201134298 六、發明說明： 【發明所屬之技術領域】 本發明係關於對有機電激發光用光罩掃描雷射光來進 行洗淨之有機電激發光用光罩洗淨方法、有機電激發光用 光罩洗淨裝置及有機電激發光顯示器之製造裝置。 【先前技術】 有機電激發光（Electro Luminescence)顯示器，係不 需要背光而被廣泛利用之低消耗電力•輕量薄型影像顯示 裝置。其構造上，係於透明性之玻璃基板上積層有機電激 發光薄膜層，有機電激發光薄膜層係採用以電洞注入層、 電洞輸送層、電子注入層、電子輸送層、以及陽極層與陰 極層夾持發光層之構造。發光層大多使用於玻璃基板上蒸 鍍有機材料來形成薄膜者，將構成顯示器之各像素區域進 行3分割並進行RGB之3色有機材料的蒸鍍。所以，爲 了於各像素之3個區域蒸鍍不同色之有機材料（有機色素 材料）’故使用使成著多數開口部之有機電激發光用光罩 (阻罩）來進行蒸鏟。使該有機電激發光用光罩以像素間 距份進行偏離來蒸鍍各色之有機材料，即完成發光層之蒸 鍍程序。 進行蒸鍍程序時，不但玻璃基板，有機材料也會附著 於有機電激發光用光罩。因爲有機電激發光用光罩並非只 使用於1次蒸鍍程序而是重複使用，進行下次蒸鍍程序時 ’若有機電激發光用光罩附著著有機材料，則附著於新玻 -5- 201134298 璃基板之有機材料會轉錄而造成污損。此外，有機材料也 會蒸鍍至形成於有機電激發光用光罩之多數開口部之邊緣 部分，而阻塞了開口部之部份、甚至於全部面積。開口部 之全部阻塞相較於部分阻塞，當然會造成較大之蒸鎪時傷 害（影或陰影），使用該有機電激發光用光罩時之蒸鍍精 度會顯著降低，此外，無法成爲耐用之物。所以，定期洗 淨有機電激發光用光罩（最好於完成1個蒸鍍程序後）， 來除去有機材料。 有機電激發光用光罩之洗淨，主要係實施利用溶解有 機物之洗淨液、或界面活性劑等之濕洗淨。濕洗淨係對有 機電激發光用光罩供應液體來進行洗淨》然而，被洗淨之 有機電激發光用光罩係精密級（10〜5a 程度）之極薄 金屬板，濕洗淨時，以液壓及促進洗淨爲目的之超音波與 加熱的作用，有時對有機電激發光用光罩會造成畸變及變 形等之較大傷害。此外，使用界面活性劑等藥液進行濕洗 淨時，因爲需要藥液供應機構及處理已使用過之藥液（排 液）的排液處理機構，而使機構複雜化，此外，也會有排 液所造成之環境污染問題。此外，近年來，有機電激發光 用光罩逐步大型化，此時，必須使用多量洗淨液，也使運 轉費用增大。 另一方面，未利用濕洗淨之洗淨，對有機電激發光用 光罩照射雷射光來進行洗淨（雷射洗淨）之相關技術如專 利文獻1所示。藉由對金屬素材之有機電激發光用光罩照 射雷射光，來使有機電激發光用光罩與有機材料之間產生 -6- 201134298 剝離力之作用。專利文獻1之技術，係利用該剝離力而從 有機電激發光用光罩除去有機材料來進行洗淨。其次，將 黏著性薄膜貼附於有機電激發光用光罩，使剝離之有機材 料轉錄至黏著薄膜來進行洗淨程序。 [專利文獻1] 日本特開2006-169573號公報 【發明內容】 專利文獻1所揭示之技術時’朝有機電激發光用光罩 (蒸鍍光罩）照射雷射光，啓發附著著有機材料（堆積物 )之面的運動’來實施有機材料之剝離。雷射光先入射至 有機材料之層’並透射該層再入射至有機電激發光用光罩 〇 有機電激發光用光罩因爲係重複使用，必須不會發生 畸變或反翹等變形。若有機電激發光用光罩受到傷害而產 生無法復原成原有狀態之程度的變形時，將無法利用該有 機電激發先用先罩來貫施正確的蒸鑛。所以，有機電激發 光用光罩無法再利用於下一蒸鍍程序。對有機電激發光用 光罩照射雷射光’於雷射光所照射之部位及其附近會產生 局部之溫度上昇。此時，溫度若極端上昇，就會產生使有 機電激發光用光罩2無法復原成原有狀態之傷害。 所以’本發明之目的’係利用雷射光來除去附著於有 機電激發光用光罩之有機材料時，不會產生有機電激發光 用光罩無法復原之傷害且得到高洗淨度。 爲了解決以上之課題，本發明之申請專利範圍第1項 201134298 之有機電激發光用光罩洗淨方法，係對附著著有機材料之 有機電激發光用光罩表面掃描雷射光來除去前述有機材料 之有機電激發光用光罩洗淨方法，其特徵爲，前述雷射光 透射前述有機材料而照射於前述有機電激發光用光罩時， 係照射使前述有機材料維持固態且前述有機電激發光用光 罩於照射後不會變形之雷射光。 依據該有機電激發光用光罩洗淨方法，即使照射透射 有機材料之雷射光，有機材料維持固態且有機電激發光用 光罩不會變形。藉此，實施雷射洗淨時，不會對有機電激 發光用光罩造成無法復原之傷害而得到高洗淨度。 本發明之申請專利範圍第2項之有機電激發光用光罩 洗淨方法，係申請專利範圍第1項所記載之有機電激發光 用光罩洗淨方法，其特徵爲，藉由照射前述雷射光，利用 前述有機材料與前述有機電激發光用光罩之溫度差所造成 的熱膨脹差來使層間產生剝離力之作用而除去前述有機材 料。 依據該有機電激發光用光罩洗淨方法，以照射雷射光 來使有機電激發光用光罩與有機材料之間產生熱膨脹差， 藉此’可以從有機電激發光用光罩剝離有機材料。 本發明之申請專利範圍第3項之有機電激發光用光罩 洗淨方法，係申請專利範圍第2項所記載之有機電激發光 用光罩洗淨方法，其特徵爲，前述雷射光之波長λ，係對 應前述有機材料與前述有機電激發光用光罩，從「4〇Onm S λ $ 1 200ηηι」當中，選擇可使前述有機材料維持固態且 201134298 前述有機電激發光用光罩於熱膨脹後可復原之波長。 依據該有機電激發光用光罩洗淨方法，係以上述方式 對應有機材料與有機電激發光用光罩來選擇雷射光之波長 。藉此，不會對有機電激發光用光罩造成無法復原之傷害 而得到高洗淨度。 本發明之申請專利範圍第4項之有機電激發光用光罩 洗淨方法，係申請專利範圍第3項所記載之有機電激發光 用光罩洗淨方法，其特徵爲，前述雷射光係採用脈衝雷射 〇 依據該有機電激發光用光罩洗淨方法，利用脈衝雷射 ’可以集中1次照射時之雷射光能量而得到高剝離效果。 而且，因爲係間歇性的改變點來照射雷射光，故可迴避有 機材料之流動化及對有機電激發光用光罩之傷害的問題。 本發明之申請專利範圍第5項之有機電激發光用光罩 洗淨方法’係申請專利範圍第4項所記載之有機電激發光 用光罩洗淨方法，其特徵爲，前述脈衝雷射之1次照射時 間係控制於可使前述有機材料維持固態且前述有機電激發 光用光罩於熱膨脹後可復原。 依據該有機電激發光用光罩洗淨方法，藉由控制照射 脈衝雷射時之1次照射時間，有機材料不會失去固態性且 可剝離有機材料。 本發明之申請專利範圍第6項之有機電激發光用光罩 洗淨方法’係申請專利範圍第丨至5項之其中任一項所記 載之有機電激發光用光罩洗淨方法，其特徵爲，控制前述 -9 - 201134298 雷射光照射前述有機電激發光用光罩時所形成之光點的點 徑。 依據該有機電激發光用光罩洗淨方法’可以調整形成 於有機電激發光用光罩之雷射光的點徑°藉由縮小點徑可 提高有機材料之除去效率’藉由放大點徑可提高洗淨效率 。所以，藉由調整點徑’可設定最佳除去效率與洗淨效率 0 本發明之申請專利範圍第7項之有機電激發光用光罩 洗淨裝置，係對附箸著有機材料之有機電激發光用光罩表 面掃描雷射光來除去前述有機材料之有機電激發光用光罩 洗淨裝置，其特徵爲，具備振動輸出雷射光之雷射光源， 前述雷射光，透射前述有機材料而照射於前述有機電激發 光用光罩時，係照射使前述有機材料維持固態且前述有機 電激發光用光罩於照射後不會變形之雷射光。 本發明之申請專利範圍第8項之有機電激發光用光罩 洗淨裝置’係申請專利範圍第7項所記載之有機電激發光 用光罩洗淨裝置’其特徵爲’藉由前述雷射光源振動輸出 雷射光，利用前述有機材料與前述有櫸電激發光用光罩之 溫度差所造成的熱膨脹差來使層間產生剝離力之作用而除 去前述有機材料。 本發明之申請專利範圍第9項之有機電激發光用光罩 洗淨裝置’係申請專利範圍第8項所記載之有機電激發光 用光罩洗淨裝置’其特徵爲，前述雷射光源振動輸出之前 述雷射光之波長λ ’係對應前述有機材料與前述有機電激 -10- 201134298 發光用光罩，從「400nmS λ S 1200nm」當中， 前述有機材料維持固態且前述有機電激發光用光 脹後可復原之波長。 本發明之申請專利範圍第1 0項之有機電激 罩洗淨裝置，係申請專利範圍第9項所記載之有 光用光罩洗淨裝置，其特徵爲，具備振動輸出之 的複數前述雷射光源，對應前述有機材料與前述 發光用光罩，從前述雷射光源當中，使用具有使 材料維持固態且前述有機電激發光用光罩於熱膨 原之波長的雷射光源來振動輸出前述雷射光。 本發明之申請專利範圍第1 1項之有機電激 罩洗淨裝置’係申請專利範圍第9項所記載之有 光用光罩洗淨裝置，其特徵爲，前述雷射光源係 脈衝雷射。 本發明之申請專利範圍第1 2項之有機電激 罩洗淨裝置’係申請專利範圍第1 1項所記載之 發光用光罩洗淨裝置，其特徵爲，前述雷射光源 述脈衝雷射之1次照射時間控制於可使前述有機 固態且前述有機電激發光用光罩於熱膨脹後可復 本發明之申請專利範圍第1 3項之有機電激 罩洗淨裝置，係申請專利範圍第1 2項所記載之 發光用光罩洗淨裝置’其特徵爲，具備用以進行 光之集光的集光手段、與用以改變前述雷射光之 的焦點位置變化手段。 選擇可使 罩於熱膨 發光用光 機電激發 波長不同 有機電激 前述有機 脹後可復 發光用光 機電激發 振動輸出 發光用光 有機電激 ，係將前 材料維持 原。 發光用光 有機電激 前述雷射 焦點位置 -11 - 201134298 本發明之申請專利範圍第14項之有機電激發光顯示 器之製造裝置，其特徵爲，具備申請專利範圍第7至13 項之其中任一項所記載之有機電激發光用光罩洗淨裝置。 本發明，對有機電激發光用光罩照射雷射光來除去有 機材料時’因爲雷射光透射時有機材料維持固態，故可確 實剝離有機材料而得到高洗淨度。其次，因爲使雷射光具 有對有機電激發光用光罩照射雷射光而於熱膨脹後可復原 成原有狀態之條件，有機電激發光用光罩可以再利用。 【實施方式】 以下’參照圖式，針對本發明之實施形態進行說明。 第1圖中，本發明之有機電激發光用光罩洗淨裝置（利用 雷射光對有機電激發光用光罩表面進行雷射洗淨之裝置） ’係具備基座1與有機電激發光用光罩2與光罩保持構件 3與雷射掃描手段4之槪略構成。基座1係以裝設有機電 激發光用光罩洗淨裝置之各要素爲目的之基台。此外，第 1圖中，X方向與Y方向係於水平面上之相互垂直相交的 2方向’Z方向係垂直方向。其次，z方向之箭頭所示方 向係上方，相反側係下方。所以，重力係朝箭頭之相反方 向作用。 有機電激發光用光罩2係利用有機電激發光用光罩洗 淨裝置進行洗淨之被洗淨體。如第2圖所示，有機電激發 光用光罩2’係對構成有機電激發光顯示器之玻璃基板2〇 蒸鍍有機材料做爲發光層而形成圖案爲目的所使用之極薄 -12- 201134298 金屬板。爲了於玻璃基板20以高精度蒸鍍有機材料，故 有機電激發光用光罩2係使用厚度爲1〇〜50jam程度之極 薄金屬板。其次’隨著有機電激發光顯示器之大型化，有 機電激發光用光罩2之尺寸亦更爲大型，所以，有機電激 發光用光罩2係極薄且大型之金屬板。 有機電激發光用光罩2具有光罩本體21，於該光罩本 體21形成者規則配列之多數微小開口部（3〇Mmx80ym 程度）22的光罩金屬板（阻罩）。有機電激發光用光罩2 之素材可以使用各種金屬’然而，例如，使用鎳系之合金 (鎳鋼）或42合金等。有機電激發光用光罩2，係於蒸鍍 發光層之有機材料之未圖示的真空蒸鍍槽內密貼於玻璃基 板20之狀態下，從蒸鍍源蒸鍍有機材料。 發光層之有機材料可以使用各種物品，例如，可以使 用Alq3、Ir(ppy)3、a -NPD等任意有機材料。從蒸鍍源蒸 發之有機材料’從有機電激發光用光罩2之微小開口部22 蒸鍍至玻璃基板2 0。藉此，於玻璃基板2 0之像素對應區 域蒸鍍有機材料做爲發光層而形成圖案。有機電激發光用 光罩2因爲係大型且極薄之金屬板，如第2圖所示，於其 周圍裝設著以使其具有體形性爲目的之補強框23。補強框 23可以爲金屬素材’也可以爲金屬以外之素材。 利用有機電激發光用光罩2實施1次蒸鍍程序時，不 但玻璃基板20，有機電激發光用光罩2也會附著有機材料 。因爲蒸鍍程序係重複實施，故以特定時序實施附著於有 機電激發光用光罩2之有機材料的洗淨。因爲配置著有機 -13- 201134298 電激發光用光罩洗淨裝置之洗淨槽與對玻璃基板20進行 蒸鍍之真空蒸鍍槽係個別單獨設置，使用有機電激發光用 光罩洗淨裝置時，需將有機電激發光用光罩2從真空蒸鍍 槽移至洗淨槽內。 如第1圖所示，有機電激發光用光罩2係保持豎立於 垂直方向之狀態（有機電激發光用光罩2之表面法線方向 爲水平面方向）。所以，光罩保持構件3具有與有機電激 發光用光罩2相同或稍大程度之尺寸，通常，以高精度進 行有機電激發光用光罩2與光罩保持構件3之位置對準， 並以熔接實施一體化。其次，蒸鍍時，則從玻璃基板20 之背面利用多數之磁鐵拖拉有機電激發光用光罩2而使有 機電激發光用光罩2均一地完全密貼來實施蒸鍍。亦有使 有機電激發光用光罩2保持平放狀態（有機電激發光用光 罩2之表面法線方向爲垂直方向）之形態。 以下，針對雷射掃描手段4進行說明。雷射掃描手段 4之槪略構成係具備雷射光源4 1、反射鏡電流計42、及電 流計驅動部43。雷射光源41係振動輸出雷射光L之光源 。此處，雷射光源4 1係振動輸出脈衝雷射。對雷射光源 4 1輸入時間幅寬極短之脈衝，而與該脈衝同步，間歇性的 振動輸出雷射光L。所以，調整脈衝之時間幅寬（脈衝寬 度），可以控制1次脈衝之雷射光L的照射時間。 雷射光源41係以朝Z方向下方照射雷射光L之方式 配置，於雷射光之入射位置配置著反射鏡電流計42。反射 鏡電流計42係使雷射光L進行掃描之反射鏡，藉由使鏡 -14- 201134298 進行高速之微小運動，改變雷射光L之照射方向。藉此， 使雷射光L掃描有機電激發光用光罩2。雷射光L之掃描 係針對有機電激發光用光罩2之特定區域（洗淨區域）來 實施。該洗淨區域可以設定成有機電激發光用光罩2全面 ，也可設定成部分之區域。無論何者，洗淨區域爲面，爲 了進行面之洗淨，雷射光L掃描X方向而形成1條掃描線 ，使該掃描線於Z方向進行微小位移，來實施面之洗淨。 此外，反射鏡電流計42裝設著電流計驅動部43，該電流 計驅動部43驅動反射鏡電流計42。 於雷射光源4 1與反射鏡電流計42之間，配置著做爲 集光手段之集光透鏡44。從雷射光源41振動輸出之雷射 光L係平行光，爲了形成該雷射光L之焦點，將集光透鏡 44配置於雷射光L之光路上。集光透鏡44裝設著當做焦 點位置調整手段使用之透鏡位置調整構件4 5。該透鏡位置 調整構件45係以使集光透鏡44沿著雷射光L之光路移動 (Z方向移動）爲目的之構件。藉此，可改變集光透鏡 之位置而改變焦點位置（可散焦）。此外，集光透鏡44 及透鏡位置調整構件45，只要集光透鏡44位於雷射光L 之光路上可以配置於任意位置。 其次，針對搬運空氣流形成手段6進行說明。搬運空 氣流形成手段6之槪略構成，係具備送風部6 1與吸風部 62。送風部61係裝設於在Y方向延伸之2支支柱所構成 的送風支撐部63，吸風部62係裝設於同樣在Y方向延伸 之2支支柱所構成的吸風支撐部6 4。此外’送風支撐部 -15- 201134298 63與吸風支撐部64分別裝設於基座1。吸風部62配設有 回收部65’所吸引之游離物質由回收部65進行回收。 送風部6 1 ’形成有縫隙長度較長、縫隙寬度較小之送 風縫隙6 1 S。同樣地，吸風部6 2，亦形成有縫隙長度較長 、縫隙寬度較小之吸風縫隙62S。送風縫隙6 1 S與吸風縫 隙62S係相對地形成於γ方向之相同位置，而且，形成於 離開有機電激發光用光罩2表面之位置。從送風縫隙61S 朝下方實施空氣之送風，吸風縫隙62S則吸引上方之空氣 ’故於送風部61與吸風部62之間形成空氣流。該空氣流 即爲搬運空氣流。此外，藉由於送風部61及吸風部62配 設縫隙來形成搬運空氣流’然而，亦可採用縫隙以外之機 構。 以下’針對光罩移動手段7進行說明。光罩移動手段 7係用以移動有機電激發光用光罩2之移動手段，大致由 移動台71所構成。移動台71係以使光罩保持構件3竪立 於垂直方向之狀態進行固定裝設並移動爲目的之台。移動 台7 1，例如’可以採用滾珠螺桿手段、線性馬達手段、或 自動操控手段等。藉由移動台71之移動，使有機電激發 光用光罩2以竪立於垂直方向之狀態進行移動。移動台71 係於X方向移動爲例，然而，亦可以爲於γ方向、Z方向 移動。 其次’針對動作進行說明。最初，於真空蒸鍍槽，利 用有機電激發光用光罩2將蒸鑛材料蒸鍍於玻璃基板20 後’將有機電激發光用光罩2搬入配置於洗淨槽內之有機 -16- 201134298 電激發光用光罩洗淨裝置。搬入時，有機電激發光用光罩 2係抵接於光罩保持構件3之狀態，且保持豎立於垂直方 向之狀態。於該狀態下’利用移動台7 1於X方向使有機 電激發光用光罩2移動至搬運空氣流形成手段6之位置並 停止於該位置。 其次，於有機電激發光用光罩2停止之狀態，開始洗 淨。該洗淨（雷射洗淨）係藉由朝有機電激發光用光罩2 掃描雷射光L·來實施。雷射光源41振動輸出之雷射光L ’經由集光透鏡44而成爲聚焦光後，被反射鏡電流計42 反射並照射至有機電激發光用光罩2。有機電激發光用光 罩2係以附著著有機材料之面（表面）朝向雷射光照射方 向之方式配置，被反射鏡電流計42反射之雷射光照射於 有機電激發光用光罩2。 如第3(a)圖所示，有機電激發光用光罩2表面附著 著膜狀之固態有機材料51，雷射光L透射該有機材料51 而照射於有機電激發光用光罩2。雷射光L經由集光透鏡 44而成爲聚焦光’於有機電激發光用光罩2表面（或其附 近）形成焦點。於有機電激發光用光罩2表面（或其附近 )形成焦點之雷射光L爲有機電激發光用光罩2所吸收。 所以’形成於有機電激發光用光罩2之雷射光L的點 徑爲極微小之區域（例如，圓形區域），雷射光L被該區 域所吸收。有機電激發光用光罩2係金屬素材，藉由雷射 光L被吸收而產生熱能之作用，吸收之部位（前述區域及 其附近）於瞬間內出現溫度上昇。而且，因爲雷射光L於 -17- 201134298 有機電激發光用光罩2表面附近形成焦點，只有厚度方向 之表層部（數^m)之極小一部分會出現溫度上昇。 有機電激發光用光罩2之溫度上昇部位，出現熱膨脹 。如前面所述’因爲雷射光L被極狹小之區域所吸收而能 集中熱能，故產生瞬間之溫度上昇，導致溫度上昇部位產 生劇烈熱膨脹。另一方面，雷射光L之熱能集中於極狹小 之區域’其他部位不會出現溫度上昇而維持其原來之形狀 。所以’如第3 ( b )圖所示’朝固態附著之有機材料5 i 產生熱膨脹。 