201229416 六、發明說明： 【發明所屬之技術領域】 _ 树明係關於液化氣體供給裝置及方法，詳言之，係關於 用以使填充在複數個液化氣體容器中的液化氣體蒸發而供 給至氣體使用端的液化氣體供給裝置及方法。 【先前技術】 作為使填録複數個液域體容器巾之液滅體蒸發而 供給至氣體使㈣之液域體供給方法，係已知設置用以使 複數個液化氣體容器（巨大(bulk)容器）内的壓力上升之加壓 手段，並監控各液化氣體容器内之壓力，從壓力相對較高之 第1液化氣體谷益供給氣體，當該第i液化氣體容器内之壓 力降低時’將㈣之供給切換駿第2液化氣體容器進行， 並交換壓力已降低之第1液化氣體容器，藉此連續進行對氣 體使用端之氣體供給。（例如參照專利文獻U [專利文獻] (專利文獻1)日本專利特開2007-231982號公報 【發明内容】 (發明所欲解決之問題） 然而，雖可如專利文獻1般，當常溫附近之蒸氣壓高的 LNG之情況，可使液化氣體容器内之大多數LNG蒸發並進 行供給，但當常溫附近之蒸汽壓低的氣體(例如液化氨)之情 況’若液化氣體容器内之液化氣體殘留量為容器容積之30% 100138441 201229416 以下’則蒸發量馬上降低，難以用氣體使用端所要求之流旦 供給氣體。因此，當供給至氣體使用端之流量較多之情:里 在液化氣體容n内之液化氣體殘留量成為容器容積之桃 左右時’必須切換進行氣體供給之液化氣體容器，並。 化氣體殘留量變少线域财^俾可龍贿用端= 供給既定流量之氣體^ ' 囚此 /、π…、成兄刀使用填充於液化氣體容器内的液 氨，不僅降低液化氨之利用效率，且液化氣體容器之交 ，短期化，之問題。又’雖可將填充有液化氨之液化氣體容 器加熱至高溫而促進液化氨之蒸發，藉此以既定流量供= 發之氨’並使大部分之液化氣體容器_液化氨蒸發，= 要用來將大型的巨大容器加熱至高溫之特別加熱設備，而: 設備成本與運轉成本大幅提昇之問題。 因此本發明之目的在於提供__種液化氣體供給裝置及 法’可以簡單之裝置構成及順序，提高填充於液化氣體容号 内之祕氣體（尤其是如液化氨般於常溫附近之I氣壓低的 液化氣體）的利用效率。 (解決問題之手段） 為了達成上述目的，本發明之統氣體供給裝置係使填充 於複數個液化氣體容器内之液化氣體蒸發而對氣體使用端 進特徵在於具備：液化氣體容器，係分別連接 於複數個㈣供給㈣；液化氣體量檢測手段，係分別檢測 100138441 201229416 各液化氣體容器内之液化氣體量；壓力調整手段，係分別設 f於各氣體供給系統麵整二讀之壓力；氣體供給阻斷手 系;7 u於各氣體供、m以及使用端氣體供給路 係使從複數氧體供給祕所供給之氣贿流並供給至 •氣體使用端；各氣體供給系統係具備控制手段，其係根據上 述液化乳體直檢測手段所檢測之液化氣體容器内的液化氣 體私上述壓力調整手段之二次側的壓力控制為預先設定 之複數im δ认壓力中的任—個，並且分別躲置於該氣體供 給系統之上述氣體供給阻斷手段及設置於其他氣體供給系 統之上述氣體供給阻斷手段進行開閉控制。 此外’本發明之液化氣體供給裝置細上述壓力調整手段 係壓力調㈣為魏，該壓力罐_關之調節氣體 所流過之流路面積，藉此調整二次側之壓力。 尸本發明之液化氣體供給方法之第i構成係使用上述液化 氣體供給U而對上述氣體使用端連續地進行氣體供給 者，其特徵在於，上述控制手段係在打開設置於第1氣體供 . 、、’σ系統之第1氣體供給阻斷手段，並將第1壓力調整手段之 - 二次側設定壓力設定為基準設定壓力而從第1液化氣體容 器進行氣體供給時，當以第1液化氣體量檢測手段所檢測之 第1液化氣體容器内的液化氣體量低於預先設定之第1殘留 氣體量設定值時’將第1壓力調整手段之二次側設定壓力設 定為較上述基準設定壓力更高之壓力，並且打開設置於第2 100138441 . 201229416 氣體供給系統之第2氣體供給阻斷手段，從第i氣體供給系 統與第2氣體供給系統之雙方並聯地進行氣體供终。 又，本發明之液化氣體供給方法之第2構成係使用以上述 壓力調整閥作為上述壓力調整手段之液化氣體供給裝置，而 對上述氣體使用端連續地進行氣體供給者，其特徵在於上述 控制手段係在打開設置於第1氣體供給系統之第i氣體供給 阻斷手段’並將第1壓力調整手段之二次側設定壓力設定為 基準設定壓力而從第1液化氣體容器進行氣體供給時，當以 第1液化氣體量檢測手段所檢測之第1液化氣體容器内的液 化氣體量低於預先設定之第1殘留氣體量設定值時，將第1 壓力調整手段之二次側壓力設定為較上述基準設定壓力更 高之壓力，並且打開設置於第2氣體供給系統之第2氣體供 給阻斷手段’從第1氣體供給系統與第2氣體供給系統之雙 方並聯地進行氣體供給。 此外，本發明之液化氣體供給方法之特徵係當以上述第1 液化氣體量檢測手段所檢測之上述第1液化氣體容器内的 液化氣體量’低於被設定為較上述第1殘留氣體量設定值少 的液化氣體量之第2殘留氣體量設定值時，關閉第1氣體供 給阻斷手段而停止來自第1氣體供給系統之氣體供給，並切 換為來自第2氣體供給系統之氣體供給。 (發明效果） 根據本發明’可根據連接於各氣體供給系統之液化氣體容 100138441 6 201229416 器内的液化氣體量而切換複數個氣體供給系統，藉此對氣體 使用端連續地進行氣體供給’並且利用根據以液化氣體量檢 測手段所檢測之液化氣體量而作動的控制手段，來控制^ ' 調整手段之二捕的較壓力，或使壓力難叫為全開狀 ‘ 態，藉此，可將液化氣體量變少之液化氣體容⑼的液化氣 體供給至氣體使用端。藉此，可提高液化氣體之利用效率， 並且可使液化氣體容器之交換週期長期化。 > 【實施方式】 首先，如W 1所示，本形態例所示之液化氣體供給裝置係 使液化氨蒸發並供給者，具備有複數個（本形態例中為2個) 系統之氣體供給系統A系統、B系統；液化氣體容器山、 1 lb ,係分別連接於各氣體供給系統a系統、B系統；重量 計12a、12b ’係作為分別檢測各液化氣體容器Ua、in = 的液化氣體量之液域體量檢測手段；壓力指示調節計 (PIC)13a、13b ’係作為分別設置於各氣體供給系統a系統、 B系統’並將二次側之壓力調整為指示的壓力之壓力調整手 •段；自動開賴14a、14b，係分別設置於各氣體供給系統a ^ 祕、Bm作域賴社供給、停止喊體供給阻 斷手段；使用端氣體供給路徑15，係使從各氣體供給系統 A系統、B系統所供給之氣體匯流並供給至氣體 以 ，控=段16，係根據上述重量計以、m所檢敎液化 氣體容if 11a、lib内的液域體之殘留量，來控制上述壓 100138441 7 201229416 力指示調節計13a、13b及上述自動開閉閥14a、14b。又， 本形態例所示之上述使用端氣體供給路徑15係具備壓力調 整器17 ’其係用以將供給至氣體使用端之氣體的壓力調整 為預先設定之壓力。 上述壓力指示調節計13a、i3b係具備以閥之開度來調節 氣體流動之流路面積的閥部18a、18b、以及檢測二次側壓 力之壓力檢測部19a、i9b，利用該壓力指示調節計Ua、13b 所進行之壓力調整係根據由上述控制手段16所指示之壓力 與以壓力檢測部19a、19b所檢測之壓力所進行，閥部18a、 18b之閥開度係控制成以壓力檢測部19a、19b所檢測之壓 力與由控制手段16所指示之壓力為一致。 k氣體（、給系統a系統、B系統之各液化氣體容器1、 11b進行氣體供給之情況，係對壓力指示調節計n別 指：經：先設定之壓力，使自動開閉閥L _成為開啟 狀態’當停止氣體供給時，則自動開閉閥Ma、Hb成為關 、各液化氣體谷器Ha、llb之交換係於自動開閉闊 14a 14b為關閉狀態時進行’於液化氣體容器交換後，至 控制手段16打開自動開_ 14a、⑽為止，係科行氣體 供給，而成為待機狀態。 以下，根據圖2及圖3，說明使用本形態例所示之液化氣 體供給裝h對氣體㈣端連續地進行氣體供給之氣體供 給方法的帛1形關。 ’ 100138441 201229416 上述控制手段16係於兩氣體供給系統A系統、B系統均 成為待機狀態時(步驟51)，選擇氣體供給系統A系統、B 系統之任一者，例如打開氣體供給系統A系統之自動開閉 閥14a，開始從氣體供給系統A系統進行氣體供給（步驟 52)。此時，氣體供給系統B系統之自動開閉閥14b係繼續 關閉狀態，對氣體使用端之氣體供給係以氣體供給系統A 系統單獨進行。又，壓力指示調節計13a係由控制手段16 指示預先設定於控制手段16的基準設定壓力（例如 0.5MPa)，以壓力指示調節計13a之二次側的壓力成為基準 設定壓力〇.5MPa之方式，自動調整閥部18a之閥開度。 此外，上述控制手段16係以填充至預先設定之液化氣體 量的新液化氣體容器11a之重量作為100%，由重量計12a 之檢測值而監控液化氣體容器11a内之液化氣體量，以氣體 供給中之液化氣體容器11a相對於其之重量作為殘留氣體 率[%](步驟53)，至該殘留氣體率成為低於預先設定的第1 殘留氣體量設定值之值為止（例如至殘留氣體率成為30%以 下為止），重複上述步驟52與該步驟53，繼續以氣體供給 系統A系統單獨進行氣體供給。 若在步驟53中判斷液化氣體容器11a之殘留氣體率為 30%以下，則前進至步驟54，進行氣體供給系統A系統之 設定壓變更，由控制手段16對壓力指示調節計13a指示比 上述基準設定壓力（0.5MPa)更高的壓力，例如預先設定之 100138441 9 201229416 0.53MPa，作為第2設定壓力，自動調整閥部18a之閥開度， 俾使以壓力檢測部19a檢測之壓力調整閥13a的二次側壓力 成為新設定之第2設定壓力0.53MPa。同時地，從控制手段 16對氣體供給系統B系統之自動開閉閥14b送出開啟訊 號，打開自動開閉閥14b，開始以氣體供給系統B系統的 液化氣體容器lib所蒸發之氣體的供給，而成為氣體供給系 統A系統與氣體供給系統B系統並聯地進行氣體供給之狀 態。 此時，由於氣體供給系統B系統之壓力指示調節計13b 係被指示上述基準設定壓力〇.5MPa，故在剛開始氣體之並 聯供給之後，來自設定壓力（0.53MPa)高的氣體供給系統A 系統之氣體供給量較多。經由氣體供給之經過，液化氣體容 器11a之殘留氣體率從30%開始逐漸降低，隨著殘留氣體率 之降低，液化氣體之蒸發量亦降低，將壓力指示調節計13a 之二次側壓力維持於第2設定壓力0.53MPa則變得越來越 困難，當壓力指示調節計13a之閥部18a成為全開狀態後， 隨著液化氣體容器11a内之液化氣體的蒸發量降低，壓力調 整閥13a之二次側壓力慢慢降低，因此若僅從氣體供給系統 A系統，會變得無法對氣體使用端供給既定流量之氣體。如 此，當來自氣體供給系統A系統之氣體供給量降低，藉由 從氣體供給系統B系統並聯地進行氣體供給，可將既定流 量之氣體供給至氣體使用端。 100138441 10 201229416 當從兩氣體供給系統A系統、B系統並聯地進行供給時， 控制手段】6亦監控液化氣體容器Ua之殘留氣體率[%](步 ，55)’至液化氣體容器Ua之殘留氣體率成為低於預先設 疋之第2殘留氣體纽定值的值為止(例如至殘留氣體率成 為預先設定之3%以下為止），4複上述步驟54與步驟55， 繼續氣體之並聯供給。 右在步驟55中判斷液化氣體容器11a之殘留氣體率成為 3/〇以下則刖進至步驟56，關閉氣體供給系統a系統之自 動開閉㈤14a’停止來自氣體供給系統A系統之氣體供給， 刚進至步碌57，從氣體供給祕B系統單獨對氣體使用端 進行氣體供給，並且在氣體供給系統Λ系統中以步驟58進 仃液化机體容E lla之交換，移除殘留氣體率為3%以下之 ’夜化氣體各器lla，將新的液化氣體容器11a(殘留氣體率 100/〇)連接至氣體供給系統A系統。若在步驟％中判定新 的液化氣體容器11a之交換基準為合格，則前進至步驟60， 氣體供給系統A系統成為待機狀態。同時，被指示至壓力 指示調節計13a之壓力係回復至基準設定壓力〇5MPa。 當以氣體供給系統B系統單獨進行氣體供給時，係從控 制手段16對壓力指示調節計13b指示標準設定壓力 0.5MPa，在控制手段16中，以步驟61根據重量計12b之 檢測值而監控液化氣體容器lib之殘留氣體率。若在步驟 61中判斷液化氣體容器Ub之殘留氣體率為3〇%以下，則 100138441 11 201229416 前進至步驟62 ’將氣體供給系統^系統之壓力指示調節計 13b的和不Μ力變更為第2設定壓力㈣紙，並且打開氣 體供給系統A系統之自動開關⑷， ”201229416 VI. Description of the invention: [Technical field to which the invention pertains] _ Shuming system relates to a liquefied gas supply device and method, and more particularly to supplying a liquefied gas filled in a plurality of liquefied gas containers to a gas A liquefied gas supply device and method at the use end. [Prior Art] As a method of supplying a liquid body body for evaporating a liquid body of a plurality of liquid domain container tissues to be supplied to a gas (4), it is known to provide a plurality of liquefied gas containers (bulk) Pressurizing means for increasing the pressure in the container), and monitoring the pressure in each liquefied gas container, supplying gas from the first liquefied gas gas having a relatively high pressure, and when the pressure in the i-th liquefied gas container is lowered, (4) The supply is switched to the second liquefied gas container, and the first liquefied gas container whose pressure has been lowered is exchanged, whereby the gas supply to the gas use end is continuously performed. (Patent Document U) [Patent Document 1] Japanese Patent Laid-Open Publication No. 2007-231982 (Draft of the Invention) (Problems to be Solved by the Invention) However, as in Patent Document 1, when it is near normal temperature In the case of LNG with a high vapor pressure, most of the LNG in the liquefied gas container can be evaporated and supplied, but when the vapor pressure is low near normal temperature (for example, liquefied ammonia), the amount of liquefied