201017339 六、發明說明： 【發明所屬之技術領域】 本發明係關於以光學式檢測塵埃等異物附著在被處理基板上 之狀態之檢測裝置，與搭載此檢測裝置並對該被處理基板塗佈處 理液之例如狹缝塗佈式之處理液塗佈裝置^ 【先前技術】 ❹ 例如於LCD之製造技術領域中，會實行選擇性地將形 LCD基板上之半導體層、絕緣體層、電極層等蝴為既定 步驟。此時’可應用所謂光微影技術，在該LCD基板 光 g形成光阻膜，對應電路圖案使光_曝光，並對其‘二 册當在該LCD紐上塗佈光阻液時，已知的一種方 式喷吐賊光雜脂溶解於_巾而構成之光阻液之# 阻供給喷嘴’沿與藉由該嘴嘴噴吐光阻液之喷吐方向 == 基吐=包;f二：’—供給 @ 依此方法，可自該基板之一邊橫跨另一 (供給)光阻液，故可横跨基板全面均 之方式贺吐 於如此之狹縫塗佈式處理液塗佈裝置 光阻層。關 之例如揭示如下之專利文獻〗中。 、木申叫人過去申請 i專本拜開平1〇七6255號公報 得均-之膜厚，自狹縫狀之私開口喷㈣動作獲 伸該膜厚並同時形成為均一之声狀叙 液蚪，伴隨著拉 阻液之喷嘴與該基板之間之間^ _為此，設定喷吐該光 使兩者隔著例如約卿帅之間‘對小，俾對應膜厚，並 201017339 #針對基板塗佈由該光阻液所代表之處 者該微小間__動，故例如在基板上附 ί;=ί，!該異物接觸該噴嘴之前端部之ί題’ 物介在於該基板與載置並固持該基板之°且異 分會變形為山形，故伴隨著喷嘴與基板:二=: 強力抵緊喷嘴前端部之問題。 《么生基板 特別是如後者，異物介在於該基板盘 ^破損’=時噴嘴前端部會損壞，經塗佈之 ❹ ^刮^的情形。為此需更換該喷嘴並伴隨此需進行“作g條 甚至發展為基板之製造線長時間不得不運轉〃 署，=本Γ請人提議製作一種關塗佈裝 J液喷J喷嘴之相對的進行方向之前方沿水平方向投射光η 理基板上之異物或是該基板因該異物而自平台被舉起之 【專利文獻2】日本特開2007-85960號公報 【發明内容】 (發明所欲解決之課題） 有光i射示之光學式異物檢繼中’採用 射光=#及城____如雷 光接收部(相機），接收該光束； 且使用一種檢測機構，以判斷該光束之光線接收輸 光線接收輸出在單位時間内之變化量(微分值)是否在既定值以上二 曰一依如該特別利用光線接收輸出之微分值檢測異物之構成，可 提高異物之檢測精度，故藉由將其採用於專利文獻2中 狹缝塗佈式塗佈裝置，可對提升塗佈裝置之運轉率有所助益。” 201017339 然而如上述’即使利用雷射光等 ，法完全消除线紐變化導致光線折署 生檢測判定異物時提高其精度有其’發 定麟中尚留有改良之余地。，、歸之清形4，異物之檢測判 ^此，本發明之課題在於提供一種 此之處理液塗佈裝置，沿異物之_ 射型感測器單元之相對移動方向分為透 檢測，跟隨履歷總計資料，以提升對仃先子式異物 物之判以言可確錢反縣度，就有無異 (解決課題之手段） ίίΓί::’，本發明之光學式異物檢測襄置宜包含： 藉此使該光束之光軸沿被處理基板之 板而私動， 該光學式異物檢測裝置之特徵在於咖描’ 該光線接收量之資訊； 、]疋以獲仔於各檢查區域 導出依序錯開！取樣時點之該差分之;^.’^別 定/物;=否對應藉由該第3機構獲得之乘= 且為解決該課題，依本發明之光學式異物檢測裝置宜包含： 201017339 光透射型感測器單元，包含. 及光投射部，沿載置於平台上之被處理基板上表面投射先束； 光接收部，接收該光束；及 相對移動機構，使該感測器單元相 此使該光束之光軸到皮處理基板之上表f面^板而移動，藉 該光學式異物檢測裝置之特徵在於包含. 方向單元相對移動之 該光線接收量之資訊； 獲仵於各檢查區域 第2機構，分別運算藉由該第1 + =光線接收量之資訊’與該取樣時點單“ 線接收量之資狀差分，峨秘各檢查f f 域光 Ϊ山應該感&相對移動履歷之檢查區域之順序，八別 點之該差分值，並加上該各差分值；^ 判定ί物：ί __3 _得—絕對值， 由將:以5獲:之該光線接收量之資訊宜使用藉 比較所產k比====絲之紐魏额鮮值加以 依本f:】之光學式異條職置之實施職巾，宜沿該感 ，設定有3或是4個檢查區域，= 佈於該基板ίί面/由朝該被處理基板嗔吐處理液，將處理液塗 201017339 藉由在相對於該被處理基板而移動之處理液供給喷 學式繼繼，編娜動機翻= 之處職供时射宜包含沿雜板之寬度方向延伸 ίΐίϊ開口，以將自處理液供給噴嘴之該狹縫狀嘴吐開: 呈帶^噴吐之處理液塗佈於該基板之表面，配置有該 該狹縫狀喷吐開口之長邊方向平行，且沿該基板極近i 之存偵測到異物 (發明之效果） ，該絲式異物檢職置’沿光透射賊測料元之相 2有複數之檢查區域，並考算藉由該感測器單元 檢查區域规接收量之資訊與取樣時點單位過去同二檢杳 默齡，'料财料辦_先線^ 之相; 差^值。又，第1機構中宜乘以該依序錯差/值之 且第3機射宜力吐舰序錯開i__之之差刀值。 使於一檢查區域中檢測異物時發生誤差 =檢查^料(微分值)之乘算或是加算，而確實檢3 之反應感度，_定之提升對異物 i ::==¾ 珀之= 及處理液供給射難之問題竹之可锻造成基板 201017339 【實施方式】 處理液於明之光學式異物檢測裝置與搭載有此之 搭載於 之。^即，佈裝置之主要部位相互以剖面圖顯示 圖顯示之，且圖二=3 箭頭方向觀察之狀態之剖面 面圖顯示之。 中自A_A線沿箭頭方向觀察之狀態之剖 參 璃基基板之例如方形之玻 ;;之外觀__)立=:===== 妝能U® 之實施形態中’處理液供仏喷嘴11呈計 狀癌'’财平狀_置_基板1之平Α 嘴1壬固， 頭c顯示之方向移動。又 口 : ®以中空之箭 端部)與玻璃基板丨之間，平Γϋΐ之則端部(圖中所示之下 同時自喷嘴11之狹縫狀開口 llb 哈^100叫之間隔移動， 璃基板m帶狀塗佈處理社以動吐處理液R ’藉此在玻 長邊方向之尺寸更長之例如柱狀之、，11中^缝狀開口 lib 兩端部中安裝有光投射部5及光接成。又’支架構件12之 光透射型感測器單元。 邛6 ’俾分別相向，藉此構成 如圖2所示，該光投射部5 桩 3 ’俾連結此等者之直線’亦即光轴裝於該支架構件 申狹縫狀喷吐開口 11b之長邊方&正一束)4與處理液供給喷嘴11 動方向之前方。 °千仃，且位於該喷嘴11相對移 201017339 、自該光投射部5投射之光束4中，可使用具有約例如670nm 波長之雷射光束。又，设定該光束4之光軸，俾沿基板1之上表 面平行，亦即於此實施形態中沿基板丨之上表面通過約5〇μιη之^ 置，該光束4伴隨著基板1之水平移動，沿基板丨之上表面掃描。 圖3說明該圖1及圖2所示之構成中，特別是光學式之異物 檢測裝置之基本作用。亦即圖3(A)顯示在平台2上呈水平狀^ 置之玻璃基板1上附著有異物3之狀態，且⑼示意顯示在玻;^ 板1與平台^之齡在有異物3，基板丨之―部分顯示為符號 而隆起之狀態之例。 又，該狹縫狀之，吐開口 llb呈其長邊方向沿圖3所示之紙 面左右方向置之狀態。鱗’處理祕給倾無基板丨 之間隙如上述約為ΙΟΟμιη，調整該光束4，俾沿基板丨之上曰， 沿該上表面通過約50μιη之位置。 +於圖3(Α)所示之狀態中，自光投射部5投射之雷射光束受到 附者於基板1上表面異物3之影響導致⑽絲被觸， ^接收部6所接收之光線接收量減^且即使在圖3(Β)所 ^中，自光投射部5投射之雷射光束亦受到基板隆起部ia之 ^，而同樣地使雷射光束被截斷，或是由光接收部 光 藉由針對該光線接收量於後詳= 明之運异處理，可而精度判定異物3存在與否。 圖4說明關於搭载於該塗佈裝置中之光學式異物檢測裝 「向Γ有複數檢查區域。亦 圖4中例示以關於基板—部分附著有異物3之情形H 測器單元之相對移動，該異物3自區域丄朝區域4移^。考先感 在此’該平台2及基板」以等速水平移動，产 ，光感測器單元於每一預定之取樣時點一 各檢查區域中該光線接收量之資訊。 乂獲传 201017339 . 此時，構成光感測器單元之該光接收部6 ⑽構成之光電轉換元件，藉麵得=線y收 板之處理職喊得之緣魏錄為基‘樂ς 比較而產生之關，亦㈣“％，，(百分_^之=與該基準值 圖5顯不關於該—例’自顯示異物3存在之部分中抽 杳 1域4 = °+又’於每一取樣時點取得檢 錄接里’如上述以與鱗觀誠生之“ ％ ” 值將其寫入記憶體（第i機構）。 王< ®干為ί，圖3示之取樣時點“麵7”，區域1之數值S1顯 =為=1甘45114 ’此顯示相對於該基準值為❸一半之光線接收量。 ‘又’於其夂顯示之取樣時點“t0018,，，區域2之數值S2 56.13845”，藉由該相對移動顯示異物3存在於區域2。 