TW201324269A - Low chromatic aberration touch substrate and the manufacturing method thereof - Google Patents

Abstract

A low chromatic aberration touch substrate and the manufacturing method thereof are disclosed. The low chromatic aberration touch substrate comprises a light transmissive base layer, a light transmissive chromatic aberration adjustment layer provided on the base layer, and a conductive and light transmissive induction layer provided on the chromatic aberration adjustment layer. The chromatic aberration adjustment layer includes a silicon oxynitride film. Since the silicon oxynitride film is placed in between the induction layer and the base layer, chromatic aberration between the base layer and the induction layer can be moderated and improved by utilizing the silicon oxynitride film.

Description

Low color difference touch substrate and manufacturing method thereof

The invention relates to a light transmissive plate, in particular to a low color difference touch substrate and a manufacturing method thereof.

The common touch panels are mainly divided into two types: resistive type and capacitive type, and all of them are formed on a transparent substrate to inductively select a position, wherein the capacitive conductive film is patterned and easily permeable. In the case of unevenness and chromatic aberration, the contour of the conductive film is conspicuous. In addition, the touch panel is assembled with the display and covers the front side thereof, thereby affecting display quality and causing color distortion. On the other hand, in the process of manufacturing the touch panel, a film layer formed by sputtering is partially used, which uses several kinds of targets at the same time, thereby increasing the manufacturing cost.

Accordingly, it is an object of the present invention to provide a low color difference touch substrate and a method of fabricating the same.

Therefore, the low color difference touch substrate of the present invention comprises a light transmissive base layer, a color difference adjustment layer permeable to the base layer, and an electrically conductive and transparent layer disposed on the color difference adjustment layer. The sensing layer on the top. The color difference adjusting layer comprises a light transmissive yttrium oxynitride film.

The method for manufacturing a low-chromaticity touch substrate of the present invention comprises the steps of: placing a light-permeable substrate layer in a reaction chamber of a sputtering device, and installing a target containing germanium in the reaction chamber; , refill the gas while controlling the gas composition ratio. Next, the gas temperature in the reaction chamber is between 250 ° C and 450 ° C, and the pressure in the reaction chamber is between 1 mTorr and 5 mTorr. The gas in the reaction chamber acts on the target to form a ruthenium oxynitride film on the base layer to constitute the color difference adjustment layer. And forming a sensing layer on the color difference adjusting layer.

The beneficial effect of the invention is that the yttrium oxynitride film is interposed between the sensing layer and the substrate layer, so that the yttrium oxynitride film can be used to alleviate and improve the chromatic aberration between the substrate layer and the sensing layer, and the nitrogen is formed. In the process of ruthenium oxide film, the gas composition ratio is controlled to adjust the refractive index of the yttrium oxynitride film to adjust the chromatic aberration, and only a single target needs to be installed, so that the production cost can be effectively reduced.

The above and other technical contents, features and advantages of the present invention will be apparent from the following detailed description of FIG. It is to be noted that in the following description, like elements are denoted by the same reference numerals.

Referring to FIGS. 1 and 2, a first preferred embodiment of the method for fabricating a low color difference touch substrate of the present invention is used to form a low color difference touch substrate 1. The low color difference touch substrate 1 includes a light transmissive base layer 11 , a color difference adjusting layer 12 coated on the base layer 11 , and a sensing layer 13 coated on the color difference adjusting layer 12 .

The base layer 11 of the present embodiment is a transparent glass plate that can transmit light. The color difference adjusting layer 12 is transparent to light and includes a yttrium oxynitride film 121 coated on the base layer 11. The yttrium oxynitride film 121 is made of cerium oxynitride (SiON). The sensing layer 13 is electrically conductive and transparent. The sensing layer 13 of the present embodiment is made of indium tin oxide (ITO) material, but may be aluminum-doped zinc oxide (AZO) or gallium-doped zinc oxide (GZO).

The method for manufacturing the low color difference touch substrate is to form the color difference adjustment layer 12 by a vapor deposition method, and includes the following steps:

Step 21 is performed: the base layer 11 is placed in a reaction chamber (not shown) of a sputtering apparatus. In the preferred embodiment, the sputtering apparatus is a magnetron sputtering apparatus.

