TW201203496A - 3D-IC device and decreasing type layer-ID detector for 3D-IC device - Google Patents

3D-IC device and decreasing type layer-ID detector for 3D-IC device Download PDF

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TW201203496A
TW201203496A TW099126392A TW99126392A TW201203496A TW 201203496 A TW201203496 A TW 201203496A TW 099126392 A TW099126392 A TW 099126392A TW 99126392 A TW99126392 A TW 99126392A TW 201203496 A TW201203496 A TW 201203496A
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Taiwan
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wafer
dimensional
identification number
layer
circuit
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TW099126392A
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Chinese (zh)
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Ming-Pin Chen
Meng-Fan Chang
Wei-Cheng Wu
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Nat Univ Tsing Hua
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Publication of TW201203496A publication Critical patent/TW201203496A/en

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32135Disposition the layer connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
    • H01L2224/32145Disposition the layer connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being stacked

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  • Semiconductor Memories (AREA)

Abstract

The present invention discloses a 3D-IC device formed by stacking plural the same or the different type chips, comprising: a plurality of decrement circuit coupled in sequence to perform an operation of minus 1, which is to operate an input value from a chip of the 3D-IC device and output a plurality of layer-ID to each chips stacked within said 3D-IC device; and a plurality of bump coupled to each stacked chip of said 3D-IC device, wherein said layer-ID is represented by a combination of N bits and M chips to which M said layer-ID satisfying a relation of M ≤ 2N are assigned are stacked.

Description

201203496 六、發明說明: 【發明所屬之技術領域】 本發明係關於一種三維晶片裝置之檢測電路,特別是 關於一種三維晶片裝置之遞減式層識別檢測電路。 【先前技術】 為了達到尺寸精簡的最佳效益,近年來逐漸發展將多 顆相同或不同種類之晶片,以三維空間垂直整合,以立體 鲁堆疊的方式,採取上下導通的架構,減少所耗費之平面面 的最大特點在於可將不同功能、性質或基板的晶片,各自 採用最合適的製程分別製作後,再利用矽穿孔(Thr〇ughsi Via ’ TSV)技術進行立體堆疊整合,以有效縮短金屬導線長 度及連線電阻,不僅可減少面積,更可以達到縮小體積、 尚整合度、高效率及低耗電量之優勢。因此三維晶片逐漸 受到各產業之矚目,特別是對於講究小體積與高效率之記 籲憶體產業更是受到重視。 目前個人電腦與伺服器工作站在資料處理應用類別, 積。二維晶片(Three Dimension Integral Circuits,3D-IC) 例如各種消費性應用、通 、通訊應用等,使用以動態隨機存取201203496 VI. Description of the Invention: [Technical Field] The present invention relates to a detection circuit for a three-dimensional wafer device, and more particularly to a descending layer identification detection circuit for a three-dimensional wafer device. [Prior Art] In order to achieve the best efficiency of size reduction, in recent years, a number of wafers of the same or different types have been gradually integrated in a three-dimensional space, and the structure of the upper and lower conduction is adopted in a three-dimensionally stacked manner to reduce the cost. The most important feature of the planar surface is that the wafers of different functions, properties or substrates can be fabricated separately by the most suitable process, and the three-dimensional stacking integration is performed by using the Thr〇ughsi Via 'TSV technology to effectively shorten the metal wires. The length and wiring resistance not only reduce the area, but also achieve the advantages of reduced size, integration, high efficiency and low power consumption. Therefore, three-dimensional wafers are attracting attention from various industries, especially for the memory industry that emphasizes small size and high efficiency. Currently, personal computers and server workstations are in the data processing application category. Three Dimension Integral Circuits (3D-IC), such as various consumer applications, communication, communication applications, etc., used for dynamic random access

置、南效能、小體積、介 加DRAM之儲存容量,& 容量之記憶體裝置堆疊, ‘要之應用類別。DRAM強調高容 低耗電量與低成本之需求。為了增 近年逐漸以3D 1C技術將複數個小 ’以形成高容量之記憶體裝置。其 201203496 中,利用矽穿孔(Through-Si Via,TSV)技術進行三維晶片之 立體堆疊已發表於期刊論文,請參見Uks〇ng Kang, 8Gb 3-D DDR3 DRAM Using Through-Silicon-Via echnology 5 IEEE, Journal of Solid-State Circuits, Vol. 45 NO. 1,January 2010。Set, south performance, small size, storage capacity for DRAM, & memory device stack, ‘application category. DRAM emphasizes the need for high capacity, low power consumption and low cost. In order to increase the number of small ones in the 3D 1C technology in order to form a high-capacity memory device in recent years. In 201203496, the three-dimensional stacking of three-dimensional wafers using the Through-Si Via (TSV) technology has been published in the journal paper, see Uks〇ng Kang, 8Gb 3-D DDR3 DRAM Using Through-Silicon-Via echnology 5 IEEE , Journal of Solid-State Circuits, Vol. 45 NO. 1, January 2010.

