201010956 六、發明說明： 【發明所屬之技術領域】 本發明係關於一種將玻璃構件彼此熔接而製造玻璃熔接 體之玻璃熔接方法。 【先前技術】 作為上述技術領域中之先前之玻璃熔接方法，已知有如 下方法：以沿熔接預定區域之方式將含有雷射光吸收性顏 料之玻璃層燒接於一方之玻璃構件上後，使另一方之玻璃 φ 構件隔著玻璃層重疊於該玻璃構件上，並沿熔接預定區域 照射雷射光，藉此將一方之玻璃構件與另一方之玻璃構件 熔接。 然而，作為將玻璃層燒接於玻璃構件上之技術，通常係 藉由自包含玻璃粉、雷射光吸收性顏料、有機溶劑及黏合 齊J之漿料層中去除有機溶劑及黏合劑而使玻璃層固著於玻 璃構件上後，於煅燒爐内對固著有玻璃層之玻璃構件進行 加熱，藉此，使玻璃層熔融，從而將玻璃層燒接於玻璃構 # 件上（例如參照專利文獻1)。 對此’自抑制因使用煅燒爐所引起之能耗之增大及燒接 • 時間之長時間化的觀點（即高效化之觀點）出發，提出藉由 ' 對固著於玻璃構件上之玻璃層照射雷射光而使玻璃層熔融 從而將玻璃層燒接於玻璃構件上之技術（例如參照專利文 獻2)。 先行技街文獻 專利文獻 140874.doc 201010956 專利文獻1:日本專利特表2〇〇6_524419號公報 專利文獻2 :曰本專利特開2〇〇2_366〇5〇號公報 【發明内容】 [發明所欲解決之問題] 然而，若利用雷射光之照射而對於玻璃構件燒接玻璃 層，則於燒接時、或於其後之玻璃構件彼此熔接時可能會 出現玻璃構件上產生龜裂等玻璃構件破損之情形。 因此，本發明係鑒於此種情況研究而成者，其目的在於 提供種可防止玻璃構件之破損，從而可高效地將玻璃構 件彼此熔接之玻璃熔接方法。201010956 6. DISCLOSURE OF THE INVENTION: TECHNICAL FIELD The present invention relates to a glass fusing method for fusing glass members to each other to produce a glass frit. [Prior Art] As a prior art glass fusing method in the above-mentioned technical field, there is known a method in which a glass layer containing a laser light absorbing pigment is fired on one of the glass members so as to be welded along a predetermined region. The other glass φ member is superposed on the glass member via a glass layer, and irradiates the laser light along the predetermined region where the welding is performed, thereby welding one glass member to the other glass member. However, as a technique for burning a glass layer on a glass member, the glass is usually removed by removing an organic solvent and a binder from a slurry layer containing glass frit, a laser light absorbing pigment, an organic solvent, and a binder. After the layer is fixed to the glass member, the glass member to which the glass layer is fixed is heated in the calcining furnace, thereby melting the glass layer to burn the glass layer on the glass structure (for example, refer to the patent document) 1). In view of the fact that the self-suppression is caused by the increase in energy consumption caused by the use of the calciner and the long-term burning and time (i.e., the viewpoint of high efficiency), it is proposed to use the glass fixed to the glass member. A technique in which a layer irradiates laser light to melt a glass layer to burn a glass layer on a glass member (see, for example, Patent Document 2). Patent Document 140874.doc 201010956 Patent Document 1: Japanese Patent Laid-Open Publication No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. Problem to be Solved] However, if the glass layer is fired by the irradiation of the laser light, the glass member may be damaged when the glass member is welded or the glass members are welded to each other. The situation. Accordingly, the present invention has been made in view of such circumstances, and an object thereof is to provide a glass fusing method which can prevent breakage of a glass member and efficiently weld the glass members to each other.
[解決問題之技術手段] 本發明者為達成上述目的而反覆努力研究，結果查 因利用雷射光之照射所進行之玻璃層之燒接而引起玻璃構 件之破損的原因係如圖i i所示，於燒接時若玻璃層之溫度 超過熔點Tm，則玻璃層之雷射光吸收率急遽升高。即， 在固著於玻璃構件上之玻璃層上，藉由因去除黏合劑而產 生之空隙、或玻璃粉之粒子性，而產生超過雷射光吸收性 顏料之吸收特性之光散射，從而變成雷射光吸收率較低之 狀態（例如，於可見光下看上去發白）。因此，如圖12所 示，若以照射功率P照射雷射光，以使玻璃層之溫度達到 高於熔點Tm且低於結晶化溫度Tc之溫度Tp，則因玻璃粉 之熔融，而使空隙被填滿並且粒子性遭到破壞，故雷射光 吸收性顏料之吸收特性得以顯著顯現，玻璃層之雷射光吸 收率急遽升高（例如，於可見光下看上去發黑）。藉此，於 140874.doc 201010956 玻璃層上產生超過預想之雷射光之吸收，從而因熱輸入過 多所引起之熱震而使玻璃構件上產生龜裂。又，藉由以照 射功率P照射雷射光，如圖12所示，玻璃層之溫度實際上 達到高於結晶化溫度Tc之溫度Ta。若玻璃層中位於與作為 , 燒接對象之玻璃構件相反侧的部分（即，玻璃層中位於作 為熔接對象之玻璃構件側之部分）因熱輸入過多而結晶 化，則該部分之熔點變高β因此，於其後之玻璃構件彼此 之炼接時，為了使玻璃層中位於作為熔接對象之玻璃構件 • 側之部分熔融，必需提高照射功率而照射雷射光，從而與 燒接時相同，因熱輸入過多所引起之熱震而使玻璃構件上 產生龜裂。本發明者根據該見解進一步反覆研究，最終完 成本發明。再者，於因玻璃層之熔融而導致玻璃層之雷射 光吸收率提高之情形時，可見光下之玻璃層之顏色變化並 不限定於自發白之狀態轉變成發黑之狀態，例如於近紅外 雷射光用之雷射光吸收性顏料之中，亦存在若玻璃層溶融 則呈現綠色者。 即，本發明之玻璃熔接方法之特徵在於：其係將第1玻 ，㉟構件與第2玻璃構件溶接而製造玻璃溶接體者，該方法 I括如下步驟.以沿熔接預定區域之方式，將藉由自包含 玻璃粉、雷射光吸收材、有機溶劑及黏合劑之漿料層中去 矛'有機命劑及黏合劑所形成之玻璃層配置於第【玻璃構件 ==制照射條件’以使玻璃層之溫度㈣高於炼點且低 并、”曰化溫度之溫度，且沿熔接預定區域照射第1雷射 ，藉此，使破璃層熔融，從而使玻璃層固定於第丨玻璃 140874.doc 201010956 構件上，以及使第2玻璃構件隔著玻璃層重疊於固定有玻 璃層之第1玻璃構件上，並沿熔接預定區域照射第2雷射 光’藉此將第1玻璃構件與第2玻璃構件熔接。 該玻璃熔接方法中，當沿熔接預定區域照射第丨雷射光 而使玻璃層熔融時，控制照射條件，以使玻璃層之溫度達 到咼於熔點且低於結晶化溫度之溫度，從而使玻璃層固定 於第1玻璃構件上。當固定有該玻璃層時，因玻璃層之熔 融而導致玻璃層之雷射光吸收率急遽升高，但由於控制照 射條件以使玻璃層之溫度達到高於熔點且低於結晶化溫度 之溫度，因此抑制了玻璃層變成熱輸入過多之狀態。藉由< 此種控制，即便利用第i雷射光之照射使玻璃層固定於第1 玻璃構件上，於固定有玻璃層時或於其後之玻璃構件彼此 熔接時，亦可防止出現玻璃構件上產生龜裂等玻璃構件破 損之情形1Λ，藉由該玻璃熔接方法，可防止玻璃構件 之破損，從而可高效地將玻璃構件彼此熔接。 於本發明之玻璃熔接方法中，較好的是，基於自玻璃層 中放射出之熱輻射光而控制照射條件，以使破璃層之溫度❹ 達到高於熔點且低於結晶化溫度之溫度。於此情形時，由 於藉由自玻璃層放射出之熱輻射光而測定玻璃層之溫度， 因此能夠確實地控制照射條件，以使玻璃層之溫度達到高 於溶點且低於結晶化溫度之溫度。 於本發明之玻璃熔接方法中，較好的是，基於由玻璃層 所反射之第1雷射光之反射光而控制照射條件，以使玻璃 層之溫度達到高於熔點且低於結晶化溫度之溫度。反射光 140874.doc 201010956 之光反射率具有以下特性：於玻璃層之溫度達到熔點之前 為口疋 旦玻璃層之溫度超過熔點，則表現出下降之傾 向，其後，若玻璃層之溫度超過結晶化溫度而進行結晶 化，則表現出增加之傾向。因此，由於基於成為具有此種 •特性之光反射率之基準的反射光而控制第丨雷射光之照 射，故能夠更確實地控制照射條件，以使玻璃層之溫度達 到尚於熔點且低於結晶化溫度之溫度。 本發明之玻璃熔接方法中，較好的是，照射條件為第丄 • φ射光之照射功率’且增減照射功率以使玻璃層之溫度達 到高於熔點且低於結晶化溫度之溫度。於此情形時，:於 藉由增減照射功率而進行控制，因此能夠確實地進行控 制，以使玻璃層之溫度達到高於熔點且低於結晶化溫度2 溫度。 ^ 本發明之玻璃熔接方法中，較好的是，照射條件為第^ 雷射光之相對於玻璃層之行進速度，且增減行進速度，以 使玻璃層之溫度達到高於熔點且低於結晶化溫度之溫度。 ❹於此情形時，由於藉由增減第！雷射光之行進速度而=行 控制，因此能夠確實地進行控制，以使玻璃層之溫度達到 高於熔點且低於結晶化溫度之溫度。而且，於破璃層逐漸 熔融而導致雷射光吸收率上升後，多數情況下會使雷射昭 射產生之熱輸入量降低，因此加快第丨雷射光之行進速度' 之情形增多，從而能縮短固定破璃層時所需要之時間。^ 者，所謂「第1雷射光之相對於玻璃層之行進速度」係扑 第1雷射光之相對行進速度，其包括：^雷射光被固定而曰 140874.doc 201010956 玻璃層移動之情形、玻璃層被固定而第丨雷射光移動之情 形、以及第1雷射光及玻璃層分別移動之情形。 本發明之玻璃層固定裝置之特徵在於：其係將藉由自包 含玻璃粉、雷射光吸收材、有機溶劑及黏合劑之漿料層中 去除有機溶劑及黏合劑所形成之玻璃層固定於玻璃構件上 者，該裝置包括：雷射光照射機構，其對配置於玻璃構件 上之玻璃層照射雷射光；以及照射條件控制機構，其控制 雷射光之照射條件，以使玻璃層之溫度達到高於熔點且低 於結晶化溫度之溫度。 該玻璃層固定裝置中，當自雷射光照射機構照射雷射光 而使玻璃層溶融時’藉由照射條件控制機構而控制照射條 件’以使玻璃層之溫度達到高於溶點且低於結晶化溫度之 溫度從而使玻璃層固定於第1玻璃構件上。當固定有該玻 璃層時’玻璃層之雷射光吸收率急遽升高，但由於控制雷 射光照射機構以使玻璃層之溫度達到高於溶點且低於結晶 化溫度之溫度，因此抑制了玻璃層變成熱輸入過多之狀 態。藉此’即便藉由來自雷射光照射機構之雷射光將玻璃 層固定於玻璃構件上，於固定有玻璃層時或於其後之玻璃 構件彼此之熔接時，亦可防止出現玻璃構件上產生龜裂等 玻璃構件破損之情形。 [發明之效果] 根據本發明，可防止玻璃構件之破損’從而可高效地將 玻璃構件彼此炫接。 【實施方式】 140874.doc 201010956 以下，參照圖式對本發明之較佳之實施形態進行詳細說 明。再者，各圖中對於相同或相當之部分標註相同符號， 並省略重複之說明。 [第1實施形態] , 圖1係藉由第1實施形態之玻璃熔接方法所製造之玻璃熔 接體之立體圖。如圖1所示，玻璃熔接體丨係經由沿熔接預 定區域R所形成之玻璃層3’而將玻璃構件（第1玻璃構件）4 與玻璃構件（第2玻璃構件）5熔接而成者。玻璃構件4、5例 • 如係由 無驗玻璃構成之厚度為0.7 mm之矩形板狀之構件， 熔接預定區域R係沿玻璃構件4、5之外緣而設定成矩形環 狀。玻璃層3例如係由低溶點玻璃（鱗酸鈒系玻璃、删酸錯 玻璃等）構成’且沿熔接預定區域R形成為矩形環狀。 其次，對用以製造上述玻璃熔接體1之玻璃熔接方法進 行說明。 首先，如圖2所示，利用分配器或網版印刷等塗佈粉聚 料，藉此沿熔接預定區域R而於玻璃構件4之表面4a上形成 ® 漿料層6。粉漿料係將例如由非晶質之低熔點玻璃（磷酸叙 系玻璃、硼酸鉛玻璃等）構成之粉末狀之玻璃粉（glass ’ frit)2、氧化鐵等無機顏料即雷射光吸收性顏料（雷射光吸 ' 收材）、乙酸戊酯等有機溶劑、以及於玻璃之軟化點溫度 以下熱分解之樹脂成分（丙烯酸系樹脂等）即黏合劑混練而 成者。粉漿料亦可係將玻璃粉（glass frit)、有機溶劑及黏 合劑混練而成者，上述玻璃粉係將預先添加有雷射光吸收 性顏料（雷射光吸收材料）之低熔點玻璃製成粉末狀而成 140874.doc 201010956 者。