TW201305377A - Device for generating aerosol and depositing a light-emitting layer - Google Patents
Device for generating aerosol and depositing a light-emitting layer Download PDFInfo
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- TW201305377A TW201305377A TW101121522A TW101121522A TW201305377A TW 201305377 A TW201305377 A TW 201305377A TW 101121522 A TW101121522 A TW 101121522A TW 101121522 A TW101121522 A TW 101121522A TW 201305377 A TW201305377 A TW 201305377A
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
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- C23C14/228—Gas flow assisted PVD deposition
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
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- C23C14/24—Vacuum evaporation
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- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4486—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by producing an aerosol and subsequent evaporation of the droplets or particles
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Abstract
Description
本發明係有關於一種裝置,包括用於容置粉末的儲存容器及用於將一定量之該粉末自該儲存容器輸送至進料點的螺旋輸送機,該粉末在該進料點上進入載氣流,從而以懸浮粒子形式在該載氣流中經氣膠管道被運走。 The present invention relates to a device comprising a storage container for accommodating powder and a screw conveyor for conveying a quantity of the powder from the storage container to a feed point, the powder entering the feed point The gas stream is thus carried away in the carrier gas stream through the gas gel line in the form of suspended particles.
同類型裝置請參閱US 6,037,241。漏斗型儲存容器內裝有有機粉末。該儲存容器下方設有螺旋輸送機,該螺旋輸送機由馬達驅動,用於將一定量之該粉末送至進料點並送入一通載氣流之載氣管道。粉末粒子在載氣流內形成氣膠並由氣膠管道送入蒸發器。該蒸發器為一容器,此容器之壁部係由開孔泡沫體構成,以施加電流之方式為該泡沫體加熱,以便將熱量傳遞給與孔壁發生接觸之氣膠粒子,從而使其蒸發。用蒸氣管道將載氣及蒸氣送入CVD反應器之處理室,蒸氣在該處理室內冷凝於基板表面,遂形成一發光層。 See US 6,037,241 for the same type of device. The funnel-type storage container contains organic powder. Below the storage container is provided a screw conveyor driven by a motor for delivering a quantity of the powder to the feed point and feeding a carrier gas line through which the carrier gas flows. The powder particles form a gas gel in the carrier gas stream and are sent to the evaporator by the gas gel line. The evaporator is a container, and the wall of the container is composed of an open-cell foam, and the foam is heated by applying an electric current to transfer heat to the gas particles in contact with the wall of the hole to evaporate. . The carrier gas and the vapor are sent to the processing chamber of the CVD reactor by a vapor line, and the vapor is condensed on the surface of the substrate in the processing chamber to form a light-emitting layer.
US 7,501,152 B2所描述的裝置具有一儲存容器,其底面設有與一支撐管連通之開口,該支撐管內裝有螺旋輸送機,藉此可將儲存於容器內之粉末定量送往蒸發器。所用粉末為一有機起始材料,蒸發後可在基板上冷凝形成發光層。 The device described in US 7,501,152 B2 has a storage container having an opening in its bottom surface in communication with a support tube, the support tube being provided with a screw conveyor whereby the powder stored in the container can be metered to the evaporator. The powder used is an organic starting material which, upon evaporation, can be condensed on the substrate to form a luminescent layer.
US 2009/0039175 A1同樣關於一種蒸發器,由螺旋輸送機為其輸送粉末狀有機材料,用該有機材料可在基板上沉積 OLED結構。 US 2009/0039175 A1 likewise relates to an evaporator in which a powdered organic material is conveyed by a screw conveyor, which can be deposited on a substrate. OLED structure.
US 2006/0177576 A1、US 2006/0177578 A1、US 2009/0081365 A1、US 6,037,241 A及EP 0 585 848 A1所描述的輸送裝置具有設實心軸的螺旋輸送機。 The conveying device described in US 2006/0177576 A1, US 2006/0177578 A1, US 2009/0081365 A1, US 6,037, 241 A and EP 0 585 848 A1 has a screw conveyor with a solid shaft.
