TW201301528A - Conductive paste and solar cell - Google Patents

Conductive paste and solar cell Download PDF

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TW201301528A
TW201301528A TW101117446A TW101117446A TW201301528A TW 201301528 A TW201301528 A TW 201301528A TW 101117446 A TW101117446 A TW 101117446A TW 101117446 A TW101117446 A TW 101117446A TW 201301528 A TW201301528 A TW 201301528A
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electrode
conductive paste
alkali metal
metal compound
melting point
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Yorinobu Maeda
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Murata Manufacturing Co
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02Details
    • H01L31/0224Electrodes
    • H01L31/022408Electrodes for devices characterised by at least one potential jump barrier or surface barrier
    • H01L31/022425Electrodes for devices characterised by at least one potential jump barrier or surface barrier for solar cells
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/20Conductive material dispersed in non-conductive organic material
    • H01B1/22Conductive material dispersed in non-conductive organic material the conductive material comprising metals or alloys
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/547Monocrystalline silicon PV cells

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  • Condensed Matter Physics & Semiconductors (AREA)
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Abstract

This conductive paste contains an Ag powder, a binder resin and an organic solvent, while additionally containing an alkali metal compound having a melting point of 1,000 DEG C or less. It is particularly preferable to use Li as the alkali metal. As a compound form of the alkali metal compound, a carboxylic salt or an amide having a melting point of 400 DEG C or less is preferable, and a carbonate or a borate may also be used. A light-receiving surface electrode (3) is formed using this conductive paste. Consequently, there can be provided a conductive paste for solar cell electrodes, which enables good battery characteristics, while achieving good fire-through performance and low electrode resistivity.

Description

導電性糊及太陽能電池 Conductive paste and solar cell

本發明係關於一種導電性糊及太陽能電池,更詳細而言,本發明係關於一種適宜形成太陽能電池之電極之導電性糊及使用該導電性糊而製造之太陽能電池。 The present invention relates to a conductive paste and a solar cell. More specifically, the present invention relates to a conductive paste suitable for forming an electrode of a solar cell and a solar cell produced using the conductive paste.

太陽能電池通常於半導體基板之一主表面上形成有特定圖案之受光面電極。又,於除上述受光面電極以外之半導體基板上形成有抗反射膜,以上述抗反射膜抑制所入射之太陽光之反射損失,藉此提高太陽光向電能之轉換效率。 A solar cell is generally formed with a specific pattern of light-receiving surface electrodes on one main surface of a semiconductor substrate. Further, an anti-reflection film is formed on the semiconductor substrate other than the light-receiving surface electrode, and the reflection loss of the incident sunlight is suppressed by the anti-reflection film, thereby improving the conversion efficiency of sunlight to electric energy.

上述受光面電極通常係於抗反射膜之表面塗佈導電性糊而形成特定圖案之導電膜,並進行煅燒而形成。即,導電膜下層之抗反射膜藉由氮化矽(SiNx)等絕緣體而形成,因此於形成受光面電極之煅燒過程中分解、去除上述抗反射膜,使導電膜燒結而形成受光面電極,並且使該受光面電極與半導體基板接著而導通兩者。 The light-receiving surface electrode is usually formed by applying a conductive paste to the surface of the anti-reflection film to form a conductive film having a specific pattern, and firing the film. In other words, since the antireflection film of the lower layer of the conductive film is formed by an insulator such as tantalum nitride (SiN x ), the antireflection film is decomposed and removed during the firing of the light-receiving surface electrode, and the conductive film is sintered to form a light-receiving surface electrode. And the light-receiving surface electrode and the semiconductor substrate are connected to each other.

如此般於煅燒過程分解、去除抗反射膜而使半導體基板與受光面電極接著之方法稱為燒透(fire through,煅燒貫通),太陽能電池之轉換效率較大程度上依賴於燒透性。即,若燒透性不充分,則於受光面電極與半導體基板之間會殘存抗反射膜,故受光面電極與半導體基板之間之導通性降低,其結果轉換效率降低,作為太陽能電池之基本性能較差。 The method of decomposing and removing the anti-reflection film in the calcination process to cause the semiconductor substrate and the light-receiving surface electrode to follow is referred to as "fire through", and the conversion efficiency of the solar cell largely depends on the fire-through property. In other words, when the burn-through property is insufficient, an anti-reflection film remains between the light-receiving surface electrode and the semiconductor substrate, so that the conductivity between the light-receiving surface electrode and the semiconductor substrate is lowered, and as a result, the conversion efficiency is lowered, and the solar cell is basically used. Poor performance.

因此,為提高太陽能電池之特性,需要提高燒透性,由 於Ag等導電性粉末之燒透性較差,故先前將ZnO等無機氧化物添加至導電性糊中而提高其燒透性。 Therefore, in order to improve the characteristics of solar cells, it is necessary to improve the fire-through property. Since the electrical conductivity of the conductive powder such as Ag is inferior, an inorganic oxide such as ZnO is added to the conductive paste to improve the fire-through property.

例如,於專利文獻1中,提出於有機介質中分散有Ag粉末、含有Zn之添加劑及1種或複數種無鉛玻璃料之厚膜導電性組合物。 For example, Patent Document 1 proposes a thick film conductive composition in which an Ag powder, an additive containing Zn, and one or a plurality of lead-free glass frits are dispersed in an organic medium.

於該專利文獻1中,欲藉由使用含有2~10重量%之ZnO及0.5~4重量%之玻璃料之導電性糊(厚膜導電性組合物),而獲得具有良好之接著強度且轉換效率良好之太陽能電池。 In Patent Document 1, a conductive paste (thick film conductive composition) containing 2 to 10% by weight of ZnO and 0.5 to 4% by weight of a glass frit is used, and a good bonding strength is obtained and converted. A solar cell that is efficient.

又,於專利文獻2中,提出一種含有Ag粉末、ZnO粉末、無鉛玻璃料、有機溶劑,且無鉛玻璃料以總玻璃料作為基準Bi2O3>5 mol%、B2O3<15 mol%、BaO<5 mol%、SrO<5 mol%、Al2O3<5 mol%,(ZnO之含量/Ag粉末之含量)×100超過2.5之厚膜導電性組合物。 Further, in Patent Document 2, an Ag powder, a ZnO powder, a lead-free glass frit, and an organic solvent are proposed, and the lead-free glass frit is based on the total glass frit, Bi 2 O 3 >5 mol%, and B 2 O 3 <15 mol. %, BaO < 5 mol%, SrO < 5 mol%, Al 2 O 3 < 5 mol%, (content of ZnO / content of Ag powder) × 100 thick film conductive composition.

於該專利文獻2中,藉由將ZnO與Ag粉末之含量設為(ZnO之含量/銀粉末之含量)×100>2.5,典型而言,將組合物中之ZnO設為0.5~15.0重量%,而謀求太陽能電池之電氣性能之提高。 In Patent Document 2, by setting the content of ZnO and Ag powder to be (content of ZnO/content of silver powder) × 100>2.5, typically, ZnO in the composition is set to 0.5 to 15.0% by weight. And seek for the improvement of the electrical performance of solar cells.

又,於專利文獻3中,提出有包含由混合物所製作之接點之太陽能電池,且於煅燒之前上述混合物包含固體部分及有機部分,上述固體部分包含Ag等導電性金屬成分:約85~約99重量%及玻璃成分:約1~約15重量%,且該玻璃成分不含鉛。 Further, Patent Document 3 proposes a solar cell including a contact made of a mixture, and the mixture contains a solid portion and an organic portion before calcination, and the solid portion contains a conductive metal component such as Ag: about 85 to about 99% by weight and glass component: about 1 to about 15% by weight, and the glass component does not contain lead.

進而,於專利文獻3中,揭示有上述固體部分係將SnO、ZnO等特定氧化物或2Li2O‧5V2O5等特定複合氧化 物添加至玻璃成分中之太陽能電池接點。 Further, Patent Document 3 discloses that the solid portion is a solar cell contact in which a specific oxide such as SnO or ZnO or a specific composite oxide such as 2Li 2 O‧5V 2 O 5 is added to the glass component.

