201237480 六、發明說明： 【發明所屬之技術領域】 本發明係關於光導波路之製造方法。 本案係根據2010年12月14日於日本申請之特願 2010-278178號而主張優先權，將其内容援用於此。 ” 【先前技術】 在電子元件間或佈線基板間之高速•高密度信號傳送 中，由習知之電氣佈線所進行的傳送時，信號的彼此干涉或 衰減成為阻礙’而使高速•高密度化有其界限。因此，開始 W將電子件間或佈線基板間藉光予以連接的技術、即所 謂的光互連。作域路徑，由與元件或基板間之結合容易 度、操作容易度的觀點而言’已檢討有具備柔軟性的 之光導波路。 、狀 作為薄膜狀光導波路與光裝置之連接方法，有如將光導波 路組裝至mT連鮮内部，將光裝置與連接隸合而予以 =接的方法。此時，不僅需要實施外形力適合連結器規 人走亦需要使芯距㈣epiteh)適合連接器規格，以使其與結 &處之連結器不發生光軸偏移。 =距1藉由料設計或財精度馳制，料進行熱硬化 膜’則必須根據其尺寸變化率而進行設計。又，若 伸收縮率不同的構造體’則密黏之層彼此造成 100144601 201237480 不致蓄積於構造内部，例如在熱膨脹率相異之構造體間，使 熱膨脹係數充分小之間隔件不密黏地咬合，而將熱應力改變 成構造體與間隔件間的滑動，則可抑制尺寸變化。（參照專 利文獻1) 然而，此方法中，由於需要形成將應力改變成外力的構造 體，故不僅作業效率差，亦有因間隔件之材質或重量而使變 化率變動的可能性。 (專利文獻1)日本專利特開2001-264565號公報 【發明内容】 (發明所欲解決之問題） 本發明之目的在於提供一種抑制了製造時所產生之尺寸 變化的光導波路之製造方法。 (解決問題之手段） 此種目的係藉下述（1)〜(6)之本發明所達成。 (1) 一種光導波路之製造方法，係具備具有核部與折射率 低於該核部之包覆部的核心層、與包夾該核心層而配置之第 1包覆層及第2包覆層的光導波路之製造方法，其依序具 有：在積層形成於基材上之上述核心層上，積層上述第1 包覆層的第1包覆層積層步驟；由上述核心層去除上述基材 的基材去除步驟；與在上述核心層之去除了上述基材之側的 面，積層上述第2包覆層的第2包覆層積層步驟。 (2) 如（1)記載之光導波路之製造方法，其中，在上述第1 100144601 5 201237480 包覆層積層步驟與上述基材去除步驟之間，具有將上述第1 包覆層、上述核心層及上述基材冷卻至室溫附近的步驟。 (3) 如（1)或（2)記載之光導波路之製造方法，其中，對上述 基材之形成上述核心層之側的面進行脫模處理。 (4) 如（3)記載之光導波路之製造方法，其中，經上述脫模 處理之面之表面粗度，係算術平均粗度Ra為60nm以下。 (5) 如（1)至(4)項中任一項記載之光導波路之製造方法，其 中，上述核心層與上述第1包覆層的密黏力，係大於上述核 心層與上述基材之密黏力。 (6) 如（5)記載之光導波路之製造方法，其中，上述核心層 與上述第1包覆層之密黏力為100至1000gf/cm2之間，上 述核心層與上述基材之密黏力為10至200gf/cm2之間。 (發明效果） 根據本發明，在積層光導波路之各層時，依將各層固定於 支稽基材上的狀態進行積層。因此，限制各層之自由伸縮， 可抑制光導波路之製造步驟中發生的尺寸變化。 【實施方式】 <光導波路> 以下說明本發明之光導波路之構造。 圖1為本發明之光導波路的剖面圖。 圖1所示之光導波路1，係具備：具有核部121與折射率 低於核部121之包覆部122的核心層（以下有時稱為核薄 100144601 6 201237480 膜）12 ;與包夾核心層12而配置之第i包覆層（以下有時稱 為第1包覆薄膜）U及第2包覆層（以下有時稱為第2包覆薄 膜)13(以下有時將第丨包覆層與第2包覆層合併稱為包覆層 或包覆薄膜）。核部121係形成傳送光之光路經的部分，包 覆部122雖然形成於核心層12但並未形成傳送光之光路 徑，屬於發揮與包覆層11、13相同機能的部分。 核心層12之厚度係配合欲形成之光導波路1的厚度而適 當設定，並無特別限定，較佳係Ιμιη以上且2〇〇μΐΏ以下， 更佳5μπι以上且1〇〇μιη以下，再更佳為1〇μιη以上且6叫爪 以下。 作為核心層12之構成材料，係使用藉光(例如紫外線）照 射或藉加熱而折射率發生改變的材料。作為此種材料之較 佳例，可舉例如以含有苯并環丁烯系聚合物、降稍烯系聚合 物等之環狀烯烴系樹脂的樹脂組成物作為主材料者，特佳為 含有降稻烯系聚合物(作為主材料)者。 由此種材料所構成之核心層12，係對彎曲等之變形的耐 f生優越，尤其是在重複彎曲變形的情況，仍不易發生核部 一匕设。卩122間之剝離，或與核心層12鄰接之包覆声 11、13間的層間剝離，亦可防止在核部121、包覆部US 内發生微裂痕的情形。其結果，可維持光導波路丨之光傳送 性能，得到耐久性優越的光導波路j。 另外，在核心層12之構成材料中，亦可含有例如抗氧化 100144601 7 201237480 d折射率調整劑、可塑劑、増黏劑、補強劑、增感劑、均 平劑、消泡劑、密黏助劑及難燃劑等之添加劑。抗氧化劑之 添加係有高溫穩定性之提升、耐候性之提升、光劣化之抑制 等效果。作為此種抗氧化劑，可舉例如單酚系、雙酚系、三 盼系等之紛系’或芳香族胺系。又，藉由添加可塑劑、增黏 劑、補強劑，則可進一步增大對彎曲之耐性。 以上述抗氧化劑為代表之添加劑的含有率（2種以上時則 為合計）’係相對於核心層12之構成材料整體，較佳為〇 5〜仞 重里/〇，更佳3〜30重量％。若此量過少，則無法充分發揮 添加劑機能，若過多，則視添加劑之種類或特性，而有發生 於核部121進行傳送之光(傳送光)之穿透率降低、圖案化不 良、折射率不穩定等之虞。 作為所形成之核部121的圖案形狀，並無特別限定，可為 具有直線狀、背曲部之狀形’具有異形、光路之分岐部、人 流部或交叉部之形狀，集光部（寬度等呈減少的部分）或光擴 散部（寬度等呈增大的部分）’或組合了此等中之2種以上的 形狀等的任一種。藉由設定光照射圖案，可容易形成任意形 狀的核部121。 包覆層11、13之厚度係配合欲形成之光導波路丨的厚度 而適當設定，並無特別限定’較佳為〇·1μιη以上且1〇〇μιη 以下，更佳1 μιη以上且50μιη以下，再更佳5μιη以上且3叫瓜 以下。 100144601 8 201237480 作為包覆層11、13之構成材料，係使用折射率較核心層 12之核部121低的材料。可舉例如丙烯酸系樹脂、曱基丙 烯酸系樹脂、聚碳酸酯、聚笨乙烯、環氧樹脂、聚醯胺、聚 醯亞胺、聚苯并哼唑、苯并環丁烯系樹脂或降稻烯系樹脂等 之環狀稀煙系樹脂导，亦可將此等中之1種或2種以上組合 (聚合物合金、聚合物摻雜物（混合物）、共聚物、複合物（積 層體）等）使用。 此等之中，尤其是在耐熱性優越的觀點，較佳係使用環氧 樹月曰、ϋ篮亞胺、聚苯并十垒、苯并環丁㈣旨或降稻婦 系树月S等之環狀烯煙系樹脂’或含有此等(為主材料)者，特 佳係以降福歸系樹脂（降箱稀系聚合物）為主者。 降捐烯系聚合物因耐熱性優越 ’故在將其使用作為包覆層 11 13之構成材料而成的光導波路中’即使在於光導波路 上^成導體層時、料體層進行加以形成佈線時、安裝光 于兀件時等予以加熱’仍可防止包覆層11、13軟化而變形 的情形。 另外’由於具有高疏水性，故可得到不易發生因吸水所造 成之尺寸變化等的包覆層U、13。 另外’降捐烯系聚合物或屬於其原料之降稍烯系單體因較 廉價’且取得容易，故亦較佳。 再者，作為包覆層11、13之構成材料，若使用以降稻烯 系+ 5物為主者，則對彎曲等之變形的耐性（耐屈曲性）優 100144601 9 201237480 越，即使在重複屈曲變形的情況，仍不易發生包覆層11、 13與核心層12間的層間剝離，亦防止於包覆部122内部發 生微裂痕的情形。因此，可維持光導波路1之光傳送性能， 最終可得到耐久性優越的光導波路1。 包覆層11、13係包失核心層12而配置，各個包覆層可由 同種之構成材料所構成，亦可由相異之構成材料所構成。 尚且，圖1所示之光導波路1係具有2個核部121者，但 於1個光導波路1中所形成之核部121的數量並無特別限 定。 再者，圖1中核心層12僅為1層，但核心層12之數量並 無特別限定，亦可將核心層12複數積層。 〈光導波路之製造方法> (第1實施形態） 接著，說明本發明之光導波路之製造方法的第1實施形 態。 圖2至圖8為表示本發明之光導波路之製造方法之各步驟 的圖。 以下，將光導波路之製造方法分為[1]核薄膜製作步驟、[2] 包覆薄膜製作步驟、[3]第1包覆層積層步驟、[4]基材去除 步驟、[5]第2包覆層積層步驟進行說明。 [1]核薄膜製作步驟 在製作核薄膜12的步驟中，係製作具有高折射率之核部 100144601 10 201237480 121的核薄膜12。如圖3(a)所示，核薄膜12係藉由對形成 於核薄膜支樓基材41上之核形成用薄膜2照射光而製作。 核形· _ 2之構成材料’若㈣進行傳送之光實質上 呈透明的材料則可使用任意材料，具體而言，可使用上述者 作為核心層12之構成材料。 尤其是核形成用薄膜2，適合使用於例如使用了 600 1550nm左右之波長區域光的資料通信中。因此，適合 使用在此波長區域内具有充分透明性者。於此，若在 600〜1550nm左右之波長區域中具有透明性，則較佳係例如 上述波長區域中之光線穿透率為9Q%以上、特佳％%以上。 於此，光線穿透率係依照JISK71G5所収。具體而言，係 將薄膜形成、切出成根據nsK71G5的尺和安裝於分光計 中’使白色光源穿透薄膜後，測定光線穿透量。 作為使用上述構成材料而形成核形成用薄膜2的方法，係 藉由如圖2所不般’將核薄膜形成用材料（以下有時稱為核 ’月漆)21塗佈至核薄臈支撲基材41後，使其硬化（固化)的 方法所形成。 具體而言，係在核薄臈支撐基材41上藉由可控制吐出的 喷嘴5塗佈核_形成用材料2卜於核薄膜支撐基材41上 形成液狀被膜。此時，核賴支縣材41係朝圖2中之A 方向旋轉’喷嘴5係由核薄膜支撐基材41之中央部朝B方 向進打移動。又’來自噴嘴5之核薄膜形成用材料21的吐 100M4601 201237480 出里為可控制，通常設定成由核薄膜支樓基材Μ之中央部 起吐出量朝向端部而變多。藉此，可於核薄膜支樓基材、 上依均一厚度塗佈核薄膜形成用材料21。 核薄膜支撐基材41之旋轉數，係控制核形成用_ 2尸 度的因子之一，若為不致因離 予 刀而使所塗佈之核薄膜形成 用材料21飛散的旋轉數即可，具體而言較㈣6G〜1〇〇rpm 另外’來自噴嘴5之核薄膜形成用材料2ι的吐出量 為控制核形成用薄膜2厚度的因子之―，其為可 與核薄膜支撐基材41之間_程度，並無特觀定，^佳 為 3〜7cm/min。 其次，將塗佈了該核薄膜形成用材料21的核 材41置於經換氣的水平台上，使液狀被膜表面之不均一 Γρ 分進行水平化，並使溶職發(脫輯）。藉此，可得到_ 成用薄膜2。乾燥條件並無特別蚊，較佳係依4G〜5 行10〜30分鐘。 在依塗佈法形成核形成用薄臈2時，除了上述方法以外， 可舉例如刮刀法、旋塗法、浸塗法、平台塗佈法、喷霧法、 施用裔法、淋幕法、模塗料之方法，但並不限定於此等。 作為核薄膜支撐基材41 ’可使用例如矽基板、二氧化矽 基板、玻璃基板、石英基板、聚對苯二甲酸乙二酯(ρΕτ)薄 膜等。 此種核形成用薄膜2的平均厚度，係配合欲形成之核薄膜 100144601 12 201237480 12.厚度而適當設定，並無特別限定，較佳為1〜200μηι左右、 更佳5〜ΙΟΟμιη左右、再更佳10〜60μηι左右。 另外，為了於核薄膜12與包覆薄膜11、13的界面分別產 生全反射，需要於界面存在折射率差。因此，核形成用薄膜 2之折射率若較包覆薄膜11、13之折射率高即可，並無特 別限定，較佳係設為包覆薄膜11、13之折射率的1.5〜1.8 左右。 接著，說明對核形成用薄膜2，選擇性地照射光(例如紫 外線），以形成核薄膜12的步驟。 本步驟中，如圖3(a)所示，在核形成用薄膜2之上方，配 置藉鉻61所形成的遮罩6。經由此遮罩6之開口，對核形 成用薄膜2照射光。 作為所照射之光，可舉例如可見光、紫外光、紅外光、雷 射等之活性能量光線。又，除了光以外，亦可照射X射線 等之電磁波或電子束等之粒子束。尤其是藉由使用於波長 200〜450nm之範圍内具有波岭峰長者，視光氧產生劑的組 成，可較容易地活化光氧產生劑。 另外，光之照射量並無特別限定，較佳為0.1〜9J/cm2左 右、更佳0.2〜6J/cm2左右、再更佳0.2〜3J/cm2左右。 尚且，在使用如雷射般高指向性的光時，亦可省略遮罩6 的使用。 接著，將經光照射之核形成用薄膜2藉烘爐（較佳為 100144601 13 201237480 60 C、ι〇〜3〇分鐘)使其硬化。其結果經照射光的部 位+係因^所造成之低折射率成分的聚合及高折料成分之 乖離作$❿折射率降低’在與未照射光之部位之間產生折射 率差。又，藉由施加熱，可更加表現折射率的差。其結果， 核开/成用薄膜2之經照射光的部分成為包覆部122，未照射 之郤刀成為核部12ι。藉此，形成核薄膜12(圖3(的）。 [2]包覆薄獏製作步驟 作為包覆薄膜11、13之形成用材料，若為對傳送之光實 質上呈透明的材料即可，可使用任意材料，並可使用上述物 作為包覆11、13的構成材料。尤其是包覆薄膜u、13因適 〇使用於例如使用了 6〇〇〜i55〇nm左右之波長區域之光的資 料通信中，故在此波長區域中具有充分透明性者係適合使用 作為包覆薄膜11、13的形成用材料。於此，所謂於 600〜1550nm左右之波長區域中具有透明性，較佳係例如上 述波長區域中之光線穿透率為9〇%以上、特佳99%以上。 在包覆溥膜製作步驟中，包覆薄膜11、13可藉與核形成 用薄膜2相同的方法進行製造。亦即，如圖4所示般，在包 覆薄膜支撑基材42上藉可控制吐出之喷嘴5塗佈包覆薄膜 形成用材料（以下有時稱為包覆清漆)31，於包覆薄膜支撐基 材42上形成液狀被膜。 作為包覆薄膜支樓基材42，可使用與核薄膜支撐基材41 相同的材料，例如可使用矽基板、二氧化矽基板、玻璃基板、 100144601 201237480 石英基板、聚對苯二曱酸乙二酯(PET)薄膜等。 包覆薄膜支撐基材42係朝圖4中之A方向旋轉，喷嘴5 係由包覆薄膜支撐基材42之中央部朝B方向進行移動◊此 時，來自喷嘴5之包覆薄膜形成用材料31的吐出量為可控 制，通常設定成由包覆薄膜支樓基材42之中央部起吐出量 朝向端部而變多。藉此，可於包覆薄膜支撐基材42上依均 一厚度塗佈包覆薄膜形成用材料31。 包覆薄膜支撐基材42之旋轉數，係控制包覆薄膜u、13 厚度的因子之-~~ ’右為不致因離心力而使所塗佈之包覆薄膜 形成用材料31飛散的旋轉數即可，具體而言較佳為 60〜l〇〇rpm。 另外，來自喷嘴5之包覆薄膜形成用材料31的吐出量， 亦為控制包覆薄膜11、13厚度的因子之一，其為可埋覆喷 觜5與包覆薄膜支撐基材42之間隙的程度，並無特別限定， 較佳為3〜7cc/min。 其次，將塗佈了該包覆薄膜形成用材料31的包覆薄膜支 撐基材42置於經換氣的水平台上，使液狀被膜表面之不均 邛刀進行水平化，並使溶媒蒸發(脫溶媒）^藉此，可得到 包覆薄膜1卜13。乾燥條件並無特別限定’較佳係依4 〇〜5 〇 進行10〜30分鐘。 在依塗佈法形成包覆薄膜u、13時，除了上述方法以外， 可舉例如刮膽、旋塗法、浸塗法、平台塗佈法、喷霧法、 100144601 15 201237480 施用益法、淋幕法、模塗法等之方法，但並不卩_此等。 =種包覆薄膜n、13之平均厚度係配合欲形成之包覆 ^、卜13的厚度而適當設定’並無特別限定，較佳為 0.1 1〇〇_左右、更佳1〜5一左右、再更佳5〜30μηι左右。 [3]第1包覆層積層步驟 在積層第1包覆薄膜η的步财，係於核薄膜12之一面 上、’積層折射率低於核部121的第丄包覆薄膜心 以下，說明將第1包覆薄膜11藉熱壓黏而積層於核薄膜 12的方法。 針對將第1包覆薄膜u貼合至核薄膜12的方法使用圖 5、圖6具體地進行說明。 由上述包覆薄_作步顯得之第丨包㈣膜u，係於 積層基板71 _L ’㈣賴#材72與包覆薄膜支撐基材42 而貼合。接著，將積層基板71之未積層帛丨包覆薄膜n 之側的面，吸黏固定於貼合裝置之吸黏板73。 另方面％行電暈處理而提升了表面濕潤性的核薄膜 12，亦經由核薄膜支撐基材4卜吸黏固定於貼合裝置之吸 黏板73。 接著，施加自動輥74，使第1包覆薄膜11與核薄膜12 假貼合。 ' 接著，去除吸黏板73，在核薄膜支撐基材41之未積層核 薄膜12之側的面上，載放保護片材72，實施熱壓黏處理。 100144601 201237480 熱壓黏處理時 器，使核 薄膜12與第1包覆薄 係例如使用由矽橡膠8所得的層合 缚犋11熱壓黏。作為熱壓黏之溫度，一 較佳100〜12〇。(：的範圍。作為熱壓黏之 U〜lOMPa、較佳〇.1〜4MPa的範圍。 般設為80〜140¾、車交 壓力，一般設定為〇.】 作為上述積層基板7卜並無特別限定，可使用例如不銹 鋼板、玻璃、Si晶圓、電木板等面时滑性高之基材。 另外’作為保護片材72,並無特別限定，可使用例如pET、 pi、鐵氟龍（s主冊商標）等之片材狀聚合物薄膜。 在上述熱壓黏時，視需要藉由應用減壓環境或真空，則可 將積層時被帶入於第1包覆薄膜11與核薄膜Π之間而殘留 的空氣等之氣體成分抑制於最小限，抑制接觸部的空隙發 生’可得到平坦性良好之第1包覆薄膜積層體9，而較佳。 減壓環境或真空，可應用在第1包覆薄膜11與核薄膜 的接觸時，或在第1包覆薄膜11與核薄膜12的熱壓黏時， 或其等兩者。減壓環境或真空的應用，可採用真空層合、真 空壓製等而進行。 藉由上述熱壓黏時之熱所造成之核薄膜12與第1包覆薄 膜11的交聯構成形成’核薄膜12與第1包覆薄膜u之密 黏力變得較核薄膜12與核薄膜支撐基材41之密黏力更強。 其結果’容易由核薄膜12剝離核薄膜支撐基材41。亦即， 若核薄膜12與第1包覆薄膜11之密黏力較核薄膜12與核 薄膜支撐基材41之密黏力強’則在由核薄膜支撐基材41 100:丨44601 17 201237480 剝離核薄膜12時，不致由第1包覆薄膜11剝離核薄膜12。 核薄膜12與第1包覆薄膜11之密黏力，較佳為 100〜1000gf/cm2、更佳200〜800gf/cm2。又，核薄膜12與核 薄膜支撐基材41之密黏力，較佳為1〇〜2〇〇gf/cm2、更佳 50〜100gf/cm2。於此’密黏力係依照jis K7127所測定。將 所得之3層光導波路切出為jIS Κ7127指定的試驗片形狀， 將該試驗片兩端部挾入至拉張試驗機(A&D股份有限公司 製拉張試驗機Tensilon STM-T-50)的夾具部，一邊將交又頭 速度保持為5cm/min、一邊作動試驗機，測定試驗片破斷時 的強度。 若核薄膜12與第i包覆薄膜^之密黏力為上述下限以 上’則可得到光傳送性能高的料波路^又，若核薄膜η 與第1包覆薄膜11之密黏力為上述上限以下，則不致損及 光導波路構造體的外形加讀。又，若核薄膜12與核薄膜 支芽土材41之雄黏力為上述範圍0，則操作時其等不發生 自然剝離’且在基材去除步驟巾，可容㈣離核薄臈支樓基 [4]基材去除步驟 於基材去除步驟中，由核薄膜12去除核薄膜支撐基木 ^核薄膜12去除核薄膜支縣材41的方法，可為例士 藉由則端k細之軒般物於㈣膜支縣材4ι中製作剝离 點’再由核薄膜12剝離核薄臈支撑基材4卜亦可於核薄用 100144601 201237480 支撐基材41貼附局黏著力的膠帶，使核薄膜支樓基材4i 與膠帶-起剝離。核薄膜12雖然由核薄膜支撐基材41進行 剝離’但因被積層於包覆薄膜u上，故幾乎未受到核薄膜 支推基材41的收縮應力。因此，可抑制在第i包覆薄膜^ 與核薄膜12之積層時所發生的核薄膜12之尺寸變化。 [5]第2包覆層積層步驟 第2包覆層積層步驟中’係於由第丨包覆薄膜積層體9 剝離了核薄膜支撐基材41的核薄膜12之面上，積層折射率 低於核部121的第2包覆薄膜13。 町，說明將第2包覆薄膜13積層於核薄膜12之未積層 第1包覆薄膜11之侧的面上的方法。 '針對將第2包覆薄膜13貼合至核薄膜12的方法，使用圖 7、8進行具體說明。 由上述包覆薄膜製作步驟所得之第2包㈣膜13，係經 由包覆薄膜支撐基材42,吸黏固定於貼合裝置的吸黏板73。 另一方面，在由第1包覆薄膜積層體9剝離核薄膜支撐基 材41而路出的核薄膜12的面上’施加電暈處理使表面濕潤 性提升。接著’將經由保護片材72而積層了第i包覆薄膜 積層體9的積層基板71之未積層第1包覆薄膜積層體9的 面，吸黏固定於貼合裝置的吸黏板73。 接著，施加自動輥74，使核薄膜12與第2包覆薄膜13 假貼合。 100144601 201237480 接著’去除吸勒板73，經由包覆薄膜支撲基材42，於第 包覆’專膜13上重新載放保護片材72，實施熱壓黏處理。 熱壓黏處理時，你办，， τ %例如使用由矽橡膠8所得的層合器，使核 薄膜12與第2台涛·^ L復溥膜13熱壓黏。作為熱壓黏之溫度，一 般設為80〜140。(：、^ ^ 。 。 較佳1〇〇〜120 C的範圍。作為熱壓黏之 堡力’-般設定為〇1〜1〇MPa、較佳〇1〜譬a的範圍 2 -------τ八-· 〜HMra的軏圓。 