201210428 六、發明說明： 【發明所屬之技術領域】 [0001] 本發明涉及一種殼體及其製作方法，尤其涉及_種具有 光致變色功能的殼體及該殼體的製作方法。 【先前技術】 [〇〇〇2]隨著消費水準的提高，消費者對電子產品的殼體要求不 僅注重其品質，對其表面的裝飾效果也愈來愈關注，具 有時尚、絢麗外觀及可光致變色的殼體產品在市場中非 常具競爭力。 ::.. .; . . .V ......... f) - [0003]習知的製作可光致變色的殼體的方法有印刷或喷塗，即 將光致變色化合物加入到一般油墨或塗料用的膠黏劑、 稀釋劑等助劑中混合均勻製成絲網印刷用的油墨或塗料 ，將該油墨或塗料印刷或喷塗於殼體上形成一可光致變 色的油墨層或塗料層，而製得光致變色詨體。然而，該 光致變色油墨層或塗料層由於含光致變色化合物的量有 限，對光照的變色靈敏度不高，可產生的外觀吸引力不 強。且該方法不環保。 〇 [0004] 目前也有提出以氣相沉積的方式形成溴化銀-氧化銅的光 致變色層。該方法雖然環保，然而所述的漠化銀_氧化銅 的變色靈敏度也不高，且其與基材的結合力也不夠強， 從而影響到光致變色殼體的使用效果。 【發明内容】 [0005] 鑒於此，有必要提供一種環保、光致變色層於殼體的附 著力較強且光致變色靈敏度高的殼體。 099127680 表單煸號A0101 第3頁/共10頁 0992048641-0 201210428 [0006] 另外，還有必要提供一種上述殼體的製作方法。 [0007] 一種殼體，其包括一基體及一形成於基體表面的光致變 色層，該光致變色層為一氣化銀-氯化亞銅層或溴化銀-漠化亞銅層。 [0008] —種殼體的製作方法，其包括如下步驟： [0009] 提供一基體； [0010] 採用真空蒸鍍法在該基體的表面沉積一光致變色層，沉 積過程中同時對基體的表面進行離子束轟擊；所述的光 致變色層為一氣化銀-氯化亞銅層或溴化銀-漠化亞銅層 〇 [0011] 相較於習知技術，所述的殼體通過在其基體表面蒸鍍一 氯化銀-氯化亞銅層或溴化銀-溴化亞銅層以實現光致變 色的功能，方法環保且簡單易行。其中所述的氣化亞銅 或溴化亞銅對光致變色起催化作用，由於氧化亞銅或溴 化亞銅的不穩定性，其對光的敏感性更強，催化效果更 好，使得所述的光致變色層的變色更靈敏，變色效果更 具吸引力。在沉積所述光致變色層的過程中同時對基體 的表面進行離子束轟擊，還可增強該光致變色層與基體 之間的結合力，提高了所述殼體的使用效果。 【實施方式】 [0012] 請參閱圖1，本發明一較佳實施方式的殼體10包括一基體 11、及依次形成於基體11表面的光致變色層13及保護層 15 ° 基體11可為金屬基體，亦可為玻璃基體。 099127680 表單編號A0101 第4頁/共10頁 0992048641-0 [0013] 201210428 [0014] Ο [0015] [0016] ❹ [0017] [0018] [0019] 光致變色層13為一氯化銀-氯化亞銅層或溴化銀-溴化亞 銅層。該光致變色層13以真空蒸鍍的方式形成，其厚度 為500-1500nm。該光致變色層13中的氯化亞銅或溴化亞 銅的質量百分含量約為10-20%。當有光線照射至該光致 變色層13時，所述的氣化銀或溴化銀分解為銀和氯或銀 和溴，該分解的銀的微小晶粒，使該光致變色層13呈現 為黑色，而當光線變暗或消失時，該銀及氣或溴在氯化 亞銅或溴化亞銅的催化作用下，重新生成氯化銀或溴化 銀，又呈現出白色，如此實現光致變色效果。 保護層15可為一以真空蒸鍍的方式形成的二氧化矽（ Si〇2)光學膜層。該保護層15為透明層，其厚度可為 300-500nm。該保護層15用以保護所述光致變色層13免 受磨損，且因保護層15本身為一光學膜層，其對照射至 光致變色層13的光線的影響很小，從而不會影響到光致 變色層13的變色效果。 可以理解的，若蒸鍍所述光致變色層13的溫度不太高（ 如：低於100 °C )時，所述基體11的材質也可為塑膠。 本發明一較佳實施方式的製作上述殼體10的方法包括如 下步驟： 提供一基體11，並對該基體11進行前處理。該前處理可 為將基體11放入盛裝有乙醇及/或丙酮溶液的超聲波清洗 器中進行超聲波清洗，以除去基體11表面的雜質和油污 等。 將經上述前處理後的基體11放入一真空蒸鍍機（圖未示 099127680 表單編號A0101 第5頁/共10頁 0992048641-0 201210428 )的蒸鍍室中，抽真空該蒸鍍室至真空度4. 0xl0_3Pa， 以氯化銀與氯化亞銅的混合塊體或溴化銀與溴化亞銅的 混合塊體作為蒸料，採用電子束加熱，將所述蒸料蒸發 沉積至基體11的表面，形成所述光致變色層13。所述蒸 料中氣化亞銅或漠化亞銅的質量百分含量約為10-20%。 蒸發沉積的速率可為3-10埃/秒，蒸鍍的溫度為50-150 °C。蒸鍍該光致變色層13的同時，以900-1 500瓦（W) 的離子束（可由一離子束搶發射）對基體11的表面進行 轟擊，以增強所述光致變色層13與基體11間的結合力。 [0020] 在光致變色層13的表面繼續以蒸鍍的方式沉積一保護層 1 5。該保護層1 5為一Si09光學膜層。該保護層1 5為透明 層，其厚度可為300-500nm。 [0021] 相較於習知技術，所述的殼體10通過在其基體11表面蒸 鍍一氣化銀-氣化亞銅層或溴化銀-溴化亞銅層以實現光 致變色的功能，方法環保且簡單易行。其中所述的氯化 亞銅或溴化亞銅對光致變色起催化作用，由於氣化亞銅 或溴化亞銅的不穩定性，其對光的敏感性更強，催化效 果更好，使得所述的光致變色層13的變色更靈敏，變色 效果更具吸引力。在沉積所述光致變色層13的過程中同 時對基體11的表面進行離子束轟擊，還可增強該光致變 色層13與基體11之間的結合力，提高了所述殼體10的使 用效果。 【圖式簡單說明】 [0022] 圖1係本發明一較佳實施方式的殼體的剖視示意圖。 【主要元件符號說明】 099127680 表單編號A0101 第6頁/共10頁 0992048641-0 13 201210428 [0023] 殼體：10 [0024] 基體：11 [0025] 光致變色層： [0026] 保護層：15201210428 VI. Description of the Invention: [Technical Field] [0001] The present invention relates to a housing and a method of fabricating the same, and more particularly to a housing having a photochromic function and a method of fabricating the same. [Prior Art] [〇〇〇2] With the improvement of consumption standards, consumers' requirements for the shell of electronic products not only pay attention to their quality, but also pay more and more attention to the decorative effect of their surface. They have a fashionable and beautiful appearance and can be Photochromic housing products are very competitive in the market. ::.. .; . . . V ......... f) - [0003] A conventional method of making photochromic housings is printing or spraying, ie adding photochromic compounds It is mixed into an additive such as an adhesive or a thinner for general inks or coatings to form an ink or coating for screen printing, and the ink or paint is printed or sprayed on a casing to form a photochromic color. The ink layer or the coating layer is used to produce a photochromic carcass. However, the photochromic ink layer or the coating layer has a limited amount of photochromic-containing compound, is not sensitive to light discoloration, and is not attractive in appearance. And the method is not environmentally friendly. 