invention is a substantially C-yoke capable of achieving at least one desired change (e.g., efficient separation of charged ion mass) in any contiguous moving strip beam of any fixed width dimension selected arbitrarily. Coil assembly. The substantial C-yoke coil assembly is a mass analyzer device that is much lighter than previous devices of the same capability; It is easier and cheaper to manufacture and be enlarged in the beam width direction for handling very broad but thin strip beams; and can be mounted, aligned and operated faster than conventional conventional devices.

一具有高分辨能力的質量分析器組件的價值 The value of a mass analyzer component with high resolution

1.傳統上,在本發明的技術領域中習知的是,在許多操作例子中及尤其是在商業應用中,將P+離子從P++離子及從P2 +離子中,以及從某些其它帶正電荷的污染物中分離出來是必要的;且將B+離子從B++離子及從F+離子中分離出來經常亦是必要的。一更令人信服的例子是將27Al+31P+中分離出來,而將19F11B+(30amu)從31P+分離出來可能是最重要的常規例子,其中來自一先前的硼植入物的微量氣體會污染一後續實施在同一離子植入物上的磷植入物。一大於31之高分辨能力在此示範性例子中是必要的。 1. Conventionally, in the technical field of the invention is conventional and the operation in many cases, especially in commercial applications, the P + ions from the P ++ ions and P 2 + ions, and from a Separation of some other positively charged contaminants is necessary; and it is often necessary to separate B + ions from B ++ ions and from F + ions. A more convincing example is the separation of 27 Al + from 31 P + , and the separation of 19 F 11 B + (30 amu) from 31 P + may be the most important conventional example, from a previous boron The trace gases of the implant contaminate a subsequent phosphorus implant that is applied to the same ion implant. A high resolution capability greater than 31 is necessary in this illustrative example.

一用來將一射束傳送通過一只能傳送所想要的離子種類的分辨孔的系統被界定為將該離子射束從一第一誤對準位置(即,通過一孔的離子傳送有50%在最大值的一邊)實體地移動至一第二誤對準位置(即,通過一孔的離子傳送有50%在最大值的另一邊)所需之離子質量(或能量)的改變的倒分數(reciprocal of fractional)。這被簡寫為M/△M FWHM,其中FWHM是半最大值處的全寬度(Full Width at Half Maximum)的縮寫。其通常是藉由對射束加速電壓實施極精細的改變以控制能量,或對 離開該磁性分析器的射束流實施精細的改變,並測量被傳送的射束流來加以測量。 A system for transporting a beam through a resolving aperture that transmits only the desired ion species is defined as transporting the ion beam from a first misaligned position (ie, through a hole in the ion transport) 50% on one side of the maximum) physically moves to a second misaligned position (ie, 50% of the ion transport through one hole is on the other side of the maximum) required for the change in ion mass (or energy) Reciprocal of fractional. This is abbreviated as M/ΔM FWHM, where FWHM is an abbreviation for Full Width at Half Maximum. It usually controls the energy by making very fine changes to the beam accelerating voltage, or The beam flow leaving the magnetic analyzer performs a fine change and measures the transmitted beam current for measurement.

因此,一相當高解析度對於達到複雜的帶電粒子混合物的有效分離是很重要的,因為不同種類的混合物將總是包含一大數量的帶電的背景離子。在這些情形中,一具備較高分辨能力的裝置在分離並阻擋不想要的離子種類(其質量和想要的離子種類的質量差異很小)和完全不偵測也不分離不想要的離子種類兩者間有實質上的不同。 Therefore, a fairly high resolution is important to achieve efficient separation of complex charged particle mixtures, as different kinds of mixtures will always contain a large amount of charged background ions. In these cases, a device with higher resolution is separating and blocking unwanted ion species (the difference in mass between the mass and the desired ion species is small) and does not detect or separate unwanted ion species at all. There is a substantial difference between the two.

例如,為了要偵測並將B+離子從B++離子及從F+離子分離出來,一質量分析器裝置將須要一約2的最小分辨能力。但是,為了要以可靠地去除不想要的離子污染物來達到想要的帶電粒子的高品質分離,典型地須要將分辨能力顯著地提高到至少20。類似地,為了有效地偵測、分離、及將BF+離子從P+離子隔離出來,通常須要的是,該質量分析器裝置具備比31大很多的分辨能力;且在這些操作情形中,分辨能力是40或更大的裝置是最受歡迎的且是極被想要的。因此,質量分析器裝置的分辨能力愈高,離子種類分開的品質就愈好。 For example, in order to detect and separate B + ions from B ++ ions and from F + ions, a mass analyzer device would require a minimum resolution of about 2. However, in order to achieve high quality separation of the desired charged particles with reliable removal of unwanted ionic contaminants, it is typically necessary to significantly increase the resolution to at least 20. Similarly, in order to effectively detect, separate, and isolate BF + ions from P + ions, it is generally desirable that the mass analyzer device has a much greater resolution than 31; and in these operating situations, the resolution Devices with a capacity of 40 or greater are the most popular and highly desirable. Therefore, the higher the resolution of the mass analyzer device, the better the quality of the ion species separation.

此外,將此一高分辨能力的質量分離裝置有效地耦合至一高電流直線離子源對於大基板(譬如,平板顯示器及太陽能電池)的離子佈植將有極大的好處及優點。 In addition, the efficient coupling of this high resolution mass separation device to a high current linear ion source will have significant advantages and advantages for ion implantation of large substrates such as flat panel displays and solar cells.

2.因此,本發明提供的一項特別開創性的特徵 係在於單純地藉由將該設備延伸於被預先選取的尺度上來從共同移動於一鄰接的帶狀射束中有效地偵測及分離類似但可識別地不相同的離子種類的操作能力。而且,在前述內容下,將被瞭解的是,此特別的能力既不是一項小的成就,也不是一項微不足道的特徵。 2. Therefore, a particularly groundbreaking feature provided by the present invention The ability to effectively detect and separate similar but identifiably different ion species from a common contiguous strip beam simply by extending the device over pre-selected dimensions. Moreover, in the foregoing, it will be appreciated that this particular ability is neither a small achievement nor a trivial feature.

市面上用於矽晶圓的高電流佈植設備的真實分辨能力部分地依據射束能量及電流是在20至60的範圍內。本發明可常態地提供一約40的分辨能力,同時能夠比傳統的佈植機延展10倍的射束幅寬及10倍的射束流。在低電流操作的精密質譜儀可具有高許多的分辨能力(高達500或更高),但用於平板顯示器的傳統佈植機通常達到的分辨能力係比3稍微高一點。 The true resolution capability of high current implant equipment for tantalum wafers in the market is based in part on beam energy and current in the range of 20 to 60. The present invention can normally provide a resolving power of about 40 while being capable of extending 10 times the beam width and 10 times the beam current than conventional implanters. Precision mass spectrometers operating at low currents can have much higher resolution (up to 500 or higher), but conventional implanters for flat panel displays typically achieve a resolution that is slightly higher than 3.

用於非常大平板顯示器的既有佈植機使用大寬度之具備多孔擷取系統之多尖端離子源(Dohi et al.IIT2006(2006)417-420,Matsumoto et al.,IIT2012(2012),324-327)。它們使用獨特的但對於質量解析而言是相當傳統的雙極彎折磁鐵,其傳統上係彎折介於60至90度的角度。等離子射束的幅寬(主要尺度)在1公尺至2.2公尺的範圍之間,其為該射束厚度(約100mm)的10至20倍且它們的彎折半徑被加大至數公尺,用以保持它們的尺度和較小規模的傳統裝置成正比。它們達到約5的分辨能力。這對於例如將磷離子從PH+離子分離出來、將硼離子從碳離子分離出來、或將BF+離子從P+離子分離出來而言是不適當的。 Existing implanters for very large flat panel displays use large-width multi-tip ion sources with porous extraction systems (Dohi et al. IIT 2006 (2006) 417-420, Matsumoto et al., IIT 2012 (2012), 324 -327). They use a unique bipolar bending magnet that is quite traditional for mass resolution, which is traditionally bent at an angle of 60 to 90 degrees. The width (main dimension) of the plasma beam is between 1 and 2.2 meters, which is 10 to 20 times the thickness of the beam (about 100 mm) and their bending radius is increased to several Rulers are used to keep their scale proportional to the smaller scale of conventional devices. They achieve a resolution of about 5. This is not suitable for, for example, separating phosphorus ions from PH + ions, separating boron ions from carbon ions, or separating BF + ions from P + ions.

因此,本發明的所有實施例將常態地且可靠地提供範圍從約15至約30的高分辨能力;且藉此最想要的特徵及獨特的能力而能夠提供一好很多個偵測品質及用一或多種個別的離子種類之顯著改善的分離,該等離子種類係出現在一起移動於一尺度幅寬被任意地選取之鄰接的帶狀射束中的帶電粒子的混合物中,因而更純的摻雜物質可被佈植到多晶矽膜層中。 Thus, all embodiments of the present invention will provide a high resolution capability ranging from about 15 to about 30 in a normal and reliable manner; and with this most desirable feature and unique capabilities, a good quality of detection and With a significantly improved separation of one or more individual ion species, the plasma species appear to move together in a mixture of charged particles in a contiguous ribbon beam of arbitrarily selected width width, thus being purer The dopant species can be implanted into the polycrystalline germanium film layer.

II.該實質C型軛線圈組件整體所提供的能力及特徵 II. The capabilities and features provided by the substantial C-yoke coil assembly as a whole

構成本發明的開放型三邊式軛線圈組件可被使用在許多替代的應用中且可被用來達成各種不同的結果成果。在較佳的實施例中,該軛線圈組件主要係呈現C型,其中“C”型態是一種彎繞約200度之開放式迴圈。該組件可另外以不同造形的形式呈現,其在外形上或多或少地被圓角化;但在所有例子中,該軛環繞一中心隧道凹穴的三個邊,該中心隧道凹穴被該長圓形的電磁線圈或諸線圈的直線長度導體所佔據。 The open three-sided yoke assembly constituting the present invention can be used in many alternative applications and can be used to achieve a variety of different results. In a preferred embodiment, the yoke coil assembly is predominantly in the form of a C, wherein the "C" configuration is an open loop that is bent about 200 degrees. The assembly may additionally be presented in a different form, which is more or less rounded in shape; but in all examples, the yoke encircles three sides of a central tunnel pocket, the central tunnel pocket being The oblong electromagnetic coil or the linear length conductors of the coils are occupied.

本發明整體的能力及特性的多樣性範圍因而包括所有以下所述: The range of versatility of the overall capabilities and characteristics of the present invention thus includes all of the following:

(i)該開放式軛線圈組件能夠明確地將移動的離子射束從其進入的或初始的彈道偏斜一淨改變角度,其典型地大於約8度且不大於約25度。 (i) The open yoke assembly is capable of unambiguously changing the angle of the moving ion beam from its incoming or initial ballistic deflection, which is typically greater than about 8 degrees and no greater than about 25 degrees.

(ii)該開放式軛線圈組件能夠明確地將至少一種(且有時候是數種)所想要的離子種類從一或多種不想要 的離子種類雜質中分離出來。 (ii) the open yoke assembly is capable of explicitly at least one (and sometimes several) of the desired ion species from one or more unwanted Ion species are separated from impurities.

(iii)該開放式軛線圈組件能夠明確地將該移動的離子射束的帶電離子粒子聚焦於Y-Z平面內。 (iii) The open yoke assembly is capable of explicitly focusing the charged ion beam of the moving ion beam in the Y-Z plane.

(iv)該開放式軛線圈組件能夠明確地將B離子從C離子中分離出來,及將P離子從PH離子中分離出來。 (iv) The open yoke assembly is capable of clearly separating B ions from C ions and separating P ions from PH ions.

(v)該開放式軛線圈組件能夠為1公尺至2.5公尺幅寬的離子射束明確地實施上述動作,甚至是沒有基本的限制。 (v) The open yoke coil assembly is capable of performing the above-described actions explicitly for ion beams of a width of 1 to 2.5 meters, even without substantial limitations.

(vi)該開放式軛線圈組件能夠明確地對具備2.5amu.MeV(換言之,高達80keV磷)的質能乘積(mass-energy product)的離子射束在一射束移動距離達1公尺內達成此質量分離。 (vi) The open yoke coil assembly can clearly target a mass-energy product ion beam having a mass of 2.5 amu. MeV (in other words, up to 80 keV phosphor) within a distance of up to 1 meter. Achieve this quality separation.

