TW201213359A - Block copolymer production method and copolymer precursor - Google Patents

Block copolymer production method and copolymer precursor Download PDF

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TW201213359A
TW201213359A TW100123181A TW100123181A TW201213359A TW 201213359 A TW201213359 A TW 201213359A TW 100123181 A TW100123181 A TW 100123181A TW 100123181 A TW100123181 A TW 100123181A TW 201213359 A TW201213359 A TW 201213359A
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group
repeating unit
alkyl
formula
block chain
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TW100123181A
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TWI423992B (en
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Takeshi Niitani
Gou Mishima
Yuichi Tateishi
Toshiaki Okado
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Nippon Soda Co
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F293/00Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule
    • C08F293/005Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule using free radical "living" or "controlled" polymerisation, e.g. using a complexing agent
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F297/00Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer
    • C08F297/02Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L53/00Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D17/00Pigment pastes, e.g. for mixing in paints
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K23/00Use of substances as emulsifying, wetting, dispersing, or foam-producing agents

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
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  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Inorganic Chemistry (AREA)
  • Graft Or Block Polymers (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)

Abstract

Provided is a production method for a novel copolymer that is useful as a pigment dispersant, etc. The disclosed production method uses a copolymer precursor that contains a block chain (A), which includes at least one type of repeat unit selected from a group comprised of repeat units that contain tertiary amino groups and repeat units that contain quaternary ammonium bases, and a block chain (B), which includes repeat units represented by formula (II) and repeat units that contain protected acid groups represented by formula (I). This product is then heated to produce a block copolymer that contains the block chain (A) and a block chain (B1), which includes repeat units represented by formula (II) and repeat units that contain an acid group represented by formula (III).

Description

201213359 六、發明說明: 【發明所屬之技術領域】 本發明係關於-種料顏料之分散劑等的新㈣聚物之 . 製造方法及共聚物前驅體。本申請案對2010年6月30曰提 出申請之曰本專利申請案第2010-148868號主張優先權, ' 並將其内容引用至本文中。 【先前技術】 已知有含有選自由含有3級胺基之重複單元及含有4級銨 鹽基之重複單元所組成之群中至少丨種重複單元、含有酸 性基之重複單元、及源自(甲基)丙烯酸烷基酯之單元的無 規共聚物。 。亥等聚合物基於其獨特結構而具有各種特性,因此於各 種領域獲得開發研究。 專利文獻1中記載含有顏料、含酸性官能基之有機色素 何生物 '鹼可溶性樹脂、及有機溶劑之顏料組合物,其係 3有胺基及/或其4級銨基之鹼可溶性樹脂之鹼性當量為 3000 20000 g/eq,酸值為3〇〜2〇〇 。具體而 言,作為鹼可溶性樹脂,記載有甲基丙烯酸正丁酯、曱基 ' 丙烯酸甲酯、曱基丙烯酸及曱基丙烯酸二曱基胺基乙酯之 .無規共聚物等。 於專利文獻2、3中,著眼於藉由利用酸或鹼對該無規共 聚物進行處理而具有帶正電或負電之兩性聚合物之性質, 而將該無規共聚物用作電泳性組合物。 又’於專利文獻4中,著眼於該無規共聚物中之羧基及 157144.doc 201213359 胺基之反應性’而將該無規共聚物用作異氰酸矽烷基酯之 黏合材料。 又’於專利文獻5中,使該無規共聚物之羧基與環氧基 發生交聯反應,進而將該無規共聚物之胺基用作該交聯反 應之觸媒,藉此製成粉體塗料組合物而使用。 [先前技術文獻] [專利文獻] [專利文獻1]日本專利特開2007-84659號公報 [專利文獻2]曰本專利特開平6-289609號公報 [專利文獻3]日本專利特開平5-295305號公報 [專利文獻4]曰本專利特開平4-62880號公報 [專利文獻5]曰本專利特開昭61-6866號公報 【發明内容】 [發明所欲解決之問題] 近年來,共聚物之用途多樣化,業界正謀求具有各種特 性之共聚物。 例如於彩色液晶顯示裝置領域,由於對可見光之高穿透 率化及南對比度化之要求變得強烈,故而將顏料粒子微粒 子化至至少可見光之波長以下。關於此種微粒子,由於顏 料粒子之比表面積變得大於通常,故而先前使用至今之顏 料分散劑用之共聚物於初期之顏料分散性及隨時間經過之 分散穩定性不充分。又,最近除分散性能以外亦要求更高 性能’先前之共聚物未能獲得充分之性能。 因此,本發明之課題在於提供一種初期之顏料分散性及 I57144.doc 201213359 隨時間經過之分散安定性良好,並且除分散性能以外亦具 有更高性能之共聚物之製造方法及共聚物前驅體。 [解決問題之技術手段] 本發明者等人為了解決上述課題而努力研究,結果發 現:含有嵌段鏈(A)與嵌段鏈(B1)且式(II)所示之重複單元 之共聚合比率於嵌段鏈(B1)中為90質量%以上之嵌段共聚 物可解決上述課題,上述嵌段鏈(A)係包含含有選自由含 有3級胺基之重複單元及含有4級銨鹽基之重複單元所組成 之群中至少1種重複單元之共聚物者,上述嵌段鏈(B1)係 包含含有式(III)所示之含有酸性基之重複單元及式(11)所 示之重複單元之共聚物者;進而發現,上述嵌段共聚物可 藉由加熱具有式(III)所示之含有酸性基之重複單元之酸性 基獲得保護之式(I)所示之重複單元的共聚物前驅體而製 造,從而完成本發明。 即,本發明係關於如下者: (1)一種嵌段共聚物之製造方法,該嵌段共聚物係含有 嵌段鏈(A)與嵌段鏈(B1),上述嵌段鏈(A)係含有選自由含 有3級胺基之重複單元及含有4級銨鹽基之重複單元所組成 之群中之至少1種重複單元者’上述嵌段鏈(B1)係含有式 (III)所示之含有酸性基之重複單元及式(π)所示之重複單 元者且式(II)所示之重複單元之共聚合比率於嵌段鏈(B i) 中為90質量%以上, 157144.doc 201213359201213359 VI. Description of the Invention: [Technical Field of the Invention] The present invention relates to a novel (tetra) polymer such as a dispersant of a seed pigment, a manufacturing method, and a copolymer precursor. The present application claims priority to Japanese Patent Application No. 2010-148868, the entire disclosure of which is hereby incorporated by reference. [Prior Art] It is known that at least a repeating unit, a repeating unit containing an acidic group, and a source derived from a group consisting of a repeating unit containing a tertiary amino group and a repeating unit containing a tertiary ammonium salt group A random copolymer of units of alkyl (meth) acrylate. . Polymers such as Hai have various properties based on their unique structures, and thus have been developed and researched in various fields. Patent Document 1 describes a pigment composition containing a pigment, an organic functional group-containing organic dye, an alkali-soluble resin, and an organic solvent, which is a base having an amine group and/or a 4-grade ammonium-based alkali-soluble resin thereof. The equivalent weight is 3000 20000 g/eq, and the acid value is 3〇~2〇〇. Specifically, as the alkali-soluble resin, a random copolymer such as n-butyl methacrylate, fluorenyl 'methyl acrylate, methacrylic acid, and decylaminoethyl decyl acrylate is described. In Patent Documents 2 and 3, attention is paid to the property of a positively or negatively charged amphoteric polymer by treating the random copolymer with an acid or a base, and the random copolymer is used as an electrophoretic combination. Things. Further, in Patent Document 4, the random copolymer is used as a binder of decyl isocyanate, focusing on the carboxyl group of the random copolymer and the reactivity of 157144.doc 201213359 amine group. Further, in Patent Document 5, a carboxyl group of the random copolymer is crosslinked with an epoxy group, and an amine group of the random copolymer is used as a catalyst for the crosslinking reaction to form a powder. Used as a body coating composition. [PRIOR ART DOCUMENT] [Patent Document 1] Japanese Patent Laid-Open No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. [Patent Document 4] Japanese Patent Laid-Open No. Hei 4-62880 (Patent Document 5) Japanese Patent Laid-Open Publication No. Hei No. Hei No. Hei 61-6866 [Invention] [Problems to be Solved by the Invention] In recent years, copolymers The use of the company is diversified, and the industry is seeking copolymers with various characteristics. For example, in the field of color liquid crystal display devices, since the requirements for high transmittance and south contrast of visible light are strong, the pigment particles are micronized to at least the wavelength of visible light. With regard to such fine particles, since the specific surface area of the pigment particles becomes larger than usual, the copolymer for the pigment dispersant which has been used up to now is insufficient in the initial pigment dispersibility and the dispersion stability over time. Moreover, higher performance has recently been demanded in addition to dispersion properties. The prior copolymers failed to achieve sufficient performance. Accordingly, an object of the present invention is to provide a method for producing a copolymer and a copolymer precursor which have excellent dispersion properties over time and which have good dispersion stability over time and which have higher performance in addition to dispersion properties. [Means for Solving the Problem] The present inventors have diligently studied to solve the above problems, and as a result, found that copolymerization of a repeating unit represented by the formula (II) and the block chain (B1) and the block chain (B1) The above problem can be solved by a block copolymer having a ratio of 90% by mass or more in the block chain (B1), which comprises a repeating unit selected from the group consisting of a tertiary amino group and a 4-grade ammonium salt. The copolymer of at least one repeating unit of the group consisting of repeating units, wherein the block chain (B1) comprises a repeating unit containing an acidic group represented by formula (III) and a formula (11) a copolymer of a repeating unit; further, it is found that the above block copolymer can be copolymerized by repeating a unit represented by the formula (I) which is protected by heating an acidic group having an acidic group-containing repeating unit represented by the formula (III) The precursor is manufactured to complete the present invention. That is, the present invention relates to the following: (1) A method for producing a block copolymer comprising a block chain (A) and a block chain (B1), wherein the block chain (A) is The block chain (B1) containing at least one repeating unit selected from the group consisting of a repeating unit containing a tertiary amino group and a repeating unit containing a tertiary ammonium salt group contains the formula (III) The copolymerization ratio of the repeating unit having an acidic group and the repeating unit represented by the formula (π) and the repeating unit represented by the formula (II) is 90% by mass or more in the block chain (B i), 157144.doc 201213359

示氣原子或C1-C3烷基 中’ R6、R7、R8分別獨立地表 r9表示脂肪族烴基或脂環烴基) [化3]In the gas atom or C1-C3 alkyl group, 'R6, R7, and R8 are independently shown to represent an aliphatic hydrocarbon group or an alicyclic hydrocarbon group.

(式中R、R、R分別獨立地表示氫原子或ci〜c3烧基; X表示單鍵或選自由C1〜C10伸烷基、_c( = 〇)〇Rla·、 -C(=〇)NHR'、_OC(=0)Ru_及 _R2a_〇c(=〇)Rla 所組成之 群中之基(Rla、11以分別獨立地表示cl〜cl〇伸烷基或 C1〜C10伸烷基-Ο-Cl〜C10伸烷基);該方法之特徵在於: 加熱含有嵌段鏈(A)與嵌段鏈(B)之共聚物前驅體,其中上 述嵌段鏈(B)係含有式(I)所示之含有經保護之酸性基之重 複單元及式(II)所示之重複單元者且式(II)所示之重複單元 之共聚合比率於嵌段鏈(B1)中為90質量%以上, [化1]Wherein R, R and R each independently represent a hydrogen atom or a ci~c3 alkyl group; X represents a single bond or is selected from C1 to C10 alkyl, _c(= 〇) 〇Rla·, -C(=〇) a group in the group consisting of NHR', _OC(=0)Ru_, and _R2a_〇c(=〇)Rla (Rla, 11 are independently represented by cl~cl〇 alkyl or C1~C10 alkylene, respectively) a method of: heating a copolymer precursor comprising a block chain (A) and a block chain (B), wherein the block chain (B) contains a formula The copolymerization ratio of the repeating unit having a protected acidic group and the repeating unit represented by the formula (II) shown in (I) and the repeating unit represented by the formula (II) is 90 in the block chain (B1) More than % by mass, [Chemical 1]

(式中,R1、R2、R3、X表示與式(III)相同之含義,R4表示 157144.doc 201213359 氫原子、Cl〜C6烷基、C6〜CIO芳基Cl〜C6烷基或C6〜CIO芳 基,R5表示C1~C6烷基、C6〜CIO芳基ci~C6烷基或C6〜CIO 芳基); (2)如上述(1)之嵌段共聚物之製造方法,其中含有3級胺 基之重複單元為式(IV)所示之重複單元, [化4](wherein, R1, R2, R3, X represent the same meanings as in the formula (III), and R4 represents 157144.doc 201213359 hydrogen atom, Cl~C6 alkyl group, C6~CIO aryl group C~C6 alkyl group or C6~CIO An aryl group, R5 represents a C1-C6 alkyl group, a C6-CIO aryl ci~C6 alkyl group or a C6-CIO aryl group; (2) A method for producing a block copolymer according to the above (1), which contains a grade 3 The repeating unit of the amine group is a repeating unit represented by the formula (IV), [Chemical 4]

