TW201206548A - Filter apparatus, filter housing method, and exposure device - Google Patents

Abstract

A filter apparatus is equipped with: a frame for holding filters; filter boxes that are disposed on at least parts of the sides of the frame, that face the end surface side of the frame, and that are equipped with shape-modified parts that are modified to the outside of the frame; and casings that house the filter boxes. The casings have positioning blocks that positions the frame by engaging with the shape-changing parts of the frame, and partition plates that are pressed by the end surfaces of the frame. The filters can be set in such a manner as to make positioning easy.

Description

201206548 VI. [Technical Field] The present invention relates to a filter device for holding a transition benefit such as impurities in a gas, a method for accommodating a filter, an exposure device including the filter device, And a method of manufacturing a component for manufacturing, for example, a semiconductor element, a & crystal display element, or a photographic element using the exposure apparatus. [Prior Art] In an exposure apparatus used for manufacturing a lithography process such as an electronic component (micro component) such as a semiconductor element, in order to obtain high exposure precision (resolution, positioning accuracy, etc.), illumination characteristics of an illumination optical system are required. And the imaging characteristics of the projection optical system are maintained in a predetermined state and the space for setting the reticle (or mask, etc.), the projection optical system, and the wafer (or glass plate, etc.) is maintained in an established environment. Therefore, in the past, the portion of the illumination optical system including the exposure device, the reticle stage, the projection optical system, and the exposure main body portion of the wafer stage or the like are provided in the box chamber, and the air chamber is provided in the chamber. It is controlled to a predetermined temperature and is supplied by a clean gas (for example, air) of the dust filter in a downflow manner and a side flow manner. In the 'exposure device, the wavelength of the exposure light is shortened in response to the demand for refinement of the circuit pattern in recent years. Recently, KrF excimer laser light (wavelength 248 nm) and ArF excimer which is further in the vacuum ultraviolet region are used. Laser light (wavelength 193 nm) is used as exposure light. When using such short-wavelength exposure light, when there is a trace amount of organic matter gas (organic gas) in the space through which the exposure light passes (for example, in the inside of the lens barrel), exposure 201206548 The transmittance of light is lowered, and there is a possibility that fogging occurs on the surface of the lens element $optical element due to the reaction between the exposure light and the organic gas. Further, it is preferable to remove a gas (alkaline gas) which is an alkaline substance which reacts with a photoresist (photosensitive material) applied to the wafer from the gas supplied into the chamber. Therefore, the gas extraction unit of the air conditioner of the exposure apparatus is provided with a plurality of chemical filters for removing organic gas and/or alkali gas from the gas supplied into the chamber (see, for example, Patent Document丨). [Patent Document 1] [Patent Document 1] International Publication No. 2004/108252 [Invention] In a conventional exposure apparatus, when a chemical filter is placed in a casing, for example, a flat frame in which a chemical filter is housed is used. When the transverse direction (the surface of the filter surface is in the direction of the straight direction) is carried into the side wall of the casing, the operator moves the frame along the side wall of the side wall relative to the filter surface to the set position. . In this case, if there is a gap between the end surface of the frame and the surface of the partition member in which the ventilation opening of the casing is formed, the gas containing the impurity is supplied to the exposed body portion through the gap without passing through the chemical filter. After that. Therefore, the time for properly positioning the frame at its set position becomes longer, and the replacement time of the used chemical filter becomes longer. Further, in the exposure apparatus, since the number of chemical filters to be set is increased corresponding to the required increase in exposure accuracy, it is necessary to accurately and efficiently perform the replacement of the chemical filter. 201206548 The present invention has been made in view of the above circumstances, and an object thereof is to enable the setting of a filter to be easily positioned. According to a first aspect of the present invention, a filter device is provided which accommodates a filter. The filter device includes a second filter case including a first frame that holds the first filter, and at least a part of the first side surface of the first frame, and two of the second frame. The first end surface side of the end surface is changed to the second shape change portion on the outer side of the i-th frame; and the accommodating portion is for accommodating the second filter case; the accommodating portion is provided to support the first frame a second base member on a side different from the second side surface, and a first positioning member that is engaged with the first shape changing portion of the i-th frame to position the first frame, and the first positioning member and the second positioning member The first shape changing portion is engaged with the first partition member that presses the one end surface of the second frame. Further, according to a second aspect of the present invention, an exposure apparatus is provided which exposes a substrate by exposure light through a pattern, and is characterized in that: a chamber is provided to house an exposed main body portion for exposing the substrate; and the filter of the present invention And an air conditioning device, wherein the gas extracted from the outside of the chamber is sent to the chamber through the transition device, and according to the third aspect of the present invention, a method for accommodating the filter is provided. The filter is housed in the housing portion. The accommodating method includes the step of preparing a first filter case having a first frame for holding the second filter and at least a portion of the i-side of the side of the truss a second shape change portion from one end surface side to the other end surface side of the second end surface of the second frame to the outer side of the second frame; the side surface of the 201206548 ^ 1 frame adjacent to the side surface of the crucible 1 is a step of placing the first receiving portion of the first frame on the surface of the receiving member; and engaging the first shape of the first frame with the positioning member of the receiving portion to move the i-th frame to the valley portion a step of moving the direction of the first partition member; and the first! The end face of the king frame is pressed against the first partition member of the accommodating portion by the first sealing member. According to a fourth aspect of the present invention, there is provided a method of manufacturing a device, comprising: an operation of exposing a photosensitive substrate using the exposure apparatus of the present invention; and an operation of processing the photosensitive substrate after the exposure. According to the present invention, for example, the i-th shape changing portion of the i-th frame is engaged with the first positioning member ′, and the 帛1 frame is moved to the S 1 partition member side, whereby the first frame (first filter) is placed in the accommodating portion. The target position allows the setting of the first frame to be easily positioned. [Embodiment] Hereinafter, preferred embodiments of the present invention will be described with reference to Figs. 1 to 7 . Fig. 1 is a partially cutaway view showing a scanning exposure type exposure apparatus EX constituted by a scanning stepper of the embodiment. In Fig. 1, an exposure apparatus 具备 includes a light source unit 2 that generates exposure light (exposure illumination light) EL, an illumination optical system ILS that illuminates a reticle R (mask) with exposure light EL, and a holding reticle R The moving reticle stage RST and the image of the pattern of the reticle R are projected onto the projection optical system PL of the surface of the wafer w (substrate) coated with the photoresist (photosensitive material). Further, the exposure apparatus EX includes a wafer stage WST that holds the wafer W and moves, other driving mechanisms, sensors, and the like, and stores a reticle library 9 of a plurality of 201206548 reticle, and stores a plurality of unexposed portions. / or the wafer 匣 7 of the exposed wafer and the main control device (not shown) that controls the operation of the exposure device EX. The members from the light source unit 2 to the main control unit (not shown) are provided, for example, on the upper surface of the first floor F L1 in the clean room of the semiconductor element manufacturing factory. Further, the exposure apparatus EX includes a box-like high airtight chamber 10' chamber 10 provided on the ground FL1, and is partitioned into an exposure member 10d, for example, by two partitions (opening and closing with the shutters 24R and 24W). Room 1 〇a and loading chamber l〇b. Further, an exposure main body portion 4 including an illumination optical system ILs, a reticle stage RST, a projection optical system PL, and a wafer stage wst is provided in the exposure chamber 1A, and is provided in the load chamber 1b. The reticle loading system and wafer loading system including the reticle library 9 and the wafer E 7 are included. Further, the exposure rupture EX has an empty space for performing the entire interior of the chamber 1

The air conditioning system includes: a sub-chamber 1 disposed on the i-th; 2-ground FL2 and having a series arranging device 26, a sub-chamber 1 disposed on the ground FL2, and a sub-chamber 1 disposed in the exposure chamber 1? 9R, and is arranged in the projection optical system. The filter device 26 removes a predetermined impurity from the pipe L AR, and supplies the A1 as indicated by A1 to the air-conditioning main unit 3 via the first pipe 32, and passes through the opening of the 2012 F. Further, the second tube 35 inside the main body portion 31 and the chamber ι, and the ULPA filter in which fine particles (fine particles) are removed from the air flowing inside the second tube 35, for example, are disposed. (ultra L〇w Penetration Ai Bu filter) and the like 36. In the case of the tube % 35 and the piping Μ, for example, a material having a small amount of pollutants such as a non-mineral steel 3 fluorocarbon tree is used. The air-conditioning main unit 31 includes a temperature control unit 33A that controls the temperature of the air supplied through the i-th tube 32, a leak control unit 33B that controls the humidity of the air, and a fan motor 34 that sends the air to the second tube 35 side. . The air is controlled to be, for example, 23 in a range of 2 (rc to 3 〇〇c), and is supplied to the inside of the exposure chamber i〇a through the second tube 35 and the air outlet 18 in a downflow manner. The supply of air is set to a positive pressure state. The air in the second tube 35 is supplied to the exposure chamber 1A via the manifolds 35 & and 3讣 and the corresponding outlets ay and outlets 19R. The exposure chamber 1 A part of the air in the 〇a also flows into the loading chamber 1 Ob. As an example, the air flowing inside the chamber 10 (exposure chamber 10a) passes through a plurality of openings 45a from the cavity to the bottom surface and a plurality of openings Fli The opening 45b flows into the underground exhaust pipe 44, and the air in the exhaust pipe is discharged through a filter (not shown). Further, all or part of the air flowing to the exhaust pipe 44 can be returned to the pipe 25 side. Hereinafter, in the circle 1, the axis is taken in parallel with the optical axis 投影 of the projection optical system PL, and is perpendicular to the plane of the paper of FIG. 1 in a plane perpendicular to the ζ axis (in the present embodiment, a substantially horizontal plane). Take the 乂 axis and take the Υ axis in parallel with the paper surface of the 丨 来. In the embodiment, the scanning line of the scanning exposure and the scanning direction of the 201206548 wafer w are in the γ direction. Further, the rotation direction of the axis parallel to the χ axis, the γ axis, and the z axis is also referred to as 0X, 0y, First, the light source unit 2 provided on the ground FL1 outside the chamber 10 is provided with an exposure light source that generates ArF excimer laser light (wavelength: 193 nm) as exposure light el, and guides the exposure light EL to illumination. The light beam transmitting optical system of the optical system ils. The emitting end of the exposure light EL of the light source unit 2 is disposed in the exposure chamber through an opening in the upper side of the cavity γ γ direction. Further, a KrF excimer laser can also be used. An ultraviolet pulse laser light source such as a light source (wavelength 248 nm), a harmonic generation light source of a YAG laser, a harmonic generation device of a solid state laser (semiconductor laser or the like), or a mercury lamp (i line, etc.) are used as an exposure light source. Illumination optical system ILs disposed in the upper portion of the chamber 10, as disclosed in, for example, the specification of the US Patent Application Publication No. 2003/0025890, having an illuminance uniformizing optical system including an optical integrator, and a reticle a curtain, a concentrating optical system, etc. The illumination optical system ILS illuminates the pattern surface of the reticle R defined by the exposure light EL by a substantially uniform illuminance in a slit shape in the X direction. The illumination area. ^ is formed in the pattern area of the pattern area of the ^R line R, and the projection optical system PL is projected onto the crystal by the telecentricity of both sides and the projection magnification is reduced (for example, 1 / 4) Further, a lower frame 12 is disposed through the plurality of pedestals U in the &FU in the exposure chamber 10a of the chamber ίο, and a flat base member 13' is fixed to the base at the central portion of the lower frame 12. The component " is transmitted through, for example, three vibrations. The wafer base wb is supported by the flat wafer base wb, and the wafer carrier is temporarily placed in the X direction and the γ direction and rotatable in the 02 direction by the air bearing on the wafer pedestal 10 201206548 parallel to the χ γ plane. Again. At the upper end of the frame 12, the optical system frame 16 is supported by, for example, three anti-vibration tables 15 arranged to surround the wafer base. A projection optical system pL is disposed in the opening of the central portion of the optical system frame 16, and the upper frame 17 is fixed to surround the projection optical system PL on the optical system frame 16.

