TW201043371A - Laser processing method, laser processing device, and manufacturing method of solar panels - Google Patents

Laser processing method, laser processing device, and manufacturing method of solar panels Download PDF

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Publication number
TW201043371A
TW201043371A TW099117007A TW99117007A TW201043371A TW 201043371 A TW201043371 A TW 201043371A TW 099117007 A TW099117007 A TW 099117007A TW 99117007 A TW99117007 A TW 99117007A TW 201043371 A TW201043371 A TW 201043371A
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Taiwan
Prior art keywords
glass substrate
processing
image
laser
substrate
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TW099117007A
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Chinese (zh)
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TWI414384B (en
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Yuichi Shimoda
Masaki Araki
Shinji Honma
Masayuki Ohta
Akira Hayano
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Hitachi High Tech Corp
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    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

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  • Laser Beam Processing (AREA)
  • Lasers (AREA)
  • Photovoltaic Devices (AREA)

Abstract

A laser processing method that can reduce as much as possible a processing time caused by laser light, a laser processing device and a manufacturing method of solar panels are provided. When a laser processing is performed on a glass substrate transported sequentially from a film-forming device that forms a transparent electrode layer, a semiconductor layer or a metal layer on the glass substrate, an alignment processing is performed on the glass substrate, and then the glass substrate is held and moved. The stages that perform the alignment processing and keep the glass substrate moving are installed at two positions on two sides of a laser processing stage, so that when one stage performs the laser processing, the other stage performs the alignment processing, and waiting time is reduced largely. In addition, even if any one of the stages is down due to failure etc, the other stage may be used to maintain the laser processing.

Description

201043371 ^ \/ΛλΙ^ΑΧ 六、發明說明: 【發明所屬之技術領域】 本發明是有關於一種使用雷射束來加工薄膜等的雷射 加工方法、雷射加工裝置及太陽電池板製造方法,特別是 ^及-種能夠高效率地湘雷射束來進行薄膜等的加工的 雷射加工方法、雷射加I裝置及太陽電池板製造方法。 【先前技術】 、以往,太陽電池板(solarpanel)的製造步驟如下:在 透光性基板(破璃基板)上依次形成透明電極層、半導體 層金屬層,在形成所述各層後的各步驟中,利用雷射束 將各層加工成條帶狀而製成太陽電池板模組㈤肛p·】 module)。以所述方式來製造太陽電池板模組時,在玻璃 基板上的薄膜上,利帛雷射束以例如約mm的間距 (pitch)形成劃線(似㈣。此劃線是由線寬約為 30 μπι、且線與線的間隔約為3〇 μιη的三條線構成。利用 雷射束來成線時,通常是在恒速移動的玻璃基板上照 射雷射束。由A ’能夠形麟度及線寬穩定賴線。這種 太陽電池板(光電轉換裝置)的製造方法已知有連續方式 Cm+nethod)。連續方式的太陽電池板(光電轉換裝 置)的製造方法已知有如日本專利特開平 6-283743 號公 報、日本f利特開2001-155999號公報中所記載的方法。 圖1是表示以往的連續方式的太陽電池板(光電轉換 裝,)製造|置的—例的圖。此製造裝置包括:搬入機械 手。(robot station)(輥式輸送機(r〇uer c〇nvey〇r)部) 201043371 Ο[Technical Field] The present invention relates to a laser processing method, a laser processing apparatus, and a solar cell manufacturing method for processing a film or the like using a laser beam. In particular, a laser processing method, a laser addition device, and a solar cell manufacturing method capable of efficiently processing a film or the like with a Xiang Lei beam can be efficiently performed. [Prior Art] Conventionally, a solar panel is manufactured by sequentially forming a transparent electrode layer and a semiconductor layer metal layer on a light-transmissive substrate (glass substrate), and in each step after forming the layers The laser beam module is used to process the layers into strips to form a solar panel module (5) anal p·] module). When the solar panel module is manufactured in the manner described, on the film on the glass substrate, the laser beam is formed into a scribe line at a pitch of, for example, about mm (like (4). This scribe line is about the line width. It is composed of three lines of 30 μm and a line-to-line spacing of about 3 〇μιη. When a laser beam is used to form a line, the laser beam is usually irradiated on a constant-speed moving glass substrate. The degree and the line width are stable. The manufacturing method of such a solar panel (photoelectric conversion device) is known as a continuous mode Cm+nethod). A method of manufacturing a solar cell panel (photoelectric conversion device) of a continuous type is known, for example, in the method disclosed in Japanese Laid-Open Patent Publication No. Hei. No. Hei. Fig. 1 is a view showing an example of manufacturing of a conventional continuous solar cell panel (photoelectric conversion package). The manufacturing apparatus includes: moving into a robot. (robot station) (roller conveyor (r〇uer c〇nvey〇r)) 201043371 Ο

㈣暫%保持從前段的成臈裝置i2中搬人的玻璃基板匕· 揪J加工台iG ’在朗基板1e上的賴上形成劃線;及 =機械手台(輥式輸送機部)16,暫時騎加工後的玻 土板Id,並將該玻璃基板1(}搬出到後段的成膜裝置μ 中。搬入機械手台(輥式輸送機部)14包括將玻璃基板lb 的表背面轉的表背面轉麟,根驗制雷射加工將 玻璃基板ib翻轉並搬送到雷射加工台1〇。雷射加工台ι〇 包括對準部i〇a、抓爪部顺、抓爪(grippe_動部^、 加工區域部觀。對準部施是向規定位置對由搬入機械 手台(輥式輸送機部)14搬入的玻璃基板lc進行對準處 理。抓爪部i〇b保持對準處理後的玻璃基板lc。抓爪驅動 部10C是與加工區域部10d的雷射束同步地對抓爪部i〇b 所保持的玻璃基板lc進行移動處理。加工區域部1〇d將雷 射束照射到玻璃基板lc上來進行規定的加工。搬出機械$ 台(輥式輸送機部)16包括將玻璃基板lc的表背面翻轉 的表背面翻轉機構,且將實施了雷射加工的玻璃基板ld 的表背面翻轉後作為玻璃基板le而搬出到下一段的成膜 裝置18。 ' 如上所述的以往的連續方式的太陽電池板製造裝置 中,利用雷射加工台10上的對準部l〇b來進行對準處理以 及玻璃基板的交接處理。因此存在如下問題,即,在加工 日守間以外’專待時間專的無用時間較多,且在對準部1 〇b 的機構因故障等而停機(down)時整個農置都將停機。 【發明内容】 5 201043371 本發明是鑒於以上所述的問題而完成的,其目的在於 提供一種能夠盡可能地縮短加工時間的雷射加工方法、雷 射加工裝置及太陽電池板製造方法。 本發明的雷射加工方法的第1特徵在於,—邊依次反 復進行以下步驟,一邊對從前段裝置搬送來的玻璃基板進 4亍I#射加工,所述步驟是·向規定位置對從前段裳置搬送 來的第1玻璃基板進行對準處理的步驟;一邊保持著進行 所述對準處理後的所述第1玻璃基板並使所述第1玻璃基 板相對地移動,一邊照射雷射束,由此對所述第丨玻璃^ 板實施雷射加工的步驟;在利用所述雷射束實施加工的期 間,向規定位置對從所述前段裝置搬送來的第2破璃基板 進行對準處理的步驟;以及在利用所述雷射束進行的加工 結束之後搬出所述第1玻璃基板,並且一邊保持著所述第 2玻璃基板並使所述第2玻璃基板相對地移動,—邊照射 雷射束,由此對所述第2玻璃基板實施雷射加工的步驟。 作為對基板照射雷射束的加工處理,較符合的是太陽 電池板的製造等,當製造太陽電池板時,在玻璃基板上依 次形成金屬層、半導體層、透明電極層,在形成所述各層 ,的各步驟中,使用雷射束將各層加工成條帶狀而製成太 陽電池板。前段裝置是在所述玻璃基板上形成透明電極 層、半導體層或者金屬層的賴裝置。在對從這些成膜裝 ^搬送來的玻璃基板進行雷射加工時,首先對玻璃基板進 打對準處理’然後保持著玻璃基板並使玻璃基板移動。本 發明中,將進行此對準處理與保持並移動玻璃基板的平臺 .201043371 没置於雷射加工平臺兩侧兩個部位,由此在一平臺上進行 雷射加工的期間,在另一平臺上進行對準處理,從而使得 等待時間大幅縮短。而且,即便在任一平臺因故障等而停 機日守,也可以使用另一平臺來維持雷射加工處理。(4) Temporarily keeping the glass substrate 搬· 揪J processing table iG 'moved from the previous stage of the sputum device i2', forming a scribe line on the slab 1e; and = manipulator table (roller conveyor unit) 16 Temporarily ride the processed glass plate Id and carry the glass substrate 1 (} out into the film forming apparatus μ in the rear stage. Loading into the robot table (roller conveyor unit) 14 includes turning the front and back of the glass substrate lb On the back of the watch, the laser processing of the glass substrate ib is reversed and transferred to the laser processing station. The laser processing table includes the alignment portion i〇a, the gripper portion, and the gripper (grippe). _ moving part ^, processing area part view. The aligning part applies alignment processing to the glass substrate lc carried in by the loading robot stage (roller conveyor part) 14 at a predetermined position. The gripper part i〇b is kept right. The glass substrate lc after the quasi-treatment. The gripper driving unit 10C moves the glass substrate lc held by the gripper portion i〇b in synchronization with the laser beam of the processing region portion 10d. The processing region portion 1〇d will be Ray The beam is irradiated onto the glass substrate lc to perform predetermined processing. The machine is unloaded (roller conveyor unit) 16 includes a front and back inversion mechanism that reverses the front and back surfaces of the glass substrate lc, and the front and back surfaces of the glass substrate ld subjected to the laser processing are inverted, and then carried out as a glass substrate le to the film forming apparatus 18 of the next stage. In the conventional continuous solar panel manufacturing apparatus described above, the alignment process 10b on the laser processing table 10 performs the alignment process and the glass substrate transfer process. Therefore, there is a problem in the processing day. Outside the keeper, there is a lot of useless time for the special time, and the entire farm will be shut down when the mechanism of the aligning unit 1 〇b is down due to a failure or the like. [Invention] 5 201043371 The present invention is The object of the above is to provide a laser processing method, a laser processing apparatus, and a solar panel manufacturing method capable of shortening the processing time as much as possible. The first feature of the laser processing method of the present invention lies in Then, the glass substrate conveyed from the front stage device is subjected to the following steps in sequence, and the step is to face the predetermined position from the front stage. a step of performing alignment processing on the first glass substrate that has been carried out; and holding the first glass substrate after the alignment process and moving the first glass substrate relatively while irradiating the laser beam a step of performing laser processing on the second glass plate; and aligning the second glass substrate conveyed from the front device to a predetermined position while performing processing by the laser beam a step of processing; and after the processing by the laser beam is completed, the first glass substrate is carried out, and while the second glass substrate is held and the second glass substrate is relatively moved, the second glass substrate is irradiated The step of performing laser processing on the second glass substrate by the laser beam. The processing for irradiating the laser beam to the substrate is more compatible with the manufacture of solar panels, etc., when manufacturing solar panels, A metal layer, a semiconductor layer, and a transparent electrode layer are sequentially formed on the glass substrate. In each step of forming the respective layers, each layer is processed into a strip shape using a laser beam to form a solar cell panel. The front stage device is a device for forming a transparent electrode layer, a semiconductor layer or a metal layer on the glass substrate. When laser processing is performed on the glass substrate conveyed from these film formations, the glass substrate is first subjected to alignment processing. Then, the glass substrate is held and the glass substrate is moved. In the present invention, the alignment processing and the platform for holding and moving the glass substrate are performed. 201043371 is not placed on two sides of the laser processing platform, thereby performing laser processing on one platform, on another platform. The alignment process is performed thereon, so that the waiting time is greatly shortened. Moreover, even if any platform is shut down due to a malfunction or the like, another platform can be used to maintain the laser processing.

