TW201038549A - Diolefin compound, epoxy resin and composition thereof - Google Patents

Diolefin compound, epoxy resin and composition thereof Download PDF

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TW201038549A
TW201038549A TW099108128A TW99108128A TW201038549A TW 201038549 A TW201038549 A TW 201038549A TW 099108128 A TW099108128 A TW 099108128A TW 99108128 A TW99108128 A TW 99108128A TW 201038549 A TW201038549 A TW 201038549A
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acid
compound
epoxy resin
resin composition
reaction
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TW099108128A
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TWI460171B (en
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Masataka Nakanishi
Kenichi Kuboki
Naofusa Miyagawa
Yoshihiro Kawada
Chie Sasaki
Shizuka Aoki
Zuikan Suzuki
Masato Yarita
Hiroo Koyanagi
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Nippon Kayaku Kk
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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D319/00Heterocyclic compounds containing six-membered rings having two oxygen atoms as the only ring hetero atoms
    • C07D319/041,3-Dioxanes; Hydrogenated 1,3-dioxanes
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D407/00Heterocyclic compounds containing two or more hetero rings, at least one ring having oxygen atoms as the only ring hetero atoms, not provided for by group C07D405/00
    • C07D407/14Heterocyclic compounds containing two or more hetero rings, at least one ring having oxygen atoms as the only ring hetero atoms, not provided for by group C07D405/00 containing three or more hetero rings
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/02Polycondensates containing more than one epoxy group per molecule
    • C08G59/027Polycondensates containing more than one epoxy group per molecule obtained by epoxidation of unsaturated precursor, e.g. polymer or monomer
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/20Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
    • C08G59/22Di-epoxy compounds
    • C08G59/26Di-epoxy compounds heterocyclic
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00Compositions of epoxy resins; Compositions of derivatives of epoxy resins

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Epoxy Resins (AREA)
  • Plural Heterocyclic Compounds (AREA)

Abstract

Provided is a novel alicyclic epoxy resin which provides a cured material having excellent heat resistance, optical properties, and toughness. The epoxy resin comprises a diolefin compound represented by formula (1) as a starting material and is obtained by the epoxidation of the compound. In formula (1), a plurality of R's each independently represent a hydrogen atom or an alkyl group having 1 to 6 carbon atoms; and P represents an alkylene group having 1 to 6 carbon atoms or a direct bond.

Description

201038549 六、發明說明: 【發明所屬之技術領域】 …本發明係關於一種適合於電氣電子材料用途的新穎之 二烯化合物及環氧樹脂。 【先前技術】201038549 VI. Description of the Invention: [Technical Field to Which the Invention Is Applicable] The present invention relates to a novel diene compound and epoxy resin suitable for use in electrical and electronic materials. [Prior Art]

、環氧樹脂藉由使用各種硬化劑進行硬化,通常形成為 '栈性桌耐水性、耐化學品性、耐熱性、電性質等優異 之硬化物’而用於接著劑、塗料、積層板、成形材料、涛 鍀材料、光阻㈣廣泛之領域。近年來,尤其是於半導體 相關材料之領域中,盛產如附有相機之行動電話、超薄型 之液晶或電漿TV ( television,電視)、輕量筆記型個人電 腦等輕、肖、短、小成為關鍵字之電子機器,由此對於以 :氧樹脂為代表之封裝材料亦要求非常高之特性。尤其是 則端封裝之結構變得複雜,若非液狀密封則難以密封者增 加。例如 Enhanced BGA ( Enhanced BaU ㈤人啊,增^ 球柵陣列)等形成為方凹區朝下(⑽办d_)型結才:者 需要進行局部密封,轉注成型無法應對。由於如此之原因, 業界要求開發一種高功能之液狀環氧樹脂。 另外,作為複合材料、車之車體或船舶之結構材料, 近年來RTM ( resin transfer㈣⑻叫)因其製造法簡便而得 J業界之使用。於此種組成物中,就易於含浸於碳纖維等 中而s,期待開發出低黏度之環氧樹脂。 一另外,於光電子學相關領域中,尤其是伴隨近年來之 门度資Λ化,為了順利地傳輸及處理龐大之資訊,開發出 201038549 種充刀利用光訊號之技術來代替先前之利用電氣配線之 訊號傳輸。其中,於光學波導、藍光LED、以及光半導體 等光予零件之領域中,期望開發一種透明性優異之樹脂材 料。針對該等要求,脂環式環氧化合物受到關注。 、脂環式環氧化合物與縮水甘油醚型環氧化合物相比, 於電氣絕緣性及透明性方面優異,因而用作 材料等。但是,尤其是於⑽用途等要求高度之熱、光特 性之領域中’需要一種耐熱性或耐光性進一步提昇之脂環 式環氧化合物(參照專利文獻1〜3 )。 先前技術文獻 專利文獻 專利文獻1 :日本專利特開2〇〇6_52187號公報 專利文獻2 :日本專利特開2〇〇7_51〇772號公報 專利文獻3:日本專利特開2〇〇7_16〇73號公報 【發明内容】 [發明所欲解決之問題] 光學特性 本發明之目的在於提供一種形成耐熱性、 強韌性優異之硬化物的新穎之脂環式環氧樹脂 [解決問題之技術手段] 本發明者等人鑒於如 九’結果完成本發明。即 (1) 一種二稀化合杨 所表示: 上所述之實際情況進行努力研 ’本發明係關於: ’其特徵在於··係以下述式 201038549 ⑴ 极数仔在-------"π哪儿吧竹牡,表示氫原 〇 子或碳數為1〜6之烷基;另外,ρ表示碳數為丨〜6之 基或直接鍵結)。 % (2 ) —種環氧樹脂,其特徵在於:係上述(1 ) 一 烯化合物經氧化而獲得。 — (3)如上述⑺之環氧樹脂,係使用過 酸而環氧化。 地Α過 (4 )種環氧樹脂組成物,其特徵在於:含有如上述 (2)及(3)中任—項之環氧樹脂與硬化劑及/或硬化觸媒。 〇Epoxy resin is hardened by using various hardeners, and is usually used as a hardener for 'water resistance, chemical resistance, heat resistance, electrical properties, etc.' for use in adhesives, coatings, laminates, Forming materials, sapphire materials, photoresist (4) a wide range of fields. In recent years, especially in the field of semiconductor-related materials, such as mobile phones with cameras, ultra-thin LCD or plasma TV (TV), lightweight notebook PCs, etc. Small electronic devices that become keywords, and therefore require very high characteristics for packaging materials represented by oxygen resins. In particular, the structure of the end package becomes complicated, and if it is not a liquid seal, it is difficult to increase the seal. For example, Enhanced BGA (Enhanced BaU (5) people, increase the ball grid array), etc., is formed as a concave area ((10) d_) type knot: those who need partial sealing, transfer molding can not cope. For this reason, the industry has demanded the development of a highly functional liquid epoxy resin. In addition, RTM (Resin Transfer (4) (8)) has been used in the J industry in recent years as a composite material, a car body or a ship structural material. In such a composition, it is easy to be impregnated with carbon fibers or the like, and it is expected to develop a low-viscosity epoxy resin. In addition, in the field of optoelectronics, especially with the recent capitalization, in order to smoothly transmit and process huge information, 201038549 kinds of filling tools using optical signals have been developed to replace the previous use of electric wiring. Signal transmission. Among them, in the field of optical components such as optical waveguides, blue LEDs, and optical semiconductors, it is desired to develop a resin material excellent in transparency. For these requirements, alicyclic epoxy compounds have received attention. The alicyclic epoxy compound is superior in electrical insulating properties and transparency to a glycidyl ether type epoxy compound, and thus is used as a material. However, in the field of high heat and light characteristics such as (10) use, an alicyclic epoxy compound which is further improved in heat resistance and light resistance is required (see Patent Documents 1 to 3). CITATION LIST Patent Literature Patent Literature 1: Japanese Patent Laid-Open Publication No. Hei. No. Hei. No. Hei. No. Hei. SUMMARY OF THE INVENTION [Problems to be Solved by the Invention] Optical Characteristics An object of the present invention is to provide a novel alicyclic epoxy resin which forms a cured product excellent in heat resistance and toughness. [Technical means for solving the problem] The present invention The present invention has completed the present invention in view of the results of the nine. That is, (1) a two-dilute combination of Yang said: The actual situation described above is studied. The present invention relates to: 'It is characterized by the following formula 201038549 (1) " π Where is the bamboo sap, indicating hydrogen progeny or an alkyl group having a carbon number of 1 to 6; in addition, ρ represents a carbon number of 丨~6 or a direct bond). % (2) An epoxy resin obtained by oxidizing the above (1) monoene compound. — (3) The epoxy resin according to (7) above, which is epoxidized using a peracid. (4) An epoxy resin composition comprising the epoxy resin and the curing agent and/or the curing catalyst according to any one of the above items (2) and (3). 〇

(5)—種硬化物,其特徵在於:係上述(4 樹脂組成物經硬化而成。 衣 [發明之效果] 显之Ltl之環氧樹脂可形成機械特性(特別是勒性)優 月λ且成物b含有本發^環氧㈣的本㈣之硬化性樹 月曰.、且成物可有效地用於 接二== 【實施方式】 201038549 本發明係關於一種特徵為以下述式(丨):(5) A hardened material characterized by the above (4 resin composition is hardened. [Effect of the invention] The epoxy resin of Ltl can form mechanical properties (especially, the property) And the product b contains the hardening tree of the present invention (4), and the product can be effectively used for the second== [Embodiment] 201038549 The present invention relates to a feature of the following formula (丨):

表示氫原 6之伸烷 (式中’複數存在之R係分別獨立地存在, 子或碳數為1〜6之烷基。另外,P表示碳數為卜 基或直接鍵結) 來表示之二烯化合物 環氧化所獲得之環氧樹脂 以及藉由氧化將該 一烯化合物 以上述式(i )所表示之二烯化合物可藉由 衍生物與含環狀縮醛之二醇的反應而獲得。作為 衣已輝Γ 酸衍生物,可列舉以下述式(2 )An alkylene represented by hydrogenogen 6 (wherein R is present independently in the plural, and the alkyl group has an alkyl group having 1 to 6 carbon atoms. In addition, P represents a carbon number as a base or a direct bond) An epoxy resin obtained by epoxidation of a diene compound and a diene compound represented by the above formula (i) by oxidation can be obtained by a reaction of a derivative with a diol containing a cyclic acetal . As the hexanoic acid derivative, the following formula (2) can be cited

(式中,複數存在之R係分別獨立地存在,表示氫原 子或碳數4卜6之烷基。另外,X表示羥基、碳數為卜 10之燒氧基或鹵素原子) 201038549(In the formula, R in the plural is present independently, and represents a hydrogen atom or an alkyl group having a carbon number of 4 and 6. Further, X represents a hydroxyl group, and the carbon number is an alkoxy group or a halogen atom of the group 10) 201038549

所表示之化合物,具體而言可列舉:環己烯甲酸、環 己烯甲酸甲酯、環己烯曱酸乙酯、環己烯甲酸丙酯、環己 烯甲酸丁酯、環己烯甲酸己酯、環己烯甲酸(環己烯基〒基) 醋、環己烯甲酸辛酯、環己烯甲醯氯、環己烯甲醯演、甲 基環己烯甲酸、甲基環己烯甲酸甲酯、甲基環己蝉甲酸乙 酯、甲基環己烯甲酸丙酯、甲基環己烯曱酸(甲基環己烯基 甲基)s旨、甲基環己烯甲醯氣等,但並不限定於該等。該等 可單獨使用,亦可併用兩種以上。 另外,上述含環狀縮路之二酵例如可藉由三經子基烧 烴衍生物與含羥基之碳醛類的反應而獲得。作為該三羥甲 基烷烴衍生物,可列舉:三羥甲基丙烷、三羥甲基甲烷、 :羥甲基乙烷、三羥甲基丁烷等,但只要為將烷烴之3個 氫原子取代成羥甲基之化合物,則並不限定於該等。該等 可單獨使用’亦可併用兩種以上。進而,所謂含羥基之碳 醛類,只要為其分子結構中具有羥基與甲醯基之化合物 並無特別限定。其中’較佳為羥基與曱醯基以外之基為 肪族烧基鏈。作為具體之化合物,可列舉:經基乙^、 基丙醛、羥基新戊醛等’但並不限定於該等。:等可單 使用,亦可併用兩種以上。此種化合物例如可藉由搭類 醇醛反應等而容易地製造。例如若為羥基新戊醛,則可 由異丁酸與甲酸之賴反應而獲# (日本專利特 2007-70339 號公報)。 、 之碳醛類之反應方 例如已知有如下之 作為三羥曱基烷烴衍生物與含經基 法,應用通常之環狀縮醛化反應即可, 201038549 方法:於反應介質中一面使用甲苯、二甲苯等溶劑進行共 沸脫水一面進行反應之方法(美國專利第2945〇〇8號公 報),於濃鹽酸中溶解多元醇後一面緩慢地添加醛類一面 進行反應之方法(日本專利特開昭48_9659〇號公報),使 用水作為反應介質之方法(美國專利第3〇9264〇號公報), 使用有機溶劑作為反應介質之方法(日本專利特開平 7-215979號公報),使用固體酸觸媒之方法(日本專利特 開2007-230992號公報)等。Specific examples of the compound represented include cyclohexenecarboxylic acid, methyl cyclohexenecarboxylate, ethyl cyclohexene decanoate, propyl cyclohexenecarboxylate, butyl cyclohexenecarboxylate, and cyclohexenecarboxylic acid. Ester, cyclohexenecarboxylic acid (cyclohexenyl fluorenyl) vinegar, octyl cyclohexene carboxylic acid, cyclohexene methyl hydrazine chloride, cyclohexene methyl hydrazine, methyl cyclohexenecarboxylic acid, methyl cyclohexenecarboxylic acid Methyl ester, ethyl methylcyclohexylcarboxylate, propyl methylcyclohexenecarboxylate, methylcyclohexene decanoic acid (methylcyclohexenylmethyl) s, methylcyclohexene methyl hydrazine, etc. , but not limited to these. These may be used singly or in combination of two or more. Further, the above-mentioned ring-containing dilute fermentation can be obtained, for example, by a reaction of a triterpene-based hydrocarbon derivative with a hydroxyl group-containing carbon aldehyde. Examples of the trimethylol alkane derivative include trimethylolpropane, trimethylolethane, hydroxymethylethane, trimethylolbutane, and the like, but only three hydrogen atoms of the alkane are used. The compound substituted with a methylol group is not limited to these. These may be used alone or in combination of two or more. Further, the hydroxyl group-containing aldehyde is not particularly limited as long as it has a hydroxyl group and a fluorenyl group in its molecular structure. Wherein the group other than the hydroxyl group and the mercapto group is preferably a aliphatic alkyl group. Specific examples of the compound include, but are not limited to, methyl group, propionaldehyde, hydroxypivalaldehyde, and the like. : It can be used alone or in combination of two or more. Such a compound can be easily produced, for example, by an aldol reaction or the like. For example, if it is hydroxypivalaldehyde, it can be obtained by reacting isobutyric acid with formic acid (Japanese Patent Publication No. 2007-70339). For example, a reaction of a carbon aldehyde is known as a trihydroxydecyl alkane derivative and a conventional cyclic acetalization reaction using a base method, 201038549. Method: Toluene is used on one side of the reaction medium. A method in which a solvent such as xylene is subjected to azeotropic dehydration and a reaction is carried out (U.S. Patent No. 2,945,8), and a method in which a aldehyde is slowly added after dissolving a polyhydric alcohol in concentrated hydrochloric acid (Japanese Patent Laid-Open) Japanese Patent Laid-Open No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei 7-215979 The method of the medium (Japanese Patent Laid-Open Publication No. 2007-230992) and the like.

作為環己烯羧酸衍生物與含環狀縮醛之二醇之反應, 可採用通常之酯化方法。具體而言,可採用通常之酯化方 法’可列舉:使用酸觸媒之費雪爾酯化(❿仏以 esterification),鹼性條件下之酸鹵化物、醇之反應,利用 各種縮合劑之縮合反應等(ADVANCEd 〇RGANIC CHEMISTRY PartB:Reaction and Synthsis pl35、145 - 147、 151等)。另外,作為具體之事例,可利用醇與羧酸類之酯 化反應(Tetrahedron v〇l. 36 ρ· 2409 (1980), TetrahedronAs the reaction of the cyclohexenecarboxylic acid derivative with the cyclic acetal-containing diol, a usual esterification method can be employed. Specifically, a general esterification method can be employed, which can be exemplified by Fisher's esterification using an acid catalyst (esterification), acid halide and alcohol reaction under alkaline conditions, and various condensing agents. Condensation reaction, etc. (ADVANCEd 〇 RGANIC CHEMISTRY Part B: Reaction and Synthsis pl 35, 145-147, 151, etc.). Further, as a specific example, an esterification reaction of an alcohol with a carboxylic acid can be utilized (Tetrahedron v〇l. 36 ρ· 2409 (1980), Tetrahedron

Letter· 4475 (1980)),進而亦可利用羧酸酯之酯交換反應 (曰本專利特開2006-052187 )。 作為以上述方式合成之上述式(丨)之二烯化合物的較 佳之結構’較佳為上述式(1 )中r為氫原子、曱基 '乙基、 丁基中之任一者’尤其是於取代基R鍵結於烯烴之情形時, 為了提昇其反應性,鍵結於烯烴之R較佳為氫原子、曱基 中之任一者,特佳為氫原子。 由於直接鍵結於環狀縮醛之取代基R會使環狀縮醛之 201038549 結構變形,因此取代基R較佳為甲基、乙基、丙基等。另 外’就自市場上獲得原料之容易性而言,較佳為取代基r 為乙基者。其中,由於本結構可藉由相當之駿與甲藤 其合成等價物)之反應而容易地合成,因此可視需要而合 成(美國專利第3097245號公報)。 。 鍵結基Ρ為碳數為卜6之伸烷基,較佳為碳數 之伸烧基。伸烧基可為直鏈狀、分枝狀或環狀中之任一者 ο =、 结構係對最終之硬化物之特性產生作用的主要原 二玄,佳為碳數為2〜4。該鍵結基ρ亦可直接鍵結, 於亦存在導致結構不穩定情 二數為〜6之伸烧基1伸炫基鏈過大(碳數超過6之卜 則存在其硬化物無法保持充分之耐熱性之盧。3 可藉由將上述式(1)所+ ° 而製成太路日日 所不的本發明之烯煙化合物氧化 二 I:::::::::,,心 化之一利用空氣(氧=:::::水-氣 於該等。 <万决等,但不限 作為利用過酸之環氧化之方法,且 本專利特開2006_521 〇體而吕,可列舉日 法 187旎公報中所記載之β 使用之過酸,例如 $之方法荨。作為可 J〜举.甲酸、乙酸、 '、苯曱酸、間氯苯甲酸、鄰苯二 :、順丁稀二 酸酐。該等之中, 等有機酸及該等之 * 就與過氧化氫反應而生出女^ 率、反應溫度、操作之簡便性、經濟性等^有機過酸之效 為使用甲酸、乙酸、 等觀點而言,較佳 鄰本二甲酸針’尤其是就反應操作之 201038549 簡便性之觀點而言,更佳為使用罗醆或乙酉 利用過氧化氫水之環氧化之方 =。 體而言,可採用如以下公報中所列舉^各種方法,具 開昭59-108793號公報、日本 法:曰本專利特 報、日本專利特開平5-213919號^昭62_23伽號公 ^49579號公*、日本專利特公平ι、日本專利特開平 專利特開2001_17864號公報、曰 :唬公報、曰本 公報等。 和特公平3-57102號 乂下例示用於獲得本發明之環氣谢 百先’使本發明之二烯化合物去 有機物與過氧化氫水之聚馼類及四級銨鹽於 〇幻軋化虱水之兩層中進行反應。 本發明中所使用之聚酸類只要為具有聚 物,則並無特別限制,較 α 為含有鎢之f㈣… 之聚酸類,更佳 頁鎢之聚酸類,特佳為鎢酸鹽類。 :為聚酸類所包含之具體之聚酸及聚酸鹽 、自鎢酸、1 2-鎢磷酸、j 2啟 + 等之嫣系之酸,選自_^ 碟酸及12_鹤石夕酸 等之鹽等。、自鋼酸及磷紹酸等之鉬系之酸,以及該 作為該等鹽之抗衡陽離子,可列舉 屬離子、驗金屬離子等。 卞鹼土金 鈉體而。可列舉鈣離子、鎂離子等鹼土金屬離子, 鈉、鉀、铯等鹼金屬離子笙 于 抗衡陽離子為鈉離子、早S疋於該等。特佳之 鉀離子、舞離子、銨離子。 聚酸之使用ϊ係相對於本發明之二稀化合物1莫耳, 10 201038549 以金屬兀素換算(若為鎢酸,則以鎢原子之莫 為銦酸,則以I目原子之莫耳數計)計為1〇〜2〇 若 佳為2.0〜2。毫莫耳,更佳為25〜1〇毫莫耳,耳,較 作為四級銨鹽,可較佳地使用總碳數為10以上乾佳 :25〜之四級銨鹽’特佳為其烧基鏈全部為脂二鏈Letter 4475 (1980)), in turn, can also utilize a transesterification reaction of a carboxylic acid ester (Japanese Patent Laid-Open No. 2006-052187). A preferred structure of the diene compound of the above formula (丨) synthesized in the above manner is preferably that in the above formula (1), r is a hydrogen atom, a fluorenyl group, an ethyl group or a butyl group, especially In the case where the substituent R is bonded to the olefin, in order to enhance the reactivity, R bonded to the olefin is preferably any of a hydrogen atom and a fluorenyl group, and particularly preferably a hydrogen atom. Since the substituent R directly bonded to the cyclic acetal deforms the structure of the cyclic acetal 201038549, the substituent R is preferably a methyl group, an ethyl group, a propyl group or the like. Further, in terms of easiness of obtaining raw materials on the market, it is preferred that the substituent r is ethyl. Among them, since the structure can be easily synthesized by the reaction of the equivalent of the thiophenone and the cytosine, it can be synthesized as needed (U.S. Patent No. 3,097,245). . The bond group Ρ is an alkylene group having a carbon number of 6, preferably a carbon number. The stretching base may be any of a linear chain, a branching shape or a ring shape. ο =, the main element of the structure system which acts on the properties of the final hardened material, preferably having a carbon number of 2 to 4. The bonding group ρ can also be directly bonded, and there is also a structure in which the structural instability is 2 to 6 and the stretching base 1 is too large (the carbon number exceeds 6), and the cured product cannot be maintained sufficiently. Heat resistance. 3 The olefinic compound of the present invention which is made by the above formula (1) can be oxidized by I:::::::::, One uses air (oxygen =::::: water-gas in the above. < 10,000, etc., but is not limited to the method of epoxidation using peracid, and this patent is open 2006_521 〇体吕, can be For example, the peracid used in β described in the Japanese Patent Publication No. 187旎, for example, can be used as a method. For example, formic acid, acetic acid, ', benzoic acid, m-chlorobenzoic acid, ortho-benzene: Sodium diacid anhydride. Among these, organic acids and the like* react with hydrogen peroxide to produce a female compound, reaction temperature, ease of operation, economy, etc. From the viewpoint of acetic acid, etc., the preferred ortho-dicarboxylic acid needle is more preferably used in view of the simplicity of the reaction operation 201038549. Or 酉 酉 酉 酉 酉 酉 酉 酉 酉 过 过 过 过 过 过 过 过 过 过 59 59 59 59 59 59 59 59 59 59 59 59 59 59 59 59 59 59 59 59 59 59 59 59 59 59 59 59 59 59 59 59 Kaiping 5-213919 No. #昭62_23 伽号公^49579号*, Japanese Patent Special Fair ι, Japanese Patent Unexamined Patent Special Open 2001_17864, 曰:唬 曰, 曰本公告, etc. 和特公平3-57102 No. 例 例 用于 用于 用于 用于 用于 谢 谢 谢 谢 谢 谢 谢 谢 谢 谢 谢 谢 谢 谢 谢 谢 谢 谢 谢 谢 谢 谢 谢 谢 谢 谢 谢 谢 谢 谢 谢 谢 谢 谢 谢 谢 谢 谢 谢 谢 谢 谢 谢 谢The polyacid used in the present invention is not particularly limited as long as it has a polymer, and is more preferably a polyacid containing f (tetra) of tungsten, more preferably a polyacid of tungsten, and particularly preferably a tungstate. The acid of the specific polyacid and polyacid salt contained in the polyacid, tungstic acid, 1 2-tungstophosphoric acid, j 2 Kai +, etc., selected from the group consisting of _^ dish acid and 12_heshixi acid Salt, etc., molybdenum-based acid from steel acid and phosphorus acid, and the like Examples of the counter cation include a genus ion, a metal ion, etc. Alkaline earth metal ions such as calcium ions and magnesium ions, and alkali metal ions such as sodium, potassium, and cesium are stagnation of a counter ion as a sodium ion. The early use of potassium ions, dance ions, ammonium ions. The use of polyacids relative to the dilute compound of the present invention 1 Mo, 10 201038549 converted to metal ruthenium (if tungstic acid, then Taking the tungsten atom as the indium acid, the number of moles of the I mesh atom is 1〇~2〇 if it is 2.0~2. Milligram, more preferably 25~1〇 millim, ear As a quaternary ammonium salt, it is preferred to use a total carbon number of 10 or more. Dry: 25 to a quaternary ammonium salt.

