201031886 六、發明說明： 【發明所屬之技術領域】 本發明是有關於一種發光裝置，特別是指一種用於高 溫物件之表面觀測的投光裝置。 、同 【先前技術】 隨著工業技術的進步，業界對於各式工件的品質要求 也越來越嚴苛，而在加工技術不斷進步的同時，能足夠精 確的掌握工件品質，才能有效減少廢品與廢料的產生/以 真正的提昇工業技術。 以軋延工件的表面品質來說，目前量測軋延工件表面 品質的方式大致可以區分為兩大類’—種為接觸量測，另 一種則為非接觸量測，常見的接觸量測莫過於利用探針接 觸掃描軋延工件的表面後，進而得知該軋延工件的表面品 質是否滿足要求；而非接觸量測則是利用光學元件間接觀 測軋延工件的表面以獲知軋延工件的表面品質。201031886 VI. Description of the Invention: [Technical Field] The present invention relates to a light-emitting device, and more particularly to a light-emitting device for surface observation of a high-temperature object. With the advancement of industrial technology, the quality requirements of various types of workpieces are becoming more and more stringent in the industry. While the processing technology is continuously improved, the quality of the workpiece can be accurately grasped to effectively reduce waste and The generation of waste / to truly enhance industrial technology. In terms of the surface quality of the rolled workpiece, the current method of measuring the surface quality of the rolled workpiece can be roughly divided into two categories: 'the contact quantity measurement, and the other is the non-contact measurement. The common contact measurement is no more than After the surface of the workpiece is scanned and scanned by the probe contact, it is known whether the surface quality of the rolled workpiece meets the requirements; the non-contact measurement is to indirectly observe the surface of the rolled workpiece by using an optical component to know the surface of the rolled workpiece. quality.
由於接觸量測的量測方式一來過於耗費時間（需以即 件），二來探針也會因軋 快作業速度與降低成本； 細微的探針接觸相對極巨大的工 延工件的高溫產生磨耗，為了加 現有廠商大多已改用如攝影機、相機、電荷耦合元件 (Charge-coupled Device，CCD)…等光學元件間接觀測軋延工 件，以加快作業速度並降低成本。 但是’軋延的工作溫度高，使得軋延工件的表面多呈 紅熱狀態，造成光學元件不易觀測軋延工件的表面情況； 再加上所有物質在高於絕對零度時皆會發出人類肉眼所不 3 201031886 可見的紅外光’更容易於光學元件觀測軋延工件表面時產 生觀測誤差，因此’一般多採用靈敏度較高的光學元件以 觀測軋延工件表面’克服軋延工件因表面紅熱狀態不易觀 測’及因高溫所散發紅外光影響觀測準確度的問題，可是 ’靈敏度愈高的光學元件價格也愈貴，無疑是變相增加了 麻商的設備成本，如何減少設備成本又能正確獲得軋延工 件的表面缺陷’已成為相關業者亟欲克服的問題。 【發明内容】 因此’本發明之目的，即在提供一種可將光線均勻投 射於一尚溫物件之表面上的用於高溫物件之表面觀測的投 光裝置。 於是’本發明用於高溫物件之表面觀測的投光裝置， 包含一發光單元，及一光學處理單元。該發光單元可產生 均勻投射於該高溫物件之表面的平行光，並沿該平行光的 才又射方向定義有一光轴。 該光學處理單元包括一位於該光軸上以接收該發光源 之平行光並產生聚焦之折射光的第一陣列透鏡，及一位於 該光轴上以接收經該第一陣列透鏡聚焦之折射光並產生交 互重叠之二次折射光的第二陣列透鏡，其中，該第一陣列 透鏡與第二陣列透鏡的透光面積與陣列焦距皆相同，且該 第二陣列透鏡與第一陣列透鏡間形成有一第一間距，該第 一間距是等於陣列焦距除以N，其中，N為大於i的實數。 本發明之功效是利用透光面積與陣列焦距皆相同的第 一陣列透鏡與第二陣列透鏡，同時配合將兩者的間距限制 201031886 於小於1倍的任一陣列焦距内，使該發光單元所投射出的 平行光經該第一、二陣列透鏡的折射後能均勻地投射於該 尚JBL物件之表面，抵消物件表面因尚溫所產生的顏色變化 與紅外線’提高觀測高溫物件之表面的準確度。 【實施方式】 有關本發明之前述及其他技術内容、特點與功效，在 以下配合參考圖式之三個較佳實施例的詳細說明中，將可 清楚的呈現。 在本發明被詳細描述之前，要注意的是，在以下的說 明内容t，類似的元件是以相同的編號來表示。 參閱圖1，本發明用於高溫物件之表面觀測的投光裝置 1是可將光線均勻投射於一高溫物件100之表面上該投光 裝置1之第一較佳實施例包含一可產生均勻投射於該高溫 物件100表面之平行光10的發光單元„，及一用以處理該 發光單元11所投射出之平行光10的光學處理單元12。 該發光單元11包括一反射罩111，及一位於該反射罩 111中的發光源112,其中，該反射罩1U的斷面概呈拋物 線形，且形成有一開口 113，而該發光源112所發出的光線 經該斷面概呈抛物線形之反射罩111的導引形成平行光10 而自該開口 113射出，且該發光源112沿該平行光1〇投射 方向定義有一光軸L。於本較佳實施例中該發光源112是一 咼強度放電燈泡（High Intensity Discharge，HID)。 參閱圖1、2,該光學處理單元12包括一位於該光轴l 上以接收該發光單元Π之平行光〗〇並產生聚焦之折射光 5 201031886 10的第陣列透鏡121，及一位於該光軸L上以接收經該 第一陣列透鏡121聚焦之折射光10，並產生交互重疊之二 次折射光10，’的第二陣列透鏡122，其中，該第一陣列透鏡 121的透光面積與陣列焦距，與第二陣列透鏡122的透光面 積與陣列焦距相同，且該第一、二陣列透鏡121、122皆具 有多數面積與排列方式相同的透鏡12〇，每一透鏡12〇皆呈 矩形且每一透鏡120的長度Ll與寬度L2皆介於3公釐至9 公釐間，每一透鏡120的長度Li與寬度L2比則是介於i至 1.4間，由於該第一、二陣列透鏡121、122之透鏡12〇的 大小與排列方式均相同，因此，圖2中僅以第一陣列透鏡 121作說明。 在此需要特別說明的是，平行光1〇經該第一陣列透鏡 121的所述透鏡12〇時會聚焦形成折射光1〇,，折射光1〇，經 該所述透鏡120的焦點後隨即發散，此時，折射光1〇，的光 路徑改變如同倒影實像，亦即接近光轴L之較高亮度的折 射光10’朝光軸L的外側投射，而遠光軸L之較低亮度的折 射光10’朝光軸L的内側投射；所述折射光1〇，在二倍陣列 焦距後開始互相重疊最後投射於高溫物件1〇〇的表面上， 但是，僅利用第一列透鏡121所述折射光1〇，在高溫物件 100所能產生的光重疊效果較差，因此，利用透光面積與陣 列焦距皆與第一陣列透鏡121相同的第二陣列透鏡122，縮 短折射光10’的焦距，以提高二次折射光10，，於高溫物件 100上的重疊度，進而形成亮度均勻的亮區。