以相同或不同種類之晶片堆疊形成三維晶片後,為了 選擇使特定之晶片於系統運作時動作,必須事先對於多顆 相同或不同種類之晶片個別料—層識別編號,使系统運 作時’得以選擇所需特定晶片動作。過去有許多人提出相 關之方法’然而不僅使成本反而上升,且仍無法克服當三 維晶片之堆疊數不斷增加時,同時也增加了電極數的情 形。某些參考文獻提出堆疊層結構分卿成選擇性號之 接路徑,其編號與堆疊順序相同,如此當晶片堆疊數越多, =電極數則越多,以配合複雜的堆疊結構,且產品成本也 ^之提_如日本專利案特開第20〇2_3()5283號)。 ^參考文獻’例如日本專利案㈣第·_u嶋 揭路一種堆疊型裝置包含複數個晶片,且對每— 另雷!分配-層識別編號^為了抑制因堆疊層數增加而日伴隨之 電極數增加,可選擇具有與選擇信號相等之層 在這樣的堆疊式裝置中,連接 θ ,〜, 舉例而言,可選擇〜其中路可均:給_^ 徑以簡化電極結構。 攸而形成N連接路 因此,本發明之實施例传描 —„ 你故供—種新類型之rr雉曰Η 之層識別編號檢測電路,以故1 L、丄 土 <—,,隹日日片 又吾上述之缺點。 201203496 【發明内容】 為了解決上述之問題,本發明之 維晶片裝置之檢測電路,特別是關的:提供-種三 遞減式層識別編號檢測電路 ―、准晶片裝置之 對三維晶片裝置之各日>^ 串聯絲個減量電路, /1衣直心谷日日片,個別予以一 統運作時,得以選擇所需之特定晶片編號,使糸 數個= 點為提供-種三維晶片,其以複 電阻、記憶體晶",:::形成,例如電容、 可從二&曰u + 賦予被此不同之層識別編號, 了從—、,隹日日片中選擇欲指定 月所述之三維晶片裝置 入错:隹璧複數個相同或不相同種類之晶片形成,其包 二,個遞減電路’其依順序連接,以執行減!運算, 、運算一、准曰曰片4置晶片之輸入值,並輸出複數個層識 ^ 扁號至三維晶片裝置中之每一堆疊晶片;以及複數個凸 土 ,其耦合於三維晶片裝置之每一堆疊晶片。其中,所述 «。线別編號係以N位元之組合表示,將滿足Μ ‘ 2n關係 Μ個以刀配§亥層識別編號的μ個半導體晶片准予以堆 本發明實施例之另一觀點為提供一種三維晶片裝置之 遞減型層識別編號檢測電路’其包含:複數個減量電路, 其依順序連接’以執行減i運算,用以運算三維晶片裝置 晶片之輸入值’並輸出複數個層識別編號至三維晶片裝置 中之每一堆疊晶片。其中,所述之層識別編號係以N位元 之組合表示’將滿足M S 2N關係之Μ個以分配該層識別 201203496 編號的Μ個半導體晶片准予以堆疊。 【實施方式】 解經if明將以較佳實施例及觀點加以敘述,此類敘述係 日月由二明之構及程序’僅用以說明而非用以限制本發 =請專利範圍。因此,除說明書中之較佳實施例以外, 本發明亦可廣泛實行於其他實施例中。 =描述本發明之細節,其包括本發明之實施例。參 寸圖及以下描述’相同參考標號用於識別相同或功能上 二:兀件,且期望以高度簡化之圖解方式說明實施例之 主要特徵。此外,附圖並未描繪實際實施例之每一特徵, 所搖繪之圖式元件係皆為相對尺寸而非按比例繪製。 一維日日片裝置1係藉由堆疊複數個晶片形成,其可以 相同或不同類型之曰η 士 Α /、 ⑹…」 連接,例如記憶晶片,包含揮 二=揮發性記憶體。第-圖係顯示本發明實施例之三 :::裝置之結構側面圖例。如圖所示,三維晶片裝置丨 個晶片層於最下方之基板2上,並於其五個晶片 堆疊界面晶片3。進一步,對三維晶片裝置^之 “晶片層_〜),依序加以編號,如五個晶片 二、1(1)、1(2)、1(3)與1(4)。複數個焊珠4係形成於 下方,此些焊珠4可使三維晶片襄置1與外部裝 曰:性連接。界面晶片3係控制三維晶片裝置1之五 個晶片層叫1(4)之輸入/輸出信號。複數個凸塊5係形成 於二維晶片裝置i之上表面與背面’以及界面晶片3之背 面。凸塊5係連接於三維晶片裝£ !之各堆疊晶片 201203496 1(0)-1(4) ’所述之凸塊5可利时穿孔技術製作,以姓刻 與雷射鑽孔’或以其他適合之技術製作。矽穿孔技術係形 成貫通於晶片上,於垂直方向互相連接,以使所堆疊之晶 片層間可互相聯繫。凸塊5為三維晶片裝置1之各晶片 1(0)-1(4)間之電性連接路徑。更進_步,三維晶片裝置! 之五個晶片層1(0M⑷之信號傳輸,係利用凸塊5於垂直 方向彼此貫通連接。 本發明之一實施例中,裝置之五個晶片層1(0)_1(4)為 DRAM晶片。在此實施例中,所述之dram晶片·K4) 具有相同記憶體容量及相同構造,能分別讀取或寫入動作。 本發明實施例中,三維晶片裝置1之所有晶>5 (或晶片 層)1 (0)-1⑷皆具有一固有的層識別、編號作為區分。所欲指 定之晶片可藉由不同層識別編號從三維晶片裝置1之晶片 層1 (0) 1 (4)中選擇。於二維晶片裝置i之各晶片i⑼· i⑷ 提供一檢測電路,其設置於記憶體電路以外,負責執行一 #層識別編號之檢測運算。㈣電路之具體構成及動作如後 述0 本發明實施例中,係提供一種三維晶片裝置丨,其藉 由堆疊複數個相同或不同類型之晶片1(〇)_1(4)形成,其包 含:複數個減量電路22,其依序連接,以執行減丨運算, 其用以運算三維晶片裝置!之晶片1(〇)1⑷的輸人值並 輸出複數個層識別編號至三維晶片裝置丨中之各晶片層 1 (0)-1 (4) ’以及複數個凸塊5,其耦合於三維晶片裝置之 每一晶片層1(0)-1(4);其中,所述之層識別編號係以N位 201203496 元之、、且σ表不,將滿足M S 2n關係之M個以分配該層識 別編號的Μ個半導體晶片准予以堆疊。After forming a three-dimensional wafer with the same or different types of wafers, in order to select a specific wafer to operate in the system operation, it is necessary to identify the number of individual materials of the same or different types of wafers in advance, so that the system can be selected when operating. The specific wafer action required. In the past, many people have proposed related methods. However, not only has the cost increased, but it has not been able to overcome the fact that when the number of stacked three-dimensional wafers is increasing, the number of electrodes is also increased. Some references suggest that the stacked layer structure is divided into selective paths, the numbering is the same as the stacking order, so that the more the number of wafer stacks, the more the number of electrodes, to match the complex stack structure, and the cost of the product. Also ^ mention of _ such as the Japanese Patent Case No. 20〇2_3 () 5283). ^References' For example, Japanese Patent Application (4) No. _u嶋 Jie Lu A stacked device includes a plurality of wafers, and for each - another! distribution - layer identification number ^ in order to suppress the number of electrodes accompanying the increase in the number of stacked layers Alternatively, a layer having the same level as the selection signal may be selected. In such a stacked device, the connection θ, ~, for example, may be selected to be equal to: the path may be simplified to simplify the electrode structure.形成 形成 形成 形成 形成 形成 形成 形成 形成 形成 形成 形成 形成 形成 形成 形成 形成 形成 形成 形成 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施Japanese Patent Application No. 201203496 SUMMARY OF THE INVENTION In order to solve the above problems, the detection circuit of the wafer device of the present invention, in particular, provides: a three-reduction layer identification number detection circuit - a quasi-wafer device For each day of the three-dimensional wafer device, the series of wire reduction circuits, /1 clothing straight heart valley day and day, when individually operating, can select the specific wafer number required, so that the number of points = point is provided - A three-dimensional wafer formed by a complex resistance, a memory crystal ",:::, for example, a capacitor, which can be assigned a number from the different layer from the second & 曰u +, from the —,, 隹日日Selecting the three-dimensional wafer device into which the month to be specified is entered: the plurality of wafers of the same or different types are formed, and the second and the decreasing circuits are connected in sequence to perform the subtraction operation, the operation one, the standard Bracts 4 An input value of the wafer, and outputting a plurality of layers to each stacked wafer in the three-dimensional wafer device; and a plurality