TW201333661A - Fine-tuned shift measurement platform device - Google Patents

Fine-tuned shift measurement platform device Download PDF

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Publication number
TW201333661A
TW201333661A TW101103871A TW101103871A TW201333661A TW 201333661 A TW201333661 A TW 201333661A TW 101103871 A TW101103871 A TW 101103871A TW 101103871 A TW101103871 A TW 101103871A TW 201333661 A TW201333661 A TW 201333661A
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Taiwan
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slider
offset
base
seat
platform device
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TW101103871A
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Chinese (zh)
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TWI459177B (en
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Yu-Ying Qiu
jia-hao Fan
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Chiuan Yan Technology Co Ltd
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Priority to TW101103871A priority Critical patent/TW201333661A/en
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Publication of TWI459177B publication Critical patent/TWI459177B/zh

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Abstract

A fine-tuned shift measurement platform device comprises a base, an adjustment unit disposed in the base, a shift base with a push part below its center in such a way that the push part is located between the manual rotary shaft and an elastic column of the adjustment unit, at least one first slide block fixed on the base, at least one second slide block fixed on the slide slot of the shift base, and at least one slide connection member in slidable connection between the first and second slide blocks, such that the first slide block can perform linear shift sliding relative to the second slide block. When the manual rotary shaft is moved toward a push position to push the push part of the shift base, the elastic column is retreated to allow the shift base to perform linear shift within a predetermined distance; when the manual rotary shaft is moved toward a retreat position, the elastic column can push the push part back to its position by its resilience.

Description

微調偏移量測平台裝置Fine adjustment offset measuring platform device

本發明係關於一種手動微調平台裝置,特別是指一種微調偏移量測平台裝置。The present invention relates to a manual fine adjustment platform device, and more particularly to a fine adjustment offset measurement platform device.

按,習知之手動微調平台裝置被廣泛地運用於各種自動化精密加工之定位、加工與測試場合上,並能搭配各種光學元件或檢測儀器,以能夠進行高精密度的量測或檢驗作業。According to the conventional manual fine-tuning platform device, it is widely used in the positioning, processing and testing of various automated precision machining, and can be combined with various optical components or testing instruments to enable high-precision measurement or inspection work.

目前常見之手動微調平台裝置,既有的單軸式手動微調平台,其主要係於一基座與一滑座間設置一彈性元件,以由基座上之一轉柄加以進給推動該滑座沿該基座進行直線位移,當該轉柄退回時則由該彈性元件將該滑座加以拉回至原有位置。The conventional manual fine-tuning platform device, the existing single-axis manual fine-tuning platform, is mainly provided with a resilient element between a base and a sliding seat for pushing the sliding seat by one of the rotating handles on the base. A linear displacement is performed along the base, and the slider is pulled back to the original position by the elastic member when the handle is retracted.

惟,上述習知之手動微調平台裝置,由於受限於須在該基座與滑座間設置彈性元件(該彈性元件一般為拉伸彈簧或壓縮彈簧),因此基座與滑座組合後之體積較大、較厚,難以運用於現今高精密之產業上。However, the conventional manual fine-tuning platform device is limited in that the elastic member is generally disposed between the base and the sliding seat (the elastic member is generally a tension spring or a compression spring), so that the volume of the base and the sliding seat is combined. Large and thick, it is difficult to apply to today's high-precision industries.

本案發明人鑑於上述習用手動微調平台裝置所衍生的各項缺點,乃亟思加以改良創新,並經多年苦心孤詣潛心研究後,終於成功研發完成本件微調偏移量測平台裝置。In view of the above-mentioned shortcomings derived from the above-mentioned conventional manual fine-tuning platform device, the inventor of the present invention has improved and innovated, and after years of painstaking research, finally successfully developed and completed the fine-tuning offset measurement platform device.

本發明之目的即在於提供一種微調偏移量測平台裝置,其體積較小、厚度較薄、適用性較佳者。It is an object of the present invention to provide a fine adjustment offset measuring platform device which is small in size, thin in thickness, and has good applicability.

本發明之次一目的係在於提供一種微調偏移量測平台裝置,係能進行偏移之微調者。A second object of the present invention is to provide a fine-tuning offset measurement platform device that is capable of fine-tuning the offset.