本發明的雷射加工方法的第2特徵在於:在所述第^ 特徵的雷射加ji方法+,在利關述#射束進行的最初的 加工處理結束的時_,獲取包含通過所述最初加工處理 而形成的所述玻璃基板的形狀變化部分與所 邊緣部的雙方的部位的圖像,並存鍵所述圖== 玻璃基板的識別數據(identification data,ID數據),在 ^施第二次或第二次之後的加工處理時,根據所述ID數 據來進行所述對準處理。 ;以往在利用雷射束進行加工時,要在各步驟中進行對 ^理。本發财,在雷射束進行的最初的加工處理 j的時間點,獲取包含通過此加玉處理而形成的形狀變 匕4分與玻璃基板的邊緣部的雙方的部位的圖像,並將此 ,像利用到下-次或下-次之後的加工處理前的對準處理 /例如,在製造太陽電池板時,獲取包含通過雷射加工 而开/成的til線與基板邊緣部的雙方的部位的圖像,並在雷 射加工處理之前根據所獲取的圖像來進行對準處理。因為 圖像令包含形狀變化部分與基板邊緣部的雙方的圖像,所 以具有各易it行祕朗處理的效果。例如在製造太陽電 =板時’因為圖像巾包含¢/朗圖像與絲邊緣部的形狀 的圖像的雙方,所以容易進行圖像識別處理。由此,無須 7 201043371 在基板上a又置對準標記(alignment mark )即可準確地進行 對準。 本發明的雷射加工方法的第3特徵在於:在所述第i 或第2特徵的f射加工方法巾’獲取所述玻璃基板的四角 附近的圖像,並根據此圖絲檢崎述_基㈣彎曲(魏 曲)或所述玻璃基板的四角附近的缺口。 利用雷射束進行的加工是通過將雷射束大致垂直地照 射在基板的加卫面上來進行。因此,如果基板彎曲(輕曲) 或者基板的四角形成有缺口,則難以準確地進行加工,從 而太陽電池板模組的品質有可能會出現問題。所以本發明 中,在將絲搬人到加工位置時,獲取基板的四角附近的 圖像,並根據此圖像來檢測基板的彎曲(龜曲)或基板的 四角附近的缺口。獲取基板的四角附近的圖像的照相機單 元的相對位置_是預先設定的已知值,所以在四角的各 頂點的圖像中各頂點的位置偏料,可以根據此偏移量而 檢測出基板的彎曲(翹曲),並且也可以根據四角附近的 圖像而檢測出基板的缺口。 本發明的雷射加工方法的第4特徵在於:在所述第卜 第2或第3特徵的雷射加工方法中,獲取所述玻璃基板的 外周緣的圖像,並根據此圖像來檢測所述玻璃基板的彎曲 (翹曲)以及所述玻璃基板的所述外周緣的缺口。 所述本發明的雷射加工方法的第4特徵是獲取基板的 外周緣的圖像,並根據此圖像來檢測基板的彎曲(翹曲) 及基板的外周緣的缺口。為了獲取基板的外周緣的圖像, 201043371 可以設置有沿著基板的外周緣移動的圖像獲取單元。此 時,可以使-個或者多個圖像獲取單元沿著基板的外周緣 移動。 Ο Ο ^發明的雷射加工裝置的第1特徵在於包括:雷射束 照射單元’對姆雜的玻縣板照射雷射束來實施規定 的加工處理,1 1對準單元,向規定位置對從前段裝置搬 送來的第1玻璃基板進行對準處理;第2對準單元,向規 定位置對從前段裝置搬送來的第2玻璃基板進行對準處 理;第1保持單元’在所述第i對準單元的對準處理結束 之後,保持著所述第i玻璃基板並使所述第丨玻 對於所述雷射束照射單元進行相對移動;第2保持i元, 在所述第2對準單元的對準處理結束之後,保持著所述第 2玻璃基板並使所述第2玻璃基板⑽於所述雷射束昭射 ^元進行相對義;以及㈣單元,騎控伽對從所述 前段裝置依讀it來的玻絲減行以下的_彡列動作· 二邊以所述第1保持單元保持著利用所述第丨對準單元進 打對準處理後的所述第i玻璃基板,—邊使職第i 基板相對於所述雷射束照射單元進行相 述雷射束對所述第!玻璃基板進行加工,並:進 束加工的顧所述第2對準單元來對所述第^ 基板執行對準處理,在利賴述f射束來對所述第i 基板進行的加工結束之後搬出所述第丨玻璃基板,並且— 邊以所述第2保料元储騎述第2摘基板,一 所述第2玻璃基板相對於所述雷射束騎單元進行相對移 9 201043371 Μ* «/〆 動’由此利用所述雷射束來對所述第2玻璃基板進行加 工。此發明是實現所述雷射加卫方法的第丨特徵中所記載 的雷射加工方法的雷射加工裝置的發明。 本發明的雷射加工裝置的第2特徵在於:在所述第丄 特徵的雷射加X裝置巾,包括:圖像獲取單元,在利用所 述雷射束進行的最初加卫處理結束的時間點,獲取包含通 過所述最初加X處理㈣成的輯_基板的形狀變化部 为與所述玻璃基板的邊緣部的雙方的部位的圖像;存儲單 兀,存儲通過所述®像獲取單元崎取的所額像,來作 為所述玻璃基板的ID數據;以及控制單元,在實施第二 次或第二次之後的加工處科,根據舰id㈣來控制 所述第1對準單元及第2對準單元的對準處理。此發明是 實現所述雷射加X方法的第2特徵巾所記載的雷射加工方 法的雷射加工裝置的發明。 本發明的雷射加工裝置的第3特徵在於:在所述第i 特徵或第2特徵所記載的雷射加工裝置中,包括:第丄圖 像獲取單元’獲取所述玻璃基板的四角附近的圖像;及第 1檢測單元,根據通過所述圖像獲取單元所獲取的所述玻 璃基板的四角附近的圖像,來檢測所述基板的彎曲(翹曲) 或所述基板的四角附近的缺口。此發明是實現所述雷射加 工方法的第3特徵中所記载的雷射加工方法的雷射加工裝 置的發明。 ^本發明的雷射加工裝置的第4特徵在於:在所述第丄、 第2或第3特徵的雷射加卫裝置中,包括:第2圖像獲取 10 201043371 單元’獲取所述玻璃基板的外周緣的圖像;第2檢測單元, 根據通過所述圖像獲取單元所獲取的圖像,來檢測所述玻 璃基板的彎曲(翹曲)以及所述玻璃基板的所述外周緣的 缺口。此發明是實現所述雷射加工方法的第1特徵中所記 載的雷射加工方法的雷射加工裝置的發明。A second feature of the laser processing method according to the present invention is that, in the laser ji method + of the first feature, when the first processing of the beam is completed, the acquisition is completed. The image of both the shape change portion of the glass substrate and the portion of the edge portion formed by the initial processing is stored in the image == identification data (ID data) of the glass substrate, At the time of processing after the second or second time, the alignment processing is performed based on the ID data. In the past, when processing with a laser beam, it was necessary to perform the correction in each step. At the time of the first processing j performed by the laser beam, an image of a portion including the shape of the shape changed by the addition of the jade and the edge portion of the glass substrate is obtained, and Thus, the alignment processing before the processing after the next-time or the next-time is used. For example, when manufacturing the solar panel, both the til line including the laser processing and the edge portion of the substrate are obtained. An image of the part and an alignment process based on the acquired image before the laser processing. Since the image is such that it includes an image of both the shape-changing portion and the edge portion of the substrate, it has the effect of being easy to handle. For example, in the case of manufacturing solar electric power = plate, since the image towel includes both the image of the ¢/朗 image and the shape of the edge portion of the wire, the image recognition process is easy. Therefore, it is not necessary to use 7 201043371 to accurately align the alignment mark on the substrate. According to a third aspect of the laser processing method of the present invention, an image of the vicinity of the four corners of the glass substrate is obtained by the f-ray processing method of the i-th or the second feature, and the image is detected based on the image. A base (four) bend (wei Qu) or a notch near the four corners of the glass substrate. Machining with a laser beam is performed by illuminating the laser beam substantially perpendicularly on the abutment surface of the substrate. Therefore, if the substrate is bent (lightly curved) or the four corners of the substrate are notched, it is difficult to perform the processing accurately, and there is a possibility that the quality of the solar panel module may cause problems. Therefore, in the present invention, when the wire is moved to the processing position, an image near the four corners of the substrate is taken, and the bending (turd of the substrate) or the notch near the four corners of the substrate is detected based on the image. The relative position of the camera unit that acquires the image near the four corners of the substrate is a predetermined value set in advance, so that the position of each vertex in the image of each vertex of the four corners is biased, and the substrate can be detected based on the offset. The bending (warping), and the notch of the substrate can also be detected based on the image near the four corners. According to a fourth aspect of the laser processing method of the present invention, in the laser processing method of the second or third feature, an image of an outer periphery of the glass substrate is acquired, and the image is detected based on the image. Bending (warping) of the glass substrate and a notch of the outer periphery of the glass substrate. According to a fourth aspect of the laser processing method of the present invention, an image of an outer peripheral edge of the substrate is obtained, and the curvature (warpage) of the substrate and the notch of the outer peripheral edge of the substrate are detected based on the image. In order to acquire an image of the outer circumference of the substrate, 201043371 may be provided with an image acquisition unit that moves along the outer circumference of the substrate. At this time, one or more image acquisition units can be moved along the outer circumference of the substrate.第 Ο The first feature of the laser processing apparatus according to the invention is that the laser beam irradiation unit stipulates a laser beam by irradiating a laser beam to a glass plate of Mm, and performs a predetermined processing process, and the alignment unit is aligned to a predetermined position. The first glass substrate conveyed from the front stage device performs alignment processing; the second alignment unit performs alignment processing on the second glass substrate conveyed from the front stage device at a predetermined position; the first holding unit 'in the i-th After the alignment process of the alignment unit is completed, the ith glass substrate is held and the third glass is relatively moved with respect to the laser beam irradiation unit; the second holding i element is in the second alignment After the alignment processing of the unit is completed, the second glass substrate is held, and the second glass substrate (10) is oppositely sensed by the laser beam; and (4) the unit is controlled by the riding control The front-end device reads the following _ 彡 动作 依 · it · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · , the edge of the i-th substrate relative to the laser beam Performing, by the unit, the laser beam to process the first glass substrate, and performing the alignment processing on the second substrate by the second alignment unit, and performing the alignment processing on the first substrate After the processing of the i-th substrate is completed, the second glass substrate is carried out, and the second substrate is stored by the second material, and the second glass substrate is opposite to the second glass substrate. The laser beam riding unit performs relative shifting 9 201043371 Μ* «/〆' to process the second glass substrate using the laser beam. This invention is an invention of a laser processing apparatus for realizing the laser processing method described in the first feature of the laser blasting method. According to a second aspect of the laser processing apparatus of the present invention, the laser-added X-device towel of the second feature includes: an image acquiring unit, when the initial cleaning process by the laser beam is completed And acquiring an image including a portion where the shape changing portion of the substrate formed by the initial X processing (4) is a portion of the edge portion of the glass substrate; storing a unit that is stored by the ® image acquiring unit a surcharged image of the image as the ID data of the glass substrate; and a control unit that controls the first alignment unit and the first aligning unit according to the ship id (four) after performing the second or second processing 2 Alignment processing of the alignment unit. This invention is an invention of a laser processing apparatus for realizing the laser processing method described in the second feature sheet of the laser plus X method. According to a third aspect of the invention, in the laser processing apparatus of the ith feature or the second aspect, the second image acquiring unit includes: acquiring a vicinity of four corners of the glass substrate And the first detecting unit detects the bending (warpage) of the substrate or the vicinity of the four corners of the substrate according to an image near the four corners of the glass substrate acquired by the image acquiring unit gap. This invention is an invention of a laser processing apparatus for realizing the laser processing method described in the third feature of the laser processing method. A fourth feature of the laser processing apparatus of the present invention is that, in the laser-assisted device of the second, second or third feature, comprising: second image acquisition 10 201043371 unit 'acquiring the glass substrate The image of the outer periphery; the second detecting unit detects the bending (warpage) of the glass substrate and the gap of the outer periphery of the glass substrate based on the image acquired by the image acquiring unit . This invention is an invention of a laser processing apparatus that realizes a laser processing method recorded in the first feature of the laser processing method.