即，漿料層6中包含玻璃粉2、雷射光吸收性顏料、有 機溶劑及黏合劑。 繼而，使漿料層6乾燥而去除有機溶劑，進而，對漿料 層6進行加熱而去除黏合劑，藉此，使玻璃層3沿熔接預定 區域R而固著於玻璃構件4之表面牝上。再者，固著於玻2 構件4之表面4a上之玻璃層3藉由因去除黏合劑所產生之空 隙、或玻璃粉2之粒子性，而產生超過雷射光吸收性顏料 之吸收特性之光散射，從而變成雷射光吸收率較低之狀熊 (例如於可見光下看上去發白）。又，由於玻璃層3中含有雷 射光吸收性顏料或填料，因此，玻璃層3之炼點及結晶化 溫度達到玻璃層3中所含有之低熔點玻璃（漿料層6中所含 有之玻璃粉2)之熔點及結晶化溫度。 繼而，如圖3及圖4所示，於玻璃層固定裝置1〇之板狀之 載置台11之表面11 a(此處係研磨面）上，隔著玻璃層3而載 置玻璃構件4«藉此，藉由自漿料層6中去除有機溶劑及黏 合劑而形成之玻璃層3以沿熔接預定區域尺之方式而配置於 玻璃構件4與載置台U之間。該玻璃層固定裝置1〇如圖4所 示，其包括.載置台11，其載置形成有玻璃層3之玻璃構 件4 ;雷射光照射部（雷射光照射機構）12，其將聚光點對準 玻璃層3而照射雷射光（第}雷射光）L1 ;受光頭13，其接收 因雷射光L1之照射而自玻璃層3放射出之熱輕射光；放射 溫度計14,其基於受光頭丨3所接收之熱輻射光，而對雷射 光L1之聚光點處之玻璃層3的溫度進行檢測；χγ平台丨5， 其使載置台11於沿熔接預定區域R之XY方向上移動；以及 140874.doc • 10· 201010956 控制邛（舨射條件控制機構）〗6，其對雷射光照射部丨2及 平台15進行控制。 將玻璃構件4載置於載置台u上之後，驅動玻璃層固定 裝置10，如圖3及圖4所示，將聚光點對準玻璃層3並沿熔 • 接預定區域R而照射雷射光Li，藉此，使玻璃層3熔融，從 而將玻璃層3燒接於玻璃構件4上。此時，基於受光頭丨^所 接收之來自玻璃層3之熱輻射光，由控制部16對雷射光。 之照射功率（照射條件）進行如下之控制，以使因熔融而導 ® 致雷射光吸收率急遽升高之玻璃層3之溫度達到高於熔點 且低於結晶化溫度之溫度。 即，如圖5所示，開始照射雷射光以後，首先確認玻璃 層3之溫度是否處於高於熔點Tm且低於結晶化溫度Tc之規 定範圍内（S1)，若玻璃層3之溫度處於上述規定範圍内， 則將雷射光L1之照射功率維持原樣，繼續沿熔接預定區域 R照射雷射光L1(S2)。另一方面，若玻璃層3之溫度處於上 述規定範圍外，則繼而判斷玻璃層3之溫度係高於規定範 ® 圍還是低於規定範圍（S3)，若高於規定範圍，則以固定量 降低雷射光L1之照射功率（S4) ’而若低於規定範圍，則以 固定量增加雷射光L1之照射功率（S5),繼而繼續沿熔接預 定區域R照射雷射光L1。而且，反覆進行此種控制，直至 玻璃層3之沿熔接預定區域R之燒接結束為止（S6)。 藉由實施此種照射功率之控制而進行玻璃層3之燒接， 而使配置於玻璃構件4與載置台11之間之玻璃層3於結晶化 受到抑制之狀態下熔融•再固化，從而燒接於玻璃構件4 140874.doc .n 201010956 之表面4a上。而且’於本實施形態中，由於實施自玻璃構 件4側照射雷射光L1之燒接，因此不僅能切實地將玻璃層3 固定於玻璃構件4上’而且使得將玻璃構件4、5彼此熔接 時作為溶接面之玻璃層3之表面3 a的結晶化進一步得到抑 制。再者，關於燒接於玻璃構件4之表面4a上之玻璃層3， 因玻璃粉2之熔融，而使空隙被填滿並且粒子性遭到破 壞’故顯著地表現出雷射光吸收性顏料之吸收特性，而成 為雷射光吸收率較高之狀態（例如於可見光下看上去發 里）〇 繼而，若遍及熔接預定區域R之整個一周而完成結晶化 受到抑制之玻璃層3之燒接之後，將燒接有玻璃層3之玻璃 構件4自載置台11上取下。此時’由於玻璃粉2與載置台“ 之線膨脹係數之差大於玻璃粉2與玻璃構件4之線膨脹係數 之差’因此’玻璃層3並未固著於載置台11上。又，由於 載置台11之表面11a受到研磨，因此燒接於玻璃構件4之表 面4a上之玻璃層3的與玻璃構件4相反側之表面3a之凹凸處 於平坦化之狀態。 於玻璃層3燒接之後，如圖6所示，將玻璃構件5隔著玻 璃層3重疊於燒接有玻璃層3之玻璃構件4上。此時，由於 玻璃層3之表面3a經平坦化，因此玻璃構件5之表面5a與玻 璃層3之表面3a無間隙地接觸。 繼而’將上述經重疊之玻璃構件4、5載置於未圖示之玻 璃構件熔接裝置上’如圖7所示’將聚光點對準玻璃層3, 沿熔接預定區域R照射雷射光（第2雷射光）L2。再者，此時 140874.doc -12- 201010956 藉由玻璃構件熔接裝置而使玻璃構件4、5相對於雷射光L2 移動而進行照射。藉此，遍及熔接預定區域厌之整個一 周，雷射光L2被處於雷射光吸收率較高之狀態之玻璃層3 而吸收，玻璃層3及其周邊部分（玻璃構件4、5之表面乜、 5a部分）得以熔融·再固化，從而將玻璃構件4與玻璃構件 5熔接。此時，狀態成為：玻璃構件5之表面&與玻璃層^ 之表面3a無間隙地接觸，並且，熔接預定區域尺之整個一 周上，燒接於玻璃構件4上之玻璃層3之結晶化受到抑制， | 因此，玻璃層3之熔點並未升高，而玻璃構件4與玻璃構件 5沿熔接預定區域R均勻地炼接，破損得到防止。 如以上之說明所述，於用以製造玻璃熔接體丨之玻璃熔 接方法中，當沿熔接預定區域R照射雷射光L1而使玻璃層3 熔融時，控制雷射光L!之照射條件，以使玻璃層3之溫度 達到高於溶點Tm且低於結晶化溫度Tc之溫度，從而使玻 璃層3固定於玻璃構件4上。當固定有該玻璃層3時，因玻 璃層3之溶融而導致玻璃層3之雷射光吸收率急遽升高，但 • 由於控制雷射光L1之照射條件以使玻璃層3之溫度達到高 於溶點Tm且低於結晶化溫度Tc之溫度，因此能抑制玻璃 層3變成熱輸入過多之狀態。藉由此種控制，即便利用雷 射光L1之照射使玻璃層3固定於玻璃構件4上，於固定有玻 璃層3時或於其後之玻璃構件4、5彼此熔接時，亦可防止 出現玻璃構件4、5上產生龜裂等玻璃構件4、5破損之情 形。因此，藉由該玻璃溶接方法，可防止玻璃構件4、5破 損’從而可高效地將玻璃構件4、5彼此熔接。 140874.doc -13- 201010956 又’於上述之玻璃熔接方法中，基於自玻璃層3中放射 出之熱輻射光而控制雷射光L1之照射條件，以使玻璃層3 之溫度達到高於熔點T m且低於結晶化溫度Tc之溫度。於 此情形時’係藉由測定自玻璃層3放射出之熱輻射光而對 玻璃層3之溫度進行測定，因此能夠切實地控制雷射光以 之照射條件’以使玻璃層3之溫度達到高於熔點Tm且低於 結晶化溫度Tc之溫度。 又’於上述之玻璃熔接方法中，雷射光！^係自玻璃構件 4側照射至玻璃層3上◊因此，使得玻璃構件4與玻璃層3之 界面部分得到充分加熱，並且進行控制以使玻璃層3之表 面3 a側之溶融溫度低於界面部分側之溶融溫度。因此，不 1 僅可將玻璃層3牢固地燒接並固定於玻璃構件4上，而且能 夠進一步切實地抑制玻璃層3中位於作為熔接對象之玻璃 構件5側之部分（玻璃層3之表面3a部分）因熱輸入過多而結 晶化。 [第2實施形態] 繼而，對本發明之第2實施形態進行說明。本實施形態 與第1實施形態不同之處在於：當將玻璃層3燒接於玻璃構 件4上時，基於由玻璃層3所反射之雷射光以之反射光而控 制雷射光L1之照射功率，以使玻璃層3之溫度達到高於熔 點Tm且低於結晶化溫度tc。 雷射光L1之雷射光反射率具有如下之特性。即，如圖8 所示，於玻璃層3之溫度達到熔點7111之前，雷射光反射率 大致固定’反射光之強度亦大致固定。另一方面，若玻璃 140874.doc -14- 201010956 層3之溫度超過熔sTm、玻璃層3開始熔融，則因由黏合 劑之穿孔（氣泡）或玻璃粉2之粒子性會引起散射減少、或者 由雷射吸收性顏料而引起光吸收率上升，從而形成雷射光 反射率對應於溫度上升而緩慢地下降之傾向，且反射光之 . 強度亦逐漸地下降。 . 接著’若因玻璃層3之溫度為Tml而導致玻璃層3完全熔 融’則雷射光反射率暫時會大致固定，若玻璃層3之溫度 上升至結晶化溫度Tc，則開始結晶化，因由結晶化而引起 • 散射增加，故而存在雷射光反射率對應於溫度上升而再次 上升之傾向，且反射光之強度亦逐漸增強。其後，若玻璃 層3之溫度達到Tcl而完全結晶化，則雷射光反射率再次大 致固定，且反射光之強度亦再次大致固定。本實施形態 中’利用具有此種特性之反射光之強度而將玻璃層3燒接 於玻璃構件4上。再者，玻璃熔接方法中除燒接以外之步 驟均與第1實施形態相同。 首先’對本實施形態中所使用之玻璃層固定裝置2〇進行 ® 說明。玻璃層固定裝置20如圖9所示，除具有第1實施形態 中所使用之載置台11、雷射光照射部丨2、X Y平台丨5以 外，又包括受光頭23、反射光監視器24及控制部（照射條 件控制機構）26。受光頭23接收藉由照射雷射光u而產生 之來自玻璃層3之反射光，並將所接收之反射光之強度資 訊向反射光監視器24輸出。反射光監視器24根據來自受光 頭23之反射光之強度資訊及來自控制部26之照射功率資訊 進行反射率換算’並將反射光之強度資訊或雷射光反射率 140874.doc 201010956 輸出至控制部26。控制部26根據所輸入之反射光之強度資 Λ或雷射光反射率而對雷射光照射部丨2及χγ平台1 $進行 控制。 其次，對本實施形態中之將玻璃層3燒接於玻璃構件4上 之情形進行說明。玻璃層3之燒接過程中，驅動玻璃層固 定裝置20，而將聚光點對準玻璃層3，並沿熔接預定區域r 而照射雷射光L1 ,藉此，使玻璃層3熔融，從而將玻璃層3 燒接於玻璃構件4上。此時，基於受光頭23所接收之由玻 璃層3所反射之反射光的強度，而利用控制部％對雷射光 L1之照射功率進行如下之控制，以使因熔融而導致雷射光 吸收率急遽升高之玻璃層3之溫度達到高於熔點Tm且低於 結晶化溫度Tc之溫度。 即，如圖10所示，若開始照射雷射光L1，則首先緩慢地 增加來自雷射光照射部12之雷射光L1之照射功率，以使玻 璃層3不會立刻結晶化（s 1丨）。繼而，確認受光頭23所接收 之反射光之強度是否處於玻璃層3之溫度未超過熔點丁爪之 規定範圍内（S 12)。再者’由於溫度達到熔點丁瓜之前雷射 光反射率係固定，故而，藉由測定反射光之強度，而確認 玻璃層3之溫度未超過熔點Τηι。 繼而，若反射光之強度處於該規定範圍内，則將雷射光 L1之照射功率維持原樣並沿炫接預定區域r繼續照射雷射 光L1 (S 13)。另一方面，於維持雷射光L〖之照射功率而繼 續照射後，玻璃層之溫度超過熔點Tm而雷射光吸收率上 升，結果導致反射光之強度處於該規定範圍外之情形時， 140874.doc -16 - 201010956 求出來自玻璃層3之雷射光反射率，而判斷該㈣光反射 率是否下降（S14)。[Means for Solving the Problems] The inventors of the present invention have made intensive studies to achieve the above object, and as a result, the reason why the glass member is broken due to the burning of the glass layer by the irradiation of the laser light is as shown in FIG. When the temperature of the glass layer exceeds the melting point Tm at the time of firing, the laser light absorption rate of the glass layer is rapidly increased. In other words, on the glass layer fixed to the glass member, by the voids generated by the removal of the binder or the particle properties of the glass frit, light scattering exceeding the absorption characteristics of the laser light absorbing pigment is generated, thereby becoming a ray. A state in which the light absorption rate is low (for example, it appears white under visible light). Therefore, as shown in FIG. 12, when the laser light is irradiated with the irradiation power P so that the temperature of the glass layer reaches a temperature Tp higher than the melting point Tm and lower than the crystallization temperature Tc, the void is fused by the glass frit. The filling and particle damage are destroyed, so the absorption characteristics of the laser light absorbing pigment are remarkably exhibited, and the laser light absorption rate of the glass layer is rapidly increased (for example, it appears black under visible light). Thereby, absorption of the expected laser light is generated on the glass layer of 140874.doc 201010956, and cracks are generated in the glass member due to thermal shock caused by excessive heat input. Further, by irradiating the laser light with the irradiation power P, as shown in Fig. 12, the temperature of the glass layer actually reaches the temperature Ta higher than the crystallization