TW201345849A - Glass plate - Google Patents

Glass plate Download PDF

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Publication number
TW201345849A
TW201345849A TW102112731A TW102112731A TW201345849A TW 201345849 A TW201345849 A TW 201345849A TW 102112731 A TW102112731 A TW 102112731A TW 102112731 A TW102112731 A TW 102112731A TW 201345849 A TW201345849 A TW 201345849A
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Taiwan
Prior art keywords
glass
glass plate
mass
sulfur
molten
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TW102112731A
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Chinese (zh)
Inventor
Shiro Tanii
Nobuaki IKAWA
Daisuke Kobayashi
Akio Koike
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Asahi Glass Co Ltd
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Publication of TW201345849A publication Critical patent/TW201345849A/en

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    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C21/00Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface
    • C03C21/007Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface in gaseous phase
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B18/00Shaping glass in contact with the surface of a liquid
    • C03B18/02Forming sheets
    • C03B18/20Composition of the atmosphere above the float bath; Treating or purifying the atmosphere above the float bath
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C15/00Surface treatment of glass, not in the form of fibres or filaments, by etching
    • C03C15/02Surface treatment of glass, not in the form of fibres or filaments, by etching for making a smooth surface
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/04Glass compositions containing silica
    • C03C3/076Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/083Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
    • C03C3/085Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
    • C03C3/087Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal containing calcium oxide, e.g. common sheet or container glass
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/04Glass compositions containing silica
    • C03C3/076Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/089Glass compositions containing silica with 40% to 90% silica, by weight containing boron
    • C03C3/091Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
    • C03C3/093Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium containing zinc or zirconium

Abstract

The present invention relates to a glass plate formed by causing molten glass, which is continuously fed onto a molten metal (e.g., molten tin) in a float bath, to flow on the molten metal, wherein the sulfur concentration in the glass at a position at a depth of 0.3 to 0.5 mum from the top surface exposed to a reductive atmosphere in the float bath is equivalent to or greater than the sulfur concentration at a position at a depth of 3 mum from the top surface.

Description

玻璃板 glass plate

本發明係關於一種玻璃板。 The present invention relates to a glass sheet.

作為玻璃板之成形方法,廣泛使用浮式法。浮式法係使連續供給至金屬液槽(以下,亦僅稱為「槽」)內之熔融金屬(例如熔融錫)上之熔融玻璃於熔融金屬上流動而成形為帶板狀(例如參照專利文獻1)。 As a method of forming a glass sheet, a floating method is widely used. In the floating method, the molten glass continuously supplied to the molten metal (for example, molten tin) in the molten metal tank (hereinafter, simply referred to as "slot") flows on the molten metal to form a strip shape (for example, refer to the patent) Document 1).

槽內之環境大多情況下係為了防止熔融金屬之氧化而設為含有氫氣之還原環境。氫氣藉由與自外部混入之氧氣反應而防止熔融金屬之氧化。 In many cases, the environment in the tank is a reducing environment containing hydrogen gas in order to prevent oxidation of the molten metal. Hydrogen prevents oxidation of the molten metal by reacting with oxygen mixed from the outside.

另一方面,於上述專利文獻1中揭示有將槽內之環境設為氧化環境之情況。氧化環境降低熔融玻璃之表面張力,因此熔融玻璃容易成形。作為氧化環境,記載有最佳為含有亞硫酸(SO2)氣體、三氧化硫(SO3)氣體者。 On the other hand, Patent Document 1 discloses a case where the environment in the tank is an oxidizing environment. The oxidizing environment lowers the surface tension of the molten glass, so the molten glass is easily formed. As the oxidizing environment, those containing sulfurous acid (SO 2 ) gas and sulfur trioxide (SO 3 ) gas are preferably described.

再者,亞硫酸氣體及三氧化硫氣體於含有氫氣之還原環境中成為硫化氫(H2S)氣體等,無法穩定地存在,因此無法降低熔融玻璃之表面張力。 Further, since the sulfurous acid gas and the sulfur trioxide gas are hydrogen sulfide (H 2 S) gas or the like in a reducing atmosphere containing hydrogen gas, they cannot be stably present, and thus the surface tension of the molten glass cannot be lowered.

[先前技術文獻] [Previous Technical Literature] [專利文獻] [Patent Literature]

[專利文獻1]日本專利特公昭46-41915號公報 [Patent Document 1] Japanese Patent Publication No. Sho 46-41915

先前之玻璃板有於槽內暴露於還原環境中之主表面上形成有大量微小缺陷之情況,就彎曲強度而言有改善之餘地。 The prior glass sheets have a large number of minute defects formed on the main surface exposed to the reducing environment in the groove, and there is room for improvement in bending strength.

本發明係鑒於上述問題而完成者,其目的在於提供一種彎曲強度優異之玻璃板。 The present invention has been made in view of the above problems, and an object thereof is to provide a glass sheet excellent in bending strength.

為解決上述目的,本發明之一態樣之玻璃板係使連續供給至金屬液槽內之熔融金屬上之熔融玻璃於上述熔融金屬上流動而成形者, 其特徵在於:上述玻璃板之距於上述金屬液槽內暴露於還原環境中之主表面之深度為0.3~0.5μm的位置上之玻璃之硫濃度大於或等於距上述主表面之深度為3μm的位置上之玻璃之硫濃度。 In order to solve the above object, a glass sheet according to an aspect of the present invention is formed by flowing a molten glass continuously supplied onto a molten metal in a molten metal tank onto the molten metal. The glass plate is at a distance of 0.3 to 0.5 μm from the main surface exposed to the reducing environment in the molten metal bath, and the sulfur concentration of the glass is greater than or equal to a depth of 3 μm from the main surface. The concentration of sulfur in the glass at the location.

根據本發明,提供一種彎曲強度優異之玻璃板。 According to the present invention, a glass sheet excellent in bending strength is provided.

10‧‧‧金屬液槽 10‧‧‧metal tank

12‧‧‧金屬液槽之入口 12‧‧‧ Entrance to the metal tank

14‧‧‧金屬液槽之出口 14‧‧‧Export of metal tank

20‧‧‧熔融金屬 20‧‧‧ molten metal

30‧‧‧熔融玻璃 30‧‧‧Solid glass

40‧‧‧還原環境 40‧‧‧Return environment

50‧‧‧流槽唇磚 50‧‧‧Roughing lip brick

60‧‧‧加熱器 60‧‧‧heater

70‧‧‧給氣通路 70‧‧‧ gas supply pathway

80‧‧‧排氣通路 80‧‧‧Exhaust passage

圖1係表示本發明之一實施形態之玻璃板之硫濃度的分佈之圖。 Fig. 1 is a view showing the distribution of sulfur concentration in a glass plate according to an embodiment of the present invention.

圖2係本發明之一實施形態之玻璃板之製造裝置的說明圖(1)。 Fig. 2 is an explanatory view (1) of a manufacturing apparatus of a glass sheet according to an embodiment of the present invention.

圖3係本發明之一實施形態之玻璃板之製造裝置的說明圖(2)。 Fig. 3 is an explanatory view (2) of a manufacturing apparatus for a glass sheet according to an embodiment of the present invention.

以下,參照圖式而對用以實施本發明之形態進行說明。再者,於以下之圖式中,對相同或對應之構成附上相同或對應之符號而省略說明。 Hereinafter, embodiments for carrying out the invention will be described with reference to the drawings. In the following drawings, the same or corresponding reference numerals are given to the same or corresponding components, and the description is omitted.