本發明的太陽電池板製造方法的特徵在於:使用所述 第1特徵至第4特徵中任一項所述的雷射加工方法、或者 所述弟1特徵至第4特徵中任一項所述的雷射加工襄置來 製造太陽電池板。此發明是使用所述雷射加工方法或者所 述雷射加工裝置的任一者來製造太陽電池板的發明。 【發明的效果】 根據本發明,具有能夠盡可能地縮短雷射束的加工 間的效果。 為讓本發明之上述和其他目的、特徵和優點能更明顯 易懂,下文特舉較佳實施例,並配合所附圖式,作詳細說 明如下。 ' β 【實施方式】 一以下,根據圖式來說明本發明的實施方式。圖2是表 :雷工裝置的概略構成的圖。 虎理疋物太陽電池板製造裝㈣雷射束加工 將進步驟的裝置。本發明的f射加工裝置中, 部位,在•射準部設置在^加工台的兩側這兩個 等待時間 處理巾同時進行解處理’㈣縮短了 11 201043371 圖2是表示本發明的太陽電池板製造裝置的往返 (return)方式的一例的圖。此製造裝置包括搬入/搬出機 械手台14_1及雷射加工台1〇1。輥式輸送機121在成膜裝 置、(未圖不)與進行雷射刻劃加工處理的製造裝置間依次 搬送玻璃基板lx〜玻璃絲lz。搬人/搬出麵手台141 包括將在輥式輸送機m上搬送的通過前段的成膜裝置 (未圖示)而成膜的玻璃基板1χ搬入以作為玻璃基板im '暫夺保持、並且將玻璃基板的表背面翻轉的表背 面翻轉機構部143’根據雷射加工處理的内容而將玻璃基 板lm翻轉後搬送到雷射加工台1〇1。此時,搬入/搬出機 械手台141構成為如下:雜表背面轉後的㈣基板〜 直接搬送到雷射加I台1(n,並且將經表背面翻轉後的玻 璃基板lm以輥搬送到雷射加工台1〇1的右端位置後搬送 到雷射加工台1G1。另外,搬入/搬出機械手台141利用表 背面翻轉機構部143而將在雷射加工台1〇1上加工後的玻 璃基板直接接收,或者將在f射加4 101的右端位置接 收的玻璃基板lr以輕搬送或氣浮(air n〇ating)搬送到表 背面翻轉機構部143,並利用表背面翻轉機構部M3而將 雷射加工處理後的玻璃基板的表背面翻轉後,搬送到輥式 輸送機121。 雷射加工台101在從搬入/搬出機械手台141搬入的玻 璃基板上的薄膜上形成劃線,所述雷射加工台1〇1包括: 對準部102、104 ;抓爪部106、108 ;抓爪驅動部110 ;及 加工區域部112。對準部1〇2將搬入/搬出機械手台141的 12 201043371 表背面翻轉機構部143上的麵基板lm予轉收,向規 定位置對所接收的玻璃基板ln進行對準處理,並且將在加 工區域部U2中實施了刻劃加工處理的玻璃基板化搬出到 搬入/搬出機械手台141的表背面翻轉機構部143。另一方 面,對準部104將由搬入/搬出機械手# 141的表背面翻轉 機構部143進行了表背面翻轉的玻璃基板且以輕搬送或者 氣浮搬送到雷射加工自101右端為止的玻璃基板k予以接 〇 &amp; ’向規定位置對所接收的玻縣板進行對準處理,並且 將在加工區域部112中實施了刻劃加工處理的玻璃基板lq 搬出到搬入/搬出機械手台141的右端位置。 抓爪部106對利用對準部1〇2進行對準處理後的玻璃 基板1〇予以保持。抓爪部1〇8對利用對準部1〇4進行對準 處,後的玻璃基板lq予以保持。進行雷射加工時,抓爪驅 ,邛110使由抓爪部1〇6、抓爪部1〇8所保持的玻璃基板 加工區域部112的雷射束同步地,在玻璃基板i。與虛線 表不的玻璃基板lp之間移動。加工區域部112對由抓爪部 u m抓爪部⑽所保持的玻璃基板1G、玻璃基板lq照射 雷射束而進行規定的劃線的加工處理。圖2中,表示了一 =使由抓爪1〇6所保持的玻璃基板1〇移動到虛線所表示 =玻璃基板lq的位置為止…邊進行規定_線加工的狀 態。 、,圖2的往返方式的太陽電池板製造裝置的動作的一 ^進行°兒明。首先,通過搬人/搬出機械手台141,將從前 又的成膜裂置經由親式輸送機m搬送來的玻璃基板&amp; 13 201043371 ^為f璃基板&amp;的時㈣在表背面轉機構部143 璃板lm的表f面翻轉。將表#_轉後的玻 离基板lm搬送到雷射加工台1〇1㈣準部1〇2,在 部102上進行對準處理。對準處理後的玻璃基板ln由抓爪 = 106保持著,並作為玻璃基板lQ、lp而移_加工區域 ° ,來進行規定的劃線加工處理。另一方面,在靜準 部102的對準處理時以及加工@_ 112 &gt; ,過搬入/搬域械手台⑷,將經由輥式輸送機⑵搬送 來的下一玻璃基板ly作為玻璃基板101而暫時保 面翻轉機構部143上,並將玻璃基板lm的表背面翻^ 將表背_轉後的玻璃基板lm作為玻璃基板卜而以輕搬 达到與雷射加工台1()1的對準部刚對應的右端位置為 ^將玻璃基板lr搬送到雷射加工台1〇1的對準部, 亚在此對準部104上進行對準處理。對準處理後的玻璃基 板lq由抓爪部108保持著,並等待到對抓爪部1〇6所保持 的玻璃基板的加工處理結束為止。 當對抓爪部106所保持的玻璃基板的雷射加工處理結 束時,抓爪部106所保持的玻璃基板1〇經由對準部1〇2 而從玻璃基板In的位置作為表背面翻轉機構部143上的玻 璃基板lm被暫時保持著,並在此表背面翻轉機構部143 上進行表背面翻轉後搬送到輥式輸送機121上,以向下一 段的成膜裝置搬送。另一方面,在抓爪部1〇6所保持的玻 璃基板1〇於對準部1〇2上作為玻璃基板ln而移動的時間 點,將抓爪部108所保持的玻璃基板lq作為玻璃基板1〇、 14 201043371 ΐρ而移動到加工區域部112,來進行規定的劃線加工處 理。圖2的往返方式的太陽電池板製造裝置中,通過交替 地反復進行以上處理,而將對準處理的特時間等大幅縮 短而且,即便任一對準部發生故障時,也可以使用另一 對準部來繼續進行處理。 ^圖3是表示進行劃線加工處理的圖2的加工區域部的 詳、’、田構成的圖。加工區域部包括底座1 〇、χγ載台 Ο Ο (table)20、抓爪部106、雷射產生裳置4〇、光學系統構件 50、線性編碼器(linearenc〇der) 7〇、控制裝置8〇以及檢 測光學系統構件等。在底座1G上,設置有沿著底座10的 X轴方向及Y軸方向(XY平面)而受到驅動控制的χγ 載台20。 ΧΥ載台20被控制為向X方向及γ方向移動。另外, 作為ΧΥ載台2〇的驅動單元使用的是滾珠絲权㈤ screw)或線性電動機(linearm〇t〇r)等,圖3中 些驅動單ϋ的圖示。在XY載台2G的上側,由抓爪部^ 保持著作為雷射加工對象的玻璃基板i。另外,在 上設置有一邊保持著光學系統構件50 一邊在丫轴-。 滑動驅動的滑動架(slide frame) 30。χγ栽A 白上 以Z轴為旋轉轴而在θ方向上呈可旋轉。而且,二,成為 過滑動架30而充分確保χγ載台20在γ軸方田可以通 量時,所述XY載台20也可以為僅進行χ軸;^的移動 的構成。此時,ΧΥ載台20也可以為X車由栽台的向的移動 外,圖3中省略了對準部1〇2、104的圖示。〇、成。另 15 201043371 滑動架30安裝在設置於底座10上的四角的移動臺 動台辑^ 的;、妬之曰。又置了減振構件(未圖示)。在滑動架30 ==1上’設置有魏產縫置4G、光學系統構件50 ^制裝置80。光學系統構件50是由鏡面(mirr〇〇、 ^^ 〇enS)的組合所構成’將雷射產线置40中所產 ^的每射束分割成四系列,並引導到χγ載台2〇上的玻璃 土 1上。另外’雷射束的分割數目並不限定於四系列, 只要為兩系列以上即可。 ’、 線性編碼器70包括:設置在χγ載台2〇的χ轴移動 載。的側面的標尺(seale)構件;及安裝在抓爪部ι〇6上 的檢測部。線性編碼器7〇的檢測信號被輸㈣控制裝置 8〇 °控制裝置80根據來自線性編碼器、7〇的檢測信號而檢 測抓爪部106在X轴方向上的移動速度(移動頻率),並 控制雷射產生裝置4〇的輸出(雷射頻率)。 如圖3所示,光學系統構件5G設置在底板31的側面 側’且構成為沿著底板31的側面而在Y軸方向上移動。 光學系統構件50的前端部能夠以Z軸為中心而旋轉。底 板31上3又置有檢流計鏡(gaivan〇 订沉)%,用來將從 雷^產生裝置4G出射的雷射束引導職學系統構件5〇。 檢流計鏡33是使用兩個電動機(旋轉編碼器(r〇tary enC〇der))而在XZ二維區域中掃描雷射束。檢流計鏡% 以雙軸式(X,Z)構成,且包括兩個電動機、及安裝在此 電動機上的鏡面。檢流計控制裝置331包括用來驅動電動 16 201043371 機的驅動器(driver)及電源、以及控制這些驅動器及電源 的微型計算機(microcomputer)等。 ' 鏡面34、鏡面35設置在光學系統構件50上,且與光 學系統構件50的滑動移動聯動。從雷射產生裝置4〇出射 的雷射束由檢流計鏡33向鏡面34反射,朝向鏡面34的雷 射束由鏡面34向鏡面35反射。鏡面35經由底板31上所 6又置的貫通孔,而將來自鏡面34的反射雷射束引導到光學 ❹ 系統構件50内。而且,只要是構成為將從雷射束產生裝置 40出射的雷射束,從底板31上所設置的貫通孔且自上側 導入到光學系統構件5〇内,則可以採用任意的構成。例 如,也可以將雷射產生裝置40設置在貫通孔的上侧,將雷 射束經由貫通孔直接引導到光學系統構件50内。 在檢流計鏡33與反射鏡面34之間的光學系統構件5〇 上,以旎夠與光學系統構件5〇的滑動移動一起移動的方式 ,置有光束採樣器(beam sampier) 332 ^光束採樣器332 讀雷射束的—部分(例如’雷射束的約10%左右或10% 以下的光篁)進行採樣並分支輸出到外部的元件。四象限 光電一極體(quadrantphotodiode) 333配置為在光接收面 的大致中央附近,接收由光束採樣器332分支的雷射束的 、部分(採樣光束)。將與通過四象限光電二極體333檢 /貝J出的田射束的強度對應的四種輸出信號輸出到檢流計控 制裝置33M-檢流計控制裝置331根據來自四象限光電 二極體333的四種輸出信號,而即時㈣time)地驅動 控制檢流計鏡33的兩個電動機33xy、如。電動機3坳 201043371 進行控制而使檢流計鏡33的反射雷射束在與底板31的上 表面(XY平面)平行的面内旋轉移動,電動機33yz進行 即時控制而使檢流計鏡33的反射雷射束在平行於與底板 31的上表面正交的面(YZ平面)的面内旋轉移動。 圖4是表示光學系統構件50的詳細構成的圖。實際上 的光學系統構件50的構成較為複雜’這裏為了使說明較為 簡單而簡化圖示來表示。圖4是從圖3的-X轴方向觀察光 學系統構件50的内部的圖。如圖4所示,底板31上具有 貫通孔37 ’用來將由鏡面35所反射的雷射束導入到光學 系統構件50内。在此貫通孔37的正下方設置有相位式繞 射光學元件(DOE : Diffractive Optical Element) 500,來 將高斯(Gaussian)強度分佈的雷射束轉換成頂帽型(t〇p hat)強度分佈的雷射束。 通過DOE 500而轉換成頂帽型強度分佈的雷射束(頂 帽型光束)的雷射束’由半鏡面5U分別分支成反射光束 與透過光束’反射光束向右方向的半鏡面512前進,透過 光束向下方向的反射鏡面524前進。在半鏡面5Π上反射 的光束,由半鏡面512進一步分支成反射光束與透過光 束,反射光束向下方向的反射鏡面522前進,透過光束朝 向右方向的反射鏡面521前進。透過半鏡面M2的光束由 反射鏡面521反射,並經由下方向的聚光透鏡541照射到 玻璃基板1上。在半鏡面512上反射的絲,由反射鏡面 522、反射鏡面523反射,並經由下方向的聚光透鏡542 照射到玻璃基板i上。透過半鏡面511的光束由反射鏡面 18 201043371 524反射並向左方向前進。在反射鏡面524上反射的光束, 由半鏡面513分支成反射光束與透過光束,反射光束向下 方向的反射鏡面526前進,透過光束向左方向的反射鏡面 528前進。在半鏡面513上反射的光束由反射鏡面526、反 射鏡面527反射,並經由下方向的聚光透鏡543照射到玻 璃基板1上。透過半鏡面513的光束由反射鏡面528反射, 並經由下方向的聚光透鏡544照射到玻璃基板丨上。 ❹ 通過DOE 500而轉換的頂帽型光束由所述的半鏡面 511〜半鏡面513以及反射鏡面521〜反射鏡面528透過、 反射後被引導到聚光透鏡541〜聚光透鏡544。此時,將從 DOE 500起到各聚光透鏡541〜聚光透鏡544為止的光程 長設定為相等。也就是說,以下各光程長分別為相等距離: 在半鏡面511上反射的光束透過半鏡面512由反射鏡面 521反射後到達聚光透鏡541為止的光程長;在半鏡面511 上反射的光束由半鏡面512、反射鏡面522、反射鏡面523 分別反射後到達聚光透鏡542為止的光程長;透過半鏡面 〇 511的光束由反射鏡面524、半鏡面513、反射鏡面526、 反射鏡面527分別反射後到達聚光透鏡543為止的光程 長;透過半鏡面511的光束在反射鏡面523上反射後透過 半鏡面513,然後在反射鏡面528上反射後到達聚光透鏡 544為止的光程長。由此,即便在光束分支之前配置DOE 500’也可以將頂帽型強度分佈的雷射束相同地引導到聚光 透鏡541〜聚光透鏡544。另外,圖4的實例中對光程長完 全一致的情況進行了說明,但是也可以在能夠維持雷射束 19 201043371 的頂帽型強度分佈的朗内使絲長有若干不同。 快門(shmter)機構531〜快門機構534是在從光學 系統構件50的各聚光透鏡541〜聚光透鏡出射的雷射 束偏離玻璃基板1時,遮蔽雷射束的出射。自動對焦用測 距系統52、自動對焦用測距系統54包括未圖示的檢測光 照射用雷㈣與自動對焦用光電二極體,自騎焦用測距 系統52、自騎焦用測距系統54接收從檢測光照射用雷 射器照射的光巾自麵純!的表面反㈣反射光,並根 據此反射光量而上下驅動光學系統構件5〇内的聚光 54i〜聚光透鏡544,來調整聚光透鏡541〜聚光透鏡糾 相對於玻絲板丨的高度(聚光透鏡541〜聚光透鏡5糾 的焦距)。另外’圖4中未圖示焦距調整用驅動機構。 圖5是表不第1檢測光學系統構件及第2檢測光學系 統構件的構成的不意圖。第1檢測光學系統構件包括聚光 透鏡高度測距系統2 6、及焦距與光軸調整用電荷耦合元件 (charge coupled device,CCD)照相機 28。圖 5 中,由於 重複表示有聚光透鏡尚度測距系統26、及焦距與光軸調整 用CCD照相機28,所以用符號來加以區分。在通過圖4 中所記載的自動對焦用測距系統5 2、自動對焦用測距系統 54來調整從玻璃基板1到光學系統構件5〇的兩侧下表面 為止的高度時’即便能夠使光學系統構件5〇的下表面的高 度相同,也不一定能夠使從玻璃基板1到各聚光透鏡541 〜聚光透鏡544為止的高度相同。所以本實施方式中,在 XY載台20的X軸方向上的任一側面(圖中為χγ載台 20 201043371 20的-X軸方向的側面)安裝有聚光透鏡高度測距系統26, 來分別測定從玻璃基板1到各聚光透鏡541〜聚光透鏡544 為止的高度。與通過聚光透鏡高度測距系統26檢測出的各 聚光透鏡541〜聚光透鏡544的高度對應的信號被輸出到 控制裝置80。控制裝置80對從玻璃基板丨到各聚光透鏡 541 1光透鏡544為止的馬度是否合適進行判定。根據聚 光透鏡高度測距系統26的測距結果,來調整各聚光透鏡 〇 541〜聚光透鏡544的配置(高度)。此時,可以手動或自 動地調整此聚光透鏡541〜聚光透鏡544的配置(高度)。 而且,如果使用聚光透鏡高度測距系統26來測定光學系統 構件50的下表面的高度,則可以省略自動對焦用測距系統 52、自動對焦用測距系統54。 焦距與光軸調整用CCD照相機28是設置在XY載台 20的X軸方向上的任一側面(圖中為χγ載台2〇的_χ方 向的侧面)且鄰接於聚光透鏡高度測距系統26的位置(附 近)。焦距與光軸調整用CCD照相機28將XY載台20 與光學系統構件50的各聚光透鏡541〜聚光透鏡544的位 置建立關聯,且設置為能夠看到XY載台20的上空侧。通 過焦距與光軸調整用CCD照相機28才白攝的影像被輸出到 控制裝置80。控制裝置80對從各聚光透鏡541〜聚光透鏡 544出射的雷射束的光軸是否合適進行判也就是說, ^於焦距與光軸調㈣CCD照相機28可以直接觀察從光 予系統構件50的各聚光透鏡541〜聚光透鏡544出射的雷 射束,所以通過使雷射束圖像化,控制裝置80能夠對各聚 21 201043371 ΐ透?/卜41二聚_鏡544的焦距及光軸是否合適進行判 二在對雷射產生裝置奶、光㈣統構件5。等與 距及光轴。另外,當;,地調整更細 的圖像並加以數字化頭時,通過獲取各雷射束 了適‘地調整不均勻性。 光學系統構件5G ^9=束_93設置在向 中,光束採樣器92 tm射束的光程中。本實施方式 40與反射铲 米樣态93設置在雷射產生裝置 是對雷射二束採樣11 92、光束採樣器93 下的光量)進行採二丄’雷射束的約4%左右或4%以 二極體94配置為^光二輪_外部的元件。高速光電 採樣器92分大財央附近接收由光束 通過高速光電1體Γ射束的—部分(採樣光束)。與 輸出信峨_的雷射束㈣度對應的 器93分支而輪出的中央附近接㈣光束採樣 轴檢查用CCD昭 束的一科(採樣光束)。通過光 80中。另外,光祕杏/攝的影像被輸出到控制裝置 照射到高速光電二極^ 9 機%也可以取入表示 此圖像輸出到控制的雷射束的位置的圖像,並將 22 ❹ 〇 201043371 測抓輔7G的檢測信號而檢 控制雷射產生裝置移動頻率),並 祕電一極體94及光轴檢查用CCD照相機 β 檢測從雷射產生裝罟4η山1 m .. 出射的雷射束的脈衝遺漏,或者根 处/土、先轴偏移量而控制雷射產生裝置40的出射條 二SSI光學系統構件5〇内導入雷射束的反射鏡 _〇1)。 5的配置等進行反饋控制(鈿祕 域Β圖二ΐιίΐ圖2的控難置8〇的處理的詳細情況的方 82、警報產生單元83其隹支单兀81、脈衝遺漏判定單元 87 〇aSer C〇ntr^r) 86 ^ it 熊产杳置-⑽、 透鏡尚度調整單兀88、照射雷射狀 〜、欢二早二89以及照射雷射調整單元8A。 =支單元81將線性編碼器7〇的檢測信號(時鐘脈衝 播、f _)刀支並輸出到後段的雷射控制器86。脈 雷射束強輸入有來自高速光電二極體94的與 雷^束強度對應的輪出域(二極體輸出)和從分支單元 雷後,根據這些信號來判定 。圖7 (A)〜圖7 (〇是表示圖6的 脈衝遺漏判定早元82的動作的一例的圖。圖7 (Α)〜圖 表示從分支單元81輪出的檢測信號 、里、_ 、—例,圖7 (Β)表示從高速光電二極體 23 201043371 94輸出的與雷射束強度對應的輸出信號 一例,圖7 (C)表示脈衝遺漏判定單元 掏)的 遺漏時所輸丨的警報信制i。 #_出_ 如圖7⑷〜圖7(C)所示,脈衝 以來自分支單元81的時鐘脈衝的下降 ’ 1疋早70 82 號(trigger signal),來判定二極體輸信^點作為觸發信 定的閣值Th,在二極體輸出值小於間 判定單元82向警報產生單元83輪 子脈衝遺漏 level singal)。在來自脈衝遺漏判定單1立準仏號(hl§h 準(Mevd)變成高位準的時間點,馨的^號從^位 表示產生了脈衝遺漏的警報通知給。生早兀83將 像顯示、發磬箄各錄太、s 〇 §報可以通過圖 員(operator)可以意識到產生了脈 。操乍人 報頻繁地產生時,意味著雷射羞 ’、。另外,在該警 用壽命已盡。 财线置的性能劣化或者使 基準CCD圖像存儲單元84中 準CCD圖像84a。此基準 有如圖6所不的基 用CCD照相機%的光接收 咏表不在光軸檢查 圖像。從光軸檢查用CCDm央接收雷射束的狀態的 被檢查圖像祝。細偏中輸出如圖6所示的 查用CCD照相機96 單元85取入來自光轴檢 像85a與基準咖圖像=查^象85a,並將此被檢查圖 量,並將此偏移量輪出到雷=比較’來測量光軸的偏移 檢查用⑽照相機96輪]出雷=制器86。例如,在從光轴 1出了如圖6所示的被檢查圖像85a 24 201043371 那樣的圖像時,光軸偏移量測量單元85對兩圖像加以比 ,,來剩量又軸方向及γ軸方向上的偏移量,並將此偏移 量輸出到雷射控制器86。雷射控制器86對與雷射束的光 轴有關的裝置、即’雷射產生裝置4〇的出射條件或用來向 光學系統構件50内導入雷射束的反射鏡面33〜反射鏡面 35的配置等進行反饋調整,以使得被檢查圖像85a與基準 CCD圖像84a 一致。 ❹ 透鏡位移量測量單元87在輸入有與通過聚光透鏡高 度測距系統26所檢測出的各聚光透鏡541〜聚光透鏡544 的同度對應的信號後,判定各聚光透鏡541〜聚光透鏡544 的咼度是處在容許範圍内,還是與此容許範圍有較大的偏 差’並將表示對有較大偏差的聚光透鏡541〜聚光透鏡544 的咼度進行多大程度的調整為佳的控制信號輸出到透鏡高 度調整單元88。透鏡高度調整單元88根據來自透鏡位移 量測1單元87的控制信號而調整各聚光透鏡541〜聚光透 鏡544的配置。另外,當不存在聚光透鏡541〜聚光透鏡 〇 544的高度調整機構時,透鏡高度調整單元88也可以根據 來自透鏡位移量測量單元87的控制信號,將對聚光透鏡 541〜聚光透鏡544中的哪一個進行多大程度的調整為佳 的調整信息傳達(可見顯示、發出聲音等)給操作人員。 照射雷射狀態檢查單元89獲取來自焦距與光轴調整 用CCD照相機28的圖像89a,並根據此圖像8%來測量 焦距及光轴的偏移量,將此偏移量輸出到照射雷射調整單 元8A。例如,在從焦距與光轴調整用CCD照相機輸出如 25 201043371 圖6所7^的圖像89a時,照射雷射狀態檢查單元89以圖像 89&amp;内的圓形輪靡線89b (與聚光透鏡541〜聚光透鏡544 的外n對應的線)為基準而檢測焦點圓映(圖像89a 内的小圓)的位置’並根據焦點圓89c是否位於輪廓線8% 的大致:央來測量光軸的X軸及Y軸方向上的偏移量,將 此偏移量輸出到照射f射調整單元8 A。另外,照射雷射狀 態檢查單元89測量焦點圓89c的大小(面積),並將基於 $的焦齡照射f賴整料SA。騎雷射調整 單元8A根據來自照射#射狀驗查單元89的與光轴的偏 移量及焦點位置對應的信號,而對絲魏構件%内的各 半鏡面511〜半鏡面513以及反射鏡面521〜反射鏡面528 的配置等進4了反饋調整。另外’也可以省略透鏡高度調整 單元88及照射雷射單元认,而使雷射控㈣%具有 這些單元的功能。 所述實施方式中,對在雷射加工(刻劃加工)時利用 光軸偏移量測量單元85來檢查雷射束的光軸偏移,並利用 脈衝遺漏判定單it 82來檢查脈衝遺漏的情況進行了 ^ 明,但是也可以如圖8所示,根據來自高速光電二極體舛 的輸出波形而檢查雷射束的脈衝狀態。例如,圖8中可以 測量雷射束的脈衝寬度及脈衝高度,並在這 ^ 脈衝高度出現異常時發出警報。而且,針^ ^寬度及 寬度’在來自高速光電二極體94的輪出波形大於 值的期間處在規定範圍内時判定為脈衝寬度正片',、,疋 述期間大於或小於此規定範圍時判定為脈&amp;寬^異:並: 26 201043371 出警報。另外,對於雷射束的脈衝高度,在來自高速光電 二極體^94的輸出波形的最大值存在於容許範圍内時判定 =脈,兩度正常’而在所述最大值大於或小於此容許範圍 時判定為脈衝高度異常並輸出警報。如此,經常地對雷射 ^進仃採樣,所以能夠即時地管理脈衝寬度、脈衝高度(功 ^ (power))等的雷射束的品y。如果上述的脈衝遣漏頻 ’、發生’則可以判斷為雷射產生裝置的性能劣化或者 〇 用壽命已盡。 圖9(A)〜圖9(C)是從下側(基板側)觀察圖3 的光學系統構件的圖。圖9⑷〜圖9 (c)中表示光學 系統構件50與底板31的一部分。圖9 (A)是表示圖3 ^不的光學系統構件50與底板31的位置關係的圖,如圖 八)所示,光學系統構件50的端面(圖的上側端部) 二底板31的端面(圖的上側端部)—致。圖9 (B)是表 =光學系統構件50以貫通孔37的中心為旋轉軸而相對於 ❾ 逆時針旋轉約30度的狀態的圖。圖9 (C)是表示 :學系统構件50以貫通孔37的中心為旋轉轴而相對於底 板31逆時針旋轉約45度的狀態的圖。 本實施方式的太陽電池板製造裝置中,光學系統構件 ,成為U雷射束的導人孔即貫通孔37財心為旋轉轴 =夠自由旋轉。也就是說,作為分支單元的光學系統構 0、被控制為以圖4的從反射鏡面35起通過d〇E 500並 =向半鏡面511㈣直雷射束的行進方向為中心軸而旋 轉。由此,能夠自由地以可變方式控制雷射束的分支方向 27 201043371 ^雷射束相對於基板的相對移動方向(圖 中的垂直方向)所成的角度θ。另外,(m) 的旋轉驅動單元,可以使用滾珠絲杠或線性 示的技咖’圖9 (A)〜圖9 (c)中省略了這些單元的圖 如圖9(A)〜圖9((^你·- „ 支方向與雷射束的掃描方向I圖, 所成的角度進行可變控制時,d〇e 500也ΐ構 =兄I承先透鏡544内所示,雷射束的昭射 出如虛線正方形那樣的照射形狀。因此絲 ^ 構件料旋轉㈣-起使卿·旋轉, 此旋轉量相二旋 位於劃線的兩方形的角部會 本實施方式所示,通過形成為即便旋轉控制二『:構3 so .,,, η〇Ε 5〇〇 ^^ ;^);^ ::透=\(Γ9(Α)〜圖9(c)的垂直方向)與 2 =:产鏡544内的虛線正方形的左右兩邊 便旋棘今去i的兩侧棱線形成為極其平滑,而且,即 束的光程中僅設置;==== 28 201043371 也可以在分支後的各聚光透鏡之前分別設置doe。此時也 必須構成為即便旋轉控制該光學系統構件50也不使各 DOE旋轉。可以通過以與該光學系統構件50分離的形態 而將DOE 500直接連結設置在底板31上,來使DOE 500 獨立於光學系統構件50的旋轉。 圖10 (A)〜圖1〇 (C)是表示光學系統構件的旋轉 量與劃線的間距寬的關係的圖。圖1〇 (A)是表示在如圖 〇 9 (A)所示的光學系統構件50未旋轉的狀態下進行雷射 刻劃加工處理時的劃線的狀態的圖,圖10 (B)是表示在 如圖9(B)所示的光學系統構件50旋轉約30度的狀態下 進行雷射刻劃加工處理時的劃線的狀態的圖,圖1〇 (C) 是表示在如圖9 (C)所示的光學系統構件50旋轉約45 度的狀態下進行雷射刻劃加工處理時的劃線的狀態的圖。 如果將圖10 (A)的情況下的劃線的間距設為p〇,則圖10 (B)的情況下的間距P30為P〇xcos30。,圖10 (C)的情 q 況下的間距P#為P〇xcos45。。如此,本實施方式的太陽 電池板製造裝置可以通過適當地調整光學系統構件5〇的 旋轉角度’而將劃線的間距寬適當地可變調整為所需的值。 圖η (A)、圖u (B)是表示圖2的對準部1〇2、 對準部104中所設置的基板檢測照相機系統的一例的圖。 圖11 (Α)是表示玻璃基板與基板檢測照相機的關係的側 視圖’圖11 (Β)是表示玻璃基板與基板檢測照相機的關 係的頂視圖。在對準部1〇2、對準部1〇4中設置有基板檢 測照相機系統及對準照相機系統,來進行玻璃基板的檢測 29 201043371 處理及玻璃基板的對準處理。當將玻璃基板丨載置在對準 部102、對準部1〇4上時,基板檢測照相機65〜基板檢測 照相機68從玻璃基板1的上侧獲取玻璃基板丨的四角附近 的圖像。圖11 (A)、圖11 (B)中表示將玻璃基板i載 置在對準部102、對準部104上,且由抓爪部1〇6、抓爪部 108保持著於X轴方向移動而即將投入到雷射加工台1〇1 之前的狀態。圖11 (B)中所示的圖像65a〜圖像68a,是 通過基板檢測照相機65〜基板檢測照相機68所獲取的玻 璃基板1的四角附近的圖像。因為基板檢測照相機65〜基 板檢測照相機68的相對位置關係為預先設定的已知值,所 以如圖像65a〜圖像68a所示,將無翹曲或彎曲的玻璃基 板1的四角的各頂點,設定為位於基板檢測照相機65〜基 板檢測照相機68的拍攝範圍的大致中央附近。因此,當圖 像65a〜圖像68a中各頂點的位置偏移時,可以根據此偏 移量而檢測出玻璃基板1的彎曲(翹曲)。而且,可以根 據圖像65a〜圖像68a而檢測出玻璃基板丨的四角附近的 缺口。另外,通過使基板檢測照相機65〜基板檢測照相機 68沿著玻璃基板1的各邊移動,可以檢測出玻璃基板1的 各邊的缺口。 圖12 (A)〜圖12 (C)是表示圖2的對準部1〇2、 對準部104中所設置的基板檢測照相機系統的另一例的 圖。圖11 (A)、圖11 (B)的實施方式中,將基板檢測 照相機65〜基板檢測照相機68設置在基板1的四角附近 的上部,而本實施方式中,是使兩台基板檢測照相機65、 30 201043371 Ο ❹ 基板檢測照相機68位於玻璃基板丨的對角附近的上側。圖 12 (Α)中,在將玻璃基板丨載置在對準部1〇2、對準部 104上的狀態下,使虛線所示的玻璃基板i從該虛線位置 按箭頭指示向右侧移動,而移動到實線所示的玻璃基板i 的位置(基板檢測照相機65、基板檢測照相機68位於玻 璃基板1的對角的上部的位置在此玻璃基板丨移動時, 基板檢測照相機68獲取移動的玻璃基板丨的邊la的圖 像。接著’當基板的移動結束時,基板檢測照相機65、基 板檢測照相機68獲取玻璃基板!的對角附近的頂點的圖像 (圖11的圖像65a、圖像68a)。然後,在玻璃基板i停 止的狀態下,基板檢測照相機65、基板檢測照相機68如 圖12 (B)所示沿著虛線箭頭移動。在此基板檢測照相機 65、基板檢測照相機68移動時,基板檢測照相機&amp;獲取 玻璃基板1的邊ib的圖像,基板檢測照相機68獲取玻璃 基板1的if lc的圖像。當基板檢測照相機65、基板檢測 照相機68的移動結束時,基板檢測照相機65、基板檢測 照相機68獲取玻璃基板工的另—對角附近的頂點的圖像 ,11的圖像66a、圖像67a)。之後,在基板檢測照相 機65、基板檢測照相機68停止的狀態下,玻璃基板ι如 =2 (C)所不’纽所不的麵基板丨觀虛線位置按 =箭頭指柏右侧軸’而鶴職線所示的玻璃基板i 较^置。在此玻璃基板1移動時,基板檢測照相機65獲取 f動的玻璃基板1的邊1d _像。通過所述的-系列動 ’可以使用兩台基板檢測照相機65、基板檢測照相機 201043371 68,而與圖U (A)、圖u⑻的情況相同地獲取圖像 65a〜圖像咖及基板丄的各邊的圖像。由此,可以根據圖 像65a〜圖像68a的各頂點的位置的偏移量而檢測出玻璃 基板1的彎曲(躺)或基板丨的各邊的缺口。而且,在 -系列檢測動作結束之後,可以使基板檢測照相機65、基 板檢測照相機68回歸到圖12⑷的初始位置,也可以不 回歸而進行相反的動作。 圖13是表示圖2的對準部1〇2、對準部1〇4中所設置 的對準照相I魏的-例關。解照相機祕獲取玻璃 基板1的兩端部(X軸方向的前後邊緣部)附近的圖像。 此對準照相機純所獲㈣圖像被輸出龍制裝置8〇 中。控制裝置80將來自對準照相⑽統的圖像與玻璃基板 1的ID數據起儲存到資料庫(加^咖)單元中,並用 於此後的玻璃基板1的對準處理。圖13是表示最初刻劃處 理前的對準部的一例的圖,圖14表示第二次或第二次之後 的刻劃處理前的對準部的—例的圖。首先,如圖;;所示, 在將玻璃基板1載置在對準部撤、對準部iG4上的狀態 下,使玻璃基板1的左側端部的下侧邊緣部抵接於定位^ 2卜使玻璃基板1的下側端部的左侧邊緣部抵接於定位銷 22 ’使玻璃基板1的下_部的右侧邊緣部抵接於定位銷 23 ’從而將玻璃基板丨定位在規定位置。在此狀態下對玻 璃基板1上的透明電_照射雷射束來執行關處理 初刻劃處理的結果’在破璃基板丨上以約1()麵 形成有劃線。 32 201043371 查I]線ϋ]中用多條劃線中位於基板中央附近的—條 二、山 :的對準照相機系統,獲取此劃線25的 的部位2^疋說包含劃線25與玻璃基板1的邊緣部 _ ' ° 29附近的圖像27a、圖像29a。如觀察 =像27a、圖像29a得知,因為圖像中包含劃線25的圖像 二玻璃基板1的邊緣部的形狀的圖像的雙方,所以容易進 ^圖像識別處理1過控制裝置80㈣所獲取的圖像The method for producing a solar panel according to the present invention, characterized in that the laser processing method according to any one of the first to fourth aspects, or the one of the first to fourth features The laser processing device is used to manufacture solar panels. This invention is an invention for manufacturing a solar panel using either the laser processing method or the laser processing apparatus. [Effects of the Invention] According to the present invention, there is an effect that the processing interval of the laser beam can be shortened as much as possible. The above and other objects, features and advantages of the present invention will become more <RTIgt; 'β Embodiments Hereinafter, an embodiment of the present invention will be described based on the drawings. Fig. 2 is a view showing a schematic configuration of a lightning device; Tigers and scorpions solar panels manufacturing equipment (four) laser beam processing will be the step into the device. In the f-ray processing apparatus of the present invention, at the same time, the two waiting time processing sheets disposed on both sides of the processing table are simultaneously subjected to de-processing. (4) Shortened 11 201043371 FIG. 2 is a solar battery showing the present invention. A diagram of an example of a return mode of the board manufacturing apparatus. This manufacturing apparatus includes a loading/unloading machine table 14_1 and a laser processing table 1〇1. The roller conveyor 121 sequentially transports the glass substrate lx to the glass strand lz between the film forming apparatus, (not shown) and the manufacturing apparatus that performs the laser scribing processing. The carrying/removing hand 141 includes a glass substrate 1 that is formed by a film forming apparatus (not shown) that has been transported on the roller conveyor m, and is carried as a glass substrate The front and back inversion mechanism portion 143' in which the front and back surfaces of the glass substrate are inverted is inverted by the glass substrate lm according to the contents of the laser processing, and then transferred to the laser processing table 1〇1. At this time, the loading/unloading robot table 141 is configured as follows: (4) the substrate to the back surface of the miscellaneous table is directly transferred to the laser plus I stage 1 (n, and the glass substrate lm which has been inverted by the front surface is conveyed by a roller The right end position of the laser processing table 1〇1 is transported to the laser processing table 1G1. The loading/unloading robot table 141 uses the front and back turning mechanism unit 143 to process the glass processed on the laser processing table 1〇1. The substrate is directly received, or the glass substrate 1r received at the right end position of the f-addition 4 101 is transported to the front and back inversion mechanism portion 143 by light conveyance or air floating, and the front and back inversion mechanism portion M3 is used. The front and back surfaces of the glass substrate after the laser processing are reversed, and then transferred to the roller conveyor 121. The laser processing table 101 forms a scribe line on the film on the glass substrate carried in from the loading/unloading robot table 141. The laser processing table 1〇1 includes: alignment portions 102 and 104; gripper portions 106 and 108; a gripper driving unit 110; and a processing region portion 112. The alignment unit 1〇2 will be carried in/out of the robot table 141. 12 201043371 Surface back surface of the flip mechanism portion 143 The sheet lm is transferred, and the received glass substrate ln is aligned at a predetermined position, and the glass substrate subjected to the scribe processing in the processing region U2 is carried out to the loading/unloading robot table 141. On the other hand, the alignment unit 104 carries the glass substrate on which the front and back surfaces of the loading/unloading robot #141 are reversed by the front and back reversing mechanism unit 143, and is transported to the laser processing by light conveyance or air floatation. The glass substrate k up to the right end of the 101 is attached to and 'aligned' the received glass plate to a predetermined position, and the glass substrate lq subjected to the scribing process in the processing region 112 is carried out to carry in/ The gripper portion 106 is held at the right end position of the robot table 141. The gripper portion 106 holds the glass substrate 1A that has been aligned by the alignment portion 1〇2. The gripper portion 1〇8 is paired with the alignment portion 1〇4. At the same time, the rear glass substrate lq is held. When the laser processing is performed, the gripper drive 110 causes the laser of the glass substrate processing region portion 112 held by the gripper portion 1〇6 and the gripper portion 1〇8. Bunch synchronously, in glass The substrate i moves between the glass substrate lp and the glass substrate lp which is not shown by the broken line. The processing region portion 112 irradiates the glass substrate 1G and the glass substrate lq held by the grip portion um gripper portion (10) with a laser beam and performs predetermined scribing. In the processing of Fig. 2, a state in which the glass substrate 1 held by the gripper 1〇6 is moved to the position indicated by the broken line=the position of the glass substrate lq is performed, and the predetermined _ line processing is performed. The operation of the solar panel manufacturing apparatus of the reciprocating system of the second embodiment is carried out. First, the glass that has been transported by the parent conveyor m from the previous film formation is carried out by moving and unloading the robot hand 141. When the substrate & 13 201043371 ^ is the glass substrate &amp; (4), the surface f of the glass plate lm is inverted on the front and back rotation mechanism portion 143. The glass substrate lm after the table #_ has been transferred to the laser processing table 1〇1 (four) reference portion 1〇2, and alignment processing is performed on the portion 102. The glass substrate ln after the alignment process is held by the gripper = 106, and is moved as a glass substrate lQ, lp to the processing region ° to perform a predetermined scribing process. On the other hand, at the time of the alignment processing of the alignment unit 102 and the processing @_112 &gt;, the loading/removing robot (4) is passed, and the next glass substrate ly conveyed via the roller conveyor (2) is used as a glass substrate. 101, the surface protection flipping mechanism portion 143 is temporarily placed, and the front and back surfaces of the glass substrate lm are turned over. The glass substrate lm having the front and back turns is used as a glass substrate to be lightly moved to reach the laser processing table 1 (1). Immediately after the alignment portion is located at the right end position, the glass substrate 1r is transported to the alignment portion of the laser processing table 1〇1, and alignment processing is performed on the alignment portion 104. The glass substrate lq after the alignment process is held by the gripper portion 108, and waits until the processing of the glass substrate held by the gripper portion 1A6 is completed. When the laser processing of the glass substrate held by the gripper portion 106 is completed, the glass substrate 1 held by the grip portion 106 passes through the alignment portion 1〇2 and the position from the glass substrate In serves as the front and back inversion mechanism portion. The glass substrate lm on the 143 is temporarily held, and the front and back inversion mechanism portions 143 are reversed on the front and back sides, and then transported to the roller conveyor 121 to be conveyed to the film forming apparatus of the next stage. On the other hand, when the glass substrate 1 held by the gripper portion 1〇6 is moved on the alignment portion 1〇2 as the glass substrate ln, the glass substrate lq held by the gripper portion 108 is used as a glass substrate. 1〇, 14 201043371 ΐρ moves to the processing area unit 112 to perform predetermined scribing processing. In the reciprocating solar panel manufacturing apparatus of FIG. 2, by repeating the above processing alternately, the specific time of the alignment processing and the like are greatly shortened, and even if any of the alignment portions fails, another pair can be used. The department will continue to process. Fig. 3 is a view showing the details of the processing region portion of Fig. 2 in which the scribing process is performed. The processing area portion includes a base 1 〇, a χγ stage Ο table 20, a gripper portion 106, a laser generating skirt 4, an optical system member 50, a linear encoder (linear encoder), and a control device 8 〇 and detection of optical system components and the like. The base 1G is provided with a χγ stage 20 that is driven and controlled along the X-axis direction and the Y-axis direction (XY plane) of the base 10. The cymbal stage 20 is controlled to move in the X direction and the γ direction. Further, as the driving unit of the cymbal stage 2, a ball screw (a) screw or a linear motor (linear 〇 t〇r) or the like is used, and the driving unit of Fig. 3 is shown. On the upper side of the XY stage 2G, the glass substrate i which is the target of the laser processing is held by the gripper portion. Further, on the one side, the optical system member 50 is held while the x-axis is held. Slide-driven slide frame 30. Χγplant A White The Z axis is the rotation axis and is rotatable in the θ direction. Further, when the yoke stage 30 is sufficiently passed through the carriage 30 and the γ-axis stage 20 can be fluxed in the γ-axis field, the XY stage 20 may have a configuration in which only the y-axis is moved. At this time, the cymbal stage 20 may be an illuminating movement of the X car from the gantry, and the aligning portions 1 and 2, 104 are omitted in Fig. 3 . 〇, 成. Another 15 201043371 The carriage 30 is mounted on the four-corner moving table set on the base 10; A vibration damping member (not shown) is also placed. In the carriage 30 = =1 upper, a device 80 made of a sewing machine 4G and an optical system member 50 is provided. The optical system member 50 is composed of a combination of mirror surfaces (mirr〇〇, ^^ 〇enS). Each beam produced by the laser line 40 is divided into four series and guided to the χγ stage 2〇. On the glass soil 1 above. Further, the number of divisions of the laser beam is not limited to the four series, and it is only required to be two or more series. The linear encoder 70 includes a x-axis moving load provided on the χγ stage 2〇. a side ruler (seale) member; and a detecting portion mounted on the gripper portion ι6. The detection signal of the linear encoder 7〇 is input to the fourth control device 8, and the control device 80 detects the moving speed (moving frequency) of the gripper portion 106 in the X-axis direction based on the detection signal from the linear encoder, 7〇, and The output (laser frequency) of the laser generating device 4〇 is controlled. As shown in Fig. 3, the optical system member 5G is provided on the side surface side ' of the bottom plate 31 and is configured to move in the Y-axis direction along the side surface of the bottom plate 31. The front end portion of the optical system member 50 is rotatable about the Z axis. The bottom plate 31 is further provided with a galvanometer mirror (%) for guiding the laser beam emitted from the lightning generating device 4G to the vocational system component 5'. The galvanometer mirror 33 scans the laser beam in a two-dimensional region of XZ using two motors (rotary encoders). The galvanometer mirror % is constructed in a two-axis type (X, Z) and includes two motors and a mirror mounted on the motor. The galvanometer control unit 331 includes a driver and a power source for driving the electric motor 16 201043371, and a microcomputer for controlling the driver and the power source. The mirror surface 34 and the mirror surface 35 are disposed on the optical system member 50 in conjunction with the sliding movement of the optical system member 50. The laser beam emitted from the laser generating device 4 is reflected by the galvanometer mirror 33 toward the mirror surface 34, and the laser beam directed toward the mirror surface 34 is reflected by the mirror surface 34 toward the mirror surface 35. The mirror surface 35 guides the reflected laser beam from the mirror surface 34 into the optical ❹ system member 50 via the through holes that are again disposed on the bottom plate 31. Further, any configuration may be adopted as long as the laser beam emitted from the laser beam generating device 40 is introduced into the optical system member 5 from the upper side through the through hole provided in the bottom plate 31. For example, the laser generating device 40 may be disposed on the upper side of the through hole, and the laser beam may be directly guided into the optical system member 50 via the through hole. A beam samper 332 ^beam sampling is placed on the optical system member 5 之间 between the galvanometer mirror 33 and the mirror surface 34 in such a manner as to move together with the sliding movement of the optical system member 5 旎The 332 reads a portion of the laser beam (e.g., 'about 10% of the laser beam or less than 10% of the pupil) to sample and branch the output to an external component. The four-quadrant photodiode photodiode 333 is arranged to receive a portion (sampling beam) of the laser beam branched by the beam sampler 332 near the substantially center of the light receiving surface. The four output signals corresponding to the intensity of the field beam outputted by the four-quadrant photodiode 333 are output to the galvanometer control device 33M - the galvanometer control device 331 is based on the photodiode from the four quadrant The four output signals of 333, while driving (four) time, control the two motors 33xy of the galvanometer mirror 33, for example. The motor 3坳201043371 is controlled such that the reflected laser beam of the galvanometer mirror 33 is rotationally moved in a plane parallel to the upper surface (XY plane) of the bottom plate 31, and the motor 33yz performs immediate control to reflect the galvanometer mirror 33. The laser beam is rotationally moved in a plane parallel to a plane (YZ plane) orthogonal to the upper surface of the bottom plate 31. FIG. 4 is a view showing a detailed configuration of the optical system member 50. Actually, the configuration of the optical system member 50 is complicated. Here, in order to simplify the description, the illustration is simplified. Fig. 4 is a view of the inside of the optical system member 50 as seen from the -X-axis direction of Fig. 3 . As shown in Fig. 4, the bottom plate 31 has a through hole 37' for introducing the laser beam reflected by the mirror surface 35 into the optical system member 50. A phase diffractive optical element (DOE) 500 is disposed directly under the through hole 37 to convert a Gaussian intensity distribution laser beam into a top hat type (t〇p hat) intensity distribution. Laser beam. The laser beam 'converted to the top hat type intensity distribution laser beam (top hat type beam) by the DOE 500 is branched by the half mirror 5U into a reflected beam and a half mirror 512 of the transmitted beam 'reflecting beam to the right direction, The mirror 524 is advanced through the downward direction of the beam. The light beam reflected on the half mirror surface 5 is further branched into a reflected beam and a transmitted beam by the half mirror surface 512, and the reflected beam is advanced toward the mirror surface 522 in the downward direction, and the transmitted beam is advanced toward the mirror surface 521 in the right direction. The light beam that has passed through the half mirror M2 is reflected by the mirror surface 521, and is irradiated onto the glass substrate 1 via the condenser lens 541 in the lower direction. The filament reflected on the half mirror surface 512 is reflected by the mirror surface 522 and the mirror surface 523, and is irradiated onto the glass substrate i via the condenser lens 542 in the lower direction. The light beam transmitted through the half mirror 511 is reflected by the mirror surface 18 201043371 524 and proceeds to the left. The light beam reflected on the mirror surface 524 is branched by the half mirror surface 513 into a reflected light beam and a transmitted light beam, and the reflected light beam is advanced toward the mirror surface 526 in the downward direction, and the transmitted light beam is advanced toward the mirror surface 528 in the left direction. The light beam reflected on the half mirror surface 513 is reflected by the mirror surface 526 and the reflecting mirror surface 527, and is irradiated onto the glass substrate 1 via the condenser lens 543 in the lower direction. The light beam that has passed through the half mirror surface 513 is reflected by the mirror surface 528 and is irradiated onto the glass substrate by the condenser lens 544 in the lower direction. The top hat type light beam converted by the DOE 500 is transmitted through the half mirror surface 511 to the half mirror surface 513 and the mirror surface 521 to the mirror surface 528, and is guided to the collecting lens 541 to the collecting lens 544. At this time, the optical path lengths from the DOE 500 to the respective condensing lenses 541 to 544 are set to be equal. That is to say, the following optical path lengths are respectively equal distances: the optical path reflected on the half mirror surface 511 is transmitted through the mirror surface 512 and reflected by the mirror surface 521 to reach the collecting lens 541; the optical path length is reflected on the half mirror surface 511. The optical path length of the light beam reflected by the half mirror surface 512, the mirror surface 522, and the mirror surface 523 to reach the collecting lens 542 is long; the light beam transmitted through the half mirror surface 511 is reflected by the mirror surface 524, the half mirror surface 513, the mirror surface 526, and the mirror surface 527. The optical path length after reaching the condensing lens 543 after being reflected separately is long; the light beam transmitted through the half mirror 511 is reflected on the mirror surface 523 and then transmitted through the half mirror 513, and then reflected on the mirror surface 528 and then reaches the condensing lens 544. . Thereby, even if the DOE 500' is disposed before the beam branching, the laser beam of the top hat type intensity distribution can be guided to the condensing lens 541 to the condensing lens 544 in the same manner. Further, in the example of Fig. 4, the case where the optical path lengths are completely identical has been described, but it is also possible to make the filament length slightly different within the range in which the top hat type intensity distribution of the laser beam 19 201043371 can be maintained. The shutter mechanism 531 to the shutter mechanism 534 shields the emission of the laser beam when the laser beam emitted from each of the collecting lens 541 to the collecting lens of the optical system member 50 is deviated from the glass substrate 1. The autofocus distance measuring system 52 and the autofocus distance measuring system 54 include a detection light irradiation thunder (four) and an autofocus photodiode, a self-joking distance measuring system 52, and a self-riding distance measuring range (not shown). The system 54 receives the self-cleaning of the light towel irradiated from the laser for detecting the light irradiation! The surface is opposite (four) reflected light, and the condensing light 54i to the condensing lens 544 in the optical system member 5 is driven up and down according to the amount of the reflected light to adjust the height of the condensing lens 541 to the condensing lens relative to the glass plate 丨. (The focal length of the condensing lens 541 to the condensing lens 5). Further, the focal length adjusting drive mechanism is not shown in Fig. 4 . Fig. 5 is a schematic view showing the configuration of the first detecting optical system member and the second detecting optical system member. The first detecting optical system member includes a condensing lens height measuring system 26 and a charge coupled device (CCD) camera 28 for focal length and optical axis adjustment. In Fig. 5, since the condenser lens distance measuring system 26 and the focal length and optical axis adjusting CCD camera 28 are repeatedly shown, they are distinguished by symbols. When the height from the glass substrate 1 to the lower surface of both sides of the optical system member 5 is adjusted by the autofocus ranging system 5 2 and the autofocus ranging system 54 described in FIG. 4, even if optical can be made The height of the lower surface of the system member 5A is the same, and the height from the glass substrate 1 to each of the condensing lens 541 to the condensing lens 544 is not necessarily the same. Therefore, in the present embodiment, the condensing lens height ranging system 26 is attached to either side surface of the XY stage 20 in the X-axis direction (the side surface in the -X-axis direction of the χγ stage 20 201043371 20 in the drawing). The height from the glass substrate 1 to each of the collecting lenses 541 to 544 is measured. Signals corresponding to the heights of the respective condenser lenses 541 to 544 detected by the condenser lens height ranging system 26 are output to the control device 80. The control device 80 determines whether or not the horsepower from the glass substrate 丨 to each of the condensing lenses 541 1 to the optical lens 544 is appropriate. The arrangement (height) of each of the condensing lens 〇 541 ~ concentrating lens 544 is adjusted in accordance with the distance measurement result of the condensing lens height ranging system 26. At this time, the arrangement (height) of the condensing lens 541 to the condensing lens 544 can be manually or automatically adjusted. Further, if the height of the lower surface of the optical system member 50 is measured using the condensing lens height ranging system 26, the autofocus ranging system 52 and the autofocus ranging system 54 can be omitted. The focal length and optical axis adjustment CCD camera 28 is provided on either side of the X-axis direction of the XY stage 20 (the side in the _ χ direction of the χ γ stage 2 图 in the drawing) and is adjacent to the concentrating lens height ranging. The location of system 26 (nearby). The focal length and optical axis adjustment CCD camera 28 associates the XY stage 20 with the position of each of the condensing lens 541 to the condensing lens 544 of the optical system member 50, and is provided so that the upper side of the XY stage 20 can be seen. The image captured by the CCD camera 28 by the focal length and optical axis adjustment is output to the control device 80. The control device 80 determines whether or not the optical axis of the laser beam emitted from each of the condensing lens 541 to the condensing lens 544 is appropriate. That is, the focal length and the optical axis are adjusted. (4) The CCD camera 28 can directly observe the optical system component 50. Each of the condensing lens 541 to the condensing lens 544 emits a laser beam. Therefore, by imaging the laser beam, the control device 80 can illuminate the focal length of each of the poly 21 201043371 and/or the 41 dimer _ mirror 544. Whether the optical axis is suitable or not is determined by the milk and light (four) components 5 of the laser generating device. Equal distance and optical axis. In addition, when the finer image is adjusted and the digitized head is adjusted, the unevenness of the ground is adjusted by acquiring each of the laser beams. The optical system member 5G^9=beam_93 is placed in the optical path of the beam, the beam sampler 92 tm beam. The present embodiment 40 and the reflective shovel-like state 93 are provided in the laser generating device to measure the amount of light under the laser beam sampling 11 92 and the beam sampler 93 by about 4% or 4 of the laser beam. The % is configured with the diode 94 as an external component. The high-speed optoelectronic sampler 92 receives the portion (sampling beam) of the beam passing through the beam of the high-speed photoelectric body near the large fiscal center. The branch 93 corresponding to the laser beam (four degrees) corresponding to the output signal _ is branched and connected to the vicinity of the center (four) of the beam sampling axis for inspection by the CCD (sampling beam). Passing light 80. In addition, the image of the light secret apricot/photograph is output to the control device and irradiated to the high-speed photodiode, and the image indicating the position of the image output to the controlled laser beam can be taken in, and 22 ❹ 〇 201043371 The detection of the auxiliary 7G detection signal and the control of the laser generating device movement frequency), and the secret electric electrode 94 and the optical axis inspection CCD camera beta detection from the laser generated decoration 4η mountain 1 m. .  The pulse of the emitted laser beam is omitted, or the root/earth, first axis offset is used to control the exit bar of the laser generating device 40. The mirror of the laser beam is introduced into the SSI optical system member 5〇_〇1). The configuration of the fifth is performed such that the feedback control is performed. The alarm 82 is generated by the alarm 82. The alarm generation unit 83 has the details of the processing of the control unit 83. The alarm generation unit 83 has a buffer unit 81 and a pulse omission determination unit 87 〇aSer. C〇ntr^r) 86 ^ it bear production - (10), lens adjustment unit 88, illumination laser ~, Huan 2nd morning 89 and illumination laser adjustment unit 8A. The branch unit 81 branches and outputs the detection signal (clock pulse, f _ ) of the linear encoder 7 到 to the laser controller 86 of the subsequent stage. The pulse laser beam input is determined by the wheel-out field (diode output) corresponding to the beam intensity from the high-speed photodiode 94 and the slave branch unit, and is determined based on these signals. 7(A) to 7(B) are diagrams showing an example of the operation of the pulse miss determination early 82 in Fig. 6. Fig. 7 (Α) to Fig. 7 show detection signals, _, _, which are rotated from the branch unit 81. For example, Fig. 7 (Β) shows an example of an output signal corresponding to the intensity of the laser beam output from the high-speed photodiode 23 201043371 94, and Fig. 7 (C) shows the missing output of the pulse omission determination unit 掏). Alert signal system i. #_出_ As shown in Fig. 7(4) to Fig. 7(C), the pulse is determined by the falling of the clock pulse from the branching unit 81 '1疋 early 70 82' to determine the diode transmission point as a trigger. The threshold value Th of the signal is smaller than the diode output value is smaller than the level determining unit 82 to the alarm generating unit 83. At the time point from the pulse omission determination sheet 1 (Mevd) becomes a high level, the singularity of the singularity of the singularity of the singularity of the singularity of the singularity of the singularity of the singularity of the singularity of the singularity磬箄 磬箄 every record, s 〇 § § can be realized by the operator (operator) can be aware of the pulse. The performance of the financial line is degraded or the quasi-CCD image 84a in the reference CCD image storage unit 84. This reference has a light receiving frame of the CCD camera % as shown in Fig. 6 and is not in the optical axis inspection image. The image to be inspected from the state in which the laser beam is received by the CCD m for the optical axis inspection. The fine-biased output is as shown in Fig. 6. The CCD camera 96 unit 85 takes in the image from the optical axis image 85a and the reference coffee image. = Check the image 85a, and check the amount of the image, and turn the offset out to Ray = Compare ' to measure the offset of the optical axis (10) Camera 96 wheel] Thunder = Controller 86. For example, When an image such as the image to be inspected 85a 24 201043371 shown in FIG. 6 is emitted from the optical axis 1, the optical axis The offset measuring unit 85 compares the two images with the amount of offset in the axial direction and the γ-axis direction, and outputs the offset to the laser controller 86. The laser controller 86 pairs Feedback adjustment is performed between the device related to the optical axis of the laser beam, that is, the emission condition of the laser generating device 4, or the arrangement of the mirror surface 33 to the mirror surface 35 for introducing the laser beam into the optical system member 50, and the like. The image to be inspected 85a is made to coincide with the reference CCD image 84a. 透镜 The lens displacement amount measuring unit 87 is input with the respective condensing lenses 541 to 544 that are detected by the condensing lens height ranging system 26 After the signal corresponding to the degree, it is determined whether the intensity of each of the condensing lens 541 to the condensing lens 544 is within the allowable range or a large deviation from the allowable range, and the concentrating lens indicating a large deviation is indicated. The degree of adjustment of the twist of the 541 to concentrating lens 544 is preferably a good control signal output to the lens height adjusting unit 88. The lens height adjusting unit 88 adjusts each collecting lens based on the control signal from the lens displacement measuring unit 87 541 In addition, when there is no height adjusting mechanism of the collecting lens 541 to the collecting lens 544, the lens height adjusting unit 88 can also be concentrated based on the control signal from the lens displacement amount measuring unit 87. Which of the light lens 541 to the condensing lens 544 is adjusted to the extent that the adjustment information is transmitted (visible display, sound, etc.) to the operator. The illumination laser state inspection unit 89 acquires the adjustment from the focal length and the optical axis. The image 89a of the CCD camera 28 measures the focal length and the offset of the optical axis based on the image 8%, and outputs the offset to the illumination laser adjusting unit 8A. For example, when an image 89a such as 25 201043371 FIG. 6 is outputted from the focal length and optical axis adjustment CCD camera, the laser state inspection unit 89 is irradiated with the circular rim line 89b in the image 89 &amp; The position of the focus circle (the small circle in the image 89a) is detected based on the line corresponding to the outer n of the light lens 541 to the condensing lens 544, and is based on whether or not the focus circle 89c is located at 8% of the contour line: The amount of shift in the X-axis and Y-axis directions of the optical axis is measured, and this offset is output to the illumination f-adjusting unit 8 A. Further, the irradiation laser state inspection unit 89 measures the size (area) of the focus circle 89c, and irradiates the entire material SA based on the coke age of $. The riding laser adjusting unit 8A performs the respective half mirrors 511 to half mirrors 513 and the mirror surface in the filament component % based on the signal corresponding to the shift amount and the focus position of the irradiation #ray inspection unit 89 from the optical axis. The configuration of 521~mirror surface 528 is equal to 4 feedback adjustment. Further, the lens height adjusting unit 88 and the irradiation laser unit may be omitted, and the laser control (four)% has the function of these units. In the embodiment, the optical axis shift amount measuring unit 85 is used to check the optical axis offset of the laser beam at the time of laser processing (scoring processing), and the pulse omission determination unit it 82 is used to check the missing pulse. The case has been described, but as shown in Fig. 8, the pulse state of the laser beam can be checked based on the output waveform from the high-speed photodiode 舛. For example, in Figure 8, the pulse width and pulse height of the laser beam can be measured and an alarm is issued when an abnormality occurs at this pulse height. Further, when the period from the high-speed photodiode 94 whose round-out waveform is greater than the value is within a predetermined range, it is determined as a pulse width positive film ', and when the time period is larger or smaller than the predetermined range It is judged as pulse &amp; width: and: 26 201043371 An alarm is issued. In addition, for the pulse height of the laser beam, when the maximum value of the output waveform from the high-speed photodiode body 94 exists within the allowable range, it is determined that the pulse is normal, and the maximum value is greater or smaller than the allowable range. When the range is determined, the pulse height is abnormal and an alarm is output. In this way, since the laser is frequently sampled, it is possible to instantly manage the product y of the laser beam such as the pulse width and the pulse height (power). If the above-mentioned pulse leakage rate & occurs, it can be judged that the performance of the laser generating device is deteriorated or the lifetime of the laser is exhausted. 9(A) to 9(C) are views of the optical system member of Fig. 3 as viewed from the lower side (substrate side). Parts of the optical system member 50 and the bottom plate 31 are shown in Figs. 9(4) to 9(c). Fig. 9(A) is a view showing the positional relationship between the optical system member 50 and the bottom plate 31 of Fig. 3, as shown in Fig. 8), the end surface of the optical system member 50 (the upper end portion of the drawing), and the end surface of the bottom plate 31. (upper side of the figure) - Fig. 9(B) is a view showing a state in which the optical system member 50 is rotated about 30 degrees counterclockwise with respect to the center of the through hole 37 as a rotation axis. (C) of FIG. 9 is a view showing a state in which the system member 50 is rotated counterclockwise by about 45 degrees with respect to the bottom plate 31 with the center of the through hole 37 as a rotation axis. In the solar panel manufacturing apparatus of the present embodiment, the optical system member is a through hole 37 which is a guide hole of the U laser beam, and the rotation axis is sufficient to rotate freely. That is, the optical system configuration 0 as the branching unit is controlled to rotate by the d_E 500 from the mirror surface 35 of Fig. 4 and the traveling direction of the straight laser beam to the half mirror 511 (four) as the central axis. Thereby, the branching direction of the laser beam can be freely controlled in a variable manner. 27 201043371 The angle θ formed by the relative movement direction of the laser beam with respect to the substrate (the vertical direction in the drawing). In addition, the (m) rotary drive unit can be used with a ball screw or a linear display technique. Figures 9(A) to 9(c) omits these units as shown in Fig. 9(A) to Fig. 9 ( (^你·- „ The direction of the branch and the scanning direction of the laser beam I, when the angle formed is variably controlled, d〇e 500 is also ΐ = = brother I bearing the lens 544, the laser beam The illumination shape is as shown by the dotted square. Therefore, the wire member rotates (4) to rotate, and the rotation of the two phases is at the corners of the two squares of the scribe line. Rotation control two ": structure 3 so. ,,, η〇Ε 5〇〇^^ ;^);^ ::through =\(Γ9(Α)~Fig. 9(c) in the vertical direction) and 2 =: the left and right sides of the dotted square in the mirror 544 The ridges on both sides of the spine are formed to be extremely smooth, and only the optical path of the beam is set; ==== 28 201043371 It is also possible to set doe before each of the branched condensing lenses. At this time, it is also necessary to configure not to rotate each DOE even if the optical system member 50 is rotationally controlled. The DOE 500 can be made independent of the rotation of the optical system member 50 by directly attaching the DOE 500 to the bottom plate 31 in a form separate from the optical system member 50. Fig. 10 (A) to Fig. 1 (C) are diagrams showing the relationship between the amount of rotation of the optical system member and the pitch of the scribe lines. FIG. 1A is a view showing a state of a scribe line when the laser scribing process is performed in a state where the optical system member 50 is not rotated as shown in FIG. 9(A), and FIG. 10(B) is a view. The state of the scribe line at the time of performing the laser scribing processing in the state in which the optical system member 50 shown in FIG. 9(B) is rotated by about 30 degrees is shown, and FIG. 1(C) is shown in FIG. (C) A diagram showing a state of scribing at the time of performing a laser scribing process in a state where the optical system member 50 shown in (C) is rotated by about 45 degrees. When the pitch of the scribe lines in the case of FIG. 10(A) is p〇, the pitch P30 in the case of FIG. 10(B) is P〇xcos30. The pitch P# in the case of Fig. 10(C) is P〇xcos45. . As described above, the solar panel manufacturing apparatus of the present embodiment can appropriately adjust the pitch of the scribe lines to a desired value by appropriately adjusting the rotation angle ' of the optical system member 5'. FIGS. 7(A) and 5(B) are diagrams showing an example of the substrate detecting camera system provided in the aligning unit 1 and the aligning unit 104 of FIG. 2 . Fig. 11 (Α) is a side view showing the relationship between the glass substrate and the substrate detecting camera. Fig. 11 (Β) is a top view showing the relationship between the glass substrate and the substrate detecting camera. A substrate detection camera system and an alignment camera system are provided in the alignment unit 1 and the alignment unit 1 to perform glass substrate inspection 29 201043371 processing and alignment processing of the glass substrate. When the glass substrate 丨 is placed on the alignment portion 102 and the alignment portion 1〇4, the substrate detection camera 65 to the substrate detection camera 68 acquire an image near the four corners of the glass substrate 从 from the upper side of the glass substrate 1. 11(A) and 11(B) show that the glass substrate i is placed on the alignment portion 102 and the alignment portion 104, and the grip portion 1〇6 and the gripper portion 108 are held in the X-axis direction. Moved and will be put into the state before the laser processing station 1〇1. The images 65a to 68a shown in Fig. 11(B) are images near the four corners of the glass substrate 1 acquired by the substrate detecting camera 65 to the substrate detecting camera 68. Since the relative positional relationship between the substrate detecting camera 65 and the substrate detecting camera 68 is a predetermined value set in advance, the vertices of the four corners of the glass substrate 1 without warping or bending are shown as the images 65a to 68a. It is set to be located near the approximate center of the imaging range of the substrate detection camera 65 to the substrate detection camera 68. Therefore, when the positions of the vertices in the images 65a to 68a are shifted, the bending (warpage) of the glass substrate 1 can be detected based on the amount of shift. Further, a notch near the four corners of the glass substrate 可以 can be detected based on the images 65a to 68a. Further, by moving the substrate detecting camera 65 to the substrate detecting camera 68 along each side of the glass substrate 1, the notch of each side of the glass substrate 1 can be detected. Figs. 12(A) to 12(C) are views showing another example of the substrate detecting camera system provided in the aligning portion 1?2 and the aligning portion 104 of Fig. 2. In the embodiment of FIGS. 11(A) and 11(B), the substrate detecting camera 65 to the substrate detecting camera 68 are disposed at the upper portion near the four corners of the substrate 1. In the present embodiment, the two substrates are detected by the camera 65. 30 201043371 Ο 基板 The substrate detecting camera 68 is located on the upper side of the diagonal of the glass substrate 丨. In Fig. 12 (Α), in a state where the glass substrate 丨 is placed on the alignment portion 1〇2 and the alignment portion 104, the glass substrate i indicated by the broken line is moved to the right side from the dotted line position by the arrow indication. And moving to the position of the glass substrate i shown by the solid line (the substrate detecting camera 65 and the substrate detecting camera 68 are located at the upper position of the diagonal of the glass substrate 1 when the glass substrate 丨 moves, the substrate detecting camera 68 acquires the moving An image of the side la of the glass substrate 。. Then, when the movement of the substrate is completed, the substrate detecting camera 65 and the substrate detecting camera 68 acquire an image of the vertex near the diagonal of the glass substrate! (image 65a and figure of FIG. 11) Then, in a state where the glass substrate i is stopped, the substrate detecting camera 65 and the substrate detecting camera 68 move along the dotted arrow as shown in Fig. 12(B). Here, the substrate detecting camera 65 and the substrate detecting camera 68 move. At the time, the substrate detecting camera &amp; acquires an image of the side ib of the glass substrate 1, and the substrate detecting camera 68 acquires an image of if lc of the glass substrate 1. When the substrate detecting camera 65, the substrate detecting photograph When the movement of the machine 68 is completed, the substrate detecting camera 65 and the substrate detecting camera 68 acquire the image of the vertex near the other diagonal of the glass substrate, the image 66a of the image 11, and the image 67a). After that, in a state in which the substrate detecting camera 65 and the substrate detecting camera 68 are stopped, the glass substrate ι======================================================================= The glass substrate i shown in the job line is placed. When the glass substrate 1 moves, the substrate detecting camera 65 acquires the side 1d_image of the glass substrate 1 that is moving. The two substrate detection cameras 65 and the substrate detection cameras 201043371 68 can be used by the above-described series operation, and the images 65a to 6a and the substrate 丄 are acquired in the same manner as in the case of FIGS. U(A) and (u). The image of the side. Thereby, it is possible to detect the curvature of the glass substrate 1 or the notch of each side of the substrate 根据 based on the amount of shift of the position of each vertex of the image 65a to the image 68a. Further, after the - series detection operation is completed, the substrate detecting camera 65 and the substrate detecting camera 68 can be returned to the initial position of Fig. 12 (4), or the opposite operation can be performed without returning. Fig. 13 is a view showing an alignment of the aligning portion 1 〇 2 and the aligning portion 1 〇 4 of Fig. 2; An image of the vicinity of both end portions (front and rear edge portions in the X-axis direction) of the glass substrate 1 is obtained by the camera. This (4) image obtained by the alignment camera is outputted into the dragon device 8〇. The control device 80 stores the image from the alignment camera (10) and the ID data of the glass substrate 1 in a database (plus coffee) unit, and uses the alignment processing of the glass substrate 1 thereafter. Fig. 13 is a view showing an example of an alignment portion before the first scribing process, and Fig. 14 is a view showing an example of an alignment portion before the second or second post scribing process. First, as shown in the figure, the lower edge portion of the left end portion of the glass substrate 1 is brought into contact with the positioning member 2 in a state where the glass substrate 1 is placed on the alignment portion and the alignment portion iG4. The left edge portion of the lower end portion of the glass substrate 1 is brought into contact with the positioning pin 22 ′ so that the right edge portion of the lower portion of the glass substrate 1 abuts against the positioning pin 23 ′ to position the glass substrate 在 in the regulation position. In this state, the transparent electric light on the glass substrate 1 is irradiated with a laser beam to perform a shutdown process. The result of the initial scribe process is formed on the glass substrate 以 with a scribe line formed on the surface of about 1 (). 32 201043371 Check the I] line ϋ] in the scribe line system located in the middle of the substrate in the vicinity of the center of the substrate, the alignment camera system is obtained, and the part of the line 25 is obtained. The image 27a and the image 29a in the vicinity of the edge portion _ ' ° 29 of the substrate 1. As observed in the image 27a and the image 29a, since the image includes both the image of the scribe line 25 and the image of the shape of the edge portion of the glass substrate 1, it is easy to enter the image recognition processing 1 over control device. 80 (four) acquired images