DE 19 638 100 C1描述一種CVD反應器,包括若干用於儲存固體組分的儲存容器,該等儲存容器在驅動裝置作用下持續保持運動狀態。儲存容器上固定有管件,此管件為旋轉驅動型管件且其中通載氣。 DE 19 638 100 C1 describes a CVD reactor comprising a plurality of storage containers for storing solid components, which are continuously kept in motion by the drive means. A pipe member is fixed to the storage container, and the pipe member is a rotary drive type pipe member and carries a carrier gas therein.
本發明之目的在於對前述氣膠產生器進行技術改良。 It is an object of the present invention to provide a technical improvement to the aforementioned gas gel generator.
如申請專利範圍所述之本發明為可達成該目的之解決方案。 The invention as described in the scope of the patent application is a solution to achieve this object.
本發明首先提出如下主要方案:該螺旋輸送機具有被該載氣流穿過的軸向流道。藉此可改良氣膠產生器在蒸發裝置內的功能。在該螺旋輸送機的支撐腔末端適當成型之情況下,由該螺旋輸送機輸送的粉末粒子將在螺旋輸送機末端沿徑向向內運動並直接進入自螺旋輸送機末端流出的載氣流。該流道位於螺旋輸送機之旋轉軸內。該等粉末粒子以懸浮粒子形式由該載氣經氣膠管道送往蒸發器並在該蒸發器內吸熱蒸發成蒸氣。富含已蒸發有機起始材料之蒸氣之該載氣流經蒸氣管道到達CVD反應器。該CVD反應器具有蓮蓬頭型氣體分佈器,其底面設有出氣面,該出氣面具有多個呈篩網 狀佈置之出氣口。富含蒸氣的載氣流經此氣體分佈器及此等出氣口進入設於氣體分佈器下方之處理室,該處理室之底部由一基座構成,此基座上載有例如由玻璃構成的待塗佈基板,該基板被該基座的冷卻元件冷卻至某一溫度,該蒸氣在此溫度下冷凝於基板表面。可利用一橫向於螺旋輸送機流動的第二載氣流將直接形成於螺旋輸送機末端之氣膠送入氣膠管道。但亦可使氣膠管道與流道排成直線。在排成直線的情況下,亦可在該進料點上向氣膠管道輸送第二載氣。倘若該第一載氣係自一旋轉對稱之進料系統的中心流出,則該第二載氣可由一佈置於徑向外側的噴嘴系統提供。第一載氣之載氣輸送管可具有一閥門,此閥門交替實施開閉操作以便載氣脈衝穿過螺旋輸送機之流道。第二載氣亦可採用脈衝式輸送方式。該閥門較佳為一可將載氣流送入該流道或排出管之切換閥。該載氣流較佳係被定量施加。此點藉由質量流量調節器而達成。該儲存容器可具有如US 7,501,152 B2所描述之攪拌器。該攪拌器可由用於驅動該螺旋輸送機旋轉的同一馬達驅動。該攪拌器為一呈螺旋狀彎曲的線,此線受驅時會繞螺旋軸轉動。該容器旋轉對稱。該攪拌器之軸體平行於該螺桿之軸體。 The invention first proposes the main solution: the screw conveyor has an axial flow path through which the carrier gas stream passes. Thereby, the function of the gas gel generator in the evaporation device can be improved. In the case where the end of the support chamber of the screw conveyor is properly formed, the powder particles conveyed by the screw conveyor will move radially inward at the end of the screw conveyor and directly into the carrier gas stream flowing from the end of the screw conveyor. The flow path is located within the axis of rotation of the screw conveyor. The powder particles are transported in the form of suspended particles from the carrier gas through a gas gel line to an evaporator where they absorb heat and vaporize into a vapor. The carrier gas stream enriched in vapor of the evaporated organic starting material is passed through a vapor line to the CVD reactor. The CVD reactor has a showerhead type gas distributor, the bottom surface of which has an outlet surface, and the outlet surface has a plurality of screens The air outlet of the arrangement. The vapor-rich carrier gas flows through the gas distributor and the gas outlets into a processing chamber disposed below the gas distributor. The bottom of the processing chamber is formed by a base on which a coating, for example, of glass, is applied. A substrate that is cooled by the cooling element of the susceptor to a temperature at which the vapor condenses on the surface of the substrate. The gas glue directly formed at the end of the screw conveyor can be fed into the gas glue pipe by a second carrier gas flow flowing transversely to the screw conveyor. However, the gas pipeline can also be aligned with the flow channel. In the case of a straight line, a second carrier gas can also be delivered to the gas line at the feed point. If the first carrier gas stream exits the center of a rotationally symmetric feed system, the second carrier gas may be provided by a nozzle system disposed radially outward. The carrier gas delivery tube of the first carrier gas may have a valve that alternately performs an opening and closing operation so that the carrier gas pulse passes through the flow path of the screw conveyor. The second carrier gas can also be pulsed. The valve is preferably a switching valve that delivers a carrier gas stream to the flow or discharge line. The carrier gas stream is preferably applied quantitatively. This is achieved by a mass flow regulator. The storage container can have a stirrer as described in US 7,501,152 B2. The agitator can be driven by the same motor used to drive the screw conveyor to rotate. The agitator is a helically curved wire that rotates about a helix when driven. The container is rotationally symmetrical. The shaft of the agitator is parallel to the shaft of the screw.