可達成上述發明目的之微調偏移量測平台裝置,包括有:一基座,具有至少一長條型凹陷區,該長條型凹陷區係具有一階梯狀凸面,且該基座中央處形成一具有容置區之凸肋;一調整單元,其設置於基座內部,具有一設置於基座上之手動轉柄及一設置於基座上之彈性柱,該手動轉柄可受外力作用而沿直線於一推動位置至一退回位置間進行往復位移,該彈性柱具備預定之彈力;一偏移座,兩側端面向下形成滑槽,該滑槽可對應基座之凸肋,使偏移座得以平移於基座,而偏移座兩側端面各設有一階級狀凸起面,且滑槽底面設置一推動部;至少一第一滑塊,係固設於該基座之階梯狀凸面上;至少一第二滑塊,係固設於該偏移座之階級狀凸起面上;至少一滑動件,係滑接於該第一滑塊與該第二滑塊間,以使該第一滑塊可相對該第二滑塊進行線性之偏移滑動;當該手動轉柄往推動位置移動而推動該偏移座之推動部時,該彈性柱係縮回,而使該偏移座於一有限距離內進行線性偏移,當該手動轉柄往退回位置移動時,該彈性柱由其彈力將該推動部加以推回。The fine-tuning offset measuring platform device capable of achieving the above object includes: a base having at least one elongated recessed region, the elongated recessed region having a stepped convex surface, and the central portion of the base is formed a rib having a receiving area; an adjusting unit disposed inside the base, having a manual rotating handle disposed on the base and an elastic column disposed on the base, the manual rotating handle being externally acted And reciprocating displacement along a straight line from a pushing position to a retracting position, the elastic column has a predetermined elastic force; and an offset seat, the end faces of the two sides form a sliding groove downward, and the sliding groove can correspond to the rib of the base, so that The offset seat is translated to the base, and the two end faces of the offset seat are respectively provided with a step-like convex surface, and a bottom portion of the sliding groove is provided with a pushing portion; at least one first sliding block is fixed on the step of the base At least one second slider is fixed on the stepped convex surface of the offset seat; at least one sliding member is slidably connected between the first slider and the second slider to Having the first slider be linearly offset from the second slider When the manual rotary handle moves to the pushing position to push the pushing portion of the offset seat, the elastic column is retracted, and the offset seat is linearly offset within a limited distance, and when the manual rotating handle is returned When the position is moved, the elastic column is pushed back by the elastic force by its elastic force.

請參閱圖1至圖2,本發明所提供之微調偏移量測平台裝置,主要包括有:一基座1、一調整單元2、一偏移座3、二第一滑塊4、二第二滑塊5及二滑動件6。Referring to FIG. 1 to FIG. 2 , the fine adjustment offset measurement platform device provided by the present invention mainly includes: a base 1, an adjustment unit 2, an offset seat 3, two first sliders 4, and a second Two sliders 5 and two sliders 6.

該基座1,概呈一矩形板體,該基座1之頂面上具有二相隔預定間距之長條型凹陷區11,各長條型凹陷區11係具有一階梯狀凸面12,而於該基座1中央處形成一具有容置區14之凸肋13。The base 1 has a rectangular plate body, and the top surface of the base 1 has two elongated recessed regions 11 spaced apart by a predetermined interval, and each of the elongated recessed regions 11 has a stepped convex surface 12, and A rib 13 having a receiving area 14 is formed at the center of the base 1.

該調整單元2,一手動轉柄21及一彈性柱22;該手動轉柄21係設置於其基座1內,該彈性柱22則設置於基座1內相較於手動轉柄21之另一面,該手動轉柄21可受外力作用而沿一直線進行於一推動位置至一退回位置間之往復位移,進而靠近該彈性柱22或遠離該彈性柱22,該彈性柱22具備預定之彈力,使該彈性柱22於未受外力作用時,該彈性柱22係往該手動轉柄21之方向伸出。The adjusting unit 2 is a manual rotating handle 21 and an elastic column 22; the manual rotating handle 21 is disposed in the base 1 thereof, and the elastic column 22 is disposed in the base 1 compared with the manual rotating handle 21 On one side, the manual rotating handle 21 can be subjected to an external force to perform a reciprocating displacement between a pushing position and a retracting position along a straight line, thereby approaching the elastic column 22 or away from the elastic column 22, and the elastic column 22 has a predetermined elastic force. When the elastic column 22 is not subjected to an external force, the elastic column 22 projects in the direction of the manual handle 21.