本實施形態之玻璃板之製造方法例如具有熔解步驟、成形步驟、緩冷卻步驟及切割步驟,視需要進而具有研磨步驟。研磨步驟係根據玻璃板之用途而進行。 The method for producing a glass sheet according to the present embodiment includes, for example, a melting step, a molding step, a slow cooling step, and a cutting step, and further has a polishing step as needed. The grinding step is carried out according to the use of the glass plate.

熔解步驟係使混合複數種原料而製備之玻璃原料熔解而獲得熔融玻璃。將玻璃原料投入熔解爐內後,藉由自噴燃器噴射之火焰之輻 射熱而使玻璃原料熔解而成為熔融玻璃。 The melting step melts the glass raw material prepared by mixing a plurality of raw materials to obtain molten glass. After the glass raw material is put into the melting furnace, the flame is sprayed by the self-burning burner The glass raw material is melted by the heat generation to become molten glass.

成形步驟係將於熔解步驟中獲得之熔融玻璃連續地供給至槽內之熔融金屬(例如熔融錫)上,使熔融玻璃於熔融金屬上流動而成形,從而獲得板狀玻璃(所謂玻璃帶)。該成形方法係稱作浮式法。為了防止熔融金屬之氧化而將槽內之環境設為含有氫氣之還原環境。板狀玻璃係一面朝特定方向流動一面進行冷卻而於槽之出口附近自熔融金屬提拉。 The forming step is that the molten glass obtained in the melting step is continuously supplied to the molten metal (for example, molten tin) in the tank, and the molten glass is flowed on the molten metal to be formed, thereby obtaining a sheet glass (so-called glass ribbon). This forming method is called a floating method. In order to prevent oxidation of the molten metal, the environment in the tank is set to a reducing environment containing hydrogen. The sheet glass is cooled while flowing in a specific direction, and is pulled from the molten metal in the vicinity of the outlet of the groove.

緩冷卻步驟係於緩冷卻爐內對於成形步驟中獲得之板狀玻璃進行緩冷卻。板狀玻璃係於緩冷卻爐內,一面於輥上自緩冷卻爐之入口朝向出口水平地搬送,一面進行緩冷卻。於緩冷卻爐內,於緩冷卻爐之入口附近向板狀玻璃之表面吹送亞硫酸(SO2)氣體等,從而於板狀玻璃之表層上形成硫酸鹽膜。緩冷卻爐之出口對大氣開放,因此緩冷卻爐內之環境為大氣環境。 The slow cooling step is performed in the slow cooling furnace to slowly cool the sheet glass obtained in the forming step. The plate glass is placed in a slow cooling furnace, and is cooled while being horizontally conveyed from the inlet of the slow cooling furnace toward the outlet on the roll. In the slow cooling furnace, sulfurous acid (SO 2 ) gas or the like is blown to the surface of the sheet glass near the inlet of the slow cooling furnace to form a sulfate film on the surface layer of the sheet glass. The outlet of the slow cooling furnace is open to the atmosphere, so the environment inside the cooling furnace is an atmospheric environment.

切割步驟係利用切割機將於緩冷卻步驟中緩冷卻之板狀玻璃切割成特定尺寸。於切割步驟中,切除板狀玻璃之寬度方向之兩邊緣部(所謂耳部)。其原因在於:板狀玻璃之寬度方向之兩邊緣部會因表面張力等影響而變厚。 The cutting step is performed by cutting the plate glass which is slowly cooled in the slow cooling step by the cutter to a specific size. In the cutting step, both edge portions (so-called ears) in the width direction of the sheet glass are cut. The reason for this is that both edge portions in the width direction of the sheet glass become thick due to the influence of surface tension or the like.

研磨步驟係對於切割步驟中獲得之玻璃板之主表面進行研磨。於研磨步驟中,根據玻璃板之用途,對於槽內與熔融金屬接觸之主表面(以下,稱為「底面」)進行研磨。對於為與底面相反側之主表面並於槽內暴露於還原環境中之主表面(以下,稱為「頂面」),不進行研磨。 The grinding step is to grind the main surface of the glass sheet obtained in the cutting step. In the polishing step, the main surface (hereinafter referred to as "bottom surface") in contact with the molten metal in the groove is polished according to the use of the glass plate. The main surface (hereinafter referred to as "top surface") exposed to the main surface on the opposite side to the bottom surface and exposed to the reducing atmosphere in the groove is not polished.

以上述方式獲得作為製品之玻璃板。玻璃板例如可用作車輛用窗玻璃、建築物用窗玻璃、顯示器用基板、顯示器用蓋玻璃、或光罩用基板。「顯示器」包含液晶顯示器(LCD,Liquid crystal display)、電漿顯示器(PDP,Plasma Display Panel)、有機 EL(Electroluminescence,電致發光)顯示器等平板顯示器(FPD,Flat panel display)。 A glass plate as a product was obtained in the above manner. The glass plate can be used, for example, as a window glass for a vehicle, a window glass for a building, a substrate for a display, a cover glass for a display, or a substrate for a photomask. "Monitor" includes liquid crystal display (LCD), plasma display panel (PDP, Plasma Display Panel), organic Flat panel display (FPD) such as EL (Electroluminescence) display.

圖1係本發明之一實施形態之玻璃板之硫濃度的分佈圖。於圖1中,以實線表示本實施形態之玻璃板之硫濃度之分佈,以虛線表示先前之玻璃板之硫濃度之分佈。縱軸表示玻璃中之硫濃度(atoms/cm3),橫軸表示距頂面之深度(μm)。玻璃中之硫濃度係利用二次離子質譜分析計(SIMS,secondary ion mass spectroscopy),一面切削頂面一面進行測定。 BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a graph showing the distribution of sulfur concentration in a glass plate according to an embodiment of the present invention. In Fig. 1, the distribution of the sulfur concentration of the glass plate of the present embodiment is indicated by a solid line, and the distribution of the sulfur concentration of the previous glass plate is indicated by a broken line. The vertical axis represents the sulfur concentration (atoms/cm 3 ) in the glass, and the horizontal axis represents the depth (μm) from the top surface. The sulfur concentration in the glass was measured by cutting a top surface by a secondary ion mass spectrometer (SIMS).

玻璃板中之硫濃度之分佈受到成形步驟中之還原環境中之硫濃度之影響。若還原環境中之硫濃度較低,則作為揮發成分之硫容易自熔融玻璃之上表面(玻璃板之頂面)漏出至還原環境中。若還原環境中之硫濃度較高,則還原環境中之硫容易進入熔融玻璃之上表面。又,玻璃板中之硫濃度之分佈亦受到緩冷卻步驟中所使用之SO2氣體之影響。 The distribution of the sulfur concentration in the glass sheet is affected by the concentration of sulfur in the reducing environment in the forming step. If the sulfur concentration in the reducing environment is low, sulfur as a volatile component easily leaks from the upper surface of the molten glass (the top surface of the glass plate) to the reducing environment. If the concentration of sulfur in the reducing environment is high, the sulfur in the reducing environment easily enters the upper surface of the molten glass. Further, the distribution of the sulfur concentration in the glass plate is also affected by the SO 2 gas used in the slow cooling step.

如圖1中實線及虛線所示,就距頂面之深度未達0.05μm之位置而言,越接近頂面,玻璃中之硫濃度越增加。其原因在於受到緩冷卻步驟中所使用之SO2氣體之影響。緩冷卻步驟係與成形步驟相比玻璃之溫度較低,因此與成形步驟相比,受到外部氣體之影響之位置之深度較淺。又,就於槽內成形之過程中受到環境之影響之方面而言位置,距頂面之深度為3μm以上之位置過深,因此玻璃中之硫濃度固定。 As shown by the solid line and the broken line in Fig. 1, the position of the top surface is less than 0.05 μm, and the closer to the top surface, the more the sulfur concentration in the glass increases. The reason for this is that it is affected by the SO 2 gas used in the slow cooling step. The slow cooling step is lower in temperature than the forming step, and therefore the depth of the position affected by the external gas is shallower than the forming step. Further, the position in the process of forming in the groove is affected by the environment, and the position at a depth of 3 μm or more from the top surface is too deep, so the sulfur concentration in the glass is fixed.