具體而言,可列舉:三癸基甲基銨鹽、二月桂基二甲 基銨鹽、三辛基甲基銨鹽、三烷基甲& (烷基為辛基:化 合物與烷基為癸基之化合物的混合型)銨鹽、三(十六烷基) 曱基銨鹽、三曱基十八烷基銨鹽、四戊基銨鹽、鯨蠟基三 甲基錢鹽' f基三丁基銨鹽、二録蠛基二甲基錢鹽、三錄 蠟基T基銨鹽 二(氫化牛脂烷基)二甲基銨鹽等,但並不限 定於該等。特佳為碳數為25〜1〇〇者。 另外,該等鹽之陰離子源並無特別限定,具體而言, 可列舉:齒化物離子、硝酸根離子、硫酸根離子、硫酸氫 根離子、乙酸根離子、碳酸根離子等,但並不限定於該等。 务四級銨鹽之碳數超過1 〇〇,則存在疏水性變得過強, 四級録鹽於有機層中之溶解性變差之情形。若碳數未達 10,則親水性變強,同樣地四級銨鹽與有機層之相溶性變 差,故不佳。 四級銨鹽之使用量較佳為所使用之鎢酸類之價數之 〇.〇1〜0.8倍當量或1.1〜10倍當量。更佳為〇〇5〜〇·7倍當 里或1.2〜6.0倍當量,進而更佳為〇 〇5〜〇 5倍當量或13 〜4.5倍當量。 201038549 例如若為鶴酸,則為]4 n & 酸1苴且 貝鴻H2W〇4且為二價,因此相對於鎢 酸1莫耳,四級銨之叛酸鹽較佳為0 02〜16莫耳鶴 20莫耳之範圍。另外,若為鶴構酸,則為三價,因此^ :四級銨之羧酸鹽較佳為0.03〜2.4莫耳或3·3〜3 : 右為妙鶴酸’則為四價,因此四級錢之叛酸鹽較佳為 〜3.2莫耳或4.4〜40莫耳。 作為緩衝液,可使用任意者,於本反應中較佳為使用 碟酸鹽水溶液。作為其pH值,較佳為調整至4〜之間之 PH值,更佳之pH值為5〜9。於pH值未達4之情形時, 環氧基容易進行水解反應、聚合反應。另外,於pH值超過 1 〇之情形時,會產生反應變得極慢、反應時間過長之問題。 尤其是於本發明中,當溶解作為觸媒之鎢酸類時,較 佳為將pH值調整為5〜9之間。 緩衝液之使用方法可列舉如下之方法:例如於使用作 為較佳之緩衝液之麟酸-磷酸鹽水溶液時,相對於過氧化 虱’使用0.1〜10莫耳當i之礙酸(或鱗酸二氫鈉等攝酸 鹽),並利用鹼性化合物(例如氫氧化鈉、氫氧化鉀、碳 酸納、概酸風納、奴酸钟專)調整pΗ值。此處,較佳為於 添加過氧化氫時,以使pH值達到上述ρΗ值之方式添加。 另外,亦可使用磷酸二氫鈉或磷酸氫二鈉等進行調整。較 佳之磷酸鹽之濃度為〇_ 1〜60重量%,更佳為5〜45重量%。 另外,於本反應中亦可不使用緩衝液,且不調整pH值 而直接添加磷酸氫二鈉、磷酸二氫鈉 '磷酸鈉或三聚磷酸 鈉等(或其水合物)磷酸鹽。就步驟之簡略化之意義而言, 12 201038549 特佳為無PH值調整之煩項而直接添加。此時之磷酸鹽之使 用量相對於過氧化氫通常為(M〜5莫耳%當量’較佳為〇2 〜4莫耳%當量,更佳為〇3〜3莫耳%當量。此時,若相對 ^過氧化氫,磷酸鹽之使用量超過5莫耳%當量,則必需調 整^值’於未達^莫耳%#量之情形時,會產生所生成 之%乳樹脂容易進行水解反應或者反應變慢等弊端。 本反應使用過氧化氫進行環氧化。作為本反應中所使 〇用二過氧化氫,就其使用之簡便性而言,較佳為過氧化氫 /辰度為10〜40重量%之濃度之水溶液。於濃度超過4〇重量 ^之情形時,除使用變得困難以外,所生成之環氧樹脂亦容 易進行分解反應,故不佳。 本反應使用有機溶劑。作為所使用之有機溶劑之量, 相對於作為反應基質之二稀化合物i,以重量比計為^〜 ^^佳^^’更佳為㈠〜仏於以重量比計有機溶 W之里超過1G之情形時,反應之進行變得極度緩慢,故不 〇佳。作為可使用之有機溶劑之具體例,可列舉:己院、環 己炫、庚炫等燒煙類,甲苯、二〒苯等芳香族煙化合物, 甲醇、乙醇、異丙醇、丁醇、己醇、環己醇等醇類。另外, 視情形亦可使用甲基乙基綱1基異丁基嗣、環戍酮、環 己酮等酮類,二乙醚、急 00 飞夫喃、一 σ亏烧等峻類,乙酸乙 酉旨、乙酸丁醋、甲酸子醋等醋化合物,乙猜等猜化合物等。 作為具體之反應操作方法,例如於利用批次式反應爸 進行反應時,添加二歸化合物、過氧化氫(水溶液)、雜 聚酸類(觸媒)、緩衝液、四級銨鹽及有機溶劑,並以兩 13 201038549 層進行攪拌《攪拌速度並無特別指定。由於添加過氧化氫 牯發熱之情形較多,因此亦可採用於添加各成分之後緩慢 地添加過氧化氫之方法。 反應溫度並無特別限定,較佳為〇〜9〇t,更佳為〇〜 75 C,特佳為15°C〜6〇〇C。於反應溫度過高之情形時,易 於進行水解反應,若反應溫度較低,則反應速度變得極端 緩慢。 另外,反應時間亦由反應溫度、觸媒量等所決定但 j工業生產之觀點而言,由於長時間之反應會消耗大量能 量’故不佳。較佳之範圍為卜判小時,較佳為SI小 時’更佳為4〜24小時。 應結束後,對過剩之過氧化氫進行淬冷處理。淬冷 較佳為使用鹼性化合物來進行。另外,併用還原劑與 驗性化合物亦較佳。作為較佳之處理方法,可列舉:利用 :性化合物將PH值中和調整至6〜1〇後,使用還原 ===氫進料冷之方法。於pH值未達6之情形時, 能性還、過剩之過聽氫時之發熱較大而產生分解物之可 作為還原劑,可而丨與. 亞硫酸鈉、硫代硫酸鈉、肼 早3夂、維生素C等。作盔,吾 分之過氧化氫之莫耳/ 料,相對於過· 。·。…Γ,通常為0·01〜20倍莫耳,更佳; U耳’進而更佳為GG5〜3倍莫耳。 作為驗性化合物,Specific examples thereof include: trimethylmethylammonium salt, dilauryldimethylammonium salt, trioctylmethylammonium salt, trialkylmethyl& (alkyl group is an octyl group: a compound and an alkyl group are Mixed type of sulfhydryl compound) ammonium salt, tris(hexadecyl) decyl ammonium salt, tridecyl octadecyl ammonium salt, tetraamyl ammonium salt, cetyl trimethyl ketone salt The tributylammonium salt, the dimercapto dimethyl ketone salt, the lanthanide-based benzylamine di(hydrogenated tallow alkyl) dimethylammonium salt, and the like are not limited thereto. It is especially good for those with a carbon number of 25~1. Further, the anion source of the salt is not particularly limited, and specific examples thereof include a tooth ion, a nitrate ion, a sulfate ion, a hydrogen sulfate ion, an acetate ion, and a carbonate ion, but are not limited thereto. In these. When the carbon number of the quaternary ammonium salt exceeds 1 Torr, the hydrophobicity becomes too strong, and the solubility of the quaternary salt in the organic layer deteriorates. When the carbon number is less than 10, the hydrophilicity becomes strong, and similarly, the compatibility of the quaternary ammonium salt with the organic layer is deteriorated, which is not preferable. The amount of the quaternary ammonium salt used is preferably 价. 〇1 to 0.8 times equivalent or 1.1 to 10 times equivalent of the valence of the tungstic acid used. More preferably, it is 〇〇5~〇·7 times when it is or 1.2~6.0 times equivalent, and more preferably 〇5~〇 5 times equivalent or 13~4.5 times equivalent. 201038549 For example, if it is streptoic acid, it is 4 n & acid 1 苴 and Beihong H2W 〇 4 and is divalent, so the quaternary ammonium tartrate is preferably 0 02~ relative to tungstic acid 1 mol. 16 Mo Erhe 20 Mo Er range. In addition, if it is a taurine, it is trivalent, so ^: the carboxylic acid salt of the quaternary ammonium is preferably 0.03 to 2.4 mol or 3·3 to 3: the right is the tetravalent, so the tetravalent is The fourth-grade money tickrate is preferably ~3.2 moles or 4.4 to 40 moles. Any buffer may be used, and in the present reaction, an aqueous solution of a discate is preferably used. As the pH, it is preferably adjusted to a pH of between 4 and 5, more preferably a pH of 5 to 9. When the pH is less than 4, the epoxy group is easily subjected to a hydrolysis reaction or a polymerization reaction. In addition, when the pH exceeds 1 Torr, the reaction becomes extremely slow and the reaction time is too long. Particularly in the present invention, when the tungstic acid as a catalyst is dissolved, it is preferred to adjust the pH to between 5 and 9. The method of using the buffer may be exemplified by, for example, when using an aqueous solution of a linonic acid-phosphate as a preferred buffer, using 0.1 to 10 moles of acid (or squaric acid) relative to ruthenium peroxide. Sodium hydrogenate is used as the acid salt), and the pΗ value is adjusted by using a basic compound (for example, sodium hydroxide, potassium hydroxide, sodium carbonate, acid arsenic, and niacin clock). Here, it is preferred to add so as to bring the pH to the above-described pH value when hydrogen peroxide is added. Further, it can also be adjusted using sodium dihydrogen phosphate or disodium hydrogen phosphate. The concentration of the preferred phosphate is 〇 1 to 60% by weight, more preferably 5 to 45% by weight. Further, in the present reaction, a buffer solution may not be used, and a phosphate such as disodium hydrogen phosphate, sodium dihydrogen phosphate 'sodium phosphate or sodium tripolyphosphate (or a hydrate thereof) may be directly added without adjusting the pH. In terms of the simplification of the steps, 12 201038549 is especially added directly for the trouble of no PH adjustment. The amount of phosphate used at this time is usually (M to 5 mol% equivalent) with respect to hydrogen peroxide, preferably 〇2 to 4 mol% equivalent, more preferably 〇3 to 3 mol% equivalent. If the amount of phosphate used is more than 5 mol% equivalent, it is necessary to adjust the value of 'in the case of not reaching the amount of Mo%%#, the resulting % of the latex is easily hydrolyzed. The reaction is slow or the reaction is slow. The reaction is epoxidized using hydrogen peroxide. As the dihydrogen peroxide used in the present reaction, the ease of use is preferably hydrogen peroxide/initiality. An aqueous solution having a concentration of 10 to 40% by weight. In the case where the concentration exceeds 4 Å, it is difficult to use it, and the resulting epoxy resin is easily decomposed, which is not preferable. The reaction uses an organic solvent. The amount of the organic solvent to be used is preferably in the weight ratio of the dilute compound i as the reaction substrate, more preferably (1) to 仏 in the ratio by weight of the organic solvent W. In the case of 1G, the progress of the reaction becomes extremely slow, so it is not Specific examples of the organic solvent that can be used include: burned tobaccos such as hexagram, cyclohexine, and heptane, aromatic smoke compounds such as toluene and diphenylbenzene, methanol, ethanol, isopropanol, and butanol. An alcohol such as hexanol or cyclohexanol. Alternatively, a ketone such as methyl ethyl 1 isopropyl ketone, cyclohexanone or cyclohexanone may be used, and diethyl ether, an acute 00 fufu, and a ketone may be used. σ, such as stagnation, acetal acetate, acetic acid, vinegar, vinegar, etc., etc. It is a compound, hydrogen peroxide (aqueous solution), heteropolymer (catalyst), buffer, quaternary ammonium salt and organic solvent, and is stirred with two layers of 13 201038549. The stirring speed is not specified. Due to the addition of hydrogen peroxide Although there are many cases of heat generation, it is also possible to use a method of slowly adding hydrogen peroxide after adding each component. The reaction temperature is not particularly limited, and is preferably 〇~9〇t, more preferably 〇~75 C, Good for 15 ° C ~ 6 〇〇 C. When the reaction temperature is too high, the hydrolysis reaction is easy, and if the reaction temperature is low, the reaction rate becomes extremely slow. In addition, the reaction time is also determined by the reaction temperature, the amount of catalyst, etc., but from the viewpoint of industrial production. Since the long-term reaction consumes a large amount of energy, it is not preferable. The preferred range is hourly, preferably SI hour, more preferably 4 to 24 hours. After the end, the excess hydrogen peroxide is quenched. The quenching is preferably carried out using a basic compound. Further, a reducing agent and an inspective compound are preferably used in combination. As a preferred treatment method, the neutralization of the pH is adjusted to 6 to 1 by using a compound: After that, the method of reduction === hydrogen feed cold is used. When the pH value is less than 6, the energy is still excessive, and the excess heat is generated when the hydrogen is heard, and the decomposition product is generated as a reducing agent.丨 和. Sodium sulfite, sodium thiosulfate, 肼 3夂, vitamin C, etc. As a helmet, I have a hydrogen peroxide/material, relative to over. ·. ...Γ, usually 0. 01~20 times Molar, more preferably; U ear' is further preferably GG5~3 times Mo. As an organic compound,

氣化钱… 了歹】舉.虱軋化鈉、氫氧化卸、I 乳化叙風虱化鈣等金屬气备儿仏 * 金屬風氧化物,碳酸納、碳酸卸等逢 14 201038549 屬碟酸鹽,填酸鈉、鱗酸氣納等鱗酸鹽,離子交換樹脂, 氧化鋁等鹼性固體。 作為驗性化合物之使用量,若係將驗性化合物溶解於 水或有機溶劑(例如甲苯、二甲苯等芳香族烴,甲基異丁 基酮、甲基乙基酮等酮類,環己烧、庚貌、辛烧等二,、甲 醇、乙醇、異丙醇等醇類等各種溶劑),則其使用量相對 於過剩部分之過氧化氫之莫耳數通常為001〜20倍莫耳, Ο Ο 々, 借冥耳進而更佳為0.05〜3倍莫耳。該 等可製成水或上述有機溶劑之溶液而添加,亦可以單體之 形式添加。 於使用不溶於水或有機溶劑之固體驗之情形時,相對 於系統中所殘,子之過氧化氫之量,以重量比計較佳為使用工 〜1 〇〇〇倍之量之固體給。舜乂土达 更佳為10〜500倍,進而更佳為 2 300倍。於使用不溶於水或有機溶劑之固體驗之情形 、,亦可於τ述之水層與有機層之分離後進行處理。 過氧化氫之淬冷後(或進行淬冷前),此時,若 ==不I離或未使用有機溶劑,則添加上述有機溶劑 τ 水層萃取反應產物。此時所使用之有機溶劑 相對於原料二烯化合物以重 , 更里比汁為0.5〜10倍,較佳為 才見茜要反覆進行幾次該操作後分離有機層,且 視需要S該有機層進行水洗而純化。 屬氧Lt戶^獲得之有機層,視需要利用離子交換樹脂或金 特佳為妙膠或氧化紹等)、活性碳(其令,特 為化學活化活性碳)、複合金屬鹽(其中,特佳為驗性 15 201038549 複合金屬鹽)、黏土礦物(其中 V卉肀,特佳為蒙脫石等Gasification money... 歹 举 举 虱 虱 虱 虱 虱 、 、 虱 虱 虱 虱 虱 虱 虱 虱 虱 虱 虱 虱 虱 虱 虱 虱 虱 虱 虱 虱 金属 金属 金属 金属 金属 金属 金属 金属 金属 金属 金属 金属 金属 金属 金属 金属 金属 金属 金属, sodium sulphate, sodium sulphate and other sulphates, ion exchange resins, alumina and other alkaline solids. When the amount of the test compound is used, the test compound is dissolved in water or an organic solvent (for example, an aromatic hydrocarbon such as toluene or xylene, or a ketone such as methyl isobutyl ketone or methyl ethyl ketone; , Geng appearance, Xin Shao, etc., various solvents such as methanol, ethanol, isopropanol, etc.), the amount of molybdenum used in excess of hydrogen peroxide is usually 001 to 20 times moles. Ο Ο 々, lend the ear and then better 0.05 to 3 times the mole. These may be added as a solution of water or the above organic solvent, or may be added as a monomer. In the case of using a solid solution insoluble in water or an organic solvent, the amount of hydrogen peroxide in the system is preferably a solid amount of ~1 〇〇〇 times the amount by weight relative to the amount of hydrogen peroxide remaining in the system. The 舜乂土达 is preferably 10 to 500 times, and more preferably 2 to 300 times. In the case of using a solid solution insoluble in water or an organic solvent, it may be treated after separation of the aqueous layer and the organic layer described in τ. After quenching of hydrogen peroxide (or before quenching), at this time, if == is not separated or no organic solvent is used, the organic solvent τ aqueous layer is added to extract the reaction product. The organic solvent used at this time is 0.5 to 10 times more than the raw material diene compound, and more preferably, the organic layer is separated after several times of the operation, and the organic layer is separated as needed. The layer was washed with water and purified. Oxygen Lt household ^ obtained organic layer, if necessary, using ion exchange resin or Jin Tejia as a wonderful glue or oxidation, etc.), activated carbon (which makes, especially chemically activated carbon), composite metal salt (including Good for the test 15 201038549 composite metal salt), clay minerals (of which V 肀 肀, especially good for montmorillonite, etc.

土礦物)等去除其雜質, 寸層狀W 進而進订水洗及過濾等後,基 去除溶劑,從而獲得作為目 ‘、、' q知之%氧化合物。視情形亦可 進而藉由管柱層析法或蒸餾進行純化。 以上述方式所獲得之本發明之環氧樹脂係以式(3):The earth minerals and the like are removed from the impurities, and after the layered layer W is further subjected to water washing and filtration, the solvent is removed to obtain an oxygen compound as a target of ',, 'q. Purification may also be carried out by column chromatography or distillation, as the case may be. The epoxy resin of the present invention obtained in the above manner is of the formula (3):

⑶ ^式中,複數存在之R係分別獨立地存在,表示氫原 子或碳數* 1〜6之烷基。另夕卜’P表示碳數為1〜6之伸烷 基戒直接鍵結) 所表不之結構為主結構,且混合有如以式(4 ): [化5] 16 201038549 Ο(3) In the formula, the plural R-forms exist independently, and represent a hydrogen atom or an alkyl group having a carbon number of *1 to 6. Further, 'P represents a stretched alkyl group having a carbon number of 1 to 6 or a direct bond. The structure represented by the main structure is a main structure, and the mixture is represented by the formula (4): [Chemical 5] 16 201038549 Ο