(vii)該開放式軛線圈組件能夠明確地如一重量低於約10公噸的單件式設備般地達成所有上述的動作。 (vii) The open yoke assembly can achieve all of the above actions in a clear manner as a one-piece device weighing less than about 10 metric tons.

而且,整體而言,本發明的不少於四項的獨一無二的特性必須被適當地認清且真實地瞭解,它們是: Moreover, on the whole, the unique characteristics of not less than four items of the present invention must be properly recognized and truly understood, and they are:

第一,構成本發明的該實質C型軛線圈組件是一單一的整體式質量分析器組件,它獨立運作且有完整的功能且足以達成改變一移動的帶電粒子射束的目的,該帶電粒子射束將空間相鄰地通過它,即,在一足以達成它的指定目的之高強度磁場可被產生之前,無需使用成對的或更多的前述設備。 First, the substantial C-yoke assembly constituting the present invention is a single integral mass analyzer assembly that operates independently and has a complete function and is sufficient for the purpose of altering a moving charged particle beam. The beam will pass spatially adjacent thereto, i.e., without the use of a pair or more of the aforementioned devices, before a high intensity magnetic field sufficient to achieve its intended purpose can be produced.

第二,該實質C型軛線圈質量分析器組件所產生的整個磁場的體積區域本質及多變的強度對於任何被 任意地選取的固定式幅寬尺度的帶狀離子射束而言在量方面係足以通過橫越它,即該軛線圈組件所產生的且直角地延伸出的磁場的空間區域在整體尺度大小及磁場強度值這兩方面都是適合達成不同離子種類的有效分離及達成(預選質量的)帶電離子粒的聚焦,然後移動於一射束中。 Second, the volumetric region of the entire magnetic field produced by the substantial C-yoke coil mass analyzer assembly and the variable intensity are The arbitrarily selected fixed-width-scale ribbon ion beam is sufficient in quantity to traverse it, that is, the spatial region of the magnetic field generated by the yoke coil assembly and extending at right angles in an overall size and Both of the magnetic field strength values are suitable for achieving effective separation of different ion species and for achieving (preselected mass) charged ionic particles, and then moving in a beam.

第三,該實質C型軛線圈質量分析器組件所產生的整個磁場將永遠呈現某些最小特徵,其包括:(i)一直角地延伸的磁場,其大小足以覆蓋並均勻地鋪在該移動的射束的整個幅寬尺度上;(ii)一預定強度的磁場(其磁通量線永遠平置在Y-Z平面內),且此磁場輪廓均勻地沿著X軸方向延伸;及(iii)一沿著該移動的離子射束的X軸方向(幅寬,橫貫方向)的磁場分量之有效的零值。 Third, the entire magnetic field produced by the substantial C-yoke coil mass analyser assembly will always exhibit some minimal features, including: (i) a magnetic field extending at an angle that is large enough to cover and evenly spread over the moving shot. (ii) a magnetic field of a predetermined intensity (the magnetic flux line is always flat in the YZ plane), and the magnetic field profile extends uniformly along the X-axis direction; and (iii) along the The effective zero value of the magnetic field component of the X-axis direction (width, traverse direction) of the moving ion beam.

第四,該實質C型軛線圈組件整體在結構上絕不是且在操作上也絕不像一螺線管般操作,即一帶電離子粒子射束在任何時間都將不會進入該組件中的一被設置的線圈的空間體積內,也絕不會通過該設備的一被設置的線圈的材料物質。相反地,該軛線圈組件整體和該移動的離子射束被並列且被鄰近地設置在該移動的離子射束的旁邊。非必要地(optionally)被設置在該射束和該軛線圈相反的一側上的磁場強化棒主要是被動式構件,其在一給定的線圈電流下將該磁場的強度提高,但它並沒有扮演它重要的角色。 Fourth, the substantial C-yoke coil assembly as a whole is by no means operational in operation and never operates like a solenoid, ie a charged ion beam beam will not enter the assembly at any time. Within the spatial volume of a coil that is placed, it will never pass through the material of a coil of the device that is placed. Conversely, the yoke coil assembly as a whole and the moving ion beam are juxtaposed and disposed adjacent to the moving ion beam. A magnetic field enhancement rod that is optionally disposed on the opposite side of the beam from the yoke coil is primarily a passive member that increases the strength of the magnetic field at a given coil current, but it does not Play its important role.

III.該實質C型軛線圈組件的結構 III. Structure of the substantial C-type yoke coil assembly

本發明可藉由考量一操作系統而被最佳地瞭解,在該操作系統中一由多種離子種類構成的帶狀離子射束在一向前進的移動方向上移動一段設定的距離。在此一操作系統中,該移動的離子射束可使用直角座標系統來予以辨識及特徵化。 The present invention can be best understood by considering an operating system in which a ribbon ion beam of a plurality of ion species is moved a predetermined distance in a forward moving direction. In this operating system, the moving ion beam can be identified and characterized using a right angle coordinate system.

在離子射束系統中使用一以參考離子彈道為根據之曲線Z軸(curvilinear Z-axis)是很常見的。然而,因為該射束被彎曲一相對小的角度(例如,16度),所以為了簡化起見,此方法未在此處被使用;且該z軸代表離子進入及離開該裝置的移動方向的平均值(mean)。 It is common to use a curvilinear Z-axis based on a reference ion trajectory in an ion beam system. However, because the beam is bent at a relatively small angle (eg, 16 degrees), this method is not used here for simplicity; and the z-axis represents the direction of movement of ions into and out of the device. Average (mean).

因此,該Z軸是該離子射束的近似平均預定的移動方向;及該Y軸是該射束的窄厚度尺度的平均方向;及該X軸是該射束的幅寬尺度的方向。因此,該直角座標系統的空間及方向被固定。 Thus, the Z axis is an approximately average predetermined moving direction of the ion beam; and the Y axis is the average direction of the narrow thickness dimension of the beam; and the X axis is the direction of the beam width dimension of the beam. Therefore, the space and direction of the right angle coordinate system are fixed.

該操作系統的直角座標系統 Right angle coordinate system of the operating system

該離子源以相對於Z軸成約5至15度的小角度發射該離子射束,其在正Y軸方向上具備一運動分量。然而,其意圖係在於,在該射束橫越該設備之後,該射束將在Y方向上有一相反的運動分量;因此,該Z軸方向是離子進入及離開該C型軛線圈組件結構附近的方向的平均值。 The ion source emits the ion beam at a small angle of about 5 to 15 degrees with respect to the Z axis, which has a motion component in the positive Y-axis direction. However, the intention is that after the beam traverses the device, the beam will have an opposite component of motion in the Y direction; therefore, the Z-axis direction is where ions enter and exit the C-yoke coil assembly structure. The average of the directions.

該射束的主要直線橫越尺度是其固定的幅寬尺度,其尺寸量值(magnitude)可被任意地選定,從小於100mm到大於3000mm;且此幅寬尺度永遠和該X軸平行。 The main linear traverse dimension of the beam is its fixed width dimension, and its magnitude can be arbitrarily selected from less than 100 mm to more than 3000 mm; and this width dimension is always parallel to the X axis.

相對地,該射束的次要橫越尺度是其厚度尺度,當該離子射束發散時其尺寸的量值典型地變動於約3mm至30mm或更大,且將大致和該Y軸對齊。然而,若該離子射束在橫越該質量分析器設備的同時被偏斜於負的Y軸方向上約16°的話,則該Y軸被任意地選取(如圖中所示),該射束的Y軸長度是它的實際厚度除以該射束的移動方向和該Z軸之間的角度的餘弦。 In contrast, the minor traverse dimension of the beam is its thickness dimension, and the magnitude of its size typically varies from about 3 mm to 30 mm or more when the ion beam diverges, and will generally align with the Y axis. However, if the ion beam is deflected by about 16° in the negative Y-axis direction while traversing the mass analyzer device, the Y-axis is arbitrarily selected (as shown in the figure), the shot The Y-axis length of the beam is its actual thickness divided by the cosine of the direction of movement of the beam and the angle between the Z-axis.

在每一種例子中,被預計的且被期待的是,該移動的帶狀射束將包含至少一種(且有時候是數種)想要的離子種類,以及一或多種不想要的離子種類雜質。當該帶狀射束由其離子源被擷取時,該帶狀射束具有一典型的2至5mm的厚度尺度,但在此次要尺度上發散±2°(但此數值取決於和對準及建構問題相關之離子物理學及熱膨脹這兩者有關的許多因素)。用於該射束的主要幅寬尺度的大小的範圍可從約80mm至大於3000mm。該等直角座標如所需地於下文中被更確地描述。 In each of the examples, it is contemplated and contemplated that the moving ribbon beam will contain at least one (and sometimes several) of the desired ion species, as well as one or more unwanted ion species impurities. . When the strip beam is extracted by its ion source, the strip beam has a typical thickness scale of 2 to 5 mm, but diverges by ±2° on this scale (but this value depends on and Many factors related to the construction of ion physics and thermal expansion related to the problem). The size of the primary width dimension for the beam can range from about 80 mm to greater than 3000 mm. These right angle coordinates are more precisely described below as desired.

該軛線圈組件的構造 Construction of the yoke coil assembly

在此示範性直角座標系統內,本發明的質量分析器設備被有目的性地使用。在此情況中,本發明如一 分開的軛線圈般地呈現,其包含兩個主要的構件:一隧道形軛;及至少一被設置於其上之被橫向地安裝的電磁線圈。本發明整體的一立體圖被例示於圖5b中。 Within this exemplary right angle coordinate system, the mass analyzer apparatus of the present invention is purposefully used. In this case, the present invention is as follows A separate yoke coil is presented that includes two main components: a tunnel yoke; and at least one laterally mounted electromagnetic coil disposed thereon. A perspective view of the entirety of the present invention is illustrated in Figure 5b.

如圖5所示,該隧道形軛典型地看起來像是一個三部件對稱式支撐結構。如圖中所見,該隧道形軛:(α)具有C型截面,其圍繞大於180度且典型地190度至210度,且其環繞在一隧道形凹穴的三個側邊上,及其在一直線上均一地延伸至其兩個分開的端部的每一端部,(β)具有兩個作為隧道側面之可識別的實心壁臂件及一實心的中心橋接段,(γ)提供兩個分開的臂件面表面,其具備有一範圍在約150至175度之間的夾角,及(δ)是用至少一磁性金屬材料或金屬合金材料製造。 As shown in Figure 5, the tunnel yoke typically looks like a three-part symmetrical support structure. As seen in the figure, the tunnel yoke: (α) has a C-shaped cross section that surrounds more than 180 degrees and typically 190 degrees to 210 degrees, and which surrounds three sides of a tunnel-shaped recess, and Uniformly extending in a straight line to each of its two separate ends, (β) has two identifiable solid wall arms as a tunnel side and a solid central bridge, (γ) providing two The separate arm face surfaces are provided with an included angle ranging from about 150 to 175 degrees, and (δ) is made of at least one magnetic metal material or metal alloy material.

典型地,該隧道形軛係用鐵或低碳鋼或其它(更昂貴的)磁性材料加工製造或鑄造而成。它可被製造成單件式;或由兩個臂件7a及7b及一中心連接橋段1組裝而成。個別的臂件7a終止於面表面13;且分開的臂件7b在面表面15處終止。 Typically, the tunnel yoke is fabricated or cast from iron or mild steel or other (more expensive) magnetic materials. It can be manufactured in a single piece; or it can be assembled from two arm members 7a and 7b and a central connecting bridge 1. The individual arm members 7a terminate in a face surface 13; and the separate arm members 7b terminate at the face surface 15.

相較地,該電磁線圈2是一由導電體製成之跑道型迴圈繞組;且變成該隧道型軛結構的一部分,其為該線圈佔據該隧道凹穴的部分,如圖5a及5b所示。該線圈2典型地包含兩個被纏繞的導電體的平行直線長度區段 52a及52b,每一直線長度區段的直線長度大於該移動的帶狀射束的幅寬尺度的直線長度,一個區段(52b)佔據該軛的該隧道凹穴的至少一部分;且亦同時具有兩個彎曲的端部,每一彎曲的端部彎折180度且和該等直線長度區段52a及52b無縫地銜接成一被稱為‘長圓形(obround)’的形狀。 In contrast, the electromagnetic coil 2 is a racetrack-type loop winding made of an electrical conductor; and becomes part of the tunnel-type yoke structure, which is a portion of the coil that occupies the tunnel pocket, as shown in FIGS. 5a and 5b. Show. The coil 2 typically comprises parallel straight length sections of two wound electrical conductors 52a and 52b, the linear length of each linear length section being greater than the linear length of the width of the moving strip beam, a section (52b) occupying at least a portion of the tunnel pocket of the yoke; Two curved ends, each curved end is bent 180 degrees and seamlessly engages the linear length sections 52a and 52b into a shape known as an 'obround'.