gas remaining in the liquefied gas container is 30% of the container volume 100138441 201229416 The following 'the evaporation amount is immediately reduced, it is difficult to supply the gas with the flow required by the gas end. Therefore, when the flow to the gas use end is more: the liquefied gas capacity When the amount of liquefied gas remaining in the container is about the diameter of the container, the liquefied gas container that must be switched to supply the gas must be switched. The amount of residual gas is reduced. The amount of gas remaining in the line is limited to the supply of gas at a given flow rate ^ ' This /, π..., and the brother knife use liquid ammonia filled in the liquefied gas container, which not only reduces the utilization efficiency of the liquefied ammonia, but also the liquefied gas container is short. The problem of the liquefied gas container filled with liquefied ammonia is heated to a high temperature to promote the evaporation of liquefied ammonia, thereby supplying ammonia at a predetermined flow rate and making most of the liquefied gas container _ liquefied ammonia Evaporation, = special heating equipment used to heat large large containers to high temperatures, and the problem of equipment cost and running cost is greatly increased. Therefore, the object of the present invention is to provide a _ liquefied gas supply device and method 'can be simple The device configuration and sequence increase the utilization efficiency of the secret gas filled in the liquefied gas (especially the liquefied gas having a low I pressure such as liquefied ammonia at normal temperature). (Means for solving the problem) In order to achieve the above object, The gas supply device of the present invention is characterized in that the liquefied gas filled in the plurality of liquefied gas containers is evaporated and used for the gas, and the liquefied gas container is connected to a plurality of (four) supplies (four); the liquefied gas amount detecting means , respectively, to detect the amount of liquefied gas in each liquefied gas container of 100138441 201229416; pressure adjustment means Do not set the pressure on each gas supply system to read the second reading; the gas supply blocks the hand system; 7 u in each gas supply, m and the use end gas supply path system to supply the brittle flow from the complex oxygen supply secret And supplying to the gas use end; each gas supply system is provided with a control means for controlling the pressure of the secondary side of the pressure regulating means in the liquefied gas container detected by the liquefied milk straight detecting means Any one of the plurality of predetermined im δ recognizing pressures, and the above-described gas supply blocking means for the gas supply system and the gas supply blocking means provided in the other gas supply system respectively perform opening and closing control. In the liquefied gas supply device of the present invention, the pressure adjustment means (4) is Wei, and the pressure tank is closed to adjust the flow path area through which the regulating gas flows, thereby adjusting the pressure on the secondary side. In the ith configuration of the liquefied gas supply method of the present invention, the liquefied gas supply U is used to continuously supply the gas to the gas use end, and the control means is opened to be provided in the first gas supply, When the gas supply from the first liquefied gas container is set to the first set pressure of the first pressure adjusting means, the first liquefied gas is used as the first liquefied gas. When the amount of liquefied gas in the first liquefied gas container detected by the amount detecting means is lower than a preset value of the first residual gas amount set in advance, 'the secondary side setting pressure of the first pressure adjusting means is set to be higher than the reference set pressure. The high pressure is applied, and the second gas supply blocking means provided in the second supply system of the second supply unit is opened in parallel with the second gas supply system and the second gas supply system. Further, in the second configuration of the liquefied gas supply method of the present invention, the liquefied gas supply device using the pressure adjustment valve as the pressure adjustment means, and the gas supply end is continuously supplied to the gas supply end, wherein the control means is When the ith gas supply blocking means provided in the first gas supply system is turned on and the secondary pressure setting means of the first pressure adjusting means is set to the reference set pressure, and the gas is supplied from the first liquefied gas container, When the amount of the liquefied gas in the first liquefied gas container detected by the first liquefied gas amount detecting means is lower than a predetermined first residual gas amount setting value, the secondary side pressure of the first pressure adjusting means is set to be higher than the above The reference pressure is set to a higher pressure, and the second gas supply blocking means "provided in the second gas supply system" is supplied in parallel from both the first gas supply system and the second gas supply system. Further, the liquefied gas supply method of the present invention is characterized in that the amount of liquefied gas in the first liquefied gas container detected by the first liquefied gas amount detecting means is set lower than the first residual gas amount. When the second residual gas amount setting value of the liquefied gas amount is small, the first gas supply blocking means is turned off, the gas supply from the first gas supply system is stopped, and the gas supply from the second gas supply system is switched. (Effect of the Invention) According to the present invention, a plurality of gas supply systems can be switched in accordance with the amount of liquefied gas in the liquefied gas volume 100138441 6 201229416 connected to each gas supply system, whereby the gas supply end is continuously supplied with gas. By using a control means that operates according to the amount of liquefied gas detected by the liquefied gas amount detecting means, the pressure of the second means of the adjustment means is controlled, or the pressure is hardly called a fully open state, whereby the liquefaction can be performed. The liquefied gas of the liquefied gas volume (9) having a small amount of gas is supplied to the gas use end. Thereby, the utilization efficiency of the liquefied gas can be improved, and the exchange cycle of the liquefied gas container can be prolonged. [Embodiment] First, as shown by W1, the liquefied gas supply device shown in the present embodiment is provided with a