TW201120084A - Curable resin composition and cured products thereof - Google Patents

Curable resin composition and cured products thereof Download PDF

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Publication number
TW201120084A
TW201120084A TW099134553A TW99134553A TW201120084A TW 201120084 A TW201120084 A TW 201120084A TW 099134553 A TW099134553 A TW 099134553A TW 99134553 A TW99134553 A TW 99134553A TW 201120084 A TW201120084 A TW 201120084A
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Taiwan
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resin composition
acid
compound
hardening
curable resin
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TW099134553A
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Chinese (zh)
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TWI488880B (en
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Masataka Nakanishi
Chie Sasaki
Naofusa Miyagawa
Kenichi Kuboki
Yoshihiro Kawada
Shizuka Aoki
Zuikan Suzuki
Masato Yarita
Hiroo Koyanagi
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Nippon Kayaku Kk
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/20Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
    • C08G59/32Epoxy compounds containing three or more epoxy groups
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/29Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
    • H01L23/293Organic, e.g. plastic
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/40Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
    • C08G59/42Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/29Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Abstract

Provided is a curable resin composition which, after being heat-cured, does not suffer from depression and which exhibits excellent corrosive gas resistance and excellent optical characteristics such as discoloration resistance. Also provided are cured products of the curable resin composition. The curable resin composition is characterized by comprising an epoxy resin obtained by oxidizing an olefin compound represented by general formula (1), and either a curing agent which is reactive with the epoxy resin and/or a cure accelerator. In general formula (1), multiple R1s and R2 are each independently a hydrogen atom or C1-6 alkyl.

Description

201120084 六、發明說明: 【發明所屬之技術領域】 本發明係關於一種適用於電氣電子材料用途,尤其適 用於光半導體用途之硬化性樹脂組成物及硬化物。 【先前技術】 關於利用酸酐使環氧樹脂硬化之方法,迄今為止用於 各種絕緣材料、涛轉材料。尤其於需要光學特性之領域、 例如LED製品等領域,多使用環氧樹脂之酸酐硬化物。 自先前,廣泛使用耐熱性、透明性、機械特性之平衡 性優異之雙酚A型環氧樹脂所代表之縮水甘油醚型環氧樹 脂組成物作為上述LED製品等光半導體元件之密封 使用之環氧樹脂。 然而’ LED製品之發光波長之短波長化(主要為 以下之藍色發光)發展之結果指出:因短波長之光之影響, 上«封材料於LED晶片上著色’最終導致LED製品^昭 度降低。 此處,就透明性之方面而言,3,4—環氧環己基甲酸— 3’,4’-環氧環己基"曰”斤代表之脂環式環氧樹脂較 香環之縮水甘油㈣環氧樹脂組成物優異,因此將其作為 LED密封材料而進行積極研究(專利文獻i。 · 另-方面’該脂環式環氧樹脂被指出黏度低, 熱硬化反應時易揮發之問題。 凡兵於财酉文酐用於硬化劑之 情形時’大多情形下其揮發| 平赞量劇增❿成為污染硬化爐 因0 201120084 上述硬化性樹脂組成物例如led製品中之表面安裝型 (surface mounting type)封裝之情形時,由於所澆鑄之樹脂 量為極少量(例如10 mg左右),故若使用含有該脂環式環氧 樹脂與酸酐之硬化性樹脂組成物,則於加熱硬化時產生揮 發。其結果,有於表面安裝型LED製品之密封部產生凹陷 而導致異常之情形。進而根據該凹陷之程度,有供給 晶片電流之導線部露出之情形,此時已變得無法發揮作為 密封材料之功能。如上所述該脂環式環氧樹脂於加熱硬化 時之揮發方面仍存在問題。 又近年來之LED製品為了適合於照明或τν之背光 等而進一步發展高亮度化,從而使得LED點亮時伴隨較多 發熱’因此即便為使用該脂環式環氧樹脂之樹脂組成物, 亦於led晶片上產生著色,最終導致LED製品之照度降 低,於耐久性方面亦存在問題(專利文獻3)。 專利文獻1 :日本特開平9一 213997號公報 專利文獻2:曰本特許36 1 8238號說明書 專利文獻3:日本特再2〇〇5_1〇〇445號公報 【發明内容】201120084 VI. Description of the Invention: [Technical Field] The present invention relates to a curable resin composition and a cured product which are suitable for use in electrical and electronic materials, particularly for use in optical semiconductor applications. [Prior Art] A method for hardening an epoxy resin using an acid anhydride has hitherto been used for various insulating materials and materials. Especially in the field where optical characteristics are required, such as LED products, etc., an acid anhydride hardened material of an epoxy resin is often used. A glycidyl ether type epoxy resin composition represented by a bisphenol A type epoxy resin excellent in heat resistance, transparency, and mechanical properties has been widely used as a sealing ring for optical semiconductor elements such as the above-mentioned LED products. Oxygen resin. However, the development of the short wavelength of the LED light-emitting wavelength (mainly the following blue light) indicates that the LED material is colored on the LED wafer due to the influence of short-wavelength light, which ultimately leads to LED products. reduce. Here, in terms of transparency, 3,4-epoxycyclohexylcarboxylic acid-3',4'-epoxycyclohexyl"曰" jin represents an alicyclic epoxy resin which is more fragrant than glycoside (4) Since the epoxy resin composition is excellent, it is actively studied as an LED sealing material (Patent Document i. • Another aspect) The alicyclic epoxy resin is indicated to have a low viscosity and is volatile when thermally hardened. When the soldier uses the anhydride in the case of a hardener, it is volatilized in most cases. The amount of flattening has become a pollution hardening furnace. 0 201120084 The above-mentioned hardening resin composition such as a surface mount type in a led product (surface) In the case of packaging, since the amount of resin to be cast is extremely small (for example, about 10 mg), when a curable resin composition containing the alicyclic epoxy resin and an acid anhydride is used, it is generated during heat curing. As a result, there is a case where the sealing portion of the surface mount type LED product is recessed to cause an abnormality. Further, depending on the degree of the recess, the lead portion for supplying the wafer current is exposed, and this has become the case. The function as a sealing material cannot be exerted. As described above, the alicyclic epoxy resin still has problems in volatilization during heat curing. In recent years, LED products have been further developed to be brighter in order to be suitable for illumination or backlighting of τν. Therefore, when the LED is lit, it is accompanied by a large amount of heat. Therefore, even if the resin composition using the alicyclic epoxy resin is colored on the LED wafer, the illuminance of the LED product is lowered, and the durability is also present. (Patent Document 3) Patent Document 1: Japanese Laid-Open Patent Publication No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. 】

性之問題,進行了下述研 環氧樹脂等所代表之導入 Si — Ο鍵之骨架)之樹脂用 通常已知該導入有矽氧烷骨架之 對熱與光更穩定。因此, 乳院月架之樹脂較環氧樹脂而言 於用於LED製品之密封材料之情 201120084 氧烷骨架之樹脂,耐久性較:點而言,可謂該導入有矽 有矽氧烷骨架之樹脂類較環二:脂:異。但是,該導入 因此,使用聚錢樹脂或聚⑪氧^言耐氣體透過性差。 封材料之情形時,雖然LED 環礼樹脂作為led密 仍存在如下問題:使鑛敷於作題,但 之金屬引線框架上的銀成分( 、 冓成構件 色或變黑,最終使咖製σ之,π射率而實施錢銀)變 β 袈口口之性能降低。For the problem of the property, the resin which is introduced into the skeleton of the Si-ruthenium bond represented by the following epoxy resin is known. It is generally known that the introduction of the azide skeleton is more stable to heat and light. Therefore, the resin of the breast shelf is more resistant than the epoxy resin to the sealing material used for the LED product. The durability of the resin is higher than that of the 201120084 oxyalkyl skeleton. Resin type is similar to ring 2: fat: different. However, this introduction is therefore inferior in gas permeability resistance by using a polyvalency resin or a polyoxyl resin. In the case of sealing materials, although the LED ring resin as the LED dense still has the following problems: the mineral is applied to the problem, but the silver component on the metal lead frame (, the component is colored or blackened, and finally the coffee σ In addition, the performance of the gamma ray rate is reduced, and the performance of the β mouth is reduced.

市%上,尋求—種密封材料,I 性問題之環氧樹脂組成物,且與該耐:體透過 相比,抑制加熱時揮發所致的凹陷,二:曰=環氧樹脂 性更高。 ED製品之耐久 本發月人等鑒於上述實際情形而 本發明。 曰岍九,結果完成 即’本發明係關於: (1) (式中 或碳數1,In the case of the city, an epoxy resin composition of a sealing material and a problem of I is sought, and the depression caused by volatilization during heating is suppressed as compared with the permeation resistance of the body: 曰 = epoxy resin is higher. Durability of ED products The present invention has been made in view of the above-described actual circumstances.曰岍9, the result is completed, ie, the invention relates to: (1) (wherein or carbon number 1,

存在複數個之R1、 6之烷基); R分別獨立地表示氫原子 201120084 (2) 戈口上述第(1)項之硬化 、/ ,、、'久,|土 ^到乃日乃又职 ΑΛ 全部 R1、"p 2 劣 κ為鼠原子之烯烴化合物j (3) ,其中環氧樹脂係 原料; 上述第(1)或(2)項之硬化性樹脂組成物 為下述式(2)所示之1種以上之化合物: 其中硬化劑There are a plurality of alkyl groups of R1 and 6); R independently represents a hydrogen atom 201120084 (2) The hardening of the above item (1) of Gekou, /,,,,,,,,,,,,,, ΑΛ All R1, "p 2 inferior κ is the olefin compound j (3) of the mouse atom, wherein the epoxy resin is a raw material; the hardening resin composition of the above item (1) or (2) is the following formula (2) One or more compounds shown: wherein the hardener

(式中’ R3表示氫原子、曱基或缓基); (4) 其 上述第(1)〜(3)項中任一項之硬化性樹脂組成物 中硬化劑為下述式(3)所示之i種以上之化合物:(wherein R3 represents a hydrogen atom, a mercapto group or a slow group); (4) The hardener in the curable resin composition according to any one of the above items (1) to (3) is the following formula (3) More than one compound shown:

(式中,存在複數個之R3獨立地表示氫原子、曱基 Hu碳數2〜20之键狀或環狀脂肪族基);^ (5) 上述第(4)項之硬化性樹脂組成物,其中式㈠)中之p 201120084 為分支鏈^環狀結構 (6) 如上述第(1)項 下述式(2)所示之i 之硬化性樹脂組成物,其中硬化劑包含 種以上之化合物(In the formula, a plurality of R3 independently represent a hydrogen atom, a fluorenyl group having a carbon number of 2 to 20 or a cyclic aliphatic group); (5) the above-mentioned (4) hardening resin composition In the formula (1), p 201120084 is a branched chain ring structure (6) The curable resin composition of i as shown in the following formula (1), wherein the curing agent contains more than one kind of the hardening agent. Compound

(式中’ R3表示氫原子、曱基或敌基) 及下述式(3)所示之丨種以上之化合物(wherein R3 represents a hydrogen atom, a fluorenyl group or an enantiomer group) and a compound of the above formula (3)

(式中’存在複數個之r3獨立地表示氮原子、甲基或叛 基’ p表示碳數2〜20之鏈狀或環狀脂肪族基)兩者, 且其使用比率為下述範圍: W2/(W2 + W3) = 0.30〜〇,95 之摻合重量份,W3表示 (其中’ W2表示式(2)之化合物 式(3)之化合物之摻合重量份); (7) 一種硬化物 其係將如上述第 (1)〜(6)項中任 一項之硬 201120084 化性樹脂組成物硬化而獲得; (8) 一種光半導體裝置,其係藉由如上述第(1)〜(6)項中任 一項之硬化性樹脂組成物進行密封而獲得。 本發明之硬化性樹脂組成物由於耐熱性、防止加熱硬 化後之凹陷、耐腐蝕氣體性優異,且耐著色性亦優異故 極有用於光學材料,尤其為光半導體用(LED製品等)之接著 材料、密封材料。 【實施方式】 以下記載本發明之硬化性樹脂組.成物。 本發明之硬化性樹脂組成物必需含有下述式(4)所示之 環氧化合物為主成分之環氧樹脂(以下,稱為本發明之環氧 十月曰)°玄1衣氧化合物係藉由將上述式(1)之烯烴化合物進行 環氧化而獲得:(wherein a plurality of r3 independently represent a nitrogen atom, a methyl group or a thiol 'p represents a chain or a cyclic aliphatic group having 2 to 20 carbon atoms), and the use ratio thereof is the following range: W2 / (W2 + W3) = 0.30 ~ 〇, 95 parts by weight, W3 means (where 'W2 represents the blended parts by weight of the compound of formula (2)); (7) a hardening The material is obtained by hardening the hard 201120084 chemical resin composition according to any one of the above items (1) to (6); (8) an optical semiconductor device by the above (1)~ The curable resin composition according to any one of the items (6) is obtained by sealing. The curable resin composition of the present invention is excellent in heat resistance, prevention of depression after heat curing, corrosion resistance, and excellent coloring resistance, and is therefore highly useful for optical materials, particularly for optical semiconductors (LED products, etc.). Materials, sealing materials. [Embodiment] The curable resin group of the present invention is described below. The curable resin composition of the present invention is required to contain an epoxy resin having an epoxy compound represented by the following formula (4) as a main component (hereinafter referred to as an epoxy epoxide of the present invention). Obtained by epoxidizing the olefin compound of the above formula (1):

(式中,存在複數個之R'r2分別獨立地表示氫原子、 或碳數1〜6之烷基)。 和上述式(1)之烯烴化合物可藉由公知之方法製造,例如 藉由使環己烯羧酸類與環己烯二甲醇反應而獲得。 環己烯甲酸衍生物,可列舉下述式(5): 201120084(In the formula, a plurality of R'r2 each independently represent a hydrogen atom or an alkyl group having 1 to 6 carbon atoms). The olefin compound of the above formula (1) can be produced by a known method, for example, by reacting a cyclohexene carboxylic acid with cyclohexene dimethanol. The cyclohexenecarboxylic acid derivative can be exemplified by the following formula (5): 201120084

(式中, R表示氫原子或碳數1〜6(wherein R represents a hydrogen atom or a carbon number of 1 to 6