temperature Tc. When the portion of the glass layer on the side opposite to the glass member to be bonded (that is, the portion of the glass layer on the side of the glass member to be welded) is crystallized due to excessive heat input, the melting point of the portion becomes high. Therefore, when the glass members are subsequently welded to each other, in order to melt the portion of the glass layer located on the side of the glass member to be welded, it is necessary to increase the irradiation power to irradiate the laser light, which is the same as in the case of burning. Thermal shock caused by excessive heat input causes cracks in the glass member. The inventors further studied in turn based on this finding, and finally completed the invention. Furthermore, in the case where the laser light absorption rate of the glass layer is increased due to the melting of the glass layer, the color change of the glass layer under visible light is not limited to the state of spontaneous whitening to blackening, for example, near infrared Among the laser light absorbing pigments for laser light, there is also a green color if the glass layer is melted. That is, the glass fusing method of the present invention is characterized in that the first glass member and the third glass member are bonded to each other to produce a glass-melted body, and the method I includes the following steps. The glass layer formed by the self-organizing agent and the binder from the slurry layer containing the glass frit, the laser light absorbing material, the organic solvent and the binder is disposed in the [glass member == irradiation condition] so that The temperature of the glass layer (4) is higher than the refining point and is lower than the temperature of the deuteration temperature, and the first laser is irradiated along the predetermined region of the fusion, whereby the glass layer is melted, thereby fixing the glass layer to the second glass 140874. .doc 201010956 The first glass member and the second glass member are superposed on the first glass member to which the glass layer is fixed via a glass layer, and the second laser light is irradiated along the predetermined region of fusion. In the glass fusing method, when the third layer of the laser beam is irradiated by irradiating the thunder laser light along the predetermined region of the fusion, the irradiation condition is controlled so that the temperature of the glass layer reaches the melting point and is lower than the crystallization temperature. The temperature is such that the glass layer is fixed to the first glass member. When the glass layer is fixed, the laser light absorption rate of the glass layer is rapidly increased due to the melting of the glass layer, but the glass layer is controlled by controlling the irradiation conditions. The temperature reaches a temperature higher than the melting point and lower than the crystallization temperature, thereby suppressing the state in which the glass layer becomes excessively heated. By this control, the glass layer is fixed to the first layer even by irradiation with the ith laser light. In the glass member, when the glass layer is fixed or when the glass members are welded to each other, the glass member such as cracks in the glass member can be prevented from being damaged. By the glass welding method, the glass member can be prevented. The glass member is welded to each other efficiently. In the glass fusing method of the present invention, it is preferred to control the irradiation condition based on the heat radiation light emitted from the glass layer to make the temperature of the glass layer达到 reaching a temperature higher than the melting point and lower than the crystallization temperature. In this case, the temperature of the glass layer is determined by the heat radiation from the glass layer. Therefore, it is possible to surely control the irradiation conditions so that the temperature of the glass layer reaches a temperature higher than the melting point and lower than the crystallization temperature. In the glass fusing method of the present invention, it is preferable to reflect based on the glass layer. The irradiation light of the first laser light is controlled to control the irradiation condition so that the temperature of the glass layer reaches a temperature higher than the melting point and lower than the crystallization temperature. The light reflectance of the reflected light 140874.doc 201010956 has the following characteristics: temperature at the glass layer When the temperature of the glass layer exceeds the melting point before reaching the melting point, the temperature tends to decrease, and thereafter, when the temperature of the glass layer exceeds the crystallization temperature and crystallizes, it tends to increase. Since the reflected light of the reference of the light reflectance of such characteristics is controlled to control the irradiation of the second laser light, the irradiation condition can be more surely controlled so that the temperature of the glass layer reaches a temperature lower than the melting point and lower than the crystallization temperature. . In the glass fusing method of the present invention, it is preferred that the irradiation condition is the irradiation power of the ? φ ray and the irradiation power is increased or decreased so that the temperature of the glass layer reaches a temperature higher than the melting point and lower than the crystallization temperature. In this case, since the control is performed by increasing or decreasing the irradiation power, it is possible to surely control so that the temperature of the glass layer reaches a temperature higher than the melting point and lower than the crystallization temperature 2. In the glass fusing method of the present invention, it is preferred that the irradiation condition is a traveling speed of the first laser light with respect to the glass layer, and the traveling speed is increased or decreased so that the temperature of the glass layer reaches a melting point higher than the melting point and lower than the melting point. The temperature of the temperature. In this case, because of the increase or decrease! The traveling speed of the laser light is controlled by the line, so that the control