201034762 六、發明說明： 【發明所屬技術領域j 發明領域 本發明係有關於一種塗布裝置，而可對基板塗布由塗 布頭之喷嘴吐出之溶液液滴。 c先前技術】 發明背景 一般而言，液晶顯示裝置及半導體裝置之製造步驟 中’包含用以於玻璃基板及半導體晶圓等基板上形成電路 圖形之成膜處理。前述成膜處理中，則於基板板面上形成 諸如定向膜或抗蝕膜等功能性薄膜。 於基板上形成功能性薄膜時，可使用由噴嘴吐出可形 成該功能性薄膜之溶液而加以塗布於基板上之噴墨型之塗 布裝置。 前述塗布裝置一如專利文獻1之揭露，包含可搬送基板 之搬送台，該搬送台上方則沿行對基板之搬送方向垂直之 方向並列設有已貫設有上述喷嘴之複數塗布頭。對各塗布 頭則自經供給管而連接之溶液槽供給溶液。藉此，而可自 複數噴嘴對受搬送之基板上面吐出預定量'預定間隔之溶 液液滴。 前述之習知技術中，為避免產生基板之瑕窥品，而藉 相機拍攝已塗布於基板上之溶液液滴，並藉影像處理裝置 進行基於相機之拍攝結果之前述液滴之吐出狀態之測定檢 查。且，用於檢查之基板將經洗滌而重複使用。 201034762 【先行技術文獻】 【專利文獻】 【專利文獻1】特開2004-223356號公報 習知技術中，於塗布裝置内，對基板保持裝置所保持 之基板上塗布塗布頭之各噴嘴所吐出之液滴，並藉相機拍 攝已塗布於前述基板上之液滴後，再由基板保持裝置取出 前述基板，而加以置入塗布裝置外之洗滌機構内。 然而，將用於檢查之基板置入洗滌機構時，必須自美 板保持裝置取出前述基板，而進行檢查時必須對基板保持 裝置安裝新基板，故基板之安裝及取出較不便，而有生產 力不佳之問題。 【考务明内j 發明揭示 發明欲解決之課題 本發明之課題即在進行塗布頭之喷嘴所吐出之液滴之 吐出狀態之檢查以確保生產力。 用以欲解決課題之手段 為解決上述問題，本發明可提供一種塗布裝置，可對 基板塗布由塗布頭之噴嘴吐出之溶液液滴，包含有：檢出 機構，可基於已塗布於基板上之減液滴之塗布狀態"檢 出前述液滴之吐出狀態；洗蘇機構，可洗務塗布有前述溶 液液滴之基板；及’基板保持移動機構，可保持前述基板， 並使前述基板進行㈣歸以依序加叫位於前述塗布頭 之溶液之吐出作業位置、檢出機構之檢出作業位置及洗務 201034762 機構之洗滌作業位置各處。 發明效果 能下可在基板保持移動機構已保持基板之狀 瓜、下，對“基巍序實施噴嘴之溶液吐出、檢出機構之 檢出、洗滌機構之洗滌之各作業，顿昇生產力 圖式簡單說明 第1圖係顯示本發明—眘a丨人 料月_列之塗布裝置之模式正面201034762 VI. OBJECTS OF THE INVENTION: FIELD OF THE INVENTION The present invention relates to a coating apparatus which can apply a droplet of a solution discharged from a nozzle of a coating head to a substrate. BACKGROUND OF THE INVENTION Generally, in the manufacturing steps of a liquid crystal display device and a semiconductor device, a film forming process for forming a circuit pattern on a substrate such as a glass substrate or a semiconductor wafer is included. In the film forming process described above, a functional film such as an alignment film or a resist film is formed on the surface of the substrate. When a functional film is formed on a substrate, an ink jet type coating device which ejects a solution which can form the functional film from a nozzle and applies it to the substrate can be used. As disclosed in Patent Document 1, the coating apparatus includes a transfer table that can transport a substrate, and a plurality of coating heads on which the nozzles are disposed are arranged side by side in a direction perpendicular to a direction in which the substrates are conveyed. Each of the coating heads is supplied with a solution from a solution tank connected via a supply pipe. Thereby, a predetermined amount of liquid droplets of a predetermined interval can be discharged from the plurality of nozzles from the plurality of nozzles. In the above-mentioned prior art, in order to avoid the occurrence of a sneak peek of the substrate, the droplets of the solution that have been applied to the substrate are captured by the camera, and the ejection state of the droplets based on the result of the camera is imaged by the image processing device. an examination. Moreover, the substrate for inspection will be washed and reused. [Patent Document 1] In the prior art, in the coating device, the nozzles of the coating head are applied to the substrate held by the substrate holding device. After the droplets are taken by the camera and the droplets coated on the substrate are photographed by the camera, the substrate is taken out by the substrate holding device and placed in a washing mechanism outside the coating device. However, when the substrate for inspection is placed in the washing mechanism, the substrate must be taken out from the US-plate holding device, and a new substrate must be attached to the substrate holding device during inspection. Therefore, the mounting and removal of the substrate is inconvenient, and the productivity is not high. Good question. [Explanation of the Invention] The object of the present invention is to inspect the discharge state of the liquid droplets discharged from the nozzle of the coating head to ensure productivity. Means for Solving the Problems In order to solve the above problems, the present invention can provide a coating device capable of applying a droplet of a solution discharged from a nozzle of a coating head to a substrate, comprising: a detecting mechanism, which can be based on being applied to the substrate a coating state of the reduced droplets" detecting the discharge state of the liquid droplets; a washing mechanism capable of washing the substrate coated with the droplets of the solution; and a substrate holding moving mechanism capable of holding the substrate and performing the substrate (4) The order of the discharge operation of the solution of the coating head, the detection operation position of the detection mechanism, and the washing operation position of the washing service 201034762 are sequentially added. According to the present invention, it is possible to carry out the work of "the solution discharge of the nozzle, the detection of the detection mechanism, and the washing of the washing mechanism by the substrate holding and holding the substrate", and the productivity of the cleaning mechanism can be increased. BRIEF DESCRIPTION OF THE DRAWINGS Figure 1 is a front view showing the mode of the coating apparatus of the present invention.
圖。 第2圖係顯示塗布裝置之模式側面圖。 第3圖係顯示塗布頭之截面圖。 第4圖係顯示塗布頭之下面圖。 I：實施方式】 用以實施發明之形態 第U、2圖所不之本發明之溶液之塗布裝置1〇〇具有基 *基座1上面A基座丨之長向做有分離預定間隔之一對 軌條2。上述軌條2上設有可移動之載台3，而可藉未圖示之 驅動源加以移動驅動。載台3上面設有多數之支持糾，該 等支持銷侧可承接諸如液晶顯示裝置所使用之玻璃製之 產品用基板W並予以支持。 與上述載台3-同移動之基板w上方，沿行與基板〜之 移動方向交錯之方向諸如垂直方向而配設有—列可對上述 基板W以喷墨方式吐出塗布用於㈣功能性薄膜之溶液之 複數塗布頭，即本實施例之3個塗布頭7。 上述塗布頭7-如第3圖所示，&含塗布頭本體卜塗布 201034762 頭本體8形成筒狀，其下面開 1仇注板9所封閉。該撓 —騎嘴板U所覆蓋，射嘴_與上述撓性板9之間 則區隔形成有複數之液室12。 連通：Γ頭本體8之長向一端部形成有與上述液室12 奴之以孔13。自該供液孔13可對上述衫12供給用於 形成諸如定向贱抗顏等魏性薄以料。藉此，可 使上述液室12内充滿溶液。 如第4圖所示，上述噴嘴板U上沿與基板％之搬送方向 垂直之方向呈棋盤格狀貫設有複數之嘴嘴14。上述挽性板9 上面則如第3圖所示’分別與上述各噴嘴_向而設有複數 壓電元件15。 各壓電件15係由設於上述塗布頭本體8内之驅動部 16供給其驅動電壓。藉此，而可使壓電元件15進行伸縮， 並使撓性板9局部變形而加壓與該部分對向之液室η内之 溶液，故可自與·電元件15位置對向之噴嘴_受搬送 之基板W上面吐出塗布溶液。 如第3圖所示，上述塗布頭本體8之長向他端部形成有 與上述液室12連通之回收孔17。自上述供液孔⑶共入液室 12之’谷液則可由回收孔I?進行回收。即，上述塗布頭7非僅 自噴嘴14吐ώ已供入上述液室12之溶液，並可經上述液室 12而自上述回收孔π進行回收。 因此，藉载台3而搬送基板w至塗布頭7下方後，若藉 驅動部16對壓電元件15通電，則將自噴嘴14對基板w吐出 已供入塗布頭7之液室12之溶液l，而可對基板w吐出塗布 201034762 溶液。基板W尚未搬送至塗布頭7下方時，則可自上述回收 孔17回收已供入上述液室12之溶液。 前述塗布裝置100之上述載台3上一體設有可檢查塗布 頭7之各噴嘴14所吐出之液滴之吐出狀態之檢查裝置加。 即，上述檢查裝置20—如第1、2圖所示，包含沿行載 台3之移動方向之一方側面上已固定之l字狀之安裝構件 21。該安裝構件21之水平部分上面固定配置有洗縣槽22。 〇 洗滌槽22配置於排成一列之各塗布頭7之下方。前述洗滌槽 22之平面尺寸大於同時面對全部之塗布頭7時之範圍。 上述檢查裝置20並包含基板保持移動機構3〇。該基板 保持移動機構30包含設於洗滌槽22之沿行各塗布頭7排成 一列之方向之一方端面之馬達等間歇旋轉裝置31。該間歇 旋轉裝置31之旋轉軸32則於洗滌槽22内部沿行各塗布頭7 排成一列之方向（與來自喷嘴14之液滴之吐出方向垂直之 方向）而延伸。該旋轉軸32上固定有分別對應各塗布頭7之 Q 複數基板保持體，即本實施例之3個基板保持體33。各基板 保持體33則包含可藉真空吸附機構或機械性保持機構等而 保持檢查用基板K之基板保持部34。另，檢查用基板κ之形 成尺寸小於上述載台3上面所保持之產品用之基板w。 上述基板保持移動機構30包含4個基板保持部34,而圩 將複數之個別檢查用基板，即本實施例之4個檢查用基板iC 個別’排列保持於沿行可藉間歇旋轉裝置31而驅動之旋轉 轴32之旋轉方向之檢查用基板K之移動方向之複數位爹 上，即本實施例之4個位置各處。 201034762 亦即，基板保持體33-如第！圖所示，在正面觀察時呈 正方形，4個㈣面分別構成基板保持部34，而可以旋轉轴 32為中心並按90°之間隔保持4片檢查用基板κ。另，基板保 持部34不限於4個，4個以下或以上均可，至少須為】個。’、 檢查裝置20可藉載台3之移動而將洗務槽η、基板保持 移動機構30搬送至塗布頭7下方，並對檢查用基板κ塗布塗 布頭7之各噴嘴14所吐出之溶液液滴。此時，基板保持移動 機構30之間魏轉裝置31可使旋轉肋按9()度間隔進行間 歇旋轉，以將4個基板簡部34中之2個基板保持部34定位 於沿行塗布頭7之各噴嘴14吐出溶液之垂直方向之上下2位 置上，並將其餘2個基板保持部34定位於沿行水平方向之左 右2位置上。 工 上述檢查裝置20包含可拍攝已塗布於基板κ上之溶液 之液滴Ε(第2圖中假設塗布頭7包含5個噴嘴14，而顯示5滴 液滴Ε)之作為拍#裝置之相機2 3 (檢出機構)。該相機2 3固定 於上述洗務槽22之-方側壁(位於與載台3相反之側之側壁) 上。另，在此，自塗布頭7之各噴嘴14對基板κ塗布之溶液 液滴Ε之數量設為各1滴。 上述相機23之光軸設在與基板保持移動機構3〇之旋轉 軸32垂直之水平轴上。相機23分別對應基板保持移動機構 30之3個基板保持體33個別而分離設置，具有可—次測定定 位於各基板保持體33之右位置（第1圖所示之右位置）上之美 板保持部34所保持之基板κ之全部塗布範圍之視域，而可概 括擷取5滴液滴Ε之影像。惟，亦可將相機23設成可朝基板 201034762 K之一端側至他端側之水平方向移動，並使相機23朝水平方 向移動而對基板Κ之全部塗布範圍之一端側至他端側進行 掃瞄同時加以拍攝。 又，上述檢查裝置20並包含可基於相機23之拍攝結果 而測定前述液滴Ε之塗布狀態之影像處理裝置2 4 (檢出機 構）。影像處理裝置24則可依據基板κ上對應塗布頭7之各 喷嘴14之位置上有無液滴Ε、由基板Κ上之各液滴Ε個別之 〇 投影面積算出之前述液滴£個別之吐出量、基板Κ上之各液 滴Ε間之間距等塗布狀態而檢出來自各喷嘴μ之液滴之吐 出狀態。 上述檢查裴置20可對控制裝置25傳送影像處理裝置24 讀出結果。控難置25則可自f彡像處理裝置24之檢出結 果中發現來自各噴嘴14之液滴E之吐出狀態之異常（來自嘴 背14之液滴E之未吐出、相對於吐出量之目標值之異常、相 對於液滴間距之目標值之異常）。 〇 上述控制裝置25一旦發現對應各塗布頭7之任一之基 板K上存在液滴E之吐出狀態之異常則以該塗布頭7為二 檢查對象’輸出該塗布頭7之噴嘴14之清潔、更換、與該塗 布頭7之噴嘴14對向之壓電元件15之驅動電壓之調整等檢 上述控制裝置25並可由諸如影像處理裝置24所算出之 液滴E之投影面積算出各液細之量，即各塗布頭7之嗔嘴14 之實際吐出量。控制裝置25可比較算出之實際吐出量與^ 先已記憶之各嘴嘴14所應吐出之吐出量（目標吐出量化求 201034762 出其差數。 其次，差數若在容許值以上，則依據其差數及已預先 藉實驗求出之吐出量與壓電元件15之驅動電壓之關係，求 出應對壓電元件15施加之驅動電壓，而對塗布頭了之驅動部 16輸出將目則之驅動電壓修正為新驅動電壓之檢修指令。 輸入檢修指令後之塗布頭7將接受再檢查，益測定實際 吐出里，確5忍與目標值之差數之有無，以藉修正後之壓電 元件15之驅動電壓再檢查其噴嘴14之吐出狀態。 此時，對於未成為再檢查對象之其它塗布頭7，亦可與 已輸入檢修指令之塗布頭7—同進行液滴£之吐出而再確認 吐出狀態，或不進行吐出。 上述檢查裝置20並包含可洗滌經相機23之拍攝後之塗 布有液滴E之基板κ之洗蘇農置26(洗務機構）。洗蘇裝置26 則包含蚊於洗騎22底面上之超音波振子26A，以及貯留 於洗滌槽22内之洗滌液26B。 上述超音波振子26A係就基板保持移動機構3〇之各基 板保持體33而相設置者，並與定位於各基板保持體33之 下位置上之基板保持部34所保持之基板κ成相對狀態。洗蘇 液26Β之液面高度則可完全浸人定位於各基板保持體奴 下位置上之基板保持部34所保持之基板κ。 上述檢查裝置20並包含可使藉洗滌裝置26洗滌後之基 板κ乾燥之乾燥裝置27(乾燥機構）。乾燥裝置27則包含固定 於洗務槽22之财㈣上之送風機# υ裝置27係就基 板保持移動機構3G之各基板保持體33而分別設置者，可對 201034762 定位於各基板保持體33之纽置⑻圖巾左 保持部34所簡之基板κ之全部”範圍進行吹送錢Γ 氣等⑽處理。 