TW201111407A - Curable resin composition for encapsulating optical semiconductor and cured article thereof - Google Patents

Curable resin composition for encapsulating optical semiconductor and cured article thereof Download PDF

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TW201111407A
TW201111407A TW99122299A TW99122299A TW201111407A TW 201111407 A TW201111407 A TW 201111407A TW 99122299 A TW99122299 A TW 99122299A TW 99122299 A TW99122299 A TW 99122299A TW 201111407 A TW201111407 A TW 201111407A
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Taiwan
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resin composition
curable resin
acid
compound
formula
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TW99122299A
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Chinese (zh)
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TWI500650B (en
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Yoshihiro Kawada
Masataka Nakanishi
Kenichi Kuboki
Naofusa Miyagawa
Chie Sasaki
Shizuka Aoki
Zuikan Suzuki
Hiroo Koyanagi
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Nippon Kayaku Kk
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

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  • Epoxy Resins (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
  • Led Device Packages (AREA)

Abstract

Provided is a curable resin composition and a cured article thereof, the curable resin composition prevents the cave formation after cured, and has an excellent resistance to corrosiveness gas, as well as an excellent resistance to coloration. The curable resin composition comprising an epoxy resin represented by the following formula (1), a hardening agent and/or a hardening promoting agent. The curable resin composition of this application preferably uses cyclohexane -1, 3, 4-tricarboxylic acid-3, 4-anhydride and methylhexahydrophathalic acid anhydride as hardening agent, and obtains a especial effect of preventing the cave formation after cured. (wherein, the plurality of R1 are same or different, respectively independently represents a hydrogen atom or a methyl group).

Description

201111407 六、發明說明: 【發明所屬之技術領域】 本發明係關於-種適用於電氣電子材料用途,特別是 光半導體用途之硬化性樹脂組成物、其硬化物、以及含有 該硬化物之光半導體裝置。 【先前技術】 以往之LED製品等光半導體元件之封敦材料,基於性 能與經濟性之平衡的觀點係採用環氧樹脂組成物。特別是 以财熱性、透明性、機械特性之平衡優異之以雙驗a型環 氧樹脂為代表之環氧㈣型之環氧樹脂組成物已被廣泛使 用。 然而有人卻指 -----〜叹贡遇入妞波長化 (主要為發藍光的LED製品,波長伽⑽以下的情形)的結 果’因短波長的光的影響,上述封裝材料會於led晶片上 染色,而於最後使LED製品的照度變低。 對此,以3, 4-環氧環己基甲基_3,,4,一環氧環己鐘 W為代表之脂環式環氧樹脂,因其與具有芳香環之環氧 型之環氧樹脂組成物相比在透明性方面較優異,故目 前正積極研究使其作為LED封裝材(專利文獻i、2)。 、另-方面,有人指出該脂環式環氧樹脂因黏度低,在 /丁熱硬化反應時會有容㈣發關題。LED製品之中, ^其為表面組裝式之封S體時,因綠的樹脂量極少(例如 吨左右)’故若使用如該脂環式環氧樹 則於加熱硬化時會揮發。結果有時會造成表面組X裝式1 322191 4 201111407 製品的封裝部產生凹陷而造成瑕疵。此 度,有時供給電流於LED晶片之導線部合露出、凹1的程 :發揮作為封裝材的功能。如上所述,該腊環式二無 姆於加熱硬化時的揮發仍存在課題。 。氧樹脂 而此外,近年來的製品因照明與電視的背 進入更南焭度化,使得LED照明時伴 σ =用該脂環式環氧樹脂之樹脂組二 =故 久3==_後使LED製品_度變低,此外二 面亦存在課題(專利文獻3)。 [專利文獻1]··曰本專利特開平9_213997號 專利文獻2]:日本專利特許3618238號 r款[專利文獻3]:日本專利特再2005_10〇445 I發明内容】 發明所欲解決之課題 述環氧樹脂时久性的問題,目前正在研究使用 入有發魏切環氧齡料代表之導 作為封裝為具有Si—〇鍵的骨架)之樹鹿 ~"另曼而一 月旨對於载鱼I $已知導入有石夕氧燒骨架之樹月旨係較環氧樹 材時,二當其使用於_品的封裝 脂具有更 的木色的觀點而言係被S忍為較環氧樹 脂類盘的耐久性。然而’該導入有石夕氧烧骨架之樹 材使用7旨相比耐透氣性卻不佳。因此,當LED封裝 氣科腊或石夕氧改質環氧樹脂時雖不會造成LED晶 322191 5 201111407 片上的染色問題,但會使LED封裝體内 引線框架上所鍍之銀成分(為 之金屬 艰^刀c為了臭同反射率而鍍銀)變色或 … s後使LED製品的性能降低而留下課題。 一 目前市場上正尋求一種封裝材,其係由盔上 性問題之環氧樹脂組成物所構成,且較以往;; 2 因加熱時的揮發所造成的凹陷,進而= 用以解決課題之手段 本發明人有鑑於上述現況而經過努力研究,結果— 了本發明。 ° .疋风 換吕之’本發明係如下所述: ⑴-種硬化性樹脂組成物’係含有下述式⑴所示之 .:乳樹脂、及可與該環氧樹脂進行硬化反應之硬化劑及/ 或硬化促進劑;201111407 VI. Description of the Invention: [Technical Field] The present invention relates to a curable resin composition suitable for use in an electric and electronic material, particularly an optical semiconductor, a cured product thereof, and an optical semiconductor containing the cured product Device. [Prior Art] Conventionally, a sealed material of an optical semiconductor element such as an LED product is an epoxy resin composition based on the balance between performance and economy. In particular, an epoxy resin composition represented by a double-type a-type epoxy resin, which is excellent in balance of heat, transparency, and mechanical properties, has been widely used. However, some people refer to ----- sigh tribute into the wavelength of the girl (mainly for blue LED products, the wavelength of gamma (10) or less) the result of the short-wavelength light, the above packaging materials will be led The wafer is dyed, and at the end the illumination of the LED article is lowered. In this regard, an alicyclic epoxy resin represented by 3,4-epoxycyclohexylmethyl_3,4, an epoxycyclohexyl W is used as an epoxy type epoxy having an aromatic ring. Since the resin composition is superior in transparency, it is currently being actively studied as an LED package (Patent Documents i and 2). On the other hand, it has been pointed out that the alicyclic epoxy resin has a low viscosity, and there is a problem in the heat-hardening reaction. Among the LED products, when the S-body is a surface-assembled type, the amount of green resin is extremely small (for example, about ton). Therefore, if the alicyclic epoxy tree is used, it will volatilize during heat curing. As a result, the package portion of the surface group X 322191 4 201111407 product is sometimes sunken. In this case, a current is supplied to the lead portion of the LED chip to be exposed and recessed 1 to function as a package. As described above, there is still a problem in the volatilization of the wax ring type in the case of heat curing. . Oxygen resin, in addition, in recent years, the product is more southerly due to the illumination and the back of the TV, so that the LED illumination is accompanied by σ = the resin group of the alicyclic epoxy resin is used = 2 after 3 == _ The LED product has a low degree, and there are also problems on both sides (Patent Document 3). [Patent Document 1] Japanese Patent Laid-Open No. Hei 9-213997 (Patent Document 3): Japanese Patent No. 3,618,238, No. [Patent Document 3]: Japanese Patent Laid-Open No. 2005-10〇445 I SUMMARY OF THE INVENTION PROBLEM TO BE SOLVED BY THE INVENTION The problem of the long-term nature of epoxy resin is currently being studied using a deer that is represented by a derivative of the Wei-cut epoxy ageing material as a skeleton with a Si-〇 bond. Fish I $ is known to be introduced into the stagnation of the stagnation of the stagnation of the squid, and the sap of the tree is more than the epoxy tree. Durability of the oxy-resin type disk. However, the use of the tree having the stone-oxygen-fired skeleton was not as good as the gas permeability. Therefore, when the LED package gas corrugated or Shixi oxygen modified epoxy resin does not cause the dyeing problem on the LED crystal 322191 5 201111407, it will cause the silver component on the lead frame of the LED package (for The metal hard knife c is silver-plated in order to reflect the reflectivity and discoloration or ... s after the performance of the LED product is lowered to leave a problem. At present, a package material is being sought on the market, which is composed of an epoxy resin composition with a helmet problem, and is more conventional; 2, a depression caused by volatilization during heating, and further, a means for solving the problem The inventors have made diligent research in view of the above-mentioned current conditions, and as a result, the present invention has been made. ° The invention of the present invention is as follows: (1) The curable resin composition 'is a compound represented by the following formula (1): a latex resin, and a hardening reaction with the epoxy resin Agent and / or hardening accelerator;

D cD c

(2) 如上述(1)之硬化性樹脂組成物,其中該式(1)中 所有的匕皆為氫原子。 “ (3) 如上述(1)或(2)之硬化性樹脂組成物,其中可與 322191 6 201111407 環氧樹脂進行硬化反應之硬化劑係下述式(2)所示之化合 物及/或下述式(3)所示之化合物;(2) The curable resin composition according to (1) above, wherein all of the oximes in the formula (1) are hydrogen atoms. (3) The hardening resin composition according to (1) or (2) above, wherein the hardening agent which can be hardened with the epoxy resin of 322191 6 201111407 is a compound represented by the following formula (2) and/or a compound represented by the formula (3);

(式中,R2表示氫原子或曱基)。 (4) 如(3)之硬化性樹脂組成物,其中硬化劑係包含式 (2)之化合物與式(3)之化合物兩者,其比率位於下述範圍: W2/(W2+W3)=0. 2 至 0. 9 (其中,W2表示式(2)之化合物的重量份;W3表示式(3) 之化合物的重量份)。 (5) —種硬化物,係由上述(1)至(4)中任一項之硬化 性樹脂組成物硬化而得者。 (6) —種光半導體裝置,係含有光半導體、及封裝該 光半導體之上述(5)之硬化物。 發明效果 本發明之硬化性樹脂組成物由於可防止硬化後凹陷、 耐腐蝕氣體性優異、且耐染色性亦優異,故極適用於光學 7 322191 201111407 材料中特別是光半導體用(LED製品等)之接著材、封裝 【實施方式】 < ° 以下記載本發明之硬化性樹脂組成物。 本發明之硬化性樹脂組成物係含有式(1 )之環兔 作為必須成分。 *樹脂 式(1)所示之環氧樹脂可藉由氧化作為原料之下述 (a)所示之二烯烴化合物的方式來合成。(wherein R2 represents a hydrogen atom or a fluorenyl group). (4) The curable resin composition according to (3), wherein the hardener comprises both the compound of the formula (2) and the compound of the formula (3), and the ratio is in the following range: W2/(W2+W3)= 0. 2 to 0.9 (wherein, W2 represents a part by weight of the compound of the formula (2); and W3 represents a part by weight of the compound of the formula (3)). (5) A cured product obtained by curing the curable resin composition according to any one of the above (1) to (4). (6) An optical semiconductor device comprising an optical semiconductor and the cured product of the above (5) encapsulating the optical semiconductor. Advantageous Effects of Invention The curable resin composition of the present invention is excellent in corrosion resistance, excellent in corrosion resistance, and excellent in dyeing resistance. Therefore, it is highly suitable for use in optical materials, such as optical semiconductors (LED products, etc.). [Substrate and Package] [Embodiment] The curable resin composition of the present invention is described below. The curable resin composition of the present invention contains the rabbit of the formula (1) as an essential component. * Resin The epoxy resin represented by the formula (1) can be synthesized by oxidizing a diene compound represented by the following (a) as a raw material.

(a)(a)

R (式中,複數個存在之Rl可為相同或相異,各 表不虱原子或曱基)。 本料烤烴化合物,例如Rl為氣原子之化合物已於曰 ==Γ772號公報揭示其構造及製造方法,而且 有取代基之構造亦可以相同手法製造。 氧化的手法可列舉利用過乙酸等過酸之氧化方法 用過氧化氫水溶液之氧化方法 / 等,並無限定。 彻Κ氧)之氧化方法 利用過酸進行環氧化的手法, 日本特表⑽7-51G772H ° “揭讀 報之手法等。 日本特開2006-52187號公 利用過氧化氮水溶液進行環氧化的手法可應用各種手 322191 8 201111407 法,具體而言可應用於日本特開昭59-108793號公報、日 本特開昭62-234550號公報、日本特開平5-213919號公 報、日本特開平1 1-349579號公報、日本特公平1-33471 號公報、日本特開2001-17864號公報、日本特公平3-57102 號公報等所列舉之手法。 本發明中以其生成物的低黏度性的觀點而言,較佳為 使用過氧化氫。 以下記載使用過氧化氫進行環氧化的手法之一例。本 發明所使用之式(1)所示之環氧樹脂無論以何種手法製造 均可,並不限定於以下之手法。 使用過氧化氫進行環氧化之具體手法,係使用鎢酸類 作為觸媒進行環氧化者。 鎢酸類可列舉鎢酸、鎢磷酸、矽鎢酸等鎢系之酸及其 鹽。該等鹽之相對(counter)陽離子可列舉四級敍離子、驗 土金屬離子、驗金屬離子等。 具體而言,可列舉:四曱銨離子、苯甲基三乙銨離子、 十三基曱銨離子、二月桂基二甲銨離子、三辛基曱銨離子、 三烷基曱銨(辛基與癸烯基的混合型)離子、三(十六基)曱 銨離子、三甲基硬脂基銨離子、四戊銨離子、三甲基鯨蠟 基銨離子、苯曱基三丁銨離子、三辛基曱銨離子、二鯨蠟 基二曱銨離子等四級銨離子;鈣離子、鎂離子等鹼土金屬 離子;鈉、奸、铯等驗金屬離子等,並無特別限定。 本發明中之上述相對陽離子特別係以四級銨離子較 佳。特別是為了相溶於環氧樹脂,較佳者係以具有長鏈烷 9 322191 201111407 基之四級銨離子作為相對陽離子。 具有長鏈烷基之四級銨離子作為相對陽離子之鎢酸類 之具體製造方法,可列舉使鎢酸類與四級銨鹽進行陽離子 交換反應之方法。 此時所使用之四級銨鹽,較佳為如上述之具有長鏈烷 基者,可使用總碳數為10以上,較佳為2 5至10 0之四級 銨鹽,特別又以其烷基鏈皆為·脂肪族鏈者較佳。 鎢酸類與四級銨鹽之反應較佳為於水或水-有機層之2 層系中進行。此外特別是已知鎢酸類會因其pH而改變構 造,故較佳為將水層之pH調整至2至6之間。調整水層之 pH的方法可使用緩衝液。可使用磷酸系或酒石酸系等各種 緩衝液,但只要可調整pH亦可利用如一般所用之緩衝液。 本製法中特別是以其pH調整的便利性、對磷原子之金屬鹽 的相容性而言,較佳為使用鱗酸系之緩衝液。 具體而言,係將溶解有鎢酸類之水溶液一邊攪拌一邊 於其中添加四級銨鹽。反應進行較慢時若進行加熱(40至 90°C)可促進反應進行。生成之有機化鎢系觸媒自水層析 出。將析出之鹽過濾,或以有機溶劑進行萃取、分液,藉 此獲得目的之鎢系觸媒。其形狀有結晶狀者,亦有樹脂狀 者之各種形狀。 此外,此時為了將步驟簡化,獲得之觸媒亦可不經分 離而直接添加作為原料之二烯烴化合物進行環氧化反應。 此方法所獲得之鎢系觸媒的構造雖不明確,但鎢酸類 之相對陽離子之骨架係與氫離子(proton)、四級銨陽離 10 322191R (wherein, a plurality of R1s present may be the same or different, each having an atom or a sulfhydryl group). The present hydrocarbon-baked hydrocarbon compound, for example, a compound in which R1 is a gas atom, has been disclosed in the specification of 曰 ==Γ772, and the structure of the substituent can be produced in the same manner. The method of oxidizing includes an oxidation method using a peracid such as peracetic acid, an oxidation method using an aqueous hydrogen peroxide solution, and the like, and is not limited. The method of oxidizing by the use of peracid is oxidized by the method of oxidizing by a peracid, and the method of epoxidation of an aqueous solution of nitric oxide is disclosed in Japanese Patent Laid-Open No. 2006-52187. In the Japanese Patent Application Laid-Open No. Sho 59-108793, JP-A-62-234550, JP-A No. 5-213919, and JP-A No. 1-349579 In the present invention, the method described in the Japanese Patent Publication No. Hei. No. Hei. No. Hei. It is preferable to use hydrogen peroxide. An example of a method of performing epoxidation using hydrogen peroxide is described below. The epoxy resin represented by the formula (1) used in the present invention may be produced by any method, and is not limited. The following methods: The specific method of epoxidation using hydrogen peroxide is carried out by using tungstic acid as a catalyst for epoxidation. Examples of the tungstic acid include tungsten acid such as tungstic acid, tungstophosphoric acid, and tungstic acid. Examples of the counter cation of the salt include a quaternary cation, a soil-measuring metal ion, a metal ion, etc. Specific examples thereof include tetraammonium ion, benzyltriethylammonium ion, and thirteen base. Ammonium ion, dilauryldimethylammonium ion, trioctylammonium ion, trialkylammonium (mixture of octyl and nonenyl) ions, tris(hexadecyl)phosphonium ion, trimethyl a quaternary ammonium ion such as stearyl ammonium ion, tetraammonium ion, trimethyl cetyl ammonium ion, benzoyl tributylammonium ion, trioctyl ammonium ion, dicetyl diammonium ion; calcium The alkaline earth metal ions such as ions and magnesium ions; metal ions such as sodium, traita, and strontium are not particularly limited. The above-mentioned relative cations in the present invention are particularly preferably quaternary ammonium ions, especially for phase-dissolving epoxy. The resin is preferably a quaternary ammonium ion having a long-chain alkane 9 322191 201111407 as a relative cation. A specific method for producing a quaternary ammonium ion having a long-chain alkyl group as a relative cation tungstic acid can be exemplified as a tungstic acid. Cation with a quaternary ammonium salt The method of changing the reaction. The quaternary ammonium salt used at this time is preferably a long-chain alkyl group as described above, and a quaternary ammonium salt having a total carbon number of 10 or more, preferably 25 to 10 0 may be used. In particular, it is preferred that the alkyl chain is an aliphatic chain. The reaction of the tungstic acid with the quaternary ammonium salt is preferably carried out in a two-layer system of water or a water-organic layer. Further, tungsten is known. Since the acid changes its structure depending on its pH, it is preferred to adjust the pH of the aqueous layer to between 2 and 6. A buffer solution can be used for adjusting the pH of the aqueous layer, and various buffers such as a phosphate or tartaric acid can be used. However, as long as the pH can be adjusted, a buffer solution such as a general one can be used. In the preparation method, in particular, the pH adjustment convenience and the compatibility with the metal salt of the phosphorus atom are preferably buffered with scaly acid. liquid. Specifically, an aqueous solution in which tungstic acid is dissolved is added to the quaternary ammonium salt while stirring. Heating (40 to 90 ° C) can promote the reaction when the reaction is slow. The resulting organotungsten-based catalyst is chromatographed from water. The precipitated salt is filtered or extracted with an organic solvent and liquid-separated to obtain a desired tungsten-based catalyst. The shape is crystallized, and there are various shapes of the resin. Further, at this time, in order to simplify the step, the obtained catalyst may be directly subjected to an epoxidation reaction by adding a diolefin compound as a raw material without separation. Although the structure of the tungsten-based catalyst obtained by this method is not clear, the framework of the relative cations of the tungstic acid is hydrogen ion (proton) and quaternary ammonium cation 10 322191