如第3(a)圖所示’有機電激發光用光罩2層與有機 材料51層係積層構造。如後面所述，即使雷射光l透射 ，有機材料51亦維持固態。亦即，有機電激發光用光罩2 發生熱膨脹而於瞬間隆起，另一方面，有機材料51幾乎 未發生熱膨脹’而於層間產生剝離力之作用。此時，有機 電激發光用光罩2發生劇烈之熱膨脹而產生剝離力之作用 時’固態之有機材料51受到強力衝撃而破碎，有機材料 51變成粉體等之粒徑較小的游離物質而從有機電激發光用 光罩2朝遠離方向飛散。 飛散之游離物質因爲重力作用而朝Z方向下方落下。 其次’於飛散方向，有搬運空氣流形成手段6所形成之搬 運空氣流’在該搬運空氣流之協助下，游離物質被吸風部 62回收》藉此，飛散之游離物質不會再附著於有機電激發 光用光罩2’故不會有游離物質再附著而使洗淨度降低的 問題。 -18- 201134298 如上面所述，雷射光L係振動輸出之脈衝 ，因爲係利用反射鏡電流計42於1方向（X 方向）改變雷射光L照射位置來進行掃描，故 前述區域進行掃描。該掃描係於1方向實施而 描線，並藉由使掃描線於Z方向（垂直相交於 向）進行微小位移，來進行面之洗淨。此外， 未限制爲與對有機電激發光用光罩2照射雷射 成之光點相同的形狀，也可能爲較廣之區域。 此處，從雷射光源4 1振動輸出之雷射光 應符合2個條件。第1個條件就是，即使雷射 有機材料5 1仍維持固態，第2個條件就是， 射光L，有機電激發光用光罩2於熱膨脹後亦] 針對第1個條件進行說明。亦如第3 ( a ) 射光L透射有機材料5 1之層而照射於有機電 罩2。此時’雷射光l有時也會被有機材料: 機材料51，例如，使用Ir(ppy)3時，較短波 5 3 2nm以下）之雷射光[入射，雷射光L會 51吸收。其係Ir(ppy)3所具有之特定吸收光 該波長之雷射光的性質。 有機材料51相較於有機電激發光用光罩： 。所以，若雷射光L爲固態之有機材料5 1所 熱能作用’將從固態融解成流動體。有機電激 2發生熱膨脹而可使有機材料5丨剝離，係因 5 1維持固態’此時，於層間可產生剝離力之作 雷射。其次 方向：掃描 可連續地對 形成1條掃 X方向之方 目IJ述區域並 光L時所形 L的波長， 光L透射， 即使照射雷 叮復原。 圖所不，雷 激發光用光 ;1吸收。有 長（例如， 被有機材料 譜具有吸收 :’融點較低 吸收而產生 發光用光罩 爲有機材料 用。另一方 -19- 201134298 面’成爲流動體時，即使有機電激發光用光罩2發生熱膨 膜’於層間無法產生剝離力之作用，而無法除去有機材料 5 1 °此外’有機材料5 1吸收雷射光L而從固態軟化時， 也無法對有機材料51產生剝離力之作用。 所以’即使雷射光L透射，也必須使有機材料5 1維 持固態。所以’選擇符合該條件之雷射光L的波長。有機 材料51’因爲其材料之吸收光譜不同，故對應有機材料 51之種類’選擇可使有機材料維持固態之雷射光l的波 長。有機材料51之吸收光譜具有吸收短波長之雷射光、 不吸收長波長之雷射光的性質。所以，雷射光L不要選擇 極短波長而選擇例如波長1 〇64nm之雷射光，可以使有機 材料51剝離。無論如何，波長爲400nm以下時，因爲會 被有機材料5 1吸收而失去固態性，故雷射光L之下限値 設定成40〇nm 。 從雷射光源4 1振動輸出符合以上條件之雷射光L， 可以降低有機材料5 1之雷射光L吸收率。但是，無論使 用何種材料，吸收率不會完全降低至0%。所以，持續對 相同位置照射雷射光L，少許吸收若累積，可能使有機材 料5 1失去固態性。所以，雷射光源41振動輸出之雷射光 L採用脈衝雷射，並爲間歇性照射之雷射光L »而且，因 爲利用反射鏡電流計42進行掃描，每1次照射都會改變 照射位置。藉此，不會對相同位置連續照射雷射光L。 此時，調整脈衝寬度可控制1次照射時間，如上面之 說明。脈衝寬度過大，則對相同位置之照射時間較長，可 -20- 201134298 能使有機材料51失去固態性。另一方面，脈衝寬度過短 ’則對相同位置之照射時間較短，可能無法使有機電激發 光用光罩2產生可使有機材料51剝離之程度的熱膨脹。 所以’必須適度設定成有機材料5 i可維持固態且可剝離 有機材料5 1之必要脈衝寬度。 如以上所示，雷射光L幾乎不會被有機材料5丨吸收 ’而使有機材料5 1維持固態下入射至有機電激發光用光 罩。藉此’可使有機電激發光用光罩2與有機材料51之 間具有溫度差，而於層間產生剝離力之作用。所以，有機 材料51被從有機電激發光用光罩2剝離並除去。 其次’針對第2個條件進行說明。如上面所述，短波 長域之雷射光入射至有機材料5 1時，因爲吸收而融解並 從固態變成流動體（或軟體）。從該點而言，雷射光L之 波長應較長。但是，雷射光L之波長若過長，將對有機電 激發光用光罩2造成較大的傷害。其係因爲雷射光L之波 長愈長而愈接近紅外線之波長域，入射至有機電激發光用 光罩2時，產生作用之熱量愈大。 雷射光L之照射’使有機電激發光用光罩2之狹小區 域產生瞬間之溫度上昇而發生熱膨脹，然而，熱膨脹後， 必須再度復原成原有形狀。此時，若雷射光L使有機電激 發光用光罩2產生過度溫度上昇，則會保持變形狀態而無 法復原成原有狀態，極端之溫度上昇，甚至會導致有機電 激發光用光罩2的融解。 有機電激發光用光罩2融解時，即使只是產生無法復 -21 - 201134298 原之變形時，有機電激發光用光罩2就無法再利用。使用 有機電激發光用光罩2於玻璃基板20蒸鍍有機材料時， 要求極高之蒸鍍精度。所以，蒸鑛時，即使有機電激發光 用光罩2只產生少許變形時，則無法利用該有機電激發光 用光罩2進行下一蒸鍍程序。亦即，無法再利用。 所以，照射雷射光L使有機電激發光用光罩2產生熱 膨脹時’應照射於熱消除後可以復原成原有狀態之雷射光 L。所以’雷射光L之波長，應選擇熱膨脹後有機電激發 光用光罩2可復原之波長。藉此，照射雷射光l時，因爲 有機電激發光用光罩2可復原成原有形狀，故可以再利用 於下一蒸鍍程序。有機電激發光用光罩2可以使用各種金 屬材料，復原性會因所選擇之材料而有所不同。所以，若 爲復原性強之材料，可以使較長程度之波長的雷射光L， 若爲復原性弱之材料，則雷射光之波長應不要太長。亦即 ，對應有機電激發光用光罩2，選擇有機電激發光用光罩 2於熱膨脹後可復原之波長。但是，無論使用何種材料， 若照射波長超過1 200nm之雷射光L，將會對有機電激發 光用光罩2造成無法復原之傷害。所以，雷射光L之上限 値設定成1 200nm。 另一方面，雷射洗淨時，藉由雷射光L集中於有機電 激發光用光罩2之非常狹小區域，而產生可剝離有機材料 51程度之熱膨脹的溫度上昇。其次，因爲於狹小區域且只 有表層產生變化，故有機電激發光用光罩2不會變形。 如以上之說明所示，對有機電激發光用光罩2照射有 -22- 201134298 機材料51可維持固態且熱膨脹後可復原成原有狀態之雷 射光L’可以高洗淨度來實施雷射洗淨，而使有機電激發 光用光罩2可以再利用。第4圖，係有機材料5 1與雷射 光L之波長λ的關係。該圖中，振動輸出強度係剝離對象 之有機材料5 1的必要平均雷射光L之振動輸出強度（瓦 特），該振動輸出強度係對應各材料而爲一定。此外，雷 射光L之波長係以標準使用之5 3 2nm及1 〇64nm之2種波 長爲例。此外，圖中「de」係散焦量（單位爲毫米）。 如該圖所不’ Alq3時，λ爲532nm與1064nm之任一 ，皆可將有機材料51之Alq3剝離。其係因爲Alq3於波長 5 3 2nm之波長域，無法吸收雷射光[達到無法維持固態之 程度。 另一方面 ’ Ir(ppy)3 及 〇： -NPD 時，λ =l〇64nm 時可剝 離’然而’ λ··=532ηιη時無法剝離。其係因爲532nm之雷 射光L，Ir(PPy)3及α _NPD之吸收率較高，有機材料51 無法維持固態。因此’失去有機材料5 1之固態性而無法 剝離。 此處’回到第1圖’集光透鏡44利用透鏡位置調整 構件4 5而可於Z軸（光軸）方向移動。藉此，可以改變 雷射光L之焦點位置（可以散焦）。調整散焦量，可以調 整形成於有機電激發光用光罩2之雷射光L光點的點徑。 從剝離有機材料5 1之點而言，點徑應較小。因爲點 徑較小’可以使雷射光L之能量集中於作用區域，而可以 達到可剝離有機材料51之程度的熱膨脹。換言之，點徑 -23- 201134298 過大時，無法剝離有機材料51。另一方面，點徑較大時， 於短時間可完成雷射洗淨。亦即，因爲點徑較大，一次可 剝離較廣範圍之有機材料5 1，相對於該部分，可縮短雷射 洗淨所需要的時間。 基於以上之諸點’應藉由控制集光透鏡44及透鏡位 置調整構件45’而爲可剝離有機材料51之點徑且爲於短 時間可完成雷射洗淨之點徑。例如，應爲如第4圖所示之 散焦量（20mm )。 此外，使用集光透鏡44及透鏡位置調整構件44來改 變雷射光L之焦點位置（散焦），可以除去附著於微小開 口部22之側壁的有機材料51。針對此點，參照第6圖來 進行說明。微小開口部22係貫通於有機電激發光用光罩2 之厚度（10〜50/zm)方向之區域，於貫通區域形成著側 壁22W。該側壁22W亦會附著有機材料51。 此時，雷射光L爲平行光時，雷射光L無法照射到側 壁22W。側壁22W係平行於有機電激發光用光罩2表面 2S之法線方向，而雷射光L係從有機電激發光用光罩2 之法線方向入射的緣故。此外，雷射光L之焦點位置F與 有機電激發光用光罩2有第6圖之虛線所示之位置關係時 ，亦即，焦點位置F比有機電激發光用光罩2之背面2R 更朝雷射光源4 1之相反側偏離時，雷射光L無法照射到 側壁22W。 所以，雷射光L之焦點位置F係以從焦點位置比有機 電激發光用光罩2表面2S更朝雷射光源41側偏離之方式 -24- 201134298 來進行散焦。藉由此種散焦，雷射光L照射於微小開口部 22之側壁22 W。藉此，附著於側壁22W之有機材料5 1亦 會因爲熱膨脹差而剝離。所以，透鏡位置調整構件44係 以如上之散焦來調整集光透鏡44之位置。 此外，雷射光L不是脈衝雷射亦可。亦即，雷射光源 4 1，只要可振動輸出連續照射之雷射光L即可。但是，如 上面所述，持續對有機材料5 1之相同位置持續照射雷射 光L的話，即使採用幾乎不會吸收之波長的雷射光L，有 時有機材料5 1仍會融解。此外，連續照射時，因爲係對 有機電激發光用光罩2之相同位置以雷射光L進行持續加 熱之狀態，故可能對有機電激發光用光罩2造成傷害。所 以，應使用脈衝雷射進行間歇性照射，且每1次照射都改 變照射位置。 此外，第1圖時，係具備1台雷射光源41之例，然 而，亦可具備複數台之雷射光源41。第5圖係具備2台雷 射光源4〗A、4 1 B之例。雷射光源4 1 A與4 1 B係分別振動 輸出不同波長之雷射光L的光源，使用時，只切換至其中 —方來使用。所以，例如，雷射光源4 1 A與4 1 B係可於圖 中之X方向移動的構成，任一雷射光源朝向反射鏡電流計 42振動輸出雷射光。當然，亦可使用非移動雷射光源本身 而爲使從2個雷射光源振動輸出雷射光之光路合流之光學 元件（例如，反射鏡及半反射鏡等）。 藉此，可以除去複數種類之有機材料5 1。有機電激發 光用光罩2附著有以Alq3爲材料之有機材料51時，使用 -25- 201134298 振動輸出波長532nm雷射光L之雷射光源41A，而有機電 激發光用光罩2附著有以Ir(ppy)3或α-NPD爲材料之有 機材料51時，亦可使用振動輸出1 064nm波長之雷射光L 的雷射光源4 1 B。 此外，雷射光L照射於有機電激發光用光罩2時，有 機電激發光用光罩2因爲局部溫度上昇而產生熱膨脹，而 對有機材料51產生剝離力之作用，如前面所述。此時， 於有機材料51被剝離後，熱依然蓄積於有機電激發光用 光罩2，藉此，有機電激發光用光罩2維持於高溫狀態。 所以，有機電激發光用光罩2承受到應力而可能產生畸變 或反翹等變形。 所以，從有機電激發光用光罩2表面（附著有有機材 料5 1之面）之相反面側進行送風（以冷風爲佳），冷卻 蓄積之熱的溫度。藉此，可以降低有機電激發光用光罩2 之應力。 【圖式簡單說明】 第1圖係有機電激發光用光罩洗淨裝置之外觀圖。 第2圖係有機電激發光用光罩之側面圖及平面圖。 第3圖係照射雷射光時之剝離程序的說明圖。 第4圖係波長可否使有機材料維持固態之說明圖。 第5圖係具備2台雷射光源時之有機電激發光用光罩 洗淨裝置的外觀圖。 第6圖係有機電激發光用光罩之微小開口部之側壁附 -26- 201134298 著著有機材料之剝離的說明圖。 【主要元件符號說明】 2:有機電激發光用光罩 4 :雷射掃描手段 6 :搬運空氣流形成手段 7 ··光罩移動手段 41 :雷射光源 42 :反射鏡電流計 43 :電流計驅動部 44 :集光透鏡 45 :透鏡位置調整構件 5 1 :有機材料201134298 VI. Description of the invention: [Technical Field] The present invention relates to a method for cleaning a photomask for organic electroluminescence, which is obtained by scanning a laser beam with a photomask for organic electroluminescence. A device for manufacturing a photomask cleaning device and an organic electroluminescence display device for organic electroluminescence. [Prior Art] Organic Electroluminescence (Electro Luminescence) display, A low-power, low-power, light-weight image display device that is widely used without backlighting. Its structure, The organic electroluminescent thin film layer is laminated on a transparent glass substrate. The organic electroluminescent thin film layer is formed by a hole injection layer, Hole transport layer, Electron injection layer, Electron transport layer, And a structure in which the anode layer and the cathode layer sandwich the light-emitting layer. The luminescent layer is mostly used for vapor deposition of an organic material on a glass substrate to form a film. Each pixel region constituting the display is divided into three, and vapor deposition of three color organic materials of RGB is performed. and so, In order to vapor-deposit organic materials (organic pigment materials) of different colors in three regions of each pixel, a retort for performing an organic electroluminescence light ray mask (obstruction) having a large number of openings was used. The organic electroluminescence light is irradiated with the photomask by the distance between the pixels to evaporate the organic materials of the respective colors. That is, the evaporation process of the luminescent layer is completed. When performing the evaporation process, Not only the glass substrate, Organic materials are also attached to the reticle for organic electroluminescent light. Because the reticle for organic electroluminescence is not used only in one vapor deposition process, it is reused. When the next evaporation process is performed ‘If the organic electroluminescence light is attached to the organic material by the photomask, Then the organic material attached to the new glass -5- 201134298 glass substrate will be transcribed and cause fouling. In addition, The organic material is also vapor-deposited to the edge portion of the majority of the opening formed in the photomask for the organic electroluminescence. Blocking the part of the opening, Even the entire area. All blocking of the opening is more than partial