TW201306423A - Non-contact power feeding system - Google Patents
Non-contact power feeding system Download PDFInfo
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- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02J—CIRCUIT ARRANGEMENTS OR SYSTEMS FOR SUPPLYING OR DISTRIBUTING ELECTRIC POWER; SYSTEMS FOR STORING ELECTRIC ENERGY
- H02J7/00—Circuit arrangements for charging or depolarising batteries or for supplying loads from batteries
- H02J7/0042—Circuit arrangements for charging or depolarising batteries or for supplying loads from batteries characterised by the mechanical construction
- H02J7/0044—Circuit arrangements for charging or depolarising batteries or for supplying loads from batteries characterised by the mechanical construction specially adapted for holding portable devices containing batteries
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F38/00—Adaptations of transformers or inductances for specific applications or functions
- H01F38/14—Inductive couplings
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M10/00—Secondary cells; Manufacture thereof
- H01M10/42—Methods or arrangements for servicing or maintenance of secondary cells or secondary half-cells
- H01M10/46—Accumulators structurally combined with charging apparatus
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- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02J—CIRCUIT ARRANGEMENTS OR SYSTEMS FOR SUPPLYING OR DISTRIBUTING ELECTRIC POWER; SYSTEMS FOR STORING ELECTRIC ENERGY
- H02J50/00—Circuit arrangements or systems for wireless supply or distribution of electric power
- H02J50/10—Circuit arrangements or systems for wireless supply or distribution of electric power using inductive coupling
- H02J50/12—Circuit arrangements or systems for wireless supply or distribution of electric power using inductive coupling of the resonant type
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- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02J—CIRCUIT ARRANGEMENTS OR SYSTEMS FOR SUPPLYING OR DISTRIBUTING ELECTRIC POWER; SYSTEMS FOR STORING ELECTRIC ENERGY
- H02J50/00—Circuit arrangements or systems for wireless supply or distribution of electric power
- H02J50/90—Circuit arrangements or systems for wireless supply or distribution of electric power involving detection or optimisation of position, e.g. alignment
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- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04B—TRANSMISSION
- H04B5/00—Near-field transmission systems, e.g. inductive or capacitive transmission systems
- H04B5/70—Near-field transmission systems, e.g. inductive or capacitive transmission systems specially adapted for specific purposes
- H04B5/79—Near-field transmission systems, e.g. inductive or capacitive transmission systems specially adapted for specific purposes for data transfer in combination with power transfer
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/10—Energy storage using batteries
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- Chemical Kinetics & Catalysis (AREA)
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- General Chemical & Material Sciences (AREA)
- Charge And Discharge Circuits For Batteries Or The Like (AREA)
- Current-Collector Devices For Electrically Propelled Vehicles (AREA)
Abstract
Description
本發明係關於以非接觸方式對受電裝置供電之非接觸式供電系統。 The present invention relates to a contactless power supply system that supplies power to a power receiving device in a non-contact manner.
自以往即存在有自供電裝置對受電裝置以非接觸方式進行供電之非接觸式供電系統(參照例如專利文獻1)。以往非接觸式供電系統中,實行供電時,係將受電裝置設置於供電裝置內固定之位置。僅在此狀態下,可自供電裝置對受電裝置供電。 In the past, there has been a non-contact power supply system in which a power receiving device supplies power to a power receiving device in a non-contact manner (see, for example, Patent Document 1). In the conventional non-contact power supply system, when power is supplied, the power receiving device is placed at a fixed position in the power supply device. Only in this state, the power receiving device can be powered by the power supply device.
近年來,為更實現提升使用者之便利性,有人檢討所謂自由佈局型非接觸式供電系統,僅於供電裝置上表面(供電面)中任意位置設置受電裝置,即可對該受電裝置供電(參照例如專利文獻2)。 In recent years, in order to further improve the convenience of users, some people have reviewed the so-called free-laying type non-contact power supply system, and the power receiving device can be powered only by setting the power receiving device at any position on the upper surface (power supply surface) of the power supply device ( Refer to, for example, Patent Document 2).
如圖5(a)所示,於自由佈局型非接觸式供電系統中供電裝置10之內部,沿其供電面6配置有複數1次線圈L1。且於受電裝置30設有2次線圈L2。圖5(a)中,處於2次線圈L2對正1次線圈L1之狀態。此1次線圈L1因操作頻率f1而被激磁。2次線圈L2中因來自經激磁之1次線圈L1磁束之變化而感應產生電流。此感應產生電流係受電裝置30之輸出電力。如此,利用電磁感應自供電裝置10對受電裝置30供給電力。 As shown in FIG. 5(a), in the free-layout type non-contact power supply system, a plurality of coils L1 are arranged along the power supply surface 6 inside the power supply device 10. Further, the power receiving device 30 is provided with the secondary coil L2. In Fig. 5(a), the secondary coil L2 is in the state of the primary coil L1. This primary coil L1 is excited by the operating frequency f1. In the secondary coil L2, a current is induced by a change in the magnetic flux from the primary coil L1 that is excited. This induction produces an output current of the power receiving device 30. In this manner, the power receiving device 30 is supplied with electric power by the electromagnetic induction self-power supply device 10.
