TW201326788A - Method for adjusting optical visual field - Google Patents

Method for adjusting optical visual field Download PDF

Info

Publication number
TW201326788A
TW201326788A TW100149893A TW100149893A TW201326788A TW 201326788 A TW201326788 A TW 201326788A TW 100149893 A TW100149893 A TW 100149893A TW 100149893 A TW100149893 A TW 100149893A TW 201326788 A TW201326788 A TW 201326788A
Authority
TW
Taiwan
Prior art keywords
angle
lens
reflective element
adjustment method
photocoupler
Prior art date
Application number
TW100149893A
Other languages
Chinese (zh)
Inventor
Chin-Hao Kao
Chih-Heng Fang
Original Assignee
Utechzone Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Utechzone Co Ltd filed Critical Utechzone Co Ltd
Priority to TW100149893A priority Critical patent/TW201326788A/en
Publication of TW201326788A publication Critical patent/TW201326788A/en

Links

Abstract

A method for adjusting optical visual field comprises: a photoelectric coupler, a lens, and a transmission source. The present invention is applicable to an optic inspection apparatus, where the lens is located in front of the photoelectric coupler and the transmission source projects to a reflection element and is reflected to an object to be detected and then get incident to the lens and the photoelectric coupler. The lens and the photoelectric coupler form a first included angle with respect to a normal line. A reflection line made by the reflection element to the object to be detected forms a third included angle with respect to the normal line. The reflection element and a line parallel to the normal line form a second included angle. The present invention uses the third included angle of the reflection element to carry out shifting and adjusting of the position and angle in the horizontal and vertical directions so as to improve the drawback of the known techniques that directly makes positional adjustment on the transmission source device that is bulky and difficult to move and also to accomplish brightness adjustment of visual field with respect to the transmission source through minute adjustment of a reflection element that is thin, light-weighted, and compact.

Description

光學視野調整方法Optical field adjustment method

本發明為一種光學視野調整方法,特別係指利用反射鏡片元件所夾之第三夾角進行水平方向橫移達成調整發射光源明暗視野亮度之目的。The invention relates to an optical field adjustment method, in particular to the purpose of adjusting the brightness of the light and dark field of the emission light source by horizontally traversing the third angle sandwiched by the reflective lens element.

明視野觀察原理係將光線均勻照射在待測物上,捕捉透射物品或反射回來的光線之觀測方式,然後從物品的光線透射率或反射率的對應數值計算出所觀測圖像之對比值,屬於最基本的觀測方法。The principle of bright field observation is to uniformly irradiate the light on the object to be tested, to capture the observation mode of the transmitted object or the reflected light, and then calculate the contrast value of the observed image from the corresponding value of the light transmittance or reflectance of the article. The most basic method of observation.

暗視野觀察原理係光線經由暗視野聚光鏡不直接照射在待測物上,而是僅將光線斜射於待測物上,利用聚光鏡內部反射所產生的繞射光照射在待測物表面,因此只捕捉物品表面之散射光線,經此產生背景暗、主體發光之效果。The principle of dark field observation is that the light is not directly irradiated on the object to be tested through the dark field concentrating mirror, but only the light is obliquely incident on the object to be tested, and the diffracted light generated by the internal reflection of the condensing lens is irradiated on the surface of the object to be tested, so only the light is captured. The scattered light on the surface of the object, through which the background is dark and the subject emits light.

實際應用時,通常檢測設備針對印刷電路板、各種尺寸液晶面板、半導體晶圓、晶粒或晶片、照射鏡片或透明玻璃等相關具鏡面材質之樣品當觀測物顯示圖像背景變暗,則其細微的傷痕或凹凸缺陷處所反射出來的散射光線就能被檢測儀器清楚看見,此時即稱為暗視野觀測,由於某些特定情況下,電路板、液晶面板、晶圓、鏡片或玻璃等相關具鏡面材質之樣品皆存在非常微細且肉眼無法察覺之缺陷及凹凸不平整,利用普通明視野觀測並無法及時察覺,此時必須透過高靈敏度精密檢測裝置應用暗視野觀測方式將待測物微細缺陷指出。In practical applications, the test equipment usually refers to a sample of a mirror-like material such as a printed circuit board, a liquid crystal panel of various sizes, a semiconductor wafer, a die or a wafer, an illumination lens, or a transparent glass. Scattered light reflected from tiny flaws or bumps can be clearly seen by the instrument. This is called dark field observation. In some specific cases, the board, LCD panel, wafer, lens or glass are related. Samples with mirror materials have very small defects that are invisible to the naked eye and irregularities. They cannot be detected in time by ordinary bright field observation. At this time, dark-field observations must be applied to the micro-defects of the object to be tested through high-sensitivity precision detection devices. Point out.