將積層時视需要藉由應用減壓環境或真空，則可 的空:等第4包覆薄膜13與核薄膜12之間而殘留 生，可得到平2二制於最小限，抑制接觸部的空隙發 環境或真空，可1 ’錢佳。減壓 第2匕覆薄膜13斑妨蒲替 時，或在第2包覆薄 〃㈣膜12的接觸 兩者。減屋環境咬真*、"、2的熱壓黏時，或其等 等而進行。次真空的應用’可採用真空層合、真空壓製 如此’經由上诚 行使耐熱性、_^謂到料波路，㈣麵進-步進 環境耐性提相處㉟耐迴焊性、耐_性、耐藥品性等之 性，等之機二==使耐f曲性，曲 將聚醯亞胺膠帶或 、处此等處理可舉例如 路之至少單面側上的\=酸轉帶㈣於所得之光導波 (第2實施形態） 者說明本發明之光導波路之製造方 100144601 』禾Z實施形 Ο 20 201237480 態。 以下係以與第1實施形態之相異點為中心進行說明，關於 相同事項，則省略其說明。 第2實施形態中’在第1包覆層積層步驟與基材去除步驟 之間，具體而言，係在第1包覆薄膜11與核薄膜12之熱壓 黏後，進行將第1包覆薄膜11、核薄膜12及核薄膜支撐基 材41冷卻的步驟(熟化步驟）。冷卻係使薄膜表面溫度降低 至室溫附近即可，較佳為冷卻至15〜25eC、更佳18〜22。(：。 於熟化步驟中所使用之冷卻方法並無特別限定，可為自然冷 卻，在使用機器等的情況，亦可使用例如層合器之樣本冷卻 用扇等而進行冷卻。 . 藉由進行冷卻步驟(熟化步驟），則使核薄膜12與第i包 覆薄膜11充分熱壓黏’在由核薄膜12剝離核薄膜支撐基材 41時，可於核薄膜12與包覆薄膜u抑制微空隙的=。 又，藉由降低薄膜表面溫度，可無限度地減小剝離時之構造 變化，抑制尺寸及折射率分佈的，匕，藉此可得到尺寸變化 與光學特性之面内偏差較小的光導波路構造體。 (第3實施形態） • 接著，說明本發明之光導波路之製造方法的第3實施形 • 態。 以下係以與第丨實施形態之相異點為中心進行說明，關於 同樣事項則省略其說明。 100144601 21 201237480 第3實施形態中，係對核镇 h 4膜支撐基材41之形成核薄膜 Π之侧的面進行脫模處理。 例如’在核薄膜支撐基材41之 形成核薄膜12之側的面上，竹士 將表面張力較弱之材料、且體 而言為鐵氟龍(註冊商標）進行塗佈歧化處理，使表面找 模性提升。 藉由對核薄膜支撐基材41 竹進仃脫模處理，則在積層了第 1包覆薄膜11後，可由核褚—Η h溥膜12谷易地剝離核薄臈支撐基 材4卜 另外’藉由對核薄膜支樓基材Μ進行脫模處理，可提升 核薄膜支樓基材41之表面平滑性。亦即，若於核薄膜支撐 基材41上有凹凸，則該凹凸將轉印至核薄膜12，而有發生 光散射的可能性，但藉由脫模處理提升核薄膜支撐基材41 之表面平滑性，則可抑制此種光散射。具體而言，若將脫模 處理後之核薄膜支樓基材41的表面平滑性，減低至算術平 均粗度Ra為傳送波長的1 〇分之1及60nm以下，則可抑制 因核薄膜12之凹凸所造成的光散射。算術平均粗度Ra係 依照JIS B0601進行測定。具體而言，係藉LASER |員微浐 掃描表面’計測來自表面的散射光。藉由所計測之光量的解 析，算出算術平均粗度 由上述所得之光導波路，可用於例如光通信用之光伟線 中0 另外，該光佈線係藉由與既存之電氣佈線一起混合戟置於 100144601 22 201237480 基板上，而可構成所謂「光電混載基板」。此種光電混載基 板中’係例如將藉光佈線（光導波路之核部）所傳送的光信 號’於光裝置中轉換成電信號，而傳送到電氣佈線。藉此， 於光佈線之部分，可進行較習知電氣佈線更高速且大容量的 資訊傳送。因此，藉由於例如連接CPU或LSI等之演算裝 置與RAM等之記憶裝置之間的匯流排等中，應用該光電混 載基板’則可提高系統整體的性能，並可抑制電磁雜訊的發 生。 尚且，此種光電混載基板可考慮搭載於例如行動電話、遊 戲機、個人電腦、電視、家用伺服器等高速傳送大容量資料 的電子機器類。 (實施例） 以下’根據實施例更詳細地說明本發明，但本發明並不限 定於此。 (實施例1) 1.核薄膜之製作 <己基降稻烯（HxNB)/二苯基曱基降稻烯甲氧基矽烷 (diPhNB)系共聚物之合成> 將 HxNB(CAS 編號第 22094-83-3 號)(9.63g、0.054 莫耳）、 diPhNB(CAS 編號第 376634-34-3 號)(40.37g、0.126 莫耳）、 1-己烯(4.54g、0.054莫耳)及曱苯(I50g)，置入乾燥箱内之 500mL容量血清瓶並混合，再於油浴中一邊加熱至80。(：、 100144601 23 201237480 -邊攪拌以作成溶液。於此溶液中，將pdl446(1 Q4xi〇_2g、 7.20x10莫耳）及肆（五氟苯基）硼酸n，n_二甲基苯銨 (DANFABA)(2.30xl(r2g、2 88χ1〇.5 莫耳），分別依濃縮二氯 甲燒溶液(G.lmL)之形態進行添加。將添加後之混合物藉磁 性授拌子於8GC下搜拌2小時。其後，將反應混合物（曱笨 溶液)移至更大的燒杯巾，於其巾滴下屬於貧溶媒的曱醇叫 時’發生纖維狀之白色固形份的H _收集固形份並於 60C烘爐内使其真空乾燥’結果得到乾燥質量19輕產率 38〇/。)的生成物。藉凝膠滲透層析法(Gp^ THF溶媒，聚笨201237480 VI. Description of the Invention: [Technical Field of the Invention] The present invention relates to a method of manufacturing an optical waveguide. This case claims priority based on Japanese Patent Application No. 2010-278178, filed on Dec. 14, 2010, the disclosure of which is incorporated herein. [Prior Art] In high-speed and high-density signal transmission between electronic components or between wiring boards, interference or attenuation of signals interferes with transmission by conventional electrical wiring, and high-speed and high-density are available. Therefore, a technique of connecting light between electronic components or between wiring boards, that is, a so-called optical interconnection, is started. The domain path is based on the ease of coupling with the element or the substrate, and the ease of operation. It has been reviewed that there is a flexible optical waveguide. The connection method is a method of connecting a film-shaped optical waveguide to an optical device. For example, the optical waveguide is assembled into the mT continuous interior, and the optical device is connected to the connection and connected. At this time, it is not only necessary to implement the shape force to fit the connector, but also to make the core distance (4) epitheh suitable for the connector specification so that the connector with the junction & does not have an optical axis offset. The design of the material or the precision of the material, the material of the thermosetting film ' must be designed according to the dimensional change rate. Also, if the structure with different shrinkage and shrinkage' is a dense layer This causes 100144601 201237480 to not accumulate inside the structure, for example, between structures having different thermal expansion rates, such that the spacers having a sufficiently small thermal expansion coefficient are not tightly bonded, and the thermal stress is changed into a sliding between the structural body and the spacer. However, in this method, since it is necessary to form a structure in which stress is changed to an external force, not only the work efficiency is poor, but also the rate of change varies depending on the material or weight of the spacer. (Problem to be Solved by the Invention) An object of the present invention is to provide an optical waveguide that suppresses dimensional changes generated during manufacturing. (Manufacturing method) The object of the present invention is achieved by the present invention according to the following (1) to (6). (1) A method for producing an optical waveguide comprising having a core portion and a refractive index lower than The core layer of the cladding portion of the core portion, and the method for manufacturing the optical waveguide of the first cladding layer and the second cladding layer which are disposed to sandwich the core layer, and have the following steps: a step of laminating a first cladding layer of the first cladding layer on the core layer formed on the substrate, a substrate removal step of removing the substrate from the core layer, and removing the core layer from the core layer The surface of the side of the substrate is a step of laminating the second cladding layer of the second cladding layer. (2) The method for producing an optical waveguide according to (1), which is coated in the first 100144601 5 201237480 Between the step of laminating the layer and the step of removing the substrate, the first cladding layer, the core layer, and the substrate are cooled to a temperature near room temperature. (3) The light guide according to (1) or (2) In a method of producing a wave path, the surface of the substrate on which the core layer is formed is subjected to a mold release treatment. (4) The method for producing an optical waveguide according to (3), wherein The surface roughness is an arithmetic mean roughness Ra of 60 nm or less. (5) The method for producing an optical waveguide according to any one of (1), wherein the core layer and the first cladding layer have a higher adhesion force than the core layer and the substrate. The dense adhesion. (6) The method for producing an optical waveguide according to (5), wherein the core layer and the first cladding layer have a pressure of 100 to 1000 gf/cm 2 , and the core layer is densely bonded to the substrate. The force is between 10 and 200 gf/cm2. (Effect of the Invention) According to the present invention, when each layer of the optical waveguide is laminated, the layers are laminated in a state in which the layers are fixed to the substrate. Therefore, the free expansion and contraction of each layer is restricted, and the dimensional change occurring in the manufacturing steps of the optical waveguide can be suppressed. [Embodiment] <Optical Guide Circuit> The structure of the optical waveguide of the present invention will be described below. BRIEF DESCRIPTION OF THE DRAWINGS Figure 1 is a cross-sectional view showing an optical waveguide of the present invention. The optical waveguide 1 shown in FIG. 1 includes a core layer having a core portion 121 and a cladding portion 122 having a lower refractive index than the core portion 121 (hereinafter sometimes referred to as a core thin film 100144601 6 201237480 film) 12; The i-th cladding layer (hereinafter sometimes referred to as a first cladding film) U and the second cladding layer (hereinafter referred to as a second cladding film) 13 disposed in the core layer 12 (hereinafter sometimes referred to as a third layer) The combination of the cladding layer and the second cladding layer is referred to as a cladding layer or a coating film). The core portion 121 forms a portion through which the light path of the light is transmitted, and the cladding portion 122 is formed on the core layer 12 but does not form an optical path for transmitting light, and belongs to a portion that functions similarly to the cladding layers 11 and 13. The thickness of the core layer 12 is appropriately set in accordance with the thickness of the optical waveguide 1 to be formed, and is not particularly limited, and is preferably Ιμη or more and 2 〇〇μΐΏ or less, more preferably 5 μπι or more and 1 〇〇μηη or less. It is 1 〇 μιη or more and 6 is below the claw. As a constituent material of the core layer 12, a material which is irradiated with light (for example, ultraviolet ray) or whose refractive index is changed by heating is used. As a preferable example of such a material, a resin composition containing a cyclic olefin-based resin such as a benzocyclobutene-based polymer or a olefin-based polymer, as a main material, is particularly preferred as a main component. A rice-based polymer (as a main material). The core layer 12 composed of such a material is excellent in resistance to deformation such as bending, and particularly