Further, a laser interferometer 21WY' having a Y-axis fixed to the end portion in the + γ direction of the bottom surface of the optical system frame 16 is fixed with a x-axis laser interferometer (not shown) at the end portion of the bottom surface in the +? direction. The wafer interferometer formed by the interferometer irradiates the reflection surface (or the moving mirror) on the side of the wafer stage WST with the measurement beam of the plurality of axes, for example, the reference mirror of the side of the projection optical system pL (not shown) Based on the measurement, the X direction of the stage WST, the position in the γ direction, and the rotation angle in the θ χ and θ γ θ directions are measured, and the measured value is supplied to a main control device (not shown). The stage control system in the main control unit (not shown) is based on the measured value of the wafer interferometer and the measured value of the autofocus sensor (not shown): through a drive mechanism including a linear motor or the like (not The figure shows the direction of the wafer WST, the position in the gamma direction, and the rotation angle of the velocity and direction, and controls the z stage (not shown) in the wafer stage WST to be the wafer w surface to focus on the projection optics. The image side of the system PL. Further, an alignment system ALG for aligning the wafer R and the wafer w is also provided. In other respects, the sub-chamber 22 of the illumination optical system ILS is fixed to the upper portion of the upper frame 17 in the + direction. Further, in the upper frame 17: the XY plane is parallel to the upper surface, and the reticle stage RST is placed through the air bearing. 201206548 The fixed speed can be moved in the Y direction and can be moved in the X direction and in the 0z direction. Further, a laser interferometer 21RY having a x-axis is fixed to the upper end of the upper frame 17 at the +Y direction, and a x-axis laser interferometer (not shown) is fixed to the upper end in the +x direction. The reticle interferometer formed by the interferometer, respectively, irradiates the measuring beam of the plurality of axes on the moving mirror 21 Μ γ or the like provided on the reticle stage RST, for example, a reference mirror on the side of the projection optical system PL (not shown) Based on the reference, the X-direction of the reticle stage WST, the position in the γ direction, and the rotation angles in the 0 X, 0 y, and θ Z directions are measured, and the measured values are supplied to a main control device (not shown). The stage control system in the main control unit (not shown) controls the Y direction of the reticle stage RST according to the measurement value of the reticle interferometer, etc., including a linear motor or the like (not shown). Speed and position, position in the χ direction, and rotation angle in the θ ζ direction. Further, when the exposure apparatus according to the present embodiment is a liquid immersion type, a partial liquid immersion mechanism (not shown) including, for example, an annular nozzle disposed on the lower surface of the optical member disposed at the lower end of the projection optical system PL is used for projection optics. A local liquid (pure water, etc.) is supplied to a partial liquid immersion area between the optical member of the front end of the system pL and the wafer W. As the partial liquid immersion mechanism, for example, a liquid immersion mechanism disclosed in the specification of the Japanese Patent Application Laid-Open No. 242247, and the like can be used. Further, when the exposure apparatus EX is of a dry type, it is not necessary to provide the liquid immersion mechanism. Further, in the interior of the loading chamber, a reticle magazine 9 and a horizontal multi-joint type robot, that is, a reticle loader 8, are provided on the upper support table 67. The reticle loader 8 replaces the reticle r between the reticle library 9 and the reticle stage RST by opening and closing the partition 8 00 _ 24r. Further, inside the loading chamber 10b, a wafer E7 and a horizontal articulated robot hand 6a for taking out or placing a wafer between the wafer E7 are provided on the lower support table 68. The horizontal multi-joint type is provided with a horizontal multi-joint type machine to constitute a wafer transfer device 6b. In the wafer transfer apparatus 6b, the wafer w is transferred between the horizontal articulated robots 6STST by the opening which is opened and closed by the shutter 24 of the partition member. Next, when the exposure apparatus is exposed thereto, the alignment of the reticle Μ wafer W is first performed. Thereafter, the reticle r is irradiated with the exposure light, and a part of the pattern of the reticle scale is projected onto the surface of the sunday W by the projection optical system PL, and the projection is performed. The projection magnification 光学 of the optical system PL is a scanning exposure operation in which the reticle stage stage rst and the wafer stage WST are synchronously moved (synchronously scanned) in the γ direction, and the reticle U pattern image is transferred in the irradiation area. Thereafter, the wafer w is stepwise moved in the χ direction and the γ direction through the wafer stage WST, and the scanning exposure operation is performed. The reticle R is transferred to all the irradiation areas of the wafer w by the step scanning method. The pattern image. The exposure apparatus EX, 4 of the eighth embodiment maintains the illumination characteristics, the brightness characteristic (illuminance uniformity, etc.), and the imaging magnification (resolution) of the projection optical system in a predetermined state, and sets the marking line. The ambient atmosphere (space) of the sheet r, the projection ", the first PL, and the wafer W is maintained in a predetermined environment, and exposure is performed with high exposure accuracy (resolution, positioning accuracy, etc.), for example, 13 201206548, which has an overall air conditioning system, The overall air conditioning system includes an air conditioner that supplies temperature-controlled clean air to the interior of the chamber 10 in a downflow manner. The air conditioning system has a partial air conditioning unit. That is, the manifolds 35b and 35a from the tube 35 are provided. The temperature-controlled clean air is supplied to the blow-out portion 19R of the bottom surface of the sub-chamber 22 and the blow-out portion w9w of the bottom surface of the optical system frame 16. In this case, the blow-out portions 19R and i9w are respectively disposed on the reticle The Y-axis laser interferometer 21RY for the RST and the Y-axis laser interferometer 21WY for the wafer stage WST are used for the measurement beam. The blow-outs 19R, 19W are temperature-controlled respectively. The air is distributed at a substantially uniform wind speed in a downflow manner (or in a lateral flow manner) to the optical path of the measuring beam. Similarly, the laser interferometer is also measured by the optical path of the beam. The temperature-controlled air can thereby accurately measure the positions of the reticle stage RST and the wafer stage WST by the reticle interferometer 21R and the wafer interferometer 21W. Further, in the load chamber 10b A partial air conditioner is provided. The partial vacant unit 60 includes a small fan motor disposed on the bottom surface of the support base 68, and supplies the air sent by the fan motor 61 to the top of the reticle library 9 and the crystal: the second 62' And before the arrangement, the ends are separated to supply the outlets 65 and 66 respectively. & 62R and 62W. Also, at the outlet 65 and;:...: do not have a filter such as a secret filter, in the wind Two: In the 62, there is a chemical filter (with W inch near ^ 33⁄4 ^, Λ ., ^ square 疋 疋 impurities), the filter phase 63, 64. As an example, the chemical filtration of the filter phase 63 When the system is 8 14 201206548, the organic gas (organic gas) The chemical filter of the filter case 64 removes an alkali gas (a gas of an alkaline substance) and an acid gas (a milk of an acidic substance). After the local air conditioner 60 is operated in the load chamber i〇b, the fan motor is operated. The air sent out 61 is supplied to the space in which the reticle library 9 and the wafer cassette 7 are disposed, from the air outlets 65 and 66, respectively, via the transition boxes 63, 64 and the tubes 62. Then, the flow is carried on the reticle. The air around the reservoir 9 is returned to the fan motor 61 via the periphery of the wafer holder 7 around the support table 67 and around the support table 67. Further, the air supplied from the air outlet 66 to the periphery of the wafer cassette 7 is supplied. Returning to the fan motor via the periphery of the support base 68, the air returning to the fan motor 61 is again supplied to the load chamber i〇b from the air outlets 65, 66 via the filter boxes 63, 64 and the dust filter. The local air conditioner 6 〇, the air in the load chamber 1 〇 b is kept in a clean state. Next, the configuration and operation of the filter device 26 connected to the air conditioner 30 in the overall air conditioning system of the present embodiment will be described. The filter device 26 has a box-shaped case 28 which is elongated in the Y direction and which is elongated in the Y direction, and a partition plate 42 which is divided into four planes in the γ direction in a substantially horizontal plane in a substantially horizontal plane. 42C and the first type of transition box 38 and the second type of filter case 4, which are provided in close contact with one of the partition plates 42A, 42A, and 42C (the surface in the +Υ direction in Fig. 1). And the transition 8 of the i-th type; the device 26 has two types and three (three-stage) transition boxes 38, 40 arranged in series. Hereinafter, the i-th type of filter box % is also referred to as a first filter case 38, and the second type of filter case 4 is also referred to as a first type 15 201206548 filter case 40. In the present embodiment, the filter surface of the filter case is disposed in a direction intersecting with the horizontal plane, for example, the filter surface of the filter case is disposed in the surface of the filter. In addition, the filter face of the filter box can also be arranged to tilt relative to the face. In this case, it is only necessary to form a tapered member on the frame installation surface of the filter case or a tapered member on the bottom plate 28h of the casing 28. In the present embodiment, the installation state of the filter case is set to be horizontal, which will be described below. Further, the filter device 26 has a window portion 28b (see FIG. 2) for opening or inserting the filter case 38 when the filter case 38, 4 is inserted or replaced. The casing 28 is openably and closably mounted to the door 29 through a hinge mechanism 29h (refer to Fig. 3). An opening 28a is formed in the upper space of the first space of the end portion of the casing 28 in the +γ direction, and an end portion of the pipe 25 for drawing the air-conditioning air AR is attached to the opening 28a, and is formed in the side wall of the casing 28 The opening 28g has a first tube 3 2 connected to the fourth space through opening 28 g at the end in the ?-γ direction of the casing 28. Fig. 2 is a view showing a filter device 26 of a bear that has opened the door 29 of the casing 28 of Fig. 1. In Fig. 2, for convenience of explanation, the casings 28 and 29, and the partition plates 42A to 42C are indicated by two-dot chain lines. In the circle 2, the door 29 is fixed to allow the gasket 46 to be formed between the periphery of the sealed window portion 28b and the end portions of the partition plates 42A to 42C and the door 29 when the window portion 2 of the casing 28 is closed by the door 29. The gasket 46 can be made of a material having excellent corrosion resistance and less degassing, a sheet of Teflon (registered trademark of DuPont), or a ruthenium. 16 201206548 In the interior of the body 18, the first filter case 38 of the partition plate 42 of the universal end is placed transversely to the _γ partition plate 42 Α and the Υ a a _ 4 door, respectively. The opening of the frame 50 (refer to FIG. 3) maintains a chemical machine that is useful for removing the body (the gas of organic matter). Further, the second filter 40 that is placed in contact with the center knife partition 42B is placed in the opening 5/f (see 3) of the frame 55, and an inert gas such as ammonia or amine is removed. The gas filter) and the chemical filter 56 of the acid gas (the gas of the 1111 substance). The width of the filter boxes 38, 40 in the Υ direction is, for example, 200 to 400 _, and each transition box 38, 4G The weight is, for example, about 10 to 20 kg. As the chemical filtration H 51 for organic gas removal, for example, an activated carbon type reactor or a ceramic type filter can be used. Chemically used in the stomach 56, can use additives activated carbon filter state, ion exchange resin filter, ion exchange fiber filter, or additive Tao Jing type of instrument, etc.. 'Frame 5, 55, separated Plates 2 to 42C, cassettes 28, and doors 29 are respectively made of (4) resistant to depletion (4), for example, an oxide film (oxidized aluminum) or stainless steel formed on the surface. In addition, the frame 50, 55, etc. can also contain (4) money and less degassing Material (so as to cover the laminate of a polyethylene or paragraph-based resin) or the like. Further 'by removing the organic gas, the chamber of the exposure chamber 1〇 ...

