TW201037874A - Evaporator, coating installation, and method for use thereof - Google Patents

Evaporator, coating installation, and method for use thereof Download PDF

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Publication number
TW201037874A
TW201037874A TW99107651A TW99107651A TW201037874A TW 201037874 A TW201037874 A TW 201037874A TW 99107651 A TW99107651 A TW 99107651A TW 99107651 A TW99107651 A TW 99107651A TW 201037874 A TW201037874 A TW 201037874A
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Taiwan
Prior art keywords
evaporator
diaphragm
tube
vapor
optical
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TW99107651A
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Chinese (zh)
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TWI398976B (en
Inventor
Marcel Martini
Thomas Gebele
Uwe Hoffmann
Stefan Bangert
Michael Koenig
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Applied Materials Inc
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Priority claimed from EP20090155275 external-priority patent/EP2230326B1/en
Priority claimed from US12/405,049 external-priority patent/US20100233353A1/en
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Publication of TW201037874A publication Critical patent/TW201037874A/en
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Publication of TWI398976B publication Critical patent/TWI398976B/en

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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/243Crucibles for source material
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12Organic material
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/246Replenishment of source material

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Measuring Fluid Pressure (AREA)

Abstract

An evaporator for applying vapor to a substrate at a coating rate, the evaporator comprising an evaporator tube (300, 310, 100) having a distribution pipe (100) with at least one nozzle outlet (110), and wherein the evaporator tube includes a pressure measurement device (10, 12), the pressure measurement device comprising an optical diaphragm gauge (10).

Description

201037874 六、發明說明: 【發明所屬之技術領域】 實施例係關於一蒸發器、一塗覆設備、及一用以施加 蒸氣到基材之方法。尤其,實施例係關於一蒸發器(其具 有測ΐ機構以測量蒸發器之塗覆速率)、一具有這樣蒸發 器之塗覆設備、及一用以施加蒸氣到基材之方法。 【先前技術】 Ο 各種技術領域需要蒸發器。舉例而言,有機物蒸發器 對於特定生產類型的有機發光二極體(〇LED)是一重要 工具。OLEDs是發光二極體的一特殊類型,其中放射層 包括特定有機化合物的薄膜。這樣的系統可以用在電視 螢幕、電腦顯示器、可攜式系統螢幕、及諸如此類者。 OLEDs也可以用於一般空間照明。〇LED顯示器具有比 傳統LCD顯不器更大之顏色、亮度及可視角的範圍,這 〇 是因為〇LED像素係直接放射光且不需要一背光《因 此,0LED顯不器係比傳統lCD顯示器具有遠小得多的 能源消耗。此外,OLEDs可被印刷到可撓基材上的事實 係開啟了新應用(例如可捲曲的顯示器或甚至内嵌在在 布料中的顯示器)的大門。 利用蒸發器所製造的產品的性能通常會被經蒸發之層 的厚度所影響。舉例而言’ 〇LED的功能性是取決於有 機材料的塗覆厚度。此厚度必須位在一預定範圍内。在 201037874 製造OLEDs時,將用來塗覆有機材料塗層的塗覆速率控 制在預定容忍範圍内是重要的。 換言之’蒸發器(諸如有機物蒸發器)的塗覆速率(亦稱 為沉積速率)必須在塗覆製程中完全地受到控制。 為了達到此目的’已知此技藝使用所謂的石英晶體微 量天平(quartz crystal microbalance)或石英振盞器 (quartz resonator)來決定塗覆速率。這些震動晶體的實際 振動頻率的測量係容許實際塗覆速率的結果。缺而,在 …、 塗覆製程期間’這些晶體也被塗覆以材料。因此,必須 週期性地更換該些晶體,這是因為該些晶體僅能忍受有 限量的材料塗覆《這降低了其使用性,尤其是在具有非 常長維護壽命的大規模生產工廠中。此外,為了更換該 些振動的晶體,必須介入真空腔室。將真空予以再生是 耗時且昂貴的。 或者,已知此技藝是在沉積完成後分析經沉積的層以 Q 決定塗覆速率。在此情況下,沉積系統的回饋控制僅在 具有特定延遲是可行的。特別是,此程序在控制可採取 校正動作之前會造成一或多個基材被塗覆以一超過範圍 的層。 【發明内容】 鐘於前述,提供一如申請專利範圍第1項之蒸發器、 一如申請專利範圍第1 〇項之塗覆設備、及一如申請專利 201037874 範圍第11項之用以施加蒸氣到基材之方法。 在一實施例中’提供一種用以於一塗覆速率施加蒸氣 到一基材的蒸發器。該蒸發器包括:一蒸發器管,其具 有一含有至少一喷嘴出口的分佈管;及其中該蒸發器管 包括一壓力測量裝置,該壓力測量裝置包含一光學隔膜 計。201037874 VI. Description of the Invention: [Technical Field of the Invention] Embodiments relate to an evaporator, a coating apparatus, and a method for applying vapor to a substrate. In particular, embodiments relate to an evaporator having a measuring mechanism to measure the coating rate of the evaporator, a coating apparatus having such an evaporator, and a method for applying vapor to the substrate. [Prior Art] 蒸发 Evaporators are required in various technical fields. For example, organic vaporizers are an important tool for specific production types of organic light-emitting diodes (〇LEDs). OLEDs are a special type of light-emitting diode in which the radiation layer comprises a film of a specific organic compound. Such systems can be used in television screens, computer monitors, portable system screens, and the like. OLEDs can also be used for general space lighting. 〇LED displays have a larger range of colors, brightness and viewing angles than traditional LCD displays, because 〇LED pixels emit light directly and do not require a backlight. Therefore, OLED displays are more traditional than conventional lCD displays. Has much smaller energy consumption. In addition, the fact that OLEDs can be printed onto flexible substrates opens the door to new applications, such as rollable displays or even displays embedded in fabric. The properties of products made with evaporators are often affected by the thickness of the evaporated layer. For example, the functionality of a 〇LED is dependent on the coating thickness of the organic material. This thickness must be within a predetermined range. When manufacturing OLEDs in 201037874, it is important to control the coating rate of the coating of the organic material to be within a predetermined tolerance. In other words, the coating rate (also referred to as the deposition rate) of the evaporator (such as the organic vaporizer) must be completely controlled during the coating process. To achieve this goal, it is known that this technique uses a so-called quartz crystal microbalance or a quartz resonator to determine the coating rate. The measurement of the actual vibration frequency of these vibrating crystals allows the results of the actual coating rate. None, these crystals are also coated with material during the ..., coating process. Therefore, the crystals must be periodically replaced because the crystals can only withstand a limited amount of material coating "this reduces their usability, especially in large-scale production plants with very long maintenance life. In addition, in order to replace the vibrating crystals, it is necessary to intervene in the vacuum chamber. Regenerating the vacuum is time consuming and expensive. Alternatively, the art is known to analyze the deposited layer after deposition to determine the coating rate by Q. In this case, the feedback control of the deposition system is only feasible with a specific delay. In particular, the program causes one or more substrates to be coated with an over-range layer before the control can take corrective action. SUMMARY OF THE INVENTION In the foregoing, an evaporator according to claim 1 of the patent application, a coating apparatus as claimed in the first aspect of the patent application, and a vapor application as in claim 11 of the scope of claim 201037874 are provided. The method of going to the substrate. In one embodiment, an evaporator for applying vapor to a substrate at a coating rate is provided. The evaporator includes: an evaporator tube having a distribution tube containing at least one nozzle outlet; and wherein the evaporator tube includes a pressure measuring device including an optical diaphragm.

根據另一實施例,提供一種用以塗覆基材的塗覆設 備。該塗覆設備包括用以於一塗覆速率施加蒸氣到一基 材的至少一蒸發器’該蒸發器包括:一蒸發器管,其具 有一含有至少一噴嘴出口的分佈管;及其中該蒸發器管 包括一壓力測量裝置,該壓力測量裝置包含一光學隔膜 計。 根據進一步實施例,提供—種用以施加蒸氣到一基材 的方法’财法包含下述步驟:使用―蒸發器來提供蒸 氣’以於-塗覆速率施加蒸氣到該基材,該蒸發器包括 -蒸發器管,該蒸發器管具有一含有至少一喷嘴出口的 分佈管’並且其中該蒸發器管包括一壓力測量裝置,該 壓力測量裝置包含一光學隔膜計;施加蒸氣到該基材; 及測量該蒸發器管内的蒸氣的壓力。 進-步特徵及細節可由附屬項、說明書内容及圖式而 實施例係也導向設備’其用以實現所揭露方法且 :執行所述方法步驟之設備部件。此外,實施例係:導 ’所述設備可藉由此方法運作或所述設備可藉由 201037874 此方法被製造。复π、a, 製造机借心、^ u匕括用以實現設備之功能或用以 製& D又備。卩件的方法 少鄉此二方法步驟可以經由硬體 疋件、韌體、軟體、告 ^ ^ ... . k虽軟體予以程式化的電腦、任 何刖述組合、成权"# 及任何其他方式來執行。 【實施方式】 以下將詳細地泉昭久棚杳说友丨 *、、、各個貫施例,其中該些實施例的一 或多個實例係繪示右阁—ώ . 圖式中。各個實例是為了解釋用, 並且不會對本發明構成限制。 不會限制範嘴,在下文中,實例和實施例是以有機物 塗層的真空沉積和用以施加有機物蒸氣的蒸發器(在此 亦稱為有機物蒸發器)來敘述。典型地,蒸發器的實施例 包括真空相容材才斗,並且塗覆設備為一真空塗覆設備。 在此描述的實施例的典型應用係例如在生產顯示器(諸 如LCD、TFT顯示器與0LED)、在製造太陽能晶圓及在 ◎ 製造半導體元件時的沉積應用(例如有機物塗層的沉 積)。 在以下的圖式的說明中’相同的元件符號係指稱相同 的元件。通常,僅描述個別實施例的差異處。 根據一實施例,提供一種用於以一塗覆速率來施加蒸 氣(在此亦稱為氣體或蒸發材料)到基材之蒸發器。蒸發 器具有一蒸發器管’該蒸發器管具有一含有至少一喷嘴 出口的分佈管,並且其中該蒸發器管包括一壓力測量裝 201037874According to another embodiment, a coating apparatus for coating a substrate is provided. The coating apparatus includes at least one evaporator for applying vapor to a substrate at a coating rate. The evaporator includes: an evaporator tube having a distribution tube having at least one nozzle outlet; and the evaporation therein The tube includes a pressure measuring device that includes an optical diaphragm. According to a further embodiment, a method for applying vapor to a substrate is provided, the method comprising the steps of: using an "evaporator to provide a vapor" to apply a vapor to the substrate at a coating rate, the evaporator Including an evaporator tube having a distribution tube having at least one nozzle outlet and wherein the evaporator tube includes a pressure measuring device comprising an optical diaphragm meter; applying vapor to the substrate; And measuring the pressure of the vapor in the evaporator tube. Further features and details may be derived from the dependent items, the description and the drawings, and the embodiments are also directed to a device that implements the disclosed method and: implements the device components of the method steps. Further, an embodiment is: the device can be operated by this method or the device can be manufactured by the method of 201037874. The complex π, a, the manufacturing machine borrows the heart, the ^ u 匕 includes to implement the function of the device or to use the & D. The method of 卩 少 此 此 此 此 此 此 此 此 此 此 此 此 此 此 此 此 此 此 此 此 此 此 此 此 此 此 此 此 此 此 此 此 此 此 此 此 此 此 此 此 此 此 此 此 此 此 此 此Other ways to execute. [Embodiment] In the following, the details of the embodiments of the present invention will be described in detail, and one or more examples of the embodiments are shown in the right cabinet. The examples are for illustrative purposes and do not limit the invention. The nozzles are not limited. In the following, examples and examples are described by vacuum deposition of an organic coating and an evaporator for applying organic vapor (also referred to herein as an organic vaporizer). Typically, embodiments of the evaporator include a vacuum compatible material, and the coating apparatus is a vacuum coating apparatus. Typical applications for the embodiments described herein are, for example, in the production of displays (such as LCDs, TFT displays and OLEDs), in the fabrication of solar wafers, and in the deposition of semiconductor components (e.g., deposition of organic coatings). In the following description of the drawings, the same element symbols are referred to as the same elements. Generally, only the differences of the individual embodiments are described. According to an embodiment, an evaporator for applying steam (also referred to herein as a gas or evaporating material) to a substrate at a coating rate is provided. The evaporator has an evaporator tube 'the evaporator tube has a distribution tube containing at least one nozzle outlet, and wherein the evaporator tube includes a pressure measuring device 201037874