201111407 子、用於pH調整之緩衝液之金屬離子相關。 本反應係使用過氧化氫進行環氧化。其中特別又以其 反應系中過氧化氫濃度為40重量%以下較佳。若該濃度超 過40重量%時,生成之環氧化合物的分解反應亦會變得容 易進行,故不佳。 本反應係使用磷酸-磷酸鹽水溶液來調整pH。以其pH 而言,於混合有反應所用之過氧化氫之階段時,較佳為調 整至pH2至7之間,更佳為pH3至7。若為pH2以下時, 環氧基的水解反應、聚合反應會變得容易進行。此外若超 過pH7時,反應會變得極度緩慢,而造成反應時間過長之 問題。 通常論及磷酸-磷酸鹽水溶液一般往往會想到其具有 作為緩衝液的功效,但本反應中因係於過量的酸(過氧化氫 水溶液)中添加磷酸-磷酸鹽,故被認為其不具緩衝作用而 不作為緩衝液。 使用之磷酸-磷酸鹽水溶液,可例舉以下方法製得者: 使用相對於使用之過氧化氫為0.1至10莫耳當量的磷酸 (或磷酸二氫鈉等磷酸鹽),並以鹼性化合物(例如氫氧化 鈉、氫氧化鉀、碳酸鈉、碳酸氫鈉、碳酸鉀等)調整pH之 方法,但並未限定於此。於此,pH較佳係於添加過氧化氫 時即添加使其成為上述之pH。特佳之pH範圍為3. 5至 6. 5,最佳為4. 0至6. 0。此外磷酸鹽的濃度為0. 1至20 重量%,較佳為0. 1至10重量°/〇。 本反應亦可使用有機溶劑。使用之有機溶劑的量相對 11 322191 201111407 於反應基質之二烯烴化合物丨之重量比為〇.3至1〇, 為〇. 3至5,更佳為〇. 5至2· 5。若重量比超過1〇時,又反 應的進行會變得極為緩慢,故不佳。可使用之有機 具體例可使用己炫、環己烧、庚料㈣;f笨、二;苯 等芳香族烴化合物;曱醇、乙醇、異丙醇、丁醇、己醇本 環己醇等醇類。此外,視情況亦可使用甲基乙綱、甲美異 丁酮、環戊酮、環己·酮等酮類;三乙醚、四氫呋喃、二: 院等賴;乙酸乙酉旨、乙酸丁醋、f酸甲醋等酉旨化合 乙腈等腈化合物等。 度進行攪拌 具體之反應操作方法,例如以批次式反應爸進行反應 時’添加作為原料之二稀烴化合物、過氧化氫、鶴系觸媒: pH调整錢、視需要之㈣’於二層進行騎。麟速度 並無特別指定,較佳為使反應系乳化之程度以上之檀掉^ 此外,過氧化氫因於添加時常會放熱,故亦可採用於 各成分添加後再緩慢添加之方法。或亦可先添加過氧化 氣、鶴系觸媒、PH調整紐、視需要之_,錢再緩慢 添加^一婦煙化合物之方法。 此外鶴系觸媒可添加預先作成者,亦可於反應系中 作成後再直接用於反應。 反應溫度並無特別限定,較佳為0至9CTC,更佳為0 至75。(: ’最佳為15至75t。當水溶液中之酸性度較高時, 具體而言當pH為4. G町,進而3. G以下時,反應溫度較 佳為60°C以下。 322191 12 201111407 此外’反應時間雖随& & ^ 業生產的觀點而-,县脖 觸媒量而異,但以工 ,,,, · " &間的反應會消耗相當多的能量, =:較佳範圍為…〇〇小時,更佳為咖小時, 最佳為5至48小時。 反應結束後’將過剩的;两备& 和的過氧化虱進行捕捉(quench )處 理。過氧化氫的捕捉手法,除了可使用還原劑之外,亦可 藉由鹼性化合物進行。本發日种特別是以該兩者進行較佳。 .還原劑可^舉亞硫_、硫代硫酸納、聯胺、草酸等。 還原劑的使用I,㈣於過剩之過氧化 0.01至20.倍莫耳,較佳為〇 〇5 旲斗数U為 至3倍莫耳。 °5至10倍莫耳,更佳為〇·〇5 鹼性化合物可列舉如氫氧化納、 氫氧化辦等金屬氫氧化物;碳酸納::金】,=、 «納、_氫鱗魏鹽;絲化^鉀/金屬碳酸鹽; 在其使用量方面,只要為Μ 唤性固體 甲苯、二甲苯等芳香族烴類;甲基異二、或有機溶劑(例如 類;環己院、狀、辛料^ 、曱基乙酮等嗣 義等;各種溶船者即可,其使 =、.異丙醇等 氫的莫耳數,通常為0,01至2〇 ^於過剩之過氧化 10倍莫耳,更佳為om料耳。2佳為U5至 機溶劑(上述)之溶液的形式添加,亦可以1可以水、或有 若使用不溶於水或有機溶劑之固能驗早日體的形式添加。 系中殘留之過氧化氫的量,較 相對於反應 之用重蕙比].至1〇〇〇倍 322191 13 201111407 的量。更佳為10至500倍,最佳為10至300倍。若使用 不溶於水或有機溶劑之固態鹼時,亦可於後述水層與有機 層之分離後再進行處理。 捕捉過氧化氫後(或進行捕捉前),將有機層與水層加 以分離。此時,當有機層與水層未分離或未使用有機溶劑 時,係添加上述有機溶劑並進行水洗。此時使用之有機溶 劑相對於獲得之原料二烯烴化合物之重量比為0.5至10 倍、更佳為0. 5至5倍。視需要將該操作反覆進行數次, 然後將分離之有機層視需要進行水洗加以精製。 所得之有機層可視需要添加離子交換樹脂、金屬氧化 物、活性碳、蒙脫土、酸性白土、活性白土、石夕藻土等加 以精製。 該等為天然或合成皆可,可使用一種或混合使用複數 種。本處理可有效將有機溶劑中所殘留之觸媒量降低。所 得之有機層視需要進行清洗後,可藉由將溶劑餾除以獲得 目的之環氧化合物。 上述所製得之環氧樹脂係以式(1)所示之構造作為主 要構造,為混合有式(4)所示之各種構造之化合物的混合 物:201111407 Sub-metal ion correlation for pH adjustment buffer. This reaction is epoxidized using hydrogen peroxide. Among them, in particular, the concentration of hydrogen peroxide in the reaction system is preferably 40% by weight or less. When the concentration exceeds 40% by weight, the decomposition reaction of the resulting epoxy compound becomes easy to carry out, which is not preferable. This reaction uses a phosphoric acid-phosphate aqueous solution to adjust the pH. In terms of its pH, it is preferably adjusted to a pH of from 2 to 7, more preferably from pH 3 to 7, in the stage of mixing the hydrogen peroxide used in the reaction. When the pH is 2 or less, the hydrolysis reaction and the polymerization reaction of the epoxy group are facilitated. In addition, if it exceeds pH 7, the reaction becomes extremely slow, causing a problem that the reaction time is too long. It is generally considered that a phosphoric acid-phosphate aqueous solution is generally thought to have an effect as a buffer, but in the present reaction, it is considered to have no buffering effect by adding a phosphate-phosphate to an excess of an acid (aqueous hydrogen peroxide solution). Not as a buffer. The phosphoric acid-phosphate aqueous solution used can be obtained by the following method: 0.1 to 10 mol equivalents of phosphoric acid (or a phosphate such as sodium dihydrogen phosphate) relative to the hydrogen peroxide used, and a basic compound (Methods such as sodium hydroxide, potassium hydroxide, sodium carbonate, sodium hydrogencarbonate, potassium carbonate, etc.) to adjust the pH, but are not limited thereto. Here, the pH is preferably added to the pH as described above when hydrogen peroxide is added. 0至6. 0。 The preferred pH range is 3. 5 to 6. 5, the best is 4. 0 to 6. 0.至重量重量和〇。。 The concentration of the phosphate is from 0.1 to 20% by weight, preferably from 0.1 to 10 weight ° / 〇. An organic solvent can also be used in the reaction. The amount of the organic solvent used is relatively 11.3 to 1 〇, and is preferably from 3. 3 to 5, more preferably 至. 5 to 2.5, based on the weight ratio of the diene compound to the reaction substrate of 11 322191 201111407. If the weight ratio exceeds 1 ,, the reaction progresses extremely slowly, which is not preferable. Specific examples of organic materials that can be used include hexanyl, cyclohexane, and heptane (four); f stupid, di-benzene; aromatic hydrocarbon compounds such as benzene; decyl alcohol, ethanol, isopropanol, butanol, hexanol, cyclohexanol, etc. Alcohols. In addition, ketones such as methyl ethyl ketone, methyl acetobutyl ketone, cyclopentanone, and cyclohexanone may be used as appropriate; triethyl ether, tetrahydrofuran, di: hospital, etc.; acetic acid ethyl acetate, acetic acid butyl vinegar, f A acid such as acetonitrile or the like is a compound such as a nitrile compound such as acetonitrile. Stirring a specific reaction operation method, for example, adding a di-hydrocarbon compound as a raw material, hydrogen peroxide, a crane catalyst: pH adjustment money, if necessary (4) on the second floor when the reaction is carried out in a batch reaction Take a ride. The speed of the lining is not particularly specified, and it is preferred that the degree of emulsification of the reaction system is greater than that. In addition, hydrogen peroxide is often exothermic due to the addition, so that it may be added slowly after the addition of each component. Or you can add the peroxide gas, the crane catalyst, the PH adjustment button, and the _, and then slowly add the method of adding a compound. In addition, the crane catalyst can be added to the pre-formation, or it can be directly used in the reaction after being prepared in the reaction system. The reaction temperature is not particularly limited, and is preferably 0 to 9 CTC, more preferably 0 to 75. (: 'The optimum is 15 to 75t. When the acidity in the aqueous solution is high, specifically, when the pH is 4. G, and further 3. G or less, the reaction temperature is preferably 60 ° C or lower. 322191 12 201111407 In addition, 'reaction time varies with the && production industry's point of view - the county neck varies in amount, but the reaction between work,,,, &"& The preferred range is ... 〇〇 hours, more preferably café hours, most preferably 5 to 48 hours. After the reaction is over, 'overcapacity; two preparations & and ruthenium peroxide are subjected to a quench treatment. The hydrogen capture method can be carried out by using a basic compound in addition to a reducing agent. The present invention is particularly preferably carried out in the same manner. The reducing agent can be used as a sulfurous acid or a sodium thiosulfate. , hydrazine, oxalic acid, etc. Use of reducing agent I, (d) excess peroxide of 0.01 to 20. megamolar, preferably 〇〇5 hopper number U to 3 times mole. ° 5 to 10 times Mo The ear, more preferably 〇·〇5 Basic compounds may be exemplified by metal hydroxides such as sodium hydroxide and water hydroxide; sodium carbonate: gold, =, « _Hydrogen scales; salt; potassium / metal carbonate; in terms of its use, as long as it is aromatic hydrocarbons such as toluene, xylene, etc.; methyl iso-, or organic solvents (such as;   院 院 院 院 院 院 院 院 院 院 院 院 院 院 院 院 院 院 院 院 院 院 院 院 院 院 院 院 院 院 院 院 院 院 院 院 院 院 院 院 院 院 院 院 院 院 院 院Excessive peroxidation 10 times Mo, more preferably om material ear. 2 is preferably added in the form of a solution of U5 to organic solvent (the above), or 1 can be water, or if it is insoluble in water or organic solvent It can be added in the form of the early body. The amount of hydrogen peroxide remaining in the system is more than the ratio of the weight of the reaction to the reaction.] to 1〇〇〇 times 322191 13 201111407, more preferably 10 to 500 times, most It is preferably 10 to 300 times. If a solid base which is insoluble in water or an organic solvent is used, it can be treated after separation of the aqueous layer and the organic layer described later. After capturing hydrogen peroxide (or before capturing), organic The layer is separated from the water layer. At this time, when the organic layer and the water layer are not separated or the organic solvent is not used, the layer is added. The organic solvent is washed with water, and the weight ratio of the organic solvent to the raw material diolefin compound obtained is 0.5 to 10 times, more preferably 0.5 to 5 times, and the operation is repeated several times as needed. Then, the separated organic layer is purified by washing with water as needed. The obtained organic layer may be purified by adding an ion exchange resin, a metal oxide, activated carbon, montmorillonite, acid white clay, activated clay, and Shixia. These may be natural or synthetic, and one type may be used or a plurality of types may be used in combination. This treatment can effectively reduce the amount of the catalyst remaining in the organic solvent. After the obtained organic layer is washed as needed, the solvent can be distilled off to obtain the intended epoxy compound. The epoxy resin obtained as described above has a structure represented by the formula (1) as a main structure, and is a mixture of compounds having various structures represented by the formula (4):

14 322191 ③ (4) 201111407 R,14 322191 3 (4) 201111407 R,

(式中,/ 所謂「以 〇C> (B) (D) P= H 或 CH3〇〇 至D之組合可為任意紐合)。 式(1)所示之構造作為主要構造 使用化:靖脂組成物中’上述環氧樹脂可單獨 飞/、其他裱氧樹脂合併使用。當合併(In the formula, / the so-called "〇C> (B) (D) P = H or CH3〇〇 to D combination can be any combination.) The structure shown in formula (1) is used as the main structure: Jing In the fat composition, the above epoxy resin can be used separately/other epoxy resin.