Ja ?像挪作為破璃基板1的1D數據而依次存儲到資 料庫單元75中。 、 如圖13所不’當在利用雷射加工進行的刻劃處理完成 後圖像27a、圖像29a _取處理結束時,接著在下—段 的成膜裝置巾進行在此透明電_上形成半導體層的處 理。在半導體層形成處理已結束之後,触璃基板i執行 與上述相同的雷射束刻劃處理。在進行此第二次刻劃處理 之剷,利用如圖14所示的方法來進行對準處理。 、圖Μ中,與最初的對準處理相同地,在將玻璃基板i 载置在對準部102、對準部1〇4上的狀態下,使玻璃基板j 的左側端部的下側邊緣部抵接於定位銷21,使玻璃基板1 的下側端部的左側邊緣部抵接於定位銷22,使玻璃基板1 的下側端部的右側邊緣部抵接於定位銷23,從而將玻璃基 板1定位在規定位置。在此狀態下,利用對準照相機系統 獲取劃線25的兩端部附近、也就是說包含劃線25與玻璃 基板1的邊緣部的雙方的部位27、29附近的圖像27b、圖 像2%。另一方面,控制裝置80從資料庫單元75中讀出 33 201043371 玻璃基板1的ID數據的圖像27a、圖後% 置㈣所讀出的圖像27a、圖像29a與‘準:: 所獲取的圖像27b、圖像29b加以比較,來控制H糸= 軸以及Θ軸以使關像-致,從㈣確地 當以圖Μ所示的方式利用圖像27a、圖像復 27b、圖像29b _較處理而進行的對準處理時,Έ 上-次的劃線25離開約30帅的位置上,利用帝= 行刻劃處理。當此刻難理結束時,在下—段^膜= 中進行在半導體層上形成金屬層的處理。再次將基板ς入 到雷射加工裝置,進行與圖14相同的對準處理,並相 利用雷射束來對玻璃基板1執行刻劃處理。由此,在 基板1上形成三條劃線。 圖15是表示本發明的太陽電池板製造裝置的循環 (loop)方式的實例的圖。圖15中,對與圖2為相同構成 的部分標附相同的符號,所以將這些部分的說明省略。此 製造裝置與圖2的製造裝置的不同點在於,省略了圖2的 製造裝置的雷射加工台1〇1上所存在的對準部1〇4,及搬 入/搬出機械手台142在從圖的右侧到左側的—個方向上 進行搬送。因此,圖15的製造裝置中,將搬入到表背面翻 轉機構部143的玻璃基板lm作為玻璃基板ln而利用對準 部102進行對準處理。然後,將玻璃基板ln作為破璃基板 】〇、玻璃基板lp而在加工區域部112中實施規定的加工。 將加工後的破璃基板作為玻璃基板lr而從雷射加工台 1〇1向搬入/搬出機械手台142的右端搬送,並自此作為玻 34 201043371 璃基板hn而搬送到表背面翻轉機構部l4 轉機構部⑷上將表背聽賴,㈣雜表=翻 =的製造裝置中’在雷射力,利用對準部舰進行對 準處理。當雷射加工結束之後,抓爪部議立即將玻= 板向搬入/搬出機械手台142搬送,然後使抓爪部刚 ΟThe Ja? is sequentially stored in the material library unit 75 as the 1D data of the glass substrate 1. As shown in FIG. 13, when the image 27a and the image 29a_taking process are completed after the scribing process by the laser processing is completed, the film forming apparatus of the lower stage is formed on the transparent electric_ Processing of the semiconductor layer. After the semiconductor layer forming process has been completed, the glass substrate i performs the same laser beam scribing process as described above. In the shovel performing this second scribing process, the alignment process is performed by the method as shown in FIG. In the same manner as in the first alignment process, the lower edge of the left end portion of the glass substrate j is placed in a state where the glass substrate i is placed on the alignment portion 102 and the alignment portion 1〇4. The portion abuts against the positioning pin 21, and the left edge portion of the lower end portion of the glass substrate 1 abuts against the positioning pin 22, and the right edge portion of the lower end portion of the glass substrate 1 abuts against the positioning pin 23, thereby The glass substrate 1 is positioned at a predetermined position. In this state, the image 27b and the image 2 in the vicinity of the both end portions of the scribe line 25, that is, the portions 27 and 29 including both the scribe line 25 and the edge portion of the glass substrate 1 are obtained by the alignment camera system. %. On the other hand, the control device 80 reads out, from the database unit 75, the image 27a of the ID data of the glass substrate 1 of 201033371, the image 27a read by the figure (4), the image 29a, and the image: The acquired image 27b and the image 29b are compared to control the H 糸 = axis and the Θ axis so that the image is turned off, and the image 27a and the image complex 27b are used in the manner shown in FIG. When the image 29b_ is processed in alignment with the processing, the upper and lower scribe lines 25 are separated from the position of about 30 handsome, and the scribe line processing is performed. When it is difficult to end at this moment, a process of forming a metal layer on the semiconductor layer is performed in the lower film. The substrate is again ejected to the laser processing apparatus, and the same alignment processing as in Fig. 14 is performed, and the scribing process is performed on the glass substrate 1 by the laser beam. Thereby, three scribe lines are formed on the substrate 1. Fig. 15 is a view showing an example of a loop mode of the solar panel manufacturing apparatus of the present invention. In Fig. 15, the same components as those in Fig. 2 are denoted by the same reference numerals, and the description of these portions will be omitted. This manufacturing apparatus is different from the manufacturing apparatus of FIG. 2 in that the alignment portion 1〇4 existing on the laser processing table 1〇1 of the manufacturing apparatus of FIG. 2 and the loading/unloading robot stage 142 are omitted. Transfer from the right side to the left side of the figure. Therefore, in the manufacturing apparatus of Fig. 15, the glass substrate lm carried into the front and back turning mechanism portion 143 is aligned as the glass substrate ln by the alignment portion 102. Then, the glass substrate ln is subjected to predetermined processing in the processing region portion 112 as the glass substrate 〇 and the glass substrate lp. The glass substrate after processing is transferred from the laser processing table 1〇1 to the right end of the loading/unloading robot table 142 as a glass substrate lr, and is transported to the front and back turning mechanism unit as a glass substrate hn from the glass 34 201043371. In the manufacturing device where the l4 mechanism unit (4) is used to listen to the watch, (4) in the manufacturing device of the miscellaneous table=turn=, in the laser force, the alignment process is performed by the alignment ship. When the laser processing is completed, the gripper unit immediately transports the glass plate to the loading/unloading robot table 142, and then the gripper portion is just smashed.

