TW201328832A - Manual fine-tuning deflecting stage device - Google Patents

Manual fine-tuning deflecting stage device Download PDF

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Publication number
TW201328832A
TW201328832A TW101101332A TW101101332A TW201328832A TW 201328832 A TW201328832 A TW 201328832A TW 101101332 A TW101101332 A TW 101101332A TW 101101332 A TW101101332 A TW 101101332A TW 201328832 A TW201328832 A TW 201328832A
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Taiwan
Prior art keywords
guide rail
base
curved guide
arc
seat
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TW101101332A
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Chinese (zh)
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TWI408032B (en
Inventor
Yu-Ying Qiu
jia-hao Fan
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Chiuan Yan Technology Co Ltd
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Priority to TW101101332A priority Critical patent/TW201328832A/en
Publication of TW201328832A publication Critical patent/TW201328832A/en
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Publication of TWI408032B publication Critical patent/TWI408032B/zh

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Abstract

The present invention provides a manual fine-tuning deflecting stage device, which comprises a base; an adjustment unit configured on one side of the base; a deflecting table having a pushing portion on an outer side and the pushing portion is located between a rotating grip of the adjustment unit and an elastic column; at least a first arc-shaped guide rail secured on the base; at least a second arc-shaped guide rail secured on the step-like convex surface of the deflecting table; and, at least an arc-shaped keeper slidingly connected between the first arc-shaped guide rail and the second arc-shaped guide rail for enabling the first arc-shaped guide rail conducting an arc-shaped deflecting slide relative to the second arc-shaped guide rail. When the rotating grip is moved toward a pushing position to push the pushing portion of the deflecting table, the elastic column will be retracted to enable the deflecting table for arc-shaped deflecting within a predetermined angle. When the rotating grip is moved toward a retracting position, the elastic column will push the pushing portion back by its elastic force.

Description

手動微調偏擺平台裝置Manually fine-tuning the yaw platform device

本發明係關於一種手動微調平台裝置,特別是指一種手動微調偏擺平台裝置。The present invention relates to a manual fine-tuning platform device, and more particularly to a manual fine-tuning yaw platform device.

按,習知之手動微調平台裝置被廣泛地運用於各種自動化精密加工之定位、加工與測試場合上,並能搭配各種光學元件或檢測儀器,以能夠進行高精密度的量測或檢驗作業。According to the conventional manual fine-tuning platform device, it is widely used in the positioning, processing and testing of various automated precision machining, and can be combined with various optical components or testing instruments to enable high-precision measurement or inspection work.

惟,目前常見之手動微調平台裝置,如我國申請案第I340686號之構造,其主要係於一基座與一滑座間設置一彈性元件,以由基座上之一轉柄加以進給推動該滑座沿該基座進行直線位移,當該轉柄退回時則由該彈性元件將該滑座加以拉回至原有位置。However, the conventional manual fine-tuning platform device, such as the construction of the application No. I340686, is mainly provided with a resilient element between a base and a sliding seat for feeding by a handle on the base. The carriage is linearly displaced along the base, and when the handle is retracted, the slider is pulled back to the original position by the elastic member.

然而,上述習知之手動微調平台裝置,由於受限於須在該基座與滑座間設置彈性元件(該彈性元件一般為拉伸彈簧或壓縮彈簧),因此基座與滑座組合後之體積較大、較厚,難以運用於現今高精密之產業上。況且,由於習知之手動微調平台裝置僅能進行直線位置之移動微調,而有無法滿足各種微調方式之需求。However, the conventional manual fine-tuning platform device is limited in that the elastic member is generally disposed between the base and the sliding seat (the elastic member is generally a tension spring or a compression spring), so that the volume of the base and the sliding seat is combined. Large and thick, it is difficult to apply to today's high-precision industries. Moreover, since the conventional manual fine-tuning platform device can only perform fine-tuning of the linear position, there is a need to satisfy various fine-tuning methods.

由此可見,上述習用物品仍有諸多缺失,實非一良善之設計者,而亟待加以改良。It can be seen that there are still many shortcomings in the above-mentioned household items, which is not a good designer and needs to be improved.

本案發明人鑑於上述習用手動微調偏擺平台裝置所衍生的各項缺點,乃亟思加以改良創新,並經多年苦心孤詣潛心研究後,終於成功研發完成本件手動微調偏擺平台裝置。In view of the above-mentioned shortcomings caused by the manual fine-tuning of the yaw platform device, the inventor of the present invention has improved and innovated, and after years of painstaking research, finally successfully developed and completed the manual fine-tuning yaw platform device.