該狀況亦出現於其次之取樣時點“t〇〇19，，中區域3之數 ， 且亦同樣，現於其次之取樣時點“舰〇”中區域4之數值料。 —取樣時點各區域中之數值S1〜S4顯示每—所謂檢杳 =中光線接收量之資訊。在此，於此實施形態中，分別運算[ ^查區域巾光線接收量之魏，與該取樣時點單位過去同一檢查 © ίίΐ光線減量之資訊之差分。亦即，運算相當於單位時間内 ® 光線接收量之變化之微分值。 干町Jn 為獲得該微分值，於此實施形態中，利用5取樣時點前同一 =查區域光線接收量之資訊。亦即，取得於該取樣時點“扮〇17”區 域1之數值S1時，運算與在5取樣時點前之“t〇〇12”之同一檢查區 域，區域1之數值S卜亦即“75·81424”之差分，作為區域^分 值寫入該差分值之“_24.3631，，。 以同樣之程序依序獲得區域2〜4之各數值S2〜S4，同時分別 依序與5取樣時點前同一檢查區域光線接收量之資訊進行比較， 分別作為區域1〜4之微分值寫入之(第2機構）。 二又’於此實施形態中獲得該各微分值時，雖可與5取樣時點 珂同一檢查區域光線接收量之資訊進行比較(差分檢測），但就原理 11 201017339 上而吕其可為1取樣時點前 之資料進行比較，有時會因：樣5前。惟若與最近 間之間距等參數而無法放大該變化率值2對速度、試樣時 記餅本置^第1實施形態(請求項i所 依對各齡辦，錢行運算， ❹ !取樣時點之該差再域二=導 則之微分可作為^ 微分值X區域1之3取揭眭赴今 ，取樣％點刖之 4 ^ 5 “麵”，作為其運算值之“7〇3962499；^=^。’於取糾^ ===微分值，所糊知者 算示之線圖而得以理解者’參照藉由該“運算κ乘 可ΐΐΐϋΐ骑值’並將此與預定之臨界值加以比較， I，異物存在與否(第4機構）。亦即，於圖6所示之特性 =顯不之例’藉由該“運算丨(乘算)，，所獲得之數值 = 約〇之臨界值時，可欺異物3存在。 K馬例如 若按照依此實施形態之光學式異物檢測裝置，可沿 之相對移動履歷’乘上對應各檢查區域之微分值。因此，即&於 一檢查區域檢測異物時發生誤差，亦可藉由另一檢查區 杳 資料(微分值)之乘算，確實檢測異物之存在，可大幅提升對異物^ 反應感度。 〃 12 201017339 又 進行運曾，、歸絲式異物檢職置之第1實施形態，雖 序，乘上依序錯差歷之檢查區域之順 分值亦可獲得同樣之作ί 3之差刀值(微域），但分別加上該差 •請❿實施形 時’、進行⑶應 ❹ φ 3 之 微分值”。此藉由加上圖5中“ ，作為該加算 圖6中作為b顯示根據藉由實行該“算 S二==所示之線圖b而得以;解上二由該i =====機將構=定之臨界值加以比較， b顯示之例，藉由====== 〜40之臨界值時可判定異物3存在。職《過-疋為例如約 於依此第2實施職之光學式異物[Technical Field] The present invention relates to a detection device for optically detecting a state in which foreign matter such as dust adheres to a substrate to be processed, and mounting the detection device and coating the substrate to be processed For example, in the field of manufacturing technology of LCD, a semiconductor layer, an insulator layer, an electrode layer, etc. on a liquid crystal substrate are selectively implemented. For the established steps. At this time, the so-called photolithography technology can be applied, the photoresist film is formed on the LCD substrate light, the corresponding circuit pattern is used to expose the light, and when the photoresist is coated on the LCD button, One way to know is to spray the thief light grease to dissolve in the _ towel and form the photoresist liquid # 阻 supply nozzle ' along the jetting direction of the photoresist with the mouth nozzle == base spit = package; f two: ' —Supply @ According to this method, the other (supply) photoresist can be traversed from one side of the substrate, so that the slit coating treatment liquid coating device photoresist can be spread across the substrate in a comprehensive manner. Floor. For example, it is disclosed in the following patent document. In the past, the application of the application for the application of the i-special application of the syllabus of the syllabus of the syllabus of the syllabus was carried out.蚪, with the nozzle between the pull-resist solution and the substrate _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ Coating the photoreceptive liquid to represent the tiny space, so for example, on the substrate, ί;=ί,! The foreign object touches the front end of the nozzle. The matter is based on the substrate and the load. When the substrate is placed and held, and the different portions are deformed into a mountain shape, the nozzle and the substrate are accompanied by two: the problem of strongly pressing the tip end portion of the nozzle. "Missing substrate is especially the latter, and the foreign matter is in the case where the substrate disk is broken" = the front end portion of the nozzle is damaged, and the coated film is scraped. To this end, the nozzle needs to be replaced and the "manufacturing line for the development of the substrate or the substrate has to be operated for a long time, and the applicant has proposed to make a relative coating of the J-jet