雖然一個可辨識(discernible)線圈在功能上即足夠,但兩個截面較小的電磁線圈2a及2b可被取代,如圖8所示,該兩個線圈的每一線圈分別圍繞該隧道形軛的兩個側臂的一個側臂,且每一線圈的一直線長度區段係位在該軛隧道凹穴內。這兩種線圈配置已被發現,用來減少產生在非生產性區域內的磁場;但它並不影響該軛線圈組件的基本作用原理。 Although a discernible coil is functionally sufficient, the two smaller-sized electromagnetic coils 2a and 2b may be replaced, as shown in FIG. 8, each coil of the two coils respectively surrounding the tunnel-shaped yoke. One of the side arms of the two side arms, and the straight length section of each coil is seated within the yoke tunnel pocket. These two coil configurations have been discovered to reduce the magnetic field generated in the non-productive region; however, it does not affect the basic principle of operation of the yoke coil assembly.

電流係由任何傳統的且可控制的來源經由該電磁線圈或諸電磁線圈隨選地被通過,一直角地延伸的磁場藉此被產生,其不只包圍該電流載負導體材料;而且亦被該弧形軛結構的鐵磁材料塑形,用以變成在靠近該兩個外露的壁面表面13及15的分開的端部處聚集,藉此,根據該電流的流向,一個臂端面表面變成‘北’極及另一臂端面表面作為‘南’極。一高強度磁場被該電磁線圈產生在這兩個臂敦面表面13及15之間,該電磁線圈將該射束偏斜於下面描述的一複雜的三維度路徑中。 The current is selectively passed through the electromagnetic coil or the electromagnetic coils from any conventional and controllable source, and a magnetic field extending at an angle is thereby generated, which not only surrounds the current carrying conductor material; The ferromagnetic material of the yoke structure is shaped to become gathered at the separated ends near the two exposed wall surfaces 13 and 15, whereby the surface of one arm end becomes 'North' according to the flow direction of the current The surface of the pole and the other arm end serves as the 'South' pole. A high intensity magnetic field is created by the electromagnetic coil between the two arm face surfaces 13 and 15, which deflects the beam in a complex three dimensional path as described below.

該組件在一鄰接的移動的離子射束的整個幅寬尺度之上且 橫跨該幅寬尺度的定位 The assembly is over the entire width dimension of an adjacent moving ion beam and Positioning across the width of the width

在每一使用的例子中,該C型軛線圈組件將被橫貫地設置作為一磁性分析器單元,其空間地通過一被鄰近地設置的移動的子射束的整個幅寬尺度之上且完全地橫跨該幅寬尺度。 In each used example, the C-yoke coil assembly will be traversed as a magnetic analyzer unit that spatially passes over and over the entire width dimension of a moving sub-beam that is disposed adjacently The ground spans the width of the width.

如圖6a及6b所示,該鄰接的射束係一開始被偏斜於負的X軸方向上;然後在相反方向上被偏斜回來成為一S曲線,所以在X方向上的淨速度回到零。然而,其結果為,該射束的移動路徑變成在X方向上顯著地偏離,在此例子中偏離約200mm。 As shown in Figures 6a and 6b, the adjacent beam system is initially deflected in the negative X-axis direction; then deflected back in the opposite direction to become an S-curve, so the net velocity in the X-direction is back. To zero. However, as a result, the moving path of the beam becomes significantly deviated in the X direction, which is about 200 mm in this example.

因此,該C型軛線圈組件的X軸長度必須是該射束的整個固定的幅寬尺度;加上該偏離的約200mm;加上大方的額外數量以確保該磁場到射束邊緣都是均勻的且沒有被磁場邊緣的存在扭曲。 Therefore, the X-axis length of the C-yoke coil assembly must be the entire fixed width dimension of the beam; plus about 200 mm of the offset; plus a generous extra amount to ensure that the magnetic field is uniform to the beam edge It is not distorted by the presence of the edge of the magnetic field.

為了要達到此目的,該C型軛線圈組件10將被橫貫地設置跨越該鄰接的離子射束的移動路徑,然後以很小的Y運動分量運動於Z方向上;且透過此橫向的設置,該軛線圈組件的該等被適當地預選的尺度將完全地橋接並跨越該鄰接的移動的離子射束的整個幅寬尺度,包括該S型偏斜的作用所造成的偏離距離在內。 In order to achieve this, the C-yoke coil assembly 10 will be traversed across the path of movement of the adjacent ion beam and then moved in the Z direction with a small Y motion component; and through this lateral arrangement, The appropriately preselected dimensions of the yoke coil assembly will completely bridge and span the entire width dimension of the adjacent moving ion beam, including the offset distance caused by the action of the S-type deflection.

此計畫中的跨越設置及空間鄰接的橫向放置分別被明確地例示在圖6a,6b,6c及8中。詳言之,圖6a及6b顯示本發明的該軛線圈組件在該鄰接的離子射束運動於Z軸方向上時被橫貫地設置在整個射束幅寬尺度之 上並跨越它的情況;及圖6c及8例示被設置在此橋接位置的該C型軛線圈組件將該鄰接的移動的離子射束的彈道偏斜的操作能力。 The spanning settings and spatially adjacent lateral placements in this plan are explicitly illustrated in Figures 6a, 6b, 6c and 8, respectively. In particular, Figures 6a and 6b show that the yoke coil assembly of the present invention is traversed across the entire beam width dimension as the adjacent ion beam moves in the Z-axis direction. And the case of crossing it; and Figures 6c and 8 illustrate the ability of the C-yoke coil assembly disposed at the bridging position to deflect the ballistics of the adjacent moving ion beam.

圖7是一非常寬的帶狀射束的一組不同的立體圖,其顯示當它被該C型軛線圈組件偏斜及聚焦時的形狀。這些圖係用來顯示該射束的路徑的複雜的三維度形狀。這些圖係根據使用Cobham公司販售的電腦程式TOSCA計算結果而產生的。 Figure 7 is a set of different perspective views of a very wide strip beam showing the shape as it is deflected and focused by the C-yoke coil assembly. These figures are used to show the complex three-dimensional shape of the path of the beam. These drawings were generated based on the results of the computer program TOSCA sold by Cobham.

瞭解圖6的該單一纏繞的線圈或清楚地示於圖8中的多個纏繞的線圈環繞該隧道形軛的鐵磁材料;且幾乎填滿其拱形結構內被環繞的中心空間是很重要的。該單一或多個電磁線圈沒有在任何操作環境中,即使是包圍或環繞該移動的離子射束。 It is important to understand the single wound coil of Figure 6 or the plurality of wound coils clearly shown in Figure 8 surrounding the ferromagnetic material of the tunnel yoke; and it is important to almost fill the central space surrounded by its arched structure. of. The single or multiple electromagnetic coils are not in any operating environment, even if they are surrounded or surrounded by the moving ion beam.

亦將被瞭解的是,該隧道形軛及電磁線圈可被設置在周圍空氣大氣中。因此,在圖6及11所示的實施例中,只有帶有該‘北’極及該‘南’極的兩個臂件面表面須要被外露於真空環境中;且藉由插入薄的真空壁來將該隧道形軛整個保持在該真空環境外面亦是完全可能的。 It will also be appreciated that the tunnel yoke and solenoid can be placed in the ambient air atmosphere. Therefore, in the embodiment shown in Figures 6 and 11, only the surface of the two arm members with the 'North' pole and the 'South' pole must be exposed to a vacuum environment; and by inserting a thin vacuum It is also entirely possible that the wall keeps the entire tunnel yoke outside of the vacuum environment.

亦應指出的是,該電磁線圈只被設置在該鄰接的移動的離子射束的一側邊上(參見圖6及11)。沒有磁場分量沿該離子射束的主要幅寬被施加。這是完全獨一無二的且和此領域中所有其它傳統上已知的設備不同。 It should also be noted that the solenoid is only placed on one side of the adjacent moving ion beam (see Figures 6 and 11). No magnetic field component is applied along the main width of the ion beam. This is completely unique and different from all other conventionally known devices in the field.

一鄰接的移動的離子射束的偏斜 Skew of an adjacent moving ion beam

在此技術領域中工作的從事人員必須適當地瞭解且認知的是,C型軛線圈組件產生在一被並列的離子射束將通過的該鄰接的空間區域中的磁場的詳細形狀是什麼形狀。 Those skilled in the art to work properly understand and recognize that the C-yoke coil assembly produces a shape of the detailed shape of the magnetic field in the contiguous spatial region through which the parallel ion beam will pass.

先參考圖5a的例示,該鄰接的移動的離子射束將首先緊鄰該隧道形軛的臂件面表面13通過;然後通過一中心的中間空間區域;然後將緊鄰臂件面表面15通過;然後繼續離開該裝置。將在此處被回想的是,一磁場可將一離子偏斜於一和該磁場及該離子的移動方向成直角的方向上,但此一被強加的靜態磁場既不能將該離子加速也不能將其減速。 Referring first to the illustration of Figure 5a, the adjacent moving ion beam will first pass adjacent the arm face surface 13 of the tunnel yoke; then through a central intermediate space region; then will pass immediately adjacent the arm face surface 15; Continue to leave the device. It will be recalled here that a magnetic field can deflect an ion in a direction perpendicular to the direction of movement of the magnetic field and the ion, but the imposed static magnetic field neither accelerates the ion nor Slow it down.

現參考圖6c及9a的例示,在該臂件面表面13前方的空間區域係用一被標示為113的矩形框來表示。此空間區域113大致描繪出該磁場的方向橫向地貫穿該射束彈道的方向;該磁場被定向為和該臂件磁極表面成直角;及該磁場延伸於負的Y軸方向上(但傾斜了約8°)。該等磁場線被彎曲;所以此事件及結果雖然是近似但能保有實質的精確性。 Referring now to the illustration of Figures 6c and 9a, the spatial region in front of the arm face surface 13 is indicated by a rectangular frame designated 113. This spatial region 113 generally depicts the direction of the magnetic field transversely through the beam trajectory; the magnetic field is oriented at right angles to the surface of the arm pole; and the magnetic field extends in the negative Y-axis direction (but tilted) About 8°). The magnetic field lines are curved; therefore, the events and results are approximate but retain substantial accuracy.

接下來,該鄰接的移動的射束的彈道力徑移動進入到該中心的中間空間區域內,圖9a中的矩形112所標示。在此中心的中間空間區域112內,該磁場係實質地(且平均地)和該Z軸對齊。 Next, the ballistic force path of the adjacent moving beam moves into the intermediate space region of the center, as indicated by the rectangle 112 in Figure 9a. Within the intermediate space region 112 of this center, the magnetic field is substantially (and evenly) aligned with the Z axis.

最後,在該臂件磁極表面15旁的第三空間區 域115中,該磁場被實質地定向於正的Y軸方向上,其和該磁極表面垂直;且被傾斜8°於和該空間區域113相反的方向上。 Finally, a third spatial region beside the pole surface 15 of the arm member In domain 115, the magnetic field is substantially oriented in the positive Y-axis direction, which is perpendicular to the pole surface; and is inclined 8° in the opposite direction to the spatial region 113.

在瞭解了該鄰接的移動的射束的上述一連串的偏斜及路徑方向的改變之後,此技藝的從事人員現在必須考量對於個別的離子彈道的影響。 After understanding the above-described series of skews and changes in path direction of the adjacent moving beam, practitioners of the art must now consider the effects on individual ion trajectories.

一在該鄰接的射束內移動的離子通常係運動於Z軸方向上,但具有一在Y軸方向上傾斜一角度β1=8度的移動路徑。因此,如圖5a及6中所示(其顯示不同的視圖(且有時候顯示一完整的帶狀射束)),該離子然後進入空間場區域113中。 An ion moving in the adjacent beam generally moves in the Z-axis direction but has a moving path inclined by an angle β 1 = 8 degrees in the Y-axis direction. Thus, as shown in Figures 5a and 6 (which show different views (and sometimes a complete band beam)), the ions then enter the spatial field region 113.