傳統發射光源調整方式請參閱第1圖,係習知技術之光學狀態模擬示意圖。首先固定發射光源1與線性掃描取像系統之工作距離,然後將取像系統角度調整固定,即攝影機2與鏡頭3以及待測物4入射光線路徑與第一法線5所夾之左側夾角θ11,然後透過搬移發射光源1構件位置移動程序,完成光源系統對準固定至右側夾角θ12,透過操作人員實際需求,調整至明視野(光線反射)或暗視野(光線漫射)狀態,也可以是明暗視野狀態,就是介於明暗視野交界之中間區域。For the adjustment method of the conventional emission light source, please refer to Fig. 1, which is a schematic diagram of the optical state simulation of the prior art. Firstly, the working distance between the transmitting light source 1 and the linear scanning image capturing system is fixed, and then the angle of the image capturing system is fixed, that is, the angle between the incident light path of the camera 2 and the lens 3 and the object 4 to be detected and the left side of the first normal line 5 is θ11. Then, by moving the light source 1 component position moving program, the light source system is aligned and fixed to the right angle θ12, and adjusted to the bright field (light reflection) or dark field (light diffusion) state by the actual needs of the operator, or The dark and dark field of view is the middle area between the light and dark fields.

經由上述說明得知傳統光源系統明暗視野狀態調整必須直接利用搬移發射光源1構件位置完成校準程序,當待測物體積及重量愈龐大時,則發射光源1構件體積及重量也會相對更加龐大,如此將造成操作更加不方便且校準精度也會受影響。Through the above description, it is known that the adjustment of the brightness and dark field state of the conventional light source system must directly complete the calibration procedure by using the position of the moving light source 1 component. When the volume and weight of the object to be tested are larger, the volume and weight of the component of the light source 1 will be relatively larger. This will make the operation more inconvenient and the calibration accuracy will be affected.

本發明之目的係透過反射鏡片之設計,將反射元件與法線延伸線所夾之第三夾角進行水平與垂直方向之位置與角度移動調整,改善傳統技術中直接針對體積龐大且移動不易之發射光源機台位置調整之缺失,僅透過微調輕薄微型之反射元件即可對發射光源完成視野明暗度調整。The purpose of the invention is to adjust the position and angular movement of the third angle between the reflective element and the normal extension line through the design of the reflective lens to improve the direct and large-sized emission in the conventional technology. The lack of position adjustment of the light source machine can adjust the brightness of the field of view to the emission source only by fine-tuning the thin and light reflective elements.

為連上述目的,本發明係為一種光學視野調整方法,包括:一光電耦合器、一透鏡及一發射光源;本發明係應用於光學檢測設備中,透鏡位於光電耦合器之前方,發射光源投射於一反射元件後反射至待測物上,而後入射至透鏡及光電耦合器,該透鏡及光電耦合器與法線形成一第一夾角,反射元件反射至待測物之反射線與法線形成一第三夾角,反射元件與法線平行延伸線形成一第二夾角。In order to achieve the above object, the present invention is an optical field adjustment method comprising: a photocoupler, a lens and an emission source; the invention is applied to an optical detection device, the lens is located in front of the photocoupler, and the emission source is projected After being reflected by a reflective element, it is reflected onto the object to be tested, and then incident on the lens and the photocoupler. The lens and the photocoupler form a first angle with the normal, and the reflective element is reflected to the reflection line and the normal line of the object to be tested. A third angle, the reflective element forms a second angle with the normal parallel extension line.

