TW201234576A - Organic thin film transistor and method for making the same - Google Patents

Organic thin film transistor and method for making the same Download PDF

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TW201234576A
TW201234576A TW100131051A TW100131051A TW201234576A TW 201234576 A TW201234576 A TW 201234576A TW 100131051 A TW100131051 A TW 100131051A TW 100131051 A TW100131051 A TW 100131051A TW 201234576 A TW201234576 A TW 201234576A
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Ki-Beom Kim
Yoshinobu Ono
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Sumitomo Chemical Co
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Abstract

This invention provides an organic thin film transistor having a charge implant layer which will not be easily deteriorated functionally and also will not be easily oxidized even in an atmospheri environment. In an organic thin film transistor (10) having a gate electrode (20A), a first source/drain electrode (60A), a second source/drain electrode (60B), an organic semiconductor layer (40) disposed in between the first source/drain electrode and the second source/drain electrode and the gate electrode (20A), and a charge implant layer (50) in between the first source/drain electrode and the second source/drain electrode and the organic semiconductor layer to come in contact with the first source/drain electrode and the second source/drain electrode, the charge implant layer contains an ionic polymer having a charge implant characteristic.

Description

201234576 六、發明說明： 【發明所屬之技術領域] 本發明係關於一種有機薄膜電晶體及其製造方法、具 備有機溥膜電晶體之有機薄膜電晶體基板、以及具備有機 薄膜電晶體基板之顯示裝置。 【先前技術】 薄膜電晶體大致上可以分成為有機薄膜電晶體以及無 機半導體電晶體。有機薄膜電晶體係設置有機半導體層作 •為活性層，而無機薄膜電晶體係設置無機半導體層作為活 性層。這些2種類之薄膜電晶體係製作方法不同。 無λ:薄膜電晶體一般係在真空環境下形成活性層，因 此，在活性層之形成中需要有真空環境。 另一方面，有機薄膜電晶體係可藉由不需要真空環境 之塗佈法而形成活性層，活性層之形成不一定需要真空環 浼。例如有機薄膜電晶體係可藉由將活性層之材料溶解或 • 分散於任意適當之溶媒之塗佈液進行塗佈成膜，而簡便地 形成活性層。如果像這樣而採用塗佈法的話，則有機薄膜 電曰曰體之製造方法就不需要真空環境。此外，在有機薄膜 電晶體之製造方法中，藉由採用塗佈法，即可在廣泛範圍 中一次形成複數個電晶體。結果，可以降低製造成本。 關於具有此種製造步驟上之優點之有機薄膜電晶體，在 目前，進行用以提高其電氣特性之各種研究。已知例如具備 將具有長鏈烧基之C60富勒烯(fullerene)衍生物進行塗佈成 膜之η型有機半導體層之場效型有機薄膜電晶體(參考專利 323451 4 201234576 文獻1。）。此外，已知藉由在源極電極及汲極電極和活性 層之間，設置由氟化鋰(LiF)所構成之緩衝層，而提高電氣 特性之有機薄膜電晶體(參考非專利文獻1。）。 ’ [先前技術文獻] [專利文獻] 專利文獻1 :曰本特開2006-060169號公報 [非專利文獻] 非專利文獻 1 . Microelectronics Journal Volume 38, Issues 春 4-5,April-May 2007, Pages 632-636 【發明内容】 (發明所欲解決之課題） 使用於前述緩衝層之氟化鋰等係在大氣環境下，容易 和水分、氧發生反應而迅速地氧化。因此，緩衝層—旦氧 化’即降低有機薄膜電晶體之電氣特性。 為了防止此種大氣中之緩衝層之氧化，因此，在先前 • 技術中’在緩衝層之形成中及形成後，該緩衝層無曝露在 大氣中而製作有機薄膜電晶體。例如藉由在高真空度之環 兄下以蒸鐘法來形成由敦化經等而構成之緩衝層，並且， 在仍然維持該高真空度之環境下，在緩衝層上形成源極/ 及極電極，並配合需要而施行密封，來防止緩衝層曝露於 大氣。像這樣，在先前技術中，由於需要高真空度之環境， 因此’藉由塗佈法而成膜之步驟中，由於必須具備不必要 之真空幫浦、真空處理室等之大規模設備，或者是需要搬 入真空處理室之搬入步驟、由真空處理室搬出之搬出步 5 323451 201234576 驟、加塵步驟、減壓步驟等，因此，製造步驟變得繁瑣而 增高製造成本。201234576 6. Technical Field of the Invention The present invention relates to an organic thin film transistor and a method for fabricating the same, an organic thin film transistor substrate having an organic germanium film transistor, and a display device including the organic thin film transistor substrate . [Prior Art] A thin film transistor can be roughly classified into an organic thin film transistor and an inorganic semiconductor transistor. The organic thin film electro-crystal system is provided with an organic semiconductor layer as an active layer, and the inorganic thin film electro-crystalline system is provided with an inorganic semiconductor layer as an active layer. These two types of thin film electrocrystallization systems are produced in different ways. No λ: Thin film transistors generally form an active layer under a vacuum environment, and therefore, a vacuum environment is required in the formation of the active layer. On the other hand, the organic thin film electrocrystallization system can form an active layer by a coating method which does not require a vacuum environment, and the formation of the active layer does not necessarily require a vacuum ring. For example, the organic thin film electrocrystallization system can be easily formed into an active layer by coating a film of a material of the active layer or dispersing it in a coating liquid of any appropriate solvent. If the coating method is employed as described above, the manufacturing method of the organic thin film electrode body does not require a vacuum environment. Further, in the method of producing an organic thin film transistor, a plurality of transistors can be formed at a time in a wide range by using a coating method. As a result, the manufacturing cost can be reduced. Regarding the organic thin film transistor having the advantages of such a manufacturing step, various studies for improving the electrical characteristics thereof have been carried out at present. For example, a field effect type organic thin film transistor having an n-type organic semiconductor layer in which a C60 fullerene derivative having a long-chain alkyl group is coated is formed (refer to Patent No. 323451 4 201234576, Document 1). Further, an organic thin film transistor in which a buffer layer made of lithium fluoride (LiF) is provided between a source electrode and a drain electrode and an active layer to improve electrical characteristics is known (refer to Non-Patent Document 1). ). [Prior Art Document] [Patent Document] Patent Document 1: JP-A-2006-060169 [Non-Patent Document] Non-Patent Document 1. Microelectronics Journal Volume 38, Issues Spring 4-5, April-May 2007, Pages 632-636 [Problems to be Solved by the Invention] Lithium fluoride or the like used in the buffer layer is easily oxidized by reacting with moisture and oxygen in an air atmosphere. Therefore, the buffer layer oxidizes to lower the electrical characteristics of the organic thin film transistor. In order to prevent oxidation of the buffer layer in such an atmosphere, in the prior art, the buffer layer was formed in the atmosphere without forming it in the atmosphere and forming an organic thin film transistor. For example, a buffer layer composed of Dunhua or the like is formed by a steaming method under a high vacuum degree, and a source/pole is formed on the buffer layer while maintaining the high vacuum. The electrodes are sealed as needed to prevent the buffer layer from being exposed to the atmosphere. As described above, in the prior art, since a high vacuum environment is required, in the step of forming a film by a coating method, it is necessary to have a large-scale apparatus such as an unnecessary vacuum pump or a vacuum processing chamber, or It is a loading step that needs to be carried into the vacuum processing chamber, a carry-out step 5 323451 201234576, a dusting step, a depressurization step, and the like, which are carried out by the vacuum processing chamber. Therefore, the manufacturing steps become complicated and the manufacturing cost is increased.

本發明係有鑒於前述之課題而完成者，本發明之目的 係藉由具備使用即使是在常壓程度之環境下，也不容易氧 化且不谷易呈機此性惡化之材料之電荷注入層而提供電氣 特性呈良好之有機薄膜電晶體’並且，提供一種包含即使 是在常壓程度之環境下、也可以實施之電荷注入層之形成 步驟之有機薄膜電晶體之簡便之製造方法。 (用以解決課題之手段） 本發明人等係就離子性聚合物以及使用該離子性聚合 物=電子兀件而全心地進行研究之時，發現藉由使用不僅 電氣特性良好、即使是在常壓程度之環境下製作也不容易 氧且不易呈機能性惡化之離子性聚合物，即可解決前述 之課題’遂而完成本發明。 也就疋說，如依據本發明，則提供下列之⑴至[9]。 /[、:^。種有機薄膜電晶體，係具備：閘極電極、第1源極 |^電極 '第2源極/沒極電極、設置在前述第1源極/汲 半導玉及第2源極/汲極電極和前述閘極電極之間之有機 極#層、在前述第1源極/汲極電極及第.2源極/汲極電 第2則逑有機半導體層之間與前述第1源極/汲極電極及 碌極/汲極電極相接而配置之電荷注入層的有機薄膜 电晶體，甘山The present invention has been made in view of the above-described problems, and an object of the present invention is to provide a charge injection layer of a material which does not easily oxidize even if it is in an environment of a normal pressure and which is not deteriorated. Further, an organic thin film transistor having excellent electrical characteristics is provided, and a simple manufacturing method of an organic thin film transistor including a step of forming a charge injection layer which can be carried out even in an environment of a normal pressure is provided. (Means for Solving the Problem) The inventors of the present invention discovered that the ionic polymer and the ionic polymer = electronic component were fully studied, and it was found that not only the electrical characteristics were good but also the usual The present invention can be accomplished by producing an ionic polymer which is not easily oxygen-prone and which is less likely to deteriorate in functionality under the pressure level. In other words, according to the present invention, the following (1) to [9] are provided. /[,:^. The organic thin film transistor includes: a gate electrode, a first source, a second electrode, a second source/nopole electrode, and a first source/汲 semi-conductive jade and a second source/drain An organic pole # layer between the electrode and the gate electrode, and between the first source/drain electrode and the second source/telepole second organic semiconductor layer and the first source/ An organic thin film transistor of a charge injection layer in which a drain electrode and a drain/drain electrode are connected, Ganshan

Mu 異中，前述電荷注入層含有具備電荷注入特性之 性眾合物。 ^1]所記載之有機薄膜電晶體，導電型電荷注入層之 6 323451 201234576 導電型係η型，有機半導體層之導電型係n型。 [3] :如[2]所記載之有機薄膜電晶體，在前述有機半導體層 和前述閘極電極之間，具有與前述閘極電極相接而配置之 閘極絕緣層，前述閘極電極係由η型半導體基板所構成。 [4] : 一種有機薄膜電晶體基板，係具備[1]至[3]中任一項 所記載之有機薄膜電晶體者。 [5] : —種顯示裝置，係具備[4]所記載之有機薄膜電晶體基 板作為驅動基板者。 [6] · —種有機薄膜電晶體之製造方法，係分別形成閘極電 極、第1源極/没極電極、第2源極/沒極電極、設置在前 述第1源極/沒極電極及第2源極/没極電極和前述閘極電 極之間之有機半導體層、在前述第1源極/汲極電極及第2 源極/汲極電極和前述有機半導體層之間與前述第丨源極/ 及極電極及第2源極/汲極電極之電荷注入層相接的有機 薄臈電晶體之製造方法，其中，具備：將含有具備電荷注 鲁入特性之料絲合物之電荷注人層予㈣成之步驟。 如剛記載之有機薄膜電晶體之製造方法，在形成前 *兄下’藉由將含有離 而形成前述電荷注入 述電荷注入層之步驟中，在常壓之環境下 子性聚合物之塗佈液進行塗佈成膜， :如[7]所記載之有機薄膜雷異 益丨丨、*L 、:太_In the case of Mu, the charge injection layer contains a characteristic compound having a charge injection property. The organic thin film transistor described in ^1], the conductive charge injection layer 6 323451 201234576 conductive type is n type, and the conductive type of organic semiconductor layer is n type. [3] The organic thin film transistor according to [2], wherein a gate insulating layer is disposed between the organic semiconductor layer and the gate electrode and is in contact with the gate electrode, and the gate electrode is It is composed of an n-type semiconductor substrate. [4] The organic thin film transistor according to any one of [1] to [3], wherein the organic thin film transistor is provided. [5] A display device comprising the organic thin film transistor substrate described in [4] as a drive substrate. [6] A method for producing an organic thin film transistor, comprising: forming a gate electrode, a first source/bump electrode, a second source/bump electrode, and the first source/bottom electrode; And an organic semiconductor layer between the second source/dot electrode and the gate electrode, and between the first source/drain electrode and the second source/drain electrode and the organic semiconductor layer A method for producing an organic thin tantalum transistor in which a source electrode and a pole electrode and a charge injection layer of a second source/drain electrode are in contact with each other, comprising: a filament containing a charge-injecting property The charge injection layer is given to the steps of (4). A method for producing an organic thin film transistor as described in the prior art, in the step of forming a charge injection layer by forming a charge injection layer by forming a charge in a normal pressure environment Coating to form a film, as described in [7], the organic film isomerized, *L,: too _

，其中，前 項所°己载之有機薄膜電晶體之製造 層。 [8]： 布丄鄉独/汲極電極係在常壓之環 323451 7 201234576 方法其中，前述有機半導體層係在常壓之環境下，藉由 將塗佈液進行塗佈成膜而形成者。 [發明之效杲] 本發明之有機薄膜電晶體係具備良好之電荷注入特性，Among them, the manufacturing layer of the organic thin film transistor carried by the former item. [8]: Buju Township's sole/dip electrode is in the ring of atmospheric pressure 323451 7 201234576 Method wherein the organic semiconductor layer is formed by coating a coating liquid into a film under normal pressure. . [Effect of the Invention] The organic thin film electrocrystallization system of the present invention has good charge injection characteristics.

使用即使是在常壓程度之環境、甚至大氣環境下、也可以 維持良好之電荷$人特性之離子性聚合物，來作為電荷注 入層之材料。因此’本發明之有機薄膜電晶體即使是在常 壓程度之環境、甚至大氣環境下，也不容胃降低性能。 如依本發明之有機薄膜電晶體之製造方法，則 使用即使是在常肺度之環境、甚至大氣環境下也不容易 氧化之離子性聚合物作為電荷注人層之㈣。於是，可以 在：壓程度之環境、甚至大氣環境下，藉由塗佈法而實扩 電荷注入層之形成步驟，因此，可以更加簡便地實施: 薄膜電晶體之製造，能夠進一步地減低製造成本。 【實施方式】 Φ (發明之實施形態） 以下’參考圖式，並且，就本發明之實施形態" 說明。此外’各圖係不過是在可以理解發明之程度 : 地至示構成要素之形狀、大小及配置。本發明並不受 S己載所限定’各構成要素在不脫離本發明要旨之範圍 可適度地進行變更。此外，在使用以下說明之各圖中」、 相同之構成要素而附加相同符號表示，而有省略重複= 之情形。本發明之有機薄膜電晶體不一定是藉由圖^明 配置而進行製造或使料。此外，在以下之說明中，會= 323451 8 201234576 特別是將基板厚度方向之一邊稱為上面或上 方向之另—邊稱為下面或下方之情形。 方，並將厚度 <有機薄膜電晶體之構造> 有機薄膜電晶體係具備閘極電極、第 極、第2源極/汲極電極、設置在前述第1褲極/汲極電 極電極和前述閘極電極之間之有機半 及篥2源極/汲 及第2源極/沒極電極和前述有機半導體居層、在前述第！ 及第2源極/汲極電極相接而配置之電7、曰欠間與前述第1 膜電晶體係具有藉由調整施加於閘極極主入層。該有機薄 第1源極/汲極電極和第2源極/ 壓而控制在 之機能。 亟之間淹動之電流 本發明之有機薄膜電晶體之電荷注 電荷注入特性之離子性聚合物。 入層係包含具有 電荷注入層之導電型和有機半導體芦 相同。也就是說，如果電荷注 3之導電型最好是 八臂為η型，曰丨， _ 層最好是η型，並且，如果電荷、、主 、則有機半導體 導體層最好是ρ型。 了'入層為Ρ梨，則有機半 本說明書中之用語「源極/汲極 電極或汲極電極使用之1個#缸 °」系表示作為源極 用時，第U極/祕電極（第’ ^機軸電晶體之使 (第2電極）中之-者係作為源極電極 =2源極娜電極 為汲極電極使用。 用，而另一者係作 本說明之有機薄膜電晶體 性聚合物上具有特徵。因此， 係在構成電荷注入層之離子 首先就離子性聚合物而進行 323451 9 201234576 (離子性聚合物） 作為可以使用於本發明之離子性聚合物係列舉例如： 具有包含由下述式⑴所表示之基和下述式⑺所表示之基 而組成之群組+選出之丨種以上之基之構造單位之聚合 物。作為離子性聚合物之—形態係列舉：在全構造單位中 具有15莫耳％至100莫耳％之包含由化學式⑴所表示之基 和化學式（2)所表示之基所組成之群組中選出之丨種以上之 • 基之構造單位之聚合物。 - (QUovi'kz1、 (1) (在化學式（1)中，Q1係表示2價之有機基，γ1係表示_c〇2-、 -S03_、-S02-、-P〇32_或_Ras〇3-，M1係表示金屬陽離子或者 是可以具有取代基之銨陽離子，z1係表示F_、Cr、Br_、r、 OH·、RaS03·、RaC〇CT、CIO·、C102·、C103·、C104_、SCN·、 CN·、NO，、S042·、HSCV、P043_、HP042·、H2P〇4-、BF4- I 或PFf’nl係表示〇以上之整數，ai係表示i以上之整數， bl表示0以上之整數，但是，al及bl係使化學式（1)所表 示之基之電荷成為0之方式而選擇，Ra表示可具有取代基 之碳原子數1至30之烷基或者是可以具有取代基之碳原子 數6至50之芳基’在Q1、M1及Z1之各個具有複數個之 狀態下，複數個之Qi、Μι及ζι係分別可以相同，也可以 不同。） ''(Q2)n2-Y2(M2)a2(Z2)b2 (2) (在化學式(2)中’ Q2係表示2價之有機基，γ2表示陽碳離 10 323451 201234576 子（carbocation)、銨陽離子、膦陽離子或毓陽離子（sulf〇nyl cation)或埃鏽陽離子(i〇d〇nium cation)，Μ2 係表示 ρ-、ci·、 Βγ·、Γ、OH.、RbS03.、RbCOO_、CIO·、C102·、C1〇3-、α〇4-、 SCN·、CN·、NO,、S042·、HS04·、P〇43·、HP〇42·、H2p〇4-、As the material of the charge injection layer, an ionic polymer which can maintain a good charge and a human characteristic even in an environment of a normal pressure or even an atmosphere can be used. Therefore, the organic thin film transistor of the present invention does not allow the stomach to lower its performance even in an environment of a normal pressure or even an atmospheric environment. According to the method for producing an organic thin film transistor of the present invention, an ionic polymer which is not easily oxidized even in a normal lung environment or even an atmospheric environment is used as the charge injection layer (4). Therefore, the formation step of the charge injection layer can be realized by the coating method in an environment of a pressure degree or even an atmosphere, and therefore, it can be more easily carried out: the manufacture of the thin film transistor can further reduce the manufacturing cost. . [Embodiment] Φ (Embodiment of the Invention) The following is a description of the embodiment of the present invention with reference to the drawings. In addition, the drawings are merely illustrative of the shape, size, and arrangement of the constituent elements. The present invention is not limited to the scope of the invention, and various constituent elements may be appropriately modified without departing from the scope of the invention. In the drawings, the same components are denoted by the same reference numerals, and the repetition is repeated. The organic thin film transistor of the present invention is not necessarily manufactured or fabricated by the arrangement of the drawings. Further, in the following description, it will be 323451 8 201234576, in particular, the case where one side of the substrate thickness direction is referred to as the upper side or the upper side is referred to as the lower side or the lower side. Square, and thickness <structure of organic thin film transistor> The organic thin film electromorphic system includes a gate electrode, a second electrode, a second source/drain electrode, and the first leg/drain electrode electrode and The organic half and the 源2 source/汲 and the second source/bold electrode and the organic semiconductor layer between the gate electrodes are in the foregoing! The electric circuit 7 disposed between the second source and the drain electrode and the first photo-electrode system are applied to the gate-electrode main layer by adjustment. The organic thin first source/drain electrode and the second source/pressure are controlled to function. The current flowing between the crucibles The charge of the organic thin film transistor of the present invention is an ionic polymer having a charge injection characteristic. The in-layer system contains the same conductivity type as the organic semiconductor reed having a charge injection layer. That is, if the conductivity type of the charge 3 is preferably an η type of the eight arms, the 曰丨, _ layer is preferably of the n type, and if the charge, the main, the organic semiconductor conductor layer is preferably p type. 'Into the layer is avocado, the phrase in the manual half of the instructions, "One source for the source/drain electrode or the electrode of the drain ##°°" means the U-pole/secret electrode when used as a source ( The first of the '^ axis crystals (the second electrode) is used as the source electrode = 2 the source electrode is used as the drain electrode. The other is used as the organic film of the present invention. The polymer is characterized by the fact that the ions constituting the charge injection layer are first ionic polymer 323451 9 201234576 (ionic polymer) as an ionic polymer series which can be used in the present invention, for example: a group consisting of a group represented by the following formula (1) and a group represented by the following formula (7): a polymer of a structural unit selected from the group of the above-mentioned formula. The ionic polymer is a series of forms: The structural unit of the base selected from the group consisting of the base represented by the chemical formula (1) and the group represented by the chemical formula (2) in the total structural unit: 15 mol% to 100 mol% Polymer. - (QUovi'kz1, (1 (In the chemical formula (1), Q1 represents a divalent organic group, γ1 represents _c〇2-, -S03_, -S02-, -P〇32_ or _Ras〇3-, and M1 represents a metal The cation is an ammonium cation which may have a substituent, and z1 represents F_, Cr, Br_, r, OH·, RaS03·, RaC〇CT, CIO·, C102·, C103·, C104_, SCN·, CN·, NO , S042·, HSCV, P043_, HP042·, H2P〇4-, BF4-I or PFf'nl represents an integer above 〇, ai represents an integer greater than i, and bl represents an integer greater than 0, but al and Bl is selected such that the charge of the group represented by the chemical formula (1) becomes 0, and Ra represents an alkyl group having 1 to 30 carbon atoms which may have a substituent or a carbon number of 6 to 50 which may have a substituent. In the state in which each of Q1, M1, and Z1 has a plurality of aryl groups, the plurality of Qi, Μι, and ζι systems may be the same or different.) ''(Q2)n2-Y2(M2)a2(Z2 ) b2 (2) (In the chemical formula (2), 'Q2 represents a divalent organic group, and γ2 represents a cation of 10 323451 201234576 carbocation, ammonium cation, phosphine cation or sulfonium cation (sulf〇nyl c Id) or rust cations, Μ2 indicates ρ-, ci·, Βγ·, Γ, OH., RbS03., RbCOO_, CIO·, C102·, C1〇3-, α〇 4-, SCN·, CN·, NO, S042·, HS04·, P〇43·, HP〇42·, H2p〇4-,

BF’或PFf，z2係表示金屬陽離子或者是可具有取代基之 銨陽離子，n2係表示〇以上之整數，a2係表示i以上之整 數，b2係表示〇以上之整數。但是，^及b2係使化學式 (2)所表示之基之電荷成為〇之方式而選擇eRb係表示可以 具有取代基之碳原子數丨至30之烷基或者是可以具有取代 基之碳原子數6至50之芳基，在（^、…及^各個具 有複數個之狀態下，具有複數個之Q2、M2&z2係分別可 以相同，也可以不同。） 作為本發明巾使狀離子絲合物之—形態係還列舉 具有下34細所衫之基之聚合物。在離子絲合物具^ 化學式⑶所㈣之基之狀訂，化學式(3)所表*之基係； 以包含在離子性聚合物之構造單位中，也可以包含在料 式⑴所麵之基及化學式(2)所表戟基而組成 之基之構料帅同之構造單位 =:，也可以包含在木同之其他之構造單位内。此外 「形態係列舉在全構造單位中具有 <⑵所;其耳％之包含化學式⑴所表示之基、化學 V' 化學式(3)所麵之基之中之至少-種 之構造單位之聚合物。 (Q3) n3 γ2 (3) 323451 11 201234576 (在化學式（3)中，Q3係表示2價之有機基，Y3係表示藉由 —CN或化學式（4)至化學式（12)中之任何一種所表示之基， η3係表示0以上之整數。 -0—(R，0)a3 — R，， (4) —R'"-~p〇 … X (5) -S-(R，S)a4—R” (6) -C( = Ο) - (R’ - C( = 0))a4 — R’’ (7)BF' or PFf, z2 represents a metal cation or an ammonium cation which may have a substituent, n2 represents an integer of 〇 or more, a2 represents an integer of i or more, and b2 represents an integer of 〇 or more. However, ^ and b2 are selected such that the charge of the group represented by the chemical formula (2) is a ruthenium and the eRb system represents an alkyl group having a carbon atom number of 丨 to 30 which may have a substituent or a carbon atom which may have a substituent. The aryl group of 6 to 50 may have the same number of Q2, M2 & z2 systems in a plurality of (^, ..., and ^), and may be different as the ionic group of the present invention. The material-form system also lists the polymer having the base of the lower 34 shirt. The ionic filament compound has the basis of the formula (4), and the base of the formula (3) is included; in the structural unit of the ionic polymer, it may also be included in the formula (1). The structural unit of the composition of the base and the base of the chemical formula (2) is: or, it can also be included in other structural units of the same wood. Further, the "morphological series" has a structure unit of at least one of the bases of the chemical formula (1) and the base of the chemical V' chemical formula (3) in the entire structural unit; (Q3) n3 γ2 (3) 323451 11 201234576 (In the chemical formula (3), Q3 represents a divalent organic group, and Y3 represents any of -CN or formula (4) to formula (12) A represented base, η3 represents an integer greater than 0. -0—(R,0)a3 — R,, (4) —R′"-~p〇... X (5) -S-(R, S)a4—R” (6) -C( = Ο) - (R' - C( = 0))a4 — R'' (7)

—C(=S)—(R，—C(=S))a4-R，，(8) -N{(R，)a4R，，}2 (9) -C(= 0)0- (R，一 C(= 0)0)a4- R，，(10) -C(=0)0—(R，0)a4-R，， (11) -NHC(=0)-(R，NHC(=0))a4 —R，， (12) (在化學式（4)至化學式（12)中，R’係表示可以具有取代基之 2價之烴基，R”係表示氫原子、可以具有取代基之1價之 烴基、-COOH、-S03H、-OH、-SH、-NRC2、-CN 或-C(=0)NRc2， R’”係表示可以具有取代基之3價之烴基，a3係表示1以 上之整數，a4係表示0以上之整數，Re係表示可以具有取 代基之碳原子數1至30之烷基或者是可以具有取代基之碳 原子數6至50之芳基。在R’、R”及R’’’之各個具有複數 個之狀態下，具有複數個之R’、R”及R’”係分別可以相 同，也可以不同。）） 離子性聚合物係最好是在全構造單位十包含15莫耳 %至100莫耳％之由化學式（13)所表示之構造單位、化學式 12 323451 201234576 (15)所表示之構造單位、化學式（17)所表示之構造單位及化 學式（20)所表示之構造單位而組成之群組中選出之1種以 上之構造單位。—C(=S)—(R,—C(=S))a4-R,,(8) -N{(R,)a4R,,}2 (9) -C(= 0)0- (R , a C(= 0)0)a4- R,,(10) -C(=0)0—(R,0)a4-R,, (11) -NHC(=0)-(R,NHC( =0)) a4 — R,, (12) (In the chemical formula (4) to the chemical formula (12), R′ represents a divalent hydrocarbon group which may have a substituent, and R′′ represents a hydrogen atom and may have a substituent. The monovalent hydrocarbon group, -COOH, -S03H, -OH, -SH, -NRC2, -CN or -C(=0)NRc2, R'" represents a trivalent hydrocarbon group which may have a substituent, and a3 represents An integer of 1 or more, a4 represents an integer of 0 or more, and Re represents an alkyl group having 1 to 30 carbon atoms which may have a substituent or an aryl group having 6 to 50 carbon atoms which may have a substituent. In the state in which each of R" and R''' has a plurality of plural, R', R" and R'" may be the same or different, respectively.)) The ionic polymer system is preferably The total structural unit contains 15 mol% to 100 mol% of the structural unit represented by the chemical formula (13), the structural unit represented by the chemical formula 12 323451 201234576 (15), and the chemical formula (17) One or more structural units selected from the group consisting of the structural unit represented by the chemical formula (20) and the structural unit represented by the chemical formula (20).

(13) (在化學式（13)中，R1係包含化學式（14)所表示之基之1價 基，Ar1係表示可以具有R1以外之取代基之（2 + n4)價之芳 _ 香族基，n4係表示1以上之整數，在R1具有複數個之狀 態下，具有複數個之R1係可以相同，也可以不同。） —R2-{(Q1)nrY1(M1)a1(Z1)b1}m1 {(Q3)n3-Y3}m2 ^ (在化學式（14)中，R2係表示（1 +ml + m2)價之有機基，Q1、 Q3、γΐ、Mi、Zi、Y3、nl、al、bl 及 n3 係表示相同於前 面敘述之意義，ml及m2係分別獨立地表示1以上之整 •數，在 Q、Q3、γΐ、Mi、Zi、Y3、id、a卜 bl 及 n3 之各 個係在具有複數個之狀態下，具有複數個之Q1、Q3、Y1、 Μ1、Ζ1、Υ3、nl、al、bl及η3，分別可以才目同:，也可以 不同。）(13) (In the chemical formula (13), R1 includes a monovalent group of the group represented by the chemical formula (14), and Ar1 represents a (2 + n4) valence aryl group which may have a substituent other than R1 N4 is an integer of 1 or more. In the state in which R1 has a plurality of plural, the plurality of R1 systems may be the same or different.) —R2-{(Q1)nrY1(M1)a1(Z1)b1}m1 {(Q3)n3-Y3}m2 ^ (In the chemical formula (14), R2 represents an organic group of (1 + ml + m2) valence, Q1, Q3, γΐ, Mi, Zi, Y3, nl, al, bl And the n3 system is the same as the above-mentioned meaning, and the ml and m2 systems respectively represent the integers of 1 or more, and are respectively in the respective numbers of Q, Q3, γΐ, Mi, Zi, Y3, id, ab, bl, and n3. In a state with a plurality of numbers, there are a plurality of Q1, Q3, Y1, Μ1, Ζ1, Υ3, nl, a1, bl, and η3, respectively, which may be the same: or different.)

(在化學式（15)中，R3係包含化學式（16)所表示之基之1價 基，Ar2係表示可以具有R3以外之取代基之(2 +η5)價之芳 13 323451 201234576 香族基，n5係表示1以上之整數，在R3具有複數個之狀 態下，具有複數個之R3係可以相同，也可以不同。 —R4-{(Q2)nrY2(M2)a2(Z2)b2}m3 …、 I (16) {(Q3)n3-Y3}m4 (在化學式（16)中，R4係表示（l + m3 + m4)價之有機基，Q2、 Q3、Y2、Μ2、Z2、Y3、n2、a2、b2 及 n3 係表示相同於前 面敘述之意義，m3及m4係分別獨立地表示1以上之整 數。在 Q2、Q3、Y2、Μ2、Z2、Y3、n2、a2、b2 及 n3 之各 • 個係在具有複數個之狀態下，具有複數個之Q2、Q3、Y2、 Μ2、Ζ2、Υ3、η2、a2、b2及η3，分別可以相同，也可以 不同。））(In the chemical formula (15), R3 includes a monovalent group of the group represented by the chemical formula (16), and Ar2 represents an aromatic 13 323451 201234576 scent group which may have a (2 + η5) valence of a substituent other than R3. The n5 system represents an integer of 1 or more, and in the state in which R3 has a plurality of plural, the plurality of R3 systems may be the same or different. - R4-{(Q2)nrY2(M2)a2(Z2)b2}m3 ..., I (16) {(Q3)n3-Y3}m4 (In the chemical formula (16), R4 represents an organic group of (l + m3 + m4) valence, Q2, Q3, Y2, Μ2, Z2, Y3, n2 A2, b2, and n3 are the same as described above, and m3 and m4 are each independently representing an integer of 1 or more. In each of Q2, Q3, Y2, Μ2, Z2, Y3, n2, a2, b2, and n3. The system has a plurality of Q2, Q3, Y2, Μ2, Ζ2, Υ3, η2, a2, b2, and η3 in a plurality of states, which may be the same or different.))

φ (在化學式（17)中，R5係包含化學式（18)所表示之基之1價 基，R6係包含化學式（19)所表示之基之1價基，Αι*3係表示 可以具有R5及R6以外之取代基之（2 + n6 + n7)價之芳香族 基，n6及n7係分別獨立地表示1以上之整數，R5及R6 之各個係在具有複數個之狀態下，具有複數個之R5及R6， 分別可以相同，也可以不同。 -^1 - {(Ql)ni-Y\Ml)al(Zl)hl}m5 (18) (在化學式（18)中，R7係表示直接鍵結或（l + m5)價之有機 基，Q1、Y1、Μ1、Z1、nl、al及bl係表示相同於前面敘 14 323451 201234576 述之意義，m5係表示1以上之整數，Q1、Υ1、Μ1、Z1、 nl、al及bl之各個係在具有複數個之狀態下，具有複數 個之Q1、Y1、Μ1、Z1、nl、al及Μ，分別可以相同，也 可以不同。） -R8-{(Q3)n3-Y3}m6 (19)φ (In the chemical formula (17), R5 includes a monovalent group of the group represented by the chemical formula (18), R6 includes a monovalent group of the group represented by the chemical formula (19), and Αι*3 indicates that it may have R5 and The aromatic group of (2 + n6 + n7) valence of a substituent other than R6, n6 and n7 each independently represent an integer of 1 or more, and each of R5 and R6 has a plurality of states, and has a plurality of R5 and R6, respectively, may be the same or different. -^1 - {(Ql)ni-Y\Ml)al(Zl)hl}m5 (18) (In chemical formula (18), R7 represents direct bonding Or an organic group of (l + m5) valence, Q1, Y1, Μ1, Z1, nl, a1, and bl are the same as those described in the above-mentioned 14 323451 201234576, and m5 is an integer of 1 or more, Q1, Υ1, Μ1 Each of Z1, nl, a1, and bl has a plurality of Q1, Y1, Μ1, Z1, nl, a1, and Μ, which may be the same or different.) -R8-{ (Q3)n3-Y3}m6 (19)

(在化學式（19)中，R8係表示單鍵或（l + m6)價之有機基， Y3及n3係表示相同於前面敘述之意義，m6係表示1以上 之整數。但是，在R8為單鍵之時，m6係表示1。Q3、Y3 及n3之各個係在具有複數個之狀態下，具有複數個之Q3、 Y3及n3，分別可以相同，也可以不同。）)(In the chemical formula (19), R8 represents a single bond or an organic group of (l + m6) valence, Y3 and n3 represent the same meaning as described above, and m6 represents an integer of 1 or more. However, R8 is a single In the case of a key, m6 represents 1. Each of Q3, Y3, and n3 has a plurality of Q3, Y3, and n3 in a plurality of states, and may be the same or different.))

(20) (在化學式（20)中，R9係包含化學式（21)所表示之基之1價 基，R1Q係包含化學式(22)所表示之基之1價基，Ar4係表 示可以具有R9及R1Q以外之取代基之(2 + η8 + η9)價之芳香 族基，η8及η9係分別獨立地表示1以上之整數，R9及R1G 之各個係在具有複數個之狀態下，具有複數個之R9及R1g， 分別可以相同，也可以不同。 —R11— {(Q2)n2 —Y2(M2)a2(Z2)b2}m7 (21) (在化學式(21)中，R11係表示單鍵或（l + m7)價之有機基， Q2、Y2、Μ2、Z2、n2、a2及b2係表示相同於前面敘述之 意義，m7係表示1以上之整數。但是，在R11為單鍵之時， 15 323451 201234576 m7係表示1。Q2、γ2、M2、Z2、n2、a2及b2之各個係在 具有複數個之狀態下，具有複數個之q2、γ2、Μ2、Z2、n2、 a2及b2 ’分別可以相同，也可以不同。） -R12-{(Q3)n3〜Y3}m8 (22) (在化學式(22)中，Ru係表示單鍵或（1 + m8)價之有機基， Y及n3係表示相同於前面敘述之意義，係表示1以上 之整數。但是，在Rl2為單鍵之時，m8係表示1。Q3、γ3 及n3之各個係在具有複數個之狀態下，具有複數個之q3、 鲁Y3及n3，分別可以相同，也可以不同。）） 前述離子性聚合物中之構造單位係可以包含2種類以 上之化學式（1)所表示之基，也可以包含2種類以上之化學 式(2)所表示之基，也可以包含2種類以上之化學式（3)所表 示之基。 —化學式（1)所表示之基— 在化學式（1)中，作為q1所表示之2價之有機基係列 φ 舉如：亞曱基、伸乙基、1，2-伸丙基、1，3-伸丙基、1，2-伸 丁基、丨，3-伸丁基、1，4-伸丁基、1,5-伸戊基、1，6-伸己基、 1，9-伸壬基、1，12_伸十二碳基經取代基取代這些基中之至 少1個氫原子之基等之可以具有取代基之碳原子數1至5〇 之2價之飽和烴基；伸乙烯基、伸丙烯基、3-伸丁烯基、 2-伸丁烯基、2-伸戊烯基、2_伸己烯基、2_伸壬烯基、2_ 伸十二稀基經取代基取代這些基中之至少1個氫原子之基 等之可以具有取代基之碳原子數2至50之伸烯基以及包含 伸乙块基之可以具有取代基之碳原子數2至5〇之2價之不 16 323451 201234576 餘Γ基；料丙基、伸環丁基、伸環戍基、伸環己基、 伸％壬基、伸壤十二碳基、伸降茨基、伸金鋼烧基經 基取代這些基中之至少i倘h ^ 基之碳原子數3至50之2 以具有取代 1馬之環狀飽和烴基；1，3-伸苯基、 =伸苯基、;M·伸萘基、1>5、伸萘基、2,6_伸萘基、聯苯 基二酸基經取代基取代這些基中之至少Η固氫原子 之土之可以具有取代基之石炭原子數6至5〇之伸芳基；亞 甲氧基、伸乙氧基、伸丙氧基、伸丁氧基、伸戊氧基、伸 己氧基經取代基取代這些基中之至少ι個氯原子之基等之 可以具有取代基之碳原子數i至5〇之伸炫氧基；具有包含 碳原子之取代基之亞胺基；具有包含碳原子之取代基之亞 =由成為離子性聚合物原料之單體(在以下，稱為「原料 單體」。）之合成容易度之觀點來看，則最好是2價之飽和 烴基、伸芳基、伸烷氧基。 * 作為前述取代基係列舉如：烷基、烷氧基、烷硫基、 方基、芳氧基、芳硫基、芳烷基、芳基烷氧基、芳基烷硫 基、芳基烯基、芳基炔基、胺基、取代胺基、矽基、取代 矽基、_素原子、醯基、醯氧基、亞胺殘基、醯胺基、醯 亞胺基、1價雜環基、羥基、羧基、取代羧基、氰基及硝 基等’前述取代基存在複數個之狀態下，存在複數個之取 代基係可以相同，也可以不同。在這些當中，胺基、石夕基、 鹵素原子、經基和硝基以外之取代基係包含碳原子。 在以下，就取代基而進行說明。此外，所謂「（^至CnJ (m、η係滿足m < ^之正整數。）之用語係表示和該用語一 323451 17 201234576 起記载之有機基之碳原 基的話，則表示燒基之雖為m至11。例如為Q至Cn烧 院基芳基的話，則表示^子數為瓜至11，如果是‘至〇„ 芳基仏至基的話；^之碳原子數為m至η，如果是 ^ 則表示烷基之碳原子數為m至η。 基之碳原支鍵狀’也可以是環絲。烧 列舉甲基、乙基、丙基、 乍繼： 其、丁使丄、* J签共』基、sec-丁 二其 ^ 土、已基、環己基、庚基、辛基、壬基、 癸基、月桂基等。前料基中之氫料係可 土 =2代二作為該氟原子取代燒基係列舉如：三氣甲基、 =乙基、全氣丁基、全說己基、全敦辛基等。此外，作 為^至C12烧基係列舉例如：甲基、乙基、丙基、異丙基、 =莫異丁基、私丁基督丁基、戊基、異戊基、己基、 哀己基、庚基、.辛基、壬基、癸基、月桂基。 烷氧基係可以是直鏈狀或支鍵狀，也可以是環烧氧 基，也可以具有取代基。烧氧基之碳原子數—般為丨至扣， 最好是作為絲基_舉如：f氧基、乙基氧、 丙氧基、異丙氧基、丁氧基、異丁氧基、咖_丁氧基、加· 丁氧基、戊氧基、己氧基、環己氧基、庚氧基、辛氧基、 壬氧基、癸氧基、月桂氧基等。前述烧氧基中之氫原子係 可以藉由氣原子進行取代。作為氣原子取代烧氧基係列舉 如：三氟甲氧基、减乙氧基、全氟丁氧基、全就己氧基、 全氟辛氧基等。此外，在該烷氧基中，也包含甲氧基曱基 氧基、2-甲氧基乙基氧基。此外，作為心至^烷'^基^ 323451 18 201234576 列舉例如：T氧基、乙氧基、丙氧基、異丙氧基、丁氧基、 異丁氧基、sec-丁氧基、tert_丁氧基、戊氧基、己氧基、環 己氧基、庚氧基、辛氧基、2-乙基己氧基、壬氧基、癸氧 基、3,7-—甲基辛基氧基、月桂氧基。 作為烷硫基係可以是直鏈狀或支鏈狀，也可以是環烷 硫基，也可以具有取代基。烷硫基之碳原子數一般為j至 20，最好是1至10。作為烷硫基係列舉如：曱硫基.、乙硫 鲁基、丙硫基、異丙硫基、丁硫基、異丁硫基、sec_T硫基、 tert- 丁硫基、戊硫基、己硫基、環己硫基、庚硫基、辛硫 基、壬硫基、癸硫基、月桂硫基等。前述烧硫基中之氫原 子係可以藉由氟原子進行取代。作為氟原子取代烷硫基係 列舉如：三氟曱硫基等。 芳基係由芳香族煙除去1個鍵結於構成芳香環之碳原 子上之氫原子後所殘留之原子團，也包含具苯環之基、具 稠環之基、獨立之苯環或稠環之2個以上透過單鍵或2價 # 有機基，例如伸乙烯基等伸嫦基而結合之基。芳基係碳原 子數一般為6至60,最好是7至48。作為芳基係列舉如： 苯基、Q至烷氧基苯基、q至Cn烷基苯基、1_萘基、 2-萘基、1-蒽基、2-蒽基、9-蒽基等。前述芳基中之氫原子 係可以藉由氟原子進行取代。作為氟原子取代芳基係列舉 如：五氟苯基等。在芳基中，最好是（^至C12烷氧基苯基、 Cl至Ci2撰*基苯基.。 在前述芳基中，作為（^至c12烷氧基苯基係列舉如： 甲氧基苯基、乙氧基苯基、丙氧基苯基、異丙氧基苯基、 19 323451 201234576 y氧基苯基、異丁氧基苯基、sec_丁氧基苯基、tert_丁氧基 =基、戊氧基苯基、己氧基苯基、環己氧基苯基、庚氧基 苯基辛氧基苯基、2_乙基己氧基苯基、壬氧基苯基、癸 氧基苯基、3,7_二甲基辛氧基苯基、月桂氧基苯基等。 在前述芳基中，作為（^至Ci2烷基苯基係列舉如：甲 基苯基、乙基苯基、二曱基苯基、丙基苯基、三甲苯基、. 甲基$基苯基、異丙基苯基、丁基苯基、異丁基苯基、tert-φ 丁基2基、戊基苯基、異戊基苯基、己基苯基、庚基苯基、 辛基苯基、壬基苯基、癸基苯基、月桂基笨基等。 芳氧基碳原子數一般為6至60，最好是7至48。作 為芳氧基係列舉如：苯氧基、（^至（：12院氧基苯氧基、Ci 至f12烧基笨氧基、L萘氧基、2-萘氧基、五ft苯氧基等。 在方氧基中，最好是匸！至C!2烷氧基笨氧基及（^至Ci2 烷基苯氧基。 在前述芳氧基中’作為Cl至Cl2燒氧基苯氧基係列舉 鲁如：甲氧基苯氧基'乙氧基苯氧基、丙氧基苯氧基、異丙 氧基苯氧基、丁氧基笨氧基、異丁氧基苯氧基、卿-丁氧 基苯祕、tm-丁氧基苯氧基、戊氧基苯氧基、己氧基苯 氧基、環己氧基苯氧基、庚氧基苯氧基、辛氧基苯氧基、 2·乙基己氧絲氧基、壬氧絲氧基、癸氧絲氧基、3,7_ -曱基辛氧絲氧基、賴氧基苯氧基等。 ，在則f Γ氧基巾’作為Cl至Cl2絲苯氧基係列舉 =·曱基苯氧基、乙絲祕、二曱絲氧基、丙基苯氧 土、1，3,5·二甲絲氡基、？基乙絲氧基、異丙基苯氧基、 323451 20 201234576 氧基等 =苯氧基、異τ絲氧基、游丁基錢基、⑽-丁基笨 乳基、戍基錢基、異戊絲氧基、己基笨氧基、庚基笨 氧基、辛絲氧基、壬絲祕、癸絲氧基、月桂^苯 芳硫基係例如硫元素鍵結於前述芳基之基。芳铲 可以在前述芳基之芳香環上具有取代基。芳硫基之碳=子、 ί 一般為6至60 ’最好是6至30。作為芳硫基係列舉如： 苯，基、Cd C12燒氧基苯硫基、Ci至〜烧基苯硫基、 1-萘硫基、2-萘硫基、五氟苯硫基等。 芳基烷基係例如前述烷基鍵結於前述芳基之基。芳美 烧基係可以具有取代基。芳綠基之碳原子數—般為^ 60，最好是7至30。作為芳基烷基係列舉如：苯基％至 C12烷基、C!至Cl2燒氧基苯基_Ci至Ci2貌基、q至h 貌基苯基-CJ C1Z燒基、l萘基七至Cu燒基、2_蔡基^ 至Ci2烧基等。 ,、 芳基烷氧基係例如前述烷氧基鍵結於前述芳基之美。 芳基烷氧基係可以具有取代基。芳基烷氧基之碳原子數— ，為7至6G ’最好是7至3〇。作為絲絲基係列舉如： 笨基至C1Z烷氧基、Cl至c!2烷氧基苯基至A】烷 氧基、Ci至Cu烷基苯基-Cl至Ci2烷氧基、^萘基至 C!2烷氧基、2-萘基-C!至c12烷氧基等。 芳基烷硫基係例如前述烷硫基鍵結於前述芳基之基。 芳基烷硫基係可以具有取代基。芳基烷硫基之碳原子數一 般為7至60，最好是7至3卜作為芳基烷硫基係列舉如： 323451 21 201234576 苯基-C】至Cu烷硫基、q至Cu烷氧基苯基至CD烷 硫基、c〗至C!2烷基苯基-Ci至C!2烷硫基、u萘其c至 Cl2烷硫基、2-萘基-C】至c12烷硫基等。 1 芳基烯基係例如烯基鍵結於前述芳基之基。— =子數一般為8至6。，最好是8至3〇。;為 係列舉如：苯基-C2至Cl2烯基、cjCi2燒氧基苯美C 至C12烯基、〇1至〇：12烷基苯基·(：2至（：12烯二土 = 至Clz烯基、2_萘基-(^至Cu烯基等，最好 备甘奸《 久匕1至C12院 氧基本基-C2至Ci2烯基、〇2至clz烷基苯基_〇2至烯 基。此外，作為<：2至cn烯基係列舉何如：2 ^ :基、2-丙稀基M-丁稀基、2-丁稀基M•戊烯基、2_戊稀 卷、1-己烯基、2-己烯基、1-辛烯基。 芳基炔基係例如快基鍵結於前述芳基之義。― =子數一般為8至60,最好是8至3〇。;為= 係列舉如：苯基-c2至C12炔基、CJC12境氧 至C12炔基、Cl至Cl2烧基苯基_C2i Ci2块基、土i关土基^ 炔基、2.CJC12炔基等，最好是C1;2院2 巩基本基-(：2至clz炔基、q至cu烷基笨基 甘 j 2 -3ε. ^-^12 暴。此外，作為（：2至cn炔基係列舉例如. K. «. 炔基、1-丙 =基、2·丙炔基、Μ炔基、2·丁快基、1鬚基、2-戊炔 暴、1-己炔基、2-己炔基、1-辛炔基。 作為取代胺基最好是藉由烷基、芳基、芳美浐美寿丄 價雜環基所組成之群組中選出之i個或2個::=:;丄 中之至少1個氫原子之胺基。該烷基、关 土 $基、芳基烷基或 323451 22 201234576 1價雜環基係可以具有取代基。取代胺基之碳原子數並不 包含該烷基、芳基、芳基烷基或1價雜環基可具有之取代 基的碳原子數，而一般為1至60,最好是2至48。作為取 代胺基係列舉如··曱基胺基、二甲基胺基、乙基胺基、二 乙基胺基、丙基胺基、二丙基胺基、異丙基胺基、二異丙 基胺基、丁基胺基、異丁基胺基、sec-丁基胺基、tert-丁基 胺基、戊基胺基、己基胺基、環己基胺基、庚基胺基、辛 基胺基、2-乙基己基胺基、壬基胺基、癸基胺基、3，7·二甲 ® 基辛基胺基、月桂基胺基、環戊基胺基、二環戊基胺基、 環己基胺基、二環己基胺基、二(三氟甲基)胺基、苯基胺 基、二苯基胺基、（C!至c12烷氧基苯基)胺基、二(C!至 C!2烷氧基苯基)胺基、二(Ci至（：12烷基苯基）胺基、1-萘基 胺基、2-萘基胺基、五氟苯基胺基、π比咬基胺基、噠嗓基 胺基、嘧啶基胺基、咐^秦基胺基、三嗪基胺基、（苯基·Ci 至c〗2院基)胺基、（Cl至b烷氧基苯基·Ci至Ci2烷基)胺 • 基、（Cl至Cl2烷基苯基_C1至c12烷基)胺基、二(C!至c12 烷氧基苯基-(^至clz烷基)胺基、二(〇1至Ci2烷基苯基_Ci 至clz烷基)胺基、丨_萘基_Ci至Ci2烷基胺基、2_萘基 至c12烷基胺基等。 作為取代石夕基係列舉如：石夕基中之至少i個氮原子經由 烷基芳基、芳基烷基和i價雜環基所組成之群組中選出之 1至7之基所取代之絲。魏基、芳基、絲烧基或1 價雜％基係可以具有取代基。取切基之碳原子數並不包含 5亥烧基、芳基、絲絲或1價轉基可以具有之取代基之 323451 23 201234576 碳原子數，而一般為1至60，最好是3至48。此外，作為 取代矽基係列舉如.二曱基矽基、三乙基矽基、三丙基石夕基、 三異丙基矽基、異丙基二甲基矽基、異丙基二乙基矽基 'tert- 丁基一甲基石夕基、戊基二甲基石夕基、己基二甲基石夕基、庚基 二曱基矽基、辛基二甲基矽基、2-乙基己基二曱基矽基、壬 基二甲基石夕基、癸基二甲基石夕基、3,7·二甲基辛基二甲基石夕 基、月桂基二曱基矽基、（苯基_Ci至Ci2烷基)矽基、（(^至 c12烧氧基苯基-Cl至Cl2烧基)石夕基、（Ci至&烧基苯基心 至Cl2烧基)石夕基、（1_萘基-Ci至C12烧基)石夕基、（2_萘基_Ci 至Cl2烷基)矽基、（苯基_4至C1Z烷基)二甲基矽基、三苯 基石夕基、三(Ρ·二甲苯基)石夕基、三节基石夕基、二苯基甲基石夕 基、tert-丁基二笨基矽基、二▼基苯基矽基等。 心作為i素原子係列舉如：敦原子、氣原子、漠原子和 峨原子。 為疏A :之厌原子數一般為2至2〇 ’最好是2至18。作 :,土係列舉如：乙醯基、丙醯基、T醯基、異丁酿基、 甲基、笨甲醯基、三氟乙醯基、五氟苯甲醯基土等。 醯，基之碳原子數―般為2至2()，最 作為醯氧基係列與lΑρ 異丁酿- 乙醯氧基'碰氧基、丁酿氧基、 基基、苯w酿氧 式·· 表示由具有w: H_W化學 該構造t之丨翻/_麵表Μ構造之亞絲合物除去 個乳原子後之殘基。作為此種亞胺化合物係. 323451 24 201234576(20) (In the chemical formula (20), R9 includes a monovalent group of the group represented by the chemical formula (21), R1Q includes a monovalent group of the group represented by the chemical formula (22), and Ar4 represents that it may have R9 and An aromatic group of (2 + η8 + η9) valence of a substituent other than R1Q, η8 and η9 each independently represent an integer of 1 or more, and each of R9 and R1G has a plurality of states, and has a plurality of R9 and R1g, respectively, may be the same or different. —R11— {(Q2)n2 —Y2(M2)a2(Z2)b2}m7 (21) (In the chemical formula (21), R11 represents a single bond or l + m7) The organic group of the valence, Q2, Y2, Μ2, Z2, n2, a2 and b2 are the same as the above-mentioned meaning, and m7 is an integer of 1 or more. However, when R11 is a single bond, 15 323451 201234576 m7 denotes 1. Each of Q2, γ2, M2, Z2, n2, a2 and b2 has a plurality of q2, γ2, Μ2, Z2, n2, a2 and b2' respectively in a state with a plurality of states It may be the same or different.) -R12-{(Q3)n3~Y3}m8 (22) (In the chemical formula (22), Ru represents a single bond or an organic group of (1 + m8) valence, Y and n3 Department is the same as The meaning of the surface description is an integer of 1 or more. However, when Rl2 is a single bond, m8 represents 1. Each of Q3, γ3, and n3 has a plurality of q3, and each of them has a plurality of states. Y3 and n3 may be the same or different.) The structural unit in the ionic polymer may include two or more kinds of groups represented by the chemical formula (1), or may contain two or more types of chemical formulas (2) The group represented by the formula (3) of two or more types may be contained. - a group represented by the chemical formula (1) - in the chemical formula (1), the divalent organic group φ represented by q1 is, for example, an anthracene group, an extended ethyl group, a 1,2-extended propyl group, 1, 3-propyl, 1,2-butyl, hydrazine, 3-tert-butyl, 1,4-butylene, 1,5-amyl, 1,6-extension, 1,9-extension a divalent saturated hydrocarbon group having 1 to 5 carbon atoms which may have a substituent, such as a fluorenyl group, a 1,12-extended dodecyl group substituted with a substituent at least one of these groups; Base, propylene group, 3-butenyl group, 2-butenyl group, 2-endopentenyl group, 2-hexenylene group, 2-extenylene group, 2_ extension 12-substituent substituent An alkenyl group having 2 to 50 carbon atoms which may have a substituent, which may have a substituent such as at least one of these groups, and 2 to 5 Å of a carbon atom which may have a substituent and which may have a substituent The price is not 16 323451 201234576 Γ Γ; propyl, Cyclobutene, Cyclone, Cyclohexyl, 壬% 、, 十二 十二 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 Substituting at least i of these groups, if the number of carbon atoms of the h ^ group is 3 to 5 0 of 2 is a cyclic saturated hydrocarbon group having a substitution of 1 horse; 1,3-phenylene group; =phenylene group; M. anthranyl group, 1>5, anthranyl group, 2,6-thylene naphthyl group, a biphenyldicarboxylic acid group substituted with at least one of these groups; at least a aryl group having 6 to 5 Å of a carbon atom having a substituent; a methylene group, an ethoxy group, and a stretching group; a propoxy group, a butyloxy group, a pentyloxy group, a hexyloxy group, a substituent, a substituent of at least one of the chlorine atoms of the group, or the like, which may have a substituent having a carbon atom number i to 5 Å. An oxy group; an imine group having a substituent containing a carbon atom; a subunit having a substituent containing a carbon atom = a synthesis of a monomer which is a raw material of an ionic polymer (hereinafter referred to as "raw material monomer") From the viewpoint of easiness, it is preferably a divalent saturated hydrocarbon group, an extended aryl group, or an alkoxy group. * As a series of the above substituents: alkyl, alkoxy, alkylthio, aryl, aryloxy, arylthio, aralkyl, arylalkoxy, arylalkylthio, arylene Alkyl, arylalkynyl, amine, substituted amino, fluorenyl, substituted fluorenyl, hydrazine, fluorenyl, decyloxy, imine residue, decylamino, quinone imine, monovalent heterocyclic When a plurality of the substituents are present in the group of a hydroxyl group, a hydroxyl group, a carboxyl group, a substituted carboxyl group, a cyano group or a nitro group, a plurality of substituents may be the same or different. Among these, a substituent other than an amine group, a Schiff base, a halogen atom, a trans group, and a nitro group contains a carbon atom. Hereinafter, the substituents will be described. In addition, the term "(^ to CnJ (m, η is a positive integer that satisfies m < ^) indicates the carbon base of the organic group described in the term "323451 17 201234576", and Although it is from m to 11. For example, if Q to Cn is a aryl group, it means that the number of the genus is from melon to 11, and if it is 'to 〇 aryl 仏 to the group; ^ the number of carbon atoms is m to η, if it is ^, it means that the number of carbon atoms of the alkyl group is from m to η. The carbon bond of the group can also be a ring filament. The alkyl group, the ethyl group, the propyl group and the hydrazine group are listed as follows:丄, * J signed a total of ke, sec-Ding two its ^ soil, hexyl, cyclohexyl, heptyl, octyl, decyl, sulfhydryl, lauryl, etc. The hydrogen material in the pre-base can be soil = The second generation as the fluorine atom-substituted alkyl group is as follows: trimethyl group, = ethyl group, all-gas butyl group, all-hexyl group, whole Dunsinyl group, etc. Further, as a series of ^ to C12 alkyl groups, for example: Methyl, ethyl, propyl, isopropyl, =misobutyl, butyl butyl, pentyl, isopentyl, hexyl, hexyl, heptyl, octyl, decyl, decyl, Laurel. The alkoxy group may be linear or branched, or may be a cyclic alkoxy group or may have a substituent. The number of carbon atoms in the alkoxy group is generally a ruthenium to a deduction, preferably as a silk base. Such as: foxy, ethyloxy, propoxy, isopropoxy, butoxy, isobutoxy, ca-butoxy, butanoxy, pentyloxy, hexyloxy, cyclohexyl An oxy group, a heptyloxy group, an octyloxy group, a decyloxy group, a decyloxy group, a lauryloxy group, etc. The hydrogen atom in the above alkoxy group can be substituted by a gas atom. For example: trifluoromethoxy, ethoxylated, perfluorobutoxy, all hexyloxy, perfluorooctyloxy, etc. In addition, in the alkoxy group, methoxy decyloxy group is also included. , 2-methoxyethyloxy. Further, as the heart to the alkyl group, 323451 18 201234576, for example, T, ethoxy, propoxy, isopropoxy, butoxy, iso Butoxy, sec-butoxy, tert_butoxy, pentyloxy, hexyloxy, cyclohexyloxy, heptyloxy, octyloxy, 2-ethylhexyloxy, decyloxy, hydrazine Oxygen, 3,7-methyloctyloxy The alkylthio group may be linear or branched, and may be a cycloalkylthio group or a substituent. The alkylthio group has a carbon number of usually from j to 20, preferably. It is 1 to 10. As a series of alkylthio groups, such as sulfonylthio group, ethylthio group, propylthio group, isopropylthio group, butylthio group, isobutylthio group, sec_T thio group, tert-butylthio group , pentylthio, hexylthio, cyclohexylthio, heptylthio, octylthio, sulfonylthio, sulfonylthio, laurel, etc. The hydrogen atom in the above sulfur-burning group can be carried out by a fluorine atom The aryl group is a group of a fluorine atom-substituted alkylthio group, such as a trifluorosulfonyl group, etc. The aryl group is an atomic group remaining after the aromatic atom is bonded to a hydrogen atom bonded to a carbon atom constituting the aromatic ring. Two or more of a group having a benzene ring group, a condensed ring group, a separate benzene ring or a fused ring may be bonded through a single bond or a divalent organic group such as a vinyl group. The number of aryl carbon atoms is generally from 6 to 60, preferably from 7 to 48. As the aryl series, for example: phenyl, Q to alkoxyphenyl, q to Cn alkylphenyl, 1-naphthyl, 2-naphthyl, 1-indenyl, 2-indenyl, 9-fluorenyl Wait. The hydrogen atom in the aforementioned aryl group may be substituted by a fluorine atom. As the fluorine atom-substituted aryl group, a pentafluorophenyl group or the like can be mentioned. Among the aryl groups, it is preferably (^ to C12 alkoxyphenyl group, Cl to Ci2 phenyl group. In the above aryl group, as (^ to c12 alkoxyphenyl series: methoxy Phenylphenyl, ethoxyphenyl, propoxyphenyl, isopropoxyphenyl, 19 323451 201234576 yoxyphenyl, isobutoxyphenyl, sec-butoxyphenyl, tert_butyl Oxyl = yl, pentyloxyphenyl, hexyloxyphenyl, cyclohexyloxyphenyl, heptyloxyphenyloctyloxyphenyl, 2-ethylhexyloxyphenyl, decyloxyphenyl , methoxyphenyl, 3,7-dimethyloctyloxyphenyl, lauryloxyphenyl, etc. Among the above aryl groups, as (^ to Ci2 alkylphenyl series: methylphenyl , ethylphenyl, dinonylphenyl, propylphenyl, trimethylphenyl, methylmethylphenyl, isopropylphenyl, butylphenyl, isobutylphenyl, tert-φ Base 2, pentylphenyl, isopentylphenyl, hexylphenyl, heptylphenyl, octylphenyl, nonylphenyl, nonylphenyl, lauryl, etc. aryloxy carbon atom The number is generally from 6 to 60, preferably from 7 to 48. As the series of aryloxy groups: phenoxy (^ to (: 12 oxime phenoxy, Ci to f12 alkyl oxy, L naphthyloxy, 2-naphthyloxy, penta pent phenoxy, etc. Among the aryloxy groups, preferably 匸To C! 2 alkoxy phenoxy and (^ to Ci2 alkyl phenoxy. In the above aryloxy group 'as Cl to Cl 2 alkoxyphenoxy series ruthenium: methoxyphenoxy 'Ethoxyphenoxy, propoxyphenoxy, isopropoxyphenoxy, butoxyoxy, isobutoxyphenoxy, s-butoxyphenoxy, tm-butoxy Phenoxy, pentyloxyphenoxy, hexyloxyphenoxy, cyclohexyloxyphenoxy, heptyloxyphenoxy, octyloxyphenoxy, 2-ethylhexoxyoxyl , oxime-oxyloxy, oxime-oxyloxy, 3,7--fluorenyl octyloxyoxy, lysoxyphenoxy, etc., in the case of f Γ Γ 巾 as Cl to Cl 2 silk phenoxy Series: = decyl phenoxy, acetylene, diterpene oxy, propyl phenoxy, 1,3,5 dimethyl fluorenyl, ethyl ethoxy, isopropyl phenoxy Base, 323451 20 201234576 oxy, etc. = phenoxy, iso-t-silyloxy, butyl butyl, (10)-butyl phenyl, thiol, Isoamyloxy, hexyloxy, heptyloxy, octyloxy, fluorene, fluorenyloxy, laurel, phenyl arylthio, for example, a sulfur element is bonded to the aryl group. The aromatic shovel may have a substituent on the aromatic ring of the aforementioned aryl group. The arylthio group has a carbon = sub, ί is generally 6 to 60', preferably 6 to 30. As an arylthio group, the following are: benzene, amide, Cd C12 alkoxyphenylthio, Ci to nonylphenylthio, 1-naphthylthio, 2-naphthylthio, pentafluorophenylthio, etc. An arylalkyl group such as the aforementioned alkyl group bonded to the aforementioned aromatic group The aryl group may have a substituent. The number of carbon atoms of the aryl group is generally 60, preferably 7 to 30. As the arylalkyl series, for example: phenyl% to C12 alkyl, C! to Cl2 alkoxyphenyl _Ci to Ci2, q to h phenyl phenyl-CJ C1Z alkyl, l naphthyl To Cu base, 2_Caiji^ to Ci2 base, and the like. The arylalkoxy group is, for example, the alkoxy group described above bonded to the aryl group. The arylalkoxy group may have a substituent. The number of carbon atoms of the arylalkoxy group is from 7 to 6 G', preferably from 7 to 3 Å. As a series of filaments, for example: stupid to C1Z alkoxy, Cl to c! 2 alkoxyphenyl to A] alkoxy, Ci to Cu alkylphenyl-Cl to Ci2 alkoxy, naphthalene Base to C! 2 alkoxy, 2-naphthyl-C! to c12 alkoxy and the like. The arylalkylthio group is, for example, a group in which the aforementioned alkylthio group is bonded to the aforementioned aryl group. The arylalkylthio group may have a substituent. The arylalkylthio group has a carbon number of usually 7 to 60, preferably 7 to 3, as an arylalkylthio group, for example: 323451 21 201234576 phenyl-C] to Cu alkylthio, q to cumane Oxyphenyl to CD alkylthio, c to C! 2 alkylphenyl-Ci to C! 2 alkylthio, u naphthyl c to Cl 2 alkylthio, 2-naphthyl-C] to c12 alkane Sulfur-based, etc. An arylalkenyl group such as an alkenyl group is bonded to the group of the above aryl group. — = The number of children is generally 8 to 6. It is best to be 8 to 3 inches. For the series: phenyl-C2 to Cl2 alkenyl, cjCi2 alkoxybenzene C to C12 alkenyl, 〇1 to 〇: 12 alkylphenyl · (: 2 to (: 12 olefins = to Clz alkenyl, 2-naphthyl-(^ to Cu alkenyl, etc., preferably prepared for rape, "Long-term 1 to C12, oxime-based, C2 to Ci2 alkenyl, 〇2 to clz alkylphenyl_〇2 To the alkenyl group. In addition, as the <:2 to cn alkenyl series, such as: 2 ^ : base, 2-propanyl M-butylate, 2-butylamyl M-pentenyl, 2-pentamethylene Vol., 1-hexenyl, 2-hexenyl, 1-octenyl. The arylalkynyl group is, for example, a fast group bonded to the aforementioned aryl group. The subnumber is generally from 8 to 60, preferably 8 to 3 〇.; = = phenyl-c2 to C12 alkynyl, CJC12 oxygen to C12 alkynyl, Cl to Cl2 alkyl phenyl _C2i Ci2 block, soil i off soil base alkynyl 2.CJC12 alkynyl group, etc., preferably C1; 2 yards 2 stalk base group - (: 2 to clz alkynyl group, q to cu alkyl stupid group g 2 -3 ε. ^-^12 storm. In addition, as (: 2 to cn alkynyl series for example. K. «. alkynyl, 1-propanyl, 2·propynyl, decynyl, 2 · butyl, 1 ke, 2-pentyne, 1-hexynyl, 2-hexynyl, 1-octynyl. The substituted amine group is preferably one or two selected from the group consisting of an alkyl group, an aryl group, and a mercapto valence heterocyclic group::=:; at least one hydrogen atom in the oxime The alkyl group, the fluorene group, the arylalkyl group or the 323451 22 201234576 monovalent heterocyclic group may have a substituent. The number of carbon atoms of the substituted amine group does not include the alkyl group, the aryl group or the aryl group. The alkyl group or the monovalent heterocyclic group may have a substituent having a carbon number of from 1 to 60, preferably from 2 to 48. As a substituted amine group, a hydrazino group or a dimethylamine is used. Base, ethylamino group, diethylamino group, propylamino group, dipropylamino group, isopropylamino group, diisopropylamino group, butylamino group, isobutylamino group, sec- Butylamino, tert-butylamino, pentylamino, hexylamino, cyclohexylamino, heptylamino, octylamino, 2-ethylhexylamino, decylamino, hydrazine Amino group, 3,7-dimethyl methoxy octylamino group, lauryl amine group, cyclopentylamino group, dicyclopentylamino group, cyclohexylamino group, dicyclohexylamino group, di(trifluoro Methyl)amino, phenylamino, diphenyl Amine group, (C! to c12 alkoxyphenyl)amino group, di(C! to C! 2 alkoxyphenyl)amino group, di(Ci to (:12 alkylphenyl)amino group, 1 -naphthylamino, 2-naphthylamino, pentafluorophenylamino, π-butylamino, decylamino, pyrimidinylamino, fluorenylamino, triazinylamino , (phenyl·Ci to c) 2 alkyl), (Cl to b alkoxyphenyl·Ci to Ci2 alkyl)amine •, (Cl to Cl 2 alkylphenyl _C1 to c12 alkyl Amino, bis(C! to c12 alkoxyphenyl-(^ to clz alkyl)amine, bis(〇1 to Ci2alkylphenyl-Ci to clz alkyl)amine, 丨-naphthyl _Ci to Ci2 alkylamino group, 2-naphthyl group to c12 alkylamino group and the like. As a substitute for the Shishiji series, for example, at least one nitrogen atom in the Shi Xiji is substituted by a group selected from the group consisting of an alkylaryl group, an arylalkyl group and an i-valent heterocyclic group. Silk. The Wei, aryl, silk-based or monovalent hetero-based groups may have a substituent. The number of carbon atoms of the cleavage group does not include the number of carbon atoms of 323451 23 201234576 which may have a substituent of 5 decyl group, aryl group, filament or valence group, and is generally 1 to 60, preferably 3 to 48. Further, as a substituted fluorenyl series, a hydrazinyl group, a triethyl fluorenyl group, a tripropyl fluorenyl group, a triisopropyl fluorenyl group, an isopropyl dimethyl fluorenyl group, an isopropyl diethyl group.矽-'tert-butyl-methyl sylylene, pentyl dimethyl sylylene, hexyl dimethyl sylylene, heptyl fluorenyl fluorenyl, octyl dimethyl fluorenyl, 2-ethyl Hexyl dimethyl fluorenyl, fluorenyl dimethyl sylylene, fluorenyl dimethyl sylylene, 3,7 dimethyl octyl dimethyl sulphate, lauryl fluorenyl fluorenyl, (phenyl-Ci to Ci2 alkyl) fluorenyl, ((^ to c12 alkoxyphenyl-Cl to Cl2 alkyl) oxalate, (Ci to & phenyl phenyl to Cl2 alkyl) stone夕基, (1_naphthyl-Ci to C12 alkyl) oxazepine, (2-naphthyl-Ci to Cl2 alkyl) fluorenyl, (phenyl-4- to C1Z alkyl) dimethyl fluorenyl, Triphenyl sulphate, tris(yttrium xylyl) sulphate, trifoliate sylylene, diphenylmethyl sulphate, tert-butyl diphenyl fluorenyl, diheptyl phenyl fluorenyl, etc. The heart acts as a series of atomic atoms, such as: atom, gas, desert, and helium. 2 to 2 〇 'preferably 2 to 18. For:: soil series such as: ethyl hydrazino, propyl fluorenyl, T fluorenyl, isobutyl aryl, methyl, benzoic fluorenyl, trifluoroacetic acid Base, pentafluorobenzonitrile base, etc. 醯, the number of carbon atoms in the base - generally 2 to 2 (), most as a decyloxy series and lΑρ isobutyl brewing - ethoxylated 'oxyl', butyl The oxy group, the phenyl group, and the benzene group are represented by the ash group having the w: H_W chemistry of the structure t of the 丨 / _ _ _ 。 。 。 。 。 。 。 。 。 。 。 。 Amine compound system. 323451 24 201234576

列舉例如：醛亞胺、酮亞胺以及鍵結於醛亞胺中之氮原子 之氫原子經由絲、芳基、絲絲、絲縣和芳基快 基等而取代之化合物。亞胺殘基之碳原子數—般為2至 20，最好是2至18。作為亞胺殘基係列舉例如通式：_cr 〔N-Rm :如，）2(在化學式中，RN系表示氮原 子、烧基1芳基、芳纽基、芳基烯基或綠炔基，Rr# 獨立地表減基、芳基、芳餘基、芳基雜或芳基炔基， 仁疋在R存在2個之狀態下，2個之Rr係可以相互地 結合成為一體而形成環，來作為2價基、例如伸乙基、伸 丙基、伸丁基、伸戊基、伸己基等之碳原子數2至Μ之伸 院基。）所表示之基。作為亞胺殘基係列舉以下之基。For example, a compound in which an aldimine, a ketimine, and a hydrogen atom bonded to a nitrogen atom in an aldimine are substituted with a silk, an aryl group, a filament, a silk county, an aryl group or the like can be cited. The number of carbon atoms of the imine residue is generally from 2 to 20, preferably from 2 to 18. As a series of imine residues, for example, the formula: _cr [N-Rm: as,] 2 (in the chemical formula, RN represents a nitrogen atom, an alkyl 1 aryl group, an aryl ketone group, an arylalkenyl group or a chloroalkynyl group). Rr# independently reduces the base, aryl, aryl residue, aryl hetero or aryl alkynyl group, and in the state where R exists in two, two Rr systems can be combined with each other to form a ring. The base represented by the divalent group, for example, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, or the like, having a carbon number of 2 to Μ. The following groups are listed as a series of imine residues.