在此空間區域113中,該離子平均地直角地移動至該磁場;溫此,該離子被偏斜遠離,進入圖5a的紙張,遠離圖5a的觀看者;但此方式及離子偏斜的方向無法在圖5a的圖式中被看到。然而,此離子偏斜的方向可在圖6b中清楚看到,空間區域113在圖6b中被標示出來;且磁場強度被調整,使得在該空間區域113中,該離子在負的X軸方向上被偏斜一介於約25度至45度之間的角度;且在此被例示的例子中被偏斜約30度。 In this spatial region 113, the ions move evenly at right angles to the magnetic field; at this point, the ions are deflected away, entering the paper of Figure 5a, away from the viewer of Figure 5a; but in this manner and the direction of ion deflection Cannot be seen in the schema of Figure 5a. However, the direction of this ion deflection can be clearly seen in Figure 6b, the spatial region 113 is indicated in Figure 6b; and the magnetic field strength is adjusted such that in the spatial region 113, the ions are in the negative X-axis direction The upper one is skewed by an angle between about 25 and 45 degrees; and is skewed by about 30 degrees in the illustrated example.

該等離子快速地離開此空間區域113;然後進入該中心的中間空間區域112內,在該區域內該磁場被對準於Z軸方向上。如過該等離子係均勻地移動且移動於Z軸方向上的平面路徑中的話,則它們在此空間區域113內將會是未被偏斜的。然而,該等離子事實上係以一傾斜的 角度移動於該空間區域113內;速度之被X軸地向的分量因而是原始的離子速度乘上-sin30°。換言之,在空間區域113內,初始速度的一半現被定向於負的X軸方向上。 The plasma quickly exits the spatial region 113; then enters the central intermediate space region 112 where the magnetic field is aligned in the Z-axis direction. If the plasma system moves evenly and moves in a planar path in the Z-axis direction, then they will be unbiased within this spatial region 113. However, the plasma is actually tilted The angle moves within the spatial region 113; the component of the velocity that is X-axis oriented is thus the original ion velocity multiplied by -sin 30°. In other words, in the spatial region 113, half of the initial velocity is now oriented in the negative X-axis direction.

此速度的分量係和該被Z軸地定向的磁賞成直角,且造成在負的Y軸方向上的偏斜。再次地,在空間區域113內的此偏斜在圖6b中看不到,因為離子偏斜的動作係被定向於遠離觀看者的方向;但此偏斜在圖6c中則非常清楚。偏斜的程度取決於許多因素,包括該軛的實際形狀及在線圈內的電流在內的因素。 The component of this velocity is at right angles to the Z-axis oriented magnetic field and causes a skew in the negative Y-axis direction. Again, this deflection in the spatial region 113 is not visible in Figure 6b because the ion skewing action is directed away from the viewer; however, this skew is very clear in Figure 6c. The degree of skew depends on many factors, including the actual shape of the yoke and the current in the coil.

該運動中的離子然後前進至空間區域115中,在該空間區域內B磁場和它的運動成直角;且B磁場被定向為朝向面15;且大致延伸於制的Y軸方向上。將被指出及瞭解的是,此空間區域115是空間區域113的逆操作(operational inverse)。在空間區域115中,離子被偏斜於相反方向上30度,直到它們沒有X軸運動分量為止;且該等離子係以相對於負的Y軸方向傾斜8度的方式移動於Z軸方向上。 The ions in this motion then proceed into a spatial region 115 in which the B magnetic field is at right angles to its motion; and the B magnetic field is oriented toward the face 15; and extends generally in the Y-axis direction of the system. It will be noted and appreciated that this spatial region 115 is the operational inverse of the spatial region 113. In the spatial region 115, the ions are deflected by 30 degrees in the opposite direction until they have no X-axis motion component; and the plasma is moved in the Z-axis direction by being inclined by 8 degrees with respect to the negative Y-axis direction.

此種離子S偏斜運動實際上是三維度的,因此通常是很難例示及視覺化。因此,圖7顯示一用於幅寬超過2200mm的例子之樣本離子束的許多投影立體圖。過渡於三個各別的空間區域之間的該“S”型偏斜並不突兀,而是非常平順且無縫地變化於彼此之間。因此,上述的描述提供平均離子偏斜的一精確且適當的說明,以及它們為何會發生的一正確的解釋。 This ion S skew motion is actually three-dimensional, so it is often difficult to instantiate and visualize. Thus, Figure 7 shows a number of projection perspective views of a sample ion beam for an example having a width of more than 2200 mm. This "S"-type deflection between transitions between three separate spatial regions is not abrupt, but varies very smoothly and seamlessly between each other. Thus, the above description provides an accurate and appropriate description of the average ion deflection and a correct explanation of why they occur.

因此,總之,對於離子彈道的總體的偏斜影響及結果為: Therefore, in summary, the overall skew effect on the ion ballistics and the results are:

(1)該離子彈道一開始被偏離於負的X軸方向一段距離,其在此特定的例子中為約200mm; (1) the ion trajectory is initially offset by a distance in the negative X-axis direction, which is about 200 mm in this particular example;

(2)該離子彈道後續在負的Y軸方向被偏斜一角度,其在次特定的例子中為16度; (2) the ion trajectory is subsequently deflected by an angle in the negative Y-axis direction, which is 16 degrees in a second specific example;

(3)如果機械性對稱實際上被良好地保留且磁場強度被調整使得y方向偏斜在中間平面亦對稱(即,角度β1=角度β2)的話,則在X軸方向上將會是零偏斜(但將會有一偏離),且這是打算中的操作條件; (3) If the mechanical symmetry is actually well preserved and the magnetic field strength is adjusted such that the y-direction skew is also symmetrical in the intermediate plane (ie, angle β 1 = angle β 2 ), then it will be in the X-axis direction. Zero skew (but there will be a deviation), and this is the intended operating condition;

(4)如果該彈道在該Y-Z平面中的初始角度從8度增加至10度的話,則所經歷的該Y軸偏斜量將會較大,因為當該離子更接近該軛(尤其是在該空間區域112內)通過時,該磁場會較長。因此如果該角度從8度減小至6度的話,則在Y軸方向上的偏斜量將會較小。此效果影響將在該Y軸方向上被聚焦的射束;且一開始發散的射束係在Y軸方向上收斂地離開區域115,如圖6c中清楚所見。 (4) If the initial angle of the ballistic in the YZ plane is increased from 8 degrees to 10 degrees, then the amount of Y-axis skew experienced will be greater because the ions are closer to the yoke (especially When the space region 112 passes, the magnetic field will be longer. Therefore, if the angle is reduced from 8 degrees to 6 degrees, the amount of skew in the Y-axis direction will be small. This effect affects the beam that will be focused in the Y-axis direction; and the beam that initially diverges converges away from the region 115 in the Y-axis direction, as best seen in Figure 6c.

(5)而且,該離子所經歷之該X軸方向的偏離在此角度被改變時會稍微不同(如圖6b及6c中所見,其顯示一大的離子彈道陣列的相同的計算的不同圖式)。因此,如果該離子射束是一長的帶狀射束的話,此影響實際上並不是一重要的考量,因為一個2000mm長的射束中的10mm的寬度變大是一很小的比例的增加。 (5) Moreover, the deviation of the X-axis direction experienced by the ion is slightly different when the angle is changed (as seen in Figures 6b and 6c, which shows the same calculated different pattern of a large ion ballistic array) ). Therefore, if the ion beam is a long strip beam, this effect is actually not an important consideration, since a 10 mm width in a 2000 mm long beam becomes a small percentage increase. .

(6)此外,對於所有被用來聚焦該等離子射束的磁性裝置而言,該偏斜影響和該磁場及離子電荷成正比;且和質量與能量的乘積的平方根成反比。 (6) Furthermore, for all magnetic devices used to focus the plasma beam, the skew effect is proportional to the magnetic field and ion charge; and inversely proportional to the square root of the product of mass and energy.

(7)但應指出的是,該三維度偏斜現導致一顯著之預料之外的好處(virtue),其係如下所述:在空間區域113內的該最初的偏斜遵循前述的規則,這表示一不想要的離子(其比想要的離子重10%)將被偏斜比30度少5%,即偏斜28.5度。然而,此離子現將在X軸方向上具有一較小的速度分量,因為它橫越該中心的中間空間區域112。 (7) It should be noted, however, that the three-dimensional skew now results in a significant unexpected benefit, as follows: the initial skew in the spatial region 113 follows the aforementioned rules, This means that an unwanted ion (which is 10% heavier than the desired ion) will be skewed by 5% less than 30 degrees, ie, 28.5 degrees of deflection. However, this ion will now have a smaller velocity component in the X-axis direction as it traverses the central intermediate space region 112.

因此,該離子被偏斜一較小的角度,因為它橫越該中心的中間空間區域112;但是減小的量約為5%,因為質量增加;加上因為在X方向上速度減小的5%,導致在角度上淨10%的減小,這表示該離子在負的Y軸方向上被偏斜16-1.6=14.4度。從該C型軛線圈組件的中心對稱平面到該射束內的焦點的距離在此例子中是500mm;且該1.6度的角度改變代表的是該不想要的離子被移位14mm。以該質量分析器的行話來說,該系統的質量分散是14/10%=140mm。 Therefore, the ion is deflected by a small angle because it traverses the central intermediate space region 112; however, the amount of reduction is about 5% because the mass is increased; plus because the velocity is reduced in the X direction 5% results in a net 10% reduction in angle, which means that the ion is skewed 16-1.6 = 14.4 degrees in the negative Y-axis direction. The distance from the central symmetry plane of the C-yoke coil assembly to the focus within the beam is 500 mm in this example; and the 1.6 degree angle change represents that the unwanted ions are displaced by 14 mm. In the jargon of the mass analyzer, the mass dispersion of the system is 14/10% = 140 mm.

再者,因為來自一實際的離子源的該射束的有限尺寸(finite size)和聚焦的不完美性的組合的關係,該射束焦點的寬度實際上是約4mm。 Moreover, because of the combination of the finite size of the beam from an actual ion source and the imperfection of focus, the beam focus is actually about 4 mm wide.

吾人可使用此特定的工作例來預估此裝置的分辨能力將會是140/4=35M/△M FWHM,如之前所界定 的。這表示在圖6c中的該對擋板6a及6b如果被放置成剛好和該所想要的射束正切的話,則將提供一接近35的分辨能力。此數值對於總長度只有1公尺、只偏斜16度、及處理這麼大尺度的零子射束的裝置而言是預料之外的高。 We can use this particular working example to estimate that the resolution of this device will be 140/4=35M/ΔM FWHM, as previously defined of. This means that the pair of baffles 6a and 6b in Figure 6c will provide a resolving power of approximately 35 if placed just to be tangent to the desired beam. This value is unexpectedly high for devices with a total length of only 1 meter, a skew of only 16 degrees, and the processing of such large scale zero beam.

該被橫貫地安裝的電磁線圈的功率消耗 Power consumption of the traversely mounted electromagnetic coil

一用來分析一離子射束的磁鐵的線圈所消耗的功率(其同時亦視設計細節而定)可被籠統地一般化為:和離子的磁剛性乘以該線圈磁鐵的磁極間隙(介於兩個臂件面表面之間的有效距離)的平方、乘上該磁鐵的寬度、然後乘上通過該磁鐵的路徑長度的乘積成正比。它和線圈的剖面的平方成反比。在被橫貫地安裝在該軛弓上的鐵磁繞組線圈的大小及重量和電量及所需的冷卻之間有一折衷(trade-off)。 The power consumed by a coil of a magnet used to analyze an ion beam (which is also dependent on design details) can be generalized in general terms: the magnetic rigidity of the ion multiplied by the magnetic pole gap of the coil magnet (between The square of the effective distance between the faces of the two arms is multiplied by the width of the magnet and then multiplied by the length of the path through the magnet. It is inversely proportional to the square of the profile of the coil. There is a trade-off between the size and weight of the ferromagnetic winding coil that is traversed on the yoke bow and the required cooling.