In the transmittance of the internal exposure light EL, B M is half-literated and the generation of the mist material formed on the surface of the optical element is suppressed by the interaction of the organic gas and the exposure light EL. Further, by removing the alkali gas and the acid gas, the change in the photoresist characteristics of the wafer w and the like are suppressed. In particular, when the photoresist is a chemically amplified photoresist, 17 201206548 If there is an alkali-based gas such as ammonia or amine in the air, the generated acid reacts to form an insoluble layer on the surface of the photoresist. Therefore, it is effective to remove an alkali-based gas such as ammonia or an amine. Further, the configuration of the chemical filter in the filter boxes 63, 64 in the loading chamber 10b of Fig. 1 is the same as that of the chemical filters 5, 56. However, it is also possible to pass the '6', 6 4, and the smaller than the box 3, 4, 0 0. Further, the filter device 26 has a side wall 28i fixed in the -X direction of the casing 28 and positions the filter boxes 38, 4, 38, respectively, at the positioning blocks 48A, 48B of the partition plates 42, eight, 42B, 42C, 48C, and the moving rods 58A, 58B, 58C which are respectively biased by the filter box 4, 38, 38 in the vicinity of the center in the 2 direction to the positioning block 48, 4884^. The positioning blocks 48A, 48B, 48C have tapered portions 48Aa, 48Ba, 48Ca which are formed by planes which are inclined clockwise with respect to the zy plane at a predetermined taper angle 0 (refer to Fig. 3). Fig. 3 is a plan sectional view showing the filter device 26 in a state in which the door 29 of the casing 28 of Fig. 2 has been closed. However, in Fig. 3, the air intake opening formed in the upper plate of the casing 28 is indicated by a two-dot chain line: in Fig. 3, 'the partition plates 42A to 42C are respectively formed to pass through the transition box 38, 40 air passes through the opening 42Aa, 42 knows, 42 heart, the space inside the box μ is divided into four spaces (10) 仉 (10) by the partition plate 42 Α ~ 42C & + Y direction ... the old call through the opening ... connected In the pipe 25 of Fig. 1, the fourth space 28f is connected to the figure through the opening %. The pipe and the taper portion 48 of the positioning blocks 48A to 48C are equal to each other, and the cone is equal to each other, for example, 2G°. ～4『, as an example, the taper angle is 0 18 201206548. The moving rods 58A, 58B, 58C having the same configuration are connected so as to be fixed to the partition plates 42B, 42C and the +Y direction of the casing 28 with respect to the blade. The side wall fulcrum members 59A, 59B, 59C (holding members) are rotated about an axis (0 2 direction) parallel to the Z axis. As an example, the movement lever 58A has a rod 58A1 rotatably coupled to the fulcrum member 59A, a hemispherical abutment member 59A2 and a handle 58A3 which are fixed to the filter stalks 38 side of the rod end portion and the opposite side. For a long time, the configuration of the filter phases 38 and 40 will be described with reference to Figs. 4(4) and 4(b), which are perspective views when the buffer boxes 38 and 40 are viewed from the side of the partition plates 42A and 42B of Fig. 2, respectively. In the orthogonal coordinate system in Fig. 4 (4) and Fig. 4 (8), the Z) system indicates the filter case % and the coordinate system which is placed in the state of the target position in the filter device %. As shown in Fig. 4(A), the first filter case 38 has a substantially annular frame 5A having a substantially square opening 50f at the center, a chemical filter 保持 held in the opening, and a frame 5〇. One of the pair of convex handle portions 70Α. The material of the crotch panel 54 is the same as that of the crotch panel 46. Further, in the present embodiment, the first end face 5〇a' in the Υ-direction parallel to the cymbal 〇 is provided with a substantially square annular cymbal 54 (sealing member) that is fixed to surround the opening 50f. . Further, the spacer 54 may be provided on the object side to which the first end face 5〇a abuts (for example, the partition plate, the opening 5〇f of the filter case 38 may be a quadrangle or a polygon. The shape of the frame 5 is not limited to a square, and is also a rectangular shape or a polygonal shape. 〃 Further, the filter case 3 8 is on the four sides of the frame 50, the side of the χ direction 19, the side of the 201206548 side, and the second side of the side of the +x direction. The first tapered portion 50b and the second tapered portion C are formed to have a second end face in the +γ direction parallel to the crucible of the frame 50, respectively. The 1st end face 5〇 is formed by a plane inclined to the outer side of the frame 5〇. The second side face is opposed to the opposite side of the chemical filter% (or the opening 50f of the frame 5〇) via the i-th side. The portion 5〇b is inclined clockwise at a taper angle 0 with respect to the ζγ plane, and the second taper portion 5Ge is opposite to the ζγ plane counterclockwise with a taper angle and a taper angle </» with the taper portion 48Aa of the positioning block 48Α~48C of FIG. The taper angle of 48Ca is equal. Therefore, in Fig. 3, when the angle formed by the end face *the upper face 50b of the opposite frame 5〇 is ^, the sum of the angle 〇 and the miscellaneous angle is 90. In Fig. 4(A), the handle portion 70a is fixed to the position of the i-th tapered portion 5〇b of the frame 50 which is offset from the center portion in the direction of the ,, and the center of the frame 5 is tapered from the center. The handle portion 7〇a is fixed at a position offset from the +z direction. The same is printed on the opposite side of the frame 50, and the handle portion 7 is located at a point symmetry = position. The side faces in the z direction are the setting faces 50d and 50e which are respectively parallel to the XY plane. The setting surface 5〇d of the frame 50 of the filter case 38 is placed on the bottom plate 28h of the third space 曰1 28e of the casing μ, As shown in FIG. 3, the first tapered portion 50b of the frame 5q is brought into contact with the tapered portion 488 of the positioning block 48A, and the end surface 50a of the frame π is in close contact with the partitioning plate 42A through the spacer 54. 3: The position of the transition box 38 in the 28e is set to Q1. After the raft: the box '38 is stabilized by its own weight due to the transverse direction. In this case, 'because of the taper portion 48Aa of the positioning block 与 and the handle portion 70A Since the concave portion 20 201206548 48Ab is formed at the opposite position, the i-th tapered portion 5〇b can be brought into close contact with the tapered portion 48Aa even with the handle portion 7A. Similarly, the first empty portion of the casing 28 The setting position Q3 in the space 28c, the setting surface 5〇d of the frame 50 of the filter box 38 is placed on the upper surface of the bottom plate 28h, and the first tapered portion 5〇b of the frame 50 contacts the tapered portion 48Ca of the positioning block 48C, and the end surface The 50a is in close contact with the partitioning plate 42C through the spacer 54. Further, the handle portion 70A provided in the i-th tapered portion 50b is housed in the recessed portion 48Cb of the tapered portion 48Ca of the positioning block 48C. Further, the filter case 38 is In a state where the pair of grip portions 7A are removed, even 丨8〇 is rotated about the axis (0 y direction) parallel to the Y-axis. The shape is also the same, so that the other setting surface 5〇e of the frame 50 can also be placed on the bottom plate 28h of the casing 28. When the installation surface 5〇e is placed on the bottom plate 28h as described above, the second tapered portion 50c of the frame 50 contacts the tapered portion 48Aa (48Ca) of the positioning block 48A (48C), and is disposed on the handle of the second tapered portion 50〇. The portion 7A is housed in the recess 48Ab (48Cb), so that the filter case 38 can be correctly set at the set position Q1 or Q3. As shown in Fig. 4(B), the second filter case 4A has a substantially annular frame 55 having an opening 55f at the center portion and a chemical filter 56 held in the opening 55f having the same shape as the frame 5''. Further, the filter case 4A is provided on the side surface on the -X direction side of the frame 55 and the side surface on the +X direction side, and has an i-th tapered portion 55b and a second tapered portion 55c, respectively, and the first tapered portion 55b and the second portion The tapered portion 55c is symmetrically formed so as to incline from the second end surface 55g in the +Y direction toward the first end surface 55a side in the γ direction at the taper angle 0 to the outside of the frame 55. The second filter case 4 is similarly to the first filter case 38. The spacer 54 may be fixed to surround the opening 55f at the end face 55a of the 21st 201206548 1 in the Y direction of the frame 55. Further, similarly to the i-th filter case 38, the opening 55f of the second filter case 40 may have a rectangular shape or a polygonal shape such as a square shape. Further, the shape of the frame 55 is not limited to a square, and may be a rectangle or a polygon. Further, the frame 5, 55 can be manufactured by, for example, molding. Further, the filter case 40 has a position fixed to a position shifted from the center of the i-th tapered portion 55b toward the +z direction, and a position on the second tapered portion 55e which is substantially point-symmetric with respect to the center of the frame 55. On the handle part. Further, the side faces of the frame 55 in the -Z direction and the +Z direction are provided with faces 550 and 55e, respectively. In the present embodiment, the difference between the i-th filter (four) and the first shape is that the handle portion (10) and the eagle are offset in the opposite directions in the Z direction. Further, this shape is different, even if the filter boxes 38, 40 are rotated 18 Hz in the 0y direction. Also maintained. Therefore, the operator can easily distinguish the transitioners 38, 4() from each other in appearance. Further, the handle portion 7A of one of the frames 50 of the _4 (A) is, for example, bolted (not shown) to the screw holes of the tapered portions 50b, 50c, at the center of the taper portion, 5〇c The mounting area ei e2 is set at a position symmetrical with the phase of the hand in the z direction (the shape of the handle can be attached to the handle hole 70A). Therefore, the mounting position of the pair of handle portions 7A to the 钸 鸠, 50a, In the embodiment, the direction orthogonal to the oblique direction is variable. Therefore, by attaching the handle portion 70A to the mounting region m of the frame 5, E2, 5 can be used as the second The filter box 40 is used by the frame 55. 