TW201142268A - Apparatus for measuring water vapor permeability and method for measuring water vapor permeability - Google Patents

Apparatus for measuring water vapor permeability and method for measuring water vapor permeability Download PDF

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Publication number
TW201142268A
TW201142268A TW100113806A TW100113806A TW201142268A TW 201142268 A TW201142268 A TW 201142268A TW 100113806 A TW100113806 A TW 100113806A TW 100113806 A TW100113806 A TW 100113806A TW 201142268 A TW201142268 A TW 201142268A
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TW
Taiwan
Prior art keywords
chamber
water vapor
valve
gas
measurement
Prior art date
Application number
TW100113806A
Other languages
Chinese (zh)
Inventor
Shota Kanai
Hirohiko Murakami
Tomohiro Nagata
Original Assignee
Ulvac Inc
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Publication date
Application filed by Ulvac Inc filed Critical Ulvac Inc
Publication of TW201142268A publication Critical patent/TW201142268A/en

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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N15/00Investigating characteristics of particles; Investigating permeability, pore-volume, or surface-area of porous materials
    • G01N15/08Investigating permeability, pore-volume, or surface area of porous materials
    • G01N15/082Investigating permeability by forcing a fluid through a sample
    • G01N15/0826Investigating permeability by forcing a fluid through a sample and measuring fluid flow rate, i.e. permeation rate or pressure change

Abstract

The present invention is to provide an apparatus for measuring water vapor permeability and method for measuring water vapor permeability, which is high precision and is able to measure water vapor permeability at short time. The present apparatus for measuring water vapor permeability includes: chamber 2, dry gases introduction path 5, dry gases exhaustion path 6, water vapor amount supply part 17, control part 30, and water vapor amount measurer 8. Chamber 2 is divided to first chamber 13 and second chamber 14 by measured objector F. Water vapor supply part 17 is able to supply water vapor into first chamber 13. Control part 30 humidifies the measured objector F when first valve 13 and second valve 14 opened and water vapor supply part 8 is controlled for supplying water vapor into first chamber 13 when first valve 13 and second valve 14 closed. Water vapor amount of from first chamber 13 passing through the measuring object F and then toward the measuring space is measured by water vapor measurer 8 when first valve 24 and second valve 29 closed.

Description

201142268 六、發明說明: 【發明所屬之技術領域】 本發明關於一種用於测定對象物之透濕度之透濕度蜊 定裝置及透濕度測定方法。 【先前技術】 食品包裝用的薄膜等的評估,其中一個重要條件為透 濕度‘> 透濕度為水蒸氣穿透測定對象物的速度,而以每單 位時間、單位面積的水蒸氣的穿透量(g/nrVday)表示。特別 是在水蒸氣穿透測定對象物的速度低情 非常小的値,另外也由於在空氣中存在有丄4因 要一種高精密度的測定。 ^用於測定透濕度的測定裝置及測定方法存在有各種形 心例如,在專利文獻丨中記载了一種「用於測定水蒸氣 穿透度的裝置與其方法」。在該狡置中,藉由測定對象物到 ^成第、丨室與第2室’在第2室連接有循環管路。在循環 s路5又置有栗與露點計。在測定前,使沖洗用氣體流通於 含第2呈的循環管路而除去水分。在測定中,穿透測定 *象物而到達第2室的水蒸氣會藉域而循環於循環管路。、 藉由露點計測定流通於循環路的水蒸氣量,可判斷測 象物的水蒸氣穿透性。 、 先前技術文獻 專利文獻 專利文獻1 :國際公開W0 2009/04]632號 [0010]、圖〗) 视V奴洛 【發明内容】 [發明所欲解決之課題] 4/20 201142268 u而,在專利文獻丨所記載的裝置中,為了得到高精 岔度儘可能除去第2室的水分,而因此在開始測定時,供 給至第1室的水蒸氣在浸潤測定對象物之後,會穿透測定 對象物。因此,水蒸氣浸潤測定對象物會需要時間,測定 時間會因此而延長。 氣方;以上所述的狀況,本發明之目的在於提供一種透 濕度測定裝纽其浙m射ux高精錢且短時間 測定透濕度。 [用於解決課題的方法] 、為了達成上述目的,本發明其中一個形態所關連之透 濕、度測定m具備:腔體、乾燥氣體導人路徑、乾燥氣 杜排出路#、水蒸氣供給部、控制部、水蒸氣量測定器。 上述腔體藉由測定對象物劃分成第i室與第2室。 —上述乾,氣體導人路徑具有第丨目,連接於上述第2 至’在上述第]閥打開時,將乾燥氣體導入上述第2室。 上述乾燥氣體排出路彳i具有第2 :,在上述第鳩開時,由上述第2室排出上述 上述水蒸氣供給部可對上述第.丨室供給水蒸氣。 上述控制部在上述第1閥及上述第2閥打開時,將上 = = 濕’在上述第1閥及上述第2閥關閉時, 二供給水蒸氣之方式控制上述水蒸氣供給部。 处水洛氣量測定器在上述第】闕及上 =及=巧述第,室穿透上述測定對象物而往上 Γ 、述弟2閥關閉所形成的測定空間的水蒸氣量。 為了達成上述目的,本發明其中一個形態係關於透濕 5/20 201142268 測定對象物釗分成第丨 ’同時將上述測定對象 度測定方法’使乾燥氣體流通於藉由 室與第2室的腔體中的上述第2室 物加滋。 並 時’使第2室中上述乾燥 對上述弟丨室供給水蒸氣。 < 才4亡述ΐ」.透上述測定對象物而往上述第2室合 ^乳I ’⑽由連接於上述第2室的水蒸氣量測定^ [實施方式】 本發明其中一個實施形態係關於透濕度測定裝置,^ ί備:㈣、乾燥氣體導人路徑、乾燥氣體排出路徑、:; 洛軋供給部、控制部、水蒸氣量測定器。 上述腔體藉由測定對象物劃分成第】室與第2室。 室 上述乾燥氣體導入路徑具有第】閥,並連接於上述第2 在上述第丨閥打開時,將乾燥氣體導入上述第2室。 室 體 上述乾燥氣體排出路徑具有第2閥’並連接於上述第2 在上述第2閥打開時,由上述第2室排出上述乾燥氣 上述水洛氣供給部可對上述第1室供給水蒸氣。 上述控制部會在上述第丨閥及上述第2閥打開時,將 上述測定對象物加濕’在上述第〗間及上述第2閱關閉時, 以對上述第】室供給水蒸氣之方式來控制上述水蒸氣供給 部。 上述水蒸氣量測定器會在上述第1閥及上述第2閥關 閉時,測定由上述第1室穿透上述測定對象物而往上述第i 閥及上述第2閥關閉所形成的測定空間的水蒸氣量。 6/20 201142268 在第】閥及第2201142268 VI. Description of the Invention: [Technical Field] The present invention relates to a moisture permeability measuring device and a moisture permeability measuring method for measuring the moisture permeability of an object. [Prior Art] Evaluation of a film for food packaging, etc., one of the important conditions is the moisture permeability '> The moisture permeability is the speed at which water vapor penetrates the object to be measured, and the water vapor per unit time per unit area penetrates. The amount (g/nrVday) is expressed. In particular, the speed at which water vapor penetrates the object to be measured is extremely low, and the presence of helium in the air is also required to be measured with high precision. ^The measuring device and the measuring method for measuring the moisture permeability have various