TW201206784A - Transporting container structure - Google Patents

Transporting container structure Download PDF

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Publication number
TW201206784A
TW201206784A TW99125824A TW99125824A TW201206784A TW 201206784 A TW201206784 A TW 201206784A TW 99125824 A TW99125824 A TW 99125824A TW 99125824 A TW99125824 A TW 99125824A TW 201206784 A TW201206784 A TW 201206784A
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Taiwan
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pressure
optical mask
base
press
supporting
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TW99125824A
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Chinese (zh)
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TWI414463B (en
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Ming-Sheng Chen
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Ming-Sheng Chen
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  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

The present invention relates to a transporting container structure, it especially refers to a wear-resistant transporting container structure that helps reduce the micro-particles pollution. The transporting container structure, including a base and a housing that are relatively covered by each other, is to form a storage space for storing the optical mask. The inner surface of one of the base and the housing includes a supporting set or a pressure-guiding set, which are made with a first material, wherein the pressure-guiding set includes at least two press-holding units corresponding to the surface edge of the optical mask. The press-holding unit includes a press unit correspondingly pressing against the surface of the optical mask. The two sides of the press-holding unit include a wavy elastic cantilever to restrict the movement of the optical mask. The top surface of the supporting set includes a supporting block for supporting the optical mask. Through the above-mentioned design, the present invention can use the elastic cantilever of the press-holding unit of the pressure-guiding set to allow for a greater tolerance range. The base, the housing, the pressure-guiding set, and the supporting set are composed of carbon fiber-reinforced liquid crystal polymer (LCP). Therefore, it not only minimizes surface wear of the optical mask, but also reduces the generation of micro-particles to prevent further contamination on the surfaces of the optical mask.

Description

201206784 面臨的問題深入探討,並不斷努力的改良血$ 容 問題 功開發-種移載容器構造導壓組,其能“現2成 器構造因允許變形量不足所衍生的定位效果裁 【發明内容】 因此,本發明之主要目的與優點,係減少 器與光罩之間的接觸造成之微粒物質產生。 各201206784 The problems faced in-depth discussion, and the continuous efforts to improve the blood volume problem development - the type of transfer container construction pressure group, which can "the current 20-inch structure due to the lack of deformation caused by the positioning effect cut" Therefore, the main object and advantage of the present invention is the generation of particulate matter caused by the contact between the reducer and the reticle.

又’本發明進-步之目的與優點,係減少 與光罩之間的接觸面積。 另,本發明之再一目的與優點,係降低移載容 用於經常處於磨擦之元件的損壞。 °鬥 據此,本發明提供一種耐磨、減少污染與損壞的 載容器構造,該移載容器構造包含有: 一底座; 一支撐組’其設於底座頂面供光罩撐托; 一殼罩’其可相對底座蓋合形成光罩存放空間, 一個或二個導壓組,其分設於底座或殼置兩者之中 至少其中之一的内面,以壓掣光罩使其定位於移载容器 構造的存放空間内; 前述底座、支樓組、殼罩與導壓組中至少其中之一 係由第一材料所製成,其中第一材料係由含有碳纖【 Carbon Fiber, CF】之液晶高分子聚合物【LiqUid Crystal Polymer,LCP】所製成。 201206784 ▲藉此,透過前述技術手段的展現,使得本發明進一 步能增進下列的效能與優點,而能大幅增加產品的附加 價值’其提升其競爭力與經濟效益。 1) 、透過本發明與光罩接觸的支撐組承拖塊、壓抵Further, the object and advantage of the present invention are to reduce the contact area with the reticle. In addition, it is a further object and advantage of the present invention to reduce the damage of the transfer components for components that are often subject to friction. According to the present invention, the present invention provides a carrier structure that is resistant to wear, reduces pollution, and is damaged. The transfer container structure includes: a base; a support set 'which is disposed on the top surface of the base for the reticle support; The cover can be closed with respect to the base to form a reticle storage space, and one or two pressure guiding groups are disposed on the inner surface of at least one of the base or the shell to press the reticle to position it The storage space of the transfer container structure; at least one of the foregoing base, the branch group, the cover and the pressure guiding group is made of the first material, wherein the first material is composed of carbon fiber [carbon Fiber, CF] The liquid crystal polymer [LiqUid Crystal Polymer, LCP] is made. 201206784 ▲In this way, through the above-mentioned technical means, the present invention can further enhance the following performances and advantages, and can greatly increase the added value of the product', which enhances its competitiveness and economic benefits. 1) The supporting group bearing block and the pressure contact which are in contact with the reticle according to the present invention