該偏移座3,概呈一矩形板體,該偏移座之兩側端面向下形成滑槽31,該滑槽可對應基座1之凸肋13,使偏移座3得以平移於基座1,請參考圖3及圖4,該偏移座3兩側端面各設有一階級狀凸起面32,並且滑槽31底面設置一推動部33,該推動部33對應基座1之容置區13之位置,因此,當偏移座3組裝於基座1時,該推動部33即可嵌入基座1之容置區13。The offset seat 3 has a rectangular plate body, and the end faces of the offset seat form a sliding slot 31 downwardly, and the sliding slot can correspond to the rib 13 of the base 1 to allow the offset seat 3 to translate to the base. For the seat 1, please refer to FIG. 3 and FIG. 4 , a stepped convex surface 32 is disposed on each of the two end faces of the offset seat 3 , and a pushing portion 33 is disposed on the bottom surface of the sliding slot 31 , and the pushing portion 33 corresponds to the base 1 . The position of the area 13 is set. Therefore, when the offset seat 3 is assembled to the base 1, the pushing portion 33 can be embedded in the accommodating area 13 of the base 1.

請參閱圖2至圖4,該各第一滑塊4,呈一長直矩形之長條狀體,該各第一滑塊4係分別以其一側面固接於該基座1之階梯狀凸面12上,且該各第一滑塊4一側形成有一第一錐槽41。Referring to FIG. 2 to FIG. 4 , each of the first sliders 4 has a long strip-shaped rectangular body, and each of the first sliders 4 is fixed to the base 1 by a side surface thereof. A first tapered groove 41 is formed on the convex surface 12 and on the side of each of the first sliders 4.

請參閱圖2至圖4,該各第二滑塊5,呈一長直矩形之長條狀體,該各第二滑塊5係分別以其一側面固接於該偏移座3之階級狀凸起面32上,且該各第二滑塊5之一側形成有一第二錐槽51,且該第二滑塊5係與該第一滑塊4呈交錯併接設置。當第二滑塊5係與第一滑塊4組合後,第一滑塊4與偏移座3的階級狀凸起面32保持一間距,而第二滑塊5與基座1的階梯狀凸面12保持一間距。使該第一滑塊4與該第二滑塊5相對移動時,該第一滑塊4不會與該偏移座3接觸摩擦,而該第二滑塊5不會與該基座1接觸摩擦,如此設計才能排除基座1與偏移座3的干涉現象。Referring to FIG. 2 to FIG. 4 , each of the second sliders 5 has a long strip-shaped rectangular body, and each of the second sliders 5 is fixed to the offset seat 3 by one side thereof. A second tapered groove 51 is formed on one side of each of the second sliders 5, and the second slider 5 is disposed in a staggered manner with the first slider 4. When the second slider 5 is combined with the first slider 4, the first slider 4 is spaced apart from the stepped convex surface 32 of the offset seat 3, and the second slider 5 and the base 1 are stepped. The convex surface 12 maintains a pitch. When the first slider 4 and the second slider 5 are relatively moved, the first slider 4 does not contact the friction seat 3, and the second slider 5 does not contact the base 1. Friction, so designed to eliminate interference between the pedestal 1 and the offset seat 3.

請參閱圖2至圖4,該各滑動件6,係設置於該第一滑塊4與該第二滑塊5間,即該各滑動件6係滑接於該第一滑塊4與該第二滑塊5之第一、二錐槽41、51間,使該第一滑塊4與該第二滑塊5可藉由該滑動件6而相互滑移,且當該第一滑塊4與該第二滑塊5滑接後,該偏移座3之推動部31係位於該手動轉柄21與該彈性柱22之間。Referring to FIG. 2 to FIG. 4 , the sliding members 6 are disposed between the first sliding block 4 and the second sliding block 5 , that is, the sliding members 6 are slidably coupled to the first sliding block 4 and the sliding block 6 . Between the first and second tapered grooves 41 and 51 of the second slider 5, the first slider 4 and the second slider 5 can be mutually slid by the sliding member 6, and when the first slider 4 After sliding the second slider 5 , the pushing portion 31 of the offset seat 3 is located between the manual handle 21 and the elastic column 22 .