blocking, Of course, it will cause damage to the larger steaming (shadow or shadow). The vapor deposition accuracy when using the organic electroluminescence photomask is remarkably lowered. In addition, Can't be a durable thing. and so, Periodically clean the organic electro-optic illuminator (preferably after completing one evaporation process), To remove organic materials. Organic electroluminescence is washed with a photomask, Mainly to implement the use of a cleaning solution that dissolves organic matter, Or wet cleaning of surfactants, etc. The wet cleaning system washes the liquid with a photomask supplied with electromechanical excitation light. However, The reticle for the organic electroluminescence excitation is a very thin metal plate of a precision grade (10 to 5a). When wet, Ultrasonic and heating for the purpose of hydraulics and cleaning, Sometimes, the reticle for organic electroluminescence causes damage such as distortion and deformation. In addition, When using a liquid such as a surfactant to perform wet cleaning, Because of the need for a liquid supply mechanism and a liquid discharge treatment mechanism for treating the used liquid (discharge), And complicate the organization, In addition, There will also be environmental pollution problems caused by drainage. In addition, In recent years, Organic electric excitation light is gradually enlarged by a photomask, at this time, A large amount of cleaning solution must be used. It also increases the operating costs. on the other hand, Washed without wet cleaning, A technique for illuminating (laser cleaning) the organic electroluminescence light with a reticle to irradiate the laser light is shown in Patent Document 1. Irradiating the laser light with a photomask by organic electroluminescence of the metal material, In order to make the organic electroluminescence light between the mask and the organic material to produce a peeling force of -6-201134298. The technique of Patent Document 1, The organic material is removed from the organic electroluminescence photomask by the peeling force and washed. Secondly, Attaching an adhesive film to the reticle for organic electroluminescence, The stripped organic material is transcribed to the adhesive film to perform a washing procedure. [Patent Document 1] Japanese Laid-Open Patent Publication No. 2006-169573 [Invention] When the technique disclosed in Patent Document 1 is used, the laser beam is irradiated toward the organic electroluminescence light ray mask (vapor deposition mask). The peeling of the organic material is carried out by inspiring the movement of the surface of the organic material (stack). The laser light is first incident on the layer of the organic material and transmitted through the layer to the photomask for the organic electroluminescence. 〇 The photomask for the organic electroluminescence is re-used, Distortion such as distortion or warping must not occur. If the organic electroluminescence is damaged by the reticle and deformed to such an extent that it cannot be restored to its original state, It will not be possible to use the electromechanical excitation first hood to apply the correct smelting. and so, The organic electro-optic photomask can no longer be used in the next evaporation process. In the case where the organic electroluminescence light is irradiated with the reticle by the illuminating light, a local temperature rise occurs at a portion irradiated with the laser light and the vicinity thereof. at this time, If the temperature rises extremely, There is a risk that the electromechanical excitation light mask 2 cannot be restored to its original state. Therefore, the object of the present invention is to use laser light to remove an organic material attached to a photomask for electromechanical excitation light. No organic electroluminescence is generated. The mask is not recoverable and has a high degree of cleanliness. In order to solve the above problems, The method for cleaning the organic electroluminescence reticle of the invention according to the first application of the present invention, 201134298, A method for cleaning an organic electroluminescence reticle for removing the organic material by irradiating laser light onto the surface of the reticle with the organic electroluminescent light attached to the organic material, Its characteristic is that When the laser light is transmitted through the organic material and irradiated to the photomask for organic electroluminescence, It is irradiated with laser light which maintains the above-mentioned organic material in a solid state and the above-mentioned organic electroluminescence light ray mask is not deformed after irradiation. According to the method of cleaning the organic electroluminescent light with a photomask, Even if the laser light that transmits the organic material is irradiated, The organic material remains solid and the organic electroluminescent light is not deformed by the photomask. With this, When performing laser cleaning, It does not cause irreparable damage to the organic electro-optic reticle and is highly cleaned. A method for cleaning a photomask for organic electroluminescence according to item 2 of the patent application of the present invention, The method of cleaning the organic electroluminescence using the photomask described in the first paragraph of the patent application, Its characteristic is that By illuminating the aforementioned laser light, The organic material is removed by the difference in thermal expansion caused by the temperature difference between the organic material and the photomask for the organic electroluminescence. According to the method for cleaning the organic electroluminescence light, Radiation light is used to cause a difference in thermal expansion between the organic electroluminescence excitation mask and the organic material. Thereby, the organic material can be peeled off from the organic electroluminescent light-emitting mask. A method for cleaning a photomask for organic electroluminescence according to item 3 of the patent application of the present invention, The method for cleaning the organic electroluminescence light used in the second application of the patent application scope, Its characteristic is that The wavelength λ of the aforementioned laser light, Corresponding to the foregoing organic material and the aforementioned photomask for organic electroluminescence, From "4〇Onm S λ $ 1 200ηηι", The wavelength at which the organic material can be maintained in a solid state and the photomask of the organic electroluminescence light described above can be recovered after thermal expansion is selected. According to the method of cleaning the organic electroluminescent light with a photomask, In the above manner, the wavelength of the laser light is selected corresponding to the organic material and the organic electroluminescent light reticle. With this, It does not cause irreparable damage to the organic electro-optic illuminator with a high degree of cleanliness. A method for cleaning a photomask for organic electroluminescence according to item 4 of the patent application of the present invention, The method for cleaning the organic electroluminescence light used in the third application of the patent application scope, Its characteristic is that The laser light system adopts a pulse laser 〇 according to the method for cleaning the organic electroluminescence light reticle, The pulsed laser can be used to concentrate the laser light energy at the time of one irradiation to obtain a high peeling effect. and, Because of the intermittent change point to illuminate the laser light, Therefore, it is possible to avoid the problem of fluidization of the organic material and damage to the organic electroluminescence photomask. The method for cleaning a photoreceptor for organic