201226846 六、發明說明： 【發明所屬之技術領域】 本發明是有關於一種量測系統，特別是指一種角度量 測系統。 【先前技術】 工作物在施工的過程中是否有因為外力或本身運作的 震動而產生偏轉，對於工作物施工的精密度有顯著影響， 目前有以下三種方式可以量測工作物在運作前後的角度變 化量，但各種方法分別有其不易克服的缺點，而造成使用 上的不便。 1.台灣公告第Π20480號「―種繞射式六自由度光電量 測系統」專利案··本專利案是以繞射式干涉法進行量測， 但本專利案所使用的量測儀器價格昂貴，且難以達成連續 旋轉量測。 θ 2.台灣公告第1320478號「一種二維光電式高精度角度 量別系統」專利案.本專利案是以多重反射法的原理進行 角度量測，但是本專利案具有架構精度要求高，不易設置 荨缺點。 ϊ •台灣公告第Μ362062號「放電加工機的工作台」專 利案：本專利案是以光學尺量測法進行量測，但本專利案 在實際使用時的量測精度不足。 點，一直是本技術領域 所以，如何改善以上所述的缺 者持續努力的重要目標。 【發明内容】 201226846 因此，本發明之目的，即在提供一種設置成本低並能 量測微小角度變化量的角度量測系統。 於是，本發明角度量測系統，用以量測一待測物以其 一中心轉動的微角度變化量，該角度量測系統包含一干涉 狀態產生單元、一光源單元，以及一接收分析單元。 該干涉狀態產生單元包括多數對應該待測物成等角度 地«又置於以該中心為圓心的一圓周線上的稜鏡，以及多數 分別與每一稜鏡相對設置而能將通過稜鏡後的光反射的反 射鏡。 該光源單元能產生一可被分光行進至所述稜鏡的單頻 同調光束。 該接收分析單元接收該光源單元發出並被分光行進至 每一稜鏡後，被每一反射鏡反射的光所形成的干涉狀態， 並比對該待測物轉動前後的干涉狀態後進行運算而得到該 待測物轉動的微角度變化量。 本發明的功效在於：藉由該干涉狀態產生單元的設置 方式’使該接收分析單元能藉由比對該待測物轉動前後的 干涉狀態而運算出微角度變化量，本發明角度量測系統具 有設置成本低、設置簡單、量測精度高等優點。 【實施方式】 有關本發明之前述及其他技術内容、特點與功效，在 以下配合參考圖式之一個較佳實施例的詳細說明中，將可 清楚的呈現。 參閱圖1 ’為本發明角度量測系統的較佳實施例，用以 201226846 量測一待測物2以其一中心L1轉動的微角度變化量。在本 較佳實施例中，該待測物2是在運作時會產生震動而導致 轉動進而產生角度變化的加工設備。 本發明角度量測系統包含一干涉狀態產生單元3、一光 源單元4，以及一接收分析單元5。 該干涉狀態產生單元3包括多數對應該待測物2成等 角度地設置於以該中心L1為圓心的一圓周線L2上的稜鏡 31 ’以及多數分別與每一棱鏡31相對設置而能將通過稜鏡 31後的光反射的反射鏡32。在本較佳實施例中，該圓周線 L2為該待測物2的周緣，且所述稜鏡31是設置於該待測物 2上；因此當該待測物2因震動產生轉動時會連動所述稜鏡 31如圖2所示產生位移，而所述反射鏡32則是相對於所述 稜鏡31不動地設置。在本較佳實施例中是以四個稜鏡3 i 與四個反射鏡32作說明。另外，所述稜鏡31依順時針分 別定義為第一稜鏡31a、第二稜鏡31b、第三稜鏡31c、第 四稜鏡31d。 該光源單元4能產生一可被分光行進至所述棱鏡31的 單頻同調光束61。在本較佳實施例中，該光源單元*包括 一能產生該單頻同調光束61的雷射光源41、一設置於該皐 頻同調光束61路徑上並能將該單頻同調光束61分為〆第 一反射光束62與一第一穿透光束63的第—分光鏡42 設置於該第一反射光束62路徑上並能將該第一反射光束62 分為一第二反射光束64與一第二穿透光束65的第二分光 鏡43、一权置於該第一穿透光束63路獲上並能將該第〆穿 5 201226846 透光束63分為一第三反射光束66與一第三穿透光束67的 第三分光鏡44，以及一能將該第三穿透光束67反射入該第 三稜鏡31c内的反射角鏡45。 透過該第一分光鏡42、第二分光鏡43、第三分光鏡44 、反射角鏡45相配合而能使該第二穿透光束65通過該第 一稜鏡31a，該第一反射光束64是通過該第二稜鏡31b，該 第三反射光束66是通過該第四稜鏡31d。 該接收为析單元5能接收該光源單元4發出並被分光 行進至每-稜鏡31後，被每一反射鏡32反射的光所形成 的干涉狀態，並比對該待測物2轉動前後的干涉狀態後進 行運算而得到該待測物2轉動的微角度變化量。在本較佳 實施例中，該接收分析單元5包括二能接收干涉狀態的電 荷耦合元彳51，以及—能進行運算的運算器52。特別說明 的是，在本較佳實施例中是以兩個電荷耦合元件Η作說明 ’當然只使用-個也能達到相同功效，不應以本較佳實施 例所揭露的内容為限。在本較佳實施例中該運算器兄是電 腦，當然也可以使用其他具有運算功能的裝置，不以本較 佳實施例所揭露的内容為限。 、在該待測物2運作前，絲整所述稜鏡31使光束通過 所述$鏡31並㈣所述反射鏡32反射的光束能被所述電 4搞。7L件5 1所接收並使光束相互影響而能產生干涉狀態 〇 參閱圖1與圖2’接著當該待測物2運作而產生震動偏 轉時會同時連動所述稜鏡31偏轉。如圖2中假想線所繪 201226846 示為邊第一稜鏡31a的原始位置，而實線所繪示為該第一稜 鏡31a偏轉後的位置，由於所述反射鏡32是相對於所述稜 鏡31不動地設置，因此當該第一稜鏡3U偏轉成如圖2的 狀態時，光束的行進路徑就會改變，而造成光束打在反射 鏡32上的位置產生偏移’所以反射光束的移動路徑也會偏 移，並同時造成光程距離改變而產生光程差。光束偏移與 光程差會造成光束在所述電荷耦合元件51上形成部分干涉 現象。特別說明的是，圖2中是以該第一稜鏡31a在偏移狀 態下作說明，其他稜鏡31b、31c、31d也是以同樣的方式產 生光路位移，不再多加贅述。 接著再利用該運算器52對偏轉前的干涉狀態與偏轉後 的干涉狀態進行運算，就能算出所述稜鏡31的偏轉角度， 進而得知該待測物2在運作前後的微角度變化量。 因此在實際使用上，本發明角度量測系統具有設置成 本低、設置簡單、量測精度高等優點。 特別說明的是，在本較佳實施例中是以四個稜鏡31、 四個反射鏡32相配合設置的態樣作說明，當然稜鏡31與 反射鏡32的數量只要是兩個以上，且為等角度設置就能據 以實施，不應以本較佳實施例所揭露的内容為限。另外， 所述分光鏡的目的是用以將該雷射光源41所發出的單頻同 調光束61分給各個稜鏡31。利用所述分光鏡可以減少雷射 光源41的使用數量，進而達到降低設置成本的目的。在本 較佳實施例中，當然也可以直接設置四個雷射光源41，並 將所述雷射光源41所產生的雷射光束直接射入相對應的稜 201226846 鏡+，也能達到測量微角度的目的，但是這樣的設置方 式成本較南。 〇综上所述，本發明角度量測系統藉由該干涉狀態產生 皁το 3的設置方式’使該接收分析單元5能藉由比對該待 測物2轉動前後的干涉狀態而運算出微角度變化量本發 明角度量測系統具有設置成本低、設置簡單、量測精度高 等優點，故確實能達成本發明之目的。 惟以上所述者，僅為本發明之較佳實施例而已，當不 能以此限定本發明實施之範圍，即大凡依本發明申請專利 範圍及發明說明内容所作之簡單的等效變化與修飾，皆仍 屬本發明專利涵蓋之範圍内。 【圖式簡單說明】 圖1是一示意圖，說明本發明角度量測系統的較佳實 施例；以及 圖2是一示意圖，說明該較佳實施例中的稜鏡在偏轉 時的狀態。 201226846 【主要元件符號說明】 2 ···· …·待測物 43… …第 二分光鏡 L1 .· …·中心 44··· …第三分光鏡 L2 ·· •圓周線 45 ··· …反射角鏡 3 .... …·干涉狀態產生單元 5…. …接收分析單元 31··· —棱鏡 51… …電荷耦合元件 31a · —第棱鏡 52··· …運算器 31b· •…第二稜鏡 61 ··· …單頻同調光束 31c · —第—棱鏡 62.·· …第 一反射光束 31d· .