TW201220574A - Method for manufacturing organic electroluminescence display device and organic electroluminescence display device - Google Patents

Method for manufacturing organic electroluminescence display device and organic electroluminescence display device Download PDF

Info

Publication number
TW201220574A
TW201220574A TW100125403A TW100125403A TW201220574A TW 201220574 A TW201220574 A TW 201220574A TW 100125403 A TW100125403 A TW 100125403A TW 100125403 A TW100125403 A TW 100125403A TW 201220574 A TW201220574 A TW 201220574A
Authority
TW
Taiwan
Prior art keywords
group
formula
substituent
represented
polymer
Prior art date
Application number
TW100125403A
Other languages
Chinese (zh)
Inventor
Yoshinobu Ono
Original Assignee
Sumitomo Chemical Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Chemical Co filed Critical Sumitomo Chemical Co
Publication of TW201220574A publication Critical patent/TW201220574A/en

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/10—Organic polymers or oligomers
    • H10K85/111—Organic polymers or oligomers comprising aromatic, heteroaromatic, or aryl chains, e.g. polyaniline, polyphenylene or polyphenylene vinylene
    • H10K85/115—Polyfluorene; Derivatives thereof
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
    • H10K50/17—Carrier injection layers
    • H10K50/171—Electron injection layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/10—Organic polymers or oligomers
    • H10K85/151—Copolymers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K2102/00—Constructional details relating to the organic devices covered by this subclass
    • H10K2102/301—Details of OLEDs
    • H10K2102/321—Inverted OLED, i.e. having cathode between substrate and anode
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/17—Passive-matrix OLED displays
    • H10K59/173—Passive-matrix OLED displays comprising banks or shadow masks
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/30—Devices specially adapted for multicolour light emission
    • H10K59/35—Devices specially adapted for multicolour light emission comprising red-green-blue [RGB] subpixels
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating

Abstract

A method of this invention includes: a step of commonly dispensing a liquid containing ionic polymer as electron injective material on a substrate formed with a plurality of cathodes corresponding to respective pixels and forming a film from the liquid, thereby forming an electron injection layer, a step of dispensing a liquid containing a luminescent material on the electron injection layer and forming a film from the liquid, or dispensing a liquid containing a luminescent material on a layer other than luminescent layer after the layer other than luminescent layer being formed on the electron injection layer and forming a film from the liquid, thereby forming a luminescent layer, and a step of forming a film of an anode material on the luminescent layer, or forming a film of an anode material on a layer other than anode after the layer other than anode being formed on the luminescent layer.

Description

201220574 六、發明說明： 【發明所屬之技術，域】 本發明係關於〜種有機電激發光顯示裝置的製造方法 及藉由該製造方法所得之有機EL顯示裝置。 【先前技術】 有機電激發先顯示裝置（以下亦有記為有機el顯示 全去h t 成之複數個畫素（pixel)，係藉由每個 : 圖像信號驅動各個有機EL元件的書素 路，而顯示圖像。 京電 陽極顯示裝置之有機el元件’係具有在 之發光層的基本椹f祺方式形成由有機發光性材料所構成 中，在兩極間施力雷。若於具有該基本構成之有機虹元件 入電子。然後，σ電壓，則會從陽極注入電洞，從陰極注 發光。’因電洞與電子在發光層進行再結合而產生 通常，有機ΕΙ 士 μ 到所_的_。=域以上紅基本滅，則難^ 有機層。例如設置主除:發光層之外’亦 電洞》主入層、電洞傳輸層、電子注入層 及電子傳^4作為預定的 上述有機EL ϋ 1七 ^ ^ ^疋件之陽極-陰極間之有機層的形成方 故其特;處空與塗佈法。塗佈法因不需真空製二 成有機EL顯示裝置之大面積化與裝把 珉本低廉。 4 323323 201220574 關於可有欵率地製造除了設有上述發光層以外亦設有 預定有機層的複數個有機EL元件之有機EL顯示裝置之製 造方法，係提案有各種方法。若簡述其中1者，係揭示一 種製造方法’其構成為「首先，於基板上形成陽極圖案’ 然後於其上’藉由塗佈而跨及全部畫素形成連續的連續電 /同'主入層及連續底漆層（primer layer)。在前述連續底漆 層’形成對應晝素之液體封閉圖案。相對於3種該液體封 閉圖案’分別形成3種發光層（RGB之3種類）。然後，跨 及王部晝素而依序形成連續的電子注入層及陰極。」（例如 參照專利文獻丨）。 β專利文獻1所揭示的製造方法中，係從形成於基板上 進行積層’積層電洞注人層後，接著形成發光 層’於其上形成電子注人層後，最後形成陰極。 以有機EL顯示裝置的製造方法而言，除了專利文獻1 二採用之從陽極朝向陰極而依序積層電極及有機層（以下 亦有為了求便而記為「順積層」之情形）之製造方法以外， 亦有從陰極朝向陽極而依順序積層電極及有機層（以下亦 有為了求便而記為「逆積層」之情形）之製造方法。 電子注入層通常係由在空氣中為不安定的材料所構 成。於專利文獻1中，電子注入層係藉由將Ba、BaO、NaF、 等電子注人材料進行氣相沉積所形成，亦即藉由在高 真工中進行蒸鏡所形$。前述電子注入材料係容易與水分 ^氧反應*進行化學變化。專敎獻丨雜用順積層之製 w方法，順積層之S造方;^係可藉由進行真缝鑛而形成 5 323323 ,¾ 201220574 電子庄入層、陰極，因此，可於未觸及空氣之狀況下形成 電子注入層。 然而，當將專利文獻1的技術直接適用於逆積層之有 機EL顯示裝置的製造方法時，貝㈣由真空蒸鍵而形成陰 極電子庄入層之後藉由塗佈法而形成發光層。若於空 就中進行該發光層之形成，則電子注入層容易與水分或氧 反應而導致化學變化。 φ •然為了防止前述電子注入層的化學變化，必須在真 空環境形成發光層，惟在真空環境中，印墨會氣化，因此 就現實狀況而言，實屬不可能。 [專利文獻1]曰本特表2009-540573號公報 【發明内容】 (發明欲解決之課題） 本發明之課題係提供步驟簡易的逆積層之有機EL顯 示裝置的製造方法，以及藉由該製造方法所得之有機乩顯 φ 示裝置。 (解決課題之手段） 本發明者等瞭解到具有特定構造之離子性聚合物在具 有優異的電子注入性的同時，於常壓程度之環境 (atmosphere)中亦為安定，藉由溶解於溶媒而製成溶液， 並將該溶液進行成膜，而可得到於常壓程度之環境中為安 定的電子注入層。本發明係基於此等知識所成者。本發明 係提供採用以下之構成的有機發光顯示裝置的製造方法及 有機EL顯示裝置。 6 323323 201220574 又，本發明所述之「空氣中」’從本發明之目的以廣義 來看’係意指容許含有氧及水分之全部環境。更具體而言， 係包括一般所謂常溫、常壓之未調整的空氣環境，此外， 包括相對於該空氣環境而以原狀包含氧及水分且經調整溫 度、壓力、成分之環境。就經調整之環境而言，包括以可 實施包含「塗佈」的本發明之製造方法作為條件，對空氣 環境進行氮、氫、氧、二氧化碳等組成成分的調整處理、 ^ 調整此等之組成比例的處理，亦可調整浮遊微粒子、浮遊 微生物之相關潔淨度，更進一步以可實施本發明之製造方 法作為條件而可調整溫度、濕度、壓力等環境條件的環境， 其壓力通常為1013hPa±100hPa之常壓。 而且，在以下之說明中，有將基板之厚度方向的一方 向稱為上方（或稱為上），且將基板之厚度方向的另一方向 稱為下方（或稱為下）之情形。此上下關係之敘述乃為了說 明上的便利而設定’並非必然適用於實際上製造有機元 Φ 件之步驟及使用狀況者。 [1] 一種有機電激發光顯示裝置之製造方法，該有機電激 發光顯示裝置具有複數個由有機電激發光元件所構成的晝 素，該有機電激發光元件包含··陽極及陰極、位於此等電 極間之發光層、位於前述陰極與發光層之間的電子注入層； 其中，該有機電激發光顯示裝置之製造方法包括下述 步驟： 準備基板之步驟，該基板形成有對應各晝素之複數個 陰極； 323323 7 201220574 形成電子/主入層之步驟，其係於前述各陰極上塗佈包 ^子性聚合物的溶液’並使該溶液成膜從而形成電子注 人技：成發光層之步驟’其係於前述電子注入居上塗佈包 3發光材料的溶液，並使該溶液成膜從而 是於前述電子注入層上形成發光層以外的 :塗r含發光材料的溶液，—= 形成陽極之步驟，其係於前述發光層 成膜從而形成陽極’或是於前述發光層上形成：極材料： 層後’在該層上將陽極材料製成職而形極以外' [2] 如[1]所述之有機電激發光顯示裝置：。 中，前述形成發光層之步驟係如下述之步驟：乂方法，” 之區域形成撥液圖案，並於該撥液圖案’於晝素以外 含發光材料的溶液，並使該溶液成膜 内部塗怖包 層之步驟。 ^戍複數層發光 [3] 如[1]所述之有機電激發光顯示裴置的 有如下述之步驟：於晝素以外之區 W法’其臭 驟。 成疋防(bank)之少 [4] 一種有機電激發光顯示裝置，其係可藉 任-項所述之有機電激發光顯示裝置的勢、：由[1]至[3]中 【實施方式】 、乂方法所製造。 如先前所述，本發明之有機電激 方法中’财機電激發光顯示裝置具4之製遠 複數個由有機電棼 ί·23323 201220574 發光元件所構成的畫素，該有機電激發光元件包含：陽極 及陰極、位於此等電極間之發光層、位於 層之間的料注人層。其中，财機電激發錢示裝^ 製造方法包括下述步驟： 準備基板之步驟，該基板形成有對應各畫素之複數個 陰極；201220574 VI. Description of the Invention: [Technical Field, Field] The present invention relates to a method for producing an organic electroluminescence display device and an organic EL display device obtained by the method. [Prior Art] The organic electro-excitation first display device (hereinafter also referred to as an organic el display) is a plurality of pixels (pixels) which are all de-ht formed by each of the image signals to drive the respective organic EL elements. The image of the organic EL element of the electro-optical anode display device has a basic structure of the light-emitting layer formed of an organic light-emitting material, and a force is applied between the two poles. The organic rainbow element enters the electron. Then, the σ voltage is injected into the hole from the anode, and the luminescence is injected from the cathode. 'Because the hole and the electron recombine in the light-emitting layer, the organic ΕΙ 到 _ _ _ _. = If the red color is completely off, the organic layer is difficult. For example, the main division: the main layer of the 'Easy Hole', the hole transport layer, the electron injection layer, and the electron transfer layer are set as the predetermined organic EL. ϋ 1 7 ^ ^ ^ The anode-cathode organic layer is formed by the method; the space and the coating method. The coating method does not require vacuum to make the large-area organic display device. The cost of the book is low. 4 323323 201220 574. A method for producing an organic EL display device in which a plurality of organic EL elements having a predetermined organic layer are provided in addition to the above-described light-emitting layer, and various methods are proposed, and one of them is briefly described. Disclosed is a manufacturing method which is constructed as "first, an anode pattern is formed on a substrate" and then thereon, by coating, across the entire pixel to form a continuous continuous electric/same 'primary layer and continuous primer layer ( Primer layer] forming a liquid-enclosed pattern of the corresponding halogen in the continuous primer layer. Three kinds of light-emitting layers (three types of RGB) are formed respectively with respect to the three kinds of the liquid-sealed pattern. Then, the cross-section of the king A continuous electron injecting layer and a cathode are formed in this order (see, for example, Patent Document). In the manufacturing method disclosed in Patent Document 1, a layered layer of a hole injecting a layer is formed on a substrate, and then After the formation of the electron-injecting layer is formed thereon, the cathode is finally formed. In terms of the manufacturing method of the organic EL display device, in addition to the use of the anode-to-cathode in the patent document 12 In addition to the manufacturing method of the laminated electrode and the organic layer (hereinafter referred to as "sequential layer" for convenience), the electrode and the organic layer are laminated in this order from the cathode toward the anode (hereinafter, it is also noted for convenience). A method of manufacturing a "reverse layer". The electron injecting layer is usually made of a material that is unstable in air. In Patent Document 1, the electron injecting layer is made of Ba, BaO, NaF, or the like. The injection material is formed by vapor deposition, that is, by vapor microscopy in a high-quality work. The electron injecting material is easily chemically reacted with moisture and oxygen*. The method of making w, the S-making of the layer; the system can form 5 323323, 3⁄4 201220574 electronic layer and cathode by performing true seam mining, so that the electron injection layer can be formed without touching the air. However, when the technique of Patent Document 1 is directly applied to the manufacturing method of the organic EL display device of the reversed laminate, the luminescent layer is formed by a coating method after the vacuum electrode is formed by vacuum evaporation. If the formation of the light-emitting layer is carried out in an empty state, the electron injecting layer easily reacts with moisture or oxygen to cause a chemical change. φ • However, in order to prevent the chemical change of the electron injecting layer described above, it is necessary to form a light-emitting layer in a vacuum environment, but in a vacuum environment, the ink is vaporized, so that it is impossible in reality. [Problem to be Solved by the Invention] The object of the present invention is to provide a method for producing an organic EL display device having a simple reverse layer and a manufacturing method thereof. The organic 乩 φ display device obtained by the method. (Means for Solving the Problem) The inventors of the present invention have learned that an ionic polymer having a specific structure has excellent electron injectability and is stable in an atmosphere of a normal pressure degree, and is dissolved in a solvent. A solution is prepared, and the solution is formed into a film to obtain a stable electron injecting layer in an environment of a normal pressure. The present invention is based on such knowledge. The present invention provides a method of manufacturing an organic light-emitting display device and an organic EL display device having the following configurations. 6 323 323 201220574 In addition, the term "in the air" as used in the present invention is used in a broad sense to mean that all environments containing oxygen and moisture are allowed. More specifically, it includes an unadjusted air environment which is generally called normal temperature and normal pressure, and includes an environment in which oxygen and moisture are contained as they are in the air environment, and temperature, pressure, and composition are adjusted. In the adjusted environment, the air environment is subjected to adjustment treatment of components such as nitrogen, hydrogen, oxygen, carbon dioxide, etc., as a condition for carrying out the manufacturing method of the present invention including "coating". The treatment of the ratio can also adjust the cleanliness of the floating particles and the planktonic microorganisms, and further adjust the environment in which the environmental conditions such as temperature, humidity, pressure, etc. can be adjusted under the conditions of the manufacturing method of the present invention, and the pressure is usually 1013 hPa ± 100 hPa. Normal pressure. Further, in the following description, the one direction of the thickness direction of the substrate is referred to as the upper side (or referred to as the upper side), and the other direction of the thickness direction of the substrate is referred to as the lower side (or referred to as the lower side). The description of this context is set for the convenience of explanation. It is not necessarily applicable to the actual steps and conditions of manufacture of organic elements. [1] A method of manufacturing an organic electroluminescence display device, comprising: a plurality of halogens composed of an organic electroluminescence device, wherein the organic electroluminescence device comprises an anode and a cathode An illuminating layer between the electrodes, an electron injecting layer between the cathode and the luminescent layer; wherein the method for manufacturing the organic electroluminescent display device comprises the steps of: preparing a substrate, the substrate is formed with corresponding 昼a plurality of cathodes; 323323 7 201220574 a step of forming an electron/main layer, which is applied to a solution of a coating polymer on each of the foregoing cathodes, and forms a solution of the solution to form an electron injection technique: The step of illuminating the layer is performed by coating the solution of the luminescent material in the coating layer 3 on the electron injection layer, and forming the solution into a film to form a solution containing the luminescent material other than the luminescent layer on the electron injecting layer. —= The step of forming an anode, which is formed by forming a film of the foregoing light-emitting layer to form an anode or forming on the light-emitting layer: a pole material: a layer after the layer on the layer [2] The organic electroluminescent display device as described in [1]. The step of forming the light-emitting layer is as follows: a method of forming a liquid-repellent pattern, and the liquid-repellent pattern contains a solution of the light-emitting material in addition to the alizarin, and the solution is internally coated with the film. The step of the sin-envelope layer. ^ 戍Multi-layer luminescence [3] The organic electro-excitation illuminating device as described in [1] has the following steps: the method of W in the area other than sputum. Less bank [4] An organic electroluminescence display device, which can be used as the potential of the organic electroluminescence display device described in the above paragraph: from [1] to [3] [Embodiment] According to the method of the present invention, the organic electro-excitation method of the present invention has a plurality of pixels composed of organic light-emitting elements, which are composed of organic light-emitting devices. The organic electroluminescent device comprises: an anode and a cathode, a light-emitting layer between the electrodes, and a material layer between the layers. The method of manufacturing the method includes the following steps: the step of preparing the substrate The substrate is formed with a plurality of pixels corresponding to each pixel Cathode

電子/主入層之步驟，其係於前述各陰極上塗佈包含離 子性聚合物的溶液，並使該溶液成膜從而形成電子注入層；An electron/main layer step of coating a solution containing an ionic polymer on each of the foregoing cathodes, and forming the solution into a film to form an electron injecting layer;

形成發光層之步驟，其係於前述電子注入層上塗佈包 含發光材料的溶液，並使該溶液成膜從而形成發光層，或 疋於i述電子〉主入層上形成發光層以外的層後，於該層上 塗佈包含發光材料的溶液，並進行製膜從而形成發光層； 與 θ ’ 形成陽極之步驟，其係於前述發光層上將陽極材料製 成膜從而形成陽極，或是於前述發光層上形成陽極以外的 層後’在該層上將陽極材料製成膜從而形成陽極。 激於ί:月2機電激發光顯示裝置係可藉由上述有機電 激發先顯不裝置的製造方法製造。 關於上述構成之本發明的各項要素，係於以下進行 =。對成為電子注入性材料的離子性聚合物進 進行成膜心=係可藉由將溶解於溶媒的溶液 者。接著，對之環境中為衫的電子注入層 ^ FT # L疋件的構成進行說明，接下來， 機乩顯不裝置的製造方法及藉由該製造方法所得之有 323323 9 201220574 EL顯示裝置進行詳細說明。此外，離子性聚合物與以往作 為電子注入材料使用的Ba、BaO、NaF、LiF等相比，不僅 限於在常壓中為安定，於空氣中亦為安定β [離子性聚合物] 以本發明可使用之離子性聚合物而言，可舉例如具有 包含選自下述式（1)所示之基及下述式（2)所示之基所成群 組中之1種以上的基之構造單元的聚合物。就離子性聚合 φ 物的一形態而言，可列舉如在全部構造單元中具有I5至 1〇〇莫耳％之構造單元的聚合物，而該構造單元包含選自式 (1)所示之基及式（2)所示之基所成群組中之1種以上的 基。 -WXi-YWMZ% ⑴ [式（1)中，Q1表示2價之有機基，γ1表示_c〇2-、-S(V、一s〇2_、 -P〇3或-B(Ra)3 ,Μ1表示金屬陽離子、或是具有或不具有取 代基之銨陽離子，Ζ1表示 F_、CF、Br.、Γ、0ΙΓ、以〇3、 φ Raco〇-、CIO-、ci〇2-、CKV、ci〇4-、SCN-、cr、NO，、s〇42、 HSOr、Ρ0Λ、ΗΡ0Λ、MU-、肌-或 pFe-，nl 表禾 〇 以上的 整數；al表示1以上的整數，bl表示〇以上的整數’惟， al及bl係選擇使式（1)所示之基之電荷成為〇者；Ra表示 具有或不具有取代基之碳原子數1 至30的烷基、或是具有 或不具有取代基之碳原子數6至5〇的芳基；當及Z 各為複數個時’可為相同或相異。] -(Q2)n2-Y2(M2)a2(Z2)b2 ⑺ [式⑵中， 323323 10 201220574 Q2表示2價之有機基， Y2表示碳陽離子（carbocation)、銨陽離子、膦醯基 (phosphonyl)陽離子或續醯基陽離子或錤（iodonium)陽離 子，M2 表示 F_、0Γ、Br、Γ、OH-、RbS(V、RbC00-、C1CT、 ci〇2_、ckv、ckv、scr、cr、n〇3-、so,、hs〇4'、p〇43-、 ΗΡΟΛ、H2P〇4_、BFr或PFe-，Z2表示金屬陽離子、或是具有 或不具有取代基之銨陽離子’ n2表示〇以上的整數；a2表 φ 示1以上的整數’ b2表示〇以上的整數，惟，a2及b2係 選擇使式（2)所示之基的電荷成為〇者；^表示具有或不具 有取代基之碳原子數1至30的烧基、或是具有或不具有取 代基之碳原子數6至50的芳基；當Q2、M2及Z2各為複數個 時，可為相同或相異。] 以本發明所使用之離子性聚合物的一形態而言，可復 列舉如具有下述式（3)所示之基的聚合物。當離子性聚合物 具有式（3)所示之基時，式（3)所示之基可包含在離子性聚 籲合物的構造單元中’亦可包含在與含有選自式⑴所示之基 及式（2)所示之基所成群組中之—種以上的基之構造單元 為同-構造單元内，且亦可包含在相異之其他構造單元 内。此外’以離子性聚合物的一形態而言，可列舉如在全 部構造單元中具有15至100莫耳％之構造單元的聚合物， 而該構造單元至少包含式⑴所示之基、式⑵所示之基、 及下述式（3)所示之基中的至少1種。 -(Q3)n3-Y3 (3) [式（3)中， 323323 11 201220574 Q3表示2價之有機基，γ3表系-CN或下述之式（4)至（12) 中任一者所示之基，n3表示〇以上的整數。 _晴 〇)a3-R，， (4) —RW0 ⑼ _S~(R’S)a4一R’， (6) _C(=0)、(R’ -C(=〇))a4_R，’ ⑺ -C〇S)~(r’ _C(=s))a4-R’， (8) _N[(R’）a4R，，]2 (9) -C(=0)〇-(R’ -C〇〇)〇)a4-R，’ (10) -c(=〇)〇 一 (R，0)a4_R，， (11) -NHC〇0)-(R，NHC(=0))a4-R’， (12) (式（4)至（12)中，R，表示具有威不具有取代基之2價烴 基’R’’表示氫原子、具有或不具有取代基之1價烴基、 -C00H、-S〇3H、-OH、-SH、-NR%、_CN 或-C(=0)NRc2，R，，， % 表示具有或不具有取代基之3儐烴基，a3表示1以上的整 數’ a4表示〇以上的整數，表示具有或不具有取代基之 碳原子數1至30的烷基、或是具有或不具有取代基之碳原 子數6至50的芳基；當R’、R，，及’ ’各為複數個時，可 為相同或相異。）] 離子性聚合物較佳為在全郏構造單元中，包含15至 1 〇〇莫耳％之選自下述式（13)所糸之構造單疋、式（15)所示 之構造單元、式（17)所示之構造單元及式所示之構造 單元所成群組中之1種以上的構造單元。 12 323323 (13) 201220574a step of forming a light-emitting layer by coating a solution containing a light-emitting material on the electron injecting layer, and forming a film to form a light-emitting layer, or forming a layer other than the light-emitting layer on the main electron-introducing layer Thereafter, a solution containing a luminescent material is coated on the layer, and a film is formed to form a light-emitting layer; a step of forming an anode with θ ' is formed on the light-emitting layer to form an anode material into a film to form an anode, or After forming a layer other than the anode on the foregoing light-emitting layer, the anode material is formed into a film on the layer to form an anode. The ::月2 electromechanical excitation light display device can be manufactured by the above-described organic electro-excitation method. Regarding each element of the present invention having the above configuration, the following is performed. The ionic polymer to be an electron injecting material is subjected to a film forming heart = by a solution which is dissolved in a solvent. Next, the configuration of the electron injection layer FT # L 为 in the environment will be described. Next, the manufacturing method of the 乩 乩 装置 device and the 323323 9 201220574 EL display device obtained by the manufacturing method are performed. Detailed description. Further, the ionic polymer is not limited to Ba, BaO, NaF, LiF or the like which is conventionally used as an electron injecting material, and is not limited to a stable pressure in a normal pressure, but also a stable β in air [Ionic polymer]. The ionic polymer which can be used, for example, has one or more groups including a group selected from the group represented by the following formula (1) and a group represented by the following formula (2). The polymer of the building block. With respect to one form of the ionic polymerization φ substance, a polymer having a structural unit of 1 to 1 mol% in all structural units may be cited, and the structural unit may be selected from the group consisting of the formula (1) One or more groups in the group represented by the formula (2). -WXi-YWMZ% (1) [In the formula (1), Q1 represents a divalent organic group, and γ1 represents _c〇2-, -S(V, a s〇2_, -P〇3 or -B(Ra)3 , Μ1 represents a metal cation, or an ammonium cation with or without a substituent, Ζ1 represents F_, CF, Br., Γ, 0ΙΓ, 〇3, φ Raco〇-, CIO-, ci〇2-, CKV, Ci〇4-, SCN-, cr, NO, s〇42, HSOr, Ρ0Λ, ΗΡ0Λ, MU-, muscle- or pFe-, nl are integers above and above; a1 represents an integer greater than 1 and bl represents 〇 The above integer 'only, al and bl are selected such that the charge of the group represented by the formula (1) becomes a defect; and Ra represents an alkyl group having 1 to 30 carbon atoms with or without a substituent, or with or without An aryl group having 6 to 5 Å carbon atoms having a substituent; 'may be the same or different when Z and each are plural.] -(Q2)n2-Y2(M2)a2(Z2)b2 (7) [Formula (2) Medium, 323323 10 201220574 Q2 represents a divalent organic group, Y2 represents a carbocation, an ammonium cation, a phosphonyl cation or a sulfonyl cation or an iodonium cation, and M2 represents F_, 0Γ, Br, Γ, OH-, RbS (V, RbC00-, C1 CT, ci〇2_, ckv, ckv, scr, cr, n〇3-, so, hs〇4', p〇43-, ΗΡΟΛ, H2P〇4_, BFr or PFe-, Z2 represents a metal cation, or The ammonium cation 'n2 with or without a substituent' represents an integer of 〇 or more; a2 represents φ, and an integer of 1 or more 'b2' represents an integer of 〇 or more, but a2 and b2 are selected such that the group represented by the formula (2) The electric charge becomes a sputum; ^ represents an alkyl group having 1 to 30 carbon atoms with or without a substituent, or an aryl group having 6 to 50 carbon atoms with or without a substituent; when Q2, M2 and Z2 are each When it is plural, it may be the same or different.] In one embodiment of the ionic polymer used in the present invention, a polymer having a group represented by the following formula (3) may be enumerated. When the polymer has a group represented by the formula (3), the group represented by the formula (3) may be contained in the structural unit of the ionic poly-complex, and may also be contained and contained in the group selected from the formula (1). And the structural unit of the above-mentioned group in the group represented by the formula (2) is in the same-structural unit, and may also be included in other structural units different from each other Further, 'in terms of one form of the ionic polymer, a polymer having 15 to 100 mol% of structural units in all structural units, and the structural unit contains at least the group represented by the formula (1) (2) At least one of the group shown and the group represented by the following formula (3). -(Q3)n3-Y3 (3) [In the formula (3), 323323 11 201220574 Q3 represents a divalent organic group, a γ3 expression system-CN or any one of the following formulas (4) to (12) The base of the formula, n3 represents an integer above 〇. _晴〇)a3-R,, (4) —RW0 (9) _S~(R'S)a4-R', (6) _C(=0), (R' -C(=〇))a4_R,' (7) -C 〇S)~(r' _C(=s))a4-R', (8) _N[(R')a4R,,]2 (9) -C(=0)〇-(R' -C〇〇 )〇)a4-R,' (10) -c(=〇)〇一(R,0)a4_R,, (11) -NHC〇0)-(R,NHC(=0))a4-R', (12) (In the formulae (4) to (12), R represents a divalent hydrocarbon group 'R'' having a substituent and a hydrogen atom, a monovalent hydrocarbon group having or not having a substituent, -C00H, - S〇3H, -OH, -SH, -NR%, _CN or -C(=0)NRc2, R,,, % represents a 3-mercaptohydrocarbyl group with or without a substituent, and a3 represents an integer of 1 or more 'a4' An integer above 〇 represents an alkyl group having 1 to 30 carbon atoms with or without a substituent, or an aryl group having 6 to 50 carbon atoms with or without a substituent; when R', R, ' 'When each is plural, it may be the same or different.)] The ionic polymer is preferably in the fluorene structural unit, and contains 15 to 1 mole % of which is selected from the following formula (13) The structural unit shown in the formula (15) Group of one or more kinds of structural units (17) and the configuration of the configuration unit represented by the formula shown as means. 12 323323 (13) 201220574

[式（13)中，R1係包含下述式（14)所示之基的1價基，a『i 表示具有或不具有R1以外之取代基之（2+n4)價芳香族義， n4表示1以上的整數；Ri為複數個時，可為相同或相^。 ~f-{(Q1)m-Y1(M1)ai(Z1)b1}m1 " (14)[In the formula (13), R1 includes a monovalent group of a group represented by the following formula (14), and a "i" represents a (2+n4) valence aromatic meaning with or without a substituent other than R1, n4 An integer representing 1 or more; when Ri is plural, it may be the same or the same. ~f-{(Q1)m-Y1(M1)ai(Z1)b1}m1 " (14)

(式（14)中 ’ R2 表示（i+mi+m2)價的有機基，Qi、q3、γ1、Ml、 Z、Y3、nl、al、bl及n3表示與前述者相同之意義，ml及 Y3、 )] m2各自獨立地表示1以上的整數；qi、q3、γΐ、μ!、π、 nl、al、bl及η3各別為複數個時，可為相同或相異。 (15)(In the formula (14), 'R2 represents an organic group of (i+mi+m2) valence, and Qi, q3, γ1, Ml, Z, Y3, nl, al, bl and n3 represent the same meaning as the above, ml and Y3, )] m2 each independently represent an integer of 1 or more; when qi, q3, γΐ, μ!, π, nl, a1, bl, and η3 are plural, they may be the same or different. (15)

Ar2-)- [式（15)中，R3係包含下述式（16)所示之基的i價基紅2 • 表示具有或不具有R3以外之取代基之（2+n5)價的芳香族 基，n5表示1以上的整數；R3為複數個時，可為相同或相 異。 (式（16)中 ’ R4表示（i+m3+m4)價之有機基，q2、q3、γ2、M2、 Z、Y、n2、a2、b2及n3表示與前述者相同之意義，m3及 1Π4各自獨立地表示1以上的整數。Q2、q3、γ2、ff、γ3、 n2、a2、b2及n3各為複數個時，可為相同或相異。）] 323323 13 (17) 201220574Ar2-)- [In the formula (15), R3 is an i-valent red group 2 having a group represented by the following formula (16): • a (2+n5) valence having a substituent other than R3 The group base, n5 represents an integer of 1 or more; and when R3 is plural, it may be the same or different. (In the formula (16), 'R4 represents an organic group of (i+m3+m4) valence, and q2, q3, γ2, M2, Z, Y, n2, a2, b2 and n3 represent the same meaning as the above, m3 and 1Π4 each independently represents an integer of 1 or more. When each of Q2, q3, γ2, ff, γ3, n2, a2, b2, and n3 is plural, it may be the same or different.)] 323323 13 (17) 201220574

[式（17)中，R5係包含下述式（18)所示之基的丨價基，R6係 包含下述式（19)所示之基的1價基，Ar3表示具有或不具有 R及R6以外之取代基之（2+n6+n7)價的芳香族基，n6及n7In the formula (17), R5 is a valence group containing a group represented by the following formula (18), R6 is a monovalent group having a group represented by the following formula (19), and Ar3 is represented by or without R. And (2+n6+n7) valence aromatic groups of substituents other than R6, n6 and n7

各自獨立地表示1以上的整數；r5&amp; R6各為複數個時，可 為相同或相異。 (18) (式（18)中’ R7表示直接鍵或（i+m5)價的有機基，Ql、γ1、 Μ Z 及bl表示與刖述者相同之意義，㈣表示1 以上的整數；Qi、Y1、Μ1、Z1、nl、al及Μ各為複數個時， 可為相同或相異。） -{ (Q3)n3-Y3}m6 (19) (式（19)中，R8表示單鍵或（l+m6)價的有機基，γ3及n3表 示與前述者相同之意義，m6表示1以上的整數，惟R8為單 鍵時’ m6表示1 ; Q3、Y3及n3各為複數個時，可為相同或 相異。）] (20) [式（20)中’ R9係包含下述式（21)所示之基的1價基，Ri〇 係包含下述式（22)所示之基的1價基，Ar4表示具有或不具 323323 14 201220574 有R9及外之取代基之（2+n8+n9)價的芳香 n9各自獨立地表示1以卜 、土 ’ n8及 衣不1以上的整數：^及以各 可為相同或相異。 ~歿歎個時， -Rn-[(Q2)n2-Y2(M2)a2(z2)b2]m7 (21) (2式（21)中’RU表示單鍵或（l+m7)價之有機基，q2、y2、 Z、n2 ' a2及b2表示與前述者相同之意義，^八 上的整數，惟R11為單鍵時，m7表示丨；q2、γ2、Μ a2及b2各為複數個時，可為相同或相異。） _R12-[(Q3)n3-Y3]n8 Μ5 i以 Z2、n2、 (式（22)中 (22) 表示單鍵或（l+m8)價的有機基，γ3及 示與前述者相同之意義’ ra8表示！以上的整數，惟二： 鍵時，m8表示1 ; Q3、丫3及n3各為複數個時，可為相同= 相異。）] ， 口或 前述離子性聚合物中的構造單元可包含2種以上之弋 (1)所示之基，亦可包含2種以上之式（2)所示之美，^ ，且亦 可包含2種以上之式（3)所示之基。 〈式（1)所示之基〉 式（1)中’以Q所示之2價有機基而言，可列舉例士 亞曱基（methylene)、伸乙基（ethylene)、1，2~伸丙美、j 3 伸丙基、1，2_伸丁基、1，3_伸丁基、1，4~伸丁美、1 5伸 戊基、1，6-伸己基、1，9-伸壬基、1，12-伸十二義 (dodecylene)、此等基中的至少1個氫原子經取代其取代 的基等具有或不具有取代基之碳原子數1至50的2彳賈 烴基；包含伸乙烯基（ethenylene)、伸$呑 323323 15 201220574 (propenylene)、3—伸丁烯基、2_伸丁烯基、2_伸戊烯基 (2-pentenylene)、2-伸己烯基、2-伸壬烯基、2-伸十二烯 基、此等基中的至少丨個氫原子經取代基取代的基等具有 或不具有取代基之碳原子數2至5〇的伸稀基（alkenylene) 及伸乙炔基（ethynylene)之具有或不具有取代基之碳原子 數2至50的2價不飽和烴基；伸環丙基、伸環丁基、伸環 戊基、伸環己基、伸環壬基、伸環十二基、伸箔基 鲁 （norb〇rnylene)、伸金剛烧基（adamantylene)、此等基中 的至少1個氫原子經取代基取代的基等具有或不具有取代 基之碳原子數3至50的2價環狀飽和烴基；1，3-伸苯基、 1，4-伸笨基、1，4-伸萘基、1，5-伸萘基、2, 6-伸萘基、聯 本-4, 4 -一基、此等基中的至少1個氫原子經取代基取代 的基等具有或不具有取代基之碳原子數6至50的伸芳基； 亞曱基氧基、伸乙基氧基、伸丙基氧基、伸丁基氧基、伸 戊基氧基、伸己基氧基、此等基中的至少1個氫原子經取 Φ 代基取代的基等具有或不具有取代基之碳原子數1至50的 伸烷基氧基；具有包含碳原子之取代基的亞胺基（imin〇); 具有包含破原子之取代基的亞梦基（Silylene)。此等之 中’從作為離子性聚合物原料的單體（以下稱作「原料單體」) 的合成容易度之觀點來看，較佳為2價飽和烴基、伸芳基、 伸烷基氧基。 以前述取代基而言，可列舉例如：烷基、燒氧基、炫 基硫基、芳基、芳基氧基、芳基硫基、芳基烷基、芳基炫 氧基、芳基烷基硫基、芳基烯基、芳基炔基、胺基、取代 323323 16 201220574 胺基（substituted amino)、矽基、取代矽基（substituted silyl)、齒原子、醯基、醯基氧基、亞胺殘基、醯胺基、 醢亞胺基、1價雜環基、經基、叛基、取代缓基（substituted carboxyl)、氰基及硝基等，當前述取代基存在複數個時， 該等可為相同或相異。此等之中，胺基、矽基、鹵原子、 羥基及硝基以外的取代基係包含碳原子。 以下對取代基進行說明。又，「(^至cn」（m、η係滿足 πι〈η之正整數）之用s吾係表不與此用語一同記載之有機基的 碳原子數為m至η。例如，若為（^至Cn烷基，則表示烷基 的碳原子數為m至η ;若為Cn·至Cn烷基芳基，則表示烷基 的碳原子數為m至η，若為芳基_cm至Cn烧基，則表示烧基 的碳原子數為m至η。 烷基可為直鏈狀或分枝狀，亦可為環烷基。烷基的碳 原子數通常為1至20 ’以1至1〇為較佳。烷基可列舉例 如：曱基、乙基、丙基、異丙基、丁基、異丁基、第二丁 # 基、第三丁基、戊基、己基、環己基、庚基、辛基、壬基、 癸基、月桂基等。前述烷基中的氫原子亦可經氟原子取代。 以該經氟原子取代之烷基而言，可列舉如：三氟曱基、五 氟乙基、全氟丁基、全氟己基、全氟辛基等。又，以Ci至 Cn烷基而言，玎列舉例如：曱基、乙基、丙基、異丙基、 丁基、異丁基、第二丁基、第三丁基、戊基、異戊基 (isoamyl)、己基、環己基、庚基、辛基、壬基、癸基、月 桂基。 烷氧基可為直鏈狀或分枝狀，亦可為環烷基氧基，亦 17 323323 201220574 可具有取代基。烷氧基的碳原子數通常為1至20，以1至 10為較佳。以烧氧基而言，可列舉例如：曱氧基、乙氧基、 丙基氧基、異丙基氧基、丁氧基、異丁氧基、第二丁氧基、 第三丁氧基、戊基氧基、己基氧基、環己基氧基、庚基氧 基、辛基氧基、壬基氧基、癸基氧基、月桂基氧基等。前 述烧氧基中的氫原子亦可經氟原子取代。以該經氟原子取 代之烷氧基而言，可列舉例如：三氟曱氧基、五氟乙氧基、 Φ 全氟丁氧基、全氟己基氧基、全氟辛基氧基等。而且，該 烷氧基亦包含曱氧基曱基氧基、2-曱氧基乙基氧基。又， 以〇至C12烷氧基而言，可列舉例如：曱氧基、乙氧基、丙 基氧基、異丙基氧基、丁氧基、異丁氧基、第二丁氧基、 第三丁氧基、戊基氧基、己基氧基、環己基氧基、庚基氧 基、辛基氧基、2-乙基己基氧基、壬基氧基、癸基氧基、 3, 7-二曱基辛基氧基、月桂基氧基。 以烷基硫基而言，可為直鏈狀或分枝狀，亦可為環烷 φ 基硫基，亦可具有取代基。烷基硫基的碳原子數通常為1 至20，以1至10為較佳。以烷基硫基而言，可列舉例如： 曱基硫基、乙基硫基、丙基硫基、異丙基硫基、丁基硫基、 異丁基硫基、第二丁基硫基、第三丁基硫基、戊基硫基、 己基硫基、環己基硫基、庚基硫基、辛基硫基、壬基硫基、 癸基硫基、月桂基硫基等。前述烷基硫基中的氫原子亦可 經氟原子取代。以該經氟原子取代之烷基硫基而言，可列 舉如三氟曱基硫基等。 芳基係指從芳香族烴去除1個鍵結於構成芳香環的碳 18 323323 201220574 原子之氫原子而殘留的原子團，亦包含具苯環的基、具縮 合環的基、由2個以上之獨立的苯環或縮合環經由單鍵或 2價有機基（例如伸乙烯基（vinylene))等伸烯基而 鍵結的 基。芳基之碳原子數通常為6至6〇，以7至48為較佳。 以芳基而言，可列舉例如：笨基、&amp;至^烧氧基苯基、&amp; 至^烷基苯基、卜萘基、2、萘基卜蒽基、2蒽基、9蒽 基等。前述芳基中的氫原子亦可經氟原子取代。以該經氣 鲁原子取代之芳基而言，可列舉如五氟苯基等。彡基中，較 佳為0至C!2烷氧基苯基、（^至Ci2烷基苯基。 則述芳基中，以Cl至^烧氧基苯基而言，可列舉例 如·曱氧基苯基、乙氧基苯基、丙基氧基苯基、異内基氣 基苯基、丁氧基苯基、異丁氣基苯基、第二丁氧基笨基、 第二丁氧基苯基、戊基氧基笨基、己基氧基苯基、環己基 氧基苯基、庚基氧基苯基、辛基氧基苯基、2_乙基已基氣 基苯基、壬基氧基苯基、癸基氧基苯基、3, 7_二甲基辛式 # 氧基苯基、月桂基氧基苯基等。 &amp; 前述芳基中，以Ci至Cu烷基苯基而言，可列舉例如· 曱基苯基、乙基苯基、二甲基苯基、丙基苯基、2, 4,6、二 *»1 &gt; 曱苯基（mesityl)、曱基乙基苯基、異丙基苯基、丁基笨烏、 異丁基苯基、第三丁基苯基、戊基苯基、異戊基苯基、己 基本基、庚基苯基、辛基苯基、壬基苯基、癸基苯基、十 一基本基等。 芳基氧基的碳原子數通常為6至60，以7至48為車交 佳。以芳基氧基而言，可列舉例如：苯氧基、匕至Cu燒氣 323323 19 201220574 基本氧基、Ci至Ci2烧基苯氧基、i-萘基氧基、2_萘基氧基、 五氟苯基氧基等。芳基氧基中，較佳為匕至L烷氧基苯氧 基及Cl至Cl2烧基苯氧基。 前述芳基氧基中，以（^至L烷氧基苯氧基而言，可列 舉例如.甲氧基苯氧基、乙氧基苯氧基、丙基氧基苯氧基' 異丙基氧基苯氧基、丁氧基苯氧基、異丁氧基苯氧基、第 二丁氧基苯氧基、第三丁氧基苯氧基、戊基氧基苯氧基、 •己基氧基苯氧基、環己基氧基笨氧基、庚基氧基苯氧基、 辛基氧基苯氧基、2-乙基己基氧基苯氧基、壬基氧基笨氧 基、癸基氧基苯氧基、3, 7-二甲基辛基氧基苯氧基、月桂 基氧基苯氧基等。 前述芳基氧基中，以匕至L烷基苯氧基而言，可列舉 例如：曱基苯氧基、乙基苯氧基、二曱基苯氧基、丙基苯 氧基、1，3, 5-三曱基苯氧基、曱基乙基苯氧基、異丙基苯 氧基、丁基苯氧基、異丁基苯氧基、第二丁基苯氧基、第 ♦三丁，笨氧基、縣苯氧基、異戊基笨氧基、己基笨氧基、 庚基苯氧基、辛基苯氧基、壬基苯氧基、癸基苯氧基、十 二基笨氧基等。 芳基硫基係指例如於前述芳基鍵結有硫元素的基。芳 基，基亦可於前述芳基的芳香環上具有取代基。芳基硫基 的石反原子數通常為6至60，以6至3〇為較佳。以芳基硫 基而言’可列舉例如：苯基硫基、Ci至Ci2烧氧基苯基硫基、Each of them independently represents an integer of 1 or more; when each of r5 &amp; R6 is plural, it may be the same or different. (18) (In the formula (18), R7 represents a direct bond or an organic group of (i+m5) valence, Ql, γ1, ΜZ and bl represent the same meaning as the narration, and (4) represents an integer of 1 or more; Qi When Y1, Μ1, Z1, nl, al, and Μ are plural, they may be the same or different.) -{ (Q3)n3-Y3}m6 (19) (In the formula (19), R8 represents a single bond. Or (l+m6) valence organic group, γ3 and n3 represent the same meaning as the above, and m6 represents an integer of 1 or more, but when R8 is a single bond, 'm6 represents 1; and Q3, Y3 and n3 are each plural (20) [In the formula (20), R9 includes a monovalent group of the group represented by the following formula (21), and the Ri(R) system includes the following formula (22). The monovalent group of the group, Ar4 represents a aryl group having a valence of (2+n8+n9) having R9 and a substituent other than 323323 14 201220574, each independently representing 1 to 2, 8 to 8 and 8 or more Integer: ^ and each can be the same or different. ~ When sighing, -Rn-[(Q2)n2-Y2(M2)a2(z2)b2]m7 (21) (In the formula (21), 'RU means a single bond or (l+m7) organic Base, q2, y2, Z, n2 'a2 and b2 represent the same meaning as the above, an integer on ^8, but when R11 is a single bond, m7 represents 丨; q2, γ2, Μ a2 and b2 are each a plurality of When it is the same or different.) _R12-[(Q3)n3-Y3]n8 Μ5 i is Z2, n2 ((22) represents a single bond or (l+m8) valence organic group , γ3 and the meaning of the same as the above - ra8 means! The above integer, only two: when the key, m8 means 1; when Q3, 丫3 and n3 are plural, they can be the same = different.)], The structural unit in the ionic polymer or the ionic polymer may include two or more kinds of groups represented by the above formula (1), and may include two or more kinds of the formulas represented by the formula (2), and may include two or more kinds. The base shown by the formula (3). <Bases of Formula (1)> In the formula (1), the divalent organic group represented by Q may be exemplified by methylene, ethylene, 1,2~.丙美美, j 3 propyl, 1,2 butyl, 1,3 butyl, 1,4~ butyl, 1,5 pentyl, 1,6-extension, 1,9 - fluorene, 1,12-dodecylene, at least one hydrogen atom in the group, substituted by a group substituted with or without a substituent, having 2 to 50 carbon atoms Jiahydrocarbyl; containing ethenylene, extension 呑323323 15 201220574 (propenylene), 3-exenbutyl, 2_extenylene, 2-pentenylene, 2-stretch a hexenyl group, a 2-decenyl group, a 2-decylenyl group, a group in which at least one hydrogen atom in the group is substituted with a substituent, or the like has 2 to 5 carbon atoms. a divalent unsaturated hydrocarbon group having 2 to 50 carbon atoms with or without a substituent of an ethynylene and an ethynylene; a cyclopropyl group, a cyclopentene group, a cyclopentyl group, Extending cyclohexyl group, stretching ring thiol group, stretching ring twelve base, extending foil base a bivalent ring having 3 to 50 carbon atoms with or without a substituent, such as a norb〇rnylene, adamantylene, a group in which at least one hydrogen atom in the group is substituted with a substituent. Saturated hydrocarbon group; 1,3-phenylene, 1,4-extended, 1,4-naphthyl, 1,5-anthranyl, 2,6-anthranyl, bis--4, 4- a aryl group having 6 to 50 carbon atoms having or having a substituent, such as a group substituted with at least one hydrogen atom in the group, and the like; a fluorenyloxy group; a propyloxy group, a butyloxy group, a pentyloxy group, a hexyloxy group, a carbon having or without a substituent such as a group in which at least one hydrogen atom in the group is substituted with a Φ substituent An alkyleneoxy group having an atomic number of 1 to 50; an imido group having a substituent containing a carbon atom; and a silylene having a substituent containing a broken atom. Among these, 'from the viewpoint of easiness of synthesis of a monomer which is an ionic polymer raw material (hereinafter referred to as "raw material monomer"), a divalent saturated hydrocarbon group, an extended aryl group, an alkylene oxide group is preferred. base. Examples of the aforementioned substituents include an alkyl group, an alkoxy group, a thiol group, an aryl group, an aryloxy group, an arylthio group, an arylalkyl group, an aryloxy group, and an arylalkyl group. Thiothio, arylalkenyl, arylalkynyl, amine, substituted 323323 16 201220574 A substituted amino group, a fluorenyl group, a substituted silyl group, a tooth atom, a fluorenyl group, a decyloxy group, An imine residue, a guanamine group, a guanidino group, a monovalent heterocyclic group, a thiol group, a thiol group, a substituted carboxyl group, a cyano group, a nitro group, etc., when a plurality of the above substituents are present, These may be the same or different. Among these, a substituent other than an amine group, a mercapto group, a halogen atom, a hydroxyl group, and a nitro group contains a carbon atom. The substituents are described below. Further, "(^ to cn" (m, η is a positive integer satisfying πι < η) is not used in conjunction with this term, and the number of carbon atoms of the organic group is m to η. For example, if ( ^ to Cn alkyl, which means that the alkyl group has a carbon number of m to η; if it is Cn· to Cn alkylaryl, it means that the alkyl group has a carbon number of m to η, and if it is an aryl group_cm to The Cn alkyl group means that the number of carbon atoms of the alkyl group is from m to η. The alkyl group may be linear or branched, or may be a cycloalkyl group. The alkyl group usually has a carbon number of 1 to 20' to 1 Preferably, the alkyl group is exemplified by an anthracenyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a second butyl group, a third butyl group, a pentyl group, a hexyl group, and a ring. Hexyl, heptyl, octyl, decyl, decyl, lauryl, etc. The hydrogen atom in the above alkyl group may also be substituted by a fluorine atom. Indenyl, pentafluoroethyl, perfluorobutyl, perfluorohexyl, perfluorooctyl, etc. Further, in the case of Ci to Cn alkyl, hydrazines are exemplified by mercapto, ethyl, propyl, isopropyl , butyl, isobutyl, second , tert-butyl, pentyl, isoamyl, hexyl, cyclohexyl, heptyl, octyl, decyl, decyl, lauryl. The alkoxy group may be linear or branched, It may be a cycloalkyloxy group, and may have a substituent. The alkoxy group has usually 1 to 20 carbon atoms, preferably 1 to 10. The alkoxy group may, for example, be hydrazine. Oxy, ethoxy, propyloxy, isopropyloxy, butoxy, isobutoxy, second butoxy, tert-butoxy, pentyloxy, hexyloxy, cyclohexyl An oxy group, a heptyloxy group, an octyloxy group, a decyloxy group, a decyloxy group, a lauryloxy group, etc. The hydrogen atom in the above alkoxy group may be substituted by a fluorine atom. Examples of the alkoxy group include a trifluoromethoxy group, a pentafluoroethoxy group, a Φ perfluorobutoxy group, a perfluorohexyloxy group, a perfluorooctyloxy group, and the like. Further, it includes a nonyloxycarbonyloxy group and a 2-decyloxyethyloxy group. Further, examples of the fluorene to C12 alkoxy group include a decyloxy group, an ethoxy group, a propyloxy group, and a different group. Propyl oxygen , butoxy, isobutoxy, second butoxy, tert-butoxy, pentyloxy, hexyloxy, cyclohexyloxy, heptyloxy, octyloxy, 2-B a hexyloxy group, a decyloxy group, a decyloxy group, a 3,7-didecyloctyloxy group, a lauryloxy group. In the case of an alkylthio group, it may be linear or branched. Further, it may be a cycloalkanethio group or a substituent. The alkylthio group has usually 1 to 20 carbon atoms, preferably 1 to 10. The alkylthio group may, for example, be: Mercaptothio, ethylthio, propylthio, isopropylthio, butylthio, isobutylthio, second butylthio, tert-butylthio, pentylthio , hexylthio, cyclohexylthio, heptylthio, octylthio, decylthio, decylthio, laurylthio, and the like. The hydrogen atom in the aforementioned alkylthio group may also be substituted with a fluorine atom. The alkylthio group substituted by the fluorine atom may, for example, be a trifluoromethylthio group or the like. The aryl group refers to an atomic group remaining from an aromatic hydrocarbon and bonded to a hydrogen atom of a carbon 18 323323 201220574 atom constituting an aromatic ring, and also includes a group having a benzene ring and a group having a condensed ring, and two or more The independent benzene ring or condensed ring is bonded to the alkenyl group via a single bond or a divalent organic group (for example, vinylene). The number of carbon atoms of the aryl group is usually from 6 to 6 Å, preferably from 7 to 48. The aryl group may, for example, be a strepyl group, a &lt;RTI ID=0.0&gt;&gt;&gt; </RTI> oxyphenylphenyl, &amp; to alkylphenyl, bheptyl, 2, naphthyl, fluorenyl, 9 fluorenyl and the like. The hydrogen atom in the aforementioned aryl group may also be substituted with a fluorine atom. The aryl group substituted with the gas atom may, for example, be pentafluorophenyl or the like. In the fluorenyl group, it is preferably 0 to C! 2 alkoxyphenyl group, (^ to Ci2 alkylphenyl group. In the case of the aryl group, for example, in the case of a pyridyloxy group, the phenyl group is exemplified. Oxyphenyl, ethoxyphenyl, propyloxyphenyl, isopropionylphenyl, butoxyphenyl, isobutyloxyphenyl, second butoxy stupyl, second Oxyphenyl, pentyloxy, hexyloxyphenyl, cyclohexyloxyphenyl, heptyloxyphenyl, octyloxyphenyl, 2-ethylhexylphenyl a mercaptooxyphenyl group, a mercaptooxyphenyl group, a 3,7-dimethyloctyl#oxyphenyl group, a lauryloxyphenyl group, etc. &amp; of the aforementioned aryl group, a Ci to Cu alkyl group Examples of the phenyl group include a nonylphenyl group, an ethylphenyl group, a dimethylphenyl group, a propylphenyl group, a 2, 4, 6, a di*»1 &gt; mesityl, oxime Ethyl ethyl phenyl, isopropyl phenyl, butyl phenyl, isobutylphenyl, tert-butylphenyl, pentylphenyl, isopentylphenyl, hexyl, heptylphenyl, Octylphenyl, nonylphenyl, nonylphenyl, eleven basic, etc. The aryloxy group usually has a carbon number It is 6 to 60, and is preferably from 7 to 48. Examples of the aryloxy group include a phenoxy group, a hydrazine to a Cu gas 323323 19 201220574 a basic oxy group, and a Ci to Ci2 alkyl phenoxy group. , i-naphthyloxy, 2-naphthyloxy, pentafluorophenyloxy, etc. Among the aryloxy groups, a fluorene to L alkoxyphenoxy group and a Cl to Cl 2 alkyl phenoxy group are preferred. In the above aryloxy group, examples of the (^ to L alkoxyphenoxy group include a methoxyphenoxy group, an ethoxyphenoxy group, a propyloxyphenoxy group), and an isopropyl group. Alkoxyphenoxy, butoxyphenoxy, isobutoxyphenoxy, second butoxyphenoxy, tert-butoxyphenoxy, pentyloxyphenoxy, hexyl Oxyphenoxy, cyclohexyloxypoxyoxy, heptyloxyphenoxy, octyloxyphenoxy, 2-ethylhexyloxyphenoxy, decyloxyoxy, hydrazine a benzyloxyphenoxy group, a 3,7-dimethyloctyloxyphenoxy group, a lauryloxyphenoxy group, etc. Among the above aryloxy groups, in the case of a fluorenyl group to an L alkylphenoxy group, For example, a nonylphenoxy group, an ethylphenoxy group, a dimercaptophenoxy group, and a propyl group are mentioned. Oxyl, 1,3,5-trimercaptophenoxy, nonylethylphenoxy, isopropylphenoxy, butylphenoxy, isobutylphenoxy, second butyl phenoxy Base, XXX, butyl, phenoxy, phenoxy, isopentyloxy, hexyloxy, heptylphenoxy, octylphenoxy, nonylphenoxy, nonylphenoxy The arylthio group is, for example, a group having a sulfur element bonded to the above aryl group. The aryl group may have a substituent on the aromatic ring of the aforementioned aryl group. The number of reverse atoms of the group is usually from 6 to 60, preferably from 6 to 3 Å. In the case of an arylthio group, for example, a phenylthio group, a Ci to Ci2 alkoxyphenylthio group,

Ci至C,2烷基苯基硫基、卜萘基硫基、2_蔡基硫基、五氣苯 基硫基等。 323323 20 201220574 芳基烧基係指例如於前述芳基鍵結有前述烷基之基。 芳基烧基亦可具有取代基。芳基烷基的碳原子數通常為7 至60，以7至30為較佳。以芳基烷基而言，可列舉例如： 苯基-0至Cu燒基、匕至c12烷氧基苯基-(^至C12烷基、匕 至C!2烷基苯基-(^至G烷基、卜萘基—(^至b烷基、2_萘 基-Cl至Cl2烧基等。 芳基烧氧基係指例如於前述芳基鍵結有前述烷氧基之 Φ 基。芳基烷氧基亦可具有取代基。芳基烷氧基的碳原子數 通常為7至60，以7至30為較佳。以芳基烷氧基而言， 可列舉例如：苯基-匕至Cu烷氧基、匕至C12烷氧基苯基-c! 至Cl2烷氧基、〇至C!2烷基苯基-(^至c12烷氧基、卜萘基-c! 至Ci2烧氧基、2-萘基-Ci至Ci2烧氧基等。 芳基烷基硫基係指例如於前述芳基鍵結有前述烧基硫 基之基。芳基烷基硫基亦可具有取代基。芳基烷基硫基的 石厌原子數通常為7至60’以7至30為較佳。以芳基炫基 參硫基而言’可列舉例如：苯基{至匕2烷基硫基、（^至C12 烧氧基本基_Cl至Cl2烧基硫基、Cl至Cl2烧基苯基-Cl至Cl2 烷基硫基、卜萘基至Cl2烷基硫基、2-萘基-C!至c12烧 基硫基等。 芳基烯基係指例如於前述芳基鍵結有婦基之基。芳基 烯基的碳原子數通常為8至60 ’以8至30為較佳。以芳 基烯基而言，可列舉例如：苯基-匕至clz烯基、匕至Cl2燒 氧基苯基-C2至〇2烯基、匕至Cu烷基苯基-C2至c12稀基、 1-萘基-C2至C!2烯基、2-萘基-(：2至匕2烯基等。此等之中， 323323 21 201220574 :乳基笨基—C2至Cl2烯基、Cl至Cl2烷基苯基-C2 12，土為較佳。X，以匕至（：4基而言’可列舉例如： 乙烯基、1-丙、嫌I „Ci to C, 2 alkylphenylthio, bnaphthylthio, 2-caiylthio, pentaphenylthio and the like. 323323 20 201220574 An arylalkyl group means, for example, a group in which the aforementioned aryl group is bonded to the aforementioned alkyl group. The aryl group may have a substituent. The arylalkyl group has usually from 7 to 60 carbon atoms, preferably from 7 to 30 carbon atoms. As the arylalkyl group, for example, phenyl-0 to Cu alkyl group, hydrazine to c12 alkoxyphenyl-(^ to C12 alkyl group, hydrazine to C! 2 alkylphenyl group-(^ to G alkyl, bhnaphthyl-(^ to b-alkyl, 2-naphthyl-Cl to Cl2 alkyl, etc. The aryl alkoxy group means, for example, a Φ group to which the aforementioned aryl group is bonded with the aforementioned alkoxy group. The alkoxy group may have a substituent. The aryl alkoxy group usually has 7 to 60 carbon atoms, preferably 7 to 30. Examples of the aryl alkoxy group include a phenyl-hydrazine to Cu alkoxy, hydrazine to C12 alkoxyphenyl-c! to Cl2 alkoxy, hydrazine to C! 2 alkylphenyl-(^ to c12 alkoxy, bnaphthyl-c! to Ci2 alkoxy, 2-naphthyl-Ci to Ci2 alkoxy group, etc. The arylalkylthio group means, for example, a group in which the aforementioned aryl group is bonded to the above-mentioned alkylthio group. The arylalkylthio group may also have a substituent. The number of anazetom atoms of the alkylthio group is usually from 7 to 60', preferably from 7 to 30. In the case of an aryl thiolthio group, for example, a phenyl { to decyl 2 thio group, (^ to C12 alkoxy base _Cl to Cl2 alkylthio, Cl to Cl2 alkyl phenyl-Cl to Cl2 alkylthio, naphthalene To a C2 alkylthio group, a 2-naphthyl-C! to a c12 alkylthio group, etc. An arylalkenyl group means, for example, a group having a aryl group bonded to a aryl group. The arylalkenyl group usually has a carbon number. 8 to 60' is preferably 8 to 30. Examples of the arylalkenyl group include a phenyl-hydrazine to a clz alkenyl group, a fluorene to a C2 alkoxyphenyl-C2 to a fluorenyl 2, alkenyl group,匕 to Cu alkylphenyl-C2 to c12 dilute, 1-naphthyl-C2 to C! 2 alkenyl, 2-naphthyl-(: 2 to decyl 2 alkenyl, etc. Among these, 323323 21 201220574 : milk-based base - C2 to Cl2 alkenyl, Cl to Cl2 alkylphenyl-C2 12, preferably soil. X, from 匕 to (: 4 base' can be exemplified by: vinyl, 1-propene I suspected that I

、土、2-丙烯基、1_丁烯基、2-丁烯基、1-、二、、-戊烯基、卜己烯基、2_己烯基、卜辛烯基。 芳土块基係心例如於前述芳基鍵結有炔基之基。芳基 2 = 1子數通常為8至6〇,以8至3〇為較佳。以芳 $其可歹1]舉例如：苯基至Cl2炔基、mc12烧 ! ^土/ 2至Cl2块基、Cl至Cl2烧基笨基一G至Cl2炔基、 萘 至Cl2块基、2-萘基‘至C12块基等。此等之中， 較佳為Cl至c12烷氧其Γ $ Γ &amp;甘 虱基本基-C2至Cl2炔基、（^至C12烷基苯 2块基又，以C2至Cl2炔基而言，可列舉例如： 乙炔基、1-丙炔基、2_丙炔基、卜丁炔基、 _ 戊块基、2:賴基、卜己絲、2_己絲、卜辛快基。 乂取代胺基而言，較佳為胺基中的至少上個氯原子經 达自烷基芳基、芳基烧基及1價雜環基所成群組中的i 或2個基所取代者。該烧基、芳基、芳基絲或1價雜環 基亦可具有取代基。取代胺基的碳原子數，不包含該烷基、 芳基、芳基烷基或1價雜環基所可具有之取代基之碳原子 數’通常為1至60，以2至48為較佳。以取代胺基而言， 可舉例如：甲基胺基、二甲基胺基、乙基胺基、二乙基胺 基、丙基胺基、二丙基胺基、異丙基胺基、二異丙基胺基、 丁基胺基、異丁基胺基、第二丁基胺基、第三丁基胺基、 戊基胺基、己基胺基、環己基胺基、庚基胺基、辛基胺基、 2-乙基己基胺基、壬基胺基、癸基胺基、3, 7-二甲基辛基 22 323323 201220574 胺基、月桂基胺基、環戊基胺基、二環戊基胺基、環己基 胺基、二環己基胺基、二（三氟甲基）胺基、苯基胺基、二 本基胺基、（Cl至Cl2烧氧基苯基）胺基、二（Cl至Cl2烧氧基 苯基）胺基、二至C!2烷基苯基）胺基、卜萘基胺基、2-萘基胺基、五氟苯基胺基、吼咬基胺基、塔哄基胺基、鳴 啶基胺基、吼畊基胺基、三卩井基胺基、（苯基_Cl至Cl2烷基） 月女基、（Cl至Cl2烧氧基苯基-Cl至Cl2烧基）胺基、（Cl至Ci2 φ 烷基苯基-Cl至Cu烷基）胺基、二（Ci至Clz烷氧基苯基-C, 至Cl2烧基）胺基、二（Cl至Cl2院基苯基-Cl至Cl2烧基）胺基、 1-萘基-Cl至Cl2烧基胺基、2-萘基-(^至Cl2烧基胺基等。 以取代矽基而言，可列舉例如：矽基中的至少丨個氫 原子經選自&amp;基、芳基、芳基烧基及i價雜環基所成群組 中的1至3個基所取代之矽基。該烷基、芳基、芳基烷基 或1價雜環基亦可具有取代基。取代矽基的碳原子數，不 包含該烷基、芳基、芳基烷基或丨價雜環基所可具有之取 春代基之碳原子數，通常為i至60，以3至48為較佳。又， 以取代矽基而言，可列舉例如：三曱基矽基、三乙基矽基、 三丙基石夕基、三異丙基石夕基、異丙基二曱基石夕基、異丙基 二乙基矽基、第三丁基二曱基矽基、戊基二曱基矽基、己 基二曱基石夕基、庚基二曱基石夕基、辛基二甲基石夕基、2_乙 基己基二甲基石夕基、壬基二甲基石夕基、癸基二甲基石夕基、 3, 7-二曱基辛基二甲基矽基、月桂基二甲基矽基、（苯基一^ 至c12院基）石夕基、（(：1至Cl2燒氧基苯基—Cii Ci2烧基）石夕基、 (C』（：12烧基苯基{至Cl2院基）石夕基、（卜蔡基《至&amp; 323323 23 201220574 烷基）矽基、（2-萘基_Ci至Ci2烷基）矽基、（贫 ^ ^ . 、本基-(:丨至C12 烷基）一甲基矽基、三苯基矽基、三（對茬基）矽基、=^某 石夕基、二苯基甲基石夕基、第三丁基二笨基石夕基广二二二; 基矽基等。 一甲·*· 以南原子而言，可列舉如：氟原子、氣原子 及碘原子。 承 酿基的碳原子數通常為2至20，以2至18為車々值。 φ 以醯基而言，可列舉例如：乙醢基、丙醯基、丁醯=、異 丁醯基、三甲基乙醯基（pival〇yl)、苯甲醯基、三二 基、五氟苯甲醯基等。 一 酿基氧基的碳原子數通常為2至20，以2至18為較 佳。以酿基氧基而言，可列舉例如：乙酿氧基、丙酿基氧 基、丁醯基氧基、異丁醯基氧基、三甲基乙醯基氧基:苯 甲醯基氧基、三氟乙醯基氧基、五氟苯甲醯基氡基等。 亞胺殘基係意指從具有如式：H_N=C&lt;及式：&amp;⑶一之 籲至=、一者所示之構造的亞胺化合物中，去除1個此構造中 的氫原子後所得之殘基。以如此之亞胺化合物而言，^列 舉例如：酸亞胺；酮亞胺；以及搭亞胺中的氮原子所鍵結 =氫原子麟基、芳基、芳基烧基、芳基烯基、芳基炔基 等所取代的化合物。亞胺殘基的碳原子數通常為2至2〇， 以2至18為較佳。以亞胺殘基而言，可舉例如通式： -CRkN-R7或通式：_N=C(Rr)2所示之基（式中，表示氫 原子、烷基、芳基、芳基烷基、芳基烯基、或芳基炔基；Rr 係獨立地表不烷基、芳基、芳基烷基、芳基烯基、或芳基 24 323323 201220574 炔基；惟，當存在2個R7時，2個RT亦可互相鍵結成為一 體而以2價基，例如伸乙基、三亞曱基、四亞曱基、五亞 曱基、六亞曱基等碳原子數2至18的伸烷基的形式而形成 環）。亞胺殘基係可列舉如以下的基。, soil, 2-propenyl, 1-butenyl, 2-butenyl, 1-, di-, p-pentenyl, hexenyl, 2-hexenyl, octenyl. The base block of the aromatic block is, for example, a group having an alkynyl group bonded to the aforementioned aryl group. The aryl 2 = 1 sub-number is usually 8 to 6 Å, preferably 8 to 3 Å. For example, phenyl to Cl 2 alkynyl, mc12 calcined! ^ soil / 2 to Cl 2 block, Cl to Cl 2 alkyl, G to Cl 2 alkynyl, naphthalene to Cl 2 block, 2-naphthyl' to C12 block and the like. Among these, it is preferably Cl to c12 alkoxy then Γ $ Γ &amp; ganyl basic group - C2 to Cl2 alkynyl group, (^ to C12 alkylbenzene 2 block group, and in the case of C2 to Cl2 alkynyl group For example, an ethynyl group, a 1-propynyl group, a 2-propynyl group, a butynyl group, a _pentyl group, a 2: lysyl group, a hexyl group, a 2-hexine group, and a octane group are exemplified. In the case of a substituted amine group, it is preferred that at least one of the chlorine atoms in the amine group is replaced by i or two groups in the group of alkyl aryl, arylalkyl and monovalent heterocyclic groups. The alkyl group, the aryl group, the aryl group or the monovalent heterocyclic group may further have a substituent. The number of carbon atoms of the substituted amine group does not include the alkyl group, the aryl group, the arylalkyl group or the monovalent heterocyclic group. The number of carbon atoms which may have a substituent 'is usually from 1 to 60, preferably from 2 to 48. Examples of the substituted amine group include methylamino group, dimethylamino group, ethylamine. Base, diethylamino group, propylamino group, dipropylamino group, isopropylamino group, diisopropylamino group, butylamino group, isobutylamino group, second butylamino group, Tert-butylamino, pentylamino, hexylamino, cyclohexylamine, g Amino, octylamino, 2-ethylhexylamino, decylamino, decylamino, 3,7-dimethyloctyl 22 323323 201220574 Amino, laurylamine, cyclopentyl Amino, dicyclopentylamino, cyclohexylamino, dicyclohexylamino, bis(trifluoromethyl)amino, phenylamino, bis-amino, (Cl to Cl2 alkoxybenzene) Amino group, di(Cl to Cl2 alkoxyphenyl)amino group, di-C! 2 alkylphenyl)amino group, naphthylamino group, 2-naphthylamino group, pentafluorophenylamino group, Amino group, a sulfhydryl group, a fluorenylamino group, a chlorinated amino group, a triterpenoid amine group, a (phenyl-Cl to Cl2 alkyl group), a (c-to-Cl2) oxyphenyl-Cl to Cl2 alkyl) amine group, (Cl to Ci2 φ alkylphenyl-Cl to Cu alkyl) amine group, di(Ci to Clz alkoxyphenyl-C, to Cl2 alkyl group Amino group, di(Cl to Cl2 polyphenylene-Cl to Cl2 alkyl) amine group, 1-naphthyl-Cl to Cl2 alkylamino group, 2-naphthyl-(^ to Cl2 alkylamino group, etc.) In the case of a substituted fluorenyl group, for example, at least one hydrogen atom in the fluorenyl group may be selected from a group selected from the group consisting of & bases, aryl groups, and aryl groups. a thiol group substituted with 1 to 3 groups in the group of i-valent heterocyclic groups. The alkyl group, aryl group, arylalkyl group or monovalent heterocyclic group may also have a substituent. The number of atoms, excluding the alkyl group, the aryl group, the arylalkyl group or the fluorene heterocyclic group, may have a carbon atom number of the radical group, usually from i to 60, preferably from 3 to 48. Examples of the substituted fluorenyl group include a trimethyl fluorenyl group, a triethyl fluorenyl group, a tripropyl sulphate group, a triisopropyl sulphate group, an isopropyl fluorenyl fluorenyl group, and an isopropyl group. Ethyl fluorenyl, tert-butyl dimethyl fluorenyl, pentyl decyl fluorenyl, hexyl fluorenyl fluorenyl, heptyl fluorenyl fluorenyl, octyl dimethyl sylylene, 2 - B Hexyl dimethyl sulphate, fluorenyl dimethyl sylylene, fluorenyl dimethyl sylylene, 3, 7-didecyl octyl dimethyl fluorenyl, lauryl dimethyl fluorenyl, (Phenyl- to c12-based) Shixiji, ((: 1 to Cl2 alkoxyphenyl-Cii Ci2 alkyl) Shi Xiji, (C" (: 12 alkyl phenyl { to Cl2 hospital base ) Shi Xiji, (Bu Caiji "to &amp; 323323 23 201220574 alkyl ) fluorenyl, (2-naphthyl-Ci to Ci2 alkyl) fluorenyl, (poor ^, benzyl-(: 丨 to C12 alkyl) monomethyl fluorenyl, triphenyl fluorenyl, tri茬 矽 矽 、 、 = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = A.··· The south atom is exemplified by a fluorine atom, a gas atom and an iodine atom. The carbon number of the base is usually 2 to 20, with a rutting value of 2 to 18. φ In terms of fluorenyl group, for example, ethyl acetyl, propyl fluorene, butyl hydrazine, isobutyl fluorenyl, pival fluorene, benzhydryl, tridyl, pentafluorobenzene Hyperthyroidism and so on. The number of carbon atoms of the monooxy group is usually from 2 to 20, preferably from 2 to 18. Examples of the aryloxy group include an ethyl ethoxy group, a propyl oxy group, a butyl fluorenyloxy group, an isobutyl decyloxy group, a trimethyl ethyloxy group: a benzyl fluorenyloxy group, and a trifluoro group. Ethyloxy, pentafluorobenzhydryl and the like. The imine residue means that, after the hydrogen atom in one of the structures is removed from the imine compound having the structure shown by the formula: H_N=C&lt; and: &amp; (3) The resulting residue. In the case of such an imine compound, for example, an acid imine; a ketimine; and a nitrogen atom in the imine bond; a hydrogen atom, an aryl group, an aryl group, an arylalkenyl group a compound substituted with an aryl alkynyl group or the like. The imine residue usually has 2 to 2 carbon atoms, preferably 2 to 18. In the case of an imine residue, for example, a formula: -CRkN-R7 or a group represented by the formula: -N=C(Rr) 2 (wherein represents a hydrogen atom, an alkyl group, an aryl group, an arylalkyl group) Alkyl, arylalkenyl, or arylalkynyl; Rr independently represents alkyl, aryl, arylalkyl, arylalkenyl, or aryl 24 323323 201220574 alkynyl; When two RTs may be bonded to each other to form a monovalent group, for example, an extension of an ethyl group, a trianthylene group, a tetradecylene group, a penta-indenyl group, a hexamethylene group or the like has a carbon number of 2 to 18 The form of the alkyl group forms a ring). Examples of the imine residue include the following groups.

(式中，Me表示甲基，以下相同。） 醯胺基的碳原子數通常為1至20，以2至18為較佳。 以醯胺基而言，可列舉例如：曱醯胺基、乙醯胺基、丙醯 胺基、丁醯胺基、苯曱醯胺基、三氟乙醯胺基、五氟苯曱 醯胺基、二曱醯胺基、二乙醯胺基、二丙醯胺基、二丁醯 胺基、二苯甲醯胺基、二（三氟乙醯胺基）、二（五氟苯醯胺 基）等。 醯亞胺基係指從醯亞胺去除鍵結於其氮原子的氳原子 25 323323 201220574(In the formula, Me represents a methyl group, and the same applies hereinafter.) The mercaptoamine group has usually 1 to 20 carbon atoms, preferably 2 to 18 carbon atoms. The mercaptoamine group may, for example, be a mercaptoamine group, an etidamine group, a propylamine group, a butylammonium group, a benzoguanamine group, a trifluoroacetamido group or a pentafluorobenzamide. Base, diammonium, diethylamine, dipropylamine, dibutylammonium, benzoylamino, bis(trifluoroacetamido), bis(pentafluorobenzamide) Base) and so on.醯imino group refers to the removal of ruthenium atoms bonded to its nitrogen atom from quinone imine 25 323323 201220574

:=可::::rr至2°，…較:= 可::::rr to 2°,...