本發明主要透過反射鏡片之設計,將反射元件設置於發射光源投射路徑上,由於反射元件反射至待測物之反射路徑與法線會形成一第三夾角,而反射元件與法線平行延伸線也會形成一第二夾角,當待測物需要進行明暗視野調整時,先以下列數學方程式計算出第三夾角需位移之角度,然後直接透過反射元件水平與垂直方向之位置與角度移動調整,將反射元件微調至數學方程式計算出之第三夾角移動數值與調整角度,經此完成發射光源視野明暗度調整。The invention mainly adopts the design of the reflective lens to dispose the reflective element on the projection path of the emission source, and the reflection path reflected from the reflective element to the object to be tested forms a third angle with the normal line, and the reflective element and the normal line extend parallel to the normal line. A second angle is also formed. When the object to be tested needs to be adjusted for the light and dark field of view, the angle of the third angle to be displaced is first calculated by the following mathematical equation, and then the position and angle of the reflection element are directly transmitted and adjusted by the horizontal and vertical directions. The reflective element is fine-tuned to the third angle of movement calculation value and the adjustment angle calculated by the mathematical equation, thereby completing the adjustment of the field of view of the emission source.

(90度-2*θ2)=θ3(90 degrees - 2 * θ2) = θ3

另外,由於反射元件選用反射鏡片材質組成,其反射效率較佳且光源能量損耗低,即使計算出之調整角度數值極為渺小,同樣能藉由輕薄微型之反射元件輕易達成水平與垂直方向之位置與角度調整目的。In addition, since the reflective component is made of a reflective lens material, the reflection efficiency is better and the energy loss of the light source is low. Even if the calculated adjustment angle value is extremely small, the position of the horizontal and vertical directions can be easily achieved by the thin and light reflective element. Angle adjustment purpose.

為了使任何熟習相關技藝者了解本發明之技術內容並據以實施,且根據本說明書所揭露之內容、申請專利範圍及圖式,任何熟習相關技藝者可輕易地理解本發明相關之目的及優點,因此將在實施方式中詳細敘述本發明之詳細特徵以及優點。In order to make those skilled in the art understand the technical content of the present invention and implement it, and according to the disclosure, the patent scope and the drawings, the related objects and advantages of the present invention can be easily understood by those skilled in the art. The detailed features and advantages of the present invention will be described in detail in the embodiments.

請參閱第2圖,係本發明第一實施例之光學狀態模擬示意圖。本發明主要應用於光學檢測設備中,包括:一光電耦合器21、一透鏡22及一發射光源23;透鏡22位於光電耦合器21之前方,發射光源23投射於一反射元件24後反射至待測物25上,而後入射至透鏡22及光電耦合器21,該待測物25至透鏡22及光電耦合器21之光束路徑與第二法線26形成一第一夾角θ1,反射元件24反射至待測物25之反射線與第二法線26會形成一第三夾角θ3,其中待測物25水平表面皆與第二法線26互相垂直,反射元件24與第二法線26平行延伸線則形成一第二夾角θ2。Referring to Figure 2, there is shown a schematic diagram of the optical state simulation of the first embodiment of the present invention. The present invention is mainly applied to an optical detecting device, comprising: a photocoupler 21, a lens 22 and an emission source 23; the lens 22 is located in front of the photocoupler 21, and the emission source 23 is projected onto a reflective element 24 and then reflected to On the object 25, and then incident on the lens 22 and the photocoupler 21, the beam path of the object 25 to the lens 22 and the photocoupler 21 forms a first angle θ1 with the second normal line 26, and the reflective element 24 reflects The reflection line of the object to be tested 25 and the second normal line 26 form a third angle θ3, wherein the horizontal surface of the object to be tested 25 is perpendicular to the second normal line 26, and the reflection element 24 and the second normal line 26 extend parallel lines. Then a second angle θ2 is formed.