炼二Figure. Fig. 2 is a schematic side view showing the coating device. Figure 3 is a cross-sectional view showing the coating head. Figure 4 is a view showing the lower side of the coating head. I: EMBODIMENT OF THE INVENTION The coating apparatus 1 of the present invention for carrying out the invention in the form of U and FIG. 2 has a base * pedestal 1 on the upper side of the base 丨. For rails 2. The rail 2 is provided with a movable stage 3, and can be moved and driven by a driving source (not shown). A plurality of support knives are provided on the stage 3, and the support pin side can support and support a substrate W for a glass material such as a liquid crystal display device. Above the substrate w moving in the same manner as the above-mentioned stage 3, a row is arranged in a direction in which the rows are shifted in the direction in which the substrate is moved, such as a vertical direction, and the substrate W is ejected by an inkjet method for (4) a functional film. The plurality of coating heads of the solution, that is, the three coating heads 7 of the present embodiment. The coating head 7 described above, as shown in Fig. 3, & includes a coating head body coating 201034762. The head body 8 is formed into a cylindrical shape, and the lower portion thereof is closed by a hatching plate 9. The squeezing nozzle U is covered, and a plurality of liquid chambers 12 are formed between the nozzle _ and the flexible plate 9 . Connecting: The long end portion of the head body 8 is formed with a hole 13 which is absent from the liquid chamber 12. The above-mentioned shirt 12 can be supplied from the liquid supply hole 13 for forming a thin material such as a directional anti-glare. Thereby, the liquid chamber 12 can be filled with the solution. As shown in Fig. 4, a plurality of nozzles 14 are formed in a checkerboard shape in a direction perpendicular to the conveying direction of the substrate % on the nozzle plate U. On the upper surface of the above-mentioned slab 9 as shown in Fig. 3, a plurality of piezoelectric elements 15 are provided in the respective nozzles. Each of the piezoelectric members 15 is supplied with a driving voltage from a driving portion 16 provided in the coating head main body 8. Thereby, the piezoelectric element 15 can be expanded and contracted, and the flexible plate 9 is partially deformed to pressurize the solution in the liquid chamber η opposed to the portion, so that the nozzle can be opposed to the position of the electric component 15 The coating solution is discharged on the substrate W to be conveyed. As shown in Fig. 3, the coating head main body 8 is formed with a recovery hole 17 communicating with the liquid chamber 12 toward the other end portion. The liquid solution from the liquid supply hole (3) co-introducing the liquid chamber 12 can be recovered by the recovery hole I. That is, the coating head 7 does not spit only the solution supplied to the liquid chamber 12 from the nozzle 14, and can be recovered from the recovery hole π through the liquid chamber 12. Therefore, when the substrate w is transferred to the lower side of the coating head 7 by the stage 3, when the piezoelectric element 15 is energized by the driving unit 16, the solution which has been supplied to the liquid chamber 12 of the coating head 7 from the nozzle 14 to the substrate w is discharged. l, the 201034762 solution can be applied to the substrate w. When the substrate W has not been transferred to the lower side of the coating head 7, the solution supplied to the liquid chamber 12 can be recovered from the recovery hole 17. The stage 3 of the coating apparatus 100 is integrally provided with an inspection device for inspecting the discharge state of the liquid droplets discharged from the nozzles 14 of the coating head 7. That is, the inspection apparatus 20 includes, as shown in Figs. 1 and 2, a mounting member 21 having a l-shape that is fixed on one of the side faces in the moving direction of the row stage 3. A wash tank 22 is fixedly disposed on a horizontal portion of the mounting member 21.