TWI605220B - Liquefied gas supply device and method - Google Patents

Liquefied gas supply device and method Download PDF

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Publication number
TWI605220B
TWI605220B TW101144273A TW101144273A TWI605220B TW I605220 B TWI605220 B TW I605220B TW 101144273 A TW101144273 A TW 101144273A TW 101144273 A TW101144273 A TW 101144273A TW I605220 B TWI605220 B TW I605220B
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gas
gas supply
liquefied gas
liquefied
pressure
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TW101144273A
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Chinese (zh)
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TW201344090A (en
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Susumu Sakata
Takashi Yoshida
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Taiyo Nippon Sanso Corp
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    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17CVESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C5/00Methods or apparatus for filling containers with liquefied, solidified, or compressed gases under pressures
    • F17C5/002Automated filling apparatus
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17CVESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C13/00Details of vessels or of the filling or discharging of vessels
    • F17C13/02Special adaptations of indicating, measuring, or monitoring equipment
    • F17C13/025Special adaptations of indicating, measuring, or monitoring equipment having the pressure as the parameter
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17CVESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C13/00Details of vessels or of the filling or discharging of vessels
    • F17C13/04Arrangement or mounting of valves
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17CVESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C5/00Methods or apparatus for filling containers with liquefied, solidified, or compressed gases under pressures
    • F17C5/02Methods or apparatus for filling containers with liquefied, solidified, or compressed gases under pressures for filling with liquefied gases
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17CVESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C9/00Methods or apparatus for discharging liquefied or solidified gases from vessels not under pressure
    • F17C9/02Methods or apparatus for discharging liquefied or solidified gases from vessels not under pressure with change of state, e.g. vaporisation
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17CVESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2205/00Vessel construction, in particular mounting arrangements, attachments or identifications means
    • F17C2205/03Fluid connections, filters, valves, closure means or other attachments
    • F17C2205/0302Fittings, valves, filters, or components in connection with the gas storage device
    • F17C2205/0323Valves
    • F17C2205/0332Safety valves or pressure relief valves
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17CVESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2250/00Accessories; Control means; Indicating, measuring or monitoring of parameters
    • F17C2250/06Controlling or regulating of parameters as output values
    • F17C2250/0605Parameters
    • F17C2250/0626Pressure

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Filling Or Discharging Of Gas Storage Vessels (AREA)

Description

液化氣體供給裝置及方法 Liquefied gas supply device and method

本發明係關於液化氣體供給裝置及方法,詳言之,係關於用以使在複數個液化氣體容器中所填充之液化氣體蒸發而供給至氣體使用目標處的液化氣體供給裝置及方法。 The present invention relates to a liquefied gas supply device and method, and more particularly to a liquefied gas supply device and method for evaporating a liquefied gas filled in a plurality of liquefied gas containers to be supplied to a gas use target.

作為使在複數個液化氣體容器中所填充之液化氣體蒸發而供給至氣體使用目標處之液化氣體供給方法,係已知有於設置用以使複數個液化氣體容器(主體容器)內之壓力上升的加壓手段的同時,在監控各個液化氣體容器內之壓力,從相對壓力較高之第一液化氣體容器供給氣體,而當該第一液化氣體容器內之壓力降低時,將氣體供給切換為來自第二液化氣體容器,藉由將已降低壓力之第一液化氣體容器予以交換,而連續施行朝向氣體使用目標處之氣體供給(例如,參照專利文獻1)。 A liquefied gas supply method for evaporating a liquefied gas filled in a plurality of liquefied gas containers and supplying them to a gas use target is known to increase the pressure in a plurality of liquefied gas containers (main body containers) Simultaneously, while monitoring the pressure in each liquefied gas container, the gas is supplied from the first liquefied gas container having a relatively high relative pressure, and when the pressure in the first liquefied gas container is lowered, the gas supply is switched to The second liquefied gas container is continuously supplied with gas to the gas use target by exchanging the first liquefied gas container having the reduced pressure (for example, refer to Patent Document 1).

[先前技術文獻] [Previous Technical Literature] [專利文獻] [Patent Literature]

[專利文獻1]日本專利特開2007-231982號公報 [Patent Document 1] Japanese Patent Laid-Open Publication No. 2007-231982

然而,如專利文獻1所示般,在常溫附近之蒸氣壓較高之LNG的情形中,係有可能可使液化氣體容器內之LNG幾乎 都蒸發而進行供給,但是在常溫附近之蒸氣壓較低之氣體(例如,液化氨)的情形時,當液化氣體容器內之液化氣體殘量成為容器容積之30%以下時,蒸發量會逐漸地下降,故而依氣體使用目標處所要求之流量來供給氣體將變得困難。因此,於供給至氣體使用目標處之流量較多時,在液化氣體容器內之液化氣體殘量成為容器容積的30%左右時,藉由切換進行氣體供給之液化氣體容器而交換液化氣體殘量變少之液化氣體容器,則可為朝向氣體使用目標處連續供給既定流量之氣體的狀態。 However, as shown in Patent Document 1, in the case of LNG having a high vapor pressure near normal temperature, it is possible to make the LNG in the liquefied gas container almost When the gas is vaporized and supplied, but in the case of a gas having a low vapor pressure (for example, liquefied ammonia) near normal temperature, when the residual amount of the liquefied gas in the liquefied gas container becomes 30% or less of the volume of the container, the amount of evaporation gradually increases. As the ground falls, it becomes difficult to supply gas according to the flow rate required by the gas use target. Therefore, when the flow rate of the liquefied gas in the liquefied gas container is about 30% of the volume of the container when the flow rate to the gas use target is large, the amount of liquefied gas remaining is exchanged by switching the liquefied gas container for supplying the gas. In the case of a small liquefied gas container, it is possible to continuously supply a gas of a predetermined flow rate toward the gas use target.

因此,未能充分使用已填充在液化氣體容器內之液化氨,而除了液化氨之利用效率降低之外,亦會有液化氣體容器之交換周期變得短期化等問題存在。又,透過將已填充有液化氨之液化氣體容器加熱至高溫,而促進液化氨之蒸發,則可依既定流量供給已蒸發之液化氨,並使液化氣體容器內之液化氨幾乎都蒸發成為可能,但是需要用以將大型主體容器加熱至高溫的特別加熱設備,故會有設備成本或運轉成本大幅度上升的問題。 Therefore, the liquefied ammonia which has been filled in the liquefied gas container is not sufficiently used, and in addition to the decrease in the utilization efficiency of the liquefied ammonia, there is a problem that the exchange cycle of the liquefied gas container becomes short-term. Further, by heating the liquefied gas container filled with liquefied ammonia to a high temperature to promote evaporation of the liquefied ammonia, the evaporated liquefied ammonia can be supplied at a predetermined flow rate, and the liquefied ammonia in the liquefied gas container can be almost evaporated. However, there is a need for a special heating device for heating a large main container to a high temperature, so that there is a problem that equipment cost or running cost is greatly increased.

於是,本發明之發明目的係在於提供一種液化氣體供給裝置及方法,其係利用簡單的裝置構成及操作順序而可提高已填充於液化氣體容器內之液化氣體,特別是如液化氨般之在常溫附近之蒸氣壓較低的液化氣體之利用效率。 Accordingly, an object of the present invention is to provide a liquefied gas supply apparatus and method which can improve a liquefied gas which has been filled in a liquefied gas container by a simple device configuration and an operation sequence, in particular, like liquefied ammonia. The utilization efficiency of the liquefied gas having a lower vapor pressure near normal temperature.