shapes. For example, a "device for measuring the vapor permeability" and a method thereof are described in the patent document. In this device, a circulation line is connected to the second chamber by the measurement object to the first, the diverticulum, and the second chamber. In the cycle s road 5, there is a chestnut and dew point meter. Before the measurement, the flushing gas was passed through the circulation line containing the second one to remove the water. In the measurement, the water vapor that has passed through the measurement object and reaches the second chamber is circulated to the circulation line by the domain. The water vapor permeability of the analyte can be determined by measuring the amount of water vapor flowing through the circulation path by a dew point meter. PRIOR ART DOCUMENT PATENT DOCUMENT Patent Document 1: International Publication WO 2009/04] No. 632 [0010], Fig. 〖) Vision V Nuo [Summary of the Invention] [Problems to be Solved by the Invention] 4/20 201142268 u, in In the device described in the patent document, the water in the second chamber is removed as much as possible in order to obtain high precision. Therefore, when the measurement is started, the water vapor supplied to the first chamber penetrates the measurement after the object to be measured is wetted. Object. Therefore, it takes time for the water vapor to infiltrate the measurement object, and the measurement time is prolonged. In the above-mentioned situation, the object of the present invention is to provide a moisture permeability measuring device, a high-precision money, and a short-term measurement of moisture permeability. [Means for Solving the Problem] In order to achieve the above object, the moisture permeability and degree measurement m associated with one aspect of the present invention includes a cavity, a dry gas guiding path, a drying gas exhausting path #, and a water vapor supply unit. , control unit, water vapor meter. The cavity is divided into an i-th chamber and a second chamber by the measurement object. - The above-mentioned dry, gas-conducting path has a first order, and when the second to the above-mentioned first valve are opened, a dry gas is introduced into the second chamber. The dry gas discharge path 具有i has a second: when the first opening is opened, the water vapor supply unit is discharged from the second chamber to supply steam to the first chamber. When the first valve and the second valve are opened, the control unit controls the water vapor supply unit so that water is supplied to the first valve and the second valve when the first valve and the second valve are closed. The amount of water vapor in the measurement space formed by the above-mentioned 阙 阙 and upper = and = 巧 , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , In order to achieve the above object, one aspect of the present invention relates to a moisture-permeable 5/20 201142268 object to be measured, which is divided into a second portion and a method for measuring the measurement target, and a dry gas is circulated through a chamber of the chamber and the second chamber. The second room mentioned above is added. At the same time, the above-mentioned drying in the second chamber was supplied with water vapor to the diverticulum chamber. < 才4死述ΐ. The measurement of the object to the second chamber is performed in the second chamber I'(10) by the amount of water vapor connected to the second chamber. [Embodiment] One embodiment of the present invention is About the moisture permeability measuring device, (4), the drying gas guiding path, the drying gas discharge path, and the: rolling supply unit, the control unit, and the water vapor amount measuring device. The cavity is divided into a first chamber and a second chamber by the object to be measured. The drying gas introduction path has a valve and is connected to the second valve. When the second valve is opened, the drying gas is introduced into the second chamber. The drying gas discharge path of the chamber body has a second valve ′ and is connected to the second. When the second valve is opened, the dry gas is discharged from the second chamber. The water gas supply unit can supply water vapor to the first chamber. . When the second valve and the second valve are opened, the control unit humidifies the object to be measured by supplying water vapor to the first chamber when the first and second readings are closed. The water vapor supply unit is controlled. When the first valve and the second valve are closed, the water vapor amount measuring device measures a measurement space formed by the first chamber penetrating the measurement target and closing the i-th valve and the second valve. The amount of water vapor. 6/20 201142268 in the first valve and the second