(式中,(A )〜(D)之組合可為任意之組合。另外, R及P表示與式(3)中之尺及?相同之含義) 所不之各種結構的化合物。另外,根據反應條件,有 時會生成環氧基彼此聚合而成之高分子量體或其他副反應 物。 所獲得之環氧樹脂例如可用作環氧丙烯酸酯及其衍生 物、垮嗤啶酮系化合物或環狀碳酸酯化合物等各種樹脂原 料。 以下’揭示含有本發明之環氧樹脂的本發明之硬化性 樹脂組成物。 本發明之硬化性樹脂組成物含有本發明之環氧樹脂作 為必需成分。對於本發明之硬化性樹脂組成物,可應用利 用硬化劑之熱硬化(硬化性樹脂組成物A )與將酸作為硬化 觸媒之陽離子硬化(硬化性樹脂組成物B)之兩種方法。 17 201038549 於硬化性樹脂組成物A與硬化性組樹脂成物B中,可 早獨使用本發明之環氧樹脂,或與其他環氧樹脂併用而使 於併用之If形時,本發明之環氧樹脂於全部環氧樹脂 中所占之比例較佳為3〇重量%以上,特佳為重量。乂以 上。其中,㈣本發明之環氧樹脂用作硬化性樹脂組成物 之改質劑之情形時,以1〜3〇重量%之比例來添加。 作為可與本發明之環氧樹脂併用之其他環氧樹脂,可 歹酚醛'月漆型%氧樹脂、雙酚A型環氧樹脂' 聯苯型 ’曰—苯甲烷型環氧樹脂、苯酚芳烷基型環氧樹脂 :。具體而言可列舉:雙紛a、雙酴㈣代二齡、第雙紛、 喊二紛、M’-聯苯酚、2,2’_聯苯紛、 聯苯基]間苯二 羥基苯基)甲烧、一( 烧基取代苯盼,’、:二基苯基)乙院’(苯盼、 萘等)與甲盤、乙膝、苯;Γ 經基笨、二經基 甲"_乙_、::;苯 Μ,·雙(氣甲基)_",龍4本乙_、一 %戊二烯、制、 Μ铺甲基)苯 之改質物,四淳雙“等广基)苯等之縮聚物及該等 水甘油瞇化物,4自化雙酚類,由醇類衍生出之縮 、 ,脂環式環氧樹脂,縮水甘油胺系環氧樹脂, 縮水甘油S旨系環氧樹脂,倍半♦氧r系環氧# 曰 環狀、梯狀或該等… > 氧烷糸衣氧树月曰(於鏈狀、 構中具有縮水=ΓΓ種以上之混合結構之嫩結 等固形或液狀環氧二Λ或環氧環己炫結構的環氧樹脂) 氧Μ月曰’但並不限定於該等。 18 201038549 尤其是將本發明之硬化性樹脂組成物用於光學用途之 情形時’較佳為將本發明之環氧樹脂與脂環式環氧樹脂或 倍半石夕氧烧結構之環氧樹脂併用而使用。尤其是與脂環式 環氧樹脂併用之情形時,較佳為骨架中具有環氧環己貌結 構之化σ物特佳為藉由具有環己稀結構之化合物之氧化 反應所獲得的環氧樹脂。 ι作為該等環氧樹月旨,可列舉將可藉由以下之反應而製 &之化σ物氧化所得者等:環己稀缓酸與醇類之醋化反應 或環己烯甲醇與賴類之醋化反應(Μ—磁 期(1_)、Tetrahed_Leuerp 4475(測)等中所記 載之方法)、或者環己稀酸之悔森科反應(tishchenk〇 tl〇I1)(日本專利特開2003 —170059號公報、日本專利 羧=〇04-262871號公報等中所記載之方法),進而環己烯 所醋交換反應(曰本專利特開2〇〇"5㈣號 甲所s己載之方法)。 〇限定作可為::·,:要為具有醇性經基之化合物則湖 丁二醇、π 戊二醇、ΓΛ 31、1,2· 丁二醇、 醇類,丙三醇、三經甲笑乙,广己二醇、環己院二甲醇等二 丁院、2,甲基-甲基丙烧、三經甲基 等。另外,作為缓酸類,可列季戊四醇等四醇類 丁婦二酸、鄰苯二甲酸、間广草^、順丁稀二酸、反 f酸等’但並不限定於此。-甲酸、己二酸、環己烧二 進而,可列舉由環己稀輕衍生物與醇體之祕反應所 19 201038549 生成之縮醛化合物。作盎β _ 、反應方法,只要應用通常之縮醛 化反應便可製造,例如揭示右 句不有以下方法:於反應介質中一 面使用甲苯、二甲茇黧、、交 女ή 、 〒本4,合劑進行共滞脫水一面進行反應之 方法(美國專利第2945008 \ 、 ^ 08戒公報),於濃鹽酸中溶解多 元醇後一面緩慢地添加醛類— m 面進仃反應之方法(曰本專 利特開昭48-96590號公郝、 . )’使用水作為反應介質之方法 (美國專利第3092640號公報) m) 使用有機溶劑作為反應 介質之方法(日本專利輯卩』 扪特開千7_2丨5979號公報),使用固 體酸觸媒之方法(日本專利转 寺〜特開2007-230992號公報)等。 就結構之穩定性而言,較祛 权佳為%狀縮醛結構。 作為該專環氧樹脂之呈牌a丨 《”體例’可列舉:ERL_4221、 UVR-6105、ERL-4299(全邱盔侖 σ * , Ρ為商οσ名’均係由Dow Chemical 製造)’ celloxlde 2021P、Ερ〇1_ gt4〇i、EHpE 3i5〇、 ^HPE 315GCE (全部為商品名,均係由化學工業製 :〇及一 ί衣戊一稀一 j衣氧化物等’但並不限定於該等(參 考文獻:總論環氧樹脂基礎篇Ιρ76 85 )。 該等可單獨使用,亦可併用兩種以上。 ,另外,添加倍半石夕氧烷系環氧樹脂(於鏈狀、環狀、 梯狀或4等之至)兩種以上之混合結構之硬氧院結構中且 有縮水甘油基及/或環氧環己烧結構的環氧樹脂)等固形或 液狀壤氧樹脂亦有效。 以下對各硬化性樹脂組成物進行說明。 利用硬化劑之熱硬化(硬化性樹脂組成物Α) 作為本發明之硬化性樹脂組成物Α所含有之硬化劑, 20 201038549 ❹ Ο 例如可列舉·胺系化合物、酸酐系化合物、醯胺系化合物、 紛系化合物、竣酸系化合物等。作為可使用之硬化劑之具 體例τ列舉.二胺基二苯基甲烷、二乙三胺、三乙四胺、 胺基一苯基碾、異佛爾酮二胺、二氰基二醯胺、由蘇子 油酸之一聚物與乙二胺所合成之聚醯胺樹脂、鄰苯二甲酸 ^、偏苯三,酸酐、均苯四甲酸二酐、順丁烯二酸酐、四 氫鄰苯一甲酸酐、甲基四氫鄰苯二甲酸酐、甲基耐地酸酐、 耐地酸酐、六氫鄰苯二甲酸酐、甲基六氫鄰苯二甲酸酐、 ,元四甲&C酐、雙ί哀[2,2,1]庚烷_2,3_二甲酸酐、甲基雙環 [2,2,1]庚m二甲酸肝、環己三甲酸_3,4_二酐、 雙酚Α、雙酚F、雙酚s、第雙齡、莊二齡、4,4,_聯苯齡、 ::2:’苯紛、3,3,,5,四甲基_[U,-聯苯基二醇、對 本—紛、間苯二紛、萘二盼、三(4_經基苯基)甲烧、1,1,2,2-四(4-备基苯基)乙烧,㈣(苯紛、燒基取代㈣、㈣、 :基取代萘酚、二羥基笨、二羥基萘等)肖甲醛、乙醛、 苯曱醛、對羥基苯曱醛、鄰羥基苯甲醛、對羥基苯乙酮、 鄰备基笨乙酮、二環戊二埽、糠路、4,4,_雙(氣甲基)q广 聯苯、M,-雙(甲氧基甲基)],聯苯、氣甲基)苯、 K雙(曱氧基曱基)苯等之縮聚物及該等之改質物,四演雙 酚Α等齒化雙盼類,味唾,三氣蝴烧-胺錯合物,脈衍生物, 萜烯與酚類之縮合物等,但並不限定於該等。該等可單獨 使用’亦可使用兩種以上。 於本發明中,特佳為以上述酸酐或缓酸樹脂為代表之 具有酸酐結構及/或敌酸結構之化合物。 21 201038549 作為具有酸酐結構之化合物,尤佳為甲基四氳鄰苯二 甲酸酐、甲基耐地酸酐、耐地酸酐、六氫鄰苯二甲酸酐、 甲基六氫鄰苯二甲酸酐、丁烷四甲酸酐、雙環[^丨]庚烷 -2,3-二甲酸酐、甲基雙環[2,2,1]庚烷_2,3_二甲酸酐、環己烷 1’3,4-二甲酸_3,4_二酐等,特佳為曱基六氫鄰苯二甲酸酐、 裒已烷-1,3,4-三甲酸-3,4-二酐。就提高硬度、絕緣性、耐熱 陡或賦予高透明性之觀點而言,較佳為使用具有酸酐結構 之化合物作為硬化劑。 其作為具有羧酸結構之化合物(以下稱為聚羧酸),尤 多Μ 2〜4官能之聚羧酸為佳,更佳為藉由使2〜4官能之 較γ醇與酸酐加成反應而獲得之聚羧酸。就硬化劑之揮發 S ’不易產生硬化m易獲得具有強勃性之組成物 點而言,較佳為使用聚羧酸作為硬化劑。 作為2〜4官能之多元醇,只要為具有醇性羥基之 物 醇^並無特別限定,可列舉:乙二醇、丙二醇、i,3-丙二 已境:2甲丁二醇、K 丁二醇、“5·戊二酵、1,卜己二醇、,! 疋一甲醇、2,4-二乙基戊二醇、 醇、新 吁乙基-2-丁基-1,3-丙二 兩三酸醇'三環癸烧二甲醇、降冰片烯二醇等二醇類 2-羥甲—^曱基乙烷、三羥曱基丙烷、三羥曱基丁烷、 垸等四丁二醇等三醇類,季戊四醇、二-三羥甲基沃 I四醇類等。 ’ 特佳之 基戊二醇、 燒二甲醇、 2〜4官能之多元醇為環己烷二甲醇、2,4_二乙 2-乙基-2· 丁基-;ι’3_丙二醇、新戍二醇、三環癸 降冰片烯二醇等支鏈狀或環狀之醇類。 22 201038549 作為製造聚缓酸時之酸軒,較佳為甲基四氫鄰笨二甲 :::甲基财地酸軒、财地酸軒、六氣鄰苯二甲酸軒、甲 ^ ^四甲酸酐、雙環[训庚燒# :甲酸二、甲基雙環[训庚^… 工,3,4-二甲酸-3,4-二軒等。 作為加成反應之條件,並無特別指定,作為具體之一 種反應條件,有於無觸媒、無溶劑之條件下,-面於4〇〜(In the formula, the combination of (A) to (D) may be any combination. Further, R and P represent compounds of various structures which are not the same as those of the ruler and the formula (3). Further, depending on the reaction conditions, a high molecular weight body or other side reactant in which epoxy groups are polymerized with each other may be formed. The obtained epoxy resin can be used, for example, as various resin raw materials such as an epoxy acrylate and a derivative thereof, an acridone compound or a cyclic carbonate compound. Hereinafter, the curable resin composition of the present invention containing the epoxy resin of the present invention will be disclosed. The curable resin composition of the present invention contains the epoxy resin of the present invention as an essential component. The curable resin composition of the present invention can be applied by two methods of thermal curing (curable resin composition A) using a curing agent and cation curing (curable resin composition B) using an acid as a curing catalyst. 17 201038549 In the curable resin composition A and the curable group resin product B, the epoxy resin of the present invention can be used alone or in combination with other epoxy resins to form the If shape in combination. The proportion of the oxygen resin in the total epoxy resin is preferably 3% by weight or more, and particularly preferably the weight. More than one. In the case where the epoxy resin of the present invention is used as a modifier for the curable resin composition, it is added in a proportion of 1 to 3 % by weight. As another epoxy resin which can be used together with the epoxy resin of the present invention, it can be used as a phenolic phenolic lacquer type oxy-resin, bisphenol A type epoxy resin, biphenyl type 曰-phenylmethane type epoxy resin, phenol aryl Alkyl epoxy resin: Specifically, it can be exemplified by: double a, double 酴 (four) generation two years old, the first double, shouting two, M'-biphenol, 2,2'-biphenyl, biphenyl]m-phenyldihydroxyphenyl ) A burn, a (burning base substituted benzene, ',: diphenyl) E-house '(Benzene, naphthalene, etc.) and A plate, E knee, benzene; Γ 基 、, 二 经 基 基_B_,::; benzoquinone, · bis (gas methyl) _", dragon 4 Ben _, one% pentadiene, system, Μ 甲基 methyl) benzene modified substance, four 淳 double "etc. Polycondensate of benzene and the like, and such glycerin oxime, 4 self-forming bisphenols, condensed from alcohols, alicyclic epoxy resin, glycidylamine epoxy resin, glycidyl s Epoxy resin, halved ♦ oxygen r-based epoxy # 曰 ring, ladder or these... > Oxane 糸 氧 树 曰 ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( An epoxy resin such as a solid or liquid epoxy dioxime or an epoxycyclohexanyl structure, which is not limited thereto. 18 201038549 In particular, the curable resin composition of the present invention For optical applications Preferably, the epoxy resin of the present invention is used in combination with an alicyclic epoxy resin or an epoxidized epoxy resin having a sesquiter-oxygen structure. Especially in the case of using an alicyclic epoxy resin, it is preferably The ruthenium having an epoxy ring-like structure in the skeleton is particularly preferably an epoxy resin obtained by an oxidation reaction of a compound having a cyclohexene structure. As an epoxy resin, it can be cited as Oxidation of sigma oxidized by the following reaction: vinegar reaction of cyclohexyl acid and alcohol or vinegarization of cyclohexene methanol and lysine (Μ-magnetic period (1_), Tetrahed_Leuerp 4475 (measured), etc.), or cycloheximic acid reflexology reaction (tishchenk〇tl〇I1) (Japanese Patent Laid-Open No. 2003-170059, Japanese Patent carboxy = 〇 04-262871 The method described in the gazette and the like, and the vinegar exchange reaction of cyclohexene (the method of the present invention is as follows): 〇 作 作 〇 : 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 Is a compound having an alcoholic base group, such as lake butanediol, π pentanediol, hydrazine 31, 1,2· Alcohol, alcohol, glycerol, Sanjingjiaxiaoyi, Guangjidiol, Huanjiyuan Dimethanol, etc., Dibutyl, 2, Methyl-methylpropane, Tri-methyl, etc. Acids, such as tetraols such as pentaerythritol, phthalic acid, phthalic acid, chlorhexidine, cis-butane diacid, anti-f acid, etc. 'but are not limited thereto. - Formic acid, adipic acid, ring Further, the calcined product may be exemplified by the acetal compound formed by the reaction of cyclohexanthene derivative with an alcohol. The reaction method can be produced by applying a usual acetalization reaction, for example. It is revealed that the right sentence does not have the following method: a method in which a reaction is carried out by using toluene, dimethylhydrazine, ruthenium ruthenium, ruthenium 4, and a mixture in a reaction medium (US Patent No. 2945008 \ , ^ 08) In the method of dissolving a polyhydric alcohol in concentrated hydrochloric acid, a method of slowly adding an aldehyde-m-side enthalpy reaction (Japanese Patent Laid-Open No. 48-96590, Gong Hao, . ) US Patent No. 3092640) m) using an organic solvent as a reaction medium The method (Japanese Patent Publication No. 7 千 7 7-7丨5979), a method of using a solid acid catalyst (Japanese Patent No. 2007-230992). In terms of the stability of the structure, it is a % acetal structure. As a representative of the special epoxy resin, a "" system" can be cited as: ERL_4221, UVR-6105, ERL-4299 (All-Jiu helmet σ *, Ρ为商οσ名' are all manufactured by Dow Chemical) ' celloxlde 2021P, Ερ〇1_ gt4〇i, EHpE 3i5〇, ^HPE 315GCE (all are trade names, all made by the chemical industry: 〇 and ί 一 一 稀 稀 j j 衣 衣 ' ' ' ' ' ' ' ' ' ' Etc. (Reference: General Epoxy Resin Basics Ιρ76 85). These may be used singly or in combination of two or more. In addition, a sesquiterpene oxide epoxy resin (in chain or ring shape) is added. Solid or liquid lyohydric resin such as epoxy resin with a mixture structure of two or more types of oxy-and agglomerated structure and/or epoxy ring-fired structure) Each of the curable resin compositions will be described below. The heat curing (curable resin composition Α) by the curing agent is used as the curing agent contained in the curable resin composition of the present invention, 20 201038549 ❹ Ο Amine compound, acid anhydride compound, guanamine compound And a compound, a citric acid-based compound, etc. As a specific example of a hardener which can be used, exemplified. Diaminodiphenylmethane, diethylenetriamine, triethylenetetramine, amine-phenyl-alloy, and different Buddha Ketone diamine, dicyanodiamine, polyamido resin synthesized from a polymer of threitol oleic acid and ethylenediamine, phthalic acid, trimellitic acid, anhydride, pyromellitic acid Anhydride, maleic anhydride, tetrahydrophthalic anhydride, methyltetrahydrophthalic anhydride, methylic acid anhydride, ceric anhydride, hexahydrophthalic anhydride, methylhexahydroortylene Diacetic anhydride, pentylene & C anhydride, bismuth [2,2,1]heptane 2,3-dicarboxylic anhydride, methylbicyclo[2,2,1]heptadicarboxylic acid liver, Cyclohexanetricarboxylic acid _3,4_ dianhydride, bisphenol quinone, bisphenol F, bisphenol s, shuangling, Zhuang Erling, 4,4, _biphenyl age, ::2: 'benzene, 3,3 ,,5,tetramethyl-[U,-biphenylenediol, p-benzidine, m-benzoic acid, naphthalene di-presence, tris(4-cyanophenyl)-methyl, 1,1,2,2 -tetrakis(4-predylphenyl)ethene, (iv) (benzene, alkyl substituted (tetra), (iv), : substituted naphthol, dihydroxy stupid, dihydroxy Naphthalene, acetaldehyde, benzofuraldehyde, p-hydroxybenzaldehyde, o-hydroxybenzaldehyde, p-hydroxyacetophenone, o-benzyl ethyl ketone, dicyclopentadiene, hydrazine, 4, 4 , _ bis (gas methyl) q polybiphenyl, M,-bis (methoxymethyl)], biphenyl, gas methyl) benzene, K bis (decyloxy fluorenyl) benzene and other polycondensates These modified substances, such as bisphenol hydrazine and other dentate double-conceived, taste saliva, three gas-burning-amine complex, pulse derivative, condensate of terpene and phenol, etc., but not limited to These may be used alone or in combination of two or more. In the present invention, a compound having an acid anhydride structure and/or a diacid structure represented by the above acid anhydride or a slow acid resin is particularly preferred. 21 201038549 As a compound having an acid anhydride structure, it is preferably methyltetraphthalic phthalic anhydride, methylic acid anhydride, ceric anhydride, hexahydrophthalic anhydride, methylhexahydrophthalic anhydride, Butane tetracarboxylic anhydride, bicyclo[^丨]heptane-2,3-dicarboxylic anhydride, methylbicyclo[2,2,1]heptane-2,3-dicarboxylic anhydride, cyclohexane 1'3, 4-Dicarboxylic acid _3,4- dianhydride, etc., particularly preferably decyl hexahydrophthalic anhydride or decane-1,3,4-tricarboxylic acid-3,4-dianhydride. From the viewpoint of improving hardness, insulation, heat resistance, or imparting high transparency, it is preferred to use a compound having an acid anhydride structure as a curing agent. It is preferably a compound having a carboxylic acid structure (hereinafter referred to as a polycarboxylic acid), a polytetracarboxylic acid having a 2:4 functional group, and more preferably an addition reaction of a γ-alcohol with an acid anhydride by a 2-4 function. And the polycarboxylic acid obtained. In the case where the volatilization of the hardener S ′ is hard to produce hardening m and it is easy to obtain a composition having a strong stagnation, it is preferred to use a polycarboxylic acid as a hardener. The 2 to 4 functional polyol is not particularly limited as long as it is an alcoholic hydroxyl group, and examples thereof include ethylene glycol, propylene glycol, and i, 3-propane dimer: 2 methylbutanediol and K Glycol, "5 · pentanedialdehyde, 1, hexane diol, , 疋 甲醇 methanol, 2,4-diethyl pentanediol, alcohol, Xinyet ethyl-2-butyl-1,3- Propylene di-tri-acid triol, tricycloanthracene dimethanol, norbornene diol, etc. diols 2-hydroxymethyl--mercaptoethane, trishydroxypropyl propane, trishydroxybutane, hydrazine, etc. Triols such as butanediol, pentaerythritol, di-trimethylolwo I tetraol, etc. 'Specially good pentanediol, calcined dimethanol, 2~4 functional polyol is cyclohexane dimethanol, 2 a branched or cyclic alcohol such as 4_diethyl 2-ethyl-2·butyl-; i'3-propanediol, neodecanediol, tricyclic indene norbornene glycol. 22 201038549 Acid acid in the case of poly-acidification, preferably methyltetrahydro-butanol::: methyl glutinous acid oxuan, Caidi acid porphyrin, six gas phthalic acid porphyrin, a ^ ^ tetracarboxylic anhydride, double ring [训庚烧#: Formic acid, methyl double ring [Xun Geng ^... Worker, 3,4-dicarboxylic acid-3,4-II ., Etc. As the addition reaction conditions, is not particularly specified as one of the specific types of reactive conditions, in the catalyst-free, solvent-free under the conditions - to face 4〇~