in the case of repeated bending deformation, the core portion is not easily formed. The peeling between the crucibles 122 or the interlaminar peeling between the cladding sounds 11 and 13 adjacent to the core layer 12 can prevent the occurrence of microcracks in the core portion 121 and the cladding portion US. As a result, the optical transmission performance of the optical waveguide can be maintained, and the optical waveguide j having excellent durability can be obtained. In addition, the constituent material of the core layer 12 may also contain, for example, an antioxidant 100144601 7 201237480 d refractive index modifier, a plasticizer, a viscous agent, a reinforcing agent, a sensitizer, a leveling agent, an antifoaming agent, and a dense adhesive. Additives such as auxiliaries and flame retardants. The addition of the antioxidant has effects such as improvement in high-temperature stability, improvement in weather resistance, and suppression of photo-deterioration. As such an antioxidant, for example, a monophenolic system, a bisphenol system, a trisodium system or the like can be mentioned, or an aromatic amine system. Further, by adding a plasticizer, a tackifier, and a reinforcing agent, the resistance to bending can be further increased. The content of the additive represented by the above-mentioned antioxidant (total of two or more) is based on the entire constituent material of the core layer 12, preferably 〇5 to 仞重里/〇, more preferably 3 to 30% by weight. . If the amount is too small, the additive function cannot be sufficiently exhibited. If the amount is too large, depending on the type or characteristics of the additive, the transmittance of the light (transmission light) generated by the core portion 121 is lowered, the patterning is poor, and the refractive index is low. Unstable and so on. The shape of the core portion 121 to be formed is not particularly limited, and may be a shape having a linear shape and a curved shape, a shape having a shape, a branching portion of an optical path, a flow portion or an intersection portion, and a light collecting portion (width) Any of the light diffusing portions (portions having an increased width or the like) or the combination of two or more of these shapes. By setting the light irradiation pattern, the core portion 121 of any shape can be easily formed. The thickness of the coating layers 11 and 13 is appropriately set in accordance with the thickness of the optical waveguide to be formed, and is not particularly limited, and is preferably 〇·1 μm or more and 1 μmη or less, more preferably 1 μm or more and 50 μm or less. More preferably 5μιη or more and 3 is called melon. 100144601 8 201237480 As a constituent material of the cladding layers 11, 13, a material having a refractive index lower than that of the core portion 121 of the core layer 12 is used. For example, an acrylic resin, a mercapto acrylic resin, a polycarbonate, a polystyrene, an epoxy resin, a polyamide, a polyimine, a polybenzoxazole, a benzocyclobutene resin, or a rice can be mentioned. One or two or more of these may be combined with a ring-shaped thin-smoke resin such as an olefin resin (polymer alloy, polymer dopant (mixture), copolymer, composite (laminate)) Etc.) use. Among these, in particular, in the viewpoint of superior heat resistance, it is preferred to use Epoxy sapphire, sputum imine, polybenzo benzene, benzocyclobutene (IV), or rice saplings, etc. The cyclic olefinic resin 'or contains these (main materials), and the special one is based on the lowering of the low-grade polymer. In the optical waveguide in which the olefin-based polymer is excellent in heat resistance, it is used as a constituent material of the coating layer 11 13 to form a wiring layer even when the conductor layer is formed on the optical waveguide. When the light is attached to the element, it is heated to prevent the coating layers 11 and 13 from softening and deforming. Further, since it has high hydrophobicity, the coating layers U and 13 which are less likely to cause dimensional changes due to water absorption can be obtained. Further, it is also preferred that the olefinic polymer or the olefinic monomer which is a raw material thereof is relatively inexpensive and easy to obtain. In addition, as the constituent material of the coating layers 11 and 13, when the rice-based system is used, the resistance to deformation such as bending (buckling resistance) is preferably 100144601 9 201237480, even in repeated buckling. In the case of deformation, the interlayer peeling between the cladding layers 11, 13 and the core layer 12 is still less likely to occur, and the occurrence of micro-cracks inside the cladding portion 122 is also prevented. Therefore, the optical transmission performance of the optical waveguide 1 can be maintained, and finally the optical waveguide 1 having excellent durability can be obtained. The cladding layers 11 and 13 are disposed so as to cover the core layer 12, and each of the cladding layers may be composed of the same constituent material or may be composed of different constituent materials. Further, although the optical waveguide 1 shown in Fig. 1 has two core portions 121, the number of core portions 121 formed in one optical waveguide 1 is not particularly limited. Further, the core layer 12 in Fig. 1 is only one layer, but the number of the core layers 12 is not particularly limited, and the core layer 12 may be laminated in plural. <Manufacturing Method of Optical Guide Wave Path> (First Embodiment) Next, a first embodiment of a method of manufacturing an optical waveguide according to the present invention will be described. Fig. 2 to Fig. 8 are views showing the steps of a method of manufacturing an optical waveguide of the present invention. Hereinafter, the manufacturing method of the optical waveguide is classified into [1] nuclear thin film production step, [2] coated thin film production step, [3] first cladding layer stacking step, [4] substrate removal step, [5] 2 The step of laminating the layer is described. [1] Nuclear film production step In the step of producing the core film 12, a core film 12 having a core portion of a high refractive index of 100144601 10 201237480 121 is produced. As shown in Fig. 3 (a), the nuclear thin film 12 is produced by irradiating light to the film 2 for forming a core formed on the core film substrate base 41. The constituent material of the nucleus and the _ 2 can be any material as long as the light transmitted by the (4) light is substantially transparent. Specifically, the above-mentioned one can be used as the constituent material of the core layer 12. In particular, the film 2 for forming a core is suitably used in, for example, data communication using light in a wavelength region of about 600 to 1550 nm. Therefore, it is suitable to use those having sufficient transparency in this wavelength region. Here, when transparency is present in a wavelength region of about 600 to 1550 nm, it is preferable that the light transmittance in the wavelength region is, for example, 9 Q% or more and particularly preferably %% or more. Here, the light transmittance is in accordance with JIS K71G5. Specifically, the film was formed and cut into a ruler according to nsK71G5 and mounted in a spectrometer. After the white light source was penetrated through the film, the amount of light penetration was measured. As a method of forming the film 2 for forming a core using the above-described constituent material, a material for forming a nuclear thin film (hereinafter sometimes referred to as a core 'moon paint) 21 is applied to the core thin layer by a technique as shown in FIG. 2 . After the substrate 41 is rubbed, it is formed by a method of hardening (curing). Specifically, a core-formation material 2 is applied to the core thin film support substrate 41 by a nozzle 5 that can be controlled to be discharged, and a liquid film is formed on the core film support substrate 41. At this time, the nuclear power source 41 is rotated in the direction A in Fig. 2, and the nozzle 5 is moved in the direction B from the central portion of the nuclear film supporting substrate 41. Further, the discharge of the nuclear film forming material 21 from the nozzle 5 is controlled to be 100M4601 201237480, and is usually set so that the amount of discharge from the center portion of the core film substrate base is increased toward the end portion. Thereby, the nuclear thin film forming material 21 can be applied to the core film support base material in a uniform thickness. The number of rotations of the nuclear film supporting substrate 41 is one of the factors for controlling the nucleus of the nucleus for forming the nucleus, and the number of rotations of the coated nuclear thin film forming material 21 which is not caused by the knives may be detached. Specifically, it is more than (4) 6G to 1 rpm. Further, the amount of discharge of the nuclear film forming material 2 from the nozzle 5 is a factor for