置,該壓力測量裝置包括一光學隔膜計(optical diaphragm gauge, ODG)。ODG在此也稱為感測器或〇dG 感測器。蒸發器可以是一具有長形分佈管的線性蒸發 源’如第1A和1B圖所是。或者’在此描述的實施例的 蒸發器可以是區域蒸發源。蒸發器的速率(在此也稱為沉 積速率或塗覆速率)係取決於填充蒸發器管(例如填充分 佈管)之蒸發材料的壓力。此壓力對應於材料的蒸氣麼。 在例如線性蒸發源中,一均質沉積速率是藉由在管中(例 如在分佈管中)產生高於管的外壓力來達成。壓力差異係 和來自源的材料通量相關’並且因此和沉積速率相關。 越兩的壓力造成越高的速率。典型地,管與(或)分佈管 具有高溫(例如對於有機材料高達約5〇〇<t)以避免蒸發 材料的凝結。又,若用以測量鄰近蒸發器或在蒸發器中 之虔力的壓力感測器太熱,這會影響或損壞蒸發材料(倘 若使用有機材料的話)。 透過在此描述之實施例的蒸發器,一光學隔膜計係用 ㈣量蒸發H管内蒸發材料的壓力。根據本發明之光興 隔膜計可以用在高溫與(或)高電磁干擾(EiectroThe pressure measuring device includes an optical diaphragm gauge (ODG). ODG is also referred to herein as a sensor or 〇dG sensor. The evaporator may be a linear evaporation source having an elongated distribution tube as shown in Figures 1A and 1B. Alternatively, the evaporator of the embodiment described herein may be a regional evaporation source. The rate of the evaporator (also referred to herein as the rate of deposition or coating rate) is dependent on the pressure of the evaporating material that fills the evaporator tubes (e.g., the packing tubes). Does this pressure correspond to the vapor of the material? In, for example, a linear evaporation source, a homogeneous deposition rate is achieved by creating an external pressure above the tube in a tube (e.g., in a distribution tube). The pressure difference is related to the material flux from the source' and is therefore related to the deposition rate. The higher the pressure, the higher the rate. Typically, the tubes and/or distribution tubes have a high temperature (e.g., up to about 5 Torr for organic materials) to avoid condensation of the evaporating material. Also, if the pressure sensor used to measure the force of the adjacent evaporator or in the evaporator is too hot, this can affect or damage the evaporating material (if organic materials are used). Through the evaporator of the embodiment described herein, an optical diaphragm meter uses (iv) the amount of vaporized material evaporating material in the H tube. The optical diaphragm meter according to the present invention can be used for high temperature and/or high electromagnetic interference (Eiectro)

Magnetlc Interference,EMI)環境中,並且此外可以是广 腐钱的。因此,實施例之塵力測量裝置係維持蒸發心 内的高溫和其他條件。再者,實施例之壓力測量裝置不 针化疋因為光學隔膜計不需要高工作溫 度。所以,可以在蔘於装 的且方便的壓力測量=接於蒸發器管内進行可靠 例如於製造OLED元件時在有機 201037874 物塗覆材料的蒸發期間。 使用在此描述的實施例的沉積速率控制是快速的,實 質上不會取决於蒸發材料的種類,並且對於測量時間沒 有限制。尤其,使用在此描述之實施例的沉積速率控制 • 是-直接的壓力測量’其和氣體形式或蒸氣形式無關, 而使用直接的壓力。因此,壓力測量不是根據非直接氣 體性質(例如導電率或離子化)。所以,氣體轉換因子(其 和氣體無關)可以用於沉積控制。沉積速率測量可以連續 〇 地執行數天及數週’其容許沉積速率控制器的便利結構 和程序編排(programming)。 典型地,實施例之蒸發器管是由真空相容材料(例如不 銹鋼)製成。在根據一些實施例的蒸發器中,光學隔膜計 包括一測量部,該測量部包括一膜片(在此亦稱為隔 膜)。在一些實施例中,其可與在此描述的任何其他實施 例結合’膜片是從選自由陶瓷材料、A12〇3材料、及藍寶 Q 石類型之AhO3材料所構成群組之至少一材料製成。在 一些實施例中,其可與在此描述的任何其他實施例結 合’光學隔膜計係適於光學地測量膜片的壓力相依彎曲 性。根據進一步實施例’其可與在此描述的任何其他實 施例結合,光學隔臈計的膜片是被提供在一測量真空腔 室與一參考真空腔室之間,或將該兩腔室分離。在一此 實施例中,其可與在此描述的任何其他實施例結合,參 考真空腔室可以流體地連接到一製程真空腔室(例如一 塗覆腔室)或可以是一製程真空腔室(例如一塗覆腔 201037874 其中蒸發器係被設置在該製程真空腔室内以進行蒸發。 藉此,製程腔室中的壓力或真空的夂去总、 “麻. 具工的各者係分別為或提供 參考壓力或參考真空,以操作該光學隔膜計。 在典型的實施例中,蒸發器更包括—分析器(在此亦稱 為控制器),其連接到塵力測量裝置(例如藉由—資 Ο ❹ 接到-债測器)。典型地,分析器係根據屋力測量裝置提 供的資訊來決定塗覆速率。又,典型地,分析器可以存 取一記憶體。蒸氣之典型塗覆速率的資料可以儲存在記 憶體。舉例而言,分析器可以包括一個人電腦,並且記 憶體可以是該個人電腦的硬碟機或諸如此類者。分析器 可以具有-輸入單元(例如鍵盤或滑鼠),以容許操作者 可影響分析器的動作和連接到分析器的單元(例如可控 制的座閥)。X ’分析器可以具有一輸出單元(例如螢幕 或緣圖器)’以顯示操作資訊(例如從偵測器接收的數值 與(或)從這些數值計算的計算結果)。該些測量的資料數 值含儲存在記憶體的資料數值可以一起進行處理(例如 比對),以決定實際的沉積速率。 /根據實施例的方法中,可以在施加蒸氣到基材之前執 行須J度步驟。大致上,蒸發器管中沉積速率與麼力的 關聯是在塗覆開始時就測度。在蒸發期間,可以重複一 測度步驟’例h在特定時間間隔或持續i也。在基材塗覆 期間進行測度也是可行的。舉例而言,經塗覆的基材的 塗層厚度可以在塗覆步驟之後直接地被檢視,並且可以 和在塗覆個別基材的時間點所測量的壓力相關聯。 201037874 第1A圖顯示蒸發器之-實施例之-分佈管100的前視 圖。蒸發器之分佈管100包括多個喷嘴出口 11〇。根據 實施例之,、型的分佈管的直徑是介於1 cm與丨〇 之 間’更典型地為介於4 cm與6 cm之間。當以有機材料 纟蒸發基材時,分佈管内的壓力(其大於外面壓力)係使 得有機物蒸氣朝向基材(未示出)而流出分佈管。在第以 圖中,基材設置在紙張平面上方。在用以塗覆基材的典 $方法中,有機物蒸氣在真空壓力中被施加到基材。術 語「真空」係指10-2 mbar且更低的壓力。典型地,該等 喷嘴出口的形狀及配置係可使一喷嘴出口的蒸氣流和一 緊接鄰近之噴嘴出口的蒸氣流在基材表面上重疊,以為 了最適化層均勻性。 第圖係繪示第1A圖之蒸發器的側視圖。為了控制 塗覆速率,根據第1A圖和第⑺圖的有機物蒸發器包括 一測量裝置10,其用於獲得分佈管1〇〇内之有機物蒸氣 〇 的壓力貢料。在此實施例中,測量裝置1 〇係適於獲得分 佈管内之有機物蒸氣的壓力資料。因此,可以將測量裝 置10提供於分佈管的壁,例如測量裝置10可以設置在 分佈管的壁的開口中或將其填滿。 大致上,實施例的分佈管可以是一具有至少一喷嘴出 口 U0的中空本體。典型地,分佈管1〇〇與一饋送單元(例 如坩鍋300)連接,饋送單元係用於將有機物蒸氣饋送給 刀佈管。在此實施例中,分佈管經由一供應管310連接 到掛鋼。典型地’分佈官包括介於1 5個與1 〇〇個之間的 201037874 喷嘴出口’通常介於20個與30個之間。典型地,嗔嘴 出口的直徑介於0.1 mm與5 mm之間,尤其介於1 mm 與2 mm之間。分佈管的形狀可以是管狀或諸如此類者。 在其他實施例中,分佈管為一噴頭。 右噴嘴的數量及其個別開口面積相較於分佈管的總尺 寸/體積是小的,則管被視為一密閉的分佈管。因而,管 内的壓力是更穩定的’且可促成更佳的塗覆製程和壓力 測量。Magnetlc Interference (EMI) environment, and in addition can be widely rotted. Therefore, the dust force measuring device of the embodiment maintains the high temperature and other conditions in the evaporation core. Further, the pressure measuring device of the embodiment is not needled because the optical diaphragm does not require a high working temperature. Therefore, it is possible to perform reliable measurements in a convenient and convenient pressure measurement in the evaporator tube, for example during the evaporation of the organic 201037874 coating material, for example in the manufacture of OLED elements. The deposition rate control using the embodiments described herein is fast, does not substantially depend on the type of evaporation material, and is not limited to the measurement time. In particular, the deposition rate control using the embodiments described herein is - a direct pressure measurement - which is independent of the gas form or vapor form, while using direct pressure. Therefore, pressure measurements are not based on indirect gas properties (such as conductivity or ionization). Therefore, the gas conversion factor (which is independent of the gas) can be used for deposition control. The deposition rate measurement can be performed continuously for several days and weeks. The convenient structure and programming of the allowable deposition rate controller. Typically, the evaporator tubes of the examples are made of a vacuum compatible material such as stainless steel. In an evaporator according to some embodiments, the optical diaphragm meter includes a measuring portion that includes a diaphragm (also referred to herein as a diaphragm). In some embodiments, which may be combined with any of the other embodiments described herein, the membrane is at least one material selected from the group consisting of ceramic materials, A12〇3 materials, and sapphire Q stone type AhO3 materials. production. In some embodiments, it can be combined with any of the other embodiments described herein. The optical diaphragm gauge is adapted to optically measure the pressure dependent bend of the diaphragm. According to a further embodiment, which can be combined with any of the other embodiments described herein, the diaphragm of the optical spacer is provided between a measuring vacuum chamber and a reference vacuum chamber, or separates the two chambers . In one such embodiment, which may be combined with any of the other embodiments described herein, the reference vacuum chamber may be fluidly coupled to a process vacuum chamber (eg, a coating chamber) or may be a process vacuum chamber. (for example, a coating chamber 201037874 in which an evaporator is disposed in the process vacuum chamber for evaporation. Thereby, the pressure or vacuum in the processing chamber is total, "Ma. Each of the workers is Or providing a reference pressure or reference vacuum to operate the optical diaphragm. In a typical embodiment, the evaporator further includes an analyzer (also referred to herein as a controller) that is coupled to the dust measuring device (eg, by - Assets 接到 Received - Debt detector. Typically, the analyzer determines the coating rate based on information provided by the house strength measuring device. Also, typically, the analyzer can access a memory. Typical coating of vapor The rate-of-rate data can be stored in the memory. For example, the analyzer can include a personal computer, and the memory can be a hard disk drive of the personal computer or the like. The analyzer can have - an input unit (such as a keyboard or mouse) to allow the operator to influence the motion of the analyzer and the unit connected to the analyzer (eg, a controllable seat valve). The X' analyzer can have an output unit (such as a screen or The edge mapper' displays operational information (such as values received from the detector and/or calculations calculated from these values). The measured data values contain the data values stored in the memory and can be processed together ( For example, aligning) to determine the actual deposition rate. / In the method according to the embodiment, the J-degree step can be performed before applying the vapor to the substrate. Generally, the deposition rate in the evaporator tube is related to the force. The measurement is taken at the beginning of the coating. During the evaporation, a measure step can be repeated 'case h at a specific time interval or for a long time. Also, it is possible to measure during substrate coating. For example, coated substrate The coating thickness can be directly observed after the coating step and can be correlated to the pressure measured at the point in time when the individual substrates are coated. 201037874 1A A front view of the distribution tube 100 of the embodiment of the evaporator is shown. The distribution tube 100 of the evaporator comprises a plurality of nozzle outlets 11A. According to an embodiment, the diameter of the distribution tube is between 1 cm and 丨〇. Between the more typically between 4 cm and 6 cm. When the substrate is evaporated with an organic material, the pressure inside the distribution tube (which is greater than the external pressure) causes the organic vapor to face the substrate (not shown). The distribution tube is discharged. In the figure, the substrate is placed above the plane of the paper. In the method of coating the substrate, the organic vapor is applied to the substrate under vacuum pressure. The term "vacuum" means 10 -2 mbar and lower pressure. Typically, the nozzle outlets are shaped and arranged such that a vapor stream at a nozzle outlet and a vapor stream immediately adjacent the nozzle outlet overlap on the surface of the substrate for optimum Layer uniformity. The figure shows a side view of the evaporator of Figure 1A. In order to control the coating rate, the organic vapor evaporator according to Figs. 1A and (7) includes a measuring device 10 for obtaining a pressure tribute of the organic vapor enthalpy in the distribution pipe 1 . In this embodiment, the measuring device 1 is adapted to obtain pressure data of the organic vapor in the dispensing tube. Thus, the measuring device 10 can be provided to the wall of the distribution tube, for example the measuring device 10 can be placed in or filled in the opening of the wall of the distribution tube. In general, the distribution tube of the embodiment can be a hollow body having at least one nozzle outlet U0. Typically, the distribution tube 1 is coupled to a feed unit (e.g., crucible 300) for feeding organic vapor to the knife tube. In this embodiment, the distribution tube is connected to the hanging steel via a supply pipe 310. Typically the 'distribution officer' includes between 10 and 1 201037874 nozzle outlets' typically between 20 and 30. Typically, the diameter of the mouthpiece outlet is between 0.1 mm and 5 mm, especially between 1 mm and 2 mm. The shape of the distribution tube can be tubular or the like. In other embodiments, the distribution tube is a showerhead. The number of right nozzles and their individual opening areas are small compared to the total size/volume of the distribution tube, and the tube is considered to be a closed distribution tube. Thus, the pressure within the tube is more stable' and can lead to better coating process and pressure measurements.