0 00 0

留指從雜環式化合物去除1個氫原子後殘Retaining a residue after removing one hydrogen atom from a heterocyclic compound

有機化合物中以式^^ 子、硫原子、氮原子、璘二不僅為碳原子，亦包含氧原 碲原子、石中原子等雜原子子，子、石西原子、 基的碳原子數通常為3至60，以3 石1手數'去X 雜環基之碳原子數為不含取代基的 石厌原子數者。以如此夕！ β # 之1 雜基而言，可列舉例如：嗔 为基Cl C12烧基η塞吩基&quot;比洛基、吱口南基”比咬基、Cl 至Cl2烧基基、。荅卩井基、癌咬基“比卩井基、三哄基、吼 洛咬基、旅咬基、啥琳基、異喧淋基。此等之中，較佳為 323323 26 201220574 噻吩基、ci Cl2炫基嘆吩基”比咬基及Ci5_ 〇12烧基吼咬 基。又’以1價雜環基而言，較佳為i價的芳香族雜環基。 取代竣基係指幾基中的虱原子經烧基、芳基、芳基烧 基或1價雜環基所取代的基，亦即為式：_C(=0)0R*(式^， R為烷基、芳基、芳基烷基或丨價雜環基）所示之基。取代 叛基的碳原子數通常為2至6G，以2至48為較佳。前述 烷基、芳基、芳基烷基或1價雜環基亦可具有取代基。又， ^述碳原子數為不含前親基、芳基、綠絲或】價雜 %基所可具有之取代基的碳原子數者。以取倾基而古， 可列舉例如：甲氧絲基、乙氧基艘基、丙氧基羰基:甚 : 丁氧基、異丁氧基幾基、第二丁氧絲 土 ^二丁氧基羰基、戊基氧基羰基、己氧基羰基、環己 氧基极基、庚基氧絲基、辛基氧基縣、2—乙基 幾基、壬基氧基縣、癸氧基縣、3, 7_二甲基辛基氧^ =基、：二基氧基、三敗甲氧基羰基、五氟乙氧基i 二全^乳基碳基、全氟己基氧基羰基、全氟辛基氧基 土、本乳基幾基、萘氧基錄、0比咬基氧基幾基等。 等 1 iT中：表示_C〇2、_S〇3、I、、或姆)， 、 以γ而言，從離子性聚合物的酸度之觀點來看， 佳。 觀‘絲看，以—C〇2、翁、备或-P(V為較 ()中Μ表示金屬陽離子、或是具有或不具有 土之録陽離子。以金屬陽離子而言，較佳為1價、2價或3 323323 27 201220574 價的離子’可列舉如：Li、Na、K、Cs、Be、Mg、CaBa、In the organic compound, the formula, the sulfur atom, the nitrogen atom, and the ruthenium are not only carbon atoms, but also heteroatoms such as oxygen atom and atom in the stone. 3 to 60, the number of carbon atoms of the X-heterocyclic group is 3 to 60, and the number of carbon atoms of the X-heterocyclic group is a substituent having no substituent. So on the eve! Examples of the β-hetero group include, for example, a ruthenium-based Cl C12 alkyl η-saltyl group &quot;biloyl, a sulphate south base, a bite base, a Cl to Cl 2 alkyl group, Base, cancer bite base "than the well base, triterpene base, 吼洛 bite base, brigade bite base, 啥琳基, 喧 喧 。. Among these, it is preferably 323323 26 201220574 thienyl, ci Cl2 succinyl thiophene group" than the bite group and the Ci5_ 〇12 alkyl group, and in the case of a monovalent heterocyclic group, preferably i Aromatic heterocyclic group. A substituted indenyl group is a group in which a deuterium atom in a certain group is substituted with an alkyl group, an aryl group, an aryl group or a monovalent heterocyclic group, that is, a formula: _C (=0) a group represented by 0R* (wherein R is an alkyl group, an aryl group, an arylalkyl group or an anthracene heterocyclic group). The number of carbon atoms of the substituted thiol group is usually 2 to 6 G, and is 2 to 48. Preferably, the aforementioned alkyl group, aryl group, arylalkyl group or monovalent heterocyclic group may have a substituent. Further, the number of carbon atoms is not containing a pro-paraffin group, an aryl group, a green silk or a valence-based group. The number of carbon atoms which may have a substituent. The radicals may be, for example, a methoxy group, an ethoxy group, a propoxycarbonyl group: a butoxy group, an isobutoxy group. Base, second butoxycarbonyl, dibutoxycarbonyl, pentyloxycarbonyl, hexyloxycarbonyl, cyclohexyloxy, heptyloxymethyl, octyloxy, 2-ethyl Base, mercaptooxy county, decyloxy county, 3, 7-dimethyl Octyloxy^=yl, dikilyloxy, tris-methoxycarbonyl, pentafluoroethoxy i di-peri-carbylcarbyl, perfluorohexyloxycarbonyl, perfluorooctyloxyclay, present Alkyl group, naphthyloxy group, 0 group methoxy group, etc. etc. 1 iT: indicates _C〇2, _S〇3, I, or m), in terms of γ, from ion From the point of view of the acidity of the polymer, it is better to look at the wire, to -C〇2, Weng, Bei, or -P (V is a metal cation in the middle of 较, or with or without soil) a cation. In the case of a metal cation, an ion having a valence of monovalent, divalent or 3 323323 27 201220574 may be exemplified by Li, Na, K, Cs, Be, Mg, CaBa,

Ag、A卜 Bi、Cu、Fe、Ga、Μη、Pb、Sn、Ti、V、w、Υ、Yb、Ag, A, Bi, Cu, Fe, Ga, Μη, Pb, Sn, Ti, V, w, Υ, Yb,

Zn、Zr 等離子。此等之中，以 Li+、Na+、K+、Cs+、Ag+、Mg2+、Zn, Zr plasma. Among these, Li+, Na+, K+, Cs+, Ag+, Mg2+,

Ca2+為較佳。而且，以銨離子可具有的取代基而言，可列舉 如.甲基、乙基、丙基、異丙基、正丁基、異丁基、第三 丁基等碳原子數1至10的烷基。 式 U)中，Z1 表示 F、Cr、Br-、r、〇IT、RaS〇3—、Rac〇〇-、 CIO、C1(V、CUV、Cl〇4.、SOT、CN_、ΝΟΓ、s〇42-、HSOr、 P〇43、HP〇42-、H2PO4-、BFr 或 PFe-。 式（1)中，nl表示〇以上的整數，從原料單體之合成 之觀點來看，較佳為〇至8之整數，更佳為〇至2之整數。 式（1)中，al表示1以上的整數，bl表示〇以上的整 數。 al及bl係選擇使式（1)所示之基的電荷成為〇者。例 如.當 Y1 為-C〇2_、-S(V、-S(V、-P〇3-、或-B(Ra)3_，μ1 為 1 Φ價的金屬陽離子、或是具有或不具有取代基之銨陽離子， Ζ1 為 Γ、cr、Br_、Γ、OH—、RaS〇3-、RaCO〇-、CIO—、Cl〇2—、 CIO3、Cl〇r、SCN-、CN·、Ν0Γ、HS〇r、Η2Ρ0Γ、BF厂或 PFr 時’係選擇成滿足al=bl + l者。當Y1為-c〇2-、—s〇3-、-S〇厂、 _P〇3、或-B(Ra)3- ’ M1為2價的金屬陽離子，z1為Γ、Cl—、Ca2+ is preferred. Further, examples of the substituent which the ammonium ion may have include a methyl group having 1 to 10 such as a methyl group, an ethyl group, a propyl group, an isopropyl group, an n-butyl group, an isobutyl group or a t-butyl group. alkyl. In the formula U), Z1 represents F, Cr, Br-, r, 〇IT, RaS〇3—, Rac〇〇-, CIO, C1 (V, CUV, Cl〇4., SOT, CN_, ΝΟΓ, s〇) 42-, HSOr, P〇43, HP〇42-, H2PO4-, BFr or PFe-. In the formula (1), nl represents an integer of 〇 or more, and from the viewpoint of synthesis of a raw material monomer, 〇 is preferable. The integer of 8 is more preferably an integer of 〇. In the formula (1), a1 represents an integer of 1 or more, and bl represents an integer of 〇 or more. al and bl select a charge of a group represented by the formula (1). Become a leader. For example, when Y1 is -C〇2_, -S(V, -S(V, -P〇3-, or -B(Ra)3_, μ1 is a metal cation of 1 Φ, or has Or ammonium cations without substituents, Ζ1 is Γ, cr, Br_, Γ, OH—, RaS〇3-, RaCO〇-, CIO-, Cl〇2—, CIO3, Cl〇r, SCN-, CN· , Ν0Γ, HS〇r, Η2Ρ0Γ, BF factory or PFr' is selected to satisfy a=bl + l. When Y1 is -c〇2-, -s〇3-, -S〇, _P〇3, Or -B(Ra)3- 'M1 is a divalent metal cation, z1 is Γ, Cl-,

Br-、Γ、〇H—、RaS〇3_、RaC00·、CUT、C1(V、CKV、ClOr、 SCN、CN、N〇3、HS〇r、Η2ΡΟΓ、BFr或 PF6—時，係選擇成滿 足 bl=2xal-l 者。當 γ1 為—C〇2-、_s〇3-、_s〇2-、_p〇3-或 -Β(ί〇3_ ’ M1為3價的金屬陽離子，z1為「、Cl_、Br_、Γ、 323323 28 201220574 0『、RaS〇3—、Rac〇cr、C1(T、CKV、C1(V、Cl〇4'、SCN_、CN_、 N〇3—、HS〇4—、H2p〇4-、BFr或 PFr時，係選擇成滿足 bl=3xal-l 者。當 Y1 為-C〇2_、-S〇3-、-S〇2-、-P〇3-或-B(RaV，M1 為 1 價的金屬陽離子或是具有或不具有取代基的銨陽離子，Z1 為SOt或HP〇42-時，係選擇成滿足al=2xbl + l者。在表示 al與bl的關係的上述任一數學式中’ ai較佳為1至5的 整數’更佳為1或2。 φ ^表示具有或不具有取代基的碳原子數1至30之烧 基、或是具有或不具有取代基的碳原子數6至50之芳基， 關於此等基所可具有的取代基，可列舉如與前述Ql相關說 明中所例示的取代基相同的取代基。當存在複數個取代基 時，该等可為相同威相異。以Ra而言，可列舉例如：甲基、 乙基、丙基、異丙基、丁基、異丁基、第二丁基、第三丁 基、戊基、己基、環己基、庚基、辛基、壬基、癸基、月 桂基等碳原子數1至的烧基；苯基、1-萘基、2_萘基、 ® 1蒽基、2-蒽基、9-蒽基專碳原子數6至30的芳基等。 以月述式（1)所济之基而§，可舉例如以下之基。 323323 29 201220574 —COOM+ —CH2-C〇〇'M+ —(CH2)2-C00'M+ —(CH2)3-C〇〇'M+ — (CH2)4-CO〇'M+ —(ch2)5-co〇-m+ —(ch2)6-co〇-m+ —(ch2)7-co〇-m+ —(ch2)8-co〇-m+ _0 一 CH2_coo-m+ -〇-(CH2)2-CO〇-M+ -o-(ch2)3-co〇-m+ -o-(ch2)4-co〇-m+ —〇-(CH2)5-C〇〇'M+ -〇-(CH2)6-CO〇-M+ —〇-(CH2)7-CO〇-M+ — 〇-(CH2)8-CO〇-M+When Br-, Γ, 〇H-, RaS〇3_, RaC00·, CUT, C1 (V, CKV, ClOr, SCN, CN, N〇3, HS〇r, Η2ΡΟΓ, BFr or PF6), the system is selected to satisfy Bl = 2xal-l. When γ1 is -C〇2-, _s〇3-, _s〇2-, _p〇3- or -Β(ί〇3_ ' M1 is a trivalent metal cation, z1 is ", Cl_, Br_, Γ, 323323 28 201220574 0『, RaS〇3—, Rac〇cr, C1 (T, CKV, C1 (V, Cl〇4', SCN_, CN_, N〇3—, HS〇4—, When H2p〇4-, BFr or PFr, it is selected to satisfy bl=3xal-l. When Y1 is -C〇2_, -S〇3-, -S〇2-, -P〇3- or -B ( RaV, M1 is a monovalent metal cation or an ammonium cation with or without a substituent, and when Z1 is SOt or HP〇42-, it is selected to satisfy a=2xbl + l. In the relationship between a and bl In any of the above formulas, 'ai is preferably an integer of 1 to 5' is more preferably 1 or 2. φ ^ represents a burnt group having 1 to 30 carbon atoms with or without a substituent, or with or without The aryl group having 6 to 50 carbon atoms of the substituent, and the substituent which the group may have may be exemplified in the description related to Q1 described above. The substituents of the exemplified substituents are the same. When a plurality of substituents are present, the same may be the same. For Ra, for example, methyl, ethyl, propyl, isopropyl, butyl may be mentioned. , an isobutyl group, a second butyl group, a tert-butyl group, a pentyl group, a hexyl group, a cyclohexyl group, a heptyl group, an octyl group, a decyl group, a decyl group, a lauryl group, etc.; 1-naphthyl, 2-naphthyl, ® 1 fluorenyl, 2-indenyl, 9-fluorenyl aryl group having 6 to 30 carbon atoms, etc., based on the formula (1) of the monthly formula, § For example, the following may be used. 323323 29 201220574 — COOM+ —CH2-C〇〇'M+ —(CH2)2-C00'M+ —(CH2)3-C〇〇'M+ — (CH2)4-CO〇'M+ —(ch2)5-co〇-m+ —(ch2)6-co〇-m+ —(ch2)7-co〇-m+ —(ch2)8-co〇-m+ _0 a CH2_coo-m+ -〇-(CH2 )2-CO〇-M+ -o-(ch2)3-co〇-m+ -o-(ch2)4-co〇-m+ —〇-(CH2)5-C〇〇'M+ -〇-(CH2) 6-CO〇-M+ —〇-(CH2)7-CO〇-M+ — 〇-(CH2)8-CO〇-M+

CO〇-M+ .MOOCCO〇-M+ .MOOC

_ » . M Mm A —^)-C〇〇-M+ —S〇3&quot;M+ —CH2_S〇3-M+ —(CH2&gt;2 - S〇3-M+ —(CH2)3_S〇3-M+ —(CH2&gt;4_S〇3_M+ —(CH2)5-S〇3'M+ 一 (CH2)6-S03_M+ —(CH2)7-S〇3-M+ —(CH2)8-S03-M+_ » . M Mm A —^)-C〇〇-M+ —S〇3&quot;M+ —CH2_S〇3-M+ —(CH2&gt;2 - S〇3-M+ —(CH2)3_S〇3-M+ —(CH2&gt ;4_S〇3_M+ —(CH2)5-S〇3'M+ one (CH2)6-S03_M+ —(CH2)7-S〇3-M+ —(CH2)8-S03-M+

—〇-CH2-S〇3'M+ —〇-(CH2)2-S〇3'M+ 一 〇-(CH2)3 一 SCVM+ —〇—(CH2)4-S〇3-M+ —〇-(CH2)5-S〇3lVI+ —〇-(CH2)6-S〇3-M+ — O-^Ha^-SOa^ —0_(CH2)8_S&lt;VM+ so3-m+ +mo3s ~0~s〇3'm+ ~o M = Li, Na, K. Cs，N(CH3)4 〈式（2)所示之基〉 式（2)中，以Q2所示之2價有機基而言，係與前述 所示之2價有機基所例示者為相同的基。從原料單體的合 成的容易度之觀點來看，較佳為2價飽和烴基、伸芳基、 伸燒基氧基。 作為前述Q2所示之2價有機基的例子而舉出的基係可 具有取代基，以該取代基而言，可列舉如與前述Ql相關說 明中所例示的取代基相同的取代基。當存在複數個取代基 時’該等可為相同或相異。 式（2)中，Y2表示碳陽離子、銨陽離子、膦醯基陽離子、 磺醯基陽離子、或錤陽離子。 以碳陽離子而言，可舉例如下述式所示之基： 323323 30 201220574 -c+r2 (式中，r為相同或相異，表示烷基或芳基）。 以銨陽離子而言，可舉例如下述式所示之美· (式中，R為相同或相異，表示烧基或芳基） 以膦醯基陽離子而言，可舉例如下述 — . _p + ^3 巧所不之基. (式中，R為相同或相異，表示烷基或芳基）。 以石黃酿基陽離子而言，可舉例如下迷 一 . '所不之基· (式中’ R為相同或相異，表示烷基或芳基）。 以鑷陽離子而言，可列舉例如下述式 -1% ❻之基： (式中R為相同或相異，表不烧基或芳基） 式（2)中，從原料單體之合成的容易度、以及原料單體 及料性聚合物對於空氣、濕氣或熱的k性之觀點來 看’曰Y較佳為碳陽離子、銨陽離子、膦隨基陽離子、績醯 基陽離子’更佳為銨陽離子。 式⑵中1表示金屬陽離子、或是具有或不具有取代 基之銨陽離子。以金屬陽離子而言，較佳為丨價、2價戋3 價的離子，可列舉如：Li、Na、K、Cs、Be、^、ca、&amp;、—〇-CH2-S〇3'M+ —〇-(CH2)2-S〇3'M+ 一〇-(CH2)3 A SCVM+ —〇—(CH2)4-S〇3-M+ —〇—(CH2 ) 5-S〇3lVI+ —〇-(CH2)6-S〇3-M+ — O-^Ha^-SOa^ —0_(CH2)8_S&lt;VM+ so3-m+ +mo3s ~0~s〇3'm+ ~ o M = Li, Na, K. Cs, N(CH3)4 <Bases of the formula (2)> In the formula (2), the divalent organic group represented by Q2 is as described above. The exemplified by the divalent organic group is the same group. From the viewpoint of easiness of synthesis of the raw material monomers, a divalent saturated hydrocarbon group, an extended aryl group or an extended alkyl group is preferable. The group which is exemplified as the divalent organic group represented by the above Q2 may have a substituent, and examples of the substituent include the same substituents as those exemplified in the above Ql. When there are a plurality of substituents, the ones may be the same or different. In the formula (2), Y2 represents a carbocation, an ammonium cation, a phosphonium cation, a sulfonyl cation, or a phosphonium cation. The carbocation group may, for example, be a group represented by the following formula: 323323 30 201220574 -c+r2 (wherein r is the same or different and represents an alkyl group or an aryl group). The ammonium cation may, for example, be represented by the following formula: (wherein R is the same or different, and represents an alkyl group or an aryl group). The phosphonium cation is exemplified by the following - _p + ^ 3 巧不不基基. (wherein, R is the same or different, meaning alkyl or aryl). In the case of a zeolitic cation, the following is exemplified by the following: 'In the formula, 'R is the same or different, and means an alkyl group or an aryl group. Examples of the phosphonium cation include, for example, a group of the following formula: -1% hydrazine: (wherein R is the same or different, and is represented by an alkyl group or an aryl group). In the formula (2), synthesis from a raw material monomer Easiness, and the viewpoint of the k-type of air, moisture or heat of the raw material monomer and the material polymer, '曰Y is preferably a carbocation, an ammonium cation, a phosphinium cation, a fluorenyl cation. It is an ammonium cation. In the formula (2), 1 represents a metal cation or an ammonium cation having or without a substituent. In the case of a metal cation, an ion having a valence of valence and a valence of 2 valence is preferable, and examples thereof include Li, Na, K, Cs, Be, ^, ca, &amp;

Ag、A1、Bi、Cu、Fe、Ga、Μη、Pb、Sn、Ti、v、w、Y、Yb、Ag, A1, Bi, Cu, Fe, Ga, Μη, Pb, Sn, Ti, v, w, Y, Yb,

Zn'Zr等離子。而且，以銨陽離子可具有的取代基而言， 可列舉例如：曱基、乙基、丙基、異丙基、正丁某、異丁 323323 31 201220574 基、第三丁基等碳原子數1至10的烷基。 式（2)中，M2 表示 F—、cr、Br-、Γ、0『、RbS〇3_、RbC00_、 CUT、C1(V、C1(V、C1(V、SCN_、CN_、N(V、S〇42_、HS〇r、 Ρ0Λ、ΗΡ0Λ、Η2Ρ0Γ、BF，或 PF6_。 式（2)中，n2表示0以上的整數，較佳為0至6的整 數，更佳為0至2的整數。 式（2)中，a2表示1以上的整數，b2表示0以上的整 數。 ^ a2及b2係選擇使式（2)所示之基的電荷成為0者。例 如，當 M2 為 Γ、Cl_、Br-、Γ、OH-、RbS(V、RbC0(T、CIO-、 Cl〇2.、Cl〇3_、Cl〇4_、SCN-、ΟΓ、Ν0Γ、HS〇r、Η2Ρ0Γ、BF， 或PF^時，Z2若為1價的金屬離子或是具有或不具有取代 基之銨離子，則選擇成滿足a2=b2+l者；Z2若為2價的金 屬離子，則選擇成滿足a2=2xb2+l者；Z2若為3價的金屬 離子，則選擇成滿足a2=3xb2+l者。當M2為S〇42_、ΗΡΟΛ φ 時，Ζ2若為1價的金屬離子或是具有或不具有取代基的銨 離子，則選擇成滿足b2=2xa2-l者；Ζ2若為3價的金屬離 子，則選擇成滿足2xa2=3xb2+l的關係。在表示a2與b2 的關係之上述任一數學式中，a2較佳為1至3的整數，更 佳為1或2。Zn'Zr plasma. Further, examples of the substituent which the ammonium cation may have include a mercapto group, an ethyl group, a propyl group, an isopropyl group, a n-butyl group, an isobutyl group 323323 31, a 201220574 group, and a third butyl group. An alkyl group to 10. In the formula (2), M2 represents F—, cr, Br-, Γ, 0′′, RbS〇3_, RbC00_, CUT, C1 (V, C1 (V, C1 (V, SCN_, CN_, N (V, S) 〇42_, HS〇r, Ρ0Λ, ΗΡ0Λ, Η2Ρ0Γ, BF, or PF6_. In the formula (2), n2 represents an integer of 0 or more, preferably an integer of 0 to 6, more preferably an integer of 0 to 2. In (2), a2 represents an integer of 1 or more, and b2 represents an integer of 0 or more. ^ a2 and b2 are selected such that the charge of the group represented by the formula (2) becomes zero. For example, when M2 is Γ, Cl_, Br -, Γ, OH-, RbS (V, RbC0 (T, CIO-, Cl〇2., Cl〇3_, Cl〇4_, SCN-, ΟΓ, Ν0Γ, HS〇r, Η2Ρ0Γ, BF, or PF^) If Z2 is a monovalent metal ion or an ammonium ion with or without a substituent, it is selected to satisfy a2=b2+l; if Z2 is a divalent metal ion, it is selected to satisfy a2=2xb2+l If Z2 is a trivalent metal ion, it is selected to satisfy a2=3xb2+l. When M2 is S〇42_, ΗΡΟΛ φ, if Ζ2 is a monovalent metal ion or has or does not have a substituent Ammonium ions are selected to satisfy b2=2xa2-l; if Ζ2 is a trivalent metal ion, then To satisfy the relationship 2xa2 = 3xb2 + l In any of the above equation represents the relationship of a2 and b2, a2 is preferably an integer of 1 to 3, 1 or 2 is more excellent.

Rb表示具有或不具有取代基之碳原子數1至30的烷 基、或是具有或不具有取代基之碳原子數6至50的芳基， 關於此等基可具有的取代基，可列舉如與前述Q1相關說明 中所例示的取代基相同的取代基。當存在複數個取代基 32 323323 201220574 時，該等可為相同或相異。以Rb而言，可列舉例如：曱基、 乙基、丙基、異丙基、丁基、異丁基、第二丁基、第三丁 基、戊基、己基、環己基、庚基、辛基、壬基、癸基、月 桂基等碳原子數1至20的烷基；苯基、1-萘基、2-萘基、 1-蒽基、2-蒽基、9-蒽基等碳原子數6至30的芳基等。 以前述式（2)所示之基而言，可舉例如以下的基。Rb represents an alkyl group having 1 to 30 carbon atoms with or without a substituent, or an aryl group having 6 to 50 carbon atoms with or without a substituent, and examples of the substituent which the group may have may be mentioned. The same substituents as those exemplified in the description of Q1 above. When there are a plurality of substituents 32 323323 201220574, the may be the same or different. Examples of Rb include a mercapto group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a second butyl group, a tert-butyl group, a pentyl group, a hexyl group, a cyclohexyl group, a heptyl group, and the like. An alkyl group having 1 to 20 carbon atoms such as an octyl group, a decyl group, a decyl group or a lauryl group; a phenyl group, a 1-naphthyl group, a 2-naphthyl group, a 1-fluorenyl group, a 2-fluorenyl group, a 9-fluorenyl group, etc. An aryl group having 6 to 30 carbon atoms or the like. The group represented by the above formula (2) may, for example, be the following group.

33 323323 201220574 -NMe2Et*X-——ΟΗ2-ΝΜθ2Ε^Χ·——(ΟΗ^2-ΝΜβ2Εΐ^χ· —(CH2)3^NMe2Et+X· —(CH2)4-NMe2Et+X-33 323323 201220574 -NMe2Et*X-——ΟΗ2-ΝΜθ2Ε^Χ·——(ΟΗ^2-ΝΜβ2Εΐ^χ·—(CH2)3^NMe2Et+X· —(CH2)4-NMe2Et+X-

-(〇Η2)5-ΝΜβ2Εί&quot;χ- —(CH2)6-NMe2Et+X· —(CH2)7-NMe2Et+X· 一 (CH2)8-NMe2EfX —〇—(CH2)4-NMe2Et+X· —0 -(CH2)8-N M e2E(*X· -〇—CH2-NMe2Et+X' —〇—(CH2)2-NMe2EfX· —〇—(CH2)3-NMe2Et+X· -〇-(CH2&gt;5 一 NMe2EfX· ~ O ~(C H 2) 6 ~N Μ β2Εΐ^χ· — O -(CH 2)7~ N Μβ2Εϊ^χ· 除2EfX·-(〇Η2)5-ΝΜβ2Εί&quot;χ--(CH2)6-NMe2Et+X·—(CH2)7-NMe2Et+X·一(CH2)8-NMe2EfX—〇—(CH2)4-NMe2Et+X· —0 —(CH2)8-NM e2E(*X· -〇—CH2-NMe2Et+X′—〇—(CH2)2-NMe2EfX·—〇—(CH2)3-NMe2Et+X· -〇-(CH2&gt ;5 NMe2EfX· ~ O ~(CH 2) 6 ~N Μ β2Εΐ^χ· — O -(CH 2)7~ N Μβ2Εϊ^χ· In addition to 2EfX·

NMezEt^X- -X+EtMe2NNMezEt^X- -X+EtMe2N

—NHMe2+X' —CH2~NHMe2+X· —(CH2)2-NHIVle2+X· —(CH 2)3 - N HM e2+X： — (CH 2)4~N H Me 2+X&quot; —(CH2)6-NHMe2+X· —(CH2)6-NHMe24X- —(CH2)7.-NHMe2+X· —(CH2)8-NHMe2+X- —〇-CH2-NHMe2+X' —O-CCH^j-NHMej^- —〇-(CH2)3-NHMe2+X- —〇-(CH2)4-NHMe2+X-_〇_{CH2)5-NEl3+X- —〇-(CH2)6-NEt3iX- — 〇-(CH2)7-NHMe2+X. 一〇-(CH2)8-NHMe2+X-—NHMe2+X' —CH2~NHMe2+X·—(CH2)2-NHIVle2+X·—(CH 2)3 - N HM e2+X: — (CH 2)4~NH Me 2+X&quot; —( CH2)6-NHMe2+X·-(CH2)6-NHMe24X--(CH2)7.-NHMe2+X·-(CH2)8-NHMe2+X--〇-CH2-NHMe2+X'-O-CCH ^j-NHMej^--〇-(CH2)3-NHMe2+X--〇-(CH2)4-NHMe2+X-_〇_{CH2)5-NEl3+X--〇-(CH2)6- NEt3iX- — 〇-(CH2)7-NHMe2+X. 〇-(CH2)8-NHMe2+X-

_&lt;〇-NHW_&lt;〇-NHW

NHMe2&quot;X- -X+MejHNNHMe2&quot;X- -X+MejHN

-NEt3+X- — CH2-NEfe+X· —(CH2)2-NEt3+X· —(CH2)3-NE1s+X* —(CH^-NEta^X' -(CHrfs-NEts^· —(CH2)6-NEt3+X- —(CH^yNE^X· —(CH2)8-NE%+X· _〇_CH2-NEt3+x· —〇-(CH2)2-NEti}+X· -〇-(CH2)3-NEtg+X- -〇—(CH2)4-NE1b+X- -〇-(CH2)5-NEt3+X· -〇-(CH2)6-NEfe+X- —〇-(CH2)7-NEt3+X* —〇-(〇Η2)8-ΝΕ^· -〇-ne^+x' -&quot;0 NE%+X*-NEt3+X- — CH2-NEfe+X· —(CH2)2-NEt3+X· —(CH2)3-NE1s+X* —(CH^-NEta^X' -(CHrfs-NEts^·—( CH2)6-NEt3+X- —(CH^yNE^X·—(CH2)8-NE%+X· _〇_CH2-NEt3+x·—〇-(CH2)2-NEti}+X· - 〇-(CH2)3-NEtg+X--〇-(CH2)4-NE1b+X--〇-(CH2)5-NEt3+X·-〇-(CH2)6-NEfe+X-——〇- (CH2)7-NEt3+X*—〇-(〇Η2)8-ΝΕ^· -〇-ne^+x' -&quot;0 NE%+X*

Me - CH3Me - CH3

Et = CH2CH3 X - F, Cl, Br, I, BPh4, CHjCOO, CF3S03l 34 323323 201220574Et = CH2CH3 X - F, Cl, Br, I, BPh4, CHjCOO, CF3S03l 34 323323 201220574

_NHEt2+X- 一CH2-NHEt2+X- —(CH2)2-NHEt2+X- 一(CH2)3_NHEt2+x· 一(CH2)4_NHEt2X_NHEt2+X--CH2-NHEt2+X--(CH2)2-NHEt2+X--(CH2)3_NHEt2+x·-(CH2)4_NHEt2X

—(CH^s-NHEtatK- —(CH2)e-NHEt2+X- —(ΟΗ2)7-ΝΗΕί2+χ· ~(CH2)8-NHEt2+X—(CH^s-NHEtatK- —(CH2)e-NHEt2+X-—(ΟΗ2)7-ΝΗΕί2+χ· ~(CH2)8-NHEt2+X

—〇—CH2-NHEt2+X· —〇_(CH2)2-NHEt2+X· —〇-(CH2)3-NHEt2+X- —〇—(CH2)4 ~NHEt2+X—〇—CH2-NHEt2+X·—〇_(CH2)2-NHEt2+X·—〇-(CH2)3-NHEt2+X-—〇—(CH2)4 ~NHEt2+X

—〇-(CH2)5-NHEt2+X· NHEt2+X&quot; -0 - (C Η2)β -N H Et2+X· —O - &lt;CH2)7 _ NH Et2+X·—〇-(CH2)5-NHEt2+X· NHEt2+X&quot; -0 - (C Η2)β -N H Et2+X· -O - &lt;CH2)7 _ NH Et2+X·

NHEt2+X· 'X^HNNHEt2+X· 'X^HN

一O—(CH2)8_NHEt2&lt;X&quot; —NEtPh2^X' —CH2-NEtPh2+X' 一(CH2)2-NEtPh2+X· 一(CH2)3-NEtPh2+X· —(CH2)4~NEtPii2+X' 一(CH2)5-NEtPh2+X· —(CH2)6-NEtPh2+X. —(CH2)7-NEtPh2+X- —(CH2)8_N.EtPh2+X. 一〇—CH2-NEtPh2+X一〇 一 (CH2)2-NEtPh2+X- —〇-(CH2h-NEtPh2+X. —〇—(CH2)4-NEtPh2+X' -O-(eH2)5-NEtPh24X· —〇-(CH2)6-NEtPh2+X· —〇-(CH2)7-NEtPh2+X- ~O-iCHjJs-NEtPha^X- NEtPha^X' 'X+P —^^-NEtPh2+X- —O-(CH2)8_NHEt2&lt;X&quot;-NEtPh2^X'-CH2-NEtPh2+X'-(CH2)2-NEtPh2+X·-(CH2)3-NEtPh2+X·-(CH2)4~NEtPii2+ X'-(CH2)5-NEtPh2+X·-(CH2)6-NEtPh2+X. —(CH2)7-NEtPh2+X- —(CH2)8_N.EtPh2+X. 一〇—CH2-NEtPh2+X 〇(CH2)2-NEtPh2+X--〇-(CH2h-NEtPh2+X. —〇—(CH2)4-NEtPh2+X′ -O-(eH2)5-NEtPh24X·—〇-(CH2) 6-NEtPh2+X·—〇-(CH2)7-NEtPh2+X- ~O-iCHjJs-NEtPha^X- NEtPha^X' 'X+P —^^-NEtPh2+X- —

—NHPh〆—CH2-NHPh2+X* —(CH2)2-NHPh2+X· —(CH2)3-NHPh2+X- —(CHjU-NHR^· —(CH2)5-NHPh2+X· —(CH2)e-NHPh2+X· —(CH2)7-NHPh2+X· —(CH2)s-NHPh24X-——0—CH2~NHPh2+X' 一〇 — (CH2)2_NHPh2+X· 一 〇 —(CH2)3—NHPh2+X· —〇 —(CH 2)4 &quot;N H Ph2+X&quot; —0—(CH2)5~NHPh2+X' —〇-(CH2)e-NHPh2+X' —(CH2)7—NHPh2+X* —0-(CH2)8—NHPh2+X' -Q-—h2+x-—NHPh〆—CH2-NHPh2+X* —(CH2)2-NHPh2+X·—(CH2)3-NHPh2+X-—(CHjU-NHR^·—(CH2)5-NHPh2+X·—(CH2 )e-NHPh2+X·—(CH2)7-NHPh2+X·—(CH2)s-NHPh24X-——0—CH2~NHPh2+X′ 一〇—(CH2)2_NHPh2+X· 一〇—(CH2 3—NHPh2+X·—〇—(CH 2)4 &quot;NH Ph2+X&quot; —0—(CH2)5~NHPh2+X′ —〇—(CH2)e-NHPh2+X′ —(CH2) 7-NHPh2+X* —0-(CH2)8—NHPh2+X′ -Q-—h2+x-

NHPh2+X- -XVhjHNNHPh2+X- -XVhjHN

Et = CH2CH3 Ph = C6H5 X = F, Cl, Br, I, BPh4, CH3CO〇, CF3SG3. 〈式（3)所示之基〉 式（3)中’以Q3所示之2價有機基而言’可舉例如與前 述Q1所示之2價有機基所例示者相同的基。此等之中，從 原料單體的合成容易度之觀點來看，較佳為2價飽和烴 基、伸芳基、伸烷基氧基。 323323 35 201220574 述Q所示之2價有機基之例子而舉出的基係町 二=，以該取代基而言，可列舉如與前述Q1相關説 眭」不之取代基相同的取代基。當存在複數個取代基 時，該專可為相同或相異。 以前述Q3所· + + 0 , 之基 '、之2價有機基而言，較佳為_(qj2)_所示 〇Et = CH2CH3 Ph = C6H5 X = F, Cl, Br, I, BPh4, CH3CO〇, CF3SG3. <Bases of formula (3)> In the formula (3), 'in the case of the divalent organic group represented by Q3 'For example, the same ones as those exemplified for the divalent organic group represented by the above Q1 may be mentioned. Among these, from the viewpoint of easiness of synthesis of the raw material monomers, a divalent saturated hydrocarbon group, an extended aryl group, and an alkyleneoxy group are preferable. 323323 35 201220574 The base system of the example of the divalent organic group represented by Q is as follows. The substituent is the same as the substituent of the above-mentioned Q1. When there are a plurality of substituents, the specifics may be the same or different. Preferably, _(qj2)_ is represented by the above-mentioned Q3, + + 0 , the base ', and the bis-valent organic group.

表示〇以上的整數，較佳為0至20之整數，更佳 為0至8之整數。 式（3)中，Y3表示—CN或式⑷至（12)中的任一者所示 基。 式⑷至（12)中’卩R’所示之2價烴基而言，可 例如：亞甲基、伸乙基、1，2-伸丙基、1，3-伸丙基、&quot;二 伸丁基、1，3-伸丁基、伸丁基、15_伸戊基、二An integer representing 〇 above is preferably an integer of 0 to 20, more preferably an integer of 0 to 8. In the formula (3), Y3 represents a group represented by -CN or any one of the formulas (4) to (12). In the formula (4) to (12), the divalent hydrocarbon group represented by '卩R' may be, for example, a methylene group, an exoethyl group, a 1,2-extended propyl group, a 1,3-propanyl group, and a Butyl butyl, 1,3-butylene, butyl, 15 pentyl, two

^基、丨’9_伸壬基、M2-伸十二基、此等基中的至少J 氫原子經取代基取代的基等具有或不具有取代基之嗥個 參數1至50的2價飽和烴基；包含伸乙婦基、伸丙埽基、子 伸丁烯基、2-伸丁烯基、2_伸戊烯基、2_伸己烯基二八3〜 壬稀基、2-伸十二烯基、此等基中的至少i個氫屑子= 代基取代的基等具有或不具有取代基之碳原子數2至Μ 伸烯基及伸乙炔基的具有或不具有取代基之碳原子數2的 50的2價不飽和烴基；伸環丙基、伸環丁基、伸壤戊至 伸環己基、伸環壬基、伸環十二基、伸齡、伸金剛乂、 此等基中的至少1倾原子縣代錄代的基等^、 具有取代基之碳原子數3至50的2價環狀飽和趣基^ 1，3〜 323323 36 201220574 伸苯基、1，4-伸苯基、1，4-伸萘基、ι，5-伸萘基、2 6_伸 萘基、聯苯-4, 4’-二基、此等基中的至少丨個氫原子經取 代基取代的基等具有或不具有取代基之碳原子數6至的 伸芳基；亞曱基氧基、伸乙基氧基、伸丙基氧基、伸丁基 氧基、伸戊基氧基、伸己基氧基、此等基中的至少丨個^ 原子經取代基取代的基等具有或不具有取代基之 1至50的伸烷基氧基等。 ’、數 以前述取代基而t，可列舉如與前述^相關說明中所 例示之取代基相同的取代基。當存在複數個取代基時，該 專可為相同或相異。 式⑷至（12)中，以R，’所示之丨價烴基而言，可列舉 例如：甲基、乙基、丙基、異丙基、丁基、異丁基、第二 丁基、第三丁基、戊基、己基、環己基、庚基、辛基、壬 基、癸基、月桂基、此等基中的至少丨個氫原子經取代基 取代的基等具有或不具有取代基之碳原子數i i 2〇的烧 卜萘基、2-萘基、U、基、2'f基、9_葱基、 此專基中的至少1個氫原子經取代基取代的 具有取代基之碳原子數6至3〇的娑土八有或不 的溶解性德財看，料為;衫。㈣子性聚合物 2-萘基。卩前述取代基而言 =基'本基、1_#基、 中所例示的取代基相同的取^舉=前述Q1相關說明 時，該等可為相同或域。▲胃子在複數個取代基 式（5 )中，以R’ ’ ’所示之q押 甲院三基—咖川、乙产^而言’可列舉例如： 乙坑二基、1，2,3-丙烷三基、 323323 37 201220574 1，2,4-丁烷三基、12,5—戊烷三基、135_戊烷三基、 1，2,6-己烷三基、13, 6_己烷三基、此等基中的至少】個 氫原子經取代基取代的基等具有或不具有取代基之碳原子 數1至20的烧基三基，1，2,3-苯三基（1，2,3-benzenetriyl)、l 2, 4一苯三基、1，3, 5_笨三基、此等基中 的至少1個氫原子經取代基取代的基等具有或不具有取代 基之碳原子數6至30的芳基等。從離子性聚合物的溶解性 φ 之觀點來看，較佳為曱烷三基、乙燒三基、1，2, 4-苯三基、 1，3, 5-苯三基。以前述取代基而言，可列舉如與前述以相 關說明中所例示的取代基相同的取代基。當存在複數個取 代基時’該等可為相同或相異。 式（4)至（12)中，從離子性聚合物的溶解性之觀點來 看，較佳為曱基、乙基、苯基、萘基、2一萘基 式（4)及式（5)中，a3表示1以上的整數，較佳為3至 10之整數。式（6)至（12)中，a4表示〇以上的整數。於式 • (6) ’ a4係以〇至30的整數為較佳，以3至2〇的整數為 更佳。於式（7)至（10)，a4以〇至1〇的整數為較佳，〇至 5的整數為更佳。於式（11)，a4以〇至2〇的整數為較佳， 3至20的整數為更佳。於式（12)，a4以0至20的整數為 較佳，0至10的整數為更佳。 以Y而§ ’伙原料早體的合成容易度之觀點來看，較 佳為-CN、式（4)所示之基、式（6)所示之基、式（10)所示之 基、式（11)所示之基，更佳為式（4)所示之基、式（6)所示 之基、式（11)所示之基，特佳為以下的基。 38 323323 201220574 ——0-iCH2CH2p)2Me —&gt;〇iCH2CH2〇)3Me ——〇iCH2CH2P)4Me —〇iCH2CH2〇)5Me —^〇iCH2CH2〇)eMe —0-(CH2CH2〇)7Me^2, 丨'9_extension group, M2-extension dodecyl group, a group in which at least a J hydrogen atom in the group is substituted with a substituent, etc., with or without a substituent, a parameter 2 to 50 a saturated hydrocarbon group; comprising an extended methyl group, a propenyl group, a propenyl group, a 2-butenyl group, a 2-pentenylene group, a 2-extended hexenyl group, a bisylene group, and a 2- a dodecenyl group, at least i hydrogen granules in such a group = a substituted group such as a substituted group, and the like, having or having no substituent, having 2 or more substituents of an alkenyl group and an ethynyl group a 50-membered divalent unsaturated hydrocarbon group having 2 carbon atoms; a cyclopropyl group, a cyclopentene butyl group, a stretched pentane to a cyclohexylene group, a fluorenyl group, a stilbene ring group, an extended age, and an exoskeleton , at least one of the bases of the bases of the bases of the bases, and the substituents having a carbon atom number of 3 to 50, a divalent cyclic saturated group ^ 1,3~ 323323 36 201220574 phenyl, 1 , 4-phenylene, 1,4-naphthyl, iota, 5-naphthyl, 2 6-naphthyl, biphenyl-4, 4'-diyl, at least one hydrogen in the groups a carbon having or without a substituent, such as a group substituted with a substituent a subunit of 6 to an aryl group; an anthranylene group, a hexyloxy group, a propyloxy group, a butyloxy group, a pentyloxy group, a hexyloxy group, or at least Further, a group in which an atom is substituted with a substituent, or the like, a 1 to 50 alkyleneoxy group or the like having a substituent. The number of the above substituents and t may be the same as the substituents exemplified in the above description. When there are a plurality of substituents, the specifics may be the same or different. In the formulae (4) to (12), the valence hydrocarbon group represented by R, ' may, for example, be a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group or a second butyl group. a third butyl group, a pentyl group, a hexyl group, a cyclohexyl group, a heptyl group, an octyl group, a decyl group, a decyl group, a lauryl group, a group in which at least one hydrogen atom in the group is substituted with a substituent, or the like has or does not have a substitution. a substituent having a carbon atom number of ii 2〇, a naphthyl group, a 2-naphthyl group, a U group, a 2'f group, a 9-onion group, and at least one hydrogen atom in the specific group substituted with a substituent The solubility of the earth with a carbon number of 6 to 3 八 is ok or not, and it is expected to be; (4) Sub-polymer 2-Naphthyl. In the case of the above substituents, the substituents exemplified in the base group, the radical group, and the substituents exemplified in the above-mentioned substituents are the same or the domains. ▲The stomach is in the plural substituting formulas (5), and the q-bikes of the syllabary of the syllabary, which are represented by R' '', are described in the following: , 3-propanetriyl, 323323 37 201220574 1,2,4-butanetriyl, 12,5-pentanetriyl, 135-pentanetriyl, 1,2,6-hexanetriyl, 13, a 6-hexane triyl group, a group of at least one hydrogen atom in the group substituted with a substituent, etc., having or having a substituent, and having 1 to 20 carbon atoms, 1,2,3-benzene a tris(1,2,3-benzenetriyl), a l 2,4-benzenetriyl group, a 1,3,5-stupyltriyl group, a group in which at least one hydrogen atom in the group is substituted with a substituent, or the like An aryl group having 6 to 30 carbon atoms and the like having no substituent. From the viewpoint of the solubility φ of the ionic polymer, a decane triyl group, an ethene triyl group, a 1,2,4-benzenetriyl group, and a 1,3,5-benzenetriyl group are preferable. The substituents as described above may be the same as those described above for the substituents exemplified in the related description. When there are a plurality of substituents, the ones may be the same or different. In the formulae (4) to (12), from the viewpoint of solubility of the ionic polymer, a mercapto group, an ethyl group, a phenyl group, a naphthyl group, a 2-naphthyl group (4) and a formula (5) are preferable. In the above, a3 represents an integer of 1 or more, preferably an integer of 3 to 10. In the formulae (6) to (12), a4 represents an integer of 〇 or more. In the formula: (6) ' a4 is preferably an integer from 〇 to 30, and more preferably an integer from 3 to 2 。. In the formulae (7) to (10), a4 is preferably an integer of 〇 to 1〇, and an integer of 〇 to 5 is more preferably. In the formula (11), a4 is preferably an integer of 〇 to 2〇, and an integer of 3 to 20 is more preferably. In the formula (12), a4 is preferably an integer of 0 to 20, and an integer of 0 to 10 is more preferably. The base represented by the formula (4), the group represented by the formula (6), and the group represented by the formula (10) are preferable from the viewpoint of the ease of synthesis of the raw material of Y and § 'the raw material. The group represented by the formula (11) is more preferably a group represented by the formula (4), a group represented by the formula (6) or a group represented by the formula (11), and particularly preferably the following group. 38 323323 201220574 ——0-iCH2CH2p)2Me —&gt;〇iCH2CH2〇)3Me ——〇iCH2CH2P)4Me—〇iCH2CH2〇)5Me—^〇iCH2CH2〇)eMe —0-(CH2CH2〇)7Me

——0-(CH2CHp)2H ——0-iCH2CH2〇)3H —0-(CH2CH2〇)4H——0-(CH2CHp)2H——0-iCH2CH2〇)3H —0-(CH2CH2〇)4H

—〇-(CH2CHp)5H 一〇-(CH2CHp)eH ——0-(CH2CH20)7H—〇-(CH2CHp)5H 一〇-(CH2CHp)eH ——0-(CH2CH20)7H

0 _η -〇iCH2CH2〇)2Me 0 II —C—0-(CH2CH20)3Me 〇 II -C—〇iCH2CH 2〇 “Μ e 〇 4 -0-(CH2CHp)5Me 〇 —ϋ—0-(CH2CH20)6Me 0 -J. —0-(ΟΗ2〇Η2〇)7Μβ 〇 -ί—〇-(CH jCH 2〇 )2 Η 0 一Ϊ—0-&lt;CH2CH20)3H 〇 -J- -0-(CH2CHp)4H -〇iCH2CH2〇)5H 0 II —C—〇-(CH2CH2〇)6H 〇 -J- -〇iCH2CH2〇)7H 〈離子性聚合物中之構造單元〉 本發明所使用之離子性聚合物較佳為具有前述式（13) 所示之構造單元、前述式（15)所示之構造單元、前述式（17) 所示之構造單元、前述式（2〇)所示之構造單元，而更佳為 在全部構造單元中具有15至1〇〇莫耳％之前述構造單元的 離子性聚合物。 φ 〈式（13)所示之構造單元〉 式（13)中，R1係包含式（14)所示之基的1價基，Ar1表 示具有或不具有Ri以外之取代基之（2+114)價的芳香族基， n4表示1以上的整數。 式（14)所示之基可直接鍵結於紅1,亦可經由下述者而 鍵結於Ar1 :亞甲基、伸乙基、伸丙基、伸丁基、伸戊基、 伸己基、伸壬基、伸十二基、伸環丙基、伸環丁基、伸環 戊基、伸環己基、伸環壬基、伸環十二基、伸萡基、伸金 剛烷基、此等基中的至少丨個氫原子經取代基取代的基等 39 323323 201220574 具有或不具有取代基之碳原子數丨至50的伸烷基；氧基亞 曱基（oxymethylene)、氧基伸乙基（〇xyethylene)、氧基伸 丙基、氧基伸丁基、氧基伸戊基、氧基伸己基、氧基伸壬 基、氧基伸十二基、伸環丙基氧基、伸環丁基氧基、伸環 戊基氧基、伸環己基氧基、伸環壬基氧基、伸環十二基氧 基、伸萡基氧基、伸金剛烷基氧基、此等基中的至少丨個 氫原子經取代基取代的基等具有或不具有取代基之碳原子 數1至50的氧基伸烷基；具有或不具有取代基之亞胺基； 具有或不具有取代基之亞矽基；具有或不具有取代基^ 乙烯基；伸乙炔基；具有或不具有取代基之甲烧三基 原子、氮原子、硫原子等雜原子。 ，一 刖述Ar亦可具有ri以外的取代基。以該取代基而卞， 係可列舉如與前述Ql相關朗巾所例示之取代基相同的° 代基。當存在複數個前述取代基時，該等可為相同或相異 以前述Arl所具有之R1以外的取代基而言，從原粗J 體的合成容易度之觀點來看，較佳為烧基、烧氧基、芳教早 芳基氧基、羧基或取代羧基。 土、 式（13)中，n4表示1以上的整數，較佳為 數’更佳為1至3的整數。 至4的整 以式（13)中的Ari所示之（2+n4)價芳香族基而古， 舉如（2+π4)價的^:香她基、（2+n4)價的料族雜以列 僅由碳原子所構成或由碳原子與選自氫原子、=’ SSI所成群組中的1個以上原子所構成之(2心 、香矣基。以该（2偏）價的芳香族基而言，可列舉例如貝 323323 40 201220574 啡環 從苯環、吡啶環、1，2-二畊環、1，3-二啡環、〗 丄，4〜一 1，3, 5-三畊環、呋喃環、吡咯環、吡唑環、吨 +唑環、脾 環、吖二唑（azadiazole)環等單環式芳香ί裏巾 ，唑 n4) 環0 _η -〇iCH2CH2〇)2Me 0 II —C—0—(CH2CH20)3Me 〇II -C—〇iCH2CH 2〇“Μ e 〇4 -0-(CH2CHp)5Me 〇—ϋ—0-(CH2CH20)6Me 0 -J. —0-(ΟΗ2〇Η2〇)7Μβ 〇-ί—〇-(CH jCH 2〇)2 Η 0 Ϊ—0-&lt;CH2CH20)3H 〇-J- -0-(CH2CHp)4H -〇iCH2CH2〇)5H 0 II—C—〇-(CH2CH2〇)6H 〇-J--〇iCH2CH2〇)7H <Structural unit in ionic polymer> The ionic polymer used in the present invention is preferably It is more preferable that the structural unit represented by the above formula (13), the structural unit represented by the above formula (15), the structural unit represented by the above formula (17), and the structural unit represented by the above formula (2) are more preferable. An ionic polymer having 15 to 1 mole % of the above structural unit in all structural units. φ < Structural unit represented by the formula (13)> In the formula (13), the R1 system includes the formula (14) The monovalent group of the group shown, Ar1 represents an (2+114)-valent aromatic group having or not having a substituent other than Ri, and n4 represents an integer of 1 or more. The group represented by the formula (14) can be directly bonded. Yuhong 1 can also be bonded to Ar1 by using the following: methylene Ethyl, propyl, butyl, pentyl, hexyl, decyl, decyl, cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, fluorene a group, a fluorenyl group, a fluorenyl group, an adamantyl group, a group in which at least one hydrogen atom in the group is substituted with a substituent, etc. 39 323323 201220574 A carbon atom with or without a substituent 丨 to 50 Alkyl; oxymethylene, oxyethyl, oxypropyl, oxybutyl, oxypentyl, oxyhexyl, oxyalkyl, oxy Dibasic, cyclopropyloxy, cyclobutyloxy, cyclopentyloxy, cyclohexyloxy, cyclohexyloxy, decyloxy, decyloxy An adamantyloxy group, a group substituted with a substituent of at least one hydrogen atom in the group, or the like having an alkyl group having 1 to 50 carbon atoms with or without a substituent; with or without a substituent Imino group; an anthracene group with or without a substituent; with or without a substituent; a vinyl group; an exetylene group; Or a hetero atom such as a triazole atom, a nitrogen atom or a sulfur atom having no substituent. Further, Ar may have a substituent other than ri. The substituent may be exemplified by Q1 as described above. The substituents exemplified in the scented towel are the same thiol group. When a plurality of the aforementioned substituents are present, the same or different substituents other than R1 of the aforementioned Arl may be used from the original coarse J body. From the viewpoint of easiness of synthesis, a pyridyl group, an alkoxy group, an aromatic aryloxy group, a carboxyl group or a substituted carboxyl group is preferred. In the formula (13), n4 represents an integer of 1 or more, and preferably a number ' is more preferably an integer of 1 to 3. The (2+n4)-valent aromatic group represented by Ari in the formula (13) is up to 4, and is exemplified by a (2+π4) valence ^: fragrant base, (2+n4) valence A group consisting of only carbon atoms or a carbon atom and one or more atoms selected from the group consisting of hydrogen atoms and =' SSI (2 cores, chelating groups). The aromatic group of the valence may, for example, be 323323 40 201220574 from the benzene ring, the pyridine ring, the 1,2-two cultivating ring, the 1,3-dimorphine ring, the 丄 丄, 4 to a 1,3, 5-three-till ring, furan ring, pyrrole ring, pyrazole ring, ton + azole ring, spleen ring, azadiazole ring, etc. monocyclic aromatic olirib, azole n4) ring

個氫原子後所得之（2+η4)價基；從由選自該 所成群組中之二個以上的環所縮合成之縮合多_ 贷％ 中去除（2+n4)個氫原子後所得之（2+n4)價的基&amp;香環 該單環式芳香環及該縮合多環式芳香環所成鮮把$將選自 以上的芳香環以單鍵、伸乙烯基或伸乙炔基連結之二個 香環集合中去除（2+n4)個氫原子後所得之（2+n4)價的=芳 從具有將該縮合多環式芳香環或該芳香環集合的相鄰二2 個芳香環以亞甲基、伸乙基、羰基等2價基進行聯結而成 之橋聯的橋聯多環式芳香環中去除（2+n4)個氫原子後所得 之（2+n4)價的基等。 以單環式芳香環而言，可舉例如以下的環。(2+η4) valence group obtained after one hydrogen atom; after removing (2+n4) hydrogen atoms from condensed poly-% by condensed from two or more rings selected from the group The obtained (2+n4) valence group &amp; scent ring of the monocyclic aromatic ring and the condensed polycyclic aromatic ring are formed into a single bond, a vinyl group or an acetylene group selected from the above aromatic ring The (2+n4) valence = aryl obtained by removing (2+n4) hydrogen atoms from the two aromatic ring assemblies of the base linkage has the adjacent two or two of the condensed polycyclic aromatic ring or the aromatic ring set (2+n4) obtained by removing (2+n4) hydrogen atoms from a bridged polycyclic aromatic ring in which a certain aromatic ring is bonded by a divalent group such as a methylene group, an ethyl group or a carbonyl group. The base of the price, etc. The monocyclic aromatic ring may, for example, be the following ring.

以縮合多環式芳香環而言，可舉例如以下的環。 41 323323 201220574The condensed polycyclic aromatic ring may, for example, be the following ring. 41 323323 201220574

以橋聯多環式芳香環而言，可舉例如以下的環。 42 323323 201220574The bridged polycyclic aromatic ring may, for example, be the following ring. 42 323323 201220574

以前述（2+n4)價的芳香族基而言，從原料單體的合成 谷易度之觀點來看’以從式1至14、26至29、37至39咬 41所示之環中去除（2+π4)個氫原子後所得的基為較佳，以 從式1至6、8、13、26、27、37或41所示之環中去除（2+n4) 個氫原子後所得的基為更佳，從式1、37或41所示之環中 去除（2+n4)個氫原子後所得的基為又更佳。 式（14)中’以R2所示之（l+ml+m2)價有機基而言，可列 舉例如：從曱基、乙基、丙基、異丙基、丁基、異丁基、 第二丁基、第三丁基、戊基、己基、環己基、庚基、辛基、 壬基、癸基、月桂基、此等基中的至少1個氫原子經取代 基取代的基等具有或不具有取代基之碳原子數1至20的烷 基中去除（ml+m2)個氫原子後所得的基；從苯基、1-萘基、 2-萘基、1-蒽基、2-蒽基、9-蒽基、此等基中的至少1個 氫原子經取代基取代的基等具有或不具有取代基之碳原子 43 323323 201220574 數6至30的芳基中去除（ml+m2)個氫原子後所得的基；從 甲氧基、乙氧基、丙氧基、丁氧基、戊基氧基、己基氧基、 壬基氧基、十二基氧基、環丙基氧基、環丁基氧基、環戊 基氧基、環己基氧基、環壬基氧基、環十二基氧基、萡基 氧基、金剛烷基氧基、此等基中的至少1個氫原子經取代 基取代的基等具有或不具有取代基之碳原子數1至50的烷 氧基中去除（ml+m2)個氫原子後所得的基；從具有包含碳原 φ 子的取代基的胺基中去除（ml+m2)個氫原子後所得的基；從 具有包含碳原子的取代基的矽基中去除（ml+m2)個氫原子 後所得的基。此等之中，從原料單體的合成容易度之觀點 來看’較佳為從烧基中去除（ml +m2)個氫原子後所得的基、 從芳基中去除（ml+m2)個氫原子後所得的基、從烷氧基中去 除（ml+m2)個氫原子後所得的基。 以前述取代基而言，可列舉如與前述Q1相關說明中所 例示之取代基相同的取代基。當前述取代基存在複數個 # 時’該等可為相同或相異。 〈式（15)所示之構造單元&gt; 式（15)中，R3係包含式（16)所示之基的1價基，Ar2表 示具有或不具有R3以外之取代基之（2+n5)價芳香族基，的 表示1以上的整數。 式（16)所示之基可直接鍵結於Ar2,亦可經由下述者而 鍵結於Ar2 :亞甲基、伸乙基、伸丙基、伸丁基、伸戊基、 伸己基、伸壬基、伸十二基、伸環丙基、伸環丁基、伸環 戊基、伸環己基、伸環壬基、伸環十二基、伸范基、伸金 323323 44 201220574With the above-mentioned (2+n4)-valent aromatic group, from the viewpoint of the degree of synthesis of the raw material monomer, 'in the ring shown by the formula 41 to 26, 26 to 29, 37 to 39 bit 41 The group obtained by removing (2+π4) hydrogen atoms is preferred, after removing (2+n4) hydrogen atoms from the ring represented by Formula 1 to 6, 8, 13, 26, 27, 37 or 41 The obtained group is more preferably, and the group obtained by removing (2+n4) hydrogen atoms from the ring represented by Formula 1, 37 or 41 is more preferably. In the formula (14), the (1+ml+m2)-valent organic group represented by R2 may, for example, be an alkyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group or an isobutyl group. a dibutyl group, a tert-butyl group, a pentyl group, a hexyl group, a cyclohexyl group, a heptyl group, an octyl group, a decyl group, a fluorenyl group, a lauryl group, a group in which at least one hydrogen atom in the group is substituted with a substituent, or the like Or a group obtained by removing (ml + m 2 ) hydrogen atoms from an alkyl group having 1 to 20 carbon atoms without a substituent; from a phenyl group, a 1-naphthyl group, a 2-naphthyl group, a 1-decyl group, 2 a mercapto group, a 9-fluorenyl group, a group in which at least one hydrogen atom in the group is substituted with a substituent, or the like has a carbon atom of a substituent 43 323323 201220574 Number of 6 to 30 aryl groups are removed (ml+ a group obtained after m2) a hydrogen atom; from a methoxy group, an ethoxy group, a propoxy group, a butoxy group, a pentyloxy group, a hexyloxy group, a decyloxy group, a dodecyloxy group, a cyclopropyl group Oxyl, cyclobutyloxy, cyclopentyloxy, cyclohexyloxy, cyclodecyloxy, cyclododecyloxy, nonyloxy, adamantyloxy, at least One hydrogen atom is substituted with a substituent a group obtained by removing (ml + m 2 ) hydrogen atoms from an alkoxy group having 1 to 50 carbon atoms with or without a substituent; and removing from an amine group having a substituent containing a carbon atom φ (ml a group obtained by +m2) a hydrogen atom; a group obtained by removing (ml + m2) hydrogen atoms from a fluorenyl group having a substituent containing a carbon atom. Among these, from the viewpoint of easiness of synthesis of the raw material monomers, it is preferred to remove (ml + m 2 ) hydrogen atoms from the base, and remove (ml + m 2 ) from the aryl group. A group obtained after a hydrogen atom, and a group obtained by removing (ml + m 2 ) hydrogen atoms from the alkoxy group. The substituents as described above may be the same as those exemplified in the description of Q1 above. When the foregoing substituents have a plurality of #'s, these may be the same or different. <Structural unit represented by the formula (15)> In the formula (15), R3 represents a monovalent group of the group represented by the formula (16), and Ar2 represents a substituent other than R3 (2+n5) The valence aromatic group represents an integer of 1 or more. The group represented by the formula (16) may be directly bonded to Ar2, or may be bonded to Ar2 via the following: methylene group, ethyl group, propyl group, butyl group, pentyl group, hexyl group, Stretching base, stretching 12 base, stretching ring propyl, cyclopentene butyl, cyclopentyl group, cyclohexylene group, ring-forming fluorenyl group, ring-forming 12 base, stretching formula, extension gold 323323 44 201220574

剛烷基、此等基中的至少1個氫原子經取代基取代的基等 具有或不具有取代基之碳原子數1至50的伸烷基；氧基亞 甲基、氧基伸乙基、氧基伸丙基、氧基伸丁基、氧基伸戊 基、氧基伸己基、氧基伸壬基、氧基伸十二基、伸環丙基 氧基、伸環丁基氧基、伸環戊基氧基、伸環己基氧基、伸 環壬基氧基、伸環十二基氧基、伸萡基氧基、伸金剛烷基 氧基、此等基中的至少1個氫原子經取代基取代的基等具 有或不具有取代基之碳原子數1至50的氧基伸烷基；具有 或不具有取代基之亞胺基；具有或不具有取代基之亞矽 基；具有或不具有取代基之伸乙烯基；伸乙炔基；具有戍 不具有取代基之曱烷三基；氧原子、氮原子、硫原子等雜 原子。 、 前述Ar2亦可具有R3以外的取代基。以該取代基而+， 可列舉如與前述Q1相關說明中所例示之取代基相同的取代 基。當存在複數個前述取代基時’該等可為相同或相異 以前述Ar2所具有之R3以外的取代基而言，從原料單 體的合成容易度之觀點來看，較佳為烷基、烷氧基、芳美 方基氣基、敌基或取代羧基。 式（15)中，n5表示1以上的整數，較佳為1 i φ/ 土 4的整 數’更佳為1至3的整數。 之ΛΓ nr不價的方苷族基而士 列舉如（2+Π5)價的芳香族烴基、（2+n5)價的芳香族雜 基’較佳為僅由碳原子所構成或由碳原子與選自氣原子 氮原子及氧原子所成群組中之1個以上之原子所構成 323323 45 201220574 (2+n5)價的芳香族基。以該（2+n5)價的芳香族基而言，可 列舉例如：從苯環、吡啶環、1，2-二畊環、1,3-二畊環、 1，4-二啡環、1，3，5-三哄環、π夫喃環、°比11各環、α比β坐環、 咪唑環、噚唑環、吖二唑環等單環式芳香環中去除（2+η5) 個氫原子後所得之（2+η5)價的基；從由選自該單環式芳香 環所成群組中之二個以上的環所縮合成之縮合多環式芳香 環中去除（2+η5)個氳原子後所得之（2+η5)價的基；從將選 ^ 自該單環式芳香環及該縮合多環式芳香環所成群組中之二 個以上的芳香環以單鍵、伸乙烯基或伸乙炔基連結而成之 芳香環集合中去除（2+η5)個氩原子後所得之（2+η5)價的 基；從具有將該縮合多環式芳香環或該芳香環集合之相鄰 的2個芳香環以亞曱基、伸乙基、羰基等2價基進行聯結 而成之橋聯的橋聯多環式芳香環中去除（2+η5)個氫原子後 所得之（2+η5)價的基等。 以單環式芳香環而言，可舉例如：式（13)所示之構造 • 單元相關說明中所例示之式1至12所示之環。 以縮合多環式芳香環而言，可舉例如：式（13)所示之 構造單元相關說明中所例示之式13至27所示之環。 以芳香環集合而言，可舉例如：式（13)所示之構造單 元相關說明中所例示之式28至36所示之環。 以橋聯多環式芳香環而言，可舉例如：式（13)所示之 構造單元相關說明中所例示之式37至44所示之環。 以前述（2+η5)價的芳香族基而言，從原料單體的合成 容易度之觀點來看，較佳為從式1至14、26至29、37至 46 323323 201220574 39或41所示之環中去除（2+n5)個氫原子後所得的美更 佳為從式1至6、8、13、26、27、37或41所示之澤中去 除（2+n5)個氫原子後所得的基，又更佳為從式1、 ° * 41 所示之環中去除（2+n5)個氫原子後所得的基。 式（16)中，m3及m4係各自獨立地表示1以上的敕數 式（16)中，以R4所示之（l+m3+m4)價的有機基而古，可 列舉例如：從曱基、乙基、丙基、異丙基、丁基、異丁義、 • 第二丁基、第三丁基、戊基、己基、環己基、庚基、辛義 壬基、癸基、月桂基、此等基中的至少1個氫原子經取代 基取代的基等具有或不具有取代基之碳原子數1至k π的烧 基中去除（m3+m4)個氫原子後所得的基；從苯基、 2-萘基、1 -蒽基、2-蒽基、9-蒽基、此等基中的至少1個 氫原子經取代基取代的基等具有或不具有取代基之$ 炭原子 數6至30的芳基中去除（ηι3·Ηη4)個氫原子後所得的基.從 甲氧基、乙氧基、丙氧基、丁氧基、戊基氧基、己基氧基、 Φ 壬基氧基、十二基氧基、環丙基氧基、環丁基氧基、環戊 基氧基、環己基氧基、環壬基氧基、環十二基氧基、宿基 氧基、金剛烷基氧基、此等基中的至少1個氫原子經取代 基取代的基等具有或不具有取代基之碳原子數i至5〇的烧 氧基中去除（m3+m4)個氫原子後所得的基；從具有包含碳原 子的取代基之胺基中去除（m3+m4)個氫原子後所得的基；從 具有包含碳原子的取代基之矽基中去除（m3+m4)個氫原子 後所得的基。從原料單體的合成容易度之觀點來看，較佳 為從烷基中去除（m3+m4)個氫原子後所得的基、從芳基中去 323323 47 201220574 除（m3+m4)個氫原子後所得的基、從烷氧基中去除（m3+m4) 個氫原子後所得的基。 以前述取代基而言，可列舉如與前述Q1相關說明中所 例示之取代基相同的取代基。當存在複數個前述取代基 時’該等可為相同或相異。 〈式（17)所示之構造單元〉 式（17)中’ R5為包含式（is)所示之基的1價基，r6為 φ 包含式所示之基的1價基，Ar3表示具有或不具有R5 及R以外之取代基的（2+n6+n7)價芳香族基，n6及n7係各 自獨立地表示1以上的整數。 式（18)所示之基及式（19)所示之基可直接鍵結於 Ar3 ’亦可經由下述者而鍵結於Ar3 :亞甲基、伸乙基、伸 丙基、伸丁基、伸戊基、伸己基、伸壬基、伸十二基、伸 環丙基、伸環丁基、伸環戊基、伸環己基、伸環壬基、伸 環十二基、伸萡基、伸金剛烷基、此等基中的至少丨個氫 ® 原子經取代基取代的基等具有或不具有取代基之碳原子數 1至50的伸烷基；氧基亞曱基、氧基伸乙基、氧基伸丙基、 氧基伸丁基、氧基伸戊基、氧基伸己基、氧基伸壬基、氧 基伸十二基、伸環丙基氧基、伸環丁基氧基、伸環戊基氧 基、伸環己基氧基、伸環壬基氧基、伸環十二基氧基、伸 萡基氧基、伸金剛烷基氧基、此等基中的至少^個^原子 經取代基取代的基等具有或不具有取代基之峻原子^ 至 的氧基伸烷基；具有或不具有取代基之亞胺基具有或 不具有取代基之亞石夕基；具有或不具有取代^之伸乙婦 323323 48 201220574 基，伸乙炔基；具有或不具有取代基之甲烷三基；氧原子、 氣原子、硫原子等雜原子。 前述Ar3亦可具有R5及R6以外的取代基。以該取代基 而言’可列舉如與前述Q1相關說明中所例示之取代基相同 的取代基。當存在複數個前述取代基時，該等可為相同或 相異。 以前述Ar3所具有之R5及R6以外的取代基而言，從原 φ 料單體的合成容易度之觀點來看，較佳為烷基、烷氧基、 芳基、芳基氧基、敌基或取代叛基。 式（Π)中’ n6表示1以上的整數，較佳為1至4之整 數’更佳為1至3之整數。 式（17)中，n7表示1以上的整數，較佳為1至4之整 數’更佳為1至3之整數。 以式（17)中的Ar3所示之（2+n6+n7)價芳香族基而言， 可列舉如（2+n6+n7)價的芳香族烴基、（2+n6+n7)價的芳香 # 族雜環基，較佳為僅由碳原子所構成或由碳原子與選自氣 原子、氮原子及氧原子所成群組中之1個以上的原子所構 成之（2+n6+n7)價的芳香族基。以該（2+n6+n7)價的芳香族 基而言’可列舉例如：從苯環、吡啶環、1，2-二畊環、] 丄，（5〜 二哄環、1，4-二哄環、呋喃環、吡咯環、吡唑環、咪嗅環、 坐環等單環式芳香環中去除（2+n6+n7)個氫原子後戶斤p 之（2+n6+n7)價的基；從由選自該單環式芳香環所成群級中 之二個以上的環所縮合成的縮合多環式芳香環中去除气 (2+n6+n7)個氫原子後所得之（2+n6+n7)價的基；從將選 323323 49 201220574 該單環式芳香環及雜合多環式料環所成料中之二個 香環以單鍵、伸乙埽基或伸乙快基連結而成之芳 香孩集。巾錯⑵n6+n7)錢料後所得之（2備⑺價 的基；從具有將該縮合多環式芳香環或料香環集合之相 鄰的2個芳香環以亞甲基、伸乙基、等。賈基進行聯 結而成之橋聯的橋聯多環式料環中去除（2偷η?)個氮 原子後所得之（2+n6+n7)價的基等。a cycloalkyl group, a group in which at least one hydrogen atom in the group is substituted with a substituent, or the like has an alkyl group having 1 to 50 carbon atoms which may have a substituent; an oxymethylene group, an oxy group ethyl group, Oxypropyl propyl, oxybutylene, oxypentyl, oxy-hexyl, oxy-extension, oxy-t-decyl, cyclopropyloxy, cyclobutyloxy, cyclopentyloxy a cyclohexyloxy group, a cyclohexyloxy group, a cyclododedodecyloxy group, a fluorenyloxy group, an exoadamantyloxy group, at least one hydrogen atom in the group substituted by a substituent An alkyl group having 1 to 50 carbon atoms with or without a substituent; an imido group having or not having a substituent; an anthracene group having or not having a substituent; having or not having a substituent a vinyl group; an ethynyl group; a decane triyl group having an unsubstituted substituent; a hetero atom such as an oxygen atom, a nitrogen atom or a sulfur atom. Further, the Ar 2 may have a substituent other than R 3 . The substituent of the substituent is the same as the substituent exemplified in the description of Q1 above. When a plurality of the above-mentioned substituents are present, the above-mentioned substituents may be the same or different from the substituents other than R3 of the above Ar2, and from the viewpoint of easiness of synthesis of the raw material monomers, an alkyl group is preferred. Alkoxy, aryl-mercapto group, enradyl or substituted carboxy. In the formula (15), n5 represents an integer of 1 or more, and preferably 1 i φ / the integer ' of the soil 4 is more preferably an integer of 1 to 3. The nr non-valent nucleoside group exemplifies an aromatic hydrocarbon group such as (2+Π5) valence, and the (2+n5) valent aromatic hetero group 'preferably consists only of carbon atoms or by carbon atoms. One or more atoms selected from the group consisting of a gas atom nitrogen atom and an oxygen atom constitute an aromatic group of 323323 45 201220574 (2+n5). Examples of the (2+n5)-valent aromatic group include a benzene ring, a pyridine ring, a 1,2-till ring, a 1,3-tral ring, a 1,4-dimorph ring, 1,3,5-triterpene ring, π-fu-ring ring, ° ratio 11 ring, α ratio β ring, imidazole ring, indazole ring, oxadiazole ring and other monocyclic aromatic rings removed (2+η5 a (2+η5) valence group obtained after hydrogen atoms; removed from a condensed polycyclic aromatic ring condensed from two or more rings selected from the group consisting of the monocyclic aromatic rings ( (2+η5) valence group obtained after 2+η5) 氲 atoms; two or more aromatic rings selected from the group consisting of the monocyclic aromatic ring and the condensed polycyclic aromatic ring a (2+η5) valence group obtained by removing (2+η5) argon atoms from a collection of aromatic rings bonded by a single bond, a vinyl group or an ethynyl group; having the condensed polycyclic aromatic ring Or the two adjacent aromatic rings of the aromatic ring set are bridged by a bivalent group such as an anthracene group, an ethyl group, or a carbonyl group, and the bridged polycyclic aromatic ring is removed (2+η5) A (2+η5) valence group obtained after a hydrogen atom. The monocyclic aromatic ring may, for example, be a structure represented by the formula (13): a ring represented by the formulas 1 to 12 exemplified in the unit related description. The condensed polycyclic aromatic ring may, for example, be a ring represented by Formulas 13 to 27 exemplified in the description of the structural unit represented by the formula (13). The aromatic ring assembly may be, for example, a ring represented by the formulas 28 to 36 exemplified in the description of the structural unit shown by the formula (13). The bridged polycyclic aromatic ring may, for example, be a ring represented by the formulas 37 to 44 exemplified in the description of the structural unit represented by the formula (13). The aromatic group having a (2+η5) valence is preferably from the formula 1 to 14, 26 to 29, 37 to 46 323323 201220574 39 or 41 from the viewpoint of easiness of synthesis of the raw material monomers. It is more preferable to remove (2+n5) hydrogen atoms in the ring shown in the ring to remove (2+n5) hydrogen from the zebra shown in Formula 1 to 6, 8, 13, 26, 27, 37 or 41. The group obtained after the atom is more preferably a group obtained by removing (2+n5) hydrogen atoms from the ring represented by the formula 1, ° * 41. In the formula (16), m3 and m4 each independently represent an organic group having a valence of (1+m3+m4) represented by R4 in the formula (16) of 1 or more, and examples thereof include: Base, ethyl, propyl, isopropyl, butyl, isobutyl, • second butyl, tert-butyl, pentyl, hexyl, cyclohexyl, heptyl, octyl decyl, decyl, lauryl, a group obtained by removing (m3+m4) hydrogen atoms from a group having 1 to k π of a carbon atom having or having a substituent, wherein at least one hydrogen atom in the group is substituted with a substituent; a phenyl group, a 2-naphthyl group, a 1-fluorenyl group, a 2-fluorenyl group, a 9-fluorenyl group, a group in which at least one hydrogen atom in the group is substituted with a substituent, etc., or a carbon atom having or without a substituent a group obtained by removing (ηι3·Ηη4) hydrogen atoms from an aryl group of 6 to 30. From methoxy, ethoxy, propoxy, butoxy, pentyloxy, hexyloxy, Φ 壬Alkoxy, dodecyloxy, cyclopropyloxy, cyclobutyloxy, cyclopentyloxy, cyclohexyloxy, cyclodecyloxy, cyclododecyloxy, benzyloxy , adamantyloxy, such a base a group obtained by removing (m3+m4) hydrogen atoms from an alkoxy group having a carbon number of from 1 to 5 Å having at least one hydrogen atom substituted with a substituent or the like; a group obtained by removing (m3+m4) hydrogen atoms from an amine group of a substituent of a carbon atom; and a group obtained by removing (m3+m4) hydrogen atoms from a mercapto group having a substituent containing a carbon atom. From the viewpoint of easiness of synthesis of the raw material monomers, it is preferred to remove (m3+m4) hydrogen atoms from the alkyl group, and to remove from the aryl group 323323 47 201220574, except for (m3+m4) hydrogen. The group obtained after the atom, and the group obtained by removing (m3+m4) hydrogen atoms from the alkoxy group. The substituents as described above may be the same as those exemplified in the description of Q1 above. When a plurality of the foregoing substituents are present, the ones may be the same or different. <Structural unit represented by the formula (17)> In the formula (17), 'R5 is a monovalent group containing a group represented by the formula (is), r6 is a monovalent group containing a group represented by the formula, and Ar3 is represented by Or a (2+n6+n7) valent aromatic group which does not have a substituent other than R5 and R, and n6 and n7 each independently represent an integer of 1 or more. The group represented by the formula (18) and the group represented by the formula (19) may be directly bonded to Ar3' or may be bonded to Ar3 via the following: methylene group, ethyl group, propyl group, and butyl group. Base, pentyl group, hexanyl group, hydrazine group, stilbene group, stilbene ring, propyl group, butyl group, pentylene group, cyclohexyl group, fluorene ring, fluorene ring, decyl group a base, an adamantyl group, a group substituted with a substituent of at least one hydrogen atom in the group, or the like, having or having a substituent, an alkyl group having 1 to 50 carbon atoms; an oxyalkylene group, an oxygen group Base ethyl, oxypropyl, oxybutyl, oxypentyl, oxy-hexyl, oxy-extension, oxy-t-decyl, cyclopropyloxy, cyclobutyloxy, extended ring a pentyloxy group, a cyclohexyloxy group, a cyclodecanyloxy group, a cyclododedodecyloxy group, a fluorenyloxy group, an exoadamantyloxy group, at least one of the groups a substituent-substituted group or the like having an oxyalkylene group with or without a substituent; an imine group having or not having a substituent; ^ Substituted or without the extension of women 323 323 48 201 220 574 B group, extending ethynyl; hetero atom an oxygen atom, a gas atom, a sulfur atom; or may not have a substituent methane ter group. The Ar3 may have a substituent other than R5 and R6. The substituent may be exemplified by the same substituents as those exemplified in the description of Q1 above. When a plurality of the foregoing substituents are present, the may be the same or different. The substituent other than R5 and R6 which is contained in the above Ar3 is preferably an alkyl group, an alkoxy group, an aryl group, an aryloxy group or an enemy from the viewpoint of easiness of synthesis of the original φ monomer. Base or replace the renegade. In the formula (Π), 'n6 represents an integer of 1 or more, preferably an integer of 1 to 4', more preferably an integer of 1 to 3. In the formula (17), n7 represents an integer of 1 or more, preferably an integer of 1 to 4, more preferably an integer of 1 to 3. The (2+n6+n7)-valent aromatic group represented by Ar3 in the formula (17) may, for example, be a (2+n6+n7)-valent aromatic hydrocarbon group or a (2+n6+n7) valence. The aromatic #heterocyclic group is preferably composed of only a carbon atom or one or more atoms selected from the group consisting of a gas atom, a nitrogen atom and an oxygen atom (2+n6+). N7) Avalent aromatic group. Examples of the (2+n6+n7)-valent aromatic group include, for example, a benzene ring, a pyridine ring, a 1,2-two-till ring, a ruthenium, a (5-dioxin ring, and a 1,4- Removal of (2+n6+n7) hydrogen atoms from a monocyclic aromatic ring such as a dicyclic ring, a furan ring, a pyrrole ring, a pyrazole ring, a azole ring, a ring, etc. (2+n6+n7) a base of a valence; obtained by removing a gas (2+n6+n7) hydrogen atoms from a condensed polycyclic aromatic ring condensed from two or more rings selected from the group consisting of the monocyclic aromatic rings. a base of (2+n6+n7) valence; from the 323323 49 201220574, the two ring-shaped aromatic rings and the hybrid polycyclic ring are formed by a single bond, a thiol group or The fragrant child set up by the extension of B. The towel is wrong (2) n6 + n7) (2) (7) valence base; from the adjacent of the condensed polycyclic aromatic ring or the aroma ring The two aromatic rings are obtained by methylene, ethyl, and the like. The bridged polycyclic ring formed by the combination of Jaki is removed (2 偷??) by a nitrogen atom (2+n6) +n7) The base of the price, etc.