==氧樹脂中所佔之比率較佳為30重C ΜίΓ 上。惟本發明之環氧樹脂作為硬化性樹 曰、1物的改質劑使用時’係幻至別重量㈣比率添加。 發明之硬化性樹脂組成物中可使用之其他環氧樹 :祕型環氧樹脂、細A _減脂、聯苯 、三苯甲炫型環氧樹脂、料則ph_larakyl) 脂等。具體而言’可列舉:雙酶A、雙驗s、硫二 聯齡。,以^四卞基屮丄—聯幻乂^二醇〜氯醒、 322191 15 201111407 間笨二酚、萘二醇、三-(4-羥苯基)曱烷、 經苯基)乙烧、驗類(齡、院基取代之齡、蔡紛(naphthol)、 烷基取代之萘酚、二羥苯、二羥萘等)與曱醛、乙醛、苯曱 醛、對羥苯曱醛、鄰羥苯曱醛、對羥苯乙酮、鄰經笨乙嗣、 一環戊二烯、°夫°南酸·、4,4 -雙(氣曱基)-i,;_聯笨、4斗,— 雙(曱氧曱基)-1,Γ-聯苯、1,4-雙(氣曱基)苯、丨,4-雙(甲 氧曱基)苯等所構成之聚縮合物及此等之改質物、四漠 Α等南化雙酚類、由醇類衍生之環氧丙基醚化物、脂環式 環氧樹脂、環氧丙胺系環氧樹脂、環氧丙酯系環氧^脂二 倍半矽氧烷系之環氧樹脂(於鏈狀、環狀、梯狀、或該等至 少2種以上之混合構造之錢㈣造巾具有環氧丙基、及/ 或環氧環己烧構造之環氧樹脂)等固態或液狀環氧樹脂,伸 並非限定於此。 升r入μ ….' 机例舶我1 口牛矽氧烷系之環氧樹难 以。脂環式環氧樹脂具體而言可列舉3,4-環氧環己 ,—3’’4,-環氧環己基_g旨等,於總環氧樹脂中所佔二 率較佳為60重量%以下,特佳為4〇重量% 6〇重量%以上時有產生揮發等缺陷之虞。此外 ,系=環氧樹脂(於鍵狀、環狀、梯狀、或該等至少2種以 己==5:= 構造中具有環氧丙基、及/或環氧環 合對耐魅^ 歧狀縣樹脂,較佳為於不 性造成影響之範圍使用。當併用該倍切 7〇重,旨時,於總環氧樹脂中所佔之比率較佳為 重“以下,特佳為4。重《以下。若併用過二 322191 16 201111407 石夕氧烧系之%氧樹脂時,會使对腐姓氣體性降低。 本發明之硬化性樹脂組成物係含有與上述環氧樹脂具 有反應性之硬化劑,特別是可進行熱硬化反應之硬化劑。 該硬U可列舉例如:胺系化合物、酸軒系化合物、 醯胺系化合物、盼系化合物、紐系化合物等。可使用之 硬化劑之具體例可列舉:二胺基二苯甲燒、二伸乙基三胺、 三伸乙基四胺、二胺二苯砜、異佛酮二胺、二氰二胺 (chcyanchamide)、亞麻仁油酸2倍體與伸乙基二胺所合成 之聚醯胺樹脂、鄰苯二甲酸酐、^,私苯三甲酸酐、 1’2, 4, 5-苯四曱酸酐、順丁烯二酸酐、四氫鄰苯二曱酸酐、 甲基四氫鄰苯二甲酸酐、甲基納迪克酸軒(methyl nadic anhydride)、納迪克酸酐、六氫鄰苯二甲酸酐、γ基六氫 鄰苯二甲酸酐、丁烧四缓酸酐、雙環[2, 2, 1]庚院一2, 3-二 羧酉夂酐甲基雙環[2,2,1]庚烧-2,3-二緩酸酐、環己烧 :1’3’4-三羧酸-3,4_酐、雙酚Α、雙酚F、雙酚s、第雙酚、 萜二酚、4, 4’-聯酚、2, 2’-聯酚、3, 3,,5, 5,-四甲基-D,i,一 聯苯]-4, 4’-二醇、氫酿、間苯二紛、萘二醇、三_(4_經苯 基)甲烷、1,1,2, 2-四(4-經苯基)乙烧、驗類(,盼、院基取 代之酚、萘酚、烷基取代之萘酚、二羥笨、二羥萘等)與甲 醛、乙酸、苯甲盤、對經苯甲酸、鄰經苯甲盤、對經苯乙 酮、鄰羥苯乙酮、二環戊二烯、呋喃醛、4,4,—雙(氯甲 基)-1’1-聯苯、4,4’-雙(甲氧甲基;)_1,1,_聯苯、1,4,_ 雙(氣甲基)苯、1,4,-雙(甲氧甲基)苯等所構成之聚縮合物 及此等之改質物、四漠雙驗A等齒化雙齡類、味唾、三氣 322191 17 201111407 化硼-胺錯合物、胍衍生物、箱與酚類之 限定於此。該等可單獨使用,亦可使用2 =上#’但並非 此外,若其用於例如LED等之透明封裝時 使用硬化後透明性優異之酸酐,例如較佳為甲基四氣= 二甲酸針、^基納迪克酸針、納迪克酸野、六氫鄰笨 酸酐、尹基六氫鄰苯二T酸酐、丁烷四羧酸酐、雙環[2,二 庚烷^-二羧酸酐〜甲基雙環^^^庚烷^-」’ 酐、環己燒-1,3, 4-三緩酸一3, 4一酐(式⑵之化合物)等具^ 脂環骨架之酸野。該等具有脂環式骨架之酸肝可使用;售 品’例如以三菱瓦斯化學公司等製造之h_TMa系列而言「 可取得_品歧狀品(雖說為餘品,但於室 財 固體狀態,作業性非常差)。 現丰 此外’使用環己烷-13,4-三羧酸_3,4,時,單獨使 用的情況下因其為固態或高黏度的半固體狀態故有時作業 性會變得極端不良,因此,期望能夠使用其他硬化劑,較 佳為併用具有脂環式f架之贿。此時可併用之硬化劑, 只要為液狀且黏度低者則無制限定,例如以市售之硬化 劑而S ’可列舉含有甲基納迪克酸酐、納迪克酸酐之舰-100(新日本理化(股)製);或含有六氫鄰苯二甲酸針(式⑶ 之化δ物,R2為氫原子)、曱基六氮鄰苯二甲酸野(式⑶之 化合物,R2為甲基)之RIKACID MH700(新日本理化(股)製)== The ratio of the oxygen resin is preferably 30% C ΜίΓ. However, when the epoxy resin of the present invention is used as a curing agent for a curable tree or a substance, it is added in a ratio of illusion to weight (four). Other epoxy trees which can be used in the curable resin composition of the invention are: a secret epoxy resin, a fine A _ fat reduction, a biphenyl, a triphenyl styrene epoxy resin, a ph_larakyl resin, and the like. Specifically, 'double enzyme A, double test s, and sulfur secondary age can be mentioned. , ^ 卞 卞 屮丄 联 联 联 联 二醇 二醇 二醇 二醇 氯 ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ Test (age, age of substituted base, naphthol, alkyl substituted naphthol, dihydroxybenzene, dihydroxynaphthalene, etc.) with furfural, acetaldehyde, benzofural, p-hydroxybenzaldehyde, O-hydroxybenzaldehyde, p-hydroxyacetophenone, o-p-ethylidene, monocyclopentadiene, sulphate, 4,4-bis (gas sulfhydryl)-i,; , a polycondensate composed of bis(indolyl)-1, fluorene-biphenyl, 1,4-bis(carbomethoxy)benzene, anthracene, 4-bis(methoxyindolyl)benzene, etc. Such as modified materials, four desert bisphenols, such as epoxy propyl ether compounds derived from alcohols, alicyclic epoxy resins, epoxy propylamine epoxy resins, propylene acrylate epoxy resins ^ Fatty disesquioxane-based epoxy resin (in the form of a chain, a ring, a ladder, or a mixture of at least two or more of these kinds) (4) The towel has an epoxy propyl group, and/or an epoxy ring. Solid or liquid epoxy resin such as epoxy resin) herein. l r into μ ....' machine example I am a bit of oxenoxane epoxy tree difficult. The alicyclic epoxy resin specifically includes 3,4-epoxycyclohexyl, -3''4,-epoxycyclohexyl-g, etc., and the secondary ratio in the total epoxy resin is preferably 60. When the weight is less than or equal to 4% by weight, particularly preferably 4% by weight or more, there are defects such as volatilization. In addition, the system = epoxy resin (in the form of a bond, a ring, a ladder, or the like, at least two of which have an epoxy propyl group in the structure of ==5:=, and/or an epoxy ring to resist the charm ^ The resin of the genus of the genus is preferably used in the range of the influence of the inferiority. When the weight of the bismuth is used in combination, the ratio of the total epoxy resin is preferably "the following, particularly preferably 4." "The following. If the oxy-resin is used in the 322191 16 201111407, the corrosion-resistant gas composition is reduced. The curable resin composition of the present invention contains reactivity with the above epoxy resin. The curing agent is, in particular, a curing agent capable of undergoing a thermosetting reaction. Examples of the hard U include an amine compound, an acid group compound, a guanamine compound, a expectant compound, a kinetic compound, and the like. Specific examples thereof include diaminobenzophenone, di-extension ethyltriamine, tri-ethylidenetetraamine, diamine diphenylsulfone, isophoronediamine, dicyanamide, and linseed oil. Polyamide resin, phthalic anhydride, ^, synthesized by acid diploid and ethylene diamine Benzoic anhydride, 1'2,4,5-benzenetetracarboxylic anhydride, maleic anhydride, tetrahydrophthalic anhydride, methyltetrahydrophthalic anhydride, methyl nadic acid Anhydride), nadic anhydride, hexahydrophthalic anhydride, gamma hexahydrophthalic anhydride, butyl sulphate, bicyclo [2, 2, 1] Gengyuan-2, 3-dicarboxylate Anhydride methylbicyclo[2,2,1]heptane-2,3- bis-anhydride, cyclohexane: 1'3'4-tricarboxylic acid-3,4-anhydride, bisphenol oxime, bisphenol F, Bisphenol s, bisphenol, stilbene, 4, 4'-biphenol, 2, 2'-biphenol, 3, 3, 5, 5,-tetramethyl-D, i, biphenyl] -4, 4'-diol, hydrogen brewing, isophthalic acid, naphthalenediol, tris-(4-phenylene)methane, 1,1,2,2-tetrakis(4-phenylene)ethene , test class (, hope, substituted by the base of phenol, naphthol, alkyl substituted naphthol, dihydroxy stupid, dihydroxy naphthalene, etc.) and formaldehyde, acetic acid, benzene disk, p-benzoic acid, orthophthalic acid Disc, p-acetophenone, o-hydroxyacetophenone, dicyclopentadiene, furanal, 4,4,-bis(chloromethyl)-1'1-biphenyl, 4,4'-bis (a Oxymethyl group ;)_1,1,_ Polycondensate composed of 1,4,_bis(gasmethyl)benzene, 1,4,-bis(methoxymethyl)benzene, and the like, and the modified product of the four deserts A and the like Age, taste, and gas 322191 17 201111407 Boron-amine complex, anthraquinone derivative, box and phenol are limited to this. These may be used alone or 2 = upper #' but not in addition, If it is used for transparent encapsulation such as LED, an acid anhydride excellent in transparency after hardening is used, and for example, methyl tetragas = dicarboxylic acid needle, quinamic acid needle, nadic acid field, hexahydroortho anhydride , Yinji hexahydrophthalic acid anhydride, butane tetracarboxylic anhydride, bicyclo [2, diheptane^-dicarboxylic anhydride~methylbicyclo^^^heptane^-"' anhydride, cyclohexan-1, 3, 4-tri-hysonic acid-3, 4-anhydride (a compound of the formula (2)) and the like having an alicyclic skeleton. These acid livers having an alicyclic skeleton can be used; for example, in the h_TMa series manufactured by Mitsubishi Gas Chemical Co., Ltd., "the product can be obtained (although it is a surplus product, but it is in a solid state, The workability is very poor.) In addition, when using cyclohexane-13,4-tricarboxylic acid _3,4, it is sometimes used because it is a solid state or a high viscosity semi-solid state. It may become extremely bad. Therefore, it is desirable to be able to use other hardeners, and it is preferable to use a bribe with an alicyclic f. In this case, the hardener which can be used in combination is not limited as long as it is liquid and has a low viscosity, for example, A commercially available hardener and S' may be a ship containing a methyl nadic anhydride or a nadic anhydride, a vessel (100 manufactured by Nippon Chemical and Chemical Co., Ltd.), or a needle containing a hexahydrophthalic acid (a formula (3)). , R2 is a hydrogen atom), fluorenyl hexanitrophthalic acid field (the compound of the formula (3), and R2 is a methyl group) RIKACID MH700 (manufactured by Nippon Chemical and Chemical Co., Ltd.)