gas supply of a plurality of (two in the present embodiment) systems. System A system, B system; liquefied gas container hill, 1 lb, respectively connected to each gas supply system a system, B system; weight gauges 12a, 12b' are used to separately detect liquefied gases of each liquefied gas container Ua, in = The volumetric liquid volume detecting means; the pressure indicating regulators (PIC) 13a, 13b' are used as pressure adjustments respectively set in the respective gas supply system a system, B system 'and the secondary side pressure is adjusted to the indicated pressure Hand/segment; automatic driving 14a, 14b, respectively, are provided in each gas supply system a, secret, Bm as a domain supply, stop shouting supply blocking means; use the end gas supply path 15, to make each gas The gas supplied from the supply system A system and the B system is merged and supplied to the gas, and the control unit 16 is based on the above-mentioned weight, and the residual amount of the liquid body in the liquefied gas volume 11a and lib is checked by m. To control 1,001,384,417,201,229,416 pressure force indicator controller 13a, 13b and the automatic on-off valve 14a, 14b. Further, the use end gas supply path 15 shown in the present embodiment is provided with a pressure regulator 17' for adjusting the pressure of the gas supplied to the gas use end to a predetermined pressure. The pressure indicating regulators 13a and i3b include valve portions 18a and 18b for adjusting the flow path area of the gas flow by the opening degree of the valve, and pressure detecting portions 19a and i9b for detecting the secondary side pressure, and the pressure indicating unit is used to indicate the regulator. The pressure adjustment by Ua and 13b is performed based on the pressure indicated by the above-described control means 16 and the pressure detected by the pressure detecting portions 19a, 19b, and the valve opening degree of the valve portions 18a, 18b is controlled to be the pressure detecting portion. The pressure detected by 19a, 19b is consistent with the pressure indicated by control means 16. k gas (when the gas supply to the liquefied gas containers 1 and 11b of the system a system and the B system is performed, the pressure indication adjuster n is: the pressure set first: the automatic opening and closing valve L _ is turned on. When the gas supply is stopped, the automatic opening and closing valves Ma and Hb are turned off, and the exchange of the liquefied gas grains Ha and llb is performed when the automatic opening and closing width 14a 14b is in the closed state. The means 16 opens the automatic opening _ 14a, (10), and supplies the gas to the standby state. Hereinafter, the liquefied gas supply device h shown in the present embodiment will be continuously used for the gas (four) end according to Figs. 2 and 3 . The gas supply method of the gas supply is 帛1-shaped. '100138441 201229416 The control means 16 is a system in which both the gas supply system A system and the B system are in a standby state (step 51), and the gas supply system A system and the B system are selected. Any of these, for example, the automatic opening and closing valve 14a of the gas supply system A system is opened, and gas supply from the gas supply system A system is started (step 52). At this time, the gas is supplied. The automatic opening and closing valve 14b of the system B system is continuously closed, and the gas supply to the gas use end is separately performed by the gas supply system A. Further, the pressure indicating regulator 13a is preset by the control means 16 to the control means 16 The reference setting pressure (for example, 0.5 MPa) automatically adjusts the valve opening degree of the valve portion 18a so that the pressure on the secondary side of the pressure indicating regulator 13a becomes the reference setting pressure 〇.5 MPa. The weight of the new liquefied gas container 11a filled in the predetermined amount of the liquefied gas is set to 100%, and the amount of liquefied gas in the liquefied gas container 11a is monitored by the detected value of the weight 12a, and the liquefied gas container 11a in the gas supply is relative to The weight is the residual gas rate [%] (step 53), and the residual gas rate is lower than a predetermined value of the first residual gas amount set value (for example, until the residual gas rate is 30% or less). In the above step 52 and the step 53, the gas supply is continuously performed by the gas supply system A. If the liquefied gas container 11a is judged in the step 53 When the gas retention rate is 30% or less, the process proceeds to step 54 where the set pressure of the gas supply system A system is changed, and the pressure indicating regulator 13a is instructed by the control means 16 to have a higher pressure than the reference set pressure (0.5 MPa). For example, 100138441 9 201229416 0.53 MPa, which is set in advance, automatically adjusts the valve opening degree of the valve portion 18a as the second set pressure, and causes the secondary side pressure of the pressure regulating valve 13a detected by the pressure detecting portion 19a to become the second set new. The set pressure is 0.53 MPa. Simultaneously, the control unit 16 sends an opening signal to the automatic opening and closing valve 14b of the gas supply system B system, opens the automatic opening and closing valve 14b, and starts the gas evaporated by the liquefied gas container lib of the gas supply system B system. The supply is performed in a state in which the gas supply system A system and the gas supply system B system perform gas supply in parallel. At this time, since the pressure indicating regulator 13b of the gas supply system B system is instructed to the above-mentioned reference set pressure 〇.5 MPa, the gas supply system A system from the set pressure (0.53 MPa) is high immediately after the parallel supply of the gas is started. The amount of gas supplied is large. After the gas supply, the residual gas rate of the liquefied gas container 11a gradually decreases from 30%, and as the residual gas rate decreases, the evaporation amount of the liquefied gas also decreases, and the pressure on the secondary side of the pressure indicating regulator 13a is maintained at When the second set pressure is 0.53 MPa, it becomes more and more difficult. When the valve portion 18a of the pressure indicating regulator 13a is fully opened, the amount of evaporation of the liquefied gas in the liquefied gas container 11a is lowered, and the pressure regulating valve 13a is two. Since the secondary side pressure is gradually lowered, if only the gas supply system A system is used, it becomes impossible to supply a gas of a predetermined flow