第2圖顯示的實施例係類似於第丨A和ib圖顯示的實 施例,差異找壓力測量裝置1G位在有機物蒸發器的供 應管310中。 在掛鋼與分佈管之間某處設置一座闕是可行的。這係 示範地顯示在第2圖的實施例中’其中閥33〇是位在供 應管的垂直部和其水平部之間。在所顯示的實施例 中’掛鋼經由座閥連接到分佈管。可以手動地或自動地 控制座目330。舉例而言,若有機材料的沉積欲暫時停 止’可以完全關閉座閥。通常’可以控制座閥以控制有 機物蒸發器内的有機材料密度。亦即,可以使用座間來 控:有機物蒸發器的塗覆速率。典型地,座闊可以連接 h述刀析H且 < 分析器所控制。在根據實施例之有機 物蒸發器中裝設超過一個座閥也是可行的。例如,可以 手動地控制一座閱’並且可以由分析器來控制另一座閥。 第^顯示有機物蒸發器之—進__步實施例,其中壓 測篁裝置包括一在此所摇述之實施例的光學隔膜計, 201037874 例如靠近_供應管310之掛銷300的孔洞處。 —貫施例中,有機物蒸發器包括坩鍋300與一或 多個供應管310。坩钯7 鋼3 〇〇可以被填充以固體形式或液 體形式的有機材料。技; 妾者掛鋼被加熱到材料部分改變 其聚結狀態成蒸氣的溫度。 ΟThe embodiment shown in Fig. 2 is similar to the embodiment shown in Figs. A and ib, and the differential pressure finding device 1G is located in the supply pipe 310 of the organic vaporizer. It is feasible to set a raft somewhere between the hanging steel and the distribution pipe. This is exemplarily shown in the embodiment of Fig. 2 where the valve 33 is positioned between the vertical portion of the supply tube and its horizontal portion. In the embodiment shown, the steel is connected to the distribution tube via a seat valve. The seat 330 can be controlled manually or automatically. For example, if the deposition of organic material is to be temporarily stopped, the seat valve can be completely closed. Typically, the seat valve can be controlled to control the density of organic materials in the organic vaporizer. That is, it is possible to use the inter-seat control: the coating rate of the organic vaporizer. Typically, the seat can be connected to the H and the < analyzer controls. It is also feasible to install more than one seat valve in the organic evaporator according to the embodiment. For example, one can be manually controlled and another valve can be controlled by the analyzer. The embodiment of the organic vaporizer is shown in which the pressure detecting device comprises an optical diaphragm meter of the embodiment described herein, for example, 201037874 near the hole of the pin 300 of the supply tube 310. - In the embodiment, the organic vaporizer comprises a crucible 300 and one or more supply tubes 310. Palladium 7 steel 3 〇〇 can be filled with organic materials in solid form or in liquid form. The steel is heated to the temperature at which the material partially changes its coalescence into a vapor. Ο

典型地’蒸發器具有一密閉的幾何形態。亦即,孔洞 "0為蒸氣離開有機物蒸發器的唯一開口。由於有機物 蒸發器内相較於外界環境具有較高的壓力,蒸氣可流出 分佈管到基材32G上。典型地,有機物蒸發ϋ之密閉幾 何形態内的壓力係和有機材料的蒸氣壓相應。此壓力典 型地是在l(T2mbar範圍’例如約2xm 4xi〇_2mb訂。 相對地,有機物蒸發器外面的壓力可以介於約1G_4mbar 與1 (Γ7 mbar之間。 第4圖為一塗覆設備之一實施例的側視圖。第4圖顯 示塗覆腔t 500内之有機物蒸發器實施例,其中該塗覆 腔室5 0 0通常是在運作期間藉由一或多個真空泵(未示出 來排空(evacuate)。 典型地,根據實施例之塗覆設備包括進一步的製程腔 室’該等進-步的製程腔室係位在有機物蒸發器之前與 (或)之後。典型地,實施例之有機物蒸發器是被作為一 垂直線性有機物蒸發器。典型地,多個基㈣在同線地 (in-line)被處理。亦即,有機材料是水平地被蒸發到垂直 定向的基材上。典型地’基材是由一組裝線來持續地傳 送’其中該組裝線具有設置成—列之多個不同的製程腔 12 201037874 室。在典型實施例中,對於一基材而言,塗覆所需的時 間間隔是介於10秒與4分鐘之間,更典型地為介於3〇 私與90秒之間。塗覆頻率係指在指定時間内所能塗覆的 基材數量。 根據在此描述的實施例,塗覆設備可以包括一些有機 物蒸發器。塗覆設備之製程腔室可以具有不同程度的真 二度典型地,欲塗覆的基材係在進入腔室以進行有機 ❹ 物塗覆之前經歷一或多個清潔製程步驟。更典型地,基 材係在/儿積一或多個有機層之後被塗覆以一無機層。這 是因為有機材料對於氧是敏感的。所以’在許多實施例 中’一蓋層將可保護有機材料層。 又,由於有機材料幾乎無法在濕式化學蝕刻製程中被 蝕刻,在塗覆期間,基材通常借助於遮罩。典型地,遮 罩對準於基材,典型地,具有高局部精確度的金屬罩係 對準於基材。然後’基材被塗覆。 〇 根據在此描述的實施例,蒸發器之壓力測量裝置包括 —光學隔膜計10。在一些實施例中,光學隔膜計1〇為 真空測量胞室,其在一實例中包括一由A丨2〇3材料製 成的第一外殼本體1與一由A〗2〇3材料製成的膜片2,該 骐片2係以真空密封方式被配置成鄰近該第一外殼本 體,從而在第一外殼本體與膜片之間建立一參考真空腔 室。真空測量胞室可以包括一第二外殼本體4,其由Al2〇3 材料製成且以真空密封方式設置成和膜片2相對,從而 在第二外殼本體與膜片之間建立一測量真空腔室26,第 13 201037874 一外设本體包括一用以i車接句·,,目丨丨旦古# 用从逑接”亥測里真空腔室到蒸發器管 之内部的埠5。在第—外鲈太 任弟外喊本體的中心區域中可以形成 一光學穿透窗口 33,並且在膜片的5,卜占 你勝乃的至少中心區域中可以Typically the evaporator has a closed geometry. That is, the hole " 0 is the only opening of the vapor leaving the organic vaporizer. Since the organic vaporizer has a higher pressure than the external environment, the vapor can flow out of the distribution pipe to the substrate 32G. Typically, the pressure system within the closed geometry of the organic vapor evaporating crucible corresponds to the vapor pressure of the organic material. This pressure is typically in the range of 1 (T2 mbar range, for example about 2 x m 4 xi 〇 2 mb. Relatively, the pressure outside the organic vaporizer can be between about 1 G _ 4 mbar and 1 (Γ 7 mbar. Figure 4 is a coating device) A side view of one embodiment. Figure 4 shows an embodiment of an organic vaporizer within a coating chamber t 500, wherein the coating chamber 500 is typically operated by one or more vacuum pumps during operation (not shown) Evacuation Typically, the coating apparatus according to an embodiment includes a further processing chamber 'the process chambers before and/or after the organic vaporizer. Typically, embodiments The organic vaporizer is used as a vertical linear organic vaporizer. Typically, a plurality of substrates (four) are processed in-line. That is, the organic material is evaporated horizontally onto a vertically oriented substrate. Typically the 'substrate is continuously conveyed by an assembly line' having a plurality of different process chambers 12 201037874 chambers arranged in a column - in a typical embodiment, for a substrate, coated The time interval required for the overlay is Between 10 seconds and 4 minutes, more typically between 3 〇 and 90 seconds. The coating frequency refers to the number of substrates that can be applied within a specified time. According to the embodiments described herein The coating apparatus may include some organic vaporizers. The processing chamber of the coating apparatus may have varying degrees of true degree. Typically, the substrate to be coated is subjected to a process prior to entering the chamber for organic coating. Or a plurality of cleaning process steps. More typically, the substrate is coated with an inorganic layer after one or more organic layers. This is because the organic material is sensitive to oxygen. So in many embodiments The 'one cap layer will protect the organic material layer. Also, since the organic material is hardly etched in the wet chemical etching process, the substrate is usually covered by a mask during coating. Typically, the mask is aligned The substrate, typically, has a high local precision metal cover aligned to the substrate. The 'substrate is then coated. 〇According to the embodiments described herein, the pressure measuring device of the evaporator includes an optical diaphragm 10 In some real In the example, the optical diaphragm 1 is a vacuum measuring cell, which in one example comprises a first housing body 1 made of A 2 2 material and a diaphragm made of A 2 2 3 material. 2, the cymbal 2 is configured to be adjacent to the first housing body in a vacuum sealing manner to establish a reference vacuum chamber between the first housing body and the diaphragm. The vacuum measuring cell may include a second housing body 4, which is made of Al2〇3 material and is disposed in a vacuum sealing manner opposite to the diaphragm 2, thereby establishing a measuring vacuum chamber 26 between the second housing body and the diaphragm, 13th 201037874 a peripheral body includes I used the car to connect the sentence, and, in the case of the 真空5, the 腔5 from the vacuum chamber to the inside of the evaporator tube. An optical penetrating window 33 may be formed in the central area of the body outside the body of the outer scorpion, and may be in at least the central area of the diaphragm 5