下文將參照附圖對本發明之實施例進行說明。 Embodiments of the present invention will be described below with reference to the accompanying drawings.
圖1為用於沉積OLED層於基板20之裝置的示意圖。所 用之CVD反應器3在圖1中已作大幅縮小處理。該反應器內設蓮蓬頭型氣體分佈器18,其底面設有多個指向處理室19的出氣口,該處理室的底部由經冷卻之基座21構成,待塗佈基板20平放於該基座表面。用真空泵22可在處理室19內部設定較大範圍之總壓。通常採用介於1 mbar與100 mbar之間的總壓。 FIG. 1 is a schematic illustration of an apparatus for depositing an OLED layer on a substrate 20. Place The CVD reactor 3 used has been greatly reduced in Fig. 1. The reactor is provided with a showerhead type gas distributor 18, and a bottom surface thereof is provided with a plurality of air outlets directed to the processing chamber 19. The bottom of the processing chamber is composed of a cooled base 21, and the substrate to be coated 20 is laid flat on the base. Seat surface. A wide range of total pressures can be set inside the processing chamber 19 by the vacuum pump 22. A total pressure between 1 mbar and 100 mbar is usually used.
氣體分佈器18由蒸氣輸送管17提供處理氣體。該處理氣體為一由載氣輸送之有機起始材料的蒸氣,此蒸氣在基板20上冷凝形成薄層。 The gas distributor 18 is supplied with a process gas by a vapor delivery pipe 17. The process gas is a vapor of an organic starting material transported by a carrier gas which condenses on the substrate 20 to form a thin layer.
為了產生該蒸氣,首先需在氣膠產生器1內用粉末狀有機起始材料5及載氣流25產生一氣膠,該氣膠由氣膠管道15送入蒸發器2,載氣流25所輸送的懸浮粒子在此蒸發器內蒸發。為此,蒸發器2具有需經加熱處理之蒸發元件16。該蒸發元件較佳為一開孔結構。該開孔結構可為開孔固態泡沫。孔壁形成曲線型通道。通道壁則構成蒸發面。懸浮粒子與蒸發面發生表面接觸後獲得蒸發熱,從而被蒸發並作為蒸氣由載氣流25經蒸氣管道17送往CVD反應器3。 In order to generate the vapor, first, a powdered organic starting material 5 and a carrier gas stream 25 are used in the gas gel generator 1 to produce a gas gel which is sent from the gas glue line 15 to the evaporator 2, and is transported by the carrier gas stream 25. The suspended particles evaporate in this evaporator. To this end, the evaporator 2 has an evaporation element 16 to be heat treated. The evaporation element is preferably an open cell structure. The open cell structure can be an open cell solid foam. The walls of the holes form a curved channel. The channel walls form the evaporation surface. The surface of the suspended particles is brought into surface contact with the evaporation surface to obtain heat of evaporation, which is evaporated and sent as vapor to the CVD reactor 3 from the carrier gas stream 25 via the vapor line 17.
