TW201237984A - Wafer machine regulator - Google Patents

Abstract

The present invention relates to a wafer machine regulator, which mainly comprises a bearing body and a plurality of carriers proceed the balancing of the wafer in the reaction chamber via the balancing sheet, wherein the carrier defines a plane to support the balancing sheet and the balancing sheet is contacted with the wafer substrate in the reaction chamber. The plane also defines a vertical through-hole recessing the resisting column and the vertical through-hole is connected with an accommodation room. A resisting block, which can interact with the resisting column, is recessed in the accommodation room that also connects to a vertical through-hole. The vertical through-hole penetrates the rod assembled on the resisting block and the rotation adjustment set is mounted at the other end of the rod. The rod is driven to rotate and make the resisting block displaced when the rotation adjustment set performs the rotation, and even supports the resisting column to proceed with the lifting movement. That makes the wafer substrate able to be driven by the balancing sheet to achieve the wafer balance by the resisting column.

Description

201237984 VI. Description of the invention: • [Technical field to which the invention pertains] - The present invention provides an adjustment of the E-type wafer machine, in particular, the type can be quickly adjusted to the positioning without spending a large amount of __ integral, thereby accelerating the process _, And the accuracy of the water balance is extremely high, and it is more effective to reduce the excessive 而 而 发生 发生 发生 发生 发生 发生 发生 ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί Round machine adjuster. [Prior Art] The technology of the H process has been quite skillful, and it has also created the current wafer kingdom, and some machines are manufactured, and the wafer-formed part includes special gas's but due to various factors of film limitation. 2 Therefore, the thickness of the film is inconsistent, and often exceeds the tolerance: the speed of U is different, and the range of the value of the == is not easy to be fully balanced in the range of the value of the enemy. , 俾 螺 螺 ' 再 再 再 再 再 再 再 螺 螺 螺 螺 螺 螺 螺 螺 螺 螺 螺 螺 螺 螺 螺 螺 螺 螺 螺 螺 螺 螺 螺 螺 螺 螺 螺 螺 螺 螺 螺 螺 螺 螺 螺 螺 螺 螺 螺Party assessment and consideration, j multi-phase, material, through the multi-change, began to design this can be quickly adjusted to the level of the second break test and! On the 'in, 仏 (9) shirt "201237984 - cap damage problem, in addition, at the same time The bearing surface of the bearing body is inclined.: The round machine adjusts === and solves the problem that after the spring is fatigued, the main structure of the carrier body is defined as a predetermined "transfer ft system". Defining a longitudinal perforation for receiving the abutting column, The longitudinal ϋ 谷 谷 谷 抵 抵 抵 抵 谷 谷 谷 谷 谷 谷 谷 谷 谷 谷 谷 谷 谷 谷 谷 谷 谷 谷 谷 谷 谷 谷 谷 谷 谷 谷 谷 谷 谷 谷 谷 谷 谷 谷 谷 谷 谷 谷 谷 谷 谷 谷The group is disposed away from the rod body to provide the rod body for rotation, and the rotation adjustment group includes a 盥, n" _ seat is provided with a sprocket seat, and the top surface of the sprocket seat is formed 2 and the sprocket seat is defined by a part of it == There is a shrapnel; furthermore, the base, the sprocket holder, the sprocket wheel and the sprocket are set to 1 and the rotating sleeve system is sleeved - the grip body By this, when you want to = ί ϊϊΓ ϊϊΓ ϊϊΓ ϊϊΓ ϊϊΓ ϊϊΓ ϊϊΓ ϊϊΓ ϊϊΓ ϊϊΓ ϊϊΓ ϊϊΓ ϊϊΓ ϊϊΓ ϊϊΓ ϊϊΓ ϊϊΓ ϊϊΓ ϊϊΓ ϊϊΓ ϊϊΓ ϊϊΓ ϊϊΓ ϊϊΓ ϊϊΓ ϊϊΓ ϊϊΓ ϊϊΓ ϊϊΓ ϊϊΓ ϊϊΓ ϊϊΓ ϊϊΓ ϊϊΓ ϊϊΓ ϊϊΓ ϊϊΓ ϊϊΓ ϊϊΓ ϊϊΓ ϊϊΓ ϊϊΓ ϊϊΓ ϊϊΓ ϊϊΓ ϊϊΓ ϊϊΓ ϊϊΓ ϊϊΓ ϊϊΓ ϊϊΓ After that, the rotation adjustment group can be rotated, and is rotated at 2^^, so that the resisting block is displaced by the threading action, and the pushing-up hand reaches the column, and then the balance plate is driven to rise and fall. , ^Into the balance tank; with the above technology, can rely on the conventional wafer balancer to rely on the adjustment nut mostly rely on Personal experience, 瑕 而 , 再 再 再 再 再 再 再 - - - - - 相关 相关 相关 相关 相关 相关 相关 相关 相关 相关 相关 相关 相关 相关 相关 相关 相关 相关 相关 相关 相关 相关 相关 相关 相关 相关 相关 相关 相关 相关 相关 相关 相关 相关 相关The problem is added to the time 'it and the level balance accuracy is extremely high, more, the nut damage problem is 'corrected, and the county's body is placed _ oblique design 201237984 • pressure balance board, and solved the magazine fatigue Practical advancement of the problems derived _ [Embodiment] In order to achieve the above objectives and effects, the technical map adopted by the present invention is based on the fact that the ship and Wei are as follows: please refer to the figure - The second picture, the third picture, the fourth picture, the first solution. The fifth picture is shown in Fig. 6 , which is the schematic diagram of the implementation of the vertical steel, the A picture and the 5th and 2nd. And the three-point Si real 3 view clearly shows that the invention is adjusted by the machine (4) through the wafer substrate 8 in the flat to 8, the main structure of the machine adjuster includes a receiving body 1 , for pressing against one end of the balance plate i , and at the contact surface of the balance plate The bearing surface 丄i is defined as a slanted state. The right side of the body 3 is inserted through the longitudinal through hole 22, and the resisting column 3-side is formed with a (7) groove 31, and the sliding groove 3丄The inner system slides with a cylinder 32; the contact, 4, is accommodated in the accommodating space 2 3, and the contact with the resisting column 3 against the holding column 3 defines a slanting surface. 