(式中,R10、Ru、Ri2分別獨立地表示氫原子或C1〜C3烷 基,Y表示選自由 C1 〜C10伸烧基、_c(=〇)〇Rlb_、_c(=〇)NHRlb-、-OC(=〇)Rlb_ 及-R2b_〇C(=〇)_Rib_ 所組成之群中之基 (Rlb、R2b分別獨立地表示C1〜C10伸烷基或C^cio伸烷基 -O-Cl〜C10伸烷基)’ Ri3、Rl4分別獨立地表*ei〜C6烷基 或C6〜C10芳基C1-C6烷基); (3)如上述(1)之嵌段共聚物之製造方法,其中含有4級銨 鹽基之重複單元為式(V)所示之重複單元, [化5](wherein R10, Ru, and Ri2 each independently represent a hydrogen atom or a C1 to C3 alkyl group, and Y represents a group selected from C1 to C10, _c(=〇)〇Rlb_, _c(=〇)NHRlb-, - a group of OC(=〇)Rlb_ and -R2b_〇C(=〇)_Rib_ (Rb, R2b independently represent C1~C10 alkyl or C^cioalkyl-O-Cl~ And C. The repeating unit of the 4- to ammonium salt group is a repeating unit represented by the formula (V), [Chemical 5]

(式中R R 、R分別獨立地表示氫原子或c 1〜C3烷 基;Y1表示選自由C1〜C10伸烷基、 -C(=0)NHRlc-、-〇C(=〇)Ric_及·r2c 〇 丞、-C( = 〇)〇Rlc_、 -〇C(=〇)_R'所組成之 157144.doc 201213359 群中之基(Rle、R2e分別獨立地表示cl〜cl〇伸烷基或 C1〜C10伸烷基_〇_C1〜C1〇伸烷基),Rl8、r〗9、r20分別獨 立地表示Cl〜C6烷基或C6〜CIO芳基C1〜C6烷基,z-表示抗 衡離子);及 (4) 如上述1至3中任一項之嵌段共聚物之製造方法,其 係於有機溶劑與水之混合溶劑中進行。 又,本發明係關於如下者: (5) —種嵌段共聚物’其係含有嵌段鏈(A)與嵌段鏈(B), 該嵌段鏈(A)係含有選自由含有3級胺基之重複單元及含有 4級錢鹽基之重複单元所組成之群中之至少1種重複單元 者’該嵌段鍵(B)係含有式(I)所示之含有經保護之酸性基 之重複單元及式(II)所示之重複單元者且式(H)所示之重複 單元之共聚合比率於嵌段鏈(B)中為90質量%以上, [化6]Wherein RR and R each independently represent a hydrogen atom or a c 1 to C 3 alkyl group; Y 1 represents an alkyl group selected from C1 to C10, -C(=0)NHRlc-, -〇C(=〇)Ric_ and · r2c 〇丞, -C( = 〇) 〇 Rlc_, -〇C(=〇)_R' consists of 157144.doc 201213359 group (Rle, R2e independently represent cl~cl〇 alkyl or C1~C10 alkylene_〇_C1~C1〇alkyl), Rl8, r9, r20 each independently represent a Cl~C6 alkyl group or a C6~CIO aryl C1~C6 alkyl group, and the z- represents a counterbalance (4) The method for producing a block copolymer according to any one of the above 1 to 3, which is carried out in a mixed solvent of an organic solvent and water. Further, the present invention relates to the following: (5) a block copolymer comprising a block chain (A) and a block chain (B), wherein the block chain (A) contains a component selected from the group consisting of At least one repeating unit of the group consisting of a repeating unit of an amine group and a repeating unit containing a 4-hydroxyl group, the block bond (B) containing a protected acidic group represented by the formula (I) The copolymerization ratio of the repeating unit and the repeating unit represented by the formula (II) and the repeating unit represented by the formula (H) is 90% by mass or more in the block chain (B), [Chem. 6]

(式中,R1、R2、R3分別獨立地表示氫原子或C1〜C3烷基; X表示單鍵或選自由C1-C10伸烷基、-C( = 0)0Rla-、-C(=0)NHRla-、-0C(=0)Rla-及-R2a-OC(=0)-Rla-所組成 之群中之基(Rla、厌2&分別獨立地表示Cl〜CIO伸烷基或 C1-C10伸烷基-Ο-Cl〜C10伸烷基)’ R4表示氫原子、C1〜C6 烷基、C6~C10芳基C1〜C6烷基或C6-C10芳基,R5表示 C1〜C6烷基、C6-C10芳基C1~C6烷基或C6〜C10芳基) 157144.doc 201213359 [化7](wherein R1, R2, and R3 each independently represent a hydrogen atom or a C1 to C3 alkyl group; X represents a single bond or is selected from a C1-C10 alkyl group, -C(=0)0Rla-, -C(=0) a group of NHRla-, -0C(=0)Rla-, and -R2a-OC(=0)-Rla- (Rla, ana 2& independently represent Cl~CIO alkyl or C1- C10 alkyl-hydrazine-Cl~C10 alkylene) 'R4 represents a hydrogen atom, a C1 to C6 alkyl group, a C6-C10 aryl C1 to C6 alkyl group or a C6-C10 aryl group, and R5 represents a C1 to C6 alkyl group. , C6-C10 aryl C1~C6 alkyl or C6~C10 aryl) 157144.doc 201213359 [Chem. 7]

(式中’ R6、R7、R8分別獨立地表示氫原子或Cl~C3烷基, R9表示脂肪族烴基或脂環烴基); (6)如上述(5)之共聚物前驅體,其中含有3級胺基之重複 單元為式(IV)所示之重複單元, [化8](wherein R6, R7, and R8 each independently represent a hydrogen atom or a Cl~C3 alkyl group, and R9 represents an aliphatic hydrocarbon group or an alicyclic hydrocarbon group); (6) A copolymer precursor of the above (5), which contains 3 The repeating unit of the amine group is a repeating unit represented by the formula (IV), [Chemical 8]

(式中’ R10、R"、R12分別獨立地表示氫原子或C1〜C3烷 基;Y表示選自由C1〜C10伸烷基、-C( = 0)0R〗b-、 -C(=0)NHRlb-、-〇C(=〇)Rlb·及 _R2b-〇c(=〇)_Rlb-所組成之 群中之基(Rlb、R2b分別獨立地表示Cl〜CIO伸烷基或 C1〜C10伸烷基-Ο-Cl〜C10伸烷基),R13、R14分別獨立地表 示C1〜C6烧基或C6〜C10芳基C1〜C6烧基);及 (7)如上述(5)之共聚物前驅體,其中含有4級銨鹽基之重 複單元為式(V)所示之重複單元, [化9](wherein R10, R", R12 each independently represent a hydrogen atom or a C1 to C3 alkyl group; Y represents an alkyl group selected from C1 to C10, -C(=0)0R b-, -C(=0) a group of NHRlb-, -〇C(=〇)Rlb· and _R2b-〇c(=〇)_Rlb- (Rlb, R2b independently represent Cl~CIO alkyl or C1~C10 alkyl-Ο-Cl~C10 alkylene group), R13 and R14 each independently represent a C1 to C6 alkyl group or a C6 to C10 aryl C1 to C6 alkyl group; and (7) a copolymerization as described in the above (5) The precursor of the precursor, wherein the repeating unit containing a 4- to ammonium salt group is a repeating unit represented by the formula (V), [Chem. 9]

(式中’ Rl5 ' Rl6、Rl7分別獨立地表示氫原子或C1〜C3烷 157l44.doc 201213359 基;Y1表示選自由C1-C10伸烷基、-C( = 〇)〇R“_、 -C(=0)NHRlc-、-OC(=0)Rlc-及-R2c-〇C(=0)-Rlc-所組成之 群中之基(Rle、R2e分別獨立地表示Cl〜CIO伸院基咬 C1〜C10伸烷基-O-Cl〜C10伸烷基),R18、R19、R2Q分別獨 立地表示C1〜C6烷基或C6〜C10芳基C1〜C6烷基,Z·表示抗 衡離子)。 【實施方式】 (I) 共聚物前驅體 本發明中所使用之共聚物前驅體分別含有至少1個以下 之嵌段鏈(A)及嵌段鏈(B)。 嵌段鏈(A):含有選自由含有3級胺基之重複單元及含有 4級銨鹽基之重複單元所組成之群中至少1種重複單元的嵌 段鏈 嵌段鍵(B):含有含有經保護之酸性基之重複單元及式 (II) 所示之重複單元之嵌段鏈 又,本發明中所使用之共聚物前驅體除上述嵌段鏈(A) 及嵌段鏈(B)以外’亦可含有其他嵌段鏈。 1)嵌段鏈(A) 於嵌段鍵(A)中,含有3級胺基之重複單元及含有4級錄 鹽基之重複單元只要為重複單元之側鏈上具有上述陽離子 性官能基者,則無特別限制。 具體而言,嵌段鏈(A)包括:僅包含含有3級胺基之重複 單元或含有4級銨鹽基之重複單元中之丨種的嵌段鏈、包含 含有3級胺基之重複單元或含有4級錄鹽基之重複單元中之 157144.doc -10. 201213359 2種以上之嵌段鏈、包含含有3級胺基之重複單元之至少1 種及含有4級銨鹽基之重複單元之至少1種的嵌段鏈、及該 等與源自其他可共聚合之單體的重複單元的嵌段鏈。嵌段 鏈(A)中之各重複單元之鍵結可為無規、交替、嵌段等任 一形態。 (含有3級胺基之重複單元) 作為上述含有3級胺基之重複單元,只要含有3級胺基則 無特別限制,例如可例示下述通式(IV)所示之重複單元。 [化 10](wherein ' Rl5 ' Rl6, Rl7 independently represent a hydrogen atom or a C1 to C3 alkane 157l44.doc 201213359 group; Y1 represents a group selected from a C1-C10 alkyl group, -C(= 〇)〇R"_, -C (=0) The base of the group consisting of NHRlc-, -OC(=0)Rlc-, and -R2c-〇C(=0)-Rlc- (Rle, R2e independently represent Cl~CIO C1 to C10 alkylene-O-Cl~C10 alkylene), R18, R19 and R2Q each independently represent a C1 to C6 alkyl group or a C6 to C10 aryl C1 to C6 alkyl group, and Z. represents a counter ion). [Embodiment] (I) Copolymer precursor The copolymer precursor used in the present invention contains at least one or less of the block chain (A) and the block chain (B), respectively. Block chain (A): contains a block chain block bond (B) of at least one repeating unit of a group consisting of a repeating unit having a 3-stage amine group and a repeating unit containing a 4-stage ammonium group: containing a repeat containing a protected acidic group a unit and a block chain of a repeating unit represented by the formula (II). Further, the copolymer precursor used in the present invention may contain other blocks in addition to the block chain (A) and the block chain (B). Chain 1) block chain (A) embedded In the segment bond (A), the repeating unit having a 3-stage amine group and the repeating unit having a 4-stage salt group are not particularly limited as long as they have the above cationic functional group in the side chain of the repeating unit. The block chain (A) includes a block chain comprising only a repeating unit containing a 3-stage amine group or a repeating unit containing a 4-stage ammonium salt group, a repeating unit containing a 3-stage amine group, or a 4-stage 157144.doc -10. 201213359 in a repeating unit of a salt group, at least one of two or more kinds of block chains, at least one type of repeating unit containing a third-order amine group, and a repeating unit containing a 4-stage ammonium salt group a block chain, and the block chain of the repeating unit derived from other copolymerizable monomers. The bonding of each repeating unit in the block chain (A) may be random, alternating, block, etc. Any of the above-mentioned (repeating unit containing a tertiary amino group) The repeating unit containing a tertiary amino group is not particularly limited as long as it contains a tertiary amino group, and for example, a repeat represented by the following formula (IV) can be exemplified. Unit. [10]

式(IV)中,R10、R"、Ri2分別獨立為氫原子或匚卜以烷 基。Y為選自由 C1〜C10伸烧基、-C(=〇)〇Rlb_、_c(=〇)NHRlb_ 、-0C(=0)Rib_及-R2b_〇c(=〇)_Rlb所組成之群中之基 (R 、R分別獨立為C1〜C10伸烷基或以〜匸⑺伸烷基In the formula (IV), R10, R", and Ri2 are each independently a hydrogen atom or an alkyl group. Y is a group selected from C1 to C10 stretching groups, -C(=〇)〇Rlb_, _c(=〇)NHRlb_, -0C(=0)Rib_, and -R2b_〇c(=〇)_Rlb The base of R (R and R are independently C1~C10 alkyl or alkyl (~7) alkyl

C1〜C10伸烷基)。R 分別獨立為C1〜C6烷基或 C6-C10芳基C1〜C6统基。 此處,作為C1〜C3烧基及C1〜C6院基,可例示:曱基、 乙基、正丙基、 、異丙基、正丁基、第二丁基、異丁基、第 二丁基、正戊基、正己基等。C1~C10 alkylene). R is independently a C1 to C6 alkyl group or a C6-C10 aryl group C1 to C6. Here, as the C1 to C3 alkyl group and the C1 to C6 yard group, a mercapto group, an ethyl group, a n-propyl group, an isopropyl group, a n-butyl group, a second butyl group, an isobutyl group, a second group can be exemplified. Base, n-pentyl, n-hexyl and the like.