等硬化劑。合併使用時,可預先將固態或半固態狀之環己 烷-1 ’ 3,4 -二綾酸—3,4 _酐與黏度較低之硬化劑於室溫或加 溫(在加温條件方面,為了防止硬化劑的揮發,較佳為15(TC 322191 18 201111407 乂下更佳為120C)條件下混合直至均勻,藉此成為作業 性較佳的狀態。此外’岐时業性與硬化後之封裝材凹 的觀點而5 ’環己H,3,4-三緩§υ,4_酐於總硬化劑 中的使用比率為5至90重量%,更佳為1〇至9〇重量%,最 佳為30至80重量%之範圍。若混合比率超過9〇重量%,則 作為硬化劑之作業性會極端不良。此外若低於5重量%,則 對於封裝材的凹陷方面會有改善效果變弱之虞。 本發明之硬化性樹脂組成物中之硬化劑的使用量,招 對於裱氧樹脂之環氧基丨當量,較佳為〇. 5至5當量。 更佳為0.7至1.2當量。若相對環氧基i當量低於〇 5當 1,或超過1.5當量時,其硬化皆不完全而有無法獲得良 好的硬化物性之虞。 本發明之硬化性樹脂組成物中,可與硬化劑一同併用 硬化促進劑(亦稱為硬化觸媒)’或不使用硬化劑而單獨使 用硬化促進劑。可使用之硬化促進劑之具體例可列舉:2-甲基咪唾、2-苯基口米σ坐、2-—基11米哇、2-十七基味唾、 2-苯基-4-甲基咪唑、1-苯曱基-2-苯基咪唑、1-苯曱基-2-甲基咪唑、1-氰乙基一2-甲基咪唑、卜氰乙基一2-苯基咪唑、 1-氰乙基-2-十一基咪唑、2, 4-二胺基-6(2’ -曱基咪唑(Γ )) 乙基-對稱三D井、2, 4-二胺基-6(2,-十一基ρ米峻(Γ ))乙基一 對稱三D井、2, 4-二胺基-6(2’ -乙基-4-曱基咪唑(1’))乙基― 對稱三哄、2, 4-二胺基-6(2’-甲基咪唑(Γ ))乙基-對稱三 畊·異三聚氰酸加成物、2-曱基咪唑異三聚氰酸之2 : 3加 成物、2-苯基咪唑異三聚氰酸加成物、2-苯基-3, 5-二羥曱 19 322191 201111407 基咪唑、2-苯基-4-羥曱基-5-甲基咪唑、1-氰乙基_2一苯基 -3, 5-二氰乙氧曱基咪唑之各種咪唑類;以及該等^米峻類與 鄰笨一甲酸、間苯二曱酸、對苯二曱酸、1,2, 4-苯三曱酸、 1,2’ 4, 5-笨四甲酸、萘二羧酸、順丁烯二酸、草酸等多元 羧酸所形成之鹽類;與二氰二胺等醯胺類、丨,8_二吖_雙環 (5.4.0)十一稀-7等二。丫化合物及該等之四苯侧酸酯、盼 盤清漆樹脂等之鹽類、上述多元竣酸類或膦酸類所形成之 鹽類;溴化四丁銨、溴化鯨蠟基三曱銨、溴化辛基三曱銨 等銨鹽;三苯基膦、三(曱苯甲醯基)膦、溴化四笨基鱗、 四苯基鐫四苯基硼酸酯等膦類或鱗化合物;2, 4, 6-三胺甲 酚等酚類;胺加成物、辛酸錫等金屬化合物等;以及將該 等硬化促進劑以做成微膠囊之微膠囊型硬化促進劑等。使 用何種硬化促進劑係視獲得之透明樹脂組成物所需之特 性,例如透明性、硬化速度、作業條件而適當選擇。硬化 促進劑相對於環氧樹脂1 〇 Q重量份通常係於〇 . 〇 〇 1至1 5重 量份之範圍内使用。 本發明之硬化性樹脂組成物中亦可含有含磷化合物作 為賦予阻燃性之成分。含磷化合物可為反應型者亦可為添 加型者。含磷化合物的具體例可列舉:三甲基磷酸酯、三 乙基磷酸酯、二甲酚基鱗酸酯、三伸苯二甲基鱗酸酯、甲 酚二苯基磷酸酯、甲酚基-2, 6-二伸苯二曱基磷酸酯、1,3_ 伸苯基雙(二伸苯二甲基磷酸酯)、丨,4_伸苯基雙(二伸苯二 甲基磷酸酯)、4, 4’-聯笨基(二伸苯二曱基磷酸酯)等磷酸 酯類;9, 10-二氫-9-氧雜-ίο—磷雜菲_1〇_氧化物、1〇(2,5_ 322191 20 201111407 二羥笨基)-1〇Η-9-氧雜_ι〇-磷雜莊 (Phosphane)類;輯赫與上 物等碟燒 之條氧化合物、紅構等,反應所得 =;一特佳為二苯基:=苯:: 基叫酉曰)、申笨基雙(二伸苯二甲 聯苯基(二伸笨二甲基磷或含料合物 =物的含量,較㈣含雜合物/縣翻=()丨至〇 6(重 置比)。若為0. i以下則阻燃性會不充分,若為〇 可能對硬化物的吸濕性、介電特性有不良影響。· 入^本發明之硬化性職組成物中亦可視需要配合點 以㈣日。黏合劑樹脂可列舉:丁越系樹脂、乙駿系樹脂、 丙稀酸系樹脂、環氧-耐綸編旨、職,系樹脂、環氧一職 系樹脂、聚酿胺系樹脂、聚醯亞胺系樹脂、石夕氧系樹脂 但並非限定於此。黏合誠脂的配合量以視需要於曰σ 硬化物的阻燃性、耐熱性之範圍内使用較佳,相對於二 成分剛重量份通常為0.05至50重量份,較' ^ 20重量份。 々u.ub至 本發明之硬化性樹脂組成物中可視需要添加 材。無機填充材可列舉:結晶二氧化石夕、炼融二氧化石真充 氧化紹、錯石、御_、碳酸辦、碳化♦、氮化:化石夕、 硼、氧化鍅、矽酸鎂石、塊滑石、尖晶石、二氣、氮化 石等粉體或該等經球形化之珠粒等,但並非限定於鈦 等填充材可單獨使用,亦可使用2種以上。該等盔此。該 材的含量可❹佔本發明之硬化性樹脂組成物中q、'機填充 至9 5重 322191 21 201111407 量%之量。此外本發明之硬化性樹脂組成物中亦可添加矽烷 耦合劑、硬脂酸、棕櫚酸 '硬脂酸鋅、硬脂酸鈣等離型劑、 顏料等各種配合劑、各種熱硬化性樹脂。 當本發明之硬化性樹脂組成物用於光半導體封裝材 時,對於上述使用之無機填充材的粒徑而言,藉由使用奈 米級之填充材可不妨礙透明性而補強機械強度等。作為奈 米級的標準’平均粒徑為500nm以下,特別是使用平均粒 徑為20〇nm以下之填充材對於透明性而言較佳。 當本發明之硬化性樹脂組成物用於光半導體封裝材 時,可視需要添加螢光體。螢光體係具有例如將藍色lED 兀件所發出之藍色光的一部分加以吸收而發出波長經改變 之黃色光’藉此而形成白色光之作用者。螢光體係預先分 散於硬化性樹脂組成物中,然後再封裝光半導體。螢光體 並無特別限定,可使用以往習知之螢光體,例如可舉出稀 土元素之鋁酸鹽、硫代沒食子酸鹽 '正矽酸鹽等。更具體 而言可列舉:YAG螢光體、TAG螢光體、正矽酸鹽螢光體、 硫代沒食子酸鹽螢光體、硫化物螢光體、CASN螢光體等螢 光體,例如:YAl〇3 : Ce、Y3Al5〇12 : Ce、Y4Al2〇9 : ce、y2〇2S : Eu、Sr5(P〇4)3Cl : Eu、(SrEu)O . AW、CaA1SiN3 等。榮光 體的粒徑係使用該領域習知之粒徑,以平均粒徑而言為丄 至250 # m’特別又以2至50/zm較佳。使用該等螢光體時, 其添加量相對於其樹脂成分1〇〇重量份為i至8〇重量份, 較佳為5至60重量份。 當本發明之硬化性樹脂組成物用於光半導體封裝材 322191 22 201111407 時,為了防止各種螢光體於硬化時沉降,可添加例如二氧 化矽微粉末(亦稱為Aer〇sil)等搖變性賦予劑。上述二氧 化矽微粉末可列舉例如:Aerosil 50、Aer〇sil 9〇、Aer〇sii 130 、 Aerosil 200 、 Aerosil 300 、 Aerosil 380 、 Aerosil 〇X50 ^ Aerosil TT600 ^ Aerosil R972 > Aerosil R974 ^ Aerosil R202 ' Aerosil R812> Aerosil R812S > Aerosi1 R805、RY200、RX2〇〇(japan Aerosil 公司製)等。 本發明之硬化性樹脂組成物為了防止染色之目的,可 3有私:化合物作為光安定劑或墙系化合物及齡系化合物作 為抗氧化劑。 上述胺化合物可列舉例如:四(1,2, 2, 6, 6-五甲基-4- 哌啶基)=1,2, 3, 4-丁烷四羧酸酯、四(2, 2, 6, 6-四甲基-4-0底咬基)=1,2,3,4-丁燒四敌酸酯、ι,2,3,4-丁烧四缓酸與 1,2, 2’ 6, 6-五f基-4-哌啶醇及3, 9-雙(2-羥基-1,1-二甲 基乙基)-2, 4, 8, 10-四氧雜螺[5. 5]十一烷所構成之混合酯 化物、癸烷二酸雙(2, 2, 6, 6-四甲基-4-哌啶基)癸二酸酯、 雙(1_十一娱•氧基-2, 2, 6, 6-四曱基痕咬-4-基)碳酸酉旨、 2, 2, 6, 6-四曱基-4-哌啶甲基丙烯酸酯、雙(2, 2, 6, 6_四甲 基-4-哌啶基)癸二酸酯、雙(;[,2, 2, 6, 6-五甲基-4-哌啶基) 癸二酸酯、4-苯曱醯氧基-2, 2, 6, 6-四甲基哌啶、1-{2-[3-(3, 5-二-第三丁基-4-羥笨基)丙醯氧基]•乙基卜4_[3_ (3, 5-二-第三丁基-4-羥苯基)丙醯氧基]_2, 2, 6, 6_四曱基 哌啶、1,2, 2, 6, 6-五甲基-4-哌啶基_甲基丙烯酸酯、雙 (1,2, 2, 6, 6-五甲基-4-哌啶基){[3, 5_雙g,卜二甲基乙基) 23 322191 201111407 _4一羥苯基]甲基丨丁基丙二酸酯 '癸烷二酸雙(2, 2, 6, 6〜四 曱基-1(辛基氧基)_4_哌啶基)酯、〗,卜二子基乙基氫過氣 化物與辛烷之反應生成物、^^^,,,^,,-四气令^雙〜 (丁基-(N-曱基_2, 2, 6, 6-四甲基哌啶-4-基)胺基)__三 卩井-2-基)-4, 7-二氮雜癸燒-1,丨〇_二胺、二丁胺· 1,3卜 三啡.Ν,Ν’ -雙(2, 2, 6, 6-四甲基-4-哌啶基)-1,6-六亞甲基 二胺與Ν-(2, 2, 6, 6-四甲基-4-哌啶基)丁胺之聚縮合物、 聚{[6-(1,1,3, 3-四甲基 丁基)胺_1,3, 5-三畊-2, 4-二基] [(2, 2, 6, 6-四甲基-4-哌啶基)亞胺基]六亞甲基[(2, 2 6,6-四甲基-4-哌啶基)亞胺基]}>琥珀酸二甲酯與4_羥基 -2, 2, 6’ 6-四甲基-1-哌啶乙醇之聚合物、2, 2, 4, 4-四甲基 -20-( 0 -月桂氧羰基)乙基_7_氧雜_3, 2〇_二氮雜二螺 [5. 1. 11. 2]二十一烷-21-酮、yg-丙胺酸,Ν,一(2, 2, 6, 6_四 甲基-4-哌啶基)-十二烷酯/十四烷酯 乙醯基_3_十二烷 基-1-(2, 2, 6, 6-四甲基-4-旅咬基)《;比d各咬一2, 5-二酮、 2, 2’ 4, 4-四甲基-7-氧雜-3, 20-二氮雜二螺[5. 1. 11. 2]二 十一烷-2卜酮、2, 2, 4, 4-四曱基-21-氧雜-3, 20-二氮雜二 環-[5. 1. 11. 2]-二十一烷-20-丙酸十二烷酯/十四烷酯、丙 二酸[(4-甲氧基笨基)-亞甲基]-雙(1,2, 2, 6, 6-五曱基_4_ 痕啶基)¾、2, 2, 6, 6-四曱基-4-旅啶醇之高級脂肪酸酯; 1,3-苯二甲酿胺,Ν,Ν’ -雙(2, 2, 6, 6-四甲基-4-α底咬基)等 受阻胺系 '奥他苯酮(octabenzone)等二苯基酮系化合物; 2-(2H-笨并二唑-2-基)-4-(1,1,3, 3-四甲基丁基)酚、 (2-羥基-5-曱基苯基)苯并三唑、2-[2-羥基-3-(3, 4, 5, 6- 322191 24 201111407 四氫鄰苯二甲醯亞胺-甲基)-5-甲基苯基]苯并三唑、2-(3-第三丁基-2-經基-5-甲苯基)-5 -氯苯并三°坐、2-(2 -經基 -3, 5-二-第三戊基苯基)苯并三唑、甲基3-[3-(2H-苯并三 唑-2-基)-5-第三丁基-4-羥苯基]丙酸酯與聚乙二醇之反 應生成物、2-(2H-苯并三唑-2-基)-6-十二烷基-4-甲基酚 等苯并三唑系化合物;2, 4-二-第三丁苯基-3, 5-二-第三丁 基-4-羥苯曱酸酯等苯曱酸酯系、2-(4,6-二苯基-1,3, 5-三畊-2-基)-5-[(己基)氧基]酚等三哄系化合物等,其中又 以受阻胺系化合物特佳。 上述光安定劑之胺化合物可使用以下所示之市售品。 市售之胺系化合物並無特別限定,可列舉例如:C i ba Specialty Chemicals 公司製造之 THINUVIN 765、THINUVIN 770DF > THINUVIN 144 ' THINUVIN 123 ' THINUVIN 622LD ' THINUVIN 152、CHIMASSORB 944 ; ADEKA 公司製造之 LA-52、 LA-57、LA-62、LA-63P、LA-77Y、LA-81、LA-82、LA-87 等。 上述磷系化合物並無特別限定,可列舉例如:1,1,3-三(2 -曱基-4-二(十三烷)亞磷酸酯-5-第三丁苯基)丁烷、 二硬脂基新戊四醇二亞磷酸酯、雙(2, 4-二-第三丁苯基) 新戊四醇二亞磷酸酯、雙(2, 6-二-第三丁基-4-甲苯基)新 戊四醇二亞磷酸酯、苯基雙酚A新戊四醇二亞磷酸酯、二 環己基新戊四醇二亞磷酸酯、三(二乙苯基)亞磷酸酯、三 (二-異丙苯基)亞磷酸酯、三(二-正丁苯基)亞磷酸酯、三 (2, 4-二-第三丁苯基)亞磷酸酯、三(2, 6-二-第三丁苯基) 25 322191 201111407 亞磷酸酯、三(2, 6-二-第三丁苯基)亞磷酸酯、2, 2,-亞曱 基雙(4, 6-二-第三丁苯基)(2, 4-二-第三丁苯基)亞磷酸 醋、2’ 2’ -亞曱基雙(4, 6-二-第三丁苯基)(2-第三丁基-4-曱苯基)亞磷酸酯、2, 2’-亞曱基雙(4-曱基-6-第三丁苯基) (2-第三丁基-4-曱苯基)亞墙酸酯、2, 2’ -亞乙基雙(4-曱基 -6-第三丁苯基)(2-第三丁基-4-甲苯基)亞磷酸酯、四(2, 4 -一-第二丁苯基)-4, 4’ -伸聯苯基二亞膦酸酯、四(2, 4-二-第三丁苯基)-4, 3’ -伸聯苯基二亞膦酸酯、四(2, 4-二-第三 丁笨基)-3, 3’ -伸聯苯基二亞膦酸酯、四(2, 6-二-第三丁苯 基)-4, 4’-伸聯苯基二亞膦酸酯、四(2, 6-二-第三丁苯基) -3, 3’ -伸聯笨基二亞膦酸酯、雙(2, 4-二-第三丁苯基)-4-苯基-苯基亞膦酸酯、雙(2, 4-二-第三丁苯基)-3-笨基-苯 基亞膦酸酯、雙(2, 6-二-正丁笨基)-3-笨基-苯基亞膦酸 醋、雙(2, 6-二-第三丁苯基)-4-苯基-苯基亞膦酸酯、雙 (2, 6- — _第二丁苯基)-3-苯基-苯基亞膦酸g旨、四(2, 4-二-第三丁基-5-曱苯基)-4, 4’ -伸聯苯基二亞膦酸酯、磷酸三 丁酯、磷酸三曱酯、填酸三曱苯酯、磷酸三苯酯、鱗酸三 氯苯酯、磷酸三乙酯、磷酸二苯基曱苯酯、磷酸二苯基酯 聯苯基酯、破酸三丁氧乙酯、破酸二丁酯、填酸二辛酯、 磷酸二異丙酯等。 上述磷系化合物亦可使用市售品。市售之磷系化合物 並無特別限定,可列舉例如:ADEKA公司製造之ADK STAB PEP-4C 、 ADK STAB PEP-8 、 ADK STAB PEP-24G 、 ADK STAB PEP-36、ADK STAB HP-10、ADK STAB 2112、ADK STAB 260、 26 322191And other hardeners. When used in combination, the solid or semi-solid cyclohexane-1 '3,4-diphthalic acid-3,4-anhydride and the lower viscosity hardener can be pre-conditioned at room temperature or heated (in warming conditions) On the other hand, in order to prevent the volatilization of the hardener, it is preferable to mix it until it is uniform under the condition of 15 (TC 322191 18 201111407, more preferably 120C), thereby achieving a workability. From the viewpoint of the concave portion of the encapsulant, 5 'cyclohexene H, 3, 4-trisole, 4 - anhydride is used in the total hardener in a ratio of 5 to 90% by weight, more preferably 1 to 9 % by weight. It is preferably in the range of 30 to 80% by weight. If the mixing ratio exceeds 9% by weight, the workability as a hardener may be extremely poor. Further, if it is less than 5% by weight, there is an improvement in the depression of the packaging material. The amount of the hardener to be used in the curable resin composition of the present invention is preferably from 5 to 5 equivalents, more preferably from 0.7 to 1.2, based on the epoxy group equivalent of the epoxy resin. Equivalent. If the equivalent of the epoxy group is less than 〇5 when 1, or more than 1.5 equivalents, the hardening is not complete. In the curable resin composition of the present invention, a curing accelerator (also referred to as a curing catalyst) may be used together with the curing agent or a curing accelerator may be used alone without using a curing agent. Specific examples of the hardening accelerator to be used include 2-methylmeridene, 2-phenylmethane sigma, 2-base 11-mw, 2-septyl-salt, 2-phenyl-4- Methylimidazole, 1-phenylhydrazino-2-phenylimidazole, 1-phenylhydrazino-2-methylimidazole, 1-cyanoethyl-2-methylimidazole, cyanoethyl 2-phenylimidazole , 1-cyanoethyl-2-undecylimidazole, 2,4-diamino-6(2'-mercaptoimidazole (Γ)) ethyl-symmetric tri-D well, 2,4-diamino- 6(2,-11-hydroxypyrene (Γ)) ethyl-symmetric tri-D well, 2,4-diamino-6(2'-ethyl-4-mercaptoimidazole (1')) - Symmetric triterpene, 2, 4-diamino-6 (2'-methylimidazolium (Γ)) ethyl-symmetric tri-farming, iso-cyanuric acid adduct, 2-mercaptoimidazole isotrimerization 2:3 adduct of cyanate, adduct of 2-phenylimidazolium isocyanurate, 2-phenyl-3,5-dihydroxyindole 19 322191 201111407 imidazole, 2-phenyl-4-hydroxyl曱-5-methylimidazole, 1-cyanoethyl-2-phenyl-3-, 5-dicyanoacetoxyimidazole, various imidazoles; and the likes and sulphonic acid, isophthalic acid Formed by polycarboxylic acids such as capric acid, terephthalic acid, 1,2,4-benzenetridecanoic acid, 1,2' 4, 5-tetracarboxylic acid, naphthalene dicarboxylic acid, maleic acid, oxalic acid a salt; a guanamine such as dicyandiamide, an anthracene, an anthracene, a bismuth-bis-bicyclic ring (5.4.0), an eleven -7, etc., an anthracene compound, and a tetracene-based acid ester, a pan varnish a salt of a resin or the like, a salt formed of the above polybasic phthalic acid or a phosphonic acid; an ammonium salt such as tetrabutylammonium bromide, cetyltrimethylammonium bromide or octyltrimonium bromide; triphenylphosphine; a phosphine or a scaly compound such as a phthalocyanine or a fluorinated compound such as a tetraphenylphosphonium bromide or a tetraphenylphosphonium tetraphenylborate; a phenol such as 2,4,6-triamine cresol; A metal compound such as a compound or a stannic acid; and a microcapsule-type hardening accelerator or the like which is a microcapsule. Which kind of hardening accelerator is used is appropriately selected depending on the characteristics required for the obtained transparent resin composition, such as transparency, curing speed, and working conditions. The hardening accelerator is usually used in an amount of from 1 to 15 parts by weight based on 1 part by weight of the epoxy resin. The curable resin composition of the present invention may further contain a phosphorus-containing compound as a component imparting flame retardancy. The phosphorus-containing compound may be either a reactive type or an additive type. Specific examples of the phosphorus-containing compound include trimethyl phosphate, triethyl phosphate, xylenol squarate, tris-phenylene dimethyl sulphate, cresol diphenyl phosphate, and cresol -2,6-diphenylene phosphate, 1,3_phenylene bis(diphenylene phosphate), hydrazine, 4-phenylene bis(diphenylene dimethyl phosphate) , 4, 4'-linked phenyl (diphenylene phosphate) and other phosphates; 9, 10-dihydro-9-oxa-ίο-phosphaphenanthrene oxime, 1 〇 (2,5_ 322191 20 201111407 dihydroxy phenyl)-1〇Η-9-oxa _ι〇-Phosphane; Phosphorus, red structure, etc. Reaction yield =; a particularly good diphenyl: = benzene:: base called 酉曰), Shen Stupi bis (diphenylene biphenyl (diextended dimethylphosphine or containing compound = object) The content of the product is lower than (4) containing the compound/county = () 丨 to 〇 6 (reset ratio). If it is below 0. i, the flame retardancy will be insufficient, and if it is 〇, it may be hygroscopic to the hardened material. , dielectric properties have an adverse effect. · Into the hardening composition of the present invention can also be used as needed (4) The binder resin may be exemplified by: Ding Yue resin, BJ resin, acrylic resin, epoxy-nylon, etc., resin, epoxy grade resin, polyamine resin The polyimine-based resin or the sulphur-based resin is not limited thereto. The blending amount of the adhesive is preferably used within the range of the flame retardancy and heat resistance of the 曰σ-cured material, as opposed to two. The component parts by weight is usually 0.05 to 50 parts by weight, more than '^20 parts by weight. 々u.ub to the curable resin composition of the present invention may be added as needed. The inorganic filler may be exemplified by crystalline silica. The smelting of the sulphur dioxide, the sulphuric acid, the smelting, the sulphur, the sulphur, the carbonation, the nitriding: the fossil, the boron, the cerium oxide, the strontium silicate, the talc, the spinel, the second gas, the nitrite The powder or the spheroidized beads or the like may be used alone or in combination, and may be used singly or in combination of two or more kinds. The content of the material may constitute the curability of the present invention. In the resin composition, q, 'machine is filled to the amount of 9 5 weight 322191 21 201111407%. The curable resin composition of the present invention may be added with various components such as a decane coupling agent, a stearic acid, a palmitic acid zinc stearate, a calcium stearate, a release agent such as a pigment, and various thermosetting resins. When the curable resin composition of the present invention is used for an optical semiconductor encapsulant, the particle size of the inorganic filler used as described above can be used to reinforce mechanical strength and the like without using transparency by using a nano-sized filler. The standard of the rice grade is an average particle diameter of 500 nm or less, and particularly, a filler having an average particle diameter of 20 Å or less is preferable for transparency. When the curable resin composition of the present invention is used for an optical semiconductor package. , you can add a fluorescent body as needed. The fluorescent system has a function of, for example, absorbing a part of the blue light emitted from the blue lED element to emit a yellow light having a changed wavelength, thereby forming white light. The fluorescent system is previously dispersed in the curable resin composition, and then the photo-semiconductor is encapsulated. The phosphor is not particularly limited, and a conventionally known phosphor can be used, and examples thereof include an aluminate of a rare earth element and a thiogallate acid salt. More specifically, a phosphor such as a YAG phosphor, a TAG phosphor, a strontium silicate phosphor, a thiogallate phosphor, a sulfide phosphor, or a CASN phosphor can be used. For example, YAl〇3: Ce, Y3Al5〇12: Ce, Y4Al2〇9: ce, y2〇2S: Eu, Sr5(P〇4)3Cl: Eu, (SrEu)O. AW, CaA1SiN3, and the like. The particle size of the glare body is a particle size which is conventionally known in the art, and is preferably from 丄 to 250 # m' in terms of the average particle diameter, particularly preferably from 2 to 50/zm. When these phosphors are used, the amount thereof is from i to 8 parts by weight, preferably from 5 to 60 parts by weight, per part by weight of the resin component. When the curable resin composition of the present invention is used for the optical semiconductor package 322191 22 201111407, in order to prevent sedimentation of various phosphors during hardening, for example, a shake such as cerium oxide micropowder (also referred to as Aer〇sil) may be added. The agent is given. The above-mentioned ceria micropowder may, for example, be: Aerosil 50, Aer〇sil 9〇, Aer〇sii 130, Aerosil 200, Aerosil 300, Aerosil 380, Aerosil 〇X50 ^ Aerosil TT600 ^ Aerosil R972 > Aerosil R974 ^ Aerosil R202 ' Aerosil R812> Aerosil R812S > Aerosi1 R805, RY200, RX2〇〇 (manufactured by Japan Aerosil Co., Ltd.). The curable resin composition of the present invention can be used as a light stabilizer, a wall compound, and an age-based compound as an antioxidant for the purpose of preventing dyeing. The above amine compound may, for example, be tetra(1,2,2,6,6-pentamethyl-4-piperidinyl)=1,2,3,4-butanetetracarboxylate or tetra(2, 2) , 6, 6-tetramethyl-4-0 bottom bite) = 1,2,3,4-butane tetracarboxylic acid ester, ι,2,3,4-butane sulphuric acid and 1,2, 2' 6, 6-penta-f--4-piperidinol and 3,9-bis(2-hydroxy-1,1-dimethylethyl)-2, 4, 8, 10-tetraoxaspiro[ 5. 5] Mixed esterified compound of undecane, bis(2,2,6,6-tetramethyl-4-piperidyl)sebacate of decanedioic acid, double (1_11 entertainment •oxy-2, 2, 6, 6-tetradecyl dentate-4-yl)carbonate, 2, 2, 6, 6-tetradecyl-4-piperidine methacrylate, bis (2 , 2, 6, 6_tetramethyl-4-piperidinyl) sebacate, bis(;[,2, 2, 6, 6-pentamethyl-4-piperidyl) sebacate, 4-phenylhydrazineoxy-2, 2, 6, 6-tetramethylpiperidine, 1-{2-[3-(3, 5-di-t-butyl-4-hydroxyphenyl)propanoid Oxy]•ethyl b 4_[3_(3,5-di-t-butyl-4-hydroxyphenyl)propenyloxy]_2, 2, 6, 6-tetradecylpiperidine, 1,2 , 2, 6, 6-pentamethyl-4-piperidinyl-methacrylate, bis(1,2,2,6,6-pentamethyl-4-piperidinyl){ [3, 5_ double g, bisdimethylethyl) 23 322191 201111407 _4 hydroxyphenyl] methyl butyl butyl malonate 'decane diacid bis (2, 2, 6, 6 ~ four 曱Reaction product of keto-1 (octyloxy)_4_piperidinyl) ester, bismuthylethyl hydrogen pervaporate and octane, ^^^,,,^,,- four gas orders ^ Bis(butyl-(N-fluorenyl 2,2,6,6-tetramethylpiperidin-4-yl)amino)__Sansui-2-yl)-4,7-diaza癸 癸 -1, 丨〇 _ diamine, dibutylamine · 1,3 卜 trimorph. Ν, Ν '-bis (2, 2, 6, 6-tetramethyl-4-piperidinyl)-1 , a polycondensate of 6-hexamethylenediamine and Ν-(2, 2, 6, 6-tetramethyl-4-piperidyl)butylamine, poly{[6-(1,1,3, 3-tetramethylbutylamine amine 1,3,5-trinyl-2,4-diyl][(2, 2, 6, 6-tetramethyl-4-piperidinyl)imido] Hexamethylene[(2,2 6,6-tetramethyl-4-piperidinyl)imido]}>dimethyl succinate with 4_hydroxy-2, 2, 6' 6-tetra Polymer of keto-1-piperidineethanol, 2, 2, 4, 4-tetramethyl-20-(0-lauroyloxycarbonyl)ethyl-7-oxa-3, 2〇-diazaspiro [5. 1. 11. 2] Behenyl-21-one, yg-alanine, hydrazine, one (2) , 2, 6, 6_tetramethyl-4-piperidinyl)-dodecyl ester/tetradecyl ethionyl _3_dodecyl-1-(2, 2, 6, 6-four Methyl-4-Brigade bite) "; bite 2, 5-dione, 2, 2' 4, 4-tetramethyl-7-oxa-3, 20-diazabispiro[ 5. 1. 11. 2 2] behen-2-one, 2, 2, 4, 4-tetradecyl-21-oxa-3, 20-diazabicyclo-[5. 1. 11 . 2]-Tetradecane-20-propanoic acid dodecyl ester/tetradecyl ester, malonic acid [(4-methoxyphenyl)-methylene]-bis (1,2, 2, a higher fatty acid ester of 6,6-pentamethyl- 4-pyridyl) 3⁄4, 2, 2, 6, 6-tetradecyl-4-brazidin; 1,3-benzoammine, hydrazine,受'-bis(2, 2, 6, 6-tetramethyl-4-α-bottom base) and other hindered amines such as dioxobenzone and other diphenyl ketone compounds; 2-(2H-stupid Andoxazol-2-yl)-4-(1,1,3,3-tetramethylbutyl)phenol, (2-hydroxy-5-nonylphenyl)benzotriazole, 2-[2- Hydroxy-3-(3, 4, 5, 6- 322191 24 201111407 tetrahydrophthalimido-methyl)-5-methylphenyl]benzotriazole, 2-(3-third 2-yl-2-carbyl-5-tolyl)-5-chlorobenzotrienyl, 2-(2-propionyl-3, 5-di-third Phenyl)benzotriazole, methyl 3-[3-(2H-benzotriazol-2-yl)-5-tert-butyl-4-hydroxyphenyl]propionate and polyethylene glycol a reaction product, a benzotriazole compound such as 2-(2H-benzotriazol-2-yl)-6-dodecyl-4-methylphenol; 2,4-di-t-butylphenyl a benzoate ester such as -3,5-di-t-butyl-4-hydroxybenzoate or 2-(4,6-diphenyl-1,3,5-trin-2-yl) A triterpenoid compound such as -5-[(hexyl)oxy]phenol, and the like, and a hindered amine compound is particularly preferable. As the amine compound of the above light stabilizer, a commercially available product shown below can be used. The commercially available amine-based compound is not particularly limited, and examples thereof include THINUVIN 765, THINUVIN 770DF > THINUVIN 144 'THINUVIN 123 ' THINUVIN 622LD ' THINUVIN 152, CHIMASSORB 944 manufactured by C i ba Specialty Chemicals, Inc.; LA manufactured by ADEKA Corporation -52, LA-57, LA-62, LA-63P, LA-77Y, LA-81, LA-82, LA-87, etc. The phosphorus compound is not particularly limited, and examples thereof include 1,1,3-tris(2-mercapto-4-bis(tridecane)phosphite-5-tert-butylphenyl)butane, and Stearyl neopentyl alcohol diphosphite, bis(2,4-di-t-butylphenyl) pentaerythritol diphosphite, bis(2,6-di-t-butyl-4- Tolyl) neopentyl alcohol diphosphite, phenyl bisphenol A neopentyl alcohol diphosphite, dicyclohexyl neopentyl alcohol diphosphite, tris(diethylphenyl) phosphite, three (di-isopropylphenyl) phosphite, tris(di-n-butylphenyl) phosphite, tris(2,4-di-t-butylphenyl)phosphite, tris(2,6-di -T-butylene) 25 322191 201111407 Phosphite, tris(2,6-di-t-buttyl) phosphite, 2, 2,-fluorenylene bis (4,6-di-third Butyl phenyl) (2,4-di-t-butylphenyl) phosphite sorbate, 2' 2'-fluorenylene bis(4,6-di-t-butylphenyl) (2-tert-butyl 4-曱phenyl)phosphite, 2,2'-fluorenylene bis(4-mercapto-6-tert-butylphenyl) (2-tert-butyl-4-anthracenephenyl) subwall Acid ester, 2, 2'-Asia Bis(4-mercapto-6-t-butylphenyl)(2-t-butyl-4-tolyl)phosphite, tetrakis(2,4-di-t-butylphenyl)-4, 4'-Extended biphenyl diphosphinate, tetrakis(2,4-di-tert-butylphenyl)-4,3'-extended biphenyl diphosphinate, tetrakis (2, 4-di -Third butyl)-3,3'-Extended biphenyl diphosphinate, tetrakis(2,6-di-t-butylidene)-4,4'-extended biphenylphosphonium diphosphine Acid ester, tetrakis(2,6-di-t-butylidene)-3,3'-extension of phenyldiphosphinate, bis(2,4-di-t-butylphenyl)-4- Phenyl-phenylphosphinate, bis(2,4-di-t-butylphenyl)-3-phenyl-phenylphosphonite, bis(2,6-di-n-butyl) -3-styl-phenylphosphinic acid vinegar, bis(2,6-di-t-butylphenyl)-4-phenyl-phenylphosphinate, bis (2, 6- _ second Butyl)-3-phenyl-phenylphosphinic acid g, tetrakis(2,4-di-tert-butyl-5-fluorenylphenyl)-4,4'-extended biphenyl diphosphine Acid ester, tributyl phosphate, tridecyl phosphate, tridecyl phenylate, triphenyl phosphate, trichlorophenyl phthalate, triethyl phosphate, diphenyl decyl phenyl phosphate Biphenyl diphenyl phosphate esters, tris butoxyethyl acrylate broken, broken dibutyl fill dioctyl phosphate and diisopropyl phosphate and the like. Commercially available products can also be used as the phosphorus compound. The commercially available phosphorus-based compound is not particularly limited, and examples thereof include ADK STAB PEP-4C, ADK STAB PEP-8, ADK STAB PEP-24G, ADK STAB PEP-36, ADK STAB HP-10, ADK manufactured by ADEKA Corporation. STAB 2112, ADK STAB 260, 26 322191