7 ground, in item 4 (B), - the handle portion is thinned to the taper of the frame ,, and the mounting position of the 5a is between the mounting area and the mounting area. Tilting 22 201206548 70B Mounting to frame 55 1 The direction of the filter box 38 is variable. Therefore, the frame 55 can be used as the frame 50 by attaching the mounting portions E3, E4 of the handle portion. The setting surface 55d of the frame 55 of the case 40 is placed on the bottom plate 28h of the second "8d of the casing μ'. The first tapered portion 55b of the frame 55 is connected as shown in FIG. It is similar to the tapered portion 4 of the positioning block 48A, and the end surface of the frame 55 is in contact with the partition plate 42B through the cymbal 54, and is the installation position Q2 of the filter case 4 in the second working chamber 28d. The case is stabilized by its own weight due to the lateral position of the case. In this case, since the recessed portion 4 is formed at the position where the taper portion of the positioning block and the handle portion are facing, the handle portion 70B can be the i-th. The tapered portion 55b is in close contact with the tapered portion 48Ba. Further, the filter case 40 is also similar in shape to the 180° rotation in the 0 y direction, so that the pair of handle portions 7〇a can be removed. The other setting surface 55e of the frame 55 is placed on the bottom plate 28h of the casing 28. When the setting surface 55e is placed on the bottom plate 28h as described above, the second tapered portion 55c of the frame 55 contacts the positioning block 48B. Since the tapered portion 48Ba is housed in the recessed portion 48Bb by the handle portion 70B provided in the second tapered portion 55c, the filter case 40 can be accurately placed at the installation position q2. Further, as shown in Fig. 2, the recessed portion 48Cb of the positioning block 48C is provided. The position is in the lower position with the handle portion 70A (the recess 48Ab of the positioning block 48A is also the same) '疋 block The position of the recessed portion 4 8 B b of 4 8 B is located at a higher position in cooperation with the grip portion 7 0 B. Therefore, if the second filter case 4 is to be placed at the set position Q3 or Q1 in the space 28c or 28e, Since the handle portion 70B of the filter case 40 201206548 mechanically interferes with the core 4 or 48Aa of the positioning block 48C or 48A, it is possible to prevent the filter case 4 from being erroneously disposed at the set position Q3, Q1. If the i-th filter case 38 is to be placed at the set position Q2 in the space 28d, since the handle portion 7A of the filter case 38 mechanically interferes with the tapered portion 48Ba of the positioning block 48B, the filter case 38 can be prevented from being mistakenly moved. The position is set in the setting position Q2. As described above, according to the present embodiment, the position of the handle portion 70A of the filter case 38 is different from the position of the handle portion 7B of the filter case 4, and the positioning in the corresponding case 28 is performed. The position of the recess 48Aa 48Ca of the blocks 48A, 48C is different from the position of the recess 48Bb of the positioning block 48B. Therefore, it is possible to prevent the filter case 4〇 having the chemical filter 56 (to remove the alkali gas and the acid gas) from being disposed in front of the partition plates 42A, 42C, and conversely, to prevent the chemical layer 56 from being disposed in front of the partition plate 42B. A filter box 38 of a filter 51 (for removing organic gases). Next, in Fig. 3, after the filter boxes 38, 40, and 38 are disposed at the setting positions Q1, Q2, and Q3 in front of the partition plates 42A, 42B, and 42C, respectively, the respective filters are moved by the moving rods 58A, 58B, and 5 8C. The boxes 38, 40, 38 are biased against the partition plates 42A, 42B, 42C' in the state where the door 29 of the casing 28 is closed, by positioning blocks 48 to 48 (: and the moving rod 58 to 58 ( : The airtightness between the partition plates 42 to 42 (: and the pivots 50, 55 of the filter boxes 38, 40 is maintained high by the spacer 54. As a result, the opening of the casing 28 is formed. The gas in the first space 28c sandwiched between the upper plate 28a and the partition plate 42C must pass through the chemical filter 51 of the filter case 38, and pass through the opening 42Ca to flow into the partition plates 42B and 42C. Similarly, the gas in the space 28d must pass through the chemical filter 56 of the filter case 40, and then enters the third space 28e sandwiched by the partition plates 42A and 42B through the opening 24 201206548 42Ba '. Similarly, the gas in the space 28e must pass through the chemical filter 51 of the filter box 38, pass through the opening 42Aa, the fourth space 28f on the back side of the partition plate 42A, The opening 28g of the side wall of the body 28 flows to the first tube 32 of Fig. 2. Therefore, the air AR flowing in from the opening 28a in the upper portion of the +Y direction of the casing 28 must pass through two (two sections; The filter case 38 for removing gas and one (one) of the alkali-type gas and the filter case 40 for acid gas removal are supplied to the air conditioner 3 of FIG. 1, so that the chamber 1 is supplied with height removal. Air of impure material. Next, the installation and replacement of the cartridge 28 by the filter boxes 38, 40 will be described with reference to the flowcharts of Figs. 5(A) to 6(B) and Figs. 7(A) and 7(B). 5(A) to 6(B) are plan views showing the filter device 26 of the casing 28 in a cross section. First, two filter boxes 38 and one filter phase 38 are initially provided in the casing 28. At step 1〇2 of Fig. 7(A), the two filter boxes 38 filled with the unused chemical filter 51 are prepared in Fig. 4(a), and the filling of Fig. 4(B) is not A filter case 4 of the chemical filter 56 is used. In the next step 104, after the lock (not shown) of the case 28 is released and the door 29 is opened, as shown in Fig. 5(A) The heads B1 open the moving levers 58A to 58c to the front (the outer side of the window portion 28b of the casing 28). In the next step 106, the operator grips the handle portion 70A of the first filter case 38, and will The installation surface 5〇d of the filter case 38 (frame 50) is placed on the bottom plate 28h (refer to FIG. 2) in the third space 28e of the casing 28. Next, the operator will filter the filter as indicated by the arrow B2. The box 38 is pressed into the third space 28e 25 201206548. In the next step 108, as shown by an arrow B3 in Fig. 5(B), the operator engages (contacts) the first tapered portion 50b of the filter case 38 with the tapered portion 48Aa of the positioning block 48a. One of the handle portions 7A of the filter case 38 is housed in the recess 48Ab of the positioning block 48a. Next, as shown by an arrow B4, the movement lever 58a is pressed against the second tapered portion 50c of the transition box 38, and the movement of the filter case 38 is started. In the next step 110, the operator rotates the movement lever 58A as shown by an arrow B5 in Fig. 6(A), and the filter case 38 is biased toward the _> direction and the _γ direction. As indicated by an arrow B6, in a state where the first tapered portion 50b of the frame 50 of the filter case 38 comes into contact with the tapered portion 48 of the positioning block 48A, the filter case 38 is moved to the set position Q1 of the case 28, the filter The end face 50a of the case 38 (frame 50) is in close contact with the partition plate "A" via the spacer 54. In the next step 112, the operator grips the handle portion 70B of the second filter case 4, and the filter case 40 is placed. The installation surface 55d of the (frame 55) is placed on the bottom plate 28h in the second space 28d of the casing 28. Next, the operator presses the filter case 4 into the second of the casing 28 as indicated by the Z arrow B7. In the space 28d, the second-step 114 towel' operator inserts (contacts) the i-th tapered portion 55b of the buffer box 4〇 with the taper portion/8Ba of the positioning block 48B as shown in Fig. 6(B). The moving rod 58B is pressed against the second tapered portion 5 of the filter case 4〇. One of the handle portions of the filter box 4 is manually received in the recessed portion 48Bb of the positioning block: - Person - in step 116, the operator Arrow B8 Rotating the moving rod (10) in a stepwise manner as shown by an arrow B9, in a state where the first tapered portion 55b of the frame 55 of the filter case 4 is in contact with the tapered portion 48Ba of the positioning block 48B, the filter is made The box 40 is moved to the set position in the casing 28. Thereby, the end face of the filter box 40 (frame 55) is in close contact with the partition 42B via the spacer 54. In the next step 118, as indicated by the arrow B1〇 As shown in the figure, the third filter case 38 is moved in the first space 28c of the casing 28, and the moving rod 58C is rotated to set the passing box 38 to the installation position in the first space 28c. In a step 120, the door 29 of the casing 28 is closed and locked, whereby the setting of the filter boxes 38, 40 is completed. At this time, the third taper portion 5b of the filter box 38 (40) (55b) Pressing against the tapered portion 48Aa (48Ba) of the positioning block 48A (48B) and only pressing the filter case 38 (40), (4) 1 | box 38 (4G) is set in front of the partition plate 42a (42b) for a short time. Position Q1 (Q2) Therefore, the position of the target position of the filter case 38 (4〇) and the internal chemical filter 5 1 (56) can be performed efficiently and easily. ,,people at When the filter case 38, 4〇 in the benefit body 28 is replaced, first, in step 122 of FIG. 7(B), Φ, /Mr / the operator releases the lock of the case 28 to open the door 29'. The figure opens the moving lever 58C in the forbidden country (β) as indicated by the arrow D1. In the next step 124, the purple is used to grasp the filtering in the first space 28c. 1 Female moves out of the filter box 38 as indicated by the arrow D2. In the next step 126, the circle is 1 Α), as shown by the arrow D3, the movement is used + the dry 5 8 Β, then the operator grasps the 2nd door 9 . 把手 the handle portion 70B of the filter box 40 in the 28d And filter box

^ The first tapered portion 55b of the crucible moves forward along the taper 48Ba of the positioning block 48B. In the next step 128, the operator does not pull out the filter box u „ the second space 28d of the dish 28 by the arrow D4.