由前述可知高 溫物件100上的亮區是由各透鏡12〇的亮區重疊拼凑成， 201031886 * 因此透鏡120的尺寸過小或長寬比例過大，將造成折射光 10’與二次折射光10，’的外偏幅度不夠，導致光區亮度均勻 化不足。發明人經由多次的實驗得知，當每一透鏡的 長度L!與寬度L2皆介於3公釐至9公釐間，且每一透鏡 120的長度L〗與寬度L2比則是介於1至1 4間時，二次折 射光10’，於高溫物件1〇〇上的重疊效最好，亮區的亮度也最 為均勻。 於本較佳實施例中每一透鏡12〇的長度Li為5 〇公釐 ，而每一透鏡120的寬度L2為3.8公釐，每一透鏡12〇的 長度L!與寬度L2比則是ι·3，且該第一、二陣列透鏡pi 122的陣列焦距皆為5 $公釐，當然，每一透鏡1的長 度L!與寬度L2可視實際需求作調整，只要該第一陣列透鏡 121與第二陣列透鏡122的透光面積與陣列焦距皆相同，且 每一透鏡120的長度Ll與寬度L2比則是介於1至ι4間即 可達成相同功效，並不應為本較佳實施例的揭露所囿限。 φ 該第一陣列透鏡122與第一陣列透鏡121間形成有一 第一間距Dl，該第一陣列透鏡121與該發光源112間則形 成有介於10公釐至110公釐之間的第二間距d2，而該第 陣歹j透鏡122與該高溫物件1〇〇間則形成有一介於1〇〇〇 公爱至1300公釐之間的有效投射距離，其中，該第一間 距D,是等於陣列焦距除以N，其中，N為大於}的實數。 在此需要另外說明的是，由於該第一間距Di等於陣列 <、'、距除以N，且]sj為大於1的實數，令該第二陣列透鏡丨22 疋位於1倍的陣列焦距内，使得折射光10,是以聚光型式投 7 201031886 射於第一陣列透鏡122上，造成第二陣列透鏡m之所述 透鏡12G的亮區在南溫物件⑽上的重疊與整併效果佳； 右第一陣列透豸122是位於i倍的陣列焦距外使得折射 光ίο是以發散型式投射於第二陣列透鏡122上造成第二 陣列透鏡122之所述透鏡12G的亮區在高溫物件1〇〇上的 重疊與整併效果差。 於本較佳實施例+ N等於3.8667,而第-間距Dl等於 ^ A釐第一間距D2等於85公釐，而該有效投射距離D3 等於1093公釐’當然，該第-、二間距D,、D2及有效投 射距離D3可視實際需求作調整，只要該第一間距ο!是等於 陣列焦，除以N’其中，N為大於i的實數，亦即該第一間 距〇!是小於i倍的任_陣列焦距内即可達成相同的功效 ，並不應為本較佳實施例的揭露所囿限。 參閲圖1及附件i，本發明利用透光面積與陣列焦距相 同的第一陣列透鏡121、122 ’並令該第一、二陣列透 鏡121、122間的第—間距〇丨是小於1倍的任__陣列焦距内 ’使該發光單元11所投射出的平行光1G經該第-、二陣 列透鏡121、122的折射後相互交疊成為二次折射光1〇，，， 進而如附件1所示地均勻地投射於該高溫物件⑽之表面 形成一呈矩形的亮區有效抵消高溫物件100之表面因高 概所產生的顏色變化與紅外線，亦避免光線過份集中而形 成明顯的明暗區分，以提高觀測高溫物件100之表面的準 確度。在此需要特別說明的是，為凸顯亮區的型態，發明 人是利用綠色透光片加遮罩再齡而得_件丨，因此，附 201031886 件1中的亮區是呈現綠色。Because the measurement method of contact measurement is too time-consuming (need to be instant), the probe will also speed up and reduce the cost of rolling; the fine probe contacts the relatively high temperature of the workpiece. Wear, in order to add to the existing manufacturers, most of the optical components such as cameras, cameras, charge-coupled devices (CCD), etc., are used to indirectly observe the rolled workpiece to speed up the operation and reduce the cost. However, 'the working temperature of the rolling is high, so that the surface of the rolled workpiece is mostly red hot, which makes it difficult for the optical component to observe the surface condition of the rolled workpiece; plus all the substances will emit human naked eyes above the absolute zero. 3 201031886 Visible infrared light is easier to observe errors when optical components are observed on the surface of rolled workpieces. Therefore, 'optical components with higher sensitivity are generally used to observe the surface of rolled workpieces' to overcome the problem of rolling reddened surfaces due to surface red heat. 'And the problem of the accuracy of the infrared light emitted by the high temperature, but the higher the sensitivity of the optical components, the more expensive, undoubtedly in disguise increases the equipment cost of the Ma Shang, how to reduce the equipment cost and can correctly obtain the rolling workpiece The surface defects have become a problem that the relevant industry is trying to overcome. SUMMARY OF THE INVENTION Accordingly, it is an object of the present invention to provide a light projecting device for surface observation of a high temperature object which can uniformly project light onto a surface of a temperature-sensitive object. Thus, the light projecting device of the present invention for surface observation of a high temperature object comprises a light emitting unit and an optical processing unit. The light emitting unit generates