TW201337280A - Avalanche testing apparatus and method thereof - Google Patents

Avalanche testing apparatus and method thereof Download PDF

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Publication number
TW201337280A
TW201337280A TW102104505A TW102104505A TW201337280A TW 201337280 A TW201337280 A TW 201337280A TW 102104505 A TW102104505 A TW 102104505A TW 102104505 A TW102104505 A TW 102104505A TW 201337280 A TW201337280 A TW 201337280A
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Taiwan
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transistor
crash test
inductor
wafer
wafer stage
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TW102104505A
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Chinese (zh)
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Choon Leong Lou
Tonthat Toan
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Star Techn Inc
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/26Testing of individual semiconductor devices
    • G01R31/2601Apparatus or methods therefor
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/26Testing of individual semiconductor devices
    • G01R31/2607Circuits therefor
    • G01R31/2621Circuits therefor for testing field effect transistors, i.e. FET's
    • G01R31/2623Circuits therefor for testing field effect transistors, i.e. FET's for measuring break-down voltage therefor

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Testing Of Individual Semiconductor Devices (AREA)

Abstract

A testing apparatus for performing an avalanche test includes a wafer chuck configured to retain a wafer having at least one transistor, an inductor with a first end connected to a drain terminal of the transistor, a power source configured to provide a current to a second end of the inductor through a switch, a meter connected to a source terminal of the transistor through the wafer chuck, and a driver configured to synchronously control the operation of the switch and the operation of the transistor.

Description

崩潰測試裝置及其測試方法 Crash test device and test method thereof

本揭露係關於一種崩潰測試裝置及測試方法,特別係關於一種在晶圓層級進行電晶體之崩潰特性測試的裝置及方法。 The present disclosure relates to a crash test apparatus and test method, and more particularly to an apparatus and method for performing a crash characteristic test of a transistor at a wafer level.

一般而言,晶圓上的積體電路元件必須先行測試其電氣特性,藉以判定積體電路元件是否良好。良好的積體電路將被選出以進行後續之封裝製程,而不良品將被捨棄以避免增加額外的封裝成本。完成封裝之積體電路元件必須再進行另一次電性測試以篩選出封裝不良品,進而提升最終成品良率。換言之,積體電路元件在製造的過程中,必須進行數次的電氣特性測試。 In general, integrated circuit components on a wafer must first be tested for electrical characteristics to determine if the integrated circuit components are good. A good integrated circuit will be selected for subsequent packaging processes, and defective products will be discarded to avoid additional packaging costs. The completed integrated circuit component must be subjected to another electrical test to screen out the defective package, thereby improving the final product yield. In other words, the integrated circuit component must be tested for electrical characteristics several times during the manufacturing process.

電晶體之崩潰測試可在晶圓層級進行,而不是在封裝製程完成後才進行,如此可在封裝製程之前篩選出不符崩潰特性規格的電晶體並予以捨棄,進而避免增加封裝成本。美國專利US 7,368,934揭示一種崩潰測試,用以施加一崩潰測試訊號至一完成封裝之待測積體電路元件。 The crash test of the transistor can be performed at the wafer level, rather than after the packaging process is completed, so that the transistor that does not conform to the crash specification can be screened and discarded before the packaging process, thereby avoiding an increase in packaging cost. U.S. Patent No. 7,368,934 discloses a crash test for applying a crash test signal to a packaged circuit component to be tested that completes the package.

本揭露提供一種在晶圓層級進行電晶體之崩潰特性測試的裝置及方法。 The present disclosure provides an apparatus and method for conducting a crash characteristic test of a transistor at a wafer level.

本揭露提供之崩潰測試裝置包含一晶圓載台,經配置 以承接一晶圓,該晶圓具有至少一電晶體;一電感,具有一第一端點,連接於該電晶體之一汲極;一電源,經配置以經由一開關提供一電流至該電感之一第二端點;一計量器,經配置以經由該晶圓載台連接至該電晶體之一源極;以及一驅動器,經配置以同步控制該開關之運作及該電晶體之運作。 The crash test apparatus provided by the present disclosure includes a wafer stage configured To receive a wafer having at least one transistor; an inductor having a first end connected to one of the drains of the transistor; a power source configured to provide a current to the inductor via a switch a second end point; a meter configured to be coupled to a source of the transistor via the wafer stage; and a driver configured to synchronously control operation of the switch and operation of the transistor.