伸丙基鏈、 伸丙基鏈、甲基伸乙基鏈、伸丁基鏈、I]·二曱基伸乙 鏈、伸戊基鏈、1·甲基伸丁基鏈、 、1,2-二曱基伸乙基 曱基伸丁基鏈或伸己 157144.doc •11- 201213359 基鏈等》 作為C6〜CIO芳基C1〜C6烷基,可例示:苄基苯乙基、 本基正丙基、1-苯基正己基、萘_1-基甲基、萘_2-基乙 基、1-(萘-2-基)正丙基、茚_卜基甲基等。 作為成為式(IV)所示之重複單元之原料的單體,可例 示:(甲基)丙烯酸二曱基胺基乙酯、(曱基)丙烯酸二曱基 胺基丙酯、(曱基)丙烯酸二曱基胺基丁酯、(曱基)丙烯酸 二乙基胺基乙酯、(曱基)丙烯酸二乙基胺基丙酯、(曱基) 丙烯酸二乙基胺基丁酯等。 (含有4級銨鹽基之重複單元) 作為上述含有4級銨鹽基之重複單元,只要含有4級銨鹽 基則無特別限制’例如可例示下述通式所示之重複單 元。 [化 11]a propyl chain, a propyl chain, a methyl extended ethyl chain, a butyl chain, an I]·didecyl extended ethylene chain, a pentyl chain, a methyl butyl chain, a 1,2-diyl group As a C6~CIO aryl C1~C6 alkyl group, it can be exemplified as: benzyl phenethyl, benzyl propyl, 1-phenyl hexyl A group, a naphthalene-1-ylmethyl group, a naphthalene-2-ylethyl group, a 1-(naphthalen-2-yl)-n-propyl group, a fluorenyl-methyl group or the like. Examples of the monomer which is a raw material of the repeating unit represented by the formula (IV) include didecylaminoethyl (meth)acrylate, dinonylaminopropyl (mercapto)acrylate, and mercapto. Didecylaminobutyl acrylate, diethylaminoethyl (meth) acrylate, diethyl aminopropyl (meth) acrylate, diethylaminobutyl (meth) acrylate, and the like. (Repeating unit containing a quaternary ammonium salt group) The repeating unit containing the quaternary ammonium salt group is not particularly limited as long as it contains a quaternary ammonium salt group. For example, a repeating unit represented by the following formula can be exemplified. [化11]

式(V)中,R15、R16、R17分別獨立為氫原子或C1〜C3烷 基。Y1為選自由C1〜C10伸烷基、-C卜C〇〇Ric_、 -C(=0)NHRlc-、-0C(=0)Rlc-及-R2c-OC(=〇)-Ri。·所組成之 群中之基(Rle、R2e分別獨立地表示Cl〜CIO伸烧基或 C1〜C10伸烷基-O-Cl〜C10伸烷基)。R18、R丨9、R2〇分別獨 立為C1〜C6烷基或C6〜C10芳基C1〜C6烷基。表示齒化物 離子、函化院離子、烧基叛酸鹽離子、氮氧化物離子、烧 157144.doc -12- ⑧ 201213359 基硫酸鹽離子、磺酸鹽離子、磷酸鹽離子或烷基磷酸鹽離 子等抗衡離子。 此處’作為C1〜C3烷基、C1〜C6烷基、C1〜C10伸烷基及 C6〜C10芳基C1〜C6烷基,可例示與上述含有3級胺基之重 複單元之式(IV)相同者。 作為成為式(V)所示之重複單元之原料的單體,可例 示:氟化(甲基)丙烯醯氧基乙基三甲基銨、氯化(甲基)丙 烯ϋ氧基乙基三甲基銨、溴化(曱基)丙烯醯氧基乙基三甲 基錄、破化(曱基)丙烯醯氧基乙基三曱基銨、氟化(甲基) 丙稀酿氧基丙基三甲基銨、氣化(甲基)丙烯醯氧基丙基三 甲基錢、溴化(曱基)丙烯醯氧基丙基三甲基銨、碘化(甲 基)丙烯醯氧基丙基三曱基銨、氟化(甲基)丙烯醯氧基丁基 三甲基銨、氯化(曱基)丙烯醯氧基丁基三曱基銨、溴化(甲 基)丙烯醯氧基丁基三曱基銨、碘化(曱基)丙烯醯氧基丁基 二甲基銨、氟化(曱基)丙烯醯氧基乙基苄基二甲基銨、氣 化(曱基)丙烯醯氧基乙基苄基二曱基銨、溴化(曱基)丙稀 酿氧基乙基苄基二甲基銨、碘化(曱基)丙烯醯氧基乙基苄 基二甲基銨、氟化(甲基)丙烯醯氧基丙基苄基二甲基銨、 氣化(甲基)丙稀醯氧基丙基苄基二甲基錄、溴化(甲基)丙 烯醯氧基丙基节基二甲基銨、碘化(甲基)丙烯醯氧基丙基 V基二甲基録、氟化(甲基)丙稀醯氧基丁基苄基二甲基 録、氣化(甲基)丙稀酿氧基丁基节基二曱基錄、溴化(甲 基)丙稀醯氧基丁基苄基二甲基銨、蛾化(甲基)丙烯醯氧基 丁基苄基二甲基銨等。 157144.doc 13 201213359 (其他可含有之重複單元) 作為嵌段鏈(A)中之其他可含有之重複單元,可例示: 源自(曱基)丙烯酸系單體、芳香族乙烯系單體、共輕二婦 系單體等之重複單元。 作為成為上述重複单元之原料的(甲基)丙稀酸系單體、 芳香族乙烯系單體、共軛二烯系單體,可例示如下者。 作為(曱基)丙烯酸系單體,可例示:(甲基)丙烯酸;(甲 基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙稀酸正丙 醋、(甲基)丙稀酸異丙醋、(甲基)丙稀酸正丁酷、(曱基)丙 烯酸異丁酯、(甲基)丙烯酸第二丁酯、(甲基)丙烯酸第三 丁酯、(甲基)丙烯酸己酯、(甲基)丙烯酸環己酯、(甲基)丙 烯酸2-乙基己酯、(甲基)丙烯酸i-乙基環己酯、(甲基)丙稀 酸旨等(甲基)丙烯酸醋化合物;(甲基)丙稀酸2_甲氧基 乙酯、曱氧基聚乙二醇(乙二醇之單元數為2〜1〇〇)(甲基)丙 烯酸酯、乙氧基聚乙二醇(甲基)丙烯酸酯、苯氧基聚乙二 醇(甲基)丙烯酸酯等’該等可單獨使用1種,或混合使用2 種以上。 作為芳香族乙婦系單體,可列舉:苯乙稀、鄰曱基苯乙 烯、對甲基苯乙烯、對第三丁基苯乙烯、α_曱基苯乙烯、 對第三丁氧基苯乙烯、間第三丁氧基苯乙烯、對(1_乙氧基 乙氧基)苯乙烯、2,4-二曱基苯乙烯、乙烯基苯胺、乙烯基 苯甲酸、乙烯基萘、乙烯基蒽、2-乙烯基。比啶、4-乙烯基 吡啶、2-乙烯基喹啉、4-乙烯基喹啉、2-乙烯基噻吩、4-乙烯基噻吩等雜芳基化合物等,該等可單獨使用1種,或 157144.doc •14· 201213359 混合使用2種以上。 作為共輛二稀系-r si m ,斤'早體,可列舉.1,3_丁二烯、異戊二 烯、2-乙基-1,3-丁二嬙筮——Γ «. 碑2-第二丁基-1,3-丁二烯、2-苯 基-1,3 -丁 二稀、 ’曱基-1,3-丁 二烯、1,3·戊二烯、2_ 曱基-1,3 -戊二稀、甲其! 3 士、__膝 J T^-l,3-戊一烯、ι,3-己二烯、2-曱 土 ’3 辛一烯、4,5-二乙基-1,3-辛二烯、3-丁基-ΐ,3-辛二 烯、1,3_環戊二稀、環己二稀、w環辛二稀、υ三 環癸二稀、月桂稀、氯丁:料,該等可單獨使们種, 或混合使用2種以上。 2)嵌段鏈(B) —嵌段鍵(B)係含有至少i種含有經保護之酸性基之重複單 元及至少1種式(11)所示之重複單元者。 嵌技鍵(B)中’至少丨種式(π)所示之重複單元之共聚合 比率為9〇質量%以上,較佳為以質量%,質量%。 (含有經保護之酸性基之重複單元) 又鏈(B)中之含有經保護之酸性基之重才复單元為式⑴ 所示之重複單元。 [化 12]In the formula (V), R15, R16 and R17 each independently represent a hydrogen atom or a C1 to C3 alkyl group. Y1 is selected from the group consisting of C1 to C10 alkyl, -CBu C〇〇Ric_, -C(=0)NHRlc-, -0C(=0)Rlc-, and -R2c-OC(=〇)-Ri. The groups in the group (Rle, R2e each independently represent a Cl~CIO alkyl group or a C1~C10 alkyl group-O-Cl~C10 alkyl group). R18, R丨9, and R2〇 are each independently a C1 to C6 alkyl group or a C6 to C10 aryl C1 to C6 alkyl group. Indicates the tooth ion, the chemical ion, the sulphonate ion, the oxynitride ion, the 157144.doc -12- 8 201213359 sulfate ion, sulfonate ion, phosphate ion or alkyl phosphate ion Wait for counter ions. Here, 'C1 to C3 alkyl group, C1 to C6 alkyl group, C1 to C10 alkylene group, and C6 to C10 aryl C1 to C6 alkyl group can be exemplified by the above formula (IV) having a repeating unit containing a tertiary amino group. ) the same. The monomer which is a raw material of the repeating unit represented by the formula (V) is exemplified by fluorinated (meth) propylene oxiranyl ethyl trimethyl ammonium chlorinated (meth) propylene oxy oxyethyl three Methylammonium, brominated (fluorenyl) propylene oxiranyloxyethyl trimethylate, broken (mercapto) propylene oxiranyl ethyl decyl ammonium, fluorinated (methyl) propylene Trimethylammonium, gasified (meth) propylene methoxy propyl trimethyl ketone, brominated (fluorenyl) propylene methoxy propyl trimethyl ammonium, iodized (meth) propylene oxime Propyltrimethylammonium, fluorinated (meth)propenyloxybutyltrimethylammonium, chlorinated (decyl)propenyloxybutyltrimethylammonium bromide, brominated (meth)acrylonitrile Butyl trimethyl ammonium, iodinated (fluorenyl) propylene methoxy butyl dimethyl ammonium, fluorinated (fluorenyl) propylene methoxyethyl benzyl dimethyl ammonium, gasification (fluorenyl) Propylene methoxyethyl benzyl decyl ammonium, brominated (fluorenyl) propylene oxyethyl benzyl dimethyl ammonium, iodide (decyl) propylene oxiranyl ethyl dimethyl dimethyl Ammonium, fluorinated (meth) propylene Oxypropyl propyl dimethyl ammonium, gasified (methyl) propyl methoxy propyl benzyl dimethyl, brominated (meth) propylene methoxy propyl benzyl dimethyl ammonium, Iodinated (meth) propylene methoxy propyl V dimethyl dimethyl, fluorinated (methyl) propylene oxy butyl benzyl dimethyl, gasified (methyl) propylene oxide Butyl benzyl dihydrazino, brominated (meth) propyl oxy butyl benzyl dimethyl ammonium, moth (meth) propylene methoxy butyl benzyl dimethyl ammonium, and the like. 157144.doc 13 201213359 (Other repeatable units may be contained) Examples of other repeating units which may be contained in the block chain (A) include: (fluorenyl) acrylic monomers, aromatic vinyl monomers, A repeating unit such as a lighter two-party monomer. The (meth)acrylic acid monomer, the aromatic vinyl monomer, and the conjugated diene monomer which are the raw materials of the above-mentioned repeating unit can be exemplified as follows. Examples of the (fluorenyl) acrylic monomer include (meth)acrylic acid; methyl (meth)acrylate; ethyl (meth)acrylate; (meth)acrylic acid n-propyl vinegar; (methyl) Isopropyl acrylate, n-butyl (meth) acrylate, isobutyl (meth) acrylate, second butyl (meth) acrylate, tert-butyl (meth) acrylate, (methyl) ) hexyl acrylate, cyclohexyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, i-ethylcyclohexyl (meth)acrylate, (meth)acrylic acid (A) Acrylic vinegar compound; (meth)acrylic acid 2-methoxyethyl ester, decyloxy polyethylene glycol (ethylene glycol unit number 2~1 〇〇) (meth) acrylate, B The oxy polyethylene glycol (meth) acrylate, phenoxy polyethylene glycol (meth) acrylate, etc. may be used alone or in combination of two or more. Examples of the aromatic ethylenic monomer include styrene, o-nonylstyrene, p-methylstyrene, p-tert-butylstyrene, α-mercaptostyrene, and p-tert-butoxybenzene. Ethylene, m-butoxystyrene, p-(1-ethoxyethoxy)styrene, 2,4-dimercaptostyrene, vinylaniline, vinylbenzoic acid, vinylnaphthalene, vinyl Bismuth, 2-vinyl. a heteroaryl compound such as a pyridine, a 4-vinylpyridine, a 2-vinylquinoline, a 4-vinylquinoline, a 2-vinylthiophene or a 4-vinylthiophene, etc., which may be used alone, or 157144.doc •14· 201213359 Mixed use of 2 or more types. As a total of two rare-r si m, jin 'early body, can be cited. 1,3 - butadiene, isoprene, 2-ethyl-1,3-butanedifluoride - Γ «. Tablet 2 - second butyl-1,3-butadiene, 2-phenyl-1,3-butadiene, 'mercapto-1,3-butadiene, 1,3-pentadiene, 2_曱基-1,3 - pentane, az! 3, __ knee JT^-l, 3-pentyl, iota, hexadiene, 2-alumina '3 octene, 4,5-diethyl-1,3-octadiene , 3-butyl-indole, 3-octadiene, 1,3_cyclopentadiene, cyclohexane, w cyclopentate, ruthenium tricycle, laurel, chloroprene: These may be used alone or in combination of two or more. 2) Block chain (B) - The block bond (B) contains at least one repeating unit containing a protected acidic group and at least one repeating unit represented by the formula (11). In the insert key (B), the copolymerization ratio of at least the repeating unit represented by the formula (π) is 9 〇 by mass or more, preferably 3% by mass and % by mass. (Repeating unit containing a protected acidic group) Further, the heavy unit containing the protected acidic group in the chain (B) is a repeating unit represented by the formula (1). [化 12]