electroluminescence according to the fifth aspect of the invention of the present invention is the method for cleaning a photoreceptor for organic electroluminescence described in claim 4, Its characteristic is that The first irradiation time of the pulsed laser is controlled such that the organic material can be maintained in a solid state and the organic electroluminescence light can be restored by thermal expansion. According to the method of cleaning the organic electroluminescent light with a photomask, By controlling the exposure time of the irradiated pulse laser, Organic materials do not lose solidity and can be stripped of organic materials. The reticle cleaning method for organic electroluminescence according to claim 6 of the invention of claim 6 is a method for cleaning a reticle for organic electroluminescence, which is described in any one of claims 5 to 5, Its characteristic is that The spot diameter of the spot formed when the laser light is irradiated onto the reticle for the organic electroluminescence is controlled by the above-mentioned -9 - 201134298. According to the reticle cleaning method for the organic electroluminescence light, the spot diameter of the laser light formed in the reticle for the organic electroluminescence light can be adjusted. By reducing the spot diameter, the removal efficiency of the organic material can be improved by the magnification point diameter. Improve washing efficiency. and so, The optimum removal efficiency and the cleaning efficiency can be set by adjusting the spot diameter. 0 The reticle cleaning device for organic electroluminescence, according to claim 7 of the present invention, A reticle cleaning device for organic electroluminescence, which removes the organic material by scanning the laser light with the organic electroluminescence light of the organic material, and scanning the laser light with the reticle surface. Its characteristic is that a laser source with vibration output laser light, The aforementioned laser light, When the organic material is transmitted and irradiated to the photomask for organic electroluminescence, It is irradiated with laser light which maintains the above-mentioned organic material in a solid state and the above-mentioned organic electroluminescence light ray mask is not deformed after irradiation. The reticle cleaning device for organic electroluminescence according to claim 8 of the invention of claim 8 is characterized in that the reticle cleaning device for organic electroluminescence described in claim 7 is characterized in that The source light vibrates and outputs the laser light, The organic material is removed by the difference in thermal expansion caused by the temperature difference between the organic material and the photomask having the electroluminescence excitation light to cause a peeling force between the layers. The reticle cleaning apparatus for organic electroluminescence according to claim 9 of the invention of claim 9 is characterized in that: The wavelength λ ′ of the laser light before the laser light source is outputted corresponds to the organic material and the organic galvanic -10- 201134298 illuminating reticle. From "400nmS λ S 1200nm", The organic material maintains a solid state and the wavelength at which the organic electroluminescence light is swellable after recovery. An organic electric hood cleaning device according to claim 10 of the present invention, The photomask cleaning device described in item 9 of the patent application scope is Its characteristic is that a plurality of the aforementioned laser sources having a vibration output, Corresponding to the aforementioned organic material and the aforementioned light-emitting mask, From the aforementioned laser sources, The laser light is vibrated to output the laser light using a laser light source having a wavelength at which the material is maintained in a solid state and the organic electroluminescence light is irradiated to the thermal expansion. The organic electro-ceramic cover cleaning device according to claim 1 of the invention is the photomask cleaning device according to claim 9 of the patent application scope. Its characteristic is that The aforementioned laser source is a pulsed laser. The organic electro-ceramic cover cleaning device according to the first aspect of the invention is the light-emitting mask cleaning device described in claim 1 of the patent application, Its characteristic is that The first irradiation time of the laser light source of the laser light source is controlled by the organic electro-acoustic cover which can make the organic solid state and the organic electroluminescence light ray cover after thermal expansion, and can be re-invented in the invention. Net device, The illuminating reticle cleaning device described in claim 12 is characterized in that A light collecting means for collecting light by light, And means for changing the position of the focus to change the aforementioned laser light. The choice can be used to cover the thermal expansion of the illuminating light. The electromechanical excitation wavelength is different. The organic galvanic entangled illuminating light is electromechanical excitation vibration output illuminating light organic galvanic, Maintain the original material. Light-emitting light, organic electro-excitation, laser, focus position, -11 - 201134298, a manufacturing apparatus of an organic electroluminescence display device according to claim 14 of the present invention, Its characteristic is that The reticle cleaning apparatus for organic electroluminescence described in any one of claims 7 to 13 of the patent application. this invention, When the organic electroluminescence is irradiated with laser light to remove the organic material, the organic material remains solid because the laser light is transmitted. Therefore, the organic material can be peeled off to obtain a high degree of cleanliness. Secondly, Because the laser light has a condition that the organic electroluminescence light is irradiated with the laser light to restore the original state after thermal expansion, The organic electroluminescence reticle can be reused. [Embodiment] Hereinafter, reference is made to the drawings. Embodiments of the present invention will be described. In Figure 1, The photoreceptor cleaning device for organic electroluminescence according to the present invention (a device for performing laser cleaning on the surface of a photomask for organic electroluminescence using laser light) is provided with a susceptor 1 and a photomask 2 for organic electroluminescence The mask holding member 3 and the laser scanning means 4 are roughly configured. The susceptor 1 is a base for the purpose of mounting various elements of the electromechanical excitation light reticle cleaning device. In addition, In Figure 1, The X direction and the Y direction are perpendicular to each other in the horizontal direction, and the 2 direction 'Z direction is perpendicular to each other. Secondly, Above the direction indicated by the arrow in the z direction, The opposite side is below. and so, The gravity system acts in the opposite direction of the arrow. The organic electroluminescence photoreceptor 2 is a cleaned body that is cleaned by a photomask cleaning apparatus using organic electroluminescence. As shown in Figure 2, The organic electroluminescence photoreceptor 2' is an extremely thin -12-201134298 metal plate used for the purpose of forming a pattern on a glass substrate 2 constituting an organic electroluminescence display. In order to evaporate the organic material with high precision for the glass substrate 20, Therefore, the photomask 2 for organic electroluminescence is an extremely thin metal plate having a thickness of about 1 〇 to 50 mm. Secondly, with the enlargement of organic electroluminescent