323451 25 201234576 (在化學式中，Me係表示曱基，在以下相同。） 醯胺基之碳原子數一般為1至20，最好是2至18。 作為醯胺基係列舉如：曱醯胺基、乙醯胺基、丙醯胺基、 丁醯胺基、苯曱醯胺基、三氟乙醯胺基、五氟苯甲醯胺基、 二甲醯胺基、二乙醯胺朞、二丙醯胺基、二丁醯胺基、二 苯甲醯胺基、雙（三氟p醯）胺基、雙（五氟苯曱醯）胺基等。 醯亞胺基係由醯亞胺除去鍵結於該氮原子之氫原子 後而得到之殘基，碳原子數一般為4至20,最好是4至18。323451 25 201234576 (In the chemical formula, Me represents a sulfhydryl group, which is the same below.) The hydrazine group has a carbon number of usually 1 to 20, preferably 2 to 18. As a series of guanamine groups, such as: guanamine, acetamido, acrylamide, butylammonium, benzoguanamine, trifluoroacetamido, pentafluorobenzamide, two Mercaptoamine, diethylamine, dipropylamine, dibutylammonium, benzoylamino, bis(trifluorop)amino, bis(pentafluorophenyl)amine Wait. The quinone imine group is a residue obtained by removing a hydrogen atom bonded to the nitrogen atom by a quinone imine, and the number of carbon atoms is usually 4 to 20, preferably 4 to 18.

作為醯亞胺基係列舉以下之基。 .The following are the bases of the quinone imine series. .

所謂1價之雜環基係指由雜環化合物除去1個氫原子 所殘留之原子團。在此，所謂雜環化合物係指在具有環狀 構造之有機化合物中，作為構成環之元素，不僅是碳原子， 26 323451 201234576 還包含氧原子、硫原子、氮原子、麟原子、獨原子、石夕原 子、硒原子、碲原子、砷原子等之異原子之有機化合物。\ 價之雜環基係可以具有取代基❶丨價之雜環基之碳原子數 一般為3至60，最好是3至2〇。此外，在1價之雜環基之 碳原子數令，並不包含取代基之碳原子數。作為此種1價 之雜環基係列舉例如：噻吩基、（^至Ci2烷基噻吩基、吡 咯基、呋喃基、吡啶基、^至Cl2烷基吡啶基、噠嗪基、 嘧啶基、吡嗪基、三嗪基、吡咯啶基、哌啶基、.喹啉基、 異噎琳基，其中，亦宜為㈣基、CdCi2絲嗔吩基、 吡啶基及C!至Cu烷基吡啶基。此外，作為丨價之雜環基 係最好是1價之芳香族雜環基。 i 作為取代羧基係指，羧基中之氫原子藉由烷基、芳 基、芳基烷基或1價雜環基而取代之基，也就是以化學式· -C(=0)0R*(在化學式中’ R*係烷基、芳基、芳基烷基^或 1仏雜環基。）所表示之基。取代叛基之碳原子數一般為2 • 至60，最好是2至48。前述烷基、芳基、芳基烷基或i 雜％基係可以具有取代基。此外，在前述碳原子數中， 並不包含如述烧基、芳基、芳基烧基或1價雜環基可具有 之取代基之碳原子數。作為取代竣基係列舉如：甲氧基幾 基、乙氧基幾基、丙氧基幾基、異丙氧基幾基、丁氧基幾 基、異丁氧基羰基、sec-丁氧基羰基、tert-丁氧基艘基、戊 氧基％基、己氧基裁基、環己氧基裁基、庚氧基幾基、辛 氧基幾基、2-乙基己氧基幾基、壬氧基幾基、癸氧基鼓基、 3,7-—曱基辛氧基緩基、月桂氧基幾基、三氟甲氧基数基、 323451 27 201234576 五氟乙氧基幾基、全氟丁氧基幾·基、全氟己氧基裁基、全 氟辛氧基羰基、苯氧基羰基、萘氧基羰基、。比啶氧基羰基 等。 在化學式（1)中，Y1 係表示-co2·、-S03·、-S〇2·、-P03_ 或-B(Ra)3_等之1價基，由離子性聚合物之酸性度之觀點來 看，Y1最好是-C02-、-S02·、-P03-，更加理想是-C02-，由 離子性聚合物之安定性之觀點來看，最好是-co2_、-so3_、 -S〇2·或-P03-〇 癱 ' 在化學式（1)中，Μ1係表示金屬陽離子或者是可以具 有取代基之銨陽離子。作為金屬陽離子係最好是1價、2 價或3價之離子，可列舉如：Li、Na、Κ、Cs、Be、Mg、 Ca、Ba、Ag、A1、Bi、Cu、Fe、Ga、Μη、Pb、Sn、Ti、 V、W、Y、Yb、Zn、Zr 等之離子，最好是 Li+、Na+、K+、 Cs+、Ag+、Mg2+、Ca2+。此外，作為銨離子可以具有之取 代基係列舉甲基、乙基、丙基、異丙基、丁基、異丁基、 φ tert-丁基等之碳原子數1至10之烷基' 在化學式（1)中，Z1 係表示 F_、Cl、Br_、r、OH-、RaSCV、 RaCO〇-、CIO·、C102-、C103-、C104·、SCN_、CN·、N03-、 S042-、HS04-、P043-、HP042-、H2P04-、BF4-或 PF6-。 在化學式（1)中，nl係表示0以上之整數，由原料單體 合成之觀點來看，最好是0至8之整數，更加理想是0至 2之整數。 在化學式（1)中，al係表示1以上之整數，bl係表示0 以上之整數。 28 323451 201234576 al及bl係使化學式（1)所表示之基之電荷成為〇的方 式而選擇。例如在 γΐ 為 _c〇2-、_斷、_s〇2_、_p〇d_B(Ra)3 且M1為1價之金屬陽離子或可以具有取代基之銨陽離子 且 Z1 為 F、Cl、Br-、Γ、oh·、Ras〇3.、Rac〇〇-、cl〇-、 C102、C103、Cl〇4·、SCN·、CN·、Ν03·、HSCV、Η2Ρ04-、 BF4或PF6之狀態下，使滿足ai = bi + i的方式而選擇。 在 Y1 為-C02-、-S03-、-SO：f、·ρ〇3-或_B(Ra)3-且 Μι 為 2 價 •之金屬陽離子且 z1 為 F_、Cr、Br-、r、〇H、RaS03-、RaC〇〇-、 cicr、cio2-、cio3-、cio4-、scn-、cn-、no3_、hso4-、 H2P〇4、BF4或PFg之狀態下，使滿足bl = 2xal-l的方式 而選擇。在 Y1 為-C02_、-SCV、-S02-、-P〇3-或-B(Ra)3-且 M1為3價之金屬陽離子且z1為F_、Cl·、Br·、Γ、〇Η·、The monovalent heterocyclic group means an atomic group remaining by removing one hydrogen atom from the heterocyclic compound. Here, the heterocyclic compound means that in the organic compound having a cyclic structure, as an element constituting the ring, not only a carbon atom, 26 323451 201234576 also contains an oxygen atom, a sulfur atom, a nitrogen atom, a lining atom, a single atom, An organic compound of a hetero atom such as a stone atom, a selenium atom, a helium atom or an arsenic atom. The heterocyclic group of the valence may have a carbon number of the heterocyclic group having a substituent valence of usually 3 to 60, preferably 3 to 2 Å. Further, the number of carbon atoms in the monovalent heterocyclic group does not include the number of carbon atoms of the substituent. As such a monovalent heterocyclic group, for example, thienyl, (^ to Ci2 alkylthiophenyl, pyrrolyl, furyl, pyridyl, ^ to Cl2 alkylpyridyl, pyridazinyl, pyrimidinyl, pyridyl a pyridyl group, a triazinyl group, a pyrrolidinyl group, a piperidinyl group, a quinolinyl group, an isoindolyl group, wherein, it is also preferably a (tetra)yl group, a CdCi2 silk fluorenyl group, a pyridyl group and a C! to Cu alkyl pyridyl group. Further, the heterocyclic group as the valence is preferably a monovalent aromatic heterocyclic group. i As the substituted carboxy group, the hydrogen atom in the carboxyl group is an alkyl group, an aryl group, an arylalkyl group or a monovalent group. The group substituted by a heterocyclic group is represented by the chemical formula -C(=0)0R* (in the formula 'R* is an alkyl group, an aryl group, an arylalkyl group or a 1 仏 heterocyclic group). The number of carbon atoms in place of the thiol group is generally from 2 to 60, preferably from 2 to 48. The aforementioned alkyl, aryl, arylalkyl or i-heteroyl group may have a substituent. The number of carbon atoms does not include the number of carbon atoms of the substituent which the alkyl group, the aryl group, the aryl group or the monovalent heterocyclic group may have. As a substituted fluorenyl group, a methoxy group , ethoxylated, propoxylated, isopropoxy, butoxy, isobutoxycarbonyl, sec-butoxycarbonyl, tert-butoxy, pentyloxy %, hexyloxy, cyclohexyloxy, heptyloxy, octyloxy, 2-ethylhexyloxy, decyloxy, anthracenyl, 3,7--nonyloctyloxy sulfhydryl, lauryloxy, trifluoromethoxy group, 323451 27 201234576 pentafluoroethoxy group, perfluorobutoxy group, perfluorohexyloxy Base, perfluorooctyloxycarbonyl, phenoxycarbonyl, naphthyloxycarbonyl, pyridyloxycarbonyl, etc. In the chemical formula (1), Y1 represents -co2·, -S03·, -S〇 The monovalent group of 2·, -P03_ or -B(Ra)3_, etc., from the viewpoint of the acidity of the ionic polymer, Y1 is preferably -C02-, -S02·, -P03-, more ideal Is -C02-, from the viewpoint of the stability of the ionic polymer, preferably -co2_, -so3_, -S〇2· or -P03-〇瘫' In the chemical formula (1), the Μ1 system represents a metal a cation or an ammonium cation which may have a substituent. As a metal cation system It is preferably a monovalent, divalent or trivalent ion, such as Li, Na, cesium, Cs, Be, Mg, Ca, Ba, Ag, A1, Bi, Cu, Fe, Ga, Μη, Pb, Sn The ions of Ti, V, W, Y, Yb, Zn, Zr, etc. are preferably Li+, Na+, K+, Cs+, Ag+, Mg2+, Ca2+. Further, as the ammonium ion, the substituent series may be a methyl group. Ethyl, propyl, isopropyl, butyl, isobutyl, φ tert-butyl, etc., an alkyl group having 1 to 10 carbon atoms. In the chemical formula (1), Z1 represents F_, Cl, Br_, r, OH-, RaSCV, RaCO〇-, CIO·, C102-, C103-, C104·, SCN_, CN·, N03-, S042-, HS04-, P043-, HP042-, H2P04-, BF4- or PF6 -. In the chemical formula (1), nl represents an integer of 0 or more, and is preferably an integer of 0 to 8, more preferably an integer of 0 to 2 from the viewpoint of synthesis of a raw material monomer. In the chemical formula (1), a1 represents an integer of 1 or more, and bl represents an integer of 0 or more. 28 323451 201234576 al and bl are selected in such a manner that the charge of the group represented by the chemical formula (1) is 〇. For example, γΐ is _c〇2-, _break, _s〇2_, _p〇d_B(Ra)3 and M1 is a monovalent metal cation or an ammonium cation which may have a substituent and Z1 is F, Cl, Br-, Γ, oh·, Ras〇3., Rac〇〇-, cl〇-, C102, C103, Cl〇4·, SCN·, CN·, Ν03·, HSCV, Η2Ρ04-, BF4 or PF6 Choose the way that satisfies ai = bi + i. Y1 is -C02-, -S03-, -SO:f, ·ρ〇3- or _B(Ra)3- and Μι is a metal cation of 2 valence and z1 is F_, Cr, Br-, r, 〇H, RaS03-, RaC〇〇-, cicr, cio2-, cio3-, cio4-, scn-, cn-, no3_, hso4-, H2P〇4, BF4 or PFg, so that bl = 2xal- is satisfied l choose the way. Y1 is -C02_, -SCV, -S02-, -P〇3- or -B(Ra)3- and M1 is a trivalent metal cation and z1 is F_, Cl·, Br·, Γ, 〇Η· ,

RaS03-、RaCOO·、C1CT、C102-、C103-、C1(V、SCN-、CN·、 N03_、HS04_、H2P04-、BF4·或 PF6-之狀態下，使滿足 bl =3xal-l 的方式而選擇。在 Y1 為_c〇2-、-S〇3·、-S02·、-P03-# 或-B(Ra)3_且M1為1價之金屬陽離子或者是可以具有取代 基之銨陽離子且Z1為S042-或ΚΗΡΟ,之狀態下，使滿足ai = 2xbl + 1的方式而選擇。即使是在表示ai和bl之關係 之前述任何一種數學式中，al最好是1至5之整數，更加 理想是1或2。RaS03-, RaCOO·, C1CT, C102-, C103-, C1 (V, SCN-, CN·, N03_, HS04_, H2P04-, BF4· or PF6-, so that bl = 3xal-l is satisfied Select. In Y1, _c〇2-, -S〇3·, -S02·, -P03-# or -B(Ra)3_ and M1 is a monovalent metal cation or an ammonium cation which may have a substituent And Z1 is S042- or ΚΗΡΟ, and is selected in such a manner that ai = 2xbl + 1 is satisfied. Even in any of the aforementioned mathematical expressions indicating the relationship between ai and bl, al is preferably an integer of 1 to 5. More ideally 1 or 2.

Ra係表示可以具有取代基之碳原子數1至30之烧基 或者是可以具有取代基之碳原子數6至50之芳基。作為這 些基可以具有之取代基係列舉與前述Q1之相關說明中所 例示之取代基為同樣之取代基。取代基存在有複數個之狀 29 323451 201234576 態下’存在複數個之取代基，可以㈣，也可以不同。作 為心系列舉如：甲基、乙基、丙基、異丙基、丁基、異丁 基、撕丁基、tert-丁基、戊基、己基、環己基、庚基、辛 基、壬基、癸基、月桂基等之碳原子數丄至2〇之烧基、笨 基、I-奈基、2-桌基'其、。 %、基、2-恩基、9-蒽基等之碳原子 數6至30之芳基等。 作為别述化學式⑴所表示之基係列舉例如以下之基。The Ra system represents an alkyl group having 1 to 30 carbon atoms which may have a substituent or an aryl group having 6 to 50 carbon atoms which may have a substituent. The substituents which these substituents may have are the same substituents as those exemplified in the description of the above Q1. There are a plurality of substituents in the form of 29 323451 201234576. There are a plurality of substituents, which may be (four) or different. As a series of hearts, such as: methyl, ethyl, propyl, isopropyl, butyl, isobutyl, butyl, tert-butyl, pentyl, hexyl, cyclohexyl, heptyl, octyl, fluorene The base, the thiol group, the lauryl group, etc. have a carbon atom number of 烧 to 2 烧 of a burnt group, a stupid base, an I-negyl group, and a 2-table base. An aryl group having 6 to 30 carbon atoms, such as a %, a group, a 2-enyl group, a 9-fluorenyl group or the like. The base series represented by the chemical formula (1) described above is, for example, the following group.

(CH2)3-CO〇-M+ —(CH2)4-C〇〇'M+ Π*Μ+ —…. … -COO.M+ —CH2-C00-M+ —(Ch2)2 一 c〇〇-M+ — _(CH2)5-CO〇M+ -(CH2)e-C0W —dcoo-ir 广C00-M+ —0—ch2-coom+ 0 (CH2)2-C00M+ —0-(CH2)3-C00M+ —o—(CH2)4-coair —〇-(CH2)5-CO〇-M+ -〇-(CH2)e-CO〇-M* ~〇-(CH2)7_c〇〇，m+ —〇-(CH2)8-CO〇-M+ —^^-C00M+ p〇〇'M* +M'〇〇C ^ 七 -s〇3-m^ ~ch2-s〇3^ -(ch2)2-s〇3-(CH^-SOoM* —(CH2)4-S03-M+ —(CH2)5-S03-m+ -(CH2)e-S〇3-M+ ~(ch2)7-so3-m+ -(CH2)e-so3-ir —0-CH2-S03M+ -〇-(CH2)2-S〇3-M* -0-(CH2)3-S0,-M+ —〇-(CH2)4-S03-M+ -〇-(CH2)s-S〇3-M+ —〇-(CH2)e-S03-M+ —0-(CH2)7-S〇3.M+ —〇-(ch2)8-so3-m+ ~〇-so3-m* so3m+ +MO3S M = U, Na, K, Cs, N(CH3)4 -化學式（2)所表示之基_ f化學式(2)中’作為Q2所表示之2價之有機基係列 舉與剛述Ql所麵之2叙有機基所獅者為同樣之基， 由原料單體合.成之容易度之觀點來看，最好是2價之飽和 323451 30 201234576 烴基、伸芳基、伸烷氧基。 /作為剐述Q2所表示之2價之有機基之例子來列舉之 基係可以具有取代基，作為該取代基係列舉與前述Ql之說 月中所例示之取代基為同樣之取代基。取代基存在有複數 個之狀態下’存在複數個之取代基，可以相同，也可以不 同。 在化予式(2)乍，γ2係表示陽碳離子、錢陽離子、膦陽 離子、毓陽離子或碘鏽陽離子。 作為陽碳離子係列舉例如_c+r2 (在化于式中’ R係互相獨立地表示烷基或芳基。）所表示 之基。 作為銨陽離子係列舉例如_n+r3 (在化予式中’ R係互相獨立地表示烷基或芳基所表示 之基。 作為膦陽離子係列舉例如_P+R3 (在化予式中’ r係互相獨立地表示烷基或芳基。）所表示 之基。 作為鏑陽離子係列舉例如 (在化學式中，R係亙相獨立地表示烷基或芳基。）所表示 之基。 作為硬鐵陽離子係列舉例如 (在化學式中，R係互相獨立地表示烷基或芳基。）所表示 之基。 在化學式⑺中，由原料單體合成之容易度以及原料單 31 323451 201234576 體和離子性聚合物對空氣、濕氣或熱之安定性之觀點來 看，Y2最好是陽碳離子、銨陽離子、膦陽離子、毓陽離子， 更加理想是銨陽離子。 在化學式（2)中，Z2係表示金屬陽離子或者是可以具有 取代基之銨陽離子。作為金屬陽離子最好是〗價、2價或3 價之離子，可列舉如：Li、Na、K、CS、Be、Mg、ea、Ba、(CH2)3-CO〇-M+ —(CH2)4-C〇〇'M+ Π*Μ+ —.... ...COO.M+ —CH2-C00-M+ —(Ch2)2 a c〇〇-M+ — _(CH2)5-CO〇M+ -(CH2)e-C0W —dcoo-ir 广C00-M+ —0—ch2-coom+ 0 (CH2)2-C00M+ —0-(CH2)3-C00M+ —o—( CH2)4-coair—〇-(CH2)5-CO〇-M+ -〇-(CH2)e-CO〇-M* ~〇-(CH2)7_c〇〇,m+—〇-(CH2)8-CO 〇-M+ —^^-C00M+ p〇〇'M* +M'〇〇C ^ 七-s〇3-m^ ~ch2-s〇3^ -(ch2)2-s〇3-(CH^- SOoM* —(CH2)4-S03-M+ —(CH2)5-S03-m+ -(CH2)eS〇3-M+ ~(ch2)7-so3-m+ -(CH2)e-so3-ir —0- CH2-S03M+ -〇-(CH2)2-S〇3-M* -0-(CH2)3-S0,-M+ —〇-(CH2)4-S03-M+ -〇-(CH2)sS〇3- M+ —〇-(CH2)e-S03-M+ —0-(CH2)7-S〇3.M+ —〇—(ch2)8-so3-m+ ~〇-so3-m* so3m+ +MO3S M = U, Na, K, Cs, N(CH3)4 - the base represented by the chemical formula (2) _ f In the chemical formula (2), the two-valent organic group represented by Q2 is the same as the two described in the Ql The base lion is the same base. From the point of view of the ease of raw material monomer formation, it is best to saturate the two-valent 323451 30 201234576 hydrocarbon group, aryl group, and alkoxy group. The base system exemplified as an example of the divalent organic group represented by Q2 may have a substituent, and the substituent series is the same as the substituent exemplified in the above-mentioned Ql. There are a plurality of substituents in a plurality of states, which may be the same or different. In the formula (2), the γ2 system represents a cation, a cation, a phosphine cation, a phosphonium cation or an iodine cation. As the cation series, for example, _c+r2 (in the formula where R is an alkyl group or an aryl group independently of each other) is used. As an ammonium cation series, for example, _n+r3 (in the case of In the formula, R represents a group represented by an alkyl group or an aryl group independently. Examples of the phosphine cation include _P+R3 (in the formula, 'r) independently means an alkyl group or an aryl group. The basis of the representation. The ruthenium cation series is, for example, a group represented by (in the chemical formula, the R system 独立 phase independently represents an alkyl group or an aryl group). The hard iron cation series is, for example, a group represented by (in the chemical formula, R is an alkyl group or an aryl group independently of each other). In the chemical formula (7), Y2 is preferably a cation of a carbon atom or an ammonium cation from the viewpoint of the ease of synthesis of a raw material monomer and the stability of the raw material sheet 31 323451 201234576 and the ionic polymer to air, moisture or heat. Further, a phosphine cation or a phosphonium cation is more preferably an ammonium cation. In the chemical formula (2), Z2 represents a metal cation or an ammonium cation which may have a substituent. The metal cation is preferably a valence, a divalent or a trivalent ion, and examples thereof include Li, Na, K, CS, Be, Mg, ea, and Ba.

Ag、A卜 Bi、Cu、Fe、Ga、Μη、Pb、Sn、Ti、v、w、γ、 ¥13、211、21"等之離子。此外，作為銨陽離子可以具有之取 •代基係列舉如：甲基、乙基、丙基、異丙基、丁基、異丁 基、tert·丁基等之碳原子數！至10之烷基。 在化學式(2)中’M2係表示F'Cl'Br-q'oH'R^CV、 R COO、CIO、C102、C103.、CIO4·、SCN.、CN_、NO3-、 so42-、hso4_、p〇43·、hpo42-、H2p〇4-、bf4-或 pf6-。 在化學式（2)中，π2係表示0以上之整數，最好是〇 . 至6之整數’更加理想是〇至2之整數。 • 在化學式中，a2係表示1以上之整數，b2係表示0 以上之整數。 a2及b2係使化學式(2)所表示之基之電荷成為〇的方 式而選擇。例如在 M2 為 F·、Cl、Br·、Γ、OH-、Rbs〇3-、Ag, A, Bi, Cu, Fe, Ga, Μη, Pb, Sn, Ti, v, w, γ, ¥13, 211, 21" Further, as the ammonium cation, there may be a series of carbon atoms such as methyl, ethyl, propyl, isopropyl, butyl, isobutyl, tert butyl, etc.! To 10 alkyl groups. In the chemical formula (2), 'M2 system means F'Cl'Br-q'oH'R^CV, R COO, CIO, C102, C103., CIO4·, SCN., CN_, NO3-, so42-, hso4_, P〇43·, hpo42-, H2p〇4-, bf4- or pf6-. In the chemical formula (2), π2 represents an integer of 0 or more, preferably 〇. The integer of 6 is more preferably an integer of 〇2. • In the chemical formula, a2 represents an integer of 1 or more, and b2 represents an integer of 0 or more. A2 and b2 are selected such that the charge of the group represented by the chemical formula (2) is 〇. For example, in M2, F·, Cl, Br·, Γ, OH-, Rbs〇3-,

RbCOO、CIO-、C102-、C1CV、C104-、SCN·、CN·、N03-、 HSO4、财〇4_、bi?4·或呢-之狀態下，如果z2為i價之 金屬離子或者是可以具有取代基之銨離子，則使滿足= b2+l的方式而選擇，如果Z2為2價之金屬離子，則使滿 足a2 = 2xb2+l的方式而選擇，如果Z2為3價之金屬離 323451 32 201234576 子’則使滿足a2 = 3xb2+l的方式而選擇。在Μ2為S042-、 HP〇42·之狀態下，如果Z2為1價之金屬離子或者是可以具 有取代基之銨離子，則使滿足b2 = 2xa2-l的方式而選擇， 如果Z為3價之金屬離子，則使滿足2xa2= 3xb2+ 1之關 係而選擇。即使是在表示a2和 b2之關係之前述任何一種 數學式中’ a2最好是1至3之整數，更加理想是1或2。In the state of RbCOO, CIO-, C102-, C1CV, C104-, SCN·, CN·, N03-, HSO4, 〇4_, bi?4 or --, if z2 is the metal ion of i price or it can be The ammonium ion having a substituent is selected so as to satisfy = b2+l. If Z2 is a divalent metal ion, it is selected such that a2 = 2xb2+l is satisfied, and if Z2 is a trivalent metal, 323451 32 201234576 Sub' then chooses to satisfy a2 = 3xb2+l. In the state where Μ2 is S042- and HP〇42·, if Z2 is a monovalent metal ion or an ammonium ion which may have a substituent, it is selected so as to satisfy b2 = 2xa2-l, and if Z is 3 valence The metal ions are selected so as to satisfy the relationship of 2xa2 = 3xb2+1. Even in any of the aforementioned mathematical expressions indicating the relationship between a2 and b2, 'a2 is preferably an integer of 1 to 3, more preferably 1 or 2.

Rb係表示可以具有取代基之碳原子數1至30之烷基 或者是可以具有取代基之碳原子數6至50之芳基。作為這 上基可以具有之取代基係列舉與前述Qi之相關說明中所 例不之取代基為同樣之取代基。取代基存在有複數個之狀 心、下存在複數個之取代基，可以相同，也可以不同。作 為^係列舉如：甲基、乙基、丙基、異丙基、丁基、異丁 ^ _丁基、tert_丁基、戊基、己基、環己基、庚基、辛 基六基月桂基等之碳原子數i至2〇之烧基、苯 ^广萘基' 萘基、、2_:i基、9_蒽基等之碳原子 數6至30之芳基等。 作為前述化學式⑺所表示之基係列舉例如以下之基。 323451 33 201234576 —NMe2Et*X —CH2_NMe2EfX. —(CHdfNMqEfV —(CH2>3-NMe2Et+X- —(CH2)4-NMe2Et+X· —(ΟΗ2)δ-ΝΜβ2Ε<*χ· —(CH2)6-NMe2EfX· —(CH^-關 β2ΕΛΓ —(〇Η2)8-ΝΜβ2εΐ*χ- —〇_ςΗ2_ΝΜβ2Εί·»χ- — 〇-(CH2)2-NMe2Et*X· — 〇-(CH2)3~NMe2Et+X- —〇—(CH2)4_NMe2EfX- —〇-<CH2)5-NMe2EfX- —〇-(〇Η2)β-ΝΜβ2Εί"Χ· —〇-(CH2)7-NMe2En<· —〇~(〇Η2)8-ΝΜβ2ΕΛΓ NMe2EfX·Rb represents an alkyl group having 1 to 30 carbon atoms which may have a substituent or an aryl group having 6 to 50 carbon atoms which may have a substituent. The substituents which the above-mentioned substituents may have are the same substituents as those exemplified in the above description of Qi. The substituent has a plurality of states, and a plurality of substituents are present under the plural, and may be the same or different. As ^ series, such as: methyl, ethyl, propyl, isopropyl, butyl, isobutyl _ butyl, tert butyl, pentyl, hexyl, cyclohexyl, heptyl, octyl hexyl laurel An alkyl group having a carbon number of from 2 to 2, an alkyl group having a carbon number of from 6 to 30, such as a phenyl group, a phenylene group, a naphthyl group, a 2::i group or a 9-fluorenyl group. The base series represented by the above chemical formula (7) is exemplified by the following. 323451 33 201234576 —NMe2Et*X —CH2_NMe2EfX. —(CHdfNMqEfV —(CH2>3-NMe2Et+X-—(CH2)4-NMe2Et+X·—(ΟΗ2)δ-ΝΜβ2Ε<*χ· —(CH2)6- NMe2EfX·—(CH^-OFFβ2ΕΛΓ—(〇Η2)8-ΝΜβ2εΐ*χ-——〇_ςΗ2_ΝΜβ2Εί·»χ-——〇-(CH2)2-NMe2Et*X· — 〇-(CH2)3~NMe2Et+ X--〇-(CH2)4_NMe2EfX--〇-<CH2)5-NMe2EfX--〇-(〇Η2)β-ΝΜβ2Εί"Χ·——〇-(CH2)7-NMe2En<·-〇~(〇 Η2)8-ΝΜβ2ΕΛΓ NMe2EfX·

—<^-NMe2Et+X- _NHMe2+x· —CH2-NHMe2+X—(CH2)2-NHMe2+X· _(CH2>3-NHMe2+X- — (CH2)4-NHMe2+X- —(CH2)5-NHMe2+X· —(CHjJe-NHMe^* —(CH^-NHMej^- —(CH^-NHMe/X·—<^-NMe2Et+X- _NHMe2+x·—CH2-NHMe2+X—(CH2)2-NHMe2+X· _(CH2>3-NHMe2+X- — (CH2)4-NHMe2+X- — (CH2)5-NHMe2+X·—(CHjJe-NHMe^*—(CH^-NHMej^-—(CH^-NHMe/X·

一〇—C H2~N HM e2+X* —〇—(CH2)2-NHMe24X· —〇—(CH2)3—NHMe2+X' —O—iCH^-NHMe/X· —〇-(CH2)s-NEfe+X· —〇-(CH2)e-NEt3+X- -〇-(CH2)7-NHMe2+X--〇-(CH2)8-NHMe2+X·一〇—C H2~N HM e2+X* —〇—(CH2)2-NHMe24X·—〇—(CH2)3—NHMe2+X′—O—iCH^-NHMe/X·—〇—(CH2) s-NEfe+X·—〇-(CH2)e-NEt3+X- -〇-(CH2)7-NHMe2+X--〇-(CH2)8-NHMe2+X·

NHMe2^* -X+Me2HN —NB$+X· —CH2-NE13+X· —(CH2)2-NEt3+X· —(CH2)3-NE1a+X· —(CHjU-NEta·^· —(CH^e-NEts^X- —(CH2)e-NEt,+X- —(CH^-NEI^X· _(CH2)8-NE%+X· —〇-CH2-NEt^X-—〇-(CH2)6-NEt3+X' —〇—(CH2)2-NEl3+X· —〇-(CH2)3-NEl3+X- —〇—(CH2)4-NE%+X' -〇-(CH2)e-NEVX- —〇-(CH^e-NE^+X· —〇-(CH2)7-NEt3*X- NEts+X· ·χ·*1ί3Ν -0-NEVX-NHMe2^* -X+Me2HN —NB$+X· —CH2-NE13+X· —(CH2)2-NEt3+X· —(CH2)3-NE1a+X· —(CHjU-NEta·^·—( CH^e-NEts^X- —(CH2)e-NEt,+X- —(CH^-NEI^X· _(CH2)8-NE%+X·—〇-CH2-NEt^X-—〇 -(CH2)6-NEt3+X' -〇-(CH2)2-NEl3+X·-〇-(CH2)3-NEl3+X-——〇—(CH2)4-NE%+X' -〇- (CH2)e-NEVX--〇-(CH^e-NE^+X·-〇-(CH2)7-NEt3*X- NEts+X· ·χ·*1ί3Ν -0-NEVX-

MeMe

Et = CH2〇H3 X = F, Cl. Br, I, BPh4, CH3COO, CF3S〇3, 34 323451 201234576 一NHEt2+x· —CH2-NHEt2+X· — (CH2)2-NHEt2+X· —(CH2)3-NHEt2+X· —(CHA-NHEh+X· —(CH2)5-NHEt24X· —(CH2)e-NHEt2+X- —(CH2)7-NHEt2+X· _(CH2>8-NHEt2+X· _〇_CH2_NHEt2-^- 一 〇-(CH2h-NHEt2+X- —〇-(CH2)3-NHEt2+X· —O—(CH2)4_NHEt2+X- —O - (CH2)5 - NH Et2+X- —〇 - (CH2)6 -N HEt2+X- 一 〇-(CH2)7-NHEt2+X- —〇-(CH2)8-NHEt2"X-Et = CH2〇H3 X = F, Cl. Br, I, BPh4, CH3COO, CF3S〇3, 34 323451 201234576 A NHEt2+x·—CH2-NHEt2+X· — (CH2)2-NHEt2+X· —( CH2)3-NHEt2+X·—(CHA-NHEh+X·—(CH2)5-NHEt24X·—(CH2)e-NHEt2+X-—(CH2)7-NHEt2+X· _(CH2>8- NHEt2+X· _〇_CH2_NHEt2-^- 〇-(CH2h-NHEt2+X--〇-(CH2)3-NHEt2+X·—O—(CH2)4_NHEt2+X-—O - (CH2)5 - NH Et2+X--〇-(CH2)6 -N HEt2+X- mono-(CH2)7-NHEt2+X--〇-(CH2)8-NHEt2"X-

NHEt2+X_ ·Χ"*Β —^^-NHEt2+X-—NEtPh2·^* —CH2-NEtPh2+X· —(CH2}2-NEtPh2+X- —(CH2)3-NEtPh2+X· _(CHak-NEtPhA· —(CH2)5—NEtPh2+X* —(CH2>6 -NEtPh2+X· 一(CH^-NEtR^+X* 一(O^Je-NEtPh^·NHEt2+X_ ·Χ"*Β—^^-NHEt2+X-—NEtPh2·^* —CH2-NEtPh2+X· —(CH2}2-NEtPh2+X- —(CH2)3-NEtPh2+X· _( CHak-NEtPhA·—(CH2)5—NEtPh2+X* —(CH2>6 -NEtPh2+X· one (CH^-NEtR^+X* one (O^Je-NEtPh^·

—O—CH2-NEtPh2+X- —O -(CH2)2-N EtPh2+X' 一 0_(<»2)3 一NEtPh2+X· 一O — (CH2)4-NEtPh2+X· —O-iCH^-NEtPhj^X· —〇_(CH2)e-NEtPh2+X" 一〇-(CH2)7-NEtPh2+X--O-iCh^s-NEtH^·^·—O—CH2-NEtPh2+X-—O -(CH2)2-N EtPh2+X'-0_(<»2)3 A NEtPh2+X·一O — (CH2)4-NEtPh2+X·—O -iCH^-NEtPhj^X· —〇_(CH2)e-NEtPh2+X" 一〇-(CH2)7-NEtPh2+X--O-iCh^s-NEtH^·^·

NEtPI^4^NEtPI^4^

X+Ph2EtN 一NHPha^X* —CH2-NHPh2+X' ~(CH2)2-NHPh2+X· —(CH2)3-NHPh2+X- 一(CH2)4-NHPh24X-—(CH2)5-NHPh2+X- ·—{CH2)e-NHPh2+X- 一<CH2>7-NHPh2+X·. —(CH2)8~NHPh2*X· —〇-CH2-NHPh2+X- —0—(CH2)2-NHPh2+X· 一 O —(CH2>3-NHPh2+X· — 0—(CH2)4-NHPh2+X- ~〇~(CH2)s-NHPh2+x--〇-{CH2)e-NHPh2+X. —0-(CH2)7-NHPh2+X- —。一 (CH2)8-NHPh2"X·X+Ph2EtN-NHPha^X*—CH2-NHPh2+X' ~(CH2)2-NHPh2+X·—(CH2)3-NHPh2+X-(CH2)4-NHPh24X-—(CH2)5-NHPh2 +X- ·—{CH2)e-NHPh2+X-一<CH2>7-NHPh2+X·. —(CH2)8~NHPh2*X·—〇-CH2-NHPh2+X-—0—(CH2 )2-NHPh2+X·一O—(CH2>3-NHPh2+X·—0—(CH2)4-NHPh2+X-~〇~(CH2)s-NHPh2+x--〇-{CH2)e -NHPh2+X. —0-(CH2)7-NHPh2+X-. One (CH2)8-NHPh2"X·

NHPh2^X· -X^PhjHNNHPh2^X· -X^PhjHN

-Q>NHPh2^X- -Q ^ = CH2CH3 Ph = C6H5 X = F, Cl. Br, I. BPh4, CH3CO〇, CF3S03, •化學式（3)所表示之基· 在化學式(3)中’作為Q3所表示之2價之有機基係列 舉與前述Q1所表示之2價之有機基所例示者為同樣之 基’由原料單體合成之容易度之觀點來看，最好是2價之 飽和烴基、伸芳基、伸烷氧基。 35 323451 201234576 作為別述Q所表示之2價之有機基之例所列舉之基 係可以具有取代基，作為該取代基係列舉與前述Q!之相關 說财所㈣之取代基為_之取代基。取代基存在有複 數個之狀態下，存在複數個之取代基，可以相同，也可以 不同。 作為前述Q3所表示之2價之有機基最好是仰2)_所 表示之基。-Q>NHPh2^X- -Q ^ = CH2CH3 Ph = C6H5 X = F, Cl. Br, I. BPh4, CH3CO〇, CF3S03, • The base represented by the chemical formula (3) · In the chemical formula (3) The two-valent organic group represented by Q3 is the same as the one shown in the above-mentioned Q1, and is preferably the same as the base of the above-mentioned Q1. From the viewpoint of easiness of synthesis of the raw material monomer, it is preferable to saturate the two-valent Hydrocarbyl, aryl, alkoxy. 35 323451 201234576 The base system exemplified as the divalent organic group represented by Q may have a substituent, and as the substituent series, the substituent of the above-mentioned Q! base. When a plurality of substituents exist in a plurality of states, a plurality of substituents may be present, which may be the same or different. The divalent organic group represented by the above Q3 is preferably a group represented by 2).

113係表示〇以上之整數，最好是❹至如之整數，更 加理想是0至8之整數。 在化學式(3)中，Y3係表示謂或者是化學式(4)至化 學式（12)中之任一者所表示之基。 在化學式(4)至化學式⑽中，作為R，所表示之2價之 烴基係列舉如：亞甲基、伸乙基、1’2_伸丙基、以伸丙基、The 113 series represents an integer above 〇, preferably ❹ to an integer such as 0, and more preferably an integer of 0 to 8. In the chemical formula (3), Y3 represents a group represented by any one of Chemical Formula (4) to Chemical Formula (12). In the chemical formula (4) to the chemical formula (10), as the R, the divalent hydrocarbon group represented by the formula: methylene, ethyl, 1'2-propyl, propyl,

1，2-伸丁基、伸丁基、M•伸了基、π伸戊基、μ-伸 己基1,9伸壬基、ι，12_伸十二碳基經取代基取代這些基 中之至少1個氫原子之基等之可以具有取代基之碳原子數 1至50之2價之飽和烴基；伸乙職、伸⑽基、3·伸丁 婦基、2·伸丁烯基、2·伸戊烯基、伸己缔基、2·伸壬婦基、 2-伸十二烯基經取代基取代這些基中之至少丨個氫原子之 基等之可以具有取代基之韻子數2至5()之亞縣以及包 含伸乙块基之可以具有取代基之碳原子數2至50之2價之 不飽和煙基；伸環丙基、伸環了基、伸環絲、伸環己基、 伸環伸壬基、伸環十二碳基、伸降絲、伸金賊基經取 代基取代這些基中之至少⑽氫原子之基等之可以具有取 201234576 代基之碳原子數3至50之2價之環狀飽和烴基；-伸笨 基、M-伸苯基、i，4-伸萘基、1，5_伸萘基、2,6_伸萘基、 聯苯基-4,4’-二醯基經取代基取代這些基中之至少丨個氫 原子之基等之可以具有取代棊之礙原子數6至50之伸芳 基，亞甲氧基、伸乙氧基、伸丙氧基、伸丁氧基、伸戊氧 基、伸己氧基經取代基取代這些基中之至少1個氫原子之 基等之可以具有取代基之碳原子數1至50之伸烷氧基。 鲁 作為前述取代基係列舉與前述Q1之相關說明中所例 不之取代基為同樣之取代基。取代基存在有複數個之狀態 下’存在複數個之取代基，可以相同，也可以不同。 在化學式(4)至化學式（12)中，作為R”所表示之1價之 烴基係列舉如：申基、乙基、丙基、異丙基、丁基、異丁 基、sec-丁基、tert_ 丁基、戊基、己基、環己基、庚基、辛 基、壬基、癸基、月桂基經取代基取代這些基中之至少[ 個氫原子之基等之可以具有取代基之碳原子數1至2〇之貌 •基；苯基、丨-萘基、2-萘基、1-蒽基、2-蒽基、9-蒽基經取 代基取代這些基中之至少丨個氫原子之基等之可以具有取 代基之碳原子數6至30之芳基等。由離子性聚。舍物之溶解 性之觀點來看，最好是甲基、乙基、苯基、〗_萘基、2_萘 基。作為前述取代基係列舉與前述q1之相關說明中所例示 之取代基為同樣之取代基。取代基存在有複數個之狀態 下，存在複數個之取代基，可以相同，也可以不同。 在化學式（5) _，作為R，，，所表示之3價之烴基係列舉 如·甲烷三基、乙烷三基、12,3-丙烷三基、ι，2,4-丁烷三 37 323451 201234576 基、1，2,5-戊烧三基、1，3,5-戊烷三基、ls2,6-己烷三基、1，3,6- 己烷三基經取代基取代這些基中之至少丨個氫原子之基等 之可以具有取代基之碳原子數1至2〇之燒基三基；i，2,3-苯三基、1，2,4-苯三基、ι，3,5-苯三基經取代基取代這些基 中之至少1個氫原子之基等之可以具有取代基之碳原子數 6至30之芳基。由離子性聚合物之溶解性之觀點來看，最 好是f烧三基、乙烷三基、苯三基、^^苯三基。 作為前述取代基係列舉與前述Ql之相關說明中所例示之 取代基為同樣之取代基。取代基存在有複數個之狀態下， 存在複數個之取代基，可以相同，也可以不同。 在化學式(4)至化學式（12)中，由離子性聚合物之溶解 1"生之觀點來看，rc最好是曱基、乙基、苯基、1_萘基、2_ 萘基。 ' :在化學式(4)及化學式（5)中’ a3係表示1以上之整數， 最好是3至1〇之整數。在化學式至化學式（12)中，g 二表示〇以上之整數。在化學式（6)中，a4係最好是〇至 =之整數，更加理想是3至20之整數。在化學式（7)至化 干式（10)中，a4係最好是〇至1〇之整數，更加理想是〇 至5之整數。在化學式（11)中，a4係最好是〇至之整數， 更加理想是3至2G之整數。在化學式（12)中，&4係最好是 0至20之整數，更加理想是〇至ίο之整數。 a由原料單體合成之容易度之觀點來看，作為Y3係最好 、化學式(4)所表示之基、化學式（6)所表示之基、化 學式（10)所表示之基、化學式（11)所表示之基，更加理想是1,2-butylene, butyl, M•extension, π-exylpentyl, μ-extension hexyl 1,9 thiol, ι,12_extended dodecacarbonyl substituted by these substituents a saturated hydrocarbon group having a carbon atom number of 1 to 50 which may have a substituent, such as a group of at least one hydrogen atom, etc.; a stretching group, a stretching group, a stretching group, a stretching group, and a butene group. 2. a pentenyl group, a hexanyl group, a stilbene group, a 2-terpene group, a substituent of at least one of the hydrogen atoms in the group, and the like may have a substituent. a sub-county of 2 to 5 () and an unsaturated tobacco group having a carbon atom number of 2 to 50 which may have a substituent, and a ring-like propyl group, a ring-extension group, a ring-forming wire, The cyclohexylene group, the exfoliating ring, the exfoliating ring, the dodecyl group, the exfoliating wire, and the exfoliating group may be substituted with at least one of the (10) hydrogen atoms of the group, etc., and may have a carbon atom of the 201234576 alkenyl group. a cyclic saturated hydrocarbon group having a valence of from 3 to 50; a stabilizing group, an M-phenylene group, an i,4-naphthyl group, a 1,5-anthranyl group, a 2,6-thylene group, a biphenyl group a group of 4,4'-diindolyl groups substituted by a substituent a group having less than one hydrogen atom or the like may have an extended aryl group having an atomic number of 6 to 50, a methyleneoxy group, an ethoxylated group, a propenyloxy group, a butyloxy group, a pentyloxy group, or the like. The hexyloxy group is substituted with a substituent such as a group of at least one hydrogen atom of these groups, and the alkylene group having 1 to 50 carbon atoms which may have a substituent. As the substituent series, the substituents exemplified in the description of the above Q1 are the same substituents. When a plurality of substituents exist in a plurality of states, a plurality of substituents may be present, and they may be the same or different. In the chemical formula (4) to the chemical formula (12), the monovalent hydrocarbon group represented by R" is as follows: a base group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a sec-butyl group. , tert_butyl, pentyl, hexyl, cyclohexyl, heptyl, octyl, decyl, decyl, lauryl substituted by at least one of these groups, such as a hydrogen atom group or the like, which may have a substituent Atomic number of 1 to 2 Å; base; phenyl, fluorenyl-naphthyl, 2-naphthyl, 1-indenyl, 2-indenyl, 9-fluorenyl substituted at least one of these groups by a substituent An aryl group having 6 to 30 carbon atoms which may have a substituent, etc., etc. From the viewpoint of solubility of the ionic polyglycol, it is preferably a methyl group, an ethyl group, a phenyl group, or a _ a naphthyl group and a 2-naphthyl group. The substituents exemplified in the description of the above q1 are the same substituents as the substituent series. When a plurality of substituents are present, a plurality of substituents may be present. The same or different. In the chemical formula (5) _, as R,,, the three-valent hydrocarbon group represented by methane triyl, ethane tri , 12,3-propane triyl, iota, 2,4-butane three 37 323451 201234576 base, 1,2,5-pentane triyl, 1,3,5-pentanetriyl, ls2,6-hexyl The alkylene group and the 1,3,6-hexanetriyl group are substituted with a substituent such as at least one hydrogen atom of these groups, and the like, and the alkyl group having 1 to 2 carbon atoms which may have a substituent; , 2,3-benzenetriyl, 1,2,4-benzenetriyl, iota, 3,5-benzenetriyl may be substituted with a substituent such as a group of at least one of the hydrogen atoms; The aryl group having 6 to 30 carbon atoms. From the viewpoint of solubility of the ionic polymer, it is preferably a trisyl group, an ethane triyl group, a benzenetriyl group or a benzenetrienyl group. The substituents exemplified in the above description of Q1 are the same substituents. When a plurality of substituents are present, a plurality of substituents may be present, which may be the same or different. In the chemical formula (4) to In the chemical formula (12), rc is preferably a mercapto group, an ethyl group, a phenyl group, a 1-naphthyl group or a 2-naphthyl group from the viewpoint of dissolution of the ionic polymer 1'. In the chemical formula (4) And the chemical formula (5) 'a3 series An integer of 1 or more is preferably an integer of 3 to 1. In the chemical formula (12), g 2 represents an integer above 〇. In the chemical formula (6), the a4 is preferably an integer of 〇 to = More preferably, it is an integer of 3 to 20. In the chemical formula (7) to the dry type (10), the a4 is preferably an integer of 〇 to 1 ,, more preferably an integer of 〇 to 5. In the chemical formula (11) The a4 is preferably an integer of 〇, and more preferably an integer of 3 to 2 G. In the chemical formula (12), the & 4 is preferably an integer of 0 to 20, more preferably an integer of ί to ίο. a is the group represented by the chemical formula (4), the group represented by the chemical formula (6), the group represented by the chemical formula (10), and the chemical formula (11), from the viewpoint of the easiness of the synthesis of the raw material monomer. ) is more ideal than

3S 323451 201234576 化學式(4)所表示之基、化學式（6)所表示之基、化學式（11) 所表示之基，特別最好是以下之基。 —〇iCH2CH2〇)2Me 0-(CH2CH2〇)3Me ——〇-(CH2CH^))4Me —OiCHaCHPfeMe —0-(CH2CH2〇)6Me :.—CKCH2CH2P)7Me3S 323451 201234576 The group represented by the chemical formula (4), the group represented by the chemical formula (6), and the group represented by the chemical formula (11) are particularly preferably the following groups. —〇iCH2CH2〇)2Me 0-(CH2CH2〇)3Me ——〇-(CH2CH^))4Me—OiCHaCHPfeMe —0-(CH2CH2〇)6Me :.—CKCH2CH2P)7Me

——〇iCH2CH2P)2H 一一0«(CH2CHP)3H ——0-(CH2CH2〇)4H——〇iCH2CH2P)2H 一一0«(CH2CHP)3H ——0-(CH2CH2〇)4H

——〇iCH2CHp)5H 一CHO^CHpfeH ——〇iCH2CH20)7H——〇iCH2CHp)5H A CHO^CHpfeH ——〇iCH2CH20)7H

〇 —C—〇iCH2CH2〇)2Me 4—0-(CH2CHp)5Me 一〇-<CH 2CH p —〇iCH2CH2p)sH 一*C—0-<CH2CH2〇)3Me ~~ϋ—0-<CH2CH20)eMe 0 -cmch2ch2o〉3h〇—C—〇iCH2CH2〇)2Me 4—0-(CH2CHp)5Me 〇-<CH 2CH p —〇iCH2CH2p)sH a*C—0-<CH2CH2〇)3Me ~~ϋ—0-< CH2CH20)eMe 0 -cmch2ch2o>3h

J一 〇iCH2CH20)6H 0 —C**—〇-(ΟΗ2〇Η2〇)4ΜθJ 〇iCH2CH20)6H 0 —C**—〇-(ΟΗ2〇Η2〇)4Μθ

OjCHaCH 2〇 e ΟOjCHaCH 2〇 e Ο

—〇-{CH2CH2〇)4H o —〇"(ΟΗ2〇Η2Ρ)7Η -離子性聚合物中之構造單位_—〇-{CH2CH2〇)4H o —〇"(ΟΗ2〇Η2Ρ)7Η - Construction unit in ionic polymer_

使用於本發明之離子性聚合物係最好是具有前述化學 式（13)所表示之構造單位、前述化學式（15)所表示之構造單 位、前述化學式（17)所表示之構造單位、前述化學式（20) 所表示之構造單位，更加理想是在全構造單位中真有15莫 耳％至1GG莫耳％之前述構造單位之離子性聚合物。 •化學式（U)所表示之構造單位’ ^在化學式（13)中，Rl係包含化學式（14)所表示之基之1 價基，Ar1係表示可以具有r1以外之取代基之(2 + n4)價之 方香族广4係表示1以上之整數。 予弋（14)所表示之基係可以直接地鍵結於Ar1，或透 過：亞曱基、伸7 I ,, 土、伸丙基、伸丁基、伸戊基、伸己基、 39 323451 201234576 伸壬基、伸+ - # MU ^ 帽丙基、伸環了基、伸環戊基、 伸環己基、伸㈣基、伸料二碳基 =::取代這些基中之至少―π 伸乙基、氧；丙：原子數1至Μ之伸燒基;氧亞甲基、氧 氧伸丁基、氧伸戊基、氧伸己基、氧 戊氧ί二碳基、環伸丙氧基、環伸丁氧基、環伸 土衣中己氧基、環伸壬氧基、環伸十二碳氧基、仲 ，氧基'伸金鋼燒氧基經取代基取代這些基中之=少i 個風原子之基等之可以具有取代基之碳原子數之氧 伸烧,τ以具有取代基之亞胺基；可以具有取代基之亞 、/、有取代基之伸乙烯基；伸乙炔基；可以具有 取代基之甲燒二基；氧原子、氮原子、硫原子等之異原子 而與Ar1。 ' /前述Ar1係可以具有Rl以外之取代基。作為該取代基 係歹择與月’j述Ql之相關說明中所例示之取代基為同樣之 -取代基。農述眾代基存_在友複數傭名惠應h存在複數個 之取代基，可以相同，也可以不同。 由原料單體合成之容易度之觀點來看，作為前述Arl •具有之Rl以外之取代基最好是燒基、烧氧基、芳基、芳氧 基、羧基或取代鲮基。 在化學式（13)中，n4係表示1以上之整數，最好是1 至4之整數，更加理想是1至3之整數。 作為藉由化學式(13)中之Al>1所表示之(2 + n4)價之芳 香族基係列舉如：（2 + n4)價之芳香族煙基、（2 + n4)價之芳 323451 40 201234576 香族雜環基，最好是僅由碳原子或者是碳原子和由氫原 子、氮原子及氧原子而組成之群組中選出之1個以上之原 子所組成之(2 + n4)價之芳香族基。作為該(2 + n4)價之芳香 族基係列舉如：由苯環、°比啶環、1，2-二嗪環、1，3-二嗪環、 1，4-二嘻環、1，3,5-三.嘻環、吱喃環、α比咯環、°比°坐環、〇米 唑環、噁唑環、吖二唑環等單環式芳香環除去（2 +η4)個氫 原子之(2 + n4)價基；由縮合該單環式芳香環而組成之群組 中選出之2個以上之環之縮合多環式芳香環除去(2 + n4) 個氫原子之(2 +n4)價基；由藉著單鍵、伸乙烯基或伸乙炔 基而連結由該單環式芳香環和該縮合多環式芳香環所組成 之群組中選出之2個以上之芳香環組成之芳香環集合而除 去(2 +n4)個氳原子之(2 +n4)價基；由具有藉著亞甲基、伸 乙基、羰基等之2價基而交聯該縮合多環式芳香環或該芳 香環集合之相鄰接之2個芳香環之交聯之交聯多環式芳香 環除去(2 + n4)個氫原子之(2 + n4)價基等。 作為單環式芳香環係列舉例如以下之環。The ionic polymer to be used in the present invention preferably has a structural unit represented by the above chemical formula (13), a structural unit represented by the above chemical formula (15), a structural unit represented by the above chemical formula (17), and the above chemical formula ( 20) The structural unit represented is more preferably an ionic polymer having 15 mol% to 1 GG mol% of the above structural unit in the entire structural unit. • The structural unit represented by the chemical formula (U) ' In the chemical formula (13), R1 is a valent group containing a group represented by the chemical formula (14), and Ar1 is a substituent having a substituent other than r1 (2 + n4) The price of the square incense broad 4 indicates an integer of 1 or more. The base system represented by 弋(14) can be directly bonded to Ar1, or through: sulfhydryl, phenylene, propyl, butyl, butyl, hexyl, 39 323451 201234576 Stretching base, stretching + - # MU ^ cap propyl, stretching ring, stretching cyclopentyl, stretching cyclohexyl, stretching (tetra), stretching two carbon base =:: replacing at least π of these bases Base, oxygen; C: atomic number 1 to oxime stretching group; oxymethylene, oxybutylene butyl, oxopentyl, oxyhexyl, oxypentaoxy, cyclopropoxy, Cyclooxyl, cyclohexene, hexyloxy, cyclodecyloxy, sec-, oxy-extended gold alkoxy substituted by substituents a group of the atoms of the wind atom, etc., which may have a carbon atom number of the substituent, and an anthracene group having a substituent; a sub-group having a substituent, a substituted vinyl group; a acetylene group; a group; a methyl group which may have a substituent; a hetero atom such as an oxygen atom, a nitrogen atom or a sulfur atom, and Ar1. '/ The aforementioned Ar1 system may have a substituent other than R1. As the substituent, the substituent exemplified in the description relating to Q1 of the month 'j is the same - substituent. The basics of the farmer's account of the _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ From the viewpoint of the easiness of synthesis of the raw material monomers, the substituent other than R1 as the above Arl is preferably an alkyl group, an alkoxy group, an aryl group, an aryloxy group, a carboxyl group or a substituted fluorenyl group. In the chemical formula (13), n4 represents an integer of 1 or more, preferably an integer of 1 to 4, more preferably an integer of 1 to 3. The series of aromatic groups represented by the (2 + n4) valence represented by Al> in the chemical formula (13) are as follows: (2 + n4) valence aromatic smog group, (2 + n4) valence fang 323451 40 201234576 Aromatic heterocyclic group, preferably composed of only one or more atoms selected from the group consisting of a carbon atom or a carbon atom and a group consisting of a hydrogen atom, a nitrogen atom and an oxygen atom (2 + n4) The aromatic base of the price. The aromatic group of the (2 + n4) valence is as follows: a benzene ring, a pyridine ring, a 1,2-diazine ring, a 1,3-diazine ring, a 1,4-dioxane ring, and 1 , 3,5-three. anthracene ring, anthracene ring, alpha specific ring, ° ratio ring, carbazole ring, oxazole ring, oxadiazole ring and other monocyclic aromatic ring removal (2 + η4) a (2 + n4) valence group of one hydrogen atom; a condensed polycyclic aromatic ring selected from two or more rings selected from the group consisting of condensed monocyclic aromatic rings to remove (2 + n4) hydrogen atoms (2 + n4) valent group; two or more selected from the group consisting of the monocyclic aromatic ring and the condensed polycyclic aromatic ring by a single bond, a vinyl group or an ethynyl group The aromatic ring composed of an aromatic ring is assembled to remove (2 + n4) valence atoms of (2 + n4) valence; and the condensation is carried out by crosslinking with a divalent group such as a methylene group, an ethyl group, a carbonyl group or the like. The cyclic aromatic ring or the crosslinked polycyclic aromatic ring of the adjacent two aromatic rings of the aromatic ring set removes (2 + n4) valence groups of (2 + n4) hydrogen atoms and the like. As a single ring type aromatic ring series, for example, the following ring.