及第2閥呈關閉的狀態, 因此即使穿透測定對象物的水蒸 〜〜疋準備階段中,乾 2 言· 主’並·由乾燥氣體排 同時藉由控制部所控 7加渴。在第1閥及第2 藉由:制邹所控制的水蒸氣 L,會牙透測定對象物而往測 益測疋。在剛定時,第1閥 軋夏為微量的,仍然能夠以良好的精密度進行偵測。另外, 由於在測定準備階段會將測定對象物加濕,因此在測定時 不需要浸潤測定對象物的時間,可縮短測定開始至藉由水 蒸氣量測定器偵測到水蒸氣的時間。 上述水蒸氣供給部亦可具有連接於上述第〗室,並將 加濕氣體導入上述第〗室的加濕氣體導入路徑。 藉由將加濕氣體由加濕氣體導入路徑導入第1室,可 保持第1室内的濕度及溫度。藉此,可在測定準備階段中 將測定對象物加濕’在測定階段中,將水蒸氣定量供給至 第1室。 上述水蒸氣量測定器亦可配置於上述第1閥與上述腔 體之間的上述測定空間。 如上述所述般’在測定準備階段中,乾燥氣體會由乾 燥氣體導入路徑導入第2室,並由乾燥氣體排出路徑排出。 藉由使水蒸氣量測定态配置於流通的乾燥氣體上游側的第 1閥與腔體之間’在測定準備階段中,由腔體内除去的水分 會附著於水蒸氣量測定器’可防止測定精密度降低。 上述水蒸氣量測定器亦可為露點計。 7/20 201142268 H露點計,_以高精密度測定微小的透濕度。 其'卜個實施形態係關於透濕度測定方法,使 、〜乩不2至,同時將上述測定對象物加濕。 付日寸’使第2室中上述乾燥氣體的流通停止,而 使水洛氣供給至上述第1室。 ,V 述第1室穿透上述測定對象物而往上述第2室的 = 係藉由連接於上述第2室的水蒸氣董測定器作 在將上述測定對象物加濕的步驟中,亦可使加 流通於上述第1室。 ,上述水琚氣量測定器亦可配置於上述腔體之往上沭启 燦氣體的上游側^ 上述水蒸氣量測定器亦可為露點計。 以下+ Α?、圖式同時對本發明之實施形態作說明。 (第丨實施形態) 圖丨表不關於第1實施形態之透濕度測定裝置丨概略 構成之示意圖。 、如相同圖式所示般,透濕度測定裝置1具有:腔體2、 氣體供給^統3、加濕氣料人路徑4、乾燥氣體導入路徑 5、加濕氣體排出路徑6、乾燥氣體排出路徑7、露點計8 及控制部30。 加濕氣體導入路徑4、乾燥氣體導入路徑5 '加濕氣體 排出路徑6及乾燥氣體排出路徑7分別連接於腔體2。氣體 供給糸統3連接於加濕氣體導入路徑4及乾燥氣體導入路 徑5。露點計8配置於乾燥氣體導入路徑5上。控制部兕 8/20 201142268 後述各部。在腔體2中,安裝有作為測定對象物的 圖2表示腔體2構成的剖面圖。 如相同圖式所示般,腔體2具有:第〗腔體部9 =月且#10、連結具U及墊片12。第J腔體部9與第2沪 ,部10藉由連結具】I而連聯結,塾片12配置於第1腔^ 部9與第2腔體部10的接合處。 且 第1腔體部9由不錄鋼等材料所構成,並形成有凹部 %、凸緣部%。凹部9a為具有開口的凹狀部分。在凹 9a的開口緣形成有凸緣部%,在凸緣部%,沿著凹部知 ^開口形成有溝槽。另外,在凹部9a形成有連接加濕氣體 —入路徑4的配管18 &加濕氣體排出路徑6的配管26的 孔。 *、第2腔體部K)係由不_等對於水蒸氣具有吸附性、 务透性低的材料所構成’並形成有凹部伽與凸緣部觸。 凹部⑽為具有開口的凹狀部分。凸緣部j〇b形成於凹部 〇a的開口緣,在凸緣部隱沿著凹部咖的開口形成有溝 、曰μ另外’在凹部l〇a形成有連接乾燥氣體導入路徑$的 配官22及乾燥氣體排出路徑7的配管28的孔。 第1腔體部9與第2腔體部10可形成相同形狀,也可 形成相異形狀。但是,凹部9a與凹部丨⑸的開口形狀及凸 緣部%與凸緣部10㈣接合面有必要互相對應。另外,以 ,凹,:1.0a的容積變小的方式形成第2腔體部ι〇,可減低 穿透薄膜F的水蒸氣擴散所需要的時間。 連結具11會將凸緣部外與凸緣部l〇b連結。連結具 11可採關如螺栓與螺母、夾子等容易拆裝的物體。、 9/20 201142268 丛片丨2會將腔體2的内部與外部密封。 緣部⑽人一個墊片丨凸緣部9b與凸緣部 1 〇b連 '.,。’則墊jn ! 2會隔著薄膜F而呈對向,並阻斷薄膜 卜與凸緣部9b、薄膜W凸緣部1%之間氣體的連通。 I在安I有,專膜F的狀態下,若第】腔體部9與第2腔 丨0結合’則在腔體2内形成被凹部%與薄膜卜、圍住 的弟|室η與被凹部K)a與_F圍住的第2室|4 室。 一 Μ |所不般’氣體供給系統3具有氣體源丨5與配管]6。 氣體源15藉由配管16❿連接於加滿氣體導入路徑4的加 濕器Π及乾燥氣體導入路徑5的純化/加熱器2〇。氣體源 I)為乳體鋼瓶等’將作為加濕氣體以及乾燥氣體的材料的 原料氣雜給至加減體導人路徑4及乾燥氣體導入路徑 5。原料氣體為例如氮氣。 加濕氣體導人路徑4具有加漏17、配管丨8及第請 19 °加濕器17藉由配管18連接於腔體2的第.j室^。加 濕器Π係藉由對於由氣體供給系統3供給 例如曝氣等,而產生含有水蒸氣的加濕氣體。第3^^ 置於配管18,而將配管18打開或關閉。 ^19- 乾燥氣體導人路徑5具有純化/加熱器2G、配管22 純化/加熱器2G係藉由配管22並隔著 佼8連接於腔體2的第2 f 14。純 :將=及雜質從由氣體供給系統3供給的原料二 去,_將原料氣體加熱,產生乾燥氣體。第】閥== 方』己官22的純化/加熱器2()與露點計δ之間,而將配管u 10/20 201142268 打開或關閉。第4閱25設置於配管22的露點計8與腔體2 之間’而將配管22打開或關閉。 ,加濕氣體排出路徑6具有配管26及第5之閥27。配管 26的^端連接於腔體2的第1113,另-端連接於未圖二 的排乳錢。排氣㈣可為真线等排《構,另外還可 開放至大氣。帛5閥27係設置於配管%,而 開或關閉。 打 Λ乳體排出路徑7具有配管28及第2閥29。配 28的一端連接於腔體2的第2 m -端連接於排μ 統。排氣系統可為真空泵等排氣機構,另外還可開放至少 氣。第2閥29係設置於配管28,並使配管28打開或關閉: 路點計8配置於乾燥氣體導入路徑5的配管 間24與腔體2的第2室14之間。露點計8可狀為^如 氣化㈣點計、鏡面冷卻式露點計、^射線露點計等。料 由使用露點計,能夠以高精密度測定微少的水I氣量^ ^點另外還能夠使用可測定水蒸氣量(濕度)的裝 置’例“分子電阻式濕度計、高分子電容式濕度計、氧 化紹I谷式濕度計、紅外_度計、微波濕度計等。 控制部30連接於第!間24、第2間29及加渴哭^。 控制部3〇會偵測第1閥24及第2閥29的開閉狀態,並因 應於其狀態而控制加濕器17。具體而言,在第及第 2閥29打_ ’會產生可將濕的量的水 第1閥24及第2閥29 S3 Μ押 ^ '、 濕度之方式緑生水以。^丨’ 濕氣體成為特定的 J',,、孔另外,控制部30亦可自行進行 第1閥24及第2閥29的打開或關閉。 丁迴仃 透濕度測定裝置】如以上所述方式構成。若第】辜 11/20 201142268 及第2閥29關閉,則藉由第2室丨4、配管22的第1閥24 往腔體2的一侧、以及配管28的第2閥29往腔體2的一 側,會形成測定空間。另外,透濕度測定裝置丨具備腔體2 及將各配管的溫度分別保持在特定的溫度而未圖示的加熱 器。 ’ ' 以下說明透濕度測定裝置丨的運作。 在測定薄膜F的透濕度之前,進行如以下所述方 定準備步驟。 " 作為測定對象物的薄膜F設置於第i腔體部9的凸緣 部9b、與第2腔體部丨〇的凸緣部丨〇b之間,使透濕度测定 破置1的溫度保持一定。 在此狀態下,乾燥氣體會流通於第2室】4。第9閥29、 第4閥25及第]閥24依序打開,原料氣體會由_源15 通過配管】6而供給至純化/加熱器2(),藉由純化$熱器% 而乾燥、除去雜質及加熱,而產生乾燥氣體。乾燥氣體合 通過配管22及露點計8而導人第2室M。“第 二 的乾燥氣體會通過配管28而排出。 一 在乾燥氣體流通的同時,加濕氣體會流通於第 第3間丨9依序打開’原料氣體會由氣體源丨; 通過配^6秘給至加濕器17,藉由加濕器17而加濕, 產生加濕氣體。加濕氣體會通過配管]8而導入第】— 導入第13的加濕氣體,通過配管26而排』。至。 使透濕度測定裝置】㈣在此狀㈣定相 存在於測定空間的水蒸氣。此= 料s。又置以2室14的上游側的配f 22,心 14放出的水蒸氣不會附著於露點計8。另外,藉由加濕= 12/20 201142268 體的流通,將薄膜F加濕(含水)。 特定時間經過後,開始薄膜F的透濕度測定。第1閥 24及第2閥29依序關閉,並使乾燥氣體的流通停止。為了 直接對第1室]3供給水蒸氣而流通加濕氣體。此處亦可實 施流量的調整、氣體溫度或濕度的調整。 導入第1室13的加濕氣體所含水蒸氣的一部分會穿透 測定對象物的薄膜F而到達測定空間。穿透的水蒸氣擴散 於測定空間内,並藉由露點計8而作測定。可從藉由露點 計8測得到的露點溫度、薄膜F的面積、與測定經過時間, 得到透濕度(g/m2/day)。 具體而言,使用以下[數1]所示的son-ntag公式(參照 JISZ-8806)將露點溫度轉換為水分壓。 [數1] ^°§ιο ^h2o ~ 24.738 —Since the second valve is in a closed state, even if the water is immersed in the preparation target, the dry state is controlled by the control unit and the thirst is controlled by the control unit. In the first valve and the second, the water vapor L controlled by the machine is subjected to the measurement of the object by the tooth and the measurement is performed. At the very beginning, the first valve was traced in summer and could still be detected with good precision. Further, since the object to be measured is humidified in the measurement preparation stage, it is not necessary to infiltrate the object to be measured during the measurement, and the time from the start of the measurement to the detection of the water vapor by the steam amount measuring device can be shortened. The steam supply unit may have a humidified gas introduction path that is connected to the first chamber and introduces a humidified gas into the chamber. By introducing the humidified gas into the first chamber from the humidifying gas introduction path, the humidity and temperature in the first chamber can be maintained. Thereby, the object to be measured can be humidified in the measurement preparation stage. In the measurement stage, water vapor is quantitatively supplied to the first chamber. The water vapor amount measuring device may be disposed in the measurement space between the first valve and the cavity. As described above, in the measurement preparation stage, the dry gas is introduced into the second chamber through the dry gas introduction path, and is discharged from the dry gas discharge path. By arranging the water vapor amount measurement state between the first valve and the cavity on the upstream side of the flowing dry gas 'in the measurement preparation stage, moisture removed from the cavity adheres to the water vapor amount measuring device' The measurement precision is lowered. The above water vapor amount measuring device may also be a dew point meter. 