本揭露提供之崩潰測試方法包含下列步驟:從一晶圓載台流出一電流,該晶圓載台經配置以承接一晶圓,該晶圓具有至少一電晶體;對一電感充電,該電感具有一第一端點,連接於該電晶體之一汲極;同步導通該電晶體及停止對該電感充電;以及量測通過該電晶體之一源極的電流。 The crash test method provided by the present disclosure includes the steps of: flowing a current from a wafer stage configured to receive a wafer having at least one transistor; charging an inductor, the inductor having a a first terminal connected to one of the drains of the transistor; synchronously conducting the transistor and stopping charging the inductor; and measuring a current through a source of the transistor.

上文已相當廣泛地概述本揭露之技術特徵及優點,俾使下文之本揭露詳細描述得以獲得較佳瞭解。構成本揭露之申請專利範圍標的之其它技術特徵及優點將描述於下文。本揭露所屬技術領域中具有通常知識者應瞭解,可相當容易地利用下文揭示之概念與特定實施例可作為修改或設計其它結構或製程而實現與本揭露相同之目的。本揭露所屬技術領域中具有通常知識者亦應瞭解,這類等效建構無法脫離後附之申請專利範圍所界定之本揭露的精神和範圍。 The technical features and advantages of the present disclosure have been broadly described above, and the detailed description of the present disclosure will be better understood. Other technical features and advantages of the subject matter of the claims of the present disclosure will be described below. It will be appreciated by those skilled in the art that the present invention may be practiced with the same or equivalents. It is also to be understood by those of ordinary skill in the art that this invention is not limited to the spirit and scope of the disclosure as defined by the appended claims.

電晶體之崩潰測試可在晶圓層級進行,而不是在封裝製程完成後才進行,如此可在封裝製程之前篩選出不符崩潰特性規格的電晶體並予以捨棄,進而避免增加封裝成本。然而,在晶圓層級進行電晶體崩潰測試面臨一主要缺點:由於晶圓之元件(電晶體)具有共同源極,且晶圓在係置放於晶圓載台,而晶圓載台可視為一大電容器,使得通過待測元件之電流無法流到測試機台之計量器,導致量測結果不正確。 The crash test of the transistor can be performed at the wafer level, rather than after the packaging process is completed, so that the transistor that does not conform to the crash specification can be screened and discarded before the packaging process, thereby avoiding an increase in packaging cost. However, wafer crash testing at the wafer level faces a major drawback: since the components (transistors) of the wafer have a common source and the wafer is placed on the wafer stage, the wafer stage can be considered a large The capacitor prevents the current passing through the component under test from flowing to the meter of the test machine, resulting in an incorrect measurement result.

圖1及圖2例示本發明一實施例之電晶體崩潰測試裝置10。在本揭露之一實施例中,該崩潰測試裝置10包含一晶圓載台11,經配置以承接一晶圓21,該晶圓具有複數個電晶體23;一電感31,具有一第一端點33,連接於該電晶體23之一汲極27;一電源41(例如高電壓源或高電流源),經配置以經由一開關43提供一電流至該電感31之一第二端點35;一計量器49,經配置以經由該晶圓載台11之一接觸件13連接至該電晶體23之一源極25;以及一驅動器45(例如一轉換速率之電壓驅動器),經配置以同步控制該開關43之運作及該電晶體23之運作。在本揭露之一實施例中,該崩潰測試裝置10另包含一脈衝偵測器47及一阻隔元件51,該脈衝偵測器47連接於該電晶體23之汲極27,該阻隔元件51(例如二極體)連接於該電感31之第二端點35。 1 and 2 illustrate a transistor collapse test apparatus 10 in accordance with an embodiment of the present invention. In one embodiment of the present disclosure, the crash test apparatus 10 includes a wafer stage 11 configured to receive a wafer 21 having a plurality of transistors 23; an inductor 31 having a first end point 33, connected to one of the transistor 23 of the transistor 23; a power source 41 (such as a high voltage source or a high current source), configured to provide a current through a switch 43 to a second terminal 35 of the inductor 31; A meter 49 is configured to be coupled to one of the sources 25 of the transistor 23 via a contact 13 of the wafer stage 11; and a driver 45 (eg, a slew rate voltage driver) configured for synchronous control The operation of the switch 43 and the operation of the transistor 23. In one embodiment of the present disclosure, the crash test apparatus 10 further includes a pulse detector 47 and a blocking component 51. The pulse detector 47 is connected to the drain 27 of the transistor 23, and the blocking component 51 ( For example, a diode is connected to the second terminal 35 of the inductor 31.