作為縮合多環式芳香環係列舉例如以下之環。 41 323451 201234576As a series of condensed polycyclic aromatic rings, for example, the following rings are mentioned. 41 323451 201234576

α—ο ο—ο Μ Μ 作為交聯多環式芳香環係列舉例如以下之環。 42 323451 201234576—-ο ο-ο Μ Μ As a series of cross-linked polycyclic aromatic rings, for example, the following rings. 42 323451 201234576

42 作為前述(2 + n4)價之芳香族基，由原料單體合成之 易度之觀點來看，最好是由化學式i至化學式Μ、化越 式26至化學式29、化學式37至化學式39或化學式^ 表不之核除去(2 + η4)個氫原子之基’更加理想是由化學 1至化學心、化學式8、化學式13、料式26、化學式 27、化學式37或化學式41所表示之環除去(2 +⑷個氫> 子之基，I至最好是由化學式1、化學式37或化學式41 所表示之環除去(2 + η4)個氫原子之基。 在化干式（14)中，作為r2所表示之(l + ml + m2)價之 有機基係列舉例如：甲基、乙基、丙基、異丙基、丁基、 異丁基、sec-丁基、tert_丁基、戊基、己基、環己基、庚基、 辛基、壬基、癸基、月桂基經取代基取代這些基中之至少 1個氫原子之基等之可以具有取代基之碳原子數1至2〇之 燒基除去(ml+m2)個氫原子之基；苯基、1-萘基、2-萘基、 1-蒽基、2-蒽基、9·蒽基經取代基取代這些基甲之至少1 43 323451 201234576 個氫原子之基等之可以具有取代基之碳原子數6至3〇之芳 基除去+ 個氫原子之基；甲氧基、乙氧基、丙氧基、 I氧基、戊氧基、己氧基、壬氧基、月桂氧基、環丙氧基、 環^氧基、環戊氧基、環己氧基、環壬氧基、環月桂氧基、 降莰氧基、金鋼烷氧基經取代基取代這些基中之至少j個 氫原子之基等之可以具有取代基之碳原子數丨至5〇之烧氧 基除去(ml + m2)個氫原子之基；由具有包含碳原子之取代 鲁基之胺基除去(ml + m2)個氫原子之基；由具有包含碳原子 之取代基之矽基除去（ml+ m2)個氫原子之基，由原料單體 合成之容易度之觀點來看，最好是由烷基除去(ml + m2) 個氫原子之基、由芳基除去（ml+ m2)個氫原子之基、由烷 氧基除去(ml + m2)個氫原子之基。 作為前述取代基係列舉與前述Q1之相關說明中所例 示之取代基為同樣之取代基。前述取代基存在有複數個之 狀態下’存在複數個之取代基，可以相同，也可以不同。 # •化學式（I5)所表示之構造單位 在化學式（15)中，R3係包含化學式（16)所表示之基之1 價基，Ar2係表示可以具有R3以外之取代基之(2+ n5)價之 芳香族基，n5係表示1以上之整數。 化學式（16)所表示之基係可以直接地鍵結於Ar2,或透 過：亞曱基、伸乙基、伸丙基、伸丁基、伸戊基、伸己基、 伸壬基、伸十二碳基、伸環丙基、伸環丁基、伸環戊基、 伸環己基、伸環壬基、伸環十二碳基、伸降莰基、伸金鋼 烷基經取代基取代這些基中之至少1個氫原子之基等之可 44 323451 201234576 以具有取代基之礙原子數1至50之伸院基；氧亞曱基、氧 伸乙基、氧伸丙基、氧伸丁基、氧伸戊基、氧伸己基、氧 伸壬基、氧伸十二碳基、環伸丙氧基、環伸丁氧基、環伸 戊氧基、環伸己氧基、環伸壬氧基、環伸十二碳氧基、伸 降莰氧基、伸金鋼烷氧基經取代基取代這些基中之至少i 個氫原子之基等之可以具有取代基之碳原子數1至5〇之氧 伸烷基；可以具有取代基之亞胺基；可以具有取代基之亞 鲁矽基；可以具有取代基之伸乙烯基；伸乙炔基；可以具有 取代基之曱燒三基；氧原子、氮原子、硫原子等之異原子 而與Ar2鍵結。 前述Ar2係可以具有R3以外之取代基。作為該取代基 係列舉與前述Q1之相關說明中所例示之取代基為同樣之 取代基。前述取代基存在有複數個之狀態下，存在複數個 之取代基，可以相同，也可以不同。 由原料單體合成之容易度之觀點來看，作為前述 • 具有之r3以外之取代基係最好是烷基、烷氧基、芳基、芳 氧基、竣基或取代敌基。 在化學式（15)中，n5係表示1以上之整數，最好是i 至4之整數，更加理想是丨·至3之整數。 作為化學式（15)中之Ar2所表示之(2+n5)價之芳香族 基係列舉(2 + Π5)價之芳香族烴基、（2 + n5)價之芳香族雜環 基，最好是僅由碳原子或者是碳原子和由氫原子、氮原子 及氧原子而組成之群組中選出之1個以上之原子所組成之 (2 + n5)價之芳香族基。作為該(2 + n5)價之芳香族基係列舉： 323451 45 201234576 由苯環、吼啶環、1，2-二嗪環、1，3-二嗪環、1，4-二嗪環、 1，3,5-三嗪環、°夫喃環、。比洛環、°比峻環、味。坐環、σ惡唾環、 吖二唑環等單環式芳香環除去(2 + η 5 )個氫原子之(2 + η 5 ) 價基；由該單環式芳香環組成之群組中選出之2個以上之 環經縮合之縮合多環式芳香環除去（2 + η 5 )個氫原子之(2 + η5)價基；藉著單鍵、伸乙烯基或伸乙炔基連結該單環式 芳香環和該縮合多環式芳香環組成之群組中選出之2個以 上之芳香環所組成之芳香環集合除去（2 + η5)個氫原子之 (2 + η5)價基；由具有藉著亞曱基、伸乙基、羰基等之2價 基與該縮合多環式芳香環或該芳香環集合之相鄰接之2個 芳香環交聯之交聯多環式芳香環除去（2 +·η5)個氫原子之 (2 + η5)價基等。. 作為單環式芳香環係列舉化學式（13)所表示之構造單 位之相關說明中所例示之化學式1至化學式12所表示之 環。 作為縮合多環式芳香環係列舉化學式（13)所表示之構 造單位之相關說明中所例示之化學式13至化學式27所表 示之環。 作為芳香環集合係列舉化學式（13)所表示之構造單位 之相關說明中所例示之化學式28至化學式36所表示之環。 作為交聯多環式芳香環係列舉化學式（13)所表示之構 造單位之相關說明中所例示之化學式37至化學式44所表 示之環。 作為前述(2 + η5)價之芳香族基，由原料單體合成之容 46 323451 201234576 易度之觀點來看，最好是由化學式丨至化學式14、化學式 26至=學式29、化學式37至化學式39或化學式41所表 示之環除去(2 + n5)個氫原子之基，更加理想是由化學式1 至化學式6、化學式8、化學式13、化學式26、化學式27、 化予式37或化學式41所表示之環除去(2 + n5)個氫原子之 基，甚至最好是由化學式1、化學式37或化學式41所表 示之％：除去(2 +n5)個氫原子之基。 在化學式（16)中，m3及m4係分別獨立地表示i以上 之整數。 在化學式（16)中，作為R4所表示之(1 + 1113 + 1114)價之 有機基係列舉例如：曱基、乙基、丙基、異丙基、丁基、 異丁基、sec-丁基、tert_丁基、戊基、己基、環己基、庚基、 辛基、壬基、癸基、月桂基經取代基取代這些基中之至少 1個氫原子之基等之可以具有取代基之碳原子數1至2〇之 烷基除去(m3+ m4)個氫原子之基；苯基、萘基、2_萘基、 1-蒽基、2-蒽基、9-蒽基經取代基取代這些基中之至少i 個氫原子之基等之可以具有取代基之碳原子數6至3〇之芳 基除去(m3 + m4)個氫原子之基；甲氧基、乙氧基、丙氧基、 丁氧基、戊氧基、己氧基、壬氧基、月桂氧基、環丙氧基、 環丁氧基、環戊氧基、環己氧基、環壬氧基、環月桂氧基、 降4氧基、金鋼炫氧基經取代基取代這些基申之至少1個 氫原子之基等之可以具有取代基之碳原子數^至5〇之烷氧 基除去(m3 + m4)個氫原子之基；由具有包含碳原子之取代 基之胺基除去(m3+ m4)個氫原子之基；由具有包含碳原子 47 323451 201234576 之取代基之石夕基除去（m3 + m4)個氫原子之基，由原料單體 合成之容易度之觀點來看，最好是由烷基除去(m3 + m4) 個氫原子之基、由芳基除去（m3 + m4)個氫原子之基、由烧 氧基除去(m3 + m4)個氫原子之基。42. The aromatic group of the (2 + n4) valence is preferably from the chemical formula i to the chemical formula, the chemical formula 26 to the chemical formula 29, and the chemical formula 37 to the chemical formula 39 from the viewpoint of the ease of synthesis of the raw material monomers. Or the chemical formula ^ represents the core removal of (2 + η4) hydrogen atom groups, more preferably from the chemical 1 to the chemical core, the chemical formula 8, the chemical formula 13, the formula 26, the chemical formula 27, the chemical formula 37 or the chemical formula 41 The ring is removed by (2 + (4) hydrogen > substituents, and I is preferably a group of (2 + η 4) hydrogen atoms removed by a ring represented by Chemical Formula 1, Chemical Formula 37 or Chemical Formula 41. In the case of the organic group of (l + ml + m2) valence represented by r2, for example, methyl, ethyl, propyl, isopropyl, butyl, isobutyl, sec-butyl, tert_ a butyl group, a pentyl group, a hexyl group, a cyclohexyl group, a heptyl group, an octyl group, a decyl group, a fluorenyl group, a lauric group, a substituted group, a group of at least one hydrogen atom of these groups, and the like, and the number of carbon atoms which may have a substituent a base of 1 to 2 Torr removes (ml + m 2 ) hydrogen atoms; phenyl, 1-naphthyl, 2-naphthyl, 1-indenyl, 2-indenyl, 9-decyl The substituent replaces at least 1 43 323451 of 201234576 hydrogen atom groups, etc. The aryl group having 6 to 3 carbon atoms which may have a substituent may have a base of + hydrogen atom; methoxy group, ethoxy group, Propoxy, Ioxy, pentyloxy, hexyloxy, decyloxy, lauryloxy, cyclopropoxy, cyclooxy, cyclopentyloxy, cyclohexyloxy, cyclodecyloxy, ring a lauryloxy group, a decyloxy group, a gold alkoxy group, a group of at least j hydrogen atoms of these groups substituted with a substituent, etc., which may have a substituent having a carbon atom number of 丨 to 5 烧, alkoxy removal (ml) + m2) a group of hydrogen atoms; a group of (ml + m 2 ) hydrogen atoms removed from an amine group having a substituted thio group containing a carbon atom; and (m + m 2 ) removed by a thiol group having a substituent containing a carbon atom The basis of the hydrogen atom is preferably a group in which (ml + m 2 ) hydrogen atoms are removed from the alkyl group, and (ml + m 2 ) hydrogen atoms are removed from the aryl group from the viewpoint of easiness of synthesis of the raw material monomers. The group of (ml + m2) hydrogen atoms is removed from the alkoxy group. The substituents exemplified in the description of the above Q1 as the above substituent series are The same substituent may be present in a plurality of states in which a plurality of substituents are present, and may be the same or different. # • The structural unit represented by the chemical formula (I5) is in the chemical formula (15), and the R3 system The valent group of the group represented by the formula (16), the Ar2 group represents an aromatic group having a (2+n5) valence which may have a substituent other than R3, and the n5 represents an integer of 1 or more. The formula (16) represents The base system can be directly bonded to Ar2, or through: anthracene, exoethyl, propyl, butyl, pentyl, hexyl, thiol, decyl, exocyclic a base, a cyclopentene butyl group, a cyclopentylene group, a cyclohexylene group, a cyclodextylene group, a fluorenyl group, a fluorenyl group, a hydrazine group, and a gold alkyl group substituted with at least one of these groups by a substituent Atom base, etc. 44 323451 201234576 A substituent having a substituent of 1 to 50 atomic number; an oxyalkylene group, an oxygen extended ethyl group, an oxygen extended propyl group, an oxygen extended butyl group, an oxopentyl group, Oxygen-extension hexyl group, oxygen-extension sulfhydryl group, oxygen-extended dodecacarbyl group, cyclo-propoxy group, cyclo-butoxy group, cyclopentyloxy group, ring a hexyloxy group, a cyclopentenyloxy group, a cyclododecaoxy group, a pendant decyloxy group, a metal alkoxy group of a gold-strength steel, or a substituent of at least one hydrogen atom of these groups may be substituted with a substituent, etc. An oxygen-extended alkyl group having 1 to 5 carbon atoms; an imido group which may have a substituent; a arylene group which may have a substituent; a vinyl group which may have a substituent; an exetylene group; may have a substitution The base is triazole-bonded; an oxygen atom, a nitrogen atom, a sulfur atom or the like is bonded to Ar2. The Ar2 system may have a substituent other than R3. The substituents exemplified in the description of the above Q1 are the same substituents as the substituent series. In the case where a plurality of the substituents are present, a plurality of substituents may be present, and they may be the same or different. From the viewpoint of easiness of synthesis of the raw material monomers, the substituent other than r3 which is the above is preferably an alkyl group, an alkoxy group, an aryl group, an aryloxy group, a fluorenyl group or a substituted group. In the chemical formula (15), n5 represents an integer of 1 or more, preferably an integer of i to 4, and more preferably an integer of 丨·3. The (2+n5)-valent aromatic group represented by Ar2 in the chemical formula (15) is preferably a (2 + Π5)-valent aromatic hydrocarbon group or a (2 + n5)-valent aromatic heterocyclic group. An aromatic group having a (2 + n5) valence consisting of only one carbon atom or a carbon atom and one or more selected from the group consisting of a hydrogen atom, a nitrogen atom and an oxygen atom. As the (2 + n5) valence of the aromatic group, 323451 45 201234576 consists of a benzene ring, an acridine ring, a 1,2-diazine ring, a 1,3-diazine ring, a 1,4-diazine ring, 1,3,5-triazine ring, °v ring,. Bilo ring, ° than the ring, taste. a monocyclic aromatic ring such as a ring, a sigma ring, or an oxadiazole ring to remove (2 + η 5 ) valence groups of (2 + η 5 ) hydrogen atoms; a group consisting of the monocyclic aromatic rings The condensed polycyclic aromatic ring of two or more selected rings is used to remove (2 + η 5 ) valence groups of (2 + η 5 ) hydrogen atoms; the single bond is bonded by a single bond, a vinyl group or an ethynyl group. a group of aromatic rings composed of two or more aromatic rings selected from the group consisting of a cyclic aromatic ring and the condensed polycyclic aromatic ring; (2 + η5) valent groups of (2 + η5) hydrogen atoms; a crosslinked polycyclic aromatic ring having a bivalent group bonded via an anthracene group, an ethyl group, a carbonyl group or the like and a condensed polycyclic aromatic ring or two adjacent aromatic rings of the aromatic ring group (2 +·η5) (2 + η5) valence groups of hydrogen atoms, and the like. The ring represented by Chemical Formula 1 to Chemical Formula 12 exemplified in the description of the structural unit represented by the chemical formula (13) as the monocyclic aromatic ring series. The ring represented by Chemical Formula 13 to Chemical Formula 27 exemplified in the description of the structural unit represented by Chemical Formula (13) is a series of condensed polycyclic aromatic rings. The ring represented by Chemical Formula 28 to Chemical Formula 36 exemplified in the description of the structural unit represented by Chemical Formula (13) is a series of aromatic ring collections. The ring represented by Chemical Formula 37 to Chemical Formula 44 exemplified in the description of the structural unit represented by Chemical Formula (13) is a series of crosslinked polycyclic aromatic rings. The aromatic radical of the (2 + η5) valence is preferably from the chemical formula 丨 to the chemical formula 14, the chemical formula 26 to the formula 29, the chemical formula 37 from the viewpoint of the capacity of the raw material monomer synthesis 46 323451 201234576. The ring represented by the chemical formula 39 or the chemical formula 41 removes (2 + n5) hydrogen atoms, and more preferably from the chemical formula 1 to the chemical formula 6, the chemical formula 8, the chemical formula 13, the chemical formula 26, the chemical formula 27, the chemical formula 37 or the chemical formula The ring represented by 41 removes (2 + n5) hydrogen atom groups, and is even more preferably represented by the chemical formula 1, the chemical formula 37 or the chemical formula 41: the group of (2 + n5) hydrogen atoms is removed. In the chemical formula (16), m3 and m4 each independently represent an integer of i or more. In the chemical formula (16), the organic group of (1 + 1113 + 1114) valence represented by R4 is, for example, a mercapto group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, or a sec-butyl group. a group such as a base, a tert-butyl group, a pentyl group, a hexyl group, a cyclohexyl group, a heptyl group, an octyl group, a decyl group, a decyl group, a lauryl group, or a substituent substituted by at least one of these groups may have a substituent. The alkyl group having 1 to 2 carbon atoms has a group of (m3+m4) hydrogen atoms; a phenyl group, a naphthyl group, a 2-naphthyl group, a 1-fluorenyl group, a 2-fluorenyl group, and a 9-fluorenyl group-substituted group. An aryl group having 6 to 3 Å carbon atoms which may have a substituent and substituted with at least one hydrogen atom of these groups, etc., a group of (m3 + m4) hydrogen atoms; methoxy group, ethoxy group, propyl group Oxy, butoxy, pentyloxy, hexyloxy, decyloxy, lauryloxy, cyclopropoxy, cyclobutoxy, cyclopentyloxy, cyclohexyloxy, cyclodecyloxy, cyclolauric An alkoxy group having a number of carbon atoms of from 2 to 5 Å, which may have a substituent, such as a group of at least one hydrogen atom, such as a substituent of a oxy group, a decyloxy group, or a decyloxy group. M4) hydrogen atom a group of (m3+m4) hydrogen atoms removed from an amine group having a substituent containing a carbon atom; (m3 + m4) hydrogen atoms are removed from a group having a substituent containing a carbon atom of 47 323451 201234576 From the viewpoint of easiness of synthesis of the raw material monomers, it is preferred to remove (m3 + m4) hydrogen atoms from the alkyl group, remove (m3 + m4) hydrogen atoms from the aryl group, and burn The oxy group removes (m3 + m4) groups of hydrogen atoms.

作為前述取代基係列舉與前述Q1之相關說明中所例 示之取代基為同樣之取代基。前述取代基存在有複數個之 狀態下，存在複數個之取代基，可以相同，也可以不同。 •化學式（17)所表示之構造單位 在化學式（17)中，R5係包含化學式（18)所表示之基之丄 饧基，R係包含化學式（19)所表示之基之1價基，Ar3係表 不可以具有R5及R6以外之取代基之(2 + n6 + n7)價之芳香 族基，n6及n7係分別獨立地表示丨以上之整數。 化學式（18)所表示之基以及化學式⑽所表示之基係 可以直接地鍵結於Ar3，或透過：亞甲基、伸乙基、伸丙 基、伸丁基、伸戊基、伸己基、伸壬基、伸十二碳基、伸 ，丙基^申環丁基、伸環戊基、伸環己基、伸環壬基、伸 環十二碳基、伸降祕、伸金舰基經取代絲代這些基 中之至）1個氫原子之基等之可以具有取代基之碳原子數 1至50之伸烧基；氧亞甲基、氧伸乙基、氧伸丙基、氧伸 1基、氧伸己基、氧伸壬基、氧伸十二碳基、 ^衣丙氧基伸3衣丁氧基、伸環戊氧基、伸環己氧基、伸 環壬氧基、伸環十二碳輪、伸耗減、伸金鋼燒氧基 經取代基取代這些基中之至少1個氫原子之基等之可以且 有取代基之碳原子數之氧伸絲；可以 基 323451 48 201234576 之亞胺基；可以具有取代基之亞矽基；可以具有取代基之 伸乙烯基；伸乙炔基；可以具有取代基之甲烷三基；氧原 子、氮原子、硫原子等之異原子而與Ar3鍵結。 前述Ar3係可以具有R5及R6以外之取代基。作為該 取代基係’與前述φ之相關說明中所例示之取代基為 同樣之取代基。前述取代基存在有複數個之狀態下，存在 複數個之取代基，可以相同，也可以不同。As the substituent series, the substituents exemplified in the description of the above Q1 are the same substituents. In the case where a plurality of the substituents are present, a plurality of substituents may be present, which may be the same or different. • The structural unit represented by the chemical formula (17) is in the chemical formula (17), R 5 is a fluorenyl group containing a group represented by the chemical formula (18), and R is a monovalent group including a group represented by the chemical formula (19), and Ar 3 is contained. The base table may not have an aromatic group of (2 + n6 + n7) valence of a substituent other than R5 and R6, and n6 and n7 each independently represent an integer of 丨 or more. The group represented by the formula (18) and the group represented by the formula (10) may be directly bonded to Ar3, or may be transmitted through: methylene, ethyl, propyl, butyl, pentyl, hexyl, Stretching base, stretching twelve carbon base, stretching, propyl ring, butyl ring, pentylene group, cyclohexyl group, fluorene ring, fluorene ring, twelve carbon base, extension and extension, extension of the gold ship base a mercapto group having 1 to 50 carbon atoms which may have a substituent; or an oxymethylene group, an oxygen-extended ethyl group, an oxygen-extended propyl group, or an oxygen-extension group; 1 group, oxygen-extension hexyl group, oxygen-extension sulfhydryl group, oxygen-extended dodecacarbyl group, propylene-propoxy group, 3-butoxy group, cyclopentyloxy group, cyclohexyloxy group, cyclo-decyloxy group, stretching ring The twelve carbon wheel, the extensional depletion, the exfoliation of the gold-alloy, the substituent of at least one of the hydrogen atoms by a substituent, etc., and the oxygen-extension of the carbon atom having a substituent; and the base 323451 48 An imido group of 201234576; an anthracene group which may have a substituent; a vinyl group which may have a substituent; an exetylene group; a methane triyl group which may have a substituent; A hetero atom such as a nitrogen atom or a sulfur atom is bonded to Ar3. The Ar3 system may have a substituent other than R5 and R6. The substituents exemplified in the description relating to the above-mentioned φ are the same substituents. In the case where a plurality of the substituents are present, a plurality of substituents may be present, and they may be the same or different.

由原料單體合成之容易度之觀點來看，作為前述Ar3 具有之R5及R4外之取代基係最好是院基、烧氧基、芳 基、芳氧基、羧基或取代羧基。 在化千式（17)中，n6係表示1以上之整數，最好是 至4之整數，更加理想是丨至3之整數。 在化學式（Π)中’ η7係表示i以上之整數，最好是 至4之整數，更加理想是丨至3之整數。From the viewpoint of easiness of synthesis of the raw material monomers, the substituents other than R5 and R4 of the above Ar3 are preferably a group, an alkoxy group, an aryl group, an aryloxy group, a carboxyl group or a substituted carboxyl group. In the formula (17), n6 represents an integer of 1 or more, preferably an integer of 4, more preferably an integer of 丨3. In the chemical formula (Π), η7 represents an integer of i or more, preferably an integer of 4, more preferably an integer of 丨3.

^為化學式（17)中之Ar3所表示之(2 + n6 + n7)價之; =族基係列舉(2 + n6 + n7)價之芳香族烴 MW =^香族雜環基，最好是僅由碳原子或者是碳原子和 及氧原子而組成之群組中選出之1個以 -===:價:::族基。作為， 環^二怜认二嗪環^厂謂'1’2。 啐⑽译 , 衣天南娘、吡咯環、吡唑稽 芳㈣除去(2+心職原 選出之2偏jTi 卿蚊料1 倾成之群組 出之仙上之壤之縮合多環式芳香環除去(2 + n6 + n 323451 49 201234576 個氳原子之(2 + n6 + n7)價基；由藉著單鍵、伸乙烯基或伸 乙炔基而連結由該單環式芳香環和該縮合多環式芳香環所 組成之群組中選出之2個以上之芳香環組成之芳香環集合 =除去（2 + n6 + n7)個氫原子之(2 + n6 + n7)價基；由具有藉 著亞曱基、伸乙基、羰基等之2價基而交聯該縮合多環式 芳香環或該芳香環集合之相鄰接之2個芳香環之交聯多環 式芳香％除去(2 + n6 + n7)個氫原子之(2 + n6 + n7)價基等。 φ 作為單環式芳香環係列舉例如在化學式（13)所表示之 構造單位之相關說明中所例示之化學式1至化學式5、化 學式7至化學式1〇所表示之環。 作為縮合多環式芳香環係列舉例如在化學式（13)所表 示之構造單位之相關說明中所例示之化學式13至化學式 27所表示之環。 作為芳香環集合係列舉例如在化學式（13)所表示之構 造單位之相關說明中所例示之化學式28至化學式36所表 # 示之環。 作為父聯多環式芳香環係列舉例如在化學式（13)所表 不之構造單位之相關說明中所例示之化學式37至化學式 44所表示之環。 作為前述(2 +n6 + n7)價之芳香族基，由原料單體合成 之容易度之觀點來看’最好是由化學式1至化學式5、化 學式7至化學式1〇、化學式13、化學式〗4、化學式26至 化學式29、化學式37至化學式39或化學式41所表示之 缞除去（2 + n6 + n7)個氫原子之基，更加理想是由化學式 50 323451 201234576 1、化學式37或化學式41所表示之環除去（2 + n6 + n7)個 氫原子之基，甚至最好是由化學式i、化學式38或化學式 42所表示之環除去(2 + n6 + n7)個氫原子之基。 在化學式（18)中，R7係表示單鍵或（1 + m5)價之有機 基’最好是（l + m5)價之有機基。 茬化學式（18)中’作為R7所表示之（1 + m5)價之有機 基係列舉例如：甲基、乙基、丙基、異丙基、丁基、異丁 φ基、SeC•丁基、tert_丁基、戊基、己基、環己基、庚基、辛 基壬基.、癸基、月桂基經取代基取代這些基中之至少1 個氫原子之基等之可以具有取代基之碳原子數丨至20之烷 基除去m5個氫原子之基；苯基、丨_萘基、2_萘基、i•蒽基、 2-蒽基、9-蒽基經取代基取代這些基中之至少i個氫原子 之基等之可以具有取代基之碳原子數6至3〇之芳基除去 m5個氫原子之基；曱氧基、乙氧基、丙氧基、丁氧基、戊 氧基、己氧基、壬氧基、月桂氧基、環丙氧基、環丁氧基、 ♦環戊氧基、環己氧基、環壬氧基、環月桂氧基、降茨氧基、 金鋼烷氧基經取代基取代這些基中之至少丨個氫原子之基 等之可以具有取代基之碳原子數丨至5〇之烷氧基除去瓜5 個氫原子之基；由具有包含碳原子之取代基之胺基除去m5 個氫原子之基；由具有包含碳原子之取代基之矽基除去以5 個氫原子之基，由原料單體合成之容易度之觀點來看，最 好是由烷基除去m5個氫原子之基、由芳基除去m5個氫原 子之基、由炫氧基除去個氫原子之基。 作為前述取代基係列舉與前述Q〗之相關說明中所例 323451 51 201234576 不之取絲為同狀取储。前料代歸在有複數個之 狀癌下’存在複數個之取代基，可以相同，也可以不同。 f化學式⑽中，m5係表示以上之整數。但是，在 R為單鍵時’ m5係表示1。 在化子式（I9)中，R8係表示單鍵或（1 +响價之有機 基’最好是（l + m6)價之有機基。 在化學式（19)中，作為以所表示之(1 + m6)價之有機 鲁基係列舉例如：曱基、乙基、丙基、異丙基、丁基、異丁 基、sec_丁基、tert_丁基、戊基、己基、環己基庚基二辛 基、壬基、癸基、月桂基經取代基取代這些基中之至少1 個氫原子之基等之可以具有取代基之碳原子數！至2〇之烷 基除去m6個氫原子之基；苯基、丨_萘基、2_萘基、丨蒽基、 2-蒽基、9·蒽基經取代基取代這些基中之至少丨個氫原子 之基專之可以具有取代基之碳原子數6至3〇之芳基除去 m6個氫原子之基；甲氧基、乙氧基、丙氧基、丁氧基、戊 • 氧基、己氧基、壬氧基、月桂氧基、環丙氧基、環丁氧基、 環戊氧基、環己氧基、環壬氧基、環月桂氧基、降莰氧基、 金鋼燒氧基經取代基取代這些基中之至少1個氫原子之基 等之可以具有取代基之碳原子數1至50之烷氧基除去m6 個氫原子之基；由具有包含碳原子之取代基之胺基除去m6 .個氣原子之基；由具有包含碳原子之取代基之石夕基除去m6 個氫原子之基，由原料單體合成之容易度之觀點來看，最 好是由烧基除去m6個氫原子之基、由芳基除去m6個氫原 子之基、由烷氧基除去m6個氫原子之基。 323451 52 201234576 作為前述取代基侧舉與前述Q1之相關說明卞所例 示，取代基為同樣之取代基。前述取代基存在有複數個之 狀態下’存在複數個之取代基，可以相同，也可以不同。 在化學式（19)中，m6係表示丨以上之整數。但是，在 R為早鍵時’ m6係表示1。 •化學式(20)所表示之構造單位 在化學式(20)中，R9係包含化學式(21)所表示之基之i 仏基’ R係包含化學式㈣所表示之基之i價基，係 表示可以具有R9及R、外之取代基之(2 + n8 + n9)價之芳 香族基’ n8及n9係分別獨立地表示〖以上之整數。 、化學式(21)所表示之基以及化學式(22)所表示之基係 可以直接地鍵結於Ar4，或透過：亞甲基、伸乙基、伸丙 伸丁基、伸戊基、伸己基、伸壬基、伸十二碳基、伸 :丙基、伸壤丁基、伸環戊基、伸環己基、伸環壬基、伸 衣十一妷基、伸降莰基、伸金鋼烷基經取代基取代這些基 中之至V1個氫原子之基等之可以具有取代基之碳原子數 1至50之伸燒基；氧亞甲基、氧伸乙基、氧伸丙基、氧伸 丁^f伸戊基、氧伸己基、氧伸壬基、氧伸十二碳基、 ^衣丙氧基、伸環丁氧基、伸環戊氧基、伸環己氧基、伸 ^氧基伸嶮十二碳氧基、伸降莰氧基、伸金鋼烷氧基 ^取代基取代這些基中之至少1個氫原子之基等之可以具 取1基之石反原子數1至50之氧伸烧基；可以具有取代基 亞胺基，可以具有取代基之亞⑨基；可以具有取代基之 乙烯基’伸乙炔基；可以具有取代基之曱烷三基；氧原 53 323451 201234576 子、^原子、硫原子等之異原子而與Ar4鍵結。 μ 1述ArI係可以具有以及Rl。以外之取代基。作為該 =基係列舉與^ Q1之相關說财·示之取代基為 :’之取代基則述取代基存在有複數個之狀態下，存在 複數個之取代基，可以相同，也可以不同。 由原，單體^成之容易度之觀點來看，作為前述Μ ^ Μ外之取代基係最好是絲、絲基、芳 基、芳氧基、羧基或取代羧基。 在化學式(20)中，η8係表示i以上之整數最好是工 至4之整數，更加理想是1至3之整數。 在化予式(20)中，n9係表示i以上之整數，最好是工 至4之整數，更加理想是1至3之整數^ 作為化學式(20)中之Αγ4所表示之(2 + n8 + n9)價之芳 香族基係列舉如：（2 + n8 + n9)價之料族烴基、（2 + n8 + ^賈之料姉環基，最料㈣碳原料奸碳原子和 虱原子、氮原子及氧原子而組成之群組中選出之^個以 上^原^所組成之(2+n8 + n9)價之芳香族基。作+ : t族基係列舉如:⑽環、-錢、1，2-二 二产^「1秦％1·、秦環”夫喃環、°叫環、°比唾環、 二衣&早％式方香環除去(2+n8+n9)個氫原子之(2+ 價基；由縮合科環式料環而組成 上之環之縮合多環式芳香環除去(2 +翁= il=+I18tn9)價基；由㈣單鍵、耗烯基或伸J 土吻由該早環式芳香環和該縮合多環式芳香環組成之 323451 54 201234576 出二2個以上之芳香環所組成之芳香環集合除去 m 原子之(2+ns+n9)價基；由具有藉著η ;芳香二：基等之2價基而交聯該縮合多環式芳香環 集合之相鄰接之2個芳香環之交聯多環式芳香 %除去(2 + η8 + η9)個氫原子之(2 + η8 + η9)價基等。 ，為树式芳香環係列舉例如在化學式⑽所表示之^ is the (2 + n6 + n7) valence represented by Ar3 in the chemical formula (17); = a family of a series of (2 + n6 + n7) valence aromatic hydrocarbon MW = ^ fragrant heterocyclic group, preferably It is one selected from the group consisting of a carbon atom or a carbon atom and an oxygen atom with a -===: valence::: group basis. As a ring, the second dilute diazine ring ^ factory is called '1'2.啐(10) translation, Yi Tian Nan Niang, Pyrrole Ring, Pyrazole Jifang (4) removed (2+ 心 原 原 原 原 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 Ring-removed (2 + n6 + n 323451 49 201234576 valence atoms of (2 + n6 + n7); bonded by the monocyclic, vinyl or ethynyl group from the monocyclic aromatic ring and the condensation a collection of aromatic rings consisting of two or more aromatic rings selected from the group consisting of polycyclic aromatic rings = (2 + n6 + n7) valence groups of (2 + n6 + n7) hydrogen atoms; The cross-linked polycyclic aromatic % of the adjacent two aromatic rings of the condensed polycyclic aromatic ring or the aromatic ring set is crosslinked by a divalent group such as an anthracene group, an ethyl group, a carbonyl group or the like (2) + n6 + n7) (2 + n6 + n7) valence groups of hydrogen atoms, etc. φ is a series of monocyclic aromatic rings, for example, in Chemical Formula 1 to exemplified in the related description of the structural unit represented by the chemical formula (13) a ring represented by Chemical Formula 5 and Chemical Formula 1 。. As a series of condensed polycyclic aromatic rings, for example, a structural unit represented by Chemical Formula (13) The ring represented by the chemical formula 13 to the chemical formula 27 exemplified in the description. As the aromatic ring assembly series, for example, the ring shown in the chemical formula 28 to the chemical formula 36 exemplified in the related description of the structural unit represented by the chemical formula (13) As the parent-linked polycyclic aromatic ring series, for example, the ring represented by Chemical Formula 37 to Chemical Formula 44 exemplified in the description of the structural unit represented by Chemical Formula (13) is used as the aforementioned (2 + n6 + n7) price. The aromatic group is preferably from the chemical formula 1 to the chemical formula 5, the chemical formula 7 to the chemical formula 1, the chemical formula 13, the chemical formula 4, the chemical formula 26 to the chemical formula 29, and the chemical formula 37 from the viewpoint of easiness of synthesis of the raw material monomers. The group represented by the formula 39 or the chemical formula 41 removes (2 + n6 + n7) hydrogen atoms, and is more preferably removed by a ring represented by the chemical formula 50 323451 201234576 1, the chemical formula 37 or the chemical formula 41 (2 + n6 + n7) a group of hydrogen atoms, even preferably a group of (2 + n6 + n7) hydrogen atoms removed by a ring represented by the chemical formula i, the chemical formula 38 or the chemical formula 42. In the chemical formula (18), R7 represents a single bond or The organic group of 1 + m5) is preferably an organic group of (l + m5) valence. In the formula (18), the organic group of the (1 + m5) valence represented by R7 is, for example, methyl, Ethyl, propyl, isopropyl, butyl, isobutyl φ, SeC butyl, tert butyl, pentyl, hexyl, cyclohexyl, heptyl, octyl decyl, fluorenyl, lauryl substituted a group in which a group of at least one hydrogen atom of these groups is substituted, and the alkyl group having a carbon number of 丨 to 20 may have a substituent of m5 hydrogen atoms; a phenyl group, a fluorenyl-naphthyl group, a 2-naphthyl group, i•indenyl, 2-indenyl, 9-fluorenyl substituted by a substituent with at least i hydrogen atoms of these groups, etc. The aryl group having 6 to 3 carbon atoms which may have a substituent removes m5 hydrogens Atom group; oxime, ethoxy, propoxy, butoxy, pentyloxy, hexyloxy, decyloxy, lauryloxy, cyclopropoxy, cyclobutoxy, cyclopentyloxy a group such as a cyclohexyloxy group, a cyclodecyloxy group, a cyclopentyloxy group, a decyloxy group, a gold alkoxy group substituted with at least one hydrogen atom of these groups, or the like may have a substituent. Alkoxy group having a carbon number of 丨 to 5 除去 to remove a group of 5 hydrogen atoms of a melon; a group having m5 hydrogen atoms removed from an amine group having a substituent containing a carbon atom; and a fluorenyl group having a substituent having a carbon atom; It is preferable to remove a group of 5 hydrogen atoms from the viewpoint of easiness of synthesis of a raw material monomer, and it is preferable to remove a group of m5 hydrogen atoms from an alkyl group, a group of m5 hydrogen atoms removed from an aryl group, and a halogen atom. The base removes a group of hydrogen atoms. As a series of the above-mentioned substituents, the 323451 51 201234576 is not described in the description of the above-mentioned Q. The anterior material is subordinated to a plurality of cancers. There are a plurality of substituents, which may be the same or different. In the chemical formula (10), m5 represents the above integer. However, when R is a single bond, the m5 system represents 1. In the formula (I9), R8 represents a single bond or (1 + ring-valent organic group ' is preferably an organic group of (l + m6) valence. In the chemical formula (19), as represented by 1 + m6) valence of organic ruthen series, for example: mercapto, ethyl, propyl, isopropyl, butyl, isobutyl, sec-butyl, tert-butyl, pentyl, hexyl, cyclohexyl Heptyldioctyl, indenyl, fluorenyl, lauryl substituted by a substituent for at least one hydrogen atom of these groups, etc., may have a substituent of a carbon atom number; to 2 〇 of the alkyl group to remove m6 hydrogens a group of atoms; a phenyl group, a fluorenyl-naphthyl group, a 2-naphthyl group, a fluorenyl group, a 2-fluorenyl group, a fluorenyl group, and a fluorenyl group substituted with at least one of the hydrogen atoms of the group may have a substituent The aryl group having 6 to 3 carbon atoms in the group removes the group of m6 hydrogen atoms; methoxy, ethoxy, propoxy, butoxy, pentyloxy, hexyloxy, decyloxy, laurel An oxy group, a cyclopropoxy group, a cyclobutoxy group, a cyclopentyloxy group, a cyclohexyloxy group, a cyclodecyloxy group, a cyclolauroyloxy group, a norbornyloxy group, a gold alkyl alkoxy group, which are substituted with a substituent At least 1 a group having an alkoxy group having 1 to 50 carbon atoms which may have a substituent, and the like, a group of m6 hydrogen atoms removed by an amine group having a substituent having a carbon atom; The group containing a substituent of a carbon atom removes a group of m6 hydrogen atoms, and from the viewpoint of easiness of synthesis of a raw material monomer, it is preferable to remove a group of m6 hydrogen atoms from an alkyl group and remove m6 from an aryl group. a group of a hydrogen atom and a group of m6 hydrogen atoms removed by an alkoxy group. 323451 52 201234576 The substituents are exemplified as the description of the above-mentioned Q1, and the substituents are the same substituents. In the plural state, a plurality of substituents may be present in the same or different. In the chemical formula (19), m6 represents an integer above 丨. However, when R is an early bond, the m6 system represents 1. The structural unit represented by the chemical formula (20) is in the chemical formula (20), and the R9 is a group containing the group represented by the formula (21), and the R group includes the i-valent group of the group represented by the chemical formula (IV), which means that it may have R9 and R, substituents outside (2 + n8 + n9) The aromatic group 'n8 and n9 of the valence are each independently represented by the above integer. The group represented by the formula (21) and the group represented by the formula (22) may be directly bonded to Ar4, or Permeation: methylene, ethyl, butyl, pentyl, hexyl, thiol, decyl, propyl, butyl, pentylene, ortho a hexyl group, a fluorenyl group, a fluorene group, a hydrazine group, a hydrazine group, a substituted alkyl group, a substituent such as a group substituted to a V1 hydrogen atom, or the like, which may have a substituent Extrusion base to 50; oxymethylene, oxygen extended ethyl, oxygen extended propyl, oxygen extended butyl group, pentyl group, oxygen extended hexyl group, oxygen thiol group, oxygen extended dodecacarbyl group, Oxyl, cyclobutoxy, cyclopentyloxy, cyclohexyloxy, oxyalkylene, dodecyloxy, decyloxy, and alkoxy groups are substituted for these groups. The at least one hydrogen atom group or the like may have an oxygen-expanding group having a counter atomic number of 1 to 50, and may have a substituent imine group, and may have a substituent 9 group; The substituted vinyl group 'extending ethynyl; Yue may have a substituent group of the triisocyanate; 323,451,201,234,576 sub 53 is an oxygen atom, ^ atom, a sulfur atom, etc. and Ar4 different atom bonded. The ArI system of μ 1 may have and R1. Substituents other than those. As the substituent of the group of the base group, the substituents of the formula are as follows: The substituent of the substituent is a plurality of substituents, and a plurality of substituents may be present in the same manner, and may be the same or different. From the viewpoint of the easiness of the original monomer formation, the substituent other than the above oxime is preferably a silk, a silk group, an aryl group, an aryloxy group, a carboxyl group or a substituted carboxyl group. In the chemical formula (20), η8 means that the integer of i or more is preferably an integer of 4, more preferably an integer of 1 to 3. In the formula (20), n9 represents an integer of i or more, preferably an integer of 4, more preferably an integer of 1 to 3, as represented by Αγ4 in the chemical formula (20) (2 + n8) + n9) The aromatic series of valences are as follows: (2 + n8 + n9) valence hydrocarbon group, (2 + n8 + ^ Jia 姊 姊 ring base, most (4) carbon raw material 碳 碳 carbon atom and 虱 atom, An aromatic group of (2+n8 + n9) valence consisting of more than one selected from the group consisting of a nitrogen atom and an oxygen atom. The +: t group series is as follows: (10) ring, - money , 1,2-two-two production ^ "1 Qin%1 ·, Qinhuan" Fu-ring, ° called ring, ° than the saliva ring, two clothes & early% of the square ring to remove (2+n8 + n9) hydrogen Atomic (2+ valence group; condensed polycyclic aromatic ring consisting of a ring composed of a condensed ring of a condensed ring; (2 + Weng = il = +I18tn9) valence; (4) single bond, alkenyl group or Stretching J is composed of the early ring aromatic ring and the condensed polycyclic aromatic ring. 323451 54 201234576 The aromatic ring consisting of two or more aromatic rings removes the m atom (2+ns+n9). Cross-linking by having a divalent group such as η; aromatic di:yl or the like The crosslinked polycyclic aromatic group of two adjacent aromatic rings of the condensed polycyclic aromatic ring set removes (2 + η8 + η9) valence groups of (2 + η8 + η9) hydrogen atoms, etc. The aromatic ring series is represented, for example, by the chemical formula (10).

=早位之相關說明中所例示之化學式1至化學式$、化 子式7至化學式10所表示之環。 一作為，合多ί衣式芳香環係列舉例如在化學式⑽所表 ’、構以單位之相關說明中所例示之化學式U至化學式 27所表示之環。 在化學式（13)所表示之構 學式28至化學式36所表 作為芳香環集合係列舉例如 造單位之相關說明中所例示之化 示之環。 作為交聯多環式芳香環係列舉例如在化學式⑽所表 • g構造單位之相_財所㈣之化學式^至化學式 44所表示之環。 六作為前述(2 + Π8 + Π9)價之芳香族基，由原料單體合成 之今易度之觀點來看’最好是由化學式j至化學式5、化 學式7至化學式1〇、化學式13、化學式14、化學式％至 化學式29、化學式37至化學式39或化學式41所表示之 環除去(2 + n8 + n9)個氫原子之基，更加理想是由化學式ι 至化學式6、化學式8、化學式14、化學式27、化學式“、 化子式38或化學式42所表示之環除去(2+n8 + n9)個氣原 323451 55 201234576 子之基，甚至最好是由化學式1、化學式37或化學式 所表示之環除去（2 + n8 + n9)個氫原子之基。 在化學式(21)中，R11係表示單鍵或（l + m7)價之有機 基，最好是（l + m7)價之有機基。 在化學式(21)中，作為R11所表示之（l + m7)價之有機 基係列舉例如：曱基、乙基、丙基、異丙基、丁基、異丁 基、sec-丁基、tert-丁基、戊基、己基、環己基、庚基、辛 魯 基、壬基、癸基、月桂基經取代基取代這些基中之至少1 個氣原子之基專之可以具有取代基之碳原子數1至20之院 基除去m7個氫原子之基；苯基、萘基、萘基、i蒽基、 2-蒽基、9-蒽基經取代基取代這些基中之至少1個氫原子 之基專之可以具有取代基之碳原子數6至30之芳基除去 個氫原子之基；曱氧基、乙氧基、丙氧基、丁氧基、.戊 氧基、己氧基、壬氧基、月桂氧基、環丙氧基、環丁氧基、 環戊氧基、環己氧基、環壬氧基、環月桂氧基、降莰氧基、 φ 金鋼烷氧基經取代基取代這些基中之至少1個氫原子之基 等，可以具有取代基之碳原子數i至5〇之烷氧基除去 個氫原子之基；由具有包含碳原子之取代基之胺基除去心 個氫原子之基；由具有包含碳原子之取代基之♦基除去心 個，原子之基，由原料單體合成之容易度之觀點來看，最 好疋由烧基除去m7個氫原子之基、由芳基除去m7個氣原 子之基、由烷氧基除去m7個氫原子之基。 _作為前述取代基係列舉與前述^之相關說明中所例 不之取代基為同樣之取代基。前述取代基存在有複數個之 323451 56 201234576 狀態下，存在複數個之取代基，可^目同，也可以不同。 η Λ化學式(21)中，m7係表示4上之整數。但是，在 R為單鍵時，πι7係表示1。 在化學式(22)中，R12係表示單餘 ^ ^^ θ 早鍵或（l + m8)價之有機 基’最好疋（l + m8)價之有機基。 在化學式(22)中，作為Ri2所表 .^ ，浙 τ衣不之（l + m8)價之有機 基係列舉例如：甲基、乙基、丙基、 土 異丙基、丁基、異丁 基、sec-丁基、_丁基、戊基、己基、環己基、庚基、辛 基、壬基、癸基、㈣基娜代絲代這錄巾之至少】 個氫原子之基等之可以具有取代基之碳原子數之烧 基除去m8個氫原子之基；苯基、r蔡基、2•蔡基、卜葱基、 2-惠基、9-¾基經取代基取代這些基中之至少ι個氮原子 之基等之可以具有取代基之碳原子數6至3〇之芳基除去 個氫原子之基；甲氧基、乙氧基、丙氧基、丁氧基、戊 氧基、己氧基、壬氧基、月桂氧基、環丙氧基、環丁氧基、 裱戊氧基、環己氧基、環壬氧基、環月桂氧基、降莰氧基、 金鋼烷氧基經取代基取代這些基中之至少丨個氫原子之基 等之可以具有取代基之碳原子數丨至5〇之烷氧基除去 個氫原子之基；由具有包含碳原子之取代基之胺基除去m8 個氫原子之基；由具有包含碳原子之取代基之矽基除去m8 個氫原子之基’由原料單體合成之容易度之觀點來看，最 好是由烧基除去m8個氫原子之基、由芳基除去m8.個氫原 子之基、由烷氧基除去m8個氫原子之基。 作為前述取代基係列舉與前述Q1之相關說明中所例 57 323451 201234576 示之取代基為同樣之取代基。前述取代基存在有複數個之 狀態下，存在複數個之取代基，可以相同，也可以不同。 在化學式（22)中，m8係表示1以上之整數。但是，在 R12為單鍵時，m8係表示1。 化學式（13)所表示之構造單位之例 作為化學式（13)所表示之構造單位，由得到之離子性 聚合物之電子輸送性之觀點來看，最好是化學式(23)所表 示之構造單位、化學式（24)所表示之構造單位，更加理想 是化學式(24)所表示之構造單位。= Rings represented by Chemical Formula 1 to Chemical Formula $, and Chemical Formula 7 to Chemical Formula 10 exemplified in the earlier description. As a series, the series of the aromatic ring of the formula is represented by the chemical formula U to the chemical formula 27 exemplified in the description of the unit of the chemical formula (10). The structure represented by the chemical formula (13) is represented by the formula 28 to the chemical formula 36, which is a series of examples of the aromatic ring assembly, which is exemplified in the description of the unit. As the series of the crosslinked polycyclic aromatic ring, for example, the ring represented by the chemical formula ^ to the chemical formula 44 of the phase (g) of the chemical formula (10). 6. As the aromatic group of the above (2 + Π8 + Π9) valence, from the viewpoint of the ease of synthesis of the raw material monomer, 'preferably from the chemical formula j to the chemical formula 5, the chemical formula 7 to the chemical formula 1 化学, the chemical formula 13, The ring represented by Chemical Formula 14, Chemical Formula 29, Chemical Formula 37 to Chemical Formula 39 or Chemical Formula 41 is substituted for (2 + n8 + n9) hydrogen atoms, and more preferably from Chemical Formula ι to Chemical Formula 6, Chemical Formula 8, Chemical Formula 14. , the chemical formula ", the chemical formula", the ring represented by the chemical formula 38 or the chemical formula 42 (2+n8 + n9) gas source 323451 55 201234576 subunit, even preferably expressed by the chemical formula 1, the chemical formula 37 or the chemical formula The ring removes (2 + n8 + n9) hydrogen atoms. In the chemical formula (21), R11 represents a single bond or an organic group of (l + m7) valence, preferably (l + m7) In the chemical formula (21), the organic group of the (l + m7) valence represented by R11 is, for example, a mercapto group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, or a sec-butyl group. Base, tert-butyl, pentyl, hexyl, cyclohexyl, heptyl, suluki, fluorenyl, fluorenyl, month A group in which a substituent of at least one of these groups is substituted by a substituent, and a group having 1 to 20 carbon atoms which may have a substituent, a group of m7 hydrogen atoms; phenyl, naphthyl, naphthyl, i a group in which a fluorenyl group having a carbon atom number of from 6 to 30, which may have a substituent, may be substituted with a substituent of at least one of the hydrogen atoms of the fluorenyl group, the 2-fluorenyl group, and the 9-fluorenyl group; Alkoxy, ethoxy, propoxy, butoxy, pentyloxy, hexyloxy, decyloxy, lauryloxy, cyclopropoxy, cyclobutoxy, cyclopentyloxy, cyclohexyl The number of carbon atoms which may have a substituent, such as an oxy group, a cyclodecyloxy group, a cyclolauroyloxy group, a norbornyloxy group, a φ gold alkoxy group, a substituent of at least one hydrogen atom among these groups, etc. a group in which an alkoxy group is removed to a hydrogen atom; a group having a hydrogen atom removed from an amine group having a substituent containing a carbon atom; and a radical removed by a group having a substituent containing a carbon atom, the atom From the viewpoint of easiness of synthesis of the raw material monomers, it is preferred to remove m7 hydrogen atoms from the group and m7 from the aryl group. a group of a gas atom and a group of m7 hydrogen atoms removed from an alkoxy group. _ As a substituent in the series of substituents, the substituents which are not described in the description of the above are the same substituents. In the state of 323451 56 201234576, there are a plurality of substituents which may be the same or different. η Λ In the chemical formula (21), m7 represents an integer of 4. However, when R is a single bond, πι7 is Indicates 1. In the chemical formula (22), R12 represents an organic group having a single residue of ^^^ θ or an organic group of (l + m8) valence (p + l 8 ). In the chemical formula (22), as an organic group in the form of Ri2, the molecular group of (1 + m8) is, for example, methyl, ethyl, propyl, isopropyl, butyl, iso Butyl, sec-butyl, _butyl, pentyl, hexyl, cyclohexyl, heptyl, octyl, decyl, decyl, (iv) quinoxades, at least one of the hydrogen atoms, etc. The group having a carbon atom number of a substituent may be substituted for a group of m8 hydrogen atoms; the phenyl group, the r-chatyl group, the 2, hexyl group, the lysyl group, the 2-kethyl group, and the 9-3⁄4 group may be substituted by a substituent. a group of at least one nitrogen atom in the group, such as a group having 6 to 3 Å carbon atoms, which may have a substituent, a hydrogen atom; a methoxy group, an ethoxy group, a propoxy group, a butoxy group, Pentyloxy, hexyloxy, decyloxy, lauryloxy, cyclopropoxy, cyclobutoxy, decyloxy, cyclohexyloxy, cyclodecyloxy, cyclolauroyloxy, norbornoxy a gold-alkali alkoxy group substituted with at least one hydrogen atom of these groups by a substituent, etc., which may have a substituent having a carbon atom number of 丨 to 5 烷 alkoxy group to remove a hydrogen atom; The amine group of the substituent of the carbon atom removes the group of m8 hydrogen atoms; the base of the m8 hydrogen atom is removed from the sulfhydryl group having a substituent containing a carbon atom, and it is preferable from the viewpoint of easiness of synthesis of the raw material monomer It is a group in which m8 hydrogen atoms are removed from the alkyl group, m8. hydrogen atoms are removed from the aryl group, and m8 hydrogen atoms are removed from the alkoxy group. The substituents shown in the above-mentioned description of Q1 are the same substituents as the substituents shown in the above-mentioned description of Q1, 57 323451 201234576. In the case where a plurality of the substituents are present, a plurality of substituents may be present, which may be the same or different. In the chemical formula (22), m8 represents an integer of 1 or more. However, when R12 is a single bond, m8 represents 1. An example of the structural unit represented by the chemical formula (13) is a structural unit represented by the chemical formula (13), and from the viewpoint of electron transportability of the obtained ionic polymer, the structural unit represented by the chemical formula (23) is preferable. The structural unit represented by the chemical formula (24) is more preferably a structural unit represented by the chemical formula (24).

r14 r13 ……Y1K)al(Z1)bl)m9 (23)R14 r13 ......Y1K)al(Z1)bl)m9 (23)

X (在化學式(23)中，R13係表示（l + m9 + ml0)價之有機基， R14 係表示 1 價之有機基，Q1、Q3、Y1、Μ1、Z1、Y3、nl、 φ al、bl及n3係表示相同於前面敘述之意義，m9及mlO 係分別獨立地表示1以上之整數，在Q1、Q3、Y1、Μ1、 Ζ1、Υ3、nl、al、bl及η3之各個係在具有複數個之狀態 下，具有複數個之 Q1、Q3、Υ1、Μ1、Ζ1、Υ3、nl、al、 bl及n3，分別可以相同，也可以不同。） 在化學式(23)中，作為R13所表示之（l + m9 + ml0)價 之有機基係列舉例如：曱基、乙基、丙基、異丙基、丁基、 異丁基、sec-丁基、tert-丁基、戊基、己基、環己基、庚基、 辛基、壬基、癸基、月桂基經取代基取代這些基中之至少 58 323451 201234576 1個氫原子之基等之可以具有取代基之碳原子數^2〇之 烷基除去（m9 + ml〇)個氫原子之基；苯基、^萘基、2_萘基、 1-蒽基、2-蒽基、9-蒽基經取代基取代這些基中之至少玉 個氫原子之基等之可以具有取代基之碳原^數6至^之芳 基除去(m9 + ml0)個氫原子之基；f氧基、 基、丁氧基、戍氧基、己氧基、壬氧基、月桂 氧基、環丁氧基、環戊氧基、環己氧基、環壬氧基、環月 _ 桂氧基、降莰氧基、金鋼烷氧基經取代基取代這些基中之 至少1個氫原子之基等之可以具有取代基之碳原子數】至 50之貌氧基除去(m9 + ml0)個氫原子之基；由具有包含碳 原子之取代基之胺基除去(m9 + ml〇)個氫原子之基；由具 有包含碳原子之取代基之矽基除去(m9 + mi〇)個氫原子之 基’由原料單體合成之容易度之觀點來看，最好是由烷基 除去(m9 + ml0)個氫原子之基、由芳基除去（m9 + ml〇)個氫 原子之基、由烧氧基除去(m9 + ml0)個氫原子之基。 • 在化學式（23)中，作為R14所表示之1價之有機基係列 舉例如：甲基、乙基、丙基、異丙基、丁基、異丁基、sec_ 丁基、tert-丁基、戊基、己基、環己基、庚基、辛基、壬 基、癸基、月桂基經取代基取代這些基中之至少1個氫原 子之基等之可以具有取代基之碳原子數1至20之烷基除去 1個氫原子之基；苯基、1-萘基、2-萘基、1-蒽基、2-蒽基、 9-蒽基經取代基取代這些基中之至少1個氫原子之基等之 可以具有取代基之碳原子數6至30之芳基除去1個氫原子 之基；曱氧基、乙氧基、丙氧基、丁氧基、戊氧基、己氧 59 323451 201234576 基、壬氧基、月桂氧基、環丙氧基、環丁氧基、環戊氧基、 環己氧基、環壬氡基、環月桂氡基、降莰氧基、金鋼烷氧 基經取代基取代這些基中之至少1個氫原子之基等之玎以 具有取代基之碳原子數1至50之烷氧基除去1個氫原子之 基；由具有包含碳原子之取代基之胺基除去1個氫原子之 基；由具有包含碳原子之取代基之矽基除去1個氫原子之 由原料單體合成之容易度之觀點來看，最好是由炫基 除去1個氫原子之其、务 氧基除去κ β 土由方基除去〗個氫原子之基、由烷 乳丞除去1個氫原子之基。 作為化學式ρ3)所表示 單位。 稱^5•早位係列舉以下之構造X (In the chemical formula (23), R13 represents an organic group of (l + m9 + ml0) valence, R14 represents an organic group of 1 valence, Q1, Q3, Y1, Μ1, Z1, Y3, nl, φ al, The bl and n3 series are the same as those described above, and m9 and mlO each independently represent an integer of 1 or more, and each of Q1, Q3, Y1, Μ1, Ζ1, Υ3, nl, a1, bl, and η3 has In a plurality of states, a plurality of Q1, Q3, Υ1, Μ1, Ζ1, Υ3, nl, a1, bl, and n3 may be the same or different.) In the chemical formula (23), it is represented by R13. The organic group of (l + m9 + ml0) valence is, for example, mercapto, ethyl, propyl, isopropyl, butyl, isobutyl, sec-butyl, tert-butyl, pentyl, hexyl a cyclohexyl group, a heptyl group, an octyl group, a decyl group, a fluorenyl group, a lauryl group, or a substituent substituted by at least 58 323451 201234576, a hydrogen atom group or the like, which may have a substituent such as a carbon atom The alkyl group removes (m9 + ml〇) a hydrogen atom; the phenyl group, the naphthyl group, the 2-naphthyl group, the 1-fluorenyl group, the 2-fluorenyl group, and the 9-fluorenyl group are substituted with a substituent. An aryl group having 6 to aryl groups which may have a substituent, such as a hydrogen atom atom, may have a substituent of (m9 + ml0) hydrogen atoms; f oxy group, a group, a butoxy group, a decyloxy group, Hexyloxy, decyloxy, lauryloxy, cyclobutoxy, cyclopentyloxy, cyclohexyloxy, cyclodecyloxy, cyclohexyloxy, norbornoxy, gold alkoxy a substituent which substitutes a group of at least one hydrogen atom of these groups, etc., may have a substituent having a carbon atom number] to a 50-position oxy group to remove a (m9 + ml0) hydrogen atom; a substitution having a carbon atom; The amino group of the group removes (m9 + ml〇) a hydrogen atom; the base of the (m9 + mi〇) hydrogen atom removed by a thiol group having a substituent containing a carbon atom is easily synthesized from a raw material monomer From the viewpoint, it is preferable to remove (m9 + ml0) hydrogen atoms from the alkyl group, remove (m9 + ml〇) hydrogen atoms from the aryl group, and remove (m9 + ml0) hydrogen from the alkoxy group. The base of the atom. • In the chemical formula (23), the monovalent organic group represented by R14 is, for example, methyl, ethyl, propyl, isopropyl, butyl, isobutyl, sec-butyl, tert-butyl. a pentyl group, a hexyl group, a cyclohexyl group, a heptyl group, an octyl group, a decyl group, a fluorenyl group, a lauric group, a substituent such as a group substituted with at least one hydrogen atom of these groups, and the like may have a substituent having 1 to The alkyl group of 20 is substituted with one hydrogen atom; the phenyl group, the 1-naphthyl group, the 2-naphthyl group, the 1-fluorenyl group, the 2-fluorenyl group, and the 9-fluorenyl group are substituted with at least one of these groups by a substituent. a group of a hydrogen atom or the like which may have a substituent of 6 to 30 aryl groups, and a hydrogen atom; a methoxy group, an ethoxy group, a propoxy group, a butoxy group, a pentyloxy group, a hexyloxy group 59 323451 201234576 base, decyloxy, lauryloxy, cyclopropoxy, cyclobutoxy, cyclopentyloxy, cyclohexyloxy, cyclodecyl, cyclolautalyl, norbornyloxy, gold steel The alkoxy group is substituted with a substituent such as a group of at least one hydrogen atom of these groups, and the alkoxy group having 1 to 50 carbon atoms having a substituent is substituted for one hydrogen atom; It is preferable that the amine group containing a substituent of a carbon atom removes one hydrogen atom; from the viewpoint of easiness of synthesis of a raw material monomer by removing one hydrogen atom from a mercapto group having a substituent containing a carbon atom, The one which removes one hydrogen atom from the stimulating group, the oxy group which removes the κβ soil, removes the base of one hydrogen atom from the square group, and removes one hydrogen atom from the alkane mash. It is expressed as a unit of the chemical formula ρ3). Weighing the following structure

323451 60 201234576323451 60 201234576

^COO*M+ )(CH2CH20)3CH3 M = Li, Na，K, Cs，N(CH3)4 -COO.M+ )(ch2ch2o)3ch3 M = Li，Na, K, Cs，N(CH3)4^COO*M+ )(CH2CH20)3CH3 M = Li, Na,K, Cs,N(CH3)4 -COO.M+ )(ch2ch2o)3ch3 M = Li,Na, K, Cs,N(CH3)4

Hi3C6 rX^CO〇-M+ \)(CH2CH20)2CH3 M = Li, Na, K, Cs, N(CH3)4Hi3C6 rX^CO〇-M+ \)(CH2CH20)2CH3 M = Li, Na, K, Cs, N(CH3)4

M = Li，Na, K, Cs, N(CH3)4M = Li, Na, K, Cs, N(CH3)4

H3CO >(ch2ch2o)3ch3 M = Li, Na, K, Cs, N(CH3)4H3CO >(ch2ch2o)3ch3 M = Li, Na, K, Cs, N(CH3)4

H9C4O )^vCOO'M+ )(CH2CH20)2CH3 M = Li, Na, K, Cs, N(CH3)4 -COOM* )(CH2CH2〇)2CH3 M = Li, Na, K, Cs, N(CH3)4H9C4O )^vCOO'M+ )(CH2CH20)2CH3 M = Li, Na, K, Cs, N(CH3)4 -COOM* )(CH2CH2〇)2CH3 M = Li, Na, K, Cs, N(CH3)4

H17C80 ^yc〇〇-M+ 〆）(CH2CH20〉2CH3 M = Li, Na, K, Cs, N(CH3)4 H21C10O ]rvco〇'M+ >(ch2ch2o)2ch3 M = Li, Na, K, Cs, N(CH3)4 61 323451 (24) 201234576H17C80 ^yc〇〇-M+ 〆)(CH2CH20>2CH3 M = Li, Na, K, Cs, N(CH3)4 H21C10O ]rvco〇'M+ >(ch2ch2o)2ch3 M = Li, Na, K, Cs, N(CH3)4 61 323451 (24) 201234576

卜一1)广(q1)4X— I γ3-(α3)η3]^12 ^(Q^na-Y3 ) J m12 (在化學式_<係表示（1 + mu + m Q_1Q Υ、Μ1、Ζ1、ΥΉ、^_^_ 於别面敘边之意義，mll及ml2係分別獨立地表示工以上 之整數’在 R13、mU、ml2、Ql、q3、γ1、wy、γ3、 二、al、M及n3之各個係在具有複數個之狀態下 複數個之 R13、mll、ml2、Ql、q3、γ1、& γ3 ^、 al、bl及η3，分別可以相同’也可以不同。） n、 之右學式(24)巾’作^ π所表*之（1 + lnll + m12)價 之有機基係列舉例如：甲基、乙基、丙基、異丙基、丁基、 2基、齡丁基、跡丁基、戊基、己基1己基、庚^、 辛基、壬基、癸基、月桂基娜代基取錢些基中之至少 1個氫原子之基等之可以具有取代基之碳原子數i至2〇之 烷基除去(mll + ml2)個氫原子之基；苯基、κ萘基、2_萘 基、1-蒽基、2-蒽基、9胃蒽基經取代基取代這些基中之至 少1個氫原子之基等之可以具有取代基之碳原子數6至3〇 之芳基除去(mll + ml2)個氫原子之基；甲氧基、乙氧基、 丙氧基、丁氧基、戊氧基、己氧基、壬氧基、月桂氧基、 環丙氧基、環丁氧基、環戊氧基、環己氧基、環壬氧基、 環月桂氧基、降莰氧基、金鋼烧氧基經取代基取代這些基 中之至少1個氫原子之基等之可以具有取代基之碳原子數 62 323451 201234576 1至50之烷氧基除去（mil+ ml2)個氫原子之基；由具有包 含碳原子之取代基之胺基除去（mil+ ml2)個氫原子之 基；由具有包含碳原子之取代基之矽基除去（mil+ ml2)個 氫原子之基，由原料單體合成之容易度之觀點來看，最好 是由烷基除去(mil+ ml2)個氫原子之基、由芳基除去(mil + ml2)個氫原子之基、由烷氧基除去(mll + ml2)個氫原子 之基。 作為化學式（24)所表示之構造單位係列舉以下之構造 鲁單位。卜一1)广(q1)4X— I γ3-(α3)η3]^12 ^(Q^na-Y3 ) J m12 (in the chemical formula _< is expressed as (1 + mu + m Q_1Q Υ, Μ1, Ζ1 , ΥΉ, ^_^_ in the meaning of other sides, mll and ml2 are independent of the integer above the work 'in R13, mU, ml2, Ql, q3, γ1, wy, γ3, two, al, M And each of n3 has a plurality of R13, mll, ml2, Ql, q3, γ1, & γ3^, al, bl, and η3 in a plurality of states, and may be the same 'may be different.) n, The right-handed (24) towel's (1 + lnll + m12) valence of organic groups in the form of π, such as: methyl, ethyl, propyl, isopropyl, butyl, 2, age a butyl group, a butyl group, a pentyl group, a hexyl group, a hexyl group, a octyl group, a decyl group, a fluorenyl group, a fluorenyl group, and a lauryl group may have a substituent such as at least one hydrogen atom in the group. The alkyl group having a carbon number of i to 2 除去 is removed (mll + ml2) of a hydrogen atom; phenyl, κ naphthyl, 2-naphthyl, 1-indenyl, 2-indenyl, 9-indolyl a substituent capable of substituting a carbon atom of a substituent or the like of at least one of the hydrogen atoms The aryl group of 6 to 3 Å removes (mll + ml2) hydrogen atom groups; methoxy, ethoxy, propoxy, butoxy, pentyloxy, hexyloxy, decyloxy, laurel Oxyl, cyclopropoxy, cyclobutoxy, cyclopentyloxy, cyclohexyloxy, cyclodecyloxy, cyclolauryloxy, norbornoxy, gold alkoxy groups are substituted by substituents The number of carbon atoms which may have a substituent of at least one hydrogen atom group, etc. 62 323451 201234576 The alkoxy group of 1 to 50 removes (mil+ml2) hydrogen atom groups; the amine group having a substituent having a carbon atom Removal of (mil+ml2) hydrogen atom groups; removal of (mil+ml2) hydrogen atoms from a thiol group having a substituent containing a carbon atom, from the viewpoint of easiness of synthesis of a raw material monomer, preferably by The alkyl group removes (mil+ml2) hydrogen atom groups, removes (mil + ml2) hydrogen atoms from the aryl group, and removes (mll + ml2) hydrogen atoms from the alkoxy group. The series of structural units indicated are the following construction units.

63 323451 20123457663 323451 201234576

+ΜΌΟΟγ^ ^Ύ〇00·Μ+ H3C(OH2CH2C)2〇^ {D(CH2CH2〇)2CH3 Μ = Li, Na, K, Cs, N(CH3)4 +MOOC H3C(OH2CH2C)3'+ΜΌΟΟγ^ ^Ύ〇00·Μ+ H3C(OH2CH2C)2〇^ {D(CH2CH2〇)2CH3 Μ = Li, Na, K, Cs, N(CH3)4 +MOOC H3C(OH2CH2C)3'

COCTM* (CH2CH2〇)3CH3 M = Li, Na, K, Cs, N(CH3)4COCTM* (CH2CH2〇)3CH3 M = Li, Na, K, Cs, N(CH3)4

MOOC-/^ jrV-COO'M* H3C(OH2CH2C)4C( (D(CH2CH2〇)4CH3 M = Li, Na, K, Cs, N(CH3)4MOOC-/^ jrV-COO'M* H3C(OH2CH2C)4C( (D(CH2CH2〇)4CH3 M = Li, Na, K, Cs, N(CH3)4

M'OOC-v^ >^V-COO"M* H3C(OH2CH2C)5〇^ (D(CH2CH20)5CH3 M = Li, Na. K, Cs, N(CH3)4M'OOC-v^ >^V-COO"M* H3C(OH2CH2C)5〇^ (D(CH2CH20)5CH3 M = Li, Na. K, Cs, N(CH3)4

+MOOC~y^ y^yC〇〇*M+ H3C(OH2CH2C)eC(^ (D(CH2CH20)eCH3 M = Li, Na, K, Cs, N(CH3)4+MOOC~y^ y^yC〇〇*M+ H3C(OH2CH2C)eC(^(D(CH2CH20)eCH3 M = Li, Na, K, Cs, N(CH3)4

+M'OOCV!ss< >^V-C〇〇-M+ H3C(OH2CH2C)7a — ΰ(ΟΗ2ΟΗ20)7〇Η3 M = Li, Na, K, Cs, N(CH3)4+M'OOCV!ss<>^V-C〇〇-M+ H3C(OH2CH2C)7a — ΰ(ΟΗ2ΟΗ20)7〇Η3 M = Li, Na, K, Cs, N(CH3)4

HaCfOHzCHzCJzO^/V^OiCHzCHzOJaCHa +MOOC^ ^'COO'M* M = Li, Na, K, Cs, N(CH3)4 H3C(OH2CH2C)3〇>^/Vc〇(CH2CH2〇)3CH3 +MOOC^" ΌΟ〇·Μ+ M = Li, Na, K, Cs, N(CH3)4HaCfOHzCHzCJzO^/V^OiCHzCHzOJaCHa +MOOC^ ^'COO'M* M = Li, Na, K, Cs, N(CH3)4 H3C(OH2CH2C)3〇>^/Vc〇(CH2CH2〇)3CH3 +MOOC^ " ΌΟ〇·Μ+ M = Li, Na, K, Cs, N(CH3)4

"ΜΌ〇σ ~ " tOO M+ H3C(OH2CH2C)4〇>^Ar-C0(CH2CH2〇)4CH3"ΜΌ〇σ ~ " tOO M+ H3C(OH2CH2C)4〇>^Ar-C0(CH2CH2〇)4CH3

fMOOC ^ - XJOO-M, H3C(OH2CH2C)5〇^a/V<0(CH2CH2〇)5CH3 M = Li, Na, K, Cs, N(CH3)4 M = Li, Na, K, Cs, N(CH3)4fMOOC ^ - XJOO-M, H3C(OH2CH2C)5〇^a/V<0(CH2CH2〇)5CH3 M = Li, Na, K, Cs, N(CH3)4 M = Li, Na, K, Cs, N (CH3)4

+MOOCT ~ _ ^CO〇-M+ h3c(oh2ch2c)6o>^/V<o(ch2ch2o)6ch3+MOOCT ~ _ ^CO〇-M+ h3c(oh2ch2c)6o>^/V<o(ch2ch2o)6ch3

H3C(OH2CH2C)7i +MOOH3C(OH2CH2C)7i +MOO

M = Li, Na, K, Cs, N(CH3)4 (CH2CH2〇)7CH3 00_M+ M = Li, Na, K, Cs, N(CH3)4 64 323451 201234576M = Li, Na, K, Cs, N(CH3)4 (CH2CH2〇)7CH3 00_M+ M = Li, Na, K, Cs, N(CH3)4 64 323451 201234576

+M-〇3SY^r V^yso3-M+ H3C(OH2CH2C)2〇^ (3(CH2CH2〇)2CH3 M = Li, Na, K, Cs, N(CH3)4 +mo3s-y^ y^y-so3-M+ H3C(OH2CH2C)3〇^ (3(CH2CH2〇)3CH3 M = Li, Na, K, Cs, N(CH3)4+M-〇3SY^r V^yso3-M+ H3C(OH2CH2C)2〇^ (3(CH2CH2〇)2CH3 M = Li, Na, K, Cs, N(CH3)4 +mo3s-y^ y^y- so3-M+ H3C(OH2CH2C)3〇^ (3(CH2CH2〇)3CH3 M = Li, Na, K, Cs, N(CH3)4

+MO3SY^ ^YSOiW H3C(OH2CH2C)5C(^ (D(CH2CH2〇)5CH3 M = Li, Na, K. Cs, N(CH3)4+MO3SY^ ^YSOiW H3C(OH2CH2C)5C(^(D(CH2CH2〇)5CH3 M = Li, Na, K. Cs, N(CH3)4

"MOaS^5^ )rVS〇3'M+ H3C(OH2CH2C)6Cr 0(CH2CH20)6CH3 M = Li, Na, K, Cs, N(CH3)4"MOaS^5^ )rVS〇3'M+ H3C(OH2CH2C)6Cr 0(CH2CH20)6CH3 M = Li, Na, K, Cs, N(CH3)4

+mo3st^ ^so3-m+ Η3〇(ΟΗ2〇Η2〇)3〇-^/γ^：0(ΟΗ2〇Η2〇)3〇Η3 M = Li, Na, K, Cs, N(CH3)4+mo3st^ ^so3-m+ Η3〇(ΟΗ2〇Η2〇)3〇-^/γ^:0(ΟΗ2〇Η2〇)3〇Η3 M = Li, Na, K, Cs, N(CH3)4

+mo3s^ ' _ ^〇3'M++mo3s^ ' _ ^〇3'M+

H3c(〇H2CH2C)4〇>^/v<〇(CH2CH2〇)4CH3 M = Li, Na, K, Cs, N(CH3)4H3c(〇H2CH2C)4〇>^/v<〇(CH2CH2〇)4CH3 M = Li, Na, K, Cs, N(CH3)4

HaCiOHaCHaQsO^yVcO^HzCHaOJsCHa +MO3ST 〜 Μ = Li, Na, Κ, Cs, N(CH3)4HaCiOHaCHaQsO^yVcO^HzCHaOJsCHa +MO3ST ~ Μ = Li, Na, Κ, Cs, N(CH3)4

+MO3S^ 3〇3·Μ+ H3C(OH2CH2C)e〇'?5!yVc〇(CH2CH2〇)6CH3 h3c<oh2ch2c)7o +mo3:+MO3S^ 3〇3·Μ+ H3C(OH2CH2C)e〇'?5!yVc〇(CH2CH2〇)6CH3 h3c<oh2ch2c)7o +mo3:

M = Li, Na, K, Cs, N(CH3)4 o(ch2ch2o)7ch3 03·Μ+ M = Li, Na, K, Cs, N(CH3)4 65 323451 201234576 H3CH2COOC +MO0CH2C0yM = Li, Na, K, Cs, N(CH3)4 o(ch2ch2o)7ch3 03·Μ+ M = Li, Na, K, Cs, N(CH3)4 65 323451 201234576 H3CH2COOC +MO0CH2C0y

COOCH2CH3 CH2COO'M+ M = Li, Na, K, Cs, N(CH3)4COOCH2CH3 CH2COO'M+ M = Li, Na, K, Cs, N(CH3)4

Η30Η20000γΜ rV-COOCH2CH3 +M-〇OC(H2C)3Cf^ (D(CH2)3COO'M+ M = Li, Na, K, Cs_ N(CH3)4Η30Η20000γΜ rV-COOCH2CH3 +M-〇OC(H2C)3Cf^ (D(CH2)3COO'M+ M = Li, Na, K, Cs_ N(CH3)4

h3ch2coocy^ rycoocH2cH3 +MOOC(H2C)5CI^ (D(CH2)5CO〇-M+ M = Li, Na, K, Cs, N(CH3)4 H3CH2COOCV^( rVCOOCH2CH3 "MOOC(H2C)e〇 0(CH2)6C00*M+ M = Li, Na, K, Cs, N(CH3)4 H3CH2COOC +MO3SH20H3ch2coocy^ rycoocH2cH3 +MOOC(H2C)5CI^ (D(CH2)5CO〇-M+ M = Li, Na, K, Cs, N(CH3)4 H3CH2COOCV^( rVCOOCH2CH3 "MOOC(H2C)e〇0(CH2) 6C00*M+ M = Li, Na, K, Cs, N(CH3)4 H3CH2COOC +MO3SH20

COOCH2CH3 CH2S03'M+COOCH2CH3 CH2S03'M+

M = Li, Na, K, Cs, N(CH3)4 h3ch2coocy^ rX^COOCH2CH3 +MO3S(H2C)2C>^ ^D(CH2)2S03'M+ M = Li, Na, K, Cs, N(CH3)4M = Li, Na, K, Cs, N(CH3)4 h3ch2coocy^ rX^COOCH2CH3 + MO3S(H2C)2C>^ ^D(CH2)2S03'M+ M = Li, Na, K, Cs, N(CH3) 4

H3CH2COOCY^ py-COOCH2CH3 'MO3S(H2C)3Ci (D(CH2)3S03-M+ M = Li, Na, K, Cs, N{CH3)4 h3ch2coocy^ rycoocH2cH3 "MOaSiHzCJsCf (D(CH2)5S〇3*M4 M = Li, Na, K, Cs, N(CH3)4 H3CH2COOCY^ rV-COOCH2CH3 "ΜΌ38(Η2〇)40^ (D(CH2)4S〇3-M+ M = Li, Na, K, Cs, N(CH3)4 H3CH2COOCV^ rVCOOCH2CH3 ’ΜΌ35(Η2〇βΟ’ — t)(CH2)6S03-M+ M = Li, Na, K, Cs, N(CH3)4 66 323451 201234576H3CH2COOCY^ py-COOCH2CH3 'MO3S(H2C)3Ci (D(CH2)3S03-M+ M = Li, Na, K, Cs, N{CH3)4 h3ch2coocy^ rycoocH2cH3 "MOaSiHzCJsCf (D(CH2)5S〇3*M4 M = Li, Na, K, Cs, N(CH3)4 H3CH2COOCY^ rV-COOCH2CH3 "ΜΌ38(Η2〇)40^ (D(CH2)4S〇3-M+ M = Li, Na, K, Cs, N (CH3)4 H3CH2COOCV^ rVCOOCH2CH3 'ΜΌ35(Η2〇βΟ' — t)(CH2)6S03-M+ M = Li, Na, K, Cs, N(CH3)4 66 323451 201234576

+MO〇C H3C(0H2CH2C)20 H3C(OH2CH2C)2' P〇〇-m+ o(ch2ch2o)2ch3 (ch2ch2o〉2ch3+MO〇C H3C(0H2CH2C)20 H3C(OH2CH2C)2' P〇〇-m+ o(ch2ch2o)2ch3 (ch2ch2o>2ch3

+MOOC H3C(0H2CH2C)30 H3C(OH2CH2C)3 丨 Ρ〇〇·Μ+ o(ch2ch2o)3ch3 (ch2ch2o)3ch3 M = Li, Na, K, Cst N(CH3)4-(QP)- +MOOC COO*M+ H3C(OH2CH2C)4〇Y^ V^y〇(CH2CH2〇)4CH3 H3C(OH2CH2C)4Cr / ^0(PH2CH2〇)a〇^ M = Li, Na, K, Cs, N(CH3)4 M = Li, Na, K· Cs· N(CH3)4 +ΜΌΟ h3c(oh2ch2c)5o H3C(OH2CH2C)5〇rf+MOOC H3C(0H2CH2C)30 H3C(OH2CH2C)3 丨Ρ〇〇·Μ+ o(ch2ch2o)3ch3 (ch2ch2o)3ch3 M = Li, Na, K, Cst N(CH3)4-(QP)- +MOOC COO *M+ H3C(OH2CH2C)4〇Y^ V^y〇(CH2CH2〇)4CH3 H3C(OH2CH2C)4Cr / ^0(PH2CH2〇)a〇^ M = Li, Na, K, Cs, N(CH3)4 M = Li, Na, K· Cs· N(CH3)4 +ΜΌΟ h3c(oh2ch2c)5o H3C(OH2CH2C)5〇rf

COO*M+ 0(CH2CH20)5CH3 (CH2CH2〇)5CH3 M = Li, Na, K, Cs, N(CH3)4COO*M+ 0(CH2CH20)5CH3 (CH2CH2〇)5CH3 M = Li, Na, K, Cs, N(CH3)4

+MOOC X COO'M* Η30(ΟΗ2〇Η2〇)β〇γ^ ry〇(CH2CH20)eCH3 H3C(OH2CH2C)eCr t)(CH2CH2〇)6CH3 M = Li· Na· K, Cs, N(CHa)4 +MOO h3c(oh2ch2c)7o h3c(oh2ch2c>7 丨+MOOC X COO'M* Η30(ΟΗ2〇Η2〇)β〇γ^ ry〇(CH2CH20)eCH3 H3C(OH2CH2C)eCr t)(CH2CH2〇)6CH3 M = Li· Na· K, Cs, N(CHa) 4 +MOO h3c(oh2ch2c)7o h3c(oh2ch2c>7 丨

COO'M+ 0(CH2CH2〇)tCH3 (CH2CH20)tCH3 M « Li, Na( K, Cs, N(CH3)4COO'M+ 0(CH2CH2〇)tCH3 (CH2CH20)tCH3 M « Li, Na( K, Cs, N(CH3)4

H3CH2COOC-Y^ rV-C00CH2CH3 +MO3S(H2C)3Ci {^(CH^SOa-M* H3CH2COOC +MO3SCeH4H3CH2COOC-Y^ rV-C00CH2CH3 +MO3S(H2C)3Ci {^(CH^SOa-M* H3CH2COOC +MO3SCeH4

OOCH2CH3 CeH4S03*M+ M = Li, Na. K. Cs, N(CH3)4 M = Li, Na, K, Cs, N(CH3)4OOCH2CH3 CeH4S03*M+ M = Li, Na. K. Cs, N(CH3)4 M = Li, Na, K, Cs, N(CH3)4

h3ch2coocy^ |^yCO〇CH2CH3 "MOOCiHjCJaCi^ N〇(CH2)3COO"M+ M = U, Na, K, Cs, N(CH3)4H3ch2coocy^ |^yCO〇CH2CH3 "MOOCiHjCJaCi^ N〇(CH2)3COO"M+ M = U, Na, K, Cs, N(CH3)4

OOCH2CH3 CeH4CO〇-M+ H3CH2COOC +MOOCCeH4 丨 M = U. Na, K, Cs, N(CH3)4 作為化學式（13)所表示之構造單位，由得到之離子性 聚合物之耐久性之觀點來看’最好是化學式(25)所表示之 構造單位。OOCH2CH3 CeH4CO〇-M+ H3CH2COOC +MOOCCeH4 丨M = U. Na, K, Cs, N(CH3)4 The structural unit represented by the chemical formula (13), from the viewpoint of the durability of the obtained ionic polymer Preferably, it is a structural unit represented by the chemical formula (25).