與先前之玻璃板不同,本實施形態之玻璃板係距頂面之深度為0.3~0.5μm的位置(受到成形步驟中之外部氣體之影響且基本上不受緩冷卻步驟中之外部氣體之影響的位置)上之玻璃之硫濃度大於或等於距頂面之深度為3μm的位置(基本上不受成形步驟及緩冷卻步驟中之外部氣體之影響之位置)上之玻璃之硫濃度。因此,其後進行詳細敍述,於成形步驟中作為揮發成分之硫自熔融玻璃之上表面(玻璃板 之頂面)漏出至還原環境中的量較少,於頂面基本上無微小缺陷(包含玻璃之分相)。 Unlike the previous glass plate, the glass plate of the present embodiment has a depth of 0.3 to 0.5 μm from the top surface (affected by the external gas in the forming step and is substantially unaffected by the external gas in the slow cooling step). The sulfur concentration of the glass on the glass is greater than or equal to the sulfur concentration of the glass at a position of 3 μm from the top surface (substantially free from the position of the external gas in the forming step and the slow cooling step). Therefore, it will be described in detail later, as a volatile component of sulfur in the forming step from the upper surface of the molten glass (glass plate) The top surface) is less likely to leak out into the reducing environment, and there are substantially no micro defects (including phase separation of the glass) on the top surface.

再者,如圖1中實線所示,本實施形態之玻璃板於距頂面之深度為0.05~0.3μm之位置,越接近頂面,玻璃中之硫濃度越減少。該現象之原因在於受到成形步驟中向槽內之上游側供給含硫氣體之影響。於槽之上游側,還原環境中之硫濃度較高,於槽內之下游側,還原環境中之硫濃度變低。因此,可認為於槽之上游側自還原環境進入熔融玻璃之上表面(玻璃板之頂面)之硫於槽之下游側漏出至還原環境中。 Further, as shown by the solid line in Fig. 1, the glass plate of the present embodiment has a depth of 0.05 to 0.3 μm from the top surface, and the closer to the top surface, the lower the sulfur concentration in the glass. The reason for this phenomenon is that it is affected by the supply of sulfur-containing gas to the upstream side in the tank in the forming step. On the upstream side of the tank, the sulfur concentration in the reducing environment is higher, and on the downstream side in the tank, the sulfur concentration in the reducing environment becomes lower. Therefore, it can be considered that the sulfur entering the upper surface of the molten glass (the top surface of the glass plate) from the reducing environment on the upstream side of the groove leaks into the reducing environment on the downstream side of the groove.

如上所述,本實施形態之玻璃板於頂面基本上無玻璃格子中之微小缺陷(以下表示為微小缺陷),因此對頂面施加拉伸應力時之彎曲強度良好。彎曲強度係藉由球環(ball on ring)法而測定。關於彎曲強度之測定方法之詳細情況,於實施例中進行說明。 As described above, the glass plate of the present embodiment has substantially no micro defects (hereinafter referred to as minute defects) in the glass lattice on the top surface. Therefore, the bending strength when the tensile stress is applied to the top surface is good. The flexural strength was measured by a ball on ring method. The details of the method for measuring the bending strength will be described in the examples.

彎曲強度取決於玻璃板之玻璃之種類或玻璃板之板厚,於板厚為0.2~0.7mm(較佳為0.5~0.7mm)之無鹼玻璃板之情形時,彎曲強度例如為4GPa以上。又,於板厚為0.2~0.7mm(較佳為0.5~0.7mm)之鈉鈣玻璃板之情形時,彎曲強度例如為2.5GPa以上。 The bending strength depends on the type of the glass of the glass plate or the thickness of the glass plate. When the thickness is 0.2 to 0.7 mm (preferably 0.5 to 0.7 mm), the bending strength is, for example, 4 GPa or more. Further, in the case of a soda lime glass plate having a thickness of 0.2 to 0.7 mm (preferably 0.5 to 0.7 mm), the bending strength is, for example, 2.5 GPa or more.

又,本實施形態之玻璃板於頂面基本上無微小缺陷,因此為了去除表面之污垢或使表面粗化而利用緩衝氫氟酸之溶液進行表面處理時,由於無起點,故可抑制異物之附著,表面處理後之霧度值(濁度)為良好。所謂「霧度」,係指玻璃板之透射光中,藉由正向散射而自入射光偏離2.5°以上之透射光之百分率(JIS K7136;2000)。將入射光之光軸設為與玻璃板之板厚方向平行。關於霧度值之測定方法之詳細情況,於實施例中進行說明。 Further, since the glass plate of the present embodiment has substantially no minute defects on the top surface, in order to remove the dirt on the surface or roughen the surface and perform surface treatment with a solution of buffered hydrofluoric acid, since there is no starting point, foreign matter can be suppressed. The haze value (turbidity) after adhesion and surface treatment was good. The term "haze" refers to the percentage of transmitted light that is deviated from the incident light by 2.5 or more by forward scattering in the transmitted light of the glass plate (JIS K7136; 2000). The optical axis of the incident light is set to be parallel to the thickness direction of the glass plate. The details of the method for measuring the haze value will be described in the examples.

霧度值取決於玻璃板之玻璃之種類等,於為無鹼玻璃之情形時,霧度值例如為1%以下,較佳為0.5%以下,更佳為0.2%以下。又,於為鈉鈣玻璃之情形時,霧度值例如為3%以下,較佳為1%以 下,更佳為0.5%以下。 The haze value depends on the type of the glass of the glass plate, etc., and in the case of an alkali-free glass, the haze value is, for example, 1% or less, preferably 0.5% or less, more preferably 0.2% or less. Further, in the case of soda lime glass, the haze value is, for example, 3% or less, preferably 1%. More preferably, it is 0.5% or less.

玻璃板之玻璃之種類係根據玻璃板之用途而選擇。例如於LCD用玻璃基板之情形時,使用無鹼玻璃。又,於車輛用窗玻璃、建築物用窗玻璃、及PDP用玻璃基板之情形時,使用鈉鈣玻璃。於為顯示器用蓋玻璃之情形時,主要使用可化學強化之鈉鈣玻璃。於為光罩用基板之情形時,主要使用熱膨脹係數較低之石英玻璃。 The type of glass of the glass plate is selected according to the use of the glass plate. For example, in the case of a glass substrate for LCD, an alkali-free glass is used. Further, in the case of a window glass for a vehicle, a window glass for a building, and a glass substrate for a PDP, soda lime glass is used. In the case of a cover glass for a display, a chemically strengthened soda lime glass is mainly used. In the case of a substrate for a photomask, quartz glass having a low coefficient of thermal expansion is mainly used.

