TW201219204A - Precursor for an electrically conductive material and electrically conductive material - Google Patents

Precursor for an electrically conductive material and electrically conductive material Download PDF

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Publication number
TW201219204A
TW201219204A TW100134537A TW100134537A TW201219204A TW 201219204 A TW201219204 A TW 201219204A TW 100134537 A TW100134537 A TW 100134537A TW 100134537 A TW100134537 A TW 100134537A TW 201219204 A TW201219204 A TW 201219204A
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Taiwan
Prior art keywords
conductive material
active energy
energy ray
mass
resin layer
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TW100134537A
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Chinese (zh)
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TWI499503B (en
Inventor
Takenobu Yoshiki
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Mitsubishi Paper Mills Ltd
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Priority claimed from JP2010216658A external-priority patent/JP5570928B2/en
Priority claimed from JP2011165175A external-priority patent/JP5864940B2/en
Application filed by Mitsubishi Paper Mills Ltd filed Critical Mitsubishi Paper Mills Ltd
Publication of TW201219204A publication Critical patent/TW201219204A/en
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Publication of TWI499503B publication Critical patent/TWI499503B/en

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/20Conductive material dispersed in non-conductive organic material
    • H01B1/22Conductive material dispersed in non-conductive organic material the conductive material comprising metals or alloys

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Dispersion Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Laminated Bodies (AREA)

Abstract

This invention provides a precursor for an electrically conductive material having a supporting member and at least an active energy ray bonding force reducing type resin layer easy bonding layer and a metal portion disposed sequentially on the supporting member, the active energy ray bonding force reducing type resin containing an active ray hardening type polymeric compound having a mass average molecular weight of 15000 or more and having an unsaturated double bond.

Description

201219204 β 六、發明說明: . 【發明所屬之技術領域】 ' 本發明係關於一種用以使用於可撓性印刷基板用電路 材、行動電話等各種天線材等的製造之導電性材料前驅物, 尤其於具有曲面形狀之基材上用以形成電路或天線等較宜 使用之導電性材料前驅物、及使用此所製造之導電性材料。 【先前技術】 近年’汽車用天線或行動電話之天線等要求於具有曲 面之成型品上形成天線等金屬部。但’要於曲面上形成微 細的金屬部係非常困難。 於具有可撓性之樹脂支撐體上形成金屬部所構成的圖 型而製造具有可撓性的導電性材料之方法,已提出減去法 (subtract method)或印刷法、照相法等各種方法。使具有 可撓性之導電性材料貼合於曲面,可於曲面上形成金屬 部。於曲面貼合導電性材料時係導電性材料愈柔軟,貼合 時之浮起等愈不易發生,故佳。另外,在製造導電性材料 之#又剛性愈向,製造時愈不易產生敵折等。因此,外 求一種可得到在製造階段係剛性高,且在貼合之時間點剛 性低之導電性材料的導電性材料前驅物。 例如,在專利文獻丨中係於具剛性之金屬箔貼合 載體膜,繼而進行半切割加工,將被圖型化之金屬部和載 體膜整個一起剝離以形成圖型。但,在此方法中,例如在 環型天線等之複雜圖型會產生無法剝離的部分。又,使用 如專利文獻1之第3圖的剝離法時,恐於剝離時切斷金屬 3 323512 201219204 • Μ為防止此情形,必須增厚金屬箔的厚度,但亦具有曲 • 面加工變困難之問題。 / h並非曲面之加工,但例如在專利文獻2、專利文獻3 f於支撐體上貼合金屬箱,藉由以公知之方法姓刻此金屬 V白,圖型化之後,轉印至被轉印體之方法亦已被提出。然 而在轉印法中係於圖型化之前貼合支撐體與金屬箔,但, 若此貼&時之糊劑的強度太強,剝離金屬箔時,形成無法 剝離之部分,或若強度太弱,在至轉印為止之前之步驟, 產生金屬箔完全剝離等之問題,故糊劑之接著強度很難調 整之問題亦存在。又,依制離之圖型的形狀或大小,制離 之谷易性相異,故亦有時依圖型之圖案係無法順利轉印。 ^在專利文獻4、專利文獻5等係為貼合支撐體與金屬 、泊用活性能量線黏著力消失型黏著劑,使用活性能量 Ί占著力#失型接著劑時,轉印前照射活性能量線,糊劑 之黏著力消失,故糊劑之強度容易調整。但,使金屬部圖 里化時黏著劑層位於表面,故亦有時黏著劑會污染步驟, 或藉黏著劑而轉印體捲黏於輥等致被破壞。進一步,轉印 時金屬部使用黏著劑等而轉印至被黏體,但,此時被硬化 之活性月巨罝線黏著力肖失型黏著劑亦一起被接著,故有時 無法順利轉印。 在專利文獻6中已提出一種使用銀鹽照相轉印法而製 作之金屬網目藉酵素處理進行制離而使用之方法。或,在 專利文獻7中亦已提出一種製造金屬網目單體之方法。以 此等之方法係為從基材剝離圖型,至製作圖型為止之問題 323512 4 201219204 係不存在,. ‘ 人’喊細的圖塑亦可容易製作。然而,如網目 、 又之圖聖連樓者尚可’但陣列天線等在剝離時間點成零零 卒卒故不成為對於陣列天線等之加工問題的解決對策等。 如專利夂獻8等般,在插件成型法(insert molding) 中使用轉印獏’於轉印膜設有硬塗層,於插件成型後使硬 塗層光硬化而形成金屬部後,從轉印膜剝離之方法已為人 所知。但尚未有於硬塗層牢固地密著金屬部’又,從轉印 犋韌離時避免金屬部被剝離或變形之提案。 先前技術文獻 專利文獻 • 專利文獻1 :日本特開2003-78324號公報 專利文獻2 :日本特開2006-15662號公報 專利文獻3 :日本特開2009-520251號公報 專利文獻4 :日本特開2004-82711號公報 專利文獻5 :日本特開2008-260227號公報 專利文獻6 :日本特開2006-111889號公報 專利文獻7 :日本特開2002-275661號公報 專利文獻8 :日本特開2010-126633號公報 【發明内容】 (發明欲解決之課題) 因此,本發明之目的在於提供一種導電性材料前驅物, 係製造_性高、完成時制m低u產生皺、折 ^驟的©擾’且綱導電性材料前驅物剝離至少具有 、屬部與㈣著層之導電性材料時可均勻且容易地剝離者。 323512 5 201219204 .又,在於提供一種可於曲面上形成微細的金屬部之導電性 材料。 (用以解決課題之手段) 本發明係藉以下之發明來達成。 ⑴-種導電性材料前驅物’其係於支撐體上至少依序具 有.含=量平均分子量為15000以上之具有不飽和雙鍵 的活!生月b量線硬化性向分子化合物之活性能量線密著力降 低型樹脂層、易接著層、金屬部。 (2) 如上述⑴項之導電性材料前驅物,其中前述活性能量 線密著力降低型樹脂層相對於該樹脂層的全固形分含有 40質直%以上之質量平均分子量為ι5〇〇〇以上之具有不飽 和雙鍵的活性能量線硬化性高分子化合物,且相對於該樹 脂層的全固形分含有8質量%以上之環氧化合物。 (3) 如上述(1)或(2)項之導電性材料前驅物,其中前述活性 能量線密著力降低型樹脂層進一步含有熱陽離子聚合起始 劑。 (4) 如上述(1)至(3)項中任一項之導電性材料前驅物,其辛 相對於前述活性能量線密著力降低型樹脂層的全固形分, 含有50至90質量%之質量平均分子量為ι5〇〇〇以上之具有 不飽和雙鍵的活性能量線硬化性高分子化合物。 (5) 如上述(1)至(4)項中任一項之導電性材料前驅物,其中 相對於前述活性能量線密著力降低型樹脂層的全固形分, 含有60至70質量%之質量平均分子量為15000以上之具有 不飽和雙鍵的活性能量線硬化性高分子化合物。 6 323512 201219204 中 (6)如上述(2)至(5)項中任一項之導電性材料前麟物,其 相對於前述活性能量線密著力降低型樹脂層的一 #分 含有10至30質量%之環氧化合物。 ⑺如上述⑵至(6)項中任—項之導電性材料前麟物,其, 相對於前述活性能量線密著力降低型樹脂層的以衫分 含有15至25質量%之環氧化合物。 ^ ⑻-種導電性材料,其係對如上述⑴至⑺項 導電性材料前驅物照射活性能量線之後,從支援雜刺# )含有易接者層及金屬部而成之材料來製造。 (9)-種導電性材料,其係對如上述⑴至⑺ 導電性材料前驅物照射活性能量線之後,於該一一爲 前驅物之金屬部側貼合保護膜,從支撐體剝離多少食有 接著層、金屬部及上述保護膜而成之材料來製造。 (發明之效果) 依本發明,可提供—種導電性材料前驅物,其係不![2012] The invention relates to a conductive material precursor for use in the manufacture of various antenna materials such as a circuit board for a flexible printed circuit board and a mobile phone, and the like. In particular, a conductive material precursor which is preferably used for forming a circuit or an antenna on a substrate having a curved shape, and a conductive material produced using the same. [Prior Art] In recent years, an antenna for an automobile or an antenna for a mobile phone or the like is required to form a metal portion such as an antenna on a molded article having a curved surface. However, it is very difficult to form a fine metal part on the curved surface. A method of producing a flexible conductive material by forming a pattern of a metal portion on a flexible resin support has been proposed, and various methods such as a subtractive method, a printing method, and a photographic method have been proposed. A flexible conductive material is bonded to the curved surface to form a metal portion on the curved surface. When the conductive material is bonded to the curved surface, the softer the conductive material is, the more difficult it is to float when it is bonded, and so on. In addition, in the manufacture of the conductive material, the rigidity becomes more and more, and the enemy is less likely to be generated during manufacture. Therefore, a conductive material precursor which can obtain a conductive material which is high in rigidity at the manufacturing stage and which is low in rigidity at the time of bonding is obtained. For example, in the patent document, a rigid metal foil-bonding carrier film is attached, followed by half-cutting, and the patterned metal portion and the carrier film are entirely peeled off together to form a pattern. However, in this method, for example, a complicated pattern such as a loop antenna may cause a portion that cannot be peeled off. Further, when the peeling method of the third drawing of Patent Document 1 is used, it is feared that the metal is cut at the time of peeling. 3 323512 201219204 • To prevent this, it is necessary to thicken the thickness of the metal foil, but it also has difficulty in the processing of the curved surface. The problem. /h is not the processing of the curved surface. For example, in Patent Document 2 and Patent Document 3 f, the metal case is bonded to the support body, and the metal V white is named by a known method, and after being patterned, the transfer is carried out. The method of printing has also been proposed. However, in the transfer method, the support and the metal foil are bonded before the patterning, but if the strength of the paste is too strong, when the metal foil is peeled off, a portion which cannot be peeled off is formed, or if the strength is Too weak, in the step before the transfer, there is a problem that the metal foil is completely peeled off, and the like, so that the adhesive strength of the paste is difficult to adjust. Moreover, depending on the shape or size of the pattern to be separated, the grainability of the separation is different, and therefore the pattern according to the pattern may not be smoothly transferred. ^ Patent Document 4, Patent Document 5, etc., is a bonding support and metal, a mooring active energy ray-adhesive-disappearing adhesive, and an active energy Ί 着 力 # 失 失 失 失 失 失 失 失 失 失The adhesion of the line and the paste disappears, so the strength of the paste is easily adjusted. However, when the metal portion is patterned, the adhesive layer is located on the surface, so that the adhesive may contaminate the step, or the transfer body may be damaged by the adhesive or the like by the adhesive. Further, at the time of transfer, the metal portion is transferred to the adherend using an adhesive or the like, but at this time, the hardened active moon 罝 line adhesion force is also followed by the adhesive, so that the transfer may not be smoothly performed. . Patent Document 6 proposes a method in which a metal mesh produced by a silver salt photographic transfer method is subjected to enzymatic treatment for separation. Alternatively, a method of manufacturing a metal mesh monomer has also been proposed in Patent Document 7. The method of peeling off the pattern from the substrate to the pattern creation 323512 4 201219204 does not exist, and the pattern of ‘people’ shouting can be easily produced. However, if the mesh and the map are still in the vicinity of the building, the array antennas are zero at the time of the stripping, and therefore do not become a solution to the processing problems such as array antennas. For example, in the insert molding method, a transfer coating is used in the insert molding to form a hard coat layer on the transfer film, and after the insert is formed, the hard coat layer is photohardened to form a metal portion, and then transferred. The method of peeling off the film is known. However, there has not been a proposal that the hard coat layer is firmly adhered to the metal portion, and the metal portion is prevented from being peeled off or deformed from the transfer of the crucible. [Patent Document 1] Japanese Patent Laid-Open Publication No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. Japanese Patent Laid-Open Publication No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. SUMMARY OF THE INVENTION [Problem to be Solved by the Invention] Therefore, an object of the present invention is to provide a conductive material precursor which is high in manufacturing, low in yield, low in w, and "refractive" When the precursor of the conductive material is peeled off at least, the conductive material of the genus portion and the (4) layer can be uniformly and easily peeled off. 323512 5 201219204 Further, it is to provide a conductive material which can form a fine metal portion on a curved surface. (Means for Solving the Problem) The present invention has been achieved by the following invention. (1) A kind of conductive material precursor' is attached to the support at least sequentially. The active double-bond containing the average molecular weight of 15000 or more has an unsaturated double bond. The adhesion-reducing resin layer, the easy-adhesion layer, and the metal portion. (2) The conductive material precursor according to the above (1), wherein the active energy ray-reducing-reducing resin layer contains 40% by mass or more of the total solid content of the resin layer, and the mass average molecular weight is ι 5 〇〇〇 or more. The active energy ray-curable polymer compound having an unsaturated double bond contains 8% by mass or more of an epoxy compound based on the total solid content of the resin layer. (3) The conductive material precursor according to the above (1) or (2), wherein the active energy ray-reducing resin layer further contains a thermal cation polymerization initiator. (4) The conductive material precursor according to any one of the above items (1) to (3), wherein the symplectic content is 50 to 90% by mass based on the total solid content of the active energy ray-reducing resin layer. An active energy ray-curable polymer compound having an unsaturated double bond having a mass average molecular weight of 1⁄5 Å or more. (5) The conductive material precursor according to any one of the above items (1) to (4), wherein the total solid content of the active energy ray-reducing resin layer is 60 to 70% by mass. An active energy ray-curable polymer compound having an unsaturated double bond having an average molecular weight of 15,000 or more. (6) The conductive material precursor of any one of the above-mentioned items (2) to (5), which contains 10 to 30 with respect to one of the aforementioned active energy ray-reducing resin layers. % by mass of epoxy compound. (7) The conductive material precursor of any one of the above items (2) to (6), which contains 15 to 25% by mass of the epoxy compound in the shirt of the active energy ray-reducing resin layer. (8) A conductive material produced by irradiating an active energy ray to a precursor of a conductive material as described in the above (1) to (7), and then supporting a material having a free layer and a metal portion. (9) A conductive material which is obtained by irradiating an active energy ray to the precursor of the conductive material as described in (1) to (7) above, and attaching a protective film to the side of the metal portion of the precursor, and how much food is peeled off from the support It is made of a material having an adhesive layer, a metal portion, and the above protective film. (Effect of the Invention) According to the present invention, a precursor of a conductive material can be provided, which is not!