201111407 ADK STAB 522A、ADK STAB 1178 ' ADK STAB 1500、ADK STAB C、ADK STAB 135A、ADK STAB 3010、AM STAB ΊΤΡ。 紛系化合物並無特別限定,例如2, 6-二-第三丁基-4_ 甲酚、正十八烷基-3-(3, 5-二-第三丁基-4-羥苯基)丙酸 酯、四[亞曱基-3-(3, 5-二-第三丁基-4-羥苯基)丙酸酯] 甲烷、2,4-二_第三丁基-6-曱酚、1,6—己二醇_雙_[3一 (3, 5-二-第三丁基-4-羥苯基)丙酸酯]、三(3, 5-二-第三丁 基-4-羥苯甲基)-異三聚氰酸酯、H5-三甲基_2,4,6一三 (3, 5-二-第三丁基-4-羥苯甲基)苯、新戊四醇-四[3_(3, 5一 二-第三丁基-4-羥苯基)丙酸酯]、3, 9_雙_{2—[3-(3-第三 丁基-4-羥基-5-甲苯基)-丙醯氧基]—l i—二甲基乙基} -2, 4, 8,10-四氧雜螺[5. 5]十一烷、三乙二醇-雙[3-(3-第 三丁基-5-曱基-4-羥笨基)丙酸酯]、2, 2,-亞丁基雙(4, 6-二-第三丁酚)、4,4,-亞丁基雙(3_曱基_6_第三丁酚)、 2, 2’ -亞曱基雙(4-曱基-6-第三丁酚)、2, 2’ _亞曱基雙(4_ 乙基-6-第三丁酚)、2-第三丁基_6_(3_第三丁基_2_羥基 -5-甲基苯曱基)-4-甲酚丙烯酸酯、羥基_3, 5-二_ 第三戊苯基)乙基]-4, 6-二-第三戊苯基丙烯酸酯、4, 4, _ 硫基雙(3-曱基-6-第三丁酚)、4,4,_亞丁基雙(3_甲基_6_ 第三丁酚)、2-第三丁基-4-甲酚、2, 4-二-第三丁酚' 2, 4-一-第二戊酚、雙-[3, 3-雙~(4’ -羥基-3, 一第三丁苯基)-丁 酸]-乙二醇酯、2, 4-二-第三丁酚、2, 4_二_第三戊酚等。 上述齡系化合物亦可使用市售品。市售之酚系化合物 並無特別限定,可列舉例如:Ciba Specialty201111407 ADK STAB 522A, ADK STAB 1178 ' ADK STAB 1500, ADK STAB C, ADK STAB 135A, ADK STAB 3010, AM STAB ΊΤΡ. The compound is not particularly limited, and examples thereof include 2,6-di-t-butyl-4-methylphenol and n-octadecyl-3-(3,5-di-tert-butyl-4-hydroxyphenyl). Propionate, tetrakis[rhodecyl-3-(3,5-di-t-butyl-4-hydroxyphenyl)propionate]methane, 2,4-di-t-butyl-6-anthracene Phenol, 1,6-hexanediol_bis-[3-(3,5-di-t-butyl-4-hydroxyphenyl)propionate], tris(3,5-di-t-butyl) -4-hydroxybenzyl)-isocyanate, H5-trimethyl-2,4,6-tris(3,5-di-t-butyl-4-hydroxybenzyl)benzene, Neopentyl alcohol-tetrakis[3_(3,5-di-t-butyl-4-hydroxyphenyl)propionate], 3,9_bis_{2-[3-(3-t-butyl) -4-hydroxy-5-tolyl)-propenyloxy]-li-dimethylethyl}-2, 4, 8,10-tetraoxaspiro[5. 5]undecane, triethylene Alcohol-bis[3-(3-tert-butyl-5-fluorenyl-4-hydroxyphenyl)propionate], 2,2,-butylenebis(4,6-di-t-butylphenol) , 4,4,-butylidene bis(3_fluorenyl-6-tert-butylphenol), 2, 2'-fluorenylene bis(4-mercapto-6-tert-butylphenol), 2, 2' _Alkenylene bis(4_ethyl-6-tributylphenol), 2-tert-butyl_6_(3_t-butyl-2-hydroxy-5 -methylphenylhydrazinyl)-4-cresol acrylate, hydroxy-3,5-di-p-pentylphenyl)ethyl]-4,6-di-t-pentyl phenyl acrylate, 4, 4 , _ thiobis(3-mercapto-6-tert-butylphenol), 4,4,-butylidene bis(3_methyl_6_third butanol), 2-tert-butyl-4-methyl Phenol, 2, 4-di-t-butylphenol ' 2, 4-mono-p-pentanol, bis-[3, 3-bis-(4'-hydroxy-3, a tributylphenyl)-butyl Acid]-ethylene glycol ester, 2,4-di-third butanol, 2,4-di-p-pentanol, and the like. Commercially available products can also be used as the above-mentioned aging compounds. The commercially available phenolic compound is not particularly limited, and examples thereof include Ciba Specialty