是以,上述即為本發明所提供一較佳實施例之微調偏移量測平台裝置的各部構件及其組裝方式之介紹,接著再將其使用特點介紹如下:首先,該基座1可連接於一固定座(圖中未示)上,而該偏移座3則可連接於一量測件(圖中未示)上,當該手動轉柄21未受外力作用時(如圖4所示),該手動轉柄21之一端係抵接於該偏移座3之推動部31一側上,而該彈性柱22之一端則抵接於該推動部31之另一側上,且該偏移座3與該基座1間係呈平齊之狀態。Therefore, the above is the introduction of each component of the trimming offset measuring platform device according to a preferred embodiment of the present invention and its assembly manner, and then the use characteristics thereof are as follows: First, the pedestal 1 can be connected. It is mounted on a fixed seat (not shown), and the offset seat 3 is connectable to a measuring member (not shown) when the manual rotating handle 21 is not subjected to an external force (as shown in FIG. 4). One end of the manual shank 21 abuts on the side of the pushing portion 31 of the offset seat 3, and one end of the elastic column 22 abuts on the other side of the pushing portion 31, and The offset seat 3 and the base 1 are flush.

當使用者欲調整該偏移座3之偏移距離時,如圖5至圖7所示,操作者則可施力轉動該手動轉柄21以由該手動轉柄21往該推動位置移動,進而推動該偏移座3之推動部31,使該偏移座3能藉由該第一、二滑塊4、5間之滑動件6而相對該基座1進行一訂距離內之線性偏移,以達到將固定座與量測件之間偏移之功效。When the user wants to adjust the offset distance of the offset seat 3, as shown in FIG. 5 to FIG. 7, the operator can force the manual handle 21 to move from the manual handle 21 to the push position. Further pushing the pushing portion 31 of the offset seat 3, so that the offset seat 3 can be linearly offset from the base 1 by the sliding member 6 between the first and second sliders 4 and 5. Move to achieve the effect of shifting between the mount and the gauge.

當欲將該偏移座3調整回與基座1呈平齊之狀態時,則由操作者將該手動轉柄21往退回位置加以旋回移動,以由該彈性柱22之彈力推動於該偏移座3之推動部31上,而能將該偏移座3偏移回與基座1呈平齊之狀態。When the offset seat 3 is to be adjusted to be flush with the base 1, the operator rotates the manual handle 21 to the retracted position to be pushed by the elastic force of the elastic column 22 to the bias. The urging portion 31 of the yoke 3 is moved, and the offset seat 3 can be shifted back to the state of being flush with the susceptor 1.

本發明所提供之微調偏移量測平台裝置,與其他習用技術相互比較時,更具有下列之優點:The fine adjustment offset measuring platform device provided by the invention has the following advantages when compared with other conventional technologies:

1.本發明可進行偏移距離之調整,因此可運用於需進行偏移調整之高精密加工機上,以達適用性較佳之功效。1. The invention can adjust the offset distance, so it can be applied to a high-precision processing machine that needs to perform offset adjustment, so as to achieve better applicability.

2.本發明係將用以推回偏移座之彈性柱設置於該基座之內部,因此無需於基座與偏移座間設置額外彈力元件,而可大幅降低本發明整體佔有之空間,以能適用於更為廣泛之領域中。2. The present invention provides an elastic column for pushing back the offset seat inside the base, so that there is no need to provide an additional elastic element between the base and the offset seat, and the space occupied by the whole invention can be greatly reduced. Can be applied to a wider range of fields.

3.承上述本發明其體積較小、厚度較薄、適用性較佳者。3. According to the above invention, the invention has a small volume, a thin thickness and a good applicability.

上列詳細說明係針對本發明之一可行實施例之具體說明,惟該實施例並非用以限制本發明之專利範圍,凡未脫離本發明技藝精神所為之等效實施或變更,均應包含於本案之專利範圍中。The detailed description of the preferred embodiments of the present invention is intended to be limited to the scope of the invention, and is not intended to limit the scope of the invention. The patent scope of this case.