…第四稜鏡 63 ··· …第 一穿透光束 32··· •…反射鏡 64··. …第 二反射光束 /| · · · · —光源單元 65··· …第 二穿透光束 41··. •…雷射光源 66... …第 三反射光束 42·.. …·第一分光鏡 67··· …第 三穿透光束201226846 VI. Description of the Invention: [Technical Field of the Invention] The present invention relates to a measurement system, and more particularly to an angle measurement system. [Prior Art] Whether the work object is deflected due to the external force or the vibration of its own operation during the construction process, which has a significant influence on the precision of the work construction. At present, there are three ways to measure the angle of the work object before and after the operation. The amount of change, but each method has its own shortcomings that are difficult to overcome, resulting in inconvenience in use. 1. Taiwan Announcement No. 20480 "------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------ It is expensive and it is difficult to achieve continuous rotation measurement. θ 2. Taiwan Patent No. 1320478 “A two-dimensional photoelectric high-precision angle measurement system” patent case. This patent case is based on the principle of multiple reflection method for angular measurement, but this patent case has high structural precision requirements and is difficult to Set defects. ϊ • Taiwan Announcement No. 362062 “Working Table for EDM” Patent: This patent case is measured by optical ruler measurement method, but the measurement accuracy of this patent case is insufficient in actual use. Point, has always been the technical field, so how to improve the important goals of the above-mentioned lack of continuous efforts. SUMMARY OF THE INVENTION 201226846 Accordingly, it is an object of the present invention to provide an angle measuring system that is inexpensive to set up and capable of measuring a small amount of change in angle. Therefore, the angle measuring system of the present invention is configured to measure a micro angular change amount of a test object with a center rotation, the angle measuring system comprising an interference state generating unit, a light source unit, and a receiving analyzing unit. The interference state generating unit includes a plurality of 稜鏡 which are placed at an equiangular angle to the object to be tested, and are placed on a circumference line centered on the center, and a plurality of 分别 are respectively disposed opposite to each 而 and can pass through the 稜鏡Light reflecting mirror. The light source unit is capable of generating a single frequency coherent beam that can be split to travel to the pupil. The receiving and analyzing unit receives an interference state formed by the light reflected by each of the mirrors after the light source unit emits and is split and travels to each of the mirrors, and performs an operation after the interference state before and after the object to be tested is rotated. A micro angular change amount of the rotation of the object to be tested is obtained. The effect of the present invention is that the receiving analysis unit can calculate the micro-angle variation amount by the interference state before and after the rotation of the object to be tested by the setting mode of the interference state generating unit, and the angle measuring system of the present invention has The utility model has the advantages of low cost, simple setting and high measurement precision. The above and other technical contents, features, and advantages of the present invention will be apparent from the following detailed description of the preferred embodiments. Referring to Fig. 1 ', a preferred embodiment of the angle measuring system of the present invention is used to measure the amount of micro angular change of a test object 2 rotated by a center L1 thereof by 201226846. In the preferred embodiment, the object to be tested 2 is a processing device that generates vibrations during operation and causes rotation to produce an angular change. The angle measuring system of the present invention comprises an interference state generating unit 3, a light source unit 4, and a receiving analyzing unit 5. The interference state generating unit 3 includes a plurality of turns 31' corresponding to the object 2 to be measured at an equiangular angle on a circumferential line L2 centered on the center L1, and most of which are disposed opposite