本發明之目的即在於提供一種手動微調偏擺平台裝置,其體積較小、厚度較薄、適用性較佳者。It is an object of the present invention to provide a manual fine-tuning yaw platform device which is small in size, thin in thickness, and has good applicability.

本發明之次一目的係在於提供一種手動微調偏擺平台裝置,係能進行偏擺之微調者。A second object of the present invention is to provide a manual fine-tuning yaw platform device that is capable of fine-tuning a yaw.

可達成上述發明目的之手動微調偏擺平台裝置,包括有:一基座,具有至少二階級狀凸面;一調整單元,具有一設置於該基座一側之連結座、一設置於該連結座上之轉柄及一設置於該連結座上之彈性柱,該轉柄可受外力作用而沿直線於一推動位置至一退回位置間進行往復位移,該彈性柱具備預定之彈力;一擺座,一外側上具有一推動部,該推動部係位於該轉柄與該彈性柱之間,且該擺座具有至少二階級狀凸起面;至少一第一弧形導軌,係固設於該基座之階級狀凸面上;至少一第二弧形導軌,係固設於該擺座之階級狀凸起面上;至少一弧形保持器,係滑接於該第一弧形導軌與該第二弧形導軌間,以使該第一弧形導軌可相對該第二弧形導軌進行弧狀之偏擺滑動;當該轉柄往推動位置移動而推動該擺座之推動部時,該彈性柱係縮回,而使該擺座於一預定之角度內進行弧狀偏擺,當該轉柄往退回位置移動時,該彈性柱由其彈力將該推動部加以推回。The manual fine-tuning yaw platform device capable of achieving the above object includes: a base having at least two-stage convex surface; an adjusting unit having a connecting seat disposed on one side of the base, and a connecting seat disposed on the connecting seat The upper rotating handle and an elastic column disposed on the connecting seat, the rotating handle can be reciprocally displaced by a force acting along a straight line from a pushing position to a retracted position, the elastic column having a predetermined elastic force; An outer side has a pushing portion, the pushing portion is located between the rotating handle and the elastic column, and the swinging seat has at least two-stage convex surface; at least one first curved guide rail is fixed on the a stepped convex surface of the base; at least one second curved guide rail is fixed on the stepped convex surface of the swing seat; at least one curved retainer is slidably coupled to the first curved guide rail and the Between the second curved guide rails, the first curved guide rail can be slidably bent relative to the second curved guide rail; when the rotary handle moves to the pushing position to push the pushing portion of the swinging seat, the The elastic column is retracted, and the seat is placed in a predetermined The arcuate yaw angle, when the crown moves to the retracted position, by the elastic force of the column to be pushed back by the pushing portion.

請參閱圖1至圖6,本發明所提供之手動微調偏擺平台裝置,主要包括有:一基座1、一調整單元2、一擺座3、二第一弧形導軌4、二第二弧形導軌5及二弧形保持器6。Referring to FIG. 1 to FIG. 6 , the manual fine-tuning yaw platform device provided by the present invention mainly includes: a base 1, an adjusting unit 2, a swinging seat 3, two first curved guide rails 4, and a second Curved guide rail 5 and two curved retainers 6.

該基座1概呈一矩形體,其中間部位凸伸形成一防撓肋11,該防撓肋11使基座1結構更堅強,並對基座1結構減少彎曲變形所做的強化結構,該基座於防撓肋11相對二側面設置一弧狀凹陷面12,各該弧狀凹陷面12係具有一階級狀凸面13。The base 1 has a rectangular body, and a middle portion thereof protrudes to form a flexible rib 11 which makes the structure of the base 1 stronger and strengthens the structure of the base 1 to reduce bending deformation. The base is provided with an arc-shaped recessed surface 12 on opposite sides of the flexible rib 11 , and each of the arc-shaped recessed surfaces 12 has a step-like convex surface 13 .