(I) η ?中’^^分別獨立為氣原子或〜㈣基。 =早鍵或選自由C1〜C10伸燒基、·c(—_0)0Rla-、 -__R、顿,Rla•及如傾哪Rla所組成之 157144.doc •15- 201213359 群中之基(Rla、R2a分別獨立為Cl〜Cl0伸烷基或Cl〜Cl0伸 院基-0-C1〜CIO伸烷基)’ R4為氫原子、Cl〜C6烷基、 C6〜Cl0芳基C1〜C6烧基、或C6〜CIO芳基,R5為C1~C6炫 基、C6〜C10芳基C1〜C6烷基或C6〜cl〇芳基。 作為成為式⑴所示之重複單元之原料的單體,可列舉: 丙烯酸甲氧基甲酯、丙烯酸乙氧基甲酯、丙烯酸丨_乙氧基 乙酯、丙烯酸1-甲氧基乙酯、丙烯酸丨_乙氧基丙酯、丙烯 酸1-丙氧基乙酯、丙烯酸丨_異丙氧基乙酯、丙烯酸丨―苄氧 基乙S曰、2-乙基丙烯酸卜乙氧基乙酯、2_甲基丙浠酸卜甲 氧基乙酉旨、2-甲基-丙烯酸乙氧基丙酉旨、2_甲基丙稀酸卜 丙氧基乙S旨、2·甲基丙烯酸卜異丙氧基乙自旨、2_甲基丙稀(I) η 中 '^^ is independently a gas atom or a ~(tetra) group. = early bond or selected from the group consisting of C1~C10 stretching base, ·c(-_0)0Rla-, -__R, ton, Rla• and Rla 157144.doc •15- 201213359 group (Rla) R2a is independently a Cl~Cl0 alkyl group or a Cl~Cl0 stretching group-0-C1~CIO alkyl group) 'R4 is a hydrogen atom, a Cl~C6 alkyl group, a C6~Cl0 aryl C1~C6 alkyl group. Or a C6~CIO aryl group, R5 is a C1~C6 leucoyl group, a C6~C10 aryl C1~C6 alkyl group or a C6~cl〇 aryl group. Examples of the monomer which is a raw material of the repeating unit represented by the formula (1) include methoxymethyl acrylate, ethoxymethyl acrylate, hydrazine acrylate-ethoxyethyl ester, and 1-methoxyethyl acrylate.丨-ethoxypropyl acrylate, 1-propoxyethyl acrylate, hydrazine isopropyl isopropoxide, hydrazine acrylate-benzyloxyethyl hydrazine, 2-ethyl acrylate ethoxyethyl ester, 2_Methylpropionate, methoxymethoxy, 2-methyl-acrylic acid ethoxypropyl, 2-methylpropionic acid, propionic acid, S, 2, methacrylic acid, isopropyl Oxygen from the purpose, 2_methyl propylene

混合使用2種以上。Two or more types are used in combination.

基之重複單元。 (式(II)所示之重複單元) 示之重複單 嵌段鏈(B)進而含有至少1種下述式(π)所 元。 [化 13]The repeating unit of the base. (Repeating unit represented by the formula (II)) The repeating monoblock chain (B) further contains at least one of the following formula (π). [Chem. 13]

157144.doc •16- 201213359 式(π)中’ R6、R7、R8表示氫原子或C1〜C3烧基,^表 示脂肪族烴基或脂環烴基。 於本發明卜作為心匕以〜⑽基’可例示與 上述含有3級胺基之重複單元之式(IV)相同者。 於本發明中’ R9之脂肪族烴基可為飽和或不飽和中之任 意一種,包括C1〜C2〇之院基、C2〜C2〇之烯基、C2〜C2〇之 炔基。 作為上述C1〜C20之烷基,例如可列舉:甲基、乙基、 正丙基、異丙基、正丁基、異丁基、第三丁基正戊基、 異戊基、新戊基、第三戍基、2_曱基丁基、正己基、異己 基3·甲基戊基、乙基丁基、正庚基、2-甲基己基、正辛 基、異辛*、第三辛基、2-乙基己基、3_甲基庚基、正壬 基、異壬基、i-甲基辛基、乙基庚基、正癸基、丨甲基壬 基、正十一烷基、M-二甲基壬基、正十二烷基、正十四 烷基、正十七烷基、正十八烷基等。該等中,較佳為 C1〜C6之烷基。 作為上述C2〜C20之烯基,例如可列舉:乙烯基、丨_丙烯 基、2-丙烯基、丁烯基、2_丁烯基、3 丁烯基、丨曱基 -2-丙烯基、2_甲基_2_丙烯基、丨_戊烯基、2_戊烯基、= 烯基、4-戊烯基、1_甲基·2_ 丁烯基、2_甲基_2_ 丁烯基、“ 己烯基、2-己烯基、3-己烯基、4-己烯基' 5-己烯基、庚 烯基、辛烯基、癸烯基、十五烯基、二十烯基、二十三烯 基等。該等中,較佳為C2〜C6之稀基。 作為上述C2〜C20之炔基,可列舉:乙炔基、丨_丙炔基、 157144.doc -17· 201213359 2-丙炔基、1-丁炔基、2-丁炔基、3-丁炔基、1-甲基_2_丙 炔基、2-甲基-2-丙炔基、1-戊炔基、2-戊炔基、3_戊块 基、4 -戊快基、1-曱基·2 -丁快基、2 -甲基-2-丁快基、丨_己 炔基、2-己炔基、3-己炔基、4-己炔基、5-己炔基、丨_庚 快基、1-辛炔基、1·癸快基、1_十五炔基、1_二十快基、 1-二十三炔基等。較佳為C2〜C6之炔基。 又’於本發明中,脂環烴基係表示於基内之任意部分具 有單環或多環之環狀結構的飽和或不飽和之烴基,包括: C3〜C20之環烷基、C4-C20之經烷基取代之環院基、 C4〜C20之環烷基烷基、C3〜C2〇之環烯基、C4〜C2〇之經烧 基取代之環烯基、C4〜C20之環烯基烷基、C7〜C20之交聯 環烴基等。 作為上述C3〜C20之環烧基,例如可列舉:環丙基、環 丁基、ϊ衣戊基、環己基、環庚基、環辛基等。較佳為 C3〜C8之環烷基。 作為上述C4〜C20之經烧基取代之環烧基,可列舉:丨_甲 基環丙基、2-乙基環丙基、3-甲基環己基、4-甲基環己 基、4-乙基環己基、3-乙基環己基、2·甲基環辛基等。較 佳為C4〜C10之經烷基取代之環烷基。 作為上述C3〜C20之環烧基烧基,可列舉:環丙基甲 基、環丁基甲基、環戊基曱基、環己基甲基、環庚基乙 基、環辛基乙基等。較佳為C4〜C10之環烷基烷基。 作為上述C3-C20之環稀基,可列舉:環丙烯基、環丁 烤基、環戊烯基、環己烯基、環庚烯基、環辛稀基、環戊 157144.doc •18· 201213359 二烯基等❶較佳為C3〜C8之環烯基。 作為上述C4〜C20之經烷基取代之環烯基,可列舉:3_乙 基環戊烯基、己烯基、4-甲基環己烯基、4_乙基環己烯基 等。較佳為CM〜C10之經烷基取代之環烯基。 作為上述C4〜C20之環烯基烷基,可列舉:環丙烯基甲 基、環丁烯基甲基、環戊烯基乙基、環己烯基乙基等。較 佳為C4〜C10之環烯基烷基。 作為上述C7〜C.20之交聯環烴基,可列舉:三環 [5·2·1·〇2’6]癸烷_8_基、金剛烷基、二環戊烯基、異宿基 等。 (其他可含有之重複單元) 作為嵌段鏈(Β)中之其他可含有之重複單元,可例示源 自芳香族乙烯系單體、共軛二烯系單體等之重複單元。 作為芳香族乙烯系單體,可列舉:苯乙烯、鄰甲基苯乙 '歸、對曱基苯乙烯、對第三丁基苯乙烯、α_曱基苯乙烯、 對第二丁氧基苯乙烯、間第三丁氧基苯乙烯、對(1-乙氧基 乙氧基)苯乙烯、2,4-二甲基苯乙烯、乙烯基苯胺、乙烯基 苯甲酸、乙烯基萘、乙烯基蒽、2_乙烯基β比啶、4_乙烯基 比咬、2-乙稀基啥琳、4-乙稀基啥淋、2-乙稀基°塞吩、4-乙稀基噻吩等雜芳基化合物等,該等可單獨使用1種,或 混合使用2種以上。 作為共輛二烯系單體,可列舉:1,3_ 丁二烯、異戊二 稀、2-乙基-1,3· 丁二烯、2·第三丁基_丨,3-丁二烯、2-苯 基-1,3· 丁二烯、2,3-二曱基·ι,3-丁二烯、1,3-戍二烯、2- I57144.doc •19· 201213359 甲基-1,3-戊二烯、3 -甲基-1,3-戊二稀、ι,3 -己二烯、2-甲 基-1,3-辛二稀、4,5-二乙基-1,3-辛二婦、3-丁基-1,3-辛二 稀、丨,3-環戊二烯、1,3-環己二烯、1,3-環辛二烯、1,3-三 環癸二烯、月桂烯、氣丁二烯等,該等可單獨使用1種, 或混合使用2種以上。 3)其他事項 (共聚物中之嵌段鏈(A)、(B)以外之可含有之嵌段鏈) 本發明中所使用之共聚物前驅體除嵌段鏈及以 外,亦可含有其他嵌段鏈。 作為此種嵌段鏈,可列舉含有源自(甲基)丙烯酸系單 體、芳香族乙烯系單體、共軛二烯系單體等之重複單元的 嵌奴鍵,各重複單元之鍵結可為均聚、無規共聚合 '交替 共聚合、嵌段共聚合等任意形態。 關於(曱基)丙烯酸系單體、芳香族乙烯系單體、共軛二 烯系單體等,可例示與上述相同者。 (共聚物中之嵌段鏈(A)與嵌段鏈(B)之比及分子量等物性) 本發明之共聚物中之嵌段鏈(A)與嵌段鏈(B)之比並無特 別限制,以重量%比計為1〇〜4〇 : 9〇〜6〇,較佳為丨5〜35 : 85〜65 〇 又,使用 GPC(gel permeation chromatography,凝膠渗 透層析)測得之重量平均分子量為2 000~5〇〇〇〇 ,作為共聚 物前驅體尤佳為4,000〜15,〇〇〇。使用Gpc測得之重量平均 分子量與數量平均分子量之比為,較里佳為 157144.doc •20· 201213359 (2)共聚物前驅體之製造方法 本發明中所使用之共聚物前驅體之製造方法並無特別限 制,可藉由公知方法進行製造,例如可藉由活性聚合使單 體聚合而形成嵌段共聚物。作為活性聚合,可列舉活性自157144.doc •16- 201213359 In the formula (π), R6, R7 and R8 represent a hydrogen atom or a C1 to C3 alkyl group, and represent an aliphatic hydrocarbon group or an alicyclic hydrocarbon group. In the present invention, the ~(10) group can be exemplified as the same as the above formula (IV) containing the repeating unit of the ternary amine group. In the present invention, the aliphatic hydrocarbon group of R9 may be any of saturated or unsaturated, and includes a C1 to C2 fluorene group, an alkyl group of C2 to C2, and an alkynyl group of C2 to C2. Examples of the alkyl group of C1 to C20 include a methyl group, an ethyl group, a n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a t-butyl-n-pentyl group, an isopentyl group, and a neopentyl group. , third mercapto, 2_mercaptobutyl, n-hexyl, isohexyl 3·methylpentyl, ethylbutyl, n-heptyl, 2-methylhexyl, n-octyl, isooctyl*, third Octyl, 2-ethylhexyl, 3-methylheptyl, n-decyl, isodecyl, i-methyloctyl, ethylheptyl, n-decyl, fluorenylmethyl decyl, n-undecane Base, M-dimethylindenyl, n-dodecyl, n-tetradecyl, n-heptadecyl, n-octadecyl and the like. Among these, an alkyl group of C1 to C6 is preferred. Examples of the alkenyl group of C2 to C20 include a vinyl group, a fluorene-propenyl group, a 2-propenyl group, a butenyl group, a 2-butenyl group, a 3-butenyl group, and a decyl-2-propenyl group. 2-methyl-2-propenyl, indolyl, 2-pentenyl, = alkenyl, 4-pentenyl, 1-methyl-2-nitinyl, 2-methyl-2-butene , "hexenyl, 2-hexenyl, 3-hexenyl, 4-hexenyl' 5-hexenyl, heptenyl, octenyl, nonenyl, pentadecenyl, hexa Alkenyl, behenyl, etc.. Among these, a C2 to C6 group is preferred. Examples of the above C2 to C20 alkynyl group include an ethynyl group, a fluorenyl group, and a 157144.doc -17. · 201213359 2-propynyl, 1-butynyl, 2-butynyl, 3-butynyl, 1-methyl-2-propynyl, 2-methyl-2-propynyl, 1- Pentynyl, 2-pentynyl, 3-pentenyl, 4-pentopenyl, 1-indenyl-2-butanyl, 2-methyl-2-butanyl, 丨-hexynyl, 2-hexynyl, 3-hexynyl, 4-hexynyl, 5-hexynyl, 丨-heptyl, 1-octynyl, 1,4-decyl, 1-pentadecanyl, 1 _ twenty fast radicals, 1-tetracosyl alkynyl, etc., preferably C2 to C6 alkynyl groups Further, in the present invention, the alicyclic hydrocarbon group is a saturated or unsaturated hydrocarbon group having a monocyclic or polycyclic cyclic structure in any part of the group, and includes: a C3 to C20 cycloalkyl group, a C4-C20 group. Alkyl-substituted ring-based, C4-C20 cycloalkylalkyl, C3-C2 fluorene cycloalkenyl, C4-C2 oxime-substituted cycloalkenyl, C4~C20 cycloalkenyl The cross-linked cyclic hydrocarbon group of C7 to C20, etc. Examples of the cycloalkyl group of C3 to C20 include a cyclopropyl group, a cyclobutyl group, a decylpentyl group, a cyclohexyl group, a cycloheptyl group, a cyclooctyl group, and the like. Preferably, it is a C3 to C8 cycloalkyl group. As the above-mentioned C4 to C20 alkyl group-substituted cycloalkyl group, 丨-methylcyclopropyl group, 2-ethylcyclopropyl group, 3-methyl group are mentioned. Cyclohexyl, 4-methylcyclohexyl, 4-ethylcyclohexyl, 3-ethylcyclohexyl, 2-methylcyclooctyl, etc. Preferably, an alkyl-substituted cycloalkyl group of C4 to C10 is used. The cycloalkyl group of C3 to C20 may, for example, be cyclopropylmethyl, cyclobutylmethyl, cyclopentyldecyl, cyclohexylmethyl, cycloheptylethyl or cyclooctylethyl. a cycloalkyl group of C4 to C10 Examples of the above-mentioned C3-C20 ring-dense group include a cyclopropenyl group, a cyclobutenyl group, a cyclopentenyl group, a cyclohexenyl group, a cycloheptenyl group, a cyclooctyl group, and a cyclopentyl group 157144.doc • 18· 201213359 The dienyl group is preferably a C3 to C8 cycloalkenyl group. The alkyl group-substituted cycloalkenyl group of the above C4 to C20 may, for example, be 3-ethylcyclopentenyl or hexenyl. 4-methylcyclohexenyl, 4-ethylcyclohexenyl, etc., preferably an alkyl-substituted cycloalkenyl group of CM to C10. Examples of the cycloalkylenealkyl group of the above C4 to C20 include a cyclopropenylmethyl group, a cyclobutenylmethyl group, a cyclopentenylethyl group, and a cyclohexenylethyl group. More preferably, it is a C4 to C10 cycloalkenylalkyl group. Examples of the crosslinked cyclic hydrocarbon group of the above C7 to C.20 include a tricyclo[5·2·1·〇2'6]decane-8-yl group, an adamantyl group, a dicyclopentenyl group, and an isoclinic group. Wait. (Other repeating units which may be contained) Examples of other repeating units which may be contained in the block chain include a repeating unit derived from an aromatic vinyl monomer or a conjugated diene monomer. Examples of the aromatic vinyl monomer include styrene, o-methylphenyrene, p-nonylstyrene, p-tert-butylstyrene, α-mercaptostyrene, and p-butoxybenzene. Ethylene, m-butoxystyrene, p-(1-ethoxyethoxy)styrene, 2,4-dimethylstyrene, vinylaniline, vinylbenzoic acid, vinylnaphthalene, vinyl蒽, 2_vinyl β-pyridinium, 4_vinyl ratio bite, 2-ethylene sulfonium, 4-ethylene sulfonium, 2-ethylene thiophene, 4-ethylene thiophene, etc. An aryl compound or the like may be used alone or in combination of two or more. Examples of the total diene monomer include 1,3-butadiene, isoprene, 2-ethyl-1,3·butadiene, and 2·t-butyl-hydrazine, 3-butadiene. Alkene, 2-phenyl-1,3·butadiene, 2,3-dimercapto·ι,3-butadiene, 1,3-decadiene, 2- I57144.doc •19· 201213359 methyl -1,3-pentadiene, 3-methyl-1,3-pentadiene, iota, 3-hexadiene, 2-methyl-1,3-octane dilute, 4,5-diethyl -1,3-octane, 3-butyl-1,3-octanedipine, anthracene, 3-cyclopentadiene, 1,3-cyclohexadiene, 1,3-cyclooctadiene, 1 In the case of 3-tricyclodecadiene, myrcene, and gas butadiene, these may be used alone or in combination of two or more. 3) Other matters (block chains which may be contained in addition to the block chains (A) and (B) in the copolymer) The copolymer precursor used in the present invention may contain other inlays in addition to the block chain. Segment chain. Examples of such a block chain include an inlaid bond containing a repeating unit derived from a (meth)acrylic monomer, an aromatic vinyl monomer, or a conjugated diene monomer, and a bonding of each repeating unit. It may be any form such as homopolymerization or random copolymerization 'alternating copolymerization, block copolymerization, and the like. The (fluorenyl) acrylic monomer, the aromatic vinyl monomer, the conjugated diene monomer, and the like can be exemplified as described above. (The ratio of the block chain (A) to the block chain (B) in the copolymer and the physical properties such as the molecular weight) The ratio of the block chain (A) to the block chain (B) in the copolymer of the present invention is not particularly The limit is 1 〇 to 4 重量 in a weight-% ratio: 9 〇 to 6 〇, preferably 丨 5 to 35: 85 to 65 〇 again, measured by GPC (gel permeation chromatography) The weight average molecular weight is 2 000 to 5 Å, and the copolymer precursor is particularly preferably 4,000 to 15, 〇〇〇. The ratio of the weight average molecular weight to the number average molecular weight measured by Gpc is 157144.doc •20·201213359 (2) Method for producing copolymer precursor The method for producing the copolymer precursor used in the present invention is It is not particularly limited and can be produced by a known method. For example, a monomer can be polymerized by living polymerization to form a block copolymer. As the living polymerization, active from