display, The size of the photomask 2 with electromechanical excitation light is also larger. and so, The organic electroluminescence photomask 2 is an extremely thin and large metal plate. The organic electric excitation light reticle 2 has a reticle body 21, A mask metal plate (barrier) of a plurality of minute openings (3 〇 Mm x 80 ym) 22 regularly arranged in the reticle body 21 is formed. The material for the organic electroluminescence photomask 2 can use various metals' However, E.g, A nickel-based alloy (nickel steel) or a 42 alloy is used. Organic electric excitation light mask 2, It is in a state in which it is adhered to the glass substrate 20 in a vacuum vapor deposition tank (not shown) of an organic material in which the light-emitting layer is vapor-deposited. The organic material is evaporated from the evaporation source. Various materials can be used for the organic material of the luminescent layer. E.g, Alq3 can be used, Ir(ppy)3, a - NPD and other organic materials. The organic material evaporated from the vapor deposition source is vapor-deposited from the minute opening portion 22 of the organic electroluminescence photoreceptor 2 to the glass substrate 20. With this, An organic material is vapor-deposited in the corresponding region of the pixel of the glass substrate 20 as a light-emitting layer to form a pattern. For organic electroluminescence, the photomask 2 is a large and extremely thin metal plate. As shown in Figure 2, A reinforcing frame 23 for the purpose of making body shape is installed around the periphery. The reinforcing frame 23 may be a metal material or a material other than metal. When the vapor deposition process is performed by the photomask 2 using the organic electroluminescence, Not only the glass substrate 20, The organic electric excitation photomask 2 also adheres to organic materials. Because the evaporation process is repeated, Therefore, the organic material attached to the photomask 2 having electromechanical excitation light is cleaned at a specific timing. Because the organic -13-201134298 electro-excitation photo-cleaning device cleaning chamber and the vacuum evaporation chamber for vapor-depositing the glass substrate 20 are separately provided, When using a photoreceptor to clean the device with an organic electroluminescence The organic electroluminescence light is moved from the vacuum evaporation tank to the cleaning tank by the mask 2. As shown in Figure 1, The organic electroluminescence excitation reticle 2 is kept in a vertical state (the surface normal direction of the organic electroluminescence excitation reticle 2 is in the horizontal direction). and so, The mask holding member 3 has the same size or a slightly larger size as the photomask 2 for organic electroluminescence. usually, Positioning the photomask 2 for organic electroluminescence with the mask holding member 3 with high precision, And integration by welding. Secondly, When evaporating, Then, the organic electroluminescence light-emitting mask 2 is pulled from the back surface of the glass substrate 20 by a plurality of magnets, and the electromechanical excitation light mask 2 is uniformly and completely adhered to the vapor deposition. There is also a mode in which the organic electroluminescence light-emitting mask 2 is kept in a flat state (the normal direction of the surface of the organic electroluminescence light-emitting mask 2 is a vertical direction). the following, The laser scanning means 4 will be described. The laser scanning means 4 has a laser light source 4 1 , Mirror galvanometer 42, And a current meter driving unit 43. The laser light source 41 is a light source that vibrates and outputs the laser light L. Here, The laser light source 4 1 is a vibration output pulse laser. For the laser source 4 1 input a pulse with a very short time width, And synchronized with the pulse, Intermittent vibration output laser light L. and so, Adjust the time width (pulse width) of the pulse, It is possible to control the irradiation time of the laser light L of one pulse. The laser light source 41 is disposed to illuminate the laser light L downward in the Z direction. A mirror ammeter 42 is disposed at an incident position of the laser light. The mirror galvanometer 42 is a mirror for scanning the laser light L, By making the mirror -14- 201134298 a small movement at high speed, Change the direction of illumination of the laser light L. With this, The laser light L is scanned by the laser light L for the organic electroluminescence excitation light. The scanning of the laser light L is performed on a specific region (washing region) of the organic electroluminescence photoreceptor 2. The cleaning area can be set to be comprehensive with the organic electric excitation light mask 2, It can also be set as a partial area. No matter what, Wash the area to the surface, In order to wash the face, The laser light L scans the X direction to form one scanning line. The scan line is slightly displaced in the Z direction. Let's wash the face. In addition, The mirror ammeter 42 is provided with an ammeter driving unit 43. The galvanometer driving unit 43 drives the mirror ammeter 42. Between the laser source 4 1 and the mirror ammeter 42 A collecting lens 44 as a collecting means is disposed. The laser light output from the laser source 41 is parallel light, In order to form the focus of the laser light L, The collecting lens 44 is disposed on the optical path of the laser light L. The collecting lens 44 is provided with a lens position adjusting member 45 which is used as a focal point position adjusting means. The lens position adjusting member 45 is a member for the purpose of moving the collecting lens 44 along the optical path of the laser light L (moving in the Z direction). With this, The position of the collecting lens can be changed to change the focus position (defocus). In addition, The collecting lens 44 and the lens position adjusting member 45, As long as the collecting lens 44 is located on the optical path of the laser light L, it can be disposed at any position. Secondly, The transport air flow forming means 6 will be described. The configuration of the air flow forming means 6 is carried out, The air blowing unit 61 and the air suction unit 62 are provided. The air blowing portion 61 is provided with an air blowing support portion 63 composed of two pillars extending in the Y direction. The suction portion 62 is provided with an air suction support portion 64 which is formed by two pillars extending in the Y direction. Further, the air supply supporting portion -15-201134298 63 and the suction support portion 64 are respectively attached to the susceptor 1. The suction unit 62 is provided with the free substance sucked by the recovery unit 65' and recovered by the recovery unit 65. The blower portion 6 1 ' is formed with a long slit length, The air gap 6 1 S with a small gap width. Similarly, Suction unit 6 2, Also formed a long gap length, The suction slit 62S having a small gap width. The blow gap 6 1 S is formed at the same position in the γ direction as the suction slit 62S. and, It is formed at a position away from the surface of the photomask 2 for organic electroluminescence. Air is blown downward from the air supply slit 61S, The suction slit 62S attracts the air above. Therefore, an air flow is formed between the blower portion 61 and the suction portion 62. This air flow is the flow of the air. In addition, The air flow portion is formed by the air blowing portion 61 and the air suction portion 62. However, It is also possible to use a mechanism other than the slit. Hereinafter, the mask moving means 7 will be described. The mask moving means 7 is a moving means for moving the organic electric excitation light mask 2, It is roughly constituted by the mobile station 71. The moving table 71 is a table