至少且'的困擾’且從該導電性材料前驅物剝離 =有金屬部與易接著層之導電性材料時 J 導雷_又,可提供—種可於曲面上形成微細的全屬奋易 導電性材料。 q金屬部之 [實施方式】 <導電性材料前驅物> 本發明之導電师料前職,錢於支 序具有:含有質量平均分子量為15刚以上之具^至少依 雙鍵的活性能量線硬化性高分子化合物之活性j不飽和 323512 7 201219204 .·易接著層、金屬部。使用於本發明之導 • 驅物的支撐體係只要為穿透活性能量線之材料 P二無特別限定’但尤宜為全光線穿透率為娜以上之 支撐體。進一步宜為全光線穿透率為継以上之支撐體。 =此之支雜,可舉對苯二㈣乙二料代 脂、二乙㈣樹脂、三乙酸醋樹脂、丙烯酸樹脂、 聚碳酸輯脂、聚氯乙稀、聚酸亞胺樹脂、聚偏二氟乙婦、 ^紛㈤咖廳)、赛璐路㈣lulQid)等樹脂薄膜。此 等支樓體之令宜為具有剛性,且易操作,並可得到良 剝離性之聚醋樹脂。又,為了易剝離導電性材料,亦可 離型層設於支樓體與活性能量線密著力降低型樹脂層之 間。在本發明中離型層係可單獨或複合使用石壤1 (carnauba wax)、聚乙烯等之蠟類,丙烯酸系、三聚氰 系、環氧系、脂肪族醋系、烯烴系、聚石夕氧樹脂、氣樹月匕 等之樹脂類,亦可含有界面活性劑等。又,於支㈣之相 反面亦可設有抗靜電層等公知的功能層。 於本發明使用之導電性材料前驅物的活性能量線密著 力降低型樹脂層係含有質量平均分子量為15〇〇〇以上之且 有不飽和雙鍵的活性能量線硬化性高分子化合物。如此^ 活性能量線硬化性高分子化合物係可舉例如⑴於具有經 基、缓基、聽、氫硫基、酿胺基等活性氫的分子量⑽ 以上的高分子化合物,例如聚乙烯醇、聚乙烯丁醛 _等各種聚乙烯縮搭樹脂’聚烯丙基胺、或丙烯酸、 丙烯酸炫醋等丙烯酸醋類,丙婦酸胺、丙婦猜、甲基丙缔 323512 8 201219204 酉夂、甲基丙烯酸院等甲基丙烯酸醋類,甲基丙稀酿胺及 甲基丙婦腈等任—單體之同元聚合物或2種以上此等單體 的聚合所得到之共聚物等的丙烯酸聚合物;與含有環氧基 的聚σ性不飽和化合物,例如稀丙基環氧丙基醚等,或含 有異氰酸®旨基的聚合性不飽和化合物,例如曱基丙烯醯氧 基乙基異氛酸S旨等具有可與活性氫反應之基與不飽和雙鍵 的化合物作用,進行加成反應之方法所得到的高分子化合 物;或者(2)如記載於國際公開第2〇〇5/87831號手冊之含 有%:氧基的丙稀酸聚合物,與不飽和叛酸進行加成.反應之 方法等公知方法進行合成所得到的高分子化合物。此等活 f1 生月b里線硬化性尚分子化合物之中,丙烯酸聚合物與不飽 和化合物加成反應之高分子化合物可得到良好的剝離性之 觀點來看較佳。以此等方法所合成之質量平均分子量 15000以上之具有不飽和雙鍵的活性能量線硬化性高分子 化合物係可單獨亦可混合複數種類而使用。 質量平均分子量為15000以上之具有不飽和雙鍵的活 性忐K線硬化性高分子化合物係亦可使用市售品。市售品 係可且使用日立化成工業(股)的JJital〇id (平均分子 量 50000)。 本發明之活性能篁線後著力降低型樹脂層係宜含有光 ♦ &起始劑。光聚合起始劑係可使用一般已知者。具體上 可舉例如苯偶姻、二苯甲酮、苯偶姻乙基醚、苯偶姻異丙 基醚、2, 2-二曱氧基-2-苯基笨乙酮、卜羥基環己基苯基 _、2〜羥基-2-曱基-1-笨基丙烷__丨_酮、偶氮雙異丁腈、苯 323512 9 201219204 • 甲醯基過氧化物等,但不限定於此。此等光聚合起始劑係 可單獨使用,亦可併用2種類以上。又,相對於質量平均 • 分子量15000以上之具有不飽和雙鍵的活性能量線硬化性 高分子化合物,光聚合起始劑係宜含有0. 1至20質量%, 更宜為1至10質量%。 除了光聚合起始劑外,依需要而可添加至少一種類以 上的光增感劑,控制硬化時間或硬化狀態。光增感劑係可 選自胺化合物、磷化合物、腈化合物、苯偶姻化合物、羰 基化合物、硫化合物、萘系化合物、縮合芳香族烴、金屬 鹽及其等之混合物。具體上可舉例如三乙基胺、曱基丙烯 酸二乙基胺基乙酯、N-曱基二乙醇胺等胺化合物,醯基氧 化膦、三丁基膦等磷化合物,5-硝基苊 (5-nitroacenaphthene)等腈化合物,苯曱酸4-二甲基胺 基乙醋、苯曱酸4-二甲基胺基異戊醋、苯偶姻、苯偶姻曱 基鱗、苯偶姻乙基鍵、苯偶姻異丁基鱗、苯偶姻辛基鱗等 苯偶姻化合物’二乙氧基苯乙酮、2-經基-2 -曱基苯丙酮、 4’ -異丙基-2-羥基-2-曱基苯丙酮、曱基蒽醌、笨乙酮、 二苯曱酮、笨曱醯基甲酸曱酯、苯甲基二曱基縮酮、卜經 基環己基苯基酮、2-曱基-1-(4-(曱基硫基)苯基)_2一嗎啉 基)-丙烯-1,2, 2-二曱氧基-2-苯基笨乙酮等羰基化合物, 二苯基二硫醚、二硫胺基甲酸g旨等硫化合物,3_氣曱基茶 等萘系化合物’蒽等縮合芳香族烴,氣化鐵等金屬鹽。此 等光增感劑係可單獨使用’亦可組合2種類以上使用。相 對於質量平均分子量15000以上之具有不飽和雙鍵的活性 323512 10 201219204 能量線硬化性高分子化合物,光增感劑之含量係宜為〇. 1 至5質量%,更宜為0.5至3質量%。 又’本發明之活性能量線密著力降低型樹脂層係宜含 有熱陽離子聚合起始劑。熱陽離子聚合起始劑係藉加熱產 生陽離子種或路易士酸(Lewis acid)之化合物,可舉例如 苯曱基硫鏽鹽、°塞吩鏽鹽(thiophenium sal t)、四氫β塞喻 鑌鹽(thiolanium salt)、苯甲基銨、吡啶鏽鹽、聯胺錯鹽、 羧酸酯、磺酸酯、胺醯亞胺等。此等熱陽離子聚合起始劑 係可谷易取得市售品,可舉例如任一者均為商品名之At least "disturbing" and peeling from the conductive material precursor = when there is a metal portion and an easy-to-adhere layer of conductive material, J-lead _ again, can provide a kind of micro-scale can be formed on the curved surface Sexual material. [Embodiment] [Electrical Material Precursor > Conductive Material Precursor> The predecessor of the electric conductor of the present invention has a mass average molecular weight of 15 or more and has at least a double bond-based active energy. The activity of the linear curable polymer compound is not saturated. 323512 7 201219204 . · Easy adhesion layer, metal part. The support system used for the guide of the present invention is not particularly limited as long as it is a material penetrating the active energy ray, but it is particularly preferably a support having a total light transmittance of more than 5%. Further, it is preferably a support having a total light transmittance of 継 or more. = This is a miscellaneous substance, such as p-phenylene (tetra) ethylene glycol, diethyl (tetra) resin, triacetic acid vinegar resin, acrylic resin, polycarbonate, polyvinyl chloride, polyimide resin, polydisperse Resin film such as fluoroethylene, conf. (five), and celluloid (four) lulQid). These slabs should be rigid, easy to handle, and provide good release properties. Further, in order to easily peel off the conductive material, the release layer may be provided between the support body and the active energy ray-reducing resin layer. In the present invention, the release layer may be used alone or in combination with waxes such as carnauba wax or polyethylene, acrylic, melamine, epoxy, aliphatic vinegar, olefin, and poly stone. The resin such as oxime resin or sapphire may also contain a surfactant or the like. Further, a known functional layer such as an antistatic layer may be provided on the opposite side of the branch (4). The active energy ray-reducing type resin layer of the conductive material precursor used in the present invention contains an active energy ray-curable polymer compound having a mass average molecular weight of 15 Å or more and having an unsaturated double bond. The active energy ray-curable polymer compound may, for example, be a polymer compound having a molecular weight (10) or more having an active hydrogen such as a thiol group, a slow group, an audition group, a thiol group or a amide group, for example, polyvinyl alcohol or poly. Vinyl butyral _ and other polyethylene shrink resin 'polyallylamine, or acrylic acid, acrylic acid vinegar and other acrylic vinegar, propyl acetophenone, propyl mother, methyl propylene 323512 8 201219204 酉夂, methyl Acrylic acid polymerization of a copolymer obtained by polymerization of a monomer such as a methacrylic acid vinegar such as an acrylic acid, a methyl propylamine or a methyl acrylonitrile or a homopolymer of a monomer or a polymerization of two or more of these monomers a poly-synthesis compound containing an epoxy group, such as a propylene oxide propyl ether, or a polymerizable unsaturated compound containing an isocyanate group, such as a mercapto propylene oxyethyl group. The polymer compound obtained by a method in which an addition reaction is carried out by a compound having a group reactive with an active hydrogen and an unsaturated double bond, and (2) as described in International Publication No. 2 /87831 manual contains %: oxygen The acrylic polymer with an unsaturated acid addition betray. The reaction of a method known method for synthesizing a polymer compound obtained. Among these, it is preferable that the polymer compound of the acrylic polymer and the unsaturated compound is reacted to obtain good releasability. The active energy ray-curable polymer compound having an unsaturated double bond having a mass average molecular weight of 15,000 or more synthesized by such a method may be used alone or in combination of plural kinds. Commercially available products can also be used as the active 忐K-line curable polymer compound having an unsaturated double bond having a mass average molecular weight of 15,000 or more. Commercially available JJital〇id (average molecular weight 50000) of Hitachi Chemical Industry Co., Ltd. is available. The active energy entanglement-reducing resin layer of the present invention preferably contains a light absorbing agent. As the photopolymerization initiator, those generally known can be used. Specific examples thereof include benzoin, benzophenone, benzoin ethyl ether, benzoin isopropyl ether, 2,2-dimethoxy-2-phenyl acetophenone, and hydroxycyclohexyl. Phenyl_, 2~hydroxy-2-indolyl-1-phenylpropane__丨-ketone, azobisisobutyronitrile, benzene 323512 9 201219204 • Mercapto peroxide or the like, but is not limited thereto. These photopolymerization initiators may be used singly or in combination of two or more kinds. 01至二十质量质量优选优选为1至10质量质量。 The active energy ray-curable polymer compound having a mass average of 15000 or more having an unsaturated double bond, the photopolymerization initiator preferably contains 0.1 to 20% by mass, more preferably 1 to 10% by mass. . In addition to the photopolymerization initiator, at least one of the above-mentioned photosensitizers may be added as needed to control the hardening time or the hardened state. The photosensitizer may be selected from the group consisting of an amine compound, a phosphorus compound, a nitrile compound, a benzoin compound, a carbonyl compound, a sulfur compound, a naphthalene compound, a condensed aromatic hydrocarbon, a metal salt, and the like. Specific examples thereof include an amine compound such as triethylamine, diethylaminoethyl methacrylate, and N-mercaptodiethanolamine, a phosphorus compound such as fluorenylphosphine oxide or tributylphosphine, and 5-nitroguanidine ( 5-nitroacenaphthene), such as nitrile compound, 4-dimethylaminoethyl benzoate, 4-dimethylaminoisovalerate, benzoin, benzoin fluorenyl, benzoin B Base bond, benzoin isobutyl scale, benzoin octyl scale and other benzoin compounds 'diethoxyacetophenone, 2-carbyl-2-mercaptopropiophenone, 4'-isopropyl- 2-hydroxy-2-mercaptopropiophenone, mercaptopurine, acetophenone, benzophenone, decyl decyl decanoate, benzyldidecyl ketal, p-cyclohexyl phenyl ketone, 2 a carbonyl compound such as mercapto-1-(4-(decylthio)phenyl)_2-morpholinyl)-propene-1,2,2-dimethoxy-2-phenyl acetophenone, A thiodisulfide compound such as phenyl disulfide or dithiocarbamate, a condensed aromatic hydrocarbon such as a naphthalene compound such as 3—a gas-based tea, or a metal salt such as vaporized iron. These photosensitizers can be used singly or in combination of two or more types. The activity of the unsaturated double bond with respect to the mass average molecular weight of 15000 or more is 323512 10 201219204 The energy ray hardening polymer compound, the content of the photosensitizer is preferably 〇. 1 to 5 mass%, more preferably 0.5 to 3 mass. %. Further, the active energy ray-reducing resin layer of the present invention preferably contains a thermal cationic polymerization initiator. The thermal cationic polymerization initiator is a compound which generates a cationic species or a Lewis acid by heating, and examples thereof include a phenyl sulfonium sulphate salt, a thiophenium sulphate, and a tetrahydro sulphur sulphide. a thiolanium salt, a benzylammonium salt, a pyridine rust salt, a hydrazine wrong salt, a carboxylic acid ester, a sulfonate, an amine imine or the like. These thermal cationic polymerization initiators are commercially available, and any of them may be, for example, a commercial name.

Adeka Opton CP77 及 Adeka Opton CP66(以上,ADEKA (股) 製)、(:1-2639及(:1-2624 (以上,日本曹達(股)製)、3仙_31〇1 SI-60L、San-aid SI-80L 及 San-aid SI-100L(以上,三新 化學工業(股)製)等。此等化合物係亦可只使用丨種,亦可 併用2種以上。此等熱陽離子聚合起始劑相對於交聯劑之 固形分量宜為以0.5至1〇質量%使用,更宜為j至5質量%。 本發明之活性能量線密著力降低型樹脂層係除了質 里平均分子量15GGG以上之具有不飽和雙鍵的活性能量線 硬化性同分子化合物以外’併用不具有不飽和雙鍵的高分 可提高剝離時之強度、柔軟性,以免在 性材料的破裂或彎折。不具有不飽和雙 子化合物而使用, 剝離步驟產生導電 鍵之同刀子化σ物係可舉例如聚乙烯醇、聚乙稀丁酸或聚 乙婦甲酸等各種*乙埽縮搭樹脂,丙烯酸、丙烯酸烧醋等 丙稀13日類,丙歸_、_腈、甲基丙烯酸、曱基丙稀 酉夂烧酉日等甲基丙歸酸醋類’甲基丙烯醯胺及甲基丙稀猜等 11 323512 201219204 任一單體之同元聚合物或2種以上此等單體的聚合所得到 之共聚物等丙烯酸聚合物,聚苯乙烯、聚氯乙烯、聚偏氣 乙烯、聚偏氟乙烯、聚四氟乙烯、聚環氧乙燒、聚環氧丙 烧、聚笨乙烯續酸、聚乙烯η比洛咬酮、聚胺曱酸酷等。又, 亦可使用複數種此等不具有不飽和雙鍵的高分子化合物。 本發明係宜使用密著力易調整之聚乙烯縮醛樹脂,更宜使 用Tg (玻璃轉移點)6〇°C以上,再更宜為Tg80至15(TC的 聚乙烯縮醛樹脂。本發明之導電性材料前驅物具有的活性 能量線密著力降低型樹脂層含有之不具有不飽和雙鍵的高 分子化合物相對於該樹脂層之全固形分量,宜為5〇質量% 以下,更宜為0. 1至40質量%。 在本發明所使用之導電性材料前驅物的活性能量線密 著力降低型樹脂層係除了樹脂成分以外宜含有交聯劑。尤 其含有質量平均分子量15000以上之具有不飽和雙鍵的活 性能量線硬化性高分子化合物以外之高分子化合物時,係 宜藉交聯劑交聯,交聯劑係可使用醛化合物、環氧化合物、 異氰酸酯化合物、羰二醯亞胺化合物、伸乙亞胺(aziridine) 化合物、噚唑啉化合物、活性_素化合物、至少具有二個 乙烯基磺醯基之化合物等公知的交聯劑。此等交聯劑相對 於活性能量線密著力降低型樹脂層之全樹脂成分量宜為含 有0. 1質以上。又,雖可含有丙烯酸單體或丙烯酸寡聚 物等質量平均分子量15咖以下之具有不飽和雙鍵的化合 物’但,曰其量係形成活性能量線密著力降低型樹脂層之全樹 脂成分量的5質量%以下,不產生阻塞(bl〇cking)等,故佳。 323512 12 201219204 在本發明中較佳六 係於分子内具有至小人聯劑為環氧化合物。環氧化合物 •氧基之單體,而該氧基’更佳係具有2個以上環 合物兩者。可使用例包含高分子化合物與低分子化 基醚、甘油二環氧 基%氧丙基趟、乙二醇二環氧丙 二醇二環氧丙基喊、2、聚甘油聚二環氧丙㈣、聚乙 環氧丙基喊、山梨糖醇^醇二環氧丙細、新戊四醇聚 化物、丨2 /聚裱氧丙基醚、乙烯基環己烯二氧 3 4 :氧基:t氣基—^ 辰烷羧酸酯、雙(3 4_環氧基環 己二酸酯、具有環氧其 衣虱丞衣已基) 丙氧基丙f甲氧基外等具有環氧基的石夕烷偶合劑,Γ 何使用型環氣樹脂或雙射型環氧樹脂、吨基 本基曱说认氧樹脂、盼酸型環氧樹脂、間苯二盼 樹脂等公知的環氧化合物。 Κ 在本發明中’活性能量線密著力降低型樹脂層相對於 該樹脂層之全固形分宜為含有5至1〇〇質量%之質量平均分 子量為15000以上之具有不飽和雙鍵的活性能量線硬化性 高分子化合物,含有40質量%以上之質量平均分子量為 15 0 0 0以上之具有不飽和雙鍵的活性能量線硬化性高分子 化合物,且相對於該樹脂層之全固形分含有8質量%以上之 環氧化合物時’即使不立即從照射活性能量後之導電性材 料前驅物剝離含有易接者層及金屬部.而.成之導電性材.料, 亦可長時間安定’均勻且容易地剝離如此之導電性材料, 故更佳。又,對於曲面之加工變容易,故更佳。 323512 13 201219204 =平均分子量為15_以上之具有不飽和雙鍵的活 硬化性高分子化合物相對於該樹脂層之全固形分, ^ 3有5〇至9〇質量% ’尤宜含有60至70質量%。又, ¥乳化曰合物相對於該樹脂層之全固形分,更宜含有1〇至 3〇質:土尤且3有15至25質量%。藉此照射活性能量線 少具有金屬部與易接著層之導電 性材料時,可更均勻且容易地剝離。 在本發明使用的導電性材料前驅物所具有之活性能量 線密著力降低型樹脂層的全固形分量宜為Q.lg/m2以上, 更且為0. 1 JL 8g/m ’最宜為i至5g/m2。活性能量線密著 力降低型樹脂層所含有之樹脂成分至少宜為Q.2g/m2以上。 在本發明使用的導電性材料前驅物所具有之活性能量 線密著力降低型樹脂層係上述成分以外,亦可含有抗靜電 剑、界面活性劑、消光劑、填充劑、滑劑、紫外線吸收劑等。 <易接著層> 本發明所使用之導電性材料前驅物係於活性能量線密 著力降低型樹脂層之上具有易接著層。易接著層係藉由設 於其上之金屬部的製造方法而較佳的形態變化,但,設有 易接著層時,以免使活性能量線密著力降低型樹脂層溶解, 宜以水系之塗液進行塗佈。 後述’但.在本發明中於導電性材料前驅物之易接著層 上設有金屬部之方法’最佳之方法係使用銀鹽擴散轉印法 之方法。首先說明對於此方法使用較佳的易接著層與金屬 部之形成方法。又’此易接著層與金屬部之形成係銀鹽擴 14 323512 201219204 散轉印法以外,亦宜使用網版印刷法而印刷銀漿等導電性 油墨的方法、以無電解電鐘等形成由銅等金屬所構成的導 電性層之方法、或於易接著層上以蒸鍍或濺鍍等形成導電 性層,於其上形成光阻膜,進行曝光、顯像、蝕刻、除去 光阻層以得到之方法等的方法。 易接著層宜為含有各種高分子乳膠。其中,從耐候性 之觀點,宜為含有聚酯乳膠、丙烯酸乳膠、及胺曱酸酯乳 膠之水分散物,進一步從與各種材料之接著性的觀點,宜 為胺曱酸酯乳膠。尤宜為耐候性高之無黃變型胺曱酸酯聚 碳酸酯乳膠。此等高分子乳膠之平均粒徑宜為0. 01至0. 3 #m,更宜為0.02至0.1/zm。又,此等高分子乳膠係亦可 混合複數種類之乳膠而使用,但聚酯乳膠或丙烯酸乳膠或 胺曱酸酯乳膠係宜為易接著層中之樹脂成分的30質量%以 上,更宜為50質量%以上。 又,易接著層係宜進一步含有水溶性高分子化合物, 以交聯劑交聯之易接著層。如此之水溶性高分子化合物, 可舉例如聚丙烯酸、聚丙烯醯胺、聚乙烯醇、聚乙烯吡咯 啶酮、馬來酸酐與苯乙烯之共聚物等,又,可舉例如明膠、 白蛋白、酪蛋白(casein)、聚離胺酸等蛋白質,鹿角菜膠 (carrageenan)、玻尿酸(hyaluronic acid)等黏多糖類, 「高分子之化學反應」(大河原信著1972,化學同人公司 發行)2. 6. 4章記載的胺化纖維素、聚乙烯亞胺、聚烯丙基 胺、聚二烯丙基胺、烯丙基胺與二烯丙基胺之共聚物、二 烯丙基胺與馬來酸酐之共聚物、二烯丙基胺與二氧化硫之 15 323512 201219204 共聚物等。此等水溶性高分子化合物之中亦宜使用蛋白質。 水溶性高分子化合物宜為易接著層中之樹脂成分的60質 量%以下,更宜為2至40質量%。又,使用於易接著層之樹 脂成分量為100mg/m2以上剝離時不產生破損等故障,故佳, 上限宜為2500mg/m2。更佳係200至2000mg/m2,最宜為300 至 1000mg/m2。 交聯劑係亦可含有例如鉻礬之無機化合物,甲醛、乙 二醛、順丁烯二醛、戊二醛之醛類,尿素或乙烯尿素等N-經曱基化合物,黏氣酸(mucochloric acid)、2, 3-二經基 -1,4-二嗜烧之酸等價體(equivalent),2, 4-二氯-6-經基 -s-三畊鹽、或2, 4-二羥基-6-氯-三畊鹽之具有活性鹵素 的化合物,二乙烯基砜、二乙烯基酮、或N,N,N-三丙烯醯 基六氫三畊、具有二個以上活性三員環的乙烯亞胺基之化 合物,於分子中具有二個以上環氧基之化合物類、例如山 梨糖醇聚環氧丙基醚或聚甘油聚環氧丙基醚、二甘油聚環 氧丙基醚、甘油聚環氧丙基醚、聚乙二醇二環氧丙基醚、 聚丙二醇二環氧丙基醚等,或除此以外之「高分子之化學 反應」(大河原信著1972,化學同人公司發行)之2. 6. 7 章、5.2章、9.3章等記載的交聯劑等公知的高分子交聯 劑。其中,宜為於分子中具有二個以上環氧基之水溶性交 聯劑、或乙烯基颯系交聯劑。乙烯基颯系交聯劑謂於分子 中至少具有二個乙烯基磺醯基之化合物,以下述通式I或 下述通式Π所示的化合物。 16 323512 201219204 R1 q|^2= CH—S〇2—L1—CON——S〇2—CH~ CH2Adeka Opton CP77 (Adeka, ADEKA) -aid SI-80L and San-aid SI-100L (above, Sanshin Chemical Industry Co., Ltd.), etc. These compounds may be used alone or in combination of two or more. The solid content of the initiator relative to the crosslinking agent is preferably from 0.5 to 1% by mass, more preferably from J to 5% by mass. The active energy ray-reducing resin layer of the present invention has a mass average molecular weight of 15 GGG or more. The active energy ray-curing property of the unsaturated double bond is the same as that of the molecular compound. When combined with a high score which does not have an unsaturated double bond, the strength and flexibility at the time of peeling can be improved to prevent cracking or bending of the material. For the use of a saturated gemini compound, the same knife-forming σ system for producing a conductive bond in the stripping step may, for example, be various kinds of * acetamidine resin such as polyvinyl alcohol, polyvinyl butyric acid or polyglycolic acid, acrylic acid, acrylic vinegar Such as propylene 13th class, propylene, _ nitrile, methyl Ethyl acid, mercapto propylene, simmering, etc., methyl propyl sulphate, methacrylamide, methyl propyl amide, etc. 11 323512 201219204 Any monomeric homopolymer or more than two An acrylic polymer such as a copolymer obtained by polymerization of a monomer, polystyrene, polyvinyl chloride, polyvinylidene fluoride, polyvinylidene fluoride, polytetrafluoroethylene, polyepoxybutene, polyepoxybutane, Polystyrene vinyl acid, polyethylene η piroxone, polyamine citrate, etc. Further, a plurality of such polymer compounds having no unsaturated double bond may be used. The present invention is preferably adjusted by using a close force. The polyvinyl acetal resin is preferably a Tg (glass transfer point) of 6 〇 ° C or higher, and more preferably a Tg 80 to 15 (TC polyvinyl acetal resin. The active energy of the conductive material precursor of the present invention) 1至40质量百分比。 The linear adhesion reducing resin layer containing the polymer compound having no unsaturated double bond with respect to the total solid content of the resin layer is preferably 5% by mass or less, more preferably 0.1 to 40% by mass. Active energy line adhesion of conductive material precursors used in the invention The low-type resin layer preferably contains a crosslinking agent in addition to the resin component. When a polymer compound other than the active energy ray-curable polymer compound having an unsaturated double bond having a mass average molecular weight of 15,000 or more is contained, it is preferred to use a crosslinking agent. For crosslinking, the crosslinking agent may be an aldehyde compound, an epoxy compound, an isocyanate compound, a carbodiimide compound, an aziridine compound, an oxazoline compound, an active compound, and at least two ethylene. And a total amount of the resin component is preferably 0.1 or more by mass of the total amount of the resin component. In addition, a compound having an unsaturated double bond having a mass average molecular weight of 15 or less, such as an acrylic monomer or an acrylic oligomer, may be contained. However, the amount of the total resin component of the active energy ray-reducing resin layer is formed by the amount. It is preferably 5 mass% or less, and does not cause clogging or the like. 323512 12 201219204 In the present invention, it is preferred that the hexa-linked compound in the molecule is an epoxy compound. The epoxy compound is a monomer of an oxy group, and the oxy group is more preferably a combination of two or more cyclized compounds. Usable examples include a polymer compound and a low molecular weight ether, glycerol diepoxide % oxypropyl hydrazine, ethylene glycol diglycidyl glycol digoxypropyl group, 2, polyglycerol poly propylene glycol (IV), Polyethyl epoxide propylene, sorbitol, propylene dimethacrylate, neopentyl alcohol polymer, 丨 2 / poly methoxy propyl ether, vinyl cyclohexene dioxy 3 4 : oxy: t a gas-based carboxylic acid ester, a bis(3 4 -epoxycyclohexanedicarboxylate, having an epoxy group, a propyloxy group, a methoxy group, a methoxy group, an epoxy group, etc. A well-known epoxy compound such as an anthracycline coupling agent, a cyclable resin or a two-shot epoxy resin, an oxy basic resin, an oxy-acid resin, and an isophthalic resin. Κ In the present invention, the total solid content of the active energy ray-reducing resin layer with respect to the resin layer is preferably 5 to 1% by mass of an active energy having an unsaturated double bond having a mass average molecular weight of 15,000 or more. The linear curable polymer compound contains 40% by mass or more of an active energy ray-curable polymer compound having an unsaturated double bond having a mass average molecular weight of 1,500 or more, and contains 8 for the total solid content of the resin layer. When the epoxy compound is more than 5% by mass, even if the conductive material precursor is not immediately peeled off from the conductive material precursor, the conductive material and the metal portion are separated, and the conductive material can be stabilized for a long time. It is more preferable to easily peel off such a conductive material. Moreover, it is more preferable to process the curved surface easily. 323512 13 201219204 = the total solid content of the living-hardening polymer compound having an unsaturated double bond having an average molecular weight of 15 or more with respect to the total solid content of the resin layer, ^ 3 having 5 〇 to 9 〇 mass % 'especially containing 60 to 70 quality%. Further, the emulsified hydrate is more preferably contained in an amount of from 1 Torr to 3 Å in terms of the total solid content of the resin layer: especially in the case of 3 and 15 to 25% by mass. By irradiating the conductive material with a small amount of the active energy ray and having the metal material and the easy-adhesion layer, the detachment can be more uniformly and easily peeled off. 1 JL 8g/米 '最宜为i The total solid content of the active energy ray-reducing resin layer of the conductive material precursor used in the present invention is preferably Q. lg / m 2 or more, and more preferably 0. 1 JL 8g / m 'optimally i Up to 5g/m2. The resin component contained in the active energy ray-reducing resin layer is preferably at least Q.2 g/m2 or more. The active energy ray-reducing resin layer of the conductive material precursor used in the present invention may contain an antistatic sword, a surfactant, a matting agent, a filler, a lubricant, and an ultraviolet absorber in addition to the above components. Wait. <Easy Adhesive Layer> The conductive material precursor used in the present invention has an easy-adhesion layer on the active energy ray-reducing-lowering resin layer. The easy-adhesion layer is preferably changed in shape by the method for producing the metal portion provided thereon. However, when the easy-to-adhere layer is provided, the active energy-line adhesion-reducing resin layer is not dissolved, and it is preferable to apply the water-based coating. The solution is applied. Hereinafter, the method of providing a metal portion on the easy-adhesion layer of the conductive material precursor in the present invention is preferably a method using a silver salt diffusion transfer method. First, a method of forming a preferred easy-adhesion layer and a metal portion for this method will be described. Further, the formation of the easy-adhesion layer and the metal portion is a silver salt expansion. In addition to the bulk transfer method, it is also preferable to use a screen printing method to print a conductive ink such as silver paste, or to form an electroless electric clock or the like. a method of forming a conductive layer made of a metal such as copper, or forming a conductive layer by vapor deposition or sputtering on an easy-adhesion layer, forming a photoresist film thereon, and performing exposure, development, etching, and removal of the photoresist layer. The method of obtaining the method or the like. The easy-adhesion layer should contain various polymer latexes. Among them, from the viewpoint of weather resistance, it is preferably an aqueous dispersion containing a polyester latex, an acrylic latex, and an amine phthalate latex, and further preferably an amine phthalate latex from the viewpoint of adhesion to various materials. Particularly preferred is a non-yellowing type amine phthalate polycarbonate latex having high weather resistance. The average particle size of the polymer latex is preferably from 0.01 to 0.3%, more preferably from 0.02 to 0.1/zm. Further, the polymer latex may be used by mixing a plurality of types of latex, but the polyester latex or the acrylic latex or the amine phthalate latex is preferably 30% by mass or more of the resin component in the easy-adhesion layer, more preferably 50% by mass or more. Further, the easy-adhesion layer preferably further contains a water-soluble polymer compound and an easy-adhesion layer which is crosslinked by a crosslinking agent. Examples of such a water-soluble polymer compound include polyacrylic acid, polypropylene decylamine, polyvinyl alcohol, polyvinylpyrrolidone, a copolymer of maleic anhydride and styrene, and the like, and examples thereof include gelatin and albumin. Proteins such as casein and polylysine, mucopolysaccharides such as carrageenan and hyaluronic acid, and the chemical reaction of polymers (Daheyuan believes in 1972, issued by Chemical Corporation). 6. Aminated cellulose, polyethyleneimine, polyallylamine, polydiallylamine, copolymer of allylamine and diallylamine, diallylamine and horse Copolymer of phthalic anhydride, copolymer of diallylamine and sulfur dioxide, 15 323512 201219204 copolymer, and the like. It is also preferred to use a protein among such water-soluble polymer compounds. The water-soluble polymer compound is preferably 60% by mass or less, more preferably 2 to 40% by mass, based on the resin component in the easy-adhesion layer. Further, when the amount of the resin component used in the easy-adhesion layer is 100 mg/m2 or more, no damage such as breakage occurs, and therefore, the upper limit is preferably 2,500 mg/m2. More preferably, it is 200 to 2000 mg/m2, and most preferably 300 to 1000 mg/m2. The crosslinking agent may also contain an inorganic compound such as chrome tanning, an aldehyde such as formaldehyde, glyoxal, malealdehyde or glutaraldehyde, an N-sulfenyl compound such as urea or ethylene urea, and a mucochloric acid. Acid), 2, 3-di-based-1,4-diastionic acid equivalent, 2, 4-dichloro-6-radio-s-three-till, or 2, 4- a compound having an active halogen of dihydroxy-6-chloro-three-till salt, divinyl sulfone, divinyl ketone, or N, N, N-tripropylene decyl hexahydrotrin, having two or more active members a compound of a vinylimine group having two or more epoxy groups in a molecule, such as sorbitol polyepoxypropyl ether or polyglycerol polyepoxypropyl ether, diglycerol polyepoxypropyl group Ether, glycerol polyepoxypropyl ether, polyethylene glycol diepoxypropyl ether, polypropylene glycol diglycidyl ether, etc., or other "chemical reactions of polymers" (Daheyuan believes in 1972, Chemistry A well-known polymer crosslinking agent such as a crosslinking agent described in Chapters 2.7, 5.2, and 9.3 of the company. Among them, a water-soluble crosslinking agent having two or more epoxy groups in the molecule or a vinyl-based crosslinking agent is preferred. The vinyl anthracene crosslinking agent is a compound having at least two vinylsulfonyl groups in the molecule, and is a compound represented by the following formula I or the following formula. 16 323512 201219204 R1 q|^2= CH—S〇2—L1—CON—S〇2—CH~ CH2