圖3例示本發明一實施例之電晶體崩潰測試方法的流程圖。在本揭露之一實施例中,該崩潰測試方法包含下列 步驟:從一晶圓載台流出一電流,該晶圓載台經配置以承接一晶圓,該晶圓具有至少一電晶體;對一電感充電,該電感具有一第一端點,連接於該電晶體之一汲極;同步導通該電晶體及停止對該電感充電;以及量測通過該電晶體之一源極的電流。在本揭露之一實施例中,從一晶圓載台流出一電流包含將該晶圓載台連接至一接地電位,亦即經由該晶圓載台從該晶圓之一共同源極流出電流。 3 is a flow chart showing a method of testing a cell crash according to an embodiment of the present invention. In an embodiment of the disclosure, the crash test method includes the following Step: discharging a current from a wafer stage configured to receive a wafer having at least one transistor; charging an inductor, the inductor having a first end connected to the One of the crystals is drained; the transistor is turned on synchronously and the charging of the inductor is stopped; and the current through one of the sources of the transistor is measured. In one embodiment of the present disclosure, flowing a current from a wafer stage includes connecting the wafer stage to a ground potential, that is, flowing current from a common source of the wafer via the wafer stage.

圖4例示本發明一實施例之波形圖,顯示施加於電晶體之閘極電壓波形及電感之電流波形。圖5例示本發明一實施例之波形圖,顯示電晶體之汲極電流波形及源極電流波形。如圖5及圖6所示,即使在晶圓層級進行電晶體崩潰測試,在同步導通該電晶體23及關閉該開關43(停止對該電感31充電)時,本揭露之崩潰測試裝置及崩潰測試方法可以精確地量測該電晶體23之源極25上的電流峰。 4 is a waveform diagram showing an embodiment of the present invention, showing a gate voltage waveform applied to a transistor and a current waveform of an inductor. Fig. 5 is a view showing a waveform diagram of an embodiment of the present invention, showing a drain current waveform and a source current waveform of the transistor. As shown in FIG. 5 and FIG. 6, even when the transistor collapse test is performed at the wafer level, the collapse test device and the collapse of the present disclosure are performed when the transistor 23 is turned on synchronously and the switch 43 is turned off (the charging of the inductor 31 is stopped). The test method can accurately measure the current peak on the source 25 of the transistor 23.

在習知崩潰測試架構下,該晶圓載台11係作為一大電容器,使得通過待測電晶體23之共同源極29的電流係分散於該晶圓載台11,而無法流到測試機台之計量器49,導致無法量到電流峰(如圖6所示)。相對地,本揭露之實施例經由該晶圓載台11從該晶圓21之共同源極25流出電流,並同步導通該電晶體23及關閉該開關43(停止對該電感31充電),本揭露之崩潰測試裝置及崩潰測試方法可以精確地量測該電晶體23之源極25上的電流峰。 Under the conventional crash test architecture, the wafer stage 11 serves as a large capacitor, so that the current passing through the common source 29 of the transistor 23 to be tested is dispersed on the wafer stage 11 and cannot flow to the test machine. The meter 49 causes the current peak to be lost (as shown in Figure 6). In contrast, the embodiment of the present disclosure flows current from the common source 25 of the wafer 21 via the wafer stage 11 , and simultaneously turns on the transistor 23 and turns off the switch 43 (stops charging the inductor 31 ). The crash test device and the crash test method can accurately measure the current peak on the source 25 of the transistor 23.