=部1〇2且保持玻璃基板’以進行相同的雷射加工處 理。也就是說,玻縣板在製姑置上呈循環狀移動。因 此’工作時間(tact time)與圖2的情況相比稍稍増大, 但是因為僅設置有-個表f面轉機構部⑷即可 可以將裝置簡化。 圖16是表示本發明的太陽電池板製造裝置的往返方 式的另-實例的圖。圖16中,對與圖2為相同構成的部分 標附相同的魏’所以將這些部分的說明省略。此製造製 置與圖2的製造裝置的不同點在於,使用搬運臂(handling arm)方式的基板搬送機械手146,來相對於親式輸送機 ⑵以及表背面翻轉機構部143進行玻璃基板的搬入/搬出 處王里。因此’ ® 16的製造裝置中’將玻璃基板lx從輥式 輸送機121搬入到表背面翻轉機構部I43,在此表背面翻 轉機構部143上進躲背面轉處理,紐作為玻璃基板 In而搬送到對準部1〇2,或者使用基板搬送機械手146, 亚作為玻喊板lf而再:欠向搬人/㈣機械手台 144的右 端搬送在雷射加工纟⑽上,與圖2相同地利用兩側的 對準4 102、對準部1〇4來進行對準處理,然後進行雷射 加工處理。另彳’可以在破璃基板卜的部位另設有表背面 35 201043371 翻轉機構部,也可以省略表背面翻轉機構部143,而在輥 式輸送機121與搬入/搬出機械手台144之間設置其他的表 月面翻轉機構部。 圖π是表示本發明的太陽電池板製造裝置的雙側 (double side)方式的實例的圖。此實例中,從具備圖2 的對準部102、1〇4的雷射加工台101的兩嫌入/搬出破 ,基板。圖17中,對與圖2為相同構成的部分標附相同的 符號,所以將這些部分的說明省略。此製造裝置與圖2的 製造裝置的不同點在於:在雷射加工纟1〇1的兩側設置有 輥式輸送機121、輥式輸送機122,在輥式輸送機121 '輥 式輸送機122中設置有表背面翻轉機構部147、表背面翻 轉機構部148。因此,圖17的製造裝置中,從兩侧的輥式 輸达機121、輕式輸送機122,按照玻璃基板1χ1、1χ2、 lyl、ly2、lzl、1ζ2依次經由表背面翻轉機構部147、表 责面翻轉機構部148而搬入/搬出到對準部1〇2、對準部 104。雷射加工台1〇1與圖2同樣,對利用兩側的對準部 102、對準部刚進行對準處理後的玻璃基板進行雷射加工 處理。而且,在不需要表背面翻轉機構部時,也可以將表 背面翻轉機構部147、表背面翻轉機構部148省略。 所述的實施方式中’對獲取包含最初刻劃處理的結果 而在玻璃基板1上所形成的劃線的圖像的情況進行了說 明,但是也可以獲取包含第二次刻劃處理的結果而在玻璃 基板1上所形成的兩條劃線的圖像,並使用此圖像來進行 對準處理。而且,所述的實施方式中,對分別設置有對準 36 201043371 二2 也可以在對準照相機系、統中設置如 她/、)目(C)所不的移動機構’而使對準昭相 ,系統兼有基板制_機65〜基紐酬 ㈣ S&amp; 0 所^實施方式中,僅觀察了脈衝遺漏的產生,但是= portion 1 〇 2 and holding the glass substrate 'for the same laser processing. That is to say, the glass plate of the glass plate moves in a circular shape on the system. Therefore, the 'tact time' is slightly larger than the case of Fig. 2, but the apparatus can be simplified since only one table f-side mechanism unit (4) is provided. Fig. 16 is a view showing another example of the reciprocating mode of the solar panel manufacturing apparatus of the present invention. In Fig. 16, the same components as those in Fig. 2 are denoted by the same reference numerals, and the description of these portions will be omitted. This manufacturing method differs from the manufacturing apparatus of FIG. 2 in that the substrate transport robot 146 of the handling arm type is used to carry in the glass substrate with respect to the parent conveyor (2) and the front and back turning mechanism unit 143. / Move out of the king. Therefore, in the 'manufacturing apparatus of the ® 16', the glass substrate lx is carried from the roller conveyor 121 to the front and back reversing mechanism portion I43, and the front and rear reversing mechanism portion 143 is subjected to the back surface turning processing, and the new sheet is transported as the glass substrate In. The alignment unit 1〇2 or the substrate transport robot 146 is used as the glass board lf, and the right end of the under-loading/(four) robot table 144 is transported to the laser processing unit (10), which is the same as in FIG. The alignment processing is performed using the alignments 4 102 and the alignment portions 1〇4 on both sides, and then the laser processing is performed. In addition, a front and back surface 35 201043371 reversing mechanism portion may be additionally provided in the portion of the glass substrate, and the front and back reversing mechanism portion 143 may be omitted, and the roller conveyor 121 and the loading/unloading robot table 144 may be disposed. Other forms of the moon surface flip mechanism. Figure π is a view showing an example of a double side mode of the solar panel manufacturing apparatus of the present invention. In this example, the substrate of the laser processing table 101 including the alignment portions 102 and 1B of Fig. 2 is smuggled/unloaded. In Fig. 17, the same components as those in Fig. 2 are denoted by the same reference numerals, and the description thereof will be omitted. This manufacturing apparatus is different from the manufacturing apparatus of FIG. 2 in that a roller conveyor 121, a roller conveyor 122, and a roller conveyor 121' roller conveyor are provided on both sides of the laser processing 纟1〇1. The front and back inversion mechanism portion 147 and the front and rear inversion mechanism portion 148 are provided in the 122. Therefore, in the manufacturing apparatus of Fig. 17, the roller type conveyors 121 and the light conveyors 122 on both sides sequentially pass the front and back inversion mechanism portions 147 and the table in accordance with the glass substrates 1χ1, 1χ2, lyl, ly2, lzl, and 1ζ2. The inversion mechanism unit 148 is carried in and out to the alignment unit 1 and the alignment unit 104. Similarly to Fig. 2, the laser processing table 1〇1 performs laser processing on the glass substrate which has just been aligned by the alignment portion 102 on both sides and the alignment portion. Further, when the front and back turning mechanism portions are not required, the front and back turning mechanism portion 147 and the front and rear turning mechanism portion 148 may be omitted. In the above-described embodiment, the case where the image of the scribe line formed on the glass substrate 1 including the result of the initial scribe process is acquired is described, but the result including the second scribe process may be acquired. An image of two scribe lines formed on the glass substrate 1 and used for alignment processing. Moreover, in the above-described embodiment, the pairing is provided with the alignment 36 201043371 2, and the moving mechanism of the camera system can be arranged in the alignment camera system. Phase, system has a substrate system _ machine 65 ~ base New (four) S &amp; 0 In the implementation, only the occurrence of pulse omission is observed, but