由基聚合、活性陰離子聚合等,其中更佳為活性陰離子聚 合。 A 為了形成嵌段共聚物,可於將嵌段鏈(A)或(B)之單體聚 合後,連續地使其他嵌段之單體聚合而進行嵌段共聚物 化,亦可使嵌段鏈(A)與嵌段鏈(B)之各單體分別發生反應 而製作嵌段後,再將各嵌段鍵結。活性陰離子聚合於可嚴 密地控制組成或分子量方面而言較佳。 於藉由活性自由基聚合進行製造之情形時,可與活性陰 離子聚合同樣地進行反應’亦可於將某嵌段之單體聚合 後,於聚合下一單體之前,暫時純化聚合物而除去前一: 應之殘餘單體後,再聚合下-單體。純佳為各嵌段之單 體彼此不相互混入之情形時,較佳為進行聚合物之純化。 於藉由活性陰離子聚合而製造嵌段共聚物之情形時,例 如可於添加有添加劑及聚合起始劑之溶劑中滴加所期望之 單體而進行聚合。此時,為了形成所期望之排列之嵌段聚 合物’而以成為所期望之排列之方式依序滴加各嵌段 體,並使之反應。 為了聚合某嵌段之單體’再聚合下—嵌段之單體,而於 前-嵌段之聚合反應結束後’開始下一嵌段之單體之滴 加。聚合反應之進行可藉由利用氣相層析法或液相層析法 157144.doc •21· 201213359 檢測單體之剩餘量而確m嵌段之單體滴加結束 後’雖然、根據單體或溶劑之種類而有所不同,但 亦可於攪 拌1分鐘至1小時後開始下一嵌段之單體之滴加。 於各嵌段中含有複數種單體之情形時,可分別滴加該 等,亦可同時滴加。 作為用於單體之聚合的陰離子聚合起始劑,只要為親核 劑,且具有使陰離子聚合性單體之聚合開始之作用者,則 無特別限定,例如可使用鹼金屬、有機鹼金屬化合物等。 作為鹼金屬,可列舉:鋰、鈉、鉀、铯等。 作為有機鹼金屬化合物,可列舉:上述鹼金屬之烷基化 物、烯丙基化物、芳基化物等,尤佳為烷基鋰。具體而 s,可使用:乙基鋰、正丁基鋰、第二丁基鋰、第三丁基 鋰、乙基鈉、聯苯基鋰、萘基鋰、聯三苯基鋰、萘基鈉、 萘基鉀、a-甲基苯乙烯鈉二價陰離子、ul_二苯基己基 鋰、1,1-二苯基_3_甲基戊基鋰、14二鋰_2_丁烯、16-二 鋰己烷、聚苯乙烯基鋰、異丙苯基鉀、異丙苯基铯等。該 等陰離子聚合起始劑可單獨使用丨種,或組合像用2種以 上0 陰離子聚合起始劑之使用量相對於所使用之全部陰離子 聚合性單體’通常為0.0001〜0 2當量,較佳為〇 〇〇〇5〜〇丄 當量。藉由使用該範圍之陰離子聚合起始劑,可產率良好 地製造目標聚合物。 關於聚合溫度’只要不引起轉移反應或停止反應等副反 應且為單體獲得消耗而聚合結束之溫度範圍,則無特別限 157144.doc -22· 201213359 制’較佳為於-locrc以上、溶劑沸點以下之溫度範圍内進 行。又’單體相對於聚合溶劑之濃度並無特別限制,通常 為1〜40重量。/。,較佳為1〇〜30重量%。 本發明之製造方法所使用之聚合溶劑,只要不參與聚合 反應且為與聚合物具有相溶性之溶劑,則無特別限制,具 體而言,可例示:二乙基醚、四氫呋喃(THF)、二b号烷、 二噚烷等醚系化合物,四甲基乙二胺、六甲基磷醯三胺等 第3級胺等極性溶劑;己烷或甲笨等脂肪族、芳香族或脂 環烴化合物等非極性溶劑或低極性溶劑◊該等溶劑可單獨 使用1種,或以2種以上之混合溶劑使用。於本發明之製造 方法中,即使於將非極性溶劑或低極性溶劑與極性溶劑併 用之情形時,亦可精度良好地控制聚合,例如非極性溶劑 或低極性溶劑相對於全部溶劑,可使用5體積%以上,亦 可使用20體積%以上,亦可使用5〇體積%以上。 於本發明中,視需要亦可將二乙基鋅等二烷基辞,二丁 基鎂等二烷基鎂、三乙基鋁等有機金屬用作聚合穩定化 劑、單體或溶劑之純化劑。 於本發明中,視需要可於聚合開始時或聚合過程中添加 驗金屬鹽或驗土金屬添加劑。作為此種添加劑,具體 而έ,可例示:鈉、鉀、鋇、鎂之硫酸鹽、硝酸鹽、硼酸 鹽等礦酸鹽或齒化物;更具體而言,可列舉:鋰或鋇之氣 化物、溴化物、碘化物,或硼酸鋰、硝酸鎂、氯化鈉 '氯 化卸等。該等中,較佳為鐘之齒化物,例如氣化裡、漠化 鋰、碘化鋰、氟化鋰,尤佳為氣化鋰。 157144.doc •23- 201213359 藉由活性陰離子聚合使含有4級銨鹽基之單體聚合一般 較為困難。因&,藉由活性陰離子聚合製造含有具有(級 銨鹽基之重複單元的聚合物之情形時,可於聚合成為含有 3級胺基之重複單元之原料的單體後,藉由公知方法將該3 級胺基4級化。作為4級化劑,可列舉:氣化辛 峨化”,或氣甲烧、氣乙烧、漠甲:化:甲化 烷,硫酸二甲酯、硫酸二乙酯、硫酸二正丙酯等一般烷基 化劑。 (3)嵌段共聚物 本發明中所製造之嵌段共聚物分別含有至少1個以下之 嵌段鏈(A)及嵌段鏈(B1)。 谈段鏈(A):含有選自由含有3級胺基之重複單元及含有 4級敍鹽基之重複單元所組成之群中之至少1種重複單元的 嵌段鏈 嵌段鏈(B1):包含含有酸性基之重複單元及式(π)所示 之重複單元之嵌段鏈 又’本發明之共聚物除上述嵌段鏈(A)及嵌段鏈(B1)以 外,亦可含有其他嵌段鏈。 1) 嵌段鏈(A) 嵌段共聚物中之嵌段鏈(A)與上述共聚物前驅體中之嵌 段键(A)相同。 2) 嵌段鏈(B1) 嵌段鏈(B1)係含有至少1種含有酸性基之重複單元、與 至少1種式(II)所示之重複單元的共聚物。 157144.doc -24- ⑧ 201213359 於丧段鍵(B1)中’至少1種式(II)所示之重複單元之共聚 合比率為90質量%以上,較佳為91質量%〜99質量0/〇。From the group polymerization, living anionic polymerization and the like, among them, the living anion is more preferably polymerized. A. In order to form a block copolymer, after the monomer of the block chain (A) or (B) is polymerized, the monomer of the other block may be continuously polymerized to block copolymerize, or the block chain may be obtained. (A) After reacting with each monomer of the block chain (B) to form a block, each block is bonded. The living anionic polymerization is preferred in terms of tightly controlling the composition or molecular weight. In the case of production by living radical polymerization, the reaction can be carried out in the same manner as the living anionic polymerization. Alternatively, after the monomer of a certain block is polymerized, the polymer is temporarily purified and removed before the next monomer is polymerized. The former one: After the residual monomer, the next monomer is polymerized. In the case where the monomers of the respective blocks are not mixed with each other, it is preferred to carry out purification of the polymer. In the case of producing a block copolymer by living anionic polymerization, for example, a desired monomer can be added dropwise to a solvent to which an additive and a polymerization initiator are added to carry out polymerization. At this time, in order to form the block polymer ' of the desired arrangement, each block is sequentially dropped and reacted in such a manner as to have a desired arrangement. In order to polymerize the monomer of a block, the monomer of the lower block is repolymerized, and after the polymerization of the pre-block is completed, the dropwise addition of the monomer of the next block is started. The polymerization can be carried out by using gas chromatography or liquid chromatography 157144.doc • 21· 201213359 to detect the remaining amount of the monomer and confirming that the monomer of the m block is added after the end. The type of the solvent may vary, but it is also possible to start the dropwise addition of the monomer of the next block after stirring for 1 minute to 1 hour. In the case where a plurality of monomers are contained in each block, these may be added dropwise or may be added dropwise at the same time. The anionic polymerization initiator used for the polymerization of the monomer is not particularly limited as long as it is a nucleophilic agent and has a function of starting polymerization of the anion polymerizable monomer. For example, an alkali metal or an organic alkali metal compound can be used. Wait. Examples of the alkali metal include lithium, sodium, potassium, rubidium, and the like. The organic alkali metal compound may, for example, be an alkylate, an allyl compound or an aryl compound of the above alkali metal, and more preferably an alkyl lithium. Specifically, s can be used: ethyl lithium, n-butyl lithium, second butyl lithium, t-butyl lithium, ethyl sodium, biphenyl lithium, naphthyl lithium, triphenyl lithium, naphthyl sodium , naphthyl potassium, sodium a-methylstyrene dianion, ul-diphenylhexyl lithium, 1,1-diphenyl-3-methylpentyl lithium, 14 dilithium 2 -butene, 16 - dilithium hexane, polystyryl lithium, cumyl potassium, cumene hydrazine, and the like. These anionic polymerization initiators may be used singly or in combination, and the amount of use of two or more kinds of anionic polymerization initiators is usually 0.0001 to 0 2 equivalents relative to all anionic polymerizable monomers used. Good for 〇〇〇〇 5 ~ 〇丄 equivalent. By using an anionic polymerization initiator of this range, the target polymer can be produced in a good yield. The polymerization temperature 'is not particularly limited to -locrc or more, as long as it does not cause a side reaction such as a shift reaction or a reaction such as a reaction, and the monomer is consumed and the polymerization is completed. It is carried out within the temperature range below the boiling point. Further, the concentration of the monomer relative to the polymerization solvent is not particularly limited and is usually from 1 to 40% by weight. /. Preferably, it is from 1 to 30% by weight. The polymerization solvent to be used in the production method of the present invention is not particularly limited as long as it does not participate in the polymerization reaction and is compatible with the polymer, and specific examples thereof include diethyl ether, tetrahydrofuran (THF), and An ether compound such as alkane or dioxane; a polar solvent such as a third amine such as tetramethylethylenediamine or hexamethylphosphonium triamine; or an aliphatic, aromatic or alicyclic hydrocarbon such as hexane or methyl bromide. A non-polar solvent such as a compound or a low-polarity solvent may be used alone or in combination of two or more. In the production method of the present invention, even when a nonpolar solvent or a low polar solvent is used in combination with a polar solvent, the polymerization can be controlled with high precision, for example, a nonpolar solvent or a low polar solvent can be used with respect to all solvents. The volume% or more may be 20% by volume or more, and may be 5% by volume or more. In the present invention, an organic metal such as a dialkyl group such as diethyl zinc or a dialkyl magnesium or a triethyl aluminum such as dibutyl magnesium may be used as a polymerization stabilizer, a monomer or a solvent. Agent. In the present invention, a metal salt or a soil test metal additive may be added at the start of polymerization or during the polymerization as needed. Specific examples of such an additive include a mineral acid salt or a dentate such as a sulfate of sodium, potassium, barium or magnesium, a nitrate or a borate; more specifically, a vapor of lithium or cesium is exemplified. , bromide, iodide, or lithium borate, magnesium nitrate, sodium chloride 'chlorination and so on. Among these, it is preferably a tooth of a bell, such as gasification, lithium desertification, lithium iodide, lithium fluoride, and particularly preferably lithium vapor. 157144.doc •23- 201213359 It is generally difficult to polymerize monomers containing a quaternary ammonium salt group by living anionic polymerization. When a monomer having a repeating unit having a (quaternary ammonium salt group) is produced by living anionic polymerization, a monomer which can be polymerized into a raw material of a repeating unit containing a tertiary amino group can be produced by a known method. The tertiary amine group is 4-staged. As the 4-staged agent, there may be mentioned: gasification of octenant, or gas-fired, gas-fired, and desertified: methylated, dimethyl sulfate, sulfuric acid A general alkylating agent such as diethyl ester or di-n-propyl sulfate. (3) Block copolymer The block copolymer produced in the present invention contains at least one of the following block chains (A) and block chains, respectively. (B1) Talk about the segment chain (A): a block chain block chain containing at least one repeating unit selected from the group consisting of a repeating unit containing a tertiary amino group and a repeating unit containing a 4-stage salt group; (B1): a block chain comprising a repeating unit containing an acidic group and a repeating unit represented by the formula (π). Further, the copolymer of the present invention is in addition to the above-mentioned block chain (A) and block chain (B1). May contain other block chains. 1) Block chain (A) Block chain (A) in block copolymer and embedded in the above copolymer precursor The bond (A) is the same. 2) Block chain (B1) The block chain (B1) is a copolymer containing at least one repeating unit containing an acidic group and at least one repeating unit represented by the formula (II). .doc -24- 8 201213359 The copolymerization ratio of at least one of the repeating units represented by the formula (II) in the stagnation button (B1) is 90% by mass or more, preferably 91% by mass to 99% by mass. .