在本發明中,該有效的磁極間隙距離和2至3倍的該帶狀離子射束的厚度成正比。此被計算出來的數值比該射束的該固定的幅寬尺度小許多;因此從業人員可如下所述地預估目前的設計的省電好處。如果以A標示的‘深寬比’一詞被用來描述該離子射束的幅寬對厚度的比率的話,則和傳統的雙極磁鐵相較,依據本發明的磁鐵其在所需要的電力上的減少是一3/A2的係數。 In the present invention, the effective magnetic pole gap distance is proportional to the thickness of the ribbon ion beam of 2 to 3 times. This calculated value is much smaller than the fixed width dimension of the beam; therefore, the practitioner can estimate the power saving benefits of the current design as described below. If the term 'aspect ratio' denoted by A is used to describe the ratio of the width to thickness of the ion beam, the magnet according to the invention has the required power compared to a conventional bipolar magnet. The reduction on is a factor of 3/A 2 .

為此目的,該從業人員必須使用在該中置大致中心處的深寬比,該射束的厚度尺度在該處是最大的; 且該處的射束發散會將該射束可測得的厚度升高至約35至40mm的大小,一重大的安全餘裕被需要。因此,對於一2公尺幅寬x50mm厚度的射束而言,該深寬比是40。再者,和能夠分析此一寬的離子射束之傳統的磁鐵相較,本發明須要一較小的路徑長度,典型地約為1/3的路徑長度。 For this purpose, the practitioner must use an aspect ratio at the approximate center of the center where the thickness dimension of the beam is greatest; And the beam divergence there will raise the measurable thickness of the beam to a size of about 35 to 40 mm, a significant safety margin is needed. Thus, for a beam of 2 meters width x 50 mm thickness, the aspect ratio is 40. Moreover, the present invention requires a smaller path length, typically about 1/3 of the path length, as compared to conventional magnets capable of analyzing this wide ion beam.

因此,對於一具備40的深寬比的帶狀射束而言,本發明須要傳統磁鐵的電力的1/500,假設線圈所用的兩個磁鐵具有相同的截面積。實際上,一小很多的線圈可被使用,且在製造成本和功率消耗之間可找到平衡。 Therefore, for a ribbon beam having an aspect ratio of 40, the present invention requires 1/500 of the power of a conventional magnet, assuming that the two magnets used in the coil have the same cross-sectional area. In fact, a much smaller number of coils can be used and a balance can be found between manufacturing cost and power consumption.

使用輔助的鐵棒來改變效能 Use an auxiliary iron rod to change performance

在圖9b中(其應和圖9a相比較),三個額外的鐵或低碳鋼棒3a,3b及4被設置在它們可改變該磁場但不會阻礙該離子射束通過的地方。這些分開的棒3a,3b及4具有均一的稜形剖面;且具有和該C型軛線圈組件相同的X軸長度。它們亦被定向及和X軸對準。 In Figure 9b (which should be compared to Figure 9a), three additional iron or low carbon steel bars 3a, 3b and 4 are placed where they can change the magnetic field but do not obstruct the passage of the ion beam. These separate bars 3a, 3b and 4 have a uniform prismatic profile; and have the same X-axis length as the C-yoke coil assembly. They are also oriented and aligned with the X axis.

將被指出的是,棒3a提供一在該射束和該C型軛的面13相反的一側上的面;而棒3b則提供一在該射束和該C型軛的面15相反的一側上的面。棒4被設置在兩個分開的棒3a和3b之間;且該等棒的形狀係呈現彼此平行或幾近平行的面。介於三個棒3a,3b及4之間的間隙較佳地是一致的且在該C型軛線圈組件的相反端通常將具有完全相同的數值。 It will be noted that the rod 3a provides a face on the opposite side of the beam from the face 13 of the C-yoke; and the bar 3b provides a face opposite the face 15 of the C-yoke. The face on one side. The rod 4 is disposed between two separate rods 3a and 3b; and the shapes of the rods are in parallel or nearly parallel to each other. The gap between the three bars 3a, 3b and 4 is preferably uniform and will generally have exactly the same value at the opposite end of the C-yoke coil assembly.

這些分開的棒的一舉三得的角色 The role of these separate sticks in one fell swoop

它們第一個重要的角色是在空間區域113及115中的磁場相對於在該中心的中間空間區域112內的磁場係被增加,因為介於臂件面表面13和15(其為磁通量橋)之間的空氣間隙被大幅地減小,其被可磁化的鐵物質取代。此結果增加了因為一給定的Y軸方向上的偏斜而發生之被X軸定向的射束偏移的量。對於一給定的在該Y軸方向上的偏斜而言,它亦減少對於在中心的中間空間區域112內的磁場的要求,因為該等棒的存在增加了施加在端部空間區域113內(且在端部空間區域115內的相反方向上被校正)的射束的X軸運動的量。 Their first important role is that the magnetic field in the spatial regions 113 and 115 is increased relative to the magnetic field in the intermediate intermediate region 112 of the center because of the arm face surfaces 13 and 15 (which are magnetic flux bridges). The air gap between them is greatly reduced, which is replaced by a magnetizable iron species. This result increases the amount of beam deflection that is oriented by the X-axis due to a given skew in the Y-axis direction. For a given skew in the Y-axis direction, it also reduces the need for a magnetic field in the central intermediate space region 112 because the presence of the bars increases the application to the end space region 113. The amount of X-axis motion of the beam (and corrected in the opposite direction within the end space region 115).

接在上述的第一個角色之後的它們的第二個重要的角色是:對於一給定的Y軸方向偏斜而言,其需要一較少數量的安培匝數的數目,節省電力及降低線圈大小的要求。 Their second important role after the first character above is that for a given Y-axis skew, it requires a smaller number of amps, saving power and reducing Coil size requirements.

它們的第三個重要的角色是該等輔助棒的形狀可被微調,用以改變聚焦特性,因為在該中心的中間空間區域112內被Z軸地定向的磁場隨著Y軸座標以精確的方式改變對於此焦點的強度及像差是很重要的。聚焦特性的此一微調可例如藉由使用3D有限元素非線性電腦程式(譬如,Cobham’s OPERA/TOSCA)來完成。 Their third important role is that the shape of the auxiliary bars can be fine-tuned to change the focusing characteristics because the Z-axis oriented magnetic field in the central intermediate space region 112 is accurately aligned with the Y-axis coordinates. The mode change is important for the intensity and aberration of this focus. This fine tuning of the focus characteristics can be accomplished, for example, by using a 3D finite element nonlinear computer program (e.g., Cobham's OPERA/TOSCA).

該組件的另一種結構格式 Another structural format of the component

一永久磁鐵或多個磁鐵可藉由更換該金屬結構的一部分而被導入到該C型軛線圈組件中作為使用一電磁繞組線圈於該組件中的另一種替代構造。此替代模式的一簡單版本是取消該電磁繞組線圈並用永久磁性材料(其沿著該隧道形軛的直線長度尺度被磁化)取代該軛結構的中心拱形區段。 A permanent magnet or a plurality of magnets can be introduced into the C-yoke coil assembly by replacing a portion of the metal structure as an alternative construction using an electromagnetic winding coil in the assembly. A simple version of this alternative mode is to cancel the electromagnetic winding coil and replace the central arcuate section of the yoke structure with a permanent magnetic material that is magnetized along the linear length dimension of the tunnel yoke.

關於前面描述的電磁繞組線圈格式,該永久磁性材料有兩種不同的磁極方位的可能,即一‘北’極,其後接著一‘南’極,或者是一‘南’極,其後接著一‘北’極。這兩個替代性的配置在操作上或性能上並沒有實質的差異;相反地,唯一的相對性差異是一種配置將該射束偏移於向下的方向上,而另一種磁極配置則偏斜於向上的方向上(參見圖6a及6b)。這兩種磁極配置將造成偏離被設定用於最佳的聚焦及解析度時的磁極一大約16度的偏斜。 With regard to the electromagnetic winding coil format described above, the permanent magnetic material has the possibility of two different magnetic pole orientations, namely a 'north' pole followed by a 'south' pole or a 'south' pole, followed by A 'north' pole. These two alternative configurations do not differ substantially in terms of operation or performance; conversely, the only relative difference is that one configuration shifts the beam in a downward direction, while the other magnetic pole configuration is biased. It is inclined in the upward direction (see Figures 6a and 6b). These two pole configurations will cause a deflection of approximately 16 degrees from the pole when set for optimal focus and resolution.

使用永久磁鐵是可能的,因為沿著被界定於圖式中的該射束的Z軸被整合的磁場是零,其讓ʃH.dl=0的要求被滿足。根據Busch的理論,這應表示沒有角動量被施加至該離子射束。 The use of a permanent magnet is possible because the magnetic field integrated along the Z-axis of the beam defined in the drawing is zero, which satisfies the requirement of ʃH.dl=0. According to Busch's theory, this should mean that no angular momentum is applied to the ion beam.

IV.替代性實施例的代表及示範性系列 IV. Representative and exemplary series of alternative embodiments

本發明可用一範圍的不同組件來準備且用各種不同的格式來建構。然而,將被明確地瞭解的是,這些 實施例的範圍很廣;這些實施例的種類很多樣;及這些實施例的細節只由下面描述的設備版本1-3來代表。 The invention can be prepared with a range of different components and constructed in a variety of different formats. However, what will be clearly understood is that these The scope of the embodiments is broad; the types of these embodiments are numerous; and the details of these embodiments are represented only by the device versions 1-3 described below.

設備版本1: Device version 1:

雖然任何種類的磁極都可被使用,但設備版本1的描述將一貫地依照且只使用一單一的交替磁極。 While any type of magnetic pole can be used, the description of device version 1 will consistently follow and use only a single alternating magnetic pole.

在圖5,6及9a所例示的本發明的設備版本1格式中,一C型軛線圈組件10被設置成鄰近該移動於Z方向上的離子射束。該軛線圈組件完全跨越該鄰接的離子射束的幅寬尺度;且當一電流通過該被橫貫地安裝的電磁繞組線圈時,該磁場的三個不同的且分開的體積區域被獨立地產生,該鄰接的離子射束串列地依序通過該等體積區域的每一區域。 In the device version 1 format of the present invention illustrated in Figures 5, 6 and 9a, a C-yoke coil assembly 10 is disposed adjacent to the ion beam moving in the Z direction. The yoke coil assembly completely spans the width dimension of the contiguous ion beam; and when a current is passed through the traversed electromagnetic winding coil, three different and separate volume regions of the magnetic field are independently generated, The contiguous ion beams sequentially pass through each of the regions of the equal volume region in series.

磁場的這三個不同的且分開的體積區域依序地從存在於該隧道形軛內的兩個分開的臂件的端尖處的‘北’極及‘南’極延伸出;且該磁場的這三個體積區域係彼此緊鄰,其透過一平順的過渡區讓分開的區域彼此相融合。 The three different and separate volume regions of the magnetic field sequentially extend from the 'North' and 'South' poles at the tip of the two separate arms present within the tunnel yoke; and the magnetic field The three volumetric regions are in close proximity to one another, which allows the separate regions to merge with each other through a smooth transition zone.

此外,依序地從該組件延伸出的磁場的每一分開的體積區域具有各自的特徵,如圖8a所示。因此,該端部體積磁性區域113被一磁場特徵化,該磁場空間地延伸於一和磁極面表面13成直角的方向上。 Furthermore, each separate volumetric region of the magnetic field that is sequentially extended from the assembly has its own characteristics, as shown in Figure 8a. Therefore, the end volume magnetic region 113 is characterized by a magnetic field that spatially extends in a direction at right angles to the pole face surface 13.

相較地,該第二中間的體積磁性區域112佔據介於磁極面表面13和磁極面表面15之間之位於中間的 空間;鄰近該被橫貫地安裝的線圈50的一外露的面;且提供一磁場,其實質垂直於該組件的對稱平面,和該Z方向對齊,如圖7中所示。 In contrast, the second intermediate volume magnetic region 112 occupies between the pole face surface 13 and the pole face surface 15 in the middle Space; adjacent to an exposed face of the traversely mounted coil 50; and providing a magnetic field substantially perpendicular to the plane of symmetry of the assembly aligned with the Z direction, as shown in FIG.

最後,該第三端部體積區域115是一實質地垂直於磁極面15但空間地延伸在和出現在磁極面13的磁場的方向相反方向上的磁場。在該第三體積區域115內的磁場線是連續的;且該等線從磁極面13空間地流至磁極面15,而且亦從兩個磁極面的邊緣流出。 Finally, the third end volume region 115 is a magnetic field that is substantially perpendicular to the pole face 15 but spatially extends in a direction opposite to the direction of the magnetic field appearing in the pole face 13. The magnetic field lines in the third volume region 115 are continuous; and the lines flow spatially from the pole face 13 to the pole face 15, and also from the edges of the two pole faces.