將面對光學穿透窗口的膜片的表面形成為光學反射的。 參考真空腔室外面而和窗口 33相對且距離窗^ Μ 一距 離處’可以配置-光饋送裝置(例如一或多個光纖維3卜 3 7,),用以將光饋送進出到膜片2的表面31上。又可 以在光饋送裝置37、37,與窗口 33(在此亦稱為光學窗口) 之間設置一透鏡裝置35,用於光學連接到膜片2的表面 31(例如一鏡子或一鏡子塗層)。藉此,此配置形成一用 以決定膜片2之彎曲性程度的測量部,例如藉由使用 Fabry_Perot干涉計原理而形成Fabry-Perot干涉計。 在另一實施例中,其可與在此描述的任何其他實施例 結合,壓力測量裝置包括一栓塞,光學隔膜計設置在栓 塞中’並且栓塞係裝設在蒸發器管的一開口中,從而使 得光學隔膜計的測量真空腔室連接到蒸發器管的内部, 栓塞係光學上由石英構成且為圓錐形。 壓力測量裝置的一實例係顯示在第5圖,其繪示光學 隔膜計1 0。第6A和6B圖(作為一實施例的進一步實例) 顯示一壓力測量裝置12,壓力測量裝置12包括一检塞 14 ’光學隔膜計1〇設置在栓塞Η中。如第6B圖的實例 所示’光學隔膜計10係可操作地被提供在栓塞14内β 在一實例中,如第6Α圖所示,壓力測量裝置12係被提 供用來镇測蒸發器之分佈管1〇〇内的壓力。栓塞14可以 14 201037874 被提供在分佈管的壁中或填充分佈管的壁中的一開口, 從而使得光學隔膜計10的測量真空腔室26可以接取分 佈管100的内部。 '栓塞14可以例如由石英製成。在一些實例中,栓塞 • 14可以是圓錐形且中心地包圍光學隔膜計10。栓塞14 係用來將壓力測量裝置1 2可操作地裝設在例如分佈管 中’如第1B圖所示。圓錐形形態係進一步容許將壓力測 量裝置12壓入蒸發器管的一開口(在此實例中為分佈管 ® 100的開口 ιοί)内而裝設壓力測量裝置12。可以選擇栓 塞14的材料’從而使得在將栓塞壓入開口内時可在栓塞 14與蒸發器管的壁之間提供例如一真空緊密密封。此 外’由於栓塞14,壓力測量裝置12可輕易替換。 在一進一步實施例中,其可與在此描述的任何其他實 施例結合,光學隔膜計1〇的光饋送裝置37、37,連接到 蒸發器的分析器。一實例的分析器包括一干涉計、一分 ❹ 光計與一燈’如第7圖所示。藉此’光可以被饋送進出 光學隔膜計1 〇且被分析。 第 5 圖緣示光學隔膜計(0pticai diaphragm gauge, ODG) 測量胞室的一實例’其由Ah〇3製成且其結構係繞著膜 片實質上對稱。此種類型的ODG測量胞室係被描述且綠 示在US7,305,888B2,其在此被併入本文以作為參考。 第一外殼1由一八丨2〇3製成的陶瓷板構成,其沿著其邊 緣相對於膜片2約2μιη至約50μιη的距離處被緊密地黏 接’藉此形成一參考真空腔室25。典型地,在組裴期間 15 201037874 陶究板!的兩表面與膜片2之間的距離係藉由膜片邊緣 和外殼1之間的密封材料3、3,直接地被建立。依此方 式’可以使用-完全平坦的外殼才反i。依相同方式,一 測量真空腔室26被形成在相對膜片側上的第二外殼* 中。對於待測量的媒質,真空腔室26是可經由一連接璋 5通過外殼4中一開口而接取的。 ΟThe surface of the diaphragm facing the optically penetrating window is formed to be optically reflective. Referring to the outside of the vacuum chamber and opposite to the window 33 and at a distance from the window, a light feeding device (for example, one or more optical fibers 3b, 3, 7) can be disposed for feeding light into and out of the diaphragm 2 On the surface 31. It is also possible to provide a lens arrangement 35 between the light feed means 37, 37 and the window 33 (also referred to herein as an optical window) for optical connection to the surface 31 of the diaphragm 2 (for example a mirror or a mirror coating). ). Thereby, this configuration forms a measuring portion for determining the degree of flexibility of the diaphragm 2, for example, by using the Fabry_Perot interferometer principle to form a Fabry-Perot interferometer. In another embodiment, which may be combined with any of the other embodiments described herein, the pressure measuring device includes a plug, the optical diaphragm is disposed in the plug and the plug is mounted in an opening of the evaporator tube, thereby The measuring vacuum chamber of the optical diaphragm is connected to the interior of the evaporator tube, the plug system being optically composed of quartz and conical. An example of a pressure measuring device is shown in Fig. 5, which shows an optical diaphragm 10. 6A and 6B (as a further example of an embodiment), a pressure measuring device 12 is shown, which includes a plug 14'. The optical diaphragm 1 is disposed in the plug. As shown in the example of Fig. 6B, the 'optical diaphragm meter 10 is operatively provided within the plug 14 in an example. As shown in Fig. 6, a pressure measuring device 12 is provided for measuring the evaporator. The pressure inside the distribution tube 1〇〇. The plug 14 can be provided in the wall of the distribution tube or in an opening in the wall of the distribution tube such that the measurement vacuum chamber 26 of the optical diaphragm 10 can access the interior of the dispensing tube 100. The plug 14 can for example be made of quartz. In some examples, the plug 14 can be conical and centrally surround the optical diaphragm 10. The plug 14 is used to operatively mount the pressure measuring device 12 in, for example, a distribution tube as shown in Figure 1B. The conical configuration further permits the pressure measuring device 12 to be installed by pressing the pressure measuring device 12 into an opening of the evaporator tube (in this example, the opening ιοί of the distribution tube ® 100). The material of the plug 14 can be selected such that a vacuum tight seal can be provided between the plug 14 and the wall of the evaporator tube when the plug is pressed into the opening. Further, due to the plug 14, the pressure measuring device 12 can be easily replaced. In a further embodiment, which can be combined with any of the other embodiments described herein, the optical pickups 37, 37 of the optical diaphragm are connected to the analyzer of the evaporator. An example analyzer includes an interferometer, a minute calorimeter and a lamp' as shown in Fig. 7. Thereby, the light can be fed into and out of the optical diaphragm 1 and analyzed. An example of measuring a cell of a 0pticai diaphragm gauge (ODG) is made of Ah〇3 and its structure is substantially symmetrical about the membrane. This type of ODG measurement cell line is described and is shown in U.S. Patent No. 7,305,888, the disclosure of which is incorporated herein by reference. The first outer casing 1 is composed of a ceramic plate made of a bark 2 〇 3, which is closely adhered along its edge at a distance of about 2 μm to about 50 μm with respect to the diaphragm 2, thereby forming a reference vacuum chamber. 25. Typically, during the group period 15 201037874 Pottery board! The distance between the two surfaces and the diaphragm 2 is directly established by the sealing material 3, 3 between the edge of the diaphragm and the outer casing 1. In this way, it is possible to use a completely flat outer casing. In the same manner, a measuring vacuum chamber 26 is formed in the second outer casing * on the opposite diaphragm side. For the medium to be measured, the vacuum chamber 26 is accessible through an opening in the outer casing 4 via a port 5 . Ο

膜片2之兩側上的密封件3、3’係界定了料殼^ * 的距離,> 前所述。此密封件係由例如玻璃膠⑻咖 構成,其中該玻璃膠可易於操控且可例如藉由網印來施 加。玻璃膠的預熔或燒結溫度為例如約675它至約715 c的範圍内。並且,岔封溫度為例如約至約 °C的範圍内。密封件3、3,可以由真空相容的材料製成。 在典型的測量胞室的外部直徑為約5 mm至約5〇 mm (典型地為約38 mm)且自由内部膜片直徑為約4 mm至約 45 mm (典型地為約30 mm),第一和第二外殼之間的距 離為約2μηι至50μηι (典型地為約12〜35μηιρ在此實例 中,第一外设1的外殼為約2〜1 〇 mm,第二外殼4具有 相同的厚度。第一外殼1與第二外殼4通常是具有和所 使用隔膜材料類似的膨脹係數的材料製成。非常合適的 組合是高純度氧化鋁陶瓷(純度> 96%,典型地純度> 99.5%)、高純度氧化鋁陶竟(sapphai ceramics)(純度大於 99.9°/。的氧化鋁)、及藍寶石(3叩1)11丨]^)(單晶高純度氧化 銘’人造剛石)。第二外殼4的内部區域通常是設計成具 有約0.5 mm深度的凹部,以為了擴大測量真空腔室26。 16 201037874 在參考真空侧上,膜片2被塗覆以一反射膜而形成了 一鏡子塗層31«有兩種塗覆該隔膜2與該窗口或該第一 外殼以建立一 Fabry-Perot干涉計的方式。可以用在 Fabry-Perot干涉計之塗覆的主要概念係詳細地被描述在 文獻中(參見 Vaughan JM,The Fabry-Perot Interferometer,The seals 3, 3' on both sides of the diaphragm 2 define the distance of the casing, > previously described. The seal is constructed, for example, of a glass glue (8), wherein the glass glue can be easily manipulated and can be applied, for example, by screen printing. The pre-melting or sintering temperature of the glass glue is, for example, in the range of about 675 to about 715 c. Further, the sealing temperature is, for example, in the range of about to about °C. The seals 3, 3 can be made of a vacuum compatible material. The outer diameter of a typical measuring cell is from about 5 mm to about 5 mm (typically about 38 mm) and the free inner diaphragm diameter is from about 4 mm to about 45 mm (typically about 30 mm), The distance between the first and second outer casings is about 2 μηι to 50 μηι (typically about 12 to 35 μηιρ. In this example, the outer casing of the first peripheral 1 is about 2 to 1 mm, and the second outer casing 4 has the same thickness. The first outer casing 1 and the second outer casing 4 are usually made of a material having a coefficient of expansion similar to that of the diaphragm material used. A very suitable combination is a high purity alumina ceramic (purity > 96%, typically purity > 99.5) %), high-purity sapphai ceramics (aluminum with a purity greater than 99.9°/.), and sapphire (3叩1)11丨]^) (single-crystal high-purity oxidation Ming 'artificial stone). The inner region of the second outer casing 4 is typically a recess designed to have a depth of about 0.5 mm for the purpose of expanding the vacuum chamber 26. 16 201037874 On the reference vacuum side, the membrane 2 is coated with a reflective film to form a mirror coating 31. There are two coatings of the membrane 2 with the window or the first housing to establish a Fabry-Perot interference. Way of counting. The main concept of coatings that can be used in Fabry-Perot interferometers is described in detail in the literature (see Vaughan JM, The Fabry-Perot Interferometer,

Adam Hilger Bristol and Philadelphia,2002)。第 9 圖中 係繪示該兩方式。可以選擇一主要的金屬或介電系統。Adam Hilger Bristol and Philadelphia, 2002). The two methods are shown in Figure 9. A major metal or dielectric system can be selected.