of lands that are coupled to each of the stacked wafers of the three-dimensional wafer device. wherein the «. The other numbers are expressed in a combination of N bits, and the μ semiconductor wafers satisfying the 2 ' 2n relationship are calibrated. The other aspect of the present invention is to provide a three-dimensional wafer device. The decrementing layer identification number detecting circuit 'includes a plurality of decrementing circuits that are sequentially connected 'to perform a subtractive i operation for calculating an input value of the three-dimensional wafer device wafer' and output a plurality of layer identification numbers to the three-dimensional wafer device Each of the stacked wafers, wherein the layer identification number is represented by a combination of N bits, and a plurality of semiconductor wafers satisfying the MS 2N relationship are assigned to be assigned the layer identification 201203496 number. The explanations of the present invention will be described in terms of preferred embodiments and viewpoints, and such statements are intended to be illustrative and not intended to be limiting. The invention is also to be construed as being limited to the scope of the invention. The invention may be embodied in other embodiments. The details of the invention are described, including the embodiments of the invention. 'The same reference numerals are used to identify the same or functional two: components, and it is intended to illustrate the main features of the embodiments in a highly simplified schematic manner. Moreover, the drawings do not depict each feature of the actual embodiment, The graphic elements are all drawn in relative dimensions and not drawn to scale. The one-dimensional day device 1 is formed by stacking a plurality of wafers, which may be connected to the same or different types of Α Α 、 /, (6)...", such as memory The wafer contains two = volatile memory. The first figure shows a structural side view of the third embodiment of the present invention::: device. As shown, the three-dimensional wafer device has a wafer layer on the lowermost substrate 2, and the interface wafer 3 is stacked on its five wafers. Further, the "wafer layer_~" of the three-dimensional wafer device is sequentially numbered, such as five wafers two, one (1), one (1), one (1), and one (1). 4 is formed below, and the solder balls 4 can connect the three-dimensional wafer set 1 to the external device. The interface wafer 3 controls the input/output signals of the five wafer layers of the three-dimensional wafer device 1 called 1 (4). A plurality of bumps 5 are formed on the upper surface and the back surface of the two-dimensional wafer device i and the back surface of the interface wafer 3. The bumps 5 are connected to each of the stacked wafers of the three-dimensional wafer package 201203496 1(0)-1 ( 4) 'The bumps 5 can be made by the perforation technology, and can be made with the last name and the laser drilled hole' or by other suitable techniques. The perforation technology is formed on the wafer and connected to each other in the vertical direction to The stacked wafer layers can be interconnected. The bumps 5 are electrical connection paths between the wafers 1(0)-1(4) of the three-dimensional wafer device 1. Further, the three-dimensional wafer device! The signal transmission of layer 1 (0M (4) is connected to each other in the vertical direction by the bumps 5. In an embodiment of the invention, the device The wafer layers 1(0)_1(4) are DRAM wafers. In this embodiment, the dram wafers K4) have the same memory capacity and the same structure, and can be read or written separately. In the example, all of the crystals > 5 (or wafer layers) 1 (0) - 1 (4) of the three-dimensional wafer device 1 have an inherent layer identification, numbering as a distinction. The desired wafer can be identified by different layer identification numbers from three dimensions. The wafer layer 1 (0) 1 (4) of the wafer device 1 is selected. A detection circuit is provided for each of the wafers i(9)·i(4) of the two-dimensional wafer device i, which is disposed outside the memory circuit and is responsible for executing a #层 identification number. (4) The specific configuration and operation of the circuit are as follows. In the embodiment of the present invention, a three-dimensional wafer device is provided, which is formed by stacking a plurality of wafers 1 (〇)_1(4) of the same or different types. The method includes: a plurality of decrement circuits 22 connected in sequence to perform a subtraction operation for calculating the input value of the wafer 1 (〇) 1 (4) of the three-dimensional wafer device! and outputting the plurality of layer identification numbers to the three-dimensional wafer device Each of the wafer layers 1 (0)-1 (4) 'and a plurality of bumps 5 coupled to each of the wafer layers 1(0)-1(4) of the three-dimensional wafer device; wherein the layer identification number is N bits of 201203496, and σ is not M semiconductor wafers satisfying the MS 2n relationship are stacked with the semiconductor chips assigned the layer identification number.