J nozzle. The foreign matter on the substrate is projected in the horizontal direction before the direction is performed, or the substrate is lifted from the platform due to the foreign matter. [Patent Document 2] JP-A-2007-85960 (Invention) The problem of solving the problem is that the optical type foreign object detection with light i is used to receive the light beam by using the light source=# and the city ____ such as a lightning receiving unit (camera); and using a detecting mechanism to judge the light of the light beam Whether the amount of change (differential value) of the received light receiving and outputting per unit time is greater than or equal to a predetermined value. According to the special value of the differential value of the light receiving output, the detection accuracy of the foreign matter can be improved, thereby improving the detection accuracy of the foreign matter. The use of the slit coating type coating apparatus in Patent Document 2 can contribute to the improvement of the operation rate of the coating apparatus." 201017339 However, as described above, the method is completely eliminated even by using laser light or the like. The change of the line leads to the improvement of the accuracy of the detection of foreign objects when the light is broken. There is still room for improvement in the development. The object of the present invention is to provide a treatment liquid coating device which is divided into a transparent detection along the relative movement direction of the foreign object type sensor unit, followed by detection of the foreign matter. The total amount of resume data is used to improve the judgment of the first-hand foreign object. It is no different (the means to solve the problem) ίίΓί::', the optical foreign object detection device of the present invention should include: Thereby, the optical axis of the light beam is privately moved along the plate of the substrate to be processed, and the optical foreign object detecting device is characterized in that the information of the light receiving amount is etched in order to obtain the information in each inspection area. Staggered! The difference between the points at the time of sampling; ^. '^ 不 / /; = No corresponding to the multiplication obtained by the third mechanism = and to solve the problem, the optical foreign object detecting device according to the present invention preferably includes: 201017339 light transmission The sensor unit includes: a light projection portion that projects a first beam along an upper surface of the substrate to be processed placed on the platform; a light receiving portion that receives the light beam; and a relative moving mechanism that causes the sensor unit to And moving the optical axis of the light beam to the surface of the skin processing substrate, wherein the optical foreign object detecting device is characterized by: the information of the light receiving amount of the relative movement of the direction unit; obtained in each inspection area In the second mechanism, the information difference between the information of the first +=light receiving amount and the point of the sampling time is calculated separately, and each of the inspections ff is determined by the light field and the relative movement history is checked. The order of the regions, the difference value of the eight points, and the difference value; ^ Judgment ί: _ __3 _ get - absolute value, by: 5: The information of the light receiving amount should be borrowed Compare the ratio of produced k to ==== The value is based on