[專利文獻1]日本特開2003-204637號公報 [Patent Document 1] Japanese Patent Laid-Open Publication No. 2003-204637
[專利文獻2]日本特開2008-5573號公報 [Patent Document 2] Japanese Patent Laid-Open Publication No. 2008-5573
以往非接觸式供電系統(非自由佈局型系統)中,如圖7所示,設定1次線圈L1之操作頻率f1,俾與2次線圈L2對正1次線圈L1時共振系中之共振頻率fr一致。此共振頻率fr係2次線圈L2之共振頻率。以往非接觸式供電系統中,受電裝置設置於相對於供電裝置固定之位置,故供電時2次線圈L2可對正1次線圈L1。因此,可使操作頻率f1為共振頻率fr,藉此於受電裝置30獲得最大之輸出電力W1。 In the conventional non-contact power supply system (non-free layout system), as shown in FIG. 7, the operating frequency f1 of the primary coil L1 is set, and the resonant frequency in the resonant system when the secondary coil L2 is aligned with the secondary coil L1. Fr is consistent. This resonance frequency fr is the resonance frequency of the secondary coil L2. In the conventional non-contact power supply system, since the power receiving device is disposed at a position fixed to the power supply device, the secondary coil L2 can be aligned with the primary coil L1 during power supply. Therefore, the operating frequency f1 can be made the resonance frequency fr, whereby the maximum output power W1 is obtained by the power receiving device 30.
另一方面,上述自由佈局型非接觸式供電系統中,只要在供電面6上,無需特別設置受電裝置30於固定位置。因此,如圖5(b)所示,有時2次線圈L2亦會被擺在2個1次線圈L1間之間隙位置。2次線圈L2對正1次線圈L1之位置時漏電感Le最小。又,隨著2次線圈L2自對正位置沿供電面6偏離漏電感Le會增加。 On the other hand, in the above-described free-layout type non-contact power supply system, it is not necessary to particularly provide the power receiving device 30 at a fixed position on the power supply surface 6. Therefore, as shown in FIG. 5(b), the secondary coil L2 may be placed at a gap position between the two primary coils L1. When the secondary coil L2 is aligned with the position of the primary coil L1, the leakage inductance Le is the smallest. Further, as the secondary coil L2 is displaced from the alignment position along the power supply surface 6, the leakage inductance Le increases.
已知漏電感Le愈大,共振頻率fr愈小。因此,如圖7箭頭所示,隨著相對於1次線圈L12次線圈L2之位置偏離共振系中之共振頻率fr會減小。因此,1次線圈L1處於間隙位置時輸出電力相較於處於對正位置時之輸出電力W1為大幅降低之輸出電力W2。如此自由佈局型非接觸式供電系統中對應受電裝置30之設置位置受電裝置30內輸出電力之差異大,難以確保穩定之輸出電力。 It is known that the larger the leakage inductance Le is, the smaller the resonance frequency fr is. Therefore, as indicated by the arrow in Fig. 7, the resonance frequency fr in the resonance system decreases as the position of the secondary coil L2 with respect to the primary coil L12 deviates. Therefore, when the primary coil L1 is in the gap position, the output power W2 is significantly lower than the output power W1 when the output power W1 is in the aligned position. In the free-layout type non-contact power supply system, the position of the power receiving device 30 is different from the output power of the power receiving device 30, and it is difficult to ensure stable output power.
鑑於如此情事,本發明之目的在於提供一種非接觸式供電系統,無關於2次線圈之位置,可獲得穩定之輸出電力。 In view of the circumstances, it is an object of the present invention to provide a non-contact power supply system in which stable output power can be obtained regardless of the position of the secondary coil.
本發明一態樣之非接觸式供電系統包含:供電裝置,具有沿供電面配置,以操作頻率激磁之複數1次 線圈;及受電裝置,具有在設置於該供電面之狀態下,因來自該1次線圈之交變磁束而感應產生電流之2次線圈。 A non-contact power supply system according to an aspect of the present invention includes: a power supply device having a plurality of times of oscillating at an operating frequency along a power supply surface The coil and the power receiving device have a secondary coil that induces a current due to an alternating magnetic flux from the primary coil in a state of being disposed on the power feeding surface.
該非接觸式供電系統之特徵在於:使該1次線圈激磁之該操作頻率設定於該2次線圈存在於相互鄰接之2個該1次線圈之間之間隙位置時所形成之共振系的共振頻率或其附近。 The non-contact power supply system is characterized in that the operating frequency of the primary coil excitation is set to a resonance frequency of a resonance system formed when the secondary coil exists at a gap position between two adjacent primary coils adjacent to each other. Or nearby.
且上述構成中,該非接觸式供電系統亦可具有連接該2次線圈之電容器。 In the above configuration, the contactless power supply system may have a capacitor that connects the secondary coils.
此構成中,宜藉由調整該電容器的電容,設定該操作頻率於對應該間隙位置之該共振系的共振頻率或其附近。 In this configuration, it is preferable to set the operating frequency to the resonance frequency of the resonance system corresponding to the gap position or the vicinity thereof by adjusting the capacitance of the capacitor.