Chemicals 27 322191 201111407 公司製造之 IRGANOX 1010 ' IRGANOX 1035 ' IRGANOX 1076 ' IRGANOX 1135、IRGANOX 245 ' IRGANOX 259、IRGANOX 295 ' IRGANOX 3114 ' IRGAN0X 1098 ' IRGAN0X 1520L ; ADEKA 公 司製造之 ADK STAB AO-20、ADK STAB AO-30、ADK STAB AO-40、ADK STAB AO-50、ADK STAB AO-60、ADK STAB AO-70、 ADK STAB AO-80 、 ADK STAB AO-90 、 ADK STAB AO-330 ;住 友化學工業製造之 Sumilizer GA-80、Sumilizer MDP-S、 Sumilizer BBM-S 、 Sumilizer GM 、 Sumilizer GS(F)、 Sumi1izer GP 等。 其他方面,亦可使用市售之添加劑作為樹脂的抗染色 劑。可列舉例如:Ciba Specialty Chemicals公司製造之 THINUVIN 328 ' THINUVIN 234 ' THINUVIN 326 ' THINUVIN 120、THINUVIN 477、THINUVIN 479、CHIMASS0RB 2020FDL、 CHIMASSORB 119FL 等。 以含有至少1種以上之上述磷系化合物、胺化合物、 酴系化合物較佳’其配合量雖無特別限定,但相對於該硬 化性樹脂組成物為〇. 〇〇5至5. 0重量%之範圍。 本發明之硬化性樹脂組成物可藉由將各成份均勻混合 而製得。本發明之硬化性樹脂組成物可利用與習知之方法 相同的方法簡單地獲得其硬化物。例如可列舉以下手法: 將環氧樹脂與硬化劑以及視需要之硬化促進劑、含鱗化合 物、黏合黏樹脂、無機填充材及配合劑,配合需要使用擠 壓機、捏合機、輥機、行星式攪拌機等充分混合直至均勻 而獲得硬化性樹脂組成物’若其硬化性樹脂組成物為液狀 28 322191 201111407 時,係以灌注法或鑄模法,將硬化性樹脂組成物含浸於基 材或澆鑄於模具中’然後藉由加熱硬化;若為固態時,係 將其熔融後再進行澆鑄,或使用轉注成形機等加以成形, 然後藉由加熱硬化。硬化溫度、時間係8〇至200t,2至 10小時。硬化方法可於高溫直接固化,但較佳為逐步加溫 進行硬化反應。具體而言,係於80至15CTC之間進行初期 硬化,再於100至200°C之間進行後硬化。硬化的階段較 佳為分成2至8個階段進行升溫,更佳為2至4個階段。 此外,可錯由將本發明之硬化性樹脂組成物溶解於曱 苯、二曱苯、丙酮、曱基乙基酮、曱基異丁酮、二曱基曱 醯胺、二曱基乙醯胺、.曱基吡洛。定酮等溶劑而成為硬化 性樹脂組成物清漆,接著使其含浸於玻璃纖維、碳纖維、 聚酯纖維、聚醯胺纖維、氧化鋁纖維、紙等基材並加熱乾 燥,然後將所付之預浸體熱加壓成形而獲得本發明之硬化 性樹脂組成物之硬化物。此時之溶劑通常係使用佔本發明 之硬化性樹脂組成物與該溶劑之混合物的1至70重量%的 量,較佳為15至70重量%。此外亦可將液狀組成物直接藉 由RTM(Resin Transfer Molding,樹脂轉注成形法)方式 來獲得含有碳纖維之環氧樹脂硬化物。 此外’亦可將本發明之硬化性樹脂組成物使用作為膜 型封裝用組成物。欲獲得上述膜型樹脂組成物時,可藉由 將本發明之硬化性樹脂組成物(上述清漆)塗佈於離型膜 上,然後加熱去除溶劑進行B_s^age化以獲得片狀之接著 劑。該片狀接著劑可使用作為多層基板等中之層間絕緣 29 322191 201111407 層、光半導體之整體封骏犋。 接著針對當本發明 Z _ 封裝材㈣用之/氧樹脂組絲㈣光半導體之 ^ , ^απ 馆况進行詳細說明。 虽本發明之環氧樹月t ^曰、、且成物作為高亮度之白色LED等 户元錄r之硒/亦,黏晶材使用時,可藉由將本發明之含 匕=(硬化劑組成物)與環氧樹脂,以及其他 之硬化促進劑、搞人枓 , ,θ^^ σ 、抗氧化劑、光安定劑等添加物充 刀〉吣&來調製裱氧樹脂έ Β , θ、,且成物,而作為封裝材,或用作黏 晶材與封裝材兩者。混人 tlj ,. α方法係使用捏合機、三軸輥 '萬 用攪拌機、行星式攪拌棬 幾句質機、均相機(homodisper)、 珠磨機等’於常溫或加溫下進行混合。 、问儿度之白色led等光半導體元件—般係如以下方式 構成將於藍虞石、尖晶石、SiC、Si、ZnO等基板上積層 有 GaAs GaP 、 GaAlAs 、 GaAsP ' AlGa 、 InP 、 GaN 、 InN 、 AIN InGaN等之半導體晶片’藉由接著劑(黏晶材)而黏著 於引線框架或放熱板、封裝體(paekage)。為了電流的流動 亦有連接金線等導線之翻。為了使該半導體W免於熱 與濕氣’並發揮透鏡機能’係彻環氧樹脂等封裝材加以 封裝。本發明之環氧樹脂組.成物可使用作為該封裝材或黏 晶材。以步驟上而言本發明之硬化性樹脂組成物較佳係使 用作為黏晶材與封裝材兩者。 使用本發明之硬化性樹脂喊物將半導體晶片黏接於 基板之方法’可將本發明之環氧樹脂組成物利用分注法、 灌注法、職印刷法塗狀後,再搭财㈣W並進行 322191 30 201111407 加熱硬化將半導體晶片黏接。加熱可使用熱風循環、么 外線、高頻等方法。 w ^ 加熱條件較佳為例如於80至23(Tc進行丨分鐘至 小時左右。為了降低加熱硬化時產生之内部應力之目 例如可以80至120°C,30分鐘至5小時進行預硬化,然 再以120至18CTC,30分鐘至10小時的條件進行後硬化\ 封裝材的成形方式可使用以下之方式等:注入方 係將已插入固定有如上述之半導體晶片之基板之模板主 入封裝材後,再進行加熱硬化而成形;壓縮成形方式,^ 將封裝材預先注入於模具上,使原先固定於基板上之半導 體晶片浸潰於其巾’進行加熱硬化之後再自模具分離。 注入方法可列舉分注法、轉注成形法、射出成形法等。 加熱可使用熱風循環式、紅外線、高頻等方法。加敎 條件較佳為例如於8G至23(rc進行!分鐘至24小時左右。、 為了降低加熱硬化時產生之内部應力之目的,例如可以8〇 至1。抓,30分鐘至5小時進行預硬化,然後再以12〇至 8〇 C ’ 30分鐘至10小時的條件進行後硬化。 又硬化性树脂組成物之其他用途 =樹料硬化性樹肋搞所❹之—㈣途,除了 H例如接著劑'塗料'塗㈣、成形材料(包含片、膜、 :、,、絲材料(包含印刷基板、電線被覆等)、封裝材 亦可以封裝材、基板用之I酸酯樹腊組成物、或光 硬化^的形式作為丙稀酸醋系樹腊等其他等的添 加劑等。 322191 31 201111407 接著劑除了可列舉土木用、建築用、汽車用、一般事 務用、醫療用之接著劑之外,亦可作為電子材料用之接著 劑。該等之中,電子材料用之接著劑可列舉積層(buiidup) 基板等多層基板之層間接著劑、黏晶材、底膠等半導體用 接著劑、BGA補強用底膠、異向性導電性膜(ACF)、異向性 導電性糊(ACP)等組裝用接著劑等。 封裝材可列舉用於電容器、電晶體、二極體、發光二 極體、1C、LSI等之灌注法、浸潰法、轉注成形法之封裝; 用於1C、LSI類之COB、C0F、TAB等之灌注法之封裝;用 於倒裝晶片等底膠、QFP、BGA、CSP等IC組裝體類組裝時 之封裝(補強用底膠)等。 利用本發明所獲得之硬化物可用於例如光學零件材料 等各種用途。光學材料一般係指使可見光、紅外線、紫外 線、X線、雷射等光穿透該材料之用途中所用之材料。更 具體而言,除了可列舉燈型、SMD型等LED用封裴材之外, 亦可列舉如下所述者:液晶顯示器領域之基板材料、導光 板、棱鏡片、偏轉板、位相差板、視角補正膜、接著劑、 偏光元件保護膜等液晶用膜等液晶顯示裝置週邊材料。此 外可舉出作為次世代平_示_期狀純 示器)之封裝材、抗反射膜、光學補正膜、外單材、前3 璃之保護膜、料玻射代_、 置所用之LED模具材' lED封 ”負不裝 前面玻璃替代材料、接著劑=護膜、 器中之基板材料、導光板、稜顯示 双現月、偏轉板、位相差板、 322191 32 201111407 視角補正膜、接著劑、偏光元件保護膜;或有機EL (electroluminescence)顯示器中之前面玻璃之保護膜、前 面玻璃替代材料、接著劑;或場發射顯示器(FED)中之各種 膜基板、前面玻璃之保護膜、前面玻璃替代材料、接著劑。 在光記錄領域中,可列舉VD(影音光碟,Vide〇disc)、cD/ CD-ROM、CD-R/RW、DVD-R/DVD-RAM、MO/MD、PD(相變化光 碟)、光學卡用之光碟基板材料、讀取透鏡、保護膜、封裝 材、接著劑等。 ~ 在光學機器領域中,可列舉照相機之透鏡用材料、取 景器稜鏡、標的稜鏡、取景器外殼、部分光接受感測器; 或攝影機之攝影透鏡、取景器;或投影電視之投射透鏡、 保護膜、封1材、接著劑等;或感光機n之透細材料、 封裝材、接著劑、膜等。在光學零件領域中,可列舉光資 訊系統中之光開關週邊之纖維材料、透鏡、波導器、元件 其封裝材接著劑等;或光連接器週邊之光纖材料、線圈 B封裝材、接著劑等。在光被動零件或光電路零件中可 f舉α透鏡、波導器、LED之封裝材、CCD之封裝材、接著劑 等或光電子積體電路(0EIC)週邊之基板材料、纖維材料、 一牛之封裝材、接著劑等。在光纖領域中, 飾顯示器之,昭日i ^ 彿-β # .、'月、導光等;工業用途之探測器類、顯示、 才示不類專,或念 翁汛基礎建設用及家庭内之數位機器連接用 o TL· _ '' 導體積體電路週邊材料中,可列舉用於LSI、 超 LSI 材?用 ·,、員微蝕刻之光阻材料。在汽車、輸送機領域 中,可列舉汽电 刊微項埤 用反射燈、轴承遵.圈、齒輪部分、财银塗 322191 33 201111407 擎:零件、電裝零件、各種内外 層 裝零件、驅動引擎、教車油、★ ^ 板、内n ''曰車用防鏽鋼板、内部面 板内裝材、保護綑紮用線、燃甶 代品;或鐵路車辆用之複層破璃替 予劑、引擎週邊零件、保^ 飛_把材之勒性賦 項域方面’可列舉内裝加工用 =㈣ 膜、诂链砝/JU。 燈罩、片、玻璃中間 膜玻璃替代。σ、太陽電池週邊 舉房屋被覆終在次世代之光雷二f農業方面,可列 列兴右嫵W -从 代之先電機能有機材料方面,可 歹i舉有機Ε“件週邊材料、有機光折射元 元件之光增幅元件、光運算亓杜 九先轉換 ,c ^元連异70件、有機太陽電池週邊之美 板材料、纖維材料、元件之封裝材、接著劑等。 土 封裝材可列舉用於電容器、電晶體、二極體、 ίο' 用於1C、LSI類之C0B、c〇F、ΤΑβ等之濯注法之封 於倒裝晶月等底膠、BGA、CSP I ϊρ h # ja* 襄⑽強用底膠)等。CS”IC封裝體類組裝時之封 成物材料的其他用途方面,可舉出硬化性樹脂組 成物所使狀-般用途,除了可鱗例如接著劑、塗料、 塗覆劑、成形材料(包含片、膜、FRP等)、絕緣材料( 2刷基板、電線被覆等)'封騎之外,亦可作為其他樹脂 等的添加财。接著劑除了可列舉土木用、建築用、、气車 用、-般事務用、醫療用之接著劑之外,亦可作為電ς材 枓用之接著劑。該等之中,電子材料用之接著劑可列舉積 層基板衫層基板之相接著劑、黏晶材、底料半導體 322191 34 201111407 用接著劑、BGA補強用底膠、異向性導電性膜(ACF)、異向 性導電性糊(ACP)等組裝用接著劑等。 實施例 接著藉由實施例對本發明進行更具體的說明,以下之 「份」如未特別說明即表示「重量份」。此外,本發明並非 限定於該等實施例中。於實施例中,環氧當量係依照JIS K-7236進行測定;黏度係使用E型黏度劑於25°C進行測 定。氣相層析(以下稱GC)中之分析條件,係使用HP5-MS (0. 25mm I. D. xl5m,膜厚0. 25 # m),管柱烘箱溫度設定為 初期溫度100°C,以每分鐘15°C的速度升溫並於300°C保 持25分鐘。使用氦作為載體氣體。此外凝膠滲透層析(以 下稱GPC)之測定係如下所述:管柱係使用ShodexSYSTEM-21 管柱 (KF-803L 、 KF-802. 5(x2 管) 、 KF-802) ; 連結溶離 液係使用四氫吱喃;流速為lml/min;管柱溫度為40°C ; 且以UV(254nm)進行檢測;標準曲線係使用Shodex製標準 聚苯乙烯。 本說明書中之百分率、比率、份等如未特別說明即以 重量表示。 合成例1 二稀烴化合物的合成 於具備攪拌機、回流冷凝管、攪拌裝置、Dean-Stark 管之燒瓶中一邊進行氮氣沖洗,一邊添加1,4-環己烷二羧 酸172份、3-己烯-1-曱醇448份、曱笨600份、對曱苯磺 酸4份,且於45°C以回流的方式調整系統内的真空度以去 35 322191 201111407 除生成的水’並進行12小時的反應。反應結束後,以1 〇 重量%氫氧化鈉水溶液120份將反應溶液清洗3次,再以水 70份/次反覆進行水洗直到廢液呈現中性為止,然後利用 旋轉蒸發器於加熱減壓下將曱笨與未反應之環己稀 甲醇餾除’藉此獲得於常溫為液狀之二烯烴化合物343份。 環氧樹脂的合成 於具備攪拌機、回流冷凝管、攪拌裝置之燒瓶中一邊 進行氮氣沖洗’一邊添加水15份、12-鎢碟酸〇. 份、墙 酸氣一納0.78份、二牛脂烧基二甲錢乙酸@旨2 7份(LION AKZ0製’ 50重量%己烷溶液,ARQUAD 2HT乙酸醋),待鶴 酸系觸媒生成後,添加甲苯180份與上述所製得之二稀烴 化合物118份’然後再度搜拌使其成為乳狀之溶液。將該 溶液升溫至50°C ’於進行激烈攪拌的同時歷經1小時添加 35重量%過氧化氫水溶液70份,然後再於50¾授摔13小 時。利用GC確認反應的進行,發現原料的峰值已消失。 接著以1重量%氫氧化鈉水溶液進行中和之後,添加 20重量%硫代硫酸鈉水溶液25份並攪拌30分鐘,然後靜 置。將分離成為2層之有機層取出’於其添加石夕膠(Wak〇_ gel C-300)10 份、活性碳(N0RIT 製,CAP SUPER)20 份、 皂土(H0JUN製’ Bengel SH)20份,於室溫攪拌1小時後進 行過遽。將所得之濾、液以水10 0份進行3次清洗,再從所 得之有機層中將曱苯餾除,藉此獲得於常溫為液狀之下述 式(1)之環氧樹脂(EP-1)119份。製得之環氧樹脂的環氧當 量為 217g/eq.。 322191 36 201111407Chemicals 27 322191 201111407 IRGANOX 1010 ' IRGANOX 1035 ' IRGANOX 1076 ' IRGANOX 1135, IRGANOX 245 ' IRGANOX 259, IRGANOX 295 ' IRGANOX 3114 ' IRGAN0X 1098 ' IRGAN0X 1520L ; ADK STAB AO-20, ADK STAB AO -30, ADK STAB AO-40, ADK STAB AO-50, ADK STAB AO-60, ADK STAB AO-70, ADK STAB AO-80, ADK STAB AO-90, ADK STAB AO-330; manufactured by Sumitomo Chemical Industries Sumilizer GA-80, Sumilizer MDP-S, Sumilizer BBM-S, Sumilizer GM, Sumilizer GS (F), Sumi1izer GP, etc. In other aspects, commercially available additives may also be used as the anti-staining agent for the resin. For example, THINUVIN 328 'THINUVIN 234 ' THINUVIN 326 ' THINUVIN 120, THINUVIN 477, THINUVIN 479, CHIMASS0RB 2020FDL, CHIMASSORB 119FL, etc., manufactured by Ciba Specialty Chemicals, Inc., may be mentioned. The 5% to 5.0% by weight of the curable resin composition is not particularly limited as long as it is at least one of the above-mentioned phosphorus-based compound, the amine compound, and the ruthenium-based compound. The scope. The curable resin composition of the present invention can be obtained by uniformly mixing the components. The curable resin composition of the present invention can be easily obtained by the same method as the conventional method. For example, the following methods can be used: an epoxy resin and a hardener, and optionally a hardening accelerator, a scaly compound, a binder resin, an inorganic filler, and a compounding agent, and an extruder, a kneader, a roll machine, and a planet are required. The mixer or the like is sufficiently mixed until uniform to obtain a curable resin composition. If the curable resin composition is liquid 28 322191 201111407, the curable resin composition is impregnated into the substrate or cast by a potting method or a casting method. It is then hardened by heating in the mold; if it is solid, it is melted and then cast, or formed by a transfer molding machine or the like, and then hardened by heating. The hardening temperature and time are from 8 200 to 200 t, from 2 to 10 hours. The hardening method can be directly cured at a high temperature, but it is preferred to gradually heat the hardening reaction. Specifically, initial hardening is carried out between 80 and 15 CTC, and post-hardening is carried out between 100 and 200 °C. The hardening stage is preferably carried out in 2 to 8 stages, more preferably 2 to 4 stages. Further, the curable resin composition of the present invention may be dissolved in toluene, diphenylbenzene, acetone, mercaptoethyl ketone, decyl isobutyl ketone, decyl decylamine, dimercaptoacetamide. , 曱 吡 吡 。. A solvent such as a ketone is used as a curable resin composition varnish, and then impregnated with a substrate such as glass fiber, carbon fiber, polyester fiber, polyamide fiber, alumina fiber, paper, etc., and dried by heating, and then the prepaid The cured product of the curable resin composition of the present invention is obtained by hot press molding of the dip. The solvent at this time is usually used in an amount of from 1 to 70% by weight, preferably from 15 to 70% by weight, based on the mixture of the curable resin composition of the present invention and the solvent. Further, the liquid composition can be directly obtained by RTM (Resin Transfer Molding) to obtain a cured epoxy resin containing carbon fibers. Further, the curable resin composition of the present invention can also be used as a film-type encapsulating composition. When the film-type resin composition is obtained, the curable resin composition (the above-mentioned varnish) of the present invention can be applied to a release film, and then the solvent is removed by heating to carry out B_s^age formation to obtain a sheet-like adhesive. . The sheet-like adhesive can be used as an interlayer insulating layer in a multilayer substrate or the like, and an integral layer of an optical semiconductor. Next, it will be described in detail with respect to the ^, π π of the oxy-resin assembly (4) photo-semiconductor used in the Z _ encapsulation material (IV) of the present invention. Although the epoxy tree of the present invention is t ^ 曰, and the product is used as a high-intensity white LED or the like, and the selenium is also used, when the adhesive crystal is used, the yttrium of the present invention can be used (hardened) Agent composition) and epoxy resin, as well as other hardening accelerators, sputum, θ^^ σ, antioxidants, light stabilizers and other additives filled with 吣 吣 amp 来 裱 裱 裱 裱 裱 θ θ And, as a packaging material, or as both a bonding material and a packaging material. The mixed tlj , . α method is mixed using a kneader, a three-axis roll 'universal mixer, a planetary mixer 几 a few prosperous machines, a homodisper, a bead mill, etc.' at normal temperature or under heating. Optical semiconductor components such as white LEDs, such as GaAs GaP, GaAlAs, GaAsP 'AlGa, InP, and GaN, are laminated on substrates such as sapphire, spinel, SiC, Si, and ZnO. A semiconductor wafer such as InN or AIN InGaN is adhered to a lead frame, a heat release plate, or a package by an adhesive (adhesive material). In order to flow the current, there is also a turn of a wire such as a gold wire. In order to protect the semiconductor W from heat and moisture, and to function as a lens function, a package such as an epoxy resin is packaged. The epoxy resin composition of the present invention can be used as the encapsulant or the adhesive. In the step, the curable resin composition of the present invention is preferably used as both a binder and a package. The method of bonding a semiconductor wafer to a substrate using the curable resin of the present invention can be carried out by using a dispensing method, a potting method, or a job printing method, and then collecting the money (four) W and performing 322191 30 201111407 Heat hardening to bond semiconductor wafers. For heating, hot air circulation, external line, high frequency, etc. can be used. w ^ The heating condition is preferably, for example, 80 to 23 (Tc is carried out for about 丨 minute to hour. The purpose of reducing the internal stress generated during heat hardening may be, for example, 80 to 120 ° C, pre-hardening for 30 minutes to 5 hours, Further, the post-hardening is carried out at 120 to 18 CTC for 30 minutes to 10 hours. The molding method of the package material may be the following: the injection method is to insert the template into the package after the substrate having the semiconductor wafer as described above is inserted. And heat-hardening and forming; compression molding method, pre-injecting the package material onto the mold, and immersing the semiconductor wafer previously fixed on the substrate in the towel's heat-hardening and then separating from the mold. Dispensing method, transfer molding method, injection molding method, etc. Heating can be performed by a hot air circulation type, infrared ray, high frequency, etc. The twisting condition is preferably, for example, 8 G to 23 (rc is performed from ! minutes to 24 hours.) The purpose of reducing the internal stress generated during heat hardening, for example, can be 8 〇 to 1. Grab, pre-harden for 30 minutes to 5 hours, and then 12 〇 to 8 〇 C ' 30 Post-hardening under conditions of 10 minutes to 10 hours. Other uses of the curable resin composition = tree-hardening ribs - (4) way, except H, such as adhesive 'paint' coating (4), forming materials (including sheets , film, :,,, silk material (including printed substrate, wire coating, etc.), encapsulant may also be used as a package material, an acid ester tree wax composition for a substrate, or a photohardening method as an acrylic acid vine tree Other additives such as wax, etc. 322191 31 201111407 The following agents can be used as an adhesive for electronic materials, such as civil, construction, automotive, general-purpose, and medical adhesives. In the case of the adhesive for an electronic material, an interlayer adhesive for a multilayer substrate such as a buiidup substrate, a semiconductor adhesive such as a binder or a primer, a BGA reinforcing primer, and an anisotropic conductive film (ACF) may be used. An adhesive for assembly such as an anisotropic conductive paste (ACP), etc. Examples of the encapsulating material include a filling method for a capacitor, a transistor, a diode, a light-emitting diode, a 1C, an LSI, etc., a dipping method, and a transfer. Forming method ; package for infusion method of 1C, LSI type COB, C0F, TAB, etc.; for flip chip and other primers, QFP, BGA, CSP and other IC assembly packages (reinforcing primer) The cured product obtained by the present invention can be used for various purposes such as optical component materials, etc. Optical materials generally refer to materials used in applications in which visible light, infrared rays, ultraviolet rays, X-rays, lasers, and the like are transmitted through the material. In addition to the sealing material for LEDs such as a lamp type or an SMD type, the following may be mentioned: a substrate material in the field of liquid crystal display, a light guide plate, a prism sheet, a deflector plate, a phase difference plate, and a viewing angle correction. A material for a liquid crystal display device such as a film for a liquid crystal such as a film, an adhesive or a polarizing element protective film. In addition, the package material, the anti-reflection film, the optical correction film, the outer single material, the protective film of the front glass, the glass of the glass, and the LED used for the next generation are shown as the next generation. Mold material 'lED seal' negative without front glass replacement material, adhesive = film, substrate material in the device, light guide plate, edge display double moon, deflection plate, phase difference plate, 322191 32 201111407 viewing angle correction film, then Protective film for polarizing element; or protective film for front glass in organic EL (electroluminescence) display, front glass substitute material, adhesive; or various film substrates in field emission display (FED), protective film for front glass, front Glass substitute materials and adhesives. In the field of optical recording, VD (Vide Disc, VD/CD-ROM, CD-R/RW, DVD-R/DVD-RAM, MO/MD, PD) (phase change optical disc), optical disc substrate material for optical card, reading lens, protective film, encapsulant, adhesive, etc. ~ In the field of optical equipment, the lens material for the camera, the viewfinder 稜鏡, the target rib Mirror, viewfinder housing, section a light-receiving sensor; or a camera lens, a viewfinder; or a projection lens of a projection television, a protective film, a sealing material, an adhesive, etc.; or a translucent material of a photoreceptor n, a packaging material, an adhesive, a film, etc. In the field of optical parts, the fiber material around the optical switch in the optical information system, the lens, the waveguide, the component, the encapsulant of the package, etc.; or the optical fiber material around the optical connector, the coil B package, and the adhesive In the passive parts or optical circuit parts, the substrate, the fiber material, and the α-lens, the waveguide, the LED package, the CCD package, the adhesive, or the optoelectronic integrated circuit (0EIC) may be used. In the field of optical fiber, decorated with display, Zhaori i ^ Buddha-β # ., 'month, light guide, etc.; detectors for industrial use, display, show no class,念 念 汛 汛 汛 汛 汛 o o o o o o o o o o o o o o o o o o o o o o o o o o o o o o o o o o o o o o o o o o o o o o o In cars, conveyors In the field, the steam and electricity micro-projection reflector lamp, the bearing compliant ring, the gear part, and the silver lacquer 322191 33 201111407 engine: parts, electrical components, various inner and outer parts, drive engines, teaching car oil, ★ ^ Plate, inner n '' brake rust-proof steel plate, internal panel inner material, protective bundling line, burning sputum substitute; or multi-layer broken glass substitute for railway vehicles, engine peripheral parts, insurance ^Fly _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ The light of the generations of the second generation of agriculture, can be listed in the right 妩 W - from the generation of the first motor can be organic materials, can be Ε 举 举 organic Ε "parts of peripheral materials, organic light refracting elements of optical amplification components, optical computing亓 Du Jiu first conversion, c ^ yuan connected 70 pieces, organic solar cell peripheral material, fiber materials, components of packaging materials, adhesives and so on. The earthen packaging material can be used for capacitors, transistors, diodes, ί, '1C, LSI type C0B, c〇F, ΤΑβ, etc. CSP I ϊρ h # ja* 襄 (10) Strong primer, etc. For other uses of the CS" IC package, the sealant material may be used in the form of a curable resin composition, in addition to scales such as an adhesive, a coating, a coating agent, and a molding material (including In addition to the sealing of the sheet, the film, the FRP, etc., the insulating material (2 brush substrate, wire coating, etc.), it can also be used as a supplement for other resins, etc. The adhesive can be used for civil, construction, and pneumatic vehicles. In addition to the general-purpose and medical adhesives, it can also be used as an adhesive for electric enamels. Among them, the adhesive for electronic materials can be used as a primer for the laminated substrate layer. Crystal and base semiconductor 322191 34 201111407 An adhesive for assembly such as an adhesive, a BGA reinforcing primer, an anisotropic conductive film (ACF) or an anisotropic conductive paste (ACP), etc. The present invention will be more specifically described, and the following "parts" means "parts by weight" unless otherwise specified. Furthermore, the invention is not limited to the embodiments. In the examples, the epoxy equivalent was measured in accordance with JIS K-7236; the viscosity was measured at 25 ° C using an E-type viscosity agent. The analysis conditions in gas chromatography (hereinafter referred to as GC) were performed using HP5-MS (0.25 mm ID x 15 m, film thickness: 0.25 #m), and the column oven temperature was set to an initial temperature of 100 ° C per minute. The temperature was raised at a rate of 15 ° C and maintained at 300 ° C for 25 minutes. Helium is used as a carrier gas. In addition, the gel permeation chromatography (hereinafter referred to as GPC) is determined as follows: the column is a Shodex SYSTEM-21 column (KF-803L, KF-802. 5 (x2 tube), KF-802); Tetrahydrofuran was used; the flow rate was 1 ml/min; the column temperature was 40 ° C; and it was detected by UV (254 nm); the standard curve was made of standard polystyrene made of Shodex. The percentages, ratios, parts and the like in the present specification are expressed by weight unless otherwise specified. Synthesis Example 1 Synthesis of di-saturated hydrocarbon compound 172 parts of 1,4-cyclohexanedicarboxylic acid and 3-hexane were added while being purged with nitrogen in a flask equipped with a stirrer, a reflux condenser, a stirring device, and a Dean-Stark tube. 448 parts of ene-1-nonanol, 600 parts of hydrazine, 4 parts of p-toluenesulfonic acid, and adjust the degree of vacuum in the system by reflux at 45 ° C to remove water generated by 35 322191 201111407 and perform 12 Hours of reaction. After the completion of the reaction, the reaction solution was washed three times with 120 parts of a 1% by weight aqueous sodium hydroxide solution, and then washed with water 70 times/time until the waste liquid became neutral, and then heated and decompressed by a rotary evaporator. Diluted and unreacted cyclohexane methanol was distilled off, whereby 343 parts of a diene compound which was liquid at normal temperature was obtained. The synthesis of the epoxy resin was carried out in a flask equipped with a stirrer, a reflux condenser, and a stirring device, while adding 15 parts of water, 12-tungsten-disc yttrium, 0.70 parts of wall acid gas, and 2 tallow base. Dimethylacetic acid@@27 parts (LION AKZ0 '50% by weight hexane solution, ARQUAD 2HT acetic acid vinegar), after the formation of the taurine-based catalyst, 180 parts of toluene and the above-mentioned di-hydrocarbon compound are added. 118 parts 'then re-mixed to make it a milky solution. The solution was warmed to 50 ° C', and 70 parts of a 35 wt% aqueous hydrogen peroxide solution was added over 1 hour while vigorously stirring, and then dropped for another 13 hours at 503⁄4. The progress of the reaction was confirmed by GC, and it was found that the peak of the raw material had disappeared. Subsequently, after neutralizing with a 1% by weight aqueous sodium hydroxide solution, 25 parts of a 20% by weight aqueous sodium thiosulfate solution was added and stirred for 30 minutes, followed by standing. The organic layer separated into two layers was taken out, and 10 parts of Wak〇_gel C-300, activated carbon (manufactured by N0RIT, CAP SUPER), 20 parts, bentonite (made by H0JUN 'Bengel SH) 20 were added. The mixture was stirred at room temperature for 1 hour and then subjected to hydrazine. The obtained filtrate and the liquid were washed three times with 10 parts of water, and the benzene was distilled off from the obtained organic layer, thereby obtaining an epoxy resin (EP) of the following formula (1) which was liquid at normal temperature. -1) 119 parts. The epoxy resin obtained had an epoxy equivalent of 217 g/eq. 322191 36 201111407