並且,於專利文獻3中,藉由使用上述組成之導電性糊,即使於玻璃成分中不含有環境負荷較大之鉛亦可於受光面電極之煅燒過程中促進抗反射膜之去除,藉此可降低受光面電極與半導體基板之間之接觸電阻。 Further, in Patent Document 3, by using the conductive paste having the above composition, even if the glass component does not contain lead having a large environmental load, the anti-reflection film can be removed during the firing of the light-receiving electrode. The contact resistance between the light-receiving surface electrode and the semiconductor substrate can be reduced.

先前技術文獻Prior technical literature 專利文獻Patent literature

專利文獻1:日本專利特開2006-332032號公報(參照請求項1、段落號[0024]、[0031]、[0058]等) Patent Document 1: Japanese Laid-Open Patent Publication No. 2006-332032 (refer to claim 1, paragraph number [0024], [0031], [0058], etc.)

專利文獻2:日本專利特表2010-524257號公報(參照請求項1、段落號[0026]~[0028]等) Patent Document 2: Japanese Patent Laid-Open Publication No. 2010-524257 (refer to claim 1, paragraph number [0026] to [0028], etc.)

專利文獻3:日本專利特表2008-543080號公報(參照請求項1、段落號[0017]) Patent Document 3: Japanese Patent Laid-Open Publication No. 2008-543080 (refer to Request No. 1, Paragraph No. [0017])

然而,上述專利文獻1~3均係使導電性糊中含有ZnO等無機氧化物或玻璃料等添加物而謀求燒透性之提高,但該等添加物之含量較多,導電性粉末之含量相對減少,故存在電極之比電阻變高之問題。 However, in the above-mentioned Patent Documents 1 to 3, the conductive paste contains an additive such as an inorganic oxide such as ZnO or a glass frit to improve the fire permeability, but the content of the additives is large, and the content of the conductive powder is high. Relatively less, there is a problem that the specific resistance of the electrode becomes high.

本發明係鑒於此種情況而完成者,其目的在於提供一種燒透性良好、電極之比電阻亦較低,且可獲得良好之電池特性之太陽能電池電極用之導電性糊及使用該導電性糊而製造之太陽能電池。 The present invention has been made in view of such circumstances, and an object thereof is to provide a conductive paste for a solar cell electrode which has good fire-through property, a low specific resistance of an electrode, and which can obtain good battery characteristics, and uses the conductivity. A solar cell made by paste.

本發明者為達成上述目的而進行銳意研究,結果得到以下見解:僅使導電性糊中含有熔點為1000℃以下之鹼金屬化合物,即使不含有無機氧化物亦可有效地產生燒透,藉此可於電極中增加源自於導電性粉末之金屬成分之含有比率,而可降低電極之比電阻。 The present inventors conducted intensive studies to achieve the above object, and as a result, it has been found that only an alkali metal compound having a melting point of 1000 ° C or less is contained in the conductive paste, and even if it does not contain an inorganic oxide, it is effective to cause permeation. The content ratio of the metal component derived from the conductive powder can be increased in the electrode, and the specific resistance of the electrode can be lowered.

本發明係基於此種見解而完成者,本發明之導電性糊之特徵在於,其係用以形成太陽能電池之電極之導電性糊,且含有導電性粉末、黏合劑樹脂及溶劑,且含有熔點為1000℃以下之鹼金屬化合物。 The present invention has been completed based on the above-described findings, and the conductive paste of the present invention is characterized in that it is used to form a conductive paste of an electrode of a solar cell, and contains a conductive powder, a binder resin, a solvent, and a melting point. It is an alkali metal compound of 1000 ° C or less.

藉此,即使不添加無機氧化物亦可有效地產生燒透。而且,可於電極中增加源自於導電性粉末之金屬成分之含有比率,故可降低電極之比電阻,藉此可提高太陽能電池之轉換效率。 Thereby, fire-through can be effectively produced even without adding an inorganic oxide. Further, since the content ratio of the metal component derived from the conductive powder can be increased in the electrode, the specific resistance of the electrode can be lowered, whereby the conversion efficiency of the solar cell can be improved.

又,熔點較低之鹼金屬化合物於乾燥時至煅燒時容易於基板界面流動。因此,即使添加微量亦可充分產生鹼金屬特有之燒透性。因此,鹼金屬化合物之熔點越低越佳,較佳為800℃以下,進而較佳為400℃以下。 Further, the alkali metal compound having a lower melting point tends to flow at the substrate interface from the time of drying to the calcination. Therefore, even if a trace amount is added, the burnt property peculiar to the alkali metal can be sufficiently produced. Therefore, the lower the melting point of the alkali metal compound, the better, preferably 800 ° C or lower, more preferably 400 ° C or lower.

即,本發明之導電性糊較佳為上述鹼金屬化合物之熔點為800℃以下。 That is, the conductive paste of the present invention preferably has a melting point of the alkali metal compound of 800 ° C or less.

進而,本發明之導電性糊較佳為上述鹼金屬化合物之熔點為400℃以下。 Further, in the conductive paste of the present invention, it is preferred that the alkali metal compound has a melting point of 400 ° C or lower.

又,本發明之導電性糊較佳為上述鹼金屬化合物含有羧酸鹽及胺類中至少任一種。 Further, in the conductive paste of the present invention, it is preferable that the alkali metal compound contains at least one of a carboxylate and an amine.

於此情形時,可確保更良好之燒透性。 In this case, a better burntability can be ensured.

又,本發明之導電性糊較佳為上述鹼金屬化合物含有碳酸鹽及硼酸鹽中至少任一種。 Further, in the conductive paste of the present invention, it is preferable that the alkali metal compound contains at least one of a carbonate and a borate.

於此情形時,即使熔點相對較高或添加微量,亦可實現具有所期望之燒透性且電極之比電阻較低之太陽能電池電極用導電性糊。 In this case, even if the melting point is relatively high or a small amount is added, a conductive paste for a solar cell electrode having desired burnt property and a low specific resistance of the electrode can be realized.

又,本發明之導電性糊較佳為上述鹼金屬化合物中所含有之鹼金屬元素為鋰。 Further, in the conductive paste of the present invention, it is preferable that the alkali metal element contained in the alkali metal compound is lithium.

於此情形時,可實現燒透性更良好且可謀求低線電阻之導電性糊。 In this case, a conductive paste which is more excellent in fire-through property and can achieve low line resistance can be obtained.

又,本發明之導電性糊較佳為上述鹼金屬化合物之含量為2重量%以下(不包含0重量%)。 Further, the conductive paste of the present invention preferably has a content of the alkali metal compound of 2% by weight or less (excluding 0% by weight).

藉此,可實現電極之比電阻不增大而燒透性良好且可謀求低線電阻之導電性糊。 Thereby, it is possible to realize a conductive paste in which the specific resistance of the electrode is not increased and the fire-through property is good and the low-line resistance can be obtained.

又,本發明之導電性糊較佳為上述導電性粉末為Ag粉末。 Further, in the conductive paste of the present invention, it is preferable that the conductive powder is Ag powder.

又,本發明之太陽能電池之特徵在於:於半導體基板之一主表面上形成抗反射膜及貫通該抗反射膜之電極,且上述電極係由上述任一項中記載之導電性糊燒結而成。 Further, the solar cell of the present invention is characterized in that an antireflection film and an electrode penetrating the antireflection film are formed on one main surface of the semiconductor substrate, and the electrode is sintered by the conductive paste described in any one of the above. .