for fixing and moving the mask holding member 3 in a vertical direction. Mobile station 7 1, For example, 'ball screw can be used, Linear motor means, Or automatic control means. By the movement of the mobile station 71, The organic electroluminescence light is moved by the photomask 2 in a state of being erected in the vertical direction. The mobile station 71 moves in the X direction as an example. however, Can also be in the gamma direction, Move in the Z direction. Next, explain the action. initial, In the vacuum evaporation tank, After the vapor-deposited material is vapor-deposited on the glass substrate 20 by the organic electroluminescence excitation mask 2, the organic electroluminescence excitation mask 2 is carried into the organic-16-201134298 electro-excitation light mask which is placed in the cleaning tank. Net device. When moving in, The organic electric excitation light reticle 2 is in contact with the reticle holding member 3, And keep it in a vertical position. In this state, the organic electroluminescence light reticle 2 is moved to the position where the air flow forming means 6 is transported in the X direction by the moving stage 71, and stops at this position. Secondly, In the state in which the organic electroluminescence excitation photomask 2 is stopped, Start washing. This cleaning (laser cleaning) is performed by scanning the laser light L with the photomask 2 for organic electroluminescence. After the laser light output from the laser light source 41 is output, the laser beam L ′ is focused by the collecting lens 44. It is reflected by the mirror ammeter 42 and is irradiated to the photomask 2 for organic electroluminescence. The organic electroluminescence light ray mask 2 is disposed such that the surface (surface) to which the organic material adheres is directed toward the laser light irradiation direction. The laser light reflected by the mirror ammeter 42 is irradiated to the photomask 2 for organic electroluminescence. As shown in Figure 3(a), A film-like solid organic material 51 is adhered to the surface of the photomask 2 for organic electroluminescence, The laser light L is transmitted through the organic material 51 to be irradiated to the organic electroluminescence light reticle 2. The laser light L becomes focused light via the collecting lens 44 to form a focus on the surface (or its vicinity) of the organic electroluminescent light ray mask 2. The laser light L that forms a focus on the surface (or its vicinity) of the photomask 2 for organic electroluminescence is absorbed by the photomask 2 for organic electroluminescence. Therefore, the spot diameter of the laser light L formed in the photomask 2 for organic electroluminescence is extremely small (for example, Round area), The laser light L is absorbed by this area. Organic electric excitation light with a mask 2 metal material, By the absorption of laser light L to generate thermal energy, The absorbed portion (the aforementioned region and its vicinity) has a temperature rise in an instant. and, Because the laser light L forms a focus near the surface of the photomask 2 of -17-201134298 organic electroluminescence, Only a very small portion of the surface portion (several ^m) in the thickness direction will rise in temperature. The temperature rise portion of the photomask 2 for the organic electroluminescence excitation light, Thermal expansion occurs. As mentioned above, because the laser light L is absorbed by the extremely narrow area, it can concentrate heat energy. Therefore, an instantaneous temperature rise occurs. This causes a sharp thermal expansion at the temperature rise. on the other hand, The thermal energy of the laser light L is concentrated in a very narrow area. Other parts do not have a temperature rise to maintain their original shape. Therefore, the organic material 5 i attached to the solid as shown in Fig. 3 (b) is thermally expanded. As shown in Fig. 3(a), the organic light-emitting mask 2 layer and the organic material 51 layer are laminated. As described later, Even if the laser light is transmitted, The organic material 51 also maintains a solid state. that is, The organic electroluminescence light is thermally expanded by the photomask 2 and bulges in an instant. on the other hand, The organic material 51 hardly undergoes thermal expansion, and acts as a peeling force between the layers. at this time, When the organic electroluminescence light is subjected to intense thermal expansion by the photomask 2 to cause a peeling force, the solid organic material 51 is crushed by strong smashing. The organic material 51 becomes a free substance having a small particle diameter such as a powder, and is scattered from the organic electroluminescence light-emitting mask 2 in a direction away from the light. The scattered free matter falls below the Z direction due to gravity. Secondly, in the direction of flying, The transport air flow formed by the transport air flow forming means 6 is assisted by the transport air flow, The free matter is recovered by the suction unit 62. The scattered free matter does not adhere to the organic electroluminescence photomask 2', so there is no problem that the free substance reattaches and the degree of cleaning is lowered. -18- 201134298 As mentioned above, Laser light L is the pulse of the vibration output, Since the mirror galvanometer 42 is used to change the irradiation position of the laser light L in the 1 direction (X direction), the scanning is performed. Therefore, the aforementioned area is scanned. The scanning is performed in one direction and drawn. And by making the scan lines slightly displaced in the Z direction (vertically intersecting the direction), To wash the face. In addition, It is not limited to the same shape as the light spot irradiated to the organic electroluminescence light ray mask 2, It may also be a wider area. Here, The laser light output from the laser source 4 1 vibration should meet two conditions. The first condition is that Even if the laser organic material 51 remains solid, The second condition is that Shooting light L, The first condition will be described after the thermal expansion of the organic electroluminescence photomask 2. Similarly, the third (a) light L is transmitted through the organic material 5 1 to be irradiated to the organic mask 2. At this time 'the laser light l is sometimes also organic material: Machine material 51, E.g, When using Ir(ppy)3, Laser light with a shorter wavelength of 5 3 2 nm or less [incident, The laser light L will absorb 51. It is a property of Ir (ppy) 3 which specifically absorbs light of this wavelength of laser light. The organic material 51 is compared to the organic electroluminescent light mask: . and so, If the laser light L is solid, the thermal energy of the organic material 51 will melt from the solid state into a fluid. The organic electric shock 2 is thermally expanded to peel off the organic material 5丨. Because the 5 1 maintains a solid state' at this time, A laser that produces a peeling force between the layers. Second direction: The scanning can continuously form a wavelength in the direction of the X-direction IJ and the wavelength L of the light L, Light L transmission, Even if the thunder is restored. The picture is not, Ray excitation light ; 1 absorption. Have a long (for example, Absorbed by the spectrum of organic materials: ‘The melting point is lower and absorbed. The luminescent mask is used for organic materials. The other side -19- 201134298 face when it becomes a fluid body, Even if the organic electroluminescence light is generated by the photomask 2, the thermal expansion film does not have a peeling force between the layers, It is impossible to remove the organic material. 