綜上所述,本案不但在空間型態上確屬創新,並能較習用物品增進上述多項功效,應已充分符合新穎性及進步性之法定發明專利要件,爰依法提出申請,懇請 貴局核准本件發明專利申請案,以勵發明,至感德便。In summary, this case is not only innovative in terms of space type, but also can enhance the above-mentioned multiple functions compared with the customary items. It should fully meet the statutory invention patent requirements of novelty and progressiveness, and apply for it according to law. This invention patent application, in order to invent invention, to the sense of virtue.

1...基座1. . . Pedestal

11...凹陷區11. . . Sag area

12...階梯狀凸面12. . . Stepped convex surface

13...凸肋13. . . Rib

14...容置區14. . . Included area

2...調整單元2. . . Adjustment unit

21...手動轉柄twenty one. . . Manual handle

22...彈性柱twenty two. . . Elastic column

3...偏移座3. . . Offset seat

31...滑槽31. . . Chute

32...階級狀凸起面32. . . Class convex surface

33...推動部33. . . Promotion department

4...第一滑塊4. . . First slider

41...錐槽41. . . Cone groove

5...第二滑塊5. . . Second slider

51...錐槽51. . . Cone groove

6...滑動件6. . . Slide

圖1為本發明微調偏移量測平台裝置之立體外觀示意圖。1 is a schematic perspective view of a trimming offset measuring platform device of the present invention.

圖2為該微調偏移量測平台裝置之立體分解示意圖。2 is a perspective exploded view of the trimming offset measurement platform device.

圖3為該偏移座另一視角之立體示意圖,說明偏移座及推動部之態樣。FIG. 3 is a perspective view of another perspective view of the offset seat, illustrating the orientation of the offset seat and the pusher.

圖4為該微調偏移量測平台裝置之立體作動示意圖。4 is a schematic diagram of the stereo actuation of the trimming offset measurement platform device.

圖5為該微調偏移量測平台裝置之剖視圖,說明本發明結構之態樣。Figure 5 is a cross-sectional view of the trimming offset measuring platform apparatus illustrating the structure of the present invention.

圖6為該微調偏移量測平台裝置之動作剖視圖,說明本發明實際運作前之態樣。Fig. 6 is a cross-sectional view showing the operation of the fine adjustment offset measuring platform device, showing the state before the actual operation of the present invention.

圖7為該微調偏移量測平台裝置之動作剖視圖,說明本發明實際運作前之態樣。Fig. 7 is a cross-sectional view showing the action of the fine adjustment offset measuring platform device, showing the state before the actual operation of the present invention.

1...基座1. . . Pedestal

11...凹陷區11. . . Sag area

12...階梯狀凸面12. . . Stepped convex surface

13...凸肋13. . . Rib

14...容置區14. . . Included area

2...調整單元2. . . Adjustment unit

21...手動轉柄twenty one. . . Manual handle

22...彈性柱twenty two. . . Elastic column

3...偏移座3. . . Offset seat

31...滑槽31. . . Chute

32...階級狀凸起面32. . . Class convex surface

33...推動部33. . . Promotion department

4...第一滑塊4. . . First slider

41...錐槽41. . . Cone groove

5...第二滑塊5. . . Second slider

51...錐槽51. . . Cone groove

6...滑動件6. . . Slide

Claims (7)