can be surely performed so that the temperature of the glass layer reaches a temperature higher than the melting point and lower than the crystallization temperature. Further, after the glaze layer is gradually melted and the laser light absorption rate is increased, in many cases, the heat input amount due to the laser illuminating is lowered, so that the speed of the first laser light is increased, so that the number of cases can be shortened. The time required to fix the glass layer. ^, the "the speed of the first laser light relative to the glass layer" is the relative travel speed of the first laser light, which includes: ^ the laser light is fixed and 曰140874.doc 201010956 the glass layer moves, the glass The case where the layer is fixed, the first laser light is moved, and the first laser light and the glass layer are respectively moved. The glass layer fixing device of the present invention is characterized in that the glass layer formed by removing the organic solvent and the binder from the slurry layer containing the glass frit, the laser light absorbing material, the organic solvent and the binder is fixed to the glass. In the component, the apparatus includes: a laser light irradiation mechanism that irradiates the glass layer disposed on the glass member with laser light; and an irradiation condition control mechanism that controls the irradiation condition of the laser light to make the temperature of the glass layer higher than The temperature is the melting point and lower than the crystallization temperature. In the glass layer fixing device, when the laser light is irradiated from the laser light irradiation means to melt the glass layer, the irradiation condition is controlled by the irradiation condition control means to make the temperature of the glass layer higher than the melting point and lower than the crystallization. The temperature of the temperature is such that the glass layer is fixed to the first glass member. When the glass layer is fixed, the laser light absorption rate of the glass layer is rapidly increased, but since the laser light irradiation mechanism is controlled so that the temperature of the glass layer reaches a temperature higher than the melting point and lower than the crystallization temperature, the glass is suppressed. The layer becomes a state in which the heat input is excessive. Therefore, even if the glass layer is fixed to the glass member by the laser light from the laser light irradiation mechanism, when the glass layer is fixed or the glass members are welded to each other, the turtle can be prevented from occurring on the glass member. Cracked glass components such as cracks. [Effect of the Invention] According to the present invention, it is possible to prevent breakage of the glass member, and it is possible to efficiently splicing the glass members to each other. [Embodiment] 140874.doc 201010956 Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the drawings. In the drawings, the same or corresponding portions are denoted by the same reference numerals, and the description thereof will not be repeated. [First Embodiment] Fig. 1 is a perspective view of a glass frit manufactured by the glass fusing method of the first embodiment. As shown in Fig. 1, the glass fusing body is obtained by fusing the glass member (first glass member) 4 and the glass member (second glass member) 5 via the glass layer 3' formed by welding the predetermined region R. Examples of the glass members 4 and 5: In the case of a rectangular plate-like member having a thickness of 0.7 mm composed of an inspection glass, the welding predetermined region R is set in a rectangular ring shape along the outer edges of the glass members 4 and 5. The glass layer 3 is made of, for example, a low-melting point glass (a bismuth-based glass, an acid-cut glass or the like) and is formed in a rectangular ring shape along a predetermined region R to be welded. Next, a glass fusing method for manufacturing the above-described glass fusing body 1 will be described. First, as shown in Fig. 2, the powder material is coated by a dispenser or screen printing, whereby the ® slurry layer 6 is formed on the surface 4a of the glass member 4 along the welding predetermined region R. The powder slurry is a powdery glass frit composed of an amorphous low-melting glass (phosphorus glass, lead borate glass, etc.), and an inorganic pigment such as iron oxide, that is, a laser light absorbing pigment. (Laser light absorption 'receiving material'), an organic solvent such as amyl acetate, and a resin component (acrylic resin or the like) which is thermally decomposed below the softening point temperature of the glass, that is, a binder is kneaded. The powder slurry may be obtained by kneading a glass frit, an organic solvent, and a binder, and the glass powder is made of a low-melting glass to which a laser light absorbing pigment (laser light absorbing material) is added in advance. Shaped into 140874.doc 201010956. That is, the slurry layer 6 contains glass frit 2, a laser light absorbing pigment, an organic solvent, and a binder. Then, the slurry layer 6 is dried to remove the organic solvent, and further, the slurry layer 6 is heated to remove the binder, whereby the glass layer 3 is fixed to the surface of the glass member 4 along the welding predetermined region R. . Further, the glass layer 3 fixed to the surface 4a of the glass member 4 produces light exceeding the absorption characteristics of the laser light absorbing pigment by the voids generated by the removal of the binder or the particle properties of the glass powder 2. Scattering, which turns into a bear with a low rate of absorption of laser light (for example, it appears white under visible light). Further, since the glass layer 3 contains a laser light absorbing pigment or a filler, the refining point and the crystallization temperature of the glass layer 3 reach the low melting point glass contained in the glass layer 3 (the glass powder contained in the slurry layer 6) 2) The melting point and crystallization temperature. Then, as shown in FIG. 3 and FIG. 4, the glass member 4 is placed on the surface 11a (here, the polishing surface) of the plate-like mounting table 11 of the glass layer fixing device 1 by the glass layer 3 Thereby, the glass layer 