Then, step 22 is performed: a target containing germanium element (not shown) is placed in the reaction chamber, and the gas is filled. In the preferred embodiment, the target is made of tantalum material, and the reaction chamber is filled with oxygen, nitrogen and argon, and the ratio of the oxygen, nitrogen and argon is controlled to make the nitrogen occupy nitrogen and The ratio of the sum of oxygen is greater than or equal to 0.85.

In addition, the target may also be made of cerium oxide and nitrogen and argon. In addition, the target may be tantalum nitride, in which oxygen and argon are introduced into the reaction chamber. gas.

Next, step 23 is performed: the gas temperature in the reaction chamber is between 250 ° C and 450 ° C. In the preferred embodiment, the heating is performed using an electric heating tube to adjust the temperature of the gas in the reaction chamber. When the reaction temperature is too low, the gas cannot be effectively acted, resulting in insufficient density, and when the reaction temperature is too high, the film stress is excessively large, so that it is preferably between 250 and 450 °C.

Step 24 is performed to bring the pressure in the reaction chamber between 1 mtorr and 5 mTorr. In the preferred embodiment, the amount of gas in the reaction chamber is adjusted by means of a pumping device to maintain the internal pressure between 1 and 5 milliTorr. It should be noted that the reaction rate is too slow when the reaction pressure is too low, and the density is poor when the reaction pressure is too high, so that it is preferably 1 to 5 mTorr.

Step 25 is performed: the gas in the reaction chamber acts on the target, and the yttrium oxynitride film 121 of the color difference adjustment layer 12 is formed on the base layer 11.

It should be noted that the thickness of the yttrium oxynitride film 121 of the present embodiment is between 1 and 100 nanometers (nm), and the reaction time can be controlled to adjust the thickness. Further, the ratio of the gas in the step 22 is used to generate a difference. The refractive index yttrium oxynitride film 121, in the present embodiment, is 3 to 60 to 37 in oxygen, nitrogen and argon, and the pressure is 3 milliTorr, and at a temperature of 300 ° C, a thickness of 100 is formed. The ruthenium oxynitride film having a refractive index of about 1.65 is nanometer, and at this time, the ratio of nitrogen to nitrogen is about 0.95. When the oxygen, nitrogen and argon gas are changed at a ratio of 10 to 60 to 30 and at the same pressure, a refractive index ruthenium oxynitride film of 1.47 can be formed, and at this time, the ratio of nitrogen to nitrogen is about 0.86, so the reaction chamber is adjusted. The refractive index of the yttria film can be controlled by the ratio of the gas in the medium.

Further, step 26 is performed: the ITO target is replaced in the reaction chamber, and argon gas and oxygen gas are filled, and the temperature in the reaction chamber is maintained at 250 to 450 ° C, and the pressure is maintained at 1 to 5 milliTorr ( Between mtorr), the gas in the reaction chamber acts on the target, and the sensing layer 13 is formed on the yttrium oxide film 121 of the color difference adjusting layer 12, and the low color difference touch substrate 1 is formed.

Since the yttrium oxynitride film 121 of the chromatic aberration adjusting layer 12 is interposed between the base layer 11 and the sensing layer 13, the refractive index of the yttrium oxynitride film 121 can be controlled by adjusting the proportion of the gas in the reaction chamber. The overall refractive index is adjusted to alleviate the visual difference caused by the overlapping of different materials, and the purpose of reducing the chromatic aberration between the base layer 11 and the sensing layer 13 is achieved, and the operation convenience is good. On the other hand, the present invention only needs to use a single target, that is, the crucible of the present embodiment, to form the niobium oxynitride film 121, thereby achieving the purpose of reducing production cost and saving the target.

Further, in Table 1 below, the refractive index of the underlying layer 11 is 1.52 and the thickness is 0.7 mm (mm), and the yttrium oxynitride film 121 of the chromatic aberration adjusting layer 12 has a refractive index of 1.67 and a thickness of 65 nm (nm), and When the refractive index of the sensing layer 13 is 1.916 and the thickness is 113 nm, the low-chromaticity touch substrate 1 is measured, and the result shows that the low-chromaticity touch substrate 1 is transmitted for a wavelength of 510 nm. The color difference (ΔE*) with reflection is 0.98 and 0.37, respectively, and both are less than 1, and have a characteristic of low chromatic aberration.