7/20 201142268 H dew point meter, _ to measure the slight moisture permeability with high precision. In the embodiment, the method for measuring the moisture permeability is such that the object to be measured is humidified at the same time. The delivery time is such that the flow of the dry gas in the second chamber is stopped, and the water is supplied to the first chamber. In the step of humidifying the object to be measured, the step of passing through the object to be measured and passing through the second chamber is performed in the step of humidifying the object to be measured. The circulation is added to the first chamber. The water vapor measuring device may be disposed on the upstream side of the chamber to open the gas. The water vapor measuring device may also be a dew point meter. The following is a description of embodiments of the present invention. (Third embodiment) FIG. 2 is a schematic view showing a schematic configuration of a moisture permeability measuring device according to the first embodiment. As shown in the same figure, the moisture permeability measuring apparatus 1 has a chamber 2, a gas supply system 3, a humidified gas person path 4, a dry gas introduction path 5, a humidified gas discharge path 6, and a dry gas discharge. Path 7, dew point meter 8, and control unit 30. The humidified gas introduction path 4 and the dry gas introduction path 5 'the humidified gas discharge path 6 and the dry gas discharge path 7 are connected to the cavity 2, respectively. The gas supply system 3 is connected to the humidified gas introduction path 4 and the dry gas introduction path 5. The dew point meter 8 is disposed on the dry gas introduction path 5. Control Department 兕 8/20 201142268 Each part will be described later. In the cavity 2, a measurement object is attached. Fig. 2 shows a cross-sectional view of the cavity 2. As shown in the same figure, the cavity 2 has a first cavity portion 9 = month and #10, a coupling U and a spacer 12. The J-th cavity portion 9 and the second Shanghai portion 10 are connected by a coupling member I, and the cymbal 12 is disposed at a joint between the first cavity portion 9 and the second cavity portion 10. Further, the first cavity portion 9 is made of a material such as no steel, and has a concave portion % and a flange portion %. The recess 9a is a concave portion having an opening. A flange portion % is formed in the opening edge of the recess 9a, and a groove is formed in the flange portion % along the recess portion. Further, a hole for connecting the pipe 18 of the humidified gas-inflow path 4 to the pipe 26 of the humidified gas discharge path 6 is formed in the recessed portion 9a. * The second cavity portion K) is made of a material that is not adsorbable to water vapor and has low permeability, and is formed with a concave portion and a flange portion. The recess (10) is a concave portion having an opening. The flange portion j〇b is formed in the opening edge of the concave portion 〇a, and a groove is formed in the flange portion along the opening of the concave portion, and 'μ is additionally formed in the concave portion 10a. 22 and the hole of the pipe 28 of the dry gas discharge path 7. The first cavity portion 9 and the second cavity portion 10 may have the same shape or may have a different shape. However, it is necessary for the recessed portion 9a and the recessed portion (5) to have an opening shape, a flange portion %, and a flange portion 10 (four) joint surface. Further, the second cavity portion ι is formed so that the volume of the concave portion: 1.0a becomes small, and the time required for the water vapor to penetrate the film F to diffuse can be reduced. The connecting tool 11 connects the outside of the flange portion to the flange portion 10b. The connecting tool 11 can be used to close objects such as bolts and nuts, clips, and the like. , 9/20 201142268 The slab 丨 2 will seal the inside and outside of the cavity 2. The rim portion (10) has a spacer 丨 flange portion 9b connected to the flange portion 1 〇b. Then, the pad jn ! 