the f:] optical type of the position of the implementation of the job, should be along the feeling, set with 3 or 4 inspection areas, = cloth on the substrate ίί face / by the treatment of the substrate The treatment liquid is coated with the treatment liquid 201017339 by the supply of the treatment liquid moving in relation to the substrate to be processed, and the engine is required to be extended in the width direction of the miscellaneous sheet. Opening the slit-shaped nozzle from the processing liquid supply nozzle: the treatment liquid sprayed on the surface of the substrate is applied to the surface of the substrate, and the longitudinal direction of the slit-shaped ejection opening is arranged in parallel The substrate is in close proximity to the presence of a foreign object (the effect of the invention), and the wire foreign object inspection device has a plurality of inspection areas along the phase 2 of the light transmission thief, and is calculated by the sensor. The information of the unit inspection area gauge receiving quantity and the sampling time point unit are the same as the second inspection time, the phase of the material information office _ the first line ^; the difference value. In addition, the first mechanism should multiply the order error / The value of the 3rd machine launches the force force spit ship order staggered the difference value of i__. Error when foreign matter occurs = check the multiplication or addition of the material (differential value), but check the reaction sensitivity of 3, _ to improve the foreign matter i ::==3⁄4 珀 = and the problem of the supply of the treatment liquid Forgeable substrate 201017339 [Embodiment] The optical foreign matter detecting device of the processing liquid is mounted on the display device, and the main parts of the cloth device are displayed in a sectional view, and Fig. 2 = 3 The cross-sectional view of the state in which the direction of the arrow is observed is displayed. The state in which the A_A line is viewed in the direction of the arrow is, for example, a square glass of the glass substrate; the appearance __) stands =:===== makeup energy In the embodiment of U®, the 'treatment liquid supply nozzle 11 is in the form of a cancer type'. The flat surface of the substrate 1 is sturdy, and the head c is moved in the direction indicated by the head. The mouth is: between the end of the hollow arrow and the glass substrate, and the end of the flat surface (the lower part of the nozzle 11 is simultaneously moved from the slit opening of the nozzle 11 by a distance of 100). In the substrate m-coating treatment, the light-spraying treatment liquid R' is attached to the end portions of the eleven slit-shaped opening lib, and the light-projecting portion 5 is attached to the end portion of the slit-shaped opening lib. And the light-transmitting sensor unit of the bracket member 12. The 邛6'俾 are respectively opposed to each other, and the light projection portion 5 is connected to the straight line of the same as shown in FIG. That is, the optical axis is mounted on the long side of the slit-shaped spout opening 11b of the holder member and is immediately before the moving direction of the processing liquid supply nozzle 11. In the light beam 4 projected from the light projecting portion 5, a laser beam having a wavelength of, for example, 670 nm can be used. Further, the optical axis of the light beam 4 is set such that the edge of the light beam 4 is parallel along the upper surface of the substrate 1, that is, in the embodiment, the surface of the substrate 4 is