圖9a顯示在這三個不同的且分開的體積區域內的磁場分量。在該第二且位在中間的中間體積區域112中,該磁場的Z軸分量“Bz”很大,且在數值上大於Y軸磁場的量值,其在此區域112內通過零且到處都很小。相較地,應指出的是,在外面的兩個體積區域113及115中,相反的情況是真的,即磁場的Z軸分量的數值接近零,且事實上磁場在該射束的最初移動方向上的分量仍然是實質上較小。在該體積區域113內,該Y軸分量“By”被負向地導向且數值很大;而在體積區域115中,該Y軸分量“By”被正向地導向且數值很大。 Figure 9a shows the magnetic field components in these three different and separate volume regions. In the second intermediate intermediate volume region 112, the Z-axis component "Bz" of the magnetic field is large and numerically greater than the magnitude of the Y-axis magnetic field, which passes through zero in this region 112 and is everywhere Very small. In contrast, it should be noted that in the outer two volume regions 113 and 115, the opposite is true, that is, the value of the Z-axis component of the magnetic field is close to zero, and in fact the magnetic field is initially moved in the beam. The component in the direction is still substantially smaller. In the volume region 113, the Y-axis component "By" is negatively directed and has a large value; and in the volume region 115, the Y-axis component "By" is forwardly directed and has a large value.

如上所述且以此為基礎,藉由將擋止件放置成和所想要的射束路徑相鄰,在該移動的射束中的不想要的離子種類(污染物)可和被需要的或所想要的離子種類有效地分離。這在此設備版本1格式中特別重要,用以阻擋離該被橫貫地安裝的線圈太大的距離的離子路徑通過並支撐拱形軛框架。 As described above and based thereon, by placing the stopper adjacent to the desired beam path, unwanted ion species (contaminants) in the moving beam can be desired. Or the desired ion species are effectively separated. This is particularly important in this device version 1 format to block the ion path from the traversely mounted coils from passing and supporting the arch yoke frame.

設備版本2: Device version 2:

該組件的第二種格式模型版本分別被示於圖7及8b中;且包含該設備版本1格式的結構加上至少兩個被塑形的鐵磁棒3a及3b,且較佳地亦具備第三個棒4。 The second format model version of the component is shown in Figures 7 and 8b, respectively; and includes the structure of the device version 1 format plus at least two shaped ferromagnetic bars 3a and 3b, and preferably also The third stick 4.

該磁場被有效地以和該被外露的面表面成直角地終止於這些鐵磁棒上。這些鐵磁棒控制該磁場的形狀;且藉由佔據該磁路(magnetic circuit)的一部分,它們局部地降低該磁感應H的數值、它們升高在間隙內的磁場並改變它的形狀。以此方式,該等鐵磁棒3a,3b及4進一步節省電力且允許為了一特定的用途或應用定製精確的聚焦。 The magnetic field is effectively terminated at a right angle to the exposed surface of the ferromagnetic bar. These ferromagnetic bars control the shape of the magnetic field; and by occupying a portion of the magnetic circuit, they locally reduce the value of the magnetic induction H, they raise the magnetic field within the gap and change its shape. In this manner, the ferromagnetic bars 3a, 3b and 4 further save power and allow for precise focusing for a particular application or application.

如圖9b所示,在由鐵磁棒3a,3b及該C型線圈1所界定的該等端部體積區域113及115中,該等離子的X軸偏斜很強且相當均一。在該中間的體積區域112中,該等離子的Y軸偏斜將會因為來自端部空間區域113b內的較高的磁場的速度的X軸分量的增加而較大;但介於兩個鐵磁棒3a,3b之間的間隙距離具有如Y數值的函數般地改變磁場的z軸分量的空間變化的效果。因此,藉由改變鐵磁棒3a,3b的形狀及/或間距,在該中間體積區域112內的磁場的空間變化可被改變;且次空間變化接著改變被提供的Y軸聚焦的量。 As shown in Fig. 9b, in the end volume regions 113 and 115 defined by the ferromagnetic bars 3a, 3b and the C-shaped coil 1, the X-axis deflection of the plasma is strong and fairly uniform. In the intermediate volume region 112, the Y-axis deflection of the plasma will be greater due to an increase in the X-axis component from the velocity of the higher magnetic field in the end space region 113b; but between two ferromagnetic The gap distance between the rods 3a, 3b has the effect of changing the spatial variation of the z-axis component of the magnetic field as a function of the Y value. Thus, by varying the shape and/or spacing of the ferromagnetic bars 3a, 3b, the spatial variation of the magnetic field within the intermediate volume region 112 can be varied; and the sub-space changes then change the amount of Y-axis focus provided.

即使中間的Y軸偏斜角度幾乎不變,但介於兩個鐵磁棒3a,3b及棒4之間的間隙距離的調整(而且 也調整線圈電流,如果有需要的話)可改變聚焦的量。該中間的Y軸偏斜角度可藉由改變該組件的線圈內的電流來調整;且線圈內電流的此一改變亦可改變整個射束的X軸偏移量。 Even if the intermediate Y-axis skew angle is almost constant, the gap distance between the two ferromagnetic bars 3a, 3b and the rod 4 is adjusted (and The coil current is also adjusted, if necessary, to change the amount of focus. The intermediate Y-axis skew angle can be adjusted by changing the current in the coil of the assembly; and this change in current within the coil can also change the X-axis offset of the entire beam.

設備版本3: Device version 3:

該設備的第三種格式模形版本省掉該等鐵磁線圈且藉由用一永久磁鐵材料代替電磁繞組來取代該軛拱形橋接件內的部分鋼鐵結構。此改變及取代意謂的是,該裝置的磁剛性不再能夠被快速地調整。 A third formatted version of the apparatus dispenses with the ferromagnetic coils and replaces a portion of the steel structure within the yoke arch bridge by replacing the electromagnetic winding with a permanent magnet material. This change and substitution means that the magnetic rigidity of the device can no longer be adjusted quickly.

然而,一些藉由改變該等永久磁鐵材料構件的間距的調整在一很窄的範圍內是可能的。 However, some adjustments by varying the spacing of the permanent magnet material members are possible over a narrow range.

然而,對於大尺寸的離子射束而言,將一橫貫地安裝的電磁線圈充電的電力成本會很高;所以,如果有一種須要單一射束離子種類的應用的話,則該永久磁鐵格式版本會是非常有利的。 However, for large-sized ion beams, the cost of charging a traversely mounted electromagnetic coil can be high; therefore, if there is an application that requires a single beam ion species, then the permanent magnet format version will It is very beneficial.

V.三種示範性設備版本的總結性比較 V. Summary comparison of three exemplary device versions

關於本發明整體的應用及材料資訊的總結性回顧於下文中被提出。細節的一實質的質與量於此處被總結性地提供,用以讓本發明的真實優點可被適切地體認;且本發明所提供的真正的好處及益處可因為它們意味深長地提供此技術領域中工作的從業人員的東西而被瞭解。 A summary review of the overall application and material information of the present invention is set forth below. A substantial quality and quantity of the details are provided in summary herein to enable the true advantages of the present invention to be properly recognized; and the true benefits and benefits provided by the present invention may be It is understood by the practitioners working in this field of technology.

1.當考量本發明時,該Y軸偏斜能力及Y聚焦 特性係以下列方式被產生:因為在除了靠近該等電磁繞組線圈(或永久磁鐵)的彎曲端部之外的所有位置點,該被產生的磁場係完全地平行於Y-Z平面,所以這些磁場不可能對帶電離子粒子施加任何Y軸方向的偏斜,然後移動於Y-Z平面內的Z軸移動方向上。然而,即便是該輸入或上游射束內容物只包含平行或幾乎平行於該Y-Z平面地移動的帶電粒(當這些離子開始橫越該C型軛線圈組件所產生的磁場時),該磁場的Y軸分量將該等帶電粒子實質地偏斜於(正的或負的)X軸方向上。 1. When considering the present invention, the Y-axis skewing ability and Y focusing The characteristics are produced in such a way that these magnetic fields are not completely parallel to the YZ plane at all points except for the curved ends of the electromagnetic winding coils (or permanent magnets). It is possible to apply any Y-axis direction skew to the charged ion particles and then move in the Z-axis moving direction in the YZ plane. However, even if the input or upstream beam content contains only charged particles moving parallel or nearly parallel to the YZ plane (when these ions begin to traverse the magnetic field generated by the C-yoke coil assembly), the magnetic field The Y-axis component substantially deflects the charged particles in the (positive or negative) X-axis direction.

應指出的是,在一具備該磁場的Z軸方向分量的區域內的一離子運動的X軸方向的分量將會產生一Y軸方向的偏斜。因此,如果為了舉例,該等運動中的離子在X軸方向上被偏斜30°的話,則離子速度在此X軸方向上的分量是其總速度的一半。 It should be noted that a component in the X-axis direction of an ion motion in a region having a Z-axis direction component of the magnetic field will cause a skew in the Y-axis direction. Therefore, if, for the sake of example, the ions in the motion are deflected by 30 in the X-axis direction, the component of the ion velocity in this X-axis direction is half of its total velocity.

該X軸偏斜的量和該等離子的Y軸座標幾乎無關,而是只被觀察到有稍微的相關性。在所有例子中,磁場的Z軸分量的大小和Y軸座標相關,但此變化某些程度上可藉由改變該等棒的間距來加以改變;且一個棒的形狀讓它可被移動以調整該間距,同時讓未被移動的其它棒留在它們最適合的位置。 The amount of X-axis skew is almost independent of the Y-axis coordinate of the plasma, but only a slight correlation is observed. In all cases, the magnitude of the Z-axis component of the magnetic field is related to the Y-axis coordinate, but this change can be changed to some extent by changing the spacing of the bars; and the shape of a bar allows it to be moved to adjust This spacing allows the other bars that are not moved to remain in their most suitable position.

2.在X軸方向上的淨偏斜為零;但在X軸方向上的實體偏移量是偏離該第一磁極的偏移量的兩倍,且取決於該線圈電流方向。在Y軸方向上的淨偏斜和該等線圈內的電流的平方成正比;因此,和該等線圈內的電流的極 性無關。 2. The net skew in the X-axis direction is zero; however, the physical offset in the X-axis direction is twice the offset from the first pole and depends on the coil current direction. The net skew in the Y-axis direction is proportional to the square of the current in the coils; therefore, the poles of the currents in the coils Nothing about sex.

如圖例所示,在Y軸方向上的淨偏斜和端部空間區域113中獲得的X軸方向上的運動量乘上中間的空間區域112內的磁場的Z軸分量成正比。因為這些的每一者和該磁鐵內的電流成正比,在Y軸方向上的總偏斜效果和該等線圈內的電流的平方成正比。端部空間區域115的作用是要精確地逆轉另一端部空間區域113的偏斜效果。 As shown in the figure, the net deflection in the Y-axis direction and the amount of motion in the X-axis direction obtained in the end space region 113 are proportional to the Z-axis component of the magnetic field in the intermediate spatial region 112. Since each of these is proportional to the current in the magnet, the total skewing effect in the Y-axis direction is proportional to the square of the current in the coils. The role of the end space region 115 is to accurately reverse the deflection effect of the other end space region 113.

任何實數數值的平方永遠都是正的。因此,如果Y軸方向的偏斜和電流的平方成正比的話,則不論該電流是在該等線圈內的正的方向或負的方向,該Y軸方向的偏斜永遠都是在同一方向。 The square of any real number is always positive. Therefore, if the skew in the Y-axis direction is proportional to the square of the current, the skew in the Y-axis direction is always in the same direction regardless of whether the current is in the positive or negative direction within the coils.

綜言之:X軸偏斜及X軸偏移效果兩者都和電磁繞組線圈內的電流成正比。如果從業人員逆轉電流的話,則該動作及事件亦會隨之逆轉該偏移。但Y軸方向的偏斜永遠都會偏斜遠離該組件的磁極,且永遠和電流的平方成正比。 In summary: both the X-axis skew and the X-axis offset effect are proportional to the current in the electromagnetic winding coil. If the practitioner reverses the current, the action and event will also reverse the offset. However, the skew in the Y-axis direction will always be skewed away from the pole of the component and will always be proportional to the square of the current.

如果從業人員持續增加電流的話,則結果是,離子被迴轉,然後從該軛線圈組件的入口出來。 If the practitioner continues to increase the current, the result is that the ions are swung and then exit the inlet of the yoke coil assembly.