且上述構成中,所謂該共振頻率附近宜係以對應該間隙位置之該共振系所獲得之該受電裝置輸出電力在以該2次線圈存在於該1次線圈對正位置時形成之共振系所獲得之該受電裝置輸出電力以上之頻率區域。 Further, in the above configuration, it is preferable that the vicinity of the resonance frequency is a resonance system formed when the power output of the power receiving device obtained by the resonance system corresponding to the gap position is present in the primary coil at the position where the secondary coil is aligned. The frequency region in which the power receiving device outputs power is obtained.
且上述構成中,宜設定該操作頻率,俾於該間隙位置之該共振系中該共振頻率附近,不與同共振頻率一致。 In the above configuration, it is preferable to set the operating frequency so as not to coincide with the same resonance frequency in the vicinity of the resonance frequency in the resonance system at the gap position.
以下,參照圖1~圖6並同時說明非接觸式供電系統之一實施形態。 Hereinafter, an embodiment of the non-contact power supply system will be described with reference to Figs. 1 to 6 .
如圖1所示,非接觸式供電系統包含供電裝置10與受電裝置30。本例中,受電裝置30內建於行動式終端機40。以下說明關於供電裝置10及受電裝置30之具體構成。 As shown in FIG. 1, the contactless power supply system includes a power supply device 10 and a power receiving device 30. In this example, the power receiving device 30 is built in the mobile terminal unit 40. The specific configuration of the power supply device 10 and the power receiving device 30 will be described below.
如圖2所示,供電裝置10包含平板狀框體5。於框體5上表面形成設置行動式終端機40之供電面6。於框體5內部,橫跨供電面6所有區域配置有複數1次線圈L1。本例中,24個1次線圈L1於供電面6配置成4行×6列之矩陣狀。 As shown in FIG. 2, the power supply device 10 includes a flat frame 5. A power supply surface 6 on which the mobile terminal 40 is placed is formed on the upper surface of the casing 5. Inside the casing 5, a plurality of coils L1 are arranged in all areas across the power supply surface 6. In this example, the 24 primary coils L1 are arranged in a matrix of 4 rows×6 columns on the feeding surface 6.
如圖1所示,供電裝置10包含單一共通單元11與連接此共通單元11之複數(本例中為與1次線圈L1數量相同之24個)供電單元15。 As shown in FIG. 1, the power supply device 10 includes a single common unit 11 and a plurality of power supply units 15 (the same number of 24 coils as the primary coil L1 in this example) connected to the common unit 11.
共通單元11包含電源電路13與共通控制電路12。電源電路13將來自外部電源之交流電力轉換為適當之直流電壓,以此直流電壓為動作電力對各供電單元15及共通單元11供給之。 The common unit 11 includes a power supply circuit 13 and a common control circuit 12. The power supply circuit 13 converts the AC power from the external power source into an appropriate DC voltage, and the DC voltage is supplied to the power supply unit 15 and the common unit 11 as the operating power.
共通控制電路12由微電腦構成,且藉由對各供電單元15供給各種指令信號整合控制供電裝置10。 The common control circuit 12 is constituted by a microcomputer, and the power supply device 10 is integrated and controlled by supplying various command signals to the respective power supply units 15.
供電單元15包含單元控制電路19、激磁驅動電路16與1次線圈L1。 The power supply unit 15 includes a unit control circuit 19, an excitation drive circuit 16, and a primary coil L1.
單元控制電路19接受來自共通控制電路12要求供電意旨之指令信號後,即實行激磁驅動電路16之控制。 The unit control circuit 19 receives the command signal from the common control circuit 12 for requesting power supply, that is, performs control of the excitation drive circuit 16.
1次線圈L1之兩端連接激磁驅動電路16。又,於1次線圈L1一端及激磁驅動電路16之間連接電容器C1。激磁驅動電路16藉由以單元控制電路19控制,產生操作頻率f1之交流電流,對1次線圈L1及電容器C1供給之。藉此,使1次線圈L1激磁。此時,自1次線圈L1產生之磁束變化。 The excitation drive circuit 16 is connected to both ends of the primary coil L1. Further, a capacitor C1 is connected between one end of the primary coil L1 and the excitation drive circuit 16. The excitation drive circuit 16 is controlled by the unit control circuit 19 to generate an alternating current of the operation frequency f1, and is supplied to the primary coil L1 and the capacitor C1. Thereby, the primary coil L1 is excited. At this time, the magnetic flux generated from the primary coil L1 changes.
如圖1所示,受電裝置30包含整流電路31與DC/DC轉換器 35。 As shown in FIG. 1, the power receiving device 30 includes a rectifier circuit 31 and a DC/DC converter. 35.
2次線圈L2兩端連接整流電路31。又,於2次線圈L2一端及整流電路31之間連接電容器C2。2次線圈L2因來自1次線圈L1磁束之變化而感應產生電流。整流電路31將由2次線圈L2感應產生之交流電流加以整流。DC/DC轉換器35將來自整流電路31之直流電壓轉換為適合行動式終端機40動作之值。利用此直流電壓於例如係行動式終端機40動作電源之2次電池(圖示略)之充電。 The rectifier circuit 31 is connected to both ends of the secondary coil L2. Further, a capacitor C2 is connected between one end of the secondary coil L2 and the rectifier circuit 31. The secondary coil L2 induces a current due to a change in the magnetic flux from the primary coil L1. The rectifier circuit 31 rectifies the alternating current induced by the secondary coil L2. The DC/DC converter 35 converts the DC voltage from the rectifier circuit 31 into a value suitable for the operation of the mobile terminal 40. This DC voltage is used to charge, for example, the secondary battery (not shown) that operates the power supply of the mobile terminal 40.