(含有酸性基之重複單元) 嵌段鏈(B1)中之含有酸性基之重複單元為式(111)所示之 重複單元。 [化 14](Repeating unit containing an acidic group) The repeating unit containing an acidic group in the block chain (B1) is a repeating unit represented by the formula (111). [Chem. 14]

式(III)中’ R1、R2、R3、X與式⑴所示之含有 經保護之 酸性基之重複單元含義相同。 式(III)所示之重複單元可藉由將式⑴所示之經保護之酸 性基的保護基藉由本發明之製造方法脫保護而獲得。 (式(II)所示之重複單元) 嵌段鏈(B1)中之式(II)所示之重複單元與上述共聚物前 驅體中之式(II)所示之重複單元相同。 (其他可含有之重複單元) 作為嵌段鏈(B1)中之其他可含有之重複單元,與上述共 聚物前驅體之嵌段鏈(B)中之其他可含有之重複單元相 同。 (嵌段共聚物中之嵌段鏈(A)、(B1)以外之可含有之嵌段鍵) 本發明中所使用之共聚物除嵌段鏈(A)及(B1)以外,亦 可具有其他包含聚合物之嵌段鏈。 157144.doc •25· 201213359 於共聚物前驅體中,此種嵌段鏈與嵌段鏈(A)、(B)以外 之可含有之嵌段鏈相同。 (共聚物中之嵌段鏈(A)與嵌段鏈(B1)之比及分子量等物性) 本發明中所使用之共聚物中之嵌段鍵(A)與嵌段鏈(B i) 之比並無特別限制,以重量%比計為1〇〜4〇 : 9〇〜6〇,較佳 為15〜35 : 85〜65 ^又,共聚物中之具有酸性基之重複單元 之含有比率為0.5〜20重量% ’較佳為卜15重量%。 又,使用GPC測得之重量平均分子量為2〇〇〇〜5〇〇〇〇, 作為分散劑較佳為2,000〜2〇,〇〇〇,更佳為4 〇〇〇〜15 〇〇〇。 使用GPC測得之重量平均分子量與數量平均分子量之比為 1.0〜2.0 ’作為分散劑尤佳為1. 〇〜丨5。 (4)嵌段共聚物之製造方法 本發明之嵌段共聚物可藉由加熱上述共聚物前驅體而獲 得。藉由加熱共聚物前驅體,而使共聚物前驅體中之保護 酸性基之保護基脫保護。 加熱溫度雖然根據保護酸性基之保護基之結構而有所不 同’但只要為可迅速進行脫保護反應之溫度則無特別限 制。通常較佳為於8〇t〜200。(:下進行,更佳為1〇〇〇c〜 160〇C。 脫保護反應可對共聚物前驅體直接加熱,亦可於將妓聚 物前驅體溶解至溶劑中之狀態下加熱》作為此種溶劑,可 列舉:水;乙酸乙基溶纖劑、乙酸甲基溶纖劑、丙二醇單 甲基醚乙酸酯(PGMEA)及丙二醇單乙基醚乙酸酿等二醇趟 酯系溶劑;乙基溶纖劑、曱基溶纖劑、丙二醇單甲基鱗、 157144.doc • 26· 201213359 丙二醇單乙㈣及二乙二醇二甲基⑽等二醇單或二趟系溶 劑;甲苯、單氯苯等芳香族烴系溶劑;乙帛、異丙醇、正 丁醇、1-甲氧基-2-丙醇(PGME)等醇系溶劑;乳酸乙醋、 乙酸丁醋及丙酮酸乙自旨等H容劑;&包含該等之2種以 上的混合溶劑等。該等中,較佳為二醇驗㈣㈣、二醇 趟酿系溶劑與醇系溶劑之混合溶H㈣系溶劑與水 之混合溶劑。就可降低反應溫度之觀點而言,較佳為二醇 賴系溶劑與醇系溶劑之混合溶劑、二醇㈣系溶劑與水 之混合溶劑,尤佳為二醇醚酯系溶劑與水之混合溶劑。就 易除去由脫保護反應所生成之副產物之觀點而言,較佳為 二醇喊醋系溶劑與水之混合溶劑’尤佳為PGMEA與水之 混合溶劑。 於二醇醚酯系溶劑與醇系溶劑之混合溶劑中,關於其混 合比例’只要可溶解共聚物前驅體’則無特別限制,通常 較佳為95/5重量%〜〇.1/99.9重量%,更佳為5〇/5〇〜〇 1/99 9 重量%。 於二醇醚酯系溶劑與水之混合溶劑中,關於其混合比 例,只要可溶解共聚物前驅體,則無特別限制,通常較佳 為95/5〜50/50重量%,更佳為9〇/10〜6〇/4〇重量%,尤佳為 90/10〜70/30重量 %。 加熱溫度雖然根據保護酸性基之保護基之結構、反應溶 劑而有所不同,但只要為可迅速進行脫保護反應之溫度, 則無特別限制。 於使用二醇醚酯系溶劑之情形時,通常較佳為於 157144.doc •27· 201213359 80t〜2〇n:下進行,更佳為於丨崎q 7G。口進行。於使 用二醇㈣系溶劑與醇系溶劑之混合溶劑之情形時,較佳 為於um^uot下進行,更佳為於U(rc〜i4(rc下進行。 於使用二醇’旨系溶劑與水之混合溶劑之情形時,較佳為 於7〇°C〜12G°C下進行,更佳為於9G°C〜12G°C下進行。就降 低由脫保護反應所生成之聚合物溶液之著色的觀點而言, 較佳為加熱溫度降得更低。 [實施例] 以下,使用實施例詳細說明本發明,但本發明之技術範 圍不受該等例示限定。 [實施例1 ] (聚合步驟) 於反應容器中添加四氫呋喃(以下有時簡稱為THF)55 7 份、氯化鋰(濃度為4.54重量%之1'财溶液)4.65份、二苯乙 烯0.45份,冷卻至-60°C。其後,添加正丁基鋰丨22份(濃 度為15_36重量%之己烧溶液)並熟化1〇分鐘。 其次,以120分鐘滴加甲基丙烯酸1 _乙氧基乙醋(以下有 時簡稱為EEMA) 1_66份、甲基丙稀酸正丁酯(以下有時簡稱 為ηΒΜΑ)9·9份、曱基丙烯酸甲酯(以下有時簡稱為 MMA)4.14份之混合液,於滴加後繼續反應1 5分鐘。繼 而,藉由氣相層析法(以下簡稱為GC)進行測定,確認單體 消失。 其次’滴加曱基丙稀酸2-(二甲基胺基)乙醋(以下有時簡 稱為DMMA)3.96份,滴加後繼續反應30分鐘。繼而,藉由 157144.doc • 28 - 201213359 GC測定而確認單體消失後,添加曱醇0.41份而停止反應。 藉由凝膠滲透層析(以下簡稱為GPC)(流動相DMF (dimethylformamide,二曱基曱醯胺),以聚甲基丙稀酸曱 酯(以下有時簡稱為PMMA)為標準)分析所獲得之共聚物, 確認其係分子量(Mw)為12,220,分子量分佈(Mw/Mn)為 1.46,組成比為 DMMA-[nBMA/MMA/EEMA]=21-[48/22/9] 重量%之共聚物。 (脫保護步驟) 於所獲得之前驅體聚合物之濃度為25重量%之丙二醇單 曱基醚乙酸酯(以下有時簡稱為PGMEA)溶液65.64份中添 加水16.44份,加熱至l〇〇°C使之反應8小時。蒸餾除去水 分,而製備濃度為40重量%2PGMEA溶液。 藉由GPC(流動相DMF,以PMMA為標準)分析所獲得之 共聚物,確認其係分子量(Mw)為12,720,分子量分佈 (Mw/Mn)為 1.46,組成比為 DMMA-[nBMA/MMA/MA]=22-[5 0/23/5]重量%之共聚物(ΜΑ表示甲基丙烯酸)。 所獲得之聚合物溶液係微黃色透明者。 [實施例2] (聚合步驟) 於反應容器中添加THF 600.30份、氯化鋰(3.63重量%濃 度丁1^溶液)10.80份、二苯乙烯3.84份,冷卻至-60它。其 後添加正丁基鋰9.60份(15.36重量%濃度己烷溶液)並熟化 10分鐘。 其次,以30分鐘滴加nBMA103·84份、EEMA13.45份之 157144.doc 29- 201213359 混合液,滴加後繼續反應15分鐘。繼而’藉由GC進行測 定,確認單體消失。對反應液之一部分進行取樣,藉由 GPC(流動相DMF,以PMMA為標準)進行分析’結果分子 量(Mw)為2,910,分子量分佈(Mw/Mn)為1.03。 其次,滴加DMMA 32.25份,滴加後繼續反應30分鐘。 繼而,藉由GC進行測定,確認單體消失後,添加甲醇3.42 份而停止反應。 藉由GPC(流動相DMF,以PMMA為標準)分析所獲得之 共聚物,結果分子量(Mw)為4,010、分子量分佈(Mw/Mn) 為 1.07。 (脫保護步驟) 將所獲得之共聚物之濃度為50重量%之PGMEA溶液220 份加熱至160°C並熟化3小時。 藉由GPC(流動相DMF,以PMMA為標準,更換管柱)分 析所獲得之共聚物,確認其係分子量(Mw)為12,040,分子 量分佈(Mw/Mn)為 1.24,組成比為 DMMA-[nBMA/MA]=22-[73/5]重量%之共聚物。 所獲得之聚合物溶液為茶色。 [產業上之可利用性] 根據本發明,可製造如下之嵌段共聚物,其含有嵌段鏈 (A)與嵌段鏈(B1)且式(II)所示之重複單元之共聚合比率於 嵌段鏈(B1)中為90質量%以上,該嵌段鏈(A)係含有選自由 含有3級胺基之重複單元及含有4級銨鹽基之重複單元所組 成之群中之至少1種重複單元者,該嵌段鏈(B1)係含有式 157144.doc • 30· 201213359 (III)所示之含有酸性基之重複單元及式(II)所示之重複單 元者。該等嵌段共聚物尤其可用作顏料之分散劑等。 157144.doc -31 -In the formula (III), 'R1, R2, R3 and X have the same meanings as the repeating unit having a protected acidic group represented by the formula (1). The repeating unit represented by the formula (III) can be obtained by deprotecting the protective group of the protected acid group represented by the formula (1) by the production method of the present invention. (Repeating unit represented by the formula (II)) The repeating unit represented by the formula (II) in the block chain (B1) is the same as the repeating unit represented by the formula (II) in the above copolymer precursor. (Other repeating units which may be contained) The other repeating unit which may be contained in the block chain (B1) is the same as the other repeating unit which may be contained in the block chain (B) of the above copolymer precursor. (Block bond which may be contained in the block copolymer other than the block chain (A) or (B1)) The copolymer used in the present invention may have, in addition to the block chain (A) and (B1), Other block chains comprising a polymer. 157144.doc •25· 201213359 In the copolymer precursor, such a block chain is the same as the block chain which may be contained other than the block chains (A) and (B). (The ratio of the block chain (A) to the block chain (B1) in the copolymer and the physical properties such as molecular weight) The block bond (A) and the block chain (B i) in the copolymer used in the present invention The ratio is not particularly limited, and is 1 〇 to 4 重量 in a weight-% ratio: 9 〇 to 6 〇, preferably 15 to 35: 85 to 65 ^ Further, the content ratio of the repeating unit having an acidic group in the copolymer It is 0.5 to 20% by weight 'preferably 15% by weight. Further, the weight average molecular weight measured by GPC is 2 Torr to 5 Torr, and the dispersing agent is preferably 2,000 to 2 Torr, more preferably 4 Torr to 15 Torr. The ratio of the weight average molecular weight to the number average molecular weight measured by GPC is 1.0 to 2.0 Å as a dispersing agent, particularly preferably 1. 〇~丨5. (4) Process for producing block copolymer The block copolymer of the present invention can be obtained by heating the above copolymer precursor. The protecting group protecting the acidic group in the copolymer precursor is deprotected by heating the copolymer precursor. The heating temperature varies depending on the structure of the protecting group for protecting the acidic group, but there is no particular limitation as long as the temperature at which the deprotection reaction can be rapidly carried out. It is usually preferably from 8 〇 t to 200. (Below, more preferably 1〇〇〇c~160〇C. The deprotection reaction can directly heat the copolymer precursor, or can be heated in a state where the ruthenium polymer precursor is dissolved in a solvent. Examples of the solvent include water; ethyl cellosolve acetate, methyl cellosolve acetate, propylene glycol monomethyl ether acetate (PGMEA), and propylene glycol monoethyl ether acetate. Base solubilizer, bismuth-based cellosolve, propylene glycol monomethyl scale, 157144.doc • 26· 201213359 propylene glycol monoethyl (tetra) and diethylene glycol dimethyl (10) and other diol mono or diterpenoid solvents; toluene, single An aromatic hydrocarbon solvent such as chlorobenzene; an alcohol solvent such as acetamidine, isopropanol, n-butanol or 1-methoxy-2-propanol (PGME); lactic acid ethyl acetate, butyl acetate and pyruvic acid The above-mentioned H-containing agent; and the above-mentioned two or more kinds of mixed solvents and