passed through about 5 μm, and the light beam 4 is accompanied by the substrate 1. Move horizontally and scan along the upper surface of the substrate. Fig. 3 is a view showing the basic function of the optical foreign matter detecting device, particularly in the configuration shown in Figs. 1 and 2 . That is, FIG. 3(A) shows a state in which the foreign matter 3 is adhered to the glass substrate 1 which is horizontally arranged on the stage 2, and (9) is schematically shown in the glass; the board 1 and the platform are in the presence of foreign matter 3, the substrate An example of a state in which a part is displayed as a symbol and is raised. Further, in the slit shape, the ejection opening 11b is in a state in which the longitudinal direction thereof is disposed in the left-right direction of the sheet surface shown in Fig. 3 . The scale is treated to the gap of the substrate without the substrate 如, as described above, about ΙΟΟμιη, the beam 4 is adjusted, and the crucible is placed over the substrate 曰, passing the position of about 50 μm along the upper surface. + In the state shown in Fig. 3 (Α), the laser beam projected from the light projecting portion 5 is affected by the foreign matter 3 attached to the upper surface of the substrate 1 (10) the wire is touched, and the light receiving by the receiving portion 6 is received. The amount is reduced and even in Fig. 3 (Β), the laser beam projected from the light projecting portion 5 is received by the substrate ridge ia, and the laser beam is cut off or the light receiving portion is similarly The light can accurately determine the presence or absence of the foreign matter 3 by the processing of the light receiving amount in detail. 4 is a view showing the relative movement of the detector unit in the case where the optical foreign matter detecting device mounted in the coating device has a plurality of inspection regions, and FIG. 4 exemplifies the case where the foreign matter 3 is attached to the substrate portion. The foreign matter 3 is moved from the area to the area 4. The test is that the 'the platform 2 and the substrate' are moved at a constant speed level, and the light sensor unit points the light in each inspection area at each predetermined sampling time. Information on the amount received.乂 传 201017339 . At this time, the light-receiving element constituting the light-receiving portion 6 (10) of the photo sensor unit is formed by the surface of the line y. And the production is also (4) "%,, (% _^ = = with the reference value Figure 5 is not relevant to this - example 'self-displaying the presence of foreign body 3 in the 1 field 4 = ° + again' At the time of sampling, the recording is obtained. The above is written into the memory (the i-th mechanism) with the "%" value of the sacred view. Wang < ® is ί, and Figure 3 shows the sampling point. 7", the value of the area 1 is S1 = ng 45114 'This shows the amount of light received relative to the reference value of ❸ half. 'And' is the value of the sampling point "t0018,,, area 2" S2 56.13845", by means of the relative movement, the foreign matter 3 is present in the region 2. This condition also occurs at the next sampling point "t〇〇19, the number of the middle region 3, and also, the next sampling point" The numerical value of the area 4 in the ship's "." - the value in each area of the sampling point S1 ~ S4 shows each - the so-called inspection = Zhongguang The information of the received amount. Here, in the embodiment, the difference between the information of the light receiving amount of the area towel and the