0004 [0004] Photochromic layers of silver bromide-copper oxide formed by vapor deposition have also been proposed. Although the method is environmentally friendly, the discoloration sensitivity of the desertified silver-copper oxide is not high, and the bonding strength with the substrate is not strong enough, thereby affecting the use effect of the photochromic casing. SUMMARY OF THE INVENTION [0005] In view of the above, it is necessary to provide a housing having an environmentally-friendly, photochromic layer with strong adhesion to the casing and high sensitivity to photochromism. 099127680 Form nickname A0101 Page 3 of 10 0992048641-0 201210428 [0006] In addition, it is also necessary to provide a method of manufacturing the above casing. [0007] A casing comprising a substrate and a photochromic layer formed on a surface of the substrate, the photochromic layer being a vaporized silver-copper chloride layer or a silver bromide-molybdenite layer. [0008] A method for fabricating a casing, comprising the steps of: [0009] providing a substrate; [0010] depositing a photochromic layer on the surface of the substrate by vacuum evaporation, simultaneously applying to the substrate during deposition The surface is subjected to ion beam bombardment; the photochromic layer is a gasified silver-copper chloride layer or a silver bromide-molybdenite layer 〇 [0011] compared to the prior art, the shell passes The silver chloride-copper chloride layer or the silver bromide-bromide layer is vapor-deposited on the surface of the substrate to realize the function of photochromism, and the method is environmentally friendly and simple. The vaporized cuprous or copper bromide catalyzes photochromism, and because of the instability of cuprous oxide or cuprous bromide, it is more sensitive to light and has better catalytic effect. The photochromic layer is more sensitive to discoloration and the color change effect is more attractive. Simultaneous ion beam bombardment of the surface of the substrate during the deposition of the photochromic layer can also enhance the bonding force between the photochromic layer and the substrate, thereby improving the use effect of the housing. [0012] Referring to FIG. 1, a housing 10 according to a preferred embodiment of the present invention includes a base 11 and a photochromic layer 13 and a protective layer 15 which are sequentially formed on the surface of the base 11. The base 11 can be The metal substrate may also be a glass substrate. 099127680 Form No. A0101 Page 4 / Total 10 Page 0992048641-0 [0013] 201200428 [0014] [0016] [0019] [0019] The photochromic layer 13 is a silver chloride-chlorine A cuprous layer or a silver bromide-bromide layer. The photochromic layer 13 is formed by vacuum evaporation and has a thickness of 500 to 1500 nm. The mass percentage of cuprous chloride or cuprous bromide in the photochromic layer 13 is about 10-20%. When light is irradiated to the photochromic layer 13, the vaporized silver or silver bromide is decomposed into silver and chlorine or silver and bromine, and the fine crystal grains of the decomposed silver cause the photochromic layer 13 to be rendered. It is black, and when the light becomes dark or disappears, the silver and gas or bromine are regenerated into silver chloride or silver bromide