TWM404475U - Structure of a container - Google Patents

Description

The new type of description of the five :: [New technical field] The creative department is a kind of transfer capacity designed to support, constrain, store and accurately position for use in the manufacture of integrated circuits = two, specifically A wear-resistant material that reduces particle flaking to prevent contamination of the surface of the reticle by particles. [Previous Technology] The reticle in the process of the integrated circuit is an important component of the relationship between the yield, usually the reticle is made of transparent glass or quartz, and the surface is coated with an opaque or translucent desired pattern. . Any defect attached to the surface of the reticle may be projected onto the resist layer, resulting in the proper rate or use of the finished S-piece. However, the mask or the mask process, or the peeling of the parts by the two methods, or due to the environment of the clean room, so that the photomask has a large number of particles and gas age sub-materials in the adjacent environment, and ^ And during transportation, the main packaging seat and the shell army of the traditional transfer container for accommodating the above-mentioned reticle are combined and can be two: two; the base is provided with _ and the casing is provided with pressure The limits of the filial hood: = Ligu, the internal mask during the transfer process is free to slide 4" 2: the influence of external factors such as density 'shell; when hanging, the crane can not effectively limit the problem of the mask, Make the reticle = M404475 continuous reciprocating slip in the structure, which will cause wear and reduce the life of the reticle, and the particles formed by the friction will affect the yield of the integrated circuit components. In the process of detecting for a period of time, it can be seen that the limit member and the resisting member of the holding device are dust particles due to wear, and the imbalance of the reticle is severe, and the chart of the test result is It is easy to affect the movement of the reticle by jumping at a large distance in the extremely unstable state.

Saki has solved the problem of transferring containers. Some companies have proposed a new patent, "Migration Structure of Transfer Containers", No. M296467, "Transfer Containers and Applications in Transfer Containers, Metals, etc." Lining and guiding structure" new patent and announcement No. _368

"Gan, f guide box in the transfer box" new patents, etc., in order to use the miscellaneous deformation of the pieces to overcome the problem, and adjust the position. However, due to the fact that the component's permission = foot is sometimes caused by excessive pressure and damage to the reticle effect, the phenomenon of smear slippage may not be "loyalty". Patent Notice No. 1247974 is subject to the r patent and the announcement No. 3 "moving: through the material change type patent and other previous cases" but it may be limited by the material cost, or because of the manufacturer's real demand for a wide range of ' Can't fully satisfy the use. In view of this development and production experience, the creator has been working on the related industries for many years to improve the following performance and value. Economy ^ Big Duck adds additional parts of the product: ===: It has a superior high tension by dragging and pressing. [Two bombs: Cheng, etc. 4= ' Γ = Γ coefficient is small, and wear and high: Degree 2: Step-by-step to reduce the generation of particles and improve the yield of the process. For 2), due to the creation of this positioning structure, the pressure can be supported by the elastic cantilever on both sides, and the elastic cantilever has at least! · f song 'largely increase the allowable amount of pressing parts: Such as = does not cause pressure does not occur; ^ or pressure f force is too large, and the best (four) effect 'this can avoid hurting the surface of the mask, the effective life of the mask, and (d) in addition to vibration during transportation The cushioning effect of the shock absorber. 3) As mentioned above, the pressure guiding group of the present invention can actively adjust the optimal pressing force, and the convex pressure cone and the guiding positive arc piece are provided on the pressing member. The design of the arc pressure edge enables the pressure guiding group to reach the most sturdy contact area, and can effectively prevent the mask from slipping, so that the abrasive particles can be peeled off to minimize the scratch of the mask or other physical damage. In order to enable the review board to further understand the composition, characteristics and other purposes of the creation, the following are some of the preferred embodiments of the creation, and the detailed description of the creation is as follows, and the person familiar with the technical field can be implemented. [Embodiment] M404475 $ Creation is a container structure for supporting and accommodating a photomask, p is attached, and the specific embodiment of the creation container construction and its components are just about the rear, left and right. ,top The bottom, upper and lower, and horizontal and vertical references are only for convenience of description, not ^, 彳 'also do not limit their components to any position or space direction and say the size specified in the book, when The invention is not limited by the design and needs of the specific embodiment of the present invention. The created container structure can further maintain the cleanliness of the reticle in the container structure. As for the detailed composition of the creation, Referring to the first, second and third figures, the container structure comprises a base 10 and a cover 30, and at least one of the base 1 and the cover 3 is made of the first material. The cover 30 and the base 1 相对 can be oppositely closed to form a storage space for accommodating the reticle 50, and at least one of the base 1 〇 and the cover 3 设有 is provided with a corresponding guiding pressure for limiting the reticle 50. Group 40. In the specific embodiment of the present invention, the support group 20 for supporting the photomask 50 is disposed on the base 1 , and the pressure guiding group 40 for restricting the photomask 5 is disposed on the inner surface of the cover 30, and wherein At least one of the support group 2〇 and the pressure guiding group 40 is made of a first material, and the first material is composed of a liquid crystal polymer (LCP), and further It may contain carbon fiber [Carb〇n Fiber, CF], and the carbon fiber [Carbon F i ber, CF] content may account for 30% of the total weight, so that the base 10, the cover 30, the support group 20 and the pressure guiding group 40 have good The utility model has the advantages of superior high tension, high elasticity, high heat resistance, good processability, small thermal expansion coefficient, and wear resistance and high hardness; wherein the support group 20 comprises two support members 21 and an abutment element 7 M404475