3.Y軸偏斜的量將隨著該離子的Y軸座標大致線性地變。線性變化產生很少像差或沒有像差之規矩的聚焦;且藉由調整介於個別的棒之間的間隙距離的形狀及位置來小心地塑造,則可以有一些優化。 3. The amount of Y-axis skew will vary substantially linearly with the Y-axis coordinate of the ion. Linear variations produce a focus with little or no aberrations; and by carefully shaping the shape and position of the gap distance between individual bars, there may be some optimization.

此Y軸偏斜參數在獲得高分辨能力上是極重要的,因為該分辨能力係以該分散(見上文)和射束幅寬 最小值(即,射束通過狹縫6a及6b(參見圖6b或10)處)的比率來計算。 This Y-axis skew parameter is extremely important in achieving high resolution because the resolution is due to the dispersion (see above) and beam width. The minimum value (i.e., the ratio of the beam passing through the slits 6a and 6b (see Fig. 6b or 10) is calculated.

4.可獲得的最大分辨能力是由下面的考量來決定: 4. The maximum resolution that can be obtained is determined by the following considerations:

(a)可從該裝置獲得的分散係對於早先的一特定的例子來計算。為了一般化,此裝置的分散D為D=2 β L其中2 β是在負的y方向上的總偏斜,單位是度,且L是該待決定的點離該裝置的中心的距離。 (a) The dispersion available from the device is calculated for a particular example earlier. For generalization, the dispersion D of the device is D = 2 β L where 2 β is the total deflection in the negative y direction, the unit is degrees, and L is the distance of the point to be determined from the center of the device.

(b)而且,任何裝置的最佳分辨能力為R=D/t所以在此例子中:R=2 β L/t t是該射束在該分辨設備所在位置點在質量分散方向上的厚度尺度。 (b) Moreover, the optimum resolution of any device is R = D / t. In this example: R = 2 β L / tt is the thickness scale of the beam at the point where the resolution device is located in the direction of mass dispersion. .

(c)因此,很明顯的是:該分辨能力在該射束被聚焦於一最小厚度之處最大;且如果該焦點可被移動進一步遠離該裝置的中心的話,則該散佈將會更大。不幸地,不變的情況是,當你移動愈遠離該裝置時,該焦點會變大。 (c) Thus, it is apparent that the resolution is greatest where the beam is focused to a minimum thickness; and if the focus can be moved further away from the center of the device, the spread will be greater. Unfortunately, the constant situation is that the focus becomes larger as you move further away from the device.

因此,為了要將分辨能力最大化,吾人必須調整該分析器裝置的焦點特性來將該焦點置於一合宜的距離,即一被選取的位置,其應有效地超越該裝置的磁邊界。而且,該射束焦點的焦點品質應儘可能地沒有像差。 Therefore, in order to maximize resolution, we must adjust the focus characteristics of the analyzer device to place the focus at a convenient distance, i.e., a selected position that effectively exceeds the magnetic boundary of the device. Moreover, the focus quality of the beam focus should be as free as possible.

5.本發明的一獨特的特性及特徵為它非常強地 聚焦。因此,在該C型軛線圈組件中,當總彎折角度增加到超過約16度時,焦點長度相應地減小。然而,在目前對於此關係仍沒有分析性的表達方式(expression)被推導出來,但在彎折角度20度時,共軛焦點離該磁鐵非常近,使得該線繞組干擾到該離子源及其它相關構件的安裝,且在更大的彎折角度時,共軛焦點則完全位在磁場區域113及115內。 5. A unique feature and feature of the present invention is that it is very strong Focus. Therefore, in the C-yoke coil assembly, when the total bending angle is increased to more than about 16 degrees, the focal length is correspondingly reduced. However, expressions that are still not analytical for this relationship are derived, but at a bend angle of 20 degrees, the conjugate focus is very close to the magnet, causing the line winding to interfere with the ion source and others. The mounting of the associated components, and at larger bend angles, the conjugate focus is completely within the magnetic field regions 113 and 115.

因此,它依循的是,在某些情形中,高於35的分辨能力可在許多C型軛線圈組件的實施例中被獲得;但在目前,一約35的分辨能力被認為對於本發明而言是一安全切實的最大值。 Therefore, it follows that, in some cases, a resolution greater than 35 can be obtained in many embodiments of a C-type yoke assembly; however, at present, a resolution of about 35 is considered for the present invention. Words are a safe and tangible maximum.

本發明在形式上不受侷限且在範圍上亦不受限,而是由隨附的申請專利範圍來界定。 The invention is not limited in form and is not limited in scope, but is defined by the scope of the appended claims.

1‧‧‧橋接區段 1‧‧‧Bridge section

2‧‧‧電磁線圈 2‧‧‧Electromagnetic coil

10‧‧‧C型軛線圈組件 10‧‧‧C type yoke coil assembly

13‧‧‧面表面 13‧‧‧ surface

15‧‧‧面表面 15‧‧‧ surface

52a‧‧‧直線長度區段 52a‧‧‧Line length section

52b‧‧‧直線長度區段 52b‧‧‧Line length section

Claims (13)