該調整單元2具有一連結座21、一轉柄22及一彈性柱23;該連結座21概呈一ㄇ字形體,具有一基部211及二容置部212,該基部211係連結於該基座1之一角落之外側緣上,該二容置部212則分別一體連結而同向凸伸於該基部211之二端位置上,該轉柄22係設置於其一容置部212上,該彈性柱23則設置於另一容置部212上,該轉柄22可受外力作用而沿一直線進行於一推動位置至一退回位置間之往復位移,進而靠近該彈性柱23或遠離該彈性柱23,該彈性柱23具備預定之彈力,使該彈性柱23於未受外力作用時,該彈性柱23係往該轉柄22之方向伸出。The adjusting unit 2 has a connecting seat 21, a rotating handle 22 and an elastic column 23; the connecting seat 21 has a U-shaped body, and has a base portion 211 and two receiving portions 212. The base portion 211 is coupled to the base portion 211. The two accommodating portions 212 are integrally coupled to the two ends of the base portion 211, and the rotating handle 22 is disposed on a receiving portion 212 thereof. The elastic column 23 is disposed on the other receiving portion 212. The rotating handle 22 can be reciprocally displaced from a pushing position to a retracted position by an external force, thereby approaching the elastic column 23 or away from the elasticity. The column 23 has a predetermined elastic force such that the elastic column 23 projects in the direction of the rotating handle 22 when the elastic column 23 is not subjected to an external force.

該擺座3概呈一矩形體,該擺座3之二端面係分別向下延伸形成二補強肋31,該二補強肋31之間設置一弧狀凸起面32,該弧狀凸起面32鄰近二補強肋31係具有一階級狀凸起面33,另該擺座3之一外側緣上並具有一推動部34。The shank 3 has a rectangular body, and the two end faces of the shank 3 are respectively extended downward to form two reinforcing ribs 31. An arc-shaped convex surface 32 is disposed between the two reinforcing ribs 31. The adjacent two reinforcing ribs 31 have a stepped convex surface 33, and the outer side of one of the swing seats 3 has a pushing portion 34.

該各第一弧形導軌4長邊呈一長條弧狀體,而短邊成一矩形,該各第一弧形導軌4係分別以底面固接於該基座1之階級狀凸面13上,且該各第一弧形導軌4一側形成有一第一錐槽41。Each of the first curved guide rails 4 has a long arc-shaped body, and the short sides are formed into a rectangular shape. The first curved guide rails 4 are respectively fixed to the stepped convex surface 13 of the base 1 by the bottom surface. A first tapered groove 41 is formed on one side of each of the first curved guide rails 4.

該各第二弧形導軌5長邊呈一長條弧狀體,而短邊成一矩形,該各第二弧形導軌5係分別以頂面固接於該擺座3之階級狀凸起面33上,且該各第二弧形導軌5之一側形成有一第二錐槽51,且該第二弧形導軌5係與該第一弧形導軌4呈交錯併接設置。當第二弧形導軌5係與第一弧形導軌4組合後,第一弧形導軌4與擺座3的弧狀凸起面32保持一間距,而第二弧形導軌5與基座1的弧狀凹陷面12保持一間距。使該第一弧形導軌4與該第二弧形導軌5相對移動時,該第一弧形導軌4不會與該擺座3接觸摩擦,而該第二弧形導軌5不會與該基座1接觸摩擦,如此設計才能排除基座1與擺座3的干涉現象。Each of the second curved guide rails 5 has a long arc-shaped body, and the short sides are formed into a rectangular shape. The second curved guide rails 5 are respectively fixed to the stepped convex surface of the swing seat 3 by the top surface. A second tapered groove 51 is formed on one side of each of the second curved guide rails 5, and the second curved guide rail 5 is disposed in a staggered manner with the first curved guide rail 4. When the second curved guide rail 5 is combined with the first curved guide rail 4, the first curved guide rail 4 maintains a distance from the arcuate convex surface 32 of the swing seat 3, and the second curved guide rail 5 and the base 1 The arcuate concave faces 12 maintain a spacing. When the first curved guide rail 4 and the second curved guide rail 5 are relatively moved, the first curved guide rail 4 does not contact the friction seat 3, and the second curved guide rail 5 does not cooperate with the base. The seat 1 is in contact with the friction, so that the interference between the base 1 and the seat 3 can be eliminated.