以單環式芳香環而言，可舉例如式（13)所示之構造單 元的相關說明中所例示之式i至5、式7至1〇所示之環。 以縮合多環式芳香環而言，可舉例如式（13)所示之構 造單元的相關說明中所例示之式13至27所示之環。 以芳香環集合而言，可舉例如式（13)所示之構造單元 的相關說明中所例示之式28至36所示之環。 以橋聯多環式芳香環而言，可舉例如式（13)所示之構 造單元的相關說明中所例示之式37至44所示之環。 以前述（2+n6+n7)價的芳香族基而言，從原料單體的合 成容易度之觀點來看’較佳為從式1至5、7至1〇、13、 14、26至29、37至39或41所示之環中去除（2+n6+n7)個 氫原子後所得的基，更佳為從式1、37或41所示之環中去 除（2+n6+n7)個氫原子後所得的基，又更佳為從式i、38或 42所示之環中去除（2+n6+n7)個氫原子後所得的基。 式（18)中’ R7表示單鍵或（i+m5)價的有機基，較佳為 (l+m5)價的有機基。 式（18)中，以R7所示之（i+m5)價的有機基而言，可列 323323 50 201220574 舉例如：從甲基、乙基、丙基、異丙基、孩、 第二丁基、第三丁基、戊基、己基、環已基、歧異丁基、 壬基、癸基、月桂基、此等基中的至少i 土辛基: 基取代的基等具有或不具有取代基之麵子數1、，取代 基中去除^個氫原子後所得的基；從笨基、卜蔡^的^一 4基、1-恩基、2'f基、9_蒽基、此等基中的至少乂 ===有或不具有取代基之碳原2 至30的方基中去除m5個氫原子後所得的基；甲氧美 丙氧基、丁氧基、戊基氧基、己基氧基、壬“ 基減、制基氧基、環丁基氧基、環戊基氧基、 壤己基氧基、環壬基氧基、環十二基氧基、范基氧基、金 剛院基氧基、此等基中的至少1個氫原子經取代基取代的 基等具有或不具有取代基之碳原子數U5〇的燒氧基中去 除㈣個氫原子後所得的基；從具有包含碳料的取代基之 胺基中去除m5個氳原子後所得的基；從具有包含碳原子的 取代基切基中去除m5錢原子後所得的基。從原料單體 的合成容易度之觀點來看，較佳為從絲巾去除m5個氫原 子後所得的基、從芳基中去除的個氫原子後所得的基、從 烧氧基中去除ffl5個氫原子後所得的基。 -以前述取代基而言，可列舉如與前述Ql相關說明中所 例不之取代基相同的取代基。當存在複數個前述取代基 時，該等可為相同或相異。 式（18)中，m5表示1以上的整數，惟R?為單鍵時，m5 表示1。 323323 51 201220574 式（19)中’ R8表示單鍵或（1+m6)價的有機基，較佳為 (l+m6)價的有機基。 式（19)中’以R8所示之（i+m6)價的有機基而言，可列 舉例如：從曱基、乙基、丙基、異丙基、丁基、異丁基、 第二丁基、第三丁基、戊基、己基、環己基、庚基、辛基、 壬基、癸基、月桂基、此等基中的至少1個氫原子經取代 基取代的基等具有或不具有取代基之碳原子數1至2〇的烷 φ 基中去除m6個氫原子後所得的基；從苯基、丨_萘基、2-萘基、1-蒽基、2-蒽基、9-蒽基、此等基中的至少1個氫 原子經取代基取代的基等具有或不具有取代基之碳原子數 6至30的芳基中去除m6個氳原子後所得的基；從曱氧基、 乙氧基、丙氧基、丁氧基、戊基氧基、己基氧基、壬基氧 基、十二基氧基、環丙基氧基、環丁基氧基、環戊基氧基、 環己基氧基、環壬基氧基、環十二基氧基、苗基氧基、金 剛烷基氧基、此等基中的至少1個氫原子經取代基取代的 • 基等具有或不具有取代基之碳原子數1至50的烷氧基中去 除m6個氩原子後所得的基；從具有包含碳原子的取代基之 胺基中去除m6個氫原子後所得的基；從具有包含碳原子的 取代基之矽基中去除m6個氫原子後所得的基。此等之中， 從原料單體的合成容易度之觀點來看，較佳為從烷基中去 除m6個氫原子後所得的基、從芳基中去除m6個氫原子後 所得的基、從烷氧基中去除m6個氫原子後所得的基。 以前述取代基而言，可列舉如與前述Q1相關說明中所 例示之取代基相同的取代基。當存在複數個前述取代基 52 323323 201220574 時，該等可為相同或相異。 式（19)中，m6表示1以上的整數’惟R8為單鍵時，m6 表示1。 &lt;式（20)所示之構造單元〉 式（20)中，R9為包含式（21)所示之基的1價基，R1()為 包含式（22)所示之基的1價基，Ar4表示具有或不具有R9 及R1Q以外之取代基之（2+n8+n9)價的芳香族基，n8及n9 係各自獨立地表示1以上的整數。 式（21)所示之基及式（22)所示之基可直接鍵結於 Ar4，亦可經由下述者而鍵結於Ar4 :亞曱基、伸乙基、伸 丙基、伸丁基、伸戊基、伸己基、伸壬基、伸十二基、伸 環丙基、伸環丁基、伸環戊基、伸環己基、伸環壬基、伸 環十二基、伸萡基、伸金剛烷基、此等基中的至少1個氫 原子經取代基取代的基等具有或不具有取代基之碳原子數 1至50的伸烷基；氧基亞甲基、氧基伸乙基、氧基伸丙基、 氧基伸丁基、氧基伸戊基、氧基伸己基、氧基伸壬基、氧 基伸十二基、伸環丙基氧基、伸環丁基氧基、伸環戊基氧 基、伸環己基氧基、伸環壬基氧基、伸環十二基氧基、伸 宿基氧基、伸金剛烷基氧基、此等基中的至少1個氫原子 、經取代基取代的基等具有或不具有取代基之碳原子數1至 5〇的氧基伸烧基；具有或不具有取代基之亞胺基；具有或 不具有取代基之亞矽基；具有或不具有取代基之伸乙烯 基；伸乙块基；具有或不具有取代基之甲烷三基；氧原子、 氮原子、硫原子等雜原子。 53 323323 201220574 前述Ar4亦可具有R9及R1q以外的取代基。以該取代基 而言，可列舉如與前述Q1相關說明中所例示之取代基相同 的取代基。當存在複數個前述取代基時，該等可為相同或 相異。 ’ 以前述Ar4所具有之R9及Rlfl以外的取代基而言，從原 料單體的合成容易度之觀點來看，較佳為烷基、烷氧基、 芳基、芳基氧基、羧基或取代羧基。 φ 式（20)中，n8表示1以上的整數，較佳為1至4之整 數’更佳為1至3之整數。 式（20)中，n9表示1以上的整數，較佳為1至4之整 數’更佳為1至3之整數。 以式（20)中之Ar4所示之（2+n8+n9)價的芳香族基而 言，可列舉如（2+n8+n9)價的芳香族烴基、（2+n8+n9)價的 芳香族雜環基’較佳為僅由碳原子所構成或由碳原子與選 自虱原子、氮原子及氧原子所成群組中之1個以上的原子 馨所構成之（2+n8+n9)價的芳香族基。以該（2+n8+n9)價的芳 香族基而言，可列舉例如：從苯環、吡啶環、丨，2_二畊環、 1,3-二畊環、1，4-二畊環、呋喃環、吡咯環、吡唑環、咪 嗤環等單環式芳香環中去除（2+n8+n9)個氳原子後所得之 (2+π8+η9)價的基；從由選自該單環式芳香環所成群組中之 二個以上的環所縮合成之縮合多環式芳香環中去除 (2+n8+n9)個氫原子後所得之（2+n8+n9)價的基.從將選自 該單環式芳香環及該縮合多環式芳香環所成^中之二個 以上的芳香環以單鍵、伸乙烯基或伸乙炔基連任而， 323323 54 201220574 香環集合中去除（2+n8+n9)個氫原子後所得之（2+n8+n9)價 的基，從具有將該縮合多環式芳香環或該芳香環集合之相 鄰的2個芳香環以亞曱基、伸乙基、羰基等2價基進行聯 結而成之橋聯的橋聯多環式芳香環中去除（2+η8+η9)個氫 原子後所得之（2+η8+η9)價的基等。 以單環式芳香環而言，可列舉如與式（13)所示之構造 單元的相關說明中所例示之式1至5、式7至1〇所示之環。 以縮合多環式芳香環而言，可列舉如與式（13)所示之 構造單元相關說明中所例示的式13至27所示之環。 以芳香環集合而言，可列舉如與式（13)所示之構造單 元相關說明中所例示之式28至36所示之環。 以橋聯多環式芳香環而言，可列舉例如：式（13)所示 之構造單元相關說明中所例示之式37至44所示之環。 以月ί述（2+η8+η9)價的芳香族基而言，從原料單體的合 成容易度之觀點來看，較佳為從式1至5、7至丨〇、丨3、 14、26至29、37至39或41所示之環中去除（2+η8+η9)個 氫原子後所得的基，更佳為從式i至6、8、14、27、28、 38或42所示之環中去除（加_個氫原子後所得的基， 又更佳為攸式1、37或41所示之環中去除（2+n8+n9)個氫 原子後所得的基。 式（21)中，P表示單鍵或（1+ra7)價的有機基，較佳為 (l+m7)價的有機基。 式（21)_以只所示之（1+m7)價的有機基而言，可列 舉例如：從f基、乙基、内基、異丙基、丁基、異丁基、 323323 55 201220574 第二丁基、第三丁基、戊基、己基、環己基、庚基、辛美 壬基、癸基、月桂基、此等基中的至少i個氫原子經^代 基取代的基等具有或不具有取代基之碳原子數1至2〇的&amp; 基中去除Π17個氫原子後所得的基；從笨基、丨—蔡其兀 萘基、卜蒽基、2-蒽基、9-蒽基、此等基中的至少^個氮 原子經取代基取代的基等具有或不具有取代基之碳原子1 6至30的芳基中去除m7個氫原子後所得的基；從甲氧美、 乙氧基、丙氧基、了氧基、戊基氧基、己基氧基、壬^氧 基、十二基氧基、環丙基氧基、環τ錢基、環戊基氧土基、 環己基氧基、環壬基氧基、環十二基氧基、舰氧基、金 剛絲氧基、此等基㈣至幻㈣原子經取代基取代的 基專具有衫具有取代基之碳好狀氧基中去 ^7個氫好後所得的基；從具有包含麵子的取代基之 = 固氫原子後所得的基;從具有包含碳原子的 基中去除…個氫原子後所得的基。此等之中， …4早體的合絲胃度之觀點來看 除m7個氣屌早德所俨认A , 住馬從坑基中去 所得賴 ㈣基巾错m7個氫原子後 所付^從烧氧基中去除·氫原子後所得的基。 例干之::取代基而言，可列舉如與前述Q1相關說明中所 時:該基。錢數㈣述取代基The monocyclic aromatic ring may, for example, be a ring represented by the formulas i to 5 and 7 to 1 exe exemplified in the description of the structural unit represented by the formula (13). The condensed polycyclic aromatic ring may, for example, be a ring represented by the formulae 13 to 27 exemplified in the description of the structural unit represented by the formula (13). The aromatic ring assembly may be, for example, a ring represented by the formulas 28 to 36 exemplified in the description of the structural unit represented by the formula (13). The bridged polycyclic aromatic ring may, for example, be a ring represented by the formulas 37 to 44 exemplified in the description of the structural unit represented by the formula (13). The aromatic group having the above (2+n6+n7) valence is preferably from the viewpoints of the ease of synthesis of the raw material monomers from the formulas 1 to 5, 7 to 1, 13, 14, and 26. The group obtained by removing (2+n6+n7) hydrogen atoms in the ring represented by 29, 37 to 39 or 41 is more preferably removed from the ring represented by Formula 1, 37 or 41 (2+n6+n7) The group obtained after the hydrogen atom is more preferably a group obtained by removing (2+n6+n7) hydrogen atoms from the ring represented by the formula i, 38 or 42. In the formula (18), 'R7 represents a single bond or an organic group of (i+m5) valence, preferably an organic group of (l+m5) valence. In the formula (18), in the case of the (i+m5)-valent organic group represented by R7, it can be listed as 323323 50 201220574, for example, from methyl, ethyl, propyl, isopropyl, child, second. Base, tert-butyl, pentyl, hexyl, cyclohexyl, isopropylidene, decyl, decyl, lauryl, at least i octyl in these groups: a group substituted with or without a substituent The number of the surface of the base 1, the base obtained by removing the hydrogen atom from the substituent; from the base of the stupid group, the ^ 4 base of the Bu Cai ^, the 1-enyl group, the 2'f group, the 9-fluorenyl group, etc. At least 乂=== a group obtained by removing m5 hydrogen atoms in a group of 2 to 30 carbon atoms with or without a substituent; methoxymethoxypropoxy, butoxy, pentyloxy, Hexyloxy, hydrazine "decreasing, benzyloxy, cyclobutyloxy, cyclopentyloxy, hexyloxy, cyclodecyloxy, cyclododecyloxy, vanyloxy, diamond a group obtained by removing (four) hydrogen atoms from an alkoxy group having a carbon atom number of U5? having or having a substituent, such as a group having at least one hydrogen atom in the group substituted with a substituent; With carbon containing material a group obtained by removing m5 fluorene atoms in an amine group of a substituent; a group obtained by removing m5 money atoms from a substituent group having a carbon atom, from the viewpoint of easiness of synthesis of a raw material monomer, Preferably, the group obtained by removing m5 hydrogen atoms from the silk scarf, the group obtained by removing one hydrogen atom from the aryl group, and the group obtained by removing ffl 5 hydrogen atoms from the alkoxy group. In the formula (18), m5 represents 1 or more. An integer such that when R? is a single bond, m5 represents 1. 323323 51 201220574 In the formula (19), R8 represents a single bond or an organic group of (1+m6) valence, preferably (l+m6) valence organic In the formula (19), the organic group of the (i+m6) valence represented by R8 may, for example, be a fluorenyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group or an isobutyl group. Second butyl, tert-butyl, pentyl, hexyl, cyclohexyl, heptyl, octyl, decyl, decyl, lauryl, to these a group obtained by removing m6 hydrogen atoms from an alkyl group having 1 to 2 ring carbon atoms having or having a substituent, such as a group substituted with a substituent of a hydrogen atom; a phenyl group, a fluorene-naphthyl group, 2 a naphthyl group, a 1-fluorenyl group, a 2-fluorenyl group, a 9-fluorenyl group, a group in which at least one hydrogen atom in the group is substituted with a substituent, etc., having or having a substituent, having 6 to 30 carbon atoms a group obtained by removing m6 germanium atoms in an aryl group; from an anthraceneoxy group, an ethoxy group, a propoxy group, a butoxy group, a pentyloxy group, a hexyloxy group, a decyloxy group, a dodecyloxy group, Cyclopropyloxy, cyclobutyloxy, cyclopentyloxy, cyclohexyloxy, cyclodecyloxy, cyclododecyloxy, benzyloxy, adamantyloxy, such groups a group obtained by removing m6 argon atoms from an alkoxy group having 1 to 50 carbon atoms having or having no substituent with at least one hydrogen atom substituted with a substituent; and having a substitution containing a carbon atom a group obtained by removing m6 hydrogen atoms in the amine group; and a group obtained by removing m6 hydrogen atoms from a mercapto group having a substituent containing a carbon atom. Among these, from the viewpoint of easiness of synthesis of a raw material monomer, a group obtained by removing m6 hydrogen atoms from an alkyl group, and a group obtained by removing m6 hydrogen atoms from an aryl group are preferred. A group obtained by removing m6 hydrogen atoms from an alkoxy group. The substituents as described above may be the same as those exemplified in the description of Q1 above. When a plurality of the aforementioned substituents 52 323323 201220574 are present, the may be the same or different. In the formula (19), m6 represents an integer of 1 or more. When R8 is a single bond, m6 represents 1. &lt;Structural unit represented by the formula (20)> In the formula (20), R9 is a monovalent group containing a group represented by the formula (21), and R1() is a monovalent group containing a group represented by the formula (22) The group, Ar4 represents an (2+n8+n9)-valent aromatic group having or not having a substituent other than R9 and R1Q, and n8 and n9 each independently represent an integer of 1 or more. The group represented by the formula (21) and the group represented by the formula (22) may be directly bonded to Ar4, or may be bonded to Ar4 via the following: anthracene group, ethyl group, propyl group, and butyl group. Base, pentyl group, hexanyl group, hydrazine group, stilbene group, stilbene ring, propyl group, butyl group, pentylene group, cyclohexyl group, fluorene ring, fluorene ring, decyl group a base, an adamantyl group, a group substituted with a substituent of at least one hydrogen atom in the group, or the like having an alkyl group having 1 to 50 carbon atoms with or without a substituent; an oxymethylene group; Ethyl, oxypropyl, oxybutyl, oxypentyl, oxy-hexyl, oxy-extension, oxy-t-decyl, cyclopropyloxy, cyclobutyloxy, cyclopentyl a oxy group, a cyclohexyloxy group, a cyclodecyloxy group, a cyclodecadecyloxy group, a pendant oxy group, an adenantyloxy group, at least one hydrogen atom in the group, An alkyloxy group having 1 to 5 carbon atoms with or without a substituent, such as a substituent group substituted; an imine group having or not having a substituent; an anthracene group having or not having a substituent; A vinyl group having or without a substituent; an exoethyl group; a methane triyl group having or not having a substituent; a hetero atom such as an oxygen atom, a nitrogen atom or a sulfur atom. 53 323323 201220574 The above Ar4 may have a substituent other than R9 and R1q. The substituent may be the same as the substituent exemplified in the description of Q1 above. When a plurality of the foregoing substituents are present, the may be the same or different. The substituent other than R9 and Rlf1 of the above Ar4 is preferably an alkyl group, an alkoxy group, an aryl group, an aryloxy group or a carboxyl group from the viewpoint of easiness of synthesis of a raw material monomer. Substituting a carboxyl group. In the formula (20), n8 represents an integer of 1 or more, preferably an integer of 1 to 4, more preferably an integer of 1 to 3. In the formula (20), n9 represents an integer of 1 or more, preferably an integer of 1 to 4, more preferably an integer of 1 to 3. The (2+n8+n9)-valent aromatic group represented by Ar4 in the formula (20) may, for example, be a (2+n8+n9)-valent aromatic hydrocarbon group or a (2+n8+n9) valence. The aromatic heterocyclic group 'preferably consists of only carbon atoms or one or more atoms selected from the group consisting of a halogen atom, a nitrogen atom and an oxygen atom (2+n8). +n9) The aromatic group of the valence. Examples of the (2+n8+n9)-valent aromatic group include, for example, a benzene ring, a pyridine ring, an anthracene, a 2-two-till ring, a 1,3-two-till ring, and a 1,4-two-ploughing. a group of (2+π8+η9) valences obtained by removing (2+n8+n9) germanium atoms in a monocyclic aromatic ring such as a ring, a furan ring, a pyrrole ring, a pyrazole ring or a hydrazine ring; (2+n8+n9) obtained by removing (2+n8+n9) hydrogen atoms from the condensed polycyclic aromatic ring condensed by two or more rings in the group of the monocyclic aromatic ring a valence group. The two or more aromatic rings selected from the monocyclic aromatic ring and the condensed polycyclic aromatic ring are re-elected by a single bond, a vinyl group or an ethynyl group, 323323 54 201220574 a (2+n8+n9) valence group obtained by removing (2+n8+n9) hydrogen atoms in the aromatic ring set, having two adjacent condensed polycyclic aromatic rings or the aromatic ring set The 2+η8 is obtained by removing (2+η8+η9) hydrogen atoms from the bridged polycyclic aromatic ring in which the aromatic ring is bonded by a divalent group such as an anthracene group, an ethyl group or a carbonyl group. +η9) The base of the price, etc. The monocyclic aromatic ring may, for example, be a ring as shown in the formulas 1 to 5 and 7 to 1 exe exemplified in the description of the structural unit represented by the formula (13). The condensed polycyclic aromatic ring may, for example, be a ring represented by the formulae 13 to 27 exemplified in the description relating to the structural unit represented by the formula (13). The aromatic ring assembly may be a ring represented by the formulas 28 to 36 exemplified in the description relating to the structural unit represented by the formula (13). The bridged polycyclic aromatic ring may, for example, be a ring represented by the formulas 37 to 44 exemplified in the description of the structural unit represented by the formula (13). The aromatic group having a valence of (2+η8+η9) is preferably from the formulae 1 to 5, 7 to 丨〇, 丨 3, 14 from the viewpoint of easiness of synthesis of the raw material monomers. a group obtained by removing (2+η8+η9) hydrogen atoms in the ring represented by 26 to 29, 37 to 39 or 41, more preferably from the formula i to 6, 8, 14, 27, 28, 38 or The ring represented by 42 is removed (the group obtained by adding - a hydrogen atom, and more preferably the group obtained by removing (2+n8 + n9) hydrogen atoms in the ring represented by Formula 1, 37 or 41. In the formula (21), P represents a single bond or an organic group of (1+ra7) valence, preferably an organic group of (l+m7) valence. Formula (21) _ is only shown (1+m7) Examples of the organic group include, for example, an alkyl group, an ethyl group, an internal group, an isopropyl group, a butyl group, an isobutyl group, a 323323 55 201220574 second butyl group, a third butyl group, a pentyl group, a hexyl group, and a ring. a hexyl group, a heptyl group, a octyl group, a decyl group, a lauryl group, a group having at least one hydrogen atom in the group substituted with a substituent, and the like, having or having a substituent, having a carbon atom number of 1 to 2 Å a group obtained by removing 17 hydrogen atoms; from a stupid base, a ruthenium-caiqi naphthyl group, Dialkyl, 2-indenyl, 9-fluorenyl, at least one of the nitrogen atoms in the group substituted by a substituent, etc., with or without a substituent, a carbon atom, 16 to 30, of an aryl group, wherein m7 hydrogens are removed The group obtained after the atom; from methoxy, ethoxy, propoxy, oxy, pentyloxy, hexyloxy, oximeoxy, dodecyloxy, cyclopropyloxy, ring τ 基 、, cyclopentyl oxalate, cyclohexyloxy, cyclodecyloxy, cyclododecyloxy, alkoxy, adamantyl, such radical (tetra) to imaginary (tetra) atom substituted by substituent a group having a base obtained by a carbon-like oxy group having a substituent having a substituent; a group obtained from a solid hydrogen atom having a substituent containing a face; and having a group containing a carbon atom; The base obtained after removing a hydrogen atom. Among these, the viewpoint of the 4th early body of the silk is in addition to the m7 gas, the early Germans recognize A, and the horses are taken from the pit base. (4) The base obtained by removing the hydrogen atom from the alkoxy group after the m7 hydrogen atom is wrong. Example: The substituent: the substituent is as described in the above-mentioned Q1. When: (iv) the group of money said substituent group.

表示ti2U中’π表示1以上的整數，惟RU為單鍵時，W 式（22)中’ γ表示單鍵或（l+m8)價的有機基，較佳為 323323 56 201220574 (l+m8)價的有機基。It is indicated that π in ti2U represents an integer of 1 or more, and when RU is a single bond, W in the formula (22) represents a single bond or an organic group of (l+m8) valence, preferably 323323 56 201220574 (l+m8 ) the organic base of the price.

式（22)中，以Ri2所示之（1+m8)價的有機基而々 舉例如：從曱基、乙基、丙基、異丙基、 °可歹J 第二丁基、第三丁基、戊基、己基、環己基、η、、 壬基、癸基、月桂基、此等基中的至少丨個氫原子細二 基取代的基等具有或不具有取代基之碳原子數4^ 基中去除m8個氫原子後所得的基；從笨基、丨笼的烷 萘基、1-蒽基、2-蒽基、9-蒽基、此等基中的至t 原子經取代絲代祕料有或*財取錄^炭原^ 6至30的芳基中去除㈣個氫原子後所得的基；從甲氣某 乙氧基、丙氧基、丁氧基、戊基氧基、己基氧基、壬^氧 基、十二基氧基、環丙基氧基、環丁基氧基、環戊基氧土基、 環己基氧基、駐絲基、環十二基氧基、 剛燒基氧基、此等基巾社幻個氫原子經取代基ς代的 基等具有或;f具有取代基之碳料數丨至5Q的燒氧基中去 ㈣8個氫原子後所得的基；從具有包含碳原子的取代基之 胺基中去除πι8個氫原子後所得的基；從具有包含碳原子的 取代基之矽基中去除m8個氫原子後所得的基。此等之中， 從原料單體的合成容易度之觀點來看，較佳為從烷基中去 除m8個氫原子後所得的基、從芳基中去除…個氫原子後 所得的基、從烷氧基中去除蛄個氫原子後所得的基。 以刖述取代基而言，可列舉如與前述Q!相關說明中所 例示之取代基相同的取代基。當存在複數個前述取代基 時，該等可為相同或相異。 323323 57 201220574 式（22)中’m8表示1以上的整數 表示1。 12 為單鏈 時 m8 〈式（13)所示之構造單元之例〉 從所得之離子性聚合 下述之式（23)所示之 更佳為式（24)所示之 以式（13)所示之構造單元而言， 物的電子傳輸性之觀點來看，較佳為 構造單元、式（24)所示之構造單元， 構造單元。In the formula (22), an organic group having a (1+m8) valence represented by Ri2 is used, for example, from a mercapto group, an ethyl group, a propyl group, an isopropyl group, a decyl group, a second butyl group, and a third group. a butyl group, a pentyl group, a hexyl group, a cyclohexyl group, a η, a fluorenyl group, a fluorenyl group, a lauryl group, a group substituted with at least one hydrogen atom in the group, or the like, or a carbon atom having or without a substituent 4) a group obtained by removing m8 hydrogen atoms from a base; from a strepto group, an alkylnaphthyl group, a 1-fluorenyl group, a 2-fluorenyl group, a 9-fluorenyl group, and a t atom in the group The silk-derived secret material has a base obtained by removing (four) hydrogen atoms from the aryl group of 6 to 30; from the gas, an ethoxy group, a propoxy group, a butoxy group, a pentyloxy group. Base, hexyloxy, oximeoxy, dodecyloxy, cyclopropyloxy, cyclobutyloxy, cyclopentyloxyl, cyclohexyloxy, stiletto, cyclododecaoxy a base, a succinyloxy group, a base such as a hydrogen atom of a substituent having a substituent, or the like; a carbon having a substituent having a number of carbon atoms of 丨 to 5Q of an alkoxy group (4) after 8 hydrogen atoms The resulting group; from having a substitution containing a carbon atom The amine group obtained after removing one hydrogen atom πι8; m8 obtained after removing one hydrogen atom from a group having the silicon based substituent group containing carbon atoms. Among these, from the viewpoint of easiness of synthesis of a raw material monomer, a group obtained by removing m8 hydrogen atoms from an alkyl group, and a group obtained by removing one hydrogen atom from an aryl group are preferred. A group obtained by removing one hydrogen atom from an alkoxy group. The substituents as described above may be the same as those exemplified in the above description of Q!. When a plurality of the foregoing substituents are present, the may be the same or different. 323323 57 201220574 In the formula (22), 'm8' indicates an integer of 1 or more and 1 indicates. 12 is a single-chain m8 <Example of a structural unit represented by the formula (13)> From the obtained ionic polymerization, the formula (23) shown below is more preferably the formula (24) represented by the formula (13) The structural unit shown is preferably a structural unit, a structural unit represented by the formula (24), and a structural unit from the viewpoint of electron transportability of the object.

(23) [式（23)中，R13表示（l+m9+ml0)價的有機基，γ表示1價 的有機基，Q1、Q3、Υ1、Μ1、Ζ1、Υ3、η卜以、bl及η3表示 與前述者相同之意義，m9及mlO各自獨立地表示1以上的 整數，當 Q1、Q3、Y1、Μ1、Z1、Y3、ni、ai、bl 及 n3 各為複(23) [In the formula (23), R13 represents an organic group of (l+m9+ml0) valence, γ represents a monovalent organic group, and Q1, Q3, Υ1, Μ1, Ζ1, Υ3, ηb, bl and Η3 represents the same meaning as the above, and m9 and mlO each independently represent an integer of 1 or more, and when Q1, Q3, Y1, Μ1, Z1, Y3, ni, ai, bl, and n3 are each

數個時，可為相同或相異。] 式（23)中，以R13所示之（i+m9+mi〇)價的有機基而言， 可列舉例如：從甲基、乙基、丙基、異丙基、丁基、異丁 基、第二丁基、第三丁基、戊基、己基、環己基、庚基、 辛基、壬基、癸基、月桂基、此等基中的至少1個氫原子 經取代基取代的基等具有或不具有取代基之碳原子數1至 20的烷基中去除（m9+ml0)個氫原子後所得的基；從苯基、 1-萘基、2-萘基、1-蒽基、2-蒽基、9-蒽基、此等基中的 至少1個氫原子經取代基取代的基等具有或不具有取代基 58 323323 201220574 之碳原子數6至30的芳基中去除（m9+ml0)個氫原子後所得 的基；從曱氧基、乙氧基、丙氧基、丁氧基、戊基氧基、 己基氧基、壬基氧基、十二基氧基、環丙基氧基、環丁基 氧基、環戊基氧基、環己基氧基、環壬基氧基、環十二基 氧基、范基氧基、金剛烧基氧基、此等基中的至少1個氫 原子經取代基取代的基等具有或不具有取代基之碳原子數 1至50的烧氧基中去除（m9+ml0)個氫原子後所得的基；從 φ 具有包含碳原子的取代基之胺基中去除（m9+ml0)個氫原子 後所得的基；從具有包含碳原子的取代基之矽基中去除 (m9+ml0)個氫原子後所得的基。從原料單體的合成容易度 之觀點來看，較佳為從烧基中去除（m9+mi〇)個氫原子後所 得的基、從芳基中去除（m9+ml0)個氫原子後所得的基、從 烧氧基中去除（m9+ml0)個氫原子後所得的基。 式（23)中，以R14所示之1價有機基而言，可列舉例如： 曱基、乙基、丙基、異丙基、丁基、異丁基、第二丁基、 • 第三丁基、戍基、己基、環己基、庚基、辛基、壬基、癸 基、月桂基、此等基中的至少1個氫原子經取代基取代的 基等具有或不具有取代基之碳原子數1至2〇的炫基；笨 基、1-萘基、2-萘基、1-蒽基、2-蒽基、9_蒽基、此等基 中的至少1個氫原子經取代基取代的基等具有或不具有取 代基之碳原子數6至30的芳基；甲氧基、乙氧基、丙氧基、 丁氧基、戊基氧基、己基氧基、壬基氧基、十二基氧基、 環丙基氧基、環丁基氧基、環戊基氧基、環己基氧基、環 壬基氧基、環十二基氧基、萡基氧基、金剛烷基氧基、此 323323 59 201220574 等基中的至少1個氳原子經取代基取代的基等具有或不具 有取代基之碳原子數1至50的烷氧基；具有包含碳原子的 取代基之胺基；具有包含碳原子的取代基之矽基。從原料 單體的合成容易度之觀點來看，較佳為烷基、芳基、烷氧 基。 以式（23)所示之構造單元而言，可列舉如以下之構造When it is several, it can be the same or different. In the formula (23), the organic group of the (i+m9+mi〇) valence represented by R13 may, for example, be a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group or an isobutyl group. a base, a second butyl group, a tert-butyl group, a pentyl group, a hexyl group, a cyclohexyl group, a heptyl group, an octyl group, a decyl group, a fluorenyl group, a lauryl group, and at least one hydrogen atom in the group is substituted with a substituent a group obtained by removing (m9+ml0) hydrogen atoms from an alkyl group having 1 to 20 carbon atoms with or without a substituent; from phenyl, 1-naphthyl, 2-naphthyl, 1-anthracene a group, a 2-indenyl group, a 9-fluorenyl group, a group in which at least one hydrogen atom in the group is substituted with a substituent, etc., with or without a substituent 58 323323 201220574, wherein an aryl group having 6 to 30 carbon atoms is removed a group obtained by (m9+ml0) hydrogen atoms; from an oxiranyloxy group, an ethoxy group, a propoxy group, a butoxy group, a pentyloxy group, a hexyloxy group, a decyloxy group, a dodecyloxy group, Cyclopropyloxy, cyclobutyloxy, cyclopentyloxy, cyclohexyloxy, cyclodecyloxy, cyclododecyloxy, aryloxy, adamantyloxy, such groups At least one hydrogen atom in the substituent a group obtained by removing (m9+ml0) hydrogen atoms from an alkoxy group having 1 to 50 carbon atoms having or having a substituent, such as a substituted group; and removing from an amine group having a substituent having a carbon atom; a group obtained by (m9+ml0) hydrogen atoms; a group obtained by removing (m9+ml0) hydrogen atoms from a mercapto group having a substituent containing a carbon atom. From the viewpoint of easiness of synthesis of a raw material monomer, it is preferred to obtain a group obtained by removing (m9+mi〇) hydrogen atoms from a burnt group, and removing (m9+ml0) hydrogen atoms from the aryl group. The group obtained by removing (m9+ml0) hydrogen atoms from the alkoxy group. In the formula (23), examples of the monovalent organic group represented by R14 include a mercapto group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a second butyl group, and a third group. a butyl group, a decyl group, a hexyl group, a cyclohexyl group, a heptyl group, an octyl group, a decyl group, a decyl group, a lauryl group, a group in which at least one hydrogen atom in the group is substituted with a substituent, or the like, with or without a substituent a thiol group having 1 to 2 carbon atoms; a stupid group, a 1-naphthyl group, a 2-naphthyl group, a 1-fluorenyl group, a 2-fluorenyl group, a 9-fluorenyl group, and at least one hydrogen atom in the group a aryl group having 6 to 30 carbon atoms with or without a substituent; a methoxy group, an ethoxy group, a propoxy group, a butoxy group, a pentyloxy group, a hexyloxy group, a decyl group Oxyl, dodecyloxy, cyclopropyloxy, cyclobutyloxy, cyclopentyloxy, cyclohexyloxy, cyclodecyloxy, cyclododecyloxy, decyloxy, An adamantyl group, an alkoxy group having 1 to 50 carbon atoms having or having a substituent, such as a group substituted with a substituent of at least one halogen atom in the group of 323323 59 201220574; having a substitution containing a carbon atom; base Amine; having the silicon based substituent group containing a carbon atom. From the viewpoint of easiness of synthesis of the raw material monomers, an alkyl group, an aryl group or an alkoxy group is preferred. The structural unit represented by the formula (23) can be exemplified by the following construction

XtXS — 早兀。XtXS — early.

60 323323 20122057460 323323 201220574

M = Li, Na, K, Cs, N(CH3)4 Μ = Li, Na, K, Cs, N(CH3)4M = Li, Na, K, Cs, N(CH3)4 Μ = Li, Na, K, Cs, N(CH3)4

Hi7〇8VVCO〇-M+ N^0(CH2CH2O^CH3 H2iCi〇rX^CO〇-M+ 、0(CH2CH2〇)sCH3 M = Li, Na, K, Cs，N(CH3)4 M = Li，Na, K, Cs, N(CH3)4Hi7〇8VVCO〇-M+ N^0(CH2CH2O^CH3 H2iCi〇rX^CO〇-M+, 0(CH2CH2〇)sCH3 M = Li, Na, K, Cs,N(CH3)4 M = Li,Na, K , Cs, N(CH3)4

H9C4〇/Vx^CO〇-M+ X^0(CH2CH20)2CH3 M = Li, Na，K，Cs, N(CH3)4H9C4〇/Vx^CO〇-M+ X^0(CH2CH20)2CH3 M = Li, Na,K,Cs, N(CH3)4

H2i〇io〇/Vvc〇〇-M+ ^OiCHaC^O^CHs M = U, Na, K, Cs, N(CH3)4 M = Li，Na, K, Cs, N(CH3)4 61 323323 201220574H2i〇io〇/Vvc〇〇-M+ ^OiCHaC^O^CHs M = U, Na, K, Cs, N(CH3)4 M = Li,Na, K, Cs, N(CH3)4 61 323323 201220574

[式（24)中，R13表示（l+mll+ml2)價的有機基，Q1、Q3、Y1、 Μ1、Ζ1、Υ3、nl、al、bl及η3表示與前述者相同之意義，[In the formula (24), R13 represents an organic group of (l+mll+ml2) valence, and Q1, Q3, Y1, Μ1, Ζ1, Υ3, nl, al, bl, and η3 have the same meanings as the foregoing.

mil及ml2各自獨立地表示1以上的整數，當R13、mil、ml2、 Q1、Q3、Y1、Μ1、Ζ1、Y3、nl、al、bl 及 n3 各為複數個時， 可為相同或相異。] 式（24)中，以R13所示之價的有機基而 言’可列舉例如：從曱基、乙基、丙基、異丙基、丁基、 異丁基、第二丁基、第三丁基、戊基、己基、環己基、庚 基、辛基、壬基、癸基、月桂基、此等基中的至少1個氫 原子經取代基取代的基等具有或不具有取代基之碳原子數 1至2〇的烷基中去除（mll+ml2)個氫原子後所得的基；從 苯基、卜萘基、2-萘基、1-蒽基、2-蒽基、9-蒽基、此等 基中的至少1個氫原子經取代基取代的基等具有或不具有 取代基之碳原子數6至30的芳基中去除（mll+ml2)個氫原 子後所传的基；從曱氧基、乙氧基、丙氧基、丁氧基、戊 f氧基、己基氧基、壬基氧基、十二基氧基、環丙基氧基、 環丁基氧基、環戊基氧基、環己基氧基、環壬基氧基、環 十一，氧基、萡基氧基、金剛烷基氧基、此等基中的至少Mil and ml2 each independently represent an integer of 1 or more, and may be the same or different when R13, mil, ml2, Q1, Q3, Y1, Μ1, Ζ1, Y3, nl, al, bl, and n3 are each plural. . In the formula (24), the organic group represented by R13 may be, for example, a fluorenyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a second butyl group, or a a tributyl group, a pentyl group, a hexyl group, a cyclohexyl group, a heptyl group, an octyl group, a decyl group, a decyl group, a lauryl group, a group in which at least one hydrogen atom in the group is substituted with a substituent, etc., with or without a substituent a group obtained by removing (mll+ml2) hydrogen atoms from an alkyl group having 1 to 2 carbon atoms; from phenyl, naphthyl, 2-naphthyl, 1-indenyl, 2-indenyl, 9-fluorene a group derived by removing (mll+ml2) hydrogen atoms from an aryl group having 6 to 30 carbon atoms with or without a substituent, such as a group substituted with a substituent in at least one hydrogen atom in the group From methoxy, ethoxy, propoxy, butoxy, pentyloxy, hexyloxy, decyloxy, dodecyloxy, cyclopropyloxy, cyclobutyloxy, a cyclopentyloxy group, a cyclohexyloxy group, a cyclodecyloxy group, a cyclodecyloxy group, a decyloxy group, an adamantyloxy group, at least

飞原子經取代基取代的基等具有或不具有取代基之碳 廣、+ ¾ 1 E 至50的烧氧基中去除（mii+mi2)個氫原子後所得 62 323323 201220574 的基；從具有包含碳原子的取代基之胺基中去除（mll+ml2) 個氫原子後所得的基；從具有包含碳原子的取代基之矽基 中去除（mll+ml2)個氫原子後所得的基。此等之中，從原料 單體的合成容易度之觀點來看，較佳為從烷基中去除 (nill+ml2)個氫原子後所得的基、從芳基中去除（mll+ml2) 個氫原子後所得的基、從烷氧基中去除（ml 1+ml2)個氫原子 後所得的基。 以式（24)所示之構造單元而言，可列舉如以下之構造 單元。a radical of a radical atom substituted with a substituent, such as a carbon having a substituent or a carbon atom, or a radical of +3⁄4 1 E to 50, which is obtained by removing (mii+mi2) a hydrogen atom, and obtaining a radical of 62 323323 201220574; a group obtained by removing (m ll + ml 2 ) hydrogen atoms from an amine group of a substituent of a carbon atom; and a group obtained by removing (m ll + ml 2 ) hydrogen atoms from a fluorenyl group having a substituent containing a carbon atom. Among these, from the viewpoint of easiness of synthesis of the raw material monomers, it is preferred to remove (nill+ml2) hydrogen atoms from the alkyl group and remove (mll+ml2) from the aryl group. A group obtained by a hydrogen atom, and a group obtained by removing (ml 1 + ml 2) hydrogen atoms from the alkoxy group. The structural unit represented by the formula (24) may be exemplified by the following structural unit.

63 323323 20122057463 323323 201220574

+MOOC^^ y^VCO〇-M+ H3C(OH2CH2C)2C)^ iD(CH2CH2〇)2CH3 M = Li,Na,K, Cs, N(CH3)4 &quot;MOOCV^ irVCOO'M+ H3C(OH2CH2C)3a ' t)(CH2CH2C〇3CH3 M = Li,Na,K, Cs, N(CH3)4+MOOC^^ y^VCO〇-M+ H3C(OH2CH2C)2C)^ iD(CH2CH2〇)2CH3 M = Li,Na,K, Cs, N(CH3)4 &quot;MOOCV^ irVCOO'M+ H3C(OH2CH2C)3a 't)(CH2CH2C〇3CH3 M = Li,Na,K, Cs, N(CH3)4

&quot;MOOCV^i )^ν〇〇0'Μ+ H3q〇H2cH2c)4a ' o(ch2ch2o)4ch3 Μ = ϋ,Ν3,Κ, Cs, N(CH3)4&quot;MOOCV^i )^ν〇〇0'Μ+ H3q〇H2cH2c)4a ' o(ch2ch2o)4ch3 Μ =ϋ,Ν3,Κ, Cs, N(CH3)4

+MOOCV^ ITVCOO-M+ H3C(OH2CH2C)6cr ' 0(CH2CH20)6CH3 M = Li, Na, K, Cs, N(CH3)4 ♦MOOCV^ &gt;**VCOO，M+ Η3^ΟΗ2ΟΗ2〇7σ — CKCH2CH20)7CH3 M = Li, Na,K, Cs(N(CH3)4+MOOCV^ ITVCOO-M+ H3C(OH2CH2C)6cr ' 0(CH2CH20)6CH3 M = Li, Na, K, Cs, N(CH3)4 ♦MOOCV^ &gt;**VCOO,M+ Η3^ΟΗ2ΟΗ2〇7σ — CKCH2CH20) 7CH3 M = Li, Na, K, Cs(N(CH3)4

H3C(OH2CH2C)s〇&gt;^/V&lt;〇(CH2CH2〇)2CH3 +MOOC’ 〜l〇0_M+ M = LitNa,K, Cs, N(CH3)4H3C(OH2CH2C)s〇&gt;^/V&lt;〇(CH2CH2〇)2CH3 +MOOC' ~l〇0_M+ M = LitNa,K, Cs, N(CH3)4

+MOOC ' COO'M^+MOOC ' COO'M^

H3C(OH2CH2C)4〇^/V&lt;0(CH2c_4CH3 M = LifNa,K, Cs, N(CH3)4 H3C(OH2CH2C]feO&gt;s/V&lt;0(CH2CH2〇)5CH3 +MOOC — “COO.M+ M = Li，Na,K，Cs,N(CH3)4H3C(OH2CH2C)4〇^/V&lt;0(CH2c_4CH3 M = LifNa, K, Cs, N(CH3)4 H3C(OH2CH2C]feO&gt;s/V&lt;0(CH2CH2〇)5CH3 +MOOC — "COO.M+ M = Li,Na,K,Cs,N(CH3)4

+MOOC ^ 'COCTM， H3C(OH2CH2C)60&gt;YWO(CH2CH2〇)6CH3 τΜΌ〇σ ^COOM* M = Li,Na，K, Cs，N(CH3)4 H3C(OH2CH2C)7〇^/V&lt;〇(ch2ch2〇)7CH3 M = Li，Na,K, Cs,N(CH3)4 64 323323 201220574+MOOC ^ 'COCTM, H3C(OH2CH2C)60&gt;YWO(CH2CH2〇)6CH3 τΜΌ〇σ ^COOM* M = Li,Na,K, Cs,N(CH3)4 H3C(OH2CH2C)7〇^/V&lt;〇 (ch2ch2〇)7CH3 M = Li,Na,K, Cs,N(CH3)4 64 323323 201220574

+MO3Sf^ r^scVM+ H3C(OH2CH2C)2C3^ iD(CH2CH20)2CH3 M = Li，Na,K，Cs,N(CH3)4+MO3Sf^ r^scVM+ H3C(OH2CH2C)2C3^ iD(CH2CH20)2CH3 M = Li,Na,K,Cs,N(CH3)4

+MO3S^^ γγ^〇3·Μ+ H3C(OH2CH2C)4C}^ &lt;D(CH2CH20)4CH3 M = Li,Na,K，Cs，N(CH3)4 +MO3s^fc( )tvso3*m+ H3C{OH2CH2C)3a ' o(ch2ch2o)3ch3 M = Li, Na, K, Cs, N(CH3)4 &quot;MO3SV^ &gt;^VSO^M+ H3C(OH2CH2C)5Cr 1D(CH2CH20)5CH3 M = Li，Na，K, Cs,N(CH3)4+MO3S^^ γγ^〇3·Μ+ H3C(OH2CH2C)4C}^ &lt;D(CH2CH20)4CH3 M = Li,Na,K,Cs,N(CH3)4 +MO3s^fc( )tvso3*m+ H3C {OH2CH2C)3a ' o(ch2ch2o)3ch3 M = Li, Na, K, Cs, N(CH3)4 &quot;MO3SV^ &gt;^VSO^M+ H3C(OH2CH2C)5Cr 1D(CH2CH20)5CH3 M = Li,Na ,K, Cs,N(CH3)4

+MO3Swp&lt; y^S03-M+ H3q〇H2CH2C)60^ lD(CH2CH2〇)6CH3 M = Li,Na,K, Cs, N(CH3)4+MO3Swp&lt; y^S03-M+ H3q〇H2CH2C)60^ lD(CH2CH2〇)6CH3 M = Li,Na,K, Cs, N(CH3)4

H3C(OH2CH2C)2OW，Y^O(CH2CH2〇)2CH3 +MO3S^^ M = Li,Na,K, Cs,N(CH3)4H3C(OH2CH2C)2OW,Y^O(CH2CH2〇)2CH3 +MO3S^^ M = Li,Na,K, Cs,N(CH3)4

H3C(OH2CH2C)4〇&gt;VV^0(ch2CH20&gt;4CH3 +MO3S’〜 “ScVM+ M = Li, Na, K, Cs, N(CH3)4 H3C(OH2CH2C)5〇H3C(OH2CH2C)4〇&gt;VV^0(ch2CH20&gt;4CH3 +MO3S'~"ScVM+ M = Li, Na, K, Cs, N(CH3)4 H3C(OH2CH2C)5〇

+mo3s〜 〜so3_m+ 0(CH2CH20)5CH3 M = Li,Na,K, Cs, N(CH3)4+mo3s~~so3_m+ 0(CH2CH20)5CH3 M = Li,Na,K, Cs, N(CH3)4

+mo3s so3'm+ H3C(OH2CH2C)60&gt;^/V&lt;〇(ch2CH20)6CH3 +MO3 广 S03'M+ M = Li,Na,K, Cs, N(CH3)4 Η30(ΟΗ2ΟΗ2〇)7〇^Λγ^:0(ΟΗ2〇Η2〇)7〇Η3 M = Li, Na, K, Cs, N(CH3)4 65 323323 201220574+mo3s so3'm+ H3C(OH2CH2C)60&gt;^/V&lt;〇(ch2CH20)6CH3 +MO3 Guang S03'M+ M = Li,Na,K, Cs, N(CH3)4 Η30(ΟΗ2ΟΗ2〇)7〇^Λγ ^:0(ΟΗ2〇Η2〇)7〇Η3 M = Li, Na, K, Cs, N(CH3)4 65 323323 201220574

COOCH2CH3 och2coctm+ h3ch2cooc +mooch2c M = Li，Na,K，Cs，N(CH3)4COOCH2CH3 och2coctm+ h3ch2cooc +mooch2c M = Li,Na,K,Cs,N(CH3)4

H3CH2COOCV^1 rVC〇〇CH2CH3 ^ΜΌ00(Η20)2σ 0(CH2)2CO〇-M+ M = Li，Na,K, Cs,N(CH3)4H3CH2COOCV^1 rVC〇〇CH2CH3 ^ΜΌ00(Η20)2σ 0(CH2)2CO〇-M+ M = Li,Na,K, Cs,N(CH3)4

H3CH2COOCY^ ^yc〇OCH2CH3H3CH2COOCY^ ^yc〇OCH2CH3

+ΜΌΟ〇(Η2〇3(/^ ^D(CH2)3COCTM+ M = Li,Na,K, Cs,N(CH3)4 H3CH2COOCV^( rVCOOCH2CH3 &quot;MOOC(H2C)5Ci 0(CH2)5CO〇-M+ M = Li，Na,K，Cs，N(CH3)4 H3CH2COOCV^ rVCOOCH2CH3 ΊνΤΟΟ〇(Η2〇4〇 0(CH2)4CO〇-M+ M = Li，Na,K, Cs,N(CH3)4 H3CH2COOCV^( rVCOOCH2CH3 +MOOC(H2C)60 0(CH2)6C〇〇&quot;M+ M = Li,Na,K, Cs, N(CH3)4+ΜΌΟ〇(Η2〇3(/^ ^D(CH2)3COCTM+ M = Li,Na,K, Cs,N(CH3)4 H3CH2COOCV^( rVCOOCH2CH3 &quot;MOOC(H2C)5Ci 0(CH2)5CO〇-M+ M = Li, Na, K, Cs, N(CH3)4 H3CH2COOCV^ rVCOOCH2CH3 ΊνΤΟΟ〇(Η2〇4〇0(CH2)4CO〇-M+ M = Li,Na,K, Cs,N(CH3)4 H3CH2COOCV^ ( rVCOOCH2CH3 +MOOC(H2C)60 0(CH2)6C〇〇&quot;M+ M = Li,Na,K, Cs, N(CH3)4

H3CH2COOC +MO3SH2CH3CH2COOC +MO3SH2C

COOCH2CH3 OCH2S〇3'M+COOCH2CH3 OCH2S〇3'M+

VCOOCH2CH3 、o(ch2)2so3-m+ M = Li，Na，K，Cs,N(CH3)4 H3CH2COOC +MO3S(H2C)e M = Li，Na，K，Cs,N(CH3)4VCOOCH2CH3, o(ch2)2so3-m+ M = Li,Na,K,Cs,N(CH3)4 H3CH2COOC +MO3S(H2C)e M = Li,Na,K,Cs,N(CH3)4

H3CH2COOCV^ rVCOOCH2CH3 &quot;MO3S(H2C)30 o(ch2)3so3-m+ M = Li,Na,K, Cs,N(CH3)4 H3CH2COOCV&quot;i1 rVCOOCH2CH3 +MO3S(H2C)50 '0(CH2)5S〇3_M+ M = Li,Na，K, Cs，N(CH3)4 H3CH2COOCV55s1 rVC〇〇CH2CH3 +MO3S(H2C)4CT 〜 0(CH2)4S〇3_M+ M = Li，Na,K，Cs,N(CH3)4 H3CH2COOC^/^ rvcoocH2CH3 +MO3S(H2C)6Cf 〜 'O(CH2)6S〇3M+ M = Li,Na,K，Cs,N(CH3)4 66 323323 201220574 +MOOC H3C(OH2CH2C)2i H3C(OH2CH2C)2'H3CH2COOCV^ rVCOOCH2CH3 &quot;MO3S(H2C)30 o(ch2)3so3-m+ M = Li,Na,K, Cs,N(CH3)4 H3CH2COOCV&quot;i1 rVCOOCH2CH3 +MO3S(H2C)50 '0(CH2)5S〇3_M+ M = Li,Na,K, Cs,N(CH3)4 H3CH2COOCV55s1 rVC〇〇CH2CH3 +MO3S(H2C)4CT ~ 0(CH2)4S〇3_M+ M = Li,Na,K,Cs,N(CH3)4 H3CH2COOC ^/^ rvcoocH2CH3 +MO3S(H2C)6Cf ~ 'O(CH2)6S〇3M+ M = Li,Na,K,Cs,N(CH3)4 66 323323 201220574 +MOOC H3C(OH2CH2C)2i H3C(OH2CH2C)2'

OCTM+ 0(CH2CH20)2CH3 丨(ch2ch2o)2ch3OCTM+ 0(CH2CH20)2CH3 丨(ch2ch2o)2ch3

+ΜΌΟ H3C(OH2CH2C)3« H3C(OH2CH2C)3i 0〇-M+ 0(CH2CH20)3CH3 CH2CH20)3CH3 M = Li, Na, K, Cs, N(CH3)4 M = Li, Na, K, Cs, N(CH3)4 +MOD H3C(OH2CH2C)4 丨 H3C(OH2CH2C)4 丨+ΜΌΟ H3C(OH2CH2C)3« H3C(OH2CH2C)3i 0〇-M+ 0(CH2CH20)3CH3 CH2CH20)3CH3 M = Li, Na, K, Cs, N(CH3)4 M = Li, Na, K, Cs, N(CH3)4 +MOD H3C(OH2CH2C)4 丨H3C(OH2CH2C)4 丨

00'M+ o(ch2ch2o)4ch3 |(CH2CH20)4CH3 +MOOC H3C(OH2CH2C)5 H3C(OH2CH2C)5i00'M+ o(ch2ch2o)4ch3 |(CH2CH20)4CH3 +MOOC H3C(OH2CH2C)5 H3C(OH2CH2C)5i

00'M+ 0(CH2CH20)5CH3 (CH2CH20)5CH3 M = Li, Na, Kt Cs, N(CH3)4 M = Li, Na, K, Cs, N(CH3)4 +MOOC H3C(OH2CH2C)6' HaQOHaCHzOe'00'M+ 0(CH2CH20)5CH3 (CH2CH20)5CH3 M = Li, Na, Kt Cs, N(CH3)4 M = Li, Na, K, Cs, N(CH3)4 +MOOC H3C(OH2CH2C)6' HaQOHaCHzOe '

00·Μ+ 0(CH2CH20)6CH3 丨(ch2ch2o)6ch3 +ΜΌ〇ι H3C(OH2CH2C)7 H3C(OH2CH2C)7 丨00·Μ+ 0(CH2CH20)6CH3 丨(ch2ch2o)6ch3 +ΜΌ〇ι H3C(OH2CH2C)7 H3C(OH2CH2C)7 丨

00·Μ+ 0(CH2CH20)7CH3 丨(ch2ch2o)7ch3 M = Li,Na,K, Cs,N(CH3)4 M = Li, Na, K, Cs, N(CH3)400·Μ+ 0(CH2CH20)7CH3 丨(ch2ch2o)7ch3 M = Li,Na,K, Cs,N(CH3)4 M = Li, Na, K, Cs, N(CH3)4

H3CH2COOC +MO3S(H2C)3IH3CH2COOC +MO3S(H2C)3I

COOCH2CH3 (CH2)3S〇3-M+ H3CH2COOC +MO3SC6H4〇iCOOCH2CH3 (CH2)3S〇3-M+ H3CH2COOC +MO3SC6H4〇i

M = Lif NafK, Csf N(CH3)4 COOCH2CH3 OC6H4S〇3'M+ M = Li,Na,K, Cs, N(CH3)4M = Lif NafK, Csf N(CH3)4 COOCH2CH3 OC6H4S〇3'M+ M = Li,Na,K, Cs, N(CH3)4

H3CH2COOCY^ |r^yc〇〇CH2CH3 +MOCX：(H2C)3C&gt;^ iDiCH2)3COO*M+ M = U，Na,K,Cs,N(CH3)4 H3CH2COOC· +MOOCCeH4jH3CH2COOCY^ |r^yc〇〇CH2CH3 +MOCX:(H2C)3C&gt;^ iDiCH2)3COO*M+ M = U,Na,K,Cs,N(CH3)4 H3CH2COOC· +MOOCCeH4j

COOCH2CH3 voc6h4coo*m+ M = Li,Na(K, Cs, N(CH3)4 以式（13)所示之構造單元而言，從所得之離子性聚合物的耐久性之觀點來看，較佳為式（25)所示之構造單元。 &quot;((Q1)n1-Y1 (M1)a1(Zi)b1}/RlHQ3)n3-Y3 }COOCH2CH3 voc6h4coo*m+ M = Li, Na(K, Cs, N(CH3)4 The structural unit represented by the formula (13) is preferably from the viewpoint of durability of the obtained ionic polymer. a structural unit represented by the formula (25). &quot;((Q1)n1-Y1 (M1)a1(Zi)b1}/RlHQ3)n3-Y3 }

m14 m15 (25) [式（25)中，R15 表示（l+ml3+ml4)價的有機基，Q1、Q3、Y1 67 323323 201220574 Μ1、Z1、Υ3、nl、al、bl及n3表示與前述者相同之意義， ml3、ml4及ml5各自獨立地表示1以上的整數，當R15、ml3、 ml4、Q1、Q3、γ1、Μ1、Z1、Y3、nl、al、bl 及 n3 各為複數 個時，可為相同或相異。] 式（25)中，以R15所示之（l+ml3+ml4)價的有機基而 言，可列舉例如：從曱基、乙基、丙基、異丙基、丁基、 異丁基、第二丁基、第三丁基、戊基、己基、環已基、庚 參 基、辛基、壬基、癸基、月桂基、此等基中的至少1個氮 原子經取代基取代的基等具有或不具有取代基之碳原子數 1至20的烷基中去除（ml3+ml4)個氫原子後所得的基；從 苯基、1-萘基、2-萘基、1-蒽基、2-蒽基、9-蒽基、此等 基中的至少1個氫原子經取代基取代的基等具有或不具有 取代基之碳原子數6至30的芳基中去除（m13+ml4)個氮原 子後所得的基；從甲氧基、乙氧基、丙氧基、丁氧基、戊 基氧基、己基氧基、壬基氧基、十二基氧基、環丙基氧基、 # 環丁基氧基、環戊基氧基、環己基氧基、環壬基氧基、環 十二基氧基、萡基氧基、金剛烷基氧基、此等基中的至少 1個氫原子經取代基取代的基等具有或不具有取代基之碳 原子數1至50的烷氧基中去除（ml3+inl4)個氳原子後所得 的基；從具有包含碳原子的取代基之胺基中去除（ml3+ml4) 個氫原子後所得的基；從具有包含碳原子的取代基之石夕基 中去除（ml3+ml4)個氫原子後所得的基。此等之中，從原料 單體的合成容易度之觀點來看，較佳為從炫基中去除 (ml3+ml4)個氫原子後所得的基、從芳基中去除（ml3+ml4) 68 323323 201220574 個虱原子後所得的基、從嫁氧基中去除（ml3+m 14)個氫原子 後所得的基。 以式（25)所示之構造單元而言，可列舉如以下之構造 單元。M14 m15 (25) [In the formula (25), R15 represents an organic group of (l+ml3+ml4) valence, Q1, Q3, Y1 67 323323 201220574 Μ1, Z1, Υ3, nl, al, bl and n3 are expressed as described above In the same meaning, ml3, ml4, and ml5 each independently represent an integer of 1 or more, and when R15, ml3, ml4, Q1, Q3, γ1, Μ1, Z1, Y3, nl, al, bl, and n3 are each plural. , can be the same or different. In the formula (25), the organic group having a (l+ml3+ml4) valence represented by R15 may, for example, be an alkyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group or an isobutyl group. , a second butyl group, a tert-butyl group, a pentyl group, a hexyl group, a cyclohexyl group, a heptyl group, an octyl group, a decyl group, a fluorenyl group, a lauryl group, and at least one nitrogen atom in the group is substituted with a substituent a group obtained by removing (ml3+ml4) hydrogen atoms from an alkyl group having 1 to 20 carbon atoms with or without a substituent; from phenyl, 1-naphthyl, 2-naphthyl, 1-indole a group, a 2-fluorenyl group, a 9-fluorenyl group, a group in which at least one hydrogen atom in the group is substituted with a substituent, etc., with or without a substituent, and an aryl group having 6 to 30 carbon atoms is removed (m13+ a group obtained after a nitrogen atom; from methoxy, ethoxy, propoxy, butoxy, pentyloxy, hexyloxy, decyloxy, dodecyloxy, cyclopropyl Oxyl, #cyclobutyloxy, cyclopentyloxy, cyclohexyloxy, cyclodecyloxy, cyclododecyloxy, decyloxy, adamantyloxy, in these groups a group substituted with at least one hydrogen atom via a substituent a group obtained by removing (ml3+inl4) fluorene atoms from an alkoxy group having 1 to 50 carbon atoms with or without a substituent; and removing from an amine group having a substituent containing a carbon atom (ml3+ml4) a group obtained by one hydrogen atom; a group obtained by removing (ml 3 + ml 4) hydrogen atoms from a group having a substituent containing a carbon atom. Among these, from the viewpoint of easiness of synthesis of the raw material monomers, it is preferred to remove (ml3+ml4) hydrogen atoms from the leuco group and remove them from the aryl group (ml3+ml4) 68 323323 201220574 The group obtained after the ruthenium atom, the group obtained by removing (ml3+m 14) hydrogen atoms from the graft oxygen group. The structural unit represented by the formula (25) may be exemplified by the following structural unit.

M = U, Na, K, Cs, NMe4 M= U, NaA Cs*NMe4 M = Li, Na, K Cs, NMe4M = U, Na, K, Cs, NMe4 M= U, NaA Cs*NMe4 M = Li, Na, K Cs, NMe4

+m-〇〇〇 +MO〇Q &quot;M'OOC+m-〇〇〇 +MO〇Q &quot;M'OOC

0(CH2CH20)6CH30(CH2CH20)6CH3

0(CH2〇H 2〇 )7〇Η 3 / \-〇(CH2CH2〇)5CH3 名- M = Li, Na, K, Cs, NMe4 m = Li, Na, K, Cs-ΝΜθ4 M = U,Na,K, Cs, ΝΜθ4 〈式（15)所示之構造單元之例〉 以式（15)所示之構造單元而言，從所得之離子性聚合 物的電子傳輸性之觀點來看’較佳為式(26)所示之構造軍 元、式（27)所示之構造單元’更佳為式（27)所示之構造草 元。 69 323323 2012205740(CH2〇H 2〇)7〇Η 3 / \-〇(CH2CH2〇)5CH3 Name - M = Li, Na, K, Cs, NMe4 m = Li, Na, K, Cs-ΝΜθ4 M = U,Na , K, Cs, ΝΜ θ4 <Example of the structural unit represented by the formula (15)> From the viewpoint of the electron transport property of the obtained ionic polymer, the structural unit represented by the formula (15) is preferably The structural unit represented by the formula (26) and the structural unit represented by the formula (27) are more preferably the structural unit represented by the formula (27). 69 323323 201220574

[式（26)中，R16表示（l+ml6+ml7)價的有機基，R17表示i價 的有機基 ’ Q2、Q3、Y2、Μ2、Z2、Y3、n2、a2、b2 及⑽表卞 與前述者相同之意義，ml6及ml7各自獨立地表示丨以上 的整數，當 Q2、Q3、Y2、Μ2、Z2、Y3、n2、a2、b2 及 n3 各為 響複數個時’可為相同或相異。] 式（26)中’以R16所示之（i+mi6+ml7)價的有機基而 言，可列舉例如：從曱基、乙基、丙基、異丙基、丁美、 異丁基、第一丁基、第三丁基、戊基、己基、環己基、庚 基、辛基、壬基、癸基、月桂基、此等基中的至少丨個氫 原子經取代基取代的基等具有或不具有取代基之碳原子數 1至20的烷基中去除（mi6+m17)個氫原子後所得的基；從 • 苯基、卜萘基、2-萘基、1-蒽基、2-蒽基、9-蒽基、此等 基中的至少1個氫原子經取代基取代的基等具有或不具有 取代基之碳原子數6至30的芳基中去除（ml6+rol7)個氫原 子後所得的基；從曱氧基、乙氧基、丙氧基、丁氧基、戊 基氧基、己基氧基、壬基氧基、十二基氧基、環丙基氧基、 %丁基氧基、環戊基氧基、環己基氧基、環壬基氧基、環 十二基氧基、萡基氧基、金剛烷基氧基、此等基中的至少 1個氫原子經取代基取代的基等具有或不具有取代基之碳 原子數1至50的烷氧基中去除（ml6+ml7)個氫原子後所得 70 323323 201220574 的基；從具有包含碳原子的取代基之胺基中去除（m16+mi7) 個氫原子後所得的基；從具有包含碳原子的取代基之石夕基 中去除（ml6+ml7)個氫原子後所得的基。此等之中，從原料 單體的合成容易度之觀點來看，較佳為從烷基中去除 (ml6+ml7)個氫原子後所得的基、從芳基中去除（mi6+ml7) 個氫原子後所得的基、從烧氧基中去除（ml6+ml7)個氫原子 後所得的基。 _ 式（26)中，以R17所示之1價的有機基而言，可列舉例 如：曱基、乙基、丙基、異丙基、丁基、異丁基、第二丁 基、第三丁基、戊基、己基、環己基、庚基、辛基、壬基、 癸基、月桂基、此等基中的至少1個氫原子經取代基取代 的基等具有或不具有取代基之碳原子數1至20的烧基；笨 基、1-萘基、2-萘基、1-蒽基、2-蒽基、9-蒽基、此等基 中的至少1個氫原子經取代基取代的基等具有或不具有取 代基之碳原子數6至30的芳基；曱氧基、乙氧基、丙氧基、 丁氧基、戍基氧基、己基氧基、壬基氧基、十二基氧基、 環丙基氧基、環丁基氧基、環戊基氧基、環己基氧基、環 壬基氧基、環十二基氧基、宿基氧基、金剛烧基氧基、此 等基中的至少1個氫原子經取代基取代的基等具有或不具 有取代基之碳原子數1至50的烷氧基；具有包含碳原子的 取代基之胺基；具有包含碳原子的取代基之石夕基。此等之 中，從原料單體的合成容易度之觀點來看，較佳為烧基、 芳基、烷氧基。 以式（26)所示之構造單元而言，可列舉如以下之構造 323323 71 201220574[In the formula (26), R16 represents an organic group of (l+ml6+ml7) valence, and R17 represents an organic group of an valence of 'Q2, Q3, Y2, Μ2, Z2, Y3, n2, a2, b2 and (10). In the same meaning as the foregoing, ml6 and ml7 each independently represent an integer above 丨, and may be the same when Q2, Q3, Y2, Μ2, Z2, Y3, n2, a2, b2, and n3 are each plural. Different. In the formula (26), the organic group of the (i+mi6+ml7) valence represented by R16 may, for example, be an alkyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group or an isobutyl group. a first butyl group, a tert-butyl group, a pentyl group, a hexyl group, a cyclohexyl group, a heptyl group, an octyl group, a decyl group, a decyl group, a lauryl group, a group in which at least one hydrogen atom in the group is substituted with a substituent a group obtained by removing (mi6+m17) hydrogen atoms from an alkyl group having 1 to 20 carbon atoms with or without a substituent; from phenyl, naphthyl, 2-naphthyl, 1-indenyl, 2 - fluorenyl group, 9-fluorenyl group, aryl group having 6 to 30 carbon atoms with or without a substituent substituted with at least one hydrogen atom in these groups, etc. (ml6+rol7) a group obtained after a hydrogen atom; from an oxiranyloxy group, an ethoxy group, a propoxy group, a butoxy group, a pentyloxy group, a hexyloxy group, a decyloxy group, a dodecyloxy group, a cyclopropyloxy group, % butyloxy, cyclopentyloxy, cyclohexyloxy, cyclodecyloxy, cyclododecyloxy, decyloxy, adamantyloxy, at least one hydrogen in such groups Substituent substituted by an atom A group of 70 323323 201220574 obtained by removing (ml6+ml7) hydrogen atoms from an alkoxy group having 1 to 50 carbon atoms with or without a substituent; and removing from an amine group having a substituent containing a carbon atom (m16 +mi7) a group obtained by hydrogen atoms; a group obtained by removing (ml6+ml7) hydrogen atoms from a group having a substituent containing a carbon atom. Among these, from the viewpoint of easiness of synthesis of the raw material monomers, it is preferred to remove (ml6+ml7) hydrogen atoms from the alkyl group and remove them from the aryl group (mi6+ml7). The group obtained after the hydrogen atom and the group obtained by removing (ml6+ml7) hydrogen atoms from the alkoxy group. In the formula (26), the monovalent organic group represented by R17 may, for example, be an anthracenyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group or a second butyl group. a tributyl group, a pentyl group, a hexyl group, a cyclohexyl group, a heptyl group, an octyl group, a decyl group, a decyl group, a lauryl group, a group in which at least one hydrogen atom in the group is substituted with a substituent, etc., with or without a substituent a burning group having 1 to 20 carbon atoms; a stupid group, a 1-naphthyl group, a 2-naphthyl group, a 1-fluorenyl group, a 2-fluorenyl group, a 9-fluorenyl group, and at least one hydrogen atom in the group a aryl group having 6 to 30 carbon atoms with or without a substituent; a decyloxy group, an ethoxy group, a propoxy group, a butoxy group, a decyloxy group, a hexyloxy group, a fluorenyl group Oxyl, dodecyloxy, cyclopropyloxy, cyclobutyloxy, cyclopentyloxy, cyclohexyloxy, cyclodecyloxy, cyclododecyloxy, benzyloxy, An alkoxy group having 1 to 50 carbon atoms having or having a substituent, such as a cardinyloxy group, a group substituted with at least one hydrogen atom in the group, or the like; an amine having a substituent containing a carbon atom; Base Stone substituent Xi carbon atoms. Among these, from the viewpoint of easiness of synthesis of the raw material monomers, a pyridyl group, an aryl group or an alkoxy group is preferred. The structural unit represented by the formula (26) can be exemplified by the following structure: 323323 71 201220574

XfO —· 早兀XfO —· early

H3C ]r^{N(CH3)2CH2CH3}+X-#'0(CH2CH20)3CH3 X = F, a. Br, I, BPh4, CF3SO3, CH3C00H3C ]r^{N(CH3)2CH2CH3}+X-#'0(CH2CH20)3CH3 X = F, a. Br, I, BPh4, CF3SO3, CH3C00

调 CH3&gt;2CH2CH3}+X-、0(CH2CH20)3CH3 X = F, a. Br, I, BPh4, CF3SO3, CH3COOCH3&gt;2CH2CH3}+X-, 0(CH2CH20)3CH3 X = F, a. Br, I, BPh4, CF3SO3, CH3COO

-{N(CH3)2CH2CH3}+X-、0(CH2CH20)sCH3 X = F, Cl. Br, l, BPh4l CF3S03t CH3COO-{N(CH3)2CH2CH3}+X-, 0(CH2CH20)sCH3 X = F, Cl. Br, l, BPh4l CF3S03t CH3COO

- {N(CH3)2CH2CH3}+X· 0(CH2CH20]sCH3 X = F, a. Br, I, BPh4l CF3SO3, CH3COO- {N(CH3)2CH2CH3}+X· 0(CH2CH20)sCH3 X = F, a. Br, I, BPh4l CF3SO3, CH3COO

- {N(CH3)2CH2CH3)+X· O(CH2CH2〇)3CH3 X = F, Cl. Br, I, BPh4) CF3SO3, CH3COO- {N(CH3)2CH2CH3)+X·O(CH2CH2〇)3CH3 X = F, Cl. Br, I, BPh4) CF3SO3, CH3COO

-{N(CH3)2CH2CH3}+X· '0(CH2CH20)3CH3 X = F, Cl. Br, I, BPh4) CF3SO3, CH3COO-{N(CH3)2CH2CH3}+X· '0(CH2CH20)3CH3 X = F, Cl. Br, I, BPh4) CF3SO3, CH3COO

H3C〇 )TV{N(CH3)2CH2CH3}+X· 0(CH2CH20)3CH3 X = F, a. Br, I, BPh4, CF3S03l CH3COOH3C〇 )TV{N(CH3)2CH2CH3}+X· 0(CH2CH20)3CH3 X = F, a. Br, I, BPh4, CF3S03l CH3COO

-{N(CH3)2CH2CH3}+X· '0(CH2CH20)sCH3 X = F, a. Brt I, BPh4, CF3SO3, CH3COO-{N(CH3)2CH2CH3}+X· '0(CH2CH20)sCH3 X = F, a. Brt I, BPh4, CF3SO3, CH3COO

H9C4(5 )&lt;Y^{N(CH3)2CH2CH3}+X· 0(CH2CH20)3CH3 X = F, CI. Br, I, BPh4, CF3S03, CH3COOH9C4(5)&lt;Y^{N(CH3)2CH2CH3}+X· 0(CH2CH20)3CH3 X = F, CI. Br, I, BPh4, CF3S03, CH3COO

-{N(CH3)2CH2CH3}+X· '0(CH2CH20)sCH3 X = F, a. Br, I, BPh4, CF3SO3, CH3C00-{N(CH3)2CH2CH3}+X· '0(CH2CH20)sCH3 X = F, a. Br, I, BPh4, CF3SO3, CH3C00

H21C10O rV{N(CH3)2CH2CH3}+X· 0(CH2CH2〇)bCH3 X = F, a. Br, I, BPh4, CF3SO3, CH3COO 72 323323 201220574H21C10O rV{N(CH3)2CH2CH3}+X· 0(CH2CH2〇)bCH3 X = F, a. Br, I, BPh4, CF3SO3, CH3COO 72 323323 201220574

(Z2)b2(M2)a2Y2-(Q2)H ir[(Q2)n2-Y2(M2)a2(Z2)b2} m16 (27) I Y3-(Q3)n3|^17、(Q3)n3-Y3 } m17 [式（27)中，R16 表示（i+ml6+ml7)價的有機基 ’ Q2、Q3、Y2、 Μ2、Z2、Y3、n2、a2、b2及n3表示與前述者相同之意義， ral 6及ml 7各自獨立地表示1以上的整數，當r16、ml 6、ml 7、 Q2、Q3、Y2、Μ2、Z2、Y3、n2、a2、b2 及 n3 各為複數個時， 儀|可為相同或相異。] 式（27)中，以R16所示之（i+mi6+mi7)價的有機基而 言’可列舉例如：從曱基、乙基、丙基、異丙基、丁基、 異丁基、第二丁基、第三丁基、戊基、己基、環己基、庚 基、辛基、壬基、癸基、月桂基、此等基中的至少1個氫 原子經取代基取代的基等具有或不具有取代基之碳原子數 1至20的烷基中去除（ml6+ml7)個氫原子後所得的基；從 讀^ 1萘基、2-奈基、1-蒽基、2-蒽基、9-蔥基、此等 基中的至少1個氫原子經取代基取代的基等具有或不具有 取代基之碳原子數6至30的芳基中去除（ml6+ml7)個氫原 子後所得的基；從曱氧基、乙氧基、丙氧基、丁氧基、戊 %丁基氧基、環戊基氧基、環己基氧基、環壬基氧基、環 十二(Z2)b2(M2)a2Y2-(Q2)H ir[(Q2)n2-Y2(M2)a2(Z2)b2} m16 (27) I Y3-(Q3)n3|^17, (Q3)n3- Y3 } m17 [In the formula (27), R16 represents an organic group of (i+ml6+ml7) valences] Q2, Q3, Y2, Μ2, Z2, Y3, n2, a2, b2 and n3 represent the same meaning as the above. , ral 6 and ml 7 each independently represent an integer of 1 or more, and when r16, ml 6, ml 7, Q2, Q3, Y2, Μ2, Z2, Y3, n2, a2, b2, and n3 are each plural, | can be the same or different. In the formula (27), the organic group of the (i+mi6+mi7) valence represented by R16 may, for example, be an alkyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group or an isobutyl group. a second butyl group, a tert-butyl group, a pentyl group, a hexyl group, a cyclohexyl group, a heptyl group, an octyl group, a decyl group, a fluorenyl group, a lauryl group, a group in which at least one hydrogen atom in the group is substituted with a substituent a group obtained by removing (ml6+ml7) hydrogen atoms from an alkyl group having 1 to 20 carbon atoms with or without a substituent; from the reading of 1 naphthyl group, 2-nyl group, 1-mercapto group, 2 - fluorenyl group, 9-onion group, aryl group having 6 to 30 carbon atoms with or without a substituent substituted with at least one hydrogen atom in these groups, etc. (ml6+ml7) a group obtained after a hydrogen atom; from a decyloxy group, an ethoxy group, a propoxy group, a butoxy group, a pentyl butyloxy group, a cyclopentyloxy group, a cyclohexyloxy group, a cyclodecyloxy group, a ring two

50的烧氧基中去除（mi6+mi7)個氫原子後所得 =·氧基、己基氧基、壬基氧基、十二基氧基、環丙基氧基、 1個 原子. 323323 73 201220574 的基；從具有包含碳原子的取代基之胺基中去除（m16+ml7) 個氫原子後所得的基；從具有包含碳原子的取代基之矽基 中去除（ml6+ml7)個氫原子後所得的基。此等之中，從原料 單體的合成容易度之觀點來看，較佳為從烷基中去除 (ml6+ml7)個氫原子後所得的基、從芳基中去除（ml6+ml7) 個氫原子後所得的基、從烷氧基中去除（ml6+ml7)個氫原子 後所得的基。 以式（27)所示之構造單元而言，可列舉如以下之構造 單元。After removing (mi6+mi7) hydrogen atoms from the alkoxy group of 50, the resulting methoxy group, hexyloxy group, decyloxy group, dodecyloxy group, cyclopropyloxy group, 1 atom. 323323 73 201220574 a group obtained by removing (m16+ml7) hydrogen atoms from an amine group having a substituent containing a carbon atom; and removing (ml6+ml7) hydrogen atoms from a thiol group having a substituent containing a carbon atom; The resulting base. Among these, from the viewpoint of easiness of synthesis of the raw material monomers, it is preferred to remove (ml6+ml7) hydrogen atoms from the alkyl group and remove them from the aryl group (ml6+ml7) The group obtained after the hydrogen atom and the group obtained by removing (ml6+ml7) hydrogen atoms from the alkoxy group. The structural unit represented by the formula (27) may be exemplified by the following structural unit.