parallel light uniformly projected on the surface of the high temperature object, and defines an optical axis along the direction of the parallel light. The optical processing unit includes a first array lens positioned on the optical axis to receive parallel light of the illumination source and to generate focused refracted light, and a refracted light positioned on the optical axis to receive focus through the first array lens And generating a second array lens of alternating second refraction light, wherein a light transmission area of the first array lens and the second array lens is the same as an array focal length, and a second array lens is formed between the second array lens and the first array lens There is a first pitch equal to the array focal length divided by N, where N is a real number greater than i. The effect of the invention is to use the first array lens and the second array lens with the same light transmission area and the array focal length, and at the same time, the spacing between the two is limited to 201031886 in less than one time of any array focal length, so that the illumination unit is The projected parallel light can be uniformly projected on the surface of the JBL object through the refraction of the first and second array lenses, offsetting the color change of the surface of the object due to the temperature and the infrared ray to improve the accuracy of observing the surface of the high temperature object. degree. The above and other technical contents, features and effects of the present invention will be apparent from the following detailed description of the preferred embodiments of the drawings. Before the present invention is described in detail, it is to be noted that in the following description, the like elements are denoted by the same reference numerals. Referring to Fig. 1, a light projecting device 1 for surface observation of a high temperature object of the present invention can uniformly project light onto a surface of a high temperature object 100. The first preferred embodiment of the light projecting device 1 includes a uniform projection a light-emitting unit „the parallel light 10 on the surface of the high-temperature object 100, and an optical processing unit 12 for processing the parallel light 10 projected by the light-emitting unit 11. The light-emitting unit 11 includes a reflector 111, and a The illuminating source 112 of the reflector 111, wherein the reflecting cover 1U has a parabolic shape and is formed with an opening 113, and the light emitted by the illuminating source 112 is parabolically shaped through the cross section. The illumination of the illumination source 112 defines an optical axis L along the projection direction of the parallel light 1 。. In the preferred embodiment, the illumination source 112 is a 咼 intensity. High Intensity Discharge (HID). Referring to Figures 1 and 2, the optical processing unit 12 includes a refracted light 5 201031886 10 located on the optical axis 1 to receive the parallel light of the illuminating unit 〇 and to generate focus. a column lens 121, and a second array lens 122 on the optical axis L for receiving the refracted light 10 focused by the first array lens 121 and generating mutually overlapping refraction light 10, ' The light transmissive area of the array lens 121 and the focal length of the array are the same as the focal length of the array of the second array lens 122, and the first and second array