(l) Rt (式中所有的Ri皆為氫原子)。 實施例1 針對合成例1所製得之環氧樹脂(EP-1),使用甲基六 氫鄰笨二曱酸酐(新日本理化(股)製,RIKACID MH700,以 下稱H1。酸酐當量ι68)作為硬化劑、氫氧化十六基三甲銨 (東不化成工業(股)製,25重量%曱醇溶液,以下稱d)作 為硬化促進劑,並利用下述表1所示之配合比(重量份)進 ^丁配合’再脫泡2q分鐘,而獲得本發明之硬化性樹脂組成 =°其中’硬化劑的使用量係對於環氧樹脂之環氧基!當 里而言以1當量計算。 比較例1 針對3’4_%氧環己基甲基—3’,4,_環氧環己基緩酸酯 〜2 ;環氧當量133) ’使用H1作為硬化劑、C1作為硬化 促進劑,並依下述表1所示之配合比(重量份)進行配合, 再脫泡20分鐘,而獲得本發明之比㈣之硬化性樹脂組成 $。其中,硬化劑的使用量係對於環氧樹脂之環氧基i當 量而言以1當量計算。 田 CLED封裝體之硬化後凹陷性試驗) 將實施例及比較例所製得之硬化性樹脂組成物填充於 322191 37 201111407 注射器’並使用精密吐出裝置將其纽於5_方形表面組 裝型LED封裝體(内徑4 4mm、外壁g 125咖)。將該洗注 物投入加熱爐中,先以120t !小時,再以15〇t 3小時 進仃硬化處理而製成LED封裝體使麟度計以外 壁高作為基準來測定硬化後樹脂的凹陷深度。實施例(與 比較例1的結果示於表1。 測定條件 深度計:NIKON 製,DIGIMICRO STAND MS-11C,凹陷 深度係採用3個封裝體之平均值。 表1 項目 實施例1 比較例1 EP-1 100 組成 EP-2 — 100 硬化劑(H1) 77.4 126 硬化觸媒(C1 ;) 0.4 0.4 硬化後凹陷量 140 /z m 392 β m 由上述結果可知’使用合成例1所製得之環氧樹脂之 硬化性樹脂組成物,與比㈣u目較,硬化後的凹陷可改 善65%。此外亦可知比較例i中用以與LED晶片導通之導 線有部分浮起。 實施例2至5 針對合成例1所製得之環氧樹脂(EP_n,使用耵及環 己烷-1’2, 4—三羧酸-i,2_酐(三菱瓦斯化學股份有限公: 322191 38 201111407 製’ Η-ΤΜΑη(半固體貼、 ,*分 隨狀),以下稱Η2,酸酐當量64)作為硬 化劑,並依下述表2 ^ 9η , _ 斤不之配合比(重量份)進行配合,再 脫泡20分鐘’而獲搵(l) Rt (all Ri in the formula are hydrogen atoms). Example 1 For the epoxy resin (EP-1) obtained in Synthesis Example 1, methylhexahydro-dodecanoic anhydride (manufactured by Nippon Chemical and Chemical Co., Ltd., RIKACID MH700, hereinafter referred to as H1. Anhydride equivalent ι 68) was used. As a curing agent, hexadecyltrimethylammonium hydroxide (manufactured by Toka Chemical Industries, Ltd., 25% by weight of a decyl alcohol solution, hereinafter referred to as d) is used as a curing accelerator, and the mixing ratio shown in Table 1 below is used. The amount of the hardening resin of the present invention is obtained by the combination of 'but' defoaming for 2 minutes, and the amount of the hardener used is the epoxy group for the epoxy resin! It is calculated as 1 equivalent. Comparative Example 1 For 3'4_% oxocyclohexylmethyl-3',4,-epoxycyclohexyl valerate ~2; epoxy equivalent 133) 'Use H1 as a hardener, C1 as a hardening accelerator, and The blending ratio (parts by weight) shown in the following Table 1 was blended, and defoaming was carried out for 20 minutes to obtain a curable resin composition of the ratio (IV) of the present invention. Here, the amount of the hardener used is calculated as 1 equivalent for the epoxy group i of the epoxy resin. The post-hardening depression test of the field CLED package) The curable resin composition obtained in the examples and the comparative examples was filled in a 322191 37 201111407 syringe' and was mounted on a 5_square surface mount type LED package using a precision discharge device. Body (inner diameter 4 4mm, outer wall g 125 coffee). The ink was placed in a heating furnace, and then an LED package was formed by applying a heat treatment at 120 Torr for 15 hours and then for 3 hours. The height of the outer wall of the linometer was used as a reference to measure the depth of the resin after curing. . EXAMPLES (The results of Comparative Example 1 are shown in Table 1. Measurement Condition Depth Gauge: NIKON, DIGIMICRO STAND MS-11C, Depth Depth is an average of three packages. Table 1 Project Example 1 Comparative Example 1 EP -1 100 Composition EP-2 - 100 Hardener (H1) 77.4 126 Hardening catalyst (C1;) 0.4 0.4 Depression amount after hardening 140 /zm 392 β m From the above results, it is known that 'the epoxy obtained by the synthesis example 1 is used. The curable resin composition of the resin can be improved by 65% compared with the (4) u mesh, and the wire for conducting the LED chip in Comparative Example i can be partially floated. Examples 2 to 5 Epoxy resin prepared in Example 1 (EP_n, using hydrazine and cyclohexane-1'2,4-tricarboxylic acid-i, 2-anhydride (Mitsubishi Gas Chemical Co., Ltd.: 322191 38 201111407) 'Η-ΤΜΑη (semi-solid paste, * divided as follows), hereinafter referred to as Η2, anhydride equivalent 64) as a hardener, and according to the following table 2 ^ 9η, _ kg of the mix ratio (parts by weight), and then defoaming 20 Minutes