15〇°C、加熱-面使酸肝與多元醇反應,反應結束後直接取出 之方法。但是’並不限定於本反應條件。 酸酐、聚叛酸可分別單獨使用、或者亦可使用兩種以 上。於此情形時,酸野與聚㈣之比率以其重量比計為90/10 〜20/80 ’ 特佳為 80/20〜30/70。 於本發明之硬化性樹脂組成物A中,硬化劑之使用量 較佳為相對於環氧樹脂之環氧基丨當量,以官能基當量計 為0.5〜1.5當量。較佳為(^〜丨丨當量,特佳為〇 8〜1〇 當量。於相對於環氧基1當量未達0.5當量之情形或超過 1.5當量之情形時,均存在硬化不完全而無法獲得良好之硬 化物性之虞。 於本發明之硬化性樹脂組成物A中,亦可與硬化劑一 併使用硬化促進劑。作為可使用之硬化促進劑之具體例, 可列舉:2-甲基咪唑、2-苯基咪唑、2- Η" —烷基咪唑、2-十 七烧基咪唑、2-苯基-4-f基咪唑、1-节基-2-苯基咪唑、1-节基-2-甲基咪唑、丨_氰乙基_2_甲基咪唑、丨_氰乙基_2_苯基 味唾、1-氰乙基_2_十一烷基咪唑、2,4_二胺基_6_(2,_甲基咪 23 201038549 唑(1,))乙基-均三嗪、2,4·二胺基-6-(2·_十一烷基咪唑(Γ))乙 基-均三嗪、2,4-二胺基-6_(2'-乙基-4_甲基°米°坐(丨’))乙基-均 三嗪、2,4-二胺基-6-(2i-甲基味。坐(1’))乙基-均三嗓-異三聚 氰酸加成物、2 -甲基11米嗅異二聚氰酸之2. 3加成物、2 -苯 基味。坐-異三聚氣酸加成物、2_本基_3,5_一經甲基咪唾、2-苯基-4-羥甲基-5-甲基15米唑、1_氰乙基-2-苯基-3,5_二氰基乙 氧基甲基咪唑之各種咪唑類,以及該等咪唑類與鄰苯二甲 酸、間苯二甲酸、對苯二甲酸、偏苯三曱酸、均苯四甲酸、 萘二曱酸、順丁烯二酸、草酸等多元羧酸之鹽類,二氰基 二醯胺等醯胺類,1,8- —.......... —抑州 化合物及該等之四苯基硼酸鹽、苯酚酚醛清漆等鹽類,該 等與上述多元羧酸類或次膦酸類之鹽類,溴化四丁基録、 溴化鯨蠟基三甲基敍、溴化三辛基甲基銨等銨鹽,三苯基 膦、三(曱苯醯基)膦、四苯基溴化鱗、四笨基硼酸四苯基鱗 等膦類或鱗化合物,2,4,6-三胺基甲基笨酚等酚類,胺加合 物,羧酸辞(2-乙基己酸鋅、硬脂酸鋅、二十二酸辞、肉豆 1酸鋅)、磷酸醋辞(磷酸辛醋鋅、磷酸十八烷基酷辞等) 等鋅化合物,辛酸錫等錫化合物等,各種金屬化合物等, 以及將該等硬化促進劑微膠囊化而成之微膠囊型硬化促進 劑等。使用該等硬化促進劑之哪一者係根據例如透明性、 硬化速度或作業條件等對 之牲^ α 續獲付之相樹脂組成物所要求 之特性而適宜選擇。就透明 文八 較估&較同不易者色之觀點而言, 佳為使用鋅化合物。硬 _重量份為請f於相對於環氧樹脂 i5重量份之範圍内使用。 24 201038549 本發明之硬化性樹脂組成物A中亦可含有含磷之化合 物作為阻燃性賦予成分。作為含磷之化合物,可為反應型 之含鱗之化合物,亦可為添加型之含磷之化合物。作為含 磷之化合物之具體例,可列舉:磷酸三甲酯、磷酸三乙酯' 麟酸三甲苯酯、磷酸三(二曱苯)酯、磷酸曱苯基二苯酯、磷 酸曱苯基-2,6-二(二甲苯)醋、13 —伸苯基雙(磷酸二(二甲苯) 醋)、M-伸苯基雙(鱗酸二(二甲苯)醋)、4,4,_聯苯基(填酸二 0 (—甲苯)酯)等磷酸酯類;9,1〇_二氫_9_氧雜_1〇_磷雜菲_1〇_ 氧化物、10-(2,5-二羥基苯基)-i〇H-9-氧雜-10-磷雜菲-10-氧 化物等膦類;使環氧樹脂與上述膦類之活性氫反應而獲得 之含磷之環氧化合物’紅磷等,較佳為磷酸酯類、膦類或 含磷之環氧化合物,特佳為丨,3_伸苯基雙(磷酸二(二曱苯) 醋)、M-伸苯基雙(填酸二(二甲苯)醋)、4,4,_聯苯基(麟酸二 (甲本日)或含填之壞氧化合物。含填之化合物之含量較 佳為’含磷之化合物/全部環氧樹脂=()1〜〇6(重量比)。 Q 右未達0.1,則阻燃性不充分,若超過〇 6 ,則有可能對硬 化物之吸濕性、介電特性造成不良影響。 進而,視需要亦可於本發明之硬化性樹脂組成物A中 配合黏合樹脂。作為黏合樹脂,可列舉:丁醛系樹脂、縮 醛系樹脂、丙烯酸系樹脂、環氧-尼龍系樹脂、NBR (acryl〇nitriie_butadiene rubber,丁腈橡膠)酚系樹脂、 環氧-NBR系樹脂、聚醯胺系樹脂、聚醯亞胺系樹脂、聚矽 氧系樹脂等,但並不限定於該等。黏合樹脂之配合量較佳 為在不損及硬化物之阻燃性、耐熱性之範圍内,相對於樹 25 201038549 脂成分100重量份,通常為0.05〜50重量份,視需要較佳 為使用0.05〜20重量份。 視需要亦可於本發明之硬化性樹脂組成物A中添加無 機填充劑。作為無機填充劑,可列舉:結晶二氧化矽、熔 融二氧化石夕、氧化銘、錯英石、石夕酸飼、碳酸飼、碳化石夕、 氮化矽、氮化硼、氧化鍅、鎂撖欖石、塊滑石、尖晶石、 氧化鈦π石荨之粉體或將該等球形化而成之珠粒等,但 並不限定於該等。該等可單獨使用,亦可使用兩種以上。 該等無機填充劑之含量可使用纟本發明之硬化性樹脂組成 物Α中占〇〜95重量%之量。進而,可於本發明之硬化性樹 月曰組成物A中添加矽烷偶合劑、硬脂酸、棕櫚酸、硬脂酸 鋅、硬脂酸鈣等脫模劑,顏料等各種配合劑,及各種熱硬 化性樹脂。 於將本發明之硬化性樹脂組成物A用於光學材料,特 別是光半導體密封劑之情形時,作為上述所使用之無機填 充劑之粒徑,藉由使用奈米級之填充材料,可不阻礙透明 ! 生地、強機械強度等。作為奈米級之標準,就透明性之觀 點而言,較佳為使用平均粒徑為5〇〇 nm以下,特別是平均 粒徑為200 nm以下之填充材料。 將本發明之硬化性樹脂組成物A用於光學材料,特別 疋光半導體密封劑之情形時,視需要可添加螢光體。螢光 體例如為具有下述作用者,即其吸收自藍光LED元件發出 之藍色光之一部分,並發出經波長轉換之黃色光,藉此形 成白色光。將螢光體事先分散於硬化性樹脂組成物中後密 26 201038549 封光半導體。對螢光體並無特別限制,可使用先前公知之 螢光體,例如可例示:稀土元素之鋁酸鹽、硫代沒食子酸 鹽、原碎酸鹽等。更具體而言,可列舉:YAG ( yttrium aluminum garnet’ 紀銘權石)螢光體、TAG( terbium aluminum garnet,铽鋁榴石)螢光體、原矽酸鹽螢光體、硫代沒食子 酸鹽登光體、硫化物發光體等蝥光體,且可例示: YA103:Ce、Y3Al5〇12:Ce、Y4Al2〇9:Ce、Y2〇2S:Eu、 Sr5(P04)3Cl:EU、(SrEu)0-Al203等。作為上述螢光體之粒 f) 广 - 徑’可使用該領域中公知之粒徑者,平均粒徑為1〜2 5 0 y m’特佳為2〜50 em。於使用該等螢光體之情形時,其添 加量較佳為相對於該樹脂成分1〇〇重量份為1〜8〇重量 份,較佳為5〜60重量份。The method of reacting the acid liver with the polyol at 15 ° C and heating-side, and directly taking out after the reaction is completed. However, 'it is not limited to the reaction conditions. The acid anhydride and the polyphenolic acid may be used singly or in combination of two or more. In this case, the ratio of the acid field to the poly(iv) is 90/10 to 20/80 Å by weight ratio 80/20 to 30/70. In the curable resin composition A of the present invention, the curing agent is preferably used in an amount of from 0.5 to 1.5 equivalents based on the functional group equivalents based on the epoxy group equivalent of the epoxy resin. Preferably, it is (^~丨丨 equivalent, particularly preferably 〇8~1〇 equivalent. When it is less than 0.5 equivalents or more than 1.5 equivalents with respect to 1 equivalent of epoxy group, hardening is incomplete and cannot be obtained. In the curable resin composition A of the present invention, a curing accelerator may be used together with the curing agent. Specific examples of the curing accelerator which can be used include 2-methylimidazole. , 2-phenylimidazole, 2- Η"-alkylimidazole, 2-heptadecanylimidazole, 2-phenyl-4-f-imidazole, 1-pyryl-2-phenylimidazole, 1-block -2-methylimidazole, hydrazine-cyanoethyl-2-methylimidazole, hydrazine-cyanoethyl-2-phenyl sulphate, 1-cyanoethyl-2-undecylimidazole, 2,4_ Diamino _6_(2,_methyl meth 23 201038549 oxazole (1,)) ethyl-s-triazine, 2,4·diamino-6-(2·-undecylimidazole (Γ)) Ethyl-s-triazine, 2,4-diamino-6-(2'-ethyl-4-methyl-°°[()) ethyl-s-triazine, 2,4-diamino -6-(2i-methyl-flavored. Sit (1')) ethyl-s-trimethylene-iso-cyanuric acid adduct, 2-methyl-methyl 11 m olfactory isocyanuric acid 2. 3 addition , 2-phenyl-paste. Sit-isotrimeric gas acid adduct, 2_bens_3,5_-methyl methine, 2-phenyl-4-hydroxymethyl-5-methyl 15 Various imidazoles of thiazole, 1-cyanoethyl-2-phenyl-3,5-dicyanoethoxymethylimidazole, and the imidazoles and phthalic acid, isophthalic acid, and para-benzene a salt of a polycarboxylic acid such as dicarboxylic acid, trimellitic acid, pyromellitic acid, naphthalene dicarboxylic acid, maleic acid or oxalic acid, or a guanamine such as dicyanodiamine, 1,8- ..... - a compound of the stagnation state and such salts as tetraphenylborate or phenol novolac, and salts of the above polycarboxylic acids or phosphinic acids, tetrabutyl bromide Base, ammonium cyanide trimethyl sulfonate, trioctylmethyl ammonium bromide, triphenylphosphine, tris(phenylphenyl)phosphine, tetraphenyl bromide, tetraphenylboronic acid Phosphine or scaly compound such as tetraphenyl scale, phenol such as 2,4,6-triaminomethyl phenol, amine adduct, carboxylic acid (zinc 2-ethylhexanoate, zinc stearate, Twenty-two acid words, nutmeg zinc citrate), phosphate vinegar words (phosphoric acid zinc citrate, octadecyl phosphate, etc.) and other zinc a compound such as a tin compound such as tin octylate, various metal compounds, and the like, and a microcapsule-type hardening accelerator obtained by microencapsulating the curing accelerator, etc. Which one of the curing accelerators is used is, for example, transparent Sex, hardening speed or working conditions are suitable for the characteristics required by the resin composition of the phase to be renewed. It is better to use it in comparison with the lesser color. The hardening resin composition A of the present invention may also contain a phosphorus-containing compound as a flame retardancy imparting component. The hardening resin composition A of the present invention may also be used as a flame retardancy imparting component. As the phosphorus-containing compound, it may be a reaction type scaly compound or an addition type phosphorus-containing compound. Specific examples of the phosphorus-containing compound include trimethyl phosphate, triethyl phosphate 'tricresyl linoleate, tris(phenylene) phenyl phosphate, decyl phenyl diphenyl phosphate, and phenyl phenyl phosphate- 2,6-bis(xylene) vinegar, 13-phenylene bis(phosphine di(dimethylbenzene) vinegar), M-phenylene bis(bis(xylene) vinegar), 4,4, _ Phosphate such as phenyl (2-(toluene) ester); 9,1 〇_dihydro_9_oxa-1〇_phosphaphenanthrene 〇_oxide, 10-(2,5 a phosphine such as -dihydroxyphenyl)-i〇H-9-oxa-10-phosphaphenanthrene-10-oxide; a phosphorus-containing epoxy obtained by reacting an epoxy resin with an active hydrogen of the above phosphine The compound 'red phosphorus, etc., preferably a phosphate ester, a phosphine or a phosphorus-containing epoxy compound, particularly preferably ruthenium, 3_phenylene bis(bis(diphenylene) vinegar), M-phenylene Double (di(xylylene) vinegar), 4,4, _biphenyl (linic acid) or filled with an oxygen compound. The content of the compound containing the filler is preferably 'phosphorus compound /All epoxy resin = () 1 ~ 〇 6 (weight ratio). Q Right less than 0.1, flame retardant If it is less than 〇6, it may adversely affect the hygroscopicity and dielectric properties of the cured product. Further, if necessary, a binder resin may be blended in the curable resin composition A of the present invention. Examples thereof include a butyraldehyde resin, an acetal resin, an acrylic resin, an epoxy-nylon resin, a NBR (acrylonitrile nitriie-butadiene rubber) phenol resin, an epoxy-NBR resin, and a polyamine. The resin, the polyimide resin, the polyoxymethylene resin, and the like are not limited thereto. The blending amount of the binder resin is preferably within a range that does not impair the flame retardancy and heat resistance of the cured product. The amount of the fat component is usually 0.05 to 50 parts by weight, preferably 0.05 to 20 parts by weight, based on 100 parts by weight of the tree 25 201038549. If necessary, an inorganic filler may be added to the curable resin composition A of the present invention. As the inorganic filler, there may be mentioned, for example, crystalline cerium oxide, molten sulphur dioxide, oxidized smear, smectite, ashes, carbonic acid, carbonized stone, tantalum nitride, boron nitride, cerium oxide, Magnesium sapphire The talc, the spinel, the powder of the titanium oxide π sarcophagus, or the spheroidized beads, etc., are not limited thereto. These may be used singly or in combination of two or more. The content of the inorganic filler may be 〇 to 95% by weight based on the sclerosing resin composition of the present invention. Further, a decane coupling agent may be added to the curable sap composition A of the present invention. a release agent such as stearic acid, palmitic acid, zinc stearate or calcium stearate, various compounding agents such as pigments, and various thermosetting resins. The curable resin composition A of the present invention is used for an optical material. In particular, in the case of a photo-semiconductor encapsulant, by using a nano-sized filler as the particle diameter of the inorganic filler to be used, it is possible to prevent transparency, grounding, strong mechanical strength, and the like. As a standard of the nanometer level, in terms of transparency, it is preferred to use a filler having an average particle diameter of 5 Å nm or less, particularly an average particle diameter of 200 nm or less. When the curable resin composition A of the present invention is used for an optical material, particularly a calendered semiconductor encapsulant, a phosphor may be added as needed. The phosphor is, for example, a person who absorbs a portion of the blue light emitted from the blue LED element and emits wavelength-converted yellow light, thereby forming white light. The phosphor is previously dispersed in the curable resin composition and then sealed. The phosphor is not particularly limited, and a conventionally known phosphor can be used, and examples thereof include an aluminate of a rare earth element, a thiogallate, a raw acid salt, and the like. More specifically, YAG (yttrium aluminum garnet) phosphor, TAG (terbium aluminum garnet) phosphor, orthosilicate phosphor, thiogallate A phosphor such as a salt or a sulfide illuminant, and can be exemplified by: YA103: Ce, Y3Al5〇12: Ce, Y4Al2〇9: Ce, Y2〇2S: Eu, Sr5(P04)3Cl: EU, (SrEu ) 0-Al203 and the like. As the particles of the above-mentioned phosphor, the particle diameter f) can be a particle diameter known in the art, and an average particle diameter of 1 to 2 5 0 y m' is particularly preferably 2 to 50 em. In the case of using these phosphors, the amount thereof is preferably from 1 to 8 parts by weight, preferably from 5 to 60 parts by weight, per part by weight of the resin component.

於將本發明之硬化性樹脂組成物A用於光學材料,特 別是光半導體密封劑之情形時,為了防止各種螢光體於硬 化時沈澱,可添加以二氧化矽細粉末(亦稱為Aerosil或 Ae_l)為代表之觸變性賦予劑。作為此種二氧化石夕細粉 末,例如可列舉:Aerosil 5〇、Aer〇sil 9〇、Aer〇sii i3〇、A謂fi 2〇〇 > Aerosil 300 , Aerosil 380 . AerosU 0X50 ^ Aerosil TT600 ^ Aerosil R972 ^ Aerosil R974 ^ Aerosil R202 ^ AerosilWhen the curable resin composition A of the present invention is used for an optical material, particularly a photo-semiconductor encapsulant, in order to prevent precipitation of various phosphors upon hardening, fine powder of cerium oxide (also referred to as Aerosil) may be added. Or Ae_l) is a representative thixotropy imparting agent. Examples of such a fine powder of the silica fine powder include: Aerosil 5〇, Aer〇sil 9〇, Aer〇sii i3〇, A for fi 2〇〇> Aerosil 300 , Aerosil 380 . AerosU 0X50 ^ Aerosil TT600 ^ Aerosil R972 ^ Aerosil R974 ^ Aerosil R202 ^ Aerosil

Aerosil R812S ^ Aerosil R8〇5 ^ RY200 > RX2〇〇 ( a 本Aerosil公司製造)等。 …發明之硬化性樹月旨組成物A用於光學材料,特 別是光半導體密封劑之情形 A㈣1 為了防止著色,可含有作 為先穩疋劑之胺化合物、戋 及者作為抗氧化劑之磷系化合物 27 201038549 或紛系化合物。 作為上述胺化合物 .Α 』如可列舉:四(1,2,2,6,6-五曱暮 -4-哌啶基)=:1,2,3,4_ uh,,, T & 啶某U 7 1 λ 疋甲酸酯,四(2,2,6,6-四曱基-4-哌 咬基)-1,2,3,4- 丁烷四 甲酸酯,1,2,3,4- 丁烷四曱酸與 1,2,2,6,6-五曱基 _4-哌 Α , 定醇及3,9-雙(2-羥基_1,1-二曱基乙 基)-2,4,8,1〇-四氧雜螺『 、L』十一烷之混合酯化物,癸二酸雙 (2,2,6,6-四曱基_4_哌 疋I )癸二酸酯,雙(卜十一烷氧基 -2,2,6,6-四甲基〇底口定甘、& 4-基)¾酸酯,曱基丙烯酸2,2,6,6-四甲 基-4-哌啶基酯,雙(2 ? 叉^“,6,6-四甲基_4_哌啶基)癸二酸酯,雙 (,’2,6,6五甲基_4-哌啶基)癸二酸酯,4_苯曱醯氧基 2,2,6,6-四曱基派0定,1[2_[3·(3,5二第三丁基_4經基笨基) 丙醯氧基]乙基]-4-[3-(3,5-二-第三丁基_4_經基苯基)丙酿氧 基]_2,2,Μ_四曱基°底啶,曱基丙烯酸-1,2,2,6,6-五甲基_4_ 0底咬基醋’雙(1,2,2,6,6-五甲基-4-哌啶基)[[3,5-雙(1,1-二曱 基乙基)-4-經基苯基]曱基]丁基丙二酸酯,癸二酸雙 (2,2,6,6-四甲基-ΐ-(辛氧基)_4_哌啶基)酯,二曱基乙基過 氧化氫與辛烷之反應產物,N,N,,N",N”,_四(4,6_雙(丁基_(N_ 甲基-2,2,6,6-四甲基哌啶_4_基)胺基)三嗪_2_基)_4,7-二氮雜 癸烷-1,10-二胺,二丁基胺-H5·三嗪_Ν,Ν,_雙(2,2,6,6四甲 基-4-哌啶基-l,6-己二胺與ν-(2,2,6,6-四甲基-4-哌啶基)丁 基胺之縮聚物,聚[[6-(1,1,3,3-四甲基丁基)胺基-1,3,5-三嗪 -2,4-二基][(2,2,6,6-四曱基-4-旅0定基)亞胺基]六亞甲基 [(2,2,6,6-四曱基-4-哌啶基)亞胺基]]’琥珀酸二甲酯與4-羥 基-2,2,6,6-四甲基-1-哌啶乙醇之聚合物,2,2,4,4-四甲基 28 201038549 -20-(冷-月桂氧基羰基)乙基_7_氧雜_3,2〇_二氮雜二螺[5 .丄. U·2]二十—烷_21-酮,沒.丙胺酸,Ν·(2,2,6,6-四甲基-4-哌 啶基)-十一烷基酯/十四烷基酯,Ν-乙醯基_3_十二烷基 -1-(2,2,6,6-四甲基_4_哌啶基)吡咯啶_2,5_二酮,2,2,4,4_四曱 基-7-氧雜-3,20-二氮雜二螺[5,1,11,2]二十—烷_21_酮, 2,2,4,4-四甲基_21_氧雜_3,2〇_二氮雜二環二十一 烷_2〇_丙酸十二烷基酯/十四烷基酯,丙二酸[(4_甲氧基苯 ◎基)亞曱基]-雙(1,2,2,6,6_五甲基_4_0底咬基)黯,2,2,6,6_四甲 基-4-哌啶醇之高級脂肪酸酯,丨,3_苯二甲醯胺、N,N,_雙 (2,2,6,6-四曱基_4_旅啶基)等受阻胺系,辛笨酮等二苯甲嗣 系化合物,2-(2H_苯并三唑-2-基^^夂四甲基丁基择 紛2-(2-¾基_5_曱基苯基)苯并三〇坐、2_[2_經基_3_(3,〇 四氫鄰苯二甲醯亞胺_甲基)_5_曱基苯基]苯并三唑、第 三丁基-2-羥基_5_甲基笨基)_5_氯苯并三唑、2(2-羥基·3,5_ 二-第三戊基苯基)苯并三唑、甲基_3_(3_(2η_苯并三唑_2 一 〇基)-5_第三丁基-4-羥基苯基)丙酸酯與聚乙二醇之反應產 物、2-UH-苯并三嗤_2_基)_6十二院基_4_甲基苯盼等苯并三 嗤系化合物’2,4-二_第三丁基苯基_3,5_二-第三丁基_4_羥基 苯甲酸酿等苯甲酸輯系,孓(4,6_二苯基三嗪_2_ 基)-5-[(己基)氧基]苯酚等三嗪系化合物等,特佳為受阻胺 系化合物。 上述作為光穩疋劑之胺化合物,可使用以下所示之 售品。 作為市售之胺系化合物,並無特別限定,例如作為汽 29 201038549 巴精化製造之市售品,可列舉:TINUVIN765、 TINUVIN770DF 、 TINUVIN144 、 TINUVIN123 、 TINUVIN622LD、TINUVIN152、CHIMASSORB944,作為Aerosil R812S ^ Aerosil R8〇5 ^ RY200 > RX2〇〇 (a manufactured by Aerosil) and others. In the case of an optical material, particularly a photo-semiconductor sealant, A (4) 1 In order to prevent coloring, an amine compound which is a first stabilizer and a phosphorus compound which is an antioxidant may be contained. 27 201038549 or a variety of compounds. As the above amine compound, 如 』 can be exemplified by: tetrakis(1,2,2,6,6-penta-4-piperidinyl)=: 1,2,3,4_uh,,, T & a certain U 7 1 λ carbamate, tetrakis(2,2,6,6-tetradecyl-4-piperidyl)-1,2,3,4-butane tetracarboxylate, 1,2, 3,4-butane tetradecanoic acid and 1,2,2,6,6-pentamethyl-4-piperidin, alcohol and 3,9-bis(2-hydroxy-1,1-didecyl Mixed) ester of 2,4,8,1〇-tetraoxaspiro", L"undecane, adipic acid bis(2,2,6,6-tetradecyl_4_piperazin I Azelaic acid ester, bis(budecyloxy-2,2,6,6-tetramethylhydrazine, butyl, & 4-yl) 3⁄4 acid ester, methacrylic acid 2, 2, 6 ,6-tetramethyl-4-piperidinyl ester, bis(2 叉^^,6,6-tetramethyl-4(piperidinyl) sebacate, bis (, '2, 6, 6 Pentamethyl-4-piperidinyl) sebacate, 4-benzophenoxy 2,2,6,6-tetradecylpyridine, 1[2_[3·(3,5二third Butyl-4, propyloxy)ethyl]-4-[3-(3,5-di-t-butyl-4-yl-phenylphenyl)propanyloxy]_2,2 , Μ _ 曱 曱 ° ° base, methacrylic acid -1,2,2,6,6-pentamethyl _4_ 0 bottom bite vinegar 'double (1,2,2,6,6-five 4--4-piperidinyl)[[3,5-bis(1,1-didecylethyl)-4-ylphenyl]indolyl]butylmalonate, azelaic acid bis(2 , 2,6,6-tetramethyl-indole-(octyloxy)_4_piperidinyl) ester, the reaction product of dimercaptoethyl hydroperoxide with octane, N, N,, N", N ",_4 (4,6-bis(butyl-(N-methyl-2,2,6,6-tetramethylpiperidine-4-yl)amino)triazin-2-yl)_4,7 -diazepine-1,10-diamine, dibutylamine-H5.triazine_Ν,Ν,_bis(2,2,6,6-tetramethyl-4-piperidinyl-l, Polycondensate of 6-hexanediamine and ν-(2,2,6,6-tetramethyl-4-piperidyl)butylamine, poly[[6-(1,1,3,3-tetramethyl) Alkyl butyl)amino-1,3,5-triazine-2,4-diyl][(2,2,6,6-tetradecyl-4-branched alkyl)imido]hexamethylene Dimethyl [(2,2,6,6-tetradecyl-4-piperidyl)imido]]' succinate and 4-hydroxy-2,2,6,6-tetramethyl-1 - polymer of piperidine ethanol, 2,2,4,4-tetramethyl 28 201038549 -20-(cold-lauric oxycarbonyl)ethyl_7_oxa-3,2〇-diaza snail [5. 丄. U·2] hexadecane-21-ketone, no. Alanine, Ν·(2,2,6,6-tetramethyl-4-piperidyl)-undecyl ester /Tetradecyl Ester, oxime-ethenyl_3_dodecyl-1-(2,2,6,6-tetramethyl-4(piperidinyl)pyrrolidine-2,5-dione, 2,2, 4,4_tetradecyl-7-oxa-3,20-diazaspiro[5,1,11,2]icosane-21-one, 2,2,4,4-tetramethyl Base_21_oxa-3,2〇-diazabicyclohexadecane-2-indole propanoic acid dodecyl ester/tetradecyl ester, malonic acid [(4-methoxybenzene) ◎ base) fluorenyl]-bis (1,2,2,6,6-pentamethyl_4_0 bottom bite) 黯, advanced 2,2,6,6-tetramethyl-4-piperidinol Fatty acid esters, hydrazine, 3 - phthalimide, N, N, _ bis (2, 2, 6, 6-tetradecyl _4 - benzyl group) and other hindered amines, diphenyls such as octyl ketone Formamidine compound, 2-(2H_benzotriazol-2-yl^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^ [2_经基_3_(3, 〇tetrahydrophthalene imine _methyl)_5_nonylphenyl]benzotriazole, tert-butyl-2-hydroxy_5_methyl stupid _5_Chlorobenzotriazole, 2(2-hydroxy-3,5-di-t-pentylphenyl)benzotriazole, methyl_3_(3_(2η_benzotriazole_2 〇 Reaction product of 5-)-tert-butyl-4-hydroxyphenyl)propionate with polyethylene glycol, 2-UH-benzene三嗤_2_基)_612院基_4_Methylbenzene and other benzotriazine compounds '2,4-di-t-butylphenyl-3-3,5-di-t-butyl _4_hydroxybenzoic acid is a benzoic acid series, a triazine compound such as ruthenium (4,6-diphenyltriazine-2-yl)-5-[(hexyl)oxy]phenol, etc. Amine compound. As the above amine compound as a photostabilizer, the following products can be used. The commercially available amine-based compound is not particularly limited, and is commercially available as, for example, TINOVIN765, TINUVIN770DF, TINUVIN144, TINUVIN123, TINUVIN622LD, TINUVIN152, CHIMASSORB944, as a commercially available product of the company.