該包含交叉滾子的弧形保持器6係設置於該第一弧形導軌4與該第二弧形導軌5間,即該各弧形保持器6係滑接於該第一弧形導軌4與該第二弧形導軌5之第一、二錐槽41、51間,使該第一弧形導軌4與該第二弧形導軌5可藉由該弧形保持器6而相互滑移,且當該第一弧形導軌4與該第二弧形導軌5滑接後,該擺座3之推動部34係位於該轉柄22與該彈性柱23之間。The curved retainer 6 including the cross-roller is disposed between the first curved guide rail 4 and the second curved guide rail 5, that is, the curved retainers 6 are slidably coupled to the first curved guide rail 4 Between the first and second tapered grooves 41 and 51 of the second curved guide rail 5, the first curved guide rail 4 and the second curved guide rail 5 can be mutually slid by the curved retainer 6. After the first curved guide rail 4 is slidably connected to the second curved guide rail 5, the pushing portion 34 of the swing seat 3 is located between the rotating handle 22 and the elastic column 23.

是以,上述即為本發明所提供一較佳實施例之手動微調偏擺平台裝置的各部構件及其組裝方式之介紹,接著再將其使用特點介紹如下:首先,該基座1可連接於一固定床台(圖中未示)上,而該擺座3則可供一感測元件(圖中未示)固定於上,當該轉柄22未受外力作用時(如圖1所示),該轉柄22之一端係抵接於該擺座3之推動部34一側上,而該彈性柱23之一端則抵接於該推動部34之另一側上,且該擺座3與該基座1間係呈平齊之狀態。Therefore, the above is the introduction of the components of the manual fine-tuning yaw platform device and the assembly manner thereof according to a preferred embodiment of the present invention, and then the use characteristics thereof are as follows: First, the pedestal 1 can be connected to a fixed bed (not shown), and the seat 3 is fixed to a sensing component (not shown) when the handle 22 is not subjected to an external force (as shown in FIG. 1). One end of the rotating handle 22 abuts on the side of the pushing portion 34 of the swing seat 3, and one end of the elastic column 23 abuts on the other side of the pushing portion 34, and the swing seat 3 It is flush with the susceptor 1.

當使用者欲調整該擺座3之偏擺角度時,如圖4至圖6所示,操作者則可施力轉動該轉柄22以由該轉柄22往該推動位置移動,進而推動該擺座3之推動部34,使該擺座3能藉由該第一、二弧形導軌4、5間之弧形保持器6而相對該基座1進行預定角度內之弧線偏擺,以達到將固定床台、感測元件加以偏擺之功效。When the user wants to adjust the yaw angle of the swing seat 3, as shown in FIG. 4 to FIG. 6, the operator can force the rotary handle 22 to move from the rotary handle 22 to the push position, thereby pushing the handle. The pushing portion 34 of the swinging seat 3 enables the swinging seat 3 to be yawed within a predetermined angle with respect to the base 1 by the curved retainer 6 between the first and second curved guide rails 4, 5 It achieves the effect of yaw the fixed bed and sensing components.

當欲將該擺座3調整回與基座1呈平齊之狀態時,則由操作者將該轉柄22往退回位置加以旋回移動,以由該彈性柱23之彈力推動於該擺座3之推動部34上,而能將該擺座3偏擺回與基座1呈平齊之狀態。When the swinging seat 3 is to be adjusted to be flush with the base 1, the operator rotates the rotary handle 22 to the retracted position to be pushed by the elastic force of the elastic column 23 to the swing seat 3. The urging portion 34 is biased back to the susceptor 1 in a state of being flushed back.

本發明所提供之手動微調偏擺平台裝置,與其他習用技術相互比較時,更具有下列之優點:由於本發明可進行偏擺角度之調整,因此可運用於需進行偏擺調整之高精密加工機上,以達適用性較佳之功效。況且,由於本發明係將用以推回擺座之彈性柱設置於該基座之外部,因此無需於基座與擺座間設置彈力元件,而可大幅降低本發明整體之厚度,以能適用於更為廣泛之領域中。The manual fine-tuning yaw platform device provided by the invention has the following advantages when compared with other conventional technologies: since the invention can adjust the yaw angle, it can be applied to high-precision machining requiring yaw adjustment. On the machine, to achieve better applicability. Moreover, since the elastic column for pushing back the seat is disposed outside the base, the elastic member is not required to be disposed between the base and the seat, and the overall thickness of the present invention can be greatly reduced to be applicable to In a wider field.