((Q1)n1-Y1 (M1)ai(Z1)bi)m13 m15 ,RlHQ3)nrY3 )m14 (25) 67 323451 201234576 (在化學式(25)中，;R15係表示（i + ml3 + ml4)價之有機基， Q1、Q3、Υΐ、Μ、f、γ'nl、al、bl 及心係表心同 於前面敘述之意義，ml3、ml4及ml5係分別獨立地表示 1 以上之整數’在 R15、ml3、ml4、Q1、Q3、γ1、μ1、z1、 Y、nl、al、bl及n3之各個係在具有複數個之狀態下， 具有被數個之 R15、ml3、ml4、Q1、Q3、γΐ、μ1、z1、 Υ3、nl、al、bl及η3，分別可以相同，也可以不同。） 在化學式(25)中，作為Rl5所表示之（l + ml3 + mi4)價 之有機基係列舉例如：曱基、乙基、丙基、異丙基、丁基、 異丁基、sec-丁基、tert-丁基、戊基、己基、環己基、庚基、 辛基、壬基、癸基、月桂基經取代基取代這些基中之至少 1個氳原子之基等之可以具有取代基之碳原子數1至2〇之 烷基除去(ml3 + ml4)個氫原子之基；苯基、萘基、2_萘 基、1-蒽基、2-蒽基、9-蒽基經取代基取代這些基中之至 少1個氫原子之基等之可以具有取代基之碳原子數6至3〇 • 之芳基除去(ml3 + ml4)個氫原子之基；曱氧基、乙氧基、 丙氧基、丁氧基、戊氧基、己氧基、壬氧基、月桂氧基、 環丙氧基、環丁氧基、環戊氧基、環己氧基、環壬氧基、 環月桂氧基、降莰氧基、金鋼烷氧基經取代基取代這些基 中之至少1個氫原子之基等之可以具有取代基之碳原子數 1至50之烷氧基除去(ml3 + ml4)個氫原子之基；由具有包 含碳原子之取代基之胺基除去（ml3 + ml4)個氫原子之基； 由具有包含碳原子之取代基之矽基除去(ml3 + ml4)個氫原 子之基，由原料單體合成之容易度之觀點來看，最好是由 323451 68 201234576 烷基除去(ml3 + ml4)個氫原子之基、由芳基除去(ml3 + ml4) 個氫原子之基、ώ烧氧基除去（ml3 + ml4)個氫原子之基。 作為化學式(25)所表示之構造單位係列舉以下之構造 單位。((Q1)n1-Y1 (M1)ai(Z1)bi)m13 m15 ,RlHQ3)nrY3 )m14 (25) 67 323451 201234576 (in chemical formula (25); R15 represents (i + ml3 + ml4) price The organic base, Q1, Q3, Υΐ, Μ, f, γ'nl, al, bl and the heart of the heart are the same as previously described, ml3, ml4 and ml5 are each independently representing an integer greater than 1 'in R15 Each of ml3, ml4, Q1, Q3, γ1, μ1, z1, Y, nl, al, bl, and n3 has a plurality of states, and has a plurality of R15, ml3, ml4, Q1, Q3, ΐ ΐ, μ1, z1, Υ3, nl, al, bl, and η3, respectively, may be the same or different.) In the chemical formula (25), the organic group of (l + ml3 + mi4) valence represented by Rl5 For example: mercapto, ethyl, propyl, isopropyl, butyl, isobutyl, sec-butyl, tert-butyl, pentyl, hexyl, cyclohexyl, heptyl, octyl, decyl, fluorene a group in which a group of at least one of these groups is substituted with a substituent such as at least one of these groups, and the alkyl group having 1 to 2 ring carbon atoms which may have a substituent is removed (ml3 + ml4) of a hydrogen atom; , naphthyl, 2-naphthyl, 1-fluorenyl a 2-mercapto group, a 9-fluorenyl group substituted with a substituent at least one of these groups, and the like, wherein the aryl group having 6 to 3 carbon atoms which may have a substituent may be removed (ml3 + ml4) a hydrogen atom; alkoxy, ethoxy, propoxy, butoxy, pentyloxy, hexyloxy, decyloxy, lauryloxy, cyclopropoxy, cyclobutoxy, cyclopentyloxy a carbon which may have a substituent, such as a group, a cyclohexyloxy group, a cyclodecyloxy group, a cyclolauroyloxy group, a norbornyloxy group, a gold alkoxy group, a substituent, or a substituent of at least one of these groups The alkoxy group having an atomic number of 1 to 50 removes (ml3 + ml4) hydrogen atom groups; and removes (ml3 + ml4) hydrogen atoms from an amine group having a substituent containing a carbon atom; The thiol group of the substituent is used to remove (ml3 + ml4) hydrogen atoms. From the viewpoint of easiness of synthesis of the starting monomer, it is preferred to remove (ml3 + ml4) hydrogen atoms from the 323451 68 201234576 alkyl group. The base of the hydrogen atom is removed by the aryl group (m3 + ml4), and the base of the hydrogen atom is removed (m3 + ml4). The following structural unit is given as a series of structural units represented by the chemical formula (25).

♦MOOC♦MOOC

+WOOQ+WOOQ

Μ = Li, Nat K, Ca, NMe4 0(CH2CH20)2CH3Μ = Li, Nat K, Ca, NMe4 0(CH2CH20)2CH3

M s Li, Na, K, Cs. ΝΜθ4M s Li, Na, K, Cs. ΝΜθ4

M - U, Nat K, Cs, NMe4 0(CH2CH20)3CH3 s —〇(CH2CH2〇)4CH3M - U, Nat K, Cs, NMe4 0(CH2CH20)3CH3 s —〇(CH2CH2〇)4CH3

+MOOC+MOOC

〇(〇Η2〇Η2〇)5〇Η；〇(〇Η2〇Η2〇)5〇Η;

U ;u.他 K. Cs, NMe4 0(CH2CH2O)eCH3U ;u.He K. Cs, NMe4 0(CH2CH2O)eCH3

0(CH2CH20)7CH3 M = Lit Na, K, Cs. NMe4 M = Na.K.Cs. NMe4 化學式（15)所表示之構造單位之例 作為化學式（15)所表示之構造單位’由得到之離子性 聚合物之電子輸送性之觀點來看，最好是化學式(26)所表 示之構造單位、化學式(27)所表示之構造單位’更加理想 323451 69 201234576 疋化學式（27)所表示之構造單位。0(CH2CH20)7CH3 M = Lit Na, K, Cs. NMe4 M = Na.K.Cs. NMe4 An example of a structural unit represented by the chemical formula (15) is a structural unit represented by the chemical formula (15) From the viewpoint of electron transportability of the polymer, it is preferable that the structural unit represented by the chemical formula (26) and the structural unit represented by the chemical formula (27) are more ideally 323451 69 201234576 构造 structural unit represented by the chemical formula (27) .

(在7化學式(26)中，R16係表示（1 + ml6+mi7)價之有機基， Rl7 係表示 1 價之有機基 ’ Q2、Q3、Y2、m2、Z2、Y3、n2、 a2 b2及係表示相同於前面敘述之意義，及jnH 係分別獨立地表示1以上之整數，q2、q3、γ2、]Vi2、Z2、 Y、n2、a2、b2及n3之各個係在具有複數個之狀態下， 具有複數個之 Q2、q3、γ2、Μ2、、γ3、η2、a2、b2 及 η3，分別可以相同，也可以不同。） 在化學式(26)中，作為R16所表示之（l + ml6 + ml7)價 之有機基係列舉例如：甲基、乙基、丙基、異丙基、丁基、 異丁基、sec-丁基、tert_丁基、戊基、己基、環己基、庚基、 #辛基、壬基、癸基、月桂基經取代基取代這些基中之至少 1個氣原子之基等之可以具有取代基之碳原子數1至2〇之 烧基除去(ml6 + ml7)個氫原子之基；苯基、][_萘基、2-萘 基、1-蒽基、2-蒽基、9-葱基經取代基取代這些基中之至 少1個氣原子之基等之可以具有取代基之碳原子數6至30 之芳基除去(ml6 + ml7)個氫原子之基；甲氧基、乙氧基、 丙氧基、丁氡基、戊氧基、己氧基、壬氧基、月桂氧基、 裱丙氧基、環丁氧基、環戊氧基、環己氧基、環壬氧基、 %月桂氧基、降莰氧基、金鋼烷氧基經取代基取代這些基 70 323451 201234576 中之至少1個氫原子之基等之可以具有取代基之碳原子數 1至50之烷氧基除去（ml6 + ml7)個氫原子之基；由具有包 含碳原子之取代基之胺基除去(ml6 + ml7)個氫原子之基； 由具有包含碳原子之取代基之石夕基除去(ml6 +ml7)個氫 原子之基’由原料單體合成之容易度之觀點來看，最好是 由烷基除去(ml6 + ml7)個氫原子之基、由芳基除去(ml6 + ml7)個氫原子之基、由烷氧基除去(ml6+ml7)個氫原子 之基。 _ 在化學式（26)中，作為R17所表示之1價之有機基係列 舉例如：甲基、乙基、丙基、異丙基、丁基、異丁基、sec_ 丁基、tert-丁基、戊基、己基、環己基、庚基、辛基、壬 基、癸基、月桂基經取代基取代這些基中之至少1個氫原 子之基等之可以具有取代基之碳原子數1至2〇之烧基除去 1個氫原子之基；苯基、1-萘基、2-萘基、1_蒽基、2-¾基、 9-蒽基經取代基取代這些基中之至少1個氫原子之基等之 φ 可以具有取代基之碳原子數6至3〇之芳基除去1個氫原子 之基’曱氧基、乙氧基、丙氧基、丁氧基、戊氧基、己氧 基、壬氧基、月桂氧基、環丙氧基、環丁氧基、環戊氧基、 %己氧基、環壬氧基、％月桂氧基、降获氧基、金鋼烧氧 基經取代基取代這些基中之至少1個氫原子之基等之可以 具有取代基之碳原子數1至50之烷氧基除去1個氫原子之 基；由具有包含碳原子之取代基之胺基除去1個氫原子之 基；由具有包含碳原子之取代基之矽基除去1個氫原子之 基，由原料單體合成之容易度之觀點來看，最好是由烧基 323451 71 201234576 除去1個氫原子之基、由芳基除去1個氮原子之基、由烷 氧基除去1個氫原子之基。 作為化學式（26)所表示之構造單位係列舉以下之構造 單位。(In 7 formula (26), R16 represents an organic group of (1 + ml6+mi7) valence, and Rl7 represents an organic group of 1 valence 'Q2, Q3, Y2, m2, Z2, Y3, n2, a2 b2 and It means the same as the above-mentioned meaning, and jnH system independently represents an integer of 1 or more, and each of q2, q3, γ2, ]Vi2, Z2, Y, n2, a2, b2, and n3 has a plurality of states. Next, a plurality of Q2, q3, γ2, Μ2, γ3, η2, a2, b2, and η3 may be the same or different.) In the chemical formula (26), as represented by R16 (l + ml6) + ml7) The organic series of valences are, for example, methyl, ethyl, propyl, isopropyl, butyl, isobutyl, sec-butyl, tert-butyl, pentyl, hexyl, cyclohexyl, g. Substituting, octyl, fluorenyl, fluorenyl, laurel, substituted by a substituent such as at least one of these groups, etc., which may have a substituent of 1 to 2 Å of a carbon atom (m6 + Ml7) a group of hydrogen atoms; phenyl,][_naphthyl, 2-naphthyl, 1-indenyl, 2-indenyl, 9-onionyl substituted at least one of these groups by a substituent Base Removal of (ml6 + ml7) hydrogen atoms by an aryl group having 6 to 30 carbon atoms having a substituent; methoxy group, ethoxy group, propoxy group, butyl group, pentyloxy group, hexyloxy group, oxime Base, lauryloxy, decyloxy, cyclobutoxy, cyclopentyloxy, cyclohexyloxy, cyclodecyloxy, % lauryloxy, norbornoxy, gold alkoxy substituted by substituent a group of at least one hydrogen atom in the group 70 323451 201234576, etc., which may have a substituent of alkoxy group having 1 to 50 carbon atoms to remove (ml6 + ml7) hydrogen atoms; by having a substitution containing a carbon atom The amino group of the group is removed (ml6 + ml7) of a hydrogen atom; the viewpoint of the ease of synthesis of the raw material monomer by the base of the group (m6 + ml 7) of hydrogen atoms having a substituent containing a carbon atom In view of the above, it is preferred to remove (ml6 + ml7) hydrogen atoms from the alkyl group, remove (ml6 + ml7) hydrogen atoms from the aryl group, and remove (ml6 + ml7) hydrogen atoms from the alkoxy group. base. _ In the chemical formula (26), the monovalent organic group represented by R17 is, for example, methyl, ethyl, propyl, isopropyl, butyl, isobutyl, sec-butyl, tert-butyl. a pentyl group, a hexyl group, a cyclohexyl group, a heptyl group, an octyl group, a decyl group, a fluorenyl group, a lauric group, a substituent such as a group substituted with at least one hydrogen atom of these groups, and the like may have a substituent having 1 to a base of one hydrogen atom is removed; a phenyl group, a 1-naphthyl group, a 2-naphthyl group, a 1-nonyl group, a 2-3⁄4 group, and a 9-fluorenyl group are substituted with at least one of these groups by a substituent. φ of a hydrogen atom or the like, aryl group having 6 to 3 Å carbon atoms which may have a substituent, a radical of 1 hydrogen atom, ethoxy group, propoxy group, butoxy group, pentyloxy group , hexyloxy, decyloxy, lauryloxy, cyclopropoxy, cyclobutoxy, cyclopentyloxy, % hexyloxy, cyclodecyloxy, % lauryloxy, reduced oxy, gold steel a group in which an alkoxy group having 1 to 50 carbon atoms which may have a substituent and a substituent of one or more hydrogen atoms substituted by a substituent of the alkyl group; The group in which one amino group is removed from the amine group of the substituent; the group in which one hydrogen atom is removed from the sulfhydryl group having a substituent containing a carbon atom is preferably burned from the viewpoint of easiness of synthesis of the raw material monomer. Base 323451 71 201234576 A group in which one hydrogen atom is removed, one nitrogen atom is removed from the aryl group, and one hydrogen atom is removed from the alkoxy group. The following structural unit is given as a series of structural units represented by the chemical formula (26).

{N(CH3)2CH2CH3TX- (ch2ch2o)3ch3{N(CH3)2CH2CH3TX- (ch2ch2o)3ch3

父，P Cl. ΒγΛ BPI14, CF3SO3, CH3COOFather, P Cl. ΒγΛ BPI14, CF3SO3, CH3COO

:N(CH3)2CH2CH3>+X- (ch2ch2o)3ch3 {N(CH3)2CH2CH3}+X-)(CH2CH20)3CH3 χ = F, Cl. Br, I, BPh4· CF3S03, CH3COO v p Cl- Br· ' CF3S〇3, CH3COO A s r,:N(CH3)2CH2CH3>+X-(ch2ch2o)3ch3 {N(CH3)2CH2CH3}+X-)(CH2CH20)3CH3 χ = F, Cl. Br, I, BPh4· CF3S03, CH3COO vp Cl- Br· ' CF3S〇3, CH3COO A sr,

H17Ce rVtN(CH3)2CH2CH^+X· >(CH2CH20)3CH3 X = F, Cl. Br, I, BPh4, CF3SO3. CH3C00H17Ce rVtN(CH3)2CH2CH^+X· >(CH2CH20)3CH3 X = F, Cl. Br, I, BPh4, CF3SO3. CH3C00

H3CO rV^N(CH3)2CH2CH3}"X* )(CH2CH2〇)3CH3 X = F, Cl. Br, I, BPh4l CF3S03i CH3COOH3CO rV^N(CH3)2CH2CH3}"X* )(CH2CH2〇)3CH3 X = F, Cl. Br, I, BPh4l CF3S03i CH3COO

H5C2P fV^NiCH^CHjCHa}^ )(CH2CH2〇)3CH3 x s F( Cl. ΒΓ. l( BPh4t CF3S〇3, CH3COOH5C2P fV^NiCH^CHjCHa}^ )(CH2CH2〇)3CH3 x s F( Cl. ΒΓ. l( BPh4t CF3S〇3, CH3COO

H9C4O Y^S^iCH^zCHzCH^ 〕(CH2CH20)3CH3 X = F, Cl. Br, I, BPh4, CF3S03( CH3COOH9C4O Y^S^iCH^zCHzCH^](CH2CH20)3CH3 X = F, Cl. Br, I, BPh4, CF3S03(CH3COO

，(CH3)2CH2CH3}+X· )(ch2ch2o)3ch3 X = F, Cl. Br, I, BPh4, CF3SO3, CH3COO,(CH3)2CH2CH3}+X· )(ch2ch2o)3ch3 X = F, Cl. Br, I, BPh4, CF3SO3, CH3COO

H2iCi〇〇 )rV{N(CH3)2CH2CH3}+X' (CH2CH20)3CH3 X ss p. Cl. Br, I, BPhu. CF3SO3, CH3COO 323451 72 201234576H2iCi〇〇 )rV{N(CH3)2CH2CH3}+X' (CH2CH20)3CH3 X ss p. Cl. Br, I, BPhu. CF3SO3, CH3COO 323451 72 201234576

{(Z2)b2(M2)a2Y2_(Q2)七(27) I 丫3他3[ SQ3)n3-Y3 } m17 6 (在化學式（27)中，R16係表示（l + ml6 + ml7)價之有機基， Q2、Q3、Y2、Μ2、Z2、Y3、n2、a2、b2 及 n3 係表示相同 於前面敘述之意義，ml6及ml7係分别獨立地表示丨以上 之整數，R16、ml6、ml7、Q2、Q3、γ2、Μ2、Ζ2、γ3、n2、 a2、b2及n3之各個係在具有衩數個之狀態下，具有複數 個之 R16、ml6、ml7、Q2、Q3、Y2、M2、Z2、Y3、n2、a2、 b2及n3，分別可以相同，也可以不同。） 在化學式(27)中，作為R16所表示<(1 + ml6 + ml7)價 之有機基係列舉例如：甲基、乙基、丙基、異丙基、丁基、 異丁基、sec-丁基、tert-丁基、戊基、己基、環己基、庚基、 辛基、壬基、癸基、月桂基經取代基取代這些基中之至少 1個氫原子之基等之可以具有取代基之碳原子數1至2〇之 烧基除去（ml6 + ml7)個氫原子之基；苯基、丨_萘基、2_萘 基、1-蒽基、2-蒽基、9-蒽基經取代基取代這些基中之至 少1個氫原子之基等之可以具有取代基之碳原子數6至3〇 之芳基除去(ml6 + ml7)個氫原子之基；甲氧基、乙氧基、 丙氧基、丁氧基、戊氧基、己氧基、壬氧基、月桂氧基、 環丙氧基、環丁氧基、環戊氧基、環己氧基、環壬氧基、 %月桂氧基、降莰氧基、金鋼烷氧基經取代基取代這些基 中之至少1個氫原子之基等之可以具有取代基之碳原子數 73 323451 201234576 1至50之烷氧基除去（ml6 +ml7)個氫原子之基；由具有包 含碳原子之取代基之胺基除去(ml6 + ml7)個氫原子之基； 由具有包含碳原子之取代基之石夕基除去（ml6+ml7)個氫 原子之基，由原料單體合成之容易度之觀點來看，最好是 由烧基除去（ml6 + ml7)個氫原子之基、由芳基除去（ml6 + ml7)個氫原子之基、由烷氧基除去(ml6+ml7)個氫原子 之基。 作為化學式(27)所表示之構造單位係列舉以下之構造 鲁單位。 74 323451 201234576 -X+{H3CH2C(H3Q2N] H3C(OH2CH2C)2'{(Z2)b2(M2)a2Y2_(Q2)七(27) I 丫3他3[ SQ3)n3-Y3 } m17 6 (In the chemical formula (27), R16 represents (l + ml6 + ml7) The organic group, Q2, Q3, Y2, Μ2, Z2, Y3, n2, a2, b2 and n3 are the same as described above, and ml6 and ml7 are each independently representing an integer above 丨, R16, ml6, ml7, Each of Q2, Q3, γ2, Μ2, Ζ2, γ3, n2, a2, b2, and n3 has a plurality of R16, ml6, ml7, Q2, Q3, Y2, M2, and Z2 in a state with a number of turns. Y3, n2, a2, b2, and n3 may be the same or different.) In the chemical formula (27), the organic group represented by R16 (<(1 + ml6 + ml7)) is, for example, methyl , ethyl, propyl, isopropyl, butyl, isobutyl, sec-butyl, tert-butyl, pentyl, hexyl, cyclohexyl, heptyl, octyl, decyl, decyl, lauryl a group in which a substituent having at least one hydrogen atom of the group is substituted with a substituent such as a group having 1 to 2 carbon atoms and having a substituent of (1, 6 + ml 7 ) hydrogen atoms; a phenyl group; Base, 2_naphthyl, 1-indenyl, 2-indenyl, 9 a group in which a fluorenyl group having at least one hydrogen atom in the group is substituted with a substituent such as a group having 6 to 3 Å carbon atoms which may have a substituent; (Methoxy 6 + ml 7) hydrogen atoms; , ethoxy, propoxy, butoxy, pentyloxy, hexyloxy, decyloxy, lauryloxy, cyclopropoxy, cyclobutoxy, cyclopentyloxy, cyclohexyloxy, cyclo The number of carbon atoms which may have a substituent, such as a decyloxy group, a hydroxyl group, a decyloxy group, a decyloxy group, a gold alkoxy group, or a substituent of at least one of these groups, may be substituted with a substituent. 73 323451 201234576 1 to 50 Alkoxy group for removing (ml6 + ml7) hydrogen atoms; group for removing (ml6 + ml7) hydrogen atoms from an amine group having a substituent containing a carbon atom; by a stone eve having a substituent containing a carbon atom The base is removed (ml6 + ml7) of hydrogen atoms, and from the viewpoint of easiness of synthesis of the raw material monomers, it is preferred to remove (ml6 + ml7) hydrogen atoms from the group and remove them by aryl groups (ml6). + ml7) A group of hydrogen atoms, which are removed by an alkoxy group (ml6+ml7) of hydrogen atoms. The structural unit series represented by the chemical formula (27) is exemplified by the following structural unit. 74 323451 201234576 -X+{H3CH2C(H3Q2N] H3C(OH2CH2C)2'

：Ν(ΟΗ3)2〇Η2〇Η3}<Χ··Χ+{Η3〇Η2〇(Η3〇)2Ν； 丨(CH2CH20)2CH3 H3C(OH2CH2C)3i:Ν(ΟΗ3)2〇Η2〇Η3}<Χ··Χ+{Η3〇Η2〇(Η3〇)2Ν; 丨(CH2CH20)2CH3 H3C(OH2CH2C)3i

X = F· Cl. ΒγΛ BPh4_ CF3S03 :N{CH3}2CH2CH3}"X. 丨(CH2CH20)3CH3 X = F. Cl, Br, I, BPh4, CF3SO3X = F· Cl. ΒγΛ BPh4_ CF3S03 :N{CH3}2CH2CH3}"X. 丨(CH2CH20)3CH3 X = F. Cl, Br, I, BPh4, CF3SO3

X+{H3CH2C(H3C)2NhY^ ^Y-{N(CH3)2CH2CH3rx· H3C(OH2CH2C)4CF C)(CH2CH20)4CH3 X = F.CI_Br, l_BPh4.CF3S03 •X+{(H3CH2C)2N}'Y^ rN^NiCHaJaCHaCHa}^· HaCiOHaCHaCJsCi^ <D(CH2CH2〇)5CH3 X = F, Cl, Br. I. BPh4. CF3SO3X+{H3CH2C(H3C)2NhY^ ^Y-{N(CH3)2CH2CH3rx· H3C(OH2CH2C)4CF C)(CH2CH20)4CH3 X = F.CI_Br, l_BPh4.CF3S03 •X+{(H3CH2C)2N}'Y^ rN ^NiCHaJaCHaCHa}^· HaCiOHaCHaCJsCi^ <D(CH2CH2〇)5CH3 X = F, Cl, Br. I. BPh4. CF3SO3

•X+{H3CH2C(H3C)2N: H3C(OH2CH2C)ei X = F. Cl, Br, I, BPh4, CF3SO3 N(CH3)2CH2CH3p(.-X+{H3CH2C(H3C>2l 丨(CH2CH20)eCH3 H3C(OH2CH2C) x=• X+{H3CH2C(H3C)2N: H3C(OH2CH2C)ei X = F. Cl, Br, I, BPh4, CF3SO3 N(CH3)2CH2CH3p(.-X+{H3CH2C(H3C>2l 丨(CH2CH20)eCH3 H3C(OH2CH2C ) x=

:N(CH3>2CH2CH3p(-丨(CH2CH20)7CH3 F. Cl, Br, I. BPh4. CF3S03:N(CH3>2CH2CH3p(-丨(CH2CH20)7CH3 F. Cl, Br, I. BPh4. CF3S03

H3C(OH2CH2C)2〇V^ pyO(CH2CH2〇)2CH3 -Χ+{Η3〇Η20(Η3〇2Ν}/Λ^ X = F, Cl, Br, I, BPh4, CF3SO3 H3C(0H2CH2C)3O·^ fyO(CH2CH20)3CH3 ^{HaCHaCtHaCJzNT^ Ν^{Ν(ΟΗ3)2〇Η2〇Η3}'χ-X = F, Cl, Br, I, BPh4, CF3SO3H3C(OH2CH2C)2〇V^ pyO(CH2CH2〇)2CH3 -Χ+{Η3〇Η20(Η3〇2Ν}/Λ^ X = F, Cl, Br, I, BPh4, CF3SO3 H3C(0H2CH2C)3O·^ fyO (CH2CH20)3CH3 ^{HaCHaCtHaCJzNT^ Ν^{Ν(ΟΗ3)2〇Η2〇Η3}'χ-X = F, Cl, Br, I, BPh4, CF3SO3

H3C(OH2CH2C)4〇Y^ py〇(CH2CH20)4CH3 X+{H3CH2C(H3C)2N/''/rN<*>V(CH3)2CH2CH3}+X-X = F, Cl, Br, I, BPh4, CF3SO3 H3C(OH2CH2C)e〇Y，aK pv0(CH2CH20)eCH3 Χ+{Η3ΟΗ2〇(Η3〇2Ν}/Λ^ N^'{N(CH3)2CH2CH3}+X* X = F, Cl, Br, I, BPh4l CF3SO3 Η3〇(ΟΗ2ΟΗ2〇)5〇ν*^ ry〇(CH2CH2〇)sCH3 ·Χ+{Η3〇Η2〇(Η3〇2ΝΓ^ ^iN(CH3)2CH2CH3}+X· X = F, Cl, Br. I, BPh4l CF3SO3 H3C(OH2CH2C〉7〇Y^ ^y〇{CH2CH20>7CH3 •X+{H3CH2C(H3C)2N}/J^ ^'{N(CH3)2CH2CH3}4X-X = F, Cl, Br, I, BPh4l CF3SO3 75 323451 201234576H3C(OH2CH2C)4〇Y^ py〇(CH2CH20)4CH3 X+{H3CH2C(H3C)2N/''/rN<*>V(CH3)2CH2CH3}+XX = F, Cl, Br, I, BPh4, CF3SO3 H3C(OH2CH2C)e〇Y, aK pv0(CH2CH20)eCH3 Χ+{Η3ΟΗ2〇(Η3〇2Ν}/Λ^ N^'{N(CH3)2CH2CH3}+X* X = F, Cl, Br, I, BPh4l CF3SO3 Η3〇(ΟΗ2ΟΗ2〇)5〇ν*^ ry〇(CH2CH2〇)sCH3 ·Χ+{Η3〇Η2〇(Η3〇2ΝΓ^ ^iN(CH3)2CH2CH3}+X· X = F, Cl, Br I, BPh4l CF3SO3 H3C(OH2CH2C>7〇Y^^y〇{CH2CH20>7CH3 •X+{H3CH2C(H3C)2N}/J^ ^'{N(CH3)2CH2CH3}4X-X = F, Cl, Br , I, BPh4l CF3SO3 75 323451 201234576

HaCHsCOOC Χ*{(Η3〇)2ΗΝ)Η2〇HaCHsCOOC Χ*{(Η3〇)2ΗΝ)Η2〇

：OOCH2CH9 CH^NHiCHa^^X- H3CH2COOC 'Χ*{(Η3〇2ΗΝΚΗ2〇)；:OOCH2CH9 CH^NHiCHa^^X- H3CH2COOC 'Χ*{(Η3〇2ΗΝΚΗ2〇);

OOCH2CH3 (CH2)2(NH(CH3)2}*X·OOCH2CH3 (CH2)2(NH(CH3)2}*X·

X = F, Clt Br, I. BPh4, CF3SO3, CH3COOX = F, Clt Br, I. BPh4, CF3SO3, CH3COO

X « F, Cl, Bf, I, BPh4. CF3S〇3, CH3COOX « F, Cl, Bf, I, BPh4. CF3S〇3, CH3COO

OOCH2CH3 (CH^NHiCHa)^OOCH2CH3 (CH^NHiCHa)^

H^CH2〇 *Χ*{(Η3〇)2ΗΝ)(Η2〇)3ι X = F, Cl, Br, I, BPh4, CF3SO3, CH3COOH^CH2〇 *Χ*{(Η3〇)2ΗΝ)(Η2〇)3ι X = F, Cl, Br, I, BPh4, CF3SO3, CH3COO

HaCHaCO' X*{(H3C)2HNKH2C)4<HaCHaCO' X*{(H3C)2HNKH2C)4<

OOCH^CHa b(CH2)4{NH(CH3)2}4XOOCH^CHa b(CH2)4{NH(CH3)2}4X

X = F. Cl, Br, I. BPh4. CF3SO3, CH3COO H3CH2COOC ·Χ+{(Η3〇)2ΗΝΚΗ2〇βΐX = F. Cl, Br, I. BPh4. CF3SO3, CH3COO H3CH2COOC ·Χ+{(Η3〇)2ΗΝΚΗ2〇βΐ

：ooch2ch3 f(CH2)5{NH(CH3)2}+X· H3CH2CO〇i •X*{(H3C)2HN)(H2C]:ooch2ch3 f(CH2)5{NH(CH3)2}+X· H3CH2CO〇i •X*{(H3C)2HN)(H2C]

OOCH2CH3 (CHaWNHiCHs)^^OOCH2CH3 (CHaWNHiCHs)^^

X » F, Ci, Br, I, BPh4, CF3S〇3, CH3COOX » F, Ci, Br, I, BPh4, CF3S〇3, CH3COO

X = F, Cl. 8r. I, BPh4, CF3S〇5, CH3CCX>X = F, Cl. 8r. I, BPh4, CF3S〇5, CH3CCX>

HgCHaCOOC^H )rV-.COOCH2CH3 •X+{H3CH2C(H3C)2NKH2C)2</^ ^CHCHa^CHaJaCHapHsTX* X = F, Cl, Br, I, BPIU, CF3S〇3, CH3COO Η3〇Η2〇00<HgCHaCOOC^H )rV-.COOCH2CH3 •X+{H3CH2C(H3C)2NKH2C)2</^ ^CHCHa^CHaJaCHapHsTX* X = F, Cl, Br, I, BPIU, CF3S〇3, CH3COO Η3〇Η2〇00<

:OOCH2〇H3 »(CH2)4{N(CHa)2CH2CH3)*X·:OOCH2〇H3 »(CH2)4{N(CHa)2CH2CH3)*X·

lOOCHaCHs h3ch2coo< •X^iHaCHzCiHaChNKHaChc/^ ^b(CH2)3<N(CH3)2CH2CH3}+X： _X+{H3CH2C(H3C)2N}(H2C)4<lOOCHaCHs h3ch2coo<•X^iHaCHzCiHaChNKHaChc/^^b(CH2)3<N(CH3)2CH2CH3}+X:_X+{H3CH2C(H3C)2N}(H2C)4<

X s F, Cl, Br, I, BPh4, CF3S03l CHjCOO X « F, Cl, Br, I, BPh4, CF3S03> CH3COOX s F, Cl, Br, I, BPh4, CF3S03l CHjCOO X « F, Cl, Br, I, BPh4, CF3S03> CH3COO

H3CH2CO〇iH3CH2CO〇i

OOCH2CH3 (CH^eWCHa^HsCHaTX'OOCH2CH3 (CH^eWCHa^HsCHaTX'

X * F, Cl, Br, I, BPh4. CH3COO 76 323451 201234576 h3cooc, •X+{(H3C)2HN}(H2C)；X * F, Cl, Br, I, BPh4. CH3COO 76 323451 201234576 h3cooc, •X+{(H3C)2HN}(H2C);

COOCH3 '(CH^NHiCHa)^*COOCH3 '(CH^NHiCHa)^*

H3COOC X+{(H3C)2HN)CeH4Cr^ ^OCeH^NHtCHa)^· X = F, Cl, Br, I, BPfu, CF3S〇3, CH3COOH3COOC X+{(H3C)2HN)CeH4Cr^ ^OCeH^NHtCHa)^· X = F, Cl, Br, I, BPfu, CF3S〇3, CH3COO

H3COOC OOCH3H3COOC OOCH3

X s F. Cl, Br_ I, BPh4· ChSO^ CH3COOX s F. Cl, Br_ I, BPh4· ChSO^ CH3COO

H3COOCv^ rVCO〇CH3 Χ+{Η3ΟΗ2〇(Η3〇2Ν}(Η2〇)30 biCHahiNiCHsJaCHaCHa)^H3COOCv^ rVCO〇CH3 Χ+{Η3ΟΗ2〇(Η3〇2Ν}(Η2〇)30 biCHahiNiCHsJaCHaCHa)^

X = F, Cl, Bf. I. BPh4, CF3SO3. CH3COO H3CH2COOC X+«H3C)2HN}(H2(%X = F, Cl, Bf. I. BPh4, CF3SO3. CH3COO H3CH2COOC X+«H3C)2HN}(H2(%

COOCH2CH3 X = F, Cl, Br, I. BPh4, CF3SO3. CH3COOCOOCH2CH3 X = F, Cl, Br, I. BPh4, CF3SO3. CH3COO

X+iHjCHzCCHa^NjCeH^O όΟβΗ^ΝίΟΗ^^ΟΗ^* X =* F, Cl. Br. I. BPh4, CF3S03, CH3COOX+iHjCHzCCHa^NjCeH^O όΟβΗ^ΝίΟΗ^^ΟΗ^* X =* F, Cl. Br. I. BPh4, CF3S03, CH3COO

H3CH2COOH3CH2COO

.COOCH2CH3 (CHzhWCH山CH2CHa}+X· •X+{H3CH2C(H3C)2NHH2C>3· X = F,C»,Br...BPru.CF3S〇3.CH3C〇〇 H3CH2COO<.COOCH2CH3 (CHzhWCH Mountain CH2CHa}+X· •X+{H3CH2C(H3C)2NHH2C>3· X = F,C»,Br...BPru.CF3S〇3.CH3C〇〇 H3CH2COO<

OOCH2CH3 X+{H3CH2C(H3C)2N)C0H40 0CeH4{N(CH3)2CH2CH3)*X· X = Ff a, Br. I, BPh4. CF3SO3, CH3C00 作為化學式（15)所表示之構造單位，由得到之離子性 聚合物之耐久性之觀‘點來看’最好是化學式(28)所表示之 構造單位。OOCH2CH3 X+{H3CH2C(H3C)2N)C0H40 0CeH4{N(CH3)2CH2CH3)*X· X = Ff a, Br. I, BPh4. CF3SO3, CH3C00 The structural unit represented by the chemical formula (15), obtained from the ion The viewpoint of the durability of the polymer is 'point of view' and is preferably a structural unit represented by the chemical formula (28).

m20 (28)M20 (28)

。、中，R18係表示（l + ml8 + ml9)價之有機基， (在化學式（州T η Λ/ί2、z2、Y3、n2、a2、b2 及 n3 係表示相同 q2、q3、γ2、Μ 备義，ml8、ml9及m20係分別獨立地表示 於前面敘述之〆 2 3 2 9 2. In the middle, R18 represents the organic group of (l + ml8 + ml9), (in the chemical formula (state T η Λ / ί2, z2, Y3, n2, a2, b2 and n3 represent the same q2, q3, γ2, Μ For the sake of redundancy, ml8, ml9 and m20 are independently represented in the above description 〆 2 3 2 9 2

Ri8、ml8、ml9、Q2、Q3、Υ2、Μ2、Z2、 1以上之整數’ κ 77 323451 201234576 Υ3、n2、a2、b2及n3之各個係在具有複數個之狀態下， 具有複數個之 R18、ml8、ml9、Q2、Q3、Y2、Μ2、Z2、 Y、n2、a2、b2及n3，分別可以相同，也可以不同。） 在化學式(28)中’作為R18所表示之（l + ml8 + ml9)價 之有機基係列舉例如：曱基、乙基、丙基、異丙基、丁基、 異丁基、sec·丁基、tert_丁基、戊基、己基、環己基、庚基、 辛基、壬基、癸基、月桂基經取代基取代這些基令之至少 1個氳原子之基等之可以具有取代基之碳原子數1至20之 烷基除去(ml8 + ml9)個氫原子之基；苯基、卜萘基、2-萘 基、1-1基、2-蒽基、9-蒽基經取代基而取代這些基中之 至少1個氫原子之基等之可以具有取代基之碳原子數6至 30之芳基除去(mi8 + ml9)個氫原子之基；曱氧基、乙氧 基、丙氧基、丁氧基、戊氧基、己氧基、壬氧基、月桂氧 基、環丙氧基、環丁氧基、環戊氧基、環己氧基、環壬氧 基、環月桂氧基、降莰氧基、金鋼烧氧基經取代基取代這 • 些基中之至少1個氫原子之基等之可以具有取代基之碳原 子數1至50之烷氧基除去(ml8 + ml9)個氫原子之基；由 具有包含碳原子之取代基之胺基除去（ml8 + ml9)個氫原 子之基；由具有包含碳原子之取代基之石夕基除去（m18 + ml 9)個氫原子之基’由原料單體合成之容易度之觀點來看 則最好是由烷基除去(ml8 + ml9)個氫原子之▲、由芳基除 去（ml8 + ml9)個氫原子之基、由烷氧基除去(ml8 + ml9) 個氫原子之基。 作為化學式(2 8)所表不之構造早位係列舉以下之構造 323451 78 201234576 單位 -X+{(H3C)2HNX 戶(CH2CH20)2CH3 ·χ+{(Η3〇2ΗΝχ 戶(CH2CH20)3CH3 *Χ*{(Η3〇2ΗΝΚ P(CH2CH2〇)4CH3Ri8, ml8, ml9, Q2, Q3, Υ2, Μ2, Z2, an integer greater than 1 'κ 77 323451 201234576 Υ3, n2, a2, b2, and n3 each have a plurality of R18s in a plurality of states , ml8, ml9, Q2, Q3, Y2, Μ2, Z2, Y, n2, a2, b2, and n3, respectively, may be the same or different. In the chemical formula (28), the organic group of the valence of (l + ml8 + ml9) represented by R18 is as follows: mercapto, ethyl, propyl, isopropyl, butyl, isobutyl, sec. a butyl group, a tert-butyl group, a pentyl group, a hexyl group, a cyclohexyl group, a heptyl group, an octyl group, a decyl group, a fluorenyl group, a lauton group, a substituent substituted with at least one fluorene atom of these groups, and the like may have a substitution. a group having 1 to 20 carbon atoms in the group to remove (ml8 + ml9) hydrogen atoms; phenyl, naphthyl, 2-naphthyl, 1-1, 2-indenyl, 9-fluorenyl substituent And an aryl group having 6 to 30 carbon atoms which may have a substituent in place of at least one hydrogen atom of these groups, etc., a group of (mi8 + ml9) hydrogen atoms; a methoxy group, an ethoxy group, a propylene group Oxy, butoxy, pentyloxy, hexyloxy, decyloxy, lauryloxy, cyclopropoxy, cyclobutoxy, cyclopentyloxy, cyclohexyloxy, cyclodecyloxy, cyclolauric An alkoxy group having 1 to 50 carbon atoms which may have a substituent, such as an oxy group, a decyloxy group, or a gold alkoxy group, substituted by a substituent at least one of these groups; + m L9) a group of hydrogen atoms; a group which removes (ml8 + ml9) hydrogen atoms from an amine group having a substituent containing a carbon atom; and is removed by a group having a substituent containing a carbon atom (m18 + ml 9) From the viewpoint of easiness of synthesis of a raw material monomer, it is preferable to remove (ml8 + ml9) hydrogen atoms from the alkyl group, and remove (ml8 + ml9) hydrogen atoms from the aryl group. The group is removed by an alkoxy group (ml8 + ml9) of hydrogen atoms. The structure listed as the chemical formula (2 8) is the following series: 323451 78 201234576 Unit -X+{(H3C)2HNX Household (CH2CH20)2CH3 ·χ+{(Η3〇2ΗΝχ(CH2CH20)3CH3 *Χ* {(Η3〇2ΗΝΚ P(CH2CH2〇)4CH3

X = F, Cl, Br, I, BPh4, CF3S〇3, CH3COO X = F, Cl, Br, I, BPh4, CFaSOj, CHaCOO X F, Cl, Brt I, BPh4, CF3SO3, CH3COO •X+{(H3C)2HNK p(CH2CH20)5CH3 ·Χ+{(Η3〇2ΗΝΧ p(CH2CH20)eCHa ^{(ΗζΟ)ζΗΝ\ 0(CH2CH20)7CHaX = F, Cl, Br, I, BPh4, CF3S〇3, CH3COO X = F, Cl, Br, I, BPh4, CFaSOj, CHaCOO XF, Cl, Brt I, BPh4, CF3SO3, CH3COO • X+{(H3C) 2HNK p(CH2CH20)5CH3 ·Χ+{(Η3〇2ΗΝΧ p(CH2CH20)eCHa ^{(ΗζΟ)ζΗΝ\ 0(CH2CH20)7CHa

X= F, Cl, Br, lt BPh4, CF3S03i CH3COO X = F, Cl, Br, I, BPh4, CF3S03l CH3COO X * F, Q, Br, I, BPh4, CF3S03l CHaCOOX= F, Cl, Br, lt BPh4, CF3S03i CH3COO X = F, Cl, Br, I, BPh4, CF3S03l CH3COO X * F, Q, Br, I, BPh4, CF3S03l CHaCOO

X+{H3CH2C{H3C)2NK p(CH2CH20)5CHa -X+{H3CH2C(H3C)2NJ, p(CH2CH20)eCH3 ·Χ"{Η30Η20(Η30)2ΝΧ p(CH2CH20)7GH5X+{H3CH2C{H3C)2NK p(CH2CH20)5CHa-X+{H3CH2C(H3C)2NJ, p(CH2CH20)eCH3 ·Χ"{Η30Η20(Η30)2ΝΧ p(CH2CH20)7GH5

X => F, Cl, Br, I, BPh4, CF3SO3, CH3COO X = F, Cl, Br,丨,BPh^· CFsSOa, CH3COO X= F, Q. Br. I, BPlV. CF3S〇3, CHaCOO ^{(HaCfeHN^ -^{(HaCJzHMV -〇(CH2CH20)2CHs /V-OCCHaCHaOJaCHa -〇(0^^2〇)40<3X => F, Cl, Br, I, BPh4, CF3SO3, CH3COO X = F, Cl, Br, 丨, BPh^· CFsSOa, CH3COO X= F, Q. Br. I, BPlV. CF3S〇3, CHaCOO ^{(HaCfeHN^ -^{(HaCJzHMV -〇(CH2CH20)2CHs /V-OCCHaCHaOJaCHa -〇(0^^2〇)40<3

X= F, Cl, Br, I, BPh4, CF3S〇3, CH3COO X = F. Cl, Br· I, BPtu, CF3S〇3« CH3COO X= ft Cl, Br, I, BPh4, CF3S〇3, CH3COOX= F, Cl, Br, I, BPh4, CF3S〇3, CH3COO X = F. Cl, Br· I, BPtu, CF3S〇3« CH3COO X= ft Cl, Br, I, BPh4, CF3S〇3, CH3COO

X*{(H3C)2HIX*{(H3C)2HI

[CH^HsO^CHa[CH^HsO^CHa

xmOaHIxmOaHI

:CH2CH20)7CHs X = F· Cl· BU BPiU» CF3S〇3. CH3COO X = F, Cl, Br. I, BPh^ CF3S〇3, CH3COO X = F. a. Br, I, BPh4, CF3SO3, CH3COO *X*{H3CH2C(H3C)2N\ ^{HaCHaC^QaNV KCHaCHjOJaCHs fVcXCH^H^CHa < H〇(CH2CH2〇)4CH3:CH2CH20)7CHs X = F· Cl· BU BPiU» CF3S〇3. CH3COO X = F, Cl, Br. I, BPh^ CF3S〇3, CH3COO X = F. a. Br, I, BPh4, CF3SO3, CH3COO *X*{H3CH2C(H3C)2N\ ^{HaCHaC^QaNV KCHaCHjOJaCHs fVcXCH^H^CHa < H〇(CH2CH2〇)4CH3

X = F( Cl, Br, I, BPh4l CF3SO3, CH3COO x= F, Cl, Br, I, BPh4, CF3SO3, CH3COO X = F, Cl, Brt l( BPh4, CF3SO3, CH3CCX> 'Χ"{Η3ΟΗ20(Η3〇)2Ν\ ·Χ+{Η3ΟΗ2〇(Η3〇2ΝΚ 'X*{HzCH2C(H3ChU\ -〇(CH2CH2〇)6CH3 /~Λ-〇(〇Η2ΟΗ20)β〇Η3 ( 0(CH2CH20)7CH3X = F( Cl, Br, I, BPh4l CF3SO3, CH3COO x= F, Cl, Br, I, BPh4, CF3SO3, CH3COO X = F, Cl, Brt l( BPh4, CF3SO3, CH3CCX>'Χ"{Η3ΟΗ20( Η3〇)2Ν\ ·Χ+{Η3ΟΗ2〇(Η3〇2ΝΚ 'X*{HzCH2C(H3ChU\ -〇(CH2CH2〇)6CH3 /~Λ-〇(〇Η2ΟΗ20)β〇Η3 ( 0(CH2CH20)7CH3

X = F, Cl, Br, I, BPh4, CF3S03l CH3COO X = F, Cl, Br, I, BPh4, CF3SO3, CH3COO X = F, Cl, Br, I, BPh4, CF3S〇3, CH3COO 化學式（17)所表示之構造單位之例 79 323451 201234576 作為化學式（17)所表示之構造單位由得到之離子性 聚合物之電子輸送性之觀點來看，最好是化學式(29)所表 示之構造單位。X = F, Cl, Br, I, BPh4, CF3S03l CH3COO X = F, Cl, Br, I, BPh4, CF3SO3, CH3COO X = F, Cl, Br, I, BPh4, CF3S〇3, CH3COO Chemical formula (17) Example of the structural unit represented 79 323451 201234576 The structural unit represented by the chemical formula (17) is preferably a structural unit represented by the chemical formula (29) from the viewpoint of electron transportability of the obtained ionic polymer.

卜(Q，n3t『R吁(Q1WY1 (MV(A七21 (在化學式(29)中，Rl9係表示單鍵或（l + m21)價之有機基， H20係表示單鍵或（l + m22)價之有機基，Qi、q3、γΐ、Μι、 Z1、Y3、nl、a卜bl及n3係表示相同於前面敘述之意義， m21及m22係分別獨立地表示1以上之整數。但是，在Ri9 為單鍵時，m21係表示1，在r2〇為單鍵時，m22係表示卜 Q、Q、Y、Μ、Z1、Y3、ni、ai、bi 及 n3 之各個係在 具有複數個之狀態下，具有複數個之Qi、Q3、γΐ、Μ1、Z1、 Υ3、nl、al、bl及η3，分別可以相同，也可以不同。） # 在化學式（29)中，作為R19所表示之（l + m21)價之有機 基係列舉例如：甲基、乙基、丙基、異丙基、丁基、異丁 基、sec-丁基、tert-丁基、戊基、己基、環己基、庚基、辛 基、壬基、癸基、月桂基經取代基取代這些基中之至少1 個氫原子之基等之可以具有取代基之碳原子數i至2〇之烷 基除去（m21)個氫原子之基；苯基、萘基、2-萘基、^蒽 基、2-蒽基、9-蒽基經取代基取代這些基中之至少1個氫 原子之基等之可以具有取代基之碳原子數6至30之芳基除 去(m21)個氫原子之基；曱氧基、乙氧基、丙氧基、丁氧基、 80 323451 201234576 戊氧基、己氧基、壬氧基、月桂氧基、環丙氧基、環丁氧 基、環戊氧基、環己氧基、環壬氧基、環月桂氧基、降莰 氧基、金鋼烷氧基經取代基取代這些基中之至少i個氫原 子之基等之可以具有取代基之碳原子數丨至5〇之烷氧基除 去（m21)個氫原子之基；由具有包含碳原子之取代基之胺基 除去(m21)個氫原子之基；由具有包含碳原子之取代基之矽 基除去（m21)個氫原子之基，由原料單體合成之容易度之觀 鲁點來看，最好是由烷基除去(m21)個氫原子之基、由芳基除 去（m21)個氫原子之基、由烷氧基除去(m21)個氫原子之基。 在化學式（29)中，作為R20所表示之（1 + ^22)價之有機 基係列舉例如：曱基、乙基、丙基、異丙基、丁基、異丁 基、sec-丁基、tert-丁基、戊基、己基、環己基、庚基、辛 基、壬基、癸基、月桂基經取代基取代這些基_之至少1 個氫原子之基等之可以具有取代基之碳原子數1至2〇之烷 基除去(m22)個氫原子之基；苯基、丨_萘基、2_萘基、^蒽 • 基、2_蒽基、9-蒽基經取代基取代這些基中之至少1個氫 原子之基等之可以具有取代基之碳原子數6至30之芳基除 去(m22)個氫原子之基；甲氧基、乙氧基、丙氧基、丁氧基、 戊氧基、己氧·基、壬氧基、月桂氧基、環丙氧基、環丁氧 基、環戊氧基、環己氧基、環壬氧基、環月桂氧基、降莰 氧基、金鋼烷氧基經取代基取代這些基中之至少1個氫原 子之基等之可以具有取代基之碳原子數1至50之烷氧基除 去(m22)個氫原子之基；由具有包含碳原子之取代基之胺基 除去(m22)個氫原子之基；由具有包含碳原子之取代基之矽 81 323451 201234576 基除去(m22)個氫原子之基，由原料單體合成之容易度之觀 點來看，最好是由烷基除去（m22)個氫原子之基、由芳基除 去(m22)個氫原子之基、由烷氧基除去(m22)個氫原子之基。 作為化學式(29)所表示之構造單位係列舉以下之構造 單位。卜(Q, n3t『R唤(Q1WY1 (MV(A7-21), in the formula (29), Rl9 represents a single bond or an organic group of (l + m21) valence, H20 represents a single bond or (l + m22 The organic group of the valence, Qi, q3, γ ΐ, Μι, Z1, Y3, nl, a bl and n3 are the same as those described above, and m21 and m22 each independently represent an integer of 1 or more. When Ri9 is a single bond, m21 represents 1 and when r2〇 is a single bond, m22 means that each of the groups Q, Q, Y, Μ, Z1, Y3, ni, ai, bi, and n3 has a plurality of In the state, there are a plurality of Qi, Q3, γΐ, Μ1, Z1, Υ3, nl, a1, bl, and η3, which may be the same or different.) # In the chemical formula (29), as represented by R19 ( l + m21) The organic series of valences are, for example, methyl, ethyl, propyl, isopropyl, butyl, isobutyl, sec-butyl, tert-butyl, pentyl, hexyl, cyclohexyl, The heptyl group, the octyl group, the fluorenyl group, the fluorenyl group, and the lauryl group are substituted with a substituent such as a group of at least one hydrogen atom of these groups, and the alkyl group having a substituent of the number of carbon atoms i to 2 除去 is removed (m21) Hydrogen source a group which may have a substituent such as a phenyl group, a naphthyl group, a 2-naphthyl group, a 2-fluorenyl group, a 2-fluorenyl group, a 9-fluorenyl group substituted with a substituent at least one of the hydrogen atoms The aryl group having 6 to 30 atoms removes (m21) hydrogen atom groups; decyloxy group, ethoxy group, propoxy group, butoxy group, 80 323451 201234576 pentyloxy group, hexyloxy group, decyloxy group, laurel An oxy group, a cyclopropoxy group, a cyclobutoxy group, a cyclopentyloxy group, a cyclohexyloxy group, a cyclodecyloxy group, a cyclolauroyloxy group, a norbornyloxy group, a gold alkoxy group, which are substituted with a substituent a group of at least one hydrogen atom or the like which may have a substituent having a carbon atom number of 丨 to 5 除去 to remove (m21) hydrogen atoms; and is removed by an amine group having a substituent containing a carbon atom (m21 a group of hydrogen atoms; a group of (m21) hydrogen atoms removed from a sulfhydryl group having a substituent containing a carbon atom, which is preferably removed by an alkyl group from the viewpoint of easiness of synthesis of a raw material monomer (m21) a group of a hydrogen atom, a group of (m21) hydrogen atoms removed from an aryl group, and a (m21) hydrogen atom group removed by an alkoxy group. In the chemical formula (29), The organic group of (1 + 22) valence represented by R20 is, for example, mercapto, ethyl, propyl, isopropyl, butyl, isobutyl, sec-butyl, tert-butyl, pentane. a group having at least one hydrogen atom substituted by a substituent such as a group, a hexyl group, a cyclohexyl group, a heptyl group, an octyl group, a decyl group, a decyl group, an octyl group, a decyl group, a decyl group, a decyl group, a fluorenyl group, a fluorenyl group, a decyl group, a fluorenyl group The alkyl group removes (m22) a hydrogen atom; the phenyl group, the fluorenyl-naphthyl group, the 2-naphthyl group, the fluorenyl group, the 2 fluorenyl group, and the 9-fluorenyl group are substituted with at least one of these groups. a group of a hydrogen atom or the like which may have a substituent of 6 to 30 aryl groups to remove (m22) hydrogen atoms; methoxy, ethoxy, propoxy, butoxy, pentyloxy , hexyloxy, decyloxy, lauryloxy, cyclopropoxy, cyclobutoxy, cyclopentyloxy, cyclohexyloxy, cyclodecyloxy, cyclolauroyloxy, norbornoxy, gold Alkoxy groups in which a metal alkoxy group is substituted with at least one hydrogen atom of these groups by a substituent, etc., an alkoxy group having 1 to 50 carbon atoms which may have a substituent, and a (m22) hydrogen atom group; Atomic The amino group of the substituent removes (m22) groups of hydrogen atoms; the group of (m22) hydrogen atoms is removed from the group of 矽81 323451 201234576 having a substituent containing a carbon atom, from the viewpoint of easiness of synthesis of a raw material monomer It is preferable to remove (m22) hydrogen atom groups from the alkyl group, (m22) hydrogen atom groups from the aryl group, and (m22) hydrogen atom groups from the alkoxy group. The following structural unit is given as a series of structural units represented by the chemical formula (29).

Μ = Li, Na, K, Cs, N(CH3)4Μ = Li, Na, K, Cs, N(CH3)4

H3C(OH2CH2C)3d (CHjj^COO-MH3C(OH2CH2C)3d (CHjj^COO-M

H3C(OH2CH2C)3CH3C(OH2CH2C)3C

^ 'COO-M4 M = Li, Na. K, Cs, N(CH3)4^ 'COO-M4 M = Li, Na. K, Cs, N(CH3)4

C00*M+C00*M+

M = Li, Na, K, Cs, N(CH3)4 M = Li, Na, K. Cs_ N(CH3)4M = Li, Na, K, Cs, N(CH3)4 M = Li, Na, K. Cs_ N(CH3)4

H3C(OH2CH2C)3 丨 S03WI+ M = Li, Na, K, Cs, N(CH3)4 M = Li, Na, K, Cs, N(CH3)4H3C(OH2CH2C)3 丨 S03WI+ M = Li, Na, K, Cs, N(CH3)4 M = Li, Na, K, Cs, N(CH3)4

M = Li, Na, K, Cs, N(CH3)4M = Li, Na, K, Cs, N(CH3)4

H3C(OH2CH2C)3 丨 M = Li, Na, K, Cs, N(CH3)4 作為化學式（17)所表示之構造單位，由得到之離.子性 聚合物之耐久性之觀點來看，最好是化學式（30)所表示之 構造單位。 82 323451 201234576H3C(OH2CH2C)3 丨M = Li, Na, K, Cs, N(CH3)4 The structural unit represented by the chemical formula (17), from the viewpoint of the durability of the obtained sub-polymer It is good to be a structural unit represented by the chemical formula (30). 82 323451 201234576

n>23 丨 m25 (30) 卜22 十(qVy” m24 m26 (在化學式(30)中，R21係表示單鍵或（l + m23)價之有機基， R 2係表示單鍵或（1 + ^24)價之有機基，Q1、Q3、Y1、Μ1、 Ζ1、Y3> nl、bl及η3係表示相同於前面敘述之意義， m23及m24係分別獨立地表示1以上之整數。但是，在n>23 丨m25 (30) 卜22 十(qVy" m24 m26 (In the chemical formula (30), R21 represents a single bond or an organic group of (l + m23) valence, and R 2 represents a single bond or (1 + ^24) organic group of valence, Q1, Q3, Y1, Μ1, Ζ1, Y3> nl, bl and η3 are the same as described above, and m23 and m24 each independently represent an integer of 1 or more.

21 口 R為單鍵時，m23係表示1，在R22為單鍵時，^24係表 示1。m25及m26係分別獨立地表示1以上之整數，m23、 m24、R21、r22、Q1、Q3、Y1、Μ1、Z1、Y3、nl、a卜 bl 及n3之各個係在具有複數個之狀態下，具有複數個之^23、 m24、r21、r22、Q1、Q3、Y1、Μ1、Z1、Y3、nl、al、Μ 及n3 ’分別可以相同，也可以不同。）When the port R is a single bond, m23 indicates 1, and when R22 is a single bond, ^24 indicates 1. M25 and m26 each independently represent an integer of 1 or more, and each of m23, m24, R21, r22, Q1, Q3, Y1, Μ1, Z1, Y3, nl, ab, bl, and n3 has a plurality of states. , a plurality of ^23, m24, r21, r22, Q1, Q3, Y1, Μ1, Z1, Y3, nl, al, Μ, and n3' may be the same or different. )

在化學式（30)中，作為R21所表示之（1 + π123)價之有機 基係列舉例如：甲基、乙基、丙基、異丙基、丁基、異丁 基、sec·丁基、tert-丁基、戊基、己基、環己基、庚基、辛 基、壬基、癸基、月桂基經取代基取代這些基中之至少1 個虱原子之基等之可以具有取代基之碳原子數1至20之烧 基除去(m23)個氫原子之基；苯基、萘基、2-萘基、1-蒽 基、2-蒽基、9-蒽基經取代基取代這些基中之至少1個氫 原子之基等之可以具有取代基之碳原子數6至3〇之芳基除 去(m23)個氫原子之基；甲氧基、乙氧基、丙氧基、丁氧基、 戊氧基、己氧基、壬氧基、月桂氧基、環丙氧基、環丁氧 83 323451 201234576 基、環戊氧基、環己氧基、環壬氧基、環月桂氧基、降莰 氧基、金鋼烷氧基經取代基取代這些基中之至少〗個氯原 子之基等之可以具有取代基之碳原子數1至50之院氧基除 去(m23)個氫原子之基；由具有包含碳原子之取代基之胺基 除去(m23)個氳原子之基；由具有包含碳原子之取代基之石夕 基除去（m23)個氫原子之基，由原料單體合成之容易度之觀 點來看’最好是由烷基除去(m23)個氫原子之基、由芳基除 _ 去(m23)個氫原子之基、由烧氧基除去（m23)個氫原子之基。 在化學式(30)中’作為R22所表示之（1 + 3^24)價之有機 基係列舉例如：甲基、乙基、丙基、異丙基、丁基、異丁 基、sec-丁基、tert_丁基、戊基、己基、環己基、庚基、辛 基、壬基、癸基、月桂基經取代基取代這些基中之至少工 個氫原子之基等之可以具有取代基之碳原子數！至2〇之烷 基除去（m24)個氫原子之基；苯基、萘基、2萘基、丨蒽 基、2-蒽基、9-蒽基經取代基取代這些基中之至少i個氫 籲原子之基等之可以具有取代基之碳原子數6至30之芳基除 去(m24)個氫原子之基；甲氧基、乙氧基、丙氧基、丁氧基、 戊氧基、己氡基、壬氧基、月桂氧基、環丙氧基、環丁氧 基、％戊氧基、環己氧基、環壬氧基、環月桂氧基、降莰 氧基、金鋼烷氧基經取代基取代這些基中之至少〗個氫原 子之基等之可以具有取代基之碳原子數丨至5〇之烷氧基除 去(m24)個氫原子之基；由具有包含碳原子之取代基之胺基 除去(m24)個氫原子之基；由具有包含碳原子之取代基之石夕 基除去(m24)個氫原子之基，由原料單體合成之容易度之觀 84 323451 201234576 點來看，最好是由烷基除去(m24)個氫原子之基、由芳基除 去(m24)個氫原子之基、由烷氧基除去（m24)個氫原子之基。 作為化學式(30)所表示之構造單位係列舉以下之構造 單位。In the chemical formula (30), the organic group of the (1 + π123) valence represented by R21 is, for example, methyl, ethyl, propyl, isopropyl, butyl, isobutyl, sec. butyl, a tert-butyl group, a pentyl group, a hexyl group, a cyclohexyl group, a heptyl group, an octyl group, a decyl group, a fluorenyl group, a lauryl group, a substituent group, a substituent-substituted carbon group, or the like, substituted with at least one of these groups The alkyl group having 1 to 20 atomic groups removes (m23) hydrogen atom groups; phenyl, naphthyl, 2-naphthyl, 1-indenyl, 2-indenyl, and 9-fluorenyl are substituted by a substituent. An aryl group having 6 to 3 Å carbon atoms which may have a substituent of at least one hydrogen atom group, etc., a group of (m23) hydrogen atoms; methoxy group, ethoxy group, propoxy group, butoxy group , pentyloxy, hexyloxy, decyloxy, lauryloxy, cyclopropoxy, cyclobutoxy 83 323451 201234576, cyclopentyloxy, cyclohexyloxy, cyclodecyloxy, cyclolauroyloxy, a decyloxy group, a gold alkoxy group substituted with at least one of the groups of the above-mentioned chlorine atom, such as a substituent, and a substituent having a carbon atom number of 1 to 50 (m23) a group of atoms; (m23) a group of a ruthenium atom removed from an amine group having a substituent containing a carbon atom; a group of (m23) hydrogen atoms removed from a group having a substituent containing a carbon atom, from a raw material list From the viewpoint of the easiness of bulk synthesis, it is preferable to remove (m23) hydrogen atom groups from the alkyl group, remove the (m23) hydrogen atom group from the aryl group, and remove (m23) the alkyl group by the alkoxy group. The base of a hydrogen atom. In the chemical formula (30), the organic group of the (1 + 3^24) valence represented by R22 is, for example, methyl, ethyl, propyl, isopropyl, butyl, isobutyl, sec-butyl. a group, a tert-butyl group, a pentyl group, a hexyl group, a cyclohexyl group, a heptyl group, an octyl group, a decyl group, a fluorenyl group, a lauryl group, a substituent, a substituent, or the like The number of carbon atoms! The alkyl group to 2 除去 removes (m24) hydrogen atom groups; phenyl, naphthyl, 2 naphthyl, anthracenyl, 2-fluorenyl, 9-fluorenyl group substituted at least i of these groups by a substituent An aryl group having 6 to 30 carbon atoms which may have a substituent, such as a hydrogen atom, may be a group of (m24) hydrogen atoms; a methoxy group, an ethoxy group, a propoxy group, a butoxy group, a pentyloxy group , hexyl decyl, decyloxy, lauryloxy, cyclopropoxy, cyclobutoxy, % pentyloxy, cyclohexyloxy, cyclodecyloxy, cyclolauroyloxy, norbornoxy, gold steel The alkoxy group is substituted with a substituent such as at least one of the hydrogen atoms of the group, etc., and the alkoxy group having a carbon atom number of 丨 to 5 除去 having a substituent removes (m24) hydrogen atoms; The amine group of the substituent of the atom removes (m24) a hydrogen atom group; the basis of the ease of synthesis of the raw material monomer by the base of the (m24) hydrogen atom removed from the group having a carbon atom-containing substituent 323451 201234576 It is preferred to remove (m24) hydrogen atoms from the alkyl group, (m24) hydrogen atoms from the aryl group, and (m24) hydrogen from the alkoxy group. The base of the atom. The following structural unit is given as a series of structural units represented by the chemical formula (30).