. 件之凸壓錐塊及導正弧片之導弧壓緣係由含有碳纖【CF . 】之液晶高分子聚合物【LCP】所構成等材質所製成, 而利用其具有優越的高張力、高彈性、高耐熱性、良好 的加工性、熱膨脹係數小、且耐磨與高硬度之特性,供 鲁 進一步減少微粒的產生’提高製程良率。 ’、 2) 、由於本發明我定位結構中壓掣元件的壓抵件係 利用兩侧的彈性懸臂來支撐,且該彈性懸臂具有至少一 上下的波浪彎曲,大幅的加大壓抵件的允許變形量,如 此不致發生壓掣力不足或壓掣力過大的問題,而能得到 最佳的壓掣效果,如此可避免傷及光罩表面,有效延長 光罩的使用壽命,並能消除運輸過程中的震動,具有如 避震器的緩衝效果。 • 3)、承前所述,由於本發明的導壓組能主動調整到 最佳的壓掣力,且透過壓抵件上設有凸壓錐塊及導正弧 片具有狐壓緣的設計’使導壓組能達到最小的接觸面積 ,且可有效防止光罩滑移,如此可使磨損的微粒剝落最 少化,玎避免光罩刮傷或產生其他物理損壞。 為使貴審查委員能進一步了解本發明的構成、特 徵及其他目的’以下乃舉本發明之若干較佳實施例,並 配合圖式詳細說明如后,同時讓熟悉該項技術領域者能 夠具體實施。 201206784 【實施方式】 造,隨附圖例示之構 其構件中,所有 戟谷15構w的具體實施例及 Γ::Γ水平;垂二=右僅 Ϊ間==明=其構件限制於任何=The arc-pressing edge of the convex pressure cone and the positive arc is made of a material such as a liquid crystal polymer [LCP] containing carbon fiber [CF.], and has superior high tension. High elasticity, high heat resistance, good processability, small coefficient of thermal expansion, and the characteristics of wear resistance and high hardness, which further reduce the generation of particles to improve the process yield. ', 2), because the pressing member of the pressing element in the positioning structure of the present invention is supported by the elastic cantilever on both sides, and the elastic cantilever has at least one upper and lower wave bending, which greatly enlarges the permission of the pressing member The amount of deformation, so that the problem of insufficient pressure or excessive pressure is not generated, and the best compression effect can be obtained, thereby avoiding damage to the surface of the mask, effectively extending the service life of the mask, and eliminating the transportation process. The vibration in the medium has a cushioning effect such as a shock absorber. • 3), as mentioned above, because the pressure guiding group of the present invention can be actively adjusted to the optimal pressing force, and the convex pressure cone and the positive guiding arc piece are provided on the pressing member with the design of the fox pressure edge. The guide group can achieve a minimum contact area, and can effectively prevent the mask from slipping, so that the wear of the particles can be minimized, and the mask can be prevented from scratching or other physical damage. The following is a description of the preferred embodiments of the present invention, and the following detailed description of the present invention will be described in conjunction with the drawings. . 201206784 [Embodiment] In the construction of the components exemplified in the drawings, the specific embodiment of all the Shibuya 15 structures w and the Γ:: Γ level; 垂 2 = right only Ϊ = = Ming = its components are limited to any =