無鹼玻璃例如可以氧化物基準之質量%表示計含有50~66%之SiO2、10.5~24%之Al2O3、0~12%之B2O3、0~8%之MgO、0~14.5%之CaO、0~24%之SrO、0~13.5%之BaO、0~5%之ZrO2、0~3%之SnO,且MgO+CaO+SrO+BaO為9~29.5%,鹼金屬氧化物之含量之總量為0.1%以下。 The alkali-free glass may contain, for example, 50 to 66% of SiO 2 , 10.5 to 24% of Al 2 O 3 , 0 to 12% of B 2 O 3 , 0 to 8% of MgO, and 0% by mass based on the oxide. ~14.5% CaO, 0~24% SrO, 0~13.5% BaO, 0~5% ZrO 2 , 0~3% SnO, and MgO+CaO+SrO+BaO is 9~29.5%, alkali The total amount of the metal oxide is 0.1% or less.

無鹼玻璃較佳為以氧化物基準之質量%表示計含有58~66%之SiO2、15~22%之Al2O3、5~12%之B2O3、0~8%之MgO、0~9%之CaO、3~12.5%之SrO、0~2%之BaO、0~1%之SnO,且MgO+CaO+SrO+BaO為9~18%,鹼金屬氧化物之含量之總量為0.1%以下。 The alkali-free glass preferably contains 58 to 66% of SiO 2 , 15 to 22% of Al 2 O 3 , 5 to 12% of B 2 O 3 , and 0 to 8% of MgO based on the mass % of the oxide. 0~9% CaO, 3~12.5% SrO, 0~2% BaO, 0~1% SnO, and MgO+CaO+SrO+BaO is 9~18%, the content of alkali metal oxide The total amount is below 0.1%.

無鹼玻璃由於成形步驟中之熔融玻璃之發泡之限制,因此主體之硫濃度可為1質量%以下。「主體」意指玻璃板之板厚方向中央部分。主體之硫濃度例如為0.1質量%以上,較佳為0.2質量%以上。若主體之硫濃度為0.1質量%以上,則成形步驟中自熔融玻璃揮散之硫容易聚集於還原環境中,從而還原環境中之硫濃度容易變高。若還原環境中之硫濃度充分變高,則抑制硫自其後自熔解爐向槽內供給之熔融玻璃的揮散。再者,於為熔解溫度較高之玻璃原料之情形時,玻璃原料中所含有之大部分硫揮散至熔解爐內之環境中,因此主體之硫濃度亦可未達0.1質量%。熔解爐之溫度高於槽內之溫度。 Since the alkali-free glass is limited by the foaming of the molten glass in the forming step, the sulfur concentration of the main body can be 1% by mass or less. "Main body" means the central portion of the glass plate in the thickness direction. The sulfur concentration of the main body is, for example, 0.1% by mass or more, preferably 0.2% by mass or more. When the sulfur concentration of the main body is 0.1% by mass or more, the sulfur volatilized from the molten glass in the forming step tends to aggregate in the reducing environment, and the sulfur concentration in the reducing environment tends to be high. When the sulfur concentration in the reducing atmosphere is sufficiently increased, the volatilization of the molten glass supplied from the melting furnace to the tank thereafter is suppressed. Further, in the case where the glass raw material having a relatively high temperature is melted, most of the sulfur contained in the glass raw material is volatilized into the environment in the melting furnace, so that the sulfur concentration of the main body may be less than 0.1% by mass. The temperature of the melting furnace is higher than the temperature in the tank.

鈉鈣玻璃例如以氧化物基準之質量%表示計含有65~75%之SiO2、0~13%之Al2O3、0~15%之CaO、0~15%之MgO、10~20%之 Na2O、0~10%之K2O、0~5%之Li2O、0~3%之Fe2O3、0~5%之TiO2、0~3%之CeO2、0~10%之BaO、0~5%之SrO、0~5%之B2O3、0~5%之ZnO、0~10%之ZrO2、0~3%之SnO2、0~0.5%之SO3The soda lime glass contains, for example, 65 to 75% of SiO 2 , 0 to 13% of Al 2 O 3 , 0 to 15% of CaO, 0 to 15% of MgO, and 10 to 20% by mass based on the oxide. Na 2 O, 0~10% K 2 O, 0~5% Li 2 O, 0~3% Fe 2 O 3 , 0~5% TiO 2 , 0~3% CeO 2 , 0 ~10% BaO, 0~5% SrO, 0~5% B 2 O 3 , 0~5% ZnO, 0~10% ZrO 2 , 0~3% SnO 2 , 0~0.5% SO 3 .

繼而,基於圖2及圖3,對上述玻璃板之成形步驟之詳細情況進行說明。 Next, details of the forming step of the above glass sheet will be described based on FIGS. 2 and 3.

圖2及圖3係本發明之一實施形態之玻璃板之製造裝置的說明圖。圖2係槽之俯視剖面圖,圖3係槽之側視剖面圖。 2 and 3 are explanatory views of a manufacturing apparatus of a glass sheet according to an embodiment of the present invention. Figure 2 is a top cross-sectional view of the groove, and Figure 3 is a side cross-sectional view of the groove.

於成形步驟中,一面使熔融玻璃30於槽10內之熔融金屬20上流動一面進行冷卻而成形為帶板狀。為了防止熔融金屬20之氧化而以含有氫氣之還原環境40充滿槽10內之上部空間。為了防止外部氣體之侵入而將槽10內之上部空間保持為高於大氣壓之正壓。於槽10中,設置有流槽唇磚50、加熱器60、給氣通路70及排氣通路80等。 In the molding step, the molten glass 30 is cooled while flowing on the molten metal 20 in the tank 10, and is formed into a strip shape. In order to prevent oxidation of the molten metal 20, the upper space in the tank 10 is filled with a reducing atmosphere 40 containing hydrogen. In order to prevent intrusion of outside air, the upper space in the tank 10 is maintained at a positive pressure higher than atmospheric pressure. In the tank 10, a laundering lip 50, a heater 60, an air supply passage 70, an exhaust passage 80, and the like are provided.

流槽唇磚(spout lip)50係向槽10內供給熔融玻璃30之供給通路,設置於槽10之入口12上。流槽唇磚50係與製作熔融玻璃30之熔解爐連接。 A spout lip 50 is a supply passage for supplying the molten glass 30 into the tank 10, and is provided on the inlet 12 of the tank 10. The runner lip tile 50 is connected to a melting furnace for making the molten glass 30.

加熱器60係對槽10內進行加熱者,例如如圖3所示,係自槽10之頂部懸掛。加熱器60係例如於熔融玻璃30之流動方向(X方向)及寬度方向(Y方向)上隔著間隔而設置有複數個,且配置成矩陣狀。X方向及Y方向係相互正交之水平方向。 The heater 60 is heated in the tank 10, for example, as shown in Fig. 3, and is suspended from the top of the tank 10. The heater 60 is provided in plural, for example, in a flow direction (X direction) and a width direction (Y direction) of the molten glass 30, and is arranged in a matrix. The X direction and the Y direction are horizontal directions orthogonal to each other.

加熱器60之輸出係以自槽10之入口12越朝向出口14,則熔融玻璃30之溫度變得越低之方式加以控制。又,加熱器60之輸出係以熔融玻璃30之厚度於寬度方向(Y方向)上變得均勻之方式加以控制。 The output of the heater 60 is controlled such that the temperature of the molten glass 30 becomes lower as the inlet 12 from the tank 10 faces the outlet 14. Further, the output of the heater 60 is controlled such that the thickness of the molten glass 30 becomes uniform in the width direction (Y direction).

給氣通路70係向槽10內供給還原性氣體之通路,例如如圖3所示,係設置於槽10之頂部。給氣通路70係於特定方向(X方向)上隔著間隔而設置有複數條。 The gas supply passage 70 is a passage for supplying a reducing gas into the tank 10, and is provided, for example, at the top of the tank 10 as shown in Fig. 3 . The air supply passage 70 is provided with a plurality of strips in a specific direction (X direction) with an interval therebetween.

