201023256 九、發明說明： 【發明所屬之技術領域】 ㈣i發ί係有關於—種晶圓之清洗_機台。特別是本發明係 具ί移動式洩液槽之清洗蝕刻機台，使轉盤僅需旋轉 排出酸液及酸;水而升降至轉盤處以 【先前技術】 台可用於塗布光阻，清洗或侧晶圓或基片。清 -般她b固定===上ΐ 易：性氣 • 種^酸;口=以上缺點之清洗钱刻機 裡蚀到酸液或清洗之純水經由洩液槽排出。 【發明内容】 台，液槽之清洗_機 =升降至轉盤處以排出酸液及酸 機台本種具有移動式触槽之清洗钱刻 液槽收集彻丨。4使職液或清洗之純水可分別經由茂 201023256 上述目其他目的’本翻之第一觀點 有移動式沒液槽之清洗侧機台，使轉盤保持在固定 種- 巧槽可視侧液之種類或純水而升降至轉盤處以排出酸 轉盤排出之酸液分別排放，每-組圓形液槽有一 接至-個固定風箱之抽風口以將酸性氣體排 =連 2數個抽風π，-個主抽風排氣管，—=抽風勒個 槽ϊϊΐ轉盤處之升降裝置’使其中圓形液槽之-級4 帶動之升降齒輪或-組氣動工具。 开’置細轉馬達 【實施方式】 實施;及優點參考以下之參照圖示及最佳 清參考第1圖’第1圖係域本發明實施例清洗 ，j。轉盤102保持在固定水平上，有一個圓形表面二; e 104 s由旋轉轴110使其旋轉以_或清洗該晶圓 = =構⑽雜’朗其他方式如機械握 持=在轉盤102上。旋轉馬達⑽提供旋轉之動力。侧所 ^2 洗所需之純水由較134、136、138、14〇自儲^ 供。祕槽112位於靠近轉盤外之同心】 槽m、，、ρ二ΐ兩組圓形液槽114，本實施例有四組圓形液 115由井降裝署' 目1液之種類或，純水而定。四組圓形液槽114、 114井_鐘般第2圖）緣箭頭117升降，將適當之圓形液槽 之水平處對準’以將轉盤102排出之酸液分別 祕弟一'组圓形液槽114對準轉盤1ύ2。每一組圓形 曰 、，且圓形抽氣口 118連接至一個固定風箱124之抽風 201023256 口 12。2以將ft性氣體排出’限制器n6使飛濺之酸液或純水不致 ，入圓形抽氣口 118❿落入圓形液槽114，酸液或純水則由排液導 s 160、162、164、166 經三向閥 15〇、152、154、156 回收至儲 ，142、144 : 146、148或進人廢液排放管158而排放。如此可充 为巧用，液或清潔之純水。圓形液槽114之一側有連接口 12〇與 ^定風箱124之抽風口 122連接。酸液產生之酸性氣體由圓形抽 ，口 118經由主排氣流道128進入主抽風排氣管126而排出。其 它圓形液槽115之酸性氣體由圓形抽氣口〗丨8經由次排氣流道j32 ，入次抽風排氣管13〇而排出，如此可將較強之酸性氣體由主抽 風排氣管126排出，較不易互相污染。 △叫參考第2圖，第2圖係顯示依據本發明實施例清洗蝕刻機 〇之剖，及透視圖。轉盤1〇2由旋轉馬達1〇6提供旋轉之動力。 如，所示，四組洩液槽112由升降裝置2〇2使其升降，本實施例 ^第120對準固定風箱124之抽風口 122,使酸性氣體由主排氣流 =128經由主抽風排氣管丨26排出。圓形抽氣口 U8使酸性氣體 机，。限制器116使飛濺之酸液或純水不致進入圓形抽氣口 118 而落入圓形液槽114，酸液或純水則由排液導管（未圖示， 圖）排放或回收。 e 士由以上較佳之具體實施例之詳述，係希望能更加清楚描述 =作之特徵與精神，而並非以上述所揭露的較佳具體實例 35_加嫌制。相反的，其目的是希望脑蓋各種致變 及具相等性的安排於本發明所欲申請之專利範脅内。 【圖式簡單說明】 第1圖係依據本發明實施例清洗姓刻機台之示意圖。 第2圖係顯示依據本發明實施例清洗蝕刻機台之剖面及透視圖。 【主要元件符號說明】 102轉盤 104晶圓 201023256 106旋轉馬達 110旋轉軸 114圓形液槽 118抽氣口 122抽風口 126 主抽風排氣管 130次抽風排氣管 134、136、138、140 導管 150、152、154、156 三向閥 202升降齒輪 108真空吸著機構 112洩液槽 116限制器 120連接口 ; 124 固定風箱 128 主排氣流道 132次排氣流道 142、144、146、148 儲槽 160、162、164、166 排液導管201023256 IX. Description of the invention: [Technical field to which the invention belongs] (4) The i-ray is related to the cleaning of the wafer_machine. In particular, the invention is provided with a cleaning and etching machine for the mobile sump, so that the turntable only needs to rotate to discharge the acid and the acid; the water is lifted and lowered to the turntable to [previously] the table can be used for coating the photoresist, cleaning or side crystal Round or substrate. Clear - general her b fixed === upper ΐ Easy: Sexual gas • Kind of acid; mouth = the above-mentioned shortcomings of the cleaning money machine The etched acid or pure water is discharged through the drain. [Survey of the Invention] Table, cleaning of the liquid tank_machine = lifting to the turntable to discharge the acid and the acid machine. The cleaning tank with the movable contact groove is collected. 4 The working fluid or the pure water can be cleaned separately through the other purposes of the above-mentioned other purposes. The first point of view of this turn is the mobile side tank cleaning side machine, so that the turntable is kept in a fixed type - the smart tank visible side liquid The type or pure water is lifted to the turntable to discharge the acid liquid discharged from the acid rotary disc, and each of the circular liquid tanks has a suction port connected to a fixed bellows to discharge the acid gas = 2 air suctions π, - A main exhaust exhaust pipe, - = a lifting device at the groove of the trough, a lifting gear or a group of pneumatic tools that are driven by the circular tank - level 4. 