information of the same time of the sampling time unit is detected. That is, the operation is equivalent. In the unit time, the differential value of the change in the amount of received light. In order to obtain the differential value, in this embodiment, the information of the same area of the light in the area of the 5th sampling point is used. That is, the sampling is obtained. When the value S1 of the "dressing 17" area 1 is used, the same inspection area as "t〇〇12" before the 5 sampling time is calculated, and the difference of the value S of the area 1 is "75·81424" as the area. ^ The score is written to the difference value "_24.3631,.. The values of the regions 2 to 4 are sequentially obtained in the same procedure, S2 to S4, and the light receiving amount of the same inspection area before the sampling point is respectively. The information is compared and written as the differential value of the regions 1 to 4 (the second mechanism). Second, when the differential values are obtained in this embodiment, the light receiving amount of the same inspection area can be compared with the sampling time of 5 samples. Capital Compare (differential detection), but on principle 11 201017339, Lu Qi can compare the data before the sampling time, sometimes because of: before the sample 5. However, if the distance between the nearest and the nearest parameter can not enlarge the change The rate value is 2 for the speed and the sample time is set. The first embodiment (the request item i depends on each age, the money line operation, ❹! The difference between the sampling points and the second field = the differential of the guide can be used as ^ The differential value X area 1 3 is taken out, and the 4 ^ 5 "face" of the % point is sampled as the "7〇3962499; ^=^." of the calculated value. If the person who understands the figure is able to understand the line diagram, the reference is made by referring to the "calculation κ multiplied by the value of the ride" and comparing this with the predetermined threshold value. I, the presence or absence of foreign matter (the fourth mechanism) . That is, in the case of the characteristic = not shown in Fig. 6, by the "calculation" (multiplication), when the obtained value = the critical value of about 〇, the fraudulent object 3 exists. According to the optical foreign object detecting device of the embodiment, the relative movement history can be multiplied by the differential value corresponding to each of the inspection regions. Therefore, an error occurs when detecting a foreign object in an inspection region, and another error can be obtained by another Checking the multiplication of the area data (differential value), it is possible to detect the presence of foreign matter, and it can greatly improve the sensitivity to foreign matter. 〃 12 201017339 The first embodiment of the machine for the inspection of the foreign body, In order to multiply the sub-value of the inspection area of the sequential error difference, the same value can be obtained for the ί 3 (micro-domain), but the difference is added separately.微 φ 3 differential value”. This is obtained by adding "in Figure 5" as b in the addition graph 6 according to the line graph b shown by the implementation of the "calculation S ===; the second is solved by the i ===== The machine compares the critical value of the configuration = b. In the example of b, the presence of foreign matter 3 can be determined by the critical value of ======~40. The job "over-疋" is, for example, an optical foreign object in the second implementation position.