3 formed by removing the organic solvent and the binder from the slurry layer 6 is disposed between the glass member 4 and the mounting table U so as to be welded along the predetermined area. As shown in FIG. 4, the glass layer fixing device 1 includes a mounting table 11 on which a glass member 4 having a glass layer 3 is formed, and a laser light irradiation portion (laser light irradiation mechanism) 12 which will collect light spots. The laser beam 3 is irradiated with laser light (the first laser light) L1; the light receiving head 13 receives the heat light emitted from the glass layer 3 by the irradiation of the laser light L1; and the radiation thermometer 14 is based on the receiving head 丨3 received heat radiation, and detecting the temperature of the glass layer 3 at the spot of the laser light L1; χ γ platform 丨 5, which moves the stage 11 in the XY direction along the predetermined region R of the fusion; 140874.doc • 10· 201010956 Control 邛 (radiation condition control mechanism) 〖6, which controls the laser light irradiation unit 及2 and the platform 15. After the glass member 4 is placed on the mounting table u, the glass layer fixing device 10 is driven, and as shown in FIGS. 3 and 4, the light collecting point is aligned with the glass layer 3, and the laser beam is irradiated along the predetermined region R to irradiate the laser light. Li, whereby the glass layer 3 is melted, and the glass layer 3 is baked on the glass member 4. At this time, the light is radiated by the control unit 16 based on the heat radiation light from the glass layer 3 received by the optical head. The irradiation power (irradiation condition) is controlled such that the temperature of the glass layer 3 which is rapidly increased by the melting of the laser light reaches a temperature higher than the melting point and lower than the crystallization temperature. That is, as shown in FIG. 5, after the irradiation of the laser light is started, it is first confirmed whether the temperature of the glass layer 3 is within a predetermined range higher than the melting point Tm and lower than the crystallization temperature Tc (S1), and if the temperature of the glass layer 3 is at the above Within the predetermined range, the irradiation power of the laser light L1 is maintained as it is, and the laser light L1 is continuously irradiated along the welding predetermined region R (S2). On the other hand, if the temperature of the glass layer 3 is outside the above-mentioned predetermined range, it is judged whether the temperature of the glass layer 3 is higher than the predetermined range or lower than the predetermined range (S3), and if it is higher than the predetermined range, the fixed amount is When the irradiation power (S4) of the laser light L1 is lowered, and if it is lower than the predetermined range, the irradiation power of the laser light L1 is increased by a fixed amount (S5), and then the laser light L1 is continuously irradiated along the welding predetermined region R. Further, such control is repeatedly performed until the completion of the burning of the glass layer 3 along the welding predetermined region R (S6). By performing the control of the irradiation power, the glass layer 3 is baked, and the glass layer 3 disposed between the glass member 4 and the mounting table 11 is melted and resolidified in a state where crystallization is suppressed, thereby burning. Connected to the surface 4a of the glass member 4 140874.doc .n 201010956. Further, in the present embodiment, since the polishing of the laser light L1 is performed from the side of the glass member 4, not only the glass layer 3 can be reliably fixed to the glass member 4 but also the glass members 4 and 5 are welded to each other. The crystallization of the surface 3a of the glass layer 3 as the bonding surface is further suppressed. Further, the glass layer 3 which is fired on the surface 4a of the glass member 4 is filled with the glass powder 2, and the voids are filled and the particle property is destroyed. Thus, the laser light absorbing pigment is remarkably exhibited. The absorption characteristic is a state in which the laser light absorption rate is high (for example, in the case of visible light), and then, after the glass layer 3 in which the crystallization is suppressed is completed throughout the entire circumference of the welding predetermined region R, The glass member 4 to which the glass layer 3 is baked is removed from the mounting table 11. At this time, the difference between the linear expansion coefficients of the glass frit 2 and the mounting table is larger than the difference between the linear expansion coefficients of the glass frit 2 and the glass member 4, so that the glass layer 3 is not fixed to the mounting table 11. Since the surface 11a of the mounting table 11 is polished, the unevenness of the surface 3a of the glass layer 3 on the surface 4a of the glass member 4 opposite to the glass member 4 is flattened. After the glass layer 3 is baked, As shown in Fig. 6, the glass member 5 is superposed on the glass member 4 to which the glass layer 3 is baked via the glass layer 3. At this time, since the surface 3a of the glass layer 3 is flattened, the surface 5a of the glass member 5 is formed. Contact with the surface 3a of the glass layer 3 without gaps. Then, the above-mentioned overlapped glass members 4, 5 are placed on a glass member welding device (not shown) as shown in Fig. 7 to align the condensed spots with the glass. Layer 3, irradiating laser light (second laser light) L2 along the welding predetermined region R. Further, at this time, 140874.doc -12- 201010956, the glass members 4, 5 are moved relative to the laser light L2 by the glass member welding device And irradiating. Thereby, it is disgusting throughout the predetermined area of welding The laser light L2 is absorbed by the glass layer 3 in a state where the laser light absorption rate is high throughout the entire week, and the glass layer 3 and its peripheral portions (the surface defects of the glass members 4, 5, part 5a) are melted and resolidified, thereby The glass member 4 is welded to the glass member 5. At this time, the state is such that the surface of the glass member 5 is in contact with the surface 3a of the glass layer, and is welded to the glass over the entire circumference of the predetermined area. The crystallization of the glass layer 3 on the member 4 is suppressed, and therefore, the melting point of the glass layer 3 is not increased, and the glass member 4 and the glass member 5 are uniformly welded along the welding predetermined region R, and breakage is prevented. In the glass fusing method for manufacturing a glass fusing body, when the laser beam 3 is irradiated by irradiating the laser light L1 along the welding predetermined region R, the irradiation condition of the laser light L! is controlled to make the glass layer. The temperature of 3 reaches a temperature higher than the melting point Tm and lower than the crystallization temperature Tc, thereby fixing the glass layer 3 to the glass member 4. When the glass layer 3 is fixed, the glass layer is caused by the melting of the glass layer 3. 