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 The turntable 102 is held at a fixed level with a circular surface 2; e 104 s is rotated by the rotating shaft 110 to _ or clean the wafer = = configuration (10) miscellaneous 'lang other ways such as mechanical grip = on the turntable 102 . The rotary motor (10) provides the power of rotation. The pure water required for the side of the ^2 wash is supplied by the 134, 136, 138, and 14 〇. The secret trough 112 is located near the concentric outside the turntable. The troughs m, , and ρ are two sets of circular liquid troughs 114. In this embodiment, there are four sets of circular liquids 115 which are replaced by the wells of the wells. And set. Four sets of circular liquid tanks 114, 114 well _ bell-like second figure) edge arrow 117 lifts, aligns the level of the appropriate circular liquid tank to 'the liquid that discharges the turntable 102 respectively. The liquid tank 114 is aligned with the turntable 1ύ2. Each set of circular 曰, and circular suction port 118 is connected to a fixed bellows 124 of the exhaust air 201023256 port 12. 2 to discharge ft gas out of the 'limiter n6 so that the splash of acid or pure water does not, into the circle The shaped suction port 118 is dropped into the circular liquid tank 114, and the acid liquid or the pure water is recovered by the three-way valve 15〇, 152, 154, 156 by the liquid discharge guides s 160, 162, 164, 166, 142, 144: 146, 148 or into the waste liquid discharge pipe 158 and discharged. This can be used as a clever, liquid or clean pure water. One side of the circular liquid tank 114 has a connection port 12A connected to the air outlet 122 of the fixed air box 124. The acid gas generated by the acid is discharged by a circular pumping port 118 through the main exhaust runner 128 into the main exhaust exhaust pipe 126. The acid gas of the other circular liquid tank 115 is discharged from the circular exhaust port 丨8 through the secondary exhaust flow path j32 into the secondary exhaust pipe 13〇, so that the stronger acid gas can be discharged from the main exhaust pipe. 126 discharge, less likely to pollute each other. △ is referred to Fig. 2, and Fig. 2 is a cross-sectional view and a perspective view showing the cleaning of the etching machine in accordance with an embodiment of the present invention. The turntable 1〇2 is provided with a rotating power by a rotary motor 1〇6. As shown, the four groups of drains 112 are lifted and lowered by the lifting device 2〇2, and the first embodiment 120 is aligned with the air outlet 122 of the fixed bellows 124 to allow the acid gas to pass through the main exhaust stream = 128. The exhaust pipe 丨 26 is exhausted. Round suction port U8 makes acid gas machine. The restrictor 116 causes the splashed acid or pure water not to enter the circular suction port 118 and fall into the circular liquid tank 114, and the acid or pure water is discharged or recovered by a drain conduit (not shown, Fig.). The detailed description of the preferred embodiments above is intended to provide a clearer description of the features and spirit of the invention, and is not to be construed as a preferred embodiment. On the contrary, the purpose is to hope that the brain cover various variations and equal arrangements are within the scope of the patent application to which the present invention is intended. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a schematic view showing the cleaning of a surname machine in accordance with an embodiment of the present invention. Figure 2 is a cross-sectional and perspective view showing a cleaning and etching machine in accordance with an embodiment of the present invention. [Main component symbol description] 102 turntable 104 wafer 201023256 106 rotary motor 110 rotating shaft 114 circular liquid tank 118 suction port 122 exhaust port 126 main exhaust exhaust pipe 130 times exhaust pipe 134, 136, 138, 140 conduit 150 152, 154, 156 three-way valve 202 lifting gear 108 vacuum suction mechanism 112 drain tank 116 limiter 120 connection port; 124 fixed bellows 128 main exhaust runner 132 exhaust flow passages 142, 144, 146, 148 reservoir 160, 162, 164, 166 drain conduit