lenses 121 and 122 each have a lens 12 having the same area and arrangement. Each lens 12 呈 is rectangular and the length L1 and the width L2 of each lens 120 are between 3 mm and 9 mm, and the length Li to the width L2 ratio of each lens 120 is between i and 1.4. Since the size and arrangement of the lenses 12 of the first and second array lenses 121 and 122 are the same, only the first array lens 121 will be described in FIG. 2. What is particularly necessary here is that the parallel light 1 〇 所述 所述 所述 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该The light path changes like a real image, that is, close to the light The refracted light 10' of the higher luminance of L is projected toward the outside of the optical axis L, and the refracted light 10' of the lower luminance of the far optical axis L is projected toward the inner side of the optical axis L; the refracted light is 1 〇, twice After the focal length of the array begins to overlap each other and finally is projected on the surface of the high temperature object 1 ,, the refracted light 1 所述 is only used by the first column lens 121, and the light overlapping effect of the high temperature object 100 is poor, so The second array lens 122 having the same light transmission area and array focal length as the first array lens 121 shortens the focal length of the refracted light 10' to increase the degree of overlap of the secondary refracted light 10 on the high temperature object 100, thereby forming brightness. Uniform bright area. It can be seen from the foregoing that the bright areas on the high temperature object 100 are assembled by the bright areas of the respective lenses 12〇, 201031886 * Therefore, the size of the lens 120 is too small or the ratio of the length to the width is too large, which will cause the refracted light 10' and the secondary refracted light 10, 'The external bias is not enough, resulting in insufficient brightness uniformity in the light zone. The inventors have learned through many experiments that when the length L! and the width L2 of each lens are between 3 mm and 9 mm, and the ratio of the length L to the width L2 of each lens 120 is When 1 to 14 times, the secondary refracted light 10' has the best overlap effect on the high temperature object 1 ,, and the brightness of the bright area is also the most uniform. In the preferred embodiment, the length Li of each lens 12A is 5 mm, and the width L2 of each lens 120 is 3.8 mm, and the length L! of each lens 12 is wider than the width L2. 3, and the array focal lengths of the first and second array lenses pi 122 are both 5 $ mm. Of course, the length L! and the width L2 of each lens 1 can be adjusted according to actual needs, as long as the first array lens 121 is The light transmission area of the second array lens 122 is the same as the array focal length, and the ratio of the length L1 to the width L2 of each lens 120 is between 1 and 4, which can achieve the same effect, and should not be the preferred embodiment. The limits of the disclosure. A first spacing D1 is formed between the first array lens 122 and the first array lens 121, and a second between 10 mm and 110 mm is formed between the first array lens 121 and the illumination source 112. a spacing d2, and the first array of 歹j lenses 122 and the high temperature object 1 形成 form an effective projection distance between 1 〇〇〇 and 1300 mm, wherein the first spacing D is Equal to the array focal length divided