為了達成上述目的,本發明之液化氣體供給裝置係使於複數個液化氣體容器內所填充之液化氣體蒸發而供給至氣體使用目標處者,其特徵係具備有:分別連接於複數個氣體供給系統之液化氣體容器;分別檢測各個液化氣體容器內之液化氣體量之液化氣體量檢測手段;具有分別設置在各個氣體供給系統之減壓手段的減壓經由路徑;分別設置在各個氣體供給系統之氣體供給阻斷手段;使由複數個氣體供給系統所供給之氣體合流,而供給至氣體使用目標處之使用目標處氣體供給經由路徑;及依壓力損失小於上述減壓經由路徑之狀態,而透過旁通閥將上述減壓經由路徑之減壓手段之一次側與二次側予以分別連接之旁通經由路徑;又,在各個氣體供給系統上具備有根據利用上述液化氣體量檢測手段所檢測出之液化氣體容器內之液化氣體量,而分別開關控制上述氣體供給阻斷手段及上述旁通閥的控制手段。 In order to achieve the above object, the liquefied gas supply device of the present invention is configured to evaporate a liquefied gas filled in a plurality of liquefied gas containers and supply the gas to a gas use target, and is characterized in that it is connected to a plurality of gas supply systems. a liquefied gas container; a liquefied gas amount detecting means for detecting the amount of liquefied gas in each liquefied gas container; a pressure reducing passage path having a pressure reducing means respectively provided in each gas supply system; and gas respectively disposed in each gas supply system a supply blocking means; the gas supplied from the plurality of gas supply systems is merged, and the gas supply passage to the use target at the gas use target; and the pressure loss is less than the state of the reduced pressure passage; The bypass valve connects the bypass passage through which the primary side and the secondary side of the pressure reducing means are connected via the path; and the gas supply system is provided with the detection by the liquefied gas amount detecting means. The amount of liquefied gas in the liquefied gas container, respectively, on the switch control Control means for blocking the gas supply means and said bypass valve.

此外,本發明之液化氣體供給裝置之特徵係上述使用目標處氣體供給經由路徑為具備有壓力調整器,其係將由上述氣體供給系統所供給之氣體壓力調整為低於上述減壓手段所設定之壓力的預先所設定之壓力。 Further, the liquefied gas supply device of the present invention is characterized in that the gas supply passage through the use target is provided with a pressure regulator that adjusts a gas pressure supplied from the gas supply system to be lower than a pressure reduction means. The pre-set pressure of the pressure.

又,本發明之液化氣體供給方法係使用上述構成之液化氣體供給裝置,而對上述氣體使用目標處連續性進行氣體供給者,其特徵為,上述控制手段係在由第一液化氣體量檢測手段所檢測出之第一液化氣體容器內之液化氣體量超過預先 所設定之第一殘留氣體量設定值時,依關閉在第二氣體供給系統上所設置之第二氣體供給阻斷手段及第二旁通閥之狀態,而設定為開啟在第一氣體供給系統上所設置之第一氣體供給阻斷手段且關閉第一旁通閥之狀態,利用第一減壓手段將於第一液化氣體容器中所蒸發之氣體予以減壓而施行氣體供給,又,在由第一液化氣體量檢測手段所檢測出之第一液化氣體容器內之液化氣體量成為上述第一殘留氣體量設定值以下時,開啟在第一氣體供給系統上所設置之第一旁通閥,並經由第一旁通閥而供給於第一液化氣體容器中所蒸發之氣體,同時依關閉在第二氣體供給系統上所設置之第二旁通閥之狀態,設定為開啟第二氣體供給阻斷手段之狀態,而由第一氣體供給系統與第二氣體供給系統雙方來並聯施行氣體供給。 Further, in the liquefied gas supply method of the present invention, the liquefied gas supply device having the above configuration is used, and the gas supply target is continuously supplied to the gas supply target, wherein the control means is based on the first liquefied gas amount detecting means. The amount of liquefied gas in the first liquefied gas container detected exceeds When the set first residual gas amount setting value is set, the first gas supply system is set to be turned on in the first gas supply system by closing the state of the second gas supply blocking means and the second bypass valve provided on the second gas supply system a first gas supply blocking means provided thereon and a state in which the first bypass valve is closed, and the gas evaporated in the first liquefied gas container is depressurized by the first decompression means to supply gas, and When the amount of liquefied gas in the first liquefied gas container detected by the first liquefied gas amount detecting means is equal to or lower than the first residual gas amount setting value, the first bypass valve provided on the first gas supply system is opened And supplying the gas evaporated in the first liquefied gas container via the first bypass valve, and setting the second gas supply to be turned on according to the state of closing the second bypass valve provided on the second gas supply system In the state of the blocking means, gas supply is performed in parallel by both the first gas supply system and the second gas supply system.

此外,本發明之液化氣體供給方法之特徵係在利用上述第一液化氣體量檢測手段所檢測出之上述第一液化氣體容器內之液化氣體量成為少於上述第一殘留氣體量設定值之液化氣體量而設定之第二殘留氣體量設定值以下時,關閉第一氣體供給阻斷手段及第一旁通閥,以停止來自第一氣體供給系統的氣體供給,而切換為來自第二氣體供給系統的氣體供給。 Further, the liquefied gas supply method of the present invention is characterized in that the amount of liquefied gas in the first liquefied gas container detected by the first liquefied gas amount detecting means is less than the liquefaction of the first residual gas amount set value. When the second residual gas amount setting value equal to or smaller than the gas amount is set, the first gas supply blocking means and the first bypass valve are closed to stop the gas supply from the first gas supply system, and switch to the second gas supply. System gas supply.

如根據本發明,則可根據連接於各個氣體供給系統之液化 氣體容器內之液化氣體量而分別開關控制氣體供給阻斷手段及旁通閥,藉此則可從複數個氣體供給系統對氣體使用目標處連續性進行氣體供給,同時可藉由開啟利用液化氣體量檢測手段所檢測出之液化氣體量變少之氣體供給系統之旁通閥,而可使液化氣體量變少之液化氣體容器內之液化氣體經由壓力損失小之旁通經由路徑並較其他氣體供給系統優先地供給至氣體使用目標處。藉此,可提高液化氣體之利用效率,同時可使液化氣體容器之交換周期長期化。 According to the invention, it can be liquefied according to the connection to each gas supply system. The gas supply blocking means and the bypass valve are separately controlled by the amount of the liquefied gas in the gas container, whereby the gas supply can be continuously supplied from the plurality of gas supply systems to the gas use target, and the liquefied gas can be utilized by opening. The bypass valve of the gas supply system in which the amount of liquefied gas detected by the amount detecting means is reduced, and the liquefied gas in the liquefied gas container having a small amount of liquefied gas can be bypassed via a pressure loss path and compared with other gas supply systems. It is preferentially supplied to the gas use target. Thereby, the utilization efficiency of the liquefied gas can be improved, and the exchange cycle of the liquefied gas container can be prolonged.