根據本發明之導電性糊,由於其含有導電性粉末(較佳為Ag粉末)、黏合劑樹脂及溶劑,且含有熔點為1000℃以下之鹼金屬化合物,故即使不添加無機氧化物亦可有效地產生燒透。而且,可於電極中增加源自於導電性粉末之金屬成分之含有比率,故可降低電極之比電阻,藉此可提高 太陽能電池之轉換效率。 The conductive paste of the present invention contains an electroconductive powder (preferably Ag powder), a binder resin and a solvent, and contains an alkali metal compound having a melting point of 1000 ° C or less, so that it can be effective even without adding an inorganic oxide. The ground is burnt through. Moreover, since the content ratio of the metal component derived from the conductive powder can be increased in the electrode, the specific resistance of the electrode can be lowered, thereby improving Conversion efficiency of solar cells.

又,根據本發明之太陽能電池,由於其於半導體基板之一主表面形成抗反射膜及貫通該抗反射膜之電極,且上述電極係由上述任一項中記載之導電性糊燒結而成,故可獲得半導體基板與電極之導通性良好、電極之比電阻較低,而轉換效率良好之太陽能電池。 Further, according to the solar cell of the present invention, the antireflection film and the electrode penetrating the antireflection film are formed on one main surface of the semiconductor substrate, and the electrode is sintered by the conductive paste described in any one of the above. Therefore, it is possible to obtain a solar cell having good conductivity between the semiconductor substrate and the electrode, low specific resistance of the electrode, and good conversion efficiency.

繼而,詳細說明本發明之實施形態。 Next, embodiments of the present invention will be described in detail.

圖1係使用本發明之導電性糊而製造的太陽能電池之一實施形態之要部剖面圖。 Fig. 1 is a cross-sectional view of an essential part of an embodiment of a solar cell produced by using the conductive paste of the present invention.

該太陽能電池係於以Si作為主成分之半導體基板1之一主表面形成抗反射膜2及受光面電極3,並且於該半導體基板1之另一主表面形成背面電極4。 In the solar cell, the anti-reflection film 2 and the light-receiving surface electrode 3 are formed on one main surface of the semiconductor substrate 1 having Si as a main component, and the back surface electrode 4 is formed on the other main surface of the semiconductor substrate 1.

半導體基板1包含p型半導體層1b與n型半導體層1a,於p型半導體層1b之上表面形成n型半導體層1a。該半導體基板1例如可藉由使雜質擴散於單晶或多晶之p型半導體層1b之一主表面,形成較薄之n型半導體層1a而獲得,只要於p型半導體層1b之上表面形成n型半導體層1a,則其結構及製法並無特別限定。又,半導體基板1亦可使用於n型半導體層1a之一主表面形成有較薄之p型半導體層1b之結構者或於半導體基板1之一主表面之一部分形成有p型半導體層1b與n型半導體層1a二者之結構者。只要係形成有抗反射膜2之半導體基板1之主表面,則均可有效地使用本發明之導電性糊。再者,於圖1中,半導體基板1之表面記載為扁 平狀,為有效地將太陽光封閉於半導體基板1中,其表面係以具有微小凹凸結構之方式而形成。 The semiconductor substrate 1 includes a p-type semiconductor layer 1b and an n-type semiconductor layer 1a, and an n-type semiconductor layer 1a is formed on the upper surface of the p-type semiconductor layer 1b. The semiconductor substrate 1 can be obtained, for example, by diffusing impurities on one main surface of a single crystal or polycrystalline p-type semiconductor layer 1b to form a thin n-type semiconductor layer 1a as long as it is on the upper surface of the p-type semiconductor layer 1b. When the n-type semiconductor layer 1a is formed, the structure and production method thereof are not particularly limited. Further, the semiconductor substrate 1 may be used in a structure in which a thin p-type semiconductor layer 1b is formed on one main surface of the n-type semiconductor layer 1a or a p-type semiconductor layer 1b is formed on a part of one main surface of the semiconductor substrate 1 and The structure of both of the n-type semiconductor layers 1a. The conductive paste of the present invention can be effectively used as long as the main surface of the semiconductor substrate 1 on which the anti-reflection film 2 is formed. Furthermore, in FIG. 1, the surface of the semiconductor substrate 1 is described as flat. The flat shape is such that the sunlight is effectively enclosed in the semiconductor substrate 1, and the surface thereof is formed to have a fine uneven structure.

抗反射膜2係以氮化矽(SiNx)等絕緣性材料而形成,抑制箭頭A所表示之太陽光向受光面之光反射,迅速且效率良好地將太陽光引導至半導體基板1。作為構成該抗反射膜2之材料,並非限定於上述氮化矽,亦可使用其他絕緣性材料,例如氧化矽(SiO2)或氧化鈦(TiO2)等,亦可併用2種以上之絕緣性材料。又,若為結晶Si系,則可使用單晶Si及多晶Si之任一種。 The anti-reflection film 2 is formed of an insulating material such as tantalum nitride (SiN x ), and suppresses the reflection of sunlight reflected by the arrow A on the light-receiving surface, thereby guiding the solar light to the semiconductor substrate 1 quickly and efficiently. The material constituting the anti-reflection film 2 is not limited to the above-described tantalum nitride, and other insulating materials such as ruthenium oxide (SiO 2 ) or titanium oxide (TiO 2 ) may be used, or two or more kinds of insulation may be used in combination. Sexual material. Further, in the case of a crystalline Si system, any of single crystal Si and polycrystalline Si can be used.

受光面電極3係貫通抗反射膜2而形成於半導體基板1上。該受光面電極3可藉由使用絲網印刷等,將下述本發明之導電性糊塗佈於半導體基板1上而製作導電膜,並進行煅燒而形成。即,於形成受光面電極3之煅燒過程中,分解、去除導電膜下層之抗反射膜2而進行燒透,藉此以貫通抗反射膜2之形態於半導體基板1上形成受光面電極3。 The light-receiving surface electrode 3 penetrates the anti-reflection film 2 and is formed on the semiconductor substrate 1. The light-receiving surface electrode 3 can be formed by applying a conductive paste of the present invention to the semiconductor substrate 1 by screen printing or the like to form a conductive film and firing it. In the firing process in which the light-receiving surface electrode 3 is formed, the anti-reflection film 2 of the lower layer of the conductive film is decomposed and removed, and is fired, whereby the light-receiving surface electrode 3 is formed on the semiconductor substrate 1 so as to penetrate the anti-reflection film 2.

具體而言,如圖2所示,受光面電極3係以梳齒狀並排設置大量指狀電極(finger electrode)5a、5b、...5n,並以與指狀電極5a、5b、...5n成交叉狀之方式設置匯流電極6,且指狀電極5a、5b、...5n與匯流電極6電性連接。並且,於除設置受光面電極3之部分以外之剩餘區域形成抗反射膜2。以此方式藉由指狀電極5n對半導體基板1中產生之電力進行集電,並且藉由匯流電極6取出至外部。 Specifically, as shown in FIG. 2, the light-receiving surface electrode 3 is provided with a plurality of finger electrodes 5a, 5b, ... 5n in a comb-tooth shape, and is connected with the finger electrodes 5a, 5b, .. The bus electrodes 6 are provided in a manner of being crossed, and the finger electrodes 5a, 5b, ... 5n are electrically connected to the bus electrodes 6. Further, the anti-reflection film 2 is formed in a remaining region other than the portion where the light-receiving surface electrode 3 is provided. In this way, the electric power generated in the semiconductor substrate 1 is collected by the finger electrodes 5n, and taken out to the outside by the bus electrodes 6.

具體而言,如圖3所示,背面電極4係由形成於p型半導 體層1b之背面之包含Al等之集電電極7、與形成於該集電電極7之背面且與該集電電極7電性連接之包含Ag等之取出電極8而構成。並且,半導體基板1中產生之電力集中於集電電極7中,藉由取出電極8而提取電力。 Specifically, as shown in FIG. 3, the back electrode 4 is formed by a p-type semiconductor The collector electrode 7 including Al or the like on the back surface of the bulk layer 1b is configured to include an extraction electrode 8 including Ag or the like which is formed on the back surface of the collector electrode 7 and electrically connected to the collector electrode 7. Further, electric power generated in the semiconductor substrate 1 is concentrated in the collector electrode 7, and electric power is extracted by taking out the electrode 8.