金屬塗層可以受介電塗層保護,以為了更容易進行進一 步處理。 鏡子在一實施例中為一金屬鏡子,其被設計成一完全 反射的膜。可以塗、印刷、噴灑或藉由真空製程之沉積 的方式來塗覆§亥鏡子塗層31。在一實例中,鏡子塗層31 主要含有金,並且藉由印刷來沉積,且其厚度為約〇3μηι 至約1 Ομπι。 在一些實施例中,一蒸發線14穿過第一外殼板丨。此 配置係確保測量胞室歷經長期間的精確功能,這是因為 參考真空腔室藉此具有長時間穩定性的高品質真空。在 第5圖的實施例中,蒸發線可以將參考真空腔室25與一 設置有除氣配置(第5圖未示出)的除氣腔室13連接。在 排空後’應提供一除氣器,其通常被配置成小體積而位 在第夕卜a_L且和參考真空腔室連通。此除氣器係確保 參考真空壓力比欲測量的壓力更低,典型地為低至少十 倍。為了避免内部測量胞室空間的污染,應選擇一不蒸 發的除氣器類型。根據另一實施例,其可與在此描述的 17 201037874 任何其他實施例結合,蒸發線14係將參考真空腔室 與一製程真空腔室(例如一塗覆腔室)連接,該製程真空 腔室中係提供有包括〇DG的蒸發器10以為了蒸發。在 此情況下,蒸發線14可以連接到製程真空腔室,而不是 如第5圖所示連接到除氣腔室13。因此,參考真空腔室 25内的參考真空係實質上對應於製程真空腔室中的壓力 或真空。 〇 帛-外殼本體]可以全部由光穿透材料製成,或在其 中心包括有形成一插置光學窗口 33的穿透區域。一光學 系統係直接地或以相隔距離的方式配置在穿透外殼1或 窗口 33後面,用於將Fabry_Per〇t干涉計耦接到移動臈 片的反射表面,以能夠取決於待測量的壓力來測量膜片 2的彎曲性。光和光學訊號係藉由至少一光纖維37、37, 從干涉计被饋送到測量胞室,並且從測量胞室被饋送到 干β冲纟些實例中,穿透外殼i的内表面或參考真 〇冑腔室内窗口 33相對於膜片之鏡子的内表面係被塗 覆以-部分穿透膜,典型地為一半穿透膜。當裝設測量 胞室時’此塗層必須忍受數百。c的支撐溫度。在一些實 施例中,藍寶石(sapphire)係被用作為穿透外殼工或窗口 =這是由於光學行為及可達到的準確性。然而,此材 ^是昂貴的,並且使用一插置窗口 33較為便宜,及角度 質被調整且被最適化以為了測量系統的良好訊號品 。若使用了-插置窗π 33,則其必須藉由—密封件32 密封’其中該密封件32具有和前述用來密封膜片2之 201037874 密封件3、3 ’相同的類型。密封材料可以由經烘烤的玻璃 膠構成’其中該經烘烤的玻璃膠係藉由將膠加熱至數百 °C來形成。 第5圖顯示之實施例的測量胞室係被一固持件28與一 加熱器環繞。藉由此加熱器30 ’胞室可以被加熱至高於 欲測量之真空製程所涉及之物質的凝結溫度。典型地, 胞室的溫度係高於凝結溫度至少丨〇°c。一典型的溫度是 在100C至600C的範圍内。所使用的化學物質通常是非 〇 常激進的,並且加熱是一種可將其保持遠離測量胞室之 敏感部分的有效方式。這些方式係確保胞室在所執行製 程的長時間期間可運作成具有高精確性和高再現性。 在經加熱的測量胞室配置中,諸如玻璃纖維的光學系 統不會變得太熱而使其不會受損壞且系統的光學精確性 不受惡劣影響是重要的。如第5圖所示,裝設纖維3 7、 37’時使其連接器足以遠離熱測量胞室一距離而讓纖維 ❹ 處溫度低於100<>C,此問題可以獲得解決。舉例而言, 纖維可以藉由一固持件28,(例如一不銹鋼的管子)而遠 離胞至數公分的距離,以降低溫度。在此情況下,一透 鏡裝置(例如透鏡3 5)係配置在纖維與外殼i或窗口 33之 間,以為了將光學訊號最適化地耦接到膜片。 整個測量胞室配置能夠以—環繞該整個測量胞室配置 的罩體29來保護。在一些實例中,測量淳5以及測量真 空腔室26和其膜片2沒有直接暴露於蒸發器管,其中該 蒸發器管處存在有激進條件^在此情況下,埠5藉由一 19 201037874 隔板腔42(其肖it -. (具匕括一作為隔板的保護板 4〇,而和蒸發氣管的内部連接。 )連接到凸緣 些實施例的膜片可以.下、+,十1 可反射光學光之參考:=:述方法來製造。製造膜片 〜少T具空側之一部公 ._ , 方法是黏附-小且薄的 、-二方式為:一 方法…Μ 板31到氧化㈣片上。另一 方法疋4發—金鏡 31 m ^ ^ u 、 到藍寶石膜片(sapphire membrane)上。—鉻層被放 Ο 〇 在藍寶石與金之間以改善金 在藍寶石上的附著性。—推 ^ 進一步方法是塗在其上、印刷 在其上或喷灑在其上 a超a"電塗層疋以類似方式用來取代 金屬層被設置在膜片上,七土 或者;丨電塗層是以類似方式被 放置在金屬層的頂部上而被設置在膜片上。 在此描述的進一步實施例, 中臈片2(在此亦稱為隔膜 2)典型地疋由藍寶石製成。 ^ 牡貫施例中,藍寶石為一 早晶氧化紹(αι2〇3 ;人4励丨:i η丄 人梃剛石)而具有明確的晶體方位。 所以,許多物理參數取決於方向。 此材料選擇具有下列性質:其可抵抗半導體工举中所 使用之製程氣體(例如I化物(諸如nf3、CH2F2、SF6、 ’、CHF3)、氣化物(諸如cl2、則)和溴化物(諸如剛 氣體或水蒸氣)的腐钱。由於其為單晶,其比多晶氧化銘 陶竟具有更平滑的表面°這容許更平滑的鏡子表面。此 外’平滑的單晶表面可減少表面上薄膜成核位置的數 量這致使在膜片2之製程側上減少的薄膜沉積,以及 進而由於較慢的膜片薄膜應力累積而致使較少的感測器 飄移(drift)。其具有高的彎曲強度。這容許以更薄的薄片 20 201037874 2來達到更大的弯曲性,藉此容許延伸計的測量範圍及 在非常低壓力範圍中達成更高精確性。 在一些實施例中,藍寶石膜片2的厚度小於1 50μηι。 藉此’可以比α12〇3逹到高達兩倍之更高的彎曲性。 •根據其他實施例,膜片2是從藍寶石晶體切割出,從 而使膜片係一般垂直於C-軸(結構標號〇〇〇1)。此方位係 為了容許更大之欲垂直於隔膜(而非正垂直於隔膜)的熱 〇 膨服係數。這樣的軸方位的選擇係致使增加之垂直彎曲 中的熱膨脹以及更高之作為溫度函數的感測器偏移。藉 此’意圖減少薄膜片的扣鎖(buckling)。實施例之實例的 藍寶石膜片2具有約5〜80 mm的直徑(典型的範圍為約 5 40 mm),以及約〇.〇4〜0.76 mm的厚度(典型的數值為 約〇.〇7〜1.〇 mm) ’以避免涉及扣鎖的問題。在鏡子31的 區域中,頂部與底部平面應該平行至〇 〇〇5 mm或更佳, 並且具有N4或Ra 0.35或更佳的表面粗糙度。 〇 在一進一步實施例中,可使用一全反射鏡子來作為鏡 子31。膜片2之參考真空側上的鏡子31可以由貴金屬(典 1地為金)製成。可被添加一鉻層以改善金在藍寶石上的 附著性。諸如金或銀之貴金屬塗層的燒結溫度係高達85〇 °C。一單鉻層有時候也是足夠的。一替代的解決方式是 由一單層或多層之介電鏡子來構成。 疋 第一外殼本體1可以由氧化鋁陶瓷或藍寶石製成。藍 寶石基部的使用係造成基部之熱膨脹係數和膜片的匹 配。由於成本理由’可以使用由氧化鋁陶瓷製成之—第 21 201037874 一外殼本體。根據一實例,在外殼本體中,鑽鑿一孔洞, -作為窗口 33的半穿透鏡子以及光纖維之附加零件°被 裝設在孔洞内。The metal coating can be protected by a dielectric coating for easier handling. The mirror, in one embodiment, is a metal mirror that is designed as a fully reflective film. The Mirror coating 31 can be applied by coating, printing, spraying or by deposition of a vacuum process. In one example, the mirror coating 31 contains primarily gold and is deposited by printing and has a thickness of from about 3 μm to about 1 μm. In some embodiments, an evaporation line 14 passes through the first outer casing. This configuration ensures that the measurement cell has an accurate function over a long period of time because of the reference to the vacuum chamber thereby providing a high quality vacuum with long-term stability. In the embodiment of Fig. 5, the evaporation line can connect the reference vacuum chamber 25 to a degassing chamber 13 provided with a degassing configuration (not shown in Fig. 5). A degasser should be provided after evacuation, which is typically configured to be small in size and located in the a-L and in communication with the reference vacuum chamber. This degasser ensures that the reference vacuum pressure is lower than the pressure to be measured, typically at least ten times lower. In order to avoid contamination of the internal measurement cell space, a type of deaerator that does not evaporate should be selected. According to another embodiment, which can be combined with any of the other embodiments of 17 201037874 described herein, the evaporation line 14 connects the reference vacuum chamber to a process vacuum chamber (eg, a coating chamber), the process vacuum chamber An evaporator 10 including 〇DG is provided in the chamber for evaporation. In this case, the evaporation line 14 can be connected to the process vacuum chamber instead of being connected to the degassing chamber 13 as shown in Fig. 5. Thus, the reference vacuum system within reference vacuum chamber 25 substantially corresponds to the pressure or vacuum in the process vacuum chamber. The 〇-shell body may be entirely made of a light-transmissive material or include a penetrating region forming an interposed optical window 33 at its center. An optical system is disposed directly or in a spaced apart manner behind the penetrating housing 1 or window 33 for coupling the Fabry_Per〇t interferometer to the reflective surface of the moving jaw to be able to depend on the pressure to be measured. The curvature of the diaphragm 2 was measured. The light and optical signals are fed from the interferometer to the measurement cell by at least one optical fiber 37, 37, and are fed from the measurement cell to the dry beta cell, through the inner surface of the outer casing i or reference The inner chamber window 33 is coated with an inner surface of the mirror relative to the diaphragm to partially penetrate the membrane, typically a half penetrating membrane. When the measurement cell is installed, this coating must endure hundreds of times. The support temperature of c. In some embodiments, sapphire is used as a penetration shell or window = this is due to optical behavior and achievable accuracy. However, this material is expensive, and the use of an insertion window 33 is relatively inexpensive, and the angle is adjusted and optimized for the measurement of good signal quality of the system. If the - insertion window π 33 is used, it must be sealed by a seal 32 wherein the seal 32 has the same type as the 201037874 seal 3, 3' used to seal the diaphragm 2. The sealing material may be composed of baked glass glue, wherein the baked glass glue is formed by heating the glue to several hundred °C. Figure 5 shows the measurement cell of the embodiment surrounded by a holder 28 and a heater. Thereby, the heater 30' chamber can be heated to a temperature higher than the condensation temperature of the substance involved in the vacuum process to be measured. Typically, the temperature of the cell is above the condensation temperature by at least 丨〇 °c. A typical temperature is in the range of 100C to 600C. The chemicals used are usually non-radically aggressive, and heating is an effective way to keep them away from sensitive parts of the measurement cell. These methods ensure that the cells operate to a high degree of accuracy and high reproducibility over a long period of time during which the process is performed. In a heated measurement cell configuration, it is important that the optical system, such as fiberglass, does not become too hot to be damaged and that the optical accuracy of the system is not adversely affected. As shown in Fig. 5, the problem is solved by arranging the fibers 37, 37' such that the connector is sufficiently farther away from the thermal measurement cell and the fiber temperature is below 100<>>C. For example, the fibers can be separated by a distance of a few centimeters from a holding member 28 (e.g., a stainless steel tube) to lower the temperature. In this case, a lens device (e.g., lens 35) is disposed between the fiber and housing i or window 33 for optimal coupling of the optical signal to the diaphragm. The entire measurement cell configuration can be protected by a cover 29 that is disposed around the entire measurement cell. In some examples, the measurement 淳5 and the measurement vacuum chamber 26 and its diaphragm 2 are not directly exposed to the evaporator tube, where there is a radical condition at the evaporator tube ^ in this case, 埠5 by a 19 201037874 The diaphragm chamber 42 (which has a protective plate 4 as a partition and is connected to the inside of the evaporating air tube.) The diaphragm attached to the flange of some embodiments can be. 1 Refractive optical light reference: =: The method is to manufacture. Manufacturing the diaphragm ~ less T has a hollow side of the part. _, the method is adhesion - small and thin, - two ways is: a method ... Μ board 31 to oxidize (four) on the film. Another method 疋 4 hair - gold mirror 31 m ^ ^ u, to the sapphire membrane (sapphire membrane) - chrome layer is placed 〇 between sapphire and gold to improve gold on sapphire Adhesion. - Pushing further method is applied to it, printed on it or sprayed on it. A super a "Electrical coating is used in a similar manner to replace the metal layer is placed on the diaphragm, seven soils Or; the enamel coating is placed on the top of the metal layer in a similar manner and is placed on the diaphragm In a further embodiment described herein, the middle gusset 2 (also referred to herein as the membrane 2) is typically made of sapphire. ^ In the example of sap, the sapphire is an early crystal oxide (αι2〇3;丨:i η丄人丄石石) has a clear crystal orientation. Therefore, many physical parameters depend on the direction. This material has the following properties: it can resist the process gases used in semiconductor engineering (such as I compounds ( Such as nf3, CH2F2, SF6, ', CHF3), vapor (such as cl2, then) and bromide (such as gas or water vapor). Because it is a single crystal, it has more than polycrystalline oxide a smoother surface. This allows for a smoother mirror surface. Furthermore, a 'smooth single crystal surface reduces the number of film nucleation sites on the surface which results in reduced film deposition on the process side of the diaphragm 2, and thus due to slower The diaphragm film accumulates stress causing less sensor drift. It has a high bending strength. This allows for a greater bendability with a thinner sheet 20 201037874 2 , thereby allowing the extension of the meter Amount range and greater accuracy in a very low pressure range. In some embodiments, the sapphire diaphragm 2 has a thickness of less than 1 50 μm. This can be used to achieve up to twice the bendability of α12〇3逹. • According to other embodiments, the diaphragm 2 is cut from the sapphire crystal such that the diaphragm is generally perpendicular to the C-axis (structure number 〇〇〇1). This orientation is to allow for greater desire to be perpendicular to the diaphragm ( Instead of being perpendicular to the diaphragm, the coefficient of thermal expansion is such that the choice of axial orientation results in increased thermal expansion in the vertical bend and higher sensor deflection as a function of temperature. Buckle. The sapphire diaphragm 2 of the example of the embodiment has a diameter of about 5 to 80 mm (typically about 5 40 mm), and a thickness of about 〇. 〇 4 to 0.76 mm (typical values are about 〇.〇7~ 1.〇mm) 'to avoid problems involving the lock. In the region of the mirror 31, the top and bottom planes should be parallel to 〇 5 mm or better, and have a surface roughness of N4 or Ra of 0.35 or better. 〇 In a further embodiment, a total reflection mirror can be used as the mirror 31. The mirror 31 on the reference vacuum side of the diaphragm 2 can be made of a precious metal (a gold alloy). A chrome layer can be added to improve the adhesion of gold to sapphire. The noble metal coating such as gold or silver has a sintering temperature of up to 85 ° C. A single chrome layer is sometimes sufficient. An alternative solution consists of a single or multiple layer dielectric mirror.疋 The first casing body 1 may be made of alumina ceramic or sapphire. The use of the base of the sapphire results in a coefficient of thermal expansion of the base and a match of the diaphragm. For cost reasons, it is possible to use a casing body made of alumina ceramics - 21 201037874. According to an example, a hole is drilled in the body of the casing, - a semi-transmissive mirror as a window 33 and an additional part of the optical fiber are mounted in the hole.