+WOOC+WOOC

+MOOC+MOOC

*M'OOC*M'OOC

0(CH2CH20)2CH3 0(CH2CH2O)3CH3 OtCHzCHzO^CHa M = U, Na, K, Cs, NMe4 M = Li, Na, K, Cs, NMe4 M = U, Na. K, Cs. NMe« +MO0C0(CH2CH20)2CH3 0(CH2CH2O)3CH3 OtCHzCHzO^CHa M = U, Na, K, Cs, NMe4 M = Li, Na, K, Cs, NMe4 M = U, Na. K, Cs. NMe« +MO0C

+MO0C+MO0C

♦MOOC 0(CH2CH2〇)5CH3 M=UtNa,K.Cs, NMe4 COO.M+♦MOOC 0(CH2CH2〇)5CH3 M=UtNa, K.Cs, NMe4 COO.M+

0(CH2CH20)qCH3 0(CH2CH2O)7CH3 M = Uf Na, K. Cs, NMe4 M » Li, Na, K, Cs, NMe40(CH2CH20)qCH3 0(CH2CH2O)7CH3 M = Uf Na, K. Cs, NMe4 M » Li, Na, K, Cs, NMe4

cocrwr o(ch2ch2o)3ch3 M - Ut Na, K. Cst NMe4 M CO〇-M+Cocrwr o(ch2ch2o)3ch3 M - Ut Na, K. Cst NMe4 M CO〇-M+

•COOt CXCH2CH2〇)4CH3 :Li, Na· K Cs, NMe4 COOM+ o(ch2ch2o)2ch3 M = U. N3.KCS. NMe4 COO.M+•COOt CXCH2CH2〇)4CH3 : Li, Na· K Cs, NMe4 COOM+ o(ch2ch2o)2ch3 M = U. N3.KCS. NMe4 COO.M+

0(CH2CH20)eCH3 0(CH2CH2O)7CH3 M = Ut Na, K, Cs, NMe4 M = LI, Na, K, Cs, NMe40(CH2CH20)eCH3 0(CH2CH2O)7CH3 M = Ut Na, K, Cs, NMe4 M = LI, Na, K, Cs, NMe4

O(CH2CH20)2CH3 CO〇-M+ M = Li, Na, K« Cs, NMe4 •C^CH2CH20)3CH3 COO'M+ M = U· Na. K. Cs, NMe4 O(CH2CH20)4CH3 CO〇-M+ M = Lit Na, K, Cs, NMe4O(CH2CH20)2CH3 CO〇-M+ M = Li, Na, K« Cs, NMe4 •C^CH2CH20)3CH3 COO'M+ M = U· Na. K. Cs, NMe4 O(CH2CH20)4CH3 CO〇-M+ M = Lit Na, K, Cs, NMe4

0(CH2CH20)5CH3 COCTM+ M = Li, Na, K, Cs, NMe4 0(CH2CH20>2CH30(CH2CH20)5CH3 COCTM+ M = Li, Na, K, Cs, NMe4 0(CH2CH20>2CH3

O(CH2CH20)eCH3 COO'M* M = Li, Na, K, Cst NMe4 0(CH2CH20)3CH3O(CH2CH20)eCH3 COO'M* M = Li, Na, K, Cst NMe4 0(CH2CH20)3CH3

0(CH2CH20)7CH3 coaM+ M == Li, Na, K, Cs, NMe4 0(CH2CH20)4CH30(CH2CH20)7CH3 coaM+ M == Li, Na, K, Cs, NMe4 0(CH2CH20)4CH3

COO'M+ M » U, Na, K, Cs, NMe4 0(CH2CH20)5CH3 COO'M+ M = Li, Na, K, Cs, NMe4 0(CH2CH20)eCH3 C001VI+ M e u, Na, Κ» C3, NMe4 0(CH2CH20)7CH3COO'M+ M » U, Na, K, Cs, NMe4 0(CH2CH20)5CH3 COO'M+ M = Li, Na, K, Cs, NMe4 0(CH2CH20)eCH3 C001VI+ M eu, Na, Κ» C3, NMe4 0 (CH2CH20)7CH3

CO〇-M+ M = U, Na, K, Cs, NMe4 COO'M* M = U, Na, K, Cs, NMe4 coo-wr M = Li, Na, K, C8, ΝΜθ4 85 323451 201234576 化學式（20)所表示之構造單位之例 作為化學式（20)所表示之構造單位’由得到之電子輸 送性之觀點來看，最好是化學式(31)所表示之構造單位。 / (31) i Y3-(Q3)n3 j—R24 'R23~f (Q2)n2-Y2 (M2)a2(z2)b21 m27 m28 (在化學式(31)中，R23係表示單鍵或（l + m27)價之有機基’ 鲁 R24係表示單鍵或（1 + m28)價之有機基’ Q2、Q3、Y2、M2、 Z2、Y3、n2、a2、b2及n3係表示相同於前面敘述之意義， m27及m28係分別獨立地表示1以上之整數。但是，在 R23為單鍵時，m27係表示1，在R24為單鍵時，m28係表 示 1。Q2、Q3、Y2、Μ2、Z2、Y3、n2、a2、b2 及 n3 之各 個係在具有複數個之狀態下，具有複數個之Q2、Q3、γ2、 Μ、Ζ、γ3、η2、a2、b2及η3，分別可以相同，也可以 ^ 不同。） 在化學式（31)中，作為R23所表示之（1 + m27)價之有機 基係列舉例如：甲基、乙基、丙基、異丙基、丁基、異丁 基、sec-丁基、tert_丁基、戊基、己基、環己基、庚基、辛 基、壬基、癸基、月桂基經取代基取代這些基中之至少夏 2風原子之基等之可以具有取代基之碳原子數之烧 二除去(m27)個氫原子之基；苯基、丨·萘基、2_萘基、以 蒽基、9_蒽基經取代基取代這些基中之至少工個氫 原子之基等之可以具有取代基之碳原子數6至3〇之芳基除 .323451 86 201234576 去（m2 7)個風原子之基；曱氧基、乙氧基、丙氧基、丁氧基、 戊氧基、己氧基、壬氧基、月桂氧基、環丙氧基、環丁氧 基、環戊氧基、環己氧基、環壬氧基、環月桂氧基、降莰 氧基、金鋼烷氧基經取代基取代這些基中之至少1個氫原 子之基等之可以具有取代基之碳原子數丄至別之烷氧基除 去(m27)個氫原子之基；由具有包含碳原子之取代基之胺基 除去(m27)個氫原子之基；由具有包含碳原子之取代基之矽 φ 基除去(m27)個氫原子之基，由原料單體合成之容易度之觀 點來看，最好是由烷基除去(m27)個氫原子之基、由芳基除 去(m27)個氫原子之基、由烷氧基除去（11127)個氫原子之基。 在化學式(31)中，作為R24所表示之（1 + m28)價之有機 基係列舉例如；甲基、乙基、丙基、異丙基、丁基、異丁 基、sec-丁基、tert-丁基、戊基、己基、環己基、庚基、辛 基壬基、癸基、月桂基經取代基取代這些基中之至少1 個氫原子之基等之可以具有取代基之碳原子數U2〇之烧 •基除去(m28)個氫原子之基；苯基、r蔡基、2-蔡基、丄葱 基、2-蒽基、9-蒽基經取代基取代這些基中之至少丨個氫 原子之基等之可以具有取代基之碳原子數6至3〇之芳基除 去(m28)個氫原子之基；曱氧基、乙氧基、兩氧基、丁氧基、 戊氧基、己氧基、.壬氧基、月桂氧基、環丙氧基、環丁土氧 基、環戊氧基、環己氧基、環壬氧基、環月桂氧基、降获 氧基、金鋼燒氧基經取代基取代這些基中之至少工個氮原 子之基等之可以具有取代基之碳原子數丨至％之烧氧基除 去(m28)個氫原子之基；由具有包含碳原子之取代基之胺基 323451 87 201234576 除去（m28)個氫原子之基；由具有包含碳原子之取代基之石夕 基除去（m28)個氫原子之基，由原料單體合成之容易度之觀 點來看，最好是由烷基除去（m28)個氫原子之基、由芳基除 去(m28)個氫原子之基、由烷氧基除去(m28)個氫原子之基。 作為化學式(31)所表示之構造單位係列舉以下之構造 單位。CO〇-M+ M = U, Na, K, Cs, NMe4 COO'M* M = U, Na, K, Cs, NMe4 coo-wr M = Li, Na, K, C8, ΝΜθ4 85 323451 201234576 Formula (20 The example of the structural unit represented by the chemical formula (20) is preferably a structural unit represented by the chemical formula (31) from the viewpoint of the electron transport property obtained. / (31) i Y3-(Q3)n3 j—R24 'R23~f (Q2)n2-Y2 (M2)a2(z2)b21 m27 m28 (In the chemical formula (31), R23 represents a single bond or (l + m27) The organic group of the valence 'Lu R24 series means a single bond or an organic group of (1 + m28) valence 'Q2, Q3, Y2, M2, Z2, Y3, n2, a2, b2 and n3 are the same as described above. In the meaning, m27 and m28 each independently represent an integer of 1 or more. However, when R23 is a single bond, m27 represents 1, and when R24 is a single bond, m28 represents 1. Q2, Q3, Y2, Μ2 Each of Z2, Y3, n2, a2, b2, and n3 has a plurality of Q2, Q3, γ2, Μ, Ζ, γ3, η2, a2, b2, and η3 in a plurality of states, which may be the same. It can also be different.) In the chemical formula (31), the organic group of the (1 + m27) valence represented by R23 is, for example, methyl, ethyl, propyl, isopropyl, butyl, isobutyl. a sec-butyl group, a tert-butyl group, a pentyl group, a hexyl group, a cyclohexyl group, a heptyl group, an octyl group, a decyl group, a fluorenyl group, a lauryl group, and a substituent substituted by at least a group of these a number of carbon atoms which may have a substituent Second, the (m27) hydrogen atom group is removed; the phenyl group, the fluorenylnaphthyl group, the 2-naphthyl group, the fluorenyl group, and the 9-fluorenyl group are substituted with at least one of the hydrogen atoms of these groups. An aryl group having 6 to 3 Å carbon atoms having a substituent except 323451 86 201234576 A group of (m2 7) wind atoms; an oxime group, an ethoxy group, a propoxy group, a butoxy group, a pentyloxy group, Hexyloxy, decyloxy, lauryloxy, cyclopropoxy, cyclobutoxy, cyclopentyloxy, cyclohexyloxy, cyclodecyloxy, cyclolauryloxy, norbornoxy, gold lanthanane The oxy group is substituted with a substituent such as a group of at least one hydrogen atom of these groups, and the like may have a substituent having a carbon number of 丄 to another alkoxy group to remove (m27) hydrogen atoms; The amine group of the substituent removes (m27) hydrogen atom groups; the (m27) hydrogen atom group is removed from the 矽φ group having a substituent containing a carbon atom, from the viewpoint of easiness of synthesis of the raw material monomer, Preferably, the group of (m27) hydrogen atoms is removed from the alkyl group, the (m27) hydrogen atom group is removed from the aryl group, and the (11127) hydrogen atom group is removed from the alkoxy group. In the chemical formula (31), the organic group of the (1 + m28) valence represented by R24 is, for example, methyl, ethyl, propyl, isopropyl, butyl, isobutyl, sec-butyl, a tert-butyl group, a pentyl group, a hexyl group, a cyclohexyl group, a heptyl group, an octylfluorenyl group, a fluorenyl group, a lauryl group, a substituent such as a group of at least one hydrogen atom among these groups, and the like, and a carbon atom number U2 which may have a substituent The base of the oxime is removed (m28) of a hydrogen atom; the phenyl group, the r-chatyl group, the 2-caiyl group, the lysine group, the 2-anthracenyl group, and the 9-fluorenyl group are substituted with at least one of these groups. a group of a hydrogen atom or the like which may have a substituent of 6 to 3 Å, and an aryl group which removes (m28) hydrogen atoms; a decyloxy group, an ethoxy group, a dioxy group, a butoxy group, a pentyloxy group , hexyloxy, decyloxy, lauryloxy, cyclopropoxy, cyclobutoxy, cyclopentyloxy, cyclohexyloxy, cyclodecyloxy, cyclolauroyloxy, reduced oxy And the base of at least one of the nitrogen atoms of the group is substituted by a substituent, and the base of the nitrogen atom of the group may have a substituent such as a carbon atom having a number of carbon atoms of from 丨 to %, and the base of the (m28) hydrogen atom is removed. a group of (m28) hydrogen atoms removed from an amine group 323451 87 201234576 having a substituent containing a carbon atom; a base of (m28) hydrogen atoms removed from a group having a substituent containing a carbon atom, from a raw material monomer From the viewpoint of easiness of synthesis, it is preferred to remove (m28) hydrogen atom groups from the alkyl group, (m28) hydrogen atom groups from the aryl group, and (m28) hydrogen atoms from the alkoxy group. base. The structural unit series represented by the chemical formula (31) is represented by the following structural unit.

X = F, CI, Br, I, BPh4, CF3SO3, CH3C00 X = F, Cl, Br,丨,BPh4, CF3S〇3, CHaCOOX = F, CI, Br, I, BPh4, CF3SO3, CH3C00 X = F, Cl, Br, 丨, BPh4, CF3S〇3, CHaCOO

H3C{OH2CH2C)3C (CHaJaCHaCHa}·^· X = F, Cl, Br, I, BPh4l CF3SO3, CH3COOH3C{OH2CH2C)3C (CHaJaCHaCHa}·^· X = F, Cl, Br, I, BPh4l CF3SO3, CH3COO

Η30(ΟΗ2ΟΗ2〇)3〇 XqH2)e X = F, Cl, Br, I, BPh4l CF3S03) CH3COO {NiCHaizCH^Ha}^- 作為化學式(20)所表示之構造單位，由得到之離子性 • 聚合物之耐久性之觀點來看，最好是化學式（32)所表示之 構造單位。 |/25-f(QVY_e2(z2)b2|m29 匕Η30(ΟΗ2ΟΗ2〇)3〇XqH2)e X = F, Cl, Br, I, BPh4l CF3S03) CH3COO {NiCHaizCH^Ha}^- The structural unit represented by the chemical formula (20), obtained from the ionic polymer From the viewpoint of durability, it is preferable to be a structural unit represented by the chemical formula (32). |/25-f(QVY_e2(z2)b2|m29 匕

(32) [卞)九| 、 J m32 (在化學式(32)中，R25係表示單鍵或（i + m29)價之有機基， R26係表示單鍵或（l + m3〇)價之有機基，Q2、Q3、Y2、M2、 Z2、Y3、n2、a2、b2及n3係表示相同於前面敘述之意義， 88 323451 201234576 m29及m30係分別獨立地表示1以上之整數。但是，在 R25為單鍵時，m29係表示1，在R26為單鍵時，m3〇係表 示1。m31及m32係分別獨立地表示1以上之整數，m29、 m30、R25、R26、q2、q3、Υ2、μ2、Z2、Y3、n2、a2、b2 及n3之各個係在具有複數個之狀態下，具有複數個之m29、 m30、R25、r26、q2、q3、γ2、μ2、z2、Y3、n2、a2、b2 及n3，分別可以相同，也可以不同。） ^ 在化學式（32)中，作為R25所表示之（1+ m29)價之有機 基係列舉例如：曱基、乙基、丙基、異丙基、丁基、異丁 基、sec-丁基、tert-丁基、戊基、己基、環己基、庚基、辛 基、壬基、癸基、月桂基經取代基取代這些基中之至少1 個氫原子之基等之可以具有取代基之碳原子數1至2〇之烷 基除去(m29)個氫原子之基；苯基、1-萘基、2-萘基、ι_蒽 基、2-蒽基、9-蒽基經取代基取代這些基中之至少1個氫 原子之基等之可以具有取代基之碳原子數6至30之芳基除 • 去(m29)個氫原子之基；曱氧基、乙氧基、丙氧基、丁氧基、 戊氧基、己氧基、壬氧基、月桂氧基、環丙氧基、環丁氧 基、環戊氧基、環己氧基、環壬氧基、環月桂氧基、降莰 氧基、金鋼烷氧基經取代基取代這些基中之至少1個氫原 子之基#之可以具有取代基之碳原子數1至5〇之烧氧基除 去(m29)個氫原子之基；由具有包含碳原子之取代基之胺基 除去(m29)個氫原子之基；由具有包含碳原子之取代基之矽 基除去(m29)個氫原子之基，由原料單體合成之容易度之觀 點來看，最好是由烷基除去(m29)個氫原子之基、由芳基除 89 323451 201234576 去^)個虱原子之基、由絲基除去(m29) 在化學式⑽中，作為p所表示 ^子之基 基係列舉例如1基、乙基、丙基、^ 叫之有機 四丞異丙基、丁基、 基、sec_ 丁基、_ 丁基、戊基、己基、環己基、庚武:(32) [卞) 九 | , J m32 (In the chemical formula (32), R25 represents a single bond or an organic radical of (i + m29) valence, and R26 represents an organic bond of a single bond or (l + m3 〇) The bases, Q2, Q3, Y2, M2, Z2, Y3, n2, a2, b2, and n3 are the same as those described above, and 88 323451 201234576 m29 and m30 are each independently representing an integer of 1 or more. However, at R25 When it is a single bond, m29 represents 1, and when R26 is a single bond, m3〇 represents 1. m31 and m32 each independently represent an integer of 1 or more, m29, m30, R25, R26, q2, q3, Υ2. Each of μ2, Z2, Y3, n2, a2, b2, and n3 has a plurality of m29, m30, R25, r26, q2, q3, γ2, μ2, z2, Y3, n2 in a plurality of states. A2, b2 and n3 may be the same or different.) ^ In the chemical formula (32), the organic group of the (1+ m29) valence represented by R25 is, for example, a mercapto group, an ethyl group, a propyl group, Isopropyl, butyl, isobutyl, sec-butyl, tert-butyl, pentyl, hexyl, cyclohexyl, heptyl, octyl, decyl, decyl, lauryl substituted by these substituents It a group of at least one hydrogen atom or the like having an alkyl group having 1 to 2 ring carbon atoms and having a substituent to remove (m29) hydrogen atoms; phenyl, 1-naphthyl, 2-naphthyl, ι_蒽a aryl group having 6 to 30 carbon atoms which may have a substituent, such as a 2-mercapto group and a 9-fluorenyl group, which may be substituted with a substituent at least one of these groups, etc. Atom group; oxime, ethoxy, propoxy, butoxy, pentyloxy, hexyloxy, decyloxy, lauryloxy, cyclopropoxy, cyclobutoxy, cyclopentyloxy a cyclohexyloxy group, a cyclodecyloxy group, a cyclolauroyloxy group, a norbornyloxy group, a gold alkoxy group substituted with a substituent to substitute at least one hydrogen atom of these groups, and a carbon atom which may have a substituent a group of 1 to 5 Å of an alkoxy group which removes (m29) hydrogen atoms; a group which removes (m29) hydrogen atoms from an amine group having a substituent containing a carbon atom; and a ruthenium having a substituent containing a carbon atom The group of (m29) hydrogen atoms is removed, and from the viewpoint of easiness of synthesis of the raw material monomers, it is preferred to remove (m29) hydrogen atom groups from the alkyl group and divide the aryl group by 89 323451 20123457 6 to ^) a base of a ruthenium atom, removed by a silk group (m29) In the chemical formula (10), as a series of bases represented by p, for example, 1 base, ethyl, propyl, ^ called organic four different Propyl, butyl, cis, butyl, butyl, pentyl, hexyl, cyclohexyl, heptane:

基、壬基、癸基、月桂基經取代絲代這些基#之^ 個氫原子之基等之可以具有取代基之碳原子數4 基除去(m30)個氫原子之基；苯基、r萘基、2•蔡基、^ 基、2·蒽基、9_S基經取代基取代這些基中之至少上個^、 原子之基等之可以具有取代基之碳原子數6至3〇之芳基^ 去（m30)個氫原子之基；甲氧基、乙氧基、丙氧基丁氧 戊氧基、己氧基、壬氧基、月桂氧基、環丙氧基、環丁氧 基、環戊氧基、環己氧基、環壬氧基、環月桂氧基、降莰 氧基、金鋼烷氧基經取代基取代這些基中之至少1個氫原 子之基等之可以具有取代基之碳原子數i至50之烷氧基除 去（m30)個氫原子之基；由具有包含碳原子之取代基之胺基 除去（m30)個氫原子之基；由具有包含碳原子之取代基之矽 基除去(m30)個氫原子之基，由原料單體合成之容易度之觀 點來看，最好是由烷基除去(m30)個氫原子之基、由芳基除 去(m30)個氫原子之基、由烷氧基除去(m30)個氫原子之基。 作為化學式(32)所表示之構造單位係列舉以下之構造 單位。 90 323451 201234576 -^{Hs^CtHaOaN)a group of a hydrogen atom of a group such as a fluorenyl group, a fluorenyl group, a fluorenyl group or a lauryl group, which may have a substituent such as a hydrogen atom; The naphthyl group, the 2, hexyl group, the yl group, the 2 fluorenyl group, and the 9 s group are substituted with at least one of the above groups, the atomic group, etc., which may have a substituent having 6 to 3 carbon atoms. a group of (m30) hydrogen atoms; methoxy, ethoxy, propoxybutoxypentyloxy, hexyloxy, decyloxy, lauryloxy, cyclopropoxy, cyclobutoxy And a cyclopentyloxy group, a cyclohexyloxy group, a cyclodecyloxy group, a cyclolauroyloxy group, a norbornyloxy group, a gold alkoxy group may have a substituent substituted with at least one hydrogen atom of these groups, or the like. The alkoxy group having a carbon number of from 1 to 50 of the substituent removes (m30) a hydrogen atom; a group of (m30) hydrogen atoms removed from an amine group having a substituent containing a carbon atom; and having a carbon atom The thiol group of the substituent removes (m30) hydrogen atom groups, and from the viewpoint of easiness of synthesis of the raw material monomers, it is preferred to remove (m30) hydrogen atom groups from the alkyl group. An aryl group (M30) of the group removed a hydrogen atom, an alkoxy group was removed from the (M30) hydrogen atoms of the group. The structural unit series represented by the chemical formula (32) is the following structural unit. 90 323451 201234576 -^{Hs^CtHaOaN)

0(CH2CHz〇)2CH3 X» F. Cl. Br, I. BPh4l CF3S〇3. CH3COO0(CH2CHz〇)2CH3 X» F. Cl. Br, I. BPh4l CF3S〇3. CH3COO

-X*{H3CH2C(H3C)2N}-X*{H3CH2C(H3C)2N}

0(CH2CH2〇hCH9 X = F, a, Br, \f BPh^ CF3SO3, CH3COO0(CH2CH2〇hCH9 X = F, a, Br, \f BPh^ CF3SO3, CH3COO

0(CH2CH2〇)4CH3 X » F, a, Br. 1, BPh4. CFaSOa, CH3COO •X^HaCHaCiHgCfeN},0(CH2CH2〇)4CH3 X » F, a, Br. 1, BPh4. CFaSOa, CH3COO •X^HaCHaCiHgCfeN},

0{CH2CH20)5CH3 X = F, Cl, Br, I, BPh4, CF3$〇3, CH3COO X*{H3CH2C(H3C)2N}0{CH2CH20)5CH3 X = F, Cl, Br, I, BPh4, CF3$〇3, CH3COO X*{H3CH2C(H3C)2N}

^{HaCHaCiHaCfeN},^{HaCHaCiHaCfeN},

0(CH2CH2〇}2CH3 X « F, a, Br. I, BPh4, CFjSOs, CH3COO {NCCHaJaCHaCHa}*^ 0(CH2CM20)eCH3 X = F, Cl, Br, I, BPN，CF3S03, CH3COO {NiCHahCHaCHa)4^ 0(CH2CH20)7CH3 X = F. Cl. Br. I, BP〜, CF3S03· CH3COO {NiCHa^HzCHaJ^X·0(CH2CH2〇}2CH3 X « F, a, Br. I, BPh4, CFjSOs, CH3COO {NCCHaJaCHaCHa}*^ 0(CH2CM20)eCH3 X = F, Cl, Br, I, BPN, CF3S03, CH3COO {NiCHahCHaCHa)4 ^ 0(CH2CH20)7CH3 X = F. Cl. Br. I, BP~, CF3S03· CH3COO {NiCHa^HzCHaJ^X·

{^(CHaJzC^CHs}*^ 0(CH2CH2〇)3CH9 X = F, Cl. Br, lt BPh4, CF3SO3. CH3COO {NiCHgJzC^CHa)4/-{^(CHaJzC^CHs}*^ 0(CH2CH2〇)3CH9 X = F, Cl. Br, lt BPh4, CF3SO3. CH3COO {NiCHgJzC^CHa)4/-

0(CH2CH2〇)4CH3 X = F, Cl, Br, I, BPh4, CF3S〇3. CH3COO {H(CH3)2CH2CH^*X0(CH2CH2〇)4CH3 X = F, Cl, Br, I, BPh4, CF3S〇3. CH3COO {H(CH3)2CH2CH^*X

0(CH2CH20)5CH3 0(CH2CH2O)eCH3 0(CH2CH20)tCH3 X s F. Cl, Br, I, BPh4, CF3S03i CH3COO X = F, Cl, Br, I, BPiu, CF3S03, CH3COO X = F, a, Br, I, BPhn, CF3S03l CH3COO0(CH2CH20)5CH3 0(CH2CH2O)eCH3 0(CH2CH20)tCH3 X s F. Cl, Br, I, BPh4, CF3S03i CH3COO X = F, Cl, Br, I, BPiu, CF3S03, CH3COO X = F, a, Br, I, BPhn, CF3S03l CH3COO

0(CH2CH2〇)2CH3 {NiCHaJaCHaCH^V X = F, Ct, Brt I, BPh4. CF3SO3. CHaCOO0(CH2CH2〇)2CH3 {NiCHaJaCHaCH^V X = F, Ct, Brt I, BPh4. CF3SO3. CHaCOO

OiCHaCHaOJsCHa X = F. Cl, Br· l_ BPfu· CFaSOa* CH3COO 0(CH2CH2〇)3CH3 {N(CH3)2CH2CH3}4X· X= F. Cl. Br. I, BPru，CFsSOa. CH3COO 'OiCHzCHaOJeCHa X = Ft a, Br. I. BPh4, CF3SO3. CH3COO 〇(ΟΗ2〇Η2〇)4〇Η3OiCHaCHaOJsCHa X = F. Cl, Br· l_ BPfu· CFaSOa* CH3COO 0(CH2CH2〇)3CH3 {N(CH3)2CH2CH3}4X· X= F. Cl. Br. I, BPru, CFsSOa. CH3COO 'OiCHzCHaOJeCHa X = Ft a, Br. I. BPh4, CF3SO3. CH3COO 〇(ΟΗ2〇Η2〇)4〇Η3

{NiCH^^CH^V X = F. Cl, Br, I, BPh4, CF3$03, CH3COO O(CH2CH2〇)tCH3 {NiCHahCHaCHa}^{NiCH^^CH^V X = F. Cl, Br, I, BPh4, CF3$03, CH3COO O(CH2CH2〇)tCH3 {NiCHahCHaCHa}^

X: F, Cl. Br.丨.BW14, CF3S〇3. CH3COOX: F, Cl. Br.丨.BW14, CF3S〇3. CH3COO

0(CH2CH2〇}2CH3 {NiCHabC^CHaJ^X*0(CH2CH2〇}2CH3 {NiCHabC^CHaJ^X*

X = F, Cl, Br, I, BPh4( CF3S〇3. CH3COO 0(CH2CH2〇)3CH3 WCH^JjQHaCH^ X = Ft Cl, Br, I, BPh4, CF3SO3, CH3COO 0(CH2CH2〇)4CH3 X = F, Cl, Br, I. BPru. CF3S〇3, ch3coo o(ch2ch2o)5ch3 0(CH2CH20)eCH3 CHCHzCH^tCH,X = F, Cl, Br, I, BPh4( CF3S〇3. CH3COO 0(CH2CH2〇)3CH3 WCH^JjQHaCH^ X = Ft Cl, Br, I, BPh4, CF3SO3, CH3COO 0(CH2CH2〇)4CH3 X = F , Cl, Br, I. BPru. CF3S〇3, ch3coo o(ch2ch2o)5ch3 0(CH2CH20)eCH3 CHCHzCH^tCH,

{N(CH3)2CH2CH3}+X* X= F, Cl, Br, I, BPh4, CF3S〇3, CH3COO{N(CH3)2CH2CH3}+X* X= F, Cl, Br, I, BPh4, CF3S〇3, CH3COO

{NiCHaJaCHaCHa)4^ {N(CH3)2CH2CH3}+X- X = F, Cl, Br, I, BPh4, CF3S03, CH3COO X = F, Cl, Br,!, BPh4, CF3SO3, CH3COO •其他之構造單位 使用於本發明之離子性聚合物還可以具有化學式(33) 所表示之1種以上之構造單位。 91 323451 201234576 -Ar5- -X'- m33 m34 (33) (在化學式（33)中’ Ar5係表示可以具有取代基之2價之芳香 族基或者是可以具有取代基之2價之芳香族胺殘基，χ，係表 示可以具有取代基之亞胺基、可以具有取代基之亞石夕基、可 以具有取代基之伸乙烯基或伸乙炔基，m33及m34係分別 獨立地表示0或1 ’ m33及m34之至少一個係成為1。） 作為化學式（33)中之Ar5所表示之2價之芳香族基係 列舉如：2價之芳香族烴基、2價之芳香族雜環基。作為該 ，2價之芳香族基係列舉如：苯環、吡啶環、1>2_二嗪環、‘丨,= 二嗪環、1，4-二嗪環、丨，^三嗪環、呋喃環、n比咯環、噻 吩環、吡唑環、咪唑環、噁唑環、噁二唑環、吖二唑環等 士環^芳香環除去2個氫原子之2價基；由縮合該單環式 芳香環而级成之群組中選出之2個以上之縮合多環式 環除去2個氫原子之2價基；由藉著單鍵、伸乙烯基或伸 乙炔基而連、纟。由轉環式料環和购合乡 成之群組中選出之2個以p s 個以上之方香j哀所組成之芳香環集合 ^去2個氫原子之2價基；由具有藉著亞甲基、伸乙基、 隹f絲等之2價基㈣該縮合付式芳香環或該芳 Γ二之相鄰接之2個芳香環之交聯多環式芳香環除去 2個氫原子之2價基等。 =述縮合多環式料環+，縮合之單環式芳香環之數 目’由離t㈣合物之溶解性之觀點來看，最好是2至4, 更加理k 2至3 ’甚至最好是2。在前述芳香環集合中， 92 323451 201234576 連結之芳香環之數目，由溶解性之觀點來看，最好是2至4, ^加理想;^ 2至3 ’甚至最好是2。在前述交聯多環式芳香{NiCHaJaCHaCHa)4^ {N(CH3)2CH2CH3}+X- X = F, Cl, Br, I, BPh4, CF3S03, CH3COO X = F, Cl, Br, !, BPh4, CF3SO3, CH3COO • Other structural units The ionic polymer used in the present invention may have one or more structural units represented by the chemical formula (33). 91 323451 201234576 -Ar5- -X'- m33 m34 (33) (In the chemical formula (33), 'Ar5' represents a divalent aromatic group which may have a substituent or a divalent aromatic amine which may have a substituent The residue, hydrazine, represents an imido group which may have a substituent, a sulfite group which may have a substituent, a vinyl group or an ethynyl group which may have a substituent, and m33 and m34 each independently represent 0 or 1 At least one of m33 and m34 is 1. The divalent aromatic group represented by Ar5 in the chemical formula (33) is a divalent aromatic hydrocarbon group or a divalent aromatic heterocyclic group. As such, the divalent aromatic group series may be, for example, a benzene ring, a pyridine ring, a 1> diazide ring, a '丨, a diazine ring, a 1,4-diazine ring, an anthracene, a triazine ring, a furan ring, an n-pyrocyclic ring, a thiophene ring, a pyrazole ring, an imidazole ring, an oxazole ring, an oxadiazole ring, an oxadiazole ring, etc., an aromatic ring to remove a divalent group of two hydrogen atoms; a condensed polycyclic ring selected from the group consisting of a monocyclic aromatic ring and a group of two or more hydrogen atoms removed by a condensed polycyclic ring; by a single bond, a vinyl group or an ethynyl group, . Two selected from the group of the rotary ring material and the group of the purchased townships, the aromatic ring set consisting of ps or more square fragrants, and the two valence groups of two hydrogen atoms; a divalent group such as a methyl group, an ethyl group, or a fluorene group; (4) a crosslinked polycyclic aromatic ring of the condensed aromatic ring or two adjacent aromatic rings of the aryl group 2, which removes two hydrogen atoms 2 price base and so on. = condensed polycyclic ring +, the number of condensed monocyclic aromatic rings 'from the point of view of the solubility of the t (tetra) compound, preferably 2 to 4, more rational k 2 to 3 ' even better It is 2. In the above aromatic ring set, the number of aromatic rings to which 92 323451 201234576 is linked is preferably 2 to 4, ^ plus ideal from the viewpoint of solubility; ^ 2 to 3 ' or even preferably 2. Cross-linked polycyclic aromatic

作為前述單環式芳香更=二，是2。As the aforementioned monocyclic aromatic, it is more than two and is 2.

作為前述縮合多環式㈣環係鮮例如」 以 下之環As the condensed polycyclic (tetra) ring system, for example, the following ring

323451 93 201234576 作為前述芳麵集合係列舉例如 以下之環323451 93 201234576 As the aforementioned series of aromatic faces, for example, the following ring

作為前述交聯多環式芳香 環係列舉例如以下之環As the above-mentioned crosslinked polycyclic aromatic ring series, for example, the following ring

^><^b yy 由前述離子性聚合物之電 任何-種或兩者之觀點來二電洞接受性之 基最好是^料45錢f 2償之芳香族 71、化學式77至化學式8〇、广式61至化學式 式93哎化風+ t 予式91、化學式92、化風 MW96所表示之環除去2個氫原子之2價^ 323451 201234576 更加理想是由化學式45至化學式50、化學式59、化學式 6〇、化學式77、化學式8〇、化學式91、化學式92或化學 式96所表示之環除去2個氫原子之2價基。 前述2價芳香族基係可以具有取代基。作為該取代基 係列舉與前述Q1之相關說明中所例示之取代基為同樣之 取代基。^><^b yy From the viewpoint of any one or both of the foregoing ionic polymers, the basis of the second hole acceptability is preferably 45% of the amount of the aromatic compound 71, the chemical formula 77 to Chemical formula 8〇, broad formula 61 to chemical formula 93 哎化风+ t Pre-form 91, chemical formula 92, cyclone MW96 ring removed 2 hydrogen atoms 2 valence ^ 323451 201234576 More preferably from chemical formula 45 to chemical formula 50 The ring represented by Chemical Formula 59, Chemical Formula 6, Chemical Formula 77, Chemical Formula 8, Chemical Formula 91, Chemical Formula 92, or Chemical Formula 96 removes the divalent group of two hydrogen atoms. The divalent aromatic group may have a substituent. The substituents exemplified in the description of the above Q1 are the same substituents as the substituent series.

作為化學式(33)中之Ar5所表示之2價芳香族胺殘基 係列舉化學式（34)所表示之基。The divalent aromatic amine residue represented by Ar5 in the chemical formula (33) is a group represented by the chemical formula (34).

(34) (在化學式（34)中，Ar6、Ar7、A/及A#係分別獨立地表示 可以具有取代基之伸芳基或者是可以具有取代基之2價之 雜環基，Ar 、Ar11及Ar12係分別獨立地表示可以具有取 代基之芳基或者是可以具有取代基之i價之雜環基，nl〇 及m35係分別獨立地表示〇或1。） 作為前述伸芳基、芳基、2價之雜環基和1價之雜環 基可以具有之取代基係列舉如：齒素原子、烧基、烧氧基、 燒硫基、芳基、芳氧基、芳硫基、芳基絲、芳基炫氧基、 芳基烷硫基、烯基、炔基、芳基埽基、.芳基炔基、醯基、 醯氧基、醯胺基、醯亞胺基、亞胺殘基、取代胺基.、取代 矽基、取代矽氧基、取代矽硫基、取代矽胺基、氰基、硝 323451 95 201234576(34) (In the chemical formula (34), Ar6, Ar7, A/ and A# each independently represent an extended aryl group which may have a substituent or a divalent heterocyclic group which may have a substituent, Ar, Ar11 and The Ar12 group independently represents an aryl group which may have a substituent or a heterocyclic group which may have a substituent of the im group, and the nl〇 and m35 systems each independently represent hydrazine or 1). As the aforementioned aryl group, aryl group, The divalent heterocyclic group and the monovalent heterocyclic group may have a series of substituents such as a dentate atom, an alkyl group, an alkoxy group, a sulfur-containing group, an aryl group, an aryloxy group, an arylthio group, or an aryl group. Silk, aryl methoxy, arylalkylthio, alkenyl, alkynyl, aryl fluorenyl, arylalkynyl, decyl, decyloxy, decylamino, quinone imine, imine residue Base, substituted amine group, substituted fluorenyl group, substituted methoxy group, substituted thiol group, substituted guanylamino group, cyano group, nitrate 323451 95 201234576

基、1價雜環基、雜芳氧基、雜芳硫基、烷氧基羰基、芳 氧基羰基、芳基烷氧基羰基、雜芳氧基羰基及綾基等。該 取代基係可以是乙烯基、乙絲、丁烯基、㈣酸基、^ 稀酸醋基、丙烯醯胺基、甲基丙烯酸基、甲基旨基、 甲基丙婦醯胺基、乙稀基_基、乙稀基胺基、石夕烧醇美、 具有小員環(環丙基、環丁基、環氧基、氧雜環丁炫基t雙 乙稀嗣基、環硫化物基等）之基、_基、内醯胺基、或者 是含有矽氧烷衍生物之構造之基等之交聯基。 在_為〇之狀態下，Αγ6中之碳原子和Αγ8+之碳原 t係:直接地鍵結，亦可以透m等之2價基而、 進行鍵結。 作為藉由Ar、A〜而表示之芳基、"賈_ =於前面之敘述說明作為取代基而例舉之芳基:η; 作為藉由 Ar6、Ar7、Αι·8 Λ 9 由芳香族伸芳基係列舉 所殘留之料®，列舉具備 Λ,、之2個風原子 立之苯環或稠環之2個以：：：具備稠環之基、獨 上透過早鍵或2價有機基、例如 伸苯基、伸聯苯基二至至：：:版^ 基伸苯基、μ萘基、2•伸=氧基伸苯基、q至以炫 伸慧基。前述伸芳基中之氫"；基:;^基、2·伸蒽基、9- 原子取代伸芳基係列舉：代。作為氣 亂伸本基#。在伸芳基之中，最 323451 96 201234576 好是伸苯基、伸聯苯基、Cl至c12烷氧基伸苯基、Ci至 Ci2烧基伸笨基。 作為藉由Ar6、Ar7、Ar8、Ar9表示之2價之雜環基係 列舉如：由雜環化合物除去2個氫原子後之殘留之原子 團。在此’所謂雜環化合物係指在具備環式構造之有機化 合物中’作為構成環之元素，不僅是碳原子，it且，還包 含氧原子、硫原子、氮原子、磷原子、硼原子、矽原子、 I 硒原子、碲原子、砷原子等之雜原子之有機化合物。2價 之雜環基係可以具有取代基。2價之雜環基之碳原子數一 般為4至6〇 ’最好是4至20。此外，在2價雜瓖基之碳原 子數中’並不包含取代基之碳原子數。作為此種2價之雜 每基係列舉例如：噻吩二基、Ci至Ci2烷基噻吩二基、吡 咯—基、呋喃二基、吡啶二基、Ci至Cl〗烷基吡啶二基、 噠嗪二基、嘧啶二基、吡嗪二基、三嗪二基、吡咯啶二基、 哌°疋二基、喹啉二基、異喹啉二基，其中，更加理想是噻 _呔一基、ci至Clz烧基嗟吩二基、π比咬二醯基及至Cn 貌基吡啶二基。 包含2價之芳香族胺殘基作為構造單位之離子性聚合 物還可以具有其他之構造單位。作為其他之構造單位係列 舉如.伸苯基、伸苐二基等之伸芳基等。此外，在這些離 子丨生聚合物中，最好是包含交聯基者。 此外，作為化學式(34)所表示之2價之芳香族胺殘基 係例舉如：由下列之化學式101至化學式110所表示之芳 香族胺除去2個氫原子之基。 323451 97 201234576A group, a monovalent heterocyclic group, a heteroaryloxy group, a heteroarylthio group, an alkoxycarbonyl group, an aryloxycarbonyl group, an arylalkoxycarbonyl group, a heteroaryloxycarbonyl group, an anthracenyl group and the like. The substituent may be a vinyl group, an ethylene wire, a butenyl group, a (tetra) acid group, a dilute acid vine group, an acrylamide group, a methacryl group, a methyl group, a methyl propyl sulfhydryl group, or a Dilute-based, ethylamino-based, Shixia-smelling, having a small member ring (cyclopropyl, cyclobutyl, epoxy, oxetane t-diethylene sulfhydryl, an episulfide group, etc.) A group, a group, an indoleamine group, or a crosslinking group having a structure such as a siloxane derivative. In the state of _ 〇, the carbon atom in Αγ6 and the carbon source t in Αγ+ are directly bonded, and may also be bonded through a divalent group such as m. The aryl group represented by Ar and A~, and the following description of the aryl group as a substituent: η; as an aromatic group by Ar6, Ar7, Αι·8 Λ 9 In the series of scented residues of the aryl group, there are two benzene rings or fused rings of two wind atoms: :, with a fused ring, alone through early bonds or two-valent organic The base, for example, a phenyl group, a phenyl group, a phenyl group, a phenyl group, a naphthyl group, a phenyl group, a phenyl group, and a phenyl group. The hydrogen in the above-mentioned aryl group "; base: 2, thiol, 9-atom substituted aryl series: generation. As the gas chaos stretches the base #. Among the aryl groups, the most 323451 96 201234576 is preferably a phenyl group, a biphenyl group, a C to a c12 alkoxy group, and a Ci to Ci2 group. The divalent heterocyclic group represented by Ar6, Ar7, Ar8 or Ar9 is exemplified by an atomic group remaining after removing two hydrogen atoms from the heterocyclic compound. Here, the term "heterocyclic compound" means an element which constitutes a ring in an organic compound having a ring structure, and is not only a carbon atom, but also includes an oxygen atom, a sulfur atom, a nitrogen atom, a phosphorus atom, a boron atom, An organic compound of a hetero atom such as a ruthenium atom, an I selenium atom, a ruthenium atom or an arsenic atom. The divalent heterocyclic group may have a substituent. The number of carbon atoms of the divalent heterocyclic group is usually from 4 to 6 Å, preferably from 4 to 20. Further, 'the number of carbon atoms in the divalent heterofluorene group' does not include the number of carbon atoms of the substituent. As such a bivalent hetero group, for example, a thiophenediyl group, a Ci to Ci2 alkylthiophenediyl group, a pyrrolyl group, a furyldiyl group, a pyridyldiyl group, a Ci to Cl alkylpyridinediyl group, a pyridazine group. a diyl group, a pyrimidine diyl group, a pyrazinediyl group, a triazinediyl group, a pyrrolidinyl group, a piperidinyl group, a quinolinediyl group, an isoquinolinyl group, and more preferably a thiophenanthyl group, Ci to Clz is a thiophene diyl group, π is a bit of a diterpene group, and to a Cn-formylpyridinyl group. The ionic polymer containing a divalent aromatic amine residue as a structural unit may have other structural units. As another series of structural units, such as stretching phenyl, stretching bismuth, etc. Further, among these ionized polymers, it is preferred to include a crosslinking base. Further, the divalent aromatic amine residue represented by the chemical formula (34) is exemplified by a group in which two hydrogen atoms are removed from the aromatic amine represented by the following Chemical Formula 101 to Chemical Formula 110. 323451 97 201234576

化學式101至化學式110所表示之芳香族胺係可以在 能夠生成2價之芳香族胺殘基之範圍下具有取代基，作為 該取代基係列舉與前述Q1之相關說明中所例示之取代基 為同樣之取代基’取代基係於存在複數個之狀態下，存在 複數個之取代基，可以相同，也可以不同。 在化學式（33)中，X，係表示可以具有取代基之亞胺 可以具有取代基之亞矽基、可以具有取代基之伸乙烯遵 伸乙块基。作為亞胺基、石夕基或伸乙婦基可以具有之毕 基係列舉如：甲基、乙基、丙基、異丙基、丁基、、異丁; 咖-丁基、tert_丁基、戊基、己基、環己基、庚基、、辛J 2,乙基己基、壬基、癸基、3,7_二f基辛基、月桂基等戈 原子數1至20之烷基；苯基、萘基、2·萘基、^蒽差 2_蒽基、9-蒽基等之碳原子數6至3〇之芳基等，取 323451 98 201234576 於存在複數個之狀態下’存在複數個之取代基，可以相同， 也可以不同。 由空氣、濕氣或熱能對前述離子性聚合物之安定性之 觀點來看’ X最好;I：亞胺基、伸乙婦基、伸乙炔基。 由前述離子性聚合物之電子接受性、電洞接受性之觀 點來看，最好是m33為i，^34為〇。 作為化學式（33)所表示之構造單位，由前述離子性聚 合物之電子接受性之觀點來看，最好是化學式（35)所表示 之構造單位。The aromatic amine represented by the chemical formula 101 to the chemical formula 110 may have a substituent in the range in which a divalent aromatic amine residue can be formed, and the substituent exemplified in the description of the above Q1 as the substituent series is The same substituent 'substituent' is in a state in which a plurality of substituents are present, and a plurality of substituents may be present, which may be the same or different. In the chemical formula (33), X represents an anthracene group which may have a substituent, and an ethylene group which may have a substituent. As the imine group, the Shi Xiji or the ethidium base can have a series of Biji such as: methyl, ethyl, propyl, isopropyl, butyl, isobutyl; coffee-butyl, tert_ Base, pentyl, hexyl, cyclohexyl, heptyl, octyl J 2 , ethylhexyl, decyl, decyl, 3,7-difyloctyl, lauryl, etc. ; phenyl, naphthyl, 2,naphthyl, fluorene, 2, fluorenyl, 9-fluorenyl, etc., 6 to 3 aryl groups, etc., taken 323451 98 201234576 in the presence of a plurality of conditions There are a plurality of substituents which may be the same or different. From the viewpoint of the stability of the aforementioned ionic polymer by air, moisture or heat, 'X is the best; I: an imido group, an exoethylene group, and an ethynyl group. From the viewpoints of electron acceptability and hole acceptability of the above ionic polymer, it is preferable that m33 is i and ^34 is 〇. The structural unit represented by the chemical formula (33) is preferably a structural unit represented by the chemical formula (35) from the viewpoint of electron acceptability of the ionic polymer.

(35) (在化學式(35)中’Ar13係表示可以具有取代基之β比啶二基、 可以具有取代基之他嗪二基、可以具有取代基之嘧啶二基、 可以具有取代基之。達嗪二基或者是可以具有取代基之三嗪 二基 ° ) 作為吡啶二基可以具有之取代基係列舉與前述之 相關說明中所例示之取代基為同樣之取代基。取代基係於 存在複數個之狀態下，存在複數個之取代基，可以相同， 也可以不同。 作為吼嗪二基可以具有之取代基係列舉與前述Q1之 相關說明中所例示之取代基為同樣之取代基。取代基係於 存在複數個之狀態下，存在複—數個之取代基，可以相同， 也可以不同。 作為嘴13定二醢基可以具有之取代基係列舉與前述Q 1 323451 99 201234576 之相關說明中所例示之取代基為同樣之取代基。取代基係 於存在複數個之狀態下，存在複數個之取代基，可以相"同， 也可以不同。 作為噠嗪二基可以具有之取代基係列舉與前述Q1之 相關說明中所例示之取代基為同樣之取代基。取代基係於 存在複數個之狀態下，存在複數個之取代基，可以相同， 也可以不同。 # 作為三嗪二基可以具有之取代基係列舉與前述Q1之 相關說明中所例示之取代基為同樣之取代基。取代基係於 存在複數個之狀態下，存在複數個之取代基，可以相同， 也可以不同。 •構造單位之比例 本發明中使用之離子性聚合物所包含之化學式（13)所 表示之構造單位、化學式（15)所表示之構造單位、化學式（17) 所表示之構造單位以及化學式（2〇)所表示之構造單位之人 •計之比例係，末端之構造單位除外之該離子性聚合物中二 含之全構造單位中，莫耳％至1〇〇莫耳％者為佳。 •末端之構造單位 丨F匂從用狖奉發明之降厂.丨土承賞初之禾端之構 造單位（末端基)係列舉如：氫原子、甲基、乙基、丙美、 異丙基、丁基、異丁基、see_丁基、如卜丁基、戍基、異戊 基、己基、環己基、庚基、辛基、壬基、癸基、月桂基、 甲氧基、乙基氧、丙氧基、異丙氧基、丁氧基、異丁氧土基、 sec-丁氧基、tert-丁氧基、戊氧基、己氧基、環己氧基、庚 323451 100 201234576 氧基、辛氧基、2-乙基己氧基、壬氧基、癸氧基、3,7-二甲 基辛氧基、月桂氧基、甲硫基、乙硫基、丙硫基、異丙硫 基、丁硫基、異丁硫基、sec_丁硫基、tert-丁硫基、戊硫基、 己硫基、環已硫基、庚硫基、辛硫基、壬硫基、癸硫基、 月桂硫基、甲氧基苯基、乙氧基苯基、丙氧基苯基、異丙 氧基苯基、丁氧基苯基、異丁氧基苯基、sec_ 丁氧基苯基、 tert-丁氧基苯基、戊氧基苯基、己氧基苯基、環己氧基苯 鲁基、庚氧基苯基、辛氧基苯基、2-乙基己氧基苯基、壬氧 基苯基、癸氧基苯基、3,7-二甲基辛氧基苯基、月桂氧基 苯基、甲基苯基、乙基苯基、二曱基苯基、丙基苯基、三 甲苯基、曱基乙基苯基、異丙基苯基、丁基苯基、異丁基 笨基、tert-丁基苯基、戊基苯基、異戊基苯基、己基苯基、 庚基苯基、辛基苯基、壬基苯基、癸基苯基、月桂基苯基、 甲基胺基、一曱基胺基、乙基胺基、二乙基胺基、丙基胺 基、二丙基胺基、異丙基胺基、二異丙基胺基、丁基胺基、 • 異丁基胺基、sec-丁基胺基、tert-丁基胺基、戊基胺基、己 基胺基、環己基胺基、庚基胺基、辛基胺基、2-乙基己基 胺基、壬基胺基、癸基胺基、3,7-二曱基辛基胺基、月桂 基胺基、環戊基胺基、二環戊基胺基、環己基胺基、二環 己基胺基、二(三氟曱基)胺基、苯基胺基、二笨基胺基、 (q至C1Z烷氧基苯基)胺基、二(C:至C12烷氧基苯基)胺 基、二(Ci至烷基苯基)胺基、1-萘基胺基、2-萘基胺基、 五氟苯基胺基、吼°定基胺基、噠嗪基胺基、喷α定基胺基、 0比嗪基胺基、三嗪基胺基、（苯基至c12烷基）胺基、（Cl 101 323451 201234576 至cls烧氧基苯基_Cl至c12烷基)胺基、（Cl至c12烷基苯 基-(^至C1Z烧基）胺基、二((：1至c12烷氧基苯基-(^至c12 烧基）胺基、二(C1至C12烷基苯基至c12烷基)胺基、1- 萘基-<^至Cu燒基胺基、2_萘基_Ci至c12烷基胺基、三甲 基矽基、三乙基矽基、三丙基矽基、三異丙基矽基、異丙 基二甲基矽基、異丙基二乙基矽基、tert-丁基二曱基矽基、 戊基二曱基矽基、己基二曱基矽基、庚基二曱基矽基、辛 基二甲基矽基、2-乙基己基二曱基矽基、壬基二曱基矽基、 癸基二曱基矽基、3,7-二甲基辛基二曱基矽基、月桂基二 曱基矽基、（笨基至Cu烷基)矽基、（q至（：12烷氧基苯 基至C1Z院基)石夕基、（Ci至Ci2炫基苯基_Ci至&烷基) 矽基、（1-萘基-仏至Cl2烷基)矽基、（2·萘基_Ci至Ci2烷基) 矽基、（笨基-C!至cn烷基)二曱基矽基、三苯基矽基、三 (P-二曱苯基)矽基、三苄基矽基、二苯基甲基矽基、化… 丁基二苯基矽基、二甲基笨基矽基、噻吩基、C!至（：12烷 基噻吩基、吡咯基、呋喃基、吡啶基、Cii C12烷基吡啶 基、噠嗪基、錢基、n比嗓基、三嗓基、吼略唆基"底咬 基、喹啉基、異喹啉基、羥基、魏基、氟原子、氯原子、 漠原子及彻子等。前縣㈣造單位係於存在複數個之 狀匕、下#在複數個之末端構造單位，可以相同 不同。 -離子性聚合物之特性_ 神本發明中使用之離子性聚合物最好是共麵化合物。所 本發月中使用之離子性聚合物為共輛化合物者係指該離 323451 102 201234576 子性聚合物包含，在主鏈中，多鍵(例如雙鍵、三鍵）或氮 原子、取)原子專具有之未共用電子對(仙也肛以electron pair) 夾著1個單鍵而連接之區域。該離子性聚合物為共軛化合 物時，由共軛化合物之電子輪送性之觀點來看，最好是藉 由{(包含於多鍵或氤原子、氧原子等具有之未共用電子對 夾著1個單鍵而連接之區域之主鏈上之原子數)/(主鏈上之 總原子數)}χ1〇〇%而計算之比值成為5〇%以上者，更加理 想是60%以上者’甚至最好是7〇%以上者，尤其最好是8〇% 以上者’更加理想是90%以上者。 此外，使用於本發明之離子性聚合物係最妤是高分子 化σ物，更加理想是共軛高分子化合物❶在此，所謂高分 子化σ物係指聚苯乙烯換算之數量平均分子量為以 上之=σ物。此外，所謂使用於本發明之離子性聚合物為 共輛高分子化合物係麵子性聚合物為共純合物且 為向分子化会物。(35) (In the formula (35), 'Ar13' represents a β-pyridyldiyl group which may have a substituent, a pyrazinyl group which may have a substituent, a pyrimidinediyl group which may have a substituent, and may have a substituent. The dazinyldiyl group or the triazinediyl group which may have a substituent may be a substituent which may be the same as the substituent exemplified in the above description. The substituent is a plurality of substituents in a plurality of states, and may be the same or different. The substituent which the procarbazinediyl group may have is a substituent which is the same as the substituent exemplified in the description of the above Q1. The substituent is in a plurality of states, and there are a plurality of substituents which may be the same or different. The substituents which may be possessed as the substituents of the mouth 13 are the same substituents as those exemplified in the related description of the above-mentioned Q 1 323451 99 201234576. The substituent is in the presence of a plurality of states, and there are a plurality of substituents which may be the same or different. The substituent which the procarbazinediyl group may have is a substituent which is the same as the substituent exemplified in the description of the above Q1. The substituent is a plurality of substituents in a plurality of states, and may be the same or different. # As a substituent which the triazinediyl group may have, the substituents exemplified in the description of the above Q1 are the same substituents. The substituent is a plurality of substituents in a plurality of states, and may be the same or different. • Ratio of structural unit The structural unit represented by the chemical formula (13), the structural unit represented by the chemical formula (15), the structural unit represented by the chemical formula (17), and the chemical formula (2) contained in the ionic polymer used in the present invention. 〇) The ratio of the person to be represented in the structural unit is not less than the structural unit of the end, and the total number of structural units included in the ionic polymer except the structural unit at the end is preferably from % to 1% by mole. • The structural unit of the end 丨F匂 is the invention of the falling plant. The structural unit (end base) of the beginning of the earth is the hydrogen atom, methyl, ethyl, propyl, isopropyl Base, butyl, isobutyl, see-butyl, such as butyl, decyl, isopentyl, hexyl, cyclohexyl, heptyl, octyl, decyl, decyl, lauryl, methoxy, ethyl Oxygen, propoxy, isopropoxy, butoxy, isobutoxylate, sec-butoxy, tert-butoxy, pentyloxy, hexyloxy, cyclohexyloxy, heptane 323451 100 201234576 Oxyl, octyloxy, 2-ethylhexyloxy, decyloxy, decyloxy, 3,7-dimethyloctyloxy, lauryloxy, methylthio, ethylthio, propylthio, Isopropylthio, butylthio, isobutylthio, sec-butylthio, tert-butylthio, pentylthio, hexylthio, cyclohexyl, heptylthio, octylthio, sulfonylthio , thiol, lauric, methoxyphenyl, ethoxyphenyl, propoxyphenyl, isopropoxyphenyl, butoxyphenyl, isobutoxyphenyl, sec-butoxy Phenyl, tert-butoxyphenyl, pentyloxyphenyl Hexyloxyphenyl, cyclohexyloxybenzene, hexyloxyphenyl, octyloxyphenyl, 2-ethylhexyloxyphenyl, nonyloxyphenyl, decyloxyphenyl, 3, 7-Dimethyloctyloxyphenyl, lauryloxyphenyl, methylphenyl, ethylphenyl, dinonylphenyl, propylphenyl, trimethylphenyl, decylethylphenyl, iso Propyl phenyl, butyl phenyl, isobutyl phenyl, tert-butyl phenyl, pentyl phenyl, isopentyl phenyl, hexyl phenyl, heptyl phenyl, octyl phenyl, fluorenyl Phenyl, nonylphenyl, laurylphenyl, methylamino, monodecylamino, ethylamino, diethylamino, propylamino, dipropylamino, isopropylamine , diisopropylamino, butylamino, • isobutylamino, sec-butylamino, tert-butylamino, pentylamino, hexylamino, cyclohexylamine, g Amino group, octylamino group, 2-ethylhexylamino group, mercaptoamine group, mercaptoamine group, 3,7-didecyloctylamino group, laurylamine group, cyclopentylamino group, Dicyclopentylamino, cyclohexylamino, dicyclohexylamino, bis(trifluoromethyl)amino, Amino group, diphenylamino group, (q to C1Z alkoxyphenyl)amino group, di(C: to C12 alkoxyphenyl)amino group, di(Ci to alkylphenyl)amino group, 1-naphthylamino group, 2-naphthylamino group, pentafluorophenylamino group, hydrazine-based amino group, pyridazinylamino group, sprayed α-amino group, 0-azinylamino group, triazinylamine Base, (phenyl to c12 alkyl) amine group, (Cl 101 323451 201234576 to cls alkoxyphenyl _Cl to c12 alkyl) amine group, (Cl to c12 alkylphenyl-(^ to C1Z alkyl) Amino, bis((:1 to c12 alkoxyphenyl-(^ to c12 alkyl)amine, bis(C1 to C12 alkylphenyl to c12 alkyl)amino, 1-naphthyl-<;^ to Cu alkylamino, 2-naphthyl-Ci to c12 alkylamino, trimethylsulfonyl, triethylsulfonyl, tripropylsulfonyl, triisopropyldecyl, isopropyl Dimethyl decyl, isopropyldiethyl fluorenyl, tert-butyl dimethyl fluorenyl, pentyl dimethyl fluorenyl, hexyl decyl fluorenyl, heptyl fluorenyl fluorenyl, octyl Dimethyl fluorenyl, 2-ethylhexyl decyl fluorenyl, fluorenyl fluorenyl fluorenyl, fluorenyl fluorenyl fluorenyl, 3,7-dimethyloctyl fluorenyl fluorenyl, lauryl曱 矽 、, (stupyl to Cu alkyl) fluorenyl, (q to (: 12 alkoxyphenyl to C1Z) based, ShiCi, (Ci to Ci2 phenyl _Ci to & Base, fluorenyl, (1-naphthyl-fluorene to Cl2 alkyl) fluorenyl, (2.naphthyl-Ci to Ci2 alkyl) fluorenyl, (stupyl-C! to cn alkyl) dimethyl fluorenyl , triphenylsulfonyl, tris(P-diphenylphenyl)fluorenyl, tribenzylsulfonyl, diphenylmethylhydrazino, butyl butyl diphenyl fluorenyl, dimethyl phenyl hydrazine , thiophenyl, C! to (: 12 alkyl thiophenyl, pyrrolyl, furyl, pyridyl, Cii C12 alkyl pyridyl, pyridazinyl, ketone, n-indenyl, tridecyl, ruthenium唆基" bottom bite group, quinolyl group, isoquinolyl group, hydroxyl group, Wei group, fluorine atom, chlorine atom, desert atom and holly. The pre-county (four) building units are based on the existence of a plurality of conditions, and the lower # structural units at the end of the plural, which can be the same. - Characteristics of ionic polymer - The ionic polymer used in the present invention is preferably a coplanar compound. The ionic polymer used in this month is a compound compound, which means that the 323451 102 201234576 sub-polymer contains, in the main chain, multiple bonds (such as double bonds, triple bonds) or nitrogen atoms, taken) The atom has a region in which the unpaired electron pair (the anus is an electron pair) and is connected by a single button. When the ionic polymer is a conjugated compound, from the viewpoint of electron transportability of the conjugated compound, it is preferable to use {(included in a multi-bond or a ruthenium atom, an oxygen atom or the like having an unshared electron pair) The number of atoms in the main chain of the region where one single bond is connected, / (the total number of atoms in the main chain)} χ1〇〇%, and the ratio calculated is 5〇% or more, and more preferably 60% or more. 'Even better than 7% or more, especially preferably 8% or more' is more ideal than 90%. Further, the ionic polymer used in the present invention is a polymerized σ material, and more preferably a conjugated polymer compound ❶. Here, the polymerized σ substance means a polystyrene-equivalent number average molecular weight. Above = σ. Further, the ionic polymer used in the present invention is a co-purity of a total of a polymer compound-based surface polymer and is a molecular component.

藉著本發明中使用之離子性聚合物之塗佈而成之 ^ ^觀點來看，該離子性聚合物之聚笨乙稀換算之數 子量最好是1x103至lxl〇8,更加理想是2x103至 :甚至最好是3χ1〇3至lxl〇7,尤其最好是5χι〇3^ 烯換算It旦由離子性聚合物之純度之觀點來看，聚苯乙 是i、xl〇3 ? I平7均分子量最好是1X103至5χ107,更加理想 平均分子量最好是?:=//更換算1數量The number of the polystyrene converted by the ionic polymer is preferably from 1x103 to lxl〇8, more preferably by the coating of the ionic polymer used in the present invention. 2x103 to: even better preferably 3χ1〇3 to lxl〇7, especially preferably 5χι〇3^ olefin conversion It is from the viewpoint of the purity of the ionic polymer, polyphenylene is i, xl〇3 ? The average molecular weight of the flat 7 is preferably 1×103 to 5χ107, and the more desirable average molecular weight is preferably ?:=//

Xi(J更加理想是lxl〇3至5 323451 103 201234576 Χίο4 ’甚最好S lxl〇3 s 3χ1〇3。本發明中使用之離子性 聚合物之聚苯乙烯換算之數量平均分子量及重量平均分子 量係可以使用例如凝膠層析法(GPC)而求出。 由本發明中使用之離子性聚合物之純度之觀點來看， 末端之構造單位除外之該離子性聚合物中所含之全構造單 位之數(也尤疋t合度）最好是1以上、2〇以下，更加理想 是1以上、10以下，甚至最好是i以上、5以下。 由本發明中使用之離子性聚合物之電子接受性、電洞 鲁接受性之觀點來看，該離子性聚合物之最低非占有分子軌 道(LUMO)之執道能最好是-5.0eV以上、_2.0eV以下，更 加理想是-4.5eV以上、-2.0eV以下。此外，由相同之觀點 來看，該離子性聚合物之最高占有分子軌道(HOMO)之執 道能最好是-6.0eV以上、-3.0eV以下，更加理想是_5.5eV 以上、-3.OeV以下。但是，HOMO之執道能係低於LUMO 之執道能。此外’離子性聚合物之最高占有分子軌道 φ (HOMO)之軌道能係藉由測定離子性聚合物之電離勢，以 得到之電離勢，作為該軌道能而求出。另一方面，離子性 聚合物之最低未占分子軌道(LUMO)之執道能係藉由求出 HOMO和LUMO‘之能量差，以其值和在前面敘述測定之 電離勢之和，作為該轨道能而求出。在電離勢之測定中係 使用光電子分光裝置。此外，HOMO和LUMO之能量差 係使用紫外線•可見光·近紅外線分光光度計，測定離子 性聚合物之吸收光譜，藉由其吸收末端而求出。 此外，本發明中使用之聚合物在使用於電場發光元件 104 323451 201234576 之狀態下，最好是實料非發光性者。在此， 甲人 物貫質為非發光性者係如以下之意義。首先，將罝有二 =:層之電場發光元件八予以製作。另面二 U包，聚合物之層之電場發光元件2予以製 、 電場發光元件A雖具有包含 2具有包含聚合物之層之方面，電場發光元件T:;: 發光7G件2係不同。接著，在 電琢 元件2，— ， 中和電場發光Xi (J is more ideally lxl 〇 3 to 5 323451 103 201234576 Χίο4 'very best S lxl 〇 3 s 3 χ 1 〇 3. The polystyrene-converted number average molecular weight and weight average molecular weight of the ionic polymer used in the present invention It can be obtained, for example, by gel chromatography (GPC). From the viewpoint of the purity of the ionic polymer used in the present invention, the entire structural unit contained in the ionic polymer excluding the structural unit of the terminal is used. The number (and especially the degree of t) is preferably 1 or more and 2 or less, more preferably 1 or more and 10 or less, and even more preferably i or more and 5 or less. The electron accepting of the ionic polymer used in the present invention From the viewpoint of acceptability and acceptability of the hole, the lowest non-occupied molecular orbital (LUMO) of the ionic polymer is preferably -5.0 eV or more, _2.0 eV or less, more preferably -4.5 eV or more. -2.0 eV or less. In addition, from the same viewpoint, the highest occupied molecular orbital (HOMO) of the ionic polymer is preferably -6.0 eV or more, -3.0 eV or less, more preferably _5.5. Above eV, below -3.OeV. However, HOMO The energy of the channel is lower than that of LUMO. In addition, the orbital energy of the highest occupied molecular orbital φ (HOMO) of the ionic polymer is obtained by measuring the ionization potential of the ionic polymer to obtain the ionization potential. On the other hand, the lowest unoccupied molecular orbital (LUMO) of the ionic polymer can be determined by determining the energy difference between HOMO and LUMO', and the ionization potential measured by the above. The sum is obtained as the orbital energy. The photoelectron spectroscopic device is used for the measurement of the ionization potential. In addition, the energy difference between HOMO and LUMO is measured by the ultraviolet/visible/near-infrared spectrophotometer to measure the absorption of the ionic polymer. The spectrum is obtained by the absorption end. Further, in the state in which the polymer used in the present invention is used in the electric field light-emitting element 104 323451 201234576, it is preferable that the polymer is non-light-emitting. For the non-luminous person, the following meanings are used. First, the electric field light-emitting element 8 having two layers of 罝 is fabricated. The other two U-packs, the electric field light-emitting element 2 of the polymer layer is made, and Although having a light emitting element A comprises two layers comprising a polymer having the aspect, the electroluminescent element T:;: different emission lines 7G member 2 Next, electrical 2, cut element -, and electroluminescent.