其次,說明關於非接觸式供電系統中之共振特性。 Next, the resonance characteristics in the non-contact power supply system will be explained.
圖3係顯示表示對應1次線圈L1操作頻率受電裝置30之輸出電力之共振系之曲線圖。如同圖3所示,本實施形態共振系中存在有1次側共振頻率fa1及2次側共振頻率fb1之2個共振頻率。1次側共振頻率fa1低於2次側共振頻率fb1。此等共振頻率fa1、fb1係2次線圈L2處於對正1次線圈L1之位置時之共振頻率。 Fig. 3 is a graph showing a resonance system showing the output power of the power receiving device 30 corresponding to the primary coil L1 operating frequency. As shown in FIG. 3, in the resonance system of the present embodiment, there are two resonance frequencies of the primary side resonance frequency fa1 and the secondary side resonance frequency fb1. The primary side resonance frequency fa1 is lower than the secondary side resonance frequency fb1. These resonance frequencies fa1 and fb1 are resonance frequencies when the secondary coil L2 is at the position of the positive primary coil L1.
在此,設定將1次線圈L1加以激磁之操作頻率f1為1次側共振頻率fa1時,因兩線圈L1、L2在磁耦合之狀態下阻抗過度降低,電路效率降低。因此,本例中為利用2次側共振頻率fb1,設定將1次線圈L1加以激磁之操作頻率f1於2次側共振頻率fb1附近。藉由於2次側共振頻率fb1附近設定操作頻率f1,抑制阻抗過度降低。共振頻率自以下數式導出。 When the operating frequency f1 at which the primary coil L1 is excited is set to the primary side resonance frequency fa1, the impedance of the two coils L1 and L2 is excessively lowered in the state of magnetic coupling, and the circuit efficiency is lowered. Therefore, in this example, the operating frequency f1 at which the primary coil L1 is excited is set to be near the secondary side resonance frequency fb1 by the secondary side resonance frequency fb1. By setting the operating frequency f1 near the secondary side resonance frequency fb1, the impedance is excessively lowered. The resonance frequency is derived from the following equation.
依數式(1)可知,漏電感Le或電容器的電容C愈大共振頻率愈小。例如,2次線圈L2自對正1次線圈L1之圖5(a)所示之位置 沿供電面6面方向偏離時,隨著偏離漏電感Le增大。此時,圖3以實線所示之共振系(共振曲線)朝共振頻率減小之方向(圖3中左方向)移動。又,如圖5(b)所示,2次線圈L2存在於係相互鄰接之2個1次線圈L1間之中央位置之間隙位置時,設定共振系(共振曲線)為圖3以虛線所示之頻率。如此,在間隙位置之1次側共振頻率fa2及2次側共振頻率fb2分別小於在對正位置之2次側共振頻率fa1及2次側共振頻率fb2。 According to the equation (1), the smaller the leakage inductance Le or the capacitance C of the capacitor, the smaller the resonance frequency. For example, the position of the secondary coil L2 from the aligned primary coil L1 shown in Fig. 5(a) When it is deviated in the direction of the surface of the power supply surface 6, the deviation Le leakage inductance Le increases. At this time, the resonance system (resonance curve) shown by the solid line in FIG. 3 moves in the direction in which the resonance frequency decreases (the left direction in FIG. 3). Further, as shown in FIG. 5(b), when the secondary coil L2 exists at a gap position between the two primary coils L1 adjacent to each other, the resonance system (resonance curve) is set as shown by a broken line in FIG. The frequency. As described above, the primary side resonance frequency fa2 and the secondary side resonance frequency fb2 at the gap position are respectively smaller than the secondary side resonance frequency fa1 and the secondary side resonance frequency fb2 at the alignment position.
且如上述數式(1)所示,藉由調整電容器C2之電容C,可設定相對於操作頻率f1之共振頻率(共振系之頻率區域)。此時,可固定操作頻率f1。 Further, as shown in the above formula (1), by adjusting the capacitance C of the capacitor C2, the resonance frequency (frequency region of the resonance system) with respect to the operation frequency f1 can be set. At this time, the operating frequency f1 can be fixed.