by N, where N is a real number greater than }. It should be additionally noted that, since the first pitch Di is equal to the array <, ', the distance is divided by N, and the sj is a real number greater than 1, the second array lens 丨22 疋 is located at 1 times the array focal length. Therefore, the refracted light 10 is incident on the first array lens 122 by the concentrating pattern, and the overlapping and aligning effect of the bright region of the lens 12G of the second array lens m on the south temperature object (10) is caused. Preferably, the right first array aperture 122 is located outside the array focal length of i times such that the refracted light is projected onto the second array lens 122 in a divergent pattern such that the bright region of the lens 12G of the second array lens 122 is at a high temperature object. The overlap and consolidation effect on 1〇〇 is poor. In the preferred embodiment, + N is equal to 3.8667, and the first-pitch D1 is equal to ^ A PCT. The first pitch D2 is equal to 85 mm, and the effective throw distance D3 is equal to 1093 mm. Of course, the first-and second-pitch D, , D2 and the effective projection distance D3 can be adjusted according to actual needs, as long as the first spacing ο! is equal to the array focus, divided by N', where N is a real number greater than i, that is, the first spacing 〇! is less than i times The same effect can be achieved within any of the array focal lengths and should not be limited by the disclosure of the preferred embodiment. Referring to FIG. 1 and the accessory i, the present invention utilizes the first array lens 121, 122' having the same light-transmitting area as the array focal length and making the first-pitch 〇丨 between the first and second array lenses 121 and 122 less than 1 time. The parallel light 1G projected by the light-emitting unit 11 is refracted by the first and second array lenses 121 and 122 to form a secondary refracted light, and is further attached as an accessory. Uniformly projected on the surface of the high temperature object (10) to form a rectangular bright area effectively offsets the color change and infrared rays generated by the surface of the high temperature object 100, and avoids excessive concentration of light to form obvious light and dark. The distinction is made to improve the accuracy of observing the surface of the high temperature object 100. What needs to be specially noted here is that in order to highlight the type of the bright area, the inventor uses the green light-transmissive sheet and the mask to obtain the size of the mask, so that the bright area in the 201031886 item 1 is green.
參閱圖3與附件i，發明人更進—步針對附件i中呈綠 色的亮區進行色階分析’獲得如圖3巾χ所指之綠色、Y 所指之紅色’及ζ所指之藍色的色階變化，其中，圖3中 Υ所指之紅色及Ζ所指之藍色的變化緩和，唯Μ指之綠 色的色階中間處較為飽和’推估原因’為發明人是利用綠 色透光片遮罩以凸顯附件i之亮區，所以圖3中X所指之 綠色的色階中心處較Y所指之紅色，及z所指之藍色的色 階更為飽和，亦即附件1中亮區之所以呈現綠色的主因。 參閱圖4,本發明用於高溫物件之表面觀測的投光裝置 1之第二較佳實施例’大致上是與該第一較佳實施例相同， 包含一可產生均勻投射於該高溫物件1〇〇表面之平行光1〇 的發光單元11，及-用以處理該發光單元u所投射出之平 行光10的光學處理單元12, #中，不相同之處在於：該光 學處理單元12更包括一位於該光軸L上且可接收經該第二 陣列透鏡122聚焦之二次折射光1〇，，的凹透鏡123。於本較 佳實施例中β玄凹透鏡123的焦距是250公爱，並與該第二 陣列透鏡122間隔30公釐。 在發光源112與該高溫物件1〇〇間的距離與該第—較 佳實施例相同的情況下，利用該凹透鏡123可將經該第二 陣列透鏡122聚焦之二次折射光1〇，，加以放大，有效增加發 光單元11均勻地投射於該高溫物件1〇〇之表面上的面積， 增加所能觀測高溫物件100之表面的面積，進而提高掌握 兩溫物件100之表面品質的能力。 