之烷基,X表示羥 不之化合物’具體而言可列舉:環己烯甲酸、環 環己烯曱酸丙酯、環己 烯甲鲅丁酯、環己烯曱酸己酯、環己烯甲酸(環己烯基曱基) 酯、環己烯曱酸辛酯、環己烯甲醯氣、環己烯曱醯溴、甲 基環己稀甲酸、甲基環己烯曱酸甲酯、甲基環己烯甲酸乙 酯、曱基環己烯曱酸丙酯、曱基環己烯曱酸(甲基環己烯基 曱基)酯、曱基環己烯曱醯氣等,但並不限定於該等。該等 可單獨使用’亦可併用2種以上。 又’ %己烯二甲醇可藉由使環烯烴碳齡與曱醛(或其合 成同位素、二聚曱酸等)繼進行搭醇反應之後進行交又坎尼 糸羅反應(cross Cannizzaro reaction)而生成。 %己稀曱酸衍生物與環己稀二曱醇之反應,可適用通 常之酯化方法。具體而言,可適用通常之酯化反應,可列 舉:使用酸觸媒之Fischer esterification,鹼性條件下之酿 鹵、醇之反應,利用各種縮合劑之縮合反應等 (ADVANCEDORGANIC CHEMISTRY PartB : Reaction and Synthesis pi35、145 — 147、151 等)。又,作為具體之事例, 可藉由利用醇與羧酸類之酯化反應(Tetrahedr〇n vol.36 201120084 ρ·2409(1980)、Tetrahedron Letter p_4475(1980)),進而,亦 玎利用甲酸酯之酯交換反應(日本特開2〇〇5—〇52i87)而製 造。 以上述方式合成之上述式之烯烴化合物,較佳為上 述式⑴中R1為氫原甲基、乙基'丁基之化合物,尤其 於取代基R1與構成烯烴鍵之碳原子鍵結之情形時,為提昇 其反應性,R丨較佳為氫原子、甲基中之任一者,尤 原子。 藉由氧化將上述式⑴之化合物進行環氧化’藉此獲得 本發明之環氧樹脂。氧化之方法,可列舉:利用過乙酸等 過酸進行氧化之方法、利用過氧化氫水進行氧化之方法、 利用空氣(氧)進行氧化之方法等,但並不限定於該等。 利用過酸之環氧化之方法,具體而言可列舉日本特表 載之方=7,號公報、日本特開2_ - 52 1 87號公報所記 氧化氫水之環氧化之方法可適用各種方法 =二^ 本特開平" 本特開平5-213919號公報 '曰 報、日本特開助-17864 ^本特公平卜33471號公 號公報等所列舉之方法。就公報、日本特公平3-5難 過氧化i發明中,就其產物之低黏度性而言’更佳為使用 以下, 記載使用過氧化 氣之環氧化之方法之一例,本 10 201120084 中使用之式(1)所示之環氧樹脂可 並非僅限於以下之方法。 女叔这 . ;有機溶劑、過氧化氫水之乳膠狀態下,使上 庙“()烯烙化合物、聚酸或其鹽以及四級銨 應。再者,亦可π應·用緩彳進打 本發明所使用之聚酸或其鹽若為具有聚酸結構之化合 貝J無特別限定,較佳為含有鶴或翻之聚 有鶴之聚酸或其鹽,尤佳為鶴酸鹽。 吏佳為3 酸」。〃要無特別說明’則將聚乙酸或其鹽簡稱為「聚 具體之聚酸,可⑤丨與·自 酸物二:·/ 2,酸、12, ,. 鎢矽®文等鎢系酸,鉬酸、碟鉬酸算 鉬糸酸之鹽等。 目k 4 子、Ϊ等之鹽之對比陽離子(咖咖eatiGn),可列舉:錢離 、鹼土金屬離子、鹼金屬離子等。 =體而言可料:㈣子1離子等驗土金屬 納離子、鉀離子、鉋離 十 ” μ # 金4離子$,但並不限定於 «亥4。尤佳之對比陽離子為 ^ 離子。 +為納離子、鉀離子、約離子、錄 =之使用量,相對於式⑴之_化合物丨 金屬元素換算(若為鹤酸則為 主耳以 «莫耳,更佳為2.5〜15毫莫耳。 為1.0〜20 四級㈣,可較佳地制總碳數為上’較佳為25 201120084 〜100,更佳為25〜55之四級敍鹽,尤佳為其烧基鍵全部 為脂肪族鏈者。 具體而言可列舉··三癸基甲基錢鹽、二月桂基二甲基 録鹽 '三辛基甲基敍鹽、三烧基甲基(烧基為辛基之化合物 與癸基之化合物的混合型)銨鹽、三—十六烷基甲基銨鹽、 三甲基硬脂基敍鹽、四戊基敍鹽、録壞基三甲基敍越、节 基三丁基録鹽、二鯨蠘基二甲基敍鹽、三錄蠘基甲基錄鹽、 二硬化牛脂烷基二甲基銨鹽等,但並不限定於該等。 又,對該等鹽之陰離子種並無特別限定,具體而言可 列舉:齒化物離子“肖酸離子、&酸離子、硫酸氫離子、 乙酸根離子、碳酸離子等,但並不限定於該等。 若碳數提昇100,則有疏水性變得過強,四級銨鹽於有 機層中之溶解性變差之情形。若碳數未達10,則親水性變 強,同樣地四級銨鹽於有機層中之相溶性 四級敍鹽之使用量較佳為所使用之聚酸之價數人:之 0旦01〜0.8倍當量或UM0倍當量。更佳為〇 〇5〜〇 7倍當 量或1.2〜6.0倍當量’更佳為〇_〇5〜〇5倍當量或i田 倍當量。 例如,若為鎢酸,則以h2W〇4計為2價,因此相對於 鶴酸1莫耳’四級敍之甲酸鹽較佳為G.02H.6莫耳或2.2 〜2〇莫耳之範圍。又’若為鎢磷酸’則為3價,因此同樣 =較佳為0.03〜2.4莫耳或3.3〜3G莫耳,若為料酸,則 為4價,因此較佳為0.04〜3.2莫耳或4·4〜4〇莫耳。 於四級錄之甲酸鹽之量為低於聚酸之價數倍之u倍 12 201120084 當量之情形時’產生以下問題:環氧化反應難以進行(視情 形,反應進行加快),又,易生成副產物。於多於1〇件^ 之情形時,不僅後續處理較麻煩,而且有抑制反應之作用, 故而欠佳。 作為緩衝液,可任意使用公知之緩衝液,但於本反應 中較佳為使用磷酸鹽水溶液。其pH,較佳為經調整為奸4 〜10之間者’更佳為PH5〜9。於PH未達4之情形時容 易進行環氧基之水解反應、聚合反應。又,於pH㈣iq 之情形時,產生反應變得極度緩慢,反應時間過長之問題。 尤其於本發明中溶解作為觸媒之聚酸時’較佳為將pH 調整至5〜9之間。 緩衝液之使用方法例如於使用作為較佳緩衝液之磷酸 -磷酸鹽水溶液之情形時’彳列舉如下方法:相對於過氧 化氫’使用0.1〜10莫耳%當量之磷酸(或磷酸二氫鈉等磷酸 鹽),利用鹼性化合物(例如氫氧化鈉、氫氧化鉀、碳酸鈉、 碳酸氮納、碳酸舒等)進行PH調整之方法。此處,就pH而 言,於添加過氧化氫時,較佳為以成為上述pH之方式添加。 又’亦可使用鱗酸二氫鈉、鱗酸氫二鈉等進行調整。較佳 之磷酸鹽之濃度為〇,丨〜6〇重量%,較佳為i〜45重量%。 又,本反應中亦可不使用緩衝液且不進行pH調整而直 接添加磷酸氫二鈉、磷酸二氫鈉、磷酸鈉、三聚磷酸鈉等 - |· 驟簡化之意義而言,尤佳為無進 行pH調整之麻煩,而直接添加。此時之磷酸鹽之使用量相 對於過氧化氫’通常為G.l〜5 #耳%當量,較佳為0.2〜4 13 201120084 莫耳當量,更佳為0.3〜3 氧化氫超過5莫耳%當量、/°當量。此時,若相對於過 耳%當量之情形時,產生容义需调整pH,於未達ο.1莫 解,或者反應變慢等不良情形行所生成之環氧化合物之水 本反應係使用過氧化氫 過 <丁 %氧化。木及廄所作用之 氧化氫,就其操作之簡# _ & 本反應所使用 丄 Λ 土曰 復而言’較佳為過氧化氫濃度 為10〜40重量%之水溶液 ㈣軋化虱嚴 於履度超過40重量%之情形, 除操作變得困難以外,亦灾且% ^ ^ ^ u技 耳谷易進行所生成之環氧樹脂之分 解反應,故而欠佳。 本反應係使用有機溶劑。所使用之有機 對於作為反應基質之稀烴化人机 化。物1,以重量比計為〇 3〜 10,較佳為0.3〜5,更佳為〇 5 5 2.5。以重量比計超過10 之情形時’反應之進行變得極声 又,·友陵,故而欠佳。可使用 之有機溶劑之具體例’可列舉己 牛已况、%己烷、庚烷等烷烴 類,甲苯、二曱苯等芳香族烴化a & 丈物,曱_ '乙醇、異丙 醇、丁醇、己醇、環己醇等醇_。 守叫類又’視情形亦可使用甲 基乙基酮、甲基異丁基酮、環片獅 s 衣戊酮、J衣己酮(an〇ne)等酮類, 二乙醚、©氫呋喃、二口咢烷等醚類,乙酸乙酯、乙酸丁 醋、曱酸甲醋等醋化物,乙腈等腈化合㈣。尤佳之溶劑 為己烧、環己烧'庚烧等烧烴類,曱苯、二曱苯等芳香族 烴化合物。 具體之反應操作方法,例如於利用批次式反應釜進行 反應時,添加烯烴化合物 '過氧化氫(水溶液)、聚酸(觸媒)、 缓衝液、四級銨鹽及有機溶劑,以雙層進行攪拌。攪拌速 14 201120084 度無特別指定。由於在添加過氧化氫 故而亦可為於添加各成分後緩緩添 化、,情形較多’ 此時,使用如下方法:於添加緩衝液方法。 聚酸進行PH調整之後,添加四級錢鹽與磷酸鹽)、 合物’以雙層進行搜拌,然後滴加過 广劑及稀烴化 或者亦可使用如下方法:於 1。 ah 撹拌水、有機溶劑、烯柄 口㉟程中添加聚酸、碟酸(或碟酸鹽)進行 後,添加四級銨鹽,以雙層進:之 之方法。 …傻滴加過虱化氫 反應溫度並無特別限定,較佳為卜啊 75°C ’尤佳為饥〜阶 更佳為0〜 ..„ ^ 夂應/皿度過尚時,易進行水解 心反應、溫度較低時,&應速度變得極度緩慢。 又,反應時間雖亦取決於反應溫度、觸媒量等,但 工業生產之觀點而t,長時間之反應消耗大量能量,^ 欠佳。較佳之範圍為卜48小時,較佳為3〜刊小 佳為4〜24小時。 於反應結束後,進行過剩之過氧化氫之淬冷處理。泮 冷處理較佳為使用鹼性化合物進行…亦較佳為併用還 原劑與鹼性化合物。較佳之處理方法,可列舉如下方法: 利用鹼性化合物將pH中和調整至6〜1〇之後,使用還原劑 將殘存之過氧化氫淬冷。於pH未達6之情形時,還原過剩 之過氧化氫時之發熱大,有產生分解物之可能性。 還原劑,可列舉:亞硫酸鈉、硫代硫酸鈉、肼、草酸、 維生素C等。還原劑之使用量,相對於過剩部分之過氧化 15 201120084 ίο倍 氮之莫耳數’通常為0·01〜20倍莫耳,更佳為〇 〇5 莫耳,更佳為1〇5〜3倍莫耳。 30重 該等較佳為作為水溶液進行添加,其濃度為^ 量%。 鹼性化合物,可列舉:氫氧化鈉、氫氧化鉀' 氫氧化 金屬氫氧化物’碳酸納、碳酸鉀等金屬碳 磷I鈉、磷酸氫鈉等磷酸鹽,離子交換樹脂 在呂專驗性固體。 ^其使用量,若為於水或有機溶劑(例如:曱笨、二甲W =香族烴化合物’甲基異丁基酮、曱基乙基網等:類本 衣烷、庚烧、辛烧等煙,甲醇、乙醇、異丙醇等醇類等 各種溶劑)中溶解者,則其使用量相對於過剩部分之過氧化 :之莫耳數,通常為0.01〜20倍莫耳’更佳為〇 〇5〜1〇倍 機I,,進!^佳為㈣5〜3倍莫耳^等可作為水或上述有 ’冷劑之洛液進行添加,亦可以單體進行添加。 使用不溶於水或有機溶劑中之固體驗之情形時,較佳 為相對於殘存於系統中之過氧化氫之量,㈣以重量比叶 為1〜1_倍之量。更佳為10〜·倍,進而更佳為1〇〜 。00倍。使用不溶於水或有機溶劑中之固體驗之情形時,亦 可於下文所記載之水層與有機層分離後進行處理。 μ =過氧化氫之淬冷後(或於進行淬冷之前)有機層與水 :未:分離’或未使用有機溶劑之情形時,添加上述有機溶 劑進仃操作’自水層中進行反應產物之萃取。此時使用之 有機溶劑相對於原料烯烴化合物,以重量比計$ 〇.5〜1〇 16 201120084 倍’較佳為0.5〜5倍。將視需要反覆進行數次上述操作後 所分離之有機層,視需要進行水洗而純化。 所知之有機層係視需要藉由離子交換樹脂或金屬氧化 物(尤佳為矽膠、氧化鋁等)' 活性碳(其中尤佳為化學活化 活性碳(Chmical reaCtlvation active carb〇n))、複合 ^屬鹽 (其中尤佳為鹼性複合金屬鹽)、黏土礦物(其中尤佳為蒙: 石等層狀黏土礦物)等去除雜質,進而進行水洗、過之 後’蒸餾去除溶劑而獲得目標之環氧化合物。〜 視情形,亦可進一步藉出技Λ p s柱層析法或蒸餾而純化。 以上述方式獲得之環氧槲化 &樹脂係以下述式 為主成分,且混合存在有式 ’、之刀子 混合物: U)所示之各種結構之化合物的The alkyl group, X represents a compound having no hydroxyl group, and specific examples thereof include cyclohexenecarboxylic acid, propylcyclohexene decanoate, cyclohexene methacrylate, cyclohexene decanoate, cyclohexene. Formic acid (cyclohexenyl decyl) ester, cyclohexene decanoate octyl ester, cyclohexene methyl hydrazine gas, cyclohexene hydrazine bromine, methylcyclohexane carboxylic acid, methyl cyclohexene decanoate methyl ester, A Ethyl cyclohexenecarboxylate, propyl decyl cyclohexene decanoate, nonylcyclohexene decanoic acid (methylcyclohexenyl decyl) ester, decyl cyclohexene oxime, etc., but not Limited to these. These may be used alone or in combination of two or more. Further, '% hexene dimethanol can be subjected to a cross Cannizzaro reaction by subjecting the cyclic olefin carbon age to furfural (or its synthetic isotope, dimeric decanoic acid, etc.) followed by a ketolization reaction. generate. The reaction of the % hexanoic acid derivative with cyclohexanol can be applied to the usual esterification method. Specifically, a general esterification reaction can be applied, and examples thereof include Fischer esterification using an acid catalyst, bubbling of an alcohol under an alkaline condition, reaction of an alcohol, condensation reaction using various condensing agents, and the like (ADVANCEDORGANIC CHEMISTRY PartB : Reaction and Synthesis pi35, 145 — 147, 151, etc.). Further, as a specific example, an esterification reaction of an alcohol with a carboxylic acid can be used (Tetrahedr〇n vol. 36 201120084 ρ·2409 (1980), Tetrahedron Letter p_4475 (1980)), and further, a formate is used. It is produced by a transesterification reaction (Japanese Patent Publication No. 2-5-〇52i87). The olefin compound of the above formula synthesized in the above manner is preferably a compound of the above formula (1) wherein R1 is a hydrogen methyl group or an ethyl 'butyl group, particularly when the substituent R1 is bonded to a carbon atom constituting an olefin bond. In order to enhance the reactivity, R丨 is preferably any one of a hydrogen atom and a methyl group, particularly an atom. The epoxy resin of the present invention is obtained by epoxidizing the compound of the above formula (1) by oxidation. Examples of the method of oxidizing include a method of oxidizing by a peracid such as peracetic acid, a method of oxidizing by using hydrogen peroxide water, a method of oxidizing by air (oxygen), and the like, but are not limited thereto. In the method of epoxidation of a peracid, the method of epoxidation of the hydrogen peroxide water described in the Japanese Patent Publication No. 7, No. 7, No. 7, No. 2, No. =二^本特开平" 本特开平平----------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------- In the invention of the Japanese Patent Publication No. 3-5, the low viscosity of the product is more preferably used as follows, and an example of a method of epoxidation using peroxidation gas is described. The epoxy resin represented by the formula (1) may not be limited to the following methods. Uncle, this. Under the latex state of organic solvent and hydrogen peroxide, make the temple "() olefinic compound, polyacid or its salt and quaternary ammonium should be. In addition, π should be used The polyacid or a salt thereof to be used in the present invention is not particularly limited as long as it is a compound having a polyacid structure, and it is preferably a polyacid or a salt thereof which contains a crane or a stalk, and particularly preferably a sulphate.吏佳 is 3 acids." Unless otherwise specified, the polyacetic acid or its salt is abbreviated as "poly polyacid, 5 丨 and · 酸 2: · / 2, acid, 12, .. Tungsten 矽 文, molybdic acid, disc molybdate, molybdenum citrate, etc.. Contrast cations of the salt of k4, cesium, etc. (caffe eatiGn), for example, money, alkaline earth metal ions, alkali metal ions, etc. In terms of material: (4) sub-1 ions and other soil-measuring metal nano-ions, potassium ions, and 10" μ #金四离子$, but not limited to «Hai 4. The preferred contrast cation is ^ ion. + is the amount of nano-ion, potassium ion, about ion, recorded =, relative to the compound of formula (1) 丨 metal element conversion (if it is tartaric acid, the main ear is «mole, more preferably 2.5~15 mm For the 1.0 to 20 four-level (four), it is preferable to make the total carbon number to be 'perfectively 25 201120084 ~ 100, more preferably 25 to 55 of the four-level salt, especially for the base bond Specific examples of the aliphatic chain include: trimethyl ketone, dilauryl dimethyl salt, trioctylmethyl sulphate, trialkylmethyl (a compound based on octyl) Mixed with sulfhydryl compounds) ammonium salt, tri-hexadecylmethylammonium salt, trimethyl stearyl salt, tetrapentyl salt, chlorpyrifos trimethyl sulphate, nodal base Butyl salt, dioxin dimethyl sulphate, sulphate methyl sulphate salt, dihardened tallow alkyl dimethyl ammonium salt, etc., but are not limited thereto. The anion species is not particularly limited, and specific examples thereof include a chiral ion "chaotic acid ion, & acid ion, hydrogen sulfate ion, acetate ion, carbonate ion, etc., but not If the carbon number is increased by 100, the hydrophobicity becomes too strong, and the solubility of the quaternary ammonium salt in the organic layer is deteriorated. If the carbon number is less than 10, the hydrophilicity becomes strong, and the same The amount of the quaternary ammonium salt in the organic layer is preferably the valence of the polyacid used: 0:01 to 0.8 times equivalent or UM0 times equivalent. More preferably 〇〇 5 to 〇 7 times equivalent or 1.2 to 6.0 times equivalent 'better 〇 〇 5 〇 5 times equivalent or i field equivalent. For example, if it is tungstic acid, it is 2 valence in h2W 〇 4, so relative Preferably, the toluic acid 1 Moer 'four-grade naphthoate is a G.02H.6 molar or a 2.2 to 2 molar range. Also, if it is a tungsten phosphate, it is a trivalent, so the same = Preferably, it is 0.03~2.4 moor or 3.3~3G moule. If it is acid, it is 4 valence, so it is preferably 0.04~3.2 moor or 4·4~4 〇 Mo. The amount of salt is less than a multiple of the price of the polyacid. 12 201120084 Equivalent case, the following problems occur: the epoxidation reaction is difficult to carry out (as the case may be, the reaction proceeds), and further, by-products are easily formed. 1〇 In the case of ^, not only the subsequent treatment is troublesome, but also the effect of suppressing the reaction is unsatisfactory. As the buffer solution, a known buffer solution can be arbitrarily used, but in the present reaction, it is preferred to use an aqueous phosphate solution. Preferably, it is adjusted to be between 4 and 10', more preferably PH5 to 9. When the pH is less than 4, the hydrolysis reaction and polymerization of the epoxy group are easily carried out. Further, in the case of pH (four) iq, The reaction becomes extremely slow and the reaction time is too long. Especially in the case of dissolving the polyacid as a catalyst in the present invention, it is preferred to adjust the pH to between 5 and 9. The method of using the buffer is, for example, used as a comparison. In the case of a phosphate-phosphate aqueous solution of a good buffer, 'the following method is used: 0.1 to 10 mol% of phosphoric acid (or phosphate such as sodium dihydrogen phosphate) is used with respect to hydrogen peroxide, and a basic compound is used ( For example, sodium hydroxide, potassium hydroxide, sodium carbonate, sodium carbonate, carbonated, etc. are used for pH adjustment. Here, in terms of pH, when hydrogen peroxide is added, it is preferably added so as to have the above pH. Further, adjustment may be carried out using sodium dihydrogen hydride or disodium hydrogen citrate. Preferably, the concentration of the phosphate is 〇, 丨~6〇% by weight, preferably i~45% by weight. Further, in the present reaction, it is also possible to directly add disodium hydrogen phosphate, sodium dihydrogen phosphate, sodium phosphate, sodium tripolyphosphate or the like without using a buffer and without pH adjustment - in the sense of simplification, it is particularly preferable The trouble of pH adjustment is added and added directly. The amount of phosphate used at this time is usually G1 to 5 #耳% equivalent, preferably 0.2 to 4 13 201120084 mole equivalent, more preferably 0.3 to 3, more than 5 mole % of hydrogen peroxide. , / ° equivalent. At this time, if it is relative to the excess of the ear, the pH of the epoxy compound which is generated by the tolerance is adjusted, and the epoxy compound which is formed in the case where the reaction is not reached, or the reaction becomes slow is used. Hydrogen peroxide was <butyl peroxide. The hydrogen peroxide acting on wood and strontium is simple in its operation. _ & The hydrazine used in the reaction is preferably an aqueous solution (4) having a hydrogen peroxide concentration of 10 to 40% by weight. In the case where the degree of work exceeds 40% by weight, in addition to the difficulty in handling, it is also difficult to carry out the decomposition reaction of the produced epoxy resin, which is unsatisfactory. This reaction uses an organic solvent. The organic used is humanized for the dilute hydrocarbonization as a reaction substrate. The substance 1 is 〇 3 to 10, preferably 0.3 to 5, more preferably 〇 5 5 2.5 by weight. In the case where the weight ratio exceeds 10, the progress of the reaction becomes extremely loud, and the Yuling is unsatisfactory. Specific examples of the organic solvent that can be used include an alkane such as an already-rich state, an alkane such as a hexane or a heptane, an aromatic hydrocarbon a to be used such as toluene or diphenylbenzene, and an anthracene, 曱 _ 'ethanol, isopropyl alcohol , butanol, hexanol, cyclohexanol and other alcohols _. Shou shou class and 'optionally use methyl ethyl ketone, methyl isobutyl ketone, ring lion s pentanone, J ketone (an 〇ne) and other ketones, diethyl ether, hydrofuran An ether such as two decane, an acetate such as ethyl acetate, butyl acetate or methyl vinegar, or a nitrile such as acetonitrile (IV). The solvent of Optima is an aromatic hydrocarbon compound such as a burned hydrocarbon such as hexene or cyclohexane, or a benzene or diphenylbenzene. Specific reaction operation method, for example, when the reaction is carried out in a batch reactor, an olefin compound 'hydrogen peroxide (aqueous solution), a polyacid (catalyst), a buffer solution, a quaternary ammonium salt and an organic solvent are added to the double layer. Stir. Stirring speed 14 201120084 degrees is not specified. Since hydrogen peroxide may be added, it may be added slowly after adding each component. In this case, the following method is used: a buffer method is added. After the pH adjustment of the polyacid, the quaternary salt and the phosphate are added, and the mixture is mixed in a double layer, and then the mixture is diluted and diluted. Alternatively, the following method may be used: After ah mixing water, organic solvent, and olefinic handle are added with polyacid and disc acid (or disc acid salt) in 35 steps, a quaternary ammonium salt is added to double-layer in: ... silly drop plus hydrogen halide reaction temperature is not particularly limited, preferably 卜 75 ° C ' Especially good for hunger ~ order better 0 ~ .. „ ^ 夂 should be / when the dish is still too easy to carry out When the hydrolysis reaction is carried out and the temperature is low, the speed of the & is extremely slow. Moreover, the reaction time depends on the reaction temperature, the amount of the catalyst, etc., but from the viewpoint of industrial production, the long-term reaction consumes a large amount of energy. ^ It is not preferable. The preferred range is 48 hours, preferably 3 to 3 minutes, and 4 to 24 hours. After the reaction is completed, the excess hydrogen peroxide is quenched. The quenching treatment preferably uses a basic compound. It is also preferred to use a reducing agent and a basic compound in combination. A preferred method of treatment is as follows: After the pH is neutralized to 6 to 1 Torr by using a basic compound, the residual hydrogen peroxide is quenched with a reducing agent. When the pH is less than 6, the heat generated when the excess hydrogen peroxide is reduced is large, and there is a possibility that a decomposition product is generated. Examples of the reducing agent include sodium sulfite, sodium thiosulfate, hydrazine, oxalic acid, vitamin C, and the like. Reducing agent usage, relative The excess part of the peroxidation 15 201120084 ίο nitrogen molar number 'usually 0. 01~20 times Moule, more preferably 〇〇 5 Mo, more preferably 1 〇 5~3 times Mo. 30 重It is preferably added as an aqueous solution at a concentration of % by weight. Examples of the basic compound include sodium hydroxide, potassium hydroxide, metal hydroxide, sodium carbonate, potassium carbonate, and the like. Phosphate such as sodium hydrogen phosphate, ion exchange resin in L-specific solids. ^ Its use, if it is in water or organic solvent (for example: 曱, dimethyl W = aromatic hydrocarbon compound 'methyl isobutyl ketone , mercaptoethyl net, etc.: such as pentane, gamma, octyl, and other solvents, such as alcohols such as methanol, ethanol, and isopropanol, etc., the amount of use is relative to the excess portion of peroxidation. : Moir number, usually 0.01~20 times Mo's better 〇〇5~1〇 times machine I,, enter! ^佳为(四)5~3倍莫耳^etc can be used as water or above The addition of the agent solution can also be carried out by using a monomer. When using a solid solution insoluble in water or an organic solvent, For the amount of hydrogen peroxide remaining in the system, (4) the amount by weight of the leaves is 1 to 1 times, more preferably 10 to· times, and even more preferably 1 to 1.00 times. In the case of solid solution in water or organic solvent, it can also be treated after separation of the aqueous layer and the organic layer described below. μ = organic layer and water after quenching of hydrogen peroxide (or before quenching) : not: separation or when the organic solvent is not used, the above organic solvent is added to carry out the extraction operation. The extraction of the reaction product is carried out from the aqueous layer. The organic solvent used at this time is compared with the raw material olefin compound by weight ratio 〇 .5~1〇16 201120084 times 'preferably 0.5 to 5 times. The organic layer separated after several times of the above operation is repeated as needed, and washed with water if necessary. The known organic layer is made by ion exchange resin or metal oxide (especially tannin, alumina, etc.), activated carbon (in particular, chemically activated carbon (Chmical reaCtlvation active carb〇n)), composite ^ is a salt (particularly an alkaline composite metal salt), clay minerals (especially for the layer: clay minerals such as stone) to remove impurities, and then washed with water, after the distillation to remove the solvent to obtain the target ring Oxygen compound. ~ Depending on the situation, it can be further purified by the technique of p s column chromatography or distillation. The epoxy oxime & resin obtained in the above manner is a compound having the following formula and mixed with a compound of various structures represented by the formula: U)

(式中’存在複數個之、 或碳數1〜ό之烷基) 分別獨立地表示氫原子、 17 201120084(wherein a plurality of, or a carbon number of 1 to 烷基 alkyl groups) independently represent a hydrogen atom, 17 201120084