圖4係顯示圖3範圍A之放大圖。如圖4所示,與上述先前技術相同,設定操作頻率f1為於對正位置之共振頻率fb1時,在間隙位置受電裝置30之輸出電力與在對正位置受電裝置30之輸出電力之差△W1為最大。此時,如圖6(a)之曲線圖所示,於對正位置受電裝置30之輸出電力為最大(約50W)。又,2次線圈L2存在於對正位置與間隙位置之中間位置時,受電裝置30之輸出電力未滿20W。且2次線圈L2存在於間隙位置時,受電裝置30之輸出電力約為10W。因此,設定操作頻率f1為於對正位置之共振頻率fb1時,2次線圈L2處於間隙位置時之輸出電力降低至於對正位置之輸出電力之約20%。 Figure 4 is an enlarged view showing the range A of Figure 3. As shown in FIG. 4, as in the prior art described above, when the operating frequency f1 is set to the resonant frequency fb1 of the aligned position, the difference between the output power of the power receiving device 30 at the gap position and the output power of the power receiving device 30 at the aligned position is Δ. W1 is the largest. At this time, as shown in the graph of Fig. 6(a), the output power of the power receiving device 30 at the aligned position is maximum (about 50 W). Further, when the secondary coil L2 is present at the intermediate position between the alignment position and the gap position, the output power of the power receiving device 30 is less than 20 W. When the secondary coil L2 is present at the gap position, the output power of the power receiving device 30 is about 10 W. Therefore, when the operating frequency f1 is set to the resonance frequency fb1 of the aligned position, the output power when the secondary coil L2 is at the gap position is reduced to about 20% of the output power of the aligned position.
相對於此,本實施形態中,藉由調整電容器C2之電容C設定相對於操作頻率f1共振系之位置,俾在間隙位置受電裝置30之輸出電力與在對正位置受電裝置30之輸出電力之差小。本例中,設定操作頻率f1於在間隙位置之共振頻率fb2附近。如圖4所示,所謂共振頻率fb2附近係對應間隙位置之共振系(以虛線表示之共振曲線),與對應對正位置之共振系(以實線表示之共振曲線)之2個交叉點fx、fy之間之頻率區域。亦即,設定本實施形態之共振 系,俾操作頻率f1位於2個交叉點fx、fy間。於2個交叉點fx、fy間設定操作頻率f1時,在間隙位置之輸出電力為在對正位置之輸出電力以上。 On the other hand, in the present embodiment, the position of the resonance system with respect to the operation frequency f1 is set by adjusting the capacitance C of the capacitor C2, and the output power of the power receiving device 30 at the gap position and the output power of the power receiving device 30 at the aligned position are used. The difference is small. In this example, the operating frequency f1 is set to be near the resonance frequency fb2 at the gap position. As shown in FIG. 4, the vicinity of the resonance frequency fb2 is a resonance system (resonance curve indicated by a broken line) corresponding to the gap position, and two resonance points fx of the resonance system (resonance curve indicated by a solid line) corresponding to the alignment position. The frequency area between fy and fy. That is, setting the resonance of this embodiment Therefore, the operation frequency f1 is located between two intersections fx and fy. When the operating frequency f1 is set between the two intersections fx and fy, the output power at the gap position is equal to or higher than the output power at the aligned position.
設定操作頻率f1於共振頻率fb2附近時,在間隙位置之受電裝置30之輸出電力與在對正位置之受電裝置30之輸出電力之差△W2小於上述差△W1。此時,如圖6(b)之曲線圖所示,於間隙位置受電裝置30之輸出電力最大(約40W)。又,2次線圈L2存在於對正位置與間隙位置之中間位置時,受電裝置30之輸出電力約為30W。且2次線圈L2存在於對正位置時,受電裝置30之輸出電力約為20W。因此,本構成中,相對於間隙位置對正位置輸出電力之降低比例僅止於約50%。因此,無關於2次線圈L2之位置,可更穩定地獲得受電裝置30之輸出電力。 When the operating frequency f1 is set near the resonance frequency fb2, the difference ΔW2 between the output power of the power receiving device 30 at the gap position and the output power of the power receiving device 30 at the aligned position is smaller than the difference ΔW1. At this time, as shown in the graph of Fig. 6(b), the output power of the power receiving device 30 at the gap position is the largest (about 40 W). Further, when the secondary coil L2 is present at the intermediate position between the alignment position and the gap position, the output power of the power receiving device 30 is approximately 30 W. When the secondary coil L2 is present at the aligned position, the output power of the power receiving device 30 is approximately 20 W. Therefore, in the present configuration, the reduction ratio of the output power to the positive position with respect to the gap position is only about 50%. Therefore, regardless of the position of the secondary coil L2, the output power of the power receiving device 30 can be obtained more stably.
本實施形態之非接觸式供電系統具有以下優點。 The contactless power supply system of this embodiment has the following advantages.
(1)設定操作頻率f1於在間隙位置之共振頻率fb2附近。藉此,相較於例如設定操作頻率f1為在對正位置之共振頻率fb1時,可減小在間隙位置與對正位置之間受電裝置30之輸出電力差。因此,無關於2次線圈L2之位置,可獲得更穩定的受電裝置30之輸出電力。 (1) The operating frequency f1 is set to be near the resonance frequency fb2 at the gap position. Thereby, the output power difference of the power receiving device 30 between the gap position and the alignment position can be reduced as compared with, for example, when the set operating frequency f1 is the resonance frequency fb1 at the aligned position. Therefore, regardless of the position of the secondary coil L2, a more stable output power of the power receiving device 30 can be obtained.