洗涤 The washing tub 22 is disposed below each of the coating heads 7 arranged in a row. The planar size of the aforementioned washing tub 22 is larger than when the entire coating head 7 is faced at the same time. The inspection apparatus 20 described above further includes a substrate holding moving mechanism 3A. The substrate holding and moving mechanism 30 includes an intermittent rotating device 31 such as a motor provided in the washing tub 22 along one end surface of each of the coating heads 7 arranged in a line. The rotary shaft 32 of the intermittent rotating device 31 extends in the direction in which the respective coating heads 7 are arranged in a row inside the washing tub 22 (in a direction perpendicular to the discharge direction of the liquid droplets from the nozzles 14). A plurality of substrate holders corresponding to the respective coating heads 7, that is, three substrate holders 33 of the present embodiment are fixed to the rotating shaft 32. Each of the substrate holders 33 includes a substrate holding portion 34 that can hold the inspection substrate K by a vacuum suction mechanism or a mechanical holding mechanism. Further, the inspection substrate κ is formed to have a smaller size than the substrate w for the product held on the upper surface of the stage 3. The substrate holding and moving mechanism 30 includes four substrate holding portions 34, and the plurality of individual inspection substrates, that is, the four inspection substrates iC of the present embodiment are individually arranged and held in the row by the intermittent rotating device 31. The rotational direction of the rotating shaft 32 is in the plural position of the moving direction of the substrate K for inspection, that is, at four positions in the present embodiment. 201034762 That is, the substrate holder 33 - as in the first! As shown in the figure, the square substrate is formed in a front view, and the four (four) faces respectively constitute the substrate holding portion 34, and the four inspection substrates κ are held at intervals of 90° around the rotation axis 32. Further, the substrate holding portion 34 is not limited to four, and may be four or less or more, at least one. The inspection device 20 can transport the washing tank n and the substrate holding moving mechanism 30 to the lower side of the coating head 7 by the movement of the stage 3, and apply the solution liquid discharged from each nozzle 14 of the coating head 7 to the inspection substrate κ. drop. At this time, the Wei-turning device 31 between the substrate holding and moving mechanisms 30 can intermittently rotate the rotating ribs at intervals of 9 () to position the two substrate holding portions 34 of the four substrate sections 34 on the line coating head. Each of the nozzles 14 of 7 discharges the upper and lower positions in the vertical direction of the solution, and positions the remaining two substrate holding portions 34 at positions 2 and 2 in the horizontal direction of the row. The inspection apparatus 20 includes a droplet Ε which can capture a solution applied to the substrate κ (assuming that the coating head 7 includes five nozzles 14 in FIG. 2 and displays five droplets Ε) 2 3 (detection agency). The camera 23 is fixed to the side wall of the washing tank 22 (the side wall on the side opposite to the stage 3). Here, the number of droplets of the solution applied from the respective nozzles 14 of the coating head 7 to the substrate κ is set to 1 drop each. The optical axis of the camera 23 is disposed on a horizontal axis perpendicular to the rotation axis 32 of the substrate holding moving mechanism 3''. The camera 23 is separately provided for each of the three substrate holders 33 of the substrate holding and moving mechanism 30, and has a mean-time measurement of the color plate held at the right position (the right position shown in FIG. 1) of each of the substrate holders 33. The image of the entire coating range of the substrate κ held by the portion 34 can be summarized as an image of 5 drops of droplets. However, the camera 23 may be arranged to be movable in the horizontal direction from the one end side to the other end side of the substrate 201034762 K, and the camera 23 is moved in the horizontal direction to perform one end side to the other end side of the entire coating range of the substrate cassette. Scan and shoot at the same time. Further, the inspection apparatus 20 includes a video processing device 24 (detection mechanism) that can measure the application state of the droplets based on the imaging result of the camera 23. The image processing device 24 can calculate the amount of the droplets that are calculated based on the projected area of each of the nozzles 14 of the coating head 7 on the substrate κ and the projected area of each droplet on the substrate. The discharge state of the liquid droplets from the respective nozzles