一種微調偏移量測平台裝置,包括:一基座,具有至少一長條型凹陷區,該長條型凹陷區係具有一階梯狀凸面,且該基座中央處形成一具有容置區之凸肋;一調整單元,其設置於基座內部,具有一設置於基座上之手動轉柄及一設置於基座上之彈性柱,該手動轉柄可受外力作用而沿直線於一推動位置至一退回位置間進行往復位移,該彈性柱具備預定之彈力;一偏移座,兩側端面向下形成滑槽,該滑槽可對應基座之凸肋,使偏移座得以平移於基座,而偏移座兩側端面各設有一階級狀凸起面,且滑槽底面設置一推動部;至少一第一滑塊,係固設於該基座之階梯狀凸面上;至少一第二滑塊,係固設於該偏移座之階級狀凸起面上;至少一滑動件,係滑接於該第一滑塊與該第二滑塊間,以使該第一滑塊可相對該第二滑塊進行線性之偏移滑動;當該手動轉柄往推動位置移動而推動該偏移座之推動部時,該彈性柱係縮回,而使該偏移座於一有限距離內進行線性偏移,當該手動轉柄往退回位置移動時,該彈性柱由其彈力將該推動部加以推回。A fine adjustment offset measuring platform device includes: a base having at least one elongated recessed region, the elongated recessed recess having a stepped convex surface, and a central portion forming a receiving region a rib; an adjusting unit disposed inside the pedestal, having a manual shank disposed on the pedestal and an elastic column disposed on the pedestal, the manual shank being acted upon by an external force and driving along a straight line Reciprocating displacement between a position and a retracted position, the elastic column has a predetermined elastic force; an offset seat, the end faces of the two sides form a sliding groove downwardly, and the sliding groove can correspond to the rib of the base, so that the offset seat can be translated a pedestal, wherein each of the two end faces of the offset seat is provided with a stepped convex surface, and a bottom surface of the sliding groove is provided with a pushing portion; at least one first sliding block is fixed on the stepped convex surface of the base; at least one a second slider is fixed on the stepped convex surface of the offset seat; at least one sliding member is slidably connected between the first slider and the second slider to make the first slider Linearly offset sliding relative to the second slider; when the manual handle is pushed When the position moves to push the pushing portion of the offset seat, the elastic column is retracted, and the offset seat is linearly offset within a limited distance. When the manual rotating handle moves to the retracted position, the elastic column The pusher is pushed back by its elasticity. 如申請專利範圍第1項所述之微調偏移量測平台裝置,其中該第一滑塊呈一長直矩形之長條狀體,該第二滑塊呈一長直矩形之長條狀體。The fine adjustment offset measuring platform device according to claim 1 , wherein the first slider is a long strip of a long straight rectangle, and the second slider is a long strip of a long straight rectangle. . 如申請專利範圍第1項所述之微調偏移量測平台裝置,其中該第一滑塊之一側形成有一第一錐槽,該第二滑塊之一側形成有第二錐槽,該滑動件係滑接於該第一、二錐槽中。The fine adjustment offset measuring platform device according to claim 1 , wherein one side of the first slider is formed with a first tapered groove, and one side of the second slider is formed with a second tapered groove. The sliding member is slidably coupled to the first and second tapered grooves. 如申請專利範圍第1項所述之微調偏移量測平台裝置,其中該第一滑塊係與該第二滑塊呈交錯併接設置。The trimming offset measuring platform device of claim 1 , wherein the first slider is interlaced with the second slider. 如申請專利範圍第1項所述之微調偏移量測平台裝置,其中該手動轉柄之一端係抵接於該偏移座之推動部一側上,而該彈性柱之一端則抵接於該推動部之另一側上。The fine adjustment offset measuring platform device according to claim 1 , wherein one end of the manual handle abuts on a side of the pushing portion of the offset seat, and one end of the elastic column abuts On the other side of the pusher. 如申請專利範圍第1項所述之微調偏移量測平台裝置,其中該推動部對應基座之容置區之位置,因此,當偏移座組裝於基座時,該推動部即可嵌入基座之容置區。The fine adjustment offset measuring platform device according to claim 1 , wherein the pushing portion corresponds to a position of the receiving portion of the base, so that when the offset seat is assembled to the base, the pushing portion can be embedded. The accommodating area of the pedestal. 如申請專利範圍第1項所述之微調偏移量測平台裝置,其中該第二滑塊係與第一滑塊組合後,第一滑塊與偏移座的階級狀凸起面保持一間距,而第二滑塊與基座的階梯狀凸面保持一間距。使該第一滑塊與該第二滑塊相對移動時,該第一滑塊不會與該偏移座接觸摩擦,而該第二滑塊不會與該基座接觸摩擦。The fine adjustment offset measuring platform device according to claim 1 , wherein the second slider is combined with the first slider, and the first slider and the stepped convex surface of the offset seat are kept at a distance. And the second slider maintains a distance from the stepped convex surface of the base. When the first slider and the second slider are relatively moved, the first slider does not contact the friction seat, and the second slider does not contact the base.
TW101103871A 2012-02-07 2012-02-07 Fine-tuned shift measurement platform device TW201333661A (en)

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