The top surface of the two supporting members 21 is provided with a plurality of supporting blocks 22 for supporting the bottom surface of the reticle 5. The supporting block 22 can be a pyramidal shape for reducing the contact area of the reticle 50, and the two supporting members 21 are The different outer sides are respectively formed with a plurality of side panels 23 for the edges of the mask 50, and the side surfaces of the side panels 23 are formed with side abutting members 24 corresponding to the edges of the mask 50, and the side members of the two sides of the swinging member 21 24 spacing close to the width of the mask 50 to reduce the amount of slip before the mask 50 is limited. Further, the support block 22 and the side abutment μ can be integrated with the support member 21 or have a separate structure, thereby reducing the cost. The receiving block 22 and the side retaining member 24 may further be selected from the aforementioned first material of abrasion resistance and hardness to reduce the peeling of the particles. Further, the abutting member 25 has a backing piece % which protrudes at least upwardly, and the piece 26 is affixed to the back edge of the photomask 50; and the top surface of the casing 30 is provided with a handle 31, and the handle 31 has a plurality of corresponding covers. The through hole 32 of the 30 is for locking the lock 31 on the cover 30 by the lock, and the lock 33 passes through the lock of the cover 3〇, and the pressure guiding group 4 () placed in the cover 3G, before'

The pressure element 43 and the guiding element are disposed, and the positive element 47 is disposed and disposed on a pair of base 41: the side of the pressing element 43 and the guide, t _ ding 'the cover 50, and the top of the seat 41 The surface is embedded with the above-mentioned fastener 3, and the pressing element 43 is corresponding to the screw 42 of the pressure limiting optical screw. The pressure element 43 is attached to the periphery of the surface of the base 41, and the element 43 is disposed in the through hole 44. The inner and lower 44'' and the pressure-receiving member 45 of the pressure-receiving hood 50, _4^46 are suspended - an inverted cone-shaped convex pressure cone 450 to reduce; and = 45 and have - and two The side elastic cantilever 46 and the arc-shaped wave body = 8 increase the amount of upward and downward displacement of the pressing member 45, so that the amount of deformation is allowed to increase. Further, the guiding member 47 is disposed on the side of the base 41 different from the edge of the back side abutting member 26 of the supporting group 20 adjacent to the edge. Thus, the guiding member 47 corresponding to the opening of the supporting group 2 can be used. The mask 50 is pushed back to the backing plate 26 of the abutting member 25, and the guiding members 47 on both sides can directly clamp the sides of the mask 50 to prevent the mask 50 from arbitrarily slipping during the container structure transportation process. The guiding element 47 is formed by an arc-shaped positive guiding arc piece 48 extending downward from the base 41, and the guiding arc piece 48 corresponds to the side surface of the reticle 50 and is formed with a top-to-bottom extension. The arc pressing edge 480 is used for gradually pushing the adjustment mask 50 to be returned, and the convex pressing cone 450 of the pressing member 45 and the arc pressing edge 480 of the guiding arc piece 48 can be integrated or separated, and the pressing pressure is The cone block 450 and the arc pressing edge 480 may further be selected from the aforementioned abrasion resistant, high hardness liquid crystal polymer containing carbon fiber [Carbon Fiber, CF] [Liquid