還原性氣體可為氫氣與氮氣之混合氣體。氫氣於還原性氣體中所占之比率例如為0.1~15體積%。 The reducing gas may be a mixed gas of hydrogen and nitrogen. The ratio of hydrogen in the reducing gas is, for example, 0.1 to 15% by volume.

排氣通路80係使還原環境40排氣之通路,例如如圖3所示,係設置於槽10之側壁上。排氣通路80係於特定方向(X方向)上隔著間隔而設置有複數條。 The exhaust passage 80 is a passage for exhausting the reducing environment 40, and is provided, for example, on the side wall of the tank 10 as shown in FIG. The exhaust passage 80 is provided with a plurality of strips in a specific direction (X direction) with an interval therebetween.

如圖3所示,將熔融玻璃30成形為帶板狀之板狀玻璃(玻璃帶)係於槽10之出口14附近,自熔融金屬20提拉。其後,板狀玻璃經緩冷卻步驟、切割步驟等而成為作為製品之玻璃板。 As shown in FIG. 3, the molten glass 30 is formed into a plate-like plate glass (glass ribbon) which is attached to the vicinity of the outlet 14 of the groove 10, and is pulled from the molten metal 20. Thereafter, the sheet glass is subjected to a slow cooling step, a cutting step, or the like to form a glass plate as a product.

以玻璃板具有特定之硫濃度分佈之方式,於熔融玻璃30之至少一部分之上方,將還原環境40中之硫濃度設為1mg/Nm3以上(較佳為5mg/Nm3以上)。 The sulfur concentration in the reducing atmosphere 40 is set to be 1 mg/Nm 3 or more (preferably 5 mg/Nm 3 or more) above at least a part of the molten glass 30 so that the glass plate has a specific sulfur concentration distribution.

還原環境40中之硫主要作為化合物之氣體而存在。作為化合物,例如可列舉硫化氫(H2S)等。硫化氫氣體例如如下述式(1)般與熔融玻璃30之上表面反應而增加玻璃之硫濃度,並且抑制硫自熔融玻璃30之上表面向還原環境之揮散。 The sulfur in the reducing environment 40 is mainly present as a gas of the compound. Examples of the compound include hydrogen sulfide (H 2 S) and the like. The hydrogen sulfide gas reacts with the upper surface of the molten glass 30 as in the following formula (1) to increase the sulfur concentration of the glass, and suppresses the volatilization of sulfur from the upper surface of the molten glass 30 to the reducing environment.

H2S+Si-O-R2+-O-Si → Si-OH+Si-OH+RS…(1) H 2 S+Si-OR 2+ -O-Si → Si-OH+Si-OH+RS...(1)

式(1)中,R表示鹼土金屬。 In the formula (1), R represents an alkaline earth metal.

再者,玻璃所含有之硫例如藉由如下述式(2)般暴露於氫氣(H2)中而揮散至還原環境中。 Further, the sulfur contained in the glass is volatilized into the reducing atmosphere by, for example, being exposed to hydrogen (H 2 ) as in the following formula (2).

SO2+3H2 → H2S+2H2O…(2) SO 2 +3H 2 → H 2 S+2H 2 O...(2)

熔融玻璃30之下表面未暴露於氫氣中,因此硫難以自熔融玻璃30之下表面漏出至外部,從而於底面上難以產生微小缺陷。 The lower surface of the molten glass 30 is not exposed to hydrogen gas, so that it is difficult for sulfur to leak from the lower surface of the molten glass 30 to the outside, so that it is difficult to cause minute defects on the bottom surface.

於熔融玻璃30之至少一部分之上方,將還原環境40中之硫濃度設為1mg/Nm3以上,藉此可抑制硫自熔融玻璃30之上表面向還原環境之揮散,可減少於頂面產生之微小缺陷。 The concentration of sulfur in the reducing atmosphere 40 is set to be 1 mg/Nm 3 or more above at least a portion of the molten glass 30, whereby the volatilization of sulfur from the upper surface of the molten glass 30 to the reducing environment can be suppressed, and the top surface can be reduced. Minor defects.

熔融玻璃30中之硫之揮發係於溫度越高側越容易引起,因此為 了充分地獲得上述效果,較佳為,至少於熔融玻璃30之黏度成為106dPa.s以下之位置之上方,還原環境40中之硫濃度為1mg/Nm3以上。更佳之範圍為5mg/Nm3以上。 The volatilization of sulfur in the molten glass 30 is more likely to occur on the side where the temperature is higher. Therefore, in order to sufficiently obtain the above effects, it is preferred that the viscosity at least the molten glass 30 becomes 10 6 dPa. Above the position below s, the sulfur concentration in the reducing environment 40 is 1 mg/Nm 3 or more. More preferably, the range is 5 mg/Nm 3 or more.

此處,作為熔融玻璃30之黏度,使用熔融玻璃30之寬度方向中央之黏度作為代表值。再者,熔融玻璃30之寬度方向中央之黏度成為106dPa.s之位置的下游側(低溫側)之還原環境40中之硫濃度並無特別限定,可為1mg/Nm3以上,亦可為未達1mg/Nm3Here, as the viscosity of the molten glass 30, the viscosity in the center in the width direction of the molten glass 30 is used as a representative value. Further, the viscosity of the center of the molten glass 30 in the width direction is 10 6 dPa. The sulfur concentration in the reducing environment 40 on the downstream side (low temperature side) of the position of s is not particularly limited, and may be 1 mg/Nm 3 or more, or may be less than 1 mg/Nm 3 .

若還原環境40中之硫濃度成為過量,則產生固體之硫化物而向熔融玻璃30之上表面下落。因此,為了抑制硫化物之下落,還原環境40中之硫濃度例如可為10mg/Nm3以下。 When the sulfur concentration in the reducing atmosphere 40 is excessive, a solid sulfide is generated and falls to the upper surface of the molten glass 30. Therefore, in order to suppress the fall of the sulfide, the sulfur concentration in the reducing atmosphere 40 may be, for example, 10 mg/Nm 3 or less.

還原環境40中之硫濃度之調節並無特別限定,例如藉由調節硫或硫化合物向熔融金屬20之供給量而進行。熔融金屬20中之硫濃度變得越高,自熔融金屬20釋放至還原環境40中之硫之量越增加,因此還原環境40中之硫濃度變高。 The adjustment of the sulfur concentration in the reducing atmosphere 40 is not particularly limited, and is performed, for example, by adjusting the amount of sulfur or sulfur compound supplied to the molten metal 20. The higher the sulfur concentration in the molten metal 20 becomes, the more the amount of sulfur released from the molten metal 20 to the reducing environment 40 increases, and thus the sulfur concentration in the reducing environment 40 becomes higher.

硫或硫化合物向熔融金屬20之供給只要於熔融金屬20之上表面中未被熔融玻璃30覆蓋之部分進行,則可於槽10內之任意之位置實施。其原因在於:伴隨著熔融玻璃30之流動,熔融金屬20亦流動,因此熔融金屬20均質化。 The supply of the sulfur or sulfur compound to the molten metal 20 can be carried out at any position in the groove 10 as long as it is carried out on the upper surface of the molten metal 20 which is not covered by the molten glass 30. This is because the molten metal 20 also flows along with the flow of the molten glass 30, so that the molten metal 20 is homogenized.