3 The laser light absorption rate is rapidly increased, but since the irradiation condition of the laser light L1 is controlled so that the temperature of the glass layer 3 reaches a temperature higher than the melting point Tm and lower than the crystallization temperature Tc, the glass layer 3 can be suppressed from becoming a heat input. In this state, even if the glass layer 3 is fixed to the glass member 4 by the irradiation of the laser light L1, when the glass layer 3 is fixed or when the glass members 4 and 5 are welded to each other, It is possible to prevent breakage of the glass members 4 and 5 such as cracks in the glass members 4 and 5. Therefore, the glass member 4, 5 can be prevented from being broken by the glass-melting method, so that the glass members 4 and 5 can be efficiently removed. 140874.doc -13- 201010956 Further, in the above glass fusion method, the irradiation conditions of the laser light L1 are controlled based on the heat radiation light emitted from the glass layer 3, so that the temperature of the glass layer 3 is high. The temperature is at a melting point Tm and lower than the crystallization temperature Tc. In this case, the temperature of the glass layer 3 is measured by measuring the heat radiation light emitted from the glass layer 3, so that the laser light can be reliably controlled by the irradiation condition to make the temperature of the glass layer 3 high. The temperature is at a melting point Tm and lower than the crystallization temperature Tc. Further, in the above glass fusion method, laser light! ^ is irradiated onto the glass layer 3 from the side of the glass member 4, so that the interface portion between the glass member 4 and the glass layer 3 is sufficiently heated, and control is performed so that the melting temperature of the surface 3a side of the glass layer 3 is lower than the interface The melting temperature of the part side. Therefore, the glass layer 3 can be firmly fired and fixed to the glass member 4, and the portion of the glass layer 3 on the side of the glass member 5 to be welded (the surface 3a of the glass layer 3) can be further reliably suppressed. Part) Crystallization due to excessive heat input. [Second Embodiment] Next, a second embodiment of the present invention will be described. The present embodiment is different from the first embodiment in that when the glass layer 3 is baked on the glass member 4, the laser beam reflected by the glass layer 3 reflects light to control the irradiation power of the laser light L1. The temperature of the glass layer 3 is made higher than the melting point Tm and lower than the crystallization temperature tc. The laser light reflectance of the laser light L1 has the following characteristics. That is, as shown in Fig. 8, before the temperature of the glass layer 3 reaches the melting point of 7111, the reflectance of the laser light is substantially fixed. The intensity of the reflected light is also substantially constant. On the other hand, if the temperature of the layer 3 of the glass 140874.doc -14- 201010956 exceeds the melting sTm and the glass layer 3 starts to melt, the scattering of the particles by the perforation (bubble) of the binder or the glass powder 2 may cause scattering or The laser absorbs the pigment to cause an increase in the light absorptivity, thereby forming a tendency that the reflectance of the laser light gradually decreases in response to an increase in temperature, and the intensity of the reflected light gradually decreases. Then, if the temperature of the glass layer 3 is Tml and the glass layer 3 is completely melted, the reflectance of the laser light is temporarily fixed. When the temperature of the glass layer 3 rises to the crystallization temperature Tc, crystallization starts, and crystallization is caused. As a result of the increase, the scattering increases, so there is a tendency that the reflectance of the laser light rises again corresponding to the temperature rise, and the intensity of the reflected light gradually increases. Thereafter, when the temperature of the glass layer 3 reaches Tcl and is completely crystallized, the reflectance of the laser light is again substantially fixed, and the intensity of the reflected light is again substantially fixed. In the present embodiment, the glass layer 3 is fired on the glass member 4 by the intensity of the reflected light having such characteristics. Further, the steps other than the firing in the glass fusing method are the same as in the first embodiment. First, the description will be made on the glass layer fixing device 2 used in the present embodiment. As shown in FIG. 9, the glass layer fixing device 20 includes a receiving head 11, a laser beam irradiation unit 2, and an XY stage 5, which are used in the first embodiment, and includes a light receiving head 23 and a reflected light monitor 24, Control unit (irradiation condition control unit) 26. The light receiving head 23 receives the reflected light from the glass layer 3 generated by irradiating the laser light u, and outputs the received intensity information of the reflected light to the reflected light monitor 24. The reflected light monitor 24 performs reflectance conversion based on the intensity information of the reflected light from the light receiving head 23 and the irradiation power information from the control unit 26, and outputs the intensity information