Crystal Polymer, LCP's first material is used to reduce the flaking of the particles and to reduce the amount of deformation of the finished product. Through the above-mentioned design 'group, a container structure with high heat resistance, good processability, low coefficient of thermal expansion, and wear resistance and high hardness is created in the first application, as shown in the first and third to sixth figures. The exemplifier shows that when the reticle 50 is placed on the support group 2 of the base 10, the support group 20 is supported by the lower support reticle 50' by the support block 22 of the side support members 21 and the reticle 50 is located Between the side abutting members 24 of the supporting members 21 of the two sides (as shown in the third figure), when the cover 3 is placed on the base 10, the guiding group 40 on the cover 30 is different from the supporting group. ^ The guiding arc 48 of the abutting member 25 can move the mask 50 so that the edge of the aperture M404475 is abutted against the backing of the sheet 26 of the 7L member 25 [as shown in the fourth figure] and mentions mi 5 〇 Appropriate homing adjustment function. At the same time, the guiding arcs 48 on both sides of the reticle 50 can also simultaneously sandwich the edges of the rim 50 (not shown). Furthermore, when the cover 30 is completely snapped onto the base 10, the pressure-conducting member 45 of the pressure-conducting group 4 in the cover 30 is convexly pressed against the cone, and the surface of the mask 5G is suitable for pressing, and the pressing member 45 can be pressed. The elastic cantilever 46 on both sides absorbs the deformation amount [as shown in the fifth and sixth figures], because the allowable deformation amount of the bomb I·sheng suspension '46 is large, the problem of excessive or insufficient pressure can be avoided. The movement of the mask 5G is restricted to make the inside of the mask 3: the wide-gauge structure, and it is indeed possible to prevent the mask 50 from being damaged by collision. ...and by (4) the first - material is composed of carbon fiber [(10) (10) Fiber, ίίρΛΙ / 分子 molecular polymer [Liquid Crystai P〇1,, L: = double to which Lcp has superior high tension, high elastic 冋 ^ 彳, good The processing property, the coefficient of thermal expansion is small, and the influence of wear resistance and south hardness is so that the worn particles can be peeled off at least the contact area of the tap 2 f is small, and the mask can be further prevented from being damaged or other physical damage can be caused. This can be used to create a new creative creation that is excellent in creativity. Use, (10) has the effect of improvement, so this creation has been in line with the new patents related to "novelty" and "progressive U Sheng _ _ x, apply for a new patent. The requirements" are proposed according to law [simple description of the map] The appearance of the structure of the Difficulty ϋ # 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 外观 图 外观 外观 外观 外观 外观 外观 外观 外观 外观 外观 外观 外观 外观 外观 外观 外观The created container is constructed on the front surface of the cover. The fourth picture: the action of the container for the creation of the container during the cover process. The fifth picture. The container of the creation is constructed during the cover process. The action diagram of the tamper mask.

Figure 6: Schematic diagram of the container of the creation of the creation after the closure. [Main component symbol description] (10) Base (21) Support member (23) Side plate (25) Abutment member (30) Cover (32) Through hole (40) Pressure-conducting group (42) Stud (44 ) Through Hole ( 450) Convex Pressure Cone (47) Guide Unit ( 480) Arc Pressure Edge (20) Branch Group (22) Support Block (24) Side Abutment (26) Backrest (31) Handle (33) Locking (41) Base (43) Pressing unit (45) Pressing part (46) Elastic cantilever (48) Guided positive piece (50) Mask

Claims (1)

M404475 丨, 99. VI. Patent application scope: 1 container structure, which has a storage space for arranging the reticle, the container structure comprises: a base; a cover s which can be covered with the base to form a reticle The storage space, the one or two pressure guiding groups are disposed on the inner surface of at least one of the base or the casing, and the pressure guiding group is made of the first material, wherein the first material is The liquid crystal polymer containing carbon fiber is prepared, and the pressure guiding group has a base, and the base is provided with a plurality of pressing elements corresponding to the periphery of the surface of the mask, and the pressing element is formed with a through hole on the base. And pressing the component in the through hole and suspending a pressing member for pressing the reticle by using the elastic cantilever on both sides to press the reticle to position the container in the storage space of the container structure. 2. The container construction according to claim 1, wherein the first material of the pressure guiding group contains carbon fibers. Φ1 3. The container structure according to claim 1, wherein the first material of the pressure guiding group has a carbon fiber content of 30% of the total weight, and a container structure having a container for placement a storage space of the reticle, the container structure comprises: a base, the base is made of a first material, wherein the first material is composed of a liquid crystal polymer, and the upper surface of the base is used to support the reticle; A casing can selectively cover the base to form a storage space of the reticle 12 M404475, and the inner surface of the casing is provided with a plurality of pressure guiding groups for pressing and guiding the reticle. 5. The container construction of claim 4, wherein the first material of the base contains carbon fibers. 6. The container construction according to claim 5, wherein the first material of the base has a carbon fiber content of 30% of the total weight, and a container structure having a reticle a storage space, the container structure comprises: a base, the upper surface of the base is configured to support the reticle; and a cover, the cover that is selectively closable with the base is made of the first material, wherein the first The material is composed of a liquid crystal polymer containing carbon fiber, and a pressure guiding group for pressing and guiding the photomask is provided on the inner surface of the casing. 8. The container construction of claim 7, wherein the first material of the base contains carbon fibers. 9. The container construction according to item 8 of the patent application, wherein the first material of the casing is made of carbon fiber content of 30% of the total weight 〇 13 M404475 Amendment Tao Chong IV. Designated representative map: (1) The representative representative of the case is: (2). (2) A brief description of the component symbols of this representative diagram: (40) Pressure guiding group (41) Base (43) Pressure unit (44) Through hole (45) Pressing part (450) Convex pressure cone (46) Elastic cantilever (47) Guide unit (48) Guide positive arc (480) Arc edge