On the other hand, Table 2 below is a refractive index of 1.52 in the base layer 11 and a thickness of 0.7 mm (mm), and the yttrium oxynitride film 121 of the chromatic aberration adjusting layer 12 has a refractive index of 1.71 and a thickness of 60 nm (nm). When the refractive index of the sensing layer 13 is 1.916 and the thickness is 85 nm, the low color difference touch substrate 1 is measured, and the low color difference touch substrate 1 is displayed for a wavelength of 510 nm. The color difference (ΔE*) of transmission and reflection is 0.92 and 0.90, respectively, and both are less than 1, and also have low chromatic aberration characteristics. It can be seen from Tables 1 and 2 that the refractive index and thickness of the yttrium oxynitride film 121 are changed. Adjust the overall color difference.

In addition, the calculation method of the color difference (ΔE*) is based on the standard set by CIE76, that is, the difference between the brightness value (ΔL*) and the difference value of the red-green degree coordinate (Δa*) and yellow. The difference value of the blue difference coordinates (Δb*), and the sum of the square roots after the respective squares is the color difference value.

Referring to FIGS. 3 and 4, a second preferred embodiment of the method for fabricating a low color difference touch substrate of the present invention is also used to form a low color difference touch substrate 1 , and the low color difference touch substrate 1 includes a light transmissive substrate. The layer 11, a color difference adjusting layer 12 coated on the base layer 11, and a sensing layer 13 disposed on the color difference adjusting layer 12.

The difference between the present embodiment and the first preferred embodiment is that the low color difference touch substrate of the embodiment further includes a ytterbium oxide which is interposed between the yttrium oxynitride film 121 and the sensing layer 13 and transparent to light. Layer 14. The yttrium oxide layer 14 is made of yttrium oxide (SiO) and has a thickness of about 50 nm and a refractive index of between 1.45 and 1.47. The sensing layer 13 is coated on the yttrium oxide layer 14.

In the step 25 of the method for fabricating the low-difference touch panel of the present embodiment, after the yttrium oxynitride film 121 is formed, the yttrium oxide layer 14 is formed on the yttrium oxynitride film 121. Since the yttrium oxynitride film 121 is interposed between the base layer 11 and the sensing layer 13 in the preferred embodiment, the refractive index of the yttrium oxynitride film 121 can be changed to achieve the purpose of reducing chromatic aberration.

Referring to FIGS. 5 and 6 , a third preferred embodiment of the method for fabricating a low color difference touch substrate of the present invention is also used to form a low color difference touch substrate 1 , and the low color difference touch substrate 1 includes a light transmissive substrate. The layer 11, a color difference adjusting layer 12 disposed above the base layer 11, and a sensing layer 13 coated on the color difference adjusting layer 12.

The difference between the present embodiment and the first preferred embodiment is that the low color difference touch substrate of the embodiment further includes a ruthenium oxide layer 15 coated on the base layer 11 and transparent. A yttria layer 14 on the yttria layer 15 and permeable to light. On the other hand, the yttrium oxynitride film 121 of the color difference adjusting layer 12 of the present embodiment is coated on the yttrium oxide layer 14. The yttria layer 15 is made of yttria (NbO) and has a thickness of about 30 nm and a refractive index of between 2.1 and 2.3. The yttrium oxide layer 14 is made of yttrium oxide (SiO) and has a thickness of about 50 nm and a refractive index of between 1.45 and 1.47.

In the step 21 of the method for fabricating the low-difference touch substrate of the present embodiment, the yttrium oxide layer 15 is formed on the underlying layer 11, and the yttrium oxide layer 14 is formed on the yttrium oxide layer 15. It is placed in the reaction chamber.

In step 25 of the embodiment, the yttrium oxynitride film 121 is formed on the yttrium oxide layer 14. In the preferred embodiment, the yttrium oxynitride film 121 is also interposed between the base layer 11 and the sensing layer 13. Therefore, the thickness of the yttrium oxynitride film 121 can be changed to adjust the refractive index to reduce the chromatic aberration. the goal of.

The above is only the preferred embodiment of the present invention, and the scope of the invention is not limited thereto, that is, the simple equivalent changes and modifications made by the scope of the invention and the description of the invention are All remain within the scope of the invention patent.