通式I 式中L1、L2係分別表示亦可存在或不存在之2價的連 結基。存在時,較佳係表示亦可經取代之碳數1至5的伸 烧基、伸芳基、胺曱酿基、胺續隨基氧、硫、亞胺基等, 此等係亦可組合。R1表示氫原子、亦可經取代之碳數1至 5的烷基、亦可經取代之苯、萘等芳基,其中宜為氫原子。In the formula I, L1 and L2 each represent a divalent linking group which may or may not be present. When present, it preferably represents a substituted alkyl group having 1 to 5 carbon atoms, an extended aryl group, an amine aryl group, an amine followed by a base oxygen, a sulfur, an imine group, etc., which may also be combined. . R1 represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms which may be substituted, and an aryl group such as benzene or naphthalene which may be substituted, and preferably a hydrogen atom.

(CH2=CHS〇2)mL(CH2=CHS〇2)mL

通式II 式中,L係至少具有一個經基之m價的基,m為2至4。 在通式Π中,L係可舉例如2至4價之碳數1至10的非環 狀烴基,含氮原子、氧原子及/或硫原子之5或6員的雜環 基,5或6員之環狀烴基、或碳數7至10之環伸烷基。非 環狀烴基宜為具有1至8之碳數的伸烷基。以L表示之各 別的基係亦可具有取代基,或亦可介由雜原子(例如氮原 子、氧原子及/或硫原子)、幾_基或碳酸胺基而相互地鍵結。 L係亦可經例如曱氧基、乙氧基等具有碳數1至4的1種 以上之烧氧基’或氯原子、漠原子等鹵原子,乙酿氧基等 取代。 將上述通式I的化合物之具體例表示於下,但不限定 於此等。 17 323512 201219204In the formulae, L is a group having at least one m-valent group via the group, and m is from 2 to 4. In the general formula, L is, for example, a 2- to 4-valent acyclic hydrocarbon group having 1 to 10 carbon atoms, a heterocyclic group having 5 or 6 members of a nitrogen atom, an oxygen atom and/or a sulfur atom, 5 or A cyclic hydrocarbon group of 6 members or a cyclic alkyl group having 7 to 10 carbon atoms. The acyclic hydrocarbon group is preferably an alkylene group having a carbon number of 1 to 8. Each of the groups represented by L may have a substituent or may be bonded to each other via a hetero atom (e.g., a nitrogen atom, an oxygen atom and/or a sulfur atom), a sulfhydryl group or an amine carbonate group. L-type may be substituted with one or more kinds of alkoxy groups having a carbon number of 1 to 4, such as a halogen atom or a halogen atom such as a chlorine atom or a desert atom. Specific examples of the compound of the above formula I are shown below, but are not limited thereto. 17 323512 201219204

(VS-1) (VS-2) (VS-3) (VS-4) (VS-5) (VS-6) (VS-7) 將上述通式II的化合物之具體例表示於下,但不限 定於此等。 18 323512 201219204(VS-1) (VS-2) (VS-3) (VS-4) (VS-5) (VS-6) (VS-7) Specific examples of the compound of the above formula II are shown below, but It is not limited to this. 18 323512 201219204

gh2= chso2ch2· ghch2so2ch= ch2 OH (VS8)Gh2= chso2ch2· ghch2so2ch= ch2 OH (VS8)

CH2= CHSO2GH2· GH- GHGH2S〇2CH= CH2 OH OH gh2= ghso2ch2· ghgh2- ghgh2so2gh= ch2 OH OH (VS9) (VS10)CH2= CHSO2GH2· GH- GHGH2S〇2CH= CH2 OH OH gh2= ghso2ch2· ghgh2- ghgh2so2gh= ch2 OH OH (VS9) (VS10)

CH2= CHSO2GH2· CH- CH2COCH2GHGH2S〇2CH= CH2 (vsil) OH OHCH2= CHSO2GH2· CH- CH2COCH2GHGH2S〇2CH= CH2 (vsil) OH OH

ch3 oh GH2= CHSO2CH2· CHCH2- C— CH2GHCH2S02CH= CH2 (VS12) OH CH2CHCH2S〇2CH=CH2 OHCh3 oh GH2= CHSO2CH2·CHCH2- C— CH2GHCH2S02CH= CH2 (VS12) OH CH2CHCH2S〇2CH=CH2 OH

GH2= GHSO2CH2· GHCH2O- GH2CHGH2S〇2GH= gh2 OH OH (VS13)GH2= GHSO2CH2· GHCH2O- GH2CHGH2S〇2GH= gh2 OH OH (VS13)

CH2= GHSO2CH2· CHGH2NH- CH2CHCH2S〇2GH= CH2 (V514) OH OHCH2= GHSO2CH2· CHGH2NH- CH2CHCH2S〇2GH= CH2 (V514) OH OH

CH2=CHS〇2CH2GH- OHCH2=CHS〇2CH2GH- OH

CHGH2S02CH=CH2 (VS15) OHCHGH2S02CH=CH2 (VS15) OH

GH2==GHS〇2CH2-GHGH2==GHS〇2CH2-GH

OH CHCH2S02CH-CH2OH CHCH2S02CH-CH2

OH (VS16) GH-CH2S02CH=CH2OH (VS16) GH-CH2S02CH=CH2

OH 易接著層之交聯劑的添加量相對於易接著層中之全 樹脂成分量宜為1至20質量%,更宜為3至15質量%。 19 323512 201219204 進步於易接著層可含有二氧化石夕等消光劑、滑劑、 顏料、染料、界面活,_、紫外線吸收劑等。 在本發明中於導電性材料前驅物之易接著層上設有金 屬巧方法’最佳的方法係使用㈣擴散轉印法時,宜於 中3有物理顯像核。物理顯像核係可藉由含有於 易接者層塗液,均勻地分布於易接著層中,亦可在易接著 層塗设後藉由塗佈含有物理顯像核之㈣液,而分布於盆 表面。 八 在本發明中使用的物理顯像核係可使用由重金屬或並 硫化物所構成之微粒子(粒子大小為丨至數十⑽左朴可 舉例如金、銀等之金屬膠體’混合有把、鋅等之水溶性鹽 與,化物的金屬硫化物等。易接著層中之物理顯像核的含 有量係就固形分適宜為〇.1至lOrng/m2左右。 〈多孔質易接著層〉 在本么明中於導電性材料前驅物的易接著層上設有金 屬部之方法係亦可使用以噴墨法㈣奈米銀油墨等導電性 ,墨的方法。此方法較佳的易接著層宜為由微粒子與樹脂 =劑所構成的多孔質易接著層。又,亦可具有由微粒子 ,、树脂黏合劑所構成的多孔質易 作為主成分的定著易接著層的二層所構二雜 粒+ ^ tn發明之?孔㈣接合層謂含有微粒子與相對於微 係質量%以下之樹脂黏合劑的層。所使用之微粒子 碳酸Γ 公知賴粒子。可舉例如輕質碳_、重質 弓、兔峻鎭、高壯、滑石、硫酸約、硫酸鋇、二氧 323512 20 201219204 化鈦、氧化辞、硫化辞、碳酸鋅、緞光白(satinwhit0、 矽酸鋁、矽藻土、矽酸鈣、矽酸鎂、非晶質合成二氣化矽、 膠體二氧化矽、氧化鋁、膠體氧化鋁、氧化鋁水合物、鋅 鋇白(lith〇P〇ne)、沸石、多水高嶺土(hydrated halloysite)、氫氧化鎂等無機微粒子,丙烯酸或甲基丙烯 酸系樹脂、氣化乙烯系樹脂、乙酸乙烯酯系樹脂、聚酯系 樹脂、苯乙烯/丙烯酸系樹脂、苯乙烯/丁二烯系樹脂、曰笨 乙烯/異戊二烯系樹脂、曱基丙烯酸曱酯/曱基丙烯酸丁酽 系樹脂、聚碳酸酯系樹脂、聚矽氧系樹脂、尿素樹脂、: 聚氰胺系樹脂、環氧系樹脂、酚系樹脂、二烯丙基酞酸= 系樹脂等之至少1種以上的樹脂所構成之真球狀或者不^ 型的無孔質或多孔質之有機微粒子等。當然,亦可混合^ 種以上上述無機微粒子與丨種以上有機微粒子而使用。上 述之中,從吸收性的觀點宜使用無機微粒子,更宜為駟質 碳酸舞、《碳_、碳_、高嶺土、滑石、非晶^合 成二氧化矽、氧化鋁、氧化鋁水合物,尤宜為非晶質合: 二氧切、氧化銘、氧化財合物,最宜使用氧化錯^合 物。此等無機微粒子之平均—次粒徑宜4 5G⑽以下,更宜 為3至4〇nm,無機微粒子之平均二次粒徑宜為5〇〇咖以且 下^更宜為20至300mn。氧化銘宜為氧化紹之1結晶的 γ氧化銘’其中宜為轉結晶。又,此處本發明所謂之平 均-次粒㈣藉微粒子之電子顯微鏡觀察以相等於存在於 一定面積MHHHH好各顺影面積之圓的餘作 為粒輕而求出平均粒徑者。又’平均二次粒徑係可以穿透 323512 21 201219204 型電子顯微鏡之照相攝影求出,但簡易地係使用雷射散射 式之粒度分布計(例如堀場製作所製,LA 910),可測定個 數中間徑。易接著層中之微粒子含量宜為〇. 5至2〇g/m2, 更宜為2至15g/m2。 可與構成多孔質易接著層之微粒子一起使用的樹脂 黏合劑,可舉例如聚乙烯醇、矽烷醇改質聚乙烯醇、矽基 改質聚乙稀醇等各種改質聚乙烯醇,氧化澱粉、 鍵化殿粉、 羧曱基纖維素、羥基乙基纖維素等纖維素衍生物,進一步 可舉例如酪蛋白、明膠、大豆蛋白等蛋白質’苯乙烯—丁二 稀共聚物、甲基丙_甲_〜丁二稀共聚物等共軛二稀系共 聚物乳膠’或以此等之各種聚合物的減等含有官能基的 單體所得到之官能基改質聚合物乳膠、三聚氰胺樹脂、尿 素樹脂等熱硬化合成樹脂系等之水性黏著劑,聚曱基丙稀 酸甲醋、聚胺甲義樹脂、不飽和聚輯脂、氯化乙烯-The amount of the crosslinking agent to be added to the OH-adhesive layer is preferably from 1 to 20% by mass, more preferably from 3 to 15% by mass, based on the total of the resin component in the easy-to-adhere layer. 19 323512 201219204 The progress of the easy-adhesive layer may include a matting agent such as a dioxide dioxide, a slip agent, a pigment, a dye, an interface, a UV absorber, and the like. In the present invention, a metal clever method is provided on the easy-adhesion layer of the conductive material precursor. The best method is to use the (4) diffusion transfer method, and it is preferable to have a physical image nucleus in the middle 3. The physical imaging nucleus can be uniformly distributed in the easy-adhesion layer by the coating liquid contained in the easy-contact layer, or can be distributed by coating the liquid containing the physical imaging nucleus after the easy-adhesion layer is applied. On the surface of the basin. 8. The physical development nucleus used in the present invention may use a microparticle composed of a heavy metal or a sulphide (a particle size of 丨 to several tens (10), and a metal colloid such as gold or silver may be mixed, a water-soluble salt such as zinc or a metal sulfide of the compound, etc. The content of the physical image nucleus in the easy-adhesion layer is preferably about 11 to lOrng/m2. <Porous easy-adhesion layer> In the present invention, a method of providing a metal portion on the easy-adhesion layer of the conductive material precursor may be a method using a conductive or ink such as an inkjet method (four) nano silver ink. It is preferably a porous easy-adhesive layer composed of fine particles and a resin=agent. Further, it may have a porous layer composed of fine particles and a resin binder, which is easily composed as a main component. The interparticle (4) bonding layer is a layer containing fine particles and a resin binder with respect to micro-mass or less by mass%. The microparticles of strontium carbonate used are known as the particles. For example, light carbon _, heavy Bow, rabbit, strong, strong, Talc, sulfuric acid, barium sulfate, dioxygen 323512 20 201219204 titanium, oxidation, sulfuric acid, zinc carbonate, satin white (satinwhit0, aluminum citrate, diatomaceous earth, calcium citrate, magnesium citrate, amorphous Synthesis of inorganic fine particles such as bismuth hydride, colloidal cerium oxide, alumina, colloidal alumina, alumina hydrate, lith〇P〇ne, zeolite, hydrated halloysite, magnesium hydroxide, etc. , acrylic or methacrylic resin, vaporized vinyl resin, vinyl acetate resin, polyester resin, styrene/acrylic resin, styrene/butadiene resin, styrene/isoprene Resin, decyl methacrylate/mercapto butyl acrylate resin, polycarbonate resin, polyoxyn resin, urea resin, melamine resin, epoxy resin, phenol resin, diene Propyl decanoic acid = true spherical or non-porous non-porous or porous organic fine particles composed of at least one resin such as a resin, etc. Of course, it is also possible to mix the above-mentioned inorganic fine particles and ruthenium Above organic particles In the above, it is preferable to use inorganic fine particles from the viewpoint of absorption, and it is more preferable to be an enamel carbonate dance, "carbon_, carbon_, kaolin, talc, amorphous" synthetic cerium oxide, aluminum oxide, aluminum oxide. The hydrate is particularly preferably amorphous: dioxane, oxidized, oxidized, and preferably oxidized. The average particle size of the inorganic particles is preferably 4 5G (10) or less, more preferably 3 to 4 〇 nm, the average secondary particle diameter of the inorganic fine particles is preferably 5 〇〇 以 下 下 下 下 下 更 。 。 。 。 。 。 。 。 。 。 氧化 氧化 氧化 氧化 氧化 氧化 氧化 氧化 氧化 氧化 氧化 氧化 氧化 氧化 氧化 氧化 氧化Further, here, the average-subgranular (four) microparticles of the present invention are observed by electron microscopy, and the average particle diameter is determined as the lightness of the circle equal to the area of the MHHH having a certain area of a certain area. In addition, the average secondary particle size can be obtained by photographing 323512 21 201219204 type electron microscope, but it is easy to use a laser scattering type particle size distribution meter (for example, LA 910, manufactured by Horiba, Ltd.). Intermediate diameter. The content of the fine particles in the easy-adhesion layer is preferably from 5 to 2 g/m2, more preferably from 2 to 15 g/m2. Examples of the resin binder which can be used together with the fine particles constituting the porous easy-adhesion layer include various modified polyvinyl alcohols such as polyvinyl alcohol, decyl alcohol-modified polyvinyl alcohol, and fluorenyl-modified polyethylene, and oxidized starch. Further, a cellulose derivative such as a phosphatide powder, a carboxymethyl cellulose or a hydroxyethyl cellulose, and a protein such as casein, gelatin or soy protein, a styrene-butadiene copolymer, methyl propyl _ Functionally modified polymer latex, melamine resin, urea obtained from a conjugated di-copolymer latex such as a dimethyl-butadiene copolymer or a functional group-containing monomer of such a polymer An aqueous adhesive such as a thermosetting synthetic resin such as a resin, polymethyl methacrylate, melamine, unsaturated polyester, and vinyl chloride -

範圍,尤宜為10至40質量%的範圍。The range is particularly preferably in the range of 10 to 40% by mass.