of the reflected light or the laser light reflectance 140874.doc 201010956 to the control unit. 26. The control unit 26 controls the laser light irradiation unit 丨2 and the χγ platform 1 $ based on the intensity of the input reflected light or the laser light reflectance. Next, a case where the glass layer 3 is baked on the glass member 4 in the present embodiment will be described. During the firing of the glass layer 3, the glass layer fixing device 20 is driven, and the condensed spot is aligned with the glass layer 3, and the laser light 3 is irradiated along the predetermined region r of the fusion, whereby the glass layer 3 is melted, thereby The glass layer 3 is fired on the glass member 4. At this time, based on the intensity of the reflected light reflected by the glass layer 3 received by the optical head 23, the irradiation power of the laser light L1 is controlled by the control unit % as follows, so that the laser light absorption rate is sharp due to melting. The temperature of the elevated glass layer 3 reaches a temperature higher than the melting point Tm and lower than the crystallization temperature Tc. That is, as shown in Fig. 10, when the irradiation of the laser light L1 is started, the irradiation power of the laser light L1 from the laser beam irradiation unit 12 is first slowly increased so that the glass layer 3 does not crystallize immediately (s1). Then, it is confirmed whether or not the intensity of the reflected light received by the optical head 23 is within the predetermined range of the temperature of the glass layer 3 (S 12). Further, since the laser light reflectance was fixed before the temperature reached the melting point of the diced melon, it was confirmed that the temperature of the glass layer 3 did not exceed the melting point Τηι by measuring the intensity of the reflected light. Then, when the intensity of the reflected light is within the predetermined range, the irradiation power of the laser light L1 is maintained as it is and the laser light L1 is continuously irradiated along the predetermined region r (S 13). On the other hand, after the irradiation light of the laser light L is maintained and the irradiation continues, the temperature of the glass layer exceeds the melting point Tm and the laser light absorption rate increases, and as a result, the intensity of the reflected light is outside the predetermined range, 140874.doc -16 - 201010956 The laser light reflectance from the glass layer 3 is determined, and it is judged whether or not the (four) light reflectance is lowered (S14).
若步驟SU中之判斷結果為雷射光反射率處於下降之傾 向，則以固定量增加雷射光L1之照射功率（S15)，且控制 雷射光U，以使玻璃層3之溫度處於溶點〜與結晶化溫度 L之間之最佳熔融溫度範圍Tml〜Tc(參照圖8)内，並沿熔 接預定區域R繼續照射雷射扣。再者，該最佳溶融溫度 範圍Tml〜Tc如圖8所示，與雷射光反射率自下降傾向轉變 成上升傾向之區域一致，雷射光反射率大致固定。 另一方面，若雷射光反射率並未下降，則判斷到達預先 所設定之結晶化溫度Tc之雷射光之照射功率是否達到上限 值以上（S16)。若雷射光1^之照射功率為上限值以上，則 玻璃層3結晶化之可能性較高（S17)，故而停止加工（si8)。 另一方面，若雷射光L1之照射功率小於上限值，則增加雷 射光之功率（S15)。而且，反覆進行此種控制，直至玻璃 層3之燒接沿熔接預定區域r結束為止（S19)。 如以上說明所述，於用以製造玻璃熔接體1之玻璃熔接 方法中，係基於由玻璃層3所反射之雷射光1^之光反射而 控制照射功率’以使玻璃層3之溫度達到高於熔點Tm且低 於結晶化溫度Tc之溫度。反射光之雷射光反射率具有以下 特性：於玻璃層3之溫度達到熔點Tm之前為固定，若玻璃 層3之溫度超過熔點Tm則表現出下降之傾向，其後，若玻 璃層3之溫度超過結晶化溫度Tc而進行結晶化則表現出增 加之傾向。因此，由於係基於成為具有此種特性之雷射光 140874.doc -17· 201010956 反射率之基準的反射光而控制雷射光L1之照射，故能夠確 實地控制照射功率，以使玻璃層3之溫度達到高於熔點Tm 且低於結晶化溫度Tc之溫度。而且，由於雷射光反射率自 下降傾向變成上升傾向之變更區域與最佳熔融溫度範圍 Tml〜Tc一致’故而藉由基於雷射光反射率而控制雷射光 L1，可進一步使玻璃層3之熔融達到最佳狀態。 然而’於有機EL封裝等中，由於容器本身較小，因此使 用進一步薄型化之玻璃構件4、5，故作為玻璃構件4、5之 材料，為了難以產生裂痕而多選擇低膨脹玻璃。此時，為 了使玻璃層3之線膨脹係數與玻璃構件4、5之線膨脹係數 一致（即，為了降低玻璃層3之線膨脹係數），而使玻璃層3 中含有大量由陶瓷等構成之填料。若使玻璃層3中含有大 量填料，則於照射雷射光L1之前後，玻璃層3之雷射光吸 收率會更大變化。因此，上述玻璃熔接方法於選擇低膨脹 玻璃作為玻璃構件4、5之材料之情形時特別有效。 本發明並不限定於上述實施形態。 例如，於上述第1及第2實施形態中，係藉由變更作為照 射條件之雷射光L1之照射功率而調整對於以固定速度移動 之玻璃層3的熱輸入量，但亦可使雷射光L1之照射功率固 定，而將雷射光Li之相對照射速度（即雷射光^之相對於If the result of the determination in step SU is that the laser light reflectance is decreasing, the irradiation power of the laser light L1 is increased by a fixed amount (S15), and the laser light U is controlled so that the temperature of the glass layer 3 is at a melting point. The optimum melting temperature range Tml to Tc (refer to FIG. 8) between the crystallization temperatures L is continued to illuminate the laser buckle along the welding predetermined region R. Further, as shown in Fig. 8, the optimum melting temperature range Tml to Tc coincides with the region where the laser light reflectance changes from a tendency to fall to a rising tendency, and the laser light reflectance is substantially constant. On the other hand, if the laser light reflectance does not decrease, it is judged whether or not the irradiation power of the laser light reaching the crystallization temperature Tc set beforehand has reached the upper limit or more (S16). When the irradiation power of the laser beam 1 is equal to or higher than the upper limit value, the possibility of crystallization of the glass layer 3 is high (S17), and the processing is stopped (si8). On the other hand, if the irradiation power of the laser light L1 is smaller than the upper limit value, the power of the laser light is increased (S15). Further, such control is repeated until the burning of the glass layer 3 is completed along the welding predetermined region r (S19). As described above, in the glass fusing method for manufacturing the glass fusing body 1, the irradiation power is controlled based on the light reflection of the laser light reflected by the glass layer 3 to make the temperature of the glass layer 3 high. The temperature is at a melting point Tm and lower than the crystallization temperature Tc. The reflectance of the reflected light has the following characteristics: it is fixed before the temperature of the glass layer 3 reaches the melting point Tm, and if the temperature of the glass layer 3 exceeds the melting point Tm, it tends to decrease, and thereafter, if the temperature of the glass layer 3 exceeds When the crystallization temperature Tc is crystallized, the tendency to increase is exhibited. Therefore, since the irradiation of the laser light L1 is controlled based on the reflected light which is the reference of the reflectance of the laser light 140874.doc -17· 201010956 having such characteristics, the irradiation power can be surely controlled so that the temperature of the glass layer 3 is maintained. A temperature higher than the melting point Tm and lower than the