本揭露之技術內容及技術特點已揭示如上,然而本揭 露所屬技術領域中具有通常知識者應瞭解,在不背離後附申請專利範圍所界定之本揭露精神和範圍內,本揭露之教示及揭示可作種種之替換及修飾。例如,上文揭示之許多製程可以不同之方法實施或以其它製程予以取代,或者採用上述二種方式之組合。 The technical content and technical features of the disclosure have been disclosed above, however, this disclosure It is to be understood by those of ordinary skill in the art that the present invention may be modified and modified without departing from the spirit and scope of the disclosure. For example, many of the processes disclosed above may be implemented in different ways or in other processes, or a combination of the two.

此外,本案之權利範圍並不侷限於上文揭示之特定實施例的製程、機台、製造、物質之成份、裝置、方法或步驟。本揭露所屬技術領域中具有通常知識者應瞭解,基於本揭露教示及揭示製程、機台、製造、物質之成份、裝置、方法或步驟,無論現在已存在或日後開發者,其與本案實施例揭示者係以實質相同的方式執行實質相同的功能,而達到實質相同的結果,亦可使用於本揭露。因此,以下之申請專利範圍係用以涵蓋用以此類製程、機台、製造、物質之成份、裝置、方法或步驟。 Moreover, the scope of the present invention is not limited to the particular process, machine, manufacture, composition, means, method or method of the particular embodiments disclosed. It should be understood by those of ordinary skill in the art that, based on the teachings of the present disclosure, the process, the machine, the manufacture, the composition of the material, the device, the method, or the steps, whether present or future developers, The revealer performs substantially the same function in substantially the same manner, and achieves substantially the same result, and can also be used in the present disclosure. Accordingly, the scope of the following claims is intended to cover such <RTIgt; </ RTI> processes, machines, manufactures, compositions, devices, methods or steps.

10‧‧‧崩潰測試裝置 10‧‧‧Crash test device

11‧‧‧晶圓載台 11‧‧‧ Wafer stage

13‧‧‧接觸件 13‧‧‧Contacts

21‧‧‧晶圓 21‧‧‧ wafer

23‧‧‧電晶體 23‧‧‧Optoelectronics

25‧‧‧源極 25‧‧‧ source

27‧‧‧汲極 27‧‧‧汲polar

29‧‧‧閘極 29‧‧‧ gate

31‧‧‧電感 31‧‧‧Inductance

33‧‧‧第一端點 33‧‧‧First endpoint

35‧‧‧第二端點 35‧‧‧second endpoint

41‧‧‧電源 41‧‧‧Power supply

43‧‧‧開關 43‧‧‧Switch

45‧‧‧驅動器 45‧‧‧ drive

47‧‧‧脈衝偵測器 47‧‧‧Pulse Detector

49‧‧‧計量器 49‧‧‧meter

51‧‧‧阻隔元件 51‧‧‧Barrier components

藉由參照前述說明及下列圖式,本揭露之技術特徵及優點得以獲得完全瞭解。 The technical features and advantages of the present disclosure are fully understood by reference to the foregoing description and the accompanying drawings.

圖1及圖2例示本發明一實施例之電晶體崩潰測試裝置;圖3例示本發明一實施例之電晶體崩潰測試方法的流程圖;圖4例示本發明一實施例之波形圖,顯示施加於電晶體 之閘極電壓波形及電感之電流波形;圖5例示本發明一實施例之波形圖,顯示電晶體之汲極電流波形及源極電流波形;以及圖6例示習知崩潰測試架構下,電晶體之汲極電流波形及源極電流波形。 1 and 2 illustrate a transistor collapse test apparatus according to an embodiment of the present invention; FIG. 3 is a flow chart showing a transistor crash test method according to an embodiment of the present invention; and FIG. 4 is a waveform diagram showing an application according to an embodiment of the present invention. In the transistor The gate voltage waveform and the current waveform of the inductor; FIG. 5 illustrates a waveform diagram of an embodiment of the present invention, showing a drain current waveform and a source current waveform of the transistor; and FIG. 6 illustrates a conventional crash test architecture, the transistor The drain current waveform and the source current waveform.