本實施例透過反射元件24之鏡片設計,當發射光源23欲進行明視野或暗視野之投射狀態調整時,經由(90度-兩倍第二夾角)=第三夾角之數學方程式,得到反射元件24與第二法線26所夾之第三夾角θ3水平或垂直方向需移動位置距離數值與調整角度,計算完成只需針對反射元件24微調即可將發射光源23視野明暗度加以調整,該第三夾角θ3位移距離及調整角度數學計算方程式如下所列:In this embodiment, through the lens design of the reflective element 24, when the emission source 23 is to be adjusted for the projection state of the bright field or the dark field, the reflection element is obtained by a mathematical equation of (90 degrees - twice the second angle) = the third angle. The third angle θ3 between the 24 and the second normal line 26 is required to move the position distance value and the adjustment angle in the horizontal or vertical direction. The calculation is completed, and only the fine adjustment of the reflection element 24 can adjust the brightness of the field of view of the emission source 23. The mathematical equations for the three-angle θ3 displacement distance and adjustment angle are listed below:

(90度-2*θ2)=θ3(90 degrees - 2 * θ2) = θ3

由於本發明之反射元件24選用反射鏡片材質組成,其反射效率佳且光源能量損耗低,當待測物25至透鏡22及光電耦合器21之光束路徑與第二法線26形成之第一夾角θ1調整固定後,此時第一夾角θ1即為取像系統之固定值,因此即使計算出之第三夾角θ3數值極為渺小,同樣能藉由輕薄微型之反射元件24輕易達成水平與垂直方向之位置與角度校準目的,完全不需考慮如何針對發射光源構件進行微調,同時校準精度更加準確。Since the reflective element 24 of the present invention is composed of a reflective lens material, the reflection efficiency is good and the energy loss of the light source is low, and the first angle formed by the beam path of the object 25 to the lens 22 and the photocoupler 21 and the second normal line 26 is formed. After the adjustment of θ1 is fixed, the first angle θ1 is a fixed value of the image capturing system. Therefore, even if the calculated value of the third angle θ3 is extremely small, the horizontal and vertical directions can be easily achieved by the thin and light reflective element 24. For position and angle calibration purposes, there is no need to consider how to fine tune the components of the emission source, and the calibration accuracy is more accurate.

請參閱第3圖,係本發明第二實施例針對反射元件水平方向位置橫移之光學狀態模擬示意圖。如同前述第一實施例所述,當發射光源23欲進行明暗視野微調時,經由數學方程式求出第三夾角θ3之角度,然後將反射元件24進行前後水平方向位置距離移動,使發射光源23視野明暗度具有最佳取像系統角度。Please refer to FIG. 3, which is a schematic diagram of the optical state simulation of the horizontal position of the reflective element in the second embodiment of the present invention. As described in the foregoing first embodiment, when the light source 23 is to be fine-tuned for the light and dark field, the angle of the third angle θ3 is obtained via a mathematical equation, and then the reflective element 24 is moved in the horizontal direction position to make the field of view of the light source 23 Shading has the best angle of the image system.

請參閱第4圖,係本發明第三實施例針對反射元件垂直方向角度微調之光學狀態模擬示意圖。本實施例與上述第二實施例大致相同,其差異僅在於當第三夾角θ3利用數學方程式求出需微調角度數值後,將反射元件24進行垂直方向高低位置距離移動,經此獲得發射光源23最佳視野明暗度。Please refer to FIG. 4, which is a schematic diagram of the optical state simulation for the vertical adjustment of the vertical direction of the reflective element according to the third embodiment of the present invention. This embodiment is substantially the same as the second embodiment described above, except that when the third angle θ3 is used to obtain the value of the angle to be finely adjusted by using the mathematical equation, the reflective element 24 is moved in the vertical direction and the position is obtained, thereby obtaining the emission source 23. The best view brightness.

因此,經由上述詳細實施例說明,透過本發明之反射元件24鏡片設計,確實能有效針對發射光源23取像系統角度之視野明暗度作最佳化調整,且校準精密度更加準確,完全改善習知技術直接移動發射光源23構件方式之缺失及不便。Therefore, through the above detailed embodiment, the lens design of the reflective element 24 of the present invention can effectively optimize the visual field brightness of the image capturing system angle of the transmitting light source 23, and the calibration precision is more accurate, and the overall improvement is improved. It is known that the technique directly moves the emission source 23 and the component is lacking and inconvenient.