繼而,對用以形成受光面電極3之本發明之導電性糊進行詳細說明。 Next, the conductive paste of the present invention for forming the light-receiving surface electrode 3 will be described in detail.

本發明之導電性糊含有導電性粉末、黏合劑樹脂及有機溶劑,且含有熔點為1000℃以下之鹼金屬化合物。 The conductive paste of the present invention contains a conductive powder, a binder resin, and an organic solvent, and contains an alkali metal compound having a melting point of 1000 ° C or less.

以此方式藉由使本發明之導電性糊含有鹼金屬化合物,即使於導電性糊中不含有ZnO等無機氧化物或玻璃料,亦可於製作太陽能電池時之煅燒過程中產生燒透。 In this way, when the conductive paste of the present invention contains an alkali metal compound, even if the conductive paste does not contain an inorganic oxide such as ZnO or a glass frit, it can be burnt through during the firing of the solar cell.

即,先前為提高燒透性而添加有相當量之ZnO等無機氧化物。因此,於受光面電極3中,源自於導電性粉末之金屬成分之含有比率降低,其結果,導致電極之比電阻增加。 That is, a considerable amount of an inorganic oxide such as ZnO is previously added to improve the fire permeability. Therefore, in the light-receiving surface electrode 3, the content ratio of the metal component derived from the conductive powder is lowered, and as a result, the specific resistance of the electrode is increased.

然而,根據本發明者之研究結果,已明確含有鹼金屬元素且熔點較低之鹼金屬化合物存在產生燒透性之特有性質。 However, according to the findings of the present inventors, it has been confirmed that an alkali metal compound containing an alkali metal element and having a low melting point has a peculiar property of causing fire-through property.

因此,於本實施形態中,使導電性糊中含有熔點為1000℃以下之鹼金屬化合物,藉此產生燒透性。並且,藉由該鹼金屬化合物產生燒透性只需微量之添加即可,無需如先前之無機氧化物般添加相當分量。 Therefore, in the present embodiment, the conductive paste contains an alkali metal compound having a melting point of 1000 ° C or lower, whereby the fire-through property is generated. Further, it is only necessary to add a small amount of the burnt property by the alkali metal compound, and it is not necessary to add a considerable amount as in the case of the prior inorganic oxide.

即,於本發明中,僅含有微量鹼金屬化合物便可確保燒透性,故可提高受光面電極3中之源自於導電性粉末之金 屬成分之含有比率。因此,亦可降低電極之比電阻,而可進一步提高太陽能電池之轉換效率。 In other words, in the present invention, since only a trace amount of the alkali metal compound is contained, the fire-through property can be ensured, so that the gold derived from the conductive powder in the light-receiving surface electrode 3 can be improved. The content ratio of the genus component. Therefore, the specific resistance of the electrode can also be lowered, and the conversion efficiency of the solar cell can be further improved.

導電性糊中所含之鹼金屬化合物之含量並無特別限定,如上所述以微量便可確保所期望之燒透性。其中,若鹼金屬化合物之含量過剩,則電極之比電阻有增加之傾向,故較佳為2重量%(不包含0重量%)以下。 The content of the alkali metal compound contained in the conductive paste is not particularly limited, and as described above, the desired fire permeability can be ensured in a small amount. However, when the content of the alkali metal compound is excessive, the specific resistance of the electrode tends to increase, so that it is preferably 2% by weight or less (excluding 0% by weight or less).

又,作為鹼金屬化合物,只要熔點較低,且含有鹼金屬元素,則並無特別限定,較佳為使用熔點為1000℃以下、較佳為熔點為800℃以下、進而較佳為熔點為400℃以下之鹼金屬化合物。即,若熔點變低,則鹼金屬化合物於乾燥時至煅燒時於與半導體基板1之n型半導體層1a之界面上流動。因此,藉由含有微量之鹼金屬化合物,可使n型半導體層1a之表面存在充分量之鹼金屬元素,而可飛躍性地提高與n型半導體層1a之界面上之燒透性。 Further, the alkali metal compound is not particularly limited as long as it has a low melting point and contains an alkali metal element, and preferably has a melting point of 1000 ° C or less, preferably a melting point of 800 ° C or less, and more preferably a melting point of 400. An alkali metal compound below °C. That is, when the melting point is lowered, the alkali metal compound flows on the interface with the n-type semiconductor layer 1a of the semiconductor substrate 1 from the time of drying to the time of firing. Therefore, by containing a trace amount of the alkali metal compound, a sufficient amount of the alkali metal element can be present on the surface of the n-type semiconductor layer 1a, and the fire-through property at the interface with the n-type semiconductor layer 1a can be dramatically improved.

並且,作為此種鹼金屬化合物,可較佳地使用含有鹼金屬元素之十二烷酸鹽、十八烷酸鹽、乙酸鹽、乙二酸鹽等羧酸鹽、醯胺類等。 Further, as the alkali metal compound, a carboxylate such as a dodecanoate, an octadecanoate, an acetate or an oxalate containing an alkali metal element, a guanamine or the like can be preferably used.

其中,即使於熔點超過400℃之情形時,含有鹼金屬元素之碳酸鹽或硼酸鹽亦可僅含有微量便可確保良好之燒透性。 Among them, even in the case where the melting point exceeds 400 ° C, the alkali metal-containing carbonate or borate may contain only a trace amount to ensure good fire-through property.

再者,作為鹼金屬元素,並無特別限定,可使用Li、K、Na等,就獲得更小之接觸電阻Rc之觀點而言,可較佳地使用Li。 Further, the alkali metal element is not particularly limited, and Li, K, Na or the like can be used, and Li can be preferably used from the viewpoint of obtaining a smaller contact resistance Rc.

又,作為導電性粉末,只要為具有良好之導電性之金屬 粉,則並無特別限定,可較佳地使用即使於大氣中進行煅燒處理之情形時亦不會氧化而可維持良好之導電性之Ag粉末。再者,該導電性粉末之形狀亦無特別限定,例如可為球狀、扁平狀、不定形形狀、或該等之混合粉之任一者。 Further, as the conductive powder, any metal having good conductivity is used. The powder is not particularly limited, and an Ag powder which does not oxidize even when it is subjected to a calcination treatment in the air to maintain good conductivity can be preferably used. Further, the shape of the conductive powder is not particularly limited, and may be, for example, a spherical shape, a flat shape, an amorphous shape, or a mixed powder of the above.

又,導電性粉末之平均粒徑亦無特別限定,就確保所期望之接觸點之觀點而言,於導電性粉末與半導體基板1之間以球形粉換算計,較佳為1.0~5.0 μm。 In addition, the average particle diameter of the conductive powder is not particularly limited, and from the viewpoint of ensuring a desired contact point, the conductive powder and the semiconductor substrate 1 are preferably 1.0 to 5.0 μm in terms of spherical powder.

作為導電性糊中所含之黏合劑樹脂,並無特別限定,例如,可使用乙基纖維素樹脂、硝化纖維素樹脂、丙烯酸系樹脂、醇酸樹脂、或者該等之組合。 The binder resin contained in the conductive paste is not particularly limited, and for example, an ethyl cellulose resin, a nitrocellulose resin, an acrylic resin, an alkyd resin, or a combination thereof may be used.

又,對於有機溶劑亦無特別限定,可單獨或組合使用α-松脂醇、二甲苯、甲苯、二乙二醇單丁醚、二乙二醇單丁醚乙酸酯、二乙二醇單乙醚、二乙二醇單乙醚乙酸酯等。 Further, the organic solvent is not particularly limited, and α-rosinol, xylene, toluene, diethylene glycol monobutyl ether, diethylene glycol monobutyl ether acetate, diethylene glycol monoethyl ether may be used singly or in combination. , diethylene glycol monoethyl ether acetate, and the like.

並且,黏合劑樹脂與有機溶劑係以例如以體積比率計成為1~3:7~9之方式而製備,藉此而製作有機媒劑。 Further, the binder resin and the organic solvent are prepared, for example, in a volume ratio of 1 to 3:7 to 9, whereby an organic vehicle is produced.