如圖1所示,本形態例中所示液化氣體供給裝置係使複數個液化氣體容器內之液化氨蒸發而施行連續供給者,其係具備有:複數個(本形態例為2系統)氣體供給系統(A系統、B系統);分別連接於各個氣體供給系統(A系統、B系統)之液化氣體容器11a、11b;作為分別檢測各個液化氣體容器11a、11b內之液化氣體量之液化氣體量檢測手段的重量計12a、12b;減壓經由路徑15a、15b,其係具有分別設置在各個氣體供給系統(A系統、B系統),且作為將二次側壓力減壓至預先所設定之壓力之減壓手段的減壓閥13a、13b及作為進行氣體之供給/停止之氣體供給阻斷手段的自動開關閥14a、14b;透過由自動開關閥所構成之旁通閥16a、16b而分別連接串聯設置在各個減壓經由路徑15a、15b之上述減壓閥13a、13b之一次側予自動開關閥14a、14b之二次側的 旁通經由路徑17a、17b;使從各個氣體供給系統(A系統、B系統)所供給之氣體合流而供給至氣體使用目標處之使用目標處氣體供給經由路徑18;及根據利用上述重量計12a、12b所檢測出之液化氣體容器11a、11b內之液化氣體殘量而開關控制上述自動開關閥14a、14b及上述旁通閥16a、16b的控制手段19。此外,在上述使用目標處氣體供給經由路徑18上,設置有用以將供給至氣體使用目標處之氣體壓力調整為預先所設定之壓力的減壓器20,在各個氣體供給系統(A系統、B系統)上,設置有用以檢測出在使用目標處氣體供給經由路徑18合流前之氣體壓力的壓力計21a、21b,於使用目標處氣體供給經由路徑18上,設置有用以檢測出利用減壓器20所減壓之供給氣體壓力的壓力計22。 As shown in Fig. 1, the liquefied gas supply device shown in the present embodiment is configured to evaporate liquefied ammonia in a plurality of liquefied gas containers to supply a continuous supplier, and the system includes a plurality of (two systems in this embodiment) gas. Supply system (A system, B system); liquefied gas containers 11a, 11b respectively connected to respective gas supply systems (A system, B system); as liquefied gas for detecting the amount of liquefied gas in each of the liquefied gas containers 11a, 11b, respectively The weight gauges 12a and 12b of the amount detecting means; the pressure reducing passages 15a and 15b are provided in the respective gas supply systems (A system, B system), and the secondary side pressure is decompressed to the previously set The pressure reducing valves 13a and 13b of the pressure reducing means and the automatic opening and closing valves 14a and 14b as the gas supply blocking means for supplying/stopping the gas are respectively passed through the bypass valves 16a and 16b constituted by the automatic opening and closing valves. The connection is provided in series on the secondary side of the pressure reducing valves 13a and 13b of the respective pressure reducing passages 15a and 15b to the secondary side of the automatic opening and closing valves 14a and 14b. Bypassing the passages 17a and 17b, and supplying the gas supplied from the respective gas supply systems (the A system and the B system) to the target gas supply target gas supply passage via the path 18; and according to the use of the above weight meter 12a The control means 19 for controlling the automatic opening and closing valves 14a and 14b and the bypass valves 16a and 16b by switching the residual amount of liquefied gas in the liquefied gas containers 11a and 11b detected in 12b. Further, at the above-described use target gas supply passage path 18, a pressure reducer 20 for adjusting the gas pressure supplied to the gas use target to a previously set pressure is provided in each gas supply system (A system, B) In the system, a pressure gauge 21a, 21b for detecting the gas pressure before the gas supply through the path 18 is merged at the target is used, and the gas supply is supplied via the path 18 at the use target, and is provided to detect the use of the pressure reducer. 20 pressure gauge 22 for supplying gas pressure under reduced pressure.

上述減壓閥13a、13b係例如可依手動來操作調節控制器或操作把手等而設定為低於一次側壓力之二次側壓力,藉以將通過減壓閥13a、13b之氣體的壓力(亦即,二次側壓力)調整為一定壓力,當一次側壓力低於所設定之二次側壓力時,二次側壓力會變得與一次側壓力相同的壓力。 The pressure reducing valves 13a and 13b are set to be lower than the secondary side pressure of the primary side pressure by, for example, manually operating the adjustment controller or operating the handle, etc., thereby the pressure of the gas passing through the pressure reducing valves 13a, 13b (also That is, the secondary side pressure is adjusted to a constant pressure, and when the primary side pressure is lower than the set secondary side pressure, the secondary side pressure becomes the same pressure as the primary side pressure.

上述旁通經由路徑17a、17b之壓力損失係變得小於具有減壓閥13a、13b及自動開關閥14a、14b之減壓經由路徑15a、15b的壓力損失。一般而言,相較於相同口徑之開關閥,由於減壓閥之壓力損失較大,故會藉由使用相同口徑之配管或閥而分別形成減壓經由路徑15a、15b及旁通經由路 徑17a、17b,則可使旁通經由路徑17a、17b之壓力損失小於減壓經由路徑15a、15b之壓力損失,同時可在旁通閥16a、16b與自動開關閥14a、14b方面使用相同閥。因此,可透過不使用高價格壓力自動控制閥而使用同一口徑之配管或自動開關閥,而得以大幅度降低液化氣體供給裝置的設備成本。 The pressure loss of the bypass passages 17a and 17b is smaller than the pressure loss of the pressure reducing passages 15a and 15b having the pressure reducing valves 13a and 13b and the automatic opening and closing valves 14a and 14b. In general, compared with the on-off valve of the same diameter, since the pressure loss of the pressure reducing valve is large, the pressure reducing passages 15a and 15b and the bypass passage are respectively formed by using pipes or valves of the same diameter. The diameters 17a, 17b allow the pressure loss of the bypass passages 17a, 17b to be less than the pressure loss of the pressure relief passages 15a, 15b, while the same valves can be used for the bypass valves 16a, 16b and the automatic opening and closing valves 14a, 14b. . Therefore, it is possible to greatly reduce the equipment cost of the liquefied gas supply device by using a pipe of the same diameter or an automatic on-off valve without using a high-price pressure automatic control valve.

來自於氣體供給系統(A系統、B系統)之各個液化氣體容器11a、11b的氣體供給係於減壓閥13a、13b上將些微高於供給至氣體使用目標處之氣體壓力的壓力當作為二次側設定壓力而預先設定的狀態下,根據液化氣體容器11a、11b內之液化氣體殘量,並藉由上述控制手段19來開關控制自動開關閥14a、14b及旁通閥16a、16b而進行。各個液化氣體容器11a、11b之交換係於自動開關閥14a、14b及旁通閥16a、16b均處於關閉狀態時才進行,在液化氣體容器交換後,控制手段19在直至開啟自動開關閥14a、14b為止,並不施行氣體供給而成為待機狀態。 The gas supply from each of the liquefied gas containers 11a, 11b of the gas supply system (A system, B system) is a pressure slightly higher than the pressure of the gas supplied to the gas use target on the pressure reducing valves 13a, 13b. In the state where the pressure is set in the secondary side, the liquefied gas remaining in the liquefied gas containers 11a and 11b is controlled by the control means 19 to open and close the automatic opening and closing valves 14a and 14b and the bypass valves 16a and 16b. . The exchange of the respective liquefied gas containers 11a, 11b is performed when the automatic opening and closing valves 14a, 14b and the bypass valves 16a, 16b are all in the closed state. After the liquefied gas container is exchanged, the control means 19 is until the automatic opening and closing valve 14a is opened. Until 14b, the gas supply is not performed and the standby state is reached.

另外,於本形態例中,雖然是分別在減壓經由路徑15a、15b之上游側上串聯配置有減壓閥13a、13b,下游側上串聯配置有自動開關閥14a、14b,亦可將自動開關閥14a、14b配置在減壓閥13a、13b之上游側。又,亦可為在減壓經由路徑15a、15b上僅配置減壓閥13a、13b,同時將減壓閥13a、13b之一次側與二次側連接,使減壓閥13a、13b為旁通狀 態而設置旁通經由路徑17a、17b,將自動開關閥14a、14b配置在減壓閥13a、13b之二次側的較旁通經由路徑17a、17b之連接部更為下游側。 Further, in the present embodiment, the pressure reducing valves 13a and 13b are arranged in series on the upstream side of the pressure reducing passages 15a and 15b, respectively, and the automatic opening and closing valves 14a and 14b are arranged in series on the downstream side. The switching valves 14a and 14b are disposed on the upstream side of the pressure reducing valves 13a and 13b. Further, only the pressure reducing valves 13a and 13b may be disposed on the pressure reducing passages 15a and 15b, and the primary side of the pressure reducing valves 13a and 13b may be connected to the secondary side, and the pressure reducing valves 13a and 13b may be bypassed. shape In the state, the bypass passages 17a and 17b are provided, and the automatic opening and closing valves 14a and 14b are disposed on the secondary side of the bypass passages 17a and 17b on the secondary side of the pressure reducing valves 13a and 13b.