惟上述各實施例係用以說明本發明之特點,其目的在使熟習該技術者能瞭解本發明之內容並據以實施,而非限定本發明之專利範圍,故凡其他未脫離本發明所揭示之精神而完成之等效修飾或修改,仍應包含在以下所述之申請專利範圍中。The embodiments are described to illustrate the features of the present invention, and the purpose of the present invention is to enable those skilled in the art to understand the present invention and to implement the present invention without limiting the scope of the present invention. Equivalent modifications or modifications made by the spirit of the disclosure should still be included in the scope of the claims described below.

1...發射光源1. . . Emission source

2...攝影機2. . . camera

3...鏡頭3. . . Lens

4...待測物4. . . Analyte

5...第一法線5. . . First normal

θ11...左側夾角Θ11. . . Angle on the left

θ12...右側夾角Θ12. . . Right angle

21...光電耦合器twenty one. . . Photocoupler

22...透鏡twenty two. . . lens

23...發射光源twenty three. . . Emission source

24...反射元件twenty four. . . Reflective element

25...待測物25. . . Analyte

26...第二法線26. . . Second normal

θ1...第一夾角Θ1. . . First angle

θ2...第二夾角Θ2. . . Second angle

θ3...第三夾角Θ3. . . Third angle

第1圖為習知技術之光學狀態模擬示意圖。Figure 1 is a schematic diagram of the optical state simulation of the prior art.

第2圖為本發明第一實施例之光學狀態模擬示意圖。Fig. 2 is a schematic view showing the optical state simulation of the first embodiment of the present invention.

第3圖為本發明第二實施例針對反射元件水平方向位置橫移之光學狀態模擬示意圖。Fig. 3 is a schematic view showing the optical state simulation of the horizontal displacement of the reflective element in the second embodiment of the present invention.

第4圖為本發明第三實施例針對反射元件垂直方向角度微調之光學狀態模擬示意圖。Fig. 4 is a schematic view showing the optical state simulation of the vertical adjustment of the angle of the reflective element in the third embodiment of the present invention.

21...光電耦合器twenty one. . . Photocoupler

22...透鏡twenty two. . . lens

23...發射光源twenty three. . . Emission source

24...反射元件twenty four. . . Reflective element

25...待測物25. . . Analyte

26...第二法線26. . . Second normal

θ1...第一夾角Θ1. . . First angle

θ2...第二夾角Θ2. . . Second angle

θ3...第三夾角Θ3. . . Third angle

Claims (6)

一種光學視野調整方法,係應用於光學檢測設備中,包括:一光電耦合器;一透鏡,位於該光電耦合器之前方;以及一發射光源,該發射光源投射於一反射元件後反射至待測物上,而後入射至透鏡及光電耦合器,該透鏡及光電耦合器與法線形成一第一夾角,反射元件反射至待測物之反射線與法線形成一第三夾角,反射元件與法線平行延伸線形成一第二夾角,透過反射元件位置校準程序進行發射光源視野明暗度調整,其調整方式係將反射元件所夾之第三夾角進行水平與垂直方向之位置與角度移動調整。An optical field adjustment method is applied to an optical detecting device, comprising: a photocoupler; a lens located in front of the photocoupler; and an emission light source projected onto a reflective element and reflected to be tested And then incident on the lens and the photocoupler, the lens and the photocoupler form a first angle with the normal, and the reflection line reflected by the reflective element to the object to be tested forms a third angle with the normal, the reflective element and the method The parallel line of the line forms a second angle, and the brightness of the field of view of the light source is adjusted through the position calibration procedure of the reflective element. The adjustment method is to adjust the position and angle of the third angle between the horizontal and vertical directions. 如申請專利範圍第1項所述之光學視野調整方法,其中該第三夾角位移角度計算公式為(90度-兩倍第二夾角)=第三夾角。The optical field adjustment method according to claim 1, wherein the third angle of displacement calculation formula is (90 degrees - twice the second angle) = the third angle. 如申請專利範圍第2項所述之光學視野調整方法,其中該第三夾角位移角度計算公式數學方程式為(90度-2*θ2)=θ3。The optical field adjustment method according to claim 2, wherein the third angular displacement angle calculation formula is (90 degrees - 2 * θ2) = θ3. 如申請專利範圍第1項所述之光學視野調整方法,其中該反射元件係選用鏡片材質組成。The optical field adjustment method according to claim 1, wherein the reflective element is made of a lens material. 如申請專利範圍第1項所述之光學視野調整方法,其中該第一夾角為取像系統調整完成之固定值。The optical field of view adjustment method of claim 1, wherein the first angle is a fixed value of the adjustment of the image taking system. 如申請專利範圍第1項所述之光學視野調整方法,其中該待測物水平表面係與法線互相垂直。The optical field of view adjustment method of claim 1, wherein the horizontal surface of the object to be tested is perpendicular to the normal.
TW100149893A 2011-12-30 2011-12-30 Method for adjusting optical visual field TW201326788A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW100149893A TW201326788A (en) 2011-12-30 2011-12-30 Method for adjusting optical visual field