再者,本發明之導電性糊即使不含有玻璃料,亦可起到所期望之作用效果,亦可為提高受光面電極3與半導體基板1之密接性而含有玻璃料。於此情形時,作為玻璃料並無特別限定,考慮到環境方面,較佳為使用不含鉛之Si-B-Bi系玻璃料等無鉛玻璃料。 Further, the conductive paste of the present invention can exert a desired effect even if it does not contain a glass frit, and can contain a glass frit in order to improve the adhesion between the light-receiving surface electrode 3 and the semiconductor substrate 1. In this case, the glass frit is not particularly limited, and in view of the environment, it is preferable to use a lead-free glass frit such as a lead-free Si-B-Bi-based glass frit.

又,若為電極之比電阻不會成為問題之範圍內,則亦可添加無機氧化物。 Further, if the specific resistance of the electrode does not become a problem, an inorganic oxide may be added.

並且,該導電性糊可藉由將導電性粉末、有機媒劑及視需要之各種添加劑以成為特定混合比率之方式進行稱量並 混合,使用三輥研磨機等進行分散、混練而容易地製造。 Further, the conductive paste can be weighed by using a conductive powder, an organic vehicle, and optionally various additives in a specific mixing ratio. The mixture is mixed and dispersed, and kneaded using a three-roll mill or the like to be easily produced.

如此般,本實施形態含有Ag粉末等導電性粉末、黏合劑樹脂、及溶劑,且含有熔點為1000℃以下之鹼金屬化合物,故即使不添加無機氧化物亦可產生燒透。而且,由於可增加受光面電極3中之導電性粉末之含有比率,故可降低電極之比電阻,藉此可提高太陽能電池之轉換效率。 In this manner, the present embodiment contains a conductive powder such as Ag powder, a binder resin, and a solvent, and contains an alkali metal compound having a melting point of 1000 ° C or less. Therefore, it can be burnt through without adding an inorganic oxide. Further, since the content ratio of the conductive powder in the light-receiving surface electrode 3 can be increased, the specific resistance of the electrode can be lowered, whereby the conversion efficiency of the solar cell can be improved.

又,於將鹼金屬化合物熔點設為800℃以下、尤其是400℃以下之情形時,由於鹼金屬化合物之熔點變低,故於乾燥時至煅燒時容易於與n型半導體層1a之界面上流動。因此,即使添加微量亦可充分產生鹼金屬特有之燒透性。 In addition, when the melting point of the alkali metal compound is 800 ° C or lower, particularly 400 ° C or lower, since the melting point of the alkali metal compound becomes low, it is easy to form an interface with the n-type semiconductor layer 1a during drying to calcination. flow. Therefore, even if a trace amount is added, the burnt property peculiar to the alkali metal can be sufficiently produced.

又,藉由使鹼金屬化合物含有羧酸鹽及胺類中任一種,可獲得更良好之燒透性。 Further, by allowing the alkali metal compound to contain any one of a carboxylate and an amine, more excellent fire permeability can be obtained.

又,於鹼金屬化合物含有碳酸鹽及硼酸鹽中任一種之情形時,即使熔點相對變高,亦可以微量之添加實現具有所期望之燒透性且線電阻較低之太陽能電池電極用導電性糊。 Further, when the alkali metal compound contains any one of a carbonate and a borate, even if the melting point is relatively high, the conductivity of the solar cell electrode having a desired burnt property and a low line resistance can be obtained in a small amount. paste.

又,於鹼金屬元素為鋰之情形時,可實現燒透性更良好且可謀求低比電阻之導電性糊。 Moreover, when the alkali metal element is lithium, it is possible to achieve a conductive paste having a better fire-through property and a low specific resistance.

並且,可獲得半導體基板1與受光面電極3之導通性良好,比電阻較低,而轉換效率良好之太陽能電池。 Further, a solar cell having good conductivity between the semiconductor substrate 1 and the light-receiving surface electrode 3 and having a low specific resistance and excellent conversion efficiency can be obtained.

再者,本發明並非限定於上述實施形態者。又,較佳為根據需要於導電性糊中添加少量之鄰苯二甲酸二2-乙基己酯、鄰苯二甲酸二丁酯等塑化劑之1種或該等之組合。 又,添加脂肪酸醯胺或脂肪酸等流變調整劑亦較佳,進而亦可添加觸變劑、增黏劑、分散劑等。 Furthermore, the present invention is not limited to the above embodiments. Further, it is preferred to add a small amount of a plasticizer such as di-ethylhexyl phthalate or dibutyl phthalate to the conductive paste as needed or a combination thereof. Further, a rheology modifier such as a fatty acid guanamine or a fatty acid is preferably added, and a thixotropic agent, a thickener, a dispersant or the like may be added.

繼而,具體說明本發明之實施例。 Next, an embodiment of the present invention will be specifically described.

實施例1Example 1 [導電性糊之製作] [Production of conductive paste]

(試樣編號1~10、13、15、16) (Sample No. 1~10, 13, 15, 16)

準備平均粒徑為1.0 μm之球形Ag粉末作為導電性粉末,又,準備表1所示之添加物。 A spherical Ag powder having an average particle diameter of 1.0 μm was prepared as a conductive powder, and an additive shown in Table 1 was prepared.

繼而,製作有機媒劑。即,以作為黏合劑樹脂之乙基纖維素樹脂成為10重量%、作為有機溶劑之TEXANOL(商品名)成為90重量%之方式將乙基纖維素樹脂與TEXANOL混合而製作有機媒劑。 Then, an organic vehicle is produced. In other words, the ethyl cellulose resin was mixed with TEXANOL so that the ethyl cellulose resin as the binder resin was 10% by weight, and the TEXANOL (trade name) as the organic solvent was 90% by weight to prepare an organic vehicle.

然後,以Ag粉末成為80.0重量%、添加物成為0.2重量%、有機媒劑成為19.8重量%之方式調配該等,利用行星式混合機混合後以三輥研磨機進行混練,藉此製作試樣編號1~10、13、15及16之導電性糊。 Then, the Ag powder was blended in an amount of 80.0% by weight, the additive was 0.2% by weight, and the organic vehicle was 19.8% by weight. The mixture was mixed by a planetary mixer and kneaded by a three-roll mill to prepare a sample. Conductive pastes Nos. 1 to 10, 13, 15 and 16.

(試樣編號11) (sample number 11)

除平均粒徑為1.0 μm之球形Ag粉末、及作為添加物之十二烷酸鋰以外,亦準備Si-B-Bi系無鉛玻璃料。 A Si-B-Bi-based lead-free glass frit was prepared in addition to a spherical Ag powder having an average particle diameter of 1.0 μm and lithium dodecanoate as an additive.

然後,與上述同樣地製作有機媒劑,繼而,以Ag粉末成為80.0重量%、添加物成為0.2重量%、Si-B-Bi系無鉛玻璃料成為2重量%、有機媒劑成為17.8重量%之方式調配該等,利用行星式混合機混合後以三輥研磨機進行混練,藉此製作試樣編號11之導電性糊。 Then, an organic vehicle was prepared in the same manner as above, and then Ag powder was 80.0% by weight, additive was 0.2% by weight, Si-B-Bi-based lead-free glass frit was 2% by weight, and organic vehicle was 17.8% by weight. In the manner of mixing these, the mixture was mixed by a planetary mixer and kneaded by a three-roll mill to prepare a conductive paste of sample No. 11.

(試樣編號12) (sample number 12)

以平均粒徑1.0 μm之球形Ag粉末成為80重量%、有機媒劑成為20重量%之方式調配該等,且不添加鹼金屬化合物,除此以外,與上述同樣地製作試樣編號12之導電性糊。 Conductive sample No. 12 was produced in the same manner as above except that the spherical Ag powder having an average particle diameter of 1.0 μm was 80% by weight, and the organic vehicle was added in an amount of 20% by weight, and the alkali metal compound was not added. Sex paste.