controlling the thickness of the film 2 for forming a core, which is compatible with the core film supporting substrate 41. _ degree, no special set, ^ good is 3 ~ 7cm / min. Next, the core material 41 coated with the material for forming the nuclear film is placed on a ventilated water platform to level the unevenness of the surface of the liquid film, and to dissolve the hair (displacement). . Thereby, the film 2 for use can be obtained. There are no special mosquitoes in the drying condition, and it is preferred to carry out 4 to 5 minutes for 10 to 30 minutes. When the thin layer 2 for forming a core is formed by a coating method, in addition to the above methods, for example, a doctor blade method, a spin coating method, a dip coating method, a stage coating method, a spray method, an application method, a curtain method, The method of the mold coating, but is not limited thereto. As the core film supporting substrate 41', for example, a ruthenium substrate, a ruthenium dioxide substrate, a glass substrate, a quartz substrate, a polyethylene terephthalate (ρΕτ) film, or the like can be used. The average thickness of the film 2 for forming a core is appropriately set in accordance with the thickness of the core film 100144601 12 201237480 to be formed, and is not particularly limited, but is preferably about 1 to 200 μm, more preferably about 5 to ΙΟΟμηη, and more. Good 10~60μηι or so. Further, in order to cause total reflection at the interface between the core film 12 and the coating films 11, 13, it is necessary to have a refractive index difference at the interface. Therefore, the refractive index of the film 2 for forming a core is not particularly limited as long as the refractive index of the coating films 11 and 13 is higher, and it is preferable to set the refractive index of the coating films 11 and 13 to about 1.5 to 1.8. Next, a step of selectively irradiating light (e.g., ultraviolet rays) to the core forming film 2 to form the nuclear thin film 12 will be described. In this step, as shown in Fig. 3 (a), a mask 6 formed of chromium 61 is disposed above the film 2 for forming a core. The film 2 for nucleation is irradiated with light through the opening of the mask 6. Examples of the light to be irradiated include active energy rays such as visible light, ultraviolet light, infrared light, and laser light. Further, in addition to light, a particle beam such as an electromagnetic wave such as an X-ray or an electron beam may be irradiated. In particular, by using a composition having a peak of a peak in the range of 200 to 450 nm in wavelength, the composition of the photo-oxygen generator can easily activate the photo-oxygen generator. Further, the amount of irradiation of light is not particularly limited, but is preferably about 0.1 to 9 J/cm 2 , more preferably about 0.2 to 6 J/cm 2 , still more preferably about 0.2 to 3 J/cm 2 . Furthermore, the use of the mask 6 can be omitted when using light such as laser-like high directivity. Next, the light-irradiated core-forming film 2 is hardened by an oven (preferably 100144601 13 201237480 60 C, ι 〇 3 〇 minutes). As a result, the portion of the irradiated light + the polymerization of the low refractive index component due to the ? and the enthalpy of the high refractive component are reduced by the refractive index of the refractive index difference between the portion and the portion where the light is not irradiated. Further, by applying heat, the difference in refractive index can be more expressed. As a result, the portion of the film 2 for illuminating/forming the light to be irradiated becomes the cladding portion 122, and the blade that is not irradiated becomes the core portion 12i. Thereby, the nuclear thin film 12 is formed (Fig. 3). [2] The coating thinning step is a material for forming the coating films 11, 13 and is a material that is substantially transparent to the transmitted light. Any material may be used, and the above materials may be used as the constituent material of the coatings 11, 13. In particular, the coating films u, 13 are suitably used for, for example, light having a wavelength region of about 6 〇〇 to about 55 〇 nm. In the case of data communication, it is suitable to use a material for forming the coating films 11 and 13 in the case of sufficient transparency in the wavelength region. Here, the film has transparency in a wavelength region of about 600 to 1550 nm, and is preferably a system. For example, the light transmittance in the wavelength region is 9% by mass or more, and particularly preferably 99% or more. In the step of forming the coated film, the coated films 11 and 13 can be produced by the same method as the film 2 for forming a core. In other words, as shown in FIG. 4, a coating film forming material (hereinafter sometimes referred to as a coating varnish) 31 is applied to the coated film supporting substrate 42 by a nozzle 5 that can control the discharge. A liquid film is formed on the film supporting substrate 42. The film support substrate 42 can be made of the same material as the core film support substrate 41, for example, a ruthenium substrate, a ruthenium dioxide substrate, a glass substrate, a 100144601 201237480 quartz substrate, and polyethylene terephthalate (PET) can be used. The film supporting substrate 42 is rotated in the A direction in FIG. 4, and the nozzle 5 is moved in the B direction from the central portion of the covering film supporting substrate 42. At this time, the coating from the nozzle 5 is performed. The discharge amount of the film forming material 31 is controllable, and is usually set so that the discharge amount increases toward the end portion from the central portion of the cover film base material 42. Thereby, the film support substrate 42 can be coated. The coating film forming material 31 is applied in a uniform thickness. The number of rotations of the coating film supporting substrate 42 is a factor that controls the thickness of the coating film u, 13 - the right is not coated by centrifugal force. The number of rotations of the coating film forming material 31 may be, in particular, preferably 60 to 1 rpm. The discharge amount of the coating film forming material 31 from the nozzle 5 is also controlled to be coated. One of the factors of the thickness of the film 11, 13 The degree of the gap between the squeegee 5 and the coating film supporting base material 42 is not particularly limited, but is preferably 3 to 7 cc/min. Next, the coating film coated with the coating film forming material 31 is supported. The substrate 42 is placed on a ventilated water platform to level the uneven boring on the surface of the liquid film, and the solvent is evaporated (desolvent) to obtain a coated film 1 . It is not particularly limited, and it is preferably carried out for 10 to 30 minutes. When the coating films u and 13 are formed by the coating method, in addition to the above methods, for example, scraping, spin coating, dipping Coating method, platform coating method, spray method, 100144601 15 201237480 Method of applying the method of profit, curtain method, die coating method, etc., but not 卩 _. The average thickness of the coating film n, 13 is appropriately set in accordance with the thickness of the coating to be formed, and the thickness of the cloth 13 is not particularly limited, and is preferably about 0.1 〇〇 _, more preferably about 1 to 5 More preferably 5~30μηι. [3] In the first cladding layer stacking step, the step of laminating the first cladding film η is performed on one surface of the nuclear thin film 12, and the 'layer refractive index is lower than the core of the second cladding film of the core portion 121, A method of laminating the first coating film 11 by heat and pressure to laminate the core film 12. The method of bonding the first coating film u to the core film 12 will be specifically described with reference to Figs. 5 and 6 . The film (4) film u which is formed by the above-mentioned coating thin film is bonded to the laminated substrate 71_L' (4) and the coated film supporting substrate 42. Next, the surface of the laminated substrate 71 on the side of the uncoated layer of the coating film n is adhered and fixed to the suction plate 73 of the bonding apparatus. On the other hand, the nuclear film 12 which has been subjected to corona treatment and has improved surface wettability is also fixed to the adhesive sheet 73 of the bonding apparatus via the nuclear film supporting substrate 4. Next, the automatic roller 74 is applied to falsely bond the first coating film 11 and the nuclear film 12. Then, the pressure-sensitive adhesive sheet 73 is removed, and the protective sheet 72 is placed on the surface of the core film supporting substrate 41 on the side of the unlaminated nuclear film 12, and subjected to thermal compression bonding. 