以下,根據圖2及圖3,針對使用本形態例所示之液化氣體供給裝置而對氣體使用目標處連續性進行氣體供給的氣體供給方法之一形態例進行說明。 In the following, an example of a gas supply method for supplying gas to the gas use target continuity using the liquefied gas supply device shown in the present embodiment will be described with reference to FIG. 2 and FIG.

首先,減壓閥13a、13b係在略高於氣體使用目標處所要求之氣體壓力(在減壓器20所設定之供給壓力)的壓力(例如,所要求之氣體供給壓力為0.4MPa)時,將利用減壓閥13a、13b所減壓之二次側壓力設定為0.5MPa。上述控制手段19係在兩氣體供給系統(A系統、B系統)均處於待機狀態,而自動開關閥14a、14b及旁通閥16a、16b全部關閉時(步驟51),選擇氣體供給系統(A系統、B系統)之任一方,例如選擇氣體供給系統之A系統,開啟自動開關閥14a,而開始從氣體供給系統之A系統對氣體使用目標處的氣體供給。藉此,在液化氣體容器11a所蒸發之氣體通過減壓經由路徑15a之減壓閥13a及自動開關閥14a,並供給至氣體使用目標處(步驟52)。此時,氣體供給系統之A系統的旁通閥16a、氣體供給系統之B系統的自動開關閥14b及旁通閥16b係繼續處於關閉狀態,朝向氣體使用目標處之氣體供給係由氣體供給系統之A系統來單獨進行。 First, when the pressure reducing valves 13a, 13b are at a pressure slightly higher than the gas pressure required at the gas use target (the supply pressure set at the pressure reducer 20) (for example, the required gas supply pressure is 0.4 MPa), The secondary side pressure reduced by the pressure reducing valves 13a and 13b was set to 0.5 MPa. The control means 19 is such that when both gas supply systems (A system, B system) are in a standby state, and the automatic opening and closing valves 14a, 14b and the bypass valves 16a, 16b are all closed (step 51), the gas supply system is selected (A). One of the system, the B system, for example, the A system of the gas supply system is selected, the automatic on-off valve 14a is turned on, and the supply of gas from the gas supply target A system to the gas use target is started. Thereby, the gas evaporated in the liquefied gas container 11a is supplied to the gas use target via the pressure reducing valve 13a and the automatic opening and closing valve 14a of the path 15a by depressurization (step 52). At this time, the bypass valve 16a of the A system of the gas supply system, the automatic opening and closing valve 14b of the B system of the gas supply system, and the bypass valve 16b continue to be in a closed state, and the gas supply system toward the gas use target is supplied by the gas supply system. The A system is carried out separately.

此外,上述控制手段19係將來自重量計12a之檢測值的 液化氣體容器11a內之液化氣體量經填充入預先所設定之液化氣體量的液化氣體容器11a之重量設定為100%時,監控相對於此之氣體供給中之液化氣體容器11a之重量作為殘留氣體率[%](步驟53),至此殘留氣體率變成預先所設定之第一殘留氣體量設定值以下為止,例如,至殘留氣體率變成30%以下為止,反複進行上述步驟52及此步驟53,而在氣體供給系統A系統單獨之氣體供給仍持續進行。 Further, the above control means 19 will be based on the detected value of the weight meter 12a. When the amount of the liquefied gas in the liquefied gas container 11a is set to 100% by the weight of the liquefied gas container 11a filled in the amount of the liquefied gas set in advance, the weight of the liquefied gas container 11a in the gas supply is monitored as the residual gas. Rate [%] (step 53), and the residual gas rate is equal to or lower than the first residual gas amount set value set in advance. For example, the above step 52 and step 53 are repeated until the residual gas rate becomes 30% or less. The separate gas supply in the gas supply system A system continues.

當在步驟53判斷液化氣體容器11a之殘留氣體率變成30%以下時,前進至步驟54,藉由來自控制手段19之指令,開啟氣體供給系統A系統之旁通閥16a,同時開啟氣體供給系統B系統之自動開關閥14b。藉此,於氣體供給系統A系統之液化氣體容器11a處所蒸發之氣體會經由減壓經由路徑15a,通過壓力損失較小之旁通經由路徑17a之旁通閥16a,而成為供給至氣體使用目標處的狀態,同時於氣體供給系統B系統之液化氣體容器11b處所蒸發之氣體,會通過減壓經由路徑15b之減壓閥13b及自動開關閥14b,而成為供給至氣體使用目標處之狀態,氣體供給系統A系統與氣體供給系統B系統變成為並聯進行氣體供給的狀態。另外,氣體供給系統A系統之自動開關閥14a通常是設定為關閉,但為開啟狀態亦可。 When it is judged in step 53 that the residual gas rate of the liquefied gas container 11a becomes 30% or less, the routine proceeds to step 54, and the bypass valve 16a of the gas supply system A system is opened by the instruction from the control means 19, and the gas supply system is turned on. The automatic opening and closing valve 14b of the B system. As a result, the gas evaporated in the liquefied gas container 11a of the gas supply system A system is supplied to the gas use target via the bypass passage 16a via the path 17a via the bypass passage 16a via the pressure reduction via the passage 15a. At the same time, the gas evaporated at the liquefied gas container 11b of the gas supply system B system is decompressed via the pressure reducing valve 13b of the path 15b and the automatic opening and closing valve 14b, and is supplied to the gas use target. The gas supply system A system and the gas supply system B system are in a state in which gas supply is performed in parallel. Further, the automatic opening and closing valve 14a of the gas supply system A system is normally set to be closed, but may be in an open state.

此時,於氣體供給系統B系統之減壓閥13b處,由於如上述般將二次側設定壓力設定為0.5MPa,所以在氣體供給 系統A系統處之通過壓力損失較小旁通經由路徑17a之氣體壓力較高於在氣體供給系統B系統之減壓閥13b處所減壓之氣體壓力(0.5MPa)的期間,相較於來自氣體供給系統B系統之氣體供給量,來自氣體供給系統A系統之氣體供給量變多,而在並聯供給開始後隨即成為被供給至氣體使用目標處之氣體大部分為來自氣體供給系統A系統之氣體。 At this time, in the pressure reducing valve 13b of the gas supply system B system, since the secondary side setting pressure is set to 0.5 MPa as described above, the gas supply is performed. The pressure loss at the system A system is small, and the gas pressure through the path 17a is higher than the gas pressure (0.5 MPa) decompressed at the pressure reducing valve 13b of the gas supply system B system, compared to the gas from the gas. The gas supply amount of the supply system B system is increased by the gas supply amount from the gas supply system A system, and the gas which is supplied to the gas use target immediately after the start of the parallel supply is the gas from the gas supply system A system.