2 is opposed to each other via the film F, and blocks the gas communication between the film and the flange portion 9b and the flange portion 1 of the film W. I. In the state of An I, in the state of the film F, if the first cavity portion 9 is combined with the second cavity 丨0, a concave portion% and a film are formed in the cavity 2, and the surrounding room|room η is Room 2|4 surrounded by recesses K)a and _F. The gas supply system 3 has a gas source 丨5 and a pipe 6 . The gas source 15 is connected to the humidifier 加 of the top gas introduction path 4 and the purification/heater 2 of the dry gas introduction path 5 by a pipe 16 。. The gas source I) is a milk cylinder or the like, and the raw material gas as a material of the humidifying gas and the drying gas is supplied to the addition and subtraction guide path 4 and the dry gas introduction path 5. The material gas is, for example, nitrogen. The humidifying gas guiding path 4 has a leaking passage 17, a piping 8 and a 19th humidifier 17 connected to the chamber 2 by a pipe 18. The humidifier system generates a humidified gas containing water vapor by supplying, for example, aeration or the like to the gas supply system 3. The third ^^ is placed in the pipe 18, and the pipe 18 is opened or closed. ^19- The dry gas guiding path 5 has a purification/heater 2G, and the pipe 22 purification/heater 2G is connected to the second f 14 of the cavity 2 via the pipe 22 via the 佼8. Pure: = and impurities are supplied from the raw material 2 supplied from the gas supply system 3, and the raw material gas is heated to generate a dry gas. The first valve == square" between the purification / heater 2 () and the dew point meter δ, and the pipe u 10/20 201142268 is turned on or off. The fourth reading 25 is provided between the dew point meter 8 of the pipe 22 and the cavity 2, and the pipe 22 is opened or closed. The humidified gas discharge path 6 has a pipe 26 and a fifth valve 27. The end of the pipe 26 is connected to the 1113 of the cavity 2, and the other end is connected to the milk bank not shown in Fig. 2. The exhaust (4) can be in the form of a true line, and can also be opened to the atmosphere.帛5 valve 27 is set to the pipe %, and is turned on or off. The sputum milk discharge path 7 has a pipe 28 and a second valve 29. One end of the pair 28 is connected to the second m-end of the cavity 2 to be connected to the row. The exhaust system can be an exhaust mechanism such as a vacuum pump, and at least gas can be opened. The second valve 29 is provided in the pipe 28, and the pipe 28 is opened or closed. The waypoint meter 8 is disposed between the pipe 24 of the dry gas introduction path 5 and the second chamber 14 of the cavity 2. The dew point meter 8 can be shaped as a gasification (four) point meter, a mirror-cooled dew point meter, a ^-ray dew point meter, and the like. By using a dew point meter, it is possible to measure a small amount of water I gas with high precision. ^ ^ Point can also use a device that can measure the amount of water vapor (humidity), such as a molecular resistance type hygrometer, a polymer capacitance type hygrometer, Oxidation I valley moisture meter, infrared meter, microwave hygrometer, etc. The control unit 30 is connected to the second room 24, the second room 29 and the thirst crying ^. The control unit 3 detects the first valve 24 and The humidifier 17 is controlled in accordance with the state in which the second valve 29 is opened and closed. Specifically, the first valve 24 and the second valve 29 generate a wet amount of water. The valve 29 S3 is clamped to ^ ', and the humidity is green. The wet gas becomes a specific J', and the control unit 30 can also open the first valve 24 and the second valve 29 by itself. Or the Ding Huiyu moisture permeability measuring device is configured as described above. When the first 辜11/20 201142268 and the second valve 29 are closed, the second chamber 丨4 and the first valve 24 of the pipe 22 are A measurement space is formed on one side of the cavity 2 and the second valve 29 of the pipe 28 toward the cavity 2. Further, the moisture permeability measuring device is provided The body 2 and the heaters (not shown) are kept at a specific temperature, respectively. ' ' The operation of the moisture permeability measuring device 以下 will be described below. Before measuring the moisture permeability of the film F, the following is determined. [Preparation step. " The film F as the object to be measured is provided between the flange portion 9b of the i-th cavity portion 9 and the flange portion 丨〇b of the second cavity portion ,, and the moisture permeability measurement is broken. The temperature of 1 is kept constant. In this state, the dry gas flows through the second chamber. 4. The ninth valve 29, the fourth valve 25, and the second valve 24 are sequentially opened, and the raw material gas is passed through the _ source 15 through the piping. 6 and supplied to the purification/heater 2 (), dried by purifying the heat exchanger %, removing impurities and heating to generate a dry gas, and the dry gas is combined to pass through the pipe 22 and the dew point meter 8 to guide the second chamber M. "The second drying gas is discharged through the piping 28. At the same time as the dry gas circulates, the humidified gas will flow through the third 丨9 and sequentially open. 