Ο 並二:產m遺漏的部位的坐標數據(位置數據) 並予二由此進魏線的修改處理(repairt一^ 所摘貫施方式巾,對如下情況騎了說明使 檢;用CCD照相機96來直接接收由光束採樣器93 所刀支而輸出的雷射束的-部分(採樣光束),並對此光 束進行圖像處理,由此來檢查雜偏移,但是也可以利用 光軸檢查用CCD照相機96或者象限型光電二極體,以獲 取表示在高速光電二減94的光魏面的巾央接收雷射 束的狀態的圖像來作為被檢查圖像,由此來檢查光軸偏移。 所述的實施方式中,對檢查雷射束的光軸偏移以及脈 衝遺漏的情況進行了制,但是也可以將妹偏移、脈衝 遺漏、脈衝寬度以及脈衝高度分別加以適當組合而檢查雷 射束的狀態。 所述的實施方式中,對從形成有薄膜的玻璃基板1的 表面照射雷射束來在薄膜上形成劃線(槽)的情況進行了 說明,但是也可以從玻璃基板i的背面照射雷射束來在基 板表面的薄膜上形成劃線。 所述的實施方式中’以太陽電池板製造裝置為例進行 37 201043371 了說明,但是本發明也可以適用於對電致發光 (electiO-luminescence ’ EL)面板製造裝置、乱面板修正 裝置、平板顯示器(Flat Panel Display,FPD )修正裝置等 進行雷射加工的裝置。 雖然本發明已以較佳實施例揭露如上,鈇且 限定本發明,任何熟習此技藝者,在不斷發=;; 圍内’當可作些許之更動與潤飾,因此本發明之保護 範圍當視後附之申請專利範圍所界定者為準。 【圖式簡單說明】 * 電轉換 裝置if往的連續方式的太陽電池板(光 展罝)裏造裝置的一例的圖。 雷射加工裒置的概 圖2是表示本發明的一實施方式的 略構成的圖。 圖2的加工區域部的 圖3是表示進行劃線加工處理的 詳細構成的圖。 以;示;2的光學系統構件5〇的詳細構成的圖 圖5疋表不第1檢測光學系統構 二珉的圖。 統構件的構成的示意圖。 第2檢測光學系 塊圖圖6是表示圖2的控制裝置80的處理的詳細情況的方 圖7 (A)〜圖7 (c)是表示圖6 凡82的動作的一例的圖。 的脈衝遣漏判定單 圖8是表示從圖4的高速光電_ 例的圖。 电—極體輸出的波形的〜 38 201043371 圖9 (A)〜圖9 (C)是從下侧(基板侧)觀察圖3 的光學系統構件的圖。 圖10 (A)〜圖10 (c)是表示光學系統構件的旋轉 量與劃線的間距寬的關係的圖。 圖11 (A)、圖11 (B)是表示圖2的對準部1〇2、 104中所設置的基板檢測照相機系統的一例的圖。 圖12 (A)〜圖12 (c)是表示圖2的對準部1〇2、 ❹Ο and two: the coordinate data (position data) of the missing part of the production m and the second modification of the Wei line (repairt a ^ the method of the application of the method, riding the instructions for the following situation; with a CCD camera 96 to directly receive the - portion (sampling beam) of the laser beam output by the beam sampler 93, and image-process the beam, thereby checking the impurity offset, but also using the optical axis inspection A CCD camera 96 or a quadrant type photodiode is used to acquire an image indicating a state in which the laser beam is received at the center of the high-speed photodiode 94, and the image is inspected, thereby checking the optical axis. In the above embodiment, the optical axis offset of the laser beam and the omission of the laser beam are checked, but the sister shift, the pulse omission, the pulse width, and the pulse height may be appropriately combined. The state of the laser beam is checked. In the above-described embodiment, the case where the surface of the glass substrate 1 on which the thin film is formed is irradiated with a laser beam to form a scribe line (groove) on the film has been described, but it may be from the glass. The back surface of the board i is irradiated with a laser beam to form a scribe line on the film on the surface of the substrate. In the above-described embodiment, the solar cell panel manufacturing apparatus is taken as an example 37 201043371, but the present invention is also applicable to electro-optical A device for performing laser processing such as an illumination (electiO-luminescence 'EL) panel manufacturing device, a disorder panel correction device, a flat panel display (FPD) correction device, etc. Although the present invention has been disclosed above in the preferred embodiment, </ RTI> </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; Brief Description of the Drawings: * An example of a continuous solar panel (light-emitting device) in the electrical conversion device. The schematic view 2 of the laser processing device is a schematic configuration showing an embodiment of the present invention. Fig. 3 of the processing region portion of Fig. 2 is a view showing a detailed configuration of the scribing processing. Fig. 2 is a diagram showing the detailed configuration of the optical system member 5A. Fig. 5 is a view showing the configuration of the first detecting optical system. Fig. 6 is a schematic view showing the configuration of the control unit. Fig. 6 is a view showing the details of the processing of the control unit 80 of Fig. 2 ( A) to (c) of Fig. 7 are diagrams showing an example of the operation of Fig. 6. The pulse vacancy determination chart 8 is a diagram showing an example of the high-speed photoelectric _ of Fig. 4. The waveform of the output of the electro-polar body ~ 38 201043371 Fig. 9 (A) to Fig. 9 (C) are views of the optical system member of Fig. 3 as viewed from the lower side (substrate side). Fig. 10 (A) to Fig. 10 (c) show the rotation of the optical system member. Fig. 11 (A) and Fig. 11 (B) are diagrams showing an example of a substrate detecting camera system provided in the aligning portions 1 and 2, 104 of Fig. 2 . 12(A) to 12(c) are diagrams showing the alignment portion 1〇2 of FIG. 2;