rate to the gas use end. Thus, when the gas supply amount from the gas supply system A system is lowered, by supplying the gas in parallel from the gas supply system B system, a predetermined amount of gas can be supplied to the gas use end. 100138441 10 201229416 When the two gas supply systems A and B are supplied in parallel, the control means 6 also monitors the residual gas rate [%] (step, 55) of the liquefied gas container Ua to the residue of the liquefied gas container Ua. When the gas rate is lower than the value of the second residual gas constant value set in advance (for example, until the residual gas rate is 3% or less of the preset value), the above steps 54 and 55 are repeated to continue the parallel supply of the gas. When it is judged in the step 55 that the residual gas rate of the liquefied gas container 11a becomes 3/〇 or less, the process proceeds to step 56, and the automatic opening and closing of the gas supply system a system is turned off (5) 14a' to stop the gas supply from the gas supply system A, just entering At the step 57, the gas supply end is separately supplied with gas from the gas supply system B, and in the gas supply system Λ system, the liquefaction machine body volume E lla is exchanged in step 58, and the residual gas rate is 3%. The following "night gas unit lla" connects the new liquefied gas container 11a (residual gas rate 100 / 〇) to the gas supply system A system. When it is determined in step % that the exchange standard of the new liquefied gas container 11a is acceptable, the process proceeds to step 60, and the gas supply system A system is in the standby state. At the same time, the pressure indicated to the pressure indicating regulator 13a is returned to the reference set pressure 〇 5 MPa. When the gas supply is separately performed by the gas supply system B, the pressure indicating regulator 13b is instructed from the control means 16 to indicate a standard set pressure of 0.5 MPa, and in the control means 16, the liquefaction is monitored by the step 61 based on the detected value of the weight 12b. The residual gas rate of the gas container lib. When it is judged in step 61 that the residual gas rate of the liquefied gas container Ub is 3% or less, 100138441 11 201229416 proceeds to step 62', and the pressure indication regulator 13b of the gas supply system is changed to the second. Set the pressure (4) paper and open the automatic switch (4) of the gas supply system A system,"
系統與氣體供給系統b系統並聯地供给氣體之tr糸統A 若在步驟63中叫夜化氣體容讀之«。 3%以下，則以步驟Μ將氣體供給系统B之殘離氣體率成為 Mb關閉，前進至步驟&，從氣體供〜糸統之自動開閉闊 氣體使用端進行氣體供給，並且於氣體^ A系統單獨對 以步驟66進行液化氣體容器llb之交/給系統B系統中 液化氣體容器llb之交換基準合格二若於步驟67判定 體供給㈣B系統麵賴狀態。Μ錢步驟68 ’氣The system supplies the gas system in parallel with the gas supply system b. If it is called the night gas reading in step 63. When the amount is 3% or less, the residual gas rate of the gas supply system B is changed to Mb by the step ,, and the process proceeds to the step & the gas supply is performed from the gas supply and discharge system, and the gas is supplied to the gas. The system separately passes the exchange standard of the liquefied gas container llb in the delivery/feed system B system of the liquefied gas container llb in step 66. If the system supplies the (four) B system in the step-by-step state in step 67. Saving money step 68 ’ gas
若步驟65中之來自氣體供給系統八系統 開始，則回復至上述步驟52，當氣體供给^獨礼體i、給 述步驟53前進至步驟54時，在步驟68系、”充A系統從上 氣體供給线B祕係從待機㈣#巾成為待機狀態之 態。以下，藉由重㈣等之各步驟，至氣體供給狀 系統、B系統對氣體使㈣連續進行氣#^*1體供給系统A 圖3係分別顯示如此進行氣體供給時，> 如日數經過)之液化氣體容器Ua、llb的=時間經過(例 (圖3(a))、氣體供給系統A系統、B系U乳體率之變化 13a、13b的二姻力之氣體供給愿力的變化 體供給系統A系統、B系統之供给$ ())氣 …氣體的流量變化（圖 100138441 12 201229416 3(c))、壓力指示調節計13a、13b中之閥部18a、18b的閥開 度之變化（圖3(d))，表示圖2中自步驟52起之各狀態的變 化。 從開始起之短暫期間内，係從氣體供給系統A系統單獨 進行氣體供給，故雖因液化氣體之蒸發而使液化氣體容器 11a的殘留氣體率逐漸降低（圖3(a))，但氣體供給系統A系 統之供給壓力係維持為基準設定壓力0.5MPa，待機中之氣 體供給系統B系統之供給壓力為0(零)（圖3(b))，氣體供給 系統A系統之氣體流量係氣體使用端所要求之 300L/min(0°C，1大氣壓換算值），而氣體供給系統B系統之 氣體流量為〇(零)(圖3(c))。又，氣體供給系統A系統之壓 力指示調節計13a中的閥部18a之開度係隨著因液化氣體容 器11a的殘留氣體率之降低所造成之蒸發量減少而逐漸變 大，氣體供給系統B系統之壓力調整閥13b之閥部18b的 開度為〇(零)(圖3(d))。 當時間經過而液化氣體容器11a之殘留氣體率成為30% 以下（經過時間7)，氣體供給系統A系統之設定壓力從0.5 MPa變更為0.53 MPa，壓力指示調節計13a中之閥部18a 的開度變大，氣體供給系統A系統之供給壓力上升，且經 由打開自動開閉閥14b而開始在氣體供給系統B系統之液 化氣體容器lib中蒸發的氣體之供給，成為並聯供給狀態 (步驟54)。 100138441 13 201229416 於此並聯供給狀態中，藉由液化氣體之蒸發，兩液化氣體 容器lla、lib之殘留氣體率一起降低》氣體供給系統A系 統之供給壓力雖因打開壓力指示調節計13a中之閥部18a而 暫時地上升至0.53 MPa，但隨著液化氣體容器11a之殘留 氣體率的降低所造成之蒸發量減少，即便壓力指示調節計 13a中之閥部18a的開度為全開狀態（開度100%)，供給壓力 仍慢慢降低。另一方面，氣體供給系統B系統之供給壓力 係藉由壓力指示調節計13b而維持為基準設定壓力0.5 MPa。隨著氣體供給系統A系統之液化氣體蒸發量減少，氣 體供給系統A系統之氣體流量逐漸減少，則氣體供給系統B 系統之氣體流量逐漸增加，俾使氣體供給系統A系統之氣 體流量與氣體供給系統B系統之氣體流量的和成為 300L/min。 若因並聯供給狀態下之時間經過而使液化氣體容器11 a 之殘留氣體率成為3%以下（經過時間12)，則氣體供給系統 A系統之自動開閉閥14a關閉，停止來自氣體供給系統A 系統之氣體供給(步驟56)，成為來自氣體供給系統B系統 之單獨供給(步驟57)。在從來自氣體供給系統B系統之單 獨供給至液化氣體容器lib之殘留氣體率成為30%以下為 止之期間，交換氣體供給系統A系統之液化氣體容器11a， 液化氣體容器11a之殘留氣體率成為100%而成為待機狀態 (經過時間14，步驟60)。 100138441 14 201229416 液化氣趙容器llb之殘留氣體率成為3〇%以下， 則成為.乳體供給系統A系統與氣體供给 Μ 4.Κ ^ ^ , 斤、A Β系統之並聯 供給狀態（經過時間18，步驟62)，當夜化々^ 殘留氣體率成為3%以下，則成為氣體供給:『合：llb : 獨供給(經過時間23，步驟65)。在以圏，、先八系、洗之單 2所示之順序連續 進订軋體供給之期間，液化氣體容器lla 圭、5粬糾，λ / a、Ub之殘留氣體 率氧禮供、，、口糸統A系統、B系統之供认 、给壓力、氣體供給 系統A系統、B系統之流量及壓力指 ，郎計13a、13b中 之閥部18a、18b之開度的開度係如圖3 n β Λ J所示，因時間之經 過而以氣體供給系統A系統、B系統交石本 益U·油上尸細 及重複相同的變化’ 猎此對氣體制端連續供給壓力被控· G5Mpa、流量被 控制為瓶/min之氣體，液化氣體容器Ua、llb内之液化 氣體被利用，直到殘留氣體率成為3%為止。 」次，根據圖4及圖5,說明氣體供給方法之第2形態例。 叹定於上述控料段I6之基本料，係設定為與上述第^ 形態例中圖2所示順序相同的順序。 上述&制手段16係當兩氣體供給系統A系統、B系統均 成為待機狀態時(步驟71)，選擇氣體供給祕A系統、B 系、先之者’例如打開氣體供给系統A系統之自動開閉閥 14a開始《氣體供給系統A系統進行氣體供給(步驟72)。If the gas supply system eight system starts in step 65, then return to the above step 52, when the gas supply unit i, the step 53 is advanced to step 54, in step 68, "filling the system from above" The gas supply line B is in a standby state from the standby (four) # towel. Hereinafter, the gas supply system and the B system continuously perform the gas supply system by the steps of the weight (four) and the like. A Fig. 3 shows the time elapse of the liquefied gas containers Ua and 11b when the gas supply is performed as described above (for example, the number of days passes) (example (Fig. 3 (a)), gas supply system A system, B system U milk The change of the body rate 13a, 13b, the power supply of the two-grain force, the supply of the system A system, the supply of the B system, the supply of the gas (the gas flow) (Fig. 100138441 12 201229416 3(c)), pressure The change in the valve opening degree of the valve portions 18a, 18b in the regulators 13a, 13b (Fig. 3(d)) is indicated, and the change of each state from the step 52 in Fig. 2 is shown. The gas supply is separately performed from the gas supply system A system, so that the evaporation of the liquefied gas is caused. The residual gas rate of the liquefied gas container 11a gradually decreases (Fig. 3(a)), but the supply pressure of the gas supply system A system is maintained at