依在並聯狀態下之氣體供給的經過,則液化氣體容器11a之殘留氣體率從30%逐漸降低,隨著殘留氣體率的降低,當液化氣體容器11a內之液化氣體蒸發量下降時,已通過旁通經由路徑17a之氣體壓力會接近已通過氣體供給系統B系統之減壓閥13b的氣體壓力,進而來自氣體供給系統A系統之氣體供給量與來自氣體供給系統B系統之氣體供給量的差會消失。當液化氣體容器11a之殘留氣體率進一步降低而蒸發量更為下降時,相較於來自氣體供給系統A系統之氣體供給量,來自氣體供給系統B系統之氣體供給量會逐漸增加。 Depending on the passage of the gas supply in the parallel state, the residual gas rate of the liquefied gas container 11a gradually decreases from 30%, and as the residual gas rate decreases, when the amount of liquefied gas vaporization in the liquefied gas container 11a decreases, it passes. The gas pressure bypassing the path 17a approaches the gas pressure of the pressure reducing valve 13b that has passed through the gas supply system B system, and the difference between the gas supply amount from the gas supply system A system and the gas supply amount from the gas supply system B system. Will disappear. When the residual gas rate of the liquefied gas container 11a is further lowered and the amount of evaporation is further lowered, the amount of gas supplied from the gas supply system B system is gradually increased as compared with the gas supply amount from the gas supply system A system.

於從兩氣體供給系統A系統、B系統進行並聯供給時,控制手段19亦會監控液化氣體容器11a之殘留氣體率[%](步驟55),至液化氣體容器11a之殘留氣體率成為預先所設定之第二殘留氣體量設定值以下為止,例如,關於液化氣體容器11a內之蒸發量的部分,在確保作為二次側設定壓力所設定之0.5MPa以上之壓力係屬困難之作為殘留氣體率 所預先設定之3%以下的殘留氣體率為止,反覆進行上述步驟54與步驟55,而繼續氣體的並聯供給。 When the two gas supply systems A and B are supplied in parallel, the control means 19 monitors the residual gas rate [%] of the liquefied gas container 11a (step 55), and the residual gas rate to the liquefied gas container 11a becomes a predetermined For example, the portion of the amount of evaporation in the liquefied gas container 11a is difficult to maintain the pressure of 0.5 MPa or more set as the secondary side set pressure. The above steps 54 and 55 are repeated until the residual gas rate of 3% or less is set in advance, and the parallel supply of the gas is continued.

當在步驟55判斷液化氣體容器11a之殘留氣體率成為3%以下,則前進至步驟56,關閉氣體供給系統A系統之旁通閥16a,於自動開關閥14a為開啟狀態時,自動開關閥14a亦被關閉,而停止來自氣體供給系統A系統之氣體供給,前進至步驟57,進行來自氣體供給系統B系統單獨對氣體使用目標處之氣體供給。經停止氣體供給之氣體供給系統A系統係前進至步驟58,進行液化氣體容器11a之交換,取下殘留氣體率已成為3%以下之液化氣體容器11a,將新的液化氣體容器11a(殘留氣體率100%)連接至氣體供給系統A系統上。於步驟59,當判斷新的液化氣體容器11a之交換基準為合格時,前進至步驟60,氣體供給系統A系統係成為共同關閉自動關閉閥14a及旁通閥16a之關閉狀態的待機狀態。 When it is judged in step 55 that the residual gas rate of the liquefied gas container 11a is 3% or less, the routine proceeds to step 56 where the bypass valve 16a of the gas supply system A system is closed, and when the automatic opening and closing valve 14a is in the open state, the automatic opening and closing valve 14a is opened. It is also turned off, and the gas supply from the gas supply system A system is stopped, and the process proceeds to step 57 where the gas supply from the gas supply system B system alone to the gas use target is performed. The gas supply system A system that has stopped the supply of the gas proceeds to step 58 to exchange the liquefied gas container 11a, removes the liquefied gas container 11a having a residual gas rate of 3% or less, and removes the new liquefied gas container 11a (residual gas). The rate is 100%) connected to the gas supply system A system. In step 59, when it is judged that the exchange standard of the new liquefied gas container 11a is acceptable, the process proceeds to step 60, and the gas supply system A system is in a standby state in which the automatic closing valve 14a and the bypass valve 16a are closed together.

在氣體供給系統B系統單獨進行氣體供給時,由於旁通閥16b繼續為關閉狀態,所以在減壓閥13b處可設定二次側壓力為0.5MPa,並進一步依減壓器20所設定之0.4MPa進行氣體供給至氣體使用目標處,控制手段19係在步驟61根據重量計12b之檢測值而監控液化氣體容器11b之殘留氣體率。於步驟61時,當判斷液化氣體容器11b之殘留氣體率在30%以下時,前進至步驟62,開啟氣體供給系統B系 統之旁通閥16b,關閉自動開關閥14b,氣體供給系統B系統係成為已通過旁通經由路徑17a之氣體進行氣體供給至氣體使用目標處的狀態,同時開啟氣體供給系統A系統之自動開關閥14a,氣體供給系統A系統係利用減壓閥13a設定二次側壓力為0.5MPa,而成為依減壓器20所設定之0.4MPa進行氣體供給至氣體使用目標處的狀態,同前述般,成為氣體供給系統A系統與氣體供給系統B系統並聯地進行氣體供給的狀態。 When the gas supply system B system separately supplies the gas, since the bypass valve 16b continues to be in the closed state, the secondary side pressure can be set to 0.5 MPa at the pressure reducing valve 13b, and further set to 0.4 according to the pressure reducer 20. The gas is supplied to the gas use target at MPa, and the control means 19 monitors the residual gas rate of the liquefied gas container 11b based on the detected value of the weight 12b in step 61. At the time of step 61, when it is judged that the residual gas rate of the liquefied gas container 11b is 30% or less, the process proceeds to step 62 to open the gas supply system B. The bypass valve 16b closes the automatic opening and closing valve 14b, and the gas supply system B system becomes a state in which the gas is supplied to the gas use target by bypassing the gas passing through the path 17a, and the automatic switching of the gas supply system A system is started. In the valve 14a, the gas supply system A system sets the secondary side pressure to 0.5 MPa by the pressure reducing valve 13a, and supplies the gas to the gas use target at 0.4 MPa set by the pressure reducer 20, as described above. A state in which gas supply is performed in parallel with the gas supply system A system and the gas supply system B system.

當在步驟63判斷液化氣體容器11b之殘留氣體率成為3%以下時,於步驟64關閉氣體供給系統B系統之旁通閥16b,前進至步驟65,在由氣體供給系統A系統單獨進行氣體供給至氣體使用目標處之同時,氣體供給系統B系統在步驟66進行液化氣體容器11b之交換,而當在步驟67判定液化氣體容器11b之交換基準為合格時,前進至步驟68,氣體供給系統B系統成為待機狀態。 When it is judged in step 63 that the residual gas rate of the liquefied gas container 11b is 3% or less, the bypass valve 16b of the gas supply system B system is closed in step 64, and the process proceeds to step 65 where the gas supply is separately performed by the gas supply system A system. At the same time as the gas use target, the gas supply system B system performs the exchange of the liquefied gas container 11b at step 66, and when it is determined in step 67 that the exchange standard of the liquefied gas container 11b is acceptable, the process proceeds to step 68, and the gas supply system B The system becomes standby.

當在步驟65之來自氣體供給系統A系統單獨之氣體供給開始時,回到上述步驟52,而於步驟68成為待機狀態之氣體供給系統B系統係於氣體供給系統A系統由步驟53前進至步驟54時,從待機狀態切換為氣體供給狀態。以下,藉由反複該等各步驟,而從兩氣體供給系統A系統、B系統連續對氣體使用目標處進行氣體供給。 When the gas supply from the gas supply system A system at step 65 is started, the process returns to the above step 52, and the gas supply system B system that becomes the standby state in step 68 is connected to the gas supply system A. The process proceeds from step 53 to the step. At 54 o'clock, the state is switched from the standby state to the gas supply state. Hereinafter, by repeating these steps, gas supply is continuously performed from the gas supply system A system and the B system to the gas use target.