件施加1〇V之順向電壓，測定發光光譜。在 發光讀2而得到之發光铜，求出賦予最大 = 入。以波長λ之發弁強洚，从* 疚長 而得到之發光光:=規=:電場發先元件2 & 格化，魏長㈣行積分，計 :規格化發光量S〇。另一方面，以波長又之發光強度，作 為1，也對於就電場發統件A而得到之發光光譜， 規格化’就波長而進行積分，計算規格化發光量S。在藉 ^S-Sg)/SgX1GG%而計算之值為30%以下之狀態下，也就3 疋在比，不具有包含聚合物之層之電場發光元件2之規格 化發光量而具有包含聚合物之層之電場發光元件A之規格 化發光量之增力崎分為鳩以下之狀態下，使用之聚合物 係實質為非發光性者，最好是藉由(ss〇)/s〇xi〇〇%而計算 之值成為15%以下，更加理想是1〇%以下。 作為包含刚述化學式（1)所表示之基以及前述化學式 (3)所表tf之基之離子性聚合物係麟如1纟化學式⑼ 所表示之基而組成之離子性聚合物；由化學式(23)所表示 之基以及化學式45至化學式50、化學式59、化學式60、 105 323451 201234576 化學式77、化學式80、化學式9卜化學式92、化學式％ 化學式101至化學式110所表示之基除去2個氫原;之 而組成之群組中選出之1種以上之基而組成之離子性聚: 物，僅由化學式(24)所表示之基而組成之離子性聚入^ . 由化學式（24)所表示之基以及化學式45至化學式5〇、 ’ 式59、化學式60、化學式77、化學式80、化學式91化學 學式92、化學式96、化學式1〇1至化學式11〇所表示之化 除去2個氫原子之基而組成之群组中選出之χ種以上之= 鲁而組成之離子性聚合物；僅由化學式(25)所表示之美而广 成之離子性聚合物；由化學式(25)所表示之基以及化學弋 45至化學式50、化學式59、化學式60、化學式77、^级 式80、化學式91、化學式92、化學式96、化學式1〇1學 化學式110所表示之基除去2個氫原子之基而組成之群= 中選出之1種以上之基而組成之離子性聚合物；僅由化與 式(29)所表示之基而組成之離子性聚合物；由化學式（29)+ φ 所表示之基以及化學式45至化學式50、化學式59、化風 式60、化學式77、化學式8〇、化學式91、化學式％、二 學式96、化學式101至化學式11〇所表示之基除去2個氣 原子之基而組成之群組中選出之1種以上之基而組成之離 子性聚合物；僅由化學式（30)所表示之基而組成之離子性 聚合物，由化學式（30)所表不之基以及化學式μ至化風气 50、化學式59、化學式60、化學式77、化學式8〇、化^ 式91、化學式92、化學式96、化學式1〇1至化學式11〇 所表示之基除去2個氫原子之基而組成之群組選出之i種 323451 106 201234576 以上之基而組成之離子性聚合物。 作為包含前述化學式（1)所表示之基以及前述化學式（3) 所表示之基之離子性聚合物係列舉以下之高分子化合物。 在這些當中，在藉由以斜線「/」劃分2種構造單位之化學 式而表示之高分子化合物中，左側之構造單位之比例係p 莫耳％，右側之構造單位之比例係（100彳)莫耳％，這些構 造單位係隨機地進行配列。此外，在以下之化學式中，η 係表示聚合度。A forward voltage of 1 〇V was applied to measure the luminescence spectrum. The luminescent copper obtained by illuminating the reading 2 is determined to give the maximum = input. The illuminating light obtained from the length of the λ is * : = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = On the other hand, the illuminance spectrum obtained for the electric field source A is also equalized by the wavelength of the illuminance of the electric field, and the normalized illuminance S is calculated by integrating the wavelength. In the state where the value calculated by ^S-Sg)/SgX1GG% is 30% or less, the normalized luminescence amount of the electric field light-emitting element 2 having no polymer layer is included, and the polymerization is included. The normalized luminescence amount of the electric field light-emitting element A of the layer of matter is divided into the following state, and the polymer used is substantially non-light-emitting, preferably by (ss〇)/s〇xi The value calculated by 〇〇% is 15% or less, and more preferably 1% or less. An ionic polymer composed of an ionic polymer system comprising a group represented by the chemical formula (1) and a group represented by the above formula (3), wherein the ionic polymer is a group represented by the formula (9); 23) The base represented by the formula and the chemical formula 45 to the chemical formula 50, the chemical formula 59, the chemical formula 60, 105 323451 201234576 the chemical formula 77, the chemical formula 80, the chemical formula 9 the chemical formula 92, the chemical formula %, the chemical formula 101 to the chemical formula 110 An ionic polymer composed of one or more selected ones selected from the group consisting of ionic polymerization consisting only of the group represented by the chemical formula (24). It is represented by the chemical formula (24) And the chemical formula 45 to the chemical formula 5, 'Formula 59, Chemical Formula 60, Chemical Formula 77, Chemical Formula 80, Chemical Formula 91, Chemical Formula 92, Chemical Formula 96, Chemical Formula 1〇1 to Chemical Formula 11〇 to remove 2 hydrogen atoms An ionic polymer consisting of more than one selected from the group consisting of: a beautiful and widely ionic polymer represented by the chemical formula (25); represented by the chemical formula (25) Base The composition represented by the chemical formula 50 to the chemical formula 50, the chemical formula 59, the chemical formula 60, the chemical formula 77, the formula 80, the chemical formula 91, the chemical formula 92, the chemical formula 96, the chemical formula 1 〇1 chemical formula 110 is formed by removing two hydrogen atoms. An ionic polymer composed of one or more selected from the group; an ionic polymer composed only of a group represented by the formula (29); a group represented by the chemical formula (29) + φ And a group represented by Chemical Formula 45 to Chemical Formula 50, Chemical Formula 60, Chemical Formula 60, Chemical Formula 77, Chemical Formula 8, Chemical Formula 91, Chemical Formula %, Binomial Formula 96, Chemical Formula 101 to Chemical Formula 11〇, and 2 gas atoms are removed. An ionic polymer composed of one or more selected groups selected from the group consisting of; an ionic polymer composed only of the group represented by the chemical formula (30), which is represented by the chemical formula (30) and The chemical formula μ to the chemical vapor 50, the chemical formula 59, the chemical formula 60, the chemical formula 77, the chemical formula 8, the chemical formula 91, the chemical formula 92, the chemical formula 96, the chemical formula 1〇1 to the chemical formula 11〇, the group represented by the chemical formula 11除去 removes 2 hydrogen atoms Group consisting of i species 323451 106 201234576 The above ionic polymer. Examples of the ionic polymer containing the group represented by the above chemical formula (1) and the group represented by the above chemical formula (3) include the following polymer compounds. Among these, in the polymer compound represented by the chemical formula of the two structural units by the slash "/", the ratio of the structural unit on the left side is p mol%, and the ratio of the structural unit on the right side is (100 彳). Mole%, these structural units are randomly arranged. Further, in the following chemical formula, η represents the degree of polymerization.

107 323451 201234576107 323451 201234576

(ρ: ίΟΟ-ρ mol%)(ρ: ίΟΟ-ρ mol%)

• -1¾ S>/~〇k Vcoc>W yVOOO-M* . +ΜΌΟ〇γ"η V •^yCO〇-M+ H3C(0H2CH2Q3O^ Md(CH2CH2〇)3CH3 HjCpHjCHiQjO^. OiCH2CH2〇)3Cht M = U,Na, K.Cs M = Li( Na,Kf Cs (p: 100 -p mol%)• -13⁄4 S>/~〇k Vcoc>W yVOOO-M* . +ΜΌΟ〇γ"η V •^yCO〇-M+ H3C(0H2CH2Q3O^ Md(CH2CH2〇)3CH3 HjCpHjCHiQjO^. OiCH2CH2〇)3Cht M = U ,Na, K.Cs M = Li( Na,Kf Cs (p: 100 -p mol%)

• +Μ·〇(Χίν|^Λγ：〇σΜ+ +M'OOC~ /νΥγ〇0〇·Μ+ HjC(Oh^CH2q3〇r^ <SjS〇(CH2CH20)3CH, H3C(OH2CH2Q3〇T ^ Md{CH2CH20)3CH3 M = Li, Na.K. Cs M = :U_ Na. K, Cs (p: ίΟΟ-p mol%)• +Μ·〇(Χίν|^Λγ:〇σΜ+ +M'OOC~ /νΥγ〇0〇·Μ+ HjC(Oh^CH2q3〇r^ <SjS〇(CH2CH20)3CH, H3C(OH2CH2Q3〇T ^ Md{CH2CH20)3CH3 M = Li, Na.K. Cs M = :U_ Na. K, Cs (p: ΟΟ -p mol%)

"Μ'οοογ58^ ryc〇QM+ H30(0H2CH2Q3C> lD(CH2CH2〇)3<>tM^UMa.KCs (p: fOO-pmol%) +MOOC-H3q〇H2CH2C)3 丨"Μ'οοογ58^ ryc〇QM+ H30(0H2CH2Q3C>lD(CH2CH2〇)3<>tM^UMa.KCs (p: fOO-pmol%) +MOOC-H3q〇H2CH2C)3 丨

M = Li. Na.K, Cs *)： V〇〇〇1Vl+ ：CH2CH20)3CH, 108 323451 201234576 +IVTOOC H3C(OH2CH2Q3crM = Li. Na.K, Cs *): V〇〇〇1Vl+ :CH2CH20)3CH, 108 323451 201234576 +IVTOOC H3C(OH2CH2Q3cr

C〇aM+ O(CH2CH2〇hCH M=Li, Na,K Cs (p: 100 - p mol%)C〇aM+ O(CH2CH2〇hCH M=Li, Na, K Cs (p: 100 - p mol%)

+IVTO' H3q〇H2CH2C)3i M+IVTO' H3q〇H2CH2C)3i M

-οοαιντ D(CH2CH20)3CHj ：LI, Na,KCs (p:100-prno\%)-οοαιντ D(CH2CH20)3CHj :LI, Na,KCs (p:100-prno\%)

Vooc HzC(〇\\CH2q^Vooc HzC(〇\\CH2q^

00〇-M+ (CH2CH2〇),CH3 〇〇} M = U,Na, K,Cs00〇-M+ (CH2CH2〇), CH3 〇〇} M = U,Na, K,Cs

οοσΜ4 ch2ch2〇)3ch3 H3c(〇H2CH2c)3cy M=Li,NatK,Cs (p:伽-/) mol%)οοσΜ4 ch2ch2〇)3ch3 H3c(〇H2CH2c)3cy M=Li, NatK, Cs (p: gamma-/) mol%)

(p: iOO-pmd%)(p: iOO-pmd%)

109 323451 201234576 μ3〇(〇η2〇η2(%109 323451 201234576 μ3〇(〇η2〇η2(%

OOOM* 'qcH2CH2〇)3CH3 /χοο- M = U, Na.K, Cs (p: 100-pmd%)OOOM* 'qcH2CH2〇)3CH3 /χοο- M = U, Na.K, Cs (p: 100-pmd%)

(p: tOO-p mol%)(p: tOO-p mol%)

(p: TOO-p mol%)(p: TOO-p mol%)

(p: fOO-pmol%)(p: fOO-pmol%)

*Μ-οοογΜ )^VCX)aM* H3q〇H2〇H2C)3〇^' O(CH2CH2q)3CH3 M = U(Na,K,Cs*Μ-οοογΜ )^VCX)aM* H3q〇H2〇H2C)3〇^' O(CH2CH2q)3CH3 M = U(Na,K,Cs

M = U,Nat K, Cs M=LI, ΝθΛ Cs (p: ΪΟΟ-p mol%)M = U, Nat K, Cs M=LI, ΝθΛ Cs (p: ΪΟΟ-p mol%)

(p:100-prr\o\%) M = LI,Na,K,Cs 110 323451 201234576(p:100-prr\o\%) M = LI,Na,K,Cs 110 323451 201234576

(p: 100-pm<A%)(p: 100-pm<A%)

111 323451 201234576111 323451 201234576

+mo3;+mo3;

/母 ι.Ν/Γ :CH2GH20)3CHj +n/to3s H3q〇H2CH2Q3</母 ι.Ν/Γ :CH2GH20)3CHj +n/to3s H3q〇H2CH2Q3<

〇3·Μ+ M=Li,Na.K Cs M = Li, Na,K,Cs (p: 100 -p mol%)〇3·Μ+ M=Li, Na.K Cs M = Li, Na, K, Cs (p: 100 -p mol%)

+MO3Svpj Yyso3w H3C(OH2CH2Q3Cr~y ^O(CH2CH2〇)3CH3 M = U,Na, K, Cs (p： /00-p mol%)+MO3Svpj Yyso3w H3C(OH2CH2Q3Cr~y ^O(CH2CH2〇)3CH3 M = U,Na, K, Cs (p: /00-p mol%)

yvSQj-M* H30(OH2CH2C}3〇r〜▼冰比⑽糾 M=Li.Na.KCs (p: iOO-pmol%)yvSQj-M* H30(OH2CH2C}3〇r~▼Ice ratio (10) Correction M=Li.Na.KCs (p: iOO-pmol%)

+mo3sy^ yyso^M* ^Cpt^CHjQaO^ ^H〇(CH2CH20)3Cl^ M=Li，Na,K.Cs (p: iOO-pmol%)+mo3sy^ yyso^M* ^Cpt^CHjQaO^ ^H〇(CH2CH20)3Cl^ M=Li,Na,K.Cs (p: iOO-pmol%)

+mo3s H3C(OH2CH2Q3 丨 .M+mo3s H3C(OH2CH2Q3 丨 .M

Qj-M+:ch2oh2o)3ch Li, Na, K, Cs (p: iOO-pmol%)Qj-M+:ch2oh2o)3ch Li, Na, K, Cs (p: iOO-pmol%)

112 323451 201234576112 323451 201234576

V〇3S. H3C(OH2CH2Q3Cr _+ '0(CH2CH2〇)3CH3 M = Li, Na,K,Cs (p: 100-prvo\%)V〇3S. H3C(OH2CH2Q3Cr _+ '0(CH2CH2〇)3CH3 M = Li, Na, K, Cs (p: 100-prvo\%)

l~CO^ V〇3£ 明0啊2。)3〇一 ，O(CH2CH20>3CH3 M = UtNa(K,Cs (p: 100~prno\%)l~CO^ V〇3£ 明0啊2. ) 3〇1, O(CH2CH20>3CH3 M = UtNa(K, Cs (p: 100~prno\%)

(p: 700-p mol%)(p: 700-p mol%)

(p: 700-pmd%)(p: 700-pmd%)

H3C(〇H2CH2Q3(y 〜—t>(CH2CH20)3CH3 M = U,Na, K.Cs oco, 113 323451 201234576 *M'〇3 H3q〇H2CH2C)3H3C(〇H2CH2Q3(y~~t>(CH2CH20)3CH3 M = U,Na, K.Cs oco, 113 323451 201234576 *M'〇3 H3q〇H2CH2C)3

/-〇〇> qcH2CH2〇)3CHj M = U,Na,K，Cs/-〇〇> qcH2CH2〇)3CHj M = U,Na,K,Cs

(p: 100~pm<A%)(p: 100~pm<A%)

ip: iOO-pmol%)Ip: iOO-pmol%)

(p: 700-p mol%)(p: 700-p mol%)

(p: iOO-pmal%)(p: iOO-pmal%)

+MO3 H3C(OH2CH2C)3〇,+MO3 H3C(OH2CH2C)3〇,

3*M+ 0(CH2CH20)3CH33*M+ 0(CH2CH20)3CH3

M = Li, Na( Kt Cs (p: iOO-pmol%) +m*o3s H3q〇H2〇H2C)iCi ' 'CX〇H2CH2〇)3C^ M=Li( Na.K, CsM = Li, Na( Kt Cs (p: iOO-pmol%) +m*o3s H3q〇H2〇H2C)iCi ' 'CX〇H2CH2〇)3C^ M=Li( Na.K, Cs

114 323451 201234576114 323451 201234576

(p: 100 -pmoi%)(p: 100 -pmoi%)

(在化學式中，p係表示15至100之數。） 作為包含前述化學式(2)所表示之基以及前述化學式 (3)所表示之基之離子性聚合物係列舉如：僅由化學式(26) 所表示之基而組成之離子性聚合物；由化學式(26)所表示 之基以及化學式45至化學式50、化學式59、化學式6〇、 化學式77、化學式80、化學式9卜化學式92、化學式％、 化學式101至化學式110所表示之基除去2個氮原子之基 323451 115 201234576 而組成之群組中選出之1種以上之基而組成之離子性聚合 物’僅由化學式(27)所表示之基而組成之離子性聚合物； 由化學式（27)所表示之基以及化學式45至化學式5〇、化學 式59、化學式60、化學式77、化學式80、化學式91、化 學式92、化學式96、化學式1〇1至化學式110所表示之基 除去2個氫原子之基而組成之群組中選出之1種以上之基 而組成之離子性聚合物；僅由化學式（28)所表示之基而組 成之離子性聚合物；由化學式(28)所表示之基以及化學式 鲁 45至化學式50、化學式59、化學式60、化學式77、化學 式80、化學式91、化學式92、化學式96、化學式1〇1至 化學式110所表示之基除去2個氫原子之基而組成之群組 中選出之1種以上之基而組成之離子性聚合物；僅由化學 式（31)所表示之基而組成之離子性聚合物；由化學式（31) 所表示之基以及化學式45至化學式50、化學式59、化學 式60、化學式77、化學式80、化學式91、化學式92、化 φ 學式96、化學式101至化學式110所表示之基除去2個氫 原子之基而組成之群組中選出之1種以上之基而組成之離 子性聚合物；僅由化學式(32)所表示之基而組成之離子性 聚合物；由化學式(32)所表示之基以及化學式45至化學式 50、化學式59、化學式60、化學式77、化學式80、化學 式91、化學式92、化學式96、化學式101至化學式11〇 所表示之基除去2個氫原子之基而組成之群詛中選出之1 種以上之基而組成之離子性聚合物。 作為包含前述化學式（2)所表示之基以及前述化學式 116 323451 201234576 (3)所表示之基之離子性聚合物係列舉以下之高分子化合 物。在這些當中，在藉由以斜線「/」劃分2種構造單位之 化學式而表示之高分子化合物，左側之構造單位之比例係 p莫耳％，右側之構造單位之比例係（100-P)莫耳％，這些構 造單位係隨機地進行配列。此外，在以下之化學式中，n 係表示聚合度。(In the chemical formula, p is a number from 15 to 100.) The ionic polymer series including the group represented by the above chemical formula (2) and the group represented by the above chemical formula (3) is as follows: only the chemical formula (26) An ionic polymer composed of the base group; a group represented by the chemical formula (26); and a chemical formula 45 to a chemical formula 50, a chemical formula 59, a chemical formula 6, a chemical formula 77, a chemical formula 80, a chemical formula 9, a chemical formula 92, a chemical formula % The group represented by the chemical formula 101 to the chemical formula 110 is a group of two nitrogen atoms, 323451 115 201234576, and the ionic polymer composed of one or more selected from the group consisting of only the chemical formula (27) An ionic polymer composed of a base; a group represented by the chemical formula (27); and a chemical formula 45 to a chemical formula 5, a chemical formula 59, a chemical formula 60, a chemical formula 77, a chemical formula 80, a chemical formula 91, a chemical formula 92, a chemical formula 96, and a chemical formula 1 An ionic polymer composed of one or more selected from the group consisting of a group of two hydrogen atoms removed from the group represented by the formula 110; only the group represented by the chemical formula (28) An ionic polymer composed; a group represented by the chemical formula (28) and a chemical formula of Lu 45 to Chemical Formula 50, Chemical Formula 59, Chemical Formula 60, Chemical Formula 77, Chemical Formula 80, Chemical Formula 91, Chemical Formula 92, Chemical Formula 96, and Chemical Formula 1〇1 to An ionic polymer composed of one or more selected ones selected from the group consisting of two groups of hydrogen atoms, represented by the formula 110; an ionic polymerization consisting only of the group represented by the chemical formula (31) a compound represented by the chemical formula (31) and a chemical formula 45 to a chemical formula 50, a chemical formula 59, a chemical formula 60, a chemical formula 77, a chemical formula 80, a chemical formula 91, a chemical formula 92, a chemical formula 96, and a chemical formula 101 to a chemical formula 110. An ionic polymer composed of one or more selected from the group consisting of two hydrogen atoms; an ionic polymer composed only of the group represented by the chemical formula (32); 32) the group represented by the formula 45 to the chemical formula 50, the chemical formula 59, the chemical formula 60, the chemical formula 77, the chemical formula 80, the chemical formula 91, the chemical formula 92, the chemical formula 96, the chemical formula 101 to the chemical formula 11 An ionic polymer composed of one or more selected from the group consisting of two hydrogen atoms and having a base represented by 〇. The ionic polymer comprising the group represented by the above chemical formula (2) and the group represented by the above chemical formula 116 323451 201234576 (3) is exemplified by the following polymer compounds. Among these, the polymer compound represented by the chemical formula of the two structural units by the slash "/", the ratio of the structural unit on the left side is p mol%, and the ratio of the structural unit on the right side is (100-P) Mole%, these structural units are randomly arranged. Further, in the following chemical formula, n represents the degree of polymerization.

117 323451 201234576 X+{H3CH2C(H3C)2N: h3c(oh2ch2c>3(117 323451 201234576 X+{H3CH2C(H3C)2N: h3c(oh2ch2c>3(

:N(CH3>2CH2CH3}+X_ i(CH2CH20)3CH3 X+{H3CH2C(H3C)2 h3c(oh2ch2c>3 丨:N(CH3>2CH2CH3}+X_ i(CH2CH20)3CH3 X+{H3CH2C(H3C)2 h3c(oh2ch2c>3 丨

N<CH3)2CH2CH3}+X* (ch2ch2o>3ch3N<CH3)2CH2CH3}+X* (ch2ch2o>3ch3

X = F, Cl. Br, I, BPh4, CF3S〇3, CH3COOX = F, Cl. Br, I, BPh4, CF3S〇3, CH3COO

X * F, Cl. Br, I, BPh4, CF3SO3, CH3COOX * F, Cl. Br, I, BPh4, CF3SO3, CH3COO

X+{H3CH2C(H3C)2NW^ Γ^Η{ΟΗζ)2〇Η2ΟΗ^' IDiCHaCHjOaCHs X * F, Cl. Br. I, BPh4, CF3SO3, CH3COO (p: mol%)X+{H3CH2C(H3C)2NW^ Γ^Η{ΟΗζ)2〇Η2ΟΗ^' IDiCHaCHjOaCHs X * F, Cl. Br. I, BPh4, CF3SO3, CH3COO (p: mol%)

X+{H3CH2C(H3C>2N卜^TY^N<CH3>2CH2CH3)+X. H3C(OH2CH2C)3〇X (DiCHaCH^JaCHa X = R Cl. Br( I, BPh4l CF3SO3. CH3COOX+{H3CH2C(H3C>2Nb^TY^N<CH3>2CH2CH3)+X. H3C(OH2CH2C)3〇X (DiCHaCH^JaCHa X = R Cl. Br( I, BPh4l CF3SO3. CH3COO

•X+{H3CH2C(H3C)2Nh^ ^y^CHahCHaCHa^· H3C(OH2CH2C)3Ci^ (XCH2CH2〇)3CH3 X = F, CL Br, I, BPh4, CF3SO3, CH3COO (p: iOD-p mol%)• X+{H3CH2C(H3C)2Nh^^y^CHahCHaCHa^· H3C(OH2CH2C)3Ci^(XCH2CH2〇)3CH3 X = F, CL Br, I, BPh4, CF3SO3, CH3COO (p: iOD-p mol%)

0C+{H3CH2(^H3C)2Nh^i J^V-(N(CH3)2CH2CH3)+X-H3C(OH2CH2C)3€i ^0(CH2CH20)3CH3 X « F, Cl. Br, I, BPh4l CF3SO3, CH3COO0C+{H3CH2(^H3C)2Nh^i J^V-(N(CH3)2CH2CH3)+X-H3C(OH2CH2C)3€i^0(CH2CH20)3CH3 X « F, Cl. Br, I, BPh4l CF3SO3, CH3COO

X+{H3CH2C(H3C)2NH^ ρν-ίΝ(ΟΗ3)2〇Η2〇Η3}+Χ* H3C(OH2CH2C)3Cf ζ)(ΟΗ2ΟΗ2〇)3〇Η3 X « F, Cl. Br, I, BPh4. CF3SO3, CH3COO (p : tOO-p mol%)X+{H3CH2C(H3C)2NH^ ρν-ίΝ(ΟΗ3)2〇Η2〇Η3}+Χ* H3C(OH2CH2C)3Cf ζ)(ΟΗ2ΟΗ2〇)3〇Η3 X « F, Cl. Br, I, BPh4. CF3SO3 , CH3COO (p : tOO-p mol%)

·χ*{Η3〇Η20(Η3〇)2Ν)-^ rMNiCH^CHiCHa}^-HAOHjCHiChCT^ N""tb(CH2CH20)3CH3 X = F, Cl. Br, I, BPh4> CF3S〇3, CH3COO·χ*{Η3〇Η20(Η3〇)2Ν)-^ rMNiCH^CHiCHa}^-HAOHjCHiChCT^ N""tb(CH2CH20)3CH3 X = F, Cl. Br, I, BPh4> CF3S〇3, CH3COO

•X+{H3CH2C(H3C)2NW^ rX^NiCH^HjCH^· Η3〇(ΟΗ2〇Η20)3〇^ (D(CH2CH20)3CH3 X = F, Cl. Br, I, BPh4, CF3S03, CH3COO (p: ίΟΟ-p mol%) -X+{H3CH2C(H3C)2NW~*( Γ\^Ν(ΟΗ3)2〇Η2ΟΗ2}*χ-H3C(OH2CH2C)3C( iD(CH2CH2〇)3CH3• X+{H3CH2C(H3C)2NW^ rX^NiCH^HjCH^· Η3〇(ΟΗ2〇Η20)3〇^ (D(CH2CH20)3CH3 X = F, Cl. Br, I, BPh4, CF3S03, CH3COO (p: ΟΟ -p mol%) -X+{H3CH2C(H3C)2NW~*( Γ\^Ν(ΟΗ3)2〇Η2ΟΗ2}*χ-H3C(OH2CH2C)3C( iD(CH2CH2〇)3CH3

X = F, Cl. Br, I, BPh4l CF3S03l CH3COO X+{H3CH2C(H3C>2I Η30(ΟΗ2〇Η2〇3(X = F, Cl. Br, I, BPh4l CF3S03l CH3COO X+{H3CH2C(H3C>2I Η30(ΟΗ2〇Η2〇3(

<CH2CH2〇hCH3<CH2CH2〇hCH3

X = F, Cl. Br, I, BPI14, CF3S〇3, CH3COOX = F, Cl. Br, I, BPI14, CF3S〇3, CH3COO

X*{H3CH2C(H3C}2Nh·^ fY"(N(CH3)2CH2CH3^X-H3C(OH2CH2C)3Cf t>(CH2CH2〇)3CH3 X = F. Cl. Br. I. ΒΡΚψ CF3SO3, CH3COO (p: iOO-pmol%) 118 323451 201234576 •X+{H3CH2C(H3C)2 h3c(oh2ch2c)3X*{H3CH2C(H3C}2Nh·^ fY"(N(CH3)2CH2CH3^X-H3C(OH2CH2C)3Cf t>(CH2CH2〇)3CH3 X = F. Cl. Br. I. ΒΡΚψ CF3SO3, CH3COO (p: iOO-pmol%) 118 323451 201234576 •X+{H3CH2C(H3C)2 h3c(oh2ch2c)3

：N{CH3)2CH2CH3)+X' -χ+{Η3〇Η2〇(Η3〇2 i(CH2CH20)3CH3:N{CH3)2CH2CH3)+X' -χ+{Η3〇Η2〇(Η3〇2 i(CH2CH20)3CH3

H3C(OH2CH2C)3'H3C(OH2CH2C)3'

[NiCHafeCHaCHa}^· [CHzCHzOfeCHs X π F, Cl. Br, I, BPh4, CF3SO3, CH3COO (p: ίΟΟ-p mol%)[NiCHafeCHaCHa}^· [CHzCHzOfeCHs X π F, Cl. Br, I, BPh4, CF3SO3, CH3COO (p: ΟΟ -p mol%)

X = F, Cl. Br. I, BPh4, CF3S03, CH3COO -X+{H3CH2C(H3C)2I HaCiO^C^Ch'X = F, Cl. Br. I, BPh4, CF3S03, CH3COO -X+{H3CH2C(H3C)2I HaCiO^C^Ch'

X « F, Cl. Brt I, BPh4, CF3S03> CH3COO (p : fOO-pmol%)X « F, Cl. Brt I, BPh4, CF3S03> CH3COO (p : fOO-pmol%)

丨(CHakCHaCHaTX- ·Χ+(Η3〇Η20(Η30>2ΝΚ^ ^WHa^CHaCHapC· [CH2CH2〇)3CH3 Η3〇(ΟΗ2ΟΗ2〇)3σ / ^O(CH2CH20)2PHz X = F_ Cl. Br, I· BPh4. CF3S〇3, CH3COO丨(CHakCHaCHaTX- ·Χ+(Η3〇Η20(Η30>2ΝΚ^^WHa^CHaCHapC·[CH2CH2〇)3CH3 Η3〇(ΟΗ2ΟΗ2〇)3σ / ^O(CH2CH20)2PHz X = F_ Cl. Br, I· BPh4 . CF3S〇3, CH3COO

^{HaCHjCiHaCJaNhv^i pWNtCH^CHaCHa}^-HgCiOHjCHaQaCi i^iCHaCHjOaCHs X « F. Cl. Br. I, BPh4l CF3SO3, CH3COO (p: fOO-p mol%) •^{HaCHaCiHaCfcl H3C(OH2CH2C>3i^{HaCHjCiHaCJaNhv^i pWNtCH^CHaCHa}^-HgCiOHjCHaQaCi i^iCHaCHjOaCHs X « F. Cl. Br. I, BPh4l CF3SO3, CH3COO (p: fOO-p mol%) •^{HaCHaCiHaCfcl H3C(OH2CH2C>3i

NiCHaJaCHjCHg)^· (CH2CH20)3CH3 oa)-NiCHaJaCHjCHg)^· (CH2CH20)3CH3 oa)-

X = F. Cl. Βγ· I, BRu，CF3S03, CH3COOX = F. Cl. Βγ· I, BRu, CF3S03, CH3COO

•X*{H3CH2C(H3〇2NW^( py-CNiCH^CHzCHa}^* HaCtOHzCHjOaGf ID(CH2CH20)3CH3 •X*{H3CH2C(H3C)2Nh^ ^yWCHafcCHjCHarX· H3q〇H2CH2C)3ar iDiCH^HjOJaCHa X = F, Cl. Br, I, BPh4i CF3SO3, CH3COO (p: iOO-pmol%)• X*{H3CH2C(H3〇2NW^( py-CNiCH^CHzCHa}^* HaCtOHzCHjOaGf ID(CH2CH20)3CH3 •X*{H3CH2C(H3C)2Nh^ ^yWCHafcCHjCHarX· H3q〇H2CH2C)3ar iDiCH^HjOJaCHa X = F, Cl. Br, I, BPh4i CF3SO3, CH3COO (p: iOO-pmol%)

X = F, Cl. Br, I, BPh4, CF3S03l CH3COO X+{H3CH2C(H3C)2I Η3〇ί〇Η2〇Η2(：)3ιX = F, Cl. Br, I, BPh4, CF3S03l CH3COO X+{H3CH2C(H3C)2I Η3〇ί〇Η2〇Η2(:)3ι

Κ〇Η3)2〇Η2〇Η3}+χ· 丨(ch2ch2o)3ch3 X = F, Cl. Br, I, BPh4( CF3S〇3, CHaCOO : f 00 - p mol%) •X+{H3CH2C(H3C)2I H3C(OH2CH2C)3iΚ〇Η3)2〇Η2〇Η3}+χ·丨(ch2ch2o)3ch3 X = F, Cl. Br, I, BPh4( CF3S〇3, CHaCOO : f 00 - p mol%) •X+{H3CH2C(H3C) 2I H3C(OH2CH2C)3i

N(CH3)2CH2CHzyX： (CH2CH20)3CH3N(CH3)2CH2CHzyX: (CH2CH20)3CH3

X = F, Cl. Br· I, BPh4, CF3S〇3, CH3C00X = F, Cl. Br· I, BPh4, CF3S〇3, CH3C00

l(CH3)2CH2CH3}+X· ·Χ+{Η30Η20(Η3〇2ΐ 丨(CH2CH20)3CH3 H3C(OH2CH2C)3ll(CH3)2CH2CH3}+X· ·Χ+{Η30Η20(Η3〇2ΐ 丨(CH2CH20)3CH3 H3C(OH2CH2C)3l

X+{H3CH2C(H3C)2l H3C(OH2CH2C)3i X : F. Cl. Br, l_ BPIu· CF3SO3, CH3COO (p: 100 - p moi%)X+{H3CH2C(H3C)2l H3C(OH2CH2C)3i X : F. Cl. Br, l_ BPIu· CF3SO3, CH3COO (p: 100 - p moi%)

:N(CH3>2CH2CH3}+X_ 丨(ch2ch2o)3ch3 X = F, CI. Βγ, I. BPh4· cf3so3. ch3coo 119 323451 201234576 •X+{H3CH2C(H3C)2N: H3C(OH2CH2C)3<:N(CH3>2CH2CH3}+X_ 丨(ch2ch2o)3ch3 X = F, CI. Βγ, I. BPh4· cf3so3. ch3coo 119 323451 201234576 •X+{H3CH2C(H3C)2N: H3C(OH2CH2C)3<

：N(CH3)2CH2CH3}+X· ι(ΟΗ2〇Η20)3〇Η3 /xcx>:N(CH3)2CH2CH3}+X· ι(ΟΗ2〇Η20)3〇Η3 /xcx>

X = Ft a Br. I. BPh4, CF3SO3. CH3COO (p: 100-p mol%)X = Ft a Br. I. BPh4, CF3SO3. CH3COO (p: 100-p mol%)

^y{N(CH3)2CH2CH3}+X-HzC(OH2CH2C)zC> (3(ΟΗ2〇Η20)3〇Η3 X e F，a Br· I. BPh4. CF3S〇3, CH3COO Χ*{Η3ΟΗ2〇(Η3〇)2ΐ Η30(ΟΗ2〇Η2〇3«^y{N(CH3)2CH2CH3}+X-HzC(OH2CH2C)zC> (3(ΟΗ2〇Η20)3〇Η3 X e F,a Br· I. BPh4. CF3S〇3, CH3COO Χ*{Η3ΟΗ2〇( Η3〇)2ΐ Η30(ΟΗ2〇Η2〇3«

[NiCHafeCHaCH^X- Ι(ΟΗ2〇Η2〇)3〇Η3 X = F, Cl. Br. 1,0Ph4f CF3SO3, CH3COO {p : tOO-p mol%) X+{H3CH2C<H3Q2N: H3C(OH2CH2C>3<[NiCHafeCHaCH^X- Ι(ΟΗ2〇Η2〇)3〇Η3 X = F, Cl. Br. 1,0Ph4f CF3SO3, CH3COO {p : tOO-p mol%) X+{H3CH2C<H3Q2N: H3C(OH2CH2C>3<

WCHafeCHiCHapC (CH2CH2〇>3CH3WCHafeCHiCHapC (CH2CH2〇>3CH3

SI X = F, Cl. Br, I, BPh4. CF3SO3, CH3C00SI X = F, Cl. Br, I, BPh4. CF3SO3, CH3C00

Χ+{Η3ΟΗ2〇(Η3〇2ΐ Η3〇(ΟΗ2〇Η20):Χ+{Η3ΟΗ2〇(Η3〇2ΐ Η3〇(ΟΗ2〇Η20):

；Ν(〇Η3)2〇Η2〇Η3}+Χ* {CH2CH20)3CH3 X = F. a. Br, I, BPh4, CF3S〇3, CH3COO (p: 100-ρπνΛ%);Ν(〇Η3)2〇Η2〇Η3}+Χ* {CH2CH20)3CH3 X = F. a. Br, I, BPh4, CF3S〇3, CH3COO (p: 100-ρπνΛ%)

NiCHJzCHzCHg)^- :CH2CH2〇)3CH3 *X+{H3CH2C(H3C)2N] H3C(OH2CH2C)3l X = F, a Br, I, BPh4. CF3SO3, CH3CCX)NiCHJzCHzCHg)^- :CH2CH2〇)3CH3 *X+{H3CH2C(H3C)2N] H3C(OH2CH2C)3l X = F, a Br, I, BPh4. CF3SO3, CH3CCX)

Χ+{Η3ΟΗ2〇(Η3〇)2Ν)-/Μ rMN(CH3)2CH2CH3}+X· H3C(OH2CH2C)3Ci (D(CH2CH2〇)3CH3 X e F, a. Br, I, BPh4( CF3S〇3, CH3COO (ρ:100·ρ mol%) _X+{H3CH2C<H3C)2N: H3C(OH2CH2C)3<Χ+{Η3ΟΗ2〇(Η3〇)2Ν)-/Μ rMN(CH3)2CH2CH3}+X· H3C(OH2CH2C)3Ci (D(CH2CH2〇)3CH3 X e F, a. Br, I, BPh4( CF3S〇3 , CH3COO (ρ:100·ρ mol%) _X+{H3CH2C<H3C)2N: H3C(OH2CH2C)3<

l(CH3)2CH2CH3)+X- (ch2ch2o>3ch3l(CH3)2CH2CH3)+X- (ch2ch2o>3ch3

X * F, Cl. Br, I, BPh4, CF3SO3, CH3C00X * F, Cl. Br, I, BPh4, CF3SO3, CH3C00

•X*{H3CH2C(H3C)2N] HaCiOHjCHzCW X = F. Cl. Br, \t BPh4, CF3SO3, CH3COO (p: tOO-pmol%)• X*{H3CH2C(H3C)2N] HaCiOHjCHzCW X = F. Cl. Br, \t BPh4, CF3SO3, CH3COO (p: tOO-pmol%)

WCHa^CHaCHapC ·Χ+{Η3(：Η20(Η30)2Ν}Ύ^ ^y^N(CH3)2CH2CH3}+X· ；CH2CH20)3CH3 Η3ϋ(ΟΗ2〇Η2〇)3σν C)(CH2CH20)3CH3 X = F, a. Brf I, BPh4, CF3SO3. CHgCOOWCHa^CHaCHapC ·Χ+{Η3(:Η20(Η30)2Ν}Ύ^ ^y^N(CH3)2CH2CH3}+X· ;CH2CH20)3CH3 Η3ϋ(ΟΗ2〇Η2〇)3σν C)(CH2CH20)3CH3 X = F, a. Brf I, BPh4, CF3SO3. CHgCOO

CeHi7X *X+{H3CH2C(H3C)2N卜^ ry*lN_2CH2CH3}+X-H3C(OH2CH2C>3Ci^ ^^(CHaCHaOhCHu X = F, Cl. Br, I, BPh4, CF3SO3, CH3COO (p: 100 - p mol%) X+{H3CH2C(H3C)2N}· h3c(oh2ch2c)3(CeHi7X *X+{H3CH2C(H3C)2Nb^ry*lN_2CH2CH3}+X-H3C(OH2CH2C>3Ci^^^(CHaCHaOhCHu X = F, Cl. Br, I, BPh4, CF3SO3, CH3COO (p: 100 - p mol %) X+{H3CH2C(H3C)2N}· h3c(oh2ch2c)3(

CeH^ ：N(CH3)2CH2CH3}*X· 丨(ch2ch2o〉3ch3CeH^ : N(CH3)2CH2CH3}*X· 丨(ch2ch2o>3ch3

X = F, Cl. Br, I, BPh4l CF3SO3, CH3COO 120 323451 201234576X = F, Cl. Br, I, BPh4l CF3SO3, CH3COO 120 323451 201234576

•X*{H3CH2C(H3C)2N}· h3c(oh2ch2c)3 丨•X*{H3CH2C(H3C)2N}· h3c(oh2ch2c)3 丨

X = F, Cl. Br, I, BPh4, CF3S03l CH3COO {p: 100-p mol%)X = F, Cl. Br, I, BPh4, CF3S03l CH3COO {p: 100-p mol%)

'{NiCHaJjCHaCH^X- (CHzCHaOfeCHa X+{H3CH2C(H3C)2I H3C(OH2CH2C): X = F, Cl. Br, l, BPh4l CF3S03l CH3COO (p: iOO-pmol%) ；βΗΐ3 •X+{H3CH2C(H3C>2N}. H3C(OH2CH2C)3<'{NiCHaJjCHaCH^X-(CHzCHaOfeCHa X+{H3CH2C(H3C)2I H3C(OH2CH2C): X = F, Cl. Br, l, BPh4l CF3S03l CH3COO (p: iOO-pmol%) ;βΗΐ3 •X+{H3CH2C(H3C> 2N}. H3C(OH2CH2C)3<

，{N(CH3)2CH2CH3rx· (CH2CH20)3CH3,{N(CH3)2CH2CH3rx· (CH2CH20)3CH3

X = F, Cl. Br, I, BPh4, CF3SO3, CH3COO •X+{H3CH2C(H3C>2N). H3C(OH2CH2C)3<X = F, Cl. Br, I, BPh4, CF3SO3, CH3COO • X+{H3CH2C(H3C>2N). H3C(OH2CH2C)3<

{N(CH3>2CH2CH3)+X-(CH2CH20>3CH3{N(CH3>2CH2CH3)+X-(CH2CH20>3CH3

X = F, Cl. 8r, I, BPh4, CF3SO3, CHatXJOX = F, Cl. 8r, I, BPh4, CF3SO3, CHatXJO

(在化學式中，p係表示15至100之數。） -離子性聚合物之製造方法- 接著’就製造本發明中使用之離子性聚合物之方法而 進行說明。作為用以製造本發明中使用之離子性聚合物之 適當方法係可以列舉例如使用下列通式（36)所表示之化合 物，選擇作為原料之一種，其中，也含有該通式(36)中之 -Aa-為化學式（13)所表示之構造單位之化合物、該-Aa-為化 121 323451 201234576 學式（15)所表不之構造單位之化合物、該-Aa-為化學式（17) 所表不之構造單位之化合物以及該為化學式卩⑴所表 不之構造單位之化合物之至少一種，來作為必要原料，並 將此進行縮聚之方法。 Y4-Aa-Y5 (36) (在化學式(36)t ’Aa係表*包含由化學式⑴所表示之基和 化學式⑺所表示之基而組成之群組中選出之1種以上之基 以及化學式(3)所表示之1種以上之基之重複單位，Y4及 Υ係分別獨立地表示參予縮聚之基。） 此外，在本發明中使用之離子性聚合物中一起含有藉 由前述化學式(36)中之人·所表示之構造單位和前述·Aa_ 以外之其他之構造單位之狀態下，可减用成為前述人 以外之其他之構造單位且具有2個參予縮聚之取代基之k 合物，將此和前述化學式(36)所表示之化合物—起:存(In the chemical formula, p is a number from 15 to 100.) - Method for producing an ionic polymer - Next, a method for producing an ionic polymer used in the present invention will be described. As a suitable method for producing the ionic polymer used in the present invention, for example, a compound represented by the following formula (36) can be used, and one selected as a raw material, which also contains the compound of the formula (36) -Aa- is a compound of the structural unit represented by the chemical formula (13), the compound of the structural unit represented by the formula (15) of the -Aa-, 121-323451 201234576, and the formula of the formula (17) A method in which at least one of the compound of the structural unit and the compound of the structural unit represented by the chemical formula (1) is used as a necessary raw material, and this is subjected to polycondensation. Y4-Aa-Y5 (36) (In the chemical formula (36) t 'Aa series * contains one or more groups selected from the group represented by the chemical formula (1) and the group represented by the chemical formula (7), and a chemical formula (3) The repeating unit of one or more kinds of groups indicated, and Y4 and an anthracene each independently represent a group to which polycondensation is carried out.) Further, the ionic polymer used in the present invention together contains the aforementioned chemical formula ( 36) In the state of the structural unit indicated by the person and the other structural unit other than the above-mentioned Aa_, the k-integration which is a structural unit other than the above-mentioned person and having two substituents for the polycondensation may be used. And the compound represented by the above chemical formula (36):

作為具有Μ含有此種之其他構造單位而使 可縮聚之取代基之化合物_舉化學式(37)所表 物。可以藉由像這樣，加人至前述Y4_ Aa_ γ5所表α 物，在使化學式(37)所表示之化合物縮聚之狀， 可製造更加具有_Ab•所表示之構造單位之本 2 離子性聚合物。 τ使用之 Y6-Ab-Y7 (37) (在化學式(37)中’ Ab係前述通式(33)所表示之 _ 者是通式(35)所絲之構造單位，γ6&γ7係分別獨立^ 323451 122 201234576 示參予縮聚之基。） 乍為此種參予、縮聚之基(Υ4、Υ5、γ6及Y7)係列舉如: IP基;原子、燒基續㈣基、絲雜§旨基、芳基 二：广、硼酸酯殘基、錡曱基、鱗f基、膦酸酯甲 土作為〇甲基'、娜H)2、甲醯基、基、乙婦基等。 舉如:氟IS選it上述參予縮聚之基之^素肩子係列 此外，、子、填原子及蛾原子。 酸鳴::可==述參予縮聚之基之綱 _旨基，作為曰基Μ·1基、三敗甲 Ρ·甲苯石黃酸醋f 夂西曰基係例舉如：苯續酸醋基、 作為可以選擇成為前述參 醋基係例舉如·_ f基俩_。3之料炫基績酸 殘為可以選擇成為前述參予縮聚之基之猶輯 殘基係例舉||由下狀化學^表示之基。The compound of the formula (37) is a compound having a substituent which is polycondensable by containing such a structural unit. By adding the above-mentioned α substance of the above Y4_Aa_γ5 to the above, the compound represented by the chemical formula (37) can be polycondensed, and the ionic polymerization of the structural unit represented by _Ab• can be produced. Things. Y6-Ab-Y7 (37) used for τ (in the chemical formula (37), 'Ab is expressed by the above formula (33) is the structural unit of the formula (35), and the γ6& γ7 series are independent ^ 323451 122 201234576 shows the basis of polycondensation.) 乍 is the basis of such participation, polycondensation (Υ4, Υ5, γ6 and Y7) series: IP base; atomic, burning base (four) base, silk § Base, aryl group 2: broad, borate residue, sulfhydryl group, scale f group, phosphonate methane as 〇methyl ', Na H) 2, formazan, benzyl, ethyl group and the like. For example, the fluorine IS is selected as the base of the above-mentioned polycondensation base. In addition, the sub, the atom and the moth atom. Sour:: ====================================================================================================== The vinegar base can be selected as the above-mentioned vinegar base system as exemplified by the _f base two. The material of the residue is the base of the above-mentioned participation in the polycondensation. The residue is exemplified by the lower chemical ^.

—B OCH,—B OCH,

PCH, -BPCH, -B

此外，作為可以選擇成為前述參予縮聚之基之鎮甲基 係例舉藉由下列之化學式： -〇 -CH2S+Me2E·或-CH2S+Ph2E- (在化學式+，E係表示_素原子，係表示苯基，以下相 同。）所表示之基。 此外，作為可以選擇成為前述參予縮聚之基之鱗尹基 323451 123 201234576 係例舉藉由下列之化學式： -CH2P+Ph3E- (在化學式中，E係表示鹵素原子。）所表示之基。 此外，作為可以選擇成為前述參予縮聚之基之膦酸酯 甲基係例舉藉由下列之化學式： -CH2PO(ORd)2 (在化學式中，Rd係表不烷基、芳基或芳基烷基。）所表示 之基。 此外，作為可以選擇成為前述參予縮聚之基之單鹵甲 基係例舉如：氟曱基、氯曱基、溴甲基、碘曱基。 此外，適合成為參予縮聚之基之理想基係依聚合反應 之種類而不同。適合成為參予縮聚之基之理想基係例如在 使用Yamamoto偶合反應等之〇價鎳錯合物之狀態下，列 舉鹵素原子、烷基磺酸酯基、芳基磺酸酯基、芳基烷基磺 酸醋基。此外，在使用Suzuki偶合反應等之錄觸媒或把觸 媒之狀態下’列舉如··絲俩縣、自素原子、顺酸醋Further, as the town methyl group which can be selected as the base for the aforementioned polycondensation, the following chemical formula is exemplified by: -〇-CH2S+Me2E· or -CH2S+Ph2E- (in the chemical formula +, E represents a γ atom, It is a group represented by a phenyl group, which is the same as the following.). Further, as a base which can be selected as the basis for the aforementioned polycondensation, yoke 323451 123 201234576 is exemplified by the following chemical formula: -CH2P+Ph3E- (in the chemical formula, E represents a halogen atom). Further, the phosphonate methyl group which may be selected as the base for the aforementioned polycondensation is exemplified by the following chemical formula: -CH2PO(ORd)2 (In the chemical formula, the Rd group represents an alkyl group, an aryl group or an aryl group. The base represented by alkyl.). Further, examples of the monohalomethyl group which can be selected as the group for the aforementioned polycondensation include a fluoromethyl group, a chloromethyl group, a bromomethyl group, and an iodonium group. Further, an ideal basis for the base to be subjected to polycondensation differs depending on the type of polymerization reaction. An ideal base suitable for the basis of the polycondensation is, for example, a halogen atom, an alkylsulfonate group, an arylsulfonate group, or an arylalkyl group in the state of using a nickel-nickel complex compound such as a Yamamoto coupling reaction. Sulfonic acid based sulfonic acid. In addition, in the state of using a recording medium such as a Suzuki coupling reaction or a catalyst, exemplified by the two counties, the self-atomic atom, the vinegar

殘基、-B(OH)2等，在藉由氧化劑或者是電化學之氧化聚 合之狀態下’列舉氫原子。 A 在製造本發明中使用之離子性聚合物之際，可以採用 例如配合需要顿时減個與參予㈣之基之前述通式 =)或通式(37)所麵之化合物（單體)溶解於有機溶媒中， 用驗或適當之㈣，使在錢溶狀脑以上命點以下 之溫度下進行反應之聚合方法。作為此種聚合方法▲可以 採用例如。己載於彳機反應（㈣anieReaetic)ns)，，，第μ卷 323451 124 201234576 270-490 頁，(John Wiley&Sons，Inc.),1965 年、“有機合成 (Organic Syntheses)”，綜合叢書第 6 卷(Collective Volume VI)，407-411 頁，(John Wiley & Sons，Inc.),1988 年、化學評論 (Chem. Rev.)，第95卷，2457頁，(1995年）、有機金屬化學雜 言志(J. Organomet. Chem.)，第 576 卷，147 頁，（1999 年）、高分 子化學•高分子論文集（Macromol. Chem.，Macromol. Symp.)，第12卷，292頁，(1987年）之習知方法。 此外，在製造本發明中使用之離子性聚合物之際，可 鲁 以配合參予縮聚之基而採用習知之縮聚反應。作為此種聚 合方法係列舉藉由Suzuki偶合反應而聚合該單體之方法、 藉由Grignard反應而進行聚合之方法、藉由见(0)錯合物 而進行聚合之方法、藉由FeCl3等之氧化劑而進行聚合之 方法、電化學之氧化聚合之方法、具有適當之脫離基之中 間體高分子經分解之方法等。即使是在此種聚合反應中， 也因為藉由Suzuki偶合反應而進行聚合之方法、藉由 • Grignard反應而進行聚合之方法以及藉由鎳零價錯合物而 進4亍聚合之方法係容易控制得到之離子性聚合物之構造， 因而為佳。 本發明中使用之離子性聚合物之理想製造方法之一形 態係使用具有由i素原子、烷基磺酸酯基、芳基磺酸酯基 和芳基烷基磺酸酯基而組成之群組中選出之基作為參予縮 聚之基之原料單體’在鎳零價錯合物之存在下進行縮聚以 製造離子性聚合物之方法。作為使用於此種方法之原料單 體係列舉例如：二鹵化化合物、雙（烷基磺酸酯）化合物、 125 323451 201234576 雙(芳f確酸酷）化合物、雙（芳基烧基續酸自旨）化合物、齒_ =基％1知化合物、函-芳基磺酸酯化合物、__芳基烷基 曰化5物、燒基續酸s旨-芳基續酸s旨化合物、烧基續酸 务基彼1基~酸自旨化合物以及芳基續酸酯-芳基烧基續酸 醋化合物。 月|J述離子性聚合物之理想製造方法之其他形態係使 、/、有由南素原子、炫基續酸S旨基、芳基績酸酿基、芳 元基：&自文|旨基、·β(〇η)2和硼酸酯殘基所組成之群組中 、之基作為參予縮聚之基且全原料單體具有之鹵素原 =耳炫1基~竣驗基、芳基磺酸酯基、芳基烷基磺酸酯基之 ' 之σ s+(J)*-B(OH)2、硼酸酯殘基之莫耳數之合計 (κ)之比值實哲Λ、& οα 只買成為1(一般K/J係0.7至1.2之範圍）之原料 ， jfe ΛΑ 垒抵 、觸媒或鈀觸媒之存在下，進行縮聚而製造離子 性聚合物之方法。 作是作為則述有機溶媒亦依使用之化合物或反應而不同， —拟^ 般而言’為了抑制副反應’最好是使用充分地施 们脫氣處理> θ .. <有機溶媒。在製造離子性聚合物之際，最好 疋使用此插古 、 里百機溶媒，在惰性環境下，進行反應。此外， 在則迷有機、、六，_y_ 戍各媒中’最好是進行相同於前述脫氧處理之脫 水慝理。彳曰早 虛+…〜 在和Suzuki偶合反應等之水之2相系之反 應之^下，並無其限制存在。 ^ '、匕種有機溶媒係例舉如：戊烧、己院、庚嫁、辛 院、i畏己、卜_ _ 元專之飽和烴、苯、曱苯、乙基苯、二甲苯等之 小鲍和煙、 — "四氮化碳、三氯甲烷、二氯甲烷、氯丁烷、溴 126 323451 201234576 丁烷、氣戊烷、溴戊烷、氯己焓、省 〉臭已燒、氯環己烷、溴 %己烧4之鹵化飽和煙、氯苯、二〜_ > —虱本、三氯苯等之鹵化 不飽和烴、曱醇、乙醇、丙醇、 吳兩醇、丁醇、tert-丁基 醇專之醇類、曱酸、乙酸、丙酴笪 内§文專之瑷酸類、二曱基醚、 二=細、甲基相_丁_、四氫W、四氩<喃、二嗓 烷荨之醚類、三曱基胺、三 " G基私、N，N，N，，N，-四曱基伸 乙一胺、吡啶等之胺類、-审I TO ，妨… —甲基甲醯胺、N，N-二甲基The residue, -B(OH)2, etc., exemplifies a hydrogen atom in a state of being oxidized by an oxidizing agent or electrochemical oxidation. A. In the production of the ionic polymer used in the present invention, for example, a compound (monomer) which is prepared by the above formula =) or the formula (37) which is required to be mixed with the base of the (4) is dissolved. In an organic solvent, a polymerization method in which the reaction is carried out at a temperature below the life point of the brain in the form of a solvent or a suitable (4) is used. As such a polymerization method ▲, for example, it is possible to use. It is contained in the downtime reaction ((4) anieReaetic) ns),,, vol. 323451 124 201234576 270-490, (John Wiley & Sons, Inc.), 1965, "Organic Syntheses", Comprehensive Series 6 Volume (Collective Volume VI), pp. 407-411, (John Wiley & Sons, Inc.), 1988, Chem. Rev., Vol. 95, p. 2457, (1995), Organometallics J. Organomet. Chem., vol. 576, p. 147, (1999), Macromol. Chem., Macromol. Symp., Vol. 12, 292 Page, (1987) is a well-known method. Further, in the production of the ionic polymer used in the present invention, a conventional polycondensation reaction can be employed in conjunction with the base for the condensation polymerization. As such a polymerization method, a method of polymerizing the monomer by a Suzuki coupling reaction, a method of performing polymerization by a Grignard reaction, a method of polymerizing by seeing (0) a complex, and a method of using FeCl3 or the like A method of performing polymerization by an oxidizing agent, a method of electrochemical oxidative polymerization, a method of decomposing an intermediate polymer having a suitable decomposing group, and the like. Even in such a polymerization reaction, a method of performing polymerization by a Suzuki coupling reaction, a method of performing polymerization by a Grignard reaction, and a method of performing polymerization by a nickel zero-valent complex are easy. It is preferred to control the structure of the obtained ionic polymer. One of the preferred methods for producing an ionic polymer used in the present invention is a group having an atom of an atom, an alkylsulfonate group, an arylsulfonate group, and an arylalkylsulfonate group. The group selected as a base material for the polycondensation is subjected to polycondensation in the presence of a nickel zero-valent complex to produce an ionic polymer. As a series of raw material monomers used in such a process, for example, a dihalogenated compound, a bis(alkyl sulfonate) compound, 125 323451 201234576 bis (aromatic acid) compound, bis (aryl succinyl acid) The compound, the tooth _ = the group %1, the compound, the functional group, the aryl sulfonate compound, the __ arylalkyl fluorene compound, the succinic acid s- aryl acid s. The acid-based compound and the aryl phthalate-aryl sulphuric acid vinegar compound. Other forms of the method for producing an ionic polymer are: /, a group consisting of a sulphate atom, a succinyl acid, a aryl group, an aromatic group: & The group consisting of a group of β, (β) 2 and a borate residue is used as a base for the polycondensation and the whole raw material monomer has a halogen original = ear 1 1 base ~ 竣 test group, σ s+(J)*-B(OH) 2 of the aryl sulfonate group and the arylalkyl sulfonate group, and the ratio of the total number of moles of the boronic acid ester residue (κ) And & οα A method of producing an ionic polymer by polycondensation in the presence of a raw material of 1 (generally K/J range of 0.7 to 1.2), jfe 、 barrier, catalyst or palladium catalyst. The organic solvent is also used depending on the compound or reaction to be used. It is preferable to use a sufficient degassing treatment to suppress the side reaction. θ.. < Organic solvent. In the production of ionic polymers, it is preferable to carry out the reaction in an inert environment using the organic solvent and the solvent. Further, it is preferable to carry out the dehydration treatment similar to the above-described deoxidation treatment in the respective organic, six, and _y_ 媒 media.彳曰早虚+...~ There is no restriction on the reaction between the two phases of the water such as the Suzuki coupling reaction. ^ ', 匕 species of organic solvent system such as: EH, XI, Geng, Xinyuan, I fear, Bu _ _ Yuan special saturated hydrocarbon, benzene, toluene, ethylbenzene, xylene, etc.小鲍和烟, — "carbon tetracarbonate, chloroform, methylene chloride, chlorobutane, bromine 126 323451 201234576 butane, pentane, bromopentane, chlorhexidine, province > smell has burned, Halogenated saturated smoke, chlorobenzene, chlorobenzene, bis- _ > halogenated unsaturated hydrocarbons such as sulfonium, trichlorobenzene, decyl alcohol, ethanol, propanol, ketone, butyl Alcohol, tert-butyl alcohol, alcohol, citric acid, acetic acid, bismuth citrate, didecyl ether, bis-fine, methyl phase _ _ _, tetrahydro W, tetra argon <Ether, dioxane oxime ether, tridecylamine, tri-" G-based private, N,N,N,,N,-tetradecyl-extension, amines such as pyridine, etc. - I TO , ...... —methylmethamine, N,N-dimethyl

乙醯月欠、N，N-二乙基乙醯胺、N 乎s _ ,,. ’甲基嗎啉氧化物等之醯胺 類。廷些有機溶媒係可以單獨 你田“L 平獨1種或者是混合2種以上而 使用。此外，即使是在此種有 氺丢虿铖吟媒中，由反應性之觀點 來看，更加理想是醚類，甚至最 由反應速度之觀點來看，最好；^ 二，離子性聚合物之際，為了反應本原料單體，因 ^最好疋添祕或射之觸媒。此紐錢媒係可以依 "之聚口方法等而進仃選擇。作為此種驗或觸媒最好是 充分地溶解於反應中使用之溶媒。此外，作為混合前述驗 或觸媒之方法係例舉.在氬或氮等之惰性環境下，擾摔反 應液，同時，緩慢地添加驗或難之減，或者是在驗或 觸媒之溶液中緩慢地添加反應液之方法。 本發明中使用之離子性聚合物，在末端基仍殘留聚合 活性基之時’所得狀發光元件之發光雜或壽命特性會 有降低之情形，因此，能夠藉由安定之基保護末端基。在 像這樣藉由安定之基保護末端基之狀態下 ，本發明中使用 之離子性聚合物為共軛化合物之時，最好是具有與該離子 127 323451 201234576 性聚合物之主鏈之共轭槿坤、* μ 列舉例如透㈣碳㈣=婉，作為其構1 此種保護末之衫基係日本;^ :^的化學1〇之構造式表示之1價芳香族化合 取代基。 作為，造包含化學式⑴所表示之構造單位之離子性 聚合物之其他之理想方法係列舉：在第】步驟中聚Μ具 有陽離子之離子性聚合物，# ” …、 合物製造含有_ + _ 在第步驟中由該離子1 生聚 口物子之離子性聚合物之方法。作 步 驟中之聚合不具有陽科之料絲 _ 述之縮聚反應。作為第2步驟夕。之方法係列舉 产 步驟之反應係列舉藉由金屬氫氧 化物、縣㈣魏物等之轉反應等。 作為製造包含化學式(2)所表示二基之離子性聚合物 舉:在第1步_合不具有離子之 ==第2步驟中由該離子性聚合物製造含 有離子之料/合物之方法。作為第1步驟之聚合不具 為第之方法係列舉前述之縮聚反應。作 :弟二=:反應係列舉使用自燒基之胺之4級銨氣化反 應、#由SbF5而拔除ή素之反料。 例士 ί i=Ιΐ用之離子性聚合物係電荷產生優異，因此， 例如在使用於有機電激發光 發光之元件。 干之狀癌下，可得到南党度 作為形成包含離子性聚人 使用含有離子性聚合物之溶二列舉例如 323451 128 201234576 作為由此種溶液而成膜所使用之溶媒，除了水之外， 在醇類、醚類、酯類、腈化合物類、硝基化合物類、鹵烷 . 類、芳基鹵化物類、硫醇類、硫醚類、亞砜類、硫酮類、 醯胺類、羧酸類等之溶媒中，最好是溶解度參數為9.3以 上之溶媒。作為該溶媒之例（各括號内之值係表示各溶媒之 溶解度參數之值。）係列舉如：甲醇（12.9)、乙醇（11.2)、2-丙醇（11.5)、1_丁醇(9,9)、tert-丁基醇（10.5)、乙腈（11.8)、 1，2-乙烷二醇（14.7)、N，N-二曱基曱醯胺（11.5)、二曱基亞 春 砜（12.8)、乙酸（12.4)、硝基苯（11.1)、硝基曱烷（11.0)、1，2- 二氯乙烷(9.7)、二氯·甲烷(9.6)、氯苯(9.6)、溴苯(9.9)、二 噁烷(9.8)、碳酸伸丙酯（13.3)、吡啶（10.4)、二硫化碳（10.0)、 以及這些溶媒之混合溶媒。在此，就混合2種之溶媒（設為 溶媒1、溶媒2)而組成之混合溶媒進行說明時，該混合溶 媒之溶解度參數（(5 m)藉由5 1X01+ (^2X02而求出 (5 i係溶媒1之溶解度參數，¢1係溶媒1之體積比率，（5 φ 2係溶媒2之溶解度參數，02係溶媒2之體積比率。）。 <第1實施形態> (有機薄膜電晶體） 參照第1圖而就第1實施形態之有機薄膜電晶體之構 造例，來進行說明。第1圖係概略地顯示第1實施形態之 有機薄膜電晶體之構造例之剖面圖。第1實施形態之有機 薄膜電晶體10係底閘極型之有機薄膜電晶體之構造例。 正如第1圖所示，構成第1實施形態之有機薄膜電晶 體10係在閘極電極20之上，閘極絕緣層30和有機半導體 129 323451 201234576 層40以該順序而進行層積，並且，在該有機半導體層40 之上，第1電荷注入層50A及第1源極/汲極電極60A以 該順序而進行層積，同時，在有機半導體層40之上，第2 電荷注入層50B及第2源極/汲極電極60B以該順序而進 行層積。接著，在有機半導體層40之上，由第1電荷注入 層50A和第1源極/汲極電極60A而組成之層積體以及由 第2電荷注入層50B和第2源極/汲極電極60B而組成之 層積體係進行間隔配置。 作為其他之實施形態，層積有第1源極/汲極電極60A 和第2源極/汲極電極60B之電荷注入層，可於有機半導體 層40上連接。此外，由電氣特性之觀點來看，電荷注入層 最好是如本實施形態之間隔配置。在以下，在顯示無法特 別區別之第1電荷注入層50A和第2電荷注入層50B之狀 態下，將這個僅記載為電荷注入層50。 可以在閘極電極20使用導電體或半導體。閘極電極 20係需要規定之導電性，因此，可以使用本質半導體 (intrinsic semiconductor)。作為閘極電極20，由導電性之 觀點來看，最好是使用摻雜不純物之η型半導體或p型半 導體，更加理想是使用η型半導體。例如可以在矽基板中 任意地摻雜適當之ρ型離子或η型離子等而成為要求之導 電型之基板以作為閘極電極20使用。閘極電極20之厚度 方向Ζ之厚度係0.05 /zm至100/zm程度。 閘極絕緣層30係可以使用氧化矽、氮化矽等之絕緣 性材料而形成。例如可以藉由氧化使用作為閘極電極20 130 323451 201234576 之石夕基板之表面部，而在石夕基板之表面部形成閘極絕緣層 30。可以藉此而在閘極電極20之上形成閘極絕緣層30。 閘極絕緣層30之厚度方向Z之厚度係50nm至l〇〇〇nm程 度。 在有機半導體層40為p型有機半導體層之狀態下， 作為有機半導體層40之材料例係列舉如：蒽、稠四苯、稠 五苯、苯并稠五苯、二苯并稠五苯、四苯并稠五苯、萘并 稠五苯、稠六苯、稠七苯、稠九苯等之聚稠苯化合物；菲、 籲 E、苯并苞(iulminene)、芘、蒽概蒽、二苯并茈(peropyrene)、 蔻(coronene)、苯并蔻、二苯并蔻、六苯并蔻、笨并二蔻、 乙烯基蔻等之蔻化合物；茈、特麗綸、二茈、四萘嵌三苯 (Quaterrylene)等之茈化合物；聯三伸萘(Trinaphthylene)、 七芬(heptaphene)、莪（ovalene)、玉紅省（rubicene)、紫蒽酮 (violanthrone)、異紫蒽酮（isoviolanthrone)、稠二萘（chrysene)、 循環蒽、雙蒽（bisanthene)、7,14-二苯基二苯并[de，mn]稠四 φ 苯(zethrene)、七個7，14-二苯基二苯并[de，mn]稠四苯 (heptazethrene)、吡蒽（pyranthrene)、紫蒽（vi〇lanthrene)、 異紫蒽（isoviolanthrene)、聯笨、聯伸三苯、聯三苯、聯四 苯、舍可聯苯(circobiplienyl)、凯庫勒烯(Kekulene)、酞菁 素之共聚物和由此而組成之向分子有機半導體化合物。 在有機半導體層40為η型有機半導體層之狀態下， 作為有機半導體層40之材料例係列舉如··全氟稠五苯、全 氟銅酞菁、TCNQ(四氰基對苯醌二甲燒）、pTCDA(3,4,9，1〇_ 茈四甲酸二酐）、NTCDA(萘四曱酸酐）、pTCDI_c8(N，N,_ 323451 131 201234576 二辛基-3,4,9，l〇-茈四曱二醯亞胺）、C6〇、C6〇MC12(c6〇_Ethylamine, such as N,N-diethylacetamide, N s _ , , . Some of the organic solvent systems can be used alone or in combination with two or more types. In addition, even in such a smashing medium, it is more desirable from the viewpoint of reactivity. It is an ether, and it is best from the viewpoint of the reaction rate. ^2. When the ionic polymer is used, in order to react with the raw material monomer, it is best to add a secret or a catalyst. The medium can be selected according to the method of gathering, etc. As such a test or catalyst, it is preferably a solvent which is sufficiently dissolved in the reaction. Further, as a method of mixing the aforementioned test or catalyst, In an inert environment such as argon or nitrogen, the reaction liquid is disturbed, and at the same time, the method is slowly added or difficult to reduce, or the reaction liquid is slowly added to the solution of the test or catalyst. In the ionic polymer, when the polymerizable active group remains in the terminal group, the luminescent or lifetime characteristics of the resulting light-emitting device may be lowered. Therefore, the terminal group can be protected by a stable group. Base protection When the ionic polymer used in the present invention is a conjugated compound, it is preferred to have a conjugate with the main chain of the ion 127 323451 201234576 polymer, and * μ is exemplified by, for example, trans (tetra) carbon (tetra) = 婉In the case of the structure of the genus of the genus of the chemical formula (1), the ionic polymerization of the structural unit represented by the chemical formula (1) Another series of other ideal methods for the object: in the first step, the ionic polymer having a cation, the # ” ..., the compound containing _ + _ in the first step, the ion of the ion 1 A method of a polymer. The polymerization in the step does not have the filament of the yangke _ the polycondensation reaction described. As the second step of the evening. The reaction series of the series of production steps are carried out by a reaction of metal hydroxide, county (four) Weiwu, and the like. As a method for producing an ionic polymer comprising a diyl group represented by the chemical formula (2): a method for producing an ion-containing material/complex from the ionic polymer in the first step _without ions == second step . The polymerization as the first step does not have the above-mentioned series of polycondensation reactions. Work: Diji 2: The reaction series uses a 4-stage ammonium gasification reaction using a self-alkylating amine, and #拔Fr5 is used to remove the halogen. The ionic polymer used in the case of ί i = is excellent in charge generation, and therefore, for example, it is used in an element for organic electroluminescence. In the case of dry cancer, Nanfang degree can be obtained as a solvent containing an ionic polymer by using an ionic polymer. For example, 323451 128 201234576 is used as a solvent for forming a film from such a solution, except for water. In alcohols, ethers, esters, nitrile compounds, nitro compounds, halogenated alkanes, aryl halides, mercaptans, thioethers, sulfoxides, thiones, guanamines, Among the solvents such as carboxylic acids, a solvent having a solubility parameter of 9.3 or more is preferred. Examples of the solvent (the values in the respective brackets indicate the values of the solubility parameters of the respective solvents) are as follows: methanol (12.9), ethanol (11.2), 2-propanol (11.5), and 1-butanol (9). , 9), tert-butyl alcohol (10.5), acetonitrile (11.8), 1,2-ethanediol (14.7), N,N-didecylguanamine (11.5), dimercapto sulfanyl sulfone (12.8), acetic acid (12.4), nitrobenzene (11.1), nitrodecane (11.0), 1,2-dichloroethane (9.7), dichloromethane (9.6), chlorobenzene (9.6), Bromobenzene (9.9), dioxane (9.8), propyl carbonate (13.3), pyridine (10.4), carbon disulfide (10.0), and a mixed solvent of these solvents. Here, when a mixed solvent composed of two kinds of solvents (the solvent 1 and the solvent 2) is mixed, the solubility parameter ((5 m) of the mixed solvent is obtained by 5 1X01+ (^2X02) (5) The solubility parameter of the i-based solvent 1, the volume ratio of the ¢1-based solvent 1, (the solubility parameter of the 5 φ 2-based solvent 2, and the volume ratio of the 02-based solvent 2). <First embodiment> (Organic thin film electric (1) A structural example of the organic thin film transistor of the first embodiment will be described with reference to Fig. 1. Fig. 1 is a cross-sectional view schematically showing a structural example of the organic thin film transistor of the first embodiment. The organic thin film transistor 10 of the embodiment is a structural example of the organic thin film transistor of the bottom gate type. As shown in Fig. 1, the organic thin film transistor 10 of the first embodiment is formed on the gate electrode 20, and the gate is provided. The pole insulating layer 30 and the organic semiconductor 129 323451 201234576 layer 40 are laminated in this order, and on the organic semiconductor layer 40, the first charge injection layer 50A and the first source/drain electrode 60A are in this order Lamination, at the same time, in the organic semiconductor layer The second charge injection layer 50B and the second source/drain electrode 60B are stacked in this order on the 40. Then, on the organic semiconductor layer 40, the first charge injection layer 50A and the first source are formed. The laminated body composed of the /electrode electrode 60A and the laminated system composed of the second charge injection layer 50B and the second source/drain electrode 60B are arranged at intervals. In another embodiment, the first layer is laminated. The charge injection layer of the source/drain electrode 60A and the second source/drain electrode 60B may be connected to the organic semiconductor layer 40. Further, from the viewpoint of electrical characteristics, the charge injection layer is preferably as in the present embodiment. In the state in which the first charge injection layer 50A and the second charge injection layer 50B which are not particularly distinguishable are displayed, this will be described only as the charge injection layer 50. The conductor can be used for the gate electrode 20. Or a semiconductor. The gate electrode 20 requires a predetermined conductivity, and therefore, an intrinsic semiconductor can be used. As the gate electrode 20, it is preferable to use an n-type semiconductor doped with impurities from the viewpoint of conductivity. Or p-type half It is preferable to use an n-type semiconductor as the conductor. For example, a substrate of a desired conductivity type can be arbitrarily doped with a suitable p-type ion or an n-type ion in the germanium substrate to be used as the gate electrode 20. The gate electrode 20 can be used. The thickness in the thickness direction is about 0.05 / zm to 100 / zm. The gate insulating layer 30 can be formed using an insulating material such as tantalum oxide or tantalum nitride. For example, it can be used as a gate electrode 20 130 by oxidation. 323451 201234576 The surface portion of the substrate is formed, and the gate insulating layer 30 is formed on the surface portion of the stone substrate. A gate insulating layer 30 can be formed over the gate electrode 20 by this. The thickness Z of the gate insulating layer 30 has a thickness of 50 nm to 10 nm. In the state in which the organic semiconductor layer 40 is a p-type organic semiconductor layer, examples of the material of the organic semiconductor layer 40 include: ruthenium, fused tetraphenyl, pentacene, benzohexacene, dibenzo pentacene, Polystyrene compound of tetrabenzopyroquinone, naphthacene pentacene, hexabenzene, hexabenzene, condensed nonabenzene, etc.; phenanthrene, E, benzopyrene, 芘, 蒽, 二a compound of peropyrene, coronene, benzopyrene, dibenzopyrene, hexabenzopyrene, stupid diterpene, vinyl anthracene, etc.; anthracene, terylene, diterpene, tetranaphthalene a quinone compound such as Quaterrylene; Trinaphthylene, heptaphene, ovalene, rubicene, violanthrone, isoviolanthrone ), chrysene, cyclic oxime, bisanthene, 7,14-diphenyldibenzo[de,mn] fused tetrathene benzene (zethrene), seven 7,14-diphenyl Dibenzo[de,mn]heptazethrene, pyranthrene, vi〇lanthrene, isoviolanthrene, stupid, joint three Copolymer terphenyl, quaterphenyl, homes may be biphenyl (circobiplienyl), kekulene (Kekulene), a phthalocyanine pigment into the molecule of the organic semiconductor compound and thus the composition. In the state in which the organic semiconductor layer 40 is an n-type organic semiconductor layer, examples of the material of the organic semiconductor layer 40 include: · perfluoro pentacene, perfluorocopper phthalocyanine, TCNQ (tetracyanoquinone dimethyl phthalate) Burning), pTCDA (3,4,9,1〇_茈tetracarboxylic acid dianhydride), NTCDA (naphthalene tetraphthalic anhydride), pTCDI_c8 (N,N,_ 323451 131 201234576 dioctyl-3,4,9,l 〇-茈四曱二醯imino), C6〇, C6〇MC12(c6〇_