邑圍。樹脂黏合劑之塗佈量 2 323512 22 201219204 . 在本發明之多孔質易接著層係亦可一同使用上述樹 月曰黏合劑以及依需要之硬化劑。硬化劑之具體例係有曱酸、 戊一醛之酸系化合物,二乙醢、氣戊二酮之酮化合物,雙 (2-氯乙基)尿素、2-羥基—4, 6-二氯-1,3, 5-三畊、美國專 利第3288775號記載之具有反應性的自素之化合物、美國 專利第3635718號記載的具有反應性之烯烴的化合物、美 國專利第簡316號域之化合物、美國專利第 3103437號錢之異氰酸s旨類、美國專利第3{)1728〇號、 美國專利第2983611號記載之伸乙亞胺化合物類、美國專 利第3100704號§己載之幾二酿胺系化合物類、錢專利第 3⑽1537號記载之環氧化合物,如二錄二辦之二曙烧 =生物’、硼;ε)、蝴酸、爛酸鹽類之無機交聯劑等,可使此 1種或2種以上組合而使用。在本發财尤佳的硬化劑 =爛^则文、及爛酸鹽類^較佳之硬化劑的使用量無特 /限疋但相對於樹脂黏合劑,宜為質量%以下,更佳 係4〇質量%以下,尤佳係1至30質量%。 〈固定易接著層〉 口疋易接著層係65質量%以上為樹脂,較佳係別質 卢樹^ ’、更佳係9G f量%以上為樹脂。在樹脂中可 種水’奋性局分子化合物、各種有機溶劑可溶性 於^分子乳轉可藉㈣形成被歉樹脂。以樹 層成刀之固定易接著層係亦可形成於多孔質易接著 =緻费,固定易接著層可具有無數微細的孔。 ;固疋易接著層之水溶性高分子化合物係可廣泛 323512 23 201219204 .使用甲基纖維素、乙基纖維素、兩基纖維素等水溶性纖维 素類,膠、酸處理明膠、驗處理明膠、敵化明膠等明膠類, 聚乙烯醇、矽烷醇改質聚乙烯醇、二肉酮丙烯隨胺改質聚 乙稀醇等聚乙稀醇類,鹿角菜膠、阿拉伯膠等多_等。 使用之水溶性高分子化合物係可為i種類 以上而使用。水溶性高分子化合物之質量平均分子旦宜為 15_以上,更宜為5〇_以上。使用水溶性m合 物時係宜於含有金屬超微粒子之油墨或漿劑中含有水。 使用於固定易接著層之高分子乳膠係可廣泛選擇自分 散有丙稀酸樹脂、苯乙烯-丙烯酸樹脂 酸樹脂、乙酸乙稀醋樹脂、乙稀-乙酸乙_=乙^ 氣乙烯樹脂、聚烯烴樹脂、氯化聚烯烴樹脂、乙 烯醋-丙稀酸等多元樹脂,SBR、職、職、敌化sbr、叛 化腳、竣化臓、乙稀基t定樹脂、氣乙婦樹脂、偏氯乙 稀樹脂、胺曱酸酯樹脂、曱基丙烯酸樹脂、甲基丙烯酸甲 酯樹脂、環氧樹脂等以往公知的樹脂之乳液。 使用於固定易接著層之有機溶劑可溶性樹脂係可廣 泛使用上俯又落中§己載之乳液含有的樹脂。又,亦可使 用聚酉旨樹脂、聚乙晞縮酸樹脂、尼龍樹脂等。有機溶劑係 可廣泛使用乙醇、乙酸乙醋、曱基乙基酮、甲苯等可溶解 所使用之樹脂的溶劑。使用之有機溶劑可溶性樹脂係可使 用1種類亦可展合2種以上而使用。有機溶劑可溶性樹 脂之質量平均分子量宜為15〇〇〇以上。 如此地於©定易接著層係可使用各種種漏樹脂,但 24 323512 201219204 從使用之簡便性,宜為水溶性高分子化合物或高分子乳膠, 從密著性之觀點,水溶性高分子化合物更宜為聚乙烯醇類、 明膠類、多糖類,高分子乳膠更宜為丙烯酸樹脂、苯乙烯-丙烯酸樹脂、乙酸乙烯酯-丙烯酸樹脂、乙烯-氯乙烯樹脂 般,具有丙烯酸基或乙烯基作為單體單元之樹脂,具有胺 曱酸酯鍵結之胺曱酸酯樹脂。 此等水溶性高分子化合物、高分子乳膠及有機溶劑可 溶性樹脂中添加水、有機溶劑、依需要之均染劑、界面活 性劑等,調整作為以樹脂為主成分之固定易接著層的形成 用塗液。 固定易接著層之固形分塗布量宜為0.01至5g/m2,更 宜為0. 05至lg/m2,未達0. 01 g/m2時係有時金屬部之密 著性不充分,若超過5g/m2,有時降低多孔質易接著層之 油墨吸收性。 在本發明中使導電性材料前驅物之易接著層的上面設 有金屬部之方法,使用貼上銅箔等金屬箔,進一步於其上形 成光阻膜,曝光、顯像、蝕刻、除去光阻層而得到之方法時, 可使用公知之環氧接著劑、胺曱酸酯接著劑、紫外線硬化型 接著劑、EVA或丙烯酸等熱熔接著劑作為易接著層。 在本發明中使導電性材料前驅物之易接著層的上面形 成金屬部之方法係可使用:使用銀鹽感光材料之方法;使 用同方法,進一步對所得到之銀圖像實施無電解電鍍或電 解電鍍之方法;使用網版印刷法而印刷銀漿等導電性油墨 的方法;以喷墨法印刷銀油墨等導電性油墨的方法;以無 25 323512 201219204 電解電鍍等形成由辦金屬所構成的 於易接著層上以蒸鍍或濺料形成導電性法;或 光阻膜,曝光、顯像、_、除去光阻層=上形成 :上:_簿’進-步於其上形成光阻膜,::法: 像、_、除去光阻層而得到之方法等公知之方 宜為所製作之金屬部的厚度可薄化,進—步容易地中 成極微細的金屬部之銀歸 *易地形 散轉印法的金屬部之製作方法係可使用例如以日 2003-77350號公報所提出之方法等。 〈活性能量線照射步驟〉 本發明巾導電性材料係對導電性材料前驅物照射活 性犯置線’使活性能量線密著力降低型樹脂層交聯,降低 支樓體與活性能量線密著力降低型樹脂層之密著力,從支 1體剝離至少含有易接著層及金屬部而成之導電性材料來 製造。活性能量線係可使用可見光線、紫外線(uv)及電子 束(EB) ’但從安全性之觀點,宜為使用可見光或紫外線。 使用可見光線或紫外線時,光源係宜使用例如低壓水銀 ,、中壓水銀燈、高壓水銀燈、超高壓水銀燈、氙水銀燈、 氣^、錄燈、金屬鹵素燈、石英鹵素燈、鎢絲燈、紫外線 替朵於 山 且'乂弧燈、無電極微波方式紫外線燈等。活性能量 、線之照射係以免金屬部成為阻礙,宜從導電性材料前驅物 之支撐體側照射。較佳之照射光量係依光聚合起始劑、增 感知丨專而異’但為50至5000 mJ/cm2。又,活性能量線照 射後之制離步驟的剝離變容易,以免導電性材料前驅物之 26 323512 201219204 表面溫度成為100°C以上,較佳係以免成為60°C以上進行 曝光。進一步活性能量線之照射係亦可為後述之保護膜的 貼合步驟之前後任一者,但宜為保護膜之貼合步驟之前。 如前述般,藉本發明之活性能量線照射步驟,從導電 性材料前驅物剝離含有金屬部與易接著層之導電性材料時 的密著力產生變化。在本發明中,宜就180°剝離法活性能 量線照射後之支撐體與導電性材料之密著力為0. 5N/25mm 以下,更宜為0. 001至0. lN/25mm。又,活性能量線照射 前支撐體與導電性材料之密著力宜為超過0. 5N/25mm,更 宜為1 N/25mm以上。 〈剝離步驟〉 本發明係從照射過活性能量線之導電性材料前驅物 剝離含有易接著層及金屬部而成之導電性材料。藉此,本 發明之目的之一,可製作製造時剛性高、完成時僅剝離之 支撐體的剛性變低之導電性材料。 本發明之導電性材料係如前述般,從支撐體被剝離, 剛性相對地降低。因此,剝離時亦有時捲曲,或亦有時很 難操作。為防止此情形,於剝離之前,於導電性材料前驅 物之金屬部側貼合保護膜,導電性材料連同保護膜一起剝 離亦為較佳之態樣。保護膜可用,於由聚乙烯、聚丙烯、 聚氯乙烯等所構成的剛性低之支撐體上設有乙烯-乙酸乙 烯酯共聚物層或丙烯酸黏著劑層之市售者,但,貼合於導 電性材料前驅物時之密著力必須強於從導電性材料前驅物 之支撐體剝離含有金屬部與易接著層之導電性材料時的密 27 323512 201219204 考&quot;0另夕K,叫 膜。因 右岔著力太強,很難從導電性材料剝離保護 降低型佳之賴膜的密著力係依活性能量線密著力 仏層而變化,但較佳係宜選擇G屬至Q.,25丽 φ,耆者。此等較佳之保護膜的市售品之例係可舉例如 洋'、方、賫製之 pyien DCQ42,Sumiron 製之 E2G35、Ε203、 E〜C625^積水化學工業製之622Αχ、6哪等。保護膜之厚度 且為30至h , 者。為使保護膜貼合於導電性材料前驅 總A ^使用d積層或加溫積層等公知之積層法。尤其為 孟屬邛與易接著層等樹脂部分中的熱膨脹之影塑, 以60°c以下、宜以常溫進㈣層。 a 士貼=上述保護膜時,只要從支撐體將導電性材料連同 二,、起匐離,其後,從導電性材料剥離保護膜即可。保 °膜從導電性材料之剝離係亦可以饋紙(sheet-fed),又, 亦可以輥至輕方歧導電性材料繼㈣膜,亦可一邊捲 取導電性材料_邊剝離保護膜。保護膜從導電性材料之剝 =系例何使料著料岐導電性材料接著於被著體後 1 離保護膜等’或,亦可從導電性材料直接剝離保護膜。 (實施例) 將本,月之實施例表示於以下。又,記載中百分率只 要無特別聲明,即為質量基準。 (實施例1) 就支樓體而言,於帝人杜邦製單面易接著處理之商品 名TetoronHLY」(厚度1〇〇#mpET,全光線穿透率⑽, 單面易接著處m胃於切體之-面實錢水性處理,另一 323512 28 201219204 面為未處理)之未處理面製作並塗佈下述處方之活性能量 線遂、著力降低型樹脂層塗液1 ’以701乾燥5分鐘。測定 使活性能量線密著力降低型樹脂層形成之前與形成之後的 Tetoron HLY薄膜之厚度,算出活性能量線密著力降低型 樹脂層之厚度。將此結果表示於表1中。 〈活性能量線密著力降低型樹脂層塗液1處方/每lm2〉 商品名「Hitaloid 7975」(日立化成工業製丙烯酸丙 烯酸醋樹脂溶液。質量平均分子量5〇〇〇〇。固形分量)7. 9g 商品名「Irgacure 819」(Ciba-Geigy製光聚合起始 劑)0.29g 商品名「S-Lec KS1」(積水化學工業製聚乙烯縮醛。 質量平均分子量27000。Tg=107°C)0.8g 商品名「Denacol EX 512」(Nagase ChemteX 製環氧 交聯劑)0. lg 繼而’如下述般製作硫化鈀溶膠液。 〈硫化鈀溶膠之調製〉 A液 氯化把 5g 鹽酸 40ml 蒸鶴水 1000ml B液 硫化鈉 8. 6g 蒸鶴水 1000ml 一邊攪拌A液與B液一邊混合,30分鐘後經由離子交 換樹脂填充之管柱,得到硫化鈀溶膠。 繼而’依下述處方,製作易接著層塗液1,塗佈於活 29 323512 201219204 性能量線密著力降低型樹脂層之上,以5〇°C乾燥10分鐘。 乾燥後以50°C加熱處理24小時。 〈易接著層塗液1處方/每lm2〉 商品名「Hydran WLS 210」(DIC製聚碳酸酯系胺曱酸酯乳膠, 300mg 50rag lmg 9mg 4mg 0. 4mg 平均粒徑0. 05/zm,固形分) 明膠 商品名「Nonion OT 221」(曰油製非離子界面活性劑) 商品名「EX 313」(Nagase chemteX製環氧硬化劑) 商品名「Hymicron L271」(中京油脂製滑劑) 前述硫化鈀溶膠(硫化鈀) 使用商品名「Optelics C120」之共焦點顯微鏡 (Lasertec製)測定所得到之易接著層的厚度為〇.丨以瓜。 繼而,從接近於支撐體,依序以下述組成之中間層i、 鹵化銀乳劑層1、及最外層1之順序塗佈於上述易接著層 上。又’在與支撐體之活性能量線密著力降低型樹脂層側 的相反面塗佈背塗層1。鹵化銀乳劑係以照相用鹵化銀乳 劑之一般性雙喷射混合法製造。此S化銀乳劑係以氯化銀 95莫耳%與溴化銀5莫耳%調製成平均粒徑為〇· 15vm。於 如此做法所得到之函化銀乳劑,依常用方法,使用硫代硫 酸鈉與氣化金酸,實施金硫增感。如此做法所得到之齒化 銀乳劑係每lg銀含有〇. 5g之明膠。 〈中間層1組成/每lm2&gt; 明膠 0.5g 界面活性劑(S-1,具有下述化學式者) 5mg 30 323512 201219204 〈鹵化銀乳劑層1組成/每lm2&gt; 明膠 鹵化銀乳劑 相當於3. Og銀 1-苯基-5-氫硫基四唑 界面活性劑(S-1,具有下述化學式者) 〈最外層1組成/每lm2〉 明膠 不定形二氧化矽消光劑(平均粒徑3. 5 # m) 界面活性劑(S-1,具有下述化學式者) 〈背塗層1組成/每lm2〉 明膠 不定形二氧化矽消光劑(平均粒徑5// m) 染料1(具有下述化學式者) 界面活性劑(S-1,具有下述化學式者) 〇.5g 3mg 20rag lg lOmg lOmg 2g 20mg 200mg 400mg邑围. Coating amount of resin binder 2 323512 22 201219204 . In the porous easy-to-attach layer of the present invention, the above-mentioned tree ruthenium binder and a hardener as needed may be used together. Specific examples of the hardener are acid compounds of decanoic acid, glutaraldehyde, ketone compounds of diethyl hydrazine, gas pentanedione, bis(2-chloroethyl) urea, 2-hydroxy-4,6-dichloro -1,3,5-three-plowing, a reactive self-priming compound described in U.S. Patent No. 3,288,775, a compound having a reactive olefin as described in U.S. Patent No. 3,536,718, and a compound of the U.S. Patent No. 316 U.S. Patent No. 3,103,437, the disclosure of which is incorporated herein by reference in its entirety, U.S. Patent No. 3, the entire disclosure of U.S. Patent No. 3, s. An amine compound, and an epoxy compound described in Japanese Patent No. 3 (10) 1537, such as Erqi 2 of the second recording; bio-, boron; ε), an acid crosslinking agent of a caustic acid or a rotten acid salt, These may be used alone or in combination of two or more. The amount of the hardener used in the present invention is not particularly limited, but it is preferably less than or equal to the mass of the resin binder, and is preferably less than or equal to the mass of the resin binder. 〇% by mass or less, particularly preferably 1 to 30% by mass. <Fixed Easy Adhesive Layer> The resin is preferably a resin of 65 mass% or more, preferably a resin of a quality of more than 25% by weight. In the resin, a kind of water can be planted, and the various organic solvents are soluble in the molecular emulsion to form a repudiation resin. The fixed easy-to-layer layer formed by forming a tree layer can also be formed on the porous layer, and the fixed easy-to-attach layer can have numerous fine pores. The water-soluble polymer compound of the solid-adhesive layer can be widely used 323512 23 201219204. Water-soluble cellulose such as methyl cellulose, ethyl cellulose, and two-base cellulose, gelatin, acid-treated gelatin, and treatment Gelatin such as gelatin and enzymatic gelatin, polyvinyl alcohol, stanol modified polyvinyl alcohol, dibenzopyrene propylene with amine modified polyethylene glycol and other polyethylene glycols, carrageenan, gum arabic, etc. . The water-soluble polymer compound to be used may be used in an i type or more. The mass average molecular number of the water-soluble polymer compound is preferably 15 or more, more preferably 5 Å or more. When a water-soluble m compound is used, it is preferred to contain water in an ink or a slurry containing metal ultrafine particles. The polymer latex used in the fixed easy-adhesion layer can be widely selected and self-dispersed with acrylic resin, styrene-acrylic resin, ethyl acetate resin, ethylene-acetic acid, ethylene glycol, polyethylene Olefin resin, chlorinated polyolefin resin, ethylene vinegar-acrylic acid and other multi-resin, SBR, occupation, occupation, enemy sbr, rebel foot, bismuth bismuth, ethylene-based t-resin, gas ethoxy resin, partial An emulsion of a conventionally known resin such as a vinyl chloride resin, an amine phthalate resin, a mercapto acrylic resin, a methyl methacrylate resin, or an epoxy resin. The organic solvent-soluble resin used in the fixed easy-adhesion layer can widely use the resin contained in the emulsion contained in the upper and lower layers. Further, a polystyrene resin, a polyacetal resin, a nylon resin or the like can also be used. Organic solvent A solvent which can dissolve a resin to be used, such as ethanol, ethyl acetate, mercaptoethyl ketone or toluene, can be widely used. The organic solvent-soluble resin to be used may be used in one type or in combination of two or more types. The mass average molecular weight of the organic solvent-soluble resin is preferably 15 Å or more. In this way, various kinds of leaking resins can be used in the layer, but 24 323512 201219204 is easy to use, and is preferably a water-soluble polymer compound or a polymer latex, from the viewpoint of adhesion, a water-soluble polymer compound. More preferably polyvinyl alcohol, gelatin, polysaccharide, polymer latex is more preferably acrylic resin, styrene-acrylic resin, vinyl acetate-acrylic resin, ethylene-vinyl chloride resin, with acrylic or vinyl A monomer unit resin having an amine phthalate-bonded amine phthalate resin. To the water-soluble polymer compound, the polymer latex, and the organic solvent-soluble resin, water, an organic solvent, a leveling agent, a surfactant, and the like are added, and the like is adjusted to form a fixed adhesive layer containing a resin as a main component. Apply liquid. The solid content of the adhesive layer is preferably from 0.01 to 5 g/m2, more preferably from 0.05 to lg/m2, and less than 0.1 g/m2, sometimes the adhesion of the metal portion is insufficient. When it exceeds 5 g/m2, the ink absorbability of the porous easy-adhesion layer may be lowered. In the present invention, a metal portion is provided on the upper surface of the easy-adhesion layer of the conductive material precursor, and a metal foil such as a copper foil is attached, and a photoresist film is further formed thereon to expose, develop, etch, and remove light. In the case of a barrier layer, a known epoxy adhesive, an amine phthalate adhesive, an ultraviolet curable adhesive, a hot melt adhesive such as EVA or acrylic can be used as the easy-adhesion layer. In the present invention, a method of forming a metal portion on the upper layer of the conductive material precursor can be used: a method using a silver salt photosensitive material; using the same method, electroless plating is further performed on the obtained silver image or a method of electrolytic plating; a method of printing a conductive ink such as a silver paste by a screen printing method; a method of printing a conductive ink such as a silver ink by an inkjet method; and forming a metal consisting of a metal plating method without 25 323512 201219204 Conductive method is formed on the easy-adhesion layer by evaporation or sputtering; or photoresist film, exposure, development, _, removal of photoresist layer = upper formation: upper: _ book's step-by-step formation of photoresist Membrane::: Method: Image, _, method of removing the photoresist layer, etc. It is known that the thickness of the metal part to be produced can be thinned, and the silver of the extremely fine metal part can be easily obtained in the step-by-step manner. * The method for producing the metal portion of the easy-to-distribute transfer method can be, for example, a method proposed in Japanese Patent Publication No. 2003-77350. <Active Energy Ray Irradiation Step> The conductive material of the present invention irradiates the conductive material precursor with an active entanglement line to crosslink the active energy ray-reducing resin layer, thereby reducing the adhesion of the support body and the active energy ray. The adhesion of the resin layer is produced by peeling off a conductive material containing at least an easy-contact layer and a metal portion from the support. Visible light rays, ultraviolet rays (uv), and electron beams (EB) can be used as the active energy ray system. However, from the viewpoint of safety, it is preferred to use visible light or ultraviolet light. When using visible light or ultraviolet light, the light source should be used, for example, low-pressure mercury, medium-pressure mercury lamp, high-pressure mercury lamp, ultra-high pressure mercury lamp, mercury lamp, gas, recording lamp, metal halide lamp, quartz halogen lamp, tungsten lamp, ultraviolet light. It is in the mountains and has a 'Xenon arc lamp, an electrodeless microwave mode UV lamp, and the like. The irradiation of the active energy and the line is preferably prevented from being caused by the metal portion, and is preferably irradiated from the side of the support of the conductive material precursor. The amount of light to be irradiated is preferably from the photopolymerization initiator to the sensitization, but is 50 to 5000 mJ/cm2. Further, the peeling of the separation step after the irradiation of the active energy ray is facilitated so as not to cause the surface temperature of the conductive material precursor to be 100 ° C or higher, and it is preferable to prevent exposure to 60 ° C or higher. Further, the irradiation of the active energy ray may be either before or after the bonding step of the protective film described later, but it is preferably before the bonding step of the protective film. As described above, according to the active energy ray irradiation step of the present invention, the adhesion force when the conductive material containing the metal portion and the easy-adhesion layer is peeled off from the conductive material precursor changes. 001至0. lN/25毫米。 In the present invention, the adhesion between the support and the conductive material is preferably 0. 5N / 25mm or less, more preferably 0. 001 to 0. lN / 25mm. Further, the adhesion force between the support and the conductive material before the active energy ray irradiation is preferably more than 0.5 N / 25 mm, more preferably 1 N / 25 mm or more. <Peeling Step> In the present invention, the conductive material containing the easy-to-adhere layer and the metal portion is peeled off from the conductive material precursor irradiated with the active energy ray. Thus, in one of the objects of the present invention, it is possible to produce a conductive material which has high rigidity during production and which has a low rigidity when the support is peeled off. The conductive material of the present invention is peeled off from the support as described above, and the rigidity is relatively lowered. Therefore, it sometimes curls when peeled off, or sometimes it is difficult to handle. In order to prevent this, it is preferable to adhere the protective film to the metal portion side of the conductive material precursor before peeling off, and the conductive material is peeled off together with the protective film. A protective film may be used, and a commercially available one having an ethylene-vinyl acetate copolymer layer or an acrylic adhesive layer is provided on a support having low rigidity composed of polyethylene, polypropylene, polyvinyl chloride or the like, but is bonded to The adhesion of the conductive material precursor must be stronger than when the conductive material containing the metal portion and the easy-to-adhere layer is peeled off from the support of the conductive material precursor, and the film is called a film. Because the right squat is too strong, it is difficult to peel off from the conductive material. The adhesion of the good film is changed according to the active energy line adhesion layer, but it is better to choose G genus to Q. , the leader. Examples of the commercially available product of such a preferred protective film include, for example, pyien DCQ42 manufactured by Yokohama, K.K., and E2G35 manufactured by Sumiron, Ε203, E~C625, 622, and 650 manufactured by Sekisui Chemical Industry Co., Ltd. The thickness of the protective film is 30 to h. In order to bond the protective film to the conductive material precursor A, a well-known layering method such as a d-layer or a heating layer is used. In particular, it is a shadow of thermal expansion in a resin portion such as a genus genus and an easy-to-attach layer, and it is preferable to enter the (four) layer at a normal temperature of 60 ° C or less. a When the protective film is used, the conductive material may be removed from the support together with the second, and then the protective film may be peeled off from the conductive material. The peeling film of the film can also be sheet-fed from the conductive material, or it can be rolled to a light-discriminating conductive material in accordance with the (four) film, or the conductive material can be taken off while peeling off the protective film. The protective film is peeled off from the conductive material. For example, if the material is placed, the conductive material is attached to the protective film or the like, or the protective film can be directly peeled off from the conductive material. (Example) The examples of this and the month are shown below. Also, the percentage stated in the record is a quality basis only if there is no special statement. (Example 1) As for the branch body, the product name Tetoron HLY which is easy to be processed on the one side of the Teijin DuPont (thickness 1 〇〇 #mpET, total light transmittance (10), single-sided easy to follow m stomach The body-surface-effect water-based treatment, another unprocessed surface of 323512 28 201219204, which is untreated, was prepared and coated with the active energy enthalpy of the following prescription, and the reduced-reducing resin layer coating liquid 1 'dryed at 701 for 5 minutes. . The thickness of the active energy ray-reducing-reducing resin layer was calculated by measuring the thickness of the Tetoron HLY film before and after the formation of the active energy ray-reducing resin layer. This result is shown in Table 1. _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ Product name "Irgacure 819" (Ciba-Geigy photopolymerization initiator) 0.29g Trade name "S-Lec KS1" (Polyvinyl acetal manufactured by Sekisui Chemical Co., Ltd. Mass average molecular weight 27000. Tg = 107 °C) 0.8g Product name "Denacol EX 512" (Nagase ChemteX epoxy crosslinking agent) 0. lg Then 'a palladium sulfide sol solution was prepared as follows. <Preparation of palladium sulphide sol> A liquid chlorination 5 g hydrochloric acid 40 ml steamed crane water 1000 ml B liquid sodium sulfide 8. 6 g steamed crane water 1000 ml While stirring the liquid A and the B liquid, the column is filled with ion exchange resin after 30 minutes. A palladium sulfide sol is obtained. Then, the easy-adhesive layer coating liquid 1 was prepared by the following formulation, and was applied to a layer 29 of the performance-type line adhesion-reducing resin layer, and dried at 5 ° C for 10 minutes. After drying, it was heat-treated at 50 ° C for 24 hours. <Easy to apply layer 1 solution per lm2> Product name "Hydran WLS 210" (DIC polycarbonate amide phthalate latex, 300mg 50rag lmg 9mg 4mg 0. 4mg Average particle size 0. 05/zm, solid Product name "Nonion OT 221" (Non-ion OT 221) (trade name: "EX 313" (Nagase chemteX epoxy curing agent) Trade name "Hymicron L271" (Zhongjing Grease slip agent) Palladium Sol (Palladium Sulfide) The thickness of the easily-adhesive layer obtained by measuring a confocal microscope (manufactured by Lasertec) under the trade name "Optelics C120" was 〇. Then, from the vicinity of the support, the intermediate layer i having the following composition, the silver halide emulsion layer 1, and the outermost layer 1 are sequentially applied to the above-mentioned easy-adhesion layer. Further, the back coat layer 1 was applied on the side opposite to the side of the active energy ray-reducing resin layer of the support. The silver halide emulsion is produced by a general dual jet mixing process for photographic silver halide emulsions. The S-silver emulsion was prepared by a silver chloride 95 mol% and a silver bromide 5 mol% to have an average particle diameter of 〇·15 vm. The solubilized silver emulsion obtained in this manner is subjected to gold sulfur sensitization using sodium thiosulfate and gasified gold acid according to a usual method. The toothed silver emulsion obtained in this manner contains 〇. 5 g of gelatin per lg of silver. <intermediate layer 1 composition / per lm2> gelatin 0.5g surfactant (S-1, having the following chemical formula) 5mg 30 323512 201219204 <silver halide emulsion layer 1 composition / per lm2> gelatin silver halide emulsion equivalent to 3. Og Silver 1-phenyl-5-hydrothiotetrazole surfactant (S-1, with the following chemical formula) <outermost layer 1 composition per lm2> gelatin amorphous amorphous cerium oxide matting agent (average particle size 3. 5 # m) Surfactant (S-1, with the following chemical formula) <Backcoat 1 composition / per lm2> Gelatin amorphous cerium oxide matting agent (average particle size 5 / / m) Dye 1 (with The chemical formula) (S-1, having the following chemical formula) 〇.5g 3mg 20rag lg lOmg lOmg 2g 20mg 200mg 400mg