74 323323 201220574 X+{H3CH2C(H3C)2N: H3C(0H2CH2C)20,74 323323 201220574 X+{H3CH2C(H3C)2N: H3C(0H2CH2C)20,

.{N(CH3)2CH2CH3}+)C -X+{H3CH2C(H3C)2N}- 、o(ch2ch2o)2ch3 H3C(OH2CH2〇3.{N(CH3)2CH2CH3}+)C -X+{H3CH2C(H3C)2N}-, o(ch2ch2o)2ch3 H3C(OH2CH2〇3

.{N(CH3)2CH2CH3}+&gt;C (CH2CH20)3CH3 X = F, Cl, Br, I, BPh4, CF3SO3 X=F, Cl, Br, I, BPh4, CF3SO3.{N(CH3)2CH2CH3}+&gt;C (CH2CH20)3CH3 X = F, Cl, Br, I, BPh4, CF3SO3 X=F, Cl, Br, I, BPh4, CF3SO3

X+{H3CH2C(H3C)2N}'Y^ ry-{N(CH3)2CH2CH3}*X-HaCIOHaCHaCkO^^ (3(ΟΗ2ΟΗ2〇)4〇Η3 X = F, Cl, Br, I, BPh4, CF3SO3 •X+{{H3CH2C)2N}'Y^ ry-{N(CH3)2CH2CH3rx-H3C(OH2CH2C)5〇^^ ^D(CH2CH20)5CH3 X=F,CI,Br,l, BPh4, CF3SO3X+{H3CH2C(H3C)2N}'Y^ ry-{N(CH3)2CH2CH3}*X-HaCIOHaCHaCkO^^ (3(ΟΗ2ΟΗ2〇)4〇Η3 X = F, Cl, Br, I, BPh4, CF3SO3 •X+ {{H3CH2C)2N}'Y^ ry-{N(CH3)2CH2CH3rx-H3C(OH2CH2C)5〇^^ ^D(CH2CH20)5CH3 X=F,CI,Br,l, BPh4, CF3SO3

X+{H3CH2C(H3C)2N}'Y，^( )Γ^ν{Ν(ΟΗ3)2〇Η2〇Η3}+χ· •X+{H3CH2C(H3C)2N}'Y=^ Γ^ν-{Ν(ΟΗ3)2〇Η2〇Η3}+χ· H3C(OH2CH2C)6Ci 0(CH2CH2〇)6CH3 Η30(ΟΗ2〇Η2〇)7(3^ (D(CH2CH20)7CH3 X = F, Cl, Br, I, BPh4, CF3SO3 X=F,CI, Br, I, BPh4, CF3SO3X+{H3CH2C(H3C)2N}'Y,^( )Γ^ν{Ν(ΟΗ3)2〇Η2〇Η3}+χ·•X+{H3CH2C(H3C)2N}'Y=^ Γ^ν-{Ν (ΟΗ3)2〇Η2〇Η3}+χ·H3C(OH2CH2C)6Ci 0(CH2CH2〇)6CH3 Η30(ΟΗ2〇Η2〇)7(3^(D(CH2CH20)7CH3 X = F, Cl, Br, I, BPh4, CF3SO3 X=F, CI, Br, I, BPh4, CF3SO3

h3c(〇h2ch2C)2〇y^i ry〇(CH2CH2〇)2CH3 •X+{H3CH2C(H3C)2N}/^ ^'{N(CH3)2CH2CH3}+X· X = F,CI,Br，l,BPh4, CF3S03 H3C(OH2CH2C)4〇Y] |^ύ〇(〇η2ο:η2ο)4οη3 •X+{H3CH2C(H3C)2N}/^ ^{Ν(ΟΗ3)2〇Η2〇Η3}+χ· X = F, Cl, Br, I, BPh4, CF3SO3 H3C(OH2CH2C)6aY^ /^Y〇(CH2CH20)6CH3 -X+{H3CH2C&lt;H3Q2N}，，、{N(CH3)2CH2CH3}+X-X=F, Cl. Br,l,BPh4, CF3S03 H3C(OH2CH2C)3〇Y^ ry〇(CH2CH2〇)3CH3 χ+{Η3〇Η2〇(Η30)2Ν}/Λ^ ^'{Ν(ΟΗ3)2〇Η2〇Η3}+Χ· X = F, Cl, Br, I, BPh4l CF3S03 H3C(OH2CH2C)5〇Y^ fy〇(CH2CH20)5CH3 •X+{H3CH2C(H3C)2NrX ^^{N(CH3)2CH2CH3}+X· X = F, Cl. Br, I, BPh4, CF3S〇3H3c(〇h2ch2C)2〇y^i ry〇(CH2CH2〇)2CH3 •X+{H3CH2C(H3C)2N}/^ ^'{N(CH3)2CH2CH3}+X· X = F,CI,Br,l, BPh4, CF3S03 H3C(OH2CH2C)4〇Y] |^ύ〇(〇η2ο:η2ο)4οη3 •X+{H3CH2C(H3C)2N}/^ ^{Ν(ΟΗ3)2〇Η2〇Η3}+χ· X = F, Cl, Br, I, BPh4, CF3SO3 H3C(OH2CH2C)6aY^ /^Y〇(CH2CH20)6CH3 -X+{H3CH2C&lt;H3Q2N},,,{N(CH3)2CH2CH3}+XX=F, Cl. Br ,l,BPh4, CF3S03 H3C(OH2CH2C)3〇Y^ ry〇(CH2CH2〇)3CH3 χ+{Η3〇Η2〇(Η30)2Ν}/Λ^ ^'{Ν(ΟΗ3)2〇Η2〇Η3}+ Χ· X = F, Cl, Br, I, BPh4l CF3S03 H3C(OH2CH2C)5〇Y^ fy〇(CH2CH20)5CH3 •X+{H3CH2C(H3C)2NrX ^^{N(CH3)2CH2CH3}+X· X = F, Cl. Br, I, BPh4, CF3S〇3

H3C(OH2CH2C}7〇Y^「Ύ〇(0：Η2(：Η2Ο)7(：Η3 -X+{H3CH2C(H3C)2Nr^ (CH3)2CH2CH3}&lt;X- X = F, Cl. Br. I, BPh4, CF3S03 75 323323 201220574 Η3〇Η2ε〇〇ΐ ^{(HaCJzHNJHaCiH3C(OH2CH2C}7〇Y^"Ύ〇(0:Η2(:Η2Ο)7(:Η3 -X+{H3CH2C(H3C)2Nr^(CH3)2CH2CH3}&lt;X- X = F, Cl. Br. I , BPh4, CF3S03 75 323323 201220574 Η3〇Η2ε〇〇ΐ ^{(HaCJzHNJHaCi

COOCH2CH3 OCHziNHiCI-bferX- ^CH2COO&lt; -^{(HaCfeHNXHaCfeiCOOCH2CH3 OCHziNHiCI-bferX- ^CH2COO&lt; -^{(HaCfeHNXHaCfei

COOCHaC^ 、〇tCH2&gt;2{NH(CH3)2pC*COOCHaC^, 〇tCH2&gt;2{NH(CH3)2pC*

X = F, Cl, Br，I, BPIV. OSS03» CH5COOX = F, Cl, Br, I, BPIV. OSS03» CH5COO

X = F, Cl, Br, I, BPfU· CF3S〇3, CHjCOOX = F, Cl, Br, I, BPfU· CF3S〇3, CHjCOO

COOCH2CH3 l〇iCH2)3{NH(CH3)2}+X·COOCH2CH3 l〇iCH2)3{NH(CH3)2}+X·

H3CH2COO1 •^{(HsCJzHNK^Cfe X = F, Cl, Br, l, BPh4, CF3S〇3, CHbCOO ^CH2CO〇( xmCfeHNKHjC)^H3CH2COO1 •^{(HsCJzHNK^Cfe X = F, Cl, Br, l, BPh4, CF3S〇3, CHbCOO ^CH2CO〇( xmCfeHNKHjC)^

COOCH2PH3COOCH2PH3

X = F.Cl,Br,l. BPh^CF3SO3· CH)COOX = F.Cl, Br, l. BPh^CF3SO3· CH)COO

H3CH2COO&lt; -rfiHgCfeHNXH^H3CH2COO&lt; -rfiHgCfeHNXH^

COOCH2〇Hj OiCH^etNHtCHa)^*COOCH2〇Hj OiCH^etNHtCHa)^*

X = F, Cl, Br, I, BPru，CFgSQs，ChfeCOOX = F, Cl, Br, I, BPru, CFgSQs, ChfeCOO

H3CH2C〇oc^n rV-ax)CH2CH3 *Xf{H3CH2C(H3C)2N}H2C〇X 'OCHgiNiCHafeCH^H^X' X = F, Cl, Br，l, BPh4, CF3SQj, CH3COOH3CH2C〇oc^n rV-ax)CH2CH3 *Xf{H3CH2C(H3C)2N}H2C〇X 'OCHgiNiCHafeCH^H^X' X = F, Cl, Br,l, BPh4, CF3SQj, CH3COO

HgCHjCXXXk/^ )τΛ^〇〇〇αΗ2〇Η3 •riHaCHzqHaOzNKHzCJzCi ' OtCH^NiC^feCHaCHs)^ X = F, a, Br, I, BPhi, CF3SO3. CH3COOHgCHjCXXXk/^ )τΛ^〇〇〇αΗ2〇Η3 •riHaCHzqHaOzNKHzCJzCi ' OtCH^NiC^feCHaCHs)^ X = F, a, Br, I, BPhi, CF3SO3. CH3COO

OiCHzWNiCHafcCHaCHj^OiCHzWNiCHafcCHaCHj^

76 323323 20122057476 323323 201220574

Η3〇(Χ&gt; ^{(HaCfeHNJCe^' X = F, Cl, Br, I, BPh* CF3S〇3« CH3COO OOCH3 OCeH^NHiCHa)^Η3〇(Χ&gt; ^{(HaCfeHNJCe^' X = F, Cl, Br, I, BPh* CF3S〇3« CH3COO OOCH3 OCeH^NHiCHa)^

•X^HaCMzCiHaChNKHfhC!) OiCH^NiCHafeCHaCHs}^- X = F, a, Br, I, BPh4, CF3SO3,CH3COO H3COOCV^ rVCOOCHa•X^HaCMzCiHaChNKHfhC!) OiCH^NiCHafeCHaCHs}^- X = F, a, Br, I, BPh4, CF3SO3, CH3COO H3COOCV^ rVCOOCHa

COOCH3COOCH3

X*{HjCH2C(H3C)2N)CeH40 0〇βΗ4{Ν(〇Η3)2〇Η2〇Η3}+Χ X = F· a, Br, I, BPh* CF3S〇3· CH3COOX*{HjCH2C(H3C)2N)CeH40 0〇βΗ4{Ν(〇Η3)2〇Η2〇Η3}+Χ X = F· a, Br, I, BPh* CF3S〇3· CH3COO

COOCH2CH3 '〇(CH2)3{NH(CH3)2pC hbCH^OO' ^{(H3C)2HN}CeH4'COOCH2CH3 '〇(CH2)3{NH(CH3)2pC hbCH^OO' ^{(H3C)2HN}CeH4'

CCX)CH2〇Hi bCeH^NHiCHa)^CCX)CH2〇Hi bCeH^NHiCHa)^

^CH2COO -^{(HaCfcHNJIHaOai^CH2COO -^{(HaCfcHNJIHaOai

X = F, Clf Br, I, BPh4, CF3S〇3, CH3COOX = F, Clf Br, I, BPh4, CF3S〇3, CH3COO

X = F, Cl, Br. I, BPh4, CF3SO3. Ch^COOX = F, Cl, Br. I, BPh4, CF3SO3. Ch^COO

•X+{H3Ch2〇(H3C)2N}{H2C)30 0(CH2)3{N(CH3)2CH2CHa}4X· X = F, a, Br, I, BPh4, CF3S03(CH3C00 Η30Η20000-/^\ fVCOOCHaCHs H3CH2〇• X+{H3Ch2〇(H3C)2N}{H2C)30 0(CH2)3{N(CH3)2CH2CHa}4X· X = F, a, Br, I, BPh4, CF3S03(CH3C00 Η30Η20000-/^\ fVCOOCHaCHs H3CH2 〇

COOCHaCHs •CeH^iCH^zCHaC^}^ ^{HaCHaCiHaQaNJC^- X = F, a, Br, I, BPh4, CF3SO3, CHaCOO 以式（15)所示之構造單元而言，從所得之離子性聚合 物的耐久性之觀點來看，較佳為式（28)所示之構造單元°COOCHaCHs •CeH^iCH^zCHaC^}^ ^{HaCHaCiHaQaNJC^- X = F, a, Br, I, BPh4, CF3SO3, CHaCOO From the structural unit represented by formula (15), the resulting ionic polymer From the viewpoint of durability, the structural unit represented by the formula (28) is preferred.

[式（28)中，R18 表示（l+ml8+ml9)價的有機基 ’ Q2、Q3、Y Μ2、Ζ2、Υ3、n2、a2、b2及η3表示與前述者相同之意義 ml8、ml9及m20各自獨立地表示1以上的整數，當R18、08' ml9、Q2、Q3、Y2、Μ2、Z2、Y3、n2、a2、b2 及 π3 各為複數 個時，可為相同或相異。] 式（28)中，以R18所示之（i+mi8+ml9)價的有機基而 323323 77 201220574 言，可列舉例如：從甲基、乙基、丙基、異丙基、丁基、 異丁基、第二丁基、第三丁基、戊基、己基、環己基、庚 基、辛基、壬基、癸基、月桂基、此等基中的至少丨個氫 原子經取代基取代的基等具有或不具有取代基之碳原子數 1至20的烷基中去除（ml8+ml9)個氫原子後所得的基；從 苯基、1-萘基、2-萘基、1-蒽基、2-蒽基、9-蒽基、此等 基中的至少1個氫原子經取代基取代的基等具有或不具有 Φ 取代基之碳原子數6至30的芳基中去除（ml8+ml9)個氫原 子後所得的基；從曱氧基、乙氧基、丙氧基、丁氧基、戊 基氧基、己基氧基、壬基氧基、十二基氧基、環丙基氧基、 環丁基氧基、環戊基氧基、環己基氧基、環壬基氧基、環 十二基氧基、萡基氧基、金剛烷基氧基、此等基中的至少 1個氫原子經取代基取代的基等具有或不具有取代基之碳 原子數1至50的烷氧基中去除（mi8+mi9)個氫原子後所得 的基；從具有包含碳原子的取代基之胺基中去除（ml8+ml9) • 個氫原子後所得的基；從具有包含碳原子的取代基之矽基 中去除(ml8+ml9)個氫原子後所得的基。此等之中，從原料 單體的合成容易度之觀點來看，較佳為從烷基中去除 (ml8+ml9)個氫原子後所得的基、從芳基中去除（ml8+ml9) 個氫原子後所得的基、從烷氧基中去除（ml8+ml9)個氫原子 後所得的基。 以式（28)所示之構造單元而言，可列舉如以下之構造 單元。 78 323323 201220574 X^HaClbH' ACHiCHaOizCHa ^{(HaC^HNV 0(CM2CH20)3CH3 '^{(HaCfeHNK.CXCHsCHsOkCHa[In the formula (28), R18 represents (1+ml8+ml9) valence of the organic group 'Q2, Q3, Y Μ2, Ζ2, Υ3, n2, a2, b2 and η3 means the same meaning as the above, ml8, ml9 and M20 each independently represents an integer of 1 or more, and when R18, 08' ml9, Q2, Q3, Y2, Μ2, Z2, Y3, n2, a2, b2, and π3 are each plural, they may be the same or different. In the formula (28), an organic group of (i+mi8+ml9) valence represented by R18 and 323323 77 201220574, for example, a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, Isobutyl, t-butyl, tert-butyl, pentyl, hexyl, cyclohexyl, heptyl, octyl, decyl, decyl, lauryl, at least one hydrogen atom in these groups via a substituent a group obtained by removing (ml8+ml9) hydrogen atoms from an alkyl group having 1 to 20 carbon atoms having or having a substituent, such as a substituted group; and a phenyl group, a 1-naphthyl group, a 2-naphthyl group, and 1 - an aryl group having a carbon number of from 6 to 30, such as a mercapto group, a 2-fluorenyl group, a 9-fluorenyl group, a group in which at least one hydrogen atom in the group is substituted with a substituent, or the like, having or not having a Φ substituent a group obtained after (ml8+ml9) hydrogen atoms; from an oxiranyloxy group, an ethoxy group, a propoxy group, a butoxy group, a pentyloxy group, a hexyloxy group, a decyloxy group, a dodecyloxy group, Cyclopropyloxy, cyclobutyloxy, cyclopentyloxy, cyclohexyloxy, cyclodecyloxy, cyclododecyloxy, decyloxy, adamantyloxy, such radicals At least one hydrogen atom in the middle a group obtained by removing (mi8+mi9) hydrogen atoms from an alkoxy group having 1 to 50 carbon atoms having a substituent or the like without a substituent; and an amine group having a substituent having a carbon atom; The group obtained by removing (ml8+ml9)• hydrogen atoms; the group obtained by removing (ml8+ml9) hydrogen atoms from the sulfhydryl group having a substituent containing a carbon atom. Among these, from the viewpoint of easiness of synthesis of the raw material monomers, it is preferred to remove (ml8+ml9) hydrogen atoms from the alkyl group and remove them from the aryl group (ml8+ml9) A group obtained after a hydrogen atom, and a group obtained by removing (ml 8 + ml 9) hydrogen atoms from the alkoxy group. The structural unit represented by the formula (28) may be exemplified by the following structural unit. 78 323323 201220574 X^HaClbH' ACHiCHaOizCHa ^{(HaC^HNV 0(CM2CH20)3CH3 '^{(HaCfeHNK.CXCHsCHsOkCHa

X = F, Cl, Br,l, BPh4, CFaSQj，C 比 COO X = F, Cl, Br, I，BPh4, CF3SQ3, CH3COO X = F, Cl, Br, lf BPh4, CFaSCb. CH3COO ^{(HsCfcHNK ACIiCHaOfeCHa ^{(HaCfcHNV 0(CH2CH20)eCH3 ·χ*{(Η3〇)2ΗΝν^Ο(〇^ΟΗ2〇)7〇Η3X = F, Cl, Br, l, BPh4, CFaSQj, C than COO X = F, Cl, Br, I, BPh4, CF3SQ3, CH3COO X = F, Cl, Br, lf BPh4, CFaSCb. CH3COO ^{(HsCfcHNK ACIiCHaOfeCHa ^{(HaCfcHNV 0(CH2CH20)eCH3 ·χ*{(Η3〇)2ΗΝν^Ο(〇^ΟΗ2〇)7〇Η3

X = F，Cl, Br,l, BRu, CF3$〇i O^COO X = F, Cl, Br. It BPhi. CFaSOa，CHiCOO X = F· Cl, Br,l, BRi*· CFaSW CHjCOO -X*{HbCH2C(H3C)2NK Α〇Η2〇Η2〇)2〇Η3 &quot;^{hbCH^^QaNK ACHzCHaOfeCHa ·χ*{^ΟΗ2〇(Η3〇)2ΝΚ /XChbCH^kCHaX = F, Cl, Br, l, BRu, CF3$〇i O^COO X = F, Cl, Br. It BPhi. CFaSOa, CHiCOO X = F· Cl, Br, l, BRi*· CFaSW CHjCOO -X *{HbCH2C(H3C)2NK Α〇Η2〇Η2〇)2〇Η3 &quot;^{hbCH^^QaNK ACHzCHaOfeCHa ·χ*{^ΟΗ2〇(Η3〇)2ΝΚ /XChbCH^kCHa

X = F, Cl, Br, I, BFK CF3SO3, CH3COO X = F, Cl, Br, I, BPh4, CF3SO3, Ci^COO X = F, Cl, Br, I, BPh4, CFaSOa，C^COO •X*{^CH2C(H3C)2NK α〇Η2〇Η2〇)5〇Η3 ·χ*{^0Η20(Ι^0)2Νν AC^CHaOJeCHs /〇iCH2CH20)7CH3X = F, Cl, Br, I, BFK CF3SO3, CH3COO X = F, Cl, Br, I, BPh4, CF3SO3, Ci^COO X = F, Cl, Br, I, BPh4, CFaSOa, C^COO •X *{^CH2C(H3C)2NK α〇Η2〇Η2〇)5〇Η3 ·χ*{^0Η20(Ι^0)2Νν AC^CHaOJeCHs /〇iCH2CH20)7CH3

X = F, Cl, Br, I, BPh4, CF3S〇3, CHsCOO X = F, Cl, Br, I, BPh4, CF3SO3, CH3COO X = F, Cl, Br, I, BPh4, CF3SO3, CKiCOO ^{(HaCfeHN^ ^{(HaC^HNV *Χ*{(Η3〇2ΗΝχ -〇tCH2CH2〇)2CH3 fVotCHaC^OJaCHa ( VCX^C^O^CHjX = F, Cl, Br, I, BPh4, CF3S〇3, CHsCOO X = F, Cl, Br, I, BPh4, CF3SO3, CH3COO X = F, Cl, Br, I, BPh4, CF3SO3, CKiCOO ^{( HaCfeHN^ ^{(HaC^HNV *Χ*{(Η3〇2ΗΝχ -〇tCH2CH2〇)2CH3 fVotCHaC^OJaCHa ( VCX^C^O^CHj

X = F. Cl, Br.丨，BRu· CFaSQa* CHjCOO X = F, Cl. Br· BPhi, CFaSOa* ChCOO X = F, Cl, ΒτΛ BPh4. CF3S〇3.叫0〇〇 ^{(Η3〇)2ΗΝ\ ·Χ*{(Η30)2ΗΝΧ -CKCHjC^OJsC^ fV-〇(CH2C^O)flC^ ( hCXC^C^O)^X = F. Cl, Br.丨, BRu· CFaSQa* CHjCOO X = F, Cl. Br· BPhi, CFaSOa* ChCOO X = F, Cl, ΒτΛ BPh4. CF3S〇3. Called 0〇〇^{(Η3〇 ) 2ΗΝ\ ·Χ*{(Η30)2ΗΝΧ -CKCHjC^OJsC^ fV-〇(CH2C^O)flC^ ( hCXC^C^O)^

X = F,CI, Br, I, BPh* CI^SQa，CH3COO X = F, Cl, Br, l( BPh4, CFaSO^ C^COO X = F, Cl, Br. I, BPh4, CFsSOa, ChfeCOO X*{KjCH2C(HjC)2N\ -^{hbCHjCd^qjNi *Χ*{Η3〇Η2〇(^0)2ΐ -〇iCH2C^O)2C^ (\-0{〇\20^0)^ —〇iCH2Cht〇)4ChX = F, CI, Br, I, BPh* CI^SQa, CH3COO X = F, Cl, Br, l ( BPh4, CFaSO^ C^COO X = F, Cl, Br. I, BPh4, CFsSOa, ChfeCOO X *{KjCH2C(HjC)2N\ -^{hbCHjCd^qjNi *Χ*{Η3〇Η2〇(^0)2ΐ -〇iCH2C^O)2C^ (\-0{〇\20^0)^ —〇iCH2Cht 〇) 4Ch

X = F. Cl* Br, I’ BRu· CFaSC^· CHjCOO X = F, Cl. Br, I, BPh4, CF3SQ3, CHjCOO X = F, CI. Br, I, BRi*, CRSOj·叫000 *X*{^CH2C(H3C)X = F. Cl* Br, I' BRu· CFaSC^· CHjCOO X = F, Cl. Br, I, BPh4, CF3SQ3, CHjCOO X = F, CI. Br, I, BRi*, CRSOj·000* *{^CH2C(H3C)

〇(〇Η2〇Η2〇)5〇^ X*{^CH2C(^C)2N]〇(〇Η2〇Η2〇)5〇^ X*{^CH2C(^C)2N]

0(0420^0)^0(0420^0)^

X = F,Cl.Br.I,BPh4,CF^SC^.CH3COO X = F.Cl.Br.l,BRv, CFaSQj,OfeOOO X = F,Cl,Br,，BB14,CF3SQ3.CH3OOO〈式（17)所示之構造單元之例〉以式（17)所示之構造單元而言，從所得之離子性聚合 79 323323 201220574 物的電子傳輸性之觀點來看，較佳為式（29)所示之構造單 元。X = F, Cl.Br.I, BPh4, CF^SC^.CH3COO X = F.Cl.Br.l, BRv, CFaSQj, OfeOOO X = F, Cl, Br, BB14, CF3SQ3.CH3OOO < 17) Example of the structural unit shown by the formula (17), from the viewpoint of electron transportability of the obtained ionic polymerization 79 323323 201220574, it is preferably the formula (29) The structural unit shown.

[式（29)中，R19表示單鍵或（Hm2i)價的有機基，表示單 鍵或（l+m22)價的有機基 ’ q1、q3、γΐ、Μι、ζι、γ3、、“、 • bl及n3表示與前述者相同之意義；m21及m22各自獨立地 表不1以上的整數，惟，當R19為單鍵時，m21表示i，當 R 為單鍵時，m22 表示 1 ;當 Q1、q3、γΐ、μ1、ζ1、γ3、ηι、 al bl及n3各為複數個時，可為相同或相異。] 式（29)中，以R19所示之（1+11121)價的有機基而言，可 列舉例如：從甲基、乙基、丙基、異丙基、丁基、異丁基、 第二丁基、第三丁基、戊基、己基、環己基、庚基、辛基、 壬基、癸基、月桂基、此等基中的至少1個氫原子經取代 基取代的基等具有或不具有取代基之碳原子數1至2〇的燒 基中去除（m21)個氫原子後所得的基；從苯基、卜萘基、2_ 萘基、1-蒽基、2-蒽基、9-蒽基、此等基中的至少1個氫 原子經取代基取代的基等具有或不具有取代基之碳原子數 6至30的芳基中去除（m21)個氫原子後所得的基；從甲氧 基、乙氧基、丙氧基、丁氧基、戊基氧基、己基氧基、壬 基氧基、十二基氧基、環丙基氧基、環丁基氧基、環戊基 氧基、環己基氧基、環壬基氧基、環十二基氧基、萡基氧 80 323323 201220574 基、金剛烷基氧基、此等基中的至少1個氫原子經取代基 取代的基等具有或不具有取代基之碳原子數1至50的燒氧 基中去除（m21)個氫原子後所得的基；從具有包含碳原子的 取代基之胺基中去除（m21)個氫原子後所得的基；從具有包 含碳原子的取代基之矽基中去除（m21)個氫原子後所得的 基。此等之中，從原料單體的合成容易度之觀點來看，較 佳為從烷基中去除（m21)個氫原子後所得的基、從芳基中去 除（m21)個氫原子後所得的基、從烷氧基中去除（m21)個氮 響原子後所得的基。 式（29)中’以R2°所示之（l+m22)價的有機基而言，可 列舉例如：從曱基、乙基、丙基、異丙基、丁基、異丁基、 第二丁基、第三丁基、戊基、己基、環己基、庚基、辛基、 壬基、癸基、月桂基、此等基中的至少1個氫原子經取代 基取代的基等具有或不具有取代基之碳原子數1至2〇的烧 基中去除（m22)個氫原子後所得的基；從苯基、卜萘基、2一 # 萘基、卜蒽基、2-蒽基、9-蒽基、此等基中的至少i個氫 原子經取代基取代的基等具有或不具有取代基之碳原子數 6至30的芳基中去除（m22)個氫原子後所得的基；從曱氧 基、乙氧基、丙氧基、丁氧基、戊基氧基、己基氧基、壬 基氧基、十二基氧基、環丙基氧基、環丁基氧基、環戊基 氧基、環己基氧基、環壬基氧基、環十二基氧基、萡基氧 基、金剛烧基氧基、此等基中的至少1個氫原子經取代基 取代的基等具有或不具有取代基之碳原子數丨至5〇的烧氧 基中去除（m22)個氫原子後所得的基；從具有包含碳原子的 323323 81 201220574 取代基之胺基中去除（m22)個氳原子後所得的基；從具有包 含碳原子的取代基之矽基中去除（m22)個氫原子後所得的 基。此等之中，從原料單體的合成容易度之觀點，較佳為 從烷基中去除（m22)個氫原子後所得的基、從芳基中去除 (m22)個氫原子後所得的基、從烷氧基中去除（m22)個氫原 子後所得的基。 以式（29)所示之構造單元而言’可列舉如以下之構造 一[In the formula (29), R19 represents a single bond or an organic group of (Hm2i) valence, and represents a single bond or an organic group of (l+m22) valence 'q1, q3, γΐ, Μι, ζι, γ3, 、, Bl and n3 have the same meanings as the above; m21 and m22 each independently represent an integer of 1 or more, but when R19 is a single bond, m21 represents i, and when R is a single bond, m22 represents 1; When q3, γΐ, μ1, ζ1, γ3, ηι, al bl, and n3 are each plural, they may be the same or different. In the formula (29), an organic group having a (1+11121) valence represented by R19 For example, it may, for example, be a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a second butyl group, a tert-butyl group, a pentyl group, a hexyl group, a cyclohexyl group, a heptyl group or a octyl group. a group having a carbon atom number of 1 to 2 Å having or having no substituent, such as a group having at least one hydrogen atom in the group substituted by a substituent, etc. (m21) a group obtained by a hydrogen atom; a group substituted with a substituent such as a phenyl group, a naphthyl group, a 2-naphthyl group, a 1-fluorenyl group, a 2-fluorenyl group, a 9-fluorenyl group, or at least one hydrogen atom in the group; With or without a group obtained by removing (m21) hydrogen atoms from an aryl group having 6 to 30 carbon atoms; a methoxy group, an ethoxy group, a propoxy group, a butoxy group, a pentyloxy group, a hexyloxy group , mercaptooxy, dodecyloxy, cyclopropyloxy, cyclobutyloxy, cyclopentyloxy, cyclohexyloxy, cyclodecyloxy, cyclododecyloxy, fluorenyl Oxygen 80 323323 201220574 base, adamantyloxy group, at least one hydrogen atom in these groups substituted with a substituent, etc., with or without a substituent, alkoxy group having 1 to 50 carbon atoms removed (m21 a group obtained after one hydrogen atom; a group obtained by removing (m21) hydrogen atoms from an amine group having a substituent containing a carbon atom; and removing (m21) from a mercapto group having a substituent containing a carbon atom The group obtained by the hydrogen atom. Among these, from the viewpoint of easiness of synthesis of the raw material monomers, it is preferred to remove (m21) hydrogen atoms from the alkyl group and remove them from the aryl group ( a group obtained by m21) a hydrogen atom, and a group obtained by removing (m21) a nitrogen atom from the alkoxy group. In the formula (29), 'by R2° The organic group of the (l+m22) valence may, for example, be an alkyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a second butyl group, a third butyl group or a pentyl group. a group having 1, or a hexyl group, a cyclohexyl group, a heptyl group, an octyl group, a decyl group, a fluorenyl group, a lauryl group, a group substituted with at least one hydrogen atom in the group, or the like having or having no substituent a group obtained by removing (m22) hydrogen atoms from a sulphur group; from phenyl, naphthyl, 2-naphthyl, decyl, 2-indenyl, 9-fluorenyl, at least i of these groups a group obtained by removing (m22) hydrogen atoms from an aryl group having 6 to 30 carbon atoms having or having a substituent, such as a group substituted with a substituent of a hydrogen atom; and a methoxy group, an ethoxy group, a propoxy group , butoxy, pentyloxy, hexyloxy, decyloxy, dodecyloxy, cyclopropyloxy, cyclobutyloxy, cyclopentyloxy, cyclohexyloxy, ring a mercaptooxy group, a cyclododecyloxy group, a decyloxy group, an adamantyloxy group, a group in which at least one hydrogen atom in the group is substituted with a substituent, or the like has or has no substituent a group obtained by removing (m22) hydrogen atoms from an alkoxy group having an atomic number of 5 Å; and a group obtained by removing (m22) ruthenium atoms from an amine group having a substituent of 323323 81 201220574 containing a carbon atom; A group obtained by removing (m22) hydrogen atoms from a mercapto group having a substituent containing a carbon atom. Among these, from the viewpoint of easiness of synthesis of the raw material monomers, a group obtained by removing (m22) hydrogen atoms from the alkyl group and a group obtained by removing (m22) hydrogen atoms from the aryl group are preferred. A group obtained by removing (m22) hydrogen atoms from an alkoxy group. The structural unit represented by the formula (29) can be exemplified as the following one

早兀Early

H3C(0H2CH2C)30 CO〇-M+H3C(0H2CH2C)30 CO〇-M+

H3C(0H2CH2C)30 ：00*M+ M = Li, Na, K, Cst NiCH3)4 Μ = Li, Na, K Cs, N(CH3)4H3C(0H2CH2C)30:00*M+ M = Li, Na, K, Cst NiCH3)4 Μ = Li, Na, K Cs, N(CH3)4

H3C(OH2CH2C)30 (CHz^COOM*H3C(OH2CH2C)30 (CHz^COOM*

C001V)+C001V)+

M = Li，Na, K, Cs, N(CH3)4 M = Li, Na, K, Cst NfCH^M = Li,Na, K, Cs, N(CH3)4 M = Li, Na, K, Cst NfCH^

M = Lif Na, K, Cs, N(CH3)4M = Lif Na, K, Cs, N(CH3)4

H3C(OH2CH2C)3〇 (CHzkSOa-MH3C(OH2CH2C)3〇 (CHzkSOa-M

M = Li, Na, K, Cs, N(CH3)4 M = U( Na, Kr N(CH3)4 以式（17)所示之構造單元而言，從所得之離子性聚合 物的耐久性之觀點來看，較佳為式（30)所示之構造單元。 323323 82 201220574M = Li, Na, K, Cs, N(CH3)4 M = U( Na, Kr N(CH3)4 From the structural unit represented by the formula (17), the durability of the obtained ionic polymer From the viewpoint of the above, it is preferably a structural unit represented by the formula (30). 323323 82 201220574

[式（30)中，R21表示單鍵或（l+m23)價的有機基，R22表示單 鍵或（1+Π124)價的有機基，Q1、Q3、Y1、Μ1、Z1、Y3、η卜 al、 bl及n3表示與前述者相同之意義，m23及m24各自獨立地 • 表示1以上的整數；惟，當R21為單鍵時，m23表示1，當 R22為單鍵時，m24表示1 ; m25及m26各自獨立地表示1以 上的整數，當 m23、m24、R21、R22、Q1、Q3、Y1、Μ1、Z1、Y3、 nl、al、bl及n3各為複數個時，可為相同或相異。] 式（30)中，以R21所示之（l+m23)價的有機基而言，可 列舉例如：從甲基、乙基、丙基、異丙基、丁基、異丁基、 第二丁基、第三丁基、戊基、己基、環己基、庚基、辛基、 壬基、癸基、月桂基、此等基中的至少1個氫原子經取代 ® 基取代的基等具有或不具有取代基之碳原子數1至20的烷 基中去除（m23)個氳原子後所得的基；從苯基、1-萘基、2-萘基、卜蒽基、2-蒽基、9-蒽基、此等基中的至少1個氳 原子經取代基取代的基等具有或不具有取代基之碳原子數 6至30的芳基中去除（m23)個氫原子後所得的基；從曱氧 基、乙氧基、丙氧基、丁氧基、戊基氧基、己基氧基、壬 基氧基、十二基氧基、環丙基氧基、環丁基氧基、環戊基 氧基、環己基氧基、環壬基氧基、環十二基氧基、萡基氧 83 323323 201220574 基 '金剛此等基中的1少1個氫原子經取代基 取代的基等具有或不具有取代基之碳原子以至別的烧氧 基中去除〇π23)個氫原子後所得的基；從具有包含碳原子的 取代基之胺基中去除〇„23)個氫原子後所得的基；從具有包 含碳原子的減基之㈣巾去除（m23)個氫料後所得的 基。此等之中，從原料單體的合成容易度之觀點來看，較 佳為從烷基中去除（m23)個氫原子後所得的基、從芳基中去 籲除(m23)個氫原子後所得的基、從燒氧基中去除(m23)個氫 原子後所得的基。 式（30)中，以R22所示之（1+m24)價的有機基而言可 列舉例如：從甲基、乙基、丙基、異丙基、丁基、異丁基、 第二丁基、第三丁基、戊基、己基、環己基、庚基、辛基、 壬基、癸基、月桂基、此等基中的至少丨個氫原子經取代 基取代的基等具有或不具有取代基之碳原子數1至2〇的烷 基中去除（m24)個氫原子後所得的基；從苯基、卜萘基、2一 參秦基、1_蒽基、2-蒽基、9-蒽基、此等基中的至少1個氫 原子經取代基取代的基等具有或不具有取代基之碳原子數 6至30的芳基中去除（m24)個氫原子後所得的基；從甲氧 基、乙氧基、丙氧基、丁氧基、戊基氧基、己基氧基、壬 基氧基、十二基氧基、環丙基氧基、環丁基氧基、環戊基 氧基、環己基氧基、環壬基氧基、環十二基氧基、宿基氧 基、金剛烷基氧基、此等基中的至少1個氫原子經取代基 取代的基等具有或不具有取代基之碳原子數1至50的院氧 基中去除（m24)個氫原子後所得的基；從具有包含碳原子的 84 323323 201220574 取代基之胺基中去除（m24)個氫原子後所得的基；從具有包 含碳原子的取代基之矽基中去除（m24)個氫原子後所得的 基。此等之中，從原料單體的合成容易度之觀點來看，較 佳為從烷基中去除（m24)個氫原子後所得的基、從芳基中去 除（m24)個氫原子後所得的基、從烷氧基中去除（m24)個氫 原子後所得的基。 以式（30)所示之構造單元而言，可列舉如以下之構造 一 血 早兀0[In the formula (30), R21 represents a single bond or an organic group of (l+m23) valence, and R22 represents a single bond or an organic group of (1+Π124) valence, Q1, Q3, Y1, Μ1, Z1, Y3, η Bu a1, bl, and n3 have the same meanings as the foregoing, and m23 and m24 each independently represent an integer of 1 or more; however, when R21 is a single bond, m23 represents 1, and when R22 is a single bond, m24 represents 1 M25 and m26 each independently represent an integer of 1 or more, and may be the same when m23, m24, R21, R22, Q1, Q3, Y1, Μ1, Z1, Y3, nl, a1, bl, and n3 are each plural. Or different. In the formula (30), the organic group having a (l+m23) valence represented by R21 may, for example, be a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group or an isobutyl group. Dibutyl, tert-butyl, pentyl, hexyl, cyclohexyl, heptyl, octyl, decyl, decyl, lauryl, a group substituted with at least one hydrogen atom in the group a group obtained by removing (m23) a halogen atom from an alkyl group having 1 to 20 carbon atoms with or without a substituent; from a phenyl group, a 1-naphthyl group, a 2-naphthyl group, a diphenyl group, a 2-fluorenyl group, a group obtained by removing (m23) hydrogen atoms from an aryl group having 6 to 30 carbon atoms having or having a substituent, such as a group substituted with a substituent of at least one of the fluorene atoms in the group; From methoxy, ethoxy, propoxy, butoxy, pentyloxy, hexyloxy, decyloxy, dodecyloxy, cyclopropyloxy, cyclobutyloxy, Cyclopentyloxy, cyclohexyloxy, cyclodecyloxy, cyclododecyloxy, fluorenyloxy 83 323323 201220574 The radicals in which one of the hydrogen atoms in the group is substituted with a substituent With or a group obtained by removing a 〇π23) hydrogen atom from a carbon atom having a substituent to another alkoxy group; and a group obtained by removing 2323) hydrogen atoms from an amine group having a substituent containing a carbon atom; A group obtained by removing (m23) hydrogen materials from a (four) towel having a minus group containing a carbon atom. Among these, from the viewpoint of easiness of synthesis of a raw material monomer, it is preferably removed from an alkyl group ( a group obtained by m23) a hydrogen atom, a group obtained by disposing (m23) hydrogen atoms from the aryl group, and a group obtained by removing (m23) hydrogen atoms from the alkoxy group. In the formula (30) The organic group having a (1+m24) valence represented by R22 may, for example, be a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a second butyl group or a third butyl group. a base, a pentyl group, a hexyl group, a cyclohexyl group, a heptyl group, an octyl group, a decyl group, a fluorenyl group, a lauryl group, a group having at least one hydrogen atom in the group substituted with a substituent, or the like, or the like a group obtained by removing (m24) hydrogen atoms from an alkyl group having 1 to 2 atomic atoms; from phenyl, naphthyl, 2-monomethyl, 1 fluorenyl, 2-indole a group obtained by removing (m24) hydrogen atoms from an aryl group having 6 to 30 carbon atoms or the like having a substituent of at least one hydrogen atom in the group, such as a group substituted with a substituent or the like Base; from methoxy, ethoxy, propoxy, butoxy, pentyloxy, hexyloxy, decyloxy, dodecyloxy, cyclopropyloxy, cyclobutyloxy a group, a cyclopentyloxy group, a cyclohexyloxy group, a cyclodecyloxy group, a cyclododecyloxy group, a benzyloxy group, an adamantyloxy group, at least one hydrogen atom in the group, a substituent a group obtained by removing (m24) hydrogen atoms from a hospitaloxy group having 1 to 50 carbon atoms with or without a substituent, such as a substituted group; and removing from an amine group having a substituent of 84 323323 201220574 containing a carbon atom a group obtained by (m24) a hydrogen atom; a group obtained by removing (m24) hydrogen atoms from a mercapto group having a substituent containing a carbon atom. Among these, from the viewpoint of easiness of synthesis of the raw material monomers, it is preferred to obtain a group obtained by removing (m24) hydrogen atoms from the alkyl group, and removing (m24) hydrogen atoms from the aryl group. The group obtained by removing (m24) hydrogen atoms from the alkoxy group. In the structural unit represented by the formula (30), a structure such as the following may be cited.

85 323323 20122057485 323323 201220574

+MOOC+MOOC

+MOOC+MOOC

+MOOC 0(CH2CH20)2CH3 0(CH2CH20)3CH3 0(CH2CH20)4CH3 M = Li, Na, K, Cs, NMe4 M = Li, Na. K, Cs, NMe4 M = Li, Na. K, Cs, NMe4+MOOC 0(CH2CH20)2CH3 0(CH2CH20)3CH3 0(CH2CH20)4CH3 M = Li, Na, K, Cs, NMe4 M = Li, Na. K, Cs, NMe4 M = Li, Na. K, Cs, NMe4

^OOC^OOC

+MOOC 0(CH2CH20)5CH3+MOOC 0(CH2CH20)5CH3

+MOOC 0(CH2CH20)6CH3 0(CH2CH20)tCH3 M = Li, Na, K, Cs, NMe4 M = Li, Naf K, Cs, NMe4 M = Li, Na, K, Cs, NMe4 •COO-M+ COO'M+ COO*M++MOOC 0(CH2CH20)6CH3 0(CH2CH20)tCH3 M = Li, Na, K, Cs, NMe4 M = Li, Naf K, Cs, NMe4 M = Li, Na, K, Cs, NMe4 •COO-M+ COO' M+ COO*M+

0(CH2CH20)2CH3 o(ch2ch2o)3ch3 o(ch2ch2o)4ch3 M = Li, Na, K, Cs, ΝΜθ4 M = Li, Na, K, Cs, ΝΜθ4 M = Li, Na, K, Cs, NMe40(CH2CH20)2CH3 o(ch2ch2o)3ch3 o(ch2ch2o)4ch3 M = Li, Na, K, Cs, ΝΜθ4 M = Li, Na, K, Cs, ΝΜθ4 M = Li, Na, K, Cs, NMe4

C〇〇-M+C〇〇-M+

C〇〇-M+C〇〇-M+

C〇〇-M+ 0(CH2CH20)5CH3 o(ch2ch2o)6ch3 o(ch2ch2o)7ch3 M = Li, Na, K, Cs, NMe4 M = Li, Na, K, Cs, NMe4 M = Li, Na, K, Cs, NMe4C〇〇-M+ 0(CH2CH20)5CH3 o(ch2ch2o)6ch3 o(ch2ch2o)7ch3 M = Li, Na, K, Cs, NMe4 M = Li, Na, K, Cs, NMe4 M = Li, Na, K, Cs, NMe4

'〇(〇^〇^〇)2(^3 了、o(ch2ch2o)3ch3 了 o(ch2ch2o&gt;4ch3 COO'M&quot;* COO'M+ COOM+ M = Lif Na, Kt Cs, NMe4 M = U, Na, K, Cs, NMe4 M = Li. Na, Kf Cs, ΝΜθ4'〇(〇^〇^〇)2(^3, o(ch2ch2o)3ch3 o(ch2ch2o&gt;4ch3 COO'M&quot;* COO'M+ COOM+ M = Lif Na, Kt Cs, NMe4 M = U, Na, K, Cs, NMe4 M = Li. Na, Kf Cs, ΝΜθ4

、0(CH2CH20)5CH3 y、0(CH2CH20)6CH3 了 0(CH2CH2〇hCH3 COO_M+ CO〇-M+ CO〇-M+ M = Li, Na, K, Cs, NMe4 M = Li, Nat K, Cs, NMe4 M = Li, Na, K, Cs, NMe4 0(CH2CH20)3CH3, 0(CH2CH20)5CH3 y, 0(CH2CH20)6CH3 0 (CH2CH2〇hCH3 COO_M+ CO〇-M+ CO〇-M+ M = Li, Na, K, Cs, NMe4 M = Li, Nat K, Cs, NMe4 M = Li, Na, K, Cs, NMe4 0(CH2CH20)3CH3

0(CH2CH20)2CH30(CH2CH20)2CH3

COO-M+ M = Li, Na, K, Cs, NMe4 0(CH2CH20)5CH3COO-M+ M = Li, Na, K, Cs, NMe4 0(CH2CH20)5CH3

COO.M+ M = Li, Na, K, Cs, NMe4 COOM+ M = Li, Na( K, Cs, NMe4 0(CH2CH20)6CH3COO.M+ M = Li, Na, K, Cs, NMe4 COOM+ M = Li, Na( K, Cs, NMe4 0(CH2CH20)6CH3

COO_M+ M = Li, Na, K, Cs, NMe4 o(ch2ch2o)4ch3COO_M+ M = Li, Na, K, Cs, NMe4 o(ch2ch2o)4ch3

COO-M4 M = Li, Na, K, Cs, NMe4 0(CH2CH20)7CH3 COO-M+ M = Lit Na, K, Cs, NMe4 〈式（20)所示之構造單元之例〉 86 323323 201220574 以式（20)所示之構造單元而言，從所得之電子傳輸性 之觀點來，，較佳為式（31)所示之構造單元。COO-M4 M = Li, Na, K, Cs, NMe4 0(CH2CH20)7CH3 COO-M+ M = Lit Na, K, Cs, NMe4 <Example of structural unit represented by formula (20) 86 323323 201220574 The structural unit shown in (20) is preferably a structural unit represented by the formula (31) from the viewpoint of the obtained electron transport property.

I Y3-(Q3)n3 m28 (31) m27 R234(Q2)nrY2(M2)a2(Z2)b2) [式（31)中’ R23表示單鍵或〇+m27)價的有機基，R24表示單 鍵或（1+m28)價的有機基，Q2、Q3、γ2、Μ2、Z2、Y3、n2、a2、 ® b2及n3表示與前述者相同之意義，m27及m28各自獨立地 表不1以上的整數；惟，R23為單鍵時，m27表示卜R24為 單鍵時 m28 表示 1 ;當 Q2、Q3、Y2、Μ2、Z2、Y3、n2、a2、b2 及n3各為複數個時，可為相同或相異。] 式（31)中’以R23所示之（l+m27)價的有機基而言，可 列舉例如：從甲基、乙基、丙基、異丙基、丁基、異丁基、 第一丁基、第三丁基、戊基、己基、環己基、庚基、辛基、I Y3-(Q3)n3 m28 (31) m27 R234(Q2)nrY2(M2)a2(Z2)b2) [In the formula (31), 'R23 represents a single bond or 〇+m27) valence organic group, R24 represents a single A bond or a (1+m28) valence organic group, Q2, Q3, γ2, Μ2, Z2, Y3, n2, a2, ® b2, and n3 have the same meanings as the above, and m27 and m28 each independently represent 1 or more. An integer; however, when R23 is a single bond, m27 indicates that m28 represents 1 when R24 is a single bond; and when Q2, Q3, Y2, Μ2, Z2, Y3, n2, a2, b2, and n3 are each plural, Same or different. In the formula (31), the organic group having a (l+m27) valence represented by R23 may, for example, be a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group or an isobutyl group. Monobutyl, tert-butyl, pentyl, hexyl, cyclohexyl, heptyl, octyl,

壬基、癸基、月桂基、此等基中的至少1個氫原子經取代 基取代的基等具有或不具有取代基之碳原子數i至 20的烧 基中去除（m27)個氫原子後所得的基；從苯基、卜萘基、2_ 萘基1 S基、2-蒽基、n基、此等基中的至少（個氫 原子、座取代基取代的基等具有或*具有取代基之碳原子數 6至30的芳基中去除（m27)個氫原子後所得的基；從曱氧 基、乙氧基、丙氧基、了氧基、戊基氧基、己基氧基、壬 基氧基、十二基氧基、環丙基氧基、環了基氧基、環戊基 氧基、環己基氧基、環*基氧基、環十二基氧基、范基氧 87 323323 201220574 基、金剛烷基氧基、此等基中的至少丨個氫原子經取代基 取代的基等具有或不具有取代基之碳原子數丨至5〇的烷^ 基中去除（m27)個氫原子後所得的基；從具有包含碳原子的 取代基之胺基中去除（m27)個氫原子後所得的基；從具有包 含碳原子的取代基之矽基中去除（m27)個氫原子後所得的 基。此等之中，從原料單體的合成容易度之觀點來看，較 佳為從烷基中去除（m27)個氫原子後所得的基、從芳基中去 • 除（ra27)個氫原子後所得的基、從烷氧基中去除（m27)個氫 原子後所得的基。 式（31)中，以R24所示之（1+m28)價的有機基而言，可 列舉例如：從曱基、乙基、丙基、異丙基、丁基、異丁基、 第二丁基、第三丁基、戊基、己基、環己基、庚基、辛美、 壬基、癸基、月桂基、此等基中的至少！個氫原子經^代 基取代的基等具有或不具有取代基之碳原子數1至2〇的尸 基中去除（m28)個氫原子後所得的基；從苯基、荠美2 萘基、1-S基、2-®基、9-1基、此等基中的至少i個氯 原子經取代基取代的基等具有或不具有取代基之碳原子數 6至30的芳基中去除（m28)個氫原子後所得的基^從 基、乙氧基、丙氧基、丁氧基、戊基氧基、己烏氧^ ^ 基氧基、十二基氧基、環丙基氧基、環丁基氧義四、 氧基、環己基氧基、環壬基氧基、環十二其 :、％戊基 一^丞乳基、范^基氣a mercapto group, a mercapto group, a lauryl group, a group in which at least one hydrogen atom in the group is substituted with a substituent, or the like, and a carbon atom having an alkyl group number i to 20 having or not having a substituent removes (m27) a hydrogen atom a group obtained from phenyl, phenylnaphthyl, 2-naphthyl 1 S group, 2-fluorenyl group, n group, or at least one of the hydrogen atoms and the substituents substituted with a substituent or the like a group obtained by removing (m27) hydrogen atoms from an aryl group having 6 to 30 carbon atoms; from a decyloxy group, an ethoxy group, a propoxy group, an oxy group, a pentyloxy group, a hexyloxy group, an anthracene group Alkoxy, dodecyloxy, cyclopropyloxy, cyclohexyloxy, cyclopentyloxy, cyclohexyloxy, cyclohexyloxy, cyclododecyloxy, vanyl oxygen 87 323323 201220574, adamantyloxy group, a group of at least one hydrogen atom in the group substituted with a substituent, etc., with or without a substituent, wherein the number of carbon atoms is from 5 to 5, and is removed (m27) a group obtained after one hydrogen atom; a group obtained by removing (m27) hydrogen atoms from an amine group having a substituent containing a carbon atom; having a carbon atom The group obtained by removing (m27) hydrogen atoms from the thiol group of the substituent. Among these, from the viewpoint of easiness of synthesis of the raw material monomers, it is preferred to remove (m27) hydrogen atoms from the alkyl group. The group obtained after that, the group obtained by removing (ra27) hydrogen atoms from the aryl group, and the group obtained by removing (m27) hydrogen atoms from the alkoxy group. In the formula (31), as shown by R24 The organic group of the (1+m28) valence may, for example, be an alkyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a second butyl group, a tert-butyl group or a pentyl group. , a hexyl group, a cyclohexyl group, a heptyl group, a octyl group, a decyl group, a fluorenyl group, a lauryl group, a group of at least one hydrogen atom in the group, such as a group substituted with a substituent, or the like, having 1 or a group obtained by removing (m28) hydrogen atoms from a cadaveric base of 2 Å; at least from a phenyl group, a fluorene 2 naphthyl group, a 1-S group, a 2-yl group, a 9-1 group, or the like a group obtained by removing a (m28)th hydrogen atom from an aryl group having 6 to 30 carbon atoms having or having a substituent, such as a group substituted with a substituent of a chlorine atom, having a substituent, etc., wherein the group is derived from an alkyl group, an ethoxy group, or a propoxy group. ,Ding Oxyl, pentyloxy, hexahydroxyloxy, dodecyloxy, cyclopropyloxy, cyclobutyloxytetra, oxy, cyclohexyloxy, cyclodecyloxy,环十二其:,% 戊基一丞丞乳基,范^基气

基、金剛烷基氧基、此等基中的至少1個氮原子奸 、&amp; 取代的基等具有或不具有取代基之碳原子數i至5二S 基中去除（m28)個氫原子後所得的基；從且古A ^ 、兀 攸具有包含碳原子的 323323 88 201220574 取代基之胺基中去除（m28)個氫原子後所得的基；從具有包 含碳原子的取代基之石夕基中去除（m2g)個氫原子後所得的 基。此等之中，從原料單體的合成容易度之觀點來看，較 佳為從烷基中去除（m28)個氫原子後所得的基、從芳基中去 除（m28)個氫原子後所得的基、從烷氧基中去除（m28)個氫 原子後所得的基。 以式（31)所示之構造單元而言，可列舉如以下之構造a group, an adamantyloxy group, at least one nitrogen atom in such a group, a substituted group, etc., having or having no substituent, a number of carbon atoms i to 5, a second S group, and (m28) hydrogen atoms are removed. a group obtained after removing (m28) hydrogen atoms from the amine group of the 323323 88 201220574 substituent having a carbon atom; and a stone eve having a substituent containing a carbon atom A group obtained by removing (m2g) hydrogen atoms from the group. Among these, from the viewpoint of easiness of synthesis of the raw material monomers, it is preferred to obtain a group obtained by removing (m28) hydrogen atoms from the alkyl group, and removing (m28) hydrogen atoms from the aryl group. A group obtained by removing (m28) hydrogen atoms from an alkoxy group. In the structural unit represented by the formula (31), the following construction is exemplified

〇〇 — 單兀。〇〇 — Single 兀.

{N(CH3)2CH2CH3}+X- X = F. a, Br, I. BPh4, CF3S〇3. CH3COO X = F, a, Br, I, BPh4, CF3SO3, CH3COO{N(CH3)2CH2CH3}+X- X = F. a, Br, I. BPh4, CF3S〇3. CH3COO X = F, a, Br, I, BPh4, CF3SO3, CH3COO

H3C(OH2CH2Ch〇 (〒)8 X = F, Q, Br, I, BPh4, CF3SO3, CH3COOH3C(OH2CH2Ch〇(〒)8 X = F, Q, Br, I, BPh4, CF3SO3, CH3COO

H3C(0_2C)30 (㈣ X = F, a, Br,l, BPh4, CF3S〇3, CH3COO \{N(CH3)2CH2CerX· 以式（20)所示之構造單元而言，從所得之離子性聚合 物的耐久性之觀點來看’較佳為式（32)所示之構造單元。H3C(0_2C)30 ((4) X = F, a, Br, l, BPh4, CF3S〇3, CH3COO \{N(CH3)2CH2CerX· From the structural unit represented by the formula (20), the ionicity obtained from From the viewpoint of the durability of the polymer, 'the structural unit represented by the formula (32) is preferable.

m31 严h(Q2)n2-Y2(M2)a2(Z2)b2] m2g ) (32) R26十(〇Vy3 m30 m32 [式（32)中’ R25表示單鍵或（i+m29)價的有機基，r26表示單 鍵或（l+m30)價的有機基，q2、q3、γ2、μ2、z2、Y3、n2、a2、 89 323323 201220574 b2及n3表示與前述者相同之意義，m29及m30各自獨立地 表示1以上的整數；惟，R25為單鍵時，m29表示1，r26為 早鍵時ιπ30表不1，πι31及ιη32各自獨立地表不1以卜的整 數，當 m29、m30、R25、R26、Q2、Q3、γ2、Μ2、Ζ2、γ3、η2、 a2、b2及η3各為複數個時，可為相同或相異。] 式（32)中，以R25所示之（1+ιη29)價的有機基而言，可 列舉例如：從曱基、乙基、丙基、異丙基、丁基、異丁基、 ^ 第二丁基、第三丁基、戊基、己基、環己基、庚基、辛基、 壬基、癸基、月桂基、此等基中的至少1個氫原子經取代 基取代的基等具有或不具有取代基之碳原子數1至20的烧 基中去除（m29)個氫原子後所得的基；從苯基、1-萘基、2_ 萘基、1-蒽基、2-蒽基、9-蒽基、此等基中的至少1個氣 原子經取代基取代的基等具有或不具有取代基之碳原子數 6至30的芳基中去除（m29)個氫原子後所得的基；從曱氧 基、乙氧基、丙氧基、丁氧基、戊基氧基、己基氧基、壬 基氧基、十一基氧基、壤丙基氧基、環丁基氧基、環戊基 氧基、環己基氧基、環壬基氧基、環十二基氧基、宿基氧 基金剛烧基乳基、此荨基中的至少1個氮原子經取代基 取代的基等具有或不具有取代基之碳原子數1至5〇的烷氧 基中去除（m29)個氫原子後所得的基;從具有包含碳原子的 取代基之胺基中去除（m29)個氫原子後所得的基；從具有包 含碳原子的取代基之矽基中去除（m 2 9 )個氫原子後所得的 基。此等之中，從原料單體的合成容易度之觀點來看，較 佳為從烷基中去除（m29)個氫原子後所得的基、從芳基中去 90 323323 201220574 除（m29)個氫原子後所得的基、從烷氧基中去除（m29)個氫 原子後所得的基。 式（32)中，以R26所示之（i+m30)價的有機基而言，可 列舉例如·從曱基、乙基、丙基、異丙基、丁基、異丁基、 第二丁基、第三丁基、戊基、己基、環己基、庚基、辛基、 壬基癸基、月桂基、此等基中的至少1個氫原子經取代 基取代的基等具有或不具有取代基之碳原子數1至的烧 • 基中去除（m30)個氫原子後所得的基；從苯基、卜萘基、2_ 萘基、1-蒽基、基、此等基巾的至少i個氯 原子經取代基取代的基等具有或不具有取代基之碳原子數 6至30的芳基中去除（m30)個氫原子後所得的基；從曱氧 基、乙氧基、丙氧基、丁氧基、戊基氧基、己基氧基、壬 基氧基、十二基氧基、環丙基氧基、環丁基氧基、環戊基 氧基、環己基氧基、環壬基氧基、環十二基氧基、萡基氧 基、金剛烷基氧基、此等基中的至少丨個氫原子經取代基 •取代的基等具有或不具有取代基之碳原子數1至50的烷氧 基中去除（m30)個氫原子後所得的基；從具有包含碳原子的 取代基之胺基中去除（m30)個氫原子後所得的基；從具有包 含碳原子的取代基之矽基中去除（m3〇)個氫原子後所得的 基。此等之中，從原料單體的合成容易度之觀點來看，較 佳為從院基中去除（m3〇)個氫原子後所得的基、從芳基中去 除（m30)個氫原子後所得的基、從烷氧基中去除（m3〇)個氫 原子後所得的基。 以式（32)所示之構造單元而言，可列舉如以下之構造 323323 91 201220574M31 严h(Q2)n2-Y2(M2)a2(Z2)b2] m2g ) (32) R26 ten (〇Vy3 m30 m32 [in the formula (32), R25 represents a single bond or (i+m29) valence organic Base, r26 represents a single bond or (l+m30) valence organic group, q2, q3, γ2, μ2, z2, Y3, n2, a2, 89 323323 201220574 b2 and n3 represent the same meaning as the foregoing, m29 and m30 Each of them independently represents an integer of 1 or more; however, when R25 is a single bond, m29 represents 1, and when r26 is an early bond, iππ30 is not 1, and πι31 and ιη32 each independently represent an integer of 1 to m, when m29, m30, R25 When R26, Q2, Q3, γ2, Μ2, Ζ2, γ3, η2, a2, b2, and η3 are each plural, they may be the same or different. In the formula (32), as shown by R25 (1+) The oxime 29) valence organic group may, for example, be an alkyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a ^2nd butyl group, a tert-butyl group, a pentyl group or a hexyl group. a cyclohexyl group, a heptyl group, an octyl group, a decyl group, a fluorenyl group, a lauryl group, a group having at least one hydrogen atom in the group substituted with a substituent, etc., having or having a substituent, having 1 to 20 carbon atoms. After removing (m29) hydrogen atoms from the base a group derived from a phenyl group, a 1-naphthyl group, a 2-naphthyl group, a 1-indenyl group, a 2-indenyl group, a 9-fluorenyl group, a group in which at least one gas atom in the group is substituted with a substituent, etc. a group obtained by removing (m29) hydrogen atoms from an aryl group having 6 to 30 carbon atoms having a substituent; from a decyloxy group, an ethoxy group, a propoxy group, a butoxy group, a pentyloxy group, a hexyloxy group Base, decyloxy, undecyloxy, propyloxy, cyclobutyloxy, cyclopentyloxy, cyclohexyloxy, cyclodecyloxy, cyclododecyloxy, s (m29) alkoxy group having a carbon atom number of 1 to 5 Å having or having no substituent, such as a group substituted with a substituent of at least one nitrogen atom in the fluorenyl group a group obtained after a hydrogen atom; a group obtained by removing (m29) hydrogen atoms from an amine group having a substituent containing a carbon atom; and removing (m 2 9 ) from a mercapto group having a substituent containing a carbon atom A group obtained by a hydrogen atom. Among these, from the viewpoint of easiness of synthesis of a raw material monomer, a group obtained by removing (m29) hydrogen atoms from an alkyl group is preferred. 90 323323 201220574 A group obtained by removing (m29) hydrogen atoms and removing (m29) hydrogen atoms from the alkoxy group. In the formula (32), (i+m30) is represented by R26. The valence organic group may, for example, be a fluorenyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a second butyl group, a tert-butyl group, a pentyl group, a hexyl group or a cyclohexyl group. a heptyl group, an octyl group, a decyl fluorenyl group, a lauryl group, a group in which at least one hydrogen atom in the group is substituted with a substituent, etc., with or without a substituent, wherein the number of carbon atoms is 1 to be removed ( a group obtained by m30) a hydrogen atom; a group substituted with a substituent such as a phenyl group, a naphthyl group, a 2-naphthyl group, a 1-fluorenyl group, a group, or at least one chlorine atom of the base sheets, with or without a substituent a group obtained by removing (m30) hydrogen atoms from an aryl group having 6 to 30 carbon atoms; from an anthraceneoxy group, an ethoxy group, a propoxy group, a butoxy group, a pentyloxy group, a hexyloxy group, an anthracene group Alkoxy, dodecyloxy, cyclopropyloxy, cyclobutyloxy, cyclopentyloxy, cyclohexyloxy, cyclodecyloxy, cyclododecyloxy, fluorenyl The oxy group, the adamantyloxy group, at least one hydrogen atom in the group, and the alkoxy group having 1 to 50 carbon atoms with or without a substituent, such as a substituent or a substituted group, are removed (m30) a group obtained after a hydrogen atom; a group obtained by removing (m30) hydrogen atoms from an amine group having a substituent containing a carbon atom; and removing (m3 〇) hydrogen from a thiol group having a substituent containing a carbon atom The base obtained after the atom. Among these, from the viewpoint of easiness of synthesis of the raw material monomers, it is preferred to remove the (m3〇) hydrogen atoms from the hospital base and remove the (m30) hydrogen atoms from the aryl group. The obtained group is a group obtained by removing (m3 〇) hydrogen atoms from an alkoxy group. The structural unit represented by the formula (32) can be exemplified by the following structure: 323323 91 201220574

單元。 •^{HaCHaCCH^CfeN}unit. •^{HaCHaCCH^CfeN}

Χ*{^ΟΗ2〇(Η3〇)2Ν)Χ*{^ΟΗ2〇(Η3〇)2Ν)

-^{HaCHaCiHaOaN}-^{HaCHaCiHaOaN}

CXCH2CH20)2CH3 X = F, Cl, Br, i BPh4, CF3SO3, CH3COOCXCH2CH20)2CH3 X = F, Cl, Br, i BPh4, CF3SO3, CH3COO

0(ΟΗ2ΟΗ20)5〇Η3 X = F, Cl, Br, I, BPh4, CF3SO3, CH3COO CXCH2CH20)4CH3 X = F, a, Br, I, BPh4, CF3S〇3, CH3C000(ΟΗ2ΟΗ20)5〇Η3 X = F, Cl, Br, I, BPh4, CF3SO3, CH3COO CXCH2CH20)4CH3 X = F, a, Br, I, BPh4, CF3S〇3, CH3C00

0(CH2CH20)5CH3 X = F, Cl, Br, l BPhi· CF3SO3, CH3COO0(CH2CH20)5CH3 X = F, Cl, Br, l BPhi· CF3SO3, CH3COO

0(CH2CH20&gt;2CH3 X = F, Cl, Br, I, BPh4, CF3SO3. CH3COO {NiCHsk^CHa}^·0(CH2CH20&gt;2CH3 X = F, Cl, Br, I, BPh4, CF3SO3. CH3COO {NiCHsk^CHa}^·

0(CH2CH20)5CH3 X = F, Cl, Brt I, BPh4, CF3SO3, CH3CCX) {NiChfelzCHaCHa)^-0(CH2CH20)5CH3 X = F, Cl, Brt I, BPh4, CF3SO3, CH3CCX) {NiChfelzCHaCHa)^-

CXCH2CH2〇)2CH3 {NtCHsfeCHaCHaJ'X· X = F, Cl, IBr, 1« BPh4, CF3SO3, CH3COOCXCH2CH2〇)2CH3 {NtCHsfeCHaCHaJ'X· X = F, Cl, IBr, 1« BPh4, CF3SO3, CH3COO

0(CH2CH20)sCH3 iNtCh^O^CHaJ^ X = F, Cl, Br, I, BPh4, CF3S〇s，CH3COO 0(CH2CH2〇)2CH30(CH2CH20)sCH3 iNtCh^O^CHaJ^ X = F, Cl, Br, I, BPh4, CF3S〇s, CH3COO 0(CH2CH2〇)2CH3

{NfCHsJaCHaCHa}^ X = F, Cl, Br, BPh4, CF3SO3, CH3COO 0(CH2CH20)5CH3{NfCHsJaCHaCHa}^ X = F, Cl, Br, BPh4, CF3SO3, CH3COO 0(CH2CH20)5CH3

•X+{H3CH2C(H3C)2N}•X+{H3CH2C(H3C)2N}

OiCHzCHzOjBCHa X = F, Cl, Br, 1* BRu, CF3SO3· CH3COO 0iCH2CH2O)7CH3 X = F, a, Br, I, BPh4. CF3SO3. CH3COO {N(CH3)2CH2CH3}+X·OiCHzCHzOjBCHa X = F, Cl, Br, 1* BRu, CF3SO3·CH3COO 0iCH2CH2O)7CH3 X = F, a, Br, I, BPh4. CF3SO3. CH3COO {N(CH3)2CH2CH3}+X·

0(CH2CH20)3CH3 X = F, Cl, Br, I, BPh4, CF3SQ3, CH3COO {NiC^feCHzCH^*0(CH2CH20)3CH3 X = F, Cl, Br, I, BPh4, CF3SQ3, CH3COO {NiC^feCHzCH^*

0(CH2CH20)4CH3 X = F, a, Br, I, BPh4. CF3SQ3, CH3COO {NCCt^feCHzCHa^X·0(CH2CH20)4CH3 X = F, a, Br, I, BPh4. CF3SQ3, CH3COO {NCCt^feCHzCHa^X·

Όί〇Η2〇Η2〇)βΟΗ3 0CCH2CH2O)7CH3 X = F, Cl, ΒγΛ BPfu, CF3SQ3, CH3COO X = F, O, Br. I, BPh4. CF3SQ3. CH3COOΌί〇Η2〇Η2〇)βΟΗ3 0CCH2CH2O)7CH3 X = F, Cl, ΒγΛ BPfu, CF3SQ3, CH3COO X = F, O, Br. I, BPh4. CF3SQ3. CH3COO

0(CH2CH20)3CH3{NiCHaJz^CHa}^ X = F, Cl, Br, I, BPfv CF3SO3, CH3COO0(CH2CH20)3CH3{NiCHaJz^CHa}^ X = F, Cl, Br, I, BPfv CF3SO3, CH3COO

0(CH2CH2〇UC呔 {NCCHaifeCHzCH^V X = F, a, Br, I, BPh4, CF3SO3, CH3COO0(CH2CH2〇UC呔 {NCCHaifeCHzCH^V X = F, a, Br, I, BPh4, CF3SO3, CH3COO

0(ΟΗ2〇Η20)6〇Η3 {NtCHafcCHaCHi'X· X = F, Cl, Br, 1, BPh4, CF3SO3, CH3COO 0(〇Η2ΟΗ2〇)3〇Η30(ΟΗ2〇Η20)6〇Η3 {NtCHafcCHaCHi'X· X = F, Cl, Br, 1, BPh4, CF3SO3, CH3COO 0(〇Η2ΟΗ2〇)3〇Η3

0(CH2CH2〇)7C^ WCH^a^CHa}4^ X = F, a, Br, I, BPh4, CF3SO3, CH3COO 0(CH2CH20)4CH30(CH2CH2〇)7C^ WCH^a^CHa}4^ X = F, a, Br, I, BPh4, CF3SO3, CH3COO 0(CH2CH20)4CH3

X = F, Cl, Br, I, BPh4, CF3SO3, CH3COO 0(CH2CH20)eCH3X = F, Cl, Br, I, BPh4, CF3SO3, CH3COO 0(CH2CH20)eCH3

{NtC^^CHaCHa}^ X = F, a, 8r, I, BPh4, CF3S〇3, CH3COO 0(CH2CH2〇)7CH3{NtC^^CHaCHa}^ X = F, a, 8r, I, BPh4, CF3S〇3, CH3COO 0(CH2CH2〇)7CH3

{N(CH3)2CH2CH3pC X = F, Cl, Br, I, BPh4, CF^Ch，CH3COO 〈其他的構造單元〉 {NtCH^CHsCHa}*^ {NtChfefeCHzCHa}^ X = F, Cl, Br, I, BPh4l CF3SO3, CH3COO X = F. Q. Br, I, BR^, CF3SO3. CHgCCX) 本發明所使用之離子性聚合物，可復具有式（33)所示 92 323323 (33) (33)201220574 之1種以上的構造單元。{N(CH3)2CH2CH3pC X = F, Cl, Br, I, BPh4, CF^Ch, CH3COO <Other structural units> {NtCH^CHsCHa}*^ {NtChfefeCHzCHa}^ X = F, Cl, Br, I, BPh4l CF3SO3, CH3COO X = FQ Br, I, BR^, CF3SO3. CHgCCX) The ionic polymer used in the present invention may have one or more of 92 323323 (33) (33) 201220574 represented by the formula (33). Construction unit.

[式（33)中，Ar5表示具有或不具有取代基的2價芳香族基、 或是具有或不具有取代基的2價芳香族胺殘基，X’表示具 有或不具有取代基的亞胺基、具有或不具有取代基的亞矽 基、具有或不具有取代基的伸乙烯基、或伸乙炔基，m33 及m34分別獨立地表示0或1，m33及m34之至少1者為1。] 以式（33)中之Ar5所示之2價芳香族基而言，可列舉如 2價的芳香族烴基、2價的芳香族雜環基。以該2價芳香族 基而言，可列舉例如：從苯環、吡啶環、1，2-二畊環、1，3-二畊環、1，4-二畊環、1，3, 5-三畊環、呋喃環、吼咯環、 嗟吩環、°比β坐環、σ米β坐環、曙β坐環、曙二β坐環、°丫二嗤環 等單環式芳香環中去除2個氫原子後所得的2價基；從選 自該單環式芳香環所成群組中的二個以上所縮合成的縮合 多環式芳香環中去除2個氫原子後所得的2價基；從將選 自該單環式芳香環及該縮合多環式芳香環所成群組中2個 以上的芳香環以單鍵、伸乙烯基或伸乙炔基連結而成之芳 香環集合中去除2個氫原子後所得的2價基；從具有將該 縮合多環式芳香環或該芳香環集合之相鄰之2個芳香環以 亞曱基、伸乙基、羰基、亞胺基等2價基進行聯結而成之 橋聯的橋聯多環式芳香環中去除2個氫原子後所得的2價 基等。 前述縮合多環式芳香環中，所縮合之單環式芳香環的 93 323323 201220574 數目’從離子性聚合物的溶雜錢點來看，較佳為 :，更佳為2至3,又更佳為2。前述芳香環集合中’: 、’、。之务香環的數目，從溶解性之觀點來看，較連 更佳為2至3，又更佳為9 乂 n 至4 ’ •的聯多環式芳香環中，所 〜的方香衣的數目，從離子性聚[In the formula (33), Ar5 represents a divalent aromatic group having or not having a substituent, or a divalent aromatic amine residue having or not having a substituent, and X' represents a subunit having or not having a substituent. An amine group, an anthracene group having or not having a substituent, a vinyl group having a substituent or a ethynyl group, m33 and m34 each independently represent 0 or 1, and at least one of m33 and m34 is 1 . The divalent aromatic group represented by Ar5 in the formula (33) may, for example, be a divalent aromatic hydrocarbon group or a divalent aromatic heterocyclic group. Examples of the divalent aromatic group include a benzene ring, a pyridine ring, a 1,2-two tillage ring, a 1,3-two tillage ring, a 1,4-two tillage ring, and 1,3,5. - Three-ring aromatic ring, three-ring ring, furan ring, fluorene ring, porphin ring, ° ratio β ring, σ m β ring, 曙β ring, 曙ββ ring, °丫丫 ring a divalent group obtained by removing two hydrogen atoms; and two hydrogen atoms are removed from two or more condensed polycyclic aromatic rings condensed in a group selected from the group consisting of the monocyclic aromatic rings a valent group; an aromatic ring in which two or more aromatic rings selected from the group consisting of the monocyclic aromatic ring and the condensed polycyclic aromatic ring are bonded by a single bond, a vinyl group or an ethynyl group; a divalent group obtained by removing two hydrogen atoms in the collection; from the adjacent two aromatic rings having the condensed polycyclic aromatic ring or the aromatic ring group, an anthracene group, an ethyl group, a carbonyl group, an imine group A divalent group obtained by removing two hydrogen atoms in a bridged polycyclic aromatic ring in which a bivalent group such as a base is bonded. In the above condensed polycyclic aromatic ring, the number of condensed monocyclic aromatic rings 93 323323 201220574 'from the point of view of the ionic polymer, preferably: more preferably 2 to 3, and more Good for 2. ': , ', in the aforementioned aromatic ring set. The number of the fragrant rings of the scented scented scented scented scented scented scented scented scented scented scented scented scented scented scented scented scented scented scented scented scented scented scented Number, from ionic aggregation

fsT 49 看，較佳為2至4,更佳為2至3，又^解性之觀點來 二述單又式=環而，’可舉例如《下的環。 Η 58fsT 49 shows that it is preferably 2 to 4, more preferably 2 to 3, and the viewpoint of the solvability is two, and the formula is as follows. Η 58

而言’可舉例如以下的 0 以前述縮合多ί裒式芳香環 環For example, the following 0 may be exemplified by the above condensation condensed aromatic ring

94 20122057494 201220574

以前述橋聯多環式芳香環而言，可舉例如以下的環。 95 323323 201220574The bridged polycyclic aromatic ring may, for example, be the following ring. 95 323323 201220574

從前述離子性聚合物的電子接受性及電洞接受性中之 任一方或兩方之觀點來看，Ar5所示之2價芳香族基較佳為 從式 45 至 60、61 至 71、77 至 80、91、92、93 或 96 所示From the viewpoints of either or both of electron acceptability and hole acceptability of the ionic polymer, the divalent aromatic group represented by Ar5 is preferably from the formulas 45 to 60, 61 to 71, 77. As shown in 80, 91, 92, 93 or 96

之環中去除2個氫原子後所得的2價基，更佳為從式45至 5〇、59、60、77、80、9卜92或96所示之環中去除2個 氩原子後所得的2價基。 上述2價芳香族基亦可具有取代基。以該取代基而 言’可列舉如與前述Q1相關說明中所例示之取代基相同的 取代基。 以式（33)中之Ar5所示之2價的芳香族胺殘基而言，可 歹1J舉如式（34)所示之基。 96 323323 (34)201220574 -N—]-Ar8 I ；nl0 Ar10The divalent group obtained by removing two hydrogen atoms in the ring, more preferably obtained by removing two argon atoms from the ring represented by formula 45 to 5, 59, 60, 77, 80, 9 or 92 or 96 The 2 valence base. The above divalent aromatic group may have a substituent. In the case of the substituent, the same substituents as those exemplified in the description of Q1 above can be cited. In the case of the divalent aromatic amine residue represented by Ar5 in the formula (33), the group represented by the formula (34) can be used. 96 323323 (34)201220574 -N—]-Ar8 I ;nl0 Ar10

[式（34)中，Ar6、Ar7、Ar8及Ar9係各自獨立地表示具有或 不具有取代基的伸芳基、或是具有或不具有取代基的2價 雜環基’ Ar1(1、Ar11及Ar12係各自獨立地表示具有或不具有 取代基的芳基、或是具有或不具有取代基的1價雜環基， nlO及m35係各自獨立地表示〇或j。][In the formula (34), Ar6, Ar7, Ar8 and Ar9 each independently represent an extended aryl group having or not having a substituent, or a divalent heterocyclic group 'Ar1 having or not having a substituent' (Ar11) And Ar12 each independently represents an aryl group having or not having a substituent, or a monovalent heterocyclic group having or not having a substituent, and n10 and m35 each independently represent 〇 or j.]

Ar7- 、—^ m35 Ar12 以剛述伸芳基、芳基、2價雜環基、1價雜環基可具有 之取代基而言’可列舉例如：_原子、烷基、烷基氧基、 烷基硫基、芳基、芳基氧基、芳基硫基、芳基烷基、芳基 烷基氧基、芳基烷基硫基、烯基、炔基、芳基烯基、芳基 炔基、醯基、醯基氧基、醯胺基、醯亞胺基、亞胺殘基、 取代胺基、取代矽基、取代矽基氧基、取代矽基硫基、取 代矽基胺基、氰基、硝基、1價雜環基、雜芳基氧基、雜 芳基硫基、烷基氧基羰基、芳基氧基羰基、芳基烷基氧基 羰基、雜芳基氧基羰基及羧基等。該取代基亦可為乙烯基、 乙炔基、丁稀基、丙嫦醯基、丙烯酸酯基、丙稀醯胺基、 甲基丙烯醯基、曱基丙烯酸酯基、曱基丙烯醯胺基、乙烯 醚基、乙烯胺基、矽醇基、具有小員環（環丙基、環丁基、 環氧基、氧雜環丁烷基（〇xetane group)、倍羰烯基 (diketene group)、環硫化物基（episulfide group)等） 97 323323 201220574 之基、内酯基、内醯胺基、 基等交聯基。 或含有矽氧烷衍生物之構造的 子鍵ΐη1Γ°:ήΑΓ6中的碳原子可直接與Ar8中的破廣 子鍵…’亦可經由-0-、_s—等2價基而鍵結。 以Ar1。、Ar11、Ar12所示之芳基、丨價雜 與前述作，取代基而朗例示之芳基、i價雜;基:同？、Ar7-, -^ m35 Ar12 In the case of a substituent which the aryl group, the aryl group, the divalent heterocyclic group, and the monovalent heterocyclic group may have, 'for example, an atom, an alkyl group, an alkyloxy group , alkylthio, aryl, aryloxy, arylthio, arylalkyl, arylalkyloxy, arylalkylthio, alkenyl, alkynyl, arylalkenyl, aryl Alkynyl, fluorenyl, decyloxy, decylamino, quinone imine, imine residue, substituted amine, substituted fluorenyl, substituted fluorenyloxy, substituted fluorenylthio, substituted decylamine , cyano, nitro, monovalent heterocyclic, heteroaryloxy, heteroarylthio, alkyloxycarbonyl, aryloxycarbonyl, arylalkyloxycarbonyl, heteroaryloxy A carbonyl group, a carboxyl group, and the like. The substituent may also be a vinyl group, an ethynyl group, a butylene group, a propyl group, an acrylate group, an acrylamide group, a methacryl oxime group, a decyl acrylate group, a mercapto acrylamide group, a vinyl ether group, a vinylamine group, a decyl group, having a small member ring (cyclopropyl group, cyclobutyl group, epoxy group, oxetane group, diketene group, Ethylene sulfide group (episulfide group), etc. 97 323323 201220574 The base, lactone group, indoleamine group, group and the like crosslinking group. Or a sub-bond ΐη1Γ° having a structure containing a decane derivative: the carbon atom in ήΑΓ6 may be bonded directly to the bromine bond in Ar8... or may be bonded via a valence group such as -0-, _s-. Take Ar1. The aryl group represented by Ar11 and Ar12, and the valence of the oxime are the same as those described above, and the aryl group and the i-valent hydride are exemplified by the substituent; ,

^^、^、^、^所示之伸芳基而言’可列舉如從 =香麵中去除2個鍵結於構成芳香環的碳原子的氣原子 ^所殘留的原子團’並可列舉如具有笨環的基、具有縮合 J衣的基、由2個以上獨立之苯環或縮合環經由單鍵或2價 有機基（例如伸乙烯基等伸烯基）而鍵結成的基等。伸芳基 之碳原子數通常為6至60，較佳為7至48。以伸芳基的具 體例=言，可列舉例如：伸苯基、伸聯苯基、（^至。烷氧 伸本基、Ci至Cn烧基伸苯基、1-伸萘基、2-伸萘基、ι_ 1申蒽基、2-伸蒽基、9-伸蒽基。前述伸芳基中的氫原子亦 、、^氟原子取代。以該經氟原子取代之伸芳基而言，可列 舉如四氟伸苯基等。伸芳基中，較佳為伸苯基、伸聯苯基、 ^至C!2貌氧基伸苯基、（^至C12烷基伸苯基。 以Ar6、Ar7、Ar8、Ar9所示之2價雜環基而言，可列舉 如從雜環式化合物中去除2個氫原子後所殘留的原子團。 在此’雜環式化合物係指在具有環式構造的有機化合物 =，構成環的元素不僅為碳原子，亦包含氧原子、硫原子、 氮原子、磷原子、硼原子、矽原子、硒原子、碲原子、砷 原子等雜原子的有機化合物。2價雜環基亦可具有取代基。 98 323323 201220574 2價雜環基之碳原子數通常為4至60,較佳為4至20。又， 2價雜環基之碳原子數不包含取代基的碳原子數。以如此 之2價雜環基而言，可列舉例如：噻吩二基、G至C12烷基 。塞吩二基、吼洛二基、咬喃二基、η比唆二基、匕至Cl2烧基 0比咬二基、塔啡二基、嘴唆二基、σ比啡二基、三哄二基、 β比洛°定二基、派唆二基、喧#二基、異啥琳二基，其中， 更佳為噻吩二基、Cl至C12烷基噻吩二基、吡啶二基及Cl ^ 至C12烷基吡啶二基。 包含2價芳香族胺殘基作為構造單元的離子性聚合物 可復具有其他的構造單元。以其他的構造單元而言，可列 舉例如：伸苯基、第二基等伸芳基等。又，此等離子性聚 合物中，較佳為包含交聯基者。 此外，以式（34)所示之2價的芳香族胺殘基而言，係 例示為從下述式101至110所示之芳香族胺中去除2個氳 原子後所得的基。 99 323323 201220574In the case of the extended aryl group represented by ^^, ^, ^, and ^, for example, the atomic group remaining by the two gas atoms bonded to the carbon atom constituting the aromatic ring is removed from the scented surface, and may be enumerated as A group having a stupid ring, a group having a condensed J coat, a group bonded by two or more independent benzene rings or a condensed ring via a single bond or a divalent organic group (for example, an alkenyl group such as a vinyl group). The number of carbon atoms of the aryl group is usually from 6 to 60, preferably from 7 to 48. Specific examples of the aryl group include, for example, a phenyl group, a phenyl group, a hydrazine group, a Ci to Cn alkyl group, a 1-naphthyl group, and a 2-stretching group. a naphthyl group, an ι-1 fluorenyl group, a 2-extended fluorenyl group, and a 9-extended fluorenyl group. The hydrogen atom in the above-mentioned aryl group is also substituted with a fluorine atom, and the aryl group substituted by the fluorine atom may be enumerated. For example, tetrafluorophenylene, etc.. In the aryl group, it is preferably a phenyl group, a phenyl group, a phenyl group, a phenyl group, a phenyl group, and a phenyl group. Examples of the divalent heterocyclic group represented by Ar8 and Ar9 include an atomic group remaining after removing two hydrogen atoms from the heterocyclic compound. Here, the 'heterocyclic compound means an organic group having a cyclic structure. Compound = an organic compound which is not only a carbon atom but also a hetero atom such as an oxygen atom, a sulfur atom, a nitrogen atom, a phosphorus atom, a boron atom, a ruthenium atom, a selenium atom, a ruthenium atom or an arsenic atom. The cyclic group may have a substituent. 98 323323 201220574 The divalent heterocyclic group usually has 4 to 60, preferably 4 to 20 carbon atoms. Further, a divalent heterocyclic group The number of atoms does not include the number of carbon atoms of the substituent. Examples of such a bivalent heterocyclic group include a thiophenediyl group and a G to C12 alkyl group. The phenophenanyl group, the fluorenyl group, and the sulfonate group. , η than 唆 基 匕, 匕 to Cl 2 基 0 咬 二 base, tardidin, 唆 唆 基, σ 啡 啡 啡 哄 哄 哄 β β β β β β β β β Further, it is preferably a thiophenediyl group, a Cl to C12 alkylthiophenediyl group, a pyridyldiyl group and a Cl^ to C12 alkylpyridinium group. The ionic polymer having an amine residue as a structural unit may have other structural units. Examples of other structural units include a phenyl group, a second group, and the like, and further, the ionic polymerization. In addition, the divalent aromatic amine residue represented by the formula (34) is exemplified as the aromatic amine represented by the following formulas 101 to 110. The base obtained after removing two deuterium atoms. 99 323323 201220574

108108

lfl9Lfl9

us 式101至110所示之芳香族胺’亦可在能產生2價芳 香族胺殘基之範圍内具有取代基，該取代基可列舉如與前 述Q1相關說明中所例示之取代基相同的取代基，當存在複 數個取代基時，該等可為相同或相異。The aromatic amine ' represented by the formula 101 to 110 may have a substituent in the range capable of generating a divalent aromatic amine residue, and the substituent may be the same as the substituent exemplified in the above-mentioned Q1 related description. Substituents, when plural substituents are present, these may be the same or different.