作為硫化合物,例如可使用硫化錫(SnS)等硫化物、硫酸鈣(CaSO4)等硫酸鹽,硫之價數並無特別限定。該等中,較佳為可抑制作為熔融金屬20之熔融錫之污染、變質且沸點較高之硫化錫。 As the sulfur compound, for example, a sulfide such as tin sulfide (SnS) or a sulfate such as calcium sulfate (CaSO 4 ) can be used, and the valence of sulfur is not particularly limited. Among these, it is preferable to suppress the sulfide which is contaminated and deteriorated as the molten tin of the molten metal 20 and has a high boiling point.

熔融金屬20中之硫濃度係根據槽10之容量或構成、還原環境40之給氣速度或排氣速度等而設定,例如為1質量ppm以上,較佳為3質量ppm以上。若為1質量ppm以上,則可於熔融玻璃30之至少一部分之上方將還原環境40中之硫濃度設為1mg/Nm3以上。又,為了抑制固體之硫化錫附著於底面或頂面而成為缺陷,熔融金屬20中之硫濃度可為 30質量ppm以下。 The sulfur concentration in the molten metal 20 is set according to the capacity or configuration of the tank 10, the feed gas speed of the reducing environment 40, the exhaust gas velocity, and the like, and is, for example, 1 mass ppm or more, preferably 3 mass ppm or more. When it is 1 mass ppm or more, the sulfur concentration in the reducing environment 40 can be made 1 mg/Nm 3 or more above at least a part of the molten glass 30. Further, in order to prevent the solid tin sulfide from adhering to the bottom surface or the top surface and becoming a defect, the sulfur concentration in the molten metal 20 may be 30 ppm by mass or less.

熔融金屬20之溫度變得越高,自熔融金屬20釋放至還原環境40中之硫之量越增加。如圖2所示,於X方向上隔著間隔而設置有複數條排氣通路80之情形時,氣體難以向X方向流動,因此越上游側(高溫側),還原環境40中之硫濃度之值變得越高。 The higher the temperature of the molten metal 20 becomes, the more the amount of sulfur released from the molten metal 20 into the reducing environment 40 increases. As shown in FIG. 2, when a plurality of exhaust passages 80 are provided at intervals in the X direction, gas does not easily flow in the X direction. Therefore, the sulfur concentration in the reducing environment 40 is higher on the upstream side (high temperature side). The value gets higher.

還原環境40中之硫濃度之調節亦可藉由調節含硫氣體向槽10內之供給量而進行。含硫氣體可與還原性氣體分開供給,亦可混合於還原性氣體中而自給氣通路70供給。於自給氣通路70進行供給之情形時,可僅自複數條給氣通路70中之上游側之給氣通路70供給含硫氣體。作為含硫氣體,並無特別限定,例如可列舉硫化氫(H2S)氣體等。 The adjustment of the sulfur concentration in the reducing environment 40 can also be carried out by adjusting the supply amount of the sulfur-containing gas into the tank 10. The sulfur-containing gas may be supplied separately from the reducing gas, or may be supplied to the self-supply gas passage 70 by being mixed in the reducing gas. When the supply of the self-supply gas passage 70 is performed, the sulfur-containing gas may be supplied only from the supply passage 70 on the upstream side of the plurality of feed passages 70. The sulfur-containing gas is not particularly limited, and examples thereof include hydrogen sulfide (H 2 S) gas and the like.

以上,對本發明之一實施形態進行了說明,但本發明並不限制於上述實施形態。可於不偏離本發明之範圍之情況下對上述實施形態進行各種變形及置換。 Although an embodiment of the present invention has been described above, the present invention is not limited to the above embodiment. Various modifications and changes can be made to the above-described embodiments without departing from the scope of the invention.

[實施例] [Examples]

以下,藉由實施例等而具體地說明本發明,但本發明並不受該等例限定。 Hereinafter, the present invention will be specifically described by way of examples, but the present invention is not limited by the examples.

[例1~例5] [Example 1 to Example 5]

以例1~例5之順序增加硫化氫(H2S)氣體向槽內之每單位時間之供給量,除此以外,以相同之方式製造包含大致相同之組成之無鹼玻璃之玻璃板。例1~例2為比較例,例3~例5為實施例。再者,於例1~例5中,硫化氫氣體之供給位置係設為槽之上游側。又,硫化氫氣體之供給量係於例1中設為0Nm3/min,於例2中設為0.01Nm3/min,於例3中設為0.03Nm3/min,於例4中設為0.06Nm3/min,於例5中設為0.1Nm3/min。 A glass plate containing substantially the same composition of the alkali-free glass was produced in the same manner by increasing the supply amount of hydrogen sulfide (H 2 S) gas per unit time in the order of Examples 1 to 5. Examples 1 to 2 are comparative examples, and examples 3 to 5 are examples. Further, in Examples 1 to 5, the supply position of the hydrogen sulfide gas was set to the upstream side of the groove. Further, the supply amount of hydrogen sulfide gas in the system in Example 1 to 0Nm 3 / min, in embodiment 2, set 0.01Nm 3 / min, in Example 3 to 0.03Nm 3 / min, in Examples 4 to 0.06Nm 3 / min, in the embodiment is set to 5 0.1Nm 3 / min.

無鹼玻璃係以氧化物基準之質量%表示計含有59.5%之SiO2、 17%之Al2O3、8%之B2O3、3.3%之MgO、4%之CaO、7.6%之SrO、0.1%之BaO、0.1%之ZrO2,且MgO+CaO+SrO+BaO為15%,剩餘部分為不可避免之雜質,鹼金屬氧化物之含量之總量為0.1%以下。於玻璃組成之測定中,使用螢光X射線分析裝置(RIGAKU公司製造,ZSX100e)。 The alkali-free glass is represented by 59.5% by mass of SiO 2 , 17% of Al 2 O 3 , 8% of B 2 O 3 , 3.3% of MgO, 4% of CaO, and 7.6% of SrO. 0.1% BaO, 0.1% ZrO 2 , and MgO+CaO+SrO+BaO is 15%, and the remainder is an unavoidable impurity, and the total amount of the alkali metal oxide is 0.1% or less. For the measurement of the glass composition, a fluorescent X-ray analyzer (manufactured by RIGAKU Co., Ltd., ZSX100e) was used.

對所獲得之玻璃板進行加工,準備主體之硫濃度之測定用樣品、頂面附近之硫濃度之測定用樣品、彎曲強度之測定用樣品(厚度0.5mm)、及BHF(Buffered Hydrogen Fluoride,緩衝氫氟酸)處理後之霧度之測定用樣品(厚度0.5mm)。主體之硫濃度之測定用樣品係對底面及頂面進行研磨並切削玻璃板之板厚方向中央部而製作。其他測定用樣品係對底面進行研磨而對頂面不進行研磨。 The glass plate obtained is processed to prepare a sample for measuring the sulfur concentration of the main body, a sample for measuring the sulfur concentration in the vicinity of the top surface, a sample for measuring the bending strength (thickness: 0.5 mm), and BHF (Buffered Hydrogen Fluoride). Sample for measurement of haze after treatment with hydrofluoric acid (thickness: 0.5 mm). The sample for measuring the sulfur concentration of the main body was produced by polishing the bottom surface and the top surface and cutting the center portion in the thickness direction of the glass sheet. The other sample for measurement was ground on the bottom surface and the top surface was not polished.

主體之硫濃度係藉由螢光X射線分析裝置(RIGAKU公司製造,ZSX100e)而測定。與二次離子質譜分析相比,螢光X射線分析適合於對大面積之區域進行高精度地測定。 The sulfur concentration of the main body was measured by a fluorescent X-ray analyzer (manufactured by RIGAKU Co., Ltd., ZSX100e). Fluorescence X-ray analysis is suitable for high-precision determination of large-area regions compared to secondary ion mass spectrometry.