載氣流25由質量流量調節器27定量施加。定量施加的載氣流25可由切換閥26送入載氣輸送管12或排出管28。透過快速切換操作,載氣25可脈衝式穿過載氣輸送管12。 Carrier gas stream 25 is metered by mass flow regulator 27. The metered applied carrier gas stream 25 can be fed to the carrier gas delivery tube 12 or the discharge tube 28 by the switching valve 26. The carrier gas 25 can be pulsed through the carrier gas delivery tube 12 by a rapid switching operation.
載氣輸送管12與分佈於螺旋輸送機8之軸體內的流道10連通。螺旋輸送機8在其外護套壁上具有一或多個呈螺旋狀 佈置的輸送條。用驅動裝置11驅動螺旋輸送機8旋轉後,儲存於儲存容器4內的粉末狀有機起始材料5被輸送至螺旋輸送機8之末端,流道10的出口14即位於此末端。 The carrier gas delivery pipe 12 communicates with the flow path 10 distributed in the shaft body of the screw conveyor 8. The screw conveyor 8 has one or more spirals on its outer sheath wall Arranged conveyor strips. After the screw conveyor 8 is driven to rotate by the driving device 11, the powdery organic starting material 5 stored in the storage container 4 is conveyed to the end of the screw conveyor 8, and the outlet 14 of the flow path 10 is located at the end.
儲存容器4內設由馬達7驅動之攪拌器8,該攪拌器負責為螺旋輸送機8均勻裝料。 The storage container 4 is provided with an agitator 8 driven by a motor 7, which is responsible for uniformly charging the screw conveyor 8.
藉由螺旋輸送機8之旋轉,盛裝於螺旋凸條24間之輸送槽23內的粉末被輸送至進料點13。其中,螺旋輸送機8在支撐管9內旋轉,該支撐管之末端呈漏斗狀逐漸變細,遂使得該粉末經由端面與漏斗型末端9'之間的縫隙到達流道10之出口14前方。 The powder contained in the conveying groove 23 between the spiral ribs 24 is conveyed to the feed point 13 by the rotation of the screw conveyor 8. Wherein, the screw conveyor 8 rotates in the support tube 9, and the end of the support tube is tapered in a funnel shape, so that the powder reaches the front of the outlet 14 of the flow path 10 via the gap between the end surface and the funnel-shaped end 9'.
載氣流25離開出口14後經氣膠管道15將懸浮粒子形式之該粉末輸送至蒸發器16。 After the carrier gas stream 25 exits the outlet 14, the powder in the form of suspended particles is delivered to the evaporator 16 via the gas line conduit 15.
在圖3及圖4所示實施例中,螺旋輸送機8及攪拌器6由同一馬達7驅動,其中,攪拌器6之軸體與螺旋輸送機8之軸體相互平行且藉齒輪彼此連接。圓柱型儲存容器4內設可旋轉之螺旋線,攪拌器6即由該螺旋線構成。支撐管9之末端33由一管接頭構成,其端面構成漏斗9'。該管接頭適於插入某一管件之開口。 In the embodiment shown in Figs. 3 and 4, the screw conveyor 8 and the agitator 6 are driven by the same motor 7, wherein the shaft body of the agitator 6 and the shaft body of the screw conveyor 8 are parallel to each other and connected to each other by a gear. The cylindrical storage container 4 is provided with a rotatable spiral, and the agitator 6 is composed of the spiral. The end 33 of the support tube 9 is formed by a pipe joint whose end faces constitute a funnel 9'. The pipe joint is adapted to be inserted into the opening of a pipe.
在圖5及圖6所示實施例中,管接頭33插在一通第二載氣流29之管件的護套開口內。該管件由此在進料點13上游形成用於輸送第二載氣29之載氣輸送管30。此管件在進料點13下游形成氣膠管道15。在進料點13上,由螺旋輸送 機8輸送的粉末被貫穿流道10而過的第一載氣流25送入。 In the embodiment shown in Figures 5 and 6, the pipe joint 33 is inserted into the sheath opening of the tubular member through the second carrier gas stream 29. The tube thus forms a carrier gas delivery tube 30 for transporting the second carrier gas 29 upstream of the feed point 13. This tube forms a gas line 15 downstream of the feed point 13. At feed point 13, by screw conveyor The powder conveyed by the machine 8 is fed by the first carrier gas stream 25 that has passed through the flow path 10.