上列詳細說明係針對本發明之一可行實施例之具體說明,惟該實施例並非用以限制本發明之專利範圍,凡未脫離本發明技藝精神所為之等效實施或變更,均應包含於本案之專利範圍中。The detailed description of the preferred embodiments of the present invention is intended to be limited to the scope of the invention, and is not intended to limit the scope of the invention. The patent scope of this case.

綜上所述,本案不但在空間型態上確屬創新,並能較習用物品增進上述多項功效,應已充分符合新穎性及進步性之法定發明專利要件,爰依法提出申請,懇請 貴局核准本件發明專利申請案,以勵發明,至感德便。In summary, this case is not only innovative in terms of space type, but also can enhance the above-mentioned multiple functions compared with the customary items. It should fully meet the statutory invention patent requirements of novelty and progressiveness, and apply for it according to law. This invention patent application, in order to invent invention, to the sense of virtue.

1...基座1. . . Pedestal

11...防撓肋11. . . Tipping rib

12...弧狀凹陷面12. . . Arc-shaped concave surface

13...階級狀凸面13. . . Class convex

2...調整單元2. . . Adjustment unit

21...連結座twenty one. . . Link

211...基部211. . . Base

212...容置部212. . . Housing

22...轉柄twenty two. . . Rotary handle

23...彈性柱twenty three. . . Elastic column

3...擺座3. . . Seat

31...補強肋31. . . Reinforcing rib

32...弧狀凸起面32. . . Curved convex surface

33...階級狀凸起面33. . . Class convex surface

34...推動部34. . . Promotion department

4...第一弧形導軌4. . . First curved guide

41...第一錐槽41. . . First cone

5...第二弧形導軌5. . . Second curved guide

51...第二錐槽51. . . Second cone

6...弧形保持器6. . . Curved retainer

圖1為本發明手動微調偏擺平台裝置之立體組合圖;1 is a perspective assembled view of a manual fine-tuning yaw platform device of the present invention;

圖2為該手動微調偏擺平台裝置之立體分解圖;2 is an exploded perspective view of the manual fine-tuning yaw platform device;

圖3為該手動微調偏擺平台裝置之剖視圖;Figure 3 is a cross-sectional view of the manual fine-tuning yaw platform device;

圖4為該手動微調偏擺平台裝置之立體作動示意圖;4 is a schematic diagram of the three-dimensional operation of the manual fine-tuning yaw platform device;

圖5為該手動微調偏擺平台裝置之頂視作動示意圖;以及Figure 5 is a schematic view showing the top view of the manual fine-tuning yaw platform device;

圖6為該手動微調偏擺平台裝置之側視作動示意圖。Figure 6 is a side elevational view of the manual fine-tuning yaw platform device.

1...基座1. . . Pedestal

11...防撓肋11. . . Tipping rib

12...弧狀凹陷面12. . . Arc-shaped concave surface

13...階級狀凸面13. . . Class convex

2...調整單元2. . . Adjustment unit

21...連結座twenty one. . . Link

211...基部211. . . Base

212...容置部212. . . Housing

22...轉柄twenty two. . . Rotary handle

23...彈性柱twenty three. . . Elastic column

3...擺座3. . . Seat

31...補強肋31. . . Reinforcing rib

32...弧狀凸起面32. . . Curved convex surface

33...階級狀凸起面33. . . Class convex surface

34...推動部34. . . Promotion department

4...第一弧形導軌4. . . First curved guide

41...第一錐槽41. . . First cone

5...第二弧形導軌5. . . Second curved guide

51...第二錐槽51. . . Second cone

6...弧形保持器6. . . Curved retainer

Claims (5)