Adeka製造之市售品’可列舉:la_52、LA·”、LA_62、 LA-63P、LA-77Y、LA-81、LA-82、LA-87 等。 作為上述磷系化合物,並無特別限定,例如可列舉: 1’1,3-三(2-曱基-4-二-十三烷基亞磷酸酯_5_第三丁基苯基) 丁烷、雙十八烷基季戊四醇二亞磷酸酯、雙(2,4_二_第三丁 基苯基)季戊四醇二亞磷酸酯 '雙(2,6二第三丁基_4甲基 苯基)季戊四醇二亞磷酸酯 '苯基雙酚A季戊四醇二亞磷酸 酯、二環己基季戊四醇二亞磷酸酯、三(二乙基苯基)亞磷酸 酯、三(二-異丙基苯基)亞磷酸酯、三(二_正丁基苯基)亞磷 酸酯、三(2,4-二-第三丁基苯基)亞磷酸酯、三(2,6_二-第三 丁基苯基)亞磷酸酯、三(2,6-二-第三丁基苯基)亞磷酸酯、 2,2’-亞曱基雙(4,6_二_第三丁基苯基)(2,4二-第三丁基苯基) 亞磷酸醋、2,2,-亞甲基雙(4,6_二_第三丁基苯基)(2第三丁基 -4-甲基苯基)亞磷酸酯、2,2,_亞甲基雙(4_曱基第三丁基 苯基)(2-第二丁基_4_甲基苯基)亞磷酸酯、2,2,亞乙基雙(4_ 甲基-6-第三丁基苯基)(2_第三丁基_4甲基苯基)亞磷酸醋、 P,4 一第一丁基笨基)_4,4,_伸聯苯基二亞膦酸酯、四 (2,4-一-第三丁基苯基)_4,3,_伸聯苯基二亞膦酸酯、四(2,4_ 一-第三丁基苯基)_3,3,_伸聯苯基二亞膦酸醋、四(2,6_二-第 三丁基苯基)-4,4’-伸聯苯基二亞膦酸酯、四(2,6_二_第三丁 土笨基)4,3伸如本基二亞膦酸酯、四(2,6·二-第三丁基苯 30 201038549 基)-3,3 _伸聯苯基二亞膦酸酯、雙(2,4_二-第三丁基苯基)_4-苯基-苯基亞膦酸酯、雙(2,4-二-第三丁基苯基)_3-苯基-苯基 亞膦酸酯、雙(2,6-二-正丁基苯基)_3_苯基-苯基亞膦酸酯、 雙(2,6-二-第三丁基苯基)_4_苯基-苯基亞膦酸酯、雙(2,6_二_ 第二丁基本基)-3-苯基-苯基亞膦酸醋、四(2,4·二-第三丁基 -5-甲基苯基)-4,4'-伸聯苯基二亞膦酸醋、磷酸三丁醋、磷酸 三曱酯、磷酸三曱苯酯、磷酸三苯酯、磷酸三氣苯酯、磷 酸三乙酯、磷酸二苯基甲苯酯、磷酸二苯基單鄰聯苯基酯 (diphenylmonoorthoxenyl phosphate )、攝酸三丁氧基乙 酯、構酸二丁酯、填酸二辛酯、填酸二異丙酯等。 上述磷系化合物亦可使用市售品。作為市售之磷系化 合物,並無特別限定,例如作為Adeka製造之市售品,可 列舉:Adekastab PEP-4C、Adekastab PEP-8、Adekastab PEP-24G、Adekastab PEP-36、Adekastab HP-10、Adekastab 2112、Adekastab 260、Adekastab 522A、Adekastab 1178、 Adekastab 1500、Adekastab C、Adekastab 135A、Adekastab 3010、Adekastab TPP。 作為酚化合物,並無特別限定,例如可列舉:2,6-二-第三丁基-4-甲基苯酚、3-(3,5-二-第三丁基-4-羥基苯基)丙 酸正十八烷基酯、四[亞曱基-3-(3,5-二-第三丁基-4-羥基苯 基)丙酸酯]甲烷、2,4-二-第三丁基-6-甲基苯酚、l,6-己二醇 -雙[3-(3,5-二-第三丁基-4-羥基苯基)丙酸酯]、三(3,5-二第 三丁基-4-羥基苄基)-異氰尿酸酯、1,3,5-三曱基-2,4,6-三 (3,5-二-第二丁基-4-經基节基)苯、季戊四醉-四-[3-(3,5 -二- 31 201038549 第三丁基-4-羥基苯基)丙酸酯]、3,9-雙-[2_[3-(3-第三丁基-4-羥基-5-曱基苯基)-丙醯氧基]-1,1-二曱基乙基]_2,4,8,10_四 氧雜螺[5,5]十一烷、三乙二醇-雙[3-(3-第三丁基-5-甲基-4-羥基苯基)丙酸酯]、2,2’-亞丁基雙(4,6-二-第三丁基苯酚)、 4,4’-亞丁基雙(3-甲基-6-第三丁基苯酚)、2,2·-亞曱基雙(4-甲基-6-第三丁基苯酚)、2,2’-亞曱基雙(4-乙基-6-第三丁基 苯酚)、丙烯酸2-第三丁基-6-(3-第三丁基-2-羥基-5-曱基苄 基)-4-甲基苯酚酯、丙烯酸2-[ 1-(2-羥基-3,5-二-第三戊基苯 基)乙基]-4,6-二-第三戊基苯酯、4,4’-硫代雙(3-曱基-6-第三 丁基苯酚)、4,4'-亞丁基雙(3-甲基-6-第三丁基苯酚)、2-第 三丁基-4-甲基苯酚、2,4-二-第三丁基苯酚、2,4-二-第三戊 基苯酚、4,4'-硫代雙(3-曱基-6-第三丁基苯酚)、4,4·-亞丁基 雙(3-曱基-6-第三丁基苯酚)、雙-[3,3-雙-[4·-羥基-3’-第三丁 基苯基)-丁酸]-二醇酯、2,4-二-第三丁基苯酚、2,4-二-第三 戊基苯酚、丙烯酸2-[1-(2-羥基-3,5-二-第三戊基苯基)乙 基]-4,6-二-第三戊基苯酯、雙-[3,3-雙-(4,-羥基-3’-第三丁基 苯基)-丁酸]-二醇酯等。 上述酚系化合物亦可使用市售品。作為市售之酚系化 合物’並無特別限定,例如作為汽巴精化製造之市售品, 可列舉:IRGANOX1010、IRGANOX1035、IRGANOX1076、 IRGANOX1135 、 IRGANOX245 、 IRGANOX259 、 IRGANOX295 、 IRGANOX3114 、 IRGANOX1098 、 IRGANOX1520L ’作為Adeka製造之市售品,可列舉:A commercially available product manufactured by Adeka is exemplified by la_52, LA·, LA_62, LA-63P, LA-77Y, LA-81, LA-82, LA-87, etc. The phosphorus compound is not particularly limited. For example, 1'1,3-tris(2-mercapto-4-di-tridecylphosphite_5_t-butylphenyl)butane, dioctadecylpentaerythritol diphosphoric acid Ester, bis(2,4-di-tert-butylphenyl)pentaerythritol diphosphite 'bis(2,6 di-t-butyl-4-methylphenyl)pentaerythritol diphosphite 'phenyl bisphenol A pentaerythritol diphosphite, dicyclohexyl pentaerythritol diphosphite, tris(diethylphenyl) phosphite, tris(di-isopropylphenyl)phosphite, tris(di-n-butylbenzene) Phosphite, tris(2,4-di-t-butylphenyl)phosphite, tris(2,6-di-t-butylphenyl)phosphite, tris(2,6- Di-t-butylphenyl)phosphite, 2,2'-fluorenylene bis(4,6-di-t-butylphenyl) (2,4 di-t-butylphenyl) Phosphate, 2,2,-methylenebis(4,6-di-t-butylphenyl) (2-tert-butyl-4-methylphenyl) Phosphate, 2,2,-methylenebis(4-decylt-butylphenyl)(2-secondyl-4-methylphenyl)phosphite, 2,2, ethylene Bis(4_methyl-6-t-butylphenyl)(2_t-butyl-4-methylphenyl)phosphite vinegar, P,4-first butyl stylyl)_4,4,_ Biphenyldiphosphinate, tetrakis(2,4-mono-t-butylphenyl)-4,3,_biphenyldiphosphinate, tetrakis(2,4-di-t-butyl Phenyl)_3,3,_biphenyldiphosphinic acid vinegar, tetrakis(2,6-di-t-butylphenyl)-4,4'-extended biphenyl diphosphinate, four (2,6_二_三丁土笨基) 4,3 stretching as the base diphosphinate, tetrakis (2,6·di-t-butylbenzene 30 201038549 base)-3,3 _ stretch Biphenyldiphosphinate, bis(2,4-di-tert-butylphenyl)-4-phenyl-phenylphosphinate, bis(2,4-di-t-butylphenyl) )_3-phenyl-phenylphosphinate, bis(2,6-di-n-butylphenyl)_3_phenyl-phenylphosphinate, bis(2,6-di-third Phenyl) _4_phenyl-phenylphosphinate, bis(2,6-di-t-butylphenyl)-3-phenyl-phenylphosphinic acid vinegar, four (2,4 Di-t-butyl-5-methylphenyl)-4,4'-extended biphenyl diphosphinate, tributyl sulphate, tridecyl phosphate, tridecyl phenyl phosphate, triphenyl phosphate Ester, triphenyl phenyl phosphate, triethyl phosphate, diphenyl toluene phosphate, diphenylmonoorthoxyl phosphate, tributoxyethyl acrylate, dibutyl phthalate, Dioctyl acid ester, diisopropyl acid ester and the like. Commercially available products can also be used as the phosphorus compound. The commercially available phosphorus-based compound is not particularly limited. For example, as a commercial product manufactured by Adeka, Adekastab PEP-4C, Adekastab PEP-8, Adekastab PEP-24G, Adekastab PEP-36, Adekastab HP-10, Adekastab 2112, Adekastab 260, Adekastab 522A, Adekastab 1178, Adekastab 1500, Adekastab C, Adekastab 135A, Adekastab 3010, Adekastab TPP. The phenol compound is not particularly limited, and examples thereof include 2,6-di-tert-butyl-4-methylphenol and 3-(3,5-di-t-butyl-4-hydroxyphenyl). N-octadecyl propionate, tetrakis[-indenyl-3-(3,5-di-t-butyl-4-hydroxyphenyl)propionate]methane, 2,4-di-third -6-methylphenol, 1,6-hexanediol-bis[3-(3,5-di-t-butyl-4-hydroxyphenyl)propionate], three (3,5-di Third butyl-4-hydroxybenzyl)-isocyanurate, 1,3,5-trimethyl-2,4,6-tris(3,5-di-t-butyl-4- Basal group) benzene, pentaerythritol-tetraki-[3-(3,5-di-31 201038549 tributyl-4-hydroxyphenyl)propionate], 3,9-bis-[2_[ 3-(3-Tertibutyl-4-hydroxy-5-mercaptophenyl)-propenyloxy]-1,1-dimercaptoethyl]_2,4,8,10-tetraoxaspiro [5,5]undecane, triethylene glycol-bis[3-(3-tert-butyl-5-methyl-4-hydroxyphenyl)propionate], 2,2'-butylene double (4,6-di-t-butylphenol), 4,4'-butylene bis(3-methyl-6-tert-butylphenol), 2,2·-indenyl bis (4-methyl) -6-tert-butylphenol), 2,2'-indenylene bis(4-ethyl-6-tributyl) Phenol), 2-t-butyl-6-(3-tert-butyl-2-hydroxy-5-mercaptobenzyl)-4-methylphenol acrylate, 2-[1-(2-hydroxyl) acrylate -3,5-di-t-pentylphenyl)ethyl]-4,6-di-third amylphenyl ester, 4,4'-thiobis(3-mercapto-6-tributyl) Phenol), 4,4'-butylene bis(3-methyl-6-tert-butylphenol), 2-tert-butyl-4-methylphenol, 2,4-di-t-butyl Phenol, 2,4-di-third amyl phenol, 4,4'-thiobis(3-mercapto-6-tert-butylphenol), 4,4·-butylene bis(3-indenyl) -6-t-butylphenol), bis-[3,3-bis-[4.-hydroxy-3'-t-butylphenyl)-butyric acid]-diol ester, 2,4-di- Tert-butylphenol, 2,4-di-p-pentylphenol, 2-[1-(2-hydroxy-3,5-di-tripentylphenyl)ethyl]-4,6- Di-t-amylphenyl ester, bis-[3,3-bis-(4,-hydroxy-3'-t-butylphenyl)-butyric acid]-diol ester, and the like. Commercially available products can also be used as the phenolic compound. The commercially available phenolic compound is not particularly limited. For example, as a commercial product of Ciba refined production, IRGANOX1010, IRGANOX1035, IRGANOX1076, IRGANOX1135, IRGANOX245, IRGANOX259, IRGANOX295, IRGANOX3114, IRGANOX1098, IRGANOX1520L 'as Adeka Commercially available products can be listed as follows:

Adekastab AO-20、Adekastab AO-30、Adekastab AO-40、 32 201038549Adekastab AO-20, Adekastab AO-30, Adekastab AO-40, 32 201038549

Adekastab AO-50、Adekastab AO-60、Adekastab AO-70、 Adekastab AO-80、Adekastab AO-90、Adekastab AO-330 ’ 作為住友化學工業製造之市售品,可列舉:Sumilizer GA-80、Sumilizer MDP-S、Sumilizer BBM-S、Sumilizer GM、Sumilizer GS ( F ) 、Sumilizer GP 等。 除此以外,可使用市售之添加劑作為樹脂之防著色 劑。例如作為汽巴精化製造之市售之添加劑,可列舉: TINUVIN328、TINUVIN234、TINUVIN326、TINUVIN120、 O TINUVIN477、TINUVIN479、CHIMASSORB2020FDL、 CHIMASSORB119FL 等。 較佳為含有選自上述碗系化合物、胺化合物、紛系化 合物中之至少一種以上,其配合量並無特別限定,相對於 該硬化性樹脂組成物為0.005〜5.0重量%之範圍。 本發明之硬化性樹脂組成物A可藉由將各成分均勻地 混合而獲得。本發明之硬化性樹脂組成物A可藉由與先前 已知之方法相同之方法而容易地製成其硬化物。例如可視 ^ 需要使用擠出機、捏合機、輥等將本發明之環氧樹脂與硬 化劑以及視需要之硬化促進劑、含磷之化合物、黏合樹脂、 無機填充劑及配合劑充分地混合至均勻為止而獲得硬化性 樹脂組成物,將該硬化性樹脂組成物熔融後利用洗鑄或轉 注成型機等使其成型,進而於80〜200°C下加熱2〜10小 時,藉此獲得本發明之硬化物。 另外,可使本發明之硬化性樹脂組成物A溶解於甲苯、 二甲苯、丙酮、曱基乙基酮、曱基異丁基酮、二曱基曱醯 33 201038549 胺、二甲基乙醯胺、N_甲基吡咯啶酮等溶劑中,製成硬化 性樹脂組成物清漆,使其含浸於玻璃纖維、碳纖維、聚酉旨 纖維、聚醯胺纖维、氧化鋁纖維、紙等基材中後加熱乾燥, 並對所獲得之預浸物進行熱壓成形,藉此製成本發明之硬 化性樹脂組成物A之硬化物。此時之溶劑通常使用於本發 明之硬化性樹脂組成物與該溶劑之混合物中占1〇〜7〇重量 /〇之里,較佳為使用占1 5〜70重量〇/0之量。另外,亦可於 維持液狀組成物之狀態下利用RTM ( Resin TransferAdekastab AO-50, Adekastab AO-60, Adekastab AO-70, Adekastab AO-80, Adekastab AO-90, Adekastab AO-330 'As a commercial product manufactured by Sumitomo Chemical Industries, Sumilizer GA-80, Sumilizer MDP -S, Sumilizer BBM-S, Sumilizer GM, Sumilizer GS (F), Sumilizer GP, etc. In addition to this, commercially available additives can be used as the anti-staining agent for the resin. For example, as a commercially available additive for Ciba Specialty Manufacturing, TINUVIN 328, TINUVIN 234, TINUVIN 326, TINUVIN 120, O TINUVIN 477, TINUVIN 479, CHIMASSO RB 2020 FDL, CHIMASSO RB FF, and the like can be cited. At least one or more selected from the group consisting of the above-mentioned bowl compound, the amine compound, and the compound are preferably contained, and the amount thereof is not particularly limited, and is in the range of 0.005 to 5.0% by weight based on the curable resin composition. The curable resin composition A of the present invention can be obtained by uniformly mixing the components. The curable resin composition A of the present invention can be easily made into a cured product by the same method as previously known. For example, it is necessary to sufficiently mix the epoxy resin of the present invention with a hardener, and optionally a hardening accelerator, a phosphorus-containing compound, a binder resin, an inorganic filler, and a compounding agent, using an extruder, a kneader, a roll, or the like. The curable resin composition is obtained uniformly, and the curable resin composition is melted, molded by a die-casting or transfer molding machine, and further heated at 80 to 200 ° C for 2 to 10 hours, thereby obtaining the present invention. Hardened matter. Further, the curable resin composition A of the present invention can be dissolved in toluene, xylene, acetone, mercaptoethyl ketone, decyl isobutyl ketone, dimercaptopurine 33 201038549 amine, dimethyl acetamide In a solvent such as N-methylpyrrolidone, a curable resin composition varnish is formed and impregnated into a substrate such as glass fiber, carbon fiber, polycrystalline fiber, polyamide fiber, alumina fiber, or paper. After heating and drying, the obtained prepreg is subjected to hot press forming, whereby a cured product of the curable resin composition A of the present invention is produced. The solvent at this time is usually used in a mixture of the curable resin composition of the present invention and the solvent in an amount of from 1 to 7 Torr/min, preferably from 15 to 70% by weight/0. In addition, you can also use RTM (Resin Transfer) while maintaining the liquid composition.

Molding,樹脂轉注成形)方式獲得含有碳纖維之環氧樹Z 硬化物。 另外,亦可將本發明之硬化性樹脂組成物A用作膜型 組成物之改質劑。具體而言,可於提昇B階段(B_stay) 中之柔勒性(Hexibinty)特性等之情形時使用。此種_ 之樹脂組成物可藉由將本發明之硬化性樹脂組成物A製成 上述硬化性樹脂組成物料並塗佈於賴4上,於加熱下 除去溶劑後’進行B階段化而作為片狀之接著劑獲得了該 片狀接著劑可用作多層基板等中之層間絕緣層。 具次,對將本發 ',y»r 丁Molding, resin transfer molding) obtained an epoxy tree Z hardened material containing carbon fibers. Further, the curable resin composition A of the present invention can also be used as a modifier for a film type composition. Specifically, it can be used when the situation of the Hexibinty characteristic in the B-stage (B_stay) is improved. The resin composition of the present invention can be formed into the above-mentioned curable resin composition material by applying the curable resin composition A of the present invention to the lanthanum 4, and after removing the solvent under heating, it is "B-staged" as a sheet. The adhesive of the form obtains the sheet-like adhesive which can be used as an interlayer insulating layer in a multilayer substrate or the like. With a second time, the pair will be ', y»r

J々曰組取视 A 體之密封材料或黏晶材料之情形進行詳細說明_ 於將本發明之硬化性樹脂组成物A用作高亮度白) 咖等光半導體之密封材料或黏晶材料之情形時,藉由为 本發明之環氧樹脂、硬化劑、 剜 偶5剤、抗氧化劑及光穩ί 月J 4添加物充分地混合而製 衣軋祕月曰組成物,然後將4 用作岔封材料、或黏晶材料鱼 4竹/、在封材料兩者。作為混合7 34 201038549 法,係使用捏合機、三輥、萬能混合機、行星式混合機、 均質混合機、均質分散機、珠磨機等於常溫或加溫下混合。 高亮度白光LED等光半導體元件通常係使用接著劑 (黏晶材料),將積層於藍寶石、尖晶石、Sic、Μ、 等基板上之 GaAs、GaP、GaA1As、GaAsP、A1(}a、Inp、GaN、 Ο ΟThe case where the sealing material or the die-bonding material of the A body is taken out by the J group is explained in detail _ the curing resin composition A of the present invention is used as a high-brightness white) sealing material or a viscous material of an optical semiconductor such as coffee In the case, the composition of the epoxy resin, the hardener, the bismuth 5 剤, the antioxidant, and the light-stable J J 4 additive of the present invention are sufficiently mixed to form a coating composition, and then 4 is used as the composition.岔 Sealing material, or viscous material fish 4 bamboo /, in the sealing material. As a method of mixing 7 34 201038549, a kneader, a three-roller, a universal mixer, a planetary mixer, a homomixer, a homodisperser, and a bead mill are used, which are mixed at room temperature or under heating. Optical semiconductor elements such as high-brightness white LEDs are usually GaAs, GaP, GaA1As, GaAsP, A1 (}a, Inp) laminated on substrates such as sapphire, spinel, Sic, germanium, etc. using an adhesive (adhesive material). , GaN, Ο Ο

InN、A1N、InGaN f之半導體晶片接著於導線架、散轨板 或封裝體上而成^ 了流通電流’亦存在連接有金屬線等 線之類型。為了使該半導體晶片不受熱或濕氣之影響且使 之發揮透鏡之功能.,而利用環氧樹脂等密封材料^其密 封。本發明之硬化性樹驗成物A可用作該密封材料或黏 晶材料。就步驟之方便性而t,較佳為將本發明之硬化性 樹脂組成物A用作黏晶材料與密封材料兩者。 作為使用本發明之硬化性樹脂組成物A將半導體晶片 接著於基板上之方法,可於利用分注、灌注、網版印;;而 塗佈本發明之硬化性樹脂組成物4後,載置半導體晶片並 進仃加熱硬化,藉此使半導體晶片接著。加熱可使用私風 循環式加熱、紅外線加熱、高頻加熱等方法。加熱條件例 如較佳為於80〜230〇c下加熱i分鐘〜24小時左右。為了 降低加熱硬化時所產生之内部應力,例如可於MM代下 預硬化30分鐘〜5小時,然後以12〇〜i8〇〇c、3〇分鐘叫〇 小時之條件進行後硬化。 作為密封材料之成形方式,可採用以下方式等:注入 方式,將如上述般固定有半導體晶片之基板插入於模框 内’於模框内注人密封材料後’進行加熱硬化來使該密 35 201038549 材料成形;壓縮成形方4 . 唯風办方式,預先於金屬模具上注入 料,將固定於基板上之半導體晶片浸潰於其十並進行力^ 硬化’《自金屬模具上脫模。作為注人方法,可列舉’、:、、 刀注、轉注成形、射出点报楚 成形等。加熱可使用熱風循環式加 ”,、、紅外線加熱、高頻加熱等方法。 加熱條件例如較佳為於8〇〜戰下加熱丨分鐘〜Μ 小時左右。為了降低加熱硬化時所產生之内部應 。可於〜聰下預硬化3〇分鐘〜5小時,然後以12〇〜18〇 C、30分鐘〜10小時之條件進行後硬化。 進而,本發明之硬化性樹脂組錢A彳用於使 樹脂等熱硬化性樹脂之-般用途,具體而言可列舉:接著 劑、塗料、塗佈劑、成形材料(包含片材、膜、FRP (Fiber …咖’纖維強化塑膠)等)、絕緣材料(包 含印刷基板、電線包覆等)、密封材料,除此以外,可列 舉添加於密封材料、基板用之氰酸酯樹脂組成物或作為光 阻劑用硬化劑之丙烯酸醋系樹脂等其他樹脂等中之添加劑 等。 作為接著劑,可列舉土木用、建築用、汽車用、一般 事務用、醫療用之接著劑’除此以外,還可列舉電子材料 用之接著劑。該等之中,作為電子材料用之接著劑,可列 舉:增層基板等多層基板之層間接著劑、黏晶劑、底部填 料等半導體用接著劑,BGA加強用底部填料、各向異性導 電膜(ACF ’ Anisotropic Conductive Film)、各向異性導電 膠(ACP,Anisotropic Conductive Paste )等封裝用接著劑 36 201038549 等。 作為密封劑,可列舉:電容器、電晶體、二極體 光二極體、IC ( Integrated Circuit,積體電路)、LSI ( Large ❹ 〇The semiconductor wafer of InN, A1N, and InGaN f is then formed on the lead frame, the loose-rail plate, or the package to form a current flowing there. There is also a type in which a metal wire is connected. In order to protect the semiconductor wafer from heat or moisture and to function as a lens, a sealing material such as an epoxy resin is used for sealing. The sclerosing tree assay A of the present invention can be used as the sealing material or the viscous material. For the convenience of the step, it is preferable to use the curable resin composition A of the present invention as both a die-bonding material and a sealing material. As a method of adhering a semiconductor wafer to a substrate using the curable resin composition A of the present invention, it is possible to apply the curable resin composition 4 of the present invention by using a dispensing, infusion, or screen printing; The semiconductor wafer is further heated and hardened, whereby the semiconductor wafer is followed. Heating can be performed by means of private air circulation heating, infrared heating, high frequency heating, and the like. The heating condition is preferably, for example, heating at 80 to 230 ° C for about 1 minute to 24 hours. In order to reduce the internal stress generated during heat hardening, for example, it can be pre-hardened in the MM generation for 30 minutes to 5 hours, and then post-hardened under conditions of 12 〇 to i8 〇〇 c and 3 〇 minutes. As a method of forming the sealing material, the substrate or the like in which the semiconductor wafer is fixed as described above may be inserted into the mold frame, and after the sealing material is injected into the mold frame, the heat is hardened to make the heat 35. 201038549 Material forming; compression forming method 4. In the wind-only method, the material is pre-filled on the metal mold, and the semiconductor wafer fixed on the substrate is immersed in the ten-layer and subjected to force hardening 'released from the metal mold. Examples of the injection method include ',:,, a knife injection, a transfer molding, and an injection point report. Heating can be performed by using hot air circulation type, ", infrared heating, high frequency heating, etc. Heating conditions are preferably, for example, heated at 8 Torr to 战 minutes to about Μ hours. To reduce the internal heat generated during heat hardening. It can be pre-hardened for 3 minutes to 5 hours under ~Cong, and then post-hardened under conditions of 12 〇 to 18 〇C, 30 minutes to 10 hours. Further, the curable resin group of the present invention is used for making Specific examples of the thermosetting resin such as a resin include an adhesive, a coating material, a coating agent, and a molding material (including a sheet, a film, FRP (Fiber), and an insulating material). (including a printed circuit board, a wire coating, etc.) and a sealing material, and other resins such as an acrylic vine resin which is added to a sealing material, a cyanate resin composition for a substrate, or a curing agent for a photoresist. Additives, etc. As an adhesive, an adhesive for civil engineering, construction, automotive, general service, and medical use can be cited, and an adhesive for electronic materials can be cited. In the above-mentioned, an adhesive for an electronic material, an interlayer adhesive for a multilayer substrate such as a build-up substrate, an adhesive for a semiconductor such as a die bond or an underfill, an underfill for BGA reinforcement, and an anisotropic conductive film. (ACF 'Anisotropic Conductive Film), an adhesive conductive adhesive (ACP, Anisotropic Conductive Paste), etc., such as adhesive tape 36 201038549. Examples of the sealant include a capacitor, a transistor, a diode photodiode, and an IC ( Integrated Circuit, LSI (Large ❹ 〇