10‧‧‧崩潰測試裝置 10‧‧‧Crash test device

13‧‧‧接觸件 13‧‧‧Contacts

23‧‧‧電晶體 23‧‧‧Optoelectronics

25‧‧‧源極 25‧‧‧ source

27‧‧‧汲極 27‧‧‧汲polar

29‧‧‧閘極 29‧‧‧ gate

31‧‧‧電感 31‧‧‧Inductance

33‧‧‧第一端點 33‧‧‧First endpoint

35‧‧‧第二端點 35‧‧‧second endpoint

41‧‧‧電源 41‧‧‧Power supply

43‧‧‧開關 43‧‧‧Switch

45‧‧‧驅動器 45‧‧‧ drive

47‧‧‧脈衝偵測器 47‧‧‧Pulse Detector

49‧‧‧計量器 49‧‧‧meter

51‧‧‧阻隔元件 51‧‧‧Barrier components

Claims (10)

一種崩潰測試裝置,包含:一晶圓載台,經配置以承接一晶圓,該晶圓具有至少一電晶體;一電感,具有一第一端點,連接於該電晶體之一汲極;一電源,經配置以經由一開關提供一電流至該電感之一第二端點;一計量器,經配置以經由該晶圓載台連接至該電晶體之一源極;以及一驅動器,經配置以同步控制該開關之運作及該電晶體之運作。 A crash test apparatus comprising: a wafer stage configured to receive a wafer having at least one transistor; an inductor having a first end connected to one of the gates of the transistor; a power supply configured to provide a current to a second end of the inductor via a switch; a meter configured to connect to a source of the transistor via the wafer stage; and a driver configured to The operation of the switch and the operation of the transistor are synchronously controlled. 如請求項1所述之崩潰測試裝置,其另包含一脈衝偵測器,連接於該電晶體之汲極。 The crash test device of claim 1, further comprising a pulse detector coupled to the drain of the transistor. 如請求項1所述之崩潰測試裝置,其中該計量器係連接於該晶圓之一共同源極。 The crash test apparatus of claim 1, wherein the gauge is coupled to a common source of the wafer. 如請求項1所述之崩潰測試裝置,其另包含一阻隔元件,連接於該電感之第二端點。 The crash test device of claim 1 further comprising a blocking element coupled to the second end of the inductor. 如請求項4所述之崩潰測試裝置,其中該阻隔元件包含一二極體。 The crash test device of claim 4, wherein the barrier element comprises a diode. 如請求項1所述之崩潰測試裝置,其中該計量器係一電流計。 The crash test apparatus of claim 1, wherein the gauge is an ammeter. 一種崩潰測試方法,包含下列步驟:從一晶圓載台流出一電流,該晶圓載台經配置以承接一晶圓,該晶圓具有至少一電晶體; 對一電感充電,該電感具有一第一端點,連接於該電晶體之一汲極;同步導通該電晶體及停止對該電感充電;以及量測通過該電晶體之一源極的電流。 A crash test method comprising the steps of: flowing a current from a wafer stage, the wafer stage configured to receive a wafer having at least one transistor; Charging an inductor having a first terminal connected to one of the drains of the transistor; synchronously conducting the transistor and stopping charging the inductor; and measuring a current through a source of the transistor. 如請求項7所述之崩潰測試裝置,其中一電源經由一開關對該電感充電。 The crash test apparatus of claim 7, wherein a power source charges the inductor via a switch. 如請求項8所述之崩潰測試裝置,其中導通該電晶體及關閉該開關係同步進行。 The crash test apparatus of claim 8, wherein the turning on the transistor and turning off the open relationship are performed synchronously. 如請求項7所述之崩潰測試裝置,其中從一晶圓載台流出一電流包含將該晶圓載台連接至一接地電位。 The crash test apparatus of claim 7, wherein flowing a current from a wafer stage comprises connecting the wafer stage to a ground potential.
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