'The raw material gas will be ventilated by the gas source; the viscous gas is supplied to the humidifier 17 by means of the humidifier 17 And humidification produces a humidified gas. The humidified gas is introduced into the first through the pipe 8], and the 13th humidified gas is introduced and discharged through the pipe 26. to. In order to make the moisture permeability measuring device (4), the water vapor present in the measurement space is phased in this state (4). This = material s. Further, with the distribution f 22 on the upstream side of the two chambers 14, the water vapor discharged from the core 14 does not adhere to the dew point meter 8. Further, the film F was humidified (aqueous) by the circulation of humidification = 12/20 201142268. After a certain period of time has elapsed, the moisture permeability measurement of the film F is started. The first valve 24 and the second valve 29 are sequentially closed, and the flow of the dry gas is stopped. In order to directly supply water vapor to the first chamber]3, a humidified gas is supplied. Flow adjustment, gas temperature or humidity adjustment can also be implemented here. A part of the water vapor of the humidified gas introduced into the first chamber 13 passes through the thin film F of the object to be measured and reaches the measurement space. The permeated water vapor diffuses into the measurement space and is measured by a dew point meter 8. The moisture permeability (g/m2/day) can be obtained from the dew point temperature measured by the dew point meter 8, the area of the film F, and the measurement elapsed time. Specifically, the dew point temperature was converted to the water partial pressure using the son-ntag formula (refer to JISZ-8806) shown in the following [Number 1]. [Number 1] ^°§οοοhhh ~ 24.738 —

2900TDP -4.65 log 在[數1 ]的鼻式中’ Ρη2〇為水分壓(Pa)、Τ〇ρ為露點溫度 (K)。 接下來使用以下[數2]所示的算式’將藉由[數1]的算式 求得的水分壓轉換為水分重量。此處以水蒸氣為理想氣體 的方式作近似。 [數2] 13/20 201142268 w- PH2〇VRTgas ^Mw h20 在[數2]的算式中,W為水分重量(g)、v為第2室14 之體積(n?)、R為氣體常數(8.3丨4(.丨K./in〇|))、Tgas為氣體溫 度(丨〈)、Mwm2〇為水的分子量(丨8.02(g/mol))。 接下來使用以下丨數3丨所示的算式,將[數2]的算式所得 到之水分重蛩以測定時間及薄膜丨:的面積加以規格化,求 得透濕度。 [數3] WVTR = A^dt ^數算式中,WVTR為透濕度(g/n 艇F的面積(m2)。 — 上:二所!般,可由露點溫度求得透濕度。此處,如 轉備階段會將_ f加^因此 在測疋時不需要浸潤測定f ”、、 口此 至藉由水蒸氣量測定器==:::可縮短測定開始 定準備階段中,由第2室丨間。另外,在測 計8,因此可排除這4b ^^„不會附著於露點 -“&gt;乳對於測定值造成的影響,而能 14/20 201142268 夠以高精密度測定透濕度。. (弟2貫施形態) 圖3表示關於第2實施形態之透濕度測定裝f 1〇〇概 略構成的示意圖。另外,在第2實施形態中,在具有與第1 實施形態同樣構成之處採用相同符號,並省略說明。 如圖3所示般’在透濕度測定裝置1〇〇中露點付8的 位置不同’而配置於乾燥氣體排出路徑7上。另外隨著如 此’第4閥25亦配置於乾燥氣體排出路徑7上的肢體2與 露點計8之間。 透濕度測定裳置_之運作亦與透濕度測定裝置1相 同。 '、細而&amp;,在第1腔體部9的凸緣部9b與第2腔體部 的凸、彖°卩1Qb之間’ ^置有作為測定對#、#;的薄膜F, 使透濕度測定裝置】00的溫度保持一定。 …在此狀〜'下乾燥氣體流通於第2室μ。第2閥29、 ^ 4閥25及第1閥24依序打開,原料氣體由氣體源15通 過=,]6而供給至純化/加熱器2Q,藉由純化/加熱器 ^ 22 ^ =及力°熱’產生乾燥氣體。乾燥氣體通過配 二 十8而導入第2室】4。導入第2室Η的乾焊 氣肢,會通過配管28而排出。 ’、 乾無氣體流通的同時,加濕氣體流通於第1室13。第 5 =閥27及第3閥19依序打開,原料氣體由氣體源15通 义配官16供給至加濕器17,藉由加濕器17而加濕,產生 加,氣體。加濕氣體通過配管18而導入第!室13。導入第 1室13的加濕氣體通過配管26而排出。 透濕度測定裝置1會保持在此狀態特定的時間。藉由 15/20 201142268 乾燥氣體的流通,可除去存在於测定空間的水蒸氣。, 籍由加濕氣體的流通而加濕薄膜「。 之 特定時間經過後,開始龍F的透濕度測定 24及第2閥29依序丨_ ’乾燥氣體的流通停止。^ 對第^室:丨3供給水蒸氣而流通加濕氣體。此處亦_ = 量的調整、氣體溫度或濕度的調整。 3' …與第U施形態同樣地’可由以露點計&quot;得的露點 溫度、溥m丨:㈤面積、與測定經過時間,得到请濕产 (g/n—y)。如上述所述般,由於在測定準備階段“= 加濕旧此在測定時不需要浸制定對象物的相,可縮 短測定開始至藉由水蒸氣量測定器偵測到水蒸氣: [實施例] 以下針對實施例作說明。 使用關於上述第1實施形態之透濕度測定裝置.丨,測定 試樣(鸿膜F)的透濕度。第2室丨4的體積(數2中的7)為8 % xl〇 m。以 A|2〇3/PU(Polyurethane)/pET(p〇|yethy|ene2900TDP -4.65 log In the nose of [1], Ρη2〇 is the partial pressure (Pa) and Τ〇ρ is the dew point temperature (K). Next, the water partial pressure obtained by the formula of [number 1] is converted into the moisture weight using the formula [the following [2]. Here, the method in which water vapor is an ideal gas is approximated. [Number 2] 13/20 201142268 w- PH2〇VRTgas ^Mw h20 In the formula of [2], W is the moisture weight (g), v is the volume of the second chamber 14 (n?), and R is the gas constant. (8.3丨4 (.丨K./in〇|)), Tgas is the gas temperature (丨<), and Mwm2〇 is the molecular weight of water (丨8.02 (g/mol)). Next, using the formula shown in the following figure 3丨, the water obtained by the equation of [2] is re-calculated to measure the time and the area of the film 丨: to obtain the moisture permeability. [Number 3] WVTR = A^dt ^ In the formula, WVTR is the moisture permeability (g/n area of the boat F (m2). - Upper: two! Like the dew point temperature to obtain the moisture permeability. Here, In the transfer phase, _f will be added. Therefore, it is not necessary to infiltrate the measurement f ” during the test, and the flow can be shortened by the steam amount measuring device ==::: In addition, in the measurement 8, it can be ruled out that the 4b ^^„ does not adhere to the dew point-->&gt; the effect of the milk on the measured value, and the 14/20 201142268 can measure the moisture permeability with high precision. (2) FIG. 3 is a schematic view showing a schematic configuration of a moisture permeability measuring device f 1 第 according to the second embodiment. In the second embodiment, the configuration is the same as that of the first embodiment. The same reference numerals will be used, and the description will be omitted. As shown in Fig. 3, 'the position of the dew point measuring device 8 is different in the moisture permeability measuring device 1' is disposed on the dry gas discharge path 7. Further, the fourth valve 25 is provided. It is also disposed between the limb 2 on the dry gas discharge path 7 and the dew point meter 8. It is the same as the moisture permeability measuring device 1. ', thin and &lt;&gt; is disposed between the flange portion 9b of the first cavity portion 9 and the convex portion of the second cavity portion, 彖°卩1Qb. The film F of the #; is kept at a constant temperature of the moisture permeability measuring device 00. ... In this case, the lower drying gas flows through the second chamber μ. The second valve 29, the ^4 valve 25, and the first valve 24 are When the sequence is turned on, the material gas is supplied to the purification/heater 2Q by the gas source 15 through ???, and the dry gas is generated by the purification/heater ^ 22 ^ = and the force of the heat. The second chamber is introduced into the second chamber. 