(2)藉由調整電容器C2之電容C設定相對於操作頻率f1共振系之位置。藉此,即使在例如操作頻率f1預先依規格等決定之情形下,亦可將操作頻率f1固定於依規格之值,並同時獲得更穩定的受電裝置30之輸出電力。 (2) The position of the resonance system with respect to the operating frequency f1 is set by adjusting the capacitance C of the capacitor C2. Thereby, even if, for example, the operation frequency f1 is determined in advance according to specifications or the like, the operation frequency f1 can be fixed to the value according to the specification, and at the same time, the output power of the power receiving device 30 can be more stably obtained.
(3)且設定操作頻率f1,俾不與在間隙位置之共振頻率fb2一致。在此,操作頻率f1與在間隙位置之共振頻率fb2一致時,雖不到上述操作頻率f1與在對正位置之共振頻率fb1一致時之程度,但受電裝置30之輸出電力差增大。因此,藉由使操作頻率f1 不與在間隙位置之共振頻率fb2一致可更減小受電裝置30之輸出電力差。 (3) The operating frequency f1 is set and does not coincide with the resonance frequency fb2 at the gap position. Here, when the operation frequency f1 coincides with the resonance frequency fb2 at the gap position, the output power difference of the power receiving device 30 increases because the operating frequency f1 does not match the resonance frequency fb1 at the alignment position. Therefore, by making the operating frequency f1 The output power difference of the power receiving device 30 can be further reduced without being coincident with the resonance frequency fb2 at the gap position.
又,上述實施形態可以將其適當變更之以下形態實施。 Further, the above embodiment can be implemented in the following modes as appropriate.
‧上述實施形態中,藉由調整電容器C2之電容C設定相對於操作頻率f1共振系之位置。然而,亦可藉由使操作頻率f1變化,設定操作頻率f1於在間隙位置之共振頻率fb2附近。 In the above embodiment, the position of the resonance system with respect to the operating frequency f1 is set by adjusting the capacitance C of the capacitor C2. However, it is also possible to set the operating frequency f1 near the resonance frequency fb2 at the gap position by changing the operating frequency f1.
‧上述實施形態中,所謂共振頻率fb2附近係對應間隙位置之共振曲線與對應對正位置之共振曲線之2個交叉點fx、fy間之頻率區域。又,已於交叉點fx、fy間設定操作頻率f1。然而,只要相較於設定操作頻率f1於共振頻率fb1時在間隙位置與對正位置之間受電裝置30之輸出電力差小,設定操作頻率f1之頻率區域不限於此。例如,可於小於交叉點fx之頻率區域設定操作頻率f1,亦可於大於交叉點fy之頻率區域設定操作頻率f1。亦即,意指共振頻率fb2附近之頻率區域其範圍亦可更廣。 In the above embodiment, the vicinity of the resonance frequency fb2 is a frequency region between the resonance curve of the gap position and the two intersections fx and fy of the resonance curve corresponding to the alignment position. Further, the operating frequency f1 is set between the intersections fx and fy. However, as long as the output power difference of the power receiving device 30 between the gap position and the alignment position is small compared to the set operating frequency f1 at the resonance frequency fb1, the frequency region in which the operating frequency f1 is set is not limited thereto. For example, the operating frequency f1 may be set in a frequency region smaller than the intersection fx, or the operating frequency f1 may be set in a frequency region larger than the intersection fy. That is, it means that the frequency region near the resonance frequency fb2 can have a wider range.
‧且亦可於操作頻率f1與在間隙位置之共振頻率fb2一致之位置設定共振系。此時,相較於設定操作頻率f1於在對正位置之共振頻率fb1附近(特別是高於共振頻率fb1之頻率區域)之情形,亦可獲得穩定之輸出電力。 ‧ The resonance system can also be set at a position where the operating frequency f1 coincides with the resonance frequency fb2 at the gap position. At this time, stable output power can be obtained as compared with the case where the set operating frequency f1 is in the vicinity of the resonance frequency fb1 at the alignment position (particularly, the frequency region higher than the resonance frequency fb1).
‧亦可省略上述實施形態中之單元控制電路19。此時,共通控制電路12亦進行上述實施形態中單元控制電路19實行之控制。且共通控制電路12亦可進行單元控制電路19進行之控制之一部分,單元控制電路19亦可進行共通控制電路12進行之控制之一部分。 ‧ The unit control circuit 19 in the above embodiment can also be omitted. At this time, the common control circuit 12 also performs the control performed by the unit control circuit 19 in the above embodiment. The common control circuit 12 can also perform part of the control performed by the unit control circuit 19, and the unit control circuit 19 can also perform part of the control performed by the common control circuit 12.
‧上述實施形態中,線圈L1與電容器C1雖直接連接但亦可並聯連接。且線圈L2與電容器C2雖串聯連接但亦可並聯連接。 In the above embodiment, the coil L1 and the capacitor C1 are directly connected but may be connected in parallel. Further, the coil L2 and the capacitor C2 are connected in series but may be connected in parallel.