(式中,A〜D之組合可為任意組合)。 本發明之硬化性樹脂組成物中’可將本發明之環 脂單獨使用,或與其他環氧樹脂合併使用。於併用之= 時’上述環氧樹脂於全部環氧樹脂中所占之比例較佳為 重畺/〇以上’尤佳為40重量%以上。其中,於將本發明之 環氧樹脂用作硬化性樹脂組成物之改質劑之情形時,係以! 〜3 0重量%之比例添加。 本發明之硬化性樹脂組成物tf?可使用之其他環氧樹 脂’可列舉:酚醛清漆型環氧樹脂、雙酚A型環氧樹脂' 聯苯型環氧樹脂、三苯基曱烷型環氧樹脂、苯酚芳烷基型 環氧樹脂等。具體而言可列舉:雙酚A、雙酚S、硫二酚、 苐雙酚、萜二酚、4,4,一聯苯酚、2,2’一聯苯酚、3,3,,5,5,一 四曱基~~[1,1,一聯苯]—4,4,一二醇、對苯二酚、間苯二酚、 萘二醇、三_(4 —羥基笨基)曱烷、1,1,2,2—四(4_羥基笨 基)乙烷、酚類(苯酚 '經烷基取代之苯酚、萘酚、經烷基取 18 201120084 代之4齡、二_其贷 對經基笨甲酸基鄰本/;:經基蔡等)與甲酸、乙路、笨甲路、 T驗、鄰羥基苯甲醛、 + 乙嗣、二環戊m4,4,—雙(氣vm鄰經基苯 Μ—雙(甲氧A…”雙(氣P基)一1,卜聯苯、 -雙(甲氧美甲其 ,聯苯、M-雙(氣甲基)笨、Μ A “化雙:類二之縮聚物,該等之改質物,_紛 氧樹卜 ^了生之縮水甘油㈣化物、脂環式環 水甘油胺系環氧樹脂、縮水甘油咖氧樹脂^ 燒糸環氧樹脂(於鏈狀、環狀、梯狀、或其等至少 产氧ϋ之遇合結構之石夕氧院結構中具有縮水甘油基及/或 ==構之環氧樹脂)等固態或液態環氧樹脂,但並 尤其於將本發明之硬化性樹脂組成物用於光學用途之 :形時’較佳為併用脂環式環氧樹脂與倍㈣氧坑結構之 :乳樹脂。尤其於脂環式環氧樹脂之情形時,較佳為於骨 卞中’、有%氧ί衣己烷結構之化合物’尤佳為藉由具有環己 烯結構,化合物之氧化反應而獲得之環氧樹脂。 &該等環氧樹脂’可列舉將可藉由以下方法製造之化合 氧化而獲知者等.環己烯羧酸與醇類之酯化反應或環己 烯曱醇與羧酸類之酯化反應㈤―yd % ρ 24〇9 ◦980)、Tetrahedr〇n 以如 ρ. 4475 ο·)等所記载之方 法),或者環己烯路之季先科反應(Tishchenk。reacti〇n)(曰本 特開2003 - 170059 f虎公報、日本特㈤2〇〇4_ 262871號公 民等中。己載之方法),進而環己烯羧酸酯之酯交換反應(日本 特開2006— 052187號公報等中記載之方法)。 19 201120084 作為醇_,# Α θi 定,可列舉:乙二醇:丙'二基之化合物則無特別限 …丁二醇、…戊二二:己丙二二。一:二醇、 2〆-二乙基戊二醇、2_乙基 —~ %己m手、 A -醇、二s -丁基一1,3_丙二醇、新 戍一醇二1展癸炫二曱醇、降 ,,E 幸 *人稀二醇(Norbornene di〇l)算 二醉類,丙三醇、三羥甲美 )寺 甲基乙烷、三羥甲基丙烷、三羥甲 基丁烧、2 —經基甲其」 一 _ 土 5 丁—醇等三醇類,季戊四醇、 一一二經甲基丙貌等四醇類 ^ ^ ιε 畔員專又’作為羧酸類,可列舉: 草酸、順丁烯二酸、反丁烯- 席一酉文、鄰苯二甲酸、間苯二曱 酸、己二酸1己燒二甲酸等,但並不限定於此。 於月架中具有環氛環已燒結構之化合物之其他 例,可列舉由環己烯酿衍生.愈c咖 物與_體之縮醛反應而獲得 縮醛化合物。反應方法, 受應用通常之縮醛化反應即可 製造,例如揭示有:反庠介哲 &愿”質使用甲笨、二曱苯等溶劑, 一面進行共沸脫水一面進杆 运订反應之方法(美國專利第 2945008號公報);於濃鹽酸 夂甲办解多元醇後’一面緩緩添 加醛類一面進行反應之方法f 曰本特開昭48 - 96590號公 報);反應介質使用水之方法(美 、果國專利第3092640號公報); 反應介質使用有機溶劑之方法( 古(曰本特開平7 - 215979號公 報);使用固體酸觸媒之方法(日太 yy本特開2〇〇7_23〇992號公 報)等。就結構之穩定性而言,舾杜达 私佳為環狀縮醛結構。 該等環氧樹脂之具體例,可而丨與. J Γ 列舉:ERL- 4221、UVR〜 6105、ERL - 4299(均為商 σ 々 同0口名’均由道氏化學(D〇w(wherein, the combination of A to D may be any combination). The curable resin composition of the present invention can be used alone or in combination with other epoxy resins. When used in combination, the ratio of the epoxy resin to the total epoxy resin is preferably 5% or more, more preferably 40% by weight or more. Among them, in the case where the epoxy resin of the present invention is used as a modifier of a curable resin composition, it is! Add a ratio of ~30% by weight. The other epoxy resin which can be used for the curable resin composition tf? of the present invention is exemplified by a novolac type epoxy resin, a bisphenol A type epoxy resin, a biphenyl type epoxy resin, and a triphenyldecane type ring. Oxygen resin, phenol aralkyl type epoxy resin, and the like. Specific examples thereof include bisphenol A, bisphenol S, thiophenol, bisphenol, stilbene, 4,4, monophenol, 2,2'-diphenol, 3,3,5,5. , a tetradecyl group ~~[1,1,biphenyl]-4,4,monodiol, hydroquinone, resorcinol, naphthalenediol, tris(4-hydroxyphenyl)decane 1,1,2,2-tetra(4-hydroxyphenyl)ethane, phenols (phenol's alkyl substituted phenol, naphthol, alkyl group 18 201120084 generation 4 years old, two _ loans For the base group, the acid is based on the base /;: via the base, etc.) with formic acid, B road, stupid road, T test, o-hydroxybenzaldehyde, + acetamidine, dicyclopentane m4, 4, - double (gas vm O-based benzoquinone-bis(methoxy A..." bis (gas P-based)-1, bisbiphenyl, - bis (methoxymethacene, biphenyl, M-bis (gas methyl) stupid, Μ A" Double: the second type of polycondensate, these modified substances, _ 氧 oxygen tree ^ ^ raw glycidol (four), alicyclic diglycidyl amine epoxy resin, glycidol coffee resin ^ Oxygen resin (in the structure of chain, ring, ladder, or the like, at least the structure of the oxygen-producing structure Solid or liquid epoxy resin such as water glyceryl and/or epoxy resin, but especially for the use of the curable resin composition of the present invention for optical purposes: preferably in the form of an alicyclic mixture Epoxy resin and doubling (tetra) oxygen crater structure: milk resin. Especially in the case of alicyclic epoxy resin, it is preferable to 'in the bone ' ', the compound with % oxime structure is especially good An epoxy resin obtained by an oxidation reaction of a compound having a cyclohexene structure. The epoxy resin is exemplified by a compound oxidation which can be produced by the following method, etc. cyclohexenecarboxylic acid and Esterification of alcohols or esterification of cyclohexene sterols with carboxylic acids (5) ―yd % ρ 24〇9 ◦ 980), Tetrahedr〇n as described in ρ. 4475 ο·), etc. Or the cyclohexene reaction of the cyclohexene road (Tishchenk. reacti〇n) (曰本特开 2003 - 170059 f tiger bulletin, Japanese special (5) 2〇〇4_ 262871 citizens, etc.), and then cyclohexene carboxylate The transesterification reaction of an acid ester (method described in JP-A-2006-052187, etc.). 19 201120084 As the alcohol _, # Α θi, it can be mentioned that the compound of ethylene glycol: propylene 'diyl group is not particularly limited ... butylene glycol, ... glutarylene: propylene propylene. One: diol, 2〆-diethylpentanediol, 2_ethyl-~%-hexan, A-alcohol, di-s-butyl-1,3-propanediol, neodecyl alcohol曱二曱醇,降,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,, Kedi, 2, triols such as ketones, ketones, ketones, alcohols, pentaerythritols, hexamethylene methacrylates, etc. ^ ^ ιε Illustrative: oxalic acid, maleic acid, anti-butene-Xiyiwen, phthalic acid, isophthalic acid, adipic acid 1 hexanedicarboxylic acid, etc., but is not limited thereto. Other examples of the compound having a ring-ring-fired structure in the lunar frame include an acetal compound obtained by reacting a cyclohexene with a acetal. The reaction method can be produced by applying a usual acetalization reaction. For example, it is disclosed that: 庠 庠 哲 哲 amp 愿 质 使用 使用 使用 使用 使用 使用 使用 使用 使用 使用 使用 使用 使用 使用 使用 使用 使用 使用 使用 使用 使用 使用 使用 使用 使用 使用 使用 使用 使用 使用 使用 使用Method (U.S. Patent No. 2945008); a method of performing a reaction while slowly adding an aldehyde after dissolving a polyhydric alcohol in a concentrated solution of hydrochloric acid, f 特 特 48 48 48 48-96590); Method (U.S. Patent No. 3,092, 640); a method of using an organic solvent in a reaction medium (Equ. (U.S. Patent No. 7-215979); a method using a solid acid catalyst (Japanese yy moto open 2 〇 〇7_23〇992 Bulletin), etc. In terms of structural stability, 舾杜达 is preferably a cyclic acetal structure. Specific examples of such epoxy resins are available. J Γ List: ERL-4221 , UVR~ 6105, ERL-4299 (both are σ 々 々 同 0 名 '' by Dow Chemical (D〇w

Chemical)製造)、CELLOXide β2〇2ΐΡ、EPOLEAD GT401、 20 201120084 ΕΗΡΕ 3150.EHPE 3150CE(i^^〇^ , 工業製造)及二環戊二缔二環氧化物 =_丨化學 (參考文獻:總論環氧樹脂基礎篇Ιρ76=^。限定於該等 該等可單獨使用,亦可併肖2種以上 氧樹脂中所占之比例較佳為6〇重量%以下,尤佳於:部: ❶/。以下。若超過6。重量%進行併用則發^ 情形之虞。 揮發#不良 “,氧院系環氧樹脂(於鏈狀、環狀、梯狀、或 ”寺之至mx上之混合結構之錢貌結構 水 =基、及/或環氧環己院結構之環氧樹脂)等固態或液態^ 乳树脂較佳為於不對耐腐#氣體性造成影響之範圍内使 用。於㈣該倍切氧μ環氧樹脂之情形時,於全部環 氧樹脂中所占之比例較佳為7〇重量%以下’尤佳為重= %以下。若大量併用該倍半咬氧烧系環氧樹脂,則使耐 氣體性降低。 本發明之硬化性樹脂組成物含有與上述環氧樹脂具有 反應性之硬化劑及/或硬化促進劑。 以下,對本發明中可使用之硬化劑進行說明。 該硬化劑’例如可列舉:胺系化合物、酸酐系化合物、 醯胺系化合物、酚系化合物、羧酸系化合物等。可使用之 硬化劑之具體例,可列舉:二胺基二笨基曱烷、二伸乙基 二胺、三伸乙基四胺、二胺基二苯基砜、異佛爾酮二胺、 一氰基二醯胺、由次亞麻酸之二聚物與乙二胺所合成之聚 醯胺樹脂等含氮化合物(胺、醯胺化合物);鄰笨二甲酸酐、 21 201120084 偏苯三甲酸酐、均苯四甲酸二酐、順丁烯二酸酐' 四氫鄰 笨二甲酸酐、曱基四氫鄰苯二甲酸酐、甲基财地酸酐、耐 地酸酐、六氫鄰苯二曱酸酐、曱基六氫鄰苯二甲酸酐、丁 院四曱酸酐、雙環[2,2,1]庚烷一2,3—二甲酸酐、曱基雙環 [2,2,1]庚烧—2,3 —二曱酸酐、環己院~ ι,2,4 —三甲酸_ 1 2 —酐等酸酐;藉由各種醇、曱醇(carbin〇i)改質聚矽氧與上 述酸酐之加成反應而獲得之羧酸樹脂;雙酚A、雙齡F、雙 酚S'第雙酚、萜二酚、4,4,_聯苯酚、2,2,—聯苯酚、3,3,,5,5, —四甲基_[1,1’_聯苯]—4,4,一二醇、對苯二酚' 間苯二 酚、萘二醇、三_(4—羥基苯基)曱烷、丨,12,2 一四(4 一羥 基苯基)乙烷、酚類(酚、經烷基取代之酚、萘酚、經烷基取 代之萘酚、二羥基苯、二羥基萘等)與甲醛、乙醛、苯曱醛' 對羥基笨甲醛、鄰羥基苯曱醛、對羥基苯乙酮、鄰羥基苯 乙酮、二環戊二烯、糠醛、4,4,—雙(氣甲基)_丨,丨,—聯苯、 4,4 —雙(曱氧基甲基)一 1,1’ —聯笨、1,4,—雙(氣甲基)笨、 1,4雙(曱氧基曱基)苯等之縮聚物及該等之改質物,四溴 又酚A等_化雙酚類,祐烯與酚類之縮合物等多酚類;咪 唑、三氟化硼—胺錯合物、胍衍生物之化合物等,但並不 限定於該等。料可單獨使用,亦可使用兩種以上。 於本發明中,尤佳為將具有上述酸肝所代表之酸肝結 構之化合物及/或具有上述羧酸樹脂所代表之羧酸結構之化 合物用作硬化劑。 具有酸針結構之化合物,尤佳為:甲基四氫鄰苯二曱 酸酐、甲基耐地酸酐、耐地酸酐、六氫鄰苯二曱酸酐、曱 22 201120084 基六氫鄰笨二曱酸酐、丁烷四曱酸酐、雙環[2Ί]庚烷—2,3 一二曱酸酐、曱基雙環[2,2,1]庚烷— 2,3—二甲酸酐、環己 烷一1,2,4一三曱酸一1,2—酐等。 其中’尤佳為下述式(2)所示之六氫鄰苯二曱酸酐、曱 基六氫鄰苯二甲酸酐、環己烷—1,2,4 —三甲酸_ 1,2_酐:Chemical), CELLOXide β2〇2ΐΡ, EPOLEAD GT401, 20 201120084 ΕΗΡΕ 3150.EHPE 3150CE (i^^〇^, industrial manufacturing) and dicyclopentadienyl epoxide = 丨 丨 chemistry (Reference: General The epoxy resin basic article Ιρ76=^ is limited to these, and may be used alone or in combination with two or more kinds of oxygen resins, preferably in a proportion of 6% by weight or less, particularly preferably: :/ If it exceeds 6. wt%, it will be used in combination with the situation. Volatilization #bad", oxygen-based epoxy resin (in chain, ring, ladder, or "mixture structure of temple to mx" The solid or liquid liquid such as the water structure of the structure and/or the epoxy resin of the epoxy ring structure is preferably used in the range which does not affect the gas resistance of the corrosion resistance. (4) In the case of the oxygen-cutting epoxy resin, the proportion of the total epoxy resin is preferably 7% by weight or less, and particularly preferably the weight is less than or equal to or less than %. If a large amount of the sesquifer-oxygenated epoxy resin is used in combination, The gas resistance is lowered. The curable resin composition of the present invention contains the above epoxy resin. Reactive hardener and/or hardening accelerator. Hereinafter, the curing agent which can be used in the present invention will be described. Examples of the curing agent include an amine compound, an acid anhydride compound, a guanamine compound, and a phenol compound. A carboxylic acid-based compound, etc. Specific examples of the hardener which can be used include diaminodiphenyl decane, diethylene ethylamine, tri-ethyltetramine, diaminodiphenyl sulfone, and the like. a nitrogen-containing compound (amine, guanamine compound) such as a sulfonamide diamine, a cyanodiamine, a polyamine resin synthesized from a dimer of linolenic acid and ethylenediamine; 21 201120084 trimellitic anhydride, pyromellitic dianhydride, maleic anhydride 'tetrahydrophthalic anhydride, decyl tetrahydrophthalic anhydride, methyl anhydride, ceric anhydride, hexahydrogen O-phthalic anhydride, mercapto hexahydrophthalic anhydride, butyl phthalic anhydride, bicyclo[2,2,1]heptane-2,3-dicarboxylic anhydride, fluorenylbicyclo[2,2,1 ]Geng Shao - 2,3 - dicarboxylic anhydride, cyclohexan ~ ι, 2,4 - tricarboxylic acid _ 1 2 - anhydride and other anhydride; by various alcohols, hydrazine A carboxylic acid resin obtained by an addition reaction of an alcohol (carbin〇i) modified polyfluorene oxide with the above acid anhydride; bisphenol A, double age F, bisphenol S'diphenol, stilbene, 4, 4, _ Biphenol, 2,2,-biphenol, 3,3,,5,5,-tetramethyl-[1,1'-biphenyl]-4,4,monodiol, hydroquinone Diphenol, naphthalenediol, tris-(4-hydroxyphenyl)decane, anthracene, 12,2-tetrakis(4-hydroxyphenyl)ethane, phenols (phenols, alkyl-substituted phenols, naphthols) , alkyl substituted naphthol, dihydroxybenzene, dihydroxynaphthalene, etc.) with formaldehyde, acetaldehyde, benzofural 'p-hydroxybenzaldehyde, o-hydroxybenzaldehyde, p-hydroxyacetophenone, o-hydroxyacetophenone , dicyclopentadiene, furfural, 4,4,-bis(gas methyl)_丨,丨,-biphenyl, 4,4-bis(decyloxymethyl)-1,1'- a polycondensate of 1,4,-bis(gas methyl) stupid, 1,4 bis(decyloxyindenyl)benzene, and the like, and a modified substance such as tetrabromophenol A and the like Polyphenols such as condensates with phenols; compounds such as imidazole, boron trifluoride-amine complex, and hydrazine derivatives, but are not limited Such. The materials may be used singly or in combination of two or more. In the present invention, it is particularly preferred to use a compound having the acid liver structure represented by the above-mentioned sour liver and/or a compound having a carboxylic acid structure represented by the above carboxylic acid resin as a curing agent. A compound having an acid needle structure, particularly preferably: methyltetrahydrophthalic anhydride, methylic acid anhydride, ceric anhydride, hexahydrophthalic anhydride, hydrazine 22 201120084 hexahydro phthalate Butane tetraphthalic anhydride, bicyclo[2Ί]heptane-2,3-diphthalic anhydride, indenylbicyclo[2,2,1]heptane-2,3-dicarboxylic anhydride, cyclohexane-1,2 , 4 - tridecanoic acid - 1, 2-anhydride and the like. Among them, 'espeth is hexahydrophthalic anhydride, mercaptohexahydrophthalic anhydride, cyclohexane-1,2,4-tricarboxylic acid _ 1,2- anhydride represented by the following formula (2) :

〇 (2) (式中,R3表示氫原子、曱基或羧基)。 具有羧酸結構之化合物(以下稱為多羧酸),尤佳為2〜 分B月b基之夕羧酸,更佳為藉由使2〜4官能基之多元醇與 酸酐進行加成反應而獲得之多羧酸。 2〜4 g能基之多元醇,若為具有醇性羥基之化洽 物則無特別限定’可列舉:乙二醇、丙二醇、丨,3 一丙二醇 :广丁二醇、M- 丁二醇、丨,5-戊二醇、1,6—己二醇、 广己院二甲醇、2,4—二乙基戊二醇、2—乙基_2— 丁基— 等醇、降_二醇、二環戊二稀二甲醇 寻一醇類,丙三醇、:r絲® ψ « — # f基乙烷、三羥甲基丙烷、三羥 甲基丁烷、2 —羥基甲其_14 ^ 醇、_ " ,— 丁二醇等三醇類,季戊四 —~二鉍甲基丙烷等四醇類等。 醇、新戊二醇、降莰烯二醇 丙 /之醇類為環己院二甲醇、2,4—二乙基戊 乙基一2— 丁基一丨,3 ^ 甲醇等分支鏈狀或環狀脂肪族醇類 二環戊二烯 23 201120084 /、為製造多㈣時之酸酐,較佳為甲基四氫鄰 '基耐地酸酐、耐地酸酐、六氫鄰笨二甲酸酐 土六虱鄰苯二甲酸酐、丁烷四甲酸酐、雙環[Hi]庚 -二甲酸針、甲基雙環庚烧— 2,3—二甲酸針、壤己 烷—1,2,4 —三甲酸_丨,〗—酐等。 加成反應之條件,並未特別指定,具體之反應條 -係使酸針、多元醇於無觸媒、無溶劑之條件下,於^〜 15〇°C下反應並加熱’反應結束後直接取出之方法。但^ 並不限定於本反應條件。 疋’ 合物: 以上述方法獲得之多_,尤佳為下述式(3)所示 之化〇 (2) (wherein R3 represents a hydrogen atom, a thiol group or a carboxyl group). a compound having a carboxylic acid structure (hereinafter referred to as a polycarboxylic acid), particularly preferably a 2~ minute B-based carboxylic acid, more preferably an addition reaction of a 2~4 functional polyol with an acid anhydride And the polycarboxylic acid obtained. The polyol having 2 to 4 g of the energy group is not particularly limited as long as it is an alcoholic hydroxyl group. Examples thereof include ethylene glycol, propylene glycol, hydrazine, and 3-propanediol: polybutylene glycol and M-butanediol. , hydrazine, 5-pentanediol, 1,6-hexanediol, guangjiyuan dimethanol, 2,4-diethylpentanediol, 2-ethyl-2-butylene, etc. Alcohol, dicyclopentadialdehyde dimethanol diethanol, glycerol, :r silk® ψ « — # f ethane, trimethylolpropane, trimethylolbutane, 2-hydroxyl _ 14 ^ Alcohol, _ ", - butanediol and other triols, tetraols such as pentaerythritol-to-dimethylpropane. Alcohol, neopentyl glycol, norbornenediol, propanol/alcohol are cycloheximide dimethanol, 2,4-diethylpentyl 2- 2 -butyl-anthracene, 3 ^ methanol, etc. Cyclic aliphatic alcohol dicyclopentadiene 23 201120084 /, is an acid anhydride for the production of poly(tetra), preferably methyl tetrahydro ortho-acid anhydride, ceric acid anhydride, hexahydro phthalic anhydride Phthaphthalic anhydride, butane tetracarboxylic anhydride, bicyclo [Hi] heptane-dicarboxylic acid needle, methyl bicycloheptane - 2,3-dicarboxylic acid needle, hexane- 1,2,4-tricarboxylic acid _ Hey, 〗 - Anhydride, etc. The conditions of the addition reaction are not specifically specified. The specific reaction strip is such that the acid needle and the polyol are reacted at a temperature of from 1.5 to 15 ° C under the conditions of no catalyst or solvent, and the reaction is directly after the reaction. The method of taking out. However, ^ is not limited to the reaction conditions.疋' compound: obtained by the above method _, particularly preferably represented by the following formula (3)