Scale Integration,大型積體電路)等用之灌注、浸潰、轉 注成形密封’ 1C、LSI類之COB ( Chip On Board,基板覆 晶接合)、COF ( Chip 〇n Film,薄膜覆晶封裝)、TAB ( Tape Automated Bonding,捲帶自動接合)等用之灌注密封,覆 晶等用之底部填料,QFP ( Quad Flat package,四面扁平封 裝)、BGA、CSP ( Chip Size Package,晶片尺寸封裝)等 1C封裝類封裝時之密封(包含加強用底部填料)等。 將本發明之硬化性樹脂組成物A硬化而獲得的本發明 之硬化物可用於以光學零件材料為代表之各種用途。所謂 光學用材料,通常係指用於使可見光、紅外線、紫外線、X 射線、雷射等光通過該材料之用途之材料。更具體而言, 可歹j舉燈型、SMD ( surface-mount device,表面安裝設備) 型等之LpD用密封材料,除此以外還可列舉如下者:液晶 顯示器領域十之基板材料、導光板、稜鏡片、偏光板、相 位差板、視野角修正臈、接著劑、偏光元件保護膜等液晶 用膜等之液晶顯示裝置周邊材料。另彳’可列舉作為次世 代之平板顯示器而受到期待之彩& pDp(piasma此咖Scale integration, large integrated circuit), etc., perfusion, impregnation, transfer molding, sealing 1C, LSI-based COB (Chip On Board), COF (Chip 〇n Film) TAB (Tape Automated Bonding), etc., the bottom filler used for flip chip, etc., QFP (Qua Flat package, BGA, CSP (Chip Size Package)) Sealing in package-type packaging (including reinforcing underfill). The cured product of the present invention obtained by curing the curable resin composition A of the present invention can be used for various applications represented by optical component materials. The material for optics generally means a material for the purpose of passing light such as visible light, infrared rays, ultraviolet rays, X-rays, or laser light through the material. More specifically, a sealing material for LpD such as a lamp type or a SMD (surface-mount device) type may be used, and the following may be mentioned: a substrate material in the field of liquid crystal display, and a light guide plate. A material for a liquid crystal display device such as a liquid crystal film such as a film, a polarizing plate, a phase difference plate, a viewing angle correction 臈, an adhesive, or a polarizing element protective film.彳' can be cited as a next-generation flat panel display and is expected to be a color & pDp (piasma this coffee

Pane卜電漿顯示器)之密封材料、抗反射膜、光學修正膜、 外殼材料、前面玻璃之保護膜、前面玻璃替代材料、接著 ^另外可列舉LED顯不裂置所使用之咖之鑄模材料、 之密封材料、前面玻璃之保護膜、前面玻璃替代材料、 37 201038549 接著劑’另外可列舉電漿定址液晶(ΡΑΐχ,PIN· Addressed Liquid Crystal)顯示器之基板材料、導光板、棱鏡片、偏 向板、相位差板、視野角修正膜、接著劑、偏光元件保護 膜另外了列舉有機EL ( Electroluminescence,電致發光) 顯不器之别面玻璃之保護膜、前面玻璃替代材料、接著劑, 此外可列舉場發射顯示器(FED,Field Emissi〇n此叫乂) 之各種膜基板、前面玻璃之保護膜、前面玻璃替代材料、 接著劑。於光記錄領域中,可列舉VD ( vide〇 Disc,視訊 光碟)、CD ( Compact Disc ,光碟)/CD_R〇M ( c〇mpact Disc-Read Only Memory,唯讀光碟)、CD_R/RW ( c〇mpactThe sealing material, the anti-reflection film, the optical correction film, the outer casing material, the protective film of the front glass, the front glass substitute material of the Pane Bu plasma display), and the mold material of the coffee used for the LED display, Sealing material, protective film for front glass, front glass substitute material, 37 201038549 The following is also referred to as a substrate material of a PIN (Addressed Liquid Crystal) display, a light guide plate, a prism sheet, a deflecting plate, The retardation film, the viewing angle correction film, the adhesive, and the polarizing element protective film include a protective film for a glass of an organic EL (electroluminescence) display, a front glass substitute material, and an adhesive. A variety of film substrates for field emission displays (FED, Field Emissi〇n), front glass protective films, front glass replacement materials, and follow-up agents. In the field of optical recording, VD (Vide〇Disc, CD), CD (Compact Disc), CD_R〇M (c〇mpact Disc-Read Only Memory), CD_R/RW (c〇) Mpact

DiSC-Recordable/ReWritable,可錄式/可重寫光碟)、dvD-R (Digital Versatile Disc-Recordable,可錄一次式數位化多 功能光碟)/DVD-RAM ( Digital Versatile Disc Rand〇m Access Memory’重複讀寫數位多功能光碟)、M〇(Magnet〇 Optica卜磁光碟)/MD ( Mini Disc,迷你磁碟)、pD (沖㈣ change disc’相變化光碟)、光學記憶卡用之碟片基板材料、 光碟機讀取頭、保護膜、密封材料、接著劑等。 於光學機器領域中,可列舉:靜物攝影機(stiUcamera) 之鏡頭用材料、取景器稜鏡、目標稜鏡(Urget pdsm)、 取景器蓋、受光感測器部。另外’可列舉視訊攝影機之攝 影鏡頭、取景器。另外’可列舉投影電視之投射透鏡、保 護膜、密封材料、接著劑等。另夕卜,可列舉光感測機器之 透鏡用材料、密封材料、接著劑、膜等。於光學零件領域 中,可列舉光通訊系.统中之光開關周邊之纖維材料、透鏡、 38 201038549 導波管 '元件之密封材料、接著劑等。另彳,可列舉光連 接器周邊之光纖材料、套圈、密封材料、接著劑等。於光 被動零件、光電路零❹,可列舉透鏡、導波管、LED之 费封材料、CCD ( Charge CQUpIed DeWee,電㈣合元件) 之密封材料、接著劑等。另外,可列舉光電積體電路(〇eic, 〇Pt〇eleCtr〇niC integrated Clrcuit)周邊之基板材料纖維材 料、元件之密封材料、接著劑等。於光纖領域中,可列舉DiSC-Recordable/ReWritable, recordable/rewritable disc), dvD-R (Digital Versatile Disc-Recordable, recordable digital versatile disc)/DVD-RAM (Digital Versatile Disc Rand〇m Access Memory' Repeated reading and writing of digital versatile discs, M〇 (Magnet〇Optica), MD (Mini Disc), pD (change) disc, optical discs for optical memory cards Materials, optical disk read heads, protective films, sealing materials, adhesives, etc. In the field of optical machines, a lens material for a still camera (stiUcamera), a viewfinder 稜鏡, a target 稜鏡 (Urget pdsm), a viewfinder cover, and a light receiving sensor unit are exemplified. In addition, a video camera and a viewfinder of a video camera can be cited. Further, a projection lens, a protective film, a sealing material, an adhesive, and the like of a projection television can be cited. Further, examples thereof include a material for a lens of a light sensing device, a sealing material, an adhesive, a film, and the like. In the field of optical parts, the fiber material around the optical switch in the optical communication system, the lens, the 38 201038549 waveguide tube, the sealing material of the element, and the adhesive are listed. Other examples include optical fiber materials, ferrules, sealing materials, and adhesives around the optical connector. Yu Guang Passive parts and optical circuit zeros include lenses, waveguides, LED sealing materials, CCD (Charge CQUpIed DeWee), sealing materials, and adhesives. Further, examples thereof include a substrate material fiber material around a photovoltaic integrated circuit (〇eic, 〇Pt〇eleCtr〇niC integrated Clrcuit), a sealing material for an element, an adhesive, and the like. In the field of optical fiber, it can be enumerated

裝掷顯示器用照明/光導等、工業用途之感測器類、顯示/ 標識類等,另夕卜,可列舉通訊基礎架構(—η-· 牆_UetUre 及家庭内之數位機器連接用之㈣。於半 導體積體電路周邊材料中,可列舉⑶、超⑶材料用之顯 微姓刻術(Micr〇mhography )収光阻材料。於汽車、運 輸機領域中,彳列舉汽車用之燈管反射罩、軸承護圈 (beanng她而)、齒輪部分、耐餘塗層、開關部分、頭 燈、引擎内零件、電氣零件、各種内外裝飾品、驅動引擎、 製動器油箱(brake oil tank )、汽車用防鏽鋼板、内部面板 (interior panel )、内部裝飾材料、保護/捆紮用線束、燃 料軟管、汽車燈、玻璃替代品。另外,可列舉鐵道車輛用 之多層玻璃。另外’可列舉飛機之結構材料之勒性賦予劑、 引擎周邊構件、保護/捆紮用線束、耐❹層。於建築項域 中,可列舉内部裝飾/加工用材料、電子罩、片材、玻璃中 間膜、玻璃替代品、太陽電池周邊材料。於農業用途中, 了列舉房屋包覆用冑。作為次世代之光電功能有機材料, 可列舉有機EL元件周邊材料、有機光折射元件、作為光- 39 201038549 光轉換裝置之光放大元件、光運算元件、有機太陽電池周 邊之基板材料、纖維材料、元件之密封材料、接著劑等。 硬化性樹脂組成物B (利用酸性硬化觸媒之陽離子硬 化) 利用酸性硬化觸媒而硬化的本發明之硬化性樹脂組成 物B含有光聚合起始劑或熱聚合起始劑作為酸性硬化觸 媒。進而,亦可含有稀釋劑、聚合性單體、聚合性寡聚物、 聚合起始助劑、光敏劑等各種公知之化合物、材料等。另 外,視需要亦可含有無機填充劑、著色顏料、紫外線吸收 劑、抗氧化劑、穩定劑等各種公知之添加劑。 作為酸性硬化觸媒,較佳為陽離子聚合起始劑,特佳 為光陽離子聚合起始劑。作為陽離子聚合起始劑,可列舉 含有錤鹽、銃鹽、重氮鏽鹽等鑌鹽者,該等可單獨使用或 使用兩種以上。 活性能量線陽離子聚合起始劑之例可列舉:氟硼酸金 屬錯鹽及三氟化硼錯合化合物(美國專利第3379653號)、 雙(全氟烷基磺醯基)甲烷金屬鹽(美國專利第3586616 號)、芳基重氮鏽化合物(美國專利第37〇8296號)'Vh 族元素之芳香族鑌鹽(美國專利第4〇584〇〇號)、Va族元 素之芳香族鑌鹽(美國專利第4〇69〇55號)、nia〜族元 素之二羰基螯合物(美國專利第4〇68〇91號)、硫代吡喃 钂鹽(美國專利第4139655號)、MF〆陰離子形態之 族元素(美國專利第4161478號;M係選自磷、銻及砷)、 芳基疏錯鹽(美國專利帛4231951號)、芳香族鎭錯鹽及 201038549 芳香族錆錯鹽(美國專利第4256828號)、以及雙[4_(二苯 基錡基)本基]硫驗-雙-六氟金屬鹽(j〇urnal polymerLighting, light guides for display, display sensors, display/identification for industrial use, etc. In addition, the communication infrastructure (—η-· wall _UetUre and digital machine connection in the home (4) Among the materials surrounding the semiconductor integrated circuit, there are (3) and super (3) materials for the use of Micr〇mhography to receive photo-resistance materials. In the field of automobiles and transporters, the lamp reflectors for automobiles are listed. , bearing retainer (beanng), gear parts, residual coating, switch parts, headlights, engine parts, electrical parts, various interior and exterior decorations, drive engines, brake oil tanks, cars A rust-proof steel plate, an interior panel, an interior material, a wire harness for protection/bundling, a fuel hose, an automobile lamp, and a glass substitute. A multilayer glass for a railway vehicle is also exemplified. The anchoring agent for the structural material, the engine peripheral member, the harness for protection/bundling, and the enamel-resistant layer. In the construction field, the interior decoration/processing material, the electronic cover, and the sheet can be cited. A glass interlayer film, a glass substitute, and a solar cell peripheral material. In the agricultural use, a ruthenium for house coating is exemplified. As a next-generation photoelectric functional organic material, an organic EL element peripheral material, an organic light refracting element, and light can be cited. - 39 201038549 Optical amplifying elements, optical computing elements, substrate materials around organic solar cells, fiber materials, sealing materials for components, adhesives, etc. Curable resin composition B (cation hardening with acidic curing catalyst) The curable resin composition B of the present invention which is cured by an acidic curing catalyst contains a photopolymerization initiator or a thermal polymerization initiator as an acid curing catalyst. Further, it may contain a diluent, a polymerizable monomer, and polymerization. Various known compounds, materials, and the like, such as an oligomer, a polymerization initiator, and a photosensitizer. Further, various known additives such as an inorganic filler, a coloring pigment, an ultraviolet absorber, an antioxidant, and a stabilizer may be contained as needed. As the acid hardening catalyst, a cationic polymerization initiator is preferred, and photocationic polymerization is particularly preferred. Examples of the cationic polymerization initiator include sulfonium salts such as sulfonium salts, phosphonium salts, and diazonium rust salts, and these may be used alone or in combination of two or more. Examples of active energy cation polymerization initiators may be used. Listed: metal fluoroborate stearate and boron trifluoride compound (U.S. Patent No. 3,375,653), bis(perfluoroalkylsulfonyl)methane metal salt (U.S. Patent No. 3,586,616), aryldiazonium rust compound (US Patent No. 37〇8296) 'Aromatic sulfonium salt of the Vh group element (U.S. Patent No. 4,584, )), aromatic sulfonium salt of the Va group element (US Patent No. 4〇69〇55), a carbonyl group of a nia~ group element (U.S. Patent No. 4,68,91), a thiopyranium salt (U.S. Patent No. 4,139,655), a group element of an MF〆 anion form (U.S. Patent No. 4,161,478; M series is selected from the group consisting of phosphorus, antimony and arsenic), aryl mis-salt salts (U.S. Patent No. 4,231,951), aromatic salts and 201038549 aromatic salts (US Patent No. 4256828), and double [4_(two) Phenyl fluorenyl) thiol-bis-hexafluorometal salt urnal polymer

Science,P〇lymer chemistry ’ 第 2 卷,1789 項(1984 年))。 除此以外,亦可使用鐵化合物之混合配位基金屬鹽及碎烧 醇-鋁錯合物。 另外,作為具體例’可列舉:「Adeka Optomer SP1 50」、 「Adeka Optomer SP170」(均為旭電化工業公司製造), 「UVE-1014」(General Electronics 公司製造),「CD-1012」 ^ (Sartomer 公司製造)’ 「RP-2074」 (Rhodia 公司製造) 等。 該陽離子聚合起始劑之使用量較佳為相對於環氧樹脂 成分100質量份為〇.01〜50質量份,更佳為〇丨〜1〇質量 份。 進而’可將該等光陽離子聚合起始劑與公知之聚合起 始助劑及光敏劑之一種或兩種以上同時使用。作為聚合起 ❹始助劑之例,例如可列舉:安息香、苯偶醯、安息香甲醚、 安息香異丙醚、苯乙嗣、2,2-二甲氧基-2-苯基苯乙酮、1,卜 二氯苯乙酮、1-羥基環己基苯基酮、2_曱基_丨_(4_曱基硫代 本基)-2-嗎琳基丙烧-i_酮、n,N-二曱基胺基苯乙酮、2 -甲基 蒽醌、2-乙基蒽醌、2-第三丁基蒽醌、丨_氣蒽醌、2_戊基蒽 酿、2-異丙基噻噸酮、2,4_二曱基噻噸酮、2,4_二乙基噻嘲 酮、2,4-二異丙基噻噸_、苯乙酮二甲縮酮、二苯曱酮、4_ 甲基一笨曱酮、4,4·-二氯二苯曱酮、4,4'-雙二乙基胺基二苯 甲酿1、米其勒酮等光自由基聚合起始劑。光自由基聚合起 41 201038549 始劑等聚合起始助劑之使用量相對於可進行光自由基聚合 之成分100重量份為0·01〜30重量份,較佳為〇1〜1〇重 量份。 作為光敏劑之具體例,可列舉:蒽、2_異丙基噻噸酮、 2,4-二甲基噻噸酮、2,4_二乙基噻噸酮、2,4二異丙基噻噸 酮、吖啶橙、吖啶黃、膦R、苯并黃素、硫代黃素、茈、 N,N-二甲基胺基苯甲酸乙酯、N,N_:甲基胺基苯甲酸異戊 酉曰一乙醇胺、二乙胺等。光敏劑之使用量係相對於全部 環氧樹脂成分100重量份為0 01〜30重量份,較佳為〇3 〜10重量份。 進而,可視需要對本發明之硬化性樹脂組成物B中添 加無機填充劑或矽烷偶合劑、脫模劑、顏料等各種配合劑, 以及各種熱硬化性樹脂。具體之例如上所述。 本發明之硬化性樹脂組成物B可藉由均勻地混合各成 分而獲得。另外,亦可將各成分溶解於聚乙二醇單乙醚或 %己酮、r -丁内酯等有機溶劑中混合均勻後,藉由乾燥而 除去溶劑來使用。此時之溶劑通常使用於本發明之硬化性 樹脂組成物B與該溶劑之混合物中占1〇〜7〇重量%之量, 較佳為使以15〜70重量%之量。本發明之硬化性樹脂組 成物B可藉由紫外線照射而硬化,但其紫外線照射量取決 於硬化性樹脂組成物之組成而不同’因此須根據各硬化條 件來決定其紫外線照射量。只要是可將硬化性樹脂組成物 硬化之照射量即可,且只要滿足硬化物之接著強度良好這 -硬化條件即可。於此硬化時,由於需要光透射至細部, 42 201038549 * 因此較理想的是本發明之環氧樹脂及硬化性樹脂組成物b 之透明性較高。另外,對該等環氧樹脂系進行光硬化時, 僅藉由光照射難以使之完全硬化,因此於要求耐熱性之用 途中,需要於光照射後進行加熱,藉此使反應硬化完全地 完成。 於光照射後進行加熱之情形時,可於通常之硬化性樹 脂組成物B之硬化溫度區域進行加熱。例如較合適的是常 溫〜150。(:下、30分鐘〜7日之範圍。^然會根據硬化性樹 〇 脂組成物B之組成之不同而變化,但越是為特別高之溫度 區域,對於促進光照射後之硬化越有效,且短時間之熱處 理就會有效果。另外,越是低溫則需要越長時間之熱處理。 藉由如此之熱後硬化,亦會顯現出進行老化處理之效果。 另外,使該等硬化性樹脂組成物B硬化而獲得之硬化 物之形狀亦可根據用途而採用各種形狀,因此並無特別限 定’例如亦可形成為膜狀、片狀、塊狀等形狀。成形方法 〇 根據所對應之部位、構件而不同,例如可應用:鑄造法、 澆铸法、網版印刷法、旋塗法、噴霧法、轉印法、分注方 式等成形方法,但並不限定於該等。成形模具可應用:研 磨玻璃、硬質不鏽鋼研磨板、聚碳酸酯板、聚對苯二甲酸 乙二酯板、聚甲基丙烯酸甲酯板等。另外,為了提昇與成 形模具之脫模性,可應用:聚對苯二曱酸乙二酯膜、聚碳 酸酯膜、聚氣乙烯膜、聚乙烯膜 '聚四氟乙烯膜、聚丙烯 膜、聚醯亞胺膜等。 例如當用作陽離子硬化性之光阻劑時,首先,利用網 43 201038549 版印刷、旋塗法等方法,將溶解於聚乙二醇單乙醚或環己 酮、或者τ-丁内酯等有機溶劑申的本發明之光陽離子型硬 化性樹脂組成物B以5〜160 的膜厚塗佈於覆銅積層 板、陶瓷基板或玻璃基板等基板上而形成塗膜。其次,將 該塗膜於60〜1HTC下預乾燥後,通過描繪有所需之圖案之 底片照射紫外、線(例如低屬水銀燈、高Μ水銀燈、超高麼 水銀燈、氙氣燈 '雷射光等),繼而於7〇〜12〇。(:下進行曝 光後烘烤處理。其後,聚乙二醇單乙醚等溶劑將未曝 光部分溶解除去(顯影)後,視需要進而藉由紫外線之照 射及/或加熱(例如於1〇〇〜2〇〇t下加熱〇5〜3小時)進行 充分之硬化而獲得硬化物。亦可以如此之方式獲得印刷電 路板。 將本發明之硬化性樹脂組成物B硬化而獲得之硬化物 可用於以光學零件材料為代表之各種用途。所謂光學用材 科’通常係指用於使可見光、紅外線、紫外線、X射線、雷 射等光通過該材料之用途之材料。更具體而言可列舉燈 LSMD型等之LED用密封材料’除此以外可列舉如下者。 即.液晶顯示器領域中之基板材料 光板、相位差板、視野角修正先板、稜鏡片、偏 腔望m MG正膜、接著劑、偏光元件保護 膜4液日日用膜等之液晶顯示裝 n遗材枓。另外’可列舉 乍為-人世代之平板顯示器受 千哭)夕〜, 又j期待之彩色PDP (電漿顯 不斋)之猎封材料、抗反射膜、 ^ ^ _ 先學修正膜、外殼材料、 則面玻璃之保護膜、前面玻 .,,m τ ②代材枓、接著劑,另外可Science, P〇lymer chemistry ‘Vol. 2, 1789 (1984)). In addition to this, a mixed ligand metal salt of an iron compound and a calcined alcohol-aluminum complex may also be used. In addition, as a specific example, "Adeka Optomer SP1 50" and "Adeka Optomer SP170" (all manufactured by Asahi Denki Kogyo Co., Ltd.), "UVE-1014" (manufactured by General Electronics Co., Ltd.), "CD-1012" ^ ( "RP-2074" (manufactured by Rhodia Co., Ltd.) manufactured by Sartomer. The amount of the cationic polymerization initiator to be used is preferably from 0.01 to 50 parts by mass, more preferably from 1 to 10 parts by mass, per 100 parts by mass of the epoxy resin component. Further, the photocationic polymerization initiator may be used together with one or more of a known polymerization initiator and a photosensitizer. Examples of the polymerization initiation aid include benzoin, benzoin, benzoin methyl ether, benzoin isopropyl ether, phenelzine, 2,2-dimethoxy-2-phenylacetophenone, 1, dichloroacetophenone, 1-hydroxycyclohexyl phenyl ketone, 2 曱 丨 丨 ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( N-didecylamino acetophenone, 2-methyl hydrazine, 2-ethyl hydrazine, 2-tert-butyl fluorene, 丨 蒽醌 gas, 2 pentyl broth, 2-iso Propyl thioxanthone, 2,4-dimercaptothioxanthone, 2,4-diethylthioketidone, 2,4-diisopropylthioxanthene, acetophenone dimethyl ketal, diphenyl Photoinitial polymerization of anthrone, 4_methyl- aconone, 4,4·-dichlorodibenzophenone, 4,4′-bisdiethylaminobiphenyl, 1 and rice ketone Starting agent. The photoradical polymerization is used in an amount of from 0.01 to 30 parts by weight, preferably from 1 to 1 part by weight, based on 100 parts by weight of the component capable of photoradical polymerization. . Specific examples of the photosensitizer include hydrazine, 2-isopropylthioxanthone, 2,4-dimethylthioxanthone, 2,4-diethylthioxanthone, and 2,4 diisopropyl. Thioxanthone, acridine orange, acridine yellow, phosphine R, benzoflavin, thioflavin, hydrazine, ethyl N,N-dimethylaminobenzoate, N,N_: methylaminobenzene Isovaleric acid monoethanolamine, diethylamine, and the like. The photosensitizer is used in an amount of from 0 to 10 parts by weight, preferably from 3 to 10 parts by weight, based on 100 parts by weight of the total of the epoxy resin component. Further, various additives such as an inorganic filler, a decane coupling agent, a release agent, and a pigment, and various thermosetting resins may be added to the curable resin composition B of the present invention as needed. Specifically, for example, as described above. The curable resin composition B of the present invention can be obtained by uniformly mixing the components. Further, each component may be dissolved in polyethylene glycol monoethyl ether or an organic solvent such as % ketone or r-butyrolactone to be uniformly mixed, and then the solvent is removed by drying to be used. The solvent at this time is usually used in an amount of from 1 to 7 % by weight, preferably from 15 to 70% by weight, based on the mixture of the curable resin composition B of the present invention and the solvent. The curable resin composition B of the present invention can be cured by ultraviolet irradiation, but the amount of ultraviolet irradiation varies depending on the composition of the curable resin composition. Therefore, the amount of ultraviolet irradiation must be determined according to each curing condition. The irradiation amount may be sufficient to cure the curable resin composition, and the curing condition may be sufficient as long as the adhesive strength of the cured product is good. At the time of hardening, since light is required to be transmitted to the detail, 42 201038549 * Therefore, it is preferable that the epoxy resin of the present invention and the curable resin composition b have high transparency. Further, when the epoxy resin is photocured, it is difficult to completely cure only by light irradiation. Therefore, in applications requiring heat resistance, it is necessary to heat after light irradiation, thereby completely completing the reaction hardening. . When heating is performed after light irradiation, heating can be performed in the hardening temperature region of the usual curable resin composition B. For example, it is more suitable to be normal temperature ~ 150. (: the range of 30 minutes to 7 days. ^ will vary depending on the composition of the sclerosing tree blush composition B, but the more high temperature region, the more effective it is to promote hardening after light irradiation. Moreover, the heat treatment for a short period of time has an effect. In addition, the lower the temperature, the longer the heat treatment is required. By such heat-hardening, the effect of the aging treatment is also exhibited. The shape of the cured product obtained by curing the composition B may be various shapes depending on the application, and therefore, it is not particularly limited. For example, it may be formed into a film shape, a sheet shape, a block shape, or the like. The molding method is based on the corresponding portion. Different from the member, for example, a molding method such as a casting method, a casting method, a screen printing method, a spin coating method, a spray method, a transfer method, or a dispensing method can be applied, but the molding method is not limited thereto. Applications: ground glass, hard stainless steel grinding plates, polycarbonate sheets, polyethylene terephthalate sheets, polymethyl methacrylate sheets, etc. In addition, in order to improve the release property from the forming mold, Applicable to: polyethylene terephthalate film, polycarbonate film, polyethylene film, polyethylene film 'polytetrafluoroethylene film, polypropylene film, polyimide film, etc.. For example, when used as a cation In the case of a curable photoresist, first, the present invention is dissolved in an organic solvent such as polyethylene glycol monoethyl ether or cyclohexanone or τ-butyrolactone by a method such as printing or spin coating. The photo-cationic curable resin composition B is applied to a substrate such as a copper clad laminate, a ceramic substrate or a glass substrate at a film thickness of 5 to 160 to form a coating film. Next, the coating film is preliminarily prepared at 60 to 1 HTC. After drying, irradiate ultraviolet rays and wires through a negative film depicting a desired pattern (for example, a low mercury lamp, a sorghum mercury lamp, a super high mercury lamp, a xenon lamp, a laser light, etc.), followed by 7 〇 to 12 〇. After the exposure baking treatment, the unexposed portion is dissolved (developed) by a solvent such as polyethylene glycol monoethyl ether, and then irradiated with ultraviolet rays and/or heated as needed (for example, at 1 〇〇 2 〇 〇t under heating for 5~3 hours) to make it hard enough A cured circuit board can be obtained. The printed circuit board can also be obtained in such a manner. The cured product obtained by hardening the curable resin composition B of the present invention can be used for various purposes represented by optical component materials. The material used for the purpose of passing light such as visible light, infrared rays, ultraviolet rays, X-rays, and laser light through the material. More specifically, a sealing material for LEDs such as a lamp LSMD type can be cited as follows. That is, a liquid crystal display device such as a substrate material light plate, a phase difference plate, a viewing angle correction first plate, a cymbal sheet, a partial cavity m MG positive film, an adhesive, a polarizing element protective film, a liquid daily film, and the like in the field of liquid crystal display nRemaining materials. In addition, 'can be cited as a flat-panel display for people generations to be crying" 夕~, and j expecting color PDP (plasma display not fast) hunting material, anti-reflection film, ^ ^ _ first Learn to modify the film, the outer shell material, the protective film of the face glass, the front glass, the m τ 2 substitute, the adhesive, and