A‧‧‧範圍 A‧‧‧Scope
C1、C2‧‧‧電容器 C1, C2‧‧‧ capacitor
C‧‧‧電容 C‧‧‧ capacitor
f1‧‧‧操作頻率 F1‧‧‧ operating frequency
fa1‧‧‧1次側共振頻率 Fa1‧‧‧1 side resonance frequency
fa2‧‧‧1次側共振頻率 Fa2‧‧‧1 side resonance frequency
fb1‧‧‧2次側共振頻率 Fb1‧‧‧2 secondary resonance frequency
fb2‧‧‧2次側共振頻率 Fb2‧‧‧2 secondary resonance frequency
fr‧‧‧共振頻率 Fr‧‧‧resonance frequency
fx、fy‧‧‧交叉點 Fx, fy‧‧‧ intersection
L1‧‧‧1次線圈 L1‧‧1 times coil
L2‧‧‧2次線圈 L2‧‧2nd coil
Le‧‧‧漏電感 Le‧‧‧ leakage inductance
W1、W2‧‧‧輸出電力 W1, W2‧‧‧ output power
△W1、△W2‧‧‧差 △W1, △W2‧‧‧ Poor
5‧‧‧框體 5‧‧‧ frame
6‧‧‧供電面 6‧‧‧Power supply surface
10‧‧‧供電裝置 10‧‧‧Power supply unit
11‧‧‧共通單元 11‧‧‧Common unit
12‧‧‧共通控制電路 12‧‧‧Common control circuit
13‧‧‧電源電路 13‧‧‧Power circuit
15‧‧‧供電單元 15‧‧‧Power supply unit
16‧‧‧激磁驅動電路 16‧‧‧Excitation drive circuit
19‧‧‧單元控制電路 19‧‧‧Unit control circuit
30‧‧‧受電裝置 30‧‧‧Power-receiving device
31‧‧‧整流電路 31‧‧‧Rectifier circuit
35‧‧‧DC/DC轉換器 35‧‧‧DC/DC converter
40‧‧‧行動式終端機 40‧‧‧Mobile terminal
圖1係顯示非接觸式供電系統構成之方塊圖。 Figure 1 is a block diagram showing the construction of a contactless power supply system.
圖2係供電裝置之立體圖。 2 is a perspective view of a power supply device.
圖3係顯示包含1次側及2次側頻率之共振系之曲線圖。 Fig. 3 is a graph showing a resonance system including the primary side and the secondary side frequencies.
圖4係圖3範圍A共振曲線之放大圖。 Figure 4 is an enlarged view of the range A resonance curve of Figure 3.
圖5中(a)係2次線圈L2處於對正位置時供電裝置及受電裝置之部分剖面圖,(b)係2次線圈L2處於間隙位置時供電裝置及受電裝置之部分剖面圖。 Fig. 5(a) is a partial cross-sectional view showing the power supply device and the power receiving device when the secondary coil L2 is in the aligned position, and (b) is a partial cross-sectional view showing the power supply device and the power receiving device when the secondary coil L2 is in the gap position.
圖6中(a)係顯示習知共振系設定中對應2次線圈L2位置受電裝置輸出電力之曲線圖,(b)係顯示本發明共振系設定中對應2次線圈L2位置受電裝置輸出電力之曲線圖。 Fig. 6(a) is a graph showing the output power of the power receiving device corresponding to the secondary coil L2 position in the conventional resonance system setting, and (b) showing the output power of the power receiving device corresponding to the secondary coil L2 position in the resonance system setting of the present invention. Graph.
圖7係顯示先前技術之非接觸式供電系統中,2次線圈處於對正位置時之共振系與2次線圈處於間隙位置時之共振系之曲線圖。 Fig. 7 is a graph showing the resonance system of the prior art non-contact power supply system in which the resonant system and the secondary coil are in the gap position when the secondary coil is in the aligned position.
f1‧‧‧操作頻率 F1‧‧‧ operating frequency
fb1‧‧‧2次側共振頻率 Fb1‧‧‧2 secondary resonance frequency
fb2‧‧‧2次側共振頻率 Fb2‧‧‧2 secondary resonance frequency
fx、fy‧‧‧交叉點 Fx, fy‧‧‧ intersection
△W1、△W2‧‧‧差 △W1, △W2‧‧‧ Poor
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Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6132266B2 (en) * | 2013-03-05 | 2017-05-24 | パナソニックIpマネジメント株式会社 | Non-contact power feeding device |
WO2015085013A1 (en) * | 2013-12-03 | 2015-06-11 | Utah State University | Determining physical alignment between magnetic couplers |
JP6464520B2 (en) * | 2014-04-23 | 2019-02-06 | パナソニックIpマネジメント株式会社 | Non-contact power transmission device, non-contact power reception device, and non-contact power transmission system |
WO2016016930A1 (en) * | 2014-07-28 | 2016-02-04 | 富士機械製造株式会社 | Non-contact power supply device |
NO341430B1 (en) * | 2015-01-19 | 2017-11-13 | Waertsilae Norway As | An apparatus and a method for wireless transmission of power between DC voltage sources |
CN108604833B (en) | 2016-03-18 | 2022-11-08 | 株式会社村田制作所 | Wireless power supply system and power transmission device thereof |
CN109155539B (en) * | 2016-05-18 | 2020-03-27 | 日产自动车株式会社 | Coil position detection method for non-contact power supply system and power receiving device |
WO2017203579A1 (en) * | 2016-05-23 | 2017-11-30 | 日産自動車株式会社 | Coil position detecting method for non-contact power supply system, and non-contact power supply system |
WO2017205878A1 (en) | 2016-05-27 | 2017-11-30 | Wireless Advanced Vehicle Electrification, Inc. | Checking alignment of inductive charge pads in motion |
WO2018163169A1 (en) | 2017-03-07 | 2018-09-13 | Powermat Technologies Ltd. | System for wireless power charging |