圖3係分別顯示依此進行氣體供給時之伴隨著時間經 過,例如經過天數之:液化氣體容器11a、11b之殘留氣體率的變化(圖3(a));氣體供給系統A系統、B系統之氣體供給壓力的變化(圖3(b));氣體供給系統A系統、B系統之氣體流量的變化(圖3(c));自動開關閥14a、14b及旁通閥16a、16b之開關狀態(圖3(d)),表示圖2之來自步驟52之各狀態的變化。 Figure 3 shows the time accompanying the gas supply according to this. After, for example, the number of days: the change in the residual gas rate of the liquefied gas containers 11a, 11b (Fig. 3 (a)); the change in the gas supply pressure of the gas supply system A system, B system (Fig. 3 (b)); The change of the gas flow rate of the supply system A system and the B system (Fig. 3 (c)); the switching state of the automatic opening and closing valves 14a, 14b and the bypass valves 16a, 16b (Fig. 3 (d)), showing the steps from Fig. 2 52 changes in each state.

在開始不久的期間,由於氣體供給系統A系統單獨進行氣體供給,故因為液化氣體之蒸發而液化氣體容器11a之殘留氣體率逐漸降低(圖3(a)),氣體供給系統A系統之供給壓力係維持在基準設定壓力的0.5MPa,待機中之氣體供給系統B系統之供給壓力係為0(零)(圖3(b)),氣體供給系統A系統之氣體流量係氣體使用目標處所要求之流量,例如300L/min(0度,一大氣壓換算值),氣體供給系統B系統之氣體流量為0(零)(圖3(c))。又,除了氣體供給系統A系統之自動開關閥14a為開啟狀態之外,其他自動開關閥14b及旁通閥16a、16b成為關閉狀態(圖3(d))。 In the short period of time, since the gas supply system A system separately supplies the gas, the residual gas rate of the liquefied gas container 11a gradually decreases due to the evaporation of the liquefied gas (Fig. 3(a)), and the supply pressure of the gas supply system A system The system maintains the reference set pressure at 0.5 MPa, and the supply pressure of the gas supply system B system in standby is 0 (zero) (Fig. 3(b)). The gas flow rate of the gas supply system A system is required by the gas use target. The flow rate, for example, 300 L/min (0 degree, atmospheric pressure conversion value), the gas flow rate of the gas supply system B system is 0 (zero) (Fig. 3(c)). Further, the automatic opening and closing valve 14b and the bypass valves 16a and 16b are in a closed state except for the automatic opening and closing valve 14a of the gas supply system A system (Fig. 3(d)).

當時間經過而液化氣體容器11a之殘留氣體率成為30%以下時(經過時間7),氣體供給系統A系統之旁通閥16a開啟,自動開關閥14a關閉,同時氣體供給系統B系統之自動開關閥14b開啟。藉此,氣體供給系統B系統之在液化氣體容器11b處所蒸發之氣體開始供給,而成為氣體供給系統A系統、B系統所進行之並聯供給狀態(步驟54)。此時, 氣體供給系統A系統之供給壓力係藉由開啟旁通閥16a而氣體通過壓力損失較小之旁通經由路徑17a,故而來自氣體供給系統A系統之氣體供給壓力上升至減壓閥二次側設定壓力的0.5MPa以上。 When the time passes and the residual gas rate of the liquefied gas container 11a becomes 30% or less (elapse of time 7), the bypass valve 16a of the gas supply system A system is opened, the automatic opening and closing valve 14a is closed, and the automatic switching of the gas supply system B system Valve 14b is open. As a result, the gas evaporated in the liquefied gas container 11b of the gas supply system B system starts to be supplied, and becomes a parallel supply state by the gas supply system A system and the B system (step 54). at this time, The supply pressure of the gas supply system A system is such that the gas passage pressure of the gas supply system A system rises to the secondary side of the pressure reducing valve by opening the bypass valve 16a and bypassing the passage of the gas with a small pressure loss. The pressure is 0.5 MPa or more.

於此並聯供給狀態下,藉由液化氣體的蒸發而兩液化氣體容器11a、11b之殘留氣體率均降低。氣體供給系統A系統之供給壓力係因為氣體通過旁通經由路徑17a,而在並聯供給開始後隨即成為0.5MPa以上之壓力,隨著液化氣體容器11a之殘留氣體率的降低所造成之蒸發量減少,則供給壓力逐漸下降。另一方面,氣體供給系統B系統之供給壓力係透過減壓閥13b而維持在0.5MPa。當隨著氣體供給系統A系統之液化氣體蒸發量的減少,而氣體供給系統A系統之氣體流量逐漸減少時,以氣體供給系統A系統之氣體流量與氣體供給系統B系統之氣體流量的總和成為300L/min之方式,氣體供給系統B系統之氣體流量逐漸增加。 In the parallel supply state, the residual gas ratio of both the liquefied gas containers 11a and 11b is lowered by evaporation of the liquefied gas. The supply pressure of the gas supply system A system is such that the gas passes through the path 17a and becomes a pressure of 0.5 MPa or more immediately after the start of the parallel supply, and the evaporation amount decreases as the residual gas rate of the liquefied gas container 11a decreases. , the supply pressure is gradually decreasing. On the other hand, the supply pressure of the gas supply system B system is maintained at 0.5 MPa through the pressure reducing valve 13b. When the amount of liquefied gas vaporization of the gas supply system A system decreases, and the gas flow rate of the gas supply system A system gradually decreases, the sum of the gas flow rate of the gas supply system A system and the gas flow rate of the gas supply system B system becomes In the manner of 300 L/min, the gas flow rate of the gas supply system B system is gradually increased.

當依並聯供給狀態之時間經過而液化氣體容器11a之殘留氣體率成為3%以下時(經過時間12),關閉氣體供給系統A系統之旁通閥16a,停止來自氣體供給系統A系統之氣體供給(步驟56),成為來自氣體供給系統B系統之單獨供給(步驟57)。於由氣體供給系統B系統之單獨供給開始至液化氣體容器11b之殘留氣體率為30%以下的期間,交換氣體供給系統A系統之液化氣體容器11a,而成為液化氣體容器 11a之殘留氣體率為100%之待機狀態(經過時間14,步驟60)。 When the residual gas rate of the liquefied gas container 11a is 3% or less in accordance with the time of the parallel supply state (the elapsed time 12), the bypass valve 16a of the gas supply system A system is closed, and the gas supply from the gas supply system A system is stopped. (Step 56), it becomes a separate supply from the gas supply system B system (step 57). When the residual gas rate of the liquefied gas container 11b is 30% or less from the start of the supply of the gas supply system B, the liquefied gas container 11a of the gas supply system A system is exchanged to become the liquefied gas container. The residual gas rate of 11a is 100% standby state (elapse time 14, step 60).