(試樣編號14) (sample number 14)

以平均粒徑1.0 μm之球形Ag粉末成為80重量%、作為添加物之氧化鋅成為4.6重量%、有機媒劑成為15.4重量%之方式調配該等,除此以外,與上述同樣地製作試樣編號14之導電性糊。 A sample was prepared in the same manner as described above except that the spherical Ag powder having an average particle diameter of 1.0 μm was 80% by weight, the zinc oxide as an additive was 4.6% by weight, and the organic vehicle was added to 15.4% by weight. No. 14 conductive paste.

(試樣編號17) (sample number 17)

以平均粒徑1.0 μm之球形Ag粉末成為80重量%、Si-B-Bi-Li系無鉛玻璃料成為2.0重量%、有機媒劑成為18.0重量%之方式調配該等,且不添加鹼金屬化合物,除此以外,與上述同樣地製作試樣編號17之導電性糊。 The spherical Ag powder having an average particle diameter of 1.0 μm is 80% by weight, the Si—B—Bi—Li-based lead-free glass frit is 2.0% by weight, and the organic vehicle is added to 18.0% by weight, and the alkali metal compound is not added. A conductive paste of sample No. 17 was produced in the same manner as above except the above.

(試樣編號18) (sample number 18)

以平均粒徑1.0 μm之球形Ag粉末成為80重量%、Si-B-Bi系無鉛玻璃料成為2.0重量%、有機媒劑成為18.0重量%之方式調配該等,且不添加鹼金屬化合物,除此以外,與上述同樣地製作試樣編號18之導電性糊。 The spherical Ag powder having an average particle diameter of 1.0 μm was 80% by weight, the Si—B—Bi-based lead-free glass frit was 2.0% by weight, and the organic vehicle was added to 18.0% by weight, and the alkali metal compound was not added. Otherwise, the conductive paste of sample No. 18 was produced in the same manner as above.

[熔點之測定] [Measurement of Melting Point]

使用TG-DTA(Thermo-Gravimetric/Differential Thermal Analyzer,熱重差熱分析儀),對用於試樣之製作之添加物進行熱分析並測定熔點。即,於氧化鋁製容器中收納試樣 5 mg,標準試樣使用α氧化鋁,一面以100 mL/min之流量向測定裝置內供給空氣,一面以1分鐘上升20℃之煅燒分佈加熱該測定裝置,根據相對於溫度之重量變化而製作TG(Thermo-Gravimetric,熱重)曲線及DTA(Differential Thermal,差熱)曲線。然後,根據該TG曲線及DTA曲線測定各添加物之熔點。 The additive used for the preparation of the sample was subjected to thermal analysis using TG-DTA (Thermo-Gravimetric/Differential Thermal Analyzer) and the melting point was measured. That is, the sample is stored in an alumina container 5 mg, the standard sample is made of α-alumina, and air is supplied to the measuring device at a flow rate of 100 mL/min, and the measuring device is heated by a calcination distribution of 20° C. in 1 minute, and is produced according to the weight change with respect to temperature. TG (Thermo-Gravimetric) curve and DTA (Differential Thermal) curve. Then, the melting point of each additive was measured based on the TG curve and the DTA curve.

[試樣之評價] [Evaluation of sample]

如圖4所示,於抗反射膜上製作特定之電極圖案,藉由TLM(Transmission Line Model,傳輸線模型)法而求得接觸電阻Rc。 As shown in FIG. 4, a specific electrode pattern was formed on the antireflection film, and the contact resistance Rc was obtained by a TLM (Transmission Line Model) method.

即,以電漿增強化學氣相沈積法(PECVD,Plasma Enhanced Chemical Vapor Deposition),於橫X為50 mm、縱Y為50 mm、厚度T為0.2 mm的多晶之Si系半導體基板11之整個表面上形成膜厚0.1 μm之抗反射膜12。 That is, the whole of the polycrystalline Si-based semiconductor substrate 11 having a lateral X of 50 mm, a longitudinal Y of 50 mm, and a thickness T of 0.2 mm by plasma enhanced chemical vapor deposition (PECVD). An anti-reflection film 12 having a film thickness of 0.1 μm was formed on the surface.

此處作為抗反射膜12之材料種,試樣編號10使用TiO2,其他則使用SiNx。再者,該Si系半導體基板11係於p型Si系半導體層之上表面形成n型Si系半導體層。 Here, as the material of the anti-reflection film 12, TiO 2 is used for sample No. 10, and SiN x is used for others. Further, the Si-based semiconductor substrate 11 is formed on the surface of the p-type Si-based semiconductor layer to form an n-type Si-based semiconductor layer.

繼而,使用試樣編號1~18之各導電性糊進行絲網印刷而製作具有特定圖案之膜厚20 μm之導電膜。繼而,將各試樣放入溫度設定為150℃之烘箱中使導電膜乾燥。 Then, each of the conductive pastes of sample Nos. 1 to 18 was used for screen printing to produce a conductive film having a specific pattern and having a film thickness of 20 μm. Then, each sample was placed in an oven set to a temperature of 150 ° C to dry the conductive film.

其後,使用帶式近紅外爐(Despatch公司製造,CDF7210),以用約1分鐘將試樣自入口搬送至出口之方式調整輸送速度,於大氣環境下以煅燒最高溫度750℃進行煅燒,製作形成有電極13a~13f之試樣編號1~18之試樣。 Thereafter, a belt type near-infrared furnace (CDF7210, manufactured by Despatch Co., Ltd.) was used to adjust the conveying speed by transferring the sample from the inlet to the outlet in about 1 minute, and calcining at a maximum calcination temperature of 750 ° C in an atmosphere. Samples of sample numbers 1 to 18 of the electrodes 13a to 13f were formed.

此處,測定各電極13a~13f之距離L1~L5,結果電極13a與電極13b之間之距離L1為200 μm,電極13b與電極13c之間之距離L2為400 μm,電極13c與電極13d之間之距離L3為600 μm,電極13d與電極13e之間之距離L4為800 μm,電極13e與電極13f之間之距離L5為1000 μm。又,電極之長度Z均為30 mm。 Here, the distances L1 to L5 of the respective electrodes 13a to 13f are measured, and as a result, the distance L1 between the electrode 13a and the electrode 13b is 200 μm, and the distance L2 between the electrode 13b and the electrode 13c is 400 μm, and the electrode 13c and the electrode 13d are The distance L3 is 600 μm, the distance L4 between the electrode 13d and the electrode 13e is 800 μm, and the distance L5 between the electrode 13e and the electrode 13f is 1000 μm. Also, the length Z of the electrodes is 30 mm.

繼而,使用TLM法,對試樣編號1~18之各試樣求得接觸電阻Rc。 Then, the contact resistance Rc was obtained for each of the sample numbers 1 to 18 by the TLM method.

該TLM法係作為薄膜試樣之接觸電阻之評價方法而廣為人知,使用傳送線理論,且將電極、與下層之半導體基板等價考慮為所謂之傳送線電路而計算出接觸電阻Rc。即,於電極13a~13f之長度Z、n型Si系半導體層之薄片電阻RSH、電極間距離L、電極間電阻R之間,數學式(1)成立。 This TLM method is widely known as a method for evaluating the contact resistance of a film sample, and the contact resistance Rc is calculated by using a transfer line theory and considering the electrode and the lower semiconductor substrate in consideration of a so-called transfer line circuit. That is, the electrode length Z 13a ~ 13f, the sheet resistance R SH n-type semiconductor layer of Si-based, inter-electrode distance L, between the inter electrode resistance R, equation (1) is established.

R=(L/Z)×RSH+2Rc………(1) R=(L/Z)×R SH +2Rc......(1)

根據數學式(1)可明確,電極間電阻R與電極間距離L具有直線關係。因此,測定電極間距離Ln(n=1~5)下之各電阻R,將L推算為0,藉此求得2Rc,根據此2Rc可計算出接觸電阻Rc。 According to the mathematical formula (1), it is clear that the inter-electrode resistance R has a linear relationship with the distance L between the electrodes. Therefore, each of the resistors R under the inter-electrode distance Ln (n = 1 to 5) is measured, and L is estimated to be 0, thereby obtaining 2Rc, and the contact resistance Rc can be calculated from the 2Rc.