式（33)中’ X’表示具有或不具有取代基之亞胺基、具 有或不具有取代基之亞矽基、具有或不具有取代基之伸乙 烯基、或伸乙炔基。以亞胺基、亞矽基或伸乙烯基可具有 之取代基而言，可列舉例如：甲基、乙基、丙基、異丙基、 丁基、異丁基、第二丁基、第三丁基、戊基、己基、環己 基、庚基、辛基、2-乙基己基、壬基、癸基、3 7—二甲基 辛基、月桂基等碳原子數！至20的烷基；苯基、卜萘基^ 2~萘基、1-蒽基、2_蒽基、9_蒽基等碳原子數6至3〇 ^芳 基等。當存在複數個取代基時，該等可為相同或相異。 323323 100 201220574 從則述離子性聚合物對於空氣、濕氣或熱的安定性之 _看，X，較佳為亞胺基、伸乙烯基、伸乙块基。 從則述離子性聚合物之電子接受性、電洞接受性之觀 點來看，較佳係m33為1且m34為〇。 以式（33)所不之構造單元而言，從前述離子性聚合物 之電J接文性之觀點來看，較佳為式（35)所示之構造單元。 [式（3〇)中，Ar13表示具有或不具有取代基之吡啶二基、且 有或不具有取代基之n比哄二基、具有或不具有取代基之嘴 啶二基、具有或不具有取代基之嗒畊二基、或是具有或不 具有取代基之三啡二基。] 以吡啶二基可具有之取代基而言，可列舉如與前述Qi 相關說明中所例示之取代基相同的取代基。當存在複數個 取代基時’該等可為相同或相異。 # 以咣啡二基可具有之取代基而言，可列舉如與前述Q1 相關說明中所例示之取代基相同的取代基。當存在複數個 取代基時，該等可為相同或相異。 以嘧啶二基可具有之取代基而言，可列舉如與前述Q1 相關說明中所例示之取代基相同的取代基。當存在複數個 取代基時，該等可為相同或相異。 以合啡一基可具有之取代基而言’可列舉如與前述q1 相關說明中所例示之取代基相同的取代基。當存在複數個 取代基時，該等可為相同或相異。 ιοί 323323 201220574 以三哄二基可具有之取代基而言，可列舉如與前述qi 相關說明中所例示之取代基相同的取代基。當存在複數個 取代基時’該等可為相同或相異。 〈構造單元的比例〉 本發明所使用之離子性聚合物中所包含之式（13)所示 之構造單元、式（15)所示之構造單元、式（17)所示之構造 單元、及式（20)所示之構造單元的合計比例，從有機EL元 φ件的發光效率之觀點來看，末端之構造單元除外，在該離 子性聚合物所包含的全部構造單元中，更佳為3〇至丨⑽莫 耳％。 〈末端之構造單元〉 又，以本發明所使用之離子性聚合物的末端之構造單 疋（末端基）而言，可列舉例如：氫原子、曱基、乙基、丙 基、異丙基、丁基、異丁基、第二丁基、第三丁基、戊基、 異戊基、己基、環己基、庚基、辛基、壬基、癸基、月桂 _基、甲氧基、乙氧基、丙基氧基、異丙基氧基、丁氧暴、 異丁氧基、第二丁氧基、第三丁氧基、戊基氧基、己基氧 基、％己基氧基、庚基氧基、辛基氧基、2_乙基己基氧基、 壬基氧基、癸基氧基、3, 7-二甲基辛基氧基、月桂基氧恭、 甲基硫基、乙基硫基、丙基硫基、異丙基硫基、丁基硫基、 異丁基硫基、第二丁基硫基、第三丁基硫基、戊基硫基、 己基硫基、環己基硫基、庚基硫基、辛基硫基、壬基硫基、 癸基硫基、月桂基硫基、甲氧基苯基、乙氧基苯基、兩基 氧基苯基、異丙基氧基苯基、丁氧基苯基、異丁氧基苯基、 102 323323 201220574 ，二:氧基苯基、第三丁氧基苯基、戊基氧基苯基、己基 氧基苯基、環已基氧基苯基、庚基氧基苯基、辛基氧基苯 基、2-乙基己基氧基苯基、壬基氧基苯基、癸基氧基苯基、 3’7-二甲基辛基氧基苯基、月桂基氧基苯基、甲基苯基、 乙基笨基、二甲基苯基、丙基苯基、2, 4, 6一三甲苯基、甲 基乙基笨基、異丙基笨基、丁基苯基、異丁基苯基、第三 丁基苯基、戊基苯基、異戊基苯基、己基苯基、庚基苯基、 φ 辛基笨基、壬基苯基、癸基苯基、十二基苯基、曱基胺基、 二曱基胺基、乙基胺基、二乙基胺基、丙基胺基、二丙基 胺基、異丙基胺基、二異丙基胺基、丁基胺基、異丁基胺 基、第二丁基胺基、第三丁基胺基、戊基胺基、己基胺基、 環己基胺基、庚基胺基、辛基胺基、2-乙基己基胺基、壬 基胺基、癸基胺基、3, 7-二曱基辛基胺基、月桂基胺基、 環戊基胺基、二環戊基胺基、環己基胺基、二環己基胺基、 二（三氟曱基）胺基、苯基胺基、二苯基胺基、至C12烷 _ 氧基笨基）胺基、二㈦至C12烷氧基苯基）胺基、二沁至C12 烷基苯基）胺基、1-萘基胺基、2-萘基胺基、五氟苯基胺基、 吡啶基胺基、嗒畊基胺基、嘧啶基胺基、吡畊基胺基、三 畊基胺基、（苯基-匕至C12烷基）胺基、（匕至匕2烷氧基苯 基-匕至C12烷基）胺基、（心至（：12烷基苯基-匕至C12烷基） 胺基、二至C12烷氡基苯基至C12烷基）胺基、二（C! 至Cl2烧基苯基-Cl至Cl2烧基）胺基、1-蔡基-Cl至Cl2烧基胺 基、2-萘基-0至（：12烷基胺基、三曱基矽基、三乙基矽基、 三丙基矽基、三異丙基矽基、異丙基二曱基矽基、異丙基 103 323323 201220574 二乙基梦基、第三丁其_ 基二甲基石夕基、庚基基辛;基二甲基梦基、己 土一 f基矽基、辛基二甲基矽基、2_ 基己基二甲切基、壬基二甲絲基、癸基二甲基石夕基、 3,7—二甲基辛基二曱基石夕基、月桂基二甲基石夕基、（苯基-Cl 至c12烧基）石夕基、（(：1至Ci2烧氧基苯基_Ci至&amp;烧基）石夕基、The 'X' in the formula (33) represents an imido group having or not having a substituent, an anthracene group having or not having a substituent, a vinylidene group having or not having a substituent, or an exetylene group. Examples of the substituent which the imido group, the fluorenylene group or the vinyl group may have include methyl group, ethyl group, propyl group, isopropyl group, butyl group, isobutyl group, and second butyl group. Tributyl, pentyl, hexyl, cyclohexyl, heptyl, octyl, 2-ethylhexyl, decyl, decyl, 3 7-dimethyloctyl, lauryl and other carbon atoms! An alkyl group of 20; a phenyl group, a naphthyl group, a 2~naphthyl group, a 1-fluorenyl group, a 2-fluorenyl group, a 9-fluorenyl group, or the like, having 6 to 3 〇 ^ aryl groups. When multiple substituents are present, the may be the same or different. 323323 100 201220574 From the viewpoint of the stability of the ionic polymer to air, moisture or heat, X is preferably an imido group, a vinyl group or a vinyl group. From the viewpoints of electron acceptability and hole acceptability of the ionic polymer, it is preferred that m33 is 1 and m34 is ruthenium. The structural unit represented by the formula (33) is preferably a structural unit represented by the formula (35) from the viewpoint of electrical J of the ionic polymer. [In the formula (3), Ar13 represents a pyridyl group having or not having a substituent, and an n-nonyldiyl group having or not having a substituent, a pyridinediyl group having or not having a substituent, with or not A ruthenium diyl group having a substituent or a trimorphinyl group having or without a substituent. The substituent which the pyridinediyl group may have may be the same as the substituent exemplified in the above-mentioned description of Qi. When there are a plurality of substituents, the ones may be the same or different. # A substituent which may be the same as the substituent exemplified in the above-mentioned Q1 related description, in terms of the substituent which the morphine diyl group may have. When plural substituents are present, the may be the same or different. Examples of the substituent which the pyrimidinediyl group may have include the same substituents as those exemplified in the above description of Q1. When plural substituents are present, the may be the same or different. The substituent which may be possessed by the morphine-based group may be the same as the substituent exemplified in the description of the above q1. When plural substituents are present, the may be the same or different. Umοί 323323 201220574 The substituent which may be possessed by the triterpene group may be the same as the substituent exemplified in the description of the above qi. When there are a plurality of substituents, the ones may be the same or different. <Proportion of the structural unit> The structural unit represented by the formula (13), the structural unit represented by the formula (15), the structural unit represented by the formula (17), and the structural unit represented by the formula (17) contained in the ionic polymer used in the present invention The total ratio of the structural units represented by the formula (20) is, except for the structural unit of the terminal, from the viewpoint of the luminous efficiency of the organic EL element φ, and more preferably all the structural units included in the ionic polymer. 3〇 to 丨(10)mol%. (Structural unit at the end) Further, the monoterpene (terminal group) of the terminal of the ionic polymer used in the present invention may, for example, be a hydrogen atom, a thiol group, an ethyl group, a propyl group or an isopropyl group. , butyl, isobutyl, t-butyl, tert-butyl, pentyl, isopentyl, hexyl, cyclohexyl, heptyl, octyl, decyl, decyl, laurel, methoxy, Ethoxy, propyloxy, isopropyloxy, butoxygen, isobutoxy, second butoxy, tert-butoxy, pentyloxy, hexyloxy, %hexyloxy, Heptyloxy, octyloxy, 2-ethylhexyloxy, decyloxy, decyloxy, 3,7-dimethyloctyloxy, lauryloxy, methylthio, Ethylthio, propylthio, isopropylthio, butylthio, isobutylthio, second butylthio, tert-butylthio, pentylthio, hexylthio, Cyclohexylthio, heptylthio, octylthio, decylthio, decylthio, laurylthio, methoxyphenyl, ethoxyphenyl, di-oxyphenyl, iso Propyloxyphenyl, butoxy , isobutoxyphenyl, 102 323323 201220574, bis: oxyphenyl, tert-butoxyphenyl, pentyloxyphenyl, hexyloxyphenyl, cyclohexyloxyphenyl, g Alkyl phenyl, octyloxyphenyl, 2-ethylhexyloxyphenyl, nonyloxyphenyl, decyloxyphenyl, 3'7-dimethyloctyloxyphenyl , lauryloxyphenyl, methylphenyl, ethylphenyl, dimethylphenyl, propylphenyl, 2,4,6-trimethylphenyl, methylethyl stupyl, isopropyl stupid , butylphenyl, isobutylphenyl, tert-butylphenyl, pentylphenyl, isopentylphenyl, hexylphenyl, heptylphenyl, φ octylphenyl, nonylphenyl , mercaptophenyl, dodecylphenyl, decylamino, dimethylamino, ethylamino, diethylamino, propylamino, dipropylamino, isopropylamino , diisopropylamino, butylamino, isobutylamino, t-butylamino, tert-butylamino, pentylamino, hexylamino, cyclohexylamino, heptylamine Base, octylamino group, 2-ethylhexylamino group, mercaptoamine group, mercaptoamine group 3,7-dimercaptoalkylamino, laurylamine, cyclopentylamino, dicyclopentylamino, cyclohexylamino, dicyclohexylamino, bis(trifluoromethyl)amino , phenylamino, diphenylamino, to C12 alkoxy)amino, di(seven) to C12 alkoxyphenyl)amino, diterpene to C12 alkylphenyl)amine, 1 -naphthylamino group, 2-naphthylamino group, pentafluorophenylamino group, pyridylamino group, hydrazine amino group, pyrimidinylamino group, pyridylamino group, tri-cultivated amino group, (benzene Amino-(C12 alkyl)amino group, (匕 to 匕2 alkoxyphenyl-fluorene to C12 alkyl) amine group, (heart to (: 12 alkyl phenyl-fluorene to C12 alkyl) amine group , a di-C12 alkyl nonylphenyl to C12 alkyl) amine group, a di(C! to Cl2 alkylphenyl-Cl to Cl2 alkyl) amine group, a 1-cai-Cl-Cl to a C2 alkyl group, 2-naphthyl-0 to (: 12 alkylamino, tridecyl fluorenyl, triethyl decyl, tripropyl decyl, triisopropyl decyl, isopropyl decyl fluorenyl, iso Propyl 103 323323 201220574 diethyl ungyl, tert-butyl keto dimethyl sulfanyl, heptyl octyl; dimethyl dimethyl group,一-fyl fluorenyl, octyl dimethyl fluorenyl, 2- hexyl dimethyl decyl, fluorenyl dimethyl fluorenyl, fluorenyl dimethyl sylylene, 3,7-dimethyloctyl fluorene Basestone, lauryl dimethyl sylylene, (phenyl-Cl to c12 alkyl) sylvestre, ((: 1 to Ci2 alkoxyphenyl _Ci to &amp; burnt) Shi Xiji,

沁至C〖2烧基苯基七至k烧基）石夕基、（卜蔡基_Ci至L 燒基）石夕基、（2-萘基-C,至Ci2烧基）石夕基、（苯基_Ci至Ci2沁 to C 〖2 alkyl phenyl seven to k alkyl) Shi Xiji, (Bu Caiji _Ci to L calcyl) Shi Xiji, (2-naphthyl-C, to Ci2 alkyl) Shi Xiji , (phenyl_Ci to Ci2)

烷基）二曱基矽基、三苯基矽基、三（對茬基）矽基、三苄基 矽基、二苯基甲基矽基、第三丁基二苯基矽基、二曱基苯 基矽基、噻吩基、匕至C1Z烷基噻吩基、吡咯基、呋喃基、 D比啶基、匕至Ck烷基吡啶基、嗒畊基、嘧啶基、吡畊基、 三哄基、吡咯啶基、哌啶基、喹啉基、異喹啉基、羥基、 皲基、氟原子、氯原子、溴原子及碘原子等。當存在複數 個前述末端之構造單元時，該等可為相同或相異。 &lt;離子性聚合物之特性〉 本發明所使用之離子性聚合物較佳為共輛化合物。「本 發明所使用之離子性聚合物為共輕化合物」’係意指該離子 十生聚合物於主鏈中含有由多重鍵結（例如雙鍵、二鍵）或乳 厚子、氧原子等所具有之非共用電子對（unshared electron pair)挾著1個單鍵而連接成的區域。該離子性 聚合物為共輛化合物時，從共輛化合物的電子傳輸性之觀 點來看，以下述式： {(在由多重鍵結或氮原子、氧原子等所具有的非共用 電子對挾著1個單鍵而連接成的區域中所包含之主鏈 104 323323 201220574 上的原子數）/(主鏈上之全部原子數）}xl〇〇% 所片算之比係以50%以上為佳，更佳為6〇%以上，復更佳為 70%以上，再更佳為8〇%以上，再復更佳為9〇%以上。 而且，本發明所使用之離子性聚合物較佳為高分子化 合物，更佳為共軛高分子化合物。在此，高分子化合物係 指聚「苯乙烯換算之數平均分子量為lxlG3以上的化合物。而 且，本發明所使用之離子性聚合物為共軛高分子化合 物」’係意指該離子性聚合物為共軛化合物且為高分子化合 物。 從本發明所使用之離子性聚合物的塗佈之成膜性之觀 點來看’該離子性聚合物之聚苯乙職算的數平均分子量 車又佳為'Χίο至1x10 ’更佳為2)&lt;1〇3至，復更佳為如〇3 ^ lxJG ’再更佳為5&gt;&lt;1()3至1χΐ()7。而且，從離子性聚合 物之純度之觀點來看，聚笨乙料算的重量平均分子量較 =二〇3至Μ0、更佳為1X103至㈣7伽^ xm，從離子性聚合物的溶解性 苯乙烯換算的數平均分子量較佳為㈣3至5灿 1x10至5xlQ4,復更佳為咖至_3。本發明所使用^ 離子性聚合物之聚苯乙烯換算的數平均分子量及 分子量可使用例如凝膠渗透# 二 命鳴⑽r_y)而求得層析儀（GPC;gel1— 末端:子性聚合物的純度之觀點來看， ::構::兀除：，在該離子性聚合物中所包含的全部構 …之數目(亦即聚合度)較佳為h上、20以下，更佳 323323 105 201220574 為1以上、10以下，復更佳為1以上、5以下。 從本發明所使用之離子性聚合物的電子接受性、電洞 接受性之觀點來看’該離子性聚合物之最低未占分子軌域 (LUM0 ; lowest unoccupied molecular orbital)的軌域能 量較佳為-5. OeV以上、-2. OeV以下，更佳為-4. 5eV以上、 -2. OeV以下。而且，從相同之觀點來看，該離子性聚合物 之最高被占分子軌域（HOMO)的軌域能量較佳為-6. 〇eV以 φ 上、_3. 0eV以下，更佳為-5. 5eV以上、-3. OeV以下。惟， HOMO的軌域能量係較LUM0的軌域能量低。又，離子性聚 合物之最高被占分子執域（HOMO)的軌域能量係藉由測定離 子性聚合物之離子化位能（i〇nizati〇n p〇tential)後將 所得之離子化位能作為該軌域能量而求得。另一方面，離 子性聚合物之最低未占分子軌域（LUM〇)的軌域能量，係藉 由求出HOMO與LUM0的能量差後，再求出其值與前述測定 之離子化位能的和而作為該轨域能量。離子化位能的測定 籲係使用光電子光譜（Photoemission spectroscopy)裝置。 而且，HOMO與LUM0的能量差係使用紫外線/可見光/近紅 外線分光光度計測定離子性聚合物之吸收光譜，由其吸收 末端求得。 又，當本發明所使用之聚合物使用於電場發光元件 時’較佳為實質上為非發光性者。在此，「某聚合物實質上 為非發光性者」之意義係如下述。首先，製作具有包含某 ^物之層的電場發光元件A。另—方面，製作不具有包 s聚合物之層的電場發光元件^電場發光元件a與電場 323323 106 201220574 發光元件2所相異之點僅在於：電場發光元件A具有包含 聚合物之層，但電場發光元件2不具有包含聚合物之層。 接下來，對於電場㈣元件A及電場發光元件2施加而 的順向電壓，測定發光光譜。對於電場發光元件2 ’求出 在所得之發光光譜中賦Μ大波峰的波長λ。以波長入之 發光強度設作1 ’對於電光轉2，將所狀發光光譜 予以規格化’並對於波長進行積分而計算規格化的發光^ I另-方面’以波長λ之發光強度設作卜對於電場發 光元件Α亦將所得之發光光譜予以規格化，並對於波長進 行積分而計算規格化的發光量S。當以（S_S〇/Sflxl〇〇%計算 的值為30%以下時，亦即，當相較於不具有包 層的電場發光元件2之規格化發光量，二:= 層的電場發光元件A的規格化發光量之增加份量為3〇%以 下時，所用之聚合物係實質上為非發光性者，以（s_s。）/ SoxlOO所計算之值較佳為15%以下，更佳為1〇%以下。 包含前述式（1)所示之基及前述式（3)所示之基的離子 性聚合物’可列舉例如：僅由式（23)所示之基所^成的離 子性聚合物；由式（23)所示之基以及選自從式45至5〇、 59、 60、77、80、91、92、96、101 至 11〇 所示之美中去 除2個氫原子後所得的基所成群組中的1種以上的基所構 成之離子性聚合物；僅由式（24)所示之基所構成的離子性 聚合物；由式（24)所示之基以及選自從式45至5〇、59、 60、 77、80、91、92、96、101 至 110 所示之基中去除 2 個氫原子後所得的基所成群組中的1種以上的基所構成之 323323 107 201220574 離子性聚合物；僅由式（25)所示之基所構成的離子性聚合 物；由式（25)所示之基以及選自從式45至50、59、60、 77、80、91、92、96、101至110所示之基中去除2個氫 原子後所得的基所成群組中的1種以上的基所構成之離子 性聚合物；僅由式（29)所示之基所構成的離子性聚合物； 由式（29)所示之基及選自從式45至50、59、60、77、80、 91、 92、96、101至110所示之基中去除2個氫原子後所 ^ 得的基所成群組中的1種以上的基所構成之離子性聚合 物；僅由式（30)所示之基所構成的離子性聚合物；由式（30) 所示之基以及選自從式45至50、59、60、77、80、91、 92、 96、101至110所示之基中去除2個氫原子後所得之 基所成群組中的1種以上之基所構成的離子性聚合物。 包含前述式（1)所示之基及前述式（3)所示之基的離子 性聚合物，可列舉如以下之高分子化合物。此等之中，在 2種構造單元以斜線「/」區隔的式所示之高分子化合物中， φ 左側之構造單元的比例為p莫耳％，右側之構造單元的比例 為（100-P)莫耳％，此等構造單元為無規排列。又，以下的 式中，η表示聚合度。 108 323323 201220574 十 IVTOOC H5C(OH2CH2C)3〇i ΜAlkyl) dimethyl fluorenyl, triphenyl fluorenyl, tris(p-fluorenyl) fluorenyl, tribenzyl fluorenyl, diphenylmethyl fluorenyl, tert-butyldiphenyl fluorenyl, diterpenes Phenyl fluorenyl, thienyl, fluorene to C1Z alkylthiophenyl, pyrrolyl, furyl, D-pyridyl, fluorene to Ck alkylpyridyl, hydrazine, pyrimidinyl, pyridinyl, tridecyl A pyrrolidinyl group, a piperidinyl group, a quinolyl group, an isoquinolyl group, a hydroxyl group, a fluorenyl group, a fluorine atom, a chlorine atom, a bromine atom, an iodine atom or the like. When there are a plurality of structural units of the foregoing ends, the ones may be the same or different. &lt;Characteristics of Ionic Polymers> The ionic polymer used in the present invention is preferably a compound compound. The "ionic polymer used in the present invention is a light-weight compound" means that the ion-free polymer contains a plurality of bonds (for example, a double bond or a double bond) or a milk thick, an oxygen atom or the like in the main chain. An area in which an unshared electron pair is connected by a single button. When the ionic polymer is a compound compound, from the viewpoint of electron transport property of the compound compound, the following formula is used: {(on the non-shared electrons which are possessed by multiple bonds or nitrogen atoms, oxygen atoms, etc.) The number of atoms in the main chain 104 323323 201220574 included in the region where one single bond is connected) / (the total number of atoms in the main chain)} xl 〇〇 % The ratio of the calculation is 50% or more Preferably, it is more than 6〇%, and the better is more than 70%, and even more preferably more than 8%, and more preferably more than 9%. Further, the ionic polymer used in the present invention is preferably a polymer compound, more preferably a conjugated polymer compound. Here, the polymer compound means a compound in which the number average molecular weight in terms of styrene is 1×1 G3 or more. Further, the ionic polymer used in the present invention is a conjugated polymer compound, 'the system means the ionic polymer. It is a conjugated compound and is a polymer compound. From the viewpoint of the film forming property of the coating of the ionic polymer used in the present invention, the number average molecular weight of the polyphenylene-based ionic polymer is preferably 'Χίο to 1x10'. ) &lt;1〇3 to, the more preferable is 〇3 ^ lxJG 'more preferably 5&gt;&lt;1()3 to 1χΐ()7. Moreover, from the viewpoint of the purity of the ionic polymer, the weight average molecular weight calculated by the polystyrene is lower than 〇3 to Μ0, more preferably 1×103 to (4) 7 gamma xm, and the soluble benzene from the ionic polymer. The number average molecular weight in terms of ethylene is preferably (4) 3 to 5 can be 1 x 10 to 5 x 1 Q4, and more preferably it is _3. The polystyrene-equivalent number average molecular weight and molecular weight of the ionic polymer used in the present invention can be determined by, for example, gel permeation #二命鸣(10)r_y) (GPC; gel1 - terminal: sub-polymer From the viewpoint of purity, ::configuration:: removal: the number of all the structures (i.e., degree of polymerization) contained in the ionic polymer is preferably h, 20 or less, more preferably 323323 105 201220574 It is more preferably 1 or more and 10 or less, and more preferably 1 or more and 5 or less. From the viewpoint of electron acceptability and hole acceptability of the ionic polymer used in the present invention, the lowest unoccupied ionic polymer The orbital energy of the LUM0; lowest unoccupied molecular orbital is preferably -5. OeV or more, -2. OeV or less, more preferably -4. 5 eV or more, - 2. OeV or less. </ </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> 3. Below OeV. However, HOMO's orbital energy is lower than that of LUM0. Also, ionic polymer The orbital energy of the highest occupied molecular domain (HOMO) is obtained by measuring the ionization potential of the ionic polymer (i〇nizati〇np〇tential) and then obtaining the ionized potential energy of the ionomer as the energy of the orbital domain. On the other hand, the lowest unoccupied molecular domain (LUM〇) orbital energy of the ionic polymer is obtained by determining the energy difference between HOMO and LUM0, and then determining the value and the ionization of the above measurement. The energy of the orbital energy is used as the energy of the orbital region. The measurement of the ionization potential energy is performed by using a photoemission spectroscopy device. Moreover, the energy difference between HOMO and LUM0 is measured by an ultraviolet/visible/near-infrared spectrophotometer. The absorption spectrum of the polymer is determined by the absorption end thereof. Further, when the polymer used in the present invention is used for an electric field light-emitting element, it is preferably substantially non-luminescent. Here, "a certain polymer is substantially The meaning of the non-light-emitting person is as follows. First, an electroluminescent element A having a layer containing a certain substance is produced. On the other hand, an electric field light-emitting element having no layer containing a polymer of s. The optical element a differs from the electric field 323323 106 201220574 in that the light-emitting element 2 differs only in that the electric field light-emitting element A has a layer containing a polymer, but the electric field light-emitting element 2 does not have a layer containing a polymer. Next, for the electric field (four) element The illuminating spectrum is measured by the forward voltage applied by A and the electric field light-emitting element 2. The wavelength λ at which the large peak is given to the obtained illuminating spectrum is obtained for the electric field light-emitting element 2'. The luminous intensity at the wavelength is set to 1'. Electro-optical rotation 2, normalizes the shape of the luminescence spectrum and integrates the wavelength to calculate the normalized luminescence. The other illuminating intensity of the wavelength λ is set as the illuminating spectrum of the electric field illuminating element. Normalization is performed, and the normalized luminescence amount S is calculated by integrating the wavelength. When the value calculated by (S_S〇/Sflxl〇〇% is 30% or less, that is, when compared with the normalized luminescence amount of the electric field light-emitting element 2 having no cladding layer, the electric field light-emitting element A of the second:= layer When the amount of the normalized luminescence is increased by 3% or less, the polymer used is substantially non-luminescent, and the value calculated by (s_s.) / SoxlOO is preferably 15% or less, more preferably 1 〇% or less. The ionic polymer containing the group represented by the above formula (1) and the group represented by the above formula (3) may, for example, be an ionic group formed only by the group represented by the formula (23). a polymer; obtained from the group represented by formula (23) and selected from the group consisting of formula 45 to 5, 59, 60, 77, 80, 91, 92, 96, 101 to 11 去除 to remove 2 hydrogen atoms An ionic polymer composed of one or more types of groups in the group; an ionic polymer composed only of the group represented by the formula (24); and a group represented by the formula (24) One or more groups in the group obtained by removing two hydrogen atoms from the group represented by Formula 45 to 5, 59, 60, 77, 80, 91, 92, 96, 101 to 110 Composition 323323 107 201220574 ionic polymer; ionic polymer composed only of the group represented by formula (25); group represented by formula (25) and selected from formulas 45 to 50, 59, 60, 77 An ionic polymer composed of one or more groups of groups obtained by removing two hydrogen atoms from the group represented by 80, 91, 92, 96, and 101 to 110; only by the formula (29) An ionic polymer composed of the group shown; a group represented by the formula (29) and selected from the group consisting of Formulas 45 to 50, 59, 60, 77, 80, 91, 92, 96, 101 to 110 An ionic polymer composed of one or more groups in the group obtained by removing two hydrogen atoms in the group; an ionic polymer composed only of the group represented by the formula (30); a group represented by the formula (30) and a group selected from the group consisting of the formulas 45 to 50, 59, 60, 77, 80, 91, 92, 96, 101 to 110 to remove two hydrogen atoms An ionic polymer composed of one or more groups in the group. The ionic polymer containing the group represented by the above formula (1) and the group represented by the above formula (3), and the like Among these, in the polymer compound represented by the formula in which the two structural units are separated by a slash "/", the ratio of the structural unit on the left side of φ is p mol%, and the ratio of the structural unit on the right side is (100-P) Mohr%, these structural units are randomly arranged. Further, in the following formula, η represents the degree of polymerization. 108 323323 201220574 Ten IVTOOC H5C(OH2CH2C)3〇i Μ

-〇ocm+ [gh2ch2〇)3ch3 Li，Na.K，Cs-〇ocm+ [gh2ch2〇)3ch3 Li,Na.K,Cs

+MOOC H3q〇H2CH2Q3i+MOOC H3q〇H2CH2Q3i

丨(CHjCH^CH M = UNa,K, Cs 馨丨(CHjCH^CH M = UNa,K, Cs Xin

Vooc HjCiOHjCHAO'Vooc HjCiOHjCHAO'

00〇-M+ (CH2CH20)3CH300〇-M+ (CH2CH20)3CH3

+MOOC H3C(OH2CH2QjO,+MOOC H3C(OH2CH2QjO,

coaM+ ；CH2CH20)3CHj M = Li, Na,KtCs M = U,Na,K,Cs ip: 100-p mol%)coaM+ ;CH2CH20)3CHj M = Li, Na,KtCs M = U,Na,K,Cs ip: 100-p mol%)

COCTM+COCTM+

Vooc H3C(OI^CH2Q3‘Vooc H3C (OI^CH2Q3'

ooowr (CH2CH20)3CH3 M = U, Na, Kt Cs +MOOC H3c(〇H2CH2q3a M: = Li. Na.K,Cs (p: ίΟΟ-p mol%) +M*00 H3q〇H2CH2Q3'Ooowr (CH2CH20)3CH3 M = U, Na, Kt Cs +MOOC H3c(〇H2CH2q3a M: = Li. Na.K,Cs (p: ΟΟ -p mol%) +M*00 H3q〇H2CH2Q3'

CO〇TM+ ；CH2CH20)3CHjCO〇TM+ ;CH2CH20)3CHj

M = Li, Na;K, Cs ip : ίΟΟ-ρ mol%)M = Li, Na; K, Cs ip : ίΟΟ-ρ mol%)

&gt;-^7 ΥγοοσΜ+ Ύ〇00*Μ+ H3q〇H2CH2c)3cr^ ^0(CH2CH2O)3CH3 HjCjOHaCHiQjO^ &lt;0(CH2CH20)3CH3 M = Li, Na, K, Cs M = Li, Na, Kf Cs (p: fOO-pmol%) 109 323323 201220574 +ΜΌΟΟ H3C(OH2CH2Q3Cr&gt;-^7 ΥγοοσΜ+ Ύ〇00*Μ+ H3q〇H2CH2c)3cr^ ^0(CH2CH2O)3CH3 HjCjOHaCHiQjO^ &lt;0(CH2CH20)3CH3 M = Li, Na, K, Cs M = Li, Na, Kf Cs (p: fOO-pmol%) 109 323323 201220574 +ΜΌΟΟ H3C(OH2CH2Q3Cr

•coarvr '0(CH2CH20)3a^ M = Li, Na,K, Cs (p : 100 - p mol%)•coarvr '0(CH2CH20)3a^ M = Li, Na,K, Cs (p : 100 - p mol%)

&quot;MOOC- H3C(OH2CH2C)3-&quot;MOOC- H3C(OH2CH2C)3-

00〇-M+ (CH2CH20)3〇b00〇-M+ (CH2CH20)3〇b

M = Li, Na, K, Cs (p: iOO-pmot%)M = Li, Na, K, Cs (p: iOO-pmot%)

(p: ίΟΟ-p mol%)(p: ίΟΟ-p mol%)

Vooc. H3C(OH2CH2Q3'Vooc. H3C(OH2CH2Q3'

OOCTM+ (ch2ch2〇)3ch3 M = U,Na, K,Cs οοσΜ+ n &lt;ch2ch2〇)3ch3 M = Li.Na, K Cs (p: 100-p mol%) +M*OOC HaCiO^C^C^O*OOCTM+ (ch2ch2〇)3ch3 M = U,Na, K,Cs οοσΜ+ n &lt;ch2ch2〇)3ch3 M = Li.Na, K Cs (p: 100-p mol%) +M*OOC HaCiO^C^C ^O*

(p: ίΟΟ-p mol%)(p: ίΟΟ-p mol%)

110 323323 201220574 + MOOC H3q〇H2CH2C)3110 323323 201220574 + MOOC H3q〇H2CH2C)3

οοσιντ Ό(ΟΗ2αΐ20)3〇Η3 /-cm Μ = ϋ,Ν3,Κ,05Οοσιντ Ό(ΟΗ2αΐ20)3〇Η3 /-cm Μ = ϋ, Ν3, Κ, 05

(p: 100-pmdi%)(p: 100-pmdi%)

(p; 700-pmol%)(p; 700-pmol%)

(p : 700-p mol%)(p : 700-p mol%)

(p: ίΟΟ-p mol%)(p: ίΟΟ-p mol%)

(p: 700-p mol%)(p: 700-p mol%)

M = Li, Na,K CsM = Li, Na, K Cs

(p: ίΟΟ-pmol%) M = Li, Na.K, Cs 111 323323 201220574(p: ίΟΟ-pmol%) M = Li, Na.K, Cs 111 323323 201220574

(p: fOO-pmol%)(p: fOO-pmol%)

(p: 100-pmcH%)(p: 100-pmcH%)

112 323323 201220574112 323323 201220574

M = U,Na.K,Cs +ΜΌ3, H3q〇hf2CH2C)3a ΓΜ+ CH2CH20)3CH3 +m*o3s- h3qoh2ch2q3'M = U, Na.K, Cs +ΜΌ3, H3q〇hf2CH2C)3a ΓΜ+ CH2CH20)3CH3 +m*o3s- h3qoh2ch2q3'

CVM+ :&lt;3Η2ΟΗ20)3α^ M = UNa；KCs &quot;MO3. H3q〇H2CH2C)3 丨CVM+ :&lt;3Η2ΟΗ20)3α^ M = UNa;KCs &quot;MO3. H3q〇H2CH2C)3 丨

；w ；ch2ch2〇)3ck1 +M&quot;〇3S H3q〇H2CH2q3&lt;;w ;ch2ch2〇)3ck1 +M&quot;〇3S H3q〇H2CH2q3&lt;

M = Li, Na, K Cs ⑽+ M = Li, Na,K,Cs (p:iOO-p mol%)M = Li, Na, K Cs (10) + M = Li, Na, K, Cs (p: iOO-p mol%)

/~〇77 +mo3sy^ pyscvtvf H3C(OI^CH2Q3〇r^ N&quot;&quot;D(CH2CH20)3CH3 M = U,Na,KiCs (p : 100-prr\〇\%)/~〇77 +mo3sy^ pyscvtvf H3C(OI^CH2Q3〇r^ N&quot;&quot;D(CH2CH20)3CH3 M = U,Na,KiCs (p : 100-prr\〇\%)

• +ivro3Sv^ +MO3SY^&lt; H3q〇K2CH2Q3CJ^ 〆、^ch2ch2o)3ci^ H3C{OI-^CH2Q3〇^ Md(ch2ch2〇)3ch3 M = Li，Na，K，Cs M = UiNa. K,Cs (p: fOO-p mol%) 1 +mo3s、 ^O3SVs=(VySQj-M+ H3q〇H2CH2q3a ^ XO(CH2CH2〇)3CH3 H3q〇H2CH2C&gt;30^ ^^(^20120)30^ M = Li，Na, KCs M = Li, Na,KCs ip : iOO-p mol%) 113 323323 201220574• +ivro3Sv^ +MO3SY^&lt; H3q〇K2CH2Q3CJ^ 〆, ^ch2ch2o)3ci^ H3C{OI-^CH2Q3〇^ Md(ch2ch2〇)3ch3 M = Li,Na,K,Cs M = UiNa. K,Cs (p: fOO-p mol%) 1 +mo3s, ^O3SVs=(VySQj-M+ H3q〇H2CH2q3a ^ XO(CH2CH2〇)3CH3 H3q〇H2CH2C&gt;30^^^(^20120)30^ M = Li,Na, KCs M = Li, Na, KCs ip : iOO-p mol%) 113 323323 201220574

(p: 100 - p mol%)(p: 100 - p mol%)

(p: ίΟΟ-p mol%)(p: ίΟΟ-p mol%)

114 323323 201220574114 323323 201220574

+M*〇3 H3q〇H2CH2C)3+M*〇3 H3q〇H2CH2C)3

M /-〇oa M+ :Ll，Na，K. Cs (p: 700-p mol%)M /-〇oa M+ : Ll, Na, K. Cs (p: 700-p mol%)

(p: fOO-pmol%)(p: fOO-pmol%)

(p: 700 - p mol%)(p: 700 - p mol%)

(p: 700-p mol%)(p: 700-p mol%)

(p:100~pmo\%)(p:100~pmo\%)

♦M-〇aS HbC(OH2〇H2C)3d M♦M-〇aS HbC(OH2〇H2C)3d M

丨嘗Taste

O(CH2CH2〇)3CH3 Li, Na, K, CS (p: 700-p mol%)O(CH2CH2〇)3CH3 Li, Na, K, CS (p: 700-p mol%)

115 323323 201220574115 323323 201220574

(p; 100 -pmol%)(p; 100 -pmol%)

(式中9 p表示15至100之數。） 包含前述式（2)所示之基及前述式（3)研 性聚合物，可列舉如：僅由式⑽)所示之基所構：之離子 性聚合物；由式（26)所示之基及選自從式45至 60、77、80、91、92、96、101 至 11〇 所示之基中去除2 個氫原子後所得的基所成群組中的1種以上的二斤構成之 離子性聚合物；僅由式（27)所示之基所構成之離子性聚合 323323 116 201220574 物；由式（27)所示之基及選自從式45至50、59、60、77、 80、91、92、96、101至110所示之基中去除2個氫原子 後所得的基所成群組中的1種以上的基所構成之離子性聚 合物；僅由式（28)所示之基所構成之離子性聚合物；由式 (28)所示之基及選自從式45至50、59、60、77、80、91、 92、96、101至110所示之基中去除2個氫原子後所得的 基所成群組中的1種以上的基所構成之離子性聚合物；僅 由式（31)所示之基所構成之離子性聚合物；由式（31)所示 之基及選自從式 45 至 50、59、60、77、80、91、92、96、 101至110所示之基中去除2個氫原子後所得的基所成群 組中的1種以上的基所構成之離子性聚合物；僅由式（32) 所示之基所構成之離子性聚合物；由式（32)所示之基及從 選自式 45 至 50、59、60、77、80、91、92、96、101 至 110所示之基中去除2個氫原子後所得的基所成群組中之1 種以上的基所構成之離子性聚合物。 包含前述式（2)所示之基及前述式（3)所示之基的離子 性聚合物，可列舉如以下之高分子化合物。此等之中，在 2種構造單元以斜線「/」區隔的式所示之高分子化合物中， 左侧之構造單元的比例為p莫耳％，右侧之構造單元的比例 為（100-p)莫耳％，此等構造單元為無規排列。又，以下之 式中，η表示聚合度。 117 323323 201220574 *X+{H3CH2C(H3C)2I h3c(oh2ch2c)3 丨(wherein 9 p represents a number from 15 to 100.) The base polymer represented by the above formula (2) and the polymer of the above formula (3) may be, for example, a base represented by the formula (10): An ionic polymer; obtained from a group represented by the formula (26) and selected from the group consisting of the formulas 45 to 60, 77, 80, 91, 92, 96, 101 to 11 去除 to remove 2 hydrogen atoms An ionic polymer composed of one or more kinds of two kilograms in a group; an ionic polymerization consisting of only the group represented by the formula (27); 323323 116 201220574; a group represented by the formula (27) And one or more groups selected from the group consisting of groups obtained by removing two hydrogen atoms from the groups represented by Formulas 45 to 50, 59, 60, 77, 80, 91, 92, 96, 101 to 110 An ionic polymer; an ionic polymer composed only of the group represented by the formula (28); a group represented by the formula (28) and selected from the formulas 45 to 50, 59, 60, 77, 80 An ionic polymer composed of one or more groups of groups obtained by removing two hydrogen atoms from the group represented by 91, 92, 96, and 101 to 110; only by the formula (31) Ionicity a compound represented by the formula (31) and obtained by removing two hydrogen atoms from a group represented by the formulas 45 to 50, 59, 60, 77, 80, 91, 92, 96, 101 to 110 An ionic polymer composed of one or more kinds of groups in a group; an ionic polymer composed only of a group represented by the formula (32); a group represented by the formula (32) and a selected one One or more groups of groups obtained by removing two hydrogen atoms from a group represented by Formula 45 to 50, 59, 60, 77, 80, 91, 92, 96, 101 to 110 An ionic polymer. Examples of the ionic polymer containing the group represented by the above formula (2) and the group represented by the above formula (3) include the following polymer compounds. Among these, in the polymer compound represented by the formula in which the two structural units are separated by a slash "/", the ratio of the structural unit on the left side is p mol%, and the ratio of the structural unit on the right side is (100). -p) Mohr%, these structural units are randomly arranged. Further, in the following formula, η represents the degree of polymerization. 117 323323 201220574 *X+{H3CH2C(H3C)2I h3c(oh2ch2c)3 丨

[H(CHz)2CH2CH^- (CH2CH20)3CH3 *X+{H3CH2C&lt;H3C)2N: H3C(OH2CH2C)3i[H(CHz)2CH2CH^- (CH2CH20)3CH3 *X+{H3CH2C&lt;H3C)2N: H3C(OH2CH2C)3i

{N(CH3)2CH2CH3}+X· (ch2ch2o)3ch3{N(CH3)2CH2CH3}+X· (ch2ch2o)3ch3

X:: F· Cl. Βγ· I, BPh4, CF3S〇3, CH3COOX:: F· Cl. Βγ· I, BPh4, CF3S〇3, CH3COO

X « F· Cl. Br.l, BPh4, CF3S〇3, CH3COO &quot;X+{H3CH2C(H3C)2N: H3C(OH2CH2C)3&lt;X « F· Cl. Br.l, BPh4, CF3S〇3, CH3COO &quot;X+{H3CH2C(H3C)2N: H3C(OH2CH2C)3&lt;

NiCHahCHjCHa}^· b(CH2CH20)3CH3 _X+{H3CH2C(H3C)2N: H3C(OH2CH2C)3&lt;NiCHahCHjCHa}^· b(CH2CH20)3CH3 _X+{H3CH2C(H3C)2N: H3C(OH2CH2C)3&lt;

:N(CH3&gt;2CH2CH3}+X- (ch2ch2o)3ch3 o)； X = F, Cl. Br, I, BPh4, CF3S03, CH3COO (p: 100 - p mol%):N(CH3&gt;2CH2CH3}+X-(ch2ch2o)3ch3 o); X = F, Cl. Br, I, BPh4, CF3S03, CH3COO (p: 100 - p mol%)

X = F, Cl. Brt I, BPh4l CF3S03, CH3COOX = F, Cl. Brt I, BPh4l CF3S03, CH3COO

^+{H3CH2C(H3C)2NW^ Y\-[ti(CH2)2CH2CH^r H3C(OH2CH2〇)zC&gt; lD(CH2CH2〇)3CH3 X = F, Cl· Br. I，BPh4. CF3S〇3. CH3COO (p: fOO-p mol%) •X+{H3QH2C(H3C)2I H3C(OH2CH2C)3i^+{H3CH2C(H3C)2NW^ Y\-[ti(CH2)2CH2CH^r H3C(OH2CH2〇)zC&gt; lD(CH2CH2〇)3CH3 X = F, Cl· Br. I, BPh4. CF3S〇3. CH3COO (p: fOO-p mol%) • X+{H3QH2C(H3C)2I H3C(OH2CH2C)3i

:N(CH3)2CH2CH3pC- &lt;CH2CH20)3CH3 -Of:N(CH3)2CH2CH3pC- &lt;CH2CH20)3CH3 -Of

X * F. Cl· ΒγΛ BPh4, CF3S〇3, CH3COOX * F. Cl· ΒγΛ BPh4, CF3S〇3, CH3COO

-X+{H3CH2C(H3C)2NW^ Py-{N(CH3)2CH2CH3}+X* H3C(OH2CH2C)3〇^ iD(CH2CH20)3CH3 X = F, Cl. Br, I, BPh4l CF3S03, CH3COO (p： tOO-p mol%) •X+{H3CH2C(H3C)2I H3C(OH2CH2C)3(-X+{H3CH2C(H3C)2NW^ Py-{N(CH3)2CH2CH3}+X* H3C(OH2CH2C)3〇^ iD(CH2CH20)3CH3 X = F, Cl. Br, I, BPh4l CF3S03, CH3COO (p: tOO-p mol%) •X+{H3CH2C(H3C)2I H3C(OH2CH2C)3(

(CHa^CHaCHa^X· (CH2CH20)3CH3(CHa^CHaCHa^X· (CH2CH20)3CH3

X = F, Cl. Br· I, BPh CF3S〇3, CH3COOX = F, Cl. Br· I, BPh CF3S〇3, CH3COO

X+{H3CH2C(H3C)2N卜d rY^CHafeCHzCHaJ^X· h3c(〇h2ch2C)3C)^ &lt;〇(〇η2οη2〇)3〇η3 X = F, Cl. Br, I, BPh4, CF3S〇3, CH3COO (p: tOO-p mol%) •X+{H3CH2C(H3C)2l H3C&lt;OH2CH2C)a&lt;X+{H3CH2C(H3C)2N卜d rY^CHafeCHzCHaJ^X·h3c(〇h2ch2C)3C)^ &lt;〇(〇η2οη2〇)3〇η3 X = F, Cl. Br, I, BPh4, CF3S〇3, CH3COO (p: tOO-p mol%) • X+{H3CH2C(H3C)2l H3C&lt;OH2CH2C)a&lt;

：N(CH3)2CH2CH3}4X* (CH2CH20)3CH3:N(CH3)2CH2CH3}4X* (CH2CH20)3CH3

X = Ft CL Brf I, BPh4t CF3SO3. CH3COO •X+{H3CH2C(H3C&gt;2N] H3C(OH2CH2C)3&lt;X = Ft CL Brf I, BPh4t CF3SO3. CH3COO • X+{H3CH2C(H3C&gt;2N) H3C(OH2CH2C)3&lt;

l(CH3)2CH2CH3pC- (CH2CH20)3CH3l(CH3)2CH2CH3pC- (CH2CH20)3CH3

*X+{H3CH2C(H3C)2I h3c(oh2ch2c)3&lt;*X+{H3CH2C(H3C)2I h3c(oh2ch2c)3&lt;

l{CH3)2CH2CH3}+X· (ch2ch2o)3ch3 X = F, Cl. Br, l, BPh4l CF3SO3, CH3COO (p: iOO-pmol%)l{CH3)2CH2CH3}+X· (ch2ch2o)3ch3 X = F, Cl. Br, l, BPh4l CF3SO3, CH3COO (p: iOO-pmol%)

X * F, Cl. Br,l, BPh4, CF3S03, CH3COO 118 323323 201220574 _X+{H3CH2C(H3C)2N: H3C(OH2CH2C)3&lt;X * F, Cl. Br, l, BPh4, CF3S03, CH3COO 118 323323 201220574 _X+{H3CH2C(H3C)2N: H3C(OH2CH2C)3&lt;

\(ΟΗ3)2〇Η2ΟΗ^*Χ' »(ΟΗ2〇Η20)3〇Η3 -X*{H3CH2C&lt;H3C)2l H3C(OH2CH2C)3&lt;\(ΟΗ3)2〇Η2ΟΗ^*Χ' »(ΟΗ2〇Η20)3〇Η3 -X*{H3CH2C&lt;H3C)2l H3C(OH2CH2C)3&lt;

丨(CH3)aCH2CH3}+X-CH2CH20)3CH3丨(CH3)aCH2CH3}+X-CH2CH20)3CH3

X = F, Cl. Br, I, BPh4l CF3S〇3, CH3COO (p: tOO-p mol%)X = F, Cl. Br, I, BPh4l CF3S〇3, CH3COO (p: tOO-p mol%)

(CH2CH20)3CH3 •X+{H3CH2C(H3C)2!s H3C(OH2CH2C)3C X = F, Cl. Br, I, BPh4, CF3SO3, CH3COO (p: 100 - p mol%)(CH2CH20)3CH3 •X+{H3CH2C(H3C)2!s H3C(OH2CH2C)3C X = F, Cl. Br, I, BPh4, CF3SO3, CH3COO (p: 100 - p mol%)

X = F( CL Brt I. BPh4, CF3SO3. CH3COOX = F( CL Brt I. BPh4, CF3SO3. CH3COO

*X+{H3CH2C(H3C)2NhY^ pWN(CH3)2CH2CH3}+X-H3C(OH2CH2C)3CiX ID(CH2CH20)3CH3 X = F, Cl. Br, I, BPh4l CF35〇3, CH3COO (p: 100-pmo\%) X+{H3CH2C(H3C)2N: H3C(OH2CH2C)3«*X+{H3CH2C(H3C)2NhY^ pWN(CH3)2CH2CH3}+X-H3C(OH2CH2C)3CiX ID(CH2CH20)3CH3 X = F, Cl. Br, I, BPh4l CF35〇3, CH3COO (p: 100-pmo \%) X+{H3CH2C(H3C)2N: H3C(OH2CH2C)3«

；N(CH3)2CH2CH3}+X· O(CH2CH20)3CH3 〇〇!;N(CH3)2CH2CH3}+X·O(CH2CH20)3CH3 〇〇!

X = F, Cl. Br, I, BPh4l CF3S03t CH3COOX = F, Cl. Br, I, BPh4l CF3S03t CH3COO

l-CO]· X+{H3CH2C(H3C)2N卜^『Υ^Ν(ΟΗ3)2〇Η2α^3&gt;+Χ· H3C(OH2CH2C)3Ci^ iDtCHaCHjOJaCHs X = F, Cl. Br, I, BPh4l CF3SO3, CH3COO (p: fOO-p mol%) •X+{H3CH2C(H3C)2N: H3C(OH2CH2C)3il-CO]· X+{H3CH2C(H3C)2N卜^『Υ^Ν(ΟΗ3)2〇Η2α^3&gt;+Χ· H3C(OH2CH2C)3Ci^ iDtCHaCHjOJaCHs X = F, Cl. Br, I, BPh4l CF3SO3, CH3COO (p: fOO-p mol%) • X+{H3CH2C(H3C)2N: H3C(OH2CH2C)3i

:N(CH3)2CH2CH3p(· 0(CH2CH2〇)3CH3:N(CH3)2CH2CH3p(· 0(CH2CH2〇)3CH3

X = F. Cl. Br. I, BPh4l CF3SO3, CH3COOX = F. Cl. Br. I, BPh4l CF3SO3, CH3COO

•X^CHjCiHjCfeNhv^ rV-lNiCHa^CHaCHa}4/- HaCiOHaCHjChCi 13(^0^0)3083 X = F, Cl. Br, I. BPh4, CF3SO3, CH3COO (p : fOO-p mol%) •X+{H3CH2C(H3C)2丨 H3C(OH2CH2C)3l• X^CHjCiHjCfeNhv^ rV-lNiCHa^CHaCHa}4/- HaCiOHaCHjChCi 13(^0^0)3083 X = F, Cl. Br, I. BPh4, CF3SO3, CH3COO (p : fOO-p mol%) •X+{ H3CH2C(H3C)2丨H3C(OH2CH2C)3l

丨(oyjjCHjCHgrx· i(CH2CH20)3CH3丨(oyjjCHjCHgrx· i(CH2CH20)3CH3

X = F, Cl. Br. If BPh4, CF3S03f CH3COOX = F, Cl. Br. If BPh4, CF3S03f CH3COO

*X+{H3〇H2C(H3C)2l h3c(oh2ch2c)3&lt; X = F, a. Br, lt BPh4( CF3SO3, CH3COO (p: 100 - p mol%) (CHahCHaCHaTX- ：X+{H3CH2C(H3C)2l 0(CH2CH2〇)3CH3 H3C(OH2CH2C)3丨*X+{H3〇H2C(H3C)2l h3c(oh2ch2c)3&lt; X = F, a. Br, lt BPh4( CF3SO3, CH3COO (p: 100 - p mol%) (CHahCHaCHaTX- :X+{H3CH2C(H3C)2l 0(CH2CH2〇)3CH3 H3C(OH2CH2C)3丨

\{ΟΗ^2〇Η2〇Η^Τ ：CH2CH20)3CH3 X = Ff CL Br, I, BPh4t CF3SO3, CH3COO 119 323323 201220574\{ΟΗ^2〇Η2〇Η^Τ :CH2CH20)3CH3 X = Ff CL Br, I, BPh4t CF3SO3, CH3COO 119 323323 201220574

•X4{H3CH2C(H3C)2I Η30(ΟΗ2〇Η2〇)3&lt; X•X4{H3CH2C(H3C)2I Η30(ΟΗ2〇Η2〇)3&lt; X

[N(CH3)2CH2CH3TX· (ch2ch2o)3ch3 /-〇〇〇}[N(CH3)2CH2CH3TX· (ch2ch2o)3ch3 /-〇〇〇}

F, α Βγ· I, BPh4, CF3S〇3. CH3COO (p: fOO-p mol%)F, α Βγ· I, BPh4, CF3S〇3. CH3COO (p: fOO-p mol%)

X+{H3CH2C^H3C)2NW&quot;S (V{N(CH3)2CH2CHa}+X-H3C(OH2CH2C)3Ci^ ^0(CH2CH20)3CH3 X = F, a. Br. I, BPh4, CF3S〇3, CH3COOX+{H3CH2C^H3C)2NW&quot;S (V{N(CH3)2CH2CHa}+X-H3C(OH2CH2C)3Ci^^0(CH2CH20)3CH3 X = F, a. Br. I, BPh4, CF3S〇3, CH3COO

^{HaCHjCiHaCfcN： HaCiOHzCHzQai X^{HaCHjCiHaCfcN: HaCiOHzCHzQai X

(CHafeCHaCHa)^ &lt;CH2CH20)3CH3 F. a. Brt I, BPh4( CF3SO3, CH3COO (p: fOO-pmol%) •X*{H3CH2C(H3C)2N: HaCtOHjCHaCh'(CHafeCHaCHa)^ &lt;CH2CH20)3CH3 F. a. Brt I, BPh4( CF3SO3, CH3COO (p: fOO-pmol%) •X*{H3CH2C(H3C)2N: HaCtOHjCHaCh'

；N(CH3)2CH2CH3}+X· €Η2〇Η2〇)3〇Η3;N(CH3)2CH2CH3}+X· €Η2〇Η2〇)3〇Η3

X = F, a. Br, I, BPh4, CF3SO3, CH3C00X = F, a. Br, I, BPh4, CF3SO3, CH3C00

Ν(ΟΗ3)2〇Η2〇Η3}+χ· &lt;CH2CH20)3CH3 〇Τ{Η3ΟΗ2〇(Η3〇)2Ν&gt;-^ί rX^N(CH3)2CH2CH3}+X· H3C(OH2CH2C)3C(^ CD(CH2CH2〇)3CH3 X * F. a. Br, I, BPh4f CF3SO3. CH3COO (p: 100-p mol%) •X*{H3CH2C(H3C)2l H3C(OH2CH2C&gt;3&lt;Ν(ΟΗ3)2〇Η2〇Η3}+χ· &lt;CH2CH20)3CH3 〇Τ{Η3ΟΗ2〇(Η3〇)2Ν&gt;-^ί rX^N(CH3)2CH2CH3}+X· H3C(OH2CH2C)3C(^ CD(CH2CH2〇)3CH3 X * F. a. Br, I, BPh4f CF3SO3. CH3COO (p: 100-p mol%) • X*{H3CH2C(H3C)2l H3C(OH2CH2C&gt;3&lt;

X = F. Cl. Brf I, BRI4. CF3SO3, CH3COOX = F. Cl. Brf I, BRI4. CF3SO3, CH3COO

X+{H3CH2C(H3C)2N； H3C(OH2CH2C)3iX+{H3CH2C(H3C)2N; H3C(OH2CH2C)3i

:N(CH3)2CH2CH3)+X* (ch2ch2o)3ch3:N(CH3)2CH2CH3)+X* (ch2ch2o)3ch3

X = F, Cl. Br, I, BPh4l CF3SO3, CH3COO X+{H3CH2C(H3C)2N&gt;-/^i py-tN(CH3)2CH2CH3}+X* H3C(OH2CH2C)3aX ID(CH2CH2〇)3CH3 X = F, Cl. Br, I, BPh4, CF3S03l CH3COO (p ： 100-p mol%)X = F, Cl. Br, I, BPh4l CF3SO3, CH3COO X+{H3CH2C(H3C)2N&gt;-/^i py-tN(CH3)2CH2CH3}+X* H3C(OH2CH2C)3aX ID(CH2CH2〇)3CH3 X = F, Cl. Br, I, BPh4, CF3S03l CH3COO (p: 100-p mol%)

•)T{H3CH2C(H3C)2N: h3c(oh2ch2c)3&lt; X= F, Cl. Br, I, BPh4l CF3SO3, CH3COO (p: ίΟΟ-p mol%) :N(CH3)2CH2CHj}+X. -X*{H3CH2C(H3C)2I (CH2CH20)3CH3 H3C(OH2CH2C)3i•) T{H3CH2C(H3C)2N: h3c(oh2ch2c)3&lt; X= F, Cl. Br, I, BPh4l CF3SO3, CH3COO (p: ίΟΟ-p mol%) :N(CH3)2CH2CHj}+X. X*{H3CH2C(H3C)2I (CH2CH20)3CH3 H3C(OH2CH2C)3i

CgH口〆 :N(CH3&gt;2CH2CH3}+X_ i(CH2CH20)3CH3 X = F, Cl. Br, I, BPh4l CF3SO3, CH3COOCgH port: N(CH3&gt;2CH2CH3}+X_i(CH2CH20)3CH3 X = F, Cl. Br, I, BPh4l CF3SO3, CH3COO

X*{H3CH2C(H3C)2N； H3C(OH2CH2C)3&lt; XX*{H3CH2C(H3C)2N; H3C(OH2CH2C)3&lt;X

X+{H3CH2C(H3C&gt;2N} H3C(OHaCH2C)3&lt;X+{H3CH2C(H3C&gt;2N} H3C(OHaCH2C)3&lt;

CeH13/ '{N(CH3)2CH2CH3rX-(CH2CH20)3CH3CeH13/ '{N(CH3)2CH2CH3rX-(CH2CH20)3CH3

CbH,广、CaH17 (CHafcCHjCHa)^ (CHjC^OhCHa F, a. Br. If BPh4, CF3S〇3t CH3COO (p: fOO-pmol%)CbH, broad, CaH17 (CHafcCHjCHa)^ (CHjC^OhCHa F, a. Br. If BPh4, CF3S〇3t CH3COO (p: fOO-pmol%)

X = F, Cl. Br, I, BPh4( CF3SO3, CH3COO 120 323323 201220574 •X+{H3CH2C&lt;H3C&gt;2N} h3c(oh2ch2c&gt;3&lt;X = F, Cl. Br, I, BPh4( CF3SO3, CH3COO 120 323323 201220574 •X+{H3CH2C&lt;H3C&gt;2N} h3c(oh2ch2c&gt;3&lt;

(CH2CH20)3CH3(CH2CH20)3CH3

CeHi3〆''^_3)2ch離.XWH2C哪 H3C(OH2CH2C&gt;3&lt;CeHi3〆''^_3) 2ch is off. XWH2C which H3C(OH2CH2C&gt;3&lt;

X = F. a Br.l, BPh4, CF3S03, CHaCOO (p: 100 - p mol%)X = F. a Br.l, BPh4, CF3S03, CHaCOO (p: 100 - p mol%)

CeH13. 6{ch2ch2o)3ch3CeH13. 6{ch2ch2o)3ch3

X = Γ, Cl. Br, I, BPh4, CF3SO3, CH3C00X = Γ, Cl. Br, I, BPh4, CF3SO3, CH3C00

'{N(CH3)2CH2CH3}+X· i(CH2CH20&gt;3CH3'{N(CH3)2CH2CH3}+X· i(CH2CH20&gt;3CH3

-X+{H3CH2C(H3C)2N} H3C(OH2CH2C)3i X = F, a Br· I, BPh4. CF3S〇3, CH3C00 (p: fOO-p mol%) -Χ+{Η3ΟΗ2〇(Η30)2Ν} -\Λ ry-iNiCHafeCHzCHa)^· H3C(〇H2CH2C)3Cr^ Ι3(ΟΗ2〇Η2〇)3〇Η3 X = F, a. Br, _· BPtu cf3so3. ch3coo-X+{H3CH2C(H3C)2N} H3C(OH2CH2C)3i X = F, a Br· I, BPh4. CF3S〇3, CH3C00 (p: fOO-p mol%) -Χ+{Η3ΟΗ2〇(Η30)2Ν} -\Λ ry-iNiCHafeCHzCHa)^· H3C(〇H2CH2C)3Cr^ Ι3(ΟΗ2〇Η2〇)3〇Η3 X = F, a. Br, _· BPtu cf3so3. ch3coo

〇) H3C(OH2CH2C)3〇 ^ (^(CHzCHjOhCHs X = F. Cl. Br. I. BPh4, CF3SO3. CH3COO (p： fOO-pmol%)〇) H3C(OH2CH2C)3〇 ^ (^(CHzCHjOhCHs X = F. Cl. Br. I. BPh4, CF3SO3. CH3COO (p: fOO-pmol%)

ό〇6〇)η ：N{CH3)2CH2CH3}+X· (CH2CH20)3CH3Ό〇6〇)η :N{CH3)2CH2CH3}+X· (CH2CH20)3CH3

H3C(OH2CH2C)3&lt; X = F, Cl. Br, I, BPh4, CF3S03. CH3COOH3C(OH2CH2C)3&lt; X = F, Cl. Br, I, BPh4, CF3S03. CH3COO

Ό -X+{H3CI {N(CH3)2CH2CH3}+X* •X4{H3CH2C(H3C)2N； H3C(OH2CH2C)3^ ' G(CH2CH20)3CH3 X = F, Ct. Br, I, BPh4, CF3S〇3, CH3COO (p: 100-pmo\%) l3CH2C(H3C)2l H3C(OH2CH2C)3«Ό -X+{H3CI {N(CH3)2CH2CH3}+X* •X4{H3CH2C(H3C)2N; H3C(OH2CH2C)3^ ' G(CH2CH20)3CH3 X = F, Ct. Br, I, BPh4, CF3S〇 3, CH3COO (p: 100-pmo\%) l3CH2C(H3C)2l H3C(OH2CH2C)3«

：N(CH3)2CI (CH2CH20)3CH;:N(CH3)2CI (CH2CH20)3CH;

X= F, a Br. If BPh4l CF3S〇3. CH3COO X+{H3CH2C(H3C)2N: H3C(OH2CH2C)3lX= F, a Br. If BPh4l CF3S〇3. CH3COO X+{H3CH2C(H3C)2N: H3C(OH2CH2C)3l

{N(CH3)2CH2CH3}+Xl i(CH2CH20)3CH3{N(CH3)2CH2CH3}+Xl i(CH2CH20)3CH3

X = F, Cl· Βγ_ I, BPh( CF3S03, CH3COO (p: fOO-pmol%) (式中，p表示15至100的數 〈離子性聚合物之製造方法〉 接下來，對製造本發明所使用之離子性聚合物的方法 進行說明。製造本發明所使用之離子性聚合物的適宜方 法，可舉例如：選擇使用下述通式（36)所示之化合物作為 原料之一，並且其中含有該通式（36)中-Aa-為式（13)所示 之構造單元的化合物、該-Aa-為式（15)所示之構造單元的 121 323323 201220574 化合物、該-Aa-為式（I?)所示之構造專元的化合物及該-Aa_ 為式（20)所示之構造單元的化合物之至少1種作為必須原 料，使其進行縮合聚合的方法。 m (36) [式（36)中，Aa表示包含選自式（1)所杀之基及式（2)所示之 基所成群組中之1種以上之基與式（3)所示之1種以上之基 的重複早元’ γ4及γ5係各自獨立地表7F參與縮合聚合的 基。] 而且，在本發明所使用之離子性聚合物中，當同時含 有上述式（36)中之-Aa-所示之構造單元與前述-Aa-以外的 其他構造單元時，使用作為前述_Aa一以外的其他構造單元 之具有2個參與縮合聚合的取代基的化合物，使其與前述 式（36)所示之化合物一起共存並進行縮合聚合即可。 此等用以含有其他構造單元而使用的具有2個可縮合 ΛΚ合的取代基之化合物，係例示為式（37)所示之化合物。 如此一來，可製造出除了前述Y4-Aa-Y5所示之化合物之外， 亦使式（37)所示之化合物進行縮合聚合，而復具有-Ab-所 不之構造單元的本發明所使用之離子性聚合物。 Y ~kb'r (37) [式（37)中，Ab為前述通式（33)所示之構造單元或通式（35) 所不之構造單元，Y6及Y7係各自獨立地表示參與縮合聚合 的基。] 此等參與縮合聚合的基（γ4、γ5、γ6及Y7)，可列舉例如： 虱原子、自原子、烷基磺酸酯基、芳基磺酸酯基、芳基烷 122 323323 201220574 基石黃酸醋基、棚酸S旨殘基、疏（sulfonium)曱基、鱗 (phosphonium)曱基、膦酸酉旨（phosphonate)甲基、單鹵化 曱基、-b(oh)2、曱醯基、氰基、乙烯基等。 可被選為此等參與縮合聚合的基之鹵原子，可列舉如 氟原子、氯原子、漠原子及破原子。 而且，可被選為前述參與縮合聚合的基之烷基磺酸酯 基，係例示為曱院石黃酸酯基、乙院項酸酯基、三氟曱院續 酸酯基，芳基磺酸酯基係例示為苯磺酸酯基、對曱苯磺酸 酯基。 可被選為前述參與縮合聚合的基之芳基烷基磺酸酯 基，係例示為苄基磺酸酯基。 而且，可被選為前述參與縮合聚合的基之硼酸酯殘 基，係例示為下述式所示之基。X = F, Cl· Βγ_ I, BPh (CF3S03, CH3COO (p: fOO-pmol%) (wherein p represents a number of 15 to 100 <Method for producing an ionic polymer> Next, the present invention is manufactured) A method for producing an ionic polymer to be used in the present invention, for example, a compound represented by the following formula (36) is selected and used as a raw material, and contains In the formula (36), -Aa- is a compound of the structural unit represented by the formula (13), and the compound of the formula (A) is a compound represented by the formula (15), 121 323323 201220574 compound, and the -Aa- is a formula ( At least one of the compound of the structural unit represented by I?) and the compound of the structural unit represented by the formula (20) is used as a necessary raw material to carry out condensation polymerization. m (36) [Formula ( In the above), Aa represents one or more groups selected from the group consisting of the group of the formula (1) and the group represented by the formula (2), and one or more groups represented by the formula (3). The repeating early element 'γ 4 and γ 5 systems each independently participate in the condensation polymerization of the group 7F.] Moreover, the ionic polymer used in the present invention When the structural unit represented by -Aa- in the above formula (36) and the other structural unit other than -Aa- are contained at the same time, two constituent units other than the aforementioned _Aa- are used, and two participating condensation polymerizations are used. The compound of the substituent may be coexisted with the compound represented by the above formula (36) and subjected to condensation polymerization. The compound having two condensable chelating substituents used for containing other structural units, The compound represented by the formula (37) is exemplified. Thus, in addition to the compound represented by the above Y4-Aa-Y5, the compound represented by the formula (37) can be subjected to condensation polymerization, and An ionic polymer used in the present invention, which is not a structural unit of Y-kb'r (37) [In the formula (37), Ab is a structural unit or a general formula represented by the above formula (33). (35) In the case of the structural unit, Y6 and Y7 each independently represent a group which participates in the condensation polymerization.] The groups (γ4, γ5, γ6, and Y7) which participate in the condensation polymerization include, for example, a halogen atom and a self atom. , alkyl sulfonate group, aryl sulfonate group, aryl alkane 122 323 323 201220574 Cornerstone vinegar base, succinic acid S residue, sulfonium sulfhydryl, phosphonium sulfhydryl, phosphonate methyl, monohalogenated fluorenyl, -b(oh)2 , a mercapto group, a cyano group, a vinyl group, etc. may be selected as a halogen atom to participate in the condensation polymerization, and examples thereof include a fluorine atom, a chlorine atom, a desert atom, and a broken atom. Moreover, it may be selected as the aforementioned participation. The alkylene sulfonate group of the condensation polymerization group is exemplified by a brothel base, a phthalic acid ester group, a trifluoroanthracene acid ester group, and an aryl sulfonate group is exemplified as benzene sulfonate. Acid ester group, p-toluenesulfonate group. The arylalkylsulfonate group which may be selected as the base which participates in the condensation polymerization is exemplified as a benzylsulfonate group. Further, the boronic acid ester residue which can be selected as the group which participates in the condensation polymerization is exemplified by the group represented by the following formula.

och3 —B OCH3 OC2H5 _B 〇C2H5 ol/CH3Och3 —B OCH3 OC2H5 _B 〇C2H5 ol/CH3

_B_B

〇. H3C ch3〇. H3C ch3

o n—f 此外，可被選為前述參與縮合聚合的基之锍甲基，係 例示為下述式所示之基： -CH2S+Me2E—、或是-CH2S+Ph2E- (式中，E表示鹵原子；Ph表示苯基，以下相同）。 而且，可被選為前述參與縮合聚合的基之鱗曱基，係 例示為下述式所示之基： -CH2P+Ph3E_ (式中，E表示鹵原子）。 123 323323 201220574 而且’可被選為前述參與縮合聚合的基之膦酸酯甲 基’係例示為下述式所示之基： -CH2PO(〇Rd)2 (式中，Rd表示烷基、芳基、或芳基烷基）。 此外’可被選為前述參與縮合聚合的基之單鹵化甲 基，係例示為氟化曱基、氯化曱基、溴化曱基、碘化甲基。 此外’以參與縮合聚合之基而言，適宜的基係因聚合 ^ 反應的種類而異’例如在山本（Yamamoto)偶合反應等使用 0價鎳錯合物之情形下，可列舉如函原子、烷基磺酸酯基、 方基〜S日基、方基烧基石黃酸g旨基。此外，在龄木（Suzuk i) 偶合反應等使用鎳觸媒或鈀觸媒之情形下，可列舉如烧基 磺酸酯基、鹵原子、硼酸酯殘基、-B(〇H)2等，在以氧化劑 或以電化學性方式進行氧化聚合時，可列舉如氫原子。 製造本發明所使用之離子性聚合物時，例如亦可採用 如下之聚合方法：將具有複數個參與縮合聚合的基之前述 φ 通式（36)或（37)所示之化合物（單體）視需要而溶解; 溶媒後，使用鹼或適當的觸媒，以有機溶媒的熔點以上_ 點以下之溫度進行反應的聚合方法。如此之聚合方法 用例如：“有機反應（Organic Reactions)”，第14卷 270-490 頁，John Wiley&amp;Sons，Inc, 1965 年、“有機人 成（Organic Syntheses)” ， Collective Volume \\ 407-411 頁，John Wi ley&amp;Sons，Inc·，1988 年、化战士、^ 予外論 (Chemical Reviews;亦即 Chem. Rev·),第 95 卷，2457 頁（1995年）、有機金屬化學期刊（Journal of 323323 124 201220574On-f Further, it may be selected as the base methyl group which participates in the condensation polymerization, and is exemplified by a group represented by the following formula: -CH2S+Me2E-, or -CH2S+Ph2E- (wherein E represents A halogen atom; Ph represents a phenyl group, the same applies hereinafter). Further, it may be selected as the above-mentioned sulfhydryl group which participates in the condensation polymerization, and is exemplified by a group represented by the following formula: -CH2P+Ph3E_ (wherein E represents a halogen atom). 123 323323 201220574 and the 'phosphonomethyl group which can be selected as the group involved in the condensation polymerization is exemplified by the group represented by the following formula: -CH2PO(〇Rd)2 (wherein Rd represents an alkyl group, a aryl group) Base, or arylalkyl). Further, the monohalogenated methyl group which may be selected as the group which participates in the condensation polymerization described above is exemplified by a fluorenylfluoride group, a ruthenium chloride group, a ruthenium bromide group, and a methyl iodide group. Further, 'in view of the basis of the polymerization reaction, a suitable base system varies depending on the type of the polymerization reaction, for example, in the case of using a zero-valent nickel complex compound in a Yamamoto coupling reaction, etc., for example, a functional atom, Alkyl sulfonate group, aryl group ~ S-day group, aryl-based fluorescein g-based group. Further, in the case of using a nickel catalyst or a palladium catalyst in a Suzuk i coupling reaction, for example, a mercaptosulfonate group, a halogen atom, a boronic acid ester residue, and -B(〇H) 2 may be mentioned. For example, when oxidative polymerization is carried out by an oxidizing agent or electrochemically, a hydrogen atom is exemplified. In the production of the ionic polymer used in the present invention, for example, a polymerization method in which a plurality of compounds (monomers) represented by the above formula (36) or (37) having a plurality of groups involved in condensation polymerization are used may be employed. Dissolved as needed; after the solvent, a polymerization method in which the reaction is carried out at a temperature equal to or higher than the melting point of the organic solvent at a temperature equal to or higher than the melting point of the organic solvent using an alkali or a suitable catalyst. Such a polymerization method is, for example, "Organic Reactions", Vol. 14, pp. 270-490, John Wiley &amp; Sons, Inc, 1965, "Organic Syntheses", Collective Volume \\ 407- 411 pages, John Wiley &amp; Sons, Inc., 1988, Chemical Warrior, Chemical Review; also known as Chem. Rev., Vol. 95, p. 2457 (1995), Journal of Organometallic Chemistry ( Journal of 323323 124 201220574

Organometallic Chemistry ;亦即 J· Organomet. Chem.)， 第576卷，147頁（1999年）、高分子化學高分子研討會 (Macromolecular Chemistry MacromolecularOrganometallic Chemistry; also known as J. Organomet. Chem.), vol. 576, p. 147 (1999), Polymer Chemistry Polymers Symposium (Macromolecular Chemistry Macromolecular

Symposium;亦即 Macromol. Chem.，Macromol. Symp.)， 第12卷，229頁（1987年）所記載之公知的方法。 而且，製造本發明所使用之離子性聚合物時，亦可對 應參與縮合聚合的基而採用已知的縮合聚合反應。以如此 φ 之聚合方法而言’可列舉例如下述方法：將相符之單體藉 由鈐木偶合反應而進行聚合的方法、藉由格任亞（Grignard) 反應而進行聚合的方法、藉由Ni(0)錯合物而進行聚合的 方法、藉由FeC 13等氧化劑而進行聚合的方法、以電化學性 方式進行氧化聚合之方法、藉由分解具有適當脫離基之中 間物高分子而進行的方法等。如此之聚合反應中，藉由鈴 木偶合反應而進行聚合的方法、藉由格任亞反應而進行聚 合的方法、及藉由鎳的零價錯合物而進行聚合的方法，係 • 因所得之離子性聚合物的構造易於控制，故為較佳。 本發明所使用之離子性聚合物之較佳製造方法的丨個 態樣，係使用具有選自齒原子、烷基磺酸酯基、芳基磺酸 酯基及芳基烷基磺酸酯基所成群組中的基作為參與縮合聚 合的基之原料單體’於鎳零價錯合物的存在下進行縮^聚 口，而製造離子性聚合物的方法。如此之方法中所使用之 原料單體，可列舉例如：二_化化合物、雙（烷基磺酸酯） 化合物、雙（芳基磺酸酯）化合物、雙（芳基烷基磺酸酯）化 合物、齒-烷基磺酸酯化合物、齒-芳基磺酸酯化合物.、鹵一 323323 125 201220574 芳基烷基磺酸酯化合物、烷基磺酸醋_芳基磺酸酯化合物、 烷基磺酸酯-芳基烷基磺酸酯化合物及芳基磺酸§旨__芳基烧 基磺酸酯化合物。Symposium; also known as Macromol. Chem., Macromol. Symp.), Vol. 12, p. 229 (1987). Further, in the production of the ionic polymer used in the present invention, a known condensation polymerization reaction may be employed in accordance with the group which participates in the condensation polymerization. In the case of the polymerization method of φ, for example, a method of polymerizing a matching monomer by a eucalyptus coupling reaction, a method of performing polymerization by a Grignard reaction, and A method in which a Ni(0) complex is polymerized, a method in which polymerization is carried out by an oxidizing agent such as FeC13, a method in which an oxidative polymerization is carried out electrochemically, and an intermediate polymer having a suitable decomposing group is decomposed. Method etc. In such a polymerization reaction, a method of performing polymerization by a Suzuki coupling reaction, a method of performing polymerization by a lattice reaction, and a method of performing polymerization by a zero-valent complex of nickel are obtained. The structure of the ionic polymer is preferable because it is easy to control. A preferred embodiment of the ionic polymer used in the present invention is selected from the group consisting of a tooth atom, an alkyl sulfonate group, an aryl sulfonate group, and an aryl alkyl sulfonate group. A method in which an ionic polymer is produced by forming a group in a group as a raw material monomer of a group involved in condensation polymerization in the presence of a nickel zero-valent complex. The raw material monomers used in such a method may, for example, be a di-chemical compound, a bis(alkyl sulfonate) compound, a bis(arylsulfonate) compound, or a bis(arylalkylsulfonate). Compound, tooth-alkyl sulfonate compound, dentate-aryl sulfonate compound, halogen-323323 125 201220574 arylalkyl sulfonate compound, alkyl sulfonate vinery arylsulfonate compound, alkyl group The sulfonate-arylalkyl sulfonate compound and the arylsulfonic acid § _ aryl sulfonate compound.