其後,當液化氣體容器11b之殘留氣體率成為30%以下時,成為氣體供給系統A系統與氣體供給系統B系統之並聯供給狀態(經過時間18,步驟62),當液化氣體容器11b之殘留氣體率成為3%以下時,成為氣體供給系統A系統之單獨供給(經過時間23,步驟65)。在依圖2所示順序連續地進行氣體供給的期間,液化氣體容器11a、11b的殘留氣體率、氣體供給系統A系統、B系統之供給壓力、氣體供給系統A系統、B系統之流量以及自動開關閥14a、14b及旁通閥16a、16b之開關狀態係如圖3所示般,隨著時間的經過,在氣體供給系統A系統、B系統處反複進行相同變化,藉以連續供給經控制流量為300L/min之氣體至氣體使用目標處,而液化氣體容器11a、11b內之液化氣體可利用至殘留氣體率成為3%為止。 After that, when the residual gas rate of the liquefied gas container 11b is 30% or less, the gas supply system A system and the gas supply system B are connected in parallel (elapse time 18, step 62), and the liquefied gas container 11b remains. When the gas rate is 3% or less, it becomes a separate supply of the gas supply system A system (elapse time 23, step 65). The residual gas rate of the liquefied gas containers 11a and 11b, the supply pressure of the gas supply system A system, the B system, the flow rate of the gas supply system A system, the B system, and the automatic flow during the gas supply in the order shown in Fig. 2 The switching states of the on-off valves 14a and 14b and the bypass valves 16a and 16b are as shown in Fig. 3. As time passes, the same changes are repeatedly performed in the gas supply system A system and the B system, whereby the controlled flow is continuously supplied. The target gas is used for the gas to gas of 300 L/min, and the liquefied gas in the liquefied gas containers 11a and 11b can be used until the residual gas rate becomes 3%.

於本形態例所示之氣體供給方法中,在並聯供給開始後隨即利用旁通閥16a、16b之其一成為開啟狀態,則使用目標處氣體供給經由路徑18之壓力會暫時變高,如圖1所示液化氣體供給裝置般,設置減壓器20於氣體供給系統A系統、B系統經合流後之使用目標處氣體供給經由路徑18上,使供給至氣體使用目標處之氣體壓力低於上述減壓閥二次側設定壓力之0.5MPa,氣體使用目標處藉由調整為所期望 之壓力,則可防止供給氣體之壓力變動和流量變動。另外,當此類減壓器組裝入氣體使用目標處之設備時,可省略使用目標處氣體供給經由路徑18之減壓器20。 In the gas supply method shown in the present embodiment, when one of the bypass valves 16a and 16b is turned on immediately after the start of the parallel supply, the pressure of the target gas supply via the path 18 is temporarily increased, as shown in the figure. In the same manner as the liquefied gas supply device shown in Fig. 1, the gas pressure supply unit A and the system B are connected to each other after the gas supply system A and the B system are merged, and the gas pressure supplied to the gas use target is lower than the above. The pressure on the secondary side of the pressure reducing valve is set to 0.5 MPa, and the gas use target is adjusted to the desired The pressure prevents fluctuations in the pressure and flow rate of the supply gas. In addition, when such a pressure reducer group is installed in the apparatus at the gas use target, the pressure reducer 20 via the path 18 using the target gas supply may be omitted.

此外,在本發明方法之形態例中,於殘留氣體率成為3%以下時,自動將氣體供給由並聯切換為單獨,而進行液化氣體容器之交換,亦可於殘留氣體率成為30%以下並進行並聯供給時,輸出例如警報等而由人為操作將氣體供給由並聯切換為單獨,同時進行液化氣體容器之交換。 Further, in the embodiment of the method of the present invention, when the residual gas ratio is 3% or less, the gas supply is automatically switched from parallel to separate, and the liquefied gas container is exchanged, and the residual gas rate may be 30% or less. When the parallel supply is performed, for example, an alarm or the like is output, and the gas supply is switched from the parallel to the individual by the human operation, and the liquefied gas container is exchanged.

又,雖舉氣體供給系統為2系統之例子來做說明,但已可同樣設定為氣體供給系統為3系統以上之情形,例如,可為第一系統在氣體供給中,第二系統為第一待機狀態,第三系統為第二待機狀態,於切換為來自第二系統之氣體供給時,則為第三系統為第一待機狀態,而第一系統為第二待機狀態,藉此,可拉長交換液化氣體容器之時間,可提升液化氣體供給裝置之複聯(redundancy)性。此外,在氣體供給系統為3系統以上之情形時,可設定為殘留氣體率低之第一系統為第一氣體供給狀態,殘留氣體率高之第二系統為第二氣體供給狀態,第三系統以下則為待機狀態,而於第一系統進行容器交換而成為待機狀態時,可設定為殘留氣體率低之第二系統為第一氣體供給狀態,殘留氣體率高之第三系統為第二氣體供給狀態,藉此,亦可對應於大量的氣體供給。 Further, although the gas supply system is described as an example of two systems, the gas supply system may be similarly set to three or more systems. For example, the first system may be in the gas supply, and the second system may be the first system. In the standby state, the third system is in the second standby state. When switching to the gas supply from the second system, the third system is in the first standby state, and the first system is in the second standby state, whereby the pullable The time for long exchange of the liquefied gas container can enhance the redundancy of the liquefied gas supply device. Further, when the gas supply system is three or more systems, the first system in which the residual gas rate is low may be the first gas supply state, and the second system in which the residual gas rate is high is the second gas supply state, and the third system The following is a standby state, and when the first system performs container exchange and is in a standby state, the second system in which the residual gas rate is low is set to be the first gas supply state, and the third system in which the residual gas rate is high is the second gas. The supply state, by this, can also correspond to a large amount of gas supply.

另外,液化氣體之種類並沒有特別限定,又,檢測出液化 氣體容器內之液化氣體量的液化氣體量檢測手段係不侷限於重量計,只要是可檢測出液化氣體容器內之液化氣體量的話,可使用任意手段,例如,亦可使用各種液面計。此外,也可以使用壓力計而間接性檢測出液化氣體容器內之液化氣體量。又,用以切換供給狀態之殘留氣體率的數值亦可因應氣體種類或供給壓力、供給量等條件而適當設定。此外,在液化氣體容器上,可在法令(一般高壓氣體保安規則第60條)所允許的範圍內附加上加熱該液化氣體容器以促進液化氣體蒸發之手段。 In addition, the type of the liquefied gas is not particularly limited, and liquefaction is detected. The means for detecting the amount of liquefied gas in the amount of the liquefied gas in the gas container is not limited to the weight meter. Any means can be used as long as the amount of the liquefied gas in the liquefied gas container can be detected. For example, various liquid level meters can be used. Further, the amount of liquefied gas in the liquefied gas container may be indirectly detected using a pressure gauge. Further, the value of the residual gas rate for switching the supply state may be appropriately set depending on conditions such as the type of gas, the supply pressure, and the supply amount. In addition, on the liquefied gas container, a means for heating the liquefied gas container to promote evaporation of the liquefied gas may be additionally added within the range permitted by the decree (General Pressure Gas Security Code, Article 60).

11a、11b‧‧‧液化氣體容器 11a, 11b‧‧‧ liquefied gas containers

12a、12b‧‧‧重量計 12a, 12b‧‧‧ weight meter

13a、13b‧‧‧減壓閥 13a, 13b‧‧‧ Pressure reducing valve

14a、14b‧‧‧自動開關閥 14a, 14b‧‧‧Automatic on-off valve

15a、15b‧‧‧減壓經由路徑 15a, 15b‧‧‧Decompression via path

16a、16b‧‧‧旁通閥 16a, 16b‧‧‧ bypass valve

17a、17b‧‧‧旁通經由路徑 17a, 17b‧‧‧ Bypass path

18‧‧‧使用目標處氣體供給經由路徑 18‧‧‧Use the target gas supply via the path

19‧‧‧控制手段 19‧‧‧Control means

20‧‧‧減壓器 20‧‧‧Reducer

21a、21b、22‧‧‧壓力計 21a, 21b, 22‧‧‧ pressure gauge

51~68‧‧‧步驟 51~68‧‧‧Steps

A‧‧‧A系統 A‧‧‧A system

B‧‧‧B系統 B‧‧‧B system

圖1係表示本發明之液化氣體供給裝置之一形態例的系統圖。 Fig. 1 is a system diagram showing an example of a form of a liquefied gas supply device of the present invention.