In the two-person step 130, as shown in Fig. 5 (B-bar 58A, the operator grasps the movement Ψ ^ 70 A , the handle of the damper box 38 in the third space 28e as shown by the operator D5. P 70A And the handle portion is in the direction indicated by the front D6. Thereby, 27 201206548, as indicated by an arrow D7, the first tapered portion 50b of the filter case 38 moves forward along the tapered portion 48Aa of the positioning block 48A. In Fig. 5, the operator pulls the filter case 38 from the third space of the casing 28 as indicated by an arrow D8 in Fig. 5(A). In the next step 134, the same steps as steps 1〇6 to 118 are performed. The operator places the new filter boxes 38, 4 作为 in the target position in the casing 28. In the next step 136, the filter box 3 is locked by closing the door 29 of the casing 28. Replacement of 8, 4 0. At this time, since the filter boxes 38, 40 can be easily pulled out from the installation position, the filter boxes 38 and 4 in the casing 28 can be easily and efficiently replaced. The effects and the like of the present embodiment are as follows: (1) The exposure apparatus of the present embodiment includes an entire air conditioning system including the filter device 26 and the air conditioner 30. The filter device 26 is a device that accommodates the chemical filter 51. The filter device 26 includes a box-shaped (cylindrical) that holds the chemical filter 51 (i-th filter). The frame 50 (first frame) and at least a part of the side surface (first side surface) formed in the frame 5〇 are gradually inclined from the second end face 5〇g side of the frame 50 toward the first end face 50a side to the frame 5 a t-th tapered portion on the outer side (the i-th inclined portion as the S i shape changing portion); and a case 28 (accommodating portion) in which the filter case 38 is housed. Further, the first of the two end faces of the frame 5 The end surface 50a is provided with a gasket 54 (first sealing member). The casing 28 has a bottom plate 28h (first base member) that supports the side surface of the frame 5, which is different from the side surface of the frame 5, and has a card. In conjunction with 28 201206548 frame 50, the tapered portion 48Aa (i-th guiding surface) of the tapered portion 5〇b is positioned to position the positioning block 48A of the frame 50 (the i-th positioning member), and by the positioning block and the first tapered portion 50b is engaged and presses the partition plate 42A (first partition member) of the i-th end face 5〇a of the frame 5〇. The filter is used again. The method of accommodating the filter of the filter 26 in the casing 28 (accommodating portion) includes a step 102 of preparing the first filter case 38, and the first transition box 38 is provided with the chemical filter 5 i and the third cone is formed. a frame 50 of the portion 50b and a spacer provided on the i-th end surface 5 of the frame 5〇; the side surface (the installation surface 50d) of the frame 50 adjacent to the side on which the i-th tapered portion 5〇b is formed is placed a step of the bottom surface 28h of the casing 28; the first tapered portion 5〇b of the frame 5 is engaged with the tapered portion 48Aa of the casing 28 to move the frame 5〇 in the direction of the partition 42A of the casing 28. The step is just as follows; and the step 50a of pressing the end face 50a of the frame 50 through the spacer 54 to the partition plate 42 is < According to the present embodiment, by moving (moving) the frame 50 so that the first tapered portion 50b of the frame is moved along the positioning block 48A of the casing 28, the frame 5 can be efficiently and easily positioned. (The filter box (6) is provided for the target position in the cassette body (contacting the position of the partition plate 42). In other words, the i-th taper portion 5〇b of the frame 50 can perform two functions of movement and positioning. (7) The filter box 38 includes the second tapered portion 5Ge (the second inclined portion as the shape changing portion), and the second tapered portion 5〇c (the second inclined portion as the shape changing portion) is formed in the frame 50 and formed. At least a part of the side surface (second side surface) on the opposite side of the side surface of the tapered portion 5〇b is gradually inclined from the end surface 50g side toward the end surface 50a side to the outer side of the frame %, and the casing μ has a box. The body 28 is provided to be movable and is engaged with the second cone 29 of the frame 5〇 201206548 =,: the frame 5° is transmitted through the abutting member 58A2 (third guiding surface)

In t's movement lever 58A (second positioning member). Therefore, the movement of the frame 50 can be smoothly performed. Further, the movement levers 58A to 58 (not necessarily provided.) (3) Further, the filter device 26 is provided with a second filter case 4, which is provided with a chemical filter 5" The frame-shaped frame 55 (second frame) and the second sealing member provided on the end surface "a of the frame 55" are formed on the side surface (the third side surface) of the frame" to > The second end surface 55g side of the frame 55 is inclined toward the first end surface 55a side to the second taper state (third inclined portion) outside the frame 55. Further, the casing 28' includes a bottom plate 28h (second base member) of the support frame 55 and a side surface on which the first tapered portion 55b is formed: a different side surface (the installation surface 55d), and an i-th tap that is engaged with the frame 55 The tapered portion (second guiding surface) of the portion 55b presses the clamping block 48B (third positioning member) of the positioning frame 55 and the end surface 55a of the frame 55 by engaging the positioning block with the first tapered portion 50b. Partition plate 42B (second partition member). Therefore, by biasing (moving) the frame 55 to move the first tapered portion 55b of the frame 55 along the positioning block 48B of the casing 28, the frame 55 can be carried out in an efficient and easy manner (chemical filter 56). The setting of the target position in the casing 28 (contacting the position of the partition plate 42B). Further, the partition plates 42A to 42C in the casing 28 are substantially parallel to the surface including the straight line (substantially perpendicular to the horizontal plane). However, in the present embodiment, since the positioning blocks 48A to 48C are provided, the smoothing can be smoothly performed. Movement and positioning of the filter box 38. Further, the positioning blocks 48A to 48C may be inclined, for example, with respect to the surface of the lead-containing straight line of the package 8 30 201206548. (4) Further, the filter case 38 is provided with a fourth tapered core portion (fourth inclined portion) formed on the side opposite to the chemical filter 56 on the side surface of the frame 55 on which the 帛i taper portion is formed. At least a portion of the side surface (fourth side surface) is gradually inclined from the end surface 55g side toward the end surface 55a side to the outer side of the frame, and the casing 28 is provided to be movable in the casing 28 and engaged with the second tapered portion of the frame 55. 55c, the frame 55 is pressed against the movement lever 58B (fourth positioning member) of the partition plate 42A through the abutting member 5882 (fourth guide surface). Therefore, the movement of the frame 55 can be smoothly performed. (5) Further, the i-th tapered portion 5〇b and the second tapered portion 5〇c of the frame 50 are formed on both side faces of the frame 50, and the i-th tapered portion 55b and the second tapered portion 55c of the frame 55 are formed in the frame. The two sides of the 55 are comprehensive. Therefore, the processing of the tapered portions 5〇b, 5〇c, and the like is easy. Further, the tapered portions 50b, 50c may be formed only on a part of the corresponding side faces of the frame 5''. In this case, the corresponding positioning blocks 48A, 48C on the side of the casing 28 may be formed with a tapered portion (i-th guiding surface) only in a portion corresponding to the tapered portion 50b. The taper portions 55b and 55c (the third guide faces) are also the same. (6) Further, since the tapered portions 5〇b, 50c of the filter case 38 (frame 50) and the tapered portions 55b of the filter case 40 (frame 55) are formed into a flat surface, that is, a linear shape, The tapered portions 48Aa, 48Ba of the corresponding positioning blocks 48A, 48B are also formed in a plane "so that the formation of the tapered portions 50b, 50c, etc. is easy. However, the tapered portions 50b, 50c and the tapered portions 55b, 55c may be formed in a convex or concave spherical shape, that is, a curved shape. In this case, the tapered portions 48 Aa, 48Ba of the positioning blocks 48 A, 48B corresponding thereto are formed into a concave or convex spherical surface 31 201206548, and can be similarly used in the same manner as in the above embodiment. Movement and positioning of the buffer box 3 8, 4 0. (7) Further, the convex handle portion 70Α (the first handle portion) provided on the side surface of the frame 5 of the filter case 38 of Fig. 4(A) is attached to the first tapered portion 5仳, and The tapered portion 48 of the positioning block 48A in the corresponding casing 28 is provided with a recess 48Abe through which the handle portion 70A can pass. Therefore, even if the handle portion 7〇a is used, the first tapered portion 50b of the frame 50 can be closely attached to the positioning. Block 48 eight of the cone 48 48 ^ and move. This point is also the same for the handle portion 70B (second handle portion) of the first tapered portion 55b of the filter case 40. (8) Further, the convex handle portion 70A (the third handle portion) provided on the side surface of the frame 50 of the filter case 38 of Fig. 4(A) in the +χ direction is provided in the second tapered portion 5〇Ce, Since there are two handle portions 70A', the transfer of the filter case 38 is easy, and even if the filter case 38 is rotated by 8 inches. Further, the second tapered portion 50c of the frame 5A can be moved in close contact with the tapered portion 48Aa of the positioning block 48A. This point is also the same for the handle portion 70B (fourth handle portion) of the second tapered portion 55c of the filter case 40. Further, the frame 50 can also form a concave handle portion instead of the convex handle portion 70A. Similarly, the frame 55 can also form a concave handle portion instead of the convex handle portion 70B. Further, the handle portions 70A, 70B are not necessarily provided. (9) Further, in FIG. 4(A), the handle portion 70A may be provided at a position F2 near the end surface 50a in the vicinity of the center of the second tapered portion 50c of the frame 50 of the first filter case 38, and the first cone may be provided. The handle portion 70A is provided at a position where the position F2 of the portion 50b is symmetrical. In this case, the recess 48 Ab is formed at a position corresponding to the tapered portion 48Aa 8 201206548 of the positioning block 48A of Fig. 2 . Further, in Fig. 4(B), the handle portion 70B is provided at a position F4 away from the end surface 5 〇a in the vicinity of the center of the second tapered portion 55c of the frame 55 of the second filter case 40, and is formed in the first tapered portion 55b. The handle portion 7 0 B is disposed at a position where the position F4 is symmetrical. Further, a concave portion 48Bb is formed at a corresponding position of the tapered portion 48Ba of the positioning block 48B of Fig. 2 . In this case, the positional relationship of the handle portions 70A, 70B to the frames 50, 55 is different from the distance between the end faces 55a, 55a. Therefore, the operator can recognize the filter boxes 38, 40 from the positions of the frames 50, 55 from the grip portions 7a, 70B. (10) Further, the chemical filter 51 (filter material) of the filter case 38 (in the frame 50) is a chemical filter for removing the organic gas (organic matter) in the gas passing therethrough, and the filter case 40 (in the frame 55). Since the 56 (filter material) removes the alkaline gas and the acid gas in the gas passing therethrough, the air in which the impurities have been highly removed can be supplied into the chamber 1 of the storage main body portion 4. Further, the transition means in the frame 55 may be, for example, at least one of an alkaline substance and an acidic substance in the gas passing therethrough. Further, the impurities removed by the chemical converter may be arbitrarily absorbing, for example, an organic gas with an alkaline gas and an acid gas by a chemical reducer. Further, the filter in the frames 50, 55 can use any filter (filter material) other than the chemical transition device. For example, as the filter in the frame 5, 55, a dust filter such as a HEPA filter or a ULPA filter for removing minute particles (fine particles) can also be used. (11) Further, in the filter device 26 of the present embodiment, two filter cases 38 (frame 50) and one filter case 40 (frame 55) are provided, but the frame 50 of the transition device 26 is provided. The number of 55 is arbitrary. Further, the filter unit 26 may be provided with only one or a plurality of frames 5, or one or a plurality of frames 55. (12) Further, in the exposure apparatus of the present embodiment, the exposure light el is transmitted through the pattern of the reticle R and the projection optical system. (1) exposing a wafer w (substrate), comprising: a chamber 10, accommodating the exposure main body portion 4 for exposing the wafer W; the filter device 26 of the present embodiment; and the air conditioner 3, from the outside of the chamber The extracted air is sent to the chamber 1 via the filter device 26. According to the present embodiment, since the filter boxes 38, 40 (frames 5, 55) of the filter device 26 can be replaced efficiently, the positioning of the frames 50, 55 can be performed with high precision, so that it is efficient The maintenance of the exposure apparatus is performed, and the impurities of the air in the chamber 10 can be removed with high precision. Further, in the present embodiment, as the frame of the filter boxes 63, 64 of the partial air conditioner 60 in the loading chamber 1b, the same shape as the frames 50, 55 of the filter case 38 can be used to form the tapered portion. In the frame, the filter case 64 is housed in a case having a positioning block formed with a tapered portion similar in shape to the positioning blocks 48A to 48C. Further, the above embodiment may be modified as follows. In the following modifications, the same reference numerals are given to the portions corresponding to those in Fig. 3 (A) and Fig. 5 (B), and the detailed description thereof will be omitted. (1) Fig. 8(A) is a perspective view showing the i-th filter case 38A according to the first modification of the first embodiment and the positioning block 48A corresponding thereto, and Fig. 8(b) shows the first modification. 