EP3373415B1 (en) | 2017-03-07 | 2023-10-04 | Powermat Technologies Ltd. | System for wireless power charging |
JP6693455B2 (en) * | 2017-03-28 | 2020-05-13 | Tdk株式会社 | Wireless power receiving device and wireless power transmission system |
CA3124345A1 (en) | 2017-12-22 | 2019-06-27 | Wireless Advanced Vehicle Electrification, Inc. | Wireless power transfer pad with multiple windings |
US11462943B2 (en) | 2018-01-30 | 2022-10-04 | Wireless Advanced Vehicle Electrification, Llc | DC link charging of capacitor in a wireless power transfer pad |
US11437854B2 (en) | 2018-02-12 | 2022-09-06 | Wireless Advanced Vehicle Electrification, Llc | Variable wireless power transfer system |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2401625A1 (en) * | 1974-01-14 | 1975-07-24 | Siemens Ag | MAGNETIC SYSTEM FOR CONTACT-FREE GUIDANCE OF A MOVING VEHICLE |
US7212414B2 (en) * | 1999-06-21 | 2007-05-01 | Access Business Group International, Llc | Adaptive inductive power supply |
JP3921589B2 (en) | 2002-01-08 | 2007-05-30 | 株式会社日立製作所 | Non-contact power feeding device |
CA2414724C (en) * | 2002-12-18 | 2011-02-22 | Cashcode Company Inc. | Induction sensor using printed circuit |
JP2006345633A (en) * | 2005-06-08 | 2006-12-21 | Sony Corp | Switching power supply circuit |
US7521890B2 (en) * | 2005-12-27 | 2009-04-21 | Power Science Inc. | System and method for selective transfer of radio frequency power |
JP4723424B2 (en) | 2006-06-20 | 2011-07-13 | シャープ株式会社 | Non-contact charging device for mobile phone |
GB2440571A (en) * | 2006-08-01 | 2008-02-06 | Splashpower Ltd | Drive for an inductive coupling with a changing magnetic field direction |
EP2078330A2 (en) | 2006-10-25 | 2009-07-15 | Laszlo Farkas | High power wireless resonant energy transfer system transfers energy across an airgap |
US20090001941A1 (en) | 2007-06-29 | 2009-01-01 | Microsoft Corporation | Inductive Powering Surface for Powering Portable Devices |
GB0716679D0 (en) | 2007-08-28 | 2007-10-03 | Fells J | Inductive power supply |
AU2008339681A1 (en) | 2007-12-21 | 2009-07-02 | Access Business Group International Llc | Inductive power transfer |
US8188619B2 (en) * | 2008-07-02 | 2012-05-29 | Powermat Technologies Ltd | Non resonant inductive power transmission system and method |
US20100190436A1 (en) * | 2008-08-26 | 2010-07-29 | Qualcomm Incorporated | Concurrent wireless power transmission and near-field communication |
JP4478729B1 (en) * | 2008-12-24 | 2010-06-09 | 株式会社豊田自動織機 | Resonant non-contact charging device |
JP2010183812A (en) | 2009-02-09 | 2010-08-19 | Toyota Industries Corp | Resonance type non-contact charging system |
JP5365306B2 (en) * | 2009-03-31 | 2013-12-11 | 富士通株式会社 | Wireless power supply system |
CN101938149A (en) | 2009-06-29 | 2011-01-05 | 鸿富锦精密工业(深圳)有限公司 | Wireless charge device |
US8130067B2 (en) * | 2010-05-11 | 2012-03-06 | Texas Instruments Incorporated | High frequency semiconductor transformer |
JP5730587B2 (en) * | 2011-01-05 | 2015-06-10 | 昭和飛行機工業株式会社 | Magnetic resonance type non-contact power feeding device |
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2011
- 2011-07-20 JP JP2011159175A patent/JP5899490B2/en active Active
-
2012
- 2012-04-17 US US14/232,505 patent/US9711277B2/en active Active
- 2012-04-17 CN CN201280035323.3A patent/CN103688443B/en active Active
- 2012-04-17 EP EP12814139.7A patent/EP2736148B1/en active Active
- 2012-04-17 WO PCT/JP2012/060335 patent/WO2013011726A1/en active Application Filing
- 2012-04-26 TW TW101114965A patent/TWI470895B/en active
Also Published As
Publication number | Publication date |
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EP2736148B1 (en) | 2017-11-29 |
WO2013011726A1 (en) | 2013-01-24 |
EP2736148A4 (en) | 2014-12-10 |
JP2013027132A (en) | 2013-02-04 |
EP2736148A1 (en) | 2014-05-28 |
CN103688443B (en) | 2016-04-27 |
US9711277B2 (en) | 2017-07-18 |
CN103688443A (en) | 2014-03-26 |
TWI470895B (en) | 2015-01-21 |
US20140145517A1 (en) | 2014-05-29 |
JP5899490B2 (en) | 2016-04-06 |
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