under the catalysis of cuprous chloride or cuprous bromide, which is white again. Photochromic effect. The protective layer 15 may be a ceria (Si 2 ) optical film layer formed by vacuum evaporation. The protective layer 15 is a transparent layer and may have a thickness of 300 to 500 nm. The protective layer 15 is used to protect the photochromic layer 13 from abrasion, and since the protective layer 15 itself is an optical film layer, the influence on the light irradiated to the photochromic layer 13 is small, so that it does not affect The color change effect to the photochromic layer 13. It can be understood that if the temperature of the photochromic layer 13 is not too high (for example, less than 100 ° C), the material of the substrate 11 can also be plastic. A method of fabricating the housing 10 of a preferred embodiment of the present invention includes the steps of: providing a substrate 11 and pretreating the substrate 11. This pretreatment can be carried out by ultrasonically cleaning the substrate 11 in an ultrasonic cleaner containing an ethanol and/or acetone solution to remove impurities, oil stains and the like on the surface of the substrate 11. The pretreated substrate 11 is placed in a vapor deposition chamber (not shown in FIG. 099127680, Form No. A0101, page 5/10 pages 0992048641-0 201210428), and the vapor deposition chamber is evacuated to a vacuum. Degree 4. 0xl0_3Pa, a mixed block of silver chloride and cuprous chloride or a mixed block of silver bromide and cuprous bromide as a steaming material, which is evaporated to the substrate by electron beam heating. The surface forms the photochromic layer 13. The mass percentage of vaporized cuprous or desertified cuprous in the steam is about 10-20%. The rate of evaporation deposition can be 3-10 angstroms/second and the temperature of evaporation can be 50-150 °C. While vaporizing the photochromic layer 13, the surface of the substrate 11 is bombarded with an ion beam of 900-1 500 watts (W) (which can be emitted by an ion beam) to enhance the photochromic layer 13 and the substrate. 11 combinations of strength. [0020] A protective layer 15 is deposited on the surface of the photochromic layer 13 by evaporation. The protective layer 15 is a Si09 optical film layer. The protective layer 15 is a transparent layer and may have a thickness of 300 to 500 nm. [0021] Compared with the prior art, the casing 10 realizes photochromic function by vapor-depositing a vaporized silver-vaporized cuprous layer or a silver bromide-bromide layer on the surface of the substrate 11. The method is environmentally friendly and simple. The cuprous chloride or cuprous bromide catalyzes photochromism, and because of the instability of vaporized cuprous or cuprous bromide, it is more sensitive to light and has better catalytic effect. The color change of the photochromic layer 13 is made more sensitive, and the color change effect is more attractive. Simultaneous ion beam bombardment of the surface of the substrate 11 during deposition of the photochromic layer 13 also enhances the bonding force between the photochromic layer 13 and the substrate 11, improving the use of the housing 10. effect. BRIEF DESCRIPTION OF THE DRAWINGS [0022] FIG. 1 is a cross-sectional view of a housing in accordance with a preferred embodiment of the present invention. [Main component symbol description] 099127680 Form No. A0101 Page 6 of 10 0992048641-0 13 201210428 [0023] Housing: 10 [0024] Base: 11 [0025] Photochromic layer: [0026] Protective layer: 15
099127680 表單編號A0101 第7頁/共10頁 0992048641-0099127680 Form No. A0101 Page 7 of 10 0992048641-0