你一空I她例中,可以使用一半穿透鏡子作為窗口 33’如第5、8和9圖所示。半穿透鏡子(在此亦稱為半 反射鏡子)在一些實施例中係由被蒸發在清晰藍寶石窗 口表面34之上的鉻製成。鉻層的厚度為例如約$爪也。 為了進一步改善鉻層免於氧化的保護,可以添加一保護 五氧化二鈕(Ta2〇5)到鉻層的頂部上作為保護層。 在裝設膜片之前,藍寶石窗口 33能夠以和前述相同的 方式(例如以經烘烤的玻璃膠)被裝設到外殼本體。 當膜片2上鏡子31與外殼本體i中半穿透鏡子“為 實質上或精確地平行時,可以達到良好的壓力測量裝置 的敏感度。在一些實例中,最大之容忍的傾斜[α] + [β] +⑺ 為0.05 mrad,如第8圖所示。藉此,可以達到〇DG腔 的實質平行。 在一些實施例中,一隔板41被裝設在感測器頭部的前 方且具有至少兩目的,如第5圖所示。第一,其確保敏 感膜片2沒有涉及直接的光線。氣體微粒在抵達膜片2 之前因此和計表面撞擊至少兩次。典型地,容易凝結的 氣體係在其凝結於膜片表面上之前沉積在隔板表面上。 這可減少感測器偏移且延長感測器的壽命時間。因必要 的壁撞擊’隔板也用來將電漿轉換成低電荷狀態(典型地 為中性電荷狀態)的氣體。 22 201037874 一實施例包括一衝式感測器(dive-in-sensor)。〇dg感 測器概念也可以被用在一衝式配置(dive-in arraiigement> 中,其一實例係顯示在第10圖。在此實施例中,感測器 胞室沒有從蒸發器管的内部縮回。感測器頭部可以直接 地被裝設在蒸發器管300、310、100的凸緣4〇、4〇,上。 膜片和感測器外殼可以由抗腐蝕的材料製成。 在實施例之一些實例中,可以提供多工感測器頭部。 光學讀取(optical read-out)也容許多個感測器頭部由單 0 個分光計來讀取。這是藉由使用在分光計入口狹縫處以 平行方式來堆疊之個別纖維來達成,或藉由使用分支纖 維或纖維開關來達成。感測器頭部可以位在蒸發器的位 置處並且此外位在蒸發器的不同位置處,其為進一步蒸 發器的且塗覆設備的。在一些實施例中,一些感測器頭 4可以被放置在同一凸緣40、40’上而彼此鄰接。這顯示 在第10圖,其繪示一具有多個頭部的衝式感測器。頭部 〇 了以疋相同類型以容許重複(redundancy),或可以是由不 同類型組成以涵蓋重疊或鄰近的壓力範圍。這容許使用 蒸發器僅一凸緣位置的同時可涵蓋一更大的範圍。 當以固持裝置43來裝設一些感測器於一凸緣4〇、4〇, 上時,各感測器頭部可以藉由改變膜片尺寸而適用於不 同的壓力範圍。藉此,操作者可以使用蒸發氣管僅一埠 的同時來測量相同的與(或)不同的壓力範圍。這是成本 降低,這是因為需要較少時間來裝設且較少時間來建立 該些感測器和其資料拮員取系統之間的界面。 23 201037874 根據一實施例,一種用以將蒸氣施加到基材的方法係 包括:使用任何前述實施例之蒸發器來提供蒸氣;施加 蒸氣到基材;以及測量蒸發器管内蒸氣的壓力。根據實 施例,蒸發器包括一用以於一塗覆速率施加蒸氣到基材 •的蒸發器,該蒸發器包括一蒸發器管,該蒸發器管具有 3有至少一喷嘴出口的分佈管,並且其中該蒸發器管 包括一壓力測量裝置,該壓力測量裝置包括一光學隔膜 計。 〇 在此描述之實施例的蒸發器、塗覆設備及方法係容許 藉由蒸發器管中的一壓力測量裝置來決定沉積速率。根 據在此描述的實施例’壓力測量裝置包括一光學隔膜 計’其可抗腐蝕且(或)可用在高溫與(或)高電磁干擾 (Electro Magnetic Interference, EMI)環境中。 根據一實施例,提供一種用以於一塗覆速率施加蒸氣 到基材的蒸發器,該蒸發器包括一蒸發器管,該蒸發器 〇 管具有一含有至少一喷嘴出口的分佈管,並且其中該蒸 發器管包括一壓力測量裝置,該壓力測量裝置包括—光 學隔膜計。 在一實施例中,其可與在此描述的任何其他實施例結 合’壓力測量裝置被提供在蒸發器管中。 在一實施例中,其可與在此描述的任何其他實施例結 合,蒸發器管更包括一坩鍋以及一連接坩鍋和分佈管的 供應官’壓力測量裝置被提供在選自由供應管及坩鍋所 構成群組之構件中β 24 201037874 在一實施例中,龙可 、j與在此描述的任何其他實施例結 ;千隔膜計是-真空測量胞室,真空測量胞室包括: -由Alas材料製成的第—外殼本體;一由A叫材料製 f的膜片’其係以真空密封方式被配置成鄰近該第一外 殼本體從而在第-外殼本體與臈片之間建立一參考真 空腔室;-由A丨办材料製成的第二外殼本體,其係以 真工密封方式被提供成和膜片相對,從而在第二外殼本 ❹In your case, you can use a half-through mirror as a window 33' as shown in Figures 5, 8, and 9. A semi-transmissive mirror (also referred to herein as a semi-reflective mirror) is in some embodiments made of chrome that is vaporized over the clear sapphire window surface 34. The thickness of the chrome layer is, for example, about $claw. In order to further improve the protection of the chromium layer from oxidation, a protective pentoxide button (Ta2〇5) may be added to the top of the chrome layer as a protective layer. Prior to installation of the diaphragm, the sapphire window 33 can be attached to the housing body in the same manner as previously described (e.g., as a baked glass glue). The sensitivity of a good pressure measuring device can be achieved when the mirror 31 on the diaphragm 2 and the semi-transmissive mirror in the housing body i are "substantially or precisely parallel." In some instances, the maximum tolerated tilt [α] + [β] + (7) is 0.05 mrad as shown in Fig. 8. Thereby, substantial parallelism of the 〇DG cavity can be achieved. In some embodiments, a spacer 41 is mounted in front of the sensor head. And has at least two purposes, as shown in Fig. 5. First, it ensures that the sensitive diaphragm 2 does not involve direct light. The gas particles collide with the meter surface at least twice before reaching the diaphragm 2. Typically, it is easy to coagulate. The gas system is deposited on the surface of the separator before it condenses on the surface of the membrane. This reduces sensor deflection and extends the life of the sensor. The spacer is also used to plasma A gas that is converted to a low charge state (typically a neutral charge state). 22 201037874 One embodiment includes a dive-in-sensor. The 〇dg sensor concept can also be used in a rush Configuration (dive-in arraiigement), one of them An example is shown in Figure 10. In this embodiment, the sensor cell is not retracted from the interior of the evaporator tube. The sensor head can be directly mounted on the evaporator tubes 300, 310, 100 The flanges 4〇, 4〇, upper. The diaphragm and the sensor housing may be made of a corrosion resistant material. In some examples of embodiments, a multiplexed sensor head may be provided. Optical reading (optical read) -out) also allows multiple sensor heads to be read by a single 0 spectrometer. This is achieved by using individual fibers stacked in parallel at the entrance slit of the spectrometer, or by using branched fibers. Or a fiber switch is achieved. The sensor head can be located at the location of the evaporator and further at different locations of the evaporator, which is further vaporized and coated with the device. In some embodiments, some sense The detector heads 4 can be placed on the same flange 40, 40' to abut each other. This is shown in Fig. 10, which shows a flush sensor having a plurality of heads. Type to allow for redundancy, or can be of different types This covers overlapping or adjacent pressure ranges. This allows for the use of an evaporator with only one flange position while covering a larger range. When mounting the sensor 43 to a flange 4〇, 4 〇, when it is on, each sensor head can be applied to different pressure ranges by changing the diaphragm size. Thereby, the operator can measure the same and/or different ones while using only one turn of the evaporating air tube. Pressure range. This is a cost reduction because less time is required to install and less time to establish an interface between the sensors and their data trapping system. 23 201037874 According to an embodiment, a The method of applying vapor to a substrate comprises: using the evaporator of any of the preceding embodiments to provide vapor; applying vapor to the substrate; and measuring the pressure of the vapor within the evaporator tube. According to an embodiment, the evaporator includes an evaporator for applying vapor to the substrate at a coating rate, the evaporator including an evaporator tube having a distribution tube having at least one nozzle outlet, and Wherein the evaporator tube comprises a pressure measuring device comprising an optical diaphragm. The evaporator, coating apparatus and method of the embodiments described herein allow the deposition rate to be determined by a pressure measuring device in the evaporator tube. According to embodiments described herein, the pressure measuring device includes an optical diaphragm that is resistant to corrosion and/or can be used in high temperature and/or high Electromagnetic Interference (EMI) environments. According to an embodiment, there is provided an evaporator for applying vapor to a substrate at a coating rate, the evaporator comprising an evaporator tube having a distribution tube having at least one nozzle outlet, and wherein The evaporator tube includes a pressure measuring device including an optical diaphragm meter. In an embodiment, it can be combined with any of the other embodiments described herein. A pressure measuring device is provided in the evaporator tube. In an embodiment, which may be combined with any of the other embodiments described herein, the evaporator tube further includes a crucible and a supply pressure measuring device connecting the crucible and the distribution tube is provided at a source selected from the supply tube and In the component of the group of crucibles, β 24 201037874 In one embodiment, the dragon and j are combined with any of the other embodiments described herein; the millimeter is a vacuum measuring cell, and the vacuum measuring cell comprises: a first housing body made of Alas material; a diaphragm made of A material F is configured to be vacuum-sealed adjacent to the first housing body to establish a gap between the first housing body and the diaphragm Reference vacuum chamber; - a second housing body made of A material, which is provided in a true sealed manner opposite to the diaphragm, thereby being in the second housing