4, then 曰 二 2 = 5, the transverse perforation 24 is worn, and the end is connected with the screw hole 4 2 . ★ The ball 24 is provided with a plurality of balls 5 for interacting with the rod 5 . And the whole group 6, the rotation adjustment group 6 is disposed on the side of the carrier 2, and the system is connected with the scale 5f at the end of the screw hole 4 2, and the entire group 6 of the basin The base 6 1 with the carrier 2 is disposed, and the bottom rod 5 is disposed; the ring switch 6 is disposed on the base 61, and the 6#2 6 defines at least one a rib 6 21 201237984 that can be in contact with the base 61: and the end of the rib 6 21- defines a tooth that is placed on the shank 6 and is worn by the shank 5 to the base. The toothed portion 6 3 is formed. 1, _ sprocket seat 6 3f 3 = around the surface to resist a yoke 6 3 2 , the second slant 6 3 3 that interacts with the rotary switch 6 2 ; a sprocket 6 4 having a - and being pierced by the rod 5 The seat 6 6 is engaged with the meshing portion 641, and the sprocket wheel; 4 and the portion 6 are embedded with holes 6 4 2; - are disposed on the sprocket 6 and the following dry body 5; - H6 is defined on the surface with a scale. The space is 6 6 1, which is used for the base of the lining 6^ turn = "; the inner system and the elastic piece 6 5 ' and the inner wall of the rotating sleeve 6 6 is 3, The toothed disc body 67 is sleeved on the rotating sleeve body 66, with g ^ 6 2, - holding: a 'two, exploded view -, two" = figure ===, action schematic one ^, ht — ',,, the yoke of the ten balance is not intended to be used for the financial use. = move = the whole group of 6 to adjust, in the adjustment: through the rotating sleeve 6 Ming (also (2) step), at this time several balls If to the opposite pole The body 5 is finely rotated, and the cymbal 11 is slowly raised and lowered against the column 3: the yoke is pushed upward to abut the column 3, and the bottom of the holding column 3 is slid to the slant of the resisting block 4 The bottommost rotary switch 6 shovel!? 2 down position 'and then when the wafer 8 reaches the balance state, then The switch 62 is turned to the locked state (ie, the closed state), and when it is locked, 201237984 .6 3 』 钭 钭 = 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 = sleeve =, 3 first - inclined surface 6 2 2 and the second inclined surface 6 3 3 that is mutually: shape "== disk 6 4 to the end of the push, so that the rotating sleeve 6 6 get 6 5 to the teeth as the two sides of the fulcrum In order to form a triangular thin flat (five), # is the first - support point 'the carrier 2 is inclined, so that the balance plate JL has a larger ▲ 敕 ^ body 1 due to the bearing surface 1 1 body 2 - Balanced height =,, = =: The adjustment of the bearing 'in terms of physical properties, when the bearing body 1 == two = «1 omtLtt Yes, the wafer machine adjuster of the present invention is reversible ς 9 flat body] • up; three points “, also reached (four) adjust the wafer 9 thousand scales I, φ phase-like system can not be adjusted: paste 2 on the resisting column 3, resisting block 4, the rod body 5, and spin 2 = over: Pay can easily and accurately adjust the balance of the wafer 9, so the rapid positioning, no need to spend a lot of time on the adjustment, and at the same time due to the placement of the bearing surface ii inclined design, Make it possible to plate 3,' and solve the spring The lack of post-derived & Q outline of progressive were prepared. However, the above description is only the scope of the patents of the preferred embodiments of the present invention, and therefore, the use of the wafer machine adjuster of the present invention in use; efficacy and purpose The present invention is an invention that is excellent in practicality, and is an application for the day of the Japanese: the application for the application, and the application is made according to law, and the audit committee is expected to give an early appointment. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a perspective view of a preferred embodiment of the present invention. The second drawing is an exploded view of the preferred embodiment of the present invention. The third figure is a perspective view 2 of a preferred embodiment of the present invention. The fourth figure is an exploded view of the preferred embodiment of the present invention. The fifth drawing is a schematic view of the implementation of the preferred embodiment of the present invention. 5A is a schematic cross-sectional view showing a preferred embodiment of the present invention. The fifth B diagram is a schematic diagram of the implementation of the three-point balance of the present invention. Figure 6 is a schematic view of the operation of the preferred embodiment of the present invention. Figure 7 is a second schematic view of the operation of the preferred embodiment of the present invention. The eighth figure is a schematic diagram 3 of the action of the preferred embodiment of the present invention. The ninth drawing is a schematic view of the operation of the preferred embodiment of the present invention. [Description of main component symbols] Supporting body·· • 1 Balance plate···10 Mounting surface···11 Carrier ●··2 Plane · · · •21 Longitudinal perforation · 22 accommodating space · • 23 Landscape Perforation · 24 Retaining column ·· •3 chute · · · • 31 cylinder · · · • 32 resisting block ·· • 4 resisting surface ·· • 41 screw hole · · · • 42 rod body · · · • 5 201237984 Balls · · · · • 51 • Rotary adjustment group • • 6 base · · · · • 61 rotary switch ·· • 6 2 ribs · · · · •621 First bevel ·· •622 sprocket holder · · · • 63 Tooth · · · · • 631 Reinforcement · · · • 632 Second bevel ·· •633 sprocket ···· •64 meshing part · · · •641 hole · · · · • 642 · · · · • 65 Rotating sleeve ·· • 66 accommodating space ·· • 661 Bump · · · · • 662 Grip · · · • 67 slab ···· •7 Reaction chamber··· 8 Wafer Substrate··•81 Wafer · · · · • 9 9