一種質量分析器設備,其適合用來改變被任意地選取的固定幅寬尺度的一鄰接的移動的帶狀離子射束的至少一特徵,該質量分析器設備包含:一C型軛線圈組件,其將被設置成和一鄰接的帶狀離子射束的移動路徑相鄰接並藉此均勻地跨越該被並列的移動的離子射束的幅寬尺度,該C型軛線圈組件包含:一形態及尺度被設定的隧道形軛,其(α)具有一環繞大於180度的C型截面,且其圍繞在一隧道形凹穴的三個側邊上,及其在一直線上均一地延伸至其兩個分開的端部的每一端部,(β)具有兩個作為隧道側面之可識別的實心壁臂件及一實心的中心橋接段,(γ)提供兩個分開的臂件面表面,其具備有一範圍在約150至175度之間的夾角,及(δ)是用至少一磁性金屬材料製造;及至少一纏繞的線圈,其被設置在該隧道形軛上,其中每一該被設置的纏繞的線圈(i)是一跑道型長圓形(obround)迴圈,其由多匝導電體纏繞而成且包含兩個導體繞組的平行直線長度區段,以及兩個分開的彎曲端,其中每一直線長度區段的長度大於該移動的帶狀射束的幅寬尺度,及每一彎曲端彎繞180度且和該等直線長度區段相銜接, (ii)延伸環繞並包圍該軛,(iii)被設置成使得兩個直線長度區段的一者係平置在該軛的隧道空間內,且另一直線長度區段係平置在該軛的外面,(iv)可產生一隨選式(on-demand)磁場,其由該軛的表面直角地散發出來,多個被磁場定向的空間區域藉此被產生且以連續串聯的方式被設置,該等多個磁場被定向的空間區域的體積、磁場強度、及方向效應整體上係足以達成該鄰接的移動的離子射束的實質改變。 A mass analyzer apparatus adapted to change at least one characteristic of an contiguous moving ribbon ion beam of an arbitrarily selected fixed width dimension, the mass analyzer apparatus comprising: a C-type yoke coil assembly, It will be arranged adjacent to the path of movement of an adjacent strip of ion beam and thereby uniformly span the width dimension of the side-by-side moving ion beam, the C-yoke coil assembly comprising: a form And a tunnel-shaped yoke whose dimensions are set, the (α) having a C-shaped cross section that surrounds more than 180 degrees, and which surrounds three sides of a tunnel-shaped recess and uniformly extends thereto in a straight line Each end of the two separate ends, (β) has two identifiable solid wall arms as a tunnel side and a solid central bridge, (γ) providing two separate arm face surfaces, Having an included angle ranging from about 150 to 175 degrees, and (δ) is made of at least one magnetic metal material; and at least one wound coil disposed on the tunnel yoke, each of which is disposed The wound coil (i) is a runway type long An obround loop that is wound from a multi-turn conductor and includes parallel linear length sections of two conductor windings, and two separate curved ends, wherein each linear length section has a length greater than the movement The width dimension of the strip beam, and each curved end is bent 180 degrees and is connected to the straight length sections, (ii) extending around and surrounding the yoke, (iii) being arranged such that one of the two linear length sections is flat within the tunnel space of the yoke, and the other linear length section is flat on the yoke Outside, (iv) can generate an on-demand magnetic field that is emitted at right angles to the surface of the yoke, whereby a plurality of spatially oriented spatial regions are thereby generated and arranged in a continuous series. The volume, magnetic field strength, and directional effects of the spatial regions in which the plurality of magnetic fields are oriented are generally sufficient to achieve substantial changes in the adjacent moving ion beam. 一種質量分析器設備,其適合用來改變被任意地選取的幅寬的一鄰接的移動的帶狀離子射束的彈道,該質量分析器設備包含:一分開的C型軛線圈組件,其將被設置成和一帶狀離子射束的移動路徑相鄰接並藉此跨越該被並列的移動的離子射束的幅寬尺度,該C型軛線圈組件包含:一形態及尺度被設定的隧道形軛,其(α)具有一環繞大於180度的C型截面,且其圍繞在一隧道形凹穴的三個側邊上,及其在一直線上均一地延伸至其兩個分開的端部的每一端部,(β)具有兩個作為隧道側面之可識別的實心壁臂件及一實心的中心橋接段,(γ)提供兩個分開的臂件面表面,其具備有一範圍在約150至170度之間的夾角,及(δ)是用至少一磁性金屬材料製造; 及至少一纏繞的線圈,其被設置在該隧道形軛上,其中每一該被設置的纏繞的線圈(i)是一跑道型長圓形(obround)迴圈,其由多匝導電體纏繞而成且包含兩個導體繞組的平行直線長度區段以及兩個分開的彎曲端,其中每一直線長度區段的長度大於該移動的帶狀射束的幅寬尺度,及每一彎曲端彎繞180度且和該等直線長度區段相銜接,(ii)延伸環繞並包圍該軛,(iii)被設置成使得兩個直線長度區段的一者係平置在該軛的隧道空間內,且另一直線長度區段係平置在該軛的外面,(iv)可產生一隨選式(on-demand)磁場,其由該軛的表面直角地散發出來,多個磁場被定向的空間區域藉此被產生且以連續串聯的方式被設置,該等多個磁場被定向的空間區域的體積、磁場強度、及方向效應整體上係足以達成該鄰接的移動的離子射束的實質改變。 A mass analyzer apparatus adapted to change a trajectory of an contiguous moving ribbon ion beam of an arbitrarily selected width, the mass analyzer apparatus comprising: a separate C-yoke coil assembly that will Arranged to be adjacent to a moving path of a strip of ion beam and thereby span the width dimension of the side-by-side moving ion beam, the C-yoke coil assembly comprising: a tunnel of a form and scale set a yoke having (α) having a C-shaped cross section that is greater than 180 degrees and that surrounds three sides of a tunnel-shaped recess and that extends uniformly in a straight line to its two separate ends At each end, (β) has two identifiable solid wall arms as a side of the tunnel and a solid central bridge, (γ) providing two separate arm face surfaces with a range of about 150 An angle of between 170 degrees, and (δ) is made of at least one magnetic metal material; And at least one wound coil disposed on the tunnel yoke, wherein each of the disposed wound coils (i) is a racetrack type obround loop wound by a plurality of turns of electrical conductors And a parallel linear length section comprising two conductor windings and two separate curved ends, wherein each linear length section has a length greater than a width dimension of the moving strip beam, and each curved end is curved 180 degrees and engaged with the linear length segments, (ii) extending around and surrounding the yoke, (iii) being arranged such that one of the two linear length segments is flat within the tunnel space of the yoke, And another straight length section is flat on the outside of the yoke, (iv) can generate an on-demand magnetic field, which is emitted from the surface of the yoke at right angles, and the spatial regions in which the plurality of magnetic fields are oriented Thereby generated and arranged in a continuous series, the volume, magnetic field strength, and directional effects of the spatial regions in which the plurality of magnetic fields are oriented are generally sufficient to achieve substantial changes in the adjacent moving ion beam. 一種質量分析器設備,其適合用來改變被任意地選取的幅寬的一鄰接的移動的帶狀離子射束的至少一特徵,該質量分析器設備包含:一分開的C型軛永久磁鐵組件,其將被鄰接地設置在一帶狀離子射束的移動路徑上方或設置在該移動路徑下方緊鄰的位置並藉此跨越該被並列的移動的離子射束的幅寬尺度,該C型軛永久磁鐵組件包含: 一形態及尺度被設定的隧道形軛,其(α)具有一環繞大於180度的C型截面,且其圍繞在一隧道形凹穴的三個側邊上,及其在一直線上均一地延伸至其兩個分開的端部的每一端部,(β)具有兩個作為隧道側面之可識別的實心壁臂件及一實心的中心橋接段,(γ)提供兩個分開的臂件面表面,其具備有一範圍在約150至175度之間的夾角,及(δ)是用至少一磁性金屬材料製造;及一永久磁鐵,其構成該隧道形軛的該中心橋接段的至少一部分,其中該永久磁鐵(i)是一用至少一種永久磁鐵材料製成之被形塑的實體,(ii)延伸於該軛從一端至另一端的的整個長度,(iii)可隨選地(on-demand)產生一直角地延伸出的磁場,多個磁場被定向的空間區域藉此被產生且以連續串聯的方式被設置,該等多個磁場被定向的空間區域的體積、磁場強度、及方向效應整體上係足以達成用於一鄰接的移動的離子射束的彈道的實質改變。 A mass analyzer apparatus adapted to change at least one characteristic of an adjacent moving ribbon ion beam of an arbitrarily selected width, the mass analyzer apparatus comprising: a separate C-yoke permanent magnet assembly Which will be placed contiguously above the path of movement of the strip-shaped ion beam or at a position immediately below the path of movement and thereby span the width dimension of the side-by-side moving ion beam, the C-shaped yoke The permanent magnet assembly contains: A tunnel-shaped yoke having a shape and a dimension, the (α) having a C-shaped cross section that surrounds more than 180 degrees, and which surrounds three sides of a tunnel-shaped recess and uniformly extends in a straight line To each of its two separate ends, (β) has two identifiable solid wall arms as a tunnel side and a solid central bridge, (γ) providing two separate arm faces Having an included angle ranging from about 150 to 175 degrees, and (δ) is made of at least one magnetic metal material; and a permanent magnet constituting at least a portion of the central bridging section of the tunnel yoke, wherein The permanent magnet (i) is a shaped body made of at least one permanent magnet material, (ii) extends over the entire length of the yoke from one end to the other end, (iii) optionally (on- Reducing a magnetic field that extends angularly, a spatial region in which a plurality of magnetic fields are directed thereby generated and arranged in a continuous series, the volume, magnetic field strength, and directional effects of the spatial regions in which the plurality of magnetic fields are oriented Overall sufficient to achieve an adjacency The substantial change in the trajectory of the moving ion beam. 如申請專利範圍第1或2項所述的質量分析器設備,其更包含一電流源,其係和纏繞在該C型軛線圈組件周圍的該線圈隨選式地聯通。 The mass analyzer device of claim 1 or 2, further comprising a current source that is selectively in communication with the coil wound around the C-yoke coil assembly. 如申請專利範圍第1、2或3項所述的質量分析器 設備,其更包含至少兩個塑形的鐵磁棒,其被設置在該鄰接的移動的離子射束的相反側。 A mass analyzer as described in claim 1, 2 or 3 The apparatus further includes at least two shaped ferromagnetic bars disposed on opposite sides of the adjacent moving ion beam. 一種操作系統,其適合改變一鄰接的移動的帶狀離子射束的至少一可識別的特徵,該操作系統包含:一移動的帶狀射束,其包含至少一種所想要的離子種類,其中該離子射束的幅寬尺度的尺寸可被任意地固定在小於100mm至大於3000mm的大小且該離子射束的厚度尺度被固定在小於50mm的大小;一被並列的質量分析器設備,其包含分開的C型軛線圈組件,其將被設置成和一帶狀離子射束的移動路徑相鄰接並藉此跨越該移動的離子射束的幅寬尺度,該C型軛線圈組件包含:一形態及尺度被設定的隧道形軛,其(α)具有一環繞大於180度的C型截面,且其圍繞在一隧道形凹穴的三個側邊上,及其在一直線上均一地延伸至其兩個分開的端部的每一端部,(β)具有兩個作為隧道側面之可識別的實心壁臂件及一實心的中心橋接段,(γ)提供兩個分開的臂件面表面,其具備有一範圍在約150至175度之間的夾角,及(δ)是用至少一磁性金屬材料製造;及至少一纏繞的線圈,其被設置在該隧道形軛上,其中每一該被設置的纏繞的線圈 (i)是一跑道型長圓形(obround)迴圈,其由多匝導電體纏繞而成且包含兩個導體繞組的平行直線長度區段以及兩個分開的彎曲端,其中每一直線長度區段的長度大於該移動的帶狀射束的幅寬尺度,及每一彎曲端彎繞180度且和該等直線長度區段相銜接,(ii)延伸環繞並包圍該軛,(iii)被設置成使得該兩個直線長度區段的一者係平置在該軛的隧道空間內,且另一該直線長度區段係平置在該軛的外面,(iv)可產生一隨選式(on-demand)磁場,其由該軛的表面直角地散發出來,多個磁場被定向的空間區域藉此被產生且以連續串聯的方式被設置,該等多個磁場被定向的空間區域的體積、磁場強度、及方向效應整體上係足以達成該鄰接的移動的離子射束的實質改變;及一電流源,其和纏繞在該C型軛線圈組件內的該隧道型軛周圍的該被纏繞的線圈隨選式地電聯通。 An operating system adapted to alter at least one identifiable feature of an adjacent moving strip of ion beam, the operating system comprising: a moving strip beam comprising at least one desired ion species, wherein The size dimension of the ion beam may be arbitrarily fixed at a size of less than 100 mm to more than 3000 mm and the thickness dimension of the ion beam is fixed at a size of less than 50 mm; a juxtaposed mass analyzer device comprising a separate C-yoke coil assembly that is disposed adjacent to a path of movement of a ribbon ion beam and thereby spans a width dimension of the moving ion beam, the C-yoke coil assembly comprising: a tunnel-shaped yoke having a shape and a dimension set, wherein (α) has a C-shaped cross section that surrounds more than 180 degrees, and it surrounds three sides of a tunnel-shaped recess, and extends uniformly to the straight line to At each end of its two separate ends, (β) has two identifiable solid wall arms as a tunnel side and a solid central bridge, (γ) providing two separate arm face surfaces, It has a fan An angle between about 150 and 175 degrees, and (δ) is made of at least one magnetic metal material; and at least one wound coil is disposed on the tunnel yoke, wherein each of the wounds is disposed Coil (i) is a runway-type obround loop that is wound by a multi-turn conductor and includes parallel linear length sections of two conductor windings and two separate curved ends, each of which has a straight length The length of the segment is greater than the width dimension of the moving ribbon beam, and each curved end is bent 180 degrees and engages the linear length segments, (ii) extends around and surrounds the yoke, (iii) is Arranging such that one of the two linear length sections is flat within the tunnel space of the yoke, and the other of the linear length sections is flat outside the yoke, (iv) generating an on-demand A magnetic field that is emitted at right angles to the surface of the yoke, a spatial region in which a plurality of magnetic fields are oriented is thereby generated and arranged in a continuous series, the plurality of magnetic fields being oriented in a spatial region The volume, magnetic field strength, and directional effects are generally sufficient to achieve substantial changes in the adjacent moving ion beam; and a current source that is wrapped around the tunnel yoke within the C-yoke coil assembly The wound coils are selectively electrically connected. 一種操作系統,其適合改變一鄰接的移動的帶狀離子射束的至少一可識別的特徵,該操作系統包含:一被並列的移動的帶狀射束,其包含至少一種所想要的離子種類,其中該離子射束的幅寬尺度的尺寸可被任意地固定在小於100mm至大於3000mm的大小且該離子射束的厚度尺度被被固定在小於50mm的大小;一質量分析器設備,其包含分開的C型軛線圈組件, 其將被設置成和一帶狀離子射束的移動路徑相鄰接並藉此跨越該鄰接的移動的離子射束的幅寬尺度,該C型軛線圈組件包含:一形態及尺度被設定的隧道形軛,其(α)具有一環繞大於180度的C型截面,且其環繞在一隧道形凹穴的三個側邊上,及其在一直線上均一地延伸至其兩個分開的端部的每一端部,(β)具有兩個作為隧道側面之可識別的實心壁臂件及一實心的中心橋接段,(γ)提供兩個分開的臂件面表面,其具備有一範圍在約150至175度之間的夾角,及(δ)是用至少一磁性金屬材料製造;及一永久磁鐵,其構成該隧道形軛的該中心橋接段的至少一部分,其中該永久磁鐵(i)是一用至少一種永久磁鐵材料製成之被形塑的實體,(ii)延伸於該軛從一端至另一端的整個長度,(iii)可隨選地(on-demand)產生一直角地延伸出的磁場,多個磁場被定向的空間區域藉此被產生且以連續串聯的方式被設置,該等多個磁場被定向的空間區域的體積、磁場強度、及方向效應整體上係足以達成用於該鄰接的移動的離子射束的實質改變。 An operating system adapted to alter at least one identifiable feature of an adjacent moving strip of ion beam, the operating system comprising: a side-by-side moving strip beam comprising at least one desired ion a type in which the size of the width dimension of the ion beam can be arbitrarily fixed at a size of less than 100 mm to more than 3000 mm and the thickness dimension of the ion beam is fixed at a size of less than 50 mm; a mass analyzer device Includes a separate C-type yoke coil assembly, It will be arranged to abut the path of movement of a strip of ion beam and thereby span the width dimension of the adjacent moving ion beam, the C-yoke coil assembly comprising: a form and a scale set a tunnel-shaped yoke having (α) a C-shaped cross section that surrounds more than 180 degrees and that surrounds three sides of a tunnel-shaped recess and that extends uniformly in a straight line to its two separate ends Each end of the portion, (β) has two identifiable solid wall arm members as a tunnel side and a solid central bridge member, (γ) providing two separate arm face surfaces having a range of approximately An angle between 150 and 175 degrees, and (δ) is made of at least one magnetic metal material; and a permanent magnet constituting at least a portion of the central bridging section of the tunnel yoke, wherein the permanent magnet (i) is a shaped body made of at least one permanent magnet material, (ii) extending over the entire length of the yoke from one end to the other end, (iii) optionally extending on a straight-forward basis. a magnetic field in which a plurality of spatial regions are oriented and thereby Are arranged in series continuous manner, the volume of the space region a plurality of such magnetic field is oriented, sufficient to achieve substantial change for the mobile ions in the beam line adjacent the overall magnetic field strength, direction and effect. 如申請專利範圍第6或7項所述的系統,其中該 系統被用來從該鄰接的移動的離子射束內的至少一不想要的離子種類中分離出至少一想要的離子種類。 The system of claim 6 or 7, wherein the A system is used to separate at least one desired ion species from at least one unwanted ion species within the adjacent moving ion beam. 如申請專利範圍第6或7項所述的系統,其中該系統被用於該鄰接的移動的離子射束的彈道偏斜。 The system of claim 6 or 7, wherein the system is used for ballistic deflection of the adjacent moving ion beam. 如申請專利範圍第9項所述的系統,其中該系統用來將最初是在X軸方向上的該鄰接的移動的離子射束的幅寬彎折+α的角度,然後接著將該鄰接的移動的離子射束的幅寬再彎折-α的角度,用以恢復該最初的移動方向。 The system of claim 9, wherein the system is configured to bend the width of the adjacent moving ion beam initially in the X-axis direction by an angle of +α, and then to the adjacent The width of the moving ion beam is then bent at an angle of -α to restore the original direction of movement. 如申請專利範圍第9項所述的系統,其中該系統被用來將該鄰接的移動的離子射束從其最初的彈道偏斜一大於約4度且不大於約30度的淨角度改變。 The system of claim 9, wherein the system is adapted to vary the adjacent moving ion beam from its original ballistic deflection by a net angle greater than about 4 degrees and no greater than about 30 degrees. 如申請專利範圍第6或7項所述的系統,其中當該系統係被用於該鄰接的移動的離子射束在Y-Z平面內的聚焦。 The system of claim 6 or 7, wherein the system is used for focusing of the adjacent moving ion beam in the Y-Z plane. 如申請專利範圍第12項所述的系統,其中該鄰接的移動的離子射束變成被聚焦在該Y軸方向上且在X軸方向上沒有聚焦作用。 The system of claim 12, wherein the adjacent moving ion beam becomes focused in the Y-axis direction and has no focusing effect in the X-axis direction.
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