to each of the prisms 31, respectively. The mirror 32 is reflected by the light after the 稜鏡 31. In the preferred embodiment, the circumference line L2 is the circumference of the object to be tested 2, and the crucible 31 is disposed on the object to be tested 2; therefore, when the object to be tested 2 is rotated due to vibration The 稜鏡 31 is interlocked as shown in FIG. 2, and the mirror 32 is fixedly disposed relative to the cymbal 31. In the preferred embodiment, four 稜鏡3 i and four mirrors 32 are illustrated. Further, the crucibles 31 are defined clockwise as the first weir 31a, the second weir 31b, the third weir 31c, and the fourth weir 31d. The light source unit 4 is capable of generating a single-frequency coherent light beam 61 that can be split to the prism 31. In the preferred embodiment, the light source unit* includes a laser source 41 capable of generating the single-frequency coherent beam 61, a path disposed on the chirp-frequency coherent beam 61, and capable of dividing the single-frequency coherent beam 61 into The first reflected beam 62 and the first beam splitter 42 of the first transmitted beam 63 are disposed on the path of the first reflected beam 62 and can divide the first reflected beam 62 into a second reflected beam 64 and a first The second beam splitter 43 of the penetrating beam 65 is disposed on the first penetrating beam 63 and can be divided into a third reflected beam 66 and a third by the second through-beam 5 201226846 A third beam splitter 44 penetrating the beam 67, and a reflecting angle mirror 45 capable of reflecting the third penetrating beam 67 into the third weir 31c. The first beam splitter 42 is matched by the first beam splitter 42 , the second beam splitter 43 , the third beam splitter 44 , and the reflection angle mirror 45 to pass the second transmitted beam 65 through the first buffer 31 a. It is through the second turn 31b that the third reflected beam 66 passes through the fourth turn 31d. The receiving unit 5 can receive the interference state formed by the light reflected by each of the mirrors 32 after the light source unit 4 emits and is split and travels to each of the mirrors 31, and is rotated before and after the object 2 is rotated. After the interference state, an operation is performed to obtain a micro angular change amount of the object 2 to be rotated. In the preferred embodiment, the receiving analysis unit 5 includes two charge coupling elements 51 capable of receiving an interference state, and an arithmetic unit 52 capable of performing an operation. In particular, in the preferred embodiment, two charge-coupled components are used for the description. Of course, only one can achieve the same effect, and should not be limited to the contents disclosed in the preferred embodiment. In the preferred embodiment, the operator is a computer. Of course, other devices having arithmetic functions may be used, and are not limited to the contents disclosed in the preferred embodiment. Before the operation of the object to be tested 2, the enthalpy 31 is made to pass the light beam through the $ mirror 31 and (4) the light beam reflected by the mirror 32 can be engaged by the electricity. The 7L member 51 receives and causes the light beams to interact with each other to generate an interference state. 参阅 Referring to Fig. 1 and Fig. 2', when the object 2 is operated to generate a vibration deflection, the 稜鏡 31 is simultaneously deflected. 