μ is detected in a coating state such as the distance between the respective droplets on the substrate. The inspection device 20 can transmit the result of reading by the image processing device 24 to the control device 25. When the control device 25 detects the abnormality of the discharge state of the droplet E from each nozzle 14 from the detection result of the image processing device 24 (the discharge E from the nozzle back 14 is not discharged, and the discharge amount is relative to the discharge amount) Anomaly of the target value, an abnormality with respect to the target value of the droplet pitch). When the control device 25 detects that there is an abnormality in the discharge state of the liquid droplet E on the substrate K corresponding to any of the coating heads 7, the coating head 7 is used as the second inspection object to output the cleaning of the nozzle 14 of the coating head 7. The control device 25 is detected by adjusting the driving voltage of the piezoelectric element 15 opposed to the nozzle 14 of the coating head 7, and the amount of each liquid can be calculated from the projected area of the droplet E calculated by the image processing device 24, for example. That is, the actual discharge amount of the nozzle 14 of each coating head 7. The control device 25 compares the calculated actual discharge amount with the discharge amount that should be discharged from each of the mouths 14 that have been memorized (the difference between the target discharge quantitation and the 201034762 is obtained. Next, if the difference is greater than the allowable value, The difference and the relationship between the discharge amount obtained by the experiment and the driving voltage of the piezoelectric element 15 are obtained, and the driving voltage applied to the piezoelectric element 15 is obtained, and the drive unit 16 of the coating head outputs the driving force of the target. The voltage correction is the inspection command of the new driving voltage. After the inspection command is input, the coating head 7 will receive the re-inspection, and the actual discharge is determined, and the difference between the 5 tolerance and the target value is confirmed, so as to correct the piezoelectric element 15 The driving voltage is further checked for the discharge state of the nozzles 14. At this time, the other coating heads 7 that are not to be re-inspected may be discharged together with the coating head 7 to which the inspection command has been input, and the discharge is reconfirmed. The inspection apparatus 20 includes a washing machine 26 (washing mechanism) that can wash the substrate κ coated with the droplet E after being photographed by the camera 23. The washing device 26 contains the mosquito. The ultrasonic vibrator 26A on the bottom surface of the washable bicycle 22 and the washing liquid 26B stored in the washing tub 22. The ultrasonic vibrator 26A is provided in association with each of the substrate holding bodies 33 of the substrate holding and moving mechanism 3, and The substrate κ held by the substrate holding portion 34 positioned at a position below the substrate holding body 33 is in a relative state. The liquid level of the washing liquid 26 can be completely immersed in the substrate on the substrate holding body. The substrate κ held by the holding unit 34. The inspection device 20 includes a drying device 27 (drying mechanism) that can dry the substrate κ after being washed by the washing device 26. The drying device 27 includes the money fixed to the washing tank 22 (4) The upper air blower # υ device 27 is provided separately for each of the substrate holding bodies 33 of the substrate holding and moving mechanism 3G, and the substrate 34a of the substrate holding body 33 can be placed on the substrate of the substrate holding body 33 (8). All of the "ranges are blown, money, gas, etc. (10).