(式中,存在複數個之R3獨立地表示氫原子、甲基或叛 基’P表示來自多元醇之碳數2〜20.之鏈狀或環狀脂肪族 基)。 上述式⑺之酸酐、上述式(3)之μ酸分料單獨使 用’或者亦可使用2種以上,較佳為併用式(2)之化合物之 1種以上與式(3)之化合物之i種以上。於併用之情形時, 其使用比率較佳為下述範圍。 W2/(W2 + W3)=0.30 〜0.95 24 201120084 (其令’W2纟示式(2)之化合物之換合重量份,们表示 式(3)之化合物之摻合重量份) W2/(W2 + W3)之範圍,更佳為〇 4〇〜〇 %,進而更佳為 ⑽〜㈣,尤佳為G.6〜G.85。若超過Q 95,則揮發成分 增多之傾向變強,若低於0.30,則成為高黏度,操作變困 難。 本發明之硬化性樹脂組成物中,硬化劑之使用量相對 於環氧樹脂之環氧基1當量,較佳為〇5〜15當量。更佳 為0.7〜1.2當量,尤佳為〇_8〜M當量。相對於環氧基i 當量,硬化劑之使用量未達〇·5當量之情形時,或超過i5 當S之情形時,均有硬化不完全而無法獲得良好之硬化物 性之虞。 於本發明之硬化性樹脂組成物中,亦可與硬化劑一起 併用硬化促進劑(硬化觸媒),或者可不使用硬化劑而單獨使 用硬化促進劑。可使用之硬化促進劑之具體例,可列舉:2 —曱基咪唑、2_苯基咪唑、2—十一烷基咪唑、2_十七烷 基咪唑、2—苯基一 4 一曱基咪唑、1—苄基_2_苯基咪。坐、 1—苄基一2 —曱基咪唑、1—氰基乙基—2—甲基咪唑、 氰基乙基一 2 —苯基咪唑、1—氰基乙基_2一十一烷基咪 唾、2,4 — —胺基一6(2’一曱基咪嗤(1’))乙基一均三口井、2,4 ~二胺基一6(2’ 一十一烷基咪唑乙基-均三口井、2,4 —二胺基一6(2'—乙基一 4 —曱基咪唑(1,))乙基—均三口 井、2,4 —二胺基一6(2'—曱基咪唑(1,))乙基一均三口井—異 三聚氰酸加成物、2 —曱基咪唑異三聚氰酸之2 : 3加成物、 25 201120084 2—笨基咪唑異三聚氰酸加成物、2_苯基一3,5_二羥基甲 基咪唑、2一苯基—4一羥基曱基一5~曱基咪唑、1—氰基 乙基一2—苯基一;3,5 —二氰基乙氧基甲基咪唑等各種咪唑 類,及該等咪唑類與鄰苯二甲酸、間笨二甲酸、對苯二甲 酸、偏苯二曱酸、均苯四曱酸、萘二甲酸、順丁烯二酸、 草酸等多元羧酸之鹽類,二氰基二醯胺等醯胺類,丨,8—二 氤雜雙環(5.4.0)十一烯—7等二氮雜(diaza)化合物及該等之 四笨基硼酸鹽、苯酚酚醛清漆等之鹽類,與上述多元羧酸 類或次膦酸類之鹽類,四丁基溴化銨、鯨蠟基三甲基溴化 鉍、二辛基甲基溴化銨、十六烷基三曱基氫氧化銨等銨鹽, —苯膦、二(曱苯醯基)膦、四苯基溴化鱗、四苯基硼酸四苯 基鱗等膦類或鱗化合物,2,4,6 —三胺基曱基苯酚等酚類, 胺加合物,辛酸錫等金屬化合物等,以及將該等硬化促進 劑製成微膠囊之微膠囊型硬化促進劑等。 於本發明中’較佳為含有鋅鹽及/或鋅錯合物。鋅鹽及/ 或辞錯合物在本發明中作為環氧樹脂與硬化劑之硬化促進 劑而發揮作用。 辞鹽及/或鋅錯合物為以鋅離子作為中心元素之鹽及/ 或錯合物’較佳為含有選自具有對比離子及/或作為配位基 之碳數1〜3 0之烷基之羧酸、磷酸酯、磷酸中之至少丨種。 本發明中尤佳為羧酸鋅體、磷酸酯鋅體。 上述烷基,可列舉:甲基、異丙基、丁基、2—乙基己 基、辛基 '異癸基、異硬脂基、癸基、鯨蠟基等。 本發明中尤佳之羧酸體,較佳為具有鏈狀分支結構之 26 201120084 院基取代基或者具有烯烴等官能基之烷基,更佳為3〜3〇 之碳數。其中尤佳為5〜20之碳數。該等於相溶性方面較 佳’於碳數過大(碳數為30以上)或不具有分支結構、官能 基等結構之情形時,與樹脂之相溶性差,故而欠佳。 具體而言可列舉:2 —乙基己酸鋅、異硬脂酸鋅、十— 碳烯酸鋅等。 本發明中尤佳之碌酸g旨體,較佳為填酸、峨酸酷(單從 基酯體、二烷基酯體、三烷基酯體、或該等之混合物)之辞 鹽及/或鋅錯合物,亦可含有複數個磷酸酯體。具體而言, 所含之磷酸酯中,單烷基酯體、二烷基酯體、三烷基酯體 之莫耳比(以氣相層析法之純度代替,其中,由於必需進行 三曱基矽烷化,故而導致感度出現差異)中,於進行三曱基 矽烷化處理之階段,單烷基酯體之存在量較佳為50面積% 以上。 上述磷酸酯鋅之鋅鹽及/或鋅錯合物例如係藉由使磷酸 酯與例如碳酸鋅、氫氧化鋅等反應,而獲得本發明中使用 之鋅鹽及/或鋅錯合物(專利文獻:EP 699708號公報)。 上述磷酸酯之鋅鹽及/或鋅錯合物之詳細情形,磷原子 與鋅原子之比率(P/Zn)較佳為12〜2 3,更佳為13」2』。 ^佳為"〜…即,於尤佳之形態中,較佳為相對於辞離 1莫耳,磷酸酯(或來自磷酸酯之磷酸)為2〇莫耳以下, 2單純之離子結構,而是具有若干分子藉由離子鍵(或配 2)而相聯繫之結構者。上述鋅鹽及/或鋅錯合物,例如亦 1由日本特表勒―51495號公報所記裁之方法獲得。 27 201120084 上述化合物,市售品之m酸辞可列舉:zn—la —(wherein, a plurality of R3 independently represent a hydrogen atom, a methyl group or a thiol 'P represents a chain or cyclic aliphatic group derived from a polyhydric alcohol having 2 to 20 carbon atoms). The acid anhydride of the above formula (7) and the y acid component of the above formula (3) may be used singly or two or more kinds thereof may be used. Preferably, one or more compounds of the formula (2) are used in combination with the compound of the formula (3). More than one species. In the case of use in combination, the use ratio is preferably in the following range. W2/(W2 + W3)=0.30 〜0.95 24 201120084 (There is a blending weight of the compound of the formula (2), which indicates the blended parts by weight of the compound of the formula (3)) W2/(W2 The range of + W3) is more preferably 〇4〇~〇%, and further preferably (10)~(4), especially better as G.6~G.85. When it exceeds Q 95, the tendency of the volatile component to increase becomes strong, and if it is less than 0.30, the viscosity becomes high and the operation becomes difficult. In the curable resin composition of the present invention, the curing agent is used in an amount of 1 equivalent to the epoxy group of the epoxy resin, preferably 5 to 15 equivalents. More preferably, it is 0.7 to 1.2 equivalents, and particularly preferably 〇8 to M equivalent. With respect to the epoxy group i equivalent, when the amount of the hardener used is less than 5 equivalents, or when i5 is exceeded, the case where S is incomplete, the hardening is incomplete and good hardening properties are not obtained. In the curable resin composition of the present invention, a curing accelerator (curing catalyst) may be used in combination with the curing agent, or a curing accelerator may be used alone without using a curing agent. Specific examples of the hardening accelerator which can be used include 2-nonyl imidazole, 2-phenylimidazole, 2-undecylimidazole, 2-heptadecylimidazole, and 2-phenyl-tetradecyl group. Imidazole, 1-benzyl-2-phenylene. Sodium, 1-benzyl-2-mercaptoimidazole, 1-cyanoethyl-2-methylimidazole, cyanoethyl-2-phenylimidazole, 1-cyanoethyl-2-undecyl Sodium saliva, 2,4 -amino- 6 (2'-indolyl (1')) ethyl-all three wells, 2,4-diamino- 6 (2'-undecylimidazole Ethyl-all three wells, 2,4-diamine- 6 (2'-ethyl-1,4-mercaptoimidazole (1,)) ethyl--three wells, 2,4-diamine- 6 ( 2'-nonyl imidazole (1,)) ethyl one uniform three wells - iso-cyanuric acid adduct, 2-mercaptoimidazole isocyanuric acid 2: 3 adduct, 25 201120084 2 - stupid Imidazolyl isocyanurate adduct, 2-phenyl-1,3-3,5-dihydroxymethylimidazole, 2-phenyl-4-hydroxyindole-5-nonylimidazole, 1-cyanoethyl one Various imidazoles such as 2-phenyl-; 3,5-dicyanoethoxymethylimidazole, and the imidazoles and phthalic acid, meta-dicarboxylic acid, terephthalic acid, and benzoic acid a salt of a polycarboxylic acid such as pyromellitic acid, naphthalene dicarboxylic acid, maleic acid or oxalic acid, or a guanamine such as dicyanodiamine. a salt of diaza, 8-dioxabicyclo(5.4.0) undecene-7, and salts of such tetrasuccinates, phenol novolacs, and the like, and the above polycarboxylic acids or a salt of a phosphinic acid, an ammonium salt such as tetrabutylammonium bromide, cetyltrimethylphosphonium bromide, dioctylmethylammonium bromide or cetyltrimethylammonium hydroxide, or a phenylphosphine a phosphine or a scaly compound such as bis(indolyl)phosphine, tetraphenylphosphonium bromide, tetraphenylboronic acid tetraphenyl scale, or a phenol such as 2,4,6-triaminononylphenol, amine plus a compound such as a metal compound such as tin octylate or the like, and a microcapsule-type hardening accelerator for forming the curing accelerator into microcapsules. In the present invention, it is preferred to contain a zinc salt and/or a zinc complex. The salt and/or the complex compound function as a hardening accelerator for an epoxy resin and a hardener in the present invention. The salt and/or zinc complex is a salt and/or a mixture of zinc ions as a central element. The article 'preferably contains at least one of a carboxylic acid, a phosphate, and a phosphoric acid selected from the group consisting of a comparative ion and/or an alkyl group having a carbon number of 1 to 30 as a ligand. In the present invention, zinc carboxylate or zinc phosphate is preferred. The alkyl group may, for example, be methyl, isopropyl, butyl, 2-ethylhexyl, octyl-isodecyl or isostearyl. The carboxylic acid body of the present invention is preferably a carboxylic acid body having a chain branch structure of 26 201120084, or an alkyl group having a functional group such as an olefin, more preferably 3~ A carbon number of 3 。, particularly preferably a carbon number of 5 to 20. This is preferably equivalent to a case where the carbon number is too large (the carbon number is 30 or more) or has no structure such as a branched structure or a functional group. The compatibility with the resin is inferior, and therefore it is not preferable. Specific examples thereof include zinc 2-ethylhexanoate, zinc isostearate, and zinc 10-carbenoate. Particularly preferred in the present invention is a acid, preferably a salt of acid or citric acid (single base ester, dialkyl ester, trialkyl ester, or a mixture thereof) / or zinc complex, may also contain a plurality of phosphate bodies. Specifically, among the phosphates contained, the molar ratio of the monoalkyl ester, the dialkyl ester, and the trialkyl ester is replaced by the purity of gas chromatography, wherein three In the stage of performing the tridecyl decylation treatment, the amount of the monoalkyl ester body is preferably 50% by area or more. The zinc salt and/or zinc complex of zinc phosphate described above is obtained, for example, by reacting a phosphate with, for example, zinc carbonate, zinc hydroxide or the like to obtain a zinc salt and/or a zinc complex used in the present invention (patent Document: EP 699708). In the case of the zinc salt and/or the zinc complex of the above phosphate, the ratio of the phosphorus atom to the zinc atom (P/Zn) is preferably from 12 to 2 3, more preferably 13"2". ^佳为"~... That is, in the form of Yu Jia, it is preferred that the phosphate (or phosphoric acid derived from phosphate) is less than 2 moles, and the simple ion structure is relative to the deviation of 1 mole. Rather, it has a structure in which several molecules are linked by ionic bonds (or 2). The above-mentioned zinc salt and/or zinc complex compound is also obtained, for example, by the method described in Japanese Patent No. 51495. 27 201120084 The above compounds, commercially available m acid words can be cited: zn-la —

St 602、Zn- St NZ、ZS- 3 ' Zs A ZS一 6、zs—8、zs—8、zs —7、ZS- l〇、ZS—5、zs— 14 (日東化成工業製造)、 4(Klng 製造)、_ Q_pe Zn、12% 〇ct〇pe 〜、8% 0ctope Zn(H〇pe製藥製造);磷酸醋及/或碟酸辞, 可列舉:LBT- 2000B(SC有機化學製造)、狀_92〇6㈤叫 Industry 製造)。 使用該等硬化促進劑中之哪一 #,係根據例如透明 性 '硬化速度、作業條件㈣所得之透明樹脂組成物所要 求之特性而適當選擇。硬化促進劑係相對於環氧樹脂1 〇〇 重量份,通常於0.001〜15重量份,更佳為〇〇1〜5重量份, 尤佳為〇.〇 1〜3重量份之範圍内使用。於本反應中,亦可於 無觸媒之條件下進行硬化,但就防止硬化時之著色之觀點 而言’較佳為添加觸媒。尤其就防止著色且提昇耐腐蝕氣 體特性之觀點而言’較佳為使用鋅鹽及/或鋅錯合物。 於本發明之硬化性樹脂組成物中,亦可含有含礙化合 物作為阻燃性賦予成分。含磷化合物可為反應型者,亦可 為添加型者。含磷化合物之具體例,可列舉:填酸三甲酯、 磷酸三乙酯、磷酸三曱笨酯' 磷酸三(二曱苯)酿(trixylenyl phosphate)、填酸甲苯基二苯酯、構酸甲苯基一2,6 —二(二 曱苯)醋(ere sy 1-2,6-dixy lenyl phosphate)、1,3 —伸苯基雙(二 (二曱苯)磷酸酯)、1,4一伸苯基雙(二(二甲苯)磷酸酯)、4,4’ —聯苯(二(二曱苯)填酸醋)(4,4'-biphenyl(dixylenyl phosphate)等磷酸酯類;9,10 —二氫一 9 —氧雜一10 —膦菲一 28 201120084 10 氧化物(9,1〇-dihydro-9-〇xa-l〇_ph〇sphaSt 602, Zn- St NZ, ZS-3' Zs A ZS-6, zs-8, zs-8, zs-7, ZS-l〇, ZS-5, zs-14 (made by Nitto Kasei Industrial Co., Ltd.), 4 (Manufactured by Klng), _ Q_pe Zn, 12% 〇ct〇pe ~, 8% 0ctope Zn (manufactured by H〇pe Pharmaceuticals); phosphoric acid vinegar and/or dish acid, which can be cited as: LBT-2000B (Manufactured by SC Organic Chemicals) , _92 〇 6 (five) called Industry manufacturing). Which one of these hardening accelerators is used is appropriately selected depending on the properties required for the transparent resin composition obtained by, for example, the transparency 'hardening rate and the working condition (four). The hardening accelerator is usually used in an amount of from 0.001 to 15 parts by weight, more preferably from 1 to 5 parts by weight, even more preferably from 1 to 3 parts by weight, based on 1 part by weight of the epoxy resin. In the present reaction, the curing may be carried out under the conditions of no catalyst, but it is preferable to add a catalyst from the viewpoint of preventing coloration upon hardening. Particularly, from the viewpoint of preventing coloration and improving corrosion-resistant gas characteristics, it is preferred to use a zinc salt and/or a zinc complex. In the curable resin composition of the present invention, an inhibitory compound may be contained as a flame retardancy imparting component. The phosphorus-containing compound may be of a reactive type or an additive type. Specific examples of the phosphorus-containing compound include trimethyl ester, triethyl phosphate, triamyl phosphate, trixylenyl phosphate, toluene diphenyl ester, and acid. Ere sy 1-2,6-dixy lenyl phosphate, 1,3 -phenylene bis(di(biphenyl)phosphate), 1,4 a phenyl bis(di(xylylene) phosphate), 4,4'-biphenyl (dixylenyl phosphate) (4,4'-biphenyl (dixylenyl phosphate) and other phosphates; 9, 10 —Dihydro-9-oxa-10-phosphine-128 2011 20114 4 10 Oxide (9,1〇-dihydro-9-〇xa-l〇_ph〇spha

Phenanthrene-1〇_oxide)、1〇(2,5一二羥基笨基)_ i〇h— 9 — 氧雜一 1〇—膦菲—1〇—氧化物等膦(phosphane)類;使環氧 樹脂與上述膦類之活性氫反應而獲得之含磷環氧化合物、 紅磷等;較佳為磷酸酯類、膦類或含磷環氧化合物,尤佳 為1,3—伸苯基雙(二(二曱苯)磷酸酯)、丨,4一伸苯基雙(二(二 曱苯)磷酸酯)、4,4·_聯苯(二(二甲苯)磷酸酯)或含磷環氧化 合物。含磷化合物之含量較佳為含磷化合物/環氧樹脂 〜〇.6(重量比)。未達〇·ι時,阻燃性不充分;若超過〇 6 ’ 則有對硬化物之吸濕性、導電特性造成不良影響之虞。 進而本發明之硬化性樹脂組成物中,亦可視需要摻合 黏合樹脂。黏合樹脂,可列舉:丁醛系樹脂、縮醛系樹脂、 丙烯酸系樹脂、環氧一尼龍系樹脂、NBR—酚系樹脂、環氧 一 NBR系樹脂、聚醯胺系樹脂、聚醯亞胺系樹脂' 聚矽氧 系樹脂等,但並不限定於該等。黏合樹脂之摻合量較佳為 不損及硬化物之阻燃性、耐熱性之範圍,相對於樹脂成分 100重量份,通常視需要使用〇〇5〜5〇重量份,較佳為〇〇5 〜20重量份。 於本發明之硬化性樹脂組成物中’可視需要添加無機 填充劑。作為無機填充劑,可列舉:結晶二氧化妙、炫融 二氧化矽、氧化鋁、鍅英石、矽酸鈣、碳酸鈣、碳化矽、 氮化矽、氮化硼、氧化鍅、鎂橄欖石、塊滑石、尖晶石、 二氧化鈦、滑石等粉體或將該等球形化而成之顆粒等,但 並不限定於該等。該等填充材料可單獨使用,亦可使用2 29 201120084 =上:該等無機填充劑之含量係使用在本發明之硬化性 二二成物中占。〜95重量%之量。進而,於本發明之硬化 性樹脂組成物中,π $ i ^ ^ 了添加石夕烷偶合劑,硬脂酸、棕櫚酸、 硬脂酸鋅、硬脂酿& # 馱鈣4脫模劑’顏料等各種摻合劑,及各 種熱硬化性樹.脂。 、/:本發月之硬化性樹脂組成物用於光學材料,尤其 是光半導體㈣劑之㈣時,可藉由使用上述所使用之無 機填充材料之粒徑為奈米級水平之填充材料而於不抑制透 ^ 清$下4強機械強度等。就透明性之觀點而言,奈 米級水平之標準較佳為使用平均粒徑為500 nm以下之填充 材;斗尤佳為使用平均粒徑為200 nm以下之填充材料。 於將本發明之硬化性樹脂組成物用於光學材料,尤其 疋光半導體密封劑之情形時,可視需要添加螢光體。螢光 體為例如具有如下作用者:吸收自藍色LED元件發出之藍 色光之一部分,並發出經波長轉換之黃色光藉此形成白 色光之作用者。使螢光體預先分散於硬化性樹脂組成物中 後’社封光半導體。作為螢光體,並無特別限定,可使用 先引A知之螢光體,例如可例示稀土類元素之紹酸鹽、硫 代五倍子酸鹽(thi〇gallate)、原矽酸鹽等。更具體而言可例 舉.YAG螢光體' TAG螢光體、原矽酸鹽螢光體、硫代五 倍子酸鹽、硫化物螢光體等螢光體,例示有YAl〇3 : Ce、 γ3Α15012 : ce、γ4Α12〇9 : Ce、Y202S : Eu、Sr5(P04)3Cl : Eu、(Si"Eu)〇 — Al2〇3等。該螢光體之粒徑,係使用該領域 中公知之粒徑,平均粒徑較佳為1〜25〇以爪,尤佳為2〜 30 201120084 50 口。使用該等螢光體之情形時,其添加量相對於上述 樹脂成分⑽重量份,較佳為卜8〇重量份,更佳為Η。 重量份。 將本發明之硬化讲賠纟日+ 4 G性树月曰組成物用於光學材料,尤其是 光半導體密封劑之情形日年,為狀u办 唷小日f為防止各種螢光體之硬化時沈 降,可添加以二氧化石夕微粉末(亦稱為八⑽^或A⑽〇!) 為代表之搖變性賦予劑。上述二氧切微粉末,例如可列 舉:A⑽川 50、Aerosil 90、Aer〇sU 13〇、Α_διΐ 2〇〇、八⑽州 300 ^ Aerosil 380 ^ AerosU 0X50 . Aerosil TT600 > Aerosi, R972、Aerosil R974、Aerosil R2〇2、Α_π R8i2、—丨 觀s、Aerosll R805、RY2〇〇、RX2〇〇(曰本—公司製 造)等。 於將本發明之硬化性樹脂M成物用於光學材料尤其Phenanthrene-1〇_oxide), 1〇(2,5-dihydroxyphenyl)_i〇h-9-oxa-1-phosphonium- 1〇-phosphine and other phosphanes; a phosphorus-containing epoxy compound, red phosphorus or the like obtained by reacting an oxygen resin with active hydrogen of the above phosphine; preferably a phosphate ester, a phosphine or a phosphorus-containing epoxy compound, particularly preferably a 1,3-phenylene double (bis(diphenylene) phosphate), hydrazine, 4-phenylphenyl bis(di(diphenylene) phosphate), 4,4·-biphenyl (bis(xylene) phosphate) or phosphorus-containing epoxy Compound. The content of the phosphorus-containing compound is preferably a phosphorus-containing compound/epoxy resin ~ 〇.6 (weight ratio). When it is less than ι·ι, the flame retardancy is insufficient; if it exceeds 〇 6 ′, it has an adverse effect on the hygroscopicity and conductive properties of the cured product. Further, in the curable resin composition of the present invention, a binder resin may be blended as needed. Examples of the binder resin include a butyraldehyde resin, an acetal resin, an acrylic resin, an epoxy-nylon resin, an NBR-phenol resin, an epoxy-NBR resin, a polyamide resin, and a polyimine. The resin is a polyoxyphthalic resin or the like, but is not limited thereto. The blending amount of the binder resin is preferably in a range that does not impair the flame retardancy and heat resistance of the cured product, and is usually used in an amount of 5 to 5 parts by weight, preferably 〇〇, per 100 parts by weight of the resin component. 5 to 20 parts by weight. In the curable resin composition of the present invention, an inorganic filler may be added as needed. Examples of the inorganic filler include crystal oxidizing, sulphur dioxide, alumina, bismuth, calcium silicate, calcium carbonate, strontium carbide, tantalum nitride, boron nitride, cerium oxide, forsterite. A powder such as talc, spinel, titanium dioxide or talc, or particles obtained by spheroidizing the particles, etc., but is not limited thereto. These filler materials may be used singly or in the form of 2 29 201120084 = top: the contents of the inorganic fillers are used in the curable di-halide of the present invention. ~95% by weight. Further, in the curable resin composition of the present invention, π $ i ^ ^ is added with an oxalate coupling agent, stearic acid, palmitic acid, zinc stearate, stearin &# 驮 calcium 4 release agent Various pigments such as pigments, and various thermosetting trees. / /: The curing resin composition of this month is used for optical materials, especially (4) of the photo-semiconductor (4) agent, by using the inorganic filler material used in the above-mentioned inorganic filler material to have a nanometer-level filling material. It does not inhibit the mechanical strength of the top 4 and the like. From the viewpoint of transparency, the standard for the nano-level is preferably a filler having an average particle diameter of 500 nm or less; and Doujia is a filler having an average particle diameter of 200 nm or less. When the curable resin composition of the present invention is used for an optical material, particularly a calendered semiconductor encapsulant, a phosphor may be added as needed. The phosphor is, for example, a person who absorbs a portion of the blue light emitted from the blue LED element and emits wavelength-converted yellow light to thereby form white light. The phosphor is preliminarily dispersed in the curable resin composition, and the photo-semiconductor is sealed. The phosphor is not particularly limited, and a phosphor of the above-mentioned type can be used. For example, a rare earth element acid salt, a thiogallate, or a protoporate can be exemplified. More specifically, a phosphor such as a YAG phosphor ' TAG phosphor, a protonate phosphor, a thiogallate, or a sulfide phosphor can be exemplified, and YAl〇3 : Ce is exemplified. γ3Α15012 : ce, γ4Α12〇9 : Ce, Y202S : Eu, Sr5(P04)3Cl : Eu, (Si"Eu)〇-Al2〇3, and the like. The particle diameter of the phosphor is a particle diameter well known in the art, and the average particle diameter is preferably from 1 to 25 Å to the claw, particularly preferably from 2 to 30, 2011, 2008, and 50. In the case of using such a phosphor, the amount thereof is preferably 8 parts by weight, more preferably Η, based on the weight of the resin component (10). Parts by weight. The hardening of the present invention is used for the use of optical materials, especially in the case of optical semiconductor encapsulants, for the purpose of preventing the hardening of various phosphors. When it settles, it is possible to add a shake denature imparting agent represented by a white oxide powder (also referred to as eight (10) or A (10) 〇!). Examples of the above-mentioned dioxygen fine powder include A(10)chuan 50, Aerosil 90, Aer〇sU 13〇, Α_διΐ 2〇〇, 八(10)州300^ Aerosil 380 ^ AerosU 0X50 . Aerosil TT600 > Aerosi, R972, Aerosil R974 , Aerosil R2〇2, Α_π R8i2, 丨 s s, Aerosll R805, RY2 〇〇, RX2 〇〇 (曰本—Manufactured by the company). The use of the curable resin M of the present invention for optical materials, in particular