323512 201219204 繼而,以水銀燈作為光源之密著印刷機介由遮斷4〇〇抓 以下之光線的樹脂過濾膜’使具有細線寬2〇 a m且格子間 隔250 /zm之網目圖型部分與無圖案之部分的正型穿透原 稿(transparent manuscript)密著,以 2瓜j/cm2之曝光量 曝光。 其後,以15 C、90秒浸潰於下述組成之擴散轉印顯 像液中後,繼而’將鹵化銀乳劑層1、中間層丨、最外層工 及背塗層1以4(TC之溫水水洗除去後,乾燥處理而得到導 電性材料前驅物1。藉此,於易接著層上形成細線寬為2〇 且格子間隔為25〇ym之金屬部。使用商品名323512 201219204 Then, a close-packed printer with a mercury lamp as a light source, a resin filter film that intercepts the following light, and has a mesh pattern with a fine line width of 2 〇am and a grid spacing of 250 /zm and no pattern. The portion of the positive manuscript is densely exposed and exposed at an exposure of 2 meg j/cm 2 . Thereafter, after immersing in a diffusion transfer developing solution of the following composition at 15 C for 90 seconds, the silver halide emulsion layer 1, the intermediate layer, the outermost layer, and the back coat layer 1 were then subjected to 4 (TC). After the warm water was washed with water, it was dried to obtain a conductive material precursor 1. Thus, a metal portion having a fine line width of 2 Å and a lattice interval of 25 μm was formed on the easy-adhesion layer.

Ptelics C 120」之共焦點顯微鏡(Lasertec製)測定金 屬部之厚度為0. 1/zm。 〈擴散轉印顯像液組成〉 25g 18g 2g 80g 15g 1. 2g 虱氧化鉀 氫醌 卜笨基-3-吡唑琳酮 亞硫酸許 N-甲基乙醇胺 溴化却 使用將上述擴散轉印顯像液組成之全量加入於1000ml 之水中,以85質量%磷酸水溶液調整成pH=12. 2者。 a對於所得到之導電性材料前驅物1,就活性能量線照 射刖,離試驗而實施克拉克(Clark)剛性之測定與密著力 之測定。克拉克剛性係依JIS-P8143測定。密著力之測定 32 323512 201219204 係於導電性材料前驅物1之非金屬部(相當於前述正型穿 透原稿無圖案之部分,未形成金屬部之部分)貼合Nichiban 製車輛用Masking Tape No 241,切取成25mm寬,使用imada 製之商品名「IPT 200-5N」而以180。剝離法測定密著力。 又’以目視觀察何處產生剝離。結果表示於表1中。又, 在表1中金屬部和活性能量線密著力降低型樹脂層完全無 剝離時為〇,金屬部或活性能量線密著力降低型樹脂層可 看出少許剝離者為X。 曰從與所彳于到之導電性材料前驅物1的支樓體之活性能 量線密著力降低型樹脂層侧相反侧的面以高壓水銀燈8〇W/cm (盒燈)照射照射量綱mJ/cm2之活性能量線。繼而,於設 接著層與金屬部之面側貼合Sumir〇n⑻製之商品名 C 625」(厚60/zm之保護膜)。又’使此保護膜貼合於 金,量線照射前之活性能量線密著力降低型樹脂層的非 屬P(相w於别述正型穿透原稿無圖案之部分,未形成金 口^分),切取成25mm寬,使用Imada製之商品名「IPT 而以18(Γ剝離法測定密著力為〇 5ν。 述性能量線照射後之導電性材料前驅们,如下 认實施密著力之測定。結果麵於表卜 穿透2電性材料前驅物1之非金屬部(相當於前述正型 Ά無圖案之部分,未形成金屬部之部分)貼合 1C lban 製車輛用 Masking Tape No 寶,π &amp; iapeNo241’繼而切取成25mm 見使用Imada製之商品名「IFr?nn π 法、、目,|α20〇-5Ν」而以180〇剝離 d疋费者力。又,剝離時從活性 疋古〖生犯里線密者力降低型樹 323512 33 201219204 脂層剝離時為〇,在此以外之處剝離者為χ。 • 在與照射前述活性能量線之支撐體面相反侧的金屬部 面以及易接著層面貼合Sumiron (股)製之商品名「阢625」 (厚6〇vm之保§蔓膜)的導電性材料前驅物1之支撐體,從 該支樓體將含有金屬部與易接著層與活性能量線密著力降 低型樹脂層之導電性材料與保護膜一起剝離,得到導電性 材料1。從導電性材料1剝離保護膜,以厚度規(gauge) 測定其厚度後’金屬部之厚度為7. 2&quot;m,非金屬部之厚度 為 7. 1 y m。 依JIS-P8143測定如上述做法而得到之導電性材料1 的克拉克剛性。又,實施以下述之方法所進行的球面接著 試驗。結果表示於表1中。 〈球面接著試驗〉 使用 Henkel Japan(股)製之商品名「L〇ctiteU_30 FL」(胺曱酸酯接著劑)使導電性材料i貼合於外徑3〇〇mm ,2〇〇mm之丙烯酸製球,接著後經過分鐘後剝離商品名 、C 625」的保護膜。可得到無皺折、破裂等且導電性材 ,1有良好之剝離面者評估為〇,於導電性材料丨出現皺 斤或破裂者評估為X。 〇c又亦製作以高壓水銀燈照射活性能量線之前以50 性:溫1日之導電性材料前驅物1,對於此已加溫之導電 料Μ驅物卜以與未加溫之導電性材料前驅物i相同 剛柯法,照射活性能量線後’進行密著力之測定與克拉克 之測定與以180剝離法所得到之剝離的評估。結果表 34 323512 201219204 示於表1。 (實施例2) 使商品名「S-Lec KS10」(積水化學工業製平 酸樹脂,質量平均分子量17000 ’含有羥基25莫耳%)15g 溶解於二氧雜戊環烷(Di〇x〇lane)對甲基乙基_為^比丄 之溶劑85g’ 一邊以40°C攪拌一邊滴入商品名「KarA〇! (昭和電工製之異氰酸2-丙烯醯氧基乙酯)1〇g,以4{rc授 掉H、時。於所得到之樹脂溶液中加人乙基赛路蘇(et^1/z米。 The thickness of the metal portion of the Ptelics C 120" was measured by a laser. <Diffusion transfer imaging liquid composition> 25g 18g 2g 80g 15g 1. 2g 虱 虱 醌 醌 -3- 笨 笨 -3- -3- -3- -3- -3- -3- -3- -3- -3- -3- -3- N N N N N N N N N N N N N N N 2。 The total amount of the liquid composition was added to 1000ml of water, adjusted to a pH of 12. 2 with a 85% by mass aqueous phosphoric acid solution. a For the obtained conductive material precursor 1, the active energy ray was irradiated, and the measurement of Clark rigidity and the measurement of the adhesion were carried out from the test. The Clark rigidity was measured in accordance with JIS-P8143. Measurement of the adhesion force 32 323512 201219204 The non-metallic part of the conductive material precursor 1 (corresponding to the portion of the positive-type penetrating original that has no pattern and the portion where the metal portion is not formed) is attached to the Masking Tape No 241 for Nichiban vehicles. It is cut to a width of 25 mm, and the product name "IPT 200-5N" made by imada is used as 180. The peeling method measures the adhesion. Also, it was visually observed where peeling occurred. The results are shown in Table 1. Further, in Table 1, in the case where the metal portion and the active energy ray-reducing-reducing resin layer were not peeled off at all, the metal portion or the active energy ray-reducing resin layer was observed to have a slight peeling of X.曰 照射 曰 m m m m m m m m m m m m m m m m m m m m m m m m m m m m m m m m m m m m m m m m m m m m m m m m m m m m m Active energy line of /cm2. Then, a product name C 625" (protective film having a thickness of 60/zm) manufactured by Sumir〇n (8) was bonded to the surface side of the next layer and the metal portion. In addition, the protective film is bonded to gold, and the active energy ray-reducing force of the resin layer before the dose line irradiation is not P (phase w is not in the pattern of the positive-type penetrating original, and the gold mouth is not formed ^ Divided into 25 mm wide, and the product name "IPT" made by Imada was used, and the adhesion force was measured as 〇5 ν by the Γ peeling method. The precursors of the conductive materials after the illuminating energy lines were examined as follows. The result is a non-metallic part that penetrates the precursor of the two electrical materials (corresponding to the part of the positive type which has no pattern, and the part which does not form a metal part) is attached to the Masking Tape No of 1C lban vehicle. π &amp; iapeNo241' is then cut into 25mm. See the trade name "IFr?nn π method, mesh, |α20〇-5Ν" made by Imada, and the peeling effect is 180 〇. The ancient 〖 生 里 里 线 323 323 323 323 323 323 323 323 323 323 323 323 323 323 323 323 323 323 323 323 323 323 323 323 323 323 323 323 323 323 323 323 323 323 323 323 323 323 323 323 323 323 323 323 323 323 323 323 Easy to follow the brand name of Sumiron (share) a support of the conductive material precursor 1 of 阢625" (6 〇vm thick § vine film), from which the metal body and the easy-adhesion layer and the active energy ray-reducing resin layer are electrically conductive The material is peeled off together with the protective film to obtain the conductive material 1. The protective film is peeled off from the conductive material 1, and the thickness of the metal portion is 7. 2 &quot; m, the thickness of the non-metal portion after the thickness is measured by a gauge. 7. 1 ym The Clarke rigidity of the conductive material 1 obtained as described above was measured in accordance with JIS-P8143. Further, a spherical surface test was carried out by the following method. The results are shown in Table 1. <Spherical follow-up test 〉 Using the trade name “L〇ctiteU_30 FL” (amine phthalate adhesive) manufactured by Henkel Japan Co., Ltd., the conductive material i is bonded to an acrylic ball having an outer diameter of 3 mm and 2 mm. After a minute, the protective film of the product name and C 625" was peeled off, and a conductive material such as wrinkles, cracks, and the like was obtained, and one having a good peeling surface was evaluated as 〇, and the conductive material was creased or broken. The evaluation is X. 〇c is also made to be high Before the active mercury lamp is irradiated by the mercury lamp, the conductive material precursor 1 is heated to the temperature of 1 day, and the heated conductive material is driven by the same as the unheated conductive material precursor i. After the irradiation of the active energy ray, the measurement of the adhesion force and the measurement of Clark and the peeling obtained by the 180 peeling method were evaluated. The results are shown in Table 1. (Example 2) The product name "S-Lec" was obtained. KS10" (Shuishui Chemical Industry flat acid resin, mass average molecular weight 17000 'containing 25 % hydroxyl group) 15 g dissolved in dioxapentane (Di〇x〇lane) to methyl ethyl _ In the solvent 85g', the product name "KarA〇! (2-hydroxypropenyl isocyanate made by Showa Electric Co., Ltd.) was added dropwise at a temperature of 40 °C, and H was given at 4{rc. Adding ethyl celecoxib to the obtained resin solution (et^