100144601 201237480 The thermocompression bonding process is such that the core film 12 and the first coating film are heat-bonded, for example, using a laminate 犋11 obtained from the yttrium rubber 8. As the temperature of the hot press bonding, a temperature of 100 to 12 Å is preferable. (The range of: as a thermocompression bonding U~lOMPa, preferably 〇.1~4MPa range. Generally, it is set to 80~1403⁄4, the vehicle cross pressure is generally set to 〇.] As the above laminated substrate 7 is not particularly For example, a substrate having a high surface smoothness such as a stainless steel plate, a glass, a Si wafer, or a bakelite can be used. Further, 'the protective sheet 72 is not particularly limited, and for example, pET, pi, and Teflon can be used. a sheet-like polymer film such as the s-booklet trademark. In the above-mentioned hot-pressing, if necessary, the first coating film 11 and the core film can be carried by laminating by applying a reduced pressure environment or a vacuum. It is preferable that the gas component such as air remaining between the crucibles is minimized, and the occurrence of voids in the contact portion is suppressed, and the first coating thin film layered body 9 having good flatness can be obtained, which is preferable. When the first coating film 11 is in contact with the core film, or when the first coating film 11 and the core film 12 are thermally pressure-bonded, or the like, a vacuum layer may be used for the application of a reduced pressure environment or a vacuum. Combined with vacuum pressing, etc., caused by the heat of the above-mentioned hot press bonding The cross-linking of the core film 12 and the first coating film 11 constitutes a stronger adhesion between the core film 12 and the first coating film u, and becomes stronger than the core film 12 and the core film supporting substrate 41. As a result, the core film supporting substrate 41 is easily peeled off by the core film 12. That is, if the dense adhesion between the core film 12 and the first coating film 11 is stronger than that of the core film 12 and the core film supporting substrate 41. When the core film 12 is peeled off by the core film supporting substrate 41 100: 丨 44601 17 201237480, the core film 12 is not peeled off by the first covering film 11. The adhesion between the core film 12 and the first covering film 11 Preferably, it is 100 to 1000 gf/cm2, more preferably 200 to 800 gf/cm 2. Further, the adhesion between the core film 12 and the core film supporting substrate 41 is preferably 1 〇 2 〇〇 gf / cm 2 , more preferably 50~100gf/cm2. The 'viscous force is measured according to jis K7127. The obtained three-layer optical waveguide is cut out into the shape of the test piece specified by jIS Κ7127, and the two ends of the test piece are twisted into the tensile test. The fixture part of the machine (Tensilon STM-T-50, A&D Co., Ltd.) is kept at a speed of 5 cm/min while maintaining the head speed. The dynamic tester measures the strength at the time of breaking the test piece. If the adhesion between the nuclear film 12 and the ith cladding film is above the lower limit, then a material wave path with high light transmission performance can be obtained. When the adhesion to the first coating film 11 is not more than the above upper limit, the outer shape of the optical waveguide structure is not damaged. Further, the male bond of the nuclear film 12 and the nuclear film supporting material 41 is in the above range. , in the case of operation, the natural peeling does not occur, and in the substrate removal step, the volume can be accommodated in the substrate removal step [4] substrate removal step in the substrate removal step, the nuclear film is removed from the nuclear film 12 The method for supporting the base wood core film 12 to remove the nuclear film branch county material 41 can be made by the nuclear film 12 by using the end of the k-thinking material in the (four) film branch county material 4 The core thin crucible supporting substrate 4 can also be attached to the core substrate 100144601 201237480 supporting substrate 41 with a bonding adhesive tape to peel off the core film supporting substrate 4i from the tape. The core film 12 is peeled off by the core film supporting substrate 41. However, since it is laminated on the covering film u, it is hardly subjected to the contraction stress of the core film supporting substrate 41. Therefore, the dimensional change of the nuclear thin film 12 which occurs when the first cladding film and the nuclear film 12 are laminated can be suppressed. [5] Second cladding layer stacking step In the second cladding layer stacking step, 'the surface of the core film 12 from which the core film supporting substrate 41 is peeled off by the second coating film laminate 9 is low in refractive index. The second cladding film 13 of the core portion 121. In the case of the second coating film 13, a method of laminating the second coating film 13 on the side of the core film 12 on the side of the first coating film 11 is described. The method of bonding the second coating film 13 to the nuclear film 12 will be specifically described with reference to Figs. The second (four) film 13 obtained by the above-mentioned coating film forming step is supported by the covering film supporting substrate 42 and adhered to the suction plate 73 of the bonding apparatus. On the other hand, a corona treatment is applied to the surface of the nuclear thin film 12 which is peeled off by the first coating film laminate 9 and the nuclear thin film supporting substrate 41 is removed to improve the surface wettability. Then, the surface of the laminated substrate 71 on which the ith cladding film laminate 9 is laminated via the protective sheet 72, and the surface of the first cladding laminate 9 which is not laminated, is adhered and fixed to the adhesion plate 73 of the bonding apparatus. Next, the automatic roller 74 is applied to falsely bond the core film 12 and the second cover film 13. 100144601 201237480 Next, the suction plate 73 is removed, and the protective sheet 72 is reloaded on the first coating film 13 via the coated film baffle substrate 42 to perform thermal compression bonding. In the case of hot press bonding, if you do, τ %, for example, using a laminate obtained from ruthenium rubber 8, the nucleus film 12 and the second ruthenium ruthenium film 13 are thermocompressed. As the temperature of the hot press, it is generally set to 80 to 140. (:, ^ ^ . . . preferably a range of 1 〇〇 to 120 C. As a thermocompression viscous force, the general setting is 〇1 to 1 〇 MPa, preferably 〇1 to 譬a of the range 2 --- ---- τ 八 - · HM 軏 軏 。 HM HM HM HM HM HM HM HM HM HM HM HM HM HM HM HM HM HM HM HM HM HM HM HM HM HM HM HM HM HM HM HM HM HM HM HM HM HM It can be obtained in the minimum limit of 2, 2, and can suppress the voiding environment or vacuum of the contact part, which can be 1 'Qian Jia. Decompression 2nd coating film 13 妨 蒲 ,, or in the 2nd coating thin film (4) film 12 contact with both. Reduce the house environment bite really *, ", 2 hot press viscosity, or etc. The application of the secondary vacuum 'vacuum lamination, vacuum suppression so 'through the heat to exercise Sex, _^ is the material wave path, (4) face-in-step environment tolerance phase 35 resistance to reflow, _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ The polyimine tape or the treatment may be, for example, at least one side of the path of the \=acid transfer belt (four) to the obtained optical waveguide (second embodiment). The manufacturer of the optical waveguide of the present invention will be described. In the following, the description will be focused on the differences from the first embodiment, and the description of the same matters will be omitted. In the second embodiment, the first cladding layer is formed. Between the step and the substrate removing step, specifically, after the first coating film 11 and the core film 12 are thermally pressure-bonded, the first coating film 11, the core film 12, and the core film supporting substrate 41 are carried out. Cooling step (maturation step). The cooling system may lower the surface temperature of the film to near room temperature, preferably to 15 to 25 eC, more preferably 18 to 22. (:: The cooling method used in the ripening step and It is not particularly limited, and it can be naturally cooled. In the case of using a machine or the like, it can be cooled by using, for example, a sample cooling fan of a laminator. By performing a cooling step (aging step), the nuclear film 12 is When the core film supporting substrate 41 is peeled off by the core film 12, the i-th coating film 11 can suppress the microvoids in the core film 12 and the coating film u. Further, by lowering the film surface temperature, Can reduce the amount of peeling indefinitely By changing the size and the refractive index distribution, an optical waveguide structure having a small in-plane variation in dimensional change and optical characteristics can be obtained. (Third Embodiment) Next, the optical waveguide of the present invention will be described. The third embodiment of the manufacturing method will be described below with reference to the differences from the third embodiment, and the description of the same matters will be omitted. 