the like are included. Among them, the diol test (4) (4), the diol brewing solvent and the alcohol solvent are mixed with the H(tetra) solvent and water. The solvent mixture is preferably a mixed solvent of a diol-based solvent and an alcohol-based solvent from the viewpoint of lowering the reaction temperature. The diol (4) is a mixed solvent of a solvent and water, and more preferably a mixed solvent of a glycol ether ester solvent and water. From the viewpoint of easily removing by-products formed by the deprotection reaction, it is preferably a diol vinegar. A solvent mixture of a solvent and water is particularly preferably a mixed solvent of PGMEA and water. In a mixed solvent of a glycol ether ester solvent and an alcohol solvent, the mixing ratio 'as long as the copolymer precursor is soluble' is not particularly The limitation is usually preferably 95/5 wt% to 1/99.9 wt%, more preferably 5〇/5〇~〇1/99 9 wt%. In a mixed solvent of a glycol ether ester solvent and water. The mixing ratio is not particularly limited as long as the copolymer precursor is soluble, and is usually preferably 95/5 to 50/50% by weight, more preferably 9〇/10 to 6〇/4〇% by weight, particularly The temperature is preferably 90/10 to 70/30% by weight. The heating temperature varies depending on the structure of the protecting group protecting the acidic group and the reaction solvent, but is not particularly limited as long as it is a temperature at which the deprotection reaction can be rapidly carried out. When a glycol ether ester solvent is used, it is usually preferably 157144.doc •27·201213359 80t~2〇n: The next step is more preferably carried out in the mouth of the Nagasaki q 7G. When using a mixed solvent of a diol (tetra) solvent and an alcohol solvent, it is preferably um^uot. Further, it is preferably carried out under U (rc~i4 (r. under rc. When diol is used as a mixed solvent of a solvent and water, it is preferably carried out at 7 ° C to 12 G ° C, more Preferably, it is carried out at 9 G ° C to 12 G ° C. From the viewpoint of lowering the color of the polymer solution formed by the deprotection reaction, it is preferred that the heating temperature is lowered. [Examples] The present invention is described in detail, but the technical scope of the present invention is not limited by the examples. [Example 1] (Polymerization step) To a reaction vessel, 55 7 parts of tetrahydrofuran (hereinafter sometimes abbreviated as THF), lithium chloride (concentration of 4.54% by weight of 1's solution), 4.65 parts, and 0.45 parts of stilbene were added. , cooled to -60 ° C. Thereafter, 22 parts of n-butyllithium ruthenium (15-36 wt% of a hexane solution) was added and aged for 1 Torr. Next, 1 to 66 parts of methacrylic acid methacrylate (hereinafter sometimes abbreviated as EEMA) and n-butyl methacrylate (hereinafter sometimes abbreviated as η ΒΜΑ) 9·9 parts were added dropwise in 120 minutes. A mixture of methyl acrylate (hereinafter sometimes abbreviated as MMA) of 4.14 parts was allowed to continue to react for 15 minutes after the dropwise addition. Then, the measurement was carried out by gas chromatography (hereinafter abbreviated as GC) to confirm the disappearance of the monomer. Next, 3.96 parts of 2-(dimethylamino)acetic acid (hereinafter sometimes referred to as DMMA) of mercaptopropionate was added dropwise, and the reaction was continued for 30 minutes after the dropwise addition. Then, after confirming the disappearance of the monomer by 157144.doc • 28 - 201213359 GC measurement, 0.41 parts of sterol was added to stop the reaction. Analyzed by gel permeation chromatography (hereinafter referred to as GPC) (mobile phase DMF (dimethylformamide), polymethyl methacrylate (hereinafter sometimes referred to as PMMA) as a standard) The copolymer obtained was confirmed to have a molecular weight (Mw) of 12,220, a molecular weight distribution (Mw/Mn) of 1.46, and a composition ratio of DMMA-[nBMA/MMA/EEMA]=21-[48/22/9]% by weight. Copolymer. (Deprotection step) 16.64 parts of water was added to 65.64 parts of a solution of propylene glycol monodecyl ether acetate (hereinafter sometimes abbreviated as PGMEA) having a concentration of 25% by weight of the precursor polymer obtained, and heated to 1 Torr. The reaction was allowed to proceed for 8 hours at °C. The water was distilled off to prepare a solution of 40% by weight of 2PGMEA. The obtained copolymer was analyzed by GPC (mobile phase DMF, PMMA) to confirm that the molecular weight (Mw) was 12,720, the molecular weight distribution (Mw/Mn) was 1.46, and the composition ratio was DMMA-[nBMA/MMA/ MA]=22-[5 0/23/5]% by weight of the copolymer (ΜΑ represents methacrylic acid). The polymer solution obtained was slightly yellowish transparent. [Example 2] (Polymerization step) 600.30 parts of THF, 10.80 parts of lithium chloride (3.63 wt% of a solution of butyl hydride), 3.84 parts of stilbene were added to a reaction vessel, and it was cooled to -60. Thereafter, 9.60 parts of n-butyllithium (15.36% by weight of a hexane solution) was added and aged for 10 minutes. Next, a mixture of nBMA 103·84 parts and EEMA 13.45 parts of 157144.doc 29-201213359 was added dropwise over 30 minutes, and the reaction was continued for 15 minutes after the dropwise addition. Then, by GC, it was confirmed that the monomer disappeared. A portion of the reaction liquid was sampled and analyzed by GPC (mobile phase DMF, using PMMA as a standard). The resulting molecular weight (Mw) was 2,910, and the molecular weight distribution (Mw/Mn) was 1.03. Next, 32.25 parts of DMMA was added dropwise, and the reaction was continued for 30 minutes after the dropwise addition. Then, after measuring by GC, it was confirmed that the monomer disappeared, and 3.42 parts of methanol was added to stop the reaction. The copolymer obtained was analyzed by GPC (mobile phase DMF, PMMA), and the molecular weight (Mw) was 4,010 and the molecular weight distribution (Mw/Mn) was 1.07. (Deprotection step) 220 parts of the PGMEA solution having a concentration of the obtained copolymer of 50% by weight was heated to 160 ° C and aged for 3 hours. The obtained copolymer was analyzed by GPC (mobile phase DMF, PMMA as a standard, and the column was replaced), and it was confirmed that the molecular weight (Mw) was 12,040, the molecular weight distribution (Mw/Mn) was 1.24, and the composition ratio was DMMA-[ nBMA/MA]=22-[73/5]% by weight of the copolymer. The polymer solution obtained was brown. [Industrial Applicability] According to the present invention, a block copolymer containing a copolymerization ratio of a block chain (A) and a block chain (B1) and a repeating unit represented by the formula (II) can be produced. It is 90% by mass or more in the block chain (B1), and the block chain (A) contains at least one selected from the group consisting of a repeating unit containing a tertiary amino group and a repeating unit containing a 4-stage ammonium salt group. In the case of one repeating unit, the block chain (B1) contains a repeating unit containing an acidic group and a repeating unit represented by the formula (II) represented by the formula 157144.doc • 30·201213359 (III). These block copolymers are especially useful as dispersants for pigments and the like. 157144.doc -31 -