第一圖係顯示本發明實施例之檢測電路2丨(〇)_21 (4), 其形成於各三維晶片裝置!之各晶片層1(〇)·1(4)。第二圖 中,檢測電路糊-21⑷係伴隨三維晶片裝置k晶片層 (〇) 1(4)串聯連接構成。每一檢測電路21(〇)_21(句執行一 咸里電路 本實施例中,各晶片層i⑼·丨⑷係以梦穿孔技 :連接。由於五個檢測電路21(〇)_21⑷皆具有相同構成, 以下主要以任意晶片之遞減式層識別編號檢測電路Μ 為代表進行說明。 遞減式層識別編號檢測電路21(〇)-21(4)係自動產生三 容Γ片震置之各晶片層叫1(4)之層識別編號。為了更 人了解,每一遞減式層識別編號檢測電路2丨(0)_2丨(4)包 凡減量電路22(顯示於第四圖),執行以層識別編號 之二勒人值之^咸1運异。第—層識別編號檢測電路21 (〇) 第二值係°又疋為4,且此值將分配作為三維晶片裝置i 一晶片層⑽之層識別編號。接著,對第一層識別編號 旦仃減1運异,其為第二層識別編號檢測電路2】(】)之減 『電路22的輸人值’且其輸出值將分配作為三維晶片裝置 <第二晶片層⑴)的第二層識別編號3。 依此類推,層識別編號檢測電路21(2)、21(3)、21(4) 成,電路22的運异輸出依序減1,同時傳送至後段。 ’三維晶片裝置i之第三晶片層1⑺分配第三層識別 ^ 2第四晶片層1(3)分配第四層識別編號卜及第五晶 201203496 片層1(4)分配第五層識別編號〇。接著,最終晶片層U4) 之減罝電路22的最終運算輸出值為〇 ’此可作為用以判別 堆宜型半導體έ己憶體裴置全部堆疊晶片數之輸出。 圖係顯示本發明另 貫施例之檢測電路 第The first figure shows a detection circuit 2 (〇)_21 (4) of an embodiment of the present invention, which is formed in each three-dimensional wafer device! Each wafer layer 1 (〇)·1 (4). In the second figure, the detection circuit paste -21(4) is constructed by connecting three-dimensional wafer device k wafer layers (〇) 1 (4) in series. Each detection circuit 21 (〇)_21 (sentence execution of a Xianli circuit in this embodiment, each wafer layer i (9) · 丨 (4) is a dream perforation: connection. Since the five detection circuits 21 (〇) _21 (4) have the same composition The following is mainly described by the declining layer identification number detecting circuit 任意 of any wafer. The decrementing layer identification number detecting circuit 21(〇)-21(4) automatically generates the wafer layers of the three-capacitor diaphragm. Layer identification number of 1(4). For better understanding, each decrementing layer identification number detecting circuit 2 丨(0)_2丨(4) includes a decrement circuit 22 (shown in the fourth figure), and performs layer identification. The number of the two values is 1. The first layer identification number detecting circuit 21 (〇) The second value is further divided into 4, and this value is assigned as a layer of the wafer layer (10) of the three-dimensional wafer device i. Identification number. Next, the first layer identification number is reduced by 1 different, which is the second layer identification number detecting circuit 2] (]) minus "the input value of the circuit 22" and its output value will be assigned as a three-dimensional The second layer identification number 3 of the wafer device <second wafer layer (1)). Similarly, the layer identification number detecting circuits 21 (2), 21 (3), and 21 (4) are formed, and the operational output of the circuit 22 is sequentially decremented by 1 and simultaneously transmitted to the subsequent stage. 'The third wafer layer 1 (7) of the three-dimensional wafer device i is assigned the third layer identification ^ 2 the fourth wafer layer 1 (3) is assigned the fourth layer identification number and the fifth crystal 201203496 layer 1 (4) is assigned the fifth layer identification number Hey. Next, the final operational output value of the subtractive circuit 22 of the final wafer layer U4) is 〇', which can be used as an output for discriminating the total number of stacked wafers of the stacked semiconductor device. The figure shows the detection circuit of another embodiment of the present invention.