Cell〇S〇lve),得到固形分濃度⑽之改質聚乙烯祕樹脂 溶液。 除了使用上述製作之改質聚乙烯祕樹脂溶液 Hitaloid 7975(使每lm2之塗佈固形分量為相同)以外,盆 餘係與實關1同樣做法’製作實施例2之導電性材二 駆物2,與實關1同樣地評估。結果表示於表i中\ = 活性能量線照射後之料力略高,剝離性稍降低,但得 與實施例1同樣之結果。 (比較例1) 除了使用商品名「UA 340P」(新中村化學工業製胺甲 酸醋丙烯酸醋寡聚物’質量平均分子量13〇〇〇)取代 Hitaloid 7975以外(使每lm2之塗佈固形分量為相同),其 餘係與實施例1同樣做法,製作比較例丨之導電性材料前 驅物,欲進行評估。但,照射活性能量線,貼合保護膜後, 欲從支撐體將含有金屬部與易接著層與活性能量線密著力 降低型樹脂層之導電性材料與保護膜—起剝離,但無法剝 323512 201219204 (比較例2) 在本比較例係表示克拉克剛性高之導電性材料無法 於曲面上形成微細的金屬部者。除了不塗佈活性能量線密 著力降低型樹脂層以外,其餘係與實施例丨同樣做法,製 作比I父例2之導電性材料前驅物,進行評估。又,對於球 面接著試驗係沒有活性能量線照射步驟與保護膜之貼合步 驟、保護膜之剝離步驟而於外徑3〇〇mm與2〇〇mm之丙烯酸 製球使用Henkel Japan製之商品名「LoctHe u-3〇FL」(胺 甲酸酯接著劑)’以貼合導電性材料之支撐體面與丙烯酸製 球之形式貼合。結果表示於表1。 (比較例3) 除了以使下述處方之物理顯像核塗液塗佈於活性能 量線密著力降低型樹脂層上取代設有實施例1之易接著 層以外,其餘係與實施例1同樣做法,製作比較例3之導 電性材料前驅物,欲進行評估。但在剝離步驟中,無法順 利制離導電性材料,而於中途導電性材料破裂。對於可評 估之項目係表示於表1中。 〈物理顯像核塗液1處方/每Irn2〉 商品名「Nonion OT221」(日油製非離子界面活性劑)lmg 實施例1所使用之硫化鈀溶膠(硫化鈀) Q 4呢 (實施例3) 在實施例1中,除了製作使用下述活性能量線密著力 降低型樹脂層塗液2取代活性能量線密著力降低型樹脂層 323512 36 201219204 塗液1以外,其餘係與實施例1同樣做法,製作實施例3 之導電性材料前驅物3,與實施例1同樣地進行評估。使 結果表示於表1中。 〈活性能量線密著力降低型樹脂層塗液2處方/每lm2〉 商品名「Hitaloid 7975」(日立化成工業製丙烯酸丙烯酸 醋樹脂溶液。質量平均分子量50000。固形分量)&amp; 〇8g 商品名「Irgacure819」(Ciba-Geigy製光聚合起始劑)〇. 23g 商品名「S-Lec KS1」(積水化學工業製聚乙烯縮醛。質量平 均分子量 27000。Tg=107°C) 〇. 91g 商品名「Denacol EX 512」(NagaseChemteX製環氧交聯劑) 1. 82g 商品名「San-aidSI-60L」(三新化學工業(股)製熱陽離子聚合 〇. 063g 起始劑) (實施例4) 在實施例1中,除了製作使用下述活性能量線密著力 降低型樹脂層塗液3取代活性能量線密著力降低型樹脂層 塗液1以外’其餘係與實施例1同樣做法,製作實施例4 之導電性材料前驅物4,與實施例1同樣地進行評估。使 結果表示於表1中。 〈活性能量線密著力降低型樹脂層塗液3處方/每lm2〉 商品名「Hitaloid 7975」(日立化成工業製丙烯酸丙烯酸酯樹 脂溶液。質量平均分子量50000。固形分量) n 2. 67〇 商品名「Irgacure 819」(Ciba-Geigy製光聚合起始劑)〇 商品名rS-Lec KS1」(積水化學工業製聚乙烯縮醛。質量平均g 323512 37 201219204 分子量 27〇〇〇。Tg=l〇7°C) 商品名「Denacol EX 512」 商品名「San-aidSI-60L」 起始劑) (實施例5) 0. 40g (Nagase ChemteX製環氧交聯劑) 0· 80g (二新化學工業(股)製熱陽離子聚合 0. 028g 與實施例2同樣做法而得到固形分濃度1〇%之改質聚 j縮駿樹脂溶液。除了使用所製作之改質聚乙烯縮膝樹 、乂取代Hitaloid 7975(使每1 m2之塗佈固形分量為相 同)以外,其餘係與實施例4同樣做法,製作實施例5之導 電丨生材料如驅物5,與實施例1同樣地評估。結果表示於 表1中。因活性能量線照射後之密著力略高,剝離性稍降 低’但得到與實施例4同樣之結果。 (比較例4) 除了使用商品名「UA 340P」(新中村化學工業(股)製 胺曱酸酯丙烯酸酯寡聚物,質量平均分子量13〇〇〇)取代 Hital〇ld 7975以外(使每丨y之塗佈固形分量為相同), 其餘係與實施例4同樣做法,製作比較例4之導電性材料 前驅物,欲進行評估。但,照射活性能量線,貼合保護膜 後’欲將含有金屬部與易接著層與活性能量線密著力降低 变樹脂層之導電性材料與保護膜一起剝離,但無法剝離。 (比較例5) 除了使用商品名「A-DPH」(新中村化學工業(股)製二 新戍四醇六丙烯酸酯’質量平均分子量578)取代Hital〇id 38 323512 201219204 7975以外(使每1 m2之塗佈固形分量為相同),其餘係與實 施例4同樣做法,製作比較例5之導電性材料前驅物,欲 進行評估。但,照射活性能量線,貼合保護膜後,欲剝離, 但無法剝離。 (實施例6) 除了製作使用下述活性能量線密著力降低型樹脂層塗 液4取代活性能量線密著力降低型樹脂層塗液3以外,其 餘係與貫施例4同樣做法’製作實施例6之導電性材料前 驅物6,與實施例1同樣地進行評估。使結果表示於表j 中〇 〈活性能量線密著力降低型樹脂層塗液4處方/每1 m2〉 商品名「Hitaloid 7975」(曰立化成工業製丙烯酸丙烯酸雖樹 脂溶液。質量平均分子量50000。固形分量) 2 商品名「Irgacure 819」(Ciba-Geigy製光聚合起始劑)〇. 1(^ 商品名「S-Lec KS1」(積水化學工業製聚乙烯縮醛。質量平均 分子量 27000。Tg=107 C) 〇 88g 商品名「Denacol EX 512」(Nagase ChemteX製環氧交聯劑) 〇· 32g 商品名「San-aidSI-60L」(三新化學工業(股)製熱陽離子聚人 起始劑) 〇.〇Ug (實施例Ό 除了製作使用下述活性能量線密著力降低型樹脂層塗 液5取代活性能量線密著力降低型樹脂層塗液3以外,其 餘係與實施例4同樣做法’製作實施例7之導電性材料前 323512 39 201219204 驅物7 ’與實施例1同樣地進行恥。使結果表示於表 中〇 〈活性能量線密著力降低型樹脂層塗液5處方/每… 商品名「HitalQid 7975」(日立化成卫業製丙烯酸丙烯酸西旨樹 脂溶液。質量平均分子量50000。固形分量) 2 商品名「irgacure 819」咖心如製光聚合起始劑)〇.· = 商品名「S-Lec KS1」(積水化學工業製聚乙稀縮酸。f量平均 分子量 27000。Tg=l〇7°C) Λ 0. 8〇g 商品名「Denacol EX 512」(Nagase ChemteX製環氧交聯劑) 0. 40g 業(股)製熱陽離子聚合 0. 014g 商品名「San-aidSI-60L」(三新化學工 起始劑) (實施例8) 除了製作使用下述活性能量線密著力降低型樹脂層塗 液6取代活性能量線密著力降低型樹脂層塗液3以外,其 餘係與實施例4同樣做法,製作實施例8之導電性材料前 驅物8,與實施例1同樣地進行評估。使結果表示於表i 中〇 〈活性能量線密著力降低型樹脂層塗液6處方/每lm2〉 商品名「Hitaloid 7975」(日立化成工#製丙烯酸丙烯酸酯樹 脂溶液。質量平均分子量50000。固形分量) 2 68g 商品名「Irgacure 819」(Ciba-Geigy製光聚合起始劑)〇. 1〇g 商品名「S-Lec KS1」(積水化學工業製聚乙烯縮醛。質量平均 0. 60g 分子量 27000。Tg=107°C) 323512 40 201219204 商品名「Denacol EX 512」(Nagase ChemteX製環氧交聯劑) 0. 60g 商品名「San-aidSI-6GL」(三新化學卫業(股)製熱陽離子聚人 起始劑) 0.021g (實施例9) 除了製作使用下述活性能量線密著力降低型樹脂層塗 液7取代活性能量線密著力降低型樹脂層塗液3以外,其 餘係與實施例4同樣做法,製作實施例9之導電性材料前 驅物9 ,與實施例1同樣地進行評估。使結果表示於表工 中。 〈活性能量線密著力降低型樹脂層塗液7處方/每lm2〉 商品名「Hitaloid 7975」(日立化成工業製丙烯酸丙烯酸酯樹 脂溶液。質量平均分子量5〇〇〇〇。固形分量) 、 Ίδτ 〇 〇7g 口口名「Irgacure 819」(Ciba-Geigy 製光聚合起始劑)〇 商品名「S-Lec KS1」(積水化學工業製聚乙烯縮醛。質量平g 分子量 27000。Tg=107t:) Λ = 龙 〇. 2〇g 商品名「Dermcol EX 512」(Nagase ChemteX製環氧交聯劑) 龙 1.0〇g 商品名「San-aidSI-60L」(三新化學工業(股)製熱陽離 起始劑) 1合 1ηλ °* 〇35g l貫施例10) δ 除了製作使用下述活性能量線密著力降低型樹脂層塗 液8取代活性能量線密著力降低型樹脂層塗液3以外,、 餘係與實施例4同樣做法,製作實施例1〇之導電性材料; 323512 41 201219204 驅物10,與貫施例1同樣地進行評估。使結果表示於表1 中〇 〈活性能量線密著力降低型樹脂層塗液8處方/每lm2〉 商品名「Hitaloid 7975」(日立化成卫業製丙烯酸丙稀酸醋樹 脂溶液。質量平均分子量50000。固形分量) 2.6〇g 商品名「Irgacure 819」光聚合起始劑)〇1〇g 商品名「S-Lec KS1」(積水化學工業製聚乙烯縮醛。質量平均 分子量 27000 °Tg=107°C) 〇 〇6g 商品名「Denacol EX 512」(Nagase ChemteX製環氧交聯劑) 1. 20g 商品名「San-aidSI-60L」(三新化學工業(股)製熱陽離子聚合 起始劑) 〇. 042g (實施例11) 除了製作使用下述活性能量線密著力降低型樹脂層塗 液9取代活性能量線密著力降低型樹脂層塗液3以外,其 餘係與實施例4同樣做法,製作實施例11之導電性材料前 驅物11,與實施例1同樣地進行評估。使結果表示於表i 中。 〈活性能量線密著力降低型樹脂層塗液9處方/每lm2〉 商品名「Hitaloid 7975」(日立化成工業製丙烯酸丙烯酸酯樹 脂溶液。質量平均分子量50000。固形分量) 2. 69g 商品名「Irgacure 819」(Ciba-Geigy製光聚合起始劑)〇. i〇g 商品名「S-Lec KS1」(積水化學工業製聚乙烯縮醛。質量平均 分子量 27000 °Tg=107°C) 〇.qs〇· 42 323512 201219204 商口口名 Denacol EX 512」(Nagase ChemteX 製環氣交聯劑) 0· 25g 商品名「San-aidSI-60L」(三新化學工業(股)製熱陽離子聚合 起始劑) 0.009g (實施例12) 除了製作使用下述活性能量線密著力降低型樹脂層塗 液10取代活性能量線密著力降低型樹脂層塗液3以外其 餘係與實施例4同樣做法,製作實施例12之導電性材料前 驅物12,與實施例1同樣地進行評估。使結果表示於表i 中。 〈活性能量線密著力降低型樹脂層塗液1〇處方/每lm2〉 商品名「Hitaloid 7975」(日立化成工業製丙烯酸丙烯酸酯樹 脂溶液。質量平均分子量50000。固形分量) 2 4〇g 商品名「Irgacure 819」(Ciba-Geigy製光聚合起始劑)〇. 10g 商品名「S-Lec KS1」(積水化學工業製聚乙婦縮酸。質量平均 分子量 27000 〇Tg=107°C) 〇 67g 商品名「Denacol EX 512」(Nagase ChemteX製環氧交聯劑) 〇.80g 商品名「San-aidSI-60L」(三新化學工業(股)製熱陽離子聚合Cell〇S〇lve), a modified polyethylene secret resin solution having a solid concentration (10) was obtained. In addition to using the modified polyethylene secret resin solution Hitaloid 7975 prepared above (so that the coating solid content per lm 2 is the same), the pot residue system is the same as that of the actual shutdown 1 'making the conductive material bismuth 2 of Example 2 It is evaluated in the same way as Shiguan. The results are shown in Table i, where the material strength after the irradiation of the active energy ray was slightly higher, and the peeling property was slightly lowered, but the same results as in Example 1 were obtained. (Comparative Example 1) The coating solid content per lm2 was changed except that the product name "UA 340P" (manufactured by Shin-Nakamura Chemical Industry Co., Ltd. urethane acrylate vinegar oligomer mass average molecular weight 13 〇〇〇) was used instead of Hitaloid 7975. The same procedure as in Example 1 was carried out to prepare a conductive material precursor of a comparative example, which was to be evaluated. However, after the protective energy is applied to the active energy ray, the conductive material containing the metal portion and the easy-to-adhere layer and the active energy ray-reducing resin layer is peeled off from the support, but the protective film cannot be peeled off. 201219204 (Comparative Example 2) In this comparative example, a conductive material having a high Clarke rigidity was not able to form a fine metal portion on a curved surface. The conductive material precursors of the parent example 2 were prepared and evaluated in the same manner as in the example except that the active energy ray-reducing resin layer was not applied. In addition, in the spherical surface test system, there is no bonding step of the active energy ray irradiation step and the protective film, and the peeling step of the protective film, and the acrylic ball having an outer diameter of 3 mm and 2 mm is used as a trade name of Henkel Japan. "LoctHe u-3〇FL" (urethane binder) is bonded to the acrylic ball by a support body surface to which a conductive material is bonded. The results are shown in Table 1. (Comparative Example 3) The same procedure as in Example 1 was carried out, except that the physical development core coating liquid of the following formulation was applied to the active energy ray-reducing-reducing resin layer instead of the easy-adhesion layer of Example 1. The precursor of the conductive material of Comparative Example 3 was prepared and evaluated. However, in the stripping step, the conductive material cannot be smoothly produced, and the conductive material is broken in the middle. The items that can be evaluated are shown in Table 1. <Physical development nuclear coating solution 1 per Irn2> Trade name "Nonion OT221" (Nippon oil nonionic surfactant) 1 mg The palladium sulfide sol (palladium sulfide) used in Example 1 Q 4 (Example 3 In the first embodiment, the same procedure as in the first embodiment was carried out except that the active energy ray-reducing resin layer coating liquid 2 was used instead of the active energy ray-reducing-reducing resin layer 323512 36 201219204 coating liquid 1 . The conductive material precursor 3 of Example 3 was produced and evaluated in the same manner as in Example 1. The results are shown in Table 1. <Active energy line adhesion reducing type resin layer coating liquid 2 prescription per lm2> Product name "Hitaloid 7975" (Hitachi Chemical Industry Acrylic Acrylic vinegar resin solution. Mass average molecular weight 50000. Solid content) &amp; 〇8g Trade name " Irgacure 819" (Ciba-Geigy photopolymerization initiator) 〇. 23g Trade name "S-Lec KS1" (Polyvinyl acetal manufactured by Sekisui Chemical Co., Ltd. Mass average molecular weight 27000. Tg = 107 °C) 〇. 91g Trade name "Denacol EX 512" (epoxy cross-linking agent manufactured by Nagase ChemteX) 1. 82g Trade name "San-aidSI-60L" (Sanshin Chemical Industry Co., Ltd. cation polymerization 〇. 063g initiator) (Example 4) In the first embodiment, the same procedure as in Example 1 was carried out except that the active energy ray-reducing-reducing resin layer coating liquid 3 was used instead of the active energy ray-reducing-reducing resin layer coating liquid 1. The conductive material precursor 4 of 4 was evaluated in the same manner as in Example 1. The results are shown in Table 1. <Active energy line adhesion reducing type resin layer coating liquid 3 prescription per lm2> Product name "Hitaloid 7975" (Hitachi Chemical Co., Ltd. acrylic acrylate resin solution. Mass average molecular weight 50000. Solid content) n 2. 67〇 Trade name "Irgacure 819" (Ciba-Geigy photopolymerization initiator) 〇 trade name rS-Lec KS1" (polyvinyl acetal produced by Sekisui Chemical Co., Ltd. mass average g 323512 37 201219204 molecular weight 27 〇〇〇. Tg = l〇7 °C) Trade name "Denacol EX 512" Trade name "San-aidSI-60L" starter) (Example 5) 0. 40g (Nagase ChemteX epoxy crosslinker) 0· 80g (Second Chemical Industry ( 0) g28g The same procedure as in Example 2 was carried out to obtain a modified poly-j resin solution having a solid concentration of 1% by weight. In addition to using the modified polyethylene stalked tree, 乂 replaced Hitaloid 7975 (The conductive solid material of Example 5 was produced in the same manner as in Example 4 except that the coating solid content per 1 m 2 was the same), and the same was evaluated in the same manner as in Example 1. The results are shown in the table. 1 in. after irradiation with active energy rays The adhesion was slightly higher, and the peeling property was slightly lowered'. However, the same results as in Example 4 were obtained. (Comparative Example 4) An amine phthalate acrylate oligomer was produced under the trade name "UA 340P" (New Nakamura Chemical Industry Co., Ltd.) The mass average molecular weight of 13 〇〇〇) was substituted for Hital 〇ld 7975 (the coating solid content per y was the same), and the conductive material precursor of Comparative Example 4 was prepared in the same manner as in Example 4. However, after the protective energy is applied to the active energy ray, the conductive material having the metal layer and the adhesive layer and the active energy ray adhesion-reducing resin layer is peeled off together with the protective film, but the peeling is not possible. (Comparative Example 5) Except for the use of the trade name "A-DPH" (manufactured by Shin-Nakamura Chemical Industry Co., Ltd.), the mass average molecular weight of 578 was substituted for Hital〇id 38 323512 201219204 7975 (for every 1 The coating solid content of m2 was the same), and the conductive material precursor of Comparative Example 5 was prepared in the same manner as in Example 4, and was evaluated. However, the active energy ray was irradiated and the protective film was attached. (Example 6) In addition to the production of the active energy ray-reducing-reducing resin layer coating liquid 4 in place of the active energy ray-reducing-resistance-reducing resin layer coating liquid 3, the following methods are used. In the same manner as in Example 4, the conductive material precursor 6 of Example 6 was produced and evaluated in the same manner as in Example 1. The results are shown in Table j. <Reactive energy ray-reducing-reducing resin layer coating liquid 4 prescription/per 1 m2〉 Product name "Hitaloid 7975" (Yinli Chemical Industry Acrylic Acrylic Resin Solution). The mass average molecular weight is 50,000. Solid product) 2 Product name "Irgacure 819" (Ciba-Geigy photopolymerization initiator) 〇. 1 (^ Product name "S-Lec KS1" (Polyvinyl acetal manufactured by Sekisui Chemical Co., Ltd.. Mass average molecular weight 27000. Tg =107 C) 〇88g Trade name "Denacol EX 512" (Nagase ChemteX epoxy cross-linking agent) 〇· 32g Trade name "San-aidSI-60L" (Sanshin Chemical Industry Co., Ltd.)剂 〇 g g g g g g g 实施 g g g g g g g g g g g g g g g g g g 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施'Preparation of the conductive material of Example 7 before 323512 39 201219204 Drive 7' was ashamed in the same manner as in Example 1. The results are shown in the table 活性 <Active energy line adhesion reducing type resin layer coating liquid 5 prescription / per... Product name "HitalQid 7975" (Hybrid acrylic acid acrylic resin solution manufactured by Hitachi Chemical Co., Ltd. Mass average molecular weight 50000. Solid content) 2 Product name "irgacure 819" Coffee core photopolymerization initiator) 〇.· = Trade name "S-Lec KS1" (Polyethylene acid produced by Sekisui Chemical Industry. The average molecular weight of f is 27,000. Tg = l〇7 °C) Λ 0. 8〇g Trade name "Denacol EX 512" (Nagase ChemteX epoxy crosslinker) 0. 40g (thermal) cationic polymerization 0. 014g trade name "San-aidSI-60L" (Sanshin Chemical Initiator) (Example 8) In addition to the production of the following active energy line adhesion reducing resin The conductive material precursor 8 of Example 8 was produced in the same manner as in Example 4 except that the layer coating liquid 6 was used instead of the active energy ray-reducing resin layer coating liquid 3, and evaluated in the same manner as in Example 1. The results are shown in Table i, <Reactive Energy Line Adhesion Reduced Resin Layer Coating Solution 6 per lm2> Product Name "Hitaloid 7975" (Hitachi Chemical Co., Ltd. Acrylic acrylate resin solution. Mass average molecular weight 50000. Solid content 2 68g Product name "Irgacure 819" (Ciba-Geigy photopolymerization initiator) 〇. 1〇g Trade name "S-Lec KS1" (Polyvinyl acetal produced by Sekisui Chemical Industry Co., Ltd. mass average 0. 60g Molecular weight 27000 Tg=107°C) 323512 40 201219204 Product name "Denacol EX 512" (Nagase ChemteX epoxy cross-linking agent) 0. 60g Trade name "San-aidSI-6GL" (Sanshin Chemical Industry Co., Ltd. thermo-cationic poly-starter) 0.021g ( [Example 9] Example 9 was produced in the same manner as in Example 4 except that the active energy ray-reducing-reducing resin layer coating liquid 7 was used instead of the active energy ray-reducing-reducing resin layer coating liquid 3. The conductive material precursor 9 was evaluated in the same manner as in Example 1. The results are represented in the table work. <Active energy line adhesion reducing resin layer coating solution 7 per lm2> Product name "Hitaloid 7975" (Hitachi Chemical Co., Ltd. acrylic acrylate resin solution. Mass average molecular weight 5 〇〇〇〇. Solid content), Ίδτ 〇 〇7g mouth name "Irgacure 819" (Ciba-Geigy luminescence polymerization initiator) 〇 trade name "S-Lec KS1" (polyethylene acetal produced by Sekisui Chemical Industry Co., Ltd. mass flat g molecular weight 27000. Tg = 107t:) Λ = 龙〇. 2〇g Product name "Dermcol EX 512" (Nagase ChemteX epoxy cross-linking agent) Long 1.0〇g Trade name "San-aidSI-60L" (Sanshin Chemical Industry Co., Ltd.) Initiator) 1 in 1 ηλ °* 〇35g l Example 10) δ In addition to the production of the active energy ray-reducing resin layer coating liquid 8 instead of the active energy ray-reducing resin layer coating liquid 3 In the same manner as in Example 4, the conductive material of Example 1 was produced; 323512 41 201219204 The drive 10 was evaluated in the same manner as in Example 1. The results are shown in Table 1. 活性<Active energy line adhesion reducing resin layer coating solution 8 per lm2> Product name "Hitaloid 7975" (Hitachi Chemical Industry Co., Ltd. Acryl acrylate resin solution. Mass average molecular weight 50000 2.6〇g Product name "Irgacure 819" photopolymerization initiator) 〇1〇g Trade name "S-Lec KS1" (Polyvinyl acetal produced by Sekisui Chemical Co., Ltd.. Mass average molecular weight 27000 °Tg=107° C) 〇〇6g Product name "Denacol EX 512" (Nagase ChemteX epoxy cross-linking agent) 1. 20g Trade name "San-aidSI-60L" (Sanshin Chemical Industry Co., Ltd. thermo-cationic polymerization initiator) 2. 042g (Example 11) The same procedure as in Example 4 was carried out except that the active energy ray-reducing-reducing resin layer coating liquid 9 was used instead of the active energy ray-reducing-reducing resin layer coating liquid 3. The conductive material precursor 11 of Example 11 was evaluated in the same manner as in Example 1. The results are shown in Table i. <Active energy line adhesion reducing resin layer coating solution 9 per lm2> Product name "Hitaloid 7975" (Hitachi Chemical Co., Ltd. acrylic acrylate resin solution. Mass average molecular weight 50000. Solid content) 2. 69g Product name "Irgacure 819" (Ciba-Geigy photopolymerization initiator) 〇. i〇g trade name "S-Lec KS1" (polyvinyl acetal produced by Sekisui Chemical Co., Ltd. mass average molecular weight 27000 °Tg = 107 °C) 〇.qs 〇· 42 323512 201219204 Trade name: Denacol EX 512" (Nagase ChemteX ring gas cross-linking agent) 0· 25g Trade name "San-aidSI-60L" (Sanshin Chemical Industry Co., Ltd.) Thermal cationic polymerization initiator (9) In the same manner as in Example 4 except that the active energy ray-reducing-reducing resin layer coating liquid 10 was used instead of the active energy ray-reducing-reducing resin layer coating liquid 3, the production was carried out in the same manner as in Example 4. The conductive material precursor 12 of Example 12 was evaluated in the same manner as in Example 1. The results are shown in Table i. <Active energy line adhesion reducing resin layer coating solution 1 / per lm2> Product name "Hitaloid 7975" (Hitachi Chemical Co., Ltd. acrylic acrylate resin solution. Mass average molecular weight 50000. Solid content) 2 4〇g Trade name "Irgacure 819" (Ciba-Geigy photopolymerization initiator) 〇. 10g Trade name "S-Lec KS1" (Polysulfate acid produced by Sekisui Chemical Industry Co., Ltd. mass average molecular weight 27000 〇Tg=107°C) 〇67g Product name "Denacol EX 512" (Nagase ChemteX epoxy cross-linking agent) 〇.80g Trade name "San-aidSI-60L" (Sanshin Chemical Industry Co., Ltd.) Thermal cationic polymerization