内,之 的0又a十與需求而進行變化。 。本發月之移載谷器構造可進一步保持光罩於移載宏 ^冓造内的潔淨度,至於本發明的詳細構成,則請參照 第一、二及三圖所顯示者,該衫載容器構造包含有一底 座10及一殼罩30所組成,且底座10與殼罩3〇中至少 其中之一係由第一材料所製成,其中殼罩3〇與底座1〇 可相對蓋合形成一容置光罩50的存放空間,底座1〇與 殼罩30兩者之間至少其一設有對應限制光罩5〇的導壓 組40。而本發明的具體實施例則係於底座1〇上設有供 承托光罩50之支撐組20,而供限制導正光罩50的導 壓組40則設於殼罩30内面,且其中支樓組20與導壓 組40兩者之中至少其中之一係由第一材料所製成,前 述第一材料係由液晶高分子聚合物【Liquid Crystal Polymer,LCP】所構成,且其進一步可含有碳纖【Within, 0 and a ten change with demand. . The shifting grid structure of the present month can further maintain the cleanliness of the reticle in the transfer embossing. As for the detailed structure of the present invention, please refer to the figures shown in the first, second and third figures. The container structure comprises a base 10 and a cover 30, and at least one of the base 10 and the cover 3 is made of a first material, wherein the cover 3 〇 and the base 1 〇 can be oppositely formed. A storage space for accommodating the reticle 50, at least one of the base 1 〇 and the cover 30 is provided with a pressure guiding group 40 corresponding to the limiting reticle 5 。. In the specific embodiment of the present invention, the support group 20 for supporting the photomask 50 is disposed on the base 1 , and the pressure guiding group 40 for limiting the photomask 50 is disposed on the inner surface of the cover 30 , and the inner portion thereof At least one of the floor group 20 and the pressure guiding group 40 is made of a first material, and the first material is composed of a liquid crystal polymer (LCP), and further Containing carbon fiber