因此，檢查裝置料使基板保持移動機構觀旋轉轴 按9〇度間隔崎驗旋轉髮各额簡體33之4個基 板保持部34在第旧中依序定位於上位置、右位置、下位 置、左位置各處，而可使該等4個基板保持部34所保持之個 別基板K進行循環移動，以依序加以定位於⑴塗布頭7之各 喷嘴Η之溶液之吐出作業位置(上位置）、（2)與相機η對向 之该相機23之液滴Ε之拍攝(檢出）作業位置(右位置）、⑺洗 、条裳置26之基板〖之洗;條作業位置（下位置）、⑷與乾燥裝置 27對向之該乾燥裝置27之基板Κ之乾燥作業位置（左位置） 各處。 ^另，檢查裝置20所使用之檢查用基板Κ可為含氟樹脂 製，或於玻璃基板表面上形成含氟樹脂等撥水性材料膜 者。此時，塗布於基板Κ上之液滴£將因基板尺之撥水性而 不〇散反呈球形，故吐出量若相同，便將形成大致相同直 徑之球形。 因此’相機23所拍攝之基板Κ上之液滴Ε之投影面積之 偏差將減少，而可提昇由前述投影面積算出吐出量之精度。 檢查裝置20之檢查步驟則如下。 (1)藉載台3之移動而將檢查裝置20之洗滌槽22、基板保 持移動機構3〇搬送至各塗布頭7之下方。再對已藉基板保持 移動機構30而定位於基板保持體33之上位置（吐出作業位 1 1 201034762 置）上之基板保持部34所保持之基板κ，自對應之塗布頭7 之各噴嘴14吐出塗布各丨滴之溶液液滴Ε。 ⑺使基板保持移動機構3G之旋轉軸32進行卯度間歇旋 轉，而將上述(1)之基板〖定位於相機23之拍攝作業位置(右 位置）上’再拍攝已自各喷嘴^吐出而塗布於基板κ上之液 滴E。影像處理裝置24則依據相機23之拍攝結果，檢出各喷 嘴14所吐出之液郝之吐出狀態，再由控制裝置25依據影像 處理裝置24之檢出結果，進行必要之噴嘴14之檢修。 (3) 使基板保持移動機構3〇之旋轉軸32進行9〇度間歇旋 轉’而將上述(2)之基板位於洗蘇裝置26之洗滌作業位 置（下位置）上，再洗滌業經相機23拍攝後之塗布有液滴£之 基板K。即，控制裝置25可使超音波振子26A按預定之頻率 進行振盪，並藉其振盪與洗滌液26Β之洗滌力而沖淨基板κ 上塗布之液滴Ε。 (4) 使基板保持移動機構3〇之旋轉軸32進行卯度間歇旋 轉，而將上述(3)之基板κ定位於乾燥裝置27之乾燥作業位 置（左位置）上，以使藉洗滌裝置26而洗滌後之基板尺乾燥。 (5) 洗滌乾燥後之基板Κ將循環地進行次一檢查（包括依 據同一喷嘴14之異常吐出狀態，而由控制裝置25輸出之前 述檢修指令所要求之再檢查），而再度依序定位於上述 (1)〜(4)之吐出作業位置、拍攝作業位置、洗滌作業位置、 乾燥作業位置上。 本實施例可獲致以下之作用效果。 (a)在塗布裝置100内，基板κ可在為基板保持移動機構 12 201034762 30所料之狀態下崎循環移動，岐序定位於塗布頭7之 溶液之吐出作業位置、相機23之拍攝作業位置、洗務装爹 26之洗滌作業位置各處，以接受重複檢查。 在基板保持移動機構3〇已保持基板K之狀態下，可針该 基板K依序實施嘴嘴14之溶液吐出、相機23之拍攝、洗蘇装 置26之洗滌之各作業，而可減少對基板保持部34安裝或取 出基板Κ之手續，並相對提昇生產力。 Ο 絲裝置26配置於塗布裝41G0内，而可避免設備空間 之增加。 又，由於構成使基板保持移動機構30之基板保持體33 騎間歇旋轉’即可使基板保持部34所保持之基板κ依序定 位於吐出作業位置、拍攝作業位置、洗滌作業位置上，故 可藉旋轉之單純移動形態進行作業位置之切換，而實現裝 置構造之簡化。 (b)基板保持移動機構30可於塗布裝置1〇〇内將藉洗滌 © 裝置26而洗滌後之基板K定位於乾燥裝置27之乾燥作業位 置上。 在基板保持移動機構3 〇已保持基板κ之狀態下，可對洗 務後之基板K藉乾燥裝置27而實施乾燥處理。藉此，而可縮 短洗滌後之基板K之乾燥時間，並縮短洗滌後之基板κ再進 行檢查前之等待時間，故此點亦有助於提昇生產力。 乾燥裝置27配置於塗布裝置100内，而可節省設備空 間。 (c)基板保持移動機構30包含可將複數之基板κ個別排 201034762 列保持於沿行基板κ之移動方向之複數位置個別上之複數 基板保持部34,而可將各基板κ依序定位於各作業位置上。 因此，可對複數之各基板κ同時併行實施喷嘴14之溶液吐 出、相機23之拍攝、洗滌裝置26之洗滌之各作業，進而若 有必要亦包含乾燥裝置27之乾燥作業，而更為提昇生產力。 以上，已參照圖示詳細說明本發明之實施例，但本發 明之具體構造並不限於上述實施例，在*逸脫本發明之要 曰1巳圍内之設計變更等亦包含於本發明範圍内。舉例言 之’檢出機構雖使用相機23 ’但不限於此，亦可使用諸如 線型感測器或雷射位移計等距離測定機構。使用線型感測 器時，可使線型感湘橫跨而掃料板κ上所塗布之液滴， 以操取已滴下於基板Κ上之液细之平面影像。又使用距 離測定機構時，亦可使距_定機構橫跨而_基板Κ上所 塗布之液滴’並依據此時之距離測定值之變化而求出液滴ε 之直徑及塗布高度等外徑尺寸。 又，檢查裝置20雖與載台3—同相對於塗布頭7而水平 移動’但亦可構錢檢絲㈣與載分別獨立地相對於 塗布頭7進行水平移動，或檢查裝置2〇亦可固定配置於基座 上，而使塗布頭7水平移動至檢查裝置2()之資訊。 又，雖自各噴嘴14對檢查裝置2〇之基板K上塗布i滴之 溶液液滴E，但不限於丨滴，亦可為魏滴。此時，亦可於 基板K上之同-缝布複數狀液舶，或分別塗布於不同 位置上。 於基板K上同—處塗布複數液滴E時，將求出由複數滴 14 201034762 量之液滴之投影面積求出之吐出量除以塗布於同一處之液 滴數後之值作為液滴每滴之吐出量。於不同位置上分別塗 布複數液滴時，則可求出由個別之液滴E之投影面積分別求 出之吐出量之平均值作為液滴每滴之吐出量。 又，於不同位置上塗布複數液滴時，可使載台3按預定 速度移動，同時按設定之吐出間隔而依設定次數自各喷嘴 14吐出液滴。 產業之可利用性 本發明可進行塗布頭之喷嘴所吐出之液滴之吐出狀態 之檢查，以確保生產力。 I：圖式簡單說明1 第1圖係顯示本發明一實施例之塗布裝置之模式正面 圖。 第2圖係顯示塗布裝置之模式側面圖。 第3圖係顯示塗布頭之截面圖。 第4圖係顯示塗布頭之下面圖。 【主要元件符號說明】 1…基座 11…噴嘴板 2…軌條 12…液室 3…載台 13···供液孔 4…支持鎖 14…喷嘴 7…塗布頭 15…壓電元件 8···塗布頭本體 16…驅動部 9…撓性板 17···回收孔 201034762 20…檢查裝置 30…基板保持移動機構 21…安裝構件 3l···間歇旋轉裝置 22…洗滌槽 32…旋轉轴 23…相機 33…基板保持體 24…影像處理裝置 34…基板保持部 25…控制裝置 100…塗布裝置 26…洗滌裝置 E…液滴 26A…超音波振子 K…檢查用基板 26B..·洗務液 L…溶液 27…乾燥裝置 W…基板 16Therefore, the inspection device feeds the substrate holding mechanism, and the rotation axis of the substrate is rotated at intervals of 9 degrees. The four substrate holding portions 34 of the respective rotations 33 are sequentially positioned in the upper position, the right position, the lower position, and In the left position, the individual substrates K held by the four substrate holding portions 34 are cyclically moved to be sequentially positioned (1) at the discharge working position (upper position) of the solution of each nozzle of the coating head 7. (2) photographing (detecting) the working position (right position) of the droplets of the camera 23 opposite to the camera η, (7) washing, the substrate of the strips 26, washing; the working position (lower position) And (4) the drying operation position (left position) of the substrate 对 of the drying device 27 opposite to the drying device 27. Further, the inspection substrate used in the inspection apparatus 20 may be made of a fluorine-containing resin or a water-repellent material film such as a fluorine-containing resin formed on the surface of the glass substrate. At this time, the droplets applied to the substrate £ will not be scattered and spherical due to the water repellency of the substrate. Therefore, if the discharge amount is the same, a spherical shape having substantially the same diameter will be formed. Therefore, the deviation of the projected area of the droplet Κ on the substrate 拍摄 taken by the camera 23 is reduced, and the accuracy of calculating the discharge amount from the projected area can be improved. The inspection steps of the inspection device 20 are as follows. (1) The washing tub 22 and the substrate holding moving mechanism 3 of the inspection device 20 are conveyed to the lower side of each of the coating heads 7 by the movement of the stage 3. Further, the substrate κ held by the substrate holding portion 34 positioned at the position above the