100144601 21 201237480 In the third embodiment, the pair is nuclear town h 4 The surface of the film supporting substrate 41 on the side on which the core film is formed is subjected to a mold release treatment. For example, 'on the side of the core film supporting substrate 41 on the side where the core film 12 is formed, the material having a weak surface tension is In the case of Teflon (registered trademark), the coating disproportionation treatment is carried out to improve the surface moldability. By releasing the core film support substrate 41 into the bamboo mold, after the first cover film 11 is laminated, the core thin crucible support substrate 4 can be easily peeled off by the core-Η h溥 film 12 'The surface smoothness of the core film support substrate 41 can be improved by releasing the core film support substrate. That is, if there are irregularities on the core film supporting substrate 41, the unevenness is transferred to the core film 12, and there is a possibility of light scattering, but the surface of the core film supporting substrate 41 is lifted by the mold release treatment. Smoothness suppresses such light scattering. Specifically, when the surface smoothness of the core film supporting base material 41 after the release treatment is reduced to an arithmetic mean roughness Ra of 1 〇 and 60 nm or less of the transmission wavelength, the nuclear film 12 can be suppressed. Light scattering caused by the unevenness. The arithmetic mean roughness Ra was measured in accordance with JIS B0601. Specifically, the scattered light from the surface is measured by the LASER | By analyzing the measured light amount, the arithmetic mean roughness is calculated from the optical waveguide obtained as described above, and can be used, for example, in the optical line for optical communication. The optical wiring is mixed with the existing electrical wiring. On the substrate of 100144601 22 201237480, a so-called "optical hybrid substrate" can be constructed. In such an opto-electric hybrid board, for example, an optical signal transmitted by a light wiring (core portion of an optical waveguide) is converted into an electrical signal by an optical device, and is transmitted to an electric wiring. Thereby, in the part of the optical wiring, it is possible to perform higher-speed and large-capacity information transmission than the conventional electric wiring. Therefore, by applying the opto-electric hybrid board in a bus bar or the like between a computing device such as a CPU or an LSI and a memory device such as a RAM, the performance of the entire system can be improved, and electromagnetic noise can be suppressed. Further, such an opto-electric hybrid board can be mounted on an electronic device such as a mobile phone, a game machine, a personal computer, a television, or a home server that transmits large-capacity data at high speed. (Embodiment) Hereinafter, the present invention will be described in more detail based on examples, but the present invention is not limited thereto. (Example 1) 1. Preparation of nuclear film <Synthesis of hexylpentene (HxNB)/diphenylfluorenyltoluene methoxy decane (diPhNB) copolymer> HxNB (CAS No. 22094) -83-3) (9.63g, 0.054 mole), diPhNB (CAS No. 376634-34-3) (40.37g, 0.126 mole), 1-hexene (4.54g, 0.054 mole) and 曱Benzene (I50g) was placed in a 500 mL volumetric flask in a dry box and mixed, and heated to 80 in an oil bath. (:, 100144601 23 201237480 - while stirring to make a solution. In this solution, pdl446 (1 Q4xi〇_2g, 7.20x10 mol) and 肆(pentafluorophenyl)boronic acid n,n-dimethylanilinium (DANFABA) (2.30xl (r2g, 2 88χ1〇.5 moule), respectively, added according to the concentrated dichloromethane solution (G.lmL). The added mixture was magnetically sampled under 8GC. Mix for 2 hours. Thereafter, the reaction mixture (small solution) is transferred to a larger beaker towel, and the sterol which is a poor solvent is dropped on the towel, and the fibrous solid white fraction H-collected solid portion is generated. The product was vacuum dried in a 60 C oven to give a product of a dry mass of 19 and a light yield of 38 〇.. by gel permeation chromatography (Gp^THF solvent, polystyrene)
乙烯換算）測疋生成物之分子量，結果質量平均分子量 (Mw)=118,000及數量平均分子量(Mn)=6〇，_。以iH NMR 測定生成物，鑑定為HxNB/diPhNB系共聚物。藉稜鏡偶合 法測定該共聚物之折射率，結果係波長633nm下，TE模式 為 1.5695，TM 模式為 1.5681。 <核清漆之調製> 於黃光下，將上述HxNB/diPhNB系共聚物溶解於茱中而 調製l〇wt%共聚物溶液(30g)。另外再於i〇〇mL容量玻璃瓶 中’置入HxNB(42.03g、0.24莫耳)及雙_降稻烯曱氧基二曱 基矽烧(SiX ’ CAS 編號第 376609-87-9 號)(7.97g、0.026 莫 耳），再加入2種抗氧化劑[Ciba公司製irganoxi〇76(0.5g)及 Irgafosl68(0.125g)]而得到單體抗氧化劑溶液。於上述共聚 物溶液30.Og中’加入上述單體抗氧化劑溶液3.〇g與 100144601 24 201237480The molecular weight of the product was measured by ethylene conversion, and as a result, the mass average molecular weight (Mw) = 118,000 and the number average molecular weight (Mn) = 6 Å, _. The product was measured by iH NMR and identified as a HxNB/diPhNB copolymer. The refractive index of the copolymer was measured by a ruthenium coupling method. As a result, the TE mode was 1.5695 and the TM mode was 1.5681 at a wavelength of 633 nm. <Preparation of nuclear varnish> The above HxNB/diPhNB-based copolymer was dissolved in a crucible under a yellow light to prepare a 10 wt% copolymer solution (30 g). In addition, HxNB (42.03g, 0.24 moles) and double-norbornene oxydithiocarbazone (SiX 'CAS No. 376609-87-9) were placed in the i〇〇mL volumetric flask. (7.97 g, 0.026 mol), and two kinds of antioxidants (irganoxi〇 76 (0.5 g) and Irgafosl 68 (0.125 g) manufactured by Ciba Co., Ltd.) were added to obtain a monomer antioxidant solution. Adding the above monomer antioxidant solution to the above copolymer solution 30.Og. 3.〇g and 100144601 24 201237480
Pd(PCy3)2(〇Ac)2(Pd785)(4.95xl(T4g、6.29χ10_7 莫耳、二氯 曱烧0_lmL中）與吸收極大波長220nm之第1光氧產生劑 [RHODORSIL(註冊商標)PHOTOINITIATOR 2074(CAS 編號 第 178233-72-2 號)(2.55xl〇-3g、2.51xlO·6 莫耳、二氯甲烷 O.lmL·中）]並使其均勻溶解後，藉細孔徑〇 2μιη之過渡器進 行過濾而調製成核清漆。 <核形成用薄膜之製作> 於塗佈機之料筒中填充核清漆200g後，於藉由棒塗器塗 敷了 Ιμιη之鐵氟龍(註冊商標)樹脂的pet薄膜(厚ΐ〇〇μιη) 的支撐基材上，藉由可控制吐出之喷嘴塗佈核清漆，於支撐 基材上形成厚150μπι的均勻液狀核塗膜。其後，將該塗膜 與PET薄膜一起置入乾燥機並依45°C加熱20分鐘，使菜蒸 發而得到厚40μιη的乾燥塗膜。 <核薄膜之圖案化> 接著，對該核形成用薄膜，經由具有開口部之遮罩照射紫 外線’形成所需之圖案，得到核薄膜。 2.包覆薄膜之製作 〈癸基降稻烯(DeNB)/曱基環氧丙基醚降稍烯(AGENB)系共 聚物之合成> 將 DeNB(CAS 編號第 22094-85-5 號)(16.4g、0.07 莫耳）、 AGENB(CAS 編號第 3188-75-8 號)(5.41g、〇.〇3 莫耳)及甲笨 (58.0g) ’置入乾燥箱内之500mL容量之血清瓶中並混合， 100144601 25 201237480 再於油浴中一邊加熱至80°C、一邊攪拌而作成溶液。於此 溶液中，添加(ηδ-甲苯)Ni(C6F5)2(0.69g、0.0014莫耳）之甲苯 溶液(5g)。將添加後之混合物，藉磁性攪拌子於室溫下擾拌 4小時。於該混合物中，加入曱苯(87.0g)並激烈攪拌。其後， 將反應混合物（甲苯溶液)移至更大的燒杯中，於其中滴下屬 於貧溶媒的曱醇（1L)時，發生纖維狀之白色固形份的沉澱。 過濾收集固形份並於60°C烘爐内使其真空乾燥，結果得到 乾燥質量17.00g(產率87%)的生成物。藉GPC(THF溶媒， 聚苯乙烯換算）測定生成物之分子量，結果Mw=75,000及Pd(PCy3)2(〇Ac)2(Pd785)(4.95xl (T4g, 6.29χ10_7 Moore, chlorinated in 0-lmL) and the first photo-oxygen generator that absorbs the maximum wavelength of 220nm [RHODORSIL (registered trademark) PHOTOINITIATOR 2074 (CAS No. 178233-72-2) (2.55xl〇-3g, 2.51xlO·6 mol, dichloromethane O.lmL·中)] and after it is uniformly dissolved, the transition by pore diameter 〇2μιη The nucleating varnish is prepared by filtration. <Production of a film for forming a core> After filling a cylinder of a coater with 200 g of a varnish, a Teflon (registered trademark) of Ιμιη is applied by a bar coater. On the support substrate of the pet film (thickness) of the resin, a core varnish was applied by a nozzle capable of controlling discharge, and a uniform liquid core coating film having a thickness of 150 μm was formed on the support substrate. The coating film was placed in a dryer together with a PET film, and heated at 45 ° C for 20 minutes to evaporate the dish to obtain a dried coating film having a thickness of 40 μm. <Pulping of nuclear film> Next, the film for forming a core was passed through The mask having the opening portion irradiates the ultraviolet ray to form a desired pattern to obtain a nuclear film. <Synthesis of decyl-based decene (DeNB)/decyl epoxypropyl ether AGENB copolymer> DeNB (CAS No. 22094-85-5) (16.4g, 0.07 Mo Ear), AGENB (CAS No. 3188-75-8) (5.41g, 〇.〇3 Moer) and A Stupid (58.0g) 'Placed in a 500mL capacity serum bottle in a dry box and mixed, 100144601 25 201237480 A solution was prepared by heating to 80 ° C while stirring in an oil bath. To this solution, (ηδ-toluene) Ni(C6F5)2 (0.69 g, 0.0014 mol) toluene solution (5 g) was added. The added mixture was stirred by a magnetic stir bar at room temperature for 4 hours. To the mixture, toluene (87.0 g) was added and stirred vigorously. Thereafter, the reaction mixture (toluene solution) was moved to a larger portion. In the beaker, when a decyl alcohol (1 L) which is a poor solvent was dropped, a precipitate of a fibrous white solid fraction occurred. The solid fraction was collected by filtration and vacuum dried in an oven at 60 ° C to obtain a dry mass of 17.00. a product of g (yield: 87%). The molecular weight of the product was measured by GPC (THF solvent, polystyrene conversion), and the result was Mw = 75,000 and