201226846 as shown by the imaginary line in FIG. 2 is shown as the original position of the first side 31a, and the solid line is shown as the position after the first 稜鏡31a is deflected, since the mirror 32 is opposite to the The crucible 31 is fixedly disposed, so when the first crucible 3U is deflected into the state of FIG. 2, the traveling path of the light beam changes, causing the position of the beam to strike on the mirror 32 to be shifted' so that the reflection The moving path of the beam is also shifted, and at the same time, the optical path distance is changed to produce an optical path difference. The beam shift and the optical path difference cause the beam to form a partial interference phenomenon on the charge coupled element 51. In particular, in Fig. 2, the first turns 31a are illustrated in an offset state, and the other turns 31b, 31c, and 31d also generate optical path displacements in the same manner, and will not be described again. Then, the operator 52 calculates the interference state before the deflection and the interference state after the deflection, and can calculate the deflection angle of the crucible 31, and further know the amount of micro-angle change of the object 2 before and after the operation. . Therefore, in practical use, the angle measuring system of the invention has the advantages of low setting cost, simple setting, high measuring precision and the like. Specifically, in the preferred embodiment, the four 稜鏡31 and the four mirrors 32 are arranged to match each other. Of course, the number of the 稜鏡31 and the mirror 32 is two or more. It can be implemented in an equiangular setting, and should not be limited to the contents disclosed in the preferred embodiment. Further, the purpose of the beam splitter is to distribute the single-frequency sync beam 61 emitted from the laser source 41 to the respective turns 31. The use of the beam splitter can reduce the number of uses of the laser source 41, thereby achieving the purpose of reducing the installation cost. In the preferred embodiment, of course, four laser light sources 41 may be directly disposed, and the laser beam generated by the laser light source 41 may be directly incident into the corresponding edge 201226846 mirror +, and the measurement micro can also be achieved. The purpose of the angle, but the cost of such a setup is relatively south. In summary, the angle measuring system of the present invention generates the micro angle by the interference state of the interference state generating soap το 3 to enable the receiving analysis unit 5 to calculate the interference state before and after the rotation of the object 2 to be tested. The amount of change The angle measurement system of the present invention has the advantages of low installation cost, simple setup, high measurement accuracy, and the like, so that the object of the present invention can be achieved. The above is only the preferred embodiment of the present invention, and the scope of the invention is not limited thereto, that is, the simple equivalent changes and modifications made by the scope of the invention and the description of the invention are All remain within the scope of the invention patent. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a schematic view showing a preferred embodiment of the angle measuring system of the present invention; and Fig. 2 is a schematic view showing the state of the crucible in the preferred embodiment when deflected. 201226846 [Explanation of main component symbols] 2 ······Substance 43......Second beam splitter L1 .···Center 44··· Third beam splitter L2 ·· •Circle line 45 ··· ... Reflection angle mirror 3 ..... interference state generating unit 5 .... receiving analysis unit 31 · · · prism 51 ... charge coupled element 31 a · - prism 52 · ... ... ... arithmetic unit 31b · • ...稜鏡 61 ··· ... single-frequency coherent light beam 31c · - first prism 62. ... first reflected light beam 31d · .... fourth 稜鏡 63 · · · ... first penetrating beam 32 ··· ...reflector 64··....second reflected beam/|······light source unit 65···...second penetrating beam 41··.•...laser source 66...the third reflected beam 42 ·.. ...·first beam splitter 67···...the third penetrating beam