圖7及圖8所示實施例係將氣膠自端面送入氣膠管道15。管接頭33在此係插在噴嘴頭31中,藉該噴嘴頭可將第二載氣流29送入氣膠管道15。此點係藉由管接頭33周圍為第二載氣29設置的進料區而達成,該進料區形成多個開口32,第二載氣29被載氣輸送管30送入噴嘴頭31後經該等開口流入氣膠管道15。 The embodiment shown in Figures 7 and 8 feeds the gas glue from the end face into the gas glue line 15. The pipe joint 33 is here inserted in the nozzle head 31, by means of which the second carrier gas stream 29 can be fed into the gas line conduit 15. This point is achieved by a feed zone provided around the pipe joint 33 as a second carrier gas 29 which forms a plurality of openings 32 into which the second carrier gas 29 is fed by the carrier gas delivery pipe 30. The gas passages 15 are flowed through the openings.
如圖9所示之實施例不使用第二載氣。氣膠管道15之管端在此直接插在管接頭33上。載氣25穿過設於螺旋輸送機8之旋轉軸內的流道10後在流道10的出口14處,將自徑向外側朝旋轉中心運動的粉末粒子裹挾於其中並將其作為懸浮粒子輸送至蒸發器2。 The embodiment shown in Figure 9 does not use a second carrier gas. The pipe end of the gas glue line 15 is here inserted directly onto the pipe joint 33. After the carrier gas 25 passes through the flow path 10 provided in the rotating shaft of the screw conveyor 8, at the outlet 14 of the flow path 10, powder particles moving from the radially outer side toward the center of rotation are wrapped therein and used as suspended particles. It is sent to the evaporator 2.
所有已揭示特徵(自身即)為發明本質所在。故本申請之揭示內容亦包含相關/所附優先權檔案(在先申請副本)所揭示之全部內容,該等檔案所述特徵亦一併納入本申請之申請專利範圍。附屬項採用可選並列措辭對本發明針對先前技術之改良方案的特徵予以說明,其目的主要在於在該等申請專利範圍基礎上進行分案申請。 All the revealed features (ie, themselves) are the essence of the invention. Therefore, the disclosure of the present application also contains all the contents disclosed in the related/attached priority file (copy of the prior application), and the features described in the file are also included in the scope of the patent application of the present application. The sub-items describe the features of the prior art improvements of the prior art using optional side-by-side terms, the main purpose of which is to apply for division on the basis of the scope of such patent applications.
1‧‧‧氣膠產生器 1‧‧‧ gas glue generator
2‧‧‧蒸發器 2‧‧‧Evaporator
3‧‧‧CVD反應器 3‧‧‧ CVD reactor
4‧‧‧儲存容器 4‧‧‧ storage container
5‧‧‧粉末狀有機起始材料 5‧‧‧Powdered organic starting materials
6‧‧‧攪拌器 6‧‧‧Agitator
7‧‧‧馬達 7‧‧‧Motor
8‧‧‧螺旋輸送機 8‧‧‧Spiral conveyor
9‧‧‧支撐管 9‧‧‧Support tube
9'‧‧‧末端/漏斗 9'‧‧‧End/Funnel
10‧‧‧流道 10‧‧‧ flow path
11‧‧‧驅動裝置 11‧‧‧ drive
12‧‧‧載氣輸送管 12‧‧‧Carrier delivery tube
13‧‧‧進料點 13‧‧‧ Feeding point
14‧‧‧出口 14‧‧‧Export
15‧‧‧氣膠管道 15‧‧‧ gas pipeline
16‧‧‧蒸發元件 16‧‧‧Evaporation components
17‧‧‧蒸氣管道/蒸氣輸送管 17‧‧‧Vapor Pipe/Vapor Pipe
18‧‧‧氣體分佈器 18‧‧‧ gas distributor
19‧‧‧處理室 19‧‧‧Processing room
20‧‧‧基板 20‧‧‧Substrate
21‧‧‧基座 21‧‧‧Base
22‧‧‧真空泵 22‧‧‧Vacuum pump
23‧‧‧輸送槽 23‧‧‧ conveyor
24‧‧‧螺旋凸條 24‧‧‧Spiral ribs
25‧‧‧載氣流/載氣 25‧‧‧Air carrier/carrier gas
26‧‧‧閥門/切換閥 26‧‧‧Valve/switching valve
27‧‧‧質量流量調節器 27‧‧‧Quality flow regulator
28‧‧‧排出管 28‧‧‧Draining tube
29‧‧‧第二載氣/第二載氣流 29‧‧‧Second carrier gas/second carrier gas flow
30‧‧‧載氣輸送管 30‧‧‧Carrier delivery tube
31‧‧‧噴嘴頭 31‧‧‧Nozzle head
32‧‧‧開口 32‧‧‧ openings
33‧‧‧管接頭/末端 33‧‧‧Fittings/ends