Carbon Fiber, CF】’又其中碳纖【Carbon Fiber, CF 】含量可佔總重量30%,以使底座10、殼罩30、支樓 組20與導壓組40具有良好的具有優越的高張力、高彈 性、高耐熱性、良好的加工性、熱膨脹係數小、且耐磨 201206784 與高硬度; 而其中支撐組20包含有兩撐托元件21與一抵靠元 件25,兩撐托元件21頂面設有複數供支撐於光罩5〇 底面的承托塊22,承托塊22可為減少光罩5〇接觸面 積的角錐狀,又兩雜元件21於相異的相分別形成 有複數供光罩50邊緣貼靠的侧片23,且侧片23内侧 面並形成有對應光罩50邊緣的側抵件24,兩侧撐托元 件21之側抵件24間距接近光罩50寬度,以減^光罩 50限位前的滑移量,再者前述承托塊22與侧抵件24 可與撐托元件21呈一體結構或分離式結構,為降低成 本,分離式之承托塊22與側抵件24進一步可選自前述 耐磨性、高硬度之第一材料,以減少微粒的剥落。^者 抵靠元件25具有至少一向上凸伸的背靠片26,該背靠 片26可供光罩50背緣貼靠; ° 而殼罩30頂面則設有一把手31,該把手31具有 複數對應殼罩30的透孔32,供利用鎖固件33將把手 31鎖掣於殼罩30上,且鎖固件33穿出殼罩3〇的一端 可供同步鎖掣前述置於殼罩30内的導壓組4〇,前述由 第一材料所製成之導壓組40大致上包含有複數對稱設 置的壓掣元件43與導正元件,該壓掣元件與導 正元件47並設於一基座41對應光罩50的一侧,且基 座41頂面埋設形成有供前述鎖固件33螺鎖的螺柱42 ,前述壓掣元件43可對應壓限光罩5〇的表面周緣,且 壓掣元件43係於基座41上形成有一透孔44,且壓掣 元件43並於透孔44内利用兩側彈性懸臂46懸設有一 供壓掣光罩50的壓抵件45,該壓抵件45並具有一呈 201206784 倒錐狀的凸壓錐塊45G,以減少與光罩5q的接觸面積 ,且兩側彈性懸臂46並呈弧彎狀的波浪體,其可大幅 增加壓抵件45的上、下位移量,使其允許變形量加^ 。又前述導正元件47分設於基座41異於支樓組2〇背 側抵靠元件26的邊緣與該邊緣相鄰的兩匈邊$緣,如此 可利用對應支撐組20開口的導正元件47 向抵靠元件25的背靠片26歸位’而兩例的導正元件 47則可直接夾掣光罩50兩側’防止光罩5〇於移載容 器構造運輸過程中任意滑移,至於前述的導正元件47 則係由基座41向下延伸的弧彎狀導正弧片48所構成, 且導正弧片48對應光罩50的側面並形成有一道由上而 下延伸的弧壓緣480 ’供逐步推動調整光罩歸位, 且前述壓抵件45的凸壓錐塊450與導正弧片48的弧壓 緣480可呈一體結構或分離式結構,且凸壓錐塊450與 弧壓緣480進一步可選自前述耐磨性、高硬度之含有碳 纖【Carbon Fiber,CF】之液晶高分子聚合物【Liquid Crystal Polymer, LCP】的第一材料所製成,以減少微 粒的剝落,且可降低成品的變形量。 透過前述的設計’組構成一具有南财熱性、良好@ 加工性、低熱膨脹係數、且耐磨與高硬度的移载容器構 造者。 本發明於實際應用時,則係如第一及三至六圖所示 揭示者,當光罩50置於底座10的支撐組20上時,支 撐組20係利用兩側撐托元件21的承托塊22由下支持 光罩50,且光罩50並限位於兩侧撐托元件21的侧抵 件24之間【如第三圖所示】,再者當殼罩30蓋合於底 201206784 罩3G上導齡4G中異於切組20抵靠 το件25的導正弧片犯可將光罩5〇推移 25 26 ^Carbon Fiber, CF]' carbon fiber (CF) content can account for 30% of the total weight, so that the base 10, the cover 30, the branch group 20 and the pressure guiding group 40 have a good superior high tension, High elasticity, high heat resistance, good processability, small coefficient of thermal expansion, and wear resistance 201206784 and high hardness; and wherein the support group 20 includes two support members 21 and an abutment member 25, the top surfaces of the two support members 21 A plurality of supporting blocks 22 are supported for supporting the bottom surface of the reticle 5. The supporting block 22 can be a pyramidal shape for reducing the contact area of the reticle 5, and the two impurity elements 21 are respectively formed with plural light supply in different phases. The side panel 23 abutting the edge of the cover 50, and the side surface of the side panel 23 is formed with a side abutting member 24 corresponding to the edge of the mask 50. The spacing of the side abutting members 24 of the side supporting members 21 is close to the width of the mask 50 to reduce ^ The amount of slip before the mask 50 is limited, and the support block 22 and the side abutment 24 may be integrated with the support member 21 or have a separate structure. To reduce the cost, the separate support block 22 and The side abutting member 24 may further be selected from the foregoing first material with high abrasion resistance and high hardness to reduce the peeling of the particles. . The abutment member 25 has at least one upwardly projecting backrest 26 which is affixed to the back edge of the reticle 50. The top surface of the cover 30 is provided with a handle 31 having a handle 31 The plurality of holes 32 corresponding to the cover 30 are used to lock the handle 31 to the cover 30 by the lock 33, and one end of the lock 33 passing through the cover 3 is synchronously locked and placed in the cover 30. The pressure guiding group 40, the pressure guiding group 40 made of the first material substantially comprises a plurality of symmetrically arranged pressing elements 43 and guiding elements, and the pressing elements and the guiding elements 47 are disposed in one The base 41 corresponds to one side of the reticle 50, and the top surface of the pedestal 41 is embedded with a stud 42 for locking the lock member 33, and the pressing element 43 can correspond to the surface periphery of the reticle 5 ,, and The pressing member 43 is formed with a through hole 44 in the base 41, and the pressing member 43 is suspended in the through hole 44 by a pair of elastic cantilever 46 for pressing the pressing member 45 of the pressure mask 50. The abutting member 45 has a convex pressing cone 45G having an inverted cone shape of 201206784 to reduce the contact area with the reticle 5q, and the elastic cantilever 46 on both sides is arced. Wave-like body, which can significantly increase the pressure against the member 45, the displacement amount, so as to allow deformation plus ^. Further, the guiding element 47 is disposed on the base 41 different from the edge of the side of the branch group 2 opposite to the edge of the member 26 and adjacent to the edge of the two Hungarian edges, so that the opening of the corresponding supporting group 20 can be utilized. The element 47 is returned to the backing piece 26 of the abutting element 25 and the guiding elements 47 of the two cases can be directly clamped on both sides of the reticle 50 to prevent the reticle 5 from slipping freely during transportation of the transfer container structure. The guiding element 47 is formed by an arc-shaped positive guiding arc piece 48 extending downward from the base 41, and the guiding arc piece 48 corresponds to the side surface of the photomask 50 and is formed to extend from top to bottom. The arc pressing edge 480 ′ is gradually pushed to adjust the reticle homing, and the convex pressing cone 450 of the pressing member 45 and the arc pressing edge 480 of the guiding arc piece 48 may be an integral structure or a separate structure, and the pressing pressure The taper block 450 and the arc pressing edge 480 may be further selected from the first material of the aforementioned abrasion resistant, high hardness carbon fiber polymer (LCP) containing carbon fiber (Carbon Fiber, CF). Reduces the flaking of the particles and reduces the amount of deformation of the finished product. Through the aforementioned design, a composition of a transfer container having a heat of the south, a good @processability, a low coefficient of thermal expansion, and a wear resistance and a high hardness is constructed. In the practical application, the present invention is disclosed in the first and third to sixth figures. When the photomask 50 is placed on the support group 20 of the base 10, the support group 20 is supported by the support members 21 of the two sides. The support block 22 is supported by the lower reticle 50, and the reticle 50 is confined between the side abutting members 24 of the side support members 21 (as shown in the third figure), and when the cover 30 is closed at the bottom 201206784 In the guide 3G on the guide 4G, the difference between the cut group 20 and the guide arc of the member 25 can be changed by the mask 5 25 ^