2 is a perspective view of the filter box 40A and the positioning block 48B corresponding thereto. By placing the positioning block 48a of FIG. 8(A) and the clamping block 48A of FIG. 8(b) in place of the positioning blocks 48A, 48C and 48B of FIG. 2, respectively, 8 34 201206548 is provided in the casing 28, and this can be The filter cases 38A, 4A of the first modification are provided in the casing 28. In Fig. 8(A), the i-th filter case 38A has a substantially annular frame 50 holding the chemical filter η, and a crotch piece 54A provided in the second end surface of the frame 5's (the shape after cutting off a part of the spacer 54) The handle portion 5〇μ (the i-th handle portion) formed by the concave portion provided on the side surface (the first side surface) of the frame 5, and the side surface of the (4) 5G direction are formed to narrow the grip portion 50bl in the z direction. Further, from the second end face 5〇g of the frame 50 to the i-th end side, the two i-th tapered portions 5〇1)2 and 5〇b3 (two portions of the first inclined portion) are gradually inclined to the outside of the frame 50. Further, the filter case 38A has a handle portion 5〇 (:1 (third handle portion) formed of a concave portion provided on the side surface (third side surface) in the +X direction of the frame %, and a side surface of the frame 50 in the +x direction The two tapered portions 50c2 and 5〇c3 (two portions of the second inclined portion) that are gripped by the grip portion 50cl in the two directions and are inclined symmetrically with the second taper portions 5〇b2 and 5〇b3 are formed. The handle portions 50b1, 50c1 are provided with grip portions 49a for making it easier for the operator to grip. Further, the position of the grip portion 50b1 in the z-direction of the mounting surface of the frame 50 is lower than the position of the grip portion 50c1 in the Z direction, and the handle is low. The portion 5〇b丨, 5〇c丨 is disposed in a rotationally symmetrical positional relationship with respect to the center of the frame 50. In other words, the distance from the setting surface of the lower portion of the frame 50 from the setting surface below the frame 50 to the frame of the other handle portion 50cl is 50. The setting surface above the 50 is equal to the distance in the direction B. Further, the convex portion 49C is provided at a position corresponding to the handle portion 50b1 (and 50cl) of the tapered portion 48Aa of the positioning block 48A. The height of the convex portion 49C is set to be larger. The depth of the tapered portion 50b2, 50b3 to the grip portion 49A is low. Therefore, the tapered portion 50b2, 5〇b3 (or 50c) of the frame 50 2, .50c3) can be closely attached to the taper portion 48Aa of the positioning block 35 201206548 48A. Further, the tapping portion of the two portions corresponding to the tapered portions 50b2, 50b3 can be formed in the positioning block 48A so as to hold the convex portion 49c in the z direction. FA1, fA2. Instead of the moving rod 58A of Fig. 2, two moving rods 58AU, 58AD for individually pressing the taper portion may be provided. Further, in the circle 8 (B), the second filter box 4A The substantially annular frame 55 having the chemical filter clogging 56 and the cymbal 54B (the shape after cutting a portion of the spacer 54) provided on the upper end surface of the frame 55 are provided on the side of the frame μ in the X direction (2nd) The side surface) and the concave portion facing the side surface (fourth side surface) are formed by the pair of handle portions 55b1, 55el (the second handle portion and the fourth handle portion) and the side surfaces of the frame 55 in the X direction. The handle portions 55b1, 55cl, the i-th tapered portions 55b2 and 55b3 (two portions of the second inclined portion), and the second tapered portions 55c2 and 55c3 (the two-ported P-knife of the fourth inclined portion) are held in the z direction. The handle portions 55b!, 5 5c j are provided with grip portions. Further, the positional relationship between the grip portions 55b1, 55cl in the Z direction of the frame 55, and the handle portions 50bl, 50cl The positional relationship of the two directions of the frame 50 is reversed. In other words, the distance of the handle portion 55b1 from the setting surface below the frame 55 is in the z direction and the other handle portion 55 (from the setting surface above the frame 55 in the Z direction) Further, the distance between the handle portion of the filter case 4A is 1 in the z direction from the setting surface below the frame 55 and the setting of the handle portion 50b1 of the filter case 38A from below the frame 5〇 The distances in the z direction are different. Further, a convex portion 49D is provided at a position corresponding to the handle portion 55b 1 (and 5 5c 1) of the tapered portion 48Ba of the positioning block 48B. Therefore, when the frame 50 of the first filter case 38A is mistakenly brought into contact with the positioning block 48B, the convex portion 36 201206548 49D and the i-th tapered portion 5 〇 b2 of the frame 50 (or mechanical interference. In contrast, the frame 55 The tapered portions 55b2, 55b3 (or 55c2, 55c3) can be brought into close contact with the tapered portion 48Ba of the positioning block 48B. Conversely, the frame 55 of the second filter case 4A is accidentally brought into contact with the positioning block 48a of Fig. 8(A). In this case, the convex portion and the first tapered portion 55b2 (or 55c2) of the frame 55 mechanically interfere with each other. Therefore, in the same modification, it is also possible to prevent the second transitional device from being erroneously placed on the positioning block 48A. The space prevents the erroneous yoke 38a from being disposed in a certain space of the positioning block 48B. Further, in the first modification, the grip portion 49A of the filter case 38A and the grip portion 49B of the filter case 40A are also Further, the positioning block 48B may form the tapered portions FB1 and FB2 corresponding to the tapered portions 5 5b2 and 5 5b3 so as to hold the convex portions 49D in the Z direction. The movement lever 58B is provided with two movement levers 58BU, 58BD that individually bias the tapered portions 55c2, 55c3. In addition, in Fig. 2, for example, only filtration may be applied. The tank 4〇 is replaced by the filter box 40A of Fig. 8(B), and the corresponding positioning block 48B of Fig. 2 is replaced by the positioning block 4 8 B of Fig. 8(B). (2) Next, Fig. 9(A) The first filter case 38B according to the second modification of the above-described embodiment and the positioning block 48A1i corresponding thereto are shown, and FIG. 9(B) shows the second filter case 4B of the first modification and the like. Corresponding to the positioning block 48A2, the positioning block 48A1 of FIG. 9(A) and the positioning block 48A1 of FIG. 9(B) are respectively disposed in the casing 28 instead of the positioning blocks 48A, 48C and 48B of FIG. Further, the filter case 38B, 40B (frame 50A, 5 5A) of the second modification can be placed in the casing 28. 37 201206548 In Fig. 9(A), the first filter case 38B has a chemical retention The substantially annular frame 50A (first frame) of the device 5 1 , the spacer 54 provided on the first end surface of the frame 5 〇 a in the Y direction, and the handle portion formed by the convex portion provided on the side surface of the frame 50 in the +Z direction 70C (the first handle portion) and the first tapered portion 5〇Abt which is formed on the +Ζ direction side of the frame 5A and the 方向 direction side surface 50Ab and is inclined toward the spacer 54 side at the taper angle 0 to the outside of the frame 50A. First inclined portion). Frame 5〇A The +X direction side surface 50Ac is inclined parallel to the ZY plane. Further, the taper portion 48A1a of the taper angle 0 of the positioning block 48A1 is formed only in the portion of the frame 50A corresponding to the first taper portion 5A, Abt. Therefore, the frame 5〇 The first tapered portion 50Abt of A can be in close contact with the tapered portion 48A1a of the positioning block 48A1. Further, in Fig. 9(B), the second over-the-box 40B has a substantially annular frame μα (second frame) for holding the chemical filter 56, and a spacer 54 provided on the first end surface of the frame 55, The handle portion 70D (second handle portion)' formed by the convex portion provided on the side surface of the frame 55 in the +2 direction and the -Z direction side formed on the side surface 55Ab of the frame 55A are tapered at the side toward the spacer 54 Tilt to the outside of the frame 55A! Cone portion 55Abt (second inclined portion). The frame 55 VIII + X direction side surface 55Ac is inclined parallel to the ZY plane. Further, the taper portion 48A2a of the taper angle 0 of the positioning block 48A2 is formed only in a portion of the frame 55 which corresponds to the upper taper portion 55Abt. Further, the positional relationship between the first tapered portion 55Abt and the frame 55A in the Z direction is opposite to the positional relationship between the first tapered portion 50Abt and the frame 5A in the z direction. Further, the position of the tapered portion 48A1a of the positioning block 48A1 and the tapered portion 48 of the positioning block 48A2 are different in the Z direction. Therefore, the frame is tender and can be easily identified from the outside. Further, it is possible to prevent the first filter cartridge 38B from being erroneously disposed in a certain space of the clamp block 48A2. Conversely, it is possible to prevent the second buffer chamber 40B from being erroneously disposed in the positioning block 48A1 of Fig. 9(A). Some space. Further, in this modification, for example, the distance between the handle portion 7〇c on the frame 50A of the j-th filter case MB and the second side face 5〇Ac may be the frame 55A of the second filter case 40B. The distance between the upper handle portion 7〇D and the second side surface 50Ac is different. Further, the distance between the grip portion 7c and the end surface 50Aa may be different from the distance between the grip portion 7D and the end surface 5?Ac. (3) Next, Fig. 1 is a plan cross-sectional view showing a filter device 26A according to a third modification of the above embodiment. In Fig. 1A, the movement levers 58D, 58E, 58F having the same configuration are rotatably provided through the fulcrum members 59D, 59E, 59F (holding members) fixed to the inner surface of the door. Typically, the movement lever 58E has a rod 58 that is rotatably coupled to the fulcrum member 59E, a pedestal 58E3 that is fixed to the door 29, and a lever 58E1 that presses the rod 58E1 toward the +X direction side (taper) side of the frame 55 from the pedestal 58E3. The compression coil spring 58E2. The lever 58E1 is provided with a stopper (not shown) that rotates the counterclockwise rotation to be equal to or lower than a predetermined upper limit. The other configuration is the same as that of Fig. 3. In the filter device 26A, in a state where the door 29 is opened, one of the two taper portions of the two transition box 38 is respectively engaged with the positioning block, the tapered portion 48Aa, 48Ca of the 48C, so that the transition box 4 is made. One of the parts of the state is engaged with the taper 48B of the positioning block 48B to be followed by, for example, by the arrow B2, by closing the door 29, by moving the levers 58D to 58F such as by arrows B21, B22 B23, the second tapered portion 50c, 55c, 5〇c of the frame 5〇, 55, 5〇 of the filter box 38, 4〇, 38 is shown. Next, the filter boxes 38, 4, and B, B25, B26 move along the positioning blocks μα to we, 39 201206548, and are disposed at the positions qi to q3 in front of the partition plates 42A to 42C. Therefore, the setting of the filter boxes 3 8, 40 can be efficiently performed. (4) Next, Fig. 11(A) is a plan view showing the first filter case 38C and the positioning block 48A corresponding thereto in the fourth modification of the above embodiment. In the filter case 38C, the chemical filter 51 is housed in the annular frame 5〇c, and the spacer 54 is fixed to the end surface of the frame 50C. Further, the first side surface 50Cb and the second side surface 50Cc of the frame 5〇c are inclined symmetrically on average, and each step portion is formed in a stepped manner, and the handle portion 70A is attached to the side surface 5〇Cb, 5〇Cc. The filter case 38 is moved by bringing the first side face 50Cb or the second side face 50Cc into contact with the tapered portion of the positioning block 48A (: the damper box 38C can be easily positioned in the case 28 to contact the partition plate 42A. Further, Fig. 11(B) is a plan view showing the i-th filter case 38β of the fifth modification and the positioning block 48A corresponding thereto. The filter box 38D houses the chemical filter 51 in a ring-shaped frame. In the case of 5 〇D, the spacer 54 is fixed to the end surface of the frame. Further, the ith side surface 5嶋 and the second side surface 5GDe of the frame 5〇D are inclined symmetrically on average, and a plurality of convex portions are respectively formed on the outer side. The arc portion is touched on the side surface, and the handle portion 7A is attached to the 50Dc. It is possible to easily move the filter case 38D by causing the i-side surface 5_ or the second side surface to contact the positioning block one cone °P. The filter box 38D is clamped into the contact partition plate 42A. Further, 11 (C) shows the first filter case 38 of the sixth modification and the clamp block 4 of the potential I* ife A plan view of 8A. The filter box 38E is housed in a ring-shaped frame 5〇Εβ, and is fixed to the end surface of the frame 8 40 201206548. There is a spacer 54. Further, the i-side 5 of the frame 50E is opposite 〇Eb and the second side 5〇Ec are inclined symmetrically on average, and the convex arc portion ' is formed on the outer side, respectively, and the handle portion 7A is attached to the side surface 50Eb, 50Ec. By the first side 50Eb or the second side 5〇Ec contacts the taper of