9 201031886Referring to Figure 3 and Annex i, the inventor further progresses the color gradation analysis for the bright green area in Annex i, which is obtained by the green color indicated by Figure 3, the red indicated by Y, and the blue indicated by ζ. The change of color gradation, in which the change of the red and the blue indicated by Υ in Figure 3 is moderate, only the middle of the green gradation is more saturated. The reason for the estimation is that the inventor uses green The transparent sheet mask is used to highlight the bright area of the attachment i, so the center of the green gradation indicated by X in FIG. 3 is more saturated than the red indicated by Y, and the blue gradation indicated by z, that is, The main reason why the bright area in Annex 1 is green. Referring to FIG. 4, a second preferred embodiment of the light projecting device 1 for surface observation of a high temperature object of the present invention is substantially the same as the first preferred embodiment, and includes a uniform object that can be uniformly projected onto the high temperature object 1 The light-emitting unit 11 of the parallel light of the surface of the crucible, and the optical processing unit 12 for processing the parallel light 10 projected by the light-emitting unit u, are different in that the optical processing unit 12 is further A concave lens 123 is disposed on the optical axis L and receives secondary refraction light 1 聚焦 focused by the second array lens 122. In the preferred embodiment, the focal length of the beta eccentric lens 123 is 250 angstroms and is spaced apart from the second array lens 122 by 30 mm. In the case where the distance between the light source 112 and the high temperature object 1 is the same as that of the first preferred embodiment, the secondary refracted light focused by the second array lens 122 can be used by the concave lens 123, The magnification is increased to effectively increase the area of the light-emitting unit 11 uniformly projected on the surface of the high-temperature object 1 , and the area of the surface of the high-temperature object 100 can be increased, thereby improving the ability to grasp the surface quality of the two-temperature object 100 . 9 201031886
參閱圖5’本發明用於高溫物件之表面觀測的投光裝置 1之第三較佳實施例，大致上是與該第—較佳實施例相同， U可產生均勻投射於該高溫物件表面之平行光⑺的發 光單元U，及-用以處理該發光單元u所投射出之平行^ ίο的光學處理料12’其中，不相同之處在於：該發光單 兀11的反射罩ill斷面是概呈橢圓形，並更包括一介於該 第一陣列透鏡！21與該發光源112間的平行光化元件u4 f 斷面概呈橢圓形的反射罩ln能對發光源112所發出的光 產生聚焦效果，聚焦的光經由該平行光化元件114的平行 光化作用可產生平行光1〇,以達成如該第—較佳實施例相 同之效果。於本較佳實施例中，該平行光化元件ιΐ4是一 焦點與該反射罩111之焦點重疊的凸透鏡。 综上所述，本發明用於高溫物件之表面觀測的投光裝 司的第一、二陣列透鏡121Referring to Figure 5, a third preferred embodiment of the light projecting device 1 for surface observation of a high temperature object of the present invention is substantially the same as the first preferred embodiment, and U can be uniformly projected onto the surface of the high temperature object. The light-emitting unit U of the parallel light (7), and the optical processing material 12' for processing the parallel light-emitting material of the light-emitting unit u, wherein the difference is that the reflection cover ill of the light-emitting unit 11 is It is oval in shape and includes one between the first array lenses! A parallel illuminating element u4 f between the illuminating source 112 and the elliptical reflecting reflector ln can have a focusing effect on the light emitted by the illuminating source 112, and the focused light passes through the parallelizing light of the parallelizing element 114. The crystallization can produce parallel light 1 〇 to achieve the same effect as the first preferred embodiment. In the preferred embodiment, the parallel actinic element ι4 is a convex lens having a focus overlapping the focus of the reflector 111. In summary, the first and second array lenses 121 of the light projecting device for surface observation of high temperature articles of the present invention.