’並提供該光I 5〇適當的歸位調整功能。同 罩50兩侧的導正弧片48亦可同步夾掣光罩50的兩侧 邊緣【,中未示】。再者當殼罩3〇完全卡扣於底座ι〇 時,則殼罩30㈣壓、组40的壓抵件45凸壓錐塊45〇 適可壓隼光罩5〇表面,且壓抵件45可利用兩側的彈性 懸才46吸收該變形量【如第五、六圖所示】,由於彈 性懸# 46的允許變形量較大,故可避免發生壓擎力過 ^或^^^門題’有效地限制光罩#移動,使光罩 光罩元5:二器構造内部,確實可達到防止該 CF】之由含有碳纖【Carb〇n Fiber’ LCP】所構成,受到【UQUid ClTStal P〇ly·’ ljL古j ”中LCP具有優越的高張力、高彈 、二= # 良好的加工性、熱膨脹係數小、且财磨 ”间、性的影響,如此可使磨損的微粒剝落最少 化 於其接觸面積小,可進一步避免光罩刮傷或 產生其他物理損壞。 良T、上所述’本發明具有上述眾多的實用價值,因此 本發明確實為-新_步的創作,在相同的技術領域中 未見相同或近似的產品公開使用,故本發明已符合發明 專利的要件,乃依法提出中請,祈請早日賜准本案發明 專利。 【圖式簡單說明】 201206784 第一圖:為本發明之移載容器構造的外觀示意圖,其說 明各組件的態樣及其相對關係。 第二圖:為本發明之移載容器構造導壓組裝置的外觀示 意圖。 第三圖:為本發明之移載容器構造於蓋合前的剖面示意 圖。 第四圖:為本發明之移載容器構造於蓋合過程中推移光 罩的動作示意圖。 第五圖:為本發明之移載容器構造於蓋合過程中壓掣光 罩的動作示意圖。 第六圖:為本發明之移載容器構造於蓋合後的剖面示意 圖。 【主要元件符號說明】 (10) 底座 (20) 支撐組 (21) 撐托元件 (22) 承托塊 (23) 側片 (24) 侧抵件 (25) 抵靠元件 (26) 背靠片 (30) 殼罩 (31) 把手 (32) 透孔 (33) 鎖固件 (40) 導壓組 (41) 基座 (42) 螺柱 (43) 壓掣單元 (44) 透孔 (45) 壓抵件 ( 450) 凸壓錐塊 (46) 彈性懸臂 (47) 導正單元 (48) 導正孤片 ( 480) 弧壓緣 (50) 光罩 11 201206784 發明專利說明書 (本說明書格式、順序,請勿任意更動,※記號部分請勿填 ※申請案號:) ※申請日:77U ※I P C分類:(2006 〇1) 一、 發明名稱:(中文/英文) u^4^2〇〇6-01)And provide the appropriate homing adjustment function for this light I 5 。. The guiding arcs 48 on both sides of the same cover 50 can also simultaneously sandwich the edges of the two sides of the mask 50 [not shown]. Moreover, when the cover 3 〇 is completely snapped to the base ι , the cover 30 (four) is pressed, and the pressing member 45 of the set 40 is pressed against the surface of the reticle 5 , and the pressing member 45 is pressed. The elastic suspension 46 on both sides can be used to absorb the deformation amount [as shown in the fifth and sixth figures], since the allowable deformation amount of the elastic suspension #46 is large, the pressure can be prevented from occurring or the ^^^ gate The question 'effectively restricts the movement of the reticle #, so that the reticle reticle element 5: inside the two-piece structure, can indeed achieve the prevention of the CF] consisting of carbon fiber [Carb〇n Fiber' LCP], subject to [UQUid ClTStal P 〇ly·' ljL古j ” LCP has superior high tension, high elasticity, two = #good processability, small coefficient of thermal expansion, and the effect of intergranulation, so that the wear of particles can be minimized The contact area is small, which can further avoid scratching of the mask or other physical damage. The invention has the above-mentioned numerous practical values, and therefore the present invention is indeed a creation of a new step, and the same or similar products are not disclosed in the same technical field, so the invention has been in accordance with the invention. The requirements of the patent are submitted in accordance with the law, and pray for the early grant of the invention patent. BRIEF DESCRIPTION OF THE DRAWINGS 201206784 First: A schematic view of the appearance of a transfer container structure of the present invention, which illustrates the aspects of each component and their relative relationships. Fig. 2 is a schematic view showing the appearance of a pressure guiding group device for a transfer container of the present invention. Fig. 3 is a schematic cross-sectional view showing the structure of the transfer container of the present invention before being capped. Fig. 4 is a schematic view showing the operation of the transfer container of the present invention in the process of closing the hood during the capping process. Fig. 5 is a schematic view showing the operation of the transfer container of the present invention in the process of closing the hood during the capping process. Fig. 6 is a schematic cross-sectional view showing the structure of the transfer container of the present invention after being closed. [Main component symbol description] (10) Base (20) Support group (21) Support member (22) Support block (23) Side plate (24) Side contact (25) Abutment member (26) Back plate (30) Housing (31) Handle (32) Through Hole (33) Locking Block (40) Pressure Guide Group (41) Base (42) Stud (43) Pressure Unit (44) Through Hole (45) Pressure Abutment (450) Convex pressure cone (46) Elastic cantilever (47) Guide unit (48) Guided orphan (480) Arc edge (50) Photomask 11 201206784 Patent description (this manual format, order, Please do not change it arbitrarily. ※Please do not fill in the ※mark application number:) ※Application date: 77U ※IPC classification: (2006 〇1) I. Name of the invention: (Chinese / English) u^4^2〇〇6- 01)