列舉LED—裝置所使帛之LE <罈Μ材料、led之密封 44 201038549 材料、前面玻璃之保護膜、前面玻璃替代材料、接著劑, 另外可列舉電漿定址液晶(PALC )顯示器之基板材料、導 光板、稜鏡片、偏向板、相位差板、視野角修正膜、接著 劑、偏光元件保護膜’另外可列舉有機EL (電致發光)顯 示益之前面玻璃之保護膜、前面玻璃替代材料、接著劑, 此外可列舉場發射顯示器(fed )之各種膜基板、前面玻璃 之保護膜、前面玻璃替代材料、接著劑。於光記錄領域中, 可列舉 VD (視訊光碟)、CD/CD_R〇M、CD_R/RW、 〇 DVD_R/DVD-RAM、M〇/MD、PD (相變化光碟)、光學記 憶卡用之碟片基板材料、光碟機讀取頭、保護膜、密封材 料、接著劑等。 靜物攝影機之鏡頭用材 於光學機器領域中 料、取景器稜鏡、目標棱鏡、取景器蓋、受光感測器部。 另外,可列舉視訊攝影機之攝影鏡頭、取景器。另外,可 列舉投影電視之投射透鏡、保護膜、密封材料、接著劑等。 〇另外,可列舉光感測機器之透鏡用材料、密封材料、接著 二=。於光學零件領域中,可列舉光通訊系統中之光 =關周邊之纖維㈣、透鏡、導波管、元件之密封材料、 密=,劑可_連_邊之光纖材料、套圈、 二Γ纖=料可列:光電積體電路周邊之基 領域中,可列舉裝_=封材料、接著劑等。於光纖 裝傅顯…照明/光導等、工業用途之感 45 201038549 測器類'顯不/標識類等,另外,可列舉通訊基礎 家庭内之數位機器連接用之光纖。於半 電 可,舉-、超LSI材料用之繼刻術用= ;'•於’飞車、運輸機領域中,可列舉汽車用之燈管反 罩、軸承護圈、齒輪部分、耐蝕塗層、開關部分、頭严: 引Γ内:件、'電氣零件、各種内外裝飾品、驅動引擎、製 動盗油相”' 車用防鏽鋼板、内部面板、内部裝飾材料' 保護/捆紮用線束、燃料軟管、汽車燈、玻璃替代品。另外, 可列舉鐵道車輛用之多層破 材料之物性賦予劑、引擎2_另外’可列舉飛機之結構 子罩、片絲内部裝加工用材料、電 料W 璃中間臈、玻璃替代品、太陽電池周邊材 2於農業用途中’可列舉房屋包覆用膜。作為次世代之 2功能有機材料’可列舉有機EL元件周邊材料'有機光 作為光-光轉換裝置之光放大元件、光運算元件、 =機:%電池周邊之基板材料、纖維材料、元件之密封材 枓、接著劑等。 π j何 :為密封劑,可列舉:電容器、電晶體、二極體、發 光一極體、1C、LSI等用之、、兹.士 ⑶類之⑽、⑶F、TAB等用、浸潰、轉注成形密封〜、 部填料,BWwd之灌注密封,覆晶等用之底 部填料)冑。 封裝類封裝時之密封(加強用底 組成物t光^材料之其他用途’可列舉使用硬化性樹脂 ' 之一般用途,例如可列舉接著劑、塗料、塗佈劑、 46 201038549 成形材料(包含片材、膜、 基板、電線包覆蓉、1 等)、絕緣材料(包含印刷 、、良匕覆4 ) 1封材料,除此以外可 其他樹脂等中之添加 ’、、、 削寻作為接者劑,可列舉土木用、 建桌用、汽車用、一般事務 %潦用之接者劑,除此以 卜可列舉電子材料用 仗在w 政等之中,作為電子材料 用之接著劑,可列舉:增層基板等多層基板之層間接著劑、 黏晶劑、底部填料等半導體用接著劑,職加強用底部填 ❹ 枓、各向異性導電膜(ACF)、各向異性導電膠(ACp)等 封裝用接著劑等。 [實施例] 其次,藉由 只要無特別說明 於該專實施例。 實施例更具體地說明本發明,以下記載中 ,則份為重量份。再者,本發明並不限定 另外’於實施例中,環氧當量係依據JIS κ-7236進行 測定’此外’黏度係於251下使用E型黏度計進行測定。 另外’作為氣相層析法(以下稱為r Gc ( GasListed as LED device, LE <tank material, led seal 44 201038549 material, front glass protective film, front glass substitute material, adhesive, and substrate material of plasma addressed liquid crystal (PALC) display , light guide plate, cymbal sheet, deflecting plate, phase difference plate, viewing angle correction film, adhesive, polarizing element protective film 'Alternatively, organic EL (electroluminescence) shows the protective film of the front glass, front glass substitute material Further, examples of the adhesive include a film substrate of a field emission display (fed), a protective film for the front glass, a front glass substitute material, and an adhesive. In the field of optical recording, VD (Video Disc), CD/CD_R〇M, CD_R/RW, 〇DVD_R/DVD-RAM, M〇/MD, PD (phase change disc), and optical memory card discs can be cited. Substrate material, optical disk drive head, protective film, sealing material, adhesive, and the like. The lens of the still-life camera is used in the field of optical equipment, material, viewfinder, target prism, viewfinder cover, and light-receiving sensor. In addition, a photographic lens and a viewfinder of a video camera can be cited. Further, a projection lens, a protective film, a sealing material, an adhesive, and the like of a projection television can be cited. Further, a material for a lens of a photo-sensing device, a sealing material, and the like can be cited. In the field of optical parts, the light in the optical communication system = the fiber around the periphery (four), the lens, the waveguide, the sealing material of the component, the denseness, the optical fiber material of the agent, the ferrule, the ferrule Fibre = material can be listed: In the field of the periphery of the optoelectronic integrated circuit, a sealing material, an adhesive, and the like can be cited. In the case of optical fiber, it is used for illumination, light guide, etc., for industrial use. 45 201038549 Detector class 'displayed/identified class, etc. In addition, the fiber for digital device connection in the home of communication is listed. In semi-electrical, lifting-, super-LSI materials for the following engraving =; '• in the field of 'flying vehicles, transport aircraft, can be cited for automotive lamp cover, bearing retainer, gear parts, corrosion resistant coating , switch part, head strict: inside the lead: parts, 'electric parts, various interior and exterior decorations, drive engine, brake stolen oil phase' 'vehicle rust-proof steel plate, interior panel, interior decoration material' protection / strapping harness In addition, the fuel hose, the automobile lamp, and the glass substitute, and the physical property imparting agent for the multi-layered material for the railway vehicle, and the engine 2_in addition, may include the structural sub-cover of the aircraft, the material for processing the inner wire, and the electric material. In the case of agricultural use, the glass intermediate material, the glass substitute, and the solar cell peripheral material 2 can be cited as a film for house coating. As a second-generation functional organic material, the organic EL element peripheral material 'organic light is used as light- Optical amplifying element, optical arithmetic element, and machine of the optical conversion device: substrate material around the battery, fiber material, sealing material of the element, adhesive, etc. π j Ho: for the sealant, a capacitor, a crystal , diodes, light-emitting diodes, 1C, LSI, etc., used in (3), (3), (3) F, TAB, etc., impregnation, transfer molding, sealing, part filling, BWwd perfusion sealing, flip chip The underfill is used in the case of the package. The sealing for the package type (the other use of the reinforcing bottom composition t-light material) may be a general use of a curable resin, and examples thereof include an adhesive, a coating, and a coating agent. 46 201038549 Forming materials (including sheets, films, substrates, wire-clad, 1st, etc.), insulating materials (including printing, and good-covering 4) 1 material, in addition to other resins, etc.' ,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,, Examples of the adhesive for the electronic material include an interlayer adhesive for a multilayer substrate such as a build-up substrate, an adhesive for a semiconductor such as a die bond or an underfill, and an underfill 枓, an anisotropic conductive film (ACF), Anisotropic conductive adhesive (ACp) The adhesive for encapsulation, etc. [Examples] Next, unless otherwise specified, the specific examples are given. The present invention will be more specifically described. In the following description, the parts are parts by weight. In the examples, the epoxy equivalent is measured in accordance with JIS κ-7236, and the viscosity is measured at 251 using an E-type viscometer. In addition, 'as a gas chromatography method (hereinafter referred to as r Gc ( Gas

Chromatography )」)中之分析條件,係使用HP5-MS ( 0.25 mm I. D. xl5 m,臈厚為0.25 /zm)作為分離管柱,將管 柱烘箱溫度之初始溫度設定為1 〇〇,以每分鐘15艽之速 度升溫並於300°C下保持60分鐘。另外,使用氦氣作為載 氣。進而,凝膠滲透層析法(以下稱為「GPC( Gel Permeation Chromatography)」)之測定如下所述。管柱係將shodex SYSTEM-21 管柱(KF-803L、KF-802.5 ( x2 根)、KF-802 ) 連結’溶析液使用四氫咳喃,流速為1 ml/min,管柱溫度為 47 201038549 40°C,並且檢測係利用UV ( 254 nm)進行,校準曲線係使 用Shodex製造之標準聚苯乙烯。 實施例1 於具備攪拌機、回流冷卻管、攪拌裝置、丁史塔克 (Dean-Stark )管之燒瓶中,一面實施氮氣沖洗一面添加曱 苯150份、下述式(5)The analytical conditions in Chromatography)") were HP5-MS (0.25 mm ID xl5 m, thickness 0.25 /zm) as the separation column, and the initial temperature of the column oven temperature was set to 1 〇〇, per minute. The temperature was raised at 15 ° C and maintained at 300 ° C for 60 minutes. In addition, helium gas is used as a carrier gas. Further, the measurement of gel permeation chromatography (hereinafter referred to as "GPC (Gel Permeation Chromatography)") is as follows. The column is connected to the shodex SYSTEM-21 column (KF-803L, KF-802.5 (x2 root), KF-802). The solution is tetrahydrogen cough, the flow rate is 1 ml/min, and the column temperature is 47. 201038549 40 ° C, and the detection system was carried out using UV (254 nm), and the calibration curve was made using standard polystyrene manufactured by Shodex. Example 1 In a flask equipped with a stirrer, a reflux cooling tube, a stirring device, and a Dean-Stark tube, 150 parts of benzene was added while performing nitrogen purge, and the following formula (5) was used.

HaCHOH2CHaCHOH2C

(6)

(根據日本專利特開2007_126447號公報製造,GPC 面積99%(檢測器RI) ) 1〇9份、3_環己烯曱酸126份、 對曱笨尹'酸2伤’於力口熱回流下一面去除水一面反應1 〇小 時。反應結束後,利用1〇重量%碳酸氫鈉水溶液%份水洗 2人進而利用水50份將所獲得之有機層水洗2次後,利 用k轉蒸發H濃縮有機溶劑,藉此獲得本發明之二稀化合 物(D-l) 20Q , 广 物。確認到該二烯化合物之形狀為液狀,利 ^、層析法所測定之純度為96%,利用凝膠滲透層析法 ' 析之、,。果,其純度> 98%。黏度為2070 mPa . s ( 25 °C下,E型黏度計)。 實施例2 於具備攪拌機、回流冷卻管、攪拌裝置之燒瓶中,一 48 201038549 面實施氮氣沖洗一面添加水15份、12-鎢磷酸0.95份、磷 酸氫二鈉0·78份’二(氫化牛脂烧基)二甲基乙酸敍2.7份 (Lion Akzo 製造之 50% 己貌溶液,Arquad 2HT-Acetate ), 生成鶴酸系觸媒後,添加甲苯12〇份及1〇9份之實施例1 中所獲得之二烯化合物D-1,進而再次攪拌,藉此製成乳液 狀態之溶液。將該溶液升溫至5〇t,一面劇烈攪拌一面添 加35重置%過氧化氫水55份,然後直接於5〇它下攪拌u Ο(Manufactured according to Japanese Patent Laid-Open Publication No. 2007-126447, GPC area 99% (detector RI)) 1〇9 parts, 126 parts of 3-cyclohexene decanoic acid, and 曱 尹 尹 ''acid 2 injury' in heat transfer The next side removes water and reacts for 1 hour. After completion of the reaction, the organic layer was washed twice with water in an amount of 1% by weight of aqueous sodium hydrogen carbonate solution, and the obtained organic layer was washed twice with water, and then the organic solvent was concentrated by k-transvaporation H to obtain the second invention. Dilute compound (Dl) 20Q, wide object. It was confirmed that the shape of the diene compound was liquid, and the purity measured by the chromatographic method was 96%, which was analyzed by gel permeation chromatography. Fruit, its purity > 98%. The viscosity is 2070 mPa . s (E-type viscometer at 25 °C). Example 2 In a flask equipped with a stirrer, a reflux cooling tube, and a stirring device, a 48, 2010, 385, 490 surface was subjected to a nitrogen purge, and 15 parts of water, 0.95 parts of 12-tungstophosphoric acid, and 0.78 parts of 'dihydrogenated tallow were added. 2.7 parts of dimethyl acetate (50% of the solution made by Lion Akzo, Arquad 2HT-Acetate), after the formation of the tartaric acid catalyst, 12 parts of toluene and 1 〇9 parts were added in Example 1 The obtained diene compound D-1 was further stirred again to thereby prepare a solution in an emulsion state. The solution was warmed to 5 Torr, and 35 parts of hydrogen peroxide water was added for 35 parts while stirring vigorously, and then the mixture was stirred directly under 5 Torr.

小時。藉由GC確認反應之進行,結果反應結束後之基質之 轉換> 99%,原料波峰消失。 繼而利用1%氫氧化鈉水溶液進行中和後,添加2〇%硫 代硫酸鈉水溶液25份並攪拌3G分鐘,錢靜置。取出分 離成2層中之有機層’於其中添加秒膠(1^。〆c_则) 10份、活性碳(職IT製造之CAP SUPER) 2G份、膨潤 土(H〇Jun製造之BengelSH)2〇#,於室溫下授^小 時後進行過濾、。則水⑽份將所獲得之錢水洗3次後 蒸餾去除有機溶劑,藉此獲得以下述式(6 )hour. The progress of the reaction was confirmed by GC, and as a result, the conversion of the substrate after the completion of the reaction was > 99%, and the peak of the raw material disappeared. Then, after neutralizing with a 1% aqueous sodium hydroxide solution, 25 parts of a 2% by weight aqueous sodium thiosulfate solution was added and stirred for 3 G minutes, and the money was allowed to stand. The organic layer separated into two layers was taken out, and 10 parts of celite (1^.〆c_) was added thereto, activated carbon (CAP SUPER manufactured by IT IT) 2G parts, bentonite (BengelSH manufactured by H〇Jun) 2 〇#, filtered at room temperature for a few hours. Then, the water (10) is washed three times with the obtained money, and the organic solvent is distilled off, thereby obtaining the following formula (6).