圖2係表示本發明之液化氣體供給方法之一形態例的流程圖。 Fig. 2 is a flow chart showing an example of the form of the liquefied gas supply method of the present invention.

圖3(a)至3(d)係表示本發明方法之氣體供給中之液化氣體容器內之殘留氣體率、供給壓力、流量及減壓閥之狀態變化的說明圖。 3(a) to 3(d) are explanatory views showing changes in the state of the residual gas rate, the supply pressure, the flow rate, and the state of the pressure reducing valve in the liquefied gas container in the gas supply of the method of the present invention.

11a、11b‧‧‧液化氣體容器 11a, 11b‧‧‧ liquefied gas containers

12a、12b‧‧‧重量計 12a, 12b‧‧‧ weight meter

13a、13b‧‧‧減壓閥 13a, 13b‧‧‧ Pressure reducing valve

14a、14b‧‧‧自動開關閥 14a, 14b‧‧‧Automatic on-off valve

15a、15b‧‧‧減壓經由路徑 15a, 15b‧‧‧Decompression via path

16a、16b‧‧‧旁通閥 16a, 16b‧‧‧ bypass valve

17a、17b‧‧‧旁通經由路徑 17a, 17b‧‧‧ Bypass path

18‧‧‧使用目標處氣體供給經由路徑 18‧‧‧Use the target gas supply via the path

19‧‧‧控制手段 19‧‧‧Control means

20‧‧‧減壓器 20‧‧‧Reducer

21a、21b‧‧‧壓力計 21a, 21b‧‧‧ pressure gauge

22‧‧‧壓力計 22‧‧‧ Pressure gauge

A‧‧‧A系統 A‧‧‧A system

B‧‧‧B系統 B‧‧‧B system

Claims (4)

一種液化氣體供給裝置,係使於複數個液化氣體容器內所填充之液化氣體蒸發而供給至氣體使用目標處者,其係具備有:分別連接於複數個氣體供給系統之液化氣體容器;分別檢測各個液化氣體容器內之液化氣體量之液化氣體量檢測手段;具有分別設置在各個氣體供給系統之減壓手段的減壓經由路徑;分別設置在各個氣體供給系統之氣體供給阻斷手段;使由複數個氣體供給系統所供給之氣體合流,而供給至氣體使用目標處之使用目標處氣體供給經由路徑;及依壓力損失小於上述減壓經由路徑之狀態,而透過旁通閥將上述減壓經由路徑之減壓手段之一次側與二次側予以分別連接之旁通經由路徑;又,在各個氣體供給系統上具備有根據利用上述液化氣體量檢測手段所檢測出之液化氣體容器內之液化氣體量,而分別開關控制上述氣體供給阻斷手段及上述旁通閥的控制手段。 A liquefied gas supply device that evaporates a liquefied gas filled in a plurality of liquefied gas containers and supplies the target gas to a gas use target, and is provided with a liquefied gas container respectively connected to a plurality of gas supply systems; a liquefied gas amount detecting means for liquefied gas amount in each liquefied gas container; a pressure reducing passage path provided in each of the gas supply means of the pressure reducing means; and a gas supply blocking means provided in each gas supply system; The gas supplied from the plurality of gas supply systems merges, and is supplied to the gas supply passage path of the use target at the gas use target; and the pressure is reduced by the state of the pressure reduction passage passage, and the pressure reduction is performed through the bypass valve via the bypass valve a bypass passage through which the primary side and the secondary side of the path decompression means are respectively connected; and each of the gas supply systems is provided with a liquefied gas in the liquefied gas container detected by the liquefied gas amount detecting means And respectively switch and control the above gas supply blocking means and the above Through the control valve means. 如申請專利範圍第1項之液化氣體供給裝置,其中,上述使用目標處氣體供給經由路徑係具備有壓力調整器,其係將由上述氣體供給系統所供給之氣體壓力調整為低於上述減壓手段所設定之壓力的預先所設定之壓力。 The liquefied gas supply device according to claim 1, wherein the gas supply passage through the use target includes a pressure regulator that adjusts a gas pressure supplied from the gas supply system to be lower than the pressure reduction means. The pre-set pressure of the set pressure. 一種液化氣體供給方法,係使用申請專利範圍第1或2項之液化氣體供給裝置,而對上述氣體使用目標處連續性進行氣體供給者,其特徵為,上述控制手段係在由第一液化氣 體量檢測手段所檢測出之第一液化氣體容器內之液化氣體量超過預先所設定之第一殘留氣體量設定值時,依關閉在第二氣體供給系統上所設置之第二氣體供給阻斷手段及第二旁通閥之狀態,而設定為開啟在第一氣體供給系統上所設置之第一氣體供給阻斷手段且關閉第一旁通閥之狀態,利用第一減壓手段將於第一液化氣體容器中所蒸發之氣體予以減壓而施行氣體供給,又,在由第一液化氣體量檢測手段所檢測出之第一液化氣體容器內之液化氣體量成為上述第一殘留氣體量設定值以下時,開啟在第一氣體供給系統上所設置之第一旁通閥,並經由第一旁通閥而供給於第一液化氣體容器中所蒸發之氣體,同時依關閉在第二氣體供給系統上所設置之第二旁通閥之狀態,設定為開啟第二氣體供給阻斷手段之狀態,而由第一氣體供給系統與第二氣體供給系統雙方來並聯施行氣體供給。 A method for supplying a liquefied gas using a liquefied gas supply device according to claim 1 or 2, wherein a gas supplier is continuously supplied to the gas use target, wherein the control means is based on the first liquefied gas. When the amount of liquefied gas in the first liquefied gas container detected by the mass detecting means exceeds the set value of the first residual gas amount set in advance, the second gas supply provided on the second gas supply system is blocked by closing. And the state of the second bypass valve is set to open the first gas supply blocking means provided on the first gas supply system and close the first bypass valve, and the first decompression means is to be used The gas evaporated in the liquefied gas container is depressurized to supply the gas, and the amount of the liquefied gas in the first liquefied gas container detected by the first liquefied gas amount detecting means becomes the first residual gas amount setting. When the value is lower, the first bypass valve provided on the first gas supply system is opened, and the gas evaporated in the first liquefied gas container is supplied through the first bypass valve while being closed in the second gas supply The state of the second bypass valve provided on the system is set to open the state of the second gas supply blocking means, and the first gas supply system and the second gas supply system are both Parallel gas supply purposes. 如申請專利範圍第3項之液化氣體供給方法,其中,在利用上述第一液化氣體量檢測手段所檢測出之上述第一液化氣體容器內之液化氣體量,成為少於上述第一殘留氣體量設定值之液化氣體量而設定之第二殘留氣體量設定值以下時,關閉第一氣體供給阻斷手段及第一旁通閥,以停止來自第一氣體供給系統的氣體供給,而切換為來自第二氣體供給系統的氣體供給。 The liquefied gas supply method according to the third aspect of the invention, wherein the amount of the liquefied gas in the first liquefied gas container detected by the first liquefied gas amount detecting means is less than the first residual gas amount When the set value of the liquefied gas is equal to or lower than the set second residual gas amount setting value, the first gas supply blocking means and the first bypass valve are closed to stop the gas supply from the first gas supply system, and the switching is from Gas supply to the second gas supply system.
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