移載容器構造 七 (200S.0D 二、 中文發明摘要: 本發明涉及一種移載容器構造,特別係指一 、且可減少微粒污染之移載容器構造,該移栽容槿^ 具有可相對蓋合的底座與殼罩,供形成有一容置^ = 存放空間’且兩者其中之-的内面設有—由第一材料所 製成之支撐組或導壓組,其中導壓組包含有至少二個可 對應壓掣光罩表面周緣的壓掣單元,壓掣單元具有對應Transfer container construction seven (200S.0D II) Abstract: The present invention relates to a transfer container structure, in particular to a transfer container structure which can reduce particle contamination, and the transfer capacity has a relative cover a base and a cover for forming a support group or a pressure guiding group formed of the first material, wherein the inner surface of the storage space and the two of the storage spaces are formed, wherein the pressure guiding group includes at least Two compression units corresponding to the circumference of the surface of the pressure mask, the compression unit has a corresponding

貼抵光罩表面的壓抵件,壓抵件兩側並具有波浪狀彈性 懸臂,以限制光罩的移動,而支撐組頂面則設有頂承光 罩之承托塊,透過上述的設計,本發明可利用導壓組之 壓箄元件的彈性懸臂,而允許較大的容許範圍,立該底 座、殼罩、導壓組或支撐組係由含有碳纖【Carbon Flber’ CF】之液晶高分子聚合物【Liquid Crystala pressing member attached to the surface of the reticle, having a wavy elastic cantilever on both sides of the pressing member to limit the movement of the reticle, and the top surface of the supporting group is provided with a supporting block for the reticle, through the above design The invention can utilize the elastic cantilever of the compression element of the pressure guiding group, and allows a larger allowable range, and the base, the cover, the pressure guiding group or the supporting group are made of liquid crystal containing carbon fiber [Carbon Flber' CF]. Molecular Polymer [Liquid Crystal