頂面附近之硫濃度係利用二次離子質譜分析計(ULVAC公司製造,adept 1010),一面切削頂面一面進行測定。根據測定結果,求出距頂面之深度為0.4μm之位置上之玻璃的硫濃度A(atoms/cm3)及距頂面之深度為3μm之位置上之玻璃的硫濃度B(atoms/cm3)之比(A/B)。 The sulfur concentration in the vicinity of the top surface was measured by a secondary ion mass spectrometer (manufactured by ULVAC, Adept 1010) while cutting the top surface. According to the measurement results, the sulfur concentration A (atoms/cm 3 ) of the glass at a position of a depth of 0.4 μm from the top surface and the sulfur concentration B of the glass at a position of a depth of 3 μm from the top surface were obtained (atoms/cm). 3 ) ratio (A/B).

玻璃板之彎曲強度係藉由球環法而測定。測定用樣品係以拉伸應力施加於頂面之方式使頂面朝下而置於圓環狀之環上,利用中心配置於環之中心線上之球自上方進行推壓。再者,環之剖面形狀係設為直徑5mm之圓形狀,環之外圈之直徑係設為30mm。又,球之直徑係設為10mm,球之移動速度係設為10mm/sec。 The bending strength of the glass plate was measured by the ball ring method. The sample for measurement was placed on the annular ring with the top surface facing downward so that the tensile stress was applied to the top surface, and the ball placed on the center line of the ring was pressed from above by the center. Further, the cross-sectional shape of the ring is a circular shape having a diameter of 5 mm, and the diameter of the outer ring of the ring is set to 30 mm. Further, the diameter of the ball was set to 10 mm, and the moving speed of the ball was set to 10 mm/sec.

對板厚為0.5mm之測定用樣品於彎曲部分裂開時之破壞荷重W(kN)進行測定,基於下述式(3)而換算為彎曲強度S(GPa)。 The damage load W (kN) when the sample for measurement having a thickness of 0.5 mm was cracked at the bent portion was measured, and converted into a bending strength S (GPa) based on the following formula (3).

S=-1.5584W4+4.8569W3-7.4492W2+8.85W…(3) S=-1.5584W 4 +4.8569W 3 -7.4492W 2 +8.85W...(3)

(其中,W≦1.2kN) (Where, W≦1.2kN)

式(3)係利用使用電腦之模擬解析而導出。模擬解析之解析軟體係使用Solid Works公司製造之「Solid Works Simulation」。再者,於解析中,將玻璃板之泊松比設為0.23,將玻璃板之楊氏模數設為77GPa。該等物性值為通常之無鹼玻璃板之物性值,但亦接近通常之鈉鈣玻璃板之物性值(泊松比:0.23,楊氏模數72GPa)。因此,式(3)可應用於無鹼玻璃板與鈉鈣玻璃板兩者。 Equation (3) is derived by simulation analysis using a computer. The analysis software system for simulation analysis uses "Solid Works Simulation" manufactured by Solid Works. Further, in the analysis, the Poisson's ratio of the glass plate was set to 0.23, and the Young's modulus of the glass plate was set to 77 GPa. These physical properties are physical property values of a usual alkali-free glass plate, but are also close to the physical property values of a usual soda lime glass plate (Poisson's ratio: 0.23, Young's modulus 72 GPa). Therefore, the formula (3) can be applied to both the alkali-free glass plate and the soda lime glass plate.

玻璃板之BHF處理後之霧度值係利用霧度計(日本電色工業公司製造,NDH500)而測定。測定用樣品係於25℃下於BHF之溶液中浸漬20分鐘而進行表面處理,繼而進行清洗、乾燥後,供於霧度之測定。作為BHF之溶液,使用包含0.5質量%之HF、36質量%之NH4F、63.5質量%之水(離子交換水)的溶液。清洗係將BHF處理後之測定用樣品依序浸漬於自來水、蒸餾水、及IPA(Isopropyl alcohol,異丙醇)中而進行。 The haze value after the BHF treatment of the glass plate was measured by a haze meter (manufactured by Nippon Denshoku Industries Co., Ltd., NDH500). The sample for measurement was subjected to surface treatment by immersing in a solution of BHF at 25 ° C for 20 minutes, followed by washing and drying, and then measuring the haze. As the solution of BHF, a solution containing 0.5% by mass of HF, 36% by mass of NH 4 F, and 63.5% by mass of water (ion-exchanged water) was used. In the washing, the sample for measurement after the BHF treatment was sequentially immersed in tap water, distilled water, and IPA (Isopropyl alcohol).

將主體之硫濃度、頂面附近之A/B、破壞荷重、彎曲強度及霧度之測定結果示於表1。破壞荷重及彎曲強度之不均較大,因此利用依據維伯統計解析法(JIS R1625;2010)之方法對30個測定資料進行解析,使用累積破壞概率為50%之破壞荷重而求出彎曲強度。 The measurement results of the sulfur concentration of the main body, the A/B in the vicinity of the top surface, the breaking load, the bending strength, and the haze are shown in Table 1. Since the variation of the breaking load and the bending strength is large, 30 measurement data are analyzed by the method according to the Weibo statistical analysis method (JIS R1625; 2010), and the bending strength is obtained by using the breaking load with a cumulative failure probability of 50%. .

[例6~例10] [Example 6 to Example 10]

以例6~例10之順序增加硫化氫(H2S)氣體向槽內之每單位時間之供給量,除此以外,以相同之方式製造包含大致相同組成之鈉鈣玻璃之玻璃板。例6~例7為比較例,例8~例10為實施例。再者,於例6~例10中,硫化氫氣體之供給位置係設為槽之上游側。又,硫化氫氣體之供給量係於例6中設為0Nm3/min,於例7中設為0.01Nm3/min,於例8中設為0.05Nm3/min,於例9中設為0.1Nm3/min,於例10中設為0.2Nm3/min。 A glass plate containing a soda lime glass having substantially the same composition was produced in the same manner by increasing the supply amount of hydrogen sulfide (H 2 S) gas per unit time in the order of Examples 6 to 10. Examples 6 to 7 are comparative examples, and examples 8 to 10 are examples. Further, in Examples 6 to 10, the supply position of the hydrogen sulfide gas was set to the upstream side of the groove. Further, the supply amount of hydrogen sulfide gas in the system of Example 6 is set 0Nm 3 / min, in Example 7 to 0.01Nm 3 / min, in the embodiment to 8 0.05Nm 3 / min, as in Example 9 to 0.1Nm 3 / min, as in Example 10 to 0.2Nm 3 / min.

鈉鈣玻璃係以氧化物基準之質量%表示計含有71.5%之SiO2、1.8%之Al2O3、8.5%之CaO、4.0%之MgO、13.0%之Na2O、0.5%之K2O、0.1%之Fe2O3、0.05%之TiO2、0.2%之SO3,剩餘部分為不可避免之雜質。於玻璃組成之測定中,使用螢光X射線分析裝置(RIGAKU公司製造,ZSX100e)。 The soda lime glass is represented by 71.5% of SiO 2 , 1.8% of Al 2 O 3 , 8.5% of CaO, 4.0% of MgO, 13.0% of Na 2 O, and 0.5% of K 2 based on the mass % of the oxide. O, 0.1% Fe 2 O 3 , 0.05% TiO 2 , 0.2% SO 3 , and the remainder is an unavoidable impurity. For the measurement of the glass composition, a fluorescent X-ray analyzer (manufactured by RIGAKU Co., Ltd., ZSX100e) was used.