G ㈣m $建立—測量真空腔室;該第二外殼本體包 括-用以將測量真空腔室連接到蒸發器管之内部的埠, 其中在第-外殼本體的中心區域中形成一光學穿透窗 以及在膜片之至少中心區域中將面對光學穿透窗口 的膜片的表面形成為光學反射的,並且其中參考真空腔 室外面而和窗口相對且距離窗口一距離處配置一光饋送 裝置用以將光饋送進出到膜片#表面上,並且其中在光 纖維與_口之間設置—透鏡裝置用於光學連接到媒片的 表面從而使得此配置形成一用以決定膜片之彎曲性程 度的測量部,例如使肖Fabry_Perot干涉計原理。在一實 包例中此配置被形成為一 Fabry-Perot干涉計。 八在一實施例中,其可與在此描述的任何其他實施例結 壓力測量裝置包括-栓塞’光學隔媒計被提供在检 塞中’並且拴塞被提供在蒸發器管的一開口中。 在一實施例中’其可與在此描述的任何其他實施例結 〇 栓塞由石英構成。 在一實施例中,其可與在此描述的任何其他實施例結 25 201037874 合’栓塞為圓錐形。 在一貫施例中’其可與在此描述的任何其他實施例結 合,壓力測量裝置包括一栓塞,光學隔膜計被提供在栓 塞中’並且栓塞被提供在蒸發器管的一開口中,從而使 得光學隔膜計的測量真空腔室連接到蒸發器管的内部。 在實施例中’其可與在此描述的任何其他實施例結 合’真空測量胞室之膜片為由藍寶石類型之Al2〇3材料 製成。 在一實施例中,其可與在此描述的任何其他實施例結 合,真空測量胞室之第一外殼本體為至少部分由藍寶石 類型之Ah〇3材料製成,並且該部分被放置在中心區域 中以形成一光學穿透窗口。 在一實施例中,其可與在此描述的任何其他實施例結 合,光學穿透窗口被形成為一單一插置件,單一插置件 由藍寶石製成且以真空密封方式被裝設到第一外殼本 體。 在實施例中,其可與在此描述的任何其他實施例結 合,蒸發器是一用以於一塗覆速率施加有機物蒸氣到基 材的有機物蒸發器。 根據一進一步實施例,提供一種用以塗覆基材的塗覆 設備,塗覆設備具有用以於一塗覆速率施加蒸氣到基材 的至V蒸發器,蒸發器包括一蒸發器管,該蒸發器管 具有3有至少一喷嘴出口的分佈管,並且其中該蒸發 器管包括一壓力測量裝置,該壓力測量裝置包括一光學 26 201037874 隔膜計。 根據一又進一步實施例’提供一種用以施加蒸氣到基 材的方法’該方法包括:使用—蒸發器來提供蒸氣以 於一塗覆速率施加蒸氣到基材,該蒸發器包括—蒸發器 •管,該蒸發器管具有一含有至少—噴嘴出口的分佈管, 並且其中該蒸發器管包括—壓力測量裝置,該壓力測量 裝置包括-光學隔膜計;施加蒸氣到基材;以及測量蒸 發器管内的蒸氣的壓力。 在實%例中,其可與在此描述的任何其他實施例結 合’蒸氣被提供在蒸發器管内’並且在蒸發器管内測量 蒸氣的壓力。 在實施例中,其可與在此福述的任何其他實施例結 合,提供蒸氣係包括以下步驟:藉由加熱被提供為粒狀 材料或材料線的材料來製造蒸氣。 在一實旧列中,其可與在此描述的任何纟他實施例結 〇 合,方法更包括以下步驟:藉由遮罩來將基材予以結構 化。 在-實施例中,其可與在此描述的任何其他實施例結 合,蒸氣是一有機物蒸氣,方法選擇性地更包括以下步 驟:施加一無機蓋塗層到基材。 在一實施例中,其可與在此描述的任何其他實施例結 合’蒸氣被提供在蒸發器管内,並且蒸發器管内的蒸氣 的壓力係經調整介於2xl0-i2mbar# 4xl〇-2mbar之間。 在一實施例中,其可與在此描述的任何其他實施例結 27 201037874 合,光學隔膜計包括一測量部,測量部包括一膜片,膜 片係從選自由陶瓷材料、Al2〇3材料、及藍寶石類塑之 AhO3材料所構成群組之至少一材料來製成。在一些實施 例中,其可與在此描述的任何其他實施例結合,光學隔 ‘ 膜計係適於分別測量隔膜或膜片之彎曲性。 本文是利用實例來揭露本發明(包括最佳模式),及亦 來使任何熟習此技藝之人士可使用和利用本發明。儘管 本發明已經以各種特定實施例來描述,熟習此技藝之人 士可瞭解的是’本發明能夠以在巾請專利範圍的精神和 範疇内的變化來實現。尤其,前述實施例之實例及實施 例或其變化的彼此非專有特徵可以互相組合。本發明之 可專利範疇是由申請專利範圍來界定,並且可以包括熟 習此技藝之人士所涉及的其他實例。這樣的其他實例亦 落入申請專利範圍的範疇内。 雖然前述說明是導向本發明的實施例,可以在不脫離 Ο 本發明之基本範疇下設想出本發明的其他和進一步實施 例,並且本發明的範疇是由隨附申請專利範圍來決定。 【圖式簡單說明】 可藉由參考本發明之實施例來詳細暸解本發明之說 明,其簡短地在前面概述過,其中該些實施例在附圖中 示出。附圖係關於本發明之實施例且被描述於下文中。 一些前述實施例將藉由參照附圖而以更詳細的方式被描 28 201037874 辻_在以下典型實施例的說明中,其中: 一第1A和1B圖係顯示蒸發器之一實施例,第ia圖緣 不蒸發器之蒸發器管的前視圖且第1B圖繪示蒸發器之 側視圖; 第2圖係繪示蒸發器之另一實施例; 第3圏係繪示蒸發器之一進一步實施例; 第4圖係顯示塗覆設備之一實施例的剖面側視圖; 第5圖係繪示在此描述之實施例的壓力測量裝置; 第6A圖係顯示第1B圖中所顯示蒸發器之蒸發器管的 部分剖面圖; 第όβ圖係繪示第6A圖中所顯示蒸發器之壓力測量裝 置的一實施例; 第7圖係顯示一實施例之壓力測量裝置; 第8圖洗繪示實施例之壓力測量裝置之一參考真空腔 室; 第9圖係繪示塗覆被包括在實施例中之隔膜和光學隔 膜計之窗口的兩種方式; 第10圖係顯示實施例之壓力測量裝置之一衝式配置 (dive-in arrangement),其具有多個測量頭部。 可理解的是一實施例的元件可以有利地被應用在其他 實施例中,而無須贅述。 【主要元件符號說明】 29 201037874G (d) m $ established—measures a vacuum chamber; the second housing body includes a bore for connecting the measurement vacuum chamber to the interior of the evaporator tube, wherein an optical penetration window is formed in a central region of the first housing body And forming a surface of the diaphragm facing the optically penetrating window to be optically reflective in at least a central region of the diaphragm, and wherein a light feeding device is disposed opposite the window and at a distance from the window outside the vacuum chamber outer surface Feeding light into and out of the surface of the diaphragm #, and wherein a lens device is disposed between the optical fiber and the port for optically connecting to the surface of the medium such that the configuration forms a degree of flexibility for determining the diaphragm The measurement unit, for example, makes the Shaw Fabry_Perot interferometer principle. In a practical example, this configuration is formed as a Fabry-Perot interferometer. In an embodiment, which may be combined with any of the other embodiments described herein, the pressure measuring device comprises - a plug 'optical spacer meter is provided in the plug' and the plug is provided in an opening of the evaporator tube . In an embodiment, it may be constructed of quartz with any other embodiment described herein. In one embodiment, it can be plugged into a conical shape in conjunction with any of the other embodiments described herein. In a consistent embodiment, 'which may be combined with any of the other embodiments described herein, the pressure measuring device includes a plug, the optical diaphragm is provided in the plug' and the plug is provided in an opening of the evaporator tube such that The measuring vacuum chamber of the optical diaphragm is connected to the interior of the evaporator tube. In an embodiment, 'which can be combined with any of the other embodiments described herein', the diaphragm of the vacuum measuring cell is made of a sapphire type Al2?3 material. In an embodiment, which may be combined with any of the other embodiments described herein, the first housing body of the vacuum measurement cell is at least partially made of a sapphire type of Ah 3 material and the portion is placed in the central region Medium to form an optical penetration window. In an embodiment, which may be combined with any of the other embodiments described herein, the optically penetrating window is formed as a single interposer, the single interposer being made of sapphire and being vacuum sealed. A housing body. In an embodiment, it can be combined with any of the other embodiments described herein, the evaporator being an organic vaporizer for applying organic vapor to the substrate at a coating rate. According to a further embodiment, there is provided a coating apparatus for coating a substrate, the coating apparatus having a V-vapor evaporator for applying vapor to the substrate at a coating rate, the evaporator comprising an evaporator tube, the evaporator The evaporator tube has a distribution tube having at least one nozzle outlet, and wherein the evaporator tube includes a pressure measuring device comprising an optical 26 201037874 diaphragm meter. According to yet a further embodiment 'providing a method for applying vapor to a substrate', the method comprises: using an evaporator to provide vapor to apply vapor to the substrate at a coating rate, the evaporator comprising - an evaporator a tube having a distribution tube containing at least a nozzle outlet, and wherein the evaporator tube includes a pressure measuring device including an optical diaphragm meter; applying vapor to the substrate; and measuring the inside of the evaporator tube The pressure of the vapor. In the real example, it can be combined with any of the other embodiments described herein 'vapor is provided within the evaporator tube' and the pressure of the vapor is measured within the evaporator tube. In an embodiment, which may be combined with any of the other embodiments described herein, the provision of a vapor system includes the steps of producing a vapor by heating a material that is provided as a particulate material or line of material. In an actual column, which can be combined with any of the embodiments described herein, the method further includes the step of structuring the substrate by means of a mask. In an embodiment, which may be combined with any of the other embodiments described herein, the vapor is an organic vapor, and the method optionally further comprises the step of applying an inorganic cap coating to the substrate. In an embodiment, which may be combined with any of the other embodiments described herein, 'vapor is provided within the evaporator tube and the pressure of the vapor within the evaporator tube is adjusted between 2 x 10 -i 2 mbar # 4 x l 〇 -2 mbar . In an embodiment, which may be in conjunction with any of the other embodiments described herein, 27 201037874, the optical diaphragm includes a measuring portion including a diaphragm from a material selected from the group consisting of ceramic materials and Al2〇3 materials. And at least one material of the group consisting of sapphire-like AhO3 materials. In some embodiments, which may be combined with any of the other embodiments described herein, the optical spacer membrane is adapted to measure the flexibility of the diaphragm or diaphragm, respectively. The present invention is disclosed by way of example, and the invention may be utilized and utilized by those skilled in the art. Although the present invention has been described in terms of various specific embodiments, it will be understood by those skilled in the art that the present invention can be practiced with variations in the spirit and scope of the invention. In particular, the non-proprietary features of the examples and embodiments of the foregoing embodiments or variations thereof may be combined with each other. The patentable scope of the invention is defined by the scope of the claims, and may include other examples of those skilled in the art. Such other examples are also within the scope of the patent application. While the foregoing description is directed to the embodiments of the present invention, the invention may be construed as the scope of the invention, and the scope of the invention is determined by the scope of the appended claims. BRIEF DESCRIPTION OF THE DRAWINGS The description of the present invention can be understood in detail by reference to the embodiments of the invention, which are briefly described in the foregoing. The drawings are directed to embodiments of the invention and are described below. Some of the foregoing embodiments will be described in more detail by reference to the accompanying drawings. 28 201037874 辻 In the following description of an exemplary embodiment, wherein: a 1A and 1B diagram shows an embodiment of an evaporator, ia Figure 1 is a front view of the evaporator tube of the evaporator and FIG. 1B is a side view of the evaporator; FIG. 2 is a view showing another embodiment of the evaporator; 4 is a cross-sectional side view showing an embodiment of a coating apparatus; FIG. 5 is a view showing a pressure measuring device of the embodiment described herein; and FIG. 6A is a view showing the evaporator shown in FIG. 1B. A partial cross-sectional view of the evaporator tube; an 实施β diagram showing an embodiment of the pressure measuring device of the evaporator shown in FIG. 6A; FIG. 7 is a pressure measuring device showing an embodiment; One of the pressure measuring devices of the embodiment refers to the vacuum chamber; FIG. 9 illustrates two ways of coating the window of the diaphragm and the optical diaphragm included in the embodiment; FIG. 10 shows the pressure measurement of the embodiment. One-piece configuration of the device (dive-in arrange Ment), which has multiple measurement heads. It will be appreciated that elements of an embodiment may be advantageously employed in other embodiments without further recitation. [Main component symbol description] 29 201037874

1 第一外殼本體 2 膜片(隔膜) 3 ' 3 ’ 密封材料 4 第二外殼本體 5 埠 5, 埠 10 壓力測量裝置(光學隔膜計) 12 壓力測量裝置(光學隔膜計) 13 除氣腔室 14 栓塞 25 參考真空腔室 26 測量真空腔室 28 固持件 28, 固持件 29 罩體 30 加熱器 31 表面(鏡子塗層) 32 密封件 33 光學穿透窗口 34 半穿透鏡子 35 透鏡裝置 37、 37’ 光纖維 40 凸緣 40, 凸緣 30 201037874 隔板 隔板腔 固持裝置 分佈管 開口 喷嘴出口 掛鋼 供應管 Ο 基材 閥 塗覆腔室1 First housing body 2 Diaphragm (diaphragm) 3 ' 3 ' Sealing material 4 Second housing body 5 埠5, 埠10 Pressure measuring device (optical diaphragm meter) 12 Pressure measuring device (optical diaphragm meter) 13 Degassing chamber 14 Plug 25 Reference Vacuum Chamber 26 Measuring Vacuum Chamber 28 Holder 28, Holder 29 Cover 30 Heater 31 Surface (Mirror Coating) 32 Seal 33 Optical Penetration Window 34 Semi-Transmissive Mirror 35 Lens Device 37, 37' optical fiber 40 flange 40, flange 30 201037874 partition diaphragm chamber holding device distribution tube opening nozzle outlet steel supply pipe 基材 substrate valve coating chamber

Claims (1)