the reference set pressure of 0.5 MPa, and the supply pressure of the gas supply system B system during standby is 0 ( Zero) (Fig. 3(b)), the gas flow rate of the gas supply system A system is 300 L/min (0 ° C, 1 atmosphere conversion value) required for the gas use end, and the gas flow rate of the gas supply system B system is 〇 (Z) (Fig. 3(c)). Further, the pressure of the gas supply system A system indicates that the opening degree of the valve portion 18a in the regulator 13a is caused by the decrease in the residual gas rate due to the liquefied gas container 11a. The amount of opening of the valve portion 18b of the pressure regulating valve 13b of the gas supply system B system is 〇(zero) (Fig. 3(d)). When the time passes, the residual gas rate of the liquefied gas container 11a becomes 30% or less (after time 7), the set pressure of the gas supply system A system is changed from 0.5 MPa to 0.53 MPa, the opening degree of the valve portion 18a in the pressure indicating regulator 13a becomes large, and the supply pressure of the gas supply system A system rises. And starting by opening the automatic opening and closing valve 14b The supply of the gas evaporated in the liquefied gas container lib of the gas supply system B system is in a parallel supply state (step 54). 100138441 13 201229416 In the parallel supply state, the two liquefied gas containers 11a, by evaporation of the liquefied gas, The residual gas rate of lib is lowered together. The supply pressure of the gas supply system A system is temporarily raised to 0.53 MPa by opening the valve portion 18a in the pressure indicating regulator 13a, but the residual gas rate decreases with the liquefied gas container 11a. The amount of evaporation caused is reduced, and even if the opening degree of the valve portion 18a in the pressure indicating regulator 13a is in the fully open state (opening degree 100%), the supply pressure is gradually lowered. On the other hand, the supply pressure of the gas supply system B system is maintained at the reference set pressure of 0.5 MPa by the pressure indicating regulator 13b. As the amount of liquefied gas vaporization in the gas supply system A system decreases, the gas flow rate of the gas supply system A system gradually decreases, and the gas flow rate of the gas supply system B system gradually increases, so that the gas flow rate and gas supply of the gas supply system A system are increased. The sum of the gas flows of the system B system became 300 L/min. When the residual gas rate of the liquefied gas container 11a is 3% or less (elapsed time 12) due to the passage of time in the parallel supply state, the automatic opening and closing valve 14a of the gas supply system A system is closed, and the system from the gas supply system A is stopped. The gas supply (step 56) becomes a separate supply from the gas supply system B system (step 57). When the residual gas rate from the supply of the gas supply system B to the liquefied gas container lib is 30% or less, the liquefied gas container 11a of the exchange gas supply system A system has a residual gas rate of 100 in the liquefied gas container 11a. % becomes the standby state (elapse time 14, step 60). 100138441 14 201229416 The residual gas rate of the liquefied gas Zhao container llb is 3 〇% or less, and becomes the parallel supply state of the milk supply system A system and the gas supply Μ 4. Κ ^ ^ , jin, A Β system (elapse time 18) In step 62), when the residual gas ratio of the night 々^ is 3% or less, the gas supply is "combined: llb: supply alone (time 23, step 65). In the order of continuously feeding the rolling stock in the order indicated by 圏, 八八系,洗单单2, the liquefied gas container lla gui, 5 粬 ,, λ / a, Ub residual gas rate oxygen ritual, , the venting system A, the B system confession, the pressure, the gas supply system A system, the B system flow and pressure, the opening of the valve parts 18a, 18b in the lang meter 13a, 13b is shown in the figure 3 n β Λ J shows that, due to the passage of time, the gas supply system A system, the B system, the stone, the U, the oil, the corpse and the repetition of the same change, and the continuous supply pressure to the gas system is controlled. G5Mpa The flow rate is controlled to be a bottle/min of gas, and the liquefied gas in the liquefied gas containers Ua and 11b is used until the residual gas rate becomes 3%. Next, a second embodiment of the gas supply method will be described with reference to Figs. 4 and 5 . The basic material of the above-mentioned control section I6 is set to be in the same order as the sequence shown in Fig. 2 in the above-mentioned second embodiment. In the above-described & means 16, when both the gas supply system A system and the B system are in the standby state (step 71), the gas supply system A, the B system, and the first one are selected, for example, the system of the gas supply system A is turned on automatically. The on-off valve 14a starts the gas supply system A system to supply gas (step 72).
，A體供給系統B系統之自動開閉閥14b係繼續關閉 狀I、’對氣體使用端之氣體供给係單獨以氣體供給系統A 100138441 15 201229416 系、，先進行χ ’壓力指*調節計1Sa係由控制手段16'指示 預先設定於控制手段Μ的基準設定壓力（例如g 5嫩），闊 部收之閥開度係自動調整’俾使壓力指示調節計Ua之二 次側壓力成為基準設定壓力〇.5 Mpa。 此外上述控制手段10係以填充預先設定之液化氣體量 的新液化氣體容器lla之重量為i⑼％，從重量計以之檢 測值監控液化氣齡n、内之液化氣體量，將氣體供給中 之液化氣體谷器ila相對於其之重量作為殘留氣體率[%](步 驟73) ’重複上述步驟72與此步驟73，繼續從氣體 統统單獨進行氣體供給，直至該殘留氣體率成為低於 預先設^之第i前氣體量設定㈣值為止，例如殘留氣體 率成為30%以下為止。 若步驟73中判斷液化氣體容器⑴之殘留氣體率成為 30%以下，則前進至步驟74，從控制手段16對壓力指示調 節計i3a輸出使閥部18a為全開狀態之指示，使闕部^成 為全開狀態1時地，從控制手段16對氣體供給系統B系 統之自動開閉閥Mb送出開啟訊號，打開自動開閉閱咐 開始以氣體供給系統B系統之液化氣體容器m所蒸發的 氣體之供給，絲氣H供給魏A魏與氣體供給系統B 系統並聯地進行氣體供給之狀態。 此時，由於氣體供給系統B系統之壓力指示調節計Ub 係被指示上述鮮設定勤G.5MPa，故錢體之並聯供給 100138441 16 201229416 剛開始後，來自閥部18a為全開狀態之氣體供給系統A系 統的氣體供給量變多。因氣體供給之經過，液化氣體容器 11a之殘留氣體率從30%逐漸降低，則即便閥部18a為全開 狀態，壓力指示調節計13a之二次側壓力仍逐漸降低，若僅 從氣體供給系統A系統，則無法對氣體使用端供給既定流 量之氣體。如此，在來自氣體供給系統A系統之氣體供給 量降低時，從氣體供給系統B系統並聯地進行氣體供給， 藉此可對氣體使用端供給既定流量之氣體。 在從兩氣體供給系統A系統、B系統並聯供給時，控制 手段16亦監控液化氣體容器11a之殘留氣體率[%](步驟 75)，重複上述步驟74與步驟75而繼續進行氣體之並聯供 給，直至液化氣體容器1 la之殘留氣體率成為低於預先設定 之第2殘留氣體量設定值的值為止，例如至殘留氣體率成為 預先設定之3%以下為止。 若在步驟75中判斷液化氣體容器11a之殘留氣體率成為 3%以下，則前進至步驟76，氣體供給系統A系統之自動開 閉閥14a被關閉，來自氣體供給系統A系統之氣體供給停 止，前進至步驟77而從氣體供給系統B系統單獨對氣體使 用端進行氣體供給，並且，在氣體供給系統A系統中係以 步驟78進行液化氣體容器11a之交換，移除殘留氣體率成 為3%以下之液化氣體容器11a，將新的液化氣體容器11a(殘 留氣體率100%)連接至氣體供給系統A系統。若於步驟79 100138441 17 201229416 中判定新的液化氣體容器lla之交換基準合格，則前進至步 驟80，氣體供給系統A系統成為待機狀態。同時地，對壓 力指示調節計13a指示基準設定壓力0.5MPa。 單獨以氣體供給系統B系統進行氣體供給時，係由控制 手段16對壓力指示調節計13b指示基準設定壓力0.5MPa， 控制手段16係以步驟81根據重量計12b之檢測值而監控液 化氣體容器lib之殘留氣體率。若於步驟81中判斷液化氣 體容器lib之殘留氣體率為30%以下，則前進至步驟82， 從控制手段16對氣體供給系統B系統之壓力指示調節計 13b輸出使閥部18b為全開狀態之指示，使閥部18b成為全 開狀態，並且打開氣體供給系統A系統之自動開閉閥14a， 成為氣體供給系統A系統與氣體供給系統B系統並聯地進 行氣體供給之狀態。 若於步驟83中判斷液化氣體容器lib之殘留氣體率成為 3%以下，則以步驟84將氣體供給系統B系統之自動開閉閥 14b關閉，前進至步驟85，從氣體供給系統A系統單獨地 對氣體使用端進行氣體供給，並且，在氣體供給系統B系 統則以步驟86進行液化氣體容器lib之交換，若於步驟87 中判定液化氣體容器lib之交換基準合格，則前進至步驟 88，氣體供給系統B系統成為待機狀態。 