21(0)-21(4),其形成於各三維晶片裝置丨之各晶片層上 ^0)-1(4)。第一層識別編號檢測電路21(〇)之減量電路u 的輸入值設定為5’同時執行減!運算且輸出值為4,其分 配為三維晶片裝置1之第-晶片I 1(〇)的第-層識別編 唬。接著,第二層識別編號檢測電路21(丨)對第一層識別編 號4減i之運算,其輸出值將分配作為之第三層識別編號 仏測電路21(2)的輸入值。第二層識別編號檢測電路 之輸出值係對第一層識別編號4進行減1之運算,並為三 I曰片裝置1第二晶片| i⑴之第二層識別編號3。 依此類推,層識別編號檢測電路.21(2)、21(3)、21(4) 之各減量電路22的運算輸出依序減1,同時傳送至後段。 =此’三維晶片裝i 1之第三晶片^ 1(2)分配第三層識別 ,娩2,第四晶片層1(3)分配第四層識別編號!,及第五晶 片層J(4)分配第五層識別編號〇。接著,最終晶片層…) :減罝電路22的最終運算輸出值為〇,此可作為用以判別 隹疊型半導體記憶體裝置全部晶片數之輸出。 。。第四圖係顯示本發明實施例之遞減型層識別編號檢測 之構成方塊圖。遞減型層識別編號檢測電路21⑷ ,形成於三維晶片裝置j之各晶片層1(〇)1⑷上,包 各減篁電路22之構成與動作。本發明之一實施例中,減量 201203496 電路22包含三個依序連接之全加器221、222、223,以執 行3位it減量運算,且每—全加器係包含二個半力口器及一 個OR電路。21(0)-21(4), which are formed on each of the wafer layers of each three-dimensional wafer device, ^0)-1(4). The input value of the decrementing circuit u of the first layer identification number detecting circuit 21 (〇) is set to 5' while performing subtraction! The operation is performed and the output value is 4, which is assigned to the first layer identification code of the first wafer I 1 (〇) of the three-dimensional wafer device 1. Next, the second layer identification number detecting circuit 21 (丨) operates the first layer identification number 4 minus i, and the output value thereof is assigned as the input value of the third layer identification number detecting circuit 21(2). The output value of the second layer identification number detecting circuit is calculated by subtracting 1 from the first layer identification number 4, and is the second layer identification number 3 of the second chip | i(1) of the triple chip device 1. Similarly, the operation outputs of the respective decrement circuits 22 of the layer identification number detecting circuits .21 (2), 21 (3), and 21 (4) are sequentially decremented by 1 and simultaneously transmitted to the subsequent stage. = The third wafer of the three-dimensional wafer assembly i 1 ^ 2 (2) is assigned the third layer identification, the delivery 2, the fourth wafer layer 1 (3) is assigned the fourth layer identification number! And the fifth wafer layer J (4) is assigned a fifth layer identification number 〇. Next, the final wafer layer...): The final operational output value of the subtraction circuit 22 is 〇, which can be used as an output for discriminating the total number of wafers of the stacked semiconductor memory device. . . The fourth figure is a block diagram showing the structure of the decremental layer identification number detection in the embodiment of the present invention. The decreasing layer identification number detecting circuit 21 (4) is formed on each of the wafer layers 1 (1) (4) of the three-dimensional wafer device j, and includes the configuration and operation of each of the subtracting circuits 22. In one embodiment of the present invention, the decrement 201203496 circuit 22 includes three sequentially connected full adders 221, 222, 223 to perform a 3-bit it decrement operation, and each full adder includes two half-porters And an OR circuit.