Polymer,LCP】所構成,如此可減少光罩表面磨損的機 會,並能減少微粒的產生,防止光罩表面受到汚染。 三、英文發明摘要: 1 201206784 七、申請專利範圍: 1、 一種移載容器構造,其具有一供擺置光罩的存放空 間,該移載容器構造包含有: 一底座,該底座係由第一材料所製成,其中第一材 料係由液晶高分子聚合物所組成,且底座上表面可 ; 供支撐光罩; 一殼罩,該殼罩可與底座選擇性相對蓋合形成光罩 存放空間,又殼罩内面設有複數可壓抵、導正前述 ❿ 光罩之導壓組。 2、 依申請專利範圍第1項所述之移載容器構造,其 中該底座之第一材料中含有碳纖。 3、 依申請專利範圍第2項所述之移載容器構造,其 中該底座之第一材料中碳纖含量為總重量之30%所 製成。 4、 一種移載容器構造,其具有一供擺置光罩的存放空 間,該移載容器構造包含有: 9 . 一底座,該底座上表面可供支撐光罩; •一殼罩,該可與底座選擇性相對蓋合之殼罩係由第 , 一材料所製成,其中第一材料係由含有碳纖之液晶 高分子聚合物所組成,又殼罩内面設有複數可壓抵 、導正光罩之導壓組。 5、 依申請專利範圍第4項所述之移載容器構造,其 中該底座之第一材料中含有碳纖。 6、 依申請專利範圍第5項所述之移載容器構造,義5] 12Polymer, LCP], which reduces the chance of wear on the surface of the mask and reduces the generation of particles and prevents contamination of the surface of the mask. III. English Abstracts: 1 201206784 VII. Patent Application Range: 1. A transfer container structure having a storage space for a reticle, the transfer container structure comprising: a base, the base is The material is made of a material, wherein the first material is composed of a liquid crystal polymer, and the upper surface of the base is; for supporting the reticle; and a cover, the cover can be selectively closed with the base to form a reticle storage In the space, the inner surface of the casing is provided with a plurality of pressure guiding groups which can be pressed against and guided by the ❿ reticle. 2. The transfer container structure of claim 1, wherein the first material of the base contains carbon fibers. 3. The transfer container construction according to claim 2, wherein the first material of the base has a carbon fiber content of 30% of the total weight. 4, a transfer container structure, having a storage space for the reticle, the transfer container structure comprises: a base, the upper surface of the base can be used to support the reticle; The cover that is selectively oppositely attached to the base is made of the first material, wherein the first material is composed of a liquid crystal polymer containing carbon fibers, and the inner surface of the cover is provided with a plurality of pressable and guiding light The pressure guiding group of the cover. 5. The transfer container structure of claim 4, wherein the first material of the base contains carbon fibers. 6. According to the transfer container construction described in item 5 of the patent application scope, meaning 5] 12

Claims (1)

201206784 八、圖式: 33--β201206784 VIII, schema: 33--β [S] 1 201206784[S] 1 201206784 22
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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI471255B (en) * 2012-11-20 2015-02-01 Gudeng Prec Ind Co Ltd A plastic composition for a wafer / mask carrier and a mask structure for applying the mask
CN111020477A (en) * 2019-11-29 2020-04-17 上海天马有机发光显示技术有限公司 Mask device, evaporation method and display panel

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI730423B (en) * 2019-09-24 2021-06-11 美商微相科技股份有限公司 Mask box structure

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWM360384U (en) * 2008-09-02 2009-07-01 Ming-Sheng Chen Photo mask container and self-positioning structure

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI471255B (en) * 2012-11-20 2015-02-01 Gudeng Prec Ind Co Ltd A plastic composition for a wafer / mask carrier and a mask structure for applying the mask
CN111020477A (en) * 2019-11-29 2020-04-17 上海天马有机发光显示技术有限公司 Mask device, evaporation method and display panel
CN111020477B (en) * 2019-11-29 2021-12-21 武汉天马微电子有限公司 Mask device, evaporation method and display panel

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