4. The dry welding gas limb introduced into the second chamber is discharged through the pipe 28. 'The dry gas flows and the humidified gas flows through the first chamber 13. 5. The fifth valve 27 and The third valve 19 is sequentially opened, and the material gas is supplied from the gas source 15 to the humidifier 17, and is humidified by the humidifier 17, and the gas is supplied. The humidified gas is introduced into the first through the pipe 18. Room 13. The humidified gas introduced into the first chamber 13 is discharged through the pipe 26. The moisture permeability measuring device 1 is kept at a specific time in this state. By 15/20 201142268 The flow of the dry gas removes the water vapor present in the measurement space. The film is humidified by the flow of the humidified gas. After the specific time has elapsed, the moisture permeability measurement 24 of the dragon F and the second valve 29 are sequentially performed.丨 _ 'The circulation of the dry gas is stopped. ^ The gas is supplied to the second chamber: 丨3, and the humidified gas is supplied. Here, _ = adjustment of the amount, adjustment of the gas temperature or humidity. 3' ... and the U-shaped form Similarly, the dew point temperature, 溥m丨: (five) area, and the elapsed time can be obtained from the dew point (g/n-y). As described above, in the measurement preparation stage "= humidification, it is not necessary to dip the phase of the object at the time of measurement, and the measurement can be shortened until the water vapor is detected by the water vapor amount measuring device: [Example The following is a description of the examples. The moisture permeability of the sample (Hum film F) was measured using the moisture permeability measuring device of the first embodiment described above. The volume of the second chamber 丨4 (7 of the number 2) is 8 % xl〇m. A|2〇3/PU(Polyurethane)/pET(p〇|yethy|ene

TereplUhalate)阻隔膜與A丨/Acry|/PET阻隔膜作為試樣。各 試樣的面積(數3中的A)為3.32x10 3m2。 將試樣設置於腔體2,將腔體2的溫度定為8(rc、各 配管的溫度定為5(TC。測定準備階段係將乾燥氣體導入第 2室Μ,並將加濕氣體導入第I室13。乾燥氣體定為4(rc 〇·ί(相對濕度)的氮氣,流量定為1L/min。加濕氣體定為 4〇°C9〇%RH的氮氣,流量定為5L/mh。保持在此狀態2〇 小時。 #另外,比較例係在測定準備階段中不使加濕氣體流通 於第丨室,而使乾燥氣體(4(rC0%RH的氮氣)以5L/min的 16/20 201142268 流量流通於第^室。與實施例同樣地,以的流 乾燥氣體(4(TC〇%RH之氮氣)流通於第2室。保持在此狀態 20小時。 “ 尸實施例1比較例所示的測定準備階段結束⑨,使乾燥 氣體的流通停止,並開始露點溫度的測定 、 〜 Μ 4及圖3,以 上述方式由測得的露點溫度算出透濕度的結果圖形。圖4 係將八丨2〇3/蕭:ΕΤ阻隔默為試樣,圖5係將Ai/Aeiyi/pET =缺為試樣。在該等圖式中,橫轴為·時間,㈣ 為錢氣穿透量(WVTR)。將實施例的心結果以實線表 口 =定結果以虛線表示。另外,氣體溫度(數 ㈣ r::二 快偵測到水蒸氣量。具體而言,在圖4夂二=較 〇觸day的透濕度早18分鐘測得。 度心 度小的試樣愈為有效。 U、、 會㈣上述實施形態侷限,可在不脫離本發 月要曰的乾圍内作變更。 、、晶去在上述實施形11中並不受限於藉由加濕氣體將薄膜加 ϋ濕。°例如’亦可設定為由腔體外直接對_供給水分而 【圖式簡單說明】 圖1表不關於第1實施形態之透濕度度測定裝置之概 略構成圖。 17/20 201142268 圓2表示相同透濕度测定裝置之腔體構成之剖面圖。 阔3表示關於第2實施形態之透濕度测定裝置之概略 構成圆。 )_ 4表示關於實施例及比較例之透濕度测定結果之圖 :。圖^表示關於實施例及比較例之透濕度剛定咭彳 【主要元件符號說明】 1 透濕度测定裝置 2 腔體 5 乾燥氣體導入路徑 7 乾燥氣體排出路徑 8 露點計 17加濕器 13第1室 14第2室 24第丨閥 29第2閥 18/20TereplUhalate) A barrier film and A丨/Acry|/PET barrier film were used as samples. The area of each sample (A in the number 3) was 3.32 x 10 3 m 2 . The sample was placed in the chamber 2, and the temperature of the chamber 2 was set to 8 (rc, and the temperature of each tube was set to 5 (TC. In the measurement preparation stage, the dry gas was introduced into the second chamber, and the humidified gas was introduced. Room I 13. The drying gas is set to 4 (rc 〇 · ί (relative humidity) nitrogen, the flow rate is set to 1 L / min. The humidified gas is set to 4 〇 ° C 9 〇 % RH of nitrogen, the flow rate is set to 5 L / mh In this state, the temperature is kept for 2 hours. # In addition, in the measurement preparation stage, the humidified gas is not circulated to the first chamber, and the dry gas (4 (rC0% RH nitrogen) is 5 L/min. /20 201142268 The flow rate flows through the chamber. In the same manner as in the example, the flow drying gas (4 (nitrogen of TC〇% RH) flows through the second chamber. This state is maintained for 20 hours." When the measurement preparation stage shown in the example is completed 9, the flow of the dry gas is stopped, and the measurement of the dew point temperature, Μ 4 and FIG. 3 are started, and the result of the moisture permeability is calculated from the measured dew point temperature as described above. The gossip 2〇3/xiao:ΕΤ block is silently sampled, and Figure 5 shows Ai/Aeiyi/pET = missing as a sample. In these figures, the horizontal axis is · Time, (4) is the amount of money penetration (WVTR). The heart result of the example is shown by the dotted line = the result is indicated by the dotted line. In addition, the gas temperature (number (4) r:: two quickly detected the amount of water vapor Specifically, in Figure 4夂2 = the moisture permeability of the day is measured 18 minutes earlier. The sample with a small degree of heart is more effective. U,, (4) The above embodiments are limited, without departing from the present In the above-mentioned embodiment 11, the crystal is not limited to being humidified by a humidifying gas. For example, 'there may be set directly from the outside of the cavity _ BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a schematic configuration diagram of a moisture permeability measuring apparatus according to a first embodiment. 