起始劑) 0. 028gQ (實施例13) 除了製作使用下述活性能量線密著力降低型樹脂層塗 液11取代活性能量線密著力降低型樹脂層塗液3以外,其 餘係與實施例4同樣做法’製作實施例13之導電性材料前 323512 43 201219204 驅物13,與實_丨同樣地崎評估。使結絲示於^ 中〇 〈活性能量線密著力降低型樹脂層塗液η處方/每lm2〉 商品名「Hitaloid 7975」(日立化成工業製丙烯酸丙烯酸醋樹 脂溶液。質量平均分子量50000。固形分量) 2 〇〇§ 商品名「Irgacure 819」(Ciba-Geigy製光聚合起始劑)〇. 1〇g 商品名「S-Lec KS1」(積水化學工業製聚乙烯縮醛。質量平均 分子量 27000。Tg=107°C) ! Λ7 1· 07g 商品名「Denacol EX 512」(Nagase ChemteX製環氧交聯劑) 0.80g 商品名「San-aidSI-60L」(三新化學工業(股)製熱陽離子聚合 0. 028g 起始劑) (實施例14) 除了製作使用下述活性能量線密著力降低型樹脂層塗 液12取代活性能量線密著力降低型樹脂層塗液3以外,其 餘係與實施例4同樣做法’製作實施例μ之導電性材料前 驅物14 ’與實施例1同樣地進行評估。使結果表示於表i 中。 〈活性能量線密著力降低型樹脂層塗液12處方/每lm2〉 商品名「Hitaloid 7975」(日立化成工業製丙烯酸丙稀酸醋樹 脂溶液。質量平均分子量50000。固形分量) i 6()g 商品名「Irgacure 819」(Ciba-Geigy製光聚合起始劑)〇1〇g 商品名「S-Lec KS1」(積水化學工業製聚乙稀縮酸。質量平均 1.47g 分子量 27000。Tg=107°C) 323512 44 201219204 商品名「Denacol EX 512」(Nagase ChemteX製環氧交聯劑) 0. 80g 商品名「San-aidSI-60L」(三新化學工業(股)製熱陽離子聚合 起始劑) (實施例15) 0.028g 除了製作使用下述活性能量線密著力降低型樹脂層塗 液13取代活性能量線密著力降低型樹脂層塗液3以外其 餘係與實施例4同樣做法’製作實施例15之導電性材料前 驅物15,與實施例1同樣地進行評估。使結果表示於表1 中。 〈活性能量線密著力降低型樹脂層塗液13處方/每lm2〉 商品名「Hitaloid 7975」(日立化成工業製丙烯酸丙烯酸酯樹 脂溶液。質量平均分子量50000。固形分量) 丨57g 商品名「Irgacure 819」(Ciba-Geigy製光聚合起始劑)〇 1〇g 商品名「S-Lec KS1」(積水化學工業製聚乙烯縮醛。質量平均 分子量 27000 °Tg=107°C) 2 〇〇g 商品名「Denacol EX 512」(Nagase ChemteX製環氧交聯劑) 〇. 8〇g 商品名「San-aidSI-60L」(三新化學工業(股)製熱陽離子聚合 〇. 〇28g 起始劑) (實施例16) 除了製作使用下述活性能量線密著力降低型樹脂層塗 液14取代活性能量線密著力降低型樹脂層塗液3以外,其 餘係與實施例4同樣做法,製作實施例16之導電性材料前 45 323512 201219204 驅物16 ’與實施例1同樣地進行評估。使结果矣— 中。 、衣Μ表1 〈活性能量線密著力降低型樹脂層塗液14處方/每i 2 商品名「Hitaloid 7975」(日立化成工業製丙烯酸丙烯萨 脂溶液。質量平均分子量50000。固形分量) 商品名「Irgacure 819」(Ciba-Geigy製光聚合起始劑)〇’g 商品名「S-Lec KS1」(積水化學工業製聚乙烯縮醛。質量平1〇g 〇. 40g 分子量 27000。Tg=107t) 均 商品名「Denacol EX 512」(Nagase ChemteX製環氧交聯劑) 〇· 8lg (實施例17 ) 於水中添加硝酸(2· 5份)與氧化鋁水合物(平均一次 粒控15nm) ’使用鋸齒狀刀片(biade)型分散機’得到固形 分濃度30質量%之無機微粒子分散液。分散於無機微粒子 刀政液中之氧化鋁水合物的平均二次粒徑為16〇nm。使用 此無機微粒子分散液,製作下述組成之多孔質易接著層塗 液2。 〈多孔質易接著層塗液2〉 無機微粒子分散液(氧化鋁水合物固形分) 1〇〇g 聚乙烯醇 12g (皂化度88% ’平均聚合度3500,分子量約150000)硼酸 0. 5g 非離子性界面活性劑(聚氧乙烯烧基醚) 〇.3g 以水調整成固形分濃度為16質量%。 46 323512 201219204 與實施例1同樣做法,於支撐體上以與實施例j相 同的I塗佈活性能量線密著力降低型樹脂層塗液丨,於其 上使多孔質易接著層塗液2就氧化鋁水合物之固形分而言 成為7. 5g/m之方式使用滑珠(slide bead)方式進行塗佈, 藉乾燥機乾燥。形成於支撐體上之多孔質層的厚度為約1〇 ,使用水銀測孔儀(mercury p〇r〇simeter)所測定之空 隙容量為5. 75ml/m2。 工 於2公升之不銹鋼燒杯中加入質量平均分子量為約 30000之燒焙糊精(日澱化學製之商品名「Dextrin No.卜 54. 4g與純水860g,攪拌約30分鐘。其後,加入硝酸銀」 131. 8g,進一步攪拌約3〇分鐘,使之完全溶解。於此液中 添加使氫氧化鉀60. 9g溶解於純水83· 9g之液,以攪拌旋 轉數40〇rPm之狀態實施還原反應6〇分鐘。如此做法而= 原反應結束之銀超微粒子分散液以乙酸調整至pH=5 6後, 添加商品名「Bi0zyme F10S D」之酵素(天野Enzy贴製) 200mg而以45。(:攪拌1小時,使殘留之糊精低分子化,得 到7質$%之銀超微粒子分散液。然後,就所得到之銀超微 粒子分散液的精製步驟而言,實施離心分離,使銀超微粒 子與上清液分離乾淨,廢棄上清液。使所殘留之銀超微粒 子再分散,重複實施離心分離,廢棄上清液。其後,加入 純水而再分散,得到銀濃度為47.2質量%之銀超微粒子分 散液 l(110g) 〇 取銀超微粒子分散液l(3g),添加活性劑(泰光油脂化 學工業製之商品名「Taip〇1 NLES_227」)〇. 〇ig、作為聚人 323512 47 201219204 物乳膠之第1工業製藥製的商品名「Superflex 15〇HS」(聚 胺曱酸酯乳膠’平均粒徑0. 11 # m,固形分38質量%)〇· 64g、 氯化鈉濃度為2質量%的水溶液142§,以純水進行濃度調 整,得到銀》辰度為20質量%、聚合物乳膠固形分濃度為3. 43 質量%、水溶性齒化物之質量莫耳濃度為〇 〇9〇 m〇1/kg之 含有銀超微粒子的組成物。 如前述般’於形成有多孔質易接著層之支撐體上,積 層(lanunate)厚15# m之乾膜光阻劑(旭化成製之商品名 「SUNFORT系列SPG」)’進-步,以水銀燈作為光源之密 著印刷機不介由遮斷400nm以下之光線的樹脂過遽膜,而 使細線寬20 &quot; m且格子間隔250 _之網目圖型負型穿透原 稿雄著以100mJ/cm2之曝光量進行曝光,於加。^之工質 量%碳酸鈉水麵中—邊搖動-邊顯像40秒。 子之二!型化之乾膜光阻上使用線棒,將含有銀超微粒 。(:佈成銀之厚度在乾燥後成為G.2輝,以12( J =0匕鐘。其後’藉由以噴灑器吹出4吖之3㈣ =電液’剝離並除去乾膜光阻,水洗,乾燥,製 作導電性材料前驅物17。 做法而件到之導電性材料前驅物Π與實施例1同 而以厂果表示於表1。X,與實補1同樣做 而从度規測疋導電性材料 非金屬部為17.1_。 厚度金屬4為 323512 48 201219204 【表1】Starting agent) 0. 028gQ (Example 13) The same procedure as in Example 4 except that the active energy ray-reducing-reducing resin layer coating liquid 11 was used instead of the active energy ray-reducing-reducing resin layer coating liquid 3 In the same way, the conductive material of Example 13 was fabricated before 323512 43 201219204, and 13 was evaluated in the same manner as the real 丨. The knot is shown in the middle of the 〇 <Active energy line adhesion reducing resin layer coating solution η prescription per lm2> Product name "Hitaloid 7975" (Hitachi Chemical Industry Acrylic Acrylic vinegar resin solution. Mass average molecular weight 50000. Solid content 2 〇〇§ Trade name "Irgacure 819" (Ciba-Geigy photopolymerization initiator) 〇. 1〇g Trade name "S-Lec KS1" (Polyvinyl acetal manufactured by Sekisui Chemical Co., Ltd.) Mass average molecular weight 27,000. Tg=107°C) ! Λ7 1· 07g Product name "Denacol EX 512" (Nagase ChemteX epoxy cross-linking agent) 0.80g Trade name "San-aidSI-60L" (Sanshin Chemical Industry Co., Ltd.) Polymerization 0. 028 g of the initiator (Example 14) The following examples and examples were carried out except that the active energy ray-reducing resin layer coating liquid 12 was used instead of the active energy ray-reducing resin layer coating liquid 3; 4 In the same manner, the conductive material precursor 14' of the example μ was produced and evaluated in the same manner as in the first embodiment. The results are shown in Table i. <Active energy line adhesion reducing type resin layer coating liquid 12 prescription per lm2> Product name "Hitaloid 7975" (Hitachi Chemical Industry Acrylic Acrylic Acetate Resin Solution. Mass average molecular weight 50000. Solid content) i 6()g Product name "Irgacure 819" (Ciba-Geigy photopolymerization initiator) 〇1〇g Trade name "S-Lec KS1" (Shoushui Chemical Industry Polyethylene succinic acid. Mass average 1.47g Molecular weight 27000. Tg=107 °C) 323512 44 201219204 Trade name "Denacol EX 512" (Nagase ChemteX epoxy crosslinker) 0. 80g Trade name "San-aidSI-60L" (Sanshin Chemical Industry Co., Ltd.) Thermal cationic polymerization initiator (Example 15) 0.028 g In the same manner as in Example 4 except that the active energy ray-reducing-reducing resin layer coating liquid 13 was used instead of the active energy ray-reducing-reducing resin layer coating liquid 3, the production was carried out. The conductive material precursor 15 of Example 15 was evaluated in the same manner as in Example 1. The results are shown in Table 1. <Reactive energy line adhesion reducing resin layer coating liquid 13 prescription per lm2> Product name "Hitaloid 7975" (Hitachi Chemical Co., Ltd. acrylic acrylate resin solution. Mass average molecular weight 50000. Solid content) 丨57g Trade name "Irgacure 819 (Ciba-Geigy photopolymerization initiator) 〇1〇g Trade name "S-Lec KS1" (Polyvinyl acetal manufactured by Sekisui Chemical Co., Ltd. Mass average molecular weight 27000 °Tg = 107 °C) 2 〇〇g "Denacol EX 512" (Nagase ChemteX epoxy cross-linking agent) 〇. 8〇g Trade name "San-aidSI-60L" (Sanshin Chemical Industry Co., Ltd. cation polymerization 〇. 〇28g initiator) (Example 16) Example 16 was produced in the same manner as in Example 4 except that the active energy ray-reducing-reducing resin layer coating liquid 14 was used instead of the active energy ray-reducing-reducing resin layer coating liquid 4. The conductive material was evaluated in the same manner as in Example 1 in the first 45 323512 201219204. Make the result 矣 - in.衣 Μ 〈 〈 〈 〈 〈 〈 〈 〈 〈 〈 〈 〈 〈 〈 〈 〈 〈 〈 〈 〈 〈 〈 〈 〈 〈 〈 〈 〈 〈 〈 〈 〈 〈 〈 〈 〈 〈 "Irgacure 819" (Ciba-Geigy photopolymerization initiator) 〇'g trade name "S-Lec KS1" (Polyvinyl acetal produced by Sekisui Chemical Co., Ltd.. Quality flat 1〇g 〇. 40g Molecular weight 27000. Tg=107t ) Product name "Denacol EX 512" (epoxy cross-linking agent manufactured by Nagase ChemteX) 〇·8lg (Example 17) Nitric acid (2.5 parts) and alumina hydrate (average primary particle size 15nm) were added to water. An inorganic fine particle dispersion having a solid concentration of 30% by mass was obtained using a zea-type disperser. The average secondary particle diameter of the alumina hydrate dispersed in the inorganic fine particle knife solution was 16 〇 nm. Using the inorganic fine particle dispersion liquid, a porous easy-adhesive layer coating liquid 2 having the following composition was produced. _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ The ionic surfactant (polyoxyethylene alkyl ether) 〇.3g was adjusted to a solid content concentration of 16% by mass with water. 46 323512 201219204 In the same manner as in the first embodiment, the active energy ray-reducing resin layer coating liquid enamel is applied to the support in the same I as in the example j, and the porous easy-adhesion layer coating liquid 2 is applied thereon. The solid content of the alumina hydrate was 7. 5 g/m, and it was coated by a slide bead method, and dried by a dryer. The thickness of the porous layer formed on the support is about 1 Torr, and the gap capacity measured by a mercury poometer is 5.75 ml/m2. A 2 liter stainless steel beaker was added with a burnt-boiled dextrin having a mass average molecular weight of about 30,000 (the product name "Dextrin No. Bu. 4g and pure water 860g manufactured by Nityo Chemical Co., Ltd., stirred for about 30 minutes. Thereafter, The silver nitrate "131. 8g" was further stirred for about 3 minutes, and it was completely dissolved. The solution was prepared by dissolving 60. 9 g of potassium hydroxide in a solution of pure water 83. 9 g, and stirring the number of rotations of 40 〇 rPm. The reduction reaction was carried out for 6 minutes. In this way, the silver ultrafine particle dispersion of the original reaction was adjusted to pH = 5 6 with acetic acid, and then 200 mg of the enzyme "Bi0zyme F10S D" (manufactured by Amano Enzy) was added to 45. (: stirring for 1 hour to lower the residual dextrin to obtain a silvery ultrafine particle dispersion of 7 mass%. Then, in the purification step of the obtained silver ultrafine particle dispersion, centrifugation is performed to make silver The ultrafine particles are separated from the supernatant, the supernatant is discarded, the remaining silver ultrafine particles are redispersed, the centrifugation is repeated, and the supernatant is discarded. Thereafter, pure water is added and redispersed to obtain a silver concentration of 47.2. % of silver super Particle dispersion l (110g) Extract silver ultrafine particle dispersion l (3g), add active agent (trade name "Taip〇1 NLES_227" made by Taiguang Oil Chemical Industry Co., Ltd.) 〇. 〇ig, as a 323512 47 201219204 Latex's first industrial pharmaceutical product name "Superflex 15〇HS" (polyamine phthalate latex 'average particle size 0. 11 # m, solid content 38% by mass) 〇 · 64g, sodium chloride concentration 2 mass The % aqueous solution 142 § is adjusted with pure water to obtain a silver "20% by mass", a polymer latex solid content concentration of 3.43% by mass, and a water-soluble tooth mass of a molar concentration of 〇〇9〇. a composition containing silver ultrafine particles of m〇1/kg. As described above, a dry film photoresist having a thickness of 15# m is laminated on a support having a porous easy-to-attach layer (product of Asahi Kasei) The name "SUNFORT series SPG" is a step-by-step process in which a close-packed printer with a mercury lamp as a light source does not block the resin film of light below 400 nm, and the thin line width is 20 &quot; m and the grid spacing is 250 _ The mesh type negative type penetrates the manuscript with a exposure of 100mJ/cm2 The exposure is carried out, and the mass of the sodium carbonate is in the surface of the water. The side is shaken and the side is imaged for 40 seconds. The second is used on the dry film photoresist, which will contain silver ultrafine particles. : The thickness of the cloth into silver becomes G.2 after drying, with 12 (J = 0 匕 clock. Thereafter, by spraying 4 吖 3 (4) = electro-hydraulic with a sprayer, peeling off and removing the dry film photoresist, washing with water Drying, making a conductive material precursor 17. The conductive material precursor Π is the same as in Example 1 and is shown in Table 1. X, which is the same as the actual compensation 1. The non-metallic part of the conductive material is 17.1_. Thickness metal 4 is 323512 48 201219204 [Table 1]