5 1 ° Further, when the organic material 5 1 absorbs the laser light L and softens from the solid state, It is also impossible to produce a peeling force on the organic material 51. So, even if the laser light L is transmitted, It is also necessary to maintain the organic material 51 in a solid state. Therefore, 'the wavelength of the laser light L that meets this condition is selected. The organic material 51' differs in the absorption spectrum of its material. Therefore, the type of the corresponding organic material 51 is selected to maintain the wavelength of the solid laser light l which can be maintained by the organic material. The absorption spectrum of the organic material 51 has a laser beam that absorbs short wavelengths, Does not absorb the properties of long-wavelength laser light. and so, Laser light L should not be selected for extremely short wavelengths, for example, laser light with a wavelength of 1 〇 64 nm, The organic material 51 can be peeled off. anyway, When the wavelength is below 400 nm, Because it is absorbed by the organic material 51 and loses its solidity, Therefore, the lower limit 雷 of the laser light L is set to 40 〇 nm. The laser light output from the laser light source 4 1 meets the above conditions, The laser light absorption rate of the organic material 51 can be lowered. but, Regardless of the material used, The absorption rate will not be completely reduced to 0%. and so, Continuously illuminating the same position with the laser light L, If a little absorption, if accumulated, It is possible to lose the solidity of the organic material 51. and so, The laser light output from the laser source 41 is pulsed by a pulsed laser. And for the intermittent illumination of the laser light L » and, Because the mirror galvanometer 42 is used for scanning, The irradiation position is changed every time. With this, The laser light L is not continuously irradiated to the same position. at this time, Adjust the pulse width to control the exposure time. As explained above. The pulse width is too large, Then the irradiation time for the same position is longer. -20- 201134298 can make the organic material 51 lose its solid state. on the other hand, If the pulse width is too short, the irradiation time for the same position is shorter. It may not be possible to cause the organic electroluminescence light to be thermally expanded by the photomask 2 to such an extent that the organic material 51 can be peeled off. Therefore, it is necessary to appropriately set the necessary pulse width of the organic material 5 i to maintain the solid state and peel the organic material 51. As shown above, The laser light L is hardly absorbed by the organic material 5', and the organic material 51 is kept in the solid state and incident on the organic electroluminescence light ray. Thereby, the temperature difference between the organic electroluminescence photoreceptor mask 2 and the organic material 51 can be made. The effect of peeling force is generated between the layers. and so, The organic material 51 is peeled off from the organic electroluminescence photomask 2 and removed. Next, the second condition will be described. As mentioned above, When the short-wavelength long-field laser light is incident on the organic material 5 1 , It melts due to absorption and changes from a solid to a fluid (or soft body). From this point of view, The wavelength of the laser light L should be longer. but, If the wavelength of the laser light L is too long, The organic electroluminescence light will be greatly damaged by the reticle 2. It is because the longer the wavelength of the laser light L is, the closer it is to the wavelength range of the infrared light. When incident on the photomask 2 for organic electroluminescence, The greater the amount of heat that produces the effect. The irradiation of the laser light L causes the organic electroluminescence light to thermally expand due to an instantaneous temperature rise in the narrow cell region of the photomask 2. however, After thermal expansion, It must be restored to its original shape. at this time, If the laser light L causes an excessive temperature rise of the organic electroluminescent light-emitting mask 2, Will remain deformed and cannot be restored to its original state. Extreme temperature rises, It may even cause melting of the organic electroluminescence light reticle 2. When the organic electroluminescence light is melted by the photomask 2, Even if it only produces the original deformation of -21 - 201134298, The organic electroluminescence photomask 2 cannot be reused. When the organic material is vapor-deposited on the glass substrate 20 using the organic electroluminescence light-emitting mask 2, Extremely high vapor deposition accuracy is required. and so, When steaming, Even if the organic electroluminescence light is slightly deformed by the photomask 2, The organic electroluminescence light cannot be used to perform the next vapor deposition process using the photomask 2. that is, Can't reuse. and so, When the laser light L is irradiated to cause the organic electroluminescence light to thermally expand by the photomask 2, the laser light L which can be restored to the original state after being irradiated with heat is irradiated. So the wavelength of the laser light L, The wavelength at which the organic electroluminescent light can be recovered by the photomask 2 after thermal expansion should be selected. With this, When irradiating the laser light l, Because the organic electroluminescence light can be restored to its original shape by the photomask 2, Therefore, it can be reused in the next evaporation process. The organic electroluminescent light reticle 2 can use various metal materials. Resilience will vary depending on the material chosen. and so, If it is a resilient material, Longer wavelengths of laser light L, If it is a material with weak recovery, The wavelength of the laser light should not be too long. That is, Corresponding to the photomask 2 for organic electroluminescence, The wavelength at which the organic electroluminescent light reticle 2 can be recovered after thermal expansion is selected. but, Regardless of the material used, If the laser light L with a wavelength exceeding 1 200 nm is irradiated, The organic electroluminescence will be irreparably damaged by the reticle 2. and so, The upper limit of the laser light L is set to 1 200 nm. on the other hand, When the laser is washed, By the laser light L concentrated in a very narrow area of the organic electroluminescent light reticle 2, The temperature at which the thermal expansion of the strippable organic material 51 is increased is increased. Secondly, Because in a small area and only the surface changes, Therefore, the organic electric excitation light mask 2 does not deform. As shown in the above description, The organic electroluminescence excitation mask 2 is irradiated with the -22-201134298 machine material 51 to maintain the solid state and can be restored to the original state after the thermal expansion, and the laser light L' can be washed with a high degree of cleaning. The organic electroluminescent light reticle 2 can be reused. Figure 4, The relationship between the organic material 51 and the wavelength λ of the laser light L. In the figure, The vibration output intensity is the vibration output intensity (watt) of the necessary average laser light L of the organic material 5 1 to be peeled off, The vibration output intensity is constant for each material. In addition, The wavelength of the laser light L is exemplified by two wavelengths of 5 3 2 nm and 1 〇 64 nm which are used as standard. In addition, In the figure, "de" is the amount of defocus (in millimeters). If the figure is not 'Alq3, λ is either 532 nm or 1064 nm, Alq3 of the organic material 51 can be peeled off. It is because Alq3 is in the wavelength range of wavelength 5 3 2 nm. Unable to absorb laser light [to the extent that