前述離子性聚合物之較佳製造方法之其他的態樣，係 使用具有選自ifi原子、烷基磺酸酯基、芳基續酸自旨基、芳 基烧基確酸S旨基、-B(OH)2及删酸S旨殘基所成群、纟且中的其^乍 為參與縮合聚合的基，且全部原料單體所具有之卣原^、 烷基磺酸酯基、芳基磺酸酯基及芳基烷基磺酸酯基的莫荨 數的合計（J)與-B(〇H)2及硼酸酯殘基的莫耳數的合叶邙） 匕率實質上為1(通常K/J為〇.7至h2之範圍的原科 單體，在鎳觸媒或鈀觸媒的存在下進行縮合聚合，而 離子性聚合物的方法。 以前述有機溶媒而言，雖亦隨著所使用之化合物 應而有所不同’惟一般來說’較佳為使用為了抑制副反應 1施予充分的脫氧處理的有機溶媒。製造離子性聚人物 ==如此之有機溶媒於惰性環境下進行反二 二:::機:媒氧處理同樣地進行脫水 反應時，則不丄反應等與水之2相系下- 辛二Hi機溶媒而言’例示為:戊燒、己烧、庚烧， 辛烷衣己烷專飽和烴；苯、甲装、—一 飽和烴；四氣化碳、氣 &amp;本、-甲笨等;f 氯戊烧、演戊燒、氣=、=燒，、漠丁燒、 等鹵化飽和烴；氯笨、：茉、、:：氯環己烷、溴環己炼 ^ 一 、二氯苯等鹵化不飽和烴； 323323 126 201220574 甲醇、乙醇、丙醇、異丙醇、丁醇、第三丁基醇等醇類； 蟻酸、乙酸、丙酸等羧酸類；二曱基醚、二乙基醚、甲基_ 第三丁基醚、四氬吱喃、四氫《底喃、二嗜燒等鱗類；三甲 基胺、二乙基fee、Ν，Ν，Ν，Ν’~·四曱基伸乙基二胺、π比η定等 胺類；Ν，Ν-二曱基曱醯胺、Ν，Ν-二曱基乙醯胺、Ν, Ν-二乙 基乙醯胺、氧化Ν-曱基嗎啉等醯胺類。此等有機溶媒可使 用單獨丨種或混合2種以上。而且，如此之有機溶媒中， φ 從反應性的觀點來看’更佳為醚類，復更佳為四氫咬喃、 二乙基醚，從反應速度的觀點來看較佳為甲笨、二曱苯。 製造前述離子性聚合物時，為了使原料單體反應，較 佳為添加驗或適當的觸媒。如此之驗或觸媒，以對應採用 的聚合方法等而進行選擇為宜。以如此之驗或觸媒而言， 較佳為充分地溶解在反應所使用的溶媒中者。而且，混合 前述鹼或觸媒的方法，係例示為：在氬或氮等惰性環境下， 一面攪拌反應液一面徐缓地添加鹼或觸媒的溶液，或是將 # 反應液徐緩地添加至鹼或觸媒的溶液中之方法。 本發明所使用之離子性聚合物中，於末端基直接殘留 有聚合活性基時’所得之發光元件的發光特性或壽命特性 有降低的可能性，因此，亦可以安定的基保護末端基。如 此，在以安定的基保護末端基之情形下，當本發明所使用 之離卞性聚合物為共輕化合物時，較佳為具有該離子性聚 合物之主鏈的共軛構造與連續的共軛鍵結，以其構造而 言，可舉例如經由碳-破鍵結而與芳基或雜環基鍵結之構 造。保護如此之末端基的安定的基，可舉例如日本特開平 323323 127 201220574 9-45478號公報中以化1〇的構造式所示之丨價芳香族化合 物基等取代基。 製造包含式（1)所示之構造單元的離子性聚合物的其 他較侄方法，可列舉如於第丨夕驟聚合不具有陽離子的離 子性聚合物，於第2步驟從該離子性聚合物製造含有陽離 子的離子性聚合物的方法。第i步驟之不具有陽離子的離 子性聚合物的聚合方法，可列舉如前述之縮合聚合反應。 _第2步驟的反應可列舉如藉由金屬氣氧化物、氣氧化烧基 銨等進行之水解反應等。 製造包含式（2)所示之基的離子性聚合物的其他的較 佳方法’可列舉如於第i步驟聚合不具有離子的離子性聚 合物，於第2步驟從該離子性聚合物製造含有離子的離子 性聚合物的方法。第丨步驟之不具有離子的離子性聚合物 之聚合方法，可列舉如前述的縮合聚合反應。第2步驟之 反應吁列舉如使用齒化烷基的胺之4級銨氣化反應、藉由 參SbF5而進行之抽鹵反應（hai〇gen abstraction reaction) 等。 固本發明所使用之離子性聚合物之電荷的注入性和傳 輸性優異’故可得到以高亮度發光的元件。 形成包含離子性聚合物的層的方法，可舉例如：使用 含有離子性聚合物的溶液進行成膜的方法。 以從如此之溶液進行成膜時所使用的溶媒而言，水除 外’較佳為醇類、醚類、自旨類、腈化合物類、頌基化合物 類、i化烷基類、鹵化芳基類、硫醇類、硫化物（sulfide) 128 323323 201220574 類、亞颯類'硫酮類、蕴胺類、緣酸類等溶媒中之溶解度 參數在9.3以上的溶媒。該溶媒之例（各括弧内之值表示ς 溶媒的溶解度參數之值），可列舉例如：甲醇（12 9)、乙醇 (11.2)、2-丙醇⑴.5)小丁醇（9.9)、第三丁基醇（1〇5)、 乙腈_Π1.8)、1’2-乙烷二醇(14.7)、ΝΝ_二曱基曱醯胺 (11.£&gt;)、二曱基亞砜（12.8)、乙酸（124)、硝基苯（111)、 硝基f烷(11·0)、1’2-二氯乙烷(9. 7)、二氯甲烷(9.6)、 籲氯苯（9.6)、演苯（9.9)、二嗜燒（98)、碳酸伸丙醋 (prcwlene Carb〇nate)(13.3)、吡啶（1〇 4)、二硫化碳 (10· 0)、及此等溶媒之混合溶媒。在此，若對以2種溶媒（設 為冷媒1 /合媒2)混合而成的混合溶媒進行說明，則該混 合溶媒的溶解度參數⑹係藉由^χφι仏…求得Other aspects of the preferred method for producing the ionic polymer are those having an atomic group selected from the group consisting of an ifi atom, an alkyl sulfonate group, an aryl group, and an aryl group. B(OH)2 and the acid-depleting residue are grouped, and the oxime is a group involved in the condensation polymerization, and all the raw material monomers have a sulfonate, an alkyl sulfonate group, and a aryl group. The total number of Mo荨 numbers of the sulfonate group and the arylalkyl sulfonate group (J) and -B(〇H)2 and the mole number of the boric acid ester residue are 合) A method in which a condensation polymerization is carried out in the presence of a nickel catalyst or a palladium catalyst in the presence of a nickel-catalyst or a palladium catalyst, and the method of the ionic polymer is 1 in the case of the above-mentioned organic solvent. Although it varies depending on the compound to be used, 'in general, it is preferable to use an organic solvent for suppressing the side reaction 1 to give sufficient deoxidation treatment. Manufacture of an ionic poly character == such an organic solvent In the inert environment, the anti-two::: machine: when the deoxidation reaction is carried out in the same manner as the oxidizing treatment, the reaction is not carried out in the second phase with the water - the octane Hi machine solvent 'Examples are: pentylene, hexane, heptane, octane hexane-specific saturated hydrocarbons; benzene, A, a saturated hydrocarbon; four gasified carbon, gas & Ben, - A stupid; f chloro Calcined, exemplified, burned, gas =, = burned, diced, saturated halogenated hydrocarbons; chloroform, jasmine, :: chlorocyclohexane, bromocyclohexane, mono-, dichlorobenzene, etc. Hydrocarbon; 323323 126 201220574 Alcohols such as methanol, ethanol, propanol, isopropanol, butanol, and tert-butyl alcohol; carboxylic acids such as formic acid, acetic acid, and propionic acid; dimethyl ether, diethyl ether, methyl _ third butyl ether, tetra argon arsenic, tetrahydro thiophene, dibenzoate and other scales; trimethylamine, diethylfee, hydrazine, hydrazine, hydrazine, Ν'~· tetradecyl extended ethyl Amines such as diamines, π ratios and η; Ν, Ν-dimercaptoamine, hydrazine, Ν-dimercaptoacetamide, hydrazine, hydrazine-diethyl acetamide, ruthenium oxide-fluorenyl Further, the organic solvent may be used alone or in combination of two or more kinds. Further, in such an organic solvent, φ is more preferably an ether from the viewpoint of reactivity, and more preferably tetrahydrogen. Bite, diethyl ether, from the reaction rate From the viewpoint of the above-mentioned ionic polymer, in order to react the raw material monomer, it is preferred to add an appropriate test or a suitable catalyst for the reaction of the raw material monomer. Preferably, the polymerization method or the like is preferably selected. In such a test or catalyst, it is preferably dissolved in the solvent used for the reaction. Further, the method of mixing the alkali or catalyst is as follows: A method of slowly adding a solution of a base or a catalyst while stirring a reaction solution in an inert atmosphere such as argon or nitrogen, or slowly adding a #reaction solution to a solution of an alkali or a catalyst. In the polymer, when the polymerizable active group is directly left in the terminal group, the light-emitting property or the lifetime property of the obtained light-emitting device may be lowered. Therefore, the terminal group may be protected by a stable base. Thus, in the case of protecting the terminal group with a stable group, when the leaving polymer used in the present invention is a light-weight compound, it is preferred to have a conjugated structure and a continuous chain of the main chain of the ionic polymer. The conjugated bond may be a structure in which, for example, a bond to an aryl group or a heterocyclic group is bonded via a carbon-break bond. For example, a substituent such as an valence-valent aromatic compound group represented by a structural formula of the formula of 化 〇 323323 127 201220574 9-45478 is exemplified. Other relatively expensive methods for producing an ionic polymer comprising a structural unit represented by the formula (1) include, for example, an ionic polymer which does not have a cation at the time of the second polymerization, and the ionic polymer from the second step. A method of producing a cation-containing ionic polymer. The polymerization method of the ionic polymer having no cation in the i-th step may, for example, be a condensation polymerization reaction as described above. The reaction in the second step may, for example, be a hydrolysis reaction by a metal gas oxide, a gas oxidized ammonium halide or the like. Another preferred method for producing an ionic polymer comprising a group represented by the formula (2) is exemplified by polymerizing an ionic polymer having no ions in the i-th step, and producing from the ionic polymer in the second step. A method of containing an ionic polymer of ions. The polymerization method of the ionic polymer having no ions in the second step may be a condensation polymerization reaction as described above. The reaction of the second step is exemplified by a 4-stage ammonium gasification reaction using an amine of a dentated alkyl group, a halogenation reaction by a reference SbF5, and the like. The ionic polymer used in the present invention has excellent charge injectability and transportability, so that an element which emits light with high luminance can be obtained. The method of forming the layer containing the ionic polymer may, for example, be a method of forming a film using a solution containing an ionic polymer. In the solvent used for film formation from such a solution, water is preferably 'alcohols, ethers, self-purposes, nitrile compounds, mercapto compounds, i-alkyl groups, halogenated aryl groups. Sulfides, sulphidees, sulfides 128 323323 201220574 The class of solvents, such as sulfonamides, imidamines, and phthalic acids, have a solubility parameter of 9.3 or higher. Examples of the solvent (the values in the respective parentheses indicate the value of the solubility parameter of the oxime solvent) include, for example, methanol (12 9), ethanol (11.2), 2-propanol (1). 5) butanol (9.9), Tert-butyl alcohol (1〇5), acetonitrile_Π1.8), 1'2-ethanediol (14.7), ΝΝ-didecyl decylamine (11.£&gt;), dimercapto Sulfone (12.8), acetic acid (124), nitrobenzene (111), nitro-f-alkane (11.0), 1'2-dichloroethane (9.7), dichloromethane (9.6), chlorine Benzene (9.6), benzene (9.9), bis-burn (98), propylene carbonate (pcwlene Carb〇nate) (13.3), pyridine (1〇4), carbon disulfide (10·0), and these solvents Mixed solvent. Here, a description will be given of a mixed solvent obtained by mixing two kinds of solvents (having a refrigerant 1 / a solvent 2), and the solubility parameter (6) of the mixed solvent is obtained by ^χφι仏.

Ul為溶媒1的溶解度參數，^為溶媒1的體積分率，L 為溶媒2的溶解度參數，Φ2為溶媒2的體積分率）。 W包含離子性聚合物之層的膜厚而言，由於是隨著所 用之離子性聚合物而使最適值不同，故選擇使驅動電壓與 發光效率成為適度值者即可，並且必須為不產生針孔 (pinhole)的厚度。從使元件的驅動電壓變低之觀點來看， 忒膜厚杈佳為lnm至i ，更佳為2咖至5〇〇nm，復更佳 為2nm至200咖。從保護發光層之觀點來看，該膜厚較佳 為 5ηη 至 1 y m。 關於上述之本發明所用的離子性聚合物中之更佳的數 種具體例’以下，以實驗例之形式表示該等之合成例及使 用所合成的離子性聚合物而製作之有機EL元件。以下所示 323323 129 201220574 之實驗例為對本發明進行更加具體的說明者，惟本發明並 不限定於以下之實驗例。 聚合物之重量平均分子量（Mw)及數平均分子量（Mn)係 使用凝膠滲透層析儀（gpc)(tosoh股份公司製：ΗΙχ1 8220GPC)，以聚苯乙烯換算的重量平均分子量及數平均分 子量而求得。而且，測定之試料係以成為約〇·5重量％之濃 度的方式溶解於四氫呋喃，注入50#L至GPC。並且，GPC φ 的移動相係使用四氬呋喃’以〇.5mL/分鐘的流速進行流 動。聚合物之構造分析係使用Varian公司製3〇〇MHzNMR光 譜儀（spectrometer)，藉由解析1H-NMR而進行。而且，測 定係以使濃度成為20mg/mL之方式將試料溶解於可溶的氣 溶媒（deuterated solvent)(溶媒分子中的氫原子經氘原 子取代的溶媒）而進行。聚合物之最高被占分子軌域（H〇M〇) 的執域能量，係藉由測定聚合物的離子化位能’將所得之 離子化位能作為該軌域能量而求得。另一方面，聚合物的 鲁最低未占分子軌域（LUM0)的軌域能量，係藉由求得H0M0與 LUM0的能量差，求得其值與前述所測定之離子化位能的和 作為該執域能量。離子化位能的測定係使用光電子譜裝置 (理研計器股份有限公司製：AC-2)。而且，HOMO與LUM0 的能量差係使用紫外線/可見光/近紅外線分光光度計 (Varian公司製：Cary5E)測定聚合物的吸收光譜後，由其 吸收束端求得。 (實施例） [參考例1 ] 130 323323 201220574 2,7-二溴-9,9-雙[3-乙氧基羰基-442_[2—(2_曱氧基乙 基）乙乳基]乙氧基]求基]-苐（化合物A)之合成 _ 將2,7-二演-9-第酮（52 52)、水楊酸乙酿（154.%)、 及酼乙酸（1.4g)放入3〇〇虬的燒瓶，進行氮置換。於复 添加甲橫酸（63GmLWx饥徹夜攪拌混、^人版 一㈣w 時。將產生的固體濾出後，Ul is the solubility parameter of the solvent 1, ^ is the volume fraction of the solvent 1, L is the solubility parameter of the solvent 2, and Φ2 is the volume fraction of the solvent 2. The film thickness of the layer containing the ionic polymer is such that the optimum value differs depending on the ionic polymer to be used. Therefore, it is only necessary to select a driving voltage and a luminous efficiency to be appropriate values, and it is necessary not to generate The thickness of the pinhole. From the viewpoint of lowering the driving voltage of the element, the thickness of the ruthenium film is preferably from 1 nm to i, more preferably from 2 to 5 Å, and more preferably from 2 nm to 200 Å. The film thickness is preferably from 5 ηη to 1 y m from the viewpoint of protecting the light-emitting layer. Further, a plurality of specific examples of the ionic polymer used in the present invention are described below. Hereinafter, the synthesis examples and the organic EL devices produced by using the synthesized ionic polymer are shown in the form of experimental examples. The experimental examples of 323323 129 201220574 shown below are more specifically described in the present invention, but the present invention is not limited to the following experimental examples. The weight average molecular weight (Mw) and the number average molecular weight (Mn) of the polymer were measured by a gel permeation chromatography (gpc) (manufactured by Tosoh Co., Ltd.: ΗΙχ1 8220 GPC), and the weight average molecular weight and the number average molecular weight in terms of polystyrene. And ask for it. Further, the sample to be measured was dissolved in tetrahydrofuran so as to have a concentration of about 5% by weight, and 50#L to GPC was injected. Further, the mobile phase of GPC φ was flowed at a flow rate of mL.5 mL/min using tetrahydrofuran'. The structural analysis of the polymer was carried out by analyzing 1H-NMR using a 3 〇〇 MHz NMR spectrometer manufactured by Varian. Further, the measurement was carried out by dissolving the sample in a soluble desolvated solvent (a solvent in which a hydrogen atom in the solvent molecule was replaced by a ruthenium atom) so that the concentration became 20 mg/mL. The domain energy of the highest occupied molecular orbital domain (H〇M〇) of the polymer is determined by measuring the ionization potential of the polymer as the energy of the orbital region. On the other hand, the lowest energy of the polymer does not occupy the orbital energy of the molecular orbital domain (LUM0). The energy difference between H0M0 and LUM0 is obtained, and the sum of the value and the ionization potential measured as described above is obtained. The domain energy. The measurement of the ionization potential was carried out using an optoelectronic spectrum device (manufactured by Riken Keiki Co., Ltd.: AC-2). Further, the energy difference between HOMO and LUM0 was determined by measuring the absorption spectrum of the polymer using an ultraviolet/visible/near-infrared spectrophotometer (Cary 5E, manufactured by Varian Co., Ltd.). (Examples) [Reference Example 1] 130 323323 201220574 2,7-Dibromo-9,9-bis[3-ethoxycarbonyl-442_[2-(2-aminooxyethyl)ethyl lactyl] Synthesis of oxy]-based]-indole (Compound A) _ 2,7-di--9-ketone (52 52), salicylic acid (154.%), and indole acetic acid (1.4 g) A 3-inch flask was placed and replaced with nitrogen. Adding a yokogic acid (63GmLWx hunger and night stirring, ^ person version one (four) w. After filtering out the produced solids,

H…、ο，。使洗淨後之該固體溶解於丙酮中， 由所得㈣體騎減晶並㈣。使所得之固 體（62· g 2~(2-曱氧基乙氧基）乙氧基]-對甲笨績西交 醋（86.3g)、碳酸钟（62.6g)、及 18-冠醚-6(18-C_-6) (7‘2g)A解於 N’N_:T基甲 g請（DMI〇(67()mL)，將溶液移 至燒瓶’ M 1G5C徹夜鱗。將所得之混合物放冷至室溫 為止，添加至冰水中㈣拌丨小時。於反應液中加入氣仿 (300mL)，進仃分液萃取，藉由濃縮溶液而得到口_二漠 -9, 9-雙[3-乙氧絲基、4、[2_[2_(2_甲氧基乙氧基）乙氧 基]乙氧基]笨基合物A)(5i.2g)。H..., ο,. The washed solid is dissolved in acetone, and the resulting (four) body is subjected to crystal reduction and (iv). The obtained solid (62·g 2~(2-decyloxyethoxy)ethoxy]-p-pair of vinegar (86.3 g), carbonic acid clock (62.6 g), and 18-crown ether- 6(18-C_-6) (7'2g)A solution to N'N_:T base g (DMI〇(67()mL), transfer the solution to the flask 'M 1G5C night scale. The resulting mixture After cooling to room temperature, add to ice water (four) and mix for several hours. Add gas-like (300 mL) to the reaction solution, and extract into the mash, and concentrate the solution to obtain the mouth _ _ -9, 9-double [ 3-Ethyloxy, 4, [2_[2_(2-methoxyethoxy)ethoxy]ethoxy] phenyl] A) (5i.2g).

c〇〇c2h5 G(CH2CH2〇)3CH3 c2h5o〇c H3C(〇H2CH2C)3d 化合物 [參考例2] 2,7又（4’4,5,5~四甲基〜1，3,2-二氧雜環戊硼烷-2-基） _9H[3~ &amp;氧基幾基、f[2-[2-(2-曱氧基乙氧基）乙氧 基]乙氧基]苯基]-苐（化合物b)之合成 131 323323 201220574 於氮環境下’將化合物A(15g)、雙戊醯二硼（bis (pinacolato)diboron)(8. 9g)、[1，1’ -雙（二笨基膦基）二 茂鐵]二氣鈀（II)二氯曱烷錯合物（〇.8g)、1，Γ-雙（二笨基 膦基）二茂鐵（〇.5g)、乙酸鉀（9.4g)、二Pf烷（400mL)進行 混合’加熱至110°C，加熱回流10小時。放冷後，過渡反 應液，將濾液進行減壓濃縮。將反應混合物以甲醇洗淨3 次。使沉澱物溶解於曱苯，於溶液中加入活性碳並授拌。 之後，進行過濾，藉由將濾液減壓濃縮而得到2, 7-雙 (4, 4, 5, 5-四曱基-1，3, 2-二氧雜環戊硼烷-2-基）-9, 9-雙 [3-乙氧基羰基-4-[2-[2-(2-甲氧基乙氧基）乙氧基]乙氧 基]苯基]-第（化合物B)(11.7g)。C〇〇c2h5 G(CH2CH2〇)3CH3 c2h5o〇c H3C(〇H2CH2C)3d compound [Reference Example 2] 2,7 again (4'4,5,5~tetramethyl~1,3,2-diox Heterocyclic borane-2-yl) _9H[3~ &amp;oxy group, f[2-[2-(2-decyloxyethoxy)ethoxy]ethoxy]phenyl]- Synthesis of hydrazine (Compound b) 131 323323 201220574 Under the nitrogen environment, 'Compound A (15 g), bis (pinacolato) diboron (8.9 g), [1,1'-double (two stupid) Phosphinyl)ferrocene]digas palladium(II) dichloromethane complex (〇.8g), 1, Γ-bis(diphenylphosphino)ferrocene (〇.5g), potassium acetate (9.4 g), di Pf alkane (400 mL) was mixed and heated to 110 ° C and heated to reflux for 10 hours. After allowing to cool, the reaction mixture was allowed to flow, and the filtrate was concentrated under reduced pressure. The reaction mixture was washed 3 times with methanol. The precipitate was dissolved in toluene, activated carbon was added to the solution and the mixture was stirred. Thereafter, filtration was carried out, and the filtrate was concentrated under reduced pressure to give 2,7-bis(4,4,5,5-tetradecyl-1,3,2-dioxaborolan-2-yl). -9,9-bis[3-ethoxycarbonyl-4-[2-[2-(2-methoxyethoxy)ethoxy]ethoxy]phenyl]- (Compound B) ( 11.7g).

化合物BCompound B

[參考例3] 聚[9, 9-雙[3-乙氧基羰基-4-[2-[2-(2-曱氧基乙氧基）乙 氧基]乙氧基]苯基]-苐](聚合物A)之合成 於惰性環境下，將化合物A(0.55g)、化合物B (0· 61g)、三苯基膦鈀（〇. 〇ig)、氣化曱基三辛基銨（Aldrich 製，商品名「Aliquat336(註冊商標）」）（〇· 2〇g)、及甲苯 (10mL)進行混合，加熱至l〇5°C。於該反應液中滴下2M碳 酸鈉水溶液（6mL)，回流8小時。於反應液加入4-第三丁 323323 132 201220574 基苯基爛酸（0. Olg)，回流6小時。接下來，加入二乙二硫 胺甲酸鈉水溶液（1QmL，濃度：Q.Q5g/mL)，麟2小時。 將混合溶液滴下至甲醇_mL中擾拌1小時後，過遽所析 出的沉殿物，以2小時減壓乾燥後，溶解於四氫吱喃20mL。 將所得之溶液滴下至甲醇⑽ml、3重量％乙酸水溶液 的混合溶媒中搜拌i小時後，過濾所析出的沉澱物，溶解 於四氫呋喃20niL。將如此操作所得之溶液滴下至甲醇 φ 2〇〇mL並授掉30分鐘後，過濾所析出的沉澱物而得到固 體。使所得之固體溶解於四氫呋喃中，藉由通過氧化鋁管 柱、石夕膠管柱而進行精製。將從管柱回收的四氫呋喃溶液 進行濃縮後’滴下至曱醇（2〇〇mL)，過濾所析出的固體，使 其乾燥。所得之聚[9,9-雙[3-乙氧基羰基-4-雙[2-[2-(2-曱氧基乙氧基）乙氧基]乙氧基]苯基]_苐](聚合物A)的產 量為520mg。 聚合物A的聚苯乙烯換算之數平均分子量為5. 2xl04。 # 聚合物A係由式（A)所示之構造單元所構成。[Reference Example 3] Poly[9,9-bis[3-ethoxycarbonyl-4-[2-[2-(2-decyloxyethoxy)ethoxy]ethoxy]phenyl]-苐] (Polymer A) is synthesized under inert conditions, compound A (0.55g), compound B (0·61g), triphenylphosphine palladium (〇. 〇ig), gasified decyl trioctyl ammonium (Aldrich, trade name "Aliquat 336 (registered trademark)") (〇·2〇g), and toluene (10 mL) were mixed and heated to 10 °C. A 2 M aqueous sodium carbonate solution (6 mL) was added dropwise to the mixture and the mixture was refluxed for 8 hr. To the reaction mixture was added 4-tributyl 323323 132 201220574 phenyl phenolic acid (0. Olg), and refluxed for 6 hours. Next, an aqueous solution of sodium diethyldithiocarbamate (1QmL, concentration: Q.Q5g/mL) was added for 2 hours. The mixed solution was added dropwise to methanol_mL for 1 hour, and then the precipitated precipitate was dried under reduced pressure for 2 hours, and then dissolved in 20 mL of tetrahydrofuran. The obtained solution was added dropwise to a mixed solvent of methanol (10) ml and a 3% by weight aqueous acetic acid solution for 1 hour, and the precipitate thus precipitated was filtered and dissolved in tetrahydrofuran (20 mM). The solution thus obtained was dropped to methanol φ 2 〇〇 mL and allowed to stand for 30 minutes, and then the deposited precipitate was filtered to obtain a solid. The obtained solid was dissolved in tetrahydrofuran, and purified by passing through an alumina column and a Shixia rubber column. The tetrahydrofuran solution recovered from the column was concentrated, and then dropped to decyl alcohol (2 〇〇 mL), and the precipitated solid was filtered and dried. The resulting poly[9,9-bis[3-ethoxycarbonyl-4-bis[2-[2-(2-decyloxyethoxy)ethoxy]ethoxy]phenyl]-anthracene] The yield of (Polymer A) was 520 mg. 2xl04。 The average molecular weight of the polystyrene conversion of the polymer A is 5. 2xl04. # Polymer A is composed of structural units represented by formula (A).

聚合物A鉋鹽之合成 將聚合物A(200mg)放入l〇〇mL的燒瓶，進行氮置換。 添加四氫呋喃（20mL)及乙醇（20mL)，將混合物升溫至 133 323323 201220574Synthesis of polymer A planing salt Polymer A (200 mg) was placed in a 10 mL flask and replaced with nitrogen. Add tetrahydrofuran (20 mL) and ethanol (20 mL), and warm the mixture to 133 323323 201220574

55°C。於其中，添加使氫氧化鉋（200mg)溶解於水（2mL)而 成的水溶液，以55°C攪拌6小時。將混合物冷卻至室溫後， 將反應溶媒減壓餾除。將產生的固體以水洗淨，藉由減壓 乾燥而得到淺黃色的固體（150mg)。藉由NMR光譜確認來自 聚合物A内之乙基酯部位的乙基的信號係完全消失。將所 得之聚合物A的鉋鹽稱為共軛高分子化合物1。共軛高分 子化合物1係由式（B)所示之構造單元所構成（「全部的構 造單元中，包含選自式（1)所示之基及式（2)所示之基所成 群組中之1種以上之基與式（3)所示之1種以上之基的構造 單元的比例」及「全部的構造單元中，式（13)、（15)、（17)、 (20)所示之構造單元的比例」為1〇〇莫耳％)。共軛高分子 化合物1的HOMO之執域能量為-5. 5eV，LUM0之執域能量 為-2.7eV。55 ° C. Thereto, an aqueous solution obtained by dissolving a water-soluble planer (200 mg) in water (2 mL) was added, and the mixture was stirred at 55 ° C for 6 hours. After the mixture was cooled to room temperature, the reaction solvent was evaporated under reduced pressure. The resulting solid was washed with water and dried under reduced pressure to give a pale yellow solid (150 mg). The signal system of the ethyl group derived from the ethyl ester moiety in the polymer A was completely disappeared by NMR spectrum. The obtained planing salt of the polymer A is referred to as a conjugated polymer compound 1. The conjugated polymer compound 1 is composed of a structural unit represented by the formula (B) ("all structural units include a group selected from the group represented by the formula (1) and the group represented by the formula (2)). The ratio of one or more groups in the group to the structural unit of one or more groups represented by the formula (3)" and "all the structural units, the formulas (13), (15), (17), (20) The ratio of the structural unit shown is "1% mol%). The conjugated polymer compound 1 has a HOMO domain energy of -5. 5 eV, and the LUMO domain energy is -2.7 eV.

聚合物A鉀鹽之合成 將聚合物A(200mg)放入100mL的燒瓶，進行氮置換。 將四氫呋喃（20mL)及曱醇（10mL)進行混合，於混合溶液中 添加使氫氧化鉀（4〇〇mg)溶解於水（2mL)而成的水溶液，以 65 C槐拌1小時。於反應溶液中加入曱醇5〇‘，再以65°c 搜掉4小時。將混合物冷卻至室溫後，將反應溶媒減壓顧 134 323323 201220574 除。將產生的固體以水洗淨，藉由減壓乾燥而得到淺黃色 的固體（131mg)。藉由·R光譜確認來自聚合物A内之乙基 醋部位的乙基的信號係完全消失。將所得之聚合物A的鉀 鹽稱為共軛高分子化合物2。共軛高分子化合物2係由式 (C)所示之構造單元所構成（「全部的構造單元中，包含選 自式（1)所示之基及式（2)所示之基所成群組中之1種以上 之基與式（3)所示之1種以上之基的構造單元的比例」及 「全部的構造單元中，式（i3)、（15)、（17)、（20)所示之 構造單元的比例」為100莫耳％)。共軛高分子化合物2的 HOMO之軌域能量為_5. 5eV，LUM〇之軌域能量為_2. 7ev。Synthesis of Polymer A Potassium Salt Polymer A (200 mg) was placed in a 100 mL flask and replaced with nitrogen. Tetrahydrofuran (20 mL) and decyl alcohol (10 mL) were mixed, and an aqueous solution obtained by dissolving potassium hydroxide (4 mg) in water (2 mL) was added to the mixed solution, and the mixture was stirred at 65 C for 1 hour. To the reaction solution, sterol 5 〇 was added, and it was further searched at 65 ° C for 4 hours. After the mixture was cooled to room temperature, the reaction solvent was depressurized by 134 323323 201220574. The resulting solid was washed with water and dried (yield) to give pale yellow solid (131mg). The signal line of the ethyl group derived from the ethyl vinegar moiety in the polymer A was completely disappeared by the ?R spectrum. The potassium salt of the obtained polymer A is referred to as a conjugated polymer compound 2. The conjugated polymer compound 2 is composed of a structural unit represented by the formula (C) ("all structural units include a group selected from the group represented by the formula (1) and the group represented by the formula (2)). The ratio of one or more groups in the group to the structural unit of one or more groups represented by the formula (3)" and "all the structural units, the formulas (i3), (15), (17), (20) The ratio of the structural unit shown is "100 mol%". 7ev。 The conjugated polymer compound 2 HOMO orbital energy is _5. 5eV, LUM 〇 orbital energy is _2. 7ev.

聚合物A鈉鹽之合成 將聚合物A(200mg)放入lOOinL的燒瓶，進行氮置換。 將四氫呋喃（20mL)及曱醇（lOmL)進行混合，於混合溶液中 添加使氫氧化鈉（260mg)溶解於水（2mL)而成的水溶液，以 65 C授拌1小時。於反應溶液中加入曱醇3〇mL，再以65°e 搜掉4小時。將混合物冷卻至室溫後，將反應溶媒減壓顧 除。將產生的固體以水洗淨，藉由減壓乾燥而得到淺黃色 的固體（123mg)。藉由NMR光譜確認來自聚合物A内之乙基 顆部位的乙基的信號係完全消失。所得之聚合物A的納鹽 135 323323 201220574 係稱為共軛高分子化合物3。共軛高分子化合物3係由式 (D)所示之構造單元所構成（「全部的構造單元中，包含選 自式（1)所示之基及式（2)所示之基所成群組中之1種以上 之基與式（3)所示之1種以上之基的構造單元的比例」及 「全部的構造單元中，式（13)、（15) ' (17)、（20)所示之 構造單元的比例」為100莫耳％)。共輛高分子化合物3的 HOMO之執域能量為-5. 6eV ’ LUMO之執域能量為-2. 8eV。Synthesis of Polymer A Sodium Salt Polymer A (200 mg) was placed in a 100 inL flask and replaced with nitrogen. Tetrahydrofuran (20 mL) and decyl alcohol (10 mL) were mixed, and an aqueous solution obtained by dissolving sodium hydroxide (260 mg) in water (2 mL) was added to the mixed solution, and the mixture was stirred at 65 C for 1 hour. 3 〇 mL of sterol was added to the reaction solution, and the mixture was further searched at 65 ° for 4 hours. After the mixture was cooled to room temperature, the reaction solvent was removed under reduced pressure. The resulting solid was washed with water and dried under reduced pressure to give a pale yellow solid (123mg). The signal system of the ethyl group derived from the ethyl group in the polymer A was completely disappeared by NMR spectrum. The obtained nano-salt of the polymer A 135 323323 201220574 is referred to as a conjugated polymer compound 3. The conjugated polymer compound 3 is composed of a structural unit represented by the formula (D) ("all structural units include a group selected from the group represented by the formula (1) and the group represented by the formula (2)). The ratio of one or more groups in the group to the structural unit of one or more groups represented by the formula (3)" and "all the structural units, the formula (13), (15) ' (17), (20 The ratio of the structural unit shown is "100 mol%". The ego energy of the HOMO of the total polymer compound 3 is -5. 6eV ’ LUMO's domain energy is -2.8 eV.

聚合物A銨鹽之合成 將聚合物A(200mg)放入lOOmL的燒瓶，進行氮置換。 將四氫呋喃（20mL)及曱醇（15mL)進行混合，於混合溶液中 添加使氫氧化四曱基銨（50mg)溶解於水（imL)而成之水溶 液，以65°C攪拌6小時。於反應溶液中加入使氫氧化四曱 基銨（50mg)溶解於水（lmL)而成的水溶液，再以65°C搜掉4 小時。將混合物冷卻至室溫後，將反應溶媒減壓餾除。將 產生的固體以水洗淨，藉由減壓乾燥而得到淺黃色的固體 (150mg)。錯由NMR光譜確認來自聚合物a内之乙基醋部位 的乙基的信號係消失90%。將所得聚合物A的銨鹽稱為共 軛高分子化合物4。共軛高分子化合物4係由式（E)所示之 構造單元所構成（「全部的構造單元中，包含選自式〇)所 323323 136 201220574 示之基及式（2)所示之基所成群組中之1種以上之基與式 (3)所示之1種以上之基的構造單元的比例」及「全部的構 造單元中，式（13)、（15)、（17)、（20)所示之構造單元的 比例」為90莫耳％)。共軛高分子化合物4的HOMO之軌域 能量為-5. 6eV ’ LUM0之執域能量為-2. 8eV。Synthesis of Polymer A Ammonium Salt Polymer A (200 mg) was placed in a 100 mL flask and replaced with nitrogen. Tetrahydrofuran (20 mL) and decyl alcohol (15 mL) were mixed, and an aqueous solution obtained by dissolving tetramethylammonium hydroxide (50 mg) in water (imL) was added to the mixed solution, and the mixture was stirred at 65 ° C for 6 hours. An aqueous solution obtained by dissolving tetrakisylammonium hydroxide (50 mg) in water (1 mL) was added to the reaction solution, and the mixture was further searched at 65 ° C for 4 hours. After the mixture was cooled to room temperature, the reaction solvent was evaporated under reduced pressure. The resulting solid was washed with water and dried to give a pale yellow solid (150 mg). The signal line of the ethyl group derived from the ethyl vinegar portion in the polymer a was confirmed to be 90% by NMR spectrum. The ammonium salt of the obtained polymer A is referred to as a conjugated polymer compound 4. The conjugated polymer compound 4 is composed of a structural unit represented by the formula (E) ("all structural units include a compound selected from the group") 323323 136 201220574 and a base represented by the formula (2) "The ratio of one or more groups in the group to the structural unit of one or more types represented by the formula (3)" and "all the structural units, the formulas (13), (15), (17), (20) The ratio of the structural unit shown is "90 mol%". The ego energy of the HOMO of the conjugated polymer compound 4 is -5. 8eV.

2, 7-雙[7-(4-甲基苯基）-9, 9-二辛基苐-2-基]-9, 9-雙[3-乙氧基羰基-4-[2-[2-(2-曱氧基乙氧基）乙氧基]乙氧基] 苯基]-苐（聚合物B)之合成 於惰性環境下，將化合物A(0.52g)、2,7-雙（1，3,2-二氧雜環戊硼烷-2-基）-9,9-二辛基苐（1.29g)、三苯基膦 鈀（0. 0087g)、氯化甲基三辛基銨（Aldrich製，商品名 癱 「Ali_t336(註冊商標）」）（〇.脚）、曱苯（1〇mL)、及2M 碳酸鈉水溶液（lOmL)進行混合，加熱至8(TC。使反應液反 應3.5小時。之後，於其中，加入對溴曱苯（〇 68g)，再使 其反應2. 5小時。反應後’將反應液冷卻至室溫，加入乙 酸乙酯50mL/蒸餾水50mL並去除水層。再度加入蒸餾水 50mL並去除水層後’加入作為乾燥劑的硫酸鎂，過濾不溶 物質並去除有機溶媒。之後，使所得之殘渣再度溶於THF 10mL，添加飽和二乙二硫胺甲酸鈉水溶液2mL，攪拌30分 137 323323 201220574 鐘後’去时機料。通過氧化鮮(展開溶媒為己烧： 乙酸乙酯=1 : ；l，v/v)以進行精製，過濾所析出的沉殺物， 減壓乾燥12小時後，得到2,7-雙[7_(4_甲基苯基）_9,9_ 二辛基第-2-基]-9, 9-雙[3-乙氧基幾基_4_[2_[2_(2_甲氧 基乙氧基）乙氧基]乙氧基]笨基]-第（聚合物B)524呢。 聚合物B之聚苯乙烯換算的數平均分子量係2 〇χΐ〇3。 又，聚合物Β係如式（F)所示。2,7-bis[7-(4-methylphenyl)-9,9-dioctylindol-2-yl]-9,9-bis[3-ethoxycarbonyl-4-[2-[ Synthesis of 2-(2-decyloxyethoxy)ethoxy]ethoxy]phenyl]-indole (Polymer B) in an inert environment, Compound A (0.52 g), 2,7-double (1,3,2-dioxaborolan-2-yl)-9,9-dioctylfluorene (1.29 g), triphenylphosphine palladium (0.087 g), methyltrisyl chloride The ammonium amide (manufactured by Aldrich, trade name "Ali_t336 (registered trademark)") (〇.), benzene (1 〇 mL), and 2M sodium carbonate aqueous solution (10 mL) were mixed and heated to 8 (TC). The liquid was reacted for 3.5 hours. Thereafter, p-bromopyridinium benzene (68 g) was added, and the reaction was further carried out for 2.5 hours. After the reaction, the reaction solution was cooled to room temperature, and ethyl acetate 50 mL / distilled water 50 mL was added and removed. After adding 50 mL of distilled water and removing the water layer, 'added magnesium sulfate as a desiccant, filtered the insoluble matter and removed the organic solvent. Then, the obtained residue was dissolved again in THF 10 mL, and a saturated aqueous solution of sodium dithiodithioate was added. 2mL, stirring 30 minutes 137 323323 201220574 after the clock Purification was carried out by oxidizing fresh (developing solvent was hexane: ethyl acetate = 1:1, v/v), and the precipitated precipitate was filtered, and dried under reduced pressure for 12 hours to obtain 2,7-bis [7_ (4-methylphenyl)_9,9-dioctyl-2-yl]-9,9-bis[3-ethoxymethyl_4_[2_[2_(2-methoxyethoxy) Ethoxy]ethoxy]]]] (polymer B) 524. The polystyrene-equivalent number average molecular weight of the polymer B is 2 〇χΐ〇 3. Further, the polymer lanthanum is as defined (F ) shown.

聚合物Β鉋鹽之合成 將聚合物B(262mg)放入l〇〇mL的燒瓶，進行氬置換。 於其中添加四氫呋喃（10mL)及甲醇（l5mL)，將混合物升溫 至55C。於其中，添加使氫氧化铯（341mg)溶解於水（imL) 而成的水溶液，以55°C攪拌5小時。將所得之混合物冷卻 • 至室溫後，將反應溶媒減壓餾除。將產生的固體以水洗淨， 藉由減壓乾燥而得到淺黃色的固體（250mg)。藉由NMR光譜 確認來自乙基酯部位之乙基的信號係完全消失。將所得之 聚合物B絶鹽稱為共輛南分子化合物5。共輛高分子化合 物5係如式（G)所示（「全部的構造單元中，包含選自式（1) 所示之基及式（2)所示之基所成群組中之1種以上之基與 式（3)所示之1種以上之基的構造單元的比例」及「金部的 構造單元中，式（13)、（15)、（17)、（20)所示之構造單元 的比例」係以小數第二位進行四捨五入後為33.3莫耳 138 323323 201220574 %。）。共輛尚分子化合物5的HOMO之軌域能量為6eV， LUM0之軌域能量為-2. 6eV。Synthesis of polymer crater salt Polymer B (262 mg) was placed in a 10 mL flask and subjected to argon replacement. Tetrahydrofuran (10 mL) and methanol (15 mL) were added thereto, and the mixture was warmed to 55 C. An aqueous solution obtained by dissolving cesium hydroxide (341 mg) in water (imL) was added thereto, and the mixture was stirred at 55 ° C for 5 hours. The resulting mixture was cooled. • After room temperature, the reaction solvent was evaporated under reduced pressure. The resulting solid was washed with water and dried to give a pale yellow solid (250 mg). The signal system of the ethyl group derived from the ethyl ester moiety was completely disappeared by NMR spectroscopy. The obtained polymer B sequestration salt is referred to as a co-car South Compound No. 5. The total polymer compound 5 is represented by the formula (G) ("all of the structural units include one selected from the group represented by the formula (1) and the group represented by the formula (2)). The ratio of the above base to the structural unit of one or more types represented by the formula (3) and the structural unit of the gold portion are represented by the formulas (13), (15), (17), and (20). The proportion of tectonic units is rounded off by the second decimal place to be 33.3 m 138 323323 201220574%.). The total orbital energy of the HOMO is 6 eV, and the orbital energy of LUM0 is -2.6 eV.

聚合物C之合成 於惰性環境下，將化合物A(0.40g)、化合物B φ (〇.498)、义^-雙（4-溴苯基）-氷?1’-雙（4-第三丁基-2,6-一甲基本基）1，4-伸本基二胺（35mg)、三苯基鱗抱（8rog)、 氣化曱基三辛基銨（Aldrich製，商品名「Aliquat336(註 冊商標）」）（〇.20g)、及甲苯（i〇mL)進行混合，加熱至 105°C。於此反應液中滴下2M碳酸鈉水溶液（6mL)，回流8 小時。於反應液中加入苯基硼酸（〇· 〇1 g)，回流6小時。接 下來’加入一乙二硫胺甲酸納水溶液（1 OmL，濃度： 0.05g/mL) ’攪拌2小時。將混合溶液滴下至甲醇3〇〇mL中 ® 並攪拌1小時後，過濾所析出的沉澱物，減壓乾燥2小時， 溶解於四氫呋喃20mL。將所得之溶液滴下至曱醇i2〇mi、3 重量％乙酸水溶液50mL的混合溶媒中並攪拌1小時後，過 據所析出的沉殿物’溶解於四氫呋喃2〇mL。將如此操作所 得之溶液滴下至甲醇200mL並攪拌30分鐘後，過濾所析出 的沉澱物而得到固體。使所得之固體溶解於四氫呋喃中， 藉由通過氧化鋁管柱、矽膠管柱而進行精製。將從管柱回 收的四氫呋喃溶液進行濃縮後，滴下至曱醇（2〇〇mL)體，過 濾所析出的固體，使其乾燥。所得之聚合物c的產量為 323323 139 201220574 526mg。 聚合物C之聚苯乙婦換算的數平均分子量為3· 6χi〇4。 聚合物C係由式（Η)所不之構造早元所構成。 又，1『-雙（4-溴笨基）-叱|\[，~雙（4-第三丁基-2,6-一甲基本基）1，4-伸本基二胺可依據例如日本特開2〇〇8_ 74917號公報所記載的方法進行合成。Synthesis of Polymer C in an inert environment, Compound A (0.40g), Compound B φ (〇.498), Yi^-bis(4-bromophenyl)-ice-1'-double (4-third Butyl-2,6-monomethyl-based) 1,4-extension-based diamine (35 mg), triphenyl scales (8 rog), gasified decyltrioctyl ammonium (manufactured by Aldrich, trade name "Aliquat 336" (registered trademark) ") (〇.20g) and toluene (i〇mL) were mixed and heated to 105 °C. 2M sodium carbonate aqueous solution (6 mL) was added dropwise to the reaction mixture, and refluxed for 8 hours. Phenylboronic acid (〇·〇1 g) was added to the reaction solution, and the mixture was refluxed for 6 hours. Next, an aqueous solution of sodium thiodithioate (1 OmL, concentration: 0.05 g/mL) was added to stir for 2 hours. The mixed solution was dropped into methanol 3 mL of mL and stirred for 1 hour, and the deposited precipitate was filtered, dried under reduced pressure for 2 hours, and dissolved in 20 mL of tetrahydrofuran. The obtained solution was added dropwise to a mixed solvent of decyl alcohol i2〇mi and a 3 wt% aqueous acetic acid solution of 50 mL, and the mixture was stirred for 1 hour, and then the precipitated precipitate was dissolved in 2 mL of tetrahydrofuran. The solution thus obtained was added dropwise to 200 mL of methanol and stirred for 30 minutes, and then the deposited precipitate was filtered to give a solid. The obtained solid was dissolved in tetrahydrofuran, and purified by passing through an alumina column and a ruthenium column. The tetrahydrofuran solution recovered from the column was concentrated, and then dropped to a methanol (2 mL) body, and the precipitated solid was filtered and dried. The yield of the obtained polymer c was 323323 139 201220574 526 mg. The number average molecular weight of the polystyrene converted by the polymer C was 3·6χi〇4. The polymer C is composed of the structure of the formula (Η). Further, 1 "-bis(4-bromophenyl)-oxime|\[,~bis(4-tert-butyl-2,6-monomethyl) 1,4-extension-based diamine can be, for example, The method described in Japanese Laid-Open Patent Publication No. Hei. No. Hei.

[實驗例6] 聚合物C絶鹽之合成 將聚合物C(200mg)放入lOOmL的燒瓶，進行氮置換。 添加四氫呋喃（20mL)及曱醇（20mL)進行混合。於混合溶液 中添加使氫氧化鉋（200mg)溶解於水（2mL)而成的水溶液， φ 以65°C攪拌1小時。於反應溶液中加入甲醇30mL，再以 65°C攪拌4小時。將混合物冷卻至室溫後，將反應溶媒減 壓餾除。將產生的固體以水洗淨’藉由減壓乾燥而得到淺 黃色的固體（150mg)。藉由NMR光譜確認來自聚合物c内的 乙基酯部位之乙基的信號係完全消失。將所得之聚合物c 的絶鹽稱為共辆高分子化合物6。共輛高分子化合物6係 由式（I)所示之構造單元所構成（「全部的構造單元中，包 含選自式（1)所示之基及式（2)所示之基所成群組中之1種 以上之基與式（3)所示之1種以上之基的構造單元的比例」 323323 140 201220574 及「全部的構造單元中，式（13)、（15)、（17)、（20)所示 之構造單元的比例」為95莫耳。/。）。共軛高分子化合物6的 HOMO之執域能量為-5. 3eV，LUM0之轨域能量為-2. 6eV。[Experimental Example 6] Synthesis of polymer C sequestration salt Polymer C (200 mg) was placed in a 100 mL flask and replaced with nitrogen. Tetrahydrofuran (20 mL) and decyl alcohol (20 mL) were added and mixed. An aqueous solution obtained by dissolving a water-soluble planer (200 mg) in water (2 mL) was added to the mixed solution, and φ was stirred at 65 ° C for 1 hour. 30 mL of methanol was added to the reaction solution, followed by stirring at 65 ° C for 4 hours. After the mixture was cooled to room temperature, the reaction solvent was depressurized and distilled off. The resulting solid was washed with water to give a pale yellow solid (150 mg). The signal of the ethyl group derived from the ethyl ester moiety in the polymer c was completely disappeared by NMR spectroscopy. The obtained salt of the polymer c is referred to as a total of the polymer compound 6. The total polymer compound 6 is composed of a structural unit represented by the formula (I) ("all structural units include a group selected from the group represented by the formula (1) and the group represented by the formula (2)). The ratio of one or more groups in the group to the structural unit of one or more groups represented by the formula (3)" 323323 140 201220574 and "All the structural units, the formulas (13), (15), (17) The ratio of the structural unit shown in (20) is 95 mol. /.). 6eV。 The conjugated polymer compound 6 HOMO domain energy is -5. 3eV, LUM0 orbital energy is -2.6e.

(95:5 mol%) [參考例6](95:5 mol%) [Reference Example 6]

聚合物D之合成Synthesis of polymer D

於惰性環境下，將化合物A(0.55g)、化合物B (0. 67g)、Ν，Ν’ -雙（4-溴苯基）-Ν，Ν’ -雙（4-第三 丁基一2, 6_ 二曱基苯基）1，4~伸苯基二胺（〇.〇38g)、3,7-二溴_ν-(4- 正丁基苯基）啡d井〇.〇〇9g、三苯基膦鈀（〇.〇lg)、氯化甲基 三辛基銨（Aldrich製，商品名「Aliquat336(註冊商標）」） (0. 20g)、及甲笨（10mL)進行混合’加熱至ι〇5ΐ。於該反 應液中滴下2Μ碳酸鈉水溶液（6mL)，回流2小時。於反應 液中加入苯基硼酸（〇· 004g)，回流6小時。接下來，加入 二乙二硫胺甲酸鈉水溶液（l〇mL，濃度：〇. 〇5g/mL)，攪拌 2小時。將混合溶液滴下至曱醇3〇〇mL中並攪拌1小時後， 過濾所析出的沉澱物並減壓乾燥2小時，溶解於四氫呋喃 20mL。將所得之溶液滴下至曱醇12〇mL、3重量％乙酸水溶 液50mL的混合溶媒中並攪拌丨小時後，過濾所析出的沉澱 物，/谷解於四氫吱喃2〇‘。將如此操作所得之溶液滴下至 曱醇200mL並攪拌30分鐘後，過濾所析出的沉澱物而得到 323323 141 201220574 固體。使所得之固體溶解於四氫呋喃中，藉由 管&quot;膠管柱而進行精製。將從管柱回== 液進行濃縮後，滴下至甲醇（200mL)，過濾所析出的固體， 使其乾燥。所得之聚合物D的產量為590mg。 聚合物D之聚笨乙稀換算的數平均分子量為2 7χΐ〇4。 聚合物D係由式（J)所示之構造單元所構成。 又，3, 7-二溴-Ν-(4-正丁基笨基）啡啡係依照曰本特開Compound A (0.55g), Compound B (0.67g), hydrazine, Ν'-bis(4-bromophenyl)-indole, Ν'-bis(4-tert-butyl- 2 in an inert environment , 6_ Dimercaptophenyl) 1,4~phenylenediamine (〇.〇38g), 3,7-dibromo-ν-(4-n-butylphenyl)morphine d.〇〇9g , triphenylphosphine palladium (〇.〇lg), methyl trioctyl ammonium chloride (manufactured by Aldrich, trade name "Aliquat 336 (registered trademark)") (0. 20g), and a stupid (10mL) for mixing ' Heat to ι〇5ΐ. A 2 N aqueous solution of sodium carbonate (6 mL) was added dropwise to the mixture and refluxed for 2 hr. Phenylboronic acid (〇·004g) was added to the reaction solution, and the mixture was refluxed for 6 hours. Next, an aqueous solution of sodium diethyldithiocarbamate (10 mL, concentration: 〇. 〇 5 g/mL) was added, and the mixture was stirred for 2 hours. The mixed solution was added dropwise to 3 mL of methanol to stir for 1 hour, and the precipitate thus obtained was filtered and dried under reduced pressure for 2 hours, and dissolved in 20 mL of tetrahydrofuran. The obtained solution was dropped into a mixed solvent of 12 mL of decyl alcohol and 50 mL of a 3% by weight aqueous acetic acid solution, and stirred for a few hours, and then the deposited precipitate was filtered, and the solution was dissolved in tetrahydrofuran. The solution thus obtained was dropped to 200 mL of methanol and stirred for 30 minutes, and then the precipitate was filtered to give 323323 141 201220574 solid. The obtained solid was dissolved in tetrahydrofuran and purified by a tube &quot;loop. After concentrating from the column back == liquid, it was dropped to methanol (200 mL), and the precipitated solid was filtered and dried. The yield of the obtained polymer D was 590 mg. The number average molecular weight of the polystyrene ethylene of the polymer D was 2 7 χΐ〇4. The polymer D is composed of structural units represented by the formula (J). Also, 3,7-dibromo-indole-(4-n-butylphenyl)morphine is opened according to 曰本特

2007-70620號所記載的方法，或參考日本特開2004- 137456號公報所記載的方法而進行合成。The method described in No. 2007-70620 is synthesized by the method described in JP-A-2004-137456.

聚合物D铯鹽之合成Synthesis of polymer D sulfonium salt

c4h9 (J) 將聚合物D(200mg)放入l〇〇raL的燒瓶，進行氮置換。 將四氫呋喃（15mL)及曱醇（l〇mL)進行混合。於混合溶液中 添加使氫氧化鉋（360mg)溶解於水（2mL)而成的水溶液，以 65C攪拌3小時。於反應溶液中加入甲醇i〇mL，再以65。〇 攪拌4小時。將混合物冷卻至室溫後，將反應溶媒減壓餾 除。將產生的固體以水洗淨’藉由減壓乾燥而得到淺黃色 的固體（210mg)。藉由NMR光譜確認來自聚合物D内之乙基 醋部位的乙基的信號係完全消失。將所得之聚合物D的鉋 鹽稱為共軛高分子化合物7。共軛高分子化合物7係由式 142 323323 201220574 (κ)所示之構造單元所構成（「全部的構造單元中’包含選 自式（1)所示之基及式（2)所示之基所成群組中之1種以上 之基與式（3)所示之1種以上之基的構造單元的比例」及 「全部的構造單元中，式（13)、（15)、（17)、（20)所示之 構造單元的比例」為90莫耳％)。共軛高分子化合物7的 HOMO之執域能量為-5. 3eV，LUM0之軌域能量為_2· 4eV。C4h9 (J) Polymer D (200 mg) was placed in a l〇〇raL flask and replaced with nitrogen. Tetrahydrofuran (15 mL) and decyl alcohol (10 mL) were mixed. An aqueous solution obtained by dissolving a water-soluble planer (360 mg) in water (2 mL) was added to the mixed solution, and the mixture was stirred at 65 C for 3 hours. Methanol i〇mL was added to the reaction solution, followed by 65.搅拌 Stir for 4 hours. After the mixture was cooled to room temperature, the reaction solvent was evaporated under reduced pressure. The resulting solid was washed with water to give a pale yellow solid (210 mg). The signal system of the ethyl group derived from the ethyl vinegar moiety in the polymer D was completely disappeared by NMR spectroscopy. The obtained salt of the polymer D is referred to as a conjugated polymer compound 7. The conjugated polymer compound 7 is composed of a structural unit represented by the formula 142 323323 201220574 (κ) ("All structural units" include a group selected from the group represented by the formula (1) and a group represented by the formula (2). The ratio of one or more groups in the group to the structural unit of one or more types represented by the formula (3) and "all the structural units, the formulas (13), (15), (17) The ratio of the structural unit shown in (20) is 90% by mole. The HOMO of the conjugated polymer compound 7 has a domain energy of -5.3 eV, and the orbital energy of LUM0 is _2·4 eV.

(K) c4h9 [參考例7] 聚合物E之合成 於惰性環境下，將化合物A(0.37g)、化合物b (0.82g)、1,3-二溴苯（0.09g)、三苯基膦鈀（O.Olg)、氣化 曱基三辛基錢（Aldrich製，商品名「Aliquat336(註冊商 Φ 標）」）（〇· 20g)、及曱苯（10mL)進行混合，加熱至1〇5。〇。 於該反應液中滴下2M碳酸鈉水溶液（6mL)，回流7小時。 於反應液中加入苯基删酸（〇.〇〇2g)，回流1〇小時。接下 來，加入一乙二硫胺曱酸鈉水溶液（i〇mL，濃度：〇.〇5g/ mL) ’攪拌1小時。將混合溶液滴下至曱醇3〇〇mL中並授掉 1小時後’過濾所析出的沉澱物並減壓乾燥2小時，溶解 於四氫呋喃20mL。將所得之溶液滴下至曱醇i2〇mL、3重 量％乙酸水溶液50mL的混合溶媒中並攪拌丨小時後’過滹 所析出的沉澱物，溶解於四氫呋喃2〇mL。將如此操作所得 323323 143 201220574 之溶液滴下至甲醇驗L麵拌3()分鐘後，過濾所析出的 沉澱物而得到固體。使所得之固體溶解於四氫咬喃中，藉 由通過氧㈣管柱、鄉管柱而進行精製。將從管柱回收 的四氫咬喃溶液進行濃縮後，滴下至甲醇⑽…，過爐所 析出的固體，使其乾燥。所得之聚合物E的產量為293mg。 聚合物E之聚苯乙稀換算的數平均分子量為 聚合物E係由式（L)所示之構造單元所構成。(K) c4h9 [Reference Example 7] Synthesis of Polymer E Compound A (0.37 g), Compound b (0.82 g), 1,3-dibromobenzene (0.09 g), triphenylphosphine under an inert atmosphere Palladium (O.Olg), gasified mercapto trioctyl (manufactured by Aldrich, trade name "Aliquat 336 (registered Φ)") (〇·20g), and benzene (10mL) were mixed and heated to 1〇. 5. Hey. 2M sodium carbonate aqueous solution (6 mL) was added dropwise to the reaction mixture, and the mixture was refluxed for 7 hr. To the reaction mixture was added phenyl acid (2 g) to reflux for 1 hour. Next, an aqueous solution of sodium edetate (i 〇 mL, concentration: 〇. 〇 5 g / mL) was added and stirred for 1 hour. The mixed solution was added dropwise to 3 〇〇mL of sterol and allowed to stand for 1 hour, and the precipitate thus precipitated was filtered and dried under reduced pressure for 2 hours, and dissolved in 20 mL of tetrahydrofuran. The obtained solution was added dropwise to a mixed solvent of decyl alcohol i2 〇 mL and 3% by weight acetic acid aqueous solution 50 mL, and stirred for a few hours, and the precipitate precipitated was dissolved in 2 〇 mL of tetrahydrofuran. The solution of 323323 143 201220574 thus obtained was dripped until it was mixed with methanol for 3 minutes, and the precipitate was filtered to obtain a solid. The obtained solid was dissolved in tetrahydroanthracene and purified by passing through an oxygen (four) column and a column. The tetrahydrogenate solution recovered from the column was concentrated, and then dropped to methanol (10), and the solid precipitated in the furnace was dried. The yield of the obtained polymer E was 293 mg. The number average molecular weight of the polymer E in terms of polystyrene is that the polymer E is composed of the structural unit represented by the formula (L).

聚合物E鉋鹽之合成 將聚合物E(200mg)放入l〇〇mL的燒瓶，進行氣置換。 將四氫呋喃（10mL)及甲醇（5mL)進行混合。於混合溶液中添 加使氫氧化铯（200mg)溶解於水（2mL)而成的水溶液，以 65°C攪拌2小時。於反應溶液中加入甲醇i〇mL，再以65°C 攪拌「〕小時。將混合物冷卻至室溫後，將反應溶媒減壓餾 除。將產生的固體以水洗淨，藉由減壓乾燥而得到淺黃色 的固體（170mg)。藉由NMR光譜確認來自聚合物E内之乙基 酯部位的乙基的信號係完全消失。將所得之聚合物E的鉋 鹽稱為共輛高分子化合物8。共軛高分子化合物8係由式 (M)所示之構造單元所構成（「全部的構造單元中，包含選 144 323323 201220574 自式（1)所示之基及式（2)所示之基所成群組中之1種以上 之基興式（3)所示之1種以上之基的構造單元的比例」及 「全部的構造單元中’式（13)、（15)、（17)、（20)所示之 構造單元的比例」為75莫耳％)。共軛高分子化合物8的Synthesis of polymer E-planar salt Polymer E (200 mg) was placed in a 10 mL flask and gas-substituted. Tetrahydrofuran (10 mL) and methanol (5 mL) were mixed. An aqueous solution obtained by dissolving cesium hydroxide (200 mg) in water (2 mL) was added to the mixed solution, and the mixture was stirred at 65 ° C for 2 hours. Methanol i〇mL was added to the reaction solution, and the mixture was stirred for "hours" at 65 ° C. After cooling the mixture to room temperature, the reaction solvent was distilled off under reduced pressure. The resulting solid was washed with water and dried under reduced pressure. A pale yellow solid (170 mg) was obtained. It was confirmed by NMR spectroscopy that the signal of the ethyl group from the ethyl ester moiety in the polymer E completely disappeared. The obtained polymer E was referred to as a co-polymer compound. 8. The conjugated polymer compound 8 is composed of a structural unit represented by the formula (M) ("all structural units include a radical represented by the formula (1) and a formula (2) as shown in 144 323323 201220574) The ratio of one or more types of structural units of one or more types of bases represented by the formula (3) in the group of the base group and the formula (13), (15), (in all the structural units) The ratio of the structural unit shown in 17) and (20) is "75 mol%". Conjugated polymer compound 8

聚合物F之合成 於惰性環境下’將化合物趴1.012)、1，4-二溴-2,3, 5,6-四氟苯（0.30g)、三苯基膦鈀（0.02g)、氯化曱基三辛 基銨（Aldrich製，商品名「Aliquat336(註冊商標）」） (0. 20g)、及甲苯（i〇mL)進行混合，加熱至i〇5°c。於該反 φ 應液中滴下2M碳酸鈉水溶液（6mL)，回流4小時。於反應 液中加入苯基硼酸（〇· 〇〇2g)，回流4小時。接下來，加入 二乙二硫胺甲酸鈉水溶液（l〇mL，濃度：〇. 〇5g/mL)，攪拌 1小時。將混合溶液滴下至曱醇3〇〇mL中並攪拌1小時後， 過濾所析出的沉澱物並減壓乾燥2小時，溶解於四氫呋喃 20mL °將所得之溶液滴下至曱醇i2〇mL、3重量％乙酸水溶 液50mL的混合溶媒中並攪拌1小時後，過濾所析出的沉踝 物’溶解於四氫呋喃2〇mL。如此操作所得之溶液滴下至甲 醇200mL並攪拌30分鐘後，過濾所析出的沉澱物而得到固 145 323323 201220574 體。將所得之固體溶解於四氫呋喃/乙酸乙酯（ι/ι(體積比）） 的混合溶媒，藉由通過氧化鋁管柱、矽膠管柱而進行精製。 將從管柱回收的四氫呋喃溶液進行濃縮後，滴下至曱醇 (200mL)，過濾所析出的固體，使其乾燥。所得之聚合物E 的產量為343mg。 聚合物F之聚苯乙烯換算的數平均分子量為6. OxlO4。 聚合物F係由式（N)所示之構造單元所構成。Synthesis of polymer F in an inert environment 'compound 趴1.012), 1,4-dibromo-2,3,5,6-tetrafluorobenzene (0.30 g), triphenylphosphine palladium (0.02 g), chlorine The hydrazinyl trioctyl ammonium (manufactured by Aldrich, trade name "Aliquat 336 (registered trademark)") (0. 20 g) and toluene (i 〇 mL) were mixed and heated to i 〇 5 ° C. 2M sodium carbonate aqueous solution (6 mL) was added dropwise to the anti-φ solution, and the mixture was refluxed for 4 hours. Phenylboronic acid (〇·〇〇2g) was added to the reaction solution, and the mixture was refluxed for 4 hours. Next, an aqueous solution of sodium diethyldithiocarbamate (10 mL, concentration: 〇. 〇 5 g/mL) was added, and the mixture was stirred for 1 hour. The mixed solution was added dropwise to 3 〇〇mL of methanol and stirred for 1 hour. The precipitate was filtered and dried under reduced pressure for 2 hours, dissolved in tetrahydrofuran 20 mL, and the obtained solution was dropped to sterol i2 〇 mL, 3 weight. After stirring in a mixed solvent of 50 mL of an aqueous acetic acid solution for 1 hour, the deposited precipitate was filtered and dissolved in 2 mL of tetrahydrofuran. The solution thus obtained was dropped to 200 mL of methanol and stirred for 30 minutes, and then the deposited precipitate was filtered to obtain a solid 145 323323 201220574. The obtained solid was dissolved in a mixed solvent of tetrahydrofuran/ethyl acetate (m/m (volume ratio)), and purified by passing through an alumina column and a silica gel column. The tetrahydrofuran solution recovered from the column was concentrated, and then dropped to methanol (200 mL), and the precipitated solid was filtered and dried. The yield of the obtained polymer E was 343 mg. OxlO4。 The polystyrene-equivalent number average molecular weight of the polymer F is 6. OxlO4. The polymer F is composed of a structural unit represented by the formula (N).

聚合物F铯鹽之合成 將聚合物F(150mg)放入100mL的燒瓶，進行氮置換。 將四氫呋喃（1 〇 m L )及曱醇（5 m L)進行混合。於混合溶液中添 加使氫氧化鉋（260mg)溶解於水（2mL)而成的水溶液，以 65°C攪拌2小時。於反應溶液中加入曱醇10mL，再以65°C 攪拌5小時。將混合物冷卻至室溫後，將反應溶媒減壓餾 除。將產生的固體以水洗淨，藉由減壓乾燥而得到淺黃色 的固體（130mg)。藉由NMR光譜確認來自聚合物E内之乙基 酯部位的乙基的信號係完全消失。所得之聚合物F的鉋鹽 稱為共軛高分子化合物9。共軛高分子化合物9係由式（0) 所示之構造單元所構成（「全部的構造單元中，包含選自式 146 323323 201220574 (1)所示之基及式（2)所示之基所成群組中之1種以上之基 與式（3)所示之1種以上之基的構造單元的比例」及「食部 的構造單元中，式（13)、（15)、（17)、（20)所示之構造單 元的比例」為75莫耳？〇。共輛向分子化合物9的HOMO之 軌域能量為-5. 9eV，LUM0之轨域能量為-2. 8eV。Synthesis of polymer F sulfonium salt Polymer F (150 mg) was placed in a 100 mL flask and replaced with nitrogen. Tetrahydrofuran (1 〇 m L ) and decyl alcohol (5 m L) were mixed. To the mixed solution, an aqueous solution obtained by dissolving a water-soluble planer (260 mg) in water (2 mL) was added, and the mixture was stirred at 65 ° C for 2 hours. To the reaction solution, 10 mL of methanol was added, followed by stirring at 65 ° C for 5 hours. After the mixture was cooled to room temperature, the reaction solvent was evaporated under reduced pressure. The resulting solid was washed with water and dried to give a pale yellow solid (130 mg). The signal system of the ethyl group derived from the ethyl ester moiety in the polymer E was completely disappeared by NMR spectrum. The obtained planing salt of the polymer F is referred to as a conjugated polymer compound 9. The conjugated polymer compound 9 is composed of a structural unit represented by the formula (0) ("all structural units include a group selected from the group represented by the formula 146 323323 201220574 (1) and the group represented by the formula (2)). "The ratio of one or more groups in the group to the structural unit of one or more types represented by the formula (3)" and "the structural unit of the food portion, the formulas (13), (15), (17) And the orbital energy of the LUM0 is -2. 8eV. The orbital energy of the HOMO of the molecular compound is -5.

[參考例9] 於惰性環境下，將2-[2-(2-曱氧基乙氧基）乙氧基]-對曱苯磺酸酯（11. 〇g)、三乙二醇（30. Og)、氳氧化鉀（3. 3g) 進行混合，以100°C加熱攪拌18小時。放冷後，於反應溶 液中加入水（100mL)，以氯仿進行分液萃取，將溶液濃縮。 將經漢縮的溶液進行球管蒸潑（Kugelrohr disti 1 lation) (10mm 托（Torr)，180°C)，而得到 2-（2_(2-(2-(2_(2-曱氧 基乙氧基）-乙氧基）-乙氧基）-乙氧基）-乙氧基）乙醇 (6. lg)。 [參考例10] 於惰性環境下，將2-(2-(2-(2-(2-(2-甲氧基乙氧基）-乙氧基）-乙氧基）-乙氧基）-乙氧基）乙醇（8. 0g)、氫氧化鈉 (1.4g)、蒸餾水（2mL)、四氫呋喃（2mL)進行混合後’予以 冰冷。於混合溶液中耗費30分鐘滴加對甲苯磺醯氯 147 323323 201220574 (p-tosyl chloride)(5. 5g)的四氳呋喃（6. 4mL)溶液，滴下 後將反應溶液升至室溫並攪拌15小時。於反應溶液中加入 蒸餾水（50mL)，以6M硫酸中和反應溶液後，以氯仿進行分 液萃取。藉由濃縮溶液，得到2-(2-(2-(2-(2-(2〜甲氧美 乙氧基）-乙氧基）-乙氧基）-乙氧基）_乙氧基）對曱笨磺酸 酯（11.8g)。 [參考例11] φ 2,7_二溴 _9,9_雙[3—乙氧基羰基-4-[2-(2-(2-(2~(2~U~ 甲氧基乙氧基）-乙氧基）-乙氧基）_乙氧基乙氧基）乙氧 基]苯基]-苐（化合物C)之合成 將2,7-二溴-9-第酮（127.2§)、水楊酸乙酯（375.2幻 及巯乙酸（3.5g)放入300mL的燒瓶，進行氮置換。於其中， 添加甲磺酸（1420mL)，以75°C徹夜攪拌混合物。將混合物 放置冷卻後，添加冰水並攪拌丨小時。將產生的固體濾出， 以經加熱的乙腈洗淨。使經洗淨後之該固體溶解於丙酮， # 由所得之丙嗣溶液將固體進行再結晶並濾出 ’而得到固體 (167· 8g)。使所得之固體（5g)、2_(2_(2一（2_(2_(2_曱氧基 乙氧基）-乙氧基）-乙氧基）-乙氧基）_乙氧基）對甲苯石黃酸 酯（10. 4g)、碳酸鉀（5. 3g)及18-冠醚—6(〇 6g)溶解於 二甲基？_(DMF)(lGGmL) ’將溶液移至燒瓶並於1〇5&lt;t 搜拌4小時。將所得之混合物放冷至室溫為止，加至冰水 中並攪拌1小時。於反應液中加入氣仿（3〇〇mL)並進行分液 萃取，將溶液濃縮。使濃縮物溶解於乙酸乙醋，通液至氧 化鋁的管枉，藉由濃縮溶液而得到2,7_二溴_9,9_雙[3一乙 323323 148 201220574 氧基羰基-4-[2-(2-(2-(2-(2-(2-甲氧基乙氧基）-乙氧基） -乙氧基）-乙氧基）_乙氧基）乙氧基]苯基]-苐（化合物 (4. 5g)。[Reference Example 9] 2-[2-(2-decyloxyethoxy)ethoxy]-p-toluenesulfonate (11. 〇g), triethylene glycol (30) under an inert atmosphere Og), potassium cesium hydroxide (3.3 g) were mixed and heated and stirred at 100 ° C for 18 hours. After allowing to cool, water (100 mL) was added to the reaction mixture, and the mixture was extracted with chloroform, and then concentrated. The Hanked solution was subjected to Kugelrohr disti 1 lation (10 mm Torr, 180 ° C) to obtain 2-(2_(2-(2-(2_(2-methoxy)) Oxy)-ethoxy)-ethoxy)-ethoxy)-ethoxy)ethanol (6.1 g). [Reference Example 10] 2-(2-(2-(2-(2-(2-methoxyethoxy)-ethoxy)-ethoxy)-ethoxy)) -Ethoxy)ethanol (8.0 g), sodium hydroxide (1.4 g), distilled water (2 mL), and tetrahydrofuran (2 mL) were mixed and then ice-cooled. A solution of p-toluenesulfonyl chloride 147 323323 201220574 (p-tosyl chloride) (5.5 g) in tetrahydrofuran (6.4 mL) was added dropwise to the mixed solution for 30 minutes. After the dropwise addition, the reaction solution was allowed to warm to room temperature and stirred. 15 hours. Distilled water (50 mL) was added to the reaction solution, and the reaction solution was neutralized with 6 M sulfuric acid, and then extracted with chloroform. By concentrating the solution, 2-(2-(2-(2-(2-(2-methoxy)ethoxy)-ethoxy)-ethoxy)-ethoxy)-ethoxy) For the oxime sulfonate (11.8g). [Reference Example 11] φ 2,7-dibromo-9,9-bis[3-ethoxycarbonyl-4-[2-(2-(2-(2~(2~U~ methoxyethoxy) Synthesis of benzyl)-ethoxy)-ethoxy)-ethoxyethoxy)ethoxy]phenyl]-indole (Compound C) 2,7-Dibromo-9- ketone (127.2 § Ethyl salicylate (375.2 phantom and indole acetic acid (3.5 g) was placed in a 300 mL flask and replaced with nitrogen. Methanesulfonic acid (1420 mL) was added thereto, and the mixture was stirred overnight at 75 ° C. The mixture was allowed to stand for cooling. Thereafter, ice water was added and stirred for a few hours. The resulting solid was filtered off and washed with heated acetonitrile. The washed solid was dissolved in acetone, and the solid was recrystallized from the obtained propionate solution. Filtration of ' to give a solid (167·8 g). The obtained solid (5 g), 2- (2-(2-(2-(2-(2-ethoxy)ethoxy)-ethoxy)-ethoxy) -ethoxy))ethoxyl)p-toluenexamate (1. 4g), potassium carbonate (5.3g) and 18-crown-6(6g) are dissolved in dimethyl?-(DMF) (lGGmL) 'The solution was transferred to the flask and mixed at 1 〇 5 lt. t for 4 hours. The resulting mixture was allowed to cool to room temperature and added to ice water. And stirring for 1 hour. Adding gas (3 〇〇mL) to the reaction solution and performing liquid separation extraction, the solution is concentrated. The concentrate is dissolved in ethyl acetate, and the solution is passed to the tube of alumina, by concentrating the solution. And 2,7-dibromo-9,9_bis[3-ethyl 323323 148 201220574 oxycarbonyl-4-[2-(2-(2-(2-(2-(2-(2-methoxyethoxy) Ethyl)-ethoxy)-ethoxy)-ethoxy)-ethoxy)ethoxy]phenyl]-indole (compound (4.5 g).

化合物CCompound C

[參考例12] 聚合物G之合成 於惰性環境下，將化合物C(l. Og)、4-第三丁基苯基 溴（0.91^)、2,2’-聯吡啶（0.32)、脫水四氫呋喃（5〇1^)放 入200mL的燒瓶進行混合。將混合物升溫至55°C後，添加 雙（1，5-環辛二烯）鎳（0. 6g)，以55°C授拌5小時。將混合 物冷卻至室溫後，將反應溶液滴下至曱醇（2〇〇mL)、1N稀 鹽酸（200mL)的混合液。藉由過濾而收集所產生的沉澱物 後，使其再溶解於四氫呋喃。滴下至甲醇（2〇〇mL)、15%氨 水（100mL)的混合液中’並藉由過遽而收集所產生的沉殿 溶解於四氣咬喃，滴下至甲醇_、水 物。^將所1^賴藉㈣濾㈣集所產生的沉澱 (360,；)〇 聚合物G之臀#，y 為式（P)所示[Reference Example 12] Synthesis of Polymer G In an inert environment, Compound C (1.0 g), 4-t-butylphenyl bromide (0.91 mol), 2,2'-bipyridine (0.32), dehydration Tetrahydrofuran (5〇1^) was placed in a 200 mL flask for mixing. After the mixture was heated to 55 ° C, bis(1,5-cyclooctadiene)nickel (0.6 g) was added and the mixture was stirred at 55 ° C for 5 hours. After the mixture was cooled to room temperature, the reaction solution was added dropwise to a mixture of methanol (2 mL) and 1N diluted hydrochloric acid (200 mL). The resulting precipitate was collected by filtration and redissolved in tetrahydrofuran. The mixture was dropped into a mixture of methanol (2 〇〇 mL) and 15% ammonia (100 mL) and collected by hydrazine, dissolved in four gas, and dropped to methanol and water. ^The precipitate (360,;) produced by the (four) filter (four) set is 1 polymer G buttock #, y is expressed by formula (P)

聚合物G π #換算的數平均分子量為6.0χ104。 之構迤單元所構成 323323 149 201220574The number average molecular weight of the polymer G π # converted was 6.0χ104. The structure of the unit 323323 149 201220574

[實驗例10] 聚合物G铯鹽之合成 將聚合物G(150mg)放入100mL的燒瓶，進行氮置換。 將四氫σ夫喃（15mL)及曱醇（5mL)進行混合。於混合溶液中添 φ 加使氫氧化铯（170mg)溶解於水（2mL)而成的水溶液，以 65°C攪拌6小時。將混合物冷卻至室溫後，將反應溶媒減 壓餾除。將產生的固體以水洗淨，藉由減壓乾燥而得到淺 黃色的固體（95mg)。藉由NMR光譜確認來自聚合物G内之 乙基酯部位的乙基的信號係完全消失。將所得之聚合物G 的鉋鹽稱為共軛高分子化合物10。共軛高分子化合物10 係由式（Q)所示之構造單元所構成（「全部的構造單元中， 包含選自式（1)所示之基及式（2)所示之基所成群組中之1 ® 種以上之基與式（3)所示之1種以上之基的構造單元的比 例」及「全部的構造單元中，式（13)、（15)、（17)、（20) 所示之構造單元的比例」為100莫耳％)。共輛高分子化合 物10的HOMO之軌域能量為-5.7eV，LUM0之軌域能量為 -2.9eV。[Experimental Example 10] Synthesis of polymer G sulfonium salt Polymer G (150 mg) was placed in a 100 mL flask and replaced with nitrogen. Tetrahydrothymol (15 mL) and methanol (5 mL) were mixed. An aqueous solution obtained by dissolving cesium hydroxide (170 mg) in water (2 mL) was added to the mixed solution, and the mixture was stirred at 65 ° C for 6 hours. After the mixture was cooled to room temperature, the reaction solvent was depressurized and distilled off. The resulting solid was washed with water and dried to give a pale yellow solid (95 mg). The signal system of the ethyl group derived from the ethyl ester moiety in the polymer G was completely disappeared by NMR spectrum. The obtained planer salt of the polymer G is referred to as a conjugated polymer compound 10. The conjugated polymer compound 10 is composed of a structural unit represented by the formula (Q) ("all structural units include a group selected from the group represented by the formula (1) and the group represented by the formula (2)). The ratio of the base of one or more types in the group to the structural unit of one or more types represented by the formula (3)" and "all the structural units, the formulas (13), (15), (17), 20) The ratio of the structural unit shown is "100 mol%". The HOMO orbital energy of the total polymer compound 10 is -5.7 eV, and the orbital energy of LUM0 is -2.9 eV.