因此,於本實施例中,測定電極間距離Ln下之各電阻R,計算出試樣編號1~18之各試樣之接觸電阻Rc。再者,n型Si系半導體層之薄片電阻RSH可針對由上述數學式(1)導出之直線,根據將橫軸設為L、縱軸設為R時之斜率而計算出。此處為30 Ω/cm。 Therefore, in the present embodiment, the respective resistances R at the distance Ln between the electrodes were measured, and the contact resistance Rc of each sample of the sample numbers 1 to 18 was calculated. In addition, the sheet resistance R SH of the n-type Si-based semiconductor layer can be calculated from the straight line derived from the above formula (1), based on the slope when the horizontal axis is L and the vertical axis is R. This is 30 Ω/cm.

又,對試樣編號1~18之各試樣測定長度30 mm、寬度 200 μm之電極之線電阻。繼而,將該線電阻除以長度,並乘以剖面積,藉此測定電極之比電阻。再者,線電阻係使用數位電壓表而測定,電極之剖面積係使用接觸式表面粗糙度測量儀而測定。 In addition, the length of each sample of sample Nos. 1 to 18 was measured to be 30 mm in length and width. Line resistance of 200 μm electrode. Then, the line resistance was divided by the length and multiplied by the sectional area, thereby measuring the specific resistance of the electrode. Further, the line resistance was measured using a digital voltmeter, and the sectional area of the electrode was measured using a contact surface roughness meter.

表1表示試樣編號1~18之導電性糊之規格、接觸電阻Rc及電極之比電阻。 Table 1 shows the specifications of the conductive paste of sample Nos. 1 to 18, the contact resistance Rc, and the specific resistance of the electrodes.

試樣編號12僅以Ag形成電極13a~13f,不含有鹼金屬化合物,故電極之比電阻較低,但未產生燒透,接觸電阻Rc過度變高,無法測定接觸電阻Rc。 In the sample No. 12, the electrodes 13a to 13f were formed only of Ag, and the alkali metal compound was not contained. Therefore, the specific resistance of the electrode was low, but no burn-through occurred, and the contact resistance Rc was excessively high, and the contact resistance Rc could not be measured.

試樣編號13亦無法測定接觸電阻Rc。可認為其原因在於,雖含有氧化鋅作為添加物,但其含量為0.2重量%,故未產生燒透。 The sample resistance 13 was also unable to measure the contact resistance Rc. The reason for this is considered to be that although zinc oxide is contained as an additive, the content thereof is 0.2% by weight, so that no fire-through occurs.

試樣編號14雖接觸電阻Rc較低為2.5 Ω,但電極之比電阻提高為6.60 μΩ.cm。其可認為由於將氧化鋅之含量增量至4.6重量%,故燒透性良好,接觸電阻Rc降低,但Ag之含量相對降低,因此比電阻變高。 Sample No. 14 has a lower contact resistance Rc of 2.5 Ω, but the specific resistance of the electrode is increased to 6.60 μΩ. Cm. It is considered that since the content of zinc oxide is increased to 4.6 wt%, the fire-through property is good, and the contact resistance Rc is lowered, but the content of Ag is relatively lowered, so that the specific resistance is high.

試樣編號15之電極之比電阻良好,為5.28 μΩ.cm,但接觸電阻Rc極高,為4532 Ω。其可認為雖含有羧酸鹽作為添加物,但該羧酸鹽中不含有鹼金屬元素,故結果燒透性較差。 The specific resistance of the electrode of sample No. 15 was good, 5.28 μΩ. Cm, but the contact resistance Rc is extremely high at 4532 Ω. It is considered that although a carboxylate is contained as an additive, the carboxylate does not contain an alkali metal element, and as a result, the fire-through property is inferior.

試樣編號16之電極之比電阻較良好,為3.96 μΩ.cm,但與試樣編號15同樣地於羧酸鹽中不含有鹼金屬元素,因此接觸電阻Rc變高為770 Ω。 The specific resistance of the electrode of sample No. 16 is good, 3.96 μΩ. In the same manner as in sample No. 15, the alkali metal element was not contained in the carboxylate, and therefore the contact resistance Rc became high at 770 Ω.

相對對此,可知試樣編號1~11均含有0.2重量%之微量之熔點為1000℃以下之鹼金屬化合物,故接觸電阻Rc較低,燒透性良好,且電極之比電阻降低。 On the other hand, it is understood that Sample Nos. 1 to 11 each contain 0.2% by weight of an alkali metal compound having a melting point of 1000 ° C or less, so that the contact resistance Rc is low, the fire permeability is good, and the specific resistance of the electrode is lowered.

又,可知含有羧酸鋰之試樣編號4~7、10、11之接觸電阻Rc為7 Ω以下,可獲得特別良好之結果。 Further, it was found that the contact resistance Rc of the sample numbers 4 to 7, 10, and 11 containing lithium carboxylate was 7 Ω or less, and particularly excellent results were obtained.

又,如試樣編號7所示,可知若含有鋰,則即使為胺類亦可獲得10 Ω以下之良好之接觸電阻Rc。 Further, as shown in the sample No. 7, it was found that when lithium is contained, a good contact resistance Rc of 10 Ω or less can be obtained even if it is an amine.

又,如試樣編號8、9所示,可知若含有鋰,則即使為碳酸鹽、硼酸鹽亦可獲得30 Ω以下之良好之接觸電阻Rc。 Further, as shown in the sample Nos. 8 and 9, it is understood that when lithium is contained, a good contact resistance Rc of 30 Ω or less can be obtained even if it is a carbonate or a borate.

又,由試樣編號5與試樣編號10之對比可明確,藉由含有微量之本發明之添加物,可無關於抗反射膜之種類而進行所期望之燒透,獲得良好之接觸電阻Rc,從而可於半導體基板-電極間獲得良好之歐姆接觸。 Further, it is clear from the comparison between sample No. 5 and sample No. 10 that by containing a trace amount of the additive of the present invention, it is possible to perform desired permeation without any kind of antireflection film, and to obtain a good contact resistance Rc. Thus, a good ohmic contact can be obtained between the semiconductor substrate-electrodes.

又,由試樣編號5與試樣編號11之對比可明確確認,即使為賦予與半導體基板11之密接性而使導電性糊中含有玻璃料,亦對接觸電阻Rc或電極之比電阻幾乎無影響,可獲得所期望之良好之歐姆接觸。 Moreover, it can be clearly confirmed from the comparison between the sample No. 5 and the sample No. 11, even if the glass frit is contained in the conductive paste to impart adhesion to the semiconductor substrate 11, the specific resistance to the contact resistance Rc or the electrode is hardly observed. The effect is to obtain the desired good ohmic contact.

再者,試樣編號17、18係調查作為鹼金屬元素之Li之含有形態者。由該試樣編號17與試樣編號18之對比可明確確認,由於玻璃料自身具有燒透性,故兩者之接觸電阻Rc均變為100 Ω以下,但Si-B-Bi系無鉛玻璃料相較於含有Li之Si-B-Bi-Li系無鉛玻璃料而言接觸電阻Rc降低。即,即使於玻璃料中含有Li,亦未產生Li之接觸電阻Rc之降低效果,藉由另作為添加物添加至導電性糊中而產生接觸電阻Rc之降低效果。 In addition, sample Nos. 17 and 18 were investigated as the form of inclusion of Li as an alkali metal element. From the comparison between the sample No. 17 and the sample No. 18, it can be clearly confirmed that since the glass frit itself has a fire-through property, the contact resistance Rc of both of them becomes 100 Ω or less, but the Si-B-Bi-based lead-free glass frit The contact resistance Rc is lowered as compared with the Si-B-Bi-Li-based lead-free glass frit containing Li. In other words, even if Li is contained in the glass frit, the effect of lowering the contact resistance Rc of Li does not occur, and the addition of the additive to the conductive paste causes an effect of lowering the contact resistance Rc.