it is impossible to maintain the solid state. On the other hand ' Ir(ppy)3 and 〇: -NPD, When λ = l 〇 64 nm, it can be peeled off. However, λ·· = 532 ηηη cannot be peeled off. It is due to the luminescence L of 532 nm. Ir(PPy)3 and α_NPD have higher absorption rates, Organic material 51 cannot maintain a solid state. Therefore, the solid state of the organic material 51 is lost and cannot be peeled off. Here, the return to the first embodiment of the collecting lens 44 is movable in the Z-axis (optical axis) direction by the lens position adjusting member 45. With this, The focus position of the laser light L can be changed (can be defocused). Adjust the amount of defocus, The spot diameter of the laser light L spot formed in the organic electroluminescence light ray mask 2 can be adjusted. From the point of peeling off the organic material 5 1 The spot diameter should be small. Because the spot diameter is small, the energy of the laser light L can be concentrated in the active area. Thermal expansion to the extent that the organic material 51 can be peeled off can be achieved. In other words, Point diameter -23- 201134298 When it is too big, The organic material 51 cannot be peeled off. on the other hand, When the spot diameter is large, Laser cleaning can be done in a short time. that is, Because the spot diameter is large, Can peel a wide range of organic materials 5 1 at a time Relative to this part, Reduces the time required for laser cleaning. Based on the above points, the spot diameter of the peelable organic material 51 should be controlled by controlling the collecting lens 44 and the lens position adjusting member 45', and the spot diameter of the laser washing can be completed in a short time. E.g, It should be the defocus amount (20mm) as shown in Figure 4. In addition, The focus position (defocus) of the laser light L is changed using the collecting lens 44 and the lens position adjusting member 44, The organic material 51 attached to the side wall of the minute opening portion 22 can be removed. For this, This will be explained with reference to Fig. 6. The minute opening portion 22 penetrates the region in the thickness (10 to 50/zm) direction of the organic electroluminescence light-receiving mask 2, A side wall 22W is formed in the through region. The side wall 22W also adheres to the organic material 51. at this time, When the laser light L is parallel light, The laser light L cannot be irradiated to the side wall 22W. The side wall 22W is parallel to the normal direction of the surface 2S of the organic electroluminescent light reticle 2, The laser light L is incident from the normal direction of the organic electroluminescence light-emitting mask 2 . In addition, When the focal position F of the laser light L and the photomask 2 for organic electroluminescence have the positional relationship shown by the broken line in Fig. 6, that is, When the focus position F is more deviated from the opposite side of the laser light source 4 1 than the back surface 2R of the organic electroluminescence light ray mask 2, The laser light L cannot be irradiated to the side wall 22W. and so, The focus position F of the laser light L is defocused by the manner in which the focus position is shifted from the surface 2S of the organic electroluminescence light reticle 2 toward the laser light source 41 side -24 to 201134298. With this defocusing, The laser light L is incident on the side wall 22 W of the minute opening portion 22. With this, The organic material 51 attached to the side wall 22W is also peeled off due to the difference in thermal expansion. and so, The lens position adjusting member 44 adjusts the position of the collecting lens 44 with the above defocusing. In addition, The laser light L is not a pulsed laser. that is, Laser source 4 1, As long as it can vibrate and output the laser light L continuously irradiated. but, As mentioned above, If the laser beam L is continuously irradiated to the same position of the organic material 51, Even with laser light L of a wavelength that is hardly absorbed, Sometimes the organic material 5 1 will still melt. In addition, When continuously irradiated, Since the same position of the organic electroluminescence light ray mask 2 is continuously heated by the laser light L, Therefore, it is possible to cause damage to the organic electroluminescence excitation mask 2. and so, Pulsed lasers should be used for intermittent exposure. The irradiation position is changed every time the irradiation is performed. In addition, In the first picture, There is an example of a laser light source 41. However, A plurality of laser light sources 41 can also be provided. Figure 5 shows two laser sources 4 A, 4 1 B example. The laser light sources 4 1 A and 4 1 B respectively vibrate the light sources of the laser light L of different wavelengths, when using it, Just switch to it - use it. and so, E.g, The laser light sources 4 1 A and 4 1 B are configured to move in the X direction in the figure. Any of the laser sources oscillates the laser light toward the mirror galvanometer 42. of course, It is also possible to use an optical element in which the non-moving laser light source itself is combined to illuminate the optical path of the laser light from the two laser light sources (for example, Mirrors and half mirrors, etc.). With this, A plurality of types of organic materials 51 can be removed. When the organic light-emitting mask 2 is attached with the organic material 51 made of Alq3, Use -25- 201134298 to output a laser source 41A with a laser output wavelength of 532 nm laser light L, When the organic electroluminescence light ray mask 2 is attached with the organic material 51 made of Ir(ppy) 3 or α-NPD, It is also possible to use a laser light source 4 1 B that vibrates the laser light L of a wavelength of 1 064 nm. In addition, When the laser light L is irradiated to the photomask 2 for organic electroluminescence, The electromechanical excitation light mask 2 is thermally expanded due to a local temperature rise. And the effect of the peeling force on the organic material 51, As mentioned before. at this time, After the organic material 51 is peeled off, Heat is still accumulated in the photomask 2 for organic electroluminescence. With this, The organic electroluminescence light is maintained at a high temperature by the photomask 2. and so, The organic electroluminescence light is subjected to stress by the photomask 2, and may be deformed such as distortion or warpage. and so, The air is blown from the opposite side of the surface of the photomask 2 (the surface on which the organic material 51 is adhered) of the organic electroluminescence (preferably cold air), Cool the temperature of the accumulated heat. With this, The stress of the photomask 2 for organic electroluminescence can be lowered. [Simple description of the drawing] Fig. 1 is an external view of a mask cleaning device for organic electroluminescence. Fig. 2 is a side view and a plan view of a photomask for organic electroluminescence. Fig. 3 is an explanatory diagram of a peeling process when laser light is irradiated. Figure 4 is an explanatory diagram of whether the wavelength can maintain the solid state of the organic material. Fig. 5 is an external view of a reticle cleaning apparatus for organic electroluminescence when two laser light sources are provided. Fig. 6 is a side view of a small opening portion of a photomask for organic electroluminescence, -26-201134298 An illustration of peeling of an organic material. [Main component symbol description] 2: Photomask for organic electroluminescence 4 : Laser scanning means 6 : Handling air flow forming means 7 ··Photomask moving means 41 : Laser source 42 : Mirror ammeter 43 : Ammeter drive unit 44 : Light collecting lens 45 : Lens position adjusting member 5 1 : organic material