1. . . Low color difference touch substrate

11. . . Base layer

12. . . Chromatic aberration adjustment layer

121. . . Niobium oxide film

13. . . Sensing layer

14. . . Cerium oxide layer

15. . . Cerium oxide layer

21~26. . . step

1 is a side view showing a first preferred embodiment of a method for fabricating a low color difference touch substrate of the present invention, and a low color difference touch substrate of the first preferred embodiment;

Figure 2 is a block diagram showing the first preferred embodiment;

3 is a side view showing a second preferred embodiment of the method for manufacturing a low color difference touch substrate of the present invention, and a low color difference touch substrate of the second preferred embodiment;

Figure 4 is a block diagram showing the second preferred embodiment;

5 is a side view showing a third preferred embodiment of the method for fabricating the low color difference touch substrate of the present invention, and a low color difference touch substrate of the third preferred embodiment;

Figure 6 is a block diagram showing the third preferred embodiment.

1. . . Low color difference touch substrate

11. . . Base layer

12. . . Chromatic aberration adjustment layer

121. . . Niobium oxide film

13. . . Sensing layer

Claims (11)

A low color difference touch substrate comprises: a base layer transparent to light; a color difference adjustment layer disposed on the base layer transparently, and comprising a ruthenium oxynitride film; and a sensing layer electrically conductive, and It is permeable to light on the color difference adjustment layer. The low color difference touch substrate according to claim 1, wherein the ruthenium oxynitride film is coated on the base layer, and the thickness of the ruthenium oxynitride film is between 1 nm and 100 nm. And the refractive index is between 1.47 and 2.3. The low chromaticity touch substrate according to claim 1, wherein the yttrium oxynitride film is coated on the base layer, and the low chromaticity touch substrate further comprises a yttrium oxynitride film and The light-transmissive yttrium oxide layer between the sensing layers. The low chromaticity touch substrate according to claim 1, further comprising a yttria layer coated on the base layer and permeable to light, and a light permeable layer coated on the yttrium oxide layer A ruthenium oxide layer, the ruthenium oxynitride film is coated on the ruthenium oxide layer. A method for manufacturing a low color difference touch substrate comprises the following steps: Step A: placing a light transmissive substrate layer in a reaction chamber of a sputtering apparatus; Step B: installing a germanium element in the reaction chamber Target, and fill the gas while controlling the gas composition ratio; Step C: the gas temperature in the reaction chamber is between 250 ° C and 450 ° C; Step D: the pressure in the reaction chamber is between 1 mTorr to 5 m Between the Thor; Step E: The gas in the reaction chamber acts on the target to form a ruthenium oxynitride film on the base layer, and constitutes the chromatic aberration adjusting layer. Step F: forming a sensing layer on the color difference adjusting layer. The method for manufacturing a low chromaticity touch substrate according to claim 5, wherein in the step B, the target is made of bismuth material, and oxygen and nitrogen are introduced, and the ratio of the oxygen to the nitrogen is adjusted to control The refractive index of the yttrium oxynitride film is formed, and the reaction time is controlled to control the thickness of the yttrium oxynitride film formed. The method for manufacturing a low color difference touch panel according to claim 6, wherein in step B, the ratio of the nitrogen gas to the total volume of the nitrogen gas and the oxygen is greater than or equal to 0.85, and the nitrogen formed in the step E The yttrium oxide film has a refractive index between 1.47 and 2.3. The method for manufacturing a low chromaticity touch substrate according to claim 5, wherein in the step B, the target is made of tantalum nitride, and oxygen and argon are introduced, and the oxygen and argon are adjusted. The ratio is controlled to control the refractive index of the yttrium oxynitride film, and the reaction time is controlled to control the thickness of the yttrium oxynitride film. The method for manufacturing a low chromaticity touch substrate according to claim 5, wherein in the step B, the target is made of cerium oxide, and nitrogen and argon are introduced, and the nitrogen and argon are adjusted. The ratio is controlled to control the refractive index of the yttrium oxynitride film, and the reaction time is controlled to control the thickness of the yttrium oxynitride film. The method for manufacturing a low color difference touch panel according to any one of claims 5 to 8, wherein in the step E, after the formation of the yttrium oxynitride film, a layer is formed on the yttrium oxynitride film. Oxide layer. The method for manufacturing a low-difference touch substrate according to any one of claims 5 to 9, wherein in the step A, the substrate layer is placed on the substrate layer before being placed in the reaction chamber. A layer of ruthenium oxide is formed, and a layer of ruthenium oxide is formed on the ruthenium oxide layer. In step E, the ruthenium oxynitride film is formed on the ruthenium oxide layer.