對於所獲得之玻璃板,為了消除於緩冷卻步驟中生成之硫酸鹽之影響而僅研磨底面,藉此準備頂面附近之硫濃度之測定用樣品、彎曲強度之測定用樣品(厚度0.5mm)、及BHF處理後之霧度之測定用樣品(厚度0.5mm)。主體之硫濃度之測定用樣品係對底面及頂面進行研磨並切削玻璃板之板厚方向中央部而製作。其他測定用樣品係對底面進行研磨而對頂面不進行研磨。 In order to eliminate the influence of the sulfate formed in the slow cooling step, only the bottom surface is polished, and the sample for measurement of the sulfur concentration in the vicinity of the top surface and the sample for measurement of the bending strength (thickness: 0.5 mm) are prepared. And a sample for measuring the haze after the BHF treatment (thickness: 0.5 mm). The sample for measuring the sulfur concentration of the main body was produced by polishing the bottom surface and the top surface and cutting the center portion in the thickness direction of the glass sheet. The other sample for measurement was ground on the bottom surface and the top surface was not polished.

將主體之硫濃度、頂面附近之A/B、破壞荷重、彎曲強度及霧度之測定結果示於表1。再者,測定方法係與例1~例5相同。 The measurement results of the sulfur concentration of the main body, the A/B in the vicinity of the top surface, the breaking load, the bending strength, and the haze are shown in Table 1. Further, the measurement methods were the same as in Examples 1 to 5.

本申請案係基於2012年4月10日提出申請之日本專利申請2012-089280者,將其內容作為參照而援用於此處。 The present application is based on Japanese Patent Application No. 2012-089280, filed on Apr.

Claims (10)

一種玻璃板,其係使連續供給至金屬液槽內之熔融金屬上之熔融玻璃於上述熔融金屬上流動而成形者,其特徵在於:上述玻璃板之距於上述金屬液槽內暴露於還原環境中之主表面之深度為0.3~0.5μm的位置上之玻璃之硫濃度大於或等於距上述主表面之深度為3μm的位置上之玻璃之硫濃度。 A glass plate formed by flowing molten glass continuously supplied onto molten metal in a molten metal tank onto the molten metal, wherein the glass plate is exposed to a reducing environment from the molten metal tank. The concentration of sulfur in the glass at a position where the depth of the main surface is 0.3 to 0.5 μm is greater than or equal to the sulfur concentration of the glass at a position of 3 μm from the main surface. 如請求項1之玻璃板,其中上述玻璃板之玻璃為無鹼玻璃。 The glass plate of claim 1, wherein the glass of the glass plate is an alkali-free glass. 如請求項2之玻璃板,其中板厚為0.2~0.7mm,對上述主表面施加拉伸應力時之彎曲強度為4GPa以上。 The glass plate of claim 2, wherein the plate thickness is 0.2 to 0.7 mm, and the bending strength when the tensile stress is applied to the main surface is 4 GPa or more. 如請求項2或3之玻璃板,其中於25℃下於包含氫氟酸(HF)0.5質量%、氟化銨(NH4F)36質量%、水63.5質量%之緩衝氫氟酸之溶液中浸漬20分鐘後的霧度值為1%以下。 The glass plate of claim 2 or 3, wherein the buffered hydrofluoric acid solution containing 0.5% by mass of hydrofluoric acid (HF), 36% by mass of ammonium fluoride (NH 4 F), and 63.5% by mass of water at 25 ° C The haze value after immersion for 20 minutes was 1% or less. 如請求項2至4中任一項之玻璃板,其中上述無鹼玻璃以氧化物基準之質量%表示計含有50~66%之SiO2、10.5~24%之Al2O3、0~12%之B2O3、0~8%之MgO、0~14.5%之CaO、0~24%之SrO、0~13.5%之BaO、0~5%之ZrO2、0~3%之SnO,且MgO+CaO+SrO+BaO為9~29.5%,鹼金屬氧化物之含量之總量為0.1%以下。 The glass plate according to any one of claims 2 to 4, wherein the alkali-free glass contains 50 to 66% of SiO 2 , 10.5 to 24% of Al 2 O 3 , 0 to 12 by mass% of oxide. % B 2 O 3 , 0~8% MgO, 0~14.5% CaO, 0~24% SrO, 0~13.5% BaO, 0~5% ZrO 2 , 0~3% SnO, Further, MgO+CaO+SrO+BaO is 9 to 29.5%, and the total amount of the alkali metal oxide is 0.1% or less. 如請求項5之玻璃板,其中上述無鹼玻璃以氧化物基準之質量%表示計含有58~66%之SiO2、15~22%之Al2O3、5~12%之B2O3、0~8%之MgO、0~9%之CaO、3~12.5%之SrO、0~2%之BaO、0~1%之SnO,且MgO+CaO+SrO+BaO為9~18%,鹼金屬氧化物之含量之總量為0.1%以下。 The glass plate of claim 5, wherein the alkali-free glass comprises 58 to 66% of SiO 2 , 15 to 22% of Al 2 O 3 , and 5 to 12% of B 2 O 3 based on the mass % of the oxide. 0~8% of MgO, 0~9% of CaO, 3~12.5% of SrO, 0~2% of BaO, 0~1% of SnO, and MgO+CaO+SrO+BaO is 9~18%, The total amount of the alkali metal oxide is 0.1% or less. 如請求項1之玻璃板,其中上述玻璃板之玻璃為鈉鈣玻璃。 The glass plate of claim 1, wherein the glass of the glass plate is soda lime glass. 如請求項7之玻璃板,其中板厚為0.2~0.7mm,對上述主表面施加拉伸應力時之彎曲強度為2.5GPa以上。 The glass plate of claim 7, wherein the plate thickness is 0.2 to 0.7 mm, and the bending strength when the tensile stress is applied to the main surface is 2.5 GPa or more. 如請求項7或8之玻璃板,其於25℃下於包含氫氟酸(HF)0.5質量%、氟化銨(NH4F)36質量%、水63.5質量%之緩衝氫氟酸之溶液中浸漬20分鐘後的霧度值為3%以下。 A glass plate according to claim 7 or 8, which comprises a buffered hydrofluoric acid solution containing 0.5% by mass of hydrofluoric acid (HF), 36% by mass of ammonium fluoride (NH 4 F), and 63.5% by mass of water at 25 ° C. The haze value after immersion for 20 minutes was 3% or less. 如請求項7至9中任一項之玻璃板,其中上述鈉鈣玻璃以氧化物基準之質量%表示計含有65~75%之SiO2、0~13%之Al2O3、0~15%之CaO、0~15%之MgO、10~20%之Na2O、0~10%之K2O、0~5%之Li2O、0~3%之Fe2O3、0~5%之TiO2、0~3%之CeO2、0~10%之BaO、0~5%之SrO、0~5%之B2O3、0~5%之ZnO、0~10%之ZrO2、0~3%之SnO2、0~0.5%之SO3The glass plate according to any one of claims 7 to 9, wherein the soda lime glass contains 65 to 75% of SiO 2 , 0 to 13% of Al 2 O 3 , 0 to 15 by mass% of oxide. % CaO, 0~15% MgO, 10-20% Na 2 O, 0-10% K 2 O, 0~5% Li 2 O, 0~3% Fe 2 O 3 , 0~ 5% of TiO 2 , 0 to 3% of CeO 2 , 0 to 10% of BaO, 0 to 5% of SrO, 0 to 5% of B 2 O 3 , 0 to 5% of ZnO, 0 to 10% ZrO 2 , 0 to 3% of SnO 2 , and 0 to 0.5% of SO 3 .
TW102112731A 2012-04-10 2013-04-10 Glass plate TW201345849A (en)

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