圖1為本發明裝置示意圖;圖2為圖1中用II-II虛線所劃定區域之放大圖;圖3為氣膠產生器1之輸送裝置的透視圖; 圖4為圖3所示輸送裝置的視圖,其螺旋輸送機支架部分為剖面圖;圖5為圖3及圖4所示輸送裝置的俯視圖,其管件部分為剖面圖,由該輸送裝置輸送之粒子被注入此管件;圖6為沿圖5中VI-VI線所截取之剖面圖;圖7為圖3及圖4所示輸送裝置之另一應用實例,其中,由該輸送裝置輸送的粉末粒子沿軸向被送入氣膠管道15;圖8為沿圖7中VIII-VIII線所截取之剖面圖;及圖9為圖3及圖4所示輸送裝置之另一應用實例,此實例同樣係沿軸向為氣膠管道15送料。 1 is a schematic view of a device according to the present invention; FIG. 2 is an enlarged view of a region defined by a broken line II-II in FIG. 1; and FIG. 3 is a perspective view of a conveying device of the gas gel generator 1; Figure 4 is a view of the conveying device of Figure 3, the screw conveyor bracket portion is a cross-sectional view; Figure 5 is a top view of the conveyor device shown in Figures 3 and 4, the pipe portion is a sectional view, transported by the conveyor device The particles are injected into the tube; FIG. 6 is a cross-sectional view taken along line VI-VI of FIG. 5; and FIG. 7 is another application example of the conveying device shown in FIGS. 3 and 4, wherein the powder conveyed by the conveying device The particles are fed into the gas glue pipe 15 in the axial direction; FIG. 8 is a cross-sectional view taken along line VIII-VIII of FIG. 7; and FIG. 9 is another application example of the conveying device shown in FIGS. 3 and 4, this example Similarly, the gas line 15 is fed in the axial direction.
1‧‧‧氣膠產生器 1‧‧‧ gas glue generator
4‧‧‧儲存容器 4‧‧‧ storage container
6‧‧‧攪拌器 6‧‧‧Agitator
7‧‧‧馬達 7‧‧‧Motor
8‧‧‧螺旋輸送機 8‧‧‧Spiral conveyor
9‧‧‧支撐管 9‧‧‧Support tube
10‧‧‧流道 10‧‧‧ flow path
11‧‧‧驅動裝置 11‧‧‧ drive
12‧‧‧載氣輸送管 12‧‧‧Carrier delivery tube
13‧‧‧進料點 13‧‧‧ Feeding point
14‧‧‧出口 14‧‧‧Export
23‧‧‧輸送槽 23‧‧‧ conveyor
24‧‧‧螺旋凸條 24‧‧‧Spiral ribs
25‧‧‧載氣流/載氣 25‧‧‧Air carrier/carrier gas
Claims (10)
Applications Claiming Priority (1)
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DE102011051263.2A DE102011051263B4 (en) | 2011-06-22 | 2011-06-22 | Device for aerosol generation and deposition of a light-emitting layer |
Publications (1)
Publication Number | Publication Date |
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TW201305377A true TW201305377A (en) | 2013-02-01 |
Family
ID=46395583
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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TW101121522A TW201305377A (en) | 2011-06-22 | 2012-06-15 | Device for generating aerosol and depositing a light-emitting layer |
Country Status (3)
Country | Link |
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DE (1) | DE102011051263B4 (en) |
TW (1) | TW201305377A (en) |
WO (1) | WO2012175315A1 (en) |
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CN114040808A (en) * | 2019-03-13 | 2022-02-11 | 梅托克斯技术公司 | Solid precursor feed system for thin film deposition |
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DE102013106863A1 (en) | 2013-07-01 | 2015-01-08 | Aixtron Se | Device for determining the mass flow of a vapor transported in a carrier gas |
DE102014101792A1 (en) | 2014-02-13 | 2015-08-13 | Aixtron Se | Device for determining the mass flow of a gas or gas mixture with nested tubular filament arrangements |