、之本發明之環氧樹脂(Ερ·丨)99份。 由GPC之測定妹吴 °果確認其含有9S%之式(6)之骨架 49 201038549 之化合物。進而’於Gc測定中,純度為93%。 另外,其黏度為13500 mpa.s ( 3〇。〇下,E型黏度計), 環氧當量為248 g/eq.。 實施例3 相對於所獲得之環氧樹脂(EP_丨)丨5份,使用矽膠 (Wakogel C-300 ’和光純藥製造)ι〇5份、乙酸乙酯:己 烷一1 4之展開溶劑,並藉由管柱層析法進行純化。 所獲彳于之環氧樹脂(Ep_2 )為丨3份,對於所獲得之環 氧樹脂之純度’由GPC之測定結果確認其含有%%以上之 式(6)之骨架之化合物。進而,於GC測定中,純度約為 99%。 另外,其黏度為11〇〇〇 mPa. s ( 3〇。匸下,E型黏度計), 環氧當量為236 g/eq.。 實施例4、5、6 對於實施例1、2中所獲得之本發明之環氧樹脂(Ep_卜 EP_2),使用作為硬化劑之甲基六氫鄰苯二甲酸酐(新日 本理化(股)製造,RikacidMH7〇〇G,以下稱為H1)、雙 環[2,2,1]庚烧_2,3_二甲酸酐(新日本理化(股)製造,⑽心 HNA^lOO,以下稱為H2),作為硬化促進劑之十六烷基三 甲基氫氧化錄(東京化成工業(股)製造,25%甲醇溶液, 稱為C1),以下述表1所示之配合比(重量份)配合後, 進行20分鐘消泡,藉此獲得本發明之硬化性組成物。 使用所獲得之硬化性樹脂組成物,以如下所示之要領 進行耐熱特κ驗。將結果示於表丨。再者,硬化條件係進 50 201038549 行120°CX3小時之預硬化後進行15(Γ(:χΐ小時之硬化。 (耐熱特性試驗) 對實施例4〜6中所獲得之硬化性樹脂組成物實施2〇 分鐘之真空消泡後,將其輕輕地澆鑄至寬7 mm、長5 cm、 厚約800 之試片用金屬模具中,其後使用聚醯亞胺膜 自上方加蓋。以上述條件使該澆鑄物硬化而獲得動態黏彈 I·生用„式片。將使用該等試片以下述所示之條件實施動態黏 彈性試驗之結果示於表1。 〇 測定條件 800 動態黏彈性測定器:TA-instruments製造, 測定溫度範圍:_3〇。〇〜28(TC 升溫速度:It/min 減片尺寸:使用切成5 mmx 50 mm之試片 β m)。 DMA-2980 (厚度約為 分析條件The epoxy resin (Ερ·丨) of the present invention is 99 parts. It was confirmed by GPC's measurement that it contained 9S% of the compound of the skeleton of the formula (6) 49 201038549. Further, in the Gc measurement, the purity was 93%. In addition, its viscosity is 13500 mpa.s (3 〇. underarm, E-type viscometer), and the epoxy equivalent is 248 g/eq. Example 3 With respect to 5 parts of the obtained epoxy resin (EP_丨), a silicone resin (manufactured by Wakogel C-300' and Wako Pure Chemical Industries, Ltd.) 5 parts, ethyl acetate: hexane-14 polymerization solvent was used. And purified by column chromatography. The epoxy resin (Ep_2) obtained was 丨3 parts, and the purity of the obtained epoxy resin was confirmed to be a compound containing the skeleton of the formula (6) in %% or more from the measurement results of GPC. Further, in the GC measurement, the purity was about 99%. In addition, its viscosity is 11 〇〇〇 mPa. s (3 〇. underarm, E-type viscometer), and the epoxy equivalent is 236 g/eq. Examples 4, 5, and 6 For the epoxy resin (Ep_b EP_2) of the present invention obtained in Examples 1 and 2, methyl hexahydrophthalic anhydride (Nippon Chemical and Chemical Co., Ltd.) was used as a hardener. ) Manufactured, RikacidMH7〇〇G, hereinafter referred to as H1), bicyclo[2,2,1]g-burn _2,3-dicarboxylic anhydride (manufactured by New Japan Physical and Chemical Co., Ltd., (10) Heart HNA^100, hereinafter referred to as H2), cetyltrimethylhydroxide as a hardening accelerator (manufactured by Tokyo Chemical Industry Co., Ltd., 25% methanol solution, referred to as C1), and the mixing ratio (parts by weight) shown in Table 1 below After the mixing, defoaming was carried out for 20 minutes, whereby the curable composition of the present invention was obtained. Using the obtained curable resin composition, heat resistance was examined in the following manner. The results are shown in the table. Further, the curing conditions were carried out in 50 201038549, 120 ° C, and 3 hours pre-hardening, and then 15 (Γ (: χΐ hour hardening. (heat resistance characteristic test)) The hardening resin compositions obtained in Examples 4 to 6 were carried out. After vacuum defoaming for 2 minutes, it was gently cast into a metal mold for a test piece having a width of 7 mm, a length of 5 cm, and a thickness of about 800, and then capped from above using a polyimide film. The condition of the cast material was hardened to obtain a dynamic viscoelasticity I. The film was subjected to the dynamic viscoelasticity test using the test pieces under the conditions shown below. 〇 Measurement conditions 800 Dynamic viscoelasticity Measurer: manufactured by TA-instruments, measuring temperature range: _3 〇. 〇~28 (TC heating rate: It/min sizing size: using test piece β m cut into 5 mm x 50 mm) DMA-2980 (thickness approx. For analysis of conditions

Tg :將動態黏彈性(DMA)測定中之Tan 5之 作為Tg。 25°C彈性模數:測定25。(:時之彈性模數。 51 201038549 [表1]Tg: Tan 5 in the dynamic viscoelastic (DMA) measurement is taken as Tg. 25 ° C elastic modulus: Determination of 25. (:The modulus of elasticity of time. 51 201038549 [Table 1]

項目 實施例4 實施例5 實施例6 組成 EP-1 4.96 EP-2 4.72 4.72 硬化劑(H1) 3.36 3.36 硬化劑(H2) 3.56 硬化觸媒(C1) 0.04 0.04 0.04 耐熱特性DMA(tan0) 185〇C 189〇C 156〇C 實施例7、8,比較例1 對於實施例2、3中所獲得之本發明之環氧樹脂(Epj、 EP-2),以及作為比較例之3,4環氧環己基曱基-3,4_環氧環 己基甲酸酯(Dow Chemical公司製造之ERL-4221,環氧當 量為140 g/eq.,以下稱為Ep_3),使用作為硬化劑之hi 及作為硬化促進劑之c丨,以下述表2所示之配合比(重量 份)配合,然後進行2〇分鐘消泡,從而獲得本發明及比較 用之硬化性組成物。 使用所獲得之硬化性樹脂組成物,以如下所示之要領 進行熱耐久性透射率試驗、LED試驗,將結果示於表2。再 者’硬化條件係進行i 2〇°c X2小時之預硬化後進行140〇C X 2小時之硬化。 (熱耐久性透射率試驗) 對所獲得之硬化性樹脂組成物實施2〇分鐘之真空消泡 後,以成為30 mmx20 mmx高1 mm之方式將其輕輕地澆鑄 至利用耐熱膠帶而製成有障壁之玻璃基板上。以規定之硬 52 201038549 « 化條件使該洗1st物硬化,獲得厚度為1 mm之透射率用試 片。 使用該等試片’藉由分光光度計測定於150。(:之烘箱中 放置96小時前後之透射率(測定波長:375 nm),計算出 其變化率。 (LED試驗) 對所獲得之硬化性樹脂組成物實施20分鐘之真空消泡 後,將其填充至注射器中,並使用精密喷出裝置將其洗鑄 〇 至搭載有中心發光波為465 nm之晶片、外徑為5 mm見方 的表面封裝型LED封裝體(内徑為4.4 mm,外壁高度為1.25 mm)中。其後’以規定之硬化條件使其硬化,藉此獲得試 驗用LED。 (1 ) LED點燈試驗 點燈試驗係於規定電流30 mA下進行。詳細之條件如 下所示。作為測定項目,使用積分球測定點燈1 〇〇小時前 後之照度,計算出試驗用LED之照度之保持率。 ^ 點燈詳細條件 發光波長:465 nm 驅動方式:恆定電流方式,30 mA (發光元件規定電流 為 3 0 mA ) 驅動環境:85°C、85% 評價:將照度下降度未達5%之情形判定為〇,將5% 以上、未達10 %之情形判定為△,將10 %以上之情形判定 為X。 53 201038549 (2) LED熱循環試驗 熱循環試驗係於冷埶衝 之時間設定為2八链…、I 將升溫及降溫所需 為〃鐘而反覆進行-4(TCxl5分鐘〜12(rcxl5 ’然後以目視觀察循環1⑼次、別*後試驗用 纟產生龜裂及剝離。評價係將產生龜裂及剝離之 情形判定為X,將不產生龜裂及剝離之情形判定為〇。 [表2]Item Example 4 Example 5 Example 6 Composition EP-1 4.96 EP-2 4.72 4.72 Hardener (H1) 3.36 3.36 Hardener (H2) 3.56 Hardening Catalyst (C1) 0.04 0.04 0.04 Heat Resistance DMA(tan0) 185〇 C 189〇C 156〇C Examples 7, 8 and Comparative Example 1 The epoxy resins (Epj, EP-2) of the present invention obtained in Examples 2 and 3, and 3, 4 epoxy as a comparative example Cyclohexyldecyl-3,4-epoxycyclohexylcarboxylate (ERL-4221 manufactured by Dow Chemical Co., Ltd., epoxy equivalent: 140 g/eq., hereinafter referred to as Ep_3), used as a hardener and as The curing accelerator was mixed with the compounding ratio (parts by weight) shown in the following Table 2, and then defoamed for 2 minutes to obtain the curable composition of the present invention and comparative use. Using the obtained curable resin composition, a heat durability transmittance test and an LED test were carried out in the following manner, and the results are shown in Table 2. Further, the 'hardening condition was performed by pre-curing i 2 〇 ° C for 2 hours and then hardening at 140 〇 C X for 2 hours. (Thermal Durability Transmittance Test) After the vacuum curable resin composition obtained was subjected to vacuum defoaming for 2 minutes, it was gently cast to a size of 30 mm x 20 mm x 1 mm to a heat-resistant tape. On a glass substrate with a barrier. According to the hardening of the regulations 52 201038549 « The conditions of the washing 1st hardened to obtain a transmittance test piece having a thickness of 1 mm. Using these test pieces 'measured at 150 by a spectrophotometer. (The transmittance was measured in an oven for 96 hours before and after (measuring wavelength: 375 nm), and the rate of change was calculated. (LED test) After the vacuum curable resin composition obtained was subjected to vacuum defoaming for 20 minutes, Filled into a syringe and washed and cast into a surface mount type LED package with a center light beam of 465 nm and an outer diameter of 5 mm square using a precision ejection device (inner diameter 4.4 mm, outer wall height) It is 1.25 mm). It is then hardened by the specified hardening conditions to obtain the test LED. (1) LED lighting test The lighting test is performed at a predetermined current of 30 mA. The detailed conditions are as follows As a measurement item, the illuminance of the LED for the test LED was measured using an integrating sphere to measure the illuminance of the LED for the test. ^ Lighting detailed conditions Illumination wavelength: 465 nm Driving method: Constant current mode, 30 mA ( The current rating of the light-emitting element is 30 mA.) Driving environment: 85 ° C, 85% Evaluation: The case where the illuminance reduction degree is less than 5% is judged as 〇, and the case where 5% or more and less than 10% is determined as △, More than 10% 53. 2010-0549 (2) LED thermal cycle test The thermal cycle test is set to 2 eight chains in the cold rolling time, I will be required to raise and lower the temperature for the cuckoo clock and repeat -4 (TCxl5 minutes ~ 12 (rcxl5' was then visually observed for 1 (9) times, and after the test, cracks and peeling were caused by the test. The evaluation was judged as X by the occurrence of cracks and peeling, and the case where no cracks and peeling occurred was judged as 〇. [Table 2]

硬化物性 熱耐久性透射率試驗 LED點燈試驗 LED熱循環試驗Hardened physical property heat durability transmittance test LED lighting test LED thermal cycle test

500次 85.9% 88.1% 84.0% 〇 〇 〇 X 〇 X 實施例9、比較例2 對於實施例2、3中所獲得之本發明之環氧樹脂 (EP-1 ) ’以及作為比較例之環氧樹脂(eP_3 )、己二酸 雙(3,4-環氧環己基曱基㈣(D〇w Chemical公司製造之 ERL-4229,環氧當量為i96g/eq·,以下稱為EP-4),使用 作為硬化劑之Η1、作為硬化促進劑之鱗系四級鹽(日本化 學工業製造之ΡΧ-4ΜΡ,以下稱為C2),以下述表3所示 之配合比(重量份)配合後’進行分鐘消泡,藉此獲得 54 201038549 本發明及比較用之硬化性樹脂組成物。 使用所獲得之硬化性樹脂組成物,以如了所示之要領 進行LED點燈試驗。將結果示於表3。再者,硬化條件係 進行110°Cx3小時之預硬化後進行13(TC><5小時之硬化。 (LED點燈試驗A) 對所獲得之硬化性樹脂組成物實施20分鐘之真空消泡 後’將其填充至注射器中,並使用精密喷出裝置將其洗濤 至搭載有中心發光波為465 rnn之晶片、外徑為$ mm見方 的表面封裝型LED封裝體(内徑為4.4 mm,外壁高度為i 25 mm)中。其後,以規定之硬化條件使其硬化,藉此獲得試 驗用LED。 點燈試驗係於規定電流之2倍即60 mA下進行。詳細 之條件如下所示。作為測定項目,使用積分球測定點燈2〇〇 小時前後之照度,計算出試驗用LED之照度之保持率。 點燈詳細條件 發光波長:465 nm LED元件: 驅動方式:恆定電流方式,60 mA (發光元件規定電流 為 30 mA) 驅動環境:85。(:、85% (LED點燈試驗B ) 另外’在與上述LED點燈試驗相同之環境下(即85<>c、 85%之條件)’不點亮試驗用LED而加以保存,使用積分 球測定保持200小時前後之照度,計算出試驗用咖之照 55 201038549 度之保持率。 [表3] 項目 實施例9 比較例2 比較例3 組成 EP-1 4.96 EP-3 2.80 EP-4 3.48 硬化劑(H1) 3.36 3.36 3.36 硬化觸媒(C2) 0.02 0.02 0.02 LED點燈試驗A (照度保持率) 72% 54% 53% LED點燈試驗B (照度保持率) 98% 92% 87% 合成例1 於具備攪拌機、回流冷卻管、攪拌裝置之燒瓶中,一 面實施氮氣沖洗一面添加二環戊二烯二曱醇12份、曱基六 氫鄰笨二曱酸酐(新日本理化(股)製造,Rikacid MH, 以下稱為酸酐H-3 ) 73份、1,2,4-環己烧三甲酸-1,2-二酐(三 菱瓦斯化學製造,H-TMAn,以下稱為H-4 ),於40°C下加 熱攪拌1小時,繼而於60°C下加熱攪拌1小時(藉由GPC 確認二環戊二烯二甲醇變成0.5%以下),藉此獲得作為聚 叛酸與酸酐之混合物之硬化劑組成物(HA-1 ) 1 〇〇份。所獲 得之化合物之官能基當量為171 g/eq.(將羧酸、酸酐分別 作為一種官能基來考慮)。 合成例2 於具備授拌機、回流冷卻管、授拌裝置之燒瓶中,一 面實施氮氣沖洗一面添加2,4-二乙基戊二醇(協和醱酵化學 56 201038549 (Kyowa Hakko Chemical)製造之 Kyowadiol PD-9) 10 份、 酸酐(H-3 ) 73份’於40°C下加熱攪拌1小時,繼而於6〇 。(:下加熱攪拌1小時(藉由GPC確認二環戊二烯二甲醇消 失),藉此獲得作為聚羧酸與酸酐之混合物之硬化劑組成 物(HA-2 ) 60份。所獲得之化合物之官能基當量為17〇 g/eq_ ° 實施例10、11 使用實施例2中所獲得之本發明之環氧樹脂(ej>_丨), 〇 作為硬化劑組成物之合成例1、2中分別獲得之硬化劑組成 物(HA -1 )、( HA-2 ) ’作為添加劑之攝酸酯鋅錯合物(500 times 85.9% 88.1% 84.0% 〇〇〇X 〇X Example 9 Comparative Example 2 The epoxy resin (EP-1) of the present invention obtained in Examples 2 and 3 and the epoxy resin as a comparative example Resin (eP_3), bis(3,4-epoxycyclohexylfluorenyl (tetra) adipic acid (ERL-4229 manufactured by D〇w Chemical Co., Ltd., epoxy equivalent of i96 g/eq·, hereinafter referred to as EP-4), The quaternary quaternary salt (the ΡΧ-4ΜΡ manufactured by Nippon Chemical Industry Co., Ltd., hereinafter referred to as C2) which is used as a hardening agent, and the compounding ratio (parts by weight) shown in the following Table 3 are used. The foaming was performed for a minute to obtain a curable resin composition for use in the present invention and for comparison. 54. Using the obtained curable resin composition, the LED lighting test was carried out in the manner as shown. The results are shown in Table 3. Further, the hardening conditions were carried out by pre-hardening at 110 ° C for 3 hours, and then 13 (TC >< 5 hours of hardening. (LED lighting test A) The vacuum curing of the obtained curable resin composition was carried out for 20 minutes. After the bubble, fill it into the syringe and wash it with a precision spray device. It is mounted on a surface mount LED package (with an inner diameter of 4.4 mm and an outer wall height of i 25 mm) with a center light-emitting wave of 465 rnn and an outer diameter of $ mm square. Thereafter, the specified hardening conditions are used. The test LED is obtained by hardening it. The lighting test is performed at twice the predetermined current, that is, 60 mA. The detailed conditions are as follows. As the measurement item, the illumination is measured using an integrating sphere for 2 hours before and after lighting. Calculate the illuminance retention rate of the test LED. Detailed lighting conditions: 465 nm LED component: Drive mode: Constant current mode, 60 mA (30 mA for the illuminating component) Drive environment: 85. (:, 85% (LED lighting test B) In addition, in the same environment as the above LED lighting test (ie, 85 <>c, 85% of the conditions), the test LED is not lit and stored, and the integrating sphere is used for measurement. The illumination of the test coffee was maintained at a rate of 55 201038549 degrees. [Table 3] Item Example 9 Comparative Example 2 Comparative Example 3 Composition EP-1 4.96 EP-3 2.80 EP-4 3.48 Hardener (H1) 3.36 3.36 3.36 Hard Catalytic (C2) 0.02 0.02 0.02 LED lighting test A (illuminance retention) 72% 54% 53% LED lighting test B (illuminance retention) 98% 92% 87% Synthesis Example 1 with mixer, reflux cooling In the flask of the tube and the stirring device, 12 parts of dicyclopentadienyldithiol and fluorenylhexahydrophthalic acid anhydride (manufactured by Nippon Chemical and Chemical Co., Ltd., Rikacid MH, hereinafter referred to as an acid anhydride) were added while performing nitrogen purge. H-3) 73 parts, 1,2,4-cyclohexanetricarboxylic acid-1,2-dianhydride (Mitsubishi Gas Chemical, H-TMAn, hereinafter referred to as H-4), heated and stirred at 40 ° C After 1 hour, heating and stirring at 60 ° C for 1 hour (by GPC, it was confirmed that dicyclopentadiene dimethanol became 0.5% or less), thereby obtaining a hardener composition as a mixture of polyphenolic acid and an acid anhydride (HA- 1) 1 copy. The functional group equivalent of the obtained compound was 171 g/eq. (The carboxylic acid and the acid anhydride were each considered as a functional group). Synthesis Example 2 In a flask equipped with a mixer, a reflux cooling tube, and a mixing device, 2,4-diethylpentanediol (Kyowa Hakko Chemical Co., Ltd.) was added while nitrogen gas was purged. Kyowadiol PD-9) 10 parts, anhydride (H-3) 73 parts 'heated and stirred at 40 ° C for 1 hour, followed by 6 Torr. (: heating and stirring for 1 hour (confirmation of disappearance of dicyclopentadiene dimethanol by GPC), thereby obtaining 60 parts of a hardener composition (HA-2) as a mixture of a polycarboxylic acid and an acid anhydride. The functional group equivalent weight is 17 〇g/eq_ °. Examples 10 and 11 The epoxy resin (ej>_丨) of the present invention obtained in Example 2, and hydrazine as the hardener composition are synthesized in Examples 1 and 2. The hardener composition (HA -1 ), (HA-2 ), respectively obtained as an additive, zinc phthalate complex (

Industries製造之XC-9206,以下稱為ΑΕΜ ),受阻胺化合 物(Adeka製造之LA-52,以下稱為AD_2),以下述表4 所示之配合比(重量份)配合’獲得本發明之硬化性組成 物。 (熱耐久性透射率試驗) Q 對所獲得之硬化性樹脂組成物實施20分鐘之真空消泡 後,以成為3〇mmX20mmx高lmm之方式將其輕輕地澆鑄 至利用耐熱膠帶而製成有障壁之玻璃基板上。對該洗鑄物 進行1HTCX2小時之預硬化後進行15(η:χ3小時之硬化, 獲得厚度為1 mm之透射率用試片。使用所獲得之試片,藉 由分光光度計測定於15代之㈣中放置%小時前後之透 射率(測定波長:400 nm),並計算出其變化率。 57 201038549 [表4] 項目 實施例】Π Ί— 環氧樹脂(ΕΡ-1) 4.96 __實施例11 硬化劑(ΗΑ-1) 3 4? 、 4.96 組成 硬化劑(ΗΑ-2) 添加劑(AD-1) 0.05 添加劑(AD-2) 0 01 0.05 _ 0.01 透射率(初始) 耐熱試驗後之保持率 89% 90% 87% 由以上之結果可知:本發明之 性、強韌性(根據耐熱循環試驗) 樹脂組成物。 壤氧樹脂可形成光學特 優異的本發明之硬化性 以上參照特定之型態對本發 領域技術人員明白可不脫離本發 種變更及修正。 月進行了詳細說明,但本 明之精神與範圍而進行各 再者,本申請案係基於2〇〇9年3月 專利申請案(日本專利特願2〇〇9_〇67197) 援引其所有内容。另外,此處所引用之所 體而併入。 19日申請之曰本 ’並藉由引用而 有參照係作為整 【圖式簡單說明】 益 【主要元件符號說明】 益 58XC-9206 manufactured by Industries, hereinafter referred to as ΑΕΜ), hindered amine compound (LA-52 manufactured by Adeka, hereinafter referred to as AD_2), and blended with the compounding ratio (parts by weight) shown in Table 4 below to obtain the hardening of the present invention. Sexual composition. (Thermal Durability Transmittance Test) Q After the vacuum curable resin composition obtained was subjected to vacuum defoaming for 20 minutes, it was gently cast to a thickness of 3 mm x 20 mm x 1 mm to be made of heat-resistant tape. On the glass substrate of the barrier. The washed product was subjected to 1 HTCX for 2 hours of pre-hardening, and then subjected to 15 (n: χ 3 hours hardening to obtain a test piece for transmittance of 1 mm in thickness. Using the obtained test piece, it was measured by a spectrophotometer for 15 generations. (4) The transmittance before and after the % hour (measurement wavelength: 400 nm) was placed, and the rate of change was calculated. 57 201038549 [Table 4] Example of the project] Π Ί - Epoxy resin (ΕΡ-1) 4.96 __Implementation Example 11 Hardener (ΗΑ-1) 3 4?, 4.96 Composition Hardener (ΗΑ-2) Additive (AD-1) 0.05 Additive (AD-2) 0 01 0.05 _ 0.01 Transmittance (initial) Retention after heat resistance test Rate 89% 90% 87% From the above results, it is understood that the present invention has the properties and toughness (according to the heat-resistant cycle test) resin composition. The soil oxygen resin can form an optically excellent hardenability of the present invention. It will be apparent to those skilled in the art that the present invention may be modified and modified without departing from the spirit and scope of the present invention. The present application is based on the patent application of March 2009. Patent wish 2〇〇9_〇67197) cites all of its contents. In addition, it is incorporated in the body cited here. The application for the application on the 19th is also referred to as a reference by a reference [simplified description] Main component symbol description] Benefit 58

Claims (1)

201038549 七、申請專利範圍: 1'種二烯化合物,其特徵在於 表示: 係以下述式(1 ) 所 〇 0201038549 VII. Patent application scope: 1' kind of diene compound, which is characterized by: It is represented by the following formula (1) 〇 0 R (式中, 子或碳數為1 (1) 複數存在之R係分別獨立地存在,表示 6之烧基;另外,p 示氫原 表示碳數為 1〜6之伸院 基或直接鍵結)。 2 ·種環氧樹脂’其特徵在於:係中β^ # 之一烯#人1 你甲研專利粑圍第1項 (一碲化合物經氧化而獲得。 或過酸而環氧化。 ㈣日诚料氧化氧 4·—種環氧樹脂組成物’其特徵在於:含有中請專利範 :第2項與第3項中任一項之環氧樹脂與硬化劑及/或硬化 觸媒。 5·— 士種硬化物,其特徵在於:係申請專利範圍第4項之 環氧樹脂組成物經硬化而成。 八、圖式: 無 59R (wherein, the number of carbons or carbons is 1 (1), and the R groups existing in the plural are independently present, indicating a burnt group of 6; in addition, p represents hydrogen as a radical or direct bond having a carbon number of 1 to 6. Knot). 2 · A kind of epoxy resin' is characterized by: β^ #一烯烯#人1 You are the first item of the patent research (the one compound is obtained by oxidation. Or it is peracid and epoxidized. (4) Richeng Oxidation Oxygen 4·-Epoxy Resin Composition' is characterized by the inclusion of an epoxy resin and a hardener and/or a hardening catalyst according to any one of items 2 and 3. — Scotch hardened material, characterized in that the epoxy resin composition of the fourth application patent scope is hardened. VIII. Schema: No 59
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