第五圖係顯示本發明實施例中減量電路之〗位元全加 益之電路構成。全加11係為一邏輯電路’其執行三個i位 凡白努力數字(binary number),為輸入位元A b與輸入 載波Q之加法運算,並產生2位元輸出值C。及S。如第 圖斤示每全力口器係由二個半加器、奶構成,連 接A與B作為第—半加器似之輸人值,並將其總和連接 至第一半加杰225之輸入值與〇R電路,再連接Ci至第二 半加器225之另-輸入值’獲得二個輸出值c。及s。其中, 半加器係為一邏輯電路,具有二個輸入值,通常以A盥B 代表’與二個輸出值’其為輸出位元8與載波c。同樣地, 輸出位元S可為A、B及。之3位元x〇R電路,且c。可 為A、B及Cl2 3位元多數函數。 元半加器之電路構 全加器之1位元半 第七圖係顯示本發明實施例之丨位 成例,及第八圖係顯示本發明實施例中 加器之眞值表。 第六圖係心減量電路之)位元全加器之眞值表。如 圖所示=輸入載波。與輸入位元a、b皆為。,則輸出 與載波輸出C。皆為G’或者當全部輸人載波Μ :入η、:皆為卜則輸出位元s與載波輸出c。皆為 。虽輸入載波Q與輸入位元A、B其中之一為i,則輸出 位元,而載波輪出C。為0。同時,當輸入載 201203496 與輸入位元A、B其中二者為丨,則輸出位元3為〇,而載 波輸出C。為1。 如第四圖所示,上述1位元減量電路22係由三個全加 器221、222、223連接構成。第一全加器221之輸出訊號 係載波輸出C。,其輸入至第二全加器222,作為第二全加 器222之輸入載波Q。接著,第二全加器222之輸出訊號 為載波輸出C。’並將其輸入第三全加器223,作為第三全 加器223之輸入載波Ci。更進一步,3位元層識別編號由 3位元A〇、Al及A2組成,位元A〇輸入至第一全加器22卜 位元Ai輸入至第二全加器222,相同地,位元八2輸入至 第三全加器223。減量電路22之3位元係由運算後輸出之 位元S〇、S!及S2組成,第一全加器221輸出位元%,第 二全加器222輸出位元Si,而第三全加器223輸出位元S2。 第九圖係顯示本發明實施例中第四圖之減量電路之眞 值表。相對於構成輸入之層識別編號的3位元Α()、Αι及 # A2,運算輸出之3位元s〇、心及&如第九圖所示變化。 減1之減量電路依序對白努力值A0、八!及A?執行運算, 並依序輸出為白努力值8〇、81及S2。於輸入1U至〇〇〇之 範圍,得到輪出1 1 0至1 1 1。 第二圖中’所有遞減型.層識別編號檢測電路 21 (0)-2 1(4)分別包含前述減量電路22之構成,且這些遞減 型層識別編碼檢測電路21(0)-21(4)係依序連接並動作如實 施例。第九圖之眞值表最下方五個數值,係分別對應為第 二圖之遞減型層識別編號檢測電路21(0)·21(4)之減量電路 11 201203496 22。本發明之一實施例中’由於3位元a〇、a丨及a2為三 為晶片裝置1第一晶片層K0)之減量電路22的輸入值,第 一層識別編號設定為4。接著,減量電路22運算所述之3 位元A〇、八〗及A? ’並傳送運算後之輸出值s〇、&及^, 作為三維晶片裝置1之下一晶片的輪入值’每一輸入值函 數為層識別編號。 因此,層識別編號,即五個減量電路22之輸入值,從 4至0連續變化(白努力值組合從011至〇〇〇)。接著,層識 別編號4至0可分配為三維晶片裝置1 (〇)_ i (4)之各晶片 層。由於層識別編號4-0分配於三維晶片裝置1(〇)_1(4)之 各晶片層為獨特且不同於其他(每_)晶片層,層識別編號 4-0可被使用於指定所需之晶片。The fifth figure shows the circuit configuration of the full gain of the bit circuit of the decrementing circuit in the embodiment of the present invention. The full 11 is a logic circuit' which performs three i-bit binary numbers, which is the addition of the input bit A b and the input carrier Q, and produces a 2-bit output value C. And S. As shown in the figure, each full-mouth device consists of two half-adders and milk, connecting A and B as the first-half adder-like input value, and connecting the sum to the input of the first half of Jiajie 225. The value and the 〇R circuit, and then the Ci to the second input 225 of the second half adder 225, obtain two output values c. And s. The half adder is a logic circuit having two input values, typically A 盥 B for ' and two output values' for output bit 8 and carrier c. Similarly, the output bit S can be A, B, and. 3-bit x〇R circuit, and c. It can be a 3-bit majority function for A, B and Cl2. The circuit of the half-adder is one-bit half of the full adder. The seventh figure shows the clamped example of the embodiment of the present invention, and the eighth figure shows the threshold table of the adder of the embodiment of the present invention. The sixth figure is the depreciation table of the bit full adder. As shown in the figure = input carrier. And input bits a, b are both. , then output and carrier output C. Both are G' or when all input carriers Μ: into η, : are both, then output bit s and carrier output c. All are. Although one of the input carrier Q and the input bits A and B is i, the bit is output and the carrier is rotated by C. Is 0. At the same time, when the input load 201203496 and the input bits A, B are both 丨, the output bit 3 is 〇, and the carrier output C. Is 1. As shown in the fourth figure, the 1-bit decrement circuit 22 is connected by three full adders 221, 222, and 223. The output signal of the first full adder 221 is the carrier output C. It is input to the second full adder 222 as the input carrier Q of the second full adder 222. Next, the output signal of the second full adder 222 is the carrier output C. And input it to the third full adder 223 as the input carrier Ci of the third full adder 223. Further, the 3-bit layer identification number is composed of 3-bit A, A, and A2, and the bit A is input to the first full adder 22, and the bit Ai is input to the second full adder 222. Similarly, the bit Element VIII is input to the third full adder 223. The 3-bit of the decrement circuit 22 is composed of the bits S〇, S! and S2 output after the operation, the first full adder 221 outputs the bit %, and the second full adder 222 outputs the bit Si, and the third full The adder 223 outputs the bit S2. The ninth drawing shows a threshold value table of the decrementing circuit of the fourth figure in the embodiment of the present invention. The 3-bit s〇, heart, and & output of the operation output are changed as shown in the ninth figure with respect to the 3-bit Α(), Αι, and #A2 constituting the input layer identification number. Decrease the circuit by 1 and follow the order of the effort A0, eight! And A? performs the operation, and outputs the white effort values 8〇, 81, and S2 in order. Enter 1U to 〇〇〇 to get the round 1 1 0 to 1 1 1 . In the second figure, 'all declining type layer identification number detecting circuits 21(0)-2 1(4) respectively include the configuration of the aforementioned decrementing circuit 22, and these decrementing type layer identification code detecting circuits 21(0)-21(4) The system is sequentially connected and operates as in the embodiment. The lower five values of the threshold table of the ninth graph correspond to the decrementing circuit 11 201203496 22 of the decrementing layer identification number detecting circuit 21(0)·21(4) of the second figure, respectively. In one embodiment of the present invention, the input value of the decrement circuit 22 of the first wafer layer K0 of the wafer device 1 is set to 4 because the three bits a, a, and a2 are three. Next, the decrement circuit 22 calculates the three bits A 〇 , 八 、 and A ′ ' and transmits the calculated output values s 〇 , & and ^ as the rounding value of a wafer under the three-dimensional wafer device 1 ' Each input value function is a layer identification number. Therefore, the layer identification number, i.e., the input values of the five decrement circuits 22, continuously changes from 4 to 0 (the white effort value is combined from 011 to 〇〇〇). Next, the layer identification numbers 4 to 0 can be assigned to the respective wafer layers of the three-dimensional wafer device 1 (〇)_i (4). Since the layer identification number 4-0 is assigned to each wafer layer of the three-dimensional wafer device 1 (〇)_1 (4) is unique and different from the other (per_) wafer layer, the layer identification number 4-0 can be used to specify the required Wafer.