、122，配合該第一間距d丨進而將該第二陣列透鏡122設置 於陣列焦距内’使該發光單元11所投射出的平行光丨〇經該 第一、二陣列透鏡121、122的折射後能相互交疊成二次折 射光10’’，進而均勻地投射於該高溫物件1〇〇之表面，抵消 咼溫物件100之表面因高溫所產生的顏色變化與紅外線， 提高觀測高溫物件100之表面的準確度。故確實能達成本 發明之目的。 惟以上所述者’僅為本發明之較佳實施例而已，當不 能以此限定本發明實施之範圍，即大凡依本發明申請專利 範圍及發明說明内容所作之簡單的等效變化與修飾，皆仍 10 201031886 ^ 屬本發明專利涵蓋之範圍内。 【圖式簡單說明】 ® i是一示意圖，說明本發明用於高溫物件之表面觀 測的投光裝置之第一較佳實施例的態樣； 圖2是一正視圖，說明該第一較佳實施例第一陣列透 鏡的規格； 圖3是一分析圖，輔助說明附件丨中亮區的色階變化 情形； 馨 ®4疋一不意圖，說明本發明用於高溫物件之表面觀 測的投光裝置之第二較佳實施例的態樣；及 圖5疋示意圖，說明本發明用於高溫物件之表面觀 測的投光裝置之第三較佳實施例的態樣。 11 201031886 【主要元件符號說明】 1 X ο Κ Φ * ♦ ^ …投光裝置 l2…· ……寬度 1 0 # fc ♦ » « …平行光 12 * * * ° "…光學處理單元 10，… _···折射光 120 - •…·透鏡 10，，… …二次折射光 121 - •…·第一陣列透鏡 100 * * * ，…高溫物件 122… -·…第二陣列透鏡 11… …。發光單元 123… …凹透鏡 111" …反射罩 D1s… * ·…第一間距 112 …·發光源 D24… •…·第二間距 113" …·開口 D 3… …"有效投射距離 114" •…平行光化元件 X"… ••…綠色的色階 L •…光轴 Y.-·.· …· ·紅色的色階 L1 "… —長度 2...,. …-·藍色的色階 12And 122, the first spacing lens d is further disposed in the array focal length to cause the parallel light emitted by the light emitting unit 11 to be refracted by the first and second array lenses 121 and 122. After that, they can overlap each other to form the secondary refracted light 10'', and then uniformly project on the surface of the high-temperature object 1〇〇, offset the color change and infrared rays generated by the high temperature of the surface of the temperature-sensitive object 100, and improve the observation of the high-temperature object 100. The accuracy of the surface. Therefore, the object of the present invention can be achieved. However, the above description is only a preferred embodiment of the present invention, and is not intended to limit the scope of the present invention, that is, the simple equivalent changes and modifications made by the scope of the invention and the description of the invention, All still 10 201031886 ^ is within the scope of the invention patent. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 2 is a schematic view showing a first preferred embodiment of a light projecting device for surface observation of a high temperature object; FIG. 2 is a front view showing the first preferred embodiment. The specification of the first array lens of the embodiment; FIG. 3 is an analysis diagram for explaining the change of the color gradation of the bright area in the attachment ;; 馨 疋 疋 , , , , , , , , , , , , , , , , , , 投 投 投 投A second preferred embodiment of the apparatus; and a schematic view of the third preferred embodiment of the light projecting apparatus of the present invention for surface observation of a high temperature object. 11 201031886 [Description of main component symbols] 1 X ο Κ Φ * ♦ ^ ... Projection device l2...·...Width 1 0 # fc ♦ » « ...Parallel light 12 * * * ° "...Optical processing unit 10,... _··· Refracted light 120 - •...·lens 10,,... secondary refraction light 121 - •...·first array lens 100***,...high temperature object 122...-...second array lens 11... . Light-emitting unit 123... concave lens 111" ...reflector D1s...*....first pitch 112 ...·light source D24...the second pitch 113" ...the opening D 3... ..." effective projection distance 114" Parallel actinic element X"... ••... Green level L •... Optical axis Y.-·.····Red level L1 "... —Length 2...,....-·Blue Level 12