the positioning block 48A to move the filter case 38E, and the filter case 38E can be easily positioned to contact the partition plate 42A. Further, a plurality of circular arc portions of Fig. 11(B) can also be used. Or the convex arc portion of the figure u(c) is constituted by a rotating roller. (5) Next, Fig. 12(A) shows a transition device 26B of the seventh modification of the above-described embodiment. Fig. 12(B) In the filter device 26B of Fig. 12(A) shown in Fig. 12(A), the partition plate 42A in the casing μ faces the filter boxes 38F, 40F. The cover member TF5 covering the opening TF5 which can be easily separated from the crotch panel 54 and which is easy to slide and has a gas passage therethrough is formed of, for example, a synthetic resin. The formation of 'specifically' is formed, for example, by Teflon (registered trademark of DuPont). Further, the first filter case 38F' is positioned so as to be closely attached to the cover member TF5 of the partition plate 42A. The second filter tank 40F, the first filter tank 38F, and the second filter tank 40F are sequentially positioned in the manner of the filter tank 38F. The filter tanks 38F, 4〇F, 38F, 4〇f in one row They are respectively positioned by positioning blocks 48A3, 48B3, 48A4, 48B4 fixed to the inner surface of the casing 28. The lengths of the positioning blocks 48A3, 48B3 and the like in the Y direction are set to be smaller than the heights of the filter boxes 38F, 40F in the Y direction. In the filter boxes 38F and 40F, the chemical filters 51 and 56 are housed in the annular frames 50F and 55F, respectively, and the spacers 41 201206548 54 are fixed to the end faces of the frames 50F and 55F. Furthermore, the y-side and the second side of the frame 5〇F, 55F are symmetrically inclined to the tapered surface, along the frame 5叩, 55ρ (the side surface, the second side surface and the fixed surface gasket) The end faces of the end faces of 54 are covered with cover members tfi, tf2 which can be easily separated from the spacers 54 and are slidable. The second side and the second side of the frame 50F' 5 5F are opposed to each other. The TF4 of the member has a handle, and the hall has a handle portion 7qa, and the height of the position is different from each other. The positioning block 48 is imaginary, and the taper portions of the 48, 8 and 48B3, 48B4 are also fixed in a flat shape. The groove members TF3 and TF4 are formed in a portion. The materials of the cover members TF1, TF2, TF3, and TF4 are the same as those of the cover member TF5. As shown in Fig. 12(B), the cover member is disposed in the filter case 38F2. Τρι is formed with a rectangular opening TFlc through which the gas passes, and a portion of the cover member τη covering the i-th side and the second side of the frame 5〇F is formed as a symmetrically inclined tapered portion TFla, TFlbe Although the configuration of the filter case 4〇f is also the same, the position of the grip portion 70B is different from the position of the grip portion 7A. In Fig. 12(A), a movement lever 58G is provided inside the door 29 closing the casing 28. The movement lever 58G is provided with a pedestal portion 58 (}3, a guide portion 58G4 extending in the γ direction, and having a guide along the guide The portion 58G4 is moved by the rod portion 58Gb of the inclined surface in the γ direction, and the compression coil spring 58G2 that biases the rod portion 58G1 from the pedestal portion 58G3 to the taper portion of the cover member TF2 of the filter case 40F of the positioning block 48B4. In the filter device 26B, when the filter boxes 38F, 4F are housed in the casing 28, the taper portions of the cover members τρι 8 42 201206548 TF2 of the filter boxes 38F, 4F are respectively brought into contact with each other. The cover members TF3, TF4 of the positioning blocks 48A3, 48B3, 48A4, 48B4 move the filter boxes 38F, 40F in the substantially -Y direction. At this time, since the cover members TF1 to TF4 are easily slid, the cover members TF1 to TF4 can be easily slid. The filter boxes 38F, 40F are moved. Further, in the state in which the filter boxes 38F, 40F, 38F, 40F have been positioned, the gasket of the filter case 38F at the end in the -Y direction contacts the cover member TF5 covering the partition plate 42A. The gasket 54 of the filter box 40F (38F) adjacent to the cover member TF1 (TF2) of the filter box 38F (40F) is in contact with the gasket 54 When the door 29 is closed in this state, since the filter case 40F at the end in the +Y direction is biased in the -Y direction by the movement lever 58G, the partition plate 42A (cover member TF5) and the filter case 38F, The 40F can be kept in close contact with the airtightness. Therefore, the cleaned gas can be supplied to the air blowing portion (not shown) of the air conditioner through the four-stage filter boxes 38F, 40F. Further, when the filter boxes 38F and 40F are replaced, the door 29 is opened, and the filter boxes 38F and 40F are sequentially carried out from the casing 28. At this time, since the spacer 54 of the filter case 40F can be easily separated from the cover member TF1 of the filter case 38F, the spacer 54 of the filter case 38F can be easily separated from the cover member TF5, and thus can be easily performed. Replacement of filter boxes 38F, 40F. Further, in the filter device 26B, the number of the filter boxes 38F, 40F is arbitrary. Further, the cover members TF3, TF4 of the positioning blocks 48A3, 48B3 and the like can be omitted. Further, when the cover members TF3 and TF4 such as the positioning blocks 48A3 and 48B3 are provided, the tapered portions of the cover members TF1 and TF2 of the filter cases 38F and 40F can be omitted. Further, in place of the cover members TF 1 to TF4, it is also possible to attach, for example, a resin which is easy to slide. 43 201206548 (6) In the above embodiment and modification, the filter case 38, the frame of the "A to 40' 40A to 40, 5", 5"A to 5"F, and %55a to 55F are substantially square (substantially The ring shape of the square (frame shape). However, the frame 5〇, 55A, etc., and 55, 55A, etc. may be, for example, a rectangular shape such as a rectangle (a substantially rectangular ring shape (frame shape)) or a substantially square or rectangular shape. When the electronic component (or micro component) such as a semiconductor element is manufactured by using the exposure apparatus of the above-described embodiment, the electronic component is subjected to the function of the electronic component as shown in FIG. Step 221 of design, step 222 of fabricating a reticle (reticle) according to the design step, step 223 of manufacturing a component substrate, ie, a substrate (wafer), and applying a photoresist, comprising light passing through the exposure apparatus of the foregoing embodiment The step of exposing the pattern of the cover to the substrate (inductive substrate), the step of developing the exposed substrate, the curing of the developed substrate, and the substrate processing step 224 of the developing step, the component assembly step (including the cutting step, the connection) The manufacturing process of the step of packaging step 225, and the inspection step 226, etc. are manufactured. The method for manufacturing the device includes the operation of forming a pattern of the photosensitive layer on the substrate by using the exposure apparatus of the above embodiment, and forming the pattern. The operation of the substrate (step 224). By using the #光装i, since the cost can be reduced and the exposure accuracy can be improved, the electronic component can be manufactured inexpensively and with high precision. A gas for air conditioning may be used instead of nitrogen II or a rare gas (gas, fish, etc.), or a mixed gas of such gases, etc. 201206548 The present invention is also applicable not only to projection exposure using a scanning exposure type. The case of the exposure can also be applied to the exposure using the one-exposure type (stepper type) projection exposure device. Moreover, the present invention can also be applied to the exposure of the proximity or contact mode without using the projection optical system. When the device or the like is exposed, the present invention is not limited to the process suitable for the semiconductor device, and can be widely applied to the case. A process for forming a liquid crystal display device such as a prismatic glass plate or a display device such as a plasma display, or a photographic element (CCD, etc.), a micromachine, an MMS (Microelectr 〇mechanical), a thin film magnetic head, a DNA wafer, or the like. Further, the present invention is also applicable to a manufacturing process in which a mask (a mask, a reticle, etc.) having a mask pattern of various elements is formed by using a lithography process. It is needless to say that various modifications can be made without departing from the spirit and scope of the invention. The above-mentioned publications, international publications, US invention patents, or US invention patent applications are hereby incorporated by reference. - part. In addition, all disclosures of U.S. Patent Application Serial No. 914, filed on Apr BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a view showing an exposure apparatus in an example of an embodiment. 45 201206548 FIG. 2 is a perspective view showing the filter device 26 of FIG. 1. Figure 3 is a cross-sectional view showing the transitioner device 26 of Figure 2. Fig. 4(A) is a perspective view showing the filter case 38 of Fig. 3, and Fig. 4(B) is a perspective view showing the filter case 40 of Fig. 3. Fig. 5 (A) and (B) are plan views showing, respectively, a part of the change in the relative position of the filter case 38 and the case 28. Fig. 6 (A) and (B) are plan views showing that a part of the change in the relative position of the filter case 38, 4 〇 and the case 28, respectively, has been cut away. Fig. 7(A) is a flow chart showing an example of the installation operation of the filter case, and Fig. 7(B) is a flow chart showing an example of the replacement operation of the filter case. Fig. 8(A) is a perspective view showing the filter case 38A of the first modification, and Fig. 8(B) is a perspective view showing the filter case 4A of the first modification. Fig. 9(A) is a perspective view showing a filter case 38B according to a second modification, and Fig. 9(B) is a perspective view showing a filter case 4B of a second modification. Fig. 1 is a cross-sectional view showing a filter device according to a third modification. Fig. 1 (A), (B), and Fig. 1 are plan views of the filter case of the fourth modification, the fifth modification, and the sixth modification, respectively. Fig. 12(A) shows the filtration of the seventh modification. The cross-sectional view of the device shows a perspective view of the filter case in Fig. 12(A). Fig. 1 is a flow chart showing an example of the process of electronic components. [Description of main component symbols] EX: Exposure device R: reticle 46 201206548 PL : Projection optical system λν . Wafer 4 : Exposure main body section 10 : Chamber 26 : Filter device 28 : Case 30 : Air conditioner 38 , 40 : Filter case 42 Α ～ 42C : Separator 48 Α 48 48 C : positioning block 50, 55: frame 50b, 55b: first taper portion 51, 56: chemical filter 60: local air conditioner 70A, 70B: handle portion

Claims (1)

201206548 VII. Patent application scope: J. A filter device for accommodating a filter, comprising: > a first filter case having a frame for holding a 遽 遽 , , , , , , , , , , , , The at least one portion of the side surface of the side surface of the frame, the first shape change portion from the end surface side of the first frame to the other end surface side and to the outer side of the f1 frame; The first position of the first reducer is provided in the first phase of the first frame and the first shape changer of the first side to locate the first frame of the first frame. The positioning member is engaged with the first shape changing portion to press the second partition member of the end surface of the first frame. 2. The apparatus according to claim 1, wherein the first over/under device phase includes a second shape change post, and the first shape change port P shai second shape change portion is provided in In the side surface of the first frame, the first side surface of the first frame is at least one adjacent to the second side of the first filter, and the + σ ^ 邠 is formed from the one end surface side. On the other side, it changes to the outer side of the truss; the _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ The second shape changing unit presses the first frame against the second positioning member of the first positioning member. 3. The patent of the Shishen 4 patent & 2, the shape change portion has a first ^^, °P, and the first inclined portion is formed in at least a portion of the first side surface of the first frame. The second shape changing portion is formed on the second side surface of the first frame, the second inclined portion, and the end surface side, from the front end surface side toward the other end surface side. To the other end side of the other side, two parts 'from the front side. Called outside the first frame 4. "Please refer to the accommodating section of the second or third patent range and prepare the λ 义, +, ,, ~ device, where the front and the front are inserted into the filter box Open the door of the opening of the Qiu, hold the y, f Μ y 邛, close the above and sigh the inside of the door and the 'member holding member. Next, the second positioning is as follows. 5. For the instrument device of claim 4, the straight-line holding member is separately provided from the aforementioned door.