Ei 7L ^ 侍本發明之硬化性樹脂組成物。其中, 硬化劑的使用量係對於 木田&外 於1 衣軋樹脂之環氧基1當量而言以1 當1计异。 _ 、、;因H2為半固體狀,故預先與硬化劑H1以表2所 不之配合比率混合’並加溫至1GG〇C成為均勻的混合物再 ❹硬_ H2時以相同方絲進行調整再使 用)。 比較例2 針對3, 4~環氧環己基甲基-3,,4,-環氧環己基羧酸酯 (Ep 2) ’使用H1及H2作為硬化劑,並依下述表2所示之 配合比(重量份)進行配合,再脫泡2〇分鐘,而獲得本發明 之比較用之硬化性樹脂組成物。其中,硬化劑的使用量係 對於環氧樹脂之環氧基1當量而言以1當量計算。 (LED封裝體之硬化後凹陷性試驗) 將實施例及比較例所製得之硬化性樹脂組成物填充於 >主射器’並使用精密吐出裝置將其澆注於5mm方形表面組 装型LED封裝體(内徑4. 4mm、外壁高1. 25mm)。將該澆注 物投入加熱爐中,先以120〇C1小時,再以l5(rc3小時進 行硬化處理而製成LED封裝體。凹陷係使用深度計以外壁 局作為基準來測定硬化後樹脂的凹陷深度。實施例2至5 與比較例2的結果示於表2。 測定條件 39 322191 201111407 深度計:NIKON 製,DIGIMICRO STAND MS-11C,凹陷 深度係採用3個封裝體之平均值。 表2 項目 實施例2 實施例3 實施例4 實施例5 比較例2 EP-1 100 100 100 100 ----- EP-2 — — — 一 100 組成 硬化劑(H1) 60. 1 36. 7 21. 90 6. 80 98. 1 硬化劑(H2) 6. 7 15.8 21. 9 27. 2 10. 9 H2/CH1+H2) 0. 1 0. 3 0. 5 0· 8 1 —>剛 一 0.1 硬化後凹陷量 143 ^ m 12以m 8 ^ m 3 /Z m 405 β m 由上述結果可知,同時使用合成例1所製得之環氧樹 脂與硬化劑H1、硬化劑H2之實施例2,與比較例2相較, 對於硬化後的凹陷而言,顯示出顯著的效果,此外亦可知 H2/ (Η1+H2)的比率為〇. 3以上之實施例3、實施例4、實施 例5中幾無硬化後的凹陷。 比較例3 針對3, 4-環氧環己基曱基-3’,4’ -環氧環己基羧酸酯 (ΕΡ-2),使用Η1及Η2作為硬化劑,並依下述表3所示之 配合比(重量份)進行配合,再脫泡20分鐘,而獲得本發明 之比較用之硬化性樹脂組成物。其中,硬化劑的使用量係 對於環氧樹脂之環氧基1當量而言以1當量計算。 (LED照明試驗) 將實施例4及比較例2所製得之硬化性樹脂組成物填 322191 40 201111407 充於注射器,並使用精密吐出裝置將其澆注於搭載有中心 發光波長465nm之晶片之5mm方形表面組裝型LED封裝體 (内徑4. 4mm、外壁高1. 25mm)。將該澆注物投入加熱爐中, 先以120°C1小時,再以15CTC3小時進行硬化處理而製成 LED封裝體。利用下述條件測定led照明2 〇 〇小時後之照 度保持率。實施例4、比較例3的結果示於表3。 測定條件 LED晶片:中心發光波長465nm LED照明條件:順電流6〇mA ’串聯的方式同時開啟3 個照明 LED照明環境:於85°C 85%濕熱機内進行照明 照度保持率:(照明200小時後之照度/初期照度)χι〇〇 (單位%) 表3 項目 實施例4 比較例3 EP-1 100 — EP-2 --* 100 組成 硬化劑(H1) 21. 9〇 35. 6 硬化劑(H2) 21- 9 ________ 〜35.6 H2/CH1+H2) Γ 0.5 0.5 經過200小時後的照度保持率% 83 _*---1 73 由上述結果可知,使用合成例1所製得之環氧樹脂之 硬化性樹脂組成物,與比較例3相比’其LED照明試驗支 41 32219] 201111407 的照度保持率明顯較優里。 得之環氧樹脂之硬化性樹㈣知’使用合㈣1所製 使用代表以往之脂環式環氣:物作為LED封裝材,係較 -3,,4,_if Λ ^脂之3,4-環氧環己基甲基 ’蜋氧環己基竣酸酯之s 久性。 Μ知級成物具有更優異的耐 合成例2 依照專利文獻3記載之太、土… 拖士夕, 取之方法製得矽氧改質環氧樹脂。 曱氣石々々〇c 干裝入2~(3,4-環氧環己基)乙基三 甲氧夕燒26_ 6份(燒氧基告旦0 7〇 A 孔丞田里82. l)、二曱基二曱氧矽烷 =以氧基當量_、三乙胺㈣份、甲基異丁嗣 炒11’於室溫㈣下’歷經30分鐘滴加蒸德水⑽份, ^溫至齡再進行反應6小時。反應結束後,利用· = 水溶液進行中和,再反覆水洗3次。接著於減 將有機相☆ loot:去除溶劑,藉此獲得具有反應性官 =!^夕氧改f環氧樹脂(ep-3)6g份。製得之化合物的環 礼备量為561g/eq.,外觀為無色透明。 比較例4 用十對合成例2所製得之矽氧改質環氧樹脂(Ep_3),使 八H1及H2作為硬化劑,並依下述表4所示之配合比(重量 ϋ進行配合,#脫泡2G分鐘,而獲得本發明之硬化性樹 日、·且成物H硬化綱使用量係對於環氧樹脂 土1當量而言以1當量計算。 衣軋 (腐麵氣體穿透性試驗) 將實施例4及比較例4所製得之硬化性樹脂組成物填 322191 42 201111407 充於注射器,並使用精密吐出裝置將其洗注於搭載有中心 發光波長465nm之晶片之5腿1方形表面組裝型LED封敦體 (内徑4· 4mm、外壁高1. 25mm)。將該澆涑物技入加熱壚中, 先以12〇。(: 1小時,再以l5〇°c 3小時進行硬化處理而製 成LED封裝體。利用下述條件將LED封裝體放置於腐麵性 氣體中,並觀察封裝内部鍍銀之引線框架部顏色的變化。 實施例4、比較例3的結果示於表4。 測定條件 腐蝕氣體:硫化銨20%水溶液(當硫成分與銀反應 變成黑色) 接觸方法:將硫化銨水溶液的容器與上述LED封装體 並存於廣口玻璃瓶中,然後蓋上廣口玻璃瓶並於密閉狀熊 下’使揮發之硫化銨氣體與LED封裝體接觸。 心' 腐蝕的判定:觀察LED封裝體内部的引線框架變成零 色(黑化)所需的時間,其變色時間越長判斷為耐腐蝕氣^ 性越優異。 — 表4 組成 項目 實施例4 比較例4 EP-1 ----- 100 _ EP-3 —--- 100 硬化劑(H1) 21. 90 8. 5 硬化劑(H2) 21.9 8. 5 H2/CH1+H2) 0. 5 0. 5 引線框架的變色時間 經過10小時 以上無變色 1小時變色 32219] 43 201111407 由上述結果可知’使用合成例!所製得之 本發明之硬化性樹脂組成物,與比較例《I小時㈣/曰之 力 環氧樹脂之硬化性級组成物相比二引= 吏 由此可知,以本發腐细氣趙性。 裝材=夕氧樹脂具有更優異的耐腐Μ 2作為L ED封 3’4每氧環己基甲基_3,,4,_環氧環’且亦較以 W主的脂環式環氧樹脂具有更優異的耐久性酸酉旨為代表之 明,=上已詳細且參照特定的實施形態辦太疏, ^業界人士應可輕易理解在不脫離本路日月進订說 圍的前提下仍可進行各種變更或修正。*明的精神與範 本申請案係根據2009年7月7日申兮主4 案(特顒2_、16刪),並援用其内容f曰本專利申請 產業上之可利用性 、、本發明係提供一種適用於電氣電子材 5半導體用途之硬化性樹脂組成物、及物、特別是 【圖式簡單說明】 更化物。 無。 【主要元件符號說明】 無。 . 322191 44Ei 7L ^ The curable resin composition of the present invention. Here, the amount of the hardener used is 1 to 1 in terms of 1 equivalent of the epoxy group of the wood-based resin. _, ,; Because H2 is semi-solid, it is mixed with the hardener H1 in the ratio of the ratio of the two in the previous two, and heated to 1 GG 〇 C to become a homogeneous mixture and then hardened _ H2 with the same square wire reuse). Comparative Example 2 For 3,4~epoxycyclohexylmethyl-3,4,-epoxycyclohexylcarboxylate (Ep 2) 'Use H1 and H2 as hardeners, and as shown in Table 2 below. The blending ratio (parts by weight) was blended, and defoaming was further carried out for 2 minutes to obtain a curable resin composition for comparison of the present invention. Here, the amount of the hardener used is calculated as 1 equivalent for 1 equivalent of the epoxy group of the epoxy resin. (Porosion test after curing of LED package) The curable resin composition obtained in the examples and the comparative examples was filled in a >ejector' and cast into a 5 mm square surface mount type LED using a precision discharge device. The package body has an inner diameter of 4. 4 mm and an outer wall height of 1.25 mm. The castable was placed in a heating furnace, and then an LED package was formed by curing at 120 ° C for 1 hour and then at 15 ° for 3 hours. The recess was measured using the depth gauge outer wall as a reference to measure the depth of the resin after the hardening. The results of Examples 2 to 5 and Comparative Example 2 are shown in Table 2. Measurement conditions 39 322191 201111407 Depth gauge: NIKON system, DIGIMICRO STAND MS-11C, recess depth is an average of 3 packages. Table 2 Project implementation Example 2 Example 3 Example 4 Example 5 Comparative Example 2 EP-1 100 100 100 100 ----- EP-2 — — — A 100 composition hardener (H1) 60. 1 36. 7 21. 90 6 80 98. 1 Hardener (H2) 6. 7 15.8 21. 9 27. 2 10. 9 H2/CH1+H2) 0. 1 0. 3 0. 5 0· 8 1 —> Just one 0.1 after hardening The amount of 143 ^ m 12 is m 8 ^ m 3 /Z m 405 β m. From the above results, it is understood that the epoxy resin and the hardener H1 and the hardener H2 obtained in Synthesis Example 1 were simultaneously used, and Comparative Example 2 2, compared with the hardened recess, showing a remarkable effect, and it is also known that the ratio of H2 / (Η1 + H2) is 〇. 3 or more. Example 4, almost no recess after hardening of Example 5. Comparative Example 3 For 3,4-epoxycyclohexyldecyl-3',4'-epoxycyclohexylcarboxylate (ΕΡ-2), Η1 and Η2 were used as hardeners, and as shown in Table 3 below. The blending ratio (parts by weight) was blended, and defoaming was carried out for 20 minutes to obtain a curable resin composition for comparison of the present invention. Here, the amount of the hardener used is calculated as 1 equivalent for 1 equivalent of the epoxy group of the epoxy resin. (LED illumination test) The curable resin composition obtained in Example 4 and Comparative Example 2 was filled in a syringe with 322191 40 201111407, and poured into a 5 mm square equipped with a wafer having a central emission wavelength of 465 nm using a precision discharge device. The surface mount type LED package body has an inner diameter of 4. 4 mm and an outer wall height of 1.25 mm. The castable was placed in a heating furnace, and then hardened at 120 ° C for 1 hour and then at 15 ° C for 3 hours to prepare an LED package. The illuminance retention rate of the LED illumination after 2 hours was measured by the following conditions. The results of Example 4 and Comparative Example 3 are shown in Table 3. Measurement condition LED chip: Center emission wavelength 465nm LED illumination condition: forward current 6〇mA 'series mode simultaneously open 3 illumination LED lighting environment: illumination illumination retention rate in 85°C 85% damp heat machine: (after 200 hours of illumination) Illumination/initial illuminance) χι〇〇 (unit%) Table 3 Project Example 4 Comparative Example 3 EP-1 100 — EP-2 --* 100 Composition Hardener (H1) 21. 9〇35. 6 Hardener ( H2) 21- 9 ________ ~35.6 H2/CH1+H2) Γ 0.5 0.5 illuminance retention after 200 hours lapse of 83 _*---1 73 From the above results, it was found that the epoxy resin obtained in Synthesis Example 1 was used. The curable resin composition was significantly better than the comparative example 3 in its LED illumination test branch 41 32219] 201111407. The hardened tree of epoxy resin (4) knows that the use of (4) 1 is used to represent the alicyclic ring gas of the past: as an LED packaging material, it is 3,4- compared with -3,4,_if Λ Epoxycyclohexylmethyl 'oxime oxocyclohexyl decanoate s long. Μ 级 级 具有 合成 合成 合成 合成 合成 合成 合成 合成 合成 合成 合成 合成 合成 合成 合成 合成 合成 合成 合成 合成 合成 合成 合成 合成 合成 合成 合成 合成 合成 合成 合成 合成 合成 合成 。 。 。 。 Xenon stone 々々〇c dry packed with 2~(3,4-epoxycyclohexyl)ethyltrimethoxy oxysulfon 26_6 parts (burning oxygen 旦0 0〇A hole 丞田里82. l), 二曱Dioxa oxane = oxy equivalent _, triethylamine (four) parts, methyl isobutyl oxime 11' at room temperature (four) 'during 30 minutes, add steamed water (10) parts, ^ temperature to age and then react for 6 hours . After completion of the reaction, the mixture was neutralized with an aqueous solution of = = and washed three times with water. Then, the organic phase was reduced ☆ loot: the solvent was removed, whereby 6 g of a reactive epoxy resin (ep-3) was obtained. The obtained compound had a ring allowance of 561 g/eq., and the appearance was colorless and transparent. Comparative Example 4 Ten pairs of the oxime-modified epoxy resin (Ep_3) obtained in Synthesis Example 2 were used, and eight H1 and H2 were used as hardeners, and blended according to the mixing ratio (weight ϋ shown in Table 4 below). #脱泡 2G分钟, and obtain the curable tree day of the present invention, and the amount of the product H hardening class is calculated as 1 equivalent for 1 equivalent of the epoxy resin soil. The curable resin composition prepared in Example 4 and Comparative Example 4 was filled in a syringe with 322191 42 201111407, and was washed with a precision discharge device on a 5-leg 1-square surface of a wafer having a central emission wavelength of 465 nm. The assembled LED sealing body (inner diameter 4·4mm, outer wall height 1.25mm). The pouring material is put into the heating crucible, first 12〇. (: 1 hour, then l5〇°c 3 hours The LED package was formed by hardening treatment, and the LED package was placed in a corrosive gas under the following conditions, and the change in color of the silver-plated lead frame portion inside the package was observed. The results of Example 4 and Comparative Example 3 are shown in Table 4. Determination of Conditional Corrosive Gas: Ammonium Sulfide 20% Aqueous Solution (When Sulfur Component and Silver Counter It should be turned into black.) Contact method: The container of the aqueous solution of ammonium sulfide and the above-mentioned LED package are coexisted in a wide-mouth glass bottle, and then covered with a wide-mouth glass bottle and under the sealed bear to make the vulcanized ammonium sulfide gas and the LED package Contact: Heart's determination of corrosion: Observing the time required for the lead frame inside the LED package to become zero color (blackening), the longer the discoloration time is, the more excellent the corrosion resistance is. - Table 4 Composition of the project example 4 Comparative Example 4 EP-1 ----- 100 _ EP-3 —--- 100 Hardener (H1) 21. 90 8. 5 Hardener (H2) 21.9 8. 5 H2/CH1+H2) 0. 5 0. 5 The discoloration time of the lead frame is 10 hours or more without discoloration for 1 hour. 32219] 43 201111407 From the above results, it is understood that the curable resin composition of the present invention obtained by using the synthesis example is compared with the comparative example "I hour". (4) / 曰 曰 force epoxy resin sclerosing grade composition compared to the second cited = 吏 from this, it can be known that the hair is made of fine gas. The material = oxime resin has more excellent corrosion resistance 2 as L ED Seal 3'4 per oxycyclohexylmethyl _3,, 4, _ epoxy ring' and also compared with W The ring epoxy resin has better durability and the acidity is the representative of the product. = It has been detailed and referenced to the specific implementation form. ^The industry should be able to easily understand that it does not leave the road. Various changes or amendments can still be made under the premise of the encirclement. * The spirit and model application of Ming is based on the application of the main 4 case on July 7, 2009 (special 2_, 16 deletion), and the content of this patent is used. The present invention provides a curable resin composition and a material suitable for use in an electric and electronic material 5 semiconductor application, and in particular, a simple description of a simplified structure. no. [Main component symbol description] None. . 322191 44

Claims (1)

201111407 七、申請專利範圍: 1· 一種硬化性樹脂組成物,係含有下述式(丨)所示之環氧 樹脂、及可與該環氧樹脂進行硬化反應之硬化劑與硬化 促進劑之任一者或兩者;201111407 VII. Patent application scope: 1. A curable resin composition containing an epoxy resin represented by the following formula (丨) and a hardener and a hardening accelerator which can be hardened with the epoxy resin. One or both; ._ ,^ 第1項所述之硬化性樹脂組成物,其 中=⑴中所有的R1皆為氫原子。 .如申明.專利範圍笛, 中,可盥淨&w第1項所述之硬化性樹脂組成物,其 所示德合m行硬化反應之硬化劑係下述式⑵ 者;/、下述式(3>所示之化合物之任一者或兩._ , ^ The curable resin composition according to Item 1, wherein all of R1 in (1) are hydrogen atoms. The sclerosing resin composition according to claim 1, wherein the curing agent of the curing reaction is the following formula (2); Any one or two of the compounds shown in the formula (3) (2) 322191 45 201111407 ο(2) 322191 45 201111407 ο (式中,R2表示氫原子或曱基)。 4·如申$專利圍帛3項所述之硬化性樹脂組成物,其 更化Μ ϋ包含式(2)之化合物與式⑶之化合物兩 者’其比率位於下述範圍: W2/(W2+W3)=〇.2 至 〇.9 (其中,W2表示式(2)之化合物的重量份;w3表示 式(3)之化合物的重量份 5. —種硬化物’係由申請專利範圍第1至4項中任一項所 述之硬化性樹脂組成物硬化而得者。 6. —種光半導體裝置,係含有光半導體、及封裝了該光半 導體之申請專利範圍第5項所述之硬化物。 46 322191 201111407 四、指定代表圖:本案無圖式。 (―)本案指定代表圖為:第( )圖。 (二)本代表圖之元件符號簡單說明: 五、本案若有化學式時,請揭示最能顯示發明特徵的化學式:(wherein R2 represents a hydrogen atom or a fluorenyl group). 4. The curable resin composition according to claim 3, wherein the ratio of the compound comprising the compound of the formula (2) to the compound of the formula (3) is in a range of the following: W2/(W2 +W3)=〇.2 to 〇.9 (wherein W2 represents a part by weight of the compound of the formula (2); w3 represents a part by weight of the compound of the formula (3): 5. The type of hardened material is determined by the scope of the patent application The curable resin composition according to any one of items 1 to 4 is cured. 6. The optical semiconductor device comprising the optical semiconductor and the fifth aspect of the patent application scope of the optical semiconductor packaged Hardened. 46 322191 201111407 IV. Designation of representative figure: There is no drawing in this case. (―) The representative drawing of this case is: ( ). (2) The symbol of the symbol of this representative is simple: 5. If there is a chemical formula in this case , please reveal the chemical formula that best shows the characteristics of the invention: 3 3221913 322191
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CN103304959A (en) * 2012-03-13 2013-09-18 东莞市宝涵轻工科技有限公司 Non-yellowing white epoxy resin electronic potting adhesive and preparation method
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JP5954416B2 (en) * 2012-07-20 2016-07-20 日立化成株式会社 Silver sulfide prevention material, silver sulfide prevention film forming method, light emitting device manufacturing method, and light emitting device
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CN104559060A (en) * 2014-12-31 2015-04-29 东莞市赛恩思实业有限公司 Halogen-free flame-retardant epoxy resin composition for LED encapsulation and preparation method for halogen-free flame-retardant epoxy resin composition
CN105199079B (en) * 2015-10-30 2019-01-29 江苏华海诚科新材料有限公司 A kind of reflective composition epoxy resin of LED support high strength white
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