Claims (1)

201213359 七、申請專利範圍: 1. 一種嵌段共聚物之製造方法,該嵌段共聚物係含有嵌段 鏈(A)與嵌段鏈(B1),上述嵌段鏈(A)係含有選自由含有3 級胺基之重複單元及含有4級銨鹽基之重複單元所組成 之群中之至少1種重複單元者,上述嵌段鏈(B1)係含有式 (III)所示之含有酸性基之重複單元及式(Π)所示之重複單 元者且式(II)所示之重複單元之共聚合比率於嵌段鏈(B1) 中為90質量%以上, [化2]201213359 VII. Patent Application Range: 1. A method for producing a block copolymer comprising a block chain (A) and a block chain (B1), wherein the block chain (A) is selected from the group consisting of The at least one repeating unit of the group consisting of a repeating unit having a third-order amine group and a repeating unit containing a fourth-order ammonium salt group, wherein the block chain (B1) contains an acidic group represented by the formula (III) The copolymerization ratio of the repeating unit and the repeating unit represented by the formula (II) and the repeating unit represented by the formula (II) is 90% by mass or more in the block chain (B1), [Chemical 2] (式中,R6、R7、R8分別獨立地表示氫原子或C1〜C3烷 基’ R9表示脂肪族烴基或脂環烴基) [化3](wherein R6, R7 and R8 each independently represent a hydrogen atom or a C1 to C3 alkyl group; R9 represents an aliphatic hydrocarbon group or an alicyclic hydrocarbon group) [Chemical 3] (式中’ R1、R2、R3分別獨立地表示氫原子或C1~C3烷 基;X表示單鍵或選自由C1-C10伸烷基、-C(=0)0Rla-、-C(=〇)NHRla_、_0C(=0)Rla-及 _R2a-〇C(=〇)-Rla_ 所組 成之群中之基(Rla、1123分別獨立地表示C1〜Cl〇伸烷基或 C1〜C10伸烷基-Ο-Cl〜C10伸烷基));該方法之特徵在 於:加熱含有嵌段鏈(A)與嵌段鏈(B)之共聚物前驅體, 其中上述嵌段鍵(B)係含有式⑴所示之含有經保護之酸 性基之重複單元及式(II)所示之重複單元者且式(Π)所示 157144.doc 201213359 之重複單元之共聚合比率於嵌段鏈(B)中為90質量。/〇以 [化1]Wherein R 1 , R 2 and R 3 each independently represent a hydrogen atom or a C 1 C to C 3 alkyl group; X represents a single bond or is selected from a C 1 -C 10 alkyl group, -C(=0)0 Rla-, -C (=〇 a group of NHRla_,_0C(=0)Rla- and _R2a-〇C(=〇)-Rla_ (Rla, 1123 independently represent C1~Cl〇 alkyl or C1~C10 alkylene a method of heating a copolymer precursor comprising a block chain (A) and a block chain (B), wherein the block bond (B) contains a copolymerization ratio of a repeating unit having a protected acidic group and a repeating unit represented by the formula (II) represented by the formula (1) and having a repeating unit of 157144.doc 201213359 represented by the formula (Π) in the block chain (B) Medium is 90 quality. /〇以[化1] (式中’ R1、R2、R3、X表示與式(III)相同之含義,r4表 示氫原子、C1〜C6烷基、C6〜C10芳基C1〜C6烷基或 C6〜C10芳基,r5表示ci〜C6烧基、C6〜C10芳基C1~C6院 基或C6〜C10芳基)。 2.如請求項1之嵌段共聚物之製造方法,其中含有3級胺基 之重複單元為式(IV)所示之重複單元, [化4](wherein R 1 , R 2 , R 3 and X represent the same meanings as in the formula (III), and r 4 represents a hydrogen atom, a C 1 -C 6 alkyl group, a C 6 -C 10 aryl C 1 -C 6 alkyl group or a C 6 -C 10 aryl group, r 5 Represents ci~C6 alkyl, C6~C10 aryl C1~C6 or C6~C10 aryl). 2. The method for producing a block copolymer according to claim 1, wherein the repeating unit having a tertiary amino group is a repeating unit represented by the formula (IV), [Chemical 4] (式中,Ri〇、Rn、R〗2分別獨立地表示氫原子或以〜以烷 基,Y表示選自由C1〜C10伸院基、-c( = 〇)〇Rlb_ C(~0)NHR b-、-〇C(=〇)Rlb-及-R2b_〇c(=〇)-Rib_所組 成之群中之基(R b、R2b分別獨立地表示c 1〜c 1 〇伸烧基或 C卜CIO伸烷基_〇_C1〜C1〇伸烷基),R13、Rl4分別獨立地 表不C1〜C6烧基或C6〜C10芳基C1〜C6院基)〇 用长項1之嵌·^共聚物之製造方法,其中含有4級敍鹽 基之重複單元為式(V)所示之重複單元, 157J44.doc ⑧ -2 201213359 [化5](wherein, Ri, Rn, and R 2 each independently represent a hydrogen atom or an alkyl group, and Y represents a radical selected from C1 to C10, -c(= 〇)〇Rlb_C(~0)NHR a group in the group consisting of b-, -〇C(=〇)Rlb- and -R2b_〇c(=〇)-Rib_ (R b, R2b independently represent c 1~c 1 〇 stretching base, respectively) Or C 卜 CIO alkyl _ 〇 _C1 ~ C1 烷基 alkyl), R13, Rl4 independently represent C1 ~ C6 alkyl or C6 ~ C10 aryl C1 ~ C6 yard base) 长 with long term 1 embedded The method for producing a copolymer, wherein the repeating unit having a 4-stage salt base is a repeating unit represented by the formula (V), 157J44.doc 8 -2 201213359 [Chemical 5] (式中,R15、R16、R!7分別獨立地表示氫原子或匸卜以烷 基’ Y1表示選自由C1〜C10伸烧基、_C( = 〇)〇Rlc-、(wherein R15, R16, and R!7 each independently represent a hydrogen atom or a silane group, and Y1 represents a group selected from C1 to C10, _C(= 〇) 〇Rlc-, 之群中之基(Rlc、R2c分別獨立地表示Ci〜ci〇伸烧基或 C1〜C10伸院基-Ο-Cl〜C10伸烧基),R18、r19、r2〇分別獨 立地表示cn〜C6烷基或C6〜C10芳基C1〜C6烷基,ζ·表示 抗衡離子)。 4. 如請求項1至3中任一項之嵌段共聚物之製造方法,其係 於有機溶劑與水之混合溶劑中進行》 5. —種共聚物前驅體’其係含有嵌段鏈(A)與嵌段鍵(B), 該嵌段鏈(A)係含有選自由含有3級胺基之重複單元及含 有4級錢鹽基之重複單元所組成之群中之至少1種重複單 元者,該敌段鍵(B)係含有式(I)所示之含有經保護之酸 性基之重複單元及式(II)所示之重複單元者且式(II)所示 之重複單元之共聚合比率於嵌段鏈(B)中為90質量%以 上, [化6]The group in the group (Rlc, R2c independently represent Ci~ci〇 extension base or C1~C10 extension base-Ο-Cl~C10 extension base), and R18, r19, r2〇 respectively represent cn~ C6 alkyl or C6 to C10 aryl C1 to C6 alkyl, ζ· represents a counter ion). 4. The method for producing a block copolymer according to any one of claims 1 to 3, which is carried out in a mixed solvent of an organic solvent and water. 5. A copolymer precursor comprising a block chain ( A) and block bond (B), the block chain (A) comprising at least one repeating unit selected from the group consisting of a repeating unit containing a tertiary amino group and a repeating unit containing a 4-hydroxyl group The enemy group bond (B) is a combination of a repeating unit having a protected acidic group represented by the formula (I) and a repeating unit represented by the formula (II) and a repeating unit represented by the formula (II). The polymerization ratio is 90% by mass or more in the block chain (B), [Chemical 6] 157144.doc 201213359 (式中’ R1、R2、r3分別獨立地表示氩原子或ChC3烷 基;X表示單鍵或選自由Cl〜CIO伸烷基、-C(=0)0Rla-' -C(=〇)NHRla- > -OC(=〇)R,a-^-R2a-0C(=0)-Rla-m ^ 成之群中之基(Rla、R2a分別獨立地表示Cl〜CIO伸烷基或 Cl〜CIO伸烷基_〇_C1〜C1〇伸烷基),R4表示氫原子、 C1〜C6烷基、C6〜ci〇芳基ci〜C6烷基或C6〜C10芳基,R5 表示C1〜C6烷基、C6〜C10芳基C1-C6烷基或C6〜C10芳 基)’ [化7]157144.doc 201213359 (wherein R 1 , R 2 , and r 3 each independently represent an argon atom or a ChC 3 alkyl group; X represents a single bond or is selected from a C 1 alkyl group, -C(=0)0 Rla-' -C ( =〇)NHRla- > -OC(=〇)R, a-^-R2a-0C(=0)-Rla-m ^ The group in the group (Rla, R2a independently represent Cl~CIO) a group or a Cl~CIO alkyl group _〇_C1~C1 〇 alkyl group), R4 represents a hydrogen atom, a C1~C6 alkyl group, a C6~ci〇 aryl ci~C6 alkyl group or a C6~C10 aryl group, R5 Represents C1~C6 alkyl, C6~C10 aryl C1-C6 alkyl or C6~C10 aryl)' [Chemical 7] (式中’ R6、R7、R8分別獨立地表示氫原子或C1〜C3烷 基’ R9表示脂肪族烴基或脂環烴基)。 6·如請求項5之共聚物前驅體,其中含有3級胺基之重複單 元為式(IV)所示之重複單元, [化8](wherein R6, R7 and R8 each independently represent a hydrogen atom or a C1 to C3 alkyl group 'R9 represents an aliphatic hydrocarbon group or an alicyclic hydrocarbon group). 6. The copolymer precursor of claim 5, wherein the repeating unit having a tertiary amino group is a repeating unit represented by the formula (IV), [Chem. 8] (式中,R10、R"、 基;Y表示選自 、_C(=〇)NHRlb- R12分別獨立地表示氫原子或Ci〜C3烷 由 C1〜C10伸烧基、_c( = 〇)〇Rlb· -0C(=0)Rlb-及-R2b_OC(=〇)_Rib 所組 成之群中之基(Rlb、R2b分別獨立地表示C1〜cl〇伸烷基或 C1〜C10伸烷基-〇_C卜C10伸烷基),Rn、ri4分別獨立地 ,57,44doc -4- ⑧ 201213359 表示Cl〜C6垸基或C6〜C10芳基C1〜C6烧基)。 7.如吻求項5之共聚物前驅體,其中含有4級銨鹽基之重複 單元為式(V)所示之重複單元, [化9](wherein R10, R", base; Y represents a selected from, _C(=〇)NHRlb-R12 independently represents a hydrogen atom or a Ci~C3 alkane from a C1 to C10 alkyl group, _c(= 〇)〇Rlb · -0C (=0) Rlb- and -R2b_OC(=〇)_Rib are groups in the group (Rlb, R2b independently represent C1~cl〇 alkyl or C1~C10 alkyl-〇_C卜C10 alkylene), Rn, ri4 are independently, 57, 44doc -4- 8 201213359 represents Cl~C6 fluorenyl or C6~C10 aryl C1~C6 alkyl). 7. A copolymer precursor according to the kiss 5, wherein the repeating unit having a 4- to 4-ammonium group is a repeating unit represented by the formula (V), [Chemical 9] (式中,R15、R16、R17分別獨立地表示氫原子或Cl〜C3烷 基;Υ1表示選自由C1〜C10伸烷基、-C( = 0)0Rlc-、-C(=〇)NHRlc-、-0C(=0)Rlc-及-R2c-0C(=0)-Rle-所組 成之群中之基(Rle、R2e分別獨立地表示Cl〜CIO伸烷基或 〜C10伸烷基-〇-C1~C10伸烷基),R18、R19、R2Q分別獨 立地表示C1〜C6烷基或C6〜C10芳基C1〜C6烷基,Z·表示 抗衡離子)。 157144.doc 201213359 四、指定代表圖: (一) 本案指定代表圖為:(無) (二) 本代表圖之元件符號簡單說明: 五、本案若有化學式時,請揭示最能顯示發明特徵的化學式:Wherein R15, R16 and R17 each independently represent a hydrogen atom or a Cl~C3 alkyl group; Υ1 represents an alkyl group selected from C1 to C10, -C(=0)0Rlc-, -C(=〇)NHRlc- , -0C (=0) Rlc- and -R2c-0C (=0)-Rle- group in the group (Rle, R2e independently represent Cl~CIO alkyl or ~C10 alkyl)-〇 -C1~C10 alkylene group), R18, R19 and R2Q each independently represent a C1~C6 alkyl group or a C6~C10 aryl C1~C6 alkyl group, and Z· represents a counter ion). 157144.doc 201213359 IV. Designated representative map: (1) The representative representative of the case is: (none) (2) The symbolic symbol of the representative figure is simple: 5. If there is a chemical formula in this case, please reveal the best indication of the characteristics of the invention. Chemical formula: 157144.doc ⑧157144.doc 8
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