104中所設置的基板檢測照相機系統的另一例的圖。 圖13是表示圖2的對準部102、1〇4中所設置的對準 照相機系統的i的圖’且是表示最初的刻劃處理前 準處理的圖。 圖14是表示圖2的對準部1〇2、1〇4中所設置的對準 照相機系統的-例的圖,是表示第二次或第二次之後的 刻劃處理前的對準處理的圖。 圖15是表示本發明的太陽電池板製造裝置的循 式的實例的圖。 圖16是表示本發明的太陽電池板製造裝置的往返方 式的另一實例的圖。 圖17是表示本發明的太陽電池板製造裝置的雙 式的實例的圖。 【主要元件符號說明】 1 la 〜lz、lm〜lr、1x1、1x2、lyl、ly2、 lzl ^ lz2 一 n 坡璃基板 δ δ 照射雷射調整單元 39 201043371 ίο 101 10a、102、104 10b、106、108 10c 、 110 lOd &gt; 112 12、18 14 機部) 16 機部) 20 21 、 22 、 23 25 26 27 ' 29 27a、27b、29a、29b 28 照相機 30 31 33 33xy、33yz 34、35、521 〜528 雷射加工台及底座 雷射加工台 對準部 抓爪部 抓爪驅動部 加工區域部 成膜裝置 搬入機械手台(幸昆式輸送 搬出機械手台(親式輸送 XY載台 定位銷 劃線 聚光透鏡高度測距系統 部位 65a〜68a、89a 圖像A diagram of another example of the substrate detection camera system provided in 104. Fig. 13 is a view showing i of the alignment camera system provided in the alignment portions 102 and 1B of Fig. 2, and is a view showing a preliminary processing before the first scribing process. Fig. 14 is a view showing an example of an alignment camera system provided in the alignment portions 1A2, 1B4 of Fig. 2, showing alignment processing before the second or second etching process. Figure. Fig. 15 is a view showing an example of the circumstance of the solar cell manufacturing apparatus of the present invention. Fig. 16 is a view showing another example of the reciprocating mode of the solar panel manufacturing apparatus of the present invention. Fig. 17 is a view showing an example of a double type of the solar cell manufacturing apparatus of the present invention. [Description of main component symbols] 1 la 〜lz, lm~lr, 1x1, 1x2, lyl, ly2, lzl ^ lz2 - n slab substrate δ δ illuminating laser adjustment unit 39 201043371 ίο 101 10a, 102, 104 10b, 106 , 108 10c , 110 lOd &gt; 112 12, 18 14 machine part 16 machine part) 20 21 , 22 , 23 25 26 27 ' 29 27a, 27b, 29a, 29b 28 camera 30 31 33 33xy, 33yz 34, 35, 521 ~ 528 Laser processing table and base laser processing table Alignment part Gripper gripper drive part Processing area Part film forming device is loaded into the robot table (Successful Kunming transport and unloading robot station (Personal transport XY stage positioning) Pin-lined condenser lens height ranging system parts 65a~68a, 89a image