substrate holding body 33 (discharged to the work position 1 1 201034762) by the substrate holding moving mechanism 30 is supplied to each nozzle 14 of the corresponding coating head 7 The solution droplets coated with each of the drops were spit out. (7) The rotation axis 32 of the substrate holding moving mechanism 3G is intermittently rotated, and the substrate of the above (1) is positioned at the shooting operation position (right position) of the camera 23, and the image is discharged from each nozzle and applied to Droplet E on substrate κ. The image processing device 24 detects the discharge state of the liquid discharged from each of the nozzles 14 based on the result of the photographing by the camera 23, and the control device 25 performs inspection of the necessary nozzles 14 based on the detection result of the image processing device 24. (3) The substrate holding the moving mechanism 3's rotating shaft 32 is intermittently rotated by 9 degrees, and the substrate of the above (2) is placed at the washing operation position (lower position) of the washing device 26, and the washing is performed by the camera 23. The substrate K coated with a droplet is then applied. Namely, the control unit 25 causes the ultrasonic vibrator 26A to oscillate at a predetermined frequency, and oscillates the washing liquid with the washing liquid 26 冲 to flush the droplet 涂布 coated on the substrate κ. (4) The rotation axis 32 of the substrate holding moving mechanism 3 is intermittently rotated, and the substrate κ of the above (3) is positioned at the drying operation position (left position) of the drying device 27 so that the washing device 26 is borrowed. The washed substrate is dried. (5) The substrate 洗涤 after washing and drying is cyclically subjected to a second inspection (including the re-inspection required by the aforementioned inspection command outputted by the control device 25 according to the abnormal discharge state of the same nozzle 14), and is again positioned in sequence. The discharge work position, the photographing work position, the washing work position, and the drying work position of the above (1) to (4). This embodiment can achieve the following effects. (a) In the coating apparatus 100, the substrate κ can be cyclically moved in a state of being held by the substrate holding moving mechanism 12 201034762 30, and the position of the solution of the coating head 7 is sequentially positioned, the shooting position of the camera 23, The washing equipment is placed in various locations throughout the washing operation to receive repeated inspections. In a state where the substrate holding moving mechanism 3 has held the substrate K, the substrate K can be sequentially subjected to the solution discharge of the nozzle 14, the photographing of the camera 23, and the washing of the washing device 26, thereby reducing the substrate. The procedure of the holding portion 34 for mounting or removing the substrate , is relatively high in productivity. The wire device 26 is disposed in the coating unit 41G0 to avoid an increase in equipment space. Further, since the substrate holding body 33 constituting the substrate holding and moving mechanism 30 is idly rotated, the substrate κ held by the substrate holding portion 34 can be sequentially positioned at the discharge operation position, the image capturing operation position, and the washing operation position. The work position is switched by the simple movement form of the rotation, and the structure of the device is simplified. (b) The substrate holding moving mechanism 30 can position the substrate K washed by the washing and applying device 26 in the drying operation position of the drying device 27 in the coating device 1A. In the state in which the substrate holding moving mechanism 3 has held the substrate κ, the drying process can be performed by the drying device 27 on the substrate K after the cleaning. Thereby, the drying time of the substrate K after washing can be shortened, and the waiting time before the inspection of the substrate κ after washing can be shortened, so that this also contributes to productivity improvement. The drying device 27 is disposed in the coating device 100, which saves equipment space. (c) The substrate holding and moving mechanism 30 includes a plurality of substrate holding portions 34 that can hold a