JPS6046373A - Vapor deposition material gasifying apparatus - Google Patents

Abstract

PURPOSE:To generate vapor deposition gas always having constant pressure and concn., by evaporating vapor diposition substance under heating in a hermetically closed container, and controlling a heater and the flow control valve of diluting gas on the basis of the pressure measured value of the evaporated substance. CONSTITUTION:A vapor deposition material W is put in a hermetically closed container 1 which is, in turn, evacuated by a vacuum pump 15 to form a vacuum atmosphere. The vapor depostion material W is heated by the ring shaped heater 5 provided to the outside of the container 1 and evaporated. Gas pressure increases as the amount of evaporated gas increases and the evaporated gas is supplied to a vapor deposition reactor from an outlet 6 through a discharge pipe 8 having a capillary 7. In this case, the pressure of the evaporated gas is measured by a gas pressure detector 11 and the heater 5 and the flow control valve 18 of diluting gas are controlled on the basis of the measured result to send vapor having constant pressure and concn. to a vapor depostion furnace while controlling the evaporation amount and the flow amount the diluting gas.

Description

[Detailed description of the invention] The present invention relates to a deposition material gasification device.

When manufacturing semiconductor devices by a vapor phase growth method, etc., it is necessary to obtain a stable concentration of evaporation gas (in this specification, evaporation includes sublimation) of the evaporation material for quality control. It is. Furthermore, when conducting research and development of semiconductor device manufacturing methods, it is necessary to obtain evaporated gas with a stable concentration as a standard gas in order to set the sensitivity of the evaporated gas concentration measuring device in the reactor.

This invention has been made to achieve the above objects. The present invention will be explained below based on embodiments shown in the drawings.

Known evaporation material W whose evaporation pressure is uniquely determined by temperature
(υ is a pair of left and right halves (2).

! 3), and both are connected and separated by known connecting means such as bolts and nuts 14).

An annular heater (5) is provided in the left half (2).

An exit (6) is formed in the right hand body (3,
An outlet tube (8) having a capillary (7) is connected to (.

A through hole (su) is formed in the upper part of the right half (3), and a flexible fall membrane 00 is stretched in this through hole (9), and a pressure detector [+] ) are connected via a connecting pipe (2).

With such a configuration, the pressure inside the closed container (1) can be transmitted to the pressure detector a via the +J flexible gap 11zuQ without escaping the evaporative gas inside the closed valley 23+11.

A through hole (If) is also drilled in the lower part of the right half (3) of the closed container (1), and a vacuum pump (15) is connected to this through hole 03 via the connecting pipe 0.

A dilution gas transport pipe on is connected to the outlet pipe (8) on the downstream side of the capillary (7), and a dilution gas cylinder Q7) is connected to the end of this transport pipe Q, and in the middle of the A flow control valve α is interposed. The flow rate control valve (to) and the heater (5) are automatically controlled by a signal corresponding to a pressure change from a pressure detector (lυ).In other words, the pressure in the closed container (1) If the pressure is out of the set value, the heater will adjust to the set pressure; 5)
The temperature of the diluting gas is changed, and the flow rate of the diluent gas is changed so that the concentration of evaporated gas is constant. Note that such an automatic controller (1°I■) is not necessarily necessary.

Next, how to use the above device will be explained.

First, when using this device as a part of a vapor deposition device, connect the reactor containing the vapor deposition target to the outlet pipe (8),
On the other hand, when using it as a standard gas generator, the outlet pipe (
8) Connect the evaporative gas concentration measuring device whose sensitivity should be set.

After such preparation, the vapor deposition material (
For example, put molybdenum pentachloride) in the sealed container () and make it evacuated using the vacuum pump clrj, and then turn on the main switch of this device.
) is heated and the evaporation of the deposition material starts, and the evaporated gas is
Since the pressure inside the closed container (1) is increased by itself, the increased constant pressure, that is, the constant pressure determined depending on the heating temperature, leaves the closed container (υ) and reaches the outlet pipe (8). The evaporated gas in the outlet pipe (8) is diluted with diluent gas whose flow rate is controlled by the flow rate control valve Q barrel according to the pressure of the evaporated gas, and becomes evaporated gas with a constant concentration, which can be used in the reactor or for measurement of evaporated gas concentration. It will get inside the vessel.

Note that it is desirable to keep the outlet pipe (8) and the like warm or heated as necessary.

As described above, according to the present invention, since the closed container (1) is evacuated and heated, and the evaporated gas is caused to flow out by the self-pressure of the evaporated gas, by controlling the temperature of the heater (5). , the outflow amount of evaporated gas can be kept constant, and the flow 11Y of the 6-distillation gas can also be controlled and kept constant by the flow rate control valve O, so that the ultimately diluted evaporated gas can be kept constant. It is possible to maintain a constant concentration. Therefore, it can be effectively used as an evaporative gas generator of a vapor deposition apparatus or a standard gas generator.

[Brief explanation of the drawing]

FIG. 1 is a system diagram showing an embodiment of the present invention. ! j)・Airtight container, (5)・・・heater, (6)・−・
Outlet, +gj-/outlet pipe, OS...vacuum pump, C7
1... Dilution gas cylinder, 08... Flow rate control valve, W.
...Vapour-deposition material patent applicant Yanako Keizoku Co., Ltd. Patent attorney Tetsuo Onishi Figure 1

Claims (1)

[Claims] An airtight container 11) containing the vapor deposition material (W), a heater (5) for heating this airtight container (]), a vacuum pump 0!9 connected to the airtight container (formerly), and an airtight container (1) an outlet pipe (8) connected to an outlet (6) of the outlet pipe (8);
) and a flow rate control valve side for adjusting the flow rate of the dilution gas Q7).