一種手動微調偏擺平台裝置,包括:一基座,具有至少一階級狀凸面;一調整單元,具有一設置於該基座一側之連結座、一設置於該連結座上之轉柄及一設置於該連結座上之彈性柱,該轉柄可受外力作用而沿直線於一推動位置至一退回位置間進行往復位移,該彈性柱具備預定之彈力;一擺座,一外側上具有一推動部,該推動部係位於該轉柄與該彈性柱之間,且該擺座具有至少一階級狀凸起面;至少一第一弧形導軌,係固設於該基座之階級狀凸面上;至少一第二弧形導軌,係固設於該擺座之階級狀凸起面上;至少一弧形保持器,係滑接於該第一弧形導軌與該第二弧形導軌間,以使該第一弧形導軌可相對該第二弧形導軌進行弧狀之偏擺滑動。A manual fine-tuning yaw platform device includes: a base having at least one step-like convex surface; and an adjusting unit having a connecting seat disposed on one side of the base, a rotating handle disposed on the connecting seat, and a An elastic column disposed on the connecting seat, the rotating handle is reciprocally displaced by a force acting along a straight line from a pushing position to a retracted position, the elastic column having a predetermined elastic force; and a swing seat having an outer side a pushing portion, the pushing portion is located between the rotating handle and the elastic column, and the swinging seat has at least one step-shaped convex surface; at least one first curved guiding rail is fixed on the stepped convex surface of the base At least one second curved guide rail is fixed on the stepped convex surface of the swing seat; at least one curved retainer is slidably connected between the first curved guide rail and the second curved guide rail So that the first curved guide rail can be arcuately slid relative to the second curved guide rail. 如申請專利範圍第1項所述之手動微調偏擺平台裝置,其中該基座其中間部位凸伸形成一防撓肋,該防撓肋使基座結構更堅強,並對基座結構減少彎曲變形所做的強化結構,該基座於防撓肋相對二側面設置一弧狀凹陷面,各該弧狀凹陷面係具有一階級狀凸面。The manual fine-tuning yaw platform device according to claim 1 , wherein a central portion of the base protrudes to form a flexible rib, the rib structure makes the pedestal structure stronger, and the base structure is reduced in bending. The reinforcing structure is formed by deforming, and the base is provided with an arc-shaped concave surface on opposite sides of the flexible rib, and each of the arc-shaped concave surfaces has a class-like convex surface. 如申請專利範圍第1項所述之手動微調偏擺平台裝置,其中該擺座之二端面係分別向下延伸形成二補強肋,該二補強肋之間設置一弧狀凸起面,該弧狀凸起面鄰近二補強肋係具有一階級狀凸起面。As described in item a manual fine range patent yaw platform means, wherein the two end faces of the holder extends downwardly two lines were placed reinforcing rib is provided between a convex face of the two arc-shaped reinforcing rib, the arc The convex surface adjacent to the two reinforcing ribs has a class-like convex surface. 如申請專利範圍第23項所述之手動微調偏擺平台裝置,其中該當第二弧形導軌係與第一弧形導軌組合後,第一弧形導軌與擺座的弧狀凸起面保持一間距,而第二弧形導軌與基座的弧狀凹陷面保持一間距,使該第一弧形導軌與該第二弧形導軌相對移動時,該第一弧形導軌不會與該擺座接觸摩擦,而該第二弧形導軌不會與該基座接觸摩擦。The range of the patent 2 or 3 of the manual yaw trimming device platform, wherein the second arcuate should first arcuate guide rail system in combination with a first arcuate surface of the arcuate guide projections and the swing seat Maintaining a distance, and the second curved guide rail is spaced apart from the arcuate concave surface of the base, and the first curved guide rail does not move relative to the second curved guide rail when the first curved guide rail moves relative to the second curved guide rail The seat is in contact with the friction, and the second curved rail does not rub against the base. 如申請專利範圍第1項所述之手動微調偏擺平台裝置,其中該當該轉柄往推動位置移動而推動該擺座之推動部時,該彈性柱係縮回,而使該擺座於一預定之角度內進行弧狀偏擺,當該轉柄往退回位置移動時,該彈性柱由其彈力將該推動部加以推回。The manual fine-tuning yaw platform device according to claim 1 , wherein the elastic column is retracted when the rotating handle is moved to the pushing position to push the pushing portion of the seat, and the seat is retracted The arcing yaw is performed within a predetermined angle, and when the shank moves toward the retracted position, the elastic column is pushed back by the elastic force by the elastic force.
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CN104128647B (en) * 2014-07-18 2017-01-11 首钢总公司 Apparatus and method for processing workpiece arc surface on vertical elevating milling machine
CN107511803A (en) * 2016-06-16 2017-12-26 高明铁企业股份有限公司 Has the accurate slide unit of angle regulation function
CN107443328A (en) * 2017-09-13 2017-12-08 苏州迈客荣自动化技术有限公司 A kind of microcosmic detection micromotion platform
CN107855794A (en) * 2017-11-17 2018-03-30 鹤山市信佳自动化机械设备有限公司 A kind of adjustable angle mould
CN110524496A (en) * 2019-09-12 2019-12-03 深圳市长盛迅兴精密组件有限公司 A kind of fast regulating tooling auxiliary tool
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