是光半導體密封劑之情料,為防止著色,可含有作為I 穩疋知丨之月女化合物或作為抗氧化材料之磷系化合物及酚 系化合物。 上述胺化合物,例如可列舉:1,2,3,4一 丁烷四曱酸四 〇,2,2,6,6—五甲基—4、。底。定基)®旨、1,2,3,4— 丁烧四甲酸四 (2,2,6,6_四甲基一4〜°辰嘴基)S旨、1,2,3,4— 丁烷四曱酸與 1,2,2,6,6—五甲基-4”底〇定醇及39—雙(2 一羥基— -曱基乙基)-2’4’8,1〇〜四氧雜螺[5 5]十一烷之混合酯化 物;癸二酸雙(2,2,6,6'四甲基-4-。底咬基)癸二酸醋、碳 酸雙(1-十—⑥氧基-2,2,6,6—四甲基㈣—4—基)醋、甲 基丙稀酸2,2,66_四甲其 . u ’ T基—哌啶基酯、癸二酸雙(2,2,6,6 31 201120084 —四甲基一 4 —哌啶基)g旨、癸二酸雙(mGj —五甲基—4 一哌啶基)酯、4 —苯甲醯氧基—2,2,6,6 —四甲基哌啶、工— [2— [3—(3,5— 一 一第三丁基_4一經基苯基)丙醯氧基]乙 基]—4 — [3 —(3,5 —二一第三丁基—4一羥基苯基)丙醯氧基] —2,2,6,6—四甲基哌啶、曱基丙烯酸ι,2,2,6,6—五曱基—4 一0底。定基醋、{[3,5—雙(ι,ι —二甲基乙基)—4一經基苯基] 甲基}丁基丙二酸雙(1,2,2,6,6—五曱基一 4 —派咬基)@旨、癸 一酸雙(2,2,6,6 —四曱基一 1一(辛基氧基)一 4一〇底u定基)酉旨, 1,1—二曱基乙基氫過氧化物與辛烷之反應產物, N,N’,N”,N’’| —四一(4,6—雙(丁基一(N—曱基一2,2,6,6-四 曱基哌啶一4 —基)胺基)—三口井一 2—基)一4,7—二氮雜癸 —1,10 — 二胺、二丁胺 ~ 1,3,5 —三口井一N,N,一雙(2,2,6,6 一四甲基一4 —哌咬基一ι,6—己二胺與N — (2,2,6,6 —四曱 基一4 —哌啶基)丁胺之縮聚物,聚{[6—(1,1,3,3—四甲基丁 基)胺基一1,3,5 —三口井—2,4 —二基][(2,2,6,6 —四曱基 一 4 —哌啶基)亞胺基]六亞甲基[(2,2,6,6—四甲基一 4 —哌啶基) 亞胺基]}' 丁二酸二曱酯與4 —羥基一 2,2,6,6_四甲基一 1 —哌啶乙醇之聚合物’ 2,2,4,4 —四甲基一 2〇—(召一月桂基 氧基幾基)乙基一7—氧雜一3,20—二氮雜二螺[5丄11_2]二 Η--烧一 21—酮、/5 —丙胺酸,ν—(2,2,6,6 —四曱基—4 — 0底°定基)一十二炫•基雖/十四烧基醋、Ν—乙醯基一3--二烧 基一1 一(2,2,6,6 —四曱基一4 —派σ定基)0比洛咬一2,5 一二 酮、2,2,4,4 _四曱基~7 —氧雜一 3,20 —二氮雜二螺 [5,1,11,2]二十一烷一 21 —酮、2,2,4,4 一四甲基一 21— 氧雜 32 201120084 —3,20—二氮雜雙環—[”,丨丨”一二十一烷—⑽〜丙酸十 二烷基酯/十四烷基酯、丙二酸、[(4—甲氧基苯基)—亞曱基] -雙(1,2,2,6,6 —五甲基—4_哌啶基)醋、2,2,6,ό_四甲基_ 4_哌啶醇之高級脂肪酸醋,苯二甲醯胺、N,N,—雙 (2,2,6,6 —四甲基一 4_哌啶基)等受阻胺系八苯鲷等二笨 曱酮系化合物,2—(2H —苯并三唑一2一基)一 4一(Ul 3 3_ 四甲基丁基)苯酚、2—(2—羥基一5—甲基苯基)苯并三唑、 2 [2羥基—3 — (3,4,5,6 —四氫鄰苯二甲醯亞胺—曱基) —5 —曱基苯基]苯并三唑、2一(3 一第三丁基_2 —羥基一 $ 甲基本基)—5 —亂本弁三。坐、2—(2 —經基一3,5 —二一第 二戊基本基)苯并三σ坐、3—(3—(2H—苯并三唾一 2 —基)一 5 —第三丁基一4 —羥基苯基)丙酸曱酯與聚乙二醇之反應產 物,2 —(2Η —苯并三唑—2 -基)一 6--}二烧基一 4__甲基苯 酉分等苯并三唑系化合物’ 2,4—二一第三丁基苯基—3,5_二 —第三丁基一 4 —羥基苯甲酸酯等苯甲酸酯系,2 — (4,6—二 苯基一 1,3,5—三口井一 2 一基)_5一 [(己基)氧基]苯酚等三 口井系化合物等,尤佳為受阻胺系化合物。 上述光穩定材料之胺化合物可使用如下所示之市售 品。 市售之胺系化合物,並無特別限定,例如可列舉:汽 巴精化(Ciba Specialty Chemicals)公司製造之 TINUVIN 765、TINUVIN 770DF、TINUVIN 144、TINUVIN 123、 TINUVIN 622LD、TINUVIN 152、CHIMASSORB 944, Adeca 製造之 LA—52、LA — 57、LA— 62、LA— 63P、LA—77Y、 33 201120084 LA-81、LA— 82、LA—87 等。 上述磷系化合物,並無特別限定,例如可列舉:丨丄3 一三(2 —甲基一4—二(十三烷基)亞磷酸酯—5_第三丁基 苯基)丁烧、二硬脂基季戊四醇二亞碟酸醋、雙(2,4—二— 第二丁基苯基)季戊四醇二亞磷酸酯、雙(2,6一二—第三丁 n甲基苯基)季戊四醇二亞鱗酸醋、苯基雙⑽a季戍 四醇二亞磷酸酯、-掙p 1^ 一 一環己基季戍四醇二亞磷酸酯' 亞磷酸 三(二二基苯基)醋、亞磷酸三(二-異丙基苯基)S旨、亞磷酸 三(二—正丁基苯基㈣、亞磷酸三(2,4_二—第三丁基苯基) 酿、亞磷酸三(2 6_二—第= 乐一丁基本基)S旨、亞填酸三(2,6 — 一第二丁基苯基)醋、2,2,一亞甲基雙(4,6 —二一第三丁基 苯基)(2,4〜二—第三丁基苯基)亞磷酸醋、2,2,—亞曱基^ (4,6 —二一第三丁基苯基)(2 —第三丁基—甲基苯基%亞 恤、2,2,…基雙(4—甲基—6_第三丁基苯基)(2 — 基4甲基本基)亞鱗酸醋、2,2·—亞乙基雙(4 一曱 ^ 6第二丁基苯基)(2—第三丁基—4~~甲基苯基)亞磷 酸酯、四(2,4__—笙-丁甘朴试、,,, 一一第二丁基本基)一 4,4 -伸聯苯基二亞膦 酸 酯 (tetrakisCl^-di-tert-butylphenyO^^'-biphenylenephosphoni te)、四(2,4〜二一第三丁基笨基)—4,3,_伸聯苯基二亞膦酸 酿 酯 S旨 酯 四(2,4 四(2,6 四(2,6 四(2,6 二一第三丁基笨基)一3,3,一伸聯苯基二亞膦酸 二一第三丁基苯基)—4,4’ 一伸聯苯基二亞膦酸 一—第二丁基笨基)—4,3'—伸聯苯基二亞膦酸 二一第三丁基苯基)一3,3,一伸聯苯基二亞膦酸 34 201120084 酯、雙(2,4 一二一第三丁基苯基)一 4 —苯基—笨基亞膦酸 酯、雙(2,4 —二一第三丁基苯基)一 3_苯基—苯基亞膦酸 酯、雙(2,6 —二一正丁基苯基)—3—苯基—苯基亞膦酸酯、 雙(2,6 —二一第三丁基苯基)—4 一苯基一苯基亞膦酸酯、雙 (2,6—二一第二丁基苯基)_3_笨基一苯基亞膦酸酯、四 (2,4 —二_第三丁基一 5—曱基苯基)一4,4,一伸聯苯基二亞 膦酸醋、石粦酸二丁 S旨、碟酸三曱I旨、鱗酸三曱苯醋、構酸 二本醋、填酸二亂笨醋、填酸三乙g旨、碌酸二笨基曱苯g旨、 填酸二苯基單鄰聯苯酯(diphenyl monoorth〇xenyl phosphate)、磷酸三丁氧基乙酯、磷酸二丁酯、鱗酸二辛酯、 磷酸二異丙酯等。 上述磷系化合物亦可使用市售品。作為市售之磷系化 合物,並無特別限定,例如可列舉:Adeca製造之Adekastab PEP - 4C、Adekastab PEP - 8、Adekastab PEP - 24G、In the case of a photo-semiconductor sealant, in order to prevent coloring, it may contain a female compound which is a stable compound of I or a phosphorus-based compound and a phenolic compound which are antioxidant materials. The above amine compound may, for example, be 1,2,3,4-butanetetradecanoic acid tetraruthenium, 2,2,6,6-pentamethyl-4. bottom.定)), 1, 2, 3, 4 - butyl tetracarboxylic acid tetra (2, 2, 6, 6 - tetramethyl - 4 ~ ° Chen mouth base) S, 1, 2, 3, 4 - D Alkanoic acid and 1,2,2,6,6-pentamethyl-4"-decyl alcohol and 39-bis(2-hydroxy-indolylethyl)-2'4'8,1〇~ Mixed esterified product of tetraoxaspiro[5 5]undecane; bis(2,2,6,6'tetramethyl-4-.sub.2) azelaic acid citrate, carbonated double (1- Tetra- 6-oxy-2,2,6,6-tetramethyl(tetra)-4-yl)acetate, methyl acrylate 2,2,66_tetramethyl. u 'T-based piperidyl ester, Sebacic acid bis(2,2,6,6 31 201120084-tetramethyl-4-piperidyl) g, azelaic acid bis(mGj-pentamethyl-4piperidinyl) ester, 4-benzene Methoxyoxy-2,2,6,6-tetramethylpiperidine, work-[2-[3—(3,5-a mono-t-butyl-4-phenyl-phenyl)propenyloxy] Ethyl]—4 — [3 —(3,5—di-tert-butyl-4-hydroxyphenyl)propenyloxy]-2,2,6,6-tetramethylpiperidine, methacrylic acid ι,2,2,6,6-penta-yl- 4-a. Base vinegar, {[3,5-bis(ι,ι-dimethylethyl)-4-pyridylphenyl]methyl} Butylmalonic acid bis(1,2,2,6,6-pentamethyl- 4-strand), the purpose of bismuth, bismuth (2,2,6,6-tetradecyl-l-(辛 氧基 oxy) 一 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 One (4,6-bis(butyl-(N-fluorenyl-2,2,6,6-tetradecylpiperidine-4-yl)amino)-three wells 2-base)-4,7 - diazepine - 1,10 - diamine, dibutylamine ~ 1,3,5 - three wells - N, N, one pair (2,2,6,6-tetramethyl- 4-piperidyl a polycondensate of ι,6-hexanediamine and N-(2,2,6,6-tetradecyl-4-piperidinyl)butylamine, poly{[6—(1,1,3,3— Tetramethylbutyl)amino-1,3,5 - three wells - 2,4-diyl][(2,2,6,6-tetradecyl-4-piperidyl)imine] Methylene [(2,2,6,6-tetramethyl-4-cyclopiperidyl)imido]]' didecyl succinate and 4-hydroxy-2,2,6,6_tetra Base-1 - piperidine ethanol polymer '2,2,4,4-tetramethyl- 2 〇-(calling a lauryloxy)ethyl-7-oxa-3,20-two Aza-bispiro[5丄11_2]diazine--burning a 21-ketone,/5-alanine, ν-(2,2,6,6-tetradecyl- 4-0 base)12 Hyun • Base Although/14-burning vinegar, Ν-acetamido- 3--di-burning one-one one (2,2,6,6-tetradecyl-4--sigma-based base) 2,5-dione, 2,2,4,4 _tetradecyl~7-oxa-3,20-diazabispiro[5,1,11,2]octadecane- 21-one , 2,2,4,4-tetramethyl-21-oxa 32 201120084- 3,20-diazabicyclo-[",丨丨"-tetradecane-(10)-dodecyl propionate /Tetradecyl ester, malonic acid, [(4-methoxyphenyl)-fluorenylene]-bis(1,2,2,6,6-pentamethyl-4piperidinyl) vinegar , 2,2,6,ό_tetramethyl-4_piperidinol, higher fatty acid vinegar, phthalicinamine, N,N,-bis(2,2,6,6-tetramethyl-4_ A pipecyanyl compound such as piperidinyl) is a bismuthone compound such as octaphenylfluorene, 2-(2H-benzotriazol-2-yl)-4-yl (Ul 3 3_tetramethylbutyl)phenol, 2- (2-hydroxy-5-methylphenyl)benzotriazole, 2 [2 hydroxy-3-(3,4,5,6-tetrahydroortylene) A (PEI) - Yue-yl) -5 - Yue phenyl] benzotriazole, a 2 (3-tert-butyl _2 - $ hydroxy-methyl substantially yl) -5 - chaos present Bian III. Sit, 2-(2 - via base 3, 5 - 2nd second pentyl base) benzotriazine, 3-(3 - (2H - benzotrisin-2-yl)-5 - third The reaction product of butyl 4-hydroxyphenyl) propionate and polyethylene glycol, 2-(2Η-benzotriazol-2-yl)-6--}dialkyl- 4__methylbenzene Benzene and other benzotriazole-based compounds '2,4-di-tert-butylphenyl-3,5-di-t-butyl-4-hydroxybenzoate, etc., 2 - (4,6-diphenyl- 1,3,5-three wells-one-one base) _5-[(hexyl)oxy]phenol and the like are three well compounds, and particularly preferred are hindered amine compounds. As the amine compound of the above light-stable material, a commercially available product as shown below can be used. The commercially available amine-based compound is not particularly limited, and examples thereof include TINUVIN 765, TINUVIN 770DF, TINUVIN 144, TINUVIN 123, TINUVIN 622LD, TINUVIN 152, CHIMASSORB 944, Adeca manufactured by Ciba Specialty Chemicals. LA-52, LA-57, LA-62, LA-63P, LA-77Y, 33 201120084 LA-81, LA-82, LA-87, etc. are manufactured. The phosphorus-based compound is not particularly limited, and examples thereof include ruthenium 3 -tris(2-methyl-tetra-di(tridecyl)phosphite-5-t-butylphenyl) butadiene. Distearyl pentaerythritol di arsenic acid vinegar, bis(2,4-di-t-butylphenyl) pentaerythritol diphosphite, bis(2,6 di-t-butyl n-methylphenyl)pentaerythritol Diammonium citrate, phenyl bis(10)a quaternary tetraol diphosphite, - earned p 1 ^ one cyclohexyl quinone quinone di bis phosphite tributite tris(diphenylphenyl) vinegar, sub Tris(di-isopropylphenyl)S phosphate, tris(di-n-butylphenyl)tetraphosphate, tris(2,4-di-t-butylphenyl)phosphoric acid, triphosphoric acid 2 6_二—第=乐一乙基基) S, sub-acid three (2,6-a second butylphenyl) vinegar, 2,2, monomethylene double (4,6 - two a tributylphenyl)(2,4~di-t-butylphenyl)phosphite sorbate, 2,2,-indenylene group (4,6-di-tert-butylphenyl) 2 —T-butyl-methylphenyl% t-shirt, 2,2,... bis(4-methyl-6_t-butylphenyl) (2 — 4-methyl-based linoleic acid vinegar, 2,2--ethylene bis(4 曱^6 second butyl phenyl) (2-t-butyl-4~~methylphenyl)phosphorous acid Ester, tetrakis (2,4__-indole-butanol, try,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,, -biphenylenephosphoni te), tetrakis(2,4~two-t-butyl butyl) - 4,3,_stranded phenyldiphosphinic acid enriched ester S-ester four (2,4 four (2,6 four (2,6 four (2,6 two one third butyl styl) one 3,3, one extended biphenyl diphosphinic acid di-tert-butylphenyl) - 4,4' one extended biphenyl Phosphonic acid--t-butylphenyl)- 4,3'-extended biphenyldiphosphinic acid di-t-butylphenyl)-3,3,-extended biphenyldiphosphinic acid 34 201120084 Ester, bis(2,41-2 dibutylphenyl)-4-phenyl-phenylphosphinate, bis(2,4-di-t-butylphenyl)-3-phenyl —Phenylphosphonite, bis(2,6-di-n-butylphenyl)-3-phenyl-phenylphosphinate, bis(2,6-di-t-butylphenyl) —4 benzene Benzyl phenylphosphinate, bis(2,6-di-dibutyl butylphenyl)_3-phenylphenylphosphonate, tetrakis(2,4-di-t-butyl- 5 -nonylphenyl)- 4,4,1-biphenyldiphosphinic acid vinegar, dibutyl succinic acid, sodium sulphate, sulphuric acid, sulphuric acid, vinegar, filling The acid is ridiculously vinegar, the acid is filled with triethylene g, the acid is diphenyl benzene, the diphenyl monoorth xenyl phosphate, the tributoxyethyl phosphate, the phosphoric acid Dibutyl ester, dioctyl phthalate, diisopropyl phosphate, and the like. Commercially available products can also be used as the phosphorus compound. The commercially available phosphorus-based compound is not particularly limited, and examples thereof include Adekastab PEP-4C manufactured by Adeca, Adekastab PEP-8, Adekastab PEP-24G, and

Adekastab PEP- 36 ^ Adekastab HP- l〇 > Adekastab 2112^Adekastab PEP- 36 ^ Adekastab HP- l〇 > Adekastab 2112^