plurality of substrate κ individual rows 201034762 in a plurality of positions at a plurality of positions along the moving direction of the row substrate κ, and can sequentially position each substrate κ. At each work location. Therefore, it is possible to simultaneously perform the respective operations of the solution discharge of the nozzles 14, the photographing of the camera 23, and the washing of the washing device 26 for each of the plurality of substrates κ, and further, if necessary, the drying operation of the drying device 27, thereby further increasing the productivity. . Hereinabove, the embodiments of the present invention have been described in detail with reference to the drawings, but the specific configuration of the present invention is not limited to the above-described embodiments, and design changes and the like within the scope of the present invention are also included in the scope of the present invention. Inside. For example, the detecting mechanism uses the camera 23' but is not limited thereto, and a distance measuring mechanism such as a line sensor or a laser displacement meter can also be used. When a line type sensor is used, the line type can be slid across the droplets coated on the slab κ to capture a fine image of the liquid that has dripped onto the substrate. When the distance measuring means is used, the droplets applied to the _substrate 而 can be traversed and the diameter of the droplet ε and the coating height can be obtained based on the change in the measured value of the distance. Diameter size. Further, although the inspection device 20 moves horizontally with respect to the application head 7 as in the stage 3, it is also possible to independently move the inspection wire (4) and the carrier independently with respect to the coating head 7, or the inspection device 2 can be fixed. The information is placed on the susceptor to move the coating head 7 horizontally to the inspection device 2(). Further, although the droplets E of the solution of the i droplets are applied to the substrate K of the inspection apparatus 2 from the respective nozzles 14, they are not limited to the droplets, and may be Wei droplets. At this time, it is also possible to apply a plurality of liquid-like liquids on the substrate K or to apply them to different positions. When a plurality of droplets E are applied to the substrate K at the same time, the discharge amount obtained by dividing the projected area of the droplets of the plurality of droplets 14 201034762 by the number of droplets applied to the same portion is determined as a droplet. The amount of spit per drop. When a plurality of droplets are respectively applied at different positions, the average value of the discharge amount obtained by the projection areas of the individual droplets E can be obtained as the discharge amount per droplet. Further, when a plurality of droplets are applied at different positions, the stage 3 can be moved at a predetermined speed, and droplets can be ejected from the respective nozzles 14 at a set number of times in accordance with the set discharge interval. Industrial Applicability The present invention can perform inspection of the discharge state of the liquid droplets discharged from the nozzle of the coating head to ensure productivity. I: BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a front view showing a mode of a coating apparatus according to an embodiment of the present invention. Fig. 2 is a schematic side view showing the coating device. Figure 3 is a cross-sectional view showing the coating head. Figure 4 is a view showing the lower side of the coating head. [Description of main components] 1: pedestal 11...nozzle plate 2...rail 12...liquid chamber 3...stage 13···liquid supply hole 4...support lock 14...nozzle 7...coating head 15...piezoelectric element 8 ··· coating head body 16...drive unit 9...flexible plate 17···recovery hole 201034762 20...inspection device 30...substrate holding moving mechanism 21...mounting member 31·intermittent rotating device 22...washing tank 32...rotating Axis 23...camera 33...substrate holder 24...image processing device 34...substrate holding unit 25...control device 100...application device 26...washing device E...drop 26A...ultrasonic vibrator K...inspection substrate 26B..·washing Liquid L...solution 27...drying device W...substrate 16