球面接著試驗 2 ΟΟπιη X X X 〇 〇 〇 〇 〇 〇 〇 X 〇 〇 〇 X 〇 X I X I I I 3 0 0_ 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 o 〇 I X I I I 名si P蝤 克拉克剛性 (αη3/1〇〇) 1 I 0) 〇 0) d 0) d CD 6 〇) 6 0) 6 σ&gt; 6 0) o I 0) 6 0) 6 O) o I σ&gt; 6 I I \ I I I 剝離 X X 〇 〇 〇 O 〇 〇 〇 〇 X 〇 〇 〇 X O X X I I X X 密著力; (N/25im); _I 無法剝離 無法剝離 τ- Ο 6 CO o d r- 〇 d 10 6 CO 6 0, 03 CO o d 10 o 6 無法剝離 CO o 6 CO 6 寸 6 無法剝離 LO 6 無法剥離 無法剝離 I 無法剝離 無法剝離 活性能量線照射後 剝離試驗 克拉克剛性 (cni3/1〇〇) 0) 〇 Ο) 6 Ο) 6 σ&gt; 6 〇) o 0) o σ&gt; 6 O) 6 φ o σ&gt; 6 Ο) 6 σ&gt; 6 0) 6 ο 6 σ&gt; 6 σ&gt; o &lt;M 寸 eg I 66. 45 I I 制離 〇 0 〇 〇 〇 〇 〇 〇 〇 O 〇 〇 〇 〇 〇 〇 〇 X X X X X 密著力 (N/25mn) CO 〇 6 | 0. 05 I τ- Ο ό CO o 6 to 〇 d ΙΩ O OJ d CO o d CO o d 1 0.05 I in 6 CO 〇 d CJ 6 6 ιο d τ- Ο ω ο d 無法剝離 無法剥離 f不能測定I 無法剝離 無法剝離 活性能量線照射前 剝離試驗 剝離 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 ο 〇 〇 〇 〇 o 〇 〇 密著力 (N/2&amp;nm) 寸 CSI 寸 寸 oi 寸 CsJ 寸 oi 寸 oi oi 寸 (NJ 寸 CSJ 寸 OJ cvi &lt;N 寸 CSJ csi 守 csi OJ 00 寸 CM csi eg (Μ CSI 克拉克剛性 (anVIOO) | 66. 45 | in 呀 ω (0 to 呀 ω CO | 66. 45 I | 66. 45 | | 66. 45 | | 66. 45 | in 寸 CO CO 6 6. 45 | 66. 45 1 m 寸 (d CO 10 寸 CO (D in 寸 CD CD in 守 CD CO 66. 45 I 66. 45 I ΙΩ 寸 CO in 寸 &lt;0 CD I 66. 45 | 66. 45 I I 66. 45 I in 寸 CO to 柳 ^ 璀绰 E 5 Ύ— f— 卜’ 产 CO OJ CO CSJ CO ca CO CSJ CO CO &lt;N CO CSJ CO CSJ CO W CO OJ CO CD CO (M CO r~ 〆 τ- 〇 r~ CsJ CO OJ CO 導電性 材料 |實施例1 | |實施例2 I I實施例3 |實施例4 |實施例5 | |實施例6 1 |實施例7 |實施例8 | |實施例9 1 |實施例1 〇 | |實施例1 1 |實施例1 2 I |實施例1 3 1 |實施例1 4 I |實施例1 5 |實施例1 6 I I實施例1 7 I 1 I \〇Mm2 I I imm3 I \mm^ i I I 49 323512 201219204 (實施例18) 就實施例i之易接著層塗液處方而言,除了依據 易接著層塗液3處方而製作易接著層塗液,塗佈以外,與 實施例1同樣地得到導電性材料後,得到们所示之與實 施例1同樣的結果。 〜π 〈易接著層塗液3處方/每im2〉 酯系胺甲酸賴乳 3〇〇mg 商品名「HydraiiWLS210」(DIC製聚碳酸 膠,平均粒控〇.〇5#m,固形分) 明膠 5〇mg 油製非離子界面活性劑) 商品名「Nonion 0T 221」(日 lmg 1 〇mg 4mg 〇· 4mg 商品名「VS-3」(富士寫真Film製硬化劑) 商品名「Hymicron L27i」(中京油脂製滑劑) 於實施例1使用之硫化鈀溶膠(硫化鈀) (實施例19) 於10公升之不銹鋼燒杯中加入質量平均分子量為約 15000之燒培糊精(日澱化學(股)製之商品名「^伽議 3」272g與純水4300g,攪拌約3〇分鐘並溶解。其後,加 入確酸銀659g, 半約30分鐘,使之溶解。使此液在冰口 浴中冷卻至約5°C ’添加使氩氧化鉀304. 5g溶解於純水 419. 5g之1(TC的液,在冰浴中一邊授拌一邊進行丄小時之 還原反應。於所得到之溶液添加乙酸,調整至pH=5.6後, 添加商品名「BiQzyme削S D」之酵素(天野㈣呢(股) 製)lg而以1小時。然後,將所得到之銀超微粒 323512 50 201219204 •.子分散液藉離心分離法精製後,加入純水以使銀濃度成為 45質量純得到再分散而成之銀超微粒子分散液2(糊☆ 所含有之銀超微粒子之平均粒徑為2Gnm,收率為繼。 〈含有銀超微粒子之組成物2的製作〉 取銀超微粒子分散液2(200g),再加入聚合物乳膠之 二洋化成工業(股)製之商品名「u⑽t uws_l45」(聚胺甲 酸酉曰礼膠,平均粒徑G.G2^m,固形分35質量,進 步’加入界面活性劑、純水、乙二醇得到銀濃度抑 質量%,表面張力3_/m,黏度之含有銀超微粒 子之組成物2。 —於實施例4所製作之導電性材料前驅物的活性能量線 也著力降低型樹脂層上,使含有銀超微粒子之組成物^藉 柔版印刷而印刷成線寬5 M m,、線間隔5 〇 M m之網目狀3, =溫風乾燥後,浸潰於8(rc之3N_氯化鈉水溶液如秒,進 订水洗、賴,於額緣部分形絲膜。在此印刷步驟之間, 在活性能量線密著力降低型樹脂層係無黏著性,故印刷時 不產生困擾。此後,與實施例4同樣地,從與導電性材料 #驅物之活性月b里線密著力降低型樹脂層相反側照射高壓 水銀燈,剝離導電性材料前驅物之活性能量線密著力降低 型樹脂層。即使此剝離步驟,亦無任何問題,可剝離。 (比較例6) 使丙烯酸丁酯90質量份、丙烯酸10質量份及偶氮雙 異丁腈0.2質量份溶解於乙酸乙酯3〇〇質量份,氮氣環境 下,加熱至80°C而進行共聚合,合成具有羧酸基之丙烯酸 323512 51 201219204 聚合物溶液。其次,於所得到之具有竣酸 物溶液中添加甲基丙婦酸環氧丙基醋5質内埽酉夂b °c’而使丙騎聚合物中之麟基與甲基㈣ 酉曰之壞氧丙基反應,得到具有鏡基與甲基叫酸基之二 :酸聚合物溶液'然後於所得到之具有_基與甲:丙烯 酸基之丙烯酸聚合物溶液中添加二異氰酸二 份朴(2,基乙氧基)苯基(2韻| .5質里 份,調製黏著劑溶液。 質里 使上述所得到之黏著劑溶液塗佈於與實施例4使用 者相同之支撐體上,以7(Γ(:乾# 力消失型黏著薄膜。Cl^5^,製作紫外線黏著 ==例19同樣地’欲於紫外線黏著力消失型黏著 ttn 微粒子之組成物2藉柔版印刷而印刷成 隔___目狀’但黏著層貼在柔版 (7刷板上,無法順利印刷。 有· 之結果明顯可知’純於切體上至少依序具 的二二Γ均分子量為15_以上之具有不飽和雙鍵 的活k讀魏料分子化合物之活 ==、易接著層、金屬部的導電性材二,從 等而可=前驅物剝離導電性材料時不會產生破損 電性㈣’使從如此之導電性材料前驅物剝離之導 =料面對球面而貼合時亦不會出現敏折等,而可容易 【圖式簡單說明】 323512 52 201219204 益 Μ»、 【主要元件符號說明】Spherical test 2 ΟΟπιη XXX 〇〇〇〇〇〇〇X 〇〇〇X 〇XIXIII 3 0 0_ 〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇o 〇IXIII Name si P蝤 Clark rigid (αη3/ 1〇〇) 1 I 0) 〇0) d 0) d CD 6 〇) 6 0) 6 σ&gt; 6 0) o I 0) 6 0) 6 O) o I σ> 6 II \ III Stripping XX 〇〇 〇O 〇〇〇〇X 〇〇〇XOXXIIXX adhesion; (N/25im); _I cannot be peeled off and cannot be peeled off τ- Ο 6 CO od r- 〇d 10 6 CO 6 0, 03 CO od 10 o 6 Cannot peel off CO o 6 CO 6 inch 6 can not be peeled off LO 6 can not be peeled off can not be peeled I can not be peeled off can not be peeled off active energy line after peeling test Clarke rigidity (cni3/1〇〇) 0) 〇Ο) 6 Ο) 6 σ> 6 〇) o 0) o σ&gt; 6 O) 6 φ o σ&gt; 6 Ο) 6 σ&gt; 6 0) 6 ο 6 σ&gt; 6 σ&gt; o &lt;M inch eg I 66. 45 II system 〇0 〇〇〇〇〇 〇〇O 〇〇〇〇〇〇〇XXXXX Tightness (N/25mn) CO 〇6 | 0. 05 I τ- Ο ό CO o 6 to 〇d ΙΩ O OJ d CO od CO od 1 0.05 I in 6 CO〇d CJ 6 6 ιο d τ- Ο ω ο d can not be peeled off, can not be peeled, f cannot be measured, I cannot peel, can not be peeled off, active energy ray, before peeling, peeling test, peeling 〇〇〇〇〇〇〇〇〇〇〇〇〇〇ο 〇〇 〇〇o 〇〇 着 (N/2&amp;nm) inch CSI inch oi inch CsJ inch oi inch oi oi inch (NJ inch CSJ inch OJ cvi &lt;N inch CSJ csi 守 csi OJ 00 inch CM csi eg (Μ CSI Clarke rigidity (anVIOO) | 66. 45 | in 呀ω (0 to 呀ω CO | 66. 45 I | 66. 45 | | 66. 45 | | 66. 45 | in inch CO CO 6 6. 45 | 45 1 m inch (d CO 10 inch CO (D in inch CD CD in CD CD 66. 45 I 66. 45 I Ι Ω inch CO in inch &lt; 0 CD I 66. 45 | 66. 45 II 66. 45 I In inch CO to 柳^ 璀绰E 5 Ύ— f— 卜 ' CO OJ CO CSJ CO ca CO CSJ CO CO &lt;N CO CSJ CO CSJ CO W CO OJ CO CD CO (M CO r~ 〆τ- 〇 r~ CsJ CO OJ CO Conductive Material|Example 1 | |Example 2 II Example 3 |Example 4 |Example 5 | |Example 6 1 |Example 7 |Example 8 | |Example 9 1 |Example 1 〇| |Example 1 1 |Example 1 2 I | Example 1 3 1 |Example 1 4 I |Example 1 5 |Example 1 6 II Example 1 7 I 1 I \〇Mm2 II imm3 I \mm^ i II 49 323512 201219204 (Example 18) In the example of the easy-to-adhesive layer coating solution of Example i, an easy-to-layer coating liquid was prepared in accordance with the formulation of the easy-adhesion layer coating liquid 3, and a conductive material was obtained in the same manner as in Example 1 except for coating. The same results as in Example 1. ~π 〈easy layer coating solution 3 per im2> ester urethane forage 3 〇〇mg trade name "HydraiiWLS210" (DIC polycarbonate, average particle size 〇.〇5#m, solid) gelatin 5〇mg oil nonionic surfactant) Product name "Nonion 0T 221" (day lmg 1 〇mg 4mg 〇 · 4mg Product name "VS-3" (Fuji photo film hardener) Product name "Hymicron L27i" ( Zhongjing Grease slipper) Palladium sulphide sol (palladium sulfide) used in Example 1 (Example 19) A burnt dextrin having a mass average molecular weight of about 15,000 was added to a 10 liter stainless steel beaker (Nitto Chemical Co., Ltd.) The product name "^加议3" 272g and 4300g of pure water were stirred for about 3 minutes and dissolved. Thereafter, 659g of silver acid was added and dissolved for half a minute for about 30 minutes. This solution was made in an ice bath. Cooling to about 5 ° C 'Addition of potassium argon oxide 30. 5g dissolved in pure water 419. 5g of 1 (TC liquid, while stirring in an ice bath, carry out a reduction reaction of 丄 hours. Add the solution obtained Acetic acid, adjusted to pH=5.6, add the enzyme name "BiQzyme SD" (Tianye (4) Then, lg is used for 1 hour. Then, the obtained silver ultrafine particles 323512 50 201219204 • The sub-dispersion is refined by centrifugal separation, and then pure water is added to make the silver concentration 45 mass pure to be redispersed. The silver ultrafine particle dispersion 2 (the average particle diameter of the silver ultrafine particles contained in the paste ☆ is 2Gnm, and the yield is continued. <Preparation of the composition 2 containing silver ultrafine particles> Take the silver ultrafine particle dispersion 2 ( 200g), the product name "u(10)t uws_l45" manufactured by Eryang Chemical Industry Co., Ltd. (polymerized by polyurethane, average particle size G.G2^m, solid content 35 mass, progress' added Surfactant, pure water, ethylene glycol, silver concentration, mass %, surface tension 3_ / m, viscosity of silver ultrafine particles containing composition 2 - active energy of the conductive material precursor prepared in Example 4 The line also focuses on reducing the resin layer, so that the composition containing the silver ultrafine particles is printed by flexographic printing to a line width of 5 M m, and a line spacing of 5 〇M m in the form of a mesh 3, = warm air drying, dipping Crushed to 8 (rc 3N_ sodium chloride aqueous solution as a second, into In the printing process, the active energy ray-reducing resin layer has no adhesiveness between the printing steps, so that no trouble occurs during printing. Then, in the same manner as in the fourth embodiment, The high-pressure mercury lamp is irradiated from the side opposite to the linear adhesion-reducing resin layer of the active material b of the conductive material #, and the active energy ray-reducing resin layer of the conductive material precursor is peeled off. Even in this peeling step, there is no Any problems can be stripped. (Comparative Example 6) 90 parts by mass of butyl acrylate, 10 parts by mass of acrylic acid, and 0.2 part by mass of azobisisobutyronitrile were dissolved in 3 parts by mass of ethyl acetate, and heated to 80 ° C under a nitrogen atmosphere to carry out a total of Polymerization, synthesis of acrylic acid 323512 51 201219204 polymer solution having a carboxylic acid group. Next, in the obtained citrate solution, methyl acetoacetate epoxy propyl vinegar is added to the internal solvent 埽酉夂b °c' to make the cyano group and the methyl group (tetra) in the polymer. The oxypropyl group reacts to obtain a solution having a mirror base and a methyl group as an acid group: an acid polymer solution, and then adding two parts of diisocyanate to the obtained acrylic polymer solution having a base group and an acrylic acid group. Peach (2, ethoxylated) phenyl (2 rhyme | . 5 mascara, to prepare an adhesive solution. The above-obtained adhesive solution was applied to the same support as the user of Example 4. , by 7 (Γ (: dry # force-disappearing adhesive film. Cl ^ 5 ^, making UV adhesion == Example 19 similarly - want to UV offset adhesion type adhesion ttn microparticle composition 2 by flexographic printing It is separated into ___ eyes-shaped but the adhesive layer is attached to the flexo plate (7 brush plate, it can not be printed smoothly. The result of the · clearly shows that the pure molecular weight of the diterpene of at least the order of the cut body is 15_ The above activity of the active k-reading molecular compound having an unsaturated double bond ==, easy adhesion layer, conductive material of the metal part If the precursor is peeled off from the conductive material, no damage is generated. (4) 'When the conductive material is peeled off from the conductive material precursor, the material does not appear to be sensitive when folded. And it can be easily [simple description] 323512 52 201219204 益Μ», [Main component symbol description]

Claims (1)

201219204 七、申請專利範圍: 1. 一種導電性材料前驅物,其係於支撐體上至少依序具 有:含有質量平均分子量為15000以上之具有不飽和雙 鍵的活性能量線硬化性高分子化合物之活性能量線密. 著力降低型樹脂層、易接著層、金屬部。 2. 如申請專利範圍第1項所述之導電性材料前驅物,其 中’前述活性能量線密著力降低型樹脂層相對於該樹脂 層的全固形分含有40質量%以上之質量平均分子量為 15〇〇〇以上之具有不飽和雙鍵的活性能量線硬化性高 分子化合物,且相對於該樹脂層的全固形分含有8質量 %以上之環氧化合物。 3. 如申請專利範圍第1項或第2項所述之導電性材料前驅 物’其中,前述活性能量線密著力降低型樹脂層進一步 含有熱陽離子聚合起始劑。 4. 如申請專利範圍第1項至第3項中任一項所述之導電性 材料前驅物,其中,相對於前述活性能量線密著力降低 型樹脂層的全固形分,含有50至90質量%之質量平均 分子量為15000以上之具有不飽和雙鍵的活性能量線 硬化性高分子化合物。 5. 如申請專利範圍第1項至第4項中任一項所述之導電性 材料前驅物,其中,相對於前述活性能量線密著力降低 型樹脂層的全固形分,含有60至70質量%之質量平均 分子量為15000以上之具有不飽和雙鍵的活性能量線 硬化性高分子化合物。 1 323512 201219204 6. 如申請專利範圍第2項至第5項中任一項所述之導電性 材料前驅物,其中,相對於前述活性能量線密著力降低 型樹脂層的全固形分,含有10至30質量%之環氧化合 物。 7. 如申請專利範圍第2項至第6項中任一項所述之導電性 材料前驅物,其中,相對於前述活性能量線密著力降低 型樹脂層的全固形分,含有15至25質量%之環氧化合 物。 8. —種導電性材料,其係對如申請專利範圍第1項至第7 項中任一項所述之導電性材料前驅物照射活性能量線 之後,從支撐體剝離至少含有易接著層及金屬部而成之 材料來製造。 9. 一種導電性材料,其係對如申請專利範圍第1項至第7 項中任一項所述之導電性材料前驅物照射活性能量線 之後,於該導電性材料前驅物之金屬部側貼合保護膜, 從支撐體剝離至少含有易接著層、金屬部及上述保護膜 而成之材料來製造。 2 323512 201219204 •四、指定代表圖: * (一)本案指定代表圖為:第()圖。(本案無圖式) ^ (二)本代表圖之元件符號簡單說明:(無) 五、本案若有化學式時,請揭示最能顯示發明特徵的化學式: 說明書中的化學式僅為添加劑,不足以代表本案, 故本案無代表化學式 2 323512201219204 VII. Patent application scope: 1. A conductive material precursor which is provided on a support at least in order to contain an active energy ray-curable polymer compound having an unsaturated double bond having a mass average molecular weight of 15,000 or more. The active energy line is dense. The force-reducing resin layer, the easy-adhesion layer, and the metal portion are emphasized. 2. The conductive material precursor according to claim 1, wherein the 'the active energy ray-reducing-reducing resin layer contains 40% by mass or more and the mass average molecular weight is 15 with respect to the total solid content of the resin layer. The active energy ray-curable polymer compound having an unsaturated double bond is contained in an amount of 8% by mass or more based on the total solid content of the resin layer. 3. The conductive material precursor according to claim 1 or 2, wherein the active energy ray-reducing resin layer further contains a thermal cationic polymerization initiator. 4. The conductive material precursor according to any one of claims 1 to 3, wherein the total solid content of the active energy ray-reducing resin layer is 50 to 90% by mass. An active energy ray-curable polymer compound having an unsaturated double bond having a mass average molecular weight of 15,000 or more. 5. The conductive material precursor according to any one of claims 1 to 4, wherein the total solid content of the active energy ray-reducing resin layer is 60 to 70 mass. An active energy ray-curable polymer compound having an unsaturated double bond having a mass average molecular weight of 15,000 or more. The conductive material precursor according to any one of the items 2 to 5, wherein the total solid content of the active energy ray-reducing resin layer is 10%. To 30% by mass of the epoxy compound. 7. The conductive material precursor according to any one of claims 2 to 6, wherein the total solid content of the active energy ray-reducing resin layer is 15 to 25 mass. % of epoxy compound. 8. A conductive material which, after irradiating an active energy ray to a conductive material precursor according to any one of claims 1 to 7, is exfoliated from the support and contains at least an easy-to-layer layer and Made of metal parts. A conductive material which is irradiated with an active energy ray by a conductive material precursor according to any one of claims 1 to 7, after the metal portion side of the conductive material precursor The protective film is bonded and produced by peeling off a material containing at least an easy-to-adhere layer, a metal portion, and the above protective film from the support. 2 323512 201219204 • IV. Designated representative map: * (1) The representative representative map of this case is: (). (There is no picture in this case) ^ (2) Simple description of the symbol of the representative figure: (none) 5. If there is a chemical formula in this case, please disclose the chemical formula that best shows the characteristics of the invention: The chemical formula in the specification is only an additive, not enough On behalf of the case, the case is not represented by the chemical formula 2 323512
TW100134537A 2010-09-28 2011-09-26 Precursor for an electrically conductive material and electrically conductive material TWI499503B (en)

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