Adekastab 260、Adekastab 522A、Adekastab 1178、Adekastab 1500 ^ Adekastab C ^ Adekastab 135A ^ Adekastab 3010 ^ Adekastab TPP。 作為酚化合物,並無特別限定,例如可列舉:2,6 —二 —第三丁基一4—甲基苯酚、3〜(3,5—二—第三丁基—4 — 羥基苯基)丙酸正十八烷基酯、四[亞甲基—3_(3 5一二—第 三丁基一4一羥基苯基)丙酸酯]甲烷、2,4—二—第三丁基一 6-曱基苯酚、1,6-己二醇—雙一 [3—〇,5_二—第三丁基 —4—羥基苯基)丙酸酯]、三(3,5—二—第三丁基—4—羥基 35 201120084 节基)一異氰尿酸醋、1,3,5—三甲基_2,4,6 一三(3,5—二— 第二丁基一 4一羥基苄基)笨、季戊四醇一四[3 — (3,5 —二一 第三丁基—4 —羥基苯基)丙酸酯]' 3,9一雙一{2— [3 — (3 — 第三丁基一4 —羥基一5 —甲基苯基)一丙酿氧基]一 ^—二 甲基乙基} — 2,4,8,10 —四氧雜螺[5,5]十一烷、三乙二醇—雙 [3—(3 —第三丁基一5—甲基—4 —羥基苯基)丙酸酯]、2,2, _亞丁基雙(4,6—二一第三丁基苯酚)、4,4,—亞丁基雙(3_ 曱基一6 —第三丁基笨酚)、2,2,一亞甲基雙(4_曱基一 6 —第 三丁基苯酚)、2,2’ 一亞甲基雙(4 —乙基一 6 —第三丁基苯 酚)、2 —第三丁基一6 —(3 —第三丁基一 2 —羥基一 5 —甲基 卞基)4 曱基本盼丙稀酸自旨' 2 — [1 — (2 —經基一3,5 ~二 —第二戊基苯基)乙基]一 4,6—二一第三戍基苯基丙稀酸 酯、4,V —硫基雙(3—曱基一6 —第三丁基笨酚)、4,4·—亞丁 基雙(3 —曱基一 6 -第三丁基苯酚)、2 -第三丁基一4 一甲基 本齡、2,4一二—第三丁基苯紛、2,4 _二一第三戊基苯i分、 4,4'_硫基雙(3 —甲基一 6 —第三丁基苯酚)、4,4’一亞丁基雙 (3 —甲基一6 —第三丁基苯酚)、雙[3,3—雙(4’_羥基一3·— 第三丁基苯基)_ 丁酸]一二醇酯、2,4 一二一第三丁基苯 盼、2,4—二一第三戍基苯紛、2—[1 一(2—經基一3,5 —二一 第三戊基笨基)乙基]—4,6—二一第三戊基苯基丙稀酸醋、 雙[3,3 —雙(4,一羥基一 3,一第三丁基苯基)一丁酸]—二醇酯 等。 上述酚系化合物亦可使用市售品。市售之酚系化合 物,並無特別限定,例如可列舉:汽巴精化公司製造之 36 201120084 IRGANOX 1010、IRGANOX 1035、IRGANOX 1076、 IRGANOX 1135、IRGANOX 245、IRGANOX 259、IRGANOX 295、IRGANOX 3114、IRGANOX 1098、IRGANOX 1520L, Adeca 製造之 Adekastab AO — 20、Adekastab AO — 30、 Adekastab AO— 40 ' Adekastab AO— 50 ' Adekastab AO — 60、Adekastab AO— 70、Adekastab AO— 80、Adekastab AO 一 90、Adekastab AO — 3 30,住友化學工業製造之 Sumilizer GA — 80、Sumilizer MDP — S、Sumilizer BBM — S、Sumilizer GM、Sumilizer GS(F)、Sumilizer GP 等。 除此以外,亦可使用市售之添加材料作為樹脂之防著 色劑。例如可列舉:汽巴精化公司製造之TINUVIN 328、 TINUVIN 234、TINUVIN 326、TINUVIN 120、TINUVIN 477'TINUVIN 479' CHIMASSORB 2020FDL'CHIMASSORB 119FL 等。 較佳為含有上述填系化合物、胺化合物、紛系化合物 中之至少1種以上,其摻合量,並無特別限定,相對於該 硬化性樹脂組成物,為0.005〜5.0重量%之範圍。 本發明之硬化性樹脂組成物係藉由將各成分均勻混合 而獲得。本發明之硬化性樹脂組成物可利用與先前已知之 方法相同之方法而容易地製成其硬化物。例如可列舉如下 方法:將環氧樹脂、選自硬化劑及硬化促進劑中之至少1 種、含麟化合物、黏合劑樹脂、無機填充材料以及摻合劑, 視需要利用擠出機、捏合機、輥研磨機、行星式混合機等, 充分混合直至變得均勻而獲得硬化性樹脂組成物,於該硬 37 201120084 化性樹脂組成物為液態之情形時,灌注(p〇tting)或澆鑄 (casting)該硬化性樹脂組成物使其含浸於基材中 '流入於模 具中並澆铸成型’藉由加熱而硬化,又,於固態之情形時, 使用熔融後澆鑄或轉注成型機等進行成型,進而藉由加熱 而硬化。硬化溫度為80〜 200t,硬化時間為2〜1〇小時二 硬化方法’可於高溫下一次性凝固,但較佳為逐步升溫而 進行硬化反應。具體而言,& 8〇〜15旳之間進行初始硬 化於100 C 200 C之間進行後硬化。硬化之階段,較佳 為为2〜8個階段升溫,更佳為2〜4個階段。 又,可使本發明之硬化性樹脂組成物溶解於曱笨、二 曱苯、丙酮、甲基乙基酮、曱基異丁基酮、二曱基甲醯胺、 二甲基乙醯胺、N-甲基吼略。定酮等溶劑中,製成硬化性樹 脂組成物清漆,使其含浸於玻璃纖維、碳纖維、聚酯纖維、 聚醯胺纖維、氧化鋁纖維、紙等基材中,進行加熱乾燥, 將所得之預浸體熱壓成形’藉此製成本發明之硬化性樹脂 組成物之硬化物^此時之溶劑係使用在本發明之硬化性樹 脂組成物與該溶劑之混合物中通常占1〇〜7〇重量%、較佳 為15〜70重量%之量。又’亦可以液態組成物之狀態,以 R™(Resin Transfer MGlding)方式獲得含有碳纖維之硬化 性樹脂硬化物。 又’亦可使用本發明之硬化性樹脂組成物作為膜型密 封用組成^於獲得上述膜型樹餘成物之情形時,可列 舉如下方法:#先將本發明之硬化性樹脂組成物製成如上 所述之硬化性樹月旨組成物清漆,將其塗佈於剝離膜上,於 38 201120084 加熱下去除溶劑後進行B階段化;可藉此以片狀接著劑之 方式獲得膜型密封用組成物。該片狀接著劑可用作多層基 板等之層間絕緣層、光半導體之總括膜密封。 繼而,對將本發明之硬化性樹脂組成物用作光半導體 之狁封材料或固晶(die bonding)材料之情形進行詳細說明。 於使用本發明之硬化性樹脂組成物作為高亮度白色 led等光半導體之密封材料、或固晶材料之情形時,藉由 :本發明之環氧樹脂以外’將含有多元羧酸之硬化劑(硬化 劑組成物)、硬化促進劑、偶合材料、抗氧化劑、光穩定劑 等添加物充分混合而製備硬化性樹脂組成物。混合方法, 要利用捏合機、三親研磨機、萬能混合機、#星式混合 機、均質混合機、均勻分散機、珠磨機等,於常溫下或加 熱而混合即可。所得之硬化性樹脂組成物可用於密封材 料,或用於固晶材料與密封材料兩者。 南免度白色LED等光半導體元件通常係使用接著劑(固 晶材料”使積層於藍寶石、尖晶石、ΜϋΟ等基板 上之 G a A s、G a P、G a A1Α ς、r· a η uaAlAs、GaAsP、A1Ga、InP、GaN、InN、 N InGaN等半導體晶片接著於引線框架或放熱板、封裝 而成亦有為流通電流而連接有金屬導線等導線之類 型。該半導體晶片係朱丨& ’、用衣氣樹脂等密封材料將其周圍密 封。役封材料係用以保罐坐描λ m °半導體晶片不受熱或濕氣之景ί I,且發揮透鏡功能之作用 〜 &作用者。本發明之硬化性樹脂組成 物可用作上述密封材料或 取 口曰日材料。就步驟上而言,較佔 為將本發明之硬化性谢4 树月曰級成物用於固晶材料與密封材料 39 201120084 兩者。 使用本發明之硬化性樹脂組成物將半導體晶片接I& 基板上之方法,可列舉如下方法:將本發明之硬化性樹脂 組成物藉由分注4 $ 益/崔/主或網版印刷塗佈於基板上之後, 將半導體晶片置於上述硬化、^ 化性树爿日組成物上’進行加熱硬 化。藉由該方法,可使半導體晶片接著於基板上。加轨時 可使用熱風循環式、紅外線、高頻波等方法。 加熱條件例如較佳為於8〇〜23〇t:加熱i分鐘〜Μ小 時左右。為降低加熱硬化時產生之内部應力,例如可於肋 C下使其預硬化30分鐘〜5小時後,以12〇〜1 8〇它、 3 0刀1 〇小時之條件使其後硬化。 —密封材料之成形方式,係使用:於插人有以上述方式 固疋有半導體晶片之基板之模框内注入密封材料後,進行 …更化而成形之注入方式;及於模具中預先注入密封材 料’使固定於基板上之半導體晶片浸潰於其中,進行加熱 硬化後,自模具中脫模之壓縮成形方式等。 ' 方法可列舉.分注器、轉注成形、射出成形等。 加熱可使用熱風循環式、紅外線、高頻波等方法。 加熱條件例如較佳為〜230°C、1分鐘〜24小時左 右。為降低加熱硬化時產生之内部應力,例如可於8〇〜丨二 C下進仃30分鐘〜5小時預硬化之後,以12〇〜18〇。匸、% 分知〜1 〇小時之條件進行後硬化。 進而’本發明之硬化性樹脂組成物之用途並不限定於 ' '途亦可應用於使用環氧樹脂等硬化性樹脂之—般 40 201120084 用迷 、 5,例如可舉出· ifc & π 成形材料(包括片、 J羋出.接者劑、塗料、塗佈劑、 電線包覆等)、卜、RP等)、絕緣材料(包括印刷基板、 樹脂組成物,:::才料,此外之密封材料、基板用氰酸酉旨 並他樹m 用硬化劑之於丙烯酸醋系樹脂等 ”他树月曰4中之添加劑等。 接著劑,4· 4· m '、土木用、建築用气車 醫療用接著A皁用、&事務用、 之電子㈣ ’可列舉電子材料用接著劑。該等之中 之電子材料用接著劑, 基板之層間接著#卜 ·日層(bUlld_UP)基板等多層Adekastab 260, Adekastab 522A, Adekastab 1178, Adekastab 1500 ^ Adekastab C ^ Adekastab 135A ^ Adekastab 3010 ^ Adekastab TPP. The phenol compound is not particularly limited, and examples thereof include 2,6-di-t-butyl-4-methylphenol and 3~(3,5-di-t-butyl-4-hydroxyphenyl). N-octadecyl propionate, tetrakis[methylene-3-(3,5-di-tert-butyl-4-hydroxyphenyl)propionate]methane, 2,4-di-t-butyl- 6-nonylphenol, 1,6-hexanediol-bis-[3-indene, 5-di-tert-butyl-4-hydroxyphenyl)propionate], three (3,5-di- Tributyl-4-hydroxy 3 201120084 base) an isocyanuric acid vinegar, 1,3,5-trimethyl-2,4,6-tris(3,5-di-t-butyl-4-hydroxyl Benzyl) stupid, pentaerythritol-four [3 - (3,5-di-di-tert-butyl-4-hydroxyphenyl)propionate]', 3,9-double one {2—[3—(3— Tributyl- 4-hydroxy-5-methylphenyl)-propanyloxy]-^-dimethylethyl}-2,4,8,10-tetraoxaspiro[5,5]Eleven Alkane, triethylene glycol-bis[3-(3-t-butyl-5-methyl-4-hydroxyphenyl)propionate], 2,2, _butylene bis (4,6-two Third butyl phenol), 4, 4 , -butylidene bis(3_ fluorenyl-6-tert-butyl phenol), 2,2, monomethylene bis(4_fluorenyl-6-tert-butylphenol), 2,2' a Methyl bis(4-ethyl-6-t-butylphenol), 2-t-butyl-6-(3-t-butyl-2-hydroxy-5-methylindenyl) 4 曱Acrylic acid from the purpose ' 2 — [1 — (2 — via a 3,5-di-second-pentylphenyl)ethyl]- 4,6-di-tridecylphenyl acrylate , 4,V-thio bis(3-indenyl-6-t-butyl phenol), 4,4·-butylidene bis(3-indenyl-6-tert-butylphenol), 2 - Tributyl-4-methyl primary, 2,4-12-t-butylbenzene, 2,4-di-di-p-butyl benzene i, 4,4'-thiobis(3-methyl a 6-tert-butylphenol), 4,4'-butylene bis(3-methyl-6-t-butylphenol), bis[3,3-bis(4'-hydroxy-3-- Tributylphenyl)-butyric acid]-glycol ester, 2,4 1-2 tert-butyl benzene, 2,4-di- 3 decyl benzene, 2-[1 (2) Base one 3,5 - two one third pentyl stupid Ethyl]-4,6-di-p-third amyl phenyl acrylate vinegar, bis[3,3-bis(4,1-hydroxy-3,-tributylphenyl)-butyric acid]- Glycol esters and the like. Commercially available products can also be used as the phenolic compound. The commercially available phenolic compound is not particularly limited, and for example, it can be exemplified by Ciba Specialty Chemicals Co., Ltd. 36 201120084 IRGANOX 1010, IRGANOX 1035, IRGANOX 1076, IRGANOX 1135, IRGANOX 245, IRGANOX 259, IRGANOX 295, IRGANOX 3114, IRGANOX 1098, IRGANOX 1520L, Adekastab AO by Adeca — 20, Adekastab AO — 30, Adekastab AO— 40 ' Adekastab AO — 50 ' Adekastab AO — 60, Adekastab AO — 70, Adekastab AO — 80, Adekastab AO 90, Adekastab AO — 3 30. Sumilizer GA — 80, Sumilizer MDP — S, Sumilizer BBM — S, Sumilizer GM, Sumilizer GS (F), Sumilizer GP, etc. manufactured by Sumitomo Chemical Industries. In addition to this, a commercially available additive may be used as the anti-coloring agent for the resin. For example, TINUVIN 328, TINUVIN 234, TINUVIN 326, TINUVIN 120, TINUVIN 477'TINUVIN 479' CHIMASSORB 2020 FDL'CHIMASSORB 119FL manufactured by Ciba Specialty Chemicals Co., Ltd., and the like can be cited. It is preferable to contain at least one of the above-mentioned compound, the amine compound, and the conjugate compound, and the amount thereof is not particularly limited, and is in the range of 0.005 to 5.0% by weight based on the curable resin composition. The curable resin composition of the present invention is obtained by uniformly mixing the components. The curable resin composition of the present invention can be easily made into a cured product by the same method as previously known. For example, a method of using an epoxy resin, at least one selected from the group consisting of a curing agent and a curing accelerator, a lining compound, a binder resin, an inorganic filler, and a blending agent, if necessary, using an extruder or a kneader, A roll mill, a planetary mixer, or the like is sufficiently mixed until uniformity is obtained to obtain a curable resin composition, and when the hard resin composition is liquid, perfusion or casting (casting) The curable resin composition is impregnated into the substrate to 'flow into the mold and cast into shape' to be hardened by heating, and in the case of a solid state, it is molded by a melt casting or a transfer molding machine. Further, it is hardened by heating. The hardening temperature is 80 to 200 t, and the hardening time is 2 to 1 Torr. The hardening method 'can be solidified at one time at a high temperature, but it is preferred to gradually increase the temperature to carry out a hardening reaction. Specifically, an initial hardening between & 8〇~15旳 is performed between 100 C and 200 C for post-hardening. In the hardening stage, it is preferably 2 to 8 stages of temperature rise, more preferably 2 to 4 stages. Further, the curable resin composition of the present invention can be dissolved in hydrazine, diphenylbenzene, acetone, methyl ethyl ketone, decyl isobutyl ketone, dimercaptomethylamine, dimethyl acetamide, N-methyl oxime. A curable resin composition varnish is prepared in a solvent such as a ketone to be impregnated into a substrate such as glass fiber, carbon fiber, polyester fiber, polyamide fiber, alumina fiber or paper, and dried by heating. The hot-press forming of the prepreg is used to form the cured product of the curable resin composition of the present invention. The solvent used in this case is usually used in the mixture of the curable resin composition of the present invention and the solvent. The weight %, preferably 15 to 70% by weight. Further, it is also possible to obtain a cured resin containing a carbon fiber by RTM (Resin Transfer MGlding) in a state of a liquid composition. Further, when the curable resin composition of the present invention can be used as a film-type sealing composition, when the film-type tree residue is obtained, the following method can be used: #Firstly, the curable resin composition of the present invention is produced. The composition is varnished as described above, and is applied to a release film, and the solvent is removed by heating under the heat of 38 201120084, and then B-staged; thereby obtaining a film-type seal by means of a sheet-like adhesive. Use the composition. The sheet-like adhesive can be used as an interlayer insulating layer of a multilayer substrate or the like, and an integral film seal of an optical semiconductor. Next, the case where the curable resin composition of the present invention is used as a crucible sealing material or a die bonding material of a photo-semiconductor will be described in detail. When the curable resin composition of the present invention is used as a sealing material or a solid crystal material for a high-intensity white LED or the like, by the epoxy resin of the present invention, a hardener containing a polycarboxylic acid ( An additive such as a hardener composition, a hardening accelerator, a coupling material, an antioxidant, or a light stabilizer is sufficiently mixed to prepare a curable resin composition. The mixing method may be carried out by using a kneader, a three-parent grinder, a universal mixer, a #star mixer, a homomixer, a homodisperser, a bead mill, etc., at a normal temperature or by heating. The resulting curable resin composition can be used for a sealing material, or for both a die bonding material and a sealing material. An optical semiconductor element such as a south-duty white LED is usually made of an adhesive (solid crystal material) so as to be laminated on a substrate such as sapphire, spinel or germanium, and G a A s, G a P, G a A1 Α ς, r·a. A semiconductor wafer such as η uaAlAs, GaAsP, A1Ga, InP, GaN, InN, or N InGaN is then packaged in a lead frame or a heat radiating plate, and a type of a wire such as a metal wire is connected to a current. & ', seal the surrounding with a sealing material such as a gas-resin resin. The sealing material is used to protect the λ m ° semiconductor wafer from heat or moisture, and play the role of lens function ~ & The curable resin composition of the present invention can be used as the above-mentioned sealing material or the material for taking the next day. In terms of steps, it is more suitable for the solidification of the present invention. Crystalline material and sealing material 39 201120084. The method of attaching a semiconductor wafer to an I& substrate using the curable resin composition of the present invention may be exemplified by the method of dispensing the curable resin composition of the present invention by 4 $ Yi / Cui / After the screen printing is applied to the substrate, the semiconductor wafer is placed on the hardened and oxidized tree composition to be heat-hardened. By this method, the semiconductor wafer can be attached to the substrate. A hot air circulation type, an infrared ray, a high frequency wave, etc. can be used. The heating condition is, for example, preferably 8 Torr to 23 Torr: heating for 1 minute to about Μ hours. To reduce the internal stress generated during heat hardening, for example, under the rib C After pre-hardening for 30 minutes to 5 hours, it is post-hardened with 12 〇 to 1 8 〇, and 30 knives for 1 〇 hours. - The sealing material is formed by using: in the above manner After the sealing material is injected into the mold frame of the substrate of the semiconductor wafer, the injection method is further formed, and the sealing material is pre-filled into the mold to impregnate the semiconductor wafer fixed on the substrate and heat the semiconductor wafer. After hardening, the compression molding method is released from the mold, etc. The method can be exemplified by a dispenser, a transfer molding, an injection molding, etc. Heating can be performed using a hot air circulation type, an infrared ray, or a high frequency wave. The heating condition is, for example, preferably ~230° C. for about 1 minute to 24 hours. To reduce the internal stress generated during heat curing, for example, after 8 minutes to 5 hours for 5 minutes and 5 hours for pre-hardening. The post-hardening is carried out under the conditions of 12 〇 to 18 〇, %, and 5% of the time. Further, the use of the curable resin composition of the present invention is not limited to 'the same applies to the use of epoxy resin. For example, the hardening resin is used. For example, for example, ifc & π forming materials (including sheets, J. , RP, etc., insulating materials (including printed substrates, resin compositions, :::, materials, sealing materials, cyanic acid for substrates, and hardeners for acrylic vinegar resins, etc.) Additives in Lunar 4, etc. The following agent, 4·4· m ', civil engineering, construction gas vehicle, medical A, and & affairs, electronic (4) ’ can be cited as an adhesive for electronic materials. Among these, an adhesive for an electronic material, a layer of a substrate, and a plurality of layers such as a bUlld_UP substrate

加強 日日M、底膠等半導體用接著劑、BGA 用底膠、各向異性導電膜(ACf)、 等封裝用接著劑等。 導電骨(ACP) 作為密封劑,可列暴. 光二極體、IC、LSI等田 電晶體、二極體、發A semiconductor adhesive such as a Japanese M or a primer, a BGA primer, an anisotropic conductive film (ACf), and the like are used. Conductive bone (ACP) acts as a sealant and can be used as a sealant. Photodiodes, ICs, LSIs, etc.

Tr 斤使用之灌注、浸潰及轉注成形密封, …類C0B、C0F、TAB等所使用之灌注密封,倒裝 日日(fllp Chip)等所使用之底膠,QFP、BGA及CSP等ic 封裝類封裝時之密封(包括加強用底膠)等。 本發明中所得之硬化物可用於以光學零件材料為代表 之各種用途。所謂光學用材料,一般表示使可見光、紅外 線1外線、X射線、雷射等光通過該材料之用途中使用之 材料。更具體而言’除燈型、SMD型等咖用密封材料以 外,亦可列舉以下者。液晶顯示器領域中之基板材料、導 光板、稜鏡>1、偏光板、相位差板、視角修正膜、接著劑、 偏光7C件保護膜等液晶用膜等液晶顯示裝置周邊材料。 又,作為下一代平板顯示器而備受期待之彩色PDP(電聚顯 41 201120084 示器)之密封材料、抗反射膜、光學修正膜、外殼材料、前 板玻璃之保護膜、前板玻璃代替材料、接著劑,又,led 顯示裝置所使用之LED之塑模材料、⑽之密封材料、前 板玻璃之保護膜、前板玻璃代替材料、接著劑,又,電漿 定址液晶(PALC)顯示器中之基板材料、導光板、稜鏡片、 偏光板才目位差板、視野角修正膜、接著劑、偏光元件保 蒦膜X有機EL(電致發光)顯示器中之前板玻璃之保護 膜月J板玻璃代替材料、接著劑,又,場發射顯示器(FED) 中之各種臈基板、刖板玻璃之保護膜、前板玻璃代替材料、 接著劑。光記錄領域φ,i ,a k 貝A〒為VD(視頻光碟)、CD/CD — ROM、 CD- R/RW、DVD— R/DVD_ RAM、m〇/md、p以相變化光 碟)、光學卡用光碟基板材料、光碟機讀取鏡頭、保護膜、 密封材料、接著劑等。 A、字備領域 -’.V 了心…〜设规用何科、取景 器棱鏡、目標棱鏡、取吾哭』 兄取厅、益盍(fmder cover)、受光感測器部。 又,攝影機之攝影鏡頭、取旦 兄貝取厅、盗。又,投影電視之投射鏡 頭、保護膜、密封材料 又耵鏡 接者幻專。光感測機器之透鏡用 材料、密封材料、接著劑H Μ ^ 者劑膜專。於光零件領域中,為来 通信系統中之光開關周邊之纖維材料、透鏡、料、2 之密封㈣、接著料。⑽接Μ邊之 (ferrule)、密封材料 # 1 接者齊I 4。於光被動零件、 件中,為透鏡、波導、TTm ^ 尤電路零 反導、LED之密封材料、cCD之 接著劑等。光雷籍掷# 4 Si材枓、 …寺光電積體電路(0EIC)周邊之 料、元件之密封材料、妞4如& 竹,截維材 接者劑專。於光纖領域中,為裝韩 42 201120084 等,又,通:其先導等工業用途之感測器類、顯示/標識類 於半導體積IV 楚建設用及家庭内之數位機器連接用光纖。 巧技衍用’ 邊材料中’為LSI^LSI材料用微钮 d技術用抗I虫材料。於、卞鱼/·笛认地体丄、 反射罩、轴承護圈:Γ輸:Γ,為汽車用燈管 照燈、弓I擎内零件、雷Λ 層、開關部分、前 __ ^件、各種料裝品、驅動引擎、 ㈣ 用防鏽鋼板、内飾板(mterior panel)、内裝 口 ’。、保護/捆束用導線束、燃料軟管、汽車燈、玻璃代替 :二劑軌道車輛用複層玻璃。X ’飛機之結構材料之勒 a、引擎周邊構件、保護/捆束用導線束、耐蝕塗層。 =築領域中,為内裝/加工用材料、燈罩、片材、玻財 棚舜篆^璃代替品、太陽電池周邊材料。農業用上,為大 元:月毒膜。作為下一代光/電子功能有機材料,為有機EL 周邊材料、有機光折射元件、作為光—光轉換裝置之 纖Si件、光運算元件、有機太陽電池周邊之基板材料、 ,義、准材料、7L件之密封材料、接著劑等。 [實施例] 其次,藉由實施例更具體地說明本發明,以下,σ要 2別說明’則:為重量份。再者,本發明並不限定:該 ,· ^例又,實施例中,環氧當量係依據JIS Κ ~ 7236進 行測定’黏度係於25t:下使用£型黏度計進行敎。又, _析法(以下記作GC)之分析條件為:分離管柱使用Hp ^MS(0.25 mm LD.X 15 m,膜厚為 〇 25 ^),將管柱供 相之溫度設為初始溫度航’以每分鐘价之速度升溫, 43 201120084 於300°C下保持25分鐘。又,將氦氣設為載體氣體。進而, 凝膠滲透層析法(以下記作Gpc)之測定如下所述。管柱係使 用 Shodex SYSTEM-21 管柱(kf_ 803l、KF-8〇25(x2 根)、KF— 802),連結溶離液為四氫呋喃,流速為1 mi/min, 管柱溫度為40°C,且檢測係以uv (254 nm)進行,校正曲線 係使用Shodex製造之標準聚苯乙烯。 合成例1 環己烯二醇之合成 合成例1(參考專利文獻EP 0487035 B1) 於具備攪拌機、回流冷卻管、攪拌裝置之燒瓶中,一 面實施氮氣沖洗一面添加環己烯曱醛丨12份 '乙醇6〇〇份、 35%之福馬林300份、30重量%之碳酸鉀水溶液284份,一 面攪拌一面升溫至回流溫度,於此狀態下反應9小時。反 應結束後,安裝丁史塔克(Dean_stark)冷卻管,於浴溫設定 為100°c之狀態下作用4小時而將乙醇蒸餾去除。冷卻至— 溫後’於此狀態下靜置24小時。藉由減壓過濾將析出為: 色結晶之環己烯二甲醇自溶液中過濾分離,進 .’、白 』祀嘴,葬 此獲得目標之環己烯二醇(下述式(6))1〇3份。藉由氣 曰 法所得之純度為98面積%。 ’、目層析Tr jin used for perfusion, impregnation and transfer molding seals, ... C0B, C0F, TAB, etc. used for perfusion sealing, flip-chip (fllp chip) and other primers used, QFP, BGA and CSP ic package Seals for packaging (including reinforcement primers). The cured product obtained in the present invention can be used for various purposes represented by optical component materials. The material for optics generally means a material used for the purpose of passing light such as visible light, infrared rays, X-rays, and laser light through the material. More specifically, the following may be mentioned in addition to the coffee sealing material such as a lamp type or an SMD type. A material for a liquid crystal display device such as a substrate material such as a substrate material, a light guide plate, a ruthenium plate 1, a polarizing plate, a phase difference plate, a viewing angle correction film, an adhesive, or a polarizing 7C protective film in the field of a liquid crystal display. In addition, as a next-generation flat panel display, it is expected to be a sealing material for a color PDP (Electrical Resonance 41 201120084), an antireflection film, an optical correction film, a case material, a protective film for a front glass, and a front glass substitute material. , adhesive, and LED molding material used in LED display device, (10) sealing material, protective film for front glass, front glass replacement material, adhesive, and plasma addressed liquid crystal (PALC) display The substrate material, the light guide plate, the cymbal sheet, the polarizing plate, the position difference plate, the viewing angle correction film, the adhesive, the polarizing element, the protective film X organic EL (electroluminescence) display, the protective film of the front plate glass, the J board A glass substitute material, an adhesive, and various enamel substrates in a field emission display (FED), a protective film for a slab glass, a front plate glass substitute material, and a follower. Optical recording field φ, i , ak A 〒 is VD (video CD), CD/CD — ROM, CD-R/RW, DVD — R/DVD_ RAM, m〇/md, p with phase change disc), optics The disc substrate material for the card, the optical lens reading lens, the protective film, the sealing material, the adhesive, and the like. A, the field of word preparation - '. V heart ... ~ set the rules for He Ke, viewfinder prism, target prism, take me cry" brother to take the hall, benefit (fmder cover), light sensor. In addition, the camera lens of the camera, the brothers and sisters take the hall, theft. In addition, the projection lens of the projection TV, the protective film, the sealing material and the mirror are connected to the illusion. The lens of the light sensing machine is made of material, sealing material and adhesive H Μ ^. In the field of optical components, it is a seal (four) and a binder for the fiber material, lens, material, and 2 around the optical switch in the communication system. (10) The ferrule and sealing material # 1 are connected to I 4 . In the passive parts and parts of the light, it is a lens, a waveguide, a TTm ^ special circuit zero anti-conductance, an LED sealing material, a cCD follow-up agent, and the like. Light mine throwing # 4 Si material 枓, ... Temple optoelectronic integrated circuit (0EIC) around the material, component sealing material, girl 4 such as & bamboo, cut-off material. In the field of optical fiber, it is equipped with Han 42 201120084, etc., and it also uses: sensors for industrial applications such as pilots, display/identification, and optical fiber for digital connection for semiconductor construction and home use. The technique used in the 'edge material' is a micro-button for the LSI^LSI material. Yu, squid / · flute recognize the body 丄, reflector, bearing retainer: Γ: Γ, for the car lamp lamp, bow I engine parts, Thunder layer, switch part, before __ ^ pieces , various materials, drive engines, (four) with rust-proof steel, mterior panel, interior mouth '. , protection / bundle bundles, fuel hoses, car lights, glass instead: two-layer rail vehicle laminated glass. The structural material of the X' aircraft, the engine peripheral components, the wiring harness for protection/bundling, and the corrosion resistant coating. =In the field of construction, it is a material for interior/processing, lampshade, sheet, glass shed, glass substitute, solar cell peripheral material. For agricultural use, it is the yuan: the moon mask. As a next-generation optical/electronic functional organic material, it is an organic EL peripheral material, an organic light-refracting element, a fiber-optic member as a light-to-light conversion device, an optical arithmetic element, a substrate material around an organic solar cell, a sense, a quasi-material, 7L piece of sealing material, adhesive, etc. [Examples] Next, the present invention will be more specifically described by way of examples, and hereinafter, σ should be described as "parts by weight". Further, the present invention is not limited to the above, and in the examples, the epoxy equivalent is measured in accordance with JIS Κ ~ 7236, and the viscosity is carried out at 25 t: using a £-type viscometer. Further, the analysis condition of the _ analysis method (hereinafter referred to as GC) is as follows: the separation column uses Hp ^MS (0.25 mm LD.X 15 m, the film thickness is 〇25 ^), and the temperature of the column supply phase is initially set. Temperature voyage 'heats up at a price per minute, 43 201120084 at 300 ° C for 25 minutes. Further, helium gas is used as a carrier gas. Further, the measurement of gel permeation chromatography (hereinafter referred to as Gpc) is as follows. The column was made of Shodex SYSTEM-21 (kf_803l, KF-8〇25 (x2), KF-802), the solution was tetrahydrofuran, the flow rate was 1 mi/min, and the column temperature was 40 °C. The detection was performed in uv (254 nm) and the calibration curve was made using standard polystyrene manufactured by Shodex. Synthesis Example 1 Synthesis of cyclohexenediol Synthesis Example 1 (refer to Patent Document EP 0487035 B1) In a flask equipped with a stirrer, a reflux cooling tube, and a stirring device, 12 parts of cyclohexene furfural was added while performing nitrogen purge. 6 parts of ethanol, 300 parts of 35% of formalin, and 284 parts of a 30% by weight aqueous solution of potassium carbonate were heated to reflux temperature while stirring, and reacted for 9 hours in this state. After the completion of the reaction, a Dean_stark cooling tube was installed, and the ethanol was distilled off by allowing the bath to stand at a bath temperature of 100 ° C for 4 hours. After cooling to -temperature, it was allowed to stand for 24 hours in this state. The precipitate is precipitated by filtration under reduced pressure: The cyclohexene dimethanol of the color crystal is separated from the solution by filtration, and the blister is blended to obtain the target cyclohexene diol (the following formula (6)) 1〇3 copies. The purity obtained by the gas enthalpy method was 98 area%. Tomography