上述敘述係為本發明之較佳實施例。此領域之技藝者 應得以領會其係用以說明本發明而非用以限定本發明戶^主 2之專利權利範圍。其專利保護範圍當視後附之申請專利 乾圍及其等同領域而定。凡熟悉此領域之技藝者,在不脫 離本專利精神或範_,所作之更動或_,均屬於本發 明所揭示精神下所完成之等效改變或料,^應包含在下 述之申凊專利範圍内。 【圖式簡單說明】 裝置之結構側 第圖係顯示本發明實施例之三維晶片 面圖例; 曰第一圖係顯示本發明實施例之設於三維晶片裝置之各 片之遞減型層識別編號檢測電路之結構示意圖; m 12 201203496 第三圖係顯示本發明另一實施例之三維 曰曰片之遞減型層識別編號檢測電路之結構示音圖、 ,之:顯示本發明實施利之遞減型層;:編號檢測 益之構成方塊圖; 位元全加 第五圖係顯示本發明實施例中減量電路之 器之電路構成例; 第六圖係顯示本發明實施例中減量電路之一八 器之眞值表; 位兀王加 第七圖係顯示本發明實施例中一位元半加器之電路 成例; 加器之眞值 第八圖係顯示本發明實施例中一位元半 表;及 第九圖係顯示本發明實施例第四圖之遞減型層 號礆測電路之眞值表。 Ά 【主要元件符號說明】 1 二維晶片裝置 2 基板 3 界面晶片 1(0)-1(4) 第·一至第五晶片層 4 焊珠 5 凸塊 22 減量電路 21(0)-21(4) 遞減式層識別編號檢測電路(檢夠 電路) 13 201203496 221 、 222 、 223 全加器 224 ' 225 半加器 A、B 輸入位元 Ci 輸入載波 C〇 載波輸出 S 輸出位元 So 、 Si 、 s2 位元 A〇、Ai、A2 位元The above description is a preferred embodiment of the invention. Those skilled in the art should be able to appreciate the scope of the patent rights which are used to illustrate the invention and not to limit the invention. The scope of patent protection depends on the patent application and its equivalent fields. Any person skilled in the art, without departing from the spirit or scope of this patent, may change the equivalents or materials that are completed under the spirit of the present invention, and shall include the following claims. Within the scope. BRIEF DESCRIPTION OF THE DRAWINGS The structural side of the device shows a three-dimensional wafer surface illustration of an embodiment of the present invention. The first drawing shows the identification of the degraded layer identification number of each slice of the three-dimensional wafer device according to the embodiment of the present invention. The schematic diagram of the structure of the circuit; m 12 201203496 is a structural diagram showing the structure of the decreasing layer identification number detecting circuit of the three-dimensional cymbal according to another embodiment of the present invention, and showing: the decreasing layer of the embodiment of the present invention; The block diagram of the number detection benefit; the fifth figure shows the circuit configuration example of the device of the decrement circuit in the embodiment of the present invention; and the sixth figure shows the 八 of one of the decrement circuits in the embodiment of the present invention. The seventh table shows a circuit of a one-bit half adder in the embodiment of the present invention; the eighth figure of the adder shows a one-digit half-table in the embodiment of the present invention; The ninth figure shows a threshold table of the decreasing type layer number measurement circuit of the fourth embodiment of the embodiment of the present invention. Ά [Main component symbol description] 1 Two-dimensional wafer device 2 Substrate 3 Interface wafer 1 (0)-1 (4) First to fifth wafer layer 4 Bead 5 Bump 22 Decrement circuit 21 (0)-21 (4 Decreasing layer identification number detection circuit (detection circuit) 13 201203496 221, 222, 223 full adder 224 ' 225 half adder A, B input bit Ci input carrier C 〇 carrier output S output bit So, Si, S2 bit A〇, Ai, A2 bit