150 323323 201220574 [參考例13] 1’ 3-二演〜5_乙氧基羰基_6_[2_[2_(2_曱氧基乙氧基）乙氧 基]乙氧基]苯之合成 於惰性環境下，將3, 5-二溴水揚酸（2〇g)、乙醇 OWL)、濃硫酸（1. 5mL)、甲苯（7mL)進行混合，以i3〇°c 加熱擾拌2〇小時。放冷後’將反應溶液加入至冰水（lOOmL) 中’以氯仿進行分液萃取，將溶液濃縮。將所得之固體溶 φ 解於異丙醇後’將溶液滴下至蒸餾水。藉由將所得之析出 物滤出而得到固體（18g)。於惰性環境下，將所得之固體150 323323 201220574 [Reference Example 13] 1' 3-Dynamic ~5_ethoxycarbonyl_6_[2_[2_(2_methoxyethoxy)ethoxy]ethoxy]benzene synthesized in an inert Under the environment, 3, 5-dibromo salicylic acid (2 〇g), ethanol OWL), concentrated sulfuric acid (1.5 mL), toluene (7 mL) were mixed, and the mixture was stirred with i3 〇 °c for 2 hrs. After allowing to cool, the reaction solution was added to ice water (100 mL), and the mixture was extracted with chloroform, and the solution was concentrated. After the obtained solid solution was dissolved in isopropyl alcohol, the solution was dropped to distilled water. The solid (18 g) was obtained by filtration of the obtained precipitate. The resulting solid in an inert environment

Ug)、1[2-(2一甲氧基乙氧基）乙氧基]一對甲苯磺酸醋 (1. 5§)、碳酸鉀（〇. 7g)、DMF(15mL)進行混合，以 i〇〇〇Cm 熱攪拌4小時。放冷後，加入氯仿進行分液萃取，將溶液 浪縮°使濃縮物溶解於氯仿，藉由通液至矽膠管柱而進行 精製‘’藉由將溶液濃縮，得到1，3-二溴-5-乙氧基羰基〜6 [2一[2一（2〜甲氧基乙氧基）乙氧基]乙氧基]笨（l.Og)。 φ [參考例14 ] 聚合物Η之合成 於情性環境下，將化合物A(〇. 2g)、化合物B(〇. 5g：)、 1，3-二溴〜5_乙氧基羰基_6_[2_[2_(2_曱氧基乙氧基）乙氣 基]乙氧基]笨（〇.lg)、三苯基膦鈀（30mg)、溴化四丁銨 (4mg)、及曱苯（19mL)進行混合，加熱至l〇5°C。於讀反= 液中滴下2M碳酸鈉水溶液（5mL)，回流5小時。於反應、$ 中加入苯基硼酸（6mg)，回流14小時。接下來，加入二乙 二硫胺曱酸鈉水溶液（l〇mL，濃度：〇· 05g/mL)，攪掉 T 4小 323323 151 201220574 時。去除水層並將有制以蒸财料，濃縮後使所得之 固體溶解於氯仿，藉由通過氧仙管柱、㈣管柱而進行 精製。濃縮來自管_洗出液後’予以乾燥。所得之聚合 物Η的產量為〇. 44g。 聚合物Η之聚苯乙烯換算的數平均分子量為3. 6χ1〇4。 聚合物Η係由式（R)所示之構造單元所構成。Ug), 1[2-(2-methoxyethoxy)ethoxy]-p-toluenesulfonic acid vinegar (1.5 §), potassium carbonate (〇. 7g), DMF (15mL), i〇〇〇Cm was stirred for 4 hours. After allowing to cool, chloroform was added for liquid separation extraction, and the solution was shaken to dissolve the concentrate in chloroform, and purified by passing through a gel column. By concentrating the solution, 1,3-dibromo- 5-ethoxycarbonyl~6 [2-[2-(2-methoxyethoxy)ethoxy]ethoxy] stupid (1.0 g). φ [Reference Example 14] Synthesis of polymer oxime in a ambience environment, compound A (〇. 2g), compound B (〇. 5g:), 1,3-dibromo-5-ethoxycarbonyl _6_ [2_[2_(2_曱ethoxyethoxy)ethyl]ethoxy]](〇.lg), triphenylphosphine palladium (30mg), tetrabutylammonium bromide (4mg), and toluene (19 mL) was mixed and heated to 10 °C. A 2 M aqueous sodium carbonate solution (5 mL) was added dropwise to the mixture, and refluxed for 5 hours. Phenylboronic acid (6 mg) was added to the reaction, and refluxed for 14 hours. Next, an aqueous solution of sodium dithionate (l〇mL, concentration: 〇·05g/mL) was added, and T 4 small 323323 151 201220574 was stirred off. The water layer was removed and a steamed material was prepared, and the obtained solid was concentrated in chloroform, and purified by passing through an oxygen column and a column. After concentrating from the tube_eluate, it is dried. The yield of the obtained polymer hydrazine was 〇. 44 g. Χ1〇4。 The polystyrene-equivalent number average molecular weight of the polymer 为 is 3. 6χ1〇4. The polymer lanthanum is composed of structural units represented by the formula (R).

I 〇(CH2CH2〇)3CH3 i W COOCH2CH3 丨 (75:25 mol%) [實驗例11] 聚合物Η絶鹽之合成I 〇(CH2CH2〇)3CH3 i W COOCH2CH3 丨 (75:25 mol%) [Experimental Example 11] Synthesis of polymer bismuth salt

將聚合物H(200mg)放入lOOmL的燒瓶，進行氮置換。 添加四氫咬喃（14mL)及曱醇（7mL)並進行混合。於混合溶液 中添加使氫氧化鉋（90mg)溶解於水（lmL)而成之水溶液，以 ^ 65°C揽拌1小時。於反應溶液中加入甲醇5mL，再以65°C 攪拌4小時。將混合物冷卻至室溫後，將反應溶媒減壓館 除。將產生的固體以水洗淨，藉由減壓乾燥而得到淺黃色 的固體（190mg)。藉由NMR光譜確認來自聚合物Η内之乙基 酯部位的乙基的信號係完全消失。將所得之聚合物Η的铯 鹽稱為共軛高分子化合物11。共輛高分子化合物11係由 式（S)所示之構造單元所構成（「全部的構造單元中，包含 選自式（1)所示之基及式（2)所示之基所成群組中之1種以 上之基與式（3)所示之1種以上之基的構造單元的比例」及 152 323323 201220574 「全部的構造單元中，式（13)、（15)、（17)、（20)所示之 構造單元的比例」為莫耳％)。共軛高分子化合物11的 HOMO之軌域能量為_5. 6eV，LUM〇之軌域能量為_2. 8eV。Polymer H (200 mg) was placed in a 100 mL flask and replaced with nitrogen. Tetrahydromethane (14 mL) and methanol (7 mL) were added and mixed. An aqueous solution obtained by dissolving a water-soluble planer (90 mg) in water (1 mL) was added to the mixed solution, and the mixture was stirred at 65 ° C for 1 hour. Methanol (5 mL) was added to the reaction solution, and the mixture was stirred at 65 ° C for 4 hours. After the mixture was cooled to room temperature, the reaction solvent was depressurized. The resulting solid was washed with water and dried to give a pale yellow solid (190 mg). The signal system of the ethyl group derived from the ethyl ester moiety in the polymer crucible was completely disappeared by NMR spectroscopy. The obtained ruthenium salt of the polymer ruthenium is referred to as a conjugated polymer compound 11. The total polymer compound 11 is composed of a structural unit represented by the formula (S) ("all structural units include a group selected from the group represented by the formula (1) and the group represented by the formula (2)). The ratio of one or more groups in the group to the structural unit of one or more groups represented by the formula (3)" and 152 323323 201220574 "All the structural units, the formulas (13), (15), (17) The ratio of the structural unit shown in (20) is "% by mole". 8eV。 The conjugated polymer compound 11 HOMO orbital energy is _5. 6eV, LUM 〇 orbital energy is _2. 8eV.

2,7-二溴-9,9-雙[3,4-雙[2-[2-(2-甲氧基乙氧基）乙氧基] 乙氧基]-5-甲氧基羰基苯基]第（化合物D)之合成 將2, 7-二溴一9一苐酮（34. lg) ' 2, 3-二羥基安息香酸甲 酯（l〇1.3g)及巯乙酸（14g)放入5〇〇mL的燒瓶，進行氮置 換。於其中，添加曱磺酸（350mL)，將混合物以90〇c攪拌 19小時。將混合物放置冷卻後，添加至冰水中並攪拌^小 時。將產生的固體濾出後，以經加熱的乙腈洗淨。使經洗 #淨後之該固體溶解於丙酮，由所得之丙酮溶液將固體進行 再結晶並濾出。使所得之固體（16 3g)、2_[2_(2_甲氧基乙 氧基）乙氧基]-對甲苯磺酸酯（6〇· 3g)、碳酸鉀（48. 6心、及 18-冠醚-6(2.4g)溶解於N，N_二曱基甲醯胺（1)肿） (50〇m.L)，將溶液移至燒瓶並以11〇&lt;t攪拌15小時。將所 得之混合物放冷至室溫為止，加至冰水後授摔i小時。於 反應液中加入乙酸么酯（3〇〇mL)並進行分液萃取，將溶液濃 縮後，溶解於氯仿/甲醇（50/1(體積比））的混合溶媒， 通過石夕膠管柱而精製。藉由將已通液至管柱之溶液濃縮， 323323 153 201220574 得到2, 7-二溴-9, 9-雙[3,4-雙[2-[2-(2-曱氧基乙氧基）乙 氧基]乙氧基]-5-甲氧基羰基苯基]苐（化合物D)(20. 5g)。 [參考例16] 2, 7-雙[7-（4-甲基笨基）-9, 9-二辛基苐-2-基]-9, 9-雙[5- 曱氧基徵基-3,4-雙[2-[2-(2-曱氧基乙氧基）乙氧基]乙氧 基]苯基]-第（聚合物I)之合成 於惰性環境下，將化合物！)（0.7〇8)、2-(4,4,5,5-四 Φ 曱基一I 2, 3-二氧雜硼烷-2-基）-9, 9-二辛基苐（0. 62g)、三 苯基膦紀（〇· 〇19g)、二噚烷（4〇mL)、水（6mL)及碳酸鉀水溶 液（1· 38g)進行混合’加熱至8Q°C。使反應液反應1小時。 反應後’添加飽和二乙二硫胺甲酸鈉水溶液5mL，攪拌30 分鐘後’去除有機溶媒。藉由將所得之固體通過氧化鋁管 柱(展開溶媒為己嫁：乙酸乙酯=1 : 1(體積比））以進行精 製，籍由將溶液濃縮而得到2, 7-雙[7-(4-甲基苯基）-9, 9-二辛基苐-2-基]-9,9-雙[5-甲氧基羰基一3,4_雙[2_[2_(2一 ♦ T氧基乙氧基）乙氧基]乙氧基]苯基]_g(聚合物1)66〇呢。 聚合物I之聚苯乙烯換算的數平均分子量為2. 〇χ1〇3。 聚合物I係如式（Τ)所示。又，2-(4,4,5 5_四甲基 一氧难爛烧-2-基）-9, 9-二辛基第係可依據例如The Journal of Physical Chemistry B 2000, l〇4, 9118-9125 所記載的方法進行合成。 323323 154 2012205742,7-dibromo-9,9-bis[3,4-bis[2-[2-(2-methoxyethoxy)ethoxy]ethoxy]-5-methoxycarbonylbenzene Synthesis of the compound (Compound D) 2,7-Dibromo-9-fluorenone (34. lg) '2,3-Dihydroxybenzoate methyl ester (l〇1.3g) and indole acetic acid (14g) A 5 mL mL flask was placed and nitrogen exchange was performed. Therein, hydrazine sulfonic acid (350 mL) was added, and the mixture was stirred at 90 ° C for 19 hours. After the mixture was allowed to cool, it was added to ice water and stirred for an hour. The resulting solid was filtered off and washed with heated acetonitrile. The solid after washing was dissolved in acetone, and the solid was recrystallized from the obtained acetone solution and filtered. The obtained solid (16 3g), 2_[2_(2-methoxyethoxy)ethoxy]-p-toluenesulfonate (6〇·3g), potassium carbonate (48. 6 core, and 18- Crown ether-6 (2.4 g) was dissolved in N,N-dimercaptocaramine (1) swollen (50 mL), the solution was transferred to a flask and stirred at 11 ° &lt;t for 15 hours. The resulting mixture was allowed to cool to room temperature, and was added to ice water for a period of one hour. To the reaction solution, ethyl acetate (3 〇〇 mL) was added and liquid-liquid extraction was carried out, and the solution was concentrated, dissolved in a mixed solvent of chloroform/methanol (50/1 (volume ratio)), and refined through a Shixi rubber column. . By concentrating the solution that has been passed through the column, 323323 153 201220574 gives 2,7-dibromo-9,9-bis[3,4-bis[2-[2-(2-methoxyethoxy) Ethoxy]ethoxy]-5-methoxycarbonylphenyl]indole (Compound D) (20.5 g). [Reference Example 16] 2,7-bis[7-(4-methylphenyl)-9,9-dioctylfluoren-2-yl]-9,9-bis[5-decyloxy-based group- Synthesis of 3,4-bis[2-[2-(2-decyloxyethoxy)ethoxy]ethoxy]phenyl]- (Polymer I) in an inert environment, compound! (0.7〇8), 2-(4,4,5,5-tetrapulnyl-I 2,3-dioxaborolan-2-yl)-9,9-dioctylfluorene (0. 62 g), triphenylphosphine (〇·〇19g), dioxane (4〇mL), water (6mL) and aqueous potassium carbonate solution (1·38g) were mixed and heated to 8Q°C. The reaction solution was allowed to react for 1 hour. After the reaction, 5 mL of a saturated aqueous solution of sodium diethyldithiocarbamate was added, and after stirring for 30 minutes, the organic solvent was removed. The solid obtained is passed through an alumina column (expanded solvent is hexane: ethyl acetate = 1: 1 (volume ratio)) for purification, and the solution is concentrated to obtain 2,7-bis[7-( 4-methylphenyl)-9,9-dioctylindol-2-yl]-9,9-bis[5-methoxycarbonyl-3,4_bis[2_[2_(2一♦ T oxygen) Ethyl ethoxy) ethoxy] ethoxy] phenyl] _ (polymer 1) 66 〇. The polymer has a polystyrene-equivalent number average molecular weight of 2. 〇χ1〇3. The polymer I is represented by the formula (Τ). Further, the 2-(4,4,5 5_tetramethyl-oxo-oxo-2-yl)-9,9-dioctyl-based system can be, for example, according to The Journal of Physical Chemistry B 2000, l〇4, The method described in 9118-9125 was synthesized. 323323 154 201220574

[實驗例12] 聚合物I絶鹽之合成 將聚合物I(236mg)放入100mL的燒瓶，進行氛置換。 ® 於其中，添加四氫呋喃（20mL)及甲醇（10mL)，將混合物升 溫至65°C。於其中，添加使氫氧化絶（240mg)溶解於水（2mL) 而成的水溶液，以65°C授拌7小時。將所得之混合物冷卻 至室溫後，將反應溶媒減壓餾除。將產生的固體以水洗淨， 藉由使減壓乾燥而得到淺黃色的固體（190mg)。藉由腿R光 譜確認來自乙基酯部位之乙基的信號係完全消失。將所得 之聚合物I鉋鹽稱為共輛高分子化合物12。共軛高分子化 φ 合物12係如式（U)所示（「全部的構造單元中，包含選自式 (1)所示之基及式（2)所示之基所成群組中之1種以上之基 與式（3)所示之1種以上之基的構造單元的比例」及「金部 的構造單元中’式（13)、（15)、（17)、（20)所示之構造單 元的比例」係以小數第二位進行四捨五入後為33. 3莫耳 %)。共軛高分子化合物12的HOMO之軌域能量為〜5. 6eV， LUM0之執域能量為_2.8eV。 155 323323 201220574[Experimental Example 12] Synthesis of polymer I sequestration salt Polymer I (236 mg) was placed in a 100 mL flask and subjected to atmosphere replacement. To the mixture, tetrahydrofuran (20 mL) and methanol (10 mL) were added and the mixture was warmed to 65 °C. An aqueous solution obtained by dissolving hydrogen peroxide (240 mg) in water (2 mL) was added thereto, and the mixture was stirred at 65 ° C for 7 hours. After the resulting mixture was cooled to room temperature, the reaction solvent was evaporated under reduced pressure. The resulting solid was washed with water and dried under reduced pressure to give a pale yellow solid (190 mg). It was confirmed by the leg R spectrum that the signal system derived from the ethyl group of the ethyl ester site completely disappeared. The obtained polymer I planing salt is referred to as a total of polymer compound 12. The conjugated polymerized φ compound 12 is represented by the formula (U) ("all structural units include a group selected from the group represented by the formula (1) and the group represented by the formula (2)). "The ratio of one or more kinds of bases to one or more types of structural units represented by formula (3)" and "in the structural unit of gold part" (13), (15), (17), (20) The ratio of the structural unit shown is "33. 3 mol%" after being rounded off by the second decimal place. The HOMO orbital energy of the conjugated polymer compound 12 is ～5. 6 eV, and the LUM0 domain energy is _2.8 eV. 155 323323 201220574

(U) [參考例17] 化合物E之合成(U) [Reference Example 17] Synthesis of Compound E

於氮環境下，將2,7-二溴-9-荞酮（92.〇2,272賴〇1) 及二乙基醚（3. 7L)進行混合後，冷卻至〇°c，滴加lm〇1/L 蛾化甲基鎮-二乙基醚溶液（0. 5L，545mmol)並授摔3小 時。於反應混合物中加入氯化銨水溶液，將水層去除後， 以無水硫酸鈉將有機層進行乾燥後，進行減壓濃縮。將所 得之粗生成物以矽膠管柱層析儀進行精製，得到化合物 E(92. 81g，262mmo卜產率 96%)。2,7-dibromo-9-fluorenone (92.〇2,272 〇1) and diethyl ether (3.7 L) were mixed under a nitrogen atmosphere, and then cooled to 〇°c, and lm〇 was added dropwise. 1/L moth-methyl-diethyl ether solution (0.5 L, 545 mmol) and allowed to fall for 3 hours. After adding an aqueous solution of ammonium chloride to the reaction mixture and removing the aqueous layer, the organic layer was dried over anhydrous sodium sulfate and concentrated under reduced pressure. The obtained crude product was purified by a silica gel column chromatography to give Compound E (92.81 g, 262 s. yield: 96%).

Br [參考例18] 化合物F之合成 於氮環境下，將化合物E(83.0g，234mmol)、對甲苯 磺酸一水合物（4.49g，23.6mmol)及氯仿（2. 5L)進行回流i 小時，於反應混合物中加入氣化銨水溶液並去除水層。將 有機層以無水硫酸納進行乾燥並減壓濃縮，得到化合物f (73· 6g，219mmol，產率 93%)。 323323 156 201220574Br [Reference Example 18] Synthesis of Compound F Under a nitrogen atmosphere, Compound E (83.0 g, 234 mmol), p-toluenesulfonic acid monohydrate (4.49 g, 23.6 mmol) and chloroform (2.5 L) were refluxed for one hour. An aqueous solution of vaporized ammonium was added to the reaction mixture and the aqueous layer was removed. The organic layer was dried over anhydrous sodium sulfate and evaporated. 323323 156 201220574

BrBr

Br 化合物F [參考例19] 化合物G之合成 於氮環境下，將化合物F(70. Og，208丽ol)、水楊酸 乙酯（:104g，625mmol)、疏乙酸（4. 20g，45. 6mmol)及曱續 酸（1214g)以70°C攪拌8小時，將反應混合物滴下至冰水， 並將所析出的固體過濾回收後，以曱醇洗淨。將粗生成物 以矽膠管柱層析儀進行精製，得到化合物G(52. 14g， 104mmol，產率 50%)。Br compound F [Reference Example 19] Synthesis of Compound G Under a nitrogen atmosphere, compound F (70. Og, 208 liter ol), ethyl salicylate (: 104 g, 625 mmol), succinic acid (4. 20 g, 45) 6 mmol) and citric acid (1214 g) were stirred at 70 ° C for 8 hours, and the reaction mixture was dripped into ice water, and the precipitated solid was collected by filtration and washed with decyl alcohol. The crude product was purified by silica gel column chromatography to yield Compound G (52. 14 g, 104 mmol, yield 50%).

化合物G [參考例20] 化合物Η之合成 於氮環境下，將化合物G(41. 2g，82. Ommol)、2-[2-(2-曱氧基乙氧基）乙氧基]-乙基-對曱苯磺酸酯（75. 8g， 238mmol)、二甲基曱醯胺（214g)、碳酸卸（54. 4g，394 mmol)、及 18-冠醚-6(4. 68g’ 18mmol)以 105°C 授拌 2 小時， 將反應混合物加入至水中，並以乙酸乙S旨進行萃取。以無 水硫酸鈉將有機層進行乾燥後，減壓濃縮，並將所得之粗 157 323323 201220574 生成物以矽膠管柱層析儀進行精製，得到化合物H(40. 2g， 62. Ommol，產率 76%)。 沱丽R (400MHz，CDCh，rt) (5 (pptn)l. 37 (3H), 1.84 (3H), 3.36 (3H), 3.53 (2H), 3. 58-3. 79 (6H), 3. 73 (2H), 4. 12 (2H), 4.34 (2H), 6.80 (1H), 6.90(1H), 7. 28(2H), 7. 48 (2H), 7. 58 (2H), 7.70 (1H).Compound G [Reference Example 20] Synthesis of compound hydrazine Under a nitrogen atmosphere, compound G (41. 2 g, 82.0 mmol), 2-[2-(2-decyloxyethoxy)ethoxy]-B Base-p-toluenesulfonate (75. 8g, 238mmol), dimethylguanamine (214g), carbonic acid unloading (54. 4g, 394mmol), and 18-crown-6 (4. 68g' 18mmol) The mixture was stirred at 105 ° C for 2 hours, and the reaction mixture was added to water and extracted with acetic acid. The organic layer was dried over anhydrous sodium sulfate (MgSO4), evaporated %).沱丽R (400MHz, CDCh, rt) (5 (pptn) l. 37 (3H), 1.84 (3H), 3.36 (3H), 3.53 (2H), 3. 58-3. 79 (6H), 3. 73 (2H), 4. 12 (2H), 4.34 (2H), 6.80 (1H), 6.90(1H), 7. 28(2H), 7. 48 (2H), 7. 58 (2H), 7.70 ( 1H).

0(CH2CH2〇)3CH3 化合物H [參考例21] 化合物I之合成 於氮環境下，將化合物H(28. 4g，43. 8mmol)、雙戊醯 二硼（24.30g，95.7mol)、[1，Γ-雙（二苯基膦基）二茂鐵] ® 鈀（II)二氯化的二氣甲烷加成物（0.35g，0.4mmol)、1，Γ-雙（二苯基膦基）二茂鐵（0. 24g，0· 4mmol)、乙酸鉀 (25.60g，260mmol)及 1,4-二噚烷（480mL)以 120°C 攪拌 17 小時’過濾反應混合物後，以乙酸乙酯予以洗淨。將濾液 進行減壓濃縮，並以矽膠管柱層析儀進行精製，接著以再 結晶進行精製而得到化合物1(18. 22g，24.5mmol，產率 56%)= !H NMR (400MHz, CDCh, rt) 158 323323 201220574 占（ppm) 1.30-1.47 (27H)，1.88 (3H)，3.35 (3H)，3.53 (2H)，3.60-3. 69 (4H)，3.73 (2H)，3.84 (2H)，4.10 (2H)， 4.34(2H)，6.74 (1H)，6.87 (1H)，7.58 (2H)，7. 72-7. 89 (5H).0(CH2CH2〇)3CH3 Compound H [Reference Example 21] Synthesis of Compound I Under a nitrogen atmosphere, Compound H (28.4 g, 43.8 mmol), dipentane diboron (24.30 g, 95.7 mol), [1] , bis-(diphenylphosphino)ferrocene] palladium (II) dichloride methane adduct (0.35 g, 0.4 mmol), 1, bismuth-bis(diphenylphosphino) Ferrocene (0.24 g, 0.4 mmol), potassium acetate (25.60 g, 260 mmol) and 1,4-dioxane (480 mL) were stirred at 120 ° C for 17 hours. Wash. The filtrate was concentrated under reduced pressure and purified by silica gel column chromatography, followed by recrystallization to give Compound 1 (18.22 g, 24.5 mmol, yield 56%) = !H NMR (400 MHz, CDCh, Rt) 158 323323 201220574 (ppm) 1.30-1.47 (27H), 1.88 (3H), 3.35 (3H), 3.53 (2H), 3.60-3. 69 (4H), 3.73 (2H), 3.84 (2H), 4.10 (2H), 4.34(2H), 6.74 (1H), 6.87 (1H), 7.58 (2H), 7. 72-7. 89 (5H).

o(ch2ch2o)3ch3o(ch2ch2o)3ch3

化合物ICompound I

[參考例22] 聚合物J之合成 於氬環境下’將化合物H(0.47g)、化合物I(〇 48g)、 二氯雙（二苯基膦）1ε(0. 6mg)、溴化四丁録（gmg)、甲苯 (6mL)、2mol/L碳酸納水溶液（2mL)以i〇5°c授摔6小時， 接著加入苯基硼酸（35mg)並以l〇5°C攪拌丨4小時。於反應 混合物中加入一乙二硫胺甲酸鈉三水合物（〇. 65g)與水 (13mL)並以80 C授拌2小時’將混合物滴下至曱醇，藉由 過濾、的回收析出物後’進行乾燥。使固體溶解於氣仿，9藉 由氧化I呂及石夕膠層析儀進行精製後，將洗出液滴下至^ 醇，籍由過濾而回收析出物後’予以教極[Reference Example 22] Synthesis of Polymer J in an argon atmosphere 'Compound H (0.47 g), Compound I (〇48 g), dichlorobis(diphenylphosphine) 1 ε (0.6 mg), tetrabutyl bromide (gmg), toluene (6 mL), 2 mol/L sodium carbonate aqueous solution (2 mL) were dropped for 6 hours at 5 ° C, then phenylboronic acid (35 mg) was added and stirred at 10 ° C for 4 hours. Sodium edetate sodium trihydrate (〇. 65g) and water (13mL) were added to the reaction mixture and mixed at 80 C for 2 hours. The mixture was dropped to decyl alcohol, and the precipitate was recovered by filtration. Dry. The solid is dissolved in the gas, and after purification by the oxidation of Ilu and Shishi gum chromatography, the liquid is washed out to the alcohol, and the precipitate is recovered by filtration.

簡’侍到聚合物J (0.57g)。 聚合物J之聚苯乙稀換算的數平均分子 聚合物j係由式（v)所示之構造單元所構成量為2.0&gt;&lt;1〇4。 159 201220574Jane's to the polymer J (0.57g). The number average molecular polymer of the polystyrene-equivalent polymer J of the polymer J is composed of a structural unit represented by the formula (v) of 2.0 &lt;1〇4. 159 201220574

(V) [實驗例13] 聚合物J铯鹽之合成 於氬環境下，將聚合物J(〇. 20g)、THF(18mL)、曱醇 φ (9mL)、氫氧化鉋一水合物（97mg)、及水（lmL)以65°C攪拌 2小時，接著加入曱醇（52mL)以65°C攪拌6小時。將反應 混合物進行濃縮後予以乾燥，對於固體加入曱醇進行過 濾，將濾液滴下至異丙醇後，藉由過濾而回收固體並予以 乾燥，得到聚合物J鉋鹽（0. 20g)。將所得之聚合物J铯鹽 稱為共軛高分子化合物13。共軛高分子化合物13係由式 (W)所示之構造單元所構成。(V) [Experimental Example 13] Synthesis of polymer J sulfonium salt Polymer J (〇. 20 g), THF (18 mL), decyl alcohol φ (9 mL), hydrated hydrate (97 mg) under argon atmosphere And water (1 mL) was stirred at 65 ° C for 2 hours, followed by the addition of methanol (52 mL) and stirring at 65 ° C for 6 hours. The reaction mixture was concentrated, dried, and the mixture was filtered, and then filtered and evaporated to dryness. The obtained polymer J 铯 salt is referred to as conjugated polymer compound 13. The conjugated polymer compound 13 is composed of a structural unit represented by the formula (W).

(W) 共輛高分子化合物13的HOMO之軌域能量為-5. 51eV， LUM0之軌域能量為-2. 64eV。 [參考例23] 化合物J之合成 於氮氣流下，將2, 7-二溴-9, 9-雙（3, 4-二羥基）-苐 160 323323 201220574 (138.4_g)、2-[2-(2-曱氧基乙氧基）乙氧基]-乙基-對甲苯 磺酸酯（408.6g)、碳酸鉀（358. 5g)及乙腈（2. 5L)進行混 合，加熱回流3小時。放冷後，將反應混合物濾出並將濾 液進行減壓濃縮，藉由矽膠管柱層析儀予以精製而得到化 合物 J(109. 4g)。(0) The orbital energy of the HOMO of the polymer compound 13 is -5. 51 eV, and the orbital energy of LUM0 is -2.64 eV. [Reference Example 23] Synthesis of Compound J under a nitrogen stream, 2,7-dibromo-9,9-bis(3,4-dihydroxy)-苐160 323323 201220574 (138.4_g), 2-[2-( 2-methoxyethoxyethoxy)ethoxy]-ethyl-p-toluenesulfonate (408.6 g), potassium carbonate (358. 5 g) and acetonitrile (2.5 L) were mixed and heated under reflux for 3 hours. After the reaction mixture was cooled, the reaction mixture was filtered, and then filtered, evaporated, evaporated,

化合物JCompound J

H3C(OH2CH2CH3C (OH2CH2C

H3C(OH2CH2CH3C (OH2CH2C

[參考例24] 化合物K之合成 於氮環境下，將化合物J(l〇1.2g)、雙戊醯二硼 (53. lg)、[1，Γ-雙（二苯基膦基）二茂鐵]二氯化鈀（II)二 氯曱烷錯合物（3. 7g)、1，Γ-雙（二苯基膦基）二茂鐵 (5.4g)、乙酸鉀（90.6g)及二噚烷（900mL)進行混合，加熱 ® 至11I)°C，加熱回流8小時。放冷後，過濾反應液並將濾 液減壓濃縮後，藉由矽膠管柱層析儀予以精製而得到化合 物 K(51.4g)。[Reference Example 24] Synthesis of Compound K Under a nitrogen atmosphere, Compound J (l〇1.2g), dipentazone diboron (53. lg), [1, Γ-bis(diphenylphosphino) ferrocene Iron] palladium(II) dichloromethane complex (3.7 g), 1, bis-bis(diphenylphosphino)ferrocene (5.4 g), potassium acetate (90.6 g) and two The decane (900 mL) was mixed, heated to 11 I) ° C, and heated to reflux for 8 hours. After allowing to cool, the reaction mixture was filtered, and the filtrate was concentrated under reduced pressure, and then purified by silica gel column chromatography to give compound K (51.4 g).

化合物κ [參考例25] 161 323323 201220574 聚合物κ之合成 加入化合物 K(0. 715g)、化合物 j(0. 426g)、aliquot 336(6.60mg)、雙（三苯基膦）二氯化鈀（〇.460mg)、2m〇1/L 碳酸鈉水溶液（10mL)、曱苯（20mL)，以i〇5°c攪拌5小時， 接著加入苯基硼酸（32mg)，以105°C攪拌6小時。於反應 混合物中加入二乙二硫胺曱酸鈉三水合物（〇. 72g)與水 (14mL) ’以80°C擾拌2小時，將混合物滴下至曱醇，藉由 過濾而回收析出物並予以乾燥。使固體溶解於氯仿，藉由 氧化鋁及矽膠層析儀予以精製，將洗出液濃縮後使乾燥。 使濃縮物溶解於曱苯後滴下至曱醇，藉由過濾而回收析出 物並予以乾燥，得到聚合物K(0. 55g)。 聚合物K之聚苯乙烯換算的數平均分子量為2. 3xl04。 聚合物K係由式（X)所示之構造單元所構成。Compound κ [Reference Example 25] 161 323323 201220574 Synthesis of polymer κ Adding compound K (0.715 g), compound j (0. 426 g), aliquot 336 (6.60 mg), bis(triphenylphosphine) palladium dichloride (〇.460 mg), 2 m〇1/L sodium carbonate aqueous solution (10 mL), toluene (20 mL), stirred at 5 ° C for 5 hours, then phenylboronic acid (32 mg) was added and stirred at 105 ° C for 6 hours. . To the reaction mixture, sodium dithiodiamine citrate trihydrate (〇. 72 g) and water (14 mL) were added to stir at 80 ° C for 2 hours, and the mixture was dropped to decyl alcohol, and the precipitate was recovered by filtration. And dry it. The solid was dissolved in chloroform, purified by alumina and a silica gel chromatograph, and the eluate was concentrated and dried. The concentrate was dissolved in toluene, and the mixture was dropped to decyl alcohol. The precipitate was collected by filtration and dried to give polymer K (0.55 g). 5xl04。 The polystyrene-equivalent number average molecular weight of the polymer K is 2. 3xl04. The polymer K is composed of structural units represented by the formula (X).

(X) [實驗例14] 聚合物K鉋鹽之合成 於氬環境下，將聚合物K(0. 15g)、THF(20mL)、甲醇 (10mL)、氫氧化铯一水合物（i〇3mg)、及水（lmL)以65°C攪 拌2小時’接著加入曱醇（2〇mL)，以65°C攪拌2小時。將 反應混合物濃縮並予以乾燥後，對於固體加入甲醇並予以 162 323323 201220574 過濾。將所得之濾液進行濃縮並乾燥，將所得之固體以水 洗淨後，藉由乾燥而得到聚合物K的鉋鹽（〇. i4g)。將所得 之聚合物K的鉋鹽稱為共軛高分子化合物14。共軛高分子 化合物14係由式（Y)所示之構造單元所構成。(X) [Experimental Example 14] Synthesis of polymer K planing salt In a argon atmosphere, polymer K (0.15 g), THF (20 mL), methanol (10 mL), cesium hydroxide monohydrate (i 〇 3 mg) And water (1 mL) was stirred at 65 ° C for 2 hours. Then sterol (2 〇 mL) was added and stirred at 65 ° C for 2 hours. After concentrating the reaction mixture and drying it, methanol was added to the solid and filtered through 162 323323 201220574. The obtained filtrate was concentrated and dried, and the obtained solid was washed with water, and then dried to obtain a viscous salt of the polymer K (〇. i4g). The obtained planing salt of the polymer K is referred to as a conjugated polymer compound 14. The conjugated polymer compound 14 is composed of a structural unit represented by the formula (Y).

零 (Y) 共軛高分子化合物14的HOMO之執域能量為-5. 56eV’ LUM0之軌域能量為-2. 67eV。 [參考例26] 化合物L之合成 於氮環境下，將5-溴-2-羥基安息香酸（92. 85g)、乙 醇（1140mL)、及濃硫酸（45mL)進行回流48小時，予以減壓 φ 濃縮後加入乙酸乙酯（lOOOmL)，以水及10重量％碳酸納水 溶液將有機層洗淨。將有機層以無水硫酸鈉鈉進行乾燦’ 經減壓濃縮後，將所得之粗生成物以矽膠管柱層析儀精 製，得到化合物L(95. 38g，產率9U)。 〇The energy of the HOMO of the zero (Y) conjugated polymer compound 14 is -5. 67 eV' The orbital energy of LUM0 is -2.67 eV. [Reference Example 26] Synthesis of Compound L Under a nitrogen atmosphere, 5-bromo-2-hydroxybenzoic acid (92.85 g), ethanol (1140 mL), and concentrated sulfuric acid (45 mL) were refluxed for 48 hr. After concentration, ethyl acetate (100 mL) was added, and the organic layer was washed with water and a 10% by weight aqueous sodium carbonate solution. The organic layer was dried over anhydrous sodium sulfate. EtOAc (EtOAc). 〇

化合物L [參考例27] 323323 163 201220574 化合物Μ之合成 於氮環境下，將化合物L(95.0g)、雙戊醯二硼 (108. 5g)、[1，Γ -雙（二苯基膦基）二茂鐵]鈀（II)二氯化的 二氯曱烷加成物（3.3g)、1，Γ-雙（二苯基膦基）二茂鐵 (2.2g)、乙酸鉀（117. 2g)、及 1,4-二噚烷（1.3L)以 105°C 攪拌22小時，將反應混合物予以過濾後，以二噚烷及曱苯 洗淨。將濾液進行減壓濃縮並加入乙酸乙酯，以飽和食鹽 水洗淨，將有機層以無水硫酸鈉鈉進行乾燥並減壓濃縮。 將所得之粗生成物以矽膠管柱層析儀精製，得到化合物Μ (90. lg，308mmol)。Compound L [Reference Example 27] 323323 163 201220574 Synthesis of compound hydrazine Compound L (95.0 g), dipentafluorene diboron (108. 5 g), [1, fluorene-bis(diphenylphosphino) ) ferrocene] palladium (II) dichlorodecane adduct (3.3 g), 1, bis-bis(diphenylphosphino)ferrocene (2.2 g), potassium acetate (117. 2 g) and 1,4-dioxane (1.3 L) were stirred at 105 ° C for 22 hours, and the reaction mixture was filtered and washed with dioxane and benzene. The filtrate was concentrated under reduced pressure. EtOAc was evaporated. The obtained crude product was purified by a silica gel column chromatography to give compound s (90. lg, 308 mmol).

化合物Μ [參考例28] 化合物Ν之合成 於氮環境下，將1,5-二經基萘（15. 0g)、三乙基胺 (28.5g)及氯仿（150mL)進行混合並冷卻至0°C後，滴下三 氟曱磺酸酐（68. 7g)並攪拌1小時。於反應混合物中加入水 及氯仿並去除水層，以水洗淨有機層。將有機層以無水硫 酸鈉鈉進行乾燥並予以減壓濃縮，將所得之固體藉由再結 晶而精製，得到化合物N(31.46g)。下述式中，Tf表示三 氟曱基續酿基。 164 323323 201220574Compound Μ [Reference Example 28] Synthesis of compound hydrazine In a nitrogen atmosphere, 1,5-dipyridyl (10.5 g), triethylamine (28.5 g) and chloroform (150 mL) were mixed and cooled to 0. After ° C, trifluoromethanesulfonic anhydride (68. 7 g) was added dropwise and stirred for 1 hour. Water and chloroform were added to the reaction mixture, and the aqueous layer was removed, and the organic layer was washed with water. The organic layer was dried over anhydrous sodium sulfate and concentrated under reduced pressure, and the obtained solid was purified by recrystallization to afford compound N (31.46 g). In the following formula, Tf represents a trifluoroindenyl group. 164 323323 201220574

化合物N [參考例29] 化合物0之合成 於氮環境下，將化合物N(16.90g)、化合物Μ (23. 30g)、肆（三苯基膦）鈀（0)(4. 60g)、磷酸鉀（42.30g) • 及1，2-二甲氧基乙烷（340mL)以80°C攪拌14小時，將反應 混合物過濾後以氯仿及曱醇洗淨。將濾液進行減壓濃縮， 藉由矽膠管柱層析儀予以精製後，得到化合物0(8. 85g)。Compound N [Reference Example 29] Synthesis of Compound 0 Under a nitrogen atmosphere, compound N (16.90 g), compound hydrazine (23.30 g), hydrazine (triphenylphosphine) palladium (0) (4.60 g), phosphoric acid Potassium (42.30 g) and 1,2-dimethoxyethane (340 mL) were stirred at 80 ° C for 14 hours, and the reaction mixture was filtered and washed with chloroform and methanol. The filtrate was concentrated under reduced pressure and purified by silica gel column chromatography to give Compound 0 (8. 85 g).

化合物0 [參考例30] 化合物P之合成 於氮環境下，將化合物0(8. 80g)、2-[2-(2-甲氧基乙 氧基）乙氧基]-乙基-對曱苯磺酸酯（12. 52g)、二曱基曱醯 胺（380mL)、碳酸鉀（13.32g)、及 18-冠醚-6(1.02g)以 100°C攪拌23小時後，於反應混合物中加入水並以乙酸乙 酯進行萃取。將有機層以氯化鈉水溶液進行洗淨，並以無 水硫酸鈉鈉進行乾燥，減壓濃縮後，將所得之粗生成物藉 165 323323 201220574 由矽膠管柱層析儀予以精製，得到化合物P(7. 38g)。Compound 0 [Reference Example 30] Synthesis of Compound P Under a nitrogen atmosphere, Compound 0 (8.80 g), 2-[2-(2-methoxyethoxy)ethoxy]-ethyl-p-oxime Toluene sulfonate (12.52g), dimethyl decylamine (380mL), potassium carbonate (13.32g), and 18-crown-6 (1.02g) were stirred at 100 ° C for 23 hours in the reaction mixture. Water was added and extracted with ethyl acetate. The organic layer was washed with an aqueous solution of sodium chloride and dried over anhydrous sodium sulfate and concentrated under reduced pressure. The crude product obtained was purified by a ruthenium column chromatography apparatus 165 323323 201220574 to obtain a compound P ( 7. 38g).

化合物P [參考例31] ®化合物Q之合成 於氮環境下，將化合物P(5.53g)、雙戊醯二硼 (11.25g)、（1,5-環辛二烯）（曱氧基）銥（I)二聚物（0. 15g， Sigma-Aldrich 公司製）、4, 4’ -二（第三丁基）-2, 2’ -二口比 啶基（0. 12g，Sigma-Aldrich 公司製）、及 1,4-二噚烷 (300mL)以110°C攪拌19小時，將反應混合物進行減壓濃 縮。將粗生成物藉由矽膠管柱層析儀予以精製，接著以再 φ 結晶進行精製，而得到化合物Q(5. 81g)。 Ή NMR (400MHz, CDCh, rt) (5 (ppm) 1.27-1.41 (30H), 3.39 (6H), 3.57 (4H), 3.66-3. 75(8H), 3.83 (4H), 3.99 (4H), 4. 27-4. 42 (8H), 7.13 (2H), 7.60 (2H), 7.76 (2H), 7.93 (2H), 8.30 (2H). 166 323323 201220574Compound P [Reference Example 31] Synthesis of Compound Q Under a nitrogen atmosphere, Compound P (5.53 g), dipentane diboron (11.25 g), (1,5-cyclooctadiene) (decyloxy)铱(I) dimer (0.15g, manufactured by Sigma-Aldrich), 4, 4'-di(t-butyl)-2, 2'-di-dipyridyl (0. 12g, Sigma-Aldrich) The company and 1,4-dioxane (300 mL) were stirred at 110 ° C for 19 hours, and the reaction mixture was concentrated under reduced pressure. The crude product was purified by a ruthenium column chromatography, and then purified by re- crystallization to give Compound Q (5. 81 g). NMR NMR (400MHz, CDCh, rt) (5 (ppm) 1.27-1.41 (30H), 3.39 (6H), 3.57 (4H), 3.66-3. 75(8H), 3.83 (4H), 3.99 (4H), 4. 27-4. 42 (8H), 7.13 (2H), 7.60 (2H), 7.76 (2H), 7.93 (2H), 8.30 (2H). 166 323323 201220574

〇 o(ch2ch2o)3ch3 化合物Q [參考例32] • 聚合物L之合成 於氬環境下，將化合物J(0. 53g)、化合物Q(0. 43g)、 二氯雙（三苯基膦）鈀（〇. 3mg)、Aliquat336(5mg，Sigma-Aldrich公司製）、甲苯（i2mL)、2mol/L碳酸鈉水溶液（lmL) 以105°C攪拌9小時，接著加入苯基硼酸（23mg)，以105°C 攪拌]'4小時。於反應混合物中加入二乙二硫胺甲酸鈉三水 合物（0. 40g)與水（8mL)，以8(TC攪拌2小時，將混合物滴 φ 下至甲醇，藉由過濾而回收析出物後，進行乾燥。使固體 溶解於氯仿，藉由氧化鋁及矽膠層析儀予以精製，將洗出 液滴T.至甲醇，並藉由過渡而回收析出物並予以乾燥，得 到聚合物L(0. 56g)。 取人f 口物L之聚苯乙婦換算的數平均分子量為3· 4xl〇4。 聚a物L係由式⑺所示之構造單元所構成。 323323 167 201220574〇o(ch2ch2o)3ch3 Compound Q [Reference Example 32] • Synthesis of polymer L in a argon atmosphere, compound J (0.53 g), compound Q (0.43 g), dichlorobis(triphenylphosphine) Palladium (3 mg), Aliquat 336 (5 mg, manufactured by Sigma-Aldrich Co., Ltd.), toluene (i2 mL), and 2 mol/L sodium carbonate aqueous solution (1 mL) were stirred at 105 ° C for 9 hours, followed by the addition of phenylboric acid (23 mg). Stir at 105 ° C] '4 hours. Sodium diethyldithiocarbamate trihydrate (0.40 g) and water (8 mL) were added to the reaction mixture, and the mixture was stirred at 8 (TC for 2 hours, and the mixture was dropped to 0.45, and the precipitate was recovered by filtration. Drying is carried out. The solid is dissolved in chloroform, refined by alumina and silica gel chromatography, and the droplets T. to methanol are washed out, and the precipitate is recovered by the transition and dried to obtain a polymer L (0. 56g) The number average molecular weight converted from the polystyrene of the human mouth L is 3·4xl〇4. The polyalpha L is composed of the structural unit represented by the formula (7). 323323 167 201220574

H3C(OH2CH2C^CH3C(OH2CH2C^C

H3C(OH2CH2CH3C (OH2CH2C

[實驗例15] 聚合物L鉋鹽之合成 於氬環境下，將聚合物L(0. 25g)、THF(13mL)、甲醇 (6mL)、氫氧化铯一水合物（69mg)、及水（lmL)以65°C授拌 6小時，將反應混合物濃縮後，滴下至異丙醇，藉由過遽 而回收固體並予以乾燥。對於固體加入甲醇後進行過據， 將濾液滴下至異丙醇後，藉由過濾而回收固體並予以乾 燥’得到聚合物L鉋鹽（〇. i9g)。所得之聚合物l铯鹽稱為 共轭高分子化合物15。共軛高分子化合物15係由式（AA) φ 所示之構造單元所構成。[Experimental Example 15] Synthesis of polymer L-planar salt In a argon atmosphere, polymer L (0.25 g), THF (13 mL), methanol (6 mL), cesium hydroxide monohydrate (69 mg), and water ( 1 mL) was stirred at 65 ° C for 6 hours, the reaction mixture was concentrated, and then dropped to isopropanol, and the solid was recovered by hydrazine and dried. After the solid was added to methanol, the filtrate was dropped to isopropanol, and the solid was recovered by filtration and dried to give a polymer L-planar salt (〇. i9 g). The obtained polymer l sulfonium salt is referred to as conjugated polymer compound 15. The conjugated polymer compound 15 is composed of a structural unit represented by the formula (AA) φ.

从㈣叫 —〇、H2CH2〇)3CH3 H3QOH2CH2C) Η30(ΟΗ2〇Η2 (AA) 共輛高分子化合物15 的HOMO之軌威能量為_5. 50eV ’ 323323 168 201220574 LUM0之軌域能量為-2. 65eV。 [實驗例16] 將甲醇與共軛高分子化合物1進行混合，得到包含〇. 2 重1 %之共輕南分子化合物1的組成物。在經成膜圖案化 (patterning)於玻璃基板表面的IT0陰極（膜厚：45nm) 上’於空氣中藉由旋轉塗佈法塗佈前述組成物，得到膜厚 10nm的塗膜。將設有該塗膜之基板於常壓之惰性環境下（氮 環境F)以130°C加熱10分鐘，使溶媒蒸發後，自然冷卻 至室溫為止’得到形成有包含共輛高分子化合物1之電子 注入層的基板。 接下來，將發光高分子材料（Samsung股份有限公司 製，商品名「LumationBP361」）與二曱苯進行混合，得到 包含1.4重量％的發光高分子材料之發光層形成用組成 物。在上述所得之形成有包含共軛高分子化合物丨之層的 基板的包含共輛高分子化合物1之層上，於空氣中藉由旋 • 轉塗佈法塗佈發光層形成用組成物，得到膜厚8〇nm的塗 膜。將設有該塗膜的基板於惰性環境下（氮環境下）以13〇。〇 加熱15分鐘，使溶媒蒸發後，自然冷卻至室溫為止，得到 形成有發光層的基板。 接下來，在上述所得之形成有發光層之基板的發光層 上，灰空氣中藉由旋轉塗佈法塗佈電洞注入材料溶液，得 到膜厚60nm的塗膜。將設有該塗膜之基板於惰性環境下 (氮環境下）以130°C加熱15分鐘，使溶媒蒸發後，自然冷 卻至至，付到形成有電洞注入層之基板。在此，電洞注 323323 169 201220574 入材料溶液係使用Starck-VTECH股份有限公司製PEDOT: PSS溶液（聚（3, 4-伸乙基二氧噻吩）/聚苯乙烯磺酸，製品 名「Baytron」）。 將上述所得之形成有電洞注入層的基板挿入真空裝置 内，藉由真空蒸鍍法於該層上將Αιι成膜為8〇nm，形成陽 極，製造積層構造體1。From (4) called -〇, H2CH2〇)3CH3 H3QOH2CH2C) Η30(ΟΗ2〇Η2 (AA) The HOMO orbital energy of the total polymer compound 15 is _5. 50eV ' 323323 168 201220574 The orbital energy of LUM0 is -2. 65 eV. [Experimental Example 16] Methanol and conjugated polymer compound 1 were mixed to obtain a composition containing 共. 2 by weight of a total of light South molecular compound 1. The film was patterned on a glass substrate. The surface of the IT0 cathode (film thickness: 45 nm) was coated with the above composition by spin coating in air to obtain a coating film having a film thickness of 10 nm. The substrate provided with the coating film was placed under an inert atmosphere at normal pressure. (Nitrogen environment F) The substrate was heated at 130 ° C for 10 minutes to evaporate the solvent, and then naturally cooled to room temperature to obtain a substrate on which an electron injecting layer containing a total of polymer compound 1 was formed. (The product name "Lumation BP361" manufactured by Samsung Co., Ltd.) is mixed with diphenylbenzene to obtain a composition for forming a light-emitting layer containing 1.4% by weight of a light-emitting polymer material. The obtained conjugated polymer compound is formed as described above.丨之On the layer containing the polymer compound 1 on the substrate, the composition for forming a light-emitting layer was applied by a spin coating method in the air to obtain a coating film having a thickness of 8 nm. The substrate was heated in an inert atmosphere (under a nitrogen atmosphere) at 13 Torr for 15 minutes to evaporate the solvent, and then naturally cooled to room temperature to obtain a substrate on which the light-emitting layer was formed. On the light-emitting layer of the substrate of the layer, the hole injection material solution was applied by spin coating in a gray air to obtain a coating film having a film thickness of 60 nm. The substrate provided with the coating film was placed under an inert atmosphere (under a nitrogen atmosphere). After heating at 130 ° C for 15 minutes, the solvent was evaporated, and then naturally cooled to the substrate on which the hole injection layer was formed. Here, the hole injection 323323 169 201220574 into the material solution was made by Starck-VTECH Co., Ltd. PEDOT: PSS solution (poly(3,4-extended ethyldioxythiophene)/polystyrenesulfonic acid, product name "Baytron"). The substrate obtained by forming the hole injection layer obtained above is inserted into a vacuum apparatus. Vacuum evaporation method for this layer The Αιι as 8〇nm deposition, the anode is formed, producing a laminate structure.

自真空裝置取出上述所得之積層構造體丨，於惰性環 境下（氮環境下）以密封玻璃與雙液混合型環氧樹脂進行= 封，得到有機EL元件1。 對上述所得之有機EL元件1施加ιον的順向電壓，測 定發光亮度與發光效率。結果示於表1。 [表1 ]The laminated structure obtained above was taken out from the vacuum apparatus, and sealed with a sealing glass and a two-liquid mixed epoxy resin in an inert atmosphere (under a nitrogen atmosphere) to obtain an organic EL device 1. The forward voltage of ιον was applied to the organic EL element 1 obtained above, and the luminance and the luminous efficiency were measured. The results are shown in Table 1. [Table 1 ]

發光亮度 -5 (cd/m2) 有機EL元件1 3580Luminous brightness -5 (cd/m2) Organic EL element 1 3580

[實驗例Π] 〈兩面發光型的有機EL元件之製作〉 於實驗例_16中除了將Au的膜厚改為2〇nm以外，係與 貝驗例16進行同樣操作，得到兩面發光型的有機乩元件 2 ° 對於上述所得之兩面發光型的有機EL元件2施加i5v的順 向電壓’測定發光亮度與發紐率。結果示於表2。 323323 170 201220574 [表2: — 發光亮度 (cd/m2) ------ 發光效率 (cd/A) 有機EL元件2 上面側：1091 下面側：5341 上面侧：0. 3 下面侧：1. 1 如表1及2所示，於空氣中藉由塗佈製程將離子性黎 合物製成膜而形成有電子注入層之逆積層的有機EL元件 ^係經確認為會發光者。 本發明之在具有由有機EL元件所構成的複數個畫素 的有機EL顯示裝置中所用之上述離子性聚合物，係電精么 注入性及傳輸性優異，於常壓程度之環境中為安定，町容 易地製成溶液，於常壓程度之環境中可藉由塗佈而成膦 化。因此’將包含§亥離子性聚合物的層用於有機EL元件的 電子注入層時，可減低製造的成本，而可提供能確保製造 φ 程序安定性的有機EL顯示裝置的製造方法及藉由該製造 方法所得之有機EL顯示裝置。 [有機EL元件之構成] 首先，對本發明之有機EL顯示裝置的畫素所用的有機 EL元件進行說明。本發明所用的有機EL元件之構造，係 在由至少一方為透明或半透明之一對的陽極及陰極所構成 的電極間具有至少1層發光層，並在該發光層與前述陰極 之間具有電子注入層’發光層係使用低分子及/或高分子的 有機發光材料’電子注入層係使用上述離子性聚合物。 171 323323 201220574 在有機EL元件中，陰極、陽極、發光層以外的層可列 舉如設於陰極與發光層之間者、設於陽極與發光層之間者。 以没於陰極與發光層之間者而言，除了上述電子注入 層之外’可列舉如：電子傳輸層、電洞阻擋層等。 例如於陰極與發光層之間僅設一層時，此即為電子注 入層；於陰極與發光層之間設有二層以上時，相接於陰極 的層即為電子注入層，此外之層稱為電子傳輸層。 φ 電子注入層為具有改善來自陰極之電子注入效率的機 能之層，電子傳輸層為具有改善來自電子注入層或較接近 陰極之電子傳輸層之電子注入的機能之層。 而且，當電子注入層或電子傳輸層具有阻止電洞傳輸 之機能時，此等層係有稱為電洞阻擋層之情形。 是否具有阻止電洞傳輸之機能，係例如可製作僅流通 電洞電流的元件，並以其電流值的減少而確認阻止之效果。 以β又於陽極與發光層之間者而s ’可列舉如：電洞注 Φ 入層，·電洞傳輸層、電子阻擋層等。 當於陽極與發光層之間僅設一層時，即為電洞注入 層；於陽極與發光層之間設有二層以上時，相接於陽極的 層即為電洞注入層，此外之廣係稱為電洞傳輸層。電洞注 入層為具有改善來自陰極之電洞注入效率的機能之層，電 洞傳輸層為具有改善來自電洞注入層或較接近陽極的電洞 傳輸層之電洞注入的機能之層。而且，當電洞注入層或電 /同傳輪層具有阻止電子傳輸之機肖b時，此等層係有稱為電 子阻擋層之情形。 323323 172 201220574 是否具有阻止電子傳輸的機能，係例如可製作僅流通 電子電流之元件，以其電流值的減少而確認阻止之效果。 並且，本發明之有機EL顯示裝置的畫素所用之有機 EL元件，可列舉如除了具有於陰極與發光層之間設有電子 注入層的構造之外，更進一步，在陰極與發光層之間設有 電子傳輸層的有機EL元件、在陽極與發光層之間設有電洞 傳輸層的有機EL元件、在陽極與發光層之間設有電洞傳輸 φ 層與電洞注入層的有機EL元件等。 例如，具體係例示為以下的a)至j)之構造。 a) 陽極/發光層/電子注入層/陰極 b) 陽極/電洞注入層/發光層/電子注入層/陰極 c) 陽極/電洞注入層/電洞傳輸層/發光層/電子注入層/陰 極 d) 陽極/電洞注入層/發光層/電子傳輸層/電子注入層/陰 極 Φ e)陽極/發光層/電子傳輸層/電子注入層/陰極 f)陽極/電洞注入層/電洞傳輸層/發光層/電子傳輸層/電 子注入層/陰極 (在此’/表示各層為相鄰接而積層。以下相同。） 闕於積層之層的順序或數目及各層的厚度，可斟酌發 光效率及元件壽命而進行適宜設定。 [有機EL顯示裝置之構成（實施形態之一）] 接下來，參照第1圖，對本發明之有機EL顯示裝置的 一個實施形態的概略構成進行說明。 173 323323 201220574 (基板） 以基板1而言，當為戶田，[Experimental Example] <Production of Two-Layer Light-Emitting Organic EL Element> In Experimental Example _16, except that the film thickness of Au was changed to 2 〇 nm, the same operation as in Test Example 16 was carried out to obtain a two-sided light-emitting type. Organic germanium element 2 ° The forward voltage 'i of i5v' was applied to the two-surface light-emitting organic EL element 2 obtained above to measure the light-emitting luminance and the electron-emitting ratio. The results are shown in Table 2. 323323 170 201220574 [Table 2: — Luminance (cd/m2) ------ Luminous efficiency (cd/A) Organic EL element 2 Upper side: 1091 Lower side: 5341 Upper side: 0. 3 Lower side: 1 As shown in Tables 1 and 2, an organic EL device in which an ionic nucleus compound is formed into a film by air in a coating process to form an inverse electrode layer of an electron injecting layer is confirmed to be a luminescent person. The ionic polymer used in the organic EL display device having a plurality of pixels composed of an organic EL element of the present invention is excellent in injectability and transportability, and is stable in an environment of atmospheric pressure. The town is easily made into a solution, which can be formed into a phosphine by coating in an environment of atmospheric pressure. Therefore, when a layer containing the ionic polymer is used for the electron injecting layer of the organic EL element, the manufacturing cost can be reduced, and a manufacturing method of the organic EL display device capable of ensuring the manufacturing stability of the φ program can be provided and The organic EL display device obtained by the production method. [Configuration of Organic EL Element] First, an organic EL element used for a pixel of the organic EL display device of the present invention will be described. The organic EL device used in the present invention has at least one light-emitting layer between electrodes composed of an anode and a cathode which are at least one of transparent or translucent, and has between the light-emitting layer and the cathode. The electron injecting layer 'the light emitting layer is a low molecular and/or high molecular organic light emitting material'. The electron injecting layer uses the above ionic polymer. 171 323323 201220574 In the organic EL device, a layer other than the cathode, the anode, and the light-emitting layer may be provided between the cathode and the light-emitting layer, and between the anode and the light-emitting layer. In the case of not being between the cathode and the light-emitting layer, in addition to the above-described electron injecting layer, an electron transporting layer, a hole blocking layer and the like may be mentioned. For example, when only one layer is provided between the cathode and the light-emitting layer, this is an electron injection layer; when two or more layers are provided between the cathode and the light-emitting layer, the layer that is in contact with the cathode is an electron injection layer, and the layer is called It is an electron transport layer. The φ electron injection layer is a layer having a function of improving the electron injection efficiency from the cathode, and the electron transport layer is a layer having a function of improving electron injection from the electron injection layer or the electron transport layer closer to the cathode. Moreover, when the electron injecting layer or the electron transporting layer has a function of preventing hole transport, these layers are referred to as a hole blocking layer. Whether or not it has a function of preventing the transmission of holes, for example, it is possible to produce an element in which only the current of the hole flows, and the effect of blocking is confirmed by the decrease in the current value. In the case where β is between the anode and the light-emitting layer, s ' can be exemplified by a hole injection Φ, a hole transport layer, an electron blocking layer, and the like. When only one layer is provided between the anode and the light-emitting layer, it is a hole injection layer; when two or more layers are provided between the anode and the light-emitting layer, the layer connected to the anode is a hole injection layer, and further It is called a hole transport layer. The hole injection layer is a layer having a function of improving the efficiency of hole injection from the cathode, and the hole transport layer is a layer having a function of improving hole injection from the hole injection layer or the hole transport layer closer to the anode. Moreover, when the hole injection layer or the electric/crossing layer has a mechanism b for preventing electron transport, these layers are referred to as an electron blocking layer. 323323 172 201220574 Is it possible to prevent the transmission of electrons by making an element that only distributes electronic current, and the effect of blocking is confirmed by the decrease in current value. Further, the organic EL element used for the pixel of the organic EL display device of the present invention may be, for example, a structure having an electron injection layer between the cathode and the light-emitting layer, and further, between the cathode and the light-emitting layer. An organic EL element having an electron transport layer, an organic EL element having a hole transport layer between the anode and the light-emitting layer, and an organic EL having a hole transporting a φ layer and a hole injection layer between the anode and the light-emitting layer Components, etc. For example, the specific structure is exemplified as the following configurations a) to j). a) anode/light-emitting layer/electron injection layer/cathode b) anode/hole injection layer/light-emitting layer/electron injection layer/cathode c) anode/hole injection layer/hole transmission layer/light-emitting layer/electron injection layer/ Cathode d) Anode / hole injection layer / luminescent layer / electron transport layer / electron injection layer / cathode Φ e) anode / luminescent layer / electron transport layer / electron injection layer / cathode f) anode / hole injection layer / hole Transport layer/light-emitting layer/electron transport layer/electron injection layer/cathode (herein '/ each layer is adjacent and laminated. The same applies hereinafter.) Depending on the order or number of layers and the thickness of each layer, light can be considered Set the efficiency and component life as appropriate. [Configuration of Organic EL Display Device (Embodiment)] Next, a schematic configuration of an embodiment of the organic EL display device of the present invention will be described with reference to Fig. 1 . 173 323323 201220574 (substrate) In the case of substrate 1, when it is Toda,

% 型的有機EL顧-拉番拉明之頂部發光（top-emission) 出的光，姑‘不^ ，因係從基板1的對面側取出所發 不遷明h可，透明基板及不透明基板中的任—者。以 片、戋董“反而。可舉例如由氧化鋁等陶瓷所構成的薄 施=不鏽鋼（stainlesssteel)等所構成的金屬薄片 性樹t化等絶緣處理者’此外，亦可舉例如由熱硬化 39、熱可塑性樹脂等所構成之薄片。 · 且’當為所謂的底部發光（bQtfmemission)型有機 1係2裴置時因係從基板丨側取出所發出的光，故基板 等所檨用透明或半透明者。可舉例如由玻璃、石英、樹脂 成之溥片，而以玻璃基板為特別適合者。 形成\，在基板1與晝素電極2之間，設置包含為了驅動 1基板1上之複數個有機EL元件而用的驅動用TFT等 電路部(無圖示）。 (陰極(晝素電極)） 的材^陰極（畫素電極）2之材料而言，亦可利用功函數大 ;呌彳使用例如：鈹、鎂、鋁、钪、釩、鋅、釔、錮、 N x KJh 、 、铽、镱、鈦、鉻、猛、鐵、鈷、錦、銅、錯、 屬口 ，.巴、銀、錫、组、鶴、銀、在白、金、鉛、纽等金 或1或上述金屬中之兩者以上的合金；或石墨（graphite) 隹弋^墨層間化合物等。金屬中係以不易氧化的材料為 銀、乂鈦、鉻、錳、鐵、鈷、鎳、鋼、锆、鈮、銦、鈀、 ^ t、鎢、銥、鉑、金、鉛、鉍等為較佳。此外， 323323 174 201220574 可利用屬於導電性氧化物之π〇、Ζη〇、ζτ〇、IZT〇等。亦 可將陰極作成2層以上之積層構造。 (電子注入層） 在以圖案方式形成有前述陰極2之基板丨上，形成全 晝素共通之電子注入層4。 電子注入層係設置於發光層與陰極之間而相接於陰 極0 φ 本發明中，電子注入層係使用上述離子性聚合物，從 溶液進行成膜。 以形成電子注入層的方法而言，可舉例如：使用含有 月|J述離子性聚合物的溶液進行成膜的方法。 以如此從溶液進行成膜時所用的溶媒而言，水除外， 較佳為溶解度參數9.3以上的溶媒。該溶媒之例（各括弧内 的值表示各溶媒的溶解度參數之值），可列舉例如：曱醇 (12. 9)、乙醇（11.2)、2-丙醇（ιι·5)、1-丁醇（9. 9)、第三 Φ 丁基醇（10. 5)、乙腈（U. 8)、1，2-乙烷二醇（14. 7)、Ν, Ν-二甲基甲醯胺（11.5)、二甲基亞砜（12·8)、乙酸（12.4)、 硝基苯（11. 1)、硝基甲烷（11· 〇)、L 2一二氣乙烷（9· 7)、二 氯甲炊（9· 6)、氣苯（9· 6)、溴苯（9. 9)、二卩辱烷（9. 8)、碳 酸伸丙酯（13. 3)、啦嗖（1〇.4)、二硫化碳（1〇.〇)、及此等 溶媒之混合溶媒。在此，對混合2種溶媒（設為溶媒丨、溶 媒2)而成的混合溶媒進行說明，該混合溶媒之溶解度參數 (5 m)係藉由（5m=d 1χ φ 1+&lt;5 2χ φ 2求得（(51為溶媒1之 /谷解度參數，Φ 1為溶媒1之體積分率，5 2為溶媒2之溶 323323 175 201220574 解度參數’ φ2為溶媒2之體積分率）。 以從溶液成膜的方法而言，可列舉例如：旋轉塗佈法、 澆鑄（casting)法、微凹版印刷（micro gravure print)法、 凹版如刷法、棒塗（bar coat)法、輥塗法、線棒塗法、浸 塗（dip Coat)法、狹縫塗佈（slit c〇at)法、蓋塗佈（cap coat)法、喷霧塗佈法、網板印刷法、膠板（flex〇)印刷法、 套版印刷（offset print)法、喷墨印刷（inkjet pHnt) φ 噴嘴塗佈法等塗佈法。 以電子注入層的膜厚而言，因最適值係隨所用的聚合 物y共軛高分子化合物）而相異，故選擇使驅動電壓與發光 效率成為適度值者即可，且必須為不產生針孔的厚度。從 j咸低7L件的驅動電壓之觀點來看，該膜厚較佳為lnm至 ^以&quot;!’更佳為211111至500nm，又更佳為2nm至2〇〇⑽。從保 濩發先層之觀點來看，該膜厚較佳為1〇nm至，更佳 為5〇nm至1_，又更佳為議⑽至 t 路然亦可為在積層前述電子注入層4後再設置電子傳 輪層之構成，但本實施形態係未形成電子傳輸層，而在各 晝素（丨ί晝素31、G晝素32及B畫素33)所在位置的電子注 入層4上設有發光層（R發光層61、〇發光層62及Β發光 層 63) 〇 (電子傳輸材料） 形成電子傳輸層時，可使用作為傳輸電子傳輸材料而 為a知者，例示為：卩等二唾衍生物、蒽藏二甲烧或其衍生 物、笨醌或其衍生物、萘醌或其衍生物、蒽醌或其衍生物、 176 323323 201220574 四氰基蒽醌二甲烷或其衍生物、苐酮衍生物、二苯基二氛 基乙卸或其衍生物、聯本酿i(diphenoquinone)衍生物、或 是8-經基啥淋或其衍生物之金屬錯合物、聚啥琳或其衍生 物、聚喹噚啉（polyquinoxaline)或其衍生物、聚第或其衍 生物等。 此4之中，較佳為％二唾衍生物、苯酿或其衍生物、 蒽醌或其衍生物、或是8-羥基喹啉或其衍生物之金屬錯合 物、聚喹啉或其衍生物、聚喹噚啉或其衍生物、聚第或其 衍生物；更佳為2-(4-聯苯基）-5-(4-第三丁基苯基） 1,3,4 π号一唾、本酿、蒽醒、參（8_嗜琳酚）紹、聚啥琳。 電子傳輸層之成膜法雖無特殊限制，但若為低分子傳 輸電子傳輸材料時則例示如從粉末進行之真空蒸鍍法、或 是從溶液或從溶融狀態進行成膜之方法，若為高分子傳輸 電子傳輸材料時則例示如從溶液或溶融狀態進行成膜的方 法。從溶液或炫融狀態進行成膜時，亦可併用高分子黏結 籲⑷（b:nder)。本發明中’在此等之中，較佳為從溶液或溶 融狀態進行成膜之方法，亦即藉由塗佈而進行之方法。從 溶液將電子傳輪層製成膜的方法，可列舉如與前述從溶液 將電洞傳輸層製成膜的方法相同的成膜法。 以電子傳輸層的膜厚而言，最適值會隨所用之材料而 相異，選擇使驅動電壓與發光效率成為適度值者即可，但 須：不產生針孔的厚度，若過厚，則元件的驅動電 ik间’為不佳。從而’以該電子傳輸層的膜厚而古，係 例如1舰至^，較佳為2ng5_m，更佳為5nra至綱nrae 323323 177 201220574 (撥液圖案） 在形成上述R發光層61、G發光層62及β發光層63 之前，形成撥液圖案5。撥液圖案5可設置於畫素以外的 區域，亦即在應設置上述R發光層61、G發光層62及Β發 光層63的區域以外的區域。換$之’上述r發光層61、g 發光層62及B發光層63係设置於形成有撥液圖案5之區 域以外的區域。撥液圖案5係將例如預定的反應性界面活 性組成物進行成膜而製成圖案者（對應第2圖之態樣）。此 外’亦可藉由例如將表現撥液性的材料進行轉印，而形成 撥液圖案5 (對應第3圖之態樣）。撥液圖案5之開口部係 對應於各晝素區域，露出下層之電子注入層4。撥液圖案5 係較從其開口部露出之電子注入層4表現更多撥液性。 (反應性界面活性組成物） 反應性界面活性組成物（以下亦有簡寫為RSA之情形） 係感光性組成物的一種。若將隐進行曝光，μ RSA的至 少1個物理性質及/或化學性質會有變化，而經#光的區域 與未曝光的區域會產生物理性的差異。若以RSA進行處 理’則經處理的材料之表面能量會降低。 RSA的1個實施形態係光硬化性組成物。此種情形下， 方將之曝光’則會造成RSA對於液體媒質之可溶性或分散 ^曰^夕點著性降低、柔軟性降低、流動性降低。 /此外，+RSA的1個實施形態係光軟化性組成物。此種 If形下右將之曝光’則會造成RSA對於液體媒質之可溶 性或分散性降低、黏著性增加、 柔軟性增加、流動性增加。 178 323323 201220574 曝光所使用的光可為使咖產生物理 光，例如選自：紅外線 艾化之種類的 組合。 了見先先線、紫外線、及該等之 RSA經曝光後，「將經曝光的部位 以去除」在下述中係稱為「 絲曝先的部位予 的技術進行。如此之技二s::衫係可藉由所有周知 ⑽物sist)技術領域。触之 ^^劑 媒質進行處理、以吸收材料進行處理體 處理等，惟*限定於料者。 彳❹材枓進行 营曾;=的1，實f形態個或魏倾光性材料所 實負：冓成。此外，RSA的i個實施形態係由若經曝光 硬化’或者是對㈣媒f之可溶性、_性、或分散^ 低’或者是黏著性或吸收性降低的材料所實質構成 脱的1個實施形態係由具有光聚合性基的材料所實質構 成。以如此之基的例而言，可列舉例如：烯蛵基 (olefinyl)、丙烯醯基、甲基丙烯醯基、及乙烯醚基:二 不限定於此等者。而且，RSA的丄個實施形態係具有2個 以上可產生交聯之聚合性基。而且，RSA的i個實施形熊 係由若經曝光，則軟化，或者是對於液體媒質之可溶性、 膨潤性、或分散性增加，或者是黏著性或吸收性增加之材 料所實質構成。而且，RSA的1個實施形態係由若經具有 200至300mn範圍内之波長的uv射線進行曝光，則主鏈會 分解的至少1種聚合物所實質構成。如此之會發生分解的 聚合物之例，可列舉例如：聚丙嫦酸酯、聚甲基丙婦酸酯、 323323 179 201220574 聚嗣、聚爾1、該！夕丛取仏 於此等者。 私物、及料之混合物，惟不限定 RSA的1個實施形態係由至少玉種反應性 種感f性材料所實f構成。此感紐材料若_光、，貝= 生材料開始反應之活性種。感光性材料之例， =自，~1)、酸、或會生二 態中^應性材料為聚合性或交聯性1料的聚合 反應係猎由活性種而開始或被催化。卩RSA的全部重量作 為基準，感紐材料―般係以Q•謝％至1()._量而存在。 脱的1個實施形態係由若經曝光，則硬化， 對=液體媒質之可溶性、膨潤性、或分散性降低，或者= 黏著性或吸收性降低的材料所實f構成。而且，rsa的1 個實施形態中’反應性材料為乙烯性不飽和化合物，感光 性材料會生成自由基。乙烯性不飽和化合物可舉例如：丙 烯酸酯、曱基丙烯酸酯、乙烯基（vinyl)化合物、及該等之 組合’惟不限定於此等者。可使用會生成自由基之所有周 知種類之感光性材料。生成自由基之感光性材料的例，可 列舉例如.S昆（quinone)類、二苯基嗣^^⑽叩^⑽此）類、 安息香（benzoin)醚類、芳基酮類、過氧化物、聯咪唑類、 苯偶醯二甲基縮酮（benzil dimethyl Ketal)、經基烧基笨 基本乙酉同（hydroxyl alkyl phenyl acetophone)、二烧氧 基乙醯.笨、氧化二甲基苯曱醯基膦衍生物、胺基酮類、苯 甲醯基環己醇、曱基硫基笨基嗎啉基酮類、嗎啉基苯基胺 180 323323 201220574 基酮類、α-齒乙醯苯類、氧基磺醯酮類、磺醯酮類、氧基 磺醯酮類、磺醯鲷類、苯曱醯基肟酯類、噻吨^ (thioxanthrone)類、莰醌（camph〇rquin〇ne)類、香豆素_ (ketocoumarin)類、及米其勒酮（Michler，s ket〇ne)，惟 不限足於此等者。或者是，感光性材料係複數種化合物之 混合物，且其巾1者可為錢㈣光騎雜化之增感劑 而活性化後則會得到自由基之化合物。丨個實施形態中， 感光性材料對於可見光光線或紫外線會進行反應。 RSA的1個實施形態係具有丨個或減個交聯性基的 化合物。父聯性基可具有雙鍵、三鍵、可形成雙鍵的前驅 物、或含有雜環式加成聚合性基之部分。以交聯性基之例 的-部分而言，可列舉例如：從苯並環τ烯中去除1個氣 原子後所得的基、錢基、環氧基、二（烴基）胺基、異氛 酸酯基、羥基、環氧丙基醚（glycidyl ether)基、0至b 炫基丙_基、GIG。烧基曱基丙烯酸基、稀基、稀基氧。 基、块基、馬來醯亞胺基、納迪克醯亞胺（nadiimide)基、 二（〇至C4)烷基矽氧基、三（匕至c〇烷基矽基、及該等之 齒化衍生物。在1個實施形態中，交聯性基為選自乙歸基 ¥基、對乙烯絲基、全I乙稀基、全氟乙烯基氧基、笨 並-3, 環丁烧-卜基、及對一（苯並_3, 4_環丁烧―卜基 所成群組中。 Α 在1個實施形態中，反應性材料可藉由酸而使聚合開 始進行，感光性㈣财錢。如此之反應性材料之^ 列舉如環氧基，惟秘定於此等者。生成酸的感光性材料 323323 181 201220574 敗填酸二苯麵等疏鹽及㈣，惟不限 挪的1個實施形態係由若經曝光，則軟化，戍者是 對於液體媒質之可溶性、膨潤性 、⑻匕成者疋 1J. 4，„ 或分散性增加’或者是 黏者性或吸收性增加之材料所實The light of the top-emission of the %-type organic EL-La-Pan-La-Ming is not, because it is taken out from the opposite side of the substrate 1, and the transparent substrate and the opaque substrate are in the transparent substrate and the opaque substrate. Anyone. In other words, for example, an insulating treatment such as a thin metal sheet composed of a ceramic such as alumina or a stainless steel (stainless steel) may be used, and may be, for example, thermally hardened. 39. A sheet made of a thermoplastic resin, etc. · When the so-called bottom-emitting (bQtfmemission) type organic 1 type 2 is placed, the light emitted from the side of the substrate is taken out, so that the substrate is transparent. Or a translucent one, for example, a glass, quartz, or resin, and a glass substrate is particularly suitable. Forming \, between the substrate 1 and the halogen electrode 2, is provided for driving on the substrate 1 A circuit portion (not shown) such as a driving TFT for a plurality of organic EL elements (a cathode (pixel electrode)) may be made of a material having a large work function.呌彳 use, for example, bismuth, magnesium, aluminum, strontium, vanadium, zinc, antimony, bismuth, N x KJh, 铽, 镱, titanium, chrome, lanthanum, iron, cobalt, bromine, copper, wrong, genus, . Pakistan, silver, tin, group, crane, silver, in white, gold, lead, New Zealand and other gold 1 or an alloy of two or more of the above metals; or graphite (graphite), an interlayer resin, etc. The metal is a material which is not easily oxidized, and is silver, barium, titanium, chromium, manganese, iron, cobalt, nickel, steel. Zirconium, hafnium, indium, palladium, ^t, tungsten, rhenium, platinum, gold, lead, antimony, etc. Further, 323323 174 201220574 can utilize π〇, Ζη〇, ζτ〇, which are conductive oxides. IZT〇, etc. The cathode may be formed into a laminated structure of two or more layers. (Electron injection layer) On the substrate yoke on which the cathode 2 is formed in a pattern, an electron injection layer 4 common to the entire ruthenium is formed. Provided between the light-emitting layer and the cathode to be in contact with the cathode 0 φ. In the present invention, the electron injecting layer is formed from a solution using the above ionic polymer. The method for forming the electron injecting layer may, for example, be: A method of forming a film by using a solution containing a ionic polymer of the same type. The solvent used for film formation from the solution is not particularly limited to water, and is preferably a solvent having a solubility parameter of 9.3 or higher. Value in each bracket The value of the solubility parameter of each solvent is, for example, decyl alcohol (12.9), ethanol (11.2), 2-propanol (ιι 5), 1-butanol (9.9), and third Φ. Butyl alcohol (10.5), acetonitrile (U. 8), 1,2-ethanediol (14.7), hydrazine, hydrazine-dimethylformamide (11.5), dimethyl sulfoxide ( 12·8), acetic acid (12.4), nitrobenzene (11.1), nitromethane (11·〇), L 2 dioxane (9·7), dichloromethane (9·6) , gas benzene (9.6), bromobenzene (9.9), dioxane (9.8), propyl carbonate (13. 3), 嗖 (1〇.4), carbon disulfide (1〇 .)), and a mixed solvent of these solvents. Here, a mixed solvent in which two kinds of solvents (which are a solvent oxime and a solvent 2) are mixed, and the solubility parameter (5 m) of the mixed solvent is obtained by (5m = d 1 χ φ 1 + &lt; 5 2 χ φ 2 is obtained ((51 is solvent 1 / valley solution parameter, Φ 1 is the volume fraction of solvent 1, 5 2 is solvent 2 323323 175 201220574 solution parameter 'φ2 is the volume fraction of solvent 2) Examples of the method of forming a film from a solution include a spin coating method, a casting method, a micro gravure printing method, a gravure such as a brush method, a bar coat method, and a roll. Coating method, wire bar coating method, dip Coat method, slit coating method, cap coating method, spray coating method, screen printing method, rubber sheet (flex〇) coating method such as printing method, offset printing method, inkjet printing (inkjet pHnt) φ nozzle coating method, etc. The film thickness of the electron injecting layer is used as the optimum value. Since the polymer y conjugated polymer compound is different, it is only necessary to select a driving voltage and a luminous efficiency to be appropriate values, and it is necessary to not generate The thickness of the pinhole. From the viewpoint of the driving voltage of the salt-low 7L piece, the film thickness is preferably from 1 nm to 2, more preferably from 211111 to 500 nm, and even more preferably from 2 nm to 2 Å (10). The film thickness is preferably from 1 〇 nm to more preferably from 5 〇 nm to 1 _, and more preferably from (10) to t, but also in the lamination of the aforementioned electron injection. After the layer 4, the electron transfer layer is further disposed. However, in this embodiment, the electron transport layer is not formed, and electron injection at the positions of the respective elements (丨ί昼31, G昼素32, and B pixel 33) is performed. The layer 4 is provided with a light-emitting layer (R light-emitting layer 61, x-ray light-emitting layer 62, and x-ray light-emitting layer 63). (Electron-transporting material) When an electron-transporting layer is formed, it can be used as a transport electron transporting material, and is exemplified as : a di-salt derivative such as hydrazine, dimethyl sulphide or a derivative thereof, alum or a derivative thereof, naphthoquinone or a derivative thereof, hydrazine or a derivative thereof, 176 323323 201220574 tetracyanoquinodimethane or a derivative thereof, an anthrone derivative, a diphenyl diol group or a derivative thereof, a diphenoquinone derivative, or an 8-jingr a metal complex of guanidine or a derivative thereof, poly phthalocyanine or a derivative thereof, polyquinoxaline or a derivative thereof, polydipeptide or a derivative thereof, etc. Among these 4, preferably 2% a salivation derivative, a benzene styrene or a derivative thereof, hydrazine or a derivative thereof, or a metal complex of 8-hydroxyquinoline or a derivative thereof, polyquinoline or a derivative thereof, polyquinoxaline or a derivative thereof a substance, a polydipeptide or a derivative thereof; more preferably a 2-(4-biphenyl)-5-(4-t-butylphenyl) 1,3,4 π-salt, a brew, an awakening, Shen (8_ 琳 phenol) Shao, Ju Yulin. The film formation method of the electron transport layer is not particularly limited, but when it is a low molecular weight electron transport material, a vacuum vapor deposition method from a powder or a method of forming a film from a solution or a molten state is exemplified. When the polymer transports an electron transporting material, a method of forming a film from a solution or a molten state is exemplified. When the film is formed from a solution or a molten state, it is also possible to use a polymer bond (4) (b:nder) in combination. In the present invention, among these, a method of forming a film from a solution or a molten state, that is, a method by coating, is preferred. The method of forming the electron transporting layer from the solution into a film includes the same film forming method as the method of forming the hole transporting layer from the solution. In terms of the film thickness of the electron transport layer, the optimum value may vary depending on the material used, and the driving voltage and the light-emitting efficiency may be selected to be moderate values, but it is necessary to: the thickness of the pinhole is not generated, and if it is too thick, The driving force of the components is not good. Therefore, the film thickness of the electron transport layer is, for example, 1 ship to ^, preferably 2 ng 5 mm, more preferably 5 nra to class nrae 323323 177 201220574 (liquid pattern) in forming the above R light emitting layer 61, G light Before the layer 62 and the beta light-emitting layer 63, the liquid-repellent pattern 5 is formed. The liquid-repellent pattern 5 can be disposed in a region other than the pixel, that is, a region other than the region where the R light-emitting layer 61, the G light-emitting layer 62, and the light-emitting layer 63 are to be provided. The r-emitting layer 61, the g-emitting layer 62, and the B-emitting layer 63 are provided in a region other than the region in which the liquid-repellent pattern 5 is formed. The liquid-repellent pattern 5 is formed by, for example, forming a predetermined reactive interface active composition to form a pattern (corresponding to the aspect of Fig. 2). Further, the liquid-repellent pattern 5 can be formed by, for example, transferring a material exhibiting liquid repellency (corresponding to the aspect of Fig. 3). The opening portion of the liquid pattern 5 corresponds to each of the halogen regions, and the lower electron injection layer 4 is exposed. The liquid-repellent pattern 5 exhibits more liquid-repellency than the electron-injecting layer 4 exposed from the opening. (Reactive Interface Active Composition) The reactive interface active composition (hereinafter also abbreviated as RSA) is one type of photosensitive composition. If the exposure is implicitly exposed, at least one physical property and/or chemical property of the μ RSA may vary, and a physical difference between the #光 region and the unexposed region may occur. If treated with RSA, the surface energy of the treated material will decrease. One embodiment of RSA is a photocurable composition. In this case, the exposure of the RSA will result in a decrease in the solubility or dispersion of the RSA in the liquid medium, a decrease in the flexibility, and a decrease in the fluidity. Further, one embodiment of +RSA is a photosoftening composition. Exposure of this type to the right will result in a decrease in the solubility or dispersibility of the RSA for the liquid medium, an increase in adhesion, an increase in flexibility, and an increase in fluidity. 178 323323 201220574 The light used for exposure may be a combination of physical light that causes the coffee to produce physical light, such as selected from the group consisting of: infrared. After seeing the first line, the ultraviolet ray, and the RSA after exposure, "removing the exposed portion" is referred to as "the technique of the silk exposure first." The shirt system can be processed by any of the well-known (10) sist) technologies, treated with the medium of the agent, treated with the absorbent material, etc., but is limited to the material. The coffin is carried out by the camp; In fact, the form of the real f or the material of the Wei-lighting material is negative: In addition, the i-embodiment of the RSA is cured by exposure or 'soluble, _, or dispersion of the medium (f) Alternatively, one embodiment in which the material having a low adhesiveness or absorbability is substantially composed of a material having a photopolymerizable group is used. Examples of such a group include, for example, an olefinyl group. Further, the acryl fluorenyl group, the methacryl fluorenyl group, and the vinyl ether group are not limited thereto. Further, in one embodiment of the RSA, there are two or more polymerizable groups capable of crosslinking. Further, RSA i implementation of the bear system is softened if exposed, or for liquid The solubility, swelling, or dispersibility of the bulk medium is increased, or the material with increased adhesion or absorbency is substantially composed. Moreover, one embodiment of the RSA is from a uv beam having a wavelength in the range of 200 to 300 nm. When exposure is carried out, at least one polymer which is decomposed in the main chain is substantially constituted. Examples of the polymer which decomposes in this manner include, for example, polyacrylic acid ester, polymethyl propyl acrylate, 323323 179 201220574嗣, 聚尔 1, the eve of the census, etc.. A mixture of private and material, but not limited to one embodiment of the RSA is composed of at least j species reactive species f material. If the sensible material is _ light, 贝 = the active species that the raw material begins to react. Examples of photosensitive materials, = from, ~1), acid, or the secondary state of the material is polymerized or crosslinked. The polymerization of the first material is started or catalyzed by the active species. The total weight of the 卩RSA is used as a benchmark, and the sense material is generally present in the amount of Q•谢% to 1(). The embodiment is cured by exposure, and is soluble in the liquid medium. The material, the swellability, or the dispersibility is reduced, or the material having a reduced adhesion or absorption is composed of f. Moreover, in one embodiment of rsa, the 'reactive material is an ethylenically unsaturated compound, and the photosensitive material is formed. The radical unsaturated compound may, for example, be an acrylate, a mercapto acrylate, a vinyl compound, or a combination thereof, but is not limited thereto. Any known one that generates a radical may be used. Examples of photosensitive materials, examples of the radical-generating photosensitive material include, for example, quinones, diphenyl hydrazines (10) 叩^(10), benzoin ethers, aryl ketones. Class, peroxide, biimidazole, benzil dimethyl ketone, hydroxyl alkyl phenyl acetophone, di-ethoxy acetonitrile, stupid, oxidized Methylphenyl decyl phosphine derivatives, amino ketones, benzhydryl cyclohexanol, mercaptothio phenyl morpholinyl ketones, morpholinyl phenyl amines 180 323323 201220574 ketones, α- Tetraethyl benzene, oxysulfonone Sulfone, oxysulfonone, sulfonium, benzoquinone ester, thioxanthrone, camph〇rquin〇ne, coumarin _ (ketocoumarin ), and Michler (Michler, s ket〇ne), but not limited to these. Alternatively, the photosensitive material is a mixture of a plurality of compounds, and the towel 1 may be a compound of a radical which is activated by activation of a sensitizer. In one embodiment, the photosensitive material reacts with visible light or ultraviolet light. One embodiment of RSA is a compound having one or less crosslinkable groups. The parental linking group may have a double bond, a triple bond, a precursor capable of forming a double bond, or a moiety containing a heterocyclic addition polymerizable group. Examples of the cross-linking group include, for example, a group obtained by removing one gas atom from a benzocyclo-t-butene, a ketone group, an epoxy group, a di(hydrocarbyl)amino group, and an atmosphere. Acid ester group, hydroxyl group, glycidyl ether group, 0 to b thiopropyl group, GIG. Acryl-based acryl-based, dilute, or dilute oxygen. Base, block group, maleimine group, nadiimide group, bis(〇 to C4) alkyl decyloxy group, tris(匕 to c〇 alkyl fluorenyl group, and the like In one embodiment, the crosslinkable group is selected from the group consisting of ethyl fluorenyl group, p-vinyl group, all-ethylene group, perfluorovinyloxy group, benzo-3, cyclobutane -Buji, and p-(benzo-3,4-cyclobutane-bu-group). In one embodiment, the reactive material can be polymerized by acid, and the photosensitivity (4) Money. Such a reactive material is listed as an epoxy group, but it is secretly determined. The photosensitive material that generates acid 323323 181 201220574 is a salt-dissolving dibenzoic acid and other salts, and (4), but not limited to One embodiment is softened if exposed, and is soluble or swellable to the liquid medium, (8) 匕1J. 4, „ or increased dispersibility' or increased viscous or absorptive Material