圖5係對於試樣編號4~9,將各試樣之熔點Tm與接觸電阻Rc之關係繪製所成之圖,橫軸為熔點Tm(℃),縱軸為接觸電阻Rc(Ω)。 Fig. 5 is a graph showing the relationship between the melting point Tm of each sample and the contact resistance Rc for sample numbers 4 to 9, the horizontal axis being the melting point Tm (°C), and the vertical axis being the contact resistance Rc (Ω).

根據該圖5明確可知,若熔點Tm降低,則接觸電阻Rc亦降低,尤其是熔點Tm較佳為800℃以下、進而較佳為400℃以下。 As is clear from Fig. 5, when the melting point Tm is lowered, the contact resistance Rc is also lowered, and in particular, the melting point Tm is preferably 800 ° C or lower, more preferably 400 ° C or lower.

實施例2Example 2

使用十二烷酸鋰作為鹼金屬化合物而製作十二烷酸鋰之含量不同之試樣編號21~24之導電性糊。再者,試樣編號22係與實施例1之試樣編號5同樣之導電性糊。 A conductive paste of sample Nos. 21 to 24 in which the content of lithium dodecanoate was different was prepared using lithium dodecanoate as an alkali metal compound. Further, the sample No. 22 is the same as the conductive paste of the sample No. 5 of the first embodiment.

繼而,以與實施例1同樣之方法、順序對試樣編號21~24之各試樣求出接觸電阻Rc及電極之比電阻。 Then, the contact resistance Rc and the specific resistance of the electrode were determined for each of the sample numbers 21 to 24 in the same manner as in the first embodiment.

表2表示試樣編號21~24之各導電性糊中所含有之十二烷酸鋰之熔點、含量及測定結果。 Table 2 shows the melting points, contents, and measurement results of lithium dodecanoate contained in each of the conductive pastes of Sample Nos. 21 to 24.

由此表2可明確,於增加十二烷酸鋰之含量之情形時,接觸電阻Rc幾乎無變動,但電極之比電阻有增加之傾向。因此,可知若考慮電極之比電阻,則十二烷酸鋰之含量較佳為2重量%以下。 From the results of Table 2, it is clear that when the content of lithium dodecanoate is increased, the contact resistance Rc hardly changes, but the specific resistance of the electrode tends to increase. Therefore, it is understood that the lithium dodecanoate content is preferably 2% by weight or less in consideration of the specific resistance of the electrode.

產業上之可利用性Industrial availability

使用燒透性良好且電極之比電阻較低之導電性糊而實現轉換效率較高之太陽能電池。 A solar cell having high conversion efficiency is realized by using a conductive paste having good burnt property and a low specific resistance of the electrode.

1‧‧‧半導體基板 1‧‧‧Semiconductor substrate

1a‧‧‧n型半導體層 1a‧‧‧n type semiconductor layer

1b‧‧‧p型半導體層 1b‧‧‧p-type semiconductor layer

2‧‧‧抗反射膜 2‧‧‧Anti-reflective film

3‧‧‧受光面電極(電極) 3‧‧‧Photometric surface electrode (electrode)

4‧‧‧背面電極 4‧‧‧Back electrode

5a‧‧‧指狀電極 5a‧‧‧ finger electrode

5b‧‧‧指狀電極 5b‧‧‧ finger electrode

5n‧‧‧指狀電極 5n‧‧‧ finger electrode

6‧‧‧匯流電極 6‧‧‧Concurrent electrode

7‧‧‧集電電極 7‧‧‧ Collecting electrode

8‧‧‧取出電極 8‧‧‧Removing the electrode

11‧‧‧Si系半導體基板 11‧‧‧Si-based semiconductor substrate

12‧‧‧抗反射膜 12‧‧‧Anti-reflective film

13a~13f‧‧‧電極 13a~13f‧‧‧electrode

A‧‧‧箭頭 A‧‧‧ arrow

L1~L5‧‧‧距離 L1~L5‧‧‧Distance

X~Z‧‧‧長度 X~Z‧‧‧ length

圖1係表示使用本發明之導電性糊而製造的太陽能電池之一實施形態之要部剖面圖。 Fig. 1 is a cross-sectional view showing an essential part of an embodiment of a solar cell produced by using the conductive paste of the present invention.

圖2係模式地表示受光面電極側之放大平面圖。 Fig. 2 is an enlarged plan view showing the side of the light-receiving surface electrode.

圖3係模式地表示背面電極側之放大平面圖。 Fig. 3 is a schematic enlarged plan view showing the back electrode side.

圖4係模式地表示藉由實施例而製作之電極圖案之平面圖。 Fig. 4 is a plan view schematically showing an electrode pattern produced by the embodiment.

圖5係表示實施例中使用之鹼金屬化合物之熔點Tm與接觸電阻Rc之關係之圖。 Fig. 5 is a graph showing the relationship between the melting point Tm of the alkali metal compound used in the examples and the contact resistance Rc.

1‧‧‧半導體基板 1‧‧‧Semiconductor substrate

1a‧‧‧n型半導體層 1a‧‧‧n type semiconductor layer

1b‧‧‧p型半導體層 1b‧‧‧p-type semiconductor layer

2‧‧‧抗反射膜 2‧‧‧Anti-reflective film

3‧‧‧受光面電極 3‧‧‧Photon surface electrode

4‧‧‧背面電極 4‧‧‧Back electrode

Claims (9)

一種導電性糊,其特徵在於:其係用以形成太陽能電池之電極者,且含有導電性粉末、黏合劑樹脂及溶劑,且含有熔點為1000℃以下之鹼金屬化合物。 A conductive paste comprising an electroconductive powder, a binder resin, and a solvent, and an alkali metal compound having a melting point of 1000 ° C or less, which is used to form an electrode of a solar cell. 如請求項1之導電性糊,其中上述鹼金屬化合物之熔點為800℃以下。 The conductive paste of claim 1, wherein the alkali metal compound has a melting point of 800 ° C or less. 如請求項2之導電性糊,其中上述鹼金屬化合物之熔點為400℃以下。 The conductive paste of claim 2, wherein the alkali metal compound has a melting point of 400 ° C or less. 如請求項1至3中任一項之導電性糊,其中上述鹼金屬化合物含有羧酸鹽及胺類中至少任一種。 The conductive paste according to any one of claims 1 to 3, wherein the alkali metal compound contains at least one of a carboxylate and an amine. 如請求項1之導電性糊,其中上述鹼金屬化合物含有碳酸鹽及硼酸鹽中至少任一種。 The conductive paste of claim 1, wherein the alkali metal compound contains at least one of a carbonate and a borate. 如請求項1至3中任一項之導電性糊,其中上述鹼金屬化合物中所含之鹼金屬元素為鋰。 The conductive paste according to any one of claims 1 to 3, wherein the alkali metal element contained in the alkali metal compound is lithium. 如請求項1至3中任一項之導電性糊,其中上述鹼金屬化合物之含量為2重量%以下(不包含0重量%)。 The conductive paste according to any one of claims 1 to 3, wherein the content of the alkali metal compound is 2% by weight or less (excluding 0% by weight). 如請求項1至3中任一項之導電性糊,其中上述導電性粉末為Ag粉末。 The conductive paste according to any one of claims 1 to 3, wherein the conductive powder is Ag powder. 一種太陽能電池,其特徵在於:於半導體基板之一主表面上形成抗反射膜及貫通該抗反射膜之電極,上述電極係由如請求項1至8中任一項之導電性糊燒結而成。 A solar cell characterized in that an antireflection film and an electrode penetrating the antireflection film are formed on one main surface of a semiconductor substrate, and the electrode is sintered by the conductive paste according to any one of claims 1 to 8. .
TW101117446A 2011-05-26 2012-05-16 Conductive paste and solar cell TW201301528A (en)

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