刖述保6. If the scope of patent application is 2 to 5, the former Μ Μ , $ Τ - —— —— —— —— —— —— —— —— —— —— —— —— —— —— —— —— —— —— —— —— —— —— —— —— —— —— —— —— —— —— —— —— —— —— —— —— —— The shape change portions are respectively formed; and the first side surface and the second side surface are integrated. The apparatus of any one of the first to sixth aspects of the invention, wherein the first shape changing portion is separated into at least two on the i-th side surface; wherein the first positioning member has the aforementioned shape of the 帛i The changing portion corresponds to at least two first guiding faces. The filter device according to any one of claims 2 to 6, wherein the second shape changing portion is separated into at least two on the second side surface; the second clamping member has the aforementioned separation The second shape changing portion corresponds to at least two second guiding faces. The filter device according to any one of claims 1 to 8, wherein the second filter case is provided with a second overspray. . The second frame of the second filter, which is different from the first filter, is changed from at least a part of the third side surface to the other end surface side of the second frame. The 帛=middle shape changing unit; the 1-3 housing portion of the permanent outer side includes the second base member of the second frame and the second side surface of the second frame, and the third portion of the second (fourth) The shape changing portion is configured to position the second frame, and the third positioning member is engaged with the third shape changing portion before the mask mn and the third shape changing portion, and presses the other end surface of the second frame The second partition member of the present invention, wherein the third shape changing unit has a third inclined portion, and at least a part of the third side surface of the second frame is provided. The second frame frame is formed on the other end from the side of the one end surface of the frame to the other end. The face side is gradually inclined to the second portion of the second " The aforementioned i-th shape change portion in the aforementioned i-th side of the frame: The position of the side surface of the 帛3 of the second frame is different from that of the second side frame. #3 Shape changing portion I2. The filter device of the ninth aspect of the invention, wherein the first shape changing portion is separated from the first side surface At least two; the third shape changing portion is formed on the third side surface in total; 丨 3. The patent head 9 is passed; wherein the first shape changing portion is formed on the first side surface; In the filter device of the ninth aspect, the first shape changing unit is the first one. The side surface is separated into at least two; the third shape changing portion is separated into at least two on the third side surface; and the separation position between the separation position of the first shape changing portion and the third shape changing portion is different from each other. The filter device of the ninth aspect of the invention, wherein the first positioning member has a first guiding surface corresponding to a position of the i-th shape changing portion; and the third positioning member Has the same shape as the foregoing The third guide surface corresponding to the position of the change portion. Jin, Patent No. 91-15, the filter filter month of the item - the second filter case includes a fourth shape change portion, and the fourth shape change portion The side surface of the second 桠$ &, & truss is separated from the third side by at least a part of the fourth side opposite to the third side, and the second side is from the side of the second side to the other side. The end surface side is changed to the second frame, and the outer portion of the second frame is provided so as to be movable in the accommodating portion, and the fourth shape changing portion of the frame is pressurized by 1 L 2 , and the second frame dust is applied to the second frame. The fourth positioning member of the third positioning member. The device of the fourth aspect of the present invention, wherein the fourth inclined portion is formed on at least a portion of the front side of the fourth side surface, and the other end surface side Gradually inclined to the outside of the second frame. 51 S 201206548 18. The filter according to claim 16 is disposed, and the second shape changing portion and the fourth member changing portion are formed on the second side and the aforementioned The filter device according to claim 16, wherein the position of the second shape changing portion in the second side surface of the first frame and the fourth portion of the second frame The filter device according to the sixteenth aspect of the invention, wherein the second shape change portion is separated into at least two on the second side surface; The shape change portion is formed on the fourth side surface of the fourth aspect. The filter device according to the sixth aspect of the invention, wherein the tenth shape change portion is formed on the second side surface; the fourth shape change portion is In the aforementioned fourth The apparatus according to claim 16, wherein the first shape changing portion is separated into at least two on the second side surface; and the fourth shape changing unit is in the 4, the side surface is separated into at least two '· The separation positions of the separation portions of the second shape change portion are different from each other. The fourth shape change is not described. 23. Any one of the claims 16th to ## In the filter device, the second positioning member has a position corresponding to the first guiding surface; the shape changing portion has the fourth guiding surface corresponding to the front. The position of the fourth shape changing portion 52 201206548 In the filter device of the first aspect of the invention, the first shape changing portion and the third shape changing portion are respectively formed in the first y Y directory; R yi 1 疋1 omnidirectional and the above-mentioned third side of the full range. 25_ As in the patent application, the filter of any of the items of the squadrons to the 24th item, which is provided in the first hand of the first frame; And a second handle portion provided in the second frame; The position of the first frame and the position of the second handle # are different from those of the second frame, respectively, as described in the first hand grip portion. Further, the first handle is disposed in the first shape changing portion, and the second handle portion is provided in the third shape changing portion. 27. The first handle portion of the filter device and the second handle are provided in the convex portions of the i-th portion and the third shape changing portion, respectively. 28) As for the filter of the 26th item of the stipulation of the patent scope, the filter is placed in the first shape change portion, and the mi 4 χ is described in the position of the first handle portion. The position of the second handle portion is different. The third shape corresponds to the first positioning member, the first handle portion, and the second handle portion. Each of the positions of the cymbal is provided with a concave portion 29. As set forth in any one of the claims of the second aspect of the present invention, it is provided in the above-mentioned third frame filter, which is described as the second shape, the third handle portion. And the portion of the fourth shape changing portion that is provided before the second frame. The fourth handle portion 53 201206548 3 〇 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第31. The recessed portion of the shape-changing portion of the shape change portion of the first and second handle portions of the filter portion of the shape change portion of the third aspect of the present invention. In the third position, the first positioning member and the first position member are respectively provided with convex portions at positions corresponding to the above-mentioned = and the second handle portions. The clearing of the patent scope 帛 29 items = the hand is attached to the convex portion of the second shape change portion; and the fourth handle portion is used to refer to the a, +. & 33. The filter device of the second shape change portion, wherein the second hand is attached to the concave portion of the second shape change portion; wherein the fourth handle portion is attached to a recessed portion of the fourth shape changing portion. The filter device of claim 32, wherein In the second shape changing portion, the position of the third handle portion in the fourth shape change portion is different from the position of the fourth handle portion in the fourth shape " 35. The method according to any one of claims 9 to 34, wherein the "the i-th partition member and the first partition member of the accommodating portion" are disposed substantially perpendicularly or obliquely with respect to a horizontal plane. For example, in the filter device of claim 9 to 35, wherein the Yu, the ten, the @1 filter are the organic substances in the gas passing through the second filter; The filter removes at least one of an alkaline substance and an acidic substance in the gas passing through the second filter 54 201206548. a first seal of the filter end face 37. As claimed in the first to third aspects of the patent application, which has the other member provided in the foregoing first frame, and the second pivot year Before flowing another Λ. Λ* The second sealing member of the 刖 刖 刖 。 。 。 。. 38. An exposure apparatus for transmitting light by exposure light, comprising: a tea exposure substrate, and an exposure main body portion for exposing the substrate; and any one of claims 1-5 to 37 The filter device = set, and the gas extracted from the outside of the chamber is sent to the chamber through the filter device. a 39. A method of accommodating a filter, wherein the filter is housed in a housing portion, comprising: a step of preparing a first filter box, the first! The filter box is provided with a first carriage, a first carriage, and a side surface of the first frame, which is disposed on the side surface of the first frame, and a portion, from the two end faces of the first "truss, _ 柒面贝' to the other end face a side change to an i-th shape change portion outside the first frame; $ 1 Φ a step of placing a side surface of the first frame adjacent to the first side surface on a surface of the first base member of the month 'L valley; In the first frame, the i-shaped change portion is engaged with the transfer: a step of moving the frame toward the direction of the accommodating portion; and 55,065, 065, the first end member of the first frame is transmitted through the first sealing member a step of pressing the first partition member of the accommodating portion. The method of accommodating a filter according to claim 39, wherein the first filter case includes a second shape changing portion, and the second shape reconstituting portion δ is further in a side surface of the first frame The first side surface is at least one portion of the second side surface opposite to the first filter, and the first side surface is changed to the outer side of the first frame from the other end surface side; The step of moving the first partition member to the accommodating portion includes a step of engaging the second shape changing member of the accommodating portion with the second shape changing portion of the frame to bias the first frame through the second boring member. In the case of the method of accommodating the filter of claim 40, the first shape is a slanting portion, and the first inclined portion is the aforementioned one of the first frame. At least a part of the side surface is gradually inclined from the end surface side toward the other end surface side to the front side of the frame... The frame is formed to have a second inclined portion, and the second inclined portion is formed in the second side. The second side of the frame is added, and the one end face side is turned to the other end face, and the P/knife is from the front side. The k-side is gradually inclined to the outside of the first frame. 42. The method of accommodating the ninth aspect of the patent application includes the preparation of the second and second: the filter box of the --item device is maintained and the aforementioned! The filtering step ‘the second passing frame and the second frame are set in the second frame? 2 At least the third side of the second side of the filter - 201206548 ::: Change the one end side of the two end faces of the second frame to the other end face side and change to the aforementioned 箆? a third shape changing portion on the outer side of the frame 2; a step of positioning the second base member adjacent to the third side surface of the second frame; and placing the second frame on the second frame The third shape changing unit is engaged with the third positioning member of the valley receiving portion, and the second frame is moved in the direction of the member; the second frame is moved in the direction of the member; The other end surface passes through the second sealing member and is placed in the second partition member of the receiving portion. 43. The method of accommodating a damper of claim 42, wherein the second ejector box has a fourth shape change portion provided in the 坌? 4 "Adding, /, 4, the second η side surface and at least the fourth side surface of the front side opposite to the third side surface, and changing from the other end surface side to the second frame The fourth positioning member of the second frame to the second portion of the accommodating portion is engaged with the fourth shape changing portion of the front center, and is biased by the fourth positioning member. The steps of the second frame described above. In the squatting position, the 4th pre-IS patent application method of the 43rd item of the patent range, the "3 shape change part has the 3rd inclination part, and the 3rd ##Μβ is formed in the aforementioned 坌7 Λ Chengdi 3 In the second frame, the at least one portion of the third side surface of the slanting portion is inclined from the one end surface side to the other end surface side from the front side of the second frame, and the fourth shape changing portion has the fourth portion. In the inclined portion, the fourth inclined portion 57 201206548 is formed before the second frame, and the one end surface side of the second frame is two. :, outside the 2nd frame. The 4th side is inclined to the aforementioned 45. The part of the above-mentioned first shape of the 帛1 frame is changed according to any of the above-mentioned 帛1 frame of the above-mentioned 帛1 frame. $ ] I 2 The third (fourth) change portion is respectively engaged with the aforementioned member or the third positioning member 'the aforementioned first " truss or front n truss from the aforementioned portion of the accommodating portion (the partition member or the aforementioned two partition members) And a step of separating the first frame or the second frame from the accommodating portion. 46. A method for manufacturing a device, comprising: sensitizing using an exposure device of claim 38 The action of exposing the substrate; and the operation of the photosensitive substrate after the exposure. 8. Pattern: (e.g., page) 58