[si 14[si 14

Claims (1)

201203496 七、申請專利範圍: 1 · 一種二維晶片裝置,由複數個晶片堆疊,其包含: 複數個減量電路,其依序連接,以執行減丨運算,其用 以運算三維晶片裝置晶片之輸入值,並將三維晶片裝置 之每一晶片層之層識別編號輪出;以及 複數個凸塊,其耦合於三維晶片裝置之每一晶片層; 其中,該層識別編號係以!^位元之組合表示,將滿足M $ 2關係之]v[個以分配該層識別編號的μ個半導體晶 片准予以堆疊。 2. 如申請專利範圍第丨項之三維晶片裝置,其中每一該減 量電路包含三個依序連接之全加器,其中每一該全加器 係包含二個半加器與一個〇R電路。 3. 如申請專利範圍第1項之三維晶片裝置,其中在依序連 接之M-1個該減量電路之中,該減量電路之輸入值設定 攸Μ-1開始,以該μ個減量電路之輸入值分別為m_ 1 至〇作為該層識別編號,依序分配給該Μ個晶片層。 4·如申請專利範圍第丨項之三維晶片裝置,其中在依序連 接之Μ個該減量電路之中,該減量電路之輸入值設定 從Μ開始,以該Μ個減量電路之輸入值分別為Μ·〗至 〇作為該層識別編號,依序分配給該Μ個晶片層。 m 15 201203496201203496 VII. Patent application scope: 1 · A two-dimensional wafer device, which is composed of a plurality of wafer stacks, and includes: a plurality of subtraction circuits sequentially connected to perform a subtraction operation for calculating the input of the three-dimensional wafer device chip a value, and a layer identification number of each of the wafer layers of the three-dimensional wafer device is rotated; and a plurality of bumps coupled to each of the wafer layers of the three-dimensional wafer device; wherein the layer identification number is! The combination of the ^ bits indicates that the μ semiconductor wafers that satisfy the M $ 2 relationship are stacked with the μ semiconductor wafers assigned the layer identification number. 2. The three-dimensional wafer device of claim 3, wherein each of the decrementing circuits comprises three sequentially connected full adders, wherein each of the full adders comprises two half adders and one 〇R circuit . 3. The three-dimensional chip device of claim 1, wherein among the M-1 of the decrementing circuits sequentially connected, the input value of the decrementing circuit is set to 攸Μ-1, and the μ decrementing circuit is The input values are respectively m_1 to 〇 as the layer identification number, which are sequentially assigned to the one wafer layer. 4. The three-dimensional chip device of claim 3, wherein among the ones of the subtractive circuits sequentially connected, the input value of the decrementing circuit is set from Μ, and the input values of the ones of the decrementing circuits are respectively Μ·〗 至〇 As the layer identification number, it is sequentially assigned to the one wafer layer. m 15 201203496 1項之二維晶片裝置’其中每一該晶 片層為半導體記憶體晶片,用以儲存資料。 6.如申請專利範圍第5項之三維晶片裝置,其中每一該半 導體記憶體晶片除了包含記憶體電路以外,還包含運算 電路。 7.如申請專利範圍第5項之三維晶片裝置,其中每一該半 籲 導體記憶體晶片具有相同容量及相同構造。 8·如申請專利範圍第5項之三維晶片裝置,其中每一該半 導體記憶體晶片為DRAM晶片。 9.種一維片裝置之遞減式層識別編號檢測電路,其包 含: ' • 複數個減量電路,其依序連接,以執行減i運算,其用 X運算一、准曰曰片裝置晶片之輸入值,並將三維晶片裝置 之每一晶片層之層識別編號輸出;以及 複數個凸塊,其耦合於三維晶片裝置之每一晶片層; 其該層識別編號係以N位元之組合表示,將滿足Μ S2N關係之Μ個以分配該層識別編號的Μ個半導體晶 片准予以堆疊。 10.如申請專利範圍第9項之三維晶片裝置之遞減式層識 201203496 別編號檢測電路,其中每一該減量電路包含三個依序連 接之全加器。 .如申請專利範圍第9項之三維晶片裝置之遞減式層識 別編號檢測電路,其中在依序連接之M·〗個該減量電路 之中,該減量電路之輸入值設定從M-1開始,以該p 個減量電路之輸入值分別為M_!至〇作為該層識別編 號,依序分配給該Μ個晶片層。 利範圍第9項之三維晶片裝置之遞減式層識 = = =’其中在依序連接之μ個該減量電路 減量電I:: 輸入值設定從Μ開始,以該Μ個 電路之輸入值分別為至〇作為該 依序分配給該M個晶片層。 巧豕層為別編唬’One of the two-dimensional wafer devices 'each of the wafer layers is a semiconductor memory wafer for storing data. 6. The three-dimensional wafer device of claim 5, wherein each of the semiconductor memory chips includes an arithmetic circuit in addition to the memory circuit. 7. The three-dimensional wafer device of claim 5, wherein each of the semiconductor memory wafers has the same capacity and the same configuration. 8. The three-dimensional wafer device of claim 5, wherein each of the semiconductor memory chips is a DRAM wafer. 9. A descending layer identification number detecting circuit for a one-dimensional chip device, comprising: - a plurality of decrementing circuits sequentially connected to perform a subtractive i operation, wherein the X operation is performed, and the quasi-chip device chip Inputting a value and outputting a layer identification number of each wafer layer of the three-dimensional wafer device; and a plurality of bumps coupled to each of the wafer layers of the three-dimensional wafer device; the layer identification number is represented by a combination of N bits One of the semiconductors that satisfy the ΜS2N relationship is assigned a stack of semiconductor wafers assigned the layer identification number. 10. The decremental layering of the three-dimensional wafer device of claim 9 of the patent application scope. 201203496 The numbering detection circuit, wherein each of the decrementing circuits comprises three serially connected full adders. The descending layer identification number detecting circuit of the three-dimensional chip device of claim 9 wherein, in the sequentially connected M·the one of the decreasing circuits, the input value of the decrementing circuit is set from M-1, The input values of the p decrement circuits are respectively M_! to 〇 as the layer identification number, and are sequentially allocated to the one wafer layer. The descending type of the three-dimensional wafer device of the ninth item of the benefit range ===' wherein the number of the decrementing circuits connected in sequence is reduced by the I:: the input value is set from Μ, and the input values of the circuits are respectively As for this, the M wafer layers are sequentially assigned. The layer of cleverness is not compiled. 1717
TW099126392A 2010-07-01 2010-08-06 3D-IC device and decreasing type layer-ID detector for 3D-IC device TW201203496A (en)

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