Claims (1)

201237984 VII. Patent application scope: 1 The adjustment device adjusts the angle of the 曰曰® in the reaction chamber through the balance plate through the balance plate. The main structure of the machine adjuster includes: for pressing the balance plate— At the end, and the surface of the bearing body and the balance plate is defined with a slanted bearing surface; the bearing-silently defined - the inclined-face, the inclined surface is defined by - longitudinal perforation, And the longitudinal perforation 连通 $ $ 穿 穿 穿 穿 , , , , , , , 纵向 纵向 纵向 纵向 纵向 纵向 纵向 纵向 纵向 纵向 纵向 纵向 纵向 纵向 纵向 纵向 纵向 纵向 纵向 纵向 纵向 纵向 纵向 纵向 纵向 纵向 纵向 纵向 纵向 纵向 纵向And a screw hole is defined between the resisting column and the resisting block; the spear body is through the transverse perforation, and one end is connected with the screw hole; and two,,, the whole group, the rotating adjustment system On the side of the carrier, the female rotation adjustment group is connected to the end of the rod body away from the screw hole. The wafer table adjuster of the first aspect, wherein the rotation adjusts a base that is locked to the carrier, and the base is worn by the rod; the ring is rotated on the base The switch is disposed on the base and is placed by the rod body. The top surface of the sprocket seat has a tooth portion, and the sprocket seat has a surface defined at least - abutting against the base = the sprocket on the sling and which is pierced by the stalk, the bottom of the platter defines an engaging portion that meshes with the tooth portion; - the elastic piece provided on the sprocket, the elastic piece is worn by the rod - a rotating sleeve defining a scale on the surface, the inner portion of which is defined to be placed on the base, the toothed disc holder, the toothed disc and the elastic piece; and the ''one grip body is sleeved on the rotating sleeve body For the user to hold. The wafer stage adjuster of claim 2, wherein the rotary switch defines at least a rib that is contiguous with the base, and the rib has a first bevel at one end 10 201237984. .4, as described in the scope of claim 2, the facsimile machine adjustments - the predetermined position is defined - can be interchanged with the rotary switch ^ ^ the reinforcement is at 5, as described in claim 2 Wafer table adjustment _ two bevels. There is at least one hole defined. In the middle of the sprocket wheel, the inner wall of the wafer machine adjuster as described in claim 2 has a bump. σ " Lieutenant swivel sleeve 7, as claimed in the scope of patents! In the wafer table adjuster, the side system is formed with a sliding slot, and a sliding body is slid inside the sliding slot. The wafer stage adjuster of the first aspect of the patent scope, wherein w is disposed away from one side of the rotation adjustment group and is provided with a baffle. In the case of the carrier, the wafer machine adjuster as described in the application of the patent scope, the Wei County has a Wei ball, and the ball system can be patented with the charm. The wafer table adjustment H described in the first item of the range. The contact with the resisting column defines a resisting surface that is inclined.