Mn=30,000。以1H-NMR測定生成物，鑑定為DeNB/AGENB 系共聚物。藉稜鏡偶合法測定該共聚物之折射率，結果係波 長633nm下’ TE模式為1.5153 ’ TM模式為1.5151。 <包覆清漆之調製> 於黃光下，將上述共聚物10g溶解於脫水曱苯中而調製 20wt%共聚物溶液(50g)。於此溶液中，加入2種抗氧化劑 [Ciba 公司製 Irganoxl076(0.01g)及 Irgafosl68(0.0025g)]與吸 收極大波長335nm之第2光氧產生劑（東洋油墨製造公司製 TAG-382 ’ 0.2g)並使其均勻溶解後，藉細孔徑〇.2μιη之過濾 器進行過濾而調製成包覆清漆。 <包覆薄膜之製作〉 於塗佈機之料筒中填充包覆清漆200g後，於聚醯亞胺(ΡΙ) 薄膜(厚12.5μιη)的支撐基材上，藉由可控制吐出之喷嘴塗佈 100144601 26 201237480 包覆清漆’於支撐基材上形成厚60μιη的均勻液狀包覆塗 膜。其後，將該塗膜與Π薄膜一起置入乾燥機並依45。〇加 熱10分鐘’使溶劑蒸發而得到厚5μπι的包覆薄膜。 3.3層光導波路之製作 <第1包覆層積層步驟> 於積層基板(不銹鋼板)上，將固定第1包覆薄膜之ΡΙ薄 膜’經由保護片材予以貼合。接著’將第1包覆薄膜，依序 經由ΡΙ薄膜、保護片材及積層基板，吸黏固定於貼合裝置。 另一方面，對固定於ΡΕΊΓ薄膜上之核薄膜施行電暈處理後， 經由PET薄膜吸黏固定於貼合裝置。其後，施加自動輥， 使第1包覆薄膜與核薄膜被假貼合。又，移除貼合裝置後， 左由PET薄膜將保護片材載放於核薄膜上，藉層合器使第1 包覆薄臈與核薄膜熱壓黏’得到第1包覆薄膜積層體。熱壓 条件係认為於真空條件下、14〇。〇、〇 。 <冷卻步驟> 於上述熱壓黏後 核薄膜及第1包覆 <基材去除步驟> ’使用層合器之空冷裝置，使PET薄膜、 〉專膜的表面溫度充分降低至室溫。 冷卻步驟後，於>Mn = 30,000. The product was measured by 1H-NMR and identified as a DeNB/AGENB copolymer. The refractive index of the copolymer was determined by the law of 稜鏡, and as a result, the TE mode was 1.5153 ′ in the wavelength of 633 nm, and the mode was 1.5151. <Preparation of coated varnish> Under a yellow light, 10 g of the above copolymer was dissolved in dehydrated benzene to prepare a 20 wt% copolymer solution (50 g). To this solution, two kinds of antioxidants (Irganoxl 076 (0.01 g) and Irgafosl 68 (0.0025 g) manufactured by Ciba Co., Ltd.) and a second photo-oxygen generator (absorbed by Toyo Ink Co., Ltd. TAG-382 '0.2 g) having a maximum wavelength of 335 nm were added. After uniformly dissolving it, it was filtered through a filter having a pore diameter of 22 μm to prepare a coating varnish. <Production of coated film> After filling the coating varnish with 200 g of the coating varnish, it was coated on a support substrate of a polyimide film (thickness 12.5 μm) by a nozzle capable of controlling discharge Cloth 100144601 26 201237480 The coated varnish 'forms a uniform liquid coating film having a thickness of 60 μm on the support substrate. Thereafter, the coating film was placed in a dryer together with a ruthenium film and was subjected to 45. The crucible was heated for 10 minutes to evaporate the solvent to obtain a coated film having a thickness of 5 μm. [Production of 3.3-layer optical waveguide] <First cladding layer lamination step> The tantalum film of the first cladding film is fixed to the laminated substrate (stainless steel plate) via a protective sheet. Then, the first coating film is sequentially adhered and fixed to the bonding apparatus via the ruthenium film, the protective sheet, and the laminated substrate. On the other hand, the core film fixed on the ruthenium film is subjected to corona treatment, and then adhered to the bonding device via a PET film. Thereafter, an automatic roller was applied to cause the first coating film and the core film to be falsely bonded. After the bonding device is removed, the protective film is placed on the nuclear film by the PET film on the left side, and the first coated thin film and the nuclear film are thermally pressed by the laminate to obtain the first cladding film layered body. . The hot pressing conditions are considered to be 14 Torr under vacuum conditions. 〇, 〇. <Cooling Step> After the above-mentioned hot-pressed core film and the first coating <substrate removal step> 'Using an air cooler of a laminator, the surface temperature of the PET film and the film are sufficiently lowered to the chamber temperature. After the cooling step, in >
Mu 、又撐核薄膜之PET薄膜上貼附高黏著 的膠帶’一邊剝離 離 办t、一邊將PET薄膜一起由核薄膜 弟2包覆層積層步驟> 100144601 27 201237480 將第2包覆薄臈，經由pj薄膜吸黏固定於貼合裝置。另 一方面，對剝離了 PET薄膜之核薄膜施行電暈處理後，依 序經由第1包覆薄膜、Π薄膜、保護片材及積層基板，吸 黏固定於貼合裝置。其後，施加自動輥，使第2包覆薄膜與 核薄膜被假貼合。又，經由PI薄膜，將保護片材載放於第 2包覆薄膜上，藉層合器使第2包覆薄膜與核薄膜熱壓黏。 熱壓黏條件係设為於真空條件下、、〇.3MPa、210s。 最後，將所製作之3層光導波路，藉磁鐵固定於支撐基材 (不銹鋼板)上並投入至烘爐中，依丨⑼它進行硬化2小時。 4.評價 <光傳送損失> 關於所得之3層解波狀光魏損失，_下述回截法 進行測定：使由f射二極體所發生之光，通過錢並由核部 之端輸入’測定來自另一端的輸出，將核部長度切斷為數 階段的長度’針對各長度敎緣出。各長度之核部中的總 傳送光損失’係由下式所示。 總傳送光損失(dB)=~_ i〇i〇g(pn/p〇) 上式中Pn係於P1、p2、pn之各長度核部的另一端所 測定的輸出’係在將光纖結合於㈣1前之光纖端部 的光源測定輸出。 其次’總光傳送損*之㈣的回歸直線，⑽孩所表示。 y=mx + b 100144601 s 28 201237480 上式中’ m表示光傳送損失，b表_ *)，X表示光導波路之長度，y表_不、、、。合損失(coupling =例1之光導波路的光傳送損失為QQ6dB/em/ =平測定該核薄膜的表面粗度結 面异術平均粗度為5〇nm。 尚PET薄膜之塗敷了鐵氟龍(註冊商標)樹脂之側的 面的算術平均粗度為30nm。 <密黏力> 將所得之3層光導波路切出為；18尺7127指定的試驗片形 狀。將該試驗片兩端部挾入至拉張試驗機(A&D股份有限公 司製拉張5式驗機Tensilon STM-T-50)的爽具部，一邊將交叉 頭速度保持為5cm/min、一邊作動試驗機，測定試驗片破斷 時的強度。 實施例1之光導波路之核薄膜•包覆薄膜間的密黏力為 500gf/cm2 以上。 另一方面，實施例1所製作之核形成用薄膜之核薄膜與 PET薄膜間的密黏力為5〇gf/Cm2。 <尺寸變化> 使用依125μιη等間隔間距排列了 24頻道的核，藉由可測 定至次微米長度之光學顯微鏡，計測由頻道1之核中心起、 至頻道24之核中心為止的距離，其結果，相對於遮罩設計 值，可將尺寸變化抑制為0土0.2%。 100144601 29 201237480 (實施例2) 除了將第1包覆層積層步驟設為如下以外，其餘與實施例 1相同。 <第1包覆層積層步驟〉 將第1包覆薄媒’依序經由PI薄臈、保護片材及積層基 板’吸黏固定於貼合裝置。 另一方面，對核薄膜施加電暈處理後，經由PET薄膜吸 黏固定於貼合裝置。其後，施加自_，使第1包覆薄膜盥 核薄膜假貼合。 移除貼合裝置後，經由PET薄膜將保護片材載放於核薄 膜上，藉層合器使第丨包覆薄膜與核薄膜熱壓黏，得到第\ 包覆薄膜積層體。熱壓黏條件係設為於真空條件下、140t、 0.3MPa、210s。 熱壓黏後，不使用層合器之空冷裝置，立即取出。 其後，於核薄膜之支撐基材(PET薄膜）貼附高黏著力的膠 帶，一邊剝離膠帶、一邊將支撐基材一起剝離。 <光傳送損失> 與上述同樣貫施之實施例2之光導波路的光傳送損失，為 0.10dB/cm。 另外，測定該核薄膜之表面粗度，結果表面算術平均粗户 為 50nm。 <密黏力> 100144601 30 201237480 與上述同樣實施之實施例2之光導波路的核•包覆間的 密黏力為250gf/cm2以上。 <尺寸變化> 與上述同樣實施之實施例2之光導波路的尺寸變化，係相 對於遮罩設計值為0±0.2%。 (實施例3) 除了將核形成用薄膜之製作設為如下以外，其餘與實施例 1同樣地進行。 <核形成用薄膜之製作> 於塗佈機之料筒中填充核清漆20〇g後，於PET薄膜(.厚 ΙΟΟμιη)的支撐基材上，藉由可控制吐出之喷嘴塗佈核清 漆，於支撐基材上形成厚150μιη的均勻液狀核塗膜。其後， 將該塗膜與PET薄膜一起置入乾燥機並依45°C加熱20分 鐘，使菜蒸發而得到厚40μιη的乾燥塗膜。 <光傳送損失> 與上述同樣實施之實施例3之光導波路的光傳送損失，為 0.:20dB/cm。 另外，測定該核薄膜之表面粗度，結果表面算術平均粗度 為 200nm 〇 <密黏力> 與上述同樣實施之實施例3之光導波路的核•包覆間的 密黏力為500gf/cm2以上。 100144601 31 201237480 另一方面，核形成用薄膜之核薄膜與PET _間之密黏 力為 150gf/cm2。 <尺寸變化> 與上述同樣實施之實施例3之光導波路的尺寸變化，係相 對於遮罩設計值為0±0.2〇/〇。 (比較例） 除了將3層光導波路之製作設為如下以外，其餘與實施例 1相同。 <第1包覆薄膜之積層> 將第1包覆薄膜吸黏固定於貼合裝£。另-方面，核薄膜 係在由核支縣材_後，施行電暈處理後，吸黏固定於貼 合裝置。最後，施加自動輥，使第i包覆薄膜與核薄膜被假 貼合。 <第2包覆薄膜之積層> 將第2包覆薄臈吸黏固定於貼合裝置。另一方面對積層 了第1包覆薄膜的核薄臈施行電暈處理後，吸黏固定於貼合 裝置。其後，施加自動輥，使第2包覆薄膜與核薄膜被假貼 合。其後，將保護片材載放於其兩面，藉層合器使其熱壓黏。 熱塵黏條件係β又為於真空條件下、i4〇°c、〇.3MPa、210s。 <光傳送損失> 與上述同樣實施之比較例之光導波路的光傳送損失，為 0.06dB/cm。 100144601 32Mu and the PET film attached to the nuclear film are attached with a highly adhesive tape. The process of laminating the PET film together with the core film 2 is carried out. 100144601 27 201237480 It is fixed to the bonding device by means of a pj film. On the other hand, the core film from which the PET film has been peeled off is subjected to corona treatment, and then adhered and fixed to the bonding apparatus via the first coating film, the ruthenium film, the protective sheet, and the laminated substrate in this order. Thereafter, an automatic roller was applied to cause the second coating film and the core film to be falsely bonded. Further, the protective sheet was placed on the second coating film via the PI film, and the second coating film and the core film were thermally pressure-bonded by a laminate. The hot press bonding conditions were set under vacuum conditions, 〇.3 MPa, 210 s. Finally, the prepared three-layer optical waveguide was fixed on a supporting substrate (stainless steel plate) by a magnet and put into an oven, and it was hardened for 2 hours in accordance with (9). 4. Evaluation <Optical Transmission Loss> With respect to the obtained three-layer dissociated optical loss, the following reticle method is used to measure the light generated by the f-diode, pass the money and be subjected to the nuclear portion. The end input 'measures the output from the other end, and cuts the length of the core into several stages of length' for each length. The total transmitted light loss in the core portion of each length is represented by the following formula. Total transmitted light loss (dB) = ~_ i〇i〇g(pn/p〇) In the above formula, Pn is the output measured at the other end of each of the lengths of P1, p2, and pn. The output of the light source at the end of the fiber before (4) 1 is measured. Secondly, the regression line of the total light transmission loss (4), (10) the child said. y=mx + b 100144601 s 28 201237480 In the above formula, 'm denotes optical transmission loss, b is _*), X denotes the length of the optical waveguide, and y is _not, ,,. Coupling = Coupling = the optical transmission loss of the optical waveguide of Example 1 is QQ6dB/em/ = the surface roughness of the nuclear film is measured to be 5〇nm. The PET film is coated with iron fluoride. The arithmetic mean roughness of the surface of the side of the dragon (registered trademark) resin was 30 nm. <Adhesive strength> The obtained three-layer optical waveguide was cut out into a test piece shape designated by 18 feet 7127. The end part was inserted into the cooling part of the tensile tester (Tensilon STM-T-50, A&D Co., Ltd.), and the crosshead speed was kept at 5 cm/min while the test machine was operated. The strength at the time of breaking the test piece was measured. The adhesive force between the core film and the cover film of the optical waveguide of Example 1 was 500 gf/cm 2 or more. On the other hand, the core of the film for nuclear formation produced in Example 1 was used. The adhesion between the film and the PET film is 5 〇gf/cm 2 . <Dimensional change> The nucleus of 24 channels is arranged at intervals of 125 μm, and the channel is measured by an optical microscope capable of measuring the length to the submicron. The distance from the center of the core to the center of the core of channel 24, the result, For the mask design value, the dimensional change can be suppressed to 0.2% of 0. 