合成例2 44 201120084 於具備攪拌機、回流冷卻管、攪拌裝置、丁史塔克管 之燒瓶中,一面實施氮氣沖洗一面添加甲笨1 5 〇份、上述 式⑹之化合物70份、3—環己稀甲酸12M分、對甲笨石黃酸 2份,於加熱回流下一面去除水一面反應1〇小時。反應結 束後,以10重量%之碳酸氫鈉水溶液5〇份水洗2次進; 以水50份水洗2次所得之有機㈣,使用旋轉蒸發器將有 機溶劑濃縮,藉此獲得本發明之烯烴化合物⑴—丨,下述式 (7))173份。確認所得之烯烴化合物為液態、藉由氣相層析 法所得之純度為92面積%、凝膠層析法之分析結果為> % 面積%之純度。Synthesis Example 2 44 201120084 In a flask equipped with a stirrer, a reflux cooling tube, a stirring device, and a Ding Stark tube, a nitrogen purge was carried out while adding 15 parts of a compound, 70 parts of the compound of the above formula (6), and a 3-ring. Diluted formic acid 12M, p-toluene, 2 parts, and reacted for 1 hour after removing water under heating and reflux. After the completion of the reaction, the mixture was washed twice with 5 parts by weight of an aqueous solution of sodium hydrogencarbonate in 5 parts of water; the organic (four) obtained was washed twice with water (50 parts), and the organic solvent was concentrated using a rotary evaporator, whereby the olefin compound of the present invention was obtained. (1) - 丨, 173 parts of the following formula (7)). The obtained olefin compound was found to be in a liquid state, the purity obtained by gas chromatography was 92% by area, and the analysis result by gel chromatography was > % area% purity.

合成例3 環氧樹脂之合成 於具備攪拌機、回流冷卻管、攪拌裝置之燒瓶中,一 面貫施氮氣沖洗-面添加水(5份、i 2 _嫣碟酸i. 9份、碟 酉文氫—鈉I·6、二牛脂烷基二甲基乙酸銨5.4份(Lion Akzo 製k 5〇重! /〇之己烧溶液,Arquad 2HT— Acetate),生成 嫣酉夂系觸媒後’添加甲# 1 2Q份、上述所得之稀烴化合物 1 1 9 1分' ,、佳 γ-· -r: 運而再久攪拌,藉此形成乳膠狀態之溶液。將該溶 液升溫至50°C, %之過氧化氫水 —面劇烈攪拌一面於1小時中添加3 5重量 1 1 8份,於此狀態下,於5〇。(:下攪拌1 3小 45 201120084 時。藉由GC確認反應之進行,結果原料波峰消失。 繼而,利用1重量%之氫氧化鈉水溶液進行中和後,添 加20重量%之硫代硫酸鈉水溶液25份,攪拌3〇分鐘姐靜 置。取出分離成2層之有機層,於其中添加矽膠(Wak〇gelc —300)10 份、活性碳(N0RIT 製造,CAp SUpER)2〇 份、膨 潤土(Hojun製造,Benge丨纽)2〇份,於室溫下攪拌i小時 後進行過濾。以水100份將所得之濾液水洗3次,自所得 之有機層+蒸顧錄f#’藉此獲得常溫下為液態之下述 之環氧樹脂(EP_1)118份。所得之環氧樹脂之環氧當 量為 148 g/eq.。Synthesis Example 3 The epoxy resin was synthesized in a flask equipped with a stirrer, a reflux cooling tube, and a stirring device, and a nitrogen flushing-surface addition water (5 parts, i 2 _ 嫣 酸 酸 i. - 5.4 parts of sodium I.6, ditallow alkyl dimethyl ammonium acetate (Lion Akzo made k 5 〇 heavy! / 〇 己 己 ,, Arquad 2HT - Acetate), after the formation of lanthanide catalysts #1 2Q parts, the above-obtained dilute hydrocarbon compound 1 1 9 1 ', and preferably γ-·-r: stirred for a long time to form a latex state solution. The solution is heated to 50 ° C, % The hydrogen peroxide water-surface was stirred vigorously while adding 35 weights of 1 18 parts in one hour, and in this state, at 5 Torr. (: stirring under 1 3 small 45 201120084. Confirmation of the reaction by GC As a result, the peak of the raw material disappeared. Then, after neutralization with a 1% by weight aqueous sodium hydroxide solution, 25 parts of a 20% by weight aqueous sodium thiosulfate solution was added, and the mixture was stirred for 3 minutes, and the mixture was separated and separated into two layers. Layer, adding 10 parts of silicone (Wak〇gelc - 300), activated carbon (manufactured by N0RIT, CAp SUpER) 2 2 parts of bentonite (manufactured by Hojun, Benge 丨 New Zealand), stirred at room temperature for 1 hour, and then filtered. The obtained filtrate was washed 3 times with 100 parts of water, and the obtained organic layer + steamed Gu recorded f#' Thus, 118 parts of the following epoxy resin (EP_1) which was liquid at normal temperature was obtained, and the obtained epoxy resin had an epoxy equivalent of 148 g/eq.

兮成例4 —對所得之環氧樹脂(ΕΡ—1)25份,使用石夕膠(Wak〇geiC 和光純藥製造)1〇5份,並利用乙酸乙酯:己烷二i : 4〜2 . 3之展開溶劑,藉由f柱層析法進行純化。 斤仵之振氧樹脂阳_2)為18份,所得之環氧樹脂之純 义係根據GPC之測定結果而確認含有上述式⑻之骨架之化 合物98面積%以上隹 進而於GC測定中,純度約為99面 積7°。又,環氧當量為137g/eq。 合成例5 46 201120084 以興合成例2相同 长己稀甲醇血四氦 1欠 以與合成例3 士。 同之方式進行環氧化,藉此獲得以下 相 义八(9)所示之纟士拔 主成分之環氧樹脂。 、…舞為兮 Example 4 - 25 parts of the obtained epoxy resin (ΕΡ-1), using 1 part of 5 parts of Shixi gum (Wak〇geiC and Wako Pure Chemical Industries, Ltd.), and using ethyl acetate: hexane two i: 4~ The developing solvent of 2.3 was purified by f-column chromatography. The oxime resin of the 仵 仵 _2 _2 _2 ) _2 _2 _2 _2 _2 _2 _2 _2 环氧树脂 环氧树脂 环氧树脂 环氧树脂 环氧树脂 环氧树脂 环氧树脂 环氧树脂 环氧树脂 环氧树脂 环氧树脂 环氧树脂 环氧树脂 环氧树脂 环氧树脂 环氧树脂 环氧树脂 环氧树脂 环氧树脂 环氧树脂 环氧树脂 环氧树脂 环氧树脂 环氧树脂 环氧树脂 环氧树脂 环氧树脂 环氧树脂 环氧树脂 环氧树脂 环氧树脂 环氧树脂 环氧树脂It is about 99 area 7°. Further, the epoxy equivalent was 137 g/eq. Synthesis Example 5 46 201120084 Synthetic Synthesis Example 2 The same length of dilute methanol blood tetrahydrous 1 owe to the synthesis example 3 士. The epoxidation is carried out in the same manner, whereby an epoxy resin having the main component of the gentleman shown in the following eight (9) is obtained. Dance

將所得之環氧樹脂進而以與合成例4相同之方式進〜 純化而獲得環氧樹脂(Ep_ 3)。所得之環氧樹脂之純度係: 據GPC之測定結果㈣認含有上述式(9)之骨架之化合物^ 苯二甲酸進行醋化而製造烯烴化合 一双鄰 面積%以上。進而’於GC測定中,純度約為%面積%。又, 環氧當量為137 g/eq_。 合成例6 於具備攪拌機、回流冷卻管、攪拌裝置之燒瓶中,一 面實施氮氣沖洗一面添加二環戊二烯二曱醇1〇份、曱基六 氫鄰苯二甲酸酐(新日本理化股份有限公司製造,Rikacid ΜΗ’以下稱為酸針H3)1〇〇份,於6〇χ:下加熱搜拌*小時(藉 由GPC確認二環戊二烯二曱醇之消失),藉此獲得含有多元 羧酸之硬化劑組成物(Bl)ll〇份。所得之硬化劑組成物(B1) 為無色液態樹脂’藉由GPC所獲得之純度為:多元羧酸之 結構為22面積% ’曱基六氫鄰苯二曱酸酐為78面積%。又, 官能基當量為 188 g/eq.。即,W2/(W2+ W3)= 0.78。 47 201120084 合成例7 根據專利文獻3戶斤記載之方 樹脂。即,將2—(3 4—環氧…、^聚夕乳改質環氧 (,…辰己基)乙基三甲氧基矽烷26·6 Α…⑷、)—甲基-甲氧基石夕烷73·4份(燒氧 基田量為⑷)、三乙基胺⑽份、曱基異丁基酮則份加 入至反應容器中,於室溫下—面搜拌一面以3〇分鐘滴加基 飽水1〇〇份,升溫至80度後,使其反應6小時。反 後,使用20%之磷酸二氫鈉水溶液進行中和㈣反覆水 洗3次。繼而,將有機相於減壓下、以刚t去除溶劑藉 此獲得具有反應性官能基之聚魏改質環氧樹脂(EM⑽ 份^得化合物之環氧當量為561g/eq,外觀為無色透明。 實施例1 實施例,係對合成例4中所得之環氧樹脂(Ep_2),使 用甲基六氫鄰苯二曱酸酐與六氫鄰苯二甲酸酐之混合物(新 日本理化股份有限公司製造,Rlkacid ΜΗ·,以下稱為叫 作為硬化劑,且使用十六貌基三甲基氫氧化銨(東京化成工 業股份有限公司製造,2 5重量%之曱醇溶液,稱為C ()作為 硬化促進劑’以下述表Μ示之換合比(重量份)進行換合, 進行20分鐘之消泡,獲得本發明之硬化性樹齡成物。再 者,硬化劑之使用量經算出為:相對於環氧樹脂之環氧基1 當量,該硬化劑之使用量為1當量。 比較例1 H1作為 所示之換 比較例,係對合成例4合成之(Ep—3),使用 硬化劑,且使用c1作為硬化促進劑,以下述表1 48 201120084The obtained epoxy resin was further purified in the same manner as in Synthesis Example 4 to obtain an epoxy resin (Ep_3). The purity of the obtained epoxy resin is based on the measurement result of GPC. (IV) The compound which contains the skeleton of the above formula (9) is acetated to produce an olefin compound having a double adjacent area area or more. Further, in the GC measurement, the purity was about % area%. Further, the epoxy equivalent was 137 g/eq_. Synthesis Example 6 In a flask equipped with a stirrer, a reflux cooling tube, and a stirring device, 1 part of dicyclopentadienyldithiol and decyl hexahydrophthalic anhydride were added while nitrogen gas was purged (Nippon Chemical and Chemical Co., Ltd.) The company manufactures, Rikacid ΜΗ 'hereinafter referred to as acid needle H3) 1 〇〇 part, at 6 〇χ: under heating and mixing for * hours (by GPC to confirm the disappearance of dicyclopentadienyl decyl alcohol), thereby obtaining The hardener composition of the polycarboxylic acid (Bl) is in part. The obtained hardener composition (B1) was a colorless liquid resin. The purity obtained by GPC was: the structure of the polyvalent carboxylic acid was 22 area%, and the mercapto hexahydrophthalic anhydride was 78 area%. Further, the functional group equivalent was 188 g/eq. That is, W2/(W2+ W3) = 0.78. 47 201120084 Synthesis Example 7 According to the patent document 3, the amount of the resin is described. That is, 2-(3 4 -epoxy..., 聚聚乳乳化epoxy(, 己己基)ethyltrimethoxydecane 26·6 Α...(4),)-methyl-methoxy oxalate 73·4 parts (the amount of the oxygenated field is (4)), the triethylamine (10) parts, and the decyl isobutyl ketone are added to the reaction vessel, and the mixture is added at room temperature for 3 minutes. The base was saturated with 1 part of water, and after heating to 80 degrees, it was allowed to react for 6 hours. Thereafter, neutralization (4) was repeated with water using a 20% aqueous solution of sodium dihydrogen phosphate for 3 times. Then, the organic phase was removed under reduced pressure, and the solvent was removed to obtain a poly-modified epoxy resin having a reactive functional group (the epoxy equivalent of the EM (10) compound was 561 g/eq, and the appearance was colorless and transparent. Example 1 The epoxy resin (Ep_2) obtained in Synthesis Example 4 was prepared by using a mixture of methylhexahydrophthalic anhydride and hexahydrophthalic anhydride (manufactured by New Japan Physical and Chemical Co., Ltd.). , Rlkacid ΜΗ·, hereinafter referred to as hardener, and using 16-fold-based trimethylammonium hydroxide (manufactured by Tokyo Chemical Industry Co., Ltd., 25 wt% sterol solution, called C () as hardening The accelerator's blending ratio (parts by weight) shown in the following table was changed, and defoaming was carried out for 20 minutes to obtain a curable age-aged product of the present invention. Further, the amount of the hardener used was calculated as: relative The epoxy group has an epoxy group of 1 equivalent, and the amount of the hardener used is 1 equivalent. Comparative Example 1 H1 is a comparative example shown in the synthesis example (Ep-3), using a hardener, And use c1 as a hardening accelerator, with the following 148201120084

(耐熱性試驗) 之消泡,獲得本發明 硬化劑之使用量經算 當量,該硬化劑之使用(heat resistance test) defoaming, obtaining the use amount of the hardener of the present invention, the equivalent amount, the use of the hardener

時使其硬化, 化性樹脂組成物實施20 泡後,緩緩澆鑄於寬7 mm、長5 cm、厚約8〇〇 用模具中,其後自上方以聚醯亞胺膜覆蓋。對 12〇Cxl小時進行預硬化後,以150°Cx3小 獲得動態黏彈性用試驗片。使用該等試驗片, 乂下述所不之條件進行動態黏彈性試驗。 測定條件 動態黏彈性測定器:TA - instruments製造,DMA - 2980 測定溫度範圍:3 0。(:〜2 8 0。(: 升溫速度:2。(:/分鐘 5式驗片尺寸:使用切成5 mmx50 mm之試驗片(厚度為 、’勺 8〇〇 “ 爪)。 分析條件When it was hardened, the chemical resin composition was subjected to 20 bubbles, and then slowly cast in a mold having a width of 7 mm, a length of 5 cm, and a thickness of about 8 Å, and then covered with a polyimide film from above. After pre-hardening for 12 〇 C x 1 hour, a test piece for dynamic viscoelasticity was obtained at 150 ° C x 3 small. Using these test pieces, the dynamic viscoelasticity test was carried out under the conditions described below. Measurement conditions Dynamic viscoelasticity measuring device: manufactured by TA-仪器, DMA-2980 Measuring temperature range: 30. (:~2 8 0. (: Heating rate: 2. (:/min 5 size): Use a test piece cut into 5 mm x 50 mm (thickness, 'spoon 8 〇〇 "claw). Analysis conditions

Tg ·將DMA測定中之Tan — <5之波峰點設為Tg。 (透過率試驗) 將所得之硬化性樹脂組成物進行20分鐘之真空消泡 後,、Tg - The peak of Tan - < 5 in the DMA measurement is set to Tg. (Transmittance test) After the obtained curable resin composition was subjected to vacuum defoaming for 20 minutes,

’以成為30 mmx2〇 mmx高度1 mm之方式將硬化性樹脂 、且成物緩緩澆鑄於以耐熱膠帶製成障壁(dam)之玻璃基板 上°使該澆鑄物進行12(TC X1小時之預硬化後,以1 5(TC X 49 201120084 3小時使其硬化,獲得厚度為1 mm之透過率用試驗片 用分光光度計進行測定’測定其透過率。 ^ [表1] -—--—— 實施例1 — ~----- 例 1 環氧樹脂 EP-2 . 2.74 EP-3 組成 ----- -~~~~2J4__ 硬化劑 H1 3.36 硬化觸媒 C1 0.01 耐熱特性試驗結果 DMA Tan— d(°〇 250 ~ u.oi 10/1 透過率 400 mm 89.0% lo4 〇y.o% 根據本結果可知,本發明之環氧樹脂組成物係透明性 優異’且耐熱特性優異之硬化物。 實施例2、3、比較例2 使用合成例3所得之環氧樹脂(Eh)作為環氧樹脂, 使用通常< 3,4-環氧環己基甲酸3’,4,—環氧環己基甲酯 (ep-5)作為比較例,使用H1、合成例6所得之酸酐與多元 叛酸之混合物即硬化劑組成物(叫作為硬化劑,進而使用 C1作為硬化促進劑,以下述表2所示之換合比(重量份)進 仃摻合,進行20分鐘消 均焱侍本發明之硬化性樹脂組 二算:比較用硬化性樹脂組成物。再者,硬化 於環氧樹脂之環氧…™劑 50 201120084 « (LED封裝體之硬化後凹陷性試驗) 將實施例及比較例所得之硬化性樹脂組成物填充於注 射器中’使用精密噴出裝置,澆鑄至外徑5 mm見方之表面 封裝型LED封裝體(内徑為4 4 mm,外壁高度為1 25 mm)。 將該澆鑄物投入加熱爐,於丨2〇它進行1小時硬化處理,進 而於150 C進行3小時硬化處理,製成LED封裝體。關於 凹陷’係使用深度測定計,以外壁高度為基準而測定硬化 後樹脂之凹陷深度。將實施例2、3與比較例2之結果示於 表2。 測定條件'The curable resin and the article are slowly cast on a glass substrate made of a heat-resistant tape to form a dam so as to be 30 mmx2〇mmx height of 1 mm. The casting is subjected to 12 (TC X1 hour pre-treatment) After hardening, the transmittance was measured by using 1 5 (TC X 49 201120084 for 3 hours to obtain a transmittance of 1 mm and a test piece using a spectrophotometer). ^ [Table 1] -—-- — Example 1 — ~----- Example 1 Epoxy Resin EP-2 . 2.74 EP-3 Composition -----~~~~2J4__ Hardener H1 3.36 Hardening Catalyst C1 0.01 Heat Resistance Test Results DMA Tan-d (°〇250 ~ u.oi 10/1 transmittance 400 mm 89.0% lo4 〇yo% According to the results, the epoxy resin composition of the present invention is excellent in transparency and excellent in heat resistance. Examples 2, 3 and Comparative Example 2 The epoxy resin (Eh) obtained in Synthesis Example 3 was used as an epoxy resin, and the usual < 3,4-epoxycyclohexylcarboxylic acid 3',4,-epoxycyclohexyl group was used. The ester (ep-5) was used as a comparative example, and the mixture of the acid anhydride obtained in the synthesis example 6 and the multi-repulsive acid, that is, the hardener was used. (referred to as a hardener, and further use C1 as a hardening accelerator, blended in a blending ratio (parts by weight) shown in Table 2 below, and subjected to a 20-minute elimination of the hardening resin group of the present invention. : The hardening resin composition for comparison. Further, the epoxy resin which is hardened in the epoxy resin...TM agent 50 201120084 « (The densification test after curing of the LED package) The curable resin composition obtained in the examples and the comparative examples Filled in a syringe' using a precision injection device, cast into a surface-encapsulated LED package with an outer diameter of 5 mm square (4 4 mm inside diameter and 1 25 mm in outer wall height). The cast is placed in a heating furnace. 2, it was subjected to a hardening treatment for 1 hour, and further hardened at 150 C for 3 hours to obtain an LED package. The depth of the resin was measured using a depth gauge based on the height of the outer wall. The results of Examples 2 and 3 and Comparative Example 2 are shown in Table 2. Measurement conditions