溶融°比咯啶-間-C12苯基）、C70富勒烯、PCBM(苯基C61 丁酸甲基醋）、氰基PPV(聚氰基對苯二亞甲基）、F4TCNQ (四氟-四氰基對苯醌二甲烷）、聚[(2,5_二癸氧基4,4-伸苯） (2,4,6-三異丙基苯基硼烷)]、二苯基封端、聚[(1，4二伸乙 烯伸苯基)(2,4,6_三異丙基苯基硼烷)]、聚（苯并雙咪唑并苯 并菲繞琳）、二氟甲基苯基取代雙π塞嗤NTCDA(萘四甲酸二 奸）、1^應(^)(11，11，12，12-四氰基萘并_2,6-啥二甲烧）等。 有機半導體層40之厚度係lnm至1〇〇//m程度。 、電荷注入層50係在導電型為n型之狀態下，發揮作 為電子注入層之機能，在導電型為P型之狀態下，發揮作 為電洞注入層之機能。 物電何注入層50係最好是包含已經說明之離子性聚合 在實質上，由该離子性聚合物而構成。在形成發揮作 具2子注入層之機能之電荷注入層50之狀態下，可以使用 此外電子'主入特性之n型之離子性聚合物，來作為材料。 之狀雖在形t發揮作為電洞注入層之機能之電荷注入層50 人3可以使用具有電洞注入特性之p型之離子性聚 ^物，來作為材料。 有棬主道月J面之敘述，本實施形態之電荷注入層5〇係在 有機丰導體層40 ^ 料、士 上，使第1電荷注入層50A和第2電 何注入層地間隔配置。 電荷注入層5〇 + r- 鞀麻 之厚度方向Z之厚度係0.5nm至l〇〇nm 矛王度。此外，第】 電何注入層50A和第2電荷注入層5〇b 132 323451 201234576 之間隔！^1(相當於通道長度）係0.1#111至1000#111程度。 此外，在第1電荷注入層50A和第2電荷注入層50B間隔 之方向X(在第1圖中為左右方向）之第1電荷注入層50A 及第2電荷注入層50B之幅寬L2係0.1 至1000# m 程度。此外，在第1電荷注入層50A和第2電荷注入層50B 間隔之方向X(在第1圖中為左右方向）以及電荷注入層50 之厚度方向Z(在第1圖中為上下方向），垂直方向Y(在第 1圖中為垂直紙面之方向）之電荷注入層50之幅寬(相當於 Φ 通道幅寬)係0.1//m至1000/z m程度。 第1源極/汲極電極60A係設置為與第1電荷注入層 50A相接，第2源極/汲極電極60B係設置為與第2電荷注 入層50B相接。在本實施形態中，由閘極電極20之厚度 方向Z之一邊(在以下，亦稱為「在平面圖中」。）來看，第 1電荷注入層50A和第1源極/汲極電極60A係設置成其周 邊形狀略呈一致。此外，在平面圖中，第2電荷注入層50B $ .和第2源極/汲極電極60B係設置成其周邊形狀略呈一致。 第1及第2源極/汲極電極60A、60B之厚度方向Z之厚度 係分別為0.05 // m至1000// m程度。 作為第1源極/汲極電極60A及第.2源極/汲極電極60B .之材料係可以任意地使用適當之導電性材料，但是，在藉 由使用塗佈液之塗佈法而形成之狀態下，適合使用具有導 電性之金屬微粒。作為金屬微粒係適合使用金、銀、鋁。 此外，除了金、銀、鋁之金屬微粒以外，還適合使用碳膏 以及碳膏和金屬微粒之混合物等。 133 323451 201234576 電荷注入層50、有機半導體層4〇及閘極電極2〇之導 電型係可以適度地由最適當之組合而選擇，可以全部相 同’也可以相互地不同。有機半導體層4〇及閘極電極2〇 之導電型最好是相同。此外，由於閘極電極2〇之導電性宜 间’因此’其導電型並無特別限定。n型之⑦半導體基板 -般之導電性較高，因此，在閘極電極2()中最好是使用^ 型之石夕半導體基板。例如電荷注人層5G、有機半導體層仙 及閘極電極20最好是導電型全部為β。此外，電荷^入 層5〇係第1電荷注入層5〇Α和第2電荷注入層細呈間 隔之狀態下’帛丨電荷注人層观和第2電荷注入層通 之導電型可相互不同。 (有機薄膜電晶體之製造方法） 在以下，參考第1圖’將具有朗構造之有機薄膜電 日日體之製造方法予以說明。 有機薄膜電晶體之製造方法係分別形成閉極電極、第 1源極/没極電極、第2源極/沒極電極、設置在前述第i源 極//及極電極及第2源極/祕電極和前糾極電極之間^ 有機半導體層、在前述第丨祕/祕電極及第2源極/沒 極電極和前述有機半導體層之間與前述第1源極/及極電 極及第2源極/錄電極相接而配置之電荷注人 薄膜電晶體之製造方法，其t，具備：將含有具^電荷注 入特f生之離子性聚合物之f荷注人層^以形成之步驟。也 就是說，有機薄膜電晶體之製造方法係具備：形成閑極電 極之步驟；形成第i源極/汲極電極之步驟；形成第2源極 323451 134 201234576 /及極電極之步驟；形成前述第丨源極级極電極 極/沒極電極以及設置於前述閘極電極間之 2源 之步驟；IX及在前述第丨源極级極電極及第.2 體層 電極和則述有機半導體層之間，形成與前述第= 及極 電極及第2源極/汲極電極相接而配置之電荷注丄層之= 驟。此外，各步驟之順序係配合有機薄膜電晶體 生乂 適度地設定。在本實施形態，以形成閘極電極之步驟 成有機半導體層之步驟、形成電荷注人狀步驟、以及形 成第’1源極/汲極電極及第2源極/汲極電極之步驟之順序 而進行。 ' 首先，形成閘極電極20。在該步驟中，可以由市場來 得到發揮作為閘極電極機能之基板，並且，例如可以藉由 準備矽基板’實施離子植入(i〇n implantati〇n)步驟及離子擴 散步驟等，使得基板之全區域或部分區域，成為任意之導 電型，而形成閘極電極。 接著’在準備之基板之表面部形成閘極絕緣層3〇。該 步驟係可以實施成為藉由C V D法(化學氣相成長法）等而使 用已經說明之絕緣性材料之成膜步驟。 此外’在使用矽基板作為基板2〇之狀態下，可以藉 由以熱氧化步驟氧化所準備之矽基板之表面部，在矽基板 之表面部形成熱氧化膜，而在閘極電極20之上形成由該熱 氧化膜所成之閘極絕緣層3〇。,可以藉由像這樣，使用矽基 板作為閘極電極，而以熱氧化該矽基板之簡易步驟簡便地 形成閘極絕緣層30。 135 323451 201234576 接著，在閘極絕緣層30之上形成有機半導體層.40。 該步驟係可以藉由任意適當之方法而實施。該步驟係可以 藉由使用材料溶解或分散於任意適當之溶媒中之塗佈液之 塗佈法而實施。可以在塗佈液之調製之際，配合需要而實 施使用膜濾器之過濾等之步驟。 藉由將得到之塗佈液塗佈於閘極絕緣層30之上，進 行對應於材料之任意適當之加熱處理，而形成有機半導體 層40。 • 在本發明之有機薄膜電晶體10之製造方法中，在藉 由使用塗佈液之塗佈法而形成構成有機薄膜電晶體10之 層之狀態下，塗佈步驟係在常壓程度之環境或大氣環境下 實施。 在此之所謂「大氣環境」係表示容許水分、氧之含有 之環境。「大氣環境」具體地包含常溫、常壓之未調整之環 境，並且，容許水分、氧之含有，而且，就溫度、壓力、 Φ 成分等而調整之環境。該「調整之環境」係進行以能夠實 施包含「塗佈」之本發明之製造方法來作為條件而調整氮、 氫、氧、二氧化碳等之組成成分之處理、進行調整這些組 成比例之處理，可以調整對浮游微粒、浮游微生物之潔淨 度，並且，包含以能夠實施包含「塗佈」之本發明之製造 方法來作為條件而可以調整溫度、濕度、壓力等之環境條 件之環境。此外，在本說明書中，所謂常壓一般為1013hPa ±100hPa之壓力。常壓程度之環境中，只要是常壓的話， 則也包含氮氣或氬氣等之惰性氣體環境。 136 323451 201234576 作為塗佈法之例係列舉如··旋 型照相凹版印刷塗佈法、照相凹版，塗佈法、模鑄法、微 法、壓輥塗佈法、線棒塗佈法、浸、、主卩刷塗佈法、桿條塗佈 網版印刷法、柔版印刷法、平版广’貝塗佈法、噴射塗佈法、 在藉由塗佈法而形成層之時，在、二及嗔墨印刷法等。 狀地形成有機半導體層之狀態下，^必須呈規定之圖案形 分別呈規定之圖案形狀地將Ϊ佈液以塗佈步驟， 圖案形狀地形成有機半導體層，並且，，佈:而呈規定之 塗佈來形成層之後，實施光微影步驟以:二在以全面 步驟等之任意適當之圖案化步雜，^ 貝進行之颠刻 形成有機半導體層。 疋之圖案形狀地 、*接著，在有機半導體層40之上，形成且有 =之離子性聚合物之第1電荷注入層觀、有電何 :主广。m電荷注入層50A在本實施形態= ^為相同於後面形成之第！源極/沒極電極6〇八之同樣圖宰 %成。第2電荷注入層5〇B在本實施形態中，係成為相 5於後面形成之第2源極/；；及極電極6〇B之同樣圖案而形 成。該步驟係相同於有機半導體層4〇之形成步驟，可以藉 =使用材料溶解於任意適當之溶媒中之塗佈液之塗佈法而 實施。此外，在電荷注入層50為n型之電子注入層之狀態 下，作為材料係選擇導電型為n型之離子性聚合物，在電 主入層50為p型之電洞注入層之狀態下，作為材料係選 擇導電型為p型之離子性聚合物，來調製塗佈液。藉由該 塗佈液塗佈於有機半導體層40之表面，進行對應於材料之 323451 137 201234576 任意適當之加熱處理，而形成電荷洤入層 接著，在第1電荷注入層5〇A之上，^、 同於第1電荷注入層5〇a之第1源極/沒極m形狀相 時，在第2電荷注入層50B之上， 才6〇A，同 2電荷注人層地之第2源崎極電極2形狀相同於第 該步驟係適合於使用藉由金、銀、之 之金屬微粒和任意適當之溶媒而調製之塗、'具有導電性 性層。在使用金屬微粒作為導電性材料之形成導電 度地使用水、甲醇、乙醇、丙醇 二下，可以適 等之極性溶媒。 U A)'二甲基陶 藉由塗佈法之第！源極/汲極電極6 極電極6 0 B之形成係藉由塗佈經調源極/沒 佈液之塗佈係適合藉由旋轉塗、液而進行。塗 著，能夠藉由以對應於材料之== ι 及第2源極及極電極60Β。 玉6〇α :這=’如果藉由本發明之有機薄臈電晶體 仏夂’則使騎使是在t壓程度之 甚 :也不容易氧化之離.子性聚合物，來作為電荷注= ^因此’可以分別在常麗程度之環境、甚至大氣環境下， 實施形成電荷注入層50之步驟以及形成第1源極/汲極電 極60A和第2源極/汲極電極6〇B之步驟，來作為包含將 塗佈液予以塗佈之步驟者。此外，即使就形成有機半導體 層40之步驟而言，也可以成為包含在常壓程度之環境、甚 138 323451 201234576 至大氣環境下而將塗佈液予以塗佈之步驟者。 <第2實施形態.> (有機薄膜電晶體） 參考第2圖而就第2實施形態之有機薄膜電晶體之構 造例，來進行說明。此外，就相同於第1實施形態來說明 之層之同一層而言，有附加相同之符號而省略其說明之情 形。 第2圖係概略地顯示第2實施形態之有機薄膜電晶體 鲁之構造例之剖面圖。第2實施形態之有機薄膜電晶體1〇 係頂閘極型之有機薄膜電晶體之構造例。 正如第2圖所示，第2實施形態之有機薄膜電晶體1〇 係設置在基板70之上。基板70係可以是例如玻璃基板等 之硬式基板，也可以是塑膠基板等之可撓性基板’甚至可 以疋薄膜。也可以藉由使用可撓性基板、薄膜，而使得整 體成為可撓性之有機薄膜電晶體。 • 在基板70之厚度方向Z之某一邊之表面上，設置第1 源極//及極電極60A和第2源極/汲極電極6〇B。這些之第} 源極/祕電極6GA和第2源極你極電極細係相互地間 隔配置。 在第1源極/汲極電極60A之表面上，設置圖案化成 為與該第1源極/汲極電極6 〇 A為同樣形狀之第工電荷注入 層50A。在第2源極/及極電極_之表面上，設置圖案化 成為與該第2源極級極電極_為同樣形狀之第2電荷注 入層50B。 139 323451 201234576 電荷注入層5 0係由經說明之離夺性聚合物而成。在 形成發揮作為電子注入層之機能之電荷注入層50之狀態 下，可以使用具有電子注入特性之η型之離子性聚合物， 來作為材料。此外，在形成發揮作為電洞注入層之機能之 電荷注入層50之狀態下，可以使用具有電洞注入特性之ρ 型之離子性聚合物，來作為材料。 電荷注入層50係在導電型為η型之狀態下，發揮作 為電子注入層之機能，在導電型為ρ型之狀態下，發揮作 ®為電洞注入層之機能。 在基板70上，設置有機半導體層40使覆蓋第1源極 /汲極電極60Α和第2源極/汲極電極60Β以及形成於這些 電極上之電荷注入層50。該有機半導體層40係相當於活Moltenion ratio of pyridyl-m-C12 phenyl), C70 fullerene, PCBM (phenyl C61 butyric acid methyl vinegar), cyano PPV (polycyano-p-xylylene), F4TCNQ (tetrafluoro- Tetracyano-p-benzoquinodimethane), poly[(2,5-dioxaoxy 4,4-phenylene) (2,4,6-triisopropylphenylborane)], diphenyl End, poly[(1,4 di-extended ethylene phenyl) (2,4,6-triisopropylphenylborane)], poly(benzobisimidazobenzophenanthrene), difluoromethyl The phenyl group is substituted with double π 嗤 NTCDA (naphthalene tetracarboxylic acid), 1 ^ should (^) (11,11,12,12-tetracyanophthalazol-2,6- fluorene) and the like. The thickness of the organic semiconductor layer 40 is about 1 nm to 1 Å/m. The charge injection layer 50 functions as an electron injection layer in a state where the conductivity type is an n-type, and functions as a hole injection layer in a state where the conductivity type is a P-type. Preferably, the electron-injecting layer 50 is comprised of the ionic polymer described above and consists essentially of the ionic polymer. In the state in which the charge injection layer 50 functioning as a function of the sub-injection layer is formed, an n-type ionic polymer having an electron-introgress characteristic can be used as the material. The charge injection layer 50 which functions as a hole injection layer in the shape t can be used as a material by using a p-type ionic polymer having a hole injection property. In the description of the J-face of the main channel, the charge injection layer 5 of the present embodiment is placed on the organic-rich conductor layer 40, and the first charge injection layer 50A and the second electric injection layer are arranged at intervals. The thickness of the charge injection layer 5 〇 + r- ramie in the thickness direction Z is 0.5 nm to 1 〇〇 nm. In addition, the interval between the first injection layer 50A and the second charge injection layer 5〇b 132 323451 201234576! ^1 (equivalent to channel length) is 0.1#111 to 1000#111. In addition, the width L2 of the first charge injection layer 50A and the second charge injection layer 50B in the direction X (the left-right direction in the first drawing) in which the first charge injection layer 50A and the second charge injection layer 50B are spaced apart is 0.1. To the extent of 1000# m. In addition, the direction X (the horizontal direction in the first drawing) of the first charge injection layer 50A and the second charge injection layer 50B and the thickness direction Z of the charge injection layer 50 (the vertical direction in the first drawing) are The width of the charge injection layer 50 (corresponding to the width of the Φ channel) in the vertical direction Y (the direction perpendicular to the sheet in Fig. 1) is about 0.1/m to 1000/zm. The first source/drain electrode 60A is placed in contact with the first charge injection layer 50A, and the second source/drain electrode 60B is placed in contact with the second charge injection layer 50B. In the present embodiment, the first charge injection layer 50A and the first source/drain electrode 60A are viewed from one side in the thickness direction Z of the gate electrode 20 (hereinafter also referred to as "in plan view"). It is set such that its peripheral shape is slightly uniform. Further, in the plan view, the second charge injection layer 50B $ and the second source/drain electrode 60B are arranged such that their peripheral shapes are slightly uniform. The thicknesses of the first and second source/drain electrodes 60A and 60B in the thickness direction Z are each about 0.05 // m to 1000//m. The material of the first source/drain electrode 60A and the second source/drain electrode 60B can be arbitrarily used as a suitable conductive material, but is formed by a coating method using a coating liquid. In the state of this, it is suitable to use metal particles having conductivity. As the metal fine particles, gold, silver, and aluminum are suitably used. Further, in addition to metal particles of gold, silver, and aluminum, a carbon paste and a mixture of a carbon paste and metal particles are suitably used. 133 323451 201234576 The electric charge type of the charge injection layer 50, the organic semiconductor layer 4A, and the gate electrode 2A can be appropriately selected from the most appropriate combination, and can be all the same or different from each other. The conductivity types of the organic semiconductor layer 4 and the gate electrode 2 are preferably the same. Further, since the conductivity of the gate electrode 2 is preferably '', the conductivity type is not particularly limited. N-type 7 semiconductor substrate - Generally, the conductivity is high. Therefore, it is preferable to use a type of Si Xi semiconductor substrate in the gate electrode 2 (). For example, the charge injection layer 5G, the organic semiconductor layer, and the gate electrode 20 are preferably all of the conductivity type β. Further, in the state in which the first charge injection layer 5 and the second charge injection layer are finely spaced apart, the charge-injection layer 5 and the second charge injection layer may be different from each other. . (Manufacturing method of organic thin film transistor) Hereinafter, a method for producing an organic thin film electric solar body having a Lang structure will be described with reference to Fig. 1 . The method for producing an organic thin film transistor is to form a closed electrode, a first source/bump electrode, a second source/bump electrode, and the ith source// and the electrode and the second source/ Between the secret electrode and the front rectifying electrode, the organic semiconductor layer, the first source/polar electrode, and the first source/pole electrode and the second source/dot electrode and the organic semiconductor layer A method for producing a charge-injecting thin film transistor in which a source/recording electrode is connected, wherein t comprises: forming a f-charged layer containing an ionic polymer having a charge injected into a specific one step. That is, the method of manufacturing an organic thin film transistor includes the steps of: forming a dummy electrode; forming an ith source/drain electrode; forming a second source 323451 134 201234576 / and a pole electrode; forming the foregoing a second source electrode/pole electrode and a source of two sources disposed between the gate electrodes; IX and between the first source electrode and the second body electrode and the organic semiconductor layer Forming a charge injection layer disposed in contact with the first and second electrode and the second source/drain electrodes. Further, the order of the respective steps is appropriately set in accordance with the organic thin film transistor growth. In the present embodiment, the step of forming the gate electrode to form the organic semiconductor layer, the step of forming the charge injection step, and the step of forming the first source/drain electrode and the second source/drain electrode And proceed. First, the gate electrode 20 is formed. In this step, a substrate functioning as a gate electrode can be obtained from the market, and the substrate can be made, for example, by performing an ion implantation process, an ion diffusion step, or the like. The entire region or part of the region becomes an arbitrary conductivity type and forms a gate electrode. Next, a gate insulating layer 3 is formed on the surface portion of the prepared substrate. This step can be carried out as a film forming step of using an insulating material which has been described by a C V D method (chemical vapor phase growth method) or the like. Further, in a state where the tantalum substrate is used as the substrate 2, the surface portion of the substrate prepared by the thermal oxidation step can be oxidized to form a thermal oxide film on the surface portion of the tantalum substrate, and above the gate electrode 20 A gate insulating layer 3〇 formed of the thermal oxide film is formed. The gate insulating layer 30 can be easily formed by a simple step of thermally oxidizing the germanium substrate by using a germanium substrate as a gate electrode as described above. 135 323451 201234576 Next, an organic semiconductor layer .40 is formed over the gate insulating layer 30. This step can be carried out by any suitable method. This step can be carried out by a coating method using a coating liquid in which a material is dissolved or dispersed in any appropriate solvent. The step of filtering using a membrane filter or the like can be carried out as needed in the preparation of the coating liquid. The organic semiconductor layer 40 is formed by applying the obtained coating liquid onto the gate insulating layer 30, and performing any appropriate heat treatment corresponding to the material. In the manufacturing method of the organic thin film transistor 10 of the present invention, in the state in which the layer constituting the organic thin film transistor 10 is formed by the coating method using the coating liquid, the coating step is in an environment of a normal pressure level. Or implemented in an atmospheric environment. The term "atmospheric environment" as used herein refers to an environment that allows the inclusion of water and oxygen. The "atmospheric environment" specifically includes an environment in which the ambient temperature and the normal pressure are not adjusted, and the water, oxygen, and temperature, pressure, and Φ components are allowed to be adjusted. The "adjustment environment" is a process of adjusting the composition of nitrogen, hydrogen, oxygen, carbon dioxide, or the like as a condition by performing the manufacturing method of the present invention including "coating", and adjusting the composition ratios. The cleanliness of the floating particles and the floating microorganisms is adjusted, and the environment in which the environmental conditions such as temperature, humidity, pressure, and the like can be adjusted under the condition that the manufacturing method of the present invention including "coating" can be performed is included. Further, in the present specification, the so-called normal pressure is generally a pressure of 1013 hPa ± 100 hPa. In an environment of normal pressure, if it is normal pressure, it also contains an inert gas atmosphere such as nitrogen or argon. 136 323451 201234576 As a series of coating methods, such as rotary gravure coating, gravure, coating, die casting, microfabrication, roll coating, bar coating, dip , main brush coating method, bar coating screen printing method, flexographic printing method, lithographic coating method, spray coating method, when forming a layer by coating method, Second and the ink printing method. In a state in which the organic semiconductor layer is formed in a shape, the organic silicon layer is formed in a pattern shape by a coating step in a predetermined pattern shape, and the pattern is formed in a pattern shape. After coating to form a layer, the photolithography step is carried out to form an organic semiconductor layer by any appropriate patterning step in a comprehensive step or the like. The pattern shape of the crucible, and then, on the organic semiconductor layer 40, the first charge injection layer of the ionic polymer is formed, and the electric charge is mainly: The m charge injection layer 50A is the same as the one formed later in this embodiment = ^! The source/dot electrode 6 is the same as the graph. In the present embodiment, the second charge injection layer 5A is formed in the same pattern as the second source/; and the electrode 6B formed later. This step is the same as the step of forming the organic semiconductor layer 4, and can be carried out by a coating method using a coating liquid in which a material is dissolved in any appropriate solvent. Further, in a state where the charge injection layer 50 is an n-type electron injection layer, an n-type ionic polymer is selected as a material system, and the electric main entrance layer 50 is a p-type hole injection layer. The coating liquid was prepared by selecting an ionic polymer having a conductivity type of p-type as a material. By applying the coating liquid to the surface of the organic semiconductor layer 40, any appropriate heat treatment corresponding to the material 323451 137 201234576 is performed to form a charge intrusion layer, and then, over the first charge injection layer 5A, ^, in the same manner as the first source/minor m-shaped phase of the first charge injection layer 5〇a, on the second charge injection layer 50B, only 6〇A, the second charge of the same charge layer 2 The source electrode 2 has the same shape as the first step, and is suitable for coating with a metal layer of gold, silver, or any suitable solvent, and has a conductive layer. In the case where metal fine particles are used as the conductive material to form conductivity, water, methanol, ethanol, or propanol is used, and a polar solvent can be used. U A) 'Dimethyl pottery by coating method! The formation of the source/drain electrode 6 electrode 6 0 B is carried out by coating the source/drain solution with a coating system suitable for spin coating or liquid. The coating can be performed by the corresponding source == ι and the second source and the electrode 60Β. Jade 6 〇 α : This = 'If the organic thin 臈 臈 藉 藉 藉 藉 藉 则 则 则 则 则 则 则 则 则 则 则 则 则 则 则 则 则 则 骑 骑 骑 骑 骑 骑 骑 骑 骑 骑 骑 骑 骑 骑 骑 骑 骑^ Therefore, the steps of forming the charge injection layer 50 and the steps of forming the first source/drain electrode 60A and the second source/drain electrode 6B can be performed in a normal atmosphere or even an atmosphere, respectively. , as a step including coating the coating liquid. Further, even in the step of forming the organic semiconductor layer 40, the coating liquid may be applied in an environment containing a normal pressure to a temperature of 138 323451 201234576 to an atmospheric environment. <Second Embodiment.> (Organic Thin Film Transistor) A configuration example of the organic thin film transistor of the second embodiment will be described with reference to Fig. 2 . In the same layer as the layer described in the first embodiment, the same reference numerals will be given, and the description will be omitted. Fig. 2 is a cross-sectional view schematically showing a structural example of the organic thin film transistor of the second embodiment. The organic thin film transistor of the second embodiment is a structural example of an organic thin film transistor of a top gate type. As shown in Fig. 2, the organic thin film transistor 1 of the second embodiment is provided on the substrate 70. The substrate 70 may be a rigid substrate such as a glass substrate, or a flexible substrate such as a plastic substrate, or even a tantalum film. It is also possible to use a flexible substrate or a film to make the entire organic thin film transistor flexible. • The first source//and electrode 60A and the second source/drain electrode 6B are provided on the surface of one side in the thickness direction Z of the substrate 70. The ninth source/secret electrode 6GA and the second source electrode are closely spaced from each other. On the surface of the first source/drain electrode 60A, a gate charge injection layer 50A patterned in the same shape as the first source/drain electrode 6 〇 A is provided. On the surface of the second source/pole electrode _, a second charge injection layer 50B having the same shape as that of the second source-level electrode _ is patterned. 139 323451 201234576 The charge injection layer 50 is formed from the illustrated dissociative polymer. In the state in which the charge injection layer 50 functioning as an electron injecting layer is formed, an n-type ionic polymer having an electron injecting property can be used as a material. Further, in the state in which the charge injection layer 50 functioning as a hole injection layer is formed, a p-type ionic polymer having a hole injection property can be used as the material. The charge injection layer 50 functions as an electron injection layer in a state in which the conductivity type is an n-type, and functions as a hole injection layer in a state in which the conductivity type is a p-type. On the substrate 70, an organic semiconductor layer 40 is provided so as to cover the first source/drain electrode 60A and the second source/drain electrode 60A and the charge injection layer 50 formed on these electrodes. The organic semiconductor layer 40 is equivalent to living

I 性層。 在有機半導體層40之上，閘極絕緣層30及閘極電極 20Α，以該順序而進行層積。 φ 構成第2實施形態之有機薄膜電晶體之各層及電極之 尺寸係例如相同於前述第1實施形態之有機薄膜電晶體。 如果像這樣而使得有機薄膜電晶體之構造成為頂閘極型的 話，·則不需要石夕基板。於是，能夠使用可撓性基板，因此， 可以整體地成為可撓性之有機薄膜電晶體。並且，可以成 為廉價之基板，所以，能夠減低製造成本。 (有機薄膜電晶體之製造方法） ..就第2圖所示之構造之第2實施形態之有機薄膜電晶 體之製造方法而進行說明。此外，在相同於第1實施形態 140 323451 201234576 中說明之製造步驟之狀態下，有省略其詳細説明之情形。 第2實施形態之有機薄膜電晶體1〇之製造方法係分 別形成閘極電極、第1源極/汲極電極、第2源極/¾極電 極、設置在前述第1源極/汲極電極及第2源極/没極電極 和前述閘極電極之間之有機半導體層、在前述第1源極/ 没極電極及第2源極/汲極電極和前述有機半導體層之間， 與月！j述第1源極/淡極電極及第2源極/及極電極相接配置 之電荷注入層的有機薄膜電晶體之製造方法，其中，具備： 籲將含有具備電荷注入特性之離子性聚合物之電荷注入層予 以形成之步驟。也就是說，有機薄膜電晶體之製造方法係 具備：形成閘極電極之步驟；形成第1源極/汲極電極之步 驟；形成第2源極/汲極電極之步驟；形成前述第丨源極/ 汲極電極及第2源極/汲極電極以及設置於前述閘極電極 間之有機半導體層之步驟；以及在前述第〗源極/溴極電極 及第2源極/汲極電極和前述有機半導體層之間，形成與前 •述第1源極/汲極電極及第2源極/汲極電極相接配置之電 荷注入層之步驟。此外，各步驟之順序係配合有機薄膜電 晶體之構造而適度地設定。在本實施形態中，以形成第玉 源極/汲極電極及第.2源極/汲極電極之步驟、形成電荷注 入層之步驟、形成有機半導體層之步驟、以及形成閘極電 極之步驟之順序而進行。 首先，準備基板70，在基板7〇，形成第丨源糨/汲極 電極60A及第2源極/汲極電極6〇B。該步驛係適合於成為 使用藉由金、銀、鋁等之具有導電性之金屬微粒和任意適 141 323451 201234576 當之溶媒而調製之塗佈液’形成導電'性之層或導電性之電 極圖案之步驟。在使用金屬微粒來作為導電性材料之狀態 下，可以適度地使用水、甲醇、乙酉享、丙醇、異丙醇(ιρΑ)、 二甲基酮等之極性溶媒。塗佈液之塗佈係適合藉由旋轉塗 佈法、噴墨法等而進行。 接著，在第1源極/汲極電極6GA之表面上形成第i 電荷注入層胤，同時，在第2源崎極電極6GB之表面 電荷注入層50B。這些之第ι電荷注入層· 何注入層50B係包含具有電荷注人特性 聚合物。該步驟正如說明的.，可 子 法而實施。此外，在形成發揮作佈液之塗佈 荷注入層5。之狀態下’作為其材料係擇::::能:電 離子性聚合物，在形成發揮作為 料電型為η型之 注入層5G之狀態下，作為其材料係選能之電荷 子性聚合物而調製塗佈液。 等寬义為Ρ型之灕 藉由將調製之塗佈液，塗佈於形 極60Α及第2源極/汲極電極6〇β 之第1源極/汲極電 材料之任意適當之加熱處理而ϋ面上’進行對應於 接著.，在基板70之上形成右、锜'主入層50。 電荷注入層5G上露出之苐i源極/^^體層的使覆蓋由 極/汲極電極60B和電荷注入層5〇。^ '極6〇A及第2源 用塗佈液之塗佈法來形成之塗佈膜，、驟係可以藉由使 意適當之加熱處理而實施。 進行對應於材料之任 接著，在有機半導體層4〇之# 成間極絕緣層30, 323451 142 201234576 進-步在閘極絕緣層3G之上形成閘極電極2QA。該閘極絕 緣層30之形成步驟係可以藉由cvd法（化學氣相成長法） 等而使用經說明之絕緣性材料，來實施成膜步驟。此外，I layer. On the organic semiconductor layer 40, the gate insulating layer 30 and the gate electrode 20 are laminated in this order. φ The size of each layer and the electrode constituting the organic thin film transistor of the second embodiment is, for example, the same as that of the organic thin film transistor of the first embodiment. If the structure of the organic thin film transistor is made into a top gate type as described above, the Shih-kil substrate is not required. Therefore, since the flexible substrate can be used, it is possible to form a flexible organic thin film transistor as a whole. Further, since it can be used as an inexpensive substrate, the manufacturing cost can be reduced. (Manufacturing method of organic thin film transistor): A method for producing an organic thin film transistor of the second embodiment having the structure shown in Fig. 2 will be described. In the state in which the manufacturing steps described in the first embodiment 140 323451 201234576 are the same, the detailed description thereof will be omitted. In the manufacturing method of the organic thin film transistor 1 according to the second embodiment, a gate electrode, a first source/drain electrode, a second source/3⁄4 electrode, and a first source/drain electrode are provided. And an organic semiconductor layer between the second source/dot electrode and the gate electrode, between the first source/nopole electrode, the second source/drain electrode, and the organic semiconductor layer; ! A method for producing an organic thin film transistor of a charge injection layer in which a first source/light electrode and a second source/pole electrode are arranged in contact with each other, comprising: an ionic polymerization containing charge injection characteristics The step of forming a charge injection layer of the substance. That is, the method of manufacturing an organic thin film transistor includes: a step of forming a gate electrode; a step of forming a first source/drain electrode; a step of forming a second source/drain electrode; and forming the aforementioned first source a step of a pole/polar electrode and a second source/drain electrode and an organic semiconductor layer disposed between the gate electrodes; and a first source/bromine electrode and a second source/drain electrode A step of forming a charge injection layer disposed in contact with the first source/drain electrode and the second source/drain electrode is formed between the organic semiconductor layers. Further, the order of the respective steps is appropriately set in accordance with the configuration of the organic thin film transistor. In the present embodiment, the steps of forming the jade source/drain electrode and the second source/drain electrode, the step of forming the charge injection layer, the step of forming the organic semiconductor layer, and the step of forming the gate electrode The order is carried out. First, the substrate 70 is prepared, and on the substrate 7A, the first source/drain electrode 60A and the second source/drain electrode 6B are formed. The step is suitable for forming a conductive layer or a conductive electrode by using a conductive metal particle of gold, silver, aluminum or the like and a coating liquid prepared by using any solvent of 141 323451 201234576. The steps of the pattern. In the state in which the metal fine particles are used as the conductive material, a polar solvent such as water, methanol, acetamidine, propanol, isopropanol or dimethyl ketone can be suitably used. The coating of the coating liquid is suitably carried out by a spin coating method, an inkjet method, or the like. Next, an i-th charge injection layer 形成 is formed on the surface of the first source/drain electrode 6GA, and a charge injection layer 50B is formed on the surface of the second source rugged electrode 6GB. These first charge injection layers, and the injection layer 50B, contain a polymer having a charge injection property. This step is implemented as described in the sub-method. Further, the coating injection layer 5 which functions as a cloth liquid is formed. In the state of the material, it is selected as the material:::: can be an electro-ionic polymer, and in the state of forming the injection layer 5G which is the n-type of the material type, the charge-polymerization as the material system is selected. The coating liquid was prepared. Any suitable heating of the first source/drain electric material coated on the shape electrode 60Α and the second source/drain electrode 6〇β by applying the prepared coating liquid to the Ρ type The processing is performed on the surface of the substrate to form a right, 锜' main entrance layer 50 on the substrate 70. The source/electrode layer exposed on the charge injection layer 5G covers the gate/drain electrode 60B and the charge injection layer 5'. ^ The coating film formed by the coating method of the coating agent of the electrode and the second source can be carried out by appropriately heat-treating. Depending on the material, the gate electrode 2QA is formed on the gate insulating layer 3G in the organic semiconductor layer 4, the inter-electrode insulating layer 30, 323451 142 201234576. The step of forming the gate insulating layer 30 can be carried out by using a prescribed insulating material by a cvd method (chemical vapor phase growth method) or the like. In addition,

閘極電極2GA之形成㈣係相㈣帛丨賴/絲電極6〇A 及第2源極級極電極_之形成步驟，可成為使用藉由 金、銀、料之具有導電性之金屬錄和任意適當之溶媒 而調製之k佈液形成導電性層之步驟。藉由塗佈法之閘極 電極2 0 A之形成係藉由將塗佈液塗佈於閘極絕緣層3 〇而 進行。可以藉由將形成之塗膜進行加熱處理而形成閘極電 極 20A。 如精田丰發明之有機薄臈電晶體1〇之製造方法，則 ^ 用即使是在常壓程度之環境、甚至大氣環境下也不容易 J：化之離子性聚合物，來作為電荷注人層之材料，因此， 二—在度切境、甚至大氣環境下，分別實施形成 層50之步驟、形成閘極電極胤之步驟以及形 驟之久η及極電極6qa和第2源極/汲極電極娜之步 开為包含將輯液予以塗狀”者。此外， 下而將塗佈液予以塗佈之步步驟:者可，成⑽^ ⑺二：第各;實，態之有機薄膜電： 機薄P電晶體或者是p型有機薄而構成為g 合η型右卜德^明之有機薄膜電晶體10係也可以藉由組 缚膜電晶體和Ρ型有機薄膜電晶體，而構成互 143 323451 201234576 補型有機薄膜電晶體。 在第1實施形態之構造例中構成互補型有機薄膜電晶 體之狀態下’可以藉由選擇構成有機半導體層和電荷注入 層之材料之導電型，將n型有機薄膜電晶體和P型有機薄 膜電晶體選擇性地製作人單—之基板2G，而構成互補型有 機薄膜電晶體。 在第2實施形態之構造例中構成互補型有機薄膜電晶 體之狀態下’可以藉由選擇構成有機半導體層和電荷注入 層之材料之導電型，將n型有機薄膜電晶體和p型有機薄 膜電晶體製作人單-之基板7G，而構成互補型有機薄膜電 晶體。 。如構成互補型有機薄膜電晶體，則可以構成各種之邏 輯電路。藉由互補型有機薄膜電晶體而構成之邏輯電路係 可以適合使用於例如RF(Radi〇 Frequency :射頻）標籤等之 電子標籤。 • 纟發明之有機薄膜電晶體係能夠成為構成例如可以 在基材上製作入複數個之有機薄膜電晶體，組合這些複數 個之有機薄膜電晶體等擔負規定之電氣機能之電路之有機 薄膜電晶體。 、曰如構成作為有機薄膜電晶體基板，則可以適合使用為 液阳顯不裝置、有機電激發光顯示裝置等之顯示裝置用驅 動基板。 在以下，根據貫驗例等而更加具體地說明本發明。本 發明並非限定於以下之實驗例等。 144 323451 201234576 聚合物之重量平均分子量(Mw)及數量平均分子量（Mn) 係使用凝膠滲透層析法(GPC)(TOSOH股份有限公司製： HLC-8220GPC)，求出作為聚苯乙烯換算之重量平均分子 量及數量平均分子量。此外，測定之試料係溶解於四氣咬 0南而成為大約0.5重量％之濃度，注入5〇以乙至GPC。此 外，作為GPC之移動相係使用四氫呋喃，以〇 5mL/分鐘 之流速流動。聚合物之構造分析係藉由使用Varian公司製 之300MHzNMR分光儀進行iH-NMR解析。此外，測定係 •試料溶解於可溶解之氘溶媒（藉由氘原子(deuterium)而取 代洛媒分子中之氫原子之溶媒）而使濃度成為2〇mg/mL來 進行。聚合物之最高占有分子執道(H0M0)之執道能係藉 由測定聚合物之電離勢，以得到之電離勢，作為該軌道能 而求出。另一方面’聚合物之最低非占有分子轨道(LUM(^ 之軌道能係藉由求出HOMO和LUMO之能量差，以其值 和在前面敘述來測定之電離勢之和，作為該執道能而求 # 出。在電離勢之測定中係使用光電子分光裝置(理研計器股 份有限公司製：AC-2)。此外，HOMO和LUMO之能量差 係使用紫外線•可見光·近紅外線分光光度計(Varian公 司製：Cary5E) ’測定聚合物之吸收光譜，藉由其吸收末端 而求出。 [參考例1] 2,7-二溴-9,9-雙[3-乙氧基羰基_4-[2-[2-(2-曱氧基乙 氧基）乙氧基]乙氧基]苯基]-苐（化合物A)之合成 在300mL之燒瓶中加入2,7_二溴-9-苐酮（52.5g)、水揚 145 323451 201234576 酉欠乙S曰（154’8g)和疏基乙酸（丨4g)，將燒瓶内之環境進行氣 ，代(在以下’將「燒瓶内之環境以氮取代」，僅記載為「以 氮取代」。）。於此，添加甲烷磺酸(630mL)，在75。(：整夜 地授拌混合物。放冷混合物，添加於冰水而授拌i小時。 過渡移開產生之固體，藉由加熱之乙腈進行洗淨。使完成 洗淨之該固體溶解於丙酮中，由得到之丙酮溶液使固體進 行再結晶及過濾移開。將得到之固體(62 7g)、2_[2_(2_曱氣 基乙氧基）乙氧基]-P-曱苯磺酸酯（86 3g)、碳酸鉀(62 6幻和 _ 18-冠醚-6(7.2g)，溶解於 N，N-二甲基曱醯胺(DMF)(670mL)， 將溶液移送至燒瓶中並在105。〇整夜地進行攪拌。將得到 之混合物，放冷至室溫為止，加入冰水至燒瓶内，授拌】 小時。藉由在反應液中加入三氣曱烷(3〇〇mL)進行分液萃 取，濃縮溶液而得到2,7-二溴-9,9-雙[3-乙氧基羰基-4<2-[2-(2-曱氧基乙氧基）乙氧基]乙氧基]苯基]_苐（化合物a) (51.2g)。The formation of the gate electrode 2GA (four) phase (four) / / wire electrode 6 〇 A and the second source electrode _ formation step, can be used to use metal, silver, material conductive metal The step of forming a conductive layer by preparing a k cloth liquid of any suitable solvent. The formation of the gate electrode 20 A by the coating method is carried out by applying a coating liquid to the gate insulating layer 3 〇. The gate electrode 20A can be formed by heat-treating the formed coating film. For example, the manufacturing method of the organic thin tantalum transistor 1 invented by Jing Tianfeng is not easy to use as an electric charge even in an environment of atmospheric pressure or even in an atmospheric environment. The material of the layer, therefore, the steps of forming the layer 50, the steps of forming the gate electrode 以及 and the θ of the shape and the electrode 2qa and the second source/汲 are respectively performed in the degree of cutting or even the atmosphere. The electrode of the electrode is opened to include the coating liquid. In addition, the step of coating the coating liquid is as follows: (10)^(7) 2: the first; the actual organic film Electric: thin P crystal or p-type organic thin and composed of g-n-type right Bude ^ Ming organic thin film transistor 10 can also be formed by bonding film transistor and Ρ type organic thin film transistor 143 323451 201234576 Complementary organic thin film transistor. In the state of the complementary organic thin film transistor in the structure example of the first embodiment, the conductivity type of the material constituting the organic semiconductor layer and the charge injection layer can be selected. N-type organic thin film transistor and P The organic thin film transistor selectively forms the substrate 2G of the human body to form a complementary organic thin film transistor. In the state of the complementary organic thin film transistor in the structural example of the second embodiment, it is possible to form an organic The conductive type of the material of the semiconductor layer and the charge injection layer, the n-type organic thin film transistor and the p-type organic thin film transistor are used to form a single-substrate 7G to form a complementary organic thin film transistor. The transistor can constitute various logic circuits. The logic circuit formed by the complementary organic thin film transistor can be suitably used for an electronic tag such as an RF (Radio Frequency) tag. The electromorphic system can be, for example, an organic thin film transistor in which a plurality of organic thin film transistors can be formed on a substrate, and a plurality of organic thin film transistors and the like having a predetermined electrical function can be combined. The organic thin film transistor substrate can be suitably used as a liquid positive display device or an organic electric excitation light. The present invention is more specifically described below based on a test example, etc. The present invention is not limited to the following experimental examples and the like. 144 323451 201234576 The weight average molecular weight (Mw) of the polymer and The number average molecular weight (Mn) was determined by gel permeation chromatography (GPC) (manufactured by TOSOH Co., Ltd.: HLC-8220GPC), and the weight average molecular weight and the number average molecular weight in terms of polystyrene were determined. It was dissolved in a concentration of about 0.5% by weight in the south, and injected into the mixture to 5 G to GPC. In addition, tetrachlorofuran was used as the mobile phase of GPC to flow at a flow rate of 5 mL/min. The iH-NMR analysis was carried out by using a 300 MHz NMR spectrometer manufactured by Varian. Further, the measurement system was prepared by dissolving the sample in a soluble hydrazine solvent (a solvent for replacing a hydrogen atom in a monomer molecule by a deuterium) to a concentration of 2 〇 mg/mL. The highest molecular occupant of the polymer (H0M0) can be determined by measuring the ionization potential of the polymer to obtain the ionization potential as the orbital energy. On the other hand, 'the lowest non-occupied molecular orbital of the polymer (LUM (^ orbital energy) is obtained by determining the energy difference between HOMO and LUMO, and the sum of the ionization potentials measured by the above description. In the measurement of the ionization potential, a photoelectron spectroscopic device (manufactured by Riken Keiki Co., Ltd.: AC-2) is used. In addition, the energy difference between HOMO and LUMO uses an ultraviolet/visible/near-infrared spectrophotometer ( Varian company: Cary5E) 'The absorption spectrum of the polymer was determined by the absorption end. [Reference Example 1] 2,7-Dibromo-9,9-bis[3-ethoxycarbonyl_4- Synthesis of [2-[2-(2-decyloxyethoxy)ethoxy]ethoxy]phenyl]-indole (Compound A) In a 300 mL flask was added 2,7-dibromo-9- Anthrone (52.5g), shui 145 323451 201234576 乙 乙 曰 曰 154 (154'8g) and thioglycolic acid (丨 4g), the environment inside the flask is gas, generation (in the following 'the environment inside the flask "Substituting with nitrogen" is only described as "substituted with nitrogen." Here, methanesulfonic acid (630 mL) is added at 75. (: The mixture is stirred overnight. The mixture is allowed to cool, Adding to ice water and mixing for 1 hour. The solid produced by the transition is removed by washing with heated acetonitrile. The solid which has been washed is dissolved in acetone, and the solid is recrystallized and filtered from the obtained acetone solution. Remove. Solid (62 7g), 2_[2_(2_曱-ethoxyethoxy)ethoxy]-P-nonylbenzenesulfonate (86 3g), potassium carbonate (62 6 illusion and _) 18-crown-6 (7.2 g), dissolved in N,N-dimethyldecylamine (DMF) (670 mL), transferred to a flask and stirred at 105. The mixture was stirred overnight. The mixture was allowed to cool to room temperature, and ice water was added to the flask, and the mixture was stirred for an hour. The liquid was extracted by adding trioxane (3 〇〇 mL) to the reaction solution, and the solution was concentrated to obtain 2,7. -dibromo-9,9-bis[3-ethoxycarbonyl-4<2-[2-(2-decyloxyethoxy)ethoxy]ethoxy]phenyl]-indole (compound a ) (51.2g).

[參考例2] 2,7-雙(4,4,5,5-四曱基-1，3,2-二氧雜硼雜環戊烷-2-基)_ 9,9,雙[3-乙氧基羰基-4-[2-[2-(2-甲氧基乙氧基）乙氧基;|乙 氧基]苯基]-蕗（化合物B)之合成 在氮環境下，混合化合物A(15g)、雙(頻那醇合）二硼 146 323451 201234576 (8.9g)、[1，1 雙(二苯基膦基)二茂鐵]二氯把（]j)二氣甲燒 錯合物（0.8g)、1，Γ-雙（二苯基膦基）二茂鐵(〇.5g)、乙酸鉀 (9.4g)和二噁烷(400mL) ’加熱至11〇。〇，進行1〇小時之加 熱回流。在放冷後，過濾反應液’減壓濃縮過濾液。藉由 曱醇洗淨反應混合物3次。使沉殿物溶解於曱笨，再於溶 液中加入活性碳而進行攪拌。然後，藉由過濾，將過濾液 減壓濃縮，得到2,7-雙(4,4,5,5-四甲基-i，3,2-二氧雜硼雜環 戊烷-2-基)-9,9-雙[3-乙氧基羰基-4-[2-[2-(2-甲氧基乙氧基） • 乙氧基]乙氧基]苯基]-苐（化合物B)(11.7g)。[Reference Example 2] 2,7-bis(4,4,5,5-tetradecyl-1,3,2-dioxaborolan-2-yl)-9,9,bis[3 Synthesis of ethoxycarbonyl-4-[2-[2-(2-methoxyethoxy)ethoxy;|ethoxy]phenyl]-oxime (Compound B) under nitrogen atmosphere Compound A (15g), bis(pinacol) diboron 146 323451 201234576 (8.9g), [1,1 bis(diphenylphosphino)ferrocene]dichloride ()j) The complex (0.8 g), 1, bis-bis(diphenylphosphino)ferrocene (〇.5 g), potassium acetate (9.4 g) and dioxane (400 mL) were heated to 11 Torr. Hey, carry out 1 hour of heating and reflux. After allowing to cool, the reaction mixture was filtered and the filtrate was concentrated under reduced pressure. The reaction mixture was washed 3 times with decyl alcohol. The dissolved matter is dissolved in the sputum, and then activated carbon is added to the solution to stir. Then, the filtrate was concentrated under reduced pressure by filtration to give 2,7-bis(4,4,5,5-tetramethyl-i,3,2-dioxaborolan-2-yl -9,9-bis[3-ethoxycarbonyl-4-[2-[2-(2-methoxyethoxy)•ethoxy]ethoxy]phenyl]-indole (Compound B) ) (11.7g).

[參考例3] 聚[9,9-雙[3-乙氧基羰基-4-[2-[2-(2-曱氧基乙氧基）乙 氧基]乙氧基]苯基苐](聚合物A)之合成 在惰性環境下’混合化合物A(0.55g)、化合物B(0.61$)、 二笨基膦纪(o.oig)、曱基三辛基錢氣化物(Aldricll公司製、 商品名稱：Aliquat336(註冊商標))(〇,2〇g)和曱苯(10mL)， 加熱至l〇5°C。在該反應液中滴下2M碳酸鈉水溶液(6mL) 使回流8小時。在反應液中加入4-tert-丁基苯基硼酸(〇.01g) 使回流6小時。接著，加入二乙基二硫代胺基曱酸鈉水溶 液（10mL、濃度：〇.〇5g/mL)，攪拌2小時。在將混合溶液 323451 147 201234576 滴下至甲醇3QGmL之中而_ 1小時之後，過㈣出之沉 殿使減壓乾燥2小時’溶解於四氫咬喃驗。在將得到 之溶液滴至甲醇120虹和3重量％乙酸水溶液5〇虹之混 σ /奋媒中而擾拌1小時之後，過濾、析出之沉殿使溶解於四 氫吱口南20mL。在像這樣得到之溶液滴至甲醇·乱而搜 拌30刀知之後，過濾析出之沉澱而得到固體。藉由得到之 产固體溶解於四氫°夫喃，並通過氧化銘管柱、二氧化石夕凝膠 貧柱而進行精製。在浪縮由管柱所回收之四氫咬喃溶液之 後，滴至甲醇(200mL)中，過濾所析出之固體後使之乾燥。 得到之聚[9,9-雙[3-乙氧基羰基雙[2_[2_(2_甲氧基乙氧 基）乙氧基]乙氧基]苯基]-苐K聚合物A)之產率係52〇mg。 聚合物A之聚苯乙烯換算之數量平均分子量係5 2χ 1〇4。聚合物Α係由化學式(Α)所表示之構造單位而組成。[Reference Example 3] Poly[9,9-bis[3-ethoxycarbonyl-4-[2-[2-(2-decyloxyethoxy)ethoxy]ethoxy]phenylhydrazine] (Polymer A) Synthesis in an inert environment 'mixed compound A (0.55g), compound B (0.61$), diphenylphosphonium (o.oig), decyltrioctyl valence (made by Aldricll) , trade name: Aliquat 336 (registered trademark) (〇, 2〇g) and toluene (10mL), heated to l〇5 °C. A 2 M aqueous sodium carbonate solution (6 mL) was added dropwise to the reaction mixture to reflux for 8 hours. 4-tert-butylphenylboronic acid (〇.01g) was added to the reaction solution to reflux for 6 hours. Next, an aqueous solution of sodium diethyldithiocarbamate citrate (10 mL, concentration: 〇.〇5 g/mL) was added, and the mixture was stirred for 2 hours. After the mixed solution 323451 147 201234576 was dropped into methanol 3QGmL for _1 hour, the chamber was dried (4) and dried under reduced pressure for 2 hours to dissolve in the tetrahydrogen test. After the obtained solution was dropped into a mixed solution of methanol 120 Torr and a 3% by weight aqueous acetic acid solution for 5 hours, the mixture was filtered and precipitated to dissolve it in 20 mL of tetrahydrofuran. After the solution thus obtained was dropped into methanol, and the mixture was found to be 30, the deposited precipitate was filtered to obtain a solid. The obtained solid is dissolved in tetrahydrofuran, and purified by oxidizing the column and the silica gel gel column. After the tetrahydrogenate solution recovered from the column was dropped, it was dropped into methanol (200 mL), and the precipitated solid was filtered and dried. Poly[9,9-bis[3-ethoxycarbonylbis[2_[2-(2-methoxyethoxy)ethoxy]ethoxy]phenyl]-indole K polymer A) The yield was 52 〇 mg. The polystyrene-equivalent number average molecular weight of the polymer A is 5 2 χ 1〇4. The polymer lanthanide is composed of structural units represented by the chemical formula (Α).

聚合物A之絶鹽之合成 將聚合物A(200mg)放入至l〇〇mL燒瓶中，進行氮取 代。添加四氫呋喃（2〇mL)和乙醇（20mL)，混合物升溫至55 C °在此’添加氫氧化鉋(200mg)溶解於水(2mL)之水溶液， 在55°C下攪拌6小時。混合物冷卻至室溫後，減壓餾除反 應溶媒。藉由以水來洗淨產生之固體，進行減壓乾燥，而 148 323451 201234576 得到淡黃色固體（150mg)。藉由NMR光譜而確認來自於聚 合物A内之乙基S旨部位之乙基之訊號完全地消失。將得到 之聚合物A之絶鹽稱為共輛高分子化合物.1。共輕高分子 化合物1係由化學式(B)所表示之構造單位而成（「包含全 構造單位中之由化學式⑴所表示之基和化學式（2)所表示 之基而組成之群組中選出之1種以上之基以及化學式(3) 所表示之1種以上之基之構造單位之比例」以及「全構造 單位中之化學式（13)、化學式（15)、化學式（17)和化學式(2〇) 鲁所表示之構造單位之比例」係100莫耳％。）。共軛高分子 化合物1之HOMO之軌道能係-5.5eV，LUMO之執道能係 -2.7eV。Synthesis of a salt of the polymer A Polymer A (200 mg) was placed in a 10 mL flask and subjected to nitrogen substitution. Tetrahydrofuran (2 〇 mL) and ethanol (20 mL) were added, and the mixture was heated to 55 ° C. An aqueous solution of water (2 mL) dissolved in water (2 mL) was added and stirred at 55 ° C for 6 hours. After the mixture was cooled to room temperature, the reaction solvent was evaporated under reduced pressure. The resulting solid was washed with water and dried under reduced pressure, and 148 323451 201234576 gave a pale yellow solid (150 mg). The signal of the ethyl group derived from the ethyl S in the polymer A was completely disappeared by NMR spectroscopy. The obtained salt of the polymer A is referred to as a total of a polymer compound. The light-weight polymer compound 1 is selected from the group consisting of the structural unit represented by the chemical formula (B) ("including the group represented by the chemical formula (1) and the group represented by the chemical formula (2) in the entire structural unit). "The ratio of one or more kinds of bases to the structural unit of one or more types represented by the chemical formula (3)" and "the chemical formula (13), the chemical formula (15), the chemical formula (17), and the chemical formula (2 in the entire structural unit) 〇) The ratio of the structural units represented by Lu is 100% of the unit.). The conjugated polymer compound 1 has a HOMO orbital energy system of -5.5 eV, and LUMO has an orbital energy of -2.7 eV.

鲁[實驗例2] 聚合物A之鉀鹽之合成 聚合物A(200mg)放入至100mL燒瓶中進行氮取代。 •混合四氫吱喃（20mL)和甲醇（1 OmL)，在混合溶液中添加氫 氧化鉀（400mg)溶解於水(2mL)之水溶液，在65°C攪拌1小 時。在反應溶液中加入甲醇50mL，並且，在65°C攪拌4 小時。在混合物冷卻至室溫後，減壓餾除反應溶媒。藉由 以水來洗淨產生之固體，進行減壓乾燥，而得到淡黃色固 體（131mg)。藉由NMR光譜而確認來自於聚合物Α内之乙 149 323451 201234576Lu [Experimental Example 2] Synthesis of Potassium Salt of Polymer A Polymer A (200 mg) was placed in a 100 mL flask for nitrogen substitution. • Tetrahydrofuran (20 mL) and methanol (10 mL) were mixed, and a solution of potassium hydroxide (400 mg) dissolved in water (2 mL) was added to the mixture, and the mixture was stirred at 65 ° C for 1 hour. 50 mL of methanol was added to the reaction solution, and the mixture was stirred at 65 ° C for 4 hours. After the mixture was cooled to room temperature, the reaction solvent was distilled off under reduced pressure. The resulting solid was washed with water and dried under reduced pressure to give a pale yellow solid (131 mg). Confirmation of B from the polymer crucible by NMR spectroscopy 149 323451 201234576

基酯部位之乙基之訊號完全地消失。將得到之聚合物A 鉀鹽稱為共軛高分子化合物2。共輛高分子化合物2係由 化學式（C)所表示之構造單位而成（「包含全構造單位中之 由化學式（1)戶斤表示之基和化學式（2)所表示之基而 '纟且成之 群組中選出之1種以上之基以及化學式（3)所表示之1紅 1種u 上之基之構造單位之比例」以及「全構造單位中之化學' (13)、化學式（15)、化學式（17)和化學式(20)所表示之構^ 單位之比例j係1〇〇莫耳％。）。共軛高分子化合物2 < • HOMO之執道能係-5.5eV，LUMO之軌道能係-2.7eV。The signal of the ethyl group at the base of the ester disappears completely. The obtained polymer A potassium salt is referred to as a conjugated polymer compound 2. The total polymer compound 2 is formed by the structural unit represented by the chemical formula (C) ("including the base represented by the chemical formula (1) and the base represented by the chemical formula (2) in the entire structural unit" The ratio of one or more selected bases in the group and the structural unit of the one on the red one of the chemical formula (3) and the chemical in the whole structural unit (13), chemical formula (15) ), the ratio of the unit represented by the chemical formula (17) and the chemical formula (20) is 1% 〇〇mol %.). Conjugated polymer compound 2 < • HOMO's ego system -5.5eV, LUMO The orbital energy system is -2.7eV.

[實驗例3] 聚合物A之納鹽之合成[Experimental Example 3] Synthesis of Nano Salt of Polymer A

聚合物A(2〇Omg)放入至100mL燒瓶中，進行氮取 混合四氫σ夫喃（20mL)和甲醇（1 OmL)，在混合溶液中添力卜 氧化鈉（260mg)溶解於水(2mL)之水溶液，在65¾授摔j 1 時。在反應溶液，加入甲醇30mL，並且，在65°C擾掉4 小時。在混合物冷卻至室溫後，減壓館除反應溶媒。藉由 以水來洗淨，產生之固體，進行減壓乾燥，而得到淡黃色固 體（l23mg)。藉由NMR光譜而確認來自於聚合物a内之乙 基酯部位之乙基之訊號完全地消失。將得到之聚合物A之 鈉鹽稱為共軛高分子化合物3。共軛高分子化合物3係由 323451 150 201234576 ^ 化學式(D)所表示之構造單位而成（「包含全構造摩供 由化學式（1)所表示之基和化學式（2)所表示之基而，，具 ^ 群組中選出之1種以上之基以及化學式（3)所表示I 上之基之構造單位之比例」以及「全構造單位中之化學> (13)、化學式（15)、化學式（17)和化學式(20)所表示之俯 單位之比例」係100莫耳％。）。共耗高分子化合物3之 HOMO之軌道能係-5.6eV，LUMO之軌道能係-2.8eV °Polymer A (2 〇 Omg) was placed in a 100 mL flask, and nitrogen was mixed with tetrahydro sulphur (20 mL) and methanol (1 mL), and sodium bromide (260 mg) was dissolved in water in the mixed solution ( An aqueous solution of 2 mL) was given at 653⁄4. In the reaction solution, 30 mL of methanol was added, and the mixture was disturbed at 65 ° C for 4 hours. After the mixture was cooled to room temperature, the reaction solvent was removed under reduced pressure. The solid which was obtained by washing with water was dried under reduced pressure to give a pale yellow solid (1, 23 mg). The signal of the ethyl group derived from the ethyl ester moiety in the polymer a was completely disappeared by NMR spectroscopy. The obtained sodium salt of the polymer A is referred to as a conjugated polymer compound 3. The conjugated polymer compound 3 is composed of a structural unit represented by the chemical formula (D) of 323451 150 201234576 ^ ("including the structure represented by the chemical formula (1) and the chemical formula (2)). , the ratio of one or more selected groups in the group and the structural unit of the base represented by the chemical formula (3), and the chemical in the whole structural unit (13), chemical formula (15), chemical formula (17) The ratio of the unit of the unit represented by the chemical formula (20) is 100% by mole.). Total orbital polymer compound 3 HOMO orbital energy system -5.6eV, LUMO orbital energy system -2.8eV °

[實驗例4] 聚合物A之錄鹽之合成 聚合物A(200mg)放入至l〇〇mL燒瓶中’進行氮取代。 混合四氳呋喃（20mL)和曱醇（15mL) ’在混合溶液中添加四 φ 曱基銨氫氧化物(50mg)溶解於水（lmL)之水溶液，在65<5(： 攪拌6小時。在反應溶液中加入四曱基銨氫氧化物（5〇mg) 溶解於水（lmL)之水溶液，並立’在65°C攪拌4小時。混 合物冷卻至室溫後，減壓餾除反應溶媒。藉由以水來洗淨 產生之固體，進行減壓乾燥，而得到淡黃色固體（I50mg；)。 藉由NMR光譜而確認來自聚合物A内之乙基酯部位之乙 基之訊號消失90%。將得到之聚合物A之銨鹽稱為共輛高 分子化合物4。共軛高分子化合物4係由化學式(E)所表示 之構造單位而成（「包含全構造單位中之由化學式（1)所表 323451 151 201234576 示之基和化學式（2)所表示之基而組成之群組中選出之1種 以上之基以及化學式（3)所表示之1種以上之基之構造單位 之比例」以及「全構造單位中之化學式（13)、化學式（15)、 化學式（17)和化學式（20)所表示之構造單位之比例」係90 莫耳％。）。共軛高分子化合物4之HOMO之軌道能係 -5.6eV，LUMO 之軌道能係-2.8eV。[Experimental Example 4] Synthesis of the salt of the polymer A Polymer A (200 mg) was placed in a 1 mL flask to carry out nitrogen substitution. Tetrahydrofuran (20 mL) and decyl alcohol (15 mL) were added. To the mixed solution was added tetra-φ-decyl ammonium hydroxide (50 mg) in an aqueous solution of water (1 mL) at 65 < 5 (: stirred for 6 hours. To the reaction solution, tetrakisylammonium hydroxide (5 mg) was added to an aqueous solution of water (1 mL), and the mixture was stirred at 65 ° C for 4 hours. After the mixture was cooled to room temperature, the reaction solvent was distilled off under reduced pressure. The solid produced by washing with water was dried under reduced pressure to give a pale-yellow solid (I50mg;). The signal of the ethyl group from the ethyl ester in the polymer A was confirmed to be 90% by NMR spectrum. The obtained ammonium salt of the polymer A is referred to as a common polymer compound 4. The conjugated polymer compound 4 is formed by the structural unit represented by the chemical formula (E) ("including the chemical formula (1) in the entire structural unit) The ratio of the structural unit of one or more selected from the group represented by the group represented by the chemical formula (2) and the structural unit of one or more types represented by the chemical formula (3) "Chemical formula (13), chemical formula (15), chemicalization in the whole structural unit Ratio of Formula (17), and the formula (20) of the structural unit represented by the "Department of 90 mole%.). HOMO of the conjugated polymer compound 4 of the rail system can -5.6eV, LUMO of -2.8 eV, respectively orbital system.