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW100149893A TW201326788A (en) 2011-12-30 2011-12-30 Method for adjusting optical visual field

Publications (1)

Publication Number Publication Date
TW201326788A true TW201326788A (en) 2013-07-01

Family

ID=49224949

Family Applications (1)

Application Number Title Priority Date Filing Date
TW100149893A TW201326788A (en) 2011-12-30 2011-12-30 Method for adjusting optical visual field

Country Status (1)

Country Link
TW (1) TW201326788A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI682162B (en) * 2015-06-25 2020-01-11 日商仁力克股份有限公司 Belt body detection device and detection method
CN113295699A (en) * 2020-11-17 2021-08-24 北京领邦智能装备股份公司 High-precision imaging system and method, image acquisition device and detection equipment

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI682162B (en) * 2015-06-25 2020-01-11 日商仁力克股份有限公司 Belt body detection device and detection method
CN113295699A (en) * 2020-11-17 2021-08-24 北京领邦智能装备股份公司 High-precision imaging system and method, image acquisition device and detection equipment

Similar Documents

Publication Publication Date Title
CN106198568B (en) A kind of measuring device and measuring method of the film with transparent substrates
TWI663394B (en) Apparatus, method and computer program product for defect detection in work pieces
TWI285737B (en) Inspection of transparent substrates for defects
TWI408360B (en) Apparatus for detecting particles on a glass surface and a method thereof
CN108717062A (en) A kind of the details in a play not acted out on stage, but told through dialogues defect detecting device and its measurement method of heavy caliber ultra-precision surface
JP2007171149A (en) Surface defect inspection device
US11499814B2 (en) Inspection of bonding quality of transparent materials using optical coherence tomography
TW201120436A (en) A apparatus and method for inspecting inner defect of substrate
TW201209391A (en) An apparatus and method for inspecting inner defect of substrate
JPH11173946A (en) Optical characteristic measuring apparatus
WO2015174114A1 (en) Substrate inspection device
TW201326788A (en) Method for adjusting optical visual field
CN110530821B (en) Measuring device and measuring method for refractive index of optical material
TWI580930B (en) Tilt angle and distance measurement method
KR20140012250A (en) Apparatus and method for measuring the defect of glass substrate
JP6142996B2 (en) Via shape measuring device and via inspection device
KR101447857B1 (en) Particle inspectiing apparatus for lens module
TWM477571U (en) Image inspection device
JP2017053775A (en) Apparatus for imaging inside of light-transmissive object, and inspection apparatus
TW202018302A (en) Probe pin alignment apparatus
KR102246219B1 (en) An apparatus for infrared inspection of an electronic component and method thereof
CN208672536U (en) A kind of dark field defect detecting device of heavy caliber ultra-precision surface
CN103196831A (en) Optical sight adjusting method
CN205245992U (en) Image measuring apparatus
TWI813173B (en) Automatic focusing and imaging system and method、microscope