若步驟85中之來自氣體供給系統A系統的單獨之氣體供 給開始，則回復至上述步驟72，於步驟88中已成為待機狀 100138441 18 201229416 癌之氣體供給纽B $統係在氣體供給纽A系統從上述 步驟73剛進至步驟74時，從待機狀態切換至氣體供給狀 匕、以下，藉由重複該等各步驟，而從兩氣體供給系統a 系統、B系統對氣體使用端連續進行氣體供給。 圖5係分別顯示如此進行氣體供給時，伴隨時間經過(例 如日數經過)之液化氣體容器lla、llb的殘留氣體率之變化 (圖5(a))、氣體供給系统a系統、B系統之壓力指示調節計 13a 13b的一-人側壓力之氣體供給壓力的變化（圖5(b))、氣 體供給系、統A系統、B系統之供給氣體的流量變化（圖 53(c))、壓力指不調節計13a、13b中之間部n 1肋的閥 開度之變化(圖5(d))，表示圖4中自步驟72起之各狀態的 變化。 " 從開始起之短暫期間内，係從氣體供給系統A系統單獨 、亍氣禮A、、’、σ故雖因液化氣體之蒸發而使液化氣體容器 Ua的殘留氣體率逐漸降低(圖5⑻），但氣體供給系統a系 統之供給壓力係維持為基準設定壓力0.5MPa，待機中之氣 體供給系統β系統之供給愿力為〇(零)(圖5(b))，氣體供給 系統A系統之氣體流量係氣體使用端所要求之 300L/mm((TC，i大氣屋換算值），而氣體供給系統^系統之 氣體流量為0(零)(圖5(e))。又，氣體供給系統A系統之堡 力指示調節計13a中的閥部18仏開度係隨著因液化氣體容 器…的殘留氣體率之降低所造成之蒸發量減少而逐漸變 100138441 201229416 大，氣體供給系統B系統之壓力調整閥13b之閥部18b的 開度為〇(零)(圖5(d))。 當時間經過而液化氣體容器11a之殘留氣體率成為30% 以下（經過時間7)，氣體供給系統A系統之壓力指示調節計 13a中之閥部18a成為開度100%(全開狀態），且藉由使自動 開閉閥14b打開，開始以氣體供給系統B系統之液化氣體 容器lib所蒸發的氣體供給，成為並聯供給狀態（步驟74)。 此時，氣體供給系統A系統之供給壓力係藉由閥部18a成 為全開狀態而暫時上升至基準設定壓力0.5MPa以上。 於此並聯供給狀態中，藉由液化氣體之蒸發，兩液化氣體 容器11a、lib之殘留氣體率一起降低。氣體供給系統A系 統之供給壓力雖因閥部18a成為全開狀態而在剛開始並聯 供給後成為0.5 MPa以上之壓力，但隨著液化氣體容器11a 之殘留氣體率的降低所造成之蒸發量減少，供給壓力慢慢降 低。另一方面，氣體供給系統B系統之供給壓力係藉由壓 力指示調節計13b而維持為基準設定壓力0.5 MPa。隨著氣 體供給系統A系統之液化氣體蒸發量減少，氣體供給系統A 系統之氣體流量逐漸減少，.則氣體供給系統B系統之氣體 流量逐漸增加，俾使氣體供給系統A系統之氣體流量與氣 體供給系統B系統之氣體流量的和成為300L/min。 若因並聯供給狀態下之時間經過而使液化氣體容器11a 之殘留氣體率成為3%以下（經過時間12)，則氣體供給系統 100138441 20 201229416 A系統之自動開閉閥14a關閉，停止來自氣體供給系統A 系統之氣體供給(步驟76)，成為來自氣體供給系統B系統 之單獨供給(步驟77)。在從來自氣體供給系統B系統之單 獨供給至液化氣體容器lib之殘留氣體率成為30%以下為 止之期間，交換氣體供給系統A系統之液化氣體容器11a， 液化氣體容器11a之殘留氣體率成為100%而成為待機狀態 (經過時間14，步驟80)。 之後，若液化氣體容器lib之殘留氣體率成為30%以下， 則成為氣體供給系統A系統與氣體供給系統B系統之並聯 供給狀態（經過時間18，步驟82)，當液化氣體容器lib之 殘留氣體率成為3%以下，則成為氣體供給系統A系統之單 獨供給(經過時間23，步驟85)。在以圖4所示之順序連續 進行氣體供給之期間，液化氣體容器11a、lib之殘留氣體 率、氣體供給系統A系統、B系統之供給壓力、氣體供給 系統A系統、B系統之流量及壓力指示調節計13a、13b中 之閥部18a、18b之閥的開度係如圖5所示，因時間之經過 而以氣體供給系統A系統、B系統交互重複相同的變化， 藉此對氣體使用端連續供給流量被控制為300L/min之氣 體，液化氣體容器11a、lib内之液化氣體被利用，直到殘 留氣體率成為3%為止。 此第2形態例所示之氣體供給方法中，係於並聯供給剛開 始後，使壓力指示調節計13a、13b之閥部18a、18b中的任 100138441 21 201229416 一者成為全開狀態，藉此暫時地提升使用端氣體供給路徑 15的壓力，若如圖1所示之液化氣體供給裝置般，於氣體 供給系統A系統、B系統匯流之使用端氣體供給路徑15中 設置壓力調整器17，將供給至氣體使用端之氣體的壓力調 整為較上述基準設定壓力0.5 Μ P a更低的氣體使用端所需要 之壓力，藉此可防止供給氣體之壓力變動或流量變動。另 外，於氣體供給方法之第1形態例中，亦可先於使用端氣體 路徑15中設置壓力調整器17，而當此種壓力調整器被組入 至氣體使用端之設備之情況，可省略使用端氣體供給路徑 15之壓力調整器17。 顯示本發明方法之第1形態例的圖2與顯示本發明方法之 第2形態例的圖4所示之流程圖中，當殘留氣體率成為3% 以下時，係自動地將氣體供給從並聯切換至單獨狀態，並進 行液化氣體容器之交換，但亦可在殘留氣體率成為3 0 %以下 並進行並聯供給時，例如輸出警報等，人為地將氣體供給從 並聯切換至單獨狀態，並且進行液化氣體容器之交換。 又，以上係舉出氣體供給系統為2系統之例進行說明，在 氣體供給系統為3系統以上之情況亦可同樣地進行，例如可 於第1系統之氣體供給中，使第2系統成為第1待機狀態、 第3系統成為第2待機狀態，當切換為來自第2系統之氣體 供給時，使第3系統成為第1待機狀態、第1系統成為第2 待機狀態，藉此可延長交換液化氣體容器之時間，而可提升 100138441 22 201229416 液化氣體供給裝參A L長丨生此外，當氣體供給系統為3 系統以上之情^，<使殘留氣體率低的第1系統成為第1 氣體供給狀態、/殘0體率高的第2系統成為第2氣體供給 -狀態、第3系統以卞成為待機狀態，而於第1系統進行容器 交換並成為待機狀態時’使殘留氣體率低的第2系統成為第 1氣體供給狀態、朗氣體率高的第3純成為第2氣體供 給狀態，可藉由如此設定而供給大量的氣體。 另外’液化氣體之種類並無特別限定，檢測液化氣體容器 内之液化氣體量的液化氣體量檢測手段並不限於重量計，只 要可檢魏化氣體容器内之液化氣體量，可使用任意者，例 如亦y使用各種液面計。又，亦可使用壓力計而間接地檢測 夜化氣體#器内之液化氣體量。此外’相對於基準設定壓力 之第2 q壓力只要根據氣體之麵與供給壓力、供給量等 /、 定P 了 要设定為可進行並聯供給之壓力即可。 用、刀換供給狀態之殘留氣體率之數值亦可根據氣體之 種=供給壓力、供給量料件而適當設定。此外，液化氣 體容器亦可在法令(一般而言為日本高壓氣體保安規則第60 條)谷許之乾圍内’附加對該液化氣體容器進行加熱而促進 液化氣體蒸發之手段。 【圖式簡單說明] 圖1係示出本發明之液化氣體供給裝置的—形態例之系 統圖。 100138441 23 201229416 圖2係不出本發明之液化氣體供給方法的第1形態例之流 程圖* 圖3係不出本發明方法之第j形態例中，氣體供給中的液 化氣餘器内之殘岐體率、供給壓力、流量以及壓力調整 閥之狀態變化的說明圖。 圖4係示出本發明之液化氣體供給方法的第2形態例之流 程圖。 圖5係示出本發明方法之第2形態例中，氣體供給中的液 化氣體容器内之殘留氣體率、供給壓力、流量以及壓力調整 閥之狀態變化的說明圖。 【主要元件符號說明】 11a、lib 液化氣體容器 12a、12b 重量計 13a、13b M力指不調節計 14a、14b 自動開閉閥 15 使用端氣體供給路徑 16 控制手段 17 壓力調整器 18a、18b 閥部 19a、19b 壓力檢測部 100138441 24The automatic opening and closing valve 14b of the A-body supply system B system continues to be closed, and the gas supply system for the gas-use end is separately supplied with the gas supply system A 100138441 15 201229416, and the first pressure * 'pressure finger* adjustment meter 1Sa system The reference setting pressure (for example, g 5 tender) set in advance by the control means 指示 is indicated by the control means 16', and the valve opening degree of the wide portion is automatically adjusted '俾, so that the secondary side pressure of the pressure indicating regulator Ua becomes the reference set pressure 〇.5 Mpa. Further, the control means 10 controls the amount of the liquefied gas in the liquefied gas age n by the weight of the new liquefied gas container 11a filled with the predetermined amount of the liquefied gas, i (9)%, and supplies the gas in the gas supply. The liquefied gas granule ila is used as the residual gas rate [%] with respect to the weight thereof (step 73). 'Step 72 and step 73 are repeated, and the gas supply is continuously performed from the gas alone until the residual gas rate becomes lower than the previous The value of the (i) value of the first pre-gas amount is set to be, for example, the residual gas rate is 30% or less. When it is determined in step 73 that the residual gas rate of the liquefied gas container (1) is 30% or less, the routine proceeds to step 74, and the pressure indicating regulator i3a is output from the control means 16 to instruct the valve portion 18a to be fully open. When the state is fully open, the control unit 16 sends an opening signal to the automatic opening and closing valve Mb of the gas supply system B system, and opens the automatic opening and closing operation to start the supply of the gas evaporated by the liquefied gas container m of the gas supply system B system. The gas H is supplied to the state in which the gas supply is performed in parallel with the gas supply system B system. At this time, since the pressure indicating regulator Ub of the gas supply system B system is instructed to indicate the above-mentioned fresh setting G.5 MPa, the parallel supply of the money body is 100138441 16 201229416. The gas supply system from the valve portion 18a is fully opened. The amount of gas supplied to the system A is increased. Since the residual gas rate of the liquefied gas container 11a gradually decreases from 30% due to the passage of the gas supply, even if the valve portion 18a is fully opened, the pressure on the secondary side of the pressure indicating regulator 13a gradually decreases, if only from the gas supply system A In the system, it is impossible to supply a gas of a predetermined flow rate to the gas use end. As described above, when the gas supply amount from the gas supply system A system is lowered, gas supply is performed in parallel from the gas supply system B system, whereby a gas having a predetermined flow rate can be supplied to the gas use end. When the two gas supply system A system and the B system are supplied in parallel, the control means 16 also monitors the residual gas rate [%] of the liquefied gas container 11a (step 75), and repeats the above steps 74 and 75 to continue the parallel supply of the gas. Until the residual gas rate of the liquefied gas container 1 la is lower