焦距與光軸調整用CCD 滑動架 底板 檢流計鏡 電動機 反射鏡面 40 201043371 Ο 〇 37 貫通孔 40 雷射產生裝置 50 光學系統構件 52 ' 54 自動對焦用測距系統 65- '68 基板檢測照相機 70 線性編碼器 75 資料庫單元 80 控制裝置 81 分支單元 82 脈衝遺漏判定單元 83 警報產生單元 84 基準CCD圖像存儲單元 84a 基準CCD圖像 85a 被檢查圖像 85 光軸偏移量測量單元 86 雷射控制器 87 透鏡位移量測量單元 88 透鏡高度調整單元 89 照射雷射狀態檢查單元 89b 輪廊線 89c 焦點圓 92、 93、332 光束採樣器 94 高速光電二極體 96 光軸檢查用CCD照相機 41 201043371 121 ' 122 輥式輸送機 141、142、144 搬入/搬出機械手台 146 基板搬送機械手 143、147、148 表背面翻轉機構部 331 檢流計控制裝置 333 四象限光電二極體 500 相位式繞射光學元件(DOE) 511 〜513 半鏡面 531 〜534 快門機構 541〜544 聚光透鏡 42Focal length and optical axis adjustment CCD Slider floor galvanometer mirror motor mirror surface 40 201043371 Ο 〇 37 Through hole 40 Laser generating device 50 Optical system member 52 ' 54 Autofocus measuring system 65- '68 Substrate detecting camera 70 Linear encoder 75 Library unit 80 Control device 81 Branch unit 82 Pulse miss determination unit 83 Alarm generation unit 84 Reference CCD image storage unit 84a Reference CCD image 85a Inspection image 85 Optical axis offset measurement unit 86 Laser Controller 87 Lens displacement amount measuring unit 88 Lens height adjusting unit 89 Illuminated laser state checking unit 89b Round bar line 89c Focus circle 92, 93, 332 Beam sampler 94 High-speed photodiode 96 CCD camera for optical axis inspection 41 201043371 121 ' 122 Roller conveyors 141, 142, 144 Loading/unloading robot table 146 Substrate transport robots 143, 147, 148 Front and back turning mechanism unit 331 Galvanometer control device 333 Four-quadrant photodiode 500 Phase winding Optical element (DOE) 511 ~ 513 half mirror 531 ~ 534 fast Door mechanism 541~544 Condenser lens 42

Claims (1)

201043371 七、申請專利範圍: I一種雷射加工方法,其特徵在於:一邊依次反復進 行以下步驟,一邊對從前段裝置搬送來的玻璃基板進行雷 射加工,所述步驟是: 向規定位置對從前段裝置搬送來的第1玻璃基板進行 對準處理的步驟; 一邊保持著進行所述對準處理後的所述第1玻璃基板 並使所述第1玻璃基板相對地移動,一邊照射雷射束,由 ° 此對所述第1玻璃基板實施雷射加工的步驟; 在利用所述雷射束實施加工的期間,向規定位置對從 所述前段裝置搬送來的第2玻璃基板進行對準處理的步 騾;以及 在利用所述雷射束進行的加工結束之後搬出所述第1 玻璃基板,並且一邊保持所述第2玻璃基板並使所述第2 玻璃基板相對地移動,一邊照射雷射束,由此對所述第2 玻璃基板實施雷射加工。 ❹ 2.如申請專利範圍第1項所述的雷射加工方法,其中: 在利用所述雷射束進行的最初的加工處理結束的時間 點,獲取包含通過所述最初的加工處理而形成的所述玻璃 基板的形狀變化部分與所述玻璃基板的邊緣部的雙方的部 位的圖像,並存儲所述圖像來作為所述玻璃基板的數 攄’在實施第-次或第二次之後的加工處理時,根據所述 ID數據來進行所述對準處理。 3.如申請專利範圍第i或2項所述的雷射加工方法, 43 201043371 其中 獲取所述玻璃基板的四角附近的圖像,並根據此圖像 來檢測所述玻璃基板的彎曲(翹曲)或所述玻璃基板的四 角附近的缺口。 4. 如申請專利範圍第1或2項所述的雷射加工方法, 其中: 獲取所述玻璃基板的外周緣的圖像,並根據此圖像來 檢測所述玻縣板的彎曲(_)以及所述_基板的所 述外周緣的缺口。 5、 -種雷射加工裝置,其特徵在於包括: 來實=:=相對移動的玻璃基板照射雷射束 i 定位置對從前段裝置搬送來的第 第2對準單元,向規定 2玻璃基板進行對準處理;置對_沾置搬送來的第 第1保持單元,在利用 處理結束之後,保持所述第準單元進行的對準 璃基板相對於所述雷射魅板,錄所述第!玻 處理結权後,保對準單㈣行的對準 璃基板相對於所述雷射束昭 基板,亚使所述第2玻 控制單元,進行32:!元進行相對移動;及 的玻璃基板執行以下^―彡2所述刖段|置依次搬送來 的系列動作:一邊以所述第1保持 44 201043371 單元保持著利用所述第1對準單元進行對準處理後的所述 弟1玻璃基板,一邊使所述第1玻璃基板相對於所述雷射 束照射單元進行相對移動,由此利用所述雷射束來對所述 第1玻璃基板進行加工,且在進行此雷射束加工的期間, 利用所述第2對準單το來對所述第2玻璃基板執行對準處 理’在利用戶斤述雷射束來對所述第i玻璃基板進行的加工 '、、σ束之後搬出所述弟1玻璃基板,並且一邊以所述第2保 持單元保持著所述第2 _基板,-邊賴述第2玻璃基 板相對於所述㈣賴料元進行相對移動,由此利用所 述雷射束來對所述第2玻璃基板進行加工。 “申請專利範圍第5項所述的雷射加工裝置,其中 包括· :Γ用所述雷射束進行的最勒的加工201043371 VII. Patent application scope: I. A laser processing method characterized in that laser processing is performed on a glass substrate conveyed from a front-end device while repeating the following steps in sequence, wherein the steps are: a step of performing alignment processing on the first glass substrate conveyed by the front stage device; and irradiating the laser beam while holding the first glass substrate subjected to the alignment process and relatively moving the first glass substrate a step of performing laser processing on the first glass substrate; and performing alignment processing on the second glass substrate conveyed from the front stage device at a predetermined position while the processing is performed by the laser beam And stepping out the first glass substrate after the processing by the laser beam is completed, and irradiating the laser while holding the second glass substrate and relatively moving the second glass substrate The beam is thereby subjected to laser processing on the second glass substrate. 2. The laser processing method according to claim 1, wherein: at a time point when the initial processing by the laser beam is completed, the acquisition includes the formation by the initial processing. An image of a portion of the glass substrate and a portion of the edge portion of the glass substrate, and storing the image as the number of the glass substrate after performing the first or second time At the time of processing, the alignment processing is performed based on the ID data. 3. The laser processing method according to the invention of claim 1, wherein the image of the vicinity of the four corners of the glass substrate is obtained, and the bending of the glass substrate is detected based on the image (warping) Or a notch near the four corners of the glass substrate. 4. The laser processing method according to claim 1 or 2, wherein: obtaining an image of an outer circumference of the glass substrate, and detecting a curvature of the glass plate according to the image (_) And a gap of the outer circumference of the substrate. 5. A laser processing apparatus comprising: a real glass: a relatively small glass substrate irradiated with a laser beam i, a second alignment unit transported from the front stage device, and a predetermined 2 glass substrate Performing an alignment process; the first holding unit that has been placed and placed in a paired state, and after the end of the use process, the alignment glass substrate that is held by the first alignment unit is held with respect to the laser charm plate ! After the glass treatment is finished, the aligned glass substrate aligned with the single (four) row is relatively moved relative to the laser beam substrate, and the second glass control unit is moved by 32:! Performing the series of operations described below in the following paragraphs: The first operation is performed by holding the first alignment unit in the first holding 44 201043371 unit. The substrate is subjected to relative movement of the first glass substrate with respect to the laser beam irradiation unit, whereby the first glass substrate is processed by the laser beam, and the laser beam processing is performed. During the period, the alignment processing is performed on the second glass substrate by the second alignment sheet το, and the processing is performed on the ith glass substrate by the user, and after the σ beam When the second substrate is held by the second holding unit, the second glass substrate is relatively moved with respect to the (four) material, thereby utilizing the a laser beam to feed the second glass substrate Processing. "The laser processing apparatus of claim 5, which includes: the most processing by the laser beam 存儲通過所述圖傻嬸叛留;_ 圖像獲取單元,在 處理結束的時間點,獲 形成的所述玻璃基板的形狀變 緣部的雙方的部位的圖像; 〇 存儲單元,存儲通過所述Storing the image by the image acquisition unit; the image acquisition unit obtains an image of both the portions of the shape of the glass substrate that are formed at the edge of the process at the end of the process; Description 7.如申请專利範圍第5或 圍第5或6項所述的雷射加工裝置, 其中包括: 第1圖 圖像獲取單元, 獲取所述破璃基板的四角附近的 45 201043371 •mf ^ ^ 圖像;以及 第1檢測單元,根據通過所述圖像獲取單元所师的 所述玻璃基板的四角附近的圖像,來檢測所述基板ς彎曲 (魏曲)或所述基板的四角附近的缺口。 8·如申請專利範圍第5或6項所述的雷射加工 其中包括: 第2圖像獲取單元,獲取所述玻璃基板的外周緣的圖 像;以及 第2檢測單元,根據通過所述圖像獲取單元所獲取的 圖像,來檢測所述玻璃基板的彎曲(翹曲)以及所述玻璃 基板的所述外周緣的缺口。 9、一種太陽電池板製造方法,其特徵在於:使用如申 請專利範圍第1至4項中任一項所述的雷射加工方法、或 者如申請專利範圍第5至8項中任一項所述的雷射加工裝 置,來製造太陽電池板。 467. The laser processing apparatus of claim 5, wherein the image acquisition unit of FIG. 1 acquires 45 near the four corners of the glass substrate. 201043371 • mf ^ ^ And the first detecting unit detects the substrate meandering (weiqu) or the vicinity of the four corners of the substrate according to an image near the four corners of the glass substrate of the image acquiring unit gap. 8. The laser processing according to claim 5, wherein the second image acquisition unit acquires an image of an outer circumference of the glass substrate; and the second detection unit according to the The image obtained by the acquisition unit is used to detect the curvature (warpage) of the glass substrate and the notch of the outer periphery of the glass substrate. A method of manufacturing a solar panel, characterized by using the laser processing method according to any one of claims 1 to 4, or as claimed in any one of claims 5 to 8. The laser processing apparatus described is used to manufacture solar panels. 46
TW099117007A 2009-06-04 2010-05-27 Laser processing method, laser processing device, and manufacturing method of solar panels TWI414384B (en)

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