KR102369676B1 (en) * | 2017-04-10 | 2022-03-04 | 삼성디스플레이 주식회사 | Apparatus and method for manufacturing a display apparatus |
DE102017112668A1 (en) * | 2017-06-08 | 2018-12-13 | Aixtron Se | Method for depositing OLEDs |
DE102017119565A1 (en) | 2017-08-25 | 2019-02-28 | Aixtron Se | Apparatus and method for conveying a powder, in particular as a component of a coating device |
DE202018107303U1 (en) | 2018-12-20 | 2019-01-14 | gemeinnützige KIMW Forschungs-GmbH | Dosing device for dosing a powdery substance and CVD system with such a dosing device |
DE102018133068B4 (en) | 2018-12-20 | 2020-10-22 | gemeinnützige KIMW Forschungs-GmbH | Dosing device for dosing a powdery substance |
WO2021223844A1 (en) * | 2020-05-05 | 2021-11-11 | gemeinnützige KIMW Forschungs-GmbH | Apparatus for the vapour deposition of a substance on a substrate |
CN113457479B (en) * | 2021-07-22 | 2022-09-23 | 上海交通大学 | Dust aerosol generating system with constant and stable quantitative concentration |
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DE497689C (en) | 1930-05-12 | Fritz Kirchner | Device for centrifuging grainy material by means of a pressure medium jet | |
EP0585848A1 (en) | 1992-09-02 | 1994-03-09 | Hoechst Aktiengesellschaft | Method and apparatus for thin film formation by CVD |
JP3118493B2 (en) * | 1993-04-27 | 2000-12-18 | 菱電セミコンダクタシステムエンジニアリング株式会社 | Liquid material CVD equipment |
DE19638100C1 (en) | 1996-09-18 | 1998-03-05 | Fraunhofer Ges Forschung | Apparatus to produce vaporous reaction product from solid particles |
US6037241A (en) | 1998-02-19 | 2000-03-14 | First Solar, Llc | Apparatus and method for depositing a semiconductor material |
DE29813915U1 (en) * | 1998-07-24 | 1998-10-08 | Dieter Sojak Silo-Dosieranlagen GmbH, 23879 Mölln | Feed system for the metered introduction of powdery substances into a gas stream |
DE10007059A1 (en) * | 2000-02-16 | 2001-08-23 | Aixtron Ag | Method and device for producing coated substrates by means of condensation coating |
DE10202490C1 (en) | 2002-01-23 | 2003-12-04 | Schwaebische Huettenwerke Gmbh | Device for introducing secondary fuels into an incineration plant |
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CN101525743B (en) * | 2009-04-23 | 2011-06-15 | 浙江嘉远格隆能源股份有限公司 | Method for depositing semi-conductor film on substrate by using close-space sublimation technology and device thereof |
-
2011
- 2011-06-22 DE DE102011051263.2A patent/DE102011051263B4/en active Active
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2012
- 2012-06-01 WO PCT/EP2012/060413 patent/WO2012175315A1/en active Application Filing
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CN114040808A (en) * | 2019-03-13 | 2022-02-11 | 梅托克斯技术公司 | Solid precursor feed system for thin film deposition |
Also Published As
Publication number | Publication date |
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WO2012175315A1 (en) | 2012-12-27 |
DE102011051263A1 (en) | 2012-12-27 |
DE102011051263B4 (en) | 2022-08-11 |
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