[參考例4] 2,7-雙[7-(4-甲基苯基)-9,9-二辛基苐-2-基]-9,9-雙[3-乙氧基羰基-4-[2-[2-(2-曱氧基乙氧基）乙氧基]乙氧基]苯 基]-第（聚合物B)之合成 在惰性環境下，混合化合物A(0.52g)、2,7-雙（1，3,2-• 二氧雜硼雜環戊烷_2_基)-9,9-二辛基苐（1.29g)、三苯基膦 le(0.0087g)、甲基三辛基銨氯化物(Ak}ric}l公司製、商品 名稱：Aliqua'336(註冊商標))(〇.2〇g)、曱苯(i〇mL)和2M碳 .酸鈉水溶液（10mL)，加熱至8〇。(：。使反應液進行3.5小時 之反應。然後，在此加入對溴曱苯(〇 68g)，進一步進行2 5 小時之反應。在反應後’將反應液冷卻至室溫，加入乙酸 乙酯50mL/蒸餾水50mL而除去水層。再度加入蒸餾水 50mL而除去水層之後，加入硫酸鎂來作為乾燥劑，過濾 不’合物，再除去有機溶媒。然後，得到之殘渣再度溶解於 323451 152 201234576 10mL之THF，添加飽和二乙基二硫代胺基甲酸納水溶液 2mL，在攪拌30分鐘之後，除去有機溶媒。通過氧化鋁管 柱(展開溶媒己烷：乙酸乙酯=1 : 1、v/v)而進行精製， 在過濾析出之沉澱而減壓•乾燥12小時後，得到524mg 之2,7-雙[7-(4-甲基苯基)_9,9-二辛基第-2-基]_9,9_雙[3-乙 氧基羰基-4-[2-[2-(2-甲氧基乙氧基）乙氧基]乙氧基]苯基;)_ 第（聚合物B)。 聚合物B之聚苯乙烯換算之數量平均分子量係2.0χ 1〇3。此外，聚合物B係藉由化學式(F)所表示。[Reference Example 4] 2,7-bis[7-(4-methylphenyl)-9,9-dioctylfluoren-2-yl]-9,9-bis[3-ethoxycarbonyl-4 Synthesis of [2-[2-(2-decyloxyethoxy)ethoxy]ethoxy]phenyl]- (Polymer B) Under a inert environment, compound A (0.52 g), 2,7-bis(1,3,2-• dioxaborolan-2-yl)-9,9-dioctylfluorene (1.29 g), triphenylphosphine le (0.0087 g), Methyl trioctyl ammonium chloride (Ak}ric}l company, trade name: Aliqua '336 (registered trademark) (〇.2〇g), toluene (i〇mL) and 2M carbon. (10 mL), heated to 8 Torr. (: The reaction solution was allowed to react for 3.5 hours. Then, p-bromopyridinylbenzene (〇68g) was added thereto, and the reaction was further carried out for 25 hours. After the reaction, the reaction solution was cooled to room temperature, and ethyl acetate was added thereto. 50 mL/distilled water 50 mL to remove the aqueous layer. After adding 50 mL of distilled water to remove the aqueous layer, magnesium sulfate was added as a desiccant, the mixture was filtered, and the organic solvent was removed. Then, the residue was dissolved again at 323451 152 201234576 10 mL. To the THF, 2 mL of a saturated aqueous sodium diethyldithiocarbamate solution was added, and after stirring for 30 minutes, the organic solvent was removed. The column was passed through an alumina column (developing solvent hexane: ethyl acetate = 1:1, v/v). Purification was carried out, and the deposited precipitate was filtered and dried under reduced pressure for 12 hours to obtain 524 mg of 2,7-bis[7-(4-methylphenyl)-9,9-dioctyl-2-yl ]_9,9_bis[3-ethoxycarbonyl-4-[2-[2-(2-methoxyethoxy)ethoxy]ethoxy]phenyl;)_ (Polymer B ). The number average molecular weight of the polymer B in terms of polystyrene is 2.0 χ 1 〇 3. Further, the polymer B is represented by the chemical formula (F).

[實驗例5] 聚合物B之絶鹽之合成 聚合物B(262mg)放入至lOOmL燒瓶中，進行氮取代。 φ 在此，添加四氫D夫喃（10mL)和曱醇（15mL)，混合物升溫至 55°C。在此，添加氫氧化絶(341mg)溶解於水（imL)之水溶 液，在55°C攪拌5小時。在得到之混合物冷卻至室溫為止 之後，減壓餾除反應溶媒。藉由以水來洗淨產生之固體， 進行減壓乾燥，而得到淡黃色固體(250mg)。藉由NMR光 譜而確認來自於乙基酯部位之乙基之訊號完全地消失。將 仔到之聚合物B之飽鹽稱為共輕.向分子化合物.$。共輕高· 分子化合物5係藉由化學式(G)所表示（「包含全構造單位 中之由化學式（1)所表示之基和化學式（2)所表示之基而組 153 323451 201234576 成之群組中選出之1種以上之基以及化學式（3)所表示之j 種以上之基之構造單位之比例」以及「全構造單位中之化 學式（13)、化學式（15)、化學式（17)和化學式（20)所表示之 構造單位之比例」係以小數點第2位，來進行四捨五入而 成為33.3莫耳％。）。共軛高分子化合物5之HOMO之軌 道能係-5.6eV，LUMO之執道能係-2.6eV。[Experimental Example 5] Synthesis of a salt of a polymer B Polymer B (262 mg) was placed in a 100 mL flask to carry out nitrogen substitution. φ Here, tetrahydro D-propan (10 mL) and methanol (15 mL) were added, and the mixture was warmed to 55 °C. Here, a water-soluble solution (341 mg) dissolved in water (imL) was added, and the mixture was stirred at 55 ° C for 5 hours. After the obtained mixture was cooled to room temperature, the reaction solvent was distilled off under reduced pressure. The resulting solid was washed with water and dried under reduced pressure to give a pale yellow solid (250 mg). The signal of the ethyl group derived from the ethyl ester moiety was completely disappeared by NMR spectroscopy. The saturated salt of the polymer B is referred to as a total light. The high molecular weight compound 5 is represented by the chemical formula (G) ("including the base represented by the chemical formula (1) and the base represented by the chemical formula (2) in the entire structural unit and the group 153 323451 201234576 "The ratio of one or more selected groups in the group and the structural units of the j or more groups represented by the chemical formula (3)" and "the chemical formula (13), the chemical formula (15), the chemical formula (17) in the entire structural unit, and The ratio of the structural unit represented by the chemical formula (20) is rounded to the nearest third decimal place to be 33.3 mol%. The HOMO orbital energy system of the conjugated polymer compound 5 is -5.6 eV, and the LUMO is capable of -2.6 eV.

[參考例5] 聚合物C之合成 在惰性環境下，混合化合物A(0.40g)、化合物B(〇.49g)、 N，N’-雙(4-溴苯基)-N，N’-雙(4-tert-丁基二甲基苯基） 1，4-伸苯二胺(35mg)、三苯基膦把(8mg)、曱基三辛基錢氣 化物(Aldrich公司製、商品名稱：Aliquat336(註冊商標)） φ (0.2〇g)和甲苯（l〇mL) ’加熱至l〇5°C。在該反廉液中滴下 2M碳酸鈉水溶液(6mL)，使回流8小時。在反應液中加入 苯基硼酸(O.Olg)，使回流6小時。接著，加入二乙基一碎 代胺基甲酸鈉水溶液(10mL、.濃度：〇.〇5g/mL)，授摔2巧 時。在將混合溶液滴下至曱醇300mL之中而攪拌i小時之 後，過濾析出之沉澱而減壓乾燥2小時，使溶解於四氣呋 喃20mL。在將得到之溶液滴下至甲醇12〇mL* 3重量％ 乙酸水溶液50mL之混合溶媒中後攪拌丨小時之後，過濾 析出之沉澱並使溶解於四氫呋喃2〇mL。在像這樣得到之、‘' 323451 154 201234576 溶液滴至曱醇20〇mL中而攪拌3〇分鐘之後，過濾析出之 沉澱而得到固體。藉由得到之固體溶解於四氫呋喃，通過 氧化紹管柱、二氧化石夕凝膠管柱而進行精製。在濃縮由= 枉所回收之四氫呋喃溶液之後，滴下至甲醇（2〇〇mL)中，5 過濾析出之固體並使之乾燥。得到之聚合物c之產率係 526mg ° • 此外，N，N，-雙(4-演苯基)-N，N，-雙(4-tert-丁基-2,6-二 曱基苯基）1，4-伸苯二胺係可以藉由例如記載於曰本特開 2008-74917號公報之方法而進行合成。[Reference Example 5] Synthesis of Polymer C In a inert environment, Compound A (0.40 g), Compound B (〇.49 g), N,N'-bis(4-bromophenyl)-N,N'- Bis(4-tert-butyldimethylphenyl) 1,4-phenylenediamine (35 mg), triphenylphosphine (8 mg), decyltrioctyl ketone (manufactured by Aldrich Co., Ltd., trade name :Aliquat336 (registered trademark)) φ (0.2〇g) and toluene (l〇mL) 'heated to l〇5°C. A 2 M aqueous sodium carbonate solution (6 mL) was added dropwise to the solution, and refluxed for 8 hours. Phenylboronic acid (O.Olg) was added to the reaction mixture, and the mixture was refluxed for 6 hours. Next, an aqueous solution of sodium diethylaminoacetate (10 mL, concentration: 〇.〇5 g/mL) was added to give a drop. After the mixed solution was dropped into 300 mL of methanol and stirred for 1 hour, the precipitate was filtered, dried under reduced pressure for 2 hours, and dissolved in 20 mL of tetrahydrofuran. The obtained solution was added dropwise to a mixed solvent of 10 mL of methanol 12 mL of a 3 wt% aqueous acetic acid solution, and the mixture was stirred for a few hours, and then the precipitate was filtered and dissolved in 2 mL of tetrahydrofuran. After the solution of ‘' 323451 154 201234576 obtained in this manner was dropped into 20 mL of sterol and stirred for 3 minutes, the precipitate was filtered to obtain a solid. The obtained solid was dissolved in tetrahydrofuran, and purified by oxidizing the column and the silica gel column. After concentrating the tetrahydrofuran solution recovered from hydrazine, it was dropped into methanol (2 mL), and the precipitated solid was filtered and dried. The yield of the obtained polymer c is 526 mg ° • In addition, N,N,-bis(4-phenylene)-N,N,-bis(4-tert-butyl-2,6-dimercaptobenzene The 1,4-phenylenediamine-based compound can be synthesized by, for example, the method described in JP-A-2008-74917.

聚合物C之聚苯乙烯換算之數量平均分子量係3知 1〇4。聚合物C係由化學式（H)所表示之構造單位而成。 聚合物C之鉋鹽之合成 聚合物C(200mg)放入至lOOmL燒瓶中，進行氮取代。 添加四氫呋喃（20mL)和曱醇(20mL)而進行混合。在混合溶 液中添加氫氧化鉋(200mg)溶解於水(2mL)之水溶液，在65 C攪拌1小時。在反應溶液中加入曱醇3〇!nL，並且，在 65 C搜拌4小時。混合物冷卻至室溫之後，減麼餘除反應 溶媒。藉由以水來洗淨.產生之固體，進行減壓乾燥，而得 到淡黃色固體（150mg)。藉由NMR光譜而確認來自於聚合 155 323451 201234576 物c内之乙基酉旨部位之乙基之訊號完全地消失。將得到之 聚合物c之絶鹽稱為共輕高分子化合物6。共概高分子化 合物6係由化學式(I)所表示之構造單位而組成(「包含 造早位中之由化學式⑴所表示之基和化學式⑺所表示之 基而組成之群組甲選出<;1種以上之基以及化學式⑶所表 示之1種以上之基之構造單位之比例」以及「全構造單位 中之化學式(。:3)、化學式⑽、化學式⑽和化學式⑽所 表示之構造單位之比例」係95莫耳％。）^共軛高分子化 馨合物6之HOMO之執這能係J SeV，LUM〇之軌道能係 -2.6eV。The number average molecular weight of the polymer C in terms of polystyrene is 3 〇1. The polymer C is a structural unit represented by the chemical formula (H). Synthesis of Planer Salt of Polymer C Polymer C (200 mg) was placed in a 100 mL flask for nitrogen substitution. Tetrahydrofuran (20 mL) and methanol (20 mL) were added and mixed. To the mixed solution, an aqueous solution of water (200 mg) dissolved in water (2 mL) was added, and the mixture was stirred at 65 C for 1 hour. Sterol 3 〇!nL was added to the reaction solution, and it was mixed at 65 C for 4 hours. After the mixture was cooled to room temperature, the reaction solvent was removed. The solid which was produced was washed with water and dried under reduced pressure to give a pale yellow solid (150 mg). It was confirmed by NMR spectroscopy that the signal of the ethyl group derived from the ethyl oxime in the polymerization 155 323451 201234576 substance c completely disappeared. The obtained salt of the polymer c is referred to as a co-light polymer compound 6. The general polymer compound 6 is composed of a structural unit represented by the chemical formula (I) ("including a group represented by the chemical formula (1) in the early position and a group represented by the chemical formula (7)" is selected as < The ratio of the structural unit of one or more types and the base of one or more types represented by the chemical formula (3) and the structural unit represented by the chemical formula (.: 3), the chemical formula (10), the chemical formula (10), and the chemical formula (10) in the entire structural unit. The ratio is 95% by mole.) ^ The conjugated macromolecular conjugate 6 of HOMO can be J SeV, LUM 〇 orbital energy system - 2.6 eV.

聚合物D之合成Synthesis of polymer D

在惰性環境下，混合化合物A(0.55g)、化合物B(〇 67g)、 N，N’-雙(4-溴苯基)-N，N’-雙(4-tert-丁基_2,6_二甲基苯基） 1，4-伸苯二胺(〇.〇38g)、3,7-二漠-Ν-(4-η_τ基苯基)吩噁嗪 o._g、三苯基膦飽(〇._、甲基三辛基鞍氯化物(Aldrich 公司製、商品名稱：Aliquat336(註冊商標))(〇2〇g)和甲笨 (10mL)，加熱至1〇5°C。在該反應液中滴下21^碳酸鈉水 溶液(6mL)，使回流2小時。在反應液中加入苯基硼酸 乙基二硫代胺基甲 (0.004g)，使回流6小時。接著，加入二 323451 156 201234576 酸鈉水溶液（10mL、濃度·· 005σ/ τν 人、、、 ·〇5έ/ιηΙ^，攪拌2小時。將混 &溶液滴下至甲醇300mL之中而讲士^ ,. 甲而攪# 1小時之後，過濾析 出之沉殺而減壓乾燥2小時，溶解於四氫。夫喃。將 得到之溶液滴下至f醇12〇灿和3重量％乙酸水溶液氣 之混合溶媒中而擾拌1小時之後，過據析出之沉殿而溶解Mixing compound A (0.55g), compound B (〇67g), N,N'-bis(4-bromophenyl)-N,N'-bis(4-tert-butyl-2, under an inert environment 6-dimethylphenyl) 1,4-phenylenediamine (〇.〇38g), 3,7-di-di-Ν-(4-η_τ-phenylphenyl) phenoxazine o._g, triphenyl Phosphonium (〇._, methyltrioctyl saddle chloride (manufactured by Aldrich, trade name: Aliquat 336 (registered trademark)) (〇2〇g) and methyl stupid (10 mL) were heated to 1〇5 °C. A 21% aqueous sodium carbonate solution (6 mL) was added dropwise to the reaction mixture, and the mixture was refluxed for 2 hours. To the reaction mixture was added ethyl phenylboronic acid ethyldithiolamine (0.004 g), and refluxed for 6 hours. 323451 156 201234576 Sodium alginate solution (10mL, concentration ··005σ/ τν人,,, ·〇5έ/ιηΙ^, stir for 2 hours. Drip the & solution to 300mL of methanol and the lecturer ^,. After 1 hour, the precipitate was separated by filtration and dried under reduced pressure for 2 hours, and dissolved in tetrahydrofuran. The obtained solution was dropped into a mixed solvent of 12 alcohol and 3 wt% acetic acid aqueous solution, and the mixture was disturbed. After 1 hour, dissolved according to the sedimentation hall

於四氫咬喃赢。在像這樣得到之溶液滴下至甲醇·mL 而疑30分鐘之後，過渡析出之沉殿而得到固體。藉由得Winning in tetrahydrogen. After the solution thus obtained was dropped to methanol·mL for 30 minutes, the precipitate was gradually precipitated to obtain a solid. By

到之固體溶解於四氫料，通過氧化料柱、二氧化石夕凝 膠管柱而進行精製。在濃缩由管柱回收之四氫吱喃溶液之 後，滴下至甲醇(2〇.〇mL)中，過遽析出之固體而進行乾燥。 得到之聚合物D之產率係59〇mg。 聚合物D之聚苯乙烯換算之數量平均分子量係2 7χ 1〇4。聚合物D係由化學式(J)所表示之構造單位而成。The solid is dissolved in a tetrahydrogen material and purified through an oxidizing column and a silica dioxide gel column. After concentrating the tetrahydrofuran solution recovered from the column, it was dropped into methanol (2 〇.〇mL), and the precipitated solid was dried. The yield of the obtained polymer D was 59 〇 mg. The polystyrene-converted number average molecular weight of the polymer D is 2 7 χ 1〇4. The polymer D is a structural unit represented by the chemical formula (J).

此外’ 3，7-二溴-N-(4-n-丁基苯基)吩噁嗪係根據記載於 曰本特開2007-70620號公報之方法（或者是參考記載於曰 本特開2004-137456號公報之方法）而進行合成。Further, '3,7-dibromo-N-(4-n-butylphenyl)phenoxazine is according to the method described in 曰本特开2007-70620 (or is referred to in 曰本特开2004) Synthesis was carried out in the method of -137456.

(J) [實驗例7] 聚合物D之絶鹽之合成 聚合物D(200mg)放入至lOOmL燒瓶中，進行氮取代。 混合四氫呋喃（15mL)和曱醇（10mL)。在混合溶液中添加氣 323451 157 201234576 氧化鉋（360mg)溶解於水(2mL)之水溶液，在65°C攪拌3小 時。在反應溶液中加入曱醇10mL，並且，在65。(3攪拌4 小時。混合物冷卻至室溫後，減壓餾除反應溶媒。藉由以 水來洗淨產生之固體，進行減壓乾燥，而得到淡黃色固體 (210mg)。藉由NMR光譜確認來自於聚合物D内之乙基酯 部位之乙基之訊號完全地消失。將得到之聚合物D之铯鹽 稱為共輛高分子化合物7。共輛高分子化合物7係由化學 式(K)所表示之構造單位而成（「包含全構造單位中之由化 學式（1)所表示之基和化學式(2)所表示之基而組成之群組 中選出之1種以上之基以及化學式（3)所表示之1種以上之 基之構造單位之比例」以及「全構造單位中之化學式（13)、 化學式（15)、化學式（17)和化學式(20)所表示之構造單位之 比例」係90莫耳％。）。共軛高分子化合物7之HOMO之 執道能係-5_3eV，LUMO之軌道能係-2.4eV。(J) [Experimental Example 7] Synthesis of a salt of the polymer D Polymer D (200 mg) was placed in a 100 mL flask to carry out nitrogen substitution. Tetrahydrofuran (15 mL) and methanol (10 mL) were combined. Gas was added to the mixed solution 323451 157 201234576 The oxidized planer (360 mg) was dissolved in an aqueous solution of water (2 mL), and stirred at 65 ° C for 3 hours. 10 mL of sterol was added to the reaction solution, and at 65. (3) After stirring for 4 hours, the mixture was cooled to room temperature, and the reaction solvent was evaporated under reduced pressure. The obtained solid was washed with water and dried under reduced pressure to give a pale-yellow solid (210 mg). The signal of the ethyl group derived from the ethyl ester moiety in the polymer D completely disappears. The obtained sulfonium salt of the polymer D is referred to as a total of the polymer compound 7. The total polymer compound 7 is derived from the chemical formula (K). One or more groups selected from the group consisting of the structural unit represented by the chemical formula (1) and the group represented by the chemical formula (2) in the entire structural unit, and the chemical formula (3) "The ratio of the structural unit of one or more types indicated" and the ratio of the structural unit represented by the chemical formula (13), the chemical formula (15), the chemical formula (17), and the chemical formula (20) in the entire structural unit. 90% by mole.) The HOMO of the conjugated polymer compound 7 is -5eV, and the orbital energy of LUMO is -2.4eV.

[參考例7] 聚合物E之合成 在惰性環境下，混合化合物A(0.37g)、化合物B(〇.82g；)、 1，3_ —〉臭本(〇.〇9g)、二本基麟麵(〇.〇ig)、甲基三辛基錢氣 化物(Aldrich公司製、商品名稱：Aliquat336(註冊商標）） (0.20g)和曱苯（10mL)，加熱至1〇5。〇。在該反應液中滴丁 158 323451 201234576 2M碳酸鈉水溶液（6mL)，使回流7小時。在反應液中加入 苯基硼酸（0.002g)，使回流1〇小時。接著，加入二乙基二 硫代胺基曱酸鈉水溶液（l〇mL、濃度：0.05g/niL)，擾拌i 小時。將混合溶液滴下至曱醇3〇〇ιη£之中而攪拌j小時之 後，過濾析出之沉澱而減壓乾燥2小時，溶解於四氫呋喃 20mL。將得到之溶液滴下至甲醇12〇mL和3重量％乙酸水 /谷液50mL之混合溶媒中而攪拌丨小時後，過濾析出之沉 澱使溶解於四氫呋喃2 0 m L。在像這樣得到之溶液滴下至甲 醉2〇〇mL中攪拌30分鐘之後，過濾析出之沉澱而得到固 體。藉由得到之固體溶解於四氫呋喃，通過氧化鋁管柱、 二氧化矽凝膠管柱而進行精製。在濃縮由管柱所回收之四 虱°夫喃溶液之後，滴下至甲醇(2〇〇mL)中，過遽析出之固 體而進行乾燥。得到之聚合物E之產率係293mg。 聚合物E之聚苯乙烯換算之數量平均分子量係L8x 1〇4。聚合物E係由化學式(L)所表示之構造單位而成。[Reference Example 7] Synthesis of Polymer E In an inert environment, Compound A (0.37 g), Compound B (〇.82 g;), 1,3_->Smell (〇.〇9g), and two bases were mixed. The surface (〇.〇ig), methyl trioctyl ketone (manufactured by Aldrich Co., Ltd., trade name: Aliquat 336 (registered trademark)) (0.20 g) and toluene (10 mL) were heated to 1 〇5. Hey. A 158 323451 201234576 2M aqueous sodium carbonate solution (6 mL) was added dropwise to the reaction mixture, followed by reflux for 7 hours. Phenylboronic acid (0.002 g) was added to the reaction mixture, and the mixture was refluxed for 1 hr. Next, an aqueous solution of sodium diethyldithiocarbamate (10 mL, concentration: 0.05 g/niL) was added, and the mixture was stirred for 1 hour. The mixed solution was added dropwise to sterol 3 〇〇ηη£ and stirred for 1 hour, and then the precipitate was filtered, dried under reduced pressure for 2 hours, and dissolved in 20 mL of tetrahydrofuran. The obtained solution was dropped into a mixed solvent of 12 mL of methanol and 50 mL of 3% by weight of acetic acid water/cold solution, and stirred for a few hours, and then the precipitate was filtered to dissolve in 20 mmol of tetrahydrofuran. After the solution thus obtained was dropped to 2 mL of a drunk for 30 minutes, the deposited precipitate was filtered to obtain a solid. The obtained solid was dissolved in tetrahydrofuran, and purified through an alumina column and a ceria gel column. After concentrating the tetrahydrofuran solution recovered from the column, it was dropped into methanol (2 mL), and the precipitate was solidified and dried. The yield of the obtained polymer E was 293 mg. The polystyrene-converted number average molecular weight of the polymer E is L8x 1〇4. The polymer E is a structural unit represented by the chemical formula (L).

[實驗例8] 聚合物E之鉋鹽之合成 聚合物E(200mg)放入至100mL燒瓶中，進行氮取代。 混合四氫呋喃（1 OmL)和曱醇（5mL)。在混合溶液中添加氮 159 323451 201234576 氧化鉋（200mg)溶解於水(2mL)之水溶液，在65°C攪拌2小 時。在反應溶液中加入甲醇10mL，並且，在65°C攪拌5 小時。混合物冷卻至室溫後，減壓館除反應溶媒。藉由以 水來洗淨產生之固體，進行減壓乾燥，而得到淡黃色固體 (170mg)。藉由NMR光譜而確認來自於聚合物B内之乙基 酯部位之乙基之訊號完全地消失。將得到之聚合物E之鉋 鹽稱為共輛高分子化合物8。共輥高分子化合物8係由化 學式(M)所表示之構造單位而組成（「包含全構造單位中之 • 由化學式（1)所表示之基和化學式（2)所表示之基而組成之 群級中選出之1種以上之基以及化學式（3)所表示之1種以 上之基之構造單位之比例」以及「全構造單位中之化學式 (13)、化學式（15)、化學式（17)和化學式(2〇)所表示之構造 早位之比例」係75莫耳％。）。共輕尚分子化合物$之hqmq 之軌道能係-5.6eV，LUMO之軌道能係-2.6eV。[Experimental Example 8] Synthesis of Planer Salt of Polymer E Polymer E (200 mg) was placed in a 100 mL flask to carry out nitrogen substitution. Tetrahydrofuran (1 OmL) and methanol (5 mL) were combined. Nitrogen was added to the mixed solution 159 323451 201234576 The oxidized planer (200 mg) was dissolved in an aqueous solution of water (2 mL) and stirred at 65 ° C for 2 hours. 10 mL of methanol was added to the reaction solution, and the mixture was stirred at 65 ° C for 5 hours. After the mixture was cooled to room temperature, the reaction solvent was removed under reduced pressure. The resulting solid was washed with water and dried under reduced pressure to give a pale yellow solid (170 mg). The signal of the ethyl group derived from the ethyl ester moiety in the polymer B was completely disappeared by NMR spectroscopy. The obtained planer salt of the polymer E is referred to as a co-polymer compound 8. The co-roll polymer compound 8 is composed of a structural unit represented by the chemical formula (M) ("a group including a base represented by a chemical formula (1) and a base represented by a chemical formula (2) in a total structural unit) "The ratio of one or more selected bases in the class and the structural unit of one or more types represented by the chemical formula (3)" and "the chemical formula (13), the chemical formula (15), the chemical formula (17) in the entire structural unit, and The ratio of the early position of the structure represented by the chemical formula (2〇) is 75 mol%.). The orbital energy system of the hqmq of the light molecular compound is -5.6eV, and the orbital energy of LUMO is -2.6eV.

[參考例8] 聚合物F之合成 在惰性環境下，混合化合物B (1.01 g)、丨，4 _二填_2 3 5 ( 四氟苯(0.30g)、三苯基膦鈀(0.〇2幻、曱基三辛基録氯也^ (Aldrich公司製、商品名稱：Aliquat336(註冊商伊）)(〇 323451 160 201234576 和曱苯（10mL)，加熱至105〇C。在該反應液中滴^ 2M碳 酸鈉水溶液(6mL)使回流4小時。在反應液中加入苯基硼 酸(0.002g) ’使回流4小時。接著’加入二乙基二硫代胺其 甲酸鈉水溶液(lOmL、濃度：〇.〇5g/mL)，擾掉j小時將 混合溶液滴下至甲醇300mL之中而攪拌1小時之後，過滤 析出之沉澱而減壓乾燥2小時，溶解於四氩呋喃扣爪[。〜 將得到之溶液滴下至曱醇120mL和3番旦。^ 里里/〇乙酸水溶液 50mL之混合溶媒中而擾掉1小時之後，過遽析出之沉澱 •使溶解於四氫吱喃20mL。在像這樣得到之溶液滴下至甲 .醇2〇〇mL而猜30分鐘之後，過據析出之沉殿而得到固 體。藉由使得到之固體溶解於四氫嗅喃/乙酸乙醋〇/1(體積 比))之混合溶媒，通過氧化紹管柱、二氧化石夕凝膠管柱而 進行精製。在漠縮由管柱回收之四氫咳喃溶液之後，滴下 至甲醇(200mL)，過濾、析出之固體而進行乾燥。得到之聚 合物E之產率343mg。 • 聚合物F之聚苯乙烯換算之數量平均分子量係6 〇χ 104。聚合物F係由化學式(Ν)所表示之構造單位而成。[Reference Example 8] Synthesis of Polymer F In an inert atmosphere, Compound B (1.01 g), hydrazine, 4 _ 2 filled _2 3 5 (tetrafluorobenzene (0.30 g), triphenylphosphine palladium (0. 〇 2 幻, 曱 三 三 录 录 也 也 ^ ( ( ( ( ( ( ( Al Al Al Al Al Al Al Al Al Al Al Al Al 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 2D sodium carbonate aqueous solution (6 mL) was refluxed for 4 hours. Phenylboronic acid (0.002 g) was added to the reaction solution to reflux for 4 hours. Then, diethyldithioamine was added to the sodium formate aqueous solution (10 mL, concentration). : 〇.〇5g/mL), disturbed for j hours, the mixed solution was dropped into 300 mL of methanol and stirred for 1 hour, and then the precipitate was filtered and dried under reduced pressure for 2 hours, and dissolved in tetrahydrofuran claws [~~ The obtained solution was added dropwise to a mixed solvent of 120 mL of sterol and 3 dan, 50 liters of lysine/anthracene acetic acid, and the mixture was disturbed for 1 hour, and the precipitate precipitated by hydrazine was dissolved in 20 mL of tetrahydrofuran. The obtained solution was dropped to 2 mL of methyl alcohol and guessed for 30 minutes, and then a solid was obtained by the precipitated chamber. The solid solvent is dissolved in a mixed solvent of tetrahydro venrene/acetic acid acetonitrile / 1 (volume ratio), and is purified by oxidizing the column and the silica gel column. After the tetrahydrogen cough solution, it was added dropwise to methanol (200 mL), and the solid which was filtered and precipitated was dried to obtain a yield of 343 mg of the polymer E. • The polystyrene-converted number average molecular weight of the polymer F was 6 〇. χ 104. The polymer F is a structural unit represented by a chemical formula (Ν).

聚合物F之鉋鹽之合成 323451 161 201234576Synthesis of Planer Salt of Polymer F 323451 161 201234576

聚合物F(150mg)放入至lOOmL燒瓶，進行氮取代。 混合四氫咬喃（1 OmL)和甲醇（5mL)。在混合溶液中添加氫 氧化铯(260mg)溶解於水(2mL)之水溶液，在65。(：攪拌2小 時。在反應溶液中加入甲醇lOmL，並且，在65°C攪拌5 小時。混合物冷卻至室溫後，減壓餾除反應溶媒。藉由以 水來洗淨產生之固體，進行減壓乾燥，而得到淡黃色固體 (130mg)。藉由NMR光譜而確認來自於聚合物E内之乙基 酯部位之乙基之訊號完全地消失。將得到之聚合物F之鉋 鹽稱為共輛高分子化合物9。共軛高分子化合物9係由化 學式（〇)所表示之構造單位而組成（「包含全構造單位中之 由化學式（1)所表示之基和化學式(2)所表示之基而組成之 群組中選出之1種以上之基以及化學式（3)所表示之1種以 上之基之構造單位之比例」以及「全構造單位中之化學式 (13)、化學式（15)、化學式（Π)和化學式(20)所表示之構造 單位之比例」係75莫耳％。）。共軛高分子化合物9之HOMO 之軌道能係-5.9eV，LUMO之軌道能係-2.8eV。Polymer F (150 mg) was placed in a 100 mL flask and replaced with nitrogen. Tetrahydromethane (1 OmL) and methanol (5 mL) were combined. An aqueous solution of hydrazine hydroxide (260 mg) dissolved in water (2 mL) was added to the mixed solution at 65. (: stirring for 2 hours. 10 mL of methanol was added to the reaction solution, and the mixture was stirred at 65 ° C for 5 hours. After the mixture was cooled to room temperature, the reaction solvent was distilled off under reduced pressure, and the resulting solid was washed with water. The organic layer was dried under reduced pressure to give a pale-yellow solid (130 mg). The signal of the ethyl ester from the ethyl ester in the polymer E was completely disappeared by NMR spectroscopy. A total of polymer compound 9. The conjugated polymer compound 9 is composed of a structural unit represented by a chemical formula ("the base represented by the chemical formula (1) and the chemical formula (2) in the total structural unit). The ratio of one or more selected groups in the group formed by the group and the structural unit of one or more types represented by the chemical formula (3) and the chemical formula (13) and the chemical formula (15) in the entire structural unit The ratio of the structural unit represented by the chemical formula (Π) and the chemical formula (20) is 75 mol%.) The orbital energy system of the HOMO of the conjugated polymer compound 9 is -5.9 eV, and the orbital energy system of LUMO is -2.8 eV. .

(75:25 mol%) [參考例9] 在惰性環境下，混合2_[2_(2-甲氧基乙氧基）乙氧基]-P-甲苯磺酸S旨（ll.〇g)、三伸乙二醇(30.0g)和氫氧化鉀(3.3g)， 162 323451 201234576 在100°c加熱攪拌18小時。在放冷彳ί，將反應溶液加入至 水（100mL)，藉由三氯甲烧進行分液萃取後，濃縮溶液。藉 由對於濃縮之溶液進行庫格爾柔瓦(Kugelrohr)蒸餾（1〇mm Τοιτ、180。〇而得到2-(2-(2-(2-(2-(2-甲氧基乙氧基）_乙氧 基)-乙氧基)-乙氧基)-乙氧基）乙醇(6.1g)。 [參考例10] 在惰性環境下，混合2-(2-(2-(2-(2-(2-曱氧基乙氧基)_ 乙氧基)-乙氧基)-乙氧基)_乙氧基）乙醇（8.〇g)、氫氧化鈉 籲（1.^)、蒸餾水(2mL)和四氫呋喃（2mL)，進行冰冷。在混 合溶液中，以30分鐘滴下p_曱苯磺醢氯(5.5g)之四氫呋喃 (6.4mL)溶液，在滴下後，反應溶液係提高至室溫而攪拌 15小時。在反應溶液中加入蒸餾水(5〇mL)，在藉由_硫 酸而中和反應溶液之後，藉由三氯甲烷進行分液萃取。藉 由濃縮溶液而得到2-(2-(2-(2-(2-(2-曱氧基乙氧基）_乙氧 基)-乙氧基)-乙氧基)-乙氧基)p-曱苯磺酸酯（ll 8g)。 •[參考例11 ] 2,7-二溴-9,9-雙[3-乙氧基羰基_4-[2-(2·(2-(2-(2-(2-甲 氧基乙氧基)-乙氧基)-乙氧基)_乙氧基)_乙氧基）乙氧基]苯 棊]-第（化合物C)之合成. 在300mL之燒瓶中放入2,7_二溴_9_第酮〇27 2g)、水 楊酸乙酯（375.2g)和酼基乙酸(3.5g)，進行氮取代。在此添 加甲烷磺酸（1420mL)，在75t;整夜地攪拌混合物。放冷混 合物，加入冰水中而攪摔1小時。過濾移開產生之固體， 藉由加熱之乙腈進行洗淨。將經洗淨之該固體溶解於丙酮， 323451 163 201234576 由得到之丙酮溶液，使固體再結晶及過濾移開，得到固體 (167.8g)。將得到之固體(5g)、2-(2-(2-(2-(2-(2-甲氧基乙氧 基)-乙氧基)-乙氧基乙氧基)_乙氧基)p_f苯石黃酸醋（ι〇.切、 石反酸卸(5.3g)和18-冠醚_6(〇 6g)，溶解於甲基曱酿胺 (DMF)(100mL) ’將溶液移送至燒瓶而在奶。^搜掉4小 時。將得到之混合物放冷至室溫，加入至冰水，·上小時。 在反應液中加人三氣甲郎⑽mL)，進行分液萃取，濃縮溶 液。藉由將濃縮物溶解於乙酸乙自旨，通液至氧她之管柱， ♦濃縮溶液’而得到2,7_二漠妙雙[3—乙氧基幾基冰d (2-(2-(2-(2·甲氧基乙氧基)_乙氧基)_乙氧基)_乙氧基)_乙氧 基）乙氧基]苯基]-第（化合物c)(4 5g)。(75:25 mol%) [Reference Example 9] In an inert atmosphere, mixing 2_[2_(2-methoxyethoxy)ethoxy]-P-toluenesulfonic acid S (ll.〇g), Triethylene glycol (30.0 g) and potassium hydroxide (3.3 g), 162 323451 201234576 were heated and stirred at 100 ° C for 18 hours. After allowing to cool, the reaction solution was added to water (100 mL), and the mixture was concentrated by trichloromethane. 2-(2-(2-(2-(2-(2-methoxyethoxy)) was obtained by Kugelrohr distillation (1 〇mm Τοιτ, 180 〇) for the concentrated solution. ) _ ethoxy)-ethoxy)-ethoxy)-ethoxy)ethanol (6.1 g) [Reference Example 10] 2-(2-(2-(2-(2-(2-(2-(2-) 2-(2-decyloxyethoxy)-ethoxy)-ethoxy)-ethoxy)-ethoxy)ethanol (8.〇g), sodium hydroxide (1.^), Distilled water (2 mL) and tetrahydrofuran (2 mL) were ice-cooled. In a mixed solution, a solution of p-nonylbenzenesulfonium chloride (5.5 g) in tetrahydrofuran (6.4 mL) was added dropwise over 30 minutes, and after the dropwise addition, the reaction solution was increased to Stirring was carried out for 15 hours at room temperature. Distilled water (5 〇 mL) was added to the reaction solution, and after neutralizing the reaction solution by _ sulfuric acid, liquid separation extraction was carried out by chloroform. By concentrating the solution, 2-(( 2-(2-(2-(2-(2-methoxyethoxy)ethoxy)-ethoxy)-ethoxy)-ethoxy)-ethoxy)p-nonylbenzenesulfonate (ll 8g). [Reference Example 11] 2,7-Dibromo-9,9-bis[3-ethoxycarbonyl_4-[2-(2·(2-(2-(2-(2-(2- Oxyethoxyethyl)-ethoxy)-ethoxy)-ethoxy)-ethoxylate Synthesis of ethoxy]benzoquinone]-the (Compound C). In a 300 mL flask, 2,7-dibromo-9-ketoxime 27 2 g), ethyl salicylate (375.2 g) and hydrazine were placed. Acetic acid (3.5 g) was subjected to nitrogen substitution. Methanesulfonic acid (1420 mL) was added here at 75t; the mixture was stirred overnight. The mixture was allowed to cool, and added to ice water and stirred for 1 hour. The resulting solid was removed by filtration and washed with heated acetonitrile. The washed solid was dissolved in acetone, 323451 163 201234576 from the obtained acetone solution, the solid was recrystallized and filtered to give a solid (167.8 g). Solid (5g), 2-(2-(2-(2-(2-(2-methoxyethoxy)-ethoxy)-ethoxyethoxy)-ethoxy) P_f Phenyl acid vinegar (ι〇. cut, stone acid-removal (5.3g) and 18-crown ether _6 (〇6g), dissolved in methyl manganamine (DMF) (100mL) 'Transfer the solution to The flask was taken up in the milk for 4 hours. The obtained mixture was allowed to cool to room temperature, and added to ice water for an hour. A third gas (10) mL) was added to the reaction solution to carry out liquid separation extraction, and the solution was concentrated. By dissolving the concentrate in the acetic acid, from the liquid to the oxygen column, ♦ concentrating the solution, and obtaining 2,7_2, the singular double [3-ethoxylated ice d (2-( 2-(2-(2.methoxyethoxy)-ethoxy)-ethoxy)-ethoxy)-ethoxy)ethoxy]phenyl]-(Compound c) (4 5g).

[參考例12] 聚合物G之合成 在惰性環境下，將化合物c(1.0g)、4-tert-丁基苯基漠 化物(0.9mg)、2,2’♦比咬(0.¾)和脫水四氫咬喃（5〇mL)加 入至200mL燒瓶中進行混合。在混合物升溫至55。〇之後， 添加雙（1，5-壤辛二歸)鎳（〇 6g卜在坑擾拌5小時。冷卻 混合物至室溫後’冑反應溶液滴下至甲醇(2〇〇mL)和]N稀 鹽酸(2〇OmL)之混合液中。在藉由過濾、而收集產生之沉殿 物之後，再洛解於四氫呋喃中。滴下至甲醇(2〇〇mL)和15% 164 323451 201234576 氨水（100mL)之混合液，藉由過濾而收集產生之沉澱物。 將沉澱物再溶解於四氫呋喃，滴下至曱醇（200mL)和水 (1 OOmL)之混合液，藉由過濾而收集產生之沉澱物。藉由 對於收集之沉澱物，進行減壓乾燥，而得到聚合物 G(360mg)。 聚合物G之聚苯乙烯換算之數量平均分子量係6.0x 104。聚合物G係由化學式(P)所表示之構造單位而成。.[Reference Example 12] Synthesis of Polymer G In a noble environment, Compound c (1.0 g), 4-tert-butylphenyl desert (0.9 mg), 2, 2' ♦ ratio (0.3⁄4) It was mixed with dehydrated tetrahydrotetramine (5 〇 mL) into a 200 mL flask for mixing. The mixture was warmed to 55. After the hydrazine, add bis (1,5-limine bismuth) nickel (〇6gbu in the pit for 5 hours. After cooling the mixture to room temperature, 胄 the reaction solution is dripped into methanol (2〇〇mL) and] N In a mixture of hydrochloric acid (2 〇OmL), after collecting the resulting sediments by filtration, it was again dissolved in tetrahydrofuran, and dropped to methanol (2 〇〇mL) and 15% 164 323451 201234576 ammonia water (100 mL). The resulting mixture was collected by filtration to collect the resulting precipitate. The precipitate was redissolved in tetrahydrofuran, and a mixture of decyl alcohol (200 mL) and water (100 mL) was added, and the resulting precipitate was collected by filtration. The collected G was dried under reduced pressure to obtain a polymer G (360 mg). The polystyrene-equivalent number average molecular weight of the polymer G was 6.0 x 104. The polymer G was represented by the chemical formula (P). The structural unit is formed.

[實驗例10] 聚合物G之絶鹽之合成 聚合物G(150mg)放入至100mL燒瓶中，進行氮取代。 混合四氫呋喃（15mL)和曱醇(5mL)。在混合溶液中添加氫 .氧化铯（170mg)溶解於水(2mL)之水溶液，在65°C授拌6小 時。混合物冷卻至室溫後，減壓餾除反應溶媒。藉由以水 洗淨產生之固體，進行減壓乾燥，而得到淡黃色固體 (95mg)。藉由NMR光譜而確認來自於聚合物G内之乙基 酯部位之乙基之訊號完全地消失。將得到之聚合物G之鉋 鹽稱為共輛高分子化合物1 〇。共輛高分子化合物1 〇係由 化學式（Q)所表不之構造單.位而組成（.「包含.全構.造單位中 之由化學式（1)所表示之基和化學式（2)所表.示之基而組成 之群組中選出之1種以上之基以及化學式（3)所表禾之1種 323451 165 201234576 以上之基之構造單位之比例」以及「全構造單位中之化學 式（13)、化學式（15)、化學式（17)和化學式（20)所表示之構 造單位之比例」係100莫耳％。）。共軛高分子化合物1〇 之HOMO之執道能係_5,7eV，LUMO之軌道能係_2.9eV。[Experimental Example 10] Synthesis of a salt of a polymer G. Polymer G (150 mg) was placed in a 100 mL flask to carry out nitrogen substitution. Tetrahydrofuran (15 mL) and methanol (5 mL) were combined. Hydrogen was added to the mixed solution. Antimony oxide (170 mg) was dissolved in an aqueous solution of water (2 mL), and stirred at 65 ° C for 6 hours. After the mixture was cooled to room temperature, the reaction solvent was evaporated under reduced pressure. The solid produced by washing with water was dried under reduced pressure to give a pale yellow solid (95 mg). The signal of the ethyl group derived from the ethyl ester moiety in the polymer G was completely disappeared by NMR spectroscopy. The obtained salt of the polymer G is referred to as a total of a polymer compound 1 〇. A total of polymer compound 1 is composed of a single structure represented by the chemical formula (Q) ("includes. The structure represented by the chemical formula (1) and the chemical formula (2) in the whole structure. The ratio of the structural unit selected from the group consisting of the group of the formula (3) and the structure unit of the 323451 165 201234576 and the base of the chemical formula (3) and the chemical formula in the whole structural unit ( 13) The ratio of the structural unit represented by the chemical formula (15), the chemical formula (17), and the chemical formula (20) is 100% by mole. The HOMO of the conjugated polymer compound 1〇 is _5,7eV, and the orbital energy system of LUMO is _2.9eV.

•[參考例13] 1，3-二溴-5-乙氧基羰基-6-[2-[2-(2-甲氧基乙氧基）乙氧 基]乙氧基]苯之合成 在惰性環境下，混合3，5 -二演水揚酸(2 〇 g)、乙醇（丨7 mL)、 濃硫酸(1.5mL)和甲苯(7mL)，在13〇°C加熱攪拌20小時。 在放冷後’將反應溶液加入至冰水（l〇〇mL)中，藉由三氣 曱烷進行分液萃取，濃縮溶液。得到之固體，溶解於異丙 鲁醇，溶液滴下至蒸餾水。轉由過濾移開得到之析出物，而 得到固體（18g)。在惰性環境下，混合得到之固體（lg)、2_[2_ (2-甲氧基乙氧基）乙氧基]-p_甲苯磺酸酯（1.5g)、碳酸鉀 (0.7g)和DMF(15mL) ’在1〇〇。〇加熱攪拌4小時。放冷後， 加入三氣曱烷而進行分液萃取，濃縮溶液。藉由濃縮物溶 解於三氣曱烷，通液至二氧化矽凝膠管柱而進行精製。藉 由濃縮溶液而得至，3-二漠-5-乙氧基幾基各[2_[2_ (2_甲 氧基乙氧基）乙氧基]乙氧基]苯（1〇g)。 [參考例14] 323451 166 201234576 聚合物Η之合成 在::生環:竟下’混合化合物Α(〇焉wb合物B(05g)、 」，3-ϋ氧基減_6•[冰(2_?氧基乙 乙氧基]苯(o.lg)、三苯基膦鈀（30m 丁 ^基] 和曱苯（19mL)，加熱至10外 土㈣化物 L在§亥反應夜中滴下2M磁 酸納水溶液(5mL)，使回流5小時。在反應液中加入苯其 刪使回流14小時。接著，加入二乙基二硫代土胺 .基甲酸納水溶液(侃、濃度—小二 •除去水層，藉由蒸德水而洗淨有機層，藉由將經壤縮得到 之固體溶解於三氯"，料氧输辣、二氧 管柱而進行精製。濃縮來自管柱之溶出液而進行乾燥: 到之聚合物Η之產率係〇.44g。 、于 聚合物Η之聚苯乙稀換算之數量平均分子量係3.&• [Reference Example 13] Synthesis of 1,3-dibromo-5-ethoxycarbonyl-6-[2-[2-(2-methoxyethoxy)ethoxy]ethoxy]benzene Under an inert atmosphere, 3,5-dihydrosalicylic acid (2 〇g), ethanol (丨7 mL), concentrated sulfuric acid (1.5 mL) and toluene (7 mL) were mixed and stirred at 13 ° C for 20 hours. After the cooling was carried out, the reaction solution was added to ice water (10 mL), and the solution was concentrated by liquid separation with trioxane. The obtained solid was dissolved in isopropyl alcohol, and the solution was dropped to distilled water. The precipitate obtained by filtration was removed to give a solid (18 g). The resulting solid (lg), 2_[2_(2-methoxyethoxy)ethoxy]-p-tosylate (1.5 g), potassium carbonate (0.7 g) and DMF were mixed under an inert atmosphere. (15mL) 'At 1〇〇. The mixture was heated and stirred for 4 hours. After allowing to cool, trimethyl decane was added to carry out liquid separation extraction, and the solution was concentrated. The concentrate was dissolved in trioxane and passed through a gel column of cerium oxide for purification. By the concentration of the solution, 3-di-5-ethoxyl group [2_[2_(2-methoxyethoxy)ethoxy]ethoxy]benzene (1 〇g). [Reference Example 14] 323451 166 201234576 Synthesis of polymer oxime in:: raw ring: actually 'mixed compound Α (〇焉wb compound B (05g), ”, 3-ϋ oxy group minus _6• [ice ( 2_?oxyethylethoxy]benzene (o.lg), triphenylphosphine palladium (30m butyl group) and toluene (19mL), heated to 10 soil (four) compound L in the § Hai reaction night drop 2M magnetic An aqueous solution of sodium sulphate (5 mL) was refluxed for 5 hours. Benzene was added to the reaction mixture and the mixture was refluxed for 14 hours. Then, aqueous solution of diethyldithiotriamine and sodium carboxylic acid was added (侃, concentration - small two) In the water layer, the organic layer is washed by steaming water, and the solid obtained by the sedimentation is dissolved in trichlorite, and the oxygen is sent to the column to be refined. The eluate from the column is concentrated. And drying: the yield of the polymer oxime is 44. 44g. The number average molecular weight of the polystyrene in the polymer oxime is 3.&

(R) 聚合物Η之鉋鹽之合成 聚合物H(200mg)放入至lOOmL燒瓶中，進行氮取代。 添加四氫吱喃（14mL)和曱醇(7mL)而進行混合。在混合溶 液中添加氫氧化絶(90mg)溶解於水(lmL)之水溶液，在65 °C擾拌1小時。在反應溶液中加入曱醇5mL，並且，在65 167 323451 201234576 °C攪拌4小時。混合物冷卻至室溫後，減壓餾除反應溶媒。 藉由以水來洗淨產生之固體，進行減壓乾燥，而得到淡黃 色固體（190mg)。藉由NMR光譜而確認來自於聚合物η内 之乙基酯部位之乙基之訊號完全地消失。將得到之聚合物 Η之鉋鹽稱為共軛高分子化合物11。共軛高分子化合物.u 係由化學式（S)所表示之構造單位而組成（「包含全構造單 位中之由化學式（1)所表示之基和化學式（2)所表示之基而 組成之群組中選出之1種以上之基以及化學式（3)所表示之 • 1種以上之基之構造單位之比例」以及「全構造單位中之 化學式（13)、化學式（15)、化學式（17)和化學式(20)所表示 之構造單位之比例」係100莫耳％。）。共軛高分子化合物 11之HOMO之執道能係-5.6eV，LUMO之軌道能係_2.8eV。(R) Synthesis of polymer crucible salt Polymer H (200 mg) was placed in a 100 mL flask for nitrogen substitution. Tetrahydrofuran (14 mL) and decyl alcohol (7 mL) were added and mixed. An aqueous solution of hydrogen peroxide (90 mg) dissolved in water (1 mL) was added to the mixed solution, and the mixture was stirred at 65 ° C for 1 hour. 5 mL of sterol was added to the reaction solution, and stirred at 65 167 323451 201234576 ° C for 4 hours. After the mixture was cooled to room temperature, the reaction solvent was evaporated under reduced pressure. The resulting solid was washed with water and dried under reduced pressure to give a pale yellow solid (190 mg). It was confirmed by NMR spectroscopy that the signal of the ethyl group derived from the ethyl ester moiety in the polymer η completely disappeared. The obtained planer salt of the polymer is referred to as a conjugated polymer compound 11. The conjugated polymer compound .u is composed of a structural unit represented by the chemical formula (S) ("a group including a group represented by the chemical formula (1) and a group represented by the chemical formula (2) in the entire structural unit) "The ratio of one or more selected groups in the group and the structural unit of the one or more types represented by the chemical formula (3)" and "Chemical formula (13), chemical formula (15), and chemical formula (17) in the entire structural unit) The ratio of the structural unit represented by the chemical formula (20) is 100% by mole. The HOMO of the conjugated polymer compound 11 is -5.6eV, and the orbital energy of LUMO is _2.8eV.

[參考例15] 168 323451 201234576 生之固體，藉由加熱之乙腈而進行洗淨。將經洗淨之該固 體，溶解於_，由得到之丙綱溶液，使固體進行再結曰 及過處移開。將得到之固體（16 3g)、2*(2_甲氧基乙氧& 乙氧土] p甲苯~酸醋（6〇.3g)、碳酸鉀(48々)和冠醚 _6(2.4g) ’溶解於邮_二甲基甲醯胺，⑼〇‘），將溶 液移ΪΪ燒瓶而在贿檀摔15小時。將得到之混合物放 冷至至/皿加人至冰水，獅丨小時。藉由在反應液中加 入^酸乙酯(3GGmL) ’進行分液萃取’濃縮溶液，使溶解 •於三氣甲烧/甲醇(50/1(體積比))之混合溶媒，通過二氧化 矽凝膠管柱，而進行精製。藉由濃縮通液於管柱之溶液， 而得到2,7-二填-9,9-雙[3,4-雙[冰-(2-甲氧基乙氧基）乙氧 基]乙氧基]-5-甲氧基羰基苯基]g(化合物D)(2〇5g)。 [參考例16] 一 2,7-雙[7-(4-甲基苯基)-9,9-二辛基苐_2_基]_9,9_雙[5_ 曱氧基幾基-3,4-雙[2-[2-(2_曱氧基乙氧基）乙氧基]乙氧基] 鲁本基]-苐（聚合物I)之合成 在惰性環境下，混合化合物D(〇 7〇g)、2_(4,4,5,5_四甲 基-1，2,3-二氧雜硼雜環戊烷_2_基)_9,9_二辛基第（〇.62幻、三 本基膦lG(〇.〇19g)、一。惡烧(40mL)、水(6〇mL)和碳酸鉀水馨 液〇,38g)，加熱至80°C。使反應液進行i小時之反應。在 反應後，添加飽和二乙基二硫代胺基甲酸鈉水5mL，在攪 拌30分鐘之後，除去有機溶媒。藉由得到之固體，通過氧 化1呂管柱(展開溶媒己烷：乙酸乙酯=1 : 1(體積比)），進 行精製，濃縮溶液，而得到2,7·雙[7_(4_曱基苯基)_9,9_二 323451 169 201234576 辛基第-2-基]-9,9-雙[3_乙氧基羰基_4_[2_[2_(2_甲氧基乙氧 基）乙氧基]乙氧基]苯基]-苐（聚合物I)(66〇mg)。 聚合物I之聚苯乙烯換算之數量平均分子量係2 〇χ 103。聚合物I係藉由化學式（Τ)所表示。此外，2_(4,4,5,5_ 四甲基-1，2,3-二氧雜硼雜環戊烷_2_基)_9,9_二辛基苐係可 以藉由例如 〇己载於 The Journal of Physical Chemistry B 2000, 104, 9118- 9125之方法而進行合成。[Reference Example 15] 168 323451 201234576 Raw solid, washed by heating acetonitrile. The washed solid is dissolved in _, and the obtained solid solution is subjected to re-crusting and removal. The solid to be obtained (16 3g), 2*(2_methoxyethoxy[amp] ethoxylate] p-toluene-acid vinegar (6〇.3g), potassium carbonate (48々) and crown ether _6 (2.4 g) 'Dissolved in _ dimethyl carbamide, (9) 〇 '), the solution was transferred to the flask and smashed for 15 hours. Allow the resulting mixture to cool to / for people to ice water, griffin hours. By adding ethyl acetate (3 GGmL) in the reaction solution to carry out liquid separation extraction of the concentrated solution, the dissolved solvent in the three gas aeration/methanol (50/1 (volume ratio)) was passed through the cerium oxide. The gel column is refined and refined. By concentrating the solution of the solution in the column, 2,7-di-fill-9,9-bis[3,4-bis[ice-(2-methoxyethoxy)ethoxy]ethoxylate is obtained. 5-yloxycarbonylphenyl]g (Compound D) (2〇5g). [Reference Example 16] A 2,7-bis[7-(4-methylphenyl)-9,9-dioctylfluoren-2-yl]-9,9-bis[5-decyloxy-yl-3 Synthesis of 4-bis[2-[2-(2-)oxyethoxy)ethoxy]ethoxy]lubenyl]-indole (Polymer I) In an inert environment, compound D ( 〇7〇g), 2_(4,4,5,5-tetramethyl-1,2,3-dioxaborolan-2-yl)_9,9-dioctyl (〇. 62 phantom, tri-based phosphine lG (〇.〇19g), one. cacao (40mL), water (6〇mL) and potassium carbonate water, 38g), heated to 80 °C. The reaction solution was allowed to react for 1 hour. After the reaction, 5 mL of saturated diethyldithiocarbamate sodium water was added, and after stirring for 30 minutes, the organic solvent was removed. The obtained solid was purified by oxidizing a column (developing solvent hexane: ethyl acetate = 1 : 1 (volume ratio)), and the solution was concentrated to obtain 2,7·double [7_(4_曱). Phenylphenyl)_9,9_二323451 169 201234576 Octyl-2-yl]-9,9-bis[3_ethoxycarbonyl_4_[2_[2_(2_methoxyethoxy)B Oxy]ethoxy]phenyl]-indole (Polymer I) (66 〇 mg). The polystyrene-converted number average molecular weight of the polymer I is 2 〇χ 103. Polymer I is represented by the chemical formula (Τ). In addition, 2_(4,4,5,5-tetramethyl-1,2,3-dioxaborolan-2-yl)_9,9-dioctyl fluorene can be carried by, for example, 〇 The synthesis was carried out in the method of The Journal of Physical Chemistry B 2000, 104, 9118-9125.

[實驗例12] 聚合物I之铯鹽之合成 聚合物I(236mg)放入至lOOmL燒瓶中，進行氬取代。 在此，添加四氫°夫喃（20mL)和曱醇（10mL)，混合物升溫至 65°C。在此，添加氫氧化鉋（240mg)溶解於水(2mL)之水溶 液，在65°C攪拌7小時。得到之混合物冷卻至室溫後，減 壓餾除反應溶媒。藉由以水來洗淨產生之固體，進行減壓 乾燥，而得到淡黃色固體（190mg)。藉由NMR光譜而確認 來自於乙基酯部位之乙基之訊號完全地消失。將得到之聚 合物I之鉋鹽稱為共軛高分子化合物12。共軛高分子化合 物12係藉由化學式(U)所表示（「包含全構造單位中之由化 170 323451 201234576 學式（1)所表示之基和化學式（2)所表示之基而組成之群組 中選出之1種以上之基以及化學式（3)所表示之1種以上之 基之構造單位之比例」以及「全構造單位中之化學式（13)、 化學式（15)、化學式（17)和化學式（20)所表示之構造單位之 比例」係以小數點第2位進行四捨五入而成為33.3莫耳 %。）。共軛高分子化合物12之HOMO之執道能係-5.6eV， LUMO之執道能係-2.8eV。[Experimental Example 12] Synthesis of sulfonium salt of polymer I Polymer I (236 mg) was placed in a 100 mL flask and subjected to argon substitution. Here, tetrahydrofuran (20 mL) and methanol (10 mL) were added, and the mixture was warmed to 65 °C. Here, an aqueous solution of hydroxide (240 mg) dissolved in water (2 mL) was added, and the mixture was stirred at 65 ° C for 7 hours. After the resulting mixture was cooled to room temperature, the reaction solvent was distilled off under reduced pressure. The resulting solid was washed with water and dried under reduced pressure to give a pale yellow solid (190 mg). It was confirmed by NMR spectroscopy that the signal of the ethyl group derived from the ethyl ester site completely disappeared. The obtained planing salt of the polymer I is referred to as a conjugated polymer compound 12. The conjugated polymer compound 12 is represented by a chemical formula (U) ("a group consisting of a group represented by the formula (1) and a chemical formula (2) in the entire structural unit of the formula 170 323451 201234576) "The ratio of one or more selected groups in the group and the structural unit of one or more types represented by the chemical formula (3)" and "the chemical formula (13), the chemical formula (15), the chemical formula (17) in the entire structural unit, and The ratio of the structural unit represented by the chemical formula (20) is rounded to the nearest third decimal place to be 33.3 mol%. The HOMO of the conjugated polymer compound 12 is -5.6eV, and the LUMO is -2.8eV.

[評價用元件之製作及評價結果] 為了評價離子性聚合物之電子注入特性，因此，製作 僅流動電子之二極體構造之評價用元件，評價其電流-電壓 特性。 評價用元件正如以下而進行製作。首先，藉由在玻璃 基板，形成厚度30nm之鋁層（下部電極），在該鋁層上，形 成由下列之化學式⑴所表示之重複單位而成之厚度80nm 之聚合物層，在該聚合物層上形成5nm之電子注入層，並 且，在該電子注入層上形成厚度lOOnm之鋁層（上部電 極），而製作評價用元件。 171 323451 201234576[Production and Evaluation Results of the Element for Evaluation] In order to evaluate the electron injecting property of the ionic polymer, an evaluation element for a diode structure having only a flowing electron was produced, and the current-voltage characteristics were evaluated. The evaluation element was produced as follows. First, an aluminum layer (lower electrode) having a thickness of 30 nm is formed on a glass substrate, and a polymer layer having a thickness of 80 nm formed by a repeating unit represented by the following chemical formula (1) is formed on the aluminum layer, in which the polymer An electron injecting layer of 5 nm was formed on the layer, and an aluminum layer (upper electrode) having a thickness of 100 nm was formed on the electron injecting layer to fabricate an evaluation element. 171 323451 201234576

()在大氣中，藉由塗佈法而形成在實施例丨合成之離 子性聚合物之評價用元件1。 Φ )藉由蒸链法而形成氟化納之評價用元件2。 (c)藉由蒸鍍法而形成鋇之評價用元件3。 在各烀知用元件之下部電極施加正的電壓，在上部電 二施加負的電壓，使施加電壓逐漸地變大，測定流動在評 知用7G件之電子電流。 物將，果顯示在第3圖。第3圖係用以說明離子性聚合 電氣特性之圖形。縱軸係表示電子電流(A :安培），橫 • 係表示施加電壓(V :伏特）。在第3圖之圖形中，（a)係 表:評價用元件1之評價結果，（b)係表示評價用元件2之 #價結果，（c)係表示評價用元件3之評價結果。 正如由第3圖而叼確地得知：本發明之離子性聚合物 使用於電子注入層之評價用元件1係在比較氟化鈉或鋇使 用於電子注入層之評價用元件2、評價用元件3之時，在 包加電麼之5 V以上之全區域，更加地顯示良好之電子注 入特性。得知在就施加電壓為1〇v時而流動之電子電流來 看’流動在離子性聚合物使用於電子注入層之評價用元件 323451 172 201234576 1之電子電流係比較流動在氟化鈉或鋇使用於電子注入層 之評價用元件2、3之電子電流，格外地變大，即使是在施 加電壓比較低之區域，也具有極為良好之電子注入特性。 【圖式簡單說明】 第1圖係概略地表示第1實施形態之有機薄膜電晶體 之構造之一例之剖面圖。 第2圖係概略地表示第2實施形態之有機薄膜電晶體 之構造之一例之剖面圖。 • 第3圖係說明離子性聚合物之電氣特性之圖形。 【主要元件符號說明】 10 有機薄膜電晶體 20 基板 20A 閘極電極 30 閘極絕緣層 40 有機半導體層 50 電荷注入層 50A 第1電荷注入層 50B 第2電荷注入層 6 0 A 第1源極/>及極電極 60B 第2源極/汲極電極 70 基板 L1 第1電荷注入層50A和第2電荷注入層50B之間隔 L2 第1電荷注入層50A及第2電荷注入層50B之幅寬 X 第1電荷注入層50A和第2電荷注入層50B分離之 方向 Y 垂直方向（垂直於紙面之方向） Z 厚度方向 173 323451() The evaluation element 1 of the ionic polymer synthesized in the example 形成 was formed by a coating method in the atmosphere. Φ) An element 2 for evaluation of sodium fluoride is formed by a vapor chain method. (c) The evaluation element 3 of the crucible is formed by a vapor deposition method. A positive voltage was applied to the lower electrode of each of the sensing elements, a negative voltage was applied to the upper portion of the device, and the applied voltage was gradually increased, and the electron current flowing in the 7 G piece for evaluation was measured. The object will be shown in Figure 3. Figure 3 is a graph for explaining the electrical characteristics of ionic polymerization. The vertical axis indicates the electron current (A: ampere), and the horizontal indicates the applied voltage (V: volt). In the graph of Fig. 3, (a) shows the evaluation result of the evaluation element 1, (b) shows the # price result of the evaluation element 2, and (c) shows the evaluation result of the evaluation element 3. As is apparent from Fig. 3, the evaluation element 1 for the electron injecting layer of the ionic polymer of the present invention is used for the evaluation element 2 for evaluation of the sodium fluoride or ruthenium for the electron injection layer, and for evaluation. At the time of the element 3, a good electron injection characteristic is more exhibited in the entire region of 5 V or more in which the package is applied. It is known that the electron current flowing in the case where the applied voltage is 1 〇v sees the flow of the ionic polymer used in the electron injection layer of the evaluation element 323451 172 201234576 1 The electronic current system flows in the sodium fluoride or cesium. The electron currents of the evaluation elements 2 and 3 used in the electron injection layer are exceptionally large, and have excellent electron injection characteristics even in a region where the applied voltage is relatively low. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a cross-sectional view schematically showing an example of a structure of an organic thin film transistor of a first embodiment. Fig. 2 is a cross-sectional view schematically showing an example of the structure of the organic thin film transistor of the second embodiment. • Figure 3 illustrates a graph of the electrical properties of an ionic polymer. [Description of main component symbols] 10 Organic thin film transistor 20 Substrate 20A Gate electrode 30 Gate insulating layer 40 Organic semiconductor layer 50 Charge injection layer 50A First charge injection layer 50B Second charge injection layer 6 0 A First source / > and electrode 60B second source/drain electrode 70 substrate L1 interval L2 between first charge injection layer 50A and second charge injection layer 50B width X of first charge injection layer 50A and second charge injection layer 50B The direction in which the first charge injection layer 50A and the second charge injection layer 50B are separated by Y is perpendicular to the direction perpendicular to the plane of the paper. Z Thickness direction 173 323451

Claims (1)

201234576 七、申請專利範圍·· 1. 一種有機薄膜電晶體，係具備：閘極電極、第ι源極/ 汲極電極、第2源極/汲極電極、設置在前述第丨=極人 汲極電極及第2源極/汲極電極和前述閘極電極之間之 有機半導體層、在前述第1源極/祕電極及第2源極/ 沒極電極和前述有财導體層之間與前述第〗源極/没 極電極及第2源極/汲極電極相接而配置之電荷注入声 的有機薄膜電晶體，其中，前述電荷注入層含有具備; • 荷注入特性之離子性聚合物。 . 、 2.如申請專利範圍第〗項所述之有機薄膜電晶體，其中， 導電型電荷注入層之導電型係11型，有機半導體層之導 電型係η型。 S 3·.如:請專利範圍第2項所述之#機薄膜電晶體，其中， 在則述有機半導體層和前述閘極電極之間，具有與前述 間極電極相接而配置之閘極絕緣層，前述閘極電極係由 n型半導體基板所構成。 4. 一種有機薄膜電晶體基板，係具備申請專利範圍第1 項所述之有機薄臈電晶體者。 5 · 1顯示裝i，係具備申請專利範圍第4項所述之有機 薄膜電晶體基板作為驅動基板者。 6. 一種有機薄膜電晶體之製造方法’係分別形成間極電 極、第1源極/汲極電極、第2源極/汲極電極、設置在 前述第1源極/汲極電極及第2雜/跡電極和前述閉 極電極之間之有機半導體層、在前述第J源極/汲極電 323451 201234576 極及第2源極/汲極電極和前述有機半導體層之間與前 述第1源極/汲極電極及第2源極/汲極電極相接而配置 之電荷注入層的有機薄膜電晶體之製造方法，其中，具 備：將含有具備電荷注入特性之離子性聚合物之電荷注 入層予以形成之步驟。 7. 如申請專利範圍第6項所述之有機薄膜電晶體之製造 方法，在形成前述電荷注入層之步驟中，在常壓之環 境下，藉由將含有離子性聚合物之塗佈液進行塗佈成 膜，而形成前述之電荷注入層。 8. 如申請專利範圍第6項所述之有機薄膜電晶體之製造 方法，其中，前述第1源極/汲極電極及第2源極/汲 極電極係在常壓之環境下，藉由將塗佈液進行塗佈成膜 而形成者。 9. 如申請專利範圍第6項所述之有機薄膜電晶體之製造 方法，其中，前述有機半導體層係在常壓之環境下， 藉由將塗佈液進行塗佈成膜而形成者。 2 323451201234576 VII. Patent Application Range·· 1. An organic thin film transistor having a gate electrode, a ι source/drain electrode, and a second source/drain electrode, which are disposed in the aforementioned 丨=极人汲An organic semiconductor layer between the electrode and the second source/drain electrode and the gate electrode, and between the first source/secret electrode and the second source/nom electrode and the structured conductive layer The charge-injection organic thin film transistor in which the source/dot electrode and the second source/drain electrode are in contact with each other, wherein the charge injection layer contains an ionic polymer having a charge injection property; . 2. The organic thin film transistor according to the invention of claim 1, wherein the conductive type charge injection layer is of a conductivity type 11 and the organic semiconductor layer is of an n type. The invention relates to a thin film transistor according to the second aspect of the invention, wherein the organic semiconductor layer and the gate electrode have a gate arranged to be in contact with the interpole electrode. In the insulating layer, the gate electrode is made of an n-type semiconductor substrate. 4. An organic thin film transistor substrate having the organic thin germanium transistor according to claim 1 of the patent application. 5 · 1 display device i, which is the organic thin film transistor substrate described in claim 4 of the patent application. A method for producing an organic thin film transistor, wherein a mesogen electrode, a first source/drain electrode, a second source/drain electrode, a first source/drain electrode, and a second electrode are respectively formed. An organic semiconductor layer between the impurity/track electrode and the closed electrode, and the first source between the Jth source/drain 323451 201234576 pole and the second source/drain electrode and the organic semiconductor layer A method for producing an organic thin film transistor of a charge injection layer in which a pole/drain electrode and a second source/drain electrode are in contact with each other, comprising: a charge injection layer containing an ionic polymer having charge injection characteristics The steps to be formed. 7. The method for producing an organic thin film transistor according to claim 6, wherein in the step of forming the charge injection layer, the coating liquid containing the ionic polymer is subjected to a normal pressure environment. The film is formed into a film to form the aforementioned charge injection layer. 8. The method for producing an organic thin film transistor according to claim 6, wherein the first source/drain electrode and the second source/drain electrode are in a normal pressure environment. The coating liquid is formed into a film and formed. 9. The method of producing an organic thin film transistor according to claim 6, wherein the organic semiconductor layer is formed by coating a coating liquid into a film under a normal pressure environment. 2 323451
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