201037874 七、申請專利範圍: 1. 〇 2. 種用以⑨-、塗覆速率施#蒸氣到一纟材的蒸發 器,包含: 一4發器管,其具有一含有至少一喷嘴出口的分 佈管;及 其中該蒸發管白_ , 曰 、、、赞β &包括一壓力測量裝置’該壓力測 量襞置包含一光學隔犋計。 ^請4利範Μ 1項所述之蒸發器,其中該壓力測 量裝置被提供在該分佈管中。 3. 〇 =申請專利範圍第1項所述之蒸發器,其中該蒸發器 Ε更包含一坩鍋以及一連接該坩鍋和該分佈管的供 應管,該壓力測量裝置被提供在選自由該供應管及該 掛鋼所構成群組之構件中。 4. 申叫專利範圍第1項所述之蒸發器,其中該光學隔 膜計是-真空測量胞室,該真空測量胞室包含: 一第-外殼本體,其由Α1203材料製成; :膜片,其由Α1203材料製成,並且以真空密封 方式被配置成鄰近該第一外殼 ^ 1故本體,從而在該第一外 殼本體與該膜片之間建立-參考真空腔室; -第二外殼本體’其由Α12ο3材料製成且以真空 32 201037874 密封方式被提供成和該膜片相 本體與該膜片之間建立一測卜從而在該第二外殼 本體包括,將該測量真;真腔;腔連室接”二外殼 管之内部的埠; 至連接到該蒸發器 其甲在該第一外殼本體的中 學穿透窗口,以及在該膜片之至小中域中…光 今m秦扣 乃之至;中心區域中將面對 »亥光學穿透固口的膜片的表 Ο 且其中該參考真空腔室外面光學反射的’並 ” 至外面而和該窗口相對且距離 該…距離處配置—光饋送裝置,用以將 出到該膜片的表面上’並且其令在該光纖維與該窗口 之間設置-透鏡裝置,用於光學連接到該膜片的表 面,從而使得此配置形成一用以決定該膜片之管曲性 程度的測量部。 • ^申請專利範圍S i項所述之蒸發器,其_該壓力測 置襄置包括-栓塞’該光學隔膜計被提供在該检塞 中,並且該栓塞被提供在該蒸發器管的一開口中。 6’如申請專利範圍第5項所述之蒸發器,其中該栓塞由 石英構成。 7.如申請專利範圍第5項所述之蒸發器,其中該栓塞為 圓錐形。 33 201037874 8. 如申請專利範圍第!項所述之蒸發器,其中該光學隔 膜計包含一測量部,該測量部包括一膜片,該膜片係 從選自由陶瓷材料、Α1ζ〇3材料、及藍寶石類型之 αι2ο3材料所構成群組之至少一材料來製成。 9. 如申請專利範圍第2項所述之蒸發器,其中該光學隔 膜計包含一測量部’該測量部包括一膜片,該膜片係 從選自由陶究材料、Α〗2〇3材料、及藍寶石類型之 Ah〇3材料所構成群組之至少一材料來製成。 10. 如申請專利範圍第4_9項中任一項所述之蒸發器,其 中該壓力測量裝置包括—栓塞,該光學隔膜計被提供 在該栓塞中,並且該栓塞被提供在該蒸發器管的一開 口中,從而使得該光學隔膜計的該測量真空腔室連接 到該蒸發器管的内部。 "·如申請專利範圍第4-9項中任一項所述之蒸發器,其 中該真空測量胞室之該膜片為由藍寶石類型之Al2〇3 材料製成。 12.如申請專利範圍第"項中任一項所述之蒸發器,其 中該光學穿透窗口係從選自“下所構成群組之至 少一者來形成: 該真空測量胞室之該第一外殼本體為至少部分 34 201037874 由藍寶石類型之Al2〇3材 叶表成並且邊部分被放置 在中心區域中以形成一光學穿透窗口;以及 該光學穿透窗口被形成為-單-插置件,該單一 插置件由藍寶石製成且以直 八工在封方式被裝設到該 第一外殼本體。201037874 VII. Patent application scope: 1. 〇2. An evaporator for 9-, coating rate application #vapor to a coffin, comprising: a 4-tube tube having a distribution containing at least one nozzle outlet a tube; and the evaporation tube white _, 曰, ,, 赞β & includes a pressure measuring device 'The pressure measuring device includes an optical barrier meter. The evaporator of claim 1 wherein the pressure measuring device is provided in the distribution tube. 3. The evaporator of claim 1, wherein the evaporator further comprises a crucible and a supply tube connecting the crucible and the distribution tube, the pressure measuring device being provided at The supply pipe and the component of the group formed by the steel hanging. 4. The evaporator of claim 1, wherein the optical diaphragm is a vacuum measuring cell, the vacuum measuring cell comprising: a first-shell body made of Α1203 material; , which is made of Α1203 material, and is disposed in a vacuum sealed manner adjacent to the first outer casing body, thereby establishing a reference vacuum chamber between the first outer casing body and the diaphragm; The body is made of Α12ο3 material and is provided in a vacuum 32 201037874 sealed manner to establish a test between the diaphragm body and the diaphragm so as to be included in the second housing body, the measurement is true; The cavity is connected to the inside of the two outer casing tubes; to the evaporator connected to the evaporator, the middle of the first casing body penetrates the window, and in the diaphragm to the small middle... The buckle is in the center; the central region will face the surface of the diaphragm that penetrates the optical opening and the optical reflection of the outer surface of the reference vacuum chamber is 'together' to the outside and is opposite to the window and the distance from the window Configuration - light feeding device For illuminating onto the surface of the membrane 'and providing a lens arrangement between the optical fiber and the window for optically connecting to the surface of the membrane such that the configuration forms a A measuring portion of the degree of pipe curvature of the diaphragm. • ^ The evaporator of the patent scope S i, wherein the pressure measuring device comprises a plug - the optical diaphragm is provided in the plug, and the plug is provided in one of the evaporator tubes In the opening. The evaporator of claim 5, wherein the plug is made of quartz. 7. The evaporator of claim 5, wherein the plug is conical. 33 201037874 8. If you apply for a patent scope! The evaporator of the invention, wherein the optical diaphragm comprises a measuring portion, the measuring portion comprising a diaphragm, the diaphragm being composed of a group selected from the group consisting of ceramic materials, Α1ζ〇3 materials, and sapphire type αι2ο3 materials. Made of at least one material. 9. The evaporator of claim 2, wherein the optical diaphragm comprises a measuring portion, the measuring portion comprises a diaphragm, the diaphragm is selected from the group consisting of ceramic materials, Α 〇 2 〇 3 materials And at least one material of the group consisting of sapphire type Ah3 materials. 10. The evaporator of any one of claims 4-9, wherein the pressure measuring device comprises a plug, the optical diaphragm is provided in the plug, and the plug is provided in the evaporator tube An opening is formed such that the measuring vacuum chamber of the optical diaphragm is connected to the interior of the evaporator tube. The evaporator according to any one of claims 4-9, wherein the diaphragm of the vacuum measuring cell is made of a sapphire type Al2〇3 material. 12. The evaporator of any one of the preceding claims, wherein the optical penetration window is formed from at least one selected from the group consisting of: the vacuum measurement cell The first housing body is at least partially 34 201037874 formed of sapphire type Al2〇3 leaves and the side portions are placed in the central region to form an optically penetrating window; and the optically penetrating window is formed as a single-plug And a single insert is made of sapphire and is mounted to the first outer casing body in a straight manner. 13.如申請專利範圍第 中該蒸發器是一用以於一 到該基材的有機物蒸發器 1-9項中任一項所述之蒸發器,其 塗覆速率施加有機物蒸氣 14. -種用α塗覆基材的塗覆設備,纟具有如中請專利範 圍第1 9項中任一項之至少一蒸發器’該至少一蒸發 器係用以於一塗覆速率施加蒸氣到一基材。 15. 如申請專利範圍第14項所述之塗覆設備,其中該壓 0 力測量裝置包括—栓塞’該光學隔膜計被提供在該栓 塞中’並且該栓塞被提供在該蒸發器管的一開口中, 從而使得該光學隔膜計的該測量真空腔室連接到該 蒸發器管的内部。 16.如申請專利範圍第14項所述之塗覆設備,其中該光 學穿透窗口係從選自由以下所構成群組之至少一者 來形成: 該真空測量胞室之該第一外殼本體為至少部分 35 201037874 由藍寶石類型之Al2〇3材料製成,並且該部分被放置 在中心區域中以形成一光學穿透窗口;以及 該光學穿透窗口被形成為一單一插置件,該單一 插置件由藍寶石製成且以真空密封方式被裝設到該 第一外殼本體。 17.如申請專利範圍第14項所述之塗覆設備,其中該蒸 發器是一用以於一塗覆速率施加有機物蒸氣到該基 材的有機物蒸發器。 1 8. —種用以施加蒸氣到一基材的方法,包含: 使用一蒸發盗來提供蒸氣,以於一塗覆速率施加 蒸氣到該基材,該蒸發器包含一蒸發器管,該蒸發器 管具有一含有至少一噴嘴出口的分佈管,並且其中該 蒸發器管包括一壓力測量裝置,該壓力測量裝置包含 一光學隔膜計; 施加蒸氣到該基材;及 測量該蒸發器管内的蒸氣的壓力。 19.如申請專利範圍第18項所述之方法,其中蒸氣被提 供在該蒸發器管内,並且在該蒸發器管内測量蒸氣的 壓力》 20·如申請專利範圍第18項所述之方法其中該光學隔 36 201037874 膜计疋一真空測量胎它 Λ > . β至’该真空測量胞室包含: 一第一外殼本體, 11 其由八丨2〇3材料製成; 一膜片,其由,,. 203材料製成,並且以真空密封 方式被配置成鄰近哕笛 迎该第一外殼本體,從而在該第—外 殼本體與該膜片之間ο 士 心间建立一參考真空腔室; 第一外喊本體,其由Α〗2〇3材料製成且以真空 密封方式被提供成和該膜片相對,從而在該第二外殼 本體與該膜片之間建# 旦士 A13. The evaporator of the invention is the evaporator of any one of the organic vapor evaporators 1-9 to the substrate, the coating rate is applied to the organic vapor 14. A coating apparatus for coating a substrate with alpha, at least one evaporator of any one of the above-mentioned claims, wherein the at least one evaporator is used to apply vapor to a substrate at a coating rate. material. 15. The coating apparatus of claim 14, wherein the pressure measuring device comprises a plug - the optical diaphragm is provided in the plug and the plug is provided in the evaporator tube In the opening, the measuring vacuum chamber of the optical diaphragm is connected to the interior of the evaporator tube. 16. The coating apparatus of claim 14, wherein the optical penetration window is formed from at least one selected from the group consisting of: the first housing body of the vacuum measurement cell is At least a portion 35 201037874 is made of a sapphire type Al 2 〇 3 material, and the portion is placed in a central region to form an optical penetration window; and the optical penetration window is formed as a single interposer, the single insertion The cover is made of sapphire and is vacuum sealed to the first housing body. 17. The coating apparatus of claim 14, wherein the evaporator is an organic vaporizer for applying organic vapor to the substrate at a coating rate. 1 8. A method for applying vapor to a substrate, comprising: providing vapor using an evaporation thief to apply vapor to the substrate at a coating rate, the evaporator comprising an evaporator tube, the evaporation The tube has a distribution tube containing at least one nozzle outlet, and wherein the evaporator tube includes a pressure measuring device including an optical diaphragm meter; applying vapor to the substrate; and measuring vapor in the evaporator tube pressure. 19. The method of claim 18, wherein a vapor is provided in the evaporator tube, and a pressure of the vapor is measured in the evaporator tube. [20] The method of claim 18, wherein Optical spacer 36 201037874 Membrane meter 真空 a vacuum measurement tire Λ > . β to 'The vacuum measurement cell comprises: a first housing body, 11 which is made of barium 2〇3 material; a diaphragm, which consists of , 203 material, and is configured in a vacuum sealed manner to greet the first outer casing body adjacent to the flute, thereby establishing a reference vacuum chamber between the first outer casing body and the diaphragm; An external body is made of a material of Α2〇3 and is provided in a vacuum sealing manner opposite to the diaphragm so as to form a space between the second casing body and the diaphragm. J漫立測量真空腔室,該第二外殼 本體包括用以將兮·.、目丨丨旦古 竹4測里真空腔室連接到該蒸發器 管之内部的埠; 其中在該第一外殼本體的中心區域中形成一光 學穿透窗口’以及在該膜片之至少中心區域中將面對 該光學穿透窗口的膜片的表面形成為光學反射的,並 且其中該參考真空腔室外面而和該窗口相對且距離 該窗口一距離處配置一光饋送裝置,用以將光饋送進 出到該膜片的表面上,並且其中在該光纖維與該窗口 之間設置一透鏡裝置,用於光學連接到該膜片的表 面,從而使得此配置形成一用以決定該膜片之彎曲性 程度的測量部。 21·如申請專利範圍第18-20項中任—項所述之方法,其 中提供蒸氣係包括以下步驟:藉由加熱被提供為粒狀 材料或材料線的材料來製造蒸氣。 37 201037874 22·如申請專利範圍第i8 2〇項中任一項所述之方法,更 包含以下舟願《 . At L 鄉·藉由一遮罩來將該基材予以結構化。 23.如申吻專利範圍第18_2〇項中任一項所述之方法,其 中蒸氣疋一有機物蒸氣,該方法選擇性地更包含以下 步驟:施加-無機蓋塗層到該基材。 〇 24·如申請專利範圍帛18 2〇項令任一項所述之方法,其 中蒸氣被提供在該蒸發器管内,並且該蒸發器管内的 蒸氣的壓力係經調整介於2><10-12〇11)^與4xl〇_2mbar 之間。 25.如申請專利範圍第18_2〇項中任一項所述之方法,其 中該光學隔膜計包括一測量部,該測量部包括一膜 片,該膜片係由選自由陶瓷材料、八丨2〇3材料、及藍 ◎ 寶石類型之Ah〇3材料所構成群組之至少—材料來製 成0 38J diffusely measures the vacuum chamber, the second housing body includes a crucible for connecting the vacuum chamber of the 古.. Forming an optically penetrating window in a central region of the body and forming a surface of the diaphragm facing the optically penetrating window in at least a central region of the diaphragm to be optically reflective, and wherein the reference vacuum chamber is outside the surface Opposite the window and disposed at a distance from the window, a light feeding device for feeding light into and out of the surface of the diaphragm, and wherein a lens device is disposed between the optical fiber and the window for optical The surface is attached to the diaphragm such that the configuration forms a measuring portion for determining the degree of flexibility of the diaphragm. The method of any one of clauses 18 to 20, wherein the providing the vapor system comprises the step of producing a vapor by heating a material provided as a granular material or a material line. 37. The method of any one of the claims, wherein the method of any of the following claims is included. At L Township, the substrate is structured by a mask. 23. The method of any of claims 18-2, wherein the vapor is an organic vapor, and the method optionally further comprises the step of applying an inorganic cap coating to the substrate. The method of any of the preceding claims, wherein the vapor is provided in the evaporator tube, and the pressure of the vapor in the evaporator tube is adjusted to be ><10 -12〇11)^ and 4xl〇_2mbar. The method of any one of the preceding claims, wherein the optical separator comprises a measuring portion, the measuring portion comprising a diaphragm selected from the group consisting of ceramic materials, gossip 2 〇3 material, and blue ◎ gem type of Ah 〇 3 material composed of at least - material to make 0 38
TW99107651A 2009-03-16 2010-03-16 Evaporator, coating installation, and method for use thereof TWI398976B (en)

Applications Claiming Priority (2)

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EP20090155275 EP2230326B1 (en) 2009-03-16 2009-03-16 Evaporator, coating installation, and method for use thereof
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CN107002221A (en) * 2014-11-07 2017-08-01 应用材料公司 Arrangement is distributed for vacuum-deposited material deposition arrangement and material
CN108060392A (en) * 2017-12-14 2018-05-22 深圳先进技术研究院 A kind of controllable linear vaporising device and film plating process

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JPS6046373A (en) * 1983-08-22 1985-03-13 Yanako Keisoku:Kk Vapor deposition material gasifying apparatus
JPS61279678A (en) * 1985-06-05 1986-12-10 Nippon Tairan Kk Control device for flow rate
JPH05271937A (en) * 1992-03-27 1993-10-19 Asahi Glass Co Ltd Vapor deposition device
JP3893710B2 (en) * 1997-02-12 2007-03-14 東レ株式会社 Method for forming oil thin film and method for producing vapor-deposited product using the thin film
WO2007019714A1 (en) * 2005-08-12 2007-02-22 Inficon Gmbh Optical interferometric pressure sensor
EP1862788A1 (en) * 2006-06-03 2007-12-05 Applied Materials GmbH & Co. KG Evaporator for organic material, coating installation, and method for use thereof

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Publication number Priority date Publication date Assignee Title
CN107002221A (en) * 2014-11-07 2017-08-01 应用材料公司 Arrangement is distributed for vacuum-deposited material deposition arrangement and material
CN108060392A (en) * 2017-12-14 2018-05-22 深圳先进技术研究院 A kind of controllable linear vaporising device and film plating process

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