17/20 201142268 A circle 2 is a cross-sectional view showing a cavity configuration of the same moisture permeability measuring device. 3 is a schematic configuration circle of the moisture permeability measuring device according to the second embodiment. Fig. 4 shows a measurement result of the moisture permeability measurement of the examples and the comparative examples. Fig. 2 shows the moisture permeability of the examples and the comparative examples.咭彳【Main component symbol description】 1 Translucent moisture measuring device 2 5 the drying gas introduction path 7 of the drying gas dew point meter discharge path 17 8 13 1 humidifier chamber 14 second chamber 24 of the second valve 29 valve Shu 18/20

Claims (1)

201142268 七 1. 、申請專利範圍: 一種透濕度測定裝置,其特徵為具備: 藉由測定對象物劃分成第】室與第2室之腔體; 具,第1閥,並連接於前述第2室 =氣體“前述第2室之乾燥氣體導人路徑; 閥,並雜於前述第2室,在前述第2閥打開時,由 =弟2室排出_燥氣體之峨體排出路徑; 以録給水蒸氣之水聽供給部; 間打開時將前述測定對象物加濕,在 :室供給時控制水蒸氣供給部以對前述第 在前述第〗閥及前述第2卩 述測定對象物而往前述^閉時,測定由前述第1室穿透前 空間的水蒸氣量之水Μ旦閱及前述第2閥關閉所形成的測定 2. 如申請專利範圍第lC 一 給部具有連接於前述第卜峨度剩定裝置,其中祕水蒸氣供 濕氣體導人路徑。m加酿體導人前述第1室之加 3. 如申請專利範圍第2項 測定器係配置於前述第】=度測定裝置,其中前述水蒸氣量 透濕度測定穿置。 ⑷興前述腔體之間的前述測定空間之 4 如申請專利範圍第3項之择— 測定器係露點計之透壤度測=剛定裝置,其中前述水蒸氣量 —種透濕度測定方法,复^置。 】室與第2室之腔體中Ί為:在藉由測定對象物劃分成第 將前述測定對象物加渴乾燥氣體流通於前述第2室,同時 述第1室供給水蒸氣,^使前述乾燥氣體的流通停止,對前 ' g由連接於前述第2室的水蒸氣量測定 |c)/2() 5, 201142268 為’ m由前述第i室穿透前述測定對象物而往前述第2室的 水恶氣量。 , 6·如申請專利範团第5項之透濕度測定方法,其係在將前述测定 對象物加濕的步驟中’使加濕氣體流通於前述第丨室之透濕度 測定裝览。 .如申蜻專利範圍第6項之透濕度測定方法,其中前述水蒸氣量 測定器係配罝於前述腔體之往前述乾燥氣艏的上游側之透濕 度測定裝1。 8·如申請專利範圍第7項之透濕度測定方法,其中前述水蒸氣量 冽定益係露點計之透濕度測定裝置。 20/20201142268 VII. Patent application scope: A moisture permeability measuring device comprising: a chamber into which a measurement object is divided into a first chamber and a second chamber; and a first valve connected to the second portion Room = gas "the drying gas guiding path of the second chamber; the valve is mixed with the second chamber, and when the second valve is opened, the body discharge path of the dry gas is discharged from the second chamber; The water supply portion of the water vapor is supplied to the supply unit; and the object to be measured is humidified when it is opened, and the steam supply unit is controlled to supply the object to be measured in the first valve and the second object to be described above during the supply of the chamber. ^ When closing, the measurement of the amount of water vapor from the space before the first chamber is measured and the measurement of the second valve is closed. 2. The scope of the patent application is the same as that of the first section. The temperature-maintaining device, wherein the secret water vapor-supplying gas guides the path. The m-addition of the brewing body leads to the addition of the first chamber. 3. The second measuring device of the patent application scope is disposed in the foregoing first degree measuring device. , wherein the aforementioned water vapor amount is measured by moisture permeability (4) The above-mentioned measurement space between the above-mentioned cavities is as determined in item 3 of the patent application scope - the permeability measurement of the dew point meter of the measuring system = the rigid setting device, wherein the amount of water vapor is determined by the moisture permeability In the cavity of the chamber and the second chamber, the measurement object is divided into the first measurement object, and the thirst dry gas is circulated in the second chamber, and the first chamber is supplied. The water vapor is used to stop the flow of the drying gas, and the amount of water vapor connected to the second chamber is measured by the amount of water vapor connected to the second chamber. |c)/2() 5, 201142268 is 'm. The moisture content of the water in the second chamber of the object. 6. The method for measuring the moisture permeability according to the fifth aspect of the patent application group, wherein the humidifying gas is circulated in the step of humidifying the object to be measured. The moisture permeability measuring method according to the sixth aspect of the invention, wherein the water vapor measuring device is disposed on the upstream side of the drying chamber to the drying chamber. Translucent moisture measurement device 1. 8 · If the scope of patent application The method of measuring moisture permeability of 7, wherein the amount of water vapor dew point meter based aroma of a given beneficial moisture permeability measuring apparatus. 20/20
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