ΪΪΪ^履歷，加上對應各檢查區域之微分值。因I 測異物之存在’相較於習知機構可= Γΐ 士 ΐί置21，如圖7所示用作為例如包含_之:以 構。猎由來自此上位裝置21之指令，首先一旦某 如圖8之步驟S11〜S13所示，實行基準取得之動作广、 13 201017339 其中’如圖8之步驟S11所示，於平台上輸送基板，於步驟 S12判斷要求取得基準時，如步驟SB所示實行基準值之取得動 一 此基準值之取得動作中，藉由圖7所示之構成感測器單元之 光接收部6獲得之影像信號於影像/光線接收量轉換機構22中轉換 為光線接收信號。於各檢查區域藉由光線接收量運算機構23辨識 此光線接收信號以作為各區域之基準值，分別將於每一該區^ 基準值寫入達成資料管理功能之記憶體24。 接著，如圖8之步驟S14所示，判定是否要求檢查，—旦 斷要求檢查’即實行步驟S15所枕檢查，亦即異物檢測動^。 ，中，圖7所示之為檢測異物而藉由光接收部6獲得之影 藉由影像/光線接收量轉換機構22轉換為光線接收信號，朝二^ 查區域之光線接收量運算機構23供給之。 饱 又，藉由該運异機構23 ’自該管理基準值之記憶體24 基準值’獲得與此基準佩較產生之比例，亦即⑽“％，,( 顯示之該光線接收量之資訊S1〜S4，並將此數值寫人記憶體1 ) 又，朝區域内履歷差分運算機構25供給該數值(S1〜S4)。 該差分運算機構25運算最新之該數值(S1〜S4),盥 樣時點前)同-檢查區域光線接收量之資訊之差分，將’藉此( ^區域之差分(微分值Dt—1〜Dt_4)寫入記憶體26。如根據圖^所 j t對t入該記憶體26之資料(微分值DtJ〜Dl_4)進行運瞀'， 乘以(第1實施雜)或是加上(第2實施雜)依序錯―開i取= 之4個差分值，並將此乘算或是加算值朝比較器π供給之，占 — ΪΠΪ 27中可供給為發出警報之基準之來自臨界值Μ 時，比較器27具有朝該上位裝置= 出m疋加鼻運算值 於圖8所示之該檢查步驟Sls實行中，如步驟幻 二報之發生’若不發生警報而如步驟S17所示 面j 檢測之檢查結束，此異物檢測之程序即結束。”板王面異物 另一方面，持續檢查中於步驟训;定發生警報時，如圖7 14 201017339 ϊΐ ^上位裝置21接收，如步驟S18 *示停止輸送基板，並如 Γ = 停止自喷嘴11喷吐處理液R，實行使喷嘴11上昇 1動1乍。 雖上說明之實施形態中’載置被處理基板1之平台2 ，處理液供給噴嘴11與包含光投射部5及光接收部6 早元呈@定狀態，但與此相反，餘被處理基板丨 ϋί、ίίί」ΐΐΓΓ嘴11與包含光投射部5及光接收 感測器早7L在被處理基板上移動亦可獲得同樣之作用效果。 魯 相對兒明ίί學式異物檢測裝置中，雖沿該感測器單元之 動向叙有4個_區域，但此數不限於4,亦可適當設 域之數量衫，雖愈可提高對 么ii應感度，與被允許之運算_之_所決定，因該原 口該檢查區域之數量宜設定為3〜4。 ’、 【產業上利用性】 依本發明之處理液塗佈裝置不限於先 之Γί置，亦可適#_於^=圓 於該本Ϊ明之光學式異物檢測裝置不僅可採用 基板面之自動=亦可適#獅於_需監視呈平面狀之 【圖式簡單說明】 透射圖圖2所示之處理液塗佈裝置中之光 5係說_ _定錢存在與否之處理運算之表 之示=係說明關於依本發明之光學式異物檢測裝置之基本形態 圖 圖 15 201017339 構 體 8係用以酬相_作之流程圖 圖 【主要元件符號說明】 C:箭頭ΪΪΪ^ Resume, plus the differential value corresponding to each inspection area. The presence of foreign matter by I can be compared to the conventional mechanism = Γΐ ΐ 置 置 , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , The hunting command from the upper device 21 firstly performs the operation of the reference acquisition as shown in steps S11 to S13 of FIG. 8, 13 201017339, wherein 'the substrate is transported on the platform as shown in step S11 of FIG. When the request acquisition criterion is determined in step S12, the image signal obtained by the light receiving unit 6 constituting the sensor unit shown in FIG. 7 is obtained in the operation of acquiring the reference value as shown in step SB. The image/light receiving amount conversion mechanism 22 converts into a light receiving signal. The light receiving signal is recognized by the light receiving amount calculating means 23 in each inspection area as a reference value of each area, and the memory 24 which realizes the data management function is written in each of the area reference values. Next, as shown in step S14 of Fig. 8, it is determined whether or not the inspection is required, and the inspection is performed in the step S15, that is, the foreign matter detection operation is performed. The image obtained by the light receiving portion 6 for detecting foreign matter is converted into a light receiving signal by the image/light receiving amount converting mechanism 22, and is supplied to the light receiving amount calculating means 23 of the detecting area. It. Sufficiently, the ratio of the reference value of the memory 24 from the management reference value is obtained by the different means 23', that is, (10) "%,, (the information of the light receiving amount is displayed S1) ～S4, and the value is written to the human memory 1). The numerical value (S1 to S4) is supplied to the intra-region history difference calculation unit 25. The difference calculation unit 25 calculates the latest value (S1 to S4), and the like. Before the time point) the difference between the information of the light-receiving amount of the same area is checked, and [the difference of the area (the differential value Dt-1 to Dt_4) is written into the memory 26. If the data is entered into the memory according to the figure jt The data of the body 26 (differential value DtJ~Dl_4) is carried out, multiplied by (1st implementation) or added (2nd implementation), and the 4th difference value of the sequence error - open i take = The multiplier or the added value is supplied to the comparator π, and the comparator 27 has a threshold value Μ when the reference to the alarm is supplied, and the comparator 27 has a nasal value to the upper device. The checking step S1 shown in FIG. 8 is performed, and if the step of the second step occurs, 'if the alarm does not occur, the surface j is detected as shown in step S17. At the end of the inspection, the process of detecting the foreign object ends. "On the other hand, the board Wang Wang foreign body, on the other hand, continues to check in the step training; when an alarm occurs, as shown in Figure 7 14 201017339 ϊΐ ^ the upper device 21 receives, as shown in step S18 * When the substrate is stopped, and the processing liquid R is ejected from the nozzle 11, the nozzle 11 is lifted by one turn. In the above-described embodiment, the processing liquid supply nozzle 11 is placed on the stage 2 on which the substrate 1 to be processed is placed. The light-projecting portion 5 and the light-receiving portion 6 are in a predetermined state, but in contrast, the remaining substrate 丨ϋί, ΐΐΓΓ 11 11 is 7L ahead of the light-containing portion 5 and the light-receiving sensor. The same effect can be obtained by moving on the substrate to be processed. In the case of the foreign matter detecting device, there are four _ regions along the movement of the sensor unit, but the number is not limited to four. If the number of shirts is properly set, the more the sensitivity can be improved, and the number of the inspection areas should be set to 3~4 because of the allowed operation _ _. [Industrial use 】 Treatment liquid coating according to the invention It is not limited to the first Γ 置 , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , Brief Description of the Invention The light 5 in the treatment liquid coating device shown in Fig. 2 is a table showing the processing of the presence or absence of the payment. The explanation is based on the basic description of the optical foreign object detecting device according to the present invention. Morphology diagram Figure 15 201017339 Structure 8 is used to compensate the _ the flow chart [main symbol description] C: arrow
Dt_l〜Dt_4·:微分值 處理液 S1〜S4:數值 S11〜S19:步驟 1:被處理基板（基板）（玻璃基板 la:基板隆起部 2:載置台（平台） 3:異物 4:光轴(光束） 5:光投射部 6:光接收部 11:處理液供給喷嘴（喷嘴） _ 11a:處理液供給口 lib:處理液喷吐開口（狹缝狀開 缝狀喷吐 12:支架構件 21:上位裝置 22:影像/光線接收量轉換機構 23:光線接收量運算機構 23:運算機構 24、26:記憶體 25:區域内履歷差分運算機構（差分運算機構） 27:比較器 28:臨界值設定機構 16Dt_l to Dt_4·: differential value processing liquids S1 to S4: numerical values S11 to S19: Step 1: substrate to be processed (substrate) (glass substrate la: substrate ridge portion 2: mounting table (platform) 3: foreign matter 4: optical axis ( Light beam): light projection unit 6: light receiving unit 11: processing liquid supply nozzle (nozzle) _ 11a: processing liquid supply port lib: processing liquid ejection opening (slit-like slit-like ejection 12: holder member 21: upper device 22: Video/light-receiving amount conversion mechanism 23: Light-receiving amount calculation means 23: Calculation means 24, 26: Memory 25: In-region history difference calculation means (differential calculation means) 27: Comparator 28: Threshold setting means 16