中’反應性材料為_，感光性材料為=_ 二可同樣地使用該技術領域中周知的其他感光性系。 SA,的1個實施形態係包含氟化材料。而且，RSA的i 個實㈣態係包含具有！個或複數個氟烧基的不飽和材 料° 1個實施形態中’此等氟烧基係具有2至2G個碳原子。 :且RSA的1個實施形態係i化丙烯酸醋、氣化酉旨、或 氟化歸k單體。可作為RSA材料使用的市售材料之例，可 歹J舉如· 了自Du Pont公司取得的屬於氟化不飽和酯單體 之Zonyl(註冊商標）8857A、及可自Sigma__Aldrich公司The medium-reactive material is _, and the photosensitive material is _2. Other photosensitive systems known in the art can be used similarly. One embodiment of SA includes a fluorinated material. Moreover, RS's i real (four) states contain! One or a plurality of fluoroalkyl group-containing unsaturated materials. In one embodiment, the fluoroalkyl groups have 2 to 2 G carbon atoms. And one embodiment of the RSA is an acrylic vinegar, a vaporized hydrazine, or a fluorinated quinone. An example of a commercially available material that can be used as an RSA material, such as Zonyl (registered trademark) 8857A, which is a fluorinated unsaturated ester monomer obtained from Du Pont, and available from Sigma__Aldrich

之例，可列舉如六 定於此等者。 (Sigma-Aldrich Co.)(密蘇里州聖路易（St. L〇uis，M〇)) 取得的丙烯酸 3, 3, 4, 4, 5, 5, 6, 6, 7, 7, 8, 8, 9, 9, 10, 1〇, 11， 11，12, 12, 12-二十一氟十二基（h2〇CHC〇2CH2CH2(CF2)9CF3)， 惟不限定於此等者。 RSA的1個實施形態係氟化大分子單體。此處之用語 「大分子單體」係意指存在於主鏈末端或侧鎖末端之具有 複數個反應性基的寡聚物材料。在某實施形態中，大分子 單體的分子量係超過1000，在某實施形態中係超過2000， 在某實施形態中係超過5000。在某實施形態中，大分子單 體的主鍵包含醚鏈段（ether segment)及全氟醚鏈段。在某 182 323323 201220574 只施彤ι巾’大分子單體的主鏈包含絲鏈段及全氣烧基 Π二！實施形態中’大分子單體的主鏈包含部分氟化 烷基^或部分氟化鱗鏈段。在某實施形態中，大分子單 體具a 1個或2個末端聚合性基或末端交聯性基。 RSA的1個實施形態係包含具有反應性基與第2種類 之官能基的材料。第2種類之官能基可為了變更RSA之物 理加工特性或光學物理性質而存在。變更加工特性之基的 φ例，吁列舉如環氧烷基（alkylene oxide group)等。變更 光學物理性質之基的例，可列舉如吁峻基、三芳基胺基、 或噚二唑基等。 在1個實施形態中，若經曝光，則RSA會與於下方的 區域進行反應。此反應之嚴密機制係依存於所使用之材 料。曝光後，藉由適合的顯影手段而去除未曝光區域的 RSA。在某實施形態中，僅去除未曝光區域的RSA。在某實 施形態中，RSA即便是在曝光區域亦被局部性去除，並且 #於該等區域内殘留較薄之層。在某實施形態中，在曝光區 域所殘留的RSA之厚度未達5〇A。在某實施形態中，在曝 光區域所殘留的RSA之厚度於實質上係單層。 (發光層） 如上所述，在積層前述電子注入層4之後，形成使用 上述RSA之撥液圖案5 ’利用該撥液圖案5，於各晝素（R 晝素31、G晝素32及B畫素33)所在位置之電子注入層4 上設置發光層（R發光層61、G發光層62及B發光層63)。 用以形成發光層所需之發光材料，係使用可發出螢光或燐 183 323323 201220574 光之公知的發光材料。圖示 情形，其發光波長帶域係分態係進行全彩顯示之 即，由發光波長帶域對應&amp;色η欲的一原色而I成丌 G ^ ^ R? λ ^ Λ 邑之只發光層61、對應綠色之 b發光層62、對應藍色之β發央 士 1去主灶L 九層63之三個發光層’而構 成1畫素，藉由使此等以預定％For example, it can be cited as such. (Sigma-Aldrich Co.) (St. L〇uis, M.) Acrylic 3, 3, 4, 4, 5, 5, 6, 6, 7, 7, 8, 8, 9, 9, 10, 1〇, 11, 11, 12, 12, 12-tetrafluorohexyl group (h2〇CHC〇2CH2CH2(CF2)9CF3), but is not limited thereto. One embodiment of RSA is a fluorinated macromonomer. The term "macromonomer" as used herein means an oligomer material having a plurality of reactive groups present at the end of the main chain or at the side of the side lock. In one embodiment, the molecular weight of the macromonomer exceeds 1,000, and in one embodiment, it exceeds 2,000, and in one embodiment, it exceeds 5,000. In one embodiment, the primary bond of the macromonomer comprises an ether segment and a perfluoroether segment. In a certain 182 323323 201220574 only the 彤ι towel 'the main chain of the macromonomer contains the silk segment and the full gas base Π two! In the embodiment, the main chain of the macromonomer comprises a partially fluorinated alkyl group or a partially fluorinated scale segment. In one embodiment, the macromonomer has one or two terminal polymerizable groups or terminal crosslinking groups. One embodiment of RSA comprises a material having a reactive group and a functional group of the second type. The functional group of the second type may exist in order to change the physical processing properties or optical physical properties of the RSA. Examples of φ which change the basis of processing characteristics include, for example, an alkylene oxide group. Examples of the basis for changing the optical physical properties include, for example, a sulfhydryl group, a triarylamine group, or an oxadiazolyl group. In one embodiment, if exposed, the RSA reacts with the lower region. The rigorous mechanism of this reaction depends on the materials used. After exposure, the RSA of the unexposed areas is removed by suitable development means. In one embodiment, only the RSA of the unexposed area is removed. In a certain embodiment, the RSA is locally removed even in the exposed area, and # is a thin layer remaining in the areas. In one embodiment, the thickness of the RSA remaining in the exposed area is less than 5 〇A. In one embodiment, the thickness of the RSA remaining in the exposed region is substantially a single layer. (Light-Emitting Layer) As described above, after the electron-injecting layer 4 is laminated, the liquid-repellent pattern 5' using the RSA is formed by using the liquid-repellent pattern 5 for each of the halogens (R 昼素 31, G 昼素 32 and B). A light-emitting layer (R light-emitting layer 61, G light-emitting layer 62, and B light-emitting layer 63) is provided on the electron injection layer 4 at the position of the pixel 33). The luminescent material required to form the luminescent layer is a known luminescent material that emits fluorescent light or illuminate 183 323 323 201220574. In the illustrated case, the illuminating wavelength band is a full color display, that is, the illuminating wavelength band corresponds to a primary color of the color η and I 丌 G ^ ^ R λ ^ Λ 邑 only illuminates The layer 61, the corresponding green b-emitting layer 62, the corresponding blue-colored β-way 1 to the main focus L, the nine layers 63 of the three light-emitting layers ' constitute a pixel, by making this a predetermined percentage

si - ^ ^ ,v ， 負义強度進行發光，而使有機EL 顯不裝置以全體進行全彩顯示。 (構成發光層之材料） 於本發明中，發光層較 ^ ^ 2iL . ^ , 為有機發光層’通常來說’ ^ ^光或磷光發光的有機物（低分子化合物及/ =七子化合物）、與辅助該有機物的摻雜劑所形成。本發 月中，可使用之形成發光層的材料，可舉例如以下者。 (色素系材料） 以色素系材料而言，可利斑/ · ° 了列舉例如：環喷達明 (cyclopendamine)衍生物、四芏茸 π ijt — 四本基丁二烯衍生物化合物、 三笨基胺衍生物、嘿二唾衍生物、吨唾並啥琳衍生物、二 _笨乙烯基苯衍生物、二苯乙稀基伸芳基衍生物、鱗衍生 物、唾吩環化合物、吼咬環化合物、紫環嗣（perin〇ne)衍 生物 '茈衍生物、寡聚噻吩衍生物、噚二唑二聚物、吡唑 啉二聚物等。 (金屬錯合物系材料） 以金屬錯合物系材料而言’可列舉例如：銥錯合物、 麵錯合物等具有源自三重激發態的發光之金屬錯合物；紹 喹啉酚錯合物、苯並喹啉酚鈹錯合物、苯並噚唑基鋅錯合 物、苯並噻唑鋅錯合物、偶氮曱基鋅錯合物、外琳 323323 184 201220574 .Be等或TV;物、鋪錯合物等於中心金屬具有^ 卩f二唾、嗟二唾Xy、Ir等稀土金屬，於配位體具有 的金屬錯合物等。本基Μ、苯基苯並料、料構造等 (高分子系材料） 烯基二=子:材料而言，可列舉例如:聚對伸苯基伸乙 &quot; 聚噻吩衍生物、聚對伸苯基衍生物、 衍生物、聚乙块衍生物 生物聚石夕燒 將上述色m &amp;生物1乙稀w衍生物、 者等。-《金屬錯合物系發光材料予以高分子化而成 如笨 材料中，發光為藍⑻色的材料可列舉例 如.一本乙烯基伸芳基衍生物，二唑 物、聚對伸苯基衍生物= 對伸苯基料物或料衍生料。 一生物、聚 =且，發光為綠⑹色之材料可列舉例如：啥 物、香·讀（eQumarin)衍生物、 之 /了 苯基伸乙婦基衍生物、聚第衍生物等2=2對伸 子材料之聚對伸笨基伸乙稀基衍生物、聚^魅^馬分 而且，發光為紅（R)色之材料可列舉例如：香豆素 物、嗟吩環化合物、及料之聚合物；料㈣基伸： 基衍生物、聚噻吩衍生物、聚第衍生物等。其中，， 高分子材料之聚對伸笨基伸乙婦基衍生物:、聚 物、聚薙衍生物等。 为何生 323323 185 201220574 (摻雜劑材料） 於發光層中，可因提升發光效率或使發光波長變化等 目的而添加摻雜劑。以如此之摻雜劑而言，可列舉例如： 茈竹生物、香豆素衍生物、紅螢稀（rubrene)衍生物、啥。丫 酮竹生物、方酸菁（squary 1 ium)衍生物、σ卜琳衍生物、苯 乙烯基系色素、稠四苯（tetracene)衍生物、吡唑。弄 (pyrazolone)衍生物、十環烯（decacyclene)、吩曙哄@同 (phen〇xaz〇ne)等。又，如此之發光層的厚度通常為約2〇 —至 20_。 (發光層之成膜方法） 包含有機物之發光層的成膜方法，可使用以溶液進行 成膜的塗佈法、真空蒸鍍法、轉印法等。本發明中，此等 中較佳為塗佈法。以溶液進行成膜時所用的溶媒之具體 例，η列舉如與後述之由溶液將電洞傳輸層製成膜時，溶 解電洞傳輸材料之溶媒相同的溶媒。 II 以塗佈法而言，可適宜使用旋轉塗佈法、浸塗法、喷 墨法、膠板印刷法、凹版印刷法、狹縫塗佈法等印刷法。 而且，在為昇華性之低分子化合物時，可使用真空蒸鍍法。 又，因為本實施形態中係形成3種類的發光層，故於上述 塗佈法中，適宜選擇可分開塗佈印墨的塗佈法。又且，亦 可使用藉由雷射進行轉印或熱轉印而僅於所期望之處形成 發光層的方法。 於上述R發光層61、G發光層62及Β發光層63之各 層上，依序積層電洞傳輸層7及電洞注入層8。 186 323323 201220574 (電洞傳輸層） 傳輸材料而言’例示為： ==其衍生物、於側鎖或主鏈具有芳香:胺之i d生琳衍生物、芳基胺衍生物、奶― 或宜衍生:本:一胺街生物、聚苯胺或其街生物、聚嘆吩 聚(對伸=1、/芳基胺或其衍生物、聚㈣或其衍生物、 伸乙坤基其衍生物、或是聚（2,5-㈣吩基 芳香族胺化合物基之聚二:生物： 吩基伸乙縣跑衍生物、或聚(2,5-伸嘆 聚乙㈣生物等高分子電洞傳輪材料；更佳為 鍵具有聚魏或其衍生物、於側鎖或主 料時，較佳聚發氧烧衍生物。為低分子電洞傳輸材 佳為刀散於高分子黏結劑而使用。 洞傳7之成膜方法雖無限制’但若為低分子電 成骐之方法:並黏結劑之混合溶液進行 以溶液進行成膜之方:焉電洞傳輸材料時則例示為 材料溶解者則:::膜時所用之溶媒，只要是使電洞傳輪 甲烷、-*、·、、、特殊限制。該溶媒係例示為：氯仿、二h :乙燒等1%溶媒；四氫咬喃等㈣溶媒；甲笨氣 323323 187 201220574 二曱苯等芳香族烴系溶. 乙酸乙酯、乙酸t 、’丙酮、曱基乙基酮等酮系溶媒； acetate)fs.^； cellosolve 佈法、⑨t仃之賴方法係可使用以溶液進行之旋轉塗 = '=:微!版塗佈法、凹版塗佈法、棒塗法、輥 板印刷1 *法、况塗法、賴塗佈法、網板印刷法、膠 ρ情德U套版印刷法、嘴墨印刷料塗佈法。又，在分 開塗佈本印墨時，係於卜 印墨的塗佈法。 '、佈法中適宜選擇可分開塗佈 =合之高分子黏結劑而言，較佳為不極度地阻礙電 二二士且ί合使用對於可見光之吸收不強者 。以該高 :=:Γ言’例示為：聚碳酸酿、聚丙稀酸醋、聚甲 聚石夕氧烧等。 ❿日^本乙烯、聚氣化乙稀、 .:電洞傳輸層7之臈厚而言，最適值係因所用之材料 而相異’只要使_電壓與發光效率成為適度值者即 可，惟至少^須為不產料孔的厚度，若過厚，則元件之 ，動Π⑽為不佳。從而’以該電洞傳輸層之膜厚而 δ ’係例如1 nm至1 a m，較伟^ 9 s 至·_ 如仏靖nm，更佳為5nm (電洞注入層） 電洞注入層8可設於陽極與電洞傳輸層之間，或是陽 極與發光層之間。在形成電洞注人層8之步驟中，係藉由 以溶液進行之賴而形成電洞注人層8。以溶液進行:成 323323 188 201220574 膜’可㈣例如藉由喷墨法等進行塗佈之方法。藉由塗佈 之方法’而將電洞注人層形成材料選擇性地塗佈於前 ;傳=7上。之後’進行乾燥處理及熱處理，形成電洞 注入層8。以電洞注入層8的形成材料而言，可使 述般使苯基㈣、星爆（starbum)型㈣、醜青素 (广thal〇cyanine)系、氧化釩、氧化鉬、氧化釕、氧化鋁Si - ^ ^ , v , the negative intensity is illuminated, and the organic EL display device is displayed in full color for the whole. (Material constituting the light-emitting layer) In the present invention, the light-emitting layer is more than ^^iL. ^ , which is an organic light-emitting layer 'generally' or a phosphorescent organic substance (low molecular compound and / = seven sub-compound), and A dopant that assists the organic species is formed. The material which forms the light-emitting layer which can be used in this month is mentioned, for example. (Pigment-based material) In the case of a pigment-based material, for example, cyclopendamine derivative, tetraterpene π ijt-tetra-butadiene derivative compound, and triphenyl group can be cited. Amine derivative, hydrazine di-salt derivative, ton salivaryline derivative, di-p-vinyl benzene derivative, diphenylethylene aryl derivative, squama derivative, succinyl ring compound, bite ring compound , perin〇ne derivative 'anthracene derivative, oligothiophene derivative, oxadiazole dimer, pyrazoline dimer, and the like. (Metal complex compound material) The metal complex compound material may, for example, be a metal complex having luminescence derived from a triplet excited state such as a ruthenium complex or a mask complex; Complex, benzoquinolinol quinone complex, benzoxazolyl zinc complex, benzothiazole zinc complex, azoindolyl zinc complex, foreign 323323 184 201220574 .Be or the like TV; the substance and the paving complex are equal to the central metal having a rare earth metal such as 卩f disa, bismuth Xy, Ir, a metal complex which the ligand has, and the like. The base group, the phenyl benzoate, the material structure, etc. (polymer material), the alkenyl group = the substituent: the material, for example, poly(p-phenylene) and polythiophene derivatives, polyparaphenylene The base derivative, the derivative, and the polyacetyl block derivative are biomass of the above-mentioned color m &amp; biological 1 ethylene w derivative, and the like. - "Metal complex-based luminescent materials are polymerized into a bulky material, and the material having a blue (8) color can be exemplified by a vinyl aryl derivative, a diazole compound, a poly-p-phenylene derivative. Material = phenylene or material derivative. Examples of the material of one organism, poly = and light-emitting green (6) color include, for example, an anthracene, an eQumarin derivative, a phenyl-ephthyl derivative, a poly-derivative, etc. 2=2 pairs The material of the extensor material is a styrene-based compound, and the luminescent material is a red (R) color, and examples thereof include a coumarin compound, a porphin ring compound, and a polymer of the material. (4) Base extension: a base derivative, a polythiophene derivative, a poly derivative, and the like. Among them, the polymer material is a pair of agglomerated base derivatives, a polymer, a polyfluorene derivative, and the like. Why 323323 185 201220574 (Dopant Material) In the light-emitting layer, a dopant can be added for the purpose of improving the light-emitting efficiency or changing the wavelength of the light-emitting. Examples of such a dopant include ruthenium, coumarin derivatives, rubrene derivatives, and hydrazine. Anthraquinones, squary 1 ium derivatives, sigrin derivatives, styrene-based pigments, tetracene derivatives, pyrazoles. Pyrazolone derivatives, decacyclene, phenotype (phen〇xaz〇ne), and the like. Further, the thickness of such a light-emitting layer is usually from about 2 Å to about 20 Å. (Method of Forming Light Emitting Layer) A film forming method including a light emitting layer of an organic material can be carried out by a coating method in which a film is formed by a solution, a vacuum deposition method, a transfer method, or the like. In the present invention, such a coating method is preferred. In the specific example of the solvent used for film formation in the solution, η is the same as the solvent for dissolving the hole transporting material when the hole transport layer is formed into a film from a solution to be described later. II In the coating method, a printing method such as a spin coating method, a dip coating method, an ink jet method, a blanket printing method, a gravure printing method, or a slit coating method can be suitably used. Further, in the case of a sublimable low molecular compound, a vacuum evaporation method can be used. Further, in the present embodiment, three types of light-emitting layers are formed. Therefore, in the above coating method, a coating method in which ink can be applied separately is suitably selected. Further, a method of forming a light-emitting layer only by a desired portion by transfer or thermal transfer by laser can also be used. The hole transport layer 7 and the hole injection layer 8 are sequentially laminated on each of the R light-emitting layer 61, the G light-emitting layer 62, and the x-ray light-emitting layer 63. 186 323323 201220574 (Cave transport layer) For the transport of materials 'exemplified as: == its derivatives, in the side lock or the main chain has an aromatic: amine id Shenglin derivatives, arylamine derivatives, milk - or Derivative: Ben: an amine street organism, polyaniline or its street organism, polystimulus (p-extension = 1, / arylamine or its derivatives, poly (tetra) or its derivatives, exoethyl derivatives, Or a poly(2,5-(tetra) phenanyl aromatic amine compound-based poly 2: biological: phenanthene-extension-running derivative, or poly (2,5-extension poly(4-) bio-polymer hole More preferably, the bond has a poly-Wei or a derivative thereof, and when it is a side lock or a main material, it is preferably a polyoxygenated derivative. The low molecular hole transport material is preferably used as a polymer binder. Although the film-forming method of the hole 7 is not limited, the method of forming a film by a solution of a low-molecular-weight electrode: a mixed solution of a binder is to form a film by a solution: when the material is transported by a hole, it is exemplified as a material dissolver. ::: The solvent used in the film is specifically limited as long as it is used to transport methane, -*, ·, , , and the hole in the hole. The solvent is exemplified as: chloroform, 2h: 1% solvent such as Ethylene; tetrahydrogenate; (4) solvent; A stupid 323323 187 201220574 Aromatic hydrocarbon such as diphenylbenzene. Ethyl acetate, acetic acid t, 'acetone, mercaptoethyl ketone, etc. Ketone solvent; acetate) fs.^; cellosolve method, 9t 仃 method can be used to rotate coating with solution = '=: micro! plate coating method, gravure coating method, bar coating method, roller plate Printing 1 * method, condition coating method, Lai coating method, screen printing method, glue yue U plate printing method, nozzle ink printing material coating method. Also, when separately applying the ink, it is The coating method of Bu-Ink. 'In the cloth method, it is suitable to select the separately coatable = the polymer binder. It is better not to obstruct the electric two-twos and the absorption of visible light is not strong. The high:=: rumor' is exemplified as: polycarbonate, polyacrylic acid vinegar, polymethacrylate, etc. ❿日^本乙,聚气化乙, .: hole transport layer 7 In terms of thickness, the optimum value is different depending on the materials used. 'As long as the voltage and luminous efficiency are moderate, only at least ^ must be produced. If the thickness is too thick, the component (10) is not good. Thus, the film thickness of the hole transport layer is δ', for example, 1 nm to 1 am, which is more than ^ 9 s to · _ More preferably 5 nm (hole injection layer) The hole injection layer 8 may be provided between the anode and the hole transport layer, or between the anode and the light-emitting layer. In the step of forming the hole injection layer 8, The hole injection layer 8 is formed by the solution. The solution is carried out as a solution: 323323 188 201220574 The film can be coated, for example, by an inkjet method or the like. The hole injection layer forming material is selectively applied to the front; pass = 7 on. Thereafter, drying treatment and heat treatment are performed to form a hole injection layer 8. With regard to the material for forming the hole injection layer 8, it is possible to make phenyl (tetra), starbum type (four), ugly-flavor (thal), vanadium oxide, molybdenum oxide, cerium oxide, oxidation. aluminum

等氧化物’非晶石反、聚苯胺、聚嚷吩衍生物等溶解於水戋 異丙基醇等極性溶媒者。 又’上述之構成中，在形成電子注入層後，依序形成 發光層、電洞傳輸層、電洞注人層等有機層時，尤豆是藉 由塗佈法軸鄰狀兩方的料，若先塗狀層會溶解^ 後來塗佈之㈣溶液所包含的溶媒中，齡變得盖法 料構造。此時，可使用使下層不溶化於溶媒的方法。以 不溶化於溶媒的方法而言，可列舉例如：使高分子化合物 具有交聯基，使其交聯而進行不溶化的方法；使且備芳香 族雙疊氮基（bisazid。）所絲的具有料環之交聯基之低 分子化合㈣為交咖㈣行混合，使其交聯而進行不溶 化的方法；將具備丙烯動旨基所代表的不具㈣香環之交 聯基的低分子化合物作為交聯劑而進行混合，使其交聯而 進行不溶化的方法；使下層進行紫外線感光較聯而對 於上層之製造所狀有機溶媒為不溶化的方法；加执下層 並進行交聯，使對於上層之製造_之有機;容媒為不溶;匕 的方法等。加熱下層時的加熱溫度通常為⑽U3〇(rc， 時間通常為1分鐘至1小時。 323323 189 201220574 而且，交聯以外之使下層不溶解而進行積層之其 法，係有使用不同極性之溶液製造相鄰之層的方法，、方 有：於下層使用水溶性之高分子化合物，於 =如 :高分子化合物，即使進行塗佈，下層亦不4 = (陽極）Oxide, such as an amorphous phase, a polyaniline or a polyphenanthene derivative, are dissolved in a polar solvent such as hydrazine isopropyl alcohol. Further, in the above configuration, when an electron injecting layer is formed, and an organic layer such as a light-emitting layer, a hole transport layer, or a hole injection layer is sequentially formed, the beans are coated by the coating method. If the first coating layer dissolves the solvent contained in the (4) solution which is coated later, the age becomes the structure of the coating material. At this time, a method of insolubilizing the lower layer to a solvent can be used. In the method of insolubilizing the solvent, for example, a method in which a polymer compound has a crosslinking group and is crosslinked to insolubilize is used, and a material having an aromatic diazide group (bisazid) is prepared. The low molecular compound of the cross-linking group of the ring (4) is a method in which the cross-linking of the cross-linking (four) line is carried out to make the insolubilization; and the low-molecular compound having the cross-linking group of the (four) scented ring represented by the acryl-acting group is used as the cross-linking compound. a method in which a mixture is mixed and crosslinked to insolubilize; a method in which the lower layer is subjected to ultraviolet light sensitization and the organic solvent in the upper layer is insolubilized; and the lower layer is added and crosslinked to manufacture the upper layer. _ organic; the medium is insoluble; the method of sputum. The heating temperature at the time of heating the lower layer is usually (10) U3 〇 (rc, the time is usually from 1 minute to 1 hour. 323323 189 201220574 Moreover, the method of laminating the lower layer in addition to crosslinking is carried out by using solutions of different polarities. The method of the adjacent layer is as follows: a water-soluble polymer compound is used in the lower layer, for example, a polymer compound, even if it is coated, the lower layer is not 4 = (anode)

如上所述，於各晝素形成電洞注入層8之 形態中’係全晝素共通，在電難人層8上將 知 由真空蒸鍍法等進行成膜，形成陽極9。 °材枓藉 (陽極材料） 當陽極9係由透明電極或是半透明電極所 使用導電度高的金屬氧化物、金屬硫化物或金屬n 而可適合利用穿透率高者，係依據使用之有機層而適 擇使用。具體而言’係使用由氧化銦、氧化鋅、氧化錫、 及屬於該等之複合體的銦錫氧化物⑽）、鋼辞氧化物等所 構成之導電性玻璃所作成的膜（NESA等），或金、鉑、銀、 銅等’ k佳為ΙΊΌ、銦鋅氧化物、氧化錫。製作方法可列 舉如.真空蒸鍍法、錢鍍法、離子鑛（i〇nplati叩）法、鑛 覆法等。而且，該陽極亦可使用聚苯胺或其衍生物、聚^ 吩或其衍生物等有機的透明導電膜。 陽極的膜厚係可考慮光的穿透性與導電度而進行適宜 選擇，例如lOrnn至1〇_，較佳為2〇咖至，更佳為 50nm 至 500nm。 [有機EL顯示裝置的製造方法（第i實施形態）] 323323 190 201220574 接下來，參照第2圖A至第2圖Η，對本發明之有機 EL顯示裝置的製造方法之第1實施形態進行說明。 (準備基板） 如第2圖Α所示，準備表面形成有未圖示之驅動電路 部與陰極（晝素電極）2之基板1。 複數個陰極（晝素電極）2係對應於構成R晝素31、G 晝素32、B晝素33的圖案，藉由將選擇自先前列舉之陰極 材料的一種材料進行蒸鍍等，堆積於基板1上而形成。又， ® 亦有將陰極2製成2層以上之積層構造之情形。 (電子注入層之形成） 接下來，如第2圖B所示，在以圖案方式形成有前述 陰極2之基板1上，全畫素共通而形成電子注入層4。本 發明中，電子注入層係使用上述離子性聚合物並以溶液進 行成膜。 以形成電子注入層4的方法而言，可使用例如使用含 φ 有前述離子性聚合物的溶液進行成膜的前述方法。 以電子注入層4的膜厚而言，如先前所述，較佳係調 整為lnm至1 # m。 (撥液圖案之形成） 接下來，如第2圖C所示，使用選自先前所述之反應 性界面活性組成物（RSA)中的一種，例如Du Pont公司製之 屬於氟化不飽和酯單體的Zonyl(註冊商標）8857A，於前述 電子注入層4之全面形成底漆層53。 接下來，如第2圖D所示，使用遮罩而將前述底漆層 191 323323 201220574 53曝光。其中，前述遮罩係成形為光會照射到對應下層之 陰極2之部分的圖案。 將曝光後成為可溶於液體媒質之部位，以液體媒質進 行去除（顯影處理）。 藉由上述顯影處理，如第2圖E所示，於電子注入層 4上形成撥液圖案5。撥液圖案5的開口内部52係對應各 畫素區域，下層之電子注入層4為露出的部分。因撥液圖 案5係較電子注入層4更表現出撥液性，故開口内部52對 於撥液圖案5係具有親液性（以下，亦有將開口内部52記 為親液_部5 2之情形）。 (發光層之形成） 接下來，如第2圖F所示，利用上述撥液圖案5，於 各晝素（R晝素3卜G晝素32及B晝素33)所在位置之電子 注入層4上形成發光層（R發光層61、G發光層62及B發 光層63)。 用以形成發光層的發光材料，如先前所述，係使用可 發出螢光或燐光之公知的發光材料。所使用之發光材料係 適宜選擇自先前所述之發光材料。發光層係藉由上述方法 所形成。又，在藉由塗佈法形成時，供給至親液部52之印 墨雖廣為浸潤於親液部52 t，惟會於誠圖案5處被撥 開，故僅於親液部52上形成發光層。 (電洞傳輸層及電洞注入層之形成） 接下來，如第2圖G所示，於上述R發光層61、G發 光層6.2及B發光層63的各層上，依此順序積層電洞傳輸 323323 192 201220574 層7及電洞注入層8。 (電洞傳輸層之形成） 當選擇自先前所述之電洞傳輸材料的一種材料為低分 子電洞傳輸材料時，係使用以與高分子黏結劑之混合溶液 進行成膜的方法；當為高分子電洞傳輸材料時，係使用以 溶液進行成膜之方法。電洞傳輸層係藉由上述方法所形 成。又，在藉由塗佈法形成時，供給至發光層上之印墨雖 廣為浸潤於發光層上，惟會於撥液圖案5處被撥開，故僅 φ 於發光層上形成電洞傳輸層。 (電洞注入層之形成） 於前述電洞傳輸層7上形成電洞注入層8。電洞注入 層係藉由上述方法所形成。又，在藉由塗佈法形成時，供 給至t洞傳輸層上之印墨雖廣為浸潤於電洞傳輸層上，惟 會於撥液圖案5處被撥開，故僅於電洞傳輸層上形成電洞 注入層。 φ (陽極之作成） 接下來，如第2圖Η所示，於前述電洞注入層8上， 全晝素共通地，將選擇自先前所述之陽極材料中的一種材 料以選擇自真空蒸鍍法、濺鍍法、離子鍍法、鍍覆法等中 的一種方法進行成膜，形成陽極9。以陽極9的膜厚而言， 如先前所述調整為10nm至10 # in，較佳為20nm至1 μ m， 更佳係調整為50nm至500nm。 藉由以上所述，形成第1圖所示之一實施形態的有機 EL顯示裝置。 193 323323 ，《:«ί 201220574 j以上所詳述’有機EL顯示裝置的製造方法 綠开）鴻的特徵為.以且古 φ ^ ^ ，'、 /、有電子注入性，且於常壓程度之環 二’且可以藉由溶媒製成溶液之離子性聚合物而 二&quot;注入層；與使用撥液圖案而選擇性地積層各色發 光層°藉由如此之特徵之構成，即可使構成有機EL顯示裝 置的泰機EL元件之有機層在完全f壓程度的環境中藉由 溶液而進行成膜，因此，可將製造㈣簡略化，而可減低 製造成本。*且，由於基板尺寸*受限制，故可製造大營 幕顯示器。 [有機EL顯示裴置的製造方法（第2實施形態）] 接下來，分別參照第3圖A至第3圖K，對本發明之 有機EL顯示裝置的製造方法的第2實施形態進行說明。 從準備基板（第3圖A)至電子注入層之形成（第3圖B) 為止的步驟’係與前述之實施形態相同，故省略說明。 (撥液圖案之形成） • 接下來，如第3圖C所示，準備與前述基板1不同之 另一個板狀支承構件（s叩porting member)10。於所準備的 支承構件10的表面積層樹脂層11。該樹脂層11係例如藉 由將以聚醯亞胺系樹脂作為主成分之光阻劑材料的塗膜進 行曝光後並硬化而形成。 接下來，如第3圖D所示，於前述樹脂層11上設置具 有預定圖案的開口部之遮罩12。該遮罩12的複數個開D 部係形成為大致與前述基板1上所形成之陰極（畫素電極） 2為一致的大小及圖案。接下來，經由遮罩12而照射含氣 323323 194 201220574 之氣體電漿13。前述含氟之氣體係例如使用CF4。 照射前述含氟之氣體電漿13後，去除遮罩12。其結 果係如第3圖E所示，於前述樹脂層11上形成撥液性的圖 案5a 〇 接下來，如第3圖F所示，相對於基板1上之電子注 入層4，使支承構件10上之圖案5a成為相對向，然後以 使圖索10之開口部會位於基板1上之各陰極2上的方式決 • 定位置，將基板1與支承構件10相抵接。 將基板1與支承構件10相抵接後，如第3圖G所示， 加熱相接面，使支承構件10的樹脂層11上之撥液性圖案 5a轉印至基板1之電子注入層4上。 將撥液性圖案5a轉印至基板1的電子注入層4上之 後，將支承構件10分離時，如第3圖Η所示，於基板1的 電子注入層4上形成撥液圖案5。 發光層之形成（第3圖I)、電洞傳輸層及電洞注入層 φ 之形成（第3圖J)以及陽極之作成（第3圖Κ)係與前述之實 施形態相同，故省略說明。 藉由以上所述，形成第1圖所示之一實施形態的有機 EL顯示裝置。 [有機F丄顯示裝置之構成（另一實施形態）] 接下來，參照第4圖，對本發明之有機EL顯示裝置的 另一實施形態之概略構成進行說明。本形態中，係形成堤 防（bank)以取代前述實施形態之撥液圖案5。又，構成各 構件的材料及各構件的製法係與前述之實施形態相同，故 195 323323 201220574 有省略說明之情形。 於形成有畫素電極2之基板1的表面，以覆蓋各畫素 電極2之方式形成第1堤防層501，同時形成連接複數個 畫素電極2之鄰接間的複數個第2堤防層502。前述複數 個第2堤防層502係於與第4圖之平面垂直之方向上互相 幾乎為平行地配置。 前述第1堤防層501係由有機物或無機物所構成。有 機物係使用丙烯酸系樹脂、酚樹脂、及聚醢亞胺樹脂等。 而且’無機物係使用SiOx或SiNx等。 前述第2堤防層502係由有機物或無機物所構成。有 機物係使用丙烯酸系樹脂、酚樹脂、及聚醯亞胺樹脂等。 而且’無機物係使用SiOx或SiNx等。 由有機物所構成的堤防，係較一般由無機物所構成之 堤防更表現撥液性。為了保持供給至由堤防層502所圍起 之區域的印墨並防止溢出到外面，第2堤防層502係以表 現撥液性者為較佳。另一者之第1堤防層501，因較佳為 使供給的印墨廣為浸潤於該堤防層 501上’故以表現親液 性者為較佳。因此’本形態中，第1堤防層501係由無機 物所構成’第2堤防層502係由有機物所構成。 &amp;述第1堤防層501的開口内部係構成晝素區域。相 對於第1堤防層501，第2堤防層502係高度尺寸較大， 複數個形成之第2堤防層502係配置為幾乎互相並行，相 鄰之間’則配置有一列由第1堤防層501所劃分的複數個 晝素區域。在該一列配置之複數個晝素區域中，係一併塗 196 323323 201220574 佈RbB中之任一發光材料。該一併塗佈係因第2堤防層502 而可能達成。 於由前述第1堤防層501所圍住之各晝素電極2的露 出表面（晝素區域）上’通常形成有電子注入層4。亦有在 電子注入層4上設置電子傳輸層之情形。 電子注入層4、發光層61、發光層62、發光層63分 別形成於前述第1堤防層501的開口内部上。此等係藉由 前述方法而形成。 電洞傳輸層、電洞注入層8在第4圖所示之實施形態 中’係檢跨複數個畫素而形成於全面。又，電洞傳輸層及 電洞注入層8亦可選擇性地僅形成於前述第1堤防層5〇1 之開口内部上。 开夕成電洞注入層8後，全畫素共通地，將陽極材料藉 由真空蒸鍍法等在電洞注入層8上進行成膜，形成陽極9。 [有機EL顯示裝置的製造方法（第3實施形態）] 接下來，參照第4圖，對第4圖所示之構成的有機el 顯示裝置之製造方法的一實施形態（第3實施形態）進行說 明。 耆先準備基板1 ’該基板表面上形成有複數個畫素電 極2。 接下來，在形成有晝素電極2的基板1的表面，以圍 住各晝素電極2的方式形成第1堤防層501，然後，形成 連接複數個晝素電極2之相鄰間的複數個第2堤防層502。 前述複數個第2堤防層502係於與第4圖之平面垂直的方 197 323323 201220574 向上互相幾乎為平行地配置。 前述第1堤防層501係相對於各晝素電極2而有一 A 分為開口 ’以露出各晝素電極2的表面之方式而形成。° 下來’形成連接被第1堤防層501圍住之複數個蚩去 I I電極 2之相鄰間的複數個第2堤防層502。前述複數個第2提防 層502的配置圖案係於與第4圖之平面垂直的方向上 幾乎為平行。 關於第1堤防層501、第2有機堤防層502的形成方 法，當使用無機材料時，係藉由蒸鑛法形成；當使用有 材料時，係藉由例如將丙稀酸系樹脂或聚醯亞胺樹脂等 劑（resist)溶解於溶媒後，以旋轉塗佈法、浸塗法等各種 塗佈法進行塗佈而形成有機質層。本發明中，較佳為使 有機材料進行塗佈的方法。又，該有機質層的構成材料不 溶解於後述印墨的溶媒，並且只要是易於藉由蝕刻等進行 圖案化者，即可為任意者。 丁 第1堤防層501係藉由例如將無機材料於全面進行成 膜後，將其使用光I虫刻技術（photolithography)進行圖案 化而形成。 形成第2堤防層502的有機質層係藉由喷墨法而連續 在複數個晝素電極2之相鄰間進行塗佈，或者是塗佈於一 面後使用光蝕刻技術、蝕刻技術而進行圖案化。 接下來，於堤防層的表面形成表現親液性的區域與表 現撥液性的區域。對於本實施㈣巾，#由㈣處理形成 各區域之情形進行說明。該處理係包括下述步驟：預 323323 198 201220574 備加熱步驟、分別使第2堤防層502上面及開口部的壁面 以及晝素電極2的露出面及第1堤防層501的上面成為親 液性之親印墨化步驟、使第2堤防層502的上面及開口部 的壁面成為撥液性之撥印墨化步驟、與冷卻步驟。 具體而言，係使基材（包含堤防層等之基板1)成為預 定溫度，例如加熱到70至80°C左右，接著於大氣壓下進 行以氧作為反應氣體之電漿處理（〇2電漿處理），而作為親 印墨化步驟。接下來，於大氣壓下進行以四氟化曱烷作為 反應氣體之電漿處理（CF4電漿處理），而作為撥印墨化步 驟，之後，將為了進行電漿處理而經加熱的基材冷卻至室 溫為止。又，在以四氟化甲烷作為反應氣體之電漿處理中， 由有機物所構成之第2堤防層502係選擇性地被撥液化。 藉此，將親液性及撥液性賦予至上述所期望的部位。 接下來，將包含成為電子注入層、發光層的材料之印 墨依序供給至第2堤防層502所圍住之區域，藉由將其固 鲁 化而依序形成電子注入層、發光層。 接著，將包含成為電洞傳輸層、電洞注入層的材料之 印墨依序供給至全面，藉由將其固化而依序形成電洞傳輸 層、電洞注入層。 接下來，於前述電洞注入層8上，對全晝素共通地， 將選擇自先前所述之陽極材料中的一種材料使用選擇自真 空蒸鍍法、濺鍍法、離子鍍法、鍍覆法等中的一種方法進 行成臈，而形成陽極9。以陽極9的膜厚而言，如先前所 述而調整為1 Onm至10 // m，較佳為20nm至1 // m，更佳係 199 323323 201220574 調整為50nm至50〇nm。 藉由以上所述，形成第4圖所示構造的有機el顯示裝 置。 ‘义 又’雖然本實施形態係於形成電子注入層之步驟前， 在晝素以外之區域形成堤防，惟在其他實施形態中亦可 於形成電子注入層後，在該電子注入層上於晝素以外之區 域形成堤防。此時，為了防止在形成堤防時電子注入層溶 φ 解於顯影液等，較佳為預先使電子注入層成為不溶化於顯 影液等。電子注入層之不溶化係可藉由例如將聚合性化合 物聚合而進行。 如以上所詳述，有機EL顯示裝置的製造方法之第3實 施形態的特徵為：由具有電子注入性，且於空氣中為安定， 且可以藉由極性溶媒製成溶液的離子性聚合物而形成電子 注入層；與使用堤防而選擇地性積層各色之發光層。藉由 如此之特徵之構成，可在空氣中藉由溶液成膜而形成^有 Φ 構成有機el顯示裝置的有機EL元件之有機層，因此，可 將製造程序簡略化’而可減低製造成本。而且，由於美板 尺寸不受限制，故可製造大螢幕之顯示器。 土 【圖式簡單說明】 第1圖係表示本發明的有機EL顯示裝置之—實施形，熊 的概略剖面構成圖。 A&quot;·' 第2A圖係本發明的有機EL顯示裝置的製造方法之第 1實施形態的步驟說明圓。 第2B圖係本發明的有機el顯示裝置的製造方法之第 323323 200 201220574 1實施形態的步驟說明圖。 第2C圖係本發明的有機el顯示裝置的製造方法之第 1實施形態的步驟說明圖。 第2D圖係本發明的有機el顯示裝置的製造方法之第 1實施形態的步驟說明圖。 第2E圖係本發明的有機EL顯示裝置的製造方法之第 1實施形態的步驟說明圖。 第2F圖係本發明的有機el顯示裝置的製造方法之第 1實施形態的步驟說明圖。 第2G圖係本發明的有機EL顯示裝置的製造方法之第 1實施形態的步驟說明圖。 第2H圖係本發明的有機el顯示裝置的製造方法之第 1實施形態的步驟說明圖。 第3A圖係本發明的有機el顯示裝置的製造方法之第 2實施形態的步驟說明圖。 第3B圖係本發明的有機el顯示裝置的製造方法之第 2實施形態的步驟說明圖。 第3C圖係本發明的有機el顯示裝置的製造方法之第 2實施形態的步驟說明圖。 第3D圖係本發明的有機el顯示裝置的製造方法之第 2實施形態的步驟說明圖。 第3E圖係本發明的有機el顯示裝置的製造方法之第 2實施形態的步驟說明圖。 第3F圖係本發明的有機EL顯示裝置的製造方法之第 201 323323 201220574As described above, in the form in which the respective holes are formed into the hole injection layer 8, the entire element is shared, and the electrode 9 is formed on the electrodeurized layer 8 by vacuum deposition or the like to form the anode 9. ° anode material (anode material) When the anode 9 is made of a transparent electrode or a semi-transparent electrode using a highly conductive metal oxide, metal sulfide or metal n, it is suitable to use the high transmittance, according to the use Organic layer and suitable for use. Specifically, it is a film made of a conductive glass made of indium oxide, zinc oxide, tin oxide, and an indium tin oxide (10) which is a composite of these, or a steel oxide (NESA, etc.). , or gold, platinum, silver, copper, etc. 'k is yttrium, indium zinc oxide, tin oxide. The production method may be, for example, a vacuum evaporation method, a money plating method, an ion ore method, a mineral coating method, or the like. Further, as the anode, an organic transparent conductive film such as polyaniline or a derivative thereof, a polyphenylene or a derivative thereof can also be used. The film thickness of the anode can be appropriately selected in consideration of light transmittance and conductivity, for example, lOrnn to 1 Å, preferably 2 Å to 50 Å, more preferably 50 nm to 500 nm. [Manufacturing Method of Organic EL Display Device (Embodiment)] 323323 190 201220574 Next, a first embodiment of a method of manufacturing an organic EL display device of the present invention will be described with reference to FIGS. 2A to 2D. (Preparation of the substrate) As shown in Fig. 2, a substrate 1 having a drive circuit portion (not shown) and a cathode (alkali electrode) 2 is formed on the surface. A plurality of cathodes (halogen electrodes) 2 correspond to a pattern constituting R halogen 31, G gas 32, and B gas, and are deposited by vapor deposition of a material selected from the cathode materials listed above. Formed on the substrate 1. Further, ® also has a case where the cathode 2 is formed into a laminated structure of two or more layers. (Formation of Electron Injection Layer) Next, as shown in Fig. 2B, on the substrate 1 on which the cathode 2 is formed in a pattern, the entire pixel is formed in common to form the electron injection layer 4. In the present invention, the electron injecting layer is formed by using the above ionic polymer and forming a solution. In the method of forming the electron injecting layer 4, for example, the above method of forming a film using a solution containing φ having the aforementioned ionic polymer can be used. In terms of the film thickness of the electron injecting layer 4, as described earlier, it is preferably adjusted to be 1 nm to 1 #m. (Formation of a liquid-repellent pattern) Next, as shown in FIG. 2C, one selected from the reactive surfactant composition (RSA) described previously, for example, a fluorinated unsaturated ester manufactured by Du Pont Co., Ltd. is used. A monomeric Zonyl (registered trademark) 8857A is formed on the entire electron injecting layer 4 to form a primer layer 53. Next, as shown in Fig. 2D, the aforementioned primer layer 191 323323 201220574 53 is exposed using a mask. Here, the mask is formed into a pattern in which light is irradiated onto a portion corresponding to the cathode 2 of the lower layer. After exposure, it becomes a site soluble in the liquid medium, and is removed by a liquid medium (development treatment). By the above development processing, as shown in Fig. 2E, the liquid-repellent pattern 5 is formed on the electron injection layer 4. The open interior 52 of the liquid-repellent pattern 5 corresponds to each pixel region, and the lower electron-injecting layer 4 is an exposed portion. Since the liquid-repellent pattern 5 exhibits liquid repellency more than the electron-injecting layer 4, the opening 52 has lyophilic properties with respect to the liquid-repellent pattern 5 (hereinafter, the inside of the opening 52 is also referred to as the lyophilic portion 5). situation). (Formation of Light-Emitting Layer) Next, as shown in FIG. 2F, an electron injecting layer at a position of each of the halogens (R昼3, G, and B) is used by the above-described liquid-repellent pattern 5. A light-emitting layer (R light-emitting layer 61, G light-emitting layer 62, and B light-emitting layer 63) is formed on 4. As the luminescent material for forming the luminescent layer, as previously described, a known luminescent material which emits fluorescence or luminescence is used. The luminescent material used is suitably selected from the luminescent materials previously described. The light-emitting layer is formed by the above method. Further, when formed by the coating method, the ink supplied to the lyophilic portion 52 is widely immersed in the lyophilic portion 52t, but is removed at the original pattern 5, so that it is formed only on the lyophilic portion 52. Light-emitting layer. (Formation of Hole Transport Layer and Hole Injection Layer) Next, as shown in FIG. 2G, holes are laminated in the respective layers of the R light-emitting layer 61, the G light-emitting layer 6.2, and the B light-emitting layer 63 in this order. Transmission 323323 192 201220574 layer 7 and hole injection layer 8. (Formation of hole transport layer) When a material selected from the hole transport material described above is a low molecular hole transport material, a method of forming a film with a mixed solution of a polymer binder is used; In the case of a polymer hole transporting material, a method of forming a film by a solution is used. The hole transport layer is formed by the above method. Further, when formed by the coating method, the ink supplied onto the light-emitting layer is widely wetted on the light-emitting layer, but is removed at the liquid-repellent pattern 5, so that only φ is formed on the light-emitting layer. Transport layer. (Formation of Hole Injection Layer) A hole injection layer 8 is formed on the above-described hole transport layer 7. The hole injection layer is formed by the above method. Moreover, when formed by the coating method, the ink supplied to the t-hole transport layer is widely immersed in the hole transport layer, but is removed at the liquid-repellent pattern 5, so that it is only transmitted in the hole. A hole injection layer is formed on the layer. φ (made of the anode) Next, as shown in FIG. 2, on the above-mentioned hole injection layer 8, a material selected from the anode material previously described is selected from the vacuum. One of the plating method, the sputtering method, the ion plating method, the plating method, and the like is formed to form an anode 9. In terms of the film thickness of the anode 9, it is adjusted to 10 nm to 10 # in., preferably 20 nm to 1 μm, and more preferably 50 nm to 500 nm as previously described. As described above, the organic EL display device of one embodiment shown in Fig. 1 is formed. 193 323323, ":«ί 201220574 j detailed above 'the manufacturing method of organic EL display device green" is characterized by the ancient φ ^ ^ , ', /, with electron injectability, and at atmospheric pressure Ring 2' can be made by using a solvent to form a solution of an ionic polymer and a second injection layer; and by selectively using a liquid-repellent pattern to laminate layers of light-emitting layers, by using such a feature, The organic layer of the EL element of the Thai EL device of the organic EL display device is formed into a film by a solution in a completely f-pressed environment, so that the manufacturing (4) can be simplified and the manufacturing cost can be reduced. * Also, since the substrate size* is limited, a large-screen display can be manufactured. [Manufacturing Method of Organic EL Display Device (Second Embodiment)] Next, a second embodiment of the method of manufacturing the organic EL display device of the present invention will be described with reference to Figs. 3A to 3K. The steps from the preparation of the substrate (Fig. 3A) to the formation of the electron injecting layer (Fig. 3B) are the same as those of the above-described embodiment, and thus the description thereof is omitted. (Formation of the liquid-repellent pattern) Next, as shown in Fig. 3C, another plate-shaped support member 10 different from the above-described substrate 1 is prepared. The resin layer 11 is formed on the surface area of the support member 10 prepared. The resin layer 11 is formed, for example, by exposing and curing a coating film of a photoresist material containing a polyimine-based resin as a main component. Next, as shown in Fig. 3D, a mask 12 having an opening of a predetermined pattern is provided on the resin layer 11. The plurality of open D portions of the mask 12 are formed to have a size and a pattern substantially coincident with the cathode (pixel electrode) 2 formed on the substrate 1. Next, the gas plasma 13 containing gas 323323 194 201220574 is irradiated through the mask 12. The fluorine-containing gas system is, for example, CF4. After the fluorine-containing gas plasma 13 is irradiated, the mask 12 is removed. As a result, as shown in FIG. 3E, a liquid-repellent pattern 5a is formed on the resin layer 11, and then, as shown in FIG. 3F, the supporting member is made with respect to the electron injecting layer 4 on the substrate 1. The pattern 5a on the 10 is opposed to each other, and then the substrate 1 and the support member 10 are brought into contact with each other so that the opening of the figure 10 is positioned on each of the cathodes 2 on the substrate 1. After the substrate 1 and the supporting member 10 are brought into contact with each other, as shown in FIG. 3G, the contact faces are heated, and the liquid-repellent pattern 5a on the resin layer 11 of the supporting member 10 is transferred onto the electron injecting layer 4 of the substrate 1. . After the liquid-repellent pattern 5a is transferred onto the electron-injecting layer 4 of the substrate 1, when the supporting member 10 is separated, as shown in Fig. 3, the liquid-repellent pattern 5 is formed on the electron-injecting layer 4 of the substrate 1. The formation of the light-emitting layer (Fig. 3), the formation of the hole transport layer and the hole injection layer φ (Fig. 3), and the creation of the anode (Fig. 3) are the same as those of the above-described embodiment, and thus the description thereof is omitted. . As described above, the organic EL display device of one embodiment shown in Fig. 1 is formed. [Configuration of Organic F丄 Display Device (Another Embodiment)] Next, a schematic configuration of another embodiment of the organic EL display device of the present invention will be described with reference to Fig. 4 . In the present embodiment, a bank is formed instead of the liquid-repellent pattern 5 of the above embodiment. Further, the materials constituting the respective members and the manufacturing method of each member are the same as those of the above-described embodiment, and therefore, the description of 195 323323 201220574 will be omitted. On the surface of the substrate 1 on which the pixel electrode 2 is formed, the first bank layer 501 is formed so as to cover the respective pixel electrodes 2, and a plurality of second bank layers 502 which connect adjacent portions of the plurality of pixel electrodes 2 are formed. The plurality of second bank layers 502 are arranged substantially parallel to each other in a direction perpendicular to the plane of Fig. 4. The first bank layer 501 is made of an organic substance or an inorganic substance. An acrylic resin, a phenol resin, a polyimine resin, or the like is used as the organic material. Further, 'inorganic materials are SiOx or SiNx. The second bank layer 502 is made of an organic substance or an inorganic substance. An acrylic resin, a phenol resin, a polyimine resin, or the like is used as the organic material. Further, 'inorganic materials are SiOx or SiNx. The dike composed of organic matter exhibits liquid repellency more than the dike generally composed of inorganic substances. In order to maintain the ink supplied to the area surrounded by the embankment layer 502 and prevent spillage to the outside, the second embankment layer 502 is preferably a liquid-repellent layer. The other first embankment layer 501 is preferably such that the supplied ink is widely wetted on the embankment layer 501. Therefore, it is preferable to exhibit lyophilicity. Therefore, in the present embodiment, the first bank layer 501 is made of an inorganic material. The second bank layer 502 is made of an organic material. &amp; The inside of the opening of the first embankment layer 501 is a halogen region. The second embankment layer 502 has a large height dimension with respect to the first embankment layer 501, and the plurality of formed second embankment layers 502 are arranged to be almost parallel to each other, and a column is disposed adjacent to each other by a first embankment layer 501. A plurality of divided pixel regions. In the plurality of halogen regions arranged in the column, any one of 196 323323 201220574 cloth RbB is coated. This collective coating is possible due to the second embankment layer 502. The electron injection layer 4 is usually formed on the exposed surface (the halogen region) of each of the halogen electrodes 2 surrounded by the first bank layer 501. There is also a case where an electron transport layer is provided on the electron injection layer 4. The electron injection layer 4, the light-emitting layer 61, the light-emitting layer 62, and the light-emitting layer 63 are formed on the inside of the opening of the first bank layer 501, respectively. These are formed by the aforementioned methods. In the embodiment shown in Fig. 4, the hole transport layer and the hole injection layer 8 are formed in a comprehensive manner across a plurality of pixels. Further, the hole transport layer and the hole injection layer 8 may be selectively formed only on the inside of the opening of the first bank layer 5〇1. After the etched into the hole injection layer 8, the anode material is formed on the hole injection layer 8 by vacuum deposition or the like to form the anode 9 in common. [Manufacturing Method of Organic EL Display Device (Third Embodiment)] Next, an embodiment (third embodiment) of the method of manufacturing the organic EL display device having the configuration shown in Fig. 4 will be described with reference to Fig. 4 . Description. The substrate 1 is prepared first. A plurality of pixel electrodes 2 are formed on the surface of the substrate. Next, on the surface of the substrate 1 on which the halogen electrode 2 is formed, the first bank layer 501 is formed to surround the respective halogen electrodes 2, and then a plurality of adjacent spaces connecting the plurality of halogen electrodes 2 are formed. The second embankment layer 502. The plurality of second embankment layers 502 are arranged substantially parallel to each other in a direction perpendicular to the plane of Fig. 4, 197 323323 201220574. The first bank layer 501 is formed so that an A is divided into openings 'with respect to each of the halogen electrodes 2 to expose the surface of each of the halogen electrodes 2. The lower portion is formed to form a plurality of second embankment layers 502 which are connected to the adjacent one of the I I electrodes 2 surrounded by the first embankment layer 501. The arrangement pattern of the plurality of second armor layers 502 is almost parallel in a direction perpendicular to the plane of Fig. 4. The method for forming the first embankment layer 501 and the second organic embankment layer 502 is formed by a steaming method when an inorganic material is used, and by using, for example, an acrylic resin or a polyfluorene when a material is used. After the resin such as an imide resin is dissolved in a solvent, it is applied by various coating methods such as a spin coating method or a dip coating method to form an organic layer. In the present invention, a method of coating an organic material is preferred. Further, the constituent material of the organic layer is not dissolved in the solvent of the ink to be described later, and any one of them can be easily patterned by etching or the like. The first first embankment layer 501 is formed by, for example, patterning an inorganic material in a comprehensive manner, and then patterning it using photolithography. The organic layer forming the second bank layer 502 is continuously applied between the plurality of halogen electrodes 2 by an inkjet method, or is applied to one surface and then patterned by photolithography or etching. . Next, a region exhibiting lyophilicity and a region exhibiting liquid repellency are formed on the surface of the embankment layer. For the present embodiment (four) towel, # (4) is processed to form each region. This processing includes the following steps: pre-heating step 323323 198 201220574, and making the wall surface of the upper surface of the second bank layer 502 and the opening and the exposed surface of the halogen electrode 2 and the upper surface of the first bank layer 501 lyophilic. The printing step is performed, and the upper surface of the second bank layer 502 and the wall surface of the opening are made into a liquid-repellent ink-printing step and a cooling step. Specifically, the substrate (substrate 1 including a bank layer or the like) is brought to a predetermined temperature, for example, heated to about 70 to 80 ° C, and then plasma treatment with oxygen as a reaction gas is performed under atmospheric pressure (〇2 plasma) Process), and as a pro-printing step. Next, a plasma treatment (CF4 plasma treatment) using tetradecane as a reaction gas is carried out under atmospheric pressure as a printing inkization step, after which the heated substrate is cooled for plasma treatment. Until room temperature. Further, in the plasma treatment using tetrafluoromethane as a reaction gas, the second bank layer 502 composed of an organic substance is selectively liquefied. Thereby, lyophilicity and liquid repellency are imparted to the above-mentioned desired site. Then, the ink containing the material which becomes the electron injection layer and the light-emitting layer is sequentially supplied to the region surrounded by the second bank layer 502, and the electron injection layer and the light-emitting layer are sequentially formed by curing. Then, the ink containing the material which becomes the hole transport layer and the hole injection layer is sequentially supplied to the entire surface, and the hole transport layer and the hole injection layer are sequentially formed by solidifying it. Next, on the above-mentioned hole injection layer 8, a material selected from the anode materials previously described is selected from the vacuum deposition method, the sputtering method, the ion plating method, and the plating. One of the methods and the like is carried out to form an anode 9. In terms of the film thickness of the anode 9, it is adjusted to 1 Onm to 10 // m, preferably 20 nm to 1 // m as described earlier, and more preferably 199 323323 201220574 is adjusted to 50 nm to 50 〇 nm. As described above, the organic EL display device of the configuration shown in Fig. 4 is formed. In the present embodiment, the embankment is formed in a region other than the halogen before the step of forming the electron injecting layer. However, in other embodiments, the electron injecting layer may be formed on the electron injecting layer. Embankments are formed in areas other than the prime. In this case, in order to prevent the electron injection layer from being dissolved in the developer or the like during the formation of the bank, it is preferred that the electron injection layer be insolubilized in the developing solution or the like in advance. The insolubilization of the electron injecting layer can be carried out, for example, by polymerizing a polymerizable compound. As described in detail above, the third embodiment of the method for producing an organic EL display device is characterized in that it is an ionic polymer which has electron injectability and is stable in air and can be made into a solution by a polar solvent. An electron injecting layer is formed; and a light emitting layer of a plurality of colors is selectively selected by using a bank. According to such a configuration, the organic layer of the organic EL element constituting the organic EL display device can be formed by film formation in the air in the air, so that the manufacturing process can be simplified, and the manufacturing cost can be reduced. Moreover, since the size of the board is not limited, a large screen display can be manufactured. [Brief Description of the Drawings] Fig. 1 is a schematic cross-sectional view showing the configuration of the organic EL display device of the present invention. A&quot;&gt; Fig. 2A is a step description circle of the first embodiment of the method for producing an organic EL display device of the present invention. Fig. 2B is a view showing the steps of the embodiment of the method of manufacturing the organic EL display device of the present invention. 323323 200 201220574. Fig. 2C is a step explanatory view showing a first embodiment of the method for producing an organic EL display device of the present invention. Fig. 2D is a step explanatory view showing a first embodiment of the method for producing an organic EL display device of the present invention. Fig. 2E is a step explanatory view showing the first embodiment of the method of manufacturing the organic EL display device of the present invention. Fig. 2F is a step explanatory view showing a first embodiment of the method for producing an organic EL display device of the present invention. Fig. 2G is a step explanatory view showing a first embodiment of the method for producing an organic EL display device of the present invention. Fig. 2H is a step explanatory view showing a first embodiment of the method for producing an organic EL display device of the present invention. Fig. 3A is a step explanatory view showing a second embodiment of the method for producing an organic EL display device of the present invention. Fig. 3B is a step explanatory view showing a second embodiment of the method for producing an organic EL display device of the present invention. Fig. 3C is a step explanatory view showing a second embodiment of the method for producing an organic EL display device of the present invention. Fig. 3D is a step explanatory view showing a second embodiment of the method for producing an organic EL display device of the present invention. Fig. 3E is a step explanatory view showing a second embodiment of the method for producing an organic EL display device of the present invention. 3F is a method of manufacturing the organic EL display device of the present invention. 201 323323 201220574

2實施形態的步驟說明圖。 第圖係本發明的有機 2實施形態的步驟說明圖。 第3H圖係本發明的有機 2實施形態的步驟說明圖。 第《31圖係本發明的有機 2實施形態的步驟說明圖。 第3J圖係本發明的有機 2實施形態的步驟說明圖。 第3K圖係本發明的有機 2實施形態的步驟說明圖。 EL顯示裝置的製造方法之第 EL顯示裝置的製造方法之第 EL顯示裝置的製造方法之第 EL顯示裝置的製造方法之第 EL顯示裝置的製造方法之第 第4圖係本發明的有機EL顯示裝置的製造方法之第 實施形態的說明圖。 【主要元件符號說明】 1 基板 2 晝素電極（陰極） 4 電子注入層 5 撥液圖案 5a 撥液性圖案 7 電洞傳輪層 8 電洞注入層 9 陽極 31 R晝素 32 G晝素 33 B畫素 61 R發光層 62 G發光層 63 B發光層 501 第1堤防層 502 第2堤防層2Step description of the embodiment. The drawings are explanatory diagrams of the steps of the organic 2 embodiment of the present invention. Fig. 3H is a step explanatory view of the organic 2 embodiment of the present invention. Fig. 31 is a view showing the steps of the organic 2 embodiment of the present invention. Fig. 3J is a step explanatory view of the organic 2 embodiment of the present invention. Fig. 3K is a step explanatory view showing an embodiment of the organic 2 of the present invention. The fourth embodiment of the method for producing the EL display device of the method for producing the EL display device according to the method for producing the EL display device in the method for producing the EL display device is the organic EL display of the present invention. An explanatory view of a first embodiment of a method of manufacturing a device. [Main component symbol description] 1 Substrate 2 Alizarin electrode (cathode) 4 Electron injection layer 5 Liquid pattern 5a Liquid-repellent pattern 7 Hole transfer layer 8 Hole injection layer 9 Anode 31 R 32 32 32 32 B pixel 61 R light emitting layer 62 G light emitting layer 63 B light emitting layer 501 first bank layer 502 second bank layer

323323 202323323 202

Claims (1)

201220574 七、申請專利範圍： 1. 一種有機電激發先顯示裝置之製造方法，該有機電激發 光顯示裝置具有複數個由有機電激發光元件所構成的 畫素’該有機電激發光元件包含：陽極及陰極、位於此 等電極間之發光層、位於前述陰極與發光層之間的電子 注入層； 其中，該有機電激發光顯示裝置之製造方法包括下 述步驟： 準備基板之步驟，該基板形成有對應各晝素之複數 個陰極； 形成電子注入層之步驟，其係於前述各陰極上塗佈 包含離子性聚合物的溶液，並使該溶液成膜從而形成電 子注入層； 形成發光層之步驟，其係於前述電子注入層上塗佈 包含發光材料的溶液，並使該溶液成膜從而形成發光 層，或疋於前述電子注入層上形成發光層以外的層之 後，於該層上塗佈包含發光材料的溶液，並進行製膜從 而形成發光層；與 形成陽極之步驟’其係於前述發光層上將陽極材料 製成臈從而形成陽極，或是於前述發光層上形成陽極以 外的層後，在該層上將陽極材料製成膜從而形成陽極。 2. 如申睛專利範圍第1項所述之有機電激發光顯示裝置 的Μ造方法，其中，前述形成發光層之步驟係如下述之 ㈣：於晝素以外之區域形成撥液圖案，並於該撥液圖 323323 1 201220574 案之開口内部塗佈包含發光材料的溶液，並使該溶液成 膜從而形成複數層發光層之步驟。 3. 如申請專利範圍第1項所述之有機電激發光顯示裝置 的製造方法，其具有如下述之步驟：於畫素以外之區域 形成堤防（bank)之步驟。 4. 一種有機電激發光顯示裝置，其可藉由申請專利範圍第 1項所述之有機電激發光顯示裝置的製造方法所製造。201220574 VII. Patent Application Range: 1. A method for manufacturing an organic electro-excitation first display device having a plurality of pixels composed of organic electroluminescence elements. The organic electroluminescence device comprises: An anode and a cathode, an illuminating layer between the electrodes, and an electron injecting layer between the cathode and the luminescent layer; wherein the method for manufacturing the organic electroluminescent display device comprises the steps of: preparing a substrate, the substrate Forming a plurality of cathodes corresponding to the respective halogens; forming an electron injecting layer, coating a solution containing the ionic polymer on each of the cathodes, and forming the solution into a film to form an electron injecting layer; forming a light emitting layer a step of coating a solution containing a light-emitting material on the electron injecting layer, and forming the film into a light-emitting layer, or forming a layer other than the light-emitting layer on the electron injecting layer, on the layer Coating a solution containing a luminescent material and performing film formation to form a luminescent layer; and the step of forming an anode In the light emitting layer on the anode material it is made of Ge to thereby form an anode, or an anode formed on the light emitting layer to the outside layer, the layer is made of a film on the anode material to form an anode. 2. The method for manufacturing an organic electroluminescence display device according to claim 1, wherein the step of forming the luminescent layer is as follows (4): forming a liquid-repellent pattern in a region other than sputum, and A step of coating a solution containing a luminescent material inside the opening of the dialing diagram 323323 1 201220574 and forming the solution into a film to form a plurality of luminescent layers. 3. The method of manufacturing an organic electroluminescence display device according to claim 1, which has the step of forming a bank in a region other than the pixel. An organic electroluminescence display device which can be produced by the method for producing an organic electroluminescence display device according to claim 1. 323323323323
TW100125403A 2010-07-21 2011-07-19 Method for manufacturing organic electroluminescence display device and organic electroluminescence display device TW201220574A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010164077 2010-07-21

Publications (1)

Publication Number Publication Date
TW201220574A true TW201220574A (en) 2012-05-16

Family

ID=45496878

Family Applications (1)

Application Number Title Priority Date Filing Date
TW100125403A TW201220574A (en) 2010-07-21 2011-07-19 Method for manufacturing organic electroluminescence display device and organic electroluminescence display device

Country Status (3)

Country Link
JP (1) JP2012043782A (en)
TW (1) TW201220574A (en)
WO (1) WO2012011456A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI714663B (en) * 2015-11-13 2021-01-01 日商住友化學股份有限公司 Method for manufactaring organic el device

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101996434B1 (en) * 2012-11-30 2019-07-05 삼성디스플레이 주식회사 Method for manufacturing organic light emitting display apparatus
CN116193923A (en) * 2021-11-25 2023-05-30 纳晶科技股份有限公司 Light emitting device, method of manufacturing the same, and electronic apparatus including the same

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009110642A1 (en) * 2008-03-07 2009-09-11 住友化学株式会社 Layered structure
US8130177B2 (en) * 2008-03-13 2012-03-06 Panasonic Corporation Organic EL display panel and manufacturing method thereof
JP5199772B2 (en) * 2008-07-30 2013-05-15 住友化学株式会社 Organic electroluminescence device and method for manufacturing the same
JP5185007B2 (en) * 2008-07-31 2013-04-17 住友化学株式会社 Method for manufacturing organic electroluminescent element and organic electroluminescent element

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI714663B (en) * 2015-11-13 2021-01-01 日商住友化學股份有限公司 Method for manufactaring organic el device

Also Published As

Publication number Publication date
WO2012011456A1 (en) 2012-01-26
JP2012043782A (en) 2012-03-01

Similar Documents

Publication Publication Date Title
TW555830B (en) Method for producing electroluminescent element
TWI545143B (en) Electronic device and polymer compound
TW201122082A (en) Laminated structure, polymer, electroluminescent element, and photoelectric conversion element
TWI542059B (en) Method for making an organic luminescent device
TW201220575A (en) Method for making an oreanic EL element
TW201247733A (en) Electronic device and polymer compound
CN101536207B (en) Organic electroluminescent device
TW200946340A (en) Laminatyed construction
TWI426092B (en) Polymer material and polymer light emitting device
TW201301597A (en) Organic electro luminescence element and manufacturing method thereof
CN104380494B (en) Organic electroluminescent device, organic electroluminescent luminous device and organic electroluminescence display device and method of manufacturing same
TW201307424A (en) Electronic device and polymer compound
JP2010232163A (en) Method of manufacturing light-emitting display device, light-emitting display device, and light-emitting display
TW200911815A (en) Compound, method for producing the same, ink composition using the compound, thin film, organic transistor, and organic electroluminescent device
TW201139558A (en) Polymer, organic electroluminescent element material, composition for organic electroluminescent element, organic electroluminescent element, display and lighting
TW201232871A (en) Method of making organic electroluminescence element
TW201031259A (en) Organic electroluminescence element and manufacturing method thereof
TW201008975A (en) Copolymer and high polymer light-emitting device using the same
TW201228842A (en) Organic electro luminescence (EL) device and manufacturing method thereof
TW201127787A (en) Monoamine compound, charge transport material, composition for charge transport membrane, organic electroluminescence element, organic EL display device and organic EL lighting
TW201042002A (en) Composition for organic electroluminescent device, organic electroluminescent device, organic EL display and organic EL illumination
TW201238993A (en) Composition
CN101316879B (en) Polymer material and polymer light-emitting device using same
TW200910662A (en) Organic electroluminance element and display device using the same
TW201215226A (en) Organic EL element