crystallization temperature Tc is reached. Further, since the region where the laser light reflectance changes from the downward tendency to the rising tendency coincides with the optimum melting temperature range Tml to Tc, the melting of the glass layer 3 can be further achieved by controlling the laser light L1 based on the laser light reflectance. Best state. However, in the organic EL package or the like, since the container itself is small, the glass members 4 and 5 which are further reduced in thickness are used. Therefore, as the material of the glass members 4 and 5, the low expansion glass is selected in order to prevent cracks from occurring. At this time, in order to make the linear expansion coefficient of the glass layer 3 coincide with the linear expansion coefficient of the glass members 4 and 5 (that is, in order to reduce the linear expansion coefficient of the glass layer 3), the glass layer 3 contains a large amount of ceramics or the like. filler. If a large amount of filler is contained in the glass layer 3, the laser light absorption of the glass layer 3 will change more before the irradiation of the laser light L1. Therefore, the above glass fusing method is particularly effective in the case where the low expansion glass is selected as the material of the glass members 4, 5. The present invention is not limited to the above embodiment. For example, in the first and second embodiments described above, the amount of heat input to the glass layer 3 moving at a fixed speed is adjusted by changing the irradiation power of the laser light L1 as the irradiation condition, but the laser light L1 may be made. The illumination power is fixed, and the relative illumination speed of the laser light Li (ie, the laser light is relative to
之溫度控制於規定範圍内。而且， 「形時，由於藉由增減雷射 因此能夠確實地將玻璃層3 且’於玻璃層3進行熔融而 140874.doc -18· 201010956 導致雷射光吸收率上升後，多數情況下會降低雷射照射所 產生之熱輸入量，故而，加快雷射光L1之相對速度之情形 增多，從而可縮短玻璃層3燒接時所需要之時間。 又，於上述第1及第2實施形態中，係隔著玻璃構件4侧 而對玻璃層3照射雷射光L1，但亦可直接對玻璃層3照射雷 射光L 1。 又，於上述第1及第2實施形態中，係使雷射光L1、。固 定而利用XY平台15等使玻璃構件4、5移動，但只要雷射 • 光1^、L2相對於各玻璃構件4、5相對地行進即可，故而亦 可使玻璃構件4、5固定而使雷射*L1、L2移動，亦可使玻 璃構件4、5與雷射光L1、L2分別移動。 又，於上述第2實施形態中，為了獲得反射光之強度或 雷射光反射率，係利用用以使玻璃層3熔融之由雷射光照 射部12產生之雷射光L1，但亦可設置用以獲得反射光之強 度或雷射光反射率之專用之雷射光照射部，而利用此種專 用之雷射光照射部產生之雷射光。 _ [產業上之可利用性] 根據本發明，可防止玻璃構件之破損，從而可高效地將 玻璃構件彼此熔接。 - 【圖式簡單說明】 圖1係藉由第1實施形態之玻璃熔接方法所製造之玻璃溶 接體之立體圖； 圖2係用以說明第1實施形態之玻璃熔接方法之立體圖； 圖3係用以說明第！實施形態之玻璃熔接方法之剖面圖； 140874.doc -19· 201010956 圖4係第1實施形態中所使用之玻璃層固定裝置之概略構 成圖； 圖5係表示第1實施形態中之玻璃層之燒接控制之流程 圖； 圖6係用以說明第1實施形態之玻璃熔接方法之立體圖； 圖7係用以說明第1實施形態之玻璃熔接方法之立體圖； 圖8係表示玻璃層之溫度與雷射光反射率之關係之圖； 圖9係第2實施形態中所使用之玻璃層固定裝置之概略構 成圖； 圖係表示第2實施形態中之玻璃層之燒接控制之流程 園， 圖π係表示玻璃層之溫度與雷射光吸收率之關係之圖；及 圖12係表示雷射功率與玻璃層之溫度之關係之圖。 【主要元件符號說明】 1 玻璃熔接體 2 玻璃粉（glass frit) 3 玻璃層 4 玻璃構件（第1玻璃構件） 5 玻璃構件（第2玻璃構件） 6 漿料層 10、20 玻璃層固定裝置 12 雷射光照射部（雷射光照射機構） 13、23 受光頭 14 放射溫度計 140874.doc 201010956The temperature is controlled within the specified range. Moreover, in the case of "formation, since the glass layer 3 and the glass layer 3 can be surely melted by increasing or decreasing the laser, 140874.doc -18· 201010956 causes the laser light absorption rate to rise, and in most cases, it is lowered. Since the amount of heat input by the laser irradiation is increased, the relative speed of the laser light L1 is increased, and the time required for the glass layer 3 to be burned can be shortened. Further, in the first and second embodiments described above, The laser beam L1 is irradiated to the glass layer 3 via the side of the glass member 4, but the laser beam L1 may be directly irradiated to the glass layer 3. Further, in the first and second embodiments, the laser light L1 is used. The glass members 4 and 5 are moved by the XY stage 15 or the like, but the laser beams 1 and 5 can be moved relative to the glass members 4 and 5, so that the glass members 4 and 5 can be fixed. In addition, in the second embodiment, in order to obtain the intensity of the reflected light or the reflectance of the laser light, the glass members 4 and 5 are respectively moved by moving the lasers *L1 and L2. Using laser light to melt the glass layer 3 The laser beam L1 is generated by the emitting portion 12, but a dedicated laser light irradiating portion for obtaining the intensity of the reflected light or the reflectance of the laser light may be provided, and the laser light generated by the dedicated laser light irradiating portion may be used. Industrial Applicability According to the present invention, it is possible to prevent the glass members from being damaged, and the glass members can be welded to each other efficiently. - [Schematic Description] Fig. 1 is a glass welding method according to the first embodiment. Fig. 2 is a perspective view for explaining a glass fusing method according to a first embodiment; Fig. 3 is a cross-sectional view showing a glass fusing method according to a third embodiment; 140874.doc -19· 201010956 4 is a schematic configuration diagram of a glass layer fixing device used in the first embodiment; FIG. 5 is a flow chart showing the baking control of the glass layer in the first embodiment; and FIG. 6 is a view for explaining the first embodiment. Fig. 7 is a perspective view for explaining a glass fusing method according to the first embodiment; Fig. 8 is a view showing a relationship between a temperature of a glass layer and a reflectance of laser light; The schematic diagram of the glass layer fixing device used in the second embodiment; the figure shows the flow of the glass layer in the second embodiment; FIG. π shows the temperature of the glass layer and the laser light absorption rate. Fig. 12 is a diagram showing the relationship between the laser power and the temperature of the glass layer. [Explanation of main component symbols] 1 Glass fusing body 2 Glass frit 3 Glass layer 4 Glass member (1st glass member) 5 Glass member (second glass member) 6 Slurry layer 10, 20 Glass layer fixing device 12 Laser beam irradiation unit (laser beam irradiation mechanism) 13, 23 Acceptance head 14 Radiation thermometer 140874.doc 201010956
15 16、 24 LI L2 R XY平台 26 控制部（照射條件控制機構） 反射光監視器 雷射光（第1雷射光） 雷射光（第2雷射光） 熔接預定區域 140874.doc -21 -15 16、 24 LI L2 R XY stage 26 Control unit (irradiation condition control unit) Reflected light monitor Laser light (first laser light) Laser light (second laser light) Welding scheduled area 140874.doc -21 -