100144601 29 201237480 (Example 2) The same procedure as in Example 1 is carried out except that the first cladding layer stacking step is as follows. Coating Layer Lamination Step> The first coating thin medium is sequentially adhered and fixed to the bonding apparatus via the PI thin layer, the protective sheet, and the laminated substrate. On the other hand, after the corona treatment is applied to the nuclear thin film, The PET film is adhered and fixed to the bonding device, and then applied to the first coated film, and the first coated film is laminated. After the bonding device is removed, the protective sheet is placed on the nuclear film via the PET film. The first coating film and the nuclear film are heat-bonded by a laminator to obtain a first cladding film. The hot pressing conditions are set under vacuum conditions, 140t, 0.3MPa, 210s. The air-cooling device without the laminator is taken out immediately. After that, a high-adhesive tape is attached to the support substrate (PET film) of the core film, and the support substrate is peeled off while peeling off the tape. Transmission loss > Light of Embodiment 2 as described above The light transmission loss of the waveguide was 0.10 dB/cm. Further, the surface roughness of the core film was measured, and as a result, the surface arithmetic average was 50 nm. <Adhesive strength> 100144601 30 201237480 Example similar to the above The adhesion between the core and the cladding of the optical waveguide of 2 is 250 gf/cm 2 or more. <Dimensional change> The dimensional change of the optical waveguide of the second embodiment which is similarly implemented as described above is 0 with respect to the mask design value. ±0.2%. (Example 3) The same procedure as in Example 1 was carried out except that the production of the film for forming a core was as follows. <Preparation of a film for forming a core> After filling a cylinder of a coater with 20 〇g of a core varnish, a nuclear varnish was coated on a support substrate of a PET film (thickness ΙΟΟμηη) by a nozzle capable of controlling discharge A uniform liquid core coating film having a thickness of 150 μm was formed on the support substrate. Thereafter, the coating film was placed in a dryer together with a PET film, and heated at 45 ° C for 20 minutes to evaporate the dish to obtain a dried coating film having a thickness of 40 μm. <Optical transmission loss> The optical transmission loss of the optical waveguide of Example 3 similarly applied as described above was 0: 20 dB/cm. Further, the surface roughness of the core film was measured, and as a result, the arithmetic mean roughness of the surface was 200 nm. 密 < dense adhesion> The adhesion between the core and the cladding of the optical waveguide of Example 3 similarly applied as described above was 500 gf. /cm2 or more. 100144601 31 201237480 On the other hand, the adhesion between the nuclear film of the film for nuclear formation and PET _ is 150 gf/cm2. <Dimensional Change> The dimensional change of the optical waveguide of Example 3, which was carried out in the same manner as described above, was 0 ± 0.2 〇 / 相 with respect to the mask design value. (Comparative Example) The same procedure as in the first embodiment was carried out except that the production of the three-layer optical waveguide was as follows. <Lamination of First Coating Film> The first coating film is adhered and fixed to the bonding material. On the other hand, the nuclear film is adhered to the bonding device after being subjected to corona treatment after being subjected to corona treatment. Finally, an automatic roller is applied to cause the i-th cladding film and the core film to be falsely bonded. <Lamination of second coating film> The second coating sheet is adhered and fixed to the bonding apparatus. On the other hand, the core thin layer in which the first coating film was laminated was subjected to corona treatment, and then adhered and fixed to the bonding apparatus. Thereafter, an automatic roller was applied to cause the second coating film and the core film to be falsely bonded. Thereafter, the protective sheet was placed on both sides thereof, and the laminate was thermally pressed. The hot dust adhesion condition is β under vacuum conditions, i4〇°c, 〇.3MPa, 210s. <Optical transmission loss> The optical transmission loss of the optical waveguide of the comparative example similarly described above was 0.06 dB/cm. 100144601 32
S 201237480 另外，測定該核薄膜之表面粗度，結果表面算術平均粗度 為 50nm。 <密黏力> 與上述同樣實施之比較例之光導波路的核•包覆間的密 黏力為500gf/cm2以上。 <尺寸變化> 與上述同樣實施之比較例之光導波路的尺寸變化，係相對 於遮罩設計值為〇±1.〇%。 將實施例與比較例之結果整合於表丨。可知由各實施例所 示之本發明得到的光導波路，係相較於比較例，其尺寸變化 較少。再者，藉由進行熟化，可提升核•包覆間的密黏力。 又，藉由依脫模處理對基材表面進行平滑化，則可減低光傳 送損失的惡化。 [表1] 實施例1 實施例2 實施例3 比較例 光傳送損失 (dB/cm) 0.06 0.10 0.20 0.06 表面算術平均粗度 (nm) 50 50 200 50 密黏力（gf/cm2) >500 >250 >500 >500 尺寸變化（％) 0+0. 2 0+0.2 ~~―---1 0+0. 2 0±1. 0 (產業上之可利用性) 根據本發明’在積層光導波路之各層時，係依將各層固定 於支撐基材上的狀態進行積層。因此，限制了各層的自由伸 100144601 33 201237480 縮，可抑制光導波路製造步驟中所發生的尺寸變化。 【圖式簡單說明】 圖1為表示本發明之光導波路的橫剖面圖。 圖2為說明本發明之光導波路之製造方法之一例的圖。 圖3為說明本發明之光導波路之製造方法之一例的圖。 圖4為說明本發明之光導波路之製造方法之一例的圖。 圖5為說明本發明之光導波路之製造方法之一例的圖。 圖6為說明本發明之光導波路之製造方法之一例的圖。 圖7為說明本發明之光導波路之製造方法之一例的圖。 圖8為說明本發明之光導波路之製造方法之一例的圖。 【主要元件符號說明】 1 光導波路(光導波路構造體） 2 核形成用薄膜 5 喷嘴 6 遮罩 8 碎橡膠· 9 第1包覆薄膜積層體 11 第1包覆層（第1包覆薄膜） 12 核心層（核薄膜） 13 第2包覆層（第2包覆薄膜） 21 核薄膜形成用材料(核清漆） 31 包覆薄膜形成用材料（包覆清漆） 100144601 34 201237480 41 核薄膜支撐基材 42 包覆薄膜支撐基材 61 絡 71 積層基板 72 保護片材 73 吸黏板 74 自動輥 121 核部 122 包覆部 100144601 35S 201237480 Further, the surface roughness of the core film was measured, and as a result, the arithmetic mean roughness of the surface was 50 nm. <Flexible force> The adhesion between the core and the cladding of the optical waveguide of the comparative example similarly described above was 500 gf/cm2 or more. <Dimensional Change> The dimensional change of the optical waveguide of the comparative example similarly described above was 〇±1.〇% with respect to the mask design value. The results of the examples and comparative examples are integrated into the table. It is understood that the optical waveguide obtained by the present invention shown in each of the examples has a small dimensional change as compared with the comparative example. Furthermore, by curing, the adhesion between the core and the cladding can be improved. Further, by smoothing the surface of the substrate by the mold release treatment, the deterioration of the light transmission loss can be reduced. [Table 1] Example 1 Example 2 Example 3 Comparative Example Optical Transmission Loss (dB/cm) 0.06 0.10 0.20 0.06 Surface arithmetic mean roughness (nm) 50 50 200 50 dense adhesion (gf/cm2) >500 >250 >500 >500 Size change (%) 0+0. 2 0+0.2 ~~―---1 0+0. 2 0±1. 0 (industrial availability) According to the present invention 'When the layers of the optical waveguide are laminated, the layers are laminated in a state in which the layers are fixed to the support substrate. Therefore, the free extension of each layer is limited, and the dimensional change occurring in the optical waveguide manufacturing step can be suppressed. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a cross-sectional view showing an optical waveguide of the present invention. Fig. 2 is a view for explaining an example of a method of manufacturing an optical waveguide of the present invention. Fig. 3 is a view for explaining an example of a method of manufacturing an optical waveguide of the present invention. Fig. 4 is a view for explaining an example of a method of manufacturing an optical waveguide of the present invention. Fig. 5 is a view for explaining an example of a method of manufacturing an optical waveguide of the present invention. Fig. 6 is a view for explaining an example of a method of manufacturing an optical waveguide of the present invention. Fig. 7 is a view for explaining an example of a method of manufacturing an optical waveguide of the present invention. Fig. 8 is a view for explaining an example of a method of manufacturing an optical waveguide of the present invention. [Explanation of main component symbols] 1 Optical waveguide (optical waveguide structure) 2 Film for nuclear formation 5 Nozzle 6 Mask 8 Broken rubber · 9 First coated thin film layered body 11 First cladding layer (first cladding film) 12 Core layer (nuclear film) 13 Second coating layer (second coating film) 21 Nuclear film forming material (nuclear varnish) 31 Coating film forming material (coated varnish) 100144601 34 201237480 41 Nuclear film supporting group Material 42 coated film supporting substrate 61 network 71 laminated substrate 72 protective sheet 73 adhesive sheet 74 automatic roller 121 core portion 122 cladding portion 100144601 35