深度測定計:NIKON 製造,DIGIMTCRO STAND MS ~ 1 1C 凹陷深度係採用3份封裝體之平均值。 [表2] 項目 實施例2 實施例3 比較例2 EP-1 2.96 2.96 EP-5 2.66 組成 硬化劑(H1) 3.36 3.36 硬化劑組成物(B1) 3.78 硬化觸媒(C1) 0.01 0.01 0 01 硬化後凹陷量 190 μ m 15 ———ν·νΜ u m 根據上述結果可判明,使用合成例3所得之環氧樹脂 51 201120084 之硬化性樹脂組成物與比較作"相比,可改善硬化後之凹 陷。又,可知該效果藉由含有多羧酸(W2/(W2+w3)=() 78) 而進一步改善。 比較例3 將合成例7所得之聚矽氧改質環氧樹脂(Ep—4),使用 H1作為硬化劑,以下述表3所示之摻合比(重量份)進行摻 合,進行20分鐘之消泡,獲得本發明之硬化性樹脂組成物。 再者,硬化劑之使用量經算出為:相對於環氧樹脂之環氧 基1當量’該硬化劑之使用量為1當量。 (腐蝕氣體透過性試驗) 將實施例2及比較例3所得之硬化性樹脂組成物填充 於注射器中,使用精密喷出裝置,澆鑄至搭載有中心發光 波長465 nm之晶片的外徑5 mm見方之表面封裝型封 裝體(内徑為4_4 mm,外壁高度為丨_25 mm)。將該澆鑄物投 入加熱爐’於12 0 C進行1小時硬化處理,進而於1 5 〇。〇下 進行3小時硬化處理,製成LED封裝體。於下述條件下將 LED封裝體放置於腐蝕性氣體中,觀察密封内部之經鍍銀 之引線框架部之顏色變化。將實施例2、比較例3之結果示 於表3。 測定條件 腐蝕氣體:硫化銨之20%水溶液(硫成分與銀反應時變 成黑色) 接觸方法:於廣口玻璃瓶中’使硫化銨水溶液之容器 與上述LED封裝體混合存在,於蓋上廣口玻璃版之蓋而密 52 201120084 閉之狀態下,使揮發之硫化銨氣體與LED封裝體接觸。 腐蝕之判定:觀察LED封裝體内部之引線框架變成黑 色(稱為黑化)之時間,該變色時間越長者,則判斷耐腐触氣 體性越優異。 [表3] 項目 實施例2 比較例3 EP-1 2.96 組成 EP-4 10 硬化劑(H1) 3.36 3.36 硬化觸媒(C1) 0.08 0.08 引線框架之變色時間 10小時以上無繆表 於1小時内變色 根據上述結果明確地表示,本發明之硬化性樹脂組成 物與比較例3(於i小時内變色)所使用之聚矽氧改質環氧樹 脂之硬化性樹脂組成物相比,引線框架之鍍銀未變色,判 明耐腐蝕氣體性優異。 根據上述結果可判明,士 I ηπ Λ Λ 木j Ν月,本發明之硬化性樹脂組成物與 聚石夕氧樹脂相比,耐腐巍齑駚沾 、 』御蝕軋體性優異,且作為LED密封材 料,與3,4 _環氧環己基曱酸v ^ 土 f酉夂3,4 _ %氧環己基甲酯所代 之先前之脂環式環氧樹脂相比,耐久性優異。 實施例4、比較例4 使用合成例3所得之提条 使用…u 衣乳樹脂(EP-D作為環氧樹脂, 使用通$之3,4 —環氧j’p # 軋衣己基甲酸3’,4,一環氧環己基甲_ 53 201120084 12,4 -環己烷三甲酸一 1,2 (EP—5)作為比較例,且使用m ,Η — TMA,以下稱 一酐(三菱瓦斯化學股份有限公司製造 為Η2)作為硬化劑,以下流矣J μ _ ^ 卜述表4所不之摻合比(重量份)進行 t s進行20 ” 4里之消 >包,獲得本發明之硬化性樹脂組成 :及比較用硬化性樹脂組成物。再者,硬化劑之使用量經 算出為:相對於環氧樹脂之環氧& i當量,該硬化劑之使 用量為1當量。 (透過率試驗) 將實施例4及比較例4所得之硬化性樹脂組成物進行 20分鐘之真空消泡後,以成為3〇mmx2〇mm><高度i爪爪之 方式緩緩澆鑄至以耐熱膠帶製成障壁之玻璃基板上。使該 澆鑄物進行12〇。〇<1小時之預硬化後,以15〇<tx3小時使 其硬化,獲得厚度1 mm之透過率用試驗片。 使用該等試驗片,藉由分光光度計測定於15〇t之烘箱 中放置96 hr前後之透過率(測定波長:4〇〇nm),算出該透 過率之保持率。 (LED點亮試驗) 將實施例4及比較例4所得之硬化性樹脂組成物填充 於注射器中’使用精密噴出裝置,澆鑄至搭載有具有中心 發光波長465 nm之晶片的外徑5 mm見方之表面封裝型 LED封裝體(内徑為4.4 mm,外壁高度為1.25 將該澆 鑄物投入加熱爐,於12(TC進行i小時硬化處理,進而於 1 50°C進行3小時之硬化處理’製成LED封裝體。於下述條 件下點亮LED,測定照度。將實施例4 '比較例4之結果示 54 201120084 於表4。 [表4] 項目 實施例4 比較例4 組成 EP-1 2.96 EP-5 2.66 硬化劑(H1) 1.94 1.94 硬化劑(H2) 0.84 0.84 财熱透過率 透過率 81.4% 73.3% 保持率 90.4% 81.2% LED試驗初始強度 9590 8910 根據上述結果可知,本發明之硬化性樹脂組成物的耐 熱透過率及點亮時之照度亦優異。 貫施例5、6,比較例5 使用合成例3所得之環氧樹脂斤1>_丨)作為環氧樹脂, 使用通常之3,4—環氧環己基曱酸3,,4,一環氧環己基甲酯 ⑽一 5)作為比較例,使用m、H2、及合成例6所得之酸^ 與多元叛酸之混合物即硬化劑組成物(B1)作為硬化劑,進而 使用有機鱗鹽(日本化學卫業公司製造,ρχ—4Mp,以下稱 為C2)作為硬化促進劑,以下述表5所示之捧合比(重量份) 進行摻合,進行2 0分鐘夕、、含 、 鐘之4泡’獲得本發明之硬化性樹脂 :成:及比較用硬化性樹脂組成物。再者,硬化劑之使用 置經鼻出為··相對於環氧樹脂之環氧I 1當量,該硬化劑 55 201120084 之使用量為1當量。 使用所得之硬化性樹脂組成物,以如下所示之要領進 行LED試驗。硬化條件於1 2〇°c χ2小時之預硬化後為1 40 °C x2小時。 (LED回流焊試驗) 將實施例及比較例所得之硬化性樹脂組成物進行2〇分 鐘之真空消泡後’填充於注射器中,使用精密噴出裝置, 洗铸至搭載有具有發光波長465 nm之發光元件的表面封裝 型LED。其後’以特定硬化條件使其硬化,藉此獲得試驗 用 LED。 將所得之試驗用LED以3(TC、70%x24 Hr之條件吸濕 後,使用高溫觀察裝置(STM Scope SK— 5000,山陽精工股 如有限么司製造),以目視觀察有無產生於以下之回流焊條 件下之試驗用LED龜裂。 以η— 3進行測試,利用(NG數)/(測試數)進行評價。 。條件為.以2eC/秒自25。(:升溫至15(TC,其後於15〇 C保持2分鐘°進而以2°C /秒升溫至260。(:,進行1〇秒之 溫度保持後,以Ut/秒冷卻至室溫。 " 56 201120084 m [表5] 項目 實施例4 實施例5 比較例5 組成 EP-1 2.96 2.96 EP-5 2.66 硬化劑(H1) 1.94 1.94 硬化劑(H2) 0.84 .084 硬化劑組成物(B1) 3.76 _ 觸媒(C2) 0.003 0.003 0.003 _-耐回流焊性__ __0/3 0/3 0/3 根據上述結果可知,本發明之硬化性樹脂組成物的耐 衝擊性優異。 參照特定之態樣詳細地說明了本發明,但業者清楚於 不脫離本發明之精神與範圍的情形下可進行各種變更及修 正° 再者’本申請案係基於2009年10月9曰提出申請之 本專利申„月案(特願2〇〇9~234846) ’藉由引用而援用其 1體。又,此處所引用之所有參考係視為整體而併入。 【圖式簡單說明】 M. 【主要元件符號說明】 無 57Depth gauge: manufactured by NIKON, DIGIMTCRO STAND MS ~ 1 1C Depth depth is the average of 3 packages. [Table 2] Item Example 2 Example 3 Comparative Example 2 EP-1 2.96 2.96 EP-5 2.66 Composition Hardener (H1) 3.36 3.36 Hardener Composition (B1) 3.78 Hardening Catalyst (C1) 0.01 0.01 0 01 Hardening After the amount of depression 190 μm 15 ———ν·νΜ um According to the above results, it was found that the cured resin composition of the epoxy resin 51 201120084 obtained in Synthesis Example 3 can be improved compared with the comparative example. Depression. Further, it is understood that this effect is further improved by containing a polycarboxylic acid (W2/(W2+w3)=() 78). Comparative Example 3 The polyfluorene-modified epoxy resin (Ep-4) obtained in Synthesis Example 7 was blended with H1 as a curing agent at a blending ratio (parts by weight) shown in Table 3 below for 20 minutes. The defoaming is carried out to obtain a curable resin composition of the present invention. Further, the amount of the curing agent used was calculated to be 1 equivalent of the epoxy group of the epoxy resin. The amount of the curing agent used was 1 equivalent. (Corrosion gas permeability test) The curable resin composition obtained in Example 2 and Comparative Example 3 was filled in a syringe, and cast to a diameter of 5 mm square of a wafer equipped with a central emission wavelength of 465 nm using a precision discharge device. The surface mount package has an inner diameter of 4_4 mm and an outer wall height of 丨25 mm. The cast product was placed in a heating furnace to be hardened at 120 ° C for 1 hour, and further at 15 ° C. The underside was subjected to a hardening treatment for 3 hours to form an LED package. The LED package was placed in a corrosive gas under the following conditions, and the color change of the silver-plated lead frame portion inside the seal was observed. The results of Example 2 and Comparative Example 3 are shown in Table 3. Determination of the conditional corrosive gas: 20% aqueous solution of ammonium sulfide (the sulfur component turns black when reacting with silver) Contact method: In the wide-mouth glass bottle, the container of the aqueous ammonium sulfide solution is mixed with the above-mentioned LED package, and the lid is covered with a wide mouth. The glass plate is covered and closed. 52 201120084 In the closed state, the volatilized ammonium sulfide gas is brought into contact with the LED package. Corrosion determination: The time during which the lead frame inside the LED package became black (referred to as blackening) was observed. The longer the discoloration time, the more excellent the corrosion resistance was judged. [Table 3] Item Example 2 Comparative Example 3 EP-1 2.96 Composition EP-4 10 Hardener (H1) 3.36 3.36 Hardening Catalyst (C1) 0.08 0.08 Discoloration time of lead frame for more than 10 hours No time in 1 hour The discoloration clearly shows that the curable resin composition of the present invention is compared with the curable resin composition of the polyfluorene-modified epoxy resin used in Comparative Example 3 (discoloration within i hours) of the lead frame. Silver plating was not discolored, and it was found that the corrosion resistance was excellent. According to the above results, it has been found that the curable resin composition of the present invention is superior to the polysulfide resin in corrosion resistance, corrosion resistance, and corrosion resistance. The LED sealing material is superior in durability to the previous alicyclic epoxy resin which is substituted with 3,4 epoxycyclohexyl decanoic acid v ^ soil f 酉夂 3,4 _ % oxocyclohexyl methyl ester. Example 4, Comparative Example 4 Using the strip obtained in Synthesis Example 3, u-emulsion resin (EP-D was used as the epoxy resin, and 3, 4 - epoxy j'p # 轧 hexyl carboxylic acid 3' was used. , 4, an epoxy cyclohexyl group _ 53 201120084 12,4 - cyclohexane tricarboxylic acid-1, 2 (EP-5) as a comparative example, and using m, Η - TMA, hereinafter referred to as mono-anhydride (Mitsubishi Gas Chemistry Co., Ltd. is manufactured as 硬化2) as a curing agent, and the following mixing ratio (parts by weight) of the flow 矣J μ _ ^ is described in Table 4, ts is carried out for 20 4 4 &> package, and the curable resin of the present invention is obtained. Composition: and a comparative hardening resin composition. Further, the amount of the curing agent used was calculated to be 1 equivalent based on the epoxy & i equivalent of the epoxy resin. The curable resin composition obtained in Example 4 and Comparative Example 4 was subjected to vacuum defoaming for 20 minutes, and then slowly cast into a heat-resistant tape in a manner of 3 mm x 2 mm mm > height i claws. On the glass substrate of the barrier, the cast was subjected to 12 〇. 〇 < 1 hour pre-hardening, 15 〇 ≪ tx was hardened for 3 hours to obtain a test piece for transmittance of 1 mm in thickness. Using these test pieces, the transmittance before and after leaving for 96 hr in an oven of 15 〇t was measured by a spectrophotometer (measurement wavelength: 4 〇〇nm), the retention rate of the transmittance was calculated. (LED lighting test) The curable resin composition obtained in Example 4 and Comparative Example 4 was filled in a syringe, and the casting was carried out with a precision discharge device. A surface-encapsulated LED package with an outer diameter of 5 mm square of an illuminating wavelength of 465 nm (with an inner diameter of 4.4 mm and an outer wall height of 1.25). The cast material is placed in a heating furnace at 12 (TC for i-hour hardening treatment, and further 1 and 3 hours of hardening treatment at 50 ° C. The LED package was fabricated. The LED was lit under the following conditions, and the illuminance was measured. The results of Example 4 'Comparative Example 4 are shown in Table 4 2011 20084. [Table 4] Project Example 4 Comparative Example 4 Composition EP-1 2.96 EP-5 2.66 Hardener (H1) 1.94 1.94 Hardener (H2) 0.84 0.84 Transmittance Transmittance 81.4% 73.3% Retention 90.4% 81.2% LED Test Initial Strength 9590 8910 based on the above results It is understood that the heat-resistant transmittance of the curable resin composition of the present invention and the illuminance at the time of lighting are also excellent. Examples 5 and 6 and Comparative Example 5 The epoxy resin 1> 丨) obtained in Synthesis Example 3 was used as a ring. As the oxygen resin, the usual 3,4-epoxycyclohexyl decanoic acid 3,4,monoepoxycyclohexylmethyl ester (10)-5) was used as a comparative example, and m, H2, and the acid obtained in Synthesis Example 6 were used. The hardening agent composition (B1) which is a mixture of a plurality of polyphenols is used as a hardening agent, and an organic scale salt (manufactured by Nippon Chemical Industry Co., Ltd., ρχ-4Mp, hereinafter referred to as C2) is used as a hardening accelerator, as shown in Table 5 below. The blending ratio (parts by weight) was blended, and the foaming resin of the present invention was obtained by adding the foam of the present invention to the foam of the present invention for 20 minutes. Further, the use of the hardener is a one-equivalent to the epoxy I equivalent of the epoxy resin, and the amount of the hardener 55 201120084 is one equivalent. Using the obtained curable resin composition, the LED test was carried out in the following manner. The hardening conditions were 1 40 ° C x 2 hours after pre-hardening at 12 ° C for 2 hours. (LED reflow test) The curable resin composition obtained in the examples and the comparative examples was subjected to vacuum defoaming for 2 minutes, and then filled in a syringe, and washed by a precision discharge device to have an emission wavelength of 465 nm. A surface-mount LED of a light-emitting element. Thereafter, it was hardened under specific hardening conditions, whereby test LEDs were obtained. The obtained test LED was absorbed by a temperature of 3 (TC, 70% x 24 Hr), and then observed using a high-temperature observation apparatus (STM Scope SK-5000, manufactured by Sanyo Seiko Co., Ltd.) to visually observe whether or not it was produced as follows. The LEDs used for the test under reflow conditions were cracked. The test was carried out with η-3, and evaluated by (NG number) / (test number). The condition was 2 at 2 eC/sec from 25. (: warming to 15 (TC, Thereafter, the temperature was maintained at 15 ° C for 2 minutes and further increased to 260 at 2 ° C / sec. (:, after maintaining the temperature for 1 〇 second, it was cooled to room temperature at Ut / sec. " 56 201120084 m [Table 5 Item Example 4 Example 5 Comparative Example 5 Composition EP-1 2.96 2.96 EP-5 2.66 Hardener (H1) 1.94 1.94 Hardener (H2) 0.84 .084 Hardener Composition (B1) 3.76 _ Catalyst (C2) 0.003 0.003 0.003 _-Reflow resistance __ __0/3 0/3 0/3 According to the above results, the curable resin composition of the present invention is excellent in impact resistance. The present invention has been described in detail with reference to specific examples. However, it is obvious to those skilled in the art that various changes and modifications can be made without departing from the spirit and scope of the invention. 'This application is based on this patent application filed on October 9th, 2009. (Japanese Patent Application 2〇〇9~234846)' By reference, the 1 body is used. Also, all reference systems cited here It is considered as a whole and is incorporated. [Simple description of the diagram] M. [Description of main component symbols] No 57

Claims (1)

201120084 七、申請專利範圍: 1. 一種硬化性樹脂組成物,其特徵在於: 含有將下述式(1)所示之烯烴化合物氧化而獲得之琴 樹脂、硬化劑及/或硬化促進劑:201120084 VII. Patent application scope: 1. A curable resin composition comprising: a piano resin, a hardener, and/or a hardening accelerator obtained by oxidizing an olefin compound represented by the following formula (1): (式中,存在複數個之Rl、R2各自獨立,表示氫 或碳數1〜6之烷基)。 ' 严2±.如申請專利範圍第1項之硬化性樹脂組成物,其中, 氣樹月曰係以全部R1、r2為氮原子之稀煙化合物為原料。 中·如申凊專利範圍第1或2項之硬化性樹脂組成物,其 ,硬化劑為下述式(2)所示之1種以上之化合物:、(wherein a plurality of R1 and R2 are each independently represented by hydrogen or an alkyl group having 1 to 6 carbon atoms). The sclerosing resin composition of the first aspect of the patent application, wherein the gas tree sorghum is made of a dilute smoke compound in which all of R1 and r2 are nitrogen atoms. The hardening resin composition of the first or second aspect of the invention, wherein the curing agent is one or more compounds represented by the following formula (2): κ表示虱原子、田^ 4 j, λ, 甲基或羧基)。 4·如申請專利範圍第 成物,1 士 主3項中任一項之硬化性樹脂組 /、中,硬化劑為下述 A (3)所示之1種以上之化合物: 58 201120084κ represents a ruthenium atom, a field ^ 4 j, λ, a methyl group or a carboxyl group). 4. If the patented product is the first product of the patent, the hardening resin group /, medium, and hardener are one or more compounds as shown in the following A (3): 58 201120084 f &或羧基 f中,存在複數個之R3表示氫原子, 反數2〜20之鏈狀或環狀脂肪族基)。 ,士申叫專利範圍第4項之硬化性樹脂組成物,豆中, (3)中之Μ分支鏈狀或環狀結構。 八 石由6·如申請專利範圍s 1項之硬化性樹脂組成物,其中, 化劑包含下述式(2)所示之1種以上之化合物In f & or carboxyl group f, a plurality of R3 represent a hydrogen atom, and a chain of 2 to 20 or a cyclic aliphatic group). , Shishen is called the curative resin composition of the fourth paragraph of the patent range, in the beans, (3) in the chain branch or ring structure. The sclerosing resin composition of the invention, wherein the compounding agent contains one or more compounds represented by the following formula (2) (式中,R3表示氫原子、甲基或羧基)、 及下述式(3)所示之丨種以上之化合物(wherein R3 represents a hydrogen atom, a methyl group or a carboxyl group), and a compound of the above formula (3) or more 基 (式中,存在複數個之R3獨立地表示氫原子、甲基或羧 Ρ表不杈數2〜20之鏈狀或環狀脂肪族基)兩者, 59 1 201120084 且其使用比率為下述範圍: W2/(W2 +W3 )=0.30 〜0.95 (其中,W2表示式(2)之化合物之摻合重量份, 式(3)之化合物之摻合重量份)。 7. —種硬化物,其係使申請專利範圍第1至6 項之硬化性樹脂組成物硬化而獲得。 8·一種光半導體裝置’其係藉由申請專利範圍 項中任項之硬化性樹脂組成物進行密封而獲得 八、圖式: 益 W3表示 貢中任一 第1至6 60a base (wherein a plurality of R3 independently represent a hydrogen atom, a methyl group or a carboxyl group or a chain or a cyclic aliphatic group having a number of 2 to 20), 59 1 201120084 and its use ratio is The range is: W2 / (W2 + W3) = 0.30 to 0.95 (wherein W2 represents a blended part by weight of the compound of the formula (2), and a blended part by weight of the compound of the formula (3)). 7. A cured product obtained by hardening a curable resin composition of claims 1 to 6 of the patent application. 8. An optical semiconductor device which is obtained by sealing a curable resin composition according to any one of the claims of the patent. 8. Drawing: Benefit W3 means any of the tributaries 1 to 6 60
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