than a predetermined value of the second residual gas amount set value, for example, the residual gas rate is set to 3% or less. When it is judged in step 75 that the residual gas rate of the liquefied gas container 11a is 3% or less, the routine proceeds to step 76, the automatic opening and closing valve 14a of the gas supply system A system is closed, and the gas supply from the gas supply system A system is stopped. In step 77, the gas supply end is separately supplied with gas from the gas supply system B, and in the gas supply system A, the liquefied gas container 11a is exchanged in step 78, and the residual gas rate is 3% or less. The liquefied gas container 11a connects the new liquefied gas container 11a (residual gas rate 100%) to the gas supply system A system. If it is determined in step 79 100138441 17 201229416 that the exchange standard of the new liquefied gas container 11a is acceptable, the process proceeds to step 80, and the gas supply system A system is in the standby state. Simultaneously, the pressure indicating regulator 13a indicates a reference setting pressure of 0.5 MPa. When the gas supply is performed by the gas supply system B system alone, the pressure indicating regulator 13b indicates the reference setting pressure of 0.5 MPa by the control means 16, and the control means 16 monitors the liquefied gas container lib based on the detected value of the weight 12b by the step 81. Residual gas rate. When it is judged in step 81 that the residual gas rate of the liquefied gas container lib is 30% or less, the routine proceeds to step 82, and the pressure indicating regulator 13b of the gas supply system B system is output from the control means 16 so that the valve portion 18b is fully opened. In response to the instruction, the valve portion 18b is fully opened, and the automatic opening and closing valve 14a of the gas supply system A system is opened, and the gas supply system A system is supplied in parallel with the gas supply system B system. When it is determined in step 83 that the residual gas rate of the liquefied gas container lib is 3% or less, the automatic opening and closing valve 14b of the gas supply system B system is closed in step 84, and the routine proceeds to step 85, where the gas supply system A system is separately Gas supply is performed at the gas use end, and in the gas supply system B, the liquefied gas container lib is exchanged in step 86. If it is determined in step 87 that the exchange standard of the liquefied gas container lib is acceptable, the process proceeds to step 88, and the gas supply is performed. System B system becomes standby. If the separate gas supply from the gas supply system A in step 85 is started, the process returns to the above step 72, and in step 88, it becomes standby 100138441 18 201229416 The gas supply to the cancer is linked to the gas supply A When the system proceeds from step 73 to step 74, the system switches from the standby state to the gas supply state and below, and by repeating the respective steps, the gas is continuously supplied from the two gas supply system a system and the B system to the gas use end. supply. Fig. 5 is a view showing changes in the residual gas rate of the liquefied gas containers 11a and 11b with time passage (e.g., the number of days passed) when the gas supply is performed as shown in Fig. 5 (Fig. 5(a)), the gas supply system a system, and the B system. The change in the gas supply pressure of the one-person side pressure of the pressure indicating regulators 13a to 13b (Fig. 5(b)), the gas supply system, the flow rate of the supply gas of the system A, and the B system (Fig. 53(c)), The pressure refers to a change in the valve opening degree of the n 1 rib between the non-adjusting gauges 13a, 13b (Fig. 5 (d)), and shows the change of each state from the step 72 in Fig. 4. " From the beginning of the short period of time, the gas supply system A system alone, helium A, ', σ, although the liquefied gas evaporation caused the liquefied gas container Ua residual gas rate gradually decreased (Figure 5 (8) However, the supply pressure of the gas supply system a system is maintained at the reference set pressure of 0.5 MPa, and the supply force of the gas supply system β system in standby is 〇 (zero) (Fig. 5(b)), the gas supply system A system The gas flow rate is 300 L/mm ((TC, i atmosphere house conversion value) required for the gas use end, and the gas supply system system gas flow rate is 0 (zero) (Fig. 5 (e)). The valve force of the system A system indicates that the valve portion 18 in the regulator 13a is gradually changed to 100138441 201229416 as the evaporation amount due to the decrease in the residual gas rate of the liquefied gas container... is large, and the gas supply system B system The opening degree of the valve portion 18b of the pressure regulating valve 13b is 〇 (zero) (Fig. 5(d)). When the time passes and the residual gas rate of the liquefied gas container 11a becomes 30% or less (elapsed time 7), the gas supply system The pressure of the A system indicates the valve in the regulator 13a When the automatic opening and closing valve 14b is opened, the gas supply evaporated by the liquefied gas container lib of the gas supply system B system is started, and the 18a is in the parallel supply state (step 74). The supply pressure of the gas supply system A is temporarily raised to a reference set pressure of 0.5 MPa or more by the valve portion 18a being fully open. In this parallel supply state, the two liquefied gas containers 11a, lib are evaporated by the liquefied gas. The supply rate of the gas supply system A is lowered. The valve portion 18a is fully open, and the pressure is 0.5 MPa or more immediately after the parallel supply, but the residual gas rate of the liquefied gas container 11a is lowered. The amount of evaporation caused is reduced, and the supply pressure is gradually lowered. On the other hand, the supply pressure of the gas supply system B system is maintained at the reference set pressure of 0.5 MPa by the pressure indicating regulator 13b. With the gas supply system A system The amount of liquefied gas evaporation is reduced, and the gas flow rate of the gas supply system A system is gradually reduced. Then the gas supply system B system The gas flow rate is gradually increased, so that the sum of the gas flow rate of the gas supply system A system and the gas flow rate of the gas supply system B system becomes 300 L/min. If the residual gas rate of the liquefied gas container 11a is caused by the passage of time in the parallel supply state When it is 3% or less (elapse of time 12), the automatic opening and closing valve 14a of the gas supply system 100138441 20 201229416 A system is closed, and the gas supply from the gas supply system A system is stopped (step 76), becoming a separate system from the gas supply system B system. Supply (step 77). The liquefied gas container 11a of the gas supply system A system, the liquefied gas container 11a, during the period from the supply of the gas supply system B to the liquefied gas container lib, the residual gas rate is 30% or less. The residual gas rate becomes 100% and becomes a standby state (elapse time 14, step 80). After that, when the residual gas rate of the liquefied gas container lib is 30% or less, the gas supply system A system and the gas supply system B are connected in parallel (elapse time 18, step 82), and the residual gas of the liquefied gas container lib When the rate is 3% or less, it becomes a separate supply of the gas supply system A system (elapse time 23, step 85). The residual gas rate of the liquefied gas containers 11a, lib, the supply pressure of the gas supply system A system, the B system, the flow rate and pressure of the gas supply system A system, and the B system during the continuous supply of gas in the order shown in Fig. 4 The opening degree of the valve indicating the valve portions 18a, 18b in the regulators 13a, 13b is as shown in Fig. 5. The same change is repeated by the gas supply system A system and the B system due to the passage of time, thereby using the gas. The continuous supply flow rate was controlled to 300 L/min, and the liquefied gas in the liquefied gas containers 11a and 11b was used until the residual gas rate became 3%. In the gas supply method according to the second aspect of the invention, one of the valve portions 18a and 18b of the pressure indicating regulators 13a and 13b is fully opened after the parallel supply is started. When the pressure of the end gas supply path 15 is increased, the pressure regulator 17 is provided in the gas supply path 15 for the gas supply system A and the B system, as in the liquefied gas supply device shown in FIG. The pressure of the gas to the gas use end is adjusted to a pressure required for the gas use end which is lower than the above-mentioned reference set pressure of 0.5 Μ P a , whereby the pressure fluctuation or the flow rate fluctuation of the supply gas can be prevented. Further, in the first embodiment of the gas supply method, the pressure regulator 17 may be provided before the use end gas path 15, and when such a pressure regulator is incorporated into the device at the gas use end, it may be omitted. A pressure regulator 17 of the end gas supply path 15 is used. FIG. 2 showing the first embodiment of the method of the present invention and the flowchart shown in FIG. 4 showing the second embodiment of the method of the present invention automatically supply gas from the parallel when the residual gas ratio is 3% or less. Switching to a separate state and exchanging the liquefied gas container, but when the residual gas rate is 30% or less and parallel supply, for example, an alarm is output, and the gas supply is artificially switched from parallel to separate state, and Exchange of liquefied gas containers. In the above, the gas supply system is described as an example of two systems. The gas supply system may be similarly performed in three or more systems. For example, in the gas supply of the first system, the second system may be used as the first system. In the standby state, the third system is in the second standby state, and when switching to the gas supply from the second system, the third system is in the first standby state, and the first system is in the second standby state, whereby the exchange liquefaction can be extended. The time of the gas container can be increased by 100,138,441. 22 201229416 The liquefied gas supply unit is long, and the gas supply system is more than 3 systems. < The first system with a low residual gas rate becomes the first gas supply. The second system in which the state and the residual body rate are high is the second gas supply state, and the third system is in the standby state, and when the first system performs the container exchange and becomes the standby state, the second lowest residual gas rate is obtained. 2 The system is in the first gas supply state, and the third pure gas having a high gas rate is in the second gas supply state, and a large amount of gas can be supplied by setting as described above. Further, the type of the liquefied gas is not particularly limited, and the means for detecting the amount of liquefied gas in the liquefied gas container is not limited to a weight meter, and any one may be used as long as it can detect the amount of liquefied gas in the gas container. For example, various liquid level meters are also used. Further, the amount of liquefied gas in the night gas can be indirectly detected using a pressure gauge. Further, the second q-pressure with respect to the reference set pressure may be set to a pressure that can be supplied in parallel depending on the surface of the gas, the supply pressure, the supply amount, and the like. The value of the residual gas rate in the supply state by the knife or the knife can be appropriately set depending on the type of gas = supply pressure and supply amount. In addition, the liquefied gas container may also be a means for heating the liquefied gas container to promote evaporation of the liquefied gas in a dry dam of the law (generally the Japanese High Pressure Gas Security Code, Article 60). BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a system diagram showing a morphological example of a liquefied gas supply device of the present invention. 100138441 23 201229416 FIG. 2 is a flow chart showing a first embodiment of the method for supplying a liquefied gas according to the present invention. FIG. 3 is a diagram showing the residual of the liquefied gas remaining in the gas supply in the j-th aspect of the method of the present invention. An illustration of the change in the carcass rate, supply pressure, flow rate, and state of the pressure regulating valve. Fig. 4 is a flow chart showing a second embodiment of the liquefied gas supply method of the present invention. Fig. 5 is an explanatory view showing changes in the residual gas ratio, the supply pressure, the flow rate, and the state of the pressure regulating valve in the liquefied gas container during gas supply in the second embodiment of the method of the present invention. [Description of main component symbols] 11a, lib liquefied gas containers 12a, 12b Weight gauges 13a, 13b M Force non-adjustment gauges 14